TW202327018A - Circuit protection chip packaged component and method of manufacturing the same - Google Patents

Circuit protection chip packaged component and method of manufacturing the same Download PDF

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TW202327018A
TW202327018A TW110148079A TW110148079A TW202327018A TW 202327018 A TW202327018 A TW 202327018A TW 110148079 A TW110148079 A TW 110148079A TW 110148079 A TW110148079 A TW 110148079A TW 202327018 A TW202327018 A TW 202327018A
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Taiwan
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protection chip
circuit protection
layer
circuit
conductive
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TW110148079A
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Chinese (zh)
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郭冠宏
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源芯半導體股份有限公司
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Publication of TW202327018A publication Critical patent/TW202327018A/en

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Abstract

A circuit protection chip packaged component and a method of manufacturing the same are provided. The circuit protection chip packaged component includes a circuit protection chip, an enclosing structure, and a wiring structure. The circuit protection chip includes at least one electrical contact. The enclosing structure surrounds the circuit protection chip and the electrical contact. The wiring structure is disposed on the enclosing structure and includes an inner wiring layer and an external conductive structure. The external conductive structure is electrically connected to the electrical contact through the inner wiring layer. An overlapping area between two orthographic projections of the inner wiring layer and the circuit protection chip is 0.5% to 15% of an area of the orthographic projection of the circuit protection chip.

Description

電路保護晶片封裝件及其製造方法Circuit protection chip package and manufacturing method thereof

本發明涉及一種晶片封裝元件及其製造方法,且特別是關於一種電路保護晶片封裝件及其製造方法。The present invention relates to a chip package component and its manufacturing method, and in particular to a circuit protection chip package and its manufacturing method.

現有的電子產品中,通常會利用靜電放電防護元件,來避免因電子產品內的電路因靜電放電(electrostatic discharge, ESD)而受損。現有的靜電放電防護元件為晶片封裝後的元件。靜電放電防護元件包括晶片、導電線路層與導線架。晶片通過佈設於晶片與導線架之間的導電線路層,以使晶片的多個接墊會分別電性連接到導線架的不同引腳部。In existing electronic products, electrostatic discharge protection components are usually used to prevent circuits in the electronic products from being damaged by electrostatic discharge (ESD). Existing electrostatic discharge protection components are chip packaged components. The electrostatic discharge protection components include chips, conductive circuit layers and lead frames. The chip passes through the conductive circuit layer arranged between the chip and the lead frame, so that multiple pads of the chip are electrically connected to different pins of the lead frame respectively.

然而,導電線路層或者導線架與晶片內部的元件之間會產生寄生電容,導致靜電放電防護元件的等效電容偏高。However, parasitic capacitance will be generated between the conductive circuit layer or the lead frame and the components inside the chip, resulting in high equivalent capacitance of the ESD protection component.

本發明所要解決的技術問題在於,針對現有技術的不足提供一種電路保護晶片封裝件及其製造方法,可降低電路保護晶片封裝件的等效電容。The technical problem to be solved by the present invention is to provide a circuit protection chip package and a manufacturing method thereof, which can reduce the equivalent capacitance of the circuit protection chip package.

為了解決上述的技術問題,本發明所採用的另外一技術方案是,提供一種電路保護晶片封裝件,其包括電路保護晶片、包覆結構以及線路結構。電路保護晶片具有至少一電連接點。包覆結構包覆電路保護晶片以及電連接點。線路結構設置在包覆結構上,並包括一內線路層以及一外導電結構。外導電結構通過內線路層而電性連接於至少一電連接點。內線路層的垂直投影與電路保護晶片的垂直投影之間的一重疊面積,占電路保護晶片的垂直投影面積的0.5%至15%。In order to solve the above technical problems, another technical solution adopted by the present invention is to provide a circuit protection chip package, which includes a circuit protection chip, a wrapping structure and a circuit structure. The circuit protection chip has at least one electrical connection point. The covering structure covers the circuit protection chip and the electrical connection point. The circuit structure is disposed on the cladding structure, and includes an inner circuit layer and an outer conductive structure. The outer conductive structure is electrically connected to at least one electrical connection point through the inner circuit layer. An overlapping area between the vertical projection of the inner circuit layer and the vertical projection of the circuit protection chip accounts for 0.5% to 15% of the vertical projection area of the circuit protection chip.

為了解決上述的技術問題,本發明所採用的另外再一技術方案是,提供一種電路保護晶片封裝件的製造方法,其包括下列步驟:設置一電路保護晶片在暫時性基板上,其中,電路保護晶片具有至少一電連接點;形成第一包覆層,以包覆電路保護晶片的側表面以及至少一電連接點,其中,至少一電連接點部分地裸露在所述第一包覆層的頂面;形成一線路結構於第一包覆層上,其中,線路結構包括內線路層以及外導電結構,外導電結構通過內線路層而電性連接於電連接點;以及分離電路保護晶片及暫時性基板。In order to solve the above-mentioned technical problems, another technical solution adopted by the present invention is to provide a method for manufacturing a circuit protection chip package, which includes the following steps: arranging a circuit protection chip on a temporary substrate, wherein the circuit protection The chip has at least one electrical connection point; a first cladding layer is formed to cover the side surface of the circuit protection chip and at least one electrical connection point, wherein at least one electrical connection point is partially exposed on the first cladding layer top surface; forming a circuit structure on the first cladding layer, wherein the circuit structure includes an inner circuit layer and an outer conductive structure, and the outer conductive structure is electrically connected to the electrical connection point through the inner circuit layer; and separating the circuit protection chip and Temporary substrate.

本發明的其中一有益效果在於,本發明所提供的電路保護晶片封裝件及其製造方法,其能通過“內線路層的垂直投影與電路保護晶片的垂直投影之間的一重疊面積,占電路保護晶片的垂直投影面積的0.5%至15%”的技術方案,以減少電路保護晶片封裝件的等效電容。One of the beneficial effects of the present invention is that the circuit protection chip package and its manufacturing method provided by the present invention can occupy an overlapping area between the vertical projection of the inner circuit layer and the vertical projection of the circuit protection chip, occupying 0.5% to 15% of the vertical projected area of the protection chip" technical solution to reduce the equivalent capacitance of the circuit protection chip package.

為使能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與圖式,然而所提供的圖式僅用於提供參考與說明,並非用來對本發明加以限制。In order to further understand the features and technical content of the present invention, please refer to the following detailed description and drawings related to the present invention. However, the provided drawings are only for reference and description, and are not intended to limit the present invention.

以下是通過特定的具體實施例來說明本發明所公開有關“電路保護晶片封裝件及其製造方法”的實施方式,本領域技術人員可由本說明書所公開的內容瞭解本發明的優點與效果。本發明可通過其他不同的具體實施例加以施行或應用,本說明書中的各項細節也可基於不同觀點與應用,在不悖離本發明的構思下進行各種修改與變更。另外,本發明的附圖僅為簡單示意說明,並非依實際尺寸的描繪,事先聲明。以下的實施方式將進一步詳細說明本發明的相關技術內容,但所公開的內容並非用以限制本發明的保護範圍。The following is an illustration of the implementation of the "circuit protection chip package and its manufacturing method" disclosed by the present invention through specific specific examples. Those skilled in the art can understand the advantages and effects of the present invention from the content disclosed in this specification. The present invention can be implemented or applied through other different specific embodiments, and various modifications and changes can be made to the details in this specification based on different viewpoints and applications without departing from the concept of the present invention. In addition, the drawings of the present invention are only for simple illustration, and are not drawn according to the actual size, which is stated in advance. The following embodiments will further describe the relevant technical content of the present invention in detail, but the disclosed content is not intended to limit the protection scope of the present invention.

應當可以理解的是,雖然本文中可能會使用到“第一”、“第二”、“第三”等術語來描述各種元件或者信號,但這些元件或者信號不應受這些術語的限制。這些術語主要是用以區分一元件與另一元件,或者一信號與另一信號。另外,本文中所使用的術語“或”,應視實際情況可能包括相關聯的列出項目中的任一個或者多個的組合。It should be understood that although terms such as "first", "second", and "third" may be used herein to describe various elements or signals, these elements or signals should not be limited by these terms. These terms are mainly used to distinguish one element from another element, or one signal from another signal. In addition, the term "or" used herein may include any one or a combination of more of the associated listed items depending on the actual situation.

