TW202336895A - Substrate treatment device and method for manufacturing semiconductor device - Google Patents

Abstract

A substrate treatment device includes an EFEM unit, a cleaning and drying unit, and at least one load port unit, and the cleaning and drying unit includes a wafer holding mechanism, a transfer arm, a cleaning liquid supply nozzle, and a gas supply nozzle. The EFEM unit includes a transfer robot and a transfer arm capable of transferring a wafer between a load port unit of the at least one load port unit and the cleaning and drying unit, and the cleaning and drying unit is coupled to the EFEM unit in series with the load port unit.

Description

Manufacturing method of substrate processing device and semiconductor device

This embodiment relates to a substrate processing apparatus and a method of manufacturing a semiconductor device.

In the process of dry etching substrates such as semiconductor wafers (hereinafter referred to as wafers) using corrosive gases such as hydrogen bromide and chlorine, the following quality defects may occur, namely, FOUP (Front Opening Unified Pod). The corrosive gas reaction in the wafer box causes the material constituting the device to deteriorate or produce particles. In addition, in processing units that use corrosive gases (such as dry etching units) and other processing units (such as film-forming units) brought in via FOUP, measures must be taken to prevent corrosion deterioration.

An object of one embodiment of the present invention is to provide a miniaturized cleaning and drying unit, a substrate processing device having the cleaning and drying unit, and a manufacturing method of a semiconductor device. The cleaning and drying unit can process wafers produced in a main processing unit. The residual gas components are removed and can be installed in the EFEM unit or at the loading port connection of the EFEM unit.

The substrate processing device of this embodiment includes a transport module, a cleaning unit, and a loading port. The above-mentioned cleaning unit includes: a to-be-processed substrate holding mechanism that can hold the to-be-processed substrate; a cleaning liquid supply mechanism that can supply a cleaning liquid to the to-be-processed substrate held by the above-mentioned to-be-processed substrate holding mechanism; and a gas supply mechanism that can Gas can be supplied to the substrate to be processed held by the substrate to be processed holding mechanism; and the transfer module includes a substrate to be processed transfer mechanism that can transfer the substrate to be processed between the loading port and the cleaning unit, and the cleaning unit The unit is connected to the transport module in parallel with the loading port.

Hereinafter, embodiments of a semiconductor device manufacturing apparatus including a main processing unit, a water washing and drying unit, and the like will be described in detail with reference to the drawings. The main processing unit is, for example, a dry etching unit, but is not limited thereto. For example, a CVD (Chemical Etching Deposition) unit, a sputtering unit, a wet etching unit, an annealing unit, a CMP (Chemical Mechanical Polishing) unit, an ion implantation unit, etc. related to other processes can also be used The processing unit serves as the main processing unit. (1st Embodiment)

Hereinafter, the first embodiment will be described. FIG. 1 is a schematic diagram illustrating an example of the overall structure of a semiconductor device manufacturing apparatus according to the first embodiment. The semiconductor device manufacturing apparatus includes a dry etching unit (dry etching chamber) 1 as a main processing unit, a vacuum transfer robot chamber 2, and a FOUP 13 for picking up and placing wafers 7 and for supplying and collecting the wafers 7 to the main processing unit 1. EFEM (Equipment Front End Module) unit 3. The load interlock chamber 4 for transferring the wafer 7 between the vacuum transfer robot room 2 and the EFEM unit 3 places the FOUP 13 and can transfer the wafer 7 to The status of the loading port unit (loading port) 5 and the cleaning and drying unit (cleaning unit) 6 in the EFEM unit 3.

The vacuum transfer robot room 2 includes a transfer robot 8 . The transfer arm 9 is attached to the transfer robot 8 . The transfer robot 8 and the transfer arm 9 function as a substrate transfer mechanism. Furthermore, the transfer robot 10 is installed in the EFEM unit 3 . The transfer robot 10 can move on the guide rail 11 . The transfer arm 12 is attached to the transfer robot 10 . The transfer robot 10 and the transfer arm 12 function as a substrate transfer mechanism.

Moreover, in this embodiment, the washing and drying unit 6 and the loading port unit 5 are installed on the same side surface of the EFEM unit 3 . That is, in this embodiment, a plurality of loading port units 5 and one washing and drying unit 6 are regularly arranged on one side surface of the EFEM unit 3 . In other words, it can be understood that in the substrate processing apparatus of this embodiment, a plurality of load port units 5 are provided in the EFEM unit 3 and any one of the load port units 5 is replaced with the cleaning and drying unit 6 . Alternatively, it can also be understood that the EFEM unit 3 has a plurality of load port unit connection portions 5A configured to be connected to the load port unit 5, and the load port unit 5 is connected to at least one of the plurality of load port unit connection portions 5A. At least one other of the loading port unit connection portions 5A is connected to the washing and drying unit 6 .

In this embodiment, a plurality (two) of load port units 5 are regularly arranged on one side surface of the EFEM unit 3 . Here, the washing and drying unit 6 is instead placed at a position where the loading port unit 5 adjacent to the EFEM unit 3 is disposed. In addition, in the following description, the longitudinal direction of the EFEM unit 3 and the direction in which the following guide rail 11 extends are assumed to be the first direction in a direction horizontal to the floor surface on which the substrate processing apparatus is installed. Moreover, in the direction horizontal to the floor surface on which the substrate processing apparatus is installed, the direction orthogonal to the first direction is set as the second direction. Furthermore, the direction orthogonal to the floor surface on which the substrate processing apparatus is installed is set as the third direction.

Here, in a semiconductor device manufacturing apparatus including a dry etching unit for processing wafers with a diameter of 300 mm, an example of using the EFEM unit 3 equipped with three load port units 5 will be described. Make a design. The EFEM unit 3 as a transport module has three load port unit connection portions 5A that can be equipped with load port units 5 . The load port unit 5 is installed at two of the three load port unit connection portions 5A, and the cleaning and drying unit 6 is installed at the remaining one load port unit connection portion 5A instead of the load port unit 5. The washing and drying unit 6 (washing unit) is designed in such a way that it can be replaced with the loading port unit 5 and cooperate with the EFEM unit 3 . The lateral width of the cleaning and drying unit 6 is set to be less than the lateral width of the loading port unit 5 (for example, about 50 cm), and is designed so as not to interfere with the adjacent loading port unit 5 in the first direction of FIG. 1 . In addition, in the second direction, the transfer robot 10 in the EFEM unit 3 places the wafer 7 on the wafer holder in the FOUP and the support table of the cleaning and drying unit 6 to store it with the loading port of the EFEM unit 3 Design in such a way that the relative positions of the datum planes are the same. FIG. 2 is a perspective view of the entire substrate processing apparatus according to the above-mentioned embodiment. FIG. 2 is a perspective view illustrating an example of the cleaning and drying unit according to the first embodiment. The cleaning and drying unit 6 is adjacent to the EFEM unit 3 and is arranged side by side with the loading port unit 5 . Furthermore, in the third direction, the height of the cleaning and drying chamber 14 is the same as that of the FOUP 13 on the loading port unit 5 , so that the transfer robot 10 of the EFEM unit 3 can be directly used to pick up and place the wafer 7 .

