TW202321474A - Aluminum member and method for producing same - Google Patents
Aluminum member and method for producing same Download PDFInfo
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- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
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- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
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Abstract
Description
本揭示是有關於一種鋁構件及其製造方法。The disclosure relates to an aluminum component and a manufacturing method thereof.
近年來,欲使例如可攜式機器或個人電腦框體為如紙般的白色的外觀的要求增加。為了滿足此種要求,已經嘗試了藉由在由鋁或鋁合金形成的基材的表面形成陽極氧化皮膜而將鋁構件的外觀製成白色。In recent years, there has been an increasing demand for, for example, a portable device or a personal computer casing to have a paper-like white appearance. In order to meet such demands, attempts have been made to make the appearance of aluminum members white by forming an anodized film on the surface of a base material formed of aluminum or an aluminum alloy.
專利文獻1中揭示了基材的表面的算術平均高度Sa為0.1 μm~0.5 μm、最大高度Sz為0.2 μm~5 μm、粗糙度曲線要素的平均長度RSm為0.5 μm~10 μm的鋁構件。
[現有技術文獻]
[專利文獻]
[專利文獻1]日本專利第6525035號公報[Patent Document 1] Japanese Patent No. 6525035
根據專利文獻1的鋁構件,藉由將基材的算術平均高度Sa、最大高度Sz及粗糙度曲線要素的平均長度RSm設為規定的範圍內,可獲得具有白色外觀的鋁構件。然而,需要使自傾斜方向觀察時的白色度提高且進而具有與紙接近的外觀的鋁構件。According to the aluminum member of
本揭示是鑑於此種現有技術所具有的課題而成者。而且,本揭示的目的是提供一種角度依存性低的鋁構件及其製造方法。This indication is made in view of the subject which such prior art has. Furthermore, an object of the present disclosure is to provide an aluminum member with low angle dependence and a method of manufacturing the same.
本揭示的第一形態的鋁構件包括由鋁或鋁合金形成的基材。鋁構件包括陽極氧化皮膜,所述陽極氧化皮膜包括:阻擋層,與基材的表面接觸;第一多孔層,和阻擋層的與基材為相反側的面接觸;以及第二多孔層,和第一多孔層的與阻擋層相反的面接觸,且具有自與第一多孔層接觸的面向露出的表面整齊排列並呈直線狀延伸的多個孔。第一多孔層具有多個分支的孔及平均孔徑較第二多孔層大的多個孔中的至少任一者。在陽極氧化皮膜中導入有白色顏料粒子。The aluminum member of the first aspect of the present disclosure includes a base material formed of aluminum or an aluminum alloy. The aluminum member includes an anodized film comprising: a barrier layer in contact with a surface of a substrate; a first porous layer in contact with a surface of the barrier layer opposite to the substrate; and a second porous layer , is in contact with the surface of the first porous layer opposite to the barrier layer, and has a plurality of pores aligned and extending linearly from the exposed surface of the surface in contact with the first porous layer. The first porous layer has at least one of a plurality of branched pores and a plurality of pores having a larger average pore diameter than the second porous layer. White pigment particles are introduced into the anodized film.
本揭示的第二形態的鋁構件的製造方法包括利用可形成整齊排列並呈直線狀延伸的多個孔的電解液來對由鋁或鋁合金形成的基材進行第一陽極氧化的第一陽極氧化步驟。所述方法包括利用電解液來對第一陽極氧化後的基材進行第二陽極氧化的第二陽極氧化步驟。所述方法包括將白色顏料粒子導入到藉由第一陽極氧化及第二陽極氧化而獲得的陽極氧化皮膜的步驟。第二陽極氧化電解液是能夠形成多個分支的孔及具有比呈直線狀延伸的多個孔的平均孔徑大的平均孔徑的多個孔中的至少任一者的電解液。The method for manufacturing an aluminum member according to the second aspect of the present disclosure includes performing a first anodic oxidation on a base material formed of aluminum or an aluminum alloy using an electrolytic solution capable of forming a plurality of pores that are aligned and extend linearly. oxidation step. The method includes a second anodizing step of performing a second anodic oxidation on the first anodized substrate using an electrolytic solution. The method includes the step of introducing white pigment particles into the anodized film obtained by the first anodic oxidation and the second anodic oxidation. The second anodizing electrolytic solution is an electrolytic solution capable of forming at least any one of a plurality of branched pores and a plurality of pores having an average pore diameter larger than the average pore diameter of the plurality of pores extending linearly.
根據本揭示,可提供一種角度依存性低的鋁構件及其製造方法。According to the present disclosure, an aluminum member with low angle dependence and a method of manufacturing the same can be provided.
以下,使用圖式對本實施方式的鋁構件及鋁構件的製造方法進行詳細說明。再者,圖式的尺寸比率為了方便說明而進行了誇張,有時與實際的比率不同。Hereinafter, the aluminum member of this embodiment and the manufacturing method of an aluminum member are demonstrated in detail using drawing. In addition, the dimensional ratios in the drawings are exaggerated for convenience of description, and may differ from actual ratios.
[鋁構件]
如圖1所示,本實施方式的鋁構件1包括基材10及陽極氧化皮膜20。以下,對該些構成要素進行說明。
[Aluminum member]
As shown in FIG. 1 , an
(基材10)
基材10由鋁或鋁合金形成。基材10亦可由例如1000系合金、3000系合金、5000系合金、6000系合金或7000系合金形成。基材10亦可由含有0質量%~10質量%的鎂、0.1質量%以下的鐵及0.1質量%以下的矽且剩餘部分為鋁及不可避免的雜質的鋁或鋁合金形成。基材10亦可由含有0質量%~10質量%的鎂、0.1質量%以下的鐵、0.1質量%以下的矽及10質量%以下的鋅且剩餘部分為鋁及不可避免的雜質的鋁或鋁合金形成。
(Substrate 10)
The
鎂未必需要包含在基材10中,但若基材10含有鎂,則鋁與鎂固溶,可提高基材10的強度。另外,藉由將鎂的含量設為10質量%以下,可抑制基材10的耐腐蝕性的降低,同時提高基材10的強度。鎂的含量可為0.5質量%以上,亦可為1質量%以上。另外,鎂的含量可為8質量%以下,亦可為5質量%以下。Magnesium does not necessarily need to be contained in the
鐵及矽不易與鋁固溶。因此,於基材10含有該些元素的情況下,該些元素於陽極氧化皮膜20內容易作為包含鐵或矽的第二相析出。於陽極氧化皮膜20含有該些般的第二相的情況下,透過陽極氧化皮膜20內的光的一部分被第二相吸收,因此鋁構件1有時看起來如帶黃色的顏色般。基材10可含有0.05質量%以下的鐵。另外,基材10亦可含有0.05質量%以下的矽。Iron and silicon are not easy to form a solid solution with aluminum. Therefore, when the
