TW202340375A - Thermally conductive silicone composition, thermally conductive silicone sheet, and method for manufacturing said sheet - Google Patents
Thermally conductive silicone composition, thermally conductive silicone sheet, and method for manufacturing said sheet Download PDFInfo
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- TW202340375A TW202340375A TW111142045A TW111142045A TW202340375A TW 202340375 A TW202340375 A TW 202340375A TW 111142045 A TW111142045 A TW 111142045A TW 111142045 A TW111142045 A TW 111142045A TW 202340375 A TW202340375 A TW 202340375A
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- Prior art keywords
- thermally conductive
- particles
- sheet
- vol
- polysiloxane
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- 229920001296 polysiloxane Polymers 0.000 title claims abstract description 78
- 239000000203 mixture Substances 0.000 title claims abstract description 31
- 238000000034 method Methods 0.000 title claims abstract description 14
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 9
- 239000002245 particle Substances 0.000 claims abstract description 130
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 46
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 31
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 claims abstract description 27
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 24
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 16
- 150000001875 compounds Chemical class 0.000 claims abstract description 7
- -1 polysiloxane Polymers 0.000 claims description 66
- 229920000642 polymer Polymers 0.000 claims description 23
- 239000011159 matrix material Substances 0.000 claims description 11
- 239000002131 composite material Substances 0.000 claims description 10
- 230000006835 compression Effects 0.000 claims description 10
- 238000007906 compression Methods 0.000 claims description 10
- 238000002156 mixing Methods 0.000 claims description 8
- 238000004381 surface treatment Methods 0.000 claims description 7
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 6
- 235000013870 dimethyl polysiloxane Nutrition 0.000 claims description 6
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims description 6
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000007493 shaping process Methods 0.000 claims description 3
- 229920005573 silicon-containing polymer Polymers 0.000 abstract 1
- 125000003342 alkenyl group Chemical group 0.000 description 21
- 239000000047 product Substances 0.000 description 17
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 16
- 239000003054 catalyst Substances 0.000 description 11
- 239000003795 chemical substances by application Substances 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 9
- 150000002430 hydrocarbons Chemical group 0.000 description 9
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 239000010954 inorganic particle Substances 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 230000005484 gravity Effects 0.000 description 5
- 230000017525 heat dissipation Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 5
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 238000009434 installation Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- 238000007259 addition reaction Methods 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000013065 commercial product Substances 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 239000002683 reaction inhibitor Substances 0.000 description 3
- 238000005096 rolling process Methods 0.000 description 3
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 2
- 238000004131 Bayer process Methods 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 229920005601 base polymer Polymers 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 238000009529 body temperature measurement Methods 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 125000005998 bromoethyl group Chemical group 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- KQAHMVLQCSALSX-UHFFFAOYSA-N decyl(trimethoxy)silane Chemical compound CCCCCCCCCC[Si](OC)(OC)OC KQAHMVLQCSALSX-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000006038 hexenyl group Chemical group 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004344 phenylpropyl group Chemical group 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 description 2
- 125000005023 xylyl group Chemical group 0.000 description 2
- KZEVSDGEBAJOTK-UHFFFAOYSA-N 1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-2-[5-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]-1,3,4-oxadiazol-2-yl]ethanone Chemical compound N1N=NC=2CN(CCC=21)C(CC=1OC(=NN=1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)=O KZEVSDGEBAJOTK-UHFFFAOYSA-N 0.000 description 1
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- WZFUQSJFWNHZHM-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 WZFUQSJFWNHZHM-UHFFFAOYSA-N 0.000 description 1
- JQMFQLVAJGZSQS-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-N-(2-oxo-3H-1,3-benzoxazol-6-yl)acetamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)NC1=CC2=C(NC(O2)=O)C=C1 JQMFQLVAJGZSQS-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- GIMJUMHDIKAZBS-UHFFFAOYSA-N [SiH4].C(CCCCCCCCCCCCCCC)[Si](OCC)(OCC)OCC Chemical class [SiH4].C(CCCCCCCCCCCCCCC)[Si](OCC)(OCC)OCC GIMJUMHDIKAZBS-UHFFFAOYSA-N 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- OTJZCIYGRUNXTP-UHFFFAOYSA-N but-3-yn-1-ol Chemical compound OCCC#C OTJZCIYGRUNXTP-UHFFFAOYSA-N 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- SXPLZNMUBFBFIA-UHFFFAOYSA-N butyl(trimethoxy)silane Chemical compound CCCC[Si](OC)(OC)OC SXPLZNMUBFBFIA-UHFFFAOYSA-N 0.000 description 1
- 238000003490 calendering Methods 0.000 description 1
- UOUDIVQOIUZSDB-UHFFFAOYSA-M chloroplatinum(1+) Chemical compound [Pt+]Cl UOUDIVQOIUZSDB-UHFFFAOYSA-M 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- BAAAEEDPKUHLID-UHFFFAOYSA-N decyl(triethoxy)silane Chemical compound CCCCCCCCCC[Si](OCC)(OCC)OCC BAAAEEDPKUHLID-UHFFFAOYSA-N 0.000 description 1
- YGUFXEJWPRRAEK-UHFFFAOYSA-N dodecyl(triethoxy)silane Chemical compound CCCCCCCCCCCC[Si](OCC)(OCC)OCC YGUFXEJWPRRAEK-UHFFFAOYSA-N 0.000 description 1
- SCPWMSBAGXEGPW-UHFFFAOYSA-N dodecyl(trimethoxy)silane Chemical compound CCCCCCCCCCCC[Si](OC)(OC)OC SCPWMSBAGXEGPW-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- RSKGMYDENCAJEN-UHFFFAOYSA-N hexadecyl(trimethoxy)silane Chemical compound CCCCCCCCCCCCCCCC[Si](OC)(OC)OC RSKGMYDENCAJEN-UHFFFAOYSA-N 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 238000006459 hydrosilylation reaction Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- VUGRNZHKYVHZSN-UHFFFAOYSA-N oct-1-yn-3-ol Chemical compound CCCCCC(O)C#C VUGRNZHKYVHZSN-UHFFFAOYSA-N 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- MSRJTTSHWYDFIU-UHFFFAOYSA-N octyltriethoxysilane Chemical compound CCCCCCCC[Si](OCC)(OCC)OCC MSRJTTSHWYDFIU-UHFFFAOYSA-N 0.000 description 1
- 229960003493 octyltriethoxysilane Drugs 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000004045 organic chlorine compounds Chemical class 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 125000005375 organosiloxane group Chemical group 0.000 description 1
- 125000005386 organosiloxy group Chemical group 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 150000002940 palladium Chemical class 0.000 description 1
- 150000003057 platinum Chemical class 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 150000003283 rhodium Chemical class 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- WUMSTCDLAYQDNO-UHFFFAOYSA-N triethoxy(hexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)OCC WUMSTCDLAYQDNO-UHFFFAOYSA-N 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- HILHCDFHSDUYNX-UHFFFAOYSA-N trimethoxy(pentyl)silane Chemical compound CCCCC[Si](OC)(OC)OC HILHCDFHSDUYNX-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5415—Silicon-containing compounds containing oxygen containing at least one Si—O bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
- H05K7/20—Modifications to facilitate cooling, ventilating, or heating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Thermal Sciences (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
本發明係關於一種低壓縮應力之熱傳導性聚矽氧組成物、熱傳導性聚矽氧片及其製造方法。The invention relates to a low compressive stress thermally conductive polysiloxane composition, a thermally conductive polysiloxane sheet and a manufacturing method thereof.
