TW202318563A - Semiconductor process equipment and grasping device thereof - Google Patents
Semiconductor process equipment and grasping device thereof Download PDFInfo
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- H—ELECTRICITY
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
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Abstract
Description
本申請涉及半導體加工技術領域,具體而言,本申請涉及一種半導體製程設備及抓取裝置。The present application relates to the technical field of semiconductor processing, and in particular, the present application relates to a semiconductor processing equipment and a gripping device.
在集成電路領域的濕法清洗設備中,傳輸系統起到至關重要的作用,晶圓的取片方式和取片位置都影響著晶圓最終的製程效果,尤其是取片過程中的穩定性。In the wet cleaning equipment in the field of integrated circuits, the transmission system plays a vital role. The way and position of the wafer pick-up affect the final process effect of the wafer, especially the stability during the pick-up process. .
現有技術中,抓取裝置的前端固定設置有前限位擋塊,後端滑動設置有後限位擋塊,後限位擋塊是由氣缸控制運動。在抓取過程中,通過兩個前限位擋塊對晶圓進行限位,並通過氣缸朝靠近晶圓的方向推動後限位擋塊,直至後限位擋塊與兩個前限位擋塊共同將晶圓夾持在三者之間,但是,在通過承載裝置向晶圓下表面吹送氣體,以利用伯努利原理使晶圓懸浮於承載裝置上方時,晶圓會在承載裝置的多個卡針內晃動,導致在抓取晶圓時,晶圓會有些許偏移造成抓取裝置取片失敗的情況發生,還有可能出現雖然取片成功,但是前限位擋塊或後限位擋塊未夾緊晶圓的情況,從而造成晶圓在傳輸中脫落碎片。In the prior art, the front end of the grabbing device is fixedly provided with a front limit stopper, and the rear end is slidably provided with a rear limit stopper, and the movement of the rear limit stopper is controlled by a cylinder. During the grabbing process, the wafer is limited by the two front limit stops, and the rear limit stop is pushed towards the direction close to the wafer by the cylinder until the rear limit stop is in contact with the two front limit stops. However, when gas is blown to the lower surface of the wafer through the carrier device to suspend the wafer above the carrier device using Bernoulli's principle, the wafer will be in the carrier device. Multiple card pins shake inside, resulting in a slight deviation of the wafer when grabbing the wafer, resulting in the failure of the grabbing device to pick up the wafer. It may also happen that although the wafer is picked up successfully, the front limit stop or rear A condition where the limit stop does not clamp the wafer, causing the wafer to break off during transport.
本申請針對現有方式的缺點,提出一種半導體製程設備及抓取裝置,用以解決現有技術存在的晶圓偏移導致的取片失敗以及碎片的技術問題。Aiming at the shortcomings of the existing methods, the present application proposes a semiconductor manufacturing equipment and a gripping device to solve the technical problems of chip picking failure and debris caused by wafer offset existing in the prior art.
第一個方面,本申請實施例提供了一種半導體製程設備的抓取裝置,用於抓取晶圓,且與該半導體製程設備中的驅動裝置連接,用於在該驅動裝置的驅動下傳輸晶圓,其中,包括:殼體、驅動機構及多個卡合件;該殼體用於與該驅動裝置連接,用於在該驅動裝置的驅動下移動;多個該卡合件與該殼體轉動連接,並且沿該殼體的周向間隔分佈,該驅動機構用於同步驅動各該卡合件轉動,以卡緊或釋放該晶圓的邊緣。In the first aspect, the embodiment of the present application provides a grabbing device for semiconductor processing equipment, which is used for grabbing wafers, and is connected with the driving device in the semiconductor processing equipment, and is used for transporting wafers driven by the driving device. circle, including: a housing, a driving mechanism and a plurality of engaging parts; the housing is used to connect with the driving device and is used to move under the drive of the driving device; a plurality of the engaging parts and the housing Rotationally connected and distributed at intervals along the circumference of the housing, the driving mechanism is used to synchronously drive the rotation of each engaging member to clamp or release the edge of the wafer.
於本申請的一實施例中,多個該卡合件在卡緊該晶圓時使該晶圓位於該殼體的下方,且該殼體具有鏤空部,該鏤空部用於使該晶圓的上表面裸露。In an embodiment of the present application, when the plurality of clamping parts clamp the wafer, the wafer is located under the housing, and the housing has a hollow portion, and the hollow portion is used to make the wafer The upper surface is exposed.
於本申請的一實施例中,每個該卡合件均包括轉軸和偏心軸,該轉軸與該殼體可轉動地連接,該偏心軸與該轉軸偏心設置,且固定連接,該轉軸能夠繞其軸線順時針或逆時針旋轉,以帶動該偏心軸轉動至卡緊該晶圓的邊緣的第一位置,或者釋放該晶圓的邊緣的第二位置。In an embodiment of the present application, each of the engaging parts includes a rotating shaft and an eccentric shaft, the rotating shaft is rotatably connected to the housing, the eccentric shaft is eccentrically arranged with the rotating shaft, and is fixedly connected, and the rotating shaft can rotate around Its axis rotates clockwise or counterclockwise to drive the eccentric shaft to rotate to a first position for clamping the edge of the wafer, or a second position for releasing the edge of the wafer.
於本申請的一實施例中,該偏心軸背離該轉軸的一端上設置有承載部,該承載部用於在該偏心軸轉動至該第一位置時,支撐該晶圓的底部邊緣處。In an embodiment of the present application, a bearing part is disposed on the end of the eccentric shaft away from the rotating shaft, and the bearing part is used to support the bottom edge of the wafer when the eccentric shaft rotates to the first position.