鋅未必需要包含在基材10中,但若基材10含有鋅,則可維持基材10的強度。另外,藉由將鋅的含量設為10質量%以下,維持基材10的強度,同時不損害鋁構件1的外觀。鋅的含量可為8質量%以下。Zinc does not necessarily need to be contained in the
基材10亦可含有不可避免的雜質。本實施方式中,所謂不可避免的雜質是指存在於原料中或者在製造步驟中不可避免地混入的物質。不可避免的雜質本來為不需要的物質,但由於為微量且不會對鋁或鋁合金中的特性造成影響,因此為容許的雜質。鋁或鋁合金中有可能含有的不可避免的雜質為鋁、鎂、鐵及矽以外的元素。作為鋁或鋁合金中有可能含有的不可避免的雜質,例如可列舉:銅、錳、鉻、鋅、鈦、鎵、硼、釩、鋯、鉛、鈣及鈷等。不可避免的雜質的量較佳為於鋁或鋁合金中以合計計為0.5質量%以下,更佳為0.2質量%以下,進而佳為0.15質量%以下,尤佳為0.10質量%以下。另外,作為不可避免的雜質而包含的各元素的含量較佳為0.05質量%以下,更佳為0.03質量%以下,進而佳為0.01質量%以下。The
基材10亦可於陽極氧化皮膜20側的表面11具有凹凸。鋁構件1可藉由於表面11形成的凹凸使透過陽極氧化皮膜20的光發生擴散反射。表面11的凹凸可藉由後述的粗面化處理而形成。基材10的表面11的算術平均高度Sa可為0.3 μm~0.5 μm。另外,基材10的表面11的最大高度Sz可為3 μm~5 μm。另外,基材10的表面11的粗糙度曲線要素的平均長度RSm可為6 μm~10 μm。可為:基材10的表面11的算術平均高度Sa為0.3 μm~0.5 μm,最大高度Sz為3 μm~5 μm,且粗糙度曲線要素的平均長度RSm為6 μm~10 μm。The
藉由將算術平均高度Sa設為0.3 μm以上,透過陽極氧化皮膜20的光於基材10的表面11發生擴散反射,因此可進一步提高自傾斜方向觀察鋁構件1時的白色度。另外,藉由將算術平均高度Sa設為0.5 μm以下,可抑制透過陽極氧化皮膜20的光於基材10的表面11的凹凸間被捕捉,因此可抑制鋁構件1的外觀變成灰色。算術平均高度Sa亦可為0.4 μm以下。算術平均高度Sa可依據國際標準化組織(International Standardization Organization,ISO)25178進行測定。By setting the arithmetic average height Sa to 0.3 μm or more, the light transmitted through the
藉由將最大高度Sz設為3 μm以上,透過陽極氧化皮膜20的光於基材10的表面11發生擴散反射,因此可進一步提高自傾斜方向觀察鋁構件1時的白色度。另外,藉由將最大高度Sz設為5 μm以下,可抑制透過陽極氧化皮膜20的光於基材10的表面11的凹凸間被捕捉,因此可抑制鋁構件1的外觀變成灰色。最大高度Sz亦可為4.7 μm以下。最大高度Sz可依據ISO25178進行測定。By making the maximum height Sz 3 μm or more, the light transmitted through the
藉由將粗糙度曲線要素的平均長度RSm設為6 μm以上,基材10的表面11的凹凸的間距不會變得過小,因此可抑制透過陽極氧化皮膜20的光於基材10的表面11的凹凸間被捕捉。因此,可抑制鋁構件1的外觀變成灰色。另外,藉由將粗糙度曲線要素的平均長度RSm設為10 μm以下,基材10的表面11的凹凸的間距不會變得過大。因此,透過陽極氧化皮膜20的光於基材10的表面11發生擴散反射,可進一步提高自傾斜方向觀察鋁構件1時的白色度。粗糙度曲線要素的平均長度RSm可為7 μm以上,亦可為9.5 μm以下。粗糙度曲線要素的平均長度RSm可依據日本工業標準(Japanese Industrial Standards,JIS)B0601:2013(ISO 4287:1997,Amd.1:2009)進行測定。By setting the average length RSm of the roughness curve element to 6 μm or more, the pitch of the unevenness on the
基材10的表面11的算術平均高度Sa、最大高度Sz及粗糙度曲線要素的平均長度RSm可藉由自基材10去除陽極氧化皮膜20來進行測定。再者,基材10的表面11的凹凸藉由陽極氧化而變得平滑,因此陽極氧化前的基材10的表面11的凹凸與陽極氧化後的基材10的表面11的凹凸有可能形狀不同。因此,本實施方式中,測定陽極氧化皮膜20去除後的基材10的表面11的形狀。自基材10去除陽極氧化皮膜20的方法並無特別限定。例如可依據JIS H8688:2013(鋁及鋁合金的陽極氧化皮膜的每單位面積的質量測定方法),將鋁構件1浸漬於磷酸鉻酸(VI)溶液中,使陽極氧化皮膜20溶解而去除。The arithmetic mean height Sa, the maximum height Sz, and the average length RSm of roughness curve elements of the
基材10的形狀或厚度並無特別限定,可根據用途適宜變更。另外,基材10可進行加工處理或熱處理等。The shape and thickness of the
(陽極氧化皮膜20)
陽極氧化皮膜20設置於基材10的表面11。藉由此種陽極氧化皮膜20,可提高耐腐蝕性或耐磨損性等。陽極氧化皮膜20包括阻擋層21、第一多孔層22及第二多孔層23。第二多孔層23可為陽極氧化皮膜20的最外層。
(anodized film 20)
The anodized
阻擋層21與基材10的表面11接觸。阻擋層21是緻密的無孔質的層。阻擋層21的厚度並無特別限定,例如可為1 nm以上,亦可為10 nm以上。另外,阻擋層21的厚度可為500 nm以下,亦可為300 nm以下。The
阻擋層21含有氧化鋁。另外,阻擋層21除了鋁及氧以外,亦可含有作為源自陽極氧化中使用的電解液的溶液成分的元素的硫、碳、鈉、鉀、磷、矽、作為氨的構成元素的氮等元素。於藉由組合多孔型電解液的二段電解法生成的阻擋層21及第一多孔層22中,藉由由電解液成分獲得的皮膜自身的色調及入射光的折射,可進一步提高鋁構件1的白色度。The
第一多孔層22和阻擋層21的與基材10為相反側的面接觸。第一多孔層22可具有多個分支的孔。第一多孔層22的各孔具有樹狀結構,可於第一多孔層22設置自阻擋層21的表面向第二多孔層23分支的同時進行延伸的多個孔。第一多孔層22中設置有自阻擋層21的表面向第二多孔層23延伸的直線狀的孔,亦可設置有自直線狀的孔分支的孔。第一多孔層22的多個孔的平均孔徑例如為5 nm~350 nm的範圍內。第一多孔層22的平均孔徑可為10 nm以上,亦可為20 nm以上。另外,第一多孔層22的平均孔徑可為300 nm以下。第一多孔層22的多個孔的平均孔徑可比第二多孔層23的多個孔的平均孔徑大。The first
第一多孔層22的厚度並無特別限定,可為10 nm以上且5000 nm以下。藉由將第一多孔層22的厚度設為10 nm以上,可進一步提高鋁構件1的白度。藉由將第一多孔層22的厚度設為5000 nm以下,可將形成陽極氧化皮膜20時的白色度維持在高的狀態。第一多孔層22的厚度可為50 nm以上,亦可為100 nm以上。第一多孔層22的厚度可為4000 nm以下,亦可為3500 nm以下。The thickness of the first
第一多孔層22含有氧化鋁。另外,第一多孔層22除了鋁及氧以外,亦可含有源自陽極氧化電解液的硫酸、磷酸及該些的鹽類、草酸、水楊酸、檸檬酸、馬來酸及酒石酸等般的含有羧基的酸及該些的鹽類、以及矽酸鹽、銨鹽等化合物。作為鹽,可列舉鈉鹽及鉀鹽等。藉由第一多孔層22含有所述元素,第一多孔層22成為白色,因此可獲得白色度更高的鋁構件1。The first
第二多孔層23和第一多孔層22的與阻擋層21相反的面接觸。第二多孔層23可作為鋁構件1的最外層配置而露出。第二多孔層23具有自與第一多孔層22接觸的面向露出的表面24整齊排列並呈直線狀延伸的多個孔。第二多孔層23的孔可與第一多孔層22的孔相連。第二多孔層23的多個孔的平均孔徑例如為5 nm~200 nm的範圍內。第二多孔層23的平均孔徑可為8 nm以上,亦可為10 nm以上。另外,第二多孔層23的平均孔徑可為100 nm以下,亦可為50 nm以下,亦可為30 nm以下。The second
第二多孔層23的厚度並無特別限定,可為2 μm以上且50 μm以下。藉由將第二多孔層23的厚度設為2 μm以上,可抑制於基材10上生成的陽極氧化皮膜20的干涉色,可提高鋁構件1的L*值。藉由將第二多孔層23的厚度設為50 μm以下,可減少形成陽極氧化皮膜20時的溶解。第二多孔層23的厚度可為5 μm以上,亦可為8 μm以上。另外,第二多孔層23的厚度可為25 μm以下,亦可為15 μm以下。The thickness of the second
第二多孔層23含有氧化鋁。另外,第二多孔層23除了氧化鋁以外,亦可含有源自陽極氧化電解液的硫酸、醯胺硫酸、磷酸及該些的鹽類、草酸、水楊酸、檸檬酸、馬來酸及酒石酸等般的含有羧基的酸及該些的鹽類、以及矽酸鹽、銨鹽等化合物。作為鹽,可列舉鈉鹽及鉀鹽等。藉由第二多孔層23包含所述化合物,第二多孔層23的透明性提高,因此容易透過在第一多孔層22中擴散的光,可獲得將白色度維持在高狀態的鋁構件1。The second
第一多孔層22具有多個分支的孔及平均孔徑比第二多孔層23大的多個孔中的至少任一者。即,第一多孔層22可具有多個分支的孔,亦可具有平均孔徑較第二多孔層23大的多個孔,亦可具有平均孔徑比第二多孔層23大的多個分支的孔。藉此,可促進在第一多孔層22的擴散反射,減少白色度的角度依存性。再者,本說明書中,平均孔徑是利用穿透式電子顯微鏡觀察鋁構件1的剖面並測定10個以上的孔而得的平均值。The first
陽極氧化皮膜20中導入有白色顏料粒子。白色顏料粒子可配置在第一多孔層22的孔內及第二多孔層23的孔內的至少任意一方。藉由將白色顏料粒子導入陽極氧化皮膜20,能夠提高角度依存性。White pigment particles are introduced into the anodized
白色顏料粒子可包含有機顏料粒子及無機顏料粒子中的至少任意一種,但較佳為包含無機顏料粒子。無機顏料粒子可包含選自由氧化鈦、氧化鋁、氧化鋅及硫化鋅所組成的群組中的至少一種。白色顏料粒子可為球狀、橢圓狀、多邊形狀、板狀、鱗片狀、針狀、無定形形狀及該些的混合物。The white pigment particles may include at least any one of organic pigment particles and inorganic pigment particles, but preferably include inorganic pigment particles. The inorganic pigment particles may contain at least one selected from the group consisting of titanium oxide, aluminum oxide, zinc oxide, and zinc sulfide. The white pigment particles can be spherical, oval, polygonal, plate-like, scaly, needle-like, amorphous, and mixtures of these.
