TW202407219A - Vacuum pump - Google Patents

Vacuum pump Download PDF

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Publication number
TW202407219A
TW202407219A TW112123074A TW112123074A TW202407219A TW 202407219 A TW202407219 A TW 202407219A TW 112123074 A TW112123074 A TW 112123074A TW 112123074 A TW112123074 A TW 112123074A TW 202407219 A TW202407219 A TW 202407219A
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TW
Taiwan
Prior art keywords
stator
spacer
partition plate
vacuum pump
heater
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TW112123074A
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Chinese (zh)
Inventor
三輪田透
高井慶行
芝田康寛
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日商埃地沃茲日本有限公司
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Publication of TW202407219A publication Critical patent/TW202407219A/en

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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04DNON-POSITIVE-DISPLACEMENT PUMPS
    • F04D19/00Axial-flow pumps
    • F04D19/02Multi-stage pumps
    • F04D19/04Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Non-Positive Displacement Air Blowers (AREA)

Abstract

A vacuum pump is proposed, which can more reliably prevent occurrence of an exhaust gas leakage from a space between a partition wall and a portion on which it is mounted. A vacuum pump has a casing having an outlet port, a rotating shaft rotatably supported inside the casing and rotated by an electric component portion, a rotor disposed outside an accommodating portion and fixed to the rotating shaft, a stator disposed on an outer peripheral side of the rotor, a pump channel provided between an outer peripheral surface of the rotor and an inner peripheral surface of the stator and configured such that the gas flows therethrough, a partition wall mounted on the stator and defining a gas channel from an outlet of the pump channel to the outlet port, and a heating means for heating the stator and the partition wall, wherein a seal member which suppresses intrusion of the gas is provided on a mounting surface of the stator and of the partition wall.

Description

真空泵Vacuum pump

本發明關於一種真空泵。The present invention relates to a vacuum pump.

對於設置於半導體製造裝置之真空腔室內之排氣處理,使用渦輪分子泵等之真空泵。於半導體製造步驟中,有使各種製程氣體作用於半導體基板之步驟,真空泵不僅於將半導體製造裝置之腔室內設為真空時使用,亦於自腔室內排出製程氣體時使用。For exhaust processing in a vacuum chamber installed in a semiconductor manufacturing apparatus, a vacuum pump such as a turbomolecular pump is used. In the semiconductor manufacturing process, there is a step of causing various process gases to act on the semiconductor substrate. The vacuum pump is used not only to create a vacuum in the chamber of the semiconductor manufacturing device, but also to discharge the process gases from the chamber.

此種製程氣體於蒸氣壓曲線所示之壓力與溫度之關係自氣相轉移至固相之部位中固體化,並作為副生成物析出。若此種副生成物於真空泵內堆積,則有致使排出之氣體之流路變窄,且真空泵之壓縮性能、排氣性能降低之虞。例如,因構成真空泵之鎧裝體之基底部、或收容使轉子旋轉驅動之電磁鐵或馬達等之電裝品之收容部(定子柱)之溫度較低,故當排出氣體接觸該等時,副生成物堆積。This kind of process gas solidifies in the position where the gas phase is transferred to the solid phase according to the relationship between pressure and temperature shown in the vapor pressure curve, and is precipitated as a by-product. If such by-products accumulate in the vacuum pump, the flow path of the discharged gas may be narrowed, and the compression performance and exhaust performance of the vacuum pump may be reduced. For example, since the temperature of the base of the armored body of the vacuum pump or the housing (stator column) housing the electrical components such as electromagnets and motors that drive the rotor is relatively low, when the exhaust gas comes into contact with them, By-product accumulation.

對該種問題,先前,藉由以隔板覆蓋基底部等之至少一部分,而防止排出氣體直接接觸基底部等。例如於專利文獻1中,於真空泵之螺紋槽泵部之下游側設置隔板(於專利文獻1中為絕熱板),藉由該隔板覆蓋低溫部即定子柱或基底部之至少一部分,而抑制副生成物堆積於基底部等。 [先前技術文獻] [專利文獻] Regarding this problem, conventionally, exhaust gas is prevented from directly contacting the base portion and the like by covering at least a portion of the base portion and the like with a partition. For example, in Patent Document 1, a partition plate (in the case of Patent Document 1, an insulating plate) is provided on the downstream side of the threaded groove pump part of the vacuum pump, and the partition plate covers at least a part of the low-temperature part, that is, the stator column or the base part. Prevents by-products from accumulating at the base. [Prior technical literature] [Patent Document]

[專利文獻1]國際公開第2021/090738號[Patent Document 1] International Publication No. 2021/090738

[發明所欲解決之問題][Problem to be solved by the invention]

然而,專利文獻1之隔板如該文獻之圖4所示,例如藉由螺栓等固定於螺紋槽定子。此時,隔板藉由緊固螺栓而基本對螺紋槽定子緊密接觸,但因加工零件時之偏差等原因,有兩者之安裝面彼此無法充分接觸之虞。於該情形時,排出氣體自隔板與螺紋槽定子之安裝面之間洩漏,結果,擔心副生成物堆積於基底部等。However, the separator in Patent Document 1 is fixed to the threaded groove stator by, for example, bolts, as shown in FIG. 4 of the document. At this time, the diaphragm is basically in close contact with the threaded groove stator by tightening the bolts. However, due to deviations during processing of parts and other reasons, there is a risk that the mounting surfaces of the two cannot fully contact each other. In this case, the exhaust gas leaks from between the partition plate and the mounting surface of the threaded groove stator, and as a result, there is a concern that by-products may accumulate on the base or the like.

鑑於該點,本發明之目的在於提供一種可更確實地防止排出氣體自隔板與安裝其之部分之間漏出之異常的真空泵。 [解決問題之技術手段] In view of this point, an object of the present invention is to provide a vacuum pump that can more reliably prevent abnormal leakage of exhaust gas from between the partition plate and the portion where the partition plate is mounted. [Technical means to solve problems]

本發明之真空泵之特徵在於,具有:鎧裝體,其具有排氣口;收容部,其收容電裝部並配置於上述鎧裝體之內側;旋轉軸,其於上述鎧裝體之內側旋轉自如地受支持,藉由上述電裝部旋轉;轉子,其配置於上述收容部之外側,固定於上述旋轉軸;定子,其配置於上述轉子之外周側;泵流路,其設置於上述轉子之外周面與上述定子之內周面之間,氣體於其中流動;隔板,其安裝於上述定子,劃定自上述泵流路之出口至上述排氣口之上述氣體之流路;及加熱機構,其加熱上述定子與上述隔板;且於上述定子與上述隔板之安裝面,設置抑制上述氣體侵入之密封構件。The vacuum pump of the present invention is characterized by having: an armored body having an exhaust port; a receiving portion that accommodates an electrical component and is disposed inside the armored body; and a rotating shaft that rotates inside the armored body. freely supported and rotated by the above-mentioned electrical part; a rotor arranged outside the above-mentioned accommodating part and fixed to the above-mentioned rotation shaft; a stator arranged outside the above-mentioned rotor; and a pump flow path provided on the above-mentioned rotor. Between the outer circumferential surface and the inner circumferential surface of the above-mentioned stator, gas flows therein; a partition installed on the above-mentioned stator to delineate the flow path of the above-mentioned gas from the outlet of the above-mentioned pump flow path to the above-mentioned exhaust port; and heating A mechanism that heats the stator and the separator; and provides a sealing member that suppresses the intrusion of the gas on the mounting surface of the stator and the separator.

此種真空泵較佳為於上述安裝面,相對於上述密封構件,於上述氣體之上游側具有上述定子與上述隔板接觸之金屬接觸面。This vacuum pump preferably has a metal contact surface where the stator and the partition plate are in contact with each other on the mounting surface and on the upstream side of the gas with respect to the sealing member.

又,較佳為,上述定子與上述隔板由互不相同之材質形成。Furthermore, preferably, the stator and the separator are made of different materials.

且,較佳為,上述隔板由熱傳導率高於上述定子之材質形成。Furthermore, it is preferable that the partition plate is made of a material with a higher thermal conductivity than that of the stator.

又,較佳為,於上述轉子與上述隔板對向之對向面之至少一部分,設置有抑制上述氣體向上述收容部流入之非接觸密封構造。Furthermore, preferably, a non-contact sealing structure that suppresses the inflow of the gas into the accommodating portion is provided on at least part of the opposing surface of the rotor and the partition plate.

又,較佳為,上述隔板相對於上述定子,自上述旋轉軸之軸向藉由螺栓固定。Furthermore, preferably, the partition plate is fixed to the stator by bolts from the axial direction of the rotation shaft.

且,較佳為,上述定子具有連接於上述排氣口之貫通孔,且上述安裝面設置於相對於上述旋轉軸之軸向自上述貫通孔偏離之位置。 [發明之效果] Furthermore, preferably, the stator has a through hole connected to the exhaust port, and the mounting surface is provided at a position offset from the through hole with respect to the axial direction of the rotation shaft. [Effects of the invention]

本發明之真空泵係於配置於轉子之外周側之定子安裝隔板者,於定子與隔板之安裝面,設置有抑制氣體侵入之密封構件。即,例如即使於因加工定子或隔板時之偏差等原因,而於安裝兩者時產生氣體洩漏程度之間隙之情形時,亦可更確實地防止氣體因密封構件而漏出之異常。The vacuum pump of the present invention has a stator mounted on the outer circumferential side of the rotor with a partition plate, and a sealing member that suppresses gas intrusion is provided on the mounting surface between the stator and the partition plate. That is, for example, even if a gas leakage gap occurs when the stator or separator is installed due to deviations in machining of the stator or the separator, it is possible to more reliably prevent gas leakage from the sealing member.

以下,一面參照圖式,一面就本發明之真空泵之一實施形態即渦輪分子泵,參照圖式且進行說明。Hereinafter, a turbomolecular pump, which is one embodiment of the vacuum pump of the present invention, will be described with reference to the drawings.

於圖1顯示該渦輪分子泵100之縱剖視圖。於圖1中,於渦輪分子泵100,於圓筒狀之外筒127(鎧裝體之一部分)之上端配備有吸氣口101。且,於外筒127之內側配備有以中心軸CA為中心旋轉之旋轉體103(轉子)。旋轉體103於周部放射狀且多層地配備有用於對氣體進行吸引排氣之渦輪葉片即複數個旋轉翼102(102a、102b、102c…)。於該旋轉體103之中心安裝有轉子軸113(旋轉軸),該轉子軸113例如藉由5軸控制之磁性軸承而於空中受懸浮支持且控制位置。旋轉體103一般由鋁或鋁合金等之金屬構成。A longitudinal cross-sectional view of the turbomolecular pump 100 is shown in FIG. 1 . In FIG. 1 , the turbomolecular pump 100 is provided with a suction port 101 at the upper end of the cylindrical outer tube 127 (part of the armor body). Furthermore, a rotating body 103 (rotor) that rotates around the central axis CA is provided inside the outer cylinder 127 . The rotor 103 is provided with a plurality of rotor blades 102 (102a, 102b, 102c...) that are turbine blades for sucking exhaust gas in a radial and multi-layered manner around the circumference. A rotor shaft 113 (rotation shaft) is installed at the center of the rotating body 103. The rotor shaft 113 is suspended in the air and its position is controlled by, for example, a five-axis controlled magnetic bearing. The rotating body 103 is generally made of metal such as aluminum or aluminum alloy.

