TW202348742A - Resin composition, method for producing resin composition, pigment derivative, film, optical filter, solid-state imaging element and image display device - Google Patents

Abstract

Provided are: a resin composition which contains a pigment, a pigment derivative which has a crystallite size of 50nm or less, a resin and a solvent; a method for producing the resin composition; a pigment derivative; a film; an optical filter; a solid-state imaging element; and an image display device.

Description

Resin composition, method for manufacturing resin composition, pigment derivative, film, optical filter, solid imaging element, and image display device

The present invention relates to a resin composition containing pigments and pigment derivatives and a manufacturing method thereof. Furthermore, the present invention relates to a pigment derivative, a film, an optical filter, a solid-state imaging element, and an image display device.

In recent years, due to the popularity of digital cameras, camera-equipped mobile phones, etc., the demand for solid-state imaging components such as charge-coupled device (CCD) image sensors has increased significantly. As a central device in displays or optical components, color filters are used.

Optical filters such as color filters are manufactured using resin compositions containing color materials and resin. When a pigment is used as a color material, the pigment is dispersed together with a pigment derivative and a resin.

Patent Document 1 describes a colored resin composition for color filters, which contains a pigment dispersion liquid produced by dispersing a pigment, an acidic derivative, and a resin. The intensity of the main peak of the X-ray diffraction spectrum of the pigment (S ) divided by the intensity of background noise (N), the value (S/N) is 90 or less; alkali-soluble resin; polymerizable compound; and photopolymerization initiator.

[Patent Document 1] Japanese Patent Application Publication No. 2015-175882

Regarding resin compositions containing pigments, in recent years, there has been a demand for further improvements in the dispersion stability of the pigments.

Therefore, an object of the present invention is to provide a resin composition excellent in pigment dispersion stability and a method for producing the same. Furthermore, another object of the present invention is to provide a pigment derivative, a film, an optical filter, a solid-state imaging element, and an image display device.

The present invention provides the following.

<1> A resin composition containing: a pigment; a pigment derivative with a crystallite size of 50 nm or less; a resin; and a solvent. <2> The resin composition according to <1>, wherein the pigment derivative is a particle of a compound having at least one structure selected from the group consisting of a pigment structure and a tri-hydroxy structure and an acid group or a base. <3> The resin composition as described in <2>, wherein the pigment structure is selected from the group consisting of diketopyrrolopyrrole structure, pyrrolopyrrole structure, methimine structure, isoindoline structure, quinoline yellow structure, and even At least one of the group consisting of nitrogen structure, anthraquinone structure, thiolindigo structure, quinacridone structure, benzoindole structure, phthalocyanine structure and dimethacin structure. <4> The resin composition according to <1>, wherein the pigment derivative is a compound represented by formula (DPP), [Chemical Formula 1] In the formula, R ^D1 and R ^D2 each independently represent a hydrogen atom or a substituent, A ^D1 and A ^D2 each independently represent a substituent, L ^D1 represents a single bond or an n+1 valent linking group, X ^D1 represents an acid group or a base In the base, m represents an integer from 1 to 10, and n represents an integer from 1 to 10. When m is 2 or more, a plurality of L ^D1 and X ^D1 may be different from each other, and when n is 2 or more, a plurality of X ^D1 may be different from each other. <5> The colored composition according to any one of <1> to <4>, further containing a photopolymerization initiator and a polymerizable compound. <6> A method for producing a resin composition, which includes the steps of dispersing a pigment, a pigment derivative with a crystallite size of 1 to 50 nm, and a resin in a solvent. <7> The method for producing a resin composition according to <6>, wherein the pigment derivative is a compound having at least one structure selected from the group consisting of a pigment structure and a tri-hydroxy structure and an acid group or a base. particle of. <8> The manufacturing method of the resin composition according to <7>, wherein the pigment structure is selected from the group consisting of diketopyrrolopyrrole structure, pyrrolopyrrole structure, methimine structure, isoindoline structure, and quinoline yellow At least one of the group consisting of structure, azo structure, anthraquinone structure, thiolindigo structure, quinacridone structure, benzoindole structure, phthalocyanine structure and dimethacin structure. <9> The method for producing a resin composition according to <6>, wherein the pigment derivative is a compound represented by the formula (DPP), [Chemical Formula 2] In the formula, R ^D1 and R ^D2 each independently represent a hydrogen atom or a substituent, A ^D1 and A ^D2 each independently represent a substituent, L ^D1 represents a single bond or an n+1 valent linking group, X ^D1 represents an acid group or a base In the base, m represents an integer from 1 to 10, and n represents an integer from 1 to 10. When m is 2 or more, a plurality of L ^D1 and X ^D1 may be different from each other, and when n is 2 or more, a plurality of X ^D1 may be different from each other. <10> A pigment derivative, which is a particle of a compound having at least one structure selected from the group consisting of a pigment structure and a trivalent structure and an acid group or a base, wherein the crystallite size is 1 to 50 nm. <11> The pigment derivative according to <10>, which is a dispersion aid. <12> A film obtained using the resin composition according to any one of <1> to <5>. <13> An optical filter having the film according to <12>. <14> A solid-state imaging element having the film according to <12>. <15> An image display device having the film according to <12>. [Effects of the invention]

According to the present invention, a resin composition excellent in pigment dispersion stability and a manufacturing method thereof can be provided. Furthermore, according to the present invention, it is possible to provide a pigment derivative, a film, an optical filter, a solid-state imaging element, and an image display device.

Hereinafter, the contents of the present invention will be described in detail. In this specification, "～" is used in the sense that the numerical values described before and after it are included as the lower limit and the upper limit. Among the labels for groups (atomic groups) in this specification, the labels indicating unsubstituted and unsubstituted include groups (atomic groups) without substituents as well as groups (atomic groups) with substituents. For example, "alkyl" includes not only alkyl groups without substituents (unsubstituted alkyl groups) but also alkyl groups with substituents (substituted alkyl groups). In this specification, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams, unless otherwise specified. Examples of the light used for exposure include the bright line spectrum of a mercury lamp, active light or radiation such as far ultraviolet light, extreme ultraviolet light (EUV light), X-rays, and electron beams represented by excimer lasers. In this specification, "(meth)acrylate" means both or either acrylate and methacrylate, "(meth)acrylic acid" means both or either acrylic acid and methacrylic acid, and "(meth)acrylic acid" means both or either acrylic acid and methacrylic acid. "Meth)acrylyl" means both or either of acrylyl and methacrylyl. In this specification, Me in the structural formula represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, Pr represents a propyl group, and Ph represents a phenyl group. In this specification, the weight average molecular weight and the number average molecular weight are polystyrene-converted values measured by the GPC (gel permeation chromatography) method. In this specification, near-infrared rays refer to light with a wavelength of 700 to 2500 nm. In this specification, the total solid content refers to the total mass of components excluding solvents from all components of the composition. In this specification, pigments refer to color materials that are not easily soluble in solvents. For example, the solubility of the pigment in 100 g of water at 23° C. and 100 g of propylene glycol monomethyl ether acetate at 23° C. is preferably 0.1 g or less, and more preferably 0.01 g or less. In this specification, dye refers to color materials that are not easily soluble in solvents. In this specification, the term "step" includes not only independent steps, but also includes them even when they cannot be clearly distinguished from other steps, as long as the expected effect of the step is achieved.

＜Resin composition＞ The resin composition of the present invention is characterized by containing: pigment; Pigment derivatives with crystallite size below 50nm; Resin; and Solvent.

The resin composition of the present invention has excellent pigment dispersion stability. The reason for obtaining such an effect is presumed to be that the pigment derivative is effectively adsorbed on the surface of the pigment due to the crystallite size of the pigment derivative being 50 nm or less, thereby forming a resin, a pigment, and a pigment derivative in the resin composition. A strong network can stably maintain the dispersed state of the pigment in the resin composition. As a result, it is possible to suppress the generation of coarse particles or changes in viscosity due to aggregation of the pigment during production or aggregation of the pigment during storage. The properties change with time, thereby making it a resin composition with excellent pigment dispersion stability.

Furthermore, even when a pattern is formed by photolithography using the resin composition of the present invention, the generation of development residue can be suppressed. The reason for obtaining this effect is speculated to be as follows. It is speculated that if the pigment derivative exists as a simple substance, the pigment derivative existing as a simple particle is adsorbed to the support and tends to remain as a development residue after development. However, in the resin composition of the present invention, the pigment derivative It is effectively adsorbed to pigments, so pigment derivatives are less likely to remain as simple particles. It is presumed that for this reason, the generation of development residue can be suppressed. When the resin composition of the present invention is used for photolithography, it is preferred that the resin composition of the present invention further contains a polymerizable compound and a photopolymerization initiator. In addition, the resin preferably includes a resin having an acid group.

The resin composition of the present invention can be preferably used as a resin composition for optical filters. Examples of the optical filter include a color filter, a near-infrared transmission filter, a near-infrared cutoff filter, and the like, and a color filter is preferred. Furthermore, the resin composition of the present invention can be suitably used as a solid-state imaging element. More specifically, it can be used preferably as a resin composition for optical filters used in solid-state imaging devices, and more preferably as a resin composition for forming colored pixels used in color filters for solid-state imaging devices. use.

Examples of the color filter include a filter having colored pixels that transmit light of a specific wavelength. Examples of colored pixels include red pixels, green pixels, blue pixels, magenta pixels, cyan pixels, yellow pixels, etc. Green pixels or cyan pixels are preferred, and green pixels are more preferred. The colored pixels of the color filter can be formed using a resin composition containing a color pigment.

The maximum absorption wavelength of the near-infrared cutoff filter is preferably in the range of 700 to 1800 nm, more preferably in the range of 700 to 1400 nm, and still more preferably in the range of 700 to 1200 nm. In addition, the transmittance of the near-infrared cut filter in the entire wavelength range of 400 to 650 nm is preferably 70% or more, more preferably 80% or more, and still more preferably 90% or more. In addition, the transmittance at at least one location within the wavelength range of 700 to 1800 nm is preferably 20% or less. In addition, the ratio of the absorbance Amax at the maximum absorption wavelength of the near-infrared cut filter to the absorbance A550 at the wavelength of 550 nm (absorbance Amax/absorbance A550) is preferably 20 to 500, more preferably 50 to 500, and 70 to 450. More preferably, 100 to 400 is particularly preferred. The near-infrared cut filter can be formed using a resin composition containing a near-infrared absorbing pigment.

The near-infrared transmission filter is a filter that transmits at least a part of near-infrared rays. The near-infrared transmission filter may be a filter (transparent film) that transmits both visible light and near-infrared rays, or may be a filter that blocks at least part of the visible light and transmits at least part of the near-infrared rays. Preferable examples of the near-infrared transmission filter include those that have a maximum value of transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 640 nm and at a wavelength of 400 to 640 nm. Filters with spectral characteristics such that the minimum value of transmittance in the range of 1100 to 1300 nm is 70% or more (preferably 75% or more, more preferably 80% or more). The near-infrared transmission filter is preferably a filter that satisfies the spectral characteristics of any one of the following (1) to (5). (1): The maximum value of the transmittance in the wavelength range of 400 to 640 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 800 to 1500 nm A filter with a minimum value of 70% or more (preferably 75% or more, more preferably 80% or more). (2): The maximum value of the transmittance in the wavelength range of 400 to 750 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 900 to 1500 nm A filter with a minimum value of 70% or more (preferably 75% or more, more preferably 80% or more). (3): The maximum value of the transmittance in the wavelength range of 400 to 830 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 1000 to 1500 nm A filter with a minimum value of 70% or more (preferably 75% or more, more preferably 80% or more). (4): The maximum value of the transmittance in the wavelength range of 400 to 950 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 1100 to 1500 nm A filter with a minimum value of 70% or more (preferably 75% or more, more preferably 80% or more). (5): The maximum value of the transmittance in the wavelength range of 400 to 1050 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 1200 to 1500 nm A filter with a minimum value of 70% or more (preferably 75% or more, more preferably 80% or more).

The resin composition of the present invention can also be used for light-shielding films and the like.

The resin composition of the present invention preferably has a solid content concentration of 5 to 30% by mass. The lower limit is preferably 7.5% by mass or more, and more preferably 10% by mass or more. The upper limit is preferably 25 mass% or less, more preferably 20 mass% or less, and still more preferably 15 mass% or less.

Each component used in the resin composition of the present invention will be described below.

＜＜Pigment＞＞ The resin composition of the present invention contains pigments. Examples of pigments include white pigments, black pigments, color pigments, and near-infrared absorbing pigments. Furthermore, in this specification, white pigments include not only pure white, but also light gray (such as off-white, light gray, etc.) pigments that are close to white.

When the resin composition is used as a color filter, a color pigment is used as the pigment. The color pigment may be only one type, or may contain two or more types. When the resin composition is used for forming a near-infrared cut filter, a near-infrared absorbing pigment is used as the pigment. The number of near-infrared absorbing pigments may be only one type, or two or more types may be included. When the resin composition is used as a near-infrared transmission filter, two or more color pigments are used in combination as the pigment, or one containing a black pigment is used.

The average primary particle size of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, and more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and still more preferably 100 nm or less. If the average primary particle diameter of the pigment is within the above range, the dispersion stability of the pigment in the resin composition will be good. In addition, in this specification, the primary particle size of a pigment can be determined from the photograph obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of the primary particles of the pigment is determined, and the equivalent circle diameter corresponding thereto is calculated as the primary particle diameter of the pigment. In addition, the average primary particle diameter in the present invention is the arithmetic average of the primary particle diameters of 400 primary particles of the pigment. In addition, the primary particles of the pigment refer to independent particles that are not agglomerated.

The specific surface area of the pigment is preferably 1 to 300 m ² /g. The lower limit is preferably 10 m ² /g or more, and more preferably 30 m ² /g or more. The upper limit is preferably 250 m ² /g or less, and more preferably 200 m ² /g or less. The value of the specific surface area can be determined according to the BET (Brunauer, Emmett and Teller) method and according to DIN 66131: determination of the specific surface area of solids by gas adsorption (specific surface area of solids based on gas adsorption) (measurement).

The crystallite size, calculated from the half-value width of the peak of any crystal plane in the X-ray diffraction spectrum when the CuKα ray of the pigment is used as the X-ray source, is preferably 0.1 nm to 100 nm, and 0.5 nm to 50nm is more preferred, 1nm to 30nm is further preferred, and 5nm to 25nm is particularly preferred.

The pigments used in the present invention are selected from the group consisting of diketopyrrolopyrrole pigments, pyrrolopyrrole pigments, methimine pigments, isoindoline pigments, quinoline yellow pigments, azo pigments, anthraquinone pigments, and thiophene pigments. Preferably, at least one of the group consisting of indigo pigments, quinacridone pigments, benzindole pigments, phthalocyanine pigments and dioxins pigments is used.

Hereinafter, the pigment used in this invention is demonstrated in further detail.

(color pigment) The color pigment is not particularly limited, and known color pigments can be used. Examples of color pigments include pigments having a maximum absorption wavelength in the wavelength range of 400 to 700 nm. Examples include yellow pigments, orange pigments, red pigments, green pigments, purple pigments, and blue pigments. Specific examples of these include the following.

C.I. Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36 ,36:1,37,37:1,40,42,43,53,55,60,61,62,63,65,73,74,77,81,83,86,93,94,95,97 ,98,100,101,104,106,108,109,110,113,114,115,116,117,118,119,120,123,125,126,127,128,129,137,138,139 ,147,148,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174,175,176,177,179 , 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232, 233, 234, 235, 236, etc. (the above are yellow pigments), C.I. Pigment Orange 2, 5, 13, 16, 17: 1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73 etc. (the above is orange pigment), C.I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4 , 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3 ,83,88,90,105,112,119,122,123,144,146,149,150,155,166,168,169,170,171,172,175,176,177,178,179,184 ,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,269,270,272,279,291 , 294, 295, 296, 297, etc. (the above are red pigments), C.I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64, 65, 66, etc. (the above are green pigments), C.I. Pigments purple 1, 19, 23, 27, 32, 37, 42, 60, 61, etc. (the above are purple pigments), C.I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87, 88, etc. ( The above is blue pigment).

As the green pigment, it is also possible to use a halogenated zinc phthalocyanine pigment having an average number of halogen atoms in one molecule of 10 to 14, an average number of bromine atoms in one molecule of 8 to 12, and an average number of chlorine atoms in one molecule of 2 to 5. Specific examples include compounds described in International Publication No. 2015/118720. In addition, as the green pigment, the compound described in Chinese Patent Application No. 106909027, the phthalocyanine compound having a phosphate ester as a ligand described in International Publication No. 2012/102395, and Japanese Patent Application Laid-Open No. 2019-008014 can also be used. Phthalocyanine compounds described in the publication, phthalocyanine compounds described in Japanese Patent Application Publication No. 2018-180023, compounds described in Japanese Patent Application Publication No. 2019-038958, aluminum phthalocyanine described in Japanese Patent Application Publication No. 2020-070426 Compounds, core-shell pigments described in Japanese Patent Application Laid-Open No. 2020-076995, etc.

As the blue pigment, aluminum phthalocyanine pigment having a phosphorus atom can also be used. Specific examples include compounds described in paragraphs 0022 to 0030 of Japanese Patent Application Laid-Open No. 2012-247591 and paragraph 0047 of Japanese Patent Application Laid-Open No. 2011-157478.

As a yellow pigment, a nickel azobarbiturate complex having the following structure can be used. [Chemical formula 3]

As the yellow pigment, compounds described in Japanese Patent Application Laid-Open No. 2017-201003, compounds described in Japanese Patent Application Laid-Open No. 2017-197719, and paragraphs 0011 to 0062 and 0137 to 0276 of Japanese Patent Application Laid-Open No. 2017-171912 can also be used. Compounds described in Paragraphs 0010 to 0062 and 0138 to 0295 of Japanese Patent Application Laid-Open No. 2017-171913, Compounds described in Paragraphs 0011 to 0062 and 0139 to 0190 of Japanese Patent Application Laid-Open No. 2017-171914, Japan Compounds described in paragraphs 0010 to 0065 and 0142 to 0222 of Japanese Patent Application Laid-Open No. 2017-171915, quinoline yellow compounds described in paragraphs 0011 to 0034 of Japanese Patent Application Laid-Open No. 2013-054339, Japanese Patent Application Laid-Open No. 2014-026228 Quinoline yellow compounds described in paragraphs 0013 to 0058, isoindoline compounds described in Japanese Patent Application Laid-Open No. 2018-062644, quinoline yellow compounds described in Japanese Patent Application Laid-Open No. 2018-203798, Japanese Patent Application Laid-Open No. 2018 - Quinophthalone compounds described in Japanese Patent Publication No. 062578, quinophthaline compounds described in Japanese Patent Publication No. 6432076, quinophthaline compounds described in Japanese Patent Application Laid-Open No. 2018-155881, Japanese Patent Application Laid-Open No. 2018-111757 Quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2018-040835, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2017-197640, and Japanese Patent Application Laid-Open No. 2016-145282 The quinoline yellow compound, the quinoline yellow compound described in Japanese Patent Application Laid-Open No. 2014-085565, the quinoline yellow compound described in Japanese Patent Application Laid-Open No. 2014-021139, the quinoline yellow compound described in Japanese Patent Application Laid-Open No. 2013-209614 Quinophthal compounds, quinophthal compounds described in Japanese Patent Application Laid-Open No. 2013-209435, quinophthal compounds described in Japanese Patent Application Laid-Open No. 2013-181015, quinophthal compounds described in Japanese Patent Application Laid-Open No. 2013-061622 Compounds, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2013-032486, quinophthaline compounds described in Japanese Patent Application Laid-Open No. 2012-226110, quinophthaline compounds described in Japanese Patent Application Laid-Open No. 2008-074987, Quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2008-081565, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2008-074986, quinophthaline compounds described in Japanese Patent Application Laid-Open No. 2008-074985, Japanese Patent Application Laid-Open No. 2008-074985 Quinophthalone compounds described in Japanese Patent Application Publication No. 2008-050420, quinophthaline compounds described in Japanese Patent Application Publication No. 2008-031281, quinophthaline compounds described in Japanese Patent Application Publication No. 48-032765, Japanese Patent Application Publication No. 2019 - The quinophthalone compound described in the Publication No. 008014, the quinoline yellow compound described in the Japanese Patent Publication No. 6607427, the compound described in the Korean Patent Publication No. 10-2014-0034963, and the Japanese Patent Application Publication No. 2017-095706 Compounds described in, Compounds described in Taiwan Patent Application Publication No. 201920495, Compounds described in Japanese Patent Application No. 6607427, Compounds described in Japanese Patent Application Publication No. 2020-033525, Japanese Patent Application Publication No. 2020-033524 Compounds described in Japanese Patent Application Publication No. 2020-033523, Compounds described in Japanese Patent Application Publication No. 2020-033522, Compounds described in Japanese Patent Application Publication No. 2020-033521, International Publication No. 2020/045200 Compounds described in International Publication No. 2020/045199, Compounds described in International Publication No. 2020/045197, Azo compounds described in Japanese Patent Application Publication No. 2020-093994, Japanese Patent Application Publication No. 2020- The perylene compound described in Publication No. 083982, the perylene compound described in International Publication No. 2020/105346, the quinoline compound described in Japanese Patent Publication No. 2020-517791, the compound represented by the following formula (QP1), A compound represented by the following formula (QP2). In addition, from the viewpoint of improving the color value, those in which these compounds are polymerized can also be preferably used. [Chemical formula 4]

In the formula (QP1), X ¹ to X ¹⁶ each independently represent a hydrogen atom or a halogen atom, and Z ¹ represents an alkylene group having 1 to 3 carbon atoms. Specific examples of the compound represented by formula (QP1) include the compound described in paragraph 0016 of Japanese Patent No. 6443711. [Chemical Formula 5]

In formula (QP2), Y ¹ to Y ³ each independently represent a halogen atom. n and m represent an integer from 0 to 6, and p represents an integer from 0 to 5. (n+m) is 1 or more. Specific examples of the compound represented by formula (QP2) include compounds described in paragraphs 0047 to 0048 of Japanese Patent No. 6432077.

As the red pigment, diketopyrrolopyrrole compounds described in Japanese Patent Application Laid-Open No. 2017-201384 in which at least one bromine atom is substituted in the structure and diketopyrrolopyrrole compounds described in paragraphs 0016 to 0022 of Japanese Patent No. 6248838 can also be used. Pyrrolopyrrole compound, diketopyrrolopyrrole compound described in International Publication No. 2012/102399, diketopyrrolopyrrole compound described in International Publication No. 2012/117965, bromine described in Japanese Patent Application Laid-Open No. 2020-085947 diketopyrrolopyrrole compound, naphthol azo compound described in Japanese Patent Application Laid-Open No. 2012-229344, red pigment described in Japanese Patent No. 6516119, red pigment described in Japanese Patent No. 6525101, Japan The brominated diketopyrrolopyrrole compound described in paragraph 0229 of Japanese Unexamined Patent Publication No. 2020-090632, the anthraquinone compound described in Korean Patent Publication No. 10-2019-0140741, and the Korean Patent Publication No. 10-2019-0140744 Anthraquinone compounds described in the publication, perylene compounds described in Japanese Patent Application Laid-Open No. 2020-079396, diketopyrrolopyrrole compounds described in paragraphs 0025 to 0041 of Japanese Patent Application Laid-Open No. 2020-066702, and the like. In addition, as the red pigment, a compound having the following structure can also be used: an aromatic ring group in which a group bonded with an oxygen atom, a sulfur atom or a nitrogen atom is introduced into an aromatic ring, and a diketopyrrolopyrrole skeleton bond Knot.

For various pigments with better diffraction angles, please refer to Japanese Patent No. 6561862, Japanese Patent No. 6413872, Japanese Patent No. 6281345, Japanese Patent Publication No. 2020-026503, and Japanese Patent Publication No. 2020-033526. The records in the official gazette are incorporated into this manual. In addition, as the pyrrolopyrrole pigment, those having a crystallite size of 140 Å or less in the direction of the plane corresponding to the maximum peak in the X-ray diffraction pattern among the eight planes of the lattice plane (±1±1±1) may also be used. Better. In addition, the physical properties of the pyrrolopyrrole pigment are preferably as described in paragraphs 0028 to 0073 of Japanese Patent Application Laid-Open No. 2020-097744.

Two or more types of color pigments can be used in combination. For example, when the resin composition of the present invention is used for forming green pixels in a color filter, it is preferable to use both a green pigment and a yellow pigment. Furthermore, when the resin composition of the present invention is used for forming red pixels in a color filter, it is preferable to use a red pigment and a yellow pigment in combination.

When two or more kinds of color pigments are used in combination, black can be formed by the combination of two or more kinds of color pigments. Examples of such combinations include the following aspects (1) to (7). When the resin composition contains two or more color pigments and the combination of the two or more color pigments renders black, the resin composition of the present invention can be preferably used as a resin composition for forming a near-infrared transmission filter. (1) Containing red pigment and blue pigment. (2) Containing red pigment, blue pigment and yellow pigment. (3) Containing red pigment, blue pigment, yellow pigment and purple pigment. (4) Containing red pigment, blue pigment, yellow pigment, purple pigment and green pigment. (5) Containing red pigment, blue pigment, yellow pigment and green pigment. (6) Containing red pigment, blue pigment and green pigment. (7) Contains yellow pigment and purple pigment.

(white pigment) Examples of white pigments include titanium oxide, strontium titanate, barium titanate, zinc oxide, magnesium oxide, zirconium oxide, aluminum oxide, barium sulfate, silicon dioxide, talc, mica, aluminum hydroxide, calcium silicate, and silicon. Aluminum acid, hollow resin particles, zinc sulfide, etc. It is preferred that the white pigment is particles containing titanium atoms, and titanium oxide is even more preferred. Moreover, it is preferable that the white pigment is a particle whose refractive index with respect to light with a wavelength of 589 nm is 2.10 or more. The aforementioned refractive index is preferably 2.10 to 3.00, and more preferably 2.50 to 2.75.

In addition, as the white pigment, titanium oxide described in "Titanium Oxide: Physical Properties and Application Technology, Kiyono Gakusho, pp. 13 to 45, issued on June 25, 1991, published by GIHIDO SHUPPAN CO., Ltd." can also be used.

The white pigment may not only be composed of a single inorganic substance, but may also be composed of particles compounded with other materials. For example, particles with pores or other materials inside, particles with a plurality of inorganic particles attached to the core particles, and core-shell composites including core particles composed of polymer particles and shells composed of inorganic nanoparticles are used. Particles are better. As the core-shell composite particles including core particles composed of polymer particles and shell layers composed of inorganic nanoparticles, for example, the description in paragraphs 0012 to 0042 of Japanese Patent Application Laid-Open No. 2015-047520 can be referred to. are incorporated into this manual.

White pigments can also use hollow inorganic particles. Hollow inorganic particles refer to inorganic particles that have a hollow structure inside and are surrounded by a shell. Examples of the hollow inorganic particles include hollow inorganic particles described in Japanese Patent Application Publication No. 2011-075786, International Publication No. 2013/061621, Japanese Patent Application Publication No. 2015-164881, etc., and these contents are incorporated in this description.

(black pigment) The black pigment is not particularly limited, and known ones can be used. Examples of inorganic black pigments include carbon black, titanium black, graphite, etc. Carbon black and titanium black are preferred, and titanium black is more preferred. Titanium black refers to black particles containing titanium atoms, preferably low-order titanium oxide or titanium oxynitride. The surface of titanium black can be modified if necessary for the purpose of improving dispersibility, inhibiting aggregation, etc. For example, the surface of titanium black can be coated with silicon oxide, titanium oxide, germanium oxide, aluminum oxide, magnesium oxide or zirconium oxide. Furthermore, it can also be treated with a water-repellent substance as shown in Japanese Patent Application Laid-Open No. 2007-302836. Specific examples of the inorganic black pigment include C.I. Pigment Black 1, 7, and the like. It is preferable that each particle of titanium black has a small primary particle size and an average primary particle size. Specifically, the average primary particle diameter is preferably 10 to 45 nm. Titanium black can also be used as a dispersion. For example, a dispersion containing titanium black particles and silicon dioxide particles, and the content ratio of Si atoms to Ti atoms in the dispersion is adjusted to a range of 0.20 to 0.50. Regarding the above-mentioned dispersion, please refer to the description in paragraphs 0020 to 0105 of Japanese Patent Application Laid-Open No. 2012-169556, and this content is incorporated into this specification. Examples of commercially available titanium black include titanium black 10S, 12S, 13R, 13M, 13M-C, 13R-N, and 13M-T (trade name: Mitsubishi Materials Corporation), Tilack D (trade name: Mitsubishi Materials Corporation) Manufactured by Ako Kasei Co., Ltd.), etc.

Examples of organic black pigments include dibenzofuranone compounds, imine compounds, perylene compounds, and azo compounds. Examples of the dibenzofuranone compound include compounds described in Japanese Patent Application Publication No. 2010-534726, Japanese Patent Application Publication No. 2012-515233, Japanese Patent Application Publication No. 2012-515234, and the like. For example, it can be used as a dibenzofuranone compound manufactured by BASF Corporation. "Irgaphor Black" obtained. Examples of the perylene compound include the compounds described in paragraphs 0016 to 0020 of Japanese Patent Application Laid-Open No. 2017-226821, C.I. Pigment Black 31, 32, and the like.

(Near-infrared absorbing pigment) The near-infrared absorbing pigment is preferably an organic pigment. Moreover, it is preferable that the near-infrared absorbing pigment has a maximum absorption wavelength in the range of a wavelength exceeding 700 nm and not exceeding 1800 nm. In addition, the maximum absorption wavelength of the near-infrared absorbing pigment is preferably 1,400 nm or less, more preferably 1,200 nm or less, and still more preferably 1,000 nm or less. Moreover, the ratio A ₅₅₀ /A _max of the absorbance A ₅₅₀ of the near-infrared absorbing pigment at a wavelength of 550 nm and the absorbance A _max at the maximum absorption wavelength is preferably 0.1 or less, more preferably 0.05 or less, and further preferably 0.03 or less. It is especially good if it is below 0.02. The lower limit is not particularly limited, and may be, for example, 0.0001 or more, or 0.0005 or more. If the absorbance ratio is within the above range, the near-infrared absorbing pigment can be excellent in visual transparency and near-infrared shielding properties.

The near-infrared absorbing pigment is not particularly limited, but examples thereof include pyrrolopyrrole compounds, fluorine compounds, oxocyanine compounds, squaraine compounds, cyanine compounds, ketonium compounds, phthalocyanine compounds, and naphthalocyanine compounds. , a pyranium compound, an azulene compound, an indigo compound and a pyrrromethylene compound, at least one selected from the group consisting of a pyrrolopyrrole compound, a squaraine compound, a cyanine compound, a phthalocyanine compound and a naphthalocyanine compound. One type is preferred, and at least one type selected from the group consisting of pyrrolopyrrole compounds and squaraine compounds is further preferred, and a pyrrolopyrrole compound is particularly preferred.

Examples of the pyrrolopyrrole compound include PP-Pig-1 to PP-Pig-22 described in the Examples described below, compounds described in paragraphs 0016 to 0058 of Japanese Patent Application Laid-Open No. 2009-263614, and Japanese Patent Application Laid-Open No. 2011. - Compounds described in paragraphs 0037 to 0052 of Publication No. 068731, compounds described in paragraphs 0010 to 0033 of International Publication No. 2015/166873, etc.

Examples of the squaraine compound include compounds described in paragraphs 0044 to 0049 of Japanese Patent Publication No. 2011-208101, compounds described in paragraphs 0060 to 0061 of Japanese Patent Publication No. 6065169, and International Publication No. 2016/181987. Compounds described in paragraph 0040 of Japanese Patent Application Laid-Open No. 2015-176046, compounds described in paragraph 0072 of International Publication No. 2016/190162, compounds described in paragraphs 0196 to 0228 of Japanese Patent Application Laid-Open No. 2016-074649 Compounds described, compounds described in paragraph 0124 of Japanese Patent Application Laid-Open No. 2017-067963, compounds described in International Publication No. 2017/135359, compounds described in Japanese Patent Application Publication No. 2017-114956, Japanese Patent Application No. 6197940 Compounds described in, Compounds described in International Publication No. 2016/120166, etc. Examples of the cyanine compound include compounds described in paragraphs 0044 to 0045 of Japanese Patent Application Laid-Open No. 2009-108267, compounds described in paragraphs 0026 to 0030 of Japanese Patent Application Publication No. 2002-194040, and compounds described in Japanese Patent Application Laid-Open No. 2015-172004. Compounds described in Japanese Patent Application Publication No. 2015-172102, Compounds described in Japanese Patent Application Publication No. 2008-088426, Compounds described in Paragraph 0090 of International Publication No. 2016/190162, Japanese Patent Application Publication No. 2016/190162 Compounds etc. described in the publication No. 2017-031394. Examples of the crotonium compound include compounds described in Japanese Patent Application Laid-Open No. 2017-082029. Examples of the immonium compound include compounds described in Japanese Patent Application Publication No. 2008-528706, compounds described in Japanese Patent Application Publication No. 2012-012399, compounds described in Japanese Patent Application Publication No. 2007-092060, and International Publications. Compounds described in paragraphs 0048 to 0063 of No. 2018/043564. Examples of the phthalocyanine compound include the compound described in paragraph 0093 of Japanese Patent Application Laid-Open No. 2012-077153, titanyl phthalocyanine described in Japanese Patent Application Laid-Open No. 2006-343631, and 0013 of Japanese Patent Application Laid-Open No. 2013-195480. Compounds described in paragraphs ～0029, vanadium phthalocyanine compounds described in Japanese Patent No. 6081771, compounds described in International Publication No. 2020/071470, paragraphs 0020 to 0024 of International Publication No. 2018/186489, International Publication No. Compounds described in paragraphs 0029 to 0076 of No. 2020/071470. Examples of the naphthalocyanine compound include compounds described in paragraph 0093 of Japanese Patent Application Laid-Open No. 2012-077153.

As the near-infrared absorbing pigment, squarylium compounds described in Japanese Patent Application Laid-Open No. 2017-197437, squarylium compounds described in Japanese Patent Application Laid-Open No. 2017-025311, and International Publication No. 2016/154782 can also be used. Squarylium compounds, squarylium compounds described in Japanese Patent No. 5884953, squarylium compounds described in Japanese Patent No. 6036689, squarylium compounds described in Japanese Patent No. 5810604, International Publications Squarylium compounds described in paragraphs 0090 to 0107 of No. 2017/213047, pyrrole ring-containing compounds described in paragraphs 0019 to 0075 of Japanese Patent Application Laid-Open No. 2018-054760, and paragraphs 0078 to 0078 of Japanese Patent Application Laid-Open No. 2018-040955 Pyrrole ring-containing compounds described in paragraph 0082, pyrrole ring-containing compounds described in paragraphs 0043 to 0069 of Japanese Patent Application Laid-Open No. 2018-002773, and amide compounds described in paragraphs 0024 to 0086 of Japanese Patent Application Laid-Open No. 2018-041047 A squarylium compound having an aromatic ring at the α-position, an amide-linked squarylium compound described in Japanese Patent Application Laid-Open No. 2017-179131, a squarylium compound having a pyrrole double-type squarylium skeleton described in Japanese Patent Application Publication No. 2017-141215 Or compounds with a ketonium skeleton, dihydrocarbazole bisquarylocyanine compounds described in Japanese Patent Application Laid-Open No. 2017-082029, and asymmetric compounds described in paragraphs 0027 to 0114 of Japanese Patent Application Laid-Open No. 2017-068120 , the pyrrole ring-containing compound (carbazole type) described in Japanese Patent Publication No. 2017-067963, the phthalocyanine compound described in Japanese Patent No. 6251530, etc.

The content of the pigment in the total solid content of the resin composition is preferably 30 to 80% by mass. The lower limit is preferably 40% by mass or more, and more preferably 50% by mass or more. The upper limit is preferably 75 mass% or less, and more preferably 70 mass% or less.

When the resin composition of the present invention is used as a color filter, the content of the color pigment in the pigment contained in the resin composition is preferably 80 mass% or more, more preferably 90 mass% or more, and 95 mass% or more In order to be more preferable, 99 mass % or more is still more preferable.

When the resin composition of the present invention is used as a near-infrared cutoff filter, the content of the near-infrared absorbing pigment in the pigment contained in the resin composition is preferably 80 mass% or more, and more preferably 90 mass% or more. More than 95 mass % is more preferably, and 99 mass % or more is still more preferably.

＜＜Dye＞＞ The resin composition of the present invention may contain a dye. The dye is not particularly limited, and known dyes can be used. Examples of dyes include color dyes, black dyes, near-infrared absorbing dyes, and the like. As the dye, a known dye can be used. As the dye, a pigment polymer can also be used. The pigment multimer has two or more pigment structures in one molecule, preferably three or more pigment structures. The upper limit is not particularly limited, but it can also be set to 100 or less. The plurality of pigment structures in one molecule may be the same pigment structure or may be different pigment structures. The weight average molecular weight (Mw) of the dye multimer is preferably 2,000 to 50,000. It is more preferable that the lower limit is 3,000 or more, and it is further more preferable that it is 6,000 or more. It is more preferable that the upper limit is 30,000 or less, and it is further more preferable that it is 20,000 or less. The dye multimer can also be used as Japanese Patent Application Laid-Open Nos. 2011-213925, 2013-041097, 2015-028144, 2015-030742, and 2016-102191. Compounds described in the official publication, International Publication No. 2016/031442, etc.

As the pigment or dye, the triarylmethane dye polymer described in Korean Patent Publication No. 10-2020-0028160, the Yamaguchi star compound described in Japanese Patent Application Laid-Open No. 2020-117638, and the International Publication No. 2020/174991 can be used. Phthalocyanine compounds described in Japanese Patent Application Laid-Open No. 2020-160279, isoindoline compounds or salts thereof, and compounds represented by Formula 1 described in Korean Patent Publication No. 10-2020-0069442 , the compound represented by Formula 1 described in Korean Patent Publication No. 10-2020-0069730, the compound represented by Formula 1 described in Korean Patent Publication No. 10-2020-0069070, Korean Patent Publication No. 10-2020 -The compound represented by Formula 1 described in Publication No. 0069067, the compound represented by Formula 1 described in Korean Patent Publication No. 10-2020-0069062, the halide zinc phthalocyanine pigment described in Japanese Patent No. 6809649, Japan Isoindoline compounds described in Japanese Patent Application Laid-Open No. 2020-180176, phenanthroline compounds described in Japanese Patent Application Publication No. 2021-187913, halogenated zinc phthalocyanine described in International Publication No. 2022/004261, International Publication No. Halogenated zinc phthalocyanine described in No. 2021/250883. The pigment or dye can be a rotaxane, and the pigment skeleton can be used for the ring structure of the rotaxane, the rod-like structure, or both structures.

The content of the dye in the total solid content of the resin composition is preferably 20 mass% or less, more preferably 10 mass% or less, and further preferably 5 mass% or less. Moreover, the content of the dye in the resin composition is preferably 60 parts by mass or less, more preferably 40 parts by mass or less, and still more preferably 20 parts by mass or less based on 100 parts by mass of the pigment.

It is also preferred that the resin composition of the present invention contains substantially no dye. In addition, in this specification, the case of substantially no dye means that the content of the dye in the total solid content of the resin composition is 0.1 mass % or less, preferably 0.01 mass % or less, and more preferably no dye.

＜＜Pigment Derivatives＞＞ The resin composition of the present invention contains a pigment derivative. Pigment derivatives can be used as dispersing aids. Dispersion aids are materials used to improve the dispersibility of pigments in resin compositions.

The resin composition of the present invention contains a pigment derivative with a crystallite size of 50 nm or less. The size of the crystallites of the pigment derivative is preferably 40 nm or less, more preferably 20 nm or less, and further preferably 15 nm or less. The lower limit of the size of the crystallites of the pigment derivative is preferably 1 nm or more.

In addition, the pigment derivative used in the production of the resin composition preferably has a crystallite size of 1 to 50 nm. The lower limit is preferably 1 nm or more, and more preferably 2 nm or more. The upper limit is preferably 30 nm or less, and more preferably 20 nm or less.

Here, in this specification, the size of the crystallites of the pigment derivative refers to the diffraction peak obtained by X-ray diffraction measurement of the pigment derivative using the peak with maximum intensity and using Scherrer's formula. The calculated value of the half-width.

Specifically, the crystallite size of the pigment derivative can be calculated using Scherrer's formula shown below.

Crystallite size = (K・λ)/(β・cosθ) K is the Scherrer constant, λ is the wavelength of the measured X-ray, β is the half-maximum width of the diffraction peak, and θ is the Bragg angle.

X-ray diffraction measurement of pigment derivatives can be performed using an X-ray diffractometer. As the X-ray diffractometer, for example, a powder X-ray diffractometer PW1700 manufactured by PANalytical Co., Ltd. that has a concentration optical system using CuKα (CuKα ₁ +CuKα ₂ ) lines as an X-ray source can be used. The measurement conditions can be set to, for example, a scanning range (2θ) of 3 to 70°, a scanning step of 0.05°, a scanning speed of 3.0°/min, a divergence slit of 1°, a scattering slit of 1°, and a light-receiving slit of 0.2 mm.

The pigment derivative is preferably a particle of a compound having at least one structure selected from the group consisting of a pigment structure and a tri-hydroxy structure and an acid group or a base.

The above-mentioned pigment structure is selected from the group consisting of a diketopyrrolopyrrole structure, a pyrrolopyrrole structure, an imine structure, an isoindoline structure, a quinoline yellow structure, an azo structure, an anthraquinone structure, a thioindigo structure, and a quinacridone structure. At least one of the group consisting of a benzindole structure, a phthalocyanine structure and a dimethacin structure is preferred, and a diketopyrrolopyrrole structure is more preferred.

Examples of the acidic group possessed by the pigment derivative include carboxyl group, sulfo group, phosphoric acid group, boric acid group, amide acid group, and salts thereof. Examples of atoms or atomic groups constituting the salt include alkali metal ions (Li ⁺ , Na ⁺ , K ^{+ ,} etc.), alkaline earth metal ions (Ca ²⁺ , Mg ^{2+ ,} etc.), ammonium ions, imidazolium ions, and pyridinium. ions, phosphonium ions, etc. As the acyl imide group _, a group represented by -SO ₂ NHSO ₂ R ^{X1 ,} -CONHSO ₂ R ^X2 , -CONHCOR ^X3 or _{-SO 2} ^NHCOR The group represented by ₂ R ^X2 or -SO ₂ NHCOR ^X4 is more preferred, and -SO ₂ NHSO ₂ R ^X1 or -CONHSO ₂ ^R R ^X1 to R ^X4 each independently represent an alkyl group or an aryl group. The alkyl group and aryl group represented by R ^X1 to R ^X4 may have a substituent. As the substituent, a halogen atom is preferred, and a fluorine atom is more preferred. It is preferred that R ^{X1 to} R The carbon number of the alkyl group containing a fluorine atom is preferably 1 to 10, more preferably 1 to 5, and further preferably 1 to 3. The carbon number of the aryl group containing a fluorine atom is preferably 6 to 20, more preferably 6 to 12, and further preferably 6.

Examples of the base having a pigment derivative include an amino group, a pyridyl group and a salt thereof, an ammonium group salt, and a phthalimide methyl group. Examples of atoms or atomic groups constituting the salt include hydroxide ions, halogen ions, carboxylate ions, sulfonic acid ions, phenoxide ions, and the like.

Examples of the amino group include a group represented by -NR ^x11 R ^x12 and a cyclic amino group.

In the group represented by -NR ^x11 R ^x12 , R ^x11 and R ^x12 each independently represent a hydrogen atom, an alkyl group or an aryl group, with an alkyl group being preferred. That is, the amino group is preferably a dialkylamino group. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 5, and further preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but linear or branched is preferred, and straight chain is more preferred. The alkyl group may have a substituent. Examples of the substituent include substituent T described below. The aryl group preferably has 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and further preferably 6 to 12 carbon atoms. The aryl group may have a substituent. Examples of the substituent include substituent T described below.

Examples of the cyclic amino group include a pyrrolidinyl group, a piperidinyl group, a piperidinyl group, a mofolinyl group, and the like. These groups may further have substituents.

As the pigment derivative having a pigment structure, a compound represented by formula (B1) is preferred. [Chemical formula 6] In the formula (B1), P represents the pigment structure, L represents a single bond or an n+1 valent linking group, X represents an acid group or a base, m represents an integer above 1, and n represents an integer above 1. When m is 2 or above When n is 2 or more, a plurality of L and X may be different from each other. When n is 2 or more, a plurality of X may be different from each other.

The pigment structure represented by P in formula (B1) is a diketopyrrolopyrrole structure, a pyrrolopyrrole structure, a methimine structure, an isoindoline structure, a quinoline yellow structure, an azo structure, an anthraquinone structure, and a thiamine structure. The indigo structure, quinacridone structure, benzindole structure, phthalocyanine structure or dimethacin structure is preferred, and the diketopyrrolopyrrole structure is even more preferred.

Examples of the n+1-valent linking group represented by L in formula (B1) include aliphatic hydrocarbon groups, aromatic hydrocarbon groups, heterocyclic groups, -O-, -S-, -CO-, -COO-, -OCO- , -SO ₂ -, -NR ^L -, -NR ^L CO-, -CONR ^L -, -NR ^L SO ₂ -, -SO ₂ NR ^L - and groups composed of combinations thereof. R ^L represents a hydrogen atom, an alkyl group or an aryl group. The number of carbon atoms of the aliphatic hydrocarbon group is preferably 1 to 20, more preferably 2 to 20, still more preferably 2 to 10, and particularly preferably 2 to 5. The aliphatic hydrocarbon group may be linear, branched, or cyclic. In addition, the cyclic aliphatic hydrocarbon group may be either a monocyclic ring or a polycyclic ring. The number of carbon atoms of the aromatic hydrocarbon group is preferably 6 to 18, more preferably 6 to 14, and still more preferably 6 to 10. The aromatic hydrocarbon group is preferably a monocyclic aromatic hydrocarbon group or an aromatic hydrocarbon group having a condensed ring with a condensation number of 2 to 4. As the aromatic hydrocarbon group, a phenyl ring group is preferred. The heterocyclic group is preferably a monocyclic ring or a condensed ring with a condensation number of 2 to 4. The number of heteroatoms in the ring constituting the heterocyclyl group is preferably 1 to 3. The heteroatoms constituting the heterocyclic group are preferably nitrogen atoms, oxygen atoms or sulfur atoms. The number of carbon atoms of the ring constituting the heterocyclic group is preferably 3 to 30, more preferably 3 to 18, and still more preferably 3 to 12. As the heterocyclic group, a tricyclocyclic group is preferred. The aliphatic hydrocarbon group, aromatic hydrocarbon group and heterocyclic group may have a substituent. Examples of the substituent include substituent T described below. In addition, the number of carbon atoms of the alkyl group represented by R ^L is preferably 1 to 20, more preferably 1 to 15, and further preferably 1 to 8. The alkyl group may be linear, branched, or cyclic. The alkyl group is preferably linear or branched, and is more preferably linear. The alkyl group represented by R ^L may further have a substituent. Examples of the substituent include substituent T described below. The number of carbon atoms in the aryl group represented by R ^L is preferably 6 to 30, more preferably 6 to 20, and further preferably 6 to 12. The aryl group represented by R ^L may further have a substituent. Examples of the substituent include substituent T described below.

Examples of the acidic group and the base represented by X in the formula (B1) include the above-mentioned acidic groups and bases.

It is preferable that m in formula (B1) is 1 or 2. It is preferable that n in formula (B1) is 1 or 2.

Examples of the pigment derivative having a tri-(tri)-structure include compounds having a group represented by formula (A1), and the like. [Chemical Formula 7] In the formula (A1), * represents a bond, Ya ¹ and Ya ² independently represent -N (Ra ¹ )- or -O-, and Ra ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group. , B ¹ and B ² each independently represent a hydrogen atom or a substituent.

Ya ¹ and Ya ² in the formula (A1) each independently represent -N(Ra ¹ )- or -O-, preferably -N(Ra ¹ )-.

Ra ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom. The number of carbon atoms in the alkyl group represented by Ra ¹ is preferably 1 to 20, more preferably 1 to 15, and further preferably 1 to 8. The alkyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is more preferred. The alkyl group represented by Ra ¹ may further have a substituent. Examples of the substituent include substituent T described below. The number of carbon atoms in the alkenyl group represented by Ra ¹ is preferably 2 to 20, more preferably 2 to 12, and further preferably 2 to 8. The alkenyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is more preferred. The alkenyl group represented by Ra ¹ may further have a substituent. Examples of the substituent include substituent T described below. The number of carbon atoms in the alkynyl group represented by Ra ¹ is preferably 2 to 40, more preferably 2 to 30, and particularly preferably 2 to 25. The alkynyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is more preferred. The alkynyl group represented by Ra ¹ may further have a substituent. Examples of the substituent include substituent T described below. The number of carbon atoms in the aryl group represented by Ra ¹ is preferably 6 to 30, more preferably 6 to 20, and further preferably 6 to 12. The aryl group represented by Ra ¹ may further have a substituent. Examples of the substituent include substituent T described below.

B ¹ and B ² in formula (A1) each independently represent a hydrogen atom or a substituent. Examples of the substituent include the substituent T described below. An alkyl group, an aryl group and a heterocyclic group are preferred, and an aryl group and a heterocyclic group are more preferred. As a preferred aspect, one of B ¹ and B ² is a heterocyclic group and the other is an aryl group. As the heterocyclic group, a nitrogen-containing heterocyclic group is preferred, and a benzimidazolone group is more preferred.

The pigment derivative having a trigonal structure is preferably a compound represented by the following formula (b1). A ¹ -L ¹ -Z ¹ ･･････(b1)

A ¹ in formula (b1) represents a group represented by the above formula (A1).

L ¹ in the formula (b1) represents a single bond or a bivalent linking group, and a divalent linking group is preferred. Examples of the divalent linking group represented by L ¹ include an alkylene group, an aryl group, a heterocyclic group, -O-, -NR ^L1 -, -NHCO-, -CONH-, -OCO-, -COO- , -CO-, -SO ₂ NH-, -SO ₂ - and combinations thereof. The number of carbon atoms in the alkylene group is preferably from 1 to 30, more preferably from 1 to 15, further preferably from 1 to 8, and particularly preferably from 1 to 5. The alkylene group may be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is particularly preferred. The carbon number of the aryl group is preferably 6 to 30, more preferably 6 to 15. The aryl group is preferably a phenylene group. R ^L1 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom. The preferable ranges of the alkyl group, alkenyl group, alkynyl group and aryl group represented by R ^L1 are the same as those explained as the preferable ranges of the alkyl group, alkenyl group, alkynyl group and aryl group of Ra ¹ .

The bivalent linking group represented by L ¹ is preferably a group represented by the following formula (L1). -L ^1A -L ^1B -L ^1C -･･････(L1) In the formula, L ^1A and L ^1C independently represent -O-, -NR ^L1 -, -NHCO-, -CONH-, -OCO -, -COO-, -CO-, -SO ₂ NH- or -SO ₂ -, L ^1B represents a single bond or a divalent linking group.

Examples of the bivalent linking group represented by L ^1B include an alkylene group and an aryl group. The alkylene group and the aryl group are connected via a single bond or -O-, -NR ^L1 -, -NHCO-, -CONH-, -OCO-, -COO-, -CO-, -SO ₂ NH-, -SO ₂ - and groups composed of these combinations are bonded to each other, alkylene groups or aryl groups to each other Via -O-, -NR ^L1 -, -NHCO-, -CONH-, -OCO-, -COO-, -CO-, -SO ₂ NH-, -SO ₂ - and groups composed of these combinations Bonded groups, etc.

Specific examples of L ¹ include groups having the following structures. [Chemical formula 8]

Z ¹ in formula (b1) represents a group having an acid group or a base. Examples of the acid group and base include the above-mentioned groups.

Z ¹ of formula (b1) is preferably a group represented by formula (Z1) or a group represented by formula (Z10).

[Chemical formula 9] In the formula (Z1), * represents a bond, Yz ¹ represents -N(Ry ¹ )- or -O-, Ry ¹ represents a hydrogen atom, alkyl group, alkenyl group, alkynyl group or aryl group, Lz ¹ represents a divalent Linking groups, Rz ¹ and Rz ² each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, Rz ¹ and Rz ² can be bonded through a divalent group to form a ring, m represents 1 to 5 integer. [Chemical formula 10]

In the formula (Z10), * represents a bond, Lc ¹ and Lc ² each independently represent a single bond or a connecting group, Rc ¹ and Rc ² each independently represent a substituent, and at least one of Rc ¹ and Rc ² represents Acid or base.

First, equation (Z1) will be explained. In formula (Z1), Yz ¹ represents -N(Ry ¹ )- or -O-, and -N(Ry ¹ )- is preferred. Ry ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom. The preferable ranges of the alkyl group, alkenyl group, alkynyl group and aryl group represented by Ry ¹ are the same as those explained as the preferable ranges of the alkyl group, alkenyl group, alkynyl group and aryl group of Ra ¹ .

In the formula (Z1), examples of the bivalent linking group represented by Lz ¹ include an alkylene group, an aryl group, a heterocyclic group, -O-, -NR ^L1 -, -NHCO-, -CONH-, - OCO-, -COO-, -CO-, -SO ₂ NH-, -SO ₂ - and combinations thereof, alkylene groups are preferred. The number of carbon atoms in the alkylene group is preferably from 1 to 30, more preferably from 1 to 15, further preferably from 1 to 8, and particularly preferably from 1 to 5. The alkylene group may be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is particularly preferred.

In the formula (Z1), Rz ¹ and Rz ² each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group. An alkyl group or an aryl group is preferred, and an alkyl group is more preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 5, further preferably 1 to 3, and particularly preferably 1 or 2. The alkyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is more preferred. The number of carbon atoms in the alkenyl group is preferably from 2 to 10, more preferably from 2 to 8, and even more preferably from 2 to 2. The alkenyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is more preferred. The number of carbon atoms in the alkynyl group is preferably 2 to 10, more preferably 2 to 8, and particularly preferably 2 to 5. The alkynyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is more preferred. The aryl group preferably has 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and further preferably 6 to 12 carbon atoms.

In formula (Z1), Rz ¹ and Rz ² may be bonded via a divalent group to form a ring. Examples of the divalent group include -CH ₂ -, -O-, and -SO ₂ -. Specific examples of the ring formed by Rz ¹ and Rz ² via a divalent group include the following. [Chemical formula 11]

In the formula (Z1), m represents an integer of 1 to 5, 1 to 4 is preferred, 1 to 3 is more preferred, 2 or 3 is further preferred, and 2 is particularly preferred.

The group represented by formula (Z1) is preferably a group represented by the following formula (Z2). [Chemical formula 12] In formula (Z2), * represents a bond, Yz ² and Yz ³ independently represent -N (Ry ² )- or -O-, Ry ² represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group , Lz ² and Lz ³ each independently represent a divalent linking group, Rz ³ to Rz ⁶ each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, Rz ³ and Rz ⁴ and Rz ⁵ and Rz ⁶ Each may be bonded via a divalent group to form a ring.

Yz ² and Yz ³ in the formula (Z2) have the same meaning as Yz ¹ in the formula (Z1), and the preferred ranges are also the same. Ry ² represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom. The preferable ranges of the alkyl group, alkenyl group, alkynyl group and aryl group represented by Ry ² are the same as those explained as the preferable ranges of the alkyl group, alkenyl group, alkynyl group and aryl group of Ra ¹ .

The meanings of Lz ² and Lz ³ in the formula (Z2) are the same as the meaning of Lz ¹ in the formula (Z1), and the preferred ranges are also the same. The meanings of Rz ³ to Rz ⁶ in the formula (Z2) are the same as those of Rz ¹ and Rz ² in the formula (Z1), and the preferred ranges are also the same.

Next, equation (Z10) will be explained. In the formula (Z10), Lc ¹ and Lc ² each independently represent a single bond or a connecting group, and a divalent connecting group is preferred. Examples of the divalent linking group include an alkylene group, an aryl group, -O-, -NR ^L1 -, -NHCO-, -CONH-, -OCO-, -COO-, -CO-, -SO ₂ NH -, -SO ₂ - and combinations thereof. The number of carbon atoms in the alkylene group is preferably from 1 to 30, more preferably from 1 to 15, further preferably from 1 to 8, and particularly preferably from 1 to 5. The alkylene group may be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is particularly preferred. The carbon number of the aryl group is preferably 6 to 30, more preferably 6 to 15. The aryl group is preferably a phenylene group. R ^L1 represents a hydrogen atom, an alkyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom. The number of carbon atoms in the alkyl group represented by R ^L1 is preferably 1 to 20, more preferably 1 to 15, and further preferably 1 to 8. The alkyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is more preferred. The alkyl group represented by R ^L1 may further have a substituent. Examples of the substituent include substituent T described below. The number of carbon atoms in the aryl group represented by R ^L1 is preferably 6 to 30, more preferably 6 to 20, and further preferably 6 to 12. The aryl group represented by R ^L1 may further have a substituent. Examples of the substituent include substituent T described below.

In formula (Z10), Rc ¹ and Rc ² each independently represent a substituent. Examples of the substituent include an alkyl group, an aryl group, a heterocyclic group, a hydroxyl group, an acid group and a base group. However, at least one of Rc ¹ and Rc ² represents an acid group or a base. It is preferred that at least one of Rc ¹ and Rc ² is a base, and it is more preferred that both Rc ¹ and Rc ² are bases. Examples of the acidic group and the basic group include those mentioned above. The number of carbon atoms in the alkyl group is preferably 1 to 30, more preferably 1 to 15, and further preferably 1 to 8. The alkyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is more preferred. The aryl group preferably has 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and further preferably 6 to 12 carbon atoms. The heterocyclyl group may be a single ring or a condensed ring. The heterocyclic group is preferably a monocyclic ring or a condensed ring with a condensation number of 2 to 4. The number of heteroatoms in the ring constituting the heterocyclyl group is preferably 1 to 3. The heteroatoms constituting the heterocyclic group are preferably nitrogen atoms, oxygen atoms or sulfur atoms. The number of carbon atoms of the ring constituting the heterocyclic group is preferably 3 to 30, more preferably 3 to 18, and still more preferably 3 to 12. The alkyl group, aryl group, and heterocyclic group may further have a substituent. Examples of the substituent include substituent T described below.