白色顏料粒子的平均粒徑可小於第一多孔層22的平均孔徑。另外,白色顏料粒子的平均粒徑亦可小於第二多孔層23的平均孔徑。白色顏料粒子的平均粒徑例如可為10 nm以上且200 nm以下。藉由使白色顏料粒子的平均粒徑為10 nm以上,可充分降低角度依存性。另外,藉由使白色顏料粒子的平均粒徑為200 nm以下,白色顏料粒子容易進入第一多孔層22的孔內及第二多孔層23的孔內,因此能夠有效率地將大量的白色顏料粒子導入陽極氧化皮膜20。白色顏料粒子的平均粒徑可為13 nm以上,亦可為15 nm以上。另外,白色顏料粒子的平均粒徑可為150 nm以下,亦可為100 nm以下。在本說明書中,平均粒徑是使用掃描型電子顯微鏡(scanning electron microscope,SEM)等顯微鏡實測的粒徑的平均值。The average particle diameter of the white pigment particles may be smaller than the average pore diameter of the first
第一多孔層22的多個孔以及第二多孔層23的多個孔可含有包含鋁水合而成的鋁水合物的封孔物,亦可不含有封孔物。封孔物可包含鎳化合物。另外,可代替封孔處理而利用透明的有機系材料、無機系材料、複合材料進行塗佈,亦可不進行塗佈。作為有機系材料的塗層的例子,可列舉丙烯酸樹脂、胺基甲酸酯樹脂及氟樹脂般的樹脂塗層等。作為無機系材料的塗層的例子,可列舉:濺鍍了類鑽碳(Diamond-like Carbon,DLC)、矽等金屬的濺鍍膜、及利用D&D股份有限公司製造的帕米特(Permeate)(註冊商標)系列等塗佈的含有無機成分的無機塗膜等。作為複合材料的塗層的例子,可列舉含有樹脂及無機物質的塗層等。The plurality of pores of the first
陽極氧化皮膜20的露出的表面24的算術平均高度Sa可為0 μm~0.45 μm。藉由將表面24的算術平均高度Sa設為0.45 μm以下,光的一部分在陽極氧化皮膜20的表面24反射,因此可進一步提高鋁構件1的白色度。算術平均高度Sa可依據ISO25178進行測定。另外,陽極氧化皮膜20的表面24的算術平均高度Sa可對表面24進行研磨等來調整。The arithmetic mean height Sa of the exposed
較佳為自陽極氧化皮膜20側測定的鋁構件1的L*a*b*表色系中的L*值為82.5~100,a*值為-1~+1,b*值可為-1.5~+1.5。L*a*b*表色系中的L*值、a*值及b*值可依據JIS Z8781-4:2013(測色-第4部:國際照明委員會(International Commission on Illumination,CIE)1976 L*a*b*色空間)而求出。L*值、a*值及b*值可使用色彩色差計等進行測定,可於擴散照明垂直光接收方式(D/0)、視野角2°、C光源般的條件下進行測定。Preferably, the L* value in the L*a*b* color system of the
藉由將L*值設為82.5以上,亮度提高,因此可進一步提高鋁構件1的白色度。另外,L*值的上限並無特別限定,為L*的最大值即100。L*值可為85以上,亦可為87.5以上。Since brightness improves by making L* value 82.5 or more, the whiteness of the
另外,藉由將a*值設為-1~+1,將b*值設為-1.5~+1.5,彩度接近0,因此可抑制鋁構件1帶紅色、黃色、綠色、藍色等,可進一步提高鋁構件1的白色度。再者,a*值可為-0.8~+0.8,b*值可為-0.8~+0.8。In addition, by setting the a* value to -1 to +1 and the b* value to -1.5 to +1.5, the chroma is close to 0, so that the
於使用測角光度計以-80度~+20度的檢測器角度測定陽極氧化皮膜20側的反射強度的情況下,最大反射強度相對於最小反射強度之比可為18以下。若所述比為18以下,則即使於自各種角度觀察鋁構件1的情況下亦看起來為白色,因此可進一步降低白色度的角度依存性。由於所述比越小,角度依存性越低,因此所述比的下限值為1。When the reflection intensity on the side of the anodized
如上所述,本實施方式的鋁構件1包括由鋁或鋁合金形成的基材10、以及陽極氧化皮膜20。陽極氧化皮膜20包括與基材10的表面11接觸的阻擋層21、以及和阻擋層21的與基材10為相反側的面接觸的第一多孔層22。陽極氧化皮膜20包括第二多孔層23,所述第二多孔層23和第一多孔層22的與阻擋層21相反的面接觸,且具有自與第一多孔層22接觸的面向露出的表面24整齊排列並呈直線狀延伸的多個孔。第一多孔層22具有多個分支的孔及平均孔徑比第二多孔層23大的多個孔中的至少任一者。陽極氧化皮膜20中導入有白色顏料粒子。As described above, the
第二多孔層23具有呈直線狀延伸的多個孔,因此透光性高,入射光的大部分不會被第二多孔層23吸收而到達第一多孔層22。第一多孔層22具有多個分支的孔及平均孔徑比第二多孔層23大的多個孔中的至少任一者。因此,穿過第一多孔層22的光在第一多孔層22發生擴散反射。經基材10的表面11反射的光於第一多孔層22進一步發生擴散反射,並穿過第二多孔層23。因此,推測本實施方式的鋁構件1的白色度的角度依存性低。另外,如上所述,第二多孔層23的透光性高,大多數的光不會被第二多孔層23吸收而在基材10的表面11反射,因此可獲得白色度高的鋁構件1。進而,由於在陽極氧化皮膜20中導入有白色顏料粒子,因此角度依存性進一步提高。由於鋁構件1具有如紙般的白色的外觀,因此可較佳地用於例如智慧型手機或個人電腦等框體。Since the second
[鋁構件的製造方法]
鋁構件1的製造方法如圖2所示包括粗面化處理步驟S1、蝕刻步驟S2、第一陽極氧化步驟S3、第二陽極氧化步驟S4、顏料導入步驟S5、以及封孔處理步驟S6。以下,對各步驟進行詳細說明。
[Manufacturing method of aluminum member]
The manufacturing method of the
(粗面化處理步驟S1)
粗面化處理步驟S1中,於由鋁或鋁合金形成的基材10的表面11形成凹凸。粗面化處理步驟S1並非必須的步驟,但可使鋁構件1的外觀更接近白色。形成凹凸的基材10例如可藉由具有規定元素的金屬熔液的製備、鑄造、擠出、壓延、熱處理等來製作。另外,形成凹凸的基材10可於鑄造後、壓延後或熱處理後不進行特別的表面處理而直接使用。另外,形成凹凸的基材10亦可藉由利用銑床的磨削以及砂紙、拋光研磨、化學研磨及電解研磨等對表面11進行研磨後使用。形成凹凸的基材10的表面11亦可將算術平均高度Sa研磨至小於100 nm左右。藉由將基材10的表面11的算術平均高度Sa設為小於100 nm,基材10的亮度變高。因此,即使經過表面11的凹凸形成、蝕刻步驟S2、第一陽極氧化步驟S3及第二陽極氧化步驟S4,亦可獲得具有更接近紙的白色外觀的鋁構件1。
(Roughening processing step S1)
In the roughening treatment step S1, unevenness is formed on the
基材10的表面11的凹凸例如可藉由噴砂處理而形成。噴砂處理中,可使粒子碰撞基材10的表面11而形成凹凸。噴砂處理的方法並不特別限定,例如可使用濕式噴砂及乾式噴砂中的至少任一者。粗面化處理步驟S1中,可使具有20 μm以下的平均粒徑的粒子碰撞基材10的表面11而形成凹凸。藉由將平均粒徑設為20 μm以下,可抑制穿過陽極氧化皮膜20的光被基材10的表面11的凹凸吸收,從而可使鋁構件1的外觀更接近白色。The unevenness of the
噴砂處理的粒子的平均粒徑可為10.5 μm以下。另一方面,平均粒徑的下限並無特別限定,可為2 μm以上。藉由將平均粒徑設為2 μm以上,於基材10的表面11適度地形成凹凸,因此可使穿過陽極氧化皮膜20的光發生擴散反射。因此,即使於改變角度而自傾斜方向觀察的情況下,鋁構件1亦看起來為白色,因此可使鋁構件1為如紙般的白色。再者,平均粒徑表示體積基準下的粒度分佈的累計值為50%時的粒徑,例如可藉由雷射繞射/散射法進行測定。The average particle size of the blasted particles may be 10.5 μm or less. On the other hand, the lower limit of the average particle size is not particularly limited, but may be 2 μm or more. By setting the average particle size to 2 μm or more, unevenness is appropriately formed on the
作為噴砂處理中使用的粒子,例如可列舉含有碳化矽、碳化硼、氮化硼、氧化鋁、氧化鋯等的陶瓷珠、含有不鏽鋼、鋼等的金屬珠、含有尼龍、聚酯、三聚氰胺樹脂等的樹脂珠、含有玻璃等的玻璃珠等。再者,於濕式噴砂的情況下,可將粒子混合至水等液體中並吹附至基材10。噴砂處理時的噴射壓力、粒子總數等條件並無特別限定,可根據基材10的狀態等適宜變更。在噴砂處理中,可以入射角成為規定值以下的方式使粒子碰撞基材10的表面。入射角可為60度以下,亦可為45度以下,亦可為30度以下,亦可為15度以下,亦可為5度以下。Examples of particles used in blasting include ceramic beads containing silicon carbide, boron carbide, boron nitride, alumina, zirconia, etc., metal beads containing stainless steel, steel, etc., nylon, polyester, melamine resin, etc. resin beads, glass beads containing glass, etc. Furthermore, in the case of wet sandblasting, the particles can be mixed into a liquid such as water and blown onto the
於基材10的表面11形成凹凸的方法並不限定於噴砂處理,亦可藉由雷射加工及使用粗面化處理劑等的蝕刻處理等其他方法形成。雷射加工中,藉由向基材10的表面11照射雷射光而形成凹凸。基材10的表面11的凹部及凸部的直徑、深度及間距等可藉由調節雷射光的點徑、波長、輸出、頻率及脈衝寬度、雷射光相對於基材10的移動速度等來變更。利用蝕刻處理進行的粗面化處理例如可藉由使用奧野製藥工業股份有限公司的艾斯滕(Alsatin)(註冊商標)OL-25等含有氟化物的藥品進行蝕刻處理而形成凹凸。基材10的表面11的凹部的深度及凸部的高度等可藉由調節蝕刻液的溫度、濃度及時間等來變更。The method of forming unevenness on the
(蝕刻步驟S2)
蝕刻步驟S2並非必須的步驟,但可去除粗面化處理步驟S1中形成的基材10的表面11的凹凸的角,使凹凸變得平滑。蝕刻的條件並無特別限定,只要可獲得白色度高的鋁構件1即可。
(etching step S2)
The etching step S2 is not an essential step, but the corners of the irregularities on the
蝕刻步驟S2中,可藉由酸性溶液及鹼性溶液中的至少任一者對經粗面化的基材10進行蝕刻。作為酸性溶液,例如可使用鹽酸、硫酸及硝酸等的水溶液。另外,作為鹼性溶液,例如可使用氫氧化鈉、氫氧化鉀及碳酸鈉等的水溶液。酸性溶液及鹼性溶液的濃度等並無特別限定,於使用氫氧化鈉水溶液的情況下,例如可為10 g/L~100 g/L。In the etching step S2, the roughened
蝕刻時間或蝕刻溫度亦無特別限定,可根據基材10的狀態或蝕刻液適宜調整。列舉一例,蝕刻時間為5秒~90秒,蝕刻溫度為40℃~60℃。The etching time and etching temperature are also not particularly limited, and can be appropriately adjusted according to the state of the
