TW202333341A - Semiconductor device without secondary soldering capable of easily selecting materials or processing conditions - Google Patents

Semiconductor device without secondary soldering capable of easily selecting materials or processing conditions Download PDF

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TW202333341A
TW202333341A TW111145184A TW111145184A TW202333341A TW 202333341 A TW202333341 A TW 202333341A TW 111145184 A TW111145184 A TW 111145184A TW 111145184 A TW111145184 A TW 111145184A TW 202333341 A TW202333341 A TW 202333341A
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conductor
semiconductor device
soldering
secondary soldering
built
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TW111145184A
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恩田智弘
新屋翔太郎
山下諒大
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日商日立功率半導體股份有限公司
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Abstract

The object of the present invention is to provide a semiconductor device without secondary soldering, which may realize a structure without secondary soldering for easily selecting materials or processing conditions. The semiconductor device of the present invention comprises: a first conductor 16A; a second conductor 16B; a power semiconductor chip 7 disposed between the first conductor and the second conductor, wherein a first electrode is electrically connected to the first conductor and a second electrode is electrically connected to the second conductor; and, a third conductor 2 for fixing the aforementioned first conductor. The aforementioned power semiconductor chip is bonded to at least one of the aforementioned first conductor or the aforementioned second conductor by soldering 8. The aforementioned first conductor and the aforementioned third conductor may be electrically and mechanically connected through a concave-convex engaging structure without soldering.

Description

無二次焊接半導體裝置Semiconductor device without secondary soldering

本發明係關於一種實現除去二次焊接之無二次焊接半導體裝置。The present invention relates to a secondary soldering-free semiconductor device that eliminates secondary soldering.

例如,於組裝使用於交流發電機之整流元件時,首先作為一次成形體,使用功率半導體晶片或控制IC(Integrated Circuit:積體電路)或電容器或導電性接著劑或一次焊接等複數個構件構成。且,有時將如此製作之一次成形體,使用引線或盤片與二次焊接,製作使用於交流發電機之整流元件。 如此,於使用於交流發電機之整流元件之製造過程中,有於使用一次焊接構成一次成形體後,使用二次焊接之製造過程。 與該技術關聯,有例如專利文獻1。 For example, when assembling a rectifier element used in an alternator, it is first formed as a primary molded body using multiple components such as power semiconductor chips, control ICs (Integrated Circuits), capacitors, conductive adhesives, or primary welding. . Furthermore, the primary molded body thus produced is sometimes used to produce rectifying elements used in alternators using leads or discs and secondary welding. In this way, in the manufacturing process of the rectifier element used in the alternator, there is a manufacturing process in which the primary formed body is formed by primary welding and then secondary welding is used. Related to this technology, there is Patent Document 1, for example.

於專利文獻1之[摘要],揭示有一種半導體裝置之技術,其記載為,[課題]提供一種低成本且無需複雜之製造步驟,便於實現之半導體裝置、及使用其之交流發電機。[解決手段]該半導體裝置具備:基底21,其具有台座24;引線22,其具有引線頭25;及電子電路體100;且於基底與引線之間具有電子電路體,台座連接於電子電路體之第1面,引線頭連接於電子電路體之第2面,電子電路體包含具有開關元件之電晶體電路晶片11、控制開關元件之控制電路晶片12、汲極框14、及源極框15且一體地由樹脂16覆蓋構成,連接汲極框及源極框中之任一者、與源極,並連接源極框及汲極框中之另一者、與引線」。 如此於專利文獻1顯示有於電子電路體之內部,於電晶體電路晶片與控制電路晶片與汲極框與源極框中之任一者之間進行焊接(一次焊接)後,電子電路體於源極與引線頭之間進行焊接(二次焊接)。 [先前技術文獻] [專利文獻] The [Abstract] of Patent Document 1 discloses a technology for a semiconductor device, and it is stated that the [Project] is to provide a semiconductor device that is low-cost, does not require complicated manufacturing steps, and is easy to implement, and an alternator using the same. [Solution] This semiconductor device includes: a base 21 having a base 24; a lead 22 having a lead head 25; and an electronic circuit body 100; and there is an electronic circuit body between the base and the lead, and the base is connected to the electronic circuit body. On the first side, the lead head is connected to the second side of the electronic circuit body. The electronic circuit body includes a transistor circuit chip 11 with switching elements, a control circuit chip 12 for controlling the switching elements, a drain frame 14, and a source frame 15. It is integrally covered with resin 16, connects one of the drain frame and the source frame to the source, and connects the other of the source frame and the drain frame to the lead." As shown in Patent Document 1, after welding (one welding) is performed between the transistor circuit chip and the control circuit chip and either the drain frame or the source frame inside the electronic circuit body, the electronic circuit body is Welding (secondary welding) is performed between the source electrode and the lead head. [Prior technical literature] [Patent Document]

[專利文獻1]日本專利特開2017-098276號公報[Patent Document 1] Japanese Patent Application Publication No. 2017-098276

[發明所欲解決之問題][Problem to be solved by the invention]

然而,於上述專利文獻1中,於電子電路體之內部有一次焊接步驟,於電子電路體之外部基底與引線頭之各者之間有二次焊接步驟。因此,於使用二次焊接之步驟時,有需考慮一次焊接或導電性接著劑之熔點或製程之熱歷程引起之內部熱應力而進行材料選定或製作條件之研究之課題(問題)。However, in the above-mentioned Patent Document 1, there is a primary soldering step inside the electronic circuit body, and a secondary soldering step between each of the external substrate of the electronic circuit body and the lead head. Therefore, when using the secondary soldering step, it is necessary to consider the internal thermal stress caused by the melting point of the primary soldering or conductive adhesive or the thermal history of the process to conduct research on material selection or manufacturing conditions.

本發明係鑑於上述問題而發明者,其課題(目的)在於提供一種實現一次焊接接合後,無需二次焊接接合之無二次焊接之構造,藉此可容易選擇材料選定或製作條件之無二次焊接半導體裝置。 [解決問題之技術手段] The present invention was invented in view of the above problems, and its subject (objective) is to provide a structure without secondary welding that eliminates the need for secondary welding after primary welding, thereby making it easy to select the same material selection or manufacturing conditions. Secondary soldering of semiconductor devices. [Technical means to solve problems]

為解決上述課題且達成本發明之目的,而如以下構成。 即,本發明之無二次焊接半導體裝置之特徵在於具備:第1導體;第2導體;功率半導體晶片,其配置於上述第1導體與上述第2導體之間,第1電極電性連接於上述第1導體,第2電極電性連接於上述第2導體;及第3導體,其固定上述第1導體;且上述功率半導體晶片以焊接接合於上述第1導體或上述第2導體中之至少一者;上述第1導體與上述第3導體之間不經由焊接而經由凹凸之嵌合構造電性及機械連接。 又,其他機構於用於實施發明之形態中說明。 [發明之效果] In order to solve the above-mentioned problems and achieve the object of this invention, it is comprised as follows. That is, the secondary soldering-free semiconductor device of the present invention is characterized by having: a first conductor; a second conductor; and a power semiconductor chip arranged between the first conductor and the second conductor, and the first electrode is electrically connected to The above-mentioned first conductor and the second electrode are electrically connected to the above-mentioned second conductor; and a third conductor, which fixes the above-mentioned first conductor; and the above-mentioned power semiconductor chip is bonded to at least one of the above-mentioned first conductor or the above-mentioned second conductor by soldering. 1. The above-mentioned first conductor and the above-mentioned third conductor are electrically and mechanically connected through a concave and convex fitting structure without welding. In addition, other mechanisms are described in the form for carrying out the invention. [Effects of the invention]

根據本發明,可提供一種可容易進行材料選定或製作條件選擇之無二次焊接半導體裝置。According to the present invention, it is possible to provide a semiconductor device without secondary soldering that can easily select materials or manufacturing conditions.

以下,適當參照圖式說明用於實施本發明之形態(於以下中表述為「實施形態」)。 另,於用於說明實施形態之各圖中,具有相同功能者附加相同符號,適當省略其重複之說明。又,於以下之實施形態之說明中,除特別需要時以外不重複、且適當省略相同、或同樣之部分之說明。 又,因以下之說明中參照之圖式係概略顯示實施形態者,故亦有各構件之尺度或間隔、位置關係等誇張、或省略構件之一部分圖示之情形。 Hereinafter, the embodiment for implementing the present invention (hereinafter referred to as "embodiment") will be described with reference to the drawings as appropriate. In addition, in the respective drawings for explaining the embodiments, those having the same functions are assigned the same reference numerals, and repeated descriptions thereof are appropriately omitted. In addition, in the description of the following embodiments, no duplication will be made unless particularly necessary, and the description of the same or identical parts will be appropriately omitted. In addition, since the drawings referred to in the following description schematically show embodiments, the scale, spacing, positional relationship, etc. of each member may be exaggerated, or part of the member may be omitted from the illustration.

≪第1實施形態:其1≫ 參照圖1A與圖1B說明本發明之第1實施形態之無二次焊接半導體裝置之構成。 圖1A係模式性顯示本發明之第1實施形態之無二次焊接半導體裝置101之剖面構造之一例之圖。 圖1B係顯示為容易理解本發明之第1實施形態之無二次焊接半導體裝置101之構造,而將無二次焊接半導體裝置101分解表述為盤片2與螺桿17與內置封裝51與引線4之分解剖視圖之一例之圖。 另,於圖1A及圖1B中,因容易理解,故省略顯示填充於無二次焊接半導體裝置101之內部之樹脂(例如稍後記述之圖4A或圖5A之樹脂6)之記載。 ≪First Embodiment: Part 1≫ The structure of the secondary soldering-free semiconductor device according to the first embodiment of the present invention will be described with reference to FIGS. 1A and 1B. FIG. 1A is a diagram schematically showing an example of the cross-sectional structure of the secondary soldering-free semiconductor device 101 according to the first embodiment of the present invention. 1B shows the structure of the non-re-soldering semiconductor device 101 in the first embodiment of the present invention for easy understanding. The non-re-soldering semiconductor device 101 is decomposed into the disk 2, the screw 17, the built-in package 51 and the leads 4. An example of anatomical view. In addition, in FIGS. 1A and 1B , the description of the resin filled in the interior of the non-secondary soldering semiconductor device 101 (for example, the resin 6 of FIG. 4A or FIG. 5A to be described later) is omitted for easy understanding.

於圖1A中,無二次焊接半導體裝置101具備盤片2(第3導體)、內置封裝51、及引線(引線電極)4構成。 又,內置封裝51具備平板16A(第1導體)、平板16B(第2導體)、功率半導體晶片7、源極塊(分隔件導體)11、控制IC晶片(控制IC、控制電路)10、電容器13與絕緣膜(由印刷形成圖案之絕緣膜)18構成。 In FIG. 1A , the secondary soldering-free semiconductor device 101 is composed of a disk 2 (third conductor), a built-in package 51 , and a lead (lead electrode) 4 . Furthermore, the built-in package 51 includes a flat plate 16A (first conductor), a flat plate 16B (second conductor), a power semiconductor chip 7, a source block (spacer conductor) 11, a control IC chip (control IC, control circuit) 10, and a capacitor. 13 and an insulating film (an insulating film formed by printing a pattern) 18.

功率半導體晶片7為例如使用MOSFET(Metal Oxide Semiconductor Field-Effect Transistor:金屬氧化物半導體場效電晶體)之功率MOSFET晶片。 於功率半導體晶片7有兩個主表面。功率半導體晶片7之第一面(紙面視角下為下方之面)之特定之電極(第1電極)經由一次焊接(焊接)8連接、搭載於平板16A之第二面(紙面視角下為上方之面)。又,功率半導體晶片7之第二面(紙面視角下為上方之面)之特定之電極(第2電極)經由一次焊接(焊接)8連接於源極塊11之第一面(紙面視角下為下方之面)。源極塊11之第二面(紙面視角下為上方之面)介隔導電性接合材9連接於平板16B之第一面(紙面視角下為下方之面)。 如此,功率半導體晶片7之第2電極與平板16B(第2導體)之間介隔導體即源極塊(分隔件導體)11電性連接。 The power semiconductor chip 7 is, for example, a power MOSFET chip using a MOSFET (Metal Oxide Semiconductor Field-Effect Transistor: Metal Oxide Semiconductor Field-Effect Transistor). The power semiconductor chip 7 has two main surfaces. Specific electrodes (first electrodes) on the first side of the power semiconductor chip 7 (the lower side in the paper perspective) are connected via a welding (soldering) 8 and mounted on the second side of the flat plate 16A (the upper side in the paper perspective). noodle). In addition, a specific electrode (second electrode) on the second side of the power semiconductor chip 7 (the upper side in the paper perspective) is connected to the first side of the source block 11 (the upper side in the paper perspective) via a welding (soldering) 8 below). The second surface of the source block 11 (the upper surface in the paper perspective) is connected to the first surface of the flat plate 16B (the lower surface in the paper perspective) via the conductive bonding material 9 . In this way, the second electrode of the power semiconductor chip 7 and the flat plate 16B (second conductor) are electrically connected via the source block (spacer conductor) 11 which is the spacer conductor.

控制IC晶片10與電容器13介隔導電性接合材9,搭載於絕緣膜18。另,絕緣膜18意指由印刷形成圖案之絕緣膜。 絕緣膜18作為絕緣膜印刷有絕緣圖案之部位被排除與平板16B之間之利用導電性接合材9之電性接合。 因此,藉由適當形成絕緣圖案,而選擇性構成控制IC晶片10之複數個特定之端子、與平板16B及電容器13之電性連接。 又,與控制IC晶片10之上述端子不同之其他複數個端子經由接合線14連接於功率半導體晶片7之特定之端子。藉由該連接,功率半導體晶片7藉由控制IC晶片10,控制電性特性。 The control IC chip 10 and the capacitor 13 are mounted on an insulating film 18 with a conductive bonding material 9 interposed therebetween. In addition, the insulating film 18 means an insulating film in which a pattern is formed by printing. Electrical bonding between the insulating film 18 and the flat plate 16B using the conductive bonding material 9 is excluded as a portion of the insulating film on which the insulating pattern is printed. Therefore, by appropriately forming the insulating pattern, electrical connections between a plurality of specific terminals of the control IC chip 10 and the plate 16B and the capacitor 13 are selectively formed. In addition, a plurality of other terminals different from the above-mentioned terminals of the control IC chip 10 are connected to specific terminals of the power semiconductor chip 7 via bonding wires 14 . Through this connection, the power semiconductor chip 7 controls the electrical characteristics by controlling the IC chip 10 .