上側徑向電磁鐵104係4個電磁鐵於X軸與Y軸成對配置。接近於該上側徑向電磁鐵104、且與上側徑向電磁鐵104之各者對應具備4個上側徑向感測器107。上側徑向感測器107例如使用具有傳導繞組之電感感測器或渦電流感測器等,基於根據轉子軸113之位置而變化之該傳導繞組之電感之變化,檢測轉子軸113之位置。該上側徑向感測器107構成為檢測轉子軸113即固定於此之旋轉體103之徑向位移,並輸送至未圖示之控制裝置。The upper radial electromagnet 104 is composed of four electromagnets arranged in pairs on the X-axis and the Y-axis. Four upper radial sensors 107 are provided close to the upper radial electromagnet 104 and corresponding to each of the upper radial electromagnet 104 . The upper radial sensor 107 uses, for example, an inductive sensor or an eddy current sensor having a conductive winding, and detects the position of the rotor shaft 113 based on the change in inductance of the conductive winding that changes according to the position of the rotor shaft 113 . The upper radial sensor 107 is configured to detect the radial displacement of the rotor shaft 113 , that is, the rotating body 103 fixed thereto, and transmit it to a control device (not shown).

於該控制裝置中,例如具有PID(Proportional Integral Derivative:比例積分微分)調節功能之補償電路,基於由上側徑向感測器107檢測出之位置信號,產生上側徑向電磁鐵104之激磁控制指令信號,圖2所示之放大電路150(後述)基於該激磁控制指令信號,激磁控制上側徑向電磁鐵104,藉此調整轉子軸113之上側之徑向位置。In this control device, for example, a compensation circuit with a PID (Proportional Integral Derivative: Proportional Integral Derivative) adjustment function generates an excitation control command for the upper radial electromagnet 104 based on the position signal detected by the upper radial sensor 107 Based on the excitation control command signal, the amplifier circuit 150 shown in FIG. 2 (described later) excites and controls the upper radial electromagnet 104, thereby adjusting the radial position of the upper side of the rotor shaft 113.

且,該轉子軸113由高磁導率材(鐵、不鏽鋼等)等形成,由上側徑向電磁鐵104之磁力吸引。該調整分別於X軸方向與Y軸方向獨立進行。又,下側徑向電磁鐵105及下側徑向感測器108,與上側徑向電磁鐵104及上側徑向感測器107同樣配置,與上側之徑向位置同樣調整轉子軸113之下側之徑向位置。Furthermore, the rotor shaft 113 is made of a high magnetic permeability material (iron, stainless steel, etc.), and is attracted by the magnetic force of the upper radial electromagnet 104 . The adjustment is performed independently in the X-axis direction and Y-axis direction. In addition, the lower radial electromagnet 105 and the lower radial sensor 108 are arranged in the same manner as the upper radial electromagnet 104 and the upper radial sensor 107, and are adjusted below the rotor shaft 113 in the same way as the upper radial position. The radial position of the side.

再者,軸向電磁鐵106A、106B將配備於轉子軸113之下部之圓板狀之金屬碟111上下夾著而配置。金屬碟111由鐵等之高磁導率材構成。為了檢測轉子軸113之軸向位移而配備軸向感測器109,且以其軸向位置信號輸送至上述控制裝置之方式構成。Furthermore, the axial electromagnets 106A and 106B are arranged so as to sandwich the disc-shaped metal disk 111 provided at the lower part of the rotor shaft 113 up and down. The metal disk 111 is made of a high magnetic permeability material such as iron. In order to detect the axial displacement of the rotor shaft 113, an axial sensor 109 is provided, and its axial position signal is transmitted to the above-mentioned control device.

且,於上述控制裝置中,例如具有PID調節功能之補償電路,基於由軸向感測器109檢測之軸向位置信號,產生軸向電磁鐵106A與軸向電磁鐵106B各者之激磁控制指令信號,放大電路150基於該等激磁控制指令信號,分別對軸向電磁鐵106A與軸向電磁鐵106B進行激磁控制,藉此軸向電磁鐵106A利用磁力向上方吸引金屬碟111,軸向電磁鐵106B向下方吸引金屬碟111,調整轉子軸113之軸向位置。Moreover, in the above control device, for example, a compensation circuit with a PID adjustment function generates excitation control instructions for each of the axial electromagnet 106A and the axial electromagnet 106B based on the axial position signal detected by the axial sensor 109 signal, the amplifying circuit 150 performs excitation control on the axial electromagnet 106A and the axial electromagnet 106B respectively based on these excitation control command signals, whereby the axial electromagnet 106A uses magnetic force to attract the metal disk 111 upward, and the axial electromagnet 106B attracts the metal disc 111 downward to adjust the axial position of the rotor shaft 113.

如此,上述控制裝置適當地調節該軸向電磁鐵106A、106B影響金屬碟111之磁力,使轉子軸113於軸向磁性懸浮,非接觸地保持於空間。另,對該等上側徑向電磁鐵104、下側徑向電磁鐵105及軸向電磁鐵106A、106B進行激磁控制之放大電路150,予以後述。In this way, the above-mentioned control device appropriately adjusts the magnetic force of the axial electromagnets 106A and 106B to affect the metal disk 111, so that the rotor shaft 113 is magnetically suspended in the axial direction and maintained in space in a non-contact manner. In addition, the amplifier circuit 150 that controls the excitation of the upper radial electromagnet 104, the lower radial electromagnet 105, and the axial electromagnets 106A and 106B will be described later.

另一方面,馬達121具備以包圍轉子軸113之方式配置成周狀之複數個磁極。各磁極以經由與轉子軸113之間起作用之電磁力使轉子軸113旋轉驅動之方式,由上述控制裝置控制。又,於馬達121組入未圖示之例如霍爾元件、分解器、編碼器等之旋轉速度感測器,由該旋轉速度感測器之檢測信號檢測轉子軸113之旋轉速度。On the other hand, the motor 121 includes a plurality of magnetic poles arranged in a circumferential shape to surround the rotor shaft 113 . Each magnetic pole is controlled by the above-mentioned control device to drive the rotor shaft 113 to rotate through the electromagnetic force acting between the magnetic pole and the rotor shaft 113 . Furthermore, a rotation speed sensor (not shown) such as a Hall element, a resolver, an encoder, etc. is incorporated into the motor 121, and the rotation speed of the rotor shaft 113 is detected from a detection signal of the rotation speed sensor.

再者,例如於下側徑向感測器108附近安裝未圖示之相位感測器,檢測轉子軸113之旋轉之相位。於上述控制裝置中,共同使用該相位感測器與旋轉速度感測器之檢測信號,檢測磁極之位置。Furthermore, for example, a phase sensor (not shown) is installed near the lower radial sensor 108 to detect the phase of rotation of the rotor shaft 113 . In the above control device, the detection signals of the phase sensor and the rotation speed sensor are jointly used to detect the position of the magnetic pole.

於外筒127之內周側且旋轉體103之外周側,與旋轉翼102(102a、102b、102c…)隔開微小之空隙,配設有複數片固定翼123(123a、123b、123c…)。因旋轉翼102(102a、102b、102c…)分別藉由碰撞而將排出氣體之分子向下方移送,故自垂直於轉子軸113之軸線之平面傾斜指定角度而形成。固定翼123(123a、123b、123c…)由例如鋁、鐵、不鏽鋼、銅等之金屬、或包含該等之金屬作為成分之合金等之金屬構成。A plurality of fixed wings 123 (123a, 123b, 123c...) are provided on the inner circumferential side of the outer cylinder 127 and the outer circumferential side of the rotating body 103, separated from the rotating wings 102 (102a, 102b, 102c...) by a slight gap. . The rotary wings 102 (102a, 102b, 102c...) are formed by being inclined at a predetermined angle from a plane perpendicular to the axis of the rotor shaft 113 because the molecules of the exhaust gas are moved downward through collision. The fixed wings 123 (123a, 123b, 123c...) are made of metals such as aluminum, iron, stainless steel, copper, or alloys containing these metals as components.

又,固定翼123亦同樣自垂直於轉子軸113之軸線之平面傾斜指定角度而形成,且朝向外筒127之內側,與旋轉翼102之層彼此不同地配設。且,固定翼123之外周端以嵌插於複數個層疊之固定翼間隔物125(125a、125b、125c…)之間之狀態受支持。In addition, the fixed wing 123 is also formed at a predetermined angle from a plane perpendicular to the axis of the rotor shaft 113, and is arranged in a different layer from the rotary wing 102 toward the inside of the outer tube 127. Furthermore, the outer peripheral end of the fixed wing 123 is supported in a state of being inserted between a plurality of stacked fixed wing spacers 125 (125a, 125b, 125c...).

固定翼間隔物125係環狀之構件,由例如鋁、鐵、不鏽鋼、銅等之金屬、或包含該等之金屬作為成分之合金等之金屬構成。於固定翼間隔物125之外周,隔開微小之空隙固定外筒127。於外筒127之底部配設基底部129(鎧裝體之一部分)。於基底部129形成排氣口133,連通於外部。自腔室(真空腔室)側進入吸氣口101並朝向渦輪分子泵100之內部移送之排出氣體,向下游側之排氣口133輸送。The fixed wing spacer 125 is an annular member made of a metal such as aluminum, iron, stainless steel, copper, or an alloy containing these metals as components. The outer cylinder 127 is fixed with a small gap on the outer periphery of the fixed wing spacer 125 . A base portion 129 (part of the armor body) is provided at the bottom of the outer cylinder 127 . An exhaust port 133 is formed on the base portion 129 and is connected to the outside. The exhaust gas enters the suction port 101 from the chamber (vacuum chamber) side and is moved toward the inside of the turbomolecular pump 100, and is sent to the exhaust port 133 on the downstream side.

於固定翼間隔物125之下部與基底部129之間,設置有附螺紋間隔物131、加熱器間隔物134、隔板(隔熱體壁)135、密封構件136、絕熱間隔物137。上述之固定翼123、固定翼間隔物125、附螺紋間隔物131及加熱器間隔物134為構成定子之一部分之構件。另,與加熱器間隔物134、隔板135、密封構件136、絕熱間隔物137有關之詳細說明予以後述。Between the lower part of the fixed wing spacer 125 and the base part 129, a threaded spacer 131, a heater spacer 134, a partition (insulation wall) 135, a sealing member 136, and an insulating spacer 137 are provided. The above-mentioned fixed wing 123, fixed wing spacer 125, threaded spacer 131 and heater spacer 134 are components that constitute a part of the stator. In addition, detailed description about the heater spacer 134, the partition plate 135, the sealing member 136, and the thermal insulation spacer 137 is mentioned later.

