TW202349812A - Multi-junction vertical resonant cavity surface emitting laser - Google Patents

Multi-junction vertical resonant cavity surface emitting laser Download PDF

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TW202349812A
TW202349812A TW112120861A TW112120861A TW202349812A TW 202349812 A TW202349812 A TW 202349812A TW 112120861 A TW112120861 A TW 112120861A TW 112120861 A TW112120861 A TW 112120861A TW 202349812 A TW202349812 A TW 202349812A
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quantum well
resonant cavity
well structure
cavity surface
junction
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邱舒偉
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大陸商深圳市嘉敏利光電有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/185Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only horizontal cavities, e.g. horizontal cavity surface-emitting lasers [HCSEL]
    • H01S5/187Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only horizontal cavities, e.g. horizontal cavity surface-emitting lasers [HCSEL] using Bragg reflection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18361Structure of the reflectors, e.g. hybrid mirrors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/34Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/40Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/42Arrays of surface emitting lasers
    • H01S5/423Arrays of surface emitting lasers having a vertical cavity

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  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)

Abstract

The invention provides a multi-junction vertical resonant cavity surface emitting laser, relates to the technical field of semiconductor lasers, and can adapt to a relatively large temperature range and realize continuous and stable working performance in the relatively large temperature range so as to reduce the influence of temperature change on device power and working stability. The laser comprises a substrate, a bottom reflecting layer arranged on the substrate, a multi-junction active region and a top reflecting layer, the multi-junction active region and the top reflecting layer are sequentially arranged in the hierarchical growth direction, the multi-junction active region comprises multiple layers of stacked quantum well structures, and in the multiple layers of stacked quantum well structures, the working wavelength ranges of at least two layers of quantum well structures are not overlapped. The working wavelength ranges of the multiple layers of quantum well structures jointly form the working wavelength range of the resonant cavity, so that the working wavelength range of the resonant cavity can be widened, the resonant cavity can adapt to a relatively large working temperature range, and the device can maintain relatively high luminous efficiency and stable working capability in the relatively large working temperature range.

Description

多結垂直共振腔面射型雷射元件Multi-junction vertical resonant cavity surface emitting laser element

本發明涉及一種半導體雷射元件技術領域,特別涉及一種多結垂直共振腔面射型雷射元件。The invention relates to the technical field of semiconductor laser elements, and in particular to a multi-junction vertical resonant cavity surface-emitting laser element.

垂直共振腔面射型雷射元件(VCSEL)主要由三部分構成,頂分佈回饋布拉格腔鏡(DBR)、主動層和底分佈回饋布拉格腔鏡(DBR)。其主動層的光學厚度通常在幾個波長的數量級,很容易實現單縱模、低閾值工作,容易製作二維高密度陣列,實現二維光互聯和資訊處理,並且垂直共振腔面射型雷射元件具有高調製速率,適用於高速光纖通訊系統等相關應用中。The vertical resonant cavity surface-emitting laser element (VCSEL) is mainly composed of three parts, the top distributed feedback Bragg cavity mirror (DBR), the active layer and the bottom distributed feedback Bragg cavity mirror (DBR). The optical thickness of its active layer is usually on the order of several wavelengths, which makes it easy to achieve single longitudinal mode and low threshold operation. It is easy to produce two-dimensional high-density arrays, realize two-dimensional optical interconnection and information processing, and vertical resonant cavity surface-emitting lasers. The radiating element has high modulation rate and is suitable for high-speed optical fiber communication systems and other related applications.

多結垂直共振腔面射型雷射元件(Multi-Junction VCSEL)指的是多堆疊主動層利用P+/N+隧道結串接在一起的雷射元件。由於多層堆疊的主動層之間為串聯,所以在相同的工作電流下,只要使得隧道結的阻值足夠小,就能夠得到與主動層設置倍數相匹配的工作效率的提升。例如,對於單主動層垂直共振腔面射型雷射元件來說,做到1 W/A的發射功率對電流轉換效率,對於三結垂直共振腔面射型雷射元件或稱三結VCSEL,就可以達到3 W/A的發射功率對電流轉換效率,所以,發射功率對電流轉換效率與堆疊主動層的層數成正比,在相同的工作電流下,多結垂直共振腔面射型雷射元件能夠輸出更高的發射功率。Multi-junction vertical resonant cavity surface-emitting laser element (Multi-Junction VCSEL) refers to a laser element in which multiple stacked active layers are connected in series using P+/N+ tunnel junctions. Since the active layers of the multi-layer stack are connected in series, under the same operating current, as long as the resistance of the tunnel junction is made small enough, the operating efficiency can be improved to match the active layer setting multiple. For example, for a single active layer vertical resonant cavity surface-emitting laser element, a transmission power to current conversion efficiency of 1 W/A is achieved. For a three-junction vertical resonant cavity surface-emitting laser element, or triple-junction VCSEL, It can achieve a transmission power to current conversion efficiency of 3 W/A. Therefore, the transmission power to current conversion efficiency is proportional to the number of stacked active layers. Under the same operating current, the multi-junction vertical resonant cavity surface-emitting laser Components are capable of outputting higher transmit power.

但是,由於多結垂直共振腔面射型雷射元件是由多個垂直腔面射型雷射元件的發光層垂直堆疊的結構所組成,在相同電流下,可產生對等倍數的光功率,也因為如此,會產生比單結垂直共振腔面射型雷射元件更高的熱,使得在多結垂直共振腔面射型雷射元件內部容易積聚熱量而發生較高的升溫導致器件功率發生嚴重下降,這就嚴重阻礙了多結垂直共振腔面射型雷射元件在持續工作中保持穩定的工作性能。However, since the multi-junction vertical resonant cavity surface-emitting laser element is composed of a structure in which the light-emitting layers of multiple vertical cavity surface-emitting laser elements are vertically stacked, under the same current, it can produce equivalent multiples of optical power. Because of this, it will generate higher heat than a single-junction vertical resonant cavity surface-emitting laser element, making it easy to accumulate heat inside a multi-junction vertical resonant cavity surface-emitting laser element and cause a higher temperature rise, resulting in device power failure. Serious decline, which seriously hinders the multi-junction vertical resonant cavity surface-emitting laser components from maintaining stable performance during continuous operation.

本申請實施例的目的在於提供一種多結垂直共振腔面射型雷射元件,能夠適應較大的溫度範圍,在較大的溫度範圍內實現持續穩定的高功率工作性能,以降低溫度變化對器件功率和工作穩定性造成的影響。The purpose of the embodiments of the present application is to provide a multi-junction vertical resonant cavity surface-emitting laser element that can adapt to a larger temperature range and achieve sustained and stable high-power operating performance in a larger temperature range to reduce the impact of temperature changes on device power and operating stability.

本申請實施例的一方面,提供了一種多結垂直共振腔面射型雷射元件,包括一基底、在該基底上設置的一底反射層、沿層級生長方向依次設置的一多結主動層和一頂反射層,該多結主動層包括疊加的多層量子阱結構,疊加的多層該量子阱結構中,至少兩層該量子阱結構的工作波長範圍不交疊。In one aspect of the embodiment of the present application, a multi-junction vertical resonant cavity surface-emitting laser element is provided, including a substrate, a bottom reflective layer provided on the substrate, and a multi-junction active layer sequentially provided along the layer growth direction. and a top reflective layer. The multi-junction active layer includes a superimposed multi-layer quantum well structure. Among the superimposed multi-layer quantum well structures, the operating wavelength ranges of at least two layers of the quantum well structures do not overlap.

在本申請的一種可行的實施方式中,多層該量子阱結構至少包括一第一量子阱結構和一第二量子阱結構,其中,該第一量子阱結構具有一第一工作波長範圍,該第二量子阱結構具有一第二工作波長範圍,該第一工作波長範圍與該第二工作波長範圍不交疊。In a possible implementation of the present application, the multi-layer quantum well structure at least includes a first quantum well structure and a second quantum well structure, wherein the first quantum well structure has a first operating wavelength range, and the third quantum well structure The two quantum well structure has a second operating wavelength range, and the first operating wavelength range and the second operating wavelength range do not overlap.

在本申請的一種可行的實施方式中,多層該量子阱結構還包括一第三量子阱結構,該第三量子阱結構具有一第三工作波長範圍,該第二工作波長範圍和該第三工作波長範圍分別位於該第一工作波長範圍的長波長側和短波長側。In a possible implementation of the present application, the multi-layer quantum well structure further includes a third quantum well structure, the third quantum well structure has a third operating wavelength range, the second operating wavelength range and the third operating wavelength range. The wavelength ranges are respectively located on the long wavelength side and the short wavelength side of the first operating wavelength range.

在本申請的一種可行的實施方式中,至少兩層該量子阱結構的工作波長範圍鄰接。In a possible implementation of the present application, the working wavelength ranges of at least two layers of the quantum well structures are adjacent.

在本申請的一種可行的實施方式中,多層該量子阱結構的工作波長範圍之間不連續。In a possible implementation of the present application, the operating wavelength ranges of the multiple layers of the quantum well structure are discontinuous.