The pigment derivative is preferably a compound represented by formula (DPP). [Chemical formula 13] In the formula, R ^D1 and R ^D2 each independently represent a hydrogen atom or a substituent, A ^D1 and A ^D2 each independently represent a substituent, L ^D1 represents a single bond or an n+1 valent linking group, X ^D1 represents an acid group or a base Base, m represents an integer from 1 to 10, n represents an integer from 1 to 10, when m is 2 or more, a plurality of L ^D1 and X ^D1 may be different from each other, and when n is 2 or more, a plurality of X ^D1 may be different from each other.

Examples of the n+1-valent linking group represented by L ^D1 of the formula (DPP) include an n+1-valent linking group represented by L of the formula (B1), and the preferable ranges are also the same. L ^D1 of the formula (DPP) is preferably an n+1 valent linking group.

Examples of the acid group and the base represented by X ^D1 of the formula (DPP) include the acid group and the base represented by X of the formula (B1), and the preferable ranges are also the same.

^RD1 and ^RD2 of the formula (DPP) each independently represent a hydrogen atom or a substituent. Examples of the substituent include an alkyl group, an aryl group, and the like. The number of carbon atoms in the alkyl group is preferably 1 to 20, more preferably 1 to 15, and further preferably 1 to 8. The alkyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is more preferred. The alkyl group may further have a substituent. Examples of the substituent include substituent T described below. The aryl group preferably has 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and further preferably 6 to 12 carbon atoms. The aryl group represented by Ra ¹ may further have a substituent. Examples of the substituent include substituent T described below. ^RD1 and ^RD2 are each independently a hydrogen atom or an alkyl group, preferably a hydrogen atom.

A ^D1 and A ^D2 of the formula (DPP) each independently represent a substituent. Examples of the substituent include an alkyl group, an aryl group, and the like. The number of carbon atoms in the alkyl group is preferably 1 to 20, more preferably 1 to 15, and further preferably 1 to 8. The alkyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and straight chain is more preferred. The alkyl group may further have a substituent. Examples of the substituent include substituent T described below. The aryl group preferably has 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and further preferably 6 to 12 carbon atoms. The aryl group represented by Ra ¹ may further have a substituent. Examples of the substituent include substituent T described below. It is preferred that A ^D1 and A ^D2 are each independently an aryl group.

It is preferable that m of formula (DPP) is 1 or 2. It is preferable that n in formula (DPP) is 1 or 2.

(Substituent T) Examples of the substituent T include the following groups. Halogen atom (for example, fluorine atom, chlorine atom, bromine atom, iodine atom), alkyl group (preferably an alkyl group having 1 to 30 carbon atoms), alkenyl group (preferably an alkenyl group having 2 to 30 carbon atoms), Alkynyl group (preferably an alkynyl group having 2 to 30 carbon atoms), aryl group (preferably an aryl group having 6 to 30 carbon atoms), heteroaryl group (preferably an aryl group having 1 to 30 carbon atoms), Alkoxy group (preferably an alkoxy group having 1 to 30 carbon atoms), aryloxy group (preferably an aryloxy group having 6 to 30 carbon atoms), heteroaryloxy group (preferably an aryloxy group having 1 to 30 carbon atoms) Heteroaryloxy group), hydroxyl group (preferably a hydroxyl group with 2 to 30 carbon atoms), alkoxycarbonyl group (preferably an alkoxycarbonyl group with 2 to 30 carbon atoms), aryloxycarbonyl group (preferably a hydroxyl group with 2 to 30 carbon atoms) Aryloxycarbonyl group having 7 to 30 carbon atoms), heteroaryloxycarbonyl group (preferably heteroaryloxycarbonyl group having 2 to 30 carbon atoms), acyloxy group (preferably acyloxycarbonyl group having 2 to 30 carbon atoms) ), amide group (preferably a amide group with 2 to 30 carbon atoms), aminocarbonylamino group (preferably an aminocarbonylamino group with 2 to 30 carbon atoms), alkoxycarbonylamino group (more preferably Preferably, it is an alkoxycarbonylamino group having 2 to 30 carbon atoms), an aryloxycarbonylamino group (preferably it is an aryloxycarbonylamino group having 7 to 30 carbon atoms), or sulfamide group (preferably it is an alkoxycarbonylamino group having 7 to 30 carbon atoms). sulfonamide group (0 to 30), sulfonamide group (preferably sulfonamide group with 0 to 30 carbon atoms), carbamoformyl group (preferably amine methyl group with 1 to 30 carbon atoms) acylthio group), alkylthio group (preferably an alkylthio group with 1 to 30 carbon atoms), arylthio group (preferably an arylthio group with 6 to 30 carbon atoms), heteroarylthio group (preferably an arylthio group with 6 to 30 carbon atoms) 1 to 30 heteroarylthio group), alkylsulfonyl group (preferably an alkylsulfonyl group with 1 to 30 carbon atoms), alkylsulfonylamine group (preferably an alkyl group with 1 to 30 carbon atoms) arylsulfonylamine group), arylsulfonylamine group (preferably an arylsulfonylamine group with 6 to 30 carbon atoms), arylsulfonylamine group (preferably an arylsulfonyl group with 6 to 30 carbon atoms) acylamine group), heteroarylsulfonylamine group (preferably a heteroarylsulfonylamine group having 1 to 30 carbon atoms), a heteroarylsulfonylamine group (preferably a heteroaryl sulfonylamine group having 1 to 30 carbon atoms) sulfonylamine group), alkylsulfinyl group (preferably an alkylsulfinyl group with 1 to 30 carbon atoms), arylsulfinyl group (preferably an aryl group with 6 to 30 carbon atoms) sulfenyl group), heteroarylsulfenyl group (preferably a heteroarylsulfenyl group with 1 to 30 carbon atoms), urea group (preferably a urea group with 1 to 30 carbon atoms), hydroxyl group, Nitro group, carboxyl group, sulfo group, phosphate group, carboxylic acid amide group, sulfonate amide group, amide group, phosphine group, mercapto group, cyano group, alkyl sulfinic acid group, aryl sulfinic acid group, Aryl azo group, heteroarylazo group, silicon group, hydrazine group, imine group. When these groups are groups capable of further substitution, they may further have a substituent. Examples of the substituent include the groups described for the above-mentioned substituent T.

Specific examples of the pigment derivatives include compounds described in the Examples described below, compounds described in Japanese Patent Application Laid-Open No. Sho 56-118462, compounds described in Japanese Patent Application Laid-Open No. Sho 63-264674, and Japanese Patent Application Laid-Open No. Sho 63-264674. Compounds described in Japanese Patent Application Publication No. 01-217077, compounds described in Japanese Patent Application Publication No. 03-009961, compounds described in Japanese Patent Application Publication No. 03-026767, compounds described in Japanese Patent Application Publication No. 03-153780, Compounds described in Japanese Patent Application Publication No. 03-045662, compounds described in Japanese Patent Application Publication No. 04-285669, compounds described in Japanese Patent Application Publication No. 06-145546, compounds described in Japanese Patent Application Publication No. 06-212088 Compounds, compounds described in Japanese Patent Application Publication No. 06-240158, compounds described in Japanese Patent Application Publication No. 10-030063, compounds described in Japanese Patent Application Publication No. 10-195326, 0086 of International Publication No. 2011/024896 Compounds described in paragraphs 0098 to 0098, compounds described in paragraphs 0063 to 0094 of International Publication No. 2012/102399, compounds described in paragraph 0082 of International Publication No. 2017/038252, and 0171 of Japanese Patent Application Publication No. 2015-151530 Compounds described in paragraphs, compounds described in paragraphs 0162 to 0183 of Japanese Patent Application Publication No. 2011-252065, compounds described in Japanese Patent Application Publication No. 2003-081972, compounds described in Japanese Patent Application Publication No. 5299151, compounds described in Japanese Patent Application Publication No. 5299151, Compounds described in Japanese Patent Application Publication No. 2015-172732, compounds described in Japanese Patent Application Publication No. 2014-199308, compounds described in Japanese Patent Application Publication No. 2014-085562, compounds described in Japanese Patent Application Publication No. 2014-035351, Compounds described in Japanese Patent Application Laid-Open No. 2008-081565, compounds described in Japanese Patent Application Laid-Open No. 2019-109512, compounds described in Japanese Patent Application Laid-Open No. 2019-133154, compounds described in International Publication No. 2020/002106 A diketopyrrolopyrrole compound with a thiol linkage group, an isoindoline compound described in Japanese Patent Application Laid-Open No. 2020-160279, or a salt thereof.

The content of the pigment derivative is not particularly specified as long as the pigment is stably dispersed, and the preferred range varies depending on the pigment. However, if the amount is insufficient to fully cover the surface of the pigment particles, the pigment particles may agglomerate, which may cause chronic Insufficient stability or coarse particles. On the other hand, if there are too many pigment derivatives, the pigment derivatives may remain as particles, which may cause deterioration of development residue. The content of the pigment derivative is preferably 1 to 70 parts by mass relative to 100 parts by mass of the pigment. The lower limit is preferably 2 parts by mass or more, more preferably 3 parts by mass or more, and still more preferably 5 parts by mass or more. The upper limit is preferably 60 parts by mass or less, more preferably 50 parts by mass or less, and still more preferably 40 parts by mass or less. Only one type of pigment derivative may be used, or two or more types may be used in combination. When two or more types are used in combination, the total amount is preferably within the above range.

＜＜Resin＞＞ The resin composition of the present invention contains resin. For example, the resin is blended for the purpose of dispersing pigments in a resin composition and the purpose of a binder. Furthermore, resins used mainly for dispersing pigments are also called dispersants. However, this use of the resin is an example, and it can also be used for purposes other than this use.

Examples of the resin include (meth)acrylic resin, epoxy resin, (meth)acrylamide resin, ene-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, and polypropylene resin. Resin, polyether ester resin, polyphenylene resin, polyarylene ether phosphine oxide resin, polyimide resin, polyamide imide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin , siloxane resin, etc. In addition, as the resin, the resin described in the Examples of International Publication No. 2016/088645, the resin described in Japanese Patent Application Laid-Open No. 2017-057265, the resin described in Japanese Patent Application Laid-Open No. 2017-032685, and the Japanese Patent Application Publication No. 2017-032685 can also be used. The resin described in Japanese Patent Application Publication No. 2017-075248, the resin described in Japanese Patent Application Publication No. 2017-066240, the resin described in Japanese Patent Application Publication No. 2017-167513, the resin described in Japanese Patent Application Publication No. 2017-173787 , the resin described in paragraphs 0041 to 0060 of Japanese Patent Application Publication No. 2017-206689, the resin described in paragraphs 0022 to 0071 of Japanese Patent Application Publication No. 2018-010856, and the block described in Japanese Patent Application Publication No. 2016-222891 Polyisocyanate resin, resin described in Japanese Patent Application Publication No. 2020-122052, resin described in Japanese Patent Application Publication No. 2020-111656, resin described in Japanese Patent Application Publication No. 2020-139021, Japanese Patent Application Publication No. 2017-138503 Resin containing a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain described in the publication, resin described in paragraphs 0199 to 0233 of Japanese Patent Application Laid-Open No. 2020-186373, Japanese Patent Application Laid-Open No. 2020 -The alkali-soluble resin described in Publication No. 186325, and the resin represented by Formula 1 described in Korean Patent Publication No. 10-2020-0078339.

The weight average molecular weight (Mw) of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, and even more preferably 500,000 or less. A lower limit of 4,000 or more is preferred, and a lower limit of 5,000 or more is even better.

As the resin, it is preferable to use a resin having an acid group. Examples of acidic groups include carboxyl groups, phosphate groups, sulfo groups, phenolic hydroxyl groups, and the like.

The acid value of the resin with acid groups is preferably 30 to 500 mgKOH/g. It is more preferable that the lower limit is 40 mgKOH/g or more, and it is particularly preferable that it is 50 mgKOH/g or more. The upper limit is more preferably 400 mgKOH/g or less, more preferably 300 mgKOH/g or less, and particularly preferably 200 mgKOH/g or less. The weight average molecular weight (Mw) of the resin having acid groups is preferably 5,000 to 100,000, more preferably 5,000 to 50,000. In addition, the number average molecular weight (Mn) of the resin having an acidic group is preferably 1,000 to 20,000.

The resin having acidic groups preferably contains repeating units having acidic groups on the side chains, and it is more preferable that the resin contains 5 to 70 mol% of repeating units having acidic groups on the side chains of the total repeating units of the resin. The upper limit of the content of the repeating unit having an acid group on the side chain is preferably 50 mol% or less, and more preferably 30 mol% or less. The lower limit of the content of the repeating unit having an acid group on the side chain is preferably 10 mol% or more, and more preferably 20 mol% or more.

Regarding the resin having an acid group, for example, the description of paragraphs 0558 to 0571 of Japanese Patent Application Publication No. 2012-208494 (corresponding to paragraphs 0685 to 0700 of the specification of U.S. Patent Application Publication No. 2012/0235099) and Japanese Patent Application Publication No. 2012 -The descriptions in paragraphs 0076 to 0099 of Public Gazette No. 198408 are incorporated into this manual. In addition, commercially available resins having acidic groups can also be used. In addition, the method for introducing acid groups into the resin is not particularly limited, but an example thereof is the method described in Japanese Patent No. 6349629. Moreover, as a method of introducing an acid group into a resin, the method of making the hydroxyl group produced|generated by the ring-opening reaction of an epoxy group react with an acid anhydride, and introducing an acid group is also mentioned.

As the resin, a resin having a base can also be used. The resin having a base is preferably a resin containing a repeating unit having a base on the side chain, and a copolymer having a repeating unit having a base on the side chain and a repeating unit without a base is even more preferred, and has Block copolymers having repeating units of bases and repeating units without bases on the side chains are further preferred. Resins with basic bases can also be used as dispersants. The amine value of the resin having a base is preferably 5 to 300 mgKOH/g. The lower limit is preferably 10 mgKOH/g or more, and more preferably 20 mgKOH/g or more. The upper limit is preferably 200 mgKOH/g or less, and more preferably 100 mgKOH/g or less.

Examples of commercially available resins having bases include DISPERBYK-161, 162, 163, 164, 166, 167, 168, 174, 182, 183, 184, 185, 2000, 2001, 2050, 2150, 2163, 2164, BYK-LPN6919 (the above are manufactured by BYK-Chemie GmbH), SOLSPERSE 11200, 13240, 13650, 13940, 24000, 26000, 28000, 32000, 32500, 32550, 32600, 33000, 34750, 35100, 35200, 37500, 38500, 39000, 53095, 56000, 7100 (the above are manufactured by Japan Lubrizol Corporation), Efka PX 4300, 4330, 4046, 4060, 4080 (the above are manufactured by BASF), etc. In addition, the block copolymer (B) described in paragraphs 0063 to 0112 of Japanese Patent Application Laid-Open No. 2014-219665, and the block copolymer (B) described in paragraphs 0046 to 0076 of Japanese Patent Application Laid-Open No. 2018-156021 can also be used as the resin having a base. The block copolymer A1 and the vinyl resin having a base described in paragraphs 0150 to 0153 of Japanese Patent Application Laid-Open No. 2019-184763 are incorporated into this specification.

It is also preferable to use a resin having an acidic group or a resin having an alkali group as the resin. When a resin having an acidic group and a resin having an alkali group are used together, the content of the resin having an alkali group is preferably 20 to 500 parts by mass, and 30 to 300 parts by mass relative to 100 parts by mass of the resin having an acidic group. It is more preferable, and it is further more preferable that it is 50-200 mass parts.

As the resin, it is also preferable to use a resin containing a repeating unit derived from a monomer component including a compound represented by the following formula (ED1) and/or a compound represented by the following formula (ED2) (hereinafter, These compounds are sometimes also called "ether dimers".).

[Chemical formula 14]

In the formula (ED1), R ¹ and R ² each independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent. [Chemical formula 15] In formula (ED2), R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms. For details of the formula (ED2), please refer to the description of Japanese Patent Application Laid-Open No. 2010-168539, and this content is incorporated into this specification.

Regarding specific examples of the ether dimer, for example, the description in paragraph 0317 of Japanese Patent Application Laid-Open No. 2013-029760 can be referred to, and this content is incorporated into this specification.

As the resin, it is also preferable to use a resin containing a repeating unit derived from a compound represented by formula (X). [Chemical formula 16] In the formula, R ¹ represents a hydrogen atom or a methyl group, R ²¹ and R ²² each independently represent an alkylene group, and n represents an integer of 0 to 15. The number of carbon atoms in the alkylene group represented by R ²¹ and R ²² is preferably 1 to 10, more preferably 1 to 5, further preferably 1 to 3, and particularly preferably 2 or 3. n represents an integer of 0 to 15, and an integer of 0 to 5 is preferred, an integer of 0 to 4 is more preferred, and an integer of 0 to 3 is further preferred.

Examples of the compound represented by formula (X) include ethylene oxide or propylene oxide modified (meth)acrylate of para-cumyl phenol. Examples of commercially available products include ARONIX M-110 (manufactured by TOAGOSEI CO., LTD.) and the like.

As the resin, it is also preferable to use a resin having a crosslinkable group. Examples of the crosslinkable group include a group containing an ethylenically unsaturated bond and a cyclic ether group. Examples of the group containing an ethylenically unsaturated bond include a vinyl group, a styrene group, a (meth)allyl group, a (meth)acrylyl group, and the like. Examples of the cyclic ether group include an epoxy group, an oxetanyl group, and the like, with an epoxy group being preferred. The epoxy group may be an alicyclic epoxy group. Furthermore, the alicyclic epoxy group refers to a monovalent functional group having a cyclic structure formed by condensation of an epoxy ring and a saturated hydrocarbon ring.

As the resin, it is also preferable to use a resin having an aromatic carboxyl group (hereinafter also referred to as resin Ac). In the resin Ac, the aromatic carboxyl group may be included in the main chain of the repeating unit or in the side chain of the repeating unit. It is preferred that the aromatic carboxyl group is included in the main chain of the repeating unit. In addition, in this specification, the aromatic carboxyl group refers to a group having a structure in which one or more carboxyl groups are bonded to an aromatic ring. Among the aromatic carboxyl groups, the number of carboxyl groups bonded to the aromatic ring is preferably 1 to 4, and more preferably 1 to 2.

The resin Ac is preferably a resin containing at least one repeating unit selected from the repeating unit represented by the formula (Ac-1) and the repeating unit represented by the formula (Ac-2). [Chemical formula 17] In the formula (Ac-1), Ar ¹ represents a group containing an aromatic carboxyl group, L ¹ represents -COO- or -CONH-, and L ² represents a bivalent linking group. In formula (Ac-2), Ar ¹⁰ represents a group containing an aromatic carboxyl group, L ¹¹ represents -COO- or -CONH-, L ¹² represents a trivalent linking group, and P ¹⁰ represents a polymer chain.

In the formula (Ac-1), examples of the aromatic carboxyl group-containing group represented by Ar ¹ include a structure derived from an aromatic tricarboxylic anhydride, a structure derived from an aromatic tetracarboxylic anhydride, and the like. Examples of aromatic tricarboxylic acid anhydrides and aromatic tetracarboxylic acid anhydrides include compounds with the following structures. [Chemical formula 18]

In the above formula, Q ¹ represents a single bond, -O-, -CO-, -COOCH ₂ CH ₂ OCO-, -SO ₂ -, -C (CF ₃ ) ₂ -, and is represented by the following formula (Q-1) or a group represented by the following formula (Q-2). [Chemical formula 19]

The aromatic carboxyl group-containing group represented by Ar ¹ may have a crosslinking group. The crosslinkable group is preferably a group containing an ethylenically unsaturated bond and a cyclic ether group, and a group containing an ethylenically unsaturated bond is more preferably a group. Specific examples of the aromatic carboxyl group-containing group represented by Ar ¹ include a group represented by formula (Ar-11), a group represented by formula (Ar-12), a group represented by formula (Ar-13) ) represents groups, etc. [Chemical formula 20]

In formula (Ar-11), n1 represents an integer from 1 to 4, 1 or 2 is preferred, and 2 is more preferred. In formula (Ar-12), n2 represents an integer of 1 to 8, and an integer of 1 to 4 is preferred, 1 or 2 is more preferred, and 2 is further preferred. In the formula (Ar-13), n3 and n4 each independently represent an integer of 0 to 4. An integer of 0 to 2 is preferred, 1 or 2 is more preferred, and 1 is further preferred. Among them, at least one of n3 and n4 is an integer greater than 1. In the formula (Ar-13), Q ¹ represents a single bond, -O-, -CO-, -COOCH ₂ CH ₂ OCO-, -SO ₂ -, -C (CF ₃ ) ₂ -. From the above formula (Q- The group represented by 1) or the group represented by the above formula (Q-2). In the formulas (Ar-11) to (Ar-13), *1 represents the bonding position with L ¹ .

In the formula (Ac-1), L ¹ represents -COO- or -CONH-, preferably -COO-.

In the formula (Ac-1), examples of the bivalent linking group represented by L ² include an alkylene group, an aryl group, -O-, -CO-, -COO-, -OCO-, and -NH-. , -S- and groups formed by combining two or more of these. The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and further preferably 1 to 15. The alkylene group may be linear, branched, or cyclic. The number of carbon atoms in the aryl group is preferably 6 to 30, more preferably 6 to 20, and still more preferably 6 to 10. The alkylene group and the aryl group may have a substituent. Examples of the substituent include hydroxyl group and the like. The bivalent linking group represented by L ² is preferably a group represented by -L ^2a -O-. L ^2a can include an alkylene group; an aryl group; a group formed by combining an alkylene group and an aryl group; a combination of at least one selected from an alkylene group and an aryl group and a group selected from -O-, -CO A group consisting of at least one of -, -COO-, -OCO-, -NH- and -S-, and an alkylene group is preferred. The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and further preferably 1 to 15. The alkylene group may be linear, branched, or cyclic. The alkylene group and the aryl group may have a substituent. Examples of the substituent include hydroxyl group and the like.

In the formula (Ac-2), the aromatic carboxyl group-containing group represented by Ar ¹⁰ has the same meaning as Ar ¹ in the formula (Ac-1), and the preferred range is also the same.

In the formula (Ac-2), L ¹¹ represents -COO- or -CONH-, preferably -COO-.

In formula (Ac-2), examples of the trivalent linking group represented by L ¹² include hydrocarbon groups, -O-, -CO-, -COO-, -OCO-, -NH-, -S- and combinations thereof A group consisting of two or more of these. Examples of the hydrocarbon group include aliphatic hydrocarbon groups and aromatic hydrocarbon groups. The number of carbon atoms of the aliphatic hydrocarbon group is preferably 1 to 30, more preferably 1 to 20, and further preferably 1 to 15. The aliphatic hydrocarbon group may be linear, branched, or cyclic. The number of carbon atoms of the aromatic hydrocarbon group is preferably 6 to 30, more preferably 6 to 20, and still more preferably 6 to 10. The hydrocarbon group may have a substituent. Examples of the substituent include hydroxyl group and the like. The trivalent linking group represented by L ¹² is preferably a group represented by formula (L12-1), and more preferably a group represented by formula (L12-2). [Chemical formula 21]

In formula (L12-1), L ^12b represents a trivalent linking group, X ¹ represents S, *1 represents the bonding position with L ¹¹ of formula (Ac-2), and *2 represents the bonding position with L 11 of formula (Ac-2). P ¹⁰ bonding position. Examples of the trivalent linking group represented by L ^12b include a hydrocarbon group; a hydrocarbon group is obtained by combining a hydrocarbon group and at least one selected from -O-, -CO-, -COO-, -OCO-, -NH- and -S-. A group formed by a hydrocarbon group or a group formed by combining a hydrocarbon group and -O- is preferred.

In formula (L12-2), L ^12c represents a trivalent linking group, X ¹ represents S, *1 represents the bonding position with L ¹¹ of formula (Ac-2), and *2 represents the bonding position with L 11 of formula (Ac-2) P ¹⁰ bonding position. Examples of the trivalent linking group represented by L ^12c include a hydrocarbon group; a hydrocarbon group is obtained by combining a hydrocarbon group and at least one selected from -O-, -CO-, -COO-, -OCO-, -NH- and -S-. groups, etc., hydrocarbon groups are preferred.

In formula (Ac-2), P ¹⁰ represents a polymer chain. The polymer chain represented by P ¹⁰ preferably has at least one structure selected from the group consisting of polyester structure, polyether structure, polystyrene structure and poly(meth)acrylic acid structure. The weight average molecular weight of the polymer chain P ¹⁰ is preferably 500 to 20,000. A lower limit of 1,000 or more is preferred. The upper limit is preferably 10,000 or less, more preferably 5,000 or less, and still more preferably 3,000 or less. If the weight average molecular weight of P ¹⁰ is within the above range, the dispersibility of the pigment in the composition will be good. In the case where the resin having an aromatic carboxyl group is a resin having a repeating unit represented by formula (Ac-2), the resin can be preferably used as a dispersant.

The polymer chain represented by P ¹⁰ may contain a crosslinking group. Examples of the crosslinkable group include a group containing an ethylenically unsaturated bond and a cyclic ether group.

As the resin, it is preferred to use at least one selected from the group consisting of a graft polymer, a star polymer, a block copolymer, and a resin in which at least one end of a polymer chain is sealed with an acid group. This resin can be preferably used as a dispersant.

Examples of the graft polymer include a resin having a repeating unit containing a graft chain, a resin having a repeating unit represented by the above formula (Ac-2), and the like. Examples of the graft chain include a graft chain containing at least one structure selected from a polyester structure, a polyether structure, a polystyrene structure, and a poly(meth)acrylic acid structure. The terminal structure of the graft chain is not particularly limited. It may be a hydrogen atom or a substituent. Examples of the substituent include an alkyl group, an alkoxy group, an alkylthioether group, and the like. Among them, from the viewpoint of improving the dispersibility of the pigment, a group having a steric repulsion effect is preferred, and an alkyl group or alkoxy group having 5 to 30 carbon atoms is preferred. The alkyl group and the alkoxy group may be linear, branched, or cyclic, and linear or branched are preferred.

Specific examples of the graft polymer include Paragraphs 0025 to 0094 of Japanese Patent Application Laid-Open No. 2012-255128, Paragraphs 0022 to 0097 of Japanese Patent Application Laid-Open No. 2009-203462, and Paragraphs 0102 of Japanese Patent Application Laid-Open No. 2012-255128. ~The resin described in paragraph 0166.

Examples of star-shaped polymers include resins having a structure in which a plurality of polymer chains are bonded to a core. Specific examples of the star polymer include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of Japanese Patent Application Laid-Open No. 2013-043962, and the like.

The block copolymer is a block of a polymer having repeating units containing acidic groups or bases (hereinafter also referred to as block A) and a polymer having repeating units containing no acidic groups or bases. Block copolymers of blocks (hereinafter also referred to as block B) are preferred. As the block copolymer, the block copolymer (B) described in paragraphs 0063 to 0112 of Japanese Patent Application Laid-Open No. 2014-219665 and the block copolymer described in paragraphs 0046 to 0076 of Japanese Patent Application Laid-Open No. 2018-156021 can also be used. Item A1, which content is incorporated into this description.

Examples of the resin in which at least one end of the polymer chain is sealed with an acid group include at least one end of the polymer chain containing at least one structure selected from the group consisting of a polyester structure, a polyether structure, and a poly(meth)acrylic acid structure. A resin with a structure sealed by an acidic base. Examples of the acid group that seals the end of the polymer chain include a carboxyl group, a sulfo group, and a phosphate group.

As the resin, it is preferable to use a resin that serves as a dispersant. Examples of the dispersant include acidic dispersants (acidic resins) and alkaline dispersants (basic resins). Here, the acidic dispersant (acidic resin) means a resin in which the amount of acid groups is greater than the amount of base groups. As an acidic dispersant (acidic resin), when the total amount of acid groups and base groups is 100 mol%, a resin having an acid group amount of 70 mol% or more is preferred. It is preferable that the acidic group of the acidic dispersant (acidic resin) is a carboxyl group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH/g. In addition, the alkaline dispersant (alkaline resin) means a resin in which the amount of base groups is greater than the amount of acid groups. As an alkaline dispersant (basic resin), when the total amount of acid groups and bases is 100 mol%, a resin in which the amount of bases exceeds 50 mol% is preferred. The alkaline dispersant preferably has an amine group as its base.

Dispersants are also available as commercial products, and specific examples thereof include the Disperbyk series manufactured by BYK-Chemie GmbH (for example, Disperbyk-111, 161, 2001, etc.) and the SOLSPERSE series manufactured by Lubrizol Japan Ltd. (for example, SOLSPERSE20000, 76500, etc.), Ajispar series manufactured by Ajinomoto Fine-Techno Co., Inc., A208F (manufactured by DKS Co. Ltd.), H-3606 (manufactured by DKS Co. Ltd.), SANDET ET (manufactured by SANYO KASEI CO., LTD. .manufacturing), etc. In addition, the products described in Paragraph 0129 of Japanese Patent Application Laid-Open No. 2012-137564 and the products described in Paragraph 0235 of Japanese Patent Application Laid-Open No. 2017-194662 can also be used as the dispersant.