附螺紋間隔物131係由鋁、銅、不鏽鋼、鐵、或以該等之金屬為成分之合金等之金屬構成之圓筒狀之構件,於其內周面刻設有複數條螺旋狀之螺紋槽131a。螺紋槽131a之螺旋方向係於排出氣體之分子向旋轉體103之旋轉方向移動時,向排氣口133側移送該分子之方向。於旋轉體103之接續旋轉翼102(102a、102b、102c…)之最下部,垂下有圓筒部102d。該圓筒部102d之外周面為圓筒狀,且朝向附螺紋間隔物131之內周面伸出,與該附螺紋間隔物131之內周面隔開指定間隙而接近。附螺紋間隔物131或圓筒部102d係作為螺紋槽泵部發揮功能者,藉由旋轉翼102及固定翼123移送至螺紋槽131a之排出氣體,於螺紋槽131a被引導並向排氣口133傳送。另,作為螺紋槽泵部之功能,可根據渦輪分子泵100之用途而任意設置。The threaded spacer 131 is a cylindrical member made of metal such as aluminum, copper, stainless steel, iron, or alloys composed of these metals, and has a plurality of spiral threads engraved on its inner circumferential surface. Groove 131a. The spiral direction of the thread groove 131a is the direction in which the molecules of the exhaust gas are moved toward the exhaust port 133 side when they move in the rotation direction of the rotating body 103. A cylindrical part 102d hangs down from the lowest part of the rotating body 103 following the rotating wings 102 (102a, 102b, 102c...). The outer circumferential surface of the cylindrical portion 102d is cylindrical, protrudes toward the inner circumferential surface of the threaded spacer 131, and is close to the inner circumferential surface of the threaded spacer 131 with a predetermined gap. The threaded spacer 131 or the cylindrical portion 102d functions as a threaded groove pump part. The exhaust gas transferred to the threaded groove 131a by the rotating wing 102 and the fixed wing 123 is guided in the threaded groove 131a toward the exhaust port 133. Teleport. In addition, the function of the thread groove pump part can be arbitrarily set according to the purpose of the turbomolecular pump 100 .

基底部129係構成渦輪分子泵100之基底部之圓盤狀構件,一般由鐵、鋁、不鏽鋼等之金屬構成。因基底部129物理上保持渦輪分子泵100,且兼備熱之傳導路之功能,故期望使用鐵、鋁或銅等之具有剛性、熱傳導率亦較高之金屬。The base portion 129 is a disc-shaped member that constitutes the base portion of the turbomolecular pump 100, and is generally made of metal such as iron, aluminum, stainless steel, or the like. Since the base 129 physically holds the turbomolecular pump 100 and also functions as a heat conduction path, it is desirable to use a metal with rigidity and high thermal conductivity, such as iron, aluminum, or copper.

於該構成中,當旋轉翼102與轉子軸113一起由馬達121驅動旋轉時,藉由旋轉翼102與固定翼123之作用,排出氣體通過吸氣口101自腔室被吸入。旋轉翼102之旋轉速度通常為20000 rpm~90000 rpm,旋轉翼102之前端之周速度達到200 m/s~400 m/s。自吸氣口101吸入之排出氣體,通過旋轉翼102與固定翼123之間及附螺紋間隔物131與圓筒部102d之間之泵流路,且通過由附螺紋間隔物131、加熱器間隔物134及隔板135劃定之流路,向排氣口133移送。此時,雖因排出氣體接觸旋轉翼102時產生之摩擦熱、或於馬達121產生之熱之傳導等,而引起旋轉翼102之溫度上升,但該熱藉由輻射或排出氣體之氣體分子等之傳導,傳遞至固定翼123側。In this structure, when the rotor blade 102 and the rotor shaft 113 are driven and rotated by the motor 121, the exhaust gas is sucked in from the chamber through the air inlet 101 by the action of the rotor blade 102 and the fixed blade 123. The rotation speed of the rotary wing 102 is usually 20000 rpm ~ 90000 rpm, and the peripheral speed of the front end of the rotary wing 102 reaches 200 m/s ~ 400 m/s. The exhaust gas sucked in from the suction port 101 passes through the pump flow path between the rotating wing 102 and the fixed wing 123 and between the threaded spacer 131 and the cylindrical part 102d, and passes through the space between the threaded spacer 131 and the heater. The flow path defined by the object 134 and the partition 135 is transferred to the exhaust port 133. At this time, although the temperature of the rotor blade 102 rises due to frictional heat generated when the exhaust gas contacts the rotor blade 102 or conduction of heat generated by the motor 121, this heat is transmitted through radiation or gas molecules of the exhaust gas. The conduction is transmitted to the fixed wing 123 side.

固定翼間隔物125於外周部彼此接合,將固定翼123自旋轉翼102接收之熱或排出氣體接觸固定翼123時產生之摩擦熱等向外筒127傳遞。The fixed blade spacers 125 are joined to each other at the outer periphery to transmit heat received by the fixed blade 123 from the rotating blade 102 or frictional heat generated when exhaust gas contacts the fixed blade 123 to the outer tube 127 .

另,於上述中,說明附螺紋間隔物131配設於旋轉體103之圓筒部102d之外周,於附螺紋間隔物131之內周面刻設有螺紋槽131a。然而,與此相反,亦有於圓筒部102d之外周面刻設螺紋槽,於其周圍配置具有圓筒狀之內周面之間隔物之情形。In addition, in the above description, the threaded spacer 131 is arranged on the outer periphery of the cylindrical portion 102d of the rotating body 103, and the threaded groove 131a is engraved on the inner peripheral surface of the threaded spacer 131. However, contrary to this, there is also a case where a thread groove is carved on the outer peripheral surface of the cylindrical portion 102d, and a spacer having a cylindrical inner peripheral surface is arranged around it.

又,根據渦輪分子泵100之用途,亦有為了不使自吸氣口101吸引之氣體侵入由上側徑向電磁鐵104、上側徑向感測器107、馬達121、下側徑向電磁鐵105、下側徑向感測器108、軸向電磁鐵106A、106B、軸向感測器109等構成之電裝部,而以定子柱122(收容部)覆蓋電裝部周圍,且該定子柱122內由清洗氣體保持為指定壓力之情形。Furthermore, depending on the purpose of the turbomolecular pump 100, the upper radial electromagnet 104, the upper radial sensor 107, the motor 121, and the lower radial electromagnet 105 are configured to prevent the gas sucked from the suction port 101 from intruding. , the electrical component composed of the lower radial sensor 108, the axial electromagnets 106A, 106B, the axial sensor 109, etc., and the stator column 122 (accommodating part) covers the surrounding electrical component, and the stator column The specified pressure is maintained by cleaning gas within 122 seconds.

於本實施形態之基底部129配設清洗埠115,通過該清洗埠115導入清洗氣體。導入之清洗氣體通過保護軸承120與轉子軸113間、馬達121之轉子與定子間、定子柱122與旋轉翼102之內周側圓筒部之間之間隙,向排氣口133送出。The base portion 129 of this embodiment is provided with a cleaning port 115, and the cleaning gas is introduced through the cleaning port 115. The introduced cleaning gas passes through the gap between the protective bearing 120 and the rotor shaft 113 , between the rotor and the stator of the motor 121 , and between the stator column 122 and the inner peripheral cylindrical portion of the rotor blade 102 , and is sent to the exhaust port 133 .

此處,渦輪分子泵100需要機種之指定、與基於個別調整之固有之參數(例如與機種對應之各種特性)之控制。為了儲存該控制參數,上述渦輪分子泵100於其本體內具備電子電路部(未圖示)。該電子電路部由EEP-ROM(Electrically Erasable Programmable-Read Only Memory:電氣可擦除可程式化唯讀記憶體)等半導體記憶體及用於其之存取之半導體元件等電子零件、其等之安裝用之基板等構成。該電子電路部收容於構成渦輪分子泵100之下部之基底部129之例如中央附近之未圖示之旋轉速度感測器之下部,由氣密性之底蓋145關閉。Here, the turbomolecular pump 100 requires specification of the model and control based on unique parameters (for example, various characteristics corresponding to the model) that are individually adjusted. In order to store the control parameters, the turbomolecular pump 100 is provided with an electronic circuit unit (not shown) in its body. The electronic circuit part consists of semiconductor memories such as EEP-ROM (Electrically Erasable Programmable-Read Only Memory) and electronic components such as semiconductor elements used for their access, etc. It is composed of base plate etc. for installation. The electronic circuit part is accommodated in the lower part of the base part 129 constituting the lower part of the turbomolecular pump 100 , such as the lower part of the rotation speed sensor (not shown) near the center, and is closed by an airtight bottom cover 145 .

然而,於半導體之製造步驟中,於導入至腔室之製程氣體中,有具有當其壓力高於指定值、或其溫度低於指定值時成為固體之性質者。於渦輪分子泵100內部,排出氣體之壓力於吸氣口101最低,於排氣口133最高。於製程氣體自吸氣口101向排氣口133移送之中途,當其壓力高於指定值或其溫度低於指定值時,製程氣體成為固體狀,附著並堆積於渦輪分子泵100內部。However, in the manufacturing steps of semiconductors, the process gas introduced into the chamber has the property of becoming solid when its pressure is higher than a specified value or its temperature is lower than a specified value. Inside the turbomolecular pump 100, the pressure of the exhaust gas is the lowest at the suction port 101 and the highest at the exhaust port 133. When the process gas is transferred from the suction port 101 to the exhaust port 133 , when its pressure is higher than a specified value or its temperature is lower than a specified value, the process gas becomes solid and adheres to and accumulates inside the turbomolecular pump 100 .

例如,自蒸氣壓曲線可知,於Al蝕刻裝置使用SiCl 4作為製程氣體之情形時,於低真空(760[torr]~10-2[torr])、且低溫(約20[℃])時,固體生成物(例如AlCl 3)析出,附著並堆積於渦輪分子泵100內部。藉此,若於渦輪分子泵100內部堆積製程氣體之析出物,則該堆積物成為使泵流路狹窄且渦輪分子泵100之性能降低之原因。且,上述生成物於排氣口133附近或附螺紋間隔物131附近之壓力較高之部分,處於容易凝固、附著之狀況。 For example, it can be seen from the vapor pressure curve that when the Al etching device uses SiCl 4 as the process gas, in low vacuum (760 [torr] ~ 10-2 [torr]) and low temperature (about 20 [℃]), The solid product (for example, AlCl 3 ) precipitates, adheres, and accumulates inside the turbomolecular pump 100 . Therefore, if the precipitates of the process gas are accumulated inside the turbomolecular pump 100 , the deposits may cause the pump flow path to become narrow and the performance of the turbomolecular pump 100 to decrease. Moreover, the above-mentioned product is in a state where it is easy to solidify and adhere to the high-pressure portion near the exhaust port 133 or the threaded spacer 131 .

