TW202402961A - Phosphorous-containing (meth)acryloyl compound, method for producing the same, flame retardant resin composition containing the same and laminate for electronic circuit board - Google Patents
Phosphorous-containing (meth)acryloyl compound, method for producing the same, flame retardant resin composition containing the same and laminate for electronic circuit board Download PDFInfo
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- TW202402961A TW202402961A TW112106513A TW112106513A TW202402961A TW 202402961 A TW202402961 A TW 202402961A TW 112106513 A TW112106513 A TW 112106513A TW 112106513 A TW112106513 A TW 112106513A TW 202402961 A TW202402961 A TW 202402961A
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- Prior art keywords
- meth
- compound
- phosphorus
- general formula
- resin composition
- Prior art date
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- 239000003063 flame retardant Substances 0.000 title claims abstract description 46
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 title claims abstract description 32
- 239000011342 resin composition Substances 0.000 title claims abstract description 32
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- -1 acryloyl compound Chemical class 0.000 title abstract description 70
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 title abstract 5
- 150000001875 compounds Chemical class 0.000 claims abstract description 59
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 27
- 239000001257 hydrogen Substances 0.000 claims abstract description 14
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 14
- 125000001424 substituent group Chemical group 0.000 claims abstract description 9
- 125000004437 phosphorous atom Chemical group 0.000 claims abstract description 8
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims abstract description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 5
- 229910052698 phosphorus Inorganic materials 0.000 claims description 86
- 239000011574 phosphorus Substances 0.000 claims description 81
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 63
- 229920005989 resin Polymers 0.000 claims description 42
- 239000011347 resin Substances 0.000 claims description 42
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 17
- ARJOQCYCJMAIFR-UHFFFAOYSA-N prop-2-enoyl prop-2-enoate Chemical compound C=CC(=O)OC(=O)C=C ARJOQCYCJMAIFR-UHFFFAOYSA-N 0.000 claims description 16
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 claims description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 4
- 229920005992 thermoplastic resin Polymers 0.000 claims description 4
- 125000004122 cyclic group Chemical group 0.000 claims description 3
- 229920001187 thermosetting polymer Polymers 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 239000002904 solvent Substances 0.000 abstract description 18
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 5
- 125000000217 alkyl group Chemical group 0.000 abstract description 3
- 229910052799 carbon Inorganic materials 0.000 abstract description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 75
- 238000006243 chemical reaction Methods 0.000 description 36
- 239000003822 epoxy resin Substances 0.000 description 29
- 229920000647 polyepoxide Polymers 0.000 description 29
- 239000000463 material Substances 0.000 description 24
- 239000000047 product Substances 0.000 description 24
- 239000000243 solution Substances 0.000 description 22
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 21
- 230000015572 biosynthetic process Effects 0.000 description 18
- 238000003786 synthesis reaction Methods 0.000 description 18
- 239000003054 catalyst Substances 0.000 description 14
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- 239000002966 varnish Substances 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 239000002585 base Substances 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 11
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- 239000007787 solid Substances 0.000 description 10
- 239000011521 glass Substances 0.000 description 9
- 150000002430 hydrocarbons Chemical group 0.000 description 9
- 238000003756 stirring Methods 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 239000000945 filler Substances 0.000 description 8
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 8
- 229940126062 Compound A Drugs 0.000 description 7
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 7
- 239000000654 additive Substances 0.000 description 7
- 238000001816 cooling Methods 0.000 description 7
- 239000011888 foil Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- DWSWCPPGLRSPIT-UHFFFAOYSA-N benzo[c][2,1]benzoxaphosphinin-6-ium 6-oxide Chemical compound C1=CC=C2[P+](=O)OC3=CC=CC=C3C2=C1 DWSWCPPGLRSPIT-UHFFFAOYSA-N 0.000 description 6
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 5
- FQYUMYWMJTYZTK-UHFFFAOYSA-N Phenyl glycidyl ether Chemical compound C1OC1COC1=CC=CC=C1 FQYUMYWMJTYZTK-UHFFFAOYSA-N 0.000 description 5
- 239000006087 Silane Coupling Agent Substances 0.000 description 5
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 5
- 230000000996 additive effect Effects 0.000 description 5
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000007822 coupling agent Substances 0.000 description 5
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000005470 impregnation Methods 0.000 description 5
- 229920003023 plastic Polymers 0.000 description 5
- 239000004033 plastic Substances 0.000 description 5
- 229920001955 polyphenylene ether Polymers 0.000 description 5
- LVTJOONKWUXEFR-FZRMHRINSA-N protoneodioscin Natural products O(C[C@@H](CC[C@]1(O)[C@H](C)[C@@H]2[C@]3(C)[C@H]([C@H]4[C@@H]([C@]5(C)C(=CC4)C[C@@H](O[C@@H]4[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@@H](O)[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@H](CO)O4)CC5)CC3)C[C@@H]2O1)C)[C@H]1[C@H](O)[C@H](O)[C@H](O)[C@@H](CO)O1 LVTJOONKWUXEFR-FZRMHRINSA-N 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 239000007810 chemical reaction solvent Substances 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 4
- 150000002431 hydrogen Chemical class 0.000 description 4
- 239000003112 inhibitor Substances 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 239000004848 polyfunctional curative Substances 0.000 description 4
- 239000007870 radical polymerization initiator Substances 0.000 description 4
- 150000003254 radicals Chemical class 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 4
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 4
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 4
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 3
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 description 3
- BBBUAWSVILPJLL-UHFFFAOYSA-N 2-(2-ethylhexoxymethyl)oxirane Chemical compound CCCCC(CC)COCC1CO1 BBBUAWSVILPJLL-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- HHRACYLRBOUBKM-UHFFFAOYSA-N 2-[(4-tert-butylphenoxy)methyl]oxirane Chemical compound C1=CC(C(C)(C)C)=CC=C1OCC1OC1 HHRACYLRBOUBKM-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 239000005977 Ethylene Substances 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- 239000004721 Polyphenylene oxide Substances 0.000 description 3
- 239000003377 acid catalyst Substances 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 239000002518 antifoaming agent Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 150000007514 bases Chemical class 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 230000018044 dehydration Effects 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 239000012433 hydrogen halide Substances 0.000 description 3
- 229910000039 hydrogen halide Inorganic materials 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 3
- 239000000347 magnesium hydroxide Substances 0.000 description 3
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 3
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical class CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 150000002978 peroxides Chemical class 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 150000004053 quinones Chemical class 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 229920003048 styrene butadiene rubber Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- GIMQKKFOOYOQGB-UHFFFAOYSA-N 2,2-diethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)(OCC)C(=O)C1=CC=CC=C1 GIMQKKFOOYOQGB-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- QDFXRVAOBHEBGJ-UHFFFAOYSA-N 3-(cyclononen-1-yl)-4,5,6,7,8,9-hexahydro-1h-diazonine Chemical compound C1CCCCCCC=C1C1=NNCCCCCC1 QDFXRVAOBHEBGJ-UHFFFAOYSA-N 0.000 description 2
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 description 2
- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical compound ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000005062 Polybutadiene Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
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- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical class OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- FYHXNYLLNIKZMR-UHFFFAOYSA-N calcium;carbonic acid Chemical compound [Ca].OC(O)=O FYHXNYLLNIKZMR-UHFFFAOYSA-N 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 230000000711 cancerogenic effect Effects 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
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- 231100000315 carcinogenic Toxicity 0.000 description 1
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- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
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- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
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- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- WQAWEUZTDVWTDB-UHFFFAOYSA-N dimethyl(oxo)phosphanium Chemical compound C[P+](C)=O WQAWEUZTDVWTDB-UHFFFAOYSA-N 0.000 description 1
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- YOTZYFSGUCFUKA-UHFFFAOYSA-N dimethylphosphine Chemical compound CPC YOTZYFSGUCFUKA-UHFFFAOYSA-N 0.000 description 1
- FYOYCZHNDCCGCE-UHFFFAOYSA-N diphenyl hydrogen phosphite Chemical compound C=1C=CC=CC=1OP(O)OC1=CC=CC=C1 FYOYCZHNDCCGCE-UHFFFAOYSA-N 0.000 description 1
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 1
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- AZDCYKCDXXPQIK-UHFFFAOYSA-N ethenoxymethylbenzene Chemical group C=COCC1=CC=CC=C1 AZDCYKCDXXPQIK-UHFFFAOYSA-N 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- JHYNXXDQQHTCHJ-UHFFFAOYSA-M ethyl(triphenyl)phosphanium;bromide Chemical compound [Br-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CC)C1=CC=CC=C1 JHYNXXDQQHTCHJ-UHFFFAOYSA-M 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
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- 239000012760 heat stabilizer Substances 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- ARZLUCYKIWYSHR-UHFFFAOYSA-N hydroxymethoxymethanol Chemical compound OCOCO ARZLUCYKIWYSHR-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000012796 inorganic flame retardant Substances 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical class OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- ALTWGIIQPLQAAM-UHFFFAOYSA-N metavanadate Chemical compound [O-][V](=O)=O ALTWGIIQPLQAAM-UHFFFAOYSA-N 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- MHNNAWXXUZQSNM-UHFFFAOYSA-N methylethylethylene Natural products CCC(C)=C MHNNAWXXUZQSNM-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910000402 monopotassium phosphate Inorganic materials 0.000 description 1
- 235000019796 monopotassium phosphate Nutrition 0.000 description 1
- 229910000403 monosodium phosphate Inorganic materials 0.000 description 1
- 235000019799 monosodium phosphate Nutrition 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- PSHKMPUSSFXUIA-UHFFFAOYSA-N n,n-dimethylpyridin-2-amine Chemical compound CN(C)C1=CC=CC=N1 PSHKMPUSSFXUIA-UHFFFAOYSA-N 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- GNVRJGIVDSQCOP-UHFFFAOYSA-N n-ethyl-n-methylethanamine Chemical compound CCN(C)CC GNVRJGIVDSQCOP-UHFFFAOYSA-N 0.000 description 1
- PXAVTVNEDPAYJP-UHFFFAOYSA-N n-ethyl-n-pentylpentan-1-amine Chemical compound CCCCCN(CC)CCCCC PXAVTVNEDPAYJP-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000007530 organic bases Chemical group 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- PJNZPQUBCPKICU-UHFFFAOYSA-N phosphoric acid;potassium Chemical compound [K].OP(O)(O)=O PJNZPQUBCPKICU-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920003050 poly-cycloolefin Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 239000002685 polymerization catalyst Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- BWILYWWHXDGKQA-UHFFFAOYSA-M potassium propanoate Chemical compound [K+].CCC([O-])=O BWILYWWHXDGKQA-UHFFFAOYSA-M 0.000 description 1
- 239000004331 potassium propionate Substances 0.000 description 1
- 235000010332 potassium propionate Nutrition 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000036632 reaction speed Effects 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
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- 239000005060 rubber Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 235000015424 sodium Nutrition 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- ADXGNEYLLLSOAR-UHFFFAOYSA-N tasosartan Chemical compound C12=NC(C)=NC(C)=C2CCC(=O)N1CC(C=C1)=CC=C1C1=CC=CC=C1C=1N=NNN=1 ADXGNEYLLLSOAR-UHFFFAOYSA-N 0.000 description 1
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- BJQBKYYLWCDABM-UHFFFAOYSA-N tert-butylphosphonoylbenzene Chemical compound CC(C)(C)P(=O)C1=CC=CC=C1 BJQBKYYLWCDABM-UHFFFAOYSA-N 0.000 description 1
- 238000002076 thermal analysis method Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- YSIQPJVFCSCUMU-UHFFFAOYSA-N trimethyl-[methyl-[3-(oxiran-2-ylmethoxy)propyl]-trimethylsilyloxysilyl]oxysilane Chemical compound C[Si](C)(C)O[Si](C)(O[Si](C)(C)C)CCCOCC1CO1 YSIQPJVFCSCUMU-UHFFFAOYSA-N 0.000 description 1
- IJSPNPSQIMOSAU-UHFFFAOYSA-N triphenyl(triphenylsilylperoxy)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)OO[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 IJSPNPSQIMOSAU-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- CMLWFCUAXGSMBB-UHFFFAOYSA-N tris(2,6-dimethoxyphenyl)phosphane Chemical compound COC1=CC=CC(OC)=C1P(C=1C(=CC=CC=1OC)OC)C1=C(OC)C=CC=C1OC CMLWFCUAXGSMBB-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical group [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- DXZMANYCMVCPIM-UHFFFAOYSA-L zinc;diethylphosphinate Chemical compound [Zn+2].CCP([O-])(=O)CC.CCP([O-])(=O)CC DXZMANYCMVCPIM-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6564—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms
- C07F9/6571—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and oxygen atoms as the only ring hetero atoms
- C07F9/6574—Esters of oxyacids of phosphorus
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/49—Phosphorus-containing compounds
- C08K5/51—Phosphorus bound to oxygen
- C08K5/53—Phosphorus bound to oxygen bound to oxygen and to carbon only
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
本發明係關於反應型磷化合物,尤其關於含有磷之(甲基)丙烯醯基化合物,係適合用於作為塑膠材料的反應型難燃劑。 The present invention relates to reactive phosphorus compounds, particularly to (meth)acrylyl compounds containing phosphorus, which are suitable for use as reactive flame retardants for plastic materials.