(第一陽極氧化步驟S3)
第一陽極氧化步驟S3中,利用可形成整齊排列並呈直線狀延伸的多個孔的電解液對形成有凹凸的基材10進行第一陽極氧化。第一陽極氧化中使用的電解液若可於第二多孔層23中形成直線狀的多個孔,則並無特別限定。電解液可為含有選自由例如硫酸、醯胺硫酸、磷酸及該些的鹽類、含有羧基的酸及該些的鹽所組成的群組中的至少一種電解質的水溶液。作為含有羧基的酸,可列舉選自由草酸、水楊酸、檸檬酸、馬來酸及酒石酸所組成的群組中的至少一種酸。該些中,第一陽極氧化電解液較佳為含有選自由硫酸、醯胺硫酸及具有羧基的化合物所組成的群組中的至少一種。第一陽極氧化電解液較佳為酸性電解液,電解液的pH例如為0~2。電解液中的所述電解質的濃度例如為1 g/L~600 g/L。
(first anodizing step S3)
In the first anodizing step S3 , the first anodizing is performed on the
第一陽極氧化的條件並無特別限制,可根據基材10的狀態等適宜調整。電解液的溫度例如可為0℃~30℃。電流密度例如可為1 mA/cm
2~50 mA/cm
2。電解時間例如可為10分鐘~50分鐘。
The conditions of the first anodic oxidation are not particularly limited, and can be appropriately adjusted according to the state of the
(第二陽極氧化步驟S4)
第二陽極氧化步驟S4中,利用電解液對第一陽極氧化後的基材10進行第二陽極氧化。第二陽極氧化電解液是可形成多個分支的孔及具有比所述呈直線狀延伸的多個孔的平均孔徑大的平均孔徑的多個孔中的至少任一者的電解液。第二陽極氧化步驟S4中使用的電解液若可於第一多孔層22中形成多個分支的孔及具有比所述呈直線狀延伸的多個孔的平均孔徑大的平均孔徑的多個孔中的至少任一者,則並無特別限定。電解液亦可為含有選自由例如酒石酸等般的具有羧基的化合物、磷酸、鉻酸、硼酸及該些的鹽所組成的群組中的至少一種電解質的水溶液。該些中,第二陽極氧化電解液較佳為含有選自由具有羧基的化合物及磷酸以及該些的鹽所組成的群組中的至少一種。具體而言,第二陽極氧化電解液較佳為酒石酸鹽水溶液。酒石酸鹽水溶液至少可形成多個分支的孔。另外,第二陽極氧化電解液亦較佳為磷酸水溶液。磷酸水溶液可形成具有比所述呈直線狀延伸的多個孔的平均孔徑大的平均孔徑的多個孔。第二陽極氧化電解液可含有選自由鈉、鉀及氨所組成的群組中的至少一種。第二陽極氧化電解液可為酸性或鹼性電解液。於第二陽極氧化電解液為鹼性電解液的情況下,電解液的pH例如為9~14。為了使電解液呈鹼性,亦可於電解液中混合氫氧化鈉等。電解液中的所述電解質的濃度例如為0.5 g/L~300 g/L。
(second anodizing step S4)
In the second anodic oxidation step S4, the
第二陽極氧化的條件並無特別限制,可根據基材10的狀態等適宜調整。列舉一例,電解液的溫度例如可為0℃~40℃。電壓例如可為2 V~500 V。每單位面積的電氣量例如可為0.05 C/cm
2~40 C/cm
2。電解時間例如可為0.1分鐘~180分鐘。
The conditions of the second anodic oxidation are not particularly limited, and can be appropriately adjusted according to the state of the
(顏料導入步驟S5)
在顏料導入步驟S5中,在藉由第一陽極氧化及第二陽極氧化而獲得的陽極氧化皮膜20中導入白色顏料粒子。陽極氧化皮膜20包括阻擋層21、第一多孔層22、及第二多孔層23。
(Pigment introduction step S5)
In the pigment introduction step S5, white pigment particles are introduced into the anodized
白色顏料粒子可藉由電泳法導入陽極氧化皮膜20,亦可藉由不伴有電泳的浸漬法等方法導入。在電泳法中,將電極浸漬在包含白色顏料粒子及使白色顏料粒子分散的分散介質的懸濁液中,在電極間施加電壓。當施加電壓時,藉由電泳現象,白色顏料粒子在分散介質中朝向電極移動。例如,藉由將包括基材10及陽極氧化皮膜20的構件用作陽極或陰極,可將白色顏料粒子導入陽極氧化皮膜20。The white pigment particles may be introduced into the anodized
白色顏料粒子可帶負電,亦可帶正電。在白色顏料粒子帶負電的情況下,將包括基材10及陽極氧化皮膜20的構件設置在陽極上,在白色顏料粒子帶正電的情況下,將包括基材10及陽極氧化皮膜20的構件設置在陰極上。可在與設置有所述構件的電極相反一側的電極上設置碳。White pigment particles can be negatively or positively charged. When the white pigment particles are negatively charged, the member including the
白色顏料粒子的正負帶電可根據白色顏料粒子的種類及懸濁液的pH等來製備。電極之間通常自電源流過直流電流。分散介質只要是電解質即可,例如可為水溶液。分散液的pH例如可為8以上且11以下。電泳法中的施加電壓例如可為100 V以上且200 V以下。另外,電泳法中的電壓的施加時間可為1分鐘以上且60分鐘以下。電泳法中的電解液的溫度例如可為0℃~40℃。白色顏料粒子的材料及平均粒徑等可採用所述的材料及平均粒徑等。The positive and negative charges of the white pigment particles can be prepared according to the type of the white pigment particles, the pH of the suspension, and the like. A direct current usually flows between the electrodes from a power source. The dispersion medium may be an electrolyte, and may be, for example, an aqueous solution. The pH of the dispersion liquid may be, for example, 8 or more and 11 or less. The applied voltage in the electrophoresis method may be, for example, 100 V or more and 200 V or less. In addition, the voltage application time in the electrophoresis method may be not less than 1 minute and not more than 60 minutes. The temperature of the electrolytic solution in the electrophoresis method may be, for example, 0°C to 40°C. As the material, average particle diameter, etc. of the white pigment particles, the above-mentioned materials, average particle diameter, etc. can be used.
在浸漬法中,在包含白色顏料粒子及使白色顏料粒子分散的分散介質的懸濁液中,浸漬所述的進行了第一陽極氧化及第二陽極氧化的構件。藉此,能夠將白色顏料粒子導入陽極氧化皮膜20。懸濁液可使用與電泳法相同者。In the dipping method, the member subjected to the first anodic oxidation and the second anodic oxidation is dipped in a suspension containing white pigment particles and a dispersion medium for dispersing the white pigment particles. Thereby, white pigment particles can be introduced into the
懸濁液中的白色顏料粒子的含量可為1質量%以上且50質量%以下。懸濁液除了包含白色顏料粒子及分散介質以外,亦可包含含有用於使白色顏料粒子分散的分散劑的添加劑。The content of the white pigment particles in the suspension may be not less than 1% by mass and not more than 50% by mass. The suspension may contain additives including a dispersant for dispersing the white pigment particles in addition to the white pigment particles and the dispersion medium.
(封孔處理步驟S6)
封孔處理步驟S6並非必須的步驟,但藉由對第一多孔層22的孔及第二多孔層23的孔進行封孔,能夠提高鋁構件1的耐腐蝕性。封孔處理可藉由公知的方法來實施,例如可藉由高溫的水、高溫的水蒸氣、乙酸鎳水溶液、氟化鎳、矽酸鹽及該些的組合來實施。藉由封孔處理,在孔內生成鋁水合而成的鋁水合物。
(Sealing processing step S6)
The sealing treatment step S6 is not an essential step, but the corrosion resistance of the
如上所述,本實施方式的鋁構件1的製造方法包括第一陽極氧化步驟S3,所述第一陽極氧化步驟S3利用可形成整齊排列並呈直線狀延伸的多個孔的電解液對由鋁或鋁合金形成的基材10進行第一陽極氧化。所述方法包括利用電解液對第一陽極氧化後的基材10進行第二陽極氧化的第二陽極氧化步驟S4。所述方法包括將白色顏料粒子導入藉由第一陽極氧化及第二陽極氧化而獲得的陽極氧化皮膜20中。第二陽極氧化電解液是可形成多個分支的孔及具有比呈直線狀延伸的多個孔的平均孔徑大的平均孔徑的多個孔中的至少任一者的電解液。As described above, the manufacturing method of the
所述方法包括第一陽極氧化步驟S3及第二陽極氧化步驟S4,因此形成陽極氧化皮膜20。第一陽極氧化步驟S3中,於陽極氧化皮膜20形成整齊排列並呈直線狀延伸的多個孔。第二陽極氧化步驟S4中,於陽極氧化皮膜20形成多個分支的孔及具有比呈直線狀延伸的多個孔的平均孔徑大的平均孔徑的多個孔中的至少任一者。因此,藉由第一陽極氧化步驟S3及第二陽極氧化步驟S4,形成了包括阻擋層21、第一多孔層22及第二多孔層23的陽極氧化皮膜20。而且,藉由顏料導入步驟S5,白色顏料粒子被導入陽極氧化皮膜20中。因此,藉由所述方法可製造所述角度依存性低的鋁構件1。
[實施例]
The method includes a first anodic oxidation step S3 and a second anodic oxidation step S4, thereby forming an
以下,藉由實施例、比較例及參考例對本實施方式進行更詳細的說明,但本實施方式並不限定於該些。Hereinafter, the present embodiment will be described in more detail with reference to examples, comparative examples, and reference examples, but the present embodiment is not limited to these.
