TW202418846A - Sound producing cell, package structure, apparatus and forming methods thereof - Google Patents

Sound producing cell, package structure, apparatus and forming methods thereof Download PDF

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TW202418846A
TW202418846A TW112138746A TW112138746A TW202418846A TW 202418846 A TW202418846 A TW 202418846A TW 112138746 A TW112138746 A TW 112138746A TW 112138746 A TW112138746 A TW 112138746A TW 202418846 A TW202418846 A TW 202418846A
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Taiwan
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diaphragm
sub
anchoring
section
anchored
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TW112138746A
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Chinese (zh)
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羅烱成
張浩新
陳文健
張俊羿
陳昭瑜
溫海宏
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美商知微電子有限公司
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Abstract

A package structure includes a cover and a cell disposed within the cover. The cell includes a membrane, an actuating layer and an anchor structure. The membrane includes a first membrane subpart and a second membrane subpart, wherein the first membrane subpart and the second membrane subpart are opposite to each other in a top view. The actuating layer is disposed on the first membrane subpart and the second membrane subpart in the top-view direction. The membrane is anchored by the anchor structure. The first membrane subpart includes a first anchored edge which is fully or partially anchored, and edges of the first membrane subpart other than the first anchored edge are non-anchored. The second membrane subpart includes a second anchored edge which is fully or partially anchored, and edges of the second membrane subpart other than the second anchored edge are non-anchored.

Description

發聲單元、封裝結構、設備以及其形成方法Sound unit, packaging structure, device and forming method thereof

本發明涉及發聲單元、封裝結構、設備以及其形成方法,特別是涉及具有高良率及/或高性能的發聲單元、包含此發聲單元或結構類似於此發聲單元的單元的封裝結構、包含此封裝結構的設備、此發聲單元的形成方法、此封裝結構的形成方法以及此設備的形成方法。The present invention relates to a sound unit, a packaging structure, a device and a method for forming the same, and in particular to a sound unit with high yield and/or high performance, a packaging structure comprising the sound unit or a unit having a structure similar to the sound unit, a device comprising the packaging structure, a method for forming the sound unit, a method for forming the packaging structure and a method for forming the device.

由於諸如微機電系統(Micro Electro Mechanical System, MEMS)微型揚聲器等的微型聲音產生裝置由於其尺寸小而可用於各種電子裝置,因此微型聲音產生裝置近年來發展迅速。舉例而言,MEMS微型揚聲器可使用薄膜壓電材料作為致動件以及含矽層作為振膜,而它們由至少一半導體製程所形成。為了使微型揚聲器得到更廣泛的應用,業界致力於設計高良率與高性能的微型揚聲器。Micro sound generating devices such as micro electro mechanical system (MEMS) micro speakers have developed rapidly in recent years because they can be used in various electronic devices due to their small size. For example, MEMS micro speakers can use thin film piezoelectric materials as actuators and silicon-containing layers as diaphragms, and they are formed by at least half semiconductor processes. In order to make micro speakers more widely used, the industry is committed to designing micro speakers with high yield and high performance.

因此,本發明的主要目的是提供一種具有特定狹縫設計及/或特定凹槽設計的發聲單元,以提高其良率與性能,並提供一種此發聲單元的製造方法。本發明也提供一種包含此發聲單元或結構類似於此發聲單元的單元的封裝結構,並提供一種此封裝結構的形成方法。本發明也提供一種包含此封裝結構的設備,並提供一種此設備的形成方法。Therefore, the main purpose of the present invention is to provide a sound unit with a specific slit design and/or a specific groove design to improve its yield and performance, and to provide a method for manufacturing the sound unit. The present invention also provides a packaging structure including the sound unit or a unit having a structure similar to the sound unit, and provides a method for forming the packaging structure. The present invention also provides a device including the packaging structure, and provides a method for forming the device.

本發明的一實施例提供了一種封裝結構,其包括殼蓋以及設置在殼蓋內的單元。單元包括振膜、致動層與錨定結構。振膜包括第一振膜子部與第二振膜子部,其中第一振膜子部與第二振膜子部在沿著俯視方向的俯視上彼此相對,使得第一振膜子部與第二振膜子部在垂直於俯視方向的第一方向上彼此相對。致動層在俯視方向上設置在第一振膜子部與第二振膜子部上。振膜錨定於錨定結構。第一振膜子部包括第一錨定邊緣,第一錨定邊緣完全連接或部分連接錨定結構以被錨定結構完全錨定或部分錨定,且在第一振膜子部中除了第一錨定邊緣之外的邊緣都是非錨定的。第二振膜子部包括第二錨定邊緣,第二錨定邊緣完全連接或部分連接錨定結構以被錨定結構完全錨定或部分錨定,且在第二振膜子部中除了第二錨定邊緣之外的邊緣都是非錨定的。An embodiment of the present invention provides a packaging structure, which includes a shell cover and a unit disposed in the shell cover. The unit includes a diaphragm, an actuating layer and an anchoring structure. The diaphragm includes a first diaphragm sub-portion and a second diaphragm sub-portion, wherein the first diaphragm sub-portion and the second diaphragm sub-portion are opposite to each other in a top view along a top-view direction, so that the first diaphragm sub-portion and the second diaphragm sub-portion are opposite to each other in a first direction perpendicular to the top-view direction. The actuating layer is disposed on the first diaphragm sub-portion and the second diaphragm sub-portion in the top-view direction. The diaphragm is anchored to the anchoring structure. The first diaphragm sub-portion includes a first anchoring edge, the first anchoring edge is fully connected or partially connected to the anchoring structure to be fully or partially anchored by the anchoring structure, and the edges of the first diaphragm sub-portion except the first anchoring edge are all non-anchored. The second diaphragm sub-portion includes a second anchoring edge, the second anchoring edge is fully connected or partially connected to the anchoring structure to be fully or partially anchored by the anchoring structure, and the edges of the second diaphragm sub-portion except the second anchoring edge are all non-anchored.

本發明的另一實施例提供了一種設備,其包括外殼以及上述的封裝結構。Another embodiment of the present invention provides a device, which includes a housing and the above-mentioned packaging structure.

本發明的另一實施例提供了一種封裝結構的形成方法,此形成方法包括:進行製造方法以製造單元;以及設置單元在殼蓋內。單元的製造方法包括:提供晶圓,其中晶圓包括第一層與第二層;以及圖案化晶圓的第一層,以形成至少一溝道線。第一層包括振膜,振膜錨定於單元的錨定結構,至少一狹縫是因為溝道線而形成在振膜中並貫穿振膜。振膜包括第一振膜子部與第二振膜子部,第一振膜子部與第二振膜子部在沿著俯視方向的俯視上彼此相對,使得第一振膜子部與第二振膜子部在垂直於俯視方向的第一方向上彼此相對。第一振膜子部包括第一錨定邊緣,第一錨定邊緣完全連接或部分連接錨定結構以被錨定結構完全錨定或部分錨定,且在第一振膜子部中除了第一錨定邊緣之外的邊緣都是非錨定的。第二振膜子部包括第二錨定邊緣,第二錨定邊緣完全連接或部分連接錨定結構以被錨定結構完全錨定或部分錨定,且在第二振膜子部中除了第二錨定邊緣之外的邊緣都是非錨定的。Another embodiment of the present invention provides a method for forming a packaging structure, which includes: performing a manufacturing method to manufacture a unit; and setting the unit in a shell. The manufacturing method of the unit includes: providing a wafer, wherein the wafer includes a first layer and a second layer; and patterning the first layer of the wafer to form at least one channel line. The first layer includes a diaphragm, and the diaphragm is anchored to the anchoring structure of the unit, and at least one slit is formed in the diaphragm due to the channel line and penetrates the diaphragm. The diaphragm includes a first diaphragm sub-portion and a second diaphragm sub-portion, and the first diaphragm sub-portion and the second diaphragm sub-portion are opposite to each other in a top view along the top view direction, so that the first diaphragm sub-portion and the second diaphragm sub-portion are opposite to each other in a first direction perpendicular to the top view direction. The first diaphragm sub-portion includes a first anchoring edge, the first anchoring edge is fully connected or partially connected to the anchoring structure to be fully or partially anchored by the anchoring structure, and the edges of the first diaphragm sub-portion except the first anchoring edge are all non-anchored. The second diaphragm sub-portion includes a second anchoring edge, the second anchoring edge is fully connected or partially connected to the anchoring structure to be fully or partially anchored by the anchoring structure, and the edges of the second diaphragm sub-portion except the second anchoring edge are all non-anchored.

本發明的另一實施例提供了一種設備的形成方法,此形成方法包括:根據上述的形成方法形成封裝結構;以及透過表面貼裝技術(surface mount technology)將封裝結構組裝在包括外殼的設備中。Another embodiment of the present invention provides a method for forming a device, the method comprising: forming a package structure according to the above-mentioned method; and assembling the package structure in a device including a housing through surface mount technology.

本發明的另一實施例提供了一種發聲單元,其包括振膜與致動層。振膜包括第一振膜子部與第二振膜子部,其中第一振膜子部與第二振膜子部彼此相對。致動層設置在第一振膜子部與第二振膜子部上。第一振膜子部包括第一錨定邊緣,第一錨定邊緣被完全錨定或部分錨定,且在第一振膜子部中除了第一錨定邊緣之外的邊緣都是非錨定的。第二振膜子部包括第二錨定邊緣,第二錨定邊緣被完全錨定或部分錨定,且在第二振膜子部中除了第二錨定邊緣之外的邊緣都是非錨定的。Another embodiment of the present invention provides a sound unit, which includes a diaphragm and an actuating layer. The diaphragm includes a first diaphragm sub-portion and a second diaphragm sub-portion, wherein the first diaphragm sub-portion and the second diaphragm sub-portion are opposite to each other. The actuating layer is arranged on the first diaphragm sub-portion and the second diaphragm sub-portion. The first diaphragm sub-portion includes a first anchoring edge, the first anchoring edge is fully anchored or partially anchored, and the edges of the first diaphragm sub-portion except the first anchoring edge are all non-anchored. The second diaphragm sub-portion includes a second anchoring edge, the second anchoring edge is fully anchored or partially anchored, and the edges of the second diaphragm sub-portion except the second anchoring edge are all non-anchored.

本發明的另一實施例提供了一種發聲單元的製造方法,此製造方法包括:提供晶圓,其中晶圓包括第一層與第二層;圖案化晶圓的第一層,以形成至少一溝道線;以及將晶圓設置在基板上。第一層包括振膜,至少一狹縫是因為溝道線而形成在振膜中並貫穿振膜。振膜包括第一振膜子部與第二振膜子部,其中第一振膜子部與第二振膜子部彼此相對。第一振膜子部包括第一錨定邊緣,第一錨定邊緣被完全錨定或部分錨定,且在第一振膜子部中除了第一錨定邊緣之外的邊緣都是非錨定的。第二振膜子部包括第二錨定邊緣,第二錨定邊緣被完全錨定或部分錨定,且在第二振膜子部中除了第二錨定邊緣之外的邊緣都是非錨定的。Another embodiment of the present invention provides a method for manufacturing a sound unit, the method comprising: providing a wafer, wherein the wafer comprises a first layer and a second layer; patterning the first layer of the wafer to form at least one channel line; and placing the wafer on a substrate. The first layer comprises a diaphragm, and at least one slit is formed in the diaphragm due to the channel line and penetrates the diaphragm. The diaphragm comprises a first diaphragm sub-portion and a second diaphragm sub-portion, wherein the first diaphragm sub-portion and the second diaphragm sub-portion are opposite to each other. The first diaphragm sub-portion comprises a first anchoring edge, the first anchoring edge is fully anchored or partially anchored, and the edges in the first diaphragm sub-portion except the first anchoring edge are all non-anchored. The second diaphragm sub-portion includes a second anchoring edge, the second anchoring edge is fully anchored or partially anchored, and the edges in the second diaphragm sub-portion except the second anchoring edge are non-anchored.

在閱讀了下文繪示有各種附圖的實施例的詳細描述之後,對於所屬領域的通常知識者來說,應可清楚明瞭本發明的目的。The purpose of the present invention should be apparent to those skilled in the art after reading the following detailed description of the embodiments illustrated in the various accompanying drawings.

為使本領域的通常知識者能更進一步瞭解本發明,下文將詳細說明所列舉的本發明的優選實施例、關鍵元件的典型材料或參數範圍,並配合具有標記的附圖說明本發明的構成內容及所欲達成的功效。須注意的是,附圖均為簡化的示意圖,且基於目前技術說明了關鍵元件的材料和參數範圍,因此,僅顯示與本發明有關之元件與組合關係,以對本發明的基本架構、實施方法或操作提供更清楚的描述。實際的元件與佈局可能更為複雜,且所使用的材料或參數範圍可能會隨著未來技術的發展而變化。另外,為了方便說明,本發明的各附圖中所示之元件可非以實際數目、形狀、尺寸做等比例繪製,其詳細情況可依照設計的需求進行調整。In order to enable the general knowledge in the field to further understand the present invention, the preferred embodiments of the present invention, the typical materials or parameter ranges of the key components are described in detail below, and the components and the intended effects of the present invention are described in conjunction with the marked drawings. It should be noted that the drawings are simplified schematic diagrams, and the materials and parameter ranges of the key components are described based on the current technology. Therefore, only the components and combination relationships related to the present invention are shown to provide a clearer description of the basic structure, implementation method or operation of the present invention. The actual components and layout may be more complex, and the materials or parameter ranges used may change with the development of future technology. In addition, for the convenience of explanation, the components shown in the drawings of the present invention may not be drawn in proportion to the actual number, shape, and size, and the details may be adjusted according to design requirements.

在下文說明書與申請專利範圍中,「包括」、「含有」、「具有」等詞為開放式詞語,因此其應被解釋為「含有但不限定為…」之意。因此,當本發明的描述中使用術語「包括」、「含有」及/或「具有」時,其指定了相應的特徵、區域、步驟、操作及/或構件的存在,但不排除一個或多個相應的特徵、區域、步驟、操作及/或構件的存在。In the following description and patent application, words such as "include", "contain", "have" and the like are open-ended words, and therefore should be interpreted as "including but not limited to..." Therefore, when the terms "include", "contain" and/or "have" are used in the description of the present invention, they specify the existence of corresponding features, regions, steps, operations and/or components, but do not exclude the existence of one or more corresponding features, regions, steps, operations and/or components.

在下文說明書與申請專利範圍中,當「B1構件由C1所形成」時,C1存在於B1構件的形成或C1使用在B1構件的形成,並且,B1構件的形成中不排除一個或多個其他的特徵、區域、步驟、操作及/或構件的存在與使用。In the following description and patent application, when "B1 component is formed by C1", C1 exists in the formation of B1 component or C1 is used in the formation of B1 component, and the formation of B1 component does not exclude the existence and use of one or more other features, regions, steps, operations and/or components.

在下文說明書與申請專利範圍中,術語「水平方向」表示為平行水平面的方向,術語「水平面」表示平行於附圖中方向X與方向Y的表面,術語「鉛直方向」、「俯視方向」表示平行於附圖中方向Z的方向,其中方向X、Y、Z彼此垂直。在下文說明書與申請專利範圍中,術語「俯視」、「底視」表示沿著鉛直方向的觀看結果,術語「側視」表示沿著水平方向的觀看結果。In the following description and patent application, the term "horizontal direction" refers to a direction parallel to a horizontal plane, the term "horizontal plane" refers to a surface parallel to the directions X and Y in the attached drawings, and the terms "vertical direction" and "top view direction" refer to a direction parallel to the direction Z in the attached drawings, wherein the directions X, Y, and Z are perpendicular to each other. In the following description and patent application, the terms "top view" and "bottom view" refer to the viewing result along the vertical direction, and the term "side view" refers to the viewing result along the horizontal direction.

在下文說明書與申請專利範圍中,術語「實質上」是指可存在或不存在微小偏差。舉例來說,術語「實質上平行」、「實質上沿著」是指兩構件之間的夾角可小於或等於特定角度閥值,例如10度、5度、3度或1度。舉例來說,術語「實質上對齊」是指兩構件之間的偏差可小於或等於特定差異閥值,例如2μm(微米)或1μm。舉例來說,術語「實質上相同」是指偏差在給定值或給定範圍內,例如在10%、5%、3%、2%、1%或0.5%內。In the following specification and patent application, the term "substantially" means that slight deviations may or may not exist. For example, the term "substantially parallel" and "substantially along" means that the angle between two components can be less than or equal to a specific angle value, such as 10 degrees, 5 degrees, 3 degrees or 1 degree. For example, the term "substantially aligned" means that the deviation between two components can be less than or equal to a specific differential value, such as 2μm (micrometers) or 1μm. For example, the term "substantially the same" means that the deviation is within a given value or a given range, such as 10%, 5%, 3%, 2%, 1% or 0.5%.

說明書與申請專利範圍中所使用的序數例如「第一」、「第二」等之用詞用以修飾元件,其本身並不意含及代表該(或該些)元件有任何之前的序數,也不代表某一元件與另一元件的順序、或是製造方法上的順序,該些序數的使用僅用來使具有某命名的元件得以和另一具有相同命名的元件能作出清楚區分。申請專利範圍與說明書中可不使用相同用詞,據此,說明書中的第一構件在申請專利範圍中可能為第二構件。The ordinal numbers used in the specification and patent application, such as "first", "second", etc., are used to modify the components. They do not imply or represent any previous ordinal number of the component (or components), nor do they represent the order of one component to another component, or the order of the manufacturing method. The use of these ordinal numbers is only used to make a component with a certain name clearly distinguishable from another component with the same name. The patent application and the specification may not use the same terms. Accordingly, the first component in the specification may be the second component in the patent application.

須知悉的是,以下所舉實施例可以在不脫離本發明的精神下,可將數個不同實施例中的特徵進行替換、重組、混合以完成其他實施例。各實施例間特徵只要不違背發明精神或相衝突,均可任意混合搭配使用。It should be noted that the following embodiments can replace, reorganize, or mix features in several different embodiments to complete other embodiments without departing from the spirit of the invention. The features of each embodiment can be mixed and matched as long as they do not violate the spirit of the invention or conflict with each other.

在本發明中,發聲單元可執行聲學轉換(acoustic transformation),其中聲學轉換可將訊號(例如,電訊號或其他適合類型的訊號)轉換為聲波。在一些實施例中,發聲單元可為聲音產生裝置、揚聲器、微型揚聲器或其他適合的裝置,以將電訊號轉換成聲波,但不以此為限。需注意的是,發聲單元的操作是指由發聲單元執行聲學轉換(例如,聲波是透過電性驅動訊號致動發聲單元來產生)。In the present invention, the sound unit can perform acoustic transformation, wherein the acoustic transformation can convert a signal (e.g., an electrical signal or other suitable type of signal) into a sound wave. In some embodiments, the sound unit can be a sound generating device, a speaker, a micro speaker or other suitable device to convert an electrical signal into a sound wave, but is not limited thereto. It should be noted that the operation of the sound unit refers to the acoustic transformation performed by the sound unit (e.g., the sound wave is generated by activating the sound unit through an electrical drive signal).

在發聲單元的使用上,發聲單元可設置在一基底上。基底可為硬質基底或可撓基底,其中基底可包括矽(silicon)、鍺(germanium)、玻璃、塑膠、石英、藍寶石、金屬、聚合物(例如,聚醯亞胺(polyimide, PI)、聚對苯二甲酸乙二酯(polyethylene terephthalate, PET))、任何適合的材料或其組合。在一範例中,基底可為包括積層板(laminate)(例如銅箔基板(copper clad laminate, CCL))、平面網格陣列板(land grid array board, LGA board)或任何其他適合的包含導電材料的板的電路板,但不以此為限。須說明的是,基底的法線方向可平行附圖中的方向Z。In the use of the sound unit, the sound unit can be arranged on a substrate. The substrate can be a hard substrate or a flexible substrate, wherein the substrate may include silicon, germanium, glass, plastic, quartz, sapphire, metal, polymer (e.g., polyimide (PI), polyethylene terephthalate (PET)), any suitable material or a combination thereof. In one example, the substrate may be a circuit board including a laminate (e.g., a copper clad laminate (CCL)), a land grid array board (LGA board) or any other suitable board containing a conductive material, but is not limited thereto. It should be noted that the normal direction of the substrate may be parallel to the direction Z in the attached figure.

請參考第1圖與第2圖,第1圖所示為本發明第一實施例的發聲單元的俯視示意圖,第2圖所示為第1圖的區域R1中的結構的放大示意圖。如第1圖所示,發聲單元100包括振膜110以及振膜110外的至少一錨定結構120,其中振膜110連接於錨定結構120,以被錨定結構120錨定。舉例而言,振膜110可被錨定結構120所環繞,但不以此為限。Please refer to FIG. 1 and FIG. 2, FIG. 1 is a schematic top view of the sound unit of the first embodiment of the present invention, and FIG. 2 is an enlarged schematic view of the structure in the region R1 of FIG. 1. As shown in FIG. 1, the sound unit 100 includes a diaphragm 110 and at least one anchoring structure 120 outside the diaphragm 110, wherein the diaphragm 110 is connected to the anchoring structure 120 to be anchored by the anchoring structure 120. For example, the diaphragm 110 may be surrounded by the anchoring structure 120, but is not limited thereto.

在發聲單元100的操作中,振膜110可被致動以移動。在本實施例中,振膜110可被致動以向上移動與向下移動,但不以此為限。須說明的是,在本發明中,術語「向上移動」與「向下移動」表示振膜110實質上沿著方向Z移動。在發聲單元100的操作期間中,錨定結構120可為固定不動。換句話說,在發聲單元100的操作期間中,錨定結構120可為相對於振膜110的固定端(或固定邊緣)。During operation of the sound unit 100, the diaphragm 110 can be actuated to move. In the present embodiment, the diaphragm 110 can be actuated to move upward and downward, but is not limited thereto. It should be noted that in the present invention, the terms "moving upward" and "moving downward" mean that the diaphragm 110 substantially moves along the direction Z. During operation of the sound unit 100, the anchoring structure 120 can be fixed. In other words, during operation of the sound unit 100, the anchoring structure 120 can be a fixed end (or a fixed edge) relative to the diaphragm 110.

振膜110的形狀可依據需求而設計。在一些實施例中,振膜110的形狀可為多邊形(如,矩形或具有倒角的矩形)、具有曲線邊緣的形狀或其他適合的形狀,但不以此為限。舉例來說,第1圖所示的振膜110的形狀可為具有倒角的矩形,但不以此為限。The shape of the diaphragm 110 can be designed according to the requirements. In some embodiments, the shape of the diaphragm 110 can be a polygon (e.g., a rectangle or a rectangle with chamfered corners), a shape with curved edges, or other suitable shapes, but not limited thereto. For example, the shape of the diaphragm 110 shown in FIG. 1 can be a rectangle with chamfered corners, but not limited thereto.

振膜110與錨定結構120可包括任何適合的材料。在一些實施例中,振膜110與錨定結構120可各自包括矽(例如,單晶矽或多晶矽)、矽化合物(例如,碳化矽、氧化矽)、鍺、鍺化合物、鎵、鎵化合物(例如,氮化鎵、砷化鎵)或其組合,但不以此為限。振膜110與錨定結構120可具有相同或不同的材料。The diaphragm 110 and the anchor structure 120 may include any suitable material. In some embodiments, the diaphragm 110 and the anchor structure 120 may each include silicon (e.g., single crystal silicon or polycrystalline silicon), silicon compounds (e.g., silicon carbide, silicon oxide), germanium, germanium compounds, gallium, gallium compounds (e.g., gallium nitride, gallium arsenide), or a combination thereof, but is not limited thereto. The diaphragm 110 and the anchor structure 120 may have the same or different materials.