塑膠材料由於具有優異的機械特性、成形加工性,所以被使用在涵蓋建材和電子電機機器之廣泛用途。然而,由於大部分的塑膠材料容易燃燒,所以在所使用之用途中,例如電子電機製品或OA機器、通訊機器等中,為了確保對於發熱著火、火災之安全性,必須達到難燃化。 Plastic materials are used in a wide range of applications including building materials and electronic and electrical machinery due to their excellent mechanical properties and formability. However, since most plastic materials are easy to burn, in the applications they are used for, such as electronic and electrical products, OA equipment, communication equipment, etc., in order to ensure safety against heat and fire, they must be made flame retardant.
以塑膠材料的難燃化技術而言,鹵素系難燃劑、無機系難燃劑、磷系難燃劑等添加型難燃劑的添加,並不限於樹脂種類、用途而被廣泛地採用。然而,此等當中,以溴系為主之鹵素系難燃劑被指出可能成為致癌性高之戴奧辛的產生源,故因應於現今環境負荷物質減少的潮流而往限制其使用之方向邁進。 此外,氫氧化鎂、氫氧化鋁等無機系難燃劑雖具有因吸熱所帶來之難燃化效果,惟為了達成難燃化而有大量添加的需要,因而成為降低塑膠成形品的各種特性之原因。 In terms of flame retardant technology for plastic materials, the addition of additive flame retardants such as halogen-based flame retardants, inorganic-based flame retardants, and phosphorus-based flame retardants is widely used, not limited to resin types and uses. However, among these, halogen-based flame retardants, mainly bromine-based, have been pointed out as a possible source of dioxin, which is highly carcinogenic. Therefore, in response to the current trend of reducing environmentally hazardous substances, there is a move towards restricting their use. In addition, although inorganic flame retardants such as magnesium hydroxide and aluminum hydroxide have a flame retardant effect due to heat absorption, they need to be added in large amounts to achieve flame retardancy, thus reducing various properties of plastic molded products. the reason.
因此,較多係採用不會產生有害物質,且即使是相對少量的添加亦可達到難燃化之磷系難燃劑,但即使如此,亦難以避免因滲出等所導致之加工性的降低或是玻璃轉移溫度的降低等對特性所帶來的影響。 Therefore, phosphorus-based flame retardants are often used that do not produce harmful substances and can achieve flame retardancy even when added in a relatively small amount. However, even so, it is difficult to avoid a decrease in processability or loss of workability due to bleeding, etc. It is the effect of the reduction of glass transition temperature on the characteristics.
為了解決此等添加型難燃劑的問題,已開發出一種含有作為難燃成分的磷原子且具有反應性基之反應型難燃劑,且被廣泛地使用。可適用於在電子電機領域中多量地採用之環氧樹脂組成物的反應型難燃劑,例如於專利文獻1中揭示一種將雙酚A與甲醛進行反應而得到羥基甲基雙酚A後,與9,10-二氫-9-氧雜-10-膦菲-10-氧化物(以下略稱為「DOPO」)進行反應所得到之酚樹脂,來作為環氧樹脂用的硬化劑,於專利文獻2中揭示一種在將DOPO與醌類進行反應後,與環氧樹脂進行反應所得到之含有磷之環氧樹脂。於此等樹脂中,係解決難燃劑的滲出等加工性的問題,且未觀察到耐熱性等熱特性的惡化。如此,與添加型難燃劑相比,藉由使用反應性的難燃劑,一般來說可彌補添加型難燃劑的缺點,故而開發出許多難燃性環氧樹脂等。 In order to solve the problems of such additive flame retardants, a reactive flame retardant containing phosphorus atoms as a flame retardant component and having a reactive group has been developed and widely used. A reactive flame retardant that can be applied to epoxy resin compositions widely used in the field of electronics and motors. For example, Patent Document 1 discloses a method of reacting bisphenol A with formaldehyde to obtain hydroxymethyl bisphenol A. The phenol resin obtained by reacting with 9,10-dihydro-9-oxa-10-phosphophenanthrene-10-oxide (hereinafter referred to as "DOPO") is used as a hardener for epoxy resin. Patent Document 2 discloses a phosphorus-containing epoxy resin obtained by reacting DOPO with quinones and then reacting with an epoxy resin. In these resins, workability problems such as bleeding of the flame retardant are solved, and no deterioration in thermal properties such as heat resistance is observed. In this way, compared with additive flame retardants, the use of reactive flame retardants can generally make up for the shortcomings of additive flame retardants, so many flame retardant epoxy resins and the like have been developed.
然而,近年來在以難燃性為必要特性之電子電機材料領域中,由於以智慧型手機為代表之電子機器的急遽進化,對於含有難燃劑之樹脂成分的要求亦往更高程度邁進。尤其在資通訊領域中,伴隨著資訊處理量的增大,訊號的高頻化進展迅速,為了減少傳輸損失,對於此領域中所使用之樹脂成分係強烈要求低介電常數、低損耗正切。因此,在以電路基板為代表之電子電機材料領域中,已逐漸廣泛地使用可進一步達到低介電常數及低損耗正切化之自由基聚合 性的樹脂來取代環氧樹脂。因此,不僅是反應性基為環氧基或是與環氧樹脂具有反應性之難燃劑,亦要求一種可與自由基聚合性的樹脂進行反應之低介電常數及低損耗正切的無鹵素難燃劑。 However, in recent years, in the field of electronic and electrical materials for which flame retardancy is a necessary characteristic, due to the rapid evolution of electronic devices represented by smartphones, the requirements for resin components containing flame retardants have also moved to a higher level. Especially in the field of information and communication, as the amount of information processing increases, the frequency of signals is rapidly progressing. In order to reduce transmission losses, resin components used in this field are strongly required to have low dielectric constant and low loss tangent. Therefore, in the field of electronic and motor materials represented by circuit substrates, radical polymerization, which can further achieve low dielectric constant and low loss tangent, has gradually been widely used. Replace epoxy resin with a flexible resin. Therefore, not only the reactive group is an epoxy group or a flame retardant that is reactive with epoxy resin, but also a halogen-free halogen with low dielectric constant and low loss tangent that can react with free radical polymerizable resin is required. Flame retardant.
此外,由於電路基板所使用之樹脂組成物含浸於玻璃布等基材而使用,故被要求可溶於溶劑,惟在要求低介電之領域中,由於對介電特性之影響而以使用甲苯等非極性溶劑者為佳,所以在此等溶劑中,亦需未觀察到析出。 In addition, since the resin composition used in circuit boards is impregnated with base materials such as glass cloth, it is required to be soluble in solvents. However, in fields requiring low dielectric, toluene is used due to its impact on dielectric properties. Non-polar solvents such as these are preferred, so no precipitation should be observed in these solvents.
以具有自由基聚合性的官能基之無鹵素難燃劑而言,於專利文獻3中揭示一種由DOPO與氯甲基苯乙烯所得到之乙烯基苄醚化合物。然而,由於DOPO化合物藉由鹼而產生水解,所以在與氯甲基苯乙烯進行反應時,會因水解而生成部分的羥基並引起介電特性的惡化。於專利文獻4中揭示一種使用了DOPO與醌類之加成物的多官能乙烯基苄醚化合物,於專利文獻5、非專利文獻1中揭示一種使用了DOPO與醌類之加成物的多官能(甲基)丙烯醯基化合物。此等化合物就耐熱性、介電特性之點而言雖具有優異特性,惟結晶性強,於低極性溶劑中會觀察到析出等,處理性仍有問題。 As a halogen-free flame retardant having a radically polymerizable functional group, Patent Document 3 discloses a vinyl benzyl ether compound obtained from DOPO and chloromethylstyrene. However, since DOPO compounds are hydrolyzed by alkali, when reacting with chloromethylstyrene, partial hydroxyl groups are generated due to hydrolysis, causing deterioration of dielectric properties. Patent Document 4 discloses a polyfunctional vinyl benzyl ether compound using an adduct of DOPO and quinones, and Patent Document 5 and Non-Patent Document 1 disclose a polyfunctional vinyl benzyl ether compound using an adduct of DOPO and quinones. Functional (meth)acrylyl compounds. Although these compounds have excellent properties in terms of heat resistance and dielectric properties, they are highly crystalline and may precipitate in low-polarity solvents, resulting in handling problems.
[先前技術文獻] [Prior technical literature]
[專利文獻] [Patent Document]
[專利文獻1]日本特開2013-166938 [Patent Document 1] Japanese Patent Application Laid-Open No. 2013-166938
[專利文獻2]日本特開平11-279258 [Patent Document 2] Japanese Patent Application Laid-Open No. 11-279258
[專利文獻3]日本特開2004-277322 [Patent Document 3] Japanese Patent Application Laid-Open No. 2004-277322
[專利文獻4]日本特開2004-331537 [Patent Document 4] Japanese Patent Application Laid-Open No. 2004-331537
[專利文獻5]日本特開2014-156426 [Patent Document 5] Japanese Patent Application Laid-Open No. 2014-156426
[非專利文獻] [Non-patent literature]
[非專利文獻1]Ind. Eng. Chem. Res. 2013, 52, 12855-12864 [Non-patent document 1]Ind. Eng. Chem. Res. 2013, 52, 12855-12864
因此,本發明所欲解決之課題在於提供一種適合用於作為反應型磷系難燃劑,溶劑溶解性優異,且於硬化物中的耐熱性與介電特性優異之含有磷之化合物、含有該化合物的硬化性樹脂組成物以及該樹脂組成物的硬化物。 Therefore, an object to be solved by the present invention is to provide a phosphorus-containing compound that is suitable for use as a reactive phosphorus-based flame retardant, has excellent solvent solubility, and has excellent heat resistance and dielectric properties in a cured product. A curable resin composition of the compound and a cured product of the resin composition.
本發明人係對前述課題進行精心探討,結果發現具有特定結構之含有磷之(甲基)丙烯醯基化合物及組成物的難燃性、耐熱性、溶解性及介電特性優異,因而完成本發明。 The inventors of the present invention conducted careful research on the aforementioned subject and found that (meth)acrylyl compounds and compositions containing phosphorus having a specific structure are excellent in flame retardancy, heat resistance, solubility and dielectric properties, and thus completed the present invention. invention.
亦即,本發明為以下述通式(1)所表示之含有磷之(甲基)丙烯醯基化合物。 That is, the present invention is a phosphorus-containing (meth)acrylyl compound represented by the following general formula (1).
於通式(1)中,R1、R2為氫、羥基、以-OR或-R所表示之基,R為碳數2至40的烴基;R1、R2可為相同或不同,R1、R2可連同磷原子來形成環狀結構;R3為C1至C20的烴基;式中的X為以下述通式(2)所表示之取代基。 In the general formula (1), R 1 and R 2 are hydrogen, hydroxyl, a group represented by -OR or -R, and R is a hydrocarbon group with 2 to 40 carbon atoms; R 1 and R 2 can be the same or different, R 1 and R 2 can form a cyclic structure together with a phosphorus atom; R 3 is a hydrocarbon group from C1 to C20; X in the formula is a substituent represented by the following general formula (2).
於通式(2)中,R4為氫或甲基。 In the general formula (2), R 4 is hydrogen or methyl.
一種如上述所述之含有磷之(甲基)丙烯醯基化合物的製造方法,係在使下述通式(3)所表示之化合物與含有1個縮水甘油醚基之化合物進行反應後,藉由(甲基)丙烯酸、(甲基)丙烯酸酐或鹵化(甲基)丙烯醯基化合物來進行(甲基)丙烯醯基化。 A method for producing a phosphorus-containing (meth)acrylyl compound as described above, which involves reacting a compound represented by the following general formula (3) with a compound containing one glycidyl ether group, and then (Meth)acrylation is carried out from (meth)acrylic acid, (meth)acrylic anhydride or halogenated (meth)acrylyl compounds.
一種難燃性樹脂組成物,係將熱硬化性樹脂或熱塑性樹脂的一種以上調配於上述含有磷之(甲基)丙烯醯基化合物而成。 A flame-retardant resin composition is prepared by blending at least one thermosetting resin or thermoplastic resin with the above-mentioned phosphorus-containing (meth)acrylyl compound.
一種硬化物,係使上述難燃性樹脂組成物硬化而成,此外,為一種電子電路基板用積層體,係以上述難燃性樹脂組成物為必要成分。 A cured product obtained by curing the above-mentioned flame-retardant resin composition, and a laminated body for an electronic circuit board containing the above-mentioned flame-retardant resin composition as an essential component.
本發明之含有磷之(甲基)丙烯醯基化合物的溶劑溶解性優異,此外,使含有此化合物作為必要成分之組成物硬化而得到的硬化物係顯現低介電常數及低損耗正切,耐熱性的降低程度小,並且可減少由電子機器的資訊處理量增大所伴隨而來之高頻化下的傳輸損失,因此極適合用於作為反應型磷系難燃劑。 The (meth)acrylyl compound containing phosphorus of the present invention has excellent solvent solubility. In addition, a cured product obtained by curing a composition containing this compound as an essential component exhibits a low dielectric constant, a low loss tangent, and is heat-resistant. The degree of degradation in performance is small, and it can reduce the transmission loss at high frequencies associated with the increase in information processing capacity of electronic equipment, so it is very suitable for use as a reactive phosphorus-based flame retardant.
