TW202313871A - Curable composition for inkjet and for partition wall formation, light-emitting device, and method for manufacturing light-emitting device - Google Patents

Curable composition for inkjet and for partition wall formation, light-emitting device, and method for manufacturing light-emitting device Download PDF

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TW202313871A
TW202313871A TW111121366A TW111121366A TW202313871A TW 202313871 A TW202313871 A TW 202313871A TW 111121366 A TW111121366 A TW 111121366A TW 111121366 A TW111121366 A TW 111121366A TW 202313871 A TW202313871 A TW 202313871A
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compound
curable composition
meth
inkjet
light
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田中智也
谷川満
杉沢佳史
藤田悠介
渡邉貴志
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日商積水化學工業股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • C09D11/32Inkjet printing inks characterised by colouring agents
    • C09D11/322Pigment inks
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • C09D11/32Inkjet printing inks characterised by colouring agents
    • C09D11/324Inkjet printing inks characterised by colouring agents containing carbon black
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • C09D11/32Inkjet printing inks characterised by colouring agents
    • C09D11/324Inkjet printing inks characterised by colouring agents containing carbon black
    • C09D11/326Inkjet printing inks characterised by colouring agents containing carbon black characterised by the pigment dispersant
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • C09D11/38Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements

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  • Theoretical Computer Science (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)

Abstract

Provided is a curable composition which is for an inkjet and for partition wall formation, and from which a partition wall having a large aspect ratio and a high infrared light shielding property can be formed. A curable composition for an inkjet and for partition wall formation according to the present invention comprises: a photocurable compound having (meth)acryloyl groups and vinyl groups in a total number of at least two, while not having a cyclic ether group; a thermosetting compound having a cyclic ether group; a photopolymerization initiator; a thermosetting agent; and an infrared shielding agent.

Description

噴墨用及阻隔壁形成用硬化性組合物、發光裝置及發光裝置之製造方法Curable composition for inkjet and barrier rib formation, light-emitting device, and method for producing light-emitting device

本發明係關於一種使用噴墨裝置進行塗佈而使用之噴墨用及阻隔壁形成用硬化性組合物。又,本發明係關於一種使用上述硬化性組合物之發光裝置及發光裝置之製造方法。The present invention relates to a curable composition for inkjet and barrier rib formation which is applied by using an inkjet device. Also, the present invention relates to a light-emitting device using the above-mentioned curable composition and a method for manufacturing the light-emitting device.

近年來,廣泛使用可照射紅外光之發光裝置。作為上述發光裝置,可例舉搭載有人臉認證系統之智慧型手機等。先前之發光裝置具備基板等第1構件、玻璃構件等第2構件、配置於上述第1構件之表面上之可照射紅外光之發光構件、及連接上述第1構件與上述第2構件之塑膠殼體。上述塑膠殼體通常以圍繞發光構件之方式配置,且由不易洩漏紅外光之材料形成(例如下述專利文獻1)。 [先前技術文獻] [專利文獻] In recent years, light-emitting devices capable of irradiating infrared light have been widely used. As said light emitting device, the smart phone etc. which mount the face authentication system are mentioned, for example. A conventional light-emitting device includes a first member such as a substrate, a second member such as a glass member, a light-emitting member capable of irradiating infrared light arranged on the surface of the first member, and a plastic case connecting the first member and the second member. body. The above-mentioned plastic casing is usually arranged to surround the light-emitting component, and is formed of a material that does not easily leak infrared light (for example, the following patent document 1). [Prior Art Literature] [Patent Document]

[專利文獻1]WO2015/025593A1[Patent Document 1] WO2015/025593A1

[發明所欲解決之問題][Problem to be solved by the invention]

近年來,發光裝置之小型化不斷發展。然而,使用塑膠殼體之先前之發光裝置不易充分減小發光構件與塑膠殼體之間之距離,因此,該發光裝置之小型化有限。In recent years, the miniaturization of light emitting devices has been continuously developed. However, it is not easy to sufficiently reduce the distance between the light-emitting member and the plastic case in the previous light-emitting device using a plastic case, and thus, the miniaturization of the light-emitting device is limited.

為了達成發光裝置之小型化,考慮使用噴墨裝置,以圍繞發光構件之方式框狀地塗佈硬化性組合物,使所塗佈之硬化性組合物硬化而形成阻隔壁,藉此製造發光裝置。於該情形時,關於上述硬化性組合物之性能,需要可形成縱橫比(高度/寬度)較大且紅外光遮蔽性較高之阻隔壁之性能。In order to achieve miniaturization of the light-emitting device, it is conceivable to use an inkjet device to apply a curable composition in a frame shape around the light-emitting member, and to cure the applied curable composition to form a barrier wall, thereby manufacturing a light-emitting device. . In this case, regarding the performance of the above-mentioned curable composition, performance that can form a barrier rib having a large aspect ratio (height/width) and high infrared light shielding property is required.

然而,先前之噴墨用硬化性組合物不易形成縱橫比較大之阻隔壁。又,先前之噴墨用硬化性組合物不易提高阻隔壁之紅外光遮蔽性。However, conventional inkjet curable compositions are not easy to form barrier ribs with a large aspect ratio. Moreover, the conventional curable composition for inkjet was difficult to improve the infrared light shielding property of a barrier rib.

本發明之目的在於提供一種可形成縱橫比較大且紅外光遮蔽性較高之阻隔壁之噴墨用及阻隔壁形成用硬化性組合物。又,本發明之目的亦在於提供一種使用上述硬化性組合物之發光裝置及發光裝置之製造方法。 [解決問題之技術手段] An object of the present invention is to provide a curable composition for inkjet and barrier rib formation capable of forming barrier ribs with a large aspect ratio and high infrared light shielding property. In addition, the object of the present invention is to provide a light-emitting device using the above-mentioned curable composition and a method for manufacturing the light-emitting device. [Technical means to solve the problem]

根據本發明之廣泛態樣,提供一種噴墨用及阻隔壁形成用硬化性組合物(以下,有時簡稱為「硬化性組合物」),其包含:合計具有2個以上(甲基)丙烯醯基及乙烯基且不具有環狀醚基之光硬化性化合物、具有環狀醚基之熱硬化性化合物、光聚合起始劑、熱硬化劑及紅外光遮蔽劑。According to a broad aspect of the present invention, there is provided a curable composition for inkjet and barrier rib formation (hereinafter, sometimes simply referred to as "curable composition"), which comprises: a total of two or more (meth)acrylic Photocurable compounds with acyl and vinyl groups without cyclic ether groups, thermosetting compounds with cyclic ether groups, photopolymerization initiators, thermosetting agents, and infrared light shielding agents.

於本發明之硬化性組合物之某特定態樣中,上述紅外光遮蔽劑包含碳黑、具有酞菁骨架之金屬錯合物或具有萘酞菁骨架之金屬錯合物。In a specific aspect of the curable composition of the present invention, the infrared light shielding agent includes carbon black, a metal complex having a phthalocyanine skeleton, or a metal complex having a naphthalocyanine skeleton.

於本發明之硬化性組合物之某特定態樣中,上述具有酞菁骨架之金屬錯合物中之金屬錯合物為釩錯合物或銅錯合物,且上述具有萘酞菁骨架之金屬錯合物中之金屬錯合物為釩錯合物或銅錯合物。In a specific aspect of the curable composition of the present invention, the metal complex of the above-mentioned metal complexes having a phthalocyanine skeleton is a vanadium complex or a copper complex, and the above-mentioned metal complexes having a naphthalocyanine skeleton Metal complexes in metal complexes are vanadium complexes or copper complexes.

於本發明之硬化性組合物之某特定態樣中,上述碳黑之平均一次粒徑為20 nm以上100 nm以下。In a specific aspect of the curable composition of the present invention, the carbon black has an average primary particle diameter of not less than 20 nm and not more than 100 nm.

於本發明之硬化性組合物之某特定態樣中,上述熱硬化性化合物包含具有2個以上環狀醚基之熱硬化性化合物。In a specific aspect of the curable composition of the present invention, the thermosetting compound includes a thermosetting compound having two or more cyclic ether groups.

於本發明之硬化性組合物之某特定態樣中,上述光硬化性化合物包含具有二環戊二烯骨架之光硬化性化合物。In a specific aspect of the curable composition of the present invention, the photocurable compound includes a photocurable compound having a dicyclopentadiene skeleton.

於本發明之硬化性組合物之某特定態樣中,上述熱硬化性化合物包含具有(甲基)丙烯醯基之光及熱硬化性化合物。In a specific aspect of the curable composition of the present invention, the thermosetting compound includes a light and thermosetting compound having a (meth)acryl group.

於本發明之硬化性組合物之某特定態樣中,上述光硬化性化合物包含合計具有3個以上(甲基)丙烯醯基及乙烯基之光硬化性化合物。In a specific aspect of the curable composition of the present invention, the photocurable compound includes a photocurable compound having a total of three or more (meth)acryl groups and vinyl groups.

於本發明之硬化性組合物之某特定態樣中,上述光硬化性化合物之含量為10重量%以上75重量%以下。In a specific aspect of the curable composition of the present invention, the content of the above-mentioned photocurable compound is not less than 10% by weight and not more than 75% by weight.

於本發明之硬化性組合物之某特定態樣中,上述熱硬化劑包含芳香族胺化合物。In a specific aspect of the curable composition of the present invention, the thermosetting agent includes an aromatic amine compound.

於本發明之硬化性組合物之某特定態樣中,上述芳香族胺化合物包含1,3-雙(3-胺基苯氧基)苯或雙[4-(3-胺基苯氧基)苯基]碸。In a specific aspect of the curable composition of the present invention, the aromatic amine compound includes 1,3-bis(3-aminophenoxy)benzene or bis[4-(3-aminophenoxy) Phenyl] Phenyl.

於本發明之硬化性組合物之某特定態樣中,上述硬化性組合物進而包含分散劑。In a specific aspect of the curable composition of the present invention, the curable composition further includes a dispersant.

於本發明之硬化性組合物之某特定態樣中,上述分散劑之酸值為10 mgKOH/g以上100 mgKOH/g以下,且上述分散劑之胺值為10 mgKOH/g以上100 mgKOH/g以下。In a specific aspect of the curable composition of the present invention, the acid value of the above-mentioned dispersant is not less than 10 mgKOH/g and not more than 100 mgKOH/g, and the amine value of the above-mentioned dispersant is not less than 10 mgKOH/g and not more than 100 mgKOH/g the following.

根據本發明之廣泛態樣,提供一種發光裝置,其具備第1構件、配置於上述第1構件之第1表面上之發光構件、及配置於上述第1構件之上述第1表面上之阻隔壁,且上述阻隔壁為上述噴墨用及阻隔壁形成用硬化性組合物之硬化物。According to a broad aspect of the present invention, there is provided a light-emitting device comprising a first member, a light-emitting member disposed on a first surface of the first member, and a barrier rib disposed on the first surface of the first member. , and the barrier rib is a cured product of the curable composition for inkjet and barrier rib formation.

於本發明之發光裝置之某特定態樣中,上述發光裝置具備第2構件,上述發光構件為可照射紅外光之發光構件,上述阻隔壁以圍繞上述發光構件之方式配置於上述第1構件之上述第1表面上,且上述阻隔壁將上述第1構件與上述第2構件接著。In a specific aspect of the light-emitting device of the present invention, the light-emitting device includes a second member, the light-emitting member is a light-emitting member capable of irradiating infrared light, and the barrier wall is disposed on the first member so as to surround the light-emitting member. on the first surface, and the barrier wall connects the first member and the second member.

根據本發明之廣泛態樣,提供一種發光裝置之製造方法,其包括如下步驟:塗佈步驟,其係使用噴墨裝置,將上述噴墨用及阻隔壁形成用硬化性組合物塗佈於配置有發光構件之第1構件之第1表面上,形成硬化性組合物層;及光硬化步驟,其係藉由光照射使上述硬化性組合物層進行硬化,形成B階段化物層。According to a broad aspect of the present invention, there is provided a method of manufacturing a light-emitting device, which includes the following steps: a coating step, which is to use an inkjet device to apply the above-mentioned curable composition for inkjet and barrier rib formation to a configuration Forming a curable composition layer on the first surface of the first member having the light-emitting member; and a photocuring step of curing the curable composition layer by light irradiation to form a B-staged compound layer.

於本發明之發光裝置之製造方法之某特定態樣中,上述發光裝置之製造方法包括如下步驟:配置步驟,其係於上述B階段化物層之與上述第1構件側相反之表面上配置第2構件;及熱硬化步驟,其係藉由加熱而使上述B階段化物層熱硬化,且於上述配置步驟中,於以圍繞上述發光構件之方式配置之上述B階段化物層之表面上配置上述第2構件。 [發明之效果] In a specific aspect of the method for manufacturing a light-emitting device of the present invention, the method for manufacturing a light-emitting device includes the following steps: an arranging step of arranging a second layer on the surface of the B-stage compound layer opposite to the first member 2 members; and a thermosetting step of thermally curing the B-stage compound layer by heating, and in the arranging step, arranging the above-mentioned 2nd member. [Effect of Invention]

本發明之噴墨用及阻隔壁形成用硬化性組合物包含:合計具有2個以上(甲基)丙烯醯基及乙烯基且不具有環狀醚基之光硬化性化合物、具有環狀醚基之熱硬化性化合物、光聚合起始劑、熱硬化劑及紅外光遮蔽劑。於本發明之噴墨用及阻隔壁形成用硬化性組合物中,由於具備上述構成,故而可形成縱橫比較大且紅外光遮蔽性較高之阻隔壁。The curable composition for inkjet and barrier rib formation of the present invention includes: a photocurable compound having a total of two or more (meth)acryl groups and vinyl groups and not having a cyclic ether group; Thermosetting compound, photopolymerization initiator, thermosetting agent and infrared light shielding agent. In the curable composition for inkjet and barrier rib formation of the present invention, since it has the above-mentioned constitution, it is possible to form a barrier rib having a large aspect ratio and high infrared light shielding property.

以下,對本發明進行詳細說明。Hereinafter, the present invention will be described in detail.

(噴墨用及阻隔壁形成用硬化性組合物) 本發明之噴墨用及阻隔壁形成用硬化性組合物(以下,有時簡稱為「硬化性組合物」)係使用噴墨裝置進行塗佈而使用(硬化性組合物之使用噴墨裝置之塗佈及用以形成阻隔壁之用途)。本發明之硬化性組合物與藉由網版印刷進行塗佈之硬化性組合物不同,且與藉由分注器進行塗佈之硬化性組合物不同。 (Curable composition for inkjet and barrier rib formation) The curable composition for inkjet and barrier rib formation of the present invention (hereinafter, sometimes simply referred to as "curable composition") is applied by using an inkjet device (use of the curable composition using an inkjet device) Coating and use to form barrier walls). The curable composition of the present invention differs from a curable composition applied by screen printing, and from a curable composition applied by a dispenser.

本發明之硬化性組合物包含:合計具有2個以上(甲基)丙烯醯基及乙烯基且不具有環狀醚基之光硬化性化合物、具有環狀醚基之熱硬化性化合物、光聚合起始劑、熱硬化劑及紅外光遮蔽劑。The curable composition of the present invention includes: a photocurable compound having a total of two or more (meth)acryl groups and vinyl groups and not having a cyclic ether group, a thermosetting compound having a cyclic ether group, a photopolymerizable Initiator, thermosetting agent and infrared light shielding agent.

於本說明書中,有時將上述「合計具有2個以上(甲基)丙烯醯基及乙烯基且不具有環狀醚基之光硬化性化合物」稱為「(A)光硬化性化合物」。In this specification, the said "photocurable compound which has a total of 2 or more (meth)acryloyl groups and vinyl groups and does not have a cyclic ether group" may be called "(A) photocurable compound".

於本說明書中,有時將上述「具有環狀醚基之熱硬化性化合物」稱為「(B)熱硬化性化合物」。In this specification, the above-mentioned "thermosetting compound having a cyclic ether group" may be referred to as "(B) thermosetting compound".

因此,本發明之硬化性組合物包含(A)光硬化性化合物、(B)熱硬化性化合物、光聚合起始劑、熱硬化劑及紅外光遮蔽劑。Therefore, the curable composition of the present invention includes (A) a photocurable compound, (B) a thermosetting compound, a photopolymerization initiator, a thermosetting agent, and an infrared light shielding agent.

於本發明之硬化性組合物中,由於具備上述構成,故而可形成縱橫比較大且紅外光遮蔽性較高之阻隔壁。本發明之硬化性組合物可形成具有發光裝置所需之縱橫比(高度/寬度)之阻隔壁。又,於發光裝置中,若由發光構件所照射之紅外光洩漏至非預期區域,則發光裝置之性能下降。本發明之硬化性組合物可形成紅外光遮蔽性較高之阻隔壁,故而由發光構件所照射之紅外光不易洩漏至非預期部位。In the curable composition of this invention, since it has the said structure, the barrier rib with a large aspect ratio and high infrared light shielding property can be formed. The curable composition of the present invention can form a barrier rib having an aspect ratio (height/width) required for a light-emitting device. Also, in the light emitting device, if the infrared light irradiated by the light emitting member leaks to an unintended area, the performance of the light emitting device will be degraded. The curable composition of the present invention can form a barrier wall with high shielding property for infrared light, so that the infrared light irradiated by the light-emitting member is difficult to leak to unintended places.

又,關於本發明之硬化性組合物,可使用噴墨裝置以較高之精度將硬化性組合物塗佈於發光構件附近,故而可使發光裝置小型化。In addition, the curable composition of the present invention can be applied to the vicinity of the light-emitting member with high precision using an inkjet device, so that the light-emitting device can be miniaturized.

又,於本發明之硬化性組合物中,由於具備上述構成,故而可提高接著對象構件與阻隔壁之接著強度。Moreover, in the curable composition of this invention, since it has the said structure, the bonding strength of a member to be bonded and a barrier rib can be improved.

上述硬化性組合物包含(A)光硬化性化合物及(B)熱硬化性化合物,故而為光及熱硬化性組合物。上述硬化性組合物較佳為藉由光照射進行硬化後再藉由加熱進行硬化而使用。The above-mentioned curable composition contains (A) a photocurable compound and (B) a thermosetting compound, so it is a photo and thermosetting composition. The above-mentioned curable composition is preferably used after hardening by light irradiation and then hardening by heating.

以下,對上述硬化性組合物中所包含之各成分之詳細情況進行說明。再者,於本說明書中,「(甲基)丙烯醯基」意指「丙烯醯基」及「甲基丙烯醯基」之一者或兩者,「(甲基)丙烯酸酯」意指「丙烯酸酯」及「甲基丙烯酸酯」之一者或兩者。又,於本說明書中,(甲基)丙烯醯基所具有之CH 2=C(H或CH 3)基不包含於上述乙烯基中。 Hereinafter, the details of each component contained in the said curable composition are demonstrated. Furthermore, in this specification, "(meth)acryl" means either or both of "acryl" and "methacryl", and "(meth)acrylate" means " One or both of "acrylate" and "methacrylate". In addition, in this specification, the CH2 =C(H or CH3 ) group which a (meth)acryloyl group has is not included in the above-mentioned vinyl group.

<(A)光硬化性化合物> 上述硬化性組合物包含(A)光硬化性化合物。(A)光硬化性化合物為合計具有2個以上(甲基)丙烯醯基及乙烯基且不具有環狀醚基之光硬化性化合物。(A)光硬化性化合物可具有(甲基)丙烯醯基,亦可具有乙烯基,還可具有(甲基)丙烯醯基與乙烯基兩者。(A)光硬化性化合物具有(甲基)丙烯醯基或乙烯基。於該情形時,(A)光硬化性化合物具有(甲基)丙烯醯基及乙烯基中之至少一種基。(A)光硬化性化合物可具有(甲基)丙烯醯基及乙烯基。(A)光硬化性化合物可具有(甲基)丙烯醯基,亦可具有乙烯基。(甲基)丙烯醯基及乙烯基為光硬化性官能基。(A)光硬化性化合物例如不具有環氧基(環狀醚基)。(A)光硬化性化合物可僅使用1種,亦可併用2種以上。 <(A) Photocurable compound> The said curable composition contains (A) photocurable compound. (A) The photocurable compound is a photocurable compound which has a total of two or more (meth)acryl groups and vinyl groups and does not have a cyclic ether group. (A) The photocurable compound may have a (meth)acryl group, may have a vinyl group, and may have both a (meth)acryl group and a vinyl group. (A) The photocurable compound has a (meth)acryl group or a vinyl group. In this case, (A) photocurable compound has at least 1 sort(s) of a (meth)acryl group and a vinyl group. (A) The photocurable compound may have a (meth)acryl group and a vinyl group. (A) The photocurable compound may have a (meth)acryl group, and may have a vinyl group. The (meth)acryl group and the vinyl group are photocurable functional groups. (A) The photocurable compound does not have an epoxy group (cyclic ether group), for example. (A) The photocurable compound may use only 1 type, and may use 2 or more types together.

