TW202335320A - Pixel package, method for forming the same, and display device using the same - Google Patents
Pixel package, method for forming the same, and display device using the same Download PDFInfo
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- TW202335320A TW202335320A TW111105369A TW111105369A TW202335320A TW 202335320 A TW202335320 A TW 202335320A TW 111105369 A TW111105369 A TW 111105369A TW 111105369 A TW111105369 A TW 111105369A TW 202335320 A TW202335320 A TW 202335320A
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- light
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- emitting diode
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- wavelength conversion
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Abstract
Description
本揭露實施例是有關於一種像素封裝體、其形成方法及使用其的顯示裝置,且特別是有關於一種主動式微型發光二極體的像素封裝體、其形成方法及使用其的顯示裝置。Embodiments of the present disclosure relate to a pixel package, a method of forming the same, and a display device using the same, and in particular, to a pixel package of an active micro light-emitting diode, a method of forming the same, and a display device using the same.
為了提升發光二極體(light-emitting diode, LED)顯示螢幕的顯示表現,LED顯示螢幕主要是朝著小間距發展。LED顯示螢幕可透過例如板載晶片(chip on board, COB)技術或板載封裝(package on board, POB)技術實現。COB技術可例如將多顆紅色、綠色、藍色的發光二極體晶片黏貼在電路板或基板上;POB技術可將多個發光二極體晶片構成一個像素結構並形成一個像素封裝體,之後將這些像素封裝體安裝在電路板或基板上。In order to improve the display performance of light-emitting diode (LED) display screens, LED display screens are mainly developing towards small spacing. LED display screens can be implemented through, for example, chip on board (COB) technology or package on board (POB) technology. COB technology can, for example, stick multiple red, green, and blue light-emitting diode chips on a circuit board or substrate; POB technology can combine multiple light-emitting diode chips to form a pixel structure and form a pixel package. These pixel packages are mounted on a circuit board or substrate.
傳統的像素封裝體為被動式結構,無法獨立控制。此外,在特定的色彩均勻性要求下,紅色及綠色發光二極體晶片的製程良率較差。再者,傳統的像素封裝體不易彎折,且具有色點集中性較差、色點偏移性較大等缺點。The traditional pixel package has a passive structure and cannot be controlled independently. In addition, under specific color uniformity requirements, the process yield of red and green light-emitting diode wafers is poor. Furthermore, traditional pixel packages are not easy to bend, and have shortcomings such as poor color point concentration and large color point deviation.
本揭露的一些實施例提出一種主動式微型發光二極體的像素封裝體、其形成方法及使用其的顯示裝置。在本揭露實施例中,可各別/獨立地控制像素封裝體。此外,本揭露實施例的像素封裝體包含柔性(flexible)重佈線層(redistribution layer, RDL)與柔性複合疊層,可使像素封裝體整體易於彎折,且柔性複合疊層位於多個發光二極體之間可有效提高像素封裝體的發光效率並提升對比度。Some embodiments of the present disclosure provide an active micro-light emitting diode pixel package, a method of forming the same, and a display device using the same. In the embodiment of the present disclosure, the pixel packages can be controlled individually/independently. In addition, the pixel package of the embodiment of the present disclosure includes a flexible redistribution layer (RDL) and a flexible composite laminate, which can make the entire pixel package easy to bend, and the flexible composite laminate is located on multiple light-emitting diodes. The space between the pole bodies can effectively improve the luminous efficiency of the pixel package and improve the contrast.
在一些實施例中,本揭露實施例的像素封裝體透過波長轉換層將發光二極體晶片(例如,發出紫外光的發光二極體晶片)所發出的光轉換為特定波長的光。在特定的色彩均勻性要求下,本揭露實施例的像素封裝體相較於傳統的像素封裝體的製程良率更好,且具有色點集中性高、色點偏移性低等優勢。In some embodiments, the pixel package of the embodiments of the present disclosure converts the light emitted by the light-emitting diode chip (for example, the light-emitting diode chip that emits ultraviolet light) into light of a specific wavelength through the wavelength conversion layer. Under specific color uniformity requirements, the pixel package of the embodiment of the present disclosure has a better process yield than the traditional pixel package, and has the advantages of high color point concentration and low color point deviation.
本揭露實施例包含一種像素封裝體。像素封裝體包含柔性重佈線層及多個發光二極體晶片,發光二極體晶片以覆晶形式設置於該柔性重佈線層的表面上。像素封裝體也包含多個光調整層,光調整層分別位於發光二極體晶片上。像素封裝體更包含多個柔性複合疊層,柔性複合疊層設置於柔性重佈線層的表面上且設置於發光二極體晶片之間。Embodiments of the present disclosure include a pixel package. The pixel package includes a flexible redistribution layer and a plurality of light-emitting diode chips. The light-emitting diode chips are disposed on the surface of the flexible redistribution layer in a flip-chip manner. The pixel package also includes a plurality of light adjustment layers, and the light adjustment layers are respectively located on the light emitting diode chip. The pixel package further includes a plurality of flexible composite laminates. The flexible composite laminates are disposed on the surface of the flexible rewiring layer and between the light-emitting diode chips.
本揭露實施例包含一種像素封裝體的形成方法。像素封裝體的形成方法包含以下步驟:提供第一暫時基板;將多個覆晶式發光二極體晶片轉移至第一暫時基板上;將多個光調整層形成於發光二極體晶片上;將多個柔性複合疊層形成於第一暫時基板上,其中柔性複合疊層設置於發光二極體晶片之間;提供第二暫時基板,其中第二暫時基板黏合於光調整層與柔性複合疊層的頂面;將第一暫時基板從發光二極體晶片與柔性複合疊層的背側移除;在發光二極體晶片與柔性複合疊層的背側上形成柔性重佈線層;以及將第二暫時基板從光調整層與光調整層的頂面移除。Embodiments of the present disclosure include a method of forming a pixel package. The method of forming a pixel package includes the following steps: providing a first temporary substrate; transferring a plurality of flip-chip light-emitting diode wafers to the first temporary substrate; forming a plurality of light adjustment layers on the light-emitting diode wafer; A plurality of flexible composite laminates are formed on the first temporary substrate, wherein the flexible composite laminates are disposed between the light emitting diode wafers; a second temporary substrate is provided, wherein the second temporary substrate is bonded to the light adjustment layer and the flexible composite laminates. the top surface of the layer; removing the first temporary substrate from the backside of the light-emitting diode wafer and the flexible composite stack; forming a flexible redistribution layer on the backside of the light-emitting diode wafer and the flexible composite stack; and placing The second temporary substrate is removed from the light adjustment layer and the top surface of the light adjustment layer.
本揭露實施例包含一種顯示裝置。顯示裝置包含電路基板以及前述的像素封裝體,像素封裝體設置於電路基板上。Embodiments of the present disclosure include a display device. The display device includes a circuit substrate and the aforementioned pixel package, and the pixel package is disposed on the circuit substrate.
以下的揭露內容提供許多不同的實施例或範例以實施本案的不同特徵。以下的揭露內容敘述各個構件及其排列方式的特定範例,以簡化說明。當然,這些特定的範例並非用以限定。例如,若是本揭露實施例敘述了第一特徵部件形成於第二特徵部件之上或上方,即表示其可能包含上述第一特徵部件與上述第二特徵部件是直接接觸的實施例,亦可能包含了有附加特徵部件形成於上述第一特徵部件與上述第二特徵部件之間,而使上述第一特徵部件與第二特徵部件可能未直接接觸的實施例。The following disclosure provides many different embodiments or examples for implementing different features of the present invention. The following disclosure describes specific examples of each component and its arrangement to simplify the explanation. Of course, these specific examples are not limiting. For example, if the embodiment of the present disclosure describes that the first feature component is formed on or above the second feature component, it means that it may include an embodiment in which the first feature component and the second feature component are in direct contact, or may include There are embodiments in which additional features are formed between the first features and the second features such that the first features and the second features may not be in direct contact.