The content of the resin in the total solid content of the resin composition is preferably 1 to 80% by mass. The lower limit is preferably 5 mass% or more, more preferably 10 mass% or more, further preferably 15 mass% or more, and particularly preferably 20 mass% or more. The upper limit is preferably 60 mass% or less, and more preferably 50 mass% or less. The content of the resin having an acid group in the total solid content of the resin composition is preferably 1 to 80% by mass. The lower limit is preferably 5 mass% or more, more preferably 10 mass% or more, further preferably 15 mass% or more, and particularly preferably 20 mass% or more. The upper limit is preferably 60 mass% or less, and more preferably 50 mass% or less.

Moreover, the content of the resin as a dispersant is preferably 10 to 150 parts by mass relative to 100 parts by mass of the pigment. The lower limit is preferably 15 parts by mass or more, and more preferably 20 parts by mass or more. The upper limit is preferably 100 parts by mass or less, and more preferably 80 parts by mass or less.

＜＜Solvent＞＞ The resin composition of the present invention contains a solvent. Examples of the solvent include organic solvents. The type of solvent is basically not particularly limited as long as it satisfies the solubility of each component or the coatability of the composition. Examples of the organic solvent include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, hydrocarbon solvents, and the like. For details, please refer to paragraph 0223 of International Publication No. 2015/166779, which is incorporated into this specification. Furthermore, ester solvents in which a cyclic alkyl group is substituted and ketone solvents in which a cyclic alkyl group is substituted can also be suitably used. Specific examples of the organic solvent include polyethylene glycol monomethyl ether, methylene chloride, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, and ethylcelsulacetate. , Ethyl lactate, diglyme, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methyl Cyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethylcarbitol acetate, butylcarbitol Alcohol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropionamide, 3-butoxy-N,N-dimethylpropionamide Amine, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, γ-butyrolactone, cyclotetrane, anisole, 1,4-diethyloxybutane, diethyl Glycol monoethyl ether acetate, 1,3-butanediol diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol, 4-hydroxy-4-methyl-2-pentane ketone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, isopropyl alcohol, etc. However, sometimes it is preferable to reduce the number of aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) used as organic solvents for environmental reasons (for example, it can be set to 50 mass based on the total amount of organic solvents). ppm (parts per million: parts per million) or less, it can also be set to 10 mass ppm or less, or it can be set to 1 mass ppm or less).

In the present invention, it is preferable to use an organic solvent with a small metal content. The metal content of the organic solvent is, for example, 10 mass ppb (parts per billion: parts per billion) or less. Organic solvents with a quality of ppt (parts per trillion: parts per trillion) level can be used as needed, and such organic solvents are provided by Toyo Gosei Co., Ltd. (Chemical Industry Daily, November 13, 2015).

Examples of methods for removing impurities such as metals from organic solvents include distillation (molecular distillation, thin film distillation, etc.) or filtration using a filter. The filter pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and further preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene or nylon.

Organic solvents can contain isomers (compounds with the same number of atoms but different structures). In addition, only one type of isomer may be contained, or a plurality of types of isomers may be contained.

It is preferable that the peroxide content rate in the organic solvent is 0.8 mmol/L or less, and it is more preferable that it contains substantially no peroxide.

The content of the solvent in the resin composition is preferably 10 to 95% by mass, more preferably 20 to 90% by mass, and further preferably 30 to 90% by mass.

Furthermore, from the viewpoint of environmental control, it is preferable that the resin composition of the present invention substantially does not contain environmentally controlled substances. Furthermore, in the present invention, substantially free of environmentally regulated substances means that the content of environmentally regulated substances in the resin composition is 50 ppm by mass or less, preferably 30 ppm by mass or less, and further preferably 10 ppm by mass or less. 1 mass ppm or less is particularly preferred. Examples of environmentally regulated substances include benzene; alkylbenzenes such as toluene and xylene; and halogenated benzene such as chlorobenzene. These regulations are based on REACH (Registration Evaluation Authorization and Restriction of CHemicals) rules, PRTR (Pollutant Release and Transfer Register) law, VOC (Volatile Organic Compounds) (Volatile Organic Compounds) control, etc. are registered as environmentally controlled substances, and the usage amount and treatment methods are strictly controlled. These compounds may be used as solvents when producing components used in the resin composition, and may be mixed into the resin composition as residual solvents. From the viewpoint of human safety and environmental considerations, it is better to reduce these substances as much as possible. An example of a method for reducing environmentally regulated substances is to heat or depressurize the system to a temperature above the boiling point of the environmentally regulated substances, and then distill the environmentally regulated substances from the system to thereby reduce them. In addition, when removing a small amount of environmentally controlled substances by distillation, it is also useful to azeotrope the solvent with a solvent having the same boiling point as the solvent in order to improve efficiency. In addition, when a compound having radical polymerizability is contained, in order to suppress cross-linking between molecules due to radical polymerization reaction during vacuum distillation removal, a polymerization inhibitor or the like may be added to perform vacuum distillation removal. These distillation removal methods can be performed at any stage, such as the raw material stage, the stage of a product of reacting the raw materials (for example, a resin solution or a polyfunctional monomer solution after polymerization), or the stage of a resin composition produced by mixing these compounds. carried out in one stage.

＜＜Polymerizable compounds＞＞ The resin composition of the present invention preferably contains a polymerizable compound. Examples of the polymerizable compound include compounds having a group containing an ethylenically unsaturated bond. Examples of the group containing an ethylenically unsaturated bond include vinyl, (meth)allyl, (meth)acrylyl, and the like. The polymerizable compound is preferably a radical polymerizable compound.

The polymerizable compound may be in any chemical form such as a monomer, a prepolymer, or an oligomer, but a monomer is preferred. The molecular weight of the polymerizable compound is preferably 100 to 2,500. The upper limit is preferably 2,000 or less, and 1,500 or less is even better. The lower limit is preferably 150 or more, and 250 or more is even better.

The polymerizable compound is preferably a compound containing three or more groups containing an ethylenically unsaturated bond, and more preferably a compound containing four or more groups containing an ethylenically unsaturated bond. From the viewpoint of storage stability of the resin composition, the upper limit of the groups containing ethylenically unsaturated bonds is preferably 15 or less, more preferably 10 or less, and still more preferably 6 or less. The polymerizable compound is preferably a (meth)acrylate compound with three or more functions, more preferably a (meth)acrylate compound with 3 to 15 functions, and still more preferably a (meth)acrylate compound with 3 to 10 functions. Preferred, especially 3-6 functional (meth)acrylate compounds. Specific examples of the polymerizable compound include paragraphs 0095 to 0108 of Japanese Patent Application Laid-Open No. 2009-288705, paragraph 0227 of Japanese Patent Application Laid-Open No. 2013-029760, and paragraphs 0254 to 0257 of Japanese Patent Application Laid-Open No. 2008-292970. , Paragraphs 0034 to 0038 of Japanese Patent Publication No. 2013-253224, Paragraph 0477 of Japanese Patent Publication No. 2012-208494, Japanese Patent Publication No. 2017-048367, Japanese Patent Publication No. 6057891, and Japanese Patent Publication No. 6031807 The compounds described are incorporated into this specification.

As the polymerizable compound, dipenterythritol tri(meth)acrylate (commercially available as KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipenterythritol tetra(meth)acrylate can also be used. ) acrylate (commercially available product: KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), dineopenterythritol penta(meth)acrylate (commercially available product: KAYARAD D-310; Nippon Kayaku Co. ., Ltd.), dipenterythritol hexa(meth)acrylate (commercially available as KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., NK EsterA-DPH-12E; SHIN-NAKAMURA CHEMICAL Co. , Ltd.), diglycerol EO (ethylene oxide) modified (meth)acrylate (commercially available as M-460; manufactured by TOAGOSEI CO., LTD.), neopentyl tetraacrylate ( SHIN-NAKAMURA CHEMICAL Co., Ltd., NK EsterA-TMMT), 1,6-hexanediol diacrylate (Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 (Nippon Kayaku Co., Ltd.), ARONIX TO-2349 (TOAGOSEI CO., LTD.), NK Oligo UA-7200 (SHIN-NAKAMURA CHEMICAL Co., Ltd.), 8UH-1006, 8UH-1012 (Taisei Fine Chemical Co. , Ltd.), LIGHT ACRYLATE POB-A0 (KYOEISHA CHEMICAL Co., LTD.), etc.

As the polymerizable compound, trimethylolpropane tri(meth)acrylate, trimethylolpropane ethylene oxide-modified tri(meth)acrylate, and trimethylolpropane ethylene oxide-modified can also be used. Trifunctional (meth)acrylate compounds such as tri(meth)acrylate, ethylene oxide isocyanurate modified tri(meth)acrylate, and neopentylerythritol tri(meth)acrylate. Commercially available products of trifunctional (meth)acrylate compounds include ARONIX M-309, M-310, M-321, M-350, M-360, M-313, M-315, M- 306, M-305, M-303, M-452, M-450 (manufactured by TOAGOSEI CO., LTD.), NK ESTER A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A -TMM-3L, A-TMM-3LM-N, A-TMPT, TMPT (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 ( Manufactured by Nippon Kayaku Co., Ltd.), etc.

As the polymerizable compound, a compound having an acid group such as a carboxyl group, a sulfo group, or a phosphate group can also be used. Commercially available products of such compounds include ARONIX M-305, M-510, M-520, ARONIX TO-2349 (manufactured by TOAGOSEI CO., LTD.), and the like.

As the polymerizable compound, a compound having a caprolactone structure can also be used. Regarding the compound having a caprolactone structure, please refer to the description in paragraphs 0042 to 0045 of Japanese Patent Application Laid-Open No. 2013-253224, which content is incorporated into this specification. Examples of compounds having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, and DPCA-120, which are commercially available as the KAYARAD DPCA series from Nippon Kayaku Co., Ltd.

As the polymerizable compound, a polymerizable compound having an alkyloxy group can also be used. The polymerizable compound having an alkyleneoxy group is preferably a polymerizable compound having an vinyloxy group and/or a propyleneoxy group, more preferably a polymerizable compound having an vinyloxy group, and a polymerizable compound having 4 to 20 vinyloxy groups. A 3- to 6-functional (meth)acrylate compound is further preferred. Examples of commercially available polymerizable compounds having an alkyleneoxy group include tetrafunctional (meth)acrylate SR-494 having four vinyloxy groups manufactured by Sartomer Company, Inc. and Nippon Kayaku Co., Ltd. .Preparation of KAYARAD TPA-330, a trifunctional (meth)acrylate with three isobutyleneoxy groups.

As the polymerizable compound, a polymerizable compound having a fluorine skeleton can also be used. Examples of commercially available products include OGSOL EA-0200 and EA-0300 ((meth)acrylate monomer having a fluorine skeleton, manufactured by Osaka Gas Chemicals Co., Ltd.).

As the polymerizable compound, it is also preferable to use a compound that does not substantially contain environmentally controlled substances such as toluene. Commercially available products of such compounds include KAYARAD DPHA LT, KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.), and the like.

Examples of polymerizable compounds include urethanes described in Japanese Patent Publication No. 48-041708, Japanese Patent Publication No. 51-037193, Japanese Patent Publication No. 02-032293, and Japanese Patent Publication No. 02-016765. Acrylates or those having an ethylene oxide-based skeleton described in Japanese Patent Publication No. 58-049860, Japanese Patent Publication No. 56-017654, Japanese Patent Publication No. 62-039417, and Japanese Patent Publication No. 62-039418 Urethane compounds are also preferred. In addition, polymerizable compounds having an amino group structure or a sulfide structure in the molecule described in Japanese Patent Application Laid-Open Nos. 63-277653, 63-260909, and 01-105238 may also be used. Better. In addition, as the polymerizable compound, UA-7200 (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, Commercially available products such as AH-600, T-600, AI-600, LINC-202UA (manufactured by KYOEISHA CHEMICAL Co., LTD.).

The content of the polymerizable compound in the total solid content of the resin composition is preferably 1 to 35% by mass. The upper limit is preferably 30 mass% or less, more preferably 25 mass% or less, still more preferably 20 mass% or less, and particularly preferably 10 mass% or less. The lower limit is preferably 2 mass% or more, and more preferably 5 mass% or more. The resin composition of the present invention may contain only one type of polymerizable compound, or may contain two or more types of polymerizable compounds. When two or more types of polymerizable compounds are contained, the total amount is preferably within the above range.

＜＜Photopolymerization initiator＞＞ The resin composition of the present invention preferably contains a photopolymerization initiator. The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, compounds that are photosensitive to light from the ultraviolet region to the visible region are preferred. The photopolymerization initiator is preferably a photoradical polymerization initiator.

Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (for example, compounds having a trioxadiazole skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbimidazole compounds, oxime compounds, organic Peroxides, sulfur compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, etc. From the perspective of exposure sensitivity, photopolymerization initiators include trihalomethyltrifluoroethylene compounds, benzyldimethyl ketal compounds, α-hydroxyketone compounds, α-aminoketone compounds, acylphosphine compounds, and oxidation compounds. Phosphine compounds, metallocene compounds, oxime compounds, hexaarylbisimidazole compounds, onium compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds, cyclopentadiene-benzene-iron complexes, halomethane compounds Preferred are ethadiazole compounds and 3-aryl substituted coumarin compounds, and compounds selected from the group consisting of oxime compounds, α-hydroxyketone compounds, α-aminoketone compounds and acylphosphine compounds are more preferred, and oxime compounds are more preferred. For further improvement. Examples of the photopolymerization initiator include compounds described in paragraphs 0065 to 0111 of Japanese Patent Application Laid-Open No. 2014-130173, compounds described in Japanese Patent Publication No. 6301489, and MATERIAL STAGE 37 to 60p, vol. 19 , the peroxide-based photopolymerization initiator described in No. 3, 2019, the photopolymerization initiator described in International Publication No. 2018/221177, the photopolymerization initiator described in International Publication No. 2018/110179 , the photopolymerization initiator described in Japanese Patent Application Publication No. 2019-043864, the photopolymerization initiator described in Japanese Patent Application Publication No. 2019-044030, the peroxide system described in Japanese Patent Application Publication No. 2019-167313 Initiator, the aminoacetophenone-based initiator having an oxazolidinyl group described in Japanese Patent Application Laid-Open No. 2020-055992, the oxime-based photopolymerization initiator described in Japanese Patent Application Publication No. 2013-190459, The polymers described in Japanese Patent Application Laid-Open No. 2020-172619, the compounds represented by Formula 1 described in International Publication No. 2020/152120, the compounds described in Japanese Patent Application Laid-Open No. 2021-181406, etc. are incorporated. in this manual.

Specific examples of hexaarylbisimidazole compounds include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-di Phenyl-1,1'-bisimidazole, etc.

Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, and Omnirad 127 (the above products are manufactured by IGM Resins B.V.), Irgacure 184, Irgacure 1173, Irgacure 2959, and Irgacure 127 (the above products are manufactured by BASF). manufactured by the company), etc. Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, and Omnirad 379EG (the above are manufactured by IGM Resins B.V.), Irgacure 907, Irgacure 369, Irgacure 369E, and Irgacure 379EG (the above are manufactured by IGM Resins B.V.). Manufactured by BASF Corporation), etc. Examples of commercially available acylphosphine compounds include Omnirad 819, Omnirad TPO (the above manufactured by IGM Resins B.V.), Irgacure 819, and Irgacure TPO (the above manufactured by BASF), and the like.

Examples of the oxime compound include compounds described in Japanese Patent Application Publication No. 2001-233842, compounds described in Japanese Patent Application Publication No. 2000-080068, compounds described in Japanese Patent Application Publication No. 2006-342166, and J.C.S. Perkin II ( Compounds described in J.C.S. Perkin II (1979, pp. 156-162), Journal of Photopolymer Science and Technology (1995, pp. 202-232) Compounds, compounds described in Japanese Patent Application Publication No. 2000-066385, compounds described in Japanese Patent Application Publication No. 2004-534797, compounds described in Japanese Patent Application Publication No. 2006-342166, Japanese Patent Application Publication No. 2017-019766 Compounds described in, Compounds described in Japanese Patent Publication No. 6065596, Compounds described in International Publication No. 2015/152153, Compounds described in International Publication No. 2017/051680, Compounds described in Japanese Patent Publication No. 2017-198865 Compounds, compounds described in paragraphs 0025 to 0038 of International Publication No. 2017/164127, compounds described in International Publication No. 2013/167515, compounds described in Japanese Patent No. 5430746, compounds described in Japanese Patent No. 5647738 Compound, the compound represented by the general formula (1) of Japanese Patent Application Laid-Open No. 2021-173858 and the compound described in paragraphs 0022 to 0024, the compound represented by the general formula (1) of Japanese Patent Application Laid-Open No. 2021-170089, and 0117 ~ Compounds described in paragraph 0120, etc. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetyloxyiminobutan-2-one, and 3-propyloxyiminobutan-2-one. Aminobutan-2-one, 2-acetyloxyiminopentan-3-one, 2-acetyloxyiminopentan-1-one, 2-benzylpropan-1-one Oxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1 -Phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyl oxime), etc. Examples of commercially available products include Irgacure-OXE01, Irgacure-OXE02, Irgacure-OXE03, Irgacure-OXE04 (the above are manufactured by BASF), TR-PBG-301, TR-PBG-304, and TR-PBG-327 (TRONLY company), Adeka Optomer N-1919 (manufactured by ADEKA CORPORATION, photopolymerization initiator 2 described in Japanese Patent Application Publication No. 2012-014052). In addition, as the oxime compound, it is also preferable to use a non-coloring compound or a compound with high transparency and resistance to discoloration. Examples of commercially available products include ADEKA ARKLS NCI-730, NCI-831, and NCI-930 (the above are manufactured by ADEKA CORPORATION).

As the photopolymerization initiator, an oxime compound having a fluorine ring can also be used. Specific examples of the oxime compound having a fluorine ring include the compounds described in Japanese Patent Application Laid-Open No. 2014-137466, the compounds described in Japanese Patent Publication No. 6636081, and the compounds described in Korean Patent Publication No. 10-2016-0109444. The compounds described are the fluorine amino ketone photoinitiator described in Japanese Patent Publication No. 2020-507664, and the oxime ester compound described in International Publication No. 2021/023144.

As the photopolymerization initiator, an oxime compound having at least one benzene ring of a carbazole ring serving as the skeleton of a naphthalene ring can also be used. Specific examples of such oxime compounds include compounds described in International Publication No. 2013/083505.

As the photopolymerization initiator, an oxime compound having a fluorine atom can also be used. Specific examples of the oxime compound having a fluorine atom include compounds described in Japanese Patent Application Publication No. 2010-262028, compounds 24, 36 to 40 described in Japanese Patent Application Publication No. 2014-500852, and Japanese Patent Application Publication No. 2013- Compound (C-3) described in Publication No. 164471, etc.

As the photopolymerization initiator, an oxime compound having a nitro group can be used. It is also preferable that the oxime compound having a nitro group is a dimer. Specific examples of the oxime compound having a nitro group include compounds described in paragraphs 0031 to 0047 of Japanese Patent Application Laid-Open No. 2013-114249 and paragraphs 0008 to 0012 and 0070 to 0079 of Japanese Patent Application Laid-Open No. 2014-137466, The compound described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071, ADEKA ARKLS NCI-831 (manufactured by ADEKA CORPORATION).

As the photopolymerization initiator, an oxime compound having a benzofuran skeleton can also be used. Specific examples include OE-01 to OE-75 described in International Publication No. 2015/036910.

As the photopolymerization initiator, an oxime compound in which a substituent having a hydroxyl group is bonded to a carbazole skeleton can also be used. Examples of such photopolymerization initiators include compounds described in International Publication No. 2019/088055.

Specific examples of oxime compounds that can be preferably used in the present invention are shown below, but the present invention is not limited to these.

[Chemical formula 22] [Chemical formula 23] [Chemical formula 24]

The oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 to 500 nm, and more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 to 480 nm. In addition, from the viewpoint of sensitivity, the oxime compound preferably has a high Mohr absorption coefficient at a wavelength of 365 nm or a wavelength of 405 nm, more preferably 1,000 to 300,000, further preferably 2,000 to 300,000, and particularly preferably 5,000 to 200,000. The molar absorption coefficient of a compound can be measured using a known method. For example, it is preferable to measure with a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian) using an ethyl acetate solvent at a concentration of 0.01 g/L.

As a photopolymerization initiator, it is also preferable to use Irgacure OXE01 (manufactured by BASF) and/or Irgacure OXE02 (manufactured by BASF) and Omnirad 2959 (manufactured by IGM Resins B.V.) in combination.

As the photopolymerization initiator, a bifunctional or trifunctional or higher photoradical polymerization initiator can be used. By using such a photoradical polymerization initiator, two or more radicals are generated from one molecule of the photoradical polymerization initiator, so good sensitivity can be obtained. Furthermore, when a compound with an asymmetric structure is used, the crystallinity decreases and the solubility in a solvent or the like increases, making it difficult to precipitate over time, thereby improving the temporal stability of the resin composition. Specific examples of the bifunctional or trifunctional or higher-functional photoradical polymerization initiator include Japanese Patent Application Publication No. 2010-527339, Japanese Patent Application Publication No. 2011-524436, International Publication No. 2015/004565, and Japanese Patent Application Publication No. 2015/004565. The dimer of the oxime compound described in paragraphs 0407 to 0412 of Table 2016-532675, paragraphs 0039 to 0055 of International Publication No. 2017/033680, the compound (E) described in Japanese Patent Publication No. 2013-522445, and Compound (G), Cmpd1 to 7 described in International Publication No. 2016/034963, oxime ester photoinitiator described in paragraph 0007 of Japanese Patent Application Publication No. 2017-523465, Japanese Patent Application Publication No. 2017-167399 The photoinitiator described in paragraphs 0020 to 0033, the photopolymerization initiator (A) described in paragraphs 0017 to 0026 of Japanese Patent Application Laid-Open No. 2017-151342, the oxime ester photoinitiator described in Japanese Patent No. 6469669 starter, etc.

The content of the photopolymerization initiator in the total solid content of the resin composition is preferably 0.1 to 30% by mass. The lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. The upper limit is preferably 20 mass% or less, and more preferably 15 mass% or less. The resin composition of the present invention may contain only one type of photopolymerization initiator, or may contain two or more types of photopolymerization initiators. When two or more types of photopolymerization initiators are contained, the total amount is preferably within the above range.

＜＜Compounds with cyclic ether groups＞＞ The resin composition of the present invention can contain a compound having a cyclic ether group. Examples of the cyclic ether group include an epoxy group, an oxetanyl group, and the like. The compound having a cyclic ether group is preferably a compound having an epoxy group (hereinafter also referred to as an epoxy compound). Examples of the epoxy compound include compounds having one or more epoxy groups per molecule, and compounds having two or more epoxy groups are preferred. The epoxy compound is preferably a compound having 1 to 100 epoxy groups in one molecule. The upper limit of the epoxy groups contained in the epoxy compound can be, for example, 10 or less, or 5 or less. The lower limit of the epoxy groups contained in the epoxy compound is preferably 2 or more. As the epoxy compound, Paragraphs 0034 to 0036 of Japanese Patent Application Laid-Open No. 2013-011869, Paragraphs 0147 to 0156 of Japanese Patent Application Laid-Open No. 2014-043556, and Paragraphs 0085 to 0092 of Japanese Patent Application Laid-Open No. 2014-089408 can also be used. The compounds described are compounds described in Japanese Patent Application Laid-Open No. 2017-179172. These contents are incorporated into this manual.

The epoxy compound can be a low molecular compound (for example, the molecular weight is less than 2000, and then the molecular weight is less than 1000), or it can be a macromolecule compound (for example, the molecular weight is more than 1000, and when it is a polymer, the weight average molecular weight is 1000 or more). The weight average molecular weight of the compound having an epoxy group is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight average molecular weight is more preferably 10,000 or less, particularly preferably 5,000 or less, and still more preferably 3,000 or less.

Examples of commercially available compounds having a cyclic ether group include EHPE3150 (manufactured by Daicel Corporation), EPICLON N-695 (manufactured by DIC Corporation), Marproof G-0150M, G-0105SA, G-0130SP, and G- 0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 (the above are manufactured by NOF CORPORATION., polymers containing epoxy groups), etc.

The content of the compound having a cyclic ether group in the total solid content of the resin composition is preferably 0.1 to 20% by mass. The lower limit is, for example, more preferably 0.5% by mass or more, and still more preferably 1% by mass or more. The upper limit is, for example, more preferably 15% by mass or less, and still more preferably 10% by mass or less. Only one type of compound having a cyclic ether group may be used, or two or more types may be used. When two or more types are used, the total amount is preferably within the above range.

＜＜Harding accelerator＞＞ The resin composition of the present invention can contain a hardening accelerator. Examples of the hardening accelerator include thiol compounds, methylol compounds, amine compounds, phosphonium salt compounds, amidine salt compounds, amide compounds, base generators, isocyanate compounds, alkoxysilane compounds, onium salt compounds, and the like. Specific examples of the hardening accelerator include compounds described in paragraphs 0094 to 0097 of International Publication No. 2018/056189, compounds described in paragraphs 0246 to 0253 of Japanese Patent Application Laid-Open No. 2015-034963, and Japanese Patent Application Laid-Open No. 2013. - Compounds described in paragraphs 0186 to 0251 of Japanese Patent Application Publication No. 041165, ionic compounds described in Japanese Patent Application Laid-Open No. 2014-055114, compounds described in paragraphs 0071 to 0080 of Japanese Patent Application Publication No. 2012-150180, Japanese Patent Application Laid-Open No. 2012-150180 Alkoxysilane compound having an epoxy group described in Publication No. 2011-253054, compound described in paragraphs 0085 to 0092 of Japanese Patent Publication No. 5765059, ring containing carboxyl group described in Japanese Patent Application Laid-Open No. 2017-036379 Oxygen curing agents, compounds described in Japanese Patent Application Laid-Open No. 2021-181406, etc. The content of the hardening accelerator in the total solid content of the resin composition is preferably 0.3 to 8.9% by mass, and more preferably 0.8 to 6.4% by mass.

<<Ultraviolet absorber>> The resin composition of the present invention can contain an ultraviolet absorber. Examples of the ultraviolet absorber include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyl trisulfonate compounds, and indepine compounds. Indole compounds, tribenzoyl compounds, benzoyl compounds, etc. Specific examples of such compounds include paragraphs 0038 to 0052 of Japanese Patent Application Laid-Open No. 2009-217221, paragraphs 0052 to 0072 of Japanese Patent Application Laid-Open No. 2012-208374, and paragraphs 0317 to 0317 of Japanese Patent Application Laid-Open No. 2013-068814. Compounds described in Paragraph 0334, Paragraphs 0061 to 0080 of Japanese Patent Application Laid-Open No. 2016-162946, Paragraphs 0052 and 0074 of International Publication No. 2021/131355, Paragraphs 0022 to 0024 of International Publication No. 2021/132247, etc. are incorporated into this manual. Specific examples of ultraviolet absorbers include compounds having the following structures. Examples of commercially available ultraviolet absorbers include UV-503 (manufactured by DAITO CHEMICAL CO., LTD.), BASF's Tinuvin series, Uvinul series, and Sumika Chemtex Company, Limited's Sumisorb series. Examples of benzotriazole compounds include the MYUA series manufactured by MIYOSHI OIL & FAT CO., LTD. (Chemical Industry Daily, February 1, 2016). In addition, as the ultraviolet absorber, the compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967, the compounds described in paragraphs 0059 to 0076 of International Publication No. 2016/181987, and the compounds described in International Publication No. 2020/137819 can also be used. A thioaryl-substituted benzotriazole type ultraviolet absorber and a reactive trifluoroethylene ultraviolet absorber described in Japanese Patent Application Laid-Open No. 2021-178918. [Chemical formula 25]

The content of the ultraviolet absorber in the total solid content of the resin composition is preferably 0.01 to 10% by mass, and more preferably 0.01 to 5% by mass. The resin composition of the present invention may contain only one type of ultraviolet absorber, or may contain two or more types of ultraviolet absorber. When two or more types of ultraviolet absorbers are contained, the total amount is preferably within the above range.

＜＜Polymerization inhibitor＞＞ The resin composition of the present invention can contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tertiary butyl-p-cresol, gallic acid, tertiary butylcatechol, benzoquinone, and 4,4'-thio Bis(3-methyl-6-tertiary butylphenol), 2,2'-methylenebis(4-methyl-6-tertiary butylphenol), N-nitrosophenylhydroxylamine salt ( Ammonium salt, first cerium salt, etc.). Among them, p-methoxyphenol is preferred. The content of the polymerization inhibitor in the total solid content of the resin composition is preferably 0.0001 to 5% by mass. The resin composition of the present invention may contain only one polymerization inhibitor, or may contain two or more polymerization inhibitors. When two or more types of polymerization inhibitors are contained, the total amount is preferably within the above range.