近年來,CPU等半導體之性能顯著提升,發熱量亦隨之變得巨大。因此,於如發熱之電子零件中安裝散熱體,並使用熱傳導性片以改善半導體與散熱部之密接性。於專利文獻1及2中,提出一種以粒徑不同之氫氧化鋁粒子為熱傳導性粒子之主成分之熱傳導性片。於專利文獻3中,提出利用鈦酸酯對氫氧化鋁粒子進行表面處理後將其用作熱傳導材料。 [先前技術文獻] [專利文獻] In recent years, the performance of semiconductors such as CPUs has been significantly improved, and the amount of heat generated has also become huge. Therefore, a heat sink is installed in an electronic component that generates heat, and a thermally conductive sheet is used to improve the adhesion between the semiconductor and the heat sink. Patent Documents 1 and 2 propose a thermally conductive sheet in which aluminum hydroxide particles with different particle sizes are used as the main component of thermally conductive particles. Patent Document 3 proposes surface treatment of aluminum hydroxide particles with titanate and then using the aluminum hydroxide particles as a heat conductive material. [Prior technical literature] [Patent Document]
[專利文獻1]日本特開2011-089079號公報 [專利文獻2]日本特開2011-178821號公報 [專利文獻3]WO2016-068240號說明書 [Patent Document 1] Japanese Patent Application Publication No. 2011-089079 [Patent Document 2] Japanese Patent Application Publication No. 2011-178821 [Patent Document 3] Specification No. WO2016-068240
[發明所欲解決之課題][Problem to be solved by the invention]
然而,上述專利文獻1及2中,由於不含破碎狀氧化鋁粒子,並且相對於熱傳導性粒子總量而言含有大量氫氧化鋁粒子,故而存在壓縮應力較高、安裝時對電子零件之負載較大之問題。又,專利文獻3中,由於利用鈦酸酯對氫氧化鋁粒子進行表面處理,故而於耐熱性方面存在問題,要求進一步改善。However, in the above-mentioned Patent Documents 1 and 2, since they do not contain crushed alumina particles and contain a large amount of aluminum hydroxide particles relative to the total amount of thermally conductive particles, there is a high compressive stress and a load on electronic components during mounting. Bigger problem. Furthermore, in Patent Document 3, since the aluminum hydroxide particles are surface-treated with titanate, there is a problem in terms of heat resistance, and further improvement is required.
本發明為解決上述以往之問題,而提供一種壓縮應力較低、安裝時對電子零件之負載較小、耐熱性亦較高、且可靠性較高之熱傳導性聚矽氧組成物、熱傳導性聚矽氧片及其製造方法。 [解決課題之技術手段] In order to solve the above problems in the past, the present invention provides a low -composite stress, low load on electronic parts during installation, high heat resistance, and high reliability. Silicone sheets and methods of making the same. [Technical means to solve the problem]
本發明之熱傳導性聚矽氧組成物係含有聚矽氧基質聚合物(A)、熱傳導性粒子(B)、及矽烷偶合劑(C)者,其特徵在於: 上述聚矽氧基質聚合物(A)為加成硬化型二甲基聚矽氧烷, 上述熱傳導性粒子(B)含有氫氧化鋁粒子(B1)、球形氧化鋁粒子(B2)、及破碎狀氧化鋁粒子(B3),且含有未預先進行表面處理之粒子, 當將上述熱傳導性聚矽氧組成物設為100 vol.%時,上述熱傳導性粒子(B)為20 vol.%以上80 vol.%以下, 上述矽烷偶合劑(C)為R 1 nSi(OR 2) 4-n(其中,R 1為碳數3~16之烷基,R 2為碳數1或2之烷基,n為1~3)所表示之化合物,且含有根據上述熱傳導性粒子(B)中之上述未預先進行表面處理之粒子之BET比表面積與矽烷偶合劑之最小被覆面積及摻合量利用下述式(數式1)計算出之表面被覆率為150%以上之量。[數式1] The thermally conductive polysiloxane composition of the present invention contains polysiloxane matrix polymer (A), thermally conductive particles (B), and silane coupling agent (C), and is characterized by: the above-mentioned polysiloxane matrix polymer ( A) is addition-curable dimethylpolysiloxane, and the thermally conductive particles (B) contain aluminum hydroxide particles (B1), spherical alumina particles (B2), and crushed alumina particles (B3), and Contains particles that have not been surface-treated in advance. When the thermally conductive polysiloxane composition is 100 vol.%, the thermally conductive particles (B) are 20 vol.% or more and 80 vol.% or less. The silane coupling agent (C) is represented by R 1 n Si (OR 2 ) 4-n (where R 1 is an alkyl group with 3 to 16 carbon atoms, R 2 is an alkyl group with 1 or 2 carbon atoms, and n is 1 to 3) The compound containing the thermally conductive particle (B) is calculated based on the BET specific surface area of the particles without prior surface treatment and the minimum coverage area and blending amount of the silane coupling agent using the following formula (Formula 1) The surface coverage rate is more than 150%. [Formula 1]
本發明之熱傳導性聚矽氧片之特徵在於:其係將上述熱傳導性聚矽氧組成物成形為片並進行硬化而成。The thermally conductive polysilicone sheet of the present invention is characterized in that it is formed by shaping the above thermally conductive polysiloxane composition into a sheet and hardening it.
本發明之熱傳導性聚矽氧片之製造方法之特徵在於:將上述熱傳導性聚矽氧組成物之複合物成形為片,並進行加熱硬化。 [發明之效果] The manufacturing method of the thermally conductive polysilicone sheet of the present invention is characterized in that the composite of the thermally conductive polysiloxane composition is formed into a sheet and then heated and hardened. [Effects of the invention]
本發明之熱傳導性聚矽氧組成物含有聚矽氧基質聚合物(A)、熱傳導性粒子(B)、及矽烷偶合劑(C),上述聚矽氧基質聚合物(A)為加成硬化型二甲基聚矽氧烷,上述熱傳導性粒子(B)含有氫氧化鋁粒子(B1)、球形氧化鋁粒子(B2)、及破碎狀氧化鋁粒子(B3),當將上述熱傳導性聚矽氧組成物設為100 vol.%時,上述熱傳導性粒子(B)為20 vol.%以上80 vol.%以下,藉此,可提供一種壓縮應力較低、安裝時對電子零件之負載較小、耐熱性亦較高、且可靠性較高之熱傳導性聚矽氧組成物、熱傳導性聚矽氧片及其製造方法。The thermally conductive polysiloxane composition of the present invention contains polysiloxane matrix polymer (A), thermally conductive particles (B), and silane coupling agent (C). The polysiloxane matrix polymer (A) is addition hardened. Type dimethyl polysiloxane, the thermally conductive particles (B) contain aluminum hydroxide particles (B1), spherical alumina particles (B2), and crushed alumina particles (B3). When the thermally conductive polysiloxane is When the oxygen composition is 100 vol.%, the thermally conductive particles (B) are 20 vol.% or more and 80 vol.% or less. This provides a system with low compressive stress and low load on electronic components during installation. , a thermally conductive polysiloxane composition with high heat resistance and high reliability, a thermally conductive polysiloxane sheet and a manufacturing method thereof.
本發明之熱傳導性聚矽氧組成物含有聚矽氧基質聚合物(A)、熱傳導性粒子(B)、及矽烷偶合劑(C),聚矽氧基質聚合物(A)為加成硬化型二甲基聚矽氧烷。熱傳導性聚矽氧組成物例如較佳為下述者。 (A1)基礎聚合物成分:直鏈狀有機聚矽氧烷,其於1分子中含有平均2個以上且與分子鏈兩末端之矽原子鍵結之烯基。 (A2)交聯成分:於1分子中含有平均2個以上之與矽原子鍵結之氫原子的有機氫化聚矽氧烷相對於上述A1成分中之與矽原子鍵結之烯基1莫耳為未達3莫耳之量。 (B)熱傳導性粒子:含有氫氧化鋁粒子(B1)、球形氧化鋁粒子(B2)、及破碎狀氧化鋁粒子(B3),當將熱傳導性聚矽氧組成物設為100 vol.%時,熱傳導性粒子(B)為20 vol.%以上80 vol.%以下。上述熱傳導性粒子之添加量較佳為30~80 vol.%,更佳為40~80 vol.%,進而較佳為45~75 vol.%。藉此,可提高熱傳導率,並可較佳地作為電子零件等之發熱部與散熱部之間之散熱體TIM(Thermal Interface Material)。熱傳導性粒子含有未預先進行表面處理之粒子,較佳為熱傳導性粒子全部未預先進行表面處理。 (C)矽烷偶合劑:R 1 nSi(OR 2) 4-n(其中,R 1為碳數3~16之烷基,R 2為碳數1或2之烷基,n為1~3)所表示之化合物,且含有根據上述熱傳導性粒子(B)中之上述未預先進行表面處理之熱傳導性粒子之BET比表面積與矽烷偶合劑之最小被覆面積及摻合量利用上述式(數式1)計算出之表面被覆率為150%以上之量。 最小被覆面積可由矽烷偶合劑製造商所提交之資料獲知。又,亦可根據矽烷之分子量計算出。上述表面被覆率較佳為160%以上,更佳為170%以上,進而較佳為180%以上。 (D)觸媒成分:相對於A1成分,以金屬原子重量計為0.01~1000 ppm。觸媒較佳為鉑系化合物。 The thermally conductive polysiloxane composition of the present invention contains polysiloxane matrix polymer (A), thermally conductive particles (B), and silane coupling agent (C). The polysiloxane matrix polymer (A) is an addition hardening type. Dimethylpolysiloxane. The thermally conductive polysiloxane composition is preferably the following, for example. (A1) Basic polymer component: linear organopolysiloxane, which contains an average of more than two alkenyl groups bonded to silicon atoms at both ends of the molecular chain in one molecule. (A2) Cross-linking component: Organohydrogenated polysiloxane containing an average of more than 2 hydrogen atoms bonded to silicon atoms in 1 molecule relative to 1 mol of alkenyl groups bonded to silicon atoms in the above A1 component The amount is less than 3 moles. (B) Thermal conductive particles: Containing aluminum hydroxide particles (B1), spherical alumina particles (B2), and crushed alumina particles (B3), when the thermal conductive polysiloxane composition is 100 vol.% , the thermally conductive particles (B) are 20 vol.% or more and 80 vol.% or less. The addition amount of the thermally conductive particles is preferably 30 to 80 vol.%, more preferably 40 to 80 vol.%, and still more preferably 45 to 75 vol.%. In this way, the thermal conductivity can be improved, and it can be preferably used as a heat sink TIM (Thermal Interface Material) between the heat generating part and the heat dissipating part of electronic components. The thermally conductive particles include particles that have not been surface-treated in advance, and preferably all the thermally conductive particles have not been surface-treated in advance. (C) Silane coupling agent: R 1 n Si (OR 2 ) 4-n (where R 1 is an alkyl group with 3 to 16 carbon atoms, R 2 is an alkyl group with 1 or 2 carbon atoms, and n is 1 to 3 ), and contains a compound represented by the above-mentioned thermally conductive particles (B) based on the BET specific surface area of the above-mentioned thermally conductive particles that have not been surface-treated in advance and the minimum coverage area and blending amount of the silane coupling agent. The above formula (numeric formula 1) The calculated surface coverage rate is above 150%. The minimum coverage area can be obtained from the information submitted by the silane coupling agent manufacturer. In addition, it can also be calculated based on the molecular weight of silane. The above-mentioned surface coverage rate is preferably 160% or more, more preferably 170% or more, and further preferably 180% or more. (D) Catalyst component: 0.01 to 1000 ppm based on metal atomic weight relative to the A1 component. The catalyst is preferably a platinum-based compound.