應理解的是,額外的操作步驟可實施於所述方法之前、之間或之後,且在所述方法的其他實施例中,部分的操作步驟可被取代或省略。It should be understood that additional operational steps may be performed before, during, or after the method, and that some of the operational steps may be replaced or omitted in other embodiments of the method.
此外,其中可能用到與空間相關用詞,例如「在… 之下」、「在… 的下方」、「下」、「在… 之上」、「在… 的上方」、「上」及類似的用詞,這些空間相關用詞係為了便於描述圖示中一個(些)元件或特徵部件與另一個(些)元件或特徵部件之間的關係,這些空間相關用詞包含使用中或操作中的裝置之不同方位,以及圖式中所描述的方位。當裝置被轉向不同方位時(例如,旋轉90度或其他方位),則其中所使用的空間相關形容詞也將依轉向後的方位來解釋。In addition, words related to space may be used, such as "under", "under", "under", "on", "above", "on" and similar These spatially related terms are used to facilitate the description of the relationship between one (some) element or feature component and another (some) element or feature component in the illustration. These spatially related terms include in use or operation. The different orientations of the device and the orientations described in the drawings. When the device is turned into a different orientation (for example, rotated 90 degrees or at any other orientation), the spatially relative adjectives used therein will also be interpreted in accordance with the rotated orientation.
在說明書中,「約」、「大約」、「實質上」之用語通常表示在一給定值或範圍的20%之內,或10%之內,或5%之內,或3%之內,或2%之內,或1%之內,或0.5%之內。在此給定的數量為大約的數量,亦即在沒有特定說明「約」、「大約」、「實質上」的情況下,仍可隱含「約」、「大約」、「實質上」之含義。In the specification, the terms "about", "approximately" and "substantially" usually mean within 20%, or within 10%, or within 5%, or within 3% of a given value or range. , or within 2%, or within 1%, or within 0.5%. The quantities given here are approximate quantities. That is to say, without specifically stating "about", "approximately" and "substantially", the terms "about", "approximately" and "substantially" can still be implied. meaning.
除非另外定義,在此使用的全部用語(包括技術及科學用語)具有與此篇揭露所屬之一般技藝者所通常理解的相同涵義。能理解的是,這些用語,例如在通常使用的字典中定義的用語,應被解讀成具有與相關技術及本揭露的背景或上下文一致的意思,而不應以一理想化或過度正式的方式解讀,除非在本揭露實施例有特別定義。Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this disclosure belongs. It is understood that these terms, such as those defined in commonly used dictionaries, should be interpreted to have meanings consistent with the relevant technology and the background or context of the present disclosure, and should not be interpreted in an idealized or overly formal manner. Interpretation, unless otherwise specifically defined in the embodiments of this disclosure.
以下所揭露之不同實施例可能重複使用相同的參考符號及/或標記。這些重複係為了簡化與清晰的目的,並非用以限定所討論的不同實施例及/或結構之間有特定的關係。Different embodiments disclosed below may reuse the same reference symbols and/or labels. These repetitions are for the purpose of simplicity and clarity and are not intended to limit specific relationships between the various embodiments and/or structures discussed.
第1圖是根據本揭露一些實施例繪示像素封裝體PP的部分上視圖。第2圖是根據本揭露一些實施例繪示像素封裝體PP的部分剖面圖。舉例來說,第2圖中的像素封裝體PP的結構可例如是沿著第1圖的線A-A’所切的剖面圖,但本揭露實施例並非以此為限。要特別注意的是,為了簡便起見,第1圖與第2圖已省略像素封裝體PP的一些部件。FIG. 1 is a partial top view of the pixel package PP according to some embodiments of the present disclosure. Figure 2 is a partial cross-sectional view of the pixel package PP according to some embodiments of the present disclosure. For example, the structure of the pixel package PP in Figure 2 may be a cross-sectional view taken along line A-A' in Figure 1, but the embodiment of the present disclosure is not limited thereto. It should be noted that for the sake of simplicity, some components of the pixel package PP have been omitted in Figures 1 and 2.
如第1圖與第2圖所示,在一些實施例中,像素封裝體PP包含柔性重佈線層109、多個發光二極體晶片(例如,第一發光二極體晶片111、第二發光二極體晶片112、第三發光二極體晶片113)、多個光調整層(例如,第一光調整層121、第二光調整層122與第三光調整層123)以及多個柔性複合疊層103。第一發光二極體晶片111、第二發光二極體晶片112、第三發光二極體晶片113以覆晶形式設置於柔性重佈線層109的表面上,第一光調整層121、第二光調整層122與第三光調整層123分別位於發光二極體晶片111、112與113上,柔性複合疊層103設置於柔性重佈線層109的表面上且設置於第一發光二極體晶片111、第二發光二極體晶片112與第三發光二極體晶片113之間。As shown in Figures 1 and 2, in some embodiments, the pixel package PP includes a
在一些實施例中,發光二極體晶片發出藍光(blue light)或紫外光(ultraviolet (UV) light)。舉例來說,第一發光二極體晶片111、第二發光二極體晶片112與第三發光二極體晶片113可分別發出第一光線、第二光線及第三光線,第一光線、第二光線與第三光線可為藍光或紫外光。如第2圖所示,第一發光二極體晶片111包含兩電極111a與111b,第二發光二極體晶片112包含兩電極112a與112b,第三發光二極體晶片113包含兩電極113a與113b。在一些實施例中,發光二極體晶片為微型發光二極體晶片(micro LED chip)。In some embodiments, the light-emitting diode chip emits blue light or ultraviolet (UV) light. For example, the first light-
在一些實施例中,柔性重佈線層109包含薄型絕緣層110及多個導電結構116,每個導電結構116由薄型絕緣層110的背側110B穿過薄型絕緣層110以與第一發光二極體晶片111、第二發光二極體晶片112與第三發光二極體晶片113中對應的電極電性連接。此外,在一些實施例中,薄型絕緣層110的厚度範圍為約10~50微米。In some embodiments, the