在本申請的一種可行的實施方式中,多層該量子阱結構沿層級生長方向劃分為至少兩組,每一組中包含至少兩層該量子阱結構,每一組中的該量子阱結構的工作波長範圍相同,至少兩組的該量子阱結構的工作波長範圍不交疊。In a feasible implementation of the present application, the multi-layer quantum well structure is divided into at least two groups along the layer growth direction, each group contains at least two layers of the quantum well structure, and the operation of the quantum well structure in each group The wavelength ranges are the same, and the working wavelength ranges of at least two groups of quantum well structures do not overlap.

在本申請的一種可行的實施方式中,多層該量子阱結構至少包括一第一量子阱結構組和一第二量子阱結構組,其中,該第一量子阱結構組中所有的量子阱均具有該第一工作波長範圍,該第二量子阱結構組中所有的量子阱均具有該第二工作波長範圍,該第一工作波長範圍與該第二工作波長範圍不交疊。In a feasible implementation of the present application, the multi-layer quantum well structure at least includes a first quantum well structure group and a second quantum well structure group, wherein all quantum wells in the first quantum well structure group have In the first operating wavelength range, all quantum wells in the second quantum well structure group have the second operating wavelength range, and the first operating wavelength range does not overlap with the second operating wavelength range.

在本申請的一種可行的實施方式中,多層該量子阱結構還包括一第三量子阱結構組,該第三量子阱結構組中所有的量子阱均具有該第三工作波長範圍,該第二工作波長範圍和該第三工作波長範圍分別位於該第一工作波長範圍的長波長側和短波長側。In a feasible implementation of the present application, the multi-layer quantum well structure further includes a third quantum well structure group, and all quantum wells in the third quantum well structure group have the third operating wavelength range, and the second The working wavelength range and the third working wavelength range are respectively located on the long wavelength side and the short wavelength side of the first working wavelength range.

在本申請的一種可行的實施方式中,至少兩該量子阱結構組的工作波長範圍鄰接,或者,多組該量子阱結構組的工作波長範圍之間不連續。In a feasible implementation of the present application, the working wavelength ranges of at least two quantum well structure groups are adjacent, or the working wavelength ranges of multiple quantum well structure groups are discontinuous.

在本申請的一種可行的實施方式中,該底反射層和/或該頂反射層為一分散式布拉格反射鏡。In a possible implementation of the present application, the bottom reflective layer and/or the top reflective layer is a dispersed Bragg reflector.

在本申請的一種可行的實施方式中,該分散式布拉格反射鏡包括一導電P型分散式布拉格反射鏡和一導電N型分散式布拉格反射鏡。In a possible implementation of the present application, the dispersed Bragg reflector includes a conductive P-type dispersed Bragg reflector and a conductive N-type dispersed Bragg reflector.

在本申請的一種可行的實施方式中,該多結主動層在層級平面方向劃分有相互間隔的多個子多結主動層,以實現雷射光束陣列出光。In a feasible implementation of the present application, the multi-junction active layer is divided into a plurality of sub-multi-junction active layers spaced apart from each other in the direction of the hierarchical plane to achieve light emitting from the laser beam array.

在本申請的一種可行的實施方式中,該多結垂直共振腔面射型雷射元件為底發射結構或者頂發射結構。In a feasible implementation of the present application, the multi-junction vertical resonant cavity surface-emitting laser element has a bottom-emitting structure or a top-emitting structure.

本申請實施例提供的多結垂直共振腔面射型雷射元件,包括該基底、在該基底上設置的該底反射層、沿層級生長方向依次設置的該多結主動層和該頂反射層,該多結主動層包括疊加的多層該量子阱結構,疊加的多層該量子阱結構中,至少兩層該量子阱結構的工作波長範圍不交疊。在該基底上設置的包括該底反射層、該多結主動層和該頂反射層形成的多結VCSEL結構,用於受激輻射並諧振出射雷射光束,對於該量子阱結構來說,其波長受溫度變化發生漂移的影響較大,而諧振腔的波長受溫度變化而發生變化的影響相對較小,設置多層該量子阱結構中至少兩層該量子阱結構的工作波長範圍不交疊,多層該量子阱結構的工作波長範圍共同形成諧振腔的工作波長範圍,如此即可使得諧振腔的工作波長範圍拓寬,從而更有利於適應較大的工作溫度範圍,以使器件在較大的工作溫度範圍內能夠保持較高的發光效率,維持穩定的工作能力。The multi-junction vertical resonant cavity surface-emitting laser element provided by the embodiment of the present application includes the substrate, the bottom reflective layer provided on the substrate, the multi-junction active layer and the top reflective layer arranged sequentially along the layer growth direction. , the multi-junction active layer includes superimposed multiple layers of the quantum well structure, and among the superimposed multiple layers of the quantum well structure, the operating wavelength ranges of at least two layers of the quantum well structures do not overlap. A multi-junction VCSEL structure formed on the substrate including the bottom reflective layer, the multi-junction active layer and the top reflective layer is used for stimulated radiation and resonant emission of laser beams. For the quantum well structure, The wavelength is greatly affected by the drift of temperature changes, while the wavelength of the resonant cavity is relatively less affected by changes in temperature. The working wavelength ranges of at least two layers of the quantum well structure in the multi-layer quantum well structure do not overlap. The working wavelength range of the multi-layer quantum well structure jointly forms the working wavelength range of the resonant cavity, which can broaden the working wavelength range of the resonant cavity, which is more conducive to adapting to a larger operating temperature range, so that the device can operate in a larger It can maintain high luminous efficiency and stable working ability within the temperature range.

下面將結合本申請實施例中的附圖,對本申請實施例中的技術方案進行清楚、完整地描述。The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application.

在本申請的描述中,需要說明的是,術語“內”、“外”等指示的方位或位置關係為基於附圖所示的方位或位置關係,或者是該申請產品使用習慣常擺放的方位或位置關係,僅是為了便於描述本申請和簡化描述,而不是指示或暗示所指的裝置或元件必須具有特定的方位、以特定的方位構造和操作,因此不能理解為對本申請的限制。此外,術語“第一”、“第二”等僅用於區分描述,而不能理解為指示或暗示相對重要性。In the description of this application, it should be noted that the orientation or positional relationship indicated by the terms "inner", "outer", etc. is based on the orientation or positional relationship shown in the drawings, or is where the product of this application is commonly used. The orientation or positional relationship is only for the convenience of describing the present application and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation of the present application. In addition, the terms "first", "second", etc. are only used to differentiate descriptions and are not to be understood as indicating or implying relative importance.

還需要說明的是,除非另有明確的規定和限定,術語“設置”、“連接”應做廣義理解,例如,可以是固定連接,也可以是可拆卸連接,或一體地連接;可以是直接相連,也可以通過中間媒介間接相連,可以是兩個元件內部的連通。對於本領域的普通技術人員而言,可以具體情況理解上述術語在本申請中的具體含義。It should also be noted that, unless otherwise clearly stated and limited, the terms "setting" and "connection" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a direct connection. Connected, it can also be connected indirectly through an intermediary, or it can be an internal connection between two components. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood on a case-by-case basis.

垂直共振腔面射型雷射元件指的是呈垂直於基底表面的方向依次堆疊形成能量激發、諧振放大以出射鐳射的器件,垂直共振腔面射型雷射元件產生的雷射光束以垂直於基底方向的頂面或底面出射,這種雷射光束出射的方向與邊射型雷射器不同。由於這種不同,垂直共振腔面射型雷射元件的形成結構和製備過程使得垂直共振腔面射型雷射元件能夠支援在製備工藝過程的各個節點都可以進行“在片”測試,充分發揮了製備過程中器件性能檢測對制備良率的作用,使得垂直共振腔面射型雷射元件的製備良率有效提升。而且,由於雷射光束由頂面或底面出射,基於提高器件功率的需求,垂直共振腔面射型雷射元件能夠呈二維陣列製作,從而實現二維平面陣列的面光源出射。Vertical resonant cavity surface-emitting laser elements refer to devices that are stacked in a direction perpendicular to the substrate surface to form energy excitation and resonance amplification to emit laser. The laser beam generated by the vertical resonant cavity surface-emitting laser element is oriented perpendicular to the substrate surface. The direction of the laser beam emitted is different from that of the edge-emitting laser. Due to this difference, the formation structure and preparation process of the vertical resonant cavity surface-emitting laser element enable the vertical resonant cavity surface-emitting laser element to support "on-wafer" testing at each node of the preparation process, giving full play to It understands the role of device performance testing on the production yield during the preparation process, effectively improving the production yield of vertical resonant cavity surface-emitting laser components. Moreover, since the laser beam is emitted from the top or bottom surface, based on the need to increase device power, vertical resonant cavity surface-emitting laser elements can be produced in a two-dimensional array, thereby realizing a two-dimensional planar array of surface light sources.

