TW202425241A - Package - Google Patents
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- TW202425241A TW202425241A TW112129169A TW112129169A TW202425241A TW 202425241 A TW202425241 A TW 202425241A TW 112129169 A TW112129169 A TW 112129169A TW 112129169 A TW112129169 A TW 112129169A TW 202425241 A TW202425241 A TW 202425241A
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- 239000011229 interlayer Substances 0.000 claims description 113
- 239000010410 layer Substances 0.000 claims description 81
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- 238000004806 packaging method and process Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 description 37
- 238000000034 method Methods 0.000 description 26
- 229910000679 solder Inorganic materials 0.000 description 24
- 239000013078 crystal Substances 0.000 description 20
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- 230000015572 biosynthetic process Effects 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
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- 239000010937 tungsten Substances 0.000 description 3
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- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
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- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
Description
本發明係關於一種封裝體,特別是關於具有由陶瓷形成的框部之封裝體。The present invention relates to a package, and more particularly to a package having a frame portion formed of ceramic.
作為使用陶瓷坯片製造之陶瓷零件,已知水晶振動子用之封裝體。一般的水晶振動子,具有水晶坯料、具備收納水晶坯料的空腔之封裝體、及用於將空腔密封之蓋部。封裝體,具有成為空腔的底面之基板部、將空腔包圍之框部、及設置於此框部上之金屬化層。使用焊料將蓋部接合至金屬化層。藉此,確保空腔的氣密性。As a ceramic component manufactured using a ceramic blank, a package for a crystal oscillator is known. A general crystal oscillator has a crystal blank, a package having a cavity for accommodating the crystal blank, and a cover for sealing the cavity. The package has a substrate portion that serves as the bottom surface of the cavity, a frame portion that surrounds the cavity, and a metallized layer provided on the frame portion. The cover is bonded to the metallized layer using solder. In this way, the airtightness of the cavity is ensured.
封裝體的框部上之金屬化層,通常,與接地電位用之電極墊電性短路。此電氣路徑,一般而言,可經由貫通框部之介層電極而確保。然而,隨著封裝體的小型化之進展,框部的材料寬度(框部的內緣與外緣之間的尺寸)亦變小,與其相應之微細介層電極的形成亦變得困難。具體而言,變得難以將微細介層電極用的微細介層孔,形成在藉由煅燒而成為框部之坯片。作為介層孔之一般的形成方法,有使用具有銷的形狀之模具的情況,若為了使介層孔微細化而將銷的形狀微細化,則容易使銷的機械強度不足。因而,例如依日本特開2007-27592號公報所揭露之技術,則取代介層電極,於框部的內壁面上,設置具有略月牙形的形狀之城垛形電極。The metallization layer on the frame of the package is usually electrically short-circuited with the electrode pad for ground potential. This electrical path can generally be ensured by an interlayer electrode penetrating the frame. However, as the miniaturization of the package progresses, the material width of the frame (the dimension between the inner and outer edges of the frame) also becomes smaller, and the formation of the corresponding fine interlayer electrode becomes difficult. Specifically, it becomes difficult to form fine interlayer holes for fine interlayer electrodes in the green sheet that is formed into the frame by calcination. As a general method for forming a via hole, a mold having a pin shape is used. However, if the pin shape is miniaturized in order to miniaturize the via hole, the mechanical strength of the pin is likely to be insufficient. Therefore, according to the technology disclosed in Japanese Patent Application Laid-Open No. 2007-27592, a battlement-shaped electrode having a crescent shape is provided on the inner wall surface of the frame instead of the via electrode.
如同上述公報之技術般地取代介層電極而將城垛形電極設置在空腔的側壁之情況,相較於由陶瓷形成的框部,使對焊料具有高潤濕性之電極在空腔的內壁沿著厚度方向縱斷。因此,於使用焊料之接合步驟中,焊料容易沿著城垛形電極往空腔中流入。一旦流入的焊料與水晶坯料接觸,則有對水晶振動子之機械性能造成不良影響的情形。此等對於機械特性之不良影響,在安裝於封裝體的元件為水晶坯料之情況特別受到擔憂,但在其他壓電元件之情況亦有發生的情形。進一步,只要安裝於封裝體之元件為電氣元件,則例如對電氣特性的不良影響如未預期之短路等受到擔憂。因此,要點在於避免焊料的流入,在此觀點中,相較於城垛形電極,介層電極更為適宜。由於對小型封裝體而言亦存在此等需求,因而期望一種技術,可與框部小的材料寬度對應而形成介層電極用之微細介層孔。When the interlayer electrode is replaced with a crenellated electrode on the side wall of the cavity as in the technique of the above-mentioned publication, the electrode having high wettability to solder is longitudinally cut along the thickness direction of the inner wall of the cavity compared to the frame formed by ceramic. Therefore, in the joining step using solder, the solder easily flows into the cavity along the crenellated electrode. Once the flowing solder contacts the crystal blank, it may cause adverse effects on the mechanical properties of the crystal oscillator. Such adverse effects on mechanical properties are particularly concerned when the component mounted on the package body is a crystal blank, but they may also occur in the case of other piezoelectric components. Furthermore, as long as the components mounted in the package are electrical components, there is a concern about adverse effects on electrical characteristics such as unexpected short circuits. Therefore, it is important to avoid the inflow of solder, and from this point of view, interlayer electrodes are more suitable than battlement-shaped electrodes. Since such a demand also exists for small packages, a technology is desired that can form fine interlayer holes for interlayer electrodes corresponding to the small material width of the frame.
於日本特開2009-234074號公報揭露一種方法,將作為介層孔的微細貫通孔,藉由雷射加工技術形成在陶瓷坯片。具體而言,將直徑30μm至50μm的貫通孔,利用紫外線雷射形成在厚度250μm以下之陶瓷坯片。如此地藉由雷射加工形成相對於厚度使直徑較小的貫通孔之情況,被指出存在「貫通孔具有推拔形狀」的傾向。而於上述公報中,貫通孔之推拔形狀,在難以對於貫通孔充填導體膠之方面被視作問題。因而,於上述公報的技術中,檢討可使推拔率為60%以上之雷射光照射條件。此處,推拔率係藉由推拔的直徑比而定義,推拔率100%係指貫通孔不具有推拔形狀,此外,較小的推拔率,意味較陡峭的推拔形狀。 [習知技術文獻] [專利文獻] Japanese Patent Publication No. 2009-234074 discloses a method of forming fine through holes, which serve as vias, in a ceramic green sheet by means of laser processing technology. Specifically, through holes with a diameter of 30 μm to 50 μm are formed in a ceramic green sheet with a thickness of less than 250 μm using an ultraviolet laser. In the case of forming through holes with a smaller diameter relative to the thickness by laser processing in this way, it is pointed out that there is a tendency for "the through holes to have a pushed-out shape." In the above-mentioned publication, the pushed-out shape of the through holes is considered to be a problem in that it is difficult to fill the through holes with a conductive glue. Therefore, in the technology of the above-mentioned publication, the laser light irradiation conditions that can make the push-out rate above 60% are examined. Here, the push-out rate is defined by the ratio of the push-out diameter. A push-out rate of 100% means that the through hole has no push-out shape. In addition, a smaller push-out rate means a steeper push-out shape. [Known technical literature] [Patent literature]
專利文獻1:日本特開2007-27592號公報 專利文獻2:日本特開2009-234074號公報 Patent document 1: Japanese Patent Publication No. 2007-27592 Patent document 2: Japanese Patent Publication No. 2009-234074
[本發明所欲解決的問題][Problems to be solved by the present invention]
依本案發明人等之檢討,若將上述雷射加工技術,單純在將介層電極設置於封裝體的框部之目的下應用,則有難以充分地確保空腔的氣密性之情形。隨著封裝體的小型化之進展,框部的材料寬度變得越小,而使此一問題變得越嚴重。因此,在確保氣密性的觀點上,前述城垛形電極較為適宜。另一方面,如同前述,若提供城垛形電極,則存在焊料之往空腔的流入成為問題之情形。由上述內容來看,在習知技術中,難以確保空腔之足夠的氣密性並防止焊料之往空腔中的流入。According to the review of the inventors of this case, if the above-mentioned laser processing technology is applied simply for the purpose of setting the interlayer electrode in the frame of the package, it is difficult to fully ensure the airtightness of the cavity. As the miniaturization of the package progresses, the material width of the frame becomes smaller, making this problem more serious. Therefore, from the perspective of ensuring airtightness, the above-mentioned battlement-shaped electrode is more suitable. On the other hand, as mentioned above, if a battlement-shaped electrode is provided, there is a situation where the inflow of solder into the cavity becomes a problem. From the above content, it can be seen that in the known technology, it is difficult to ensure sufficient airtightness of the cavity and prevent the inflow of solder into the cavity.
