TW202336073A - Curable resin composition, adhesive, cured product, camera module, and electronic device - Google Patents

Curable resin composition, adhesive, cured product, camera module, and electronic device Download PDF

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TW202336073A
TW202336073A TW112106668A TW112106668A TW202336073A TW 202336073 A TW202336073 A TW 202336073A TW 112106668 A TW112106668 A TW 112106668A TW 112106668 A TW112106668 A TW 112106668A TW 202336073 A TW202336073 A TW 202336073A
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curable resin
resin composition
latent hardener
imidazole derivative
epoxy resin
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TW112106668A
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熊倉里美
濱田香織
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日商納美仕有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J163/00Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

The purpose of the present invention is to provide a curable resin composition that cures rapidly and can reduce the occurrence of bleed. That is, this curable resin composition comprises an epoxy resin, a latent curing agent, and an imidazole derivative having a melting point of not more than 180 DEG C.

Description

硬化性樹脂組成物、接著劑、硬化物、攝影模組及電子設備Curable resin compositions, adhesives, hardened materials, photographic modules and electronic equipment

本發明係關於一種硬化性樹脂組成物、接著劑、硬化物、攝影模組及電子設備。The present invention relates to a curable resin composition, adhesive, cured product, photography module and electronic equipment.

近年來,有使用搭載了攝影模組之可攜式終端裝置或家電製品等電子設備。製造搭載了攝影模組之電子設備時,有一種將零件高密度地配置之方法為覆晶(flip chip)封裝法。覆晶封裝法中,有將例如攝影模組與基板以接著劑等固定的步驟。In recent years, electronic devices such as portable terminal devices and home appliances equipped with photographic modules have been used. When manufacturing electronic equipment equipped with photographic modules, one method of arranging parts at a high density is the flip chip packaging method. In the flip-chip packaging method, there is a step of fixing, for example, a photography module and a substrate with an adhesive or the like.

覆晶封裝法所使用的接著劑,由提升作業效率的觀點而言,被要求快速硬化。由滿足此要求的觀點而言,至今已設計出包含環氧樹脂及硬化劑之物(參照例如專利文獻1、2)。The adhesive used in the flip-chip packaging method is required to harden quickly from the perspective of improving work efficiency. From the viewpoint of meeting this requirement, products containing an epoxy resin and a hardener have been designed so far (see, for example, Patent Documents 1 and 2).

專利文獻1為日本特開2014-156519號公報,專利文獻2為特開2010-111711號公報。Patent Document 1 is Japanese Patent Application Laid-Open No. 2014-156519, and Patent Document 2 is Japanese Patent Application Laid-Open No. 2010-111711.

覆晶封裝法中,接著劑用於例如填補半導體與基板之間的空隙。此時,可能會發生接著劑(即硬化性樹脂組成物)的液狀成分滲出的現象(所謂的bleed)。發生滲出的情況下,會有接著劑附著至應以接著劑接著之部位以外的佈線這樣的問題。例如,製作攝影模組時發生滲出的情況下,接著劑由感測器等半導體晶片的下方擴散至微型鏡片(microlens)而滲出。其結果為接著劑的液狀成分滲出至微型鏡片及基板上的焊墊(pad),導致攝影模組故障。In the flip-chip packaging method, the adhesive is used, for example, to fill the gap between the semiconductor and the substrate. At this time, the liquid component of the adhesive (that is, the curable resin composition) may bleed out (so-called bleed). When bleeding occurs, there is a problem that the adhesive adheres to wiring other than the area where the adhesive should be bonded. For example, when leakage occurs during the production of a photography module, the adhesive diffuses from the bottom of a semiconductor chip such as a sensor to a microlens and leaks out. As a result, the liquid component of the adhesive seeps into the micro lens and the pads on the substrate, causing the photography module to malfunction.

在此,以往的電子設備多為較大型者,構件間的距離亦較大。因此,即使是發生滲出的情況下,接著劑的成分仍難以到達應以接著劑接著之部位以外的構件。另一方面,近年來要求的小型電子設備中,越來越需要考慮滲出的影響。Here, in the past, most electronic devices were relatively large, and the distance between components was also relatively large. Therefore, even if bleeding occurs, it is difficult for the components of the adhesive to reach members other than the parts to be bonded with the adhesive. On the other hand, in the small electronic equipment required in recent years, it is increasingly necessary to consider the influence of leakage.

本發明之目的係提供一種硬化快且可減少發生滲出之硬化性樹脂組成物,以及使用其之接著劑、硬化物、攝影模組及電子設備。The object of the present invention is to provide a curable resin composition that hardens quickly and can reduce bleeding, as well as adhesives, cured products, photographic modules and electronic equipment using the same.

為了達成上述目的,本發明之一實施態樣如下。 (1)一種硬化性樹脂組成物,含有環氧樹脂、潛伏性硬化劑及熔點為180℃以下之咪唑衍生物。 (2)如(1)之硬化性樹脂組成物,其中,該咪唑衍生物的熔點為160℃以下。 (3)如(1)或(2)之硬化性樹脂組成物,其中,該咪唑衍生物的熔點為未滿100℃。 (4)一種接著劑,含有如(1)至(3)中任一項之硬化性樹脂組成物。 (5)一種硬化物,係由如(1)至(3)中任一項之硬化性樹脂組成物得到。 (6)一種攝影模組,具有如(5)之硬化物。 (7)一種電子設備,具有如(6)之攝影模組。 In order to achieve the above object, one embodiment of the present invention is as follows. (1) A curable resin composition containing an epoxy resin, a latent hardener and an imidazole derivative with a melting point of 180°C or lower. (2) The curable resin composition according to (1), wherein the imidazole derivative has a melting point of 160°C or lower. (3) The curable resin composition according to (1) or (2), wherein the imidazole derivative has a melting point of less than 100°C. (4) An adhesive containing the curable resin composition according to any one of (1) to (3). (5) A cured product obtained from the curable resin composition according to any one of (1) to (3). (6) A photography module having a hardened object as in (5). (7) An electronic device having a photography module as in (6).

與相關文獻之交互參照:本申請案係基於2022年3月2日申請之日本特許出願2022-031853主張優先權,藉由引用該基礎申請案而包含於本說明書。Cross-reference with related documents: This application claims priority based on Japanese Patent Application No. 2022-031853 filed on March 2, 2022, and is included in this specification by citing this basic application.

根據本發明,可提供一種硬化快且可減少發生滲出之硬化性樹脂組成物,以及使用其之接著劑、硬化物、攝影模組及電子設備。According to the present invention, it is possible to provide a curable resin composition that hardens quickly and can reduce bleeding, as well as adhesives, cured products, photographic modules and electronic equipment using the same.

(概要) 使用第1圖說明製造攝影模組時之滲出的發生。例如,製造攝影模組時,對基板40與影像感測器50之空隙供給經加溫之硬化性樹脂組成物70。之後,藉由加熱基板40及影像感測器50,使硬化性樹脂組成物硬化。 (summary) Figure 1 is used to illustrate the occurrence of bleeding during the manufacturing of photographic modules. For example, when manufacturing a photography module, the heated curable resin composition 70 is supplied to the gap between the substrate 40 and the image sensor 50 . Thereafter, the curable resin composition is cured by heating the substrate 40 and the image sensor 50 .