(A)光硬化性化合物合計具有2個以上(甲基)丙烯醯基及乙烯基。於硬化性組合物包含紅外光遮蔽劑之情形時,一般而言該硬化性組合物之光反應性(光硬化性)容易下降,但於本發明中,由於使用光硬化性官能基個數較多之(A)光硬化性化合物,故而對光照射起反應之點之數量增多。結果,於本發明中,可藉由光照射而使上述硬化性組合物之硬化良好地進行。又,於本發明中,藉由使用光硬化性官能基數較多之(A)光硬化性化合物,可藉由光照射使上述硬化性組合物之硬化良好地進行,且可提高於光硬化後之交聯狀態下形成三維結構之比率。結果,於本發明中,在硬化性組合物包含紅外光遮蔽劑之情形時,亦可形成縱橫比較大之阻隔壁。(A) The photocurable compound has two or more (meth)acryl groups and vinyl groups in total. In the case where the curable composition contains an infrared light shielding agent, generally speaking, the photoreactivity (photocurability) of the curable composition tends to decrease, but in the present invention, since the number of photocurable functional groups used is relatively small The more (A) photohardenable compound, the number of points that respond to light irradiation increases. As a result, in this invention, hardening of the said curable composition can be made to advance favorably by light irradiation. Also, in the present invention, by using (A) a photocurable compound having a large number of photocurable functional groups, the curing of the above-mentioned curable composition can be carried out well by light irradiation, and it can be improved after photocuring. The ratio of forming a three-dimensional structure in the cross-linked state. As a result, in the present invention, even when the curable composition contains an infrared light shielding agent, a barrier rib having a large aspect ratio can be formed.

(A)光硬化性化合物較佳為包含合計具有3個以上(甲基)丙烯醯基及乙烯基之光硬化性化合物,更佳為包含合計具有4個以上(甲基)丙烯醯基及乙烯基之光硬化性化合物。(A)光硬化性化合物進而較佳為包含合計具有5個以上(甲基)丙烯醯基及乙烯基之光硬化性化合物,特佳為包含合計具有6個以上(甲基)丙烯醯基及乙烯基之光硬化性化合物。於該情形時,可進一步提高光硬化性,可形成縱橫比更大之阻隔壁。(A)光硬化性化合物之(甲基)丙烯醯基及乙烯基之合計數可為100個以下,亦可為50個以下,還可為10個以下。(A) The photocurable compound preferably contains a photocurable compound having a total of 3 or more (meth)acryl groups and vinyl groups, and more preferably contains a total of 4 or more (meth)acryl groups and vinyl groups. Based photohardening compound. (A) The photocurable compound further preferably contains a photocurable compound having a total of 5 or more (meth)acryl groups and vinyl groups, and particularly preferably contains a total of 6 or more (meth)acryl groups and Photohardening compound for vinyl. In this case, photocurability can be further improved, and the barrier rib with a larger aspect ratio can be formed. (A) The total number of (meth)acryl groups and vinyl groups in the photocurable compound may be 100 or less, 50 or less, or 10 or less.

(A)光硬化性化合物較佳為包含合計具有2個(甲基)丙烯醯基及乙烯基之光硬化性化合物、及合計具有3個以上(甲基)丙烯醯基及乙烯基之光硬化性化合物。(A)光硬化性化合物更佳為包含合計具有2個(甲基)丙烯醯基及乙烯基之光硬化性化合物、及合計具有4個以上(甲基)丙烯醯基及乙烯基之光硬化性化合物。(A)光硬化性化合物進而較佳為包含合計具有2個(甲基)丙烯醯基及乙烯基之光硬化性化合物、及合計具有5個以上(甲基)丙烯醯基及乙烯基之光硬化性化合物。(A)光硬化性化合物特佳為包含合計具有2個(甲基)丙烯醯基及乙烯基之光硬化性化合物、及合計具有6個以上(甲基)丙烯醯基及乙烯基之光硬化性化合物。於該情形時,可進一步提高光硬化性,可形成縱橫比更大之阻隔壁。(A) The photocurable compound preferably includes a photocurable compound having a total of two (meth)acryl groups and vinyl groups, and a photocurable compound having a total of three or more (meth)acryl groups and vinyl groups Sexual compounds. (A) The photocurable compound is more preferably a photocurable compound having a total of two (meth)acryl groups and vinyl groups, and a photocurable compound having a total of four or more (meth)acryl groups and vinyl groups Sexual compounds. (A) The photocurable compound further preferably includes a photocurable compound having a total of two (meth)acryl groups and vinyl groups, and a photocurable compound having a total of five or more (meth)acryl groups and vinyl groups. hardening compound. (A) The photocurable compound preferably includes a photocurable compound having a total of 2 (meth)acryl groups and vinyl groups, and a photocurable compound having a total of 6 or more (meth)acryl groups and vinyl groups. Sexual compounds. In this case, photocurability can be further improved, and the barrier rib with a larger aspect ratio can be formed.

就高精度地形成硬化性組合物層之觀點及進一步提高光硬化性、形成縱橫比更大之阻隔壁之觀點而言,(A)光硬化性化合物較佳為具有(甲基)丙烯醯基,較佳為具有2個以上(甲基)丙烯醯基。(A)光硬化性化合物較佳為(甲基)丙烯酸酯化合物,更佳為多官能(甲基)丙烯酸酯化合物。(A) The photocurable compound preferably has a (meth)acryl group from the viewpoint of forming a curable composition layer with high precision and further improving photocurability and forming barrier ribs with a larger aspect ratio. , preferably having two or more (meth)acryloyl groups. (A) The photocurable compound is preferably a (meth)acrylate compound, more preferably a polyfunctional (meth)acrylate compound.

(A)光硬化性化合物可包含二官能(甲基)丙烯酸酯化合物,亦可包含三官能(甲基)丙烯酸酯化合物,亦可包含四官能(甲基)丙烯酸酯化合物,亦可包含五官能(甲基)丙烯酸酯化合物,亦可包含六官能(甲基)丙烯酸酯化合物。(A)光硬化性化合物可包含七官能以上之(甲基)丙烯酸酯化合物。例如,二官能(甲基)丙烯酸酯化合物中之「二官能」表示(甲基)丙烯醯基為2個。(A) The photocurable compound may contain difunctional (meth)acrylate compounds, trifunctional (meth)acrylate compounds, tetrafunctional (meth)acrylate compounds, or pentafunctional The (meth)acrylate compound may also include a hexafunctional (meth)acrylate compound. (A) The photocurable compound may contain a (meth)acrylate compound having more than seven functions. For example, "difunctional" in a difunctional (meth)acrylate compound means that there are two (meth)acryl groups.

(A)光硬化性化合物較佳為包含二官能(甲基)丙烯酸酯化合物,更佳為包含三官能以上之(甲基)丙烯酸酯化合物,進而較佳為包含四官能以上之(甲基)丙烯酸酯化合物。(A)光硬化性化合物進而較佳為包含五官能以上之(甲基)丙烯酸酯化合物,特佳為包含六官能以上之(甲基)丙烯酸酯化合物。於該情形時,可進一步提高光硬化性,可形成縱橫比更大之阻隔壁。又,可更高精度地形成硬化性組合物層。(A) The photocurable compound preferably contains a difunctional (meth)acrylate compound, more preferably contains a trifunctional or higher (meth)acrylate compound, and further preferably contains a tetrafunctional or higher (meth)acrylate compound. Acrylate compound. (A) The photocurable compound is more preferably a (meth)acrylate compound containing five or more functions, particularly preferably a (meth)acrylate compound containing six or more functions. In this case, photocurability can be further improved, and the barrier rib with a larger aspect ratio can be formed. Also, a curable composition layer can be formed with higher precision.

作為上述二官能(甲基)丙烯酸酯化合物,例如可例舉:乙氧化雙酚A二(甲基)丙烯酸酯、三環癸烷二甲醇二(甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、1,9-壬烷二(甲基)丙烯酸酯、1,10-癸二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、2,4-二甲基-1,5-戊二醇二(甲基)丙烯酸酯、丁基乙基丙二醇二(甲基)丙烯酸酯、乙氧化環己烷甲醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、低聚乙二醇二(甲基)丙烯酸酯、乙二醇二(甲基)丙烯酸酯、2-乙基-2-丁基丁二醇二(甲基)丙烯酸酯、2-乙基-2-丁基丙二醇二(甲基)丙烯酸酯、三環癸烷二(甲基)丙烯酸酯及二丙二醇二(甲基)丙烯酸酯等。Examples of the difunctional (meth)acrylate compound include: ethoxylated bisphenol A di(meth)acrylate, tricyclodecane dimethanol di(meth)acrylate, 1,4-butanedimethacrylate Alcohol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, 1,9-nonane di(meth)acrylate, 1,10-decanediol di(meth)acrylate Acrylates, Neopentyl glycol di(meth)acrylate, 2,4-Dimethyl-1,5-pentanediol di(meth)acrylate, Butylethylpropylene glycol di(meth)acrylate , Ethoxylated cyclohexanemethanol di(meth)acrylate, polyethylene glycol di(meth)acrylate, oligoethylene glycol di(meth)acrylate, ethylene glycol di(meth)acrylate , 2-ethyl-2-butylbutanediol di(meth)acrylate, 2-ethyl-2-butylpropanediol di(meth)acrylate, tricyclodecane di(meth)acrylate And dipropylene glycol di(meth)acrylate, etc.

作為上述三官能(甲基)丙烯酸酯化合物,例如可例舉:甘油丙氧基三(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、三羥甲基乙烷三(甲基)丙烯酸酯、三羥甲基丙烷之環氧烷改性三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、二季戊四醇三(甲基)丙烯酸酯、三羥甲基丙烷三((甲基)丙烯醯氧基丙基)醚、異三聚氰酸環氧烷改性三(甲基)丙烯酸酯、丙酸二季戊四醇三(甲基)丙烯酸酯、異氰尿酸三((甲基)丙烯醯氧基乙基)酯及山梨醇三(甲基)丙烯酸酯等。As the above-mentioned trifunctional (meth)acrylate compound, for example, glycerol propoxy tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, trimethylolethane tri( Meth)acrylate, alkylene oxide modified tri(meth)acrylate of trimethylolpropane, pentaerythritol tri(meth)acrylate, dipentaerythritol tri(meth)acrylate, trimethylolpropane tri(meth)acrylate ((meth)acryloxypropyl)ether, isocyanuric acid alkylene oxide modified tri(meth)acrylate, dipentaerythritol propionate tri(meth)acrylate, isocyanuric acid tri(( Meth)acryloxyethyl) ester, sorbitol tri(meth)acrylate, etc.

作為上述四官能(甲基)丙烯酸酯化合物,例如可例舉:季戊四醇四(甲基)丙烯酸酯、山梨醇四(甲基)丙烯酸酯、二-三羥甲基丙烷四(甲基)丙烯酸酯及丙酸二季戊四醇四(甲基)丙烯酸酯等。Examples of the tetrafunctional (meth)acrylate compound include: pentaerythritol tetra(meth)acrylate, sorbitol tetra(meth)acrylate, di-trimethylolpropane tetra(meth)acrylate And dipentaerythritol propionate tetra(meth)acrylate, etc.

作為上述五官能(甲基)丙烯酸酯化合物,例如可例舉:山梨醇五(甲基)丙烯酸酯及二季戊四醇五(甲基)丙烯酸酯。As said pentafunctional (meth)acrylate compound, a sorbitol penta (meth)acrylate and a dipentaerythritol penta (meth)acrylate are mentioned, for example.

作為上述六官能(甲基)丙烯酸酯化合物,例如可例舉:二季戊四醇六(甲基)丙烯酸酯、山梨醇六(甲基)丙烯酸酯及膦腈之環氧烷改性六(甲基)丙烯酸酯等。Examples of the hexafunctional (meth)acrylate compound include: dipentaerythritol hexa(meth)acrylate, sorbitol hexa(meth)acrylate, and alkylene oxide-modified hexa(meth)acrylate of phosphazene. Acrylic etc.

作為具有乙烯基之(A)光硬化性化合物,可例舉:乙烯醚類、乙烯衍生物及二環戊二烯等。As (A) photocurable compound which has a vinyl group, vinyl ethers, a vinyl derivative, dicyclopentadiene, etc. are mentioned.

(A)光硬化性化合物較佳為包含具有多元醇骨架之光硬化性化合物,更佳為包含具有多元醇骨架之(甲基)丙烯酸酯化合物。於該情形時,可進一步提高接著對象構件(第1構件及第2構件)與阻隔壁之接著強度。(A) The photocurable compound preferably contains a photocurable compound having a polyol skeleton, and more preferably contains a (meth)acrylate compound having a polyol skeleton. In this case, the bonding strength between the members to be bonded (the first member and the second member) and the barrier rib can be further increased.

上述具有多元醇骨架之(甲基)丙烯酸酯化合物所具有之(甲基)丙烯醯基數(官能數)可為2個,亦可為2個以上,亦可為3個以上,亦可為4個以上,亦可為5個以上,亦可為6個以上。上述具有多元醇骨架之(甲基)丙烯酸酯化合物所具有之(甲基)丙烯醯基數可為100個以下,亦可為50個以下,還可為10個以下。The (meth)acryl group (functional number) of the above-mentioned (meth)acrylate compound having a polyol skeleton may be 2, may be 2 or more, may be 3 or more, or may be 4 More than one, may be more than five, may be more than six. The number of (meth)acryl groups contained in the (meth)acrylate compound having a polyol skeleton may be 100 or less, 50 or less, or 10 or less.

(A)光硬化性化合物較佳為包含具有二環戊二烯骨架之光硬化性化合物,更佳為包含具有二環戊二烯骨架之(甲基)丙烯酸酯化合物。於該情形時,由於藉由使二環戊二烯骨架為剛性骨架而降低硬化性組合物之硬化收縮,故而可進一步提高接著對象構件(第1構件及第2構件)與阻隔壁之接著強度。(A) The photocurable compound preferably contains a photocurable compound having a dicyclopentadiene skeleton, and more preferably contains a (meth)acrylate compound having a dicyclopentadiene skeleton. In this case, since the hardening shrinkage of the curable composition is reduced by making the dicyclopentadiene skeleton a rigid skeleton, the bonding strength between the members to be bonded (the first member and the second member) and the barrier rib can be further improved .

上述具有二環戊二烯骨架之(甲基)丙烯酸酯化合物所具有之(甲基)丙烯醯基數(官能數)可為2個,亦可為2個以上,亦可為3個以上,亦可為4個以上,亦可為5個以上,亦可為6個以上。上述具有二環戊二烯骨架之(甲基)丙烯酸酯化合物所具有之(甲基)丙烯醯基數可為100個以下,亦可為50個以下,還可為10個以下。The (meth)acryl group (functional number) of the above-mentioned (meth)acrylate compound having a dicyclopentadiene skeleton may be 2, or 2 or more, or 3 or more, or Four or more, five or more, or six or more may be used. The number of (meth)acryl groups contained in the (meth)acrylate compound having a dicyclopentadiene skeleton may be 100 or less, 50 or less, or 10 or less.

上述硬化性組合物100重量%中,(A)光硬化性化合物之含量較佳為10重量%以上,更佳為15重量%以上,進而較佳為20重量%以上,且較佳為75重量%以下,更佳為70重量%以下,進而較佳為65重量%以下。若(A)光硬化性化合物之含量為上述下限以上及上述上限以下,則可進一步提高光硬化性,可形成縱橫比更大之阻隔壁。又,若(A)光硬化性化合物之含量為上述上限以下,則可進一步提高接著對象構件(第1構件及第2構件)與阻隔壁之接著強度。In 100% by weight of the above-mentioned curable composition, the content of (A) photocurable compound is preferably at least 10% by weight, more preferably at least 15% by weight, further preferably at least 20% by weight, and more preferably at least 75% by weight % or less, more preferably 70% by weight or less, further preferably 65% by weight or less. Photocurability can be further improved as content of (A) photocurable compound is more than the said minimum and below the said upper limit, and the barrier rib with a larger aspect ratio can be formed. Moreover, if content of (A) photocurable compound is below the said upper limit, the adhesive strength of a bonding object member (1st member and 2nd member) and a barrier rib can be improved further.

上述硬化性組合物100重量%中,上述具有多元醇骨架之光硬化性化合物之含量較佳為10重量%以上,更佳為15重量%以上,進而較佳為20重量%以上,且較佳為75重量%以下,更佳為70重量%以下,進而較佳為65重量%以下。若上述具有多元醇骨架之光硬化性化合物之含量為上述下限以上及上述上限以下,則可進一步提高光硬化性,可形成縱橫比更大之阻隔壁。又,若上述具有多元醇骨架之光硬化性化合物之含量為上述下限以上及上述上限以下,則可進一步提高接著對象構件(第1構件及第2構件)與阻隔壁之接著強度。In 100% by weight of the curable composition, the content of the photocurable compound having a polyol skeleton is preferably at least 10% by weight, more preferably at least 15% by weight, further preferably at least 20% by weight, and more preferably It is 75 weight% or less, More preferably, it is 70 weight% or less, More preferably, it is 65 weight% or less. When content of the photocurable compound which has the said polyol skeleton is more than the said minimum and below the said upper limit, photocurability can be improved further, and the barrier rib with a larger aspect ratio can be formed. Moreover, when content of the photocurable compound which has the said polyol skeleton is more than the said minimum and below the said upper limit, the bonding strength of the member to be bonded (1st member and 2nd member) and a barrier rib can be further improved.

(A)光硬化性化合物100重量%中,上述具有多元醇骨架之光硬化性化合物之含量較佳為10重量%以上,更佳為20重量%以上,且較佳為90重量%以下,更佳為80重量%以下。若上述具有多元醇骨架之光硬化性化合物之含量為上述下限以上及上述上限以下,則可進一步提高光硬化性,可形成縱橫比更大之阻隔壁。又,若上述具有多元醇骨架之光硬化性化合物之含量為上述下限以上,則可進一步提高接著對象構件(第1構件及第2構件)與阻隔壁之接著強度。(A) In 100% by weight of the photocurable compound, the content of the photocurable compound having a polyol skeleton is preferably at least 10% by weight, more preferably at least 20% by weight, and more preferably at most 90% by weight, and more preferably at least 90% by weight. Preferably, it is at most 80% by weight. When content of the photocurable compound which has the said polyol skeleton is more than the said minimum and below the said upper limit, photocurability can be improved further, and the barrier rib with a larger aspect ratio can be formed. Moreover, when content of the photocurable compound which has the said polyol skeleton is more than the said minimum, the adhesive strength of the member to be bonded (1st member and 2nd member) and a barrier rib can be improved further.

上述硬化性組合物100重量%中,除上述具有多元醇骨架之光硬化性化合物以外之(A)光硬化性化合物之含量較佳為10重量%以上,更佳為20重量%以上,進而較佳為30重量%以上,且較佳為65重量%以下,更佳為60重量%以下,進而較佳為55重量%以下。若除上述具有多元醇骨架之光硬化性化合物以外之(A)光硬化性化合物之含量為上述下限以上,則可進一步提高光硬化性,可形成縱橫比更大之阻隔壁。又,若除上述具有多元醇骨架之光硬化性化合物以外之(A)光硬化性化合物之含量為上述上限以下,則可進一步提高接著對象構件(第1構件及第2構件)與阻隔壁之接著強度。In 100% by weight of the above-mentioned curable composition, the content of (A) photocurable compound other than the above-mentioned photocurable compound having a polyol skeleton is preferably at least 10% by weight, more preferably at least 20% by weight, and even more preferably It is preferably at least 30% by weight, and is preferably at most 65% by weight, more preferably at most 60% by weight, and still more preferably at most 55% by weight. When content of (A) photocurable compound other than the photocurable compound which has the said polyol skeleton is more than the said minimum, photocurability can be improved further, and the barrier rib with a larger aspect ratio can be formed. Also, if the content of the (A) photocurable compound other than the above photocurable compound having a polyol skeleton is below the above upper limit, the bond between the member to be bonded (the first member and the second member) and the barrier rib can be further increased. Then intensity.