於上述組成物中,聚矽氧基質聚合物(A)可使用市售品。該市售品通常分為A劑與B劑,一者含有上述(A1)成分與觸媒成分(D),另一者含有交聯成分(A2)與硬化反應抑制劑。In the above composition, a commercially available product can be used as the polysiloxane matrix polymer (A). This commercial product is usually divided into A agent and B agent. One contains the above-mentioned component (A1) and the catalyst component (D), and the other contains the cross-linking component (A2) and the hardening reaction inhibitor.
氫氧化鋁粒子(B1)之平均粒徑較佳為10 μm以上110 μm以下,更佳為15~100 μm,進而較佳為20~90 μm。又,當將熱傳導性粒子之總體積設為100 vol.%時,氫氧化鋁粒子(B1)之添加量較佳為20 vol.%以上80 vol.%以下,更佳為30~75 vol.%,進而較佳為40~70 vol.%。氫氧化鋁粒子之形狀較佳為塊狀。The average particle diameter of the aluminum hydroxide particles (B1) is preferably from 10 μm to 110 μm, more preferably from 15 to 100 μm, and still more preferably from 20 to 90 μm. Moreover, when the total volume of the thermally conductive particles is 100 vol.%, the amount of aluminum hydroxide particles (B1) added is preferably 20 vol.% or more and 80 vol.% or less, more preferably 30 to 75 vol.%. %, and more preferably 40 to 70 vol.%. The shape of the aluminum hydroxide particles is preferably block-like.
球形氧化鋁粒子(B2)之平均粒徑較佳為1 μm以上110 μm以下,更佳為2~100 μm。球形氧化鋁粒子(B2)亦可將平均粒徑為1~30 μm者與平均粒徑超過30 μm且為110 μm以下者併用複數種。再者,於本說明書中,「球形氧化鋁」係指藉由熔融法所獲得之真球形氧化鋁。The average particle diameter of the spherical alumina particles (B2) is preferably from 1 μm to 110 μm, more preferably from 2 to 100 μm. A plurality of spherical alumina particles (B2) may be used in combination with those having an average particle diameter of 1 to 30 μm and those having an average particle diameter exceeding 30 μm and being 110 μm or less. Furthermore, in this specification, "spherical alumina" refers to true spherical alumina obtained by a melting method.
破碎狀氧化鋁粒子(B3)之平均粒徑較佳為10 μm以下,更佳為0.01~10 μm,進而較佳為0.1~8 μm。藉由併用小粒徑之破碎狀氧化鋁粒子(B3),可獲得適合加工之複合物,亦可兼顧熱傳導率與低負載化。The average particle diameter of the crushed alumina particles (B3) is preferably 10 μm or less, more preferably 0.01 to 10 μm, further preferably 0.1 to 8 μm. By using the crushed alumina particles (B3) with a small particle size in combination, a composite suitable for processing can be obtained, and it can also achieve both thermal conductivity and low load.
當將熱傳導性粒子之總體積設為100 vol.%時,球形氧化鋁粒子(B2)與破碎狀氧化鋁粒子(B3)之總量較佳為20 vol.%以上80 vol.%以下,更佳為30~70 vol.%,進而較佳為40~60 vol.%。When the total volume of thermally conductive particles is 100 vol.%, the total amount of spherical alumina particles (B2) and crushed alumina particles (B3) is preferably 20 vol.% or more and 80 vol.% or less, more preferably Preferably, it is 30-70 vol.%, More preferably, it is 40-60 vol.%.
球形氧化鋁粒子(B2)與破碎狀氧化鋁粒子(B3)之添加量較佳為設為B2≦B3。藉此,可獲得適合加工之複合物,亦可兼顧熱傳導率與低負載化。The addition amount of the spherical alumina particles (B2) and the crushed alumina particles (B3) is preferably set to B2≦B3. This makes it possible to obtain a composite that is suitable for processing and can achieve both thermal conductivity and low load.
本發明之熱傳導性聚矽氧片係將上述熱傳導性聚矽氧組成物成形為片並進行硬化而成。只要為片,則可較佳地作為電子零件等之發熱部與散熱部之間之散熱體TIM(Thermal Interface Material)。The thermally conductive polysilicone sheet of the present invention is formed by shaping the above thermally conductive polysiloxane composition into a sheet and hardening it. As long as it is a sheet, it can be preferably used as a heat sink TIM (Thermal Interface Material) between the heat generating part and the heat dissipating part of electronic components.
熱傳導性聚矽氧片之直徑28.6 mm、初始厚度1 mm之片之50%壓縮時之瞬間負載值較佳為900 N以下,更佳為880 N以下。藉此,壓縮應力降低(低負載化),可減少安裝時對電子零件之負載。The instantaneous load value at 50% compression of a thermally conductive polysiloxane sheet with a diameter of 28.6 mm and an initial thickness of 1 mm is preferably 900 N or less, more preferably 880 N or less. This reduces compressive stress (lower load) and reduces the load on electronic components during installation.
熱傳導性聚矽氧片之熱傳導率較佳為2 W/mK以上,進而較佳為2.1 W/mK以上,更佳為2.2 W/mK以上。上限值較佳為20 W/mK以下。The thermal conductivity of the thermally conductive polysiloxane sheet is preferably 2 W/mK or more, further preferably 2.1 W/mK or more, and more preferably 2.2 W/mK or more. The upper limit value is preferably 20 W/mK or less.
關於熱傳導性聚矽氧片之耐熱性,於100℃之空氣中進行老化時,自初始之蕭氏(Shore)硬度00經過100小時後之變化量較佳為在±10以內,更佳為在±8以內,進而較佳為在±6以內。若耐熱性較高,可靠性亦會變高。Regarding the heat resistance of the thermally conductive polysiloxane sheet, when aged in air at 100°C, the change after 100 hours from the initial Shore hardness of 00 is preferably within ±10, and more preferably within Within ±8, and more preferably within ±6. If the heat resistance is higher, the reliability will also be higher.
