TW330987B - Developer flow check system and method thereof - Google Patents

Developer flow check system and method thereof

Info

Publication number
TW330987B
TW330987B TW085106964A TW85106964A TW330987B TW 330987 B TW330987 B TW 330987B TW 085106964 A TW085106964 A TW 085106964A TW 85106964 A TW85106964 A TW 85106964A TW 330987 B TW330987 B TW 330987B
Authority
TW
Taiwan
Prior art keywords
developer
flow check
check system
developer flow
nozzle
Prior art date
Application number
TW085106964A
Other languages
English (en)
Inventor
Park Geun-Bok
Kim Kil-Yonq
Go Jae-Seung
Kim Dong-Heyun
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Application granted granted Critical
Publication of TW330987B publication Critical patent/TW330987B/zh

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01FMEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F11/00Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it
    • G01F11/28Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with stationary measuring chambers having constant volume during measurement
    • G01F11/284Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with stationary measuring chambers having constant volume during measurement combined with electric level detecting means
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03DAPPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D5/00Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected
    • G03D5/04Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected using liquid sprays
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
TW085106964A 1995-11-23 1996-06-10 Developer flow check system and method thereof TW330987B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950043199A KR100224655B1 (ko) 1995-11-23 1995-11-23 현상액 분사 점검시스템 및 이를 이용한 현상액 측정방법

Publications (1)

Publication Number Publication Date
TW330987B true TW330987B (en) 1998-05-01

Family

ID=19435368

Family Applications (1)

Application Number Title Priority Date Filing Date
TW085106964A TW330987B (en) 1995-11-23 1996-06-10 Developer flow check system and method thereof

Country Status (4)

Country Link
US (1) US5801315A (zh)
JP (1) JP3559394B2 (zh)
KR (1) KR100224655B1 (zh)
TW (1) TW330987B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6692572B1 (en) 1999-09-13 2004-02-17 Precision Valve & Automation, Inc. Active compensation metering system
US6627465B2 (en) * 2001-08-30 2003-09-30 Micron Technology, Inc. System and method for detecting flow in a mass flow controller
US20070298158A1 (en) * 2006-06-23 2007-12-27 Marion Keith Martin Testing bonding materials in a disc production line
JP5201309B2 (ja) * 2006-11-30 2013-06-05 富士ゼロックス株式会社 画像形成装置
KR101021984B1 (ko) * 2008-10-24 2011-03-16 세메스 주식회사 유량 제어 시스템 및 그의 유량 알람 제어 방법
NL2005787C2 (nl) * 2010-11-30 2012-06-04 Blue Nederland B V Materiaalafgifte-inrichting, materiaalafgiftesysteem en werkwijze voor het gestuurd aan een object afgeven van een materiaal.
DE102016114607A1 (de) * 2016-08-05 2018-02-08 Infineon Technologies Ag Flüssigkeitsabgabesystem, -Vorrichtung und -Verfahren

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3207372A (en) * 1962-09-21 1965-09-21 Sterilon Corp Intravenous feeding apparatus
US3194434A (en) * 1963-01-17 1965-07-13 Austin E Evanson Supplying metered quantities of liquid
US3229854A (en) * 1963-06-05 1966-01-18 Union Tank Car Co Water conditioning system
US3401834A (en) * 1967-04-17 1968-09-17 Gen Motors Corp Laundry conditioner dispenser system
US4277832A (en) * 1979-10-01 1981-07-07 General Electric Company Fluid flow control system
HU186154B (en) * 1982-11-04 1985-06-28 Richter Gedeon Vegyeszet Method and apparatus for detecting on influencing flow characteristics of the solid granular materials
US4667852A (en) * 1983-09-29 1987-05-26 Bernd Siemann Apparatus for preparing and dispensing thermoplastic resin
JPS62273714A (ja) * 1986-05-21 1987-11-27 Clarion Co Ltd 有機金属ガス供給方法および装置
US4840138A (en) * 1986-12-23 1989-06-20 Preferred Machining Corporation Fluid dispensing system
US5021312A (en) * 1987-12-28 1991-06-04 Fuji Photo Film Co., Ltd. Apparatus and method for controlling the quantity of developer delivered to a film processing head
US4906165A (en) * 1988-09-09 1990-03-06 Fox Ronald L Flow meter for a positive displacement pump
US4894252A (en) * 1988-11-30 1990-01-16 Ransburg Corporation Coating material orifice clogging indication method and apparatus
US5127362A (en) * 1989-05-22 1992-07-07 Tokyo Electron Limited Liquid coating device
US5544786A (en) * 1989-10-17 1996-08-13 Technichem Pty. Ltd. Volume and flow measuring apparatus
US5090594A (en) * 1991-01-15 1992-02-25 Flowclean Equipment, Inc. Volumetric fluid dispensing apparatus and method
EP0576498B2 (de) * 1991-03-27 2000-05-17 SCA SCHUCKER GmbH Verfahren und vorrichtung zum aufbringen einer pastösen masse
US5288325A (en) * 1991-03-29 1994-02-22 Nec Corporation Chemical vapor deposition apparatus
DE9106040U1 (zh) * 1991-05-13 1991-07-04 Wittmann Kunststoffgeraete Ges.M.B.H., Wien, At
JP2972970B2 (ja) * 1992-04-24 1999-11-08 東京エレクトロン株式会社 処理装置
US5373746A (en) * 1993-01-25 1994-12-20 Dwyer Instruments, Inc. Flowmeter with snap fit mount end caps
US5520969A (en) * 1994-02-04 1996-05-28 Applied Materials, Inc. Method for in-situ liquid flow rate estimation and verification
US5649576A (en) * 1996-02-26 1997-07-22 Pharmacopeia, Inc. Partitioning device

Also Published As

Publication number Publication date
JPH09153454A (ja) 1997-06-10
KR970028795A (ko) 1997-06-24
JP3559394B2 (ja) 2004-09-02
KR100224655B1 (ko) 2000-02-01
US5801315A (en) 1998-09-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees