TW202332513A - Carrier with vertical grid for supporting substrates in coater - Google Patents

Carrier with vertical grid for supporting substrates in coater Download PDF

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Publication number
TW202332513A
TW202332513A TW112113685A TW112113685A TW202332513A TW 202332513 A TW202332513 A TW 202332513A TW 112113685 A TW112113685 A TW 112113685A TW 112113685 A TW112113685 A TW 112113685A TW 202332513 A TW202332513 A TW 202332513A
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Taiwan
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vertical support
carrier
substrate
substrates
vertical
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TW112113685A
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Chinese (zh)
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博 內倫
邁克 波特
達爾雅 雪利凡斯塔瓦
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美商唯景公司
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Publication of TW202332513A publication Critical patent/TW202332513A/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582Rigid and flat substrates, e.g. plates or discs
    • C23C16/4587Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/153Constructional details
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/6715Apparatus for applying a liquid, a resin, an ink or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67754Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a batch of workpieces
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/6776Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68728Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of separate clamping members, e.g. clamping fingers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68764Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Nonlinear Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

Various embodiments herein relate to carriers for supporting one or more substrate as the substrates are passed through a processing apparatus. In many cases, the substrates are oriented in a vertical manner. The carrier may include a frame and vertical support bars that secure the glass to the frame. The carrier may lack horizontal support bars. The carrier may allow for thermal expansion and contraction of the substrates, without any need to provide precise gaps between adjacent pairs of substrates. The carriers described herein substantially reduce the risk of breaking the processing apparatus and substrates, thereby achieving a more efficient process. Certain embodiments herein relate to methods of loading substrates onto a carrier.

Description

用於在塗佈機中支撐基板的具有垂直格柵之載體Carrier with vertical grid for supporting substrates in coating machines

可以各種方式在基板上形成電致變色裝置(electrochromic device)。通常,基板實質上係透明且平坦的,且可由玻璃、塑膠或相似材料製成。為了形成電致變色裝置,將基板塗佈有各種材料層,諸如透明導電層、陰極著色電致變色層及陽極著色相對電極層。可根據需要而提供額外層,且其可包含但不限於離子導體層、缺陷減輕絕緣層、抗反射層、保護性氧化物或氮化物層等等。可在諸如濺塗機(sputter coater)之塗佈機中形成此等層中之一者或多者。在一些情況下,可在塗佈機中形成所有此等層。隨著在塗佈機中處理基板,使用載體來支撐基板。載體可支撐單一基板或多個基板。Electrochromic devices can be formed on substrates in various ways. Typically, the substrate is substantially transparent and flat, and may be made of glass, plastic, or similar materials. To form an electrochromic device, a substrate is coated with various material layers, such as a transparent conductive layer, a cathodically colored electrochromic layer, and an anodically colored counter electrode layer. Additional layers may be provided as desired and may include, but are not limited to, ion conductor layers, defect mitigating insulating layers, anti-reflective layers, protective oxide or nitride layers, and the like. One or more of these layers may be formed in a coater such as a sputter coater. In some cases, all such layers can be formed in a coater. A carrier is used to support the substrate as it is processed in the coater. The carrier can support a single substrate or multiple substrates.

本文中之各種實施例係關於用於在基板通過一塗佈機時將所述基板固持於一實質上垂直定向上之載體。所述塗佈機在所述基板之至少一前表面上提供一塗層。在許多情況下,所述塗層為一電致變色裝置。Various embodiments herein relate to a carrier for holding a substrate in a substantially vertical orientation as the substrate passes through a coater. The coater provides a coating on at least one front surface of the substrate. In many cases, the coating is an electrochromic device.

在本文中之實施例之一個態樣中,提供一種用於在至少一個基板通過一塗佈機時將所述至少一個基板固持於一實質上垂直定向上之載體,所述塗佈機在所述至少一個基板之至少一前表面上提供一塗層,所述載體包含:一底部分接桿;一頂部分接桿;多個垂直支撐桿,每一垂直支撐桿具有准許與所述頂部分接桿及所述底部分接桿兩者接合之一長度,其中所述多個垂直支撐桿包含至少一最左邊及一最右邊垂直支撐桿,且其中所述多個垂直支撐桿與所述底部及頂部分接桿之組合界定了一個或多個孔隙;及多個附件,其用於與所述底部分接桿及所述頂部分接桿接合,以准許所述多個垂直支撐桿中之至少一者沿著所述底部及頂部分接桿水平地移動。In one aspect of the embodiments herein, a carrier is provided for holding at least one substrate in a substantially vertical orientation as the substrate passes through a coater at which A coating is provided on at least one front surface of the at least one substrate, and the carrier includes: a bottom parting rod; a top parting rod; a plurality of vertical support rods, each of the vertical support rods having a structure allowing contact with the top part A length of joint between the connecting rod and the bottom connecting rod, wherein the plurality of vertical supporting rods includes at least one leftmost and one rightmost vertical supporting rod, and wherein the plurality of vertical supporting rods are connected to the bottom and a combination of top portioning bars defining one or more apertures; and a plurality of attachments for engaging said bottom portioning bars and said top portioning bars to permit one of said plurality of vertical support bars to At least one moves horizontally along the bottom and top splitting bars.

在某些實施例中,所述載體可進一步包含用於將所述基板之端部緊固至所述垂直支撐桿之多個緊固件,其中每一垂直支撐桿具有多個緊固件附接位置以用於在多個垂直位置處附接至所述多個緊固件。在此等或其他實施例中,每一垂直支撐桿可沿著所述垂直支撐桿之一扁平表面與所述基板接合。在一些實施方案中,每一緊固件可包含至少一個銷或釘。在一些此類情況下,每一緊固件可包含至少兩個銷或釘。在此等或其他實施例中,所述多個緊固件附接位置可包含所述垂直支撐桿中之多個狹槽、孔道、凹槽或其他開口。In certain embodiments, the carrier may further include a plurality of fasteners for fastening the ends of the base plate to the vertical support rods, wherein each vertical support rod has a plurality of fastener attachment locations for attachment to the plurality of fasteners at multiple vertical positions. In these or other embodiments, each vertical support rod may engage the substrate along a flat surface of the vertical support rod. In some embodiments, each fastener may include at least one pin or staple. In some such cases, each fastener may include at least two pins or tacks. In these or other embodiments, the plurality of fastener attachment locations may include a plurality of slots, holes, grooves, or other openings in the vertical support rod.

在一些實施方案中,所述至少一個孔隙之一水平尺寸可介於約50吋與200吋之間。在此等或其他實施例中,所述孔隙之一垂直尺寸可介於約50吋與150吋之間。In some embodiments, a horizontal dimension of the at least one pore can be between about 50 inches and 200 inches. In these or other embodiments, a vertical dimension of the pores may be between about 50 inches and 150 inches.

可使用各種材料。在一些情況下,所述基板可包含玻璃或塑膠。在此等或其他實施例中,所述基板可為將利用一電致變色裝置進行塗佈之一窗口。在此等或其他實施例中,所述多個附件可經組態以移動來適應所述基板之熱膨脹。在此等或其他實施例中,所述多個附件中之至少一者可包含適應所述基板之所述熱膨脹的一彈簧。在各種實施方案中,所述底部分接桿及/或頂部分接桿可包含金屬。在此等或其他實施例中,所述多個垂直支撐桿可包含金屬。A variety of materials can be used. In some cases, the substrate may include glass or plastic. In these or other embodiments, the substrate may be a window to be coated using an electrochromic device. In these or other embodiments, the plurality of attachments may be configured to move to accommodate thermal expansion of the substrate. In these or other embodiments, at least one of the attachments may include a spring that accommodates the thermal expansion of the substrate. In various embodiments, the bottom tap bar and/or the top tap bar can comprise metal. In these or other embodiments, the plurality of vertical support rods may comprise metal.

在一些情況下可提供數個額外特徵。舉例而言,所述載體可進一步包含用於使所述載體移動通過所述塗佈機之一傳送機構。在此等或其他實施例中,所述載體可包含經組態以在塗佈期間保護所述載體之至少一部分的一護罩。在此等或其他實施例中,所述載體可經組態以容許所述基板堆疊於所述載體中,所述堆疊之一方式准許不同寬度之基板垂直地堆疊於彼此之上。在此等或其他實施例中,所述多個附件可經組態以限制所述多個垂直支撐桿在與由所述載體之一垂直及一水平方向界定之一平面正交的一方向上移動。Several additional features are available in some cases. For example, the carrier may further comprise a transport mechanism for moving the carrier through the coater. In these or other embodiments, the carrier may include a shield configured to protect at least a portion of the carrier during coating. In these or other embodiments, the carrier may be configured to allow the substrates to be stacked in the carrier in a manner that allows substrates of different widths to be stacked vertically on top of each other. In these or other embodiments, the plurality of attachments may be configured to limit movement of the plurality of vertical support rods in a direction orthogonal to a plane defined by a vertical and a horizontal direction of the carrier .

在本文中之實施例之另一態樣中,提供一種用於在多個基板通過一塗佈機時將所述多個基板固持於一實質上垂直定向上之載體,所述塗佈機在所述多個基板之至少一前表面上提供一塗層,所述載體包含:一框架,其具有一孔隙,所述孔隙具有一水平尺寸及一垂直尺寸;一底部分接桿,其貼附至所述框架並沿著所述孔隙之一底部部分水平地延伸;一頂部分接桿,其貼附至所述框架並沿著所述孔隙之一頂部部分水平地延伸;多個垂直支撐桿,其各自具有(i)准許與所述頂部分接桿及所述底部分接桿兩者接合同時跨越所述孔隙垂直地延伸之一長度,及(ii)用於與所述底部分接桿及所述頂部分接桿中之至少一者可移動地接合以准許所述垂直支撐桿在所述孔隙內水平地移動之一可移動附件;及多個緊固件,其用於將所述基板之邊緣緊固至所述垂直支撐桿,其中每一垂直支撐桿具有多個緊固件附接位置以用於在多個垂直位置處附接至所述緊固件。In another aspect of embodiments herein, a carrier is provided for retaining a plurality of substrates in a substantially vertical orientation as the substrates pass through a coater. A coating is provided on at least one front surface of the plurality of substrates, and the carrier includes: a frame having a hole, the hole having a horizontal dimension and a vertical dimension; a bottom connecting rod attached to the frame and extending horizontally along a bottom portion of the aperture; a top connecting rod attached to the frame and extending horizontally along a top portion of the aperture; a plurality of vertical support rods , each having a length that (i) permits engagement with both the top portion and the bottom portion while extending vertically across the aperture, and (ii) is adapted to engage with the bottom portion and at least one of the top staging rods movably engages a movable attachment to permit horizontal movement of the vertical support rod within the aperture; and a plurality of fasteners for attaching the base plate The edges are fastened to the vertical support rods, wherein each vertical support rod has a plurality of fastener attachment locations for attachment to the fastener at a plurality of vertical positions.

在某些實施方案中,所述緊固件可為銷或釘。在此等或其他實施例中,所述多個緊固件附接位置可包含所述垂直支撐桿中之多個狹槽、孔道、凹槽或其他開口。在此等或其他實施例中,所述孔隙之所述水平尺寸可介於約50吋與200吋之間。在此等或其他實施例中,所述孔隙之所述垂直尺寸可介於約50吋與150吋之間。在一些情況下,所述可移動附件可包含一軌道、通道或凹槽。In certain embodiments, the fastener may be a pin or staple. In these or other embodiments, the plurality of fastener attachment locations may include a plurality of slots, holes, grooves, or other openings in the vertical support rod. In these or other embodiments, the horizontal dimension of the pores may be between approximately 50 inches and 200 inches. In these or other embodiments, the vertical dimension of the pores may be between approximately 50 inches and 150 inches. In some cases, the movable attachment may include a track, channel, or groove.

可使用各種不同材料。在一些實施例中,所述基板可為玻璃或塑膠。在此等或其他實施例中,所述基板可為用於利用一電致變色裝置進行塗佈之窗口。在此等或其他實施例中,所述框架可包含金屬。在此等或其他實施例中,所述底部分接桿及/或頂部分接桿可包含適應所述基板之一熱膨脹性質的一材料。在此等或其他實施例中,所述底部分接桿及/或頂部分接桿可包含金屬。在此等或其他實施例中,所述垂直支撐桿可包含金屬。A variety of different materials can be used. In some embodiments, the substrate may be glass or plastic. In these or other embodiments, the substrate may be a window for coating using an electrochromic device. In these or other embodiments, the frame may comprise metal. In these or other embodiments, the bottom and/or top portioning bars may include a material that accommodates thermal expansion properties of the substrate. In these or other embodiments, the bottom and/or top portioning bars may comprise metal. In these or other embodiments, the vertical support rods may comprise metal.

在各種實施方案中可提供數個額外特徵。舉例而言,所述載體可進一步包含附接至所述頂部分接桿之一樞釘(pivot peg)。在此等或其他實施例中,所述載體可進一步包含用於使所述載體移動通過所述塗佈機之一傳送機構。在此等或其他實施例中,所述載體可進一步包含經組態以在塗佈期間保護所述框架之至少一部分的一護罩。Several additional features may be provided in various implementations. For example, the carrier may further include a pivot peg attached to the top split rod. In these or other embodiments, the carrier may further include a transport mechanism for moving the carrier through the coater. In these or other embodiments, the carrier may further include a shield configured to protect at least a portion of the frame during coating.

