TW202403810A - Protection element and method of manufacturing the same - Google Patents

Protection element and method of manufacturing the same Download PDF

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TW202403810A
TW202403810A TW111125683A TW111125683A TW202403810A TW 202403810 A TW202403810 A TW 202403810A TW 111125683 A TW111125683 A TW 111125683A TW 111125683 A TW111125683 A TW 111125683A TW 202403810 A TW202403810 A TW 202403810A
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electrode
heating element
substrate
insulating layer
solder mask
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TW111125683A
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Chinese (zh)
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TWI842008B (en
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江財寶
江智偉
楊士賢
林伯軒
陳樂霖
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大毅科技股份有限公司
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Abstract

The present disclosure relates to a protection element. The protection element includes a substrate, a first electrode disposed on the substrate and having a first extending portion, a second electrode disposed on the substrate and spaced apart from the first electrode, and a heating element disposed between the first electrode and the second electrode. The protection element also includes a fusible conductor connecting between the first electrode and the second electrode. The fusible conductor is configured to be fused and cut off by heat from the heating element. At least a part of the first extending portion of the first electrode is disposed between the substrate and the heating element and contacting the heating element. The present disclosure also relates to a method of manufacturing a protection element.

Description

保護元件及其製造方法Protection element and manufacturing method thereof

本發明係關於一種保護元件及其製造方法,具體而言,係關於藉由發熱體之加熱使可熔導體熔斷而阻斷電流路徑的保護元件。The present invention relates to a protective element and a manufacturing method thereof. Specifically, it relates to a protective element in which a fusible conductor is melted by heating of a heating element to block a current path.

在電子裝置(例如鋰離子電池或其他二次電池)的保護電路中,可使用具有過電流及過電壓防護功能的保護元件。該保護元件之可熔導體於電流超過額定值時可被熔斷;並且可於電壓超過額定值時,藉由其發熱體之加熱而使該可熔導體熔斷,達到保護電子裝置的效果。In the protection circuit of electronic devices (such as lithium-ion batteries or other secondary batteries), protection components with overcurrent and overvoltage protection functions can be used. The fusible conductor of the protection element can be fused when the current exceeds the rated value; and when the voltage exceeds the rated value, the fusible conductor can be fused by heating the heating element to achieve the effect of protecting the electronic device.

本揭露之一實施例係關於一種保護元件,包括基板、設置於該基板上並具有第一延伸部的第一電極、設置於該基板上並與該第一電極間隔開的第二電極、及設置於該第一電極與該第二電極之間的發熱體。該保護元件還包括連接在該第一電極及該第二電極之間的可熔導體。該可熔導體經配置以藉由該發熱體之發熱而熔斷。該第一電極的該第一延伸部具有至少一部分位於該發熱體與該基板之間並接觸該發熱體。One embodiment of the present disclosure relates to a protection element including a substrate, a first electrode disposed on the substrate and having a first extension, a second electrode disposed on the substrate and spaced apart from the first electrode, and A heating element disposed between the first electrode and the second electrode. The protective element also includes a fusible conductor connected between the first electrode and the second electrode. The fusible conductor is configured to fuse by heat generated by the heating element. The first extending portion of the first electrode has at least a portion located between the heating element and the substrate and in contact with the heating element.

本揭露之一實施例係關於一種保護元件之製造方法,包括提供基板;及形成第一電極、第二電極及第三電極於該基板上。該第一電極具有第一延伸部且該第三電極具有第二延伸部。該製造方法還包括形成發熱體覆蓋該第一延伸部及該第二延伸部;及形成可熔導體連接於該第一電極與該第二電極之間。One embodiment of the present disclosure relates to a method of manufacturing a protective element, which includes providing a substrate; and forming a first electrode, a second electrode and a third electrode on the substrate. The first electrode has a first extending portion and the third electrode has a second extending portion. The manufacturing method also includes forming a heating element to cover the first extension part and the second extension part; and forming a soluble conductor connected between the first electrode and the second electrode.

圖1A所示為根據本揭露之部分實施例之保護元件1之立體圖。FIG. 1A is a perspective view of a protection component 1 according to some embodiments of the present disclosure.

保護元件1可包括基板10、電極11(或稱為第一電極11)、電極12(或稱為第二電極12)、電極13(或稱為第三電極13)、絕緣層14(或稱為第一絕緣層14)、發熱體(例如圖1B所示之發熱體15)、絕緣層16(或稱為第二絕緣層16)、防焊層17a、防焊層17b、可熔導體18及蓋體19。在一些實施例中,發熱體可被包圍在絕緣層14及絕緣層16之間。The protection element 1 may include a substrate 10, an electrode 11 (or a first electrode 11), an electrode 12 (a second electrode 12), an electrode 13 (a third electrode 13), an insulating layer 14 (a It is the first insulating layer 14), the heating element (for example, the heating element 15 shown in Figure 1B), the insulating layer 16 (or the second insulating layer 16), the solder resist layer 17a, the solder resist layer 17b, and the soluble conductor 18 and cover 19. In some embodiments, the heating element may be enclosed between the insulating layer 14 and the insulating layer 16 .

保護元件1可應用在電子裝置(例如鋰離子電池或其他二次電池)的保護電路中。電極11及電極12可設置於基板10的相對的兩端或兩側。電極11及電極12可透過可熔導體18電連接。可熔導體18可透過電極11及電極12與外部電路(例如保護電路)之電路基板電連接,構成外部電路之通電路徑的一部分。當超過額定值的電流流經可熔導體18時,可熔導體18因電流產生的熱量(亦即焦耳熱)而熔斷。The protection element 1 can be applied in a protection circuit of an electronic device (such as a lithium-ion battery or other secondary battery). The electrodes 11 and 12 may be disposed at opposite ends or both sides of the substrate 10 . The electrode 11 and the electrode 12 can be electrically connected through the fusible conductor 18 . The soluble conductor 18 can be electrically connected to the circuit substrate of an external circuit (such as a protection circuit) through the electrode 11 and the electrode 12, and forms a part of the electrical path of the external circuit. When a current exceeding the rated value flows through the fusible conductor 18, the fusible conductor 18 fuses due to the heat generated by the current (ie, Joule heat).

電極13可設置於基板10的一端或一側,並與電極11及電極12分開。電極13可將發熱體與外部電路之電路基板電連接,當電壓超過額定值時(例如當鋰離子電池過度充電時),藉由發熱體之加熱可使可熔導體18熔斷,達到保護電子裝置的效果。The electrode 13 can be disposed at one end or one side of the substrate 10 and is separated from the electrodes 11 and 12 . The electrode 13 can electrically connect the heating element to the circuit board of the external circuit. When the voltage exceeds the rated value (for example, when the lithium-ion battery is overcharged), the fusible conductor 18 can be melted by the heating of the heating element to protect the electronics. The effect of the device.

圖1B所示為根據本揭露之部分實施例之保護元件之俯視圖。在一些實施例中,圖1B為圖1A之保護元件1之俯視圖。為簡潔之緣故,圖1B中僅描繪基板10、電極11、電極12、電極13、絕緣層14及發熱體15。FIG. 1B shows a top view of a protection component according to some embodiments of the present disclosure. In some embodiments, FIG. 1B is a top view of the protection component 1 of FIG. 1A. For the sake of simplicity, only the substrate 10, the electrode 11, the electrode 12, the electrode 13, the insulating layer 14 and the heating element 15 are depicted in FIG. 1B.