因此,為了解決該問題,先前於基底部129等之外周捲繞未圖示之加熱器或環狀之水冷管,且例如於基底部129埋入未圖示之溫度感測器(例如熱敏電阻),基於該溫度感測器之信號,以將基底部129之溫度保持為恆定之高溫度(設定溫度)之方式,進行加熱器之加熱或水冷管之冷卻之控制(以下稱為TMS。TMS;Temperature Management System:溫度管理系統)。本實施形態之渦輪分子泵100將用於進行TMS之加熱器138(加熱機構)與溫度感測器139安裝於加熱器間隔物134。Therefore, in order to solve this problem, a heater (not shown) or an annular water-cooling tube is wound around the outer periphery of the base portion 129 and the like, and a temperature sensor (not shown) (such as a thermal sensor) is embedded in the base portion 129 . resistance), based on the signal of the temperature sensor, the heating of the heater or the cooling of the water-cooling tube is controlled in a manner to maintain the temperature of the base portion 129 at a constant high temperature (set temperature) (hereinafter referred to as TMS). TMS; Temperature Management System: temperature management system). In the turbomolecular pump 100 of this embodiment, a heater 138 (heating mechanism) and a temperature sensor 139 for performing TMS are mounted on the heater spacer 134 .

其次,關於如此構成之渦輪分子泵100,針對其上側徑向電磁鐵104、下側徑向電磁鐵105及軸向電磁鐵106A、106B進行激磁控制之放大電路150進行說明。該放大電路150之電路圖如圖2所示。Next, the amplification circuit 150 for controlling the excitation of the upper radial electromagnet 104, the lower radial electromagnet 105, and the axial electromagnets 106A and 106B of the turbomolecular pump 100 configured as above will be described. The circuit diagram of the amplifier circuit 150 is shown in Figure 2 .

於圖2中,構成上側徑向電磁鐵104等之電磁鐵繞組151之一端經由電晶體161連接於電源171之正極171a,又,其另一端經由電流檢測電路181及電晶體162連接於電源171之負極171b。且,電晶體161、162成為所謂功率MOSFET(Metal Oxide Semiconductor Field Effect Transistor:金屬氧化物半導體場效電晶體),具有於其源極-汲極間連接二極體之構造。In FIG. 2 , one end of the electromagnet winding 151 constituting the upper radial electromagnet 104 is connected to the positive electrode 171 a of the power supply 171 via the transistor 161 , and the other end is connected to the power supply 171 via the current detection circuit 181 and the transistor 162 . The negative electrode 171b. Furthermore, the transistors 161 and 162 are so-called power MOSFETs (Metal Oxide Semiconductor Field Effect Transistor), and have a structure in which a diode is connected between the source and the drain.

此時,電晶體161係該二極體之陰極端子161a連接於正極171a,且陽極端子161b與電磁鐵繞組151之一端連接。又,電晶體162係該二極體之陰極端子162a連接於電流檢測電路181,且陽極端子162b與負極171b連接。At this time, the cathode terminal 161a of the diode of the transistor 161 is connected to the anode 171a, and the anode terminal 161b is connected to one end of the electromagnet winding 151. In addition, in the transistor 162, the cathode terminal 162a of the diode is connected to the current detection circuit 181, and the anode terminal 162b is connected to the negative electrode 171b.

另一方面,電流再生用之二極體165係其陰極端子165a連接於電磁鐵繞組151之一端,且其陽極端子165b連接於負極171b。又,與此同樣,電流再生用之二極體166係其陰極端子166a連接於正極171a,且其陽極端子166b經由電流檢測電路181連接於電磁鐵繞組151之另一端。且,電流檢測電路181係例如由霍爾感測器式電流感測器或電阻元件構成。On the other hand, the diode 165 for current regeneration has its cathode terminal 165a connected to one end of the electromagnet winding 151, and its anode terminal 165b connected to the negative electrode 171b. Similarly, the cathode terminal 166a of the diode 166 for current regeneration is connected to the anode 171a, and the anode terminal 166b is connected to the other end of the electromagnet winding 151 via the current detection circuit 181. Furthermore, the current detection circuit 181 is composed of, for example, a Hall sensor type current sensor or a resistive element.

如以上構成之放大電路150係與一個電磁鐵對應者。因此,於磁性軸承以5軸控制且合計有10個電磁鐵104、105、106A、106B之情形時,就電磁鐵之各者構成同樣之放大電路150,相對於電源171並聯連接10個放大電路150。The amplifier circuit 150 configured as above corresponds to one electromagnet. Therefore, when the magnetic bearing is controlled in five axes and there are ten electromagnets 104, 105, 106A, and 106B in total, the same amplifier circuit 150 is configured for each of the electromagnets, and the ten amplifier circuits are connected in parallel to the power supply 171 150.

再者,放大控制電路191例如由上述控制裝置之未圖示之數位、信號、處理部(以下稱為DSP部,DSP:Digital Signal Processing)構成,該放大控制電路191切換電晶體161、162之接通(on)/斷開(off)。Furthermore, the amplification control circuit 191 is composed of, for example, a digital, signal, and processing section (hereinafter referred to as a DSP section, Digital Signal Processing) (not shown) of the above-mentioned control device, and the amplification control circuit 191 switches between the transistors 161 and 162. On/off.

放大控制電路191將電流檢測電路181檢測出之電流值(將反映該電流值之信號稱為電流檢測信號191c)與指定電流指令值進行比較。且,基於該比較結果,決定於PWM(Pulse Width Modulation:脈衝寬度調變)控制之1個週期即控制週期Ts內產生之脈衝寬度之大小(脈衝寬度時間Tp1、Tp2)。其結果,自放大控制電路191,將具有該脈衝寬度之閘極驅動信號191a、191b輸出至電晶體161、162之閘極端子。The amplification control circuit 191 compares the current value detected by the current detection circuit 181 (the signal reflecting the current value is referred to as the current detection signal 191c) with the designated current command value. And, based on the comparison result, it is determined by the size of the pulse width (pulse width time Tp1, Tp2) generated within one cycle of PWM (Pulse Width Modulation) control, that is, the control cycle Ts. As a result, the self-amplification control circuit 191 outputs the gate drive signals 191a and 191b having the pulse width to the gate terminals of the transistors 161 and 162.

另,於旋轉體103之旋轉速度之加速運轉中通過共振點時、或於定速運轉中產生外部干擾時等,需要以高速且強力進行旋轉體103之位置控制。因此,為了可使向電磁鐵繞組151流動之電流急遽增加(或減少),作為電源171例如使用50 V左右之高電壓。又,為了電源171之穩定化,於電源171之正極171a與負極171b之間連接有通常電容器(省略圖示)。In addition, when the rotational speed of the rotating body 103 passes through a resonance point during accelerating operation, or when external interference occurs during constant speed operation, the position of the rotating body 103 needs to be controlled at high speed and with great force. Therefore, in order to rapidly increase (or decrease) the current flowing to the electromagnet winding 151, a high voltage of about 50 V is used as the power supply 171, for example. In order to stabilize the power supply 171, a normal capacitor (not shown) is connected between the positive electrode 171a and the negative electrode 171b of the power supply 171.

於該構成中,當電晶體161、162之兩者均接通時,向電磁鐵繞組151流動之電流(以下稱為電磁鐵電流iL)增加,當兩者均斷開時,電磁鐵電流iL減少。In this configuration, when both transistors 161 and 162 are turned on, the current flowing to the electromagnet winding 151 (hereinafter referred to as electromagnet current iL) increases, and when both are turned off, the electromagnet current iL Reduce.

又,當使電晶體161、162之一者接通而另一者斷開時,保持所謂飛輪電流。且,藉由如此於放大電路150流通飛輪電流,可減少放大電路150中之磁滯損,可將作為電路整體之消耗電力抑制得較低。又,藉由如此控制電晶體161、162,可減少於渦輪分子泵100產生之高諧波等之高頻雜訊。進而,藉由以電流檢測電路181測定該飛輪電流,可檢測流動於電磁鐵繞組151之電磁鐵電流iL。Furthermore, when one of the transistors 161 and 162 is turned on and the other is turned off, a so-called flywheel current is maintained. Furthermore, by flowing the flywheel current through the amplifier circuit 150 in this way, the hysteresis loss in the amplifier circuit 150 can be reduced, and the power consumption of the entire circuit can be suppressed to a low level. In addition, by controlling the transistors 161 and 162 in this manner, high-frequency noise such as high harmonics generated by the turbomolecular pump 100 can be reduced. Furthermore, by measuring the flywheel current with the current detection circuit 181, the electromagnet current iL flowing in the electromagnet winding 151 can be detected.

即,於檢測出之電流值小於電流指令值之情形時,如圖3所示般於控制週期Ts(例如100 μs)中使電晶體161、162之兩者接通1次,相當於脈衝寬度時間Tp1之時間量。因此,該期間中之電磁鐵電流iL自正極171a向負極171b,朝向可經由電晶體161、162流動之電流值iLmax(未圖示)增加。That is, when the detected current value is smaller than the current command value, both transistors 161 and 162 are turned on once in the control period Ts (for example, 100 μs), which is equivalent to the pulse width, as shown in FIG. 3 The amount of time of time Tp1. Therefore, the electromagnet current iL during this period increases from the positive electrode 171 a to the negative electrode 171 b toward the current value iLmax (not shown) that can flow through the transistors 161 and 162 .

另一方面,於檢測出之電流值大於電流指令值之情形時,如圖4所示般於控制週期Ts中使電晶體161、162之兩者斷開1次,相當於脈衝寬度時間Tp2之時間量。因此,該期間中之電磁鐵電流iL自負極171b向正極171a,朝著可經由二極體165、166再生之電流值iLmin(未圖示)減少。On the other hand, when the detected current value is greater than the current command value, both transistors 161 and 162 are turned off once in the control period Ts as shown in FIG. 4, which is equivalent to the pulse width time Tp2. amount of time. Therefore, the electromagnet current iL during this period decreases from the negative pole 171b toward the positive pole 171a toward a current value iLmin (not shown) that can be regenerated through the diodes 165 and 166.

且,於任一情形時,於經過脈衝寬度時間Tp1、Tp2後,使電晶體161、162中之任1個接通。因此,該期間中,於放大電路150保持飛輪電流。In either case, after the pulse width times Tp1 and Tp2 have elapsed, either one of the transistors 161 and 162 is turned on. Therefore, during this period, the flywheel current is maintained in the amplifier circuit 150 .

其次,就上述之加熱器間隔物134、隔板135、密封構件136、絕熱間隔物137詳細進行說明。Next, the above-mentioned heater spacer 134, partition plate 135, sealing member 136, and thermal insulation spacer 137 will be described in detail.

加熱器間隔物134係如圖1、圖5、圖6所示般整體成為環狀之構件,由鋁、銅、不鏽鋼、鐵或以該等金屬為成分之合金等之金屬構成。加熱器間隔物134作為一例,為了確保高溫時之強度而較佳由強度較高之材料構成,於本實施形態中,考慮該點,由不鏽鋼構成。如圖示般於加熱器間隔物134之上部安裝有附螺紋間隔物131。又,於加熱器間隔物134之側面,設置有用於安裝加熱器138與溫度感測器139之安裝孔,加熱器138與溫度感測器139保持於加熱器間隔物134。The heater spacer 134 is an integral ring-shaped member as shown in FIGS. 1 , 5 , and 6 , and is made of metal such as aluminum, copper, stainless steel, iron, or alloys containing these metals. For example, the heater spacer 134 is preferably made of a material with high strength in order to ensure strength at high temperatures. In this embodiment, considering this point, the heater spacer 134 is made of stainless steel. As shown in the figure, a threaded spacer 131 is installed on the upper part of the heater spacer 134. In addition, mounting holes for installing the heater 138 and the temperature sensor 139 are provided on the side of the heater spacer 134 , and the heater 138 and the temperature sensor 139 are held on the heater spacer 134 .