在本文中之實施例之另一態樣中,提供一種用於在多個基板通過一塗佈機時將所述多個基板固持於一實質上垂直定向上之載體,所述塗佈機在所述多個基板之至少一前表面上提供一塗層,所述載體包含:一框架,其具有一孔隙,所述孔隙具有一水平尺寸及一垂直尺寸;一底部分接桿,其貼附至所述框架並沿著所述孔隙之一底部部分水平地延伸;一頂部分接桿,其貼附至所述框架並沿著所述孔隙之一頂部部分水平地延伸;多個垂直支撐桿,其各自(i)具有准許與所述頂部分接桿及所述底部分接桿兩者接合同時跨越所述孔隙垂直地延伸之一長度,且(ii)在塗佈期間定位於所述基板後方,使得所述基板之後表面定位於所述基板之所述前表面與所述垂直支撐桿之間;及多個緊固件,其用於將所述基板之邊緣緊固至所述垂直支撐桿,其中每一垂直支撐桿具有多個緊固件附接位置以用於在多個垂直位置處附接至所述緊固件,且其中所述基板可堆疊於所述載體中,所述堆疊之一方式准許不同寬度之基板在所述孔隙中垂直地堆疊於彼此之上。In another aspect of embodiments herein, a carrier is provided for retaining a plurality of substrates in a substantially vertical orientation as the substrates pass through a coater. A coating is provided on at least one front surface of the plurality of substrates, and the carrier includes: a frame having a hole, the hole having a horizontal dimension and a vertical dimension; a bottom connecting rod attached to the frame and extending horizontally along a bottom portion of the aperture; a top connecting rod attached to the frame and extending horizontally along a top portion of the aperture; a plurality of vertical support rods , each of which (i) has a length permitting engagement with both the top tie rod and the bottom tie rod while extending vertically across the aperture, and (ii) is positioned on the substrate during coating rear, such that the rear surface of the base plate is positioned between the front surface of the base plate and the vertical support rod; and a plurality of fasteners for fastening the edge of the base plate to the vertical support rod , wherein each vertical support rod has a plurality of fastener attachment locations for attachment to the fastener at a plurality of vertical positions, and wherein the substrates are stackable in the carrier, one of the stacks This approach allows substrates of different widths to be stacked vertically on top of each other in the apertures.

在一些此類實施例中,所述緊固件可為銷或釘。在此等或其他實施例中,所述多個緊固件附接位置可包含所述垂直支撐桿中之多個狹槽、孔道、凹槽或其他開口。在此等或其他實施例中,所述孔隙之所述水平尺寸可介於約50吋與200吋之間。在此等或其他實施例中,所述孔隙之所述垂直尺寸可介於約50吋與150吋之間。在一些情況下,所述可移動附件可包含一軌道、通道或凹槽。In some such embodiments, the fastener may be a pin or nail. In these or other embodiments, the plurality of fastener attachment locations may include a plurality of slots, holes, grooves, or other openings in the vertical support rod. In these or other embodiments, the horizontal dimension of the pores may be between approximately 50 inches and 200 inches. In these or other embodiments, the vertical dimension of the pores may be between approximately 50 inches and 150 inches. In some cases, the movable attachment may include a track, channel, or groove.

在一些情況下,所述基板可為玻璃或塑膠。在此等或其他實施例中,所述基板可為用於利用一電致變色裝置進行塗佈之窗口。在此等或其他實施例中,所述框架可包含金屬。在此等或其他實施例中,所述底部分接桿及/或頂部分接桿可包含適應所述基板之一熱膨脹性質的一材料。在此等或其他情況下,所述底部分接桿及/或頂部分接桿可包含金屬。在此等或其他情況下,所述垂直支撐桿可包含金屬。In some cases, the substrate may be glass or plastic. In these or other embodiments, the substrate may be a window for coating using an electrochromic device. In these or other embodiments, the frame may comprise metal. In these or other embodiments, the bottom and/or top portioning bars may include a material that accommodates thermal expansion properties of the substrate. In these or other cases, the bottom and/or top portioning bars may comprise metal. In these or other cases, the vertical support rods may comprise metal.

在某些實施方案中,所述載體可進一步包含附接至所述頂部分接桿之一樞釘。在此等或其他實施例中,所述載體可進一步包含用於使所述載體移動通過所述塗佈機之一傳送機構。在此等或其他實施例中,所述載體可進一步包含經組態以在塗佈期間保護所述框架之至少一部分的一護罩。In certain embodiments, the carrier may further include a pivot pin attached to the top split rod. In these or other embodiments, the carrier may further include a transport mechanism for moving the carrier through the coater. In these or other embodiments, the carrier may further include a shield configured to protect at least a portion of the frame during coating.

在以下描述中,闡述了許多特定細節,以便提供對所呈現之實施例的透徹理解。可在沒有此等特定細節中之一些或全部的情況下實踐所揭示之實施例。在其他情況下,未詳細地描述熟知的程序操作,以免不必要地使所揭示之實施例難以理解。雖然將結合特定實施例描述所揭示之實施例,但應理解,並不意欲限制所揭示之實施例。In the following description, numerous specific details are set forth in order to provide a thorough understanding of the presented embodiments. The disclosed embodiments may be practiced without some or all of these specific details. In other instances, well-known procedural operations have not been described in detail so as not to unnecessarily obscure the disclosed embodiments. Although the disclosed embodiments will be described in connection with specific embodiments, it should be understood that no limitation is intended to the disclosed embodiments.

一種用以在基板上形成電致變色裝置之技術涉及利用各種材料層塗佈基板。在許多情況下,使用濺鍍、物理氣相沈積(physical vapor deposition,PVD)或其他方法在塗佈機中形成塗層。塗佈機可包含數個不同站,每一站經組態以沈積一個或多個層。隨著一個或多個基板平移通過塗佈機,可使用載體來支撐所述基板。雖然本文中之某些實施例係關於經組態以隨著一個或多個基板平移通過例如用以在所述基板上濺鍍沈積一個或多個塗層之濺鍍設備的濺鍍設備而固持所述基板之載體,但實施例並不受到如此限制。一般而言,隨著任何實質上平坦基板通過處理設備,可使用本文中所描述之實施例來固定所述基板。處理設備通常用以沈積一個或多個膜(在一些情況下,所述膜形成電致變色裝置),但在一些情況下,處理設備可用於蝕刻、清潔、粒子移除、拋光、光微影等等。此類實施方案在所揭示之實施例的範疇內。在一些情況下,處理設備形成為全固態且無機之電致變色裝置。電致變色裝置之一些實例可見於美國專利第8,300,298號,所述專利的全文以引用之方式併入本文中。One technique for forming electrochromic devices on substrates involves coating the substrate with layers of various materials. In many cases, the coating is formed in a coater using sputtering, physical vapor deposition (PVD), or other methods. A coater may contain several different stations, each station configured to deposit one or more layers. A carrier may be used to support one or more substrates as they translate through the coater. While certain embodiments herein relate to sputtering apparatus configured to remain as one or more substrates are translated through, for example, a sputtering apparatus used to sputter deposit one or more coatings on the substrates The carrier of the substrate, but the embodiment is not so limited. In general, the embodiments described herein may be used to secure any substantially flat substrate as it passes through processing equipment. Processing equipment is typically used to deposit one or more films (in some cases, the films form electrochromic devices), but in some cases, processing equipment can be used for etching, cleaning, particle removal, polishing, photolithography etc. Such implementations are within the scope of the disclosed embodiments. In some cases, the processing device is formed as an all-solid state and inorganic electrochromic device. Some examples of electrochromic devices can be found in U.S. Patent No. 8,300,298, which is incorporated herein by reference in its entirety.

出於清楚起見而定義了以下術語。如本文中所使用,術語「基板」係指裝載至載體上並在處理設備中處理之平坦或實質上平坦物體。在許多情況下,基板為玻璃,但在一些情況下可使用塑膠及其他材料。通常,基板在每一側(例如寬度及高度)上之尺寸介於約12吋與120吋之間,但此並不意欲係限制性的。基板可最終形成其上具有電致變色裝置之電致變色窗口或其他產品,或基板可為不被製造成最終產品之填料基板。如本文中所使用,術語「載體」意謂經組態以隨著一個或多個基板通過處理設備而支撐所述基板之結構。載體可由可彼此永久地或可釋放地附接之各種片件構成。在許多情況下,載體包含框架及框架內之孔隙。如本文中所使用,術語「孔隙」係指載體中被裝載基板以供處理之區。在許多情況下,孔隙實質上係開放的(例如其不包含固體背襯)。如本文中所使用,術語「垂直格柵座」及「分接桿」可互換地用以係指連接至框架之水平部分的水平定向結構,其用以將垂直支撐桿裝配於孔隙內。如本文中所使用,術語「垂直支撐桿」係指在孔隙之底部與頂部之間伸展以在孔隙中支撐基板之垂直桿。通常,垂直支撐桿裝配至分接桿上。The following terms are defined for clarity. As used herein, the term "substrate" refers to a flat or substantially flat object loaded onto a carrier and processed in processing equipment. In many cases, the substrate is glass, but in some cases plastic and other materials may be used. Typically, the dimensions of the substrate are between about 12 inches and 120 inches on each side (eg, width and height), although this is not intended to be limiting. The substrate may ultimately be formed into an electrochromic window or other product with an electrochromic device thereon, or the substrate may be a filler substrate that is not manufactured into a final product. As used herein, the term "carrier" means a structure configured to support one or more substrates as they pass through processing equipment. The carrier may be constructed from various pieces that may be permanently or releasably attached to each other. In many cases, the carrier includes a frame and voids within the frame. As used herein, the term "pore" refers to the area in a carrier where a substrate is loaded for processing. In many cases, the pores are essentially open (eg, they do not contain a solid backing). As used herein, the terms "vertical grid base" and "tap rod" are used interchangeably to refer to a horizontally oriented structure connected to a horizontal portion of a frame for fitting vertical support rods within apertures. As used herein, the term "vertical support rod" refers to a vertical rod extending between the bottom and top of a void to support a substrate in the void. Typically, a vertical support rod is assembled to the tap rod.

當參考分接桿而使用時,術語「狹槽」係指分接桿中之開口、孔道或凹陷,垂直支撐桿之一部分裝配至所述狹槽中,或另一硬體片件可裝配至所述狹槽中,以便將垂直支撐桿固定至分接桿。當參考垂直支撐桿而使用時,術語「狹槽」係指垂直支撐桿中之開口、孔道或凹陷,銷可配合至所述狹槽中以使基板抵靠垂直支撐桿而固定。當參考垂直支撐桿或狹槽而使用時,術語「銷」係指配合於狹槽內以使基板抵靠垂直支撐桿而固定之硬體片件。當參考垂直支撐桿或鄰近基板而使用時,術語「夾子」係指定位於兩個鄰近基板之間以維持鄰近基板之間的分隔及共面性的硬體片件。When used with reference to a tap bar, the term "slot" refers to an opening, hole, or recess in the tap bar into which a portion of a vertical support rod fits, or into which another piece of hardware may fit. into the slot to secure the vertical support rod to the tap rod. When used with reference to a vertical support bar, the term "slot" refers to an opening, hole, or recess in the vertical support bar into which a pin may fit to secure the base plate against the vertical support bar. When used with reference to a vertical support bar or slot, the term "pin" refers to a piece of hardware that fits within the slot to secure the base plate against the vertical support bar. When used with reference to vertical support bars or adjacent substrates, the term "clip" designates a piece of hardware positioned between two adjacent substrates to maintain separation and coplanarity between adjacent substrates.

如本文中所使用,術語「樞釘」係指固定地或可釋放地附接至載體之一部分(例如通常為頂部分接桿或框架)且在基板裝載於載體中時與基板之頂部邊緣接合的樞軸結構。在許多情況下,樞釘包含附接至頂部分接桿或框架之第一端部,及與基板之頂部邊緣接合的第二端部。樞釘固定基板之邊緣,同時容許基板由於熱膨脹而進行某一移動。As used herein, the term "pivot pin" refers to a portion that is fixedly or releasably attached to a carrier (e.g., typically a top portion bar or frame) and engages the top edge of a substrate when the substrate is loaded in the carrier pivot structure. In many cases, the pivot pin includes a first end that attaches to the top split rod or frame, and a second end that engages the top edge of the base plate. Pivot pins secure the edges of the substrate while allowing some movement of the substrate due to thermal expansion.

在本文中之許多情況下,隨著基板裝載至載體上並通過處理設備,基板垂直地定向。當在本文中關於基板之尺寸而使用時,基板之「寬度」係指基板之水平尺寸。當在本文中關於基板之尺寸而使用時,基板之「高度」係指基板之垂直尺寸。當在本文中關於基板之尺寸而使用時,基板之「厚度」係指基板之兩個共面的面之間的距離。通常,基板之厚度為大約為幾毫米。相似地,孔隙、框架等等之「寬度」係指相關元件在水平方向上之尺寸,而孔隙、框架等等之「高度」係指相關元件在垂直方向上之尺寸。In many cases herein, the substrates are oriented vertically as they are loaded onto the carrier and passed through the processing equipment. When used herein with respect to the dimensions of the substrate, the "width" of the substrate refers to the horizontal dimension of the substrate. When used herein with respect to the dimensions of the substrate, the "height" of the substrate refers to the vertical dimension of the substrate. When used herein with respect to the dimensions of the substrate, the "thickness" of the substrate refers to the distance between two coplanar faces of the substrate. Typically, the thickness of the substrate is on the order of several millimeters. Similarly, the "width" of an aperture, frame, etc. refers to the horizontal dimension of the associated element, while the "height" of an aperture, frame, etc. refers to the vertical dimension of the associated element.

如本文中所使用,基板之「前」側係指基板之處理面。此側為基板的在處理設備中受到作用之側。在處理設備為塗佈機之情況下,基板之前側為其上沈積有膜之側。基板之「後」側為基板的與前側相對之面。As used herein, the "front" side of the substrate refers to the processed side of the substrate. This side is the side of the substrate that is acted upon in the processing equipment. In the case where the processing equipment is a coater, the front side of the substrate is the side on which the film is deposited. The "rear" side of the substrate is the side of the substrate opposite the front side.

當製造電致變色裝置時,經常使用載體以隨著一個或多個基板通過塗佈機而固定所述基板。以使每一基板之處理表面實質上曝露以供塗佈的方式將所述基板固定至載體。通常,基板在垂直定向上通過塗佈機。然而,亦可使用水平處理。When making electrochromic devices, carriers are often used to immobilize one or more substrates as they pass through a coater. The substrates are secured to the carrier in such a manner that the treated surface of each substrate is substantially exposed for coating. Typically, the substrate passes through the coater in a vertical orientation. However, horizontal processing can also be used.