本發明之熱傳導性聚矽氧片之製造方法較佳為以下步驟。 (1)熱傳導性聚矽氧組成物之製造步驟 分別計量規定量之加成硬化型二甲基聚矽氧烷(例如市售品之A劑及B劑)、熱傳導性粒子(B)(含有氫氧化鋁粒子(B1)、球形氧化鋁粒子(B2)、及破碎狀氧化鋁粒子(B3))、及矽烷偶合劑(C)並混合,製得複合物(混合原料)。本發明中使用之部分熱傳導性粒子亦可預先與矽烷偶合劑混合而進行預處理。使用未預先進行表面處理之熱傳導性粒子(B)之目的在於降低成本。又,將未進行表面處理之熱傳導性粒子(B)與矽烷偶合劑(C)在複合時進行混合之方法一般被稱作整體摻合法(integral blending)。本發明採用該方法。再者,於本發明中不含鈦酸酯預處理品。鈦酸酯預處理品之耐熱性較低,因此不佳。 (2)片成形步驟 藉由輥壓或衝壓將上述複合物(混合原料)成形為片。熱傳導性片之厚度較佳為0.2~10 mm之範圍。 (3)加熱硬化步驟 上述片之加熱硬化條件較佳為溫度70~250℃,時間1~15分鐘。 The manufacturing method of the thermally conductive polysiloxane sheet of the present invention preferably includes the following steps. (1) Manufacturing steps of thermally conductive polysiloxane composition Measure the prescribed amounts of addition-curable dimethyl polysiloxane (such as commercially available agents A and B), thermally conductive particles (B) (containing aluminum hydroxide particles (B1), spherical alumina particles ( B2), crushed alumina particles (B3)), and silane coupling agent (C) are mixed to prepare a composite (mixed raw material). Some of the thermally conductive particles used in the present invention can also be mixed with a silane coupling agent in advance for pretreatment. The purpose of using thermally conductive particles (B) without surface treatment in advance is to reduce costs. In addition, the method of mixing the thermally conductive particles (B) and the silane coupling agent (C) without surface treatment during compounding is generally called integral blending. The present invention adopts this method. Furthermore, titanate pretreatment products are not included in the present invention. Titanate pretreated products have low heat resistance and are therefore not suitable. (2) Sheet forming steps The above-mentioned composite (mixed raw material) is formed into a sheet by rolling or punching. The thickness of the thermally conductive sheet is preferably in the range of 0.2 to 10 mm. (3) Heating and hardening step The preferred heating and hardening conditions for the above-mentioned sheet are a temperature of 70 to 250°C and a time of 1 to 15 minutes.
以下,對各成分進行說明。 (1)基礎聚合物成分(A1成分) 基礎聚合物成分係於一分子中含有2個以上之與矽原子鍵結之烯基之有機聚矽氧烷,含有2個以上之烯基之有機聚矽氧烷為本發明之聚矽氧橡膠組成物中之主劑(基礎聚合物成分)。該有機聚矽氧烷於一分子中具有2個以上之乙烯基、烯丙基等碳原子數2~8、尤佳為2~6之與矽原子鍵結之烯基作為烯基。就作業性、硬化性等觀點而言,較理想為黏度於25℃為10~100,000 mPa‧s,尤佳為100~10,000 mPa‧s。 Each component is explained below. (1) Basic polymer component (A1 component) The basic polymer component is an organopolysiloxane containing more than two alkenyl groups bonded to silicon atoms in one molecule. The organopolysiloxane containing more than two alkenyl groups is the polysiloxane rubber of the present invention. The main agent (basic polymer component) in the composition. The organopolysiloxane has in one molecule two or more alkenyl groups bonded to silicon atoms such as vinyl groups and allyl groups with 2 to 8 carbon atoms, preferably 2 to 6 carbon atoms. From the viewpoint of workability, hardenability, etc., the viscosity is preferably 10 to 100,000 mPa‧s at 25°C, and particularly preferably 100 to 10,000 mPa‧s.
具體而言,使用下述通式(化1)所表示之於1分子中含有平均2個以上且與分子鏈兩末端之矽原子鍵結之烯基的有機聚矽氧烷。其係側鏈由烷基封端之直鏈狀有機聚矽氧烷。就作業性、硬化性等觀點而言,較理想為於25℃之黏度為10~100,000 mPa‧s。再者,該直鏈狀有機聚矽氧烷亦可於分子鏈中含有少量支鏈狀結構(三官能性矽氧烷單元)。 [化1] 式中,R 1為彼此相同或不同之不具有脂肪族不飽和鍵之未經取代或經取代之一價烴基,R 2為烯基,k為0或正整數。其中,作為R 1之不具有脂肪族不飽和鍵之未經取代或經取代之一價烴基,例如較佳為碳原子數1~10、尤佳為1~6之一價烴基,具體而言,可列舉:甲基、乙基、丙基、異丙基、丁基、異丁基、第三丁基、戊基、新戊基、己基、環己基、辛基、壬基、癸基等烷基;苯基、甲苯基、二甲苯基、萘基等芳基;苄基、苯基乙基、苯基丙基等芳烷基;及該等基之氫原子之一部分或全部被氟、溴、氯等鹵素原子、氰基等取代者,例如氯甲基、氯丙基、溴乙基、三氟丙基等鹵素取代烷基、氰乙基等。作為R 2之烯基,例如較佳為碳原子數2~6、尤佳為2~3之烯基,具體而言,可列舉乙烯基、烯丙基、丙烯基、異丙烯基、丁烯基、異丁烯基、己烯基、環己烯基等,較佳為乙烯基。於通式(1)中,k通常為滿足0≦k≦10000之0或正整數,較佳為滿足5≦k≦2000之整數,更佳為滿足10≦k≦1200之整數。 Specifically, an organopolysiloxane represented by the following general formula (Chemical Formula 1) containing an average of two or more alkenyl groups bonded to silicon atoms at both ends of the molecular chain per molecule is used. It is a linear organopolysiloxane with side chains terminated by alkyl groups. From the viewpoint of workability, hardenability, etc., the ideal viscosity at 25°C is 10 to 100,000 mPa‧s. Furthermore, the linear organopolysiloxane may also contain a small amount of branched structure (trifunctional siloxane unit) in the molecular chain. [Chemical 1] In the formula, R 1 is an unsubstituted or substituted monovalent hydrocarbon group that is the same as or different from each other and does not have an aliphatic unsaturated bond, R 2 is an alkenyl group, and k is 0 or a positive integer. Among them, the unsubstituted or substituted monovalent hydrocarbon group without an aliphatic unsaturated bond as R1 is, for example, preferably a monovalent hydrocarbon group having 1 to 10 carbon atoms, particularly preferably 1 to 6 carbon atoms. Specifically, , can be listed: methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, pentyl, neopentyl, hexyl, cyclohexyl, octyl, nonyl, decyl, etc. Alkyl; aryl groups such as phenyl, tolyl, xylyl, naphthyl, etc.; aralkyl groups such as benzyl, phenylethyl, phenylpropyl, etc.; and some or all of the hydrogen atoms of these groups are replaced by fluorine, Those substituted by halogen atoms such as bromine and chlorine, and cyano groups, such as chloromethyl, chloropropyl, bromoethyl, trifluoropropyl and other halogen-substituted alkyl groups, cyanoethyl, etc. The alkenyl group of R 2 is, for example, preferably an alkenyl group having 2 to 6 carbon atoms, particularly preferably 2 to 3 carbon atoms. Specific examples include vinyl, allyl, propenyl, isopropenyl, and butene. group, isobutenyl, hexenyl, cyclohexenyl, etc., preferably vinyl. In the general formula (1), k is usually 0 or a positive integer satisfying 0≦k≦10000, preferably an integer satisfying 5≦k≦2000, and more preferably an integer satisfying 10≦k≦1200.