又,平板16A之第一面(紙面視角下為下方之面)藉由盤片2之第二面(紙面視角下為上方之面)、螺桿(桿狀構件)17與螺孔19,機械及電性接合。即,平板16A(第1導體)之第一面、與盤片2(第3導體)之第二面之間不經由焊接而經由凹凸之嵌合構造電性及機械連接。 又,平板16B之第二面藉由引線4、螺桿17與螺孔19,機械及電性接合。 另,於圖1A中,於平板16A(第1導體)之第1面具有凹部,於盤片2(第3導體)之第二面具有凹部。且,具有嵌合於上述兩個凹部之螺桿17(桿狀構件)。 In addition, the first surface of the flat plate 16A (the lower surface in the paper perspective) is mechanically and Electrical bonding. That is, the first surface of the flat plate 16A (first conductor) and the second surface of the disk 2 (third conductor) are electrically and mechanically connected through a concave and convex fitting structure without soldering. In addition, the second surface of the flat plate 16B is mechanically and electrically connected through the lead 4, the screw 17 and the screw hole 19. In addition, in FIG. 1A , a recess is provided on the first surface of the flat plate 16A (first conductor), and a recess is provided on the second surface of the disk 2 (third conductor). Furthermore, it has a screw 17 (rod-shaped member) fitted into the two recessed portions.

藉由以上之構成,無二次焊接半導體裝置101具備盤片2、內置封裝51、及引線4,構成例如具有第1端子與第2端子之整流元件。 另,包含內置封裝51所具備之功率半導體晶片7與控制IC晶片(控制IC)10與電容器13構成電路,自連接於盤片2之平板16A、及連接於引線4之平板16B對電路供給電壓(電力)。 With the above configuration, the secondary soldering-free semiconductor device 101 includes the disk 2, the built-in package 51, and the leads 4, and constitutes, for example, a rectifying element having a first terminal and a second terminal. In addition, the power semiconductor chip 7 included in the built-in package 51, the control IC chip (control IC) 10, and the capacitor 13 constitute a circuit, and the voltage is supplied to the circuit from the flat plate 16A connected to the disk 2 and the flat plate 16B connected to the lead 4. (electricity).

如上所述,圖1B係顯示為容易理解本發明之第1實施形態之無二次焊接半導體裝置101之構造,而將無二次焊接半導體裝置101分解表述為盤片2與螺桿17與內置封裝51與引線4之分解剖視圖之一例之圖。 於圖1B中,內置封裝51如上所述,省略重複之說明。 As mentioned above, FIG. 1B shows the structure of the non-re-soldering semiconductor device 101 according to the first embodiment of the present invention for easy understanding. The non-re-soldering semiconductor device 101 is decomposed into the disk 2, the screw 17 and the built-in package. An example of an anatomical view of 51 and lead 4. In FIG. 1B , the built-in package 51 is as described above, and repeated descriptions are omitted.

又,於圖1B中,於盤片2(第3導體)之第二面之中心部中,設置螺孔19(凹部)。又,於內置封裝51之平板16A(第1導體)之第一面之中心部中,設置螺孔19(凹部)。藉由對該等兩個螺孔19(凹部)插入螺桿17(桿狀構件),而機械、電性接合內置封裝51之平板16A(第1導體)、與盤片2(第3導體)。即,亦可如以下表現。 (1)「第1導體與第3導體之間不經由焊接而經由凹凸之嵌合構造電性及機械連接」 (2)「於第1導體具有凹部,於第3導體具有凹部,且具有嵌合於第1導體之凹部與第3導體之凹部之桿狀構件」 In addition, in FIG. 1B , a screw hole 19 (recessed portion) is provided in the center of the second surface of disk 2 (third conductor). Furthermore, a screw hole 19 (recessed portion) is provided in the center of the first surface of the flat plate 16A (first conductor) of the built-in package 51 . By inserting the screw 17 (rod-shaped member) into the two screw holes 19 (recessed portions), the flat plate 16A (first conductor) of the built-in package 51 and the disk 2 (third conductor) are mechanically and electrically joined. That is, it can also be expressed as follows. (1) "The first conductor and the third conductor are electrically and mechanically connected through a concave and convex fitting structure without welding." (2) "The first conductor has a recessed portion, the third conductor has a recessed portion, and has a rod-shaped member that fits into the recessed portion of the first conductor and the recessed portion of the third conductor."

又,於引線4之螺桿17、與內置封裝51之平板16B之第二面之中心部中,設置螺孔19。藉由對該螺孔19插入螺桿17,而機械、電性接合內置封裝51之平板16B、與引線4。 另,期望平板16A(第1導體)與平板16B(第2導體)為相同之形狀。若形狀相同,則構件可共通化,並可減少構件成本、製造成本。 藉由以上之構成,無二次焊接半導體裝置101具備盤片2、內置封裝51、及引線4,構成例如具有第1端子與第2端子之整流元件。 In addition, a screw hole 19 is provided in the center of the screw 17 of the lead 4 and the second surface of the flat plate 16B of the built-in package 51. By inserting the screw 17 into the screw hole 19, the flat plate 16B of the built-in package 51 and the lead 4 are mechanically and electrically connected. In addition, it is desirable that flat plate 16A (first conductor) and flat plate 16B (second conductor) have the same shape. If the shapes are the same, components can be common and component costs and manufacturing costs can be reduced. With the above configuration, the secondary soldering-free semiconductor device 101 includes the disk 2, the built-in package 51, and the leads 4, and constitutes, for example, a rectifying element having a first terminal and a second terminal.

為說明以上之無二次焊接半導體裝置101之構成有何種效果,而接著說明作為比較例之半導體裝置。In order to illustrate the effects of the above configuration of the semiconductor device 101 without secondary soldering, a semiconductor device as a comparative example will be described next.

≪比較例1≫ 參照圖2A與圖2B說明比較例1之半導體裝置之構成。 圖2A係模式性顯示比較例1之半導體裝置(壓入型半導體裝置)1000R之剖面構造之一例之圖。 圖2B係模式性顯示比較例1之半導體裝置1000R(壓入型半導體裝置)之內置封裝500R之剖面構造之一例之圖。 於圖2A中,半導體裝置(壓入型半導體裝置)1000R具備內置封裝(一次成形體)500R、盤片2R、及引線4R構成。又,於圖2A中,半導體裝置1000R具備二次焊接300R、與密封樹脂6。 ≪Comparative example 1≫ The structure of the semiconductor device of Comparative Example 1 will be described with reference to FIGS. 2A and 2B. FIG. 2A is a diagram schematically showing an example of the cross-sectional structure of the semiconductor device (press-fit semiconductor device) 1000R of Comparative Example 1. 2B is a diagram schematically showing an example of the cross-sectional structure of the built-in package 500R of the semiconductor device 1000R (press-fit type semiconductor device) of Comparative Example 1. In FIG. 2A , a semiconductor device (press-fit semiconductor device) 1000R is composed of a built-in package (primary molded body) 500R, a disk 2R, and leads 4R. In addition, in FIG. 2A , the semiconductor device 1000R includes secondary soldering 300R and sealing resin 6 .

於圖2B中,內置封裝(一次成形體)500R具備功率半導體晶片7、引線框12R2、源極塊11、及一次焊接8。 又,於圖2B中,內置封裝500R具備控制IC晶片10、電容器13、導電性接合材9、引線框12R1、接合線14、及密封樹脂65。 In FIG. 2B , a built-in package (primary molded body) 500R includes a power semiconductor chip 7 , a lead frame 12R2 , a source block 11 , and a primary solder 8 . In addition, in FIG. 2B , the built-in package 500R includes the control IC chip 10 , the capacitor 13 , the conductive bonding material 9 , the lead frame 12R1 , the bonding wire 14 , and the sealing resin 65 .

圖2A、圖2B與上述圖1A、圖1B事實上省略重複之說明。 圖2A、圖2B與上述圖1A、圖1B不同之點之概要、及較大之差係於圖2A中,使用二次焊接300R。該二次焊接300R之步驟係與圖2B之一次焊接8不同之步驟。 即,於內置封裝(一次成形體)500R中,實施一次焊接8之後,使用內置封裝500R,構成半導體裝置1000R時,有實施二次焊接300R之步驟。 如此,參照圖2A、圖2B顯示之比較例1之半導體裝置1000R因有一次焊接8之步驟、與二次焊接300R之步驟,故實施二次焊接之步驟時,有需考慮一次焊接或導電性接著劑之熔點或製程之熱歷程引起之內部熱應力而進行材料選定或製作條件之研究之課題(問題)。 In fact, overlapping descriptions of FIGS. 2A and 2B and the above-mentioned FIGS. 1A and 1B are omitted. An overview of the differences between Figures 2A and 2B and the above-mentioned Figures 1A and 1B, and the biggest difference is that in Figure 2A, secondary welding 300R is used. The step of the secondary welding 300R is different from the step of the primary welding 8 in Figure 2B. That is, after the primary soldering 8 is performed on the built-in package (primary molded body) 500R, when the semiconductor device 1000R is constructed using the built-in package 500R, there is a step of performing the secondary soldering 300R. In this way, the semiconductor device 1000R of Comparative Example 1 shown with reference to FIGS. 2A and 2B has a step of primary welding 8 and a step of secondary welding 300R. Therefore, when performing the step of secondary welding, it is necessary to consider the primary welding or conductivity. Topics (problems) for studying material selection or manufacturing conditions due to internal thermal stress caused by the melting point of the adhesive or the thermal history of the manufacturing process.

≪第1實施形態:其2≫ 進而說明本發明之第1實施形態之無二次焊接半導體裝置之特徵。 如上所述,於圖1A、圖1B所示之無二次焊接半導體裝置中,「焊接」之步驟僅為一次焊接8,無「二次焊接」之步驟。 即,可提供實現於一次焊接接合後,無需二次焊接接合之無二次焊接之構造,藉此可容易進行材料選定或製作條件選擇之無二次焊接半導體裝置。 另,於圖1A、圖1B中,省略密封樹脂之表述,但對密封樹脂之構成為何種,稍後參照第2實施形態之圖4A、圖4B或第3實施形態之圖5A、圖5B進行敘述。 ≪First Embodiment: Part 2≫ Next, the characteristics of the secondary soldering-free semiconductor device according to the first embodiment of the present invention will be described. As mentioned above, in the semiconductor device without secondary soldering shown in FIGS. 1A and 1B , the "welding" step is only one-time soldering 8 and there is no "secondary soldering" step. That is, it is possible to provide a secondary soldering-free structure that eliminates the need for secondary soldering after primary soldering, thereby making it easy to select materials or manufacturing conditions for a secondary soldering-free semiconductor device. In addition, in FIGS. 1A and 1B , the description of the sealing resin is omitted, but the structure of the sealing resin will be described later with reference to FIGS. 4A and 4B of the second embodiment or FIGS. 5A and 5B of the third embodiment. Narrative.

<第1實施形態之效果> 根據本發明之第1實施形態,實現一次焊接接合後,無需二次焊接接合之無二次焊接之構造。因此,可提供能夠容易進行伴隨焊接步驟之材料選定或製作條件選擇之無二次焊接半導體裝置。 <Effects of the first embodiment> According to the first embodiment of the present invention, a secondary welding-free structure that eliminates the need for secondary welding after primary welding is achieved. Therefore, it is possible to provide a semiconductor device without secondary soldering in which material selection or manufacturing condition selection accompanying the soldering step can be easily performed.

<第1實施形態之變化例> 雖以圖1A、圖1B說明本發明之第1實施形態,但可進行部分之變更。 接著,參照圖1C、圖1D、圖1E,依序對第1實施形態之變化例1、變化例1、變化例3進行說明。 <Modification example of the first embodiment> Although the first embodiment of the present invention is described with reference to FIGS. 1A and 1B , some changes may be made. Next, modification 1, modification 1, and modification 3 of the first embodiment will be described in order with reference to FIG. 1C, FIG. 1D, and FIG. 1E.

≪第1實施形態之變化例1≫ 圖1C係顯示本發明之第1實施形態之變化例1之剖面構造之一例之圖。 於圖1C中,引線4C與平板16C成為一體化之構造。 於該圖1C所示之引線4C與平板16C一體化之構造中,組裝步驟之削減、引線4C與平板16C之密接度、電性、機械之可靠度提高。 ≪Modification 1 of the first embodiment≫ FIG. 1C is a diagram showing an example of the cross-sectional structure of Modification 1 of the first embodiment of the present invention. In FIG. 1C , the lead 4C and the flat plate 16C form an integrated structure. In the integrated structure of the lead 4C and the flat plate 16C shown in FIG. 1C , the assembly steps are reduced, the close contact between the lead 4C and the flat plate 16C, and the electrical and mechanical reliability are improved.

≪第1實施形態之變化例2≫ 圖1D係顯示本發明之第1實施形態之變化例2之剖面構造之一例之圖。 於圖1D中,平板16D(第1導體)與螺桿17D(桿狀構件)成為一體化之構造。即,平板16D具有凸部。且,與盤片2(第3導體:圖1B)之螺孔19(凹部)接合。即,亦可如以下般表現。 「於第1導體具有凸部,於第3導體具有凹部,第1導體之凸部與第3導體之凹部嵌合」 於該圖1D所示之平板16D(16A:圖1B)與螺桿17D一體化之構造中,組裝步驟之削減、平板16D與螺桿17D之密接度、電性、機械之可靠度提高。 另,圖1D所示之平板16D與螺桿17D一體化,因而與圖1B之平板16A不同,使用其他符號。 ≪Modification 2 of the first embodiment≫ FIG. 1D is a diagram showing an example of the cross-sectional structure of Modification 2 of the first embodiment of the present invention. In FIG. 1D , the flat plate 16D (first conductor) and the screw 17D (rod-shaped member) have an integrated structure. That is, the flat plate 16D has a convex portion. And, it is engaged with the screw hole 19 (recessed portion) of the disk 2 (third conductor: Figure 1B). That is, it can also be expressed as follows. "The first conductor has a convex part, the third conductor has a concave part, and the convex part of the first conductor fits into the concave part of the third conductor." In the integrated structure of the flat plate 16D (16A: FIG. 1B) and the screw 17D shown in FIG. 1D, the assembly steps are reduced, the close contact between the flat plate 16D and the screw 17D, and the electrical and mechanical reliability are improved. In addition, the flat plate 16D shown in FIG. 1D is integrated with the screw 17D, so it is different from the flat plate 16A in FIG. 1B, and other symbols are used.