The semiconductor device manufacturing equipment includes a dry etching unit. When the dry etching process time is not long, the processing time in the cleaning and drying unit 6 may affect the overall processing capacity of the semiconductor device manufacturing equipment (for example, it may become a bottleneck). ). In this case, a plurality of wafer holding mechanisms 16 serving as holding mechanisms for the substrate to be processed may be provided in the longitudinal direction (third direction). A cleaning and drying mechanism 15 is provided above each wafer holding mechanism 16 . Therefore, the wafers 7 placed on each wafer holding mechanism 16 can be cleaned and dried at the same time. That is, by performing single-wafer processing on multiple wafers 7 at the same time, the impact on the overall processing capability of the semiconductor device manufacturing equipment can be reduced. FIG. 3 is a schematic diagram of the cleaning and drying unit 6 when a plurality of wafer holding mechanisms 16 and cleaning and drying mechanisms 15 are provided in the longitudinal direction. Here, three wafer holding mechanisms 16a, 16b, and 16c are shown respectively. In this embodiment, the wafer holding mechanism 16 does not move up or down in the cleaning and drying chamber 14 . Therefore, no complicated action mechanism is required. In addition, by only providing a plurality of wafer holding mechanisms 16, the processing time in the cleaning and drying unit 6 can be prevented from affecting the processing capacity of the entire semiconductor device manufacturing apparatus. FIG. 3 shows an example in which three wafer holding mechanisms 16a, 16b, and 16c are provided. However, as long as the control is within a predetermined range, more wafer holding mechanisms 16 can also be provided. The predetermined range may be, for example, a range corresponding to the length from the lowest rack (slot 1) to the uppermost rack (slot 25) in the FOUP. By simplifying the wafer holding mechanism 16 using the following method, more wafer holding mechanisms 16, for example six, can also be provided. Furthermore, in order to correspond to a configuration in which more stages of wafer holding mechanisms 16 are provided, the stroke of the transfer arm 12 of the transfer robot 10 in the EFEM unit 3 may be extended in the third direction.

Semiconductor devices are manufactured using wafers containing semiconductor materials. The wafer has a diameter of 300 mm, for example. A plurality of 300 mm wafers are stored in the FOUP13, and the FOUP13 is automatically transported between a plurality of main processing devices. The 300 mm wafer is automatically transported by FOUP13. The wafer position in the FOUP and the wafer position on the loading port unit 5 are based on SEMI (Semiconductor Equipment and Materials International, International Semiconductor Equipment and Materials Industry Association) standards. Therefore, even if the FOUP 13 , the loading port unit 5 , and the EFEM unit 3 are products of different manufacturers, they can be combined with compatibility. The wafer position mentioned here means the lateral direction (first direction), depth (second direction), and height (third direction). In this embodiment, the cleaning and drying unit 6 is configured in the EFEM unit 3 in a manner that is compatible with the loading port unit 5 . Therefore, the cleaning and drying unit 6 of this embodiment can be used in a form compatible with the FOUP 13, the loading port unit 5, and the EFEM unit 3 that comply with the SEMI standard.

Figures 4 and 5 are diagrams illustrating the FOUP on the loading port unit and the wafer storage location in the cleaning and drying unit. In FIG. 4 , (a) is the position of the wafer in the FOUP 13 on the loading port unit 5 , and (b) is the position of the wafer in the cleaning and drying chamber 14 of the cleaning and drying unit 6 . Figure 4 shows a comparison of the two when viewed from above. The FOUP 13 has a pair of guides 17a that defines the lateral position of the wafer, and a guide 17b that defines the depth of the wafer. The lateral position of the wafer in the cleaning and drying chamber 14 corresponds to the lateral position of the wafer in the FOUP 13 . In addition, the depth position of the wafer in the cleaning and drying chamber 14 also corresponds to the depth position of the wafer in the FOUP 13 . That is, assuming that the virtual plane passing through the boundary when the load port unit 5 is mounted on the EFEM unit 3 is the FOUP end reference plane 18, the second distance from the FOUP end reference plane 18 to the center 19 of the wafer in the FOUP 13 The distance in the direction is approximately equal to the distance in the second direction from the FOUP end reference plane 18 to the wafer center position 20 in the cleaning and drying chamber 14 . That is to say, the center 20 of the wafer in the cleaning and drying chamber 14 is at substantially the same geometric position as the center 19 of the wafer in the FOUP 13 when viewed from the third direction. In addition, the extension amount of the transfer arm 12 (transfer fork 304) of the transfer robot 10 in the second direction when the wafer is stored in the FOUP 13 is the same as the extension amount of the wafer in the cleaning and drying chamber 14 of the cleaning/drying unit 6. In this case, the extension amount of the transfer arm 12 (transfer fork 304) of the transfer robot 10 in the second direction is approximately the same length. Furthermore, the movement of the transfer robot may be adjusted in accordance with individual differences in loading ports (differences due to manufacturers, etc.). Similarly, for the washing and drying unit 6, the movement of the transport robot may be adjusted according to individual differences. In this specification, "a position that is substantially geometrically the same when viewed from the third direction" refers to a concept that includes an adjustment range that corresponds to individual differences in a loading port or a cleaning and drying unit.

The lateral direction of the wafer position in the cleaning and drying chamber 14 is the same as that of the wafer position in the FOUP 13, and they are symmetrical. The same is true for the depth. When the loading port unit 5 is installed, the distance from the FOUP end reference plane 18 is usually the same. That is to say, the center position 20 of the wafer in the cleaning and drying chamber 14 is consistent with the center 19 of the wafer in the FOUP 13 . Here, the term "same position" is the same as the adjustment range required for the transfer robot due to individual differences in loading ports and manufacturer differences. The above-mentioned adjustment range is also required for the washing and drying unit of this embodiment.

Next, in FIG. 5 , (a) is the position of the wafer in the FOUP 13 on the loading port unit 5 , and (b) is the position of the wafer in the cleaning and drying chamber 14 of the cleaning and drying unit 6 . Figure 5 shows a comparison of the two when viewed from the front. In addition, in Fig. 5, "S" represents a groove. For example, "S5" means slot 5. As shown in Figure 5(a). The FOUP 13 is provided with a plurality of guides 17a forming a pair of left and right. In this embodiment, 25 pairs of guides 17a are provided, and these guides 17a form the grooves 1 to 25 for storing the wafers 7 . As shown in FIG. 5( b ), the cleaning and drying chamber 14 has a plurality of wafer holding mechanisms 16 . In this embodiment, three wafer holding mechanisms 16 are provided, and the upper surfaces of the wafer holding mechanisms 16 correspond to the positions of slots 8, 13, and 21 respectively. Here, by making the distance from the FOUP bottom reference plane 22 equal to that of the FOUP 13, transportation adjustment can be easily performed. As long as the tank position does not interfere with the cleaning and drying mechanism 15 (cleaning liquid supply mechanism and gas supply mechanism), any one of tanks 1 to 25 can be used. Since the transport height can be determined individually, the transport robot height can be freely selected. is the slot position or its middle position.

By aligning the width, depth, and height with the position of the wafer in the FOUP, no special functions are required for transporting from the EFEM unit 3 to the cleaning and drying unit 6. The same as transporting to other load port units 5, transport can be performed by simply specifying the slot position. , pull back the wafer.

The loading port unit 5 is provided with an adjustable relative position to the EFEM unit 3 . In addition, the cleaning and drying unit 6 is also provided so that its relative position to the EFEM unit 3 can be adjusted. More specifically, the cleaning and drying unit 6 of this embodiment is installed in the EFEM unit 3 instead of the loading port unit 5 and has the same installation adjustment mechanism as the loading port unit 5 . Since the loading port unit 5 needs to be transported to all the slots using one transfer robot 10, the distance from the transfer robot 10 and the inclination need to be consistent. In this embodiment, the cleaning and drying unit 6 also has a setting adjustment mechanism, which can adjust the distance and inclination when it is placed on the EFEM unit 3 . Figure 6 is a schematic diagram illustrating the installation adjustment mechanism of the cleaning and drying unit. The cleaning and drying unit 6 of this embodiment has a depth adjustment mechanism 23 and an inclination adjustment mechanism 24 as the setting adjustment mechanism. Specifically, when the cleaning and drying unit 6 is installed on the EFEM unit 3, it is fixed with four screws at the top, bottom, left and right, but the tightening degree can be adjusted. In addition, as shown in Figures 6 and 4, the cleaning and drying chamber 14 requires wafers larger than 300 mm. Therefore, the cleaning and drying unit 6 is not only placed on the side of the loading port unit 5, but a part of the cleaning and drying chamber 14 is entered. The design is carried out in the EFEM unit 3. The design is carried out in such a way that the wafer end face corresponds to the horizontal reference line 18 at the FOUP end. Furthermore, it can also be arranged so that the center position of the wafer can be brought from the EFEM unit 3 to a position beyond the end of the load port unit 5 by extending the stroke of the transfer robot 10 in the Y direction (second direction). . However, if the distance is too far away, the telescopic amount of the transfer arm 12 of the transfer robot 10 needs to be increased, and thus the size of the EFEM unit 3 itself needs to be increased, which is undesirable. Therefore, it is preferable that the cleaning and drying chamber 14 is located directly Attach it to the level of the front panel of EFEM. Furthermore, the setting adjustment mechanism can be provided in the EFEM unit 3, or in the cleaning and drying unit 6 and the EFEM unit 3.