在各種情況下,基板可為玻璃、塑膠等等。基板可具有已經形成於其上之一個或多個膜。基板通常係平坦的,且其具有各種大小及形狀。最常見的是,基板為矩形或正方形,但亦可使用其他形狀,諸如三角形、梯形、其他多邊形、圓形、半圓形、橢圓形等等。較小的基板大小可為約14吋乘14吋,而較大的基板大小可為約72吋乘120吋。此等實例之間的任何基板大小亦係可能的。所敍述之基板大小適用於許多應用及塗佈機,但在一些情況下可使用更小及/或更大的基板。通常,基板之尺寸精確至約1/8吋內(例如約3 mm或2 mm或1 mm內)。In various cases, the substrate can be glass, plastic, etc. The substrate may have one or more films already formed thereon. Substrates are typically flat and come in a variety of sizes and shapes. Most commonly, the substrate is rectangular or square, but other shapes may be used, such as triangles, trapezoids, other polygons, circles, semicircles, ovals, etc. The smaller substrate may be approximately 14 inches by 14 inches in size, while the larger substrate may be approximately 72 inches by 120 inches in size. Any substrate size between these examples is also possible. The stated substrate sizes are suitable for many applications and coaters, but in some cases smaller and/or larger substrates may be used. Typically, the dimensions of the substrate are accurate to within about 1/8 inch (eg, within about 3 mm or 2 mm or 1 mm).

在使基板通過塗佈機之前,通常將基板裝載至載體上。在許多情況下,將形狀及大小互補之多個基板裝載至單一載體上。在某些情況下,載體包含完整或部分框架,及至少部分地由框架界定之孔隙。孔隙為在基板支撐於載體中時基板所駐存之載體區。在許多情況下,孔隙可實質上係開放的(例如載體可在孔隙區域中缺少完整/固體背襯)。各種水平及/或垂直支撐桿可設置於框架內,完全地或部分地橫越孔隙。基板可抵靠此等水平及/或垂直支撐桿而固定。The substrate is typically loaded onto a carrier before passing it through the coater. In many cases, multiple substrates of complementary shapes and sizes are loaded onto a single carrier. In some cases, the support includes a complete or partial frame, and pores at least partially defined by the frame. The voids are the areas of the carrier where the substrate resides when it is supported in the carrier. In many cases, the pores may be substantially open (eg, the support may lack an intact/solid backing in the pore area). Various horizontal and/or vertical support rods may be provided within the frame, fully or partially across the aperture. The base plate can be fixed against these horizontal and/or vertical support rods.

圖1A及圖1B描繪可經組態以包含可調整的格柵陣列之載體100。圖1A示出在基板裝載於載體100上之前的載體100之各種態樣,而圖1B展示在若干基板102同時裝載於載體100上之後的載體100。在此實例中,載體100包含垂直框架部件110,以及水平框架部件105及115。水平框架部件105及115經由短支柱135焊接或以其他方式附接在一起。垂直框架部件110與水平框架部件105及115配合(例如栓接)以形成載體100之框架。導板120、導軌125及重疊區段130附接(例如栓接)至載體100之框架,如圖1A中所展示。孔隙101界定於框架內(例如垂直框架部件110及水平框架部件105之內部)。分接桿140可沿著孔隙101之頂部及底部內邊緣而組態。在一些情況下,分接桿140可被稱為頂部分接桿及底部分接桿,或被稱為垂直格柵座。圖1A中所展示之分接桿140可包含多個螺柱145以用於附接圖1B中所展示之垂直支撐桿155。螺柱145可與分接桿140之主體可滑動地接合,使得當垂直支撐桿155裝配至螺柱145時,總成可沿著分接桿140橫向地移動以適應基板之熱膨脹。在一些情況下,可使用夾緊塊體來代替螺柱145。Figures 1A and 1B depict a carrier 100 that can be configured to include an adjustable grid array. 1A shows various aspects of the carrier 100 before the substrate is loaded on the carrier 100, and FIG. 1B shows the carrier 100 after several substrates 102 are loaded on the carrier 100 at the same time. In this example, carrier 100 includes vertical frame members 110, and horizontal frame members 105 and 115. Horizontal frame members 105 and 115 are welded or otherwise attached together via short struts 135 . The vertical frame member 110 cooperates (eg, bolts) with the horizontal frame members 105 and 115 to form the frame of the carrier 100 . The guide plates 120, rails 125 and overlapping sections 130 are attached (eg, bolted) to the frame of the carrier 100, as shown in Figure 1A. Apertures 101 are defined within the frame (eg, within the vertical frame member 110 and the horizontal frame member 105). Tap rod 140 may be configured along the top and bottom inner edges of aperture 101 . In some cases, tap bars 140 may be referred to as top tap bars and bottom tap bars, or as vertical grid seats. The tap bar 140 shown in Figure IA may include a plurality of studs 145 for attaching the vertical support bar 155 shown in Figure IB. The stud 145 can slidably engage the body of the tap bar 140 such that when the vertical support bar 155 is assembled to the stud 145, the assembly can move laterally along the tap bar 140 to accommodate thermal expansion of the substrate. In some cases, clamping blocks may be used in place of studs 145.

如圖1B中所展示,可調整的格柵陣列包含若干水平支撐桿160,以及垂直支撐桿155。環繞某些水平支撐桿160及垂直支撐桿155之箭頭指示支撐桿具有可調整的位置,使得各種大小之基板可容納於載體100內。護罩150可在濺鍍期間覆蓋載體100之部分(例如前及/或後側部分)。As shown in FIG. 1B , the adjustable grid array includes a number of horizontal support bars 160 , and vertical support bars 155 . The arrows surrounding certain horizontal support rods 160 and vertical support rods 155 indicate that the support rods have adjustable positions so that substrates of various sizes can be accommodated within the carrier 100 . The shield 150 may cover portions of the carrier 100 (eg, front and/or rear portions) during sputtering.

垂直支撐桿155使用分接桿裝配至水平框架部件上。分接桿可包含在處理期間膨脹及收縮以近似裝配於載體上之基板之熱膨脹及收縮的合金。水平支撐桿160可經由任何可用機構裝配至垂直支撐桿155上。在一些情況下,水平支撐桿160與垂直支撐桿155可滑動地接合。水平支撐桿160可為伸縮式,使得其長度係可調整的。可調整的長度適應熱膨脹,且亦容許每一水平支撐桿160用於涉及不同特定基板尺寸之各種製造程序中。在許多情況下,垂直支撐桿155及水平支撐桿160至少部分地定位於基板之前方(例如在基板之處理面上)。在許多情況下,此意謂垂直支撐桿155及水平支撐桿160之至少一部分定位於基板與濺鍍標靶之間,濺鍍標靶用以在基板之處理面上沈積材料。在圖1B之實例中,每一基板102在其周邊由垂直支撐桿155及水平支撐桿160之組合支撐。下文進一步描述將基板102裝載至載體100上之程序。The vertical support rods 155 are assembled to the horizontal frame members using tap rods. The tap rod may comprise an alloy that expands and contracts during processing to approximate the thermal expansion and contraction of the substrate mounted on the carrier. Horizontal support rod 160 may be assembled to vertical support rod 155 via any available mechanism. In some cases, horizontal support rods 160 are slidably engaged with vertical support rods 155 . The horizontal support rod 160 may be telescopic so that its length is adjustable. The adjustable length accommodates thermal expansion and also allows each horizontal support bar 160 to be used in various manufacturing processes involving different specific substrate sizes. In many cases, vertical support rods 155 and horizontal support rods 160 are positioned at least partially in front of the substrate (eg, on the processing surface of the substrate). In many cases, this means that at least a portion of the vertical support rods 155 and horizontal support rods 160 are positioned between the substrate and the sputter target used to deposit material on the processing surface of the substrate. In the example of FIG. 1B , each substrate 102 is supported at its periphery by a combination of vertical support rods 155 and horizontal support rods 160 . The process of loading the substrate 102 onto the carrier 100 is further described below.

與圖1A及圖1B中所描述之載體100一致的實例載體進一步描述於2015年11月23日申請且名為《濺鍍系統用玻璃托板(GLASS PALLET FOR SPUTTERING SYSTEMS)》之美國專利申請案第14/893,502號中,所述專利申請案之全文以引用之方式併入本文中。An example carrier consistent with the carrier 100 depicted in Figures 1A and 1B is further described in a U.S. patent application filed on November 23, 2015 titled "GLASS PALLET FOR SPUTTERING SYSTEMS" No. 14/893,502, the entire text of said patent application is incorporated herein by reference.

因為基板具有許多大小及形狀,所以常見的是向載體裝載非均一大小及/或形狀之基板,如圖1B中所展示。在許多情況下,選擇基板之大小及形狀以滿足特定客戶訂單,其要求特定尺寸。由於大小及形狀之失配,可能難以完全填充載體之孔隙。通常使用填料基板(例如在許多情況下為填料玻璃)來填充孔隙中未由用於生產之基板佔據的額外空間。填料基板為不會被進一步處理或銷售之犧牲基板(但其可被重複使用)。常見的是,孔隙區之僅約60至70%由將被製造成電致變色窗口之基板佔據,其餘區由填料基板佔據。Because substrates come in many sizes and shapes, it is common to load a carrier with substrates of non-uniform size and/or shape, as shown in Figure 1B. In many cases, the size and shape of the substrate is selected to meet a specific customer order, which requires specific dimensions. Due to size and shape mismatch, it may be difficult to completely fill the pores of the carrier. A filler substrate (eg, in many cases a filler glass) is often used to fill the extra space in the pores not occupied by the substrate used for production. Filler substrates are sacrificial substrates that are not further processed or sold (but they can be reused). Typically, only about 60 to 70% of the aperture area is occupied by the substrate from which the electrochromic window is to be made, with the remaining area being occupied by the filler substrate.

雖然可使用許多不同技術以將基板及填料基板定位於載體之孔隙內,但一些技術引入了某些生產線問題。舉例而言,在與圖1A及圖1B之載體一致的一種方法中,向載體之孔隙提供垂直及水平支撐桿之格柵,其被定位為適於將個別基板固持於垂直位置以用於垂直地傳送通過塗佈機。載體之頂部區域包含被稱為頂部分接桿之分接桿,且載體之下部區域包含被稱為底部分接桿之分接桿。將頂部及底部分接桿兩者貼附至載體結構之其餘部分(例如貼附至框架部件)。將剛性垂直支撐桿附接至頂部及底部分接桿,且將伸縮式水平支撐桿附接至垂直支撐桿。While many different techniques can be used to position the substrate and filler substrate within the pores of the carrier, some techniques introduce certain production line issues. For example, in one approach consistent with the carrier of Figures 1A and 1B, the apertures of the carrier are provided with a grid of vertical and horizontal support rods positioned adapted to hold individual substrates in a vertical position for vertical conveyed through the coating machine. The top region of the carrier contains tap bars called top tap bars, and the lower region of the carrier contains tap bars called bottom tap bars. Attach both the top and bottom tie bars to the rest of the carrier structure (eg to a frame member). Rigid vertical support poles are attached to the top and bottom junction poles, and telescopic horizontal support poles are attached to the vertical support poles.

當一組基板準備好供處理(例如塗佈)時,安裝人員將垂直支撐桿配置於孔隙內以適應不同基板之寬度。將相同寬度之基板垂直地堆疊於彼此之上,舉例而言,如圖1B中所展示。將垂直支撐桿栓接或以其他方式固定地附接至頂部及底部分接桿。然後,將伸縮水平支撐桿壓縮或延伸至適當長度(例如以適應所存在之基板之寬度),並將其水平地定位於垂直支撐桿之間及鄰近基板之間。將垂直及水平支撐桿定位於基板之處理面上。換言之,將垂直及水平支撐桿定位於基板與塗佈機之陰極/濺鍍標靶之間。因而,垂直及水平支撐桿會在塗佈期間遮蔽基板之周邊區域。在許多情況下,此遮蔽並非期望的,且較佳的是遍及基板之整個處理面沈積膜。When a set of substrates is ready for processing (such as coating), the installer places vertical support rods within the apertures to accommodate the width of the different substrates. Substrates of the same width are stacked vertically on top of each other, for example, as shown in Figure IB. Bolt or otherwise securely attach vertical support poles to the top and bottom junction poles. The telescoping horizontal support rods are then compressed or extended to an appropriate length (eg, to accommodate the width of the existing substrates) and positioned horizontally between the vertical support rods and between adjacent substrates. Position the vertical and horizontal support rods on the processing surface of the substrate. In other words, position the vertical and horizontal support rods between the substrate and the cathode/sputter target of the coater. Thus, the vertical and horizontal support rods shield the peripheral area of the substrate during coating. In many cases, this masking is not desired, and it is preferable to deposit the film over the entire processed surface of the substrate.

在某些設計中,水平支撐桿相對薄且可彎曲,並且可容易彎曲成脫離其所需形狀。舉例而言,熱膨脹(其可由於通過塗佈機而引起)可造成水平支撐桿向外弓曲,從而遠離基板。此弓曲並非期望的,因為其可能會造成水平支撐桿卡在或嵌在塗佈機之邊緣。因此,水平支撐桿可能會變得變位或破裂,或其可能會造成設備之另一部分(例如護罩)變位或破裂。此等效應可能會實質上中斷生產程序,且在一些情況下可能會造成機械中斷、電短路及非想要的停機時間。此外,在一些情況下,變形的水平支撐桿可能會造成基板破裂,因此損耗了貴重的生產材料。In some designs, the horizontal support rods are relatively thin and bendable, and can be easily bent out of their desired shape. For example, thermal expansion (which can be caused by passing through a coater) can cause the horizontal support rods to bow outward, away from the substrate. This bowing is undesirable as it may cause the horizontal support bar to become stuck or embedded in the edge of the coater. As a result, the horizontal support rod may become displaced or cracked, or it may cause another part of the equipment, such as the guard, to become displaced or cracked. These effects may substantially interrupt the production process and in some cases may cause mechanical interruptions, electrical short circuits and undesirable downtime. Additionally, in some cases, deformed horizontal support rods may cause the base plate to crack, thereby wasting valuable production material.