[第一實施例][first embodiment]

請參照圖1與圖2,圖1為本發明第一實施例的電路保護晶片封裝件的俯視示意圖,且圖2為圖1的II-II剖面的剖面示意圖。本實施例的電路保護晶片封裝件M1可以被應用於電子產品的電路設計中,以避免靜電放電損壞電子產品的電路。在本實施例中,電路保護晶片封裝件M1為扇出式封裝(fan-out package),且包括電路保護晶片1、包覆結構2以及線路結構3。Please refer to FIGS. 1 and 2 . FIG. 1 is a schematic top view of a circuit protection chip package according to a first embodiment of the present invention, and FIG. 2 is a schematic cross-sectional view of the II-II section of FIG. 1 . The circuit protection chip package M1 of the present embodiment can be applied in the circuit design of electronic products, so as to prevent electrostatic discharge from damaging the circuits of the electronic products. In this embodiment, the circuit protection chip package M1 is a fan-out package, and includes a circuit protection chip 1 , a wrapping structure 2 and a wiring structure 3 .

電路保護晶片1可以是暫態電壓抑制晶片(transient voltage suppressor, TSV)、電磁濾波器、壓敏電阻或者氣體放電管等,本發明並不限制。進一步而言,當電路保護晶片1為暫態電壓抑制晶片時,電路保護晶片1可包含,但不限於,二極體、雙極性電晶體(BJT)、齊納二極體(Zener diode)、矽控整流器(silicon controlled rectifier, SCR)中的一種或者多種。可以在晶圓製造階段,通過現有的半導體製程,來製作本發明實施例的電路保護晶片1。The circuit protection chip 1 may be a transient voltage suppressor (TSV), electromagnetic filter, varistor, or gas discharge tube, etc., which is not limited by the present invention. Further, when the circuit protection chip 1 is a transient voltage suppression chip, the circuit protection chip 1 may include, but not limited to, a diode, a bipolar transistor (BJT), a Zener diode (Zener diode), One or more of silicon controlled rectifiers (SCR). The circuit protection chip 1 of the embodiment of the present invention can be produced in the wafer manufacturing stage through the existing semiconductor manufacturing process.

如圖2所示,電路保護晶片1包括上表面1a、底面1b以及連接於上表面1a與底面1b之間的側表面1c。電路保護晶片1還具有位於上表面1a的至少一電連接點100A, 100B(圖2繪示兩個為例)。前述的電連接點100A, 100B可以是焊球、導電凸塊、導電層或導電柱等,本發明並不限制。As shown in FIG. 2 , the circuit protection chip 1 includes an upper surface 1 a, a bottom surface 1 b, and a side surface 1 c connected between the upper surface 1 a and the bottom surface 1 b. The circuit protection chip 1 also has at least one electrical connection point 100A, 100B located on the upper surface 1a (two are shown in FIG. 2 as an example). The aforementioned electrical connection points 100A, 100B may be solder balls, conductive bumps, conductive layers or conductive pillars, etc., which are not limited by the present invention.

請繼續參照圖2,包覆結構2包覆電路保護晶片1以及前述的電連接點100A, 100B。在本實施例中,包覆結構2包覆電路保護晶片1的上表面1a、底面1b以及側表面1c。詳細而言,包覆結構2可包括第一包覆層21以及第二包覆層22。Please continue to refer to FIG. 2 , the encapsulation structure 2 encloses the circuit protection chip 1 and the aforementioned electrical connection points 100A, 100B. In this embodiment, the covering structure 2 covers the upper surface 1 a , the bottom surface 1 b and the side surface 1 c of the circuit protection chip 1 . In detail, the cladding structure 2 may include a first cladding layer 21 and a second cladding layer 22 .

如圖2所示,第一包覆層21包覆電路保護晶片1的上表面1a以及側表面1c。據此,電路保護晶片1是內埋在第一包覆層21內。第一包覆層21具有一連接面21a以及與連接面21a相對的一下表面21b。須說明的是,電連接點100A, 100B會有一部分未被第一包覆層21所包覆,而裸露在第一包覆層21的連接面21a上。在一實施例中,第一包覆層21的連接面21a會與電連接點100A, 100B的頂表面100s齊平,但本發明不以此為限。在另一實施例中,第一包覆層21的連接面21a與電連接點100A, 100B的頂表面100s之間也可以具有高度差。As shown in FIG. 2 , the first coating layer 21 covers the upper surface 1 a and the side surface 1 c of the circuit protection chip 1 . Accordingly, the circuit protection chip 1 is embedded in the first cladding layer 21 . The first cladding layer 21 has a connection surface 21a and a lower surface 21b opposite to the connection surface 21a. It should be noted that some of the electrical connection points 100A, 100B are not covered by the first coating layer 21 , but are exposed on the connection surface 21 a of the first coating layer 21 . In one embodiment, the connection surface 21a of the first cladding layer 21 is flush with the top surface 100s of the electrical connection points 100A, 100B, but the invention is not limited thereto. In another embodiment, there may also be a height difference between the connection surface 21a of the first cladding layer 21 and the top surface 100s of the electrical connection points 100A, 100B.

第二包覆層22至少包覆電路保護晶片1的底面1b。在本實施例中,第二包覆層22還覆蓋第一包覆層21的下表面21b。也就是說,第二包覆層22是由電路保護晶片1的底面1b延伸到第一包覆層21的下表面21b。第一包覆層21與第二包覆層22的材料可以是模封材料,如:環氧樹脂(expoxy)、聚醯亞胺(polyimide, PI)、酚醛樹脂(phenolics)、矽樹脂(silicones)等,本發明並不限制。另外,第一包覆層21與第二包覆層22的材料可以相同而一體成型。然而,在另一實施例中,第一包覆層21與第二包覆層22也可以分別由不同材料構成,並在不同的步驟中製作。The second coating layer 22 covers at least the bottom surface 1 b of the circuit protection chip 1 . In this embodiment, the second cladding layer 22 also covers the lower surface 21 b of the first cladding layer 21 . That is to say, the second cladding layer 22 extends from the bottom surface 1 b of the circuit protection chip 1 to the lower surface 21 b of the first cladding layer 21 . The material of the first cladding layer 21 and the second cladding layer 22 can be a molding material, such as: epoxy resin (expoxy), polyimide (polyimide, PI), phenolic resin (phenolics), silicone resin (silicones) ), etc., the present invention is not limited. In addition, the first cladding layer 21 and the second cladding layer 22 may be made of the same material and integrally formed. However, in another embodiment, the first cladding layer 21 and the second cladding layer 22 may also be made of different materials and manufactured in different steps.

請參照圖2,線路結構3設置在包覆結構2上。線路結構3可以是由導電材料層與絕緣材料層堆疊而形成的疊層結構,或者是線路板。線路結構3至少包括一內線路層31以及外導電結構32。詳細而言,內線路層31設置在第一包覆層21的連接面21a上,且通過電連接點100A, 100B而與電路保護晶片1電性連接。外導電結構32通過內線路層31而電性連接於電連接點100A, 100B。Referring to FIG. 2 , the circuit structure 3 is disposed on the covering structure 2 . The circuit structure 3 may be a laminated structure formed by stacking conductive material layers and insulating material layers, or a circuit board. The circuit structure 3 at least includes an inner circuit layer 31 and an outer conductive structure 32 . In detail, the inner circuit layer 31 is disposed on the connection surface 21a of the first cladding layer 21, and is electrically connected to the circuit protection chip 1 through the electrical connection points 100A, 100B. The outer conductive structure 32 is electrically connected to the electrical connection points 100A, 100B through the inner circuit layer 31 .

內線路層31會與電連接點100A, 100B連接,且內線路層31是由電路保護晶片1上方位置沿著第一包覆層21的連接面21a,而延伸到超過電路保護晶片1的側表面1c。也就是說,內線路層31會與電路保護晶片1在電路保護晶片1的一厚度方向上部分地重疊。須說明的是,內線路層31與電路保護晶片1之間會部分地重疊,而產生寄生電容。The inner circuit layer 31 will be connected to the electrical connection points 100A, 100B, and the inner circuit layer 31 is extended from the position above the circuit protection chip 1 along the connection surface 21a of the first cladding layer 21 to the side beyond the circuit protection chip 1 Surface 1c. That is to say, the inner circuit layer 31 partially overlaps with the circuit protection chip 1 in a thickness direction of the circuit protection chip 1 . It should be noted that the inner circuit layer 31 and the circuit protection chip 1 will partially overlap to generate parasitic capacitance.

據此,在本發明實施例中,是通過縮減內線路層31與電路保護晶片1的重疊區域面積,來減少寄生電容,進而降低電路保護晶片封裝件M1的等效電容。具體而言,在本發明中,內線路層31的垂直投影與電路保護晶片1的垂直投影之間的重疊面積,占電路保護晶片1的垂直投影面積的0.5%至15%。Accordingly, in the embodiment of the present invention, the parasitic capacitance is reduced by reducing the overlapping area of the inner circuit layer 31 and the circuit protection chip 1 , thereby reducing the equivalent capacitance of the circuit protection chip package M1 . Specifically, in the present invention, the overlapping area between the vertical projection of the inner circuit layer 31 and the vertical projection of the circuit protection chip 1 accounts for 0.5% to 15% of the vertical projection area of the circuit protection chip 1 .