如第2圖所示,在一些實施例中,第一光調整層121、第二光調整層122與第三光調整層123分別對應位於第一發光二極體晶片111、第二發光二極體晶片112與第三發光二極體晶片113上。第一光調整層121包含第一光萃取層120a與第一色轉換複合層131,其中第一色轉換複合層131包含第一波長轉換層131a與第一濾光層131b。第二光調整層122包含第二光萃取層120b與第二色轉換複合層132,其中第二色轉換複合層132包含第二波長轉換層132a與第二濾光層132b。第三光調整層123包含第三光萃取層120c與透明取光層133。As shown in FIG. 2 , in some embodiments, the first
更詳細而言,第一光萃取層120a設置於第一發光二極體晶片111上,第一波長轉換層131a位於第一光萃取層120a上,而第一濾光層131b位於第一波長轉換層131a上;第二光萃取層120b設置於第二發光二極體晶片112上,第二波長轉換層132a位於第二光萃取層120b上,而第二濾光層132b位於第二波長轉換層132a上;第三光萃取層120c設置於第三發光二極體晶片113上,透明取光層133設置於第三光萃取層120c上。第一光萃取層120a、第二光萃取層120b與第三光萃取層120c可為透明層且可為相同的材料,而透明取光層133可包含與第三光萃取層120c相同或類似的材料。In more detail, the first
再者,第一光萃取層120a可包覆第一發光二極體晶片111的頂面,包覆第一發光二極體晶片111的頂面與四個側面,或包覆第一發光二極體晶片111的頂面與四個側面以及除了電極111a和111b以外的部分底面。第二光萃取層120b可包覆第二發光二極體晶片112的頂面,包覆第二發光二極體晶片112的頂面與四個側面,或包覆第二發光二極體晶片112的頂面與四個側面以及除了電極112a和112b以外的部分底面。第三光萃取層120c可包覆第三發光二極體晶片113的頂面,包覆第三發光二極體晶片113的頂面與四個側面,或包覆第三發光二極體晶片113的頂面與四個側面以及除了電極113a和113b以外的部分底面。Furthermore, the first
在一些實施例中,第一波長轉換層131a及第二波長轉換層132a各自包含螢光粉、量子點材料或其組合。舉例來說,第一波長轉換層131a可包含紅色螢光粉、紅色量子點材料或其組合,而第二波長轉換層132a可包含綠色螢光粉、綠色量子點材料或其組合,但本揭露實施例並非以此為限。因此,在一些實施例中,第一波長轉換層131a吸收部分第一發光二極體晶片111所發出的第一光線(藍光或紫外光)並轉換為紅光,而第二波長轉換層132a吸收部分第二發光二極體晶片112所發出的第二光線(藍光或紫外光)並轉換為綠光。第三發光二極體晶片113發出的第三光線可為藍光,且藍光經由透明取光層133出光。據此,像素封裝體PP可為RGB像素封裝體。In some embodiments, each of the first
在其他像素封裝體的實施例中,在對應第三發光二極體晶片113的第三光萃取層120c上,以第三色轉換複合層(未繪示)取代第2圖的透明取光層133。第三色轉換複合層包含第三波長轉換層(未繪示)與第三濾光層(未繪示),第三波長轉換層位於第三光萃取層120c上,第三濾光層位於第三波長轉換層上。類似地,第三波長轉換層包含螢光粉、量子點材料或其組合。舉例來說,第三波長轉換層可包含藍色螢光粉、藍色量子點材料或其組合,但本揭露實施例並非以此為限。第三波長轉換層吸收部分第三發光二極體晶片113所發出的第三光線(紫外光)並轉換為藍光。In other embodiments of the pixel package, a third color conversion composite layer (not shown) is used on the third
再者,第一濾光層131b與第二濾光層132b可例如將藍光、UV光或波長小於約450 nm的光濾除,使經由第一波長轉換層131a或第二波長轉換層132a轉換的光的顏色更接近其各自包含的螢光粉、量子點材料或其組合的顏色,但本揭露實施例並非以此為限。在一些其他的實施例中,也可不設置第一濾光層131b與第二濾光層132b。Furthermore, the
在一些實施例中,像素封裝體PP是一種主動式像素封裝體。如第1圖與第2圖所示,像素封裝體PP更包含控制晶片114,控制晶片114設置於柔性重佈線層109的表面上且被柔性複合疊層103的其中之一所覆蓋。控制晶片114可用於控制第一發光二極體晶片111、第二發光二極體晶片112及第三發光二極體晶片113。如第2圖所示,控制晶片114可具有兩電極114a和114b,但電極數量不以此為限,而電極114a和114b與柔性重佈線層109的導電結構116電性連接。In some embodiments, the pixel package PP is an active pixel package. As shown in FIGS. 1 and 2 , the pixel package PP further includes a
控制晶片114例如為可控制執行預定電子功能的控制晶片114(例如,二極體、電晶體、積體電路)或具光子功能的控制晶片114(例如,發光二極體、雷射二極體、光電二極體)。或者,控制晶片114亦可為以矽或絕緣體上半導體(semiconductor-on-insulator, SOI)晶圓為材料且用於邏輯或記憶應用微晶片,或以砷化鎵(GaAs)晶圓為材料且用於RF通信應用的微晶片,但本揭露實施例並非以此為限。The
為使像素封裝體PP的整體尺寸更小或更薄,在一些實施例中,控制晶片114是微型控制晶片。控制晶片114在像素封裝體PP中受柔性複合疊層103所覆蓋,其中柔性反射層104包覆控制晶片114,柔性遮光層106位於柔性反射層104上。在一些實施例中,柔性反射層104包覆控制晶片114的頂面,柔性反射層104包覆控制晶片114的頂面與四個側面,或柔性反射層104包覆控制晶片114的頂面、四個側面以及除了電極114a和114b以外的部分底面。In order to make the overall size of the pixel package PP smaller or thinner, in some embodiments, the
再者,如第1圖所示,第一發光二極體晶片111(在第1圖中僅繪示第一濾光層131b)、第二發光二極體晶片112(在第1圖中僅繪示第二濾光層132b)、第三發光二極體晶片113及控制晶片114可形成一個2×2陣列,但本揭露實施例並非以此為限。在一些其他的實施例中,第一發光二極體晶片111、第二發光二極體晶片112、第三發光二極體晶片113及控制晶片114沿著同一方向排列(即,可形成一個1×4陣列)。Furthermore, as shown in Figure 1, the first light-emitting diode chip 111 (only the
如第2圖所示,在一些實施例中,柔性複合疊層103包含柔性反射層104,柔性反射層104設置於柔性重佈線層109上,而柔性遮光層106設置於柔性反射層104上。柔性反射層104可用於反射光線以提升發光效率,而柔性遮光層106可用於增加對比度。柔性反射層104可為柔性白色反射層,具可撓性(flexible)。柔性遮光層106可為柔性黑色吸光層,具可撓性。柔性反射層104的頂面位置高於第一波長轉換層131a的頂面與第二波長轉換層132a的頂面,且柔性遮光層106的頂面106T、第一濾光層131b的頂面131bT及第二濾光層132b的頂面132bT彼此齊平。As shown in FIG. 2 , in some embodiments, the flexible
如第2圖所示,在一些實施例中,柔性反射層104圍繞第一濾光層131b及第二濾光層132b的至少三分之二的厚度,且所述厚度係由第一濾光層131b的底面或第二濾光層132b的底面起算。柔性遮光層106的厚度與第一濾光層131b的厚度或第二濾光層132b的厚度的比例小於或等於約1/3。由此可知,柔性反射層104包覆第一光萃取層120a、第二光萃取層120b和第三光萃取層120c的側面,包覆第一波長轉換層131a和第二波長轉換層132a的側面,以及包覆第一濾光層131b和第二濾光層132b的部分側面。As shown in Figure 2, in some embodiments, the flexible
柔性複合疊層103可有效提高像素封裝體PP的發光效率以及提升顏色對比度。以第一發光二極體晶片111的所在區域且第一波長轉換層131a為紅色波長轉換層為例作說明,第一發光二極體晶片111所發出的藍光或紫外光經由第一光萃取層120a出光後,側向的藍光或紫外光可被側面的柔性反射層104反射,例如被反射至紅色波長轉換層131a轉換成紅光。側向的藍光或紫外光若是被反射至第一濾光層131b則可被濾除。紅色波長轉換層131a吸收部分藍光或紫外光而轉換成紅光,側向的紅光可被側面的柔性反射層104反射。第一濾光層131b用以過濾當中未被轉換的藍光或紫外光,使紅光經由第一濾光層131b的頂面131bT出光,側向的紅光可被側面的柔性反射層104反射至第一濾光層131b被過濾後出光。The flexible
由此可知,本揭露的像素封裝體PP為一種柔性像素封裝體,透過柔性重佈線層109與柔性複合疊層103使像素封裝體PP整體達到易於彎折的效果。在一些實施例中,當發光二極體晶片(例如,第一發光二極體晶片111、第二發光二極體晶片112、第三發光二極體晶片113)為微型發光二極體晶片時,則更可實現小尺寸且易於彎折的像素封裝體PP。It can be seen from this that the pixel package PP of the present disclosure is a flexible pixel package, and the
第3圖至第5圖及第7圖至第15圖是根據本揭露一些實施例繪示形成像素封裝體PP的各階段的部分剖面圖。要特別注意的是,為了簡便起見,第3圖至第5圖及第7圖至第15圖已省略素封裝體PP的一些部件。Figures 3 to 5 and Figures 7 to 15 are partial cross-sectional views illustrating various stages of forming the pixel package PP according to some embodiments of the present disclosure. It should be particularly noted that for the sake of simplicity, some components of the plain package PP have been omitted from Figures 3 to 5 and Figures 7 to 15 .