供給硬化性樹脂組成物時之加溫,係為了使硬化性樹脂組成物的黏度降低,以容易地供給硬化性樹脂組成物而進行。因此,加熱至完全硬化為止的期間,硬化性樹脂組成物由基板40及影像感測器50的空隙之開口部分滲出至基板40上,因而發生滲出。Heating when supplying the curable resin composition is performed in order to reduce the viscosity of the curable resin composition so that the curable resin composition can be easily supplied. Therefore, during the period of heating until complete curing, the curable resin composition oozes out onto the substrate 40 from the opening of the gap between the substrate 40 and the image sensor 50 , thus bleeding occurs.

發明人等針對發生滲出的原因進行探討。結果發現由開口部分滲出至基板上的成分為硬化性樹脂組成物所含有的低分子成分。The inventors studied the reasons for the occurrence of exudation. As a result, it was found that the components exuded from the opening onto the substrate were low molecular components contained in the curable resin composition.

在此,發明人等探討了在低分子成分從黏度降低之硬化性樹脂組成物滲出前,能夠硬化的成分配比。探討結果發現藉由將特定的咪唑衍生物與潛伏性硬化劑併用,則硬化快速,且可減少發生滲出,進而完成本發明。Here, the inventors examined a component ratio that can be cured before low-molecular components bleed out from the curable resin composition with reduced viscosity. As a result of the investigation, it was found that by using a specific imidazole derivative in combination with a latent hardener, the hardening can be accelerated and the occurrence of bleeding can be reduced, and the present invention was completed.

(硬化性樹脂組成物) 實施態樣之硬化性樹脂組成物含有環氧樹脂、潛伏性硬化劑及咪唑衍生物,較佳含有填充劑,進一步依照需要而含有其他成分。 (hardening resin composition) The curable resin composition according to the embodiment contains an epoxy resin, a latent hardener and an imidazole derivative, preferably a filler, and further contains other components as necessary.

<環氧樹脂> 環氧樹脂係賦予硬化性、耐熱性、接著性,為了對硬化性樹脂組成物的硬化物賦予耐久性而被含有。環氧樹脂只要是一般而言用於半導體之各種環氧樹脂,則不特別限制,可依照目的來適當地選擇。 <Epoxy resin> The epoxy resin system imparts curability, heat resistance, and adhesiveness, and is contained in order to impart durability to the cured product of the curable resin composition. The epoxy resin is not particularly limited as long as it is a variety of epoxy resins generally used for semiconductors, and can be appropriately selected according to the purpose.

環氧樹脂可舉例如雙酚A型環氧樹脂、溴化雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚A型/雙酚F型環氧樹脂、萘型環氧樹脂、聯苯型環氧樹脂、酚醛清漆型環氧樹脂、胺基酚系環氧樹脂、脂環族環氧樹脂、醚系或聚醚系環氧樹脂、含環氧乙烷環之環氧樹脂、多官能型環氧樹脂等。該等可單獨使用一種或兩種以上併用。該等之中,由硬化性樹脂組成物之低黏度化及耐濕可靠性的觀點而言,較佳為雙酚A型/雙酚F型環氧樹脂、萘型環氧樹脂、多官能型環氧樹脂。Examples of the epoxy resin include bisphenol A type epoxy resin, brominated bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol A type/bisphenol F type epoxy resin, and naphthalene type epoxy resin. , biphenyl epoxy resin, novolac epoxy resin, aminophenol epoxy resin, alicyclic epoxy resin, ether or polyether epoxy resin, epoxy resin containing ethylene oxide ring , multifunctional epoxy resin, etc. These may be used alone or in combination of two or more. Among these, from the viewpoint of low viscosity and moisture resistance reliability of the curable resin composition, bisphenol A type/bisphenol F type epoxy resin, naphthalene type epoxy resin, and polyfunctional type epoxy resin are preferred. Epoxy resin.

環氧樹脂可使用合成之物或市售品。市售品可舉例如YD-128、YD-825GS(雙酚A型環氧樹脂,新日鐵化學股份有限公司製)、YDF8170、YDF870GS(雙酚F型環氧樹脂,新日鐵化學股份有限公司製)、EPICLON(登錄商標) EXA 835LV(雙酚A型/雙酚F型環氧樹脂,DIC股份有限公司製)、EPICLON(登錄商標) HP 4032D(萘型環氧樹脂,DIC股份有限公司製)、jer(登錄商標) 630D(多官能型環氧樹脂,三菱化學股份有限公司製)等。As the epoxy resin, a synthetic product or a commercially available product can be used. Examples of commercially available products include YD-128, YD-825GS (bisphenol A type epoxy resin, manufactured by Nippon Steel Chemical Co., Ltd.), YDF8170, and YDF870GS (bisphenol F type epoxy resin, manufactured by Nippon Steel Chemical Co., Ltd. Co., Ltd.), EPICLON (registered trademark) EXA 835LV (bisphenol A type/bisphenol F type epoxy resin, made by DIC Co., Ltd.), EPICLON (registered trademark) HP 4032D (naphthalene type epoxy resin, DIC Co., Ltd. manufactured), jer (registered trademark) 630D (multifunctional epoxy resin, manufactured by Mitsubishi Chemical Co., Ltd.), etc.

環氧樹脂的含量不特別限制,可依照目的來適當地選擇,由黏度及加工性之觀點而言,對於除了填充劑以外的硬化性樹脂組成物,較佳為40質量%~95質量%,更佳為45質量%~90質量%,又較佳為50質量%~88質量%。The content of the epoxy resin is not particularly limited and can be appropriately selected according to the purpose. From the viewpoint of viscosity and processability, for the curable resin composition excluding the filler, 40% by mass to 95% by mass is preferred. More preferably, it is 45 mass % - 90 mass %, and still more preferably, it is 50 mass % - 88 mass %.

<潛伏性硬化劑> 潛伏性硬化劑係為了促進硬化性樹脂組成物之硬化而被含有。潛伏性硬化劑為於室溫下不溶的固體,藉由加熱而軟化且反應進行之硬化劑。潛伏性硬化劑可舉例如在微膠囊填充硬化劑之微膠囊化硬化劑。 <Latent hardener> The latent curing agent is contained in order to promote curing of the curable resin composition. Latent hardener is a solid that is insoluble at room temperature and is softened by heating and the reaction proceeds. Examples of latent curing agents include microencapsulated curing agents in which microcapsules are filled with a curing agent.

潛伏性硬化劑可使用合成之物或市售品。未被微膠囊化之潛伏性硬化劑的市售品可舉例如FUJICURE系列之FXE-1000、FUJICURE FXB-1050、FXR1121、FXR1020(以上為T&K TOKA股份有限公司製)等。微膠囊化之潛伏性硬化劑的市售品可舉例如NOVACURE(登錄商標)系列之HXA9322HP、HX3721、HX3088、HXA3932HP、HXA3922HP、HXA5945 HP、HXA5911HP(以上為旭化成股份有限公司製)等。該等可單獨使用一種或兩種以上併用。該等之中,由提升硬化速度之觀點而言,較佳為NOVACURE HXA9322HP。As the latent hardener, a synthetic product or a commercially available product can be used. Examples of commercially available latent hardeners that are not microencapsulated include FXE-1000, FUJICURE FXB-1050, FXR1121, and FXR1020 of the FUJICURE series (the above products are manufactured by T&K TOKA Co., Ltd.). Commercially available products of microencapsulated latent hardeners include NOVACURE (registered trademark) series HXA9322HP, HX3721, HX3088, HXA3932HP, HXA3922HP, HXA5945 HP, and HXA5911HP (the above are manufactured by Asahi Kasei Co., Ltd.). These may be used alone or in combination of two or more. Among them, NOVACURE HXA9322HP is preferred from the viewpoint of increasing the hardening speed.