Next, the processing sequence in this dry etching unit 1 will be described using FIGS. 1 and 2 . Place the storage container (FOUP) 13 containing the wafer on the loading port unit 5, connect it to the EFEM unit 3, and then open the door. The wafer 7 in the FOUP 13 is taken out by the transfer robot 10 located in the EFEM unit 3, handed over in the load interlock chamber 4, and transferred to the vacuum transfer robot chamber 2. Then, it is transported to the dry etching unit (dry etching chamber) 1 by the transport robot 8 . The transfer robot 10 can move in the horizontal direction (first direction) on the guide rail 11, and can move the wafer 7 to the load port unit 5, the cleaning and drying unit 6, and the load interlock chamber by rotating with the third direction as the central axis. 4. The transfer robot 10 is equipped with a transfer arm 12, and the transfer arm 12 can move up and down. Therefore, by extending, contracting, and descending the transfer arm 12 in a state where the wafer 7 is placed, the wafer 7 is placed on the wafer holding mechanism. 16, so that the wafer 7 can be placed at a predetermined position.

In the dry etching unit (dry etching chamber) 1 , for example, halogen gas such as CF ₄ , CH ₂ Cl ₂ , and HBr flows, and the halogen gas is decomposed by plasma and active ions are irradiated onto the wafer 7 , thereby etching Si and the like. Remove. After the process, unreacted gas and decomposed halogen molecules are adsorbed on the wafer 7 .

Here, as a comparative example, it is considered to perform an ashing process to remove the residual gas components, that is, using plasma to decompose the O ₂ gas and oxidize it in the dry etching unit (dry etching chamber) 1 . However, in this case, Si, SiN, W, etc. may be accidentally oxidized in the wafer 7, thereby increasing the contact resistance. In addition, chemical liquid cleaning such as HF to remove the above-mentioned oxides may result in the desired size not being achieved, and therefore the ashing required to fully remove the residual halogen may not be fully performed. In this case, the wafer 7 on which residual halogen has adhered due to processing in the dry etching unit (dry etching chamber) 1 is directly returned to the EFEM unit 3 via the vacuum transfer robot chamber 2 . In addition, the wafer 7 with residual halogen attached thereto is returned to the original FOUP 13 located on the load port unit 5 . Therefore, for example, the residual halogen component volatilizes from the processed wafer 7 and fills the FOUP 13 . When the wafer 7 is transferred to other manufacturing equipment by the FOUP 13 , the volatilized residual halogen component may diffuse into the EFEM unit 3 . It is possible that the diffused residual halogen component reacts with the moisture contained in the atmosphere in the EFEM unit 3 to become corrosive gases such as hydrochloric acid, causing the metallic EFEM inner wall and transport robot parts to rust.

Therefore, in this embodiment, before returning the processed wafer 7 from the EFEM unit 3 to the FOUP 13 on the loading port unit 5 , the wafer 7 is processed in the cleaning and drying unit 6 . Thereby, the residual halogen on the wafer 7 is completely removed by the process using the dry etching unit (dry etching chamber) 1 . Residual halogen and ammonia are easily soluble in water, so they can be fully removed with water or warm water used as a cleaning solution.

Next, a method of transporting wafers to the cleaning and drying unit 6 will be described using FIG. 3 . The transfer robot 10 in the EFEM unit 3 is used to place the wafer 7 on the wafer holding mechanism 16 of the cleaning and drying chamber 14 . At this time, the wafer 7 is moved out of the wafer holding mechanism 16 by the transportation robot 10 and the transportation arm 12 in the EFEM unit 3. The wafer holding mechanism 16 itself is fixed and does not move. As mentioned below, the wafer lift table and the cleaning and drying mechanism 15 need to move up and down, but a large driving mechanism for moving them up and down is not required.

The details of the cleaning and drying method will be described using Figure 7. The cleaning and drying unit 6 has at least one wafer holding mechanism 16 and a cleaning and drying mechanism 15 . FIG. 7 is a schematic diagram of the wafer holding mechanism 16 and the cleaning and drying mechanism 15. The wafer holding mechanism 16 includes a wafer holding table 31 . The washing and drying mechanism 15 includes an opposing member 33 . An opposing member 33 is provided above the wafer holding table 31 . The opposing member 33 is formed in a disk shape, for example. The bottom surface of the facing member 33 faces in parallel with the upper surface of the wafer 32 . In this case, the bottom surface of the facing member 33 functions as the first surface. Furthermore, the wafer holding table 31 is configured to fix the wafer 32 downward. When the facing member 33 is provided below the wafer holding table 31, the upper surface of the facing member 33 functions as the first surface. . After the wafer 32 is inserted between the wafer holding table 31 and the opposing member 33 by the transfer robot 10 of the EFEM unit 3 , the wafer 32 is lowered downward and placed on the wafer holding table 31 . Therefore, the wafer 32 can be placed on the wafer holding table 31 without moving the wafer holding table 31 .

Water as a cleaning liquid is supplied to the center of the upper surface of the wafer 32 from a cleaning liquid supply nozzle 34 provided at the center of the bottom surface of the facing member 33 . The water 35 supplied to the wafer 32 spreads in the gap 38 a between the upper surface of the wafer 32 and the bottom surface of the facing member 33 and is squeezed out toward the outer periphery. The water 35 coming out from the outermost periphery of the wafer 32 is discharged downward through the gap 38 b between the guide 37 and the wafer 32 and the gap between the wafer holding table 31 and the guide 37 . Thereafter, the N ₂ gas as the gas is supplied to the center portion of the upper surface of the wafer 32 from the gas supply nozzle 36 provided at the center portion of the bottom surface of the facing member 33 . Thereby, the water 35 remaining on the upper surface of the wafer 32 is driven out in the outer circumferential direction and discharged from the gap 38 b between the guide 37 and the wafer 32 and the gap between the wafer holding table 31 and the guide 37 . In this way, the remaining moisture on the wafer 32 is evaporated and dried by flowing the N ₂ gas.

Warm water can also be used as water 35. When warm water is used, the solubility of the residual halogen increases, thereby improving the removal performance of the residual halogen. For example, when warm water is supplied in a manufacturing factory, warm water may be directly supplied to the cleaning and drying unit 6 , and the warm water may be supplied from the cleaning liquid supply nozzle 34 to the upper surface of the wafer 32 . Furthermore, when hot water is not supplied to the manufacturing plant, the water supply tank or pipe for supplying water to the washing and drying unit 6 may be heated. Specifically, for example, the water supplied to the washing and drying unit 6 may be heated by winding a heater around a pipe for supplying water to the washing and drying unit 6 .

In addition, as the N ₂ gas, high-temperature N ₂ gas can also be used. When high-temperature N ₂ gas is used, the time for evaporation and drying can be shortened. For example, when high-temperature N ₂ gas is supplied in a manufacturing plant, the high-temperature N ₂ gas may be directly supplied to the cleaning and drying unit 6 , and the high-temperature N ₂ gas may be supplied from the gas supply nozzle 36 to the upper surface of the wafer 32 . Furthermore, when the high-temperature N ₂ gas is not supplied to the manufacturing plant, the N ₂ supply tank or pipe for supplying N ₂ to the cleaning and drying unit 6 may be heated. Specifically, for example, the N ₂ gas supplied to the cleaning and drying unit 6 can be heated by winding a heater around a pipe for supplying the N ₂ gas to the cleaning and drying unit 6 .