於本申請的一實施例中,該偏心軸包括夾持柱,該承載部包括承載板;該夾持柱的一端與該轉軸連接,該夾持柱的另一端與該承載板連接;該承載板間隔設置在該轉軸的下方,且與該夾持柱偏心設置,用以在該偏心軸轉動至該第一位置時,支撐該晶圓的底部邊緣處。In an embodiment of the present application, the eccentric shaft includes a clamping column, and the bearing portion includes a bearing plate; one end of the clamping column is connected to the rotating shaft, and the other end of the clamping column is connected to the bearing plate; the bearing The plate is spaced below the rotating shaft and is eccentrically arranged with the clamping column for supporting the bottom edge of the wafer when the eccentric shaft rotates to the first position.
於本申請的一實施例中,該驅動機構包括設置於該殼體內,且沿該殼體的周向環繞設置的環形驅動件,該環形驅動件與多個該卡合件的該轉軸連接,用於同步帶動多個該卡合件的該轉軸繞其軸線順時針或逆時針旋轉。In one embodiment of the present application, the driving mechanism includes an annular driving member arranged in the housing and arranged around the circumference of the housing, the annular driving member is connected to the rotating shafts of a plurality of the engaging members, The shaft for synchronously driving a plurality of engaging parts rotates clockwise or counterclockwise around its axis.
於本申請的一實施例中,該環形驅動件的外周面設有齒形結構,多個該卡合件的該轉軸的外周面設置有與該齒形結構嚙合的第一齒部,該環形驅動件通過圍繞自身軸線轉動來同步帶動多個該卡合件的該轉軸繞其軸線順時針或逆時針旋轉。In an embodiment of the present application, a toothed structure is provided on the outer peripheral surface of the ring-shaped driving member, and a first tooth portion meshing with the toothed structure is provided on the outer peripheral surface of the rotating shafts of the plurality of engaging members. The driving member rotates around its own axis to synchronously drive the rotating shafts of the plurality of engaging members to rotate clockwise or counterclockwise around their axes.
於本申請的一實施例中,該驅動機構還包括傳動件和驅動器,該傳動件設置於該殼體內,且該傳動件的外周具有與該齒形結構嚙合的第二齒部,該驅動器與該傳動件連接,用於通過驅動該傳動件圍繞自身軸線轉動來帶動該環形驅動件旋轉。In an embodiment of the present application, the driving mechanism further includes a transmission member and a driver, the transmission member is disposed in the housing, and the outer circumference of the transmission member has a second tooth portion meshing with the toothed structure, and the driver and The transmission member is connected to drive the ring drive member to rotate by driving the transmission member to rotate around its own axis.
於本申請的一實施例中,該殼體包括第一蓋板及第二蓋板,該第一蓋板蓋合於該第二蓋板上,該第一蓋板及該第二蓋板均具有缺口,以對接形成該鏤空部;兩者之間對接形成有安裝空間,該安裝空間用於容置該第一齒部、該環形驅動件及該傳動件。In one embodiment of the present application, the housing includes a first cover plate and a second cover plate, the first cover plate is covered on the second cover plate, and the first cover plate and the second cover plate are both There is a notch to form the hollow part by butting; an installation space is formed by butting between the two, and the installation space is used for accommodating the first tooth part, the ring-shaped driving part and the transmission part.
於本申請的一實施例中,該抓取裝置還包括連接結構,該連接結構的一端與該殼體連接,該連接結構的另一端高於該殼體的頂面,用於與該驅動裝置連接。In an embodiment of the present application, the grabbing device further includes a connection structure, one end of the connection structure is connected to the casing, and the other end of the connection structure is higher than the top surface of the casing, and is used for connecting with the driving device connect.
第二個方面,本申請實施例提供了一種半導體製程設備,包括:製程腔室、驅動裝置以及如第一個方面提供的抓取裝置,該製程腔室內設有可升降的承載裝置,該抓取裝置與該驅動裝置相連,用於在該驅動裝置的驅動下移動至該承載裝置上方以抓取或釋放該晶圓。In the second aspect, the embodiment of the present application provides a semiconductor processing equipment, including: a processing chamber, a driving device, and a gripping device as provided in the first aspect, the processing chamber is provided with a liftable carrying device, and the gripping device The fetching device is connected with the driving device, and is used to move above the carrying device under the driving of the driving device to grab or release the wafer.
本申請實施例提供的技術方案帶來的有益技術效果是:The beneficial technical effects brought by the technical solutions provided by the embodiments of the present application are:
本申請實施例通過殼體上設置有多個沿周向分佈的卡合件,並且通過多個卡合件與晶圓的邊緣配合實現對晶圓的卡合夾緊,再經由驅動裝置實現對晶圓的傳輸。由於多個卡合件沿殼體的周向設置,使得多個卡合件合圍成的圓環可以與殼體同心設置,在實際抓取晶圓的過程中能夠使晶圓與多個卡合件以及殼體之間均同心設置,從而避免晶圓與抓取裝置偏移而造成晶圓抓取失敗,或者抓取成功後由於晶圓偏移而造成晶圓脫落及碎片,從而確保取片的穩定性和成功率,進而提高晶圓傳輸效率及晶圓的良率。In the embodiment of the present application, the housing is provided with a plurality of engaging parts distributed along the circumferential direction, and through the cooperation of the plurality of engaging parts with the edge of the wafer, the clamping and clamping of the wafer is realized, and then the alignment is realized through the driving device. Wafer transfer. Since a plurality of engaging parts are arranged along the circumferential direction of the housing, the ring formed by the plurality of engaging parts can be arranged concentrically with the housing, and the wafer can be connected with multiple cards in the process of actually grabbing the wafer. The assembly and the shell are arranged concentrically, so as to avoid the wafer grabbing failure caused by the offset between the wafer and the grabbing device, or the wafer falling off and fragments due to the wafer offset after the grabbing is successful, so as to ensure the pickup The stability and success rate of wafers can be improved, thereby improving wafer transfer efficiency and wafer yield.