上述硬化性組合物100重量%中,上述具有二環戊二烯骨架之光硬化性化合物之含量較佳為5重量%以上,更佳為10重量%以上,進而較佳為15重量%以上,且較佳為65重量%以下,更佳為60重量%以下,進而較佳為55重量%以下。若上述具有二環戊二烯骨架之光硬化性化合物之含量為上述下限以上,則可進一步提高光硬化性,可形成縱橫比更大之阻隔壁。又,若上述具有二環戊二烯骨架之光硬化性化合物之含量為上述上限以下,則可進一步提高接著對象構件(第1構件及第2構件)與阻隔壁之接著強度。In 100% by weight of the curable composition, the content of the photocurable compound having a dicyclopentadiene skeleton is preferably at least 5% by weight, more preferably at least 10% by weight, and still more preferably at least 15% by weight. And it is preferably 65% by weight or less, more preferably 60% by weight or less, and still more preferably 55% by weight or less. When content of the photocurable compound which has the said dicyclopentadiene frame|skeleton is more than the said minimum, photocurability can be improved further, and the barrier rib with a larger aspect ratio can be formed. Moreover, if content of the photocurable compound which has the said dicyclopentadiene skeleton is below the said upper limit, the adhesive strength of the member to be bonded (1st member and 2nd member) and a barrier rib can be improved further.

(A)光硬化性化合物100重量%中,上述具有二環戊二烯骨架之光硬化性化合物之含量較佳為10重量%以上,更佳為20重量%以上,且較佳為90重量%以下,更佳為80重量%以下。若上述具有二環戊二烯骨架之光硬化性化合物之含量為上述下限以上,則可進一步提高光硬化性,可形成縱橫比更大之阻隔壁。又,若上述具有二環戊二烯骨架之光硬化性化合物之含量為上述下限以上及上述上限以下,則可進一步提高接著對象構件(第1構件及第2構件)與阻隔壁之接著強度。(A) The content of the photocurable compound having a dicyclopentadiene skeleton in 100% by weight of the photocurable compound is preferably at least 10% by weight, more preferably at least 20% by weight, and more preferably 90% by weight or less, more preferably 80% by weight or less. When content of the photocurable compound which has the said dicyclopentadiene frame|skeleton is more than the said minimum, photocurability can be improved further, and the barrier rib with a larger aspect ratio can be formed. Moreover, when content of the photocurable compound which has the said dicyclopentadiene skeleton is more than the said minimum and below the said upper limit, the bonding strength of the member to be bonded (1st member and 2nd member) and a barrier rib can be further improved.

<(B)熱硬化性化合物> 上述硬化性組合物包含(B)熱硬化性化合物。(B)熱硬化性化合物為具有環狀醚基之熱硬化性化合物。環狀醚基為熱硬化性官能基。(B)熱硬化性化合物可僅使用1種,亦可併用2種以上。 <(B) Thermosetting compound> The said curable composition contains (B) a thermosetting compound. (B) The thermosetting compound is a thermosetting compound having a cyclic ether group. The cyclic ether group is a thermosetting functional group. (B) The thermosetting compound may use only 1 type, and may use 2 or more types together.

作為(B)熱硬化性化合物所具有之上述環狀醚基,可例舉環氧基等。(B)熱硬化性化合物可僅具有1種環狀醚基,亦可具有2種以上環狀醚基。(B) As said cyclic ether group which a thermosetting compound has, an epoxy group etc. are mentioned. (B) The thermosetting compound may have only 1 type of cyclic ether group, and may have 2 or more types of cyclic ether groups.

(B)熱硬化性化合物所具有之上述環狀醚基較佳為環氧基。(B)熱硬化性化合物較佳為具有環氧基。(B)熱硬化性化合物較佳為環氧化合物。於該情形時,可高精度地形成硬化性組合物層。又,可進一步提高熱硬化性,可形成縱橫比更大之阻隔壁。又,可進一步提高接著對象構件(第1構件及第2構件)與阻隔壁之接著強度。(B) It is preferable that the said cyclic ether group which a thermosetting compound has is an epoxy group. (B) The thermosetting compound preferably has an epoxy group. (B) The thermosetting compound is preferably an epoxy compound. In this case, the curable composition layer can be formed with high precision. In addition, thermosetting properties can be further improved, and barrier ribs with a larger aspect ratio can be formed. In addition, the bonding strength between the members to be bonded (the first member and the second member) and the barrier rib can be further improved.

(B)熱硬化性化合物可包含具有1個環狀醚基之熱硬化性化合物,亦可包含具有2個環狀醚基之熱硬化性化合物,亦可包含具有2個以上環狀醚基之熱硬化性化合物,亦可包含具有3個以上環狀醚基之熱硬化性化合物。(B)熱硬化性化合物可包含具有1個環氧基之環氧化合物,亦可包含具有2個環氧基之環氧化合物,亦可包含具有2個以上環氧基之環氧化合物,亦可包含具有3個以上環氧基之環氧化合物。(B)熱硬化性化合物中之環狀醚基數或環氧基數可為100個以下,亦可為50個以下,還可為10個以下。(B) The thermosetting compound may include a thermosetting compound having one cyclic ether group, a thermosetting compound having two cyclic ether groups, or a thermosetting compound having two or more cyclic ether groups. The thermosetting compound may also include a thermosetting compound having three or more cyclic ether groups. (B) The thermosetting compound may include an epoxy compound having one epoxy group, an epoxy compound having two epoxy groups, or an epoxy compound having two or more epoxy groups, or An epoxy compound having three or more epoxy groups may be contained. (B) The number of cyclic ether groups or epoxy groups in the thermosetting compound may be 100 or less, 50 or less, or 10 or less.

就更有效地發揮本發明之效果之觀點而言,(B)熱硬化性化合物較佳為包含具有2個以上環狀醚基之熱硬化性化合物,更佳為包含具有2個以上環氧基之環氧化合物。於該情形時,可高精度地形成硬化性組合物層。又,可進一步提高熱硬化性,可形成縱橫比更大之阻隔壁。又,可進一步提高接著對象構件(第1構件及第2構件)與阻隔壁之接著強度。From the viewpoint of exerting the effects of the present invention more effectively, the (B) thermosetting compound preferably includes a thermosetting compound having two or more cyclic ether groups, more preferably a thermosetting compound having two or more epoxy groups. of epoxy compounds. In this case, the curable composition layer can be formed with high precision. In addition, thermosetting properties can be further improved, and barrier ribs with a larger aspect ratio can be formed. In addition, the bonding strength between the members to be bonded (the first member and the second member) and the barrier rib can be further improved.

作為上述環氧化合物,可例舉:雙酚A型環氧化合物、雙酚F型環氧化合物、雙酚S型環氧化合物、酚系酚醛清漆型環氧化合物、聯苯型環氧化合物、聯苯酚醛清漆型環氧化合物、聯苯酚型環氧化合物、萘型環氧化合物、茀型環氧化合物、苯酚芳烷基型環氧化合物、萘酚芳烷基型環氧化合物、二環戊二烯型環氧化合物、蒽型環氧化合物、具有金剛烷骨架之環氧化合物、具有三環癸烷骨架之環氧化合物、伸萘基醚型環氧化合物、及於骨架具有三𠯤核之環氧化合物等。As said epoxy compound, bisphenol A type epoxy compound, bisphenol F type epoxy compound, bisphenol S type epoxy compound, phenolic novolak type epoxy compound, biphenyl type epoxy compound, Biphenyl novolak type epoxy compound, biphenol type epoxy compound, naphthalene type epoxy compound, fennel type epoxy compound, phenol aralkyl type epoxy compound, naphthol aralkyl type epoxy compound, dicyclopentadiene Diene-type epoxy compounds, anthracene-type epoxy compounds, epoxy compounds with an adamantane skeleton, epoxy compounds with a tricyclodecane skeleton, naphthyl ether-type epoxy compounds, and those with a three-skeleton nucleus epoxy compounds etc.

(B)熱硬化性化合物可具有(甲基)丙烯醯基,亦可不具有(甲基)丙烯醯基。(B)熱硬化性化合物可包含具有(甲基)丙烯醯基之熱硬化性化合物,亦可不含具有(甲基)丙烯醯基之熱硬化性化合物。(B) The thermosetting compound may have a (meth)acryl group, and may not have a (meth)acryl group. (B) The thermosetting compound may contain a thermosetting compound having a (meth)acryl group, or may not contain a thermosetting compound having a (meth)acryl group.

具有(甲基)丙烯醯基之(B)熱硬化性化合物為光及熱硬化性化合物。The (B) thermosetting compound having a (meth)acryloyl group is a light and thermosetting compound.

於本說明書中,有時將上述「具有(甲基)丙烯醯基之(B)熱硬化性化合物」稱為「(B1)光及熱硬化性化合物」。In this specification, the said "(B) thermosetting compound which has a (meth)acryloyl group" may be referred to as "(B1) light and thermosetting compound".

(B1)光及熱硬化性化合物為具有(甲基)丙烯醯基且具有環狀醚基之光及熱硬化性化合物。(B1)光及熱硬化性化合物可僅使用1種,亦可併用2種以上。(B1) The photo- and thermosetting compound is a photo- and thermosetting compound having a (meth)acryl group and a cyclic ether group. (B1) Light and thermosetting compounds may be used alone or in combination of two or more.

(B)熱硬化性化合物較佳為包含(B1)光及熱硬化性化合物。於該情形時,可進一步提高光硬化性,可良好地維持接著對象構件(第1構件及第2構件)與阻隔壁之接著強度,並且形成縱橫比更大之阻隔壁。(B) It is preferable that a thermosetting compound contains (B1) light and a thermosetting compound. In this case, the photocurability can be further improved, the bonding strength between the members to be bonded (the first member and the second member) and the barrier rib can be maintained well, and a barrier rib with a larger aspect ratio can be formed.

(B1)光及熱硬化性化合物可具有1個(甲基)丙烯醯基,亦可具有2個以上(甲基)丙烯醯基。(B1) The light and thermosetting compound may have 1 (meth)acryl group, and may have 2 or more (meth)acryl groups.

作為(B1)光及熱硬化性化合物,可例舉:(甲基)丙烯酸縮水甘油酯及4-羥基丁基(甲基)丙烯酸酯縮水甘油醚等。As (B1) light and thermosetting compound, glycidyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate glycidyl ether, etc. are mentioned.

(B1)光及熱硬化性化合物較佳為包含(甲基)丙烯酸縮水甘油酯或4-羥基丁基(甲基)丙烯酸酯縮水甘油醚,更佳為包含4-羥基丁基(甲基)丙烯酸酯縮水甘油醚。於該情形時,可進一步提高光硬化性,可形成縱橫比更大之阻隔壁。(B1) The light and thermosetting compound preferably contains glycidyl (meth)acrylate or 4-hydroxybutyl (meth)acrylate glycidyl ether, more preferably contains 4-hydroxybutyl (methyl) Acrylate Glycidyl Ether. In this case, photocurability can be further improved, and the barrier rib with a larger aspect ratio can be formed.

上述硬化性組合物100重量%中,(B)熱硬化性化合物之含量較佳為5重量%以上,更佳為10重量%以上,進而較佳為15重量%以上,進而更佳為20重量%以上,特佳為30重量%以上。上述硬化性組合物100重量%中,(B)熱硬化性化合物之含量較佳為80重量%以下,更佳為70重量%以下,進而較佳為60重量%以下,進而更佳為40重量%以下,尤佳為35重量%以下,特佳為30重量%以下。若(B)熱硬化性化合物之含量為上述下限以上及上述上限以下,則可高精度地形成硬化性組合物層。又,可進一步提高熱硬化性,可形成縱橫比更大之阻隔壁。進而,可進一步提高接著對象構件(第1構件及第2構件)與阻隔壁之接著強度。The content of the thermosetting compound (B) in 100% by weight of the curable composition is preferably at least 5% by weight, more preferably at least 10% by weight, still more preferably at least 15% by weight, and even more preferably at least 20% by weight % or more, especially preferably more than 30% by weight. The content of (B) thermosetting compound in 100% by weight of the curable composition is preferably at most 80% by weight, more preferably at most 70% by weight, further preferably at most 60% by weight, and even more preferably at most 40% by weight % or less, preferably less than 35% by weight, particularly preferably less than 30% by weight. A curable composition layer can be formed with high precision as content of (B) a thermosetting compound is more than the said minimum and below the said upper limit. In addition, thermosetting properties can be further improved, and barrier ribs with a larger aspect ratio can be formed. Furthermore, the bonding strength between the members to be bonded (the first member and the second member) and the barrier rib can be further improved.

上述硬化性組合物100重量%中,(B1)光及熱硬化性化合物之含量較佳為10重量%以上,更佳為20重量%以上,進而較佳為30重量%以上。上述硬化性組合物100重量%中,(B1)光及熱硬化性化合物之含量較佳為80重量%以下,更佳為70重量%以下,進而較佳為60重量%以下,進而更佳為40重量%以下,尤佳為35重量%以下,特佳為30重量%以下。若(B1)光及熱硬化性化合物之含量為上述下限以上及上述上限以下,則可進一步提高光硬化性及熱硬化性,可形成縱橫比更大之阻隔壁。又,若(B1)光及熱硬化性化合物之含量為上述下限以上,則可進一步提高接著對象構件(第1構件及第2構件)與阻隔壁之接著強度。In 100% by weight of the above-mentioned curable composition, the content of the light and thermosetting compound (B1) is preferably at least 10% by weight, more preferably at least 20% by weight, and still more preferably at least 30% by weight. In 100% by weight of the above curable composition, the content of (B1) light and thermosetting compound is preferably 80% by weight or less, more preferably 70% by weight or less, further preferably 60% by weight or less, and even more preferably 40% by weight or less, preferably 35% by weight or less, particularly preferably 30% by weight or less. When the content of the (B1) light and thermosetting compound is more than the above-mentioned minimum and below the above-mentioned upper limit, photocurability and thermosetting properties can be further improved, and barrier ribs with a larger aspect ratio can be formed. Moreover, if content of (B1) light and a thermosetting compound is more than the said minimum, the adhesive strength of the member to be bonded (1st member and 2nd member) and a barrier rib can be improved further.

(B)熱硬化性化合物100重量%中,(B1)光及熱硬化性化合物之含量較佳為10重量%以上,更佳為20重量%以上,進而較佳為30重量%以上,且較佳為90重量%以下,更佳為80重量%以下,進而較佳為70重量%以下。若(B1)光及熱硬化性化合物之含量為上述下限以上,則可進一步提高光硬化性,可形成縱橫比更大之阻隔壁。又,若(B1)光及熱硬化性化合物之含量為上述上限以下,則可進一步提高接著對象構件(第1構件及第2構件)與阻隔壁之接著強度。(B) In 100% by weight of the thermosetting compound, the content of (B1) light and thermosetting compound is preferably at least 10% by weight, more preferably at least 20% by weight, further preferably at least 30% by weight, and more preferably Preferably it is 90 weight% or less, More preferably, it is 80 weight% or less, More preferably, it is 70 weight% or less. When content of (B1) light and a thermosetting compound is more than the said minimum, photocurability can be improved further, and the barrier rib with a larger aspect ratio can be formed. Moreover, if content of (B1) light and a thermosetting compound is below the said upper limit, the adhesive strength of the member to be bonded (1st member and 2nd member) and a barrier rib can be improved further.

上述硬化性組合物100重量%中,(A)光硬化性化合物與(B)熱硬化性化合物之合計含量較佳為55重量%以上,更佳為60重量%以上,進而較佳為65重量%以上。若上述合計含量為上述下限以上,則可高精度地形成硬化性組合物層。又,若上述合計含量為上述下限以上,則可進一步提高光硬化性及熱硬化性,可形成縱橫比更大之阻隔壁。進而,可進一步提高接著對象構件(第1構件及第2構件)與阻隔壁之接著強度。上述硬化性組合物100重量%中,(A)光硬化性化合物與(B)熱硬化性化合物之合計含量之上限並無特別限定。上述硬化性組合物100重量%中,(A)光硬化性化合物與(B)熱硬化性化合物之合計含量較佳為95重量%以下,更佳為90重量%,進而較佳為85重量%以下。The total content of the (A) photocurable compound and (B) thermosetting compound is preferably at least 55% by weight, more preferably at least 60% by weight, and still more preferably 65% by weight in 100% by weight of the curable composition. %above. A curable composition layer can be formed with high precision as the said total content is more than the said minimum. Moreover, when the said total content is more than the said minimum, photocurability and thermosetting property can be improved further, and the barrier rib with a larger aspect ratio can be formed. Furthermore, the bonding strength between the members to be bonded (the first member and the second member) and the barrier rib can be further improved. The upper limit of the total content of (A) photocurable compound and (B) thermosetting compound in 100 weight% of said curable composition is not specifically limited. The total content of the (A) photocurable compound and (B) thermosetting compound in 100% by weight of the curable composition is preferably at most 95% by weight, more preferably 90% by weight, and still more preferably 85% by weight the following.

<光聚合起始劑> 上述硬化性組合物包含光聚合起始劑。上述光聚合起始劑可僅使用1種,亦可併用2種以上。 <Photopolymerization Initiator> The above curable composition contains a photopolymerization initiator. The said photoinitiator may use only 1 type, and may use 2 or more types together.

作為上述光聚合起始劑,可例舉光自由基聚合起始劑及光陽離子聚合起始劑等。上述光聚合起始劑較佳為光自由基聚合起始劑。As said photoinitiator, a photoradical polymerization initiator, a photocationic polymerization initiator, etc. are mentioned. The aforementioned photopolymerization initiator is preferably a photoradical polymerization initiator.

