TW202343032A - Cover plate device - Google Patents
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- TW202343032A TW202343032A TW111116312A TW111116312A TW202343032A TW 202343032 A TW202343032 A TW 202343032A TW 111116312 A TW111116312 A TW 111116312A TW 111116312 A TW111116312 A TW 111116312A TW 202343032 A TW202343032 A TW 202343032A
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- 239000010408 film Substances 0.000 claims abstract description 184
- 239000012788 optical film Substances 0.000 claims abstract description 53
- 239000000758 substrate Substances 0.000 claims abstract description 31
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 6
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 6
- 239000000463 material Substances 0.000 claims description 32
- 230000003287 optical effect Effects 0.000 claims description 32
- 230000008033 biological extinction Effects 0.000 claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 4
- 238000002834 transmittance Methods 0.000 claims description 4
- JAONJTDQXUSBGG-UHFFFAOYSA-N dialuminum;dizinc;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Al+3].[Al+3].[Zn+2].[Zn+2] JAONJTDQXUSBGG-UHFFFAOYSA-N 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 claims description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052733 gallium Inorganic materials 0.000 claims description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 2
- 229910001887 tin oxide Inorganic materials 0.000 claims description 2
- 239000011787 zinc oxide Substances 0.000 claims description 2
- XXLJGBGJDROPKW-UHFFFAOYSA-N antimony;oxotin Chemical compound [Sb].[Sn]=O XXLJGBGJDROPKW-UHFFFAOYSA-N 0.000 claims 1
- 229910052738 indium Inorganic materials 0.000 claims 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims 1
- 239000010410 layer Substances 0.000 description 189
- 230000000694 effects Effects 0.000 description 18
- 238000010586 diagram Methods 0.000 description 8
- 230000031700 light absorption Effects 0.000 description 8
- 238000000576 coating method Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 239000000306 component Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- -1 polypropylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- SKRWFPLZQAAQSU-UHFFFAOYSA-N stibanylidynetin;hydrate Chemical compound O.[Sn].[Sb] SKRWFPLZQAAQSU-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
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- Preparing Plates And Mask In Photomechanical Process (AREA)
- Optical Head (AREA)
Abstract
Description
本公開提供一種蓋板裝置,尤指一種包含不同折射率之光學膜層的蓋板裝置。The present disclosure provides a cover device, particularly a cover device including optical film layers with different refractive indexes.
隨著科技不斷進步且為因應使用者的使用習慣,現今仍需持續對顯示裝置進行改善。目前,在戶外或環境光較強的情況下使用顯示裝置時,仍存在反射光太強對視覺造成干擾或對比度下降等問題,或者在顯示裝置為暗態時,邊框與顯示面板間存在明顯邊界等美觀問題。As technology continues to advance and in order to adapt to users' usage habits, display devices still need to continue to be improved. Currently, when display devices are used outdoors or under conditions with strong ambient light, there are still problems such as excessive reflected light causing visual interference or reduced contrast, or when the display device is in a dark state, there is an obvious boundary between the frame and the display panel, etc. Aesthetic issues.
統上,可藉由在顯示裝置的蓋板表面鍍上一層抗反射膜來達成降低反射光的效果,或者可藉由將蓋板染色,以改善美觀問題。然而,傳統方法仍存在製備工藝繁雜、對比度或抗反射效果不佳等情形。Traditionally, the effect of reducing reflected light can be achieved by coating a layer of anti-reflective film on the cover surface of the display device, or the cover can be dyed to improve the aesthetics. However, traditional methods still have problems such as complicated preparation processes and poor contrast or anti-reflection effects.
因此,目前亟需發展一種蓋板裝置,以改善習知缺陷。Therefore, there is an urgent need to develop a cover device to improve the conventional defects.
本公開提供一種蓋板裝置,包含:一基板;以及一光學膜層,設置於該基板上,其中,該光學膜層包含一第一膜層及一第二膜層,該第一膜層設置於該第二膜層上;其中,在光學波長550nm下,該第一膜層的折射率不同於該第二膜層的折射率,該第二膜層包含一金屬氧化物。The present disclosure provides a cover device, including: a substrate; and an optical film layer disposed on the substrate, wherein the optical film layer includes a first film layer and a second film layer, and the first film layer is provided On the second film layer; wherein, at an optical wavelength of 550 nm, the refractive index of the first film layer is different from the refractive index of the second film layer, and the second film layer includes a metal oxide.
以下將詳細地參考本發明的示範性實施例,示範性實施例的實例說明於附圖中。只要有可能,相同元件符號在圖式和描述中用來表示相同或相似部分。Reference will now be made in detail to the exemplary embodiments of the present invention, examples of which are illustrated in the accompanying drawings. Whenever possible, the same reference numbers are used in the drawings and descriptions to refer to the same or similar parts.