參照圖1B,基板10可包括絕緣基板,例如陶瓷基板、玻璃基板、樹脂基板、絕緣處理金屬基板等。在一些實施例中,基板10可包括(但不限於)硼矽酸鹽玻璃(borophosphosilicate glass,BPSG)、經摻雜矽酸鹽玻璃(undoped silicate glass,USG)、矽(silicon)、氧化矽(silicon oxide)、氮化矽(silicon nitride)、氮氧化矽(silicon oxynitride)、氧化鋁(aluminum oxide)、氮化鋁(aluminum nitride)、聚醯亞胺(Polyimide,PI)、ABF基材(Ajinomoto build-up film,ABF)、模塑膠(molding compounds)、預浸漬複合纖維(pre-impregnated composite fibers)(例如,預浸材料)、及其中之組合、或其他類似物。模塑膠的實例可包括(但不限於)環氧樹脂(epoxy resin)(包含分散其中的填料(fillers))。預浸材料的實例可包括(但不限於)通過堆疊或層壓(laminating)多個預浸漬材料及/或片料(sheets)所形成的多層結構。在一些實施例中,基板10可包括(但不限於)電路板(如FR4)。基板10可包括表面103。在一些實施例中,表面103可包括保護元件1之側面、側邊、周圍或邊界。Referring to FIG. 1B , the substrate 10 may include an insulating substrate, such as a ceramic substrate, a glass substrate, a resin substrate, an insulated metal substrate, and the like. In some embodiments, the substrate 10 may include (but is not limited to) borosilicate glass (BPSG), undoped silicate glass (USG), silicon, silicon oxide ( silicon oxide), silicon nitride (silicon nitride), silicon oxynitride (silicon oxynitride), aluminum oxide (aluminum oxide), aluminum nitride (aluminum nitride), polyimide (PI), ABF substrate (Ajinomoto build-up film (ABF), molding compounds, pre-impregnated composite fibers (eg, prepreg materials), combinations thereof, or the like. Examples of molding rubbers may include, but are not limited to, epoxy resins (including fillers dispersed therein). Examples of prepregs may include, but are not limited to, multi-layer structures formed by stacking or laminating multiple prepregs and/or sheets. In some embodiments, the substrate 10 may include, but is not limited to, a circuit board (such as FR4). Substrate 10 may include surface 103 . In some embodiments, the surface 103 may include the sides, edges, surroundings or borders of the protective element 1 .

在一些實施例中,基板10可包括通孔10v1(或稱為第一通孔10v1)、通孔10v2(或稱為第二通孔10v2)及通孔10v3(或稱為第三通孔10v3)。從俯視圖觀看時,通孔10v1、通孔10v2及通孔10v3可分別位在電極11、電極12及電極13的下方而被遮蔽,故以虛線表示。In some embodiments, the substrate 10 may include a through hole 10v1 (or a first through hole 10v1 ), a through hole 10v2 (or a second through hole 10v2 ), and a through hole 10v3 (or a third through hole 10v3 ). When viewed from a top view, the through hole 10v1 , the through hole 10v2 and the through hole 10v3 can be located below the electrode 11 , the electrode 12 and the electrode 13 respectively and are blocked, so they are represented by dotted lines.

在一些實施例中,通孔10v1、通孔10v2及通孔10v3可分別與表面103間隔開。通孔10v1、通孔10v2及通孔10v3可分別位在基板10的表面103以內。通孔10v1、通孔10v2及通孔10v3可分別位在基板10的邊界內。例如,通孔10v1、通孔10v2及通孔10v3可分別未從基板10的表面103曝露出來。In some embodiments, via 10v1 , via 10v2 , and via 10v3 may each be spaced apart from surface 103 . The through hole 10v1 , the through hole 10v2 and the through hole 10v3 can be respectively located within the surface 103 of the substrate 10 . The through hole 10v1 , the through hole 10v2 and the through hole 10v3 may be located within the boundaries of the substrate 10 respectively. For example, the through hole 10v1 , the through hole 10v2 and the through hole 10v3 may not be exposed from the surface 103 of the substrate 10 respectively.

在一些實施例中,通孔10v1、通孔10v2及通孔10v3可分別與電極11、電極12及電極13電連接。在一些實施例中,通孔10v1、通孔10v2及通孔10v3可分別將電極11、電極12及電極13電連接至一外部端子(例如圖1D所示之外部端子11b、外部端子12b及圖1E所示之外部端子13b)。In some embodiments, the through hole 10v1, the through hole 10v2, and the through hole 10v3 may be electrically connected to the electrode 11, the electrode 12, and the electrode 13 respectively. In some embodiments, the through hole 10v1, the through hole 10v2 and the through hole 10v3 can respectively electrically connect the electrode 11, the electrode 12 and the electrode 13 to an external terminal (such as the external terminal 11b, the external terminal 12b shown in FIG. 1D and the external terminal 12b in FIG. 1D). External terminal 13b shown in 1E).

在一些實施例中,通孔10v1、通孔10v2及通孔10v3可分別包括(但不限於)銅(Cu)、金(Au)、銀(Ag)、鋁(Al)、鎳(Ni)、鈦(Ti)、鎢(W)、鉻(Cr)、錫(Sn)、或其他金屬或合金。例如,在一些實施例中,合金可包括鎳鉻合金(如鎳鉻鋁、鎳鉻矽)、鎳銅合金(如鎳銅錳)等。在一些實施例中,電極11及電極12可分別連接兩個通孔,而電極13可連接一個通孔。在一些實施例中,通孔的大小、數量及位置可依保護元件1之額定電流大小而調整。例如,電極11及電極12可分別連接三個或更多個通孔。例如,電極13可連接兩個或更多個通孔。In some embodiments, the through hole 10v1 , the through hole 10v2 and the through hole 10v3 may respectively include (but are not limited to) copper (Cu), gold (Au), silver (Ag), aluminum (Al), nickel (Ni), Titanium (Ti), tungsten (W), chromium (Cr), tin (Sn), or other metals or alloys. For example, in some embodiments, the alloy may include nickel-chromium alloys (eg, nickel-chromium aluminum, nickel-chromium silicon), nickel-copper alloys (eg, nickel-copper-manganese), and the like. In some embodiments, the electrode 11 and the electrode 12 can be connected to two through holes respectively, and the electrode 13 can be connected to one through hole. In some embodiments, the size, number and position of the through holes can be adjusted according to the rated current of the protection element 1 . For example, the electrode 11 and the electrode 12 may be connected to three or more through holes respectively. For example, electrode 13 may connect two or more vias.

如圖1B所示,電極11、電極12及電極13可靠近基板10的三個相鄰的側邊或側面。例如電極12靠近基板10的左側,電極13靠近基板10的下側,而電極11靠近基板10的右側以及上側。As shown in FIG. 1B , the electrodes 11 , 12 and 13 may be close to three adjacent sides or sides of the substrate 10 . For example, the electrode 12 is close to the left side of the substrate 10 , the electrode 13 is close to the lower side of the substrate 10 , and the electrode 11 is close to the right side and the upper side of the substrate 10 .

在一些實施例中,電極11可包括複合式電極。例如,電極11可靠近基板10的兩個相鄰的側邊(例如右側以及上側)。電極11可沿著基板10的兩個相鄰的側邊而延伸。電極11可從基板10的一側邊延伸到相鄰的另一側邊。In some embodiments, electrode 11 may include a composite electrode. For example, the electrode 11 may be close to two adjacent sides of the substrate 10 (eg, the right side and the upper side). The electrodes 11 may extend along two adjacent sides of the substrate 10 . The electrode 11 may extend from one side of the substrate 10 to the other adjacent side.

電極11可具有延伸部11e(或稱為第一延伸部11e)。延伸部11e可從電極11朝電極12的方向(例如朝圖1B中之X軸方向)延伸,並朝電極13的方向(例如朝圖1B中之Y軸反方向)延伸。延伸部11e可具有一拐角。延伸部11e可具有兩個延伸方向。The electrode 11 may have an extension portion 11e (also referred to as a first extension portion 11e). The extension portion 11 e may extend from the electrode 11 toward the direction of the electrode 12 (for example, toward the X-axis direction in FIG. 1B ) and extend toward the direction of the electrode 13 (for example, toward the opposite direction of the Y-axis in FIG. 1B ). The extension portion 11e may have a corner. The extending portion 11e may have two extending directions.