≪第1實施形態之變化例3≫ 圖1E係顯示本發明之第1實施形態之變化例3之剖面構造之一例之圖。 於圖1E中,盤片2E(第3導體)與螺桿17E(凸部)成為一體化之構造。且,該一體化之構造之凸部(17E)與圖1B所示之平板16A之螺孔19接合。即,亦可如以下表現。 「於第1導體具有凹部,於第3導體具有凸部,凹部與第3導體之凸部嵌合於第1導體」 於該圖1E所示之盤片2E與螺桿17E一體化之構造中,組裝步驟之削減、盤片2E與螺桿17E之密接度、電性、機械之可靠度提高。 ≪Modification 3 of the first embodiment≫ FIG. 1E is a diagram showing an example of the cross-sectional structure of Modification 3 of the first embodiment of the present invention. In FIG. 1E , the disc 2E (third conductor) and the screw 17E (convex portion) form an integrated structure. Moreover, the convex portion (17E) of the integrated structure is engaged with the screw hole 19 of the flat plate 16A shown in Figure 1B. That is, it can also be expressed as follows. "The first conductor has a concave portion, the third conductor has a convex portion, and the concave portion and the convex portion of the third conductor fit into the first conductor." In the integrated structure of the disc 2E and the screw 17E shown in FIG. 1E, the assembly steps are reduced, the close contact between the disc 2E and the screw 17E, and the electrical and mechanical reliability are improved.

≪第2實施形態≫ 參照圖3A說明本發明之第2實施形態之無二次焊接半導體裝置之構成。 圖3A係顯示為容易理解本發明之第2實施形態之無二次焊接半導體裝置102之構造,而分解表述無二次焊接半導體裝置102之剖面構造之一例之圖。 ≪Second Embodiment≫ The structure of the secondary soldering-free semiconductor device according to the second embodiment of the present invention will be described with reference to FIG. 3A. 3A is an exploded view showing an example of the cross-sectional structure of the secondary soldering-free semiconductor device 102 in order to facilitate easy understanding of the structure of the secondary-bonding-free semiconductor device 102 according to the second embodiment of the present invention.

於圖3A中,與上述第1實施形態之圖1B不同者在於,固定平板16B與源極塊11之構造。 於圖3A中,平板16B與源極塊11B藉由螺桿17B與螺孔19B固定。即,於平板16B與源極塊11B設置螺孔19B,插入螺桿17B,藉此進行固定。又,可於插入螺桿17B時併用導電性接著劑。 另,藉由於固定平板16B與源極塊11B之方法中,使用螺桿17B,而無需圖1B之導電性接合材9。 因除以上之源極塊11B、於源極塊11B設置螺孔19B、無需導電性接合材9以外,為與圖1B相同之構成,故省略重複之說明。 In FIG. 3A , the difference from FIG. 1B in the above-described first embodiment lies in the structure of the fixed plate 16B and the source block 11 . In FIG. 3A , the flat plate 16B and the source block 11B are fixed by the screw 17B and the screw hole 19B. That is, screw holes 19B are provided in the flat plate 16B and the source block 11B, and the screws 17B are inserted to fix them. In addition, a conductive adhesive may be used when inserting the screw 17B. In addition, since the screw 17B is used to fix the flat plate 16B and the source block 11B, the conductive joining material 9 of FIG. 1B is not required. Except for the above source block 11B, the screw hole 19B provided in the source block 11B, and the need for the conductive bonding material 9, the structure is the same as that of FIG. 1B, so repeated explanations are omitted.

<第2實施形態之效果> 藉由源極塊11B與於源極塊11B設置螺孔19B,而有無需導電性接合材9之效果。 <Effects of the second embodiment> By providing the source block 11B and the screw hole 19B in the source block 11B, there is an effect that the conductive bonding material 9 is not required.

≪第2實施形態之變化例4≫ 圖3B係顯示本發明之第2實施形態之變化例4之剖面構造之一例之圖。 於圖3B中,引線4F與平板16F(第2導體)與螺桿7F成為一體化之構造。 於該圖3B所示之引線4F與平板16F與螺桿17F一體化之構造中,組裝步驟之削減、引線4F與平板16F、及平板16F與螺桿17F之間之密接度、電性、機械性之可靠度提高。 ≪Modification 4 of the second embodiment≫ FIG. 3B is a diagram showing an example of the cross-sectional structure of Modification 4 of the second embodiment of the present invention. In FIG. 3B , the lead 4F, the flat plate 16F (second conductor), and the screw 7F have an integrated structure. In the integrated structure of the lead 4F, the flat plate 16F and the screw 17F shown in Figure 3B, the assembly steps are reduced, the tightness, electrical and mechanical properties between the lead 4F and the flat plate 16F, and the flat plate 16F and the screw 17F are reduced. Reliability is improved.

≪第3實施形態≫ 參照圖4A與圖4B說明本發明之第3實施形態之無二次焊接半導體裝置之構成。 圖4A係模式性顯示本發明之第3實施形態之無二次焊接半導體裝置103P之使用灌封樹脂之情形之正座即P極構造之剖面構造之一例的圖。 圖4B係模式性顯示本發明之第3實施形態之無二次焊接半導體裝置103N之使用灌封樹脂之情形之逆座即N極構造之剖面構造之一例的圖。 ≪Third Embodiment≫ The structure of the secondary soldering-free semiconductor device according to the third embodiment of the present invention will be described with reference to FIGS. 4A and 4B. 4A is a diagram schematically showing an example of the cross-sectional structure of the main seat, that is, the P-pole structure, when potting resin is used in the non-secondary soldering semiconductor device 103P according to the third embodiment of the present invention. 4B is a diagram schematically showing an example of the cross-sectional structure of the counter-base or N-pole structure when potting resin is used in the non-secondary soldering semiconductor device 103N according to the third embodiment of the present invention.

另,圖4A所示之無二次焊接半導體裝置103P係使用與圖1A所示之無二次焊接半導體裝置101之內置封裝51相同之內置封裝53P,如稍後所述,由灌封樹脂進行樹脂密封者。 又,圖4B所示之無二次焊接半導體裝置103N係如稍後所述,將圖4A所示之內置封裝53P上下反轉,作為內置封裝53N之構造。又,內置封裝53N由灌封樹脂進行樹脂密封。 In addition, the non-secondary soldering semiconductor device 103P shown in FIG. 4A uses the same built-in package 53P as the built-in package 51 of the non-secondary soldering semiconductor device 101 shown in FIG. 1A. As will be described later, it is made of potting resin. Resin sealer. In addition, the non-secondary soldering semiconductor device 103N shown in FIG. 4B has a structure in which the built-in package 53P shown in FIG. 4A is turned upside down to form a built-in package 53N, as will be described later. In addition, the built-in package 53N is resin-sealed with potting resin.

<正座即P極構造與逆座即N極構造之關係> 接著,依序對圖4A之正座即P極構造與圖4B之逆座即N極構造之關係進行說明。 首先,說明圖4A之P極構造。 <The relationship between the upright position, which is the P pole structure, and the reverse position, which is the N pole structure.> Next, the relationship between the upright seat, that is, the P-pole structure of FIG. 4A , and the reverse seat, that is, the N-pole structure of FIG. 4B , will be described in sequence. First, the P-pole structure of FIG. 4A is explained.

≪P極構造、正座≫ 於圖4A中,無二次焊接半導體裝置103P具備盤片2(第3導體)、內置封裝53P、及引線4構成。 又,內置封裝53P具備平板16A(第1導體)、平板16B(第2導體)、功率半導體晶片7、源極塊(分隔件導體)11、控制IC晶片10、電容器13與絕緣膜(由印刷形成之絕緣膜)18構成。 又,具備一次焊接8與導電性接合材9。 以上之構成雖與圖1A同樣,但根據正座即P極構造之觀點對以上之構成進行詳細說明。 ≪P pole structure, straight seat≫ In FIG. 4A , the secondary soldering-free semiconductor device 103P is composed of a disk 2 (third conductor), a built-in package 53P, and leads 4 . Furthermore, the built-in package 53P includes a flat plate 16A (first conductor), a flat plate 16B (second conductor), a power semiconductor chip 7, a source block (spacer conductor) 11, a control IC chip 10, a capacitor 13, and an insulating film (printed The insulating film formed is composed of 18. Furthermore, it is provided with primary welding 8 and conductive joining material 9 . Although the above structure is the same as that in FIG. 1A , the above structure will be described in detail from the perspective of the main seat, that is, the P-pole structure.

於圖4A中,功率半導體晶片7由例如MOSFET(Metal Oxide Semiconductor Field Effect Transistor:場效電晶體)構成。且,MOSFET之汲極電極與源極電極設置於功率半導體晶片7之各者之主表面。 汲極電極設置於平板16A側之主表面,源極電極設置於源極塊11側,即平板16B側之主表面。又,閘極電極經由接合線(14:圖1A)以來自控制IC晶片(控制IC、控制電路)10之信號控制。 In FIG. 4A , the power semiconductor chip 7 is composed of, for example, a MOSFET (Metal Oxide Semiconductor Field Effect Transistor). Furthermore, the drain electrode and the source electrode of the MOSFET are provided on the main surface of each of the power semiconductor chips 7 . The drain electrode is disposed on the main surface of the plate 16A side, and the source electrode is disposed on the source block 11 side, that is, the main surface of the plate 16B side. Furthermore, the gate electrode is controlled by a signal from the control IC chip (control IC, control circuit) 10 via the bonding wire (14: FIG. 1A).

平板16A因電性導通於盤片2,故功率半導體晶片7之汲極電極電性導通於盤片2。 平板16B因電性導通於引線4,故功率半導體晶片7之源極電極電性導通於引線4。 藉由以上之構成,無二次焊接半導體裝置103P構成P極構造。又,將該構造稱呼為「正座」。 Since the flat plate 16A is electrically connected to the disk 2, the drain electrode of the power semiconductor chip 7 is electrically connected to the disk 2. Since the flat plate 16B is electrically connected to the lead 4, the source electrode of the power semiconductor chip 7 is electrically connected to the lead 4. With the above configuration, the secondary soldering-free semiconductor device 103P forms a P-pole structure. Also, this structure is called "Main Seat".

另,於圖4A中,與圖1A不同者在於,圖1A中省略記載之密封樹脂6、與圖4A中之特徵即筒狀之樹脂外殼20。 於圖4A中,為防止樹脂洩漏而由樹脂外殼20覆蓋內置封裝53P之周圍,自樹脂外殼20之外部注入(灌封)樹脂(resin)。 於樹脂外殼20之內部收納內置封裝53P,以樹脂(密封樹脂)6密封,藉此可確保絕緣性與耐久性。 In addition, FIG. 4A is different from FIG. 1A in that the sealing resin 6 shown in FIG. 1A is omitted, and the characteristic cylindrical resin case 20 in FIG. 4A is omitted. In FIG. 4A , in order to prevent resin leakage, the periphery of the built-in package 53P is covered with the resin case 20 , and resin (resin) is injected (potted) from the outside of the resin case 20 . The built-in package 53P is housed inside the resin case 20 and sealed with resin (sealing resin) 6, thereby ensuring insulation and durability.

≪N極構造、逆座≫ 接著,說明圖4B之N極構造。 如上所述,圖4B係模式性顯示本發明之第3實施形態之無二次焊接半導體裝置103N之使用灌封樹脂之情形之N極構造之剖面構造之一例的圖。 於圖4B中,與圖4A不同者在於,內置封裝53N與內置封裝53P之關係。即,於圖4B中,於連接於引線4之平板16C(第2導體),搭載功率半導體晶片7與控制IC晶片10與電容器13。另一方面,於連接於盤片2(第3導體)之平板16D(第1導體),連接有源極塊11。 ≪N pole structure, reverse seat≫ Next, the N-pole structure in FIG. 4B will be described. As described above, FIG. 4B is a diagram schematically showing an example of the cross-sectional structure of the N-pole structure when potting resin is used in the non-secondary soldering semiconductor device 103N according to the third embodiment of the present invention. In FIG. 4B , the difference from FIG. 4A lies in the relationship between the built-in package 53N and the built-in package 53P. That is, in FIG. 4B , the power semiconductor chip 7 , the control IC chip 10 and the capacitor 13 are mounted on the flat plate 16C (second conductor) connected to the lead 4 . On the other hand, the source block 11 is connected to the flat plate 16D (first conductor) connected to the disk 2 (third conductor).

即,圖4B之平板16C與平板16D之關係對應於圖4A之平板16A與平板16B之關係。即,於連接於引線4與盤片2之關係中,於內置封裝53N與內置封裝53P之關係中,成為反轉之關係。That is, the relationship between the flat plates 16C and 16D of FIG. 4B corresponds to the relationship between the flat plates 16A and 16B of FIG. 4A. That is, the relationship between the lead 4 and the disk 2 and the relationship between the built-in package 53N and the built-in package 53P are inverted.

因此,圖4A所示之無二次焊接半導體裝置103P為P極構造之正座之構造,對此圖4B所示之無二次焊接半導體裝置103N成為N極構造之逆座之構造。 圖4B所示之無二次焊接半導體裝置103N如以上所示,因相對於圖4A所示之無二次焊接半導體裝置103P,除內置封裝53N與內置封裝53P之構造之關係成為反轉之關係以外同樣,故省略其他重複之說明。 Therefore, the semiconductor device 103P without secondary soldering shown in FIG. 4A has a positive seat structure of the P pole structure, while the semiconductor device 103N without secondary soldering shown in FIG. 4B has a reverse seat structure of the N pole structure. The non-re-soldering semiconductor device 103N shown in FIG. 4B is as described above. Compared with the non-re-soldering semiconductor device 103P shown in FIG. 4A , the relationship between the structures of the built-in package 53N and the built-in package 53P is reversed. Everything else is the same, so other repeated explanations are omitted.