＜＜Silane Coupling Agent＞＞ The resin composition of the present invention can contain a silane coupling agent. In this specification, a silane coupling agent refers to a silane compound having a hydrolyzable group and functional groups other than the hydrolyzable group. In addition, the hydrolyzable group refers to a substituent that is directly bonded to a silicon atom and can generate a siloxane bond through at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, a hydroxyl group, and the like, with an alkoxy group being preferred. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. Examples of the functional group other than the hydrolyzable group include a vinyl group, a (meth)allyl group, a (meth)acrylyl group, a mercapto group, an epoxy group, an oxetanyl group, and an amino group. , urea group, thioether group, isocyanate group, phenyl group, etc., amine group, (meth)acrylyl group and epoxy group are preferred. Specific examples of the silane coupling agent include N-β-aminoethyl-γ-aminopropylmethyldimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBM-602), N-β-aminoethyl-γ-aminopropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBM-603), N-β-aminoethyl-γ-amine Propyltriethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBE-602), γ-aminopropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name) KBM-903), γ-aminopropyltriethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBE-903), 3-methacryloxypropylmethyldimethyl Oxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBM-502), 3-methacryloxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBM-503) etc. Specific examples of the silane coupling agent include the compounds described in paragraphs 0018 to 0036 of Japanese Patent Application Laid-Open No. 2009-288703 and the compounds described in paragraphs 0056 to 0066 of Japanese Patent Application Laid-Open No. 2009-242604. and other contents are incorporated into this manual. The content of the silane coupling agent in the total solid content of the resin composition is preferably 0.01 to 15% by mass, and more preferably 0.05 to 10% by mass. The resin composition of the present invention may contain only one silane coupling agent, or may contain two or more silane coupling agents. When two or more silane coupling agents are contained, the total amount is preferably within the above range.

＜＜Surfactant＞＞ The resin composition of the present invention can contain a surfactant. As the surfactant, various surfactants such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and polysiloxane-based surfactants can be used. The surfactant is preferably a polysiloxane-based surfactant or a fluorine-based surfactant. Regarding surfactants, please refer to the surfactants described in paragraphs 0238 to 0245 of International Publication No. 2015/166779, and this content is incorporated into this specification.

Examples of the fluorine-based surfactant include surfactants described in paragraphs 0060 to 0064 of Japanese Patent Application Laid-Open No. 2014-041318 (corresponding to paragraphs 0060 to 0064 of International Publication No. 2014/017669), Japanese Patent Application Laid-Open No. 2014/017669, etc. The surfactants described in paragraphs 0117 to 0132 of Publication No. 2011-132503 and the surfactants described in Japanese Patent Application Laid-Open No. 2020-008634 are incorporated into this specification. Examples of commercially available fluorine-based surfactants include MEGAFACE F-171, F-172, F-173, F-176, F-177, F-141, F-142, F-143, F -144, F-437, F-475, F-477, F-479, F-482, F-554, F-555-A, F-556, F-557, F-558, F-559, F -560, F-561, F-565, F-563, F-568, F-575, F-780, EXP, MFS-330, R-01, R-40, R-40-LM, R-41 , R-41-LM, RS-43, R-43, TF-1956, RS-90, R-94, RS-72-K, DS-21 (the above are manufactured by DIC Corporation), FLUORAD FC430, FC431, FC171 (The above are manufactured by Sumitomo 3M Limited), SURFLON S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 ( The above are manufactured by AGC INC.), PolyFox PF636, PF656, PF6320, PF6520, PF7002 (the above are manufactured by OMNOVA SOLUTIONS INC.), Futurgent 208G, 215M, 245F, 601AD, 601ADH2, 602A, 610FM, 710FL, 710FM, 710FS, FTX -218 (the above are manufactured by NEOS COMPANY LIMITED), etc.

It is also preferable to use an acrylic compound as the fluorine-based surfactant. The acrylic compound has a molecular structure including a functional group containing a fluorine atom, and when heated, the part of the functional group containing the fluorine atom is cut off and the fluorine atom is volatilized. . Examples of such fluorine-based surfactants include the MEGAFACE DS series manufactured by DIC Corporation (Chemical Industry Daily (February 22, 2016), Nikkei Sangyo Shimbun (February 23, 2016)). For example, MEGAFACE DS-21.

It is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound as the fluorine-based surfactant. Examples of such fluorine-based surfactants include the fluorine-based surfactants described in Japanese Patent Application Laid-Open No. 2016-216602, the content of which is incorporated into this specification.

Block polymers can also be used as fluorine-based surfactants. The fluorine-based surfactant can also preferably use a fluorine-containing polymer compound that contains: a repeating unit derived from a (meth)acrylate compound having a fluorine atom; and a fluorine-containing polymer compound derived from a (meth)acrylate compound having 2 or more ( The repeating unit of a (meth)acrylate compound is preferably an alkyleneoxy group (preferably 5 or more) (preferably an vinyloxy group or a propyleneoxy group). In addition, the fluorine-containing surfactant described in paragraphs 0016 to 0037 of Japanese Patent Application Laid-Open No. 2010-032698 or the following compounds can also be exemplified as the fluorine-based surfactant used in the present invention. [Chemical formula 26] The weight average molecular weight of the above compound is preferably 3,000 to 50,000, for example, 14,000. In the above compounds, the percentage expressed as the proportion of repeating units is molar %.

In addition, a fluorine-containing polymer having a group containing an ethylenically unsaturated bond in the side chain can also be used as the fluorine-based surfactant. Specific examples include compounds described in paragraphs 0050 to 0090 and paragraphs 0289 to 0295 of Japanese Patent Application Laid-Open No. 2010-164965, and MEGAFACE RS-101, RS-102, RS-718K, and RS-72- manufactured by DIC Corporation. K et al. In addition, the compounds described in paragraphs 0015 to 0158 of Japanese Patent Application Laid-Open No. 2015-117327 can also be used as the fluorine-based surfactant.

Furthermore, from the viewpoint of environmental control, it is also preferable to use the surfactant described in International Publication No. 2020/084854 as a substitute for the surfactant having a perfluoroalkyl group with a carbon number of 6 or more.

Furthermore, it is also preferable to use a fluoride-containing imine salt compound represented by formula (fi-1) as a surfactant. [Chemical formula 27] In formula (fi-1), m represents 1 or 2, n represents an integer from 1 to 4, a represents 1 or 2, X ^a+ represents a-valent metal ion, primary ammonium ion, secondary ammonium ion, tertiary ammonium ion, Quaternary ammonium ion or NH ₄ ⁺ .

Examples of nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane, and their ethoxylates and propoxylates (for example, glycerolpropane Oxylate, glycerol ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonyl Phenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitol fatty acid ester, Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (manufactured by BASF), Tetronic 304, 701, 704, 901, 904, 150R1 (manufactured by BASF Corporation), SOLSPERSE 20000 (manufactured by Japan Lubrizol Corporation), NCW-101, NCW-1001, NCW-1002 (manufactured by FUJIFILM Wako Pure Chemical Corporation), PIONIN D- 6112, D-6112-W, D-6315 (manufactured by Takemoto Oil & Fat Co., Ltd.), OLFIN E1010, Surfynol 104, 400, 440 (manufactured by Nissin Chemical Industry Co., Ltd.), etc.

Examples of polysilicone-based surfactants include DOWSIL SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, SF 8419 OIL (the above are manufactured by Dow Corning Toray Co., Ltd.), TSF- 4300, TSF-4445, TSF-4460, TSF-4452 (the above are manufactured by Momentive Performance Materials Inc.), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (the above are manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-333, BYK-3760, BYK-UV3510 (the above are manufactured by BYK-Chemie GmbH), etc.

Moreover, the compound of the following structure can also be used as a polysiloxane surfactant. [Chemical formula 28]

The content of the surfactant in the total solid content of the resin composition is preferably 0.001 mass% to 5.0 mass%, and more preferably 0.005 to 3.0 mass%. The resin composition of the present invention may contain only one type of surfactant, or may contain two or more types of surfactants. When two or more surfactants are contained, the total amount is preferably within the above range.

＜＜Antioxidants＞＞ The resin composition of the present invention can contain antioxidants. Examples of antioxidants include phenol-based antioxidants, amine-based antioxidants, phosphorus-based antioxidants, sulfur-based antioxidants, and the like. Examples of phenolic antioxidants include hindered phenol compounds. The phenolic antioxidant is preferably a compound having a substituent at the position adjacent to the phenolic hydroxyl group (ortho position). As the substituent, a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferred. Moreover, it is also preferable that the antioxidant is a compound having a phenol group and a phosphite group in the same molecule. Moreover, as an antioxidant, a phosphorus-type antioxidant can also be suitably used. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2] Dioxaphosphineheterocycloheptadien-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tertiary butyldibenzo[d,f] [1,3,2]dioxaphosphineheterocycloheptadien-2-yl)oxy]ethyl]amine, ethyl bis(2,4-di-tertiary butyl-6-methyl phosphite) phenyl) etc. Examples of commercially available antioxidants include ADEKA STAB AO-20, ADEKA STAB AO-30, ADEKA STAB AO-40, ADEKA STAB AO-50, ADEKA STAB AO-50F, ADEKA STAB AO-60, and ADEKA STAB AO-60G, ADEKA STAB AO-80, ADEKA STAB AO-330 (the above are manufactured by ADEKA CORPORATION), etc. In addition, the compounds described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, the compounds described in International Publication No. 2017/006600, the compounds described in International Publication No. 2017/164024, and Korean Patent Publication can also be used as antioxidants. Compounds described in Publication No. 10-2019-0059371. The content of the antioxidant in the total solid content of the resin composition is preferably 0.01 to 20% by mass, and more preferably 0.3 to 15% by mass. The resin composition of the present invention may contain only one type of antioxidant, or may contain two or more types of antioxidants. When two or more antioxidants are contained, the total amount is preferably within the above range.

＜＜Other ingredients＞＞ The resin composition of the present invention may optionally contain sensitizers, hardening accelerators, fillers, thermal hardening accelerators, plasticizers and other auxiliaries (for example, conductive particles, defoaming agents, flame retardants, leveling agents , peeling accelerators, spices, surface tension regulators, chain transfer agents, etc.). By appropriately containing these components, film physical properties and other properties can be adjusted. Regarding these components, for example, the descriptions of paragraphs 0183 and onwards of Japanese Patent Application Laid-Open No. 2012-003225 (corresponding to paragraph 0237 of the specification of U.S. Patent Application Publication No. 2013/0034812), and the descriptions of Japanese Patent Application Laid-Open No. 2008-250074 The descriptions in paragraphs 0101 to 0104, 0107 to 0109, etc. are incorporated into this manual. Moreover, the resin composition of this invention may contain a latent antioxidant as needed. Examples of potential antioxidants include compounds in which a site functioning as an antioxidant is protected by a protective group and the protective group is detached by heating at 100 to 250°C or heating at 80 to 200°C in the presence of an acid/alkali catalyst. and acts as an antioxidant. Examples of potential antioxidants include compounds described in International Publication No. 2014/021023, International Publication No. 2017/030005, and Japanese Patent Application Laid-Open No. 2017-008219. Examples of commercially available latent antioxidants include ADEKA ARKLS GPA-5001 (manufactured by ADEKA CORPORATION).

The resin composition of the present invention may contain a light resistance improving agent. Examples of the light resistance improving agent include compounds described in paragraphs 0036 to 0037 of Japanese Patent Application Laid-Open No. 2017-198787, compounds described in paragraphs 0029 to 0034 of Japanese Patent Application Laid-Open No. 2017-146350, and compounds described in Japanese Patent Application Laid-Open No. 2017-146350. Compounds described in paragraphs 0036 to 0037 and 0049 to 0052 of Japanese Patent Application Publication No. 129774, compounds described in paragraphs 0031 to 0034 and paragraphs 0058 to 0059 of Japanese Patent Application Laid-Open No. 2017-129674, and compounds described in Japanese Patent Application Laid-Open No. 2017-122803 Compounds described in paragraphs 0036 to 0037 and 0051 to 0054, compounds described in paragraphs 0025 to 0039 of International Publication No. 2017/164127, compounds described in paragraphs 0034 to 0047 of Japanese Patent Application Publication No. 2017-186546, Japan Compounds described in paragraphs 0019 to 0041 of Japanese Patent Application Laid-Open No. 2015-025116, compounds described in paragraphs 0101 to 0125 of Japanese Patent Application Laid-Open No. 2012-145604, and compounds described in paragraphs 0018 to 0021 of Japanese Patent Application Laid-Open No. 2012-103475 Compounds, compounds described in paragraphs 0015 to 0018 of Japanese Patent Application Laid-Open No. 2011-257591, compounds described in paragraphs 0017 to 0021 of Japanese Patent Application Publication No. 2011-191483, and compounds described in paragraphs 0108 to 0108 of Japanese Patent Application Laid-Open No. 2011-145668 Compounds described in paragraph 0116, compounds described in paragraphs 0103 to 0153 of Japanese Patent Application Laid-Open No. 2011-253174, and the like.

It is also preferred that the resin composition of the present invention contains substantially no terephthalate ester. Here, "substantially free" means that the content of terephthalate ester in the total amount of the resin composition is 1000 mass ppb or less, more preferably 100 mass ppb or less, and 0 is particularly preferably 0.

From the viewpoint of environmental regulation, the use of perfluoroalkylsulfonic acid and its salts, and perfluoroalkylcarboxylic acid and its salts is sometimes regulated. In the resin composition of the present invention, when the content rate of the above-mentioned compounds is reduced, perfluoroalkyl sulfonic acid (especially perfluoroalkyl group having a carbon number of 6 to 8) is increased relative to the total solid content of the coloring composition. Fluoroalkylsulfonic acid) and its salts, and perfluoroalkylcarboxylic acids (especially perfluoroalkylcarboxylic acids with a perfluoroalkyl group having 6 to 8 carbon atoms) and their salts are contained in a ratio of 0.01 ppb to 1,000 ppb The range of is preferred, the range of 0.05ppb to 500ppb is more preferred, and the range of 0.1ppb to 300ppb is further preferred. The resin composition of the present invention may be substantially free of perfluoroalkylsulfonic acid and its salts and perfluoroalkylcarboxylic acid and its salts. For example, by using compounds that can replace perfluoroalkyl sulfonic acid and its salts, and compounds that can replace perfluoroalkyl carboxylic acids and its salts, you can choose to be substantially free of perfluoroalkyl sulfonic acid and its salts, and Resin compositions of perfluoroalkylcarboxylic acids and their salts. Examples of compounds that can replace the regulated compounds include compounds that are excluded from the subject of regulation due to differences in the number of carbon atoms in the perfluoroalkyl group. Among them, the above content does not prevent the use of perfluoroalkyl sulfonic acid and its salts and perfluoroalkyl carboxylic acid and its salts. The resin composition of the present invention may contain perfluoroalkylsulfonic acid and its salts and perfluoroalkylcarboxylic acid and its salts within the maximum allowable range.

＜＜Container＞＞ There is no particular limitation on the container for storing the resin composition, and a known container can be used. In addition, as a storage container, in order to prevent impurities from being mixed into raw materials or resin compositions, it is also preferable to use a multi-layer bottle with an inner wall composed of six types of six-layer resins or a bottle with a seven-layer structure of six types of resins. Examples of such a container include the container described in Japanese Patent Application Laid-Open No. 2015-123351. In addition, the inner wall of the container is preferably made of glass, stainless steel, etc., for the purpose of preventing elution of metal from the inner wall of the container, improving the stability of the resin composition over time, or suppressing component deterioration.

＜Manufacturing method of resin composition＞ The manufacturing method of the resin composition of the present invention is characterized by including the steps of dispersing a pigment, a pigment derivative with a crystallite size of 1 to 50 nm, and a resin in a solvent.

Examples of the solvent, pigment, and resin include the solvents, pigments, and resins described as contained in the above-mentioned resin composition. The resin preferably contains a resin as a dispersant.

The preferable chemical structure of the pigment derivative is the same as that described in the section regarding the pigment derivative contained in the above-mentioned resin composition.

The crystallite size of the pigment derivative is 1 to 50 nm. The lower limit of the crystallite size is preferably 1 nm or more, and more preferably 2 nm or more. The upper limit of the crystallite size is preferably 30 nm or less, more preferably 20 nm or less.

If the size of the crystallites of the pigment derivative is within the above range, a resin composition having excellent pigment dispersion stability can be produced.

The method for producing a resin composition of the present invention may further include, after producing a dispersion liquid in the above steps (the step of dispersing a pigment, a pigment derivative with a crystallite size of 1 to 50 nm, and a resin in a solvent), the obtained dispersion liquid The step of mixing with other materials such as polymeric compounds, photopolymerization initiators, resins, and solvents. Other materials can be appropriately selected depending on the use of the resin composition. For example, when manufacturing a resin composition for photolithography, when manufacturing a resin composition for photolithography, when it is used for photolithography, it is preferable to select one containing a polymerizable compound and a photopolymerization initiator as other materials. . In addition, as other materials, materials such as resin, solvent, surfactant, silane coupling agent, polymerization inhibitor, ultraviolet absorber, etc. described in the above-mentioned section of the resin composition may be further added.

When manufacturing a resin composition, it is preferable to filter the resin composition with a filter for the purpose of removing impurities, reducing defects, etc. As a filter, any filter that has been conventionally used for filtration purposes and the like can be used without particular restrictions. Examples include the use of fluororesins such as polytetrafluoroethylene (PTFE) and polyvinylidene fluoride (PVDF), polyamide-based resins such as nylon (for example, nylon-6, nylon-6,6), polyethylene, polyethylene, etc. Filters made of materials such as propylene (PP) and other polyolefin resins (including high-density, ultra-high molecular weight polyolefin resins). Among these materials, polypropylene (including high-density polypropylene) and nylon are preferred.

The pore diameter of the filter is preferably 0.01 to 7.0 μm, more preferably 0.01 to 3.0 μm, and further preferably 0.05 to 0.5 μm. If the pore size of the filter is within the above range, fine foreign matter can be removed more reliably. Regarding the pore size of the filter, you can refer to the nominal value of the filter manufacturer. As for the filter, various filters provided by Nihon Pall Ltd. (DFA4201NXEY, DFA4201NAEY, DFA4201J006P, etc.), Advantec Toyo Kaisha, Ltd., Nihon Entegris K.K. (Formerly Nippon Mykrolis Corporation), KITZ MICROFILTER Corporation, etc. can be used.

In addition, it is also preferable to use a fibrous filter material as the filter. Examples of fibrous filter materials include polypropylene fiber, nylon fiber, glass fiber, and the like. Commercially available products include SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), and SHPX type series (SHPX003, etc.) manufactured by ROKI TECHNO CO., LTD.

When using filters, you can combine different filters (e.g. 1st filter and 2nd filter, etc.). At this time, filtration using each filter may be performed only once, or may be performed two or more times. Furthermore, filters with different pore sizes can be combined within the above range. Alternatively, only the dispersion may be filtered with the first filter, and the other components may be mixed and then filtered with the second filter.

＜Pigment Derivatives＞ The pigment derivative of the present invention is characterized in that it is a particle of a compound having at least one structure selected from the group consisting of a pigment structure and a trivalent structure and an acid group or a base, wherein the crystallite size is 1 to 1 50nm.

The lower limit of the crystallite size of the pigment derivative is preferably 1 nm or more, and more preferably 2 nm or more. The upper limit of the crystallite size of the pigment derivative is preferably 30 nm or less, more preferably 20 nm or less.

A preferable aspect of the chemical structure of the pigment derivative is the same as that described in the section on the pigment derivative contained in the above-mentioned resin composition.

The pigment derivative of the present invention is preferably a dispersion aid.

＜Membrane＞ The film of the present invention is a film obtained from the above-mentioned resin composition of the present invention. The film thickness of the film of the present invention can be appropriately adjusted depending on the purpose. For example, the film thickness is preferably 20 μm or less, more preferably 10 μm or less, and still more preferably 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more, and still more preferably 0.3 μm or more.

The film of the present invention can be used in color filters, near-infrared transmission filters, near-infrared cutoff filters, black matrices, light-shielding films, and the like. The film of the present invention can be preferably used as a colored pixel of a color filter. Examples of colored pixels include red pixels, green pixels, blue pixels, magenta pixels, cyan pixels, and yellow pixels.

When the film of the present invention is used as a near-infrared cutoff filter, it is preferable that the maximum absorption wavelength of the film of the present invention exists in the range of wavelength 700 to 1800 nm, and it is more preferable that it exists in the range of wavelength 700 to 1400 nm. It is more preferable to have a wavelength in the range of 700 to 1200 nm. In addition, the transmittance of the film in the entire wavelength range of 400 to 650 nm is preferably 70% or more, more preferably 80% or more, and still more preferably 90% or more. Moreover, it is preferable that the transmittance of at least one place within the wavelength range of 700 to 1800 nm of the film is 20% or less. In addition, the ratio of the absorbance Amax at the maximum absorption wavelength and the absorbance A550 at the wavelength of 550 nm (absorbance Amax/absorbance A550) is preferably 20 to 500, more preferably 50 to 500, further preferably 70 to 450, and 100 to 400 is especially good.

When the film of the present invention is used as a near-infrared transmission filter, it is preferable that the film of the present invention has any one of the following spectral characteristics (i1) to (i5). (i1): The maximum value of the transmittance in the wavelength range of 400 to 640 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 800 to 1500 nm The minimum value is a film of more than 70% (preferably more than 75%, more preferably more than 80%). A film with such spectroscopic characteristics can block light with a wavelength in the range of 400 to 640 nm, and can transmit light with a wavelength exceeding 750 nm. (i2): The maximum value of the transmittance in the wavelength range of 400 to 750 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 900 to 1500 nm The minimum value is a film of more than 70% (preferably more than 75%, more preferably more than 80%). A film with such spectroscopic characteristics can block light with a wavelength in the range of 400 to 750 nm, and can transmit light with a wavelength exceeding 850 nm. (i3): The maximum value of the transmittance in the wavelength range of 400 to 830 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 1000 to 1500 nm The minimum value is a film of more than 70% (preferably more than 75%, more preferably more than 80%). A film with such spectroscopic characteristics can block light with a wavelength in the range of 400 to 830 nm, and can transmit light with a wavelength exceeding 950 nm. (i4): The maximum value of the transmittance in the wavelength range of 400 to 950 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 1100 to 1500 nm The minimum value is a film of more than 70% (preferably more than 75%, more preferably more than 80%). A film with such spectroscopic characteristics can block light with a wavelength in the range of 400 to 950 nm, and can transmit light with a wavelength exceeding 1050 nm. (i5): The maximum value of the transmittance in the wavelength range of 400 to 1050 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 1200 to 1500 nm The minimum value is a film of more than 70% (preferably more than 75%, more preferably more than 80%). A film with such spectroscopic characteristics can block light with a wavelength in the range of 400 to 1050 nm, and can transmit light with a wavelength exceeding 1150 nm.

＜Membrane manufacturing method＞ Next, the manufacturing method of the film of this invention is demonstrated. The film of the present invention can be produced by applying the resin composition of the present invention. It is preferable that the film manufacturing method further includes a step of forming a pattern (pixel). Examples of methods for forming patterns (pixels) include photolithography and dry etching, with photolithography being preferred.

Pattern formation using photolithography preferably includes the following steps: forming a resin composition layer on a support using the resin composition of the present invention; exposing the resin composition layer in a pattern; and developing and removing it. The step of forming patterns (pixels) on the unexposed portions of the resin composition layer. If necessary, a step of baking the resin composition layer (pre-baking step) and a step of baking the developed pattern (pixel) (post-baking step) may be provided.

In the step of forming the resin composition layer, the resin composition layer of the present invention is used to form the resin composition layer on the support. The support is not particularly limited and can be appropriately selected depending on the use. For example, a glass substrate, a silicon substrate, etc. are mentioned, and a silicon substrate is preferable. In addition, a charge coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a transparent conductive film, etc. may also be formed on the silicon substrate. In addition, a black matrix is sometimes formed on the silicon substrate to isolate each pixel. Furthermore, the silicon substrate may be provided with a base layer for improving adhesion with the upper layer, preventing diffusion of substances, or flattening the surface of the substrate. The surface contact angle of the base layer is preferably 20 to 70° when measured with diiodomethane. In addition, when measuring with water, 30 to 80° is preferred.

As a coating method of the resin composition, a known method can be used. For example, dropping method (drip casting); slit coating method; spray method; roll coating method; spin coating method (spin coating); cast coating method; slit spin coating method; prewet method (for example, Japan Methods described in Japanese Patent Application Laid-Open No. 2009-145395); inkjet (for example, drop-on-demand method, piezoelectric method, thermal method), nozzle jet and other ejection system printing, flexographic printing, screen printing, gravure printing, reverse offset printing Various printing methods such as transfer printing and metal mask printing; transfer printing methods using molds, etc.; nanoimprinting methods, etc. There are no particular limitations on the application method for inkjet. For example, "Expansion and Usage of Inkjet - Infinite Possibilities Appeared in Patents -", published in February 2005, Sumitbe Techon Research Co., Ltd. method (especially pages 115 to 133) or Japanese Patent Application Publication No. 2003-262716, Japanese Patent Application Publication No. 2003-185831, Japanese Patent Application Publication No. 2003-261827, Japanese Patent Application Publication No. 2012-126830, Japan The method described in Japanese Patent Application Publication No. 2006-169325, etc. In addition, regarding the coating method of the resin composition, you can refer to the descriptions of International Publication No. 2017/030174 and International Publication No. 2017/018419, and these contents are incorporated into this description.

The resin composition layer formed on the support may be dried (prebaked). When the film is manufactured by a low-temperature process, pre-baking is not required. When prebaking is performed, the prebaking temperature is preferably 150°C or lower, more preferably 120°C or lower, and further preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, or 80°C or higher. The prebaking time is preferably 10 to 300 seconds, more preferably 40 to 250 seconds, and further preferably 80 to 220 seconds. Prebaking can be performed using a heating plate, oven, etc.

Next, the resin composition layer is exposed in a pattern (exposure step). For example, the resin composition layer can be exposed in a pattern by using a stepper exposure machine, a scanning exposure machine, etc. through a mask having a predetermined mask pattern. Thereby, the exposed portion can be hardened.

Examples of radiation (light) that can be used during exposure include g-rays, i-rays, and the like. In addition, light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light having a wavelength of 300 nm or less include KrF rays (wavelength: 248 nm), ArF rays (wavelength: 193 nm), and KrF rays (wavelength: 248 nm) are preferred. In addition, a long-wavelength light source of 300 nm or more can also be used. As a light source, it is possible to use electrodeless UV lamp systems, mixed curing of UV and infrared rays.

In addition, during exposure, light may be continuously irradiated for exposure, or pulse irradiation may be performed for exposure (pulse exposure). In addition, pulse exposure refers to an exposure method in which light is irradiated and paused repeatedly to perform exposure in a short period of time (for example, milliseconds or less).

For example, the irradiation amount (exposure amount) is preferably 0.03 to 2.5 J/cm ² , and more preferably 0.05 to 1.0 J/cm ² . The oxygen concentration during exposure can be appropriately selected. In addition to being performed in the atmosphere, for example, it can also be performed in a low-oxygen environment with an oxygen concentration of 19 volume % or less (for example, 15 volume %, 5 volume %, or substantially no oxygen). Exposure can also be carried out in a high oxygen environment with an oxygen concentration exceeding 21 volume % (for example, 22 volume %, 30 volume % or 50 volume %). In addition, the exposure illuminance can be appropriately set, and can usually be selected from the range of 1000W/m ² to 100000W/m ² (for example, 5000W/m ² , 15000W/m ² or 35000W/m ² ). The conditions of oxygen concentration and exposure illuminance can be combined appropriately. For example, the oxygen concentration can be 10 volume % and the illuminance is 10000 W/m ² , the oxygen concentration can be 35 volume % and the illuminance is 20000 W/m ² , etc.

Next, the unexposed portion of the resin composition layer is removed by development to form a pattern (pixel). The unexposed portion of the resin composition layer can be removed by development using a developing solution. Thereby, the resin composition layer in the unexposed portion in the exposure step is dissolved into the developer, leaving only the photohardened portion. For example, the temperature of the developer is preferably 20 to 30°C. The development time is preferably 20 to 180 seconds. In addition, in order to improve the residue removal performance, the step of shaking off the developer every 60 seconds and supplying new developer may be repeated several times.

Examples of the developer include organic solvents, alkali developers, and the like, and an alkali developer is preferably used. As an alkali developer, an alkaline aqueous solution (alkali developer) obtained by diluting an alkali agent with pure water is preferred. Examples of the alkaline agent include ammonia, ethylamine, diethylamine, dimethylethanolamine, diethylene glycolamine, diethanolamine, hydroxylamine, ethylenediamine, tetramethylammonium hydroxide, and tetraethyl hydroxide. Ammonium, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, bile Alkali, pyrrole, piperidine, 1,8-diazabicyclo-[5.4.0]-7-undecene and other organic basic compounds or sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, silicon Inorganic alkaline compounds such as sodium silicate and sodium metasilicate. From an environmental and safety perspective, it is better for the alkaline agent to be a compound with a large molecular weight. The concentration of the alkali agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, and more preferably 0.01 to 1% by mass. Moreover, the developer may further contain a surfactant. From the viewpoint of ease of transportation or storage, the developer can be first produced as a concentrated solution and then diluted to a desired concentration when used. The dilution ratio is not particularly limited, but can be set in the range of 1.5 to 100 times, for example. In addition, it is also preferable to wash (rinse) with pure water after development. Furthermore, it is preferable to perform rinsing by supplying a rinsing liquid to the developed resin composition layer while rotating the support on which the developed resin composition layer is formed. It is also preferable to move the nozzle that sprays the rinse liquid from the center of the support body to the peripheral edge of the support body. At this time, when moving the nozzle from the center part of the support body to the peripheral part, the moving speed of the nozzle may be gradually reduced while moving the nozzle. By performing flushing in this manner, in-plane unevenness of flushing can be suppressed. In addition, the same effect can also be obtained by gradually reducing the rotation speed of the support body while moving the nozzle from the center part of the support body to the peripheral part.