關於作為A1成分之有機聚矽氧烷,亦可將於一分子中具有3個以上、通常為3~30個、較佳為3~20個左右之例如乙烯基、烯丙基等碳原子數2~8、尤佳為2~6之與矽原子鍵結之烯基的有機聚矽氧烷併用。分子結構可為直鏈狀、環狀、支鏈狀、三維網狀中之任一種分子結構。較佳為主鏈由二有機矽氧烷單元之重複所構成且分子鏈兩末端經三有機矽烷氧基封端的於25℃之黏度為10~100,000 mPa‧s、尤佳為100~10,000 mPa‧s之直鏈狀有機聚矽氧烷。 烯基可與分子之任何部分鍵結。例如,亦可包含與分子鏈末端、或分子鏈非末端(分子鏈中途)之矽原子鍵結者。其中,就作業性、硬化性等而言,較理想為下述通式(化2)所表示之於分子鏈兩末端之矽原子上分別具有1~3個烯基(其中,於與該分子鏈末端之矽原子鍵結之烯基以兩末端合計未達3個之情形時,至少具有1個與分子鏈非末端(分子鏈中途)之矽原子鍵結之烯基(例如作為二有機矽氧烷單元中之取代基)的直鏈狀有機聚矽氧烷)且如上所述於25℃之黏度為10~100,000 mPa‧s者。再者,該直鏈狀有機聚矽氧烷亦可於分子鏈中含有少量支鏈狀結構(三官能性矽氧烷單元)。 [化2] 式中,R 3為彼此相同或不同之未經取代或經取代之一價烴基且至少1個為烯基。R 4為彼此相同或不同之不具有脂肪族不飽和鍵之未經取代或經取代之一價烴基,R 5為烯基,l、m為0或正整數。其中,作為R 3之一價烴基,較佳為碳原子數1~10、尤佳為1~6者,具體而言,可列舉:甲基、乙基、丙基、異丙基、丁基、異丁基、第三丁基、戊基、新戊基、己基、環己基、辛基、壬基、癸基等烷基;苯基、甲苯基、二甲苯基、萘基等芳基;苄基、苯基乙基、苯基丙基等芳烷基;乙烯基、烯丙基、丙烯基、異丙烯基、丁烯基、己烯基、環己烯基、辛烯基等烯基;或該等基之氫原子之一部分或全部被氟、溴、氯等鹵素原子、氰基等取代者,例如氯甲基、氯丙基、溴乙基、三氟丙基等鹵素取代烷基或氰乙基等。 The organopolysiloxane as component A1 may also have 3 or more carbon atoms in one molecule, usually 3 to 30, preferably about 3 to 20, such as vinyl, allyl, etc. 2 to 8. It is particularly preferred to use the organopolysiloxanes of 2 to 6 with alkenyl groups bonded to silicon atoms. The molecular structure can be any of linear, cyclic, branched, and three-dimensional network molecular structures. Preferably, the main chain is composed of repeats of two organosiloxane units and both ends of the molecular chain are terminated with three organosiloxy groups. The viscosity at 25°C is 10~100,000 mPa‧s, especially preferably 100~10,000 mPa‧ s linear organopolysiloxane. Alkenyl groups can be bonded to any part of the molecule. For example, those bonded to silicon atoms at the end of the molecular chain or at the non-end of the molecular chain (in the middle of the molecular chain) may also be included. Among them, in terms of workability, curability, etc., it is preferable to have 1 to 3 alkenyl groups on the silicon atoms at both ends of the molecular chain represented by the following general formula (Chemical Formula 2) (wherein, with the molecule When the total number of alkenyl groups bonded to the silicon atom at the end of the chain does not reach 3, there must be at least one alkenyl group bonded to the silicon atom at the non-end of the molecular chain (midway through the molecular chain) (for example, as a diorganosilicon Linear organopolysiloxane (substituents in the oxyalkane unit)) and the viscosity at 25°C is 10 to 100,000 mPa‧s as mentioned above. Furthermore, the linear organopolysiloxane may also contain a small amount of branched structure (trifunctional siloxane unit) in the molecular chain. [Chemicalization 2] In the formula, R 3 is an unsubstituted or substituted monovalent hydrocarbon group that is the same as or different from each other, and at least one of them is an alkenyl group. R 4 is an unsubstituted or substituted monovalent hydrocarbon group that is the same as or different from each other and does not have an aliphatic unsaturated bond, R 5 is an alkenyl group, and l and m are 0 or positive integers. Among them, the monovalent hydrocarbon group of R 3 is preferably one having 1 to 10 carbon atoms, and particularly preferably 1 to 6 carbon atoms. Specific examples include: methyl, ethyl, propyl, isopropyl, and butyl. , isobutyl, tert-butyl, pentyl, neopentyl, hexyl, cyclohexyl, octyl, nonyl, decyl and other alkyl groups; phenyl, tolyl, xylyl, naphthyl and other aryl groups; Aralkyl groups such as benzyl, phenylethyl, and phenylpropyl; alkenyl groups such as vinyl, allyl, propenyl, isopropenyl, butenyl, hexenyl, cyclohexenyl, and octenyl ; Or some or all of the hydrogen atoms of these groups are substituted by halogen atoms such as fluorine, bromine, chlorine, or cyano groups, such as chloromethyl, chloropropyl, bromoethyl, trifluoropropyl, and other halogen-substituted alkyl groups. Or cyanoethyl, etc.
又,作為R 4之一價烴基,亦較佳為碳原子數1~10、尤佳為1~6者,可例示與上述R 1之具體例相同者,但不含烯基。作為R 5之烯基,例如較佳為碳數2~6、尤佳為碳數2~3者,具體而言,可例示與上述式(化1)之R 2相同者,較佳為乙烯基。 l、m通常為滿足0<l+m≦10000之0或正整數,較佳為滿足5≦l+m≦2000,更佳為10≦l+m≦1200,且0<l/(l+m)≦0.2、較佳為0.0011≦l/(l+m)≦0.1之整數。 In addition, the monovalent hydrocarbon group of R 4 is preferably one having 1 to 10 carbon atoms, and particularly preferably 1 to 6 carbon atoms. Examples of the monovalent hydrocarbon group include the same ones as the specific examples of R 1 described above, except that they do not contain an alkenyl group. The alkenyl group of R 5 is, for example, preferably one having 2 to 6 carbon atoms, and particularly preferably one having 2 to 3 carbon atoms. Specifically, the alkenyl group is the same as R 2 of the above formula (Chemical Formula 1), and preferably it is ethylene. base. l and m are usually 0 or a positive integer that satisfies 0<l+m≦10000, preferably 5≦l+m≦2000, more preferably 10≦l+m≦1200, and 0<l/(l+ m)≦0.2, preferably an integer of 0.0011≦l/(l+m)≦0.1.
(2)交聯成分(A2成分) 本發明之A2成分之有機氫化聚矽氧烷作為交聯劑發揮作用,藉由該成分中之SiH基與A1成分中之烯基發生加成反應(矽氫化)而形成硬化物。該有機氫化聚矽氧烷只要於一分子中具有2個以上之與矽原子鍵結之氫原子(即,SiH基)即可,可為任意之有機氫化聚矽氧烷,該有機氫化聚矽氧烷之分子結構可為直鏈狀、環狀、支鏈狀、三維網狀結構中之任一種,可使用一分子中之矽原子之數量(即,聚合度)為2~1000、尤佳為2~300左右者。 (2) Cross-linked component (A2 component) The organohydrogenated polysiloxane of the A2 component of the present invention functions as a cross-linking agent, and a hardened product is formed by an addition reaction (hydrosilylation) between the SiH group in the component and the alkenyl group in the A1 component. The organohydrogenated polysiloxane can be any organohydrogenated polysiloxane as long as it has more than two hydrogen atoms (i.e., SiH groups) bonded to silicon atoms in one molecule. The organohydrogenated polysiloxane The molecular structure of the oxalane can be any of linear, cyclic, branched, or three-dimensional network structures. The number of silicon atoms in one molecule (ie, the degree of polymerization) is 2 to 1000, which is particularly preferred. It is about 2 to 300.
氫原子所鍵結之矽原子之位置並無特別限制,可為分子鏈之末端,亦可為非末端(中途)。又,作為除氫原子以外之與矽原子鍵結之有機基,可列舉與上述通式(化1)之R 1相同之不具有脂肪族不飽和鍵的未經取代或經取代之一價烴基。 The position of the silicon atom to which the hydrogen atom is bonded is not particularly limited. It can be at the end of the molecular chain or at the non-end (midway). Examples of organic groups other than hydrogen atoms bonded to silicon atoms include unsubstituted or substituted monovalent hydrocarbon groups having no aliphatic unsaturated bonds and the same as R1 of the general formula (Chemical Formula 1) above. .
作為A2成分之有機氫化聚矽氧烷可例示下述結構者。Examples of the organohydrogenated polysiloxane as component A2 include those having the following structures.
上述式中,R 6為彼此相同或不同之氫、烷基、苯基、環氧基、丙烯醯基、甲基丙烯醯基、烷氧基且至少2個為氫。L為0~1,000之整數、尤佳為0~300之整數,M為1~200之整數。 In the above formula, R 6 is the same or different hydrogen, alkyl group, phenyl group, epoxy group, acrylyl group, methacrylyl group, alkoxy group, and at least two of them are hydrogen. L is an integer from 0 to 1,000, particularly preferably an integer from 0 to 300, and M is an integer from 1 to 200.
(3)熱傳導性無機粒子(B成分) B成分之熱傳導性無機粒子如上所述。再者,氧化鋁較佳為純度99.5%以上之α-氧化鋁。平均粒徑係藉由雷射繞射光散射法測定之體積基準之累積粒度分佈之D50(中值徑)。作為該測定器,例如有堀場製作所公司製造之雷射繞射/散射式無機粒子分佈測定裝置LA-950S2。 (3) Thermal conductive inorganic particles (component B) The thermally conductive inorganic particles of component B are as described above. Furthermore, the alumina is preferably α-alumina with a purity of 99.5% or more. The average particle size is the D50 (median diameter) of the volume-based cumulative particle size distribution measured by laser diffraction light scattering. As this measuring device, there is, for example, a laser diffraction/scattering inorganic particle distribution measuring device LA-950S2 manufactured by Horiba Manufacturing Co., Ltd.