以下揭露提供用於實施本揭露之不同構件之許多不同實施例或實例。下文描述組件及配置之特定實例以簡化本揭露。當然,此等僅為實例且非意欲限制。舉例而言,在以下描述中之一第一構件形成於一第二構件上方或上可包含其中該第一構件及該第二構件經形成為直接接觸之實施例,且亦可包含其中額外構件可形成在該第一構件與該第二構件之間,使得該第一構件及該第二構件可不直接接觸之實施例。另外,本揭露可在各個實例中重複參考數字及/或字母。此重複出於簡化及清楚之目的且本身不指示所論述之各個實施例及/或組態之間的關係。The following disclosure provides many different embodiments, or examples, of different means for implementing the disclosure. Specific examples of components and configurations are described below to simplify the present disclosure. Of course, these are examples only and are not intended to be limiting. For example, in the following description a first member is formed over or on a second member may include embodiments in which the first member and the second member are formed in direct contact, and may also include embodiments in which additional members An embodiment may be formed between the first member and the second member so that the first member and the second member may not be in direct contact. Additionally, the present disclosure may repeat reference numerals and/or letters in various instances. This repetition is for simplicity and clarity and does not in itself indicate a relationship between the various embodiments and/or configurations discussed.
此外,為便於描述,諸如「下面」、「下方」、「下」、「上方」、「上」及類似者之空間相對術語可在本文中用於描述一個元件或構件與另一(些)元件或構件之關係,如圖中圖解說明。空間相對術語意欲涵蓋除在圖中描繪之定向以外之使用或操作中之裝置之不同定向。設備可以其他方式定向(旋轉90度或按其他定向)且因此可同樣解釋本文中使用之空間相對描述詞。In addition, for ease of description, spatially relative terms such as "below", "below", "under", "above", "upper" and the like may be used herein to describe the relationship between one element or member and another(s) The relationship between elements or components, as illustrated in the figure. Spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and thus the spatially relative descriptors used herein should be interpreted similarly.
儘管陳述本揭露之寬泛範疇之數值範圍及參數係近似值,然儘可能精確地報告特定實例中陳述之數值。然而,任何數值固有地含有必然由於見於各自測試量測中之標準偏差所致之某些誤差。再者,如本文中使用,術語「大約」通常意謂在一給定值或範圍之10%、5%、1%或0.5%內。替代地,術語「大約」意謂在由此項技術之一般技術者考量時處於平均值之一可接受標準誤差內。除在操作/工作實例中以外,或除非以其他方式明確指定,否則諸如針對本文中揭露之材料之數量、時間之持續時間、溫度、操作條件、數量之比率及其類似者之全部數值範圍、數量、值及百分比應被理解為在全部例項中由術語「大約」修飾。相應地,除非相反地指示,否則本揭露及隨附發明申請專利範圍中陳述之數值參數係可根據需要變化之近似值。至少,應至少鑑於所報告有效數位之數目且藉由應用普通捨入技術解釋各數值參數。範圍可在本文中表達為從一個端點至另一端點或在兩個端點之間。本文中揭露之全部範圍包含端點,除非另有指定。Notwithstanding that the numerical ranges and parameters setting forth the broad scope of the disclosure are approximations, the numerical values set forth in the specific examples are reported as precisely as possible. Any numerical value, however, inherently contains certain errors necessarily resulting from the standard deviation found in their respective testing measurements. Furthermore, as used herein, the term "about" generally means within 10%, 5%, 1%, or 0.5% of a given value or range. Alternatively, the term "about" means within an acceptable standard error of the mean when considered by one of ordinary skill in the art. Except in operating/working examples, or unless expressly specified otherwise, all numerical ranges such as for amounts of materials disclosed herein, durations of time, temperatures, operating conditions, ratios of amounts, and the like, Amounts, values and percentages should be understood as being modified by the term "about" in all instances. Accordingly, unless indicated to the contrary, the numerical parameters set forth in this disclosure and the accompanying claims are approximations that may vary as desired. At a minimum, each numerical parameter should at least be construed in light of the number of reported significant digits and by applying ordinary rounding techniques. Ranges can be expressed herein as from one endpoint to the other or as between two endpoints. All ranges disclosed herein are inclusive of endpoints unless otherwise specified.