在本發明中,振膜110可包括多個子部。如第1圖所示,振膜110包括第一振膜子部112與第二振膜子部114,其中第一振膜子部112與第二振膜子部114在俯視上彼此相對(即,第一振膜子部112與第二振膜子部114在垂直於俯視方向(即,方向Z)的水平方向(如,方向Y)上彼此相對),第一振膜子部112中僅有一個邊緣透過連接到錨定結構120而被錨定,第二振膜子部114中僅有一個邊緣透過連接到錨定結構120而被錨定,第一振膜子部112的其他邊緣與第二振膜子部114的其他邊緣都是非錨定且未連接錨定結構120(以下將這些邊緣稱為「非錨定邊緣」)。換句話說,在第1圖中,第一振膜子部112的第一錨定邊緣112a是第一振膜子部112中唯一被錨定的邊緣,第二振膜子部114的第二錨定邊緣114a是第二振膜子部114中唯一被錨定的邊緣,其中第一振膜子部112僅透過第一錨定邊緣112a直接連接錨定結構120,第二振膜子部114僅透過第二錨定邊緣114a直接連接錨定結構120。在本發明中,第一錨定邊緣112a與第二錨定邊緣114a可被完全錨定或部分錨定。舉例而言,在第1圖所示的實施例中,第一錨定邊緣112a與第二錨定邊緣114a被完全錨定。In the present invention, the diaphragm 110 may include a plurality of sub-sections. As shown in FIG. 1 , the diaphragm 110 includes a first diaphragm sub-portion 112 and a second diaphragm sub-portion 114, wherein the first diaphragm sub-portion 112 and the second diaphragm sub-portion 114 are opposite to each other in a top view (i.e., the first diaphragm sub-portion 112 and the second diaphragm sub-portion 114 are opposite to each other in a horizontal direction (e.g., direction Y) perpendicular to the top view direction (i.e., direction Z)), only one edge of the first diaphragm sub-portion 112 is anchored by being connected to the anchor structure 120, only one edge of the second diaphragm sub-portion 114 is anchored by being connected to the anchor structure 120, and the other edges of the first diaphragm sub-portion 112 and the other edges of the second diaphragm sub-portion 114 are non-anchored and not connected to the anchor structure 120 (hereinafter, these edges are referred to as “non-anchored edges”). In other words, in FIG. 1 , the first anchoring edge 112a of the first diaphragm subsection 112 is the only anchored edge of the first diaphragm subsection 112, and the second anchoring edge 114a of the second diaphragm subsection 114 is the only anchored edge of the second diaphragm subsection 114, wherein the first diaphragm subsection 112 is directly connected to the anchoring structure 120 only through the first anchoring edge 112a, and the second diaphragm subsection 114 is directly connected to the anchoring structure 120 only through the second anchoring edge 114a. In the present invention, the first anchoring edge 112a and the second anchoring edge 114a may be fully anchored or partially anchored. For example, in the embodiment shown in FIG. 1 , the first anchor edge 112 a and the second anchor edge 114 a are completely anchored.

如第1圖所示,振膜110具有多個狹縫SL,其中振膜110可透過狹縫SL而區分為多個子部。在本發明中,狹縫SL可具有至少一直線圖案、至少一曲線圖案或其組合,而狹縫SL的寬度應足夠小。舉例而言,狹縫SL的寬度可為1 µm(微米)至5 µm,但不以此為限。As shown in FIG. 1 , the diaphragm 110 has a plurality of slits SL, wherein the diaphragm 110 can be divided into a plurality of sub-portions through the slits SL. In the present invention, the slits SL can have at least one straight line pattern, at least one curved line pattern or a combination thereof, and the width of the slits SL should be sufficiently small. For example, the width of the slits SL can be 1 µm (micrometer) to 5 µm, but is not limited thereto.

在第1圖與第2圖中,振膜110可具有第一狹縫SL1、至少一第二狹縫SL2與至少一第三狹縫SL3,其中第一狹縫SL1可形成在第一振膜子部112與第二振膜子部114之間,第二狹縫SL2可形成在第一振膜子部112與錨定結構120之間,第三狹縫SL3可形成在第二振膜子部114與錨定結構120之間,第二狹縫SL2的一端可位於振膜110的角落區CR中(如第2圖所示),第三狹縫SL3的一端可位於振膜110的另一個角落區CR中。舉例而言,在第1圖中,振膜110可具有一個第一狹縫SL1、兩個第二狹縫SL2與兩個第三狹縫SL3,其都具有直線圖案,第一振膜子部112在俯視上可在兩個第二狹縫SL2之間,第二振膜子部114在俯視上可在兩個第三狹縫SL3之間,但不以此為限。In Figure 1 and Figure 2, the diaphragm 110 may have a first slit SL1, at least one second slit SL2 and at least one third slit SL3, wherein the first slit SL1 may be formed between the first diaphragm sub-portion 112 and the second diaphragm sub-portion 114, the second slit SL2 may be formed between the first diaphragm sub-portion 112 and the anchor structure 120, the third slit SL3 may be formed between the second diaphragm sub-portion 114 and the anchor structure 120, one end of the second slit SL2 may be located in a corner region CR of the diaphragm 110 (as shown in Figure 2), and one end of the third slit SL3 may be located in another corner region CR of the diaphragm 110. For example, in Figure 1, the diaphragm 110 may have a first slit SL1, two second slits SL2 and two third slits SL3, all of which have straight line patterns, the first diaphragm sub-portion 112 may be between the two second slits SL2 in a top view, and the second diaphragm sub-portion 114 may be between the two third slits SL3 in a top view, but this is not limited to.

在第1圖中,各子部的非錨定邊緣可由狹縫SL來實現。關於第一振膜子部112,在俯視上相對於第一錨定邊緣112a的第一非錨定邊緣112n1可由第一狹縫SL1所定義,相鄰於第一錨定邊緣112a的第二非錨定邊緣112n2可由第二狹縫SL2所定義。關於第二振膜子部114,在俯視上相對於第二錨定邊緣114a的第三非錨定邊緣114n3可由第一狹縫SL1所定義,相鄰於第二錨定邊緣114a的第四非錨定邊緣114n4可由第三狹縫SL3所定義。In Fig. 1, the non-anchored edge of each sub-section can be realized by a slit SL. Regarding the first diaphragm sub-section 112, a first non-anchored edge 112n1 relative to the first anchored edge 112a in a top view can be defined by a first slit SL1, and a second non-anchored edge 112n2 adjacent to the first anchored edge 112a can be defined by a second slit SL2. Regarding the second diaphragm sub-portion 114, a third non-anchor edge 114n3 relative to the second anchor edge 114a in a plan view may be defined by a first slit SL1, and a fourth non-anchor edge 114n4 adjacent to the second anchor edge 114a may be defined by a third slit SL3.

在本發明中,振膜110的子部的形狀可依據需求而設計,其中振膜110的子部的形狀可為多邊形(如,矩形)、具有曲線邊緣的形狀或其他適合的形狀。舉例來說,在第1圖中,第一振膜子部112的形狀與第二振膜子部114的形狀可實質上為矩形,且第一振膜子部112與第二振膜子部114可實質上全等,但不以此為限。因此,在第1圖中,第二非錨定邊緣112n2可相鄰於並位於第一非錨定邊緣112n1與第一錨定邊緣112a之間,第四非錨定邊緣114n4可相鄰於並位於第三非錨定邊緣114n3與第二錨定邊緣114a之間,但不以此為限。在第1圖中,第二狹縫SL2與第三狹縫SL3連接於第一狹縫SL1。舉例來說,第一狹縫SL1可連接在兩個第二狹縫SL2之間與連接在兩個第三狹縫SL3之間,但不以此為限。In the present invention, the shape of the sub-portion of the diaphragm 110 can be designed according to the requirements, wherein the shape of the sub-portion of the diaphragm 110 can be a polygon (e.g., a rectangle), a shape with curved edges, or other suitable shapes. For example, in FIG. 1 , the shape of the first diaphragm sub-portion 112 and the shape of the second diaphragm sub-portion 114 can be substantially rectangular, and the first diaphragm sub-portion 112 and the second diaphragm sub-portion 114 can be substantially congruent, but not limited thereto. Therefore, in FIG. 1, the second non-anchored edge 112n2 may be adjacent to and located between the first non-anchored edge 112n1 and the first anchored edge 112a, and the fourth non-anchored edge 114n4 may be adjacent to and located between the third non-anchored edge 114n3 and the second anchored edge 114a, but the present invention is not limited thereto. In FIG. 1, the second slit SL2 and the third slit SL3 are connected to the first slit SL1. For example, the first slit SL1 may be connected between two second slits SL2 and between two third slits SL3, but the present invention is not limited thereto.

由於第一振膜子部112的形狀與第二振膜子部114的形狀可實質上為矩形,第一錨定邊緣112a、第一非錨定邊緣112n1、第二錨定邊緣114a與第三非錨定邊緣114n3實質上彼此平行並具有實質上相同的長度,第二非錨定邊緣112n2與第四非錨定邊緣114n4實質上彼此平行(即,平行方向X)並具有實質上相同的長度。也就是說,定義第一非錨定邊緣112n1與第三非錨定邊緣114n3的第一狹縫SL1平行於第一錨定邊緣112a與第二錨定邊緣114a。Since the shapes of the first diaphragm sub-portion 112 and the second diaphragm sub-portion 114 can be substantially rectangular, the first anchor edge 112a, the first non-anchor edge 112n1, the second anchor edge 114a and the third non-anchor edge 114n3 are substantially parallel to each other and have substantially the same length, and the second non-anchor edge 112n2 and the fourth non-anchor edge 114n4 are substantially parallel to each other (i.e., parallel to the direction X) and have substantially the same length. In other words, the first slit SL1 defining the first non-anchor edge 112n1 and the third non-anchor edge 114n3 is parallel to the first anchor edge 112a and the second anchor edge 114a.

在一些實施例中,在第1圖中,第二狹縫SL2與第三狹縫SL3可彼此連接,使得第二狹縫SL2與第三狹縫SL3可結合而形成一長直線狹縫,但不以此為限。In some embodiments, in FIG. 1 , the second slit SL2 and the third slit SL3 may be connected to each other, so that the second slit SL2 and the third slit SL3 may be combined to form a long straight slit, but the present invention is not limited thereto.

如第1圖所示,第一振膜子部112的第一錨定邊緣112a為振膜110的一邊緣,第二振膜子部114的第二錨定邊緣114a為振膜110的另一邊緣。第一振膜子部112的第二非錨定邊緣112n2可為或可不為振膜110的邊緣,第二振膜子部114的第四非錨定邊緣114n4可為或可不為振膜110的邊緣。舉例而言,在第1圖中,第一振膜子部112的第二非錨定邊緣112n2可不為振膜110的邊緣,第二振膜子部114的第四非錨定邊緣114n4可不為振膜110的邊緣,使得第二狹縫SL2在俯視上可位於第一振膜子部112與振膜110的一邊緣之間,第三狹縫SL3在俯視上可位於第二振膜子部114與振膜110的一邊緣之間,但不以此為限。As shown in FIG. 1 , the first anchoring edge 112a of the first diaphragm sub-portion 112 is one edge of the diaphragm 110, and the second anchoring edge 114a of the second diaphragm sub-portion 114 is the other edge of the diaphragm 110. The second non-anchoring edge 112n2 of the first diaphragm sub-portion 112 may or may not be the edge of the diaphragm 110, and the fourth non-anchoring edge 114n4 of the second diaphragm sub-portion 114 may or may not be the edge of the diaphragm 110. For example, in Figure 1, the second non-anchored edge 112n2 of the first diaphragm sub-portion 112 may not be the edge of the diaphragm 110, and the fourth non-anchored edge 114n4 of the second diaphragm sub-portion 114 may not be the edge of the diaphragm 110, so that the second slit SL2 may be located between the first diaphragm sub-portion 112 and an edge of the diaphragm 110 in a top view, and the third slit SL3 may be located between the second diaphragm sub-portion 114 and an edge of the diaphragm 110 in a top view, but it is not limited to this.

須說明的是,狹縫SL可釋放振膜110的殘餘應力(residual stress),其中殘餘應力是在振膜110的製造過程中產生或是原本就存在於振膜110中。It should be noted that the slits SL can release the residual stress of the diaphragm 110 , wherein the residual stress is generated during the manufacturing process of the diaphragm 110 or originally exists in the diaphragm 110 .

發聲單元100可包括在方向Z上設置在振膜110上的致動層130,致動層130用以致動振膜110。在一些實施例中,如第1圖所示,致動層130在俯視上可不完全重疊於振膜110。舉例而言,在第1圖中,致動層130可設置在第一振膜子部112與第二振膜子部114上,致動層130可在俯視上重疊於第一振膜子部112的一部分與第二振膜子部114的一部分。可選擇地,在第1圖中,致動層130可設置在錨定結構120上並重疊於錨定結構120,且致動層130可重疊於振膜110的子部的錨定邊緣,但不以此為限。The sound unit 100 may include an actuating layer 130 disposed on the diaphragm 110 in the direction Z, and the actuating layer 130 is used to actuate the diaphragm 110. In some embodiments, as shown in FIG. 1 , the actuating layer 130 may not completely overlap the diaphragm 110 in a top view. For example, in FIG. 1 , the actuating layer 130 may be disposed on the first diaphragm sub-portion 112 and the second diaphragm sub-portion 114, and the actuating layer 130 may overlap a portion of the first diaphragm sub-portion 112 and a portion of the second diaphragm sub-portion 114 in a top view. Alternatively, in FIG. 1 , the actuating layer 130 may be disposed on and overlap the anchoring structure 120 , and the actuating layer 130 may overlap the anchoring edge of a sub-portion of the diaphragm 110 , but is not limited thereto.

如第1圖所示,在俯視上,致動層130與狹縫SL之間存在有一距離,以提升狹縫SL與致動層130的可靠度,但不以此為限。As shown in FIG. 1 , in a top view, there is a distance between the actuating layer 130 and the slit SL to improve the reliability of the slit SL and the actuating layer 130 , but the present invention is not limited thereto.

致動層130可包括對於振膜110沿方向Z上的運動具有單調的機電轉換功能的致動件。在一些實施例中,致動層130可包括壓電式致動件、靜電式致動件、奈米靜電致動式(nanoscopic-electrostatic-drive, NED)致動件、電磁式致動件或任何其他適合的致動件,但不以此為限。舉例而言,在一實施例中,致動層130可包括壓電式致動件,壓電式致動件可包含例如兩電極與設置在兩電極之間的壓電材料層(例如,鋯鈦酸鉛(lead zirconate titanate, PZT)),其中壓電材料層可依據電極所接收到的驅動訊號(例如,驅動電壓)來致動振膜110,但不以此為限。舉例而言,在另一實施例中,致動層130可包括電磁式致動件(如平面式線圈(planar coil)),其中電磁式致動件可依據所接收到的驅動訊號(例如,驅動電流)與磁場來致動振膜110(即,振膜110可由電磁力所致動),但不以此為限。舉例而言,在另一實施例中,致動層130可包括靜電式致動件(如,導電板)或NED致動件,其中靜電式致動件或NED致動件可依據所接收到的驅動訊號(例如,驅動電壓)與電場來致動振膜110(即,振膜110可由靜電力所致動),但不以此為限。The actuation layer 130 may include an actuator having a monotonic electromechanical conversion function for the movement of the diaphragm 110 along the direction Z. In some embodiments, the actuation layer 130 may include a piezoelectric actuator, an electrostatic actuator, a nanoscopic-electrostatic-drive (NED) actuator, an electromagnetic actuator, or any other suitable actuator, but is not limited thereto. For example, in one embodiment, the actuation layer 130 may include a piezoelectric actuator, which may include, for example, two electrodes and a piezoelectric material layer (e.g., lead zirconate titanate (PZT)) disposed between the two electrodes, wherein the piezoelectric material layer may actuate the diaphragm 110 according to a driving signal (e.g., a driving voltage) received by the electrodes, but the invention is not limited thereto. For example, in another embodiment, the actuation layer 130 may include an electromagnetic actuator (e.g., a planar coil), wherein the electromagnetic actuator may actuate the diaphragm 110 according to a received driving signal (e.g., a driving current) and a magnetic field (i.e., the diaphragm 110 may be actuated by an electromagnetic force), but the invention is not limited thereto. For example, in another embodiment, the actuating layer 130 may include an electrostatic actuator (e.g., a conductive plate) or a NED actuator, wherein the electrostatic actuator or the NED actuator may actuate the diaphragm 110 according to a received driving signal (e.g., a driving voltage) and an electric field (i.e., the diaphragm 110 may be actuated by electrostatic force), but is not limited thereto.

振膜110透過致動層130致動,以沿著方向Z移動,進而執行聲學轉換。換句話說,振膜110的子部可被致動以進行上下移動,以執行聲學轉換。須注意的是,聲波是因為由致動層130致動而造成的振膜110的移動而產生,且振膜110的移動相關於聲波的聲壓位準(sound pressure level, SPL)。The diaphragm 110 is actuated by the actuation layer 130 to move along the direction Z to perform acoustic conversion. In other words, a sub-portion of the diaphragm 110 can be actuated to move up and down to perform acoustic conversion. It should be noted that sound waves are generated due to the movement of the diaphragm 110 caused by the actuation of the actuation layer 130, and the movement of the diaphragm 110 is related to the sound pressure level (SPL) of the sound waves.

當子部進行上下移動時,會形成在方向Z上的開口,而這些開口相鄰於子部的所有非錨定邊緣。舉例而言,在發聲單元100的操作中,中央開口可形成在第一振膜子部112的第一非錨定邊緣112n1與第二振膜子部114的第三非錨定邊緣114n3之間,而多個側開口可分別形成在第一振膜子部112的第二非錨定邊緣112n2與錨定結構120之間以及在第二振膜子部114的第四非錨定邊緣114n4與錨定結構120之間。When the sub-sections move up and down, openings are formed in the direction Z, and these openings are adjacent to all non-anchored edges of the sub-sections. For example, in the operation of the sound unit 100, a central opening may be formed between a first non-anchored edge 112n1 of the first diaphragm sub-section 112 and a third non-anchored edge 114n3 of the second diaphragm sub-section 114, and a plurality of side openings may be formed between a second non-anchored edge 112n2 of the first diaphragm sub-section 112 and the anchoring structure 120 and between a fourth non-anchored edge 114n4 of the second diaphragm sub-section 114 and the anchoring structure 120, respectively.

振膜110的多個子部可依據需求而沿相同方向或不同方向移動。在一些實施例中,第一振膜子部112與第二振膜子部114可以在方向Z上同步地上下移動(即,第一振膜子部112與第二振膜子部114可被致動而朝向相同方向移動),以避免在第一振膜子部112和第二振膜子部114之間形成大的中央開口,但不以此為限。The multiple subsections of the diaphragm 110 may move in the same direction or in different directions as required. In some embodiments, the first diaphragm subsection 112 and the second diaphragm subsection 114 may move up and down synchronously in the direction Z (i.e., the first diaphragm subsection 112 and the second diaphragm subsection 114 may be actuated to move in the same direction) to avoid forming a large central opening between the first diaphragm subsection 112 and the second diaphragm subsection 114, but the present invention is not limited thereto.

致動層130可基於所接收到的驅動訊號而致動振膜110以產生聲波。聲波對應於輸入音訊訊號,而施加在致動層130上的驅動訊號對應於(相關於)輸入音訊訊號。The actuating layer 130 can actuate the diaphragm 110 to generate sound waves based on the received driving signal. The sound waves correspond to the input audio signal, and the driving signal applied to the actuating layer 130 corresponds to (is related to) the input audio signal.

須注意的是,發聲單元100(或振膜110)的短側可能有利於獲得更高的共振頻率,發聲單元100(或振膜110)的長側可能有利於擴大聲壓位準。換句話說,具有大的縱橫比(aspect ratio)(即,長側的長度相對於短側的長度的比率)的發聲單元100(或振膜110)相較於小的縱橫比的單元可達到較高共振頻率與較大聲壓位準。發聲單元100(或振膜110)的縱橫比可取決於實際需求。舉例而言,發聲單元100(或振膜110)的縱橫比可大於2,以提升發聲單元100的性能,但不以此為限。It should be noted that the short side of the sound unit 100 (or diaphragm 110) may be beneficial for obtaining a higher resonance frequency, and the long side of the sound unit 100 (or diaphragm 110) may be beneficial for expanding the sound pressure level. In other words, a sound unit 100 (or diaphragm 110) with a large aspect ratio (i.e., the ratio of the length of the long side to the length of the short side) can achieve a higher resonance frequency and a larger sound pressure level than a unit with a small aspect ratio. The aspect ratio of the sound unit 100 (or diaphragm 110) may depend on actual needs. For example, the aspect ratio of the sound unit 100 (or the diaphragm 110) may be greater than 2 to enhance the performance of the sound unit 100, but is not limited thereto.

在下文中,將進一步示例性地說明發聲單元100的製造方法的細節。須說明的是,在下述的製造方法中,發聲單元100中的致動層130舉例可包括壓電式致動件,但不以此為限。發聲單元100的致動層130可使用任何適合的種類的致動件。In the following, the details of the manufacturing method of the sound unit 100 will be further exemplified. It should be noted that in the following manufacturing method, the actuation layer 130 in the sound unit 100 may include a piezoelectric actuator, but is not limited thereto. The actuation layer 130 of the sound unit 100 may use any suitable type of actuator.

在下述製造方法中,形成製程可包括原子層沉積(atomic layer deposition, ALD)、化學氣相沈積(chemical vapor deposition, CVD)、其他適合的製程或其組合。圖案化製程可例如包括微影(photolithography)、蝕刻製程(etching process)、任何其他適合的製程或其組合。In the following manufacturing method, the formation process may include atomic layer deposition (ALD), chemical vapor deposition (CVD), other suitable processes or combinations thereof. The patterning process may include, for example, photolithography, etching process, any other suitable process or combinations thereof.

請參考第3圖至第8圖,第3圖至第8圖所示為本發明一實施例的發聲單元的製造方法在不同階段時的結構的示意圖。在本實施例中,發聲單元100可由至少一半導體製程所製造,以形成MEMS晶片,但不以此為限。如第3圖所示,提供一晶圓WF,其中晶圓WF可包括第一層WL1與第二層WL2,並可選擇性地包括在第一層WL1與第二層WL2之間的絕緣層WL3。Please refer to FIG. 3 to FIG. 8, which are schematic diagrams showing the structure of the sound unit manufacturing method of an embodiment of the present invention at different stages. In this embodiment, the sound unit 100 can be manufactured by at least a semiconductor process to form a MEMS chip, but is not limited to this. As shown in FIG. 3, a wafer WF is provided, wherein the wafer WF may include a first layer WL1 and a second layer WL2, and may optionally include an insulating layer WL3 between the first layer WL1 and the second layer WL2.

第一層WL1、絕緣層WL3與第二層WL2可各自包括任何適合的材料,使得晶圓WF可為任何適合的種類。舉例來說,第一層WL1與第二層WL2可各自包括矽(例如單晶矽或多晶矽)、矽化合物(如,碳化矽、氧化矽)、鍺、鍺化合物、鎵、鎵化合物(如,氮化鎵、砷化鎵)或其組合,但不以此為限。在一些實施例中,第一層WL1可包括單晶矽,使得晶圓WF可為矽覆絕緣體(SOI)晶圓,但不以此為限。舉例來說,絕緣層WL3可包括氧化物,如氧化矽(例如二氧化矽),但不以此為限。第一層WL1、絕緣層WL3與第二層WL2的厚度可各自依據需求而調整。The first layer WL1, the insulating layer WL3, and the second layer WL2 may each include any suitable material, so that the wafer WF may be of any suitable type. For example, the first layer WL1 and the second layer WL2 may each include silicon (e.g., single crystal silicon or polycrystalline silicon), silicon compounds (e.g., silicon carbide, silicon oxide), germanium, germanium compounds, gallium, gallium compounds (e.g., gallium nitride, gallium arsenide), or a combination thereof, but not limited thereto. In some embodiments, the first layer WL1 may include single crystal silicon, so that the wafer WF may be a silicon-on-insulator (SOI) wafer, but not limited thereto. For example, the insulating layer WL3 may include an oxide, such as silicon oxide (e.g., silicon dioxide), but not limited thereto. The thicknesses of the first layer WL1, the insulating layer WL3 and the second layer WL2 can be adjusted according to requirements.

在第3圖中,補償氧化物層CPS可選擇性地形成在晶圓WF的上側,其中 上側比第一層WL1中相反於第二層WL2的上表面WL1a還高,使得第一層WL1位於補償氧化物層CPS與第二層WL2之間。補償氧化物層CPS中包含的氧化物的材料與補償氧化物層CPS的厚度可依照需求而設計。In FIG. 3 , the compensating oxide layer CPS may be selectively formed on the upper side of the wafer WF, wherein the upper side is higher than the upper surface WL1a of the first layer WL1 opposite to the second layer WL2, so that the first layer WL1 is located between the compensating oxide layer CPS and the second layer WL2. The material of the oxide contained in the compensating oxide layer CPS and the thickness of the compensating oxide layer CPS may be designed as required.

在第3圖中,第一導電層CT1與致動材料AM可依序形成在晶圓WF的上側上(形成在第一層WL1上),使得第一導電層CT1可位於致動材料AM與第一層WL1之間。在一些實施例中,第一導電層CT1與致動材料AM可彼此接觸。3, the first conductive layer CT1 and the actuating material AM may be sequentially formed on the upper side of the wafer WF (formed on the first layer WL1), so that the first conductive layer CT1 may be located between the actuating material AM and the first layer WL1. In some embodiments, the first conductive layer CT1 and the actuating material AM may contact each other.

第一導電層CT1可包括任何適合的導電材料,致動材料AM可包括任何適合的材料。在一些實施例中,第一導電層CT1可包括金屬(例如鉑(platinum)),而致動材料AM可包括壓電材料,但不以此為限。舉例來說,壓電材料可例如包括鋯鈦酸鉛(lead-zirconate-titanate, PZT)材料,但不以此為限。此外,第一導電層CT1的厚度與致動材料AM的厚度可各自依照需求而調整。The first conductive layer CT1 may include any suitable conductive material, and the actuating material AM may include any suitable material. In some embodiments, the first conductive layer CT1 may include a metal (e.g., platinum), and the actuating material AM may include a piezoelectric material, but not limited thereto. For example, the piezoelectric material may include, but not limited to, lead-zirconate-titanate (PZT) material. In addition, the thickness of the first conductive layer CT1 and the thickness of the actuating material AM may be adjusted according to requirements.