<第3實施形態之總括> 於圖4B中,意圖將圖4A所示之內置封裝53P反轉作為內置封裝53N使用。 又,將內置封裝53P、內置封裝53N分別以灌封樹脂進行樹脂密封並使用。 於圖4A中,期望平板16A(第1導體)與平板16B(第2導體)之形狀之尺寸相同。 若平板16A(第1導體)與平板16B(第2導體)之形狀之尺寸相同,則藉由將內置封裝53P於上下方向上反轉,而成為圖4B之內置封裝53N。 <Overview of the third embodiment> In FIG. 4B , the built-in package 53P shown in FIG. 4A is intended to be inverted and used as a built-in package 53N. Furthermore, the built-in package 53P and the built-in package 53N are respectively sealed with potting resin and used. In FIG. 4A , it is desirable that the shapes and dimensions of the flat plate 16A (the first conductor) and the flat plate 16B (the second conductor) are the same. If the shape and size of the flat plate 16A (first conductor) and the flat plate 16B (second conductor) are the same, the built-in package 53P is inverted in the up-down direction to form the built-in package 53N in FIG. 4B .

另,於內置封裝53P於上下方向上反轉時,平板16A與平板16B分別相當於圖4B之平板16C與平板16D。又,於圖4A與圖4B中,若於控制IC晶片10、電容器13、功率半導體晶片7、源極塊11使用共通之零件,則可使內置封裝53P與內置封裝53N共用化。 藉由以上之圖4A與圖4B所示之構造,可製作、製造正座即P極構造與逆座即N極構造之無二次焊接半導體裝置。 In addition, when the built-in package 53P is inverted in the up-down direction, the flat plate 16A and the flat plate 16B are respectively equivalent to the flat plate 16C and the flat plate 16D in FIG. 4B. Furthermore, in FIGS. 4A and 4B , if common components are used for the control IC chip 10 , the capacitor 13 , the power semiconductor chip 7 , and the source block 11 , the built-in package 53P and the built-in package 53N can be shared. With the structures shown in FIGS. 4A and 4B , a semiconductor device without secondary soldering can be fabricated and manufactured with a positive seat (P-pole structure) and a reverse seat (N-pole structure).

另,圖4A所示之正座即P極構造之無二次焊接半導體裝置103P、與圖4B所示之逆座即N極構造之無二次焊接半導體裝置103N雖亦例如作為整流元件單獨使用,但可將P極構造之無二次焊接半導體裝置103P與N極構造之無二次焊接半導體裝置103N複數個組合而構成各種電路。例如,亦可構成將三相交流轉換為直流之電路。In addition, although the semiconductor device 103P with no secondary soldering in the positive seat or P-pole structure shown in FIG. 4A and the semiconductor device 103N without secondary soldering in the reverse seat or N-pole structure shown in FIG. 4B can be used individually as rectifying elements, for example, However, multiple combinations of the P-pole structure-free secondary soldering semiconductor device 103P and the N-pole structure-free secondary soldering semiconductor device 103N can be used to form various circuits. For example, a circuit that converts three-phase AC into DC can also be constructed.

<第3實施形態之效果> 於第3實施形態中,構成使用內置封裝53P之P極構造之無二次焊接半導體裝置103P、與使用內置封裝53N之N極構造之無二次焊接半導體裝置103N。 該等內置封裝53P與內置封裝53N實質上為相同之零件,且藉由上下反轉使用,可構成正座與逆座之兩個無二次焊接半導體裝置(103P、103N)。因此,可減少製造成本。 <Effects of the third embodiment> In the third embodiment, a P-electrode-free semiconductor device 103P using a built-in package 53P and a N-pole-free semiconductor device 103N using a built-in package 53N are configured. The built-in package 53P and the built-in package 53N are essentially the same parts, and by being flipped up and down, they can form two semiconductor devices (103P, 103N) in the upright and reverse seats without secondary soldering. Therefore, manufacturing costs can be reduced.

又,因第3實施形態之兩個無二次焊接半導體裝置(103P、103N)使用利用樹脂外殼20之灌封方式,故有樹脂密封之步驟可簡化之效果。 又,無二次焊接半導體裝置(103P、103N)均實現於一次焊接接合後,無需二次焊接接合之無二次焊接之構造,可提供能夠容易地進行伴隨焊接步驟之材料選定或製作條件選擇之無二次焊接半導體裝置。 In addition, since the two semiconductor devices (103P and 103N) without secondary soldering in the third embodiment use the potting method using the resin case 20, the resin sealing step can be simplified. In addition, the secondary soldering-free semiconductor device (103P, 103N) is realized with a secondary soldering-free structure that does not require secondary soldering after a primary soldering joint, and can provide a material selection or manufacturing condition selection accompanying the soldering step that can be easily performed No secondary soldering of semiconductor devices.

≪第4實施形態≫ 參照圖5A與圖5B說明本發明之第4實施形態之無二次焊接半導體裝置之構成。 圖5A係模式性顯示使用本發明之第4實施形態之無二次焊接半導體裝置104P之轉移模具之情形之P極構造之剖面構造之一例的圖。 圖5B係模式性顯示使用本發明之第4實施形態之無二次焊接半導體裝置104N之轉移模具之情形之N極構造之剖面構造之一例的圖。 ≪Fourth Embodiment≫ The structure of the secondary soldering-free semiconductor device according to the fourth embodiment of the present invention will be described with reference to FIGS. 5A and 5B. FIG. 5A is a diagram schematically showing an example of the cross-sectional structure of the P-pole structure in the case of using the transfer mold of the non-secondary soldering semiconductor device 104P according to the fourth embodiment of the present invention. FIG. 5B is a diagram schematically showing an example of the cross-sectional structure of the N-pole structure in the case of using the transfer mold of the non-secondary soldering semiconductor device 104N according to the fourth embodiment of the present invention.

於圖5A中,與圖4A不同者在於,內置封裝54P之樹脂密封之方式。 於圖5A中,藉由轉移成形之方法,進行內置封裝54P之樹脂密封。即,使用射出成形之鑄模使樹脂6流入內置封裝54P之周圍。且,為樹脂6硬化後,去除鑄模之方法。 於圖5A中,樹脂6之形狀對應於鑄模之內部之空洞之形狀。 藉由如此以密封樹脂6密封內置封裝54P,可確保絕緣性與耐久性。又,於圖5A之無二次焊接半導體裝置104P中無需圖4A之樹脂外殼20。 In FIG. 5A , the difference from FIG. 4A lies in the resin sealing method of the built-in package 54P. In FIG. 5A , the built-in package 54P is resin sealed by transfer molding. That is, an injection molding mold is used to cause the resin 6 to flow around the built-in package 54P. Moreover, it is a method of removing the mold after the resin 6 is hardened. In Figure 5A, the shape of the resin 6 corresponds to the shape of the cavity inside the mold. By thus sealing the built-in package 54P with the sealing resin 6, insulation and durability can be ensured. In addition, the resin case 20 of FIG. 4A is not required in the non-secondary soldering semiconductor device 104P of FIG. 5A.

圖5B係模式性顯示使用本發明之第4實施形態之轉移模具之無二次焊接半導體裝置104N之N極構造之剖面構造之一例的圖。 於圖5B中,與圖5A之不同者在於,內置封裝54N與內置封裝54P之關係。 即,於圖5B中,於連接於引線4之平板16C,搭載功率半導體晶片7與控制IC晶片10與電容器13。另一方面,於連接於盤片2之平板16D,連接有源極塊11。 即,圖5B之平板16C與平板16D之關係對應於圖5A之平板16A與平板16B之關係。即,於連接於引線4與盤片2之關係中,於內置封裝54N與內置封裝54P之關係中,成為反轉之關係。 FIG. 5B is a diagram schematically showing an example of the cross-sectional structure of the N-pole structure of the non-secondary soldering semiconductor device 104N using the transfer mold according to the fourth embodiment of the present invention. In FIG. 5B , the difference from FIG. 5A lies in the relationship between the built-in package 54N and the built-in package 54P. That is, in FIG. 5B , the power semiconductor chip 7 , the control IC chip 10 and the capacitor 13 are mounted on the flat plate 16C connected to the lead 4 . On the other hand, the source block 11 is connected to the flat plate 16D connected to the disk 2 . That is, the relationship between the flat plates 16C and 16D of FIG. 5B corresponds to the relationship between the flat plates 16A and 16B of FIG. 5A. That is, the relationship between the lead 4 and the disk 2 and the relationship between the built-in package 54N and the built-in package 54P are inverted.

即,圖5A所示之無二次焊接半導體裝置104P為P極構造之正座之構造,對此圖5B所示之無二次焊接半導體裝置104N成為N極構造之逆座之構造。 圖5B所示之無二次焊接半導體裝置104N如以上所示,因相對於圖5A所示之無二次焊接半導體裝置104P,除內置封裝54N與內置封裝54P之構造之關係成為反轉之關係以外同樣,故省略其他重複之說明。 That is, the semiconductor device 104P without secondary soldering shown in FIG. 5A has a positive seat structure of the P pole structure, while the semiconductor device 104N without secondary soldering shown in FIG. 5B has a reverse seat structure of the N pole structure. The non-re-soldering semiconductor device 104N shown in FIG. 5B is as described above. Compared with the non-re-soldering semiconductor device 104P shown in FIG. 5A , the relationship between the structures of the built-in package 54N and the built-in package 54P is reversed. Everything else is the same, so other repeated explanations are omitted.

<第4實施形態之效果> 於第4實施形態中,構成使用內置封裝54P之P極構造之無二次焊接半導體裝置104P、與使用內置封裝54N之N極構造之無二次焊接半導體裝置104N。 該等內置封裝54P與內置封裝54N實質上為相同之零件,且藉由上下反轉使用,可構成正座與逆座之兩個無二次焊接半導體裝置(104P、104N)。因此,可減少製造成本。 又,第4實施形態之兩個無二次焊接半導體裝置(104P、104N)因由轉移模具進行樹脂密封,故有無需灌封方式之樹脂外殼,並可減少材料成本之效果。 又,可實現無需二次焊接接合之無二次焊接之構造,提供可容易進行伴隨焊接步驟之材料選定或製作條件選擇之無二次焊接半導體裝置。 <Effects of the fourth embodiment> In the fourth embodiment, a P-electrode-free semiconductor device 104P using a built-in package 54P and a N-pole-free semiconductor device 104N using a built-in package 54N are configured. The built-in package 54P and the built-in package 54N are essentially the same parts, and by being flipped up and down, they can form two semiconductor devices (104P and 104N) in the upright and reverse seats without secondary soldering. Therefore, manufacturing costs can be reduced. In addition, since the two non-re-soldering semiconductor devices (104P and 104N) of the fourth embodiment are resin-sealed using a transfer mold, there is no need for potting resin casings and the material cost can be reduced. In addition, a re-soldering-free structure that does not require re-soldering bonding can be realized, and a re-soldering-free semiconductor device can be provided in which material selection or manufacturing condition selection accompanying the soldering step can be easily performed.

≪第5實施形態≫ 參照圖6A與圖6B說明本發明之第5實施形態之無二次焊接半導體裝置104P與鰭片21F之構成。 圖6A係顯示本發明之第5實施形態之無二次焊接半導體裝置104P與鰭片21F之構造關係之一例之圖。 圖6A之無二次焊接半導體裝置104P係與第4實施形態之圖5A之無二次焊接半導體裝置104P相同之構成。適當省略關於無二次焊接半導體裝置104P之重複之說明。又,本實施形態所使用之無二次焊接半導體裝置不限定於第4實施形態者,亦可使用第1實施形態至第3實施形態者。 ≪Fifth Embodiment≫ The structure of the secondary soldering-free semiconductor device 104P and the fin 21F according to the fifth embodiment of the present invention will be described with reference to FIGS. 6A and 6B. FIG. 6A is a diagram showing an example of the structural relationship between the secondary soldering-free semiconductor device 104P and the fin 21F according to the fifth embodiment of the present invention. The non-re-soldering semiconductor device 104P of FIG. 6A has the same structure as the non-re-soldering semiconductor device 104P of FIG. 5A in the fourth embodiment. Repeated description of the non-secondary soldering semiconductor device 104P is appropriately omitted. In addition, the secondary soldering-free semiconductor device used in this embodiment is not limited to the fourth embodiment, and the first to third embodiments can also be used.

於圖6A中,無二次焊接半導體裝置104P之盤片2(第3導體)壓入、嵌合於鰭片21F(第4導體)之間(孔)。 另,盤片2(第3導體)因壓入、嵌合(壓接配合)於鰭片21F(第4導體)之間(孔),藉由此時之過盈產生之復原力,進行接觸、通電。因此,於將盤片2(第3導體)固定於鰭片21F(第4導體)時,無需例如焊接(soldering)等作業,有助於環境負荷之減少與製造成本之減少。 又,藉由該構造,無二次焊接半導體裝置104P被固定,且無二次焊接半導體裝置104P所產生之熱傳遞至鰭片21F,進行散熱,藉此可確保無二次焊接半導體裝置104P正常動作之溫度範圍。 In FIG. 6A , the disk 2 (third conductor) of the non-secondary soldering semiconductor device 104P is pressed and fitted between the fins 21F (the fourth conductor) (holes). In addition, the disc 2 (third conductor) is press-fitted and fitted (press-fitted) between the fins 21F (fourth conductor) (holes), and the contact is made by the restoring force generated by the interference at this time. , power on. Therefore, when the disk 2 (third conductor) is fixed to the fin 21F (the fourth conductor), operations such as soldering are not required, which contributes to reduction of environmental load and reduction of manufacturing costs. Furthermore, with this structure, the non-secondary soldering semiconductor device 104P is fixed, and the heat generated by the non-secondary soldering semiconductor device 104P is transferred to the fins 21F for heat dissipation, thereby ensuring that the normal operation of the non-secondary soldering semiconductor device 104P is ensured. Operating temperature range.