[實施例1] (粗面化處理) 將壓延及退火後的厚3 mm的5000系鋁合金板切成長50 mm及寬50 mm的板作為基材。5000系鋁合金含有鎂4.31質量%、鐵0.02質量%及矽0.02質量%,剩餘部分為鋁(Al)及不可避免的雜質。 [Example 1] (rough surface treatment) A rolled and annealed 5000-series aluminum alloy plate with a thickness of 3 mm was cut into a plate with a length of 50 mm and a width of 50 mm as a base material. The 5000-series aluminum alloy contains 4.31% by mass of magnesium, 0.02% by mass of iron, and 0.02% by mass of silicon, and the remainder is aluminum (Al) and unavoidable impurities.
利用乾式噴砂使粒子碰撞所述基材,於基材的表面形成凹凸。粒子使用不二製作所股份有限公司製造的不二無規(Fuji Random)WA 粒子編號1200(氧化鋁粒子,最大粒徑27.0 μm平均粒徑9.5±0.8 μm)。於噴砂處理後,使基材於200 g/L的硝酸水溶液中於室溫(約20℃)下浸漬3分鐘並進行脫脂。The particles collide with the base material by dry sandblasting to form unevenness on the surface of the base material. As the particles, Fuji Random WA particle number 1200 (aluminum oxide particles, maximum particle diameter 27.0 μm, average particle diameter 9.5±0.8 μm) manufactured by Fuji Seisakusho Co., Ltd. was used. After blasting, the base material was dipped in 200 g/L nitric acid aqueous solution at room temperature (about 20° C.) for 3 minutes and degreased.
(蝕刻) 於將形成有凹凸的基材於溫度60℃下、於濃度100 g/L的氫氧化鈉水溶液中浸漬60秒並進行蝕刻後,於濃度200 g/L的硝酸水溶液中於室溫(約20℃)下浸漬2分鐘並去除污垢。 (etching) After immersing the substrate with unevenness at a temperature of 60°C in an aqueous solution of sodium hydroxide with a concentration of 100 g/L for 60 seconds and etching, the substrate was etched in an aqueous solution of nitric acid with a concentration of 200 g/L at room temperature (approximately 20 ℃) for 2 minutes and remove dirt.
(第一陽極氧化) 將蝕刻後的基材浸漬於含有濃度180 g/L的硫酸的pH為0的酸性水溶液中,於溫度18℃、電流密度15 mA/cm 2及電解時間22分鐘的電解條件下進行第一陽極氧化。 (First anodic oxidation) The etched substrate is immersed in an acidic aqueous solution with a pH of 0 containing sulfuric acid at a concentration of 180 g/L, and electrolyzed at a temperature of 18°C, a current density of 15 mA/cm 2 and an electrolysis time of 22 minutes Conditions for the first anodic oxidation.
(第二陽極氧化) 使第一陽極氧化後的構件浸漬於含有濃度200 g/L的酒石酸二鈉-二水合物及濃度5 g/L的氫氧化鈉的pH為13的鹼性水溶液中。然後,於溫度5℃、電壓100 V、電氣量1 C/cm 2、升壓速度1 V/秒及電解時間約3分鐘的電解條件下對所述構件進行第二陽極氧化。 (Second Anodization) The first anodized member was immersed in an alkaline aqueous solution at pH 13 containing disodium tartrate dihydrate at a concentration of 200 g/L and sodium hydroxide at a concentration of 5 g/L. Then, the member was subjected to the second anodic oxidation under the electrolysis conditions of temperature 5° C., voltage 100 V, electrical capacity 1 C/cm 2 , boosting speed 1 V/sec, and electrolysis time about 3 minutes.
(顏料) 將分散有平均粒徑約60 nm的氧化鈦粒子(白色顏料粒子)的分散液稀釋。然後,將進行了第二陽極氧化的構件在50℃下浸漬於該稀釋液10分鐘,藉此使氧化鈦粒子在進行了第二陽極氧化的構件上析出。 (pigment) The dispersion in which titanium oxide particles (white pigment particles) having an average particle diameter of about 60 nm were dispersed was diluted. Then, the second anodized member was immersed in the diluted solution at 50° C. for 10 minutes, whereby titanium oxide particles were deposited on the second anodized member.
(封孔處理) 藉由乙酸鎳系封孔材於95℃下對析出有氧化鈦粒子的構件進行20分鐘封孔處理。如此,製作本例的鋁構件。 (Sealing treatment) The member in which the titanium oxide particles were deposited was sealed with a nickel acetate-based sealing material at 95° C. for 20 minutes. In this way, the aluminum member of this example was produced.
[比較例1] 對未析出氧化鈦粒子而進行了第二陽極氧化的構件進行封孔,除此以外,與實施例1同樣地製作鋁構件。 [Comparative example 1] An aluminum member was fabricated in the same manner as in Example 1, except that the second anodized member without depositing titanium oxide particles was sealed.
[比較例2] 使氧化鈦粒子析出至不進行第二陽極氧化而經第一陽極氧化的構件並進行封孔,除此以外,與實施例1同樣地製作鋁構件。 [Comparative example 2] An aluminum member was produced in the same manner as in Example 1, except that titanium oxide particles were deposited on the member subjected to the first anodic oxidation instead of the second anodic oxidation, and the holes were sealed.
[比較例3] 對不進行第二陽極氧化及氧化鈦粒子的析出而進行了第一陽極氧化的構件進行封孔,除此以外,與實施例1同樣地製作鋁構件。 [Comparative example 3] An aluminum member was produced in the same manner as in Example 1 except that the second anodization and the deposition of titanium oxide particles were not performed, but the first anodization was performed, except that the holes were sealed.
[評價] 如以下般對各例中獲得的鋁構件的表面特性(Sa、Sz及RSm)、第一多孔層平均孔徑、第二多孔層平均孔徑、色調、光澤及角度依存性進行評價。結果如表1及表2所示。 [evaluate] The surface properties (Sa, Sz, and RSm), average pore diameter of the first porous layer, average pore diameter of the second porous layer, color tone, gloss, and angle dependence of the aluminum members obtained in each example were evaluated as follows. The results are shown in Table 1 and Table 2.
(算術平均高度Sa及最大高度Sz) 首先,依據JIS H8688:2013,將如上所述獲得的鋁構件浸漬於磷酸鉻酸(VI)溶液中,使陽極氧化皮膜溶解而去除。接著,使用布魯克AXS(Bruker AXS)股份有限公司的三維白色干涉型顯微鏡昆特(Contour)GT-I,依據ISO25178測定基材的陽極氧化皮膜側的表面的算術平均高度Sa及最大高度Sz。算術平均高度Sa及最大高度Sz是於測定範圍為60 μm×79 μm、物鏡為115倍、內部透鏡為1倍的條件下測定。 (Arithmetic mean height Sa and maximum height Sz) First, according to JIS H8688:2013, the aluminum member obtained above was immersed in the phosphoric acid chromic acid (VI) solution, and the anodic oxide film was dissolved and removed. Next, the arithmetic mean height Sa and the maximum height Sz of the surface on the anodized film side of the substrate were measured in accordance with ISO25178 using a three-dimensional white interference microscope Contour GT-I of Bruker AXS Co., Ltd. The arithmetic mean height Sa and the maximum height Sz are measured under the conditions that the measurement range is 60 μm×79 μm, the objective lens is 115 times, and the internal lens is 1 times.
(粗糙度曲線要素的平均長度RSm) 首先,依據JIS H8688:2013,使如上所述獲得的鋁構件的陽極氧化皮膜溶解於磷酸鉻酸(VI)溶液中而去除。接著,使用布魯克AXS(Bruker AXS)股份有限公司的三維白色干涉型顯微鏡昆特(Contour)GT-I,依據JIS B0601:2013測定基材的陽極氧化皮膜側的表面的粗糙度曲線要素的平均長度RSm。粗糙度曲線要素的平均長度RSm是於截止值λc為80 μm、物鏡為115倍、內部透鏡為1倍、測定距離為79 μm的條件下測定。 (average length RSm of roughness profile elements) First, according to JIS H8688:2013, the anodized film of the aluminum member obtained above was dissolved in the chromic-phosphoric-acid (VI) solution, and removed. Next, the average length of the roughness curve element on the surface of the anodized film side of the substrate was measured in accordance with JIS B0601:2013 using a three-dimensional white interference microscope Contour GT-I of Bruker AXS Co., Ltd. RSm. The average length RSm of the roughness curve element was measured under the conditions that the cutoff value λc was 80 μm, the objective lens was 115 times, the internal lens was 1 times, and the measurement distance was 79 μm.
(平均孔徑) 利用穿透式電子顯微鏡觀察鋁構件的剖面,測定多孔層的平均孔徑。 (average pore size) The cross section of the aluminum member was observed with a transmission electron microscope, and the average pore diameter of the porous layer was measured.
(色調) 依據JIS Z8722,使用日本柯尼卡美能達(Konica Minolta Japan)股份有限公司製造的色彩色差計CR400,自陽極氧化皮膜的表面測定鋁構件的色調,求出L*值、a*值及b*值。色調是於照明-光接收光學系統為擴散照明垂直光接收方式(D/0)、觀察條件為CIE2°視野等色函數近似、光源為C光源、以及表色系為L*a*b*的條件下測定。 (tone) According to JIS Z8722, use the color difference meter CR400 manufactured by Konica Minolta Japan Co., Ltd. to measure the color tone of the aluminum member from the surface of the anodized film, and obtain the L* value, a* value and b* value. The color tone is based on the fact that the illumination-light receiving optical system adopts the diffuse illumination vertical light receiving mode (D/0), the observation condition is CIE2° field of view equichromatic function approximation, the light source is C light source, and the color system is L*a*b* measured under the conditions.