After development, it is preferable to perform additional exposure processing or heat processing (post-baking) after drying. The additional exposure process or post-baking is a hardening process after development for complete hardening. The heating temperature in post-baking is, for example, preferably 100 to 240°C, more preferably 200 to 240°C. In order to achieve the above conditions, heating methods such as heating plates, convection ovens (hot air circulation dryers), and high-frequency heating machines can be used to post-bake the developed film in a continuous or intermittent manner. When performing additional exposure processing, it is preferable that the light used for exposure is light with a wavelength of 400 nm or less. In addition, the additional exposure process can be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

Pattern formation by dry etching preferably includes the following steps: forming a resin composition layer on a support using the resin composition of the present invention, and solidifying the entire resin composition layer to form a hardened material layer; The steps of forming a photoresist layer on the hardened material layer; the steps of exposing the photoresist layer in a pattern and then developing it to form a resist pattern; and using the resist pattern as a mask to use etching gas to etch the hardened material. The step of dry etching the layer. When forming the photoresist layer, it is better to further perform a pre-baking process. In particular, as the formation process of the photoresist layer, it is desirable to perform heat treatment after exposure and heat treatment after development (post-baking treatment). Regarding the formation of patterns by dry etching, please refer to paragraphs 0010 to 0067 of Japanese Patent Application Laid-Open No. 2013-064993, which content is incorporated into this specification.

＜Optical filter＞ The optical filter of the present invention has the above-mentioned film of the present invention. Examples of types of optical filters include color filters, near-infrared cutoff filters, near-infrared transmission filters, and the like, with color filters being preferred. It is preferable that the color filter has the film of the present invention as its pixel, and it is more preferable that it has the film of the present invention as the colored pixel.

In the optical filter, the film thickness of the film of the present invention can be appropriately adjusted depending on the purpose. The film thickness is preferably 20 μm or less, more preferably 10 μm or less, and further preferably 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more, and still more preferably 0.3 μm or more.

The width of the pixels included in the filter is preferably 0.4 to 10.0 μm. The lower limit is preferably 0.4 μm or more, more preferably 0.5 μm or more, and still more preferably 0.6 μm or more. The upper limit is preferably 5.0 μm or less, more preferably 2.0 μm or less, further preferably 1.0 μm or less, and still more preferably 0.8 μm. In addition, the Young's modulus of the pixel is preferably 0.5 to 20 GPa, and more preferably 2.5 to 15 GPa.

It is preferred that each pixel included in the filter has high flatness. Specifically, the surface roughness Ra of the pixel is preferably 100 nm or less, more preferably 40 nm or less, and further preferably 15 nm or less. There is no lower limit, but for example, 0.1 nm or more is preferred. The surface roughness of a pixel can be measured using AFM (Atomic Force Microscope) Dimension 3100 manufactured by Veeco Instruments Inc., for example. In addition, the contact angle of water on the pixel can be appropriately set to a preferable value, but is typically in the range of 50 to 110°. The contact angle can be measured, for example, using a contact angle meter CV-DT・A type (manufactured by Kyowa Interface Science Co., Ltd.). In addition, it is preferable that the volume resistance value of the pixel is high. Specifically, the volume resistance value of the pixel is preferably 10 ⁹ Ω·cm or more, and more preferably 10 ¹¹ Ω·cm or more. There is no upper limit, but for example, it is preferably 10 ¹⁴ Ω·cm or less. The volume resistance value of the pixel can be measured using ultra-high resistance meter 5410 (manufactured by Advantest Corporation).

In the optical filter, a protective layer may be provided on the surface of the film of the present invention. By providing a protective layer, various functions can be provided, such as blocking oxygen oxidation, making it low-reflective, making it hydrophilic/hydrophobic, and blocking light of specific wavelengths (ultraviolet, near-infrared, etc.). The thickness of the protective layer is preferably 0.01 to 10 μm, and more preferably 0.1 to 5 μm. Examples of methods for forming the protective layer include a method of applying a protective layer-forming composition, a chemical vapor deposition method, a method of attaching a molded resin with an adhesive, and the like. Examples of components constituting the protective layer include (meth)acrylic resin, ene-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polystyrene resin, polyetherstyrene resin, and polyphenylene resin. Polyarylene ether phosphine oxide resin, polyimide resin, polyamide imide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, polyol resin, polyvinylidene chloride resin , melamine resin, urethane resin, polyarylamine resin, polyamide resin, alkyd resin, epoxy resin, modified polysiloxane resin, fluorine resin, polycarbonate resin, polyacrylonitrile resin, cellulose resin , Si, C, W, Al ₂ O ₃ , Mo, SiO ₂ , Si ₂ N ₄ , etc., and may contain two or more of these components. For example, in the case of a protective layer with the purpose of blocking oxygen oxidation, it is preferable that the protective layer contains polyol resin, SiO ₂ and Si ₂ N ₄ . Moreover, in the case of a protective layer for the purpose of low reflection, it is preferable that the protective layer contains (meth)acrylic resin and fluororesin.

If necessary, the protective layer may contain organic/inorganic particles, absorbers for specific wavelengths of light (for example, ultraviolet, near-infrared, etc.), refractive index adjusters, antioxidants, adhesives, surfactants and other additives. Examples of organic/inorganic fine particles include polymer fine particles (for example, polysilicone resin fine particles, polystyrene fine particles, melamine resin fine particles), titanium oxide, zinc oxide, zirconium oxide, indium oxide, aluminum oxide, Titanium nitride, titanium oxynitride, magnesium fluoride, hollow silicon dioxide, silicon dioxide, calcium carbonate, barium sulfate, etc. As an absorber for light of a specific wavelength, a known absorber can be used. The content of these additives can be appropriately adjusted, but relative to the total mass of the protective layer, 0.1 to 70 mass % is more preferred, and 1 to 60 mass % is further more preferred.

In addition, as the protective layer, the protective layer described in paragraphs 0073 to 0092 of Japanese Patent Application Laid-Open No. 2017-151176 can also be used.

The optical filter may have a structure in which each pixel is embedded in a space divided by partition walls into, for example, a grid shape.

＜Solid-state imaging device＞ The solid-state imaging element of the present invention has the above-mentioned film of the present invention. The structure of the solid-state imaging element is not particularly limited as long as it functions as a solid-state imaging element. For example, the following structures can be cited.

A solid-state imaging device has a structure in which a plurality of photodiodes constituting the light-receiving area of a solid-state imaging device (CCD (Charge Coupled Device) image sensor, CMOS (Complementary Metal Oxide Semiconductor) image sensor, etc.) are provided on a substrate. The transmission electrode is composed of silicon and polysilicon, and has a light-shielding film on the photodiode and the transmission electrode with only the light-receiving part of the photodiode opening. The light-shielding film has a light-shielding film formed in such a manner as to cover the entire light-shielding film and the light-receiving part of the photodiode. The element protective film composed of silicon nitride, etc. has a color filter on the element protective film. Furthermore, a structure in which a light condensing mechanism (for example, a microlens, etc.; the same applies to the following) is provided on the element protective film and below the color filter (closer to the substrate side) or a structure in which a light condensing mechanism is provided on the color filter may be used. wait. Furthermore, the color filter may have a structure in which each pixel is embedded in a space divided by partition walls into, for example, a grid shape. At this time, it is preferable that the refractive index of the partition wall is lower than that of each colored pixel. Examples of imaging devices having such a structure include devices described in Japanese Patent Application Publication No. 2012-227478, Japanese Patent Application Publication No. 2014-179577, and International Publication No. 2018/043654. Furthermore, as shown in Japanese Patent Application Publication No. 2019-211559, an ultraviolet absorbing layer can be provided in the structure of the solid-state imaging element to improve light resistance. The imaging device equipped with the solid-state imaging element of the present invention can be used not only as a digital camera or an electronic device (mobile phone, etc.) with imaging functions, but also as a driving recorder or a surveillance camera.

<Image display device> The image display device of the present invention has the film of the present invention described above. Examples of image display devices include liquid crystal display devices, organic electroluminescence display devices, and the like. The definition of an image display device and the details of each image display device are described in, for example, "Electronic Display Devices (by Akio Sasaki, published by Kogyo Chosakai Publishing Co., Ltd., 1990)" and "Display Devices (Jun Ibuki)" Chapter book, Sangyo Tosho Publishing Co., Ltd., released in 1989)" and so on. Further, the liquid crystal display device is described in, for example, "Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, published by Kogyo Chosakai Publishing Co., Ltd., 1994)". The liquid crystal display device to which the present invention can be applied is not particularly limited. For example, it can be applied to various types of liquid crystal display devices described in the above-mentioned "Next Generation Liquid Crystal Display Technology". [Example]

Hereinafter, an Example is given and this invention is demonstrated more concretely. The materials, usage amounts, proportions, treatment contents, treatment procedures, etc. shown in the following examples can be appropriately changed as long as they do not deviate from the gist of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. Moreover, in the structural formula shown below, Me is a methyl group, Et is an ethyl group, and Ph is a phenyl group.

<Measurement conditions of weight average molecular weight and number average molecular weight using gel permeation chromatography> Type of column: Column formed by connecting TOSOH TSKgel Super HZM-H, TOSOH TSKgel Super HZ4000 and TOSOH TSKgel Super HZ2000 Development solvent: tetrahydrofuran Tube string temperature: 40℃ Flow rate (sample injection volume): 1.0 μL (sample concentration: 0.1 mass%) Device name: HLC-8220GPC manufactured by Tosoh Corporation Detector: RI (Refractive Index) Detector Calibration curve base resin: polystyrene resin

＜Measurement method of crystallite size＞ As a measuring device, a sample horizontal rotating counter-cathode multi-purpose X-ray diffraction device RINT-TTRIII manufactured by Rigaku Corporation was used at a diffraction angle of 2θ=5° to 55°, a voltage of 50kV, a current of 300mA, and a scanning speed of 4°/min. The powder X-ray diffraction spectrum was measured under the conditions of step interval 0.1 and slit (scattering 0.05mm, divergence 10mm, light receiving 0.15mm). In the obtained powder X-ray diffraction spectrum, fit the peak with the largest diffraction intensity to the Lorentz function [y=A/(1+((x-x0)/w)2)+h], and find The full width at half maximum of the same peak is obtained. Here, y is the intensity, A is the peak height, x is 2θ, x0 is the peak position, w is the peak width (half width at half maximum), and h is the baseline.

<Preparation of dispersion (resin composition)> (Recipe 1) Using a bead mill (zirconia beads with a diameter of 0.1 mm), a total of 15.6 parts by mass of pigments and pigment derivatives were converted into 3.9 in terms of solid content. A mixture of 80.5 parts by mass of resin and 80.5 parts by mass of solvent was mixed and dispersed for 3 hours. Next, a high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.) was used to perform dispersion processing at a pressure of 2000 kg/cm ² and a flow rate of 500 g/min. This dispersion process was repeated a total of 10 times to obtain a dispersion liquid. In addition, the pigments, pigment derivatives, resins, and solvents were each used as shown in the following table. In addition, the mixing ratio of the pigment in the following table is a value calculated in terms of solid content.

(Recipe 2) A mixture of a total of 13 parts by mass of pigments and pigment derivatives, 7.8 parts by mass of resin, and 150 parts by mass of solvent was mixed with a bead mill (zirconia beads with a diameter of 0.3 mm), and dispersed for 5 seconds using a paint stirrer. hours. After that, the beads were separated with a filter to obtain a dispersion. In addition, the pigments, pigment derivatives, resins, and solvents were each used as shown in the following table. In addition, the mixing ratio of the pigment in the following table is a value calculated in terms of solid content.

[Table 1] formula Pigments Pigment derivatives Pigment derivatives/pigment (mass ratio) Resin Solvent Kind Kind Crystallite size (nm) Kind Kind Example 1 Dispersion 1 1 PR254 DPP-1 26 1/10 D-1 S-1 Example 2 Dispersion 2 1 PR272 DPP-2 twenty two 1/10 D-1 S-1 Example 3 Dispersion 3 1 PR254 DPP-3 twenty three 1/10 D-2 S-1 Example 4 Dispersion 4 1 PR254 DPP-4 19 1/10 D-1 S-1 Example 5 Dispersion 5 1 PR254 DPP-5 25 1/10 D-2 S-1 Example 6 Dispersion 6 1 PR254 DPP-6 27 1/10 D-3 S-1 Example 7 Dispersion 7 1 PR254 DPP-7 twenty three 1/10 D-4 S-1 Example 8 Dispersion 8 1 PR254 DPP-8 twenty two 1/10 D-1 S-1 Example 9 Dispersion 9 1 PR254 DPP-9 twenty four 1/10 D-1 S-1 Example 10 Dispersion 10 1 PR272 DPP-10 28 1/10 D-1 S-1 Example 11 Dispersion 11 1 PR272 DPP-11 26 1/10 D-1 S-1 Example 12 Dispersion 12 1 PR272 DPP-12 29 1/10 D-1 S-1 Example 13 Dispersion 13 1 PR272 DPP-13 25 1/10 D-1 S-1 Example 14 Dispersion 14 1 PR272 DPP-14 twenty two 1/10 D-11 S-1 Example 15 Dispersion 15 1 PR272 DPP-15 twenty four 1/10 D-11 S-1 Example 16 Dispersion 16 1 PR272 DPP-16 twenty one 1/10 D-1 S-1 Example 17 Dispersion 17 1 PR272 DPP-17 18 1/10 D-11 S-1 Example 18 Dispersion 18 1 PR272 DPP-18 twenty one 1/10 D-11 S-1 Example 19 Dispersion 19 1 PR272 DPP-19 31 1/10 D-1 S-1 Example 20 Dispersion 20 1 PR272 DPP-20 twenty four 1/10 D-11 S-1 Example 21 Dispersion 21 1 PR272 DPP-21 26 1/10 D-1 S-1 Example 22 Dispersion 22 1 PR272 DPP-22 33 1/10 D-1 S-1 Example 23 Dispersion 23 1 PR272 DPP-23 31 1/10 D-1 S-1 Example 24 Dispersion 24 1 PR254 DPP-24 16 1/10 D-1 S-1 Example 25 Dispersion 25 1 PR254 DPP-25 twenty four 1/10 D-6 S-1 Example 26 Dispersion 26 1 PR254 DPP-26 twenty one 1/10 D-1 S-1 Example 27 Dispersion 27 1 PR272 DPP-27 twenty two 1/10 D-1 S-1 Example 28 Dispersion 28 1 PR272 DPP-28 38 1/10 D-8 S-1 Example 29 Dispersion 29 1 PR272 DPP-29 18 1/10 D-1 S-1 Example 30 Dispersion 30 1 PR272 DPP-30 19 1/10 D-1 S-1 Example 31 Dispersion 31 1 PR254 DPP-3 9 1/10 D-1 S-1 Example 32 Dispersion 32 1 PR272 DPP-14 7 1/10 D-1 S-1 Example 33 Dispersion 33 1 PR272 DPP-15 7 1/10 D-1 S-1 Example 34 Dispersion 34 1 PR272 DPP-18 8 1/10 D-1 S-1 Example 35 Dispersion 35 1 PR272 DPP-20 7 1/10 D-1 S-1 Example 36 Dispersion 36 1 PR254 DPP-3 9 1/12 D-2 S-1 Example 37 Dispersion 37 1 PR272 DPP-14 7 1/12 D-11 S-1 Example 38 Dispersion 38 1 PR272 DPP-15 7 1/12 D-11 S-1 Example 39 Dispersion 39 1 PR272 DPP-18 8 1/12 D-11 S-1 Example 40 Dispersion 40 1 PR272 DPP-20 7 1/12 D-11 S-1 Example 41 Dispersion 41 1 PR254 DPP-3 14 1/10 D-2 S-1 Example 42 Dispersion 42 1 PR272 DPP-14 12 1/10 D-11 S-1 Example 43 Dispersion 43 1 PR272 DPP-15 13 1/10 D-11 S-1 Example 44 Dispersion 44 1 PR272 DPP-18 13 1/10 D-11 S-1 Example 45 Dispersion 45 1 PR272 DPP-20 14 1/10 D-11 S-1

[Table 2] formula Pigments Pigment derivatives Pigment derivative/pigment (mass ratio) Resin Solvent Kind Kind Crystallite size (nm) Kind Kind Example 46 Dispersion 46 1 PY129 AZM-1 26 1/4 D-5 S-1 Example 47 Dispersion 47 1 PY129 AZM-2 18 1/4 D-5 S-1 Example 48 Dispersion 48 1 PY129 AZM-3 twenty one 1/4 D-5 S-1 Example 49 Dispersion 49 1 PY129 AZM-4 25 1/4 D-5 S-1 Example 50 Dispersion 50 1 PY129 AZM-5 twenty two 1/4 D-5 S-1 Example 51 Dispersion 51 1 PY129 AZM-6 25 1/4 D-5 S-1 Example 52 Dispersion 52 1 PY129 AZM-7 twenty three 1/4 D-5 S-1 Example 53 Dispersion 53 1 PY129 AZM-8 twenty three 1/4 D-5 S-1 Example 54 Dispersion 54 1 PY129 AZM-9 28 1/4 D-5 S-1 Example 55 Dispersion 55 1 PY129 AZM-10 25 1/4 D-5 S-1 Example 56 Dispersion 56 1 PY129 AZM-11 twenty two 1/4 D-5 S-1 Example 57 Dispersion 57 1 PY129 AZM-12 18 1/4 D-5 S-1 Example 58 Dispersion 58 1 PY129 AZM-13 25 1/4 D-5 S-1 Example 59 Dispersion 59 1 PY129 AZM-14 twenty four 1/4 D-5 S-1 Example 60 Dispersion 60 1 PY129 AZM-15 twenty two 1/4 D-5 S-1 Example 61 Dispersion 61 1 PY129 AZM-16 17 1/4 D-5 S-1 Example 62 Dispersion 62 1 PY129 AZM-17 16 1/4 D-5 S-1 Example 63 Dispersion 63 1 PY117 AZM-18 twenty four 1/4 D-6 S-1 Example 64 Dispersion 64 1 PY129 AZM-19 twenty one 1/4 D-6 S-1 Example 65 Dispersion 65 1 PY129 AZM-20 twenty three 1/4 D-5 S-1 Example 66 Dispersion 66 1 PY129 AZM-21 twenty three 1/4 D-5 S-1 Example 67 Dispersion 67 1 PY129 AZM-22 25 1/4 D-5 S-1 Example 68 Dispersion 68 1 PY129 AZM-23 19 1/4 D-5 S-1 Example 69 Dispersion 69 1 PY117 AZM-24 twenty four 1/4 D-5 S-1 Example 70 Dispersion 70 1 PY129 AZM-25 twenty three 1/4 D-5 S-1 Example 71 Dispersion 71 1 PY129 AZM-26 twenty three 1/4 D-5 S-1 Example 72 Dispersion 72 1 PY129 AZM-27 20 1/4 D-5 S-1 Example 73 Dispersion 73 1 PY129 AZM-28 twenty one 1/4 D-5 S-1 Example 74 Dispersion 74 1 PY129 AZM-29 26 1/4 D-5 S-1 Example 75 Dispersion 75 1 PY129 AZM-30 18 1/4 D-5 S-1 Example 76 Dispersion 76 1 PY129 AZM-31 19 1/4 D-5 S-1 Example 77 Dispersion 77 1 PY129 AZM-32 16 1/4 D-5 S-1 Example 78 Dispersion 78 1 PY129 AZM-33 17 1/4 D-5 S-1 Example 79 Dispersion 79 1 PY129 AZM-34 19 1/4 D-5 S-1 Example 80 Dispersion 80 1 PY129 AZM-35 twenty two 1/4 D-5 S-1 Example 81 Dispersion 81 1 PY129 AZM-36 25 1/4 D-5 S-1 Example 82 Dispersion 82 1 PY129 AZM-1 9 1/5 D-5 S-1 Example 83 Dispersion 83 1 PY129 AZM-3 10 1/5 D-5 S-1 Example 84 Dispersion 84 1 PY129 AZM-6 8 1/5 D-5 S-1 Example 85 Dispersion 85 1 PY129 AZM-12 9 1/5 D-5 S-1 Example 86 Dispersion 86 1 PY129 AZM-21 9 1/5 D-5 S-1 Example 87 Dispersion 87 1 PY129 AZM-30 8 1/5 D-5 S-1 Example 88 Dispersion 88 1 PY139 AZO-1 26 1/4 D-5 S-1 Example 89 Dispersion 89 1 PY139 AZO-2 twenty three 1/4 D-5 S-1 Example 90 Dispersion 90 1 PY139 AZO-1 13 1/4 D-5 S-1

[table 3] formula Pigments Pigment derivatives Pigment derivatives/pigment (mass ratio) Resin Solvent Kind Kind Crystallite size (nm) Kind Kind Example 91 Dispersion 91 1 PR254 TI-1 27 1/10 D-1 S-1 Example 92 Dispersion 92 1 PB15:6 PC-1 18 1/10 D-1 S-1 Example 93 Dispersion 93 2 PP-Pig-1 PP-1 17 1/6 D-6 S-1 Example 94 Dispersion 94 2 PP-Pig-1 PP-3 twenty one 1/6 D-6 S-1 Example 95 Dispersion 95 2 PP-Pig-1 PP-4 20 1/6 D-6 S-1 Example 96 Dispersion 96 2 PP-Pig-2 PP-2 47 1/6 D-6 S-1 Example 97 Dispersion 97 2 PP-Pig-2 PP-2 18 1/6 D-6 S-1 Example 98 Dispersion 98 2 PP-Pig-2 PP-6 34 1/6 D-6 S-1 Example 99 Dispersion 99 2 PP-Pig-2 PP-7 40 1/6 D-6 S-1 Example 100 Dispersion 100 2 PP-Pig-2 PP-7 19 1/6 D-6 S-1 Example 101 Dispersion 101 2 PP-Pig-2 PP-8 25 1/6 D-6 S-1 Example 102 Dispersion 102 2 PP-Pig-2 PP-10 19 1/6 D-6 S-1 Example 103 Dispersion 103 2 PP-Pig-2 PP-11 twenty one 1/6 D-6 S-1 Example 104 Dispersion 104 2 PP-Pig-2 PP-12 25 1/6 D-6 S-1 Example 105 Dispersion 105 2 PP-Pig-3 PP-5 twenty two 1/6 D-6 S-1 Example 106 Dispersion 106 2 PP-Pig-3 PP-9 twenty four 1/6 D-6 S-1 Example 107 Dispersion 107 2 PP-Pig-4 PP-2 47 1/6 D-6 S-1 Example 108 Dispersion 108 2 PP-Pig-4 PP-6 34 1/6 D-6 S-1 Example 109 Dispersion 109 2 PP-Pig-4 PP-7 40 1/6 D-6 S-1 Example 110 Dispersion 110 2 PP-Pig-4 PP-8 25 1/6 D-6 S-1 Example 111 Dispersion 111 2 PP-Pig-4 PP-10 19 1/6 D-6 S-1 Example 112 Dispersion 112 2 PP-Pig-4 PP-11 twenty one 1/6 D-6 S-1 Example 113 Dispersion 113 2 PP-Pig-4 PP-12 25 1/6 D-6 S-1 Example 114 Dispersion 114 2 PP-Pig-5 PP-5 twenty one 1/6 D-6 S-1 Example 115 Dispersion 115 2 PP-Pig-5 PP-13 17 1/6 D-6 S-1 Example 116 Dispersion 116 2 PP-Pig-5 PP-14 16 1/6 D-6 S-1 Example 117 Dispersion 117 2 PP-Pig-5 PP-18 25 1/6 D-6 S-1 Example 118 Dispersion 118 2 PP-Pig-5 PP-19 15 1/6 D-6 S-1 Example 119 Dispersion 119 2 PP-Pig-6 PP-5 twenty two 1/6 D-6 S-1 Example 120 Dispersion 120 2 PP-Pig-6 PP-13 17 1/6 D-6 S-1 Example 121 Dispersion 121 2 PP-Pig-6 PP-14 16 1/6 D-6 S-1 Example 122 Dispersion 122 2 PP-Pig-6 PP-18 25 1/6 D-6 S-1 Example 123 Dispersion 123 2 PP-Pig-6 PP-19 15 1/6 D-6 S-1 Example 124 Dispersion 124 2 PP-Pig-7 PP-5 twenty two 1/6 D-6 S-1 Example 125 Dispersion 125 2 PP-Pig-7 PP-13 17 1/6 D-6 S-1 Example 126 Dispersion 126 2 PP-Pig-7 PP-14 16 1/6 D-6 S-1 Example 127 Dispersion 127 2 PP-Pig-7 PP-18 25 1/6 D-6 S-1 Example 128 Dispersion 128 2 PP-Pig-7 PP-19 15 1/6 D-6 S-1 Example 129 Dispersion 129 2 PP-Pig-8 PP-9 twenty four 1/6 D-6 S-1 Example 130 Dispersion 130 2 PP-Pig-9 PP-20 16 1/6 D-6 S-1 Example 131 Dispersion 131 2 PP-Pig-10 PP-21 18 1/6 D-6 S-1 Example 132 Dispersion 132 2 PP-Pig-10 PP-22 twenty two 1/6 D-6 S-1 Example 133 Dispersion 133 2 PP-Pig-10 PP-22 10 1/6 D-6 S-1 Example 134 Dispersion 134 2 PP-Pig-10 PP-23 twenty two 1/6 D-6 S-1 Example 135 Dispersion 135 2 PP-Pig-11 PP-24 19 1/6 D-6 S-1

[Table 4] formula Pigments Pigment derivatives Pigment derivatives/pigment (mass ratio) Resin Solvent Kind Kind Crystallite size (nm) Kind Kind Example 136 Dispersion 136 2 PP-Pig-12 PP-27 17 1/6 D-6 S-1 Example 137 Dispersion 137 2 PP-Pig-13 PP-25 17 1/6 D-6 S-1 Example 138 Dispersion 138 2 PP-Pig-13 PP-26 20 1/6 D-6 S-1 Example 139 Dispersion 139 2 PP-Pig-13 PP-26 15 1/6 D-6 S-1 Example 140 Dispersion 140 2 PP-Pig-13 PP-26 10 1/6 D-6 S-1 Example 141 Dispersion 141 2 PP-Pig-14 PP-28 27 1/6 D-6 S-1 Example 142 Dispersion 142 2 PP-Pig-15 PP-29 twenty four 1/6 D-6 S-1 Example 143 Dispersion 143 2 PP-Pig-16 PP-13 17 1/6 D-6 S-1 Example 144 Dispersion 144 2 PP-Pig-16 PP-14 16 1/6 D-6 S-1 Example 145 Dispersion 145 2 PP-Pig-16 PP-15 18 1/6 D-6 S-1 Example 146 Dispersion 146 2 PP-Pig-16 PP-16 twenty two 1/6 D-6 S-1 Example 147 Dispersion 147 2 PP-Pig-16 PP-17 twenty three 1/6 D-6 S-1 Example 148 Dispersion 148 2 PP-Pig-16 PP-18 25 1/6 D-6 S-1 Example 149 Dispersion 149 2 PP-Pig-16 PP-19 15 1/6 D-6 S-1 Example 150 Dispersion 150 2 PP-Pig-17 PP-13 17 1/6 D-6 S-1 Example 151 Dispersion 151 2 PP-Pig-17 PP-14 16 1/6 D-6 S-1 Example 152 Dispersion 152 2 PP-Pig-18 PP-14 16 1/6 D-6 S-1 Example 153 Dispersion 153 2 PP-Pig-18 PP-15 18 1/6 D-6 S-1 Example 154 Dispersion 154 2 PP-Pig-18 PP-16 twenty two 1/6 D-6 S-1 Example 155 Dispersion 155 2 PP-Pig-18 PP-17 twenty three 1/6 D-6 S-1 Example 156 Dispersion 156 2 PP-Pig-18 PP-18 25 1/6 D-6 S-1 Example 157 Dispersion 157 2 PP-Pig-18 PP-19 15 1/6 D-6 S-1 Example 158 Dispersion 158 2 PP-Pig-19 PP-13 17 1/6 D-6 S-1 Example 159 Dispersion 159 2 PP-Pig-19 PP-14 16 1/6 D-6 S-1 Example 160 Dispersion 160 2 PP-Pig-20 PP-13 17 1/6 D-6 S-1 Example 161 Dispersion 161 2 PP-Pig-20 PP-14 16 1/6 D-6 S-1 Example 162 Dispersion 162 2 PP-Pig-21 PP-13 17 1/6 D-6 S-1 Example 163 Dispersion 163 2 PP-Pig-21 PP-14 16 1/6 D-6 S-1 Example 164 Dispersion 164 2 PP-Pig-22 PP-14 16 1/6 D-6 S-1 Example 165 Dispersion 165 2 PP-Pig-22 PP-15 18 1/6 D-6 S-1 Example 166 Dispersion 166 2 PP-Pig-22 PP-16 twenty two 1/6 D-6 S-1 Example 167 Dispersion 167 2 PP-Pig-22 PP-17 twenty three 1/6 D-6 S-1 Example 168 Dispersion 168 2 PP-Pig-22 PP-18 25 1/6 D-6 S-1 Example 169 Dispersion 169 2 PP-Pig-22 PP-19 15 1/6 D-6 S-1 Example 170 Dispersion 170 1 PB15:6 TAZ-1 17 1/10 D-1 S-1 Example 171 Dispersion 171 1 PY138 QP-1 17 1/10 D-7 S-1 Example 172 Dispersion 172 1 PY138 QP-2 twenty two 1/10 D-9 S-1 Example 173 Dispersion 173 1 PY185 IIN-1 28 1/10 D-10 S-1 Example 174 Dispersion 174 1 PY139 IIN-2 twenty three 1/10 D-10 S-1 Example 175 Dispersion 175 1 PY185 IIN-3 26 1/10 D-10 S-1 Example 176 Dispersion 176 1 PR177 ATQ-1 28 1/10 D-1 S-1 Example 177 Dispersion 177 1 PR177 ATQ-2 25 1/10 D-1 S-1 Example 178 Dispersion 178 1 PR177 ATQ-3 28 1/10 D-1 S-1 Example 179 Dispersion 179 1 PR254 BZI-1 28 1/10 D-1 S-1 Example 180 Dispersion 180 1 PV19 QCD-1 27 1/10 D-6 S-1