由水平支撐桿引入之另一問題,特別是在水平支撐桿為伸縮式之情況下,為此類支撐桿會產生落到基板表面上並污染基板表面之金屬粒子。隨著水平支撐桿之移動/伸縮片件彼此移動,會產生金屬粒子。因為金屬粒子導電,所以其會給正在基板上形成之電致變色裝置帶來缺陷。Another problem introduced by the horizontal support rods, especially when the horizontal support rods are telescopic, is that such support rods can generate metal particles that fall onto the surface of the substrate and contaminate the surface of the substrate. As the horizontal support rods move/the telescopic pieces move against each other, metal particles are produced. Because metal particles conduct electricity, they can introduce drawbacks to electrochromic devices being formed on substrates.

諸如圖1A及圖1B中所展示之載體的某些載體之其他問題為垂直地堆疊於彼此頂上之基板必須具有相同寬度。此係因為垂直支撐桿分隔整行基板,且每一行中之基板皆具有相同寬度。換言之,若在載體之一部分中的底部片件裝載有20吋寬的基板,則裝載於所述基板上方之所有基板亦必須為20吋寬。若基板具有特定寬度且沒有其他具有相同寬度的準備好進行處理之基板,則在載體之孔隙內定位有所述基板的行必須被填充有填料基板。實際上,此意謂會使用大量填料基板,且大量膜材料被浪費沈積於填料基板上。載體之垂直行中之所有基板具有相同寬度的要求被稱為「z堆疊(z-stacking)」。Another problem with certain carriers, such as those shown in Figures 1A and 1B, is that the substrates stacked vertically on top of each other must have the same width. This is because vertical support bars separate entire rows of substrates, and the substrates in each row have the same width. In other words, if the bottom piece in a portion of the carrier is loaded with a 20-inch wide substrate, then all substrates loaded above the substrate must also be 20-inch wide. If a substrate has a specific width and there are no other substrates of the same width ready for processing, the rows in which the substrates are positioned within the apertures of the carrier must be filled with filler substrates. In practice, this means that a large amount of filler substrate is used and a large amount of film material is wasted deposited on the filler substrate. The requirement that all substrates in a vertical row of carriers have the same width is called "z-stacking."

諸如圖1A及圖1B中所展示之載體的載體之另一問題為需要維持水平支撐桿之許多不同片件。即使水平支撐桿可為伸縮式以適應不同的基板寬度,但此類伸縮亦可僅適應一定程度之寬度變化。由於基板寬度範圍廣,故必須維持許多不同的水平支撐桿。需要相當大的儲存區及組織來儲存所有不同的水平支撐桿。Another problem with carriers such as the carrier shown in Figures 1A and 1B is the need to maintain many different pieces of horizontal support rods. Even though the horizontal support rods may be telescopic to accommodate different substrate widths, such telescoping may only accommodate a certain degree of width variation. Because of the wide range of base plate widths, many different horizontal support bars must be maintained. Considerable storage area and organization is required to store all the different horizontal support rods.

本文中之各種實施例解決了上文所描述之問題中之一者或多者。圖2A至圖2P示出根據本文中之某些實施例的載體200之不同態樣。在此實施例中,在垂直鄰近基板202之間不使用水平支撐桿,且每一垂直支撐桿之相當大的部分定位於基板202之後面的平面後方。兩個此等特徵皆與圖1A及圖1B之實施例相反。Various embodiments herein address one or more of the problems described above. Figures 2A-2P illustrate different aspects of a carrier 200 according to certain embodiments herein. In this embodiment, no horizontal support rods are used between vertically adjacent substrates 202 , and a substantial portion of each vertical support rod is positioned behind the plane behind the substrates 202 . Both of these features are in contrast to the embodiment of Figures 1A and 1B.

如圖2A中所展示,載體200包含與圖1A及圖1B之載體100相似的許多特徵。舉例而言,載體200包含水平框架部件205及215,及垂直框架部件210。水平框架部件205及215經由短支柱235連接在一起(例如焊接)。水平框架部件205及215可經由任何可用構件連接至垂直框架部件210,且在一些情況下,其栓接在一起。導板220可設置於上部水平框架部件215頂上,且導軌225可沿著下部水平框架部件215之底部邊緣而設置(例如栓接、焊接等等)。As shown in Figure 2A, carrier 200 includes many features similar to carrier 100 of Figures 1A and 1B. For example, carrier 200 includes horizontal frame members 205 and 215, and vertical frame member 210. Horizontal frame members 205 and 215 are connected (eg, welded) together via short struts 235 . Horizontal frame members 205 and 215 may be connected to vertical frame member 210 via any available member, and in some cases, are bolted together. The guide plate 220 may be disposed atop the upper horizontal frame member 215 and the guide rail 225 may be disposed along the bottom edge of the lower horizontal frame member 215 (eg, bolted, welded, etc.).

分接桿240(有時被稱為上部及下部分接桿或垂直格柵座)裝配至水平框架部件205上。分接桿240可浮動或以其他方式移動以解決分接桿240與諸如水平框架部件205的載體200之其餘部分之間的非均一熱膨脹。在一些實施例中,分接桿240可由熱膨脹係數與基板202或載體200之不同組件匹配的材料製成。Tap bars 240 (sometimes referred to as upper and lower tap bars or vertical grid seats) fit to the horizontal frame member 205 . The tap bar 240 may float or otherwise move to account for non-uniform thermal expansion between the tap bar 240 and the remainder of the carrier 200 such as the horizontal frame member 205 . In some embodiments, tap bar 240 may be made from a material with a coefficient of thermal expansion that matches the different components of substrate 202 or carrier 200 .

在各種情況下,分接桿240包含突出並容許垂直支撐桿255經由凹槽沿著分接桿240滑動之導件或軌道。在此等或其他情況下,分接桿240可包含通道,垂直支撐桿255位於所述通道中且可在所述通道中移動/滑動而不離開所述通道。值得注意的是,分接桿240中之軌道、凹槽及/或通道容許垂直支撐桿155在處理期間很自由地左右移動以適應熱膨脹。換言之,提供可移動附件以用於使垂直支撐桿255與分接桿240中之至少一者可移動地接合。此無需在水平鄰近基板202之間設置精確間隙,因為基板202可隨著其加熱及膨脹而浮動及移動。先前,在垂直支撐桿255更固定地附接至分接桿240之情況下,有必要在水平鄰近基板202之間設置精確間隙,以確保鄰近基板在其固定位置中加熱及膨脹時不會彼此施加過度的壓力。此程序容易出錯,並會導致許多貴重的基板損耗/破裂。圖2A至圖2I中所展示之組態實質上具有更大的可撓性且不太可能會造成基板破裂。In each case, the tap bar 240 includes a guide or track that projects and allows the vertical support bar 255 to slide along the tap bar 240 via a groove. In these or other cases, the tap bar 240 may include a channel in which the vertical support bar 255 is located and may move/slide within the channel without exiting the channel. Notably, the tracks, grooves and/or channels in tap bar 240 allow vertical support bar 155 to move freely from side to side to accommodate thermal expansion during processing. In other words, a movable attachment is provided for removably engaging at least one of the vertical support rod 255 and the tap rod 240 . This eliminates the need for precise gaps between horizontally adjacent substrates 202 because the substrates 202 can float and move as they heat and expand. Previously, where vertical support rods 255 were more fixedly attached to tap rods 240, it was necessary to provide precise gaps between horizontally adjacent substrates 202 to ensure that adjacent substrates did not move against each other as they heated and expanded in their fixed positions. Applying excessive pressure. This procedure is prone to error and can result in loss/cracking of many valuable substrates. The configuration shown in FIGS. 2A-2I is substantially more flexible and less likely to cause cracking of the substrate.

垂直支撐桿255裝配至分接桿240上。數個基板202在垂直定向上裝載至載體200上。儘管圖2A中未展示,但可提供護罩(例如與圖1B之護罩150相似)來覆蓋載體200之頂部及底部部分。圖2A包含被標記為2B、2C、2D及2E之若干圓圈。此等圓圈中之每一者指示圖2B、圖2C、圖2D及圖2E中分別正在展示設備之哪一部分。Vertical support rod 255 is assembled to tap rod 240 . Several substrates 202 are loaded onto the carrier 200 in a vertical orientation. Although not shown in Figure 2A, a shield (eg, similar to shield 150 of Figure IB) may be provided to cover the top and bottom portions of carrier 200. Figure 2A includes a number of circles labeled 2B, 2C, 2D, and 2E. Each of these circles indicates which portion of the device is being shown in Figures 2B, 2C, 2D, and 2E respectively.

可使用圖3中所展示之方法300將基板202裝載至載體200上,此在圖2A至圖2E中所展示之結構的內容背景中予以描述。方法300開始於操作301,其中接收一組基板202以供處理。在此操作期間,判定所需基板佈局(例如,判定每一基板202將在載體200上定位於何處)。舉例而言,寬度匹配之基板可按行被分組在一起。接下來,在操作303處,將第一個垂直支撐桿255安裝至載體200上。垂直支撐桿255經設計成將基板固持到位,並將載體200之其餘部分連接至玻璃,例如經由分接桿240。在一些情況下,第一個垂直支撐桿255可保持安裝於載體200上,且可省略此操作。通常,第一個垂直支撐桿255安裝於附接至水平框架部件205之分接桿240之間。在一些情況下,第一個垂直支撐桿255(及其餘垂直支撐桿255)可以可滑動地裝配至分接桿240上。舉例而言,垂直支撐桿255可沿著分接桿240水平地滑動到位,到達有效地與載體200中之基板202中之一者或多者的垂直邊緣對準的位置。The substrate 202 may be loaded onto the carrier 200 using the method 300 shown in Figure 3, which is described in the context of the structure shown in Figures 2A-2E. Method 300 begins with operation 301 where a set of substrates 202 is received for processing. During this operation, the desired substrate layout is determined (eg, where each substrate 202 will be positioned on the carrier 200 ). For example, substrates of matching widths may be grouped together in rows. Next, at operation 303, the first vertical support rod 255 is installed to the carrier 200. Vertical support rods 255 are designed to hold the substrate in place and connect the remainder of the carrier 200 to the glass, such as via tap rods 240. In some cases, the first vertical support rod 255 may remain mounted on the carrier 200 and this operation may be omitted. Typically, a first vertical support bar 255 is mounted between tap bars 240 attached to the horizontal frame members 205 . In some cases, the first vertical support rod 255 (and the remaining vertical support rods 255 ) may be slidably assembled to the tap rod 240 . For example, vertical support rods 255 may slide horizontally into position along tap rods 240 to a position effectively aligned with the vertical edges of one or more of the substrates 202 in the carrier 200 .

圖2C示出抵靠垂直框架部件210而安裝之第一個垂直支撐桿255。值得注意的是,圖2C(以及圖2B及圖2D至圖2I)自「後側」透視圖示出了此等元件。換言之,基板之前側/處理側面向頁面,而基板之後側背對頁面。在此實例中,第一個垂直支撐桿255抵靠垂直框架部件210齊平地安裝,但在一些情況下,可在第一個垂直支撐桿255與垂直框架部件210之間設置間隔件(未展示)。可提供托架270或其他連接結構以將第一個垂直支撐桿255固定至分接桿240上,如圖2C中所展示。托架可包繞第一個垂直支撐桿255之一部分,且可包含容許托架連接至分接桿240之一個或多個開口。托架270提供了將第一個垂直支撐桿255固定至分接桿240之一個實例。然而,第一個垂直支撐桿255之固定未必需要由固定到位之托架270提供。Figure 2C shows the first vertical support rod 255 installed against the vertical frame member 210. It is worth noting that Figure 2C (and Figures 2B and 2D-2I) show these components from a "backside" perspective view. In other words, the front side/process side of the substrate faces the page, and the back side of the substrate faces away from the page. In this example, the first vertical support bar 255 is mounted flush against the vertical frame member 210, but in some cases a spacer may be provided between the first vertical support bar 255 and the vertical frame member 210 (not shown ). Brackets 270 or other connection structures may be provided to secure the first vertical support bar 255 to the tap bar 240 as shown in Figure 2C. The bracket may surround a portion of the first vertical support bar 255 and may include one or more openings that allow the bracket to be connected to the tap bar 240 . Bracket 270 provides one example of securing first vertical support bar 255 to tap bar 240 . However, the fixation of the first vertical support rod 255 does not necessarily need to be provided by the bracket 270 fixed in place.

如圖2Q中之前視透視圖及圖2R中之俯視橫截面圖中所表示,在另一實施例中,第一個垂直支撐桿255由彈簧夾219固定至分接桿240。彈簧夾219可特別適用於確保基板之邊緣在處理過程期間保持與垂直支撐桿接觸並由垂直支撐桿支撐。每一彈簧夾219包括附接部分219a,附接部分219a在第一端部處經組態以由定位於彈簧夾219之孔隙內的一個或多個緊固件(未展示)耦接至分接桿240。每一彈簧夾219亦包括空心軸件219c,空心軸件219c具有一長度及外表面,彈簧219d裝配於所述外表面上方。彈簧219d包括長於軸件219c之長度的彈簧下方長度(unspring length)(例如當不處於壓縮或拉伸下時之長度)。空心軸件219c經組態以收納棒219e,棒219e之一個端部裝配至緊固件219b,緊固件219b又經組態以固定至第一個垂直支撐桿255之端部。In another embodiment, the first vertical support rod 255 is secured to the tap rod 240 by a spring clip 219, as shown in the front perspective view in FIG. 2Q and the top cross-sectional view in FIG. 2R. Spring clips 219 may be particularly suitable for ensuring that the edges of the substrate remain in contact with and supported by the vertical support rods during the processing process. Each spring clip 219 includes an attachment portion 219a configured at a first end to be coupled to the tap by one or more fasteners (not shown) positioned within apertures of the spring clip 219 Rod 240. Each spring clip 219 also includes a hollow shaft 219c having a length and an outer surface above which the spring 219d is mounted. Spring 219d includes an unspring length that is longer than the length of shaft 219c (eg, the length when not under compression or tension). Hollow shaft member 219c is configured to receive rod 219e, one end of rod 219e is assembled to fastener 219b, which is configured to be secured to the end of first vertical support rod 255.