以下係詳細地說明本發明。 The present invention will be described in detail below.
於本發明的說明中,關於丙烯酸樹脂或丙烯酸化合物、丙烯酸酯化合物等稱呼,係依循通例,有時將例如「丙烯醯基」與「甲基丙烯醯基」兩者總稱為「(甲 基)丙烯醯基」,將「丙烯酸」與「甲基丙烯酸」兩者總稱為「(甲基)丙烯酸」,將「丙烯酸酯」與「甲基丙烯酸酯」兩者總稱為「(甲基)丙烯酸酯」。 In the description of the present invention, acrylic resins, acrylic compounds, acrylic ester compounds, etc. are referred to in accordance with common conventions. For example, "acrylyl" and "methacrylyl" are sometimes collectively referred to as "(methacrylyl)". "Acrylyl", "acrylic acid" and "methacrylic acid" are collectively referred to as "(meth)acrylic acid", and both "acrylate" and "methacrylate" are collectively referred to as "(meth)acrylic acid" Acrylate".
含有羥基之磷化合物或含有磷之(甲基)丙烯醯基化合物不僅是單一化合物,亦包括混合物(樹脂)。 The hydroxyl-containing phosphorus compound or the phosphorus-containing (meth)acrylyl compound includes not only a single compound but also a mixture (resin).
本發明之含有磷之(甲基)丙烯醯基化合物係以下述通式(1)所表示。 The phosphorus-containing (meth)acrylyl compound of the present invention is represented by the following general formula (1).
於通式(1)中,R1、R2為氫、羥基、以-OR或-R所表示之基,R為碳數2至40的烴基。R1、R2可為相同或不同,R1、R2可連同磷原子來形成環狀結構。較佳係R為苯環基,且苯環可經碳數1至3的烷基所取代。 In the general formula (1), R 1 and R 2 are hydrogen, hydroxyl, a group represented by -OR or -R, and R is a hydrocarbon group having 2 to 40 carbon atoms. R 1 and R 2 may be the same or different, and R 1 and R 2 may form a cyclic structure together with a phosphorus atom. Preferably, R is a benzene ring group, and the benzene ring may be substituted by an alkyl group having 1 to 3 carbon atoms.
於式(1)中,X為以下述式(2)所表示之取代基。惟本發明之含有磷之(甲基)丙烯醯基化合物亦可為含有X為羥基之化合物作為原料的未反應物之混合物。 In formula (1), X is a substituent represented by the following formula (2). However, the phosphorus-containing (meth)acrylyl compound of the present invention may also be a mixture of unreacted products containing a compound in which X is a hydroxyl group as a raw material.
於式(2)中,R4為氫或甲基。 In formula (2), R 4 is hydrogen or methyl.
於通式(1)中,R3為C1至C20的烴基。C1至C20的烴基可列舉:具有直鏈或分枝結構之脂肪族烴基、脂環式烴基、碳數6至20的芳香族烴基。脂肪族烴基可列舉碳數1至20的烷基,芳香族烴基可列舉苯基、萘基、聯苯基、蒽基等。於R3含有芳香族烴基之情形時,於該芳香環上可具有取代基,亦可不 具有取代基。該取代基可列舉:羧基、脂肪族烴基、醯基、烷氧基、氰基、羥基、甲基丙烯醯氧基、乙烯基苄醚基,連結有此等取代基之基等。於芳香族烴基具有取代基之情形時,取代基的碳數並不包含於上述碳數。 In the general formula (1), R 3 is a C1 to C20 hydrocarbon group. Examples of hydrocarbon groups from C1 to C20 include aliphatic hydrocarbon groups having a linear or branched structure, alicyclic hydrocarbon groups, and aromatic hydrocarbon groups having 6 to 20 carbon atoms. Examples of the aliphatic hydrocarbon group include alkyl groups having 1 to 20 carbon atoms, and examples of the aromatic hydrocarbon group include phenyl, naphthyl, biphenyl, and anthracenyl groups. When R 3 contains an aromatic hydrocarbon group, the aromatic ring may or may not have a substituent. Examples of the substituent include carboxyl group, aliphatic hydrocarbon group, acyl group, alkoxy group, cyano group, hydroxyl group, methacryloxy group, vinyl benzyl ether group, and groups linked to these substituents. When the aromatic hydrocarbon group has a substituent, the carbon number of the substituent is not included in the above carbon number.
以通式(1)所表示之含有磷之(甲基)丙烯醯基化合物的含磷率較佳為1.0至10.0重量%,尤佳為5.0至9.0重量%,更佳為6.0至8.0重量%。 The phosphorus content of the phosphorus-containing (meth)acrylyl compound represented by the general formula (1) is preferably 1.0 to 10.0% by weight, more preferably 5.0 to 9.0% by weight, and more preferably 6.0 to 8.0% by weight. .
以通式(1)所表示之化合物可在使下述通式(3)所表示之化合物與含有1個縮水甘油醚基之化合物進行反應後,藉由(甲基)丙烯酸、(甲基)丙烯酸酐或鹵化(甲基)丙烯醯基化合物來進行(甲基)丙烯醯基化而得到。 The compound represented by the general formula (1) can be obtained by reacting the compound represented by the following general formula (3) with a compound containing one glycidyl ether group, and then using (meth)acrylic acid, (meth) It is obtained by (meth)acrylation with acrylic anhydride or halogenated (meth)acrylyl compound.
於通式(3)中,R1、R2與通式(1)中的規定為同義。以通式(3)所表示之磷化合物只要是具有直接鍵結於磷原子之活性氫的有機磷化合物即可,該例可列舉二甲基膦、二乙基膦、二苯基膦等,膦氧化物類可列舉:二甲基膦氧化物、二乙基膦氧化物、二苯基膦氧化物、膦酸甲基苯酯、第三丁基苯基膦氧化物等,磷酸酯類可列舉:氫亞磷酸二乙酯、氫亞磷酸雙(2-乙基己基)酯、氫亞磷酸二月桂酯、氫亞磷酸二油烯酯、氫亞磷酸二苯酯、9,10-二氫-9-氧雜-10-膦菲-10-氧化物(HCA三光公司製)等,惟並不限定於此等,亦可使用2種以上。 In the general formula (3), R 1 and R 2 are synonymous with those specified in the general formula (1). The phosphorus compound represented by the general formula (3) may be an organic phosphorus compound having an active hydrogen directly bonded to a phosphorus atom. Examples thereof include dimethylphosphine, diethylphosphine, diphenylphosphine, etc. Examples of phosphine oxides include: dimethylphosphine oxide, diethylphosphine oxide, diphenylphosphine oxide, methylphenylphosphonate, tert-butylphenylphosphine oxide, etc. Phosphate esters can be Examples: diethyl hydrogen phosphite, bis(2-ethylhexyl) hydrogen phosphite, dilauryl hydrogen phosphite, dioleyl hydrogen phosphite, diphenyl hydrogen phosphite, 9,10-dihydrogen phosphite -9-oxa-10-phosphine-10-oxide (manufactured by HCA Sanko Co., Ltd.), etc., but are not limited to these, and two or more types may be used.
含有1個縮水甘油醚基之化合物的例子可列舉:乙基縮水甘油醚、丁基縮水甘油醚、第三丁基縮水甘油醚、縮水甘油基異丙醚、2-乙基己基縮水甘油醚、月桂基縮水甘油醚、月桂醇(EO)15縮水甘油醚、C12至13混合醇縮水甘油醚、3-縮水甘油氧基丙基(二甲氧基)甲矽烷、丙烯酸縮水甘油酯、烯丙基縮水 甘油醚、甲基丙烯酸縮水甘油酯、1,1,1,3,5,5,5-七甲基-3-(3-縮水甘油氧基丙基)三矽氧烷、1,2-環氧癸烷縮水甘油基癒創木酚醚(1,2-epoxydecane glycidyl guaiacol ether)、苯基縮水甘油醚、鄰甲酚基縮水甘油醚、間甲酚基縮水甘油醚、對甲酚基縮水甘油醚等甲酚基縮水甘油醚、4-第三丁基苯基縮水甘油醚、苄基縮水甘油醚、酚(EO)5縮水甘油醚4-縮水甘油氧基咔唑、4-第三丁基苄酸縮水甘油基等,惟並不限定於此等,亦可併用2種以上。從容易取得之點來看,較佳為2-乙基己基縮水甘油醚、苯基縮水甘油醚、甲酚基縮水甘油醚、4-第三丁基苯基縮水甘油醚。 Examples of compounds containing one glycidyl ether group include: ethyl glycidyl ether, butyl glycidyl ether, tert-butyl glycidyl ether, glycidyl isopropyl ether, 2-ethylhexyl glycidyl ether, Lauryl glycidyl ether, lauryl alcohol (EO) 15 glycidyl ether, C12 to 13 mixed alcohol glycidyl ether, 3-glycidyloxypropyl (dimethoxy) silane, glycidyl acrylate, allyl shrink Glyceryl ether, glycidyl methacrylate, 1,1,1,3,5,5,5-heptamethyl-3-(3-glycidyloxypropyl)trisiloxane, 1,2-cyclo Oxydecane glycidyl guaiacol ether (1,2-epoxydecane glycidyl guaiacol ether), phenyl glycidyl ether, o-cresolyl glycidyl ether, m-cresolyl glycidyl ether, p-cresolyl glycidyl ether Ethers such as cresolyl glycidyl ether, 4-tert-butylphenyl glycidyl ether, benzyl glycidyl ether, phenol (EO) 5 glycidyl ether, 4-glycidyloxycarbazole, 4-tert-butyl glycidyl benzylate, etc. are not limited to these, and two or more types may be used in combination. From the viewpoint of ease of acquisition, 2-ethylhexyl glycidyl ether, phenyl glycidyl ether, cresolyl glycidyl ether, and 4-tert-butylphenyl glycidyl ether are preferred.
以通式(3)所表示之具有活性氫之磷化合物與含有1個縮水甘油基之環氧樹脂類的反應,可藉由一般所知的方法來進行。亦即將環氧樹脂類添加於具有活性氫之磷化合物,並在反應溫度100℃至200℃,尤佳為120℃至180℃下,於攪拌下進行反應。於此反應的速度較慢之情形時,可視需要使用觸媒以達到生產性的改善。具體的觸媒可使用:苄基二甲胺等三級胺類;氯化四甲銨等四級銨鹽類;三苯基膦、三(2,6-二甲氧基苯基)膦等膦類;溴化乙基三苯基鏻鹽等鏻鹽類;2-甲基咪唑(2-methyl Imidazole)、2-乙基-4-甲基咪唑等咪唑類等各種觸媒。 The reaction between the phosphorus compound having active hydrogen represented by the general formula (3) and the epoxy resin containing one glycidyl group can be carried out by a generally known method. That is, the epoxy resin is added to the phosphorus compound with active hydrogen, and the reaction is carried out under stirring at a reaction temperature of 100°C to 200°C, preferably 120°C to 180°C. When the reaction speed is slow, a catalyst may be used as necessary to improve productivity. Specific catalysts can be used: tertiary amines such as benzyldimethylamine; quaternary ammonium salts such as tetramethylammonium chloride; triphenylphosphine, tris(2,6-dimethoxyphenyl)phosphine, etc. Phosphines; phosphonium salts such as ethyltriphenylphosphonium bromide; imidazoles such as 2-methylimidazole (2-methyl Imidazole) and 2-ethyl-4-methylimidazole and other catalysts.
關於以通式(3)所表示之含有磷之化合物與含有1個縮水甘油基之環氧樹脂類的反應莫耳比,相對於磷化合物的活性氫1莫耳,縮水甘油基為0.80至1.20莫耳,較佳為0.9至1.10莫耳,更佳為0.95至1.05莫耳。為0.80以下時,未反應之具有活性氫之磷化合物於化合物中增加,為1.20以上時,未反應之含有1個縮水甘油基之環氧樹脂於化合物中增加,因而降低耐熱性並且使介電特性惡化,故不佳。 Regarding the reaction molar ratio between the phosphorus-containing compound represented by the general formula (3) and the epoxy resin containing one glycidyl group, the glycidyl group is 0.80 to 1.20 per mole of active hydrogen of the phosphorus compound. Mol, preferably 0.9 to 1.10 mol, more preferably 0.95 to 1.05 mol. When it is below 0.80, the unreacted phosphorus compound with active hydrogen increases in the compound. When it is above 1.20, the unreacted epoxy resin containing one glycidyl group increases in the compound, thus reducing the heat resistance and making the dielectric The characteristics are deteriorated, so it is not good.