圖6B係顯示自上表面(引線4至盤片2之方向)觀察馬蹄形之鰭片(散熱鰭片)21F之構造之一例之圖。 於圖6B中,於構成為馬蹄形之散熱用之鰭片21F,設置壓入複數個無二次焊接半導體裝置104P之孔(鰭片空隙部)2H。 於圖6A中,於鰭片21F之間,以夾著無二次焊接半導體裝置104P之盤片2之方式進行表述,但實際上,如圖6B所示,於一個孔2H,壓入、嵌合一個無二次焊接半導體裝置104P。 FIG. 6B is a diagram showing an example of the structure of the horseshoe-shaped fin (radiation fin) 21F viewed from the upper surface (the direction from the lead 4 to the disk 2). In FIG. 6B , the fins 21F for heat dissipation configured in a horseshoe shape are provided with holes (fin gaps) 2H into which a plurality of non-secondary soldering semiconductor devices 104P are pressed. In FIG. 6A , the disk 2 without secondary soldering semiconductor device 104P is described as being sandwiched between the fins 21F. However, in fact, as shown in FIG. 6B , a hole 2H is pressed and embedded. Combined into one semiconductor device 104P without secondary soldering.

如圖6B所示,於鰭片21F,設置複數個孔(鰭片空隙部)2H,複數個無二次焊接半導體裝置104P壓入各者之孔2H。 又,構成為馬蹄形之散熱用之鰭片21F由例如發電機即交流發電機(未圖示)具備。鰭片21F作為例如馬蹄形之形狀顯示之原因在於,適合安裝於交流發電機。 As shown in FIG. 6B , a plurality of holes (fin gaps) 2H are provided in the fin 21F, and a plurality of secondary soldering-free semiconductor devices 104P are pressed into the respective holes 2H. In addition, the heat dissipation fins 21F configured in a horseshoe shape are provided by, for example, an alternator (not shown) that is a generator. The reason why the fin 21F is shown in the shape of, for example, a horseshoe shape is that it is suitable for mounting on an alternator.

<第5實施形態之效果> 如圖6A、圖6B所示,設為將無二次焊接半導體裝置104P之盤片2壓入鰭片21F之間之構造。藉由該構造,無二次焊接半導體裝置104P被固定,且有可將由無二次焊接半導體裝置104P產生之熱傳遞至鰭片21F進行散熱,並確保正常動作之溫度範圍之效果。 <Effects of the fifth embodiment> As shown in FIGS. 6A and 6B , the disk 2 of the non-secondary soldering semiconductor device 104P is pressed between the fins 21F. With this structure, the secondary soldering-free semiconductor device 104P is fixed, and the heat generated by the secondary soldering-free semiconductor device 104P can be transferred to the fins 21F for heat dissipation, thereby ensuring a temperature range for normal operation.

≪第6實施形態≫ 參照圖7A與圖7B說明本發明之第6實施形態之無二次焊接半導體裝置105P與鰭片21之構成。 圖7A係模式性顯示本發明之第6實施形態之無二次焊接半導體裝置105與鰭片(散熱鰭片)21之剖面構造之一例之圖。 於圖7A中,與圖3A不同者在於,取代盤片2,具備鰭片(散熱鰭片)21。且,將內置封裝55直接固定於鰭片21。 即,取代圖3A之盤片2,於圖7A中使用鰭片21。因此,適當將鰭片21表述為第3導體。 因圖7A之其他構成與圖3A同樣,故省略重複之說明。 ≪Sixth Embodiment≫ The structure of the secondary soldering-free semiconductor device 105P and the fin 21 according to the sixth embodiment of the present invention will be described with reference to FIGS. 7A and 7B. FIG. 7A is a diagram schematically showing an example of the cross-sectional structure of the non-secondary soldering semiconductor device 105 and the fins (radiating fins) 21 according to the sixth embodiment of the present invention. In FIG. 7A , the difference from FIG. 3A lies in that fins (heat dissipation fins) 21 are provided instead of the disk 2 . Furthermore, the built-in package 55 is directly fixed to the fin 21 . That is, instead of the disk 2 in FIG. 3A, the fins 21 are used in FIG. 7A. Therefore, the fin 21 is appropriately expressed as the third conductor. Since other components of FIG. 7A are the same as those of FIG. 3A , repeated descriptions are omitted.

圖7A之鰭片21具備收納平板16A之下部(紙面視角)之一部分之凹部、與螺孔19。 將平板16A收納於鰭片21之凹部,通過螺桿17於螺孔19固定鰭片21與平板16A。 於圖7A中,藉由使用鰭片(散熱鰭片)21,容易使自內置封裝55產生之熱散熱。 另,鰭片21(第3導體)係具備無二次焊接半導體裝置105者,即構成無二次焊接半導體裝置105之零件。 The fin 21 in FIG. 7A is provided with a recessed portion for receiving a part of the lower part of the flat plate 16A (paper perspective), and a screw hole 19 . Receive the flat plate 16A in the recess of the fin 21, and fix the fin 21 and the flat plate 16A in the screw hole 19 through the screw rod 17. In FIG. 7A , the heat generated from the built-in package 55 can be easily dissipated by using fins (radiating fins) 21 . In addition, the fin 21 (third conductor) is provided with the secondary soldering-free semiconductor device 105, that is, it constitutes a component of the secondary soldering-free semiconductor device 105.

圖7B係顯示自上表面(引線4至鰭片21之方向)觀察馬蹄形之鰭片(散熱鰭片)21之構造之一例之圖。 於圖7B中,鰭片(散熱鰭片)21亦稱為無二次焊接半導體裝置105具備者,且供複數個無二次焊接半導體裝置105共用之構造。 又,於圖7B中,顯示複數個無二次焊接半導體裝置105搭載於共用之鰭片(散熱鰭片)21之構造。另,無二次焊接半導體裝置105之內置封裝55實際上樹脂密封,以斑點狀之圓表述其狀況。又,圖7B之無二次焊接半導體裝置105之中央之白色圓所表述者顯示圖7A之引線4。 另,圖7B之散熱用之鰭片21與圖6B所示之鰭片21F同樣,由例如發電機即交流發電機(未圖示)具備。鰭片21作為例如馬蹄形之形狀顯示之原因在於,適合安裝於交流發電機。 FIG. 7B is a diagram showing an example of the structure of the horseshoe-shaped fin (heat dissipation fin) 21 viewed from the upper surface (the direction from the lead 4 to the fin 21 ). In FIG. 7B , the fins (heat dissipation fins) 21 are also referred to as those provided by the secondary soldering-free semiconductor device 105 , and are a structure shared by a plurality of secondary soldering-free semiconductor devices 105 . In addition, FIG. 7B shows a structure in which a plurality of non-secondary soldering semiconductor devices 105 are mounted on a common fin (heat dissipation fin) 21. In addition, the built-in package 55 of the non-secondary soldering semiconductor device 105 is actually sealed with resin, and its condition is represented by a spotted circle. In addition, the white circle in the center of the non-secondary soldering semiconductor device 105 in FIG. 7B shows the lead 4 in FIG. 7A. In addition, the fins 21 for heat dissipation in FIG. 7B are provided by, for example, an alternator (not shown) that is a generator, like the fins 21F shown in FIG. 6B . The reason why the fins 21 are shown in a horseshoe shape, for example, is that they are suitable for being mounted on an alternator.

<第6實施形態之效果> 因本發明之第6實施形態之無二次焊接半導體裝置105成為具備鰭片(散熱鰭片)21之構成,故有無二次焊接半導體裝置105所產生之熱藉由鰭片21,迅速散熱之效果。又,無二次焊接半導體裝置105藉由鰭片21之散熱,可期待穩定之動作。 <Effects of the sixth embodiment> Since the non-resoldering semiconductor device 105 according to the sixth embodiment of the present invention is configured to include fins (radiating fins) 21, the heat generated by the non-resoldering semiconductor device 105 can be quickly dissipated through the fins 21. Effect. In addition, the semiconductor device 105 without secondary soldering can be expected to operate stably by dissipating heat through the fins 21 .

≪第7實施形態≫ 參照圖8A與圖8B說明本發明之第7實施形態之無二次焊接半導體裝置之構成。 圖8A係模式性顯示本發明之第7實施形態之無二次焊接半導體裝置106P之P極構造之剖面構造之一例的圖。 圖8A之無二次焊接半導體裝置106P係以鰭片(散熱鰭片)21置換圖4A所示之無二次焊接半導體裝置103P之盤片2者。且,以螺桿17於鰭片21固定內置封裝56P。 ≪Seventh Embodiment≫ The structure of a semiconductor device without secondary soldering according to the seventh embodiment of the present invention will be described with reference to FIGS. 8A and 8B. FIG. 8A is a diagram schematically showing an example of the cross-sectional structure of the P-electrode structure of the non-secondary soldering semiconductor device 106P according to the seventh embodiment of the present invention. The semiconductor device 106P without secondary soldering in FIG. 8A is replaced with the disk 2 of the semiconductor device 103P without secondary soldering shown in FIG. 4A with fins (heat dissipation fins) 21 . Furthermore, the built-in package 56P is fixed on the fin 21 with the screw 17 .

又,圖8A之無二次焊接半導體裝置106P亦為相對於圖7A之無二次焊接半導體裝置105,以樹脂外殼20覆蓋,以灌封樹脂(密封樹脂6)進行樹脂密封之構造。因此,內置封裝56P直接固定於鰭片21。 因其他構造同樣故省略重複之說明。 In addition, the non-re-soldering semiconductor device 106P of FIG. 8A is also a structure in which the non-re-soldering semiconductor device 105 of FIG. 7A is covered with a resin case 20 and resin-sealed with a potting resin (sealing resin 6). Therefore, the built-in package 56P is directly fixed to the fin 21 . Since other structures are the same, repeated explanations are omitted.

圖8B係模式性顯示本發明之第7實施形態之無二次焊接半導體裝置106N之N極構造之剖面構造之一例的圖。 圖8B之無二次焊接半導體裝置106N係以鰭片(散熱鰭片)21置換圖4B所示之無二次焊接半導體裝置103N之盤片2者。 因其他構造同樣故適當省略重複之說明。 FIG. 8B is a diagram schematically showing an example of the cross-sectional structure of the N-pole structure of the non-secondary soldering semiconductor device 106N according to the seventh embodiment of the present invention. The semiconductor device 106N without secondary soldering shown in FIG. 8B uses fins (heat sink fins) 21 to replace the disk 2 of the semiconductor device 103N without secondary soldering shown in FIG. 4B . Since other structures are the same, repeated explanations are appropriately omitted.

因圖8A、圖8B之無二次焊接半導體裝置106P、106N具備鰭片(散熱鰭片)21,故有迅速散熱之效果。 又,無二次焊接半導體裝置106P、106N分別構成正座之P極構造、與逆座之N極構造。 Since the non-secondary soldering semiconductor devices 106P and 106N of FIGS. 8A and 8B are equipped with fins (heat dissipation fins) 21, they have the effect of rapid heat dissipation. In addition, the non-secondary welding semiconductor devices 106P and 106N respectively constitute a positive P pole structure and a reverse N pole structure.

<第7實施形態之效果> 第7實施形態之無二次焊接半導體裝置106P、106N因具備鰭片21,故有迅速散熱之效果。又,無二次焊接半導體裝置106P、106N藉由鰭片21之散熱,可期待穩定之動作。 <Effects of the seventh embodiment> Since the non-secondary soldering semiconductor devices 106P and 106N of the seventh embodiment are provided with fins 21, they have the effect of rapid heat dissipation. In addition, the semiconductor devices 106P and 106N without secondary soldering can be expected to operate stably by dissipating heat through the fins 21 .

≪第8實施形態≫ 參照圖9A與圖9B說明本發明之第8實施形態之無二次焊接半導體裝置之構成。 圖9A係模式性顯示本發明之第8實施形態之無二次焊接半導體裝置107P之P極構造之剖面構造之一例的圖。 圖9A之無二次焊接半導體裝置107P取代使用圖8A所示之無二次焊接半導體裝置106P中之樹脂外殼20與樹脂6以灌封樹脂方式構成,使用於內置封裝56P使用射出成形之鑄模於內置封裝56P之周圍流入樹脂6之轉移成形之方法。 因其他構造同樣,故省略重複之說明。 ≪Eighth Embodiment≫ The structure of the secondary soldering-free semiconductor device according to the eighth embodiment of the present invention will be described with reference to FIGS. 9A and 9B. FIG. 9A is a diagram schematically showing an example of the cross-sectional structure of the P-electrode structure of the non-secondary soldering semiconductor device 107P according to the eighth embodiment of the present invention. The non-secondary soldering semiconductor device 107P of FIG. 9A replaces the resin case 20 and the resin 6 in the non-secondary soldering semiconductor device 106P shown in FIG. 8A by potting resin, and uses an injection molding mold for the built-in package 56P. A transfer molding method in which resin 6 is poured into the surroundings of the built-in package 56P. Since other structures are the same, repeated explanations are omitted.

圖9B係模式性顯示本發明之第8實施形態之無二次焊接半導體裝置107N之N極構造之剖面構造之一例的圖。 圖9B之無二次焊接半導體裝置107N係取代圖9A之P極構造之無二次焊接半導體裝置107P之內置封裝56P,藉由使用N極構造之內置封裝56N,構成N極構造之無二次焊接半導體裝置107N者。 因其他構造同樣故省略重複之說明。 FIG. 9B is a diagram schematically showing an example of the cross-sectional structure of the N-pole structure of the non-secondary soldering semiconductor device 107N according to the eighth embodiment of the present invention. The non-secondary soldering semiconductor device 107N of FIG. 9B is a built-in package 56P of the non-secondary soldering semiconductor device 107P of the P-pole structure in FIG. 9A. By using the built-in package 56N of the N-pole structure, the N-pole structure is formed without secondary soldering. The semiconductor device 107N is soldered. Since other structures are the same, repeated explanations are omitted.

<第8實施形態之效果> 第8實施形態之圖9A、圖9B之無二次焊接半導體裝置107P、107N因具備鰭片21,故有迅速散熱之效果。又,無二次焊接半導體裝置107P、107N藉由鰭片21之散熱,可期待穩定之動作。 <Effects of the 8th Embodiment> The non-secondary soldering semiconductor devices 107P and 107N shown in FIGS. 9A and 9B of the eighth embodiment are equipped with fins 21, so they have the effect of rapid heat dissipation. In addition, the semiconductor devices 107P and 107N without secondary soldering can be expected to operate stably by dissipating heat through the fins 21 .