本公開通篇說明書與所附的申請專利範圍中會使用某些辭彙來指稱特定組件。本領域技術人員應理解,電子裝置製造商可能會以不同的名稱來指稱相同的組件。本文並不意在區分那些功能相同但名稱不同的組件。在下文說明書與申請專利範圍中,「含有」與「包含」等詞為開放式詞語,因此其應被解釋為「含有但不限定為…」之意。Throughout this disclosure and the appended claims, certain terms are used to refer to specific components. Those skilled in the art will appreciate that manufacturers of electronic devices may refer to the same component by different names. This article is not intended to differentiate between components that have the same functionality but have different names. In the following description and patent application, the words "including" and "include" are open-ended words, so they should be interpreted to mean "including but not limited to...".
本文中所提到的方向用語,例如:「上」、「下」、「前」、「後」、「左」、「右」等,僅是參考附圖的方向。因此,使用的方向用語是用來說明,而並非用來限制本公開。在附圖中,各圖式繪示的是特定實施例中所使用的方法、結構及/或材料的通常性特徵。然而,這些圖式不應被解釋為界定或限制由這些實施例所涵蓋的範圍或性質。舉例來說,為了清楚起見,各膜層、區域及/或結構的相對尺寸、厚度及位置可能縮小或放大。The directional terms mentioned in this article, such as "up", "down", "front", "back", "left", "right", etc., are only for reference to the directions in the accompanying drawings. Accordingly, the directional terms used are illustrative and not limiting of the disclosure. In the drawings, each figure illustrates the general features of methods, structures, and/or materials used in particular embodiments. However, these drawings should not be interpreted as defining or limiting the scope or nature encompassed by these embodiments. For example, the relative sizes, thicknesses, and locations of various layers, regions, and/or structures may be reduced or exaggerated for clarity.
本公開中所敘述之一結構(或層別、組件、基材)位於另一結構(或層別、組件、基材)之上/上方,可以指二結構相鄰且直接連接,或是可以指二結構相鄰而非直接連接。非直接連接是指二結構之間具有至少一中介結構(或中介層別、中介組件、中介基材、中介間隔),一結構的下側表面相鄰或直接連接於中介結構的上側表面,另一結構的上側表面相鄰或直接連接於中介結構的下側表面。而中介結構可以是單層或多層的實體結構或非實體結構所組成,並無限制。在本公開中,當某結構設置在其它結構「上」時,有可能是指某結構「直接」在其它結構上,或指某結構「間接」在其它結構上,即某結構和其它結構間還夾設有至少一結構。When a structure (or layer, component, or substrate) described in this disclosure is located on/above another structure (or layer, component, or substrate), it may mean that the two structures are adjacent and directly connected, or they may Refers to the fact that two structures are adjacent rather than directly connected. Indirect connection means that there is at least one intermediary structure (or intermediary layer, intermediary component, intermediary substrate, or intermediary spacer) between two structures. The lower surface of one structure is adjacent to or directly connected to the upper surface of the intermediary structure, and the other is adjacent to or directly connected to the upper surface of the intermediary structure. The upper surface of a structure is adjacent to or directly connected to the lower surface of the intermediate structure. The intermediary structure can be composed of a single-layer or multi-layer physical structure or a non-physical structure, and there is no limit. In this disclosure, when a structure is disposed "on" another structure, it may mean that the structure is "directly" on the other structure, or that the structure is "indirectly" on the other structure, that is, between the structure and the other structure. At least one structure is also sandwiched.
術語「約」、「等於」、「相等」或「相同」、「實質上」或「大致上」一般解釋為在所給定的值或範圍的20%以內,或解釋為在所給定的值或範圍的10%、5%、3%、2%、1%或0.5%以內。The terms "about", "equal to", "equal" or "the same", "substantially" or "substantially" are generally interpreted to mean within 20% of a given value or range, or to mean within a given value or range. Within 10%, 5%, 3%, 2%, 1% or 0.5% of the value or range.
說明書與申請專利範圍中所使用的序數例如「第一」、「第二」等之用詞用以修飾元件,其本身並不意含及代表該(或該些)元件有任何之前的序數,也不代表某一元件與另一元件的順序、或是製造方法上的順序,該些序數的使用僅用來使具有某命名的元件得以和另一具有相同命名的元件能作出清楚區分。申請專利範圍與說明書中可不使用相同用詞,據此,說明書中的第一構件在申請專利範圍中可能為第二構件。The ordinal numbers used in the specification and the scope of the patent application, such as "first", "second", etc., are used to modify elements. They themselves do not imply and represent that the element (or elements) have any previous ordinal number, nor do they mean that the element (or elements) has any previous ordinal number. It does not represent the order of one element with another element, or the order of the manufacturing method. The use of these numbers is only used to clearly distinguish an element with a certain name from another element with the same name. The same words may not be used in the patent application scope and the description. Accordingly, the first component in the description may be the second component in the patent application scope.