以圖1所示的內線路層31為例來進行說明。內線路層31包括對應於電連接點100A, 100B的圖案化導電部31A, 31B。在本實施例中,電路保護晶片1具有兩個電連接點100A, 100B。因此,內線路層31具有分別對應於兩個電連接點100A, 100B的兩個圖案化導電部31A, 31B。然而,本發明並不限制圖案化導電部31A, 31B的數量。當電路保護晶片1只具有一個電連接點100A, 100B,或者具有兩個以上的電連接點100A, 100B時,內線路層31可以包括一或多個圖案化導電部31A, 31B。The inner line layer 31 shown in FIG. 1 is taken as an example for description. The inner wiring layer 31 includes patterned conductive portions 31A, 31B corresponding to the electrical connection points 100A, 100B. In this embodiment, the circuit protection chip 1 has two electrical connection points 100A, 100B. Therefore, the inner wiring layer 31 has two patterned conductive portions 31A, 31B respectively corresponding to the two electrical connection points 100A, 100B. However, the present invention does not limit the number of patterned conductive parts 31A, 31B. When the circuit protection chip 1 has only one electrical connection point 100A, 100B, or has more than two electrical connection points 100A, 100B, the inner circuit layer 31 may include one or more patterned conductive parts 31A, 31B.

每一圖案化導電部31A, 31B包括一主體部分310以及連接於主體部分310的延伸部分311。延伸部分311由電連接點100A, 100B上方延伸至超過電路保護晶片1的側表面1c,且延伸部分311的垂直投影面積是電連接點100A, 100B的垂直投影面積的4至6倍。在本實施例中,重疊面積即為兩個延伸部分311的垂直投影與電路保護晶片1的垂直投影的重疊區域的面積總和。Each patterned conductive portion 31A, 31B includes a main body portion 310 and an extension portion 311 connected to the main body portion 310 . The extension portion 311 extends from above the electrical connection points 100A, 100B to beyond the side surface 1c of the circuit protection chip 1, and the vertical projected area of the extension portion 311 is 4 to 6 times the vertical projected area of the electrical connection points 100A, 100B. In this embodiment, the overlapping area is the sum of areas of overlapping areas of the vertical projections of the two extension portions 311 and the vertical projection of the circuit protection chip 1 .

另外,主體部分310是位於第一包覆層21上,而沒有與電路保護晶片1重疊。延伸部分311由電路保護晶片1上方延伸至主體部分310。如圖1所示,在本實施例中,主體部分310的俯視面積是大於延伸部分311的俯視面積。In addition, the main body portion 310 is located on the first cladding layer 21 without overlapping with the circuit protection chip 1 . The extension portion 311 extends from above the circuit protection chip 1 to the main body portion 310 . As shown in FIG. 1 , in this embodiment, the top view area of the main body portion 310 is larger than the top view area of the extension portion 311 .

請參照圖2,本實施例的線路結構3包括第一絕緣層30,而內線路層31與第一絕緣層30共同形成在第一包覆層21的連接面21a上。詳細而言,內線路層31的圖案化導電部31A, 31B會裸露在第一絕緣層30外。另外,內線路層31的兩個圖案化導電部31A, 31B彼此分離而定義出一開口31H。因此,第一絕緣層30的一部分會填入內線路層31所定義出的開口31H內。在本實施例中,每一圖案化導電部31A, 31B的上表面會與第一絕緣層30的上表面齊平。Referring to FIG. 2 , the wiring structure 3 of this embodiment includes a first insulating layer 30 , and the inner wiring layer 31 and the first insulating layer 30 are jointly formed on the connecting surface 21 a of the first cladding layer 21 . In detail, the patterned conductive portions 31A, 31B of the inner circuit layer 31 are exposed outside the first insulating layer 30 . In addition, the two patterned conductive portions 31A, 31B of the inner circuit layer 31 are separated from each other to define an opening 31H. Therefore, a part of the first insulating layer 30 will fill in the opening 31H defined by the inner wiring layer 31 . In this embodiment, the upper surface of each patterned conductive portion 31A, 31B is flush with the upper surface of the first insulating layer 30 .

電路保護晶片封裝件M1還進一步包括導電連接部33A, 33B,期分別對應於電連接點100A, 100B。如前所述,電路保護晶片1具有兩個電連接點100A, 100B,因此兩個導電連接部33A, 33B分別電性連接於電連接點100A, 100B。進一步而言,每一導電連接部33A, 33B會電性且實體接觸對應的圖案化導電部31A, 31B,以電性連接於對應的電連接點100A, 100B。換言之,本實施例的內線路層31與外導電結構32之間彼此分隔一距離,而導電連接部33A, 33B會連接於內線路層31與外導電結構32之間。The circuit protection chip package M1 further includes conductive connection portions 33A, 33B corresponding to the electrical connection points 100A, 100B, respectively. As mentioned above, the circuit protection chip 1 has two electrical connection points 100A, 100B, so the two conductive connection portions 33A, 33B are respectively electrically connected to the electrical connection points 100A, 100B. Furthermore, each conductive connection portion 33A, 33B electrically and physically contacts the corresponding patterned conductive portion 31A, 31B, so as to be electrically connected to the corresponding electrical connection point 100A, 100B. In other words, in this embodiment, the inner circuit layer 31 and the outer conductive structure 32 are separated by a distance, and the conductive connection parts 33A, 33B are connected between the inner circuit layer 31 and the outer conductive structure 32 .

須說明的是,導電連接部33A, 33B的數量並不以本實施例為限。另外,導電連接部33A, 33B可以是焊球、導電柱、導電凸塊或是導電孔中的任一者。在本實施例中,導電連接部33A, 33B為焊球。然而,在其他實施例中,導電連接部33A, 33B也可以替換為導電柱或者是導電孔。在本實施例中,線路結構3還包括第二絕緣層34,而導電連接部33A, 33B是嵌埋在第二絕緣層34內。另外,導電連接部33A, 33B的頂面33s會與第二絕緣層34的外表面34s齊平。It should be noted that the number of the conductive connecting parts 33A, 33B is not limited by this embodiment. In addition, the conductive connection portions 33A, 33B can be any one of solder balls, conductive pillars, conductive bumps, or conductive holes. In this embodiment, the conductive connection parts 33A, 33B are solder balls. However, in other embodiments, the conductive connecting portions 33A, 33B may also be replaced by conductive pillars or conductive holes. In this embodiment, the wiring structure 3 further includes a second insulating layer 34 , and the conductive connection parts 33A, 33B are embedded in the second insulating layer 34 . In addition, the top surfaces 33s of the conductive connection portions 33A, 33B are flush with the outer surface 34s of the second insulating layer 34 .

請參照圖2,外導電結構32設置在第二絕緣層34上,並且連接於導電連接部33A, 33B。詳細而言,外導電結構32包括至少一電性接觸襯墊32A, 32B,其電性且實體連接於對應的導電連接部33A, 33B,從而電性連接於對應的電連接點100A, 100B。也就是說,電性接觸襯墊32A, 32B可作為電路保護晶片封裝件M1的外部接點,而使電路保護晶片1可電性連接至另一電路板(圖未示)。如圖2所示,兩個電性接觸襯墊32A, 32B分別電性連接於電路保護晶片1的兩個電連接點100A, 100B。然而,本發明並不限制電性接觸襯墊32A, 32B的數量。Referring to FIG. 2 , the outer conductive structure 32 is disposed on the second insulating layer 34 and connected to the conductive connection portions 33A, 33B. In detail, the outer conductive structure 32 includes at least one electrical contact pad 32A, 32B, which is electrically and physically connected to the corresponding conductive connection portion 33A, 33B, thereby electrically connected to the corresponding electrical connection point 100A, 100B. That is to say, the electrical contact pads 32A, 32B can be used as external contacts of the circuit protection chip package M1, so that the circuit protection chip 1 can be electrically connected to another circuit board (not shown). As shown in FIG. 2 , the two electrical contact pads 32A, 32B are respectively electrically connected to the two electrical connection points 100A, 100B of the circuit protection chip 1 . However, the present invention does not limit the number of electrical contact pads 32A, 32B.

請再參照圖1,電性接觸襯墊32A, 32B的垂直投影會與對應的圖案化導電部31A, 31B的主體部分310重疊。進一步而言,在本實施例中,電性接觸襯墊32A, 32B的垂直投影面積會大於主體部分310的垂直投影面積,但本發明不以此為限。Referring to FIG. 1 again, the vertical projections of the electrical contact pads 32A, 32B overlap with the main body portions 310 of the corresponding patterned conductive portions 31A, 31B. Further, in this embodiment, the vertical projected area of the electrical contact pads 32A, 32B is larger than the vertical projected area of the main body portion 310 , but the present invention is not limited thereto.