上述光自由基聚合起始劑係用以藉由光照射產生自由基,而使自由基聚合反應開始之化合物。作為上述光自由基聚合起始劑,可例舉:安息香、安息香甲醚、安息香乙醚、安息香異丙醚等安息香化合物;2-羥基-2-甲基-1-苯基-丙烷-1-酮等苯烷酮化合物;苯乙酮、2,2-二甲氧基-2-苯基苯乙酮、2,2-二乙氧基-2-苯基苯乙酮、1,1-二氯苯乙酮等苯乙酮化合物;2-甲基-1-[4-(甲硫基)苯基]-2-𠰌啉基丙烷-1-酮、2-苄基-2-二甲基胺基-1-(4-𠰌啉基苯基)-丁烷-1-酮、2-苄基-2-二甲基胺基-1-(4-𠰌啉基苯基)-丁酮-1、2-(二甲基胺基)-2-[(4-甲基苯基)甲基]-1-[4-(4-𠰌啉基)苯基]-1-丁酮、N,N-二甲基胺基苯乙酮等胺基苯乙酮化合物;2-甲基蒽醌、2-乙基蒽醌、2-第三丁基蒽醌等蒽醌化合物;2,4-二甲基9-氧硫𠮿

Figure 111121366-001
、2,4-二乙基9-氧硫𠮿
Figure 111121366-001
、2-氯9-氧硫𠮿
Figure 111121366-001
、2,4-二異丙基9-氧硫𠮿
Figure 111121366-001
等9-氧硫𠮿
Figure 111121366-001
化合物;苯乙酮二甲基縮酮、苯偶醯二甲基縮酮等縮酮化合物;2,4,6-三甲基苯甲醯基二苯基氧化膦、雙(2,4,6-三甲基苯甲醯基)-苯基氧化膦等醯基氧化膦化合物;1,2-辛二酮、1-[4-(苯硫基)-2-(鄰苯甲醯基肟)]、乙酮、1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基]-1-(鄰乙醯基肟)等肟酯化合物;雙(環戊二烯基)二苯基鈦、雙(環戊二烯基)二氯鈦、雙(環戊二烯基)-雙(2,3,4,5,6-五氟苯基)鈦、雙(環戊二烯基)-雙(2,6-二氟-3-(吡咯-1-基)苯基)鈦等二茂鈦化合物等。上述光自由基聚合起始劑可僅使用1種,亦可併用2種以上。The above-mentioned photoradical polymerization initiator is a compound used to generate free radicals by light irradiation to start the radical polymerization reaction. Examples of the aforementioned photoradical polymerization initiator include: benzoin compounds such as benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin isopropyl ether; 2-hydroxy-2-methyl-1-phenyl-propan-1-one Isophenone compounds; acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone, 1,1-dichloro Acetophenone compounds such as acetophenone; 2-methyl-1-[4-(methylthio)phenyl]-2-?olinylpropan-1-one, 2-benzyl-2-dimethylamine Base-1-(4-𠰌linylphenyl)-butan-1-one, 2-benzyl-2-dimethylamino-1-(4-𠰌linylphenyl)-butanone-1 , 2-(Dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4-𠰌linyl)phenyl]-1-butanone, N,N -Aminoacetophenone compounds such as dimethylaminoacetophenone; anthraquinone compounds such as 2-methylanthraquinone, 2-ethylanthraquinone, and 2-tert-butylanthraquinone; 2,4-dimethylanthraquinone 9-oxosulfur
Figure 111121366-001
, 2,4-Diethyl 9-oxosulfur 𠮿
Figure 111121366-001
, 2-Chloro9-oxosulfur 𠮿
Figure 111121366-001
, 2,4-Diisopropyl 9-oxosulfur 𠮿
Figure 111121366-001
9-oxosulfur
Figure 111121366-001
Compounds; ketal compounds such as acetophenone dimethyl ketal and benzoyl dimethyl ketal; 2,4,6-trimethylbenzoyl diphenylphosphine oxide, bis(2,4,6 Acyl phosphine oxide compounds such as -trimethylbenzoyl)-phenylphosphine oxide; ], ethyl ketone, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-1-(o-acetyl oxime) and other oxime ester compounds; Bis(cyclopentadienyl)diphenyl titanium, bis(cyclopentadienyl)dichlorotitanium, bis(cyclopentadienyl)-bis(2,3,4,5,6-pentafluorophenyl ) titanium, titanocene compounds such as bis(cyclopentadienyl)-bis(2,6-difluoro-3-(pyrrol-1-yl)phenyl)titanium, and the like. The said photoradical polymerization initiator may use only 1 type, and may use 2 or more types together.

可與上述光自由基聚合起始劑一同使用光聚合起始助劑。作為該光聚合起始助劑,可例舉:N,N-二甲基胺基苯甲酸乙酯、N,N-二甲基胺基苯甲酸異戊酯、4-二甲基胺基苯甲酸戊酯、三乙胺及三乙醇胺等。亦可使用除其等以外之光聚合起始助劑。上述光聚合起始助劑可僅使用1種,亦可併用2種以上。A photopolymerization initiation adjuvant may be used together with the photoradical polymerization initiator described above. Examples of the photopolymerization initiation aid include ethyl N,N-dimethylaminobenzoate, isoamyl N,N-dimethylaminobenzoate, 4-dimethylaminobenzene Amyl formate, triethylamine and triethanolamine, etc. A photopolymerization initiation adjuvant other than these may also be used. The said photopolymerization start adjuvant may use only 1 type, and may use 2 or more types together.

又,可將於可見光區域有吸收之CGI-784等(汽巴精化股份有限公司製造)二茂鈦化合物等用以促進光反應。In addition, titanocene compounds such as CGI-784 (manufactured by Ciba Specialty Chemical Co., Ltd.) that absorb in the visible light region can be used to promote photoreaction.

作為上述光陽離子聚合起始劑,可例舉:鋶鹽、錪鹽、茂金屬化合物及安息香甲苯磺酸酯等。上述光陽離子聚合起始劑可僅使用1種,亦可併用2種以上。As said photocationic polymerization initiator, a percilium salt, an odonium salt, a metallocene compound, benzoin tosylate, etc. are mentioned. The said photocationic polymerization initiator may use only 1 type, and may use 2 or more types together.

上述硬化性組合物100重量%中,上述光聚合起始劑之含量較佳為0.1重量%以上,更佳為0.5重量%以上,進而較佳為1重量%以上,且較佳為30重量%以下,更佳為20重量%以下,進而較佳為10重量%以下。The content of the photopolymerization initiator is preferably at least 0.1% by weight, more preferably at least 0.5% by weight, further preferably at least 1% by weight, and more preferably 30% by weight in 100% by weight of the curable composition. or less, more preferably 20% by weight or less, further preferably 10% by weight or less.

<熱硬化劑> 上述硬化性組合物包含熱硬化劑。上述熱硬化劑可僅使用1種,亦可併用2種以上。 <Thermohardener> The above curable composition contains a thermosetting agent. The said thermosetting agent may use only 1 type, and may use 2 or more types together.

作為上述熱硬化劑,可例舉:有機酸、胺化合物、醯胺化合物、醯肼化合物、咪唑化合物、咪唑啉化合物、酚化合物、脲化合物、多硫化合物及酸酐等。上述熱硬化劑可使用胺-環氧加成物等改性聚胺化合物。亦可使用除其等以外之熱硬化劑。Examples of the thermosetting agent include organic acids, amine compounds, amide compounds, hydrazide compounds, imidazole compounds, imidazoline compounds, phenol compounds, urea compounds, polysulfide compounds, and acid anhydrides. As the thermosetting agent, modified polyamine compounds such as amine-epoxy adducts can be used. Thermosetting agents other than these may also be used.

上述胺化合物意指具有1個以上胺基之化合物。上述胺化合物可為一級胺,亦可為二級胺,還可為三級胺。作為上述胺化合物,可例舉脂肪族胺化合物、脂環族胺化合物、芳香族胺化合物、醯肼及胍衍生物等。上述脂肪族胺化合物可為脂肪族聚胺。上述脂環族胺化合物可為脂環族聚胺。上述芳香族胺化合物可為芳香族聚胺。又,上述胺化合物可使用環氧化合物加成聚胺(環氧化合物與聚胺之反應物)、麥可加成聚胺(α,β-不飽和酮與聚胺之反應物)、曼尼希加成聚胺(聚胺與福馬林及苯酚之縮合物)、硫脲加成聚胺(硫脲與聚胺之反應物)、酮封鏈聚胺(酮化合物與聚胺之反應物[酮亞胺])等加成物。The aforementioned amine compound means a compound having one or more amino groups. The above-mentioned amine compounds may be primary amines, secondary amines, or tertiary amines. Examples of the amine compound include aliphatic amine compounds, alicyclic amine compounds, aromatic amine compounds, hydrazine, and guanidine derivatives. The aforementioned aliphatic amine compound may be an aliphatic polyamine. The aforementioned alicyclic amine compound may be an alicyclic polyamine. The above-mentioned aromatic amine compound may be an aromatic polyamine. In addition, the above-mentioned amine compound can use epoxy compound addition polyamine (reaction product of epoxy compound and polyamine), Michael can add polyamine (reaction product of α,β-unsaturated ketone and polyamine), Manny Greek addition polyamine (condensate of polyamine, formalin and phenol), thiourea addition polyamine (reaction product of thiourea and polyamine), ketone-blocked polyamine (reaction product of ketone compound and polyamine[ Ketimine]) and other adducts.

作為上述脂肪族聚胺,可例舉:二伸乙基三胺、三乙四胺、四乙五胺及二乙基胺基丙基胺等。As said aliphatic polyamine, diethylenetriamine, triethylenetetramine, tetraethylenepentamine, diethylaminopropylamine, etc. are mentioned.

作為上述脂環族聚胺,可例舉:薄荷烷二胺、異佛爾酮二胺、N-胺基乙基哌𠯤、3,9-雙(3-胺基丙基)-2,4,8,10-四氧雜螺(5,5)十一烷加成物、雙(4-胺基-3-甲基環己基)甲烷及雙(4-胺基環己基)甲烷等。Examples of the above-mentioned cycloaliphatic polyamines include: menthanediamine, isophoronediamine, N-aminoethylpiperone, 3,9-bis(3-aminopropyl)-2,4 ,8,10-tetraoxaspiro(5,5)undecane adduct, bis(4-amino-3-methylcyclohexyl)methane and bis(4-aminocyclohexyl)methane, etc.

作為上述芳香族聚胺,可例舉:間苯二胺、對苯二胺、鄰苯二甲胺、間苯二甲胺、對苯二甲胺、4,4-二胺基二苯基甲烷、4,4'-二胺基-3,3'-二乙基-5,5'-二甲基二苯基甲烷、4,4-二胺基二苯基丙烷、4,4-二胺基二苯基碸、4,4-二胺基二環己烷、雙(4-胺基苯基)苯基甲烷、1,5-二胺基萘、1,1-雙(4-胺基苯基)環己烷、2,2-雙[(4-胺基苯氧基)苯基]丙烷、雙[4-(4-胺基苯氧基)苯基]碸、雙[4-(3-胺基苯氧基)苯基]碸、1,3-雙(3-胺基苯氧基)苯、4,4-亞甲基-雙(2-氯苯胺)及4,4-二胺基二苯基碸等。Examples of the aromatic polyamine include m-phenylenediamine, p-phenylenediamine, o-xylylenediamine, m-xylylenediamine, p-xylylenediamine, 4,4-diaminodiphenylmethane , 4,4'-diamino-3,3'-diethyl-5,5'-dimethyldiphenylmethane, 4,4-diaminodiphenylpropane, 4,4-diamine Diphenylphenylene, 4,4-diaminodicyclohexane, bis(4-aminophenyl)phenylmethane, 1,5-diaminonaphthalene, 1,1-bis(4-amino Phenyl)cyclohexane, 2,2-bis[(4-aminophenoxy)phenyl]propane, bis[4-(4-aminophenoxy)phenyl]pyridine, bis[4-( 3-aminophenoxy)phenyl]pyridine, 1,3-bis(3-aminophenoxy)benzene, 4,4-methylene-bis(2-chloroaniline) and 4,4-bis Aminodiphenylsulfone, etc.

作為上述醯肼,可例舉:碳二醯肼、己二酸二醯肼、癸二酸二醯肼、十二烷二酸二醯肼及間苯二甲酸二醯肼等。As said hydrazide, carbohydrazide, adipate dihydrazide, sebacic acid dihydrazide, dodecanedioic acid dihydrazide, isophthalic acid dihydrazine, etc. are mentioned.

作為上述胍衍生物,可例舉:雙氰胺、1-鄰甲苯基雙胍、α-2,5-二甲基胍、α,ω-二苯基二胍、α,α-雙甲脒基胍基二苯醚、對氯苯基二胍、α,α-六亞甲基雙[ω-(對氯酚)]二胍、苯基二胍草酸酯、乙醯基胍及二乙基氰基乙醯基胍等。Examples of the above-mentioned guanidine derivatives include: dicyandiamide, 1-o-tolylbiguanide, α-2,5-dimethylguanidine, α,ω-diphenylbiguanide, α,α-biformamidinyl Guanidinyl diphenyl ether, p-chlorophenyl biguanide, α,α-hexamethylene bis[ω-(p-chlorophenol)] biguanide, phenyl biguanide oxalate, acetylguanidine and diethyl Cyanoacetylguanidine, etc.

作為上述酚化合物,可例舉多酚化合物等。作為上述多酚化合物,例如可例舉:苯酚、甲酚、乙基苯酚、丁基苯酚、辛基苯酚、雙酚A、四溴雙酚A、雙酚F、雙酚S、4,4'-聯苯基苯酚、含有萘骨架之酚系酚醛清漆樹脂、含有苯二甲基骨架之酚系酚醛清漆樹脂、含有二環戊二烯骨架之酚系酚醛清漆樹脂及含有茀骨架之酚系酚醛清漆樹脂等。As said phenol compound, a polyphenol compound etc. are mentioned. Examples of the polyphenol compound include phenol, cresol, ethylphenol, butylphenol, octylphenol, bisphenol A, tetrabromobisphenol A, bisphenol F, bisphenol S, 4,4' -Biphenylphenol, phenolic novolak resins containing naphthalene skeleton, phenolic novolac resins containing xylylene skeleton, phenolic novolac resins containing dicyclopentadiene skeleton, and phenolic novolak resins containing fennel skeleton Varnish resin, etc.

作為上述酸酐,例如可例舉:鄰苯二甲酸酐、四氫鄰苯二甲酸酐、六氫鄰苯二甲酸酐、甲基四氫鄰苯二甲酸酐、甲基耐地酸酐、十二烷基琥珀酸酐、氯茵酸酐、均苯四甲酸二酐、二苯甲酮四羧酸二酐、甲基環己烯四羧酸二酐、偏苯三甲酸酐及聚壬二酸酐等。Examples of the acid anhydride include: phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methyl phthalic anhydride, dodecane Succinic anhydride, chlorendic anhydride, pyromellitic dianhydride, benzophenone tetracarboxylic dianhydride, methylcyclohexene tetracarboxylic dianhydride, trimellitic anhydride and polyazelaic anhydride, etc.

上述熱硬化劑較佳為包含胺化合物,較佳為胺化合物。上述胺化合物較佳為芳香族胺化合物。就提高硬化性組合物之噴墨噴出性,形成縱橫比更大之阻隔壁之觀點而言,上述芳香族胺化合物較佳為包含1,3-雙(3-胺基苯氧基)苯或雙[4-(3-胺基苯氧基)苯基]碸。於該情形時,上述芳香族胺化合物包含1,3-雙(3-胺基苯氧基)苯及雙[4-(3-胺基苯氧基)苯基]碸中之至少1種。上述芳香族胺化合物可包含1,3-雙(3-胺基苯氧基)苯及雙[4-(3-胺基苯氧基)苯基]碸。上述芳香族胺化合物可包含1,3-雙(3-胺基苯氧基)苯,亦可包含雙[4-(3-胺基苯氧基)苯基]碸。於上述熱硬化劑包含該等較佳化合物之情形時,可進一步提高接著對象構件(第1構件及第2構件)與阻隔壁之接著強度。The above-mentioned thermosetting agent preferably contains an amine compound, preferably an amine compound. The aforementioned amine compound is preferably an aromatic amine compound. From the viewpoint of improving the inkjet dischargeability of the curable composition and forming a barrier wall with a larger aspect ratio, the aromatic amine compound preferably contains 1,3-bis(3-aminophenoxy)benzene or Bis[4-(3-aminophenoxy)phenyl]pyridine. In this case, the above-mentioned aromatic amine compound contains at least one of 1,3-bis(3-aminophenoxy)benzene and bis[4-(3-aminophenoxy)phenyl]pyridine. The above-mentioned aromatic amine compound may include 1,3-bis(3-aminophenoxy)benzene and bis[4-(3-aminophenoxy)phenyl]pyridine. The above-mentioned aromatic amine compound may include 1,3-bis(3-aminophenoxy)benzene or bis[4-(3-aminophenoxy)phenyl]pyridine. When the above-mentioned thermosetting agent contains these preferred compounds, the bonding strength between the members to be bonded (the first member and the second member) and the barrier rib can be further improved.

上述硬化性組合物100重量%中,上述熱硬化劑之含量較佳為1重量%以上,更佳為5重量%以上,進而較佳為10重量%以上,且較佳為40重量%以下,更佳為30重量%以下,進而較佳為25重量%以下。In 100% by weight of the curable composition, the content of the thermosetting agent is preferably at least 1% by weight, more preferably at least 5% by weight, further preferably at least 10% by weight, and more preferably at most 40% by weight, More preferably, it is 30 weight% or less, More preferably, it is 25 weight% or less.

<紅外光遮蔽劑> 上述硬化性組合物包含紅外光遮蔽劑。藉由使上述硬化性組合物包含紅外光遮蔽劑,可提高由上述硬化性組合物所形成之阻隔壁之紅外光遮蔽性。上述紅外光遮蔽劑可僅使用1種,亦可併用2種以上。 <Infrared light shielding agent> The above curable composition contains an infrared light shielding agent. By making the said curable composition contain an infrared light shielding agent, the infrared light shielding property of the barrier rib formed from the said curable composition can be improved. The said infrared light shielding agent may use only 1 type, and may use 2 or more types together.

上述紅外光遮蔽劑只要為具有遮蔽紅外光之性能之粒子或化合物,就並無特別限定。The above-mentioned infrared light shielding agent is not particularly limited as long as it is a particle or a compound having the property of shielding infrared light.

作為上述紅外光遮蔽劑,可例舉:碳黑、奈米碳管、石墨烯、六硼化鑭化合物、銫氧化鎢化合物、二硫醇化合物、萘醌化合物、銨化合物、亞銨化合物、偶氮化合物、酞菁化合物、萘酞菁化合物、蒽酞菁化合物、喹吖啶酮化合物、戊芬化合物、二㗁𠯤化合物、苝化合物及吲哚化合物等。Examples of the infrared shielding agent include carbon black, carbon nanotubes, graphene, lanthanum hexaboride compounds, cesium tungsten oxide compounds, dithiol compounds, naphthoquinone compounds, ammonium compounds, imonium compounds, Nitrogen compounds, phthalocyanine compounds, naphthalocyanine compounds, anthracene phthalocyanine compounds, quinacridone compounds, amphenene compounds, dioxin compounds, perylene compounds, indole compounds, etc.

就進一步提高紅外光遮蔽性之觀點而言,上述紅外光遮蔽劑較佳為包含碳黑、酞菁化合物或萘酞菁化合物,更佳為包含碳黑、具有酞菁骨架之金屬錯合物或具有萘酞菁骨架之金屬錯合物。於該情形時,上述紅外光遮蔽劑包含碳黑、酞菁化合物及萘酞菁化合物中之至少1種。上述紅外光遮蔽劑可包含碳黑、酞菁化合物及萘酞菁化合物中之至少2種,亦可包含碳黑、酞菁化合物及萘酞菁化合物。上述紅外光遮蔽劑可包含碳黑,亦可包含酞菁化合物,還可包含萘酞菁化合物。就自近紅外光至紅外光之廣泛區域之光吸收性優異,進一步提高紅外光遮光性之觀點而言,上述紅外光遮蔽劑進而較佳為包含碳黑。就於近紅外光之局部區域中光吸收性優異,不抑制(A)光硬化性化合物之光硬化反應而形成縱橫比更大之阻隔壁,且進一步提高紅外光遮蔽性之觀點而言,上述紅外光遮蔽劑進而較佳為包含具有酞菁骨架之金屬錯合物。In terms of further improving the infrared light shielding property, the infrared light shielding agent preferably contains carbon black, a phthalocyanine compound or a naphthalocyanine compound, more preferably contains carbon black, a metal complex having a phthalocyanine skeleton, or A metal complex with a naphthalocyanine skeleton. In this case, the infrared light shielding agent includes at least one of carbon black, a phthalocyanine compound, and a naphthalocyanine compound. The infrared light shielding agent may contain at least two of carbon black, phthalocyanine compounds, and naphthalocyanine compounds, and may also contain carbon black, phthalocyanine compounds, and naphthalocyanine compounds. The above-mentioned infrared light shielding agent may contain carbon black, may also contain phthalocyanine compounds, and may also contain naphthalocyanine compounds. The infrared light shielding agent further preferably contains carbon black from the viewpoint of being excellent in light absorption in a wide range from near-infrared light to infrared light and further improving infrared light-shielding properties. From the point of view of excellent light absorption in the local area of near-infrared light, formation of barrier ribs with larger aspect ratio without inhibiting the photohardening reaction of (A) photocurable compound, and further improvement of infrared light shielding properties, the above-mentioned The infrared light shielding agent further preferably contains a metal complex having a phthalocyanine skeleton.

