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Application filed by United Microelectronics CorpfiledCriticalUnited Microelectronics Corp
Priority to TW83103912ApriorityCriticalpatent/TW291579B/en
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Publication of TW291579BpublicationCriticalpatent/TW291579B/en
An apparatus for removing the particles on the surface of thesemiconductor substrates includes a clean chamber, a neutralization chamber, and a vacuum system. In the clean chamber, the substrate is irradiated by the electrons so that there is a repulsive force induced between the particle and the substrate to remove the particle. The substrate is then neutralized in the neutralization chamber to prevent the substrate from attracting the particles again. The vacuum system connected to the clean and neutralization chambers is used to bring the particles away from the substrate.
TW83103912A1994-04-301994-04-30Method and apparatus for removing the particles on the surface of semiconductor substrates
TW291579B
(en)
Charge-modified nonwoven filter with chemical charge modifiers incorporated onto at least a portion of the amphiphilic macromolecules to absorb micron to sub-micron sized particles