然後,在第3圖中,致動材料AM、第一導電層CT1與補償氧化物層CPS可被依序圖案化。Then, in FIG. 3 , the actuating material AM, the first conductive layer CT1 and the compensating oxide layer CPS may be patterned sequentially.

如第4圖所示,隔離絕緣層SIL可形成在致動材料AM上並被圖案化,而隔離絕緣層SIL的厚度和材料可依照需求進行設計。舉例來說,隔離絕緣層SIL的材料可為氧化物,但不以此為限。As shown in FIG. 4 , an isolation insulating layer SIL may be formed on the actuating material AM and patterned, and the thickness and material of the isolation insulating layer SIL may be designed according to requirements. For example, the material of the isolation insulating layer SIL may be oxide, but is not limited thereto.

如第4圖所示,第二導電層CT2可形成在致動材料AM與隔離絕緣層SIL上,接著,可圖案化第二導電層CT2。第二導電層CT2的厚度和材料可依照需求進行設計。舉例來說,第二導電層CT2可包括金屬(例如鉑),但不以此為限。舉例來說,第二導電層CT2可接觸致動材料AM。As shown in FIG. 4 , the second conductive layer CT2 may be formed on the actuating material AM and the isolation insulating layer SIL, and then the second conductive layer CT2 may be patterned. The thickness and material of the second conductive layer CT2 may be designed according to requirements. For example, the second conductive layer CT2 may include metal (e.g., platinum), but is not limited thereto. For example, the second conductive layer CT2 may contact the actuating material AM.

致動材料AM、第一導電層CT1與第二導電層CT2可為發聲單元100的致動層130中的子層,以使致動層130具有包含兩電極與位於兩電極之間的致動材料AM的壓電式致動件(如,第一導電層CT1與第二導電層CT2分別作為致動層130中的第一電極與第二電極)。The actuating material AM, the first conductive layer CT1 and the second conductive layer CT2 can be sub-layers in the actuating layer 130 of the sound unit 100, so that the actuating layer 130 has a piezoelectric actuator including two electrodes and the actuating material AM located between the two electrodes (for example, the first conductive layer CT1 and the second conductive layer CT2 serve as the first electrode and the second electrode in the actuating layer 130, respectively).

在第4圖中,隔離絕緣層SIL可用於隔開第一導電層CT1的至少一部分與第二導電層CT2的至少一部分。In FIG. 4 , the isolation insulating layer SIL may be used to isolate at least a portion of the first conductive layer CT1 from at least a portion of the second conductive layer CT2.

如第5圖所示,晶圓WF的第一層WL1可被圖案化以形成溝道線TL。在第5圖中,溝道線TL為第一層WL1中被移除的一部分。也就是說,溝道線TL位於第一層WL1的兩個部之間。As shown in Fig. 5, the first layer WL1 of the wafer WF may be patterned to form a trench line TL. In Fig. 5, the trench line TL is a portion of the first layer WL1 that is removed. That is, the trench line TL is located between two portions of the first layer WL1.

如第6圖所示,將晶圓WF設置在基板SB與黏著層AL上,其中黏著層AL黏著在基板SB與晶圓WF的第一層WL1之間。在第6圖中,致動層130位於晶圓WF與基板SB之間。由於此步驟,晶圓WF的第一層WL1與設置在晶圓WF的上側上的結構(即,位於晶圓WF的上表面WL1a上的結構)可在後續步驟中被保護。As shown in FIG. 6 , the wafer WF is placed on the substrate SB and the adhesive layer AL, wherein the adhesive layer AL is adhered between the substrate SB and the first layer WL1 of the wafer WF. In FIG. 6 , the actuating layer 130 is located between the wafer WF and the substrate SB. Due to this step, the first layer WL1 of the wafer WF and the structure disposed on the upper side of the wafer WF (i.e., the structure located on the upper surface WL1a of the wafer WF) can be protected in subsequent steps.

如第7圖所示,可對晶圓WF的第二層WL2進行圖案化,以使第二層WL2形成錨定結構120,並使第一層WL1形成被錨定結構120錨定的振膜110。詳細而言,晶圓WF的第二層WL2可具有第一部和第二部,第二層WL2的第一部可被移除,而第二層WL2的第二部可形成錨定結構120。由於第二層WL2的第一部被移除,因此第一層WL1形成振膜110,其中振膜110在俯視上對應於第二層WL2中被移除的第一部。舉例而言,第二層WL2的第一部可透過深反應性離子蝕刻(deep reactive ion etching, DRIE)製程來移除,但不以此為限。需注意的是,當晶圓WF的第一層WL1被圖案化而形成溝道線TL時,可決定出振膜110的子部(如,第一振膜子部112與第二振膜子部114)的設計。As shown in FIG. 7 , the second layer WL2 of the wafer WF may be patterned so that the second layer WL2 forms an anchoring structure 120, and the first layer WL1 forms a diaphragm 110 anchored by the anchoring structure 120. In detail, the second layer WL2 of the wafer WF may have a first portion and a second portion, the first portion of the second layer WL2 may be removed, and the second portion of the second layer WL2 may form the anchoring structure 120. Since the first portion of the second layer WL2 is removed, the first layer WL1 forms a diaphragm 110, wherein the diaphragm 110 corresponds to the first portion of the second layer WL2 that is removed in a top view. For example, the first portion of the second layer WL2 may be removed by a deep reactive ion etching (DRIE) process, but is not limited thereto. It should be noted that when the first layer WL1 of the wafer WF is patterned to form the trench lines TL, the designs of the sub-portions of the diaphragm 110 (eg, the first diaphragm sub-portion 112 and the second diaphragm sub-portion 114 ) may be determined.

可選擇地,在第7圖中,由於晶圓WF的絕緣層WL3存在,因此在晶圓WF的第二層WL2被圖案化之後,也可移除對應於第二層WL2的第一部的絕緣層WL3的部分,以使得第一層WL1形成振膜110,但不以此為限。Optionally, in FIG. 7 , since the insulating layer WL3 of the wafer WF exists, after the second layer WL2 of the wafer WF is patterned, the portion of the insulating layer WL3 corresponding to the first portion of the second layer WL2 may be removed so that the first layer WL1 forms the diaphragm 110 , but not limited thereto.

另外,在第7圖中,第二層WL2的第二部、絕緣層WL3中重疊於第二層WL2的第二部的部分與第一層WL1中重疊於第二層WL2的第二部的部分可結合而作為錨定結構120。In addition, in FIG. 7 , the second portion of the second layer WL2 , the portion of the insulating layer WL3 overlapping the second portion of the second layer WL2 , and the portion of the first layer WL1 overlapping the second portion of the second layer WL2 may be combined to form an anchor structure 120 .

如第8圖所示,基板SB與黏著層AL可透過適合的製程來移除,以完成發聲單元100的製造。舉例而言,基板SB與黏著層AL可透過剝離製程(peel-off process)來移除,但不以此為限。As shown in FIG8 , the substrate SB and the adhesive layer AL can be removed by a suitable process to complete the manufacture of the sound unit 100. For example, the substrate SB and the adhesive layer AL can be removed by a peel-off process, but the present invention is not limited thereto.

在第8圖中,由於第二層WL2的第一部被移除以使得第一層WL1形成振膜110,因此狹縫SL是因為溝道線TL而形成在振膜110內並貫穿振膜110。由於狹縫SL可因溝道線TL而形成,溝道線TL的寬度可依據狹縫SL的需求進行設計。舉例而言,溝道線TL的寬度可小於或等於5 µm、小於或等於3 µm、小於或等於2 µm,使得狹縫SL可具有期望的寬度,但不以此為限。In FIG. 8 , since the first portion of the second layer WL2 is removed so that the first layer WL1 forms the diaphragm 110, the slit SL is formed in the diaphragm 110 due to the trench line TL and penetrates the diaphragm 110. Since the slit SL can be formed due to the trench line TL, the width of the trench line TL can be designed according to the requirements of the slit SL. For example, the width of the trench line TL can be less than or equal to 5 µm, less than or equal to 3 µm, less than or equal to 2 µm, so that the slit SL can have a desired width, but is not limited thereto.

本發明的發聲單元以及其製造方法不以上述實施例為限,下文將繼續揭示其它實施例,然為了簡化說明並突顯各實施例與上述實施例之間的差異,下文中使用相同標號標注相同元件,並不再對重複部分作贅述。The sound unit and the manufacturing method thereof of the present invention are not limited to the above-mentioned embodiments, and other embodiments will be disclosed below. However, in order to simplify the description and highlight the differences between each embodiment and the above-mentioned embodiment, the same reference numerals are used below to mark the same elements, and the repeated parts will not be elaborated.

請參考第9圖與第10圖,第9圖所示為本發明第二實施例的發聲單元的俯視示意圖,第10圖所示為第9圖的區域R2中的結構的放大示意圖。如第9圖與第10圖所示,本實施例與第一實施例的差異在於本實施例的發聲單元200包括設置在振膜110外且在發聲單元200的角落的凹槽結構RS,其中凹槽結構RS直接連接於振膜110的角落區CR中的狹縫段SLs。在第9圖所示的實施例中,發聲單元200可包括四個凹槽結構RS,設置在振膜110外且在發聲單元200的四個角落,但不以此為限。Please refer to FIG. 9 and FIG. 10, FIG. 9 is a schematic top view of the sound unit of the second embodiment of the present invention, and FIG. 10 is an enlarged schematic view of the structure in the area R2 of FIG. 9. As shown in FIG. 9 and FIG. 10, the difference between this embodiment and the first embodiment is that the sound unit 200 of this embodiment includes a groove structure RS disposed outside the diaphragm 110 and at the corner of the sound unit 200, wherein the groove structure RS is directly connected to the slit segment SLs in the corner region CR of the diaphragm 110. In the embodiment shown in FIG. 9, the sound unit 200 may include four groove structures RS disposed outside the diaphragm 110 and at the four corners of the sound unit 200, but is not limited thereto.

角落區CR中的狹縫段SLs可為連接於第二狹縫SL2或第三狹縫SL3的狹縫SL,或者,角落區CR中的狹縫段SLs可為第二狹縫SL2的一部分或第三狹縫SL3的一部分。狹縫段SLs可具有曲線圖案、直線圖案或其組合。舉例而言,在第10圖中,狹縫段SLs可連接在第二狹縫SL2位於角落區CR中的一端與凹槽結構RS之間,而狹縫段SLs可具有曲線圖案,但不以此為限。The slit segment SLs in the corner region CR may be a slit SL connected to the second slit SL2 or the third slit SL3, or the slit segment SLs in the corner region CR may be a part of the second slit SL2 or a part of the third slit SL3. The slit segment SLs may have a curved pattern, a straight line pattern, or a combination thereof. For example, in FIG. 10 , the slit segment SLs may be connected between one end of the second slit SL2 in the corner region CR and the groove structure RS, and the slit segment SLs may have a curved pattern, but is not limited thereto.

如第9圖與第10圖所示,凹槽結構RS可形成在錨定結構120上並位於發聲單元200的角落。舉例來說,發聲單元200可具有第一層WL1與設置在第一層WL1下的第二層WL2(如,第8圖),其中第一層WL1的一部分可用以作為振膜110(即,第一層WL1可包括振膜110),第一層WL1的另一部分可環繞振膜110並與第二層WL2結合而成為錨定結構120,振膜110的角落區CR中的狹縫段SLs可穿過第一層WL1,凹槽結構RS可穿過第一層WL1並具有屬於錨定結構120(如,第二層WL2)的底部,但不以此為限。在此情況下,關於發聲單元200的製造方法,振膜110的狹縫SL與凹槽結構RS可在相同製程(相同蝕刻製程)中被圖案化(蝕刻)。As shown in FIGS. 9 and 10 , the groove structure RS may be formed on the anchor structure 120 and located at the corner of the sound unit 200. For example, the sound unit 200 may have a first layer WL1 and a second layer WL2 disposed under the first layer WL1 (e.g., FIG. 8 ), wherein a portion of the first layer WL1 may be used as a diaphragm 110 (i.e., the first layer WL1 may include the diaphragm 110), another portion of the first layer WL1 may surround the diaphragm 110 and be combined with the second layer WL2 to form the anchor structure 120, the slit segment SLs in the corner region CR of the diaphragm 110 may pass through the first layer WL1, and the groove structure RS may pass through the first layer WL1 and have a bottom portion belonging to the anchor structure 120 (e.g., the second layer WL2), but is not limited thereto. In this case, regarding the manufacturing method of the sound unit 200, the slit SL and the groove structure RS of the diaphragm 110 can be patterned (etched) in the same process (the same etching process).

如第9圖與第10圖所示,凹槽結構RS可具有曲線圖案,而凹槽結構RS的曲線圖案可依據需求而設計。舉例而言,在第10圖中,角落區CR的狹縫段SLs 與凹槽結構RS可結合而形成半圓弧圖案,但不以此為限。As shown in Figures 9 and 10, the groove structure RS may have a curved pattern, and the curved pattern of the groove structure RS may be designed according to requirements. For example, in Figure 10, the slit segments SLs of the corner region CR and the groove structure RS may be combined to form a semicircular arc pattern, but the present invention is not limited thereto.

連接位於角落區CR中的狹縫段SLs的彎曲凹槽結構RS的存在可提高發聲單元200的製造過程的成功率,進而提高發聲單元200的良率。詳細而言,在移除基板SB與黏著層AL的步驟(如,剝離製程)中,由於連接位於角落區CR中的狹縫段SLs的彎曲凹槽結構RS的存在,因此,應力集中位置可從振膜110的角落區CR(如,狹縫SL的一端)改變為凹槽結構RS,且施加在凹槽結構RS上的應力可被分散,以減少振膜110在此製程中的損傷。另外,由於凹槽結構RS具有曲線圖案,在此製程中施加在凹槽結構RS上的應力可被更有效地分散,以減少凹槽結構RS的損傷,進而提高發聲單元200的製造過程的成功率。The existence of the curved groove structure RS connecting the slit segments SLs located in the corner region CR can improve the success rate of the manufacturing process of the sound unit 200, thereby improving the yield of the sound unit 200. In detail, in the step of removing the substrate SB and the adhesive layer AL (e.g., a peeling process), due to the existence of the curved groove structure RS connecting the slit segments SLs located in the corner region CR, the stress concentration position can be changed from the corner region CR of the diaphragm 110 (e.g., one end of the slit SL) to the groove structure RS, and the stress applied to the groove structure RS can be dispersed to reduce damage to the diaphragm 110 in this process. In addition, since the groove structure RS has a curved pattern, the stress applied to the groove structure RS in this process can be more effectively dispersed to reduce damage to the groove structure RS, thereby improving the success rate of the manufacturing process of the sound unit 200.

請參考第11圖,第11圖所示為本發明第三實施例的發聲單元的俯視示意圖。如第11圖所示,本實施例與第一實施例的差異在於本實施例的發聲單元300的振膜110包括閂鎖結構(latch structure) 310。在第一振膜子部112與第二振膜子部114沿方向Z(即,設置有振膜110的基底的法線方向)移動的情況下,當第一振膜子部112在方向Z上的移動距離與第二振膜子部114在方向Z上的移動距離大於閥值時,閂鎖結構310可鎖住第一振膜子部112與第二振膜子部114。換句話說,閂鎖結構310用以限制第一振膜子部112與第二振膜子部114的移動距離。Please refer to FIG. 11, which is a top view schematic diagram of the sound unit of the third embodiment of the present invention. As shown in FIG. 11, the difference between this embodiment and the first embodiment is that the diaphragm 110 of the sound unit 300 of this embodiment includes a latch structure 310. When the first diaphragm sub-portion 112 and the second diaphragm sub-portion 114 move along the direction Z (i.e., the normal direction of the substrate on which the diaphragm 110 is provided), when the moving distance of the first diaphragm sub-portion 112 in the direction Z and the moving distance of the second diaphragm sub-portion 114 in the direction Z are greater than the valve value, the latch structure 310 can lock the first diaphragm sub-portion 112 and the second diaphragm sub-portion 114. In other words, the latching structure 310 is used to limit the moving distance of the first diaphragm sub-portion 112 and the second diaphragm sub-portion 114 .

因為振膜110的子部僅具有一個錨定邊緣,因此振膜110的子部可能脆弱且可能在製造過程中受損。在本實施例中,閂鎖結構310的存在可提升製造振膜110的成功率,進而提高發聲單元300的良率。詳細而言,在移除基板SB與黏著層AL的步驟(如,剝離製程)中,第一振膜子部112沿方向Z的位移與第二振膜子部114沿方向Z的位移是由黏著層AL的黏著力所造成。在此情況下,當第一振膜子部112與第二振膜子部114在方向Z上的位移量大於閥值時,閂鎖結構310可鎖住第一振膜子部112與第二振膜子部114,以限制第一振膜子部112與第二振膜子部114的移動,並提供對於第一振膜子部112與第二振膜子部114的恢復力,進而減少振膜110的損傷。Because the sub-portion of the diaphragm 110 has only one anchoring edge, the sub-portion of the diaphragm 110 may be fragile and may be damaged during the manufacturing process. In the present embodiment, the presence of the latching structure 310 can improve the success rate of manufacturing the diaphragm 110, thereby improving the yield of the sound unit 300. In detail, in the step of removing the substrate SB and the adhesive layer AL (e.g., a peeling process), the displacement of the first diaphragm sub-portion 112 along the direction Z and the displacement of the second diaphragm sub-portion 114 along the direction Z are caused by the adhesive force of the adhesive layer AL. In this case, when the displacement of the first diaphragm sub-section 112 and the second diaphragm sub-section 114 in the direction Z is greater than the valve value, the latch structure 310 can lock the first diaphragm sub-section 112 and the second diaphragm sub-section 114 to limit the movement of the first diaphragm sub-section 112 and the second diaphragm sub-section 114, and provide a restoring force for the first diaphragm sub-section 112 and the second diaphragm sub-section 114, thereby reducing damage to the diaphragm 110.

閂鎖結構310可依據需求而有任何適合的設計。在本實施例中,第11圖所示的閂鎖結構310可由於狹縫SL而形成。舉例而言,在第11圖中,閂鎖結構310可由於兩個第一狹縫SL1與三個第四狹縫SL4、SL4’而形成,其中第一狹縫SL1與第四狹縫SL4、SL4’可在第一振膜子部112與第二振膜子部114之間,三個第四狹縫SL4、SL4’可連接在兩個第一狹縫SL1之間。在第11圖中,第一狹縫SL1可彼此平行,但不以此為限。在第11圖中,沿著方向X延伸的第四狹縫SL4’可連接在沿著方向Y延伸的兩個第四狹縫SL4之間,而沿著方向Y延伸的第四狹縫SL4可連接在沿著方向X延伸的第四狹縫SL4’與沿著方向X延伸的第一狹縫SL1之間,但不以此為限。The latch structure 310 may have any suitable design as required. In the present embodiment, the latch structure 310 shown in FIG. 11 may be formed by the slits SL. For example, in FIG. 11 , the latch structure 310 may be formed by two first slits SL1 and three fourth slits SL4, SL4', wherein the first slit SL1 and the fourth slits SL4, SL4' may be between the first diaphragm sub-portion 112 and the second diaphragm sub-portion 114, and the three fourth slits SL4, SL4' may be connected between the two first slits SL1. In FIG. 11 , the first slits SL1 may be parallel to each other, but this is not limited thereto. In Figure 11, the fourth slit SL4' extending along the direction X can be connected between two fourth slits SL4 extending along the direction Y, and the fourth slit SL4 extending along the direction Y can be connected between the fourth slit SL4' extending along the direction X and the first slit SL1 extending along the direction X, but not limited to this.

如第11圖所示,閂鎖結構310可包括第一閂鎖元件312與第二閂鎖元件314,第一閂鎖元件312可為第一振膜子部112的一部分(等同地,第一閂鎖元件312可屬於第一振膜子部112),第二閂鎖元件314可為第二振膜子部114的一部分(等同地,第二閂鎖元件314可屬於第二振膜子部114)。在第11圖中,第一閂鎖元件312可設置在第二振膜子部114的第二閂鎖元件314與第二振膜子部114的另一部分之間,第二閂鎖元件314可設置在第一振膜子部112的第一閂鎖元件312與第一振膜子部112的另一部分之間。舉例而言,在第11圖中,第一閂鎖元件312的長方向與第二閂鎖元件314的長方向可實質上平行於方向X,但不以此為限。As shown in FIG. 11 , the latching structure 310 may include a first latching element 312 and a second latching element 314. The first latching element 312 may be a part of the first diaphragm sub-portion 112 (equivalently, the first latching element 312 may belong to the first diaphragm sub-portion 112), and the second latching element 314 may be a part of the second diaphragm sub-portion 114 (equivalently, the second latching element 314 may belong to the second diaphragm sub-portion 114). In FIG. 11 , the first latching element 312 may be disposed between the second latching element 314 of the second diaphragm sub-portion 114 and another part of the second diaphragm sub-portion 114, and the second latching element 314 may be disposed between the first latching element 312 of the first diaphragm sub-portion 112 and another part of the first diaphragm sub-portion 112. For example, in FIG. 11 , the long direction of the first latching element 312 and the long direction of the second latching element 314 may be substantially parallel to the direction X, but the present invention is not limited thereto.

當第一振膜子部112與第二振膜子部114沿著方向Z移動且其位移量大於閥值時,第一閂鎖元件312與第二閂鎖元件314相扣,以鎖住第一振膜子部112與第二振膜子部114。須注意的是,狹縫SL的寬度與閂鎖元件的尺寸相關於閂鎖結構310的扣接效果。When the first diaphragm sub-portion 112 and the second diaphragm sub-portion 114 move along the direction Z and the displacement is greater than the valve value, the first latching element 312 and the second latching element 314 are interlocked to lock the first diaphragm sub-portion 112 and the second diaphragm sub-portion 114. It should be noted that the width of the slit SL and the size of the latching element are related to the latching effect of the latching structure 310.

請參考第12圖,第12圖所示為本發明第四實施例的發聲單元的俯視示意圖。如第12圖所示,本實施例與第一實施例的差異在於本實施例的發聲單元400的振膜110包括至少一彈簧,連接在振膜110的子部之間,其中彈簧的數量可依據需求而設計。在第12圖中,振膜110可包括直接連接在第一振膜子部112與第二振膜子部114之間的第一彈簧SPR1。Please refer to FIG. 12, which is a schematic top view of the sound unit of the fourth embodiment of the present invention. As shown in FIG. 12, the difference between this embodiment and the first embodiment is that the diaphragm 110 of the sound unit 400 of this embodiment includes at least one spring connected between the sub-sections of the diaphragm 110, wherein the number of springs can be designed according to demand. In FIG. 12, the diaphragm 110 may include a first spring SPR1 directly connected between the first diaphragm sub-section 112 and the second diaphragm sub-section 114.

由於第一彈簧SPR1的存在,可提升製造振膜110的成功率,進而提高發聲單元400的良率。詳細而言,在移除基板SB與黏著層AL的步驟中,第一振膜子部112沿方向Z的位移與第二振膜子部114沿方向Z的位移是由黏著層AL的黏著力所造成。當第一振膜子部112與第二振膜子部114沿著方向Z移動且具有大的位移量時,第一彈簧SPR1可限制第一振膜子部112與第二振膜子部114的移動,並提供對於第一振膜子部112與第二振膜子部114的恢復力,進而減少振膜110的損傷。Due to the existence of the first spring SPR1, the success rate of manufacturing the diaphragm 110 can be improved, thereby improving the yield of the sound unit 400. In detail, in the step of removing the substrate SB and the adhesive layer AL, the displacement of the first diaphragm sub-portion 112 along the direction Z and the displacement of the second diaphragm sub-portion 114 along the direction Z are caused by the adhesive force of the adhesive layer AL. When the first diaphragm sub-portion 112 and the second diaphragm sub-portion 114 move along the direction Z and have a large displacement, the first spring SPR1 can limit the movement of the first diaphragm sub-portion 112 and the second diaphragm sub-portion 114, and provide a restoring force for the first diaphragm sub-portion 112 and the second diaphragm sub-portion 114, thereby reducing damage to the diaphragm 110.

彈簧可依據需求而有任何適合的設計。如第12圖所示,第一彈簧SPR1可由於狹縫SL而形成。在本實施例中,第12圖所示的第一彈簧SPR1可由於兩個第一狹縫SL1與兩個第五狹縫SL5而形成,其中第五狹縫SL5可連接於第一狹縫SL1,且第五狹縫SL5可具有曲線圖案。舉例而言,第五狹縫SL5可包括鉤型曲線圖案,且第五狹縫SL5的一端並未連接其他狹縫SL,但不以此為限。舉例來說,兩個第一狹縫SL1可彼此平行,但不以此為限。The spring may have any suitable design according to the requirements. As shown in FIG. 12 , the first spring SPR1 may be formed by the slit SL. In the present embodiment, the first spring SPR1 shown in FIG. 12 may be formed by two first slits SL1 and two fifth slits SL5, wherein the fifth slit SL5 may be connected to the first slit SL1, and the fifth slit SL5 may have a curved pattern. For example, the fifth slit SL5 may include a hook-shaped curved pattern, and one end of the fifth slit SL5 is not connected to other slits SL, but the present invention is not limited thereto. For example, the two first slits SL1 may be parallel to each other, but the present invention is not limited thereto.