≪第9實施形態≫ 參照圖10說明本發明之第9實施形態之無二次焊接半導體裝置111之構成。 圖10係模式性顯示本發明之第9實施形態之無二次焊接半導體裝置111之剖面構造之一例之圖。 於圖10中,作為部分組裝零件(Sub-assembly:子組件)61,將電路收納於功率半導體晶片22而構成。 ≪Ninth Embodiment≫ The structure of the secondary soldering-free semiconductor device 111 according to the ninth embodiment of the present invention will be described with reference to FIG. 10 . FIG. 10 is a diagram schematically showing an example of the cross-sectional structure of the secondary soldering-free semiconductor device 111 according to the ninth embodiment of the present invention. In FIG. 10 , a circuit is accommodated in a power semiconductor chip 22 as a sub-assembly 61 .

即,於圖10中,由功率半導體晶片22之1晶片構成例如圖1A之功率半導體晶片7、控制IC晶片10、電容器13等電路要件,作為部分組裝零件(Sub-assembly)61使用。 另,於圖10中,省略顯示填充於部分組裝零件(Sub-assembly)61之內部之樹脂(例如稍後敘述之圖12、圖13之樹脂6)之記載。 That is, in FIG. 10 , circuit components such as the power semiconductor chip 7 in FIG. 1A , the control IC chip 10 , and the capacitor 13 are composed of one of the power semiconductor chips 22 , and are used as a sub-assembly 61 . In addition, in FIG. 10 , the description of the resin filled in the interior of the sub-assembly 61 (for example, the resin 6 in FIGS. 12 and 13 to be described later) is omitted.

於圖10中,如上所述,例如圖1A之功率半導體晶片7、控制IC晶片10、電容器13等電路要件、及導電性接合材9、接合線14、絕緣膜18等之各步驟於圖10中由功率半導體晶片22之1個晶片構成,設為部分組裝零件(Sub-assembly)61,藉此無二次焊接半導體裝置111之構成簡化,可提供小型且減少成本之無二次焊接半導體裝置。In FIG. 10 , as mentioned above, for example, the circuit components such as the power semiconductor chip 7 , the control IC chip 10 , and the capacitor 13 in FIG. 1A , as well as the conductive bonding material 9 , the bonding wire 14 , the insulating film 18 , etc. are shown in each step in FIG. 10 It is composed of one wafer of the power semiconductor chip 22 and is used as a sub-assembly 61, thereby simplifying the structure of the secondary soldering-free semiconductor device 111 and providing a compact and cost-reduced secondary soldering-free semiconductor device. .

<第9實施形態之效果> 藉由無二次焊接半導體裝置111之構成簡化,可提供小型且減少成本之無二次焊接半導體裝置。 <Effects of the ninth embodiment> By simplifying the structure of the secondary soldering-free semiconductor device 111, a compact and cost-reduced secondary soldering-free semiconductor device can be provided.

≪第10實施形態≫ 參照圖11說明本發明之第10實施形態之無二次焊接半導體裝置112之構成。 圖11係模式性顯示本發明之第10實施形態之無二次焊接半導體裝置112之剖面構造之一例之圖。 於圖11中,取代圖10之盤片2,使用鰭片(散熱鰭片)21。適當省略其他重複之說明。 於圖11中,藉由使用鰭片(散熱鰭片)21,除簡化圖10所示之無二次焊接半導體裝置111之構成以外,有迅速散熱之效果。 ≪Tenth Embodiment≫ The structure of the secondary soldering-free semiconductor device 112 according to the tenth embodiment of the present invention will be described with reference to FIG. 11 . FIG. 11 is a diagram schematically showing an example of the cross-sectional structure of the secondary soldering-free semiconductor device 112 according to the tenth embodiment of the present invention. In FIG. 11 , fins (cooling fins) 21 are used instead of the disk 2 in FIG. 10 . Other repetitive descriptions are appropriately omitted. In FIG. 11 , by using fins (heat dissipation fins) 21 , in addition to simplifying the structure of the semiconductor device 111 without secondary soldering shown in FIG. 10 , there is an effect of rapid heat dissipation.

<第10實施形態之效果> 藉由無二次焊接半導體裝置112之構成簡化,可提供小型且減少成本且散熱性優異之無二次焊接半導體裝置。 <Effects of the 10th Embodiment> By simplifying the structure of the secondary soldering-free semiconductor device 112, a compact and cost-reduced semiconductor device without secondary soldering and excellent heat dissipation can be provided.

≪第11實施形態≫ 參照圖12說明本發明之第11實施形態之無二次焊接半導體裝置之構成。 圖12係模式性顯示本發明之第11實施形態之無二次焊接半導體裝置113之剖面構造之一例之圖。 圖12所示之無二次焊接半導體裝置113係將圖10所示之無二次焊接半導體裝置111使用圖4A所示之樹脂外殼20,自樹脂外殼20之外部注入(灌封)樹脂(resin)6者。 ≪Eleventh Embodiment≫ The structure of the secondary soldering-free semiconductor device according to the eleventh embodiment of the present invention will be described with reference to FIG. 12 . FIG. 12 is a diagram schematically showing an example of the cross-sectional structure of the secondary soldering-free semiconductor device 113 according to the eleventh embodiment of the present invention. The non-re-soldering semiconductor device 113 shown in FIG. 12 is the re-soldering-free semiconductor device 111 shown in FIG. 10 using the resin case 20 shown in FIG. 4A, and resin (resin) is injected (potted) from the outside of the resin case 20. )6.

於圖12中,使用部分組裝零件(Sub-assembly)61與樹脂外殼20,以灌封樹脂構成無二次焊接半導體裝置113。如此,實現由功率半導體晶片22之1個晶片構成,作為部分組裝零件(Sub-assembly)61,使用樹脂外殼20進行樹脂密封之無二次焊接半導體裝置113。In FIG. 12 , a sub-assembly 61 and a resin casing 20 are used to form a non-secondary soldering semiconductor device 113 by potting resin. In this way, the semiconductor device 113 without secondary soldering, which is composed of one wafer of the power semiconductor wafer 22 and is resin-sealed using the resin case 20 as the sub-assembly 61, is realized.

又,於圖12中,使用1個晶片之功率半導體晶片22,但該功率半導體晶片22具備與藉由圖1A之功率半導體晶片7、控制IC晶片10、電容器13等之電路要件、及導電性接合材9、接合線14、絕緣膜18等之各步驟實現之電路相當之電路構成。 又,於功率半導體晶片22之兩個主表面,具備向功率半導體晶片22之內部之電路連接之兩個電極。且,藉由該等兩個電極,以決定功率半導體晶片22之例如整流特性之方式進行電路構成。因此,於組裝功率半導體晶片22時,藉由使功率半導體晶片22之兩個主表面之正反反轉,而成為均可實現P極構造或N極構造之構成。 In addition, in FIG. 12 , a single power semiconductor chip 22 is used. However, the power semiconductor chip 22 has the same circuit elements and conductivity as the power semiconductor chip 7 of FIG. 1A , the control IC chip 10 , the capacitor 13 , etc. The circuit implemented by each step of the bonding material 9, the bonding wire 14, the insulating film 18, etc. corresponds to the circuit structure. In addition, two main surfaces of the power semiconductor chip 22 are provided with two electrodes connected to the circuit inside the power semiconductor chip 22 . Furthermore, these two electrodes are used to form a circuit in such a way as to determine, for example, the rectification characteristics of the power semiconductor chip 22 . Therefore, when assembling the power semiconductor chip 22, by inverting the front and back directions of the two main surfaces of the power semiconductor chip 22, it becomes possible to achieve a P-pole structure or an N-pole structure.

即,圖12所示之無二次焊接半導體裝置113除功率半導體晶片22以外之構造實質上相同,且藉由反轉功率半導體晶片22之正反,可製造P極構造與N極構造之2種無二次焊接半導體裝置。 且,P極構造與N極構造之2種無二次焊接半導體裝置作為例如整流元件單獨使用,亦可將P極構造與N極構造之無二次焊接半導體裝置(113)複數個組合且構成各種電路。 因此,可於製造步驟、零件管理步驟中減少成本。 That is, the structure of the non-secondary soldering semiconductor device 113 shown in FIG. 12 is essentially the same except for the power semiconductor chip 22, and by reversing the front and back of the power semiconductor chip 22, both the P-pole structure and the N-pole structure can be manufactured. A kind of semiconductor device without secondary soldering. Moreover, the two types of non-re-welding semiconductor devices (113) of P-pole structure and N-pole structure can be used individually as, for example, rectifier elements, or a plurality of P-pole structure and N-pole structure non-re-welding semiconductor devices (113) can be combined and constructed. Various circuits. Therefore, costs can be reduced in the manufacturing step and parts management step.

又,於圖12中,雖使用1個晶片之功率半導體晶片22,但與使用圖1A、圖4A、圖4B所示之內置封裝之構造之無二次焊接半導體裝置同樣,實現於一次焊接接合後,無需二次焊接接合之無二次焊接之構造。因此,可提供能夠容易進行伴隨焊接步驟之材料選定或製作條件選擇之無二次焊接半導體裝置。In addition, in FIG. 12 , although the power semiconductor chip 22 of one chip is used, the same as the semiconductor device without secondary soldering using the structure of the built-in package shown in FIGS. 1A , 4A and 4B , the single soldering joint is realized. Finally, there is no need for secondary welding to join the structure without secondary welding. Therefore, it is possible to provide a semiconductor device without secondary soldering in which material selection or manufacturing condition selection accompanying the soldering step can be easily performed.

<第11實施形態之效果> 藉由實現由功率半導體晶片22之1個晶片構成,作為部分組裝零件(Sub-assembly)61,使用樹脂外殼20進行樹脂密封之無二次焊接半導體裝置113,而簡化構成,藉此提供小型且減少成本之無二次焊接半導體裝置。 又,功率半導體晶片22以外之構造實質上相同,且因藉由於組裝功率半導體晶片22時使主表面之正反反轉,可製造P極構造與N極構造之2種無二次焊接半導體裝置,故有可於製造步驟、零件管理步驟中減少成本之效果。 <Effects of the 11th Embodiment> By realizing the semiconductor device 113 which is composed of one chip of the power semiconductor chip 22 and is resin-sealed as a sub-assembly 61 using the resin case 20 , the structure is simplified, thereby providing a compact and Reduce the cost of semiconductor devices without secondary soldering. In addition, the structures other than the power semiconductor wafer 22 are substantially the same, and by inverting the front and back of the main surface when assembling the power semiconductor wafer 22, two types of semiconductor devices with a P-pole structure and an N-pole structure can be manufactured without secondary soldering. , so it has the effect of reducing costs in the manufacturing steps and parts management steps.

又,雖使用1個晶片之功率半導體晶片22,但與使用內置封裝之構造之無二次焊接半導體裝置同樣,實現於一次焊接接合後,無需二次焊接接合之無二次焊接之構造。因此,可提供能夠容易進行伴隨焊接步驟之材料選定或製作條件選擇之無二次焊接半導體裝置。In addition, although one wafer of power semiconductor chip 22 is used, a structure without secondary soldering that eliminates the need for secondary soldering after primary soldering is achieved, similar to the non-secondary soldering semiconductor device using a built-in package structure. Therefore, it is possible to provide a semiconductor device without secondary soldering in which material selection or manufacturing condition selection accompanying the soldering step can be easily performed.

≪第12實施形態≫ 參照圖13說明本發明之第12實施形態之無二次焊接半導體裝置之構成。 圖13係模式性顯示本發明之第12實施形態之無二次焊接半導體裝置114之剖面構造之一例之圖。 圖13所示之無二次焊接半導體裝置114係藉由圖5A所示之轉移成形之方法,於圖10所示之無二次焊接半導體裝置111進行部分組裝零件(Sub-assembly)61之樹脂密封者。 於圖13中,由轉移成形之方法以部分組裝零件61構成無二次焊接半導體裝置114。省略其他重複之說明。 ≪Twelfth Embodiment≫ The structure of the secondary soldering-free semiconductor device according to the twelfth embodiment of the present invention will be described with reference to FIG. 13 . FIG. 13 is a diagram schematically showing an example of the cross-sectional structure of the secondary soldering-free semiconductor device 114 according to the twelfth embodiment of the present invention. The non-re-soldering semiconductor device 114 shown in FIG. 13 is a resin that partially assembles parts (Sub-assembly) 61 on the non-re-soldering semiconductor device 111 shown in FIG. 10 by the transfer molding method shown in FIG. 5A. Sealer. In FIG. 13 , a semiconductor device 114 without secondary welding is constructed from partially assembled parts 61 by a transfer forming method. Other repeated explanations are omitted.

<第12實施形態之效果> 圖13所示之第12實施形態與圖12所示之第11實施形態之不同者在於,樹脂密封之方法為轉移模具與灌封樹脂之差異,因而第12實施形態之效果與第11實施形態之效果大致同樣。省略重複之說明。 <Effects of the twelfth embodiment> The difference between the twelfth embodiment shown in Figure 13 and the eleventh embodiment shown in Figure 12 lies in the difference between the resin sealing method of transferring the mold and potting resin. Therefore, the effect of the twelfth embodiment is different from that of the eleventh embodiment. The effect is roughly the same. Repeated descriptions are omitted.

≪第13實施形態≫ 參照圖14說明本發明之第13實施形態之無二次焊接半導體裝置之構成。 圖14係模式性顯示本發明之第13實施形態之無二次焊接半導體裝置115之剖面構造之一例之圖。 圖14所示之無二次焊接半導體裝置115係將圖11所示之無二次焊接半導體裝置112使用圖4A所示之樹脂外殼20,自樹脂外殼20之外部注入(灌封)樹脂(Resin)6者。 ≪Thirteenth Embodiment≫ The structure of the secondary soldering-free semiconductor device according to the thirteenth embodiment of the present invention will be described with reference to FIG. 14 . FIG. 14 is a diagram schematically showing an example of the cross-sectional structure of the secondary soldering-free semiconductor device 115 according to the thirteenth embodiment of the present invention. The non-re-soldering semiconductor device 115 shown in FIG. 14 is the re-soldering-free semiconductor device 112 shown in FIG. 11 using the resin case 20 shown in FIG. 4A, and resin (Resin) is injected (potted) from the outside of the resin case 20. )6.