(4)矽烷偶合劑(C成分) 矽烷偶合劑(C)使用R 1 nSi(OR 2) 4-n(其中,R 1為碳數3~16之烷基,R 2為碳數1或2之烷基,n為1~3)所表示之烷氧基矽烷化合物。該烷氧基矽烷化合物可為其部分水解物。作為一例,有:丙基三甲氧基矽烷、丁基三甲氧基矽烷、戊基三甲氧基矽烷、己基三甲氧基矽烷、己基三乙氧基矽烷、辛基三甲氧基矽烷、辛基三乙氧基矽烷、癸基三甲氧基矽烷、癸基三乙氧基矽烷、十二基三甲氧基矽烷、十二基三乙氧基矽烷、十六基三甲氧基矽烷、十六基三乙氧基矽烷等矽烷化合物。上述矽烷化合物可使用一種或將兩種以上混合使用。矽烷偶合劑(C成分)於製備複合物時或其後進行熱硬化處理時作為熱傳導性無機粒子之表面處理劑。亦可將烷氧基矽烷與單末端矽烷醇基矽氧烷併用。此處所謂之表面處理除共價鍵結以外,亦包含吸附等。 (4) Silane coupling agent (C component) Silane coupling agent (C) uses R 1 n Si (OR 2 ) 4-n (where R 1 is an alkyl group with 3 to 16 carbon atoms, and R 2 is 1 or 2 alkyl group, n is an alkoxysilane compound represented by 1 to 3). The alkoxysilane compound may be a partial hydrolyzate thereof. Examples include: propyltrimethoxysilane, butyltrimethoxysilane, pentyltrimethoxysilane, hexyltrimethoxysilane, hexyltriethoxysilane, octyltrimethoxysilane, and octyltriethoxysilane Oxysilane, decyltrimethoxysilane, decyltriethoxysilane, dodecyltrimethoxysilane, dodecyltriethoxysilane, hexadecyltrimethoxysilane, hexadecyltriethoxysilane Silane compounds such as silane. The above-mentioned silane compounds may be used alone or in combination of two or more. Silane coupling agent (C component) is used as a surface treatment agent for thermally conductive inorganic particles during the preparation of the composite or subsequent thermal hardening treatment. Alkoxysilane and single-terminal silanolsiloxane can also be used together. The so-called surface treatment here includes, in addition to covalent bonding, adsorption, etc.
(5)觸媒成分(D成分) D成分之觸媒成分係促進硬化之成分。作為D成分,可使用矽氫化反應中使用之觸媒。例如可列舉:鉑黑、氯鉑(II)酸、氯鉑酸、氯鉑酸與一元醇之反應物、氯鉑酸與烯烴類或乙烯基矽氧烷之錯合物、雙乙醯乙酸鉑等鉑系觸媒、鈀系觸媒、銠系觸媒等鉑族金屬觸媒。D成分之摻合量只要為硬化所需之量即可,可視所需之硬化速度等進行適當調整。較佳為相對於A1成分以金屬原子重量計添加0.01~1000 ppm。 (5) Catalyst component (D component) The catalyst component of component D is a component that promotes hardening. As component D, a catalyst used in silicon hydrogenation reaction can be used. Examples include: platinum black, chloroplatin (II) acid, chloroplatinic acid, the reactant of chloroplatinic acid and a monohydric alcohol, complexes of chloroplatinic acid and olefins or vinylsiloxane, platinum bisacetate acetate Platinum group metal catalysts such as platinum series catalysts, palladium series catalysts, rhodium series catalysts, etc. The blending amount of component D only needs to be the amount required for hardening, and can be adjusted appropriately depending on the required hardening speed, etc. It is preferable to add 0.01 to 1000 ppm based on the weight of metal atoms relative to the A1 component.
(6)其他成分 於本發明之組成物中,可視需要摻合除上述以外之成分。例如作為硬化反應抑制劑,可列舉1-乙炔基-1-己醇、3-丁炔-1-醇等乙炔化合物或各種氮化合物、有機磷化合物、肟化合物、有機氯化合物等。作為使用量,較理想為相對於(A)成分100質量份為0.01~1質量份左右。其被添加至市售品之A劑或B劑之一者中。此外,可添加鐵丹等無機顏料等作為著色劑。 (6) Other ingredients In the composition of the present invention, ingredients other than the above may be blended as necessary. For example, examples of the hardening reaction inhibitor include acetylene compounds such as 1-ethynyl-1-hexanol and 3-butyn-1-ol, various nitrogen compounds, organophosphorus compounds, oxime compounds, organochlorine compounds, and the like. The usage amount is preferably about 0.01 to 1 part by mass relative to 100 parts by mass of component (A). This is added to either the A agent or the B agent of the commercial product. In addition, inorganic pigments such as iron oxide can be added as colorants.
以下,使用圖式進行說明。於以下之圖式中,相同符號表示同一物。圖1係將本發明之一實施方式之熱傳導性片組裝至散熱構造體30中之示意性剖視圖。熱傳導性片31b係使半導體元件等電子零件33所產生之熱散發者,且固定於散熱片32之與電子零件33相對之主面32a,夾持於電子零件33與散熱片32之間。又,熱傳導片31a夾持於散熱片32與散熱座(heat sink)35之間。並且,熱傳導片31a、31b與散熱片32一同構成使電子零件33之熱散發之散熱構件。散熱片32例如形成為方形板狀,具有與電子零件33相對之主面32a、及沿著主面32a之外周豎立設置之側壁32b。散熱片32於由側壁32b包圍之主面32a設置有熱傳導片31b,又,於與主面32a相反側之另一面32c,介隔熱傳導片31a而設置有散熱座35。電子零件33例如為BGA等半導體元件,且安裝於配線基板34。Below, a diagram is used for explanation. In the following diagrams, the same symbols represent the same thing. FIG. 1 is a schematic cross-sectional view of a thermally conductive sheet according to an embodiment of the present invention being assembled into a heat dissipation structure 30 . The thermally conductive sheet 31b dissipates heat generated by electronic components 33 such as semiconductor elements, and is fixed to the main surface 32a of the heat sink 32 facing the electronic component 33, and is sandwiched between the electronic component 33 and the heat sink 32. In addition, the heat conduction sheet 31 a is sandwiched between the heat sink 32 and the heat sink 35 . Furthermore, the thermal conductive sheets 31a and 31b together with the heat sink 32 constitute a heat dissipation member that dissipates the heat of the electronic component 33. The heat sink 32 is formed in a square plate shape, for example, and has a main surface 32a facing the electronic component 33, and a side wall 32b erected along the outer periphery of the main surface 32a. The heat sink 32 is provided with a heat conductive sheet 31b on the main surface 32a surrounded by the side wall 32b, and a heat dissipation base 35 is provided on the other surface 32c opposite to the main surface 32a with the heat conductive sheet 31a interposed therebetween. The electronic component 33 is a semiconductor element such as a BGA, for example, and is mounted on the wiring board 34 .
圖2係本發明之一實施方式之塊狀氫氧化鋁粒子(B1)之掃描電子顯微鏡(SEM)照片(倍率600倍)。該塊狀氫氧化鋁粒子係藉由拜耳法製造所得,且已有市售(例如日本輕金屬公司製造之商品名「BW53」,平均粒徑54 μm)。Figure 2 is a scanning electron microscope (SEM) photograph (magnification: 600 times) of bulk aluminum hydroxide particles (B1) according to one embodiment of the present invention. The massive aluminum hydroxide particles are produced by the Bayer process and are already commercially available (for example, the trade name "BW53" manufactured by Nippon Light Metal Co., Ltd., with an average particle size of 54 μm).
圖3係本發明之一實施方式之球形氧化鋁(B2)之掃描電子顯微鏡(SEM)照片(倍率10,000倍)。該球形氧化鋁係藉由熔融法製造所得,且已有市售(例如日鐵化學材料公司製造之商品名「AZ2-75」,平均粒徑2 μm)。圖4係不包含於本發明之球形氧化鋁(B2)中之多邊形或圓形氧化鋁之掃描電子顯微鏡(SEM)照片。Figure 3 is a scanning electron microscope (SEM) photograph (magnification: 10,000 times) of spherical alumina (B2) according to one embodiment of the present invention. The spherical alumina is produced by a melting method and is already commercially available (for example, the trade name "AZ2-75" manufactured by Nippon Steel Chemical Materials Co., Ltd., with an average particle size of 2 μm). Figure 4 is a scanning electron microscope (SEM) photograph of polygonal or circular alumina not included in the spherical alumina (B2) of the present invention.