(光澤) 使用須賀(Suga)試驗機股份有限公司製造的光澤度計Gloss Mobile MODEL GM-1,測定了鋁構件的陽極氧化皮膜側的表面的光澤。對於相對於基材的壓延面光沿平行方向入射的情況及光沿垂直方向入射的情況,分別以20°、60°及99.3°的入射角度測定了光澤。 (luster) The gloss of the surface on the anodized film side of the aluminum member was measured using a gloss meter Gloss Mobile Model GM-1 manufactured by Suga Testing Instrument Co., Ltd. Gloss was measured at incident angles of 20°, 60°, and 99.3° for cases where light was incident in a direction parallel to the rolling surface of the substrate and for cases where light was incident in a direction perpendicular to it.
(角度依存性)
使用尼卡電測(Nikka Densok)股份有限公司製造的測角光度計(GP-2型)評價鋁構件的白色度的角度依存性。具體而言,如圖3所示,對鋁構件101照射光,測定檢測器102接收的光的強度。檢測器102以將鋁構件101作為中心並可隔開規定距離而旋轉的方式設置。將檢測器102配置於入射光103的入射角為45度及反射光104的反射角為45度的位置的情況設為檢測器角度0度。於檢測器角度為-80度~+40度的範圍內以0.5度的間隔測定由鋁構件101反射的反射光104的陽極氧化皮膜側的反射強度。然後,算出檢測器角度為-80度~+20度的範圍內的最大反射強度相對於最小反射強度(最大反射強度/最小反射強度)之比。
(angle dependency)
The angular dependence of the whiteness of the aluminum member was evaluated using a goniophotometer (GP-2 type) manufactured by Nikka Densok Co., Ltd. Specifically, as shown in FIG. 3 , the
[表1]
[表2]
如表1及表2所示,在實施例1的鋁構件中,L*值為80以上,a*值為-1~+1,b*值為-1.5~+1.5。另外,如圖4所示,實施例1的鋁構件與比較例1~比較例3的鋁構件相比,如參考例的複印用紙般光的反射強度的角度依存性低。在實施例1中,與比較例1~比較例3相比,自20°及60°般的傾斜角度測定的光澤值小,因此可認為使來自傾斜方向的光擴散,從而角度依存性改善。As shown in Table 1 and Table 2, in the aluminum member of Example 1, the L* value was 80 or more, the a* value was -1 to +1, and the b* value was -1.5 to +1.5. In addition, as shown in FIG. 4 , the aluminum member of Example 1 has a lower angle dependence of the reflection intensity of light than the aluminum members of Comparative Examples 1 to 3 like the copy paper of Reference Example. In Example 1, compared with Comparative Examples 1 to 3, the gloss value measured from an inclination angle of 20° and 60° is small, so it is considered that the angle dependence is improved by diffusing light from an oblique direction.
其次,製作實施例2及比較例4~比較例6的鋁構件,與所述同樣地對表面特性、第一多孔層平均孔徑、第二多孔層平均孔徑、色調、光澤及角度依存性進行評價。結果如表3及表4所示。Next, the aluminum members of Example 2 and Comparative Examples 4 to 6 were produced, and the surface properties, the average pore diameter of the first porous layer, the average pore diameter of the second porous layer, the color tone, the gloss, and the angle dependence were tested in the same manner as described above. Make an evaluation. The results are shown in Table 3 and Table 4.
[實施例2] 利用水蒸氣在130℃下對經第二陽極氧化的構件進行30分鐘封孔處理,除此以外,與實施例1同樣地製作鋁構件。 [Example 2] An aluminum member was fabricated in the same manner as in Example 1 except that the second anodized member was subjected to a sealing treatment at 130° C. for 30 minutes with steam.
[比較例4] 對未析出氧化鈦粒子而進行了第二陽極氧化的構件進行封孔,除此以外,與實施例2同樣地製作鋁構件。 [Comparative example 4] An aluminum member was fabricated in the same manner as in Example 2, except that the second anodized member without depositing titanium oxide particles was sealed.
[比較例5] 使氧化鈦粒子析出至不進行第二陽極氧化而經第一陽極氧化的構件並進行封孔,除此以外,與實施例2同樣地製作鋁構件。 [Comparative Example 5] An aluminum member was produced in the same manner as in Example 2, except that titanium oxide particles were deposited on the member subjected to the first anodic oxidation without the second anodic oxidation and the holes were sealed.
[比較例6] 對不進行第二陽極氧化及氧化鈦粒子的析出而進行了第一陽極氧化的構件進行封孔,除此以外,與實施例2同樣地製作鋁構件。 [Comparative Example 6] An aluminum member was produced in the same manner as in Example 2 except that the second anodization and the deposition of titanium oxide particles were not performed, but the first anodization was performed and the holes were sealed.
[表3]
[表4]
如表3及表4所示,在實施例2的鋁構件中,L*值為80以上,a*值為-1~+1,b*值為-1.5~+1.5。另外,如圖5所示,實施例2的鋁構件與比較例4~比較例6的鋁構件相比,如參考例的複印用紙般光的反射強度的角度依存性低。在實施例2中,與比較例4~比較例6相比,自20°及60°般的傾斜角度測定的光澤值小,因此可認為使來自傾斜方向的光擴散,從而角度依存性改善。As shown in Table 3 and Table 4, in the aluminum member of Example 2, the L* value was 80 or more, the a* value was -1 to +1, and the b* value was -1.5 to +1.5. In addition, as shown in FIG. 5 , the aluminum member of Example 2 has a lower angle dependence of the reflection intensity of light than the aluminum members of Comparative Examples 4 to 6 like the copy paper of Reference Example. In Example 2, compared with Comparative Examples 4 to 6, the gloss value measured from an inclination angle of 20° and 60° is small, so it is considered that the angle dependence is improved by diffusing light from an oblique direction.
其次,製作實施例3及比較例7~比較例9的鋁構件,與所述同樣地對表面特性、第一多孔層平均孔徑、第二多孔層平均孔徑、色調、光澤及角度依存性進行評價。結果如表5及表6所示。Next, the aluminum members of Example 3 and Comparative Examples 7 to 9 were produced, and the surface properties, the average pore diameter of the first porous layer, the average pore diameter of the second porous layer, the color tone, the gloss, and the angle dependence were tested in the same manner as described above. Make an evaluation. The results are shown in Table 5 and Table 6.
[實施例3] 不進行噴砂處理而對基材進行蝕刻,除此以外,與實施例1同樣地製作鋁構件。 [Example 3] An aluminum member was produced in the same manner as in Example 1, except that the base material was etched without blasting.
[比較例7] 對未析出氧化鈦粒子而進行了第二陽極氧化的構件進行封孔,除此以外,與實施例3同樣地製作鋁構件。 [Comparative Example 7] An aluminum member was fabricated in the same manner as in Example 3, except that the second anodized member without depositing titanium oxide particles was sealed.
[比較例8] 使氧化鈦粒子析出至不進行第二陽極氧化而經第一陽極氧化的構件並進行封孔,除此以外,與實施例3同樣地製作鋁構件。 [Comparative Example 8] An aluminum member was produced in the same manner as in Example 3, except that titanium oxide particles were deposited on the member subjected to the first anodic oxidation instead of the second anodic oxidation and the holes were sealed.
[比較例9] 對不進行第二陽極氧化及氧化鈦粒子的析出而進行了第一陽極氧化的構件進行封孔,除此以外,與實施例3同樣地製作鋁構件。 [Comparative Example 9] An aluminum member was produced in the same manner as in Example 3, except that the second anodization and the precipitation of titanium oxide particles were not performed, but the first anodization was performed and the holes were sealed.
[表5]
[表6]
如表5及表6所示,在實施例3的鋁構件中,L*值為80以上,a*值為-1~+1,b*值為-1.5~+1.5。另外,如圖6所示,實施例3的鋁構件與比較例7~比較例9的鋁構件相比,如參考例的複印用紙般光的反射強度的角度依存性低。在實施例3中,與比較例7~比較例9相比,自20°及60°般的傾斜角度測定的光澤值小,因此可認為使來自傾斜方向的光擴散,從而角度依存性改善。As shown in Table 5 and Table 6, in the aluminum member of Example 3, the L* value was 80 or more, the a* value was -1 to +1, and the b* value was -1.5 to +1.5. In addition, as shown in FIG. 6 , the aluminum member of Example 3 has a lower angle dependence of the reflection intensity of light than the aluminum members of Comparative Examples 7 to 9 like the copy paper of Reference Example. In Example 3, compared with Comparative Examples 7 to 9, the gloss value measured from an inclination angle of 20° and 60° is small, so it is considered that the angle dependence is improved by diffusing light from an oblique direction.
其次,製作實施例4及比較例10~比較例12的鋁構件,與所述同樣地對表面特性、第一多孔層平均孔徑、第二多孔層平均孔徑、色調、光澤及角度依存性進行評價。結果如表7及表8所示。Next, the aluminum members of Example 4 and Comparative Examples 10 to 12 were produced, and the surface properties, the average pore diameter of the first porous layer, the average pore diameter of the second porous layer, the color tone, the gloss, and the angle dependence were tested in the same manner as described above. Make an evaluation. The results are shown in Table 7 and Table 8.
[實施例4] 不進行噴砂處理而對基材進行蝕刻,利用水蒸氣在130℃下對經第二陽極氧化的構件進行30分鐘封孔處理,除此以外,與實施例1同樣地製作鋁構件。 [Example 4] An aluminum member was fabricated in the same manner as in Example 1, except that the base material was etched without blasting, and the second anodized member was sealed with water vapor at 130° C. for 30 minutes.
[比較例10] 對未析出氧化鈦粒子而進行了第二陽極氧化的構件進行封孔,除此以外,與實施例4同樣地製作鋁構件。 [Comparative Example 10] An aluminum member was fabricated in the same manner as in Example 4, except that the second anodized member without depositing titanium oxide particles was sealed.