The water 35 extruded from the outermost periphery of the wafer 32 and discharged from the gap 38b between the guide 37 and the wafer 32 and the gap between the wafer holding table 31 and the guide 37 is temporarily stored in a cleaning and drying chamber. 14 in the waste liquid tank 25 (refer to Figure 6). The treatment liquid stored in the waste liquid tank 25 is discarded at an appropriate time (see FIG. 6 ). At this time, the halogen gas component adhering to the surface of the wafer 32 is dissolved in the water and discarded. The N ₂ gas supplied from the gas supply nozzle 36 also flows through the same path as the water 35 and is discharged. As a result, the remaining moisture on the wafer 32 can be evaporated and dried. In FIG. 7 and the above description, the nozzle 35 and the nozzle 36 are constituted by double-layer pipes, the water 35 flows from the outside, and the N ₂ gas flows from the inside, but it is not limited to this. For example, the water 35 and the N ₂ gas may be supplied from the same nozzle by making the nozzle 35 and the nozzle 36 common and providing a switching mechanism in the middle of the pipe.

FIG. 8 is a schematic diagram of the wafer holding table 31. FIG. 8 is a schematic view of the wafer holding table 31 as viewed from above the opposing member 33 . The opposing member 33 is provided with a hole corresponding to the cleaning liquid supply nozzle 34 , and a cleaning liquid supply pipe 341 is connected to the cleaning liquid supply nozzle 34 . One end of the supply pipe 341 is connected to the cleaning liquid supply nozzle 34 . The other end of the supply pipe 341 is connected to the water supply tank 26 provided at the lower part of the cleaning and drying chamber 14 (see FIG. 6 ). Furthermore, the facing member 33 is also provided with a hole corresponding to the gas supply nozzle 36 , and the gas supply pipe 361 is connected to the gas supply nozzle 36 . One end of the supply pipe 361 is connected to the gas supply nozzle 36 . The other end of the supply pipe 361 is connected to the drying N ₂ gas line 27 provided at the lower part of the cleaning and drying chamber 14 (see FIG. 6 ).

FIG. 9 is a diagram illustrating an example of the wafer holding table 31. In addition, FIG. 10 is a diagram illustrating a state in which the wafer 32 is transported above the wafer holding table 31 . FIG. 9(a) shows an example of the wafer holding table 31 viewed from above. In the center of the wafer holding table 31 is a wafer lifting table 301 for the transfer robot 10 to receive the wafer from the EFEM unit 3 . The wafer lift 301 is a mechanism that moves the wafer lift 301 up and down to place and receive the wafer 32 from the transfer fork 304 installed at the front end of the transfer robot arm 12 shown in FIG. 10 . A lip seal 306 is provided between the facing member 33 and the outer guide 37 to prevent the water 35 flowing through the gap 38 a between the wafer 32 and the facing member 33 from flowing into the back side of the outer guide 37 . In addition, a plurality of annular lip seals 302 with different radii are disposed concentrically on the upper surface of the wafer holding table 31 with the wafer lifting table 301 as the center to prevent flow through the wafer 32 and the outer guide 37 The water 35 in the gap 38b flows into the back side of the wafer 32. The lip seals 302 are each provided with a wafer tilt adjustment mechanism 39 to adjust the tilt and position (height) of the wafer 32 relative to the opposing member 33 . The outermost lip seal 302 also has the function of preventing water from penetrating. In addition, the inner lip seal 302 also has the function of preventing the wafer 32 from warping. Therefore, as shown in FIG. 9(b) , only the outer lip seal 302 may have a position (height) adjustment function. In this embodiment, the pressure of the water 35 sprayed from the cleaning liquid supply nozzle 34 provided at the center of the lower surface of the facing member 33 is used to seal the space between the facing member 33 and the wafer holding table 31 . However, in order to further improve For sealing, a mechanism for vacuum adsorbing and clamping the wafer 32 on the wafer holding table 31 may also be provided.

A series of flows from conveying the wafer to the cleaning and drying chamber 14 to cleaning will be described using FIGS. 10 and 11 . The wafer 32 is placed on the transfer fork 304 mounted on the front end of the transfer robot arm 12 shown in FIG. 10 . Here, the wafer 32 is pressed from the side by the wafer fixing jig 305 installed on the transfer fork 304 so that the wafer 32 does not fall from the transfer fork 304 . FIG. 11 is a diagram illustrating a series of flows from conveying the wafer to the cleaning and drying unit 6 to cleaning. First, as shown in FIG. 11(a) , the transfer fork 304 holding the wafer 32 is placed in the cleaning and drying chamber 14 . At this time, the opposing member 33 is located above to form a space for the transport fork 304 to enter. Next, as shown in FIG. 11( b ), the transfer fork 304 is lowered to place the wafer 32 on the wafer lift table 301 . Then, as shown in FIG. 11(c) , after the transport fork 304 separated from the wafer 32 is pulled back to the EFEM unit 3 , the wafer lift 301 is lowered by the wafer lift mechanism 307 to place the wafer 32 into the EFEM unit 3 . The lip seal 302 is provided on the wafer holding table 31 . Finally, as shown in FIG. 11(d) , the opposing member 33 is lowered to narrow the distance between it and the wafer 32, and the water from the central nozzle flows. Water flows from the center to the outer periphery of the wafer 32 as shown by arrows. The water flowing out to the outside flows downward from the wafer 32 and is discharged from the cleaning and drying chamber 14 through the drain pipe 303 . As mentioned above, the cleaning and drying chamber 14 is composed of multi-stage wafer holding tables 31. Each wafer holding table 31 has the height adjustment and drainage mechanism of the wafer lifting table 301, so it is easy to move the opposing member 33 up and down, but it may also be The height of the wafer holding table 31 is raised to adjust the distance between the wafer holding table 31 and the wafer 32 .

When drying with _N2 gas, if water droplets remain on the bottom surface of the facing member 33 of the cleaning and drying chamber 14, the water droplets may drip onto the wafer 32. Therefore, the bottom surface of the facing member 33 is made of hydrophobic material such as fluororesin. sexual material.

In addition, by using heated N ₂ during drying, the drying time can be shortened. Alternatively, after the water 35 is supplied to the upper surface of the wafer 32 to clean the wafer 32 , isopropyl alcohol (IPA) may be flowed. As a result, the time required for drying using N ₂ gas can be further shortened.

In this embodiment, the washing and drying mechanism 15 does not rotate or rotate. In other words, in this embodiment, when cleaning the wafer 32 , the relative position of the cleaning liquid supply nozzle 34 and the wafer 32 is fixed. Moreover, in this embodiment, when drying the wafer 32, the relative position of the gas supply nozzle 36 and the wafer 32 is fixed. Therefore, in this embodiment, there is no need to move the wafer or the nozzle to efficiently clean and dry the entire surface of the wafer with a large diameter of 300 mm. Furthermore, for example, a teaching mechanism may also be provided to finely adjust the facing distance and facing angle between the wafer 32 and the facing member 33 of the cleaning and drying mechanism 15 .

In this embodiment, the gap 38a between the facing member 33 and the wafer 32 is set in such a way that the facing distance between the facing member 33 and the wafer 32 is fixed in-plane. More specifically, the height and tilt of the wafer 32 are adjusted using the wafer tilt adjustment mechanism 39 installed on the wafer holding table 31 . As shown in FIG. 9 , the wafer 32 can be adjusted by supporting the wafer 32 at three points using the wafer tilt adjustment mechanism 39 provided at approximately equal intervals on the lip seal 302 near the outer periphery of the wafer 32 . The height and tilt can make the gap (spacing) between the wafer 32 and the opposing member 33 uniform in the plane. In this description, the height of the wafer 32 is directly adjusted. However, even if the position of the wafer is adjusted by adjusting the height of the holding table and part of it, as long as it has the function of adjusting the gap.

Next, a comparative example of this embodiment will be described. In the comparative example, O ₂ gas plasma was used for cleaning after dry etching. In the comparative example, if O ₂ gas plasma is used for cleaning at a high temperature of 300° C. or higher, the effect of removing the corrosive gas adsorbed on the substrate by sputtering can be expected. However, if the processing is performed at high temperatures, the Si and metal materials in the wafer may be accidentally oxidized, thereby affecting the shape changes and electrical characteristics of the device. Therefore, there are cases where this cleaning cannot be applied. In addition, when the above-mentioned oxide film is removed in the subsequent process, the corrosive gas enclosed may be released and cause quality defects, or the gas may penetrate into the polymer that is the material of the FOUP and be transferred to it when used in other processes. wafer. That is, when O ₂ gas plasma is used for cleaning, it is difficult to completely remove the deposits on the substrate.