圖5係本發明之一實施方式之破碎狀氧化鋁(B3)之掃描電子顯微鏡(SEM)照片(倍率6,000倍)。該破碎狀氧化鋁係藉由拜耳法製造所得,且已有市售(例如住友化學公司製造之商品名「ALM-41-01」,平均粒徑1~2 μm)。 [實施例] Figure 5 is a scanning electron microscope (SEM) photograph (magnification: 6,000 times) of crushed alumina (B3) according to one embodiment of the present invention. This crushed alumina is produced by the Bayer process and is commercially available (for example, it is manufactured by Sumitomo Chemical Company under the trade name "ALM-41-01", with an average particle size of 1 to 2 μm). [Example]
以下,使用實施例進行說明。本發明並不限定於實施例。 <壓縮負載> 壓縮負載之測定方法係依據ASTM D575-91:2012。圖6係本發明之一實施方式中使用之壓縮負載測定裝置之示意性側面剖視圖。該壓縮負載測定裝置1具備試樣台2與荷重元6,於鋁板3與5之間夾持熱傳導性片試樣4,如圖6所示進行安裝,利用荷重元6壓縮至規定厚度。記錄厚度50%壓縮時之負載值之最大負載值、及將該壓縮保持1分鐘後之負載值。 測定條件 試樣:圓形(直徑28.6 mm,厚度1 mm) 壓縮率:50% 鋁板尺寸:圓形(直徑28.6 mm)(壓縮面) 壓縮速度:5 mm/分鐘 壓縮方式:TRIGGER方式(以感知到負載2 N之點為測定開始位置之方式) 測定裝置:Aikoh Engineering製造,MODEL-1310NW(荷重元 200 kgf) <熱傳導率> 熱傳導性片之熱傳導率係利用Hot Disk(依據ISO 22007-2:2022)進行測定。如圖7A所示,該熱傳導率測定裝置11以2個熱傳導性片試樣13a、13b夾住聚醯亞胺膜製感測器12,對感測器12施加恆定功率,使其恆定發熱,根據感測器12之溫度上升值來解析熱特性。感測器12之前端14之直徑為7 mm,如圖7B所示,構成電極之雙螺旋結構,於下部配置有施加電流用電極15與電阻值用電極(溫度測定用電極)16。熱傳導率利用以下之式(數式2)算出。 Hereinafter, examples will be used for explanation. The present invention is not limited to the examples. <Compression load> The measurement method of compressive load is based on ASTM D575-91:2012. 6 is a schematic side cross-sectional view of a compressive load measuring device used in one embodiment of the present invention. This compressive load measuring device 1 includes a sample stage 2 and a load cell 6. The thermally conductive sheet sample 4 is sandwiched between aluminum plates 3 and 5, installed as shown in FIG. 6, and compressed to a predetermined thickness by the load cell 6. Record the maximum load value when the thickness is compressed to 50%, and the load value after maintaining the compression for 1 minute. Measurement conditions Sample: round (diameter 28.6 mm, thickness 1 mm) Compression rate: 50% Aluminum plate size: round (diameter 28.6 mm) (compression side) Compression speed: 5 mm/min Compression method: TRIGGER method (the point where the load is perceived to be 2 N is used as the starting position for determination) Measuring device: Made by Aikoh Engineering, MODEL-1310NW (load cell 200 kgf) <Thermal Conductivity> The thermal conductivity of the thermally conductive sheet was measured using Hot Disk (according to ISO 22007-2:2022). As shown in FIG. 7A , the thermal conductivity measuring device 11 sandwiched the polyimide film sensor 12 with two thermally conductive sheet samples 13a and 13b, and applied constant power to the sensor 12 to cause it to generate constant heat. Thermal characteristics are analyzed based on the temperature rise value of the sensor 12 . The diameter of the front end 14 of the sensor 12 is 7 mm. As shown in FIG. 7B , it forms a double helix structure of electrodes, and an electrode 15 for applying current and an electrode for resistance value (temperature measurement electrode) 16 are arranged at the lower part. Thermal conductivity is calculated using the following equation (Equation 2).
[數式2] λ:熱傳導率(W/m‧K) Po:恆定功率(W) r:感測器之半徑(m) τ: α:試樣之熱擴散率(m 2/s) t:測定時間(s) D(τ):無因次化之τ之函數 ΔT(τ):感測器之溫度上升(K) <加工性> 由於未硬化複合物為黏土狀固體,故藉由壓延成形性來判斷能否加工。評價標準如下所述。 A:具有良好之壓延成形性。 B:壓延加工較困難,但可成形。 C:不可壓延成形。 <硬度> 硬化片之硬度係依據ASTM D2240-15(2021)所規定之Shore 00進行測定。 <耐熱性> 將聚矽氧片放入100℃之熱風循環式烘箱中,經過100小時後取出並使其冷卻至室溫,求出依據ASTM D2240所規定之Shore 00而測定之硬度與初始硬度之變化量。 <表面被覆率> 根據未預先進行表面處理之熱傳導性粒子之BET比表面積與矽烷偶合劑之最小被覆面積及摻合量,用上述式(數式1)算出。 [Formula 2] λ: Thermal conductivity (W/m‧K) Po: Constant power (W) r: Radius of the sensor (m) τ: α: Thermal diffusivity of the sample (m 2 /s) t: Measurement time (s) D (τ): Dimensionless function of τ ΔT (τ): Temperature rise of the sensor (K) <Processing Properties> Since the unhardened composite is a clay-like solid, the ability to process it is judged by its rolling formability. The evaluation criteria are as follows. A: It has good rolling formability. B: Calendering is difficult, but it can be formed. C: Cannot be rolled and formed. <Hardness> The hardness of the hardened sheet is measured according to Shore 00 specified in ASTM D2240-15 (2021). <Heat resistance> Place the polysiloxane sheet into a hot air circulation oven at 100°C. After 100 hours, take it out and cool it to room temperature. Find the hardness and initial hardness measured according to Shore 00 specified in ASTM D2240. the amount of change. <Surface coverage ratio> It is calculated using the above formula (Formula 1) based on the BET specific surface area of the thermally conductive particles that have not been surface-treated in advance and the minimum coverage area and blending amount of the silane coupling agent.