多結垂直共振腔面射型雷射元件相對於單結垂直共振腔面射型雷射元件來說能夠顯著的提高雷射元件的發射功率對電流轉換效率,但是,由於多結垂直共振腔面射型雷射元件中堆疊形成有多層量子阱結構,以及與量子阱結構連接的隧道結,多結垂直共振腔面射型雷射元件工作過程中會產生更多的發熱,而且發熱產生的熱量難以快速的發散和降溫就會導致多結垂直共振腔面射型雷射元件本身以及工作環境溫度快速上升,由於半導體雷射元件都存在受溫度影響的問題,溫度的變化(上升或下降)造成波長發生一定程度的漂移現象,都會對多結垂直共振腔面射型雷射元件的功率造成不良影響,導致功率嚴重下降,使得多結垂直共振腔面射型雷射元件的工作性能不穩定。圖1是多結垂直共振腔面射型雷射元件的工作效率隨溫度變化的示意圖,如圖1中所示,粗線條為在20℃時的多結垂直共振腔面射型雷射元件的工作效率隨工作電流變化曲線,細線條為在80℃時的多結垂直共振腔面發射鐳射器的工作效率隨工作電流變化曲線,從圖1中可以看出,如在10mA的工作電流下,當溫度由20℃上升至80℃時,多結垂直共振腔面射型雷射元件的工作效率降低至原先的70%。Compared with the single-junction vertical resonant cavity surface-emitting laser element, the multi-junction vertical resonant cavity surface-emitting laser element can significantly improve the emission power to current conversion efficiency of the laser element. However, due to the multi-junction vertical resonant cavity surface The multi-layer quantum well structure is stacked in the emitting laser element, and the tunnel junction is connected to the quantum well structure. The multi-junction vertical resonant cavity surface-emitting laser element will generate more heat during operation, and the heat generated by the heat will Difficulty in rapid dispersion and cooling will cause the temperature of the multi-junction vertical resonant cavity surface-emitting laser element itself and the working environment to rise rapidly. Since semiconductor laser elements are affected by temperature, temperature changes (rise or fall) cause A certain degree of wavelength drift will have a negative impact on the power of the multi-junction vertical resonant cavity surface-emitting laser element, resulting in a serious reduction in power and making the performance of the multi-junction vertical resonant cavity surface-emitting laser element unstable. Figure 1 is a schematic diagram showing how the operating efficiency of a multi-junction vertical resonant cavity surface-emitting laser element changes with temperature. As shown in Figure 1, the thick line shows the operation of the multi-junction vertical resonant cavity surface-emitting laser element at 20°C. The efficiency changes with the operating current. The thin line is the operating efficiency of the multi-junction vertical resonant cavity surface emitting laser at 80°C. It can be seen from Figure 1 that at an operating current of 10mA, when When the temperature rises from 20°C to 80°C, the working efficiency of the multi-junction vertical resonant cavity surface-emitting laser element drops to 70% of the original value.

本申請實施例提供一種多結垂直共振腔面射型雷射元件,圖2為本申請實施例的多結垂直共振腔面射型雷射元件的層級結構示意圖之一,如圖2所示,該多結垂直共振腔面射型雷射元件包括一基底10、在該基底10上設置的一底反射層20、沿層級生長方向依次設置的一多結主動層和一頂反射層40,該多結主動層包括疊加的多層量子阱結構30,疊加的多層該量子阱結構30中,至少兩層該量子阱結構30的工作波長範圍不交疊。The embodiment of the present application provides a multi-junction vertical resonant cavity surface-emitting laser element. Figure 2 is a schematic diagram of the hierarchical structure of the multi-junction vertical resonant cavity surface-emitting laser element according to the embodiment of the present application. As shown in Figure 2, The multi-junction vertical resonant cavity surface-emitting laser element includes a substrate 10, a bottom reflective layer 20 provided on the substrate 10, a multi-junction active layer and a top reflective layer 40 arranged sequentially along the layer growth direction. The multi-junction active layer includes superimposed multi-layer quantum well structures 30. Among the superimposed multi-layer quantum well structures 30, the working wavelength ranges of at least two layers of the quantum well structures 30 do not overlap.

該多結垂直共振腔面射型雷射元件根據其結構設置導致的出射雷射光束的方向不同,可以劃分為頂發射結構和底發射結構,頂發射結構的該多結垂直共振腔面射雷射元件激發的光束經過諧振腔的諧振放大後形成的雷射光束通過頂部的該頂反射層40出射。底發射結構的該多結垂直共振腔面射型雷射元件的該基底10經過了減薄、去除或開孔等結構處理,光束經過諧振腔的諧振放大後形成的雷射光束通過底部的該底反射層20後由底部一側出射。示例的,圖2中示出的是頂發射結構的多結垂直共振腔面射型雷射元件。以下以頂發射結構的該多結垂直共振腔面射型雷射元件進行詳細說明。The multi-junction vertical resonant cavity surface-emitting laser element can be divided into a top-emitting structure and a bottom-emitting structure according to the different directions of the outgoing laser beam caused by its structural settings. The multi-junction vertical resonant cavity surface-emitting laser element of the top-emitting structure The laser beam formed after the light beam excited by the laser element is resonantly amplified by the resonant cavity is emitted through the top reflective layer 40 at the top. The substrate 10 of the multi-junction vertical resonant cavity surface-emitting laser element of the bottom-emitting structure has been structurally processed such as thinning, removal or opening. The laser beam formed after the beam is resonantly amplified by the resonant cavity passes through the bottom of the resonant cavity. The bottom reflection layer 20 then emits from the bottom side. As an example, what is shown in Figure 2 is a multi-junction vertical resonant cavity surface-emitting laser element with a top-emitting structure. The multi-junction vertical resonant cavity surface-emitting laser element with a top-emitting structure will be described in detail below.

如圖2所示,在本申請實施例的多結垂直共振腔面射型雷射元件,該多結主動層包含多個堆疊的主動層,每個該主動層包括量子阱結構30和隧道結,相鄰兩個該主動層的量子阱結構30通過隧道結串聯在一起,本領域技術人員應當知曉,該多結垂直共振腔面射型雷射元件還包括有未提及的其他一些實現雷射元件功能原理所需的相應層級結構,如用於形成電壓以激發光束的電極層、接觸層等,在本申請中對上述的層級結構未作特殊限定,即表示在本申請實施例的該多結垂直共振腔面射型雷射元件中,對於此類結構的設置可以與現有技術的垂直共振腔面射型雷射元件相同設置和功用,因此未做特殊限定說明,並不表示本申請實施例的該多結垂直共振腔面射型雷射元件不設置這些層級結構,以下,結合該多結垂直共振腔面射型雷射元件的工作過程進行相應的解釋說明。As shown in Figure 2, in the multi-junction vertical resonant cavity surface-emitting laser element according to the embodiment of the present application, the multi-junction active layer includes multiple stacked active layers, and each active layer includes a quantum well structure 30 and a tunnel junction. , two adjacent quantum well structures 30 of the active layer are connected in series through tunnel junctions. Persons skilled in the art should know that the multi-junction vertical resonant cavity surface-emitting laser element also includes other laser implementations that are not mentioned. The corresponding hierarchical structure required by the functional principle of the radiating element, such as the electrode layer, contact layer, etc. used to form a voltage to excite the light beam. In this application, there is no special limitation on the above hierarchical structure, which means that the above-mentioned hierarchical structure is used in the embodiments of this application. In the multi-junction vertical resonant cavity surface-emitting laser element, the arrangement of this type of structure can have the same arrangement and function as the existing vertical resonant cavity surface-emitting laser element. Therefore, there is no special limitation and does not mean that this application The multi-junction vertical resonant cavity surface-emitting laser element of the embodiment does not have these hierarchical structures. The corresponding explanation will be given below in conjunction with the working process of the multi-junction vertical resonant cavity surface-emitting laser element.

如圖2中所示,在該基底10上設置底一底反射層20和該多結主動層,該多結主動層包含多個堆疊的該主動層,每個該主動層包括有一量子阱結構30,相鄰兩個該主動層的量子阱結構30通過隧道結串聯在一起,示例的,圖2中的該多結主動層包括有四層該量子阱結構30,以及,在該多結主動層還包括有用於提供光電限制的氧化層,在最上一層的該量子阱結構30之上設置一頂反射層40,該底反射層20、多層該量子阱結構30、該等量子阱結構30之間的隧道結和該頂反射層40之間形成的類三明治結構作為多結主動層,在四層該量子阱結構30中,至少其中的兩層該量子阱結構30的工作波長範圍不交疊。在該基底10上還設置有一下電極60,在該頂反射層40上還設置有一上電極70,該下電極60和該上電極70分別作為陽極接觸和陰極接觸,通過外加能量(光能或電能)在該下電極60和該上電極70之間形成電場,當受到正向偏壓,載子在隧道結中產生,注入並局限在該等量子阱結構30中複合發光,如圖2所示,由於本實施例中多結垂直共振腔面射型雷射元件為頂發射結構,雷射光束由頂部出射,因此該上電極70上形成有開口以便雷射光束的出射。As shown in FIG. 2 , a bottom reflective layer 20 and a multi-junction active layer are disposed on the substrate 10 . The multi-junction active layer includes a plurality of stacked active layers, and each active layer includes a quantum well structure. 30. Two adjacent quantum well structures 30 of the active layer are connected in series through tunnel junctions. For example, the multi-junction active layer in Figure 2 includes four layers of the quantum well structure 30, and in the multi-junction active layer The layer also includes an oxide layer for providing photoelectric confinement. A top reflective layer 40 is provided on the quantum well structure 30 of the uppermost layer. The bottom reflective layer 20, the multi-layer quantum well structure 30, and the quantum well structures 30 are The sandwich-like structure formed between the tunnel junction and the top reflective layer 40 serves as a multi-junction active layer. Among the four-layer quantum well structures 30, the operating wavelength ranges of at least two of the quantum well structures 30 do not overlap. . A lower electrode 60 is also provided on the substrate 10 , and an upper electrode 70 is also provided on the top reflective layer 40 . The lower electrode 60 and the upper electrode 70 serve as anode contact and cathode contact respectively. Through external energy (light energy or Electric energy) forms an electric field between the lower electrode 60 and the upper electrode 70. When forward biased, carriers are generated in the tunnel junction, injected and localized in the quantum well structures 30 to recombine and emit light, as shown in Figure 2 It is shown that since the multi-junction vertical resonant cavity surface-emitting laser element in this embodiment has a top-emitting structure and the laser beam is emitted from the top, an opening is formed on the upper electrode 70 to facilitate the emission of the laser beam.