本發明係為了解決上述問題而提出,其目的在於提供一種封裝體,可確保空腔之足夠的氣密性,並防止焊料之往空腔中的流入。 [解決問題之技術手段] The present invention is proposed to solve the above-mentioned problem, and its purpose is to provide a package that can ensure sufficient airtightness of the cavity and prevent solder from flowing into the cavity. [Technical means for solving the problem]
態樣1為一種封裝體,設置有空腔;包含由陶瓷形成的框部,該框部具有第1面、及在厚度方向中與該第1面反向之第2面;該第2面,具有將該空腔包圍的內緣、及將該內緣包圍的外緣;該封裝體,更包含由陶瓷形成的基板部;該基板部具有第3面,該第3面具備支持該框部之該第2面的部分、及面向該空腔的部分;該封裝體,更包含:基板電極層,設置於該基板部之該第3面上;第1介層電極,沿著沿該厚度方向的第1中心軸而延伸,具有位於該框部之該第1面且與該空腔離隔的第1端面、及與該第1端面反向且位於該框部內的第1底面;以及第2介層電極,沿著沿該厚度方向的第2中心軸而延伸,具有於該框部內與該第1介層電極之該第1底面電性連接的第2端面、及與該第2端面反向且在該框部之該第2面與該基板電極層接觸的第2底面;俯視時,該第2介層電極之該第2底面,具有從該框部之該第2面的該內緣算起之最小尺寸LI、及從該框部之該第2面的該外緣算起之最小尺寸LO,滿足LO>LI;該第1介層電極之該第1中心軸,相較於該第2介層電極之該第2中心軸,更遠離該框部的該內緣。
態樣2為如態樣1之封裝體,其中,該第2端面具有直徑DA,該第2底面具有較該直徑DA更小的直徑DB。Aspect 2 is a package body as in
態樣3為如態樣1或態樣2之封裝體,其中,該第2介層電極具有50μm以下之最大直徑。Aspect 3 is a package as in
態樣4為如態樣1至態樣3中任一態樣之封裝體,其中,該框部之該第2面的該內緣與該外緣之間的最小尺寸為200μm以下。Aspect 4 is a package body as in any one of
態樣5為如態樣1至態樣4中任一態樣之封裝體,其中,滿足LO≧LI×1.5。Aspect 5 is a package body as in any one of
態樣6為如態樣1至態樣5中任一態樣之封裝體,其中,該第2介層電極,具有於該厚度方向中從該第2端面以推拔形狀延伸的部分。Aspect 6 is a package body as in any one of
態樣7為如態樣6之封裝體,其中,該推拔形狀具有5度以上之推拔角。
態樣8為如態樣1至態樣7中任一態樣之封裝體,其中,該框部,具有將該第1面與該第2面的該外緣連結之外壁面;該外壁面,具有與該第1面連結之煅燒面、及與該第2面連結之破斷面。Aspect 8 is a package body as in any one of
態樣9為如態樣1至態樣8中任一態樣之封裝體,其中,俯視時,該第2介層電極之該第2端面,與該第1介層電極之該第1底面分離。Aspect 9 is a package body as in any one of
態樣10為如態樣1至態樣8中任一態樣之封裝體,其中,俯視時,該第2介層電極之該第2端面,與該第1介層電極之該第1底面至少部分地重疊。Aspect 10 is a package body as in any one of
態樣11為如態樣1至態樣8中任一態樣之封裝體,其中,俯視時,該第2介層電極之該第2端面,包含於該第1介層電極之該第1底面。Aspect 11 is a package body as in any one of
態樣12為如態樣1至態樣11中任一態樣之封裝體,其中,該第1介層電極,具有於該厚度方向中從該第1端面以推拔形狀延伸的部分。Aspect 12 is a package body as in any one of
態樣13為如態樣12之封裝體,其中,該第1介層電極,相較於該第2介層電極,具有在厚度方向較大的尺寸。 [本發明之效果] Aspect 13 is a package as in aspect 12, wherein the first dielectric electrode has a larger dimension in the thickness direction than the second dielectric electrode. [Effects of the present invention]
依態樣1,則第1,由於以滿足LO>LI的方式配置第2介層電極之第2底面,故在第2介層電極之第2底面的外緣與框部之第2面的外緣之間,可大程度地確保陶瓷間的疊層界面之配置處。此處,陶瓷間的疊層界面,相較於金屬與陶瓷的疊層界面,具有高氣密性。因此,可抑制因沿著疊層界面之漏洩所導致的空腔之氣密性的降低。第2,由於第1介層電極之第1中心軸,相較於第2介層電極之第2中心軸,更遠離框部的內緣,故即便使第2介層電極位於空腔附近,近至第2介層電極之第2底面到達空腔的程度,仍可使第1介層電極之第1端面位於與空腔離隔的位置。藉此,避免第1介層電極之側面在第1介層電極之第1端面附近往空腔露出。因此,可防止因在框部之第1面具有第1端面的第1介層電極所導致的焊料之往空腔中的流入。由上述內容來看,可確保空腔之足夠的氣密性,並防止焊料之往空腔中的流入。According to
依態樣2,則第2端面具有直徑DA,第2底面具有較直徑DA更小的直徑DB。藉此,在第2介層電極之第2底面的外緣與框部之第2面的外緣之間,可更大程度地確保陶瓷間的疊層界面之配置處。因此,可更為抑制因沿著疊層界面之漏洩所導致的空腔之氣密性的降低。According to aspect 2, the second end surface has a diameter DA, and the second bottom surface has a diameter DB smaller than the diameter DA. Thus, the arrangement position of the stacking interface between ceramics can be ensured to a greater extent between the outer edge of the second bottom surface of the second dielectric electrode and the outer edge of the second surface of the frame. Therefore, the reduction of the airtightness of the cavity due to leakage along the stacking interface can be further suppressed.
依態樣3,則第2介層電極具有50μm以下之最大直徑。藉此,可使框部之寬度尺寸亦微細化。此微細化越進展,則沿著基板部與框部之間的疊層界面之漏洩容易成為問題,但藉由上述理由,有效地抑制此等問題。According to aspect 3, the second dielectric electrode has a maximum diameter of 50 μm or less. This allows the width of the frame to be miniaturized. As miniaturization progresses, leakage along the laminate interface between the substrate and the frame becomes more likely to become a problem, but these problems can be effectively suppressed for the reasons described above.
依態樣4,則框部之第2面的內緣與外緣之間最小尺寸為200μm以下。如此地,微細化越進展,則沿著基板部與框部之間的疊層界面之漏洩容易成為問題,但藉由上述理由,有效地抑制此等問題。According to aspect 4, the minimum dimension between the inner edge and the outer edge of the second surface of the frame is 200 μm or less. As the miniaturization progresses, leakage along the lamination interface between the substrate and the frame becomes more likely to become a problem, but such problems are effectively suppressed for the reasons described above.
依態樣5,則滿足LO≧LI×1.5。藉此,可更充分地抑制因沿著基板部與框部之間的疊層界面之漏洩所導致的空腔之氣密性的降低。According to Aspect 5, LO≧LI×1.5 is satisfied. This can more effectively suppress the reduction in the airtightness of the cavity due to leakage along the lamination interface between the substrate portion and the frame portion.
依態樣6,則第2介層電極,具有於厚度方向中從第2端面以推拔形狀延伸的部分。藉此,在第2介層電極之第2底面的外緣與框部之第2面的外緣之間,可更大程度地確保陶瓷間的疊層界面之配置處。因此,可更為抑制因沿著疊層界面之漏洩所導致的空腔之氣密性的降低。According to aspect 6, the second dielectric electrode has a portion extending in a pushed-out shape from the second end surface in the thickness direction. Thus, the arrangement position of the stacking interface between ceramics can be ensured to a greater extent between the outer edge of the second bottom surface of the second dielectric electrode and the outer edge of the second surface of the frame portion. Therefore, the reduction in the airtightness of the cavity due to leakage along the stacking interface can be further suppressed.
依態樣7,則推拔形狀具有5度以上之推拔角。藉此,在第2介層電極之第2底面的外緣與框部之第2面的外緣之間,可更大程度地確保陶瓷間的疊層界面之配置處。因此,可更為抑制因沿著疊層界面之漏洩所導致的空腔之氣密性的降低。According to
依態樣8,則框部,具有將第1面與第2面的外緣連結之外壁面;外壁面,具有與第1面連結之煅燒面、及與第2面連結之破斷面。破斷面係藉由斷裂步驟而形成,但由於該步驟差異的影響,而有框部之第2面的外緣與介層電極的底面之間的距離變小之情形。然而,藉由如同前述地滿足LO>LI,而使該距離不易變得過小。因此,可防止因該距離過小所導致的氣密性之不足。According to aspect 8, the frame has an outer wall surface connecting the outer edges of the first and second surfaces; the outer wall surface has a calcined surface connected to the first surface and a fracture surface connected to the second surface. The fracture surface is formed by a fracture step, but due to the influence of the difference in the step, the distance between the outer edge of the second surface of the frame and the bottom surface of the intermediate electrode becomes smaller. However, by satisfying LO>LI as described above, the distance is not easy to become too small. Therefore, the lack of airtightness caused by the distance being too small can be prevented.