[table 5] formula Pigments Pigment derivatives Pigment derivatives/pigment (mass ratio) Resin Solvent Kind Kind Crystallite size (nm) Kind Kind Example 181 Dispersion 181 1 PV23 DOZ-1 34 1/5 D-6 S-1 Example 182 Dispersion 182 1 PR254/ PR272 (1/1) DPP-3 9 1/12 D-2 S-1 Example 183 Dispersion 183 1 PR254/ PR272 (1/1) DPP-14 7 1/12 D-11 S-1 Example 184 Dispersion 184 1 PR254/ PR272 (1/1) DPP-15 7 1/12 D-11 S-1 Example 185 Dispersion 185 1 PR254/ PR272 (1/1) DPP-18 8 1/12 D-11 S-1 Example 186 Dispersion 186 1 PR254/ PR272 (1/1) DPP-20 7 1/12 D-11 S-1 Example 187 Dispersion 187 1 PR272 DPP-14/ DPP-20 (1/1) 7/7 1/12 D-2 S-1 Example 188 Dispersion 188 1 PR254 DPP-3/AZO-1 (1/10) 7/26 2/13 D-11 S-1 Example 189 Dispersion 189 1 PR272 DPP-14/AZO-1 (1/12) 7/26 2/13 D-11 S-1 Example 190 Dispersion 190 1 PR272 DPP-15/AZO-1 (1/13) 8/26 2/13 D-11 S-1 Example 191 Dispersion 191 1 PR272 DPP-18/AZO-1 (1/14) 7/13 2/13 D-11 S-1 Example 192 Dispersion 192 1 PR272 DPP-20/AZO-1 (1/15) 7/13 2/13 D-11 S-1 Example 193 Dispersion 193 1 PR272 DPP-14/ DPP-20 (1/1) 7/7 1/12 D-2 S-1 Example 194 Dispersion 194 1 PR254 DPP-3/AZO-2 (1/10) 7/23 2/13 D-11 S-1 Example 195 Dispersion 195 1 PR272 DPP/14/AZO-2 (1/12) 7/23 2/13 D-11 S-1

[Table 6] formula Pigments Pigment derivatives Pigment derivative/pigment (mass ratio) Resin Solvent Kind Kind Crystallite size (nm) Kind Kind Example 196 Dispersion 196 1 PR272 DPP-15/AZO-2 (1/13) 8/23 2/13 D-11 S-1 Example 197 Dispersion 197 1 PR272 DPP-18/AZO-2 (1/14) 7/23 2/13 D-11 S-1 Example 198 Dispersion 198 1 PR272 DPP-20/AZO-2 (1/15) 7/23 2/13 D-11 S-1 Example 199 Dispersion 199 1 PR254 DPP-3/TAZ-1 (1/10) 7/17 2/13 D-11 S-1 Example 200 Dispersion 200 1 PR272 DPP-14/TAZ-1 (1/12) 7/17 2/13 D-11 S-1 Example 201 Dispersion 201 1 PR272 DPP-15/TAZ-1 (1/13) 8/17 2/13 D-11 S-1 Example 202 Dispersion 202 1 PR272 DPP-18/TAZ-1 (1/14) 7/17 2/13 D-11 S-1 Example 203 Dispersion 203 1 PR272 DPP-20/TAZ-1 (1/15) 7/17 2/13 D-11 S-1 Example 204 Dispersion 204 1 PR254/ PR272 (1/1) DPP-14/ DPP-20 (1/1) 7/7 1/12 D-2 S-1 Example 205 Dispersion 205 1 PR254/ PR272 (1/1) DPP-3/AZO-1 (1/10) 7/26 2/13 D-11 S-1 Example 206 Dispersion 206 1 PR254/ PR272 (1/1) DPP-14/AZO-1 (1/12) 7/26 2/13 D-11 S-1 Example 207 Dispersion 207 1 PR254/ PR272 (1/1) DPP-15/AZO-1 (1/13) 8/26 2/13 D-11 S-1 Example 208 Dispersion 208 1 PR254/ PR272 (1/1) DPP-18/AZO-1 (1/14) 7/13 2/13 D-11 S-1 Example 209 Dispersion 209 1 PR254/ PR272 (1/1) DPP-20/AZO-1 (1/15) 7/13 2/13 D-11 S-1 Example 210 Dispersion 210 1 PR254/ PR272 (1/1) DPP-15/ DPP-16 (1/1) 7/21 1/12 D-2 S-1

[Table 7] formula Pigments Pigment derivatives Pigment derivative/pigment (mass ratio) Resin Solvent Kind Kind Crystallite size (nm) Kind Kind Example 211 Dispersion 211 1 PR254/ PR272 (1/1) DPP-3/AZO-2 (1/10) 7/23 2/13 D-11 S-1 Example 212 Dispersion 212 1 PR254/ PR272 (1/1) DPP-14/AZO-2 (1/12) 7/23 2/13 D-11 S-1 Example 213 Dispersion 213 1 PR254/ PR272 (1/1) DPP-15/AZO-2 (1/13) 8/23 2/13 D-11 S-1 Example 214 Dispersion 214 1 PR254/ PR272 (1/1) DPP-18/AZO-2 (1/14) 7/23 2/13 D-11 S-1 Example 215 Dispersion 215 1 PR254/ PR272 (1/1) DPP-20/AZO-2 (1/15) 7/23 2/13 D-11 S-1 Example 216 Dispersion 216 1 PR254/ PR272 (1/1) DPP-3/TAZ-1 (1/10) 7/17 2/13 D-11 S-1 Example 217 Dispersion 217 1 PR254/ PR272 (1/1) DPP-14/TAZ-1 (1/12) 7/17 2/13 D-11 S-1 Example 218 Dispersion 218 1 PR254/ PR272 (1/1) DPP-15/TAZ-1 (1/13) 8/17 2/13 D-11 S-1 Example 219 Dispersion 219 1 PR254/ PR272 (1/1) DPP-18/TAZ-1 (1/14) 7/17 2/13 D-11 S-1 Example 220 Dispersion 220 1 PR254/ PR272 (1/1) DPP-20/TAZ-1 (1/15) 7/17 2/13 D-11 S-1 Comparative example 1 Dispersion C1 1 PV23 DOZ-1 55 1/5 D-6 S-1

Details of the raw materials described with abbreviations in the above table are as follows.

(Pigment) PR177: CI Pigment Red 177 (red pigment) PR254: CI Pigment Red 254 (red pigment) PR272: CI Pigment Red 272 (red pigment) PY117: CI Pigment Yellow 117 (yellow pigment) PY129: CI Pigment Yellow 129 ( Yellow pigment) PY138: CI Pigment Yellow 138 (yellow pigment) PY139: CI Pigment Yellow 139 (yellow pigment) PY185: CI Pigment Yellow 185 (yellow pigment) PB15:6: CI Pigment Blue Blue15:6 (blue pigment) PV19: CI Pigment Violet 19 (purple pigment) PV23: CI Pigment Violet 23 (purple pigment) PP-Pig-1 to PP-Pig-22: Compounds with the following structures (near-infrared absorbing pigments) [Chemical Formula 29] [Chemical formula 30] [Chemical Formula 31] [Chemical formula 32] [Chemical formula 33] [Chemical formula 34] [Chemical formula 35]

PP-Pig-1 to 8 were synthesized by the method of International Publication No. 2017-146092, and the particle size was refined by solvent salt milling. The synthesized PP-Pig-2 was subjected to solvent salt grinding, and the crystallite size of the particles obtained was 19 nm. Similarly, the crystallite size of PP-Pig-4 obtained by solvent salt milling was 18 nm. In addition, PP-Pig-9 to 15 were synthesized in the same manner as in International Publication No. 2017-146092. PP-Pig-9 obtained particles with a crystallite size of 32nm through synthesis, and obtained particles with a crystallite size of 20nm through solvent salt milling. PP-Pig-10 obtained particles with a crystallite size of 35nm through synthesis, and obtained particles with a crystallite size of 18nm through solvent salt milling. PP-Pig-11 obtained particles with a crystallite size of 30nm through synthesis, and obtained particles with a crystallite size of 17nm through solvent salt milling. PP-Pig-13 obtained particles with a crystallite size of 34nm through synthesis, and obtained particles with a crystallite size of 19nm through solvent salt milling. PP-Pig-16 to 22 are synthesized by the method of International Publication No. 2021-039205, and the particle size is refined by solvent salt milling. PP-Pig-16 obtained particles with a crystallite size of 12 nm through salt milling. PP-Pig-18 obtained particles with a crystallite size of 11 nm through salt milling. PP-Pig-19 obtained particles with a crystallite size of 13 nm through salt milling. PP-Pig-21 obtained particles with a crystallite size of 11 nm through salt milling.

(Pigment derivatives) DPP-1 to DPP-30: Compounds with the following structure (pigment derivatives having a diketopyrrolopyrrole structure) [Chemical Formula 36] [Chemical formula 37] [Chemical formula 38] [Chemical formula 39]

PP-1～PP-29: Compounds with the following structure (pigment derivatives having a pyrrolopyrrole structure) [Chemical Formula 40] [Chemical formula 41] [Chemical formula 42] [Chemical formula 43] [Chemical formula 44]

AZM-1～AZM-36: Compounds with the following structure (pigment derivatives with a formimine structure) [Chemical Formula 45] [Chemical formula 46] [Chemical formula 47] [Chemical formula 48]

IIN-1～IIN-3: Compounds with the following structure (pigment derivatives with isoindoline structure) [Chemical Formula 49]

QP-1, QP-2: Compounds with the following structure (pigment derivatives with quinoline yellow structure) [Chemical Formula 50]

AZO-1, AZO-2: Compounds with the following structure (pigment derivatives with azo structure) [Chemical Formula 51]

ATQ-1～ATQ-3: Compounds with the following structure (pigment derivatives with anthraquinone structure) [Chemical Formula 52]

TI-1: Compound with the following structure (pigment derivative with thiolindigo structure) [Chemical Formula 53]

QCD-1: Compound with the following structure (pigment derivative with quinacridone structure) [Chemical Formula 54]

BZI-1: Compound with the following structure (pigment derivative with benzindole structure) [Chemical Formula 55]

PC-1: Compound with the following structure (pigment derivative with phthalocyanine structure) [Chemical Formula 56]

DOZ-1: Compound with the following structure (pigment derivative with a di-㗁𠯤 structure) [Chemical Formula 57]

TAZ-1: Compound with the following structure (pigment derivative with tri-𠯤 structure) [Chemical Formula 58]

(Resin) D-1: Resin D-1 synthesized by the following method: 50 parts by mass of methyl methacrylate, 30 parts by mass of n-butyl methacrylate, 20 parts by mass of tertiary butyl methacrylate, propylene glycol mono 45.4 parts by mass of methyl ether acetate (PGMEA) was put into the reaction vessel, and the ambient gas was replaced with nitrogen. The inside of the reaction vessel was heated to 70° C., 6 parts by mass of 3-mercapto-1,2-propanediol was added, and 0.12 parts by mass of AIBN (azobisisobutyronitrile) was added, and the reaction was carried out for 12 hours. By measuring the solid content, it was confirmed that 95% of the reaction was completed. Next, 9.7 parts by mass of pyromellitic anhydride, 70.3 parts by mass of PGMEA, and 0.20 parts by mass of DBU (1,8-diazabicyclo-[5.4.0]-7-undecene) as a catalyst were added. The reaction was carried out at 120°C for 7 hours. By measuring the acid value, it was confirmed that more than 98% of the acid anhydride was half-esterified, and the reaction was completed to obtain resin D-1 of the following structure with an acid value of 43 mgKOH/g and a weight average molecular weight (Mw) of 9000. . [Chemical formula 59]

D-2: Resin D-2 synthesized by the following method: 6.0 parts by mass of 3-mercapto-1,2-propanediol, 9.5 parts by mass of pyromellitic anhydride, 62 parts by mass of PGMEA, 1,8-diazabicyclo- 0.2 mass parts of [5.4.0]-7-undecene was put into the reaction vessel, and the ambient gas was replaced with nitrogen. The inside of the reaction vessel was heated to 100°C and the reaction was carried out for 7 hours. After confirming that more than 98% of the acid anhydride was half-esterified by measuring the acid value, the temperature in the system was cooled to 70°C, and 65 parts by mass of methyl methacrylate, 5.0 parts by mass of ethyl acrylate, and triacrylate were added. 15 parts by mass of grade butyl ester, 5.0 parts by mass of methacrylic acid, 10 parts by mass of hydroxyethyl methacrylate, and 53.5 parts by mass of PGMEA solution in which 0.1 part by mass of 2,2'-azobisisobutyronitrile was dissolved 10 hours. It was confirmed by solid content measurement that 95% of the polymerization had progressed, and the reaction was completed to obtain resin D-2 with the following structure having an acid value of 70.5 mgKOH/g and a weight average molecular weight (Mw) of 10,000. [Chemical formula 60]

D-3: Resin D-3 synthesized by the following method. In the synthesis of resin D-1, 20 parts by mass of tertiary butyl methacrylate was changed to methacrylic acid (3-ethyloxetane- Resin D-3 having the following structure with an acid value of 43 mgKOH/g and a weight average molecular weight (Mw) of 9000 was obtained in the same manner except that 20 parts by mass of 3-yl) methyl ester was added. [Chemical formula 61]

D-4: Resin D-4 synthesized by the following method: 108 parts by mass of 1-thioglycerol, 174 parts by mass of pyromellitic anhydride, and 650 parts by mass of methoxypropyl acetate as a catalyst 0.2 parts by mass of monobutyltin oxide was put into the reaction vessel, and the ambient gas was replaced with nitrogen, and then the reaction was carried out at 120° C. for 5 hours (first step). By measuring the acid value, it was confirmed that more than 95% of the acid anhydride was half-esterified. Next, 160 parts by mass of the compound obtained in the first step in terms of solid content, 200 parts by mass of 2-hydroxypropyl methacrylate, 200 parts by mass of ethyl acrylate, 150 parts by mass of tertiary butyl acrylate, 2 -Put 200 parts by mass of ethyl methoxyacrylate, 200 parts by mass of methyl acrylate, 50 parts by mass of methacrylic acid, and 663 parts by mass of PGMEA into a reaction vessel, heat the reaction vessel to 80°C, and add 2,2' - 1.2 parts by mass of azobis(2,4-dimethylvaleronitrile) and reacted for 12 hours (second step). By measuring the solid content, it was confirmed that 95% of the reaction was completed. Finally, 500 parts by mass of the 50% by mass PGMEA solution of the compound obtained in the second step, 27.0 parts by mass of 2-methacryloyloxyethyl isocyanate (MOI), and 0.1 part by mass of hydroquinone were loaded The reaction was carried out in the reaction vessel until it was confirmed that the peak at 2270 cm ^-1 based on the isocyanate group disappeared (the third step). After confirming that the peak disappeared, the reaction solution was cooled to obtain resin D-4 with the following structure having an acid value of 68 mgKOH/g, an ethylenically unsaturated bond value of 0.62 mmol/g, and a weight average molecular weight (Mw) of 13,000. [Chemical formula 62]

D-5: Resin with the following structure (the value marked on the main chain is the molar ratio, and the value marked on the side chain is the number of repeating units. Weight average molecular weight 16000, acid value 67 mgKOH/g) [Chemical Formula 63]

D-6: Resin with the following structure (the value marked on the main chain is the molar ratio, and the value marked on the side chain is the number of repeating units. Weight average molecular weight 20000, acid value 36 mgKOH/g) [Chemical Formula 64]

D-7: DISPERBYK-111 (manufactured by BYK-Chemie GmbH, acidic dispersant) D-8: BYK LPN-21116 (manufactured by BYK-Chemie GmbH, alkaline dispersant) D-9: Solsperse 20000 (manufactured by Lubrizol Japan Ltd., alkaline dispersant) D-10: AJISPER PB821 (manufactured by Ajinomoto Fine-Techno Co., Inc., alkaline dispersant)

D-11: Resin with the following structure (the value marked on the main chain is the molar ratio, and the value marked on the side chain is the number of repeating units. Weight average molecular weight 18000, acid value 82.1 mgKOH/g) [Chemical Formula 65]

(solvent) S-1: Propylene glycol monomethyl ether acetate (PGMEA)

＜Evaluation of dispersion liquid＞ (coarse particles) On the glass substrate, the dispersion immediately after production and the dispersion stored at 45°C for 72 hours were applied using a spin coater so that the thickness after heating would be 0.25 μm, and heated at 85°C for 2 minutes using a hot plate. to form a film. This film was observed in five fields of view using an optical microscope (magnification: 200 times), the number of coarse particles having a maximum width of 0.3 μm or more was counted, and the coarse particles were evaluated according to the following evaluation criteria. The evaluation results when using the dispersion liquid immediately after production are described in the initial column, and the evaluation results when using the dispersion liquid stored at 45° C. for 72 hours are described in the elapsed time column. A: The number of coarse particles is 20 or less B: The number of coarse particles exceeds 20 and is less than 40 C: The number of coarse particles exceeds 40 and is less than 100 D: The number of coarse particles exceeds 100

(Stability over time) The viscosity (mPa·s) of each dispersion immediately after production was measured using an E-type viscometer (RE-85L manufactured by Toki Sangyo Co., Ltd.). After the measurement, each dispersion liquid was left to stand at 45° C. for 3 days, and then the viscosity was measured again. The viscosity change rate of the dispersion liquid before and after standing was calculated, and the stability over time was evaluated based on the following evaluation criteria. It can be said that the smaller the value of the viscosity change rate, the better the stability over time. The above viscosity measurements were all performed in a laboratory where the temperature and humidity were controlled at 22±5°C and 60±20%, and the temperature of the dispersion was adjusted to 25°C. All determinations were performed three times and the average value was used. Viscosity change rate (%) = (|Viscosity of the dispersion after standing at 45°C for 3 days - Viscosity of the dispersion immediately after production | / Viscosity of the dispersion immediately after production) × 100 A: The viscosity change rate is less than 5% B: The viscosity change rate exceeds 5% and is less than 10% C: The viscosity change rate exceeds 10% and is less than 15% D: The viscosity change rate exceeds 15%

[Table 8] Dispersions Coarse particles Stability over time initial Over time Example 1 Dispersion 1 B B B Example 2 Dispersion 2 B B A Example 3 Dispersion 3 B B A Example 4 Dispersion 4 B B A Example 5 Dispersion 5 B B A Example 6 Dispersion 6 B B B Example 7 Dispersion 7 B B A Example 8 Dispersion 8 B B A Example 9 Dispersion 9 B B A Example 10 Dispersion 10 B B B Example 11 Dispersion 11 B B B Example 12 Dispersion 12 B B B Example 13 Dispersion 13 B B A Example 14 Dispersion 14 B B A Example 15 Dispersion 15 B B A Example 16 Dispersion 16 B B A Example 17 Dispersion 17 B B A Example 18 Dispersion 18 B B A Example 19 Dispersion 19 C C B Example 20 Dispersion 20 B B A Example 21 Dispersion 21 B B B Example 22 Dispersion 22 C C B Example 23 Dispersion 23 C C B Example 24 Dispersion 24 B B A Example 25 Dispersion 25 B B A Example 26 Dispersion 26 B B A Example 27 Dispersion 27 B B A Example 28 Dispersion 28 C C C Example 29 Dispersion 29 B B A Example 30 Dispersion 30 B B A Example 31 Dispersion 31 A A A Example 32 Dispersion 32 A A A Example 33 Dispersion 33 A A A Example 34 Dispersion 34 A A A Example 35 Dispersion 35 A A A Example 36 Dispersion 36 A A A Example 37 Dispersion 37 A A A Example 38 Dispersion 38 A A A Example 39 Dispersion 39 A A A Example 40 Dispersion 40 A A A

[Table 9] Dispersions Coarse particles Stability over time initial Over time Example 41 Dispersion 41 A B A Example 42 Dispersion 42 A B A Example 43 Dispersion 43 A B A Example 44 Dispersion 44 A B A Example 45 Dispersion 45 A B A Example 46 Dispersion 46 B B B Example 47 Dispersion 47 B B A Example 48 Dispersion 48 B B A Example 49 Dispersion 49 B B A Example 50 Dispersion 50 B B A Example 51 Dispersion 51 B B A Example 52 Dispersion 52 B B A Example 53 Dispersion 53 B B A Example 54 Dispersion 54 B B B Example 55 Dispersion 55 B B A Example 56 Dispersion 56 B B A Example 57 Dispersion 57 B B A Example 58 Dispersion 58 B B A Example 59 Dispersion 59 B B A Example 60 Dispersion 60 B B A Example 61 Dispersion 61 B B A Example 62 Dispersion 62 B B A Example 63 Dispersion 63 B B A Example 64 Dispersion 64 B B A Example 65 Dispersion 65 B B A Example 66 Dispersion 66 B B A Example 67 Dispersion 67 B B A Example 68 Dispersion 68 B B A Example 69 Dispersion 69 B B A Example 70 Dispersion 70 B B A Example 71 Dispersion 71 B B A Example 72 Dispersion 72 B B A Example 73 Dispersion 73 B B A Example 74 Dispersion 74 B B B Example 75 Dispersion 75 B B A Example 76 Dispersion 76 B B A Example 77 Dispersion 77 B B A Example 78 Dispersion 78 B B A Example 79 Dispersion 79 B B A Example 80 Dispersion 80 B B A

[Table 10] Dispersions Coarse particles Stability over time initial Over time Example 81 Dispersion 81 B B A Example 82 Dispersion 82 A A A Example 83 Dispersion 83 A A A Example 84 Dispersion 84 A A A Example 85 Dispersion 85 A A A Example 86 Dispersion 86 A A A Example 87 Dispersion 87 A A A Example 88 Dispersion 88 B B B Example 89 Dispersion 89 B B A Example 90 Dispersion 90 A B A Example 91 Dispersion 91 B B B Example 92 Dispersion 92 B B A Example 93 Dispersion 93 B B A Example 94 Dispersion 94 B B A Example 95 Dispersion 95 B B A Example 96 Dispersion 96 C C C Example 97 Dispersion 97 B B A Example 98 Dispersion 98 C C B Example 99 Dispersion 99 C C C Example 100 Dispersion 100 B B A Example 101 Dispersion 101 B B A Example 102 Dispersion 102 B B A Example 103 Dispersion 103 B B A Example 104 Dispersion 104 B B A Example 105 Dispersion 105 B B A Example 106 Dispersion 106 B B A Example 107 Dispersion 107 C C C Example 108 Dispersion 108 C C B Example 109 Dispersion 109 C C C Example 110 Dispersion 110 B B A Example 111 Dispersion 111 B B A Example 112 Dispersion 112 B B A Example 113 Dispersion 113 B B A Example 114 Dispersion 114 B B A Example 115 Dispersion 115 B B A Example 116 Dispersion 116 B B A Example 117 Dispersion 117 B B A Example 118 Dispersion 118 A B A Example 119 Dispersion 119 B B A Example 120 Dispersion 120 B B A

[Table 11] Dispersions Coarse particles Stability over time initial Over time Example 121 Dispersion 121 B B A Example 122 Dispersion 122 B B A Example 123 Dispersion 123 A B A Example 124 Dispersion 124 B B A Example 125 Dispersion 125 B B A Example 126 Dispersion 126 B B A Example 127 Dispersion 127 B B A Example 128 Dispersion 128 A B A Example 129 Dispersion 129 B B A Example 130 Dispersion 130 B B A Example 131 Dispersion 131 B B A Example 132 Dispersion 132 B B A Example 133 Dispersion 133 A B A Example 134 Dispersion 134 B B A Example 135 Dispersion 135 B B A Example 136 Dispersion 136 B B A Example 137 Dispersion 137 B B A Example 138 Dispersion 138 B B A Example 139 Dispersion 139 A B A Example 140 Dispersion 140 A B A Example 141 Dispersion 141 B B B Example 142 Dispersion 142 B B A Example 143 Dispersion 143 B B A Example 144 Dispersion 144 B B A Example 145 Dispersion 145 B B A Example 146 Dispersion 146 B B A Example 147 Dispersion 147 B B A Example 148 Dispersion 148 B B A Example 149 Dispersion 149 A B A Example 150 Dispersion 150 B B A Example 151 Dispersion 151 B B A Example 152 Dispersion 152 B B A Example 153 Dispersion 153 B B A Example 154 Dispersion 154 B B A Example 155 Dispersion 155 B B A Example 156 Dispersion 156 B B A Example 157 Dispersion 157 A B A Example 158 Dispersion 158 B B A Example 159 Dispersion 159 B B A Example 160 Dispersion 160 B B A

[Table 12] Dispersions Coarse particles Stability over time initial Over time Example 161 Dispersion 161 B B A Example 162 Dispersion 162 B B A Example 163 Dispersion 163 B B A Example 164 Dispersion 164 B B A Example 165 Dispersion 165 B B A Example 166 Dispersion 166 B B A Example 167 Dispersion 167 B B A Example 168 Dispersion 168 B B A Example 169 Dispersion 169 A B A Example 170 Dispersion 170 B B A Example 171 Dispersion 171 B B A Example 172 Dispersion 172 B B A Example 173 Dispersion 173 B B B Example 174 Dispersion 174 B B A Example 175 Dispersion 175 B B B Example 176 Dispersion 176 B B B Example 177 Dispersion 177 B B A Example 178 Dispersion 178 B B B Example 179 Dispersion 179 B B B Example 180 Dispersion 180 B B B Example 181 Dispersion 181 C C B Example 182 Dispersion 182 A A A Example 183 Dispersion 183 A A A Example 184 Dispersion 184 A A A Example 185 Dispersion 185 A A A Example 186 Dispersion 186 A A A Example 187 Dispersion 187 A A A Example 188 Dispersion 188 B B A Example 189 Dispersion 189 B B A Example 190 Dispersion 190 B B A Example 191 Dispersion 191 A B A Example 192 Dispersion 192 A B A Example 193 Dispersion 193 A A A Example 194 Dispersion 194 A B A Example 195 Dispersion 195 A B A Example 196 Dispersion 196 B B A Example 197 Dispersion 197 A B A Example 198 Dispersion 198 A B A Example 199 Dispersion 199 A B A Example 200 Dispersion 200 A B A

[Table 13] Dispersions Coarse particles Stability over time initial Over time Example 201 Dispersion 201 A B A Example 202 Dispersion 202 A B A Example 203 Dispersion 203 A B A Example 204 Dispersion 204 A A A Example 205 Dispersion 205 A B A Example 206 Dispersion 206 A B A Example 207 Dispersion 207 B B A Example 208 Dispersion 208 A B A Example 209 Dispersion 209 A B A Example 210 Dispersion 210 A B A Example 211 Dispersion 211 A B A Example 212 Dispersion 212 A B A Example 213 Dispersion 213 B B A Example 214 Dispersion 214 A B A Example 215 Dispersion 215 A B A Example 216 Dispersion 216 A B A Example 217 Dispersion 217 A B A Example 218 Dispersion 218 A B A Example 219 Dispersion 219 A B A Example 220 Dispersion 220 A B A Comparative example 1 Dispersion C1 D D D

As shown in the above table, the dispersion liquid (resin composition) of the Example has few coarse particles, has excellent stability over time, and has excellent pigment dispersion stability. Furthermore, regarding the crystallite size of the pigment derivative in the dispersion liquid, the dispersion liquid was subjected to ultracentrifugation (100,000 G×10 minutes), the precipitated solid was dried, and evaluated using XRD. Furthermore, the crystallite sizes of the pigment dispersion derivatives in the dispersions of Examples 1 to 176 were all 50 nm or less. On the other hand, in the dispersion liquid of Comparative Example 1, the crystallite size of the pigment dispersion liquid exceeded 50 nm.