本申請實施例提供了一種半導體製程設備的抓取裝置,用於抓取晶圓100,且與半導體製程設備中的驅動裝置連接,用於在該驅動裝置的驅動下傳輸晶圓。該抓取裝置的結構示意圖如圖1A、圖1B及圖3所示,包括:殼體1、驅動機構3及多個卡合件2;殼體1用於與半導體製程設備中的驅動裝置連接,用於在驅動裝置的驅動下移動;多個卡合件2與殼體1轉動連接,並且沿殼體1的周向間隔分佈,驅動機構3用於同步驅動各卡合件2轉動,以卡緊或釋放晶圓100的邊緣。The embodiment of the present application provides a grabbing device for semiconductor processing equipment, which is used to grab a
如圖1A及圖1B所示,半導體製程設備可以是用於執行單片濕法刻蝕製程的設備,抓取裝置則可以抓取晶圓100,並在驅動裝置的驅動下傳輸晶圓100,以能夠移入或移出製程腔室,但是本申請實施例並不限定半導體製程設備的具體類型,本領域技術人員可以根據實際情況自行調整。殼體1可以是採用金屬材質製成的圓盤結構,卡合件2可以是金屬材質製成的柱狀結構,多個卡合件2可以沿殼體1的周向排布於殼體1底部,並且多個卡合件2的頂部與殼體1轉動連接,多個卡合件2的底部相互配合以用於與晶圓100的邊緣接觸,以實現從製程腔室內的承載裝置(圖中均未示出)上抓取晶圓100,並且由於殼體1與半導體製程設備的驅動裝置連接,殼體1及卡合件2可以在驅動裝置的驅動下傳輸晶圓100。驅動機構3可以與多個卡合件2傳動連接,用於同步驅動各卡合件2轉動,以使多個卡合件2同時轉動以卡緊或釋放晶圓的邊緣。進一步的,由於多個卡合件2沿殼體1的周向設置,使得多個卡合件2合圍成的圓形可以與殼體1同心設置,在實際抓取晶圓100的過程中能夠使晶圓100與多個卡合件2以及殼體1之間均同心設置,從而避免晶圓100與抓取裝置偏移而造成晶圓100抓取失敗,或者抓取成功後由於晶圓100偏移而造成晶圓100脫落及碎片,從而大幅提高晶圓100的良率。As shown in FIG. 1A and FIG. 1B, the semiconductor manufacturing equipment may be equipment for performing a monolithic wet etching process, and the grasping device may grasp the
本申請實施例通過殼體上設置有多個沿周向分佈的卡合件,並且通過多個卡合件與晶圓的邊緣配合實現對晶圓的卡合夾緊,再經由驅動裝置實現對晶圓的傳輸。由於多個卡合件沿殼體的周向設置,使得多個卡合件合圍成的圓形可以與殼體同心設置,在實際抓取晶圓的過程中能夠使晶圓與多個卡合件以及殼體之間均同心設置,從而避免晶圓與抓取裝置偏移而造成晶圓抓取失敗,或者抓取成功後由於晶圓偏移而造成晶圓脫落及碎片,從而確保取片的穩定性和成功率,進而提高晶圓傳輸效率及晶圓的良率。In the embodiment of the present application, the housing is provided with a plurality of engaging parts distributed along the circumferential direction, and through the cooperation of the plurality of engaging parts with the edge of the wafer, the clamping and clamping of the wafer is realized, and then the alignment is realized through the driving device. Wafer transfer. Since a plurality of engaging parts are arranged along the circumference of the housing, the circle surrounded by the plurality of engaging parts can be set concentrically with the housing, and the wafer can be connected with multiple cards in the process of actually grabbing the wafer. The assembly and the shell are arranged concentrically, so as to avoid the wafer grabbing failure caused by the offset between the wafer and the grabbing device, or the wafer falling off and fragments due to the wafer offset after the grabbing is successful, so as to ensure the pickup The stability and success rate of wafers can be improved, thereby improving wafer transfer efficiency and wafer yield.
需要說明的是,本申請實施例並不限定多個卡合件2的設置位置,例如多個卡合件2還可以設置於殼體1的頂部,從而實現由晶圓100的底部進行抓取。因此本申請實施例並不以此為限,本領域技術人員可以根據實際情況自行調整設置。It should be noted that the embodiment of the present application does not limit the installation positions of the plurality of