又,如圖5所示,加熱器間隔物134於徑向內側之下部,具備於水平方向延伸之平坦之金屬接觸面134a、自金屬接觸面134a之徑向外側朝向垂直方向下方延伸之徑向定位面134b、及內徑大於徑向定位面134b且位於徑向定位面134b之下方之退避面134c。再者,於加熱器間隔物134之下表面設置安裝有密封構件136之環狀凹部134d。另,如圖所示,隔板135係安裝於加熱器間隔物134之金屬接觸面134a、徑向定位面134b、退避面134c及環狀凹部134d之部位者,於以下之說明中,將該等部位稱為加熱器間隔物134之安裝面。於金屬接觸面134a設置有於周向空開間隔配置之複數個內螺紋部134e。In addition, as shown in FIG. 5 , the heater spacer 134 has a flat metal contact surface 134 a extending in the horizontal direction at the radially inner lower portion, and a radial direction extending downward in the vertical direction from the radially outer side of the metal contact surface 134 a. The positioning surface 134b and the escape surface 134c whose inner diameter is larger than the radial positioning surface 134b and located below the radial positioning surface 134b. Furthermore, an annular recess 134d to which the sealing member 136 is mounted is provided on the lower surface of the heater spacer 134. In addition, as shown in the figure, the partition plate 135 is installed on the metal contact surface 134a, the radial positioning surface 134b, the retreat surface 134c and the annular recess 134d of the heater spacer 134. In the following description, this The other parts are called the mounting surfaces of the heater spacer 134 . A plurality of internal thread portions 134e arranged at intervals in the circumferential direction are provided on the metal contact surface 134a.

再者,加熱器間隔物134如圖6(a)、(b)所示,具備於徑向貫通加熱器間隔物134之圓形之貫通孔134f。貫通孔134f於組裝為渦輪分子泵100時連通於排氣口133。又,貫通孔134f設置於相對於加熱器間隔物134之軸向(沿中心軸CA之方向),與金屬接觸面134a、徑向定位面134b及退避面134c之部位重合之位置。Furthermore, as shown in FIGS. 6(a) and (b) , the heater spacer 134 is provided with a circular through hole 134f that penetrates the heater spacer 134 in the radial direction. The through hole 134f communicates with the exhaust port 133 when the turbomolecular pump 100 is assembled. In addition, the through hole 134f is provided at a position that overlaps with the metal contact surface 134a, the radial positioning surface 134b, and the retreat surface 134c with respect to the axial direction of the heater spacer 134 (direction along the central axis CA).

隔板135係如圖1、圖5、圖6所示般整體成為環狀之構件,由鋁、銅、不鏽鋼、鐵或以該等金屬為成分之合金等之金屬構成。隔板135較佳為如後述般由來自安裝於加熱器間隔物134之加熱器138之熱加熱,於本實施形態中,考慮該點,由熱傳導率高於加熱器間隔物134之材質(例如鋁)構成隔板135。The partition 135 is an integral ring-shaped member as shown in FIGS. 1 , 5 , and 6 , and is made of metal such as aluminum, copper, stainless steel, iron, or alloys containing these metals. The partition 135 is preferably heated by heat from the heater 138 installed on the heater spacer 134 as will be described later. In this embodiment, considering this point, it is made of a material with a higher thermal conductivity than the heater spacer 134 (for example, Aluminum) forms the partition 135.

又,本實施形態之隔板135具備圓環板狀之環狀壁部135a。於環狀壁部135a之內緣部設置有朝向上方延伸之圓筒狀之內側周壁部135b,於內側周壁部135b之上端部設置有朝向徑向外側突出之折回部135c(於圖6中省略圖示)。又,隔板135具備自位於較隔板135之外緣部135d更徑向內側之部位,朝向上方延伸之圓筒狀之外側周壁部135e。外側周壁部135e之上表面係於水平方向延伸之平坦面。以下,將外側周壁部135e之上表面稱為金屬接觸面135f。另,隔板135係如圖示般安裝於加熱器間隔物134之外緣部135d、外側周壁部135e及金屬接觸面135f之部位者,於以下之說明中,將外緣部135d、外側周壁部135e及金屬接觸面135f之部位稱為隔板135之安裝面。In addition, the partition plate 135 of this embodiment is provided with an annular wall portion 135a in the shape of an annular plate. A cylindrical inner peripheral wall portion 135b extending upward is provided at the inner edge of the annular wall portion 135a, and a folded portion 135c protruding toward the radially outer side is provided at the upper end of the inner peripheral wall portion 135b (omitted in FIG. 6 icon). Furthermore, the partition plate 135 has a cylindrical outer peripheral wall portion 135e extending upward from a portion located radially inward of the outer edge portion 135d of the partition plate 135 . The upper surface of the outer peripheral wall portion 135e is a flat surface extending in the horizontal direction. Hereinafter, the upper surface of the outer peripheral wall portion 135e will be referred to as the metal contact surface 135f. In addition, the partition 135 is installed at the outer edge portion 135d, the outer peripheral wall portion 135e, and the metal contact surface 135f of the heater partition 134 as shown in the figure. In the following description, the outer edge portion 135d, the outer peripheral wall The portion 135e and the metal contact surface 135f are called the mounting surface of the partition 135.

於外側周壁部135e設置有於周向空開間隔配置,並於上下方向貫通外側周壁部135e之複數個螺栓通孔135g。螺栓通孔135g設置於與內螺紋部134e對應之位置。且,於將加熱器間隔物134之安裝面與隔板135之安裝面相對之狀態下,藉由將螺栓140插入至螺栓通孔135g並將其螺合於內螺紋部134e,可將隔板135安裝於加熱器間隔物134。The outer peripheral wall portion 135e is provided with a plurality of bolt through holes 135g that are spaced apart in the circumferential direction and penetrate the outer peripheral wall portion 135e in the up and down direction. The bolt through hole 135g is provided at a position corresponding to the internal thread portion 134e. Furthermore, with the mounting surface of the heater spacer 134 facing the mounting surface of the partition plate 135, the bolt 140 is inserted into the bolt through hole 135g and screwed into the internal thread portion 134e, so that the partition plate can be removed. 135 is installed on the heater spacer 134.

再者如圖6(c)所示,隔板135具備於徑向貫穿外側周壁部135e之半圓狀之缺口部135h。缺口部135h如圖6(a)所示,於將隔板135安裝於加熱器間隔物134上之狀態下,與貫通孔134f組合而形成一個孔。Furthermore, as shown in FIG. 6(c) , the partition plate 135 is provided with a semicircular notch portion 135h that penetrates the outer peripheral wall portion 135e in the radial direction. As shown in FIG. 6( a ), the notch 135 h is combined with the through hole 134 f to form a single hole in a state where the partition plate 135 is attached to the heater spacer 134 .

密封構件136以藉由具有彈性之材料(丁腈橡膠、氟橡膠、矽橡膠等)成為環狀之方式形成,具備於密接於構件時抑制氣體自緊貼之構件與密封構件136之間侵入之功能。本實施形態之密封構件136為O形環。The sealing member 136 is formed in an annular shape by an elastic material (nitrile rubber, fluorine rubber, silicone rubber, etc.) and has the function of suppressing the intrusion of gas from between the adhering member and the sealing member 136 when in close contact with the member. Function. The sealing member 136 of this embodiment is an O-ring.

絕熱間隔物137係整體成為環狀之構件,由熱傳導率低(熱不易傳遞)之材料構成。絕熱間隔物137之構成材料例如為不鏽鋼。如圖所示,絕熱間隔物137介存於基底部129與加熱器間隔物134之間,基底部129與加熱器間隔物134絕熱。The insulating spacer 137 is a ring-shaped member as a whole and is made of a material with low thermal conductivity (heat is not easily transferred). The thermal insulation spacer 137 is made of, for example, stainless steel. As shown, an insulating spacer 137 is interposed between the base portion 129 and the heater spacer 134 , and the base portion 129 is insulated from the heater spacer 134 .

於藉由該種構件構成之渦輪分子泵100中,於以螺栓140將隔板135安裝於加熱器間隔物134時,密封構件136密接於環狀凹部134d之下表面與外緣部135d之上表面。又,於將隔板135安裝於加熱器間隔物134時,因徑向定位面134b與外側周壁部135e之上部外周面接觸,且金屬接觸面134a與金屬接觸面135f接觸,故隔板135相對於加熱器間隔物134於徑向定位,且亦於上下方向定位。另,因位於徑向定位面134b下方之退避面134c為較徑向定位面134b之內徑更大徑,故於將隔板135安裝於加熱器間隔物134時,基本不接觸外側周壁部135e之外周面。即,於形成徑向定位面134b與退避面134c時,因僅徑向定位面134b為需要加工精度者即可,故可抑制加熱器間隔物134之加工成本。In the turbomolecular pump 100 composed of such a member, when the partition plate 135 is installed on the heater spacer 134 with the bolts 140, the sealing member 136 is in close contact with the lower surface of the annular recessed portion 134d and the outer edge portion 135d. surface. Furthermore, when the partition plate 135 is installed on the heater spacer 134, the radial positioning surface 134b is in contact with the upper peripheral surface of the outer peripheral wall portion 135e, and the metal contact surface 134a is in contact with the metal contact surface 135f. Therefore, the partition plate 135 faces each other. The heater spacer 134 is positioned radially, and also positioned in the up-down direction. In addition, since the retreat surface 134c located below the radial positioning surface 134b has a larger diameter than the inner diameter of the radial positioning surface 134b, when the partition plate 135 is installed on the heater spacer 134, it basically does not contact the outer peripheral wall portion 135e. outer surface. That is, when forming the radial positioning surface 134b and the retreat surface 134c, only the radial positioning surface 134b requires processing accuracy, so the processing cost of the heater spacer 134 can be suppressed.

且,於將隔板135安裝於加熱器間隔物134時,於附螺紋間隔物131與圓筒部102d之下方,形成由附螺紋間隔物131、加熱器間隔物134及隔板135劃定,且通向附螺紋間隔物131與圓筒部102d之間之泵流路,且連通於貫通孔134f之環狀流路。又,隔板135之折回部135c位於圓筒部102d之正下方,於折回部135c之上表面與圓筒部102d之下表面之間設置間隙。該間隙縮窄至於旋轉體103旋轉時圓筒部102d與折回部135c不接觸,且於上述環狀流路流動之氣體不通過該間隙流入定子柱122之程度,作為非接觸密封構造發揮作用。Furthermore, when the partition plate 135 is attached to the heater spacer 134, a demarcation line formed by the threaded spacer 131, the heater spacer 134 and the partition plate 135 is formed below the threaded spacer 131 and the cylindrical portion 102d. And it leads to the pump flow path between the threaded spacer 131 and the cylindrical part 102d, and is connected to the annular flow path of the through hole 134f. In addition, the folded portion 135c of the partition 135 is located directly below the cylindrical portion 102d, and a gap is provided between the upper surface of the folded portion 135c and the lower surface of the cylindrical portion 102d. The gap is narrowed to such an extent that the cylindrical portion 102d and the folded portion 135c do not contact each other when the rotating body 103 rotates, and the gas flowing in the annular flow path does not flow into the stator column 122 through the gap, thereby functioning as a non-contact sealing structure.