依態樣9,則俯視時,第2介層電極之第2端面,與第1介層電極之第1底面分離。藉此,在俯視時使第1介層電極相對地配置於外側且第2介層電極相對地配置於內側的設計中,變得更容易使俯視時之第1介層電極與第2介層電極的位置性差異大。藉由將第1介層電極配置於較外側,而可更確實地防止因第1介層電極所導致的焊料之往空腔中的流入。藉由將第2介層電極配置於較內側,而可更充分地確保空腔的氣密性。According to aspect 9, the second end surface of the second interlayer electrode is separated from the first bottom surface of the first interlayer electrode when viewed from above. Thus, in a design in which the first interlayer electrode is arranged relatively outside and the second interlayer electrode is arranged relatively inside when viewed from above, it becomes easier to make the positional difference between the first interlayer electrode and the second interlayer electrode when viewed from above large. By arranging the first interlayer electrode at a relatively outer side, the inflow of solder into the cavity caused by the first interlayer electrode can be more reliably prevented. By arranging the second interlayer electrode at a relatively inner side, the airtightness of the cavity can be more fully ensured.
依態樣10,則第2介層電極之第2端面,至少部分地與第1介層電極之第1底面重疊。藉此,則容易將第2介層電極與第1介層電極電性連接。According to aspect 10, the second end surface of the second dielectric electrode at least partially overlaps with the first bottom surface of the first dielectric electrode. Thus, the second dielectric electrode can be easily electrically connected to the first dielectric electrode.
依態樣11,則第2介層電極之第2端面,包含於第1介層電極之第1底面。藉此,於封裝體的製造中,將充填第1介層電極的第1介層孔,形成為坯體中的非貫通孔後,藉由將該非貫通孔之底面加工,而可形成充填第2介層電極的第2介層孔。因此,於封裝體的製造中,無須將第1介層電極所位於的部分、及第2介層電極所位於的部分,作為需要彼此疊層之單獨的坯體而處理。因此,可使封裝體的製造之疊層步驟簡化。According to aspect 11, the second end surface of the second interlayer electrode is included in the first bottom surface of the first interlayer electrode. Thus, in the manufacture of the package, after the first interlayer hole filled with the first interlayer electrode is formed as a non-through hole in the blank, the second interlayer hole filled with the second interlayer electrode can be formed by processing the bottom surface of the non-through hole. Therefore, in the manufacture of the package, it is not necessary to treat the portion where the first interlayer electrode is located and the portion where the second interlayer electrode is located as separate blanks that need to be stacked on each other. Therefore, the stacking step of the manufacture of the package can be simplified.
依態樣12,則第1介層電極,具有於厚度方向中從第1端面以推拔形狀延伸的部分。藉此,可更大程度地確保包含第1介層電極的層與包含第2介層電極的層之間的假想面中,第1介層電極之第1底面與框部之外壁面間的距離。上述假想面,相當於封裝體的製造方法中之疊層界面,故有如剝離等疊層不良的情形。此等疊層不良,容易成為水分從空腔外往空腔內的侵入路徑,但藉由使上述距離增大,可更為抑制水分之往空腔內的侵入。藉此,可更充分地確保空腔的氣密性。According to aspect 12, the first dielectric electrode has a portion extending from the first end face in a push-out shape in the thickness direction. Thereby, the distance between the first bottom surface of the first dielectric electrode and the outer wall surface of the frame portion in the imaginary plane between the layer including the first dielectric electrode and the layer including the second dielectric electrode can be ensured to a greater extent. The above-mentioned imaginary plane is equivalent to the stacking interface in the manufacturing method of the package body, so there are situations such as peeling and other poor stacking. Such poor stacking can easily become a path for moisture to invade from the outside of the cavity into the cavity, but by increasing the above-mentioned distance, the invasion of moisture into the cavity can be further suppressed. Thereby, the airtightness of the cavity can be more fully ensured.
態樣13為如態樣12之封裝體,其中,該第1介層電極,相較於該第2介層電極,具有在厚度方向較大的尺寸。藉此,可更大程度地確保包含第1介層電極的層與包含第2介層電極的層之間的假想面中,第1介層電極之第1底面與框部之外壁面間的距離。因此,可更為抑制水分之往空腔內的侵入。藉此,可更充分地確保空腔的氣密性。Aspect 13 is a package as in aspect 12, wherein the first dielectric electrode has a larger dimension in the thickness direction than the second dielectric electrode. Thus, the distance between the first bottom surface of the first dielectric electrode and the outer wall surface of the frame in the imaginary plane between the layer including the first dielectric electrode and the layer including the second dielectric electrode can be ensured to a greater extent. Therefore, the intrusion of moisture into the cavity can be further suppressed. Thus, the airtightness of the cavity can be more fully ensured.
以下,依據圖式,針對本發明之實施形態予以說明。另,於一部分的圖式中,為了容易理解方向而顯示xyz直角座標系。該座標系之z方向,對應於後述厚度方向。此外,該座標系之xy面中的布置,對應於後述俯視圖。此外,本說明書中,在定義某方向的情況,沿該方向延伸之「推拔形狀」,係朝向該方向逐漸變窄之形狀,例如為直徑朝向該方向逐漸變小之形狀。Hereinafter, the implementation form of the present invention will be described according to the drawings. In addition, in some drawings, an xyz rectangular coordinate system is shown for easy understanding of directions. The z direction of the coordinate system corresponds to the thickness direction described later. In addition, the arrangement in the xy plane of the coordinate system corresponds to the top view described later. In addition, in this specification, when a certain direction is defined, the "pull-out shape" extending along the direction is a shape that gradually narrows toward the direction, for example, a shape whose diameter gradually decreases toward the direction.
<實施形態1>
圖1係概略顯示本實施形態1之水晶振動子900(電氣零件)的構成之俯視圖。圖2係沿著圖1的線II-II之概略剖面圖。圖3係概略顯示水晶振動子900(圖1)的製造方法中之緊接水晶坯料890(電氣元件)安裝後的構成之俯視圖。圖4係沿著圖3的線IV-IV之概略剖面圖。
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水晶振動子900,具備封裝體701、水晶坯料890、焊料960、及蓋部980。於封裝體701設置空腔CV。水晶坯料890,收納在空腔CV內,安裝於封裝體701的元件電極墊211及元件電極墊212上。蓋部980,藉由焊料960而與封裝體701的金屬化層600接合,藉此將空腔CV密封。焊料960,一般而言,宜由含有金的合金形成,例如由含有金及錫的合金,換而言之,由Au-Sn系合金形成。蓋部980,由金屬形成,例如由含有鐵及鎳的合金形成。另,本說明書中,將合金視作金屬之一種。The
金屬化層600,例如,由含有鉬及鎢之至少任一者的金屬形成。於金屬化層600的表面(面向焊料960的面),亦可設置鍍層,一般而言,設置鍍金層。此外,亦可設置鍍鎳層作為鍍金層之基底。本實施形態中,僅藉由焊料960,將在封裝體701的框部120之框頂面SF1上直接設置的金屬化層600,與蓋部980之間接合。The