＜Manufacturing of resin composition＞ Each material was mixed at the ratio of Formulations 1 to 3 shown below and filtered through a nylon filter (manufactured by Nihon Pall Ltd.) with a pore diameter of 0.45 μm to produce each resin composition.

(Recipe 1) Dispersion liquid listed in the following table･･････78.8 parts by mass Polymerizable monomers listed in the table below･･････0.6 parts by mass Resin listed in the table below･･････5.5 parts by mass (amount blended in 20 mass% PGMEA solution or 20 mass% cyclohexanone solution) Photopolymerization initiator listed in the following table･･････0.5 parts by mass Surfactant listed in the table below･･････0.0001 parts by mass Polymerization inhibitors listed in the following table･･････0.00135 parts by mass Solvents listed in the table below･･････14.7 parts by mass

(Recipe 2) Dispersion liquid listed in the following table･･････55.0 parts by mass Polymerizable monomers listed in the following table･･････6.4 parts by mass Resin listed in the table below･･････27.5 parts by mass (blending amount in 20 mass% PGMEA solution or 20 mass% cyclohexanone solution) Photopolymerization initiator listed in the following table･･････1.0 parts by mass Additives listed in the table below･･････0.5 parts by mass Surfactant listed in the following table･･････0.03 parts by mass Polymerization inhibitor listed in the following table･･････0.001 parts by mass Solvents listed in the table below･･････43.2 parts by mass

(Recipe 3) Dispersion liquid listed in the following table･･････78.8 parts by mass Polymerizable monomers listed in the table below･･････0.6 parts by mass Resin listed in the table below･･････4.0 parts by mass (blending amount in 20 mass% PGMEA solution or 20 mass% cyclohexanone solution) Photopolymerization initiator listed in the following table･･････0.5 parts by mass Additives listed in the following table･･････0.3 parts by mass Surfactant listed in the table below･･････0.0001 parts by mass Polymerization inhibitors listed in the following table･･････0.00135 parts by mass Solvents listed in the table below･･････15.9 parts by mass

[Table 14] formula Dispersions polymerizable monomer Photopolymerization initiator Resin additives surfactant polymerization inhibitor Solvent Example 1001 1 Dispersion 1 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1002 1 Dispersion 2 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1003 1 Dispersion 3 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1004 1 Dispersion 4 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1005 1 Dispersion 5 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1006 1 Dispersion 6 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1007 1 Dispersion 7 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1008 1 Dispersion 8 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1009 1 Dispersion 9 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1010 1 Dispersion 10 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1011 1 Dispersion 11 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1012 1 Dispersion 12 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1013 1 Dispersion 13 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1014 1 Dispersion 14 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1015 1 Dispersion 15 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1016 1 Dispersion 16 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1017 1 Dispersion 17 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1018 1 Dispersion 18 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1019 1 Dispersion 19 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1020 1 Dispersion 20 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1021 1 Dispersion 21 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1022 1 Dispersion 22 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1023 1 Dispersion 23 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1024 1 Dispersion 24 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1025 1 Dispersion 25 M-1 I-6 B-2 - Su-1 In-1 S-1

[Table 15] formula Dispersions polymerizable monomer Photopolymerization initiator Resin additives surfactant polymerization inhibitor Solvent Example 1026 1 Dispersion 26 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1027 1 Dispersion 27 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1028 1 Dispersion 28 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1029 1 Dispersion 29 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1030 1 Dispersion 30 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1031 1 Dispersion 31 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1032 1 Dispersion 32 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1033 1 Dispersion 33 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1034 1 Dispersion 34 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1035 1 Dispersion 35 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1036 1 Dispersion 36 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1037 1 Dispersion 37 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1038 1 Dispersion 38 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1039 1 Dispersion 39 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1040 1 Dispersion 40 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1041 1 Dispersion 36 M-1 I-10 B-2 - Su-1 In-1 S-1 Example 1042 1 Dispersion 37 M-1 I-6/I-1(1/1) B-2 - Su-1 In-1 S-1 Example 1043 1 Dispersion 38 M-1 I-6/I-2(1/1) B-2 - Su-1 In-1 S-1 Example 1044 1 Dispersion 39 M-1 I-11 B-2 - Su-1 In-1 S-1 Example 1045 1 Dispersion 40 M-1 I-6/I-2(1/1) B-2 - Su-1 In-1 S-1 Example 1046 1 Dispersion 36 M-1 I-6/I-3(1/1) B-2 - Su-1 In-1 S-1 Example 1047 1 Dispersion 37 M-1 I-6/I-4(1/1) B-2 - Su-1 In-1 S-1 Example 1048 1 Dispersion 38 M-1 I-6/I-5(1/1) B-2 - Su-1 In-1 S-1 Example 1049 1 Dispersion 39 M-1 I-6/I-7(1/1) B-2 - Su-1 In-1 S-1 Example 1050 1 Dispersion 40 M-1 I-6/I-8(1/1) B-2 - Su-1 In-1 S-1

[Table 16] formula Dispersions polymerizable monomer Photopolymerization initiator Resin additives surfactant polymerization inhibitor Solvent Example 1051 1 Dispersion 40 M-1 I-6/I-9(1/1) B-2 - Su-1 In-1 S-1 Example 1052 1 Dispersion 36 M-1 I-6/I-10(1/1) B-2 - Su-1 In-1 S-1 Example 1053 1 Dispersion 37 M-1 I-6/I-11(1/1) B-2 - Su-1 In-1 S-1 Example 1054 1 Dispersion 38 M-1 I-6/I-12(1/1) B-2 - Su-1 In-1 S-1 Example 1055 1 Dispersion 39 M-1 I-6/I-12(1/1) B-2 - Su-1 In-1 S-1 Example 1056 1 Dispersion 40 M-1 I-6/I-12(1/1) B-2 - Su-1 In-1 S-1 Example 1057 1 Dispersion 36 M-5/M-6(5/1) I-6 B-2 - Su-1 In-1 S-1 Example 1058 1 Dispersion 37 M-1/M-2(1/1) I-6 B-2 - Su-1 In-1 S-1 Example 1059 1 Dispersion 38 M-5 I-6 B-2 - Su-1 In-1 S-1 Example 1060 1 Dispersion 39 M-4 I-6 B-2 - Su-1 In-1 S-1 Example 1061 1 Dispersion 40 M-3 I-6 B-2 - Su-1 In-1 S-1 Example 1062 1 Dispersion 36 M-1/M-6(5/1) I-6 B-2 - Su-1 In-1 S-1 Example 1063 1 Dispersion 37 M-2/M-6(5/1) I-6 B-2 - Su-1 In-1 S-1 Example 1064 1 Dispersion 38 M-4/M-6(5/1) I-6 B-2 - Su-1 In-1 S-1 Example 1065 1 Dispersion 39 M-3/M-6(5/1) I-6 B-2 - Su-1 In-1 S-1 Example 1066 1 Dispersion 40 M-5/M-6(5/1) I-6 B-2 - Su-1 In-1 S-1 Example 1067 1 Dispersion 36 M-1 I-6 B-1 - Su-1 In-1 S-1 Example 1068 1 Dispersion 37 M-1 I-6 B-3 - Su-1 In-1 S-1 Example 1069 1 Dispersion 38 M-1 I-6 B-4 - Su-1 In-1 S-1 Example 1070 1 Dispersion 39 M-1 I-6 B-5 - Su-1 In-1 S-1 Example 1071 1 Dispersion 40 M-1 I-6 B-6 - Su-1 In-1 S-1 Example 1072 1 Dispersion 36 M-1 I-6 B-1/B-2(1/1) - Su-1 In-1 S-1 Example 1073 1 Dispersion 37 M-1 I-6 B-2/B-3(1/1) - Su-1 In-1 S-1 Example 1074 1 Dispersion 38 M-1 I-6 B-2/B-4(1/1) - Su-1 In-1 S-1 Example 1075 1 Dispersion 39 M-1 I-6 B-2/B-5(1/1) - Su-1 In-1 S-1

[Table 17] formula Dispersions polymerizable monomer Photopolymerization initiator Resin additives surfactant polymerization inhibitor Solvent Example 1076 1 Dispersion 40 M-1 I-6 B-2/B-6(1/1) - Su-1 In-1 S-1 Example 1077 3 Dispersion 36 M-1 I-6 B-2 A-1 Su-1 In-1 S-1 Example 1078 3 Dispersion 37 M-1 I-6 B-2 A-1 Su-1 In-1 S-1 Example 1079 3 Dispersion 38 M-1 I-6 B-2 A-1 Su-1 In-1 S-1 Example 1080 3 Dispersion 39 M-1 I-6 B-2 A-1 Su-1 In-1 S-1 Example 1081 3 Dispersion 40 M-1 I-6 B-2 A-1 Su-1 In-1 S-1 Example 1082 1 Dispersion 41 M-1 I-6 B-2 Su-1 In-1 S-1 Example 1083 1 Dispersion 42 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1084 1 Dispersion 43 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1085 1 Dispersion 44 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1086 1 Dispersion 45 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1087 1 Dispersion 46 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1088 1 Dispersion 47 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1089 1 Dispersion 48 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1090 1 Dispersion 49 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1091 1 Dispersion 50 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1092 1 Dispersion 51 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1093 1 Dispersion 52 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1094 1 Dispersion 53 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1095 1 Dispersion 54 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1096 1 Dispersion 55 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1097 1 Dispersion 56 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1098 1 Dispersion 57 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1099 1 Dispersion 58 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1100 1 Dispersion 59 M-1 I-6 B-2 - Su-1 In-1 S-1

[Table 18] formula Dispersions polymerizable monomer Photopolymerization initiator Resin additives surfactant polymerization inhibitor Solvent Example 1101 1 Dispersion 60 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1102 1 Dispersion 61 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1103 1 Dispersion 62 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1104 1 Dispersion 63 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1105 1 Dispersion 64 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1106 1 Dispersion 65 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1107 1 Dispersion 66 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1108 1 Dispersion 67 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1109 1 Dispersion 68 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1110 1 Dispersion 69 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1111 1 Dispersion 70 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1112 1 Dispersion 71 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1113 1 Dispersion 72 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1114 1 Dispersion 73 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1115 1 Dispersion 74 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1116 1 Dispersion 75 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1117 1 Dispersion 76 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1118 1 Dispersion 77 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1119 1 Dispersion 78 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1120 1 Dispersion 79 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1121 1 Dispersion 80 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1122 1 Dispersion 81 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1123 1 Dispersion 82 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1124 1 Dispersion 83 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1125 1 Dispersion 84 M-1 I-6 B-2 - Su-1 In-1 S-1

[Table 19] formula Dispersions polymerizable monomer Photopolymerization initiator Resin additives surfactant polymerization inhibitor Solvent Example 1126 1 Dispersion 85 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1127 1 Dispersion 86 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1128 1 Dispersion 87 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1129 1 Dispersion 88 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1130 1 Dispersion 89 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1131 1 Dispersion 90 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1132 1 Dispersion 91 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1133 1 Dispersion 92 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1134 2 Dispersion 93 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1135 2 Dispersion 94 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1136 2 Dispersion 95 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1137 2 Dispersion 96 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1138 2 Dispersion 97 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1139 2 Dispersion 98 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1140 2 Dispersion 99 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1141 2 Dispersion 100 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1142 2 Dispersion 101 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1143 2 Dispersion 102 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1144 2 Dispersion 103 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1145 2 Dispersion 104 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1146 2 Dispersion 105 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1147 2 Dispersion 106 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1148 2 Dispersion 107 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1149 2 Dispersion 108 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1150 2 Dispersion 109 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1

[Table 20] formula Dispersions polymerizable monomer Photopolymerization initiator Resin additives surfactant polymerization inhibitor Solvent Example 1151 2 Dispersion 110 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1152 2 Dispersion 111 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1153 2 Dispersion 112 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1154 2 Dispersion 113 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1155 2 Dispersion 114 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1156 2 Dispersion 115 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1157 2 Dispersion 116 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1158 2 Dispersion 117 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1159 2 Dispersion 118 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1160 2 Dispersion 119 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1161 2 Dispersion 120 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1162 2 Dispersion 121 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1163 2 Dispersion 122 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1164 2 Dispersion 123 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1165 2 Dispersion 124 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1166 2 Dispersion 125 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1167 2 Dispersion 126 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1168 2 Dispersion 127 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1169 2 Dispersion 128 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1170 2 Dispersion 129 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1171 2 Dispersion 130 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1172 2 Dispersion 131 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1173 2 Dispersion 132 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1174 2 Dispersion 133 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1175 2 Dispersion 134 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1

[Table 21] formula Dispersions polymerizable monomer Photopolymerization initiator Resin additives surfactant polymerization inhibitor Solvent Example 1176 2 Dispersion 135 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1177 2 Dispersion 136 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1178 2 Dispersion 137 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1179 2 Dispersion 138 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1180 2 Dispersion 139 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1181 2 Dispersion 140 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1182 2 Dispersion 141 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1183 2 Dispersion 142 M-5 I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1184 2 Dispersion 143 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1185 2 Dispersion 144 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1186 2 Dispersion 145 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1187 2 Dispersion 146 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1188 2 Dispersion 147 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1189 2 Dispersion 148 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1190 2 Dispersion 149 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1191 2 Dispersion 150 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1192 2 Dispersion 151 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1193 2 Dispersion 152 M-5/M-6C4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1194 2 Dispersion 153 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1195 2 Dispersion 154 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1196 2 Dispersion 155 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1197 2 Dispersion 156 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1198 2 Dispersion 157 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1199 2 Dispersion 158 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1200 2 Dispersion 159 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1

[Table 22] formula Dispersions polymerizable monomer Photopolymerization initiator Resin additives surfactant polymerization inhibitor Solvent Example 1201 2 Dispersion 160 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1202 2 Dispersion 161 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1203 2 Dispersion 162 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1204 2 Dispersion 163 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1205 2 Dispersion 164 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1206 2 Dispersion 165 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1207 2 Dispersion 166 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1208 2 Dispersion 167 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1209 2 Dispersion 168 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1210 2 Dispersion 169 M-5/M-6(4.8/1.6) I-11 B-1 UV-1 Su-1 In-1 S-1 Example 1211 1 Dispersion 170 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1212 1 Dispersion 171 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1213 1 Dispersion 172 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1214 1 Dispersion 173 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1215 1 Dispersion 174 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1216 1 Dispersion 175 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1217 1 Dispersion 176 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1218 1 Dispersion 177 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1219 1 Dispersion 178 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1220 1 Dispersion 179 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1221 1 Dispersion 180 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1222 1 Dispersion 181 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1223 1 Dispersion 182 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1224 1 Dispersion 183 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1225 1 Dispersion 184 M-1 I-6 B-2 - Su-1 In-1 S-1

[Table 23] formula Dispersions polymerizable monomer Photopolymerization initiator Resin additives surfactant polymerization inhibitor Solvent Example 1226 1 Dispersion 185 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1227 1 Dispersion 186 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1228 1 Dispersion 187 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1229 1 Dispersion 188 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1230 1 Dispersion 189 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1231 1 Dispersion 190 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1232 1 Dispersion 191 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1233 1 Dispersion 192 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1234 1 Dispersion 193 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1235 1 Dispersion 194 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1236 1 Dispersion 195 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1237 1 Dispersion 196 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1238 1 Dispersion 197 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1239 1 Dispersion 198 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1240 1 Dispersion 199 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1241 1 Dispersion 200 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1242 1 Dispersion 201 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1243 1 Dispersion 202 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1244 1 Dispersion 203 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1245 1 Dispersion 204 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1246 1 Dispersion 205 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1247 1 Dispersion 206 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1248 1 Dispersion 207 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1249 1 Dispersion 208 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1250 1 Dispersion 209 M-1 I-6 B-2 - Su-1 In-1 S-1

[Table 24] formula Dispersions polymerizable monomer Photopolymerization initiator Resin additives surfactant polymerization inhibitor Solvent Example 1251 1 Dispersion 210 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1252 1 Dispersion 211 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1253 1 Dispersion 212 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1254 1 Dispersion 213 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1255 1 Dispersion 214 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1256 1 Dispersion 215 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1257 1 Dispersion 216 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1258 1 Dispersion 217 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1259 1 Dispersion 218 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1260 1 Dispersion 219 M-1 I-6 B-2 - Su-1 In-1 S-1 Example 1261 1 Dispersion 220 M-1 I-6 B-2 - Su-1 In-1 S-1 Comparative example 1001 1 Dispersion C1 M-1 I-6 B-2 - Su-1 In-1 S-1

Details of the raw materials described with abbreviations in the above table are as follows.

(Polymerizable monomer) M-1: A compound with the following structure [Chemical Formula 66] M-2: Compound with the following structure [Chemical Formula 67] M-3: KAYARAD DPHA (manufactured by Nippon Kayaku Co., Ltd., a mixture of dipenterythritol pentaacrylate and dipenterythritol hexaacrylate, manufactured by Nippon Kayaku Co., Ltd.) M-4: Lower The compound with the above structure [Chemical Formula 68] M-5: A mixture of compounds with the following structure (containing 55 mol% to 63 mol% of the compound on the left) [Chemical Formula 69] M-6: Compound with the following structure. [Chemical Formula 70]

(Photopolymerization initiator) I-1: Irgacure OXE01 (manufactured by BASF, oxime compound) I-2: Irgacure OXE02 (manufactured by BASF, oxime compound) I-3 to I-8: Compounds with the following structures [chemical formula 71] I-9: Omnirad 379 (IGM Resins BV, α-aminoketone compound) I-10: Omnirad 907 (IGM Resins BV, α-aminoketone compound) I-11 to I-12: The following Structure of the compound [Chemical Formula 72]

(Resin) B-1: 20 mass % PGMEA solution [Chemical formula 73]

B-2: 20 mass% cyclohexanone solution [Chemical Formula 74] of a resin with the following structure (the value indicated on the main chain is molar ratio. Resin with acidic groups, weight average molecular weight 21000)

B-3: 20 mass% PGMEA solution of the resin with the following structure (the value marked on the main chain is the molar ratio, and the value marked on the side chain is the number of repeating units. The weight average molecular weight is 16000, the acid value is 67 mgKOH/g) [ Chemical formula 75]

B-4: 20 mass% PGMEA solution of the resin with the following structure (the value marked on the main chain is the molar ratio, and the value marked on the side chain is the number of repeating units. Weight average molecular weight 18000, acid value 82.1mgKOH/g) [Chemical Formula 76]

B-5: 20 mass% PGMEA solution [Chemical Formula 77] of the resin with the following structure (the value marked on the main chain is molar ratio. Resin with acid group, weight average molecular weight 10000, acid value 110 mgKOH/g)

B-6: 20 mass % PGMEA solution [Chemical Formula 78] of the resin with the following structure (the value marked on the main chain is molar ratio. Resin with acid group, weight average molecular weight 10000, acid value 110 mgKOH/g)

(Additive) A-1: EHPE3150 (manufactured by Daicel Corporation, 1,2-epoxy-4-(2-oxiranyl)cyclohexanol of 2,2'-bis(hydroxymethyl)-1-butanol Alkane adduct) UV-1: Compound with the following structure (ultraviolet absorber) [Chemical Formula 79]

(surfactant) Su-1: KF-6001 (manufactured by Shin-Etsu Chemical Co., Ltd., polysiloxane surfactant, double-terminal methanol-modified polydimethylsiloxane, hydroxyl value 62 mgKOH/g)

(polymerization inhibitor) In-1: p-methoxyphenol

(solvent) S-1: Propylene glycol monomethyl ether acetate (PGMEA)

＜Evaluation of development residue＞ On the glass substrate, a base layer forming composition (CT-4000, manufactured by FUJIFILM Electronic Materials Co., Ltd.) was applied using a spin coater so that the thickness after post-baking reached 0.1 μm, and a heating plate was used to heat the substrate at 220 The base layer was formed by heating at ℃ for 1 hour, and a glass substrate (support) with a base layer was obtained. Next, each resin composition was applied by spin coating so that the film thickness after post-baking would be 0.4 μm. Next, it was heated at 100° C. for 3 minutes using a hot plate. Next, the glass substrate was placed on the horizontal rotating stage of a spin/spray developing machine (model DW-30, manufactured by CHEMITRONICS CO., LTD.), and a developer (CD-2000, manufactured by FUJIFILM Electronic Materials Co., Ltd.) was used. (Manufacture) After performing spin immersion development for 60 seconds at 23°C, the glass substrate was fixed on the horizontal rotating table using a vacuum suction cup. While rotating the glass substrate at 50 rpm with a rotating device, the glass substrate was rotated from above its rotation center. Pure water was supplied in a spray form from the discharge nozzle for rinsing, and then spray drying was performed. Furthermore, heat processing (post-baking) was performed for 5 minutes using a 200°C hot plate. The absorbance A1 of the glass substrate before coating the resin composition and the absorbance A1 of the glass substrate after post-baking were measured using a spectrophotometer, and the change in absorbance ΔA was calculated from the following formula, and the maximum change in absorbance ΔA was used The value of development residue was evaluated. In addition, the maximum value of the absorbance change amount ΔA refers to the absorbance change amount at the wavelength where the absorbance change amount ΔA becomes maximum. The change in absorbance ΔA=|Absorbance A1-Absorbance A2| A: The maximum value of the change in absorbance ΔA is 0.01 or less B: The maximum value of absorbance change ΔA exceeds 0.01 and is 0.03 or less C: The maximum value of absorbance change ΔA exceeds 0.03 and is 0.05 or less D: The maximum value of absorbance change ΔA exceeds 0.05

[Table 25] Development residue Development residue Development residue Example 1001 B Example 1041 A Example 1081 A Example 1002 B Example 1042 A Example 1082 A Example 1003 B Example 1043 A Example 1083 A Example 1004 A Example 1044 A Example 1084 A Example 1005 B Example 1045 A Example 1085 A Example 1006 B Example 1046 A Example 1086 A Example 1007 B Example 1047 A Example 1087 B Example 1008 B Example 1048 A Example 1088 A Example 1009 B Example 1049 A Example 1089 B Example 1010 B Example 1050 A Example 1090 B Example 1011 B Example 1051 A Example 1091 B Example 1012 B Example 1052 A Example 1092 B Example 1013 B Example 1053 A Example 1093 B Example 1014 B Example 1054 A Example 1094 B Example 1015 B Example 1055 A Example 1095 B Example 1016 B Example 1056 A Example 1096 B Example 1017 A Example 1057 A Example 1097 B Example 1018 B Example 1058 A Example 1098 A Example 1019 C Example 1059 A Example 1099 B Example 1020 B Example 1060 A Example 1100 B Example 1021 B Example 1061 A Example 1101 B Example 1022 C Example 1062 A Example 1102 A Example 1023 C Example 1063 A Example 1103 A Example 1024 A Example 1064 A Example 1104 B Example 1025 B Example 1065 A Example 1105 B Example 1026 B Example 1066 A Example 1106 B Example 1027 B Example 1067 A Example 1107 B Example 1028 C Example 1068 A Example 1108 B Example 1029 A Example 1069 A Example 1109 A Example 1030 A Example 1070 A Example 1110 B Example 1031 A Example 1071 A Example 1111 B Example 1032 A Example 1072 A Example 1112 B Example 1033 A Example 1073 A Example 1113 A Example 1034 A Example 1074 A Example 1114 B Example 1035 A Example 1075 A Example 1115 B Example 1036 A Example 1076 A Example 1116 A Example 1037 A Example 1077 A Example 1117 A Example 1038 A Example 1078 A Example 1118 A Example 1039 A Example 1079 A Example 1119 A Example 1040 A Example 1080 A Example 1120 A

[Table 26] Development residue Development residue Development residue Example 1121 B Example 1161 A Example 1201 A Example 1122 B Example 1162 A Example 1202 A Example 1123 A Example 1163 B Example 1203 A Example 1124 A Example 1164 A Example 1204 A Example 1125 A Example 1165 B Example 1205 A Example 1126 A Example 1166 A Example 1206 A Example 1127 A Example 1167 A Example 1207 B Example 1128 A Example 1168 B Example 1208 B Example 1129 B Example 1169 A Example 1209 B Example 1130 B Example 1170 B Example 1210 A Example 1131 A Example 1171 A Example 1211 A Example 1132 B Example 1172 A Example 1212 A Example 1133 A Example 1173 B Example 1213 B Example 1134 A Example 1174 A Example 1214 B Example 1135 B Example 1175 B Example 1215 B Example 1136 A Example 1176 A Example 1216 B Example 1137 C Example 1177 A Example 1217 B Example 1138 A Example 1178 A Example 1218 B Example 1139 C Example 1179 A Example 1219 B Example 1140 C Example 1180 A Example 1220 B Example 1141 A Example 1181 A Example 1221 B Example 1142 B Example 1182 B Example 1222 C Example 1143 A Example 1183 B Example 1223 A Example 1144 B Example 1184 A Example 1224 A Example 1145 B Example 1185 A Example 1225 A Example 1146 B Example 1186 A Example 1226 A Example 1147 B Example 1187 B Example 1227 A Example 1148 C Example 1188 B Example 1228 A Example 1149 C Example 1189 B Example 1229 A Example 1150 C Example 1190 A Example 1230 A Example 1151 B Example 1191 A Example 1231 A Example 1152 A Example 1192 A Example 1232 A Example 1153 B Example 1193 A Example 1233 A Example 1154 B Example 1194 A Example 1234 A Example 1155 B Example 1195 B Example 1235 A Example 1156 A Example 1196 B Example 1236 A Example 1157 A Example 1197 B Example 1237 A Example 1158 B Example 1198 A Example 1238 A Example 1159 A Example 1199 A Example 1239 A Example 1160 B Example 1200 A Example 1240 A

[Table 27] Development residue Example 1241 A Example 1242 A Example 1243 A Example 1244 A Example 1245 A Example 1246 A Example 1247 A Example 1248 A Example 1249 A Example 1250 A Example 1251 A Example 1252 A Example 1253 A Example 1254 A Example 1255 A Example 1256 A Example 1257 A Example 1258 A Example 1259 A Example 1260 A Example 1261 A Comparative example 1001 D

As shown in the above table, the resin compositions of the Examples can form pixels with less development residue.

The film obtained from the resin composition of the Example can be suitably used in optical filters, solid-state imaging devices, and image display devices.

without.

Claims (15)

A resin composition containing: pigment; Pigment derivatives with crystallite size below 50nm; Resin; and Solvent. The resin composition as described in claim 1, wherein The aforementioned pigment derivative is a particle of a compound having at least one structure selected from the group consisting of a pigment structure and a trivalent structure and an acid group or a base. The resin composition as described in claim 2, wherein The aforementioned pigment structure is selected from the group consisting of a diketopyrrolopyrrole structure, a pyrrolopyrrole structure, a methimine structure, an isoindoline structure, a quinoline yellow structure, an azo structure, an anthraquinone structure, a thioindigo structure, and a quinacridone structure. At least one of the group consisting of benzoindole structure, phthalocyanine structure and di-㗁𠯤 structure. The resin composition according to claim 1, wherein the aforementioned pigment derivative is a compound represented by formula (DPP), In the formula, R ^D1 and R ^D2 each independently represent a hydrogen atom or a substituent, A ^D1 and A ^D2 each independently represent a substituent, L ^D1 represents a single bond or an n+1 valent linking group, X ^D1 represents an acid group or a base Base, m represents an integer from 1 to 10, n represents an integer from 1 to 10, when m is 2 or more, a plurality of L ^D1 and X ^D1 may be different from each other, and when n is 2 or more, a plurality of X ^D1 may be different from each other. The resin composition according to any one of claims 1 to 4, further containing a photopolymerization initiator and a polymerizable compound. A method for manufacturing a resin composition, which includes the steps of dispersing a pigment, a pigment derivative with a crystallite size of 1 to 50 nm, and a resin in a solvent. The manufacturing method of the resin composition as described in claim 6, wherein The aforementioned pigment derivative is a particle of a compound having at least one structure selected from the group consisting of a pigment structure and a trivalent structure and an acid group or a base. The manufacturing method of the resin composition as described in claim 7, wherein The aforementioned pigment structure is selected from the group consisting of a diketopyrrolopyrrole structure, a pyrrolopyrrole structure, a methimine structure, an isoindoline structure, a quinoline yellow structure, an azo structure, an anthraquinone structure, a thioindigo structure, and a quinacridone structure. At least one of the group consisting of benzoindole structure, phthalocyanine structure and di-㗁𠯤 structure. The manufacturing method of the resin composition according to claim 6, wherein the aforementioned pigment derivative is a compound represented by formula (DPP), In the formula, R ^D1 and R ^D2 each independently represent a hydrogen atom or a substituent, A ^D1 and A ^D2 each independently represent a substituent, L ^D1 represents a single bond or an n+1 valent linking group, X ^D1 represents an acid group or a base Base, m represents an integer from 1 to 10, n represents an integer from 1 to 10, when m is 2 or more, a plurality of L ^D1 and X ^D1 may be different from each other, and when n is 2 or more, a plurality of X ^D1 may be different from each other. A pigment derivative, which is a particle of a compound having at least one structure selected from the group consisting of a pigment structure and a tri-hydroxy structure and an acid group or a base, wherein the crystallite size is 1 to 50 nm. The pigment derivative according to claim 10, which is a dispersion aid. A film obtained using the resin composition according to claim 1 or claim 2. An optical filter having the film described in claim 12. A solid-state imaging element having the film according to claim 12. An image display device having the film according to claim 12.