棒219e經組態以可滑動地插入通過空心軸件219c。在空心軸件219c之端部與棒219e之第二端部之間界定了距離「D」,如圖2Q中所展示。當棒219e完全插入通過空心軸件219c,使得緊固件219b鄰接彈簧夾之第二端部219m時,距離D最大。此最大距離可被稱為D 1Rod 219e is configured to be slidably inserted through hollow shaft 219c. A distance "D" is defined between the end of the hollow shaft member 219c and the second end of the rod 219e, as shown in Figure 2Q. The distance D is maximum when the rod 219e is fully inserted through the hollow shaft member 219c so that the fastener 219b abuts the second end 219m of the spring clip. This maximum distance may be called D 1 .

在一個實施例中,載體之組裝及裝配包括:最初將垂直支撐桿255定位於分接桿240上;將棒219e附接至緊固件219b;將棒219e完全插入通過空心軸件219c,使得緊固件219b緊靠彈簧夾219之第二端部219m;將彈簧219d置放於空心軸件219c上方;將保持器219f固定至棒219e之第二端部;將緊固件219b定位於垂直支撐桿255上方;及隨後將附接部分219a裝配至分接桿240。在裝配附接部分219a期間,可自緊固件219b拉開附接部分219a,以藉此使彈簧219d壓縮/預負載。在圖2Q及圖2R之實例中,可向左拉動附接部分219a,並將其附接於使得在緊固件219b與彈簧夾219之第二端部219m之間存在間隙的位置處。以此方式,附接部分219a在彈簧219d上施加向左的力,在彈簧219d上施加的向左的力在保持器219f上施加向左的力,在保持器219f上施加的向左的力在棒219e上施加向左的力,在棒219e上施加的向左的力在緊固件219b上施加向左的力,在緊固件219b上施加的向左的力在垂直支撐桿255上施加向左的力。垂直支撐桿255上之此向左的力確保了垂直支撐桿保持與基板202之邊緣接觸並支撐基板202之邊緣。當然,彈簧夾219可經組態以在某些情況下在此等元件上提供向右的力,例如藉由將彈簧夾219翻轉及定位至垂直支撐桿255之右邊。在許多情況下,緊固件219b與彈簧夾219之第二端部219m之間的間隙之寬度小於上述距離D 1。當在安裝期間向左拉動附接部分219a時,空心軸件219c之端部與棒219e之端部之間的距離D減小至D < D 1。此時距離D減小,因為棒219e基於垂直支撐桿255及緊固件219b之位置保持固定到位,而空心軸件219c之端部被向左拉動,從而更靠近棒219e之端部。 In one embodiment, assembly and assembly of the carrier includes: initially positioning vertical support rod 255 on tap rod 240; attaching rod 219e to fastener 219b; fully inserting rod 219e through hollow shaft member 219c so that the fastener Fastener 219b is against the second end 219m of the spring clip 219; place the spring 219d above the hollow shaft member 219c; secure the retainer 219f to the second end of the rod 219e; position the fastener 219b on the vertical support rod 255 above; and then assemble the attachment portion 219a to the tap rod 240. During assembly of attachment portion 219a, attachment portion 219a can be pulled away from fastener 219b, thereby compressing/preloading spring 219d. In the example of Figures 2Q and 2R, attachment portion 219a can be pulled to the left and attached at a position such that there is a gap between fastener 219b and second end 219m of spring clip 219. In this manner, the attachment portion 219a exerts a leftward force on the spring 219d, which exerts a leftward force on the retainer 219f, which exerts a leftward force on the retainer 219f. A leftward force is exerted on rod 219e, which exerts a leftward force on fastener 219b, which exerts a leftward force on vertical support rod 255. left force. This leftward force on the vertical support rod 255 ensures that the vertical support rod remains in contact with and supports the edge of the substrate 202 . Of course, spring clip 219 can be configured to provide a rightward force on these components under certain circumstances, such as by flipping and positioning spring clip 219 to the right of vertical support rod 255 . In many cases, the width of the gap between fastener 219b and second end 219m of spring clip 219 is less than the distance D 1 described above. When the attachment portion 219a is pulled to the left during installation, the distance D between the end of the hollow shaft member 219c and the end of the rod 219e decreases to D < D 1 . Distance D is now reduced as rod 219e remains fixed in position based on the position of vertical support rod 255 and fastener 219b, while the end of hollow shaft member 219c is pulled to the left, closer to the end of rod 219e.

當以此方式裝配時,彈簧夾219及距離D適應及容許垂直支撐桿255之有限量的移動,同時確保垂直支撐桿255保持與基板202之邊緣接合並繼續支撐基板202之邊緣。在一些情況下,需要此類移動來考量及適應不同公差以及可能由熱非均一性及熱膨脹造成的基板202之膨脹,所有此等問題皆能夠造成基板在處理期間破裂及/或脫落。When assembled in this manner, spring clip 219 and distance D accommodate and allow a limited amount of movement of vertical support rod 255 while ensuring that vertical support rod 255 remains engaged with and continues to support the edge of base plate 202 . In some cases, such movement is required to account for and accommodate different tolerances and expansion of the substrate 202 that may be caused by thermal non-uniformity and thermal expansion, all of which can cause the substrate to crack and/or detach during processing.

如圖2S中所展示,在一些實施例中,為了進一步使基板之破裂最小化,可能有用的是在將附接部分219a定位及固定至分接桿240時使彈簧219d被壓縮/預負載之量/距離最佳化。為了達到此目的,可使用示位夾(witness clip)233。示位夾包括抵靠緊固件219b之表面而耦接的部分233a,及由緊固件耦接至分接桿240之部分233b,所述緊固件定位於部分233b內之細長狹槽內。示位夾233之使用實施例包括處理基板202,使得組件之熱膨脹將處於或接近最大值。在達成此類膨脹之後不久,部分233a抵靠緊固件219b之表面鄰接地定位,且部分233b緊固至分接桿240。後續冷卻將會造成組件熱收縮,此將會造成在緊固件219b與示位夾之部分233b之間形成間隙。此間隙之寬度可用以判定彈簧219d應被壓縮/預負載以達成附接部分219a之所需位置的量/距離。以此方式,可確保垂直支撐桿255繼續接觸及支撐基板202之邊緣,即使當各種材料在處理過程中熱膨脹及收縮時亦如此。As shown in Figure 2S, in some embodiments, to further minimize cracking of the substrate, it may be useful to have spring 219d compressed/preloaded when positioning and securing attachment portion 219a to tap rod 240. Volume/distance optimization. For this purpose, a witness clip 233 can be used. The index clip includes a portion 233a that is coupled against the surface of fastener 219b, and a portion 233b that is coupled to tap rod 240 by the fastener positioned within an elongated slot in portion 233b. Examples of use of position indicator clip 233 include processing substrate 202 such that thermal expansion of the component will be at or near maximum. Shortly after such expansion is achieved, portion 233a is positioned abuttingly against the surface of fastener 219b, and portion 233b is secured to tap rod 240. Subsequent cooling will cause thermal contraction of the assembly, which will cause a gap to form between fastener 219b and portion 233b of the index clip. The width of this gap can be used to determine the amount/distance that spring 219d should be compressed/preloaded to achieve the desired position of attachment portion 219a. In this manner, it is ensured that the vertical support rods 255 continue to contact and support the edges of the substrate 202 even as various materials thermally expand and contract during processing.

返回至圖3,在操作305處,藉由將基板202抵靠第一個垂直支撐桿255而置放,將第一行基板202裝載至載體200上。圖2C中亦展示了此情形。第一個垂直支撐桿255(以及其他垂直支撐桿255)包含主體區域及凸緣區域。凸緣區域自垂直支撐桿255之前面略微水平地向外延伸並接觸基板202之前側。垂直支撐桿255之主體區域定位於鄰近行基板202之間。在圖2C中,垂直支撐桿255之凸緣區域被展示為在基板202後方且在垂直支撐桿255之主體區域後方(然而,應理解,圖2C展示「後側」透視圖,且因此,當考慮塗佈時通常使用之「前側」透視圖時,凸緣區域實際上在基板202前方並遮蔽基板202之周邊區域)。Returning to FIG. 3 , at operation 305 , the first row of substrates 202 is loaded onto the carrier 200 by placing the substrates 202 against the first vertical support bar 255 . This situation is also shown in Figure 2C. The first vertical support bar 255 (as well as the other vertical support bars 255) includes a body area and a flange area. The flange area extends slightly horizontally outward from the front face of the vertical support rod 255 and contacts the front side of the base plate 202 . The main area of the vertical support rod 255 is positioned between adjacent row substrates 202 . In Figure 2C, the flange area of the vertical support bar 255 is shown behind the base plate 202 and behind the body area of the vertical support bar 255 (however, it should be understood that Figure 2C shows a "rear" perspective view, and therefore, when When considering the "front side" perspective commonly used when coating, the flange area is actually in front of the substrate 202 and shields the peripheral area of the substrate 202).

如圖2C中所展示,第一個垂直支撐桿255(以及其他垂直支撐桿255)包含多個狹槽271,每一狹槽經組態以容納銷275,銷275在垂直支撐桿255之凸緣區域與銷275之間將每一基板202抵靠垂直支撐桿255之主體區域而固定。銷275可一直沿著垂直支撐桿255之高度安裝於狹槽271中。在此實例中,銷275具有在平行於基板202之面且垂直於垂直支撐桿255之高度的方向上延伸的軸件。狹槽271提供用於附接銷275(或其他緊固件)之緊固件附接位置之一個實例。然而,圖2B中所展示之多個狹槽271不限於跨越及通過支撐桿255之三個面的形狀。As shown in Figure 2C, the first vertical support rod 255 (as well as the other vertical support rods 255) includes a plurality of slots 271, each slot configured to receive a pin 275 protruding from the vertical support rod 255. Each base plate 202 is secured against the body region of the vertical support rod 255 between the edge region and the pins 275 . Pin 275 may be mounted in slot 271 all the way along the height of vertical support rod 255. In this example, pin 275 has a shaft extending in a direction parallel to the face of base plate 202 and perpendicular to the height of vertical support rod 255 . Slot 271 provides one example of a fastener attachment location for attachment pin 275 (or other fastener). However, the plurality of slots 271 shown in FIG. 2B is not limited to a shape that spans and passes through three faces of the support rod 255 .

如圖2T中所展示,在另一實施例中,多個狹槽273包括包圍支撐桿255之一個面的形狀。在圖2T之實施例中,每一狹槽273經組態以收納保持器272之各別銷274,以便將保持器耦接至垂直支撐桿255。在圖2T之實施例中,保持器272包括兩個銷,然而,在其他實施例中,保持器可包括更少或更多的銷。保持器272包括界定扁平表面之兩個延伸凸緣276,所述扁平表面經組態以在垂直支撐桿255之凸緣281與保持器272之延伸凸緣276之間使每一基板202抵靠垂直支撐桿255之主體區域282而接合及固定。銷274包括在與基板202之面正交且垂直於垂直支撐桿255之高度的方向上延伸的軸件。在一些情況下,使用狹槽273已被發現為會向支撐桿255提供增加的結構強度,而使用保持器272已被發現為會減少基板破裂。在一些情況下,一個或多個夾子(參見圖2P之元件290)可設置於特定行中之垂直鄰近基板202之間。在其他情況下,可省略此類夾子,且可沒有定位於垂直鄰近基板202之間的實體結構。如圖2P中所展示,夾子290可具有「H」形橫截面,具有前板、後板以及連接前板及後板之軸件。當考慮處理期間使用之透視圖時,夾子之前板可定位於基板之前側/處理面前方,夾子之後板可定位於基板之後側後方,且夾子之軸件可駐存於基板之邊緣處,從而分隔垂直鄰近基板。As shown in FIG. 2T , in another embodiment, the plurality of slots 273 includes a shape that surrounds one face of the support rod 255 . In the embodiment of FIG. 2T , each slot 273 is configured to receive a respective pin 274 of the retainer 272 to couple the retainer to the vertical support rod 255 . In the embodiment of Figure 2T, retainer 272 includes two pins, however, in other embodiments, the retainer may include fewer or more pins. The retainer 272 includes two extending flanges 276 that define a flat surface configured to abut each substrate 202 between the flange 281 of the vertical support rod 255 and the extending flange 276 of the retainer 272 The main body area 282 of the vertical support rod 255 is engaged and fixed. Pin 274 includes a shaft extending in a direction orthogonal to the face of base plate 202 and perpendicular to the height of vertical support rod 255 . In some cases, the use of slots 273 has been found to provide increased structural strength to support rods 255, while the use of retainers 272 has been found to reduce substrate cracking. In some cases, one or more clips (see element 290 of Figure 2P) may be disposed between vertically adjacent substrates 202 in a particular row. In other cases, such clips may be omitted, and no physical structure may be positioned between vertically adjacent substrates 202. As shown in Figure 2P, the clip 290 may have an "H"-shaped cross-section, with a front plate, a back plate, and a shaft connecting the front and back plates. When considering the perspective used during processing, the clamp front plate can be positioned on the front side of the substrate/in front of the processing face, the clamp back plate can be positioned behind the back side of the substrate, and the shaft of the clamp can reside at the edge of the substrate so that Separate vertically adjacent substrates.