圖5係概略顯示封裝體701的構成之俯視圖。圖6係沿著圖5的線VI-VI之概略剖面圖。封裝體701,具有陶瓷部100、元件電極墊211、元件電極墊212、及封裝體電極墊301~304。此外,封裝體701,具有設置於陶瓷部100之供電氣配線所用的構成,細節於之後詳述。FIG5 is a top view schematically showing the structure of the
陶瓷部100,由陶瓷形成,宜具有氧化物作為主成分,更宜具有氧化鋁作為主成分,例如實質上由氧化鋁形成。陶瓷部100,包含基板部110及框部120。基板部110之材料,亦可與框部120之材料相同。框部120,在厚度方向(圖6的z方向)中疊層於基板部110。框部120,具有框頂面SF1(第1面)、及框底面SF2(在厚度方向中與第1面反向之第2面)。此外,框部120,具有將框頂面SF1與框底面SF2彼此連結之內壁面,該內壁面為空腔CV之側壁。基板部110具有基板頂面SF3(第3面)。基板頂面SF3,具有支持框部120之框底面SF2的支持面部分SF3S、及面向空腔CV的空腔面部分SF3C。空腔面部分SF3C成為空腔CV之底面。The
元件電極墊211及元件電極墊212(圖5),面向空腔CV而配置於陶瓷部100(圖6)。具體而言,元件電極墊211及元件電極墊212,配置於基板部110(圖6)的頂面(面向空腔CV的面)上。封裝體電極墊301~304(圖5),於空腔CV外配置在陶瓷部100(圖6)。具體而言,封裝體電極墊301~304,配置於基板部110(圖6)之底面(與面向空腔CV的面反向之面)上。The
中繼電極220(圖5),設置於基板部110(圖6)之基板頂面SF3上。中繼電極220,至少部分地配置於支持面部分SF3S(圖6)上。因此,中繼電極220(圖5),至少部分地受到框部120覆蓋。中繼電極220,進一步,亦可具有未受框部120覆蓋而配置在空腔CV之底面的部分。換而言之,中繼電極220,亦可僅受到框部120部分地覆蓋。The relay electrode 220 (FIG. 5) is disposed on the substrate top surface SF3 of the substrate portion 110 (FIG. 6). The
圖7係將金屬化層600(圖5)及框部120(圖6)的圖示省略之俯視圖。圖8係概略顯示圖7之基板部110及基板介層電極411~414,並將封裝體電極墊301~304以虛線顯示之俯視圖。Fig. 7 is a top view in which the metallization layer 600 (Fig. 5) and the frame 120 (Fig. 6) are omitted. Fig. 8 is a top view schematically showing the
於陶瓷部100的基板部110,在其頂面附近中嵌入配線層401~403。配線層401與元件電極墊211接觸,配線層402與元件電極墊212接觸,配線層403與中繼電極220接觸。在不阻礙其等之接觸的範圍,配線層401~403,亦可受到作為基板部110之一部分的絕緣膜110i(參考圖11)被覆,特別是元件電極墊211與配線層403之間,藉由絕緣膜110i而絕緣。藉由配線層403及中繼電極220,構成基板電極層200。The wiring layers 401 to 403 are embedded in the
封裝體701,具有嵌入至陶瓷部100之基板部110中的基板介層電極411~414。基板介層電極411,將配線層402與封裝體電極墊301彼此連接。基板介層電極412,將配線層403與封裝體電極墊302彼此連接。基板介層電極413,將配線層401與封裝體電極墊303彼此連接。基板介層電極414,將配線層403與封裝體電極墊304彼此連接。The
由上述構成來看,元件電極墊211與封裝體電極墊303電性連接,元件電極墊212與封裝體電極墊301電性連接,中繼電極220與封裝體電極墊302及封裝體電極墊304電性連接。According to the above structure, the
圖9係將圖5之金屬化層600的圖示省略之俯視圖。圖10係圖9之部分放大圖。圖11係沿著圖5的線XI-XI之概略剖面圖。Fig. 9 is a top view in which the
框部120之框底面SF2,具有將空腔CV包圍的內緣EI、及將內緣EI包圍的外緣EO。內緣EI與外緣EO之間的最小尺寸WD(圖10),可為200μm以下,一般為20μm以上110μm以下。框部120,具有將框頂面SF1與框底面SF2的外緣EO連結之外壁面SF4。此外,框部120,具有將框頂面SF1與框底面SF2的內緣EI連結之內壁面(圖11之左面),內壁面面向空腔CV。本實施形態中,外壁面SF4,具有與框頂面SF1連結之煅燒面SF4A、及與框底面SF2連結之破斷面SF4B。破斷面SF4B,亦可為對於框頂面SF1大致垂直的面(於圖11中垂直於z方向的面)。煅燒面SF4A,如圖11所示,亦可為將框頂面SF1與破斷面SF4B之間倒角的斜角面。換而言之,煅燒面SF4A的法線方向,亦可與框頂面SF1及破斷面SF4B的法線方向不同,且亦可位於其等之間。The frame bottom surface SF2 of the
如同前述,藉由配線層403及中繼電極220,於基板部110之基板頂面SF3上構成基板電極層200。此外,如同前述,基板部110,作為其一部分,具有絕緣膜110i(圖11)。作為變形例,亦可依封裝體的設計而將絕緣膜110i省略。此外,基板電極層200,亦可僅藉由配線層403及中繼電極220之任一方構成。例如,基板電極層200,亦可將中繼電極220省略但具有配線層403,於此一情況中,亦可使配線層403與絕緣膜110i的邊界位置(圖11之配線層403的右端位置)往支持面部分SF3S上之中繼電極220的端位置(圖11之中繼電極220的右端位置)偏移,亦可將中繼電極220省略。此外,面向空腔CV之絕緣膜110i的端,亦可變形而到達至框部120,此一情況,基板電極層200亦可藉由絕緣膜110i從空腔CV分隔。此外,基板電極層200,一般如圖11所示,跨越支持面部分SF3S與空腔面部分SF3C,但作為變形例,亦可僅配置於支持面部分SF3S上。此外,基板電極層200,如圖11所示,宜具有從框部120之框底面SF2的外緣EO離隔之端(圖11之右端)。換而言之,該端宜未到達至外緣EO。藉此,使成為電極層200之金屬與陶瓷的疊層界面,未到達至外緣EO。此一結果,具有較陶瓷彼此的界面之氣密性更低的氣密性之金屬與陶瓷的界面,未到達至外緣EO。因此,可抑制因電極層200所導致之氣密性的降低。As described above, the
封裝體701,作為設置在框部120的供電氣配線所用之構成,具有第1介層電極511、第2介層電極512、及框電極層550。此電氣配線,在框頂面SF1與框底面SF2之間將框部120貫通。The
第1介層電極511,具有第1端面SFA及第1底面SFJ。第1端面SFA,位於框頂面SF1,與空腔CV離隔。第1底面SFJ,於厚度方向(z軸方向)中與第1端面SFA反向,位於框部120內。第1介層電極511,沿著沿厚度方向的第1中心軸AX1而延伸。因此,俯視時,第1端面SFA的中心位置,與第1底面SFJ的中心位置大致相同。第1底面SFJ的直徑,亦可較第1端面SFA的直徑更小。第1介層電極511,亦可具有於厚度方向中從第1端面SFA以推拔形狀延伸的部分。第1介層電極511的高度(厚度方向的尺寸),例如為20μm以上80μm以下。The
第2介層電極512,具有第2端面SFK及第2底面SFB。第2端面SFK,於框部120內與第1介層電極511之第1底面SFJ電性連接;本實施形態中,經由框電極層550而連接。第2底面SFB,於厚度方向(z軸方向)中與第2端面SFK反向。第2底面SFB,在框底面SF2與基板電極層200接觸,本實施形態中與中繼電極220接觸。如同前述,中繼電極220與配線層403接觸;於配線層403(圖7),連接基板介層電極412及基板介層電極414。因此,將基板介層電極412及基板介層電極414,與第2介層電極512電性連接。進一步,第1介層電極511之第1端面SFA,與金屬化層600(圖6)接觸。因此,金屬化層600,經由基板介層電極412及基板介層電極414,分別與封裝體電極墊302及封裝體電極墊304電性連接(參考圖8)。The
框電極層550,宜不與框部120之外壁面SF4及內壁面的至少一方接觸。其原因在於,若使框電極層550與外壁面SF4及內壁面兩方接觸,則以使其等彼此連接的方式延伸之金屬與陶瓷的疊層界面,降低空腔CV的氣密性。框電極層550,更宜不與框部120之外壁面SF4接觸。藉此,成為框電極層550之金屬與陶瓷的疊層界面,未到達至外壁面SF4。此一結果,具有較陶瓷彼此的界面之氣密性更低的氣密性之金屬與陶瓷的界面,未到達至外壁面SF4。因此,可抑制因框電極層550所導致的氣密性之降低。The
第2端面SFK具有直徑DA,第2底面SFB具有直徑DB。直徑DB較直徑DA更小。直徑DB之相對於直徑DA的比例,亦可為30%以上70%以下。俯視時,第2介層電極512之第2底面SFB,具有從框底面SF2的內緣EI算起之最小尺寸LI、及從框底面SF2的外緣EO算起之最小尺寸LO。第2介層電極512之最大直徑,較框部120之最小尺寸WD更小,亦可為50μm以下。此外,直徑DA,較框部120之最小尺寸WD更小,亦可為50μm以下。第2介層電極512,亦可具有於厚度方向中從第2端面SFK以推拔形狀延伸的部分。推拔形狀,亦可具有5度以上之推拔角。推拔角,於圖11的剖面視圖中,係第2介層電極512具有推拔形狀的部分之側面與厚度方向(z方向)間的角度。第2介層電極512,亦可全體具有推拔形狀,此一情況,推拔率(直徑DB之相對於直徑DA的百分率),亦可未滿60%。第2介層電極512的高度(厚度方向的尺寸),例如為20μm以上80μm以下。第1介層電極511,相較於第2介層電極512,亦可具有較大的高度(在厚度方向較大的尺寸)。此一特徵,在第1介層電極511具有於厚度方向中從第1端面SFA以推拔形狀延伸的部分之情況特別適宜。The second end surface SFK has a diameter DA, and the second bottom surface SFB has a diameter DB. The diameter DB is smaller than the diameter DA. The ratio of the diameter DB to the diameter DA may also be greater than 30% and less than 70%. When viewed from above, the second bottom surface SFB of the second
第2介層電極512,沿著沿厚度方向的第2中心軸AX2而延伸。因此,俯視時,第2端面SFK的中心位置,與第2底面SFB的中心位置大致相同。第1介層電極511之第1中心軸AX1,相較於第2介層電極512之第2中心軸AX2,更遠離框部120的內緣EI。本實施形態中,俯視時,第2介層電極512之第2端面SFK,與第1介層電極511之第1底面SFJ分離。The
俯視時(圖10),底面SFB,具有從框部120之框底面SF2的內緣EI算起之最小尺寸LI、及從框部120之框底面SF2的外緣EO算起之最小尺寸LO。滿足LO>LI,宜滿足LO≧LI×1.5。In a plan view ( FIG. 10 ), the bottom surface SFB has a minimum dimension LI from the inner edge EI of the frame bottom surface SF2 of the
於圖10所示之平面布置中,第1端面SFA、第1底面SFJ、第2端面SFK、及第2底面SFB的形狀,呈大致圓形形狀,但此等形狀亦可為因製造誤差而從幾何學上嚴格定義之圓形產生些許不同。此一情況,直徑DA及直徑DB,亦可藉由將端面SFA及底面SFB以圓形形狀進行近似而算出。In the planar layout shown in FIG10 , the shapes of the first end surface SFA, the first bottom surface SFJ, the second end surface SFK, and the second bottom surface SFB are generally circular, but these shapes may be slightly different from the strictly geometrically defined circle due to manufacturing errors. In this case, the diameter DA and the diameter DB can also be calculated by approximating the end surface SFA and the bottom surface SFB with a circular shape.