當振膜110移動時,由振膜110的變形引起的應力可能施加在彈簧上。在第12圖中,由於第五狹縫SL5包括曲線圖案(即,鉤型曲線圖案),可減少應力集中的效應,使得減少振膜110與第一彈簧SPR1上的損傷,進而提升發聲單元400的良率。When the diaphragm 110 moves, stress caused by the deformation of the diaphragm 110 may be applied to the spring. In FIG. 12 , since the fifth slit SL5 includes a curved pattern (i.e., a hook-shaped curved pattern), the effect of stress concentration can be reduced, thereby reducing damage to the diaphragm 110 and the first spring SPR1, thereby improving the yield of the sound unit 400.

另外,如第12圖所示,從第一彈簧SPR1至第一振膜子部112的連接方向可不同於從第一彈簧SPR1至第二振膜子部114的連接方向。舉例而言,在第12圖中,從第一彈簧SPR1至第一振膜子部112的連接方向可相反於從第一彈簧SPR1至第二振膜子部114的連接方向,但不以此為限。舉例而言,在第12圖中,第一彈簧SPR1可實質上為一字形,但不以此為限。In addition, as shown in FIG. 12 , the connection direction from the first spring SPR1 to the first diaphragm sub-portion 112 may be different from the connection direction from the first spring SPR1 to the second diaphragm sub-portion 114. For example, in FIG. 12 , the connection direction from the first spring SPR1 to the first diaphragm sub-portion 112 may be opposite to the connection direction from the first spring SPR1 to the second diaphragm sub-portion 114, but the present invention is not limited thereto. For example, in FIG. 12 , the first spring SPR1 may be substantially in a straight line shape, but the present invention is not limited thereto.

請參考第13圖,第13圖所示為本發明第五實施例的發聲單元的俯視示意圖。 如第13圖所示,本實施例與第四實施例的差異在於第一彈簧SPR1的設計。在第13圖中,發聲單元500的振膜110的第一彈簧SPR1可由於兩個第一狹縫SL1、兩個第五狹縫SL5與第六狹縫SL6而形成,其中兩個第五狹縫SL5可連接於同一個第一狹縫SL1,第六狹縫SL6可連接另一個第一狹縫SL1,第五狹縫SL5可具有兩個曲線圖案與一個直線圖案,而第六狹縫SL6可在兩個第五狹縫SL5之間並具有曲線圖案。舉例而言,第五狹縫SL5可包括鉤型曲線圖案,且第五狹縫SL5的一端並未連接其他狹縫SL,但不以此為限。Please refer to FIG. 13, which is a schematic top view of the sound unit of the fifth embodiment of the present invention. As shown in FIG. 13, the difference between this embodiment and the fourth embodiment lies in the design of the first spring SPR1. In FIG. 13, the first spring SPR1 of the diaphragm 110 of the sound unit 500 may be formed by two first slits SL1, two fifth slits SL5 and a sixth slit SL6, wherein the two fifth slits SL5 may be connected to the same first slit SL1, the sixth slit SL6 may be connected to another first slit SL1, the fifth slit SL5 may have two curved patterns and one straight pattern, and the sixth slit SL6 may be between the two fifth slits SL5 and have a curved pattern. For example, the fifth slit SL5 may include a hook-shaped curve pattern, and one end of the fifth slit SL5 is not connected to other slits SL, but is not limited thereto.

另外,在第13圖所示的第一彈簧SPR1中,從第一彈簧SPR1至第一振膜子部112的連接方向可相同於從第一彈簧SPR1至第二振膜子部114的連接方向,但不以此為限。舉例而言,在第13圖中,第一彈簧SPR1可實質上為U字形,但不以此為限。由於此設計,在第一振膜子部112與第二振膜子部114之間的中央開口的尺寸可被縮小,以降低發聲單元500在操作中的空氣洩漏。In addition, in the first spring SPR1 shown in FIG. 13 , the connection direction from the first spring SPR1 to the first diaphragm sub-section 112 may be the same as the connection direction from the first spring SPR1 to the second diaphragm sub-section 114, but not limited thereto. For example, in FIG. 13 , the first spring SPR1 may be substantially U-shaped, but not limited thereto. Due to this design, the size of the central opening between the first diaphragm sub-section 112 and the second diaphragm sub-section 114 may be reduced to reduce air leakage of the sound unit 500 during operation.

當振膜110移動時,由振膜110的變形引起的應力可能施加在彈簧上。在第13圖中,因為有具有彎曲狹縫SL的U字形第一彈簧SPR1的設計,可減少應力集中的效應,使得減少振膜110與第一彈簧SPR1上的損傷,進而提升發聲單元500的良率。When the diaphragm 110 moves, stress caused by the deformation of the diaphragm 110 may be applied to the spring. In FIG. 13 , because of the design of the U-shaped first spring SPR1 with the curved slit SL, the stress concentration effect can be reduced, so that the damage on the diaphragm 110 and the first spring SPR1 is reduced, thereby improving the yield of the sound unit 500.

請參考第14圖與第15圖,第14圖所示為本發明第六實施例的發聲單元的俯視示意圖,第15圖所示為第14圖的區域R3中的結構的放大示意圖。如第14圖與第15圖所示,本實施例與第一實施例的差異在於本實施例的發聲單元600的振膜110還包括第三振膜子部116與第四振膜子部118。第三振膜子部116與第四振膜子部118在俯視上可設置在第一振膜子部112與第二振膜子部114之間,而第三振膜子部116與第四振膜子部118在俯視上可彼此相對。換句話說,第三振膜子部116在俯視上可設置在發聲單元600中位於第一振膜子部112與第二振膜子部114之間的第一側(如,左側),第四振膜子部118在俯視上可設置在發聲單元600中位於第一振膜子部112與第二振膜子部114之間的第二側(如,右側),而發聲單元600的第一側與第二側在俯視上可彼此相對。Please refer to FIG. 14 and FIG. 15. FIG. 14 is a schematic top view of the sound unit of the sixth embodiment of the present invention, and FIG. 15 is an enlarged schematic view of the structure in the region R3 of FIG. 14. As shown in FIG. 14 and FIG. 15, the difference between this embodiment and the first embodiment is that the diaphragm 110 of the sound unit 600 of this embodiment further includes a third diaphragm sub-portion 116 and a fourth diaphragm sub-portion 118. The third diaphragm sub-portion 116 and the fourth diaphragm sub-portion 118 can be arranged between the first diaphragm sub-portion 112 and the second diaphragm sub-portion 114 in a top view, and the third diaphragm sub-portion 116 and the fourth diaphragm sub-portion 118 can be opposite to each other in a top view. In other words, the third diaphragm sub-section 116 may be disposed on a first side (e.g., a left side) between the first diaphragm sub-section 112 and the second diaphragm sub-section 114 of the sound unit 600 in a plan view, and the fourth diaphragm sub-section 118 may be disposed on a second side (e.g., a right side) between the first diaphragm sub-section 112 and the second diaphragm sub-section 114 of the sound unit 600 in a plan view, and the first side and the second side of the sound unit 600 may be opposite to each other in a plan view.

在第14圖中,第三振膜子部116中僅有一個邊緣可透過連接到錨定結構120而被錨定,第四振膜子部118中僅有一個邊緣可透過連接到錨定結構120而被錨定,第三振膜子部116的其他邊緣與第四振膜子部118的其他邊緣都是非錨定且未連接錨定結構120。換言之,第三振膜子部116的第三錨定邊緣116a可為第三振膜子部116中唯一被錨定的邊緣,第四振膜子部118的第四錨定邊緣118a可為第四振膜子部118中唯一被錨定的邊緣,其中第三振膜子部116可僅透過第三錨定邊緣116a直接連接錨定結構120,第四振膜子部118可僅透過第四錨定邊緣118a直接連接錨定結構120。In Figure 14, only one edge of the third diaphragm sub-section 116 can be anchored by connecting to the anchor structure 120, and only one edge of the fourth diaphragm sub-section 118 can be anchored by connecting to the anchor structure 120. The other edges of the third diaphragm sub-section 116 and the other edges of the fourth diaphragm sub-section 118 are non-anchored and not connected to the anchor structure 120. In other words, the third anchoring edge 116a of the third diaphragm sub-section 116 may be the only anchored edge in the third diaphragm sub-section 116, and the fourth anchoring edge 118a of the fourth diaphragm sub-section 118 may be the only anchored edge in the fourth diaphragm sub-section 118, wherein the third diaphragm sub-section 116 may be directly connected to the anchoring structure 120 only through the third anchoring edge 116a, and the fourth diaphragm sub-section 118 may be directly connected to the anchoring structure 120 only through the fourth anchoring edge 118a.

在第14圖中,一個第二狹縫SL2可位於第一振膜子部112與第三振膜子部116之間,以定義第一振膜子部112的一個第二非錨定邊緣112n2與第三振膜子部116的一個第五非錨定邊緣116n5,另一個第二狹縫SL2可位於第一振膜子部112與第四振膜子部118之間,以定義第一振膜子部112的另一個第二非錨定邊緣112n2與第四振膜子部118的一個第六非錨定邊緣118n6,一個第三狹縫SL3可位於第二振膜子部114與第三振膜子部116之間,以定義第二振膜子部114的一個第四非錨定邊緣114n4與第三振膜子部116的另一個第五非錨定邊緣116n5,另一個第三狹縫SL3可位於第二振膜子部114與第四振膜子部118之間,以定義第二振膜子部114的另一個第四非錨定邊緣114n4與第四振膜子部118的另一個第六非錨定邊緣118n6。在一些實施例中,第三振膜子部116的第五非錨定邊緣116n5可相鄰於第三振膜子部116的第三錨定邊緣116a,第四振膜子部118的第六非錨定邊緣118n6可相鄰於第四振膜子部118的第四錨定邊緣118a,但不以此為限。In FIG. 14, a second slit SL2 may be located between the first diaphragm sub-portion 112 and the third diaphragm sub-portion 116 to define a second non-anchored edge 112n2 of the first diaphragm sub-portion 112 and a fifth non-anchored edge 116n5 of the third diaphragm sub-portion 116, and another second slit SL2 may be located between the first diaphragm sub-portion 112 and the fourth diaphragm sub-portion 118 to define another second non-anchored edge 112n2 of the first diaphragm sub-portion 112 and a sixth non-anchored edge 118n5 of the fourth diaphragm sub-portion 118. n6, a third slit SL3 may be located between the second diaphragm sub-portion 114 and the third diaphragm sub-portion 116 to define a fourth non-anchored edge 114n4 of the second diaphragm sub-portion 114 and another fifth non-anchored edge 116n5 of the third diaphragm sub-portion 116, and another third slit SL3 may be located between the second diaphragm sub-portion 114 and the fourth diaphragm sub-portion 118 to define another fourth non-anchored edge 114n4 of the second diaphragm sub-portion 114 and another sixth non-anchored edge 118n6 of the fourth diaphragm sub-portion 118. In some embodiments, the fifth non-anchored edge 116n5 of the third diaphragm sub-portion 116 may be adjacent to the third anchored edge 116a of the third diaphragm sub-portion 116, and the sixth non-anchored edge 118n6 of the fourth diaphragm sub-portion 118 may be adjacent to the fourth anchored edge 118a of the fourth diaphragm sub-portion 118, but is not limited thereto.

如第14圖所示,第一振膜子部112的形狀與第二振膜子部114的形狀可實質上為梯形,第三振膜子部116的形狀與第四振膜子部118的形狀可實質上為三角形,第一振膜子部112與第二振膜子部114可實質上全等,第三振膜子部116與第四振膜子部118可實質上全等,但不以此為限。As shown in Figure 14, the shape of the first diaphragm sub-section 112 and the shape of the second diaphragm sub-section 114 may be substantially trapezoidal, the shape of the third diaphragm sub-section 116 and the shape of the fourth diaphragm sub-section 118 may be substantially triangular, the first diaphragm sub-section 112 and the second diaphragm sub-section 114 may be substantially identical, and the third diaphragm sub-section 116 and the fourth diaphragm sub-section 118 may be substantially identical, but not limited to this.

在發聲單元600的操作期間中,側開口分別位在第一振膜子部112與第三振膜子部116之間、第二振膜子部114與第三振膜子部116之間、第一振膜子部112與第四振膜子部118之間、第二振膜子部114與第四振膜子部118之間。側開口的尺寸相關於發聲單元600的頻率響應中的低頻滾降(low frequency roll-off, LFRO)效應,其中強的低頻滾降效應可能造成聲波在低頻時的聲壓位準的明顯下降。During operation of the sound unit 600, the side openings are respectively located between the first diaphragm sub-portion 112 and the third diaphragm sub-portion 116, between the second diaphragm sub-portion 114 and the third diaphragm sub-portion 116, between the first diaphragm sub-portion 112 and the fourth diaphragm sub-portion 118, and between the second diaphragm sub-portion 114 and the fourth diaphragm sub-portion 118. The size of the side openings is related to the low frequency roll-off (LFRO) effect in the frequency response of the sound unit 600, wherein a strong low frequency roll-off effect may cause a significant decrease in the sound pressure level of the sound wave at low frequencies.

詳細而言,關於發聲單元600的側開口,低頻時的聲阻可依據公式:R∝L/(b×d 3),其中R為低頻時的聲阻,L為振膜110的厚度,b為第一振膜子部112的第二非錨定邊緣112n2的長度或第二振膜子部114的第四非錨定邊緣114n4的長度,d為側開口在方向Z上的最大尺寸。若低頻時的聲阻提高,發聲單元600在操作中的空氣洩漏(如,聲學洩漏(acoustic leakage))可降低,以降低發聲單元600的頻率響應中的低頻滾降效應。 In detail, regarding the side opening of the sound unit 600, the acoustic impedance at low frequency may be based on the formula: R∝L/(b×d 3 ), where R is the acoustic impedance at low frequency, L is the thickness of the diaphragm 110 , b is the length of the second non-anchored edge 112n2 of the first diaphragm sub-portion 112 or the length of the fourth non-anchored edge 114n4 of the second diaphragm sub-portion 114 , and d is the maximum dimension of the side opening in the direction Z. If the acoustic impedance at low frequency is increased, air leakage (e.g., acoustic leakage) of the sound unit 600 during operation may be reduced to reduce the low-frequency roll-off effect in the frequency response of the sound unit 600 .

根據上述公式,當d(即,側開口在方向Z上的最大尺寸)縮小,低頻時的聲阻可被提升。在第1圖所示的第一實施例中,關於第一振膜子部112,側開口在方向Z上的最大尺寸為第二非錨定邊緣112n2與錨定結構120之間在方向Z上的最大距離。在第14圖所示的第六實施例中,關於第一振膜子部112,側開口在方向Z上的最大尺寸為第一振膜子部112的第二非錨定邊緣112n2與第三振膜子部116的第五非錨定邊緣116n5(或第四振膜子部118的第六非錨定邊緣118n6)之間在方向Z上的最大距離。在第14圖所示的第六實施例中,由於第三振膜子部116與第四振膜子部118存在,因此,在發聲單元600的操作期間,可藉由控制第三振膜子部116與第四振膜子部118在方向Z上靠近第一振膜子部112與第二振膜子部114來減小公式中的d。也就是說,在第14圖中,第三振膜子部116可用以減少在發聲單元600的第一側(左側)的聲學洩漏,第四振膜子部118可用以減少在發聲單元600的第二側(右側)的聲學洩漏。According to the above formula, when d (i.e., the maximum dimension of the side opening in the direction Z) is reduced, the acoustic impedance at low frequencies can be improved. In the first embodiment shown in FIG. 1 , with respect to the first diaphragm subsection 112, the maximum dimension of the side opening in the direction Z is the maximum distance in the direction Z between the second non-anchored edge 112n2 and the anchoring structure 120. In the sixth embodiment shown in FIG. 14 , with respect to the first diaphragm subsection 112, the maximum dimension of the side opening in the direction Z is the maximum distance in the direction Z between the second non-anchored edge 112n2 of the first diaphragm subsection 112 and the fifth non-anchored edge 116n5 of the third diaphragm subsection 116 (or the sixth non-anchored edge 118n6 of the fourth diaphragm subsection 118). In the sixth embodiment shown in FIG. 14 , due to the presence of the third diaphragm sub-portion 116 and the fourth diaphragm sub-portion 118 , during the operation of the sound unit 600 , d in the formula can be reduced by controlling the third diaphragm sub-portion 116 and the fourth diaphragm sub-portion 118 to approach the first diaphragm sub-portion 112 and the second diaphragm sub-portion 114 in the direction Z. That is, in FIG. 14 , the third diaphragm sub-portion 116 can be used to reduce the acoustic leakage on the first side (left side) of the sound unit 600 , and the fourth diaphragm sub-portion 118 can be used to reduce the acoustic leakage on the second side (right side) of the sound unit 600 .

發聲單元600可包括至少一適合的結構,以減小d(即,側開口在方向Z上的最大尺寸),進而提升低頻時的聲阻。在本實施例中,由於此適合的結構,在發聲單元600的操作期間中,第三振膜子部116的第五非錨定邊緣116n5可在方向Z上分別靠近第一振膜子部112的第二非錨定邊緣112n2與第二振膜子部114的第四非錨定邊緣114n4,第四振膜子部118的第六非錨定邊緣118n6可在方向Z上分別靠近第一振膜子部112的第二非錨定邊緣112n2與第二振膜子部114的第四非錨定邊緣114n4。據此,在發聲單元600的操作期間中,側開口的尺寸可被縮小,以提升低頻時的聲阻,進而降低發聲單元600的頻率響應中的低頻滾降效應。The sound unit 600 may include at least one suitable structure to reduce d (i.e., the maximum size of the side opening in the direction Z), thereby increasing the acoustic resistance at low frequencies. In this embodiment, due to this suitable structure, during the operation of the sound unit 600, the fifth non-anchored edge 116n5 of the third diaphragm sub-portion 116 may be close to the second non-anchored edge 112n2 of the first diaphragm sub-portion 112 and the fourth non-anchored edge 114n4 of the second diaphragm sub-portion 114 in the direction Z, and the sixth non-anchored edge 118n6 of the fourth diaphragm sub-portion 118 may be close to the second non-anchored edge 112n2 of the first diaphragm sub-portion 112 and the fourth non-anchored edge 114n4 of the second diaphragm sub-portion 114 in the direction Z, respectively. Accordingly, during the operation of the sound unit 600, the size of the side opening can be reduced to increase the acoustic resistance at low frequencies, thereby reducing the low-frequency roll-off effect in the frequency response of the sound unit 600.

舉例而言,為了使d降低,振膜110可包括至少一彈簧,連接在振膜110的子部之間,使得在發聲單元600的操作期間中,這些子部的非錨定邊緣在方向Z上可彼此靠近。如第14圖所示,振膜110可包括至少一第二彈簧SPR2與至少一第三彈簧SPR3,第二彈簧SPR2可直接連接在第一振膜子部112與第三振膜子部116之間或直接連接在第一振膜子部112與第四振膜子部118之間,第三彈簧SPR3可直接連接在第二振膜子部114與第三振膜子部116之間或直接連接在第二振膜子部114與第四振膜子部118之間。在第14圖中,振膜110可包括兩個第二彈簧SPR2與兩個第三彈簧SPR3,兩個第二彈簧SPR2可分別連接在第一振膜子部112與第三振膜子部116之間、第一振膜子部112與第四振膜子部118之間,兩個第三彈簧SPR3可分別連接在第二振膜子部114與第三振膜子部116之間、第二振膜子部114與第四振膜子部118之間,但不以此為限。需注意的是,第二彈簧SPR2與第三彈簧SPR3是由於狹縫SL(如,除了第一狹縫SL1、第二狹縫SL2與第三狹縫SL3之外的狹縫SL)而形成。For example, in order to reduce d, the diaphragm 110 may include at least one spring connected between the sub-portions of the diaphragm 110, so that during the operation of the sound unit 600, the non-anchored edges of these sub-portions can be close to each other in the direction Z. As shown in FIG. 14, the diaphragm 110 may include at least one second spring SPR2 and at least one third spring SPR3, the second spring SPR2 may be directly connected between the first diaphragm sub-portion 112 and the third diaphragm sub-portion 116 or directly connected between the first diaphragm sub-portion 112 and the fourth diaphragm sub-portion 118, and the third spring SPR3 may be directly connected between the second diaphragm sub-portion 114 and the third diaphragm sub-portion 116 or directly connected between the second diaphragm sub-portion 114 and the fourth diaphragm sub-portion 118. In FIG. 14 , the diaphragm 110 may include two second springs SPR2 and two third springs SPR3. The two second springs SPR2 may be connected between the first diaphragm sub-portion 112 and the third diaphragm sub-portion 116, and between the first diaphragm sub-portion 112 and the fourth diaphragm sub-portion 118, respectively. The two third springs SPR3 may be connected between the second diaphragm sub-portion 114 and the third diaphragm sub-portion 116, and between the second diaphragm sub-portion 114 and the fourth diaphragm sub-portion 118, respectively, but the present invention is not limited thereto. It should be noted that the second springs SPR2 and the third springs SPR3 are formed by the slit SL (e.g., the slit SL other than the first slit SL1, the second slit SL2, and the third slit SL3).

另外,在第14圖所示的一個彈簧中,從此彈簧至一個子部的連接方向可相同於從此彈簧至另一個子部的連接方向,但不以此為限。舉例而言,在第14圖中,彈簧可實質上為U字形,但不以此為限。舉例而言,U字形的彈簧可具有很大的曲率,但不以此為限。由於此設計,兩子部之間的側開口的尺寸可被縮小(即,d被縮小),以降低發聲單元600在操作中的空氣洩漏,進而降低發聲單元600的頻率響應中的低頻滾降效應。In addition, in a spring shown in FIG. 14, the connection direction from the spring to one sub-section may be the same as the connection direction from the spring to another sub-section, but is not limited thereto. For example, in FIG. 14, the spring may be substantially U-shaped, but is not limited thereto. For example, a U-shaped spring may have a large curvature, but is not limited thereto. Due to this design, the size of the side opening between the two sub-sections may be reduced (i.e., d is reduced) to reduce air leakage of the sound unit 600 during operation, thereby reducing the low-frequency roll-off effect in the frequency response of the sound unit 600.

舉例而言,為了使d降低,致動層130可設置在第一振膜子部112、第二振膜子部114、第三振膜子部116與第四振膜子部118上。在發聲單元600的操作期間中,致動層130可致動這些子部而使其沿著方向Z移動,使得這些子部的非錨定邊緣可在方向Z上彼此靠近。For example, in order to reduce d, the actuating layer 130 may be disposed on the first diaphragm sub-portion 112, the second diaphragm sub-portion 114, the third diaphragm sub-portion 116, and the fourth diaphragm sub-portion 118. During operation of the sound unit 600, the actuating layer 130 may actuate these sub-portions to move them along the direction Z, so that the non-anchored edges of these sub-portions may approach each other in the direction Z.

此外,在第15圖所示的區域R3中,發聲單元600可包括振膜110外的凹槽結構RS,其中凹槽結構RS可直接連接振膜110的角落區CR中的狹縫段SLs,而凹槽結構RS可具有曲線圖案(如,凹槽結構RS可具有半圓弧圖案)。舉例而言,在第15圖中,狹縫段SLs可連接在第二狹縫SL2位在角落區CR中的一端與凹槽結構RS之間,而狹縫段SLs可具有直線圖案,但不以此為限。連接位於角落區CR中的狹縫段SLs的彎曲凹槽結構RS的存在可提高發聲單元600的製造過程的成功率,進而提高發聲單元600的良率。In addition, in the region R3 shown in FIG. 15 , the sound unit 600 may include a groove structure RS outside the diaphragm 110, wherein the groove structure RS may be directly connected to the slit segment SLs in the corner region CR of the diaphragm 110, and the groove structure RS may have a curved pattern (e.g., the groove structure RS may have a semicircular pattern). For example, in FIG. 15 , the slit segment SLs may be connected between one end of the second slit SL2 in the corner region CR and the groove structure RS, and the slit segment SLs may have a straight line pattern, but is not limited thereto. The existence of the curved groove structure RS connecting the slit segment SLs in the corner region CR may improve the success rate of the manufacturing process of the sound unit 600, thereby improving the yield of the sound unit 600.

請參考第16圖,第16圖所示為本發明第七實施例的發聲單元的俯視示意圖。如第16圖所示,本實施例與第六實施例的差異在於彈簧的設計。在第16圖所示的發聲單元700中,包括鉤型曲線圖案與直線圖案的第五狹縫SL5可各自連接第一狹縫SL1、第二狹縫SL2或第三狹縫SL3,而第二彈簧SPR2與第三彈簧SPR3可由於第一狹縫SL1、第二狹縫SL2、第三狹縫SL3與第五狹縫SL5而形成,但不以此為限。另外,在第16圖中,彈簧可實質上為V字形,但不以此為限。Please refer to FIG. 16, which is a schematic top view of the sound unit of the seventh embodiment of the present invention. As shown in FIG. 16, the difference between this embodiment and the sixth embodiment lies in the design of the spring. In the sound unit 700 shown in FIG. 16, the fifth slit SL5 including the hook-shaped curve pattern and the straight line pattern can be respectively connected to the first slit SL1, the second slit SL2 or the third slit SL3, and the second spring SPR2 and the third spring SPR3 can be formed by the first slit SL1, the second slit SL2, the third slit SL3 and the fifth slit SL5, but not limited thereto. In addition, in FIG. 16, the spring can be substantially V-shaped, but not limited thereto.