潛伏性硬化劑的含量不特別限制,可依照目的來適當地選擇,由黏度及耐濕可靠性之觀點而言,對於除了填充劑以外的硬化性樹脂組成物,較佳為2質量%~30質量%,更佳為5質量%~25質量%。The content of the latent hardener is not particularly limited and can be appropriately selected according to the purpose. From the viewpoint of viscosity and moisture resistance reliability, for the curable resin composition other than the filler, 2% by mass to 30% by mass is preferred. mass%, more preferably 5 mass% to 25 mass%.

<咪唑衍生物> 咪唑衍生物係為了促進硬化性樹脂組成物之硬化而被含有。本發明中,咪唑衍生物為於室溫下不溶的固體,藉由加熱而可溶化,藉此促進硬化性樹脂組成物之硬化。 <Imidazole Derivatives> The imidazole derivative is contained in order to accelerate hardening of the curable resin composition. In the present invention, the imidazole derivative is a solid that is insoluble at room temperature and is soluble by heating, thereby accelerating the hardening of the curable resin composition.

咪唑衍生物的熔點為180℃以下,較佳為160℃以下,又較佳為未滿100℃。咪唑衍生物的熔點未滿100℃意為於100℃為液體。若咪唑衍生物的熔點為180℃以下,則可減少發生滲出。又,咪唑衍生物的熔點較佳為10℃以上。The melting point of the imidazole derivative is 180°C or lower, preferably 160°C or lower, and more preferably less than 100°C. The imidazole derivative having a melting point less than 100°C means that it is liquid at 100°C. If the melting point of the imidazole derivative is 180°C or lower, the occurrence of bleeding can be reduced. Moreover, the melting point of the imidazole derivative is preferably 10°C or higher.

熔點為180℃以下之咪唑衍生物可舉例如2-甲基咪唑(熔點:142℃)、2-十一基咪唑(熔點:71-75℃)、2-十七基咪唑(熔點:89℃)、2-乙基-4-甲基咪唑(熔點:47-54℃)、2-苯基咪唑(熔點:142-148℃)、2-苯基-4-甲基咪唑(熔點:180℃)、2-苯基-4-甲基-1H-咪唑(熔點:174-184℃)、2,3-二氫-1H-吡咯[1,2-a]苯并咪唑(熔點:115℃)、1-[([1,1’-聯苯]-2-基)氧]-3-(2-甲基-1H-咪唑-1-基)丙-2-醇(1-[([1,1’-biphenyl]-2-yl)oxy]-3-(2- methyl-1H-imidazole-1-yl)propan-2-ol)(熔點:160℃)等。該等可單獨使用一種或兩種以上併用。該等之中,由使用時之溫度、硬化溫度、硬化速度及糊漿的黏度穩定性之觀點而言,較佳為2-十一基咪唑、2-十七基咪唑、(1-[([1,1’-聯苯]-2-基)氧]-3-(2-甲基-1H-咪唑-1-基)丙-2-醇。Examples of imidazole derivatives with a melting point of 180°C or lower include 2-methylimidazole (melting point: 142°C), 2-undecylimidazole (melting point: 71-75°C), and 2-heptadecanylimidazole (melting point: 89°C) ), 2-ethyl-4-methylimidazole (melting point: 47-54℃), 2-phenylimidazole (melting point: 142-148℃), 2-phenyl-4-methylimidazole (melting point: 180℃ ), 2-phenyl-4-methyl-1H-imidazole (melting point: 174-184℃), 2,3-dihydro-1H-pyrrole[1,2-a]benzimidazole (melting point: 115℃) , 1-[([1,1'-biphenyl]-2-yl)oxy]-3-(2-methyl-1H-imidazol-1-yl)propan-2-ol (1-[([1 ,1'-biphenyl]-2-yl)oxy]-3-(2-methyl-1H-imidazole-1-yl)propan-2-ol) (melting point: 160°C), etc. These may be used alone or in combination of two or more. Among these, from the viewpoint of the temperature during use, hardening temperature, hardening speed, and viscosity stability of the paste, 2-undecylimidazole, 2-heptadecanylimidazole, (1-[( [1,1'-biphenyl]-2-yl)oxy]-3-(2-methyl-1H-imidazol-1-yl)propan-2-ol.

咪唑衍生物的含量不特別限制,可依照目的來適當地選擇,由硬化速度及糊漿的黏度穩定性之觀點而言,對於除了填充劑以外的硬化性樹脂組成物,較佳為2質量%~30質量%,更佳為3質量%~25質量%,又較佳為3質量%~20質量%。The content of the imidazole derivative is not particularly limited and can be appropriately selected according to the purpose. From the viewpoint of curing speed and viscosity stability of the paste, 2 mass % is preferred for curable resin compositions other than fillers. ~30 mass%, more preferably 3 mass% to 25 mass%, further preferably 3 mass% to 20 mass%.

咪唑衍生物的含量與潛伏性硬化劑的含量之比值(咪唑衍生物/潛伏性硬化劑)較佳為0.02~5,更佳為0.05~3。比值(咪唑衍生物/潛伏性硬化劑)若在此範圍內,則減少發生滲出。The ratio of the content of the imidazole derivative to the content of the latent hardener (imidazole derivative/latent hardener) is preferably 0.02 to 5, more preferably 0.05 to 3. If the ratio (imidazole derivative/latent hardener) is within this range, the occurrence of exudation will be reduced.

<填充劑> 填充劑係為了調整硬化性樹脂組成物的硬化物之特性(主要有線膨脹係數、彈性模數、吸水率)而被含有。填充劑的種類不特別限制,可依照目的來適當地選擇,可舉例如熔融二氧化矽、結晶二氧化矽等二氧化矽;碳酸鈣、黏土、氧化鋁、氮化矽、碳化矽、氮化硼、矽酸鈣、鈦酸鉀、氮化鋁、氧化鈹、氧化鋯、鋯石、鎂橄欖石、塊滑石、尖晶石、富鋁紅柱石、二氧化鈦、氫氧化鋁、氫氧化鎂、硼酸鋅、鉬酸鋅等。該等可單獨使用一種或兩種以上併用。該等之中,由穩定性及耐熱性之觀點而言,較佳為二氧化矽填充劑。 <Filler> The filler is contained in order to adjust the characteristics (mainly linear expansion coefficient, elastic modulus, and water absorption) of the cured product of the curable resin composition. The type of filler is not particularly limited and can be appropriately selected according to the purpose. Examples include silicon dioxide such as fused silicon dioxide and crystalline silicon dioxide; calcium carbonate, clay, alumina, silicon nitride, silicon carbide, and nitride. Boron, calcium silicate, potassium titanate, aluminum nitride, beryllium oxide, zirconia, zircon, forsterite, talc, spinel, mullite, titanium dioxide, aluminum hydroxide, magnesium hydroxide, boric acid Zinc, zinc molybdate, etc. These may be used alone or in combination of two or more. Among these, a silica filler is preferable from the viewpoint of stability and heat resistance.