從以通式(3)所表示之具有活性氫之磷化合物與含有1個縮水甘油基之環氧樹脂類的反應所得到之含有醇性羥基之含有磷的化合物(以下稱為含有羥基之磷化合物),與(甲基)丙烯酸、鹵化(甲基)丙烯醯基或(甲基)丙烯酸酐之反應,並無特別限制,可與醇化合物或酚化合物之通常的(甲基)丙烯醯基化反應同樣地實施。 A phosphorus-containing compound containing an alcoholic hydroxyl group obtained from the reaction of a phosphorus compound having active hydrogen represented by the general formula (3) and an epoxy resin containing one glycidyl group (hereinafter referred to as hydroxyl-containing phosphorus Compound), the reaction with (meth)acrylic acid, halogenated (meth)acrylyl group or (meth)acrylic anhydride is not particularly limited, and it can react with the usual (meth)acrylyl group of alcohol compound or phenol compound. Chemical reactions are carried out in the same way.
例如在使用(甲基)丙烯酸之情形時,可在硫酸、對甲苯磺酸、甲烷磺酸等強酸觸媒的存在下,將含有羥基之磷化合物與相對於羥基為1至10倍之(甲基)丙烯酸進行縮合反應而製造。由於此反應必須一面將副生成的縮合水排出至系統外一面進行,所以反應溶劑係使用甲苯等之與水進行共沸的烴系溶劑,並將反應液加熱至70至140℃左右來進行。 For example, when using (meth)acrylic acid, in the presence of a strong acid catalyst such as sulfuric acid, p-toluenesulfonic acid, methanesulfonic acid, etc., a phosphorus compound containing a hydroxyl group can be mixed with a ratio of 1 to 10 times (meth)acrylic acid relative to the hydroxyl group. It is produced by condensation reaction of acrylic acid. Since this reaction must be performed while discharging by-produced condensation water out of the system, the reaction solvent is a hydrocarbon solvent such as toluene that azeotropes with water, and the reaction liquid is heated to about 70 to 140°C.
此外,可藉由含有羥基之磷化合物與鹵化(甲基)丙烯醯基或(甲基)丙烯酸酐的反應,來得到本發明之含有磷之(甲基)丙烯醯基化合物。可使用之鹵化(甲基)丙烯醯基可列舉:氟化丙烯醯基、氯化丙烯醯基、溴化丙烯醯基、碘化丙烯醯基等鹵化丙烯醯基;氟化甲基丙烯醯基、甲基丙烯醯氯、溴化甲基丙烯醯基、碘化甲基丙烯醯基等鹵化甲基丙烯醯基。 In addition, the phosphorus-containing (meth)acrylyl compound of the present invention can be obtained by reacting a phosphorus compound containing a hydroxyl group with a halogenated (meth)acrylyl group or (meth)acrylic anhydride. Usable halogenated (meth)acrylyl groups include: fluorinated acrylyl group, chlorinated acrylyl group, bromide acrylyl group, iodinated acrylyl group and other halogenated acrylyl groups; fluorinated methacrylyl group , methacryloyl chloride, methacryloyl bromide, methacryloyl iodide and other halogenated methacrylyl groups.
於本發明的實施中,鹵化(甲基)丙烯醯基、(甲基)丙烯酸酐可使用1種或2種以上的混合物。於本發明中,當中從取得容易之點來看,較佳係使用氯化(甲基)丙烯酸或/及(甲基)丙烯酸酐。 In the implementation of the present invention, one type or a mixture of two or more types of halogenated (meth)acrylyl and (meth)acrylic anhydride can be used. In the present invention, from the viewpoint of ease of acquisition, chlorinated (meth)acrylic acid or/and (meth)acrylic anhydride is preferably used.
相對於使用作為原料之含有磷之酚化合物的羥基1莫耳,鹵化(甲基)丙烯醯基或/及(甲基)丙烯酸酐的用量為0.8至5莫耳,較佳為0.95至4莫耳。鹵化(甲基)丙烯酸或/及(甲基)丙烯酸酐的用量低於上述範圍時,所得到之含有磷 之(甲基)丙烯醯基化合物的耐熱性降低,而且,羥基的殘存量增加而使介電特性惡化,故不佳,用量高於上述範圍時,釜的效率降低,成本增高,故不佳。 The amount of halogenated (meth)acrylyl group or/and (meth)acrylic anhydride is 0.8 to 5 moles, preferably 0.95 to 4 moles, relative to 1 mole of hydroxyl group of the phosphorus-containing phenolic compound used as a raw material. Ear. When the amount of halogenated (meth)acrylic acid or/and (meth)acrylic anhydride is lower than the above range, the resulting phosphorus-containing The heat resistance of the (meth)acrylyl compound decreases, and the residual amount of hydroxyl groups increases, which deteriorates the dielectric properties, so it is undesirable. When the dosage exceeds the above range, the efficiency of the kettle decreases and the cost increases, so it is undesirable. .
於使用鹵化(甲基)丙烯醯基之情形時,由於對應於所使用之鹵化(甲基)丙烯酸的鹵化氫會作為副生成物而生成,所以較佳係併用鹼性化合物,一面捕集所產生的鹵化氫一面進行反應。鹼性化合物並無特別限定,可列舉:三甲胺、三乙胺、二異丙基乙胺、三正丙胺、三異丙胺、三丁胺、N-甲基二乙胺、N-乙基二甲胺、N-乙基二戊胺等脂肪族胺;N,N-二甲基苯胺、二乙基苯胺等芳香族胺;N,N-二甲基環己胺、N,N-二乙基環己胺等脂環式胺;N,N-二甲基胺基吡啶、N-甲基嗎啉、二氮雜雙環十一烯(DBU)、二氮雜雙環壬烯(DBN)、N-甲基吡啶、N-甲基吡咯啶等雜環胺;四甲基乙二胺、三乙二胺等二胺等。從取得的容易度來看,特佳為三甲胺、三乙胺等脂肪族胺、以及吡啶。 When halogenated (meth)acrylyl is used, hydrogen halide corresponding to the halogenated (meth)acrylic acid used is generated as a by-product. Therefore, it is preferable to use a basic compound in combination to capture the halogenated (meth)acrylyl group. The hydrogen halide produced reacts with it. The basic compound is not particularly limited, and examples thereof include trimethylamine, triethylamine, diisopropylethylamine, tri-n-propylamine, triisopropylamine, tributylamine, N-methyldiethylamine, and N-ethyldiamine. Methylamine, N-ethyldipentylamine and other aliphatic amines; N,N-dimethylaniline, diethylaniline and other aromatic amines; N,N-dimethylcyclohexylamine, N,N-diethylamine alicyclic amines such as cyclohexylamine; N,N-dimethylaminopyridine, N-methylmorpholine, diazabicycloundecene (DBU), diazabicyclononene (DBN), N - Heterocyclic amines such as methylpyridine and N-methylpyrrolidine; diamines such as tetramethylethylenediamine and triethylenediamine, etc. In terms of ease of acquisition, aliphatic amines such as trimethylamine and triethylamine, and pyridine are particularly preferred.
相對於使用作為原料之含有羥基之磷化合物的羥基1莫耳,鹼性化合物的用量例如為0.8至7莫耳,較佳約為0.95至5莫耳。三級胺的用量低於上述範圍時,會無法完全地捕集鹵化氫而引起反應裝置的腐蝕,高於上述範圍,成本有增高之傾向。 The amount of the basic compound used is, for example, 0.8 to 7 moles, preferably about 0.95 to 5 moles, based on 1 mole of hydroxyl group of the hydroxyl group-containing phosphorus compound used as a raw material. When the dosage of the tertiary amine is lower than the above range, the hydrogen halide will not be completely captured and corrosion of the reaction device will occur. When the dosage is higher than the above range, the cost will tend to increase.
藉由(甲基)丙烯酸酐來進行反應時,亦可不使用觸媒,惟在反應不易進行之情形時,可使用酯觸媒、酸觸媒、鹼觸媒、路易斯酸觸媒。在此,酯觸媒可例示:乙酸鈉、丙酸鉀、(甲基)丙烯酸鈉等低級羧酸的鈉、鉀等鹼金屬鹽。此外,酸觸媒可例示:硫酸、硼酸等無機酸;甲烷磺酸、對甲苯磺酸等有機酸等。此外,鹼觸媒若是有機鹼,則可例示:三乙胺、三伸乙二胺等含氮脂肪族化合物;吡啶、4-(二甲基胺基)吡啶等含氮芳香族雜環化合物等。此外,路易斯酸觸媒可例示氯化鋁、氯化鋅等。 When the reaction is carried out by (meth)acrylic anhydride, a catalyst does not need to be used. However, when the reaction is difficult to proceed, an ester catalyst, an acid catalyst, an alkali catalyst, or a Lewis acid catalyst can be used. Here, examples of the ester catalyst include alkali metal salts such as sodium and potassium of lower carboxylic acids such as sodium acetate, potassium propionate, and sodium (meth)acrylate. Examples of the acid catalyst include inorganic acids such as sulfuric acid and boric acid; organic acids such as methane sulfonic acid and p-toluenesulfonic acid. In addition, if the alkali catalyst is an organic base, examples thereof include nitrogen-containing aliphatic compounds such as triethylamine and triethylenediamine; nitrogen-containing aromatic heterocyclic compounds such as pyridine and 4-(dimethylamino)pyridine, etc. . Examples of the Lewis acid catalyst include aluminum chloride, zinc chloride, and the like.
相對於所使用之(甲基)丙烯酸酐,觸媒的用量較佳為10%以下,更佳為5%以下。於使用觸媒之情形時,在高於上述範圍時,觸媒的去除會耗費時間,此外,於製品中容易殘存觸媒而導致特性的惡化。 Relative to the (meth)acrylic anhydride used, the amount of catalyst is preferably 10% or less, more preferably 5% or less. When a catalyst is used, if the temperature is higher than the above range, removal of the catalyst will take time. In addition, the catalyst may easily remain in the product, resulting in deterioration of characteristics.
於含有羥基之磷化合物與鹵化(甲基)丙烯醯基或/及(甲基)丙烯酸酐的反應中,較佳係使用有機溶劑作為反應溶劑並在溶液中進行反應。可使用之溶劑只要是與含有羥基之磷化合物及鹵化(甲基)丙烯酸或/及(甲基)丙烯酸酐不具有反應性者,就無特別限定,可列舉:四氫呋喃、二烷、乙酸乙酯、乙腈、苯、甲苯、二甲苯、二氯甲烷、三氯甲烷、四氯化碳、二甲基甲醯胺、二甲基乙醯胺、二甲基亞碸、六甲基磷酸三醯胺、水等溶劑,可視需要組合此等來使用。 In the reaction between a phosphorus compound containing a hydroxyl group and a halogenated (meth)acrylyl group or/and (meth)acrylic anhydride, it is preferred to use an organic solvent as the reaction solvent and carry out the reaction in a solution. The solvent that can be used is not particularly limited as long as it has no reactivity with the phosphorus compound containing a hydroxyl group and the halogenated (meth)acrylic acid or/and (meth)acrylic anhydride. Examples include: tetrahydrofuran, dihydrofuran Alkane, ethyl acetate, acetonitrile, benzene, toluene, xylene, methylene chloride, chloroform, carbon tetrachloride, dimethylformamide, dimethylacetamide, dimethylsulfoxide, hexamethyl Triamide phosphate, water and other solvents can be used in combination as needed.
於含有羥基之磷化合物與鹵化(甲基)丙烯酸或/及(甲基)丙烯酸酐的反應中,反應溫度較佳為-50至150℃,於高溫下進行反應時,產生聚合反應之可能性高,所以尤佳為-25至100℃。此外,反應時間係因應所設定之反應溫度來適當地設定,較佳係設定在1至48小時的範圍。 In the reaction between phosphorus compounds containing hydroxyl groups and halogenated (meth)acrylic acid or/and (meth)acrylic anhydride, the reaction temperature is preferably -50 to 150°C. When the reaction is carried out at high temperatures, there is a possibility of polymerization. High, so -25 to 100℃ is especially preferred. In addition, the reaction time is appropriately set according to the set reaction temperature, and is preferably set in the range of 1 to 48 hours.
含有羥基之磷化合物與(甲基)丙烯酸、鹵化(甲基)丙烯醯基或(甲基)丙烯酸酐的反應,亦可在阻聚劑的存在下進行。藉由添加阻聚劑,可防止提供至反應之(甲基)丙烯酸、鹵化(甲基)丙烯醯基或(甲基)丙烯酸酐,或是作為目的生成物之(甲基)丙烯酸酯進行聚合而副生成低聚物之情況。阻聚劑並無特別限制,可使用一般所知者,除了對苯二酚(Hydroquinone)、羥基單甲醚、第三丁基鄰苯二酚(t-Butyl Catechol)、第三丁基對苯二酚、4-甲氧基酚、4-甲氧基-1-萘酚、吩噻嗪(Phenothiazine)等有機化合物之外,可列舉氯化銅、硫化銅等銅化合物等,亦可組合此等而使用。 The reaction of a phosphorus compound containing a hydroxyl group with (meth)acrylic acid, halogenated (meth)acrylyl or (meth)acrylic anhydride can also be carried out in the presence of a polymerization inhibitor. By adding a polymerization inhibitor, it is possible to prevent the polymerization of (meth)acrylic acid, halogenated (meth)acrylyl, (meth)acrylic anhydride, or (meth)acrylic acid ester that is the target product supplied to the reaction. And the situation of by-product oligomers. The polymerization inhibitor is not particularly limited, and commonly known ones can be used, except hydroquinone, hydroxymonomethyl ether, t-Butyl Catechol, and t-butyl p-phenylene. In addition to organic compounds such as diphenols, 4-methoxyphenol, 4-methoxy-1-naphthol, and phenothiazine, copper compounds such as copper chloride and copper sulfide can also be used in combination. Wait and use.