請參考第17圖,第17圖所示為本發明第八實施例的發聲單元的俯視示意圖。如第17圖所示,本實施例與第六實施例的差異在於發聲單元800的振膜110的狹縫SL還包括至少一側狹縫SLi,形成在第三振膜子部116及/或第四振膜子部118上。Please refer to FIG. 17, which is a schematic top view of the sound unit of the eighth embodiment of the present invention. As shown in FIG. 17, the difference between this embodiment and the sixth embodiment is that the slit SL of the diaphragm 110 of the sound unit 800 further includes at least one side slit SLi formed on the third diaphragm sub-portion 116 and/or the fourth diaphragm sub-portion 118.

由於側狹縫SLi的存在,第三振膜子部116與第四振膜子部118的結構強度會被弱化,使得在發聲單元800的操作期間中,第二彈簧SPR2與第三彈簧SPR3可拉起第三振膜子部116與第四振膜子部118,以使其非錨定邊緣在方向Z上靠近第一振膜子部112與第二振膜子部114的非錨定邊緣。Due to the existence of the side slit SLi, the structural strength of the third diaphragm sub-section 116 and the fourth diaphragm sub-section 118 will be weakened, so that during the operation of the sound unit 800, the second spring SPR2 and the third spring SPR3 can pull up the third diaphragm sub-section 116 and the fourth diaphragm sub-section 118 so that their non-anchored edges are close to the non-anchored edges of the first diaphragm sub-section 112 and the second diaphragm sub-section 114 in the direction Z.

另一方面,相較於不存在有側狹縫SLi的結構,本實施例的振膜110可在發聲單元800的操作期間形成多個較小開口來代替位於兩子部的兩個非錨定邊緣之間的一個原始的較大開口,其中較小開口的至少一個可形成在兩非錨定邊緣之間,且較小開口的至少一個可透過側狹縫SLi來形成。換言之,一個原始的較大開口的d變換為多個較小開口的多個d’,而d’小於d。舉例來說,根據上述公式,假設一個原始的較大開口被三個較小開口取代,且原始的較大開口的d是較小開口的d’的三倍,則三個較小開口的聲阻為一個原始的較大開口的聲阻的九倍。因此,可透過此設計來提升低頻時的聲阻。On the other hand, compared to a structure without the side slit SLi, the diaphragm 110 of the present embodiment can form a plurality of smaller openings during operation of the sound unit 800 to replace an original larger opening between two non-anchored edges of the two sub-parts, wherein at least one of the smaller openings can be formed between the two non-anchored edges, and at least one of the smaller openings can be formed through the side slit SLi. In other words, d of an original larger opening is converted into a plurality of d' of a plurality of smaller openings, and d' is less than d. For example, according to the above formula, if an original larger opening is replaced by three smaller openings, and the d of the original larger opening is three times the d' of the smaller opening, then the acoustic impedance of the three smaller openings is nine times the acoustic impedance of the original larger opening. Therefore, the acoustic impedance at low frequencies can be improved through this design.

如第17圖所示,第二彈簧SPR2可由於第一狹縫SL1、第二狹縫SL2、第五狹縫SL5與側狹縫SLi而形成,第三彈簧SPR3可由於第一狹縫SL1、第三狹縫SL3、第五狹縫SL5與側狹縫SLi而形成,但不以此為限。As shown in FIG. 17 , the second spring SPR2 may be formed by the first slit SL1, the second slit SL2, the fifth slit SL5 and the side slit SL1, and the third spring SPR3 may be formed by the first slit SL1, the third slit SL3, the fifth slit SL5 and the side slit SL1, but not limited thereto.

在一些實施例中,如第17圖所示,致動層130可設置在第一振膜子部112與第二振膜子部114上,但致動層130可不設置在第三振膜子部116與第四振膜子部118上(即,沒有致動層設置在第三振膜子部116與第四振膜子部118上),但不以此為限。In some embodiments, as shown in FIG. 17 , the actuating layer 130 may be disposed on the first diaphragm sub-section 112 and the second diaphragm sub-section 114 , but the actuating layer 130 may not be disposed on the third diaphragm sub-section 116 and the fourth diaphragm sub-section 118 (i.e., no actuating layer is disposed on the third diaphragm sub-section 116 and the fourth diaphragm sub-section 118 ), but is not limited thereto.

此外,在第17圖中,振膜110可選擇性地包括第一彈簧SPR1,直接連接在第一振膜子部112與第二振膜子部114之間。舉例而言,第17圖所示的第一彈簧SPR1可由於兩個第一狹縫SL1與兩個第五狹縫SL5而形成,但不以此為限。In addition, in Fig. 17, the diaphragm 110 may optionally include a first spring SPR1 directly connected between the first diaphragm sub-portion 112 and the second diaphragm sub-portion 114. For example, the first spring SPR1 shown in Fig. 17 may be formed by two first slits SL1 and two fifth slits SL5, but is not limited thereto.

請參考第18圖與第19圖,第18圖所示為本發明第九實施例的發聲單元的俯視示意圖,第19圖所示為本發明第九實施例的發聲單元的側視示意圖,其中第18圖與第19圖僅繪示第一振膜子部112,且第二振膜子部114的設計可類似於第一振膜子部112的設計。如第18圖所示,本實施例與第一實施例的差異在於振膜110的子部的錨定邊緣的設計。在本實施例的發聲單元900中,振膜110的子部的錨定邊緣被部分錨定,使得錨定邊緣包括至少一錨定部與至少一非錨定部,其中錨定邊緣的錨定部被錨定,錨定邊緣的非錨定部是非錨定的。舉例而言,在第18圖中,第一振膜子部112中被部分錨定的第一錨定邊緣112a可包括兩個錨定部AP以及位於兩個錨定部AP之間的一個非錨定部NP,但不以此為限。當發聲單元900操作時(即,第一振膜子部112被致動),第一錨定邊緣112a的非錨定部NP可朝著方向Z移動,以提升振膜110的形變量,進而提高發聲單元900所產生的聲波的聲壓位準。Please refer to FIG. 18 and FIG. 19, FIG. 18 is a schematic top view of the sound unit of the ninth embodiment of the present invention, and FIG. 19 is a schematic side view of the sound unit of the ninth embodiment of the present invention, wherein FIG. 18 and FIG. 19 only illustrate the first diaphragm sub-portion 112, and the design of the second diaphragm sub-portion 114 may be similar to the design of the first diaphragm sub-portion 112. As shown in FIG. 18, the difference between this embodiment and the first embodiment lies in the design of the anchoring edge of the sub-portion of the diaphragm 110. In the sound unit 900 of the present embodiment, the anchoring edge of the sub-section of the diaphragm 110 is partially anchored, so that the anchoring edge includes at least one anchoring portion and at least one non-anchoring portion, wherein the anchoring portion of the anchoring edge is anchored, and the non-anchoring portion of the anchoring edge is non-anchored. For example, in FIG. 18, the partially anchored first anchoring edge 112a of the first diaphragm sub-section 112 may include two anchoring portions AP and a non-anchoring portion NP located between the two anchoring portions AP, but is not limited thereto. When the sound unit 900 operates (ie, the first diaphragm sub-portion 112 is actuated), the non-anchored portion NP of the first anchored edge 112a may move in the direction Z to increase the deformation of the diaphragm 110 , thereby increasing the sound pressure level of the sound waves generated by the sound unit 900 .

為了使錨定邊緣具有錨定部AP與非錨定部NP,振膜110的狹縫SL可包括至少一內部狹縫。在本實施例中,第一振膜子部112可具有至少一第一內部狹縫SLn1與至少一第二內部狹縫SLn2,其中第一錨定邊緣112a的非錨定部NP可由第一內部狹縫SLn1所定義,第二內部狹縫SLn2連接於第一內部狹縫SLn1,以使第一錨定邊緣112a具有錨定部AP與非錨定部NP。換句話說,第一內部狹縫SLn1可平行於第一錨定邊緣112a並位於第一振膜子部112與錨定結構120之間,第二內部狹縫SLn2可不平行於第一錨定邊緣112a。舉例而言,在第18圖中,第一振膜子部112可具有一個第一狹縫SL1與兩個第二狹縫SL2,第二內部狹縫SLn2可為垂直於第一錨定邊緣112a的直線狹縫,但不以此為限。舉例而言,第二內部狹縫SLn2可從第一錨定邊緣112a向第一狹縫SL1延伸,且第二內部狹縫SLn2可不連接於第一狹縫SL1。In order to make the anchoring edge have an anchoring portion AP and a non-anchoring portion NP, the slit SL of the diaphragm 110 may include at least one internal slit. In this embodiment, the first diaphragm sub-portion 112 may have at least one first internal slit SLn1 and at least one second internal slit SLn2, wherein the non-anchoring portion NP of the first anchoring edge 112a may be defined by the first internal slit SLn1, and the second internal slit SLn2 is connected to the first internal slit SLn1, so that the first anchoring edge 112a has an anchoring portion AP and a non-anchoring portion NP. In other words, the first inner slit SLn1 may be parallel to the first anchoring edge 112a and located between the first diaphragm sub-section 112 and the anchoring structure 120, and the second inner slit SLn2 may not be parallel to the first anchoring edge 112a. For example, in FIG. 18 , the first diaphragm sub-section 112 may have one first slit SL1 and two second slits SL2, and the second inner slit SLn2 may be a straight slit perpendicular to the first anchoring edge 112a, but is not limited thereto. For example, the second inner slit SLn2 may extend from the first anchoring edge 112a toward the first slit SL1, and the second inner slit SLn2 may not be connected to the first slit SL1.

定義第一錨定邊緣112a的非錨定部NP的第一內部狹縫SLn1可連接在兩個狹縫SL之間。舉例而言,在第18圖中,第一內部狹縫SLn1可連接在兩個第二內部狹縫SLn2之間,使得第一錨定邊緣112a的錨定部AP與非錨定部NP可透過第二內部狹縫SLn2而劃分,但不以此為限。The first inner slit SLn1 defining the non-anchoring portion NP of the first anchoring edge 112a may be connected between two slits SL. For example, in FIG. 18 , the first inner slit SLn1 may be connected between two second inner slits SLn2, so that the anchoring portion AP and the non-anchoring portion NP of the first anchoring edge 112a may be divided by the second inner slit SLn2, but the present invention is not limited thereto.

可選擇地,在第18圖中,第一內部狹縫SLn1與第二內部狹縫SLn2可分離於第一狹縫SL1、第二狹縫SL2與第三狹縫SL3,但不以此為限。Alternatively, in FIG. 18 , the first inner slit SLn1 and the second inner slit SLn2 may be separated from the first slit SL1 , the second slit SL2 , and the third slit SL3 , but is not limited thereto.

如第18圖所示,第一振膜子部112可透過內部狹縫SL而劃分為多個部分。舉例而言,在第18圖中,第一振膜子部112可被劃分為三個部分912p1、912p2、912p3,部分912p1與部分912p3可位於第二狹縫SL2與第二內部狹縫SLn2之間,部分912p2可位於兩個第二內部狹縫SLn2之間。舉例而言,在第18圖中,部分912p1與部分912p3可具有第一錨定邊緣112a的錨定部AP,以錨定於錨定結構120。舉例而言,在第18圖中,部分912p2可具有第一錨定邊緣112a的非錨定部NP,使得部分912p2在發聲單元900的操作期間可沿方向Z移動並具有大的位移量(相較於部分912p1、912p3),進而提升發聲單元900所產生的聲波的聲壓位準。As shown in FIG. 18 , the first diaphragm sub-portion 112 may be divided into a plurality of portions through the internal slit SL. For example, in FIG. 18 , the first diaphragm sub-portion 112 may be divided into three portions 912p1, 912p2, and 912p3, portions 912p1 and 912p3 may be located between the second slit SL2 and the second internal slit SLn2, and portion 912p2 may be located between two second internal slits SLn2. For example, in FIG. 18 , portions 912p1 and 912p3 may have an anchoring portion AP of a first anchoring edge 112a to be anchored to the anchoring structure 120. For example, in Figure 18, part 912p2 may have a non-anchored portion NP of the first anchoring edge 112a, so that part 912p2 can move along direction Z during the operation of the sound unit 900 and have a large displacement (compared to parts 912p1 and 912p3), thereby increasing the sound pressure level of the sound waves generated by the sound unit 900.

如第18圖所示,致動層130可包括三個部,分別設置在第一振膜子部112的三個部分912p1、912p2、912p3,以致動第一振膜子部112。As shown in FIG. 18 , the actuating layer 130 may include three parts, which are respectively disposed at three portions 912p1, 912p2, and 912p3 of the first diaphragm sub-portion 112 to actuate the first diaphragm sub-portion 112.

在繪示了發聲單元900於操作過程中的側視圖的第19圖中,部分912p2在發聲單元900的操作期間可沿著方向Z移動而具有大的位移量(相較於部分912p1、912p3),且第一錨定邊緣112a的非錨定部NP在方向Z上可高於錨定部AP。In Figure 19, which shows a side view of the sound unit 900 during operation, part 912p2 can move along direction Z during the operation of the sound unit 900 and have a large displacement (compared to parts 912p1 and 912p3), and the non-anchor portion NP of the first anchor edge 112a can be higher than the anchor portion AP in direction Z.

請參考第20圖,第20圖所示為本發明第十實施例的發聲單元的俯視示意圖。如第20圖所示,實施例與第九實施例的差異在於振膜110的子部的錨定邊緣的設計。在第20圖所示的發聲單元900’中,第一振膜子部112的第一錨定邊緣112a可包括兩個非錨定部NP以及位於兩個非錨定部NP之間的一個錨定部AP,但不以此為限。在第20圖中,第一振膜子部112可具有兩個第一內部狹縫SLn1與兩個第二內部狹縫SLn2,第一內部狹縫SLn1可連接在第二內部狹縫SLn2與第二狹縫SL2之間,但不以此為限。Please refer to FIG. 20, which is a top view schematic diagram of the sound unit of the tenth embodiment of the present invention. As shown in FIG. 20, the difference between the embodiment and the ninth embodiment lies in the design of the anchoring edge of the sub-portion of the diaphragm 110. In the sound unit 900' shown in FIG. 20, the first anchoring edge 112a of the first diaphragm sub-portion 112 may include two non-anchoring portions NP and an anchoring portion AP located between the two non-anchoring portions NP, but not limited to this. In FIG. 20, the first diaphragm sub-portion 112 may have two first internal slits SLn1 and two second internal slits SLn2, and the first internal slit SLn1 may be connected between the second internal slit SLn2 and the second slit SL2, but not limited to this.

在第20圖中,部分912p2可具有第一錨定邊緣112a的錨定部AP,以錨定於錨定結構120。在第20圖中,部分912p1與部分912p3可具有第一錨定邊緣112a的非錨定部NP,使得部分912p1與部分912p3在發聲單元900’的操作期間可沿方向Z移動並具有大的位移量(相較於部分912p2),進而提升發聲單元900’所產生的聲波的聲壓位準。In FIG. 20, portion 912p2 may have an anchoring portion AP of a first anchoring edge 112a to be anchored to the anchoring structure 120. In FIG. 20, portion 912p1 and portion 912p3 may have a non-anchoring portion NP of the first anchoring edge 112a, so that portion 912p1 and portion 912p3 can move along direction Z during operation of the sound unit 900' and have a large displacement (compared to portion 912p2), thereby increasing the sound pressure level of the sound waves generated by the sound unit 900'.

在下文中,發聲單元SPC的封裝結構PKG的詳細內容將進一步示例性說明。須說明的是,封裝結構PKG不限於以下示例性提供的實施例,且封裝結構PKG可具有不違背本發明的發明精神的實施例的發聲單元SPC(如,上述實施例的其中之一或上述實施例的組合)。In the following, the detailed contents of the package structure PKG of the sound unit SPC will be further exemplified. It should be noted that the package structure PKG is not limited to the embodiments provided below, and the package structure PKG may have a sound unit SPC of an embodiment that does not violate the spirit of the invention (e.g., one of the above embodiments or a combination of the above embodiments).

請參考第21圖至第23圖,第21圖所示為本發明一實施例的封裝結構的示意圖,第22圖所示為第21圖繪示的封裝結構的底視示意圖,第23圖所示為第21圖繪示的封裝結構的剖面示意圖。如第21圖至第23圖所示,本發明的發聲單元SPC的封裝結構PKG包括基底BS、設置在基底BS上的殼蓋HS以及設置在殼蓋HS內的上述發聲單元SPC,其中發聲單元SPC位於基底BS與殼蓋HS之間。Please refer to Figures 21 to 23, Figure 21 is a schematic diagram of a packaging structure of an embodiment of the present invention, Figure 22 is a schematic diagram of a bottom view of the packaging structure shown in Figure 21, and Figure 23 is a schematic diagram of a cross-sectional view of the packaging structure shown in Figure 21. As shown in Figures 21 to 23, the packaging structure PKG of the sound unit SPC of the present invention includes a base BS, a shell HS disposed on the base BS, and the above-mentioned sound unit SPC disposed in the shell HS, wherein the sound unit SPC is located between the base BS and the shell HS.

基底BS可為硬質基底或可撓基底,並可包括任何適合的材料。舉例而言,基底BS可包括矽、鍺、玻璃、塑膠、石英、藍寶石、金屬、聚合物(如,聚醯亞胺、聚對苯二甲酸乙二酯)、任何適合的材料或其組合。在第21圖至第23圖所示的一範例中,基底BS可為包括積層板(例如銅箔基板)、平面網格陣列板或任何其他適合的包含導電材料的板的電路板,使得基底BS可包括一個或多個導電元件(如,連接走線、主動元件、被動元件及/或連接墊),但不以此為限。舉例來說,在第22圖中,基底BS具有至少一導電層CDB,且發聲單元SPC與導電層CDB設置在基底BS的相對側,其中導電層CDB包括多個導電墊CPC與導電環CRC,導電墊CPC用以電連接在發聲單元SPC與封裝結構PKG外的外部裝置之間。The substrate BS may be a hard substrate or a flexible substrate and may include any suitable material. For example, the substrate BS may include silicon, germanium, glass, plastic, quartz, sapphire, metal, polymer (e.g., polyimide, polyethylene terephthalate), any suitable material or a combination thereof. In an example shown in FIGS. 21 to 23 , the substrate BS may be a circuit board including a laminated board (e.g., a copper foil substrate), a planar grid array board, or any other suitable board containing a conductive material, so that the substrate BS may include one or more conductive elements (e.g., connecting traces, active elements, passive elements, and/or connecting pads), but is not limited thereto. For example, in Figure 22, the base BS has at least one conductive layer CDB, and the sound unit SPC and the conductive layer CDB are arranged on opposite sides of the base BS, wherein the conductive layer CDB includes a plurality of conductive pads CPC and a conductive ring CRC, and the conductive pads CPC are used to electrically connect between the sound unit SPC and an external device outside the package structure PKG.

基底BS可實質上平行於方向X與方向Y(即,基底BS的法線方向可實質上平行於方向Z),但不以此為限。舉例來說,在第21圖至第23圖中,基底BS可實質上平行於發聲單元SPC的振膜110,但不以此為限。The base BS may be substantially parallel to the direction X and the direction Y (ie, the normal direction of the base BS may be substantially parallel to the direction Z), but the present invention is not limited thereto. For example, in FIGS. 21 to 23 , the base BS may be substantially parallel to the diaphragm 110 of the sound unit SPC, but the present invention is not limited thereto.

殼蓋HS可包括頂部結構TS與至少一側壁SW,其中側壁SW位於基底BS與頂部結構TS之間。在一些實施例中,基底BS與頂部結構TS可實質上彼此平行。舉例來說,在第21圖至第23圖中,頂部結構TS可實質上平行於方向X與方向Y(即,頂部結構TS的法線方向可實質上平行於方向Z),側壁SW可實質上平行於方向Z,但不以此為限。舉例來說,在第21圖至第23圖中,頂部結構TS可實質上平行於發聲單元SPC的振膜110,而側壁SW可環繞發聲單元SPC,但不以此為限。The housing HS may include a top structure TS and at least one side wall SW, wherein the side wall SW is located between the base BS and the top structure TS. In some embodiments, the base BS and the top structure TS may be substantially parallel to each other. For example, in Figures 21 to 23, the top structure TS may be substantially parallel to the direction X and the direction Y (that is, the normal direction of the top structure TS may be substantially parallel to the direction Z), and the side wall SW may be substantially parallel to the direction Z, but is not limited thereto. For example, in Figures 21 to 23, the top structure TS may be substantially parallel to the diaphragm 110 of the sound unit SPC, and the side wall SW may surround the sound unit SPC, but is not limited thereto.

頂部結構TS與側壁SW可為硬質或可撓,並可包括任何適合的材料。舉例而言,頂部結構TS與側壁SW可各自包括矽、鍺、玻璃、塑膠、石英、藍寶石、金屬、聚合物(如,聚醯亞胺、聚對苯二甲酸乙二酯)、任何適合的材料或其組合。在第21圖至第23圖所示的一範例中,頂部結構TS與側壁SW可包括金屬並形成為一體成形的結構(如,蓋子),但不以此為限。The top structure TS and the side wall SW may be rigid or flexible and may include any suitable material. For example, the top structure TS and the side wall SW may each include silicon, germanium, glass, plastic, quartz, sapphire, metal, polymer (e.g., polyimide, polyethylene terephthalate), any suitable material or combination thereof. In an example shown in FIGS. 21 to 23 , the top structure TS and the side wall SW may include metal and be formed as an integrally formed structure (e.g., a cover), but is not limited thereto.

如第21圖至第23圖所示,發聲單元SPC設置在基底BS上,殼蓋HS內的腔體CV可被發聲單元SPC的振膜110區分為兩個子腔體(即,第一子腔體CV1與第二子腔體CV2),其中振膜110位於兩個子腔體之間。第一子腔體CV1可在振膜110與頂部結構TS之間,第二子腔體CV2可在振膜110與基底BS之間。As shown in FIGS. 21 to 23, the sound unit SPC is disposed on the base BS, and the cavity CV in the housing HS can be divided into two sub-cavities (i.e., a first sub-cavity CV1 and a second sub-cavity CV2) by the diaphragm 110 of the sound unit SPC, wherein the diaphragm 110 is located between the two sub-cavities. The first sub-cavity CV1 may be between the diaphragm 110 and the top structure TS, and the second sub-cavity CV2 may be between the diaphragm 110 and the base BS.

此外,在第21圖至第23圖中,至少一第一殼蓋開口OP1與至少一第二殼蓋開口OP2可各自形成在殼蓋HS或基底BS上,其中第一殼蓋開口OP1可連接第一子腔體CV1,第二殼蓋開口OP2可連接第二子腔體CV2。舉例來說,第一殼蓋開口OP1可為聲音出口,但不以此為限。舉例來說,如第21圖至第23圖所示,第一殼蓋開口OP1可形成在頂部結構TS上,第二殼蓋開口OP2可形成在基底BS上,但不以此為限。In addition, in FIGS. 21 to 23, at least one first cover opening OP1 and at least one second cover opening OP2 may be formed on the cover HS or the base BS, respectively, wherein the first cover opening OP1 may be connected to the first sub-cavity CV1, and the second cover opening OP2 may be connected to the second sub-cavity CV2. For example, the first cover opening OP1 may be a sound outlet, but not limited thereto. For example, as shown in FIGS. 21 to 23, the first cover opening OP1 may be formed on the top structure TS, and the second cover opening OP2 may be formed on the base BS, but not limited thereto.

第一殼蓋開口OP1的數量與排列以及第二殼蓋開口OP2的數量與排列可依據需求而設計。The number and arrangement of the first housing cover openings OP1 and the number and arrangement of the second housing cover openings OP2 can be designed according to requirements.

在一些實施例中,一個第一殼蓋開口OP1及/或一個第二殼蓋開口OP2可對應封裝結構PKG中從發聲單元SPC產生具有最高SPL的聲波的區域。舉例而言(如第21圖至第23圖),一個第一殼蓋開口OP1可在俯視上位於頂部結構TS的中心(或可在側視上位於側壁SW的中心),及/或一個第二殼蓋開口OP2可在俯視上位於基底BS的中心,但不以此為限。舉例來說,一個第一殼蓋開口OP1及/或一個第二殼蓋開口OP2可在基底BS的法線方向(即,方向Z)上對應振膜110的中心,但不以此為限。舉例來說,各振膜110可對應至少一第一殼蓋開口OP1及/或至少一第二殼蓋開口OP2。In some embodiments, a first shell opening OP1 and/or a second shell opening OP2 may correspond to the area in the package structure PKG where the sound wave with the highest SPL is generated from the sound unit SPC. For example (such as Figures 21 to 23), a first shell opening OP1 may be located at the center of the top structure TS in a top view (or may be located at the center of the side wall SW in a side view), and/or a second shell opening OP2 may be located at the center of the base BS in a top view, but is not limited thereto. For example, a first shell opening OP1 and/or a second shell opening OP2 may correspond to the center of the diaphragm 110 in the normal direction of the base BS (i.e., direction Z), but is not limited thereto. For example, each diaphragm 110 may correspond to at least one first housing opening OP1 and/or at least one second housing opening OP2.