在本公開中,厚度的量測方式可以是採用光學顯微鏡量測而得,厚度可以由電子顯微鏡中的剖面影像量測而得,但並不以此為限。另外,任兩個用來比較的數值或方向,可存在著一定的誤差。另外,本公開中所提到的術語「等於」、「相等」、「相同」、「實質上」或「大致上」通常代表落在給定數值或範圍的10%範圍內。此外,用語「給定範圍為第一數值至第二數值」、「給定範圍落在第一數值至第二數值的範圍內」表示所述給定範圍包括第一數值、第二數值以及它們之間的其它數值。In the present disclosure, the thickness can be measured by using an optical microscope, and the thickness can be measured by cross-sectional images in an electron microscope, but it is not limited to this. In addition, any two values or directions used for comparison may have certain errors. In addition, the terms "equal to", "equal to", "the same", "substantially" or "substantially" mentioned in this disclosure generally mean falling within 10% of a given value or range. In addition, the terms "the given range is the first value to the second value" and "the given range falls within the range of the first value to the second value" mean that the given range includes the first value, the second value and their other values in between.
須知悉的是,以下所舉實施例可以在不脫離本公開的精神下,可將數個不同實施例中的特徵進行替換、重組、混合以完成其他實施例。各實施例間特徵只要不違背發明精神或相衝突,均可任意混合搭配使用。It should be noted that the following embodiments can be replaced, reorganized, and mixed with features of several different embodiments without departing from the spirit of the present disclosure to complete other embodiments. Features in various embodiments may be mixed and matched as long as they do not violate the spirit of the invention or conflict with each other.
除非另外定義,在此使用的全部用語(包含技術及科學用語)具有與本公開所屬技術領域的技術人員通常理解的相同涵義。能理解的是,這些用語例如在通常使用的字典中定義用語,應被解讀成具有與相關技術及本公開的背景或上下文一致的意思,而不應以一理想化或過度正式的方式解讀,除非在本公開實施例有特別定義。Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this disclosure belongs. It is understood that these terms, such as those defined in commonly used dictionaries, should be interpreted to have a meaning consistent with the relevant technology and the background or context of the present disclosure, and should not be interpreted in an idealized or overly formal manner. Unless otherwise defined in the embodiments of this disclosure.
圖1A為本公開之一實施例之蓋板裝置之示意圖。圖1B為本公開之一實施例之光學膜層之示意圖。FIG. 1A is a schematic diagram of a cover device according to an embodiment of the present disclosure. FIG. 1B is a schematic diagram of an optical film layer according to an embodiment of the present disclosure.
如圖1A和圖1B所示,本公開之蓋板裝置100可包含:一基板1;以及一光學膜層2,設置於基板1上,其中,光學膜層2包含一第一膜層21及一第二膜層22,第一膜層21設置於第二膜層22上;其中,在光學波長550nm下,第一膜層21的折射率不同於第二膜層22的折射率。藉由不同折射率的膜層疊構設計,可使光學膜層2達到降低反射光之功效。將包含光學膜層2之蓋板裝置100應用於顯示裝置時,可提升顯示裝置的對比度或光學品味。於本公開的一實施例中,可以蓋板裝置100的基板1朝向顯示裝置的顯示面板設置。As shown in FIGS. 1A and 1B , the cover device 100 of the present disclosure may include: a substrate 1; and an optical film layer 2 disposed on the substrate 1, where the optical film layer 2 includes a first film layer 21 and A second film layer 22, the first film layer 21 is disposed on the second film layer 22; wherein, at an optical wavelength of 550 nm, the refractive index of the first film layer 21 is different from the refractive index of the second film layer 22. Through the stacked design of film layers with different refractive indexes, the optical film layer 2 can achieve the effect of reducing reflected light. When the cover device 100 including the optical film layer 2 is applied to a display device, the contrast or optical quality of the display device can be improved. In an embodiment of the present disclosure, the substrate 1 of the cover device 100 may be disposed facing the display panel of the display device.