填充劑可為施有表面處理之物。表面處理劑不特別限制,可依照目的來適當地選擇,可舉例如矽烷耦合劑等。The filler may be surface-treated. The surface treatment agent is not particularly limited and can be appropriately selected according to the purpose. Examples thereof include a silane coupling agent and the like.

矽烷耦合劑不特別限制,可依照目的來適當地選擇,可舉例如環氧系、甲基丙烯酸系、胺基系、乙烯基系、環氧丙氧基系、巰基系等。The silane coupling agent is not particularly limited and can be appropriately selected according to the purpose. Examples thereof include epoxy type, methacrylic type, amino type, vinyl type, glycidoxy type, mercapto type, and the like.

填充劑的體積平均粒徑不特別限制,可依照目的來適當地選擇,例如,較佳為0.03μm~10μm,更佳為0.05μm~5μm,又較佳為0.05μm~2μm。本實施形態中,體積平均粒徑係使用雷射繞射法所測定之體積累積粒度分布為50%之粒徑。The volume average particle diameter of the filler is not particularly limited and can be appropriately selected according to the purpose. For example, 0.03 μm to 10 μm is preferred, 0.05 μm to 5 μm is more preferred, and 0.05 μm to 2 μm is more preferred. In this embodiment, the volume average particle size is the particle size at which the volume cumulative particle size distribution measured using the laser diffraction method is 50%.

填充劑的形狀不特別限制,可依照目的來適當地選擇,可舉例如球狀、不規則形、鱗片狀等,較佳為球狀。The shape of the filler is not particularly limited and can be appropriately selected according to the purpose. Examples thereof include spherical, irregular, scaly, etc., and spherical is preferred.

填充劑的含量不特別限制,可依照目的來適當地選擇。The content of the filler is not particularly limited and can be appropriately selected depending on the purpose.

<其他成分> 其他成分只要是一般硬化性樹脂組成物所含有之物,則不特別限制,可依照目的來適當地選擇,可舉例如碳黑或鈦黑等著色劑、離子捕捉劑、整平劑、抗氧化劑、消泡劑、搖變劑、黏度調整劑、難燃劑、溶劑等。該等可單獨使用一種或兩種以上併用。 <Other ingredients> Other components are not particularly limited as long as they are contained in general curable resin compositions and can be appropriately selected according to the purpose. Examples include colorants such as carbon black and titanium black, ion trapping agents, leveling agents, and antioxidants. , defoamer, thixotrope, viscosity adjuster, flame retardant, solvent, etc. These may be used alone or in combination of two or more.

其他成分的含量不特別限制,可依照目的來適當地選擇。The content of other ingredients is not particularly limited and can be appropriately selected depending on the purpose.

本發明之硬化性樹脂組成物由於以下兩個理由而可抑制滲出。第一,藉由含有於常溫為固體之咪唑衍生物,則硬化性樹脂組成物容易附著於基板的凹凸,故可抑制硬化性樹脂組成物滲出。第二,藉由含有潛伏性硬化劑,則在加溫時潛伏性硬化劑溶出,故可促進硬化。亦即,可在硬化性樹脂組成物滲出前使硬化性樹脂組成物硬化。The curable resin composition of the present invention can suppress bleeding for the following two reasons. First, by containing an imidazole derivative that is solid at room temperature, the curable resin composition can easily adhere to the unevenness of the substrate, so the bleeding of the curable resin composition can be suppressed. Secondly, by containing a latent hardener, the latent hardener is eluted when heated, thereby accelerating hardening. That is, the curable resin composition can be hardened before the curable resin composition bleeds out.

-硬化性樹脂組成物的製造方法- 硬化性樹脂組成物的製造方法不特別限制,可依照目的來適當地選擇,可舉例如將上述成分混合攪拌之方法。 -Method for manufacturing curable resin composition- The manufacturing method of the curable resin composition is not particularly limited and can be appropriately selected depending on the purpose. For example, a method of mixing and stirring the above-mentioned components can be used.

又,可同時混合各成分,亦可先混合一部分之成分,之後再混合剩下的成分。對於環氧樹脂,難以將填充劑均一地分散的情況下,可先將環氧樹脂與填充劑混合,之後再混合剩下的成分。In addition, the ingredients can be mixed at the same time, or a part of the ingredients can be mixed first and then the remaining ingredients can be mixed. For epoxy resin, if it is difficult to disperse the filler uniformly, you can mix the epoxy resin and the filler first, and then mix the remaining ingredients.

混合攪拌所使用之裝置不特別限制,可依照目的來適當地選擇,可舉例如輥磨機。The device used for mixing is not particularly limited and can be appropriately selected depending on the purpose. Examples thereof include a roller mill.

(接著劑) 本實施形態之接著劑含有上述硬化性樹脂組成物。 (adhesive) The adhesive of this embodiment contains the above-mentioned curable resin composition.

(硬化物) 本實施形態之硬化物係使上述硬化性樹脂組成物硬化之物。硬化物的形狀及厚度不特別限制,可依照目的來適當地選擇。 (hardened substance) The cured product of this embodiment is a cured product obtained by curing the above-mentioned curable resin composition. The shape and thickness of the hardened material are not particularly limited and can be appropriately selected according to the purpose.

使硬化性樹脂組成物硬化之方法可舉例如加熱等。加熱溫度不特別限制,可依照目的來適當地選擇,較佳為80℃~150℃,更佳為100℃~130℃。加熱時間不特別限制,可依照目的來適當地選擇,可舉例如1分鐘~2小時等。Examples of methods for curing the curable resin composition include heating. The heating temperature is not particularly limited and can be appropriately selected according to the purpose. It is preferably 80°C to 150°C, more preferably 100°C to 130°C. The heating time is not particularly limited and can be appropriately selected depending on the purpose. Examples thereof include 1 minute to 2 hours.

(攝影模組) 本實施形態之攝影模組具有上述硬化物。在此,使用第2圖來說明本實施形態之攝影模組。第2圖所示之攝影模組具有鏡筒10、殼體20、紅外線濾鏡30、基板40、影像感測器50、及微型鏡片55。鏡筒10為將數個鏡片11保持之構件。鏡筒10被固定於殼體20。殼體20的下端被固定於基板40的頂面。將通過鏡片11的光過濾之紅外線濾鏡30配置於殼體20。基板40透過凸塊51連接影像感測器50。基板40與影像感測器50之間設有使上述硬化性組成物硬化之硬化物60。 (Photography module) The photography module of this embodiment has the above-mentioned hardened object. Here, FIG. 2 is used to describe the photography module of this embodiment. The photography module shown in Figure 2 has a lens barrel 10, a housing 20, an infrared filter 30, a substrate 40, an image sensor 50, and a micro lens 55. The lens barrel 10 is a member that holds a plurality of lenses 11 . The lens barrel 10 is fixed to the housing 20 . The lower end of the housing 20 is fixed to the top surface of the base plate 40 . The infrared filter 30 that filters the light passing through the lens 11 is disposed on the housing 20 . The substrate 40 is connected to the image sensor 50 through the bumps 51 . A hardener 60 for hardening the above-mentioned hardenable composition is provided between the substrate 40 and the image sensor 50 .