值得注意的是,在本實施例中,任一個電性接觸襯墊32A(32B)與沒有和其電性連接的圖案化導電部31B(31A)之間,也會產生寄生電容。據此,本實施例中,通過在內線路層31與外導電結構32之間設置導電連接部33A, 33B,可以增加電性接觸襯墊32A(32B) 與圖案化導電部31B(31A)之間的距離,而進一步使電路保護晶片封裝件M1的等效電容降低。It should be noted that, in this embodiment, a parasitic capacitance is also generated between any one of the electrical contact pads 32A ( 32B) and the patterned conductive portion 31B ( 31A) that is not electrically connected to it. Accordingly, in this embodiment, by providing the conductive connection parts 33A, 33B between the inner circuit layer 31 and the outer conductive structure 32, the distance between the electrical contact pad 32A (32B) and the patterned conductive part 31B (31A) can be increased. The distance between them further reduces the equivalent capacitance of the circuit protection chip package M1.

[第二實施例][Second embodiment]

請參照圖3,其顯示本發明第二實施例的電路保護晶片封裝件的剖面示意圖。本實施例的電路保護晶片封裝件M2與第一實施例的電路保護晶片封裝件M1相同的元件具有相同的標號,且相同的部分不再贅述。Please refer to FIG. 3 , which shows a schematic cross-sectional view of a circuit protection chip package according to a second embodiment of the present invention. The same components of the circuit protection chip package M2 of the present embodiment and the circuit protection chip package M1 of the first embodiment have the same reference numerals, and the same parts will not be repeated.

在本實施例中,線路結構3為線路板,且包括絕緣層35、內線路層31以及外導電結構32。內線路層31與外導電結構32分別位於絕緣層35的兩相反側,且通過導電連接部33A, 33B而相互電性連接。在本實施例中,導電連接部33A, 33B可以是貫穿絕緣層35的導電柱或者導電孔。In this embodiment, the circuit structure 3 is a circuit board, and includes an insulating layer 35 , an inner circuit layer 31 and an outer conductive structure 32 . The inner circuit layer 31 and the outer conductive structure 32 are respectively located on two opposite sides of the insulating layer 35, and are electrically connected to each other through the conductive connecting portions 33A, 33B. In this embodiment, the conductive connection portions 33A, 33B may be conductive pillars or conductive holes penetrating through the insulating layer 35 .

另外,內線路層31的兩個圖案化導電部31A, 31B可以通過導電材料L1而固定在第一包覆層21上,並且分別電性連接於電路保護晶片1的兩個電連接點100A, 100B。前述的導電材料L1例如是導電膠或錫,本發明並不限制。另外,在本實施例中,絕緣層35並未填入內線路層31所定義的開口31H內。據此,內線路層31所定義的開口31H內為空氣,而並未填充其他絕緣材料。In addition, the two patterned conductive parts 31A, 31B of the inner circuit layer 31 can be fixed on the first cladding layer 21 through the conductive material L1, and are respectively electrically connected to the two electrical connection points 100A, 100B. The aforementioned conductive material L1 is, for example, conductive glue or tin, which is not limited in the present invention. In addition, in this embodiment, the insulating layer 35 is not filled into the opening 31H defined by the inner wiring layer 31 . Accordingly, the opening 31H defined by the inner circuit layer 31 is filled with air and not filled with other insulating materials.

相似於第一實施例,在本實施例中,內線路層31的垂直投影與電路保護晶片1的垂直投影的重疊面積,占電路保護晶片1的垂直投影面積的0.5%至15%,而可降低內線路層31與電路保護晶片1之間的寄生電容。另外,相較於現有技術,本實施例的外導電結構32與電路保護晶片1之間的距離因導電連接部33A, 33B的設置而增加,也可降低外導電結構32與電路保護晶片1之間的寄生電容。整體而言,電路保護晶片封裝件M2的等效電容會降低。Similar to the first embodiment, in this embodiment, the overlapping area of the vertical projection of the inner line layer 31 and the vertical projection of the circuit protection chip 1 accounts for 0.5% to 15% of the vertical projection area of the circuit protection chip 1, and can be The parasitic capacitance between the inner circuit layer 31 and the circuit protection chip 1 is reduced. In addition, compared with the prior art, the distance between the outer conductive structure 32 and the circuit protection chip 1 of this embodiment is increased due to the setting of the conductive connection parts 33A, 33B, which can also reduce the distance between the outer conductive structure 32 and the circuit protection chip 1. the parasitic capacitance between them. Overall, the equivalent capacitance of the circuit protection chip package M2 will be reduced.

[第三實施例][Third embodiment]

請參照圖4,其顯示本發明第三實施例的電路保護晶片封裝件的剖面示意圖。本實施例的電路保護晶片封裝件M3與第一實施例的電路保護晶片封裝件M1相同的元件具有相同的標號,且相同的部分不再贅述。Please refer to FIG. 4 , which shows a schematic cross-sectional view of a circuit protection chip package according to a third embodiment of the present invention. The same components of the circuit protection chip package M3 of the present embodiment and the circuit protection chip package M1 of the first embodiment have the same reference numerals, and the same parts will not be repeated.

相較於第一實施例的電路保護晶片封裝件M1,本實施例的電路保護晶片封裝件M3省略了導電連接部33A, 33B。也就是說,在本實施例中,線路結構3’包括內線路層31以及外導電結構32,且外導電結構32是直接接觸內線路層31。Compared with the circuit protection chip package M1 of the first embodiment, the circuit protection chip package M3 of this embodiment omits the conductive connection parts 33A, 33B. That is to say, in this embodiment, the wiring structure 3' includes the inner wiring layer 31 and the outer conductive structure 32, and the outer conductive structure 32 is in direct contact with the inner wiring layer 31.

詳細而言,本實施例的內線路層31與第一絕緣層30共同位於第一包覆層21的連接面21a上。另外,外導電結構32的每一個電性接觸襯墊32A, 32B是直接設置在對應的圖案化導電部31A, 31B上。相似於第一實施例的電路保護晶片封裝件M1,本實施例中,每一個電性接觸襯墊32A, 32B的垂直投影會局部地重疊於對應的圖案化導電部31A, 31B。另外,每一個電性接觸襯墊32A, 32B的垂直投影面積,大於主體部分310的垂直投影面積。據此,每一個電性接觸襯墊32A, 32B會由對應的圖案化導電部31A, 31B延伸到第一絕緣層30。In detail, the inner wiring layer 31 and the first insulating layer 30 of this embodiment are located on the connection surface 21 a of the first cladding layer 21 together. In addition, each electrical contact pad 32A, 32B of the outer conductive structure 32 is directly disposed on the corresponding patterned conductive portion 31A, 31B. Similar to the circuit protection chip package M1 of the first embodiment, in this embodiment, the vertical projection of each electrical contact pad 32A, 32B partially overlaps the corresponding patterned conductive portion 31A, 31B. In addition, the vertical projected area of each electrical contact pad 32A, 32B is larger than the vertical projected area of the main body portion 310 . Accordingly, each electrical contact pad 32A, 32B extends from the corresponding patterned conductive portion 31A, 31B to the first insulating layer 30 .

在本實施例中,內線路層31的垂直投影與電路保護晶片1的垂直投影之間的一重疊面積,也是占電路保護晶片1的垂直投影的面積的0.5%至15%。因此,同樣可以降低內線路層31與電路保護晶片1之間的寄生電容。換句話說,即便本實施例的電路保護晶片封裝件M1省略導電連接部33A, 33B,但仍可降低電路保護晶片封裝件M3的等效電容。In this embodiment, an overlapping area between the vertical projection of the inner circuit layer 31 and the vertical projection of the circuit protection chip 1 also accounts for 0.5% to 15% of the area of the vertical projection of the circuit protection chip 1 . Therefore, the parasitic capacitance between the inner circuit layer 31 and the circuit protection chip 1 can also be reduced. In other words, even though the circuit protection chip package M1 of this embodiment omits the conductive connection portions 33A, 33B, the equivalent capacitance of the circuit protection chip package M3 can still be reduced.

請參照圖5,顯示本發明實施例的電路保護晶片封裝件的製造方法的流程圖。在步驟S10中,設置電路保護晶片在暫時性基板上;在步驟S11中,形成第一包覆層,以包覆電路保護晶片;在步驟S12中,形成一線路結構於第一包覆層上;在步驟S13中,分離電路保護晶片及暫時性基板;以及在步驟S14中,形成第二包覆層,以包覆電路保護晶片的底部。Please refer to FIG. 5 , which shows a flowchart of a method for manufacturing a circuit protection chip package according to an embodiment of the present invention. In step S10, a circuit protection chip is placed on the temporary substrate; in step S11, a first coating layer is formed to cover the circuit protection chip; in step S12, a circuit structure is formed on the first coating layer ; In step S13, separate the circuit protection chip and the temporary substrate; and in step S14, form a second coating layer to cover the bottom of the circuit protection chip.