延伸部11e可具有一部分位於絕緣層14及發熱體15之間。例如,延伸部11e可具有一部分接觸(例如直接接觸)絕緣層14及發熱體15。例如,延伸部11e可具有一部分延伸至發熱體15下方並具有一端部從發熱體15曝露出來。在一些實施例中,延伸部11e位於發熱體15下方的部分的寬度可不變或一致。例如,延伸部11e位於發熱體15下方的部分可為一矩形。延伸部11e的延伸方向可包括矩形的長邊。The extension portion 11e may have a portion located between the insulating layer 14 and the heating element 15 . For example, the extension portion 11 e may have a portion that contacts (for example, directly contacts) the insulating layer 14 and the heating element 15 . For example, the extension portion 11 e may have a portion extending below the heating element 15 and have an end portion exposed from the heating element 15 . In some embodiments, the width of the portion of the extension portion 11e located below the heating element 15 may be constant or consistent. For example, the portion of the extension portion 11e located below the heating element 15 may be in a rectangular shape. The extension direction of the extension portion 11e may include the long side of the rectangle.

電極13可具有延伸部13e(或稱為第二延伸部13e)。延伸部13e可從電極13朝電極11的方向(例如朝圖1B中之Y軸方向)延伸。The electrode 13 may have an extension portion 13e (or referred to as a second extension portion 13e). The extension portion 13 e may extend from the electrode 13 toward the direction of the electrode 11 (for example, toward the Y-axis direction in FIG. 1B ).

延伸部13e可具有一部分位於絕緣層14及發熱體15之間。例如,延伸部13e可具有一部分接觸(例如直接接觸)絕緣層14及發熱體15。例如,延伸部13e可具有一部分延伸至發熱體15下方並具有一端部從發熱體15曝露出來。在一些實施例中,延伸部13e位於發熱體15下方的部分的寬度可不變或一致。例如,延伸部13e位於發熱體15下方的部分可為一矩形。延伸部13e的延伸方向可包括矩形的長邊。The extension portion 13e may have a portion located between the insulating layer 14 and the heating element 15 . For example, the extension portion 13e may have a portion that contacts (for example, directly contacts) the insulating layer 14 and the heating element 15 . For example, the extension portion 13e may have a portion extending below the heating element 15 and have an end portion exposed from the heating element 15 . In some embodiments, the width of the portion of the extension portion 13e located below the heating element 15 may be constant or consistent. For example, the portion of the extension portion 13e located below the heating element 15 may be in a rectangular shape. The extending direction of the extending portion 13e may include the long side of the rectangle.

在一些實施例中,延伸部11e與延伸部13e可朝相反方向延伸。在一些實施例中,延伸部11e與延伸部13e可位在發熱體15的相對的兩端或兩側。在一些實施例中,延伸部11e與延伸部13e可不具有從發熱體15曝露出來的一端。例如,延伸部11e與延伸部13e可延伸至發熱體15下方並且具有邊緣被發熱體15覆蓋或與發熱體15切齊。在一些實施例中,延伸部11e與延伸部13e可經配置以將發熱體15加熱。在一些實施例中,電極11及電極13可透過延伸部11e與延伸部13e將發熱體15加熱。In some embodiments, the extension portion 11e and the extension portion 13e may extend in opposite directions. In some embodiments, the extension portion 11 e and the extension portion 13 e may be located at opposite ends or both sides of the heating element 15 . In some embodiments, the extension portion 11 e and the extension portion 13 e may not have one end exposed from the heating element 15 . For example, the extension portion 11 e and the extension portion 13 e may extend below the heating element 15 and have edges covered by the heating element 15 or flush with the heating element 15 . In some embodiments, the extension portion 11e and the extension portion 13e may be configured to heat the heating element 15. In some embodiments, the electrode 11 and the electrode 13 can heat the heating element 15 through the extension portion 11e and the extension portion 13e.

在一些實施例中,電極11、電極12及電極13可分別包括(但不限於)銅(Cu)、金(Au)、銀(Ag)、鋁(Al)、鎳(Ni)、鈦(Ti)、鎢(W)、鉻(Cr)、錫(Sn)、或其他金屬或合金。在一些實施例中,例如在圖2J所示之製程步驟中,電極11、電極12及電極13上可塗佈有鎳/金(Ni/Au)、鎳/鉛/金(Ni/Pb/Au)、或鎳/鉛(Ni/Pb)等塗佈膜,以防止電極氧化,並避免額定電流值或額定電壓值因電極氧化而產生變動。如圖2J所示,延伸部11e與延伸部13e被絕緣層16覆蓋的部分未塗佈有塗佈膜。In some embodiments, the electrodes 11 , 12 and 13 may respectively include (but are not limited to) copper (Cu), gold (Au), silver (Ag), aluminum (Al), nickel (Ni), titanium (Ti). ), tungsten (W), chromium (Cr), tin (Sn), or other metals or alloys. In some embodiments, for example, in the process steps shown in FIG. 2J , the electrodes 11 , 12 and 13 can be coated with nickel/gold (Ni/Au), nickel/lead/gold (Ni/Pb/Au). ), or nickel/lead (Ni/Pb) coating film to prevent electrode oxidation and avoid changes in the rated current value or rated voltage value due to electrode oxidation. As shown in FIG. 2J , the portions of the extension portion 11 e and the extension portion 13 e covered by the insulating layer 16 are not coated with a coating film.

繼續參照圖1B,絕緣層14可位在基板10上方,並位在基板10與發熱體15之間。延伸部11e之一部分與延伸部13e之一部分可延伸至絕緣層14上方。Continuing to refer to FIG. 1B , the insulating layer 14 may be located above the substrate 10 and between the substrate 10 and the heating element 15 . A portion of the extension portion 11e and a portion of the extension portion 13e may extend above the insulation layer 14 .

在一些實施例中,絕緣層14可包括(但不限於)環氧樹脂(包含分散其中的填料)、膜塑料、矽、或其他可適用於陶瓷、玻璃、樹脂等基板材料的材料。在一些實施例中,絕緣層14可具有耐熱性,例如可耐受可熔導體18熔斷時之熱。在一些實施例中,絕緣層14可將發熱體15與基板10隔開。在一些實施例中,絕緣層14可將電極11、電極12及電極13隔開,以避免發生微短路現象,並提高裝置穩定性。在一些實施例中,絕緣層14可阻隔或減少熱經由基板10逸散,確保電壓超過額定值時,發熱體15可被加熱而使可熔導體18即時熔斷,以保護電路,降低電子裝置的損害風險。In some embodiments, the insulating layer 14 may include (but is not limited to) epoxy (including fillers dispersed therein), film plastic, silicon, or other materials applicable to substrate materials such as ceramic, glass, resin, etc. In some embodiments, insulating layer 14 may be heat resistant, such as to withstand the heat of meltable conductor 18 when it fuses. In some embodiments, the insulating layer 14 may separate the heating element 15 from the substrate 10 . In some embodiments, the insulating layer 14 can separate the electrode 11 , the electrode 12 and the electrode 13 to avoid micro-short circuits and improve device stability. In some embodiments, the insulating layer 14 can block or reduce the heat dissipation through the substrate 10 to ensure that when the voltage exceeds the rated value, the heating element 15 can be heated to cause the fusible conductor 18 to melt instantly to protect the circuit and reduce the cost of the electronic device. risk of damage.