於本公開中,基板1的材料可包括一石英、一玻璃、一矽晶圓、一藍寶石、聚碳酸酯(polycarbonate, PC)、聚醯亞胺(polyimide, PI)、聚丙烯(polypropylene, PP)、聚對苯二甲酸乙二酯(polyethylene terephthalate, PET)、或其他塑膠或高分子材料,或前述之組合,但本公開並不限於此。於本公開之一實施例中,基板1為顯示裝置的蓋板玻璃(cover glass)。In the present disclosure, the material of the substrate 1 may include quartz, glass, silicon wafer, sapphire, polycarbonate (PC), polyimide (PI), polypropylene (PP) ), polyethylene terephthalate (PET), or other plastic or polymer materials, or a combination of the foregoing, but the disclosure is not limited thereto. In one embodiment of the present disclosure, the substrate 1 is a cover glass of a display device.
於本公開中,第一膜層21的材料可包含二氧化矽、氟化鎂、或其組合,但本公開並不限於此。在光學波長550nm下,第一膜層21的折射率大於或等於1.38且小於或等於1.48。此外,在光學波長550nm下,第一膜層21的消光係數(extinction coefficient, k)可大致上為0(例如可為10 -4至10 -5),換句話說,第一膜層21具有較差吸收光的效果。消光係數是指介質對特定波長的光的吸收能力,為介質的固有性質,消光係數越大表示當光線經過介質後光強度衰減越迅速。 In the present disclosure, the material of the first film layer 21 may include silicon dioxide, magnesium fluoride, or a combination thereof, but the disclosure is not limited thereto. At an optical wavelength of 550 nm, the refractive index of the first film layer 21 is greater than or equal to 1.38 and less than or equal to 1.48. In addition, at an optical wavelength of 550 nm, the extinction coefficient (k) of the first film layer 21 can be substantially 0 (for example, it can be 10 -4 to 10 -5 ). In other words, the first film layer 21 has Poor light absorption effect. The extinction coefficient refers to the medium's ability to absorb light of a specific wavelength and is an inherent property of the medium. The greater the extinction coefficient, the faster the light intensity attenuates when the light passes through the medium.
於本公開中,第二膜層22的材料可包含一金屬氧化物,金屬氧化物的例子可包含氧化銦錫(indium tin oxide, ITO)、氧化鋁鋅(aluminum zinc oxide, AZO)、氧化銦鎵鋅(indium gallium zinc oxide, IGZO)、氧化錫銻(antimony tin oxide, ATO)、氟摻雜氧化錫(fluorine-doped tin oxide, FTO)、或其組合,但本公開並不限於此。在光學波長550nm下,第二膜層22的折射率大於或等於1.8且小於或等於2.1。此外,在光學波長550nm下,第二膜層22的消光係數(k)大於或等於0.01且小於或等於0.05之間,換句話說,第二膜層22可具有較佳吸收光的效果,可進一步降低反射光之功效。因此,於本公開中,在光學波長550nm下,光學膜層2的穿透率可小於或等於90%,例如穿透率大於或等於60%且小於或等於80%,但本公開並不限於此。In the present disclosure, the material of the second film layer 22 may include a metal oxide. Examples of the metal oxide may include indium tin oxide (ITO), aluminum zinc oxide (AZO), indium oxide Indium gallium zinc oxide (IGZO), antimony tin oxide (ATO), fluorine-doped tin oxide (FTO), or combinations thereof, but the disclosure is not limited thereto. At an optical wavelength of 550 nm, the refractive index of the second film layer 22 is greater than or equal to 1.8 and less than or equal to 2.1. In addition, under the optical wavelength of 550 nm, the extinction coefficient (k) of the second film layer 22 is between greater than or equal to 0.01 and less than or equal to 0.05. In other words, the second film layer 22 can have a better light absorption effect and can Further reduce the effectiveness of reflected light. Therefore, in the present disclosure, at the optical wavelength of 550 nm, the transmittance of the optical film layer 2 can be less than or equal to 90%, for example, the transmittance is greater than or equal to 60% and less than or equal to 80%, but the present disclosure is not limited to this.