此外,於圖10所示之平面布置中,框底面SF2(參考圖11)的內緣EI,具有第1直線部(圖10之沿著x方向的直線部)、相對於第1直線部沿直角方向延伸的第2直線部(圖10之沿著y方向的直線部)、及將其等彼此連結的角部。最小尺寸LI,亦可為該角部之尺寸。俯視時之從第2中心軸AX2往第1中心軸AX1的偏移方向AS,如圖10所示,宜包含沿著第1直線部之方向成分(x方向成分)、及沿著第2直線部之方向成分(y方向成分)兩者。藉此,可使第1介層電極511,對於第2介層電極512往框部120之角部偏移。因此,容易確保第2介層電極512與框部120之外壁面SF4間的尺寸。然則,不存在此等顧慮之情況,偏移方向AS,亦可僅包含沿著第1直線部之方向成分(x方向成分)及沿著第2直線部之方向成分(y方向成分)的任一方。In addition, in the planar layout shown in FIG10, the inner edge EI of the frame bottom surface SF2 (refer to FIG11) has a first straight line portion (a straight line portion along the x direction in FIG10), a second straight line portion extending in a right angle direction relative to the first straight line portion (a straight line portion along the y direction in FIG10), and a corner portion connecting them. The minimum dimension LI may also be the dimension of the corner portion. The offset direction AS from the second center axis AX2 to the first center axis AX1 when viewed from above, as shown in FIG10, preferably includes both a directional component along the first straight line portion (x direction component) and a directional component along the second straight line portion (y direction component). In this way, the first
圖12至圖27,係用於說明一併製造複數個封裝體701的製造方法之圖。另,圖12~圖26,顯示較使圖26的狀態往圖27的狀態改變之煅燒步驟更早的狀態。因此,圖12~圖26中的各構成,與完成之封裝體701中的構成不同,由未煅燒之材料形成。然而,為了方便說明,在顯示較煅燒步驟更早之步驟的圖12~圖26中,仍賦予與表示經由煅燒步驟而獲得之封裝體701的構成之符號相同的符號。此外,為了方便說明,在由未煅燒之材料形成的上述構成之稱呼,亦有使用經由煅燒步驟而獲得之封裝體701中的構成之稱呼的情形。FIG. 12 to FIG. 27 are figures used to illustrate a manufacturing method for manufacturing a plurality of
圖12係概略顯示上述製造方法中之基板坯體GS的構成之部分俯視圖。圖13係概略顯示基板坯體GS的基板部110及基板介層電極411~414,並將封裝體電極墊301~304以虛線顯示之部分俯視圖。圖14係沿著圖12及圖13的線XIV-XIV之概略部分剖面圖。基板坯體GS,包含複數個區域UN0~UN4,其等最終各自成為封裝體701(圖6)的基板部110及其附近之構造。區域UN1~UN4,皆配置為與區域UN0相鄰。另,於圖12及圖13中,雖僅對於區域UN0顯示具體的構成,但區域UN1~UN4亦可亦具有同樣的構成。FIG. 12 is a partial top view schematically showing the structure of the substrate blank GS in the above-mentioned manufacturing method. FIG. 13 is a partial top view schematically showing the
另,本說明書中,用語「坯體」,係指在之後的步驟中煅燒之未煅燒的構成。坯體,一般為粉末成形體。為了容易處理,坯體,除了主成分以外,亦可包含玻璃成分與有機成分作為添加物。有機成分,例如亦可包含聚乙烯醇縮丁醛或丙烯酸。坯體之成形方法為任意方法,例如藉由刮刀法,形成作為坯體之至少一部分的坯片。亦可於此坯片上進一步附加坯體,此一附加,一般而言,係藉由在該坯片上印刷,或疊層其他坯片而施行。該印刷,一般係藉由網版印刷法施行。藉由煅燒而成為陶瓷部100(圖6)的坯體之主成分,例如亦可為氧化鋁粉末。藉由煅燒而成為第1介層電極511、第2介層電極512及基板電極層200(參考圖11)等配線構造的坯體之主成分,例如亦可為鎢(W)粉末、鉬(Mo)粉末、W粉末與Mo粉末的混合粉末、或W-Mo合金粉末。In addition, in this specification, the term "green body" refers to the uncalcined structure that is calcined in a subsequent step. The green body is generally a powder molded body. In order to facilitate handling, the green body may also contain glass components and organic components as additives in addition to the main component. The organic component may also contain polyvinyl butyral or acrylic acid, for example. The green body is formed by any method, such as by a doctor blade method to form a green sheet that is at least a part of the green body. A green body may be further added to the green sheet, and this addition is generally performed by printing on the green sheet, or by stacking other green sheets. The printing is generally performed by screen printing. The main component of the green body that is formed into the ceramic part 100 (Figure 6) by calcination may be, for example, aluminum oxide powder. The main component of the green body that is formed into the wiring structure such as the first
為了獲得基板坯體GS,首先,形成成為基板部110的坯片。對於該坯片,施行以沖壓加工進行之介層孔的形成、及電極膠之往該介層孔中的印刷,藉以形成成為基板介層電極411~414之坯體。於電極膠中,例如使鎢及鉬的至少任一種粉末分散。接著,對於該坯片施行電極膠的印刷,藉以形成成為配線層401~403之坯體。接著,對於該坯片,施行陶瓷膠的印刷,藉以形成成為絕緣膜110i之坯體。接著,對於該坯片施行電極膠的印刷,藉以形成成為元件電極墊211、212及中繼電極220之坯體。此外,在如同上述地形成成為基板介層電極411~414之坯體後的任意時序,對於該坯片施行電極膠的印刷,藉以形成成為封裝體電極墊301~304之坯體。In order to obtain the substrate blank GS, first, a blank that will become the
圖15~圖19係依序顯示與封裝體701(圖11)中之用於構成在厚度方向中配置第1介層電極511及金屬化層600的部分之構造的第1框部坯體GF1相關之步驟的部分剖面圖。圖中,以一點鏈線顯示斷裂面BR,沿著此線,施行後述斷裂步驟。Figures 15 to 19 are partial cross-sectional views showing the steps related to the first frame blank GF1 for forming the structure of the portion in the thickness direction where the first
參考圖15,作為第1框部坯體GF1,首先,形成包含成為作為框部120之一部分(圖11中之上部)的框上部120a之部分的單純的坯片。此一形成,例如亦可藉由刮刀法施行。構成第1框部坯體GF1之框上部120a的厚度,例如為30μm以上90μm以下。Referring to FIG. 15 , as the first frame blank GF1, first, a simple blank including a portion of the frame
參考圖16,藉由雷射加工,於框上部120a形成第1介層孔VH1。雷射加工用的雷射光,以從框頂面SF1往框上部120a中行進之方式照射。此一結果,第1介層孔VH1,容易沿從框頂面SF1往框上部120a中的方向具有推拔形狀。框頂面SF1中的孔徑,較反向面中的孔徑更大。Referring to FIG. 16 , the first via hole VH1 is formed in the frame
進一步參考圖17,於第1框部坯體GF1的第1介層孔VH1(圖16)內,形成第1介層電極511(圖17)。具體而言,藉由網版印刷法,往第1介層孔VH1中充填電極膠。此一充填,宜從框頂面SF1往第1介層孔VH1中施行。Referring further to FIG. 17 , a first via hole VH1 ( FIG. 16 ) of the first frame body GF1 is formed with a first via electrode 511 ( FIG. 17 ). Specifically, the first via hole VH1 is filled with electrode glue by screen printing. The filling is preferably performed from the frame top surface SF1 to the first via hole VH1 .
參考圖18,於框頂面SF1上形成金屬化層600。具體而言,塗布電極膠。另,於圖18中,在框頂面SF1全體塗布電極膠,但在藉由後述空腔CV之形成步驟除去的區域無須塗布金屬化層600。因此,亦可應用並未在該區域之至少一部分進行塗布的網版印刷法。Referring to FIG. 18 , a
參考圖19,藉由沖壓加工形成空腔CV。另,亦可在更早的時序往第1框部坯體GF1形成空腔CV。藉由上述方式,完成具有將空腔CV包圍之框狀的第1框部坯體GF1。Referring to Fig. 19, the cavity CV is formed by stamping. Alternatively, the cavity CV may be formed in the first frame blank GF1 at an earlier time. By the above method, the first frame blank GF1 having a frame shape surrounding the cavity CV is completed.