以下以製造第一實施例的電路保護晶片封裝件M1為例,來說明本發明實施例的電路保護晶片封裝件的製造方法。請參照圖6,將電路保護晶片1設置在暫時性基板B1上。如前所述,電路保護晶片1已通過半導體製程而在其內部形成可用來防護靜電放電的元件。電路保護晶片1具有設置於其上表面1a的兩個電連接點100A, 100B。須說明的是,暫時性基板B1可以包括一板體(圖未示)以及設置在板體上的可剝離層(圖未示),其中板體的材料可以是陶瓷、金屬、塑膠或者是複合材料,本發明並不限制。Taking the manufacturing of the circuit protection chip package M1 of the first embodiment as an example, the manufacturing method of the circuit protection chip package according to the embodiment of the present invention will be described below. Referring to FIG. 6 , the circuit protection chip 1 is disposed on the temporary substrate B1 . As mentioned above, the circuit protection chip 1 has been formed inside the circuit protection chip 1 to protect against electrostatic discharge. The circuit protection chip 1 has two electrical connection points 100A, 100B disposed on its upper surface 1a. It should be noted that the temporary substrate B1 may include a plate body (not shown in the figure) and a peelable layer (not shown in the figure) arranged on the plate body, wherein the material of the plate body may be ceramic, metal, plastic or composite materials, the present invention is not limited.

請參照圖7以及圖8,顯示本發明實施例形成第一包覆層21的詳細步驟。如圖7所示,形成初始包覆層21’,以完全包覆所述電路保護晶片1以及電連接點100A, 100B。同時,初始包覆層21’也會覆蓋暫時性基板B1的表面。Please refer to FIG. 7 and FIG. 8 , which show the detailed steps of forming the first cladding layer 21 according to the embodiment of the present invention. As shown in FIG. 7, an initial coating layer 21' is formed to completely cover the circuit protection chip 1 and the electrical connection points 100A, 100B. At the same time, the initial cladding layer 21' will also cover the surface of the temporary substrate B1.

請參照圖8,去除初始包覆層21’的一部分,以裸露電路保護晶片1的電連接點100A, 100B,並形成第一包覆層21。據此,電連接點100A, 100B會裸露在第一包覆層21外。第一包覆層21會具有連接於暫時性基板B1的下表面21b以及與下表面21b相對的連接面21a。在一實施例中,可以通過研磨製程,來去除初始包覆層21’,直到電路保護晶片1的電連接點100A, 100B被裸露出來。因此,電連接點100A, 100B的頂表面100s會與第一包覆層21的連接面21a齊平,但本發明並不限制。Referring to FIG. 8, a part of the initial cladding layer 21' is removed to expose the electrical connection points 100A, 100B of the circuit protection chip 1, and the first cladding layer 21 is formed. Accordingly, the electrical connection points 100A, 100B will be exposed outside the first cladding layer 21 . The first cladding layer 21 has a lower surface 21b connected to the temporary substrate B1 and a connecting surface 21a opposite to the lower surface 21b. In one embodiment, the initial cladding layer 21' may be removed through a grinding process until the electrical connection points 100A, 100B of the circuit protection chip 1 are exposed. Therefore, the top surfaces 100s of the electrical connection points 100A, 100B are flush with the connection surface 21a of the first cladding layer 21 , but the invention is not limited thereto.

請參照圖5的步驟S121,並配合參照圖9,形成內線路層31於第一包覆層21上。內線路層31包括分別對應於電連接點100A, 100B的兩個圖案化導電部31A, 31B。須說明的是,圖案化導電部31A, 31B的俯視形狀可以參考圖1,在此並不贅述。本實施例中,兩個圖案化導電部31A, 31B彼此分離,且分別設置在兩個電連接點100A, 100B的頂表面100s上。據此,內線路層31定義出一開口31H。Please refer to step S121 of FIG. 5 , and refer to FIG. 9 together, to form the inner wiring layer 31 on the first cladding layer 21 . The inner wiring layer 31 includes two patterned conductive portions 31A, 31B respectively corresponding to the electrical connection points 100A, 100B. It should be noted that, the top view shapes of the patterned conductive portions 31A, 31B can refer to FIG. 1 , which will not be repeated here. In this embodiment, the two patterned conductive portions 31A, 31B are separated from each other, and are respectively disposed on the top surfaces 100s of the two electrical connection points 100A, 100B. Accordingly, the inner wiring layer 31 defines an opening 31H.

請參照圖5的步驟S122,並配合參照圖10,形成第一絕緣層30’於內線路層31上。在圖10中,第一絕緣層30’會完全覆蓋內線路層31,且第一絕緣層30’的一部分會填入內線路層31的開口31H內。之後,去除第一絕緣層30’的一部分,以裸露出內線路層31的兩個圖案化導電部31A, 31B。在一實施例中,可以通過研磨製程來去除第一絕緣層30’,直到內線路層31被裸露出來。據此,每一圖案化導電部31A, 31B的上表面會與第一絕緣層30的上表面齊平。在其他實施例中,也可以通過雷射鑽孔,將覆蓋圖案化導電部31A, 31B的第一絕緣層30’去除,本發明並不限制。Please refer to step S122 of FIG. 5 , and refer to FIG. 10 together, to form a first insulating layer 30' on the inner circuit layer 31. Referring to FIG. In FIG. 10 , the first insulating layer 30' will completely cover the inner wiring layer 31, and a part of the first insulating layer 30' will fill in the opening 31H of the inner wiring layer 31. Afterwards, a part of the first insulating layer 30' is removed to expose the two patterned conductive portions 31A, 31B of the inner circuit layer 31. In one embodiment, the first insulating layer 30' may be removed through a grinding process until the inner wiring layer 31 is exposed. Accordingly, the upper surface of each patterned conductive portion 31A, 31B is flush with the upper surface of the first insulating layer 30 . In other embodiments, the first insulating layer 30' covering the patterned conductive parts 31A, 31B may also be removed by laser drilling, which is not limited by the present invention.

請參照圖5的步驟S123,並配合參照圖11,形成導電連接部33A, 33B於內線路層31上。在本實施例中,導電連接部33A, 33B可以是焊球、導電柱、導電凸塊或是導電孔中的任一者。如圖11所示,兩個導電連接部33A, 33B可分別設置在兩個圖案化導電部31A, 31B上,以分別電性連接兩個電連接點100A, 100B。Please refer to step S123 of FIG. 5 , and refer to FIG. 11 together, to form the conductive connection portions 33A, 33B on the inner circuit layer 31 . In this embodiment, the conductive connection portions 33A, 33B may be any one of solder balls, conductive pillars, conductive bumps or conductive holes. As shown in FIG. 11 , the two conductive connection portions 33A, 33B can be respectively disposed on the two patterned conductive portions 31A, 31B to electrically connect the two electrical connection points 100A, 100B respectively.

請參照圖5的步驟S124,並配合參照圖12,形成第二絕緣層34’完全覆蓋內線路層31以及導電連接部33A, 33B。之後,請參照圖12,去除第二絕緣層34’的一部分,以使導電連接部33A, 33B可部分地裸露在第二絕緣層34的外表面34s。如前所述,可以通過研磨製程來去除第二絕緣層34’,直到導電連接部33A, 33B被裸露出來。據此,如圖13所示,每一導電連接部33A, 33B的頂面33s會與第二絕緣層34的外表面34s齊平,但本發明並不限制。Please refer to step S124 in FIG. 5 , and refer to FIG. 12 together, forming a second insulating layer 34' to completely cover the inner circuit layer 31 and the conductive connection portions 33A, 33B. After that, referring to FIG. 12 , a part of the second insulating layer 34' is removed, so that the conductive connecting portions 33A, 33B can be partially exposed on the outer surface 34s of the second insulating layer 34. As mentioned above, the second insulating layer 34' can be removed through a grinding process until the conductive connecting portions 33A, 33B are exposed. Accordingly, as shown in FIG. 13 , the top surface 33s of each conductive connection portion 33A, 33B will be flush with the outer surface 34s of the second insulating layer 34 , but the invention is not limited thereto.

請參照圖5的步驟S125,並配合參照圖14,形成外導電結構32於導電連接部33A, 33B的頂面33s上。進一步而言,外導電結構32的兩個電性接觸襯墊32A, 32B可分別對應於兩個導電連接部33A, 33B的位置。通過執行上述步驟S121至步驟S125,可以形成圖2所示的第一實施例的電路保護晶片封裝件M1中的線路結構3。Please refer to step S125 of FIG. 5 , and refer to FIG. 14 in conjunction with forming an external conductive structure 32 on the top surface 33s of the conductive connecting portion 33A, 33B. Further, the two electrical contact pads 32A, 32B of the outer conductive structure 32 may respectively correspond to the positions of the two conductive connection parts 33A, 33B. By performing the above steps S121 to S125, the circuit structure 3 in the circuit protection chip package M1 of the first embodiment shown in FIG. 2 can be formed.