由於第二膜層22具有較佳吸收光的效果,將包含光學膜層2之蓋板裝置100應用於顯示裝置時,可提升顯示裝置的對比度。更具體地,由於包含第二膜層22的光學膜層2具有較佳吸收光的效果,當環境光線由外部入射至蓋板裝置100時,入射至蓋板裝置100內的光線經過光學膜層2可被第一次吸收而減弱入射光強度,接著,反射出蓋板裝置100的光線再次經過光學膜層2可被第二次吸收而減弱反射光強度。因此,具有較佳吸收光的效果的光學膜層2可提升顯示裝置之對比度。此外,由於本公開不須額外對光學膜層2進行後製程加工,光學膜層2可具有較佳吸收光的效果,因此,本公開之蓋板裝置100可簡化製備工藝或節省成本。Since the second film layer 22 has a better light absorption effect, when the cover device 100 including the optical film layer 2 is applied to a display device, the contrast of the display device can be improved. More specifically, since the optical film layer 2 including the second film layer 22 has a better light absorption effect, when ambient light is incident on the cover device 100 from the outside, the light incident on the cover device 100 passes through the optical film layer. 2 can be absorbed for the first time to weaken the intensity of the incident light. Then, the light reflected from the cover device 100 passes through the optical film layer 2 again and can be absorbed for the second time to weaken the intensity of the reflected light. Therefore, the optical film layer 2 with better light absorption effect can improve the contrast of the display device. In addition, since the present disclosure does not require additional post-processing of the optical film layer 2, the optical film layer 2 can have a better light absorption effect. Therefore, the cover plate device 100 of the present disclosure can simplify the manufacturing process or save costs.
於本公開中,在光學波長550nm下,第一膜層21的折射率可小於第二膜層22的折射率。藉由高低折射率的膜層交替堆疊設計,透過其所產生的干涉效應,可使光學膜層2達到降低反射光之功效。因此,於本公開中,在光學波長550nm下,光學膜層2的反射率可小於或等於4%,但本公開並不限於此。In the present disclosure, at an optical wavelength of 550 nm, the refractive index of the first film layer 21 may be smaller than the refractive index of the second film layer 22 . Through the alternating stacking design of film layers with high and low refractive index, the optical film layer 2 can achieve the effect of reducing reflected light through the interference effect produced. Therefore, in the present disclosure, at an optical wavelength of 550 nm, the reflectance of the optical film layer 2 can be less than or equal to 4%, but the present disclosure is not limited thereto.
於本公開中,光學膜層2的厚度大於或等於0.5μm且小於或等於3μm,但本公開並不限於此。在此,所述「光學膜層2的厚度」是指光學膜層2最遠離基板1的一表面201至基板表面11之間的距離。如圖1A和圖1B所示,第一膜層21為光學膜層2最遠離基板1的膜層,換句話說,所述「光學膜層2的厚度」可指第一膜層21的表面211至基板表面11之間的距離。當光學膜層2的厚度符合前述範圍時,可在達到降低反射光的功效時維持薄型化。In the present disclosure, the thickness of the optical film layer 2 is greater than or equal to 0.5 μm and less than or equal to 3 μm, but the present disclosure is not limited thereto. Here, the "thickness of the optical film layer 2" refers to the distance from the surface 201 of the optical film layer 2 that is farthest from the substrate 1 to the substrate surface 11. As shown in FIGS. 1A and 1B , the first film layer 21 is the film layer of the optical film layer 2 farthest from the substrate 1 . In other words, the “thickness of the optical film layer 2 ” may refer to the surface of the first film layer 21 211 to the substrate surface 11. When the thickness of the optical film layer 2 meets the aforementioned range, the thickness can be maintained while achieving the effect of reducing reflected light.
於本公開中,光學膜層2可使用合適的鍍膜或塗布方法製備,例如蒸鍍法、濺鍍法、離子束蒸鍍、浸塗法、旋塗法、滾筒塗布法、刮刀塗布法、噴塗法,但本公開並不限於此。第一膜層21和第二膜層22可分別使用相同或不相同的方法製備。In the present disclosure, the optical film layer 2 can be prepared using a suitable coating or coating method, such as evaporation, sputtering, ion beam evaporation, dip coating, spin coating, roller coating, blade coating, and spray coating. method, but the present disclosure is not limited thereto. The first film layer 21 and the second film layer 22 can be prepared using the same or different methods respectively.
此外,如圖1A和圖1B所示,光學膜層2可更包含一第三膜層23及一第四膜層24,第三膜層23及第四膜層24設置於第一膜層21與第二膜層22之下,其中,在光學波長550nm下,第三膜層23的折射率不同於第四膜層24的折射率。更具體地,第三膜層23設置於第二膜層22與第四膜層24之間,且在光學波長550nm下,第一膜層21及第三膜層23的折射率分別小於第二膜層22與第四膜層24的折射率。藉由高低折射率的膜層交替堆疊設計,可提升光學膜層2降低反射光的功效。In addition, as shown in FIGS. 1A and 1B , the optical film layer 2 may further include a third film layer 23 and a fourth film layer 24 , and the third film layer 23 and the fourth film layer 24 are disposed on the first film layer 21 and under the second film layer 22, where, at an optical wavelength of 550 nm, the refractive index of the third film layer 23 is different from the refractive index of the fourth film layer 24. More specifically, the third film layer 23 is disposed between the second film layer 22 and the fourth film layer 24, and at an optical wavelength of 550 nm, the refractive index of the first film layer 21 and the third film layer 23 are respectively smaller than the second film layer 23. The refractive index of the film layer 22 and the fourth film layer 24. Through the alternate stacking design of high and low refractive index film layers, the effect of the optical film layer 2 on reducing reflected light can be improved.