於上述硬化性組合物包含紅外光遮蔽劑之情形時,上述碳黑之平均一次粒徑較佳為15 nm以上,更佳為20 nm以上,進而較佳為30 nm以上,且較佳為100 nm以下,更佳為90 nm以下。若上述碳黑之平均一次粒徑為上述下限以上,則在使用噴墨裝置一面加熱上述硬化性組合物一面使其循環而進行塗佈時,可進一步提高硬化性組合物中之碳黑之分散性,故而可提高硬化性組合物之噴墨噴出性,形成縱橫比更大之阻隔壁。When the curable composition includes an infrared light shielding agent, the average primary particle size of the carbon black is preferably at least 15 nm, more preferably at least 20 nm, further preferably at least 30 nm, and more preferably at least 100 nm. nm or less, more preferably 90 nm or less. When the average primary particle diameter of the above-mentioned carbon black is more than the above-mentioned lower limit, the dispersion of the carbon black in the curable composition can be further improved when the above-mentioned curable composition is heated and circulated for coating using an inkjet device. Therefore, it can improve the inkjet ejectability of the curable composition and form a barrier wall with a larger aspect ratio.

上述碳黑之平均一次粒徑可使用穿透式電子顯微鏡(TEM)來測定。作為穿透式電子顯微鏡,例如可例舉日本電子公司製造之「JEM-ARM200F」等。對使用穿透式電子顯微鏡所獲得之粒子圖像之長徑及短徑進行測定,將測定值之幾何平均值(長徑×短徑) 1/2作為上述碳黑之一次粒徑。較佳為測定100個上述碳黑之一次粒徑,進行算術平均而求出上述碳黑之平均一次粒徑。 The average primary particle diameter of the above-mentioned carbon black can be measured using a transmission electron microscope (TEM). As a transmission electron microscope, "JEM-ARM200F" by JEOL Ltd. etc. are mentioned, for example. The long axis and short axis of the particle image obtained by a transmission electron microscope were measured, and the geometric mean value (long axis x short axis) 1/2 of the measured values was used as the primary particle diameter of the above-mentioned carbon black. It is preferable to measure the primary particle diameter of 100 pieces of the above-mentioned carbon black, and perform an arithmetic average to obtain the average primary particle diameter of the above-mentioned carbon black.

上述具有酞菁骨架之金屬錯合物為酞菁化合物。就進一步提高紅外光遮蔽性之觀點而言,上述具有酞菁骨架之金屬錯合物中之金屬錯合物較佳為釩錯合物或銅錯合物。上述酞菁化合物較佳為含有釩原子或銅原子之酞菁。The aforementioned metal complexes having a phthalocyanine skeleton are phthalocyanine compounds. From the viewpoint of further improving infrared light shielding properties, the metal complexes among the metal complexes having a phthalocyanine skeleton are preferably vanadium complexes or copper complexes. The above-mentioned phthalocyanine compound is preferably a phthalocyanine containing a vanadium atom or a copper atom.

上述具有萘酞菁骨架之金屬錯合物為萘酞菁化合物。就進一步提高紅外光遮蔽性之觀點而言,上述具有萘酞菁骨架之金屬錯合物中之金屬錯合物較佳為釩錯合物或銅錯合物。上述萘酞菁化合物較佳為含有釩原子或銅原子之萘酞菁。The aforementioned metal complex having a naphthalocyanine skeleton is a naphthalocyanine compound. From the viewpoint of further improving infrared light shielding properties, the metal complex among the metal complexes having a naphthalocyanine skeleton is preferably a vanadium complex or a copper complex. The aforementioned naphthalocyanine compound is preferably naphthalocyanine containing a vanadium atom or a copper atom.

上述硬化性組合物100重量%中,上述紅外光遮蔽劑之含量較佳為0.1重量%以上,更佳為0.5重量%以上,且較佳為10重量%以下,更佳為5重量%以下。若上述紅外光遮蔽劑之含量為上述下限以上及上述上限以下,則可進一步提高紅外光遮蔽性,可形成縱橫比更大之阻隔壁。In 100% by weight of the curable composition, the content of the infrared light shielding agent is preferably at least 0.1% by weight, more preferably at least 0.5% by weight, and preferably at most 10% by weight, more preferably at most 5% by weight. If the content of the above-mentioned infrared light shielding agent is more than the above-mentioned lower limit and below the above-mentioned upper limit, the infrared light shielding property can be further improved, and a barrier wall with a larger aspect ratio can be formed.

<(C)光硬化性化合物> 上述硬化性組合物可包含合計具有1個(甲基)丙烯醯基及乙烯基且不具有環狀醚基之光硬化性化合物。於該情形時,可進一步提高硬化性組合物之保存穩定性。 <(C) Photocurable compound> The above-mentioned curable composition may contain a photocurable compound having a total of one (meth)acryl group and vinyl group and not having a cyclic ether group. In this case, the storage stability of a curable composition can be further improved.

於本說明書中,有時將上述「合計具有1個(甲基)丙烯醯基及乙烯基且不具有環狀醚基之光硬化性化合物」稱為「(C)光硬化性化合物」。In this specification, the said "photocurable compound which has one (meth)acryloyl group and a vinyl group in total and does not have a cyclic ether group" may be called "(C) photocurable compound".

(C)光硬化性化合物可具有(甲基)丙烯醯基,亦可具有乙烯基。(C)光硬化性化合物僅具有(甲基)丙烯醯基及乙烯基中之一者。(C)光硬化性化合物可具有(甲基)丙烯醯基,亦可具有乙烯基。(甲基)丙烯醯基及乙烯基為光硬化性官能基。(C)光硬化性化合物例如不具有環氧基(環狀醚基)。(C)光硬化性化合物可僅使用1種,亦可併用2種以上。(C) The photocurable compound may have a (meth)acryl group, and may have a vinyl group. (C) The photocurable compound has only one of a (meth)acryl group and a vinyl group. (C) The photocurable compound may have a (meth)acryl group, and may have a vinyl group. The (meth)acryl group and the vinyl group are photocurable functional groups. (C) The photocurable compound does not have an epoxy group (cyclic ether group), for example. (C) The photocurable compound may use only 1 type, and may use 2 or more types together.

作為具有(甲基)丙烯醯基之(C)光硬化性化合物(單官能(甲基)丙烯酸酯化合物),可例舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸3-羥基丙酯、(甲基)丙烯酸2-羥基丁酯、(甲基)丙烯酸3-羥基丁酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸烯丙酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸苯酯、(甲基)丙烯酸2-甲氧基乙酯、(甲基)丙烯酸2-苯氧基乙酯、甲氧基二乙二醇(甲基)丙烯酸酯、甲氧基三乙二醇(甲基)丙烯酸酯、甲氧基丙二醇(甲基)丙烯酸酯、甲氧基二丙二醇(甲基)丙烯酸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸異𦯉基酯、(甲基)丙烯酸二環戊二烯酯、(甲基)丙烯酸2-羥基-3-苯氧基丙酯、單(甲基)丙烯酸甘油酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸二羥基環戊二烯酯、(甲基)丙烯酸二環戊烯酯、(甲基)丙烯酸二環戊烯氧基乙酯、(甲基)丙烯酸雙環戊酯、(甲基)丙烯酸萘酯、(甲基)丙烯酸月桂酯、(甲基)丙烯酸十二烷基酯及(甲基)丙烯酸硬脂酯等。As (C) photocurable compound (monofunctional (meth)acrylate compound) which has a (meth)acryloyl group, Methyl (meth)acrylate, ethyl (meth)acrylate, ( n-propyl methacrylate, isopropyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, sec-butyl (meth)acrylate, (meth)acrylic acid Tertiary butyl ester, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, ( 3-hydroxybutyl methacrylate, 4-hydroxybutyl (meth)acrylate, allyl (meth)acrylate, benzyl (meth)acrylate, cyclohexyl (meth)acrylate, (meth)acrylate ) phenyl acrylate, 2-methoxyethyl (meth)acrylate, 2-phenoxyethyl (meth)acrylate, methoxydiethylene glycol (meth)acrylate, methoxytriethyl Glycol (meth)acrylate, methoxypropylene glycol (meth)acrylate, methoxydipropylene glycol (meth)acrylate, isodecyl (meth)acrylate, isononyl (meth)acrylate, Iso(meth)acrylate, dicyclopentadienyl (meth)acrylate, 2-hydroxy-3-phenoxypropyl (meth)acrylate, glycerol mono(meth)acrylate, (meth)acrylate base) 2-ethylhexyl acrylate, dihydroxycyclopentadienyl (meth)acrylate, dicyclopentenyl (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, (meth)acrylate base) dicyclopentyl acrylate, naphthyl (meth)acrylate, lauryl (meth)acrylate, lauryl (meth)acrylate and stearyl (meth)acrylate, etc.

作為具有乙烯基之(C)光硬化性化合物,可例舉:乙烯醚類、乙烯衍生物、苯乙烯、氯甲基苯乙烯、α-甲基苯乙烯、馬來酸酐、N-乙烯基吡咯啶酮及N-乙烯基甲醯胺等。Examples of the photocurable compound (C) having a vinyl group include vinyl ethers, vinyl derivatives, styrene, chloromethylstyrene, α-methylstyrene, maleic anhydride, and N-vinylpyrrole. Pyridone and N-vinylformamide, etc.

上述硬化性組合物100重量%中,(C)光硬化性化合物之含量較佳為30重量%以下,更佳為20重量%以下,進而較佳為10重量%以下。若(C)光硬化性化合物之含量為上述上限以下,則可增多硬化性組合物中可包含之(A)光硬化性化合物之含量,結果,可進一步提高光硬化性,可形成縱橫比更大之阻隔壁。上述硬化性組合物100重量%中,(C)光硬化性化合物之含量之下限並無特別限定。上述硬化性組合物100重量%中,(C)光硬化性化合物之含量可為0重量%以上,亦可超過0重量%,亦可為1重量%以上,亦可為5重量%以上。上述硬化性組合物可不含(C)光硬化性化合物。The content of the photocurable compound (C) in 100% by weight of the curable composition is preferably at most 30% by weight, more preferably at most 20% by weight, and even more preferably at most 10% by weight. If the content of the (C) photocurable compound is below the above-mentioned upper limit, the content of the (A) photocurable compound that can be included in the curable composition can be increased. Great barrier. The lower limit of content of (C) photocurable compound in 100 weight% of said curable compositions is not specifically limited. The content of the photocurable compound (C) in 100% by weight of the curable composition may be 0% by weight or more, may exceed 0% by weight, may be 1% by weight or more, or may be 5% by weight or more. The said curable composition does not need to contain (C) photocurable compound.

上述硬化性組合物100重量%中,(A)光硬化性化合物、(B)熱硬化性化合物及(C)光硬化性化合物之合計含量較佳為55重量%以上,更佳為60重量%以上,進而較佳為65重量%以上。若上述合計含量為上述下限以上,則可高精度地形成硬化性組合物層。又,可形成縱橫比更大之阻隔壁。進而,可進一步提高接著對象構件(第1構件及第2構件)與阻隔壁之接著強度。(A)光硬化性化合物、(B)熱硬化性化合物及(C)光硬化性化合物之合計含量之上限並無特別限定。(A)光硬化性化合物、(B)熱硬化性化合物及(C)光硬化性化合物之合計含量較佳為95重量%以下,更佳為90重量%以下,進而較佳為85重量%以下。The total content of the (A) photocurable compound, (B) thermosetting compound, and (C) photocurable compound is preferably at least 55% by weight, more preferably 60% by weight, in 100% by weight of the curable composition. or more, and more preferably 65% by weight or more. A curable composition layer can be formed with high precision as the said total content is more than the said minimum. Also, barrier ribs with a larger aspect ratio can be formed. Furthermore, the bonding strength between the members to be bonded (the first member and the second member) and the barrier rib can be further improved. The upper limit of the total content of (A) photocurable compound, (B) thermosetting compound, and (C) photocurable compound is not specifically limited. The total content of (A) photocurable compound, (B) thermosetting compound, and (C) photocurable compound is preferably at most 95% by weight, more preferably at most 90% by weight, further preferably at most 85% by weight .

<硬化促進劑> 上述硬化性組合物可包含硬化促進劑,亦可不含硬化促進劑。上述硬化促進劑可僅使用1種,亦可併用2種以上。 <Hardening Accelerator> The above-mentioned curable composition may contain a curing accelerator, or may not contain a curing accelerator. The said hardening accelerator may use only 1 type, and may use 2 or more types together.

作為上述硬化促進劑,可例舉:三級胺、咪唑、四級銨鹽、四級鏻鹽、有機金屬鹽、磷化合物及脲系化合物等。As said hardening accelerator, a tertiary amine, an imidazole, a quaternary ammonium salt, a quaternary phosphonium salt, an organic metal salt, a phosphorus compound, a urea compound, etc. are mentioned.

上述硬化性組合物100重量%中,上述硬化促進劑之含量較佳為0.01重量%以上,更佳為0.05重量%以上,且較佳為10重量%以下,更佳為5重量%以下。The content of the hardening accelerator is preferably at least 0.01% by weight, more preferably at least 0.05% by weight, and preferably at most 10% by weight, more preferably at most 5% by weight, based on 100% by weight of the curable composition.

<溶劑> 上述硬化性組合物可包含溶劑,亦可不含溶劑。上述溶劑可僅使用1種,亦可併用2種以上。 <Solvent> The said curable composition may contain a solvent, and may not contain a solvent. The said solvent may use only 1 type, and may use 2 or more types together.

作為上述溶劑,可例舉水及有機溶劑等。As said solvent, water, an organic solvent, etc. are mentioned.

就進一步提高殘留物之去除性之觀點而言,上述溶劑較佳為有機溶劑。From the viewpoint of further improving the removability of residues, the above-mentioned solvent is preferably an organic solvent.

作為上述有機溶劑,可例舉:乙醇等醇類;丙酮、甲基乙基酮、環己酮等酮類;甲苯、二甲苯、四甲基苯等芳香族烴類;溶纖劑、甲基溶纖劑、丁基溶纖劑、卡必醇、甲基卡必醇、丁基卡必醇、丙二醇單甲醚、二丙二醇單甲醚、二丙二醇二乙醚、三丙二醇單甲醚等二醇醚類;乙酸乙酯、乙酸丁酯、乳酸丁酯、乙酸溶纖劑、丁基溶纖劑乙酸酯、卡必醇乙酸酯、丁基卡必醇乙酸酯、丙二醇單甲醚乙酸酯、二丙二醇單甲醚乙酸酯、碳酸丙二酯等酯類;辛烷、癸烷等脂肪族烴類;以及石油醚、石腦油等石油系溶劑等。Examples of the organic solvent include: alcohols such as ethanol; ketones such as acetone, methyl ethyl ketone, and cyclohexanone; aromatic hydrocarbons such as toluene, xylene, and tetramethylbenzene; Cellosolve, butyl cellosolve, carbitol, methyl carbitol, butyl carbitol, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol diethyl ether, tripropylene glycol monomethyl ether and other glycol ethers ; Ethyl acetate, butyl acetate, butyl lactate, acetic acid cellosolve, butyl cellosolve acetate, carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether acetate, di Esters such as propylene glycol monomethyl ether acetate and propylene carbonate; aliphatic hydrocarbons such as octane and decane; petroleum solvents such as petroleum ether and naphtha, etc.

就進一步提高硬化性組合物層之厚度精度之觀點而言,上述硬化性組合物中之溶劑之含量越少越好。From the viewpoint of further improving the thickness accuracy of the curable composition layer, the less the content of the solvent in the curable composition, the better.

於上述硬化性組合物包含上述溶劑之情形時,上述硬化性組合物100重量%中,上述溶劑之含量較佳為5重量%以下,更佳為1重量%以下,進而較佳為0.5重量%以下。上述硬化性組合物最佳為不含上述溶劑。When the above-mentioned curable composition contains the above-mentioned solvent, the content of the above-mentioned solvent in 100% by weight of the above-mentioned curable composition is preferably 5% by weight or less, more preferably 1% by weight or less, and still more preferably 0.5% by weight the following. The above-mentioned curable composition preferably does not contain the above-mentioned solvent.

<分散劑> 上述硬化性組合物可包含分散劑,亦可不含分散劑。上述硬化性組合物較佳為包含分散劑。於上述硬化性組合物包含分散劑之情形時,在使用噴墨裝置一面加熱上述硬化性組合物一面使其循環而進行塗佈時,進一步提高硬化性組合物中之碳黑之分散性,藉此可提高硬化性組合物之噴墨噴出性,形成縱橫比更大之阻隔壁。 <Dispersant> The above curable composition may or may not contain a dispersant. The curable composition described above preferably contains a dispersant. When the above-mentioned curable composition contains a dispersant, when the above-mentioned curable composition is heated and circulated for coating using an inkjet device, the dispersibility of carbon black in the curable composition is further improved, and by This can improve the inkjet ejectability of the curable composition and form a barrier wall with a larger aspect ratio.

上述分散劑具有1個分子內親水性骨架與親油性骨架以共價鍵結合之結構。作為上述分散劑,例如可例舉:陽離子系分散劑、陰離子系分散劑、非離子系分散劑、兩性分散劑、聚矽氧系分散劑、氟系分散劑及高分子系分散劑等界面活性劑。上述分散劑可僅使用1種,亦可併用2種以上。The above-mentioned dispersant has a structure in which a hydrophilic skeleton and an lipophilic skeleton are covalently bonded in one molecule. Examples of the above-mentioned dispersants include cationic dispersants, anionic dispersants, nonionic dispersants, amphoteric dispersants, silicone-based dispersants, fluorine-based dispersants, and polymer-based dispersants. agent. The above-mentioned dispersants may be used alone or in combination of two or more.

作為上述陽離子系分散劑,可例舉具有胺基之樹脂及化合物等。上述陽離子系分散劑較佳為具有胺基。上述陽離子系分散劑可具有1個胺基,亦可具有2個胺基,亦可具有3個胺基,亦可具有4個胺基。上述陽離子系分散劑中之胺基數可為100個以下,亦可為50個以下,還可為10個以下。上述陽離子系分散劑可不為熱硬化劑。As said cationic dispersant, the resin and compound etc. which have an amino group are mentioned. The above-mentioned cationic dispersant preferably has an amino group. The above-mentioned cationic dispersant may have one amine group, may have two amine groups, may have three amine groups, or may have four amine groups. The number of amine groups in the cationic dispersant may be 100 or less, 50 or less, or 10 or less. The above-mentioned cationic dispersant need not be a thermosetting agent.

作為上述陰離子系分散劑,可例舉具有羧基、磺酸基、硫酸酯基或磷酸酯基之樹脂及化合物等。上述陰離子系分散劑較佳為具有羧基、磺酸基、硫酸酯基或磷酸酯基。As said anionic dispersant, the resin and compound etc. which have a carboxyl group, a sulfonic acid group, a sulfate ester group, or a phosphoric acid ester group are mentioned. The above-mentioned anionic dispersant preferably has a carboxyl group, a sulfonic acid group, a sulfate ester group or a phosphate ester group.

作為上述非離子系分散劑,可例舉具有聚氧乙烯基之非離子系分散劑及具有醯胺基之非離子系分散劑等。作為上述具有聚氧乙烯基之非離子系分散劑,可例舉聚氧乙烯烷基醚、聚氧乙烯烷基芳基醚、乙炔二醇及聚氧乙烯二醇酯共聚物等。作為上述具有醯胺基之非離子系分散劑,可例舉聚氧乙烯脂肪酸醯胺等。As said nonionic dispersant, the nonionic dispersant which has a polyoxyethylene group, the nonionic dispersant which has an amide group, etc. are mentioned. Examples of the nonionic dispersant having the polyoxyethylene group include polyoxyethylene alkyl ether, polyoxyethylene alkylaryl ether, acetylene glycol, and polyoxyethylene glycol ester copolymer. Examples of the nonionic dispersant having an amide group include polyoxyethylene fatty acid amide and the like.

作為上述高分子系分散劑,例如可例舉:BYK-9076(BYK公司製造)、DISPERBYK-145(BYK公司製造)、Flowlen GW-1500(共榮社化學公司製造)、EfkaPX4701(BASF公司製造)及Hinoact T-6000(川研精細化學公司製造)等。Examples of the polymer-based dispersant include BYK-9076 (manufactured by BYK), DISPERBYK-145 (manufactured by BYK), Flowlen GW-1500 (manufactured by Kyoeisha Chemical Co., Ltd.), Efka PX4701 (manufactured by BASF) and Hinoact T-6000 (manufactured by Chuanyan Fine Chemical Co., Ltd.), etc.

