TW202502786A - 含烴末端基之化合物、表面處理劑及物品 - Google Patents
含烴末端基之化合物、表面處理劑及物品 Download PDFInfo
- Publication number
- TW202502786A TW202502786A TW113117395A TW113117395A TW202502786A TW 202502786 A TW202502786 A TW 202502786A TW 113117395 A TW113117395 A TW 113117395A TW 113117395 A TW113117395 A TW 113117395A TW 202502786 A TW202502786 A TW 202502786A
- Authority
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- Prior art keywords
- group
- trivalent
- carbon atoms
- atom
- compound
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Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/10—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton
- C07C323/11—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
- C07C323/12—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C211/00—Compounds containing amino groups bound to a carbon skeleton
- C07C211/01—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to acyclic carbon atoms
- C07C211/02—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
- C07C211/03—Monoamines
- C07C211/07—Monoamines containing one, two or three alkyl groups, each having the same number of carbon atoms in excess of three
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/10—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C271/16—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by singly-bound oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1896—Compounds having one or more Si-O-acyl linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/21—Cyclic compounds having at least one ring containing silicon, but no carbon in the ring
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/18—Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Materials Engineering (AREA)
- Silicon Polymers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023080539 | 2023-05-16 | ||
| JP2023-080539 | 2023-05-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW202502786A true TW202502786A (zh) | 2025-01-16 |
Family
ID=93519618
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW113117395A TW202502786A (zh) | 2023-05-16 | 2024-05-10 | 含烴末端基之化合物、表面處理劑及物品 |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP4714960A1 (https=) |
| JP (1) | JPWO2024237105A1 (https=) |
| KR (1) | KR20260009314A (https=) |
| CN (1) | CN121127480A (https=) |
| TW (1) | TW202502786A (https=) |
| WO (1) | WO2024237105A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025115584A1 (ja) * | 2023-11-30 | 2025-06-05 | 信越化学工業株式会社 | 炭化水素末端基含有化合物、被膜形成用硬化性組成物、硬化被膜及び物品 |
| WO2026042497A1 (ja) * | 2024-08-23 | 2026-02-26 | 信越化学工業株式会社 | 表面処理剤組成物、ペレット、及び物品 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103551075B (zh) | 2005-04-01 | 2016-07-06 | 大金工业株式会社 | 表面改性剂 |
| EP1869103B1 (en) | 2005-04-01 | 2017-05-03 | Daikin Industries, Ltd. | Surface modifier, article with a coated surface and method of coating |
| JP2010084062A (ja) * | 2008-10-01 | 2010-04-15 | Momentive Performance Materials Inc | 室温硬化性オルガノポリシロキサン組成物 |
| JP5235026B2 (ja) | 2010-09-28 | 2013-07-10 | 信越化学工業株式会社 | フルオロオキシアルキレン基含有ポリマー組成物および該組成物を含む表面処理剤並びに該表面処理剤で表面処理された物品 |
| JP2012157856A (ja) | 2011-01-13 | 2012-08-23 | Central Glass Co Ltd | 防汚性物品及びその製造方法 |
| JP5857942B2 (ja) | 2011-11-30 | 2016-02-10 | 信越化学工業株式会社 | 蒸着用フッ素系表面処理剤及び該表面処理剤で蒸着処理された物品 |
| JP6451279B2 (ja) | 2014-03-31 | 2019-01-16 | 信越化学工業株式会社 | フルオロポリエーテル基含有ポリマー変性シラン、表面処理剤及び物品 |
| US9422499B2 (en) * | 2014-03-31 | 2016-08-23 | Exxonmobil Research And Engineering Company | Low viscosity, low volatility lubricating oil basestocks |
| KR102483565B1 (ko) | 2016-06-10 | 2023-01-02 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 플루오로폴리에터기 함유 폴리머, 표면처리제 및 물품 |
| JP2018118940A (ja) * | 2017-01-27 | 2018-08-02 | モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 | 熱伝導性ポリシロキサン組成物用表面処理剤 |
| KR20240161847A (ko) | 2017-10-26 | 2024-11-12 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 친유성 기 함유 오가노실란 화합물, 표면처리제 및 물품 |
| JPWO2023181867A1 (https=) * | 2022-03-24 | 2023-09-28 | ||
| WO2023204021A1 (ja) * | 2022-04-19 | 2023-10-26 | Agc株式会社 | 化合物、組成物、表面処理剤、物品の製造方法、及び物品 |
| EP4570877A4 (en) * | 2022-08-10 | 2025-12-03 | Daikin Ind Ltd | SURFACE TREATMENT AGENT |
-
2024
- 2024-05-01 KR KR1020257039331A patent/KR20260009314A/ko active Pending
- 2024-05-01 JP JP2025520508A patent/JPWO2024237105A1/ja active Pending
- 2024-05-01 WO PCT/JP2024/016780 patent/WO2024237105A1/ja not_active Ceased
- 2024-05-01 CN CN202480030817.5A patent/CN121127480A/zh active Pending
- 2024-05-01 EP EP24807059.1A patent/EP4714960A1/en active Pending
- 2024-05-10 TW TW113117395A patent/TW202502786A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2024237105A1 (https=) | 2024-11-21 |
| CN121127480A (zh) | 2025-12-12 |
| EP4714960A1 (en) | 2026-03-25 |
| KR20260009314A (ko) | 2026-01-19 |
| WO2024237105A1 (ja) | 2024-11-21 |
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