參照第3圖,在一些實施例中,提供第一暫時基板100。舉例來說,第一暫時基板100例如為承載基板(carrier substrate),其可包含塑膠基板、玻璃基板、藍寶石基板或其他無線路的基板,但本揭露實施例並非以此為限。Referring to Figure 3, in some embodiments, a first
接著,在一些實施例中,將多個覆晶式(flip-chip)發光二極體晶片轉移至第一暫時基板100上。舉例來說,發光二極體晶片可以是微型發光二極體晶片,並透過巨量轉移(mass transfer)技術被轉移至第一暫時基板100上。巨量轉移技術可例如是使用一種拾取裝置,一次可拾取多個微型發光二極體晶片並將微型發光二極體晶片放置於第一暫時基板100上。在一些實施例中,拾取裝置包含具有黏性且圖案化的傳送頭(transfer head),用以拾取微型發光二極體晶片。拾取裝置例如包含具有多個凸起結構的聚二甲基矽氧烷(polydimethylsiloxane, PDMS)的傳送頭,透過傳送頭的凸起結構黏取微發光二極體晶片後,將微型發光二極體晶片轉移至第一暫時基板100上,但本揭露實施例並非以此為限。Next, in some embodiments, a plurality of flip-chip light emitting diode wafers are transferred to the first
在一些實施例中,覆晶式發光二極體晶片包含第一發光二極體晶片111、第二發光二極體晶片112及第三發光二極體晶片113,第一發光二極體晶片111、第二發光二極體晶片112及第三發光二極體晶片113分別發出第一光線、第二光線及第三光線。舉例來說,第一光線、第二光線、第三光線可為藍光或紫外光。在一些實施例中,第一發光二極體晶片111及第二發光二極體晶片112發出紫外光,而第三發光二極體晶片113發出藍光。在一些其他的實施例中,第一發光二極體晶片111、第二發光二極體晶片112與第三發光二極體晶片113皆發出藍光。此外,第一發光二極體晶片111、第二發光二極體晶片112及第三發光二極體晶片113例如是小尺寸的微型發光二極體晶片。In some embodiments, the flip-chip LED chip includes a
微型發光二極體晶片可包含N型半導體層、發光層與P型半導體層,發光層設置於N型半導體層與P型半導體層之間。微型發光二極體晶片所發出的光是由發光層所決定。舉例來說,第一發光二極體晶片111及第二發光二極體晶片112的發光層可發出紫外光,而第三發光二極體晶片113的發光層可發出藍光,但本揭露實施例並非以此為限。或者,第一發光二極體晶片111、第二發光二極體晶片112與第三發光二極體晶片113的發光層皆可發出藍光,但本揭露實施例並非以此為限。The micro light-emitting diode chip may include an N-type semiconductor layer, a light-emitting layer and a P-type semiconductor layer. The light-emitting layer is disposed between the N-type semiconductor layer and the P-type semiconductor layer. The light emitted by the micro-LED chip is determined by the light-emitting layer. For example, the light-emitting layers of the first light-emitting
N型半導體層可包含Ⅱ-Ⅵ族材料(例如,硒化鋅(ZnSe))或Ⅲ-Ⅴ族材料(例如,氮化鎵(GaN)、氮化鋁(AlN)、氮化銦(InN)、氮化銦鎵(InGaN)、氮化鋁鎵(AlGaN)或氮化鋁銦鎵(AlInGaN)),且N型半導體層可包含矽(Si)或鍺(Ge)等摻雜物,但本揭露實施例並非以此為限。The N-type semiconductor layer may include group II-VI materials (for example, zinc selenide (ZnSe)) or group III-V materials (for example, gallium nitride (GaN), aluminum nitride (AlN), indium nitride (InN) , indium gallium nitride (InGaN), aluminum gallium nitride (AlGaN) or aluminum indium gallium nitride (AlInGaN)), and the N-type semiconductor layer may contain dopants such as silicon (Si) or germanium (Ge), but this The disclosed embodiments are not limited thereto.
發光層可包含至少一無摻雜(undoped)半導體層或是至少一低摻雜層。舉例來說,發光層可為量子井(quantum well, QW)層,其可包含氮化銦鎵(indium gallium nitride, In xGa 1-xN)、氮化鎵(gallium nitride, GaN)、氮化鋁鎵(aluminum gallium nitride, AlGaN)或氮化鋁銦鎵(aluminum indium gallium nitride, AlInGaN),但本揭露實施例並非以此為限。或者,發光層也可為多重量子井(multiple quantum well, MQW)層。 The light-emitting layer may include at least one undoped semiconductor layer or at least one low-doped layer. For example, the light-emitting layer may be a quantum well (QW) layer, which may include indium gallium nitride (In x Ga 1-x N), gallium nitride (GaN), nitrogen Aluminum gallium nitride (AlGaN) or aluminum indium gallium nitride (AlInGaN), but the embodiments of the present disclosure are not limited thereto. Alternatively, the light-emitting layer may also be a multiple quantum well (MQW) layer.
P型半導體層可包含Ⅱ-Ⅵ族材料(例如,硒化鋅(ZnSe))或Ⅲ-Ⅴ族材料(例如,氮化鎵(GaN)、氮化鋁(AlN)、氮化銦(InN)、氮化銦鎵(InGaN)、氮化鋁鎵(AlGaN)或氮化鋁銦鎵(AlInGaN)),且P型半導體層可包含鎂(Mg)、碳(C)等摻雜物,但本揭露實施例並非以此為限。此外,N型半導體層與P型半導體層可為單層或多層結構。The P-type semiconductor layer may include group II-VI materials (for example, zinc selenide (ZnSe)) or group III-V materials (for example, gallium nitride (GaN), aluminum nitride (AlN), indium nitride (InN) , indium gallium nitride (InGaN), aluminum gallium nitride (AlGaN) or aluminum indium gallium nitride (AlInGaN)), and the P-type semiconductor layer may contain magnesium (Mg), carbon (C) and other dopants, but this The disclosed embodiments are not limited thereto. In addition, the N-type semiconductor layer and the P-type semiconductor layer may have a single-layer or multi-layer structure.
