TW330875B - The manufacturing method for LCD device and laser processing machine - Google Patents

The manufacturing method for LCD device and laser processing machine

Info

Publication number
TW330875B
TW330875B TW086104924A TW86104924A TW330875B TW 330875 B TW330875 B TW 330875B TW 086104924 A TW086104924 A TW 086104924A TW 86104924 A TW86104924 A TW 86104924A TW 330875 B TW330875 B TW 330875B
Authority
TW
Taiwan
Prior art keywords
laser beam
shaping
manufacturing
laser
lcd device
Prior art date
Application number
TW086104924A
Other languages
Chinese (zh)
Inventor
Tatsuya Moriike
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Application granted granted Critical
Publication of TW330875B publication Critical patent/TW330875B/en

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/073Shaping the laser spot
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Liquid Crystal (AREA)
  • Lasers (AREA)

Abstract

A manufacturing method for LCD device, it is by illuminating laser beam on plurality of filtering sheets installed on transparency substrate to remove portion of filtering sheet. Form light-shield film on removed portion to surround the filtering sheet. Its features are: The laser beam supplied by laser oscillator is through: Beam expander for adjusting the beam radius of laser beam; Cylinder-shaped lens group for adjusting the vertical-horizontal ratio of beam shaping of laser beam emitted from beam expander; Energy distribution transferring device for uniform the energy density surrounding the optic axle of laser beam emitted from cylinder-shaped lens group. The beam-shaping component for shaping the beam-shape of laser beam emitted from energy distribution transferring device to compose optic system, and form removal portion with specified width on filtering sheet.
TW086104924A 1996-04-26 1997-04-16 The manufacturing method for LCD device and laser processing machine TW330875B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10766596A JP3309046B2 (en) 1996-04-26 1996-04-26 Laser processing machine

Publications (1)

Publication Number Publication Date
TW330875B true TW330875B (en) 1998-05-01

Family

ID=14464913

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086104924A TW330875B (en) 1996-04-26 1997-04-16 The manufacturing method for LCD device and laser processing machine

Country Status (3)

Country Link
JP (1) JP3309046B2 (en)
KR (1) KR100254833B1 (en)
TW (1) TW330875B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100420142B1 (en) * 1996-10-28 2004-09-04 삼성에스디아이 주식회사 Method and device for forming black matrix layer in complex pattern for color filter
CN1211862C (en) * 1999-04-07 2005-07-20 壳牌太阳能股份有限公司 Device and method for removing thin layers on support material
JP2002328365A (en) * 2001-04-26 2002-11-15 Dainippon Printing Co Ltd Transmission and reflection type liquid crystal display device and color filter used for the same, and method used for producing the color filter
JP2004042140A (en) * 2002-07-12 2004-02-12 Hitachi Zosen Corp Process and device for removal of thin film
US7820937B2 (en) * 2004-10-27 2010-10-26 Boston Scientific Scimed, Inc. Method of applying one or more electromagnetic beams to form a fusion bond on a workpiece such as a medical device
JP4960043B2 (en) * 2006-08-31 2012-06-27 日立ビアメカニクス株式会社 Laser processing method and laser processing apparatus
JP5217218B2 (en) * 2007-04-09 2013-06-19 住友金属鉱山株式会社 Manufacturing method of absorption multilayer ND filter chip, absorption multilayer ND filter chip, joining method of absorption multilayer ND filter chip, diaphragm blade with absorption multilayer ND filter, and manufacturing method thereof
CN103639594B (en) * 2013-12-19 2015-10-28 苏州德龙激光股份有限公司 Method for drilling holes

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3159906B2 (en) * 1995-10-23 2001-04-23 アルプス電気株式会社 Manufacturing method of liquid crystal display element

Also Published As

Publication number Publication date
KR970071058A (en) 1997-11-07
KR100254833B1 (en) 2000-05-01
JPH09295175A (en) 1997-11-18
JP3309046B2 (en) 2002-07-29

Similar Documents

Publication Publication Date Title
WO2001009665A8 (en) Optical beam shaper
EP1724048A3 (en) Laser irradiation apparatus having a cylindrical lens group with external masked lenses
AU2990397A (en) Athermal optical device
EP1063049A3 (en) Optical system and apparatus for laser heat treatment and method for producing semiconductor devices by using the same
TW200519410A (en) Light beam converter, optical illuminating apparatus, exposure device, and exposure method
EP0959051A4 (en) Laser machining method for glass substrate, diffraction type optical device fabricated by the machining method, and method of manufacturing optical device
DE3063065D1 (en) Device for the treatment of a workpiece with a laser beam
AU4800899A (en) Optical device, exposure system, and laser beam source, and gas feed method, exposure method, and device manufacturing method
TW330875B (en) The manufacturing method for LCD device and laser processing machine
EP1211561A3 (en) Illumination apparatus
TW414940B (en) Dual exposure method and device manufacturing method using the same
MX9710046A (en) Laser processing of discrete sheets of material.
JPS575380A (en) Output light coupling system for semiconductor laser
AU627682B2 (en) Method and apparatus for adjusting the center of a collet
MY115527A (en) Method of producing a stamping foil
WO2009108673A1 (en) Film, backlight displays, and methods for making the same
KR970022404A (en) Manufacturing method of liquid crystal display device using laser processing machine and the same machine
WO1997001127A3 (en) Backprojection transparency viewer
ES2171757T3 (en) DOPING PROCEDURE TO PRODUCE HOMOUNIONS IN SEMICONDUCTOR SUBSTRATES.
EP1232829A3 (en) Device for inscribing or marking of objects using laser beam
AR229413A1 (en) APPARATUS FOR PRODUCING HULL VALVES FROM A WAFER SHEET THAT HAS A SUBSTANTIALLY FLAT SURFACE
MX9703033A (en) Center masking illumination system and method.
HK1003430A1 (en) Dot-matrix image and thermal transfer film for producing the same
EP0863440A3 (en) Projection exposure apparatus and device manufacturing method
AU7548696A (en) Writing a bragg grating in optical waveguide