在本申請實施例的多結垂直共振腔面射型雷射元件的製備工藝中,該多結垂直共振腔面射型雷射元件通過金屬有機化學氣相沉積(MOCVD)或分子束外延(MBE)工藝在該基底10上沉積出複雜的多層膜結構而形成。示例的,在本實施例中,如圖2中的示例,多結主動層中的該等量子阱結構30包括有四層,至少在其中的兩層中,該等量子阱結構30的工作波長範圍不交疊,其中,工作波長範圍指的是在該量子阱結構30在外加能量的作用下複合發光的波長範圍。如此一來,兩層該量子阱結構30複合發光的工作波長範圍不同,則包括多層該量子阱結構30在內的諧振腔的工作波長範圍得到了擴大,由於量子阱的波長隨溫度漂移的漂移係數約為0.27nm/℃,而共振腔的波長隨溫度漂移變化為0.07nm/℃,因此,將多層該量子阱結構30中的一部分層的工作波長範圍向短波方向調節,另一部分層的工作波長範圍保持不變,就能夠使得該多結垂直共振腔面射型雷射元件的穩定工作的溫度範圍區間能夠向高溫的方向擴大一定的邊界,反之,將多層該量子阱結構30中的一部分層的工作波長範圍向長波方向調節,另一部分層的工作波長範圍保持不變,就能夠使得該多結垂直共振腔面射型雷射元件的穩定工作的溫度範圍區間向低溫的方向擴大一定的邊界。In the preparation process of the multi-junction vertical resonant cavity surface-emitting laser element in the embodiment of the present application, the multi-junction vertical resonant cavity surface-emitting laser element is processed by metal organic chemical vapor deposition (MOCVD) or molecular beam epitaxy (MBE). ) process to deposit a complex multi-layer film structure on the substrate 10. For example, in this embodiment, as shown in FIG. 2 , the quantum well structures 30 in the multi-junction active layer include four layers. In at least two of the layers, the operating wavelength of the quantum well structures 30 The ranges do not overlap, and the operating wavelength range refers to the wavelength range in which the quantum well structure 30 recombines light under the action of external energy. In this way, the working wavelength range of the composite light emitted by the two layers of the quantum well structure 30 is different, and the working wavelength range of the resonant cavity including the multi-layered quantum well structure 30 is expanded. Since the wavelength of the quantum well drifts with temperature drift, The coefficient is about 0.27nm/°C, and the wavelength of the resonant cavity changes with temperature drift to 0.07nm/°C. Therefore, the working wavelength range of some layers in the multi-layer quantum well structure 30 is adjusted to the short-wave direction, and the working wavelength range of the other part of the layer is adjusted to the shortwave direction. As long as the wavelength range remains unchanged, the stable operating temperature range of the multi-junction vertical resonant cavity surface-emitting laser element can be expanded to a certain limit in the direction of high temperature. On the contrary, a part of the multi-layer quantum well structure 30 By adjusting the working wavelength range of one layer to the long wave direction, while keeping the working wavelength range of the other layers unchanged, the stable operating temperature range of the multi-junction vertical resonant cavity surface-emitting laser element can be expanded to a certain extent towards low temperatures. border.

若需要使得本申請實施例的多結垂直共振腔面射型雷射元件在相差100℃的溫度區間範圍內具有較好的工作性能和穩定的工作狀態,就需要使得該元件能夠克服這相差100℃的溫度變化,以及,還需要考慮到該期間在這相差100℃的溫度變化中工作加電流產生的熱量對溫度的影響等。If the multi-junction vertical resonant cavity surface-emitting laser element of the embodiment of the present application needs to have better working performance and stable working state within a temperature range that differs by 100°C, the element needs to be able to overcome this difference of 100°C. °C temperature change, and it is also necessary to consider the impact of the heat generated by working and adding current on the temperature during this period of temperature change with a difference of 100 °C.

示例的,若考慮該多結垂直共振腔面射型雷射元件的發熱和散熱不良的問題,需要使得該多結垂直共振腔面射型雷射元件能夠在現有適應溫度狀態下升溫100℃的範圍內能夠高效穩定工作,可以對多層該量子阱結構30中的一層或者幾層的工作波長範圍進行調節,以如圖2所示的四層該量子阱結構30為例,至少在四層該量子阱結構30的其中兩層中,一層該量子阱結構30為原先預設的工作波長範圍,對另一層該量子阱結構30的工作波長範圍進行調節,將其工作波長範圍向短波長側調節約30nm,與原先的工作波長範圍不交疊,從而使得經過波長調節後的該多結垂直共振腔面射型雷射元件能夠在現有適應溫度狀態下升溫100℃的範圍內都能夠保持較佳的工作效率,使得在此範圍內的升溫不會對器件高效穩定工作造成嚴重的影響。For example, if the problem of heat generation and poor heat dissipation of the multi-junction vertical resonant cavity surface-emitting laser element is taken into account, it is necessary to make the multi-junction vertical resonant cavity surface-emitting laser element capable of raising the temperature by 100°C under the existing adaptive temperature state. It can work efficiently and stably within the range, and the working wavelength range of one or several layers in the multi-layer quantum well structure 30 can be adjusted. Taking the four-layer quantum well structure 30 as shown in Figure 2 as an example, at least four layers of the quantum well structure 30 can operate efficiently and stably within the range. Among the two layers of the quantum well structure 30, one layer of the quantum well structure 30 has an originally preset operating wavelength range, and the operating wavelength range of the other layer of the quantum well structure 30 is adjusted to the short wavelength side. About 30nm, which does not overlap with the original operating wavelength range, so that after wavelength adjustment, the multi-junction vertical resonant cavity surface-emitting laser element can maintain optimal performance within a 100°C temperature rise range under the existing adaptive temperature conditions. The working efficiency is such that temperature rise within this range will not have a serious impact on the efficient and stable operation of the device.

又例如,若考慮該多結垂直共振腔面射型雷射元件的一些特殊應用,需要該多結垂直共振腔面射型雷射元件在低溫環境下工作,如需要在-40℃的環境下保持較好的工作性能,仍舊以圖2中所示的四層該量子阱結構30為例,至少在四層該量子阱結構30的其中兩層中,一層該量子阱結構30為原先預設的工作波長範圍,對另一層該量子阱結構30的工作波長範圍進行調節,將其工作波長範圍向長波長側調節約10nm,與原先的工作波長範圍不交疊,就能夠使得經過波長調節後的該多結垂直共振腔面射型雷射元件能夠適應常溫降至-40℃的溫度環境,在此溫度區間內都能夠保持較佳的工作效率。For another example, if we consider some special applications of the multi-junction vertical resonant cavity surface-emitting laser element, the multi-junction vertical resonant cavity surface-emitting laser element needs to work in a low-temperature environment, such as -40°C. To maintain better working performance, still taking the four-layer quantum well structure 30 shown in Figure 2 as an example, at least in two of the four-layer quantum well structures 30, one layer of the quantum well structure 30 is the original default The working wavelength range of the other layer of the quantum well structure 30 is adjusted, and the working wavelength range is adjusted to the long wavelength side by about 10 nm, so that it does not overlap with the original working wavelength range, so that after the wavelength adjustment The multi-junction vertical resonant cavity surface-emitting laser element can adapt to temperature environments ranging from normal temperature to -40°C, and can maintain good working efficiency in this temperature range.

需要說明的是,在本申請實施例的多結垂直共振腔面射型雷射元件中,前述的一層該量子阱結構30,並不必然指代一個單一的實體層級結構,例如,還可以理解:一層該量子阱結構30,包括由多個的量子阱和隧道結疊層後形成的整體層級,即,該的一層量子阱結構30可以包括多個的量子阱和隧道結後的疊層結構。It should be noted that in the multi-junction vertical resonant cavity surface-emitting laser element in the embodiment of the present application, the aforementioned one-layer quantum well structure 30 does not necessarily refer to a single physical hierarchical structure. For example, it can also be understood that : One layer of the quantum well structure 30 includes an overall layer formed by stacking multiple quantum wells and tunnel junctions. That is, the one layer of quantum well structure 30 may include a stacked structure of multiple quantum wells and tunnel junctions. .