圖20~圖24係依序顯示與封裝體701(圖11)中之用於構成在厚度方向中配置第2介層電極512及框電極層550的部分之構造的第2框部坯體GF2相關之步驟的部分剖面圖。圖中,以一點鏈線顯示斷裂面BR,沿著此線,施行後述斷裂步驟。Figures 20 to 24 are partial cross-sectional views showing the steps related to the second frame blank GF2 for forming the structure of the second
參考圖20,作為第2框部坯體GF2,首先,形成包含成為作為框部120之一部分(圖11中之下部)的框下部120b之部分的單純之坯片。此一形成,例如亦可藉由刮刀法施行。構成第2框部坯體GF2之框下部120b的厚度,例如為30μm以上90μm以下。Referring to FIG. 20 , as the second frame blank GF2, first, a simple blank including a portion of the frame
參考圖21,藉由雷射加工,於框下部120b形成第2介層孔VH2。雷射加工用的雷射光,以通過框下部120b中接著穿過框底面SF2之方式照射。此一結果,第2介層孔VH2,容易沿著往框底面SF2的方向具有推拔形狀。框底面SF2中的孔徑,較反向面中的孔徑更小。Referring to FIG. 21 , the second via hole VH2 is formed in the frame
進一步參考圖22,於第2框部坯體GF2的第2介層孔VH2(圖21)內,形成第2介層電極512(圖22)。具體而言,藉由網版印刷法,往第2介層孔VH2中充填電極膠。此一充填,宜從框底面SF2之反向面往第2介層孔VH2中施行。Referring further to FIG. 22 , a second via hole VH2 ( FIG. 21 ) of the second frame body GF2 is formed with a second via electrode 512 ( FIG. 22 ). Specifically, the second via hole VH2 is filled with electrode glue by screen printing. The filling is preferably performed from the opposite side of the frame bottom surface SF2 to the second via hole VH2.
參考圖23,在與框底面SF2反向的面上形成框電極層550。具體而言,塗布電極膠。亦可於此一塗布應用網版印刷法。Referring to FIG. 23 , a
參考圖24,藉由沖壓加工形成空腔CV。另,亦可在更早的時序往第2框部坯體GF2形成空腔CV。藉由上述方式,完成具有將空腔CV包圍之框狀的第2框部坯體GF2。Referring to Fig. 24, the cavity CV is formed by stamping. Alternatively, the cavity CV may be formed in the second frame blank GF2 at an earlier time. By the above method, the second frame blank GF2 having a frame shape surrounding the cavity CV is completed.
參考圖25,將基板坯體GS(圖14)、第1框部坯體GF1(圖19)、及第2框部坯體GF2(圖24)疊層,藉以形成坯片700G。坯片700G包含複數個區域701G,其等最終各自成為封裝體701(參考圖11)。Referring to Fig. 25, the substrate blank GS (Fig. 14), the first frame blank GF1 (Fig. 19), and the second frame blank GF2 (Fig. 24) are stacked to form a blank 700G. The blank 700G includes a plurality of
參考圖26,於坯片700G之框頂面SF1形成溝槽TR1。此外,於坯片700G的與框頂面SF1反向之面,形成溝槽TR2。溝槽TR1與溝槽TR2,於厚度方向中配置為相對向。溝槽TR1及溝槽TR2,例如係藉由將刀尖抵緊坯片700G而形成。其後,施行將坯片700G煅燒之煅燒步驟。另,於煅燒步驟後,因應必要,亦可亦施行鍍敷步驟。Referring to FIG. 26 , a groove TR1 is formed on the frame top surface SF1 of the blank 700G. In addition, a groove TR2 is formed on the surface of the blank 700G opposite to the frame top surface SF1. The groove TR1 and the groove TR2 are arranged to face each other in the thickness direction. The groove TR1 and the groove TR2 are formed, for example, by pressing the tip of a knife against the blank 700G. Thereafter, a calcining step of calcining the blank 700G is performed. In addition, after the calcining step, a coating step may also be performed as necessary.
參考圖27,藉由上述煅燒步驟形成煅燒片700F。於煅燒步驟中,溝槽TR1的內面,暴露於煅燒環境氣體。因此,煅燒片700F之溝槽TR1的內面成為煅燒面。該煅燒面,成為封裝體701的煅燒面SF4A(圖11)。藉由對煅燒片700F施加應力,而施行從溝槽TR1產生裂縫之斷裂步驟。藉由以斷裂步驟使框部120破斷而形成破斷面。該破斷面,成為封裝體701的破斷面SF4B(圖11)。斷裂步驟,亦可為在溝槽TR1與溝槽TR2之間產生裂縫的步驟。藉由斷裂步驟,從煅燒片700F將複數個封裝體701切出。藉由上述方式,獲得封裝體701(圖11)。Referring to FIG. 27 , a
於上述斷裂步驟中,來自溝槽TR1的裂縫,理想上,如圖27中之實線箭頭所示,沿著厚度方向伸展。但實際上,如圖27中之虛線箭頭所示,有裂縫無預期地往第2介層電極512接近的情形。此一結果,在具有第2介層電極512之封裝體701中,有框部120之框底面SF2的最小尺寸LO(圖10)變小之情形。由於過小的最小尺寸LO容易致使封裝體701之漏洩,故最小尺寸LO宜保有某程度的餘裕。依本實施形態,則容易確保此一餘裕。In the above-mentioned breaking step, the crack from the trench TR1, ideally, extends in the thickness direction as shown by the solid arrow in FIG. 27 . However, in practice, as shown by the dotted arrow in FIG. 27 , there is a situation where the crack unexpectedly approaches the
圖28係將第1比較例之封裝體791的構成以與圖11相同之視野概略顯示的部分剖面圖。第1比較例之封裝體791,取代封裝體701(圖1)中的藉由框電極層550彼此連接之第1介層電極511及第2介層電極512,而具有介層電極510。介層電極510,於框部120之框頂面SF1及框底面SF2,分別具有端面SFA及底面SFB。介層電極510,從端面SFA往底面SFB具有推拔形狀。於封裝體791中,在提高空腔CV的氣密性之觀點上,宜為使底面SFB盡可能靠近空腔CV的設計。在該設計下之製造中,成為無法無視若發生如空腔CV與介層電極510彼此過度接近等製造誤差則製造出如圖29所示的第2比較例之封裝體792的機率。FIG. 28 is a partial cross-sectional view schematically showing the structure of the
於封裝體792中,介層電極510之端面SFA到達至空腔CV。此一結果,在介層電極510之端面SFA附近,介層電極510之側面往空腔CV露出。於將蓋部980(參考圖2)往封裝體792接合的步驟中,焊料960(參考圖2),容易如箭頭FL(圖29)所示地往空腔CV中流入。由於流入之焊料與水晶坯料890(參考圖2)接觸,而有對水晶振動子900(參考圖2)的性能造成不良影響之情形。另,因焊料960的流入所導致之對機械特性的不良影響,在安裝於封裝體之元件為水晶坯料890的情況特別受到擔憂,但在其他壓電元件的情況亦發生。進一步,只要安裝於封裝體之元件為電氣元件,則例如對電氣特性的不良影響如未預期之短路等受到擔憂。In the
依本實施形態之封裝體701(圖10及圖11),則第1,由於以滿足LO>LI(參考圖10)的方式配置第2介層電極512之第2底面SFB,故在第2介層電極512之第2底面SFB的外緣,與框部120之第2面SF2的外緣EO之間,可大程度地確保陶瓷間的疊層界面之配置處。此處,陶瓷間的疊層界面,相較於金屬與陶瓷的疊層界面,具有高氣密性。因此,可抑制因沿著疊層界面之漏洩所導致的空腔CV之氣密性的降低。第2,由於第1介層電極511之第1中心軸AX1,相較於第2介層電極512之第2中心軸AX2,更遠離框部120的內緣EI,故即便使第2介層電極512位於空腔CV附近,近至第2介層電極512之第2底面SFB到達空腔CV的程度,仍可使第1介層電極511之第1端面SFA位於與空腔CV離隔的位置。藉此,避免第1介層電極511之側面在第1介層電極511之第1端面SFA附近往空腔CV露出。因此,可防止因在框部120之第1面SF1具有第1端面SFA的第1介層電極511所導致的焊料之往空腔CV中的流入。由上述內容來看,可確保空腔CV之足夠的氣密性,並防止焊料之往空腔CV中的流入。According to the package 701 (FIG. 10 and FIG. 11) of the present embodiment, first, since the second bottom surface SFB of the
第2底面SFB的直徑DB,亦可較第2端面SFK的直徑DA更小(參考圖10及圖11)。藉此,在第2介層電極512之第2底面SFB的外緣與框部120之第2面SF2的外緣EO之間,可更大程度地確保陶瓷間的疊層界面之配置處。因此,可更為抑制因沿著疊層界面之漏洩所導致的空腔CV之氣密性的降低。The diameter DB of the second bottom surface SFB can also be smaller than the diameter DA of the second end surface SFK (see FIG. 10 and FIG. 11). Thus, the arrangement position of the stacking interface between ceramics can be ensured to a greater extent between the outer edge of the second bottom surface SFB of the second
亦可使第2介層電極512(圖10)之最大直徑為50μm以下。藉此,可使框部120之寬度尺寸亦微細化。此微細化越進展,則沿著基板部110與框部120之間的疊層界面之漏洩容易成為問題,但藉由上述理由,有效地抑制此等問題。The maximum diameter of the second dielectric electrode 512 (FIG. 10) can also be made less than 50 μm. This can also miniaturize the width of the