請再參照圖5,在本發明另一實施例的製造方法中,步驟S123至步驟S124也可以省略。也就是在執行步驟S122之後,直接執行步驟S125,可形成圖4所示的第三實施例的電路保護晶片封裝件M3中的線路結構3’。在這個情況下,外導電結構32是直接形成在內線路層31上。進一步而言,每一個電性接觸襯墊32A, 32B是直接形成在對應的圖案化導電部31A, 31B上。Please refer to FIG. 5 again, in the manufacturing method according to another embodiment of the present invention, step S123 to step S124 can also be omitted. That is, after step S122 is performed, step S125 is directly performed to form the circuit structure 3' in the circuit protection chip package M3 of the third embodiment shown in FIG. 4 . In this case, the outer conductive structure 32 is directly formed on the inner wiring layer 31 . Furthermore, each electrical contact pad 32A, 32B is directly formed on the corresponding patterned conductive portion 31A, 31B.

除此之外,在另一實施例的製造方法中,步驟S122也可以被省略。也就是說,在執行步驟S121之後,直接執行步驟S123至步驟S125。詳細而言,在形成內線路層31之後,直接形成導電連接部33A, 33B在內線路層31上。之後,形成絕緣層覆蓋導電連接部33A, 33B與內線路層31,並且使導電連接部33A, 33B部分地裸露在絕緣層的外表面。之後,再形成與導電連接部33A, 33B電性接觸的外導電結構32。Besides, in the manufacturing method of another embodiment, step S122 can also be omitted. That is to say, after step S121 is performed, step S123 to step S125 are directly performed. In detail, after the inner wiring layer 31 is formed, the conductive connection portions 33A, 33B are directly formed on the inner wiring layer 31 . Afterwards, an insulating layer is formed to cover the conductive connection portions 33A, 33B and the inner circuit layer 31, and the conductive connection portions 33A, 33B are partially exposed on the outer surface of the insulating layer. Afterwards, the outer conductive structure 32 electrically contacting the conductive connecting portions 33A, 33B is formed.

請參照圖15,在完成線路結構3的製作之後,分離電路保護晶片1及暫時性基板B1。請參照圖16,形成第二包覆層22,以包覆電路保護晶片1的底面1b,以形成電路保護晶片封裝件M1。在本實施例中,第二包覆層22會形成在第一包覆層21的下表面21b以及電路保護晶片1的底面1b上,但本發明並不限制。在另一實施例,第二包覆層22也可以只形成在電路保護晶片1的底面1b上。Referring to FIG. 15 , after the circuit structure 3 is fabricated, the circuit protection chip 1 and the temporary substrate B1 are separated. Referring to FIG. 16 , a second coating layer 22 is formed to cover the bottom surface 1 b of the circuit protection chip 1 to form a circuit protection chip package M1 . In this embodiment, the second cladding layer 22 is formed on the lower surface 21 b of the first cladding layer 21 and the bottom surface 1 b of the circuit protection chip 1 , but the invention is not limited thereto. In another embodiment, the second cladding layer 22 may also be formed only on the bottom surface 1 b of the circuit protection wafer 1 .

請參照圖17,顯示本發明另一實施例的電路保護晶片封裝件的製造方法的流程圖。在本實施例中,在形成線路結構3於第一包覆層21上的步驟(步驟S12)可以包括 :在步驟S126中,提供預先形成的線路結構;以及在步驟S127中,設置線路結構於第一包覆層上。Please refer to FIG. 17 , which shows a flowchart of a method for manufacturing a circuit protection chip package according to another embodiment of the present invention. In this embodiment, the step of forming the circuit structure 3 on the first cladding layer 21 (step S12) may include: in step S126, providing a pre-formed circuit structure; and in step S127, setting the circuit structure on on the first coating layer.

請參照圖18,可接續圖10所示的步驟。在本實施例中,線路結構3可以是一線路板,而可預先被製作。線路結構3可以包括絕緣層35、內線路層31、外導電結構32以及導電連接部33A, 33B。內線路層31與外導電結構32分別位於絕緣層35的兩相反側,且通過導電連接部33A, 33B而相互電性連接。Referring to FIG. 18 , the steps shown in FIG. 10 can be continued. In this embodiment, the circuit structure 3 can be a circuit board, which can be fabricated in advance. The wiring structure 3 may include an insulating layer 35 , an inner wiring layer 31 , an outer conductive structure 32 and conductive connection parts 33A, 33B. The inner circuit layer 31 and the outer conductive structure 32 are respectively located on two opposite sides of the insulating layer 35, and are electrically connected to each other through the conductive connecting portions 33A, 33B.

請參照圖19,將預形成的線路結構3直接設置在第一包覆層21上,且內線路層31的兩個圖案化導電部31A, 31B的延伸部分311,會分別對準於兩個電連接點100A, 100B。兩個圖案化導電部31A, 31B可以通過導電材料L1,而分別與兩個電連接點100A, 100B電性連接,並固定在第一包覆層21上。前述的導電材料L1例如是,但不限於導電膠或錫。然而,本發明並不限制將線路結構3固定在第一包覆層21上的方式。在另一實施例中,也可以通過焊接而使線路結構3固定在第一包覆層21上。Please refer to FIG. 19 , the preformed circuit structure 3 is directly disposed on the first cladding layer 21, and the extensions 311 of the two patterned conductive parts 31A, 31B of the inner circuit layer 31 will be respectively aligned on the two Electrical connection points 100A, 100B. The two patterned conductive parts 31A, 31B can be respectively electrically connected to the two electrical connection points 100A, 100B through the conductive material L1, and fixed on the first cladding layer 21 . The aforementioned conductive material L1 is, for example, but not limited to conductive glue or tin. However, the present invention does not limit the way of fixing the wiring structure 3 on the first cladding layer 21 . In another embodiment, the wiring structure 3 may also be fixed on the first cladding layer 21 by welding.

請參照圖20,在將線路結構3固定在第一包覆層21上之後,將暫時性基板B1與電路保護晶片1分離。請參照圖21,形成第二包覆層22與電路保護晶片1的底面1b上。Referring to FIG. 20 , after the circuit structure 3 is fixed on the first cladding layer 21 , the temporary substrate B1 is separated from the circuit protection chip 1 . Referring to FIG. 21 , a second cladding layer 22 is formed on the bottom surface 1 b of the circuit protection chip 1 .

[實施例的有益效果][Advantageous Effects of Embodiment]

本發明的其中一有益效果在於,本發明所提供的電路保護晶片封裝件及其製造方法,其能通過“內線路層31的垂直投影與電路保護晶片1的垂直投影之間的一重疊面積,占電路保護晶片1的垂直投影面積的0.5%至15%”的技術方案,以降低內線路層31與電路保護晶片1之間的寄生電容,進而降低電路保護晶片封裝件M1-M3的等效電容。One of the beneficial effects of the present invention is that the circuit protection chip package and its manufacturing method provided by the present invention can pass through "an overlapping area between the vertical projection of the inner circuit layer 31 and the vertical projection of the circuit protection chip 1, Accounting for 0.5% to 15% of the vertical projected area of the circuit protection chip 1", to reduce the parasitic capacitance between the inner circuit layer 31 and the circuit protection chip 1, thereby reducing the equivalent circuit protection chip package M1-M3 capacitance.

另一方面,本發明實施例中,通過在內線路層31與外導電結構32之間設置導電連接部33A, 33B,可以進一步使電路保護晶片封裝件M1-M3具有更低的等效電容。如此,當電路保護晶片封裝件M1-M3應用於電子產品的電路中時,由於電路保護晶片封裝件M1-M3具有較低的等效電容,可以降低對信號傳輸速度的影響。On the other hand, in the embodiment of the present invention, by providing the conductive connection parts 33A, 33B between the inner circuit layer 31 and the outer conductive structure 32, the circuit protection chip packages M1-M3 can further have a lower equivalent capacitance. In this way, when the circuit protection chip packages M1 - M3 are applied in the circuit of an electronic product, since the circuit protection chip packages M1 - M3 have a lower equivalent capacitance, the impact on the signal transmission speed can be reduced.

以上所公開的內容僅為本發明的優選可行實施例,並非因此侷限本發明的申請專利範圍,所以凡是運用本發明說明書及圖式內容所做的等效技術變化,均包含於本發明的申請專利範圍內。The content disclosed above is only a preferred feasible embodiment of the present invention, and does not therefore limit the scope of the patent application of the present invention. Therefore, all equivalent technical changes made by using the description and drawings of the present invention are included in the application of the present invention. within the scope of the patent.