就提高硬化性組合物之噴墨噴出性,形成縱橫比更大之阻隔壁之觀點而言,上述分散劑之分子量較佳為500以上,更佳為1000以上,進而較佳為2000以上,且較佳為50000以下,更佳為25000以下,進而較佳為10000以下。From the viewpoint of improving the inkjet dischargeability of the curable composition and forming a barrier wall with a larger aspect ratio, the molecular weight of the above-mentioned dispersant is preferably 500 or more, more preferably 1000 or more, still more preferably 2000 or more, and Preferably it is 50,000 or less, more preferably 25,000 or less, and still more preferably 10,000 or less.

上述分散劑之酸值較佳為0 mgKOH/g以上,更佳為10 mgKOH/g以上,進而較佳為20 mgKOH/g以上,且較佳為100 mgKOH/g以下,更佳為90 mgKOH/g以下。若上述分散劑之酸值為上述下限以上及上述上限以下,則可提高硬化性組合物之噴墨噴出性,形成縱橫比更大之阻隔壁,且改善適用期。上述分散劑之胺值較佳為0 mgKOH/g以上,更佳為10 mgKOH/g以上,進而較佳為20 mgKOH/g以上,且較佳為100 mgKOH/g以下,更佳為90 mgKOH/g以下。若上述分散劑之胺值為上述下限以上及上述上限以下,則可提高硬化性組合物之噴墨噴出性,形成縱橫比更大之阻隔壁,且改善適用期。就提高硬化性組合物之噴墨噴出性,形成縱橫比更大之阻隔壁,且改善適用期之觀點而言,較佳為上述分散劑之酸值為10 mgKOH/g以上100 mgKOH/g以下,上述分散劑之胺值為10 mgKOH/g以上100 mgKOH/g以下。The acid value of the above-mentioned dispersant is preferably above 0 mgKOH/g, more preferably above 10 mgKOH/g, more preferably above 20 mgKOH/g, and preferably below 100 mgKOH/g, more preferably below 90 mgKOH/g below g. When the acid value of the dispersant is not less than the above-mentioned lower limit and not more than the above-mentioned upper limit, the inkjet ejectability of the curable composition can be improved, a barrier wall with a larger aspect ratio can be formed, and the pot life can be improved. The amine value of the above-mentioned dispersant is preferably 0 mgKOH/g or more, more preferably 10 mgKOH/g or more, further preferably 20 mgKOH/g or more, and preferably 100 mgKOH/g or less, more preferably 90 mgKOH/g below g. When the amine value of the dispersant is not less than the above-mentioned lower limit and not more than the above-mentioned upper limit, the inkjet ejectability of the curable composition can be improved, a barrier wall with a larger aspect ratio can be formed, and the pot life can be improved. In terms of improving the inkjet dischargeability of the curable composition, forming a barrier wall with a larger aspect ratio, and improving the pot life, it is preferable that the acid value of the above-mentioned dispersant is not less than 10 mgKOH/g and not more than 100 mgKOH/g , the amine value of the above-mentioned dispersant is not less than 10 mgKOH/g and not more than 100 mgKOH/g.

<其他成分> 上述硬化性組合物可包含除上述成分以外之其他成分。上述其他成分並無特別限定,可例舉偶合劑等接著助劑、填料、調平劑、消泡劑及聚合抑制劑等。 <Other ingredients> The above-mentioned curable composition may contain other components other than the above-mentioned components. The above-mentioned other components are not particularly limited, and examples thereof include adhesive aids such as coupling agents, fillers, leveling agents, defoamers, and polymerization inhibitors.

(硬化性組合物之其他詳細情況) 上述硬化性組合物使用噴墨裝置進行塗佈,故而一般於25℃下為液態。上述硬化性組合物於25℃及10 rpm下之黏度較佳為3 mPa・s以上,更佳為5 mPa・s以上,進而較佳為10 mPa・s以上,進而更佳為160 mPa・s以上,且較佳為2000 mPa・s以下,更佳為1600 mPa・s以下,進而較佳為1500 mPa・s以下。就進一步提高硬化性組合物層之厚度精度,進而使硬化性組合物層更不易產生孔隙之觀點而言,上述硬化性組合物於25℃及10 rpm下之黏度特佳為160 mPa・s以上1600 mPa・s以下。 (Other details of curable composition) Since the curable composition is applied using an inkjet device, it is generally in a liquid state at 25°C. The viscosity of the above curable composition at 25°C and 10 rpm is preferably at least 3 mPa・s, more preferably at least 5 mPa・s, still more preferably at least 10 mPa・s, still more preferably 160 mPa・s Above, and preferably 2000 mPa・s or less, more preferably 1600 mPa・s or less, still more preferably 1500 mPa・s or less. From the perspective of further improving the thickness accuracy of the curable composition layer and making the curable composition layer less likely to generate pores, the viscosity of the above curable composition at 25°C and 10 rpm is preferably 160 mPa・s or more Below 1600 mPa・s.

上述黏度係依據JIS K2283並使用E型黏度計(例如東機產業公司製造之「TVE22L」)於25℃下測得。The above-mentioned viscosity is measured at 25° C. using an E-type viscometer (for example, “TVE22L” manufactured by Toki Sangyo Co., Ltd.) in accordance with JIS K2283.

使用上述硬化性組合物,可將第1構件與第2構件接著,且可形成阻隔壁。上述硬化性組合物較佳為塗佈於上述第1構件之第1表面上而使用。上述硬化性組合物較佳為以圍繞配置於上述第1構件之第1表面之發光構件之方式塗佈於上述第1構件之第1表面上而使用。上述硬化性組合物較佳為以框狀塗佈於第1構件之第1表面上而使用。上述硬化性組合物較佳為用以形成框狀阻隔壁。較佳為於上述框狀阻隔壁之內側存在發光構件。較佳為於上述阻隔壁之內側存在內部空間。較佳為於上述阻隔壁之內側存在空隙部。Using the curable composition described above, the first member and the second member can be bonded together, and a barrier wall can be formed. The above-mentioned curable composition is preferably used for coating on the first surface of the above-mentioned first member. The above-mentioned curable composition is preferably applied on the first surface of the first member so as to surround the light-emitting member arranged on the first surface of the first member. The above-mentioned curable composition is preferably used for coating on the first surface of the first member in a frame shape. The above curable composition is preferably used to form a frame-shaped barrier rib. Preferably, a light-emitting member exists inside the above-mentioned frame-shaped barrier rib. It is preferable that an internal space exists inside the above-mentioned barrier wall. It is preferable that a void portion exists inside the above-mentioned barrier wall.

再者,以下對上述第1構件、上述第2構件及上述發光構件之詳細情況進行敍述。In addition, the details of the above-mentioned first member, the above-mentioned second member, and the above-mentioned light emitting member will be described below.

(發光裝置及發光裝置之製造方法) 本發明之發光裝置具備第1構件、配置於上述第1構件之第1表面上之發光構件、及配置於上述第1構件之上述第1表面上之阻隔壁,上述阻隔壁為上述噴墨用及阻隔壁形成用硬化性組合物之硬化物。 (Light-emitting device and manufacturing method of light-emitting device) The light-emitting device of the present invention includes a first member, a light-emitting member arranged on the first surface of the first member, and a barrier wall arranged on the first surface of the first member, and the barrier wall is the inkjet. and a cured product of the curable composition for barrier rib formation.

上述發光裝置較佳為具備第2構件。於上述發光裝置中,較佳為上述阻隔壁將上述第1構件與上述第2構件接著。於上述發光裝置中,較佳為上述阻隔壁以圍繞上述發光構件之方式配置於上述第1構件之上述第1表面上。The light emitting device described above preferably includes a second member. In the above light-emitting device, it is preferable that the barrier ribs bond the first member and the second member together. In the above-mentioned light-emitting device, it is preferable that the barrier rib is arranged on the first surface of the first member so as to surround the light-emitting member.

上述發光裝置之製造方法較佳為包括以下步驟(1)~(4)。(1)塗佈步驟,其係使用噴墨裝置,將上述噴墨用及阻隔壁形成用硬化性組合物塗佈於配置有發光構件之第1構件之第1表面上,形成硬化性組合物層。(2)光硬化步驟,其係藉由光照射使上述硬化性組合物層進行硬化,形成B階段化物層。(3)配置步驟,其係於上述B階段化物層之與上述第1構件側相反之表面上配置第2構件。(4)熱硬化步驟,其係藉由加熱而使上述B階段化物層熱硬化。The manufacturing method of the above-mentioned light-emitting device preferably includes the following steps (1)-(4). (1) Coating step, which is to use an inkjet device to apply the above-mentioned curable composition for inkjet and barrier rib formation on the first surface of the first member on which the light emitting member is arranged to form a curable composition layer. (2) A photocuring step of curing the curable composition layer by light irradiation to form a B-staged layer. (3) An arranging step of arranging a second member on the surface of the B-stage compound layer opposite to the first member. (4) Thermal hardening step, which is to thermally harden the above-mentioned B-stage compound layer by heating.

以下,參照圖式對本發明之具體實施方式進行說明。再者,於以下圖式中,為了便於圖示,大小、厚度及形狀等有時與實際大小、厚度及形狀等不同。Hereinafter, specific embodiments of the present invention will be described with reference to the drawings. In addition, in the following drawings, for convenience of illustration, the size, thickness, shape, etc. may differ from the actual size, thickness, shape, etc. in some cases.

圖1(a)係模式地表示使用本發明之第1實施方式之噴墨用及阻隔壁形成用硬化性組合物所獲得之發光裝置的俯視圖,圖1(b)係模式地表示該發光裝置之剖面圖。圖1(b)係沿圖1(a)之I-I線之剖面圖。Fig. 1(a) is a plan view schematically showing a light emitting device obtained by using the curable composition for inkjet and barrier rib formation according to the first embodiment of the present invention, and Fig. 1(b) schematically shows the light emitting device The cross-sectional view. Fig. 1(b) is a sectional view along the I-I line of Fig. 1(a).

圖1所示之發光裝置10具備第1構件1、第2構件2、阻隔壁3及發光構件4。阻隔壁3為上述硬化性組合物之硬化物。阻隔壁3為上述硬化性組合物之光及熱硬化物。阻隔壁3將第1構件1之第1表面1a與第2構件2之第1表面2a接著。阻隔壁3配置於第1構件1之第1表面1a上及第2構件2之第1表面2a上。阻隔壁3以圍繞發光構件4之方式配置於第1構件1之第1表面1a上。阻隔壁3並未配置於發光構件4之表面上。阻隔壁3之形狀為框狀。利用由第1構件1、第2構件2及阻隔壁3所圍成之部分,形成有空間。A light emitting device 10 shown in FIG. 1 includes a first member 1 , a second member 2 , a barrier wall 3 , and a light emitting member 4 . The barrier wall 3 is a cured product of the above curable composition. The barrier rib 3 is a light and thermosetting product of the above-mentioned curable composition. The barrier wall 3 connects the first surface 1 a of the first member 1 and the first surface 2 a of the second member 2 . The barrier wall 3 is arranged on the first surface 1 a of the first member 1 and on the first surface 2 a of the second member 2 . The barrier wall 3 is disposed on the first surface 1 a of the first member 1 so as to surround the light emitting member 4 . The barrier wall 3 is not disposed on the surface of the light emitting member 4 . The shape of the barrier wall 3 is a frame shape. A space is formed by the portion surrounded by the first member 1 , the second member 2 and the barrier wall 3 .

參照圖2(a)~(c)及圖3(d)~(f),對圖1所示之發光裝置之製造方法之一例進行說明。An example of a method of manufacturing the light-emitting device shown in FIG. 1 will be described with reference to FIGS. 2( a ) to ( c ) and FIGS. 3( d ) to ( f ).

首先,如圖2(a)所示,使用噴墨裝置,將硬化性組合物塗佈於配置有發光構件4之第1構件1之第1表面1a上,形成硬化性組合物層3A(塗佈步驟)。於第1構件1之上表面塗佈硬化性組合物,形成硬化性組合物層3A。自噴墨裝置之噴出部51噴出硬化性組合物。First, as shown in FIG. 2( a), the curable composition is coated on the first surface 1 a of the first member 1 on which the light-emitting member 4 is disposed using an inkjet device to form a curable composition layer 3A (coated with a curable composition). cloth step). A curable composition is applied on the upper surface of the first member 1 to form a curable composition layer 3A. The curable composition is ejected from the ejection unit 51 of the inkjet device.

繼而,如圖2(b)所示,自噴墨裝置之光照射部52對硬化性組合物層3A照射光,使硬化性組合物層3A進行硬化,形成B階段化物層3B(光硬化步驟)。B階段化物層3B為硬化性組合物之預備硬化物層。Then, as shown in FIG. 2( b), the curable composition layer 3A is irradiated with light from the light irradiation unit 52 of the inkjet device to harden the curable composition layer 3A to form a B-staged layer 3B (photocuring step ). The B-stage compound layer 3B is a pre-cured layer of the curable composition.

再者,於上述發光裝置之製造方法中,可於特定區域塗佈硬化性組合物後,向所塗佈之硬化性組合物整體照射光而形成B階段化物層。於上述發光裝置之製造方法中,可在每塗佈複數滴硬化性組合物時,對所塗佈之硬化性組合物照射光而形成B階段化物層。於上述發光裝置之製造方法中,可在每塗佈1滴硬化性組合物時,對所塗佈之硬化性組合物照射光而形成B階段化物層。Furthermore, in the above-mentioned method of manufacturing a light-emitting device, after the curable composition is applied to a specific region, the entire applied curable composition may be irradiated with light to form a B-staged layer. In the above-mentioned method for producing a light-emitting device, each time a plurality of drops of the curable composition is applied, the applied curable composition may be irradiated with light to form a B-staged layer. In the above-mentioned method for producing a light-emitting device, each time a drop of the curable composition is applied, the applied curable composition may be irradiated with light to form a B-staged layer.

於上述光硬化步驟後,判斷是否需要重複上述塗佈步驟及上述光硬化步驟。於需要重複上述塗佈步驟及上述光硬化步驟之情形時,在所形成之B階段化物層之與第1構件側相反之表面側塗佈硬化性組合物。After the photohardening step, it is judged whether it is necessary to repeat the coating step and the photohardening step. When it is necessary to repeat the above-mentioned coating step and the above-mentioned photocuring step, the curable composition is applied to the surface side opposite to the first member side of the formed B-stage compound layer.

圖2(c)及圖3(d)分別為表示第2次塗佈步驟及第2次光硬化步驟之圖。如圖2(c)所示,使用噴墨裝置於B階段化物層3B之與第1構件1側相反之表面上塗佈硬化性組合物,從而於B階段化物層3B之表面上形成硬化性組合物層3A。繼而,如圖3(d)所示,自噴墨裝置之光照射部52對所塗佈之硬化性組合物層3A照射光,從而形成B階段化物層3B。FIG. 2(c) and FIG. 3(d) are diagrams showing the second coating step and the second photocuring step, respectively. As shown in FIG. 2(c), a curable composition is applied on the surface of the B-staged compound layer 3B opposite to the first member 1 using an inkjet device, thereby forming a curable composition on the surface of the B-staged compound layer 3B. Composition Layer 3A. Next, as shown in FIG. 3( d ), the applied curable composition layer 3A is irradiated with light from the light irradiation unit 52 of the inkjet device to form the B-staged compound layer 3B.

於圖2、3中,上述塗佈步驟及上述光硬化步驟於硬化性組合物層之厚度方向上進行2次,即圖2(a)及圖2(b)、圖2(c)及圖3(d)。藉由將上述塗佈步驟及上述光硬化步驟分別於硬化性組合物層之厚度方向上進行複數次,能夠增大B階段化物層之厚度,能夠增大B階段化物層之縱橫比(厚度/寬度)。上述塗佈步驟及上述光硬化步驟可分別進行2次以上,亦可分別進行3次以上。In Figures 2 and 3, the above-mentioned coating step and the above-mentioned photocuring step are carried out twice in the thickness direction of the curable composition layer, that is, Figure 2(a) and Figure 2(b), Figure 2(c) and Figure 2 3(d). By performing the above-mentioned coating step and the above-mentioned photocuring step multiple times in the thickness direction of the curable composition layer, the thickness of the B-staged layer can be increased, and the aspect ratio (thickness/ width). The above-mentioned coating step and the above-mentioned photocuring step may be performed two or more times, or three or more times.

藉由重複上述塗佈步驟及上述光硬化步驟,而形成以圍繞發光構件4之方式配置之B階段化物層3B。By repeating the above-mentioned coating step and the above-mentioned photocuring step, the B-staged compound layer 3B arranged so as to surround the light emitting member 4 is formed.

繼而,如圖3(e)所示,於以圍繞發光構件4之方式配置之B階段化物層3B之與第1構件1側相反之表面上配置第2構件2(配置步驟)。於形成為框狀之B階段化物層3B之表面上配置第2構件2。可於配置第2構件時施加壓力。Next, as shown in FIG. 3( e ), the second member 2 is arranged on the surface of the B-stage compound layer 3B arranged to surround the light-emitting member 4 , which is opposite to the first member 1 (arranging step). The second member 2 is disposed on the surface of the frame-shaped B-stage compound layer 3B. Pressure can be applied when placing the second member.

繼而,如圖3(f)所示,藉由加熱而使B階段化物層3B熱硬化(熱硬化步驟)。藉由對圖3(e)中所獲得之具備第1構件1、第2構件2及B階段化物層3B之積層構造體進行加熱,而使B階段化物層3B熱硬化。藉此,形成阻隔壁3。阻隔壁3為硬化性組合物之光及熱硬化物層。Next, as shown in FIG. 3( f ), the B-staged compound layer 3B is thermally hardened by heating (thermal hardening step). The B-stage compound layer 3B is thermally cured by heating the laminated structure including the first member 1 , the second member 2 , and the B-stage compound layer 3B obtained in FIG. 3( e ). Thereby, barrier rib 3 is formed. The barrier wall 3 is a light and thermosetting material layer of a curable composition.

以此方式,可獲得圖1所示之發光裝置10。In this way, the light emitting device 10 shown in FIG. 1 can be obtained.

於上述塗佈步驟中,就形成縱橫比更大之阻隔壁之觀點而言,較佳為一面使上述硬化性組合物循環,一面進行塗佈(噴出)。In the coating step, it is preferable to apply (discharge) while circulating the curable composition from the viewpoint of forming a barrier rib having a larger aspect ratio.

上述噴墨裝置並無特別限定,可使用可塗佈本發明之硬化性組合物之噴墨裝置。上述噴墨裝置較佳為具有:墨水匣,其貯存上述硬化性組合物;噴出部,其與上述墨水匣連接,且噴出上述硬化性組合物;及循環流路部,其一端連接於上述噴出部,另一端連接於上述墨水匣,且使上述硬化性組合物在內部流動。於該情形時,可提高上述硬化性組合物之噴墨噴出性,形成縱橫比更大之阻隔壁。The above-mentioned inkjet device is not particularly limited, and an inkjet device capable of coating the curable composition of the present invention can be used. The above-mentioned inkjet device preferably has: an ink cartridge storing the above-mentioned curable composition; a discharge part connected to the above-mentioned ink cartridge and ejecting the above-mentioned curable composition; part, and the other end is connected to the above-mentioned ink cartridge, and the above-mentioned curable composition flows inside. In this case, the inkjet discharge property of the said curable composition can be improved, and the barrier rib with a larger aspect ratio can be formed.

上述循環流路部可於循環流路部內具有緩衝槽及泵,亦可不具有緩衝槽及泵。上述循環流路部較佳為於上述循環流路部內具有上述緩衝槽,且較佳為具有上述泵。又,上述循環流路部除於上述循環流路部內具有緩衝槽及泵以外,還可具有流速計、溫度計、過濾器及液面感測器等。The circulation channel part may have a buffer tank and a pump in the circulation channel part, or may not have a buffer tank and a pump. It is preferable that the said circulation flow path part has the said buffer tank in the said circulation flow path part, and it is preferable to have the said pump. In addition, the circulation flow path may include a flow meter, a thermometer, a filter, a liquid level sensor, and the like in addition to the buffer tank and the pump in the circulation flow path.