圖4是本申請實施例的多結垂直共振腔面射型雷射元件與現有技術的多結垂直共振腔面射型雷射元件的相對輸出功率受溫度影響的對比圖,如圖4所示,粗折線為本申請實施例的該多結垂直共振腔面射型雷射元件在-40℃至120℃範圍內,相對輸出功率的模擬模擬折線,細折線為現有技術的多結垂直共振腔面射型雷射元件在-40℃至120℃範圍內,相對輸出功率的模擬模擬折線,由圖4中可以看出,本申請實施例的該多結垂直共振腔面射型雷射元件通過在多層該量子阱結構30中,對部分該量子阱結構30設置向長波長方向調節的工作波長範圍,對部分該量子阱結構30設置向短波長方向調節的工作波長範圍,從而使得相對輸出功率能夠在-40℃至120℃的溫度範圍區間內有效的提升輸出功率的穩定性,無論是低溫環境或是高溫環境均能夠得到較佳的改善效果。Figure 4 is a comparison chart of the relative output power affected by temperature between the multi-junction vertical resonant cavity surface-emitting laser element according to the embodiment of the present application and the multi-junction vertical resonant cavity surface-emitting laser element in the prior art, as shown in Figure 4 , the thick fold line is the simulated fold line of the relative output power of the multi-junction vertical resonant cavity surface-emitting laser element in the embodiment of the present application in the range of -40°C to 120°C, and the thin fold line is the multi-junction vertical resonant cavity of the prior art. The simulated fold line of the relative output power of the surface-emitting laser element in the range of -40°C to 120°C can be seen from Figure 4. The multi-junction vertical resonant cavity surface-emitting laser element according to the embodiment of the present application passes In the multi-layer quantum well structure 30, part of the quantum well structure 30 is set with an operating wavelength range adjusted toward the long wavelength direction, and part of the quantum well structure 30 is set with an operating wavelength range adjusted toward the short wavelength direction, so that the relative output power It can effectively improve the stability of the output power in the temperature range of -40°C to 120°C, and can achieve better improvement results in both low-temperature and high-temperature environments.

需要說明的是,對於該等量子阱結構30的工作波長範圍的調節方式具有多種,例如改變該等量子阱結構30的厚度,改變該等量子阱結構30的形成材質或組成成分等,採用上述任一的方式,或者兩種或更多方式的結合,都可以實現對該等量子阱結構30的工作波長範圍的調節。It should be noted that there are many ways to adjust the working wavelength range of the quantum well structures 30, such as changing the thickness of the quantum well structures 30, changing the forming materials or components of the quantum well structures 30, etc., using the above Any method, or a combination of two or more methods, can realize the adjustment of the operating wavelength range of the quantum well structures 30 .

本申請實施例提供的該多結垂直共振腔面射型雷射元件,包括該基底10、在該基底10上設置的該底反射層20、沿層級生長方向依次設置的該多結主動層和該頂反射層40,該多結主動層包括疊加的多層該量子阱結構30,疊加的多層該量子阱結構30中,至少兩層該量子阱結構30的工作波長範圍不交疊。在該基底10上設置的包括該底反射層20、該多結主動層和該頂反射層40形成的多結VCSEL結構,用於受激輻射並諧振出射雷射光束,對於該量子阱結構30來說,其波長受溫度變化發生漂移的影響較大,而諧振腔的波長受溫度變化而發生變化的影響相對較小,設置多層該量子阱結構30中至少兩層該量子阱結構30的工作波長範圍不交疊,多層該量子阱結構30的工作波長範圍共同形成諧振腔的工作波長範圍,如此即可使得諧振腔的工作波長範圍拓寬,從而更有利於適應較大的工作溫度範圍,以使元件在較大的工作溫度範圍內能夠保持較高的發光效率,維持穩定的工作能力。The multi-junction vertical resonant cavity surface-emitting laser element provided by the embodiment of the present application includes the substrate 10, the bottom reflective layer 20 provided on the substrate 10, the multi-junction active layer sequentially provided along the layer growth direction, and The top reflective layer 40 and the multi-junction active layer include stacked multiple layers of the quantum well structures 30. Among the stacked multiple layers of the quantum well structures 30, the operating wavelength ranges of at least two layers of the quantum well structures 30 do not overlap. The multi-junction VCSEL structure formed on the substrate 10 including the bottom reflective layer 20, the multi-junction active layer and the top reflective layer 40 is used for stimulated radiation and resonant emission of laser beams. For the quantum well structure 30 Generally speaking, its wavelength is greatly affected by the drift of temperature changes, while the wavelength of the resonant cavity is relatively less affected by changes in temperature. The work of arranging at least two layers of the quantum well structure 30 in the multi-layer quantum well structure 30 is The wavelength ranges do not overlap. The working wavelength ranges of the multiple layers of the quantum well structure 30 jointly form the working wavelength range of the resonant cavity. This can broaden the working wavelength range of the resonant cavity, which is more conducive to adapting to a larger working temperature range. This enables the components to maintain high luminous efficiency and stable working capabilities within a larger operating temperature range.

在本申請的一種可行的實施方式中,多層該量子阱結構30至少包括一第一量子阱結構31和一第二量子阱結構32,其中,該第一量子阱結構31具有一第一工作波長範圍,該第二量子阱結構32具有一第二工作波長範圍,第一工作波長範圍與該第二工作波長範圍不交疊。In a feasible implementation of the present application, the multi-layer quantum well structure 30 includes at least a first quantum well structure 31 and a second quantum well structure 32, wherein the first quantum well structure 31 has a first operating wavelength. range, the second quantum well structure 32 has a second operating wavelength range, and the first operating wavelength range does not overlap with the second operating wavelength range.

圖3是本申請實施例的多結垂直共振腔面射型雷射元件的層級結構示意圖之二,如圖3所示,本實施例的多結垂直共振腔面射型雷射元件中,多層該量子阱結構30包括一第一量子阱結構31和在該第一量子阱結構31上的一第二量子阱結構32,其中,該第一量子阱結構31的工作波長範圍為該第一工作波長範圍,該第二量子阱結構32的工作波長範圍為該第二工作波長範圍,該第一工作波長範圍與該第二工作波長範圍不交疊,如此一來,本實施例的多結垂直共振腔面射型雷射元件能夠在滿足該第一工作波長範圍與該第二工作波長範圍分別所對應的溫度區間內保持穩定工作,也就擴大了本實施例的該多結垂直共振腔面射型雷射元件的穩定工作溫度範圍。示例的,本申請實施例中,該多結垂直共振腔面射型雷射元件設置低電阻和低吸收的隧道結,並通過層調諧,使得多層該量子阱結構30和隧道結與駐波對齊。Figure 3 is the second schematic diagram of the hierarchical structure of the multi-junction vertical resonant cavity surface-emitting laser element according to the embodiment of the present application. As shown in Figure 3, in the multi-junction vertical resonant cavity surface-emitting laser element of this embodiment, the multi-layer The quantum well structure 30 includes a first quantum well structure 31 and a second quantum well structure 32 on the first quantum well structure 31, wherein the operating wavelength range of the first quantum well structure 31 is the first operating wavelength range. The operating wavelength range of the second quantum well structure 32 is the second operating wavelength range, and the first operating wavelength range does not overlap with the second operating wavelength range. In this way, the multi-junction vertical in this embodiment The resonant cavity surface-emitting laser element can maintain stable operation within the temperature range corresponding to the first operating wavelength range and the second operating wavelength range, thereby expanding the multi-junction vertical resonant cavity surface of this embodiment. Stable operating temperature range of radiated laser components. For example, in the embodiment of the present application, the multi-junction vertical resonant cavity surface-emitting laser element is equipped with a tunnel junction with low resistance and low absorption, and is tuned through layers, so that the multi-layer quantum well structure 30 and the tunnel junction are aligned with the standing wave. .

同樣的,該第一量子阱結構31上的該第二量子阱結構32也不必然指代一個單一的實體層級結構,可以理解為一個單獨的該量子阱結構30,也可以理解為包括由多個的量子阱和隧道結疊層後形成的整體疊層結構。以下該第三量子阱結構33等,均可等同理解。Similarly, the second quantum well structure 32 on the first quantum well structure 31 does not necessarily refer to a single entity hierarchical structure. It can be understood as a single quantum well structure 30, or it can also be understood as including multiple quantum well structures. An overall stacked structure formed by stacking quantum wells and tunnel junctions. The following third quantum well structure 33 and so on can all be understood equally.

在本申請的一種可行的實施方式中,仍舊如圖3所示,多層該量子阱結構30還包括一第三量子阱結構33,第三量子阱結構33具有一第三工作波長範圍,該第二工作波長範圍和該第三工作波長範圍分別位於該第一工作波長的範圍的長波長側和短波長側。In a possible implementation of the present application, as still shown in FIG. 3 , the multi-layer quantum well structure 30 also includes a third quantum well structure 33 , and the third quantum well structure 33 has a third operating wavelength range. The second operating wavelength range and the third operating wavelength range are respectively located on the long wavelength side and the short wavelength side of the first operating wavelength range.