As another comparative example, it is considered that a semiconductor device manufacturing apparatus is installed in the vacuum transfer robot chamber 2 and that in addition to the dry etching unit (dry etching chamber) 1, a cleaning processing unit (cleaning processing chamber) is also installed (considering a so-called cluster) chemical device). However, compared with a configuration in which only the dry etching unit (dry etching chamber) 1 is provided, the clustered device has a lower wafer processing capability or a very large device size.

As another comparative example, it is also considered to install a rotary water cleaning unit on the side of the EFEM unit 3 . The rotary cleaning unit rotates the wafer at high speed in order to improve the dust removal performance when supplying water or chemical liquid, and to spin off and dry the wafer, for example. However, in order to rotate the wafer at high speed, a relatively rigid rotation axis is required to prevent the rotation axis from deviating. In addition, a wafer adsorption and protection mechanism is also required to prevent the wafer from flying out and being damaged due to high-speed rotation. In addition, water or chemical liquid scattered outside the wafer during high-speed rotation may hit the inner wall of the cleaning unit (cleaning chamber) and bounce back to attach to the wafer again. Therefore, in order to prevent this, it is necessary to use The distance between the wafer and the inner wall of the cleaning processing unit (cleaning chamber) is relatively far, or a splash guard is installed.

As another comparative example, a configuration in which the cleaning nozzle is moved instead of rotating the wafer to perform cleaning evenly is also considered. However, in this case, the structure also becomes larger. That is, neither of the above comparative examples reduces the size of the cleaning processing unit (cleaning chamber), so it is difficult to install such a cleaning unit directly near the EFEM unit 3 .

For example, when two or more dry etching units (dry etching chambers) are installed in a semiconductor device manufacturing apparatus, the capacity of only one cleaning and drying unit 6 may be insufficient and the wafer processing time may be extended. As a comparative example in view of this, it is also conceivable to laminate a plurality of horizontally placed substrates in the vertical direction and perform unified cleaning. However, in this case, since the cleaning chamber has a function of rotating the wafer holding member at high speed while supplying the chemical liquid, the size of the cleaning chamber becomes larger.

In the above embodiment, the capability of the cleaning and drying unit 6 is limited to the minimum capability required to remove residual gas components rather than the capability required to remove dust on the wafer. Therefore, the cleaning and drying unit 6 is omitted. Wafer rotation mechanism, holding member lifting and nozzle rotation functions. Therefore, in this embodiment, the washing and drying unit 6 can be downsized. This makes it possible to realize a cleaning and drying unit 6 that has a cleaning capability capable of removing residual gas components on the wafer produced in the dry etching unit (dry etching chamber) 1 as the main processing unit, and is miniaturized to It can be installed inside the EFEM unit 3 or at the level of the loading port unit connection portion 5A.

Next, a structural example of a cleaning and drying unit according to a modification of the first embodiment will be shown. The cleaning and drying unit of the modified example is shown in Figure 12 and is composed of a plurality of small modules that have the functions of supplying cleaning liquid, supplying dry gas, and sucking liquid and gas. As shown in FIG. 12 , the cleaning and drying unit of the variation includes a fixed wafer holding table 41 and a plurality of fixed small cleaning and drying modules (small modules) 43 . The upper surface of the small module 43 is respectively connected with supply pipes 441 for water and dry gas (N ₂ gas), and a drain pipe 461 for drainage and exhaust.

A plurality of small modules 43 are disposed close to the wafer holding table 41 and directly above the wafer 42, and function as a cleaning and drying mechanism (a cleaning liquid supply mechanism and a gas supply mechanism). The plurality of small modules 43 do not rotate or rotate. For example, as shown in FIG. 13 , a plurality of small modules 43 are arranged in a grid shape to cover the entire surface of the wafer 42 . FIG. 13 is a diagram illustrating an example of the arrangement of the cleaning and drying mechanism of the modified example. FIG. 13 is a schematic view of the wafer holding table 41 viewed from above the small module 43 .

The flow of water will be explained using Figure 14. FIG. 14 is a diagram illustrating the flow of water and dry gas during wafer cleaning according to a modified example. The small module 43 has a central nozzle 44 and a suction nozzle 46 . The central nozzle 44 extending in the third direction has an opening at one end opposite to the wafer 42 and is arranged in the center of the surface of the small module 43 opposite to the wafer 42 . The other end of the central nozzle 44 is connected to the supply pipe 441 . The suction nozzle 46 extending in the third direction has an opening at one end opposite to the wafer 42 , and is arranged to surround the central nozzle 44 on the surface of the small module 43 facing the wafer 42 . The other end of the suction nozzle 46 is connected to the discharge pipe 461. Water flows from the central nozzle 44 connected to the supply pipe 441, and the water 45 on the wafer 42 is discharged from the suction nozzle 46 connected to the drain pipe 461. Next, _N2 gas flows from the central nozzle 44 and is exhausted from the suction nozzle 46.

Furthermore, a supply switching part (not shown) is connected to one end of the supply pipe 441 that is not connected to the center nozzle 44. A water supply pipe (not shown) for supplying cleaning water and a drying gas supply are connected to the supply switching part. Gas supply pipe (not shown). The supply switching section switches the connection of the pipes so that when water flows from the center nozzle 44, the supply pipe 441 is connected to the water supply pipe, and when _N2 gas flows from the center nozzle 44, the supply pipe 441 is connected to the gas supply pipe. The drain pipe 461 also has the same structure, and the connection object of the drain pipe 461 is switched when discharging water and when discharging N ₂ gas. Each small module 43 individually cleans and dries the wafer 42 only in the gap between the wafer 42 and the wafer 42 , that is, on the surface facing the wafer 42 . The water washing flow rate can also be adjusted individually for each small module 43 or for each block including a plurality of small modules 43 . (Second Embodiment)

Next, the second embodiment will be described. FIG. 15 is a schematic diagram illustrating an example of the overall structure of a semiconductor device manufacturing apparatus according to the second embodiment of the present invention. The difference between the second embodiment and the first embodiment is that the cleaning and drying unit 6 ′ is not provided at the loading port unit connection portion 5A of the EFEM unit 3 , but is provided within the EFEM unit 3 . Other configurations and processing procedures are the same as those in Embodiment 1. Figure 16 is a perspective view of the substrate processing device. Fig. 17 is a side view illustrating an arrangement example of the cleaning and drying unit 6'. In the second embodiment, the cleaning and drying unit 6' is installed in the EFEM unit 3 in a convergent manner.

In FIG. 17 , the cleaning and drying unit 6 ′ is provided near the center of the EFEM unit 3 in the paper direction (second direction). However, the washing and drying unit 6 ′ may also be installed at the left end (loading) of the EFEM unit 3 in the paper direction. port unit 5 side), or the right end of the EFEM unit 3 in the paper direction (vacuum transfer robot chamber 2 side). If the size of the cleaning and drying unit 6' is, for example, 50 cm in width and 80 cm in depth or less, it can be installed in a commercially available EFEM unit without special modifications, so it can be used without any design, which is preferable.

When the cleaning and drying unit 6' is installed in the EFEM unit 3 as in the second embodiment, unlike the first embodiment, a semiconductor device can be constructed without reducing the number of loading port units 5 connected to the EFEM unit 3. Manufacturing device. Therefore, the semiconductor device can be manufactured more efficiently. (Third Embodiment)

Hereinafter, the third embodiment will be described. The cleaning and drying unit of the third embodiment is provided with a sensor (such as electrical conductivity) for measuring the physical property (such as conductivity, pH value, etc.) of the processing liquid (such as the cleaning liquid after cleaning the wafer). rate meter, pH meter, etc.). The sensor is used to measure the physical properties of the processing liquid, and the processing status (for example, the progress status of the wafer cleaning process) is determined based on the measured physical properties, so that the end of the wafer cleaning process can be detected based on the measured physical properties. As the structure of the cleaning and drying unit other than the sensor, any structure of the first embodiment or the second embodiment can be applied.