製造攝影模組時,由基板40與影像感測器50之空隙供給硬化性樹脂組成物。之後,藉由加溫攝影模組來使硬化性樹脂組成物硬化。藉由硬化性樹脂組成物之硬化,基板40與影像感測器50之空隙被封閉。由於本發明之硬化性樹脂組成物可減少發生滲出,故可防止微型鏡片55及基板40上的焊墊(未繪示)之汙染。When manufacturing the photography module, the curable resin composition is supplied through the gap between the substrate 40 and the image sensor 50 . Thereafter, the curable resin composition is hardened by heating the photography module. By hardening of the curable resin composition, the gap between the substrate 40 and the image sensor 50 is closed. Since the curable resin composition of the present invention can reduce bleeding, it can prevent contamination of the micro lens 55 and the soldering pads (not shown) on the substrate 40 .

此外,硬化性樹脂組成物的供給方法不特別限制,可依照目的來適當地選擇,可舉例如噴射分配器(jet dispenser)、氣動分配器(air dispenser)等。又,供給硬化性樹脂時,為了降低硬化性樹脂組成物的黏度,可將硬化性樹脂組成物加溫。加溫時的溫度只要不會使硬化性樹脂組成物硬化,則不特別限制,可依照目的來適當地選擇,可舉例如40℃~60℃等。In addition, the supply method of the curable resin composition is not particularly limited and can be appropriately selected according to the purpose. Examples thereof include a jet dispenser, an air dispenser, and the like. In addition, when supplying the curable resin, the curable resin composition may be heated in order to reduce the viscosity of the curable resin composition. The temperature during heating is not particularly limited as long as the curable resin composition is not hardened, and can be appropriately selected depending on the purpose. Examples thereof include 40°C to 60°C.

(電子設備) 本實施形態之電子設備具有上述攝影模組,且進一步依照需要而具有其他構件。其他構件係不特別限制,可依照目的來適當地選擇。電子設備可舉例如可攜式終端裝置或家電製品等。 (Electronic equipment) The electronic device of this embodiment has the above-mentioned photography module, and further has other components as needed. Other components are not particularly limited and can be appropriately selected depending on the purpose. Examples of electronic equipment include portable terminal devices and home appliances.

實施例: (實施例1~14、比較例1~4) 對於第1~4表記載之成分配比,使用三根輥磨機混合並均一化,得到硬化性樹脂組成物。又,表中的數值若未特別記載,則表示質量份。 Example: (Examples 1 to 14, Comparative Examples 1 to 4) The component ratios described in Tables 1 to 4 were mixed and homogenized using a three-roller mill to obtain a curable resin composition. In addition, unless otherwise noted, the numerical values in the table represent parts by mass.

第1表 實施例 1 2 3 4 5 環氧樹脂 雙酚A型/雙酚F型 29.8 29.8 29.8 29.8 29.8 萘型 多官能型 潛伏性硬化劑 潛伏性硬化劑1 11.7 潛伏性硬化劑2 11.7 潛伏性硬化劑3 11.7 潛伏性硬化劑4 11.7 潛伏性硬化劑5 11.7 潛伏性硬化劑6 潛伏性硬化劑7 咪唑衍生物 咪唑衍生物1 1.7 1.7 1.7 1.7 1.7 咪唑衍生物2 咪唑衍生物3 咪唑衍生物4 咪唑衍生物5 咪唑衍生物6 咪唑衍生物7 咪唑衍生物8 填充劑 55.0 55.0 55.0 55.0 55.0 其他成分 搖變劑 1.8 1.8 1.8 1.8 1.8 合計 100.0 100.0 100.0 100.0 100.0 咪唑衍生物的熔點(℃) 69-74 69-74 69-74 69-74 69-74 評價結果 DSC峰值溫度(℃) 122.6 121.7 123.3 124.0 122.5 滲出距離(mm) 0.0 0.1 0.0 0.0 0.0 有無滲出 硬化性 Table 1 Example 1 2 3 4 5 Epoxy resin Bisphenol A/Bisphenol F 29.8 29.8 29.8 29.8 29.8 Naphthalene type - - - - - polyfunctional - - - - - latent hardener latent hardener 1 11.7 - - - - latent hardener 2 - 11.7 - - - latent hardener 3 - - 11.7 - - latent hardener 4 - - - 11.7 latent hardener 5 - - - - 11.7 Latent hardener 6 - - - - - Latent hardener 7 - - - - - Imidazole derivatives Imidazole derivatives 1 1.7 1.7 1.7 1.7 1.7 Imidazole derivative 2 - - - - - Imidazole derivative 3 - - - - - Imidazole derivatives 4 - - - - - Imidazole derivative 5 - - - - - Imidazole derivative 6 - - - - - Imidazole derivative 7 - - - - - Imidazole derivatives 8 - - - - - filler 55.0 55.0 55.0 55.0 55.0 other ingredients thixotropic agent 1.8 1.8 1.8 1.8 1.8 total 100.0 100.0 100.0 100.0 100.0 Melting point of imidazole derivatives (℃) 69-74 69-74 69-74 69-74 69-74 Evaluation results DSC peak temperature (℃) 122.6 121.7 123.3 124.0 122.5 Bleeding distance (mm) 0.0 0.1 0.0 0.0 0.0 Is there any leakage? Hardening

第2表 實施例 6 7 8 9 10 環氧樹脂 雙酚A型/雙酚F型 29.8 30.5 29.8 29.8 29.8 萘型 多官能型 潛伏性硬化劑 潛伏性硬化劑1 11.7 11.7 11.7 潛伏性硬化劑2 潛伏性硬化劑3 潛伏性硬化劑4 潛伏性硬化劑5 潛伏性硬化劑6 11.7 潛伏性硬化劑7 11.0 咪唑衍生物 咪唑衍生物1 1.7 1.7 咪唑衍生物2 1.7 咪唑衍生物3 1.7 咪唑衍生物4 1.7 咪唑衍生物5 咪唑衍生物6 咪唑衍生物7 咪唑衍生物8 填充劑 55.0 55.0 55.0 55.0 55.0 其他成分 搖變劑 1.8 1.8 1.8 1.8 1.8 合計 100.0 100.0 100.0 100.0 100.0 咪唑衍生物的熔點(℃) 69-74 69-74 86-91 137-147 174-184 評價結果 DSC峰值溫度(℃) 120.3 116.8 123.4 121.6 121.4 滲出距離(mm) 0.4 0.5 0.1 0.7 0.7 有無滲出 硬化性 Table 2 Example 6 7 8 9 10 Epoxy resin Bisphenol A/Bisphenol F 29.8 30.5 29.8 29.8 29.8 Naphthalene type - - - - - polyfunctional - - - - - latent hardener latent hardener 1 - - 11.7 11.7 11.7 latent hardener 2 - - - - - latent hardener 3 - - - - - latent hardener 4 - - - - latent hardener 5 - - - - - Latent hardener 6 11.7 - - - - Latent hardener 7 - 11.0 - - - Imidazole derivatives Imidazole derivatives 1 1.7 1.7 - - - Imidazole derivative 2 - - 1.7 - - Imidazole derivative 3 - - - 1.7 - Imidazole derivatives 4 - - - - 1.7 Imidazole derivative 5 - - - - - Imidazole derivative 6 - - - - - Imidazole derivative 7 - - - - - Imidazole derivatives 8 - - - - - filler 55.0 55.0 55.0 55.0 55.0 other ingredients thixotropic agent 1.8 1.8 1.8 1.8 1.8 total 100.0 100.0 100.0 100.0 100.0 Melting point of imidazole derivatives (℃) 69-74 69-74 86-91 137-147 174-184 Evaluation results DSC peak temperature (℃) 120.3 116.8 123.4 121.6 121.4 Bleeding distance (mm) 0.4 0.5 0.1 0.7 0.7 Is there any leakage? Hardening