於本申請的一實施例中,如圖1B所示,多個卡合件2在卡緊晶圓100時使晶圓100位於殼體1的下方,且殼體1具有鏤空部11,該鏤空部11用於使晶圓100的上表面裸露。具體來說,殼體1可以採用金屬材質製成的環形結構,以使殼體1的居中位置形成有圓形的鏤空部11,該鏤空部11的直徑尺寸可以略小於晶圓100的尺寸,以裸露晶圓100除邊緣之外的有效製程區域。並且鏤空部11的直徑也可以小於多個卡合件2圍成的圓形直徑,以便在殼體1上設置多個卡合件2,從而使得本申請實施結構簡單設計合理。採用上述設計,在實際取片時由於鏤空部11的存在,使得晶圓100的上表面能始終裸露於製程腔室頂部靜電發生器及風扇組件元件下,從而保證晶圓100上表面的靜電平衡和潔淨度,減少晶圓100整體的顆粒污染,從而提高了製程的效果。In an embodiment of the present application, as shown in FIG. 1B , when the
需要說明的是,本申請實施例並不限定鏤空部11的具體直徑,鏤空部11的直徑可以對應於晶圓100的直徑設置,只要鏤空部11的直徑略小於晶圓100的直徑即可。因此本申請實施例並不以此為限,本領域技術人員可以根據實際情況自行調整設置。It should be noted that the embodiment of the present application does not limit the specific diameter of the
於本申請的一實施例中,如圖1A及圖1B所示,各卡合件2均可轉動地設置於殼體1上,並且多個卡合件2通過旋轉能夠卡緊或釋放晶圓100的邊緣。具體來說,多個卡合件2均可以繞其自身的中心軸轉動,且在同步轉動過程中,多個卡合件2合圍的圓形尺寸會發生變化,並通過切換轉動方向來實現圓形尺寸在增大與減小之間切換,通過驅動多個卡合件2同時自旋轉,並且當多個卡合件2旋轉至合圍的圓形尺寸最大時,多個卡合件2可以釋放晶圓100;當多個卡合件2旋轉至合圍的圓形尺寸最小時,多個卡合件2可以卡緊晶圓100的邊緣。採用上述設計,通過旋轉多個卡合件2即可以實現晶圓100的卡緊和釋放,不僅調節方便以及佔用空間較小,並且卡合件2與晶圓100的邊緣卡合使得本申請實施例與晶圓100的接觸面積較小,從而有效減少與晶圓100的接觸面積,避免在抓取晶圓100過程中造成污染。進一步的,多個卡合件2可以設置於殼體1的底部,從而便於從承載裝置的上方抓取晶圓100。In one embodiment of the present application, as shown in FIG. 1A and FIG. 1B , each engaging
需要說明的是,本申請實施例並不限定卡合件2的具體實施方式,例如卡合件2也可以繞其它中心軸旋轉,只要其能夠在移動後卡緊晶圓100的邊緣即可。因此本申請實施例並不以此為限,本領域技術人員可以根據實際情況自行調整設置。It should be noted that the embodiment of the present application does not limit the specific implementation of the clamping
於本申請的一實施例中,如圖1A至圖2B所示,每個卡合件2均包括轉軸21和偏心軸22,轉軸21與殼體1可轉動地連接,偏心軸22與轉軸21偏心設置,且固定連接,轉軸21能夠繞其軸線順時針或逆時針旋轉,以帶動偏心軸22轉動至卡緊晶圓100的邊緣的第一位置,或者釋放晶圓100的邊緣的第二位置。In one embodiment of the present application, as shown in FIGS. 1A to 2B , each engaging
如圖1A至圖2B所示,卡合件2可以包括一體成形的轉軸21及偏心軸22,並且整體形狀可以是杆狀結構。轉軸21的頂部可以設置於殼體1內,偏心軸22可以位於轉軸21的底端,並且偏心軸22偏置於轉軸21底端的一側。但是本申請實施例並不限定卡合件2的具體結構,例如偏心軸22可以焊接在轉軸21上,或者偏心軸22也可以採用緊固件固定於轉軸21的底部,只要偏心軸22在轉軸21繞其中心軸旋轉至第一位置或第二位置時,能夠與晶圓100的邊緣卡合或釋放即可。在實際應用時,可以使轉軸21順時針旋轉一預設角度,以使多個卡合件2的偏心軸22同時向殼體1的中部移動,使得多個卡合件2構成的圓形尺寸縮小,從而實現對晶圓100的邊緣進行卡緊;或者,使轉軸21逆時針旋轉一預設角度,以使多個卡合件2的偏心軸22同時向殼體1的邊緣移動,使得多個卡合件2構成的圓形尺寸增大,從而實現對晶圓100進行釋放。採用上述設計,使得本申請實施例結構簡單易於控制,從而大幅提高抓取效率以及降低故障率。As shown in FIG. 1A to FIG. 2B , the engaging
於本申請的一實施例中,偏心軸22背離轉軸21的一端上設置有承載部,該承載部用於在偏心軸22轉動至上述第一位置時,支撐晶圓100的底部邊緣處。借助承載部,可以在利用偏心軸22夾持晶圓100的邊緣的同時,利用承載部支撐晶圓100的底部邊緣,以使得承載部與轉軸21底端之間形成有卡合位,以用於將晶圓100的邊緣卡合於該卡合位內,從而防止晶圓100與卡合件2脫落。採用上述設計,由於承載部在使用時可以位於晶圓100的底部,即使夾持柱23對於晶圓100夾持力度不夠,晶圓100也無法從卡合件2上脫落,從而大幅提高本申請實施例取片的安全性及穩定性。In an embodiment of the present application, the end of the
於本申請的一實施例中,如圖1A至圖2B所示,偏心軸22包括夾持柱23;上述承載部包括承載板24;夾持柱23的一端與轉軸21連接,夾持柱23的另一端與承載板24連接;承載板24間隔設置在轉軸21的下方,且與夾持柱23偏心設置,用以在偏心軸22轉動至上述第一位置時,支撐晶圓100的底部邊緣處,這樣,可以在利用夾持柱23夾持晶圓100的邊緣的同時,利用承載板24支撐晶圓100的底部邊緣。可選的,還可以使承載板24與轉軸21的底端共同卡住晶圓100的邊緣,即,承載板24支撐晶圓100的底部邊緣,同時轉軸21的底端壓住晶圓100的頂部邊緣。在實際應用中,夾持柱23與承載板24可以採用一體成形結構,或者兩者也可以採用分體式結構,並且通過緊固件固定連接。In one embodiment of the present application, as shown in FIGS. 1A to 2B , the