又,以螺栓140安裝於加熱器間隔物134之隔板135,與加熱器間隔物134熱連接。因此,來自加熱器138之熱自加熱器間隔物134向隔板135充分傳遞,因而可有效加熱隔板135。另,雖內側周壁部135b自隔板135之安裝面分離,但因隔板135由熱傳導率較高之材料構成,故亦藉由來自加熱器138之熱加熱內側周壁部135b。如此,因加熱器間隔物134與隔板135遍及其整個區域而被充分加熱,故可抑制於上述環狀流路中因排出氣體而引起之副生成物之析出。又,外側周壁部135e如圖示般朝向上方較長地延伸,於將隔板135安裝於加熱器間隔物134時,其上端部位於接近加熱器138之位置。即,於使用具備此種外側周壁部135e之隔板135之情形時,可謂容易受到來自加熱器138之熱而易於加熱之構成。In addition, the partition plate 135 is mounted on the heater spacer 134 with bolts 140 and is thermally connected to the heater spacer 134 . Therefore, the heat from the heater 138 is sufficiently transferred from the heater spacer 134 to the partition plate 135, so that the partition plate 135 can be effectively heated. In addition, although the inner peripheral wall portion 135b is separated from the mounting surface of the partition plate 135, since the partition plate 135 is made of a material with high thermal conductivity, the inner peripheral wall portion 135b is also heated by the heat from the heater 138. In this way, since the heater spacer 134 and the partition plate 135 are fully heated throughout their entire areas, precipitation of by-products caused by the exhaust gas in the annular flow path can be suppressed. In addition, the outer peripheral wall portion 135e extends long upward as shown in the figure, and when the partition plate 135 is attached to the heater spacer 134, its upper end is located close to the heater 138. That is, when the partition plate 135 having such an outer peripheral wall portion 135e is used, it can be said that the partition plate 135 is easily heated by the heat from the heater 138.

另,因上述環狀流路由加熱器間隔物134與隔板135形成,故擔心流動於該環狀流路之排出氣體例如因加熱器間隔物134與隔板135之加工狀態或安裝狀態,通過加熱器間隔物134之安裝面與隔板135之安裝面之間而朝向基底部129或絕熱間隔物137漏出,致使副生成物堆積於基底部129等。但,本實施形態之渦輪分子泵100於將隔板135安裝於加熱器間隔物134時,因密封構件136密接於環狀凹部134d之下表面與外緣部135d之上表面,故可防止排出氣體之漏出。In addition, since the annular flow path is formed by the heater spacer 134 and the partition plate 135, there is a concern that the exhaust gas flowing in the annular flow path may pass through due to the processing or installation conditions of the heater spacer 134 and the partition plate 135. Between the mounting surface of the heater spacer 134 and the mounting surface of the partition plate 135, leakage occurs toward the base portion 129 or the insulating spacer 137, causing by-products to accumulate on the base portion 129 and the like. However, in the turbomolecular pump 100 of this embodiment, when the partition plate 135 is installed on the heater spacer 134, the sealing member 136 is in close contact with the lower surface of the annular recessed portion 134d and the upper surface of the outer edge portion 135d, so that discharge can be prevented. Gas leakage.

接著,一面參照圖7~圖9,一面就本發明之真空泵之第二實施形態之渦輪分子泵200進行說明。另,渦輪分子泵200基本代替上述渦輪分子泵100之加熱器間隔物134與隔板135而具備加熱器間隔物234與隔板235。因此,於以下,就加熱器間隔物234與隔板235詳細進行說明,對其他則於圖式附設同一符號並省略詳細說明。Next, a turbomolecular pump 200 according to a second embodiment of the vacuum pump of the present invention will be described with reference to FIGS. 7 to 9 . In addition, the turbo molecular pump 200 basically includes a heater spacer 234 and a partition plate 235 in place of the heater spacer 134 and the partition plate 135 of the turbo molecular pump 100 described above. Therefore, in the following, the heater spacer 234 and the partition plate 235 will be described in detail, and the other parts will be assigned the same reference numerals in the drawings and detailed descriptions will be omitted.

加熱器間隔物234係如圖7~圖9所示般整體成為環狀之構件,由鋁、銅、不鏽鋼、鐵或以該等金屬為成分之合金等之金屬構成。加熱器間隔物234作為一例,為了確保高溫時之強度而較佳由強度高之材料構成,於本實施形態中,考慮該點,由不鏽鋼構成。於加熱器間隔物234之上部,如圖7所示般安裝有附螺紋間隔物131。又,於加熱器間隔物234之側面,設置有用於安裝加熱器138與溫度感測器139之安裝孔,加熱器138與溫度感測器139保持於加熱器間隔物234。The heater spacer 234 is an annular member as a whole as shown in FIGS. 7 to 9 , and is made of metal such as aluminum, copper, stainless steel, iron, or alloys containing these metals. For example, the heater spacer 234 is preferably made of a material with high strength in order to ensure strength at high temperatures. In this embodiment, considering this point, the heater spacer 234 is made of stainless steel. A threaded spacer 131 is installed on the upper part of the heater spacer 234 as shown in FIG. 7 . In addition, mounting holes for installing the heater 138 and the temperature sensor 139 are provided on the side of the heater spacer 234 , and the heater 138 and the temperature sensor 139 are held in the heater spacer 234 .

又,如圖8所示,加熱器間隔物234於其下部具備於水平方向延伸之平坦之金屬接觸面234a。另,該金屬接觸面234a避開後述之內螺紋部234e,且以包圍之方式存在。於金屬接觸面234a之徑向內側,設置有朝向垂直方向上方延伸之徑向定位面234b。又,於金屬接觸面234a設置安裝有密封構件136之環狀凹部234d。如圖所示,隔板235係安裝於加熱器間隔物234之金屬接觸面234a、徑向定位面234b、及環狀凹部234d之部位者,於以下之說明中,將該等部位稱為加熱器間隔物234之安裝面。又,於金屬接觸面234a設置有於周向空開間隔配置之複數個內螺紋部234e。Furthermore, as shown in FIG. 8 , the heater spacer 234 has a flat metal contact surface 234a extending in the horizontal direction at its lower portion. In addition, the metal contact surface 234a avoids the internal thread portion 234e described later and exists in a surrounding manner. On the radial inner side of the metal contact surface 234a, a radial positioning surface 234b extending upward in the vertical direction is provided. Furthermore, an annular recessed portion 234d to which the sealing member 136 is attached is provided in the metal contact surface 234a. As shown in the figure, the partition plate 235 is installed at the metal contact surface 234a, the radial positioning surface 234b, and the annular recess 234d of the heater spacer 234. In the following description, these parts are called heating. The mounting surface of the device spacer 234. In addition, the metal contact surface 234a is provided with a plurality of internal thread portions 234e spaced apart in the circumferential direction.

再者,加熱器間隔物234如圖9所示,具備於徑向貫通加熱器間隔物234之圓形之貫通孔234f。貫通孔234f於組裝為渦輪分子泵200時連通於排氣口133。又,貫通孔234f設置於相對於加熱器間隔物234之軸向(沿中心軸CA之方向),自金屬接觸面234a、徑向定位面234b及環狀凹部234d之部位偏離之位置(較金屬接觸面234a等更上方之位置)。Furthermore, as shown in FIG. 9 , the heater spacer 234 is provided with a circular through hole 234f that penetrates the heater spacer 234 in the radial direction. The through hole 234f communicates with the exhaust port 133 when the turbomolecular pump 200 is assembled. In addition, the through hole 234f is provided at a position offset from the metal contact surface 234a, the radial positioning surface 234b, and the annular recess 234d relative to the axial direction of the heater spacer 234 (in the direction along the central axis CA) (compared to the metal contact surface 234a and the annular recessed portion 234d). Contact surface 234a and other upper positions).

隔板235係如圖7~圖9所示般整體成為環狀之構件,由鋁、銅、不鏽鋼、鐵或以該等金屬為成分之合金等之金屬構成。隔板235與上述隔板135同樣,較佳為由來自加熱器138之熱加熱,於本實施形態中考慮該點,由熱傳導率高於加熱器間隔物234之材質(例如鋁)構成隔板235。The partition plate 235 is an integral ring-shaped member as shown in FIGS. 7 to 9 , and is made of metal such as aluminum, copper, stainless steel, iron, or alloys containing these metals. The partition 235 is preferably heated by heat from the heater 138 , similarly to the partition 135 described above. In this embodiment, considering this point, the partition 235 is made of a material (for example, aluminum) with a higher thermal conductivity than the heater partition 234 . 235.

又,隔板235具備圓環板狀之環狀壁部235a。於環狀壁部235a之內緣部設置有朝向上方延伸之圓筒狀之內側周壁部235b,於內側周壁部235b之上端部設置有朝向徑向外側突出之折回部235c。又,隔板235具備位於環狀壁部235a之徑向外側之外緣部235d。外緣部235d之上表面位於較環狀壁部235a之上表面更下方,於外緣部235d與環狀壁部235a之間,設置有於垂直方向延伸之階差部235e。又,外緣部235d之上表面係於水平方向延伸之平坦面。以下,將外緣部235d上表面稱為金屬接觸面235f。另,隔板235係如圖示般安裝於自加熱器間隔物234之金屬接觸面235f至階差部235e之部位者,於以下之說明中,將自金屬接觸面235f至階差部235e之部位稱為隔板235之安裝面。另,該金屬接觸面235f避開後述之螺栓通孔235g,且以包圍之方式存在。Furthermore, the partition plate 235 is provided with an annular wall portion 235a in the shape of an annular plate. A cylindrical inner peripheral wall portion 235b extending upward is provided at the inner edge of the annular wall portion 235a, and a folded portion 235c protruding toward the radially outer side is provided at the upper end of the inner peripheral wall portion 235b. Furthermore, the partition plate 235 has an outer edge portion 235d located on the radially outer side of the annular wall portion 235a. The upper surface of the outer edge portion 235d is located lower than the upper surface of the annular wall portion 235a, and a step portion 235e extending in the vertical direction is provided between the outer edge portion 235d and the annular wall portion 235a. In addition, the upper surface of the outer edge portion 235d is a flat surface extending in the horizontal direction. Hereinafter, the upper surface of the outer edge portion 235d will be referred to as the metal contact surface 235f. In addition, the partition 235 is installed from the metal contact surface 235f of the heater spacer 234 to the step portion 235e as shown in the figure. In the following description, the space from the metal contact surface 235f to the step portion 235e will be The location is called the mounting surface of the partition 235. In addition, the metal contact surface 235f avoids the bolt through hole 235g described later and exists in a surrounding manner.