在此反應結束後,可視需要對所得到之反應液(反應混合物)實施反應溶劑的餾除、溶劑取代等,並應用藉由水等所進行之洗淨,或是活性碳處理、二氧化矽凝膠層析等手段來進行精製,可取得作為目的物之本發明之(甲基)丙烯醯基化合物。 After the reaction is completed, the reaction liquid (reaction mixture) obtained may be subjected to distillation of the reaction solvent, solvent substitution, etc. if necessary, and may be washed with water, etc., or treated with activated carbon or silica. By purifying by means such as gel chromatography, the target (meth)acrylyl compound of the present invention can be obtained.
接著說明以本發明之含有磷之(甲基)丙烯醯基化合物為必要成分,並調配硬化性樹脂或熱塑性樹脂而成之難燃性樹脂組成物。 Next, a flame-retardant resin composition containing the phosphorus-containing (meth)acrylyl compound of the present invention as an essential component and blending a curable resin or a thermoplastic resin will be described.
硬化性樹脂可列舉例如:不飽和聚酯樹脂、硬化型順丁烯二醯亞胺樹脂、環氧樹脂、聚氰酸酯樹脂、酚樹脂、於分子中具有1個以上的聚合性不飽和烴基之1種以上的乙烯基化合物類等,較佳為環氧樹脂、於分子中具有1個以上的聚合性不飽和烴基之1種以上的乙烯基化合物類。 Examples of the curable resin include unsaturated polyester resin, curable maleimide resin, epoxy resin, polycyanate resin, phenol resin, and those having one or more polymerizable unsaturated hydrocarbon groups in the molecule. The one or more vinyl compounds, etc. are preferably epoxy resins and one or more vinyl compounds having one or more polymerizable unsaturated hydrocarbon groups in the molecule.
於硬化性樹脂為環氧樹脂之情形時,較佳為選自於1分子中具有2個以上的環氧基之環氧樹脂之1種以上的環氧樹脂。該環氧樹脂可列舉:甲酚-酚醛型環氧樹脂、三苯基甲烷型環氧樹脂、聯苯環氧樹脂、萘型環氧樹脂、雙酚A型環氧樹脂及雙酚F型環氧樹脂等。此等可單獨使用或組合2種以上而使用。藉由使用如此之環氧樹脂,可考量將對於本發明之硬化性樹脂組成物所具有的優異介電特性與流動性所帶來之影響抑制在最低限度,而充分地提高硬化物的耐熱性與密著性。 When the curable resin is an epoxy resin, it is preferably one or more epoxy resins selected from epoxy resins having two or more epoxy groups in one molecule. Examples of the epoxy resin include: cresol-novolac type epoxy resin, triphenylmethane type epoxy resin, biphenyl epoxy resin, naphthalene type epoxy resin, bisphenol A type epoxy resin and bisphenol F type epoxy resin. Oxygen resin, etc. These can be used individually or in combination of 2 or more types. By using such an epoxy resin, it is possible to minimize the impact on the excellent dielectric properties and fluidity of the curable resin composition of the present invention, thereby fully improving the heat resistance of the cured product. and tightness.
此外,於含有環氧樹脂之情形時,除了環氧樹脂之外,亦可使用硬化劑。硬化劑並無特別限制,可列舉例如:酚系硬化劑、胺系化合物、醯胺系化合物、酸酐系化合物、萘酚(Naphthol)系硬化劑、活性酯系硬化劑、苯并(Benzoxazine)系硬化劑、氰酸酯系硬化劑等。此等可使用1種或組合2種以上而使用。 In addition, when an epoxy resin is contained, a hardener may be used in addition to the epoxy resin. The curing agent is not particularly limited, and examples thereof include: phenol-based curing agents, amine-based compounds, amide-based compounds, acid anhydride-based compounds, naphthol-based curing agents, active ester-based curing agents, benzo (Benzoxazine)-based hardener, cyanate ester-based hardener, etc. These can be used 1 type or in combination of 2 or more types.
再者,於調配環氧樹脂之情形時,可視需要來使用硬化促進劑。例如為胺類、咪唑類、有機膦類、路易斯酸等。相對於環氧樹脂100重量份,添加量通常為0.2至5重量份的範圍。 Furthermore, when formulating epoxy resin, a hardening accelerator may be used as needed. Examples include amines, imidazoles, organic phosphines, Lewis acids, etc. The amount added is usually in the range of 0.2 to 5 parts by weight relative to 100 parts by weight of the epoxy resin.
於硬化性樹脂為於分子中具有1個以上的聚合性不飽和烴基之1種以上的乙烯基化合物類(以下亦稱為乙烯基化合物類)之情形時,該種類並無特別限定。亦即,乙烯基化合物類只要是可藉由與本發明之含有磷之(甲基)丙烯醯基化合物進行反應以形成交聯而硬化者即可。聚合性不飽和烴基尤佳為碳-碳不飽和雙鍵,尤佳係於分子中具有2個以上的碳-碳不飽和雙鍵之化合物。 When the curable resin is one or more vinyl compounds (hereinafter also referred to as vinyl compounds) having one or more polymerizable unsaturated hydrocarbon groups in the molecule, the type is not particularly limited. That is, the vinyl compounds may be those that can form crosslinks and be hardened by reacting with the phosphorus-containing (meth)acrylyl compound of the present invention. The polymerizable unsaturated hydrocarbon group is preferably a carbon-carbon unsaturated double bond, and is particularly preferably a compound having two or more carbon-carbon unsaturated double bonds in the molecule.
作為硬化性樹脂的乙烯基化合物類之每1分子之碳-碳不飽和雙鍵的平均個數(乙烯基(包括取代乙烯基)的數目。亦稱為末端雙鍵數。),係因乙烯基化合物類的Mw而不同,較佳例如為1至20個,尤佳為2至18個。此末端雙鍵數過少時,硬化物的耐熱性會有難以得到充足程度之傾向。此外,末端雙鍵數過多時,反應性變得過高,而有產生例如硬化性樹脂組成物的保存穩定性降低或是硬化性樹脂組成物的流動性降低等缺失之疑慮。 The average number of carbon-carbon unsaturated double bonds per molecule of vinyl compounds that are curable resins (the number of vinyl groups (including substituted vinyl groups). It is also called the number of terminal double bonds.) is due to ethylene Depending on the Mw of the base compound, the number is preferably 1 to 20, and particularly preferably 2 to 18. If the number of terminal double bonds is too small, it will tend to be difficult to obtain sufficient heat resistance of the cured product. In addition, when the number of terminal double bonds is too large, the reactivity may become too high, which may cause defects such as a decrease in the storage stability of the curable resin composition or a decrease in the fluidity of the curable resin composition.
乙烯基化合物類可列舉:異三聚氰酸三烯丙酯(TAIC)等異三聚氰酸三烯酯化合物、末端經(甲基)丙烯醯基或苯乙烯基改質的改質聚苯醚(PPE)、於分子中具有2個以上的(甲基)丙烯醯基之多官能(甲基)丙烯酸酯化合物、聚丁二烯等般之於分子中具有2個以上的乙烯基之乙烯基化合物(多官能乙烯基化合物)、以及苯乙烯、二乙烯基苯等乙烯基苄基化合物等。當中較佳為:於分子中具有2個以上的碳-碳雙鍵者,具體而言可列舉:TAIC、多官能(甲基)丙烯酸酯化合物、改質PPE樹脂、多官能乙烯基化合物、以及二乙烯基苯化合物等。使用此等時,可考量藉由硬化反應而更適當地形成交聯,可進一步提高硬化性樹脂 組成物之硬化物的耐熱性。此外,可單獨使用此等或組合2種以上而使用。此外,亦可併用:於分子中具有1個碳-碳不飽和雙鍵之化合物。於分子中具有1個碳-碳不飽和雙鍵之化合物可列舉:於分子中具有1個乙烯基之化合物(單乙烯基化合物)等。 Examples of vinyl compounds include: isotrienyl isocyanurate compounds such as triallyl isocyanurate (TAIC), modified polystyrene whose terminals are modified with (meth)acrylyl groups or styrene groups. Ether (PPE), polyfunctional (meth)acrylate compounds with two or more (meth)acrylyl groups in the molecule, polybutadiene, etc. Generally, ethylene with two or more vinyl groups in the molecule base compounds (polyfunctional vinyl compounds), and vinyl benzyl compounds such as styrene and divinylbenzene. Among them, those with more than two carbon-carbon double bonds in the molecule are preferred. Specifically, TAIC, multifunctional (meth)acrylate compounds, modified PPE resins, multifunctional vinyl compounds, and Divinylbenzene compounds, etc. When using these, it can be considered to form crosslinks more appropriately through the curing reaction, thereby further improving the curability of the resin. The heat resistance of the hardened material of the composition. In addition, these can be used individually or in combination of 2 or more types. In addition, compounds having one carbon-carbon unsaturated double bond in the molecule can also be used together. Examples of compounds having one carbon-carbon unsaturated double bond in the molecule include compounds having one vinyl group in the molecule (monovinyl compounds).
熱塑性樹脂可列舉例如:聚苯乙烯、聚苯醚樹脂、聚醚醯亞胺樹脂、聚醚碸樹脂、PPS樹脂、聚環戊二烯樹脂、聚環烯烴樹脂等,或是已知的熱塑性彈性體(例如苯乙烯-乙烯-丙烯共聚物、苯乙烯-乙烯-丁烯共聚物、苯乙烯-丁二烯共聚物、苯乙烯-異戊二烯共聚物、氫化苯乙烯-丁二烯共聚物、氫化苯乙烯-異戊二烯共聚物等),或是橡膠類(例如聚丁二烯、聚異戊二烯)。較佳可列舉未改質或改質聚苯醚樹脂、氫化苯乙烯-丁二烯共聚物。 Thermoplastic resins include, for example, polystyrene, polyphenylene ether resin, polyether imide resin, polyether styrene resin, PPS resin, polycyclopentadiene resin, polycycloolefin resin, etc., or known thermoplastic elastic resins. body (such as styrene-ethylene-propylene copolymer, styrene-ethylene-butylene copolymer, styrene-butadiene copolymer, styrene-isoprene copolymer, hydrogenated styrene-butadiene copolymer , hydrogenated styrene-isoprene copolymer, etc.), or rubber (such as polybutadiene, polyisoprene). Preferred examples include unmodified or modified polyphenylene ether resin and hydrogenated styrene-butadiene copolymer.
於本發明之難燃性樹脂組成物中,亦可調配藉由光或/及熱而產生自由基之自由基聚合起始劑(聚合觸媒或交聯劑)。光聚合起始劑可列舉例如:安息香(Benzoin)、安息香甲醚、安息香乙醚、安息香丙醚、安息香異丁醚等安息香類;苯乙酮(Acetophenone)、2,2-二乙氧基-2-苯基苯乙酮、2,2-二乙氧基-2-苯基苯乙酮、1,1-二氯苯乙酮、2-羥基-2-甲基-苯基丙烷-1-酮、二乙氧基苯乙酮、1-羥基環己基苯基酮、2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基丙烷-1-酮等苯乙酮類;2-乙基蒽醌(2-ethyl Anthraquinone)、2-第三丁基蒽醌、2-氯蒽醌、2-戊基蒽醌等蒽醌類;2,4-二乙基噻吨酮(2,4-diethyl Thioxanthone)、2-異丙基噻吨酮、2-氯噻吨酮等噻吨酮類;苯乙酮二甲基縮酮、苄基二甲基縮酮等縮酮類;二苯基酮(Benzophenone)、4-苄醯基-4'-甲基二苯基硫化物、4,4'-雙甲基胺基二苯基酮等二苯基酮類;2,4,6-三甲基苄醯基二苯基膦氧化物、雙(2,4,6-三甲基苄醯基)-苯基膦氧化物等膦氧化物類等。 The flame-retardant resin composition of the present invention may also contain a radical polymerization initiator (polymerization catalyst or cross-linking agent) that generates free radicals by light and/or heat. Examples of the photopolymerization initiator include benzoins such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, and benzoin isobutyl ether; acetophenone, 2,2-diethoxy-2 -Phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone, 1,1-dichloroacetophenone, 2-hydroxy-2-methyl-phenylpropan-1-one , diethoxyacetophenone, 1-hydroxycyclohexylphenylketone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylpropan-1-one and other benzene esters Ketones; anthraquinones such as 2-ethyl Anthraquinone, 2-tert-butylanthraquinone, 2-chloroanthraquinone, 2-pentylanthraquinone; 2,4-diethylthiophene Thioxanthones such as 2,4-diethyl Thioxanthone, 2-isopropylthioxanthone, and 2-chlorothioxanthone; ketals such as acetophenone dimethyl ketal and benzyl dimethyl ketal Ketones; diphenyl ketones such as Benzophenone, 4-benzyl-4'-methyldiphenyl sulfide, 4,4'-bismethylaminodiphenylketone; 2 , 4,6-trimethylbenzyldiphenylphosphine oxide, bis(2,4,6-trimethylbenzyldiphenyl)-phenylphosphine oxide and other phosphine oxides.
熱自由基起始劑係有:過氧化苄醯、氫過氧化異丙苯、2,5-二氫過氧化-2,5-二甲基己烷、2,5-二甲基-2,5-二(第三丁基過氧基)己炔-3、過氧化二(第三丁基)、過氧化第三丁基異丙苯、1,3-雙(丁基過氧基異丙基)苯、α,α'-雙(第三丁基過氧基-間異丙基)苯、2,5-二甲基-2,5-二(第三丁基過氧基)己烷、過氧化二異丙苯、間苯二甲酸二(第三丁基過氧基)酯、苄酸第三丁基過氧酯、2,2-雙(第三丁基過氧基)丁烷、2,2-雙(第三丁基過氧基)辛烷、2,5-二甲基-2,5-二(苄醯基過氧基)己烷、過氧化二(三甲基矽基)、過氧化三甲基矽基三苯基矽基等過氧化物,惟並不限定於此等。此外,雖非過氧化物,惟2,3-二甲基-2,3-二苯基丁烷亦可使用作為自由基聚合起始劑。然而,並不限定於此等例,亦可組合2種以上的自由基起始劑而使用。 Thermal free radical initiators include: benzyl peroxide, cumene hydroperoxide, 2,5-dihydroperoxy-2,5-dimethylhexane, 2,5-dimethyl-2, 5-Di(tert-butylperoxy)hexyne-3, di(tert-butyl) peroxide, tert-butylcumyl peroxide, 1,3-bis(butylperoxycumyl) methyl)benzene, α,α'-bis(tert-butylperoxy-m-isopropyl)benzene, 2,5-dimethyl-2,5-di(tert-butylperoxy)hexane , dicumyl peroxide, di(tert-butylperoxy)isophthalate, tert-butylperoxybenzoate, 2,2-bis(tert-butylperoxy)butane , 2,2-bis(tert-butylperoxy)octane, 2,5-dimethyl-2,5-di(benzylperoxy)hexane, bis(trimethylsilyl peroxide) peroxide), trimethylsilyl peroxide, triphenylsilyl peroxide and other peroxides, but are not limited to these. In addition, although it is not a peroxide, 2,3-dimethyl-2,3-diphenylbutane can also be used as a free radical polymerization initiator. However, the invention is not limited to these examples, and two or more radical initiators may be used in combination.
自由基聚合起始劑的調配量相對於含有磷之(甲基)丙烯醯基化合物100重量份,較佳為0.01至10重量份,尤佳為0.1至5重量份。 The compounding amount of the radical polymerization initiator is preferably 0.01 to 10 parts by weight, and particularly preferably 0.1 to 5 parts by weight based on 100 parts by weight of the (meth)acryl compound containing phosphorus.
本發明之難燃性樹脂組成物必須含有以通式(1)所表示之含有磷之(甲基)丙烯醯基化合物作為反應型難燃劑,以組成物計的含磷率較佳為0.5至5.0重量%,尤佳為1.0至4.0重量%。 The flame-retardant resin composition of the present invention must contain a phosphorus-containing (meth)acrylyl compound represented by the general formula (1) as a reactive flame retardant, and the phosphorus content rate based on the composition is preferably 0.5. to 5.0% by weight, preferably 1.0 to 4.0% by weight.
於本發明之難燃性樹脂組成物中,可調配填充劑。填充劑可列舉為了提高硬化性樹脂組成物之硬化物的耐熱性或難燃性所添加者等,可使用一般所知的填充劑,惟並無特別限定。此外,藉由含有填充劑,可進一步提高耐熱性、尺寸穩定性及難燃性等。具體而言可列舉:球狀二氧化矽等二氧化矽;氧化鋁、氧化鈦及雲母等金屬氧化物;氫氧化鋁、氫氧化鎂等金屬氫氧化物;滑石、硼酸鋁、硫酸鋇及碳酸鈣等。在使用氫氧化鋁、氫氧化鎂等金屬氫氧化物之情形時,係作用為難燃輔助劑,即使含磷率少,亦可確保難燃性。當中較佳為二氧化 矽、雲母及滑石,尤佳為球狀二氧化矽。此外,可單獨使用此等的1種或是組合2種以上而使用。 A filler can be blended into the flame-retardant resin composition of the present invention. Examples of the filler include those added in order to improve the heat resistance or flame retardancy of the cured product of the curable resin composition. Generally known fillers can be used, but are not particularly limited. In addition, by containing fillers, heat resistance, dimensional stability, flame retardancy, etc. can be further improved. Specific examples include: silica such as spherical silica; metal oxides such as aluminum oxide, titanium oxide, and mica; metal hydroxides such as aluminum hydroxide and magnesium hydroxide; talc, aluminum borate, barium sulfate, and carbonic acid Calcium etc. When metal hydroxides such as aluminum hydroxide and magnesium hydroxide are used, they function as flame retardant auxiliaries and ensure flame retardancy even if the phosphorus content is low. Preferred among them is dioxide Silicon, mica and talc, especially spherical silicon dioxide. In addition, these can be used individually by 1 type or in combination of 2 or more types.
填充劑可直接使用,亦可使用經環氧矽烷型式或胺矽烷型式等矽烷偶合劑進行表面處理後者。從與自由基聚合起始劑之反應性的觀點來看,此矽烷偶合劑較佳為乙烯基矽烷型式、甲基丙烯氧矽烷型式、丙烯氧矽烷型式及苯乙烯矽烷型式的矽烷偶合劑。藉此提高與金屬箔之接著強度或是樹脂彼此的層間接著強度。此外,亦可不採用對填充劑預先進行表面處理之方法,而是藉由整體摻合法添加上述矽烷偶合劑而使用。 The filler can be used directly, or it can be surface-treated with a silane coupling agent such as epoxy silane type or amine silane type. From the viewpoint of reactivity with the radical polymerization initiator, the silane coupling agent is preferably a vinyl silane type, a methacryloxy silane type, a propylene oxy silane type, and a styrene silane type silane coupling agent. This improves the bonding strength with metal foil or the layer-to-layer bonding strength between resins. In addition, it is also possible to add the above-mentioned silane coupling agent by an integral blending method without performing surface treatment on the filler in advance.
相對於排除填充劑之固形份(含有單體等有機成分與難燃劑,排除溶劑)的合計100質量份,填充劑的含量較佳為10至200質量份,尤佳為30至150質量份。 The content of the filler is preferably 10 to 200 parts by mass, particularly preferably 30 to 150 parts by mass, relative to a total of 100 parts by mass of solid content (including organic components such as monomers and flame retardants, excluding solvents) excluding fillers. .
於本發明之難燃性樹脂組成物中,可更含有上述以外的添加劑。添加劑可列舉例如:聚矽氧系消泡劑及丙烯酸酯系消泡劑等的消泡劑、熱穩定劑、抗靜電劑、紫外線吸收劑、染料或顏料、平滑劑、濕潤分散劑等分散劑等。 The flame-retardant resin composition of the present invention may further contain additives other than those mentioned above. Examples of additives include defoaming agents such as silicone-based defoaming agents and acrylate-based defoaming agents, heat stabilizers, antistatic agents, ultraviolet absorbers, dispersants such as dyes or pigments, smoothing agents, and moist dispersants. wait.
使本發明之難燃性樹脂組成物硬化而得到之硬化物,可使用作為成型物、積層物、注模物、接著劑、塗膜、膜。例如,半導體封裝材料的硬化物為注模物或成型物,得到該用途的硬化物之方法係可使用注模或轉注成形機、射出成形機等,將硬化性樹脂組成物進行成形,然後以80至230℃加熱0.5至10小時而藉此得到硬化物。 The cured product obtained by curing the flame-retardant resin composition of the present invention can be used as a molded product, a laminated product, an injection molded product, an adhesive, a coating, or a film. For example, a cured product of a semiconductor packaging material is an injection molded product or a molded product. A method for obtaining a cured product for this purpose is to use an injection molding or transfer molding machine, an injection molding machine, etc. to mold a curable resin composition, and then The cured product is obtained by heating at 80 to 230°C for 0.5 to 10 hours.
本發明之難燃性樹脂組成物亦可使用作為預浸體。於製造預浸體時,係以含浸於用以形成預浸體之基材(纖維質基材)的目的、或是構成為形成電路基板之電路基板材料的目的,可調製為清漆狀而形成為樹脂清漆。此樹脂清漆 適合於電路基板用,可使用作為電路基板材料用清漆。在此所謂電路基板材料的用途,具體而言可列舉:印刷配線基板、印刷電路板、可撓性印刷配線板、增層(build-up)配線板等。 The flame-retardant resin composition of the present invention can also be used as a prepreg. When manufacturing a prepreg, it can be prepared into a varnish for the purpose of impregnating the base material (fibrous base material) used to form the prepreg or the circuit board material forming the circuit board. For resin varnish. This resin varnish Suitable for circuit boards and can be used as varnish for circuit board materials. The use of the circuit board material here specifically includes printed wiring boards, printed wiring boards, flexible printed wiring boards, build-up wiring boards, and the like.
上述樹脂清漆所使用有機溶劑只要是不會阻礙硬化反應者,就無特別限定。可列舉例如:丙酮、丁酮、甲基異丁酮等酮類;乙酸乙酯、乙酸丙酯、乙酸丁酯等酯類;二甲基乙醯胺、二甲基甲醯胺等極性溶劑類;甲苯、二甲苯等芳香族烴溶劑類等,此等可使用1種或混合2種以上而使用。從介電特性之觀點來看,較佳為苯、甲苯、二甲苯等芳香族烴類。 The organic solvent used in the resin varnish is not particularly limited as long as it does not inhibit the hardening reaction. Examples include ketones such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; esters such as ethyl acetate, propyl acetate, and butyl acetate; and polar solvents such as dimethylacetamide and dimethylformamide. ; Aromatic hydrocarbon solvents such as toluene and xylene can be used alone or in a mixture of two or more types. From the viewpoint of dielectric properties, aromatic hydrocarbons such as benzene, toluene, and xylene are preferred.
於製作樹脂清漆時,相對於本發明之硬化性樹脂組成物100重量份,所使用之有機溶劑的量較佳為5至900重量份,尤佳為10至700重量份,特佳為20至500重量份。 When making a resin varnish, the amount of organic solvent used is preferably 5 to 900 parts by weight, particularly preferably 10 to 700 parts by weight, and particularly preferably 20 to 700 parts by weight relative to 100 parts by weight of the curable resin composition of the present invention. 500 parts by weight.
製作預浸體時所使用之基材係使用一般所知的材料,例如分別單獨或是併用2種以上之玻璃纖維、碳纖維、聚酯纖維、聚醯胺纖維、氧化鋁纖維、紙等基材。於此等基材中,亦可視需要,以改善樹脂與基材之界面上的接著性者為目的而使用偶合劑。偶合劑可使用矽烷偶合劑、鈦酸酯偶合劑、鋁系偶合劑、鋯鋁酸酯偶合劑等一般者。 The base materials used when making prepregs are generally known materials, such as glass fiber, carbon fiber, polyester fiber, polyamide fiber, alumina fiber, paper and other base materials, either alone or in combination. . In these base materials, a coupling agent may also be used for the purpose of improving the adhesion at the interface between the resin and the base material, if necessary. As the coupling agent, general ones such as silane coupling agent, titanate coupling agent, aluminum-based coupling agent, and zircoaluminate coupling agent can be used.
得到預浸體之方法可列舉在使上述樹脂清漆含浸於基材後進行乾燥之方法。含浸係藉由浸漬(浸泡,dipping)、塗佈等來進行。含浸亦可視需要重複進行複數次,此外,此時亦可使用組成或濃度不同的複數種溶液來重複進行含浸,並調整為最終所期望之樹脂組成及樹脂量。於含浸後,可於100至180℃進行1至30分鐘的加熱乾燥而得到預浸體。在此,預浸體中的樹脂量較佳係設成為樹脂份30至80重量%。 A method of obtaining a prepreg includes a method of impregnating the base material with the resin varnish and then drying the base material. Impregnation is performed by dipping, coating, etc. The impregnation can also be repeated multiple times as necessary. In addition, at this time, multiple solutions with different compositions or concentrations can be used to repeat the impregnation, and the impregnation can be adjusted to the final desired resin composition and resin amount. After impregnation, the prepreg can be obtained by heating and drying at 100 to 180° C. for 1 to 30 minutes. Here, the amount of resin in the prepreg is preferably 30 to 80% by weight of the resin content.
本發明之硬化性樹脂組成物亦可使用作為積層體。於使用預浸體來形成積層體時,係積層一片或複數片預浸體並將金屬箔配置在單側或兩側以構成積層物,然後將此積層物進行加熱加壓而形成積層一體化。在此,金屬箔可使用銅、鋁、黃銅、鎳等的單獨金屬箔、合金金屬箔或是複合的金屬箔。將積層物進行加熱加壓之條件,可在使硬化性樹脂組成物硬化之條件下適當地調整來進行加熱加壓,惟加壓的壓力過低時,氣泡殘留於所得到之積層體的內部,有時會導致電特性的降低,較佳係在滿足成形性之條件下進行加壓。例如可分別將溫度設定為180至250℃,壓力設定為49.0至490.3N/cm2(5至50kgf/cm2),加熱加壓時間設定為40至240分鐘。再者,可將所得到之單層的積層體使用作為內層材來製作多層板。在此情形時,首先藉由加成法或減成法等在積層體形成電路,並藉由酸溶液來處理所形成之電路表面以施以黑化處理,而得到內層材。然後藉由樹脂片、附樹脂之金屬箔或預浸體,於此內層材之單側或兩側的電路形成面形成絕緣層,並且於絕緣層的表面上形成導體層,而形成多層板。 The curable resin composition of the present invention can also be used as a laminated body. When using prepregs to form a laminated body, one or a plurality of prepregs are laminated and metal foil is placed on one or both sides to form a laminated body, and then the laminated body is heated and pressurized to form a laminated body. . Here, as the metal foil, a single metal foil, an alloy metal foil, or a composite metal foil such as copper, aluminum, brass, or nickel can be used. The conditions for heating and pressurizing the laminate can be appropriately adjusted under the conditions for hardening the curable resin composition. However, if the pressure is too low, air bubbles will remain inside the resulting laminate. , sometimes leading to a decrease in electrical characteristics, it is best to press under conditions that satisfy formability. For example, the temperature can be set to 180 to 250°C, the pressure to 49.0 to 490.3N/cm 2 (5 to 50kgf/cm 2 ), and the heating and pressurizing time to 40 to 240 minutes. Furthermore, the obtained single-layered laminate can be used as an inner layer material to produce a multilayer board. In this case, a circuit is first formed on the laminate by an additive method or a subtractive method, and the surface of the formed circuit is treated with an acid solution to perform a blackening treatment to obtain an inner layer material. Then, an insulating layer is formed on the circuit forming surface on one or both sides of the inner layer using a resin sheet, metal foil with resin, or prepreg, and a conductor layer is formed on the surface of the insulating layer to form a multilayer board. .
此外,亦可將本發明之硬化性組成物使用為增層膜。由本發明之樹脂組成物來製造增層膜之方法可列舉例如:將上述樹脂清漆塗佈於支撐膜上並進行乾燥而形成膜狀的絕緣層之方法。如此地形成之膜狀的絕緣層可使用作為多層印刷配線板用的增層膜。 In addition, the curable composition of the present invention can also be used as a build-up film. An example of a method for producing a build-up film from the resin composition of the present invention is a method of applying the above-mentioned resin varnish on a support film and drying it to form a film-like insulating layer. The film-like insulating layer formed in this way can be used as a build-up film for multilayer printed wiring boards.
[實施例] [Example]
接著藉由實施例來說明本發明,惟本發明並不限定於此等。各例中的份皆為重量份。 Next, the present invention will be explained through examples, but the present invention is not limited thereto. Parts in each example are parts by weight.
合成例、實施例中的物性測定係藉由下列所示之方法來進行。 The physical properties in the synthesis examples and examples were measured by the methods shown below.
(1)含磷率:於試樣中加入硫酸、鹽酸、過氯酸,然後加熱並進行濕式灰化以使所有的磷原子成為正磷酸。於硫酸性溶液中使偏釩酸鹽及鉬酸鹽進行反應,並測定所生成之磷釩鉬酸錯合物於420nm時之吸光度,然後藉由預先使用磷酸二氫鉀所製作之校正曲線,以%來表示所求取之磷原子含有率。 (1) Phosphorus content: Add sulfuric acid, hydrochloric acid, and perchloric acid to the sample, then heat and perform wet ashing to turn all phosphorus atoms into orthophosphoric acid. React metavanadate and molybdate in a sulfuric acid solution, and measure the absorbance of the generated phosphovanadium molybdate complex at 420 nm, and then use a calibration curve prepared in advance using potassium dihydrogen phosphate, Express the obtained phosphorus atom content rate in %.
(2)溶劑溶解性:在以甲苯為溶劑並調整為固形份50質量%之清漆中,將經過1週後無析出者判定為○,將觀察到析出者判定為×。 (2) Solvent solubility: In a varnish using toluene as a solvent and adjusted to a solid content of 50% by mass, a case where no precipitation occurred after one week was judged as ○, and a case where precipitation was observed was judged as ×.
(3)玻璃轉移溫度:使用示差掃描熱析法並以10℃/分的升溫速度,從基線移位(baseline shift)來求取。 (3) Glass transition temperature: determined from the baseline shift using differential scanning thermal analysis at a temperature rise rate of 10°C/min.
(4)相對介電常數及損耗正切:依據IPC-TM-6502.5.5.9規格,使用材料分析儀(AGILENT Technologies公司製)並藉由容量法來求取於頻率1GHz時之介電常數及損耗正切。 (4) Relative dielectric constant and loss tangent: According to the IPC-TM-6502.5.5.9 specification, use a material analyzer (manufactured by AGILENT Technologies) and use the capacitance method to determine the dielectric constant and loss tangent at a frequency of 1 GHz. .
(5)難燃性:依據UL94並藉由垂直法來進行評估。評估係以N.C.(Non Classified)、V-0、V-1、V-2來記載。 (5) Flame retardancy: evaluated by vertical method according to UL94. The evaluation system is recorded in N.C. (Non Classified), V-0, V-1, and V-2.
(合成例1)含有羥基之磷化合物A的合成 (Synthesis Example 1) Synthesis of hydroxyl-containing phosphorus compound A
將下述結構式的9,10-二氫-9-氧雜-10-膦菲-10-氧化物150份、以及甲苯65份投入於具備攪拌裝置、溫度計、冷卻管、氮氣導入裝置之玻璃製可分離式燒瓶,並於80℃溶解。 Put 150 parts of 9,10-dihydro-9-oxa-10-phosphine-10-oxide of the following structural formula and 65 parts of toluene into a glass equipped with a stirring device, a thermometer, a cooling tube, and a nitrogen introduction device. Make a detachable flask and dissolve at 80°C.
然後將下述結構式的苯基縮水甘油醚105份投入於具備攪拌裝置、溫度計、迪安-斯塔克(Dean-Stark)裝置、氮氣導入裝置之玻璃製可分離式燒瓶, Then, 105 parts of phenyl glycidyl ether of the following structural formula was put into a glass separable flask equipped with a stirring device, a thermometer, a Dean-Stark device, and a nitrogen introduction device.
升溫至110℃並加入三苯基膦0.51份,一面去除甲苯一面更加熱至160℃,並進行5小時的反應。然後藉由真空泵減壓至1kPa以完全地餾除甲苯,而得到250份之下述結構式的含有羥基之磷化合物A。 The temperature was raised to 110°C, 0.51 part of triphenylphosphine was added, and the temperature was further heated to 160°C while removing toluene, and the reaction was carried out for 5 hours. Then, the pressure was reduced to 1 kPa with a vacuum pump to completely distill off the toluene, and 250 parts of the hydroxyl-containing phosphorus compound A having the following structural formula was obtained.
測定含磷率,結果為8.4%。 The phosphorus content was measured and the result was 8.4%.
(合成例2)含有羥基之磷化合物B的合成 (Synthesis Example 2) Synthesis of hydroxyl-containing phosphorus compound B
使用下述結構式的4-第三丁基苯基縮水甘油醚143份來取代苯基縮水甘油醚, Use 143 parts of 4-tert-butylphenyl glycidyl ether of the following structural formula to replace phenyl glycidyl ether,
並將三苯基膦的用量變更為0.59份,除此之外,其他進行與合成例1相同之操作而得到290份之含有羥基之磷化合物B。 Except for changing the usage amount of triphenylphosphine to 0.59 parts, the same operation as Synthesis Example 1 was performed to obtain 290 parts of hydroxyl-containing phosphorus compound B.
測定含磷率,結果為7.2%。 The phosphorus content was measured and the result was 7.2%.
(合成例3)含有羥基之磷化合物C的合成 (Synthesis Example 3) Synthesis of hydroxyl-containing phosphorus compound C
使用下述結構式的2-乙基己基縮水甘油醚129份來取代苯基縮水甘油醚, Use 129 parts of 2-ethylhexyl glycidyl ether of the following structural formula to replace phenyl glycidyl ether,
並將三苯基膦的用量變更為0.56份,除此之外,其他進行與合成例1相同之操作而得到275份之含有羥基之磷化合物C。 Except for changing the usage amount of triphenylphosphine to 0.56 parts, the same operation as Synthesis Example 1 was performed to obtain 275 parts of hydroxyl-containing phosphorus compound C.
測定含磷率,結果為7.5%。 The phosphorus content was measured and the result was 7.5%.
(實施例1)含有磷之甲基丙烯醯基化合物A的合成 (Example 1) Synthesis of phosphorus-containing methacryloyl compound A
將含有氫基之磷化合物A 160份、四氫呋喃160份、三乙胺75份投入於具備攪拌裝置、溫度計、冷卻管、滴入漏斗之玻璃製可分離式燒瓶,於溶解後,藉由冰浴冷卻至5℃以下。於氮氣環境化下,於1小時內滴入下述結構式的甲基丙烯醯氯70份,然後持續進行2小時的反應。 160 parts of phosphorus compound A containing a hydrogen group, 160 parts of tetrahydrofuran, and 75 parts of triethylamine were put into a glass separable flask equipped with a stirring device, a thermometer, a cooling tube, and a dropping funnel. After dissolving, use an ice bath to Cool to below 5°C. Under nitrogen atmosphere, 70 parts of methacrylic acid chloride with the following structural formula was added dropwise within 1 hour, and then the reaction was continued for 2 hours.
接著濃縮反應液並溶解於甲苯442份後,依序以碳酸鈉水溶液、水來進行洗淨。在藉由水進行洗淨後,進行脫水及過濾,並進一步濃縮溶劑以將固形份濃度 調整為50%,而得到下述結構式之含有磷之甲基丙烯醯基化合物A的甲苯溶液340份。 Then, the reaction solution was concentrated and dissolved in 442 parts of toluene, and then washed with sodium carbonate aqueous solution and water in sequence. After washing with water, dehydration and filtration are performed, and the solvent is further concentrated to reduce the solid content concentration It was adjusted to 50%, and 340 parts of toluene solutions of the phosphorus-containing methacryloyl compound A of the following structural formula were obtained.
含磷率為7.2%。 The phosphorus content is 7.2%.
(實施例2)含有磷之甲基丙烯醯基化合物B的合成 (Example 2) Synthesis of phosphorus-containing methacryloyl compound B
將含有氫基之磷化合物B 150份、四氫呋喃150份、三乙胺36份、4-二甲基胺基吡啶2.7份投入於具備攪拌裝置、溫度計、冷卻管、滴入漏斗之玻璃製可分離式燒瓶,並於室溫下溶解。於氮氣環境化下,於1小時內滴入下述結構式的甲基丙烯酸酐67份,然後更於50℃持續進行6小時的反應。 150 parts of phosphorus compound B containing a hydrogen group, 150 parts of tetrahydrofuran, 36 parts of triethylamine, and 2.7 parts of 4-dimethylaminopyridine were put into a glass separable device equipped with a stirring device, a thermometer, a cooling tube, and a dropping funnel. flask and dissolve at room temperature. Under nitrogen atmosphere, 67 parts of methacrylic anhydride with the following structural formula was added dropwise within 1 hour, and then the reaction was continued at 50°C for 6 hours.
接著濃縮反應液並溶解於甲苯442份後,與實施例1同樣地進行洗淨、濃縮,而得到固形份濃度50%之含有磷之甲基丙烯醯基化合物B的甲苯溶液314份。 Then, the reaction solution was concentrated and dissolved in 442 parts of toluene, and then washed and concentrated in the same manner as in Example 1 to obtain 314 parts of a toluene solution of phosphorus-containing methacryloyl compound B with a solid content concentration of 50%.
含磷率為6.5%。 The phosphorus content is 6.5%.
(實施例3)含有磷之甲基丙烯醯基化合物C的合成 (Example 3) Synthesis of phosphorus-containing methacryloyl compound C
將含有氫基之磷化合物C 150份、四氫呋喃150份、三乙胺38份、4-二甲基胺基吡啶2.8份投入於具備攪拌裝置、溫度計、冷卻管、滴入漏斗之玻璃製可分離式燒瓶,並於室溫下溶解。於氮氣環境化下,於1小時內滴入甲基丙烯酸酐70份,然後更於50℃持續進行6小時的反應。 Put 150 parts of phosphorus compound C containing hydrogen groups, 150 parts of tetrahydrofuran, 38 parts of triethylamine, and 2.8 parts of 4-dimethylaminopyridine into a glass separable device equipped with a stirring device, a thermometer, a cooling tube, and a dropping funnel. flask and dissolve at room temperature. Under nitrogen atmosphere, 70 parts of methacrylic anhydride was added dropwise within 1 hour, and then the reaction was continued at 50°C for 6 hours.
接著濃縮反應液並溶解於甲苯444份後,與實施例1同樣地進行洗淨、濃縮,而得到固形份濃度50%之含有磷之甲基丙烯醯基化合物C的甲苯溶液316份。 Then, the reaction solution was concentrated and dissolved in 444 parts of toluene, and then washed and concentrated in the same manner as in Example 1 to obtain 316 parts of a toluene solution of phosphorus-containing methacryloyl compound C with a solid content concentration of 50%.
含磷率為6.8%。 The phosphorus content is 6.8%.
(比較例1)含有磷之甲基丙烯醯基化合物D的合成 (Comparative Example 1) Synthesis of phosphorus-containing methacryloyl compound D
將下述結構式之DOPO-NQ的100份、四氫呋喃233份、三乙胺72份投入於具備攪拌裝置、溫度計、冷卻管、滴入漏斗之玻璃製可分離式燒瓶, Put 100 parts of DOPO-NQ of the following structural formula, 233 parts of tetrahydrofuran, and 72 parts of triethylamine into a glass separable flask equipped with a stirring device, a thermometer, a cooling tube, and a dropping funnel.
於溶解後,藉由冰浴冷卻至5℃以下。於氮氣環境化下,於1小時內滴入甲基丙烯醯氯62份,然後持續進行2小時的反應。 After dissolving, cool to below 5°C in an ice bath. Under nitrogen atmosphere, 62 parts of methacrylic acid chloride was added dropwise within 1 hour, and then the reaction was continued for 2 hours.
接著濃縮反應液並溶解於甲苯318份後,與實施例1同樣地進行洗淨、濃縮,並調整為固形份濃度為50%的甲苯溶液,而得到含有磷之甲基丙烯醯基化合物E的溶液235份。 Next, the reaction solution was concentrated and dissolved in 318 parts of toluene, washed and concentrated in the same manner as in Example 1, and adjusted to a toluene solution with a solid content concentration of 50% to obtain phosphorus-containing methacryloyl compound E. 235 parts of solution.
含磷率為6.2%。 The phosphorus content is 6.2%.
(比較例2)含有磷之乙烯基苄基化合物A的合成 (Comparative Example 2) Synthesis of Vinyl Benzyl Compound A Containing Phosphorus
依循專利文獻3的合成例1來合成。具體而言,將作為磷化合物的9,10-二氫-9-氧雜-10-膦菲-10-氧化物150份、作為反應溶劑的甲苯70份、異丙醇20份、作為鹵化乙烯基苄基的AGC SEIMI CHEMICAL公司製CMS-P 120份、作為觸媒的氯化四甲銨2.7份投入於具備攪拌裝置、溫度計、冷卻管、氧氣導入裝置之玻璃製可分離式燒瓶,並進行加熱溶解。然後一面留意因反應發熱所導致之溫度上升,一面分批地投入作為鹼金屬的48.5%氫氧化鈉水溶液127份。保持在70℃至80℃來進行反應,並藉由氣相層析來追蹤CMS-P的殘存量。確認CMS-P的殘存量減少且已充分地反應後,以甲苯來稀釋。藉由鹽酸來進行中和,並進行過濾來去除所生成之氯化鈉。然後進行水洗以去除離子性雜質。藉由加熱減壓來進行脫水及溶劑去除,調整為固形份濃度為50%的甲苯溶液,而得到含有磷之乙烯基苄基化合物A的溶液。 It was synthesized according to Synthesis Example 1 of Patent Document 3. Specifically, 150 parts of 9,10-dihydro-9-oxa-10-phosphine-10-oxide as the phosphorus compound, 70 parts of toluene as the reaction solvent, 20 parts of isopropyl alcohol, and ethylene halide were used. 120 parts of benzyl-based AGC SEIMI CHEMICAL CMS-P and 2.7 parts of tetramethylammonium chloride as a catalyst were put into a glass separable flask equipped with a stirring device, a thermometer, a cooling tube, and an oxygen introduction device, and carried out Dissolve with heat. Then, 127 parts of a 48.5% sodium hydroxide aqueous solution as an alkali metal was added in batches while paying attention to the temperature rise due to the heat generated by the reaction. The reaction was carried out at 70°C to 80°C, and the remaining amount of CMS-P was tracked by gas chromatography. After confirming that the remaining amount of CMS-P has been reduced and that it has fully reacted, dilute it with toluene. Neutralize with hydrochloric acid and filter to remove the sodium chloride generated. This is followed by water washing to remove ionic impurities. Dehydration and solvent removal were performed by heating and reducing pressure, and the solution was adjusted to a toluene solution with a solid content concentration of 50%, thereby obtaining a solution of vinyl benzyl compound A containing phosphorus.
測定所得到之化合物的含磷率,結果為9.3%。 The phosphorus content of the obtained compound was measured and found to be 9.3%.
(比較例3)含有磷之乙烯基苄基化合物B的合成 (Comparative Example 3) Synthesis of Vinyl Benzyl Compound B Containing Phosphorus
依循專利文獻4的合成例1,且更使用1,4-萘醌(1,4-naphthoquinone)來進行合成。具體而言,將9,10-二氫-9-氧雜-10-膦菲-10-氧化物340份、甲苯660份投入於具備攪拌裝置、溫度計、冷卻管、氧氣導入裝置之玻璃製可分離式燒瓶,並於80℃進行溶解。一面留意反應發熱一面分批地投入1,4-萘醌245份。持續進行反應,將溫度提高至110℃並進一步進行反應。於3小時後得到析出了暗褐色結晶之漿液溶液。藉由過濾來分離結晶,並使結晶分散於甲醇500份。重複進行3次此操作後,於熱風循環烘箱中進行乾燥。加入所得到之淡黃色粉末的含有磷之酚化合物10-(2,5-二羥基萘基)-10H-9-氧雜-10-膦菲-10-氧化物93.5份、作為溶劑的二甲基亞碸140.5份、甲基異丁酮93.5份、作為鹵化乙烯基苄基之AGC SEIMI CHEMICAL公司製CMS-P 77.8份、作為觸媒的氯化四甲銨0.20份、作為鹼金屬的48.5%氫氧化鈉水溶液74.2份、作為阻聚劑的三甲基對苯二酚0.16份,並藉由35%鹽酸進行中和直到pH成為5至6為止,然後分離去除下層水層。一面藉由磷酸二氫鈉水溶液使pH成為7至6一面進行水洗洗淨,並重複進行3至5次水層分離去除。進行迴流脫水並進行溶液過濾來回收溶劑,調整為固形份濃度為50%的甲苯溶液,而得到含有磷之乙烯基苄醚化合物B的溶液。 The synthesis was performed according to Synthesis Example 1 of Patent Document 4, and further using 1,4-naphthoquinone. Specifically, 340 parts of 9,10-dihydro-9-oxa-10-phosphinephenanthrene-10-oxide and 660 parts of toluene were put into a glass-made container equipped with a stirring device, a thermometer, a cooling tube, and an oxygen introduction device. separate flask and perform dissolution at 80°C. While paying attention to the reaction heat, 245 parts of 1,4-naphthoquinone were added in batches. The reaction was continued, the temperature was increased to 110°C and the reaction was further carried out. After 3 hours, a slurry solution with dark brown crystals precipitated was obtained. The crystals were separated by filtration and dispersed in 500 parts of methanol. After repeating this operation three times, dry it in a hot air circulation oven. To the obtained light yellow powder, 93.5 parts of the phosphorus-containing phenolic compound 10-(2,5-dihydroxynaphthyl)-10H-9-oxa-10-phosphinophene-10-oxide and dimethyl as a solvent were added. 140.5 parts of vinyl benzene, 93.5 parts of methyl isobutyl ketone, 77.8 parts of CMS-P manufactured by AGC SEIMI CHEMICAL Co., Ltd. as the halogenated vinyl benzyl group, 0.20 parts of tetramethylammonium chloride as the catalyst, and 48.5% of the alkali metal 74.2 parts of sodium hydroxide aqueous solution and 0.16 parts of trimethylhydroquinone as a polymerization inhibitor were neutralized with 35% hydrochloric acid until the pH became 5 to 6, and then the lower water layer was separated and removed. Wash with water while adjusting the pH to 7 to 6 with a sodium dihydrogen phosphate aqueous solution, and repeat the water layer separation and removal 3 to 5 times. The solvent was recovered by performing reflux dehydration and filtration of the solution, and the solution was adjusted to a toluene solution with a solid content concentration of 50% to obtain a solution of vinyl benzyl ether compound B containing phosphorus.
測定所得到之化合物的含磷率,結果為4.2%。 The phosphorus content of the obtained compound was measured and found to be 4.2%.
〈溶解性試驗〉 〈Solubility test〉
使用實施例1至3、比較例1至3中所調製之50%甲苯溶液來實施溶解性試驗。將該結果表示於表1。 The solubility test was performed using the 50% toluene solution prepared in Examples 1 to 3 and Comparative Examples 1 to 3. The results are shown in Table 1.
[表1]
實施例4至9、比較例4至12 Examples 4 to 9, Comparative Examples 4 to 12
〈硬化性樹脂組成物的調製及硬化物的製作〉 〈Preparation of curable resin composition and production of cured product〉
將各種成分以表2、3的比率來調配各成分,並藉由甲苯來製作固形份50%的清漆,然後塗佈於PET膜上,並在130℃的烘箱中乾燥5分鐘而製作樹脂組成物的膜。接著粉碎此膜而得到樹脂組成物的粉末。然後將此粉末連同間隔材夾入於不鏽鋼製的鏡面板,使用真空烘箱並於210℃進行90分鐘的成形而得到硬化物的樣本。使用該硬化物樣本來評估玻璃轉移溫度和介電性,並表示於表2、表3。 Prepare various ingredients according to the ratios in Tables 2 and 3, and use toluene to make a varnish with a solid content of 50%. Then apply it on the PET film and dry it in an oven at 130°C for 5 minutes to make a resin composition. membrane of matter. This film is then pulverized to obtain powder of a resin composition. Then, this powder was sandwiched between a stainless steel mirror plate and a spacer, and molded at 210° C. for 90 minutes using a vacuum oven to obtain a sample of the hardened product. The glass transition temperature and dielectric properties were evaluated using this hardened material sample, and are shown in Table 2 and Table 3.
〈難燃試驗片的製作〉 〈Preparation of flame-retardant test pieces〉
將各種成分以表2、3的比率來調配各成分,並藉由甲苯來製作固形份50%的清漆,在將此樹脂清漆含浸於玻璃布(日東紡績股份有限公司製;7628型式;型號H258)後,於130℃加熱5分鐘以進行乾燥而得到預浸體。 Various ingredients were prepared according to the ratios in Tables 2 and 3, and a varnish with a solid content of 50% was made from toluene. The resin varnish was impregnated into glass cloth (manufactured by Nitto Bo Co., Ltd.; type 7628; model number H258). ), then heated at 130° C. for 5 minutes to dry and obtain a prepreg.
重疊所得到之預浸體8片,以及於上下方重疊銅箔(三井金屬礦業股份有限公司製、3EC-III、厚度35μm),並在130℃×15分鐘+190℃×80分鐘的溫度條件進行2MPa的真空模壓,而得到1.6mm厚的積層體。將銅箔進行蝕刻及裁切而得到難燃性試驗片。使用該難燃性試驗片來評估難燃性,並表示於表2、表3。 The 8 prepregs obtained were stacked, and copper foil (manufactured by Mitsui Metals & Mining Co., Ltd., 3EC-III, thickness 35 μm) was stacked on the upper and lower sides, and the temperature conditions were 130°C × 15 minutes + 190°C × 80 minutes. Vacuum molding at 2 MPa was performed to obtain a 1.6 mm thick laminated body. The copper foil was etched and cut to obtain a flame retardant test piece. The flame retardancy was evaluated using this flame retardancy test piece, and is shown in Table 2 and Table 3.
[表2]
[表3]
OPE-2St:三菱氣體化學股份有限公司製 末端經苯乙烯基改質聚苯醚樹脂 OPE-2St: Made by Mitsubishi Gas Chemical Co., Ltd. End-modified polyphenylene ether resin with styrene group
PX-200:大八化學工業股份有限公司製 芳香族縮合磷酸酯、含磷率9.0% PX-200: Aromatic condensed phosphate ester made by Daihachi Chemical Industry Co., Ltd., phosphorus content 9.0%
Perbutyl P:日油公司製1,3-雙(丁基過氧基異丙基)苯 Perbutyl P: 1,3-bis(butylperoxyisopropyl)benzene manufactured by NOF Corporation
[產業上之可應用性] [Industrial applicability]
本發明之含有磷之(甲基)丙烯醯基化合物可應用在涵蓋建材和電子電機機器之廣泛用途,尤其在電子電機製品或OA機器、通訊機器等中,係極適合用於作為反應型磷系難燃劑。 The phosphorus-containing (meth)acrylyl compound of the present invention can be used in a wide range of applications covering building materials and electronic and electrical equipment, especially in electronic and electrical products, OA equipment, communication equipment, etc., and is extremely suitable as a reactive phosphorus It is a flame retardant.
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