TW259850B - - Google Patents

Info

Publication number
TW259850B
TW259850B TW082100661A TW82100661A TW259850B TW 259850 B TW259850 B TW 259850B TW 082100661 A TW082100661 A TW 082100661A TW 82100661 A TW82100661 A TW 82100661A TW 259850 B TW259850 B TW 259850B
Authority
TW
Taiwan
Application number
TW082100661A
Other languages
Chinese (zh)
Original Assignee
Omi Tadahiro
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Omi Tadahiro filed Critical Omi Tadahiro
Application granted granted Critical
Publication of TW259850B publication Critical patent/TW259850B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
TW082100661A 1992-02-07 1993-02-02 TW259850B (tr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP5708192 1992-02-07
JP4233082A JPH05303208A (ja) 1992-02-07 1992-08-07 リソグラフィ用現像液及びリソグラフィ工程
JP4233080A JPH05303207A (ja) 1992-02-07 1992-08-07 リソグラフィ用現像液及びリソグラフィ工程

Publications (1)

Publication Number Publication Date
TW259850B true TW259850B (tr) 1995-10-11

Family

ID=13045534

Family Applications (1)

Application Number Title Priority Date Filing Date
TW082100661A TW259850B (tr) 1992-02-07 1993-02-02

Country Status (4)

Country Link
JP (2) JPH05303208A (tr)
KR (1) KR960015482B1 (tr)
MY (1) MY121957A (tr)
TW (1) TW259850B (tr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0150146B1 (ko) * 1995-12-20 1998-12-01 김광호 전자사진 현상방식 프린터의 전사전압 자동조절 제어방법
JP4015823B2 (ja) 2001-05-14 2007-11-28 株式会社東芝 アルカリ現像液の製造方法，アルカリ現像液，パターン形成方法，レジスト膜の剥離方法，及び薬液塗布装置
JP5619458B2 (ja) * 2010-03-31 2014-11-05 Hoya株式会社 レジストパターンの形成方法及びモールドの製造方法
JP7422530B2 (ja) * 2019-12-17 2024-01-26 三井化学株式会社 アルキレンオキシド重合体の曇点測定用溶媒
JP7357535B2 (ja) * 2019-12-17 2023-10-06 三井化学株式会社 アルキレンオキシド重合体の製造方法

Also Published As

Publication number Publication date
KR960015482B1 (ko) 1996-11-14
JPH05303207A (ja) 1993-11-16
MY121957A (en) 2006-03-31
JPH05303208A (ja) 1993-11-16
KR930018651A (ko) 1993-09-22

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Legal Events

Date Code Title Description
MK4A Expiration of patent term of an invention patent