接下來,在操作307中,將第二個垂直支撐桿255安裝至載體上。在例如圖2D及圖2E中展示了第二個垂直支撐桿255。第二個垂直支撐桿255可與分接桿240可滑動地接合,使得其可定位於任何所需部位處。通常,第二個垂直支撐桿255將直接抵靠第一行中的先前安裝之基板202而安裝。然後,在操作309中,將第二行基板202裝載至載體200上。以與第一組基板202相同之方式裝載第二組基板202,如圖2D及圖2E中所展示。將第二組基板202裝載至載體200上,使得其各自與第二個垂直支撐桿255接觸。在裝載第二行基板202之後,在操作311中判定載體200是否被完全裝載有基板。若否,則所述方法繼續進行操作313及315,其中分別安裝額外垂直支撐桿255及裝載額外行基板202,直至載體200裝滿。一旦完全裝載載體200,所述方法就繼續進行操作317。此處,將最終垂直支撐桿安裝至載體上,如圖2B中所展示。可將可移動間隔件265臨時設置於最終垂直支撐桿255與垂直框架部件210之間,以提供精確間隙來容許基板202之熱膨脹。在某些實施例中,可經由自動化視覺處理來驗證此間隙。Next, in operation 307, the second vertical support rod 255 is installed to the carrier. A second vertical support bar 255 is shown, for example, in Figures 2D and 2E. The second vertical support rod 255 can slidably engage the tap rod 240 so that it can be positioned at any desired location. Typically, the second vertical support rod 255 will be installed directly against the previously installed base plate 202 in the first row. Then, in operation 309, the second row of substrates 202 is loaded onto the carrier 200. The second set of substrates 202 is loaded in the same manner as the first set of substrates 202, as shown in Figures 2D and 2E. The second set of substrates 202 is loaded onto the carrier 200 so that they are each in contact with the second vertical support rod 255 . After loading the second row of substrates 202, it is determined in operation 311 whether the carrier 200 is completely loaded with substrates. If not, the method continues with operations 313 and 315 , where additional vertical support rods 255 are installed and additional rows of substrates 202 are loaded, respectively, until the carrier 200 is full. Once the carrier 200 is completely loaded, the method continues with operation 317. Here, the final vertical support rod is mounted to the carrier as shown in Figure 2B. Movable spacers 265 may be temporarily disposed between the final vertical support rods 255 and the vertical frame members 210 to provide precise clearances to allow for thermal expansion of the substrate 202. In some embodiments, this gap can be verified via automated visual processing.

如圖2U中所展示,在一些實施例中,一個或多個第二個垂直支撐桿255可被設置有安全夾256。在一個實施例中,安全夾256設置於每一第二個垂直支撐桿255之底端及頂端處。每一安全夾256包括經組態以由一個或多個緊固件耦接至分接桿240之附接部分256a。每一安全夾256亦包括保持部分256b,其中當附接至分接桿240時,保持部分界定開口256c,第二個垂直支撐桿255之端部可通過開口256c而插入或以其他方式安裝。保持部分經組態以限制第二個垂直支撐桿255可遠離分接桿240而移動或變位之距離,例如,當耦接至支撐桿255之基板202在基板處理期間破裂時可能出現的距離。在第二個垂直支撐桿255安裝於開口256c內之後,每一安全夾256繼續容許每一垂直支撐桿沿著分接桿240在由保持部分及分接桿240界定之空間256d內可滑動地移動。As shown in Figure 2U, in some embodiments, one or more second vertical support rods 255 may be provided with safety clips 256. In one embodiment, safety clips 256 are provided at the bottom and top of each second vertical support rod 255 . Each safety clip 256 includes an attachment portion 256a configured to be coupled to the tap rod 240 by one or more fasteners. Each safety clip 256 also includes a retaining portion 256b which, when attached to the tap bar 240, defines an opening 256c through which the end of the second vertical support bar 255 may be inserted or otherwise mounted. The retaining portion is configured to limit the distance that the second vertical support bar 255 can move or displace away from the tap bar 240 , such as may occur if the substrate 202 coupled to the support bar 255 breaks during substrate processing. . After the second vertical support rod 255 is installed in the opening 256c, each safety clip 256 continues to allow each vertical support rod to slide along the tap rod 240 within the space 256d defined by the retaining portion and the tap rod 240. Move.

圖2F示出載體200之頂部區域。在分接桿240與基板202之頂部邊緣之間設置有間隙。此間隙容許基板之熱膨脹。圖2G至圖2I示出沿著基板202之頂部邊緣而安裝的樞釘280。圖2G展示處於下部位置之樞釘280,其可在基板冷卻時被使用,諸如在將基板裝載至載體200上時被使用。圖2H展示處於上部位置之樞釘280,其可在基板熱且已熱膨脹時被使用,諸如在濺鍍期間被使用。圖2I提供固定基板202之樞釘280的透視圖。在一些情況下,樞釘280可被彈簧負載。在許多情況下,重力足以確保樞釘在處理期間充分地固持到位。Figure 2F shows the top area of carrier 200. A gap is provided between tap bar 240 and the top edge of base plate 202. This gap allows for thermal expansion of the substrate. 2G-2I illustrate pivot pins 280 installed along the top edge of base plate 202. As shown in FIGS. Figure 2G shows the pivot pin 280 in a lower position, which may be used while the substrate is cooling, such as when loading the substrate onto the carrier 200. Figure 2H shows pivot pin 280 in an upper position, which may be used when the substrate is hot and has thermally expanded, such as during sputtering. Figure 2I provides a perspective view of the pivot pin 280 that secures the base plate 202. In some cases, pivot pin 280 may be spring loaded. In many cases, gravity is sufficient to ensure that the pivot pin is adequately held in place during handling.

樞釘280包含連接至分接桿240之第一端部,及固定基板202之頂部邊緣的第二端部。如圖2G至圖2I中所展示,樞釘280之第二端部可包含抵靠基板202之前側/處理側而固定的支撐結構。在一些情況下,樞釘208之第二端部可藉由接觸基板202之前側及後側兩者來固定基板202之頂部邊緣。樞釘280之第一端部以容許樞釘280圍繞此連接件樞轉之方式連接至分接桿240。以此方式,樞釘可在圖2G及圖2H中所展示之位置之間移動,以容許基板及其他材料之熱膨脹及收縮。Pivot pin 280 includes a first end connected to tap rod 240 and a second end that secures the top edge of base plate 202 . As shown in FIGS. 2G-2I , the second end of pivot pin 280 may include a support structure secured against the front/process side of substrate 202 . In some cases, the second end of pivot pin 208 may secure the top edge of base plate 202 by contacting both the front and rear sides of base plate 202 . The first end of pivot pin 280 is connected to tap lever 240 in a manner that allows pivot pin 280 to pivot about the connector. In this manner, the pins can move between the positions shown in Figures 2G and 2H to allow for thermal expansion and contraction of the substrate and other materials.

圖2J-2O展示根據三個不同實施例之垂直支撐桿255之特寫視圖。在每一實施例中,垂直支撐桿255包含凸緣區域281、主體區域282,及主體區域282中之多個狹槽271。圖2J及圖2K展示根據第一實施例之垂直支撐桿255的替代視圖。在此情況下,垂直支撐桿255之主體區域282由被形成為所需「U」形狀之單一金屬片件形成。凸緣區域281亦由單一金屬片件製成,但其實質上係扁平的。此等兩個部分經由任何可用構件結合在一起。圖2L及圖2M展示根據第二實施例之垂直支撐桿255的替代視圖。第二實施例與第一實施例不同之處在於,第二實施例包含形成垂直支撐桿255之凸緣區域281之金屬片件中的切口283,以減小垂直支撐桿255之質量。圖2N及圖2O示出根據第三實施例之垂直支撐桿255的替代視圖。第三實施例與第二實施例不同之處在於,第三實施例包含垂直支撐桿255之主體區域282中的額外切口283,以進一步減小垂直支撐桿255之質量。此外,在此實施例中,垂直支撐桿僅由扁平片件製成(例如,主體區域由附接在一起之三個金屬片件而非彎曲成「U」形狀之單一金屬片件形成)。藉由僅使用扁平片件組裝垂直支撐桿255,可使用以形成垂直支撐桿255之金屬的厚度較薄,因此進一步減小垂直支撐桿255之質量。有利的是減小垂直支撐桿之質量,因為此會使加熱及冷卻期間之熱非均一性最小化。Figures 2J-2O show close-up views of vertical support rods 255 according to three different embodiments. In each embodiment, the vertical support rod 255 includes a flange region 281 , a body region 282 , and a plurality of slots 271 in the body region 282 . Figures 2J and 2K show alternative views of the vertical support rod 255 according to the first embodiment. In this case, the body region 282 of the vertical support rod 255 is formed from a single piece of metal formed into the desired "U" shape. The flange area 281 is also made from a single piece of sheet metal, but is substantially flat. These two parts are joined together via any available means. 2L and 2M show alternative views of the vertical support rod 255 according to the second embodiment. The second embodiment differs from the first embodiment in that the second embodiment includes cutouts 283 in the metal sheet forming the flange area 281 of the vertical support rod 255 to reduce the mass of the vertical support rod 255 . Figures 2N and 2O show alternative views of the vertical support rod 255 according to the third embodiment. The third embodiment differs from the second embodiment in that the third embodiment includes additional cutouts 283 in the body region 282 of the vertical support rod 255 to further reduce the mass of the vertical support rod 255 . Furthermore, in this embodiment, the vertical support rods are made only from flat pieces (eg, the body area is formed from three pieces of metal attached together rather than a single piece of metal bent into a "U" shape). By only using flat pieces to assemble the vertical support bar 255, a thinner thickness of metal can be used to form the vertical support bar 255, thereby further reducing the mass of the vertical support bar 255. It is advantageous to reduce the mass of the vertical support rods as this will minimize thermal non-uniformities during heating and cooling.

圖2A至圖2P中所展示之實施例之一個優點係消除了圖1A及圖1B之載體100中所使用的水平支撐桿160。此等水平支撐桿在處理期間造成了相當大的問題,且經常會造成載體、塗佈機及/或基板之破裂。消除水平支撐桿會顯著地降低此類破裂之可能性,藉此提高了生產效率並降低了生產成本。此外,就圖2A至圖2P之實施例而言,不需要儲存大量水平支撐桿,此等水平支撐桿通常很大且笨重並且需要相當大的儲存空間。減少及簡化了將基板裝載至載體上所需要之硬體(例如,僅需要單一類型之銷,僅需要單一類型之垂直支撐桿,等等)。總體而言,減少了可能會潛在地破裂之零件,且實質上降低了維護成本。One advantage of the embodiment shown in Figures 2A-2P is the elimination of the horizontal support rods 160 used in the carrier 100 of Figures 1A and 1B. These horizontal support rods cause considerable problems during processing and often cause breakage of the carrier, coater and/or substrate. Eliminating horizontal support rods significantly reduces the likelihood of such fractures, thereby increasing production efficiency and reducing production costs. Furthermore, with the embodiment of Figures 2A-2P, there is no need to store a large number of horizontal support rods, which are typically large and bulky and require considerable storage space. The hardware required to load the substrate onto the carrier is reduced and simplified (e.g., only a single type of pin is required, only a single type of vertical support rod is required, etc.). Overall, there are fewer parts that could potentially break and maintenance costs are substantially reduced.

圖2A至圖2P之實施例之另一優點係由於自動化間隙驗證而降低了處理期間基板破裂之可能性。此類自動化間隙驗證較易於實施,因為垂直支撐桿與分接桿之間的可撓性/可滑動連接容許所有基板及垂直支撐桿以彼此進行實體接觸之方式裝載至載體上。僅需要沿著載體之水平寬度設置單一間隙,而非在每一水平鄰近對基板之間設置精確間隙。因為僅需要單一間隙且可在均一部位處(例如在載體之邊緣處)設置間隙,所以自動化間隙驗證(例如使用視覺處理方法)為更可行的可能性。Another advantage of the embodiment of Figures 2A-2P is that the likelihood of substrate cracking during processing is reduced due to automated gap verification. This type of automated gap verification is easier to implement because the flexible/slidable connection between the vertical support rods and tap rods allows all substrates and vertical support rods to be loaded onto the carrier in physical contact with each other. Only a single gap needs to be provided along the horizontal width of the carrier, rather than a precise gap between each horizontally adjacent pair of substrates. Since only a single gap is required and the gap can be set at a uniform location (eg at the edge of the carrier), automated gap verification (eg using vision processing methods) is a more feasible possibility.

此外,消除水平支撐桿會使載體能夠被更快地裝載,因為裝載基板且驗證間隙涉及到較少且較容易的步驟。在一些實施例中,本文中所描述之載體及方法可以自動化方式(例如利用機器人臂)完成,因此進一步減少了錯裝基板之可能性。消除水平支撐桿亦會消除基板之潛在污染源。如上文所提及,在某些情況下,水平支撐桿為伸縮式。當金屬零件彼此移動時,可刮掉微小的金屬粒子,其然後可落到基板上並污染基板。Additionally, eliminating horizontal support bars will allow carriers to be loaded faster because loading the substrate and verifying clearance involves fewer and easier steps. In some embodiments, the carriers and methods described herein can be accomplished in an automated manner (eg, using a robotic arm), thereby further reducing the possibility of mismounting substrates. Eliminating horizontal support rods also eliminates potential sources of contamination of the substrate. As mentioned above, in some cases the horizontal support rods are telescopic. When metal parts move against each other, tiny metal particles can be scraped off, which can then fall onto the substrate and contaminate it.

圖2A至圖2P中所展示之實施例之另一優點係大多數垂直支撐桿移動到基板之前側/處理側後方的位置。因此,由垂直支撐桿遮蔽之基板之周邊區(有時被稱為「咬合區」)可較小。較小的咬合區有益於下游雷射處理。Another advantage of the embodiment shown in Figures 2A-2P is that most of the vertical support rods are moved to a position behind the front side/process side of the substrate. Therefore, the peripheral area of the substrate shielded by the vertical support bars (sometimes referred to as the "bite area") can be smaller. Smaller bite area benefits downstream laser processing.