第3表 實施例 11 12 13 14 環氧樹脂 雙酚A型/雙酚F型 29.8 23.0 25.1 70.2 萘型 6.8 多官能型 4.7 潛伏性硬化劑 潛伏性硬化劑1 11.7 11.7 11.7 26.0 潛伏性硬化劑2 潛伏性硬化劑3 潛伏性硬化劑4 潛伏性硬化劑5 潛伏性硬化劑6 潛伏性硬化劑7 咪唑衍生物 咪唑衍生物1 1.7 1.7 3.8 咪唑衍生物2 咪唑衍生物3 咪唑衍生物4 咪唑衍生物5 1.7 咪唑衍生物6 咪唑衍生物7 咪唑衍生物8 填充劑 55.0 55.0 55.0 其他成分 搖變劑 1.8 1.8 1.8 合計 100.0 100.0 100.0 100.0 咪唑衍生物的熔點(℃) 160.0 69-74 69-74 69-74 評價結果 DSC峰值溫度(℃) 121.5 120.1 121.4 119.9 滲出距離(mm) 0.6 0.0 0.0 0.0 有無滲出 硬化性 Table 3 Example 11 12 13 14 Epoxy resin Bisphenol A/Bisphenol F 29.8 23.0 25.1 70.2 Naphthalene type - 6.8 - - polyfunctional - - 4.7 - latent hardener latent hardener 1 11.7 11.7 11.7 26.0 latent hardener 2 - - - - latent hardener 3 - - - - latent hardener 4 - - - - latent hardener 5 - - - - Latent hardener 6 - - - - Latent hardener 7 - - - - Imidazole derivatives Imidazole derivatives 1 - 1.7 1.7 3.8 Imidazole derivative 2 - - - - Imidazole derivative 3 - - - - Imidazole derivatives 4 - - - - Imidazole derivative 5 1.7 - - - Imidazole derivative 6 - - - - Imidazole derivative 7 - - - - Imidazole derivatives 8 - - - - filler 55.0 55.0 55.0 - other ingredients thixotropic agent 1.8 1.8 1.8 - total 100.0 100.0 100.0 100.0 Melting point of imidazole derivatives (℃) 160.0 69-74 69-74 69-74 Evaluation results DSC peak temperature (℃) 121.5 120.1 121.4 119.9 Bleeding distance (mm) 0.6 0.0 0.0 0.0 Is there any leakage? Hardening

第4表 比較例 1 2 3 4 環氧樹脂 雙酚A型/雙酚F型 24.7 29.8 29.8 29.8 萘型 多官能型 潛伏性硬化劑 潛伏性硬化劑1 18.5 11.7 11.7 11.7 潛伏性硬化劑2 潛伏性硬化劑3 潛伏性硬化劑4 潛伏性硬化劑5 潛伏性硬化劑6 潛伏性硬化劑7 咪唑衍生物 咪唑衍生物1 咪唑衍生物2 咪唑衍生物3 咪唑衍生物4 咪唑衍生物5 咪唑衍生物6 1.7 咪唑衍生物7 1.7 咪唑衍生物8 1.7 填充劑 55.0 55.0 55.0 55.0 其他成分 搖變劑 1.8 1.8 1.8 1.8 合計 100.0 100.0 100.0 100.0 咪唑衍生物的熔點(℃) 248-258 184-188 251.0 評價結果 DSC峰值溫度(℃) 119.5 125.6 125.0 126.0 滲出距離(mm) 1.3 0.6 0.3 0.6 有無滲出 硬化性 Table 4 Comparative example 1 2 3 4 Epoxy resin Bisphenol A/Bisphenol F 24.7 29.8 29.8 29.8 Naphthalene type - - - - polyfunctional - - - - latent hardener latent hardener 1 18.5 11.7 11.7 11.7 latent hardener 2 - - - - latent hardener 3 - - - - latent hardener 4 - - - - latent hardener 5 - - - - Latent hardener 6 - - - - Latent hardener 7 - - - - Imidazole derivatives Imidazole derivatives 1 - - - - Imidazole derivative 2 - - - - Imidazole derivative 3 - - - - Imidazole derivatives 4 - - - - Imidazole derivative 5 - - - - Imidazole derivative 6 - 1.7 - - Imidazole derivative 7 - - 1.7 - Imidazole derivatives 8 - - - 1.7 filler 55.0 55.0 55.0 55.0 other ingredients thixotropic agent 1.8 1.8 1.8 1.8 total 100.0 100.0 100.0 100.0 Melting point of imidazole derivatives (℃) - 248-258 184-188 251.0 Evaluation results DSC peak temperature (℃) 119.5 125.6 125.0 126.0 Bleeding distance (mm) 1.3 0.6 0.3 0.6 Is there any leakage? Hardening

實施例及比較例中使用之環氧樹脂如下。 ‧雙酚A型/雙酚F型(EPICLON(登錄商標)EXA 835LV,DIC股份有限公司製) ‧萘型(EPICLON(登錄商標)HP 4032D,DIC股份有限公司製) ‧多官能型(jer(登錄商標)630D,三菱化學股份有限公司製) The epoxy resins used in Examples and Comparative Examples are as follows. ‧Bisphenol A type/Bisphenol F type (EPICLON (registered trademark) EXA 835LV, manufactured by DIC Co., Ltd.) ‧Naphthalene type (EPICLON (registered trademark) HP 4032D, manufactured by DIC Co., Ltd.) ‧Polyfunctional type (jer (registered trademark) 630D, manufactured by Mitsubishi Chemical Co., Ltd.)

實施例及比較例中使用之潛伏性硬化劑如下。 潛伏性硬化劑1~6分別包含約67質量%之環氧樹脂,潛伏性硬化劑7包含約50質量%之環氧樹脂。表中的潛伏性硬化劑之數值為包含環氧樹脂之總量。 ‧潛伏性硬化劑1(NOVACURE(登錄商標)HXA9322HP,旭化成股份有限公司製) ‧潛伏性硬化劑2(NOVACURE(登錄商標)HX3721,旭化成股份有限公司製) ‧潛伏性硬化劑3(NOVACURE(登錄商標)HX3088,旭化成股份有限公司製) ‧潛伏性硬化劑4(NOVACURE(登錄商標)HXA3932HP,旭化成股份有限公司製) ‧潛伏性硬化劑5(NOVACURE(登錄商標)HXA3922HP,旭化成股份有限公司製) ‧潛伏性硬化劑6(NOVACURE(登錄商標)HXA5945HP,旭化成股份有限公司製) ‧潛伏性硬化劑7(NOVACURE(登錄商標)HXA5911HP,旭化成股份有限公司製) The latent hardener used in the Examples and Comparative Examples is as follows. Latent hardeners 1 to 6 each contain approximately 67% by mass of epoxy resin, and latent hardener 7 contains approximately 50% by mass of epoxy resin. The value of latent hardener in the table is the total amount including epoxy resin. ‧Latent hardener 1 (NOVACURE (registered trademark) HXA9322HP, manufactured by Asahi Kasei Co., Ltd.) ‧Latent hardener 2 (NOVACURE (registered trademark) HX3721, manufactured by Asahi Kasei Co., Ltd.) ‧Latent hardener 3 (NOVACURE (registered trademark) HX3088, manufactured by Asahi Kasei Co., Ltd.) ‧Latent hardener 4 (NOVACURE (registered trademark) HXA3932HP, manufactured by Asahi Kasei Co., Ltd.) ‧Latent hardener 5 (NOVACURE (registered trademark) HXA3922HP, manufactured by Asahi Kasei Co., Ltd.) ‧Latent hardener 6 (NOVACURE (registered trademark) HXA5945HP, manufactured by Asahi Kasei Co., Ltd.) ‧Latent hardener 7 (NOVACURE (registered trademark) HXA5911HP, manufactured by Asahi Kasei Co., Ltd.)