[比較例11] 使氧化鈦粒子析出至不進行第二陽極氧化而經第一陽極氧化的構件並進行封孔,除此以外,與實施例4同樣地製作鋁構件。 [Comparative Example 11] An aluminum member was fabricated in the same manner as in Example 4, except that titanium oxide particles were deposited on the member subjected to the first anodic oxidation instead of the second anodization and the holes were sealed.
[比較例12] 對不進行第二陽極氧化及氧化鈦粒子的析出而進行了第一陽極氧化的構件進行封孔,除此以外,與實施例4同樣地製作鋁構件。 [Comparative Example 12] An aluminum member was produced in the same manner as in Example 4, except that the second anodization and the precipitation of titanium oxide particles were not performed, but the first anodization was performed and the holes were sealed.
[表7]
[表8]
如表7及表8所示,在實施例4的鋁構件中,L*值為80以上,a*值為-1~+1,b*值為-1.5~+1.5。另外,如圖7所示,實施例4的鋁構件與比較例10~比較例12的鋁構件相比,如參考例的複印用紙般光的反射強度的角度依存性低。在實施例4中,與比較例10~比較例12相比,自20°及60°般的傾斜角度測定的光澤值小,因此可認為使來自傾斜方向的光擴散,從而角度依存性改善。As shown in Table 7 and Table 8, in the aluminum member of Example 4, the L* value was 80 or more, the a* value was -1 to +1, and the b* value was -1.5 to +1.5. In addition, as shown in FIG. 7 , the aluminum member of Example 4 has a lower angle dependence of the reflected intensity of light than the aluminum members of Comparative Examples 10 to 12 like the copy paper of Reference Example. In Example 4, compared with Comparative Examples 10 to 12, the gloss value measured from an inclination angle of 20° and 60° is small, so it is considered that the angle dependence is improved by diffusing light from an oblique direction.
其次,製作實施例5、比較例8~比較例9及比較例13的鋁構件,與所述同樣地對表面特性、第一多孔層平均孔徑、第二多孔層平均孔徑、色調、光澤及角度依存性進行評價。結果如表9及表10所示。Next, the aluminum members of Example 5, Comparative Example 8 to Comparative Example 9, and Comparative Example 13 were produced, and the surface properties, the average pore diameter of the first porous layer, the average pore diameter of the second porous layer, the color tone, and the gloss were tested in the same manner as described above. and angle dependence. The results are shown in Table 9 and Table 10.
[實施例5] 使經第一陽極氧化的構件浸漬在濃度98 g/L的磷酸水溶液(pH1)中。然後,於溫度5℃、電壓100 V、電氣量1 C/cm 2、升壓速度1 V/秒及電解時間約4分鐘的電解條件下對所述構件進行第二陽極氧化。除此以外,與實施例3同樣地製作鋁構件。 [Example 5] The first anodized member was immersed in an aqueous phosphoric acid solution (pH 1) having a concentration of 98 g/L. Then, the member was subjected to the second anodic oxidation under the electrolysis conditions of temperature 5°C, voltage 100 V, electrical capacity 1 C/cm 2 , boosting speed 1 V/sec, and electrolysis time about 4 minutes. Except for this, the aluminum member was produced similarly to Example 3.
[比較例13] 對未析出氧化鈦粒子而進行了第二陽極氧化的構件進行封孔,除此以外,與實施例5同樣地製作鋁構件。 [Comparative Example 13] An aluminum member was fabricated in the same manner as in Example 5, except that the second anodized member without depositing titanium oxide particles was sealed.
[表9]
[表10]
如表9及表10所示,在實施例5的鋁構件中,L*值為80以上,a*值為-1~+1,b*值為-1.5~+1.5。另外,實施例5的鋁構件與比較例8~比較例9及比較例13的鋁構件相比,如參考例的複印用紙般光的反射強度的角度依存性低。在實施例5中,與比較例8~比較例9及比較例13相比,自20°及60°般的傾斜角度測定的光澤值小,因此可認為使來自傾斜方向的光擴散,從而角度依存性改善。As shown in Table 9 and Table 10, in the aluminum member of Example 5, the L* value was 80 or more, the a* value was -1 to +1, and the b* value was -1.5 to +1.5. In addition, the aluminum member of Example 5 has a lower angle dependence of the reflection intensity of light than the aluminum members of Comparative Examples 8 to 9 and Comparative Example 13 like the copy paper of the reference example. In Example 5, compared with Comparative Examples 8 to 9 and Comparative Example 13, the gloss value measured from oblique angles such as 20° and 60° is small, so it is considered that the light from the oblique direction is diffused, and the angle Dependency improved.
根據表1~表10的結果可知,如實施例1~實施例4般,藉由實施第一陽極氧化及第二陽極氧化,並添加氧化鈦粒子,可在不使L*值大幅降低的情況下獲得角度依存性低的鋁構件。According to the results in Tables 1 to 10, as in Examples 1 to 4, by performing the first anodic oxidation and the second anodic oxidation, and adding titanium oxide particles, the L* value can be significantly reduced. Aluminum components with low angle dependence are obtained.
其次,為了利用穿透式電子顯微鏡觀察剖面,如以下般製作了鋁構件。Next, in order to observe the cross section with a transmission electron microscope, an aluminum member was produced as follows.
[實施例6] (粗面化處理) 將壓延及退火後的厚3 mm的5000系鋁合金板切成長50 mm及寬50 mm的板作為基材。5000系鋁合金含有鎂4.31質量%、鐵0.02質量%及矽0.02質量%,剩餘部分為鋁(Al)及不可避免的雜質。 [Example 6] (rough surface treatment) A rolled and annealed 5000-series aluminum alloy plate with a thickness of 3 mm was cut into a plate with a length of 50 mm and a width of 50 mm as a base material. The 5000-series aluminum alloy contains 4.31% by mass of magnesium, 0.02% by mass of iron, and 0.02% by mass of silicon, and the remainder is aluminum (Al) and unavoidable impurities.
利用乾式噴砂使粒子碰撞所述基材,於基材的表面形成凹凸。粒子使用不二製作所股份有限公司製造的不二無規(Fuji Random)WA 粒子編號1200(氧化鋁粒子,最大粒徑27.0 μm 平均粒徑9.5±0.8 μm)。於噴砂處理後,使基材於200 g/L的硝酸水溶液中於室溫(約20℃)下浸漬3分鐘並進行脫脂。The particles collide with the base material by dry sandblasting to form unevenness on the surface of the base material. As the particles, Fuji Random WA particle number 1200 (aluminum oxide particles, maximum particle diameter 27.0 μm, average particle diameter 9.5±0.8 μm) manufactured by Fuji Seisakusho Co., Ltd. was used. After blasting, the base material was dipped in 200 g/L nitric acid aqueous solution at room temperature (about 20° C.) for 3 minutes and degreased.
(蝕刻) 於將形成有凹凸的基材於溫度60℃、濃度50 g/L的氫氧化鈉水溶液中浸漬60秒並進行蝕刻後,於濃度200 g/L的硝酸水溶液中於室溫(約20℃)下浸漬2分鐘並去除污垢。 (etching) After immersing the substrate with unevenness in an aqueous solution of sodium hydroxide with a concentration of 50 g/L at a temperature of 60°C for 60 seconds and etching, it was etched in an aqueous solution of nitric acid with a concentration of 200 g/L at room temperature (about 20°C) Soak for 2 minutes and remove dirt.
(第一陽極氧化) 將蝕刻後的基材浸漬於含有濃度180 g/L的硫酸的pH為0的酸性水溶液中,於溫度18℃、電流密度15 mA/cm 2及電解時間11分鐘的電解條件下進行第一陽極氧化。 (First anodic oxidation) Immerse the etched substrate in an acidic aqueous solution with a pH of 0 containing sulfuric acid at a concentration of 180 g/L, and perform electrolysis at a temperature of 18°C, a current density of 15 mA/cm 2 and an electrolysis time of 11 minutes. Conditions for the first anodic oxidation.
(第二陽極氧化)
使第一陽極氧化後的構件浸漬於含有濃度106 g/L的酒石酸二鈉-二水合物及濃度3 g/L的氫氧化鈉的pH為13的鹼性水溶液中。然後,於溫度5℃、電壓160 V、電氣量1 C/cm
2、升壓速度1 V/秒及電解時間80秒的電解條件下對所述構件進行第二陽極氧化。如此,製作了本例的鋁構件。
(Second Anodization) The first anodized member was immersed in an alkaline aqueous solution at pH 13 containing disodium tartrate dihydrate at a concentration of 106 g/L and sodium hydroxide at a concentration of 3 g/L. Then, the member was subjected to the second anodic oxidation under the electrolysis conditions of temperature 5°C, voltage 160 V, electrical capacity 1 C/cm 2 , boosting speed 1 V/sec, and
[比較例14] 除了不實施第二陽極氧化以外,與實施例6同樣地製作本例的鋁構件。 [Comparative Example 14] An aluminum member of this example was produced in the same manner as in Example 6 except that the second anodization was not performed.
[比較例15] 除了不實施第一陽極氧化,使第二陽極氧化的電壓為110 V,電解時間為11分鐘以外,與實施例6同樣地製作鋁構件。 [Comparative Example 15] An aluminum member was fabricated in the same manner as in Example 6, except that the first anodic oxidation was not performed, and the voltage of the second anodic oxidation was 110 V, and the electrolysis time was 11 minutes.