舉例而言(如,第27圖),若殼蓋HS包括多個第一殼蓋開口OP1(或多個第二殼蓋開口OP2),第一殼蓋開口OP1(或第二殼蓋開口OP2)可排列成沿一方向(如,方向X)延伸的多個行及/或排列成沿另一方向(如,方向Y)延伸的多個列,但不以此為限。舉例來說,若殼蓋HS包括多個第一殼蓋開口OP1(或多個第二殼蓋開口OP2),第一殼蓋開口OP1(或第二殼蓋開口OP2)可排列成矩陣,但不以此為限。For example (e.g., FIG. 27 ), if the shell cover HS includes a plurality of first shell cover openings OP1 (or a plurality of second shell cover openings OP2), the first shell cover openings OP1 (or the second shell cover openings OP2) may be arranged in a plurality of rows extending in one direction (e.g., direction X) and/or in a plurality of columns extending in another direction (e.g., direction Y), but the present invention is not limited thereto. For example, if the shell cover HS includes a plurality of first shell cover openings OP1 (or a plurality of second shell cover openings OP2), the first shell cover openings OP1 (or the second shell cover openings OP2) may be arranged in a matrix, but the present invention is not limited thereto.

第一殼蓋開口OP1的俯視圖案與第二殼蓋開口OP2的俯視圖案可依據需求而設計。舉例來說,殼蓋開口的俯視圖案可為多邊形(如,矩形、六邊形等)、圓形或其他適合的形狀。The top view pattern of the first housing cover opening OP1 and the top view pattern of the second housing cover opening OP2 can be designed according to the requirements. For example, the top view pattern of the housing cover opening can be a polygon (such as a rectangle, a hexagon, etc.), a circle or other suitable shapes.

第一殼蓋開口OP1的尺寸與第二殼蓋開口OP2的尺寸可依據需求而設計,其中殼蓋HS的保護效果隨著聲音出口(如,第一殼蓋開口OP1)的尺寸的下降而提升,而殼蓋HS的聲阻隨著聲音出口(如,第一殼蓋開口OP1)的總面積的提升而下降。因此,在一些實施例中,聲音出口(如,第一殼蓋開口OP1)的尺寸可隨著聲音出口的數量的提升而下降,以使殼蓋HS具有高保護效果與低聲阻。The size of the first shell opening OP1 and the size of the second shell opening OP2 can be designed according to the requirements, wherein the protective effect of the shell cover HS increases as the size of the sound outlet (e.g., the first shell opening OP1) decreases, and the acoustic resistance of the shell cover HS decreases as the total area of the sound outlet (e.g., the first shell opening OP1) increases. Therefore, in some embodiments, the size of the sound outlet (e.g., the first shell opening OP1) can decrease as the number of sound outlets increases, so that the shell cover HS has a high protective effect and low acoustic resistance.

發聲單元SPC可以任何適合的方式電連接外部裝置。舉例來說,在第21圖至第23圖中,發聲單元SPC可透過基底BS的導電元件(如,導電墊CPC)而電連接外部裝置,但不以此為限。The sound unit SPC can be electrically connected to an external device in any suitable manner. For example, in FIGS. 21 to 23 , the sound unit SPC can be electrically connected to an external device through a conductive element (eg, conductive pad CPC) of the substrate BS, but the present invention is not limited thereto.

在本發明中,發聲單元SPC可電連接控制器,其中控制器可用以產生驅動訊號,而驅動訊號可施加在致動層130上以致動振膜110。控制器可設置在封裝結構PKG內或封裝結構PKG外。In the present invention, the sound unit SPC can be electrically connected to the controller, wherein the controller can be used to generate a driving signal, and the driving signal can be applied to the actuating layer 130 to actuate the diaphragm 110. The controller can be disposed inside the packaging structure PKG or outside the packaging structure PKG.

形成封裝結構PKG的方法可為任何適合的形成方法。在一些實施例的形成方法中,可提供殼蓋HS與基底BS,而發聲單元SPC可由上文所述的方法製造。然後,將發聲單元SPC設置在基底BS上並設置在殼蓋HS內。舉例來說,在殼蓋HS設置在基底BS上之前,將發聲單元SPC設置在基底BS上,但不以此為限。舉例來說,在發聲單元SPC設置在基底BS上之前,將第二殼蓋開口OP2形成在基底BS上;在發聲單元SPC設置在殼蓋HS內之前,將第一殼蓋開口OP1形成在殼蓋HS上,但不以此為限。The method of forming the package structure PKG may be any suitable forming method. In the forming method of some embodiments, a shell cover HS and a base BS may be provided, and the sound unit SPC may be manufactured by the method described above. Then, the sound unit SPC is disposed on the base BS and disposed in the shell cover HS. For example, before the shell cover HS is disposed on the base BS, the sound unit SPC is disposed on the base BS, but not limited thereto. For example, before the sound unit SPC is disposed on the base BS, a second shell cover opening OP2 is formed on the base BS; before the sound unit SPC is disposed in the shell cover HS, a first shell cover opening OP1 is formed on the shell cover HS, but not limited thereto.

請參考第24圖,第24圖所示為本發明一實施例的封裝結構的示意圖。如第24圖所示,第一殼蓋開口OP1可在俯視上不位於頂部結構TS的中心,但不以此為限。如第24圖所示,第一殼蓋開口OP1可在基底BS的法線方向(即,方向Z)上對應振膜110的中心,但不以此為限。Please refer to FIG. 24, which is a schematic diagram of a packaging structure of an embodiment of the present invention. As shown in FIG. 24, the first housing opening OP1 may not be located at the center of the top structure TS in a top view, but the present invention is not limited thereto. As shown in FIG. 24, the first housing opening OP1 may correspond to the center of the diaphragm 110 in the normal direction (i.e., direction Z) of the base BS, but the present invention is not limited thereto.

請參考第25圖與第26圖,第25圖所示為本發明一實施例的封裝結構的示意圖,第26圖所示為第25圖繪示的封裝結構的剖面示意圖。如第25圖與第26圖所示,第一殼蓋開口OP1可形成在殼蓋HS的側壁SW上,但不以此為限。Please refer to Figures 25 and 26, Figure 25 is a schematic diagram of a package structure of an embodiment of the present invention, and Figure 26 is a cross-sectional schematic diagram of the package structure shown in Figure 25. As shown in Figures 25 and 26, the first housing opening OP1 can be formed on the side wall SW of the housing HS, but is not limited thereto.

請參考第27圖與第28圖,第27圖所示為本發明一實施例的封裝結構的示意圖,第28圖所示為第27圖繪示的封裝結構的剖面示意圖。 如第27圖與第28圖所示,封裝結構PKG的殼蓋HS的頂部結構TS(或側壁SW)可具有多個第一殼蓋開口OP1,且第一殼蓋開口OP1可為小的或相當小的。舉例來說,第一殼蓋開口OP1的尺寸可小於或等於殼蓋HS的頂部結構TS的10%、5%、3%或1%,但不以此為限。Please refer to FIG. 27 and FIG. 28, FIG. 27 is a schematic diagram of a package structure of an embodiment of the present invention, and FIG. 28 is a cross-sectional schematic diagram of the package structure shown in FIG. 27. As shown in FIG. 27 and FIG. 28, the top structure TS (or the side wall SW) of the shell HS of the package structure PKG may have a plurality of first shell openings OP1, and the first shell openings OP1 may be small or quite small. For example, the size of the first shell opening OP1 may be less than or equal to 10%, 5%, 3% or 1% of the top structure TS of the shell HS, but is not limited thereto.

由於頂部結構TS具有小尺寸的多個第一殼蓋開口OP1,本發明的頂部結構TS可在具有低聲阻的情況下對發聲單元SPC提供高物理保護效果。舉例來說,本發明的頂部結構TS可在封裝結構PKG後續的使用中(如,發聲單元SPC的操作中、將封裝結構PKG設置在設備中的過程中)保護發聲單元SPC,以提升封裝結構PKG的良率與設備的良率,但不以此為限。另外,由於含有多個第一殼蓋開口OP1的頂部結構TS的存在,外部物體(如,灰塵、顆粒、尖銳物體等)難以進入封裝結構PKG。Since the top structure TS has a plurality of first shell cover openings OP1 of small size, the top structure TS of the present invention can provide a high physical protection effect for the sound unit SPC with low acoustic resistance. For example, the top structure TS of the present invention can protect the sound unit SPC in the subsequent use of the packaging structure PKG (e.g., in the operation of the sound unit SPC, in the process of setting the packaging structure PKG in the equipment) to improve the yield of the packaging structure PKG and the yield of the equipment, but not limited to this. In addition, due to the presence of the top structure TS containing a plurality of first shell cover openings OP1, it is difficult for external objects (e.g., dust, particles, sharp objects, etc.) to enter the packaging structure PKG.

在將發聲單元SPC設置在封裝結構PKG內之前,發聲單元SPC的振膜110具有第一頻率響應,其中振膜110的最小共振峰產生在第一頻率(即,第一頻率為振膜110的最小共振頻率)並具有第一峰值(即,SPL)。在將發聲單元SPC設置在封裝結構PKG內之後,發聲單元SPC的振膜110具有第二頻率響應,其中振膜110的最小共振峰產生在第二頻率(即,第二頻率為振膜110的最小共振頻率)並具有第二峰值(即,SPL)。在一些實施例中,第一頻率大於第二頻率,及/或第一峰值大於第二峰值。Before the sound unit SPC is set in the packaging structure PKG, the diaphragm 110 of the sound unit SPC has a first frequency response, wherein the minimum resonance peak of the diaphragm 110 is generated at a first frequency (i.e., the first frequency is the minimum resonance frequency of the diaphragm 110) and has a first peak value (i.e., SPL). After the sound unit SPC is set in the packaging structure PKG, the diaphragm 110 of the sound unit SPC has a second frequency response, wherein the minimum resonance peak of the diaphragm 110 is generated at a second frequency (i.e., the second frequency is the minimum resonance frequency of the diaphragm 110) and has a second peak value (i.e., SPL). In some embodiments, the first frequency is greater than the second frequency, and/or the first peak value is greater than the second peak value.

在振膜110的第二頻率響應中,第二頻率(即,最小共振頻率)與第二峰值(即,最小共振峰的峰值)隨著第一殼蓋開口OP1的總面積的下降而下降。在一些實施例中,第一頻率與第二頻率之間的差可大於或等於1000赫茲(Hz)、2000赫茲、5000赫茲或其他適合的值。因此,在封裝結構PKG中,振膜110的最小共振頻率與最小共振峰的峰值可透過調整第一殼蓋開口OP1的總面積而改變。In the second frequency response of the diaphragm 110, the second frequency (i.e., the minimum resonance frequency) and the second peak value (i.e., the peak value of the minimum resonance peak) decrease as the total area of the first housing opening OP1 decreases. In some embodiments, the difference between the first frequency and the second frequency may be greater than or equal to 1000 Hz, 2000 Hz, 5000 Hz, or other suitable values. Therefore, in the package structure PKG, the minimum resonance frequency and the peak value of the minimum resonance peak of the diaphragm 110 can be changed by adjusting the total area of the first housing opening OP1.

在下文中,包含前述發聲單元SPC的設備APT的詳細內容將進一步示例性說明,其中設備APT可為耳機(earphone)、頭戴式耳機(headphone)、耳塞式耳機(earbud)或其他適合的聲音產生設備。須說明的是,設備APT不限於以下示例性提供的實施例,且設備APT可具有不違背本發明的發明精神的實施例的發聲單元SPC(如,上述實施例的其中之一或上述實施例的組合)。In the following, the details of the device APT including the aforementioned sound unit SPC will be further exemplified, wherein the device APT may be an earphone, a headphone, an earbud or other suitable sound generating device. It should be noted that the device APT is not limited to the exemplary embodiments provided below, and the device APT may have a sound unit SPC of an embodiment that does not violate the spirit of the invention (e.g., one of the above embodiments or a combination of the above embodiments).

請參考第29圖,第29圖所示為本發明一實施例的設備的剖面示意圖。如第29圖所示,設備APT可包括外殼OC、發聲單元SPC的封裝結構PKG以及設備基底BS_AS,其中封裝結構PKG可設置在設備基底BS_AS上並位於外殼OC內。須說明的是,發聲單元SPC的封裝結構PKG可為上述實施例的其中之一或上述實施例的組合。Please refer to FIG. 29, which is a cross-sectional schematic diagram of a device according to an embodiment of the present invention. As shown in FIG. 29, the device APT may include a housing OC, a packaging structure PKG of a sound unit SPC, and a device base BS_AS, wherein the packaging structure PKG may be arranged on the device base BS_AS and located in the housing OC. It should be noted that the packaging structure PKG of the sound unit SPC may be one of the above-mentioned embodiments or a combination of the above-mentioned embodiments.

設備基底BS_AS可包括矽、鍺、玻璃、塑膠、石英、藍寶石、金屬、聚合物(如,聚醯亞胺、聚對苯二甲酸乙二酯)、任何適合的材料或其組合。在第29圖所示的一範例中,設備基底BS_AS可為包括積層板(例如銅箔基板)、平面網格陣列板或任何其他適合的包含導電材料的板的電路板,使得設備基底BS_AS可包括一個或多個導電元件(如,連接走線、主動元件、被動元件及/或連接墊),但不以此為限。The device substrate BS_AS may include silicon, germanium, glass, plastic, quartz, sapphire, metal, polymer (e.g., polyimide, polyethylene terephthalate), any suitable material or combination thereof. In an example shown in FIG. 29 , the device substrate BS_AS may be a circuit board including a laminate board (e.g., a copper foil substrate), a planar grid array board, or any other suitable board containing a conductive material, so that the device substrate BS_AS may include one or more conductive elements (e.g., connection traces, active elements, passive elements, and/or connection pads), but is not limited thereto.

如第29圖所示,設備基底BS_AS可具有至少一設備基底開口BS_Asp,封裝結構PKG的第二子腔體CV2可透過封裝結構PKG的第二殼蓋開口OP2而連接設備基底BS_AS的設備基底開口BS_Asp。As shown in FIG. 29 , the device substrate BS_AS may have at least one device substrate opening BS_Asp, and the second sub-cavity CV2 of the package structure PKG may be connected to the device substrate opening BS_Asp of the device substrate BS_AS through the second cover opening OP2 of the package structure PKG.

如第29圖所示,外殼OC可具有至少一流出開口OCp,封裝結構PKG的第一子腔體CV1可透過封裝結構PKG的第一殼蓋開口OP1與外殼OC的流出開口OCp而連接設備APT的前側的外部。As shown in FIG. 29 , the outer casing OC may have at least one outlet opening OCp, and the first sub-cavity CV1 of the package structure PKG may be connected to the outside of the front side of the device APT through the first cover opening OP1 of the package structure PKG and the outlet opening OCp of the outer casing OC.

可選擇地,本實施例的外殼OC可夾住設備基底BS_AS與封裝結構PKG(如,外殼OC可接觸設備基底BS_AS的側壁與封裝結構PKG的側壁),以固定設備基底BS_AS與封裝結構PKG,並在設備APT中將第一子腔體CV1與第二子腔體CV2彼此分隔,但不以此為限。可選擇地,設備APT還可包括墊片,其中墊片可設置在封裝結構PKG與外殼OC之間,且墊片可圍繞流出開口OCp,但不以此為限。Optionally, the outer shell OC of the present embodiment may clamp the device substrate BS_AS and the package structure PKG (e.g., the outer shell OC may contact the side wall of the device substrate BS_AS and the side wall of the package structure PKG) to fix the device substrate BS_AS and the package structure PKG, and separate the first sub-cavity CV1 and the second sub-cavity CV2 from each other in the device APT, but not limited thereto. Optionally, the device APT may further include a gasket, wherein the gasket may be disposed between the package structure PKG and the outer shell OC, and the gasket may surround the outflow opening OCp, but not limited thereto.

在第29圖中,封裝結構PKG可透過表面貼裝技術組裝到設備APT中,其中導電黏著層CAL(如,包含焊料)透過表面貼裝技術設置在設備基底BS_AS與封裝結構PKG的基底BS之間,以使得封裝結構PKG設置在設備基底BS_AS上。In FIG. 29 , the package structure PKG can be assembled into the device APT through surface mounting technology, wherein a conductive adhesive layer CAL (e.g., comprising solder) is disposed between the device substrate BS_AS and the substrate BS of the package structure PKG through surface mounting technology so that the package structure PKG is disposed on the device substrate BS_AS.

在本發明中,由於使用了表面貼裝技術,包括發聲單元SPC的封裝結構PKG可需要經過設計以能承受表面貼裝技術的最高製程溫度。因此,封裝結構PKG具有上限高於表面貼裝技術的最高製程溫度的耐熱溫度,使得在執行表面貼裝技術之後,封裝結構PKG不會發生故障,且封裝結構PKG可維持正常操作(即,可正常地產生聲波)。在一些實施例中,表面貼裝技術的最高製程溫度的範圍可從240°C到250°C,因此,封裝結構PKG的耐熱溫度的上限可大於240°C或大於250°C,但不以此為限。此外,在一些實施例中,封裝結構PKG中含有的每個材料具有上限高於表面貼裝技術的最高製程溫度的耐熱溫度,以確保封裝結構PKG在表面貼裝技術進行期間不會被損壞。舉例來說,封裝結構PKG中含有的每個材料可具有上限大於240°C或大於250°C的耐熱溫度,但不以此為限。In the present invention, since surface mounting technology is used, the package structure PKG including the sound unit SPC may need to be designed to withstand the highest process temperature of the surface mounting technology. Therefore, the package structure PKG has a heat resistance temperature whose upper limit is higher than the highest process temperature of the surface mounting technology, so that after the surface mounting technology is executed, the package structure PKG will not fail, and the package structure PKG can maintain normal operation (that is, sound waves can be generated normally). In some embodiments, the highest process temperature of the surface mounting technology can range from 240°C to 250°C, therefore, the upper limit of the heat resistance temperature of the package structure PKG can be greater than 240°C or greater than 250°C, but is not limited thereto. In addition, in some embodiments, each material contained in the package structure PKG has a heat resistance temperature whose upper limit is higher than the highest process temperature of the surface mount technology to ensure that the package structure PKG will not be damaged during the surface mount technology. For example, each material contained in the package structure PKG may have a heat resistance temperature whose upper limit is greater than 240°C or greater than 250°C, but is not limited thereto.

下文將說明表面貼裝技術的內容,且下文所述的表面貼裝技術僅為一範例,且為了使表面貼裝技術更加清楚,部分步驟則被省略。The following will explain the content of surface mount technology. The surface mount technology described below is only an example, and in order to make the surface mount technology clearer, some steps are omitted.

在表面貼裝技術的製程中,首先提供具有至少一導電墊BS_ASc、至少一導電走線與設備基底開口BS_Asp的設備基底BS_AS,其中導電墊BS_ASc與設備基底開口BS_ASp可在執行表面貼裝技術之前形成。接著,將導電黏著層CAL設置在設備基底BS_AS的導電墊BS_ASc上。舉例來說,導電黏著層CAL可印在設備基底BS_AS上,但不以此為限。接著,將電子元件,例如發聲單元SPC的封裝結構PKG,放置在導電黏著層CAL上並與導電黏著層CAL接觸,其中封裝結構PKG的導電墊CPC接觸於導電黏著層CAL。接著,執行一升溫步驟(如,回流焊步驟)以提升製程溫度,使得導電黏著層CAL熔化並黏著到設備基底BS_AS的導電墊BS_ASc與封裝結構PKG的導電墊CPC。因此,藉由使用表面貼裝技術,封裝結構PKG可設置在設備基底BS_AS上並透過導電黏著層CAL電連接到導電墊BS_ASc。In the process of surface mount technology, a device substrate BS_AS having at least one conductive pad BS_ASc, at least one conductive trace and a device substrate opening BS_Asp is first provided, wherein the conductive pad BS_ASc and the device substrate opening BS_ASp can be formed before performing the surface mount technology. Then, a conductive adhesive layer CAL is set on the conductive pad BS_ASc of the device substrate BS_AS. For example, the conductive adhesive layer CAL can be printed on the device substrate BS_AS, but is not limited to this. Then, an electronic component, such as a packaging structure PKG of a sound unit SPC, is placed on the conductive adhesive layer CAL and in contact with the conductive adhesive layer CAL, wherein the conductive pad CPC of the packaging structure PKG is in contact with the conductive adhesive layer CAL. Next, a temperature raising step (e.g., a reflow step) is performed to raise the process temperature so that the conductive adhesive layer CAL melts and adheres to the conductive pad BS_ASc of the device substrate BS_AS and the conductive pad CPC of the package structure PKG. Therefore, by using surface mounting technology, the package structure PKG can be set on the device substrate BS_AS and electrically connected to the conductive pad BS_ASc through the conductive adhesive layer CAL.

在傳統的揚聲器或傳統的發聲裝置中,由於一些元件(例如橡皮懸承(rubber suspension)及/或貼合到線圈的黏著材料)無法承受表面貼裝技術的高製程溫度,因此表面貼裝技術無法使用於傳統的揚聲器(或傳統的發聲裝置)。相較之下,在本發明中,由於封裝結構PKG被設計為可承受表面貼裝技術的最高製程溫度,因此在執行表面貼裝技術之後,封裝結構 PKG不會發生故障,且封裝結構PKG可正常操作。此外,由於本發明使用了表面貼裝技術,因此可不需執行引線接合方法/製程(一種使用導線電連接於電子元件與設備基底BS_AS之間的方法/製程),使得設備APT的橫向尺寸顯著地下降。In a conventional speaker or a conventional sound-generating device, since some components (such as rubber suspension and/or adhesive material bonded to the coil) cannot withstand the high process temperature of the surface mounting technology, the surface mounting technology cannot be used in the conventional speaker (or conventional sound-generating device). In contrast, in the present invention, since the package structure PKG is designed to withstand the highest process temperature of the surface mounting technology, the package structure PKG will not fail after the surface mounting technology is performed, and the package structure PKG can operate normally. In addition, since the present invention uses the surface mounting technology, it is not necessary to perform the wire bonding method/process (a method/process that uses wires to electrically connect between electronic components and the device substrate BS_AS), so that the lateral size of the device APT is significantly reduced.

形成設備APT的方法可為任何適合的形成方法。在一些實施例的設備APT的形成方法中,封裝結構PKG可藉由上述方法形成。然後,封裝結構PKG可透過表面貼裝技術組裝到包括外殼OC的設備APT中。舉例來說,封裝結構PKG可透過表面貼裝技術設置在設備APT 的設備基底BS_AS上。The method of forming the device APT may be any suitable forming method. In the forming method of the device APT of some embodiments, the package structure PKG may be formed by the above method. Then, the package structure PKG may be assembled into the device APT including the outer shell OC by surface mounting technology. For example, the package structure PKG may be set on the device substrate BS_AS of the device APT by surface mounting technology.

請參考第30圖,第30圖所示為本發明一實施例的設備的示意圖。如第30圖所示,本實施例的設備APT可包括發聲單元SPC的封裝結構PKG與兩個通氣裝置VD,這些元件都設置在外殼OC內。Please refer to Figure 30, which is a schematic diagram of a device according to an embodiment of the present invention. As shown in Figure 30, the device APT of this embodiment may include a packaging structure PKG of a sound unit SPC and two ventilation devices VD, and these components are all arranged in an outer shell OC.

通氣裝置VD用以形成或關閉通氣口,其中當通氣口形成時,設備APT的內腔體CVi透過通氣口連接設備APT外的環境。如第30圖所示,通氣裝置VD可包括通氣基板ST_V、覆蓋結構CS_V與膜結構TF_V,通氣基板ST_V具有至少一基板開口OPV,覆蓋結構CS_V設置在通氣基板ST_V上,膜結構TF_V設置在通氣基板ST_V與覆蓋結構CS_V之間,其中膜結構TF_V用以被致動以形成或關閉通氣口,覆蓋結構CS_V用以覆蓋並保護膜結構TF_V,且覆蓋結構CS_V具有至少一蓋子開口(圖未示)。當通氣口由膜結構TF_V形成時,氣流可通過覆蓋結構CS_V的蓋子開口、通氣口以及通氣基板ST_V的基板開口OPV,以使設備APT的內腔體CVi連接設備APT外的環境。The ventilation device VD is used to form or close the vent, wherein when the vent is formed, the inner cavity CVi of the device APT is connected to the environment outside the device APT through the vent. As shown in FIG. 30, the ventilation device VD may include a ventilation substrate ST_V, a cover structure CS_V and a membrane structure TF_V, wherein the ventilation substrate ST_V has at least one substrate opening OPV, the cover structure CS_V is arranged on the ventilation substrate ST_V, and the membrane structure TF_V is arranged between the ventilation substrate ST_V and the cover structure CS_V, wherein the membrane structure TF_V is used to be actuated to form or close the vent, the cover structure CS_V is used to cover and protect the membrane structure TF_V, and the cover structure CS_V has at least one cover opening (not shown). When the vent is formed by the membrane structure TF_V, the air flow can pass through the cover opening of the covering structure CS_V, the vent and the substrate opening OPV of the ventilation substrate ST_V to connect the inner cavity CVi of the device APT to the environment outside the device APT.