實施例及比較例中使用之咪唑衍生物如下。 ‧咪唑衍生物1(2-十一基咪唑,CUREZOL C11Z,四國化成工業股份有限公司製) ‧咪唑衍生物2(2-十七基咪唑,CUREZOL C17Z,四國化成工業股份有限公司製) ‧咪唑衍生物3(2-苯基咪唑,CUREZOL 2PZ,四國化成工業股份有限公司製) ‧咪唑衍生物4(2-苯基-4-甲基-1H-咪唑,CUREZOL 2P4MZ,四國化成工業股份有限公司製) ‧咪唑衍生物5((1-[([1,1’-聯苯]-2-基)氧]-3-(2-甲基-1H-咪唑-1-基)丙-2-醇,OPPG-2MZ,依照國際公開2021/201060號手冊之化合物1的合成法所合成之物) ‧咪唑衍生物6(2,4-二胺基-6-(2’-甲基咪唑基)乙基-1,3,5-三嗪,CUREZOL 2MZA,四國化成工業股份有限公司製) ‧咪唑衍生物7(2,4-二胺基-6-[2’-十一基咪唑基-(1’)]-乙基-s-三嗪,CUREZOL C11Z-A,四國化成工業股份有限公司製) ‧咪唑衍生物8(2,4-二胺基-6-(2’-甲基咪唑基)乙基-1,3,5-三嗪,CUREZOL 2MZA-PW,四國化成工業股份有限公司製) The imidazole derivatives used in the Examples and Comparative Examples are as follows. ‧Imidazole derivative 1 (2-undecylimidazole, CUREZOL C11Z, manufactured by Shikoku Chemical Industry Co., Ltd.) ‧Imidazole derivative 2 (2-heptadecanyl imidazole, CUREZOL C17Z, manufactured by Shikoku Chemical Industry Co., Ltd.) ‧Imidazole derivative 3 (2-phenylimidazole, CUREZOL 2PZ, manufactured by Shikoku Chemical Industry Co., Ltd.) ‧Imidazole derivative 4 (2-phenyl-4-methyl-1H-imidazole, CUREZOL 2P4MZ, manufactured by Shikoku Chemical Industry Co., Ltd.) ‧Imidazole derivative 5((1-[([1,1'-biphenyl]-2-yl)oxy]-3-(2-methyl-1H-imidazol-1-yl)propan-2-ol, OPPG-2MZ, synthesized according to the synthesis method of Compound 1 in International Publication No. 2021/201060 manual) ‧Imidazole derivative 6 (2,4-diamino-6-(2’-methylimidazolyl)ethyl-1,3,5-triazine, CUREZOL 2MZA, manufactured by Shikoku Chemical Industry Co., Ltd.) ‧Imidazole derivative 7 (2,4-diamino-6-[2'-undecylimidazolyl-(1')]-ethyl-s-triazine, CUREZOL C11Z-A, Shikoku Chemical Industry Co., Ltd. limited company) ‧Imidazole derivative 8 (2,4-diamino-6-(2'-methylimidazolyl)ethyl-1,3,5-triazine, CUREZOL 2MZA-PW, manufactured by Shikoku Chemical Industry Co., Ltd. )

實施例及比較例中使用之填充劑及其他成分(搖變劑)如下。 ‧填充劑(二氧化矽,SO-E5,粒徑:1.3~1.7μm,Admatechs股份有限公司製) ‧搖變劑(二氧化矽奈米填充劑,AEROSIL(登錄商標)R805,粒徑:12nm,日本Aerosil股份有限公司製) 此外,填充劑及搖變劑的粒徑不同。填充劑的粒徑為數百nm~數十μm,相較於此,搖變劑的粒徑為數十nm左右。 The fillers and other components (thixotropic agent) used in the examples and comparative examples are as follows. ‧Filler (silica, SO-E5, particle size: 1.3~1.7μm, manufactured by Admatechs Co., Ltd.) ‧Thixotropic agent (silica nanofiller, AEROSIL (registered trademark) R805, particle size: 12nm, manufactured by Japan Aerosil Co., Ltd.) In addition, the particle sizes of fillers and thixotropic agents are different. The particle size of the filler is several hundred nm to several tens of μm, whereas the particle size of the thixotropic agent is about several tens of nm.

對於所得到之硬化性樹脂組成物,測定DSC峰值溫度及滲出距離,評價有無滲出及硬化性。測定結果及評價結果一併記錄於第1~4表。The DSC peak temperature and bleeding distance of the obtained curable resin composition were measured, and the presence or absence of bleeding and curability were evaluated. The measurement results and evaluation results are recorded together in Tables 1 to 4.

<滲出距離、有無滲出> 對陶瓷基板進行了氧電漿處理(300W、1分鐘)。在此經氧電漿處理之陶瓷基板上,將填充至針筒的各硬化性樹脂組成物擠出1mg來灌注,於60℃放置3小時。放置後,使用光學顯微鏡,測定硬化性樹脂組成物滲出的距離(滲出距離,即滲出長度)。又,基於下述評價基準來評價有無發生滲出(有無滲出)。 -評價基準- ◎:滲出距離為0mm~未滿0.1mm ○:滲出距離為0.1mm~未滿1mm ╳:滲出距離為1mm以上 <Distance of seepage, presence or absence of seepage> The ceramic substrate was subjected to oxygen plasma treatment (300W, 1 minute). On this oxygen plasma-treated ceramic substrate, 1 mg of each curable resin composition filled into the syringe was extruded and poured, and then left at 60° C. for 3 hours. After standing, an optical microscope was used to measure the distance in which the curable resin composition bleeds out (bleedout distance, that is, bleedout length). In addition, the presence or absence of bleeding (presence or absence of bleeding) was evaluated based on the following evaluation criteria. -Evaluation criteria- ◎: Bleeding distance is 0mm~less than 0.1mm ○: Bleeding distance is 0.1mm to less than 1mm ╳: Bleeding distance is 1mm or more