於本公開中,第四膜層24為光學膜層2最靠近基板1的膜層,更具體地,如圖1A和圖1B所示,第四膜層24可與基板表面11接觸,換句話說,於本實施例中,與第一膜層21相比,光學膜層2是以較高折射率的膜層(例如第四膜層24)與基板表面11接觸,但本公開並不限於此。In the present disclosure, the fourth film layer 24 is the film layer of the optical film layer 2 closest to the substrate 1. More specifically, as shown in FIGS. 1A and 1B, the fourth film layer 24 can be in contact with the substrate surface 11. In other words In other words, in this embodiment, compared with the first film layer 21 , the optical film layer 2 uses a film layer with a higher refractive index (for example, the fourth film layer 24 ) to contact the substrate surface 11 , but this disclosure is not limited to this.
於本公開中,第三膜層23的材料可與第一膜層21的材料相似,第四膜層24的材料可與第二膜層22的材料相似,在此不再贅述。因此,在光學波長550nm下,第三膜層23的折射率大於或等於1.38且小於或等於1.48;第三膜層23的消光係數(k)可大致上為0(例如可為10 -4至10 -5),換句話說,第三膜層23具有較差吸收光的效果。在光學波長550nm下,第四膜層24的折射率大於或等於1.8且小於或等於2.1;第四膜層24的消光係數(k)大於或等於0.01且小於或等於0.05,換句話說,第四膜層24可具有較佳吸收光的效果,可進一步降低反射光之功效。此外,可使用相同或不相同的材料來分別製備第一膜層21和第三膜層23,相似地,也可使用相同或不相同的材料來分別製備第二膜層22和第四膜層24。於本公開之一實施例中,第一膜層21的材料與第三膜層23的材料相同,第二膜層22的材料與第四膜層24的材料相同。另外,第三膜層23和第四膜層24的製備方法可與第一膜層21和第二膜層22相似,在此不再贅述。 In the present disclosure, the material of the third film layer 23 may be similar to the material of the first film layer 21 , and the material of the fourth film layer 24 may be similar to the material of the second film layer 22 , which will not be described again here. Therefore, under the optical wavelength of 550 nm, the refractive index of the third film layer 23 is greater than or equal to 1.38 and less than or equal to 1.48; the extinction coefficient (k) of the third film layer 23 can be substantially 0 (for example, it can be 10 -4 to 10 -5 ), in other words, the third film layer 23 has poor light absorption effect. At an optical wavelength of 550 nm, the refractive index of the fourth film layer 24 is greater than or equal to 1.8 and less than or equal to 2.1; the extinction coefficient (k) of the fourth film layer 24 is greater than or equal to 0.01 and less than or equal to 0.05. In other words, The fourth film layer 24 can have a better light absorption effect and can further reduce the effect of reflected light. In addition, the same or different materials may be used to prepare the first film layer 21 and the third film layer 23 respectively. Similarly, the same or different materials may be used to prepare the second film layer 22 and the fourth film layer respectively. twenty four. In one embodiment of the present disclosure, the material of the first film layer 21 is the same as the material of the third film layer 23 , and the material of the second film layer 22 is the same as the material of the fourth film layer 24 . In addition, the preparation method of the third film layer 23 and the fourth film layer 24 can be similar to the first film layer 21 and the second film layer 22, and will not be described again here.
此外,雖然圖未示,於本公開之其他實施態樣中,第二膜層22與第三膜層23之間可更包含複數膜層,該複數膜層的材料與第一膜層21和第二膜層22相似,因此,在光學波長550nm下,複數膜層的折射率分別大於或等於1.38且小於或等於1.48或者大於或等於1.8且小於或等於2.1,複數膜層的消光係數(k)可大致上為0(例如可為10 -4至10 -5)或者大於或等於0.01且小於或等於0.05。藉由高低折射率的膜層交替堆疊設計,可提升光學膜層2的降低反射光的功效。 In addition, although not shown in the figure, in other embodiments of the present disclosure, a plurality of film layers may be further included between the second film layer 22 and the third film layer 23 , and the materials of the plurality of film layers are different from those of the first film layer 21 and the first film layer 21 . The second film layer 22 is similar. Therefore, under the optical wavelength of 550 nm, the refractive index of the plurality of film layers is greater than or equal to 1.38 and less than or equal to 1.48 or greater than or equal to 1.8 and less than or equal to 2.1. The extinction coefficient of the plurality of film layers (k ) may be substantially 0 (eg, may be 10 -4 to 10 -5 ) or greater than or equal to 0.01 and less than or equal to 0.05. Through the alternate stacking design of film layers with high and low refractive index, the effect of reducing reflected light of the optical film layer 2 can be improved.