(實施例1~7、比較例1~3) (1)聚矽氧基質聚合物成分(A1、A2) 使用市售之二液室溫硬化聚矽氧聚合物作為聚矽氧基質聚合物成分。該二液室溫硬化聚矽氧聚合物之A劑中預先添加有基礎聚合物成分與鉑系金屬觸媒,B劑中預先添加有基礎聚合物成分、交聯成分與硬化反應抑制劑。其為加成硬化型聚二甲基矽氧烷。A劑表示為A1,B劑表示為A2。 (2)熱傳導性無機粒子(B) B1:氫氧化鋁 (i)塊狀、平均粒徑(D50)43 μm、鈦酸酯預處理品(市售品) (ii)塊狀、平均粒徑(D50)49 μm、未處理品(市售品)、比表面積0.18 m 2/g (iii)塊狀、平均粒徑(D50)75 μm、未處理品(市售品)、比表面積0.1 m 2/g B2:球形氧化鋁 (i)平均粒徑(D50)75 μm、未處理品(市售品)、比表面積0.2 m 2/g (ii)平均粒徑(D50)6 μm、未處理品(市售品)、比表面積0.8 m 2/g B3:破碎狀氧化鋁 (i)平均粒徑(D50)2.1 μm、未處理品(市售品)、比表面積1.8 m 2/g (3)矽烷偶合劑(C) 使用癸基三甲氧基矽烷(市售品),最小被覆面積為298 m 2/g。 (4)熱傳導性片成形 將上述未硬化之二液室溫硬化聚矽氧聚合物、熱傳導性無機粒子與矽烷偶合劑均勻地混合,製成複合物,將其夾在聚酯(PET)膜之間且壓延為厚度1 mm,於100℃進行10分鐘硬化處理。 以上條件與結果如表1~3所示。再者,於表1~3中,根據質量份(g)計算體積分率時之比重如下所示。 聚矽氧聚合物:比重0.97 矽烷偶合劑:比重0.90 氫氧化鋁:比重2.42 氧化鋁:比重3.98 (Examples 1 to 7, Comparative Examples 1 to 3) (1) Silicone-based polymer components (A1, A2) Commercially available two-liquid room-temperature curing polysilicone polymers were used as the silicone-based polymer components. . The A agent of the two-liquid room temperature curable polysiloxane polymer is pre-added with a base polymer component and a platinum metal catalyst, and the B agent is pre-added with a base polymer component, a cross-linking component and a hardening reaction inhibitor. It is an addition-hardening polydimethylsiloxane. Agent A is represented by A1 and agent B is represented by A2. (2) Thermal conductive inorganic particles (B) B1: Aluminum hydroxide (i) Block shape, average particle diameter (D50) 43 μm, titanate pretreated product (commercially available product) (ii) Block shape, average particle size (D50) 49 μm, untreated product (commercially available product), specific surface area 0.18 m 2 /g (iii) Massive, average particle size (D50) 75 μm, untreated product (commercially available product), specific surface area 0.1 m 2 /g B2: Spherical alumina (i) Average particle diameter (D50) 75 μm, untreated product (commercial product), specific surface area 0.2 m 2 /g (ii) Average particle diameter (D50) 6 μm, untreated Product (commercially available product), specific surface area 0.8 m 2 /g B3: Crushed alumina (i) average particle size (D50) 2.1 μm, untreated product (commercially available product), specific surface area 1.8 m 2 /g (3 ) Silane coupling agent (C) Use decyltrimethoxysilane (commercially available product), and the minimum coating area is 298 m 2 /g. (4) Thermal conductive sheet forming: uniformly mix the two uncured liquid room temperature curing polysiloxane polymers, thermally conductive inorganic particles and silane coupling agent to form a composite, and sandwich it between polyester (PET) films and rolled to a thickness of 1 mm, and then hardened at 100°C for 10 minutes. The above conditions and results are shown in Tables 1 to 3. Furthermore, in Tables 1 to 3, the specific gravity when the volume fraction is calculated based on parts by mass (g) is as follows. Polysilicone polymer: specific gravity 0.97 Silane coupling agent: specific gravity 0.90 Aluminum hydroxide: specific gravity 2.42 Alumina: specific gravity 3.98
[表1]
[表2]
[表3]
如表1~3所示,確認到於各實施例中,熱傳導率較高,穩態負載值較低,壓縮緩和較大,藉由緩慢地進行壓縮,可以低負載進行夾持,對夾持體之損傷較小,由於負載值較低且柔軟,故而對電子零件之凹凸之追隨性較好,片之操作性良好。 相對於此,比較例1中,由於使用作為鈦酸酯預處理品之氫氧化鋁粒子,故而耐熱性不佳。又,比較例2及3中,由於矽烷偶合劑對熱傳導粒子之表面處理被覆率較低,故而負載值較高,壓縮應力較高,存在安裝時對電子零件之負載較大之問題。 [產業上之可利用性] As shown in Tables 1 to 3, it was confirmed that in each of the examples, the thermal conductivity was high, the steady-state load value was low, and the compression relaxation was large. By slowly compressing, it was confirmed that clamping with a low load was possible. The damage to the body is small. Since the load value is low and it is soft, it can better follow the unevenness of electronic parts and the operability of the chip is good. On the other hand, in Comparative Example 1, since aluminum hydroxide particles were used as a titanate pretreated product, the heat resistance was not good. In addition, in Comparative Examples 2 and 3, since the surface treatment coverage rate of the silane coupling agent on the heat conductive particles is low, the load value is high and the compressive stress is high. There is a problem of greater load on electronic components during installation. [Industrial availability]
本發明之熱傳導性片可用作半導體、LED、家電等電子零件、包含光通訊機器之資訊通訊模組、車載用途等之發熱部與散熱部之間之散熱體。The thermally conductive sheet of the present invention can be used as a heat sink between the heat generating part and the heat dissipating part of electronic components such as semiconductors, LEDs, and home appliances, information communication modules including optical communication equipment, and automotive applications.
1:壓縮負載測定裝置 2:試樣台 3,5:鋁板 4:熱傳導性片試樣 6:荷重元 11:熱傳導率測定裝置 12:感測器 13a,13b:熱傳導性片試樣 14:感測器之前端 15:施加電流用電極 16:電阻值用電極(溫度測定用電極) 30:散熱構造體 31a,31b:熱傳導性片 32:散熱片 32b:散熱片側壁 33:電子零件 34:配線基板 35:散熱座 1: Compression load measuring device 2: Sample table 3,5:Aluminum plate 4: Thermal conductive sheet sample 6: Load cell 11: Thermal conductivity measuring device 12: Sensor 13a, 13b: Thermal conductive sheet sample 14: Sensor front end 15: Electrode for applying current 16: Electrode for resistance value (electrode for temperature measurement) 30:Heat dissipation structure 31a, 31b: Thermal conductive sheet 32:Heat sink 32b: Radiator side wall 33: Electronic parts 34:Wiring board 35: Cooling seat
[圖1]係表示本發明之一實施方式之熱傳導性聚矽氧片之使用方法之示意性剖視圖。 [圖2]係本發明之一實施方式之塊狀氫氧化鋁粒子(B1)之掃描電子顯微鏡(SEM)照片(倍率600倍)。 [圖3]係本發明之一實施方式之球形氧化鋁(B2)之掃描電子顯微鏡(SEM)照片(倍率10,000倍)。 [圖4]係不包含於本發明之球形氧化鋁(B2)中的多邊形或圓形氧化鋁之掃描電子顯微鏡(SEM)照片。 [圖5]係本發明之一實施方式之破碎狀氧化鋁(B3)之掃描電子顯微鏡(SEM)照片(倍率6,000倍)。 [圖6]係本發明之一實施例中使用之壓縮負載測定裝置之示意性側面剖視圖。 [圖7A-B]係表示本發明之一實施例中使用之熱傳導率之測定方法的說明圖。 [Fig. 1] is a schematic cross-sectional view showing a method of using the thermally conductive polysiloxane sheet according to one embodiment of the present invention. [Fig. 2] is a scanning electron microscope (SEM) photograph (magnification: 600 times) of the massive aluminum hydroxide particles (B1) according to one embodiment of the present invention. [Fig. 3] is a scanning electron microscope (SEM) photograph (magnification: 10,000 times) of spherical alumina (B2) according to one embodiment of the present invention. [Fig. 4] is a scanning electron microscope (SEM) photograph of polygonal or circular alumina not included in the spherical alumina (B2) of the present invention. [Fig. 5] is a scanning electron microscope (SEM) photograph (magnification 6,000 times) of crushed alumina (B3) according to one embodiment of the present invention. [Fig. 6] is a schematic side cross-sectional view of a compressive load measuring device used in one embodiment of the present invention. 7A-B are explanatory diagrams showing a method of measuring thermal conductivity used in one embodiment of the present invention.
30:散熱構造體 30:Heat dissipation structure
31a,31b:熱傳導性片 31a, 31b: Thermal conductive sheet
32:散熱片 32:Heat sink
32a:主面 32a: Main side
32b:散熱片側壁 32b: Radiator side wall
32c:與主面為相反側之另一面 32c: The other side opposite to the main side
33:電子零件 33: Electronic parts
34:配線基板 34:Wiring board
35:散熱座 35: Cooling seat
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JP5304588B2 (en) * | 2009-10-26 | 2013-10-02 | 信越化学工業株式会社 | Thermally conductive silicone composition and cured product thereof |
JP5418298B2 (en) * | 2010-02-26 | 2014-02-19 | 信越化学工業株式会社 | Thermally conductive silicone composition and cured product thereof |
JP5664563B2 (en) * | 2012-01-23 | 2015-02-04 | 信越化学工業株式会社 | Thermally conductive silicone composition and cured product thereof |
JP5940325B2 (en) * | 2012-03-12 | 2016-06-29 | 東レ・ダウコーニング株式会社 | Thermally conductive silicone composition |
JP6202475B2 (en) * | 2014-06-27 | 2017-09-27 | 信越化学工業株式会社 | Thermally conductive composite silicone rubber sheet |
JP2020002236A (en) * | 2018-06-27 | 2020-01-09 | 信越化学工業株式会社 | Heat-conductive silicone composition, heat-conductive silicone sheet, and method of manufacturing the same |
WO2022049902A1 (en) * | 2020-09-03 | 2022-03-10 | 富士高分子工業株式会社 | Thermally conductive silicone heat dissipation material |
-
2022
- 2022-10-25 JP JP2023503240A patent/JPWO2023188491A1/ja active Pending
- 2022-10-25 WO PCT/JP2022/039700 patent/WO2023188491A1/en active Application Filing
- 2022-11-03 TW TW111142045A patent/TW202340375A/en unknown
Also Published As
Publication number | Publication date |
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WO2023188491A1 (en) | 2023-10-05 |
JPWO2023188491A1 (en) | 2023-10-05 |
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