圖4A至圖4G呈現替代實施例之各種視圖。在此情況下,載體400可更容易容納不同寬度之基板402。因為基板不以行定向,所以不需要確保同一行中之基板皆具有相同寬度。一種實現此靈活性之技術係移動垂直支撐桿455,使得其靠近但不處於基板402之垂直邊緣(當然,亦可提供額外垂直支撐桿)。舉例而言,代替在一對基板202水平地鄰近之位置處設置單一垂直支撐桿255,如圖2A中所展示,可設置兩個垂直支撐桿455,其中每一垂直支撐桿略微水平地偏離基板之垂直邊緣。兩個垂直支撐桿在相反方向上偏移,如圖4A中所展示,使得每一鄰近基板在其每一垂直邊緣附近被支撐。在圖4A之實例中,將四個基板402裝載至載體400上,且使用六個垂直支撐桿455以在基板402之每一垂直邊緣附近提供支撐。4A-4G present various views of alternative embodiments. In this case, the carrier 400 can more easily accommodate substrates 402 of different widths. Because the substrates are not oriented in rows, there is no need to ensure that the substrates in the same row have the same width. One technique for achieving this flexibility is to move the vertical support rods 455 so that they are close to but not at the vertical edge of the base plate 402 (of course, additional vertical support rods may also be provided). For example, instead of providing a single vertical support bar 255 horizontally adjacent a pair of substrates 202 , as shown in FIG. 2A , two vertical support bars 455 may be provided, each vertical support bar being slightly offset horizontally from the substrates. the vertical edge. The two vertical support bars are offset in opposite directions, as shown in Figure 4A, so that each adjacent substrate is supported near each of its vertical edges. In the example of FIG. 4A , four substrates 402 are loaded onto the carrier 400 and six vertical support rods 455 are used to provide support near each vertical edge of the substrates 402 .

在此實例中,垂直支撐桿455完全定位於基板402後方。此在許多實施例中可能係有利的,因為對基板402之遮蔽實質上較少,此意謂基板之較大比例的處理面可用於處理。舉例而言,此可有益於未來雷射處理。In this example, vertical support rods 455 are positioned completely behind base plate 402 . This may be advantageous in many embodiments because there is substantially less shadowing of the substrate 402, which means that a larger proportion of the processing surface of the substrate is available for processing. This could benefit future laser processing, for example.

圖4A至圖4G中之實施例與上文所描述之實施例有許多相似性。舉例而言,載體400包含由短支柱435連接在一起之水平框架部件405及415。垂直框架部件410連接至水平框架部件405及415以形成框架。導板420及導軌425可附接至水平框架部件415,如所展示。可提供與圖1B之護罩150相似的護罩(未展示)。The embodiment in FIGS. 4A to 4G has many similarities with the embodiment described above. For example, carrier 400 includes horizontal frame members 405 and 415 connected together by short struts 435 . Vertical frame member 410 is connected to horizontal frame members 405 and 415 to form a frame. Guide plates 420 and rails 425 may be attached to horizontal frame members 415 as shown. A shield similar to shield 150 of Figure 1B may be provided (not shown).

圖4B係自「後側」透視圖被展示,並提供了安裝於分接桿440之狹槽469中之垂直支撐桿455的特寫視圖。分接桿440安裝於水平框架部件405上。垂直支撐桿455包含前面及兩個側。數個狹槽472形成於垂直支撐桿455之前面中。狹槽472提供了用於附接銷476或其他緊固件之緊固件附接位置之一個實例。狹槽472垂直地定向(例如其最長尺寸上下伸展),且經組態以收納銷476。銷476為可用以將基板固定至垂直支撐桿之緊固件之一個實例。在此實例中,狹槽472包含靠近狹槽472之頂部的開口,且銷476可配合通過所述開口。銷476可位於狹槽472內之任何垂直部位處。在許多情況下,銷476位於狹槽472之底部處,但情況並非總是如此。圖4B中之銷476亦將基板402維持於與分接桿440之前凸緣區域共面的位置,如在圖4D中更清楚地所見。4B is shown from a "backside" perspective and provides a close-up view of the vertical support rod 455 installed in the slot 469 of the tap rod 440. Tap bar 440 is mounted on horizontal frame member 405. Vertical support rod 455 includes a front face and two sides. Several slots 472 are formed in the front face of the vertical support rod 455. Slot 472 provides one example of a fastener attachment location for attaching pin 476 or other fasteners. Slot 472 is vertically oriented (eg, its longest dimension extends up and down) and configured to receive pin 476 . Pin 476 is one example of a fastener that can be used to secure the base plate to the vertical support pole. In this example, slot 472 includes an opening near the top of slot 472 and pin 476 can fit through the opening. Pin 476 may be located at any vertical location within slot 472. In many cases, pin 476 is located at the bottom of slot 472, but this is not always the case. Pin 476 in Figure 4B also maintains base plate 402 in a coplanar position with the forward flange area of tap bar 440, as seen more clearly in Figure 4D.

圖4C係自「前側」透視圖被展示,並提供了將兩個基板402固定至垂直支撐桿455上之銷476的特寫視圖。銷476將基板402維持於適當位置,使得其共面且彼此垂直地分隔。Figure 4C is shown from a "front" perspective and provides a close-up view of the pins 476 that secure the two base plates 402 to the vertical support rods 455. Pins 476 maintain the base plates 402 in place so that they are coplanar and vertically spaced apart from each other.

圖4D亦係自「前側」透視圖被展示,並示出了將兩個基板402固定至兩個垂直支撐桿455上之銷476。銷476亦使基板402與垂直支撐座440之前凸緣區域維持共面關係。垂直支撐桿455設置於兩個基板402會合之垂直邊緣附近但略微遠離的位置處。銷476安裝於垂直支撐桿之狹槽472內。Figure 4D is also shown from a "front" perspective and shows the pins 476 securing the two base plates 402 to the two vertical support bars 455. Pins 476 also maintain a coplanar relationship between the base plate 402 and the front flange area of the vertical support 440. The vertical support rod 455 is disposed near but slightly away from the vertical edge where the two substrates 402 meet. The pin 476 is installed in the slot 472 of the vertical support rod.

圖4E展示圖4D中所展示之組態的橫截面圖。具體而言,圖4E展示銷476,銷476安裝於狹槽472中以在垂直支撐桿455與分接桿440連接的垂直支撐桿455之底部處將基板402固定至垂直支撐桿455上。如上文所描述,銷476固定基板402並使其與分接桿440之前凸緣區域維持共面關係。在圖4E中,基板之前側/處理面在左邊,且基板之後側在右邊。Figure 4E shows a cross-sectional view of the configuration shown in Figure 4D. Specifically, FIG. 4E shows pin 476 installed in slot 472 to secure base plate 402 to vertical support bar 455 at the bottom of vertical support bar 455 where it connects to tap bar 440. As described above, the pins 476 secure the base plate 402 in a coplanar relationship with the forward flange area of the tap bar 440 . In Figure 4E, the substrate front side/processing side is on the left and the substrate back side is on the right.

銷476包含前板、後板、中間板,以及連接前板、中間板及後板之軸件。所述板相對小,但足夠大以固定基板402之邊緣。在圖4E中,前板被展示為在銷476之左邊部分(在基板402之前側/處理面前方),後板被展示為在銷476之右邊部分(在垂直支撐桿455之面後方),且中間板定位於前板與後板之間(及基板之後側與垂直支撐桿455之面之間)。銷476之軸件在垂直於基板402之面的方向上延伸。The pin 476 includes a front plate, a rear plate, a middle plate, and a shaft connecting the front plate, the middle plate, and the rear plate. The plates are relatively small, but large enough to secure the edges of the base plate 402. In Figure 4E, the front plate is shown to the left of pin 476 (in front of the front side of base plate 402/processing face), and the back plate is shown to the right of pin 476 (behind the face of vertical support bar 455), And the middle plate is positioned between the front plate and the rear plate (and between the rear side of the base plate and the surface of the vertical support rod 455). The shaft of pin 476 extends in a direction perpendicular to the surface of base plate 402 .

圖4F示出裝載至兩個垂直支撐桿455上之三個基板402的「前側」視圖。銷476配合至狹槽472中以將基板402固定至垂直支撐桿455。銷476定位於垂直鄰近基板402之鄰近邊緣之間。值得注意的是,基板402不以行定向,且任何寬度之基板可根據需要而匹配在一起。代替行,基板以列定向,同一列中之基板具有相同高度。雖然仍然可能涉及某一基板幾何匹配,但載體佈局具有實質上更大的靈活性,且消除了與水平支撐桿相關聯之問題。Figure 4F shows a "front" view of three substrates 402 loaded onto two vertical support bars 455. Pins 476 fit into slots 472 to secure base plate 402 to vertical support rods 455 . Pins 476 are positioned vertically between adjacent edges of substrate 402 . Notably, the substrates 402 are not oriented in rows, and substrates of any width can be matched together as desired. Instead of rows, the substrates are oriented in columns, with substrates in the same column having the same height. While some substrate geometry matching may still be involved, the carrier layout allows substantially greater flexibility and eliminates the problems associated with horizontal support rods.

圖4G描繪圖4F中所展示之組態的橫截面圖。具體而言,圖4G展示固定及分隔兩個垂直鄰近基板402之銷476。銷476使兩個基板402維持共面關係。圖4G中所展示之夾子476與圖4E中所展示之銷476相似或相同。一個差異為,圖4E之夾子476定位於單一基板與分接桿440之前凸緣區域之間,而圖4G之夾子476定位於兩個垂直鄰近基板之間。Figure 4G depicts a cross-sectional view of the configuration shown in Figure 4F. Specifically, Figure 4G shows pins 476 that secure and separate two vertically adjacent substrates 402. Pins 476 maintain the two substrates 402 in a coplanar relationship. The clip 476 shown in Figure 4G is similar or identical to the pin 476 shown in Figure 4E. One difference is that the clip 476 of Figure 4E is positioned between a single base plate and the forward flange area of tap bar 440, while the clip 476 of Figure 4G is positioned between two vertically adjacent base plates.

圖4B至圖4G之銷476與圖2P之夾子290相似。在夾子290分隔垂直鄰近基板時,銷476進行相同操作,同時將基板固定至垂直支撐桿455。夾子290僅包含兩個板(例如前板及後板),而銷476包含額外中間板。此等兩個元件以相似方式起作用,以將鄰近基板固定為共面關係。在一些實施例中,兩者皆可被使用。The pin 476 of Figures 4B-4G is similar to the clip 290 of Figure 2P. As clamps 290 separate vertically adjacent substrates, pins 476 perform the same operation while securing the substrates to vertical support rods 455. Clamp 290 includes only two plates (eg, front and back), while pin 476 includes an additional middle plate. These two elements function in a similar manner to secure adjacent substrates in a coplanar relationship. In some embodiments, both may be used.

儘管圖4A至圖4G中未展示,但樞釘可沿著基板402之頂部邊緣而設置,與圖2G至圖2I中所展示之樞釘280相似。關於圖2A至圖2P之實施例所描述的各種其他細節亦可適用於圖4A至圖4G之實施例。可根據特定應用之需要而組合各種硬體組件。Although not shown in Figures 4A-4G, pivot pins may be provided along the top edge of base plate 402, similar to pivot pins 280 shown in Figures 2G-2I. Various other details described with respect to the embodiment of FIGS. 2A-2P may also apply to the embodiment of FIGS. 4A-4G. Various hardware components can be combined according to the needs of specific applications.

圖4A至圖4G中所展示之實施例提供了上文關於圖2A至圖2P之實施例所描述的許多相同益處。一個值得注意的益處係消除了先前引入許多處理挑戰之水平支撐桿。另一重要優點為,基板能夠在處理期間熱膨脹(水平地及垂直地兩者),且實質上降低了破裂之可能性。在圖2A至圖2P之實施例中,基板可水平地及垂直地膨脹而不會破裂,從而不需要在每一對水平鄰近基板之間設置精確間隙,此係由於垂直支撐桿可沿著分接桿水平地滑動或以其他方式移動以適應此類膨脹及收縮之事實。在圖4A至圖4G之實施例中,基板可水平地膨脹及收縮而不會破裂,從而不需要在每一對鄰近基板之間設置精確間隙,此係由於基板可在仍然由銷476固定時水平地移動之事實。因而,實質上簡化了將基板裝載至載體上之程序。代替在每一對水平及/或垂直鄰近基板之間設置精確間隙,可抵靠彼此及/或抵靠垂直支撐桿相對緊密地裝載基板。僅需要設置兩個間隙,一個間隙容許垂直膨脹(例如,基板之頂部邊緣與上部分接桿之間的間隙),且一個間隙容許水平膨脹(例如,通常但未必接近垂直框架部件)。隨著基板膨脹,其可在基板之平面內彼此輕輕地推動,使得一個或多個基板膨脹至每一間隙中。就本文中所描述之設計而言,顯著地降低了基板及塗佈機破裂之風險。The embodiment shown in Figures 4A-4G provides many of the same benefits described above with respect to the embodiment of Figures 2A-2P. A notable benefit is the elimination of horizontal support bars that previously introduced many handling challenges. Another important advantage is that the substrate is able to thermally expand (both horizontally and vertically) during processing and the likelihood of cracking is substantially reduced. In the embodiment of FIGS. 2A-2P , the substrates can expand both horizontally and vertically without cracking, eliminating the need for precise gaps between each pair of horizontally adjacent substrates because the vertical support rods can expand along the dividing lines. The post slides or otherwise moves horizontally to accommodate such expansion and contraction. In the embodiment of FIGS. 4A-4G , the substrates can expand and contract horizontally without cracking, eliminating the need for precise gaps between each pair of adjacent substrates since the substrates can expand and contract horizontally while still being secured by pins 476 The fact of moving horizontally. Therefore, the process of loading the substrate onto the carrier is substantially simplified. Instead of providing a precise gap between each pair of horizontally and/or vertically adjacent substrates, the substrates can be loaded relatively closely against each other and/or against vertical support bars. Only two gaps need to be provided, one to allow for vertical expansion (e.g., the gap between the top edge of the base plate and the upper junction bar), and one to allow for horizontal expansion (e.g., usually but not necessarily close to the vertical frame members). As the substrates expand, they can push each other slightly in the plane of the substrates, causing one or more substrates to expand into each gap. With the design described in this article, the risk of substrate and coater breakage is significantly reduced.