圖2為本公開之一實施例之光學膜層之示意圖。其中,圖2的光學膜層與圖1B相似,除了以下差異。FIG. 2 is a schematic diagram of an optical film layer according to an embodiment of the present disclosure. Among them, the optical film layer in Figure 2 is similar to Figure 1B except for the following differences.
如圖1A和圖2所示,光學膜層2可更包含一第五膜層25,第五膜層25設置於第四膜層24與基板1之間,且在光學波長550nm下,第五膜層25的折射率分別小於第二膜層22與第四膜層24的折射率。As shown in FIG. 1A and FIG. 2 , the optical film layer 2 may further include a fifth film layer 25 . The fifth film layer 25 is disposed between the fourth film layer 24 and the substrate 1 , and at an optical wavelength of 550 nm, the fifth film layer 25 is The refractive index of the film layer 25 is smaller than the refractive index of the second film layer 22 and the fourth film layer 24 respectively.
於本公開中,第五膜層25的材料可與第一膜層21的材料相似,在此不再贅述。因此,在光學波長550nm下,第五膜層25的折射率大於或等於1.38且小於或等於1.48;第五膜層25的消光係數(k)可大致上為0(例如可為10 -4至10 -5)。此外,可使用相同或不相同的材料來分別製備第一膜層21、第三膜層23和第五膜層25。於本公開之一實施例中,第五膜層25的材料與第一膜層21的材料相同。另外,第五膜層25的製備方法可與第一膜層21相似,在此不再贅述。 In the present disclosure, the material of the fifth film layer 25 may be similar to the material of the first film layer 21 and will not be described again here. Therefore, under the optical wavelength of 550 nm, the refractive index of the fifth film layer 25 is greater than or equal to 1.38 and less than or equal to 1.48; the extinction coefficient (k) of the fifth film layer 25 can be substantially 0 (for example, it can be 10 -4 to 10-5 ). In addition, the same or different materials may be used to prepare the first film layer 21 , the third film layer 23 and the fifth film layer 25 respectively. In one embodiment of the present disclosure, the material of the fifth film layer 25 is the same as the material of the first film layer 21 . In addition, the preparation method of the fifth film layer 25 can be similar to that of the first film layer 21 and will not be described again.
此外,如圖1A和圖2所示,第五膜層25為光學膜層2最靠近基板1的膜層,更具體地,第五膜層25可與基板表面11接觸,換句話說,於本實施例中,與第二膜層22相比,是以較低折射率的膜層與基板表面11接觸,但本公開並不限於此。In addition, as shown in FIG. 1A and FIG. 2 , the fifth film layer 25 is the film layer of the optical film layer 2 closest to the substrate 1 . More specifically, the fifth film layer 25 can be in contact with the substrate surface 11 . In other words, In this embodiment, compared with the second film layer 22 , a film layer with a lower refractive index is in contact with the substrate surface 11 , but the disclosure is not limited thereto.
此外,雖然圖未示,於本公開之其他實施態樣中,第二膜層22與第三膜層23之間可更包含複數膜層,該複數膜層的材料與第一膜層21和第二膜層22相似,因此,在光學波長550nm下,複數膜層的折射率可分別大於或等於1.38且小於或等於1.48或者大於或等於1.8且小於或等於2.1,複數膜層的消光係數(k)可約為0或者大於或等於0.01且小於或等於0.05。藉由高低折射率的膜層交替堆疊設計,可提升光學膜層2的降低反射光的功效。In addition, although not shown in the figure, in other embodiments of the present disclosure, a plurality of film layers may be further included between the second film layer 22 and the third film layer 23 , and the materials of the plurality of film layers are different from those of the first film layer 21 and the first film layer 21 . The second film layer 22 is similar. Therefore, under the optical wavelength of 550 nm, the refractive index of the plurality of film layers may be greater than or equal to 1.38 and less than or equal to 1.48, or greater than or equal to 1.8 and less than or equal to 2.1. The extinction coefficients of the plurality of film layers ( k) may be about 0 or greater than or equal to 0.01 and less than or equal to 0.05. Through the alternate stacking design of film layers with high and low refractive index, the effect of reducing reflected light of the optical film layer 2 can be improved.