於外緣部235d設置有於周向空開間隔配置,並於上下方向貫通外緣部235d之複數個螺栓通孔235g。螺栓通孔235g係設置於與內螺紋部234e對應之位置。且,於使加熱器間隔物234之安裝面與隔板235之安裝面相對之狀態下,藉由將螺栓140插入至螺栓通孔235g並將其螺合於內螺紋部234e,而可將隔板235安裝於加熱器間隔物234。The outer edge portion 235d is provided with a plurality of bolt through holes 235g that are spaced apart in the circumferential direction and penetrate the outer edge portion 235d in the up and down direction. The bolt through hole 235g is provided at a position corresponding to the internal thread portion 234e. In addition, with the mounting surface of the heater spacer 234 facing the mounting surface of the partition plate 235, the bolt 140 is inserted into the bolt through hole 235g and screwed into the internal thread portion 234e, so that the partition can be connected. Plate 235 is mounted to heater spacer 234.

於藉由如此構件而構成之渦輪分子泵200中,於以螺栓140將隔板235安裝於加熱器間隔物234時,密封構件136係密接於環狀凹部234d之下表面與外緣部235d之上表面。又,於將隔板235安裝於加熱器間隔物234時,因徑向定位面234b與階差部235e之側面接觸,且金屬接觸面234a與金屬接觸面235f接觸,故隔板235相對於加熱器間隔物234於徑向定位,且亦於上下方向定位。In the turbomolecular pump 200 constructed as above, when the partition plate 235 is mounted to the heater spacer 234 with the bolts 140, the sealing member 136 is in close contact with the lower surface of the annular recessed portion 234d and the outer edge portion 235d. upper surface. In addition, when the partition plate 235 is installed on the heater spacer 234, the radial positioning surface 234b is in contact with the side surface of the step portion 235e, and the metal contact surface 234a is in contact with the metal contact surface 235f. Therefore, the partition plate 235 is in contact with the heater. The spacers 234 are positioned radially and also in the up-and-down direction.

且,於將隔板235安裝於加熱器間隔物234時,於附螺紋間隔物131與圓筒部102d之下方,形成以附螺紋間隔物131、加熱器間隔物234及隔板235劃定,通向附螺紋間隔物131與圓筒部102d之間之泵流路,且連通於貫通孔234f之環狀之流路。又,隔板235之折回部235c位於圓筒部102d之正下方,於折回部235c之上表面與圓筒部102d之下表面之間設置間隙。另,該間隙與圖5所示之設置於折回部135c與圓筒部102d之間之間隙同樣,作為非接觸密封構造發揮作用。Furthermore, when the partition plate 235 is attached to the heater spacer 234, a demarcation line formed by the threaded spacer 131, the heater spacer 234 and the partition plate 235 is formed below the threaded spacer 131 and the cylindrical portion 102d. An annular flow path that leads to the pump flow path between the threaded spacer 131 and the cylindrical portion 102d and is connected to the through hole 234f. In addition, the folded portion 235c of the partition 235 is located directly below the cylindrical portion 102d, and a gap is provided between the upper surface of the folded portion 235c and the lower surface of the cylindrical portion 102d. In addition, this gap functions as a non-contact sealing structure similarly to the gap provided between the folded portion 135c and the cylindrical portion 102d shown in FIG. 5 .

以螺栓140安裝於加熱器間隔物234之隔板235,與加熱器間隔物234熱連接。又,隔板235由熱傳導率較高之材料構成。因此,與隔板235之安裝面有距離之內側周壁部235b,亦藉由來自安裝於加熱器間隔物234之加熱器138之熱而加熱。如此,因加熱器間隔物234與隔板235係遍及其整個範圍被充分加熱,故於上述環狀流路中可抑制來自排出氣體之副生成物之析出。The partition plate 235 is mounted on the heater spacer 234 with bolts 140 and is thermally connected to the heater spacer 234 . In addition, the partition 235 is made of a material with high thermal conductivity. Therefore, the inner peripheral wall portion 235b that is distanced from the mounting surface of the partition plate 235 is also heated by the heat from the heater 138 mounted on the heater spacer 234. In this way, since the heater spacer 234 and the partition plate 235 are fully heated throughout their entire ranges, precipitation of by-products from the exhaust gas can be suppressed in the annular flow path.

上述環狀流路係藉由加熱器間隔物與隔板235形成。因此,擔心因加熱器間隔物234與隔板235之加工狀態或安裝狀態,造成流動於環狀流路之排出氣體通過加熱器間隔物234之安裝面與隔板235之安裝面之間,朝向基底部129或絕熱間隔物137漏出,致使副生成物堆積於基底部129等。但,本實施形態之渦輪分子泵200於將隔板235安裝於加熱器間隔物234時,因密封構件136密接於環狀凹部234d之下表面與外緣部235d之上表面,故可防止排出氣體之漏出。又,於本實施形態中,金屬接觸面234a與金屬接觸面235f於密封構件136之上游側接觸,抑制排出氣體之通過。即,因可藉由金屬接觸面234a與金屬接觸面235f充分抑制排出氣體對密封構件136之暴露量,故即使於排出與密封構件136之劣化相關之氣體之情形時,亦可維持密封構件136之性能。尤其於本實施形態中,因藉由螺栓140緊固加熱器間隔物234與隔板235之位置係設置有金屬接觸面234a與金屬接觸面235f之位置,故金屬接觸面234a與金屬接觸面235f更緊密接觸。又,因金屬接觸面234a與金屬接觸面235f以包圍內螺紋部234e與螺栓通孔235g之方式存在,故亦可防止排出氣體通過螺栓通孔235g漏出。因此,可進一步抑制排出氣體引起之密封構件136之劣化。The above-mentioned annular flow path is formed by the heater spacer and the partition plate 235. Therefore, there is a concern that due to the processing or installation conditions of the heater spacer 234 and the partition plate 235, the exhaust gas flowing in the annular flow path passes between the mounting surface of the heater spacer 234 and the mounting surface of the partition plate 235, and is directed toward The base portion 129 or the thermal insulation spacer 137 leaks, causing by-products to accumulate on the base portion 129 and the like. However, in the turbomolecular pump 200 of this embodiment, when the partition plate 235 is installed on the heater spacer 234, the sealing member 136 is in close contact with the lower surface of the annular recessed portion 234d and the upper surface of the outer edge portion 235d, so that discharge can be prevented. Gas leakage. Furthermore, in this embodiment, the metal contact surface 234a and the metal contact surface 235f are in contact with each other on the upstream side of the sealing member 136, thereby suppressing the passage of exhaust gas. That is, since the amount of exposure of the exhaust gas to the sealing member 136 can be sufficiently suppressed by the metal contact surface 234a and the metal contact surface 235f, the sealing member 136 can be maintained even when the gas related to the deterioration of the sealing member 136 is discharged. performance. Especially in this embodiment, since the position where the heater spacer 234 and the partition plate 235 are fastened by the bolts 140 is the position where the metal contact surface 234a and the metal contact surface 235f are provided, the metal contact surface 234a and the metal contact surface 235f are Closer contact. In addition, since the metal contact surface 234a and the metal contact surface 235f exist to surround the internal thread portion 234e and the bolt through hole 235g, exhaust gas can also be prevented from leaking through the bolt through hole 235g. Therefore, deterioration of the sealing member 136 caused by the exhaust gas can be further suppressed.

然而,於上述渦輪分子泵100中,連通於排氣口133之貫通孔134f,如圖6(a)、(b)所示,設置於與金屬接觸面134a、徑向定位面134b及退避面134c之部位重合之位置。即,因通過貫通孔134f自排氣口133排出之排出氣體於加熱器間隔物134與隔板135之安裝面附近流動,故有排出氣體侵入至安裝面之虞。相對於此,渦輪分子泵200之貫通孔234f如圖9(a)、(b)所示,設置於自金屬接觸面234a、徑向定位面234b及環狀凹部234d之部位偏離之位置。即,當排出氣體通過貫通孔234f而自排氣口133排出時,因不流動於加熱器間隔物234與隔板235之安裝面附近,故可抑制排出氣體自安裝面侵入。However, in the above-mentioned turbo molecular pump 100, the through hole 134f connected to the exhaust port 133 is provided on the metal contact surface 134a, the radial positioning surface 134b and the retreat surface, as shown in FIGS. 6(a) and (b). The position where the parts of 134c overlap. That is, since the exhaust gas discharged from the exhaust port 133 through the through hole 134f flows near the mounting surface of the heater spacer 134 and the partition plate 135, there is a risk that the exhaust gas may intrude into the mounting surface. In contrast, as shown in FIGS. 9(a) and (b) , the through hole 234f of the turbomolecular pump 200 is provided at a position deviated from the metal contact surface 234a, the radial positioning surface 234b, and the annular recess 234d. That is, when the exhaust gas passes through the through hole 234f and is discharged from the exhaust port 133, it does not flow near the mounting surface of the heater spacer 234 and the partition plate 235, so the intrusion of the exhaust gas from the mounting surface can be suppressed.

以上,雖就本發明之一實施形態進行了說明,但本發明並非限定於指定實施形態者,只要於上述說明未特別限定,於申請專利範圍所記載之本發明之主旨之範圍內,可進行各種變化、變更、組合。又,上述實施形態中之效果僅例示自本發明產生之效果,並非意指本發明之效果限定於上述效果。Although one embodiment of the present invention has been described above, the present invention is not limited to the specified embodiment. As long as the above description is not particularly limited, it can be carried out within the scope of the gist of the present invention described in the patent claims. Various variations, alterations, combinations. In addition, the effects in the above-mentioned embodiments are only examples of the effects produced by the present invention, and it is not intended that the effects of the present invention are limited to the above-mentioned effects.

例如,於上述實施形態之定子中,附螺紋間隔物131係與加熱器間隔物134、234不同之構件,但亦可使用將附螺紋間隔物與加熱器間隔物一體化之構件。又,設置螺栓140之位置不限於設置金屬接觸面134a、234a與金屬接觸面135f、235f之位置,亦可為金屬接觸面134a、234a與金屬接觸面135f、235f之附近。For example, in the stator of the above-mentioned embodiment, the threaded spacer 131 is a member different from the heater spacers 134 and 234. However, a member in which the threaded spacer and the heater spacer are integrated may also be used. In addition, the location where the bolt 140 is provided is not limited to the location where the metal contact surfaces 134a, 234a and the metal contact surfaces 135f, 235f are provided, but may also be located near the metal contact surfaces 134a, 234a and the metal contact surfaces 135f, 235f.