在一個具體的實施例中,如圖2A和圖2B所示,夾持柱23的一端與轉軸21連接,另一端與承載板24連接;夾持柱23例如為條形柱,該條形柱的長度方向沿轉軸21的軸向設置,厚度方向沿轉軸21的徑向設置,該條形柱的外周壁例如為圓弧形,且該條形柱的部分外周壁與轉軸21部分周壁對齊設置,即實現二者的偏心設置。承載板24例如為圓板,夾持柱23在承載板24上的投影位於承載板24的邊緣區域,該承載板24的直徑大於條形柱的厚度,並且承載板24的部分周緣與夾持柱23的部分周壁對齊設置,這樣承載板24能夠在條形柱接觸晶圓邊緣時,伸入晶圓底部。在實際應用中,上述夾持柱23並不局限於採用條形柱,其還可以採用其他任意形狀,例如圓柱形、橢圓形等等,只要能夠在轉軸21繞其中心軸旋轉至第一位置或第二位置時,能夠與晶圓100的邊緣卡合或釋放即可;上述承載板24也並不局限於採用圓板,其還可以採用其他任意形狀,例如矩形、方形、橢圓形等等,只要能夠在轉軸21繞其中心軸旋轉至第一位置或第二位置時,支撐晶圓100的底部邊緣或者釋放即可。本申請實施例並不以此為限,本領域技術人員可以根據實際情況自行調整設置。In a specific embodiment, as shown in FIG. 2A and FIG. 2B, one end of the
於本申請的一實施例中,如圖1A至圖3所示,驅動機構3包括設置於殼體1內,且沿殼體1的周向環繞設置的環形驅動件31,環形驅動件31與多個卡合件2的轉軸21連接,用於同步帶動多個卡合件2的轉軸21繞其軸線順時針或逆時針旋轉,以使卡合件2卡緊或釋放晶圓100。In one embodiment of the present application, as shown in FIG. 1A to FIG. 3 , the
如圖1A至圖3所示,環形驅動件31可以是金屬材質的圓環形結構,設置於殼體1內,並且位於多個卡合件2內側,環形驅動件31的外周緣均與多個卡合件2接觸,以用於帶動所有卡合件2進行旋轉。進一步的,卡合件2的具體數量可以為六個,並且每三個分為一組,兩組卡合件2分別對稱設置於環形驅動件31的上下兩側,以有效減少卡合件2的數量,從而降低應用及維護成本。如此,通過一個環形驅動件31帶動多個卡合件2進行旋轉,便於對卡合件2的控制,也便於環形驅動件31的設置。採用上述設計,僅採用一個環形驅動件31即可以同時帶動多個卡合件2旋轉,不僅能大幅降低應用及維護成本,而且還能提高穩定性且降低故障率。As shown in FIGS. 1A to 3 , the annular driving
需要說明的是,本申請實施例並不限定環形驅動件31的具體實施方式,例如多個卡合件2可以設置於環形驅動件31的內周緣,或者每個卡合件2均單獨設置有一個環形驅動件31。因此本申請實施例並不以此為限,本領域技術人員可以根據實際情況自行調整設置。It should be noted that the embodiment of the present application does not limit the specific implementation of the
於本申請的一實施例中,如圖1A至圖3所示,環形驅動件31的外周面設有齒形結構,多個卡合件2的轉軸21外周面設置有與齒形結構嚙合的第一齒部,環形驅動件31通過圍繞自身軸線轉動來同步帶動多個卡合件2的轉軸21繞其軸線順時針或逆時針旋轉。具體來說,環形驅動件31的外周壁設有齒形結構,即環形驅動件31整體結構呈中空齒輪狀。卡合件2的轉軸21頂部可以設置有第一齒部,該第一齒部例如是套設於轉軸21頂部的齒輪,卡合件2的第一齒部與環形驅動件31的齒形結構嚙合設置。通過環形驅動件31的齒形結構與卡合件2的第一齒部嚙合,將動力從環形驅動件31傳遞至卡合件2,動力傳輸比較穩定精確,且便於通過嚙合的齒數控制卡合件2旋轉的角度,避免卡合件2對晶圓100的卡合力較大造成晶圓100碎片,從而提高本申請實施例安全性及穩定性。In one embodiment of the present application, as shown in FIGS. 1A to 3 , the outer peripheral surface of the
需要說明的是,本申請實施例並不限定環形驅動件31及卡合件2的具體傳動方式,例如兩者也可以通過接觸摩擦方式實現傳動,從而降低加工成本。因此本申請實施例並不以此為限,本領域技術人員可以根據實際情況自行調整設置。It should be noted that the embodiment of the present application does not limit the specific transmission mode of the annular driving
於本申請的一實施例中,如圖1A至圖3所示,驅動機構3還包括傳動件32及驅動器(圖中未示出),傳動件32設置於殼體1內,且傳動件32的外周具有與齒形結構嚙合的第二齒部,驅動器與傳動件32連接,用於通過驅動傳動件32圍繞自身軸線轉動來帶動環形驅動件31旋轉。具體來說,傳動件32可以採用一齒輪結構,即傳動件32外周具有與齒形結構嚙合的第二齒部。傳動件32整體可以設置於殼體1內,並且使第二齒部與環形驅動件31的齒形結構嚙合設置,驅動器與傳動件32連接,驅動器例如採用電機,傳動件用於將驅動器的動力傳動至環形驅動件31上,然後再通過環形驅動件31的齒形結構與卡合件2的第一齒部嚙合,將動力從環形驅動件31傳遞至卡合件2。由於傳動件32與環形驅動件31及卡合件2均採用齒輪方式傳動,使得動力傳輸比較穩定精確,且便於通過嚙合的齒數控制傳動件32旋轉的角度,避免傳動件32對晶圓100的卡合力較大造成晶圓100碎片,從而進一步提高本申請實施例安全性及穩定性。In an embodiment of the present application, as shown in FIGS. 1A to 3 , the
需要說明的是,本申請實施例並不限定傳動件32的具體數量,例如傳動件32可以為多個,且分佈於環形驅動件31的外周,從而提高動力傳輸的穩定性。因此本申請實施例並不以此為限,本領域技術人員可以根據實際情況自行調整設置。It should be noted that the embodiment of the present application does not limit the specific number of
於本申請的一實施例中,如圖1A至圖3所示,殼體1包括第一蓋板12及第二蓋板13,第一蓋板12蓋合于第二蓋板13上,第一蓋板12及第二蓋板13均具有圓形缺口,以對接形成鏤空部11;並且兩者對接形成有安裝空間,安裝空間用於容置第一齒部、環形驅動件31及傳動件32。In one embodiment of the present application, as shown in FIG. 1A to FIG. 3 , the housing 1 includes a