發熱體15可位於絕緣層14的上方。發熱體15可接觸(例如直接接觸)絕緣層14。發熱體15可覆蓋延伸部11e的一部分與延伸部13e的一部分。發熱體15可包括可經通電而發熱的材料。在一些實施例中,發熱體15可包括(但不限於)鎢(W)、鉬(Mo)、釕(Ru)、鉻(Cr)、銀(Ag)、氧化釕(RuO或RuO 2)或其他金屬、合金或金屬氧化物。 The heating element 15 may be located above the insulation layer 14 . The heating element 15 may contact (for example, directly contact) the insulating layer 14 . The heating element 15 may cover a part of the extension part 11e and a part of the extension part 13e. The heating element 15 may include a material that can generate heat by being energized. In some embodiments, the heating element 15 may include (but is not limited to) tungsten (W), molybdenum (Mo), ruthenium (Ru), chromium (Cr), silver (Ag), ruthenium oxide (RuO or RuO 2 ) or Other metals, alloys or metal oxides.

圖1C所示為根據本揭露之部分實施例之保護元件之等效電路圖。在一些實施例中,圖1C為圖1A之保護元件1之等效電路圖。為簡潔之緣故,圖1B中僅描繪出電極11、電極12、電極13及可熔導體18。FIG. 1C shows an equivalent circuit diagram of a protection device according to some embodiments of the present disclosure. In some embodiments, FIG. 1C is an equivalent circuit diagram of the protection component 1 of FIG. 1A. For the sake of simplicity, only electrodes 11 , 12 , 13 and soluble conductor 18 are depicted in FIG. 1B .

參照圖1B及圖1C,電極11、電極12、電極13分別具有與外部電路之電路基板電連接的端子或端點。電極13可透過延伸部13e、發熱體15及延伸部11e與電極11電連接。電極13與電極11之間可形成發熱體電阻,當電壓超過額定值時,可熔導體18可被發熱體電阻加熱而熔斷。在一些實施例中,可熔導體18可未直接電連接發熱體電阻。例如,可熔導體18可未直接接觸發熱體電阻。例如,可熔導體18可經由電極11而間接地連接發熱體電阻。Referring to FIGS. 1B and 1C , electrodes 11 , 12 , and 13 each have terminals or endpoints electrically connected to the circuit board of the external circuit. The electrode 13 can be electrically connected to the electrode 11 through the extension part 13e, the heating element 15 and the extension part 11e. A heating element resistance can be formed between the electrode 13 and the electrode 11. When the voltage exceeds the rated value, the fusible conductor 18 can be heated by the heating element resistance and fuse. In some embodiments, fusible conductor 18 may not be directly electrically connected to the heater resistor. For example, fusible conductor 18 may not directly contact the heater resistor. For example, the fusible conductor 18 may be indirectly connected to the heating element resistor via the electrode 11 .

圖1D及圖1E所示為根據本揭露之部分實施例之保護元件之側視圖。在一些實施例中,圖1D及圖1E分別為圖1A之保護元件1沿切線AA’及切線BB’切割的剖面圖。1D and 1E are side views of a protection component according to some embodiments of the present disclosure. In some embodiments, FIG. 1D and FIG. 1E are respectively cross-sectional views of the protection component 1 of FIG. 1A cut along tangent line AA' and tangent line BB'.

參照圖1D及圖1E,基板10具有表面101、與表面101相對的表面102、及延伸於表面101及表面102之間的表面103。在一些實施例中,通孔10v1、通孔10v2及通孔10v3可分別貫穿基板10。通孔10v1、通孔10v2及通孔10v3可分別延伸於表面101及表面102之間。通孔10v1、通孔10v2及通孔10v3可分別從表面101及表面102曝露出來。Referring to FIGS. 1D and 1E , the substrate 10 has a surface 101 , a surface 102 opposite the surface 101 , and a surface 103 extending between the surface 101 and the surface 102 . In some embodiments, the through hole 10v1 , the through hole 10v2 and the through hole 10v3 can respectively penetrate the substrate 10 . The through hole 10v1, the through hole 10v2 and the through hole 10v3 may extend between the surface 101 and the surface 102 respectively. Via 10v1 , via 10v2 and via 10v3 may be exposed from surface 101 and surface 102 respectively.

電極11、電極12及電極13可設置於或位於基板10的表面101上。電極11可透過通孔10v1電連接至外部端子11b(或稱為第一外部端子11b)。電極12可透過通孔10v2電連接至外部端子12b(或稱為第二外部端子12b)。電極13可透過通孔10v3電連接至外部端子13b(或稱為第三外部端子13b)。外部端子11b、外部端子12b及外部端子13b可位於基板10的表面102上。外部端子11b、外部端子12b及外部端子13b可做為與外部電路之電路基板電連接的端子或端點。The electrodes 11 , 12 and 13 may be disposed on or located on the surface 101 of the substrate 10 . The electrode 11 can be electrically connected to the external terminal 11b (also referred to as the first external terminal 11b) through the through hole 10v1. The electrode 12 can be electrically connected to the external terminal 12b (also referred to as the second external terminal 12b) through the through hole 10v2. The electrode 13 can be electrically connected to the external terminal 13b (also referred to as the third external terminal 13b) through the through hole 10v3. The external terminals 11b, 12b, and 13b may be located on the surface 102 of the substrate 10. The external terminals 11b, 12b and 13b can be used as terminals or endpoints electrically connected to the circuit board of the external circuit.

絕緣層14可設置於或位於基板10的表面101上。絕緣層14可位於電極11及電極12之間。絕緣層14可具有相對的兩端分別被電極11及電極12覆蓋。延伸部11e與延伸部13e可設置於或位於絕緣層14上。延伸部11e與延伸部13e可被發熱體15覆蓋並與發熱體15接觸。The insulating layer 14 may be disposed on or located on the surface 101 of the substrate 10 . The insulating layer 14 may be located between the electrode 11 and the electrode 12 . The insulating layer 14 may have two opposite ends covered by the electrode 11 and the electrode 12 respectively. The extension portion 11e and the extension portion 13e may be disposed on or located on the insulating layer 14. The extension portion 11e and the extension portion 13e may be covered by the heating element 15 and in contact with the heating element 15 .

在一些實施例中,延伸部11e可具有一側面與發熱體15的側面共面(coplanar)。延伸部11e的側面可與絕緣層16接觸或被絕緣層16覆蓋。在一些實施例中,延伸部11e可具有一底面與發熱體15的底面共面。延伸部11e的底面與發熱體15的底面可接觸絕緣層14的頂面。In some embodiments, the extension portion 11 e may have a side surface coplanar with the side surface of the heating element 15 . The side surfaces of the extension portion 11 e may be in contact with or covered by the insulating layer 16 . In some embodiments, the extension portion 11 e may have a bottom surface coplanar with the bottom surface of the heating element 15 . The bottom surface of the extension portion 11 e and the bottom surface of the heating element 15 can contact the top surface of the insulating layer 14 .

在一些實施例中,延伸部13e可具有一側面與發熱體15的側面共面。延伸部13e的側面可與絕緣層16接觸或被絕緣層16覆蓋。在一些實施例中,延伸部13e可具有一底面與發熱體15的底面共面。延伸部13e的底面與發熱體15的底面可接觸絕緣層14的頂面。In some embodiments, the extension portion 13e may have a side surface that is coplanar with the side surface of the heating element 15 . The side surfaces of the extension portion 13e may be in contact with or covered by the insulating layer 16 . In some embodiments, the extension portion 13e may have a bottom surface that is coplanar with the bottom surface of the heating element 15 . The bottom surface of the extension part 13e and the bottom surface of the heating element 15 may contact the top surface of the insulating layer 14.

絕緣層16可設置於或位於絕緣層14上並覆蓋發熱體15。例如,發熱體15可被包圍在絕緣層14與絕緣層16內。在一些實施例中,絕緣層16可將發熱體15與可熔導體18隔開。在一些實施例中,絕緣層16可接觸或覆蓋電極11的一邊緣及電極12的一邊緣。在一些實施例中,絕緣層16可包括(但不限於)上述針對絕緣層14所列舉的材料,在此不再贅述。The insulating layer 16 can be disposed on or located on the insulating layer 14 and cover the heating element 15 . For example, the heating element 15 may be surrounded by the insulating layer 14 and the insulating layer 16 . In some embodiments, insulating layer 16 may separate heating element 15 from fusible conductor 18 . In some embodiments, the insulating layer 16 may contact or cover an edge of the electrode 11 and an edge of the electrode 12 . In some embodiments, the insulating layer 16 may include (but is not limited to) the materials listed above for the insulating layer 14 , which will not be described again here.

可熔導體18可連接在電極11及電極12之間。在一些實施例中,可熔導體18與電極11的接觸面積大致上等於可熔導體18與電極12的接觸面積。Meltable conductor 18 may be connected between electrode 11 and electrode 12 . In some embodiments, the contact area of soluble conductor 18 with electrode 11 is substantially equal to the contact area of soluble conductor 18 with electrode 12 .

在一些實施例中,如圖1D所示,在Z軸方向(或垂直於基板10的表面101的方向)上,發熱體15可具有一部分位於可熔導體18與延伸部11e之間。發熱體15可具有一部分位於可熔導體18與延伸部13e之間。在一些實施例中,如圖1D所示,在Z軸方向(或垂直於基板10的表面101的方向)上,發熱體15與可熔導體18之間可不包含其他的傳導層或傳導件。In some embodiments, as shown in FIG. 1D , in the Z-axis direction (or the direction perpendicular to the surface 101 of the substrate 10 ), the heating element 15 may have a portion located between the soluble conductor 18 and the extension 11e. The heating element 15 may have a portion located between the soluble conductor 18 and the extension 13e. In some embodiments, as shown in FIG. 1D , no other conductive layer or conductive member may be included between the heating element 15 and the soluble conductor 18 in the Z-axis direction (or the direction perpendicular to the surface 101 of the substrate 10 ).

在一些實施例中,可熔導體18可包括(但不限於)銅(Cu)、錫(Sn)、鉍(Bi)、銀(Ag)、或其他金屬或合金。在一些實施例中,可熔導體18可經配置以藉由發熱體15之發熱而熔斷。在一些實施例中,可熔導體18可包括複數個金屬層,例如可包括一層銅金屬層及一層錫金屬層。在一些實施例中,可熔導體18可包括單一金屬層或單一金屬塊。在一些實施例中,可熔導體18可包括單一合金層或單一合金塊。在一些實施例中,可熔導體18可包括單一熔點金屬層或單一熔點金屬塊。在一些實施例中,可熔導體18中銅的重量百分比可為50%、60%、70%、80%、90%或更高。在一些實施例中,可熔導體18可包括純銅。例如,可熔導體18之銅可直接接觸電極11及電極12。In some embodiments, fusible conductor 18 may include, but is not limited to, copper (Cu), tin (Sn), bismuth (Bi), silver (Ag), or other metals or alloys. In some embodiments, fusible conductor 18 may be configured to fuse by heat generated by heating element 15 . In some embodiments, the soluble conductor 18 may include a plurality of metal layers, such as a copper metal layer and a tin metal layer. In some embodiments, fusible conductor 18 may include a single metal layer or a single metal block. In some embodiments, fusible conductor 18 may include a single alloy layer or a single alloy block. In some embodiments, fusible conductor 18 may include a single melting point metal layer or a single melting point metal block. In some embodiments, the weight percent of copper in fusible conductor 18 may be 50%, 60%, 70%, 80%, 90%, or higher. In some embodiments, fusible conductor 18 may include pure copper. For example, the copper of soluble conductor 18 may directly contact electrodes 11 and 12 .

防焊層17a(或稱為第一防焊層17a)及防焊層17b(或稱為第二防焊層17b)可設置於或位於絕緣層16與可熔導體18之間。防焊層17a及防焊層17b可設置於或位於可熔導體18下方。防焊層17a及防焊層17b可接觸(例如直接接觸)可熔導體18。防焊層17a及防焊層17b可被可熔導體18覆蓋。防焊層17a可設置成鄰近電極11。防焊層17b可設置成鄰近電極12。在一些實施例中,防焊層17a及防焊層17b可彼此分離或間隔開。The solder mask layer 17a (or called the first solder mask layer 17a) and the solder mask layer 17b (or called the second solder mask layer 17b) may be disposed or located between the insulating layer 16 and the soluble conductor 18. The solder mask layer 17a and the solder mask layer 17b may be disposed on or under the fusible conductor 18. The solder mask layers 17 a and 17 b may contact (eg, directly contact) the fusible conductor 18 . The solder mask layer 17a and the solder mask layer 17b may be covered by the fusible conductor 18. The solder mask 17a may be provided adjacent to the electrode 11. The solder mask 17b may be disposed adjacent the electrode 12 . In some embodiments, solder mask layer 17a and solder mask layer 17b may be separated or spaced apart from each other.

在一些實施例中,如圖1D所示,在Z軸方向(或垂直於基板10的表面101的方向)上,防焊層17a與延伸部13e可不重疊。然而在其他實施例中,防焊層17a與延伸部13e可至少部分重疊。In some embodiments, as shown in FIG. 1D , in the Z-axis direction (or the direction perpendicular to the surface 101 of the substrate 10 ), the solder mask 17 a and the extension 13 e may not overlap. However, in other embodiments, the solder mask 17a and the extension 13e may at least partially overlap.

在一些實施例中,防焊層17a及防焊層17b可具有長條矩形的形狀。例如圖1A所示,防焊層17a及防焊層17b在Y軸方向上延伸。在一些實施例中,防焊層17a及防焊層17b可延伸超過可熔導體18的一邊。例如,防焊層17a的兩端可從可熔導體18曝露出來。例如,防焊層17b的兩端可從可熔導體18曝露出來。In some embodiments, the solder mask layer 17a and the solder mask layer 17b may have an elongated rectangular shape. For example, as shown in FIG. 1A , the solder resist layer 17 a and the solder resist layer 17 b extend in the Y-axis direction. In some embodiments, solder mask 17 a and solder mask 17 b may extend beyond one side of fusible conductor 18 . For example, both ends of the solder mask 17a may be exposed from the soluble conductor 18. For example, both ends of the solder mask 17b may be exposed from the soluble conductor 18.

在一些實施例中,防焊層17a及防焊層17b可經配置以將熔融的可熔導體18分段或分離,確實地遮斷電路,而使可熔導體18的熔斷特性更為穩定。例如,防焊層17a及防焊層17b可將可熔導體18分成三段。在其他實施例中,可僅具有一個防焊層,例如僅具有防焊層17a或防焊層17b,可將可熔導體18分成兩段。在其他實施例中,可僅具有一個防焊層鄰近於電極11、鄰近於電極12、或與電極11及電極12大致上等距離。在其他實施例中,可僅具有一個防焊層,其中心線可與可熔導體18的中心線大致上對齊。In some embodiments, the solder mask layer 17a and the solder mask layer 17b can be configured to segment or separate the molten fusible conductor 18 to reliably interrupt the circuit and make the fusing characteristics of the fusible conductor 18 more stable. . For example, the solder mask layer 17a and the solder mask layer 17b can divide the fusible conductor 18 into three sections. In other embodiments, there may be only one solder mask, such as only solder mask 17a or solder mask 17b, and the fusible conductor 18 may be divided into two sections. In other embodiments, there may be only one solder mask adjacent to electrode 11 , adjacent to electrode 12 , or substantially equidistant from electrode 11 and electrode 12 . In other embodiments, there may be only one solder mask, the centerline of which may be generally aligned with the centerline of fusible conductor 18 .

在一些實施例中,由於可熔導體18可具有單一熔點,防焊層17a及防焊層17b可同時將可熔導體18分成三段。例如,電極11與電極12可同時與可熔導體18形成斷路。In some embodiments, since the soluble conductor 18 may have a single melting point, the solder mask 17a and the solder mask 17b may simultaneously divide the soluble conductor 18 into three sections. For example, the electrode 11 and the electrode 12 can form an interruption with the soluble conductor 18 at the same time.

在一些實施例中,防焊層17a及防焊層17b可分別包括(但不限於)環氧樹脂(epoxy)、胺甲酸乙酯(urethane)、丙烯酸(acrylic)、有機與無機填料、光引發劑(photoinitiator)等材料。In some embodiments, the solder mask layer 17a and the solder mask layer 17b may respectively include (but are not limited to) epoxy, urethane, acrylic, organic and inorganic fillers, photoinitiated materials, etc. Agent (photoinitiator) and other materials.

蓋部19可設置於或位於基板10的表面101上。在一些實施例中,從圖1D及圖1E之側視圖觀看時,蓋部19的中間部位可較其周圍部位薄。在一些實施例中,從圖1D及圖1E之側視圖觀看時,蓋部19的中間部位可具有大致上平坦的內側表面。在一些實施例中,從圖1D及圖1E之側視圖觀看時,蓋部19可具有大致上平坦的上表面。The cover 19 may be disposed on or located on the surface 101 of the substrate 10 . In some embodiments, when viewed from the side views of FIG. 1D and FIG. 1E , the middle portion of the cover 19 may be thinner than the surrounding portion. In some embodiments, the middle portion of cover 19 may have a substantially flat inner surface when viewed from the side views of FIGS. 1D and 1E . In some embodiments, cover 19 may have a substantially flat upper surface when viewed from the side views of FIGS. 1D and 1E.

圖2A至圖2M所示為根據本揭露之部分實施例之保護元件之製造方法。根據本揭露之部分實施例,圖2A至圖2M所揭露之製造方法可用以製造如圖1A所示之保護元件1。2A to 2M illustrate a manufacturing method of a protection element according to some embodiments of the present disclosure. According to some embodiments of the present disclosure, the manufacturing method disclosed in FIGS. 2A to 2M can be used to manufacture the protection element 1 shown in FIG. 1A .

參照圖2A,提供基板10。基板10具有表面101及與表面101相對的表面102。在一些實施例中,可以雷射切割的方式在基板10中形成切割道(未圖示)。在一些實施例中,切割道之深度可占基板10之厚度約20%至約60%的比例。Referring to Figure 2A, a substrate 10 is provided. The substrate 10 has a surface 101 and a surface 102 opposite to the surface 101 . In some embodiments, cutting lines (not shown) may be formed in the substrate 10 by laser cutting. In some embodiments, the depth of the scribe lines may account for about 20% to about 60% of the thickness of the substrate 10 .

參照圖2B,於基板10中形成鑽孔10h。在一些實施例中,鑽孔10h可藉由雷射鑽孔或其他可行的方式而形成。可依裝置規格(例如額定電流大小)或製程要求而設計鑽孔10h的大小、數量及位置。Referring to FIG. 2B , a hole 10 h is formed in the substrate 10 . In some embodiments, the drill hole 10h may be formed by laser drilling or other feasible methods. The size, quantity and location of the 10h drilling holes can be designed according to the device specifications (such as rated current) or process requirements.

參照圖2C,形成通孔10v1、通孔10v2及通孔10v3。在一些實施例中,可在鑽孔10h中透過濺射、無電電鍍(electroless plating)、電鍍(plating)、印刷(printing)、黃光微影(photolithography)或其他可行的方式形成導電材料。Referring to FIG. 2C , a through hole 10v1 , a through hole 10v2 and a through hole 10v3 are formed. In some embodiments, the conductive material may be formed in the drill hole 10h by sputtering, electroless plating, plating, printing, photolithography, or other feasible methods.

參照圖2D,表面102朝上,在基板10之表面102上形成外部端子11b、外部端子12b及外部端子13b。在一些實施例中,外部端子11b、外部端子12b及外部端子13b可藉由濺射、無電電鍍、電鍍、印刷、黃光微影或其他可行的方式而形成。外部端子11b、外部端子12b及外部端子13b的位置係對應於通孔10v1、通孔10v2及通孔10v3的位置。Referring to FIG. 2D , the surface 102 faces upward, and external terminals 11 b , external terminals 12 b and external terminals 13 b are formed on the surface 102 of the substrate 10 . In some embodiments, the external terminals 11b, 12b, and 13b may be formed by sputtering, electroless plating, electroplating, printing, photolithography, or other feasible methods. The positions of the external terminals 11b, 12b, and 13b correspond to the positions of the through holes 10v1, 10v2, and 10v3.

參照圖2E,表面101朝上,在基板10的表面101上形成絕緣層14。在一些實施例中,絕緣層14可透過塗佈(coating)、層壓(lamination) 或其他可行的方式而形成。Referring to FIG. 2E , the surface 101 faces upward, and the insulating layer 14 is formed on the surface 101 of the substrate 10 . In some embodiments, the insulating layer 14 may be formed by coating, lamination, or other feasible methods.

參照圖2F,在基板10的表面101及絕緣層14上形成電極11、電極12及電極13。在一些實施例中,電極11、電極12及電極13可藉由濺射、無電電鍍、電鍍、印刷、黃光微影或其他可行的方式而形成。電極11可具有延伸部11e且電極13可具有延伸部13e。在其他實施例中,可在基板10的表面101及絕緣層14上保型地(comformally)形成傳導層,再經由雷射蝕刻、乾式蝕刻(dry etching)、離子撞擊(ion bumping)、或其他可行的方式移除部分的傳導層或圖案化傳導層。Referring to FIG. 2F , electrodes 11 , 12 and 13 are formed on the surface 101 of the substrate 10 and the insulating layer 14 . In some embodiments, the electrodes 11, 12, and 13 may be formed by sputtering, electroless plating, electroplating, printing, photolithography, or other feasible methods. The electrode 11 may have an extension portion 11e and the electrode 13 may have an extension portion 13e. In other embodiments, the conductive layer can be conformally formed on the surface 101 of the substrate 10 and the insulating layer 14 through laser etching, dry etching, ion bumping, or other processes. Possible ways to remove part of the conductive layer or pattern the conductive layer.

參照圖2G,在絕緣層14、延伸部11e及延伸部13e上形成發熱體15。在一些實施例中,發熱體15可透過電鍍、蒸鍍、濺鍍而形成。在一些實施例中,發熱體15可經由將金屬(例如釕(Ru))之粉末與黏合劑(例如樹脂)混合,並透過網版印形成圖案後燒結而成。在其他實施例中,發熱體15可透過貼附金屬薄膜而形成。Referring to FIG. 2G , the heating element 15 is formed on the insulating layer 14 , the extension portion 11 e and the extension portion 13 e. In some embodiments, the heating element 15 can be formed by electroplating, evaporation, or sputtering. In some embodiments, the heating element 15 can be formed by mixing metal (such as ruthenium (Ru)) powder with a binder (such as resin), forming a pattern through screen printing, and then sintering. In other embodiments, the heating element 15 can be formed by attaching a metal film.

參照圖2H,在發熱體15上形成絕緣層16。在一些實施例中,絕緣層16可透過塗佈、層壓或其他可行的方式而形成。Referring to FIG. 2H , an insulating layer 16 is formed on the heating element 15 . In some embodiments, the insulating layer 16 may be formed by coating, lamination, or other feasible methods.

參照圖2I,在絕緣層16上形成防焊層17a及17b。在一些實施例中,防焊層17a及17b可透過塗佈、印刷、黃光微影或其他可行的方式而形成。Referring to FIG. 2I , solder resist layers 17 a and 17 b are formed on the insulating layer 16 . In some embodiments, the solder mask layers 17a and 17b can be formed by coating, printing, photolithography, or other feasible methods.

參照圖2J及2K,在電極11、電極12、電極13、外部端子11b、外部端子12b及外部端子13b上形成塗佈膜11p。在一些實施例中,塗佈膜11p可透過塗佈鎳/金(Ni/Au)、鎳/鉛/金(Ni/Pb/Au)、或鎳/鉛(Ni/Pb)等金屬而形成。延伸部11e與延伸部13e被絕緣層16覆蓋的部分未塗佈有塗佈膜11p。Referring to FIGS. 2J and 2K , a coating film 11 p is formed on the electrode 11 , the electrode 12 , the electrode 13 , the external terminal 11 b , the external terminal 12 b and the external terminal 13 b. In some embodiments, the coating film 11p may be formed by coating metals such as nickel/gold (Ni/Au), nickel/lead/gold (Ni/Pb/Au), or nickel/lead (Ni/Pb). The portions of the extension portion 11e and the extension portion 13e covered by the insulating layer 16 are not coated with the coating film 11p.

參照圖2L,在電極11及電極12上形成可熔導體18。在一些實施例中,可熔導體18可藉由濺射、無電電鍍、電鍍、印刷、黃光微影或其他可行的方式而形成。在其他實施例中,可熔導體18可透過貼附金屬片或薄膜(例如銅合金屬片或純銅金屬片)而形成。Referring to FIG. 2L , soluble conductor 18 is formed on electrode 11 and electrode 12 . In some embodiments, the fusible conductor 18 may be formed by sputtering, electroless plating, electroplating, printing, photolithography, or other feasible methods. In other embodiments, the soluble conductor 18 may be formed by attaching a metal sheet or film (eg, a copper alloy metal sheet or a pure copper metal sheet).

參照圖2M,形成蓋體19。在一些實施例中,可將基板10沿著經由雷射劃線而形成的切割道而分離成複數個獨立的元件,以露出基板10之側表面(例如圖1A所示之表面103)。在一些實施例中,透過圖2A至圖2M所示方法而形成的過電流保護裝置可與圖1A所示之保護元件1相同。Referring to Figure 2M, a cover 19 is formed. In some embodiments, the substrate 10 can be separated into a plurality of independent components along the cutting lines formed by laser scribing to expose the side surface of the substrate 10 (such as the surface 103 shown in FIG. 1A ). In some embodiments, the overcurrent protection device formed by the method shown in FIGS. 2A to 2M may be the same as the protection component 1 shown in FIG. 1A .

將瞭解,本文討論之方法及裝置之實施例在應用中不限於在下列描述中提出或在隨附圖式中繪示之組件之構造及配置之細節。方法及裝置能夠實現於其他實施例中且可以各種方式實踐或執行。特定實施方案之實例在本文中僅用於繪示之目的而提供且不意在限制。特定言之,結合任何一或多項實施例討論之動作、元件及特徵不意在從任何其他實施例中之一類似角色排除。It will be understood that embodiments of the methods and apparatus discussed herein are not limited in their application to the details of construction and arrangement of components set forth in the following description or illustrated in the accompanying drawings. The methods and apparatus are capable of implementation in other embodiments and of being practiced or performed in various ways. Examples of specific implementations are provided herein for illustrative purposes only and are not intended to be limiting. In particular, acts, elements, and features discussed in connection with any one or more embodiments are not intended to be excluded from a similar role in any other embodiments.

而且,在本文中使用之措辭及術語出於描述之目的且不應視為限制。對以單數形式指涉之本文之系統及方法之實施例或元件或動作之任何參考亦可包括包含複數個此等元件之實施例,且以複數形式對本文之任何實施例或元件或動作之任何參考亦可包括僅包含一單一元件之實施例。單數形式或複數形式之參考不意在限制當前所揭示之系統或方法、其等組件、動作或元件。本文中「包含」、「包括」、「具有」、「含有」、「涉及」及其等之變形之使用意欲涵蓋在其後列出之項目及其等之等效物以及額外項目。對「或」之參考可視為包含性的使得使用「或」之任何項可指示所描述之項之一單一、一個以上及所有之任一者。對前部及後部、左側及右側、頂部及底部、上部及下部及垂直及水平之任何參考意在為方便描述,而不將本系統及方法或其等組件限於任何一個位置或空間定向。Furthermore, the phraseology and terminology used herein are for the purpose of description and should not be regarded as limiting. Any reference to an embodiment or element or act of the systems and methods herein that is referred to in the singular may also include embodiments that include a plurality of such elements, and to any reference to any embodiment or element or act herein in the plural Any reference may also include embodiments including only a single element. References in the singular or plural are not intended to limit the presently disclosed system or method, its components, acts or elements. The use of "includes," "includes," "has," "contains," "involves," and variations thereof herein is intended to cover the items listed thereafter and their equivalents as well as additional items. References to "or" may be deemed to be inclusive such that any item using "or" may indicate any one, more than one, or all of the items described. Any references to front and rear, left and right, top and bottom, upper and lower, and vertical and horizontal are intended for convenience of description and do not limit the systems and methods or components thereof to any one position or spatial orientation.

因此,在已描述至少一項實施例之若干態樣之情況下,應瞭解,熟習此項技術者容易想到各種更改、修改及改良。此等更改、修改及改良意在係本發明之部分且意在處於本發明之範疇內。因此,以上描述及圖式僅係藉由實例,且應從隨附申請專利範圍及其等之等效物之正確建構來判定本發明之範疇。Thus, having described several aspects of at least one embodiment, it is to be understood that various alterations, modifications and improvements will readily occur to those skilled in the art. Such alterations, modifications and improvements are intended to be part of and within the scope of this invention. Therefore, the above description and drawings are by way of example only, and the scope of the present invention should be determined from the proper construction of the accompanying patent claims and their equivalents.

1:保護元件 10:基板 10v1:通孔/第一通孔 10v2:通孔/第二通孔 10v3:通孔/第三通孔 11:電極/第一電極 11b:外部端子/第一外部端子 11e:延伸部/第一延伸部 11p:塗佈膜 12:電極/第二電極 12b:外部端子/第二外部端子 13:電極/第三電極 13b:外部端子/第三外部端子 13e:延伸部/第二延伸部 14:絕緣層/第一絕緣層 15:發熱體 16:絕緣層/第二絕緣層 17a:防焊層/第一防焊層 17b:防焊層/第二防焊層 18:可熔導體 19:蓋體 101:表面 102:表面 103:表面 AA’:切線 BB’:切線 X:軸 Y:軸 Z:軸 1: Protective components 10:Substrate 10v1:Through hole/first through hole 10v2:Through hole/second through hole 10v3: Through hole/Third through hole 11:Electrode/first electrode 11b:External terminal/first external terminal 11e: Extension part/first extension part 11p: Coated film 12:Electrode/second electrode 12b:External terminal/second external terminal 13:Electrode/third electrode 13b:External terminal/Third external terminal 13e:Extension/Second extension 14: Insulation layer/first insulation layer 15: Heating element 16: Insulation layer/second insulation layer 17a: Solder mask/first solder mask 17b: Solder mask/second solder mask 18:Fusible conductor 19: Cover 101:Surface 102:Surface 103:Surface AA’: tangent BB’: tangent X: axis Y: axis Z: axis

在下文中參考隨附圖式討論至少一項實施例之各種態樣,該等圖式並不意在按比例繪製。在圖、實施方式或任何請求項中之技術特徵伴隨元件符號之處,已出於增大圖、實施方式或申請專利範圍中之可理解性之唯一目的而包含該等元件符號。因此,元件符號之存在與否皆不意在具有對任何申請專利範圍元素之範疇之限制效應。在圖中,在各種圖中繪示之各相同或幾乎相同之組件藉由一相同數字表示。為清晰起見,並非每一組件皆在每一圖中標記。該等圖出於繪示及解釋之目的提供且不視為本發明之限制之一定義。在圖中:Various aspects of at least one embodiment are discussed below with reference to the accompanying drawings, which are not intended to be drawn to scale. Where technical features in the drawings, embodiments, or any claims are accompanied by reference symbols, such reference symbols have been included for the sole purpose of increasing understandability in the drawings, embodiments, or claims. Accordingly, the presence or absence of a reference symbol is not intended to have a limiting effect on the scope of any element of the patentable scope claimed. In the drawings, identical or nearly identical components shown in the various figures are designated by the same numeral. For clarity, not every component is labeled in every figure. The drawings are provided for the purpose of illustration and explanation and are not to be construed as a definition of the limits of the invention. In the picture:

圖1A所示為根據本揭露之部分實施例之保護元件之立體圖;FIG. 1A is a perspective view of a protection component according to some embodiments of the present disclosure;

圖1B所示為根據本揭露之部分實施例之保護元件之俯視圖;1B shows a top view of a protection component according to some embodiments of the present disclosure;

圖1C所示為根據本揭露之部分實施例之保護元件之等效電路圖;FIG. 1C shows an equivalent circuit diagram of a protection component according to some embodiments of the present disclosure;

圖1D所示為根據本揭露之部分實施例之保護元件之側視圖;FIG. 1D shows a side view of a protection component according to some embodiments of the present disclosure;

圖1E所示為根據本揭露之部分實施例之保護元件之側視圖;及FIG. 1E shows a side view of a protection component according to some embodiments of the present disclosure; and

圖2A至圖2M所示為根據本揭露之部分實施例之保護元件之製造方法。2A to 2M illustrate a manufacturing method of a protection element according to some embodiments of the present disclosure.

1:保護元件 1: Protective components

10:基板 10:Substrate

11:電極/第一電極 11:Electrode/first electrode

11e:延伸部/第一延伸部 11e: Extension part/first extension part

12:電極/第二電極 12:Electrode/second electrode

13:電極/第三電極 13:Electrode/third electrode

14:絕緣層/第一絕緣層 14: Insulation layer/first insulation layer

16:絕緣層/第二絕緣層 16: Insulation layer/second insulation layer

17a:防焊層/第一防焊層 17a: Solder mask/first solder mask

17b:防焊層/第二防焊層 17b: Solder mask/second solder mask

18:可熔導體 18:Fusible conductor

19:蓋體 19: Cover

AA’:切線 AA’: tangent

BB’:切線 BB’: tangent

X:軸 X: axis

Y:軸 Y: axis

Z:軸 Z: axis

Claims (14)

一種保護元件,包含: 一基板; 一第一電極,其設置於該基板上並具有一第一延伸部; 一第二電極,其設置於該基板上並與該第一電極間隔開; 一發熱體其設置於該第一電極與該第二電極之間; 一可熔導體連接在該第一電極及該第二電極之間,其經配置以藉由該發熱體之發熱而熔斷, 其中該第一電極的該第一延伸部具有至少一部分位於該發熱體與該基板之間並接觸該發熱體。 A protective component containing: a substrate; a first electrode disposed on the substrate and having a first extension; a second electrode disposed on the substrate and spaced apart from the first electrode; A heating element is disposed between the first electrode and the second electrode; A fusible conductor is connected between the first electrode and the second electrode and is configured to be melted by the heat generated by the heating element, At least a portion of the first extending portion of the first electrode is located between the heating element and the substrate and contacts the heating element. 如請求項1所述之保護元件,其中該第一電極經由貫穿該基板之一第一通孔連接到一第一外部端子,且該第二電極經由貫穿該基板之一第二通孔連接到一第二外部端子。The protection element of claim 1, wherein the first electrode is connected to a first external terminal through a first through hole penetrating the substrate, and the second electrode is connected to a first external terminal through a second through hole penetrating the substrate. a second external terminal. 如請求項1所述之保護元件,更包括: 一第一絕緣層,其設置於該發熱體與該基板之間並將該發熱體與該基板隔開;及 一第二絕緣層,其設置於該發熱體與該可熔導體之間並將該發熱體與該可熔導體隔開。 The protection component as described in claim 1 further includes: A first insulating layer is disposed between the heating element and the substrate and separates the heating element from the substrate; and A second insulating layer is disposed between the heating element and the soluble conductor and separates the heating element from the soluble conductor. 如請求項3所述之保護元件,其中該第一電極具有一邊緣位於該第一絕緣層與該第二絕緣層之間。The protection element of claim 3, wherein the first electrode has an edge located between the first insulating layer and the second insulating layer. 如請求項3所述之保護元件,更包括: 第一防焊層,其設置於該第二絕緣層與該可熔導體之間並接觸該可熔導體。 The protection component as described in claim 3 further includes: A first solder mask layer is disposed between the second insulating layer and the soluble conductor and contacts the soluble conductor. 如請求項5所述之保護元件,更包括: 第二防焊層,其設置於該第二絕緣層與該可熔導體之間並接觸該可熔導體,其中該第一防焊層與該第二防焊層分隔開。 The protection component as described in claim 5 further includes: A second solder mask layer is disposed between the second insulating layer and the soluble conductor and contacts the soluble conductor, wherein the first solder mask layer is separated from the second solder mask layer. 如請求項1所述之保護元件,更包括: 一第三電極,其設置於該基板上並具有一第二延伸部,其中該第三電極的該第二延伸部具有至少一部分位於該發熱體與該基板之間並接觸該發熱體。 The protection component as described in claim 1 further includes: A third electrode is disposed on the substrate and has a second extension portion, wherein at least a portion of the second extension portion of the third electrode is located between the heating element and the substrate and contacts the heating element. 如請求項7所述之保護元件,其中該第一延伸部的一延伸方向及該第二延伸部的一延伸方向相反。The protection element of claim 7, wherein an extension direction of the first extension part and an extension direction of the second extension part are opposite. 如請求項7所述之保護元件,其中該第一電極及該第三電極經配置以加熱該發熱體。The protection element of claim 7, wherein the first electrode and the third electrode are configured to heat the heating element. 如請求項1所述之保護元件,其中該第一延伸部具有一側面與該發熱體之一側面共平面。The protection element according to claim 1, wherein the first extension portion has a side surface coplanar with a side surface of the heating element. 一種保護元件之製造方法,包含: 提供一基板; 形成一第一電極、一第二電極及一第三電極於該基板上,其中該第一電極具有一第一延伸部且該第三電極具有一第二延伸部; 形成一發熱體覆蓋該第一延伸部及該第二延伸部;及 形成一可熔導體連接於該第一電極與該第二電極之間。 A method of manufacturing a protective component, including: providing a substrate; Forming a first electrode, a second electrode and a third electrode on the substrate, wherein the first electrode has a first extension part and the third electrode has a second extension part; Form a heating element to cover the first extension part and the second extension part; and A soluble conductor is formed connected between the first electrode and the second electrode. 如請求項11所述之製造方法,進一步包括: 形成貫穿該基板之一第一通孔、一第二通孔及一第三通孔。 The manufacturing method as described in claim 11 further includes: A first through hole, a second through hole and a third through hole are formed through the substrate. 如請求項11所述之製造方法,進一步包括: 形成一第一絕緣層於該基板上,其中該發熱體形成於該第一絕緣層上;及 形成一第二絕緣層於該發熱體上,其中該可熔導體形成於該第二絕緣層上。 The manufacturing method as described in claim 11 further includes: Forming a first insulating layer on the substrate, wherein the heating element is formed on the first insulating layer; and A second insulating layer is formed on the heating element, wherein the soluble conductor is formed on the second insulating layer. 如請求項13所述之製造方法,進一步包括: 形成一防焊層於該第二絕緣層上,其中該可熔導體接觸該防焊層。 The manufacturing method as described in claim 13 further includes: A solder mask layer is formed on the second insulating layer, wherein the fusible conductor contacts the solder mask layer.
TW111125683A 2022-07-08 Protection element and method of manufacturing the same TWI842008B (en)

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