就提高上述硬化性組合物之噴墨噴出性,形成縱橫比更大之阻隔壁之觀點而言,較佳為一面加熱上述硬化性組合物,一面使其循環。於一面加熱上述硬化性組合物,一面使其循環之情形時,可藉由向上述墨水匣內導入加熱器,或於上述循環流路部使用加熱器,來調節上述硬化性組合物之溫度。From the viewpoint of improving the inkjet dischargeability of the curable composition and forming barrier ribs with a larger aspect ratio, it is preferable to circulate the curable composition while heating it. When circulating the curable composition while heating, the temperature of the curable composition can be adjusted by introducing a heater into the ink cartridge or using a heater in the circulation flow path.

就提高上述硬化性組合物之噴墨噴出性,形成縱橫比更大之阻隔壁之觀點而言,所循環之上述硬化性組合物之溫度較佳為30℃以上,更佳為40℃以上,較佳為120℃以下,更佳為100℃以下。From the viewpoint of improving the inkjet dischargeability of the curable composition and forming barrier ribs with a larger aspect ratio, the temperature of the curable composition to be circulated is preferably 30°C or higher, more preferably 40°C or higher, Preferably it is below 120°C, more preferably below 100°C.

於上述光硬化步驟中,較佳為照射紫外線。上述光硬化步驟中之紫外線之照度及照射時間可根據硬化性組合物之組成及硬化性組合物之塗佈厚度而適宜地變更。上述光硬化步驟中之紫外線之照度例如可為1000 mW/cm 2以上,亦可為5000 mW/cm 2以上,且可為10000 mW/cm 2以下,亦可為8000 mW/cm 2以下。上述光硬化步驟中之紫外線之照射時間例如可為0.01秒以上,亦可為0.1秒以上,且可為400秒以下,亦可為100秒以下。 In the above-mentioned photocuring step, it is preferable to irradiate with ultraviolet rays. The illuminance and irradiation time of ultraviolet light in the above-mentioned photocuring step can be appropriately changed according to the composition of the curable composition and the coating thickness of the curable composition. The illuminance of ultraviolet rays in the photocuring step can be, for example, 1000 mW/cm 2 or more, 5000 mW/cm 2 or more, and can be 10000 mW/cm 2 or less, or 8000 mW/cm 2 or less. The irradiation time of the ultraviolet rays in the above-mentioned photocuring step may be, for example, 0.01 second or more, may be 0.1 second or longer, and may be 400 seconds or less, or may be 100 seconds or less.

於上述配置步驟中,較佳為於以圍繞發光構件之方式配置之上述B階段化物層之表面上配置上述第2構件。於上述配置步驟中,較佳為將形成為框狀之上述B階段化物層之表面與第2構件貼合。In the arranging step, it is preferable to arrange the second member on the surface of the B-stage compound layer arranged to surround the light emitting member. In the above arrangement step, it is preferable to bond the surface of the frame-shaped B-stage compound layer to the second member.

上述熱硬化步驟較佳為於上述配置步驟後進行。The above thermal hardening step is preferably performed after the above configuration step.

上述熱硬化步驟中之加熱溫度及加熱時間可根據硬化性組合物之組成及B階段化物層之厚度而適宜地變更。上述熱硬化步驟中之加熱溫度例如可為100℃以上,亦可為120℃以上,且可為250℃以下,亦可為200℃以下。上述熱硬化步驟中之加熱時間例如可為5分鐘以上,亦可為30分鐘以上,且可為600分鐘以下,亦可為300分鐘以下。The heating temperature and heating time in the above-mentioned thermosetting step can be appropriately changed according to the composition of the curable composition and the thickness of the B-staged layer. The heating temperature in the above-mentioned thermosetting step may be, for example, 100° C. or higher, or 120° C. or higher, and may be 250° C. or lower, or 200° C. or lower. The heating time in the above-mentioned thermosetting step may be, for example, not less than 5 minutes, not less than 30 minutes, not more than 600 minutes, or not more than 300 minutes.

上述阻隔壁之寬度、高度及形狀等可適宜地變更。The width, height, shape, etc. of the above-mentioned barrier ribs can be changed as appropriate.

上述阻隔壁之寬度較佳為5 μm以上,更佳為10 μm以上,進而較佳為25 μm以上,且較佳為300 μm以下,更佳為200 μm以下,進而較佳為100 μm以下。若上述阻隔壁之寬度為上述下限以上,則可提高阻隔壁之強度。若上述阻隔壁之寬度為上述上限以下,則可進一步使發光裝置小型化。若上述阻隔壁之寬度為上述下限以上,則可進一步提高紅外光遮蔽性。The width of the barrier rib is preferably at least 5 μm, more preferably at least 10 μm, still more preferably at least 25 μm, and more preferably at most 300 μm, more preferably at most 200 μm, even more preferably at most 100 μm. The intensity|strength of a barrier rib can be improved that the width|variety of the said barrier rib is more than the said minimum. The light-emitting device can be further miniaturized as the width of the said barrier rib is below the said upper limit. Infrared light shielding property can be further improved that the width|variety of the said barrier rib is more than the said minimum.

上述阻隔壁之高度較佳為50 μm以上,更佳為100 μm以上,進而較佳為200 μm以上,且較佳為3000 μm以下,更佳為2000 μm以下,進而較佳為1000 μm以下。若上述阻隔壁之高度為上述下限以上,則可形成縱橫比更大之阻隔壁。若上述阻隔壁之高度為上述上限以下,則可進一步使發光裝置小型化。又,若上述阻隔壁之高度為上述上限以下,則可有效抑制阻隔壁產生變形。The height of the barrier ribs is preferably at least 50 μm, more preferably at least 100 μm, further preferably at least 200 μm, and more preferably at most 3000 μm, more preferably at most 2000 μm, even more preferably at most 1000 μm. When the height of the said barrier rib is more than the said minimum, the barrier rib with a larger aspect ratio can be formed. When the height of the said barrier rib is below the said upper limit, a light-emitting device can be further miniaturized. Moreover, when the height of the said barrier rib is below the said upper limit, generation|occurrence|production of deformation|transformation of a barrier rib can be suppressed effectively.

上述阻隔壁之縱橫比(高度相對於寬度之比(高度/寬度))較佳為3以上,更佳為5以上,進而較佳為10以上,且較佳為100以下,更佳為50以下,進而較佳為30以下。若上述縱橫比(高度/寬度)為上述下限以上,則可進一步使發光裝置小型化。若上述縱橫比(高度/寬度)為上述上限以下,則可提高阻隔壁之強度。The aspect ratio (the ratio of height to width (height/width)) of the barrier rib is preferably 3 or more, more preferably 5 or more, further preferably 10 or more, and is preferably 100 or less, more preferably 50 or less , and more preferably 30 or less. When the said aspect ratio (height/width) is more than the said minimum, a light-emitting device can be further miniaturized. The strength of a barrier rib can be improved that the said aspect-ratio (height/width) is below the said upper limit.

作為上述第1構件,可例舉電路基板、半導體元件及矽基板等。As the above-mentioned first member, a circuit board, a semiconductor element, a silicon substrate, and the like may, for example, be mentioned.

作為上述第2構件,可例舉透明構件等。關於作為上述透明構件之上述第2構件,例如可例舉擴散玻璃及IR(infrared,紅外線)截止玻璃等透明玻璃構件等。上述第2構件較佳為透明玻璃構件。As said 2nd member, a transparent member etc. are mentioned. Regarding the above-mentioned second member as the above-mentioned transparent member, transparent glass members such as diffusion glass and IR (infrared, infrared) cut glass, etc. are mentioned, for example. The above-mentioned second member is preferably a transparent glass member.

上述發光構件較佳為可照射紅外光之發光構件。作為上述發光構件,可例舉3D(three-dimensional,三維)感測器光源等。The above light emitting member is preferably a light emitting member capable of irradiating infrared light. As the light emitting member, a 3D (three-dimensional, three-dimensional) sensor light source and the like may, for example, be mentioned.

以下,例舉實施例進一步對本發明進行詳細說明。本發明並不僅限定於以下實施例。Hereinafter, the present invention will be further described in detail by way of examples. The present invention is not limited to the following examples.

準備以下材料。Prepare the following materials.

((A)光硬化性化合物) 六官能(甲基)丙烯酸酯化合物:二季戊四醇六丙烯酸酯(DAICEL-ALLNEX公司製造之「DPHA」) 三官能(甲基)丙烯酸酯化合物:三羥甲基丙烷三丙烯酸酯(DAICEL-ALLNEX公司製造之「TMPTA」) 二官能(甲基)丙烯酸酯化合物1:乙氧化雙酚A二丙烯酸酯(新中村化學工業公司製造之「APG-700」,具有多元醇骨架之(甲基)丙烯酸酯化合物) 二官能(甲基)丙烯酸酯化合物2:三環癸烷二甲醇二丙烯酸酯(DAICEL-ALLNEX公司製造之「IRR214K」,具有二環戊二烯骨架之(甲基)丙烯酸酯化合物) 二官能(甲基)丙烯酸酯化合物3:1,6-己二醇二丙烯酸酯(DAICEL-ALLNEX公司製造之「HDDA」) ((A) Photocurable compound) Hexafunctional (meth)acrylate compound: dipentaerythritol hexaacrylate ("DPHA" manufactured by DAICEL-ALLNEX) Trifunctional (meth)acrylate compound: Trimethylolpropane triacrylate ("TMPTA" manufactured by DAICEL-ALLNEX) Difunctional (meth)acrylate compound 1: Ethoxylated bisphenol A diacrylate ("APG-700" manufactured by Shin-Nakamura Chemical Industry Co., Ltd., (meth)acrylate compound having a polyol skeleton) Difunctional (meth)acrylate compound 2: Tricyclodecane dimethanol diacrylate ("IRR214K" manufactured by DAICEL-ALLNEX, a (meth)acrylate compound having a dicyclopentadiene skeleton) Difunctional (meth)acrylate compound 3: 1,6-hexanediol diacrylate ("HDDA" manufactured by DAICEL-ALLNEX)

((B)熱硬化性化合物) (B1)光及熱硬化性化合物:4-羥基丁基(甲基)丙烯酸酯縮水甘油醚(三菱化學公司製造之「4HBAGE」) 二官能環氧化合物:雙酚A型環氧化合物(DIC公司製造之「850CRP」) ((B) thermosetting compound) (B1) Light and thermosetting compound: 4-hydroxybutyl (meth)acrylate glycidyl ether ("4HBAGE" manufactured by Mitsubishi Chemical Corporation) Difunctional epoxy compound: Bisphenol A type epoxy compound ("850CRP" manufactured by DIC Corporation)

((C)光硬化性化合物) 單官能(甲基)丙烯酸酯化合物:丙烯酸2-乙基己酯(日本觸媒公司製造之「2EHA」) ((C) photocurable compound) Monofunctional (meth)acrylate compound: 2-ethylhexyl acrylate ("2EHA" manufactured by Nippon Shokubai Co., Ltd.)

(光聚合起始劑) 2-(二甲基胺基)-2-[(4-甲基苯基)甲基]-1-[4-(4-𠰌啉基)苯基]-1-丁酮(IGM公司製造之「Irg379」) (photopolymerization initiator) 2-(Dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4-(4-metholinyl)phenyl]-1-butanone (manufactured by IGM "Irg379")

(熱硬化劑) 1,3-雙(3-胺基苯氧基)苯(三井化學公司製造之「APB-N」) 雙[4-(3-胺基苯氧基)苯基]碸(Seika公司製造之「BAPS-M」) 4,4'-二胺基-3,3'-二乙基-5,5'-二甲基二苯基甲烷(組合化學公司製造之「Curehard MED」) 雙氰胺(三菱化學公司製造之「DICY7」) (Thermohardener) 1,3-Bis(3-aminophenoxy)benzene ("APB-N" manufactured by Mitsui Chemicals Co., Ltd.) Bis[4-(3-aminophenoxy)phenyl]pyridine ("BAPS-M" manufactured by Seika Corporation) 4,4'-diamino-3,3'-diethyl-5,5'-dimethyldiphenylmethane ("Curehard MED" manufactured by Combination Chemicals Co., Ltd.) Dicyandiamide ("DICY7" manufactured by Mitsubishi Chemical Corporation)

(矽烷偶合劑) 3-縮水甘油氧基丙基甲基二甲氧基矽烷(信越化學工業公司製造之「KBM-402」) 3-縮水甘油氧基丙基甲基二乙氧基矽烷(信越化學工業公司製造之「KBE-402」) (silane coupling agent) 3-Glycidyloxypropylmethyldimethoxysilane ("KBM-402" manufactured by Shin-Etsu Chemical Co., Ltd.) 3-Glycidoxypropylmethyldiethoxysilane ("KBE-402" manufactured by Shin-Etsu Chemical Co., Ltd.)

(紅外光遮蔽劑) 酞菁釩錯合物(日本觸媒公司製造之「HA-1」) 酞菁銅錯合物(山田化學工業公司製造之「FDN-006」) 酞菁金屬錯合物(山田化學工業公司製造之「FDN-008」) 碳黑1(山陽色素公司製造之「SF Black BJ2296」,平均一次粒徑為35 nm) 碳黑2(三菱化學公司製造之「MA600」,平均一次粒徑為20 nm) 碳黑3(禦國色素公司製造之「PD-605」,平均一次粒徑為65 nm) 碳黑4(三菱化學公司製造之「#10」,平均一次粒徑為75 nm) 碳黑5(三菱化學公司製造之「#20」,平均一次粒徑為50 nm) 碳黑6(三菱化學公司製造之「#85」,平均一次粒徑為40 nm) 碳黑7(三菱化學公司製造之「MA220」,平均一次粒徑為55 nm) 碳黑8(三菱化學公司製造之「MCF88」,平均一次粒徑為18 nm) 碳黑9(三菱化學公司製造之「#850」,平均一次粒徑為17 nm) (infrared light shielding agent) Phthalocyanine vanadium complex ("HA-1" manufactured by Nippon Shokubai Co., Ltd.) Copper phthalocyanine complex ("FDN-006" manufactured by Yamada Chemical Industry Co., Ltd.) Phthalocyanine metal complex ("FDN-008" manufactured by Yamada Chemical Industry Co., Ltd.) Carbon black 1 ("SF Black BJ2296" manufactured by Sanyo Pigment Co., Ltd., with an average primary particle size of 35 nm) Carbon black 2 ("MA600" manufactured by Mitsubishi Chemical Corporation, the average primary particle size is 20 nm) Carbon black 3 ("PD-605" manufactured by Mikuni Pigment Co., Ltd., with an average primary particle size of 65 nm) Carbon black 4 ("#10" manufactured by Mitsubishi Chemical Corporation, the average primary particle size is 75 nm) Carbon black 5 ("#20" manufactured by Mitsubishi Chemical Corporation, the average primary particle size is 50 nm) Carbon black 6 ("#85" manufactured by Mitsubishi Chemical Corporation, the average primary particle size is 40 nm) Carbon black 7 ("MA220" manufactured by Mitsubishi Chemical Corporation, the average primary particle size is 55 nm) Carbon black 8 ("MCF88" manufactured by Mitsubishi Chemical Corporation, the average primary particle size is 18 nm) Carbon black 9 ("#850" manufactured by Mitsubishi Chemical Corporation, the average primary particle size is 17 nm)

(分散劑) 濕潤分散劑(BYK公司製造之「BYK9076」,酸值為38 mgKOH/g,胺值為44 mgKOH/g) 濕潤分散劑(BYK公司製造之「DISPERBYK-145」,酸值為76 mgKOH/g,胺值為71 mgKOH/g) 濕潤分散劑(共榮社化學公司製造之「Flowlen GW-1500」,酸值為55 mgKOH/g,胺值為0 mgKOH/g) 濕潤分散劑(BASF公司製造之「EfkaPX4701」,酸值為0 mgKOH/g,胺值為40 mgKOH/g) (Dispersant) Wetting and dispersing agent ("BYK9076" manufactured by BYK, acid value 38 mgKOH/g, amine value 44 mgKOH/g) Wetting and dispersing agent ("DISPERBYK-145" manufactured by BYK, acid value 76 mgKOH/g, amine value 71 mgKOH/g) Wetting and dispersing agent ("Flowlen GW-1500" manufactured by Kyoeisha Chemical Co., Ltd., acid value 55 mgKOH/g, amine value 0 mgKOH/g) Wetting and dispersing agent ("EfkaPX4701" manufactured by BASF, acid value 0 mgKOH/g, amine value 40 mgKOH/g)

(實施例1~40及比較例1、2) 以表1~9所示之調配量(純分量)調配表1~9所示之成分,混合均勻,從而獲得噴墨用及阻隔壁形成用硬化性組合物。 (Examples 1 to 40 and Comparative Examples 1 and 2) The components shown in Tables 1 to 9 were prepared in the compounding amounts (pure components) shown in Tables 1 to 9, and mixed uniformly to obtain curable compositions for inkjet and barrier rib formation.

(評價) (1)縱橫比較大之阻隔壁之形成性(1)寬度300 μm及高度1 mm之阻隔壁之形成性、2)寬度200 μm及高度1 mm之阻隔壁之形成性、以及3)寬度100 μm及高度1 mm之阻隔壁之形成性) 使用搭載有紫外線照射裝置之壓電方式噴墨印表機之噴墨頭,將所獲得之硬化性組合物塗佈於第1構件上(塗佈步驟)。繼而,向所塗佈之硬化性組合物照射紫外線而形成B階段化物層(光硬化步驟)。於所形成之B階段化物層之厚度方向上重複上述塗佈步驟及上述光硬化步驟。繼而,對所獲得之B階段化物層進行加熱而使其熱硬化,形成阻隔壁(光及熱硬化物層)(熱硬化步驟)。使用雷射顯微鏡(奧林巴斯公司製造之「OLS4100」),觀察阻隔壁之形狀。 (evaluate) (1) Formation of barrier ribs with large aspect ratio (1) Formation of barrier ribs with a width of 300 μm and a height of 1 mm, 2) Formation of barrier ribs with a width of 200 μm and a height of 1 mm, and 3) Formation of a barrier rib with a width of 100 μm Formability of barrier ribs with μm and height of 1 mm) The obtained curable composition was coated on the first member using an inkjet head of a piezoelectric inkjet printer equipped with an ultraviolet irradiation device (coating step). Next, ultraviolet rays are irradiated to the applied curable composition to form a B-staged compound layer (photocuring step). The above-mentioned coating step and the above-mentioned photocuring step are repeated in the thickness direction of the formed B-staged compound layer. Next, the obtained B-stage compound layer is heated and thermally cured to form barrier ribs (light and thermal cured layer) (thermal curing step). The shape of the barrier rib was observed using a laser microscope ("OLS4100" by Olympus Corporation).

如上所述,確認是否可形成1)寬度300 μm及高度1 mm之阻隔壁、2)寬度200 μm及高度1 mm之阻隔壁、3)寬度100 μm及高度1 mm之阻隔壁。再者,表中,「A」意指可形成具有上述形狀之阻隔壁,「B」意指無法形成具有上述形狀之阻隔壁。As described above, it was confirmed whether 1) a barrier rib with a width of 300 μm and a height of 1 mm, 2) a barrier rib with a width of 200 μm and a height of 1 mm, and 3) a barrier rib with a width of 100 μm and a height of 1 mm could be formed. In addition, in the table, "A" means that the barrier rib having the above-mentioned shape can be formed, and "B" means that the barrier rib having the above-mentioned shape cannot be formed.