Hereinafter, the measurement procedure will be described using FIG. 18 , focusing on differences from the first embodiment and the second embodiment. FIG. 18 is a schematic diagram illustrating the structure of a sensor for measuring physical properties of a treatment liquid and its surroundings according to the third embodiment. As shown in FIG. 18 , in the cleaning and drying unit of the third embodiment, the cleaning liquid flowing from the cleaning and drying unit 51 to the upper surface of the wafer flows through the drain pipe 52 and flows into the sensor (conductivity meter) 53 .

Figure 19 is a graph illustrating the relationship between cleaning time and conductivity of the treatment liquid. When water is used as the cleaning fluid, as shown in Figure 19, immediately after the cleaning process starts, since more halogens (Cl, F, Br) are dissolved, the conductivity measured by the sensor 53 is higher. , however, as the cleaning process proceeds, the residual halogen on the wafer decreases, so the conductivity measured by the sensor 53 gradually approaches the conductivity of pure water. When the conductivity measured by the sensor 53 is below the determination threshold value, a control signal is sent via the control signal line 54, thereby ending the cleaning process. In this way, according to the cleaning and drying unit of the third embodiment, by measuring the physical properties of the treatment liquid, the cleaning process can be automatically ended according to the progress status. Therefore, for example, the cleaning process period for wafers with a large amount of residual halogen can be made longer, and the cleaning process period for wafers with a relatively small amount of residual halogen can be shortened. The cleaning process can be controlled without impairing the cleaning effect. The required amount and time of cleaning fluid to be used. (4th Embodiment)

Hereinafter, the fourth embodiment will be described.

FIG. 20 is a schematic diagram showing the wafer holding mechanism of the attached heater according to the fourth embodiment. FIG. 21 is a diagram illustrating an example of a wafer holding mechanism with a heater attached. FIG. 22 is a diagram illustrating an example of cleaning when a wafer holding mechanism with an additional heater is used.

As shown in FIG. 20 , the wafer holding mechanism of the fourth embodiment is provided with a plurality of heaters 311 on the upper surface of the wafer holding table 31 . As shown in FIG. 21 , for example, the plurality of heaters 311 are provided at positions that do not interfere with the lip seal 302 .

As shown in FIG. 22 , water 35 is supplied to the upper surface of the wafer 32 to clean the wafer 32 . Afterwards, N ₂ gas is supplied to the upper surface of the wafer 32 to dry the remaining moisture on the wafer 32 . In the fourth embodiment, when N ₂ gas is supplied to the upper surface of the wafer 32 , the heater 311 is used to heat the wafer 32 . This can shorten the time required for drying.

Furthermore, in the fourth embodiment, in order to clean the wafer 32 , after the water 35 is supplied to the upper surface of the wafer 32 , isopropyl alcohol (IPA) may be flowed. As a result, the time required for drying using _N2 gas can be further shortened. (fifth embodiment)

FIG. 23 is a plan view showing the structure of a semiconductor device manufacturing system according to the fifth embodiment.

The manufacturing system of this embodiment includes a track (aerial track) 601, a transport vehicle (aerial walking transport vehicle) 602 that can move along the track 601, and a plurality of manufacturing devices 603 arranged close to the track 601.

The track 601 is provided on the ceiling of a manufacturing factory, for example. In this case, the transport vehicle 602 functions as an aerial transport vehicle. However, the installation position of the track 601 is not limited to the sky. For example, the track 601 can be installed on the floor (ground) of the manufacturing factory or on the wall of the manufacturing factory. In addition, the transport vehicle 602 does not need to have wheels. In this case, the transport vehicle 602 may also be driven by a linear motor, for example.

Each manufacturing device 603 has, for example, the same configuration as the semiconductor device manufacturing device described in the first embodiment. However, the structure of each manufacturing apparatus 603 is not limited to this. For example, the same structure as the semiconductor device manufacturing apparatus and/or the cleaning and drying unit described in other embodiments may be applied.

For example, one manufacturing device 603A includes a dry etching unit that can perform dry etching as the first process as the main processing unit 1, and the other manufacturing device 603B includes a film forming unit (sputtering unit) that can perform film forming as the second process. or CVD unit) as the main processing unit 2. Examples of combinations of the first process and the second process are not limited to this. The first process and the second process may also be any one of wet etching, annealing, CMP, and ion implantation respectively. In addition, for example, the first process and the second process may also be the same type of process. For example, the first process may be a film formation using a first material, and the second process may be a film formation using a second material.

FIG. 24 shows a dry etching unit as a first example of the main processing unit 1. The dry etching unit includes, for example, a chamber 81, a wafer holder 82, and an ion source 83. The wafer holder 82 holds the wafer 7 accommodated in the chamber 81 . The ion source 83 performs dry etching of the wafer 7 by irradiating the wafer 7 with ions.

FIG. 25 shows a film forming unit (sputtering unit) as a second example of the main processing unit 1. The film forming unit (sputtering unit) includes a chamber 91 , a wafer holder 92 , and a target holder 93 . The chamber 91 is provided with a gas supply port 91a for supplying film-forming gas, and an exhaust port 91b for discharging excess gas. The wafer holder 92 holds the wafer 7 accommodated in the chamber 91 . The target holder 93 holds the target 78 for film formation.

The FOUP 13 is mounted on the transport vehicle 602 in a state where the wafers 7 are stored. The FOUP 13 mounted on the transport vehicle 602 is transported along the rail 601 and placed from the transport vehicle 602 to the loading port unit 5 of each manufacturing device 603 (for example, the manufacturing device 603A including the dry etching unit as the main processing unit 1). For example, as described in the first embodiment, the transfer robot 10 takes out the wafer 7 from the FOUP 13 placed in the load port unit 5 and transfers the wafer 7 to the vacuum transfer robot chamber 2 via the load interlock chamber 4 . The wafer 7 transferred to the vacuum transfer robot chamber 2 is transferred to the main processing unit 1 by the transfer robot 8, and processing (for example, dry etching) is performed in the main processing unit 1. The wafer 7 processed by the main processing unit 1 is transported to the cleaning and drying unit 6 by the transport robot 8 and the transport robot 10, and the cleaning and drying unit 6 performs cleaning and drying. The wafer 7 cleaned and dried in the cleaning and drying unit 6 is stored in the FOUP 13 placed in the loading port unit 5 by the transfer robot 10 .

The FOUP 13 is loaded onto the transport vehicle 602 in a state where the wafers 7 cleaned and dried by the cleaning and drying unit 6 are stored, is transported along the track 601 , and is placed on another manufacturing device 603 (for example, included as the main processing unit 1 The loading port unit 5 of the film forming unit manufacturing device 603B). The wafer 7 is transferred from the FOUP 13 placed in the load port unit 5 to the main processing unit 1 by the transfer robot 10 and the transfer robot 8, and processing (for example, sputtering) is performed in the main processing unit 1. The wafer 7 processed by the main processing unit 1 is transported to the cleaning and drying unit 6 by the transport robot 8 and the transport robot 10, and the cleaning and drying unit 6 performs cleaning and drying. The wafer 7 cleaned and dried in the cleaning and drying unit 6 is stored in the FOUP 13 placed in the loading port unit 5 by the transfer robot 10 .

The FOUP 13 is loaded onto the transport vehicle 602 in a state where the wafers 7 cleaned and dried in the cleaning and drying unit 6 are stored, is transported along the track 601 , and is placed in the loading port unit 5 of, for example, another manufacturing device 603 .

According to this embodiment, in each manufacturing device 603, after the wafer 7 is processed by the main processing unit 1, and before the wafer 7 is stored in the FOUP 13, the cleaning and drying unit 6 can be used to perform simple cleaning and drying. Thereby, the FOUP 13 and other manufacturing apparatuses 6 can be maintained in a clean state.