於圖14中,使用部分組裝零件(Sub-assembly)61與樹脂外殼20,以灌封樹脂構成無二次焊接半導體裝置115。如此,藉由實現由功率半導體晶片22之1個晶片構成,作為部分組裝零件61,使用樹脂外殼20進行樹脂密封之無二次焊接半導體裝置115,而簡化構成,藉此提供小型且減少成本,且有藉由鰭片(散熱鰭片)21,迅速散熱之效果之無二次焊接半導體裝置。 又,圖14所示之第13實施形態之無二次焊接半導體裝置115藉由於組裝功率半導體晶片22時進行正反反轉,而可製造P極構造與N極構造之2種無二次焊接半導體裝置。 In FIG. 14 , a sub-assembly 61 and a resin casing 20 are used to form a non-secondary soldering semiconductor device 115 by potting resin. In this way, by realizing the semiconductor device 115 that is composed of one chip of the power semiconductor chip 22 and is resin-sealed using the resin case 20 as the partially assembled component 61, the structure is simplified, thereby providing a compact and cost-effective device. Furthermore, the semiconductor device has the effect of rapid heat dissipation through the fins (heat dissipation fins) 21 without secondary soldering. In addition, the secondary soldering-free semiconductor device 115 of the thirteenth embodiment shown in FIG. 14 can produce two types of P-pole structure and N-pole structure without secondary soldering by inverting the forward and reverse directions when assembling the power semiconductor chip 22. Semiconductor devices.

<第13實施形態之效果> 藉由實現由功率半導體晶片22之1個晶片構成,作為部分組裝零件(Sub-assembly)61,使用樹脂外殼20進行樹脂密封之無二次焊接半導體裝置115,而簡化構成,藉此提供小型且減少成本,且有藉由鰭片(散熱鰭片)21,迅速散熱之效果之無二次焊接半導體裝置。 又,功率半導體晶片22以外之構造雖實質上相同,但因藉由於組裝功率半導體晶片22時進行正反反轉,可製造P極構造與N極構造之2種無二次焊接半導體裝置,故有可於製造步驟、零件管理步驟中減少成本之效果。 又,實現於一次焊接接合後,無需二次焊接接合之無二次焊接之構造,可提供能夠容易進行伴隨焊接步驟之材料選定或製作條件選擇之無二次焊接半導體裝置。 <Effects of the 13th Embodiment> By realizing the semiconductor device 115 without secondary soldering, which is composed of one chip of the power semiconductor chip 22 and is resin-sealed as a sub-assembly 61 using the resin case 20, the structure is simplified, thereby providing a compact and The cost is reduced and the semiconductor device has the effect of rapid heat dissipation through the fins (cooling fins) 21 without secondary soldering. In addition, although the structures other than the power semiconductor wafer 22 are substantially the same, by inverting the forward and reverse directions when assembling the power semiconductor wafer 22, two types of semiconductor devices with a P-pole structure and an N-pole structure can be manufactured without secondary soldering. It has the effect of reducing costs in the manufacturing process and parts management process. In addition, a secondary soldering-free structure that eliminates the need for secondary soldering after primary soldering can provide a secondary soldering-free semiconductor device that can easily select materials or manufacturing conditions associated with the soldering step.

≪第14實施形態≫ 參照圖15說明本發明之第14實施形態之無二次焊接半導體裝置之構成。 圖15係模式性顯示本發明之第14實施形態之無二次焊接半導體裝置116之剖面構造之一例之圖。 圖15所示之無二次焊接半導體裝置116係藉由圖5A所示之轉移成形之方法,於圖11所示之無二次焊接半導體裝置112進行部分組裝零件(Sub-assembly)61之樹脂密封者。省略其他重複之說明。 ≪Fourteenth Embodiment≫ The structure of the secondary soldering-free semiconductor device according to the fourteenth embodiment of the present invention will be described with reference to FIG. 15 . FIG. 15 is a diagram schematically showing an example of the cross-sectional structure of the secondary soldering-free semiconductor device 116 according to the fourteenth embodiment of the present invention. The non-re-soldering semiconductor device 116 shown in FIG. 15 is a resin for sub-assembly 61 of the non-re-soldering semiconductor device 112 shown in FIG. 11 by the transfer molding method shown in FIG. 5A. Sealer. Other repeated explanations are omitted.

<第14實施形態之效果> 圖15所示之第14實施形態與圖14所示之第13實施形態之不同者在於,樹脂密封之方法為轉移模具與灌封樹脂之差異,因而第14實施形態之效果與第13實施形態之效果大致同樣。省略重複之說明。 <Effects of the 14th Embodiment> The difference between the 14th embodiment shown in Figure 15 and the 13th embodiment shown in Figure 14 lies in the difference between the method of resin sealing being transfer mold and potting resin. Therefore, the effect of the 14th embodiment is different from that of the 13th embodiment. The effect is roughly the same. Repeated descriptions are omitted.

≪其他實施形態與補足≫ 另,本發明並非限定於以上說明之實施形態者,進而包含各種變化例。例如,上述實施形態係為容易理解說明本發明,而詳細說明者,並非限定於具備說明之所有構成者。又,可以其他實施形態之構成之一部分置換某實施形態之構成之一部分,進而亦可對某實施形態之構成施加其他實施形態之構成之一部分或全部。 以下,進而對其他實施形態或變化例進行說明。 ≪Other implementation forms and supplements≫ In addition, the present invention is not limited to the embodiment described above, and includes various modifications. For example, the above-mentioned embodiments are described in detail to facilitate understanding of the present invention, and are not limited to those having all the structures described. Furthermore, part of the configuration of a certain embodiment may be replaced with part of the configuration of another embodiment, and part or all of the configuration of another embodiment may be added to the configuration of a certain embodiment. Hereinafter, other embodiments or modifications will be described.

≪盤片與鰭片之固定方法≫ 例如,於將圖4A、圖4B、圖5A、圖5B之無二次焊接半導體裝置(103P、103N、104P、104N)之盤片2接合於未圖示之鰭片之情形時,內置封裝(53P、53N、54P、54N)之固定除相對於盤片2外,亦有於鰭片設置螺孔19,以螺桿構件(嵌合構件)17直接連接於鰭片之方法。 ≪How to fix discs and fins≫ For example, when the disk 2 of the non-secondary soldering semiconductor device (103P, 103N, 104P, 104N) of FIGS. 4A, 4B, 5A, and 5B is bonded to a fin (not shown), the built-in package ( 53P, 53N, 54P, 54N), in addition to being fixed relative to the disc 2, there is also a method of providing screw holes 19 in the fins and directly connecting the screw members (fitting members) 17 to the fins.

≪平板與引線、盤片間之固定方法≫ 平板與引線、或平板與盤片間之固定除螺桿(桿狀構件)與螺孔之組合外,亦可為桿(桿狀構件)與導電性接著材之組合、或插入型之引線端子(例如香蕉插頭)。 又,引線與平板之固定方法例如上述圖1C所示,亦可設為一體型。 ≪How to fix the plate to the leads and disks≫ In addition to the combination of screws (rod-shaped members) and screw holes, the fixation between the plate and the leads, or the plate and the disk, can also be a combination of a rod (rod-shaped member) and a conductive bonding material, or a plug-in lead terminal ( e.g. banana plug). In addition, the method for fixing the lead wires and the flat plate is as shown in the above-mentioned FIG. 1C, and may also be integrated.

≪功率半導體晶片≫ 於本發明之第1實施形態之說明中,說明以MOSFET構成功率半導體晶片7之例。然而不限定於MOSFET。 例如亦可由IGBT(Insulated Gate Bipolar Transistor:絕緣閘極雙極性電晶體)、超接面MOSFET、及其他半導體元件構成。 ≪Power semiconductor wafer≫ In the description of the first embodiment of the present invention, an example in which the power semiconductor chip 7 is composed of MOSFETs will be described. However, it is not limited to MOSFET. For example, it can also be composed of IGBT (Insulated Gate Bipolar Transistor), super junction MOSFET, and other semiconductor components.

≪P極構造與N極構造之無二次焊接半導體裝置之組合≫ 雖以構造之觀點分別說明P極構造之無二次焊接半導體裝置與N極構造之無二次焊接半導體裝置,但於使用複數個無二次焊接半導體裝置,構成特定之裝置之電路時,亦可使P極構造與N極構造之複數個無二次焊接半導體裝置組合構成。 ≪Combination of P-pole structure and N-pole structure without secondary soldering semiconductor device≫ Although the P-pole structure non-re-soldering semiconductor device and the N-pole structure non-re-soldering semiconductor device are respectively explained from the structural point of view, when a plurality of non-re-soldering semiconductor devices are used to form a circuit of a specific device, A plurality of semiconductor devices with P-pole structure and N-pole structure can be combined and constructed without secondary soldering.

≪鰭片之形狀≫ 於圖6B、圖7B中,例示鰭片21F、21之形狀作為馬蹄形。然而,鰭片之形狀不限定於馬蹄形。又,安裝鰭片者不限定於交流發電機。於使用複數個無二次焊接半導體裝置之用途中,鰭片之形狀、或安裝之對象亦可根據目的為各種各樣者。 ≪Shape of fins≫ In FIGS. 6B and 7B , the shape of the fins 21F and 21 is exemplified as a horseshoe shape. However, the shape of the fins is not limited to the horseshoe shape. In addition, those who install fins are not limited to alternators. In applications where a plurality of semiconductor devices without secondary soldering are used, the shape of the fins or the objects to be mounted may be various depending on the purpose.

≪第1導體、第2導體、第3導體之補足≫ 雖參照圖1A與圖1B說明第1實施形態,但於該說明中,作為平板16A(第1導體)、平板16B(第2導體)、盤片2(第3導體)記載。 然而,第1導體、第2導體、第3導體之規定不限定於以上。例如,如上所述,於圖4B中,成為平板16D(第1導體)、平板16C(第2導體)之關係。 又,例如於圖7A中,成為鰭片21(第3導體)。 ≪Complement of the 1st conductor, 2nd conductor and 3rd conductor≫ The first embodiment will be described with reference to FIGS. 1A and 1B . In this description, the flat plate 16A (first conductor), the flat plate 16B (second conductor), and the disk 2 (third conductor) are described. However, the definitions of the first conductor, the second conductor, and the third conductor are not limited to the above. For example, as described above, in FIG. 4B , the relationship between the flat plate 16D (the first conductor) and the flat plate 16C (the second conductor) is established. Moreover, for example, in FIG. 7A, it becomes the fin 21 (3rd conductor).

2:盤片(第3導體) 2E:盤片(第3導體) 2H:孔(鰭片空隙部) 2R:盤片(第3導體) 4:引線(引線電路) 4C:引線(引線電路) 4F:引線(引線電路) 4R:引線(引線電路) 6:密封樹脂、樹脂、樹脂(resin) 7:功率半導體晶片 8:一次焊接(焊接) 9:導電性接合材 10:控制IC晶片(控制IC,控制電路) 11:源極塊(分隔件導體) 11B:源極塊(分隔件導體) 12R1:引線框 12R2:引線框 13:電容器 14:接合線 16A:平板(第1導體) 16B:平板(第2導體) 16C:平板(第2導體) 16D:平板(第1導體) 16F:平板(第2導體) 17:螺桿(螺桿構件、桿狀構件、嵌合構件) 17B:螺桿(螺桿構件、桿狀構件、嵌合構件) 17D:螺桿(螺桿構件、桿狀構件、嵌合構件) 17E:螺桿(螺桿構件、桿狀構件、嵌合構件) 17F:螺桿(螺桿構件、桿狀構件、嵌合構件) 18:絕緣膜 19:螺孔 19B:螺孔 20:樹脂外殼 21:鰭片(第4導體) 21F:鰭片(第4導體) 22:功率半導體晶片 51:內置封裝 52:內置封裝 53P:內置封裝 53N:內置封裝 54P:內置封裝 54N:內置封裝 55:內置封裝 56P:內置封裝 56N:內置封裝 61:部分組裝零件 65:密封樹脂、樹脂、樹脂(resin) 101:無二次焊接半導體裝置 102:無二次焊接半導體裝置 103P:無二次焊接半導體裝置(壓入型之無二次焊接半導體裝置) 103N:無二次焊接半導體裝置(壓入型之無二次焊接半導體裝置) 104P:無二次焊接半導體裝置(壓入型之無二次焊接半導體裝置) 104N:無二次焊接半導體裝置(壓入型之無二次焊接半導體裝置) 105:無二次焊接半導體裝置 106P:無二次焊接半導體裝置(壓入型之無二次焊接半導體裝置) 106N:無二次焊接半導體裝置(壓入型之無二次焊接半導體裝置) 107P:無二次焊接半導體裝置 107N:無二次焊接半導體裝置 111:無二次焊接半導體裝置 112:無二次焊接半導體裝置 113:無二次焊接半導體裝置 114:無二次焊接半導體裝置 115:無二次焊接半導體裝置 116:無二次焊接半導體裝置 300R:二次焊接(焊接) 500R:內置封裝(一次成形體) 1000R:半導體裝置(壓入型半導體裝置) 2: Disc (3rd conductor) 2E: Disc (3rd conductor) 2H: Hole (fin gap) 2R: Disc (3rd conductor) 4: Lead wire (lead circuit) 4C: Lead wire (lead circuit) 4F: Lead wire (lead circuit) 4R: Lead (lead circuit) 6: Sealing resin, resin, resin (resin) 7: Power semiconductor wafer 8: One welding (welding) 9: Conductive joining material 10: Control IC chip (control IC, control circuit) 11: Source block (separator conductor) 11B: Source block (separator conductor) 12R1: Lead frame 12R2: Lead frame 13:Capacitor 14:Joining wire 16A: Flat plate (1st conductor) 16B: Flat plate (2nd conductor) 16C: Flat plate (2nd conductor) 16D: Flat plate (1st conductor) 16F: Flat plate (2nd conductor) 17: Screw (screw member, rod member, fitting member) 17B: Screw (screw member, rod member, fitting member) 17D: Screw (screw member, rod member, fitting member) 17E: Screw (screw member, rod member, fitting member) 17F: Screw (screw member, rod member, fitting member) 18:Insulating film 19:Screw hole 19B:Screw hole 20: Resin shell 21: Fin (4th conductor) 21F: Fin (4th conductor) 22:Power semiconductor wafer 51: Built-in packaging 52: Built-in packaging 53P: Built-in package 53N: Built-in package 54P: Built-in package 54N: Built-in package 55: Built-in packaging 56P: Built-in package 56N: Built-in package 61: Partially assembled parts 65:Sealing resin, resin, resin (resin) 101: Semiconductor device without secondary soldering 102: Semiconductor device without secondary soldering 103P: Semiconductor device without secondary soldering (press-fit type semiconductor device without secondary soldering) 103N: Semiconductor device without secondary soldering (press-fit type semiconductor device without secondary soldering) 104P: Semiconductor device without secondary soldering (press-fit type semiconductor device without secondary soldering) 104N: Semiconductor device without secondary soldering (press-fit type semiconductor device without secondary soldering) 105: Semiconductor device without secondary soldering 106P: Semiconductor device without secondary soldering (press-fit type semiconductor device without secondary soldering) 106N: Semiconductor device without secondary soldering (press-fit type semiconductor device without secondary soldering) 107P: Semiconductor device without secondary soldering 107N: Semiconductor device without secondary soldering 111: Semiconductor device without secondary soldering 112: Semiconductor device without secondary soldering 113: Semiconductor device without secondary soldering 114: Semiconductor device without secondary soldering 115: Semiconductor device without secondary soldering 116: Semiconductor device without secondary soldering 300R: Secondary welding (welding) 500R: Built-in package (primary molded body) 1000R: Semiconductor device (press-fit semiconductor device)