通氣裝置VD可用以在發聲單元SPC的操作期間抑制閉鎖效應(occlusion effect)。閉鎖效應是由於耳道的密封容積以引起使用者(即,聆聽者)的較大可感知聲壓。在一些情況下,當使用者在使用塞入耳道中的設備APT的情況下做特定運動(例如走路、跑步、說話、咀嚼、觸碰聲能轉換器等)以產生骨頭傳導聲音時,會發生閉鎖效應,而閉鎖效應造成使用者聽到閉鎖噪音(occlusion noise),進而降低使用者的聆聽品質。在本實施例中,通氣裝置VD可基於閉鎖效應的發生與消失而對應形成或關閉通氣口。當閉鎖效應發生時,通氣裝置VD的通氣口可被形成,以使耳道的容積不被密封,以抑制閉鎖效應。當閉鎖效應不發生時,通氣裝置VD的通氣口被關閉,以提升設備APT所產生的聲波的品質。因此,由於通氣裝置VD的存在,設備APT的性能以及使用者使用設備APT的體驗可被提升。The ventilation device VD can be used to suppress the occlusion effect during the operation of the sound unit SPC. The occlusion effect is caused by the sealed volume of the ear canal to cause a larger perceptible sound pressure to the user (i.e., the listener). In some cases, when the user performs certain movements (such as walking, running, talking, chewing, touching the acoustic energy transducer, etc.) while using the device APT inserted into the ear canal to generate bone-conducted sound, the occlusion effect will occur, and the occlusion effect causes the user to hear occlusion noise, thereby reducing the user's listening quality. In this embodiment, the ventilation device VD can form or close the vent in response to the occurrence and disappearance of the occlusion effect. When the closing effect occurs, the vent of the vent device VD can be formed so that the volume of the ear canal is not sealed to suppress the closing effect. When the closing effect does not occur, the vent of the vent device VD is closed to improve the quality of the sound waves generated by the device APT. Therefore, due to the presence of the vent device VD, the performance of the device APT and the user's experience of using the device APT can be improved.

在第30圖所示的實施例中,兩個通氣裝置VD可對稱地設置,但不以此為限。在一實施例中,通氣裝置VD可為MEMS裝置或含有MEMS結構的封裝結構。In the embodiment shown in FIG. 30 , the two ventilation devices VD may be symmetrically arranged, but the present invention is not limited thereto. In one embodiment, the ventilation device VD may be a MEMS device or a package structure containing a MEMS structure.

在一實施例中,設備APT還可包括感測裝置,通氣裝置VD的通氣口可基於感測裝置所產生的感測結果而對應形成或關閉。舉例來說,感測裝置可包括動作感測器、力感測器、光感測器、加速度計、壓力感測器、高度感測器、距離感測器或其組合。In one embodiment, the device APT may further include a sensing device, and the vent of the ventilation device VD may be formed or closed accordingly based on the sensing result generated by the sensing device. For example, the sensing device may include a motion sensor, a force sensor, a light sensor, an accelerometer, a pressure sensor, an altitude sensor, a distance sensor, or a combination thereof.

通氣裝置VD、封裝結構PKG與感測裝置可耦接控制器,控制器可產生訊號以控制通氣裝置VD、封裝結構PKG與感測裝置。The ventilation device VD, the packaging structure PKG and the sensing device can be coupled to a controller, and the controller can generate a signal to control the ventilation device VD, the packaging structure PKG and the sensing device.

通氣裝置、控制器與感測裝置的詳細內容與變化記載於美國專利申請號17/344,980、17/344,983、17/842,810與18/172,346等專利申請案,其公開的完整內容透過引用而併入本文並成為本發明說明書的一部分。The details and variations of the ventilation device, controller and sensing device are described in U.S. Patent Application Nos. 17/344,980, 17/344,983, 17/842,810 and 18/172,346, the entire disclosures of which are incorporated herein by reference and become part of the specification of the present invention.

在本發明中,與發聲單元功能不同的單元也可具有上述實施例的其中一者或上述實施例的組合的發聲單元的結構。因此,此單元的製造方法可參考上述發聲單元的製造方法,包含此單元的封裝結構的結構與形成方法可參考上述發聲單元的封裝結構的結構與形成方法,包含此單元(或包含含有此單元的封裝結構)的設備的結構與形成方法可參考上述包含發聲單元(或包含含有發聲單元的封裝結構)的設備的結構與形成方法。In the present invention, a unit having a function different from that of the sound unit may also have the structure of a sound unit of one of the above-mentioned embodiments or a combination of the above-mentioned embodiments. Therefore, the manufacturing method of this unit may refer to the manufacturing method of the above-mentioned sound unit, the structure and forming method of the packaging structure including this unit may refer to the structure and forming method of the packaging structure of the above-mentioned sound unit, and the structure and forming method of the device including this unit (or including the packaging structure including this unit) may refer to the structure and forming method of the above-mentioned device including the sound unit (or including the packaging structure including the sound unit).

在一些實施例中,設置在本發明的封裝結構內的單元可具有與發聲單元不同的聲學功能。在一些實施例中,設置在本發明的封裝結構內的單元可為通氣裝置中的通氣單元,其透過使其通氣口形成或關閉而在發聲單元的操作期間抑制閉鎖效應。舉例來說,在第30圖所示的設備APT的一變化實施例中,作為封裝結構的通氣裝置VD可包括具有上述結構(即,第1圖至第20圖所示的實施例的其中一者的結構或組合的結構)的通氣單元,使得通氣單元的設計或膜結構TF_V的設計可參考第1圖至第20圖(如,第11圖)所示的實施例的其中一者或組合,而覆蓋結構CS_V的設計可參考第21圖至第28圖(如,第21圖至第23圖)所示的實施例的其中一者或組合。須說明的是,在此變化實施例中,發聲單元SPC可包括本發明所述的結構或其他適合的結構。In some embodiments, the unit disposed in the package structure of the present invention may have an acoustic function different from that of the sound unit. In some embodiments, the unit disposed in the package structure of the present invention may be a ventilation unit in a ventilation device, which suppresses the locking effect during the operation of the sound unit by forming or closing its vent. For example, in a variation of the device APT shown in FIG. 30, the ventilation device VD as a packaging structure may include a ventilation unit having the above-mentioned structure (i.e., the structure of one of the embodiments shown in FIGS. 1 to 20 or a structure of a combination), so that the design of the ventilation unit or the design of the membrane structure TF_V may refer to one of the embodiments shown in FIGS. 1 to 20 (e.g., FIG. 11) or a combination, and the design of the covering structure CS_V may refer to one of the embodiments shown in FIGS. 21 to 28 (e.g., FIGS. 21 to 23) or a combination. It should be noted that in this variation, the sound unit SPC may include the structure described in the present invention or other suitable structures.

綜上所述,根據本發明的發聲單元與通氣單元的設計,發聲單元與通氣單元可實現更高的共振頻率、更大的聲壓位準、高良率及/或低空氣洩漏。並且,與發聲單元功能不同的一些單元可參考本發明的發聲單元。 以上所述僅為本發明之較佳實施例,凡依本發明申請專利範圍所做之均等變化與修飾,皆應屬本發明之涵蓋範圍。 In summary, according to the design of the sound unit and the ventilation unit of the present invention, the sound unit and the ventilation unit can achieve a higher resonance frequency, a larger sound pressure level, a high yield and/or low air leakage. In addition, some units with different functions from the sound unit can refer to the sound unit of the present invention. The above is only a preferred embodiment of the present invention. All equal changes and modifications made according to the scope of the patent application of the present invention should be within the scope of the present invention.

100,200,300,400,500,600,700,800,900,900’,SPC:發聲單元 110:振膜 112:第一振膜子部 112a:第一錨定邊緣 112n1:第一非錨定邊緣 112n2:第二非錨定邊緣 114:第二振膜子部 114a:第二錨定邊緣 114n3:第三非錨定邊緣 114n4:第四非錨定邊緣 116:第三振膜子部 116a:第三錨定邊緣 116n5:第五非錨定邊緣 118:第四振膜子部 118a:第四錨定邊緣 118n6:第六非錨定邊緣 120:錨定結構 130:致動層 310:閂鎖結構 312:第一閂鎖元件 314:第二閂鎖元件 912p1,912p2,912p3:部分 AL:黏著層 AM:致動材料 AP:錨定部 APT:設備 BS:基底 BS_AS:設備基底 BS_ASc,CPC:導電墊 BS_ASp:設備基底開口 CAL:導電黏著層 CDB:導電層 CPS:補償氧化物層 CR:角落區 CRC:導電環 CS_V:覆蓋結構 CT1:第一導電層 CT2:第二導電層 CV:腔體 CV1:第一子腔體 CV2:第二子腔體 CVi:內腔體 HS:殼蓋 NP:非錨定部 OC:外殼 OCp:流出開口 OP1:第一殼蓋開口 OP2:第二殼蓋開口 OPV:基板開口 PKG:封裝結構 R1,R2,R3:區域 RS:凹槽結構 SB:基板 SIL:隔離絕緣層 SL:狹縫 SL1:第一狹縫 SL2:第二狹縫 SL3:第三狹縫 SL4,SL4’:第四狹縫 SL5:第五狹縫 SL6:第六狹縫 SLi:側狹縫 SLn1:第一內部狹縫 SLn2:第二內部狹縫 SLs:狹縫段 SPR1:第一彈簧 SPR2:第二彈簧 SPR3:第三彈簧 ST_V:通氣基板 SW:側壁 TF_V:膜結構 TL:溝道線 TS:頂部結構 VD:通氣裝置 WF:晶圓 WL1:第一層 WL1a:上表面 WL2:第二層 WL3:絕緣層 X,Y,Z:方向 100,200,300,400,500,600,700,800,900,900’,SPC: sound unit 110: diaphragm 112: first diaphragm subsection 112a: first anchoring edge 112n1: first non-anchoring edge 112n2: second non-anchoring edge 114: second diaphragm subsection 114a: second anchoring edge 114n3: third non-anchoring edge 114n4: fourth non-anchoring edge 116: third diaphragm subsection 116a: third anchoring edge 116n5: fifth non-anchoring edge 118: fourth diaphragm subsection 118a: fourth anchor edge 118n6: sixth non-anchor edge 120: anchor structure 130: actuation layer 310: latch structure 312: first latch element 314: second latch element 912p1, 912p2, 912p3: part AL: adhesive layer AM: actuation material AP: anchoring part APT: device BS: substrate BS_AS: device substrate BS_ASc, CPC: conductive pad BS_ASp: device substrate opening CAL: conductive adhesive layer CDB: conductive layer CPS: compensating oxide layer CR: corner area CRC: conductive ring CS_V: cover structure CT1: First conductive layer CT2: Second conductive layer CV: Cavity CV1: First sub-cavity CV2: Second sub-cavity CVi: Inner cavity HS: Shell NP: Non-anchored part OC: Outer shell OCp: Outflow opening OP1: First shell opening OP2: Second shell opening OPV: Substrate opening PKG: Package structure R1, R2, R3: Region RS: Groove structure SB: Substrate SIL: Isolation insulation layer SL: Slit SL1: First slit SL2: Second slit SL3: Third slit SL4, SL4’: Fourth slit SL5: Fifth slit SL6: Sixth slit SLi: Side slit SLn1: First inner slit SLn2: Second inner slit SLs: Slit segment SPR1: First spring SPR2: Second spring SPR3: Third spring ST_V: Ventilation substrate SW: Side wall TF_V: Membrane structure TL: Trench line TS: Top structure VD: Ventilation device WF: Wafer WL1: First layer WL1a: Top surface WL2: Second layer WL3: Insulation layer X,Y,Z: Direction

第1圖所示為本發明第一實施例的發聲單元的俯視示意圖。 第2圖所示為第1圖的區域R1中的結構的放大示意圖。 第3圖至第8圖所示為本發明一實施例的發聲單元的製造方法在不同階段時的結構的示意圖。 第9圖所示為本發明第二實施例的發聲單元的俯視示意圖。 第10圖所示為第9圖的區域R2中的結構的放大示意圖。 第11圖所示為本發明第三實施例的發聲單元的俯視示意圖。 第12圖所示為本發明第四實施例的發聲單元的俯視示意圖。 第13圖所示為本發明第五實施例的發聲單元的俯視示意圖。 第14圖所示為本發明第六實施例的發聲單元的俯視示意圖。 第15圖所示為第14圖的區域R3中的結構的放大示意圖。 第16圖所示為本發明第七實施例的發聲單元的俯視示意圖。 第17圖所示為本發明第八實施例的發聲單元的俯視示意圖。 第18圖所示為本發明第九實施例的發聲單元的俯視示意圖。 第19圖所示為本發明第九實施例的發聲單元的側視示意圖。 第20圖所示為本發明第十實施例的發聲單元的俯視示意圖。 第21圖所示為本發明一實施例的封裝結構的示意圖。 第22圖所示為第21圖繪示的封裝結構的底視示意圖。 第23圖所示為第21圖繪示的封裝結構的剖面示意圖。 第24圖所示為本發明一實施例的封裝結構的示意圖。 第25圖所示為本發明一實施例的封裝結構的示意圖。 第26圖所示為第25圖繪示的封裝結構的剖面示意圖。 第27圖所示為本發明一實施例的封裝結構的示意圖。 第28圖所示為第27圖繪示的封裝結構的剖面示意圖。 第29圖所示為本發明一實施例的設備的剖面示意圖。 第30圖所示為本發明一實施例的設備的示意圖。 FIG. 1 is a schematic diagram of a top view of a sound unit of the first embodiment of the present invention. FIG. 2 is an enlarged schematic diagram of the structure in region R1 of FIG. 1. FIG. 3 to FIG. 8 are schematic diagrams of the structure of the sound unit of the first embodiment of the present invention at different stages of the manufacturing method. FIG. 9 is a schematic diagram of a top view of a sound unit of the second embodiment of the present invention. FIG. 10 is an enlarged schematic diagram of the structure in region R2 of FIG. 9. FIG. 11 is a schematic diagram of a top view of a sound unit of the third embodiment of the present invention. FIG. 12 is a schematic diagram of a top view of a sound unit of the fourth embodiment of the present invention. FIG. 13 is a schematic diagram of a top view of a sound unit of the fifth embodiment of the present invention. FIG. 14 is a schematic diagram of a top view of a sound unit of the sixth embodiment of the present invention. FIG. 15 is an enlarged schematic diagram of the structure in the region R3 of FIG. 14. FIG. 16 is a schematic diagram of a top view of the sound unit of the seventh embodiment of the present invention. FIG. 17 is a schematic diagram of a top view of the sound unit of the eighth embodiment of the present invention. FIG. 18 is a schematic diagram of a top view of the sound unit of the ninth embodiment of the present invention. FIG. 19 is a schematic diagram of a side view of the sound unit of the ninth embodiment of the present invention. FIG. 20 is a schematic diagram of a top view of the sound unit of the tenth embodiment of the present invention. FIG. 21 is a schematic diagram of a package structure of an embodiment of the present invention. FIG. 22 is a schematic diagram of a bottom view of the package structure shown in FIG. 21. FIG. 23 is a schematic diagram of a cross-section of the package structure shown in FIG. 21. FIG. 24 is a schematic diagram of a package structure of an embodiment of the present invention. FIG. 25 is a schematic diagram of a package structure of an embodiment of the present invention. FIG. 26 is a schematic diagram of a cross-section of the package structure shown in FIG. 25. FIG. 27 is a schematic diagram of a package structure of an embodiment of the present invention. FIG. 28 is a schematic diagram of a cross-section of the package structure shown in FIG. 27. FIG. 29 is a schematic diagram of a cross-section of a device of an embodiment of the present invention. FIG. 30 is a schematic diagram of a device of an embodiment of the present invention.

100:發聲單元 100: Voice unit

110:振膜 110: Diaphragm

112:第一振膜子部 112: First diaphragm subsection

112a:第一錨定邊緣 112a: First anchor edge

112n1:第一非錨定邊緣 112n1: First non-anchored edge

112n2:第二非錨定邊緣 112n2: Second non-anchored edge

114:第二振膜子部 114: Second diaphragm subsection

114a:第二錨定邊緣 114a: Second anchor edge

114n3:第三非錨定邊緣 114n3: The third non-anchored edge

114n4:第四非錨定邊緣 114n4: The fourth non-anchored edge

120:錨定結構 120: Anchor structure

130:致動層 130: Actuation layer

R1:區域 R1: Region

SL:狹縫 SL: Slit

SL1:第一狹縫 SL1: First narrow seam

SL2:第二狹縫 SL2: Second narrow seam

SL3:第三狹縫 SL3: The third narrow seam

X,Y,Z:方向 X,Y,Z: Direction

Claims (53)