Several embodiments of the present invention have been described, but these embodiments are shown as examples and are not intended to limit the scope of the invention. These novel embodiments can be implemented in various other ways, and various omissions, substitutions, and changes can be made without departing from the gist of the invention. These embodiments and their modifications are included in the scope and gist of the invention, and are included in the invention described in the claims and the scope equivalent thereto. [Related applications]

This application enjoys the priority of the application based on Japanese Patent Application No. 2022-029734 (filing date: February 28, 2022). This application incorporates the entire contents of the basic application by reference to the basic application.

1: Dry etching chamber 2: Vacuum transfer robot room 3: EFEM unit (transfer module) 4: Loading interlock chamber 5: Loading port unit (loading port) 5A: Loading port unit connection part 6, 6': Cleaning and drying Unit (cleaning unit) 7: Wafer 8, 10: Transfer robot 9, 12: Transfer arm 11: Guide rail 13: FOUP 14: Cleaning and drying room 15, 15a, 15b, 15c: Cleaning and drying mechanism 16, 16a, 16b, 16c : Wafer holding mechanism 17a, 17b: Guide 18: FOUP end reference plane 19: Center of wafer 20: Wafer center position 23: Depth adjustment mechanism 24: Tilt adjustment mechanism 25: Tank 26: Water supply tank 27: For drying N ₂ gas line 31: Wafer holding table 32: Wafer 33: Opposing member 34: Cleaning liquid (water) supply nozzle 35: Water 36: Gas (N ₂ gas) supply nozzle 37: Outside guides 38a, 38b: Gap 39: Wafer tilt adjustment mechanism 41: Wafer holding table 42: Wafer 43: Small cleaning and drying module (small module) 45: Water 51: Cleaning and drying unit 52: Drainage pipe 53: Sensor (conductivity (count) 54: Control signal line 78: Target 81: Chamber 82: Wafer holder 83: Ion source 91: Chamber 91a: Gas supply port 91b: Exhaust port 92: Wafer holder 93: Target holder 301: Wafer lifting table 302: Lip seal 303: Drain pipe 304: Transfer fork 305: Wafer fixing jig 306: Lip seal 311: Heater 341: Cleaning liquid supply pipe 361: Gas supply pipe 441 : Supply pipe for water and dry gas (N ₂ gas) 461: Drainage pipe for drainage and exhaust 601: Rail (aerial rail) 602: Transport vehicle (aerial walking transport vehicle) 603, 603A, 603B: Manufacturing equipment

FIG. 1 is a schematic diagram illustrating an example of the overall structure of a semiconductor device manufacturing apparatus according to the first embodiment. 2 is a perspective view illustrating an example of the substrate processing apparatus according to the first embodiment. Figure 3 is a schematic diagram of a cleaning and drying unit when a plurality of wafer holding mechanisms and cleaning and drying mechanisms are arranged vertically. Figure 4(a)-(b) are diagrams illustrating the wafer storage locations in the loading port unit and the cleaning and drying unit. Figure 5(a)-(b) are diagrams illustrating the wafer storage locations in the loading port unit and the cleaning and drying unit. Figure 6 is a schematic diagram illustrating the setting and adjustment mechanism of the cleaning and drying unit. Figure 7 is a schematic diagram of the wafer holding mechanism of the cleaning and drying unit. Figure 8 is a schematic diagram of the wafer holding mechanism. 9(a)-(b) are diagrams illustrating an example of a wafer holding mechanism. Figure 10 is a diagram illustrating a state in which a wafer is transported above the wafer holding mechanism. 11(a) to (d) are diagrams illustrating a series of flows from conveying the wafer to the cleaning and drying unit to cleaning. Figure 12 is a diagram illustrating the structure of a small module with three functions: cleaning liquid supply, dry gas supply, and suction of liquid and gas. Figure 13 is a diagram illustrating an example of the configuration of the cleaning and drying mechanism of the variation. Figure 14 is a diagram illustrating the flow of water and dry gas during wafer cleaning according to the variation. 15 is a schematic diagram illustrating an example of the overall structure of a semiconductor device manufacturing apparatus according to the second embodiment. 16 is a perspective view illustrating an example of the substrate processing apparatus according to the second embodiment. Figure 17 is a schematic diagram illustrating an example of the arrangement of the cleaning and drying unit according to the second embodiment. 18 is a schematic diagram illustrating the sensor for measuring the physical properties of the treatment liquid in the third embodiment and its peripheral configuration. Figure 19 is a graph illustrating the relationship between cleaning time and conductivity of the treatment liquid. Figure 20 is a schematic diagram of the wafer holding mechanism of the additional heater in the cleaning and drying unit of the fourth embodiment. 21 is a diagram illustrating an example of the wafer holding mechanism of the additional heater according to the fourth embodiment. 22 is a diagram illustrating an example of cleaning according to the fourth embodiment. 23 is a plan view showing the structure of a manufacturing system including a plurality of manufacturing devices according to the fifth embodiment. 24 is a cross-sectional view showing a first example of the main processing unit included in the manufacturing apparatus according to the fifth embodiment. 25 is a cross-sectional view showing a second example of the main processing unit included in the manufacturing apparatus according to the fifth embodiment.

1: Dry etching chamber

2: Vacuum transfer robot room

3: EFEM unit (transport module)

4: Loading interlock room

5: Load port unit (load port)

5A: Loading port unit connection section

6: Cleaning and drying unit (cleaning unit)

7:wafer

8:Transport robot

9:Conveying arm

11: Guide rail

12:Conveying arm

Claims (24)

