TW237559B - Wafer carrier - Google Patents
Wafer carrierInfo
- Publication number
- TW237559B TW237559B TW083104559A TW83104559A TW237559B TW 237559 B TW237559 B TW 237559B TW 083104559 A TW083104559 A TW 083104559A TW 83104559 A TW83104559 A TW 83104559A TW 237559 B TW237559 B TW 237559B
- Authority
- TW
- Taiwan
- Prior art keywords
- wafer
- base
- edge
- lateral edge
- outwardly facing
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67313—Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4587—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67326—Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Packaging Frangible Articles (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Warehouses Or Storage Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/174,046 US5417767A (en) | 1993-12-28 | 1993-12-28 | Wafer carrier |
Publications (1)
Publication Number | Publication Date |
---|---|
TW237559B true TW237559B (en) | 1995-01-01 |
Family
ID=22634572
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW083104559A TW237559B (en) | 1993-12-28 | 1994-05-19 | Wafer carrier |
Country Status (4)
Country | Link |
---|---|
US (1) | US5417767A (zh) |
JP (1) | JPH07211658A (zh) |
DE (1) | DE4446972A1 (zh) |
TW (1) | TW237559B (zh) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD381235S (en) * | 1995-02-27 | 1997-07-22 | Peter Bangert | Compact disc holder |
US5855280A (en) * | 1995-12-14 | 1999-01-05 | Lucent Technologies Inc. | Cassette light |
WO2000000663A1 (en) * | 1998-06-30 | 2000-01-06 | Memc Electronic Materials, Inc. | Method and device for displacing wafers in a deposition reactor |
US6871657B2 (en) * | 2001-04-06 | 2005-03-29 | Akrion, Llc | Low profile wafer carrier |
US20040221810A1 (en) * | 2002-06-28 | 2004-11-11 | Miles Ronald O. | Process boat and shell for wafer processing |
US6814808B1 (en) | 2002-10-08 | 2004-11-09 | Sci-Tech Glassblowing, Inc. | Carrier for semiconductor wafers |
US20040188319A1 (en) * | 2003-03-28 | 2004-09-30 | Saint-Gobain Ceramics & Plastics, Inc. | Wafer carrier having improved processing characteristics |
US7239953B2 (en) * | 2004-10-05 | 2007-07-03 | Vision Works, Llc | Absolute acceleration sensor for use within moving vehicles |
US20070170077A1 (en) * | 2006-01-20 | 2007-07-26 | Weir Donald W Iii | Disk holder |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS598055B2 (ja) * | 1978-10-17 | 1984-02-22 | 松下電子工業株式会社 | 半導体スライスの保持具 |
US4355974A (en) * | 1980-11-24 | 1982-10-26 | Asq Boats, Inc. | Wafer boat |
CA1158109A (en) * | 1981-01-14 | 1983-12-06 | George M. Jenkins | Coating of semiconductor wafers and apparatus therefor |
US4572101A (en) * | 1983-05-13 | 1986-02-25 | Asq Boats, Inc. | Side lifting wafer boat assembly |
US4694778A (en) * | 1984-05-04 | 1987-09-22 | Anicon, Inc. | Chemical vapor deposition wafer boat |
US4548159A (en) * | 1984-07-06 | 1985-10-22 | Anicon, Inc. | Chemical vapor deposition wafer boat |
US4586743A (en) * | 1984-09-24 | 1986-05-06 | Intelledex Incorporated | Robotic gripper for disk-shaped objects |
US4676008A (en) * | 1986-05-16 | 1987-06-30 | Microglass, Inc. | Cage-type wafer carrier and method |
US5292393A (en) * | 1986-12-19 | 1994-03-08 | Applied Materials, Inc. | Multichamber integrated process system |
JPS6453544A (en) * | 1987-08-25 | 1989-03-01 | Mitsubishi Electric Corp | Semiconductor manufacturing apparatus |
US4981222A (en) * | 1988-08-24 | 1991-01-01 | Asq Boats, Inc. | Wafer boat |
US5054418A (en) * | 1989-05-23 | 1991-10-08 | Union Oil Company Of California | Cage boat having removable slats |
-
1993
- 1993-12-28 US US08/174,046 patent/US5417767A/en not_active Expired - Lifetime
-
1994
- 1994-05-19 TW TW083104559A patent/TW237559B/zh active
- 1994-12-27 JP JP32450994A patent/JPH07211658A/ja active Pending
- 1994-12-28 DE DE4446972A patent/DE4446972A1/de not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
DE4446972A1 (de) | 1995-06-29 |
JPH07211658A (ja) | 1995-08-11 |
US5417767A (en) | 1995-05-23 |
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