如圖3所示,本實施例的多結垂直共振腔面射型雷射元件中,包括在該基底10上設置的該多結主動層,該多結主動層包括依次設置的該底反射層20、該第三量子阱結構33、該第一量子阱結構31、該第二量子阱結構32、該頂反射層40,該第一量子阱結構31、該第二量子阱結構32和該第三量子阱結構33分別為該第一工作波長範圍、該第二工作波長範圍和該第三工作波長範圍,其中,該第二工作波長範圍和該第三工作波長範圍分別位於該第一工作波長的範圍的長波長側和短波長側,也即是說明,該第二量子阱結構32所具有該第二工作波長範圍和該第三量子阱結構33所具有該第三工作波長範圍分別從長波長側和短波長側擴大了本實施例的該多結垂直共振腔面射型雷射元件的穩定工作波長範圍,即該多結垂直共振腔面射型雷射元件的穩定工作溫度範圍也分別向溫度升高和溫度降低的方向實現了一定程度的擴展,使得調整後的穩定工作溫度範圍擴大了,能夠在一定程度降低溫度和升高溫度的情況下保持穩定的工作。As shown in Figure 3, the multi-junction vertical resonant cavity surface-emitting laser element of this embodiment includes the multi-junction active layer provided on the substrate 10. The multi-junction active layer includes the bottom reflection layer arranged in sequence. 20. The third quantum well structure 33, the first quantum well structure 31, the second quantum well structure 32, the top reflective layer 40, the first quantum well structure 31, the second quantum well structure 32 and the third The three quantum well structures 33 are respectively the first operating wavelength range, the second operating wavelength range and the third operating wavelength range, wherein the second operating wavelength range and the third operating wavelength range are respectively located at the first operating wavelength range. The long wavelength side and the short wavelength side of the range, that is to say, the second operating wavelength range of the second quantum well structure 32 and the third operating wavelength range of the third quantum well structure 33 are respectively from the long wavelength side. The wavelength side and the short wavelength side expand the stable operating wavelength range of the multi-junction vertical resonant cavity surface-emitting laser element of this embodiment, that is, the stable operating temperature range of the multi-junction vertical resonant cavity surface-emitting laser element is also respectively A certain degree of expansion is achieved in the direction of temperature increase and temperature decrease, so that the adjusted stable operating temperature range is expanded, and stable operation can be maintained with a certain degree of temperature decrease and temperature increase.

需要說明的是,在圖3中所示的結構示意圖中,該第二量子阱結構32位元於該第一量子阱結構31之上,該第三量子阱結構33位於該第一量子阱結構31之下,此作為一種示例的方式展示,事實上,具有不同工作波長範圍的該量子阱結構30之間的位置關係可以進行調節、調換或改變,不限於上述的舉例和圖3中的視圖展示。It should be noted that in the schematic structural diagram shown in FIG. 3 , the second quantum well structure 32 is located above the first quantum well structure 31 , and the third quantum well structure 33 is located on the first quantum well structure. 31, this is shown as an example. In fact, the positional relationship between the quantum well structures 30 with different operating wavelength ranges can be adjusted, exchanged or changed, and is not limited to the above example and the view in Figure 3 exhibit.

在本申請的一種可行的實施方式中,至少兩層該量子阱結構30的工作波長範圍之間鄰接。兩層該量子阱結構30的工作波長範圍之間鄰接,即一個該量子阱結構30的工作波長範圍的最大值和另一個該量子阱結構30的工作波長範圍的最小值相同,或者,也可以是一個該量子阱結構30的工作波長範圍的最小值和另一個該量子阱結構30的工作波長範圍的最大值相同,兩個工作波長範圍直接連續組成一個大的工作波長範圍。In a feasible implementation of the present application, the working wavelength ranges of at least two layers of the quantum well structure 30 are adjacent to each other. The working wavelength ranges of the two quantum well structures 30 are adjacent to each other, that is, the maximum value of the working wavelength range of one quantum well structure 30 is the same as the minimum value of the working wavelength range of the other quantum well structure 30 , or alternatively, The minimum value of the working wavelength range of one quantum well structure 30 is the same as the maximum value of the working wavelength range of the other quantum well structure 30. The two working wavelength ranges are directly continuous to form a large working wavelength range.

在本申請的另一種可行的實施方式中,多層該量子阱結構30的工作波長範圍之間不連續。通常情況下,多層該量子阱結構30可以通過晶體生長的方式形成,為了在有限的該量子阱結構30的層級中實現盡可能大的穩定工作溫度範圍,設置多層該量子阱結構30的工作波長範圍之間不連續,以使得多層該量子阱結構30中,工作波長中長波長的最大值和短波長的最小值之間盡可能相距大,從而使得具有該多層量子阱結構30的該多結垂直共振腔面射型雷射元件在這個長波長的最大值和短波長的最小值的差值所能滿足的工作溫度範圍內穩定工作。本申請實施例中的多層量子阱結構可以採用應變InGaAs多量子阱。In another feasible implementation of the present application, the operating wavelength ranges of the multiple layers of the quantum well structure 30 are discontinuous. Normally, the multi-layer quantum well structure 30 can be formed by crystal growth. In order to achieve the largest possible stable operating temperature range in the limited levels of the quantum well structure 30, the operating wavelength of the multi-layer quantum well structure 30 is set. The ranges are discontinuous, so that in the multi-layer quantum well structure 30, the maximum value of the long wavelength and the minimum value of the short wavelength in the operating wavelength are as far apart as possible, so that the multi-junction with the multi-layer quantum well structure 30 The vertical resonant cavity surface-emitting laser element operates stably within the operating temperature range that is satisfied by the difference between the maximum value of the long wavelength and the minimum value of the short wavelength. The multi-layer quantum well structure in the embodiment of the present application may use strained InGaAs multi-quantum wells.

在本申請的一種可行的實施方式中,多層該量子阱結構30劃分為至少兩組,每一組中包含有至少兩層該量子阱結構30,每一組中的該量子阱結構30的工作波長範圍相同,至少兩組該量子阱結構30的工作波長範圍不交疊。即將多層該量子阱結構30進行分組,每一組中的至少兩層該量子阱結構30具有相同的工作波長範圍,可以把一組該量子阱結構30視為一個組合,通過多個組合設置不同的工作波長範圍實現器件在廣的溫度範圍區間內高效穩定工作。In a feasible implementation of the present application, the multi-layer quantum well structure 30 is divided into at least two groups, each group contains at least two layers of the quantum well structure 30, and the operation of the quantum well structure 30 in each group is The wavelength ranges are the same, and the working wavelength ranges of at least two sets of quantum well structures 30 do not overlap. That is, multiple layers of the quantum well structures 30 are grouped, and at least two layers of the quantum well structures 30 in each group have the same operating wavelength range. A group of the quantum well structures 30 can be regarded as a combination, and different settings can be made through multiple combinations. The operating wavelength range enables the device to operate efficiently and stably in a wide temperature range.

在本申請的一種可行的實施方式中,多層該量子阱結構30至少包括一第一量子阱結構組和一第二量子阱結構組,其中,該第一量子阱結構組中所有的量子阱均具有該第一工作波長範圍,該第二量子阱結構組中所有的量子阱均具有該第二工作波長範圍,該第一工作波長範圍與該第二工作波長範圍不交疊。In a feasible implementation of the present application, the multi-layer quantum well structure 30 includes at least a first quantum well structure group and a second quantum well structure group, wherein all quantum wells in the first quantum well structure group are Having the first operating wavelength range, all quantum wells in the second quantum well structure group have the second operating wavelength range, and the first operating wavelength range does not overlap with the second operating wavelength range.

在本申請的一種可行的實施方式中,多層該量子阱結構30還包括第一三量子阱結構組,該第三量子阱結構組中所有的量子阱均具有該第三工作波長範圍,該第二工作波長範圍和該第三工作波長範圍分別位於該第一工作波長的範圍的長波長側和短波長側。In a feasible implementation of the present application, the multi-layer quantum well structure 30 also includes a first three quantum well structure group, and all quantum wells in the third quantum well structure group have the third operating wavelength range, and the third quantum well structure group has the third operating wavelength range. The second operating wavelength range and the third operating wavelength range are respectively located on the long wavelength side and the short wavelength side of the first operating wavelength range.

在本申請的一種可行的實施方式中,至少兩該量子阱結構組的工作波長範圍鄰接,或者,多組該量子阱結構組的工作波長範圍之間不連續。In a feasible implementation of the present application, the working wavelength ranges of at least two quantum well structure groups are adjacent, or the working wavelength ranges of multiple quantum well structure groups are discontinuous.

以上是當對多層該量子阱結構30以組為單位進行劃分後,依據本申請實施例的發明構思對量子阱的工作波長範圍進行的限定。The above is the limitation of the working wavelength range of the quantum well according to the inventive concept of the embodiment of the present application after the multi-layer quantum well structure 30 is divided into groups.

在本申請的一種可行的實施方式中,該底反射層20和/或該頂反射層40為分散式布拉格反射鏡(DistributedBraggReflector,簡稱DBR)。分散式布拉格反射鏡包括一導電P型分散式布拉格反射鏡和一導電N型分散式布拉格反射鏡。In a possible implementation of the present application, the bottom reflective layer 20 and/or the top reflective layer 40 is a Distributed Bragg Reflector (DBR for short). The dispersed Bragg reflector includes a conductive P-type dispersed Bragg reflector and a conductive N-type dispersed Bragg reflector.