A substrate processing device comprising: transport module; cleaning unit; and loading port; The above cleaning unit contains: A processed substrate holding mechanism that can hold the processed substrate; A cleaning liquid supply mechanism capable of supplying cleaning liquid to the substrate to be processed held by the substrate to be processed holding mechanism; and a gas supply mechanism capable of supplying gas to the substrate to be processed held by the substrate to be processed holding mechanism; and The above transport modules include: A substrate-to-be-processed transport mechanism capable of transporting the substrate-to-be-processed between the loading port and the cleaning unit; The above-mentioned cleaning unit is connected to the above-mentioned transport module in parallel with the above-mentioned loading port. The substrate processing device of claim 1, wherein the above-mentioned transport module further includes: Rails extending in the first direction, The above-mentioned processed substrate transport mechanism has: A base that can move on the above-mentioned rails; A telescopic arm that is rotatably mounted on the above-mentioned base and can adjust the amount of protrusion from the above-mentioned base in a second direction orthogonal to the above-mentioned first direction; and a holding portion, which is provided on the front end side of the telescopic arm and can hold the substrate to be processed; and In the above transport module, Link to at least one of the above mentioned load ports, Set the storage location of the substrate to be processed with the substrate to be processed container installed in the loading port as the first storage location, and When the storage position of the substrate to be processed in the state of being cleaned by the above-mentioned cleaning unit is set to the second storage position, The distance from the above-mentioned rail to the above-mentioned first storage position in the above-mentioned second direction, It is equal to the distance from the above-mentioned rail to the above-mentioned second storage position in the above-mentioned second direction. The substrate processing device of claim 2, wherein the transport module has a plurality of loading port connections, The above-mentioned loading port is connected to at least one of the above-mentioned plurality of loading port connection parts, The above-mentioned cleaning unit is connected to at least another one of the above-mentioned plurality of loading port connections, The substrate-to-be-processed transport mechanism can transport the substrate from the loading port to the substrate-to-be-processed holding mechanism. The substrate processing device of claim 1, wherein The above-mentioned cleaning unit is configured to be able to adjust its relative position to the above-mentioned transport module. The substrate processing device of claim 2, wherein The amount of extension of the holding portion in the second direction when the substrate to be processed is stored in the substrate to be processed container, The amount of extension of the holding portion in the second direction is the same as that of the substrate to be processed in the cleaning unit. The substrate processing device of claim 2, wherein There are a plurality of the above-mentioned first storage locations in the third direction orthogonal to the above-mentioned first direction and the above-mentioned second direction, The position of the above-mentioned second storage position in the above-mentioned third direction is equal to the position of any one of the plurality of above-mentioned first storage positions in the above-mentioned third direction. The substrate processing device of claim 2, wherein The above-mentioned cleaning unit further has: A second substrate-to-be-processed holding mechanism is provided at a position separated from the substrate-to-be-processed holding mechanism in a third direction orthogonal to the first direction and the second direction; a second cleaning liquid supply mechanism capable of supplying the cleaning liquid to the second substrate to be processed held by the second substrate to be processed holding mechanism; and a second gas supply mechanism capable of supplying the gas to the second substrate to be processed held by the second substrate to be processed holding mechanism; and The substrate to be processed held by the substrate to be processed holding mechanism can be cleaned at the same time. When cleaning the substrate to be processed, the second substrate to be processed that is held by the second substrate to be processed holding mechanism may be cleaned. The substrate processing device of claim 1, wherein The above-mentioned cleaning liquid supply mechanism is capable of supplying the above-mentioned cleaning liquid to the upper surface of the above-mentioned substrate to be processed during a first predetermined period in a state where the relative position to the above-mentioned substrate to be processed is fixed, The gas supply mechanism may supply the gas to the upper surface of the substrate to be processed during a second predetermined period in a state where the relative position to the substrate to be processed is fixed. The substrate processing device of claim 8, wherein The above-mentioned cleaning unit further includes functional parts, The above functional parts include: The above-mentioned cleaning fluid supply mechanism; the above-mentioned gas supply mechanism; and A suction mechanism that can suck the above-mentioned cleaning liquid and the above-mentioned gas; and A plurality of the functional components are arranged so as to face the upper surface of the substrate to be processed for at least the first predetermined period or the second predetermined period. The substrate processing apparatus of Claim 1, wherein the cleaning liquid supply mechanism can further supply isopropyl alcohol after supplying the cleaning liquid to the substrate to be processed. The substrate processing apparatus of claim 1, wherein the gas includes nitrogen. The substrate processing device of claim 1, wherein the cleaning unit further includes: an opposing member having a first surface facing the upper surface of the substrate to be processed when the substrate to be processed is stored in the cleaning unit; The cleaning liquid supply mechanism and the gas supply mechanism can respectively supply the cleaning liquid and the gas between the first surface of the facing member and the upper surface of the substrate to be processed, The first surface of the facing member is formed of a hydrophobic material. The substrate processing device of claim 1, wherein the cleaning unit further includes: an adjustment mechanism that adjusts the inclination of the substrate to be processed when the substrate to be processed is stored in the cleaning unit. The substrate processing apparatus of claim 1 further includes a sensor that can measure the physical properties of the cleaning liquid supplied to the substrate to be processed by the cleaning liquid supply mechanism. A substrate processing device comprising: transport module; A cleaning unit is installed in the above-mentioned transport module; and A loading port connected to the above-mentioned transport module; and The above cleaning unit contains: A processed substrate holding mechanism that can hold the processed substrate; A cleaning liquid supply mechanism capable of supplying cleaning liquid to the substrate to be processed held by the substrate to be processed holding mechanism; and a gas supply mechanism capable of supplying gas to the substrate to be processed held by the substrate to be processed holding mechanism; and The above transport modules include: A processed substrate transport mechanism capable of transporting the processed substrate between the loading port and the cleaning unit. The substrate processing device of claim 15, wherein The above-mentioned transport module further includes: Rails extending in the first direction, The above-mentioned processed substrate transport mechanism has: A base that can move on the above-mentioned rails; A telescopic arm that is rotatably mounted on the above-mentioned base and can adjust the amount of protrusion from the above-mentioned base in a second direction orthogonal to the above-mentioned first direction; and a holding portion, which is provided on the front end side of the telescopic arm and can hold the substrate to be processed; and The above-mentioned cleaning unit further has: A second substrate-to-be-processed holding mechanism is provided at a position separated from the substrate-to-be-processed holding mechanism in a third direction orthogonal to the first direction and the second direction; a second cleaning liquid supply mechanism capable of supplying the cleaning liquid to the second substrate to be processed held by the second substrate to be processed holding mechanism; and a second gas supply mechanism capable of supplying the gas to the second substrate to be processed held by the second substrate to be processed holding mechanism; and The substrate to be processed held by the substrate to be processed holding mechanism can be cleaned, When cleaning the substrate to be processed, the second substrate to be processed that is held by the second substrate to be processed holding mechanism may be cleaned. The substrate processing apparatus of claim 15, wherein the cleaning liquid supply mechanism can supply the cleaning liquid to the upper surface of the substrate to be processed during a first predetermined period in a state where the relative position to the substrate to be processed is fixed, The gas supply mechanism may supply the gas to the upper surface of the substrate to be processed during a second predetermined period in a state where the relative position to the substrate to be processed is fixed. The substrate processing device of claim 17, wherein The above-mentioned cleaning unit further includes functional parts, The above functional parts include: The above-mentioned cleaning fluid supply mechanism; the above-mentioned gas supply mechanism; and A suction mechanism that can suck the above-mentioned cleaning liquid and the above-mentioned gas; and A plurality of the functional components are arranged so as to face the upper surface of the substrate to be processed for at least the first predetermined period or the second predetermined period. The substrate processing apparatus of claim 15, wherein the cleaning liquid supply mechanism can further supply isopropyl alcohol after supplying the cleaning liquid to the substrate to be processed. The substrate processing apparatus of claim 15, wherein the gas includes nitrogen. The substrate processing device of claim 15, wherein the cleaning unit further includes: an opposing member having a first surface facing the upper surface of the substrate to be processed when the substrate to be processed is stored in the cleaning unit; The cleaning liquid supply mechanism and the gas supply mechanism can respectively supply the cleaning liquid and the gas between the first surface of the facing member and the upper surface of the substrate to be processed; The first surface of the facing member is formed of a hydrophobic material. The substrate processing device of claim 15, wherein the cleaning unit further includes: an adjustment mechanism that adjusts the inclination of the substrate to be processed when the substrate to be processed is stored in the cleaning unit. The substrate processing apparatus of claim 15 further includes a sensor capable of measuring the physical properties of the cleaning liquid supplied to the substrate to be processed by the cleaning liquid supply mechanism. A method of manufacturing a semiconductor device using a first device, a second device and an aerial walking transport vehicle, The above-mentioned first device includes: Unit 1, which can execute the first process; 1st transport module; The first loading port is installed on the above-mentioned first transport module; and A cleaning unit installed on the above-mentioned first transport module; and The above-mentioned second device includes: Unit 2, which can perform the second process; 2nd transport module; and The second loading port is installed on the above-mentioned second transport module; wherein The above-mentioned cleaning unit can perform a cleaning process that uses: A processed substrate holding mechanism that can hold the processed substrate; A cleaning liquid supply mechanism capable of supplying cleaning liquid to the substrate to be processed held by the substrate to be processed holding mechanism; and a gas supply mechanism capable of supplying gas to the substrate to be processed held by the substrate to be processed holding mechanism; and The manufacturing method of the semiconductor device includes: Use the above-mentioned first unit to perform the above-mentioned first process on the above-mentioned substrate to be processed; Use the above-mentioned first transport module to transport the above-mentioned processed substrate that has executed the above-mentioned first process from the above-mentioned first unit to the above-mentioned cleaning unit; Use the above-mentioned cleaning unit to perform the above-mentioned cleaning process on the above-mentioned substrate to be processed that has performed the above-mentioned first process; Use the above-mentioned first transport module to transport the above-mentioned processed substrate that has performed the above-mentioned cleaning process from the above-mentioned cleaning unit to the above-mentioned first loading port; Use the above-mentioned ceiling-mounted walking transport vehicle to transport the above-mentioned processed substrate that has performed the above-mentioned cleaning process from the above-mentioned first loading port to the above-mentioned second loading port; Use the above-mentioned second transport module to transport the above-mentioned processed substrate that has performed the above-mentioned cleaning process from the second loading port to the above-mentioned second unit; and The above-mentioned second unit is used to perform the above-mentioned second process on the above-mentioned processed substrate that has performed the above-mentioned cleaning process.