M1-M3:電路保護晶片封裝件 1:電路保護晶片 1a:上表面 1b:底面 1c:側表面 100A, 100B:電連接點 100s:頂表面 2:包覆結構 21:第一包覆層 21’:初始包覆層 21a:連接面 21b:下表面 22:第二包覆層 3, 3’:線路結構 30, 30’:第一絕緣層 31:內線路層 31A, 31B:圖案化導電部 31H:開口 310:主體部分 311:延伸部分 32:外導電結構 32A, 32B:電性接觸襯墊 33A, 33B:導電連接部 33s:導電連接部頂面 34, 34’:第二絕緣層 34s:外表面 35:絕緣層 L1:導電材料 B1:暫時性基板 S10- S14, S121 -S127:流程步驟 M1-M3: Circuit Protection Chip Packages 1: circuit protection chip 1a: Upper surface 1b: bottom surface 1c: side surface 100A, 100B: electrical connection points 100s: top surface 2: cladding structure 21: First cladding layer 21': Initial cladding 21a: connecting surface 21b: lower surface 22: Second cladding layer 3, 3': line structure 30, 30': first insulating layer 31: Inner line layer 31A, 31B: patterned conductive part 31H: opening 310: main part 311: extension 32: External conductive structure 32A, 32B: Electrical contact pads 33A, 33B: conductive connection part 33s: Top surface of conductive connection part 34, 34': Second insulating layer 34s: Outer surface 35: insulation layer L1: Conductive material B1: Temporary substrate S10- S14, S121 -S127: Process steps

圖1為本發明第一實施例的電路保護晶片封裝件的俯視示意圖。FIG. 1 is a schematic top view of a circuit protection chip package according to a first embodiment of the present invention.

圖2為圖1的II-II剖面的剖面示意圖。FIG. 2 is a schematic cross-sectional view of the II-II section in FIG. 1 .

圖3為本發明第二實施例電路保護晶片封裝件的剖面示意圖。3 is a schematic cross-sectional view of a circuit protection chip package according to a second embodiment of the present invention.

圖4為本發明第三實施例電路保護晶片封裝件的剖面示意圖。4 is a schematic cross-sectional view of a circuit protection chip package according to a third embodiment of the present invention.

圖5為本發明實施例的電路保護晶片封裝件的製造方法的流程圖。FIG. 5 is a flowchart of a method for manufacturing a circuit protection chip package according to an embodiment of the present invention.

圖6為本發明實施例的電路保護晶片封裝件在步驟S10的示意圖。FIG. 6 is a schematic diagram of the circuit protection chip package in step S10 according to an embodiment of the present invention.

圖7為本發明實施例的電路保護晶片封裝件在步驟S11的示意圖。FIG. 7 is a schematic diagram of the circuit protection chip package in step S11 according to an embodiment of the present invention.

圖8為本發明實施例的電路保護晶片封裝件在形成第一包覆層之後的示意圖。FIG. 8 is a schematic diagram of the circuit protection chip package after forming the first cladding layer according to the embodiment of the present invention.

圖9為本發明實施例的電路保護晶片封裝件在步驟S121的示意圖。FIG. 9 is a schematic diagram of the circuit protection chip package in step S121 according to an embodiment of the present invention.

圖10為本發明實施例的電路保護晶片封裝件在步驟S122的示意圖。FIG. 10 is a schematic diagram of the circuit protection chip package in step S122 according to an embodiment of the present invention.

圖11為本發明實施例的電路保護晶片封裝件在步驟S123的示意圖。FIG. 11 is a schematic diagram of the circuit protection chip package in step S123 according to an embodiment of the present invention.

圖12為本發明實施例的電路保護晶片封裝件在步驟S124的示意圖。FIG. 12 is a schematic diagram of the circuit protection chip package in step S124 according to an embodiment of the present invention.

圖13為本發明實施例的電路保護晶片封裝件在形成第二絕緣層步驟之後的示意圖。FIG. 13 is a schematic diagram of the circuit protection chip package after forming a second insulating layer according to an embodiment of the present invention.

圖14為本發明實施例的電路保護晶片封裝件在步驟S125的示意圖。FIG. 14 is a schematic diagram of the circuit protection chip package in step S125 according to an embodiment of the present invention.

圖15為本發明實施例的電路保護晶片封裝件在步驟S13的示意圖。FIG. 15 is a schematic diagram of the circuit protection chip package in step S13 according to an embodiment of the present invention.

圖16為本發明實施例的電路保護晶片封裝件在步驟S14的示意圖。FIG. 16 is a schematic diagram of the circuit protection chip package in step S14 according to an embodiment of the present invention.

圖17為本發明另一實施例的電路保護晶片封裝件的製造方法的流程圖。FIG. 17 is a flowchart of a method for manufacturing a circuit protection chip package according to another embodiment of the present invention.

圖18為本發明另一實施例的電路保護晶片封裝件在步驟S126的示意圖。FIG. 18 is a schematic diagram of a circuit protection chip package in step S126 according to another embodiment of the present invention.

圖19為本發明另一實施例的電路保護晶片封裝件在步驟S127的示意圖。FIG. 19 is a schematic diagram of a circuit protection chip package in step S127 according to another embodiment of the present invention.

圖20為本發明另一實施例的電路保護晶片封裝件在步驟S13的剖面示意圖。FIG. 20 is a schematic cross-sectional view of a circuit protection chip package in step S13 according to another embodiment of the present invention.

圖21為本發明另一實施例的電路保護晶片封裝件的剖面示意圖。FIG. 21 is a schematic cross-sectional view of a circuit protection chip package according to another embodiment of the present invention.

M1:電路保護晶片封裝件 M1: circuit protection chip package

1:電路保護晶片 1: circuit protection chip

100A,100B:電連接點 100A, 100B: electrical connection points

3:線路結構 3: Line structure

31:內線路層 31: Inner line layer

31A,31B:圖案化導電部 31A, 31B: patterned conductive part

310:主體部分 310: main part

311:延伸部分 311: extension

32:外導電結構 32: External conductive structure

32A,32B:電性接觸襯墊 32A, 32B: electrical contact pads

33A,33B:導電連接部 33A, 33B: conductive connection part

34:第二絕緣層 34: Second insulating layer

34s:外表面 34s: Outer surface

Claims (18)

