TW335507B - A substrate coating device for manufacturing of semiconductor - Google Patents

A substrate coating device for manufacturing of semiconductor

Info

Publication number
TW335507B
TW335507B TW082107765A TW82107765A TW335507B TW 335507 B TW335507 B TW 335507B TW 082107765 A TW082107765 A TW 082107765A TW 82107765 A TW82107765 A TW 82107765A TW 335507 B TW335507 B TW 335507B
Authority
TW
Taiwan
Prior art keywords
substrate
semiconductor
manufacturing
coating
coating device
Prior art date
Application number
TW082107765A
Other languages
Chinese (zh)
Inventor
Muhlfriedel Eberhard
Appich Karl
Kallis Martin
Original Assignee
Steag Micro Tech Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/DE1993/000778 external-priority patent/WO1995005901A1/en
Application filed by Steag Micro Tech Gmbh filed Critical Steag Micro Tech Gmbh
Application granted granted Critical
Publication of TW335507B publication Critical patent/TW335507B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/105—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material by capillary action, e.g. using wicks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/12—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed after the application

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Abstract

A substrate coating device, having a capillary gap (21) for coating of a layer on the downward face of the substrate (20); and a centrifugal device (17, 18, 19), for rotation of the substrate, with the substrate coating face downward, for even coating on the substrate (20) by means of capillary (21), while reducing the coating thickness.
TW082107765A 1993-08-26 1993-09-21 A substrate coating device for manufacturing of semiconductor TW335507B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/DE1993/000778 WO1995005901A1 (en) 1993-08-26 1993-08-26 Device for coating substrates in semiconductor manufacture

Publications (1)

Publication Number Publication Date
TW335507B true TW335507B (en) 1998-07-01

Family

ID=6888393

Family Applications (1)

Application Number Title Priority Date Filing Date
TW082107765A TW335507B (en) 1993-08-26 1993-09-21 A substrate coating device for manufacturing of semiconductor

Country Status (3)

Country Link
KR (1) KR0159247B1 (en)
CA (1) CA2165069C (en)
TW (1) TW335507B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114472090B (en) * 2022-02-10 2023-06-02 华能新能源股份有限公司 Film growth equipment and film growth method

Also Published As

Publication number Publication date
KR0159247B1 (en) 1998-11-16
CA2165069C (en) 1999-06-01
CA2165069A1 (en) 1995-03-02
KR960703684A (en) 1996-08-31

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Legal Events

Date Code Title Description
MK4A Expiration of patent term of an invention patent