如第3圖所示,第一發光二極體晶片111具有兩電極111a和111b,其中一個作為正電極電性連接於第一發光二極體晶片111的P型半導體層,另一個作為負電極電性連接於第一發光二極體晶片111的N型半導體層。第二發光二極體晶片112具有兩電極112a和112b,其中一個作為正電極電性連接於第二發光二極體晶片112的P型半導體層,另一個作為負電極電性連接於第二發光二極體晶片112的N型半導體層。第三發光二極體晶片113具有兩電極113a和113b,其中一個作為正電極電性連接於第三發光二極體晶片113的P型半導體層,另一個作為負電極電性連接於第三發光二極體晶片113的N型半導體層。As shown in Figure 3, the first light-emitting
電極111a、電極111b、電極112a、電極112b、電極113a與電極113b包含導電材料,例如金屬、金屬矽化物、類似的材料或前述之組合,但本揭露實施例並非以此為限。舉例來說,金屬可包含金(Au)、鎳(Ni)、鉑(Pt)、鈀(Pd)、銥(Ir)、鈦(Ti)、鉻(Cr)、鎢(W)、鋁(Al)、銅(Cu)、類似的材料、前述之合金或前述之組合,但本揭露實施例並非以此為限。The
此外,如第3圖所示,脫離層(debonding layer)102可形成於第一暫時基板100上,並位於第一暫時基板100與第一發光二極體晶片111(、第二發光二極體晶片112或第三發光二極體晶片113)之間。脫離層102可包含磊晶材料(例如,氮化鎵GaN)或具有吸光基團的高分子聚合物。以高分子聚合物為例,在所對應的波長(例如,100 nm~400 nm)與能量下,可以使高分子聚合物中的吸光基團的鏈段光裂解成小分子片段而釋放出所黏著之元件,但本揭露實施例並非以此為限。In addition, as shown in FIG. 3 , a
參照第3圖,在一些實施例中,在將發光二極體晶片(例如,第一發光二極體晶片111、第二發光二極體晶片112或第三發光二極體晶片113)轉移至第一暫時基板100上時,也將多個控制晶片114轉移至第一暫時基板100上。如第3圖所示,控制晶片114可具有兩電極114a和114b,但本揭露實施例並非以此為限。類似地,可使用巨量轉移技術將控制晶片114轉移至第一暫時基板100上。Referring to FIG. 3 , in some embodiments, after the light-emitting diode wafer (eg, the first light-emitting
參照第4圖,在一些實施例中,將第一光萃取層120a、第二光萃取層120b及第三光萃取層120c分別形成於第一發光二極體晶片111、第二發光二極體晶片112及第三發光二極體晶片113上。舉例來說,第一光萃取層120a、第二光萃取層120b及第三光萃取層120c可包含透明層,其材料可包含矽膠、環氧樹脂(epoxy resin),但本揭露實施例並非以此為限。在一些實施例中,第一光萃取層120a、第二光萃取層120b及第三光萃取層120c分別順應性地形成於第一發光二極體晶片111、第二發光二極體晶片112及第三發光二極體晶片113的頂面及側面上。舉例來說,可藉由旋轉塗佈(spin-on coating)將第一光萃取層120a、第二光萃取層120b及第三光萃取層120c分別塗佈並包覆於第一發光二極體晶片111、第二發光二極體晶片112及第三發光二極體晶片113除了底面之外的(五個)面上,但本揭露實施例並非以此為限。Referring to Figure 4, in some embodiments, the first
參照第5圖,在一些實施例中,將第一色轉換複合層131轉移至對應於第一發光二極體晶片111的第一光萃取層120a上,並將第二色轉換複合層132轉移至對應於第二發光二極體晶片112的第二光萃取層120b上,其中第一色轉換複合層131包含第一波長轉換層131a與第一濾光層131b,而第二色轉換複合層132包含第二波長轉換層132a與第二濾光層132b。具體而言,第一波長轉換層131a在對應於第一發光二極體晶片111(例如可發出紫外光)的第一光萃取層120a上,且第一濾光層131b在第一波長轉換層131a上;第二波長轉換層132a在對應於第二發光二極體晶片112(例如可發出紫外光)的第二光萃取層120b上,且第二濾光層132b在第二波長轉換層132a上。Referring to Figure 5, in some embodiments, the first color conversion
第6A圖至第6E圖是根據本揭露一些實施例繪示形成第一色轉換複合層131並將其轉移的各階段的示意圖。為了更清楚表示這些步驟的特徵,第6A圖至第6C圖是以立體圖繪示,而第6D圖至第6E圖是以剖面圖繪示。要特別注意的是,為了簡便起見,第6A圖至第6E圖中可能省略一些部件。6A to 6E are schematic diagrams illustrating various stages of forming the first color conversion
參照第6A圖,在一些實施例中,將濾光層131b’形成於紅色量子點膜(red quantum dot (QD) film)131a’上。接著,參照第6B圖,將紅色量子點膜131a’與濾光層131b’進行測試分選,透過承載基板CS上的多個背光點B測收多個檔(Bin)。接著,參照第6B圖與第6C圖,依據多個背光點B,藉由例如雷射將紅色量子點膜131a’與濾光層131b’切割為多個第一色轉換複合層131。接著,參照第6D圖,透過轉移頭TH拾取多個第一色轉換複合層131。最後,參照第6E圖,將第一色轉換複合層131轉移至第一暫時基板100上,並對應於第一發光二極體晶片111的第一光萃取層120a上。Referring to Figure 6A, in some embodiments, a
第二色轉換複合層132可透過類似於第6A圖至第6E圖的方式轉移至第一暫時基板100上,並對應於第二發光二極體晶片112的第二光萃取層120b上,在此將不再重複。The second color conversion
如第5圖所示,在一些實施例中,在對應於第三發光二極體晶片113(可發出藍光)的第三光萃取層120c上形成透明取光層133。透明取光層133可包含與第三光萃取層120c(或第一光萃取層120a或第二光萃取層120b)相同或類似的材料,但本揭露實施例並非以此為限。在一些其他的實施例中,將由第三波長轉換層(未繪示)與第三濾光層(未繪示)所組成的第三色轉換複合層轉移至第三光萃取層120c上。第三波長轉換層在對應於第三發光二極體晶片113(可發出藍光、紫外光或其他色光)的第三光萃取層120c上,且第三濾光層在第三波長轉換層上。As shown in Figure 5, in some embodiments, a transparent
在本實施例中,第一光萃取層120a與第一色轉換複合層131(包含第一波長轉換層131a與第一濾光層131b)可視為第一光調整層121,第二光萃取層120b與第二色轉換複合層132(包含第二波長轉換層132a與第二濾光層132b)可視為第二光調整層122,而第三光萃取層120c與透明取光層133(或第三色轉換複合層)可視為第三光調整層123。In this embodiment, the first
亦即,如第5圖所示,在一些實施例中,將第一光調整層121、第二光調整層122及第三光調整層123分別形成於第一發光二極體晶片111、第二發光二極體晶片112及第三發光二極體晶片113上。第一光調整層121、第二光調整層122及第三光調整層123可用於調整第一發光二極體晶片111、第二發光二極體晶片112及第三發光二極體晶片113所發出的第一光線、第二光線及第三光線。That is, as shown in FIG. 5 , in some embodiments, the first
參照第7圖,在一些實施例中,提供半固化反射膜104’。在一些實施例中,半固化反射膜104’包含反射材料與半固化狀態(B-stage)膠材(例如,熱固性樹脂)。反射材料例如包含二氧化鈦(TiO 2)或氧化矽(SiO x),但本揭露實施例並非以此為限。舉例來說,半固化反射膜104’可為一種白色半固化狀態(B-stage)膠材。在此,B-stage膠材是一種二階段熱固性膠材,需要經二次烘烤才能完全固化。B-stage是指樹脂和固化劑發生反應,形成一種半固化的固體,當再經過加熱固化後可變為完全固化的狀態。 Referring to Figure 7, in some embodiments, a semi-cured reflective film 104' is provided. In some embodiments, the semi-cured reflective film 104' includes a reflective material and a semi-cured state (B-stage) adhesive (eg, thermosetting resin). The reflective material includes, for example, titanium dioxide (TiO 2 ) or silicon oxide (SiO x ), but the embodiments of the present disclosure are not limited thereto. For example, the semi-cured reflective film 104' may be a white semi-cured state (B-stage) glue material. Here, B-stage adhesive is a two-stage thermosetting adhesive that requires a second bake to be fully cured. B-stage refers to the reaction between the resin and the curing agent to form a semi-cured solid, which can become fully cured after being heated and cured.