一種封裝結構,包括: 一殼蓋;以及 一單元,設置在所述殼蓋內,所述單元包括: 一振膜,包括一第一振膜子部與一第二振膜子部,其中所述第一振膜子部與所述第二振膜子部在沿著一俯視方向的俯視上彼此相對,使得所述第一振膜子部與所述第二振膜子部在垂直於所述俯視方向的一第一方向上彼此相對; 一致動層,在所述俯視方向上設置在所述第一振膜子部與所述第二振膜子部上;以及 一錨定結構,其中所述振膜錨定於所述錨定結構; 其中所述第一振膜子部包括一第一錨定邊緣,所述第一錨定邊緣完全連接或部分連接所述錨定結構以被所述錨定結構完全錨定或部分錨定,且在所述第一振膜子部中除了所述第一錨定邊緣之外的邊緣都是非錨定的; 其中所述第二振膜子部包括一第二錨定邊緣,所述第二錨定邊緣完全連接或部分連接所述錨定結構以被所述錨定結構完全錨定或部分錨定,且在所述第二振膜子部中除了所述第二錨定邊緣之外的邊緣都是非錨定的。 A packaging structure, comprising: a housing; and a unit, arranged in the housing, the unit comprising: a diaphragm, comprising a first diaphragm sub-portion and a second diaphragm sub-portion, wherein the first diaphragm sub-portion and the second diaphragm sub-portion are opposite to each other in a top view along a top view direction, so that the first diaphragm sub-portion and the second diaphragm sub-portion are opposite to each other in a first direction perpendicular to the top view direction; an actuator layer, arranged on the first diaphragm sub-portion and the second diaphragm sub-portion in the top view direction; and an anchoring structure, wherein the diaphragm is anchored to the anchoring structure; Wherein the first diaphragm sub-section includes a first anchoring edge, the first anchoring edge is completely or partially connected to the anchoring structure to be completely or partially anchored by the anchoring structure, and the edges of the first diaphragm sub-section except the first anchoring edge are all non-anchored; Wherein the second diaphragm sub-section includes a second anchoring edge, the second anchoring edge is completely or partially connected to the anchoring structure to be completely or partially anchored by the anchoring structure, and the edges of the second diaphragm sub-section except the second anchoring edge are all non-anchored. 如請求項1所述的封裝結構,其中所述殼蓋包括一頂部結構與一側壁,所述頂部結構實質上平行於所述振膜,且一第一殼蓋開口形成在所述頂部結構上。A packaging structure as described in claim 1, wherein the shell cover includes a top structure and a side wall, the top structure is substantially parallel to the diaphragm, and a first shell cover opening is formed on the top structure. 如請求項1所述的封裝結構,其中所述殼蓋包括一頂部結構與一側壁,且一第一殼蓋開口形成在所述側壁上。A packaging structure as described in claim 1, wherein the shell cover includes a top structure and a side wall, and a first shell cover opening is formed on the side wall. 如請求項1所述的封裝結構,其中所述殼蓋包括一頂部結構與一側壁,所述頂部結構實質上平行於所述振膜,且多個第一殼蓋開口形成在所述頂部結構上。A packaging structure as described in claim 1, wherein the shell cover includes a top structure and a side wall, the top structure is substantially parallel to the diaphragm, and a plurality of first shell cover openings are formed on the top structure. 如請求項1所述的封裝結構,其中所述振膜的一第一比值大於2,所述振膜的所述第一比值為所述振膜在俯視上的一第一側的一第一長度對於所述振膜在俯視上的一第二側的一第二長度的比值。A packaging structure as described in claim 1, wherein a first ratio of the diaphragm is greater than 2, and the first ratio of the diaphragm is the ratio of a first length of a first side of the diaphragm in a top view to a second length of a second side of the diaphragm in a top view. 如請求項1所述的封裝結構,其中所述振膜包括: 一第一狹縫,在所述第一方向上形成在所述第一振膜子部與所述第二振膜子部之間,其中所述第一振膜子部的一第一非錨定邊緣由所述第一狹縫所定義,且所述第一非錨定邊緣在所述第一方向上相對於所述第一錨定邊緣;以及 一第二狹縫,其中所述第一振膜子部的一第二非錨定邊緣由所述第二狹縫所定義,且所述第二非錨定邊緣相鄰於所述第一錨定邊緣。 The packaging structure as described in claim 1, wherein the diaphragm includes: a first slit formed between the first diaphragm sub-portion and the second diaphragm sub-portion in the first direction, wherein a first non-anchored edge of the first diaphragm sub-portion is defined by the first slit, and the first non-anchored edge is opposite to the first anchored edge in the first direction; and a second slit, wherein a second non-anchored edge of the first diaphragm sub-portion is defined by the second slit, and the second non-anchored edge is adjacent to the first anchored edge. 如請求項1所述的封裝結構,另包括一凹槽結構,設置在所述單元的一角落,所述凹槽結構用以在一剝離製程中分散施加在所述凹槽結構上的應力。The packaging structure as described in claim 1 further includes a groove structure disposed at a corner of the unit, wherein the groove structure is used to disperse the stress applied to the groove structure during a peeling process. 如請求項1所述的封裝結構,另包括四個凹槽結構,分別設置在所述單元的四個角落,所述凹槽結構用以在一剝離製程中分散施加在所述凹槽結構上的應力。The packaging structure as described in claim 1 further includes four groove structures, which are respectively arranged at the four corners of the unit, and the groove structures are used to disperse the stress applied to the groove structures during a peeling process. 如請求項1所述的封裝結構, 其中所述振膜包括一閂鎖結構,用以限制所述第一振膜子部與所述第二振膜子部的移動距離; 其中所述移動距離為沿著設置有所述單元的一基底的一法線方向的距離。 The packaging structure as described in claim 1, wherein the diaphragm includes a latch structure for limiting the movement distance of the first diaphragm sub-section and the second diaphragm sub-section; wherein the movement distance is the distance along a normal direction of a substrate on which the unit is disposed. 如請求項1所述的封裝結構,其中 所述振膜還包括一第一彈簧,直接連接在所述第一振膜子部與所述第二振膜子部之間。A packaging structure as described in claim 1, wherein the diaphragm also includes a first spring directly connected between the first diaphragm sub-portion and the second diaphragm sub-portion. 如請求項1所述的封裝結構,其中所述振膜包括: 一第三振膜子部,在俯視上設置在所述單元中位於所述第一振膜子部與所述第二振膜子部之間的一第一側; 其中所述第三振膜子部用以減少在所述單元的所述第一側的聲學洩漏; 其中所述第三振膜子部包括一第三錨定邊緣,所述第三錨定邊緣被錨定,且在所述第三振膜子部中除了所述第三錨定邊緣之外的邊緣都是非錨定的。 The packaging structure as described in claim 1, wherein the diaphragm includes: A third diaphragm sub-section, which is arranged on a first side between the first diaphragm sub-section and the second diaphragm sub-section in the unit in a plan view; wherein the third diaphragm sub-section is used to reduce acoustic leakage on the first side of the unit; wherein the third diaphragm sub-section includes a third anchoring edge, the third anchoring edge is anchored, and the edges of the third diaphragm sub-section except the third anchoring edge are all non-anchored. 如請求項1所述的封裝結構, 其中所述第一錨定邊緣被部分錨定; 其中所述第一錨定邊緣包括至少一錨定部與至少一非錨定部,所述至少一錨定部被錨定,所述至少一非錨定部是非錨定的; 其中當所述第一振膜子部被致動時,所述第一錨定邊緣的所述至少一非錨定部朝著設置有所述單元的一基底的一法線方向移動。 The packaging structure as described in claim 1, wherein the first anchoring edge is partially anchored; wherein the first anchoring edge includes at least one anchoring portion and at least one non-anchoring portion, the at least one anchoring portion is anchored, and the at least one non-anchoring portion is non-anchored; wherein when the first diaphragm sub-portion is actuated, the at least one non-anchoring portion of the first anchoring edge moves toward a normal direction of a substrate on which the unit is disposed. 一種設備,包括: 一外殼;以及 如請求項1所述的封裝結構。 A device comprising: a housing; and a packaging structure as described in claim 1. 如請求項13所述的設備,其中所述設備為一耳機、一頭戴式耳機或一耳塞式耳機。A device as described in claim 13, wherein the device is an earphone, a headphone or an earbud. 一種封裝結構的形成方法,包括: 進行一製造方法以製造一單元,所述製造方法包括: 提供一晶圓,其中所述晶圓包括一第一層與一第二層;以及 圖案化所述晶圓的所述第一層,以形成至少一溝道線;以及 設置所述單元在一殼蓋內; 其中所述第一層包括一振膜,所述振膜錨定於所述單元的一錨定結構,至少一狹縫是因為所述至少一溝道線而形成在所述振膜中並貫穿所述振膜; 其中所述振膜包括一第一振膜子部與一第二振膜子部,所述第一振膜子部與所述第二振膜子部在沿著一俯視方向的俯視上彼此相對,使得所述第一振膜子部與所述第二振膜子部在垂直於所述俯視方向的一第一方向上彼此相對; 其中所述第一振膜子部包括一第一錨定邊緣,所述第一錨定邊緣完全連接或部分連接所述錨定結構以被所述錨定結構完全錨定或部分錨定,且在所述第一振膜子部中除了所述第一錨定邊緣之外的邊緣都是非錨定的; 其中所述第二振膜子部包括一第二錨定邊緣,所述第二錨定邊緣完全連接或部分連接所述錨定結構以被所述錨定結構完全錨定或部分錨定,且在所述第二振膜子部中除了所述第二錨定邊緣之外的邊緣都是非錨定的。 A method for forming a packaging structure, comprising: Performing a manufacturing method to manufacture a unit, the manufacturing method comprising: Providing a wafer, wherein the wafer comprises a first layer and a second layer; and Patterning the first layer of the wafer to form at least one channel line; and Placing the unit in a shell cover; Wherein the first layer comprises a diaphragm, the diaphragm is anchored to an anchoring structure of the unit, and at least one slit is formed in the diaphragm due to the at least one channel line and penetrates the diaphragm; Wherein the diaphragm comprises a first diaphragm sub-portion and a second diaphragm sub-portion, the first diaphragm sub-portion and the second diaphragm sub-portion are opposite to each other in a top view along a top view direction, so that the first diaphragm sub-portion and the second diaphragm sub-portion are opposite to each other in a first direction perpendicular to the top view direction; Wherein the first diaphragm sub-section includes a first anchoring edge, the first anchoring edge is completely or partially connected to the anchoring structure to be completely or partially anchored by the anchoring structure, and the edges of the first diaphragm sub-section except the first anchoring edge are all non-anchored; Wherein the second diaphragm sub-section includes a second anchoring edge, the second anchoring edge is completely or partially connected to the anchoring structure to be completely or partially anchored by the anchoring structure, and the edges of the second diaphragm sub-section except the second anchoring edge are all non-anchored. 如請求項15的形成方法,另包括: 在設置所述單元於所述殼蓋內之前,形成一第一殼蓋開口在所述殼蓋上; 其中所述殼蓋包括一頂部結構與一側壁,所述頂部結構實質上平行於所述振膜,且所述第一殼蓋開口形成在所述頂部結構上。 The formation method of claim 15 further comprises: Before placing the unit in the housing, forming a first housing opening on the housing; wherein the housing comprises a top structure and a side wall, the top structure is substantially parallel to the diaphragm, and the first housing opening is formed on the top structure. 如請求項15的形成方法,另包括: 在設置所述單元於所述殼蓋內之前,形成一第一殼蓋開口在所述殼蓋上; 其中所述殼蓋包括一頂部結構與一側壁,且所述第一殼蓋開口形成在所述側壁上。 The formation method of claim 15 further comprises: Before placing the unit in the housing, forming a first housing opening on the housing; wherein the housing comprises a top structure and a side wall, and the first housing opening is formed on the side wall. 如請求項15的形成方法,另包括: 在設置所述單元於所述殼蓋內之前,形成多個第一殼蓋開口在所述殼蓋上; 其中所述殼蓋包括一頂部結構與一側壁,所述頂部結構實質上平行於所述振膜,且所述第一殼蓋開口形成在所述頂部結構上。 The formation method of claim 15 further comprises: Before placing the unit in the housing, forming a plurality of first housing openings on the housing; wherein the housing comprises a top structure and a side wall, the top structure is substantially parallel to the diaphragm, and the first housing openings are formed on the top structure. 如請求項15的形成方法,其中所述單元的所述製造方法還包括: 形成一凹槽結構在所述單元的一角落。 As in the formation method of claim 15, the manufacturing method of the unit further comprises: forming a groove structure at a corner of the unit. 如請求項15的形成方法,其中所述單元的所述製造方法還包括: 形成一閂鎖結構,用以限制所述第一振膜子部與所述第二振膜子部的移動距離; 其中所述移動距離為沿著設置有所述單元的一基底的一法線方向的距離。 As in the formation method of claim 15, the manufacturing method of the unit further comprises: forming a latch structure to limit the movement distance of the first diaphragm sub-section and the second diaphragm sub-section; wherein the movement distance is the distance along a normal direction of a substrate on which the unit is disposed. 如請求項15的形成方法,其中所述單元的所述製造方法還包括: 形成一彈簧在所述第一振膜子部與所述第二振膜子部之間。 As in the formation method of claim 15, the manufacturing method of the unit further comprises: forming a spring between the first diaphragm sub-section and the second diaphragm sub-section. 如請求項15的形成方法,其中所述單元的所述製造方法還包括: 圖案化所述晶圓的所述第一層,使得所述振膜還包括一第三振膜子部與一第四振膜子部; 其中所述第三振膜子部用以減少在所述單元的一第一側的聲學洩漏; 其中所述第四振膜子部用以減少在所述單元的一第二側的聲學洩漏。 The formation method of claim 15, wherein the manufacturing method of the unit further comprises: Patterning the first layer of the wafer so that the diaphragm further comprises a third diaphragm sub-section and a fourth diaphragm sub-section; wherein the third diaphragm sub-section is used to reduce acoustic leakage on a first side of the unit; wherein the fourth diaphragm sub-section is used to reduce acoustic leakage on a second side of the unit. 如請求項15的形成方法,其中所述單元的所述製造方法還包括: 在所述第一振膜子部上形成至少一第一內部狹縫與至少一第二內部狹縫; 其中所述第一錨定邊緣被部分錨定; 其中所述第一錨定邊緣包括至少一錨定部與至少一非錨定部; 其中所述第一錨定邊緣的所述至少一非錨定部是由所述至少一第一內部狹縫所定義; 其中所述至少一錨定部與所述至少一非錨定部根據所述至少一第二內部狹縫而劃分。 The formation method of claim 15, wherein the manufacturing method of the unit further comprises: forming at least one first internal slit and at least one second internal slit on the first diaphragm sub-portion; wherein the first anchoring edge is partially anchored; wherein the first anchoring edge includes at least one anchoring portion and at least one non-anchoring portion; wherein the at least one non-anchoring portion of the first anchoring edge is defined by the at least one first internal slit; wherein the at least one anchoring portion and the at least one non-anchoring portion are divided according to the at least one second internal slit. 一種設備的形成方法,包括: 根據請求項15的形成方法形成一封裝結構;以及 透過一表面貼裝技術將所述封裝結構組裝在包括一外殼的所述設備中。 A method for forming a device, comprising: forming a package structure according to the forming method of claim 15; and assembling the package structure in the device including a housing through a surface mounting technology. 一種發聲單元,包括: 一振膜,包括一第一振膜子部與一第二振膜子部,其中所述第一振膜子部與所述第二振膜子部彼此相對;以及 一致動層,設置在所述第一振膜子部與所述第二振膜子部上; 其中所述第一振膜子部包括一第一錨定邊緣,所述第一錨定邊緣被完全錨定或部分錨定,且在所述第一振膜子部中除了所述第一錨定邊緣之外的邊緣都是非錨定的; 其中所述第二振膜子部包括一第二錨定邊緣,所述第二錨定邊緣被完全錨定或部分錨定,且在所述第二振膜子部中除了所述第二錨定邊緣之外的邊緣都是非錨定的。 A sound unit comprises: A diaphragm, comprising a first diaphragm sub-section and a second diaphragm sub-section, wherein the first diaphragm sub-section and the second diaphragm sub-section are opposite to each other; and An actuator layer, disposed on the first diaphragm sub-section and the second diaphragm sub-section; wherein the first diaphragm sub-section comprises a first anchoring edge, the first anchoring edge is fully anchored or partially anchored, and the edges of the first diaphragm sub-section except the first anchoring edge are all non-anchored; wherein the second diaphragm sub-section comprises a second anchoring edge, the second anchoring edge is fully anchored or partially anchored, and the edges of the second diaphragm sub-section except the second anchoring edge are all non-anchored. 如請求項25所述的發聲單元,其中所述振膜的一第一比值大於2,所述振膜的所述第一比值為所述振膜的一第一側的一第一長度對於所述振膜的一第二側的一第二長度的比值。A sound unit as described in claim 25, wherein a first ratio of the diaphragm is greater than 2, and the first ratio of the diaphragm is the ratio of a first length of a first side of the diaphragm to a second length of a second side of the diaphragm. 如請求項25所述的發聲單元,其中所述振膜包括: 一第一狹縫,形成在所述第一振膜子部與所述第二振膜子部之間,其中所述第一振膜子部的一第一非錨定邊緣由所述第一狹縫所定義,且所述第一非錨定邊緣在俯視上相對於所述第一錨定邊緣;以及 一第二狹縫,其中所述第一振膜子部的一第二非錨定邊緣由所述第二狹縫所定義,且所述第二非錨定邊緣相鄰於所述第一錨定邊緣。 A sound unit as described in claim 25, wherein the diaphragm includes: a first slit formed between the first diaphragm sub-portion and the second diaphragm sub-portion, wherein a first non-anchored edge of the first diaphragm sub-portion is defined by the first slit, and the first non-anchored edge is opposite to the first anchored edge in a top view; and a second slit, wherein a second non-anchored edge of the first diaphragm sub-portion is defined by the second slit, and the second non-anchored edge is adjacent to the first anchored edge. 如請求項27所述的發聲單元,其中所述第一振膜子部的所述第一非錨定邊緣與所述第二振膜子部的一第三非錨定邊緣由所述第一狹縫所定義,所述第二振膜子部的所述第三非錨定邊緣在俯視上相對於所述第二振膜子部的所述第二錨定邊緣。A sound unit as described in claim 27, wherein the first non-anchored edge of the first diaphragm sub-section and a third non-anchored edge of the second diaphragm sub-section are defined by the first slit, and the third non-anchored edge of the second diaphragm sub-section is opposite to the second anchored edge of the second diaphragm sub-section in a plan view. 如請求項25所述的發聲單元,另包括一凹槽結構,設置在所述發聲單元的一角落,所述凹槽結構用以在一剝離製程中分散施加在所述凹槽結構上的應力。The sound unit as described in claim 25 further includes a groove structure arranged at a corner of the sound unit, and the groove structure is used to disperse the stress applied to the groove structure during a peeling process. 如請求項29所述的發聲單元,其中所述振膜包括一狹縫段,設置在所述振膜的一角落區,所述凹槽結構直接連接所述狹縫段。A sound unit as described in claim 29, wherein the diaphragm includes a slit segment arranged in a corner area of the diaphragm, and the groove structure is directly connected to the slit segment. 如請求項29所述的發聲單元,其中所述凹槽結構具有一曲線圖案。A sound unit as described in claim 29, wherein the groove structure has a curved pattern. 如請求項25所述的發聲單元,另包括四個凹槽結構,分別設置在所述發聲單元的四個角落,所述凹槽結構用以在一剝離製程中分散施加在所述凹槽結構上的應力。The sound unit as described in claim 25 further includes four groove structures, which are respectively arranged at the four corners of the sound unit, and the groove structures are used to disperse the stress applied to the groove structures during a peeling process. 如請求項25所述的發聲單元, 其中所述振膜包括一閂鎖結構,用以限制所述第一振膜子部與所述第二振膜子部的移動距離; 其中所述移動距離為沿著設置有所述發聲單元的一基底的一法線方向的距離。 A sound unit as described in claim 25, wherein the diaphragm includes a latch structure for limiting the movement distance of the first diaphragm sub-section and the second diaphragm sub-section; wherein the movement distance is a distance along a normal direction of a base on which the sound unit is provided. 如請求項33所述的發聲單元,其中所述閂鎖結構包括一第一閂鎖元件與一第二閂鎖元件,所述第一閂鎖元件為所述第一振膜子部的一部分,所述第二閂鎖元件為所述第二振膜子部的一部分。A sound unit as described in claim 33, wherein the latching structure includes a first latching element and a second latching element, the first latching element is a part of the first diaphragm sub-portion, and the second latching element is a part of the second diaphragm sub-portion. 如請求項33所述的發聲單元,其中所述振膜還包括: 一第一狹縫,形成在所述第一振膜子部與所述第二振膜子部之間; 其中所述閂鎖結構的至少一部分是由於所述第一狹縫而形成。 A sound unit as described in claim 33, wherein the diaphragm further comprises: a first slit formed between the first diaphragm sub-portion and the second diaphragm sub-portion; wherein at least a portion of the latching structure is formed by the first slit. 如請求項25所述的發聲單元,其中所述振膜還包括一第一彈簧,直接連接在所述第一振膜子部與所述第二振膜子部之間。A sound unit as described in claim 25, wherein the diaphragm also includes a first spring directly connected between the first diaphragm sub-portion and the second diaphragm sub-portion. 如請求項36所述的發聲單元,其中所述振膜還包括: 至少一狹縫,形成在所述第一振膜子部與所述第二振膜子部之間; 其中所述第一彈簧的至少一部分是由於所述至少一狹縫而形成。 A sound unit as described in claim 36, wherein the diaphragm further comprises: At least one slit formed between the first diaphragm sub-portion and the second diaphragm sub-portion; wherein at least a portion of the first spring is formed by the at least one slit. 如請求項37所述的發聲單元,其中所述至少一狹縫的其中一個包括一鉤型曲線圖案。A sound unit as described in claim 37, wherein one of the at least one slit comprises a hook-shaped curve pattern. 如請求項25所述的發聲單元,其中所述振膜包括: 一第三振膜子部,在俯視上設置在所述發聲單元中位於所述第一振膜子部與所述第二振膜子部之間的一第一側; 其中所述第三振膜子部用以減少在所述發聲單元的所述第一側的聲學洩漏; 其中所述第三振膜子部包括一第三錨定邊緣,所述第三錨定邊緣被錨定,且在所述第三振膜子部中除了所述第三錨定邊緣之外的邊緣都是非錨定的。 A sound unit as described in claim 25, wherein the diaphragm includes: A third diaphragm sub-section, which is arranged on a first side between the first diaphragm sub-section and the second diaphragm sub-section in the sound unit in a plan view; wherein the third diaphragm sub-section is used to reduce acoustic leakage on the first side of the sound unit; wherein the third diaphragm sub-section includes a third anchoring edge, the third anchoring edge is anchored, and the edges of the third diaphragm sub-section except the third anchoring edge are all non-anchored. 如請求項39所述的發聲單元,其中所述振膜包括: 一第四振膜子部,在俯視上設置在所述發聲單元中位於所述第一振膜子部與所述第二振膜子部之間的一第二側; 其中所述第四振膜子部用以減少在所述發聲單元的所述第二側的聲學洩漏; 其中所述第四振膜子部包括一第四錨定邊緣,所述第四錨定邊緣被錨定,且在所述第四振膜子部中除了所述第四錨定邊緣之外的邊緣都是非錨定的。 A sound unit as described in claim 39, wherein the diaphragm includes: A fourth diaphragm sub-section, which is arranged on a second side between the first diaphragm sub-section and the second diaphragm sub-section in the sound unit in a plan view; wherein the fourth diaphragm sub-section is used to reduce acoustic leakage on the second side of the sound unit; wherein the fourth diaphragm sub-section includes a fourth anchoring edge, the fourth anchoring edge is anchored, and the edges of the fourth diaphragm sub-section except the fourth anchoring edge are all non-anchored. 如請求項39所述的發聲單元,其中所述振膜包括: 一第一狹縫,形成在所述第一振膜子部與所述第二振膜子部之間,其中所述第一振膜子部的一第一非錨定邊緣由所述第一狹縫所定義,且所述第一非錨定邊緣相對於所述第一錨定邊緣;以及 一第二狹縫,形成在所述第一振膜子部與所述第三振膜子部之間,其中所述第一振膜子部的一第二非錨定邊緣與所述第三振膜子部的一第四非錨定邊緣由所述第二狹縫所定義,所述第一振膜子部的所述第二非錨定邊緣相鄰於所述第一振膜子部的所述第一錨定邊緣,所述第三振膜子部的所述第四非錨定邊緣相鄰於所述第三振膜子部的所述第三錨定邊緣。 A sound unit as described in claim 39, wherein the diaphragm includes: a first slit formed between the first diaphragm sub-section and the second diaphragm sub-section, wherein a first non-anchored edge of the first diaphragm sub-section is defined by the first slit, and the first non-anchored edge is opposite to the first anchored edge; and a second slit formed between the first diaphragm sub-section and the third diaphragm sub-section, wherein a second non-anchored edge of the first diaphragm sub-section and a fourth non-anchored edge of the third diaphragm sub-section are defined by the second slit, the second non-anchored edge of the first diaphragm sub-section is adjacent to the first anchored edge of the first diaphragm sub-section, and the fourth non-anchored edge of the third diaphragm sub-section is adjacent to the third anchored edge of the third diaphragm sub-section. 如請求項39所述的發聲單元,其中所述振膜包括: 一第二彈簧,直接連接在所述第一振膜子部與所述第三振膜子部之間。 A sound unit as described in claim 39, wherein the diaphragm includes: A second spring directly connected between the first diaphragm sub-section and the third diaphragm sub-section. 如請求項39所述的發聲單元, 其中至少一側狹縫形成在所述第三振膜子部上; 其中沒有致動層設置在所述第三振膜子部上。 A sound unit as described in claim 39, wherein at least one side slit is formed on the third diaphragm sub-portion; wherein no actuating layer is provided on the third diaphragm sub-portion. 如請求項25所述的發聲單元, 其中所述第一錨定邊緣被部分錨定; 其中所述第一錨定邊緣包括至少一錨定部與至少一非錨定部,所述至少一錨定部被錨定,所述至少一非錨定部是非錨定的; 其中當所述第一振膜子部被致動時,所述第一錨定邊緣的所述至少一非錨定部朝著設置有所述發聲單元的一基底的一法線方向移動。 A sound unit as described in claim 25, wherein the first anchoring edge is partially anchored; wherein the first anchoring edge includes at least one anchoring portion and at least one non-anchoring portion, the at least one anchoring portion is anchored, and the at least one non-anchoring portion is non-anchored; wherein when the first diaphragm sub-portion is actuated, the at least one non-anchoring portion of the first anchoring edge moves toward a normal direction of a base on which the sound unit is disposed. 如請求項44所述的發聲單元, 其中所述第一振膜子部具有至少一第一內部狹縫與至少一第二內部狹縫; 其中所述第一錨定邊緣的所述至少一非錨定部是由所述至少一第一內部狹縫所定義; 其中所述至少一第二內部狹縫從所述第一錨定邊緣向所述第一狹縫延伸; 其中所述第一狹縫形成在所述第一振膜子部與所述第二振膜子部之間,所述第一振膜子部的一非錨定邊緣由所述第一狹縫所定義。 A sound unit as described in claim 44, wherein the first diaphragm sub-section has at least one first internal slit and at least one second internal slit; wherein the at least one non-anchored portion of the first anchoring edge is defined by the at least one first internal slit; wherein the at least one second internal slit extends from the first anchoring edge to the first slit; wherein the first slit is formed between the first diaphragm sub-section and the second diaphragm sub-section, and a non-anchored edge of the first diaphragm sub-section is defined by the first slit. 如請求項45所述的發聲單元, 其中所述第一振膜子部包括兩個第二內部狹縫,所述第二內部狹縫從所述第一錨定邊緣向所述第一狹縫延伸; 其中所述致動層的一部分設置在所述兩個第二內部狹縫之間。 A sound unit as described in claim 45, wherein the first diaphragm sub-portion includes two second internal slits, and the second internal slits extend from the first anchoring edge to the first slit; wherein a portion of the actuation layer is disposed between the two second internal slits. 如請求項45所述的發聲單元,其中所述至少一錨定部與所述至少一非錨定部根據所述至少一第二內部狹縫而劃分。A sound unit as described in claim 45, wherein the at least one anchoring portion and the at least one non-anchoring portion are divided according to the at least one second internal slit. 一種發聲單元的製造方法,包括: 提供一晶圓,其中所述晶圓包括一第一層與一第二層; 圖案化所述晶圓的所述第一層,以形成至少一溝道線;以及 將所述晶圓設置在一基板上; 其中所述第一層包括一振膜,至少一狹縫是因為所述至少一溝道線而形成在所述振膜中並貫穿所述振膜; 其中所述振膜包括一第一振膜子部與一第二振膜子部,其中所述第一振膜子部與所述第二振膜子部彼此相對; 其中所述第一振膜子部包括一第一錨定邊緣,所述第一錨定邊緣被完全錨定或部分錨定,且在所述第一振膜子部中除了所述第一錨定邊緣之外的邊緣都是非錨定的; 其中所述第二振膜子部包括一第二錨定邊緣,所述第二錨定邊緣被完全錨定或部分錨定,且在所述第二振膜子部中除了所述第二錨定邊緣之外的邊緣都是非錨定的。 A method for manufacturing a sound unit, comprising: Providing a wafer, wherein the wafer comprises a first layer and a second layer; Patterning the first layer of the wafer to form at least one channel line; and Placing the wafer on a substrate; wherein the first layer comprises a diaphragm, and at least one slit is formed in the diaphragm due to the at least one channel line and penetrates the diaphragm; wherein the diaphragm comprises a first diaphragm sub-portion and a second diaphragm sub-portion, wherein the first diaphragm sub-portion and the second diaphragm sub-portion are opposite to each other; wherein the first diaphragm sub-portion comprises a first anchoring edge, the first anchoring edge is fully anchored or partially anchored, and the edges of the first diaphragm sub-portion except the first anchoring edge are all non-anchored; The second diaphragm sub-portion includes a second anchoring edge, the second anchoring edge is fully anchored or partially anchored, and the edges of the second diaphragm sub-portion except the second anchoring edge are all non-anchored. 如請求項48所述的發聲單元的製造方法,另包括: 形成一凹槽結構在所述發聲單元的一角落。 The method for manufacturing a sound unit as described in claim 48 further comprises: forming a groove structure at a corner of the sound unit. 如請求項48所述的發聲單元的製造方法,另包括: 形成一閂鎖結構,用以限制所述第一振膜子部與所述第二振膜子部的移動距離; 其中所述移動距離為沿著設置有所述發聲單元的一基底的一法線方向的距離。 The manufacturing method of the sound unit as described in claim 48 further comprises: forming a latch structure to limit the moving distance of the first diaphragm sub-section and the second diaphragm sub-section; wherein the moving distance is the distance along a normal direction of a substrate on which the sound unit is disposed. 如請求項48所述的發聲單元的製造方法,另包括: 形成一彈簧在所述第一振膜子部與所述第二振膜子部之間。 The method for manufacturing a sound unit as described in claim 48 further comprises: forming a spring between the first diaphragm sub-section and the second diaphragm sub-section. 如請求項48所述的發聲單元的製造方法,另包括: 圖案化所述晶圓的所述第一層,使得所述振膜還包括一第三振膜子部與一第四振膜子部; 其中所述第三振膜子部用以減少在所述發聲單元的一第一側的聲學洩漏; 其中所述第四振膜子部用以減少在所述發聲單元的一第二側的聲學洩漏。 The method for manufacturing a sound unit as described in claim 48 further comprises: Patterning the first layer of the wafer so that the diaphragm further comprises a third diaphragm sub-section and a fourth diaphragm sub-section; wherein the third diaphragm sub-section is used to reduce acoustic leakage on a first side of the sound unit; wherein the fourth diaphragm sub-section is used to reduce acoustic leakage on a second side of the sound unit. 如請求項48所述的發聲單元的製造方法,另包括: 在所述第一振膜子部上形成至少一第一內部狹縫與至少一第二內部狹縫; 其中所述第一錨定邊緣被部分錨定; 其中所述第一錨定邊緣包括至少一錨定部與至少一非錨定部; 其中所述第一錨定邊緣的所述至少一非錨定部是由所述至少一第一內部狹縫所定義; 其中所述至少一錨定部與所述至少一非錨定部根據所述至少一第二內部狹縫而劃分。 The manufacturing method of the sound unit as described in claim 48 further comprises: forming at least one first internal slit and at least one second internal slit on the first diaphragm sub-portion; wherein the first anchoring edge is partially anchored; wherein the first anchoring edge includes at least one anchoring portion and at least one non-anchoring portion; wherein the at least one non-anchoring portion of the first anchoring edge is defined by the at least one first internal slit; wherein the at least one anchoring portion and the at least one non-anchoring portion are divided according to the at least one second internal slit.
TW112138746A 2022-10-19 2023-10-11 Sound producing cell, package structure, apparatus and forming methods thereof TW202418846A (en)

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