應理解,本文中所描述之組態及/或方法本質上係例示性的,且此等特定實施例或實例不應被視為具有限制性意義,因為許多變化係可能的。本文中所描述之特定常式或方法可表示任何數量之處理策略中之一者或多者。因而,所示出之各種動作可以所示出之順序執行,以其他順序執行,並行地執行,或在一些情況下被省略。同樣,可改變上文所描述之程序之次序。某些參考文獻已以引用之方式併入本文中。應理解,在此類參考文獻中作出之任何免責聲明或否定未必適用於本文中所描述之實施例。相似地,在本文中之實施例中可省略在此類參考文獻中被描述為必要的任何特徵。It should be understood that the configurations and/or methods described herein are illustrative in nature and such specific embodiments or examples should not be considered in a limiting sense as many variations are possible. The particular routines or methods described herein may represent one or more of any number of processing strategies. Thus, various actions shown may be performed in the order shown, in another order, in parallel, or in some cases omitted. Likewise, the order of the procedures described above can be changed. Certain references are incorporated herein by reference. It should be understood that any disclaimer or disclaimer made in such a reference does not necessarily apply to the embodiments described herein. Similarly, any features described as essential in such references may be omitted from the embodiments herein.

本揭示案之主題包含各種程序、系統及組態之所有新穎及非顯而易見的組合及子組合,及本文中所揭示之其他特徵、功能、動作及/或性質,以及其任何及所有等同物。The subject matter of this disclosure includes all novel and non-obvious combinations and subcombinations of the various programs, systems, and configurations, and other features, functions, acts, and/or properties disclosed herein, and any and all equivalents thereof.

100:載體 101:孔隙 102:基板 105:水平框架部件 110:垂直框架部件 115:水平框架部件 120:導板 125:導軌 130:重疊區段 135:短支柱 140:分接桿 145:螺柱 150:護罩 155:垂直支撐桿 160:水平支撐桿 200:載體 202:基板 205:水平框架部件 210:垂直框架部件 215:水平框架部件 219:彈簧夾 219a:附接部分 219b:緊固件 219c:空心軸件 219d:彈簧 219e:棒 219f:保持器 219m:第二端部 220:導板 225:導軌 233:示位夾 233a:部分 233b:部分 235:短支柱 240:分接桿 255:垂直支撐桿 256:安全夾 256a:附接部分 256b:保持部分 256c:開口 256d:空間 265:可移動間隔件 270:托架 271:狹槽 273:狹槽 274:銷 275:銷/保持器 276:延伸凸緣 280:樞釘 281:凸緣區域 282:主體區域 283:切口 290:夾子 300:方法 301:操作 303:操作 305:操作 307:操作 309:操作 311:操作 313:操作 315:操作 317:操作 400:載體 402:基板 405:水平框架部件 410:垂直框架部件 415:水平框架部件 420:導板 425:導軌 435:短支柱 440:分接桿 455:垂直支撐桿 469:狹槽 472:狹槽 476:銷 2B:圓圈 2C:圓圈 2D:圓圈 2E:圓圈 D:距離 100:carrier 101:pore 102:Substrate 105:Horizontal frame components 110:Vertical frame parts 115:Horizontal frame components 120: Guide plate 125: Guide rail 130: Overlapping sections 135:Short pillar 140: Tap lever 145:Stud 150:shield 155:Vertical support rod 160: Horizontal support rod 200:carrier 202:Substrate 205:Horizontal frame components 210:Vertical frame components 215:Horizontal frame components 219: Spring clip 219a: Attachment part 219b: Fasteners 219c: Hollow shaft parts 219d:Spring 219e:Great 219f: retainer 219m: second end 220: Guide plate 225: Guide rail 233: Position indicating clip 233a: Part 233b:Part 235:Short pillar 240: Tap lever 255:Vertical support rod 256:Safety clip 256a: Attachment part 256b: keep part 256c:Open your mouth 256d:space 265: Removable spacer 270: Bracket 271:Slot 273:Slot 274:pin 275: Pin/Retainer 276:Extension flange 280: Pivot nail 281: Flange area 282:Main area 283:Incision 290:Clip 300:Method 301: Operation 303: Operation 305: Operation 307: Operation 309: Operation 311: Operation 313: Operation 315: Operation 317: Operation 400: Carrier 402:Substrate 405:Horizontal frame components 410:Vertical frame components 415:Horizontal frame components 420: Guide plate 425: Guide rail 435:Short pillar 440: Tap lever 455:Vertical support rod 469:Slot 472:Slot 476:Pin 2B: Circle 2C: Circle 2D: circle 2E: Circle D: distance

圖1A及圖1B示出用於隨著基板移動通過處理設備而支撐基板之載體。1A and 1B illustrate a carrier for supporting a substrate as it moves through processing equipment.

圖2A示出根據一個實施例的用於隨著基板移動通過處理設備而支撐基板之載體。Figure 2A illustrates a carrier for supporting a substrate as it moves through processing equipment, according to one embodiment.

圖2B至圖2D示出圖2A中所展示之實施例之部分的特寫後側視圖,其展示了在沿著底部分接桿之不同部位處安裝於所述分接桿上的垂直支撐桿。Figures 2B-2D show close-up rear side views of portions of the embodiment shown in Figure 2A showing vertical support rods mounted on the bottom tap bar at various locations along the tap bar.

圖2E展示圖2A中所展示之實施例之部分的特寫後側視圖,其示出了分隔兩鄰近行基板之垂直支撐桿。2E shows a close-up rear side view of a portion of the embodiment shown in FIG. 2A showing the vertical support rods that separate two adjacent rows of substrates.

圖2F描繪圖2A中所展示之實施例之部分的特寫後側視圖,其展示了頂部分接桿。Figure 2F depicts a close-up rear side view of a portion of the embodiment shown in Figure 2A showing the top patching post.

圖2G至圖2I各自示出沿著頂部分接桿安裝並與基板之頂部邊緣接合的樞釘。Figures 2G-2I each show a pivot pin mounted along the top split rod and engaging the top edge of the base plate.

圖2J至圖2O展示根據若干實施例之垂直支撐桿的不同視圖。Figures 2J-2O show different views of vertical support rods according to several embodiments.

圖2P示出根據某些實施例的可用以分隔垂直鄰近基板之夾子的橫截面圖。2P illustrates a cross-sectional view of a clip that may be used to separate vertically adjacent substrates in accordance with certain embodiments.

圖2Q及圖2R示出由彈簧夾固定至分接桿之第一個垂直支撐桿。Figures 2Q and 2R show the first vertical support rod secured to the tap rod by spring clips.

圖2S描繪根據一個實施例之彈簧夾之實例。Figure 2S depicts an example of a spring clip according to one embodiment.

圖2T展示根據某些實施例的可用以將玻璃固定至垂直支撐桿之保持器及銷。Figure 2T shows retainers and pins that may be used to secure glass to vertical support rods in accordance with certain embodiments.

圖2U示出在一些實施例中可在垂直支撐桿之邊緣處使用的安全夾。Figure 2U illustrates a safety clip that may be used at the edge of a vertical support pole in some embodiments.

圖3為描述將基板裝載至關於圖2A至圖2P所描述之載體上之方法的流程圖。3 is a flowchart describing a method of loading a substrate onto the carrier described with respect to FIGS. 2A-2P.

圖4A描繪根據一個實施例的用於隨著基板移動通過處理設備而支撐基板之載體。Figure 4A depicts a carrier for supporting a substrate as it moves through processing equipment, according to one embodiment.

圖4B展示圖4A之實施例之部分的特寫後側視圖,其展示了安裝於底部分接桿上之垂直支撐桿。Figure 4B shows a close-up rear side view of a portion of the embodiment of Figure 4A showing the vertical support rods mounted on the bottom split rods.

圖4C展示圖4A之實施例之部分的特寫前側視圖,其展示了安裝於垂直支撐桿中以將兩個垂直鄰近基板固定至垂直支撐桿之銷。4C shows a close-up front side view of a portion of the embodiment of FIG. 4A showing pins installed in the vertical support rods to secure two vertically adjacent substrates to the vertical support rods.

圖4D示出圖4A之實施例之部分的特寫前側視圖,其展示了經由使用銷而固定至垂直支撐桿及底部分接桿上之兩個基板。Figure 4D shows a close-up front side view of a portion of the embodiment of Figure 4A showing two base plates secured to the vertical support bar and the bottom split bar through the use of pins.

圖4E展示圖4D中所展示之實施例的橫截面圖。Figure 4E shows a cross-sectional view of the embodiment shown in Figure 4D.

圖4F示出圖4A之實施例之部分的特寫前側視圖,其展示了經由銷而裝載至兩個垂直支撐桿上之三個基板。Figure 4F shows a close-up front side view of a portion of the embodiment of Figure 4A showing three substrates loaded via pins onto two vertical support rods.

圖4G描繪圖4F中所展示之實施例的橫截面圖。Figure 4G depicts a cross-sectional view of the embodiment shown in Figure 4F.

200:載體 200:carrier

202:基板 202:Substrate

205:水平框架部件 205:Horizontal frame components

210:垂直框架部件 210:Vertical frame components

215:水平框架部件 215:Horizontal frame components

220:導板 220: Guide plate

225:導軌 225: Guide rail

235:短支柱 235:Short pillar

240:分接桿 240: Tap lever

255:垂直支撐桿 255:Vertical support rod

2B:圓圈 2B: Circle

2C:圓圈 2C: Circle

2D:圓圈 2D: circle

2E:圓圈 2E: Circle

Claims (10)

一種用於在至少一個基板通過一塗佈機時將所述至少一個基板固持於一實質上垂直定向上之載體,所述塗佈機在所述至少一個基板之至少一前表面上提供一塗層,所述載體包括: 一底部分接桿; 一頂部分接桿; 多個垂直支撐桿,每一垂直支撐桿具有准許與所述頂部分接桿及所述底部分接桿兩者接合之一長度,其中所述多個垂直支撐桿包括至少一最左邊及一最右邊垂直支撐桿,且其中所述多個垂直支撐桿與所述底部及頂部分接桿之組合界定了一個或多個孔隙;及 多個附件,其用於與所述底部分接桿及所述頂部分接桿接合,以准許所述多個垂直支撐桿中之至少一者沿著所述底部及頂部分接桿水平地移動。 A carrier for holding at least one substrate in a substantially vertical orientation as it passes through a coater that provides a coating on at least one front surface of the at least one substrate layer, the carrier includes: One bottom part connects the rod; a top connecting rod; A plurality of vertical support rods, each vertical support rod having a length permitting engagement with both the top junction pole and the bottom junction pole, wherein the plurality of vertical support poles include at least a leftmost and a leftmost a right vertical support rod, and wherein the combination of said plurality of vertical support rods and said bottom and top portioning rods defines one or more apertures; and A plurality of attachments for engaging the bottom and top portioning bars to permit horizontal movement of at least one of the plurality of vertical support bars along the bottom and top portioning bars . 如申請專利範圍第1項所述之載體,其進一步包括用於將所述基板之端部緊固至所述垂直支撐桿之多個緊固件, 其中每一垂直支撐桿具有多個緊固件附接位置以用於在多個垂直位置處附接至所述多個緊固件。 The carrier as described in item 1 of the patent application further includes a plurality of fasteners for fastening the end of the base plate to the vertical support rod, wherein each vertical support rod has a plurality of fastener attachment locations for attachment to the plurality of fasteners at a plurality of vertical positions. 如申請專利範圍第1項所述之載體,其中每一垂直支撐桿沿著所述垂直支撐桿之一扁平表面與所述基板接合。The carrier as claimed in claim 1, wherein each vertical support rod is joined to the substrate along a flat surface of the vertical support rod. 如申請專利範圍第3項所述之載體,其中每一緊固件包括至少一個銷或釘。The carrier described in item 3 of the patent application, wherein each fastener includes at least one pin or nail. 如申請專利範圍第4項所述之載體,其中每一緊固件包括至少兩個銷或釘。For the carrier described in item 4 of the patent application, each fastener includes at least two pins or nails. 如申請專利範圍第2項所述之載體,其中所述多個緊固件附接位置包括所述垂直支撐桿中之多個狹槽、孔道、凹槽或其他開口。The carrier of claim 2, wherein the plurality of fastener attachment locations include a plurality of slots, holes, grooves or other openings in the vertical support rods. 如申請專利範圍第1項所述之載體,其中所述至少一個孔隙之一水平尺寸介於約50吋與200吋之間。The carrier as claimed in claim 1, wherein a horizontal dimension of the at least one pore is between about 50 inches and 200 inches. 如申請專利範圍第1項所述之載體,其中所述孔隙之一垂直尺寸介於約50吋與150吋之間。The carrier as claimed in claim 1, wherein a vertical dimension of the pores is between about 50 inches and 150 inches. 如申請專利範圍第1項所述之載體,其中所述基板包括玻璃或塑膠。The carrier as described in item 1 of the patent application, wherein the substrate includes glass or plastic. 如申請專利範圍第1項所述之載體,其中所述基板為將利用一電致變色裝置進行塗佈之一窗口。The carrier as described in item 1 of the patent application, wherein the substrate is a window to be coated using an electrochromic device.
TW112113685A 2018-03-13 2019-03-12 Carrier with vertical grid for supporting substrates in coater TW202332513A (en)

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TWI799531B (en) 2023-04-21
EP3765653A1 (en) 2021-01-20
TW201940246A (en) 2019-10-16

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