框部120之第2面SF2的內緣EI與外緣EO之間的最小尺寸WD(圖10),亦可為200μm以下。如此地,微細化越進展,則沿著基板部110與框部120之間的疊層界面之漏洩容易成為問題,但藉由上述理由,有效地抑制此等問題。The minimum dimension WD ( FIG. 10 ) between the inner edge EI and the outer edge EO of the second surface SF2 of the
亦可滿足LO≧LI×1.5(參考圖10)。藉此,可更充分地抑制因沿著基板部110與框部120之間的疊層界面之漏洩所導致的空腔CV之氣密性的降低。It is also possible to satisfy LO≧LI×1.5 (see FIG. 10 ). This can more effectively suppress the reduction in the airtightness of the cavity CV due to leakage along the stacking interface between the
第2介層電極512(圖11),亦可具有於厚度方向中從第2端面SFK以推拔形狀延伸的部分。藉此,在第2介層電極512之第2底面SFB的外緣與框部120之第2面SF2的外緣EO之間,可更大程度地確保陶瓷間的疊層界面之配置處。因此,可更為抑制因沿著疊層界面之漏洩所導致的空腔CV之氣密性的降低。推拔形狀,亦可具有5度以上之推拔角。藉此,在第2介層電極512之第2底面SFB的外緣與框部120之第2面SF2的外緣EO之間,可更大程度地確保陶瓷間的疊層界面之配置處。因此,可更為抑制因沿著疊層界面之漏洩所導致的空腔CV之氣密性的降低。The second dielectric electrode 512 (FIG. 11) may also have a portion extending in a push-out shape from the second end surface SFK in the thickness direction. Thus, between the outer edge of the second bottom surface SFB of the second
框部120之外壁面SF4(圖11),具有與框頂面SF1連結之煅燒面SF4A、及與框底面SF2連結之破斷面SF4B。破斷面SF4B係藉由斷裂步驟(圖27)而形成,但由於該步驟差異的影響,而有框部120之框底面SF2的外緣EO與第2介層電極512的第2底面SFB之間的距離變小之情形。然而,藉由如同前述地滿足LO>LI,而使該距離不易變得過小。因此,可防止因該距離過小所導致的氣密性之不足。The outer wall surface SF4 (FIG. 11) of the
俯視時,第2介層電極512之第2端面SFK,於本實施形態中,與第1介層電極511之第1底面SFJ分離。藉此,在俯視時使第1介層電極511相對地配置於外側且第2介層電極512相對地配置於內側的設計中,變得更容易使俯視時之第1介層電極511與第2介層電極512的位置性差異大。藉由將第1介層電極511配置於較外側,而可更確實地防止因第1介層電極511所導致的焊料之往空腔CV中的流入。藉由將第2介層電極512配置於較內側,而可更充分地確保空腔CV的氣密性。In the present embodiment, the second end surface SFK of the
第1介層電極511,亦可具有於厚度方向中從第1端面SFA以推拔形狀延伸的部分。藉此,可更大程度地確保包含第1介層電極511的層與包含第2介層電極512的層之間的假想面中,第1介層電極511之第1底面SFJ與框部120之外壁面SF4間的距離。上述假想面,相當於封裝體701的製造方法中之疊層界面,故有如剝離等疊層不良的情形。此等疊層不良,容易成為水分從空腔CV外往空腔CV內的侵入路徑,但藉由使上述距離增大,可更為抑制水分之往空腔CV內的侵入。因此,可更充分地確保空腔CV的氣密性。藉由使第1介層電極511,相較於第2介層電極512,具有在厚度方向較大的尺寸,而可使此一效果更大。The
<實施形態2>
圖30係將本實施形態2之封裝體702的構成以與圖10相同之視野概略顯示的部分俯視圖。圖31係將封裝體702的構成以與圖11相同之視野概略顯示的部分剖面圖。
<Implementation Form 2>
FIG. 30 is a partial top view schematically showing the structure of the
於封裝體702中,不同於封裝體701(圖10及圖11),俯視時,第2介層電極512之第2端面SFK,至少部分地與第1介層電極511之第1底面SFJ重疊。本實施形態中,第2端面SFK,與第1底面SFJ僅部分地重疊。第2介層電極512之第2端面SFK,與第1介層電極511之第1底面SFJ直接接觸,藉此使第2介層電極512與第1介層電極511電性連接。另,關於其等以外之構成,由於與上述實施形態1之構成幾近相同,故對於相同或相對應的要素賦予相同符號,不重複其說明。In the
依本實施形態2,則容易將第2介層電極512與第1介層電極511電性連接。然則,作為本實施形態2的變形例,亦可以降低第1介層電極511與第2介層電極512之間的連接阻抗等為目的,設置框電極層550(圖11)。According to the second embodiment, it is easy to electrically connect the second
<實施形態3>
圖32係將本實施形態3之封裝體703的構成以與圖10相同之視野概略顯示的部分俯視圖。圖33係將封裝體703的構成以與圖11相同之視野概略顯示的部分剖面圖。
<Implementation Form 3>
FIG. 32 is a partial top view schematically showing the structure of the
於封裝體703中,不同於封裝體701(圖10及圖11),俯視時,第2介層電極512之第2端面SFK,包含於第1介層電極511之第1底面SFJ。第2介層電極512之第2端面SFK,與第1介層電極511之第1底面SFJ直接接觸,藉此使第2介層電極512與第1介層電極511電性連接。另,關於其等以外之構成,由於與上述實施形態1之構成幾近相同,故對於相同或相對應的要素賦予相同符號,不重複其說明。In the
圖34~圖39係將封裝體703的製造方法之一步驟概略顯示的部分剖面圖。本實施形態3中,取代前述實施形態1中之第1框部坯體GF1(圖15~圖19)及第2框部坯體GF2(圖20~圖24),而施行框部坯體GF的形成步驟。以下,針對此點具體地說明。34 to 39 are partial cross-sectional views schematically showing one step of the manufacturing method of the
參考圖34,作為框部坯體GF,首先,形成包含成為框部120(圖11)的部分之單純的坯片。此一形成,例如亦可藉由刮刀法施行。Referring to Fig. 34, as the frame blank GF, first, a simple green sheet including a portion to be the frame 120 (Fig. 11) is formed. This formation can also be performed by, for example, a doctor blade method.
參考圖35,藉由雷射加工,於框部120之框頂面SF1,形成作為非貫通孔的第1介層孔VH1。雷射加工用的雷射光,以從框頂面SF1往框部120中行進之方式照射。此一結果,第1介層孔VH1,容易沿從框頂面SF1往框部120中的方向具有推拔形狀。Referring to FIG. 35 , a first via hole VH1 as a non-through hole is formed on the frame top surface SF1 of the
參考圖36,藉由雷射加工,形成從第1介層孔VH1之底面往框底面SF2延伸之作為貫通孔的第2介層孔VH2。雷射加工用的雷射光,以從第1介層孔VH1之底面往框底面SF2行進的方式照射。此一結果,第2介層孔VH2,容易沿著從第1介層孔VH1之底面往框底面SF2的方向具有推拔形狀。Referring to FIG. 36 , a second via hole VH2 is formed as a through hole extending from the bottom surface of the first via hole VH1 to the frame bottom surface SF2 by laser processing. The laser light used for laser processing is irradiated in a manner of traveling from the bottom surface of the first via hole VH1 to the frame bottom surface SF2. As a result, the second via hole VH2 tends to have a push-out shape in the direction from the bottom surface of the first via hole VH1 to the frame bottom surface SF2.
進一步參考圖37,於框部坯體GF的第2介層孔VH2及第1介層孔VH1(圖36)內,分別形成第2介層電極512及第1介層電極511(圖37)。具體而言,藉由網版印刷法,往第2介層孔VH2及第1介層孔VH1中充填電極膠。此一充填,亦可從框頂面SF1往第2介層孔VH2及第1介層孔VH1中一併施行。Further referring to FIG. 37 , the second via hole VH2 and the first via hole VH1 ( FIG. 36 ) of the frame blank GF are respectively formed with the second via
參考圖38,於框頂面SF1上形成金屬化層600。具體而言,塗布電極膠。另,於圖38中,在框頂面SF1全體塗布電極膠,但在藉由後述空腔CV之形成步驟除去的區域無須塗布金屬化層600。因此,亦可應用並未在該區域之至少一部分進行塗布的網版印刷法。Referring to FIG. 38 , a
參考圖39,藉由沖壓加工形成空腔CV。另,亦可在更早的時序往框部坯體GF形成空腔CV。藉由上述方式,完成具有將空腔CV包圍之框狀的框部坯體GF。藉由將此框部坯體GF,取代圖25(實施形態1)的步驟中之第1框部坯體GF1及第2框部坯體GF2的疊層體而使用,而獲得本實施形態3之封裝體703(圖33)。Referring to FIG. 39 , a cavity CV is formed by stamping. Alternatively, a cavity CV may be formed on the frame blank GF at an earlier time. In the above manner, a frame blank GF having a frame shape surrounding the cavity CV is completed. By using this frame blank GF instead of the stacked body of the first frame blank GF1 and the second frame blank GF2 in the step of FIG. 25 (embodiment 1), a package 703 ( FIG. 33 ) of this embodiment 3 is obtained.