圖8、圖9及圖10是對實施例6的鋁構件的剖面進行FIB加工並利用穿透式電子顯微鏡分別放大為2,550倍、19,500倍及43,000倍的圖像。圖11、圖12以及圖13是對比較例14的鋁構件的剖面進行FIB加工並利用穿透式電子顯微鏡分別放大為2,550倍、19,500倍及43,000倍的圖像。圖14、圖15以及圖16是對比較例15的鋁構件的剖面進行FIB加工並利用穿透式電子顯微鏡分別放大為2,550倍、19,500倍以及43,000倍的圖像。如圖8~圖16所示,可知第一多孔層具有多個分支的孔,第二多孔層具有呈直線狀延伸的多個孔。根據圖8~圖16以及未圖示的利用EDS所得的元素分析的結果,可知實施例6的陽極氧化皮膜中,於基材的表面形成有源自第二陽極氧化的阻擋層及第一多孔層。另外,可知源自第一陽極氧化的第二多孔層形成於第一多孔層的表面。Fig. 8, Fig. 9 and Fig. 10 are the images enlarged by 2,550 times, 19,500 times and 43,000 times respectively with a transmission electron microscope after FIB processing of the cross section of the aluminum member of Example 6. FIG. 11 , FIG. 12 and FIG. 13 are images enlarged by 2,550 times, 19,500 times and 43,000 times respectively by a transmission electron microscope after FIB processing of the cross section of the aluminum member of Comparative Example 14. FIG. 14 , FIG. 15 and FIG. 16 are images enlarged by 2,550 times, 19,500 times and 43,000 times respectively by a transmission electron microscope after FIB processing of the cross section of the aluminum member of Comparative Example 15. As shown in FIGS. 8 to 16 , it can be seen that the first porous layer has a plurality of branched pores, and the second porous layer has a plurality of linearly extending pores. From FIGS. 8 to 16 and the results of elemental analysis by EDS (not shown), it can be seen that in the anodized film of Example 6, the barrier layer derived from the second anodic oxidation and the first multilayer are formed on the surface of the substrate. hole layer. In addition, it was found that the second porous layer derived from the first anodic oxidation was formed on the surface of the first porous layer.
其次,為了確認顏料的狀態,製作了實施例7的鋁構件。Next, in order to confirm the state of the pigment, the aluminum member of Example 7 was produced.
[實施例7] 除了將第一陽極氧化的電解時間變更為11分鐘、將第二陽極氧化的氫氧化鈉濃度變更為5 g/L、將封孔時間變更為10分鐘以外,與實施例1同樣地製作鋁構件。 [Example 7] Aluminum members were produced in the same manner as in Example 1, except that the electrolysis time of the first anodization was changed to 11 minutes, the concentration of sodium hydroxide in the second anodization was changed to 5 g/L, and the sealing time was changed to 10 minutes. .
圖17及圖18是對實施例7的鋁構件的剖面進行FIB加工並利用穿透式電子顯微鏡分別放大為2,550倍及19,500倍的圖像。圖17及圖18表示與圖8~圖10同樣的剖面狀態,可知在實施例7的鋁構件中,第一多孔層具有多個分支的孔,第二多孔層具有呈直線狀延伸的多個孔。FIG. 17 and FIG. 18 are images enlarged by 2,550 times and 19,500 times respectively by a transmission electron microscope after FIB processing of the cross section of the aluminum member of Example 7. 17 and 18 show the same cross-sectional state as in FIGS. 8 to 10. It can be seen that in the aluminum member of Example 7, the first porous layer has a plurality of branched holes, and the second porous layer has linearly extending holes. multiple holes.
其次,藉由EDS對實施例7的鋁構件進行線分析。具體而言,對於圖19A的「HAADF檢測器(Detector)」中用線1所示的部分,進行了線分析。如圖19A及圖19B所示,可知來源於顏料的氧化鈦的鈦元素導入至陽極氧化皮膜。另外,SEM圖像中箭頭所示的部分對比度有明顯的差異,在線分析中亦在該處檢測出了很強的鈦強度,因此可知氧化鈦存在得特別多。Next, line analysis was performed on the aluminum member of Example 7 by EDS. Specifically, line analysis was performed on the portion indicated by
由以上的結果可知,包括第一多孔層及第二多孔層、且在陽極氧化皮膜中導入了白色顏料粒子的鋁構件的角度依存性低。From the above results, it can be seen that the angle dependence of the aluminum member including the first porous layer and the second porous layer and introducing white pigment particles into the anodized film is low.
以上,藉由實施例及比較例對本實施方式進行說明,但本實施方式並不限定於該些,可於本實施方式的主旨的範圍內進行各種變形。As mentioned above, although this embodiment was demonstrated using an Example and a comparative example, this embodiment is not limited to these, Various deformation|transformation is possible within the scope of this embodiment.
1:鋁構件 10:基材 11:表面 20:陽極氧化皮膜 21:阻擋層 22:第一多孔層 23:第二多孔層 24:表面 S1~S6:步驟 101:鋁構件 102:檢測器 103:入射光 104:反射光 1: Aluminum components 10: Substrate 11: surface 20: Anodized film 21: barrier layer 22: The first porous layer 23: The second porous layer 24: surface S1~S6: steps 101: Aluminum components 102: detector 103: Incident light 104: Reflected light
圖1是表示本實施方式的鋁構件的一例的剖面圖。 圖2是表示本實施方式的鋁構件的製造方法的一例的圖。 圖3是說明使用測角光度計(goniophotometer)來評價白色度的角度依存性的方法的圖。 圖4是示出實施例1、比較例1~比較例3及參考例的角度依存性的曲線圖。 圖5是示出實施例2、比較例4~比較例6及參考例的角度依存性的曲線圖。 圖6是示出實施例3、比較例7~比較例9及參考例的角度依存性的曲線圖。 圖7是示出實施例4、比較例10~比較例12及參考例的角度依存性的曲線圖。 圖8是對實施例6的鋁構件的剖面進行聚焦離子束(Focused Ion Beam,FIB)加工並利用穿透式電子顯微鏡(Transmission Electron Microscope,TEM)放大為2,550倍的圖像。 圖9是對實施例6的鋁構件的剖面進行FIB加工並利用TEM放大為19,500倍的圖像。 圖10是對實施例6的鋁構件的剖面進行FIB加工並利用TEM放大為43,000倍的圖像。 圖11是對比較例14的鋁構件的剖面進行FIB加工並利用TEM放大為2,550倍的圖像。 圖12是對比較例14的鋁構件的剖面進行FIB加工並利用TEM放大為19,500倍的圖像。 圖13是對比較例14的鋁構件的剖面進行FIB加工並利用TEM放大為43,000倍的圖像。 圖14是對比較例15的鋁構件的剖面進行FIB加工並利用TEM放大為2,550倍的圖像。 圖15是對比較例15的鋁構件的剖面進行FIB加工並利用TEM放大為19,500倍的圖像。 圖16是對比較例15的鋁構件的剖面進行FIB加工並利用TEM放大為43,000倍的圖像。 圖17是對實施例7的鋁構件的剖面進行FIB加工並利用TEM放大為2,550倍的圖像。 圖18是對實施例7的鋁構件的剖面進行FIB加工並利用TEM放大為19,500倍的圖像。 圖19A是藉由能量分散型X射線分光法(Energy Dispersive Spectrometer,EDS)對實施例7的鋁構件進行了線分析的結果。 圖19B是藉由EDS(能量分散型X射線分光法)對實施例7的鋁構件進行了線分析的結果。 FIG. 1 is a cross-sectional view showing an example of an aluminum member according to the present embodiment. FIG. 2 is a diagram showing an example of a method of manufacturing an aluminum member according to the present embodiment. FIG. 3 is a diagram illustrating a method of evaluating the angle dependence of whiteness using a goniophotometer. 4 is a graph showing the angle dependence of Example 1, Comparative Examples 1 to 3, and Reference Example. 5 is a graph showing the angle dependence of Example 2, Comparative Examples 4 to 6, and Reference Example. 6 is a graph showing the angle dependence of Example 3, Comparative Examples 7 to 9, and a reference example. 7 is a graph showing the angle dependence of Example 4, Comparative Examples 10 to 12, and Reference Example. FIG. 8 is an image magnified 2,550 times by a transmission electron microscope (Transmission Electron Microscope, TEM) after processing the cross section of the aluminum member of Example 6 with Focused Ion Beam (FIB). FIG. 9 is an image magnified 19,500 times by TEM of FIB processing of the cross section of the aluminum member of Example 6. FIG. FIG. 10 is an image magnified 43,000 times by TEM of FIB processing of the cross section of the aluminum member of Example 6. FIG. FIG. 11 is an image enlarged by 2,550 times by TEM after FIB processing of the cross section of the aluminum member of Comparative Example 14. FIG. FIG. 12 is an image magnified 19,500 times by TEM after FIB processing of the cross section of the aluminum member of Comparative Example 14. FIG. FIG. 13 is an image magnified 43,000 times by TEM after FIB processing of the cross section of the aluminum member of Comparative Example 14. FIG. FIG. 14 is an image magnified 2,550 times by TEM after FIB processing of the cross section of the aluminum member of Comparative Example 15. FIG. FIG. 15 is an image magnified 19,500 times by TEM after FIB processing of the cross section of the aluminum member of Comparative Example 15. FIG. FIG. 16 is an image magnified 43,000 times by TEM after FIB processing of the cross section of the aluminum member of Comparative Example 15. FIG. FIG. 17 is an image magnified 2,550 times by TEM of FIB processing of the cross section of the aluminum member of Example 7. FIG. FIG. 18 is an image magnified 19,500 times by TEM of FIB processing of the cross section of the aluminum member of Example 7. FIG. FIG. 19A is the result of line analysis of the aluminum member of Example 7 by energy dispersive X-ray spectroscopy (Energy Dispersive Spectrometer, EDS). 19B is a result of line analysis of the aluminum member of Example 7 by EDS (energy dispersive X-ray spectroscopy).
1:鋁構件 1: Aluminum components
10:基材 10: Substrate
11:表面 11: surface
20:陽極氧化皮膜 20: Anodized film
21:阻擋層 21: barrier layer
22:第一多孔層 22: The first porous layer
23:第二多孔層 23: The second porous layer
24:表面 24: surface
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