參照第7圖與第8圖,在一些實施例中,將半固化反射膜104’下壓以直接接觸第一濾光層131b的頂面131bT、第二濾光層132b的頂面132bT、透明取光層133的頂面133T與控制晶片114的頂面114T,使半固化反射膜104’分流於第一暫時基板100上並包覆第一光萃取層120a的側面、第二光萃取層120b的側面、第三光萃取層120c的側面、第一波長轉換層131a的側面、第二波長轉換層132a的側面、第一濾光層131b的部分側面、第二濾光層131b的部分側面、透明取光層133的部分側面及控制晶片114的頂面與側面。Referring to Figures 7 and 8, in some embodiments, the semi-cured reflective film 104' is pressed down to directly contact the top surface 131bT of the
接著,如第8圖所示,在一些實施例中,將半固化反射膜104’固化(例如,再烘烤)以於發光二極體晶片之間形成柔性反射層104。具體而言,柔性反射層104可位於第一發光二極體晶片111與第二發光二極體晶片112之間、第二發光二極體晶片112與第三發光二極體晶片113之間,並且可包覆控制晶片114。Next, as shown in Figure 8, in some embodiments, the semi-cured reflective film 104' is cured (e.g., re-baked) to form a flexible
此外,如第8圖所示,在一些實施例中,柔性反射層104的頂面104T高於第一波長轉換層131a的頂面與第二波長轉換層131b的頂面但低於第一濾光層131b的頂面131bT與第二濾光層132b的頂面132bT。在一些實施例中,柔性反射層104圍繞第一濾光層131b及第二濾光層132b的至少三分之二的厚度,前述厚度係由第一濾光層131b的底面或第二濾光層132b的底面起算。舉例來說,柔性反射層104的厚度H104為約44~87微米,但本揭露實施例並非以此為限。In addition, as shown in FIG. 8 , in some embodiments, the
參照第9圖,在一些實施例中,提供半固化吸光膜106’。在一些實施例中,半固化吸光膜106’包含吸光材料與半固化狀態(B-stage)膠材(例如,熱固性樹脂)。吸光材料例如包含黑色碳粉,但本揭露實施例並非以此為限。舉例來說,半固化吸光膜106’可為一種黑色半固化狀態(B-stage)膠材。B-stage膠材的範例如前所述,在此不再重複。Referring to Figure 9, in some embodiments, a semi-cured light-absorbing film 106' is provided. In some embodiments, the semi-cured light-absorbing film 106' includes a light-absorbing material and a semi-cured state (B-stage) glue material (for example, thermosetting resin). The light-absorbing material includes, for example, black carbon powder, but the embodiment of the present disclosure is not limited thereto. For example, the semi-cured light-absorbing film 106' can be a black semi-cured state (B-stage) glue material. The example of B-stage adhesive material is as mentioned above and will not be repeated here.
參照第9圖與第10圖,在一些實施例中,將半固化吸光膜106’下壓以直接接觸第一濾光層131b、第二濾光層132b、透明取光層133,使半固化吸光膜106’分流至柔性反射層104的頂面104T上並包覆第一濾光層131b、第二濾光層132b與透明取光層133剩下裸露的側面。Referring to Figures 9 and 10, in some embodiments, the semi-cured light-absorbing film 106' is pressed down to directly contact the
接著,如第10圖所示,在一些實施例中,將半固化吸光膜106’固化以於柔性反射層104上形成柔性遮光層106。具體而言,柔性遮光層106可位於第一濾光層131b與第二濾光層132b之間、第二濾光層132b與透明取光層133之間,並且可位於控制晶片114的上方。Next, as shown in Figure 10, in some embodiments, the semi-cured light-absorbing film 106' is cured to form a flexible light-
此外,如第10圖所示,在一些實施例中,柔性遮光層106的頂面106T、第一濾光層131b的頂面131bT及第二濾光層132b的頂面132bT彼此實質上齊平。在一些實施例中,柔性遮光層106的厚度與第一濾光層131b的厚度或第二濾光層132b的厚度的比例小於或等於約1/3。舉例來說,柔性遮光層106的厚度H106為約3~6微米,但本揭露實施例並非以此為限。In addition, as shown in Figure 10, in some embodiments, the
在此,柔性反射層104與柔性遮光層106可視為柔性複合疊層103。亦即,如第7圖至第10圖所示,在一些實施例中,將多個柔性複合疊層103形成於第一暫時基板100上,且柔性複合疊層103設置於第一發光二極體晶片111與第二發光二極體晶片112之間、第二發光二極體晶片112與第三發光二極體晶片113之間。此外,在一些實施例中,控制晶片114受一些柔性複合疊層103所覆蓋。Here, the flexible
參照第11圖,在一些實施例中,提供第二暫時基板108,且第二暫時基板108黏合於第一光調整層121、第二光調整層122、第三光調整層123及柔性複合疊層103的頂面。第二暫時基板108可具有與第一暫時基板100相同或類似的材料,但本揭露實施例並非以此為限。此外,如第11圖所示,脫離層120可形成於第二暫時基板108與第一光調整層121(、第二光調整層122、第三光調整層123或柔性複合疊層103)之間。Referring to Figure 11, in some embodiments, a second
接著,如第11圖所示,在一些實施例中,將第一暫時基板100從第一發光二極體晶片111、第二發光二極體晶片112、第三發光二極體晶片113(、控制晶片114)與柔性複合疊層103的背側移除。舉例來說,可透過將脫離層102照射特定波長的光,使第一暫時基板100脫離,但本揭露實施例並非以此為限。Next, as shown in FIG. 11 , in some embodiments, the first
參照第12圖,在一些實施例中,在第一發光二極體晶片111、第二發光二極體晶片112、第三發光二極體晶片113(、控制晶片114)與柔性複合疊層103的背側上形成薄型絕緣層110。舉例來說,薄型絕緣層110可包含絕緣材料,例如氧化矽之氧化物、例如氮化矽之氮化物、類似的材料或前述之組合,但本揭露實施例並非以此為限。絕緣材料可透過例如金屬有機化學氣相沉積、原子層沉積、分子束磊晶、液相磊晶、類似的製程或前述之組合而沉積第一發光二極體晶片111、第二發光二極體晶片112、第三發光二極體晶片113(、控制晶片114)與柔性複合疊層103的背側上,以形成薄型絕緣層110,但本揭露實施例並非以此為限。Referring to Figure 12, in some embodiments, the first light-emitting
參照第13圖,在一些實施例中,將薄型絕緣層110圖案化,以暴露第一發光二極體晶片111的電極111a、111b的至少一部分、第二發光二極體晶片112的電極112a、112b的至少一部分、第三發光二極體晶片113的電極113a、113b的至少一部分及控制晶片114的電極114a、114b的至少一部分。在一些實施例中,薄型絕緣層110的厚度範圍為約10~50微米。Referring to Figure 13, in some embodiments, the thin insulating
舉例來說,可在薄型絕緣層110上設置遮罩層HM,接著使用遮罩層HM作為蝕刻遮罩進行蝕刻製程,以將薄型絕緣層110蝕刻出多個溝槽。遮罩層HM可包含光阻,例如負型光阻(negative photoresist)(在其他範例中也可為正型光阻(positive photoresist))。此外,遮罩層HM可包含硬遮罩,且可由氧化矽(SiO
2)、氮化矽(SiN)、氮氧化矽(SiON)、碳化矽(SiC)、氮碳化矽(SiCN)、類似的材料或前述之組合形成。遮罩層HM可以是單層或多層結構。
For example, a mask layer HM can be disposed on the thin insulating
參照第14圖,在一些實施例中,在圖案化的薄型絕緣層110的多個溝槽中形成多個導電結構116。如第14圖所示,在一些實施例中,每個導電結構16由薄型絕緣層110的背側110B穿過薄型絕緣層110並與對應的第一發光二極體晶片111、第二發光二極體晶片112、第三發光二極體晶片113或控制晶片114中對應的電極電性連接。Referring to FIG. 14 , in some embodiments, a plurality of
舉例來說,導電結構16可由薄型絕緣層110的背側110B穿過薄型絕緣層110並與第一發光二極體晶片111的電極111a、111b電性連接,與第二發光二極體晶片112的電極112a、112b電性連接,與第三發光二極體晶片113的電極113a、113b電性連接,與控制晶片114的電極114a、114b電性連接,但本揭露實施例並非以此為限。導電結構116可包含金屬,金屬的範例如前所述,在此將不再重複,但本揭露實施例並非以此為限。For example, the conductive structure 16 can pass through the thin insulating