依本實施形態3,則如圖32及圖33所示,第2介層電極512之第2端面SFK,包含於第1介層電極511之第1底面SFJ。藉此,於封裝體703的製造中,將充填第1介層電極511的第1介層孔VH1,形成為框部坯體GF中的非貫通孔後,藉由將該非貫通孔之底面加工,而可形成充填第2介層電極512的第2介層孔VH2。因此,於封裝體703的製造中,不同於封裝體701(實施形態1),無須將第1介層電極511所位於的部分、及第2介層電極512所位於的部分,作為需要彼此疊層之單獨的坯體而處理。因此,可使封裝體的製造之疊層步驟簡化。According to the third embodiment, as shown in FIG32 and FIG33, the second end surface SFK of the
100:陶瓷部 110:基板部 110i:絕緣膜 120:框部 120a:框上部 120b:框下部 200:基板電極層 211,212:元件電極墊 220:中繼電極 301~304:封裝體電極墊 401~403:配線層 411~414:基板介層電極 510:介層電極 511:第1介層電極 512:第2介層電極 550:框電極層 600:金屬化層 700F:煅燒片 700G:坯片 701,702,703:封裝體 701G:區域 791,792:封裝體 890:水晶坯料 900:水晶振動子(電氣零件) 960:焊料 980:蓋部 AX1:第1中心軸 AX2:第2中心軸 BR:斷裂面 CV:空腔 DA,DB:直徑 EI:內緣 EO:外緣 GF:框部坯體 GF1:第1框部坯體 GF2:第2框部坯體 GS:基板坯體 LI:從內緣算起之最小尺寸 LO:從外緣算起之最小尺寸 SF1:框頂面(第1面) SF2:框底面(第2面) SF3:基板頂面(第3面) SF3C:空腔面部分 SF3S:支持面部分 SF4:外壁面 SF4A:煅燒面 SF4B:破斷面 SFA:第1端面 SFB:第2底面 SFJ:第1底面 SFK:第2端面 TR1,TR2:溝槽 UN0~UN4:區域 VH1:第1介層孔 VH2:第2介層孔 WD:內緣與外緣之間的最小尺寸 100: Ceramic part 110: Substrate part 110i: Insulating film 120: Frame part 120a: Upper part of frame 120b: Lower part of frame 200: Substrate electrode layer 211,212: Component electrode pad 220: Relay electrode 301~304: Package electrode pad 401~403: Wiring layer 411~414: Substrate dielectric electrode 510: Dielectric electrode 511: First dielectric electrode 512: Second dielectric electrode 550: Frame electrode layer 600: Metallization layer 700F: Sintered sheet 700G: blank 701,702,703: package 701G: region 791,792: package 890: crystal blank 900: crystal oscillator (electrical component) 960: solder 980: lid AX1: 1st center axis AX2: 2nd center axis BR: fracture surface CV: cavity DA,DB: diameter EI: inner edge EO: outer edge GF: frame blank GF1: 1st frame blank GF2: 2nd frame blank GS: substrate blank LI: minimum size from the inner edge LO: minimum size from the outer edge SF1: frame top surface (1st surface) SF2: frame bottom surface (2nd surface) SF3: Substrate top surface (3rd surface) SF3C: Cavity surface part SF3S: Support surface part SF4: Outer wall surface SF4A: Calcined surface SF4B: Fracture surface SFA: 1st end surface SFB: 2nd bottom surface SFJ: 1st bottom surface SFK: 2nd end surface TR1, TR2: Groove UN0~UN4: Region VH1: 1st via hole VH2: 2nd via hole WD: Minimum dimension between inner edge and outer edge
圖1係概略顯示實施形態1之水晶振動子的構成之俯視圖。
圖2係沿著圖1的線II-II之概略剖面圖。
圖3係概略顯示圖1之水晶振動子的製造方法之一步驟的俯視圖。
圖4係沿著圖3的線IV-IV之概略剖面圖。
圖5係概略顯示實施形態1之封裝體的構成之俯視圖。
圖6係沿著圖5的線VI-VI之概略剖面圖。
圖7係將圖5之金屬化層及框部的圖示省略之俯視圖。
圖8係概略顯示圖7之基板部及介層電極,並將封裝體電極墊以虛線顯示之俯視圖。
圖9係將圖5之框部上之金屬化層的圖示省略之俯視圖。
圖10係圖9之部分放大圖。
圖11係沿著圖5的線XI-XI之概略部分剖面圖。
圖12係概略顯示實施形態1之封裝體的製造方法中之基板坯體的構成之部分俯視圖。
圖13係概略顯示圖12所示之基板坯體的基板部及基板介層電極,並將封裝體電極墊以虛線顯示之部分俯視圖。
圖14係沿著圖12及圖13的線XIV-XIV之概略部分剖面圖。
圖15係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖16係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖17係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖18係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖19係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖20係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖21係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖22係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖23係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖24係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖25係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖26係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖27係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖28係將第1比較例之封裝體的構成以與圖11相同之視野概略顯示的部分剖面圖。
圖29係將第2比較例之封裝體的構成以與圖11及圖26各自相同之視野概略顯示的部分剖面圖。
圖30係將實施形態2之封裝體的構成以與圖10相同之視野概略顯示的部分俯視圖。
圖31係將實施形態2之封裝體的構成以與圖11相同之視野概略顯示的部分剖面圖。
圖32係將實施形態3之封裝體的構成以與圖10相同之視野概略顯示的部分俯視圖。
圖33係將實施形態3之封裝體的構成以與圖11相同之視野概略顯示的部分剖面圖。
圖34係概略顯示實施形態3之封裝體的製造方法之一步驟的部分剖面圖。
圖35係概略顯示實施形態3之封裝體的製造方法之一步驟的部分剖面圖。
圖36係概略顯示實施形態3之封裝體的製造方法之一步驟的部分剖面圖。
圖37係概略顯示實施形態3之封裝體的製造方法之一步驟的部分剖面圖。
圖38係概略顯示實施形態3之封裝體的製造方法之一步驟的部分剖面圖。
圖39係概略顯示實施形態3之封裝體的製造方法之一步驟的部分剖面圖。
FIG. 1 is a top view schematically showing the structure of the crystal oscillator of the
110:基板部 110: Baseboard
110i:絕緣膜 110i: Insulation film
120:框部 120: Frame
200:基板電極層 200: Substrate electrode layer
220:中繼電極 220: Relay electrode
302:封裝體電極墊 302: Package electrode pad
403:配線層 403: Wiring layer
511:第1介層電極 511: 1st dielectric electrode
512:第2介層電極 512: Second dielectric electrode
550:框電極層 550: frame electrode layer
600:金屬化層 600:Metallization layer
701:封裝體 701:Package
AX1:第1中心軸 AX1: 1st center axis
AX2:第2中心軸 AX2: Second center axis
EI:內緣 EI: Internal edge
EO:外緣 EO: Outer Edge
SF1:框頂面(第1面) SF1: Frame top (1st side)
SF2:框底面(第2面) SF2: Frame bottom (2nd side)
SF3:基板頂面(第3面) SF3: Substrate top surface (3rd surface)
SF3C:空腔面部分 SF3C: Cavity surface part
SF3S:支持面部分 SF3S: Support surface part
SF4:外壁面 SF4: Outer wall
SF4A:煅燒面 SF4A: calcined surface
SF4B:破斷面 SF4B: Broken surface
SFA:第1端面 SFA: 1st end face
SFB:第2底面 SFB: 2nd bottom surface
SFJ:第1底面 SFJ: 1st bottom surface
SFK:第2端面 SFK: 2nd end face
CV:空腔 CV: Cavity
Claims (13)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
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JP2022030448 | 2022-08-09 | ||
WOPCT/JP2022/030448 | 2022-08-09 | ||
JP2023-098408 | 2023-06-15 | ||
JP2023098408A JP7518951B2 (en) | 2022-08-09 | 2023-06-15 | package |
Publications (1)
Publication Number | Publication Date |
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TW202425241A true TW202425241A (en) | 2024-06-16 |
Family
ID=92539837
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Application Number | Title | Priority Date | Filing Date |
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TW112129169A TW202425241A (en) | 2022-08-09 | 2023-08-03 | Package |
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2023
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