圖3為本公開之一實施例之光學膜層之示意圖。其中,圖3的光學膜層與圖1B相似,除了以下差異。FIG. 3 is a schematic diagram of an optical film layer according to an embodiment of the present disclosure. Among them, the optical film layer in Figure 3 is similar to Figure 1B except for the following differences.
如圖3所示,第二膜層22與第三膜層23之間可更包含複數膜層,該複數膜層例如可為6個膜層,因此,於本實施例中,光學膜層2是由10個膜層所組成。此外,6個膜層可由低折射率材料和高折射率材料交替堆疊形成,更具體地,自第二膜層22往第三膜層23的方向,6個膜層可由低折射率材料-高折射率材料-低折射率材料-高折射率材料-低折射率材料-高折射率材料所組成。其中,低折射率材料可與第一膜層21的材料相似,高折射率材料可與第二膜層22的材料相似,在此不再贅述。此外,每層的高折射率材料可為相同或不相同,每層的低折射率材料可為相同或不相同。As shown in FIG. 3 , a plurality of film layers may be further included between the second film layer 22 and the third film layer 23 . The plurality of film layers may be, for example, 6 film layers. Therefore, in this embodiment, the optical film layer 2 It is composed of 10 film layers. In addition, the six film layers may be formed by alternately stacking low refractive index materials and high refractive index materials. More specifically, from the second film layer 22 to the third film layer 23 , the six film layers may be formed by low refractive index materials-high refractive index materials. It is composed of refractive index material-low refractive index material-high refractive index material-low refractive index material-high refractive index material. The low refractive index material may be similar to the material of the first film layer 21 , and the high refractive index material may be similar to the material of the second film layer 22 , which will not be described again here. In addition, the high refractive index materials of each layer may be the same or different, and the low refractive index materials of each layer may be the same or different.
於本實施例中,由10個膜層所組成的光學膜層2的厚度可介於600奈米(nm)至700奈米(nm)之間。以光學模擬軟體進行計算,在光學波長550nm下,光學膜層2的透光率大於或等於60%且小於或等於80%,反射率大於或等於1.9%且小於或等於3.1%。In this embodiment, the thickness of the optical film layer 2 composed of 10 film layers can be between 600 nanometers (nm) and 700 nanometers (nm). Calculated using optical simulation software, at an optical wavelength of 550 nm, the transmittance of optical film layer 2 is greater than or equal to 60% and less than or equal to 80%, and the reflectivity is greater than or equal to 1.9% and less than or equal to 3.1%.
以上的具體實施例應被解釋為僅僅是說明性的,而不以任何方式限制本公開的其餘部分。The above specific examples are to be construed as illustrative only and not in any way limiting of the remainder of the disclosure.
100:蓋板裝置 1:基板 11:基板表面 2:光學膜層 201:表面 21:第一膜層 211:表面 22:第二膜層 23:第三膜層 24:第四膜層 25:第五膜層 100:Cover device 1:Substrate 11:Substrate surface 2: Optical coating layer 201: Surface 21: First film layer 211:Surface 22: Second film layer 23: The third film layer 24:The fourth film layer 25:Fifth film layer
圖1A為本公開之一實施例之蓋板裝置之示意圖。 圖1B為本公開之一實施例之光學膜層之示意圖。 圖2為本公開之一實施例之光學膜層之示意圖。 圖3為本公開之一實施例之光學膜層之示意圖。 FIG. 1A is a schematic diagram of a cover device according to an embodiment of the present disclosure. FIG. 1B is a schematic diagram of an optical film layer according to an embodiment of the present disclosure. FIG. 2 is a schematic diagram of an optical film layer according to an embodiment of the present disclosure. FIG. 3 is a schematic diagram of an optical film layer according to an embodiment of the present disclosure.
無without
100:蓋板裝置 100:Cover device
1:基板 1:Substrate
11:基板表面 11:Substrate surface
2:光學膜層 2: Optical coating layer
201:表面 201: Surface
Claims (14)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW111116312A TW202343032A (en) | 2022-04-29 | 2022-04-29 | Cover plate device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW111116312A TW202343032A (en) | 2022-04-29 | 2022-04-29 | Cover plate device |
Publications (1)
Publication Number | Publication Date |
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TW202343032A true TW202343032A (en) | 2023-11-01 |
Family
ID=89720572
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW111116312A TW202343032A (en) | 2022-04-29 | 2022-04-29 | Cover plate device |
Country Status (1)
Country | Link |
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TW (1) | TW202343032A (en) |
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2022
- 2022-04-29 TW TW111116312A patent/TW202343032A/en unknown
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