需要說明的是,該底反射層20為分散式布拉格反射鏡,首先,可以為在N型砷化鎵材料的該基底10上生長橫向均勻的結晶層,以形成高折射率膜層和低折射率膜層交替層疊的多層結構,這一高折射率膜層和低折射率膜層交替層疊的多層結構極為該底反射層20的分散式布拉格反射鏡,同樣的,該頂反射層40為分散式布拉格反射鏡,可以為採用化學氣相沉積的方式形成的高折射率膜層和低折射率膜層交替層疊的多層結構。It should be noted that the bottom reflective layer 20 is a dispersed Bragg reflector. First, a laterally uniform crystal layer can be grown on the substrate 10 of N-type gallium arsenide material to form a high refractive index film layer and a low refractive index film. The multi-layer structure of alternately stacked high-refractive index film layers and low-refractive index film layers is a dispersed Bragg reflector of the bottom reflective layer 20. Similarly, the top reflective layer 40 is a dispersed Bragg reflector. The Bragg reflector can be a multi-layer structure in which high refractive index film layers and low refractive index film layers are alternately stacked using chemical vapor deposition.

在該量子阱結構30的上、下兩側分別設置的該底反射層20和該頂反射層40,與該量子阱結構30共同形成的類三明治的結構為該多結主動層,該量子阱結構30受到外加能量激發形成的光束在該多結主動層震盪激發放大,該底反射層20和該頂反射層40作為鐳射腔鏡,光束在兩個鐳射腔鏡之間反復反射,並在反射過程中吸收光能,產生諧振效應,使光能量不斷放大形成雷射光束出射。The bottom reflective layer 20 and the top reflective layer 40 are respectively provided on the upper and lower sides of the quantum well structure 30. The sandwich-like structure formed together with the quantum well structure 30 is the multi-junction active layer. The quantum well The light beam formed by the structure 30 being excited by the external energy oscillates and is amplified in the multi-junction active layer. The bottom reflective layer 20 and the top reflective layer 40 serve as laser cavity mirrors. The beam is repeatedly reflected between the two laser cavity mirrors, and is reflected during reflection. During the process, light energy is absorbed and a resonance effect is produced, which continuously amplifies the light energy to form a laser beam.

該底反射層20和/或該頂反射層40可以採用分散式布拉格反射鏡。示例的,該基底10可以由砷化鎵材料製備;該底反射層20包括該導電N型分散式布拉格反射鏡,材料可以是鋁鎵砷;該量子阱結構30的材料可以是鋁鎵砷和銦鎵砷形成的異質結結構;該頂反射層40包括該導電P型分散式布拉格反射鏡,材料可以是鋁鎵砷。The bottom reflective layer 20 and/or the top reflective layer 40 may use dispersed Bragg reflectors. For example, the substrate 10 can be made of gallium arsenide material; the bottom reflection layer 20 includes the conductive N-type dispersed Bragg reflector, and the material can be aluminum gallium arsenide; the material of the quantum well structure 30 can be aluminum gallium arsenide and A heterojunction structure formed by indium gallium arsenide; the top reflective layer 40 includes the conductive P-type dispersed Bragg reflector, and the material may be aluminum gallium arsenide.

此外,在本申請實施例的該多結垂直共振腔面射型雷射元件中還可以設置有氧化物層、隔離層等相應的層級結構,實現其已知功能,此處不做過多贅述。In addition, corresponding hierarchical structures such as oxide layers and isolation layers can also be provided in the multi-junction vertical resonant cavity surface-emitting laser element in the embodiment of the present application to realize its known functions, which will not be described in detail here.

在本申請的一種可行的實施方式中,該多結主動層在層級平面方向劃分有相互間隔的多個子多結主動層,以實現雷射光束陣列出光。In a feasible implementation of the present application, the multi-junction active layer is divided into a plurality of sub-multi-junction active layers spaced apart from each other in the direction of the hierarchical plane to achieve light emitting from the laser beam array.

該多結主動層在層級平面方向可以劃分為多個子多結主動層,相鄰的兩個該子多結主動層之間相互分隔,以使得每個子多結主動層分別實現激發光束和諧振放大的功能以出射雷射光束,從而實現整個該多結垂直共振腔面射型雷射元件發射面的陣列出射。The multi-junction active layer can be divided into multiple sub-multi-junction active layers in the direction of the hierarchical plane. Two adjacent sub-multi-junction active layers are separated from each other, so that each sub-multi-junction active layer can achieve excitation beam and resonance amplification respectively. The function is to emit the laser beam, thereby realizing the array emission of the entire multi-junction vertical resonant cavity surface-emitting laser element emitting surface.

在本申請的另一種可行的實施方式中,該多結垂直共振腔面射型雷射元件還可以為底發射結構。圖5為本申請實施例的多結垂直共振腔面發射鐳射器的層級結構示意圖之三,如圖5所示,底發射結構的該多結垂直共振腔面射型雷射元件激發出射的雷射光束由底部視窗出射,為了保證雷射光束的出光效率,可以選擇該基底10的材質為可透光材質或者底部視窗處為可透光材質,或者對該基底10的厚度進行減薄處理,例如將該基底10的厚度減薄至150μm以下以減少該基底10對出射雷射光束的吸收損耗作為底部視窗,此外,還可以通過生長增透膜等方式提高出射雷射光束的品質。同時,也可以採取倒裝芯片工藝和相應的封裝工藝來支援底發射結構的實現。示例的,通常可以在976-1064nm波段通常採用底發射結構實現該多結垂直共振腔面射型雷射元件。In another possible implementation of the present application, the multi-junction vertical resonant cavity surface-emitting laser element may also be a bottom-emitting structure. Figure 5 is the third schematic diagram of the hierarchical structure of the multi-junction vertical resonant cavity surface-emitting laser according to the embodiment of the present application. As shown in Figure 5, the multi-junction vertical resonant cavity surface-emitting laser element of the bottom-emitting structure excites the emitted laser. The laser beam emerges from the bottom window. In order to ensure the light extraction efficiency of the laser beam, the material of the substrate 10 can be selected to be a light-transmitting material or the bottom window can be made of a light-transmitting material, or the thickness of the substrate 10 can be reduced. For example, the thickness of the substrate 10 is reduced to less than 150 μm to reduce the absorption loss of the outgoing laser beam by the substrate 10 as a bottom window. In addition, the quality of the outgoing laser beam can be improved by growing an anti-reflection film. At the same time, flip-chip technology and corresponding packaging technology can also be used to support the implementation of bottom-emitting structures. For example, the multi-junction vertical resonant cavity surface-emitting laser element can usually be realized using a bottom-emitting structure in the 976-1064 nm band.

本申請實施例提供的該多結垂直共振腔面射型雷射元件,通過對多層該量子阱結構30中,至少兩層該量子阱結構30的工作波長範圍進行調節,使至少兩層該量子阱結構30的工作波長範圍不交疊,實現使得本申請實施例提供的該多結垂直共振腔面射型雷射元件在較大的一個溫度範圍區間內能夠具有較佳的輸出功率和工作穩定性。其中,可以根據本申請實施例的該多結垂直共振腔面射型雷射元件的具體應用領域和其所可能處於的溫度等環境進行具體的設置,若要長期在低於常溫的低溫環境下工作,可以將一部分該量子阱結構30的工作波長範圍向長波長方向調節一定的距離。若處於常溫中不良散熱的環境,或者處於高溫環境下工作,可以將一部分該量子阱結構30的工作波長範圍向短波長方向調節一定的距離。若工作環境惡劣,環境溫度可能在一個比較寬泛的範圍,例如在-40℃至120℃範圍內工作,則可以將一部分該量子阱結構30的工作波長範圍向短波長方向調節一定的距離、將另一部分量該子阱結構30的工作波長範圍向長波長方向調節一定的距離,並且保留一部分該量子阱結構30的工作波長範圍維持不變。The multi-junction vertical resonant cavity surface-emitting laser element provided by the embodiment of the present application adjusts the working wavelength range of at least two layers of the quantum well structure 30 in the multi-layer quantum well structure 30, so that at least two layers of the quantum well structure 30 can The working wavelength ranges of the well structures 30 do not overlap, so that the multi-junction vertical resonant cavity surface-emitting laser element provided by the embodiment of the present application can have better output power and stable operation in a larger temperature range. sex. Among them, specific settings can be made according to the specific application field of the multi-junction vertical resonant cavity surface-emitting laser element in the embodiment of the present application and the temperature and other environments it may be in. If it is to be used in a low-temperature environment lower than normal temperature for a long time, By working, the working wavelength range of a part of the quantum well structure 30 can be adjusted to a certain distance in the long wavelength direction. If it is in an environment with poor heat dissipation at normal temperature, or works in a high temperature environment, the working wavelength range of part of the quantum well structure 30 can be adjusted to a short wavelength direction by a certain distance. If the working environment is harsh and the ambient temperature may be in a relatively wide range, such as -40°C to 120°C, the working wavelength range of part of the quantum well structure 30 can be adjusted to a short wavelength direction by a certain distance. Another part of the operating wavelength range of the sub-well structure 30 is adjusted by a certain distance toward the long wavelength direction, and a part of the operating wavelength range of the quantum well structure 30 remains unchanged.