(2)阻隔壁之紅外光遮蔽性 使用搭載有紫外線照射裝置之壓電方式噴墨印表機之噴墨頭,將所獲得之硬化性組合物塗佈於第1構件上(塗佈步驟)。繼而,向所塗佈之硬化性組合物照射紫外線而形成B階段化物層(光硬化步驟)。於所形成之B階段化物層之厚度方向上重複上述塗佈步驟及上述光硬化步驟。繼而,對所獲得之B階段化物層進行加熱而使其熱硬化(熱硬化步驟)。使用分光光度計(日立高新技術公司製造之「U-4100」),測定所獲得之光及熱硬化物層之波長950 nm之紅外線透過率(光程長度:100 μm)。 (2) Infrared light shielding property of the barrier wall The obtained curable composition was coated on the first member using an inkjet head of a piezoelectric inkjet printer equipped with an ultraviolet irradiation device (coating step). Next, ultraviolet rays are irradiated to the applied curable composition to form a B-staged compound layer (photocuring step). The above-mentioned coating step and the above-mentioned photocuring step are repeated in the thickness direction of the formed B-staged compound layer. Next, the obtained B-stage compound layer is heated and thermally cured (thermal curing step). Using a spectrophotometer ("U-4100" manufactured by Hitachi High-Tech Co., Ltd.), the obtained light and the infrared transmittance (optical path length: 100 μm) at a wavelength of 950 nm of the heat-cured layer were measured.

<阻隔壁之紅外光遮蔽性之判定基準> ○○:波長950 nm之紅外線透過率未達0.1% ○:波長950 nm之紅外線透過率為0.1%以上10%以下 ×:波長950 nm之紅外線透過率超過10% <Criteria for judging the infrared light shielding property of the barrier wall> ○○: Infrared transmittance of 950 nm wavelength is less than 0.1% ○: Infrared transmittance at wavelength 950 nm is 0.1% to 10% ×: The transmittance of infrared rays with a wavelength of 950 nm exceeds 10%

(3)接著對象構件與阻隔壁之接著性 準備玻璃基板(5 cm×5 cm)作為接著對象構件。於玻璃基板上,使用搭載有紫外線照射裝置之壓電方式噴墨印表機之噴墨頭,將所獲得之硬化性組合物塗佈於玻璃基板上(塗佈步驟)。繼而,向所塗佈之硬化性組合物照射紫外線而形成B階段化物層(光硬化步驟)。於所形成之B階段化物層之厚度方向上重複上述塗佈步驟及上述光硬化步驟。繼而,對所獲得之B階段化物層進行加熱而使其熱硬化,形成高度150 μm之阻隔壁(光及熱硬化物層)(熱硬化步驟)。於所獲得之阻隔壁中,以1 mm間隔於縱向及橫向上切出切口,製作100個方格。使用雷射顯微鏡(奧林巴斯公司製造之「OLS4100」),觀察阻隔壁之各方格,並基於下述基準判定接著對象構件與阻隔壁之接著性。 (3) Adhesion between the target member and the barrier wall A glass substrate (5 cm x 5 cm) was prepared as a member to be bonded. On the glass substrate, the obtained curable composition was coated on the glass substrate using an inkjet head of a piezoelectric inkjet printer equipped with an ultraviolet irradiation device (coating step). Next, ultraviolet rays are irradiated to the applied curable composition to form a B-staged compound layer (photocuring step). The above-mentioned coating step and the above-mentioned photocuring step are repeated in the thickness direction of the formed B-staged compound layer. Next, the obtained B-stage compound layer was heated and thermally cured to form barrier ribs (light and thermal curable layer) with a height of 150 μm (thermal curing step). In the obtained barrier rib, incisions were made in the vertical and horizontal directions at intervals of 1 mm to make 100 squares. Each grid of the barrier rib was observed using a laser microscope ("OLS4100" manufactured by Olympus Corporation), and the adhesion between the bonding object member and the barrier rib was determined based on the following criteria.

[接著對象構件與阻隔壁之接著性之判定基準] ○○:阻隔壁剝離之方格數為0~10個 〇:阻隔壁剝離之方格數為11~30個 ×:阻隔壁剝離之方格數為31個以上 [Criteria for judging the adhesion between the target member and the barrier wall] ○○: The number of squares where the barrier wall is peeled off is 0 to 10 〇: The number of squares where the barrier wall is peeled off is 11 to 30 ×: The number of squares where the barrier wall is peeled off is 31 or more

(4)噴墨噴出性 進行自搭載有紫外線照射裝置之壓電方式噴墨印表機之噴墨頭噴出所獲得之硬化性組合物之試驗。基於下述基準判定噴墨噴出性。 (4) Inkjet ejectability A test was performed in which the obtained curable composition was ejected from the inkjet head of a piezoelectric inkjet printer equipped with an ultraviolet irradiation device. Inkjet discharge properties were judged based on the following criteria.

[噴墨噴出性之判定基準] A:可連續100小時以上無噴出不均地噴出硬化性組合物 B:可於10小時之連續噴出期間無噴出不均地噴出硬化性組合物,但於10小時以上且未達100小時之連續噴出期間稍微產生噴出不均 C:可連續10小時以上噴出硬化性組合物,但於10小時之連續噴出期間稍微產生噴出不均 D:可噴出硬化性組合物,但無法連續噴出10小時以上 E:可噴出硬化性組合物,但於初始階段具有噴出不均 F:於噴出硬化性組合物之初始階段無法噴出 [Judgment criteria for inkjet ejection performance] A: The curable composition can be sprayed continuously for more than 100 hours without uneven spraying B: The curable composition can be sprayed without unevenness during the continuous spraying period of 10 hours, but slightly uneven discharge occurs during the continuous spraying period of more than 10 hours and less than 100 hours C: The curable composition can be sprayed continuously for more than 10 hours, but the spraying is slightly uneven during the continuous spraying period of 10 hours D: The curable composition can be ejected, but cannot be ejected continuously for more than 10 hours E: The curable composition can be ejected, but the ejection is uneven at the initial stage F: Cannot be sprayed at the initial stage of spraying the curable composition

將組成及結果示於下述表1~9。The compositions and results are shown in Tables 1 to 9 below.

[表1]    實施例1 實施例2 實施例3 實施例4 實施例5 調配成分(重量份) (A)光硬化性化合物 六官能(甲基)丙烯酸酯化合物 DPHA    10 10 10 10 三官能(甲基)丙烯酸酯化合物 TMPTA                二官能(甲基)丙烯酸酯化合物1 APG-700                二官能(甲基)丙烯酸酯化合物2 IRR214K    10 10 10 10 二官能(甲基)丙烯酸酯化合物3 HDDA 30             (C)光硬化性化合物 單官能(甲基)丙烯酸酯化合物 2EHA 30 10 10 10 10 (B)熱硬化性化合物 (B1)光及熱硬化性化合物 4HBAGE    40 40 40 40 二官能環氧化合物 850CRP 20             熱硬化劑 APB-N 9 20 20 20 20 BAPS-M                Curehard MED                DICY7                矽烷偶合劑 KBM-402 0.5 0.5 0.5 0.5 0.5 KBE-402 0.5 0.5 0.5 0.5 0.5 光聚合起始劑 Irg379 9 8 8 8 8 分散劑 BYK-9076                DISPERBYK-145                Flowlen GW-1500                EfkaPX4701                紅外光遮蔽劑 酞菁釩錯合物 HA-1 1 1       1.5 酞菁銅錯合物 FDN-006       1       酞菁金屬錯合物 FDN-008          1    碳黑1 SF Black BJ2296                碳黑2 MA600                碳黑3 PD-605                碳黑4 #10                碳黑5 #20                碳黑6 #85                碳黑7 MA220                碳黑8 MCF88                碳黑9 #850                評價 1)寬度300 μm及高度1 mm之阻隔壁之形成性 A A A A A 2)寬度200 μm及高度1 mm之阻隔壁之形成性 B A A A A 3)寬度100 μm及高度1 mm之阻隔壁之形成性 B A A A A 接著對象構件與阻隔壁之接著性 〇〇 阻隔壁之紅外光遮蔽性 〇〇 噴墨噴出性 A A A A A [Table 1] Example 1 Example 2 Example 3 Example 4 Example 5 Deployment ingredients (weight parts) (A) Photocurable compound Hexafunctional (meth)acrylate compound DPHA 10 10 10 10 Trifunctional (meth)acrylate compound TMPTA Difunctional (meth)acrylate compound 1 APG-700 Difunctional (meth)acrylate compound 2 IRR214K 10 10 10 10 Difunctional (meth)acrylate compound 3 HDDA 30 (C) Photocurable compound Monofunctional (meth)acrylate compounds 2EHA 30 10 10 10 10 (B) Thermosetting compound (B1) Light and thermosetting compounds 4HBAGE 40 40 40 40 Difunctional epoxy compound 850CRP 20 heat hardener APB-N 9 20 20 20 20 BAPS-M Curehard MED DICY7 Silane coupling agent KBM-402 0.5 0.5 0.5 0.5 0.5 KBE-402 0.5 0.5 0.5 0.5 0.5 Photopolymerization initiator Irg379 9 8 8 8 8 Dispersant BYK-9076 DISPERBYK-145 Flowlen GW-1500 EfkaPX4701 Infrared light shielding agent Phthalocyanine Vanadium Complex HA-1 1 1 1.5 copper phthalocyanine complex FDN-006 1 Phthalocyanine metal complexes FDN-008 1 carbon black 1 SF Black BJ2296 carbon black 2 MA600 carbon black 3 PD-605 carbon black 4 #10 carbon black 5 #20 carbon black 6 #85 carbon black 7 MA220 carbon black 8 MCF88 carbon black 9 #850 evaluate 1) Formability of barrier ribs with a width of 300 μm and a height of 1 mm A A A A A 2) Formability of barrier ribs with a width of 200 μm and a height of 1 mm B A A A A 3) Formability of barrier ribs with a width of 100 μm and a height of 1 mm B A A A A Adhesion between the object component and the barrier wall 〇〇 Infrared light shielding property of the barrier wall 〇〇 Inkjet Discharge A A A A A

[表2]    實施例6 實施例7 實施例8 實施例9 實施例10 調配成分(重量份) (A)光硬化性化合物 六官能(甲基)丙烯酸酯化合物 DPHA 10 10 10 10    三官能(甲基)丙烯酸酯化合物 TMPTA                二官能(甲基)丙烯酸酯化合物1 APG-700             20 二官能(甲基)丙烯酸酯化合物2 IRR214K 10 10 10 10    二官能(甲基)丙烯酸酯化合物3 HDDA             10 (C)光硬化性化合物 單官能(甲基)丙烯酸酯化合物 2EHA 10 10 10 10 30 (B)熱硬化性化合物 (B1)光及熱硬化性化合物 4HBAGE 40 40 40 40    二官能環氧化合物 850CRP             20 熱硬化劑 APB-N 20 20 20 20 9 BAPS-M                Curehard MED                DICY7                矽烷偶合劑 KBM-402 0.5 0.5 0.5 0.5 0.5 KBE-402 0.5 0.5 0.5 0.5 0.5 光聚合起始劑 Irg379 8 8 8 8 9 分散劑 BYK-9076                DISPERBYK-145                Flowlen GW-1500                EfkaPX4701                紅外光遮蔽劑 酞菁釩錯合物 HA-1             1 酞菁銅錯合物 FDN-006                酞菁金屬錯合物 FDN-008                碳黑1 SF Black BJ2296 1       1.5    碳黑2 MA600    1          碳黑3 PD-605       1       碳黑4 #10                碳黑5 #20                碳黑6 #85                碳黑7 MA220                碳黑8 MCF88                碳黑9 #850                評價 1)寬度300 μm及高度1 mm之阻隔壁之形成性 A A A A A 2)寬度200 μm及高度1 mm之阻隔壁之形成性 A A A B B 3)寬度100 μm及高度1 mm之阻隔壁之形成性 B B B B B 接著對象構件與阻隔壁之接著性 〇〇 阻隔壁之紅外光遮蔽性 〇〇 噴墨噴出性 C C C C A [Table 2] Example 6 Example 7 Example 8 Example 9 Example 10 Deployment ingredients (weight parts) (A) Photocurable compound Hexafunctional (meth)acrylate compound DPHA 10 10 10 10 Trifunctional (meth)acrylate compound TMPTA Difunctional (meth)acrylate compound 1 APG-700 20 Difunctional (meth)acrylate compound 2 IRR214K 10 10 10 10 Difunctional (meth)acrylate compound 3 HDDA 10 (C) Photocurable compound Monofunctional (meth)acrylate compounds 2EHA 10 10 10 10 30 (B) Thermosetting compound (B1) Light and thermosetting compounds 4HBAGE 40 40 40 40 Difunctional epoxy compound 850CRP 20 heat hardener APB-N 20 20 20 20 9 BAPS-M Curehard MED DICY7 Silane coupling agent KBM-402 0.5 0.5 0.5 0.5 0.5 KBE-402 0.5 0.5 0.5 0.5 0.5 Photopolymerization initiator Irg379 8 8 8 8 9 Dispersant BYK-9076 DISPERBYK-145 Flowlen GW-1500 EfkaPX4701 Infrared light shielding agent Phthalocyanine Vanadium Complex HA-1 1 copper phthalocyanine complex FDN-006 Phthalocyanine metal complexes FDN-008 carbon black 1 SF Black BJ2296 1 1.5 carbon black 2 MA600 1 carbon black 3 PD-605 1 carbon black 4 #10 carbon black 5 #20 carbon black 6 #85 carbon black 7 MA220 carbon black 8 MCF88 carbon black 9 #850 evaluate 1) Formability of barrier ribs with a width of 300 μm and a height of 1 mm A A A A A 2) Formability of barrier ribs with a width of 200 μm and a height of 1 mm A A A B B 3) Formability of barrier ribs with a width of 100 μm and a height of 1 mm B B B B B Adhesion between the object component and the barrier wall 〇〇 Infrared light shielding property of the barrier wall 〇〇 Inkjet Discharge C C C C A

[表3]    實施例11 實施例12 實施例13 實施例14 實施例15 調配成分(重量份) (A)光硬化性化合物 六官能(甲基)丙烯酸酯化合物 DPHA                三官能(甲基)丙烯酸酯化合物 TMPTA          10 10 二官能(甲基)丙烯酸酯化合物1 APG-700    15          二官能(甲基)丙烯酸酯化合物2 IRR214K 20 15 30       二官能(甲基)丙烯酸酯化合物3 HDDA 10       20 20 (C)光硬化性化合物 單官能(甲基)丙烯酸酯化合物 2EHA 30 30 15 30 15 (B)熱硬化性化合物 (B1)光及熱硬化性化合物 4HBAGE       30    15 二官能環氧化合物 850CRP 20 20    20 15 熱硬化劑 APB-N 9 9 15 9 15 BAPS-M                Curehard MED                DICY7                矽烷偶合劑 KBM-402 0.5 0.5 0.5 0.5 0.5 KBE-402 0.5 0.5 0.5 0.5 0.5 光聚合起始劑 Irg379 9 9 8 9 8 分散劑 BYK-9076                DISPERBYK-145                Flowlen GW-1500                EfkaPX4701                紅外光遮蔽劑 酞菁釩錯合物 HA-1          1    酞菁銅錯合物 FDN-006             1 酞菁金屬錯合物 FDN-008       1       碳黑1 SF Black BJ2296                碳黑2 MA600 1             碳黑3 PD-605    1          碳黑4 #10                碳黑5 #20                碳黑6 #85                碳黑7 MA220                碳黑8 MCF88                碳黑9 #850                評價 1)寬度300 μm及高度1 mm之阻隔壁之形成性 A A A A A 2)寬度200 μm及高度1 mm之阻隔壁之形成性 B B A A A 3)寬度100 μm及高度1 mm之阻隔壁之形成性 B B B B B 接著對象構件與阻隔壁之接著性 〇〇 〇〇 〇〇 〇〇 〇〇 阻隔壁之紅外光遮蔽性 噴墨噴出性 A A A A A [table 3] Example 11 Example 12 Example 13 Example 14 Example 15 Deployment ingredients (weight parts) (A) Photocurable compound Hexafunctional (meth)acrylate compound DPHA Trifunctional (meth)acrylate compound TMPTA 10 10 Difunctional (meth)acrylate compound 1 APG-700 15 Difunctional (meth)acrylate compound 2 IRR214K 20 15 30 Difunctional (meth)acrylate compound 3 HDDA 10 20 20 (C) Photocurable compound Monofunctional (meth)acrylate compounds 2EHA 30 30 15 30 15 (B) Thermosetting compound (B1) Light and thermosetting compounds 4HBAGE 30 15 Difunctional epoxy compound 850CRP 20 20 20 15 heat hardener APB-N 9 9 15 9 15 BAPS-M Curehard MED DICY7 Silane coupling agent KBM-402 0.5 0.5 0.5 0.5 0.5 KBE-402 0.5 0.5 0.5 0.5 0.5 Photopolymerization initiator Irg379 9 9 8 9 8 Dispersant BYK-9076 DISPERBYK-145 Flowlen GW-1500 EfkaPX4701 Infrared light shielding agent Phthalocyanine Vanadium Complex HA-1 1 copper phthalocyanine complex FDN-006 1 Phthalocyanine metal complexes FDN-008 1 carbon black 1 SF Black BJ2296 carbon black 2 MA600 1 carbon black 3 PD-605 1 carbon black 4 #10 carbon black 5 #20 carbon black 6 #85 carbon black 7 MA220 carbon black 8 MCF88 carbon black 9 #850 evaluate 1) Formability of barrier ribs with a width of 300 μm and a height of 1 mm A A A A A 2) Formability of barrier ribs with a width of 200 μm and a height of 1 mm B B A A A 3) Formability of barrier ribs with a width of 100 μm and a height of 1 mm B B B B B Adhesion between the object component and the barrier wall 〇〇 〇〇 〇〇 〇〇 〇〇 Infrared light shielding property of the barrier wall Inkjet Discharge A A A A A

[表4]    實施例16 實施例17 實施例18 實施例19 實施例20 調配成分(重量份) (A)光硬化性化合物 六官能(甲基)丙烯酸酯化合物 DPHA 10 10 10 10 10 三官能(甲基)丙烯酸酯化合物 TMPTA                二官能(甲基)丙烯酸酯化合物1 APG-700                二官能(甲基)丙烯酸酯化合物2 IRR214K 9 10 10 10 10 二官能(甲基)丙烯酸酯化合物3 HDDA                (C)光硬化性化合物 單官能(甲基)丙烯酸酯化合物 2EHA 40 10 10 10 10 (B)熱硬化性化合物 (B1)光及熱硬化性化合物 4HBAGE    40 40 40 40 二官能環氧化合物 850CRP 20             熱硬化劑 APB-N 9 20 20    20 BAPS-M          20    Curehard MED                DICY7                矽烷偶合劑 KBM-402 0.5 0.5 0.5 0.5 0.5 KBE-402 0.5 0.5 0.5 0.5 0.5 光聚合起始劑 Irg379 10 8 8 8 8 分散劑 BYK-9076                DISPERBYK-145                Flowlen GW-1500                EfkaPX4701                紅外光遮蔽劑 酞菁釩錯合物 HA-1 1 1          酞菁銅錯合物 FDN-006                酞菁金屬錯合物 FDN-008                碳黑1 SF Black BJ2296                碳黑2 MA600                碳黑3 PD-605                碳黑4 #10       0.5 0.5    碳黑5 #20             0.5 碳黑6 #85                碳黑7 MA220                碳黑8 MCF88                碳黑9 #850                評價 1)寬度300 μm及高度1 mm之阻隔壁之形成性 A A A A A 2)寬度200 μm及高度1 mm之阻隔壁之形成性 A A A A A 3)寬度100 μm及高度1 mm之阻隔壁之形成性 A A B B B 接著對象構件與阻隔壁之接著性 〇〇 阻隔壁之紅外光遮蔽性 噴墨噴出性 A A C C C [Table 4] Example 16 Example 17 Example 18 Example 19 Example 20 Deployment ingredients (weight parts) (A) Photocurable compound Hexafunctional (meth)acrylate compound DPHA 10 10 10 10 10 Trifunctional (meth)acrylate compound TMPTA Difunctional (meth)acrylate compound 1 APG-700 Difunctional (meth)acrylate compound 2 IRR214K 9 10 10 10 10 Difunctional (meth)acrylate compound 3 HDDA (C) Photocurable compound Monofunctional (meth)acrylate compounds 2EHA 40 10 10 10 10 (B) Thermosetting compound (B1) Light and thermosetting compounds 4HBAGE 40 40 40 40 Difunctional epoxy compound 850CRP 20 heat hardener APB-N 9 20 20 20