如圖1A至圖3所示,第一蓋板12及第二蓋板13均採用圓環形結構,即第一蓋板12及第二蓋板13上均具有圓形缺口,當第一蓋板12與第二蓋板13蓋合時圓形缺口配合形成上述實施例的鏤空部11。第一蓋板12及第二蓋板13均形成有沿自身周向延伸設置的環形凹槽,當第一蓋板12與第二蓋板13蓋合時,兩個蓋板能形成安裝空間,以便於容置轉軸21的第一齒部、環形驅動件31及傳動件32。進一步的,卡合件2的第一齒部位於安裝空間內,卡合件2的頂端可以第一蓋板12連接,並且卡合件2的部分轉軸21及偏心軸22穿過於第二蓋板13後,位於第二蓋板13的底部;以及環形驅動件31及傳動件32均設置于第一蓋板12上。在實際應用時,僅需拆卸第二蓋板13即可以實現對各部件進行拆裝維護,從而大幅提高本申請實施例的拆裝維護效率。As shown in Fig. 1A to Fig. 3, the
需要說明的是,本申請實施例並不限定卡合件2、傳動件32及驅動件與殼體1之間的配合方式,例如卡合件2、傳動件32及環形驅動件31均可以設置於第二殼體1上。因此本申請實施例並不以此為限,本領域技術人員可以根據實際情況自行調整設置。It should be noted that the embodiment of the present application does not limit the cooperation between the
於本申請的一實施例中,如圖1A至圖3所示,抓取裝置還包括連接結構5,連接結構5的一端(例如底端)與殼體1連接,連接結構5的一端(例如頂端)高於殼體1的頂面,用於與驅動裝置連接。具體來說,連接結構5可以與殼體1採用一體成形結構,但是本申請實施例並不以此為限,例如兩者也可以採用分體式結構。進一步的,連接結構5具體可以採用一倒“L”形結構,其中連接結構5的豎杆可以設置於殼體1的一側,豎杆的底端可以與殼體1的外周壁一體成形,頂端高於殼體1的頂面,即豎杆的高度大於殼體1的軸向高度,連接結構5的橫杆一端可以與豎杆的頂端連接,另一端用於與驅動裝置連接。在實際應用時,驅動裝置可以直接驅動殼體1進入製程腔室內進行取片,具體地,當製程腔室用於執行清洗製程時,承載裝置可升降的設置於製程腔室內,連接結構5的設計使得承載裝置帶動晶圓上升至距離製程腔室的開口一定距離即可,此時殼體1可以伸入製程腔室內進行取放晶圓,避免了現有技術中承載裝置需要將晶圓上升至與製程腔室的開口平齊位置,抓取裝置才能進行取放晶圓,從而造成顆粒污染問題,因此本申請實施例不僅在一定程度上避免晶圓100上表面被顆粒污染,而且能提高傳輸效率。進一步的,由於無需承載裝置上升至較高的位置,還可以避免殼體1與承載裝置發生機械干涉,從而進一步提高本申請實施例的安全性及穩定性。In an embodiment of the present application, as shown in FIGS. 1A to 3 , the grabbing device further includes a
為了進一步說明本申請實施例的技術效果,以下結合附圖對本申請的一具體實施式說明如下。In order to further illustrate the technical effects of the embodiments of the present application, a specific implementation of the present application will be described below in conjunction with the accompanying drawings.
如圖1至圖4B所示,當製程腔室完成製程時,由於承載裝置201和卡合件相對不發生轉動,由此可通過預設調整兩者的角度,以實現承載裝置201的六個卡針202位置與六個卡合件2位置錯開,例如任意兩相鄰的卡針202及卡合件2與殼體1軸心連線之間的夾角為15度。此時由驅動裝置帶動殼體1移動至製程腔室內,並且使抓取裝置的軸心與製程腔室的軸心重合時,殼體1與卡合件2同時下降,當卡合件2的承載板24上表面下降至距離晶圓100下表面1毫米停止下降。由於承載裝置與晶圓100下表面之間有保護氣體,晶圓100在六個卡針202的範圍內晃動,此時再控制殼體1上升以使承載板24的上表面與晶圓100的下表面接觸,晶圓100停止晃動,卡合件2在環形驅動件31的帶動下旋轉一預設角度,以將晶圓100收攏至殼體1的中心,待夾緊晶圓100後殼體1上升並取出晶圓100。放片時,抓取裝置抓取晶圓100進入製程腔室內並放置於承載裝置201上,六個卡合件2打開以釋放晶圓100,然後抓取裝置上升離開製程腔室。As shown in Figures 1 to 4B, when the process chamber completes the process, since the carrying
基於同一發明構思,本申請實施例提供了一種半導體製程設備,包括:製程腔室、驅動裝置以及如上述各實施例提供的抓取裝置,製程腔室內設有可升降的承載裝置,抓取裝置與驅動裝置相連,用於在驅動裝置的驅動下移動至承載裝置上方以抓取或釋放晶圓。Based on the same inventive concept, an embodiment of the present application provides a semiconductor process equipment, including: a process chamber, a driving device, and a grasping device as provided in the above-mentioned embodiments. A liftable carrying device is provided in the process chamber, and the grasping device Connected with the driving device, it is used to move to the carrier device under the driving device to grab or release the wafer.