<DSC峰值溫度、硬化性(150℃短時間硬化)> 在鋁盤滴入5mg左右之各硬化性樹脂組成物。將此鋁盤設置於DSC(DSC 204 F1 Phoenix,BRUKER股份有限公司製),以10℃/min升溫,由25℃加熱至250℃,得到DSC圖表。由所得到之DSC圖表讀取DSC放熱峰值溫度。基於下述評價基準,將DSC放熱峰值溫度作為硬化性(於150℃之短時間硬化)來評價。又,若DSC放熱峰值溫度未滿125℃,則可於150℃以短時間硬化。 -評價基準- ○:DSC放熱峰值溫度未滿125℃ ╳:DSC放熱峰值溫度為125℃以上 <DSC peak temperature, hardenability (short time hardening at 150°C)> About 5 mg of each curable resin composition was dropped into an aluminum pan. This aluminum plate was set on a DSC (DSC 204 F1 Phoenix, manufactured by BRUKER Co., Ltd.), and the temperature was raised from 25°C to 250°C at 10°C/min to obtain a DSC chart. Read the DSC exothermic peak temperature from the obtained DSC chart. Based on the following evaluation criteria, the DSC exothermic peak temperature is evaluated as hardenability (short-time hardening at 150°C). In addition, if the DSC exothermic peak temperature is less than 125°C, it can be hardened at 150°C for a short time. -Evaluation criteria- ○: DSC heat release peak temperature is less than 125℃ ╳: DSC heat release peak temperature is above 125℃

如第1~4表所示,實施例之硬化性樹脂組成物係硬化性良好且有無發生滲出之評價為「○」以上。由此顯而易見地,任一實施例之硬化性樹脂組成物均硬化快,且可減少發生滲出。另一方面,不含咪唑衍生物之比較例1雖然硬化性良好,但發生滲出。又,含有熔點超過180℃之咪唑衍生物的比較例2~4,雖可減少發生滲出,但硬化耗費時間。由此顯而易見地,含有潛伏性硬化劑及熔點為180℃以下之咪唑衍生物兩者的硬化性樹脂組成物,係硬化快且可減少發生滲出。As shown in Tables 1 to 4, the curable resin compositions of the Examples had good curability and the evaluation of the occurrence of bleeding was "○" or above. From this, it is obvious that the curable resin composition of any embodiment hardens quickly and can reduce the occurrence of bleeding. On the other hand, Comparative Example 1, which did not contain an imidazole derivative, had good curability, but bleeding occurred. In addition, Comparative Examples 2 to 4 containing imidazole derivatives with a melting point exceeding 180°C can reduce bleeding, but hardening takes time. From this, it is obvious that a curable resin composition containing both a latent hardener and an imidazole derivative with a melting point of 180° C. or lower hardens quickly and can reduce the occurrence of bleeding.

以上已說明本發明之實施形態及實施例,但該等僅作為例示,未用於限定發明的範圍。實施形態係可以其他各種型態來實施,在不脫離本發明之要旨的範圍內,可進行各種省略、置換、變更。實施形態及其變更被包含於發明的範圍及要旨內,同樣地,被包含於申請專利範圍記載之發明及與其均等之範圍內。The embodiments and examples of the present invention have been described above. However, these are only examples and are not intended to limit the scope of the invention. The embodiment can be implemented in various other forms, and various omissions, substitutions, and changes can be made without departing from the gist of the present invention. The embodiments and their modifications are included in the scope and gist of the invention, and are also included in the scope of the invention described in the patent application and their equivalents.

10:鏡筒 11:鏡片 20:殼體 30:紅外線濾鏡 40:基板 50:影像感測器 51:凸塊 55:微型鏡片 60:硬化物 70:硬化性樹脂組成物 10: Lens barrel 11: Lenses 20: Shell 30:Infrared filter 40:Substrate 50:Image sensor 51: Bump 55:Micro lens 60:hardened material 70: Curable resin composition

[第1圖]  顯示本發明之一實施形態中攝影模組的製造步驟之一例示的概略圖。 [第2圖]  顯示本發明之一實施形態中攝影模組之一例示的概略截面圖。 [Fig. 1] A schematic diagram showing an example of the manufacturing steps of a photographic module according to an embodiment of the present invention. [Fig. 2] A schematic cross-sectional view showing an example of a photography module according to an embodiment of the present invention.

40:基板 40:Substrate

50:影像感測器 50:Image sensor

51:凸塊 51: Bump

55:微型鏡片 55:Micro lens

70:硬化性樹脂組成物 70: Curable resin composition

Claims (7)

一種硬化性樹脂組成物,含有環氧樹脂、潛伏性硬化劑及熔點為180℃以下之咪唑衍生物。A curable resin composition containing an epoxy resin, a latent hardener and an imidazole derivative with a melting point below 180°C. 如請求項1之硬化性樹脂組成物,其中,該咪唑衍生物的熔點為160℃以下。The curable resin composition of claim 1, wherein the imidazole derivative has a melting point of 160°C or lower. 如請求項1或2之硬化性樹脂組成物,其中,該咪唑衍生物的熔點為未滿100℃。The curable resin composition of claim 1 or 2, wherein the melting point of the imidazole derivative is less than 100°C. 一種接著劑,含有如請求項1或2之硬化性樹脂組成物。An adhesive containing the curable resin composition according to claim 1 or 2. 一種硬化物,係由如請求項1或2之硬化性樹脂組成物得到。A cured product obtained from the curable resin composition of claim 1 or 2. 一種攝影模組,具有如請求項5之硬化物。A photography module having a hardened object as claimed in claim 5. 一種電子設備,具有如請求項6之攝影模組。An electronic device having a photography module as claimed in claim 6.
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Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4546743B2 (en) * 2004-02-13 2010-09-15 昭和高分子株式会社 Drawing resin composition, fiber reinforced resin composition, molding method thereof and molded article
KR101106068B1 (en) * 2004-12-21 2012-01-18 에스케이케미칼주식회사 Epoxy resin encapsulant composition for preventing optical leakage
WO2008016122A1 (en) * 2006-08-04 2008-02-07 Mitsui Chemicals, Inc. Liquid crystal sealing material, process for production of liquid crystal display panels with the same, and liquid crystal display panels
JP5101860B2 (en) * 2006-10-26 2012-12-19 パナソニック株式会社 Epoxy resin composition and semiconductor device
JP5441447B2 (en) * 2009-03-06 2014-03-12 ソマール株式会社 Insulating paint for electronic parts and electronic parts using the same
JP2014028911A (en) * 2012-06-28 2014-02-13 Sekisui Chem Co Ltd Postcure tape and method for joining joint member
CN104540869B (en) * 2013-01-17 2016-12-28 积水化学工业株式会社 The manufacture method of electronic component-use solidification compound, connection structural bodies and connection structural bodies
JP6608147B2 (en) * 2015-02-23 2019-11-20 デクセリアルズ株式会社 Multilayer adhesive film and connection structure
WO2018043490A1 (en) * 2016-08-29 2018-03-08 三菱ケミカル株式会社 Thermosetting resin composition, prepreg, fiber-reinforced plastic molded body and method for producing same
CN108102589B (en) * 2017-11-27 2021-03-30 烟台德邦科技股份有限公司 Low-temperature cured low-modulus epoxy resin packaging conductive adhesive and preparation method thereof
JP7386719B2 (en) * 2020-01-21 2023-11-27 ソマール株式会社 Thermosetting powder coating, a coating formed using the coating, and a coated object equipped with the coating

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