一種電路保護晶片封裝件,其包括: 一電路保護晶片,其具有至少一電連接點; 一包覆結構,其包覆所述電路保護晶片以及至少一所述電連接點;以及 一線路結構,其設置在所述包覆結構上,並包括一內線路層以及一外導電結構,其中,所述外導電結構通過所述內線路層而電性連接於至少一所述電連接點,且所述內線路層的垂直投影與所述電路保護晶片的垂直投影之間的一重疊面積,占所述電路保護晶片的所述垂直投影面積的0.5%至15%。 A circuit protection chip package, comprising: A circuit protection chip, which has at least one electrical connection point; a wrapping structure, which wraps the circuit protection chip and at least one of the electrical connection points; and A circuit structure, which is arranged on the cladding structure, and includes an inner circuit layer and an outer conductive structure, wherein the outer conductive structure is electrically connected to at least one of the electrical connections through the inner circuit layer point, and an overlapping area between the vertical projection of the inner circuit layer and the vertical projection of the circuit protection chip accounts for 0.5% to 15% of the vertical projection area of the circuit protection chip. 如請求項1所述的電路保護晶片封裝件,其中,所述線路結構還進一步包括:一導電連接部,所述導電連接部連接於所述內線路層與所述外導電結構之間。The circuit protection chip package as claimed in claim 1, wherein the circuit structure further comprises: a conductive connection part connected between the inner circuit layer and the outer conductive structure. 如請求項1所述的電路保護晶片封裝件,其中,所述內線路層包括對應於至少一所述電連接點的一圖案化導電部,所述圖案化導電部包括一主體部分以及一延伸部分,所述主體部分位於所述包覆結構上,所述延伸部分由所述主體部分延伸至所述電路保護晶片上方並電性連接至少一所述電連接點。The circuit protection chip package as claimed in claim 1, wherein the inner wiring layer includes a patterned conductive portion corresponding to at least one of the electrical connection points, and the patterned conductive portion includes a main body portion and an extension The main part is located on the covering structure, and the extension part extends from the main part to above the circuit protection chip and is electrically connected to at least one of the electrical connection points. 如請求項1所述的電路保護晶片封裝件,其中,所述內線路層包括對應於至少一所述電連接點的一圖案化導電部,所述圖案化導電部包括一延伸部分,所述延伸部分由所述電連接點延伸至超過所述電路保護晶片的一側表面,且所述延伸部分的一垂直投影面積為所述電連接點的一垂直投影面積的4至6倍。The circuit protection chip package as claimed in claim 1, wherein the inner wiring layer includes a patterned conductive portion corresponding to at least one of the electrical connection points, the patterned conductive portion includes an extension portion, the The extension part extends from the electrical connection point beyond one side surface of the circuit protection chip, and a vertical projected area of the extension part is 4 to 6 times of a vertical projected area of the electric connection point. 如請求項1所述的電路保護晶片封裝件,其中,所述外導電結構包括對應於至少一所述電連接點的一電性接觸襯墊,所述圖案化導電部還包括連接於所述延伸部分的一主體部分,且所述主體部分的一垂直投影重疊於所述電性接觸襯墊。The circuit protection chip package as claimed in claim 1, wherein the outer conductive structure includes an electrical contact pad corresponding to at least one of the electrical connection points, and the patterned conductive part further includes a contact pad connected to the A main part of the extension part, and a vertical projection of the main part overlaps the electrical contact pad. 如請求項1所述的電路保護晶片封裝件,其中,所述外導電結構直接設置在所述內線路層上。The circuit protection chip package as claimed in claim 1, wherein the outer conductive structure is directly disposed on the inner wiring layer. 如請求項1所述的電路保護晶片封裝件,其中,所述包覆結構包括一第一包覆層以及一第二包覆層,所述電路保護晶片內埋於所述第一包覆層內,且至少一所述電連接點的頂表面與所述第一包覆層的一連接面齊平,所述第二包覆層包覆所述電路保護晶片的底面。The circuit protection chip package according to claim 1, wherein the cladding structure includes a first cladding layer and a second cladding layer, and the circuit protection chip is embedded in the first cladding layer and the top surface of at least one electrical connection point is flush with a connection surface of the first coating layer, and the second coating layer covers the bottom surface of the circuit protection chip. 如請求項1所述的電路保護晶片封裝件,其中,所述線路結構還包括一絕緣層,其位於所述內線路層與所述外導電結構之間,所述內線路層定義出一開口,且所述絕緣層未填入所述開口內。The circuit protection chip package as claimed in claim 1, wherein the wiring structure further includes an insulating layer located between the inner wiring layer and the outer conductive structure, and the inner wiring layer defines an opening , and the insulating layer is not filled into the opening. 如請求項1所述的電路保護晶片封裝件,其中,所述內線路層定義出一開口,所述線路結構還包括一第一絕緣層,所述第一絕緣層的一部分填入所述開口中。The circuit protection chip package as claimed in claim 1, wherein the inner wiring layer defines an opening, the wiring structure further includes a first insulating layer, and a part of the first insulating layer fills the opening middle. 如請求項9所述的電路保護晶片封裝件,其中,所述線路結構還包括一第二絕緣層以及對應於至少一所述電連接點的一導電連接部,所述第二絕緣層位於所述內線路層與所述外導電結構之間,且所述導電連接部嵌埋於所述第二絕緣層內,並連接於所述內線路層與所述外導電結構之間。The circuit protection chip package as claimed in item 9, wherein the circuit structure further includes a second insulating layer and a conductive connection portion corresponding to at least one of the electrical connection points, the second insulating layer is located at the between the inner circuit layer and the outer conductive structure, and the conductive connection part is embedded in the second insulating layer and connected between the inner circuit layer and the outer conductive structure. 一種電路保護晶片封裝件的製造方法,其包括: 設置一電路保護晶片在一暫時性基板上,其中,所述電路保護晶片具有至少一電連接點; 形成一第一包覆層,以包覆所述電路保護晶片的側表面以及至少一所述電連接點,其中,至少一所述電連接點部分地裸露在所述第一包覆層的一頂面; 形成一線路結構於所述第一包覆層上,其中,所述線路結構包括一內線路層以及一外導電結構,所述外導電結構通過所述內線路層而電性連接於所述電連接點;以及 分離所述電路保護晶片及所述暫時性基板。 A method of manufacturing a circuit protection chip package, comprising: disposing a circuit protection chip on a temporary substrate, wherein the circuit protection chip has at least one electrical connection point; forming a first cladding layer to cover the side surface of the circuit protection chip and at least one of the electrical connection points, wherein at least one of the electrical connection points is partially exposed on one of the first cladding layer top surface; A circuit structure is formed on the first cladding layer, wherein the circuit structure includes an inner circuit layer and an outer conductive structure, and the outer conductive structure is electrically connected to the electrical circuit through the inner circuit layer. connection points; and separating the circuit protection chip and the temporary substrate. 如請求項11所述的電路保護晶片封裝件的製造方法,其中,所述內線路層的垂直投影與所述電路保護晶片的垂直投影之間的一重疊面積,占所述電路保護晶片的所述垂直投影面積的0.5%至15%。The method for manufacturing a circuit protection chip package as claimed in claim 11, wherein an overlapping area between the vertical projection of the inner circuit layer and the vertical projection of the circuit protection chip occupies all of the circuit protection chip 0.5% to 15% of the above vertical projected area. 如請求項11所述的電路保護晶片封裝件的製造方法,其中,形成所述線路結構的步驟包括: 形成所述內線路層於所述第一包覆層上; 形成一第一絕緣層於所述內線路層上,其中,所述第一絕緣層的一部分填入所述內線路層定義出的一開口內;以及 去除所述第一絕緣層的一部分,以裸露出所述內線路層。 The method for manufacturing a circuit protection chip package as claimed in claim 11, wherein the step of forming the circuit structure includes: forming the inner wiring layer on the first cladding layer; forming a first insulating layer on the inner wiring layer, wherein a part of the first insulating layer fills an opening defined by the inner wiring layer; and A part of the first insulating layer is removed to expose the inner wiring layer. 如請求項13所述的電路保護晶片封裝件的製造方法,其中,形成所述線路結構的步驟包括: 在形成所述內線路層之後,形成一導電連接部於所述內線路層上; 形成一第二絕緣層覆蓋所述內線路層以及所述導電連接部,其中,所述導電連接部部分地裸露在所述第二絕緣層的表面;以及 形成與所述導電連接部電性接觸的所述外導電結構。 The method for manufacturing a circuit protection chip package as claimed in claim 13, wherein the step of forming the circuit structure includes: After forming the inner wiring layer, forming a conductive connection part on the inner wiring layer; forming a second insulating layer to cover the inner circuit layer and the conductive connection part, wherein the conductive connection part is partially exposed on the surface of the second insulating layer; and The outer conductive structure is formed to be in electrical contact with the conductive connection portion. 如請求項11所述的電路保護晶片封裝件的製造方法,其中,形成所述第一包覆層的步驟進一步包括: 形成一初始包覆層以完全包覆所述電路保護晶片以及所述電連接點;以及 去除一部分所述初始包覆層,以形成所述第一包覆層,其中,所述電連接點的頂表面裸露在所述第一包覆層的頂面。 The method for manufacturing a circuit protection chip package as claimed in claim 11, wherein the step of forming the first cladding layer further comprises: forming an initial cladding layer to completely cover the circuit protection chip and the electrical connection points; and A part of the initial cladding layer is removed to form the first cladding layer, wherein the top surface of the electrical connection point is exposed on the top surface of the first cladding layer. 如請求項11所述的電路保護晶片封裝件的製造方法,其中,形成所述線路結構於所述第一包覆層上的步驟包括: 提供預先形成的所述線路結構;以及 將所述線路結構設置在所述第一包覆層上,其中,所述內線路層對準於至少一所述電連接點,並電性連接於至少一所述電連接點。 The method for manufacturing a circuit protection chip package as claimed in claim 11, wherein the step of forming the circuit structure on the first cladding layer includes: providing said wiring structure pre-formed; and The circuit structure is disposed on the first cladding layer, wherein the inner circuit layer is aligned with at least one of the electrical connection points and is electrically connected to at least one of the electrical connection points. 如請求項11所述的電路保護晶片封裝件的製造方法,還進一步包括:在分離所述電路保護晶片及所述暫時性基板的步驟之後,形成一第二包覆層,以包覆所述電路保護晶片的底面。The method for manufacturing a circuit protection chip package according to claim 11, further comprising: after the step of separating the circuit protection chip and the temporary substrate, forming a second coating layer to cover the Circuitry protects the bottom surface of the die. 如請求項11所述的電路保護晶片封裝件的製造方法,其中,形成所述線路結構的步驟包括: 在形成所述內線路層之後,形成一導電連接部於所述內線路層上; 形成一絕緣層覆蓋所述內線路層以及所述導電連接部,其中,所述導電連接部部分地裸露在所述絕緣層的外表面;以及 形成與所述導電連接部電性接觸的所述外導電結構。 The method for manufacturing a circuit protection chip package as claimed in claim 11, wherein the step of forming the circuit structure includes: After forming the inner wiring layer, forming a conductive connection part on the inner wiring layer; forming an insulating layer covering the inner circuit layer and the conductive connection part, wherein the conductive connection part is partially exposed on the outer surface of the insulating layer; and The outer conductive structure is formed to be in electrical contact with the conductive connection portion.
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