圖1A係模式性顯示本發明之第1實施形態之無二次焊接半導體裝置之剖面構造之一例之圖。 圖1B係顯示分解表述本發明之第1實施形態之無二次焊接半導體裝置之構造之剖面構造之一例的圖。 圖1C係顯示本發明之第1實施形態之變化例1之剖面構造之一例之圖。 圖1D係顯示本發明之第1實施形態之變化例2之剖面構造之一例之圖。 圖1E係顯示本發明之第1實施形態之變化例3之剖面構造之一例之圖。 圖2A係模式性顯示比較例1之半導體裝置之剖面構造之一例之圖。 圖2B係模式性顯示比較例1之半導體裝置之內置封裝之剖面構造之一例之圖。 圖3A係顯示分解表述本發明之第2實施形態之無二次焊接半導體裝置之構造之剖面構造之一例的圖。 圖3B係顯示本發明之第2實施形態之變化例4之剖面構造之一例之圖。 圖4A係模式性顯示本發明之第3實施形態之無二次焊接半導體裝置之使用灌封樹脂之情形之P極構造之剖面構造之一例的圖。 圖4B係模式性顯示本發明之第3實施形態之無二次焊接半導體裝置之使用灌封樹脂之情形之N極構造之剖面構造之一例的圖。 圖5A係模式性顯示本發明之第4實施形態之無二次焊接半導體裝置之使用轉移模具之情形之P極構造之剖面構造之一例的圖。 圖5B係模式性顯示本發明之第4實施形態之無二次焊接半導體裝置之使用轉移模具之情形之N極構造之剖面構造之一例的圖。 圖6A係顯示本發明之第5實施形態之無二次焊接半導體裝置與鰭片之構造關係之一例之圖。 圖6B係顯示自上表面觀察馬蹄形之鰭片之構造之一例的圖。 圖7A係模式性顯示本發明之第6實施形態之無二次焊接半導體裝置與鰭片之剖面構造之一例之圖。 圖7B係顯示自上表面觀察馬蹄形之鰭片之構造之一例之圖。 圖8A係模式性顯示本發明之第7實施形態之無二次焊接半導體裝置之P極構造之剖面構造之一例的圖。 圖8B係模式性顯示本發明之第7實施形態之無二次焊接半導體裝置之N極構造之剖面構造之一例的圖。 圖9A係模式性顯示本發明之第8實施形態之無二次焊接半導體裝置之P極構造之剖面構造之一例的圖。 圖9B係模式性顯示本發明之第8實施形態之無二次焊接半導體裝置之N極構造之剖面構造之一例的圖。 圖10係模式性顯示本發明之第9實施形態之無二次焊接半導體裝置之剖面構造之一例之圖。 圖11係模式性顯示本發明之第10實施形態之無二次焊接半導體裝置之剖面構造之一例之圖。 圖12係模式性顯示本發明之第11實施形態之無二次焊接半導體裝置之剖面構造之一例之圖。 圖13係模式性顯示本發明之第12實施形態之無二次焊接半導體裝置之剖面構造之一例之圖。 圖14係模式性顯示本發明之第13實施形態之無二次焊接半導體裝置之剖面構造之一例之圖。 圖15係模式性顯示本發明之第14實施形態之無二次焊接半導體裝置之剖面構造之一例之圖。 FIG. 1A is a diagram schematically showing an example of the cross-sectional structure of a semiconductor device without secondary soldering according to the first embodiment of the present invention. 1B is a diagram showing an example of an exploded cross-sectional structure illustrating the structure of the secondary soldering-free semiconductor device according to the first embodiment of the present invention. FIG. 1C is a diagram showing an example of the cross-sectional structure of Modification 1 of the first embodiment of the present invention. FIG. 1D is a diagram showing an example of the cross-sectional structure of Modification 2 of the first embodiment of the present invention. FIG. 1E is a diagram showing an example of the cross-sectional structure of Modification 3 of the first embodiment of the present invention. FIG. 2A is a diagram schematically showing an example of the cross-sectional structure of the semiconductor device of Comparative Example 1. 2B is a diagram schematically showing an example of the cross-sectional structure of the built-in package of the semiconductor device of Comparative Example 1. 3A is a diagram showing an example of an exploded cross-sectional structure illustrating the structure of the secondary soldering-free semiconductor device according to the second embodiment of the present invention. FIG. 3B is a diagram showing an example of the cross-sectional structure of Modification 4 of the second embodiment of the present invention. 4A is a diagram schematically showing an example of the cross-sectional structure of the P-electrode structure when potting resin is used in the non-secondary soldering semiconductor device according to the third embodiment of the present invention. 4B is a diagram schematically showing an example of the cross-sectional structure of the N-electrode structure when potting resin is used in the non-secondary soldering semiconductor device according to the third embodiment of the present invention. 5A is a diagram schematically showing an example of the cross-sectional structure of the P-pole structure when a transfer mold is used in the semiconductor device without secondary soldering according to the fourth embodiment of the present invention. 5B is a diagram schematically showing an example of the cross-sectional structure of the N-pole structure when a transfer mold is used in the semiconductor device without secondary soldering according to the fourth embodiment of the present invention. FIG. 6A is a diagram showing an example of the structural relationship between a semiconductor device without secondary soldering and a fin according to the fifth embodiment of the present invention. FIG. 6B is a diagram showing an example of the structure of the horseshoe-shaped fin viewed from the upper surface. 7A is a diagram schematically showing an example of the cross-sectional structure of a semiconductor device and fins without secondary soldering according to the sixth embodiment of the present invention. FIG. 7B is a diagram showing an example of the structure of the horseshoe-shaped fin viewed from the upper surface. 8A is a diagram schematically showing an example of the cross-sectional structure of the P-electrode structure of the semiconductor device without secondary soldering according to the seventh embodiment of the present invention. 8B is a diagram schematically showing an example of the cross-sectional structure of the N-pole structure of the semiconductor device without secondary soldering according to the seventh embodiment of the present invention. 9A is a diagram schematically showing an example of the cross-sectional structure of the P-electrode structure of the semiconductor device without secondary soldering according to the eighth embodiment of the present invention. 9B is a diagram schematically showing an example of the cross-sectional structure of the N-pole structure of the semiconductor device without secondary soldering according to the eighth embodiment of the present invention. FIG. 10 is a diagram schematically showing an example of the cross-sectional structure of a semiconductor device without secondary soldering according to the ninth embodiment of the present invention. FIG. 11 is a diagram schematically showing an example of the cross-sectional structure of a semiconductor device without secondary soldering according to the tenth embodiment of the present invention. FIG. 12 is a diagram schematically showing an example of the cross-sectional structure of a semiconductor device without secondary soldering according to the eleventh embodiment of the present invention. FIG. 13 is a diagram schematically showing an example of the cross-sectional structure of a semiconductor device without secondary soldering according to the twelfth embodiment of the present invention. 14 is a diagram schematically showing an example of the cross-sectional structure of a semiconductor device without secondary soldering according to the thirteenth embodiment of the present invention. FIG. 15 is a diagram schematically showing an example of the cross-sectional structure of a semiconductor device without secondary soldering according to the fourteenth embodiment of the present invention.

2:盤片(第3導體) 2: Disc (3rd conductor)

4:引線(引線電路) 4: Lead wire (lead circuit)

7:功率半導體晶片 7: Power semiconductor wafer

8:一次焊接(焊接) 8: One welding (welding)

9:導電性接合材 9: Conductive joining material

10:控制IC晶片(控制IC,控制電路) 10: Control IC chip (control IC, control circuit)

11:源極塊(分隔件導體) 11: Source block (separator conductor)

13:電容器 13:Capacitor

14:接合線 14:Joining wire

16A:平板(第1導體) 16A: Flat plate (1st conductor)

16B:平板(第2導體) 16B: Flat plate (2nd conductor)

17:螺桿(螺桿構件、桿狀構件、嵌合構件) 17: Screw (screw member, rod member, fitting member)

18:絕緣膜 18:Insulating film

19:螺孔 19:Screw hole

51:內置封裝 51: Built-in packaging

101:二次焊接半導體裝置 101: Secondary welding semiconductor device

Claims (11)

一種無二次焊接半導體裝置,其特徵在於,具備: 第1導體; 第2導體; 功率半導體晶片,其配置於上述第1導體與上述第2導體之間,第1電極電性連接於上述第1導體,第2電極電性連接於上述第2導體;及 第3導體,其固定上述第1導體;且 上述功率半導體晶片以焊接接合於上述第1導體或上述第2導體中之至少一者; 上述第1導體與上述第3導體之間不經由焊接而經由凹凸之嵌合構造電性及機械連接。 A semiconductor device without secondary welding, characterized by: 1st conductor; 2nd conductor; A power semiconductor chip arranged between the above-mentioned first conductor and the above-mentioned second conductor, the first electrode is electrically connected to the above-mentioned first conductor, and the second electrode is electrically connected to the above-mentioned second conductor; and a 3rd conductor that secures the above-mentioned 1st conductor; and The power semiconductor chip is bonded to at least one of the first conductor or the second conductor by soldering; The above-mentioned first conductor and the above-mentioned third conductor are electrically and mechanically connected through a concave and convex fitting structure without welding. 如請求項1之無二次焊接半導體裝置,其中 於上述第1導體具有凹部,於上述第3導體具有凹部,且具有嵌合於上述第1導體之凹部與上述第3導體之凹部之桿狀構件。 For example, the semiconductor device without secondary soldering in claim 1, wherein The first conductor has a recessed portion, the third conductor has a recessed portion, and a rod-shaped member fitted into the recessed portion of the first conductor and the recessed portion of the third conductor is provided. 如請求項1之無二次焊接半導體裝置,其中 於上述第1導體具有凸部,於上述第3導體具有凹部,且上述第1導體之凸部與上述第3導體之凹部嵌合。 For example, the semiconductor device without secondary soldering in claim 1, wherein The first conductor has a convex part, the third conductor has a concave part, and the convex part of the first conductor is fitted into the concave part of the third conductor. 如請求項1之無二次焊接半導體裝置,其中 於上述第1導體具有凹部,於上述第3導體具有凸部,且上述第1導體之凹部與上述第3導體之凸部嵌合。 For example, the semiconductor device without secondary soldering in claim 1, wherein The first conductor has a recessed portion, the third conductor has a convex portion, and the recessed portion of the first conductor is fitted with the convex portion of the third conductor. 如請求項1之無二次焊接半導體裝置,其中 上述第1導體與上述第2導體為相同之形狀。 For example, the semiconductor device without secondary soldering in claim 1, wherein The above-mentioned first conductor and the above-mentioned second conductor have the same shape. 如請求項1至4中任一項之無二次焊接半導體裝置,其中 上述第3導體壓入並嵌合於形成於第4導體之孔。 For example, the semiconductor device without secondary soldering in any one of claims 1 to 4, wherein The third conductor is press-fitted into the hole formed in the fourth conductor. 如請求項6之無二次焊接半導體裝置,其中 上述第4導體係使用於交流發電機之鰭片; 無二次焊接半導體裝置進行整流動作。 For example, the semiconductor device without secondary soldering in claim 6, wherein The above-mentioned fourth conductor system is used in the fins of the alternator; The semiconductor device performs rectification operation without secondary soldering. 如請求項1至4中任一項之無二次焊接半導體裝置,其中 上述第3導體係使用於交流發電機之鰭片; 無二次焊接半導體裝置進行整流動作。 For example, the semiconductor device without secondary soldering in any one of claims 1 to 4, wherein The above-mentioned third conductor system is used in the fins of the alternator; The semiconductor device performs rectification operation without secondary soldering. 如請求項1至4中任一項之無二次焊接半導體裝置,其具備: 控制電路,其配置於上述第1導體與上述第2導體之間,控制上述功率半導體晶片而進行整流動作。 If the semiconductor device without secondary soldering in any one of claims 1 to 4 has: A control circuit is arranged between the first conductor and the second conductor and controls the power semiconductor chip to perform a rectifying operation. 如請求項9之無二次焊接半導體裝置,其中 上述功率半導體晶片與上述第2導體之間經由分隔件導體電性連接。 For example, the semiconductor device without secondary soldering in claim 9, wherein The power semiconductor chip and the second conductor are electrically connected via a spacer conductor. 如請求項1之無二次焊接半導體裝置,其中 於組裝上述功率半導體晶片時,使功率半導體晶片之兩個主表面之正反反轉,藉此可選擇P極構造或N極構造進行製造。 For example, the semiconductor device without secondary soldering in claim 1, wherein When assembling the above-mentioned power semiconductor chip, the two main surfaces of the power semiconductor chip are reversed, whereby the P-pole structure or the N-pole structure can be selected for manufacturing.
TW111145184A 2022-02-01 2022-11-25 Semiconductor device without secondary soldering capable of easily selecting materials or processing conditions TW202333341A (en)

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