可選的,半導體製程設備例如可以為單片清洗設備。Optionally, the semiconductor processing equipment may be, for example, single wafer cleaning equipment.
應用本申請實施例,至少能夠實現如下有益效果:By applying the embodiments of the present application, at least the following beneficial effects can be achieved:
本申請實施例通過殼體上設置有多個沿周向分佈的卡合件,並且通過多個卡合件與晶圓的邊緣配合實現對晶圓的卡合夾緊,再經由驅動裝置實現對晶圓的傳輸。由於多個卡合件沿殼體的周向設置,使得多個卡合件合圍成的圓環可以與殼體同心設置,在實際抓取晶圓的過程中能夠使晶圓與多個卡合件以及殼體之間均同心設置,從而避免晶圓與抓取裝置偏移而造成晶圓抓取失敗,或者抓取成功後由於晶圓偏移而造成晶圓脫落及碎片,從而確保取片的穩定性和成功率,進而提高晶圓傳輸效率及晶圓的良率。In the embodiment of the present application, the housing is provided with a plurality of engaging parts distributed along the circumferential direction, and through the cooperation of the plurality of engaging parts with the edge of the wafer, the clamping and clamping of the wafer is realized, and then the alignment is realized through the driving device. Wafer transfer. Since a plurality of engaging parts are arranged along the circumferential direction of the housing, the ring formed by the plurality of engaging parts can be arranged concentrically with the housing, and the wafer can be connected with multiple cards in the process of actually grabbing the wafer. The assembly and the shell are arranged concentrically, so as to avoid the wafer grabbing failure caused by the offset between the wafer and the grabbing device, or the wafer falling off and fragments due to the wafer offset after the grabbing is successful, so as to ensure the pickup The stability and success rate of wafers can be improved, thereby improving wafer transfer efficiency and wafer yield.
前述內容概括數項實施例之特徵,使得熟習此項技術者可更佳地理解本揭露之態樣。熟習此項技術者應瞭解,其等可容易地使用本揭露作為用於設計或修改用於實行本文仲介紹之實施例之相同目的及/或達成相同優點之其他製程及結構之一基礎。熟習此項技術者亦應瞭解,此等等效構造不背離本揭露之精神及範疇,且其等可在不背離本揭露之精神及範疇之情況下在本文中作出各種改變、置換及更改。The foregoing content summarizes the features of several embodiments, so that those skilled in the art can better understand aspects of the present disclosure. Those skilled in the art should appreciate that they can readily use the present disclosure as a basis for designing or modifying other processes and structures for carrying out the same purposes and/or achieving the same advantages of the embodiments described herein. Those skilled in the art should also understand that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and that they can make various changes, substitutions and alterations herein without departing from the spirit and scope of the present disclosure.
1:殼體 2:卡合件 3:驅動機構 5:連接結構 11:鏤空部 12:第一蓋板 13:第二蓋板 21:轉軸 22:偏心軸 23:夾持柱 24:承載板 31:環形驅動件 32:傳動件 100:晶圓 201:承載裝置 202:卡針 1: Shell 2: Fastening parts 3: Driving mechanism 5: Connection structure 11: Hollow out part 12: The first cover 13:Second cover plate 21: Shaft 22: Eccentric shaft 23: clamping column 24: Loading board 31: ring drive 32: Transmission parts 100: Wafer 201: carrying device 202: stuck needle
當結合附圖閱讀時,從以下詳細描述最佳理解本揭露之態樣。應注意,根據產業中之標準實踐,各種構件未按比例繪製。事實上,為了論述的清楚起見可任意增大或減小各種構件之尺寸。 圖1A為本申請實施例提供的一種抓取裝置的主視示意圖; 圖1B為本申請實施例提供的一種抓取裝置的俯視示意圖; 圖2A為本申請實施例提供的一種卡合件的主視示意圖; 圖2B為本申請實施例提供的一種卡合件的仰視示意圖; 圖3為本申請實施例提供的一種抓取裝置的省略部分的仰視示意圖; 圖4A為本申請實施例提供的一種抓取裝置與承載裝置配合的結構示意圖; 圖4B為本申請實施例提供的一種抓取裝置與承載裝置的卡針配合的結構示意圖。 Aspects of the present disclosure are best understood from the following detailed description when read with the accompanying drawings. It should be noted that, in accordance with the standard practice in the industry, various components are not drawn to scale. In fact, the dimensions of the various components may be arbitrarily increased or decreased for clarity of discussion. FIG. 1A is a schematic front view of a grabbing device provided in an embodiment of the present application; FIG. 1B is a schematic top view of a grabbing device provided in an embodiment of the present application; Fig. 2A is a schematic front view of a fastener provided in an embodiment of the present application; Fig. 2B is a schematic bottom view of a fastener provided in the embodiment of the present application; Fig. 3 is a schematic bottom view of an omitted part of a grabbing device provided by an embodiment of the present application; Fig. 4A is a schematic structural diagram of the cooperation between a grabbing device and a carrying device provided in an embodiment of the present application; Fig. 4B is a schematic diagram of the structure of a pin cooperation between a grabbing device and a carrying device according to an embodiment of the present application.
1:殼體 1: Shell
2:卡合件 2: Fastening parts
5:連接結構 5: Connection structure
12:第一蓋板 12: The first cover
13:第二蓋板 13:Second cover plate
100:晶圓 100: Wafer
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US9147593B2 (en) * | 2012-10-10 | 2015-09-29 | Lam Research Ag | Apparatus for liquid treatment of wafer shaped articles |
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