在此,薄型絕緣層110與導電結構116可視為柔性重佈線層109。亦即,如第12圖至第14圖所示,在一些實施例中,在第一發光二極體晶片111、第二發光二極體晶片112、第三發光二極體晶片113(、控制晶片114)與柔性複合疊層103的背側上形成柔性重佈線層109。Here, the thin insulating
參照第14圖與第15圖,將第二暫時基板108從第一光調整層121、第二光調整層122、第三光調整層123及柔性複合疊層103的頂面移除。接著,將第一發光二極體晶片111、第二發光二極體晶片112、第三發光二極體晶片113、控制晶片114、柔性複合疊層103及柔性重佈線層109轉移至切割基板118上。切割基板118可與第一暫時基板100或第二暫時基板108相同或類似,在此將不再重複,但本揭露實施例並非以此為限。Referring to FIGS. 14 and 15 , the second
如第15圖所示,將第一發光二極體晶片111、第二發光二極體晶片112、第三發光二極體晶片113、控制晶片114、柔性複合疊層103及柔性重佈線層109切割為多個像素封裝體PP。在一些實施例中,像素封裝體PP為一種可彎曲的像素封裝體。如第15圖所示,在一些實施例中,柔性反射層104設置於柔性重佈線層109上,而柔性遮光層106設置於柔性反射層104上。As shown in Figure 15, the first light-emitting
第16圖是根據本揭露一些實施例繪示使用像素封裝體PP的顯示裝置1的部分上視圖。參照第16圖,在形成多個像素封裝體PP(例如在完成第15圖的切割步驟)後,將多個像素封裝體PP巨量轉移至電路基板10上。FIG. 16 is a partial top view of a
舉例來說,電路基板10可為剛性線路基板,其可包含元素半導體(例如,矽或鍺)、化合物半導體(例如,碳化矽(SiC)、砷化鎵(GaAs)、砷化銦(InAs)或磷化銦(InP))、合金半導體(例如,SiGe、SiGeC、GaAsP或GaInP)、其他適當之半導體或前述之組合。電路基板10也可為柔性線路基板(flexible circuit substrate)、絕緣層上半導體基板(semiconductor-on-insulator (SOI) substrate)、或玻璃基板等。此外,電路基板10可包含各種導電部件(例如,導線(conductive line)或導孔(via))(未繪示)。舉例來說,前述導電部件可包含鋁(Al)、銅(Cu)、鎢(W)、其各自之合金、其他適當之導電材料或前述之組合。For example, the
第17圖是根據本揭露一些實施例繪示當電路基板10為柔性線路基板時,顯示裝置1的部分剖面圖。在一些實施例中,由於柔性重佈線層很薄(例如,厚度為約10~50微米),柔性複合疊層為彈性材料,且第一發光二極體晶片111、第二發光二極體晶片112、第三發光二極體晶片113與控制晶片114都很小(例如,厚度為約6~15微米的微型晶片),使得像素封裝體PP的整體厚度可小於或等於約100微米。因此,像素封裝體PP可視為柔性像素封裝體,其利於應用在柔性的顯示裝置,例如穿戴式顯示裝置。FIG. 17 is a partial cross-sectional view of the
承上述說明,本揭露實施例的像素封裝體可為一種主動式微型發光二極體的像素封裝體,可其各別/獨立地被控制。此外,本揭露實施例的像素封裝體包含柔性複合疊層,可有效提高像素封裝體的發光效率並提升對比度。在一些實施例中,本揭露實施例的像素封裝體透過波長轉換層將發光二極體晶片(例如,發出紫外光的發光二極體晶片)所發出的光轉換為特定波長的光,在特定的色彩均勻性要求下,相較於傳統的像素封裝體的製程良率較佳,且具有色點集中性高、色點偏移性低等優勢。Based on the above description, the pixel package of the embodiment of the present disclosure may be an active micro light-emitting diode pixel package, which may be controlled individually/independently. In addition, the pixel package of the embodiment of the present disclosure includes a flexible composite laminate, which can effectively improve the luminous efficiency of the pixel package and enhance the contrast ratio. In some embodiments, the pixel package of the present disclosure converts the light emitted by the light-emitting diode chip (for example, the light-emitting diode chip that emits ultraviolet light) into light of a specific wavelength through the wavelength conversion layer. Under the requirements of color uniformity, compared with traditional pixel packages, the process yield is better, and it has the advantages of high color point concentration and low color point deviation.
以上概述數個實施例的部件,以便在本揭露所屬技術領域中具有通常知識者可以更理解本揭露實施例的觀點。在本揭露所屬技術領域中具有通常知識者應該理解,他們能以本揭露實施例為基礎,設計或修改其他製程和結構以達到與在此介紹的實施例相同之目的及/或優勢。在本揭露所屬技術領域中具有通常知識者也應該理解到,此類等效的結構並無悖離本揭露的精神與範圍,且他們能在不違背本揭露之精神和範圍之下,做各式各樣的改變、取代和替換。因此,本揭露之保護範圍當視後附之申請專利範圍所界定者為準。另外,雖然本揭露已以數個較佳實施例揭露如上,然其並非用以限定本揭露。The components of several embodiments are summarized above so that those with ordinary skill in the technical field to which the present disclosure belongs can better understand the concepts of the embodiments of the present disclosure. Those with ordinary skill in the art to which this disclosure belongs should understand that they can design or modify other processes and structures based on the embodiments of this disclosure to achieve the same purposes and/or advantages as the embodiments introduced here. Those with ordinary knowledge in the technical field to which this disclosure belongs should also understand that such equivalent structures do not deviate from the spirit and scope of this disclosure, and they can do various things without departing from the spirit and scope of this disclosure. Various changes, substitutions and substitutions. Therefore, the protection scope of the present disclosure shall be subject to the scope of the appended patent application. In addition, although the disclosure has been disclosed with several preferred embodiments as above, this is not intended to limit the disclosure.
整份說明書對特徵、優點或類似語言的引用,並非意味可以利用本揭露實現的所有特徵和優點應該或者可以在本揭露的任何單個實施例中實現。相對地,涉及特徵和優點的語言被理解為其意味著結合實施例描述的特定特徵、優點或特性包括在本揭露的至少一個實施例中。因而,在整份說明書中對特徵和優點以及類似語言的討論可以但不一定代表相同的實施例。Reference throughout this specification to features, advantages, or similar language does not imply that all features and advantages that may be realized with the present disclosure should or can be realized in any single embodiment of the present disclosure. In contrast, language referring to features and advantages is to be understood to mean that a particular feature, advantage, or characteristic described in connection with the embodiment is included in at least one embodiment of the present disclosure. Thus, discussions of features and advantages, and similar language, throughout this specification may, but are not necessarily, representative of the same embodiments.