本申請實施例提供的該多結垂直共振腔面射型雷射元件能夠調節其可高功率穩定工作的溫度範圍區間,本申請實施例提供的該多結垂直共振腔面射型雷射元件應用於物聯網作為感測器件或者作為資料中心實現雲計算的器件,能夠提供較高的輸出功率,當處於散熱不良的環境中,也可以保持穩定的工作能力。應用於消費電子設備的3D成像中,例如紅外點陣投影器的3D人臉識別,則設備可應用於室外各種溫度環境中保證識別準確性。The multi-junction vertical resonant cavity surface-emitting laser element provided by the embodiment of the present application can adjust the temperature range in which it can operate stably at high power. The application of the multi-junction vertical resonant cavity surface-emitting laser element provided by the embodiment of the present application As a sensing device for the Internet of Things or as a device for data center implementation of cloud computing, it can provide higher output power and maintain stable working capabilities when in an environment with poor heat dissipation. When used in 3D imaging of consumer electronics devices, such as 3D face recognition using infrared dot matrix projectors, the device can be used in various outdoor temperature environments to ensure recognition accuracy.

特別是,當本申請實施例提供的該多結垂直共振腔面射型雷射元件應用於汽車自動駕駛中的通訊感測器,雷射雷達等,由於汽車的駕駛環境較為惡劣,更需要能夠在更寬的溫度範圍內實現穩定工作效果的多結垂直共振腔面射型雷射元件,通過通訊感測器或雷射雷達的穩定工作提升汽車自動駕駛的安全性。In particular, when the multi-junction vertical resonant cavity surface-emitting laser element provided by the embodiment of the present application is used in communication sensors, laser radar, etc. in automatic driving of automobiles, due to the harsh driving environment of automobiles, it is more necessary to be able to The multi-junction vertical resonant cavity surface-emitting laser element achieves stable operation in a wider temperature range and improves the safety of autonomous vehicle driving through the stable operation of communication sensors or laser radars.

以上該僅為本申請的實施例而已,並不用於限制本申請的保護範圍,對於本領域的技術人員來說,本申請可以有各種更改和變化。凡在本申請的精神和原則之內,所作的任何修改、等同替換、改進等,均應包含在本申請的保護範圍之內。The above are only examples of the present application and are not intended to limit the scope of protection of the present application. For those skilled in the art, the present application may have various modifications and changes. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of this application shall be included in the protection scope of this application.

10:基底 20:底反射層 30:量子阱結構 31:第一量子阱結構 32:第二量子阱結構 33:第三量子阱結構 40:頂反射層 60:下電極 70:上電極 10: Base 20: Bottom reflective layer 30: Quantum well structure 31: First quantum well structure 32: Second quantum well structure 33: The third quantum well structure 40:Top reflective layer 60: Lower electrode 70: Upper electrode

圖1是多結垂直共振腔面射型雷射元件的工作效率隨溫度變化的示意圖。 圖2是本申請實施例的多結垂直共振腔面射型雷射元件的層級結構示意圖之一。 圖3是本申請實施例的多結垂直共振腔面射型雷射元件的層級結構示意圖之二。 圖4是本申請實施例的多結垂直共振腔面射型雷射元件與現有技術的多結垂直共振腔面射型雷射元件的相對輸出功率受溫度影響的對比圖。 圖5是本申請實施例的多結垂直共振腔面射型雷射元件的層級結構示意圖之三。 Figure 1 is a schematic diagram showing the working efficiency of a multi-junction vertical resonant cavity surface-emitting laser element as it changes with temperature. FIG. 2 is a schematic diagram of the hierarchical structure of a multi-junction vertical resonant cavity surface-emitting laser element according to an embodiment of the present application. FIG. 3 is the second schematic diagram of the hierarchical structure of the multi-junction vertical resonant cavity surface-emitting laser element according to the embodiment of the present application. Figure 4 is a comparison diagram of the relative output power affected by temperature between the multi-junction vertical resonant cavity surface-emitting laser element according to the embodiment of the present application and the multi-junction vertical resonant cavity surface-emitting laser element in the prior art. FIG. 5 is a third schematic diagram of the hierarchical structure of the multi-junction vertical resonant cavity surface-emitting laser element according to the embodiment of the present application.

10:基底 10: Base

20:底反射層 20: Bottom reflective layer

30:量子阱結構 30: Quantum well structure

40:頂反射層 40:Top reflective layer

60:下電極 60: Lower electrode

70:上電極 70: Upper electrode

Claims (10)

一種多結垂直共振腔面射型雷射元件,其特徵在於,包括: 一基底、在該基底上設置的一底反射層、沿層級生長方向依次設置的一多結主動層和一頂反射層,該多結主動層包括疊加的多層量子阱結構,疊加的多層該量子阱結構中,至少兩層該量子阱結構的工作波長範圍不交疊。 A multi-junction vertical resonant cavity surface-emitting laser element, which is characterized by including: A substrate, a bottom reflective layer arranged on the substrate, a multi-junction active layer and a top reflective layer arranged sequentially along the layer growth direction. The multi-junction active layer includes a superimposed multi-layer quantum well structure, and the superimposed multi-layer quantum well structure is In the well structure, the operating wavelength ranges of at least two layers of the quantum well structure do not overlap. 如請求項1所述之多結垂直共振腔面射型雷射元件,其中,多層該量子阱結構至少包括一第一量子阱結構和一第二量子阱結構,其中,該第一量子阱結構具有一第一工作波長範圍,該第二量子阱結構具有一第二工作波長範圍,該第一工作波長範圍與該第二工作波長範圍不交疊。The multi-junction vertical resonant cavity surface emitting laser element as claimed in claim 1, wherein the multi-layer quantum well structure at least includes a first quantum well structure and a second quantum well structure, wherein the first quantum well structure Having a first operating wavelength range, the second quantum well structure has a second operating wavelength range, and the first operating wavelength range and the second operating wavelength range do not overlap. 如請求項2所述之多結垂直共振腔面射型雷射元件,其中,多層該量子阱結構還包括一第三量子阱結構,該第三量子阱結構具有一第三工作波長範圍,該第二工作波長範圍和該第三工作波長範圍分別位於該第一工作波長範圍的長波長側和短波長側。The multi-junction vertical resonant cavity surface-emitting laser element as claimed in claim 2, wherein the multi-layer quantum well structure further includes a third quantum well structure, and the third quantum well structure has a third operating wavelength range, and the The second operating wavelength range and the third operating wavelength range are respectively located on the long wavelength side and the short wavelength side of the first operating wavelength range. 如請求項1所述之多結垂直共振腔面射型雷射元件,其中,至少兩層該量子阱結構的工作波長範圍鄰接。The multi-junction vertical resonant cavity surface-emitting laser element according to claim 1, wherein the operating wavelength ranges of at least two layers of the quantum well structures are adjacent. 如請求項1所述之多結垂直共振腔面射型雷射元件,其中,多層該量子阱結構的工作波長範圍之間不連續。The multi-junction vertical resonant cavity surface-emitting laser element according to claim 1, wherein the operating wavelength ranges of the multi-layer quantum well structures are discontinuous. 如請求項1所述之多結垂直共振腔面射型雷射元件,其中,多層該量子阱結構沿層級生長方向劃分為至少兩組,每一組中包含至少兩層該量子阱結構,每一組中的該量子阱結構的工作波長範圍相同,至少兩組的該量子阱結構的工作波長範圍不交疊。The multi-junction vertical resonant cavity surface-emitting laser element as described in claim 1, wherein the multi-layer quantum well structure is divided into at least two groups along the layer growth direction, and each group contains at least two layers of the quantum well structure. The working wavelength ranges of the quantum well structures in one group are the same, and the working wavelength ranges of the quantum well structures in at least two groups do not overlap. 如請求項1所述之多結垂直共振腔面射型雷射元件,其中,該底反射層和/或該頂反射層為一分散式布拉格反射鏡。The multi-junction vertical resonant cavity surface-emitting laser element as claimed in claim 1, wherein the bottom reflective layer and/or the top reflective layer is a dispersed Bragg reflector. 如請求項7所述之多結垂直共振腔面射型雷射元件,其中,該分散式布拉格反射鏡包括一導電P型分散式布拉格反射鏡和一導電N型分布式布拉格反射鏡。The multi-junction vertical resonant cavity surface-emitting laser element as claimed in claim 7, wherein the distributed Bragg reflector includes a conductive P-type distributed Bragg reflector and a conductive N-type distributed Bragg reflector. 如請求項1所述之多結垂直共振腔面射型雷射元件,其中,該多結主動層在層級平面方向劃分有相互間隔的多個子多結主動層,以實現雷射光束陣列出光。The multi-junction vertical resonant cavity surface-emitting laser element as claimed in claim 1, wherein the multi-junction active layer is divided into a plurality of sub-multi-junction active layers spaced apart from each other in the layer plane direction to realize laser beam array emission. 如請求項1所述之多結垂直共振腔面射型雷射元件,其中,該多結垂直共振腔面射型雷射元件為底發射結構或者頂發射結構。The multi-junction vertical resonant cavity surface-emitting laser element according to claim 1, wherein the multi-junction vertical resonant cavity surface-emitting laser element has a bottom-emitting structure or a top-emitting structure.
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