100,200:渦輪分子泵(真空泵) 101:吸氣口 102(102a,102b,102c):旋轉翼 102d:圓筒部 103:旋轉體(轉子) 104:上側徑向電磁鐵 105:下側徑向電磁鐵 106A,106B:軸向電磁鐵 107:上側徑向感測器 108:下側徑向感測器 109:軸向感測器 111:金屬碟 113:轉子軸(旋轉軸) 115:清洗埠 120:保護軸承 121:馬達 122:定子柱(收容部) 123(123a,123b,123c):固定翼 125(125a,125b,125c):固定翼間隔物 127:外筒 129:基底部 131:附螺紋間隔物 131a:螺紋槽 133:排氣口 134:加熱器間隔物 134a:金屬接觸面 134b:定位面 134c:退避面 134d:環狀凹部 134e:內螺紋部 134f:貫通孔 135:隔板 135a:環狀壁部 135b:內側周壁部 135c:折回部 135d:外緣部 135e:外側周壁部 135f:金屬接觸面 135g:螺栓通孔 135h:缺口部 136:密封構件 137:絕熱間隔物 138:加熱器(加熱機構) 139:溫度感測器 140:螺栓 145:底蓋 150:放大電路 151:電磁鐵繞組 161:電晶體 161a:陰極端子 161b:陽極端子 162:電晶體 162a:陰極端子 162b:陽極端子 165:二極體 165a:陰極端子 165b:陽極端子 166:二極體 166a:陰極端子 166b:陽極端子 171:電源 171a:正極 171b:負極 181:電流檢測電路 191:放大控制電路 191a,191b:閘極驅動信號 191c:電流檢測信號 234:加熱器間隔物 234a:金屬接觸面 234b:徑向定位面 234d:環狀凹部 234e:內螺紋部 234f:貫通孔 235g:螺栓通孔 235:隔板 235a:環狀壁部 235b:內側周壁部 235c:折回部 235d:外緣部 235e:階差部 235f:金屬接觸面 235g:螺栓通孔 CA:中心軸 iL:電磁鐵電流 Tp1,Tp2:脈衝寬度時間 Ts:控制週期 100,200: Turbomolecular pump (vacuum pump) 101: Suction port 102(102a,102b,102c): rotary wing 102d: Cylindrical part 103: Rotating body (rotor) 104: Upper radial electromagnet 105: Lower side radial electromagnet 106A, 106B: Axial electromagnet 107: Upper radial sensor 108: Lower radial sensor 109: Axial sensor 111:Metal disc 113:Rotor shaft (rotation axis) 115:Clean port 120: Protect bearings 121: Motor 122: Stator column (accommodation part) 123(123a,123b,123c): fixed wing 125(125a,125b,125c): fixed wing spacer 127:Outer cylinder 129:Basal part 131: With threaded spacer 131a: Thread groove 133:Exhaust port 134: Heater spacer 134a: Metal contact surface 134b: Positioning surface 134c: Retreat surface 134d: Annular recess 134e: Internal thread part 134f:Through hole 135:Partition 135a: Annular wall 135b: Inner peripheral wall part 135c: Turnback part 135d: outer edge part 135e: Outer peripheral wall part 135f: Metal contact surface 135g: bolt through hole 135h: Notch part 136:Sealing component 137:Thermal insulation spacer 138: Heater (heating mechanism) 139:Temperature sensor 140:Bolt 145: Bottom cover 150: Amplification circuit 151:Electromagnet winding 161:Transistor 161a: Cathode terminal 161b: Anode terminal 162:Transistor 162a: Cathode terminal 162b: Anode terminal 165: Diode 165a:Cathode terminal 165b: Anode terminal 166: Diode 166a: Cathode terminal 166b: Anode terminal 171:Power supply 171a: positive pole 171b: negative pole 181:Current detection circuit 191: Amplification control circuit 191a, 191b: Gate drive signal 191c: Current detection signal 234: Heater spacer 234a: Metal contact surface 234b: Radial positioning surface 234d: Annular recess 234e: Internal thread part 234f:Through hole 235g: bolt through hole 235:Partition 235a: Annular wall 235b: Inner peripheral wall part 235c: Turnback part 235d: outer edge part 235e: Step difference part 235f: Metal contact surface 235g: bolt through hole CA: central axis iL: electromagnet current Tp1, Tp2: pulse width time Ts: control cycle

圖1係概略性顯示本發明之真空泵之第一實施形態之縱剖視圖。 圖2係圖1所示之真空泵之放大電路之電路圖。 圖3係顯示電流指令值大於檢測值時之控制之時序圖。 圖4係顯示電流指令值小於檢測值時之控制之時序圖。 圖5與圖1所示之真空泵有關,(a)係A部之部分放大圖,(b)係B部之部分放大圖。 圖6關於圖1所示之加熱器間隔物與隔板,(a)係顯示組合加熱器間隔物與隔板之狀態之立體圖,(b)係加熱器間隔物之立體圖,(c)係隔板之立體圖。 圖7係概略性顯示本發明之真空泵之第二實施形態之縱剖視圖。 圖8關於圖7所示之真空泵,(a)係C部之部分放大圖,(b)係D部之部分放大圖。 圖9關於圖7所示之加熱器間隔物與隔板,(a)係顯示組合加熱器間隔物與隔板之狀態之立體圖,(b)係加熱器間隔物之立體圖,(c)係隔板之立體圖。 FIG. 1 is a longitudinal sectional view schematically showing the first embodiment of the vacuum pump of the present invention. Figure 2 is a circuit diagram of the amplifier circuit of the vacuum pump shown in Figure 1. Figure 3 is a timing diagram showing the control when the current command value is greater than the detection value. Figure 4 is a timing diagram showing the control when the current command value is smaller than the detection value. Figure 5 is related to the vacuum pump shown in Figure 1. (a) is a partially enlarged view of part A, and (b) is a partially enlarged view of part B. Fig. 6 Regarding the heater spacer and the partition shown in Fig. 1, (a) is a perspective view showing the combined state of the heater spacer and the partition, (b) is a perspective view of the heater spacer, (c) is the partition Stereo view of the board. 7 is a longitudinal sectional view schematically showing a second embodiment of the vacuum pump of the present invention. Fig. 8 Regarding the vacuum pump shown in Fig. 7, (a) is a partial enlarged view of part C, and (b) is a partial enlarged view of part D. Fig. 9 Regarding the heater spacer and the partition shown in Fig. 7, (a) is a perspective view showing the combined state of the heater spacer and the partition, (b) is a perspective view of the heater spacer, (c) is the partition Stereo view of the board.

100:渦輪分子泵(真空泵) 100: Turbomolecular pump (vacuum pump)

101:吸氣口 101: Suction port

102(102a,102b,102c):旋轉翼 102(102a,102b,102c): rotary wing

102d:圓筒部 102d: Cylindrical part

103:旋轉體(轉子) 103: Rotating body (rotor)

104:上側徑向電磁鐵 104: Upper radial electromagnet

105:下側徑向電磁鐵 105: Lower side radial electromagnet

106A,106B:軸向電磁鐵 106A, 106B: Axial electromagnet

107:上側徑向感測器 107: Upper radial sensor

108:下側徑向感測器 108: Lower radial sensor

109:軸向感測器 109: Axial sensor

111:金屬碟 111:Metal disc

113:轉子軸(旋轉軸) 113:Rotor shaft (rotation axis)

115:清洗埠 115:Clean port

120:保護軸承 120: Protect bearings

121:馬達 121: Motor

122:定子柱(收容部) 122: Stator column (accommodation part)

123(123a,123b,123c):固定翼 123(123a,123b,123c): fixed wing

125(125a,125b,125c):固定翼間隔物 125(125a,125b,125c): fixed wing spacer

127:外筒 127:Outer cylinder

129:基底部 129:Basal part

131:附螺紋間隔物 131: With threaded spacer

131a:螺紋槽 131a: Thread groove

133:排氣口 133:Exhaust port

134:加熱器間隔物 134: Heater spacer

135:隔板 135:Partition

136:密封構件 136:Sealing component

137:絕熱間隔物 137:Thermal insulation spacer

138:加熱器(加熱機構) 138: Heater (heating mechanism)

139:溫度感測器 139:Temperature sensor

145:底蓋 145: Bottom cover

CA:中心軸 CA: central axis

Claims (7)

一種真空泵,其特徵在於包含:鎧裝體,其具有排氣口; 收容部,其收容電裝部且配置於上述鎧裝體之內側; 旋轉軸,其於上述鎧裝體之內側旋轉自如地受支持,藉由上述電裝部而旋轉; 轉子,其配置於上述收容部之外側,固定於上述旋轉軸; 定子,其配置於上述轉子之外周側; 泵流路,其設置於上述轉子之外周面與上述定子之內周面之間,氣體於其中流動; 隔板,其安裝於上述定子,劃定自上述泵流路之出口至上述排氣口之上述氣體之流路;及 加熱機構,其加熱上述定子與上述隔板;且 於上述定子與上述隔板之安裝面,設置抑制上述氣體侵入之密封構件。 A vacuum pump is characterized by comprising: an armored body with an exhaust port; a receiving portion that receives the electrical component and is arranged inside the armored body; a rotating shaft, which is rotatably supported inside the armored body and is rotated by the electrical component; A rotor, which is arranged outside the above-mentioned receiving part and fixed to the above-mentioned rotating shaft; A stator, which is arranged on the outer peripheral side of the above-mentioned rotor; A pump flow path is provided between the outer peripheral surface of the rotor and the inner peripheral surface of the stator, and gas flows therein; A partition installed on the stator to delineate the flow path of the gas from the outlet of the flow path of the above pump to the exhaust port; and A heating mechanism that heats the above-mentioned stator and the above-mentioned separator; and A sealing member that suppresses the intrusion of the gas is provided on the mounting surface of the stator and the separator. 如請求項1之真空泵,其中於上述安裝面,相對於上述密封構件,於上述氣體之上游側具有上述定子與上述隔板接觸之金屬接觸面。The vacuum pump according to claim 1, wherein the mounting surface has a metal contact surface on the upstream side of the gas with respect to the sealing member, where the stator contacts the partition plate. 如請求項1之真空泵,其中上述定子與上述隔板由互不相同之材質形成。The vacuum pump of claim 1, wherein the stator and the partition are made of different materials. 如請求項3之真空泵,其中上述隔板由熱傳導率高於上述定子之材質形成。The vacuum pump of claim 3, wherein the partition plate is made of a material with a higher thermal conductivity than the stator. 如請求項1之真空泵,其中於上述轉子與上述隔板對向之對向面之至少一部分,設置有抑制上述氣體向上述收容部流入之非接觸密封構造。The vacuum pump according to claim 1, wherein a non-contact sealing structure that suppresses the inflow of the gas into the accommodating portion is provided on at least a portion of the opposing surface of the rotor and the partition plate. 如請求項1之真空泵,其中上述隔板相對於上述定子,自上述旋轉軸之軸向藉由螺栓固定。The vacuum pump of claim 1, wherein the partition plate is fixed with bolts from the axial direction of the rotating shaft relative to the stator. 如請求項1之真空泵,其中上述定子具有連接於上述排氣口之貫通孔;且 上述安裝面設置於相對於上述旋轉軸之軸向自上述貫通孔偏離之位置。 The vacuum pump of claim 1, wherein the stator has a through hole connected to the exhaust port; and The mounting surface is provided at a position offset from the through hole with respect to the axial direction of the rotation shaft.
TW112123074A 2022-06-29 2023-06-20 Vacuum pump TW202407219A (en)

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