再者,在一個或多個實施例中,可以任何合適的方式組合本揭露的所描述的特徵、優點和特性。根據本文的描述,相關領域的技術人員將意識到,可在沒有特定實施例的一個或多個特定特徵或優點的情況下實現本揭露。在其他情況下,在某些實施例中可辨識附加的特徵和優點,這些特徵和優點可能不存在於本揭露的所有實施例中。Furthermore, the described features, advantages, and characteristics of the disclosure may be combined in any suitable manner in one or more embodiments. From the description herein, those skilled in the relevant art will appreciate that the present disclosure may be practiced without one or more of the specific features or advantages of a particular embodiment. In other instances, additional features and advantages may be identified in certain embodiments that may not be present in all embodiments of the present disclosure.
1:顯示裝置 10:電路基板 100:第一暫時基板 102:脫離層 103:柔性複合疊層 104:柔性反射層 104’:半固化反射膜 106:柔性遮光層 106’:半固化吸光膜 106T:柔性遮光層的頂面 108:第二暫時基板 109:柔性重佈線層 110:薄型絕緣層 110B:薄型絕緣層的背側 111:第一發光二極體晶片 111a,111b:電極 112:第二發光二極體晶片 112a,112b:電極 113:第三發光二極體晶片 113a,113b:電極 114:控制晶片 114a,114b:電極 114T:控制晶片的頂面 116:導電結構 118:切割基板 120a:第一光萃取層 120b:第二光萃取層 120c:第三光萃取層 121:第一光調整層 122:第二光調整層 123:第三光調整層 131:第一色轉換複合層 131a:第一波長轉換層 131a’:紅色量子點膜 131b:第一濾光層 131b’:濾光層 131bT:第一濾光層的頂面 132:第二色轉換複合層 132a:第二波長轉換層 132b:第二濾光層 132bT:第二濾光層的頂面 133:透明取光層 133T:透明取光層的頂面 A-A’:線 B:背光點 CS:承載基板 H104:柔性反射層的厚度 H106:柔性遮光層的厚度 HM:遮罩層 PP:像素封裝體 TH:轉移頭 1:Display device 10:Circuit substrate 100: First temporary substrate 102: Detachment layer 103:Flexible composite laminate 104:Flexible reflective layer 104’: semi-cured reflective film 106: Flexible light shielding layer 106’: Semi-cured light-absorbing film 106T: Top surface of flexible light shielding layer 108: Second temporary substrate 109:Flexible rewiring layer 110:Thin insulation layer 110B: Back side of thin insulation layer 111: The first light-emitting diode chip 111a,111b:Electrode 112: The second light-emitting diode chip 112a,112b:Electrode 113: The third light-emitting diode chip 113a,113b:Electrode 114:Control chip 114a,114b:Electrode 114T: Control the top surface of the chip 116:Conductive structure 118: Cutting the substrate 120a: First light extraction layer 120b: Second light extraction layer 120c: The third light extraction layer 121: First light adjustment layer 122: Second light adjustment layer 123: The third light adjustment layer 131: First color conversion composite layer 131a: First wavelength conversion layer 131a’: red quantum dot film 131b: First filter layer 131b’: filter layer 131bT: Top surface of the first filter layer 132: Second color conversion composite layer 132a: Second wavelength conversion layer 132b: Second filter layer 132bT: Top surface of the second filter layer 133:Transparent light-taking layer 133T: The top surface of the transparent light-taking layer A-A’: line B: backlight point CS: Carrier substrate H104: Thickness of flexible reflective layer H106: Thickness of flexible light-shielding layer HM: mask layer PP: pixel package TH: transfer head
以下將配合所附圖式詳述本揭露實施例。應注意的是,各種特徵部件並未按照比例繪製且僅用以說明例示。事實上,元件的尺寸可能經放大或縮小,以清楚地表現出本揭露實施例的技術特徵。 第1圖是根據本揭露一些實施例繪示像素封裝體的部分上視圖。 第2圖是根據本揭露一些實施例繪示像素封裝體的部分剖面圖。 第3圖至第5圖是根據本揭露一些實施例繪示形成像素封裝體的各階段的部分剖面圖。 第6A圖至第6E圖是根據本揭露一些實施例繪示形成第一色轉換複合層並將其轉移的各階段的示意圖。 第7圖至第15圖是根據本揭露一些實施例繪示形成像素封裝體的各階段的部分剖面圖。 第16圖是根據本揭露一些實施例繪示使用像素封裝體的顯示裝置的部分上視圖。 第17圖是根據本揭露一些實施例繪示當電路基板為柔性線路基板時,顯示裝置的部分剖面圖。 The embodiments of the disclosure will be described in detail below with reference to the accompanying drawings. It should be noted that various features are not drawn to scale and are for illustrative purposes only. In fact, the dimensions of the components may be enlarged or reduced to clearly demonstrate the technical features of the embodiments of the present disclosure. Figure 1 is a partial top view of a pixel package according to some embodiments of the present disclosure. Figure 2 is a partial cross-sectional view of a pixel package according to some embodiments of the present disclosure. Figures 3 to 5 are partial cross-sectional views illustrating various stages of forming a pixel package according to some embodiments of the present disclosure. Figures 6A to 6E are schematic diagrams illustrating various stages of forming and transferring a first color conversion composite layer according to some embodiments of the present disclosure. 7 to 15 are partial cross-sectional views illustrating various stages of forming a pixel package according to some embodiments of the present disclosure. FIG. 16 is a partial top view of a display device using a pixel package according to some embodiments of the present disclosure. FIG. 17 is a partial cross-sectional view of a display device when the circuit substrate is a flexible circuit substrate according to some embodiments of the present disclosure.
103:柔性複合疊層 103:Flexible composite laminate
104:柔性反射層 104:Flexible reflective layer
106:柔性遮光層 106: Flexible light shielding layer
106T:柔性遮光層的頂面 106T: Top surface of flexible light shielding layer
109:柔性重佈線層 109:Flexible rewiring layer
110:薄型絕緣層 110:Thin insulation layer
110B:薄型絕緣層的背側 110B: Back side of thin insulation layer
111:第一發光二極體晶片 111: The first light-emitting diode chip
111a,111b:電極 111a,111b:Electrode
112:第二發光二極體晶片 112: The second light-emitting diode chip
112a,112b:電極 112a,112b:Electrode
113:第三發光二極體晶片 113: The third light-emitting diode chip
113a,113b:電極 113a,113b:Electrode
114:控制晶片 114:Control chip
114a,114b:電極 114a,114b:Electrode
116:導電結構 116:Conductive structure
120a:第一光萃取層 120a: First light extraction layer
120b:第二光萃取層 120b: Second light extraction layer
120c:第三光萃取層 120c: The third light extraction layer
121:第一光調整層 121: First light adjustment layer
122:第二光調整層 122: Second light adjustment layer
123:第三光調整層 123: The third light adjustment layer
131:第一色轉換複合層 131: First color conversion composite layer
131a:第一波長轉換層 131a: First wavelength conversion layer
131b:第一濾光層 131b: First filter layer
131bT:第一濾光層的頂面 131bT: Top surface of the first filter layer
132:第二色轉換複合層 132: Second color conversion composite layer
132a:第二波長轉換層 132a: Second wavelength conversion layer
132b:第二濾光層 132b: Second filter layer
132bT:第二濾光層的頂面 132bT: Top surface of the second filter layer
133:透明取光層 133:Transparent light-taking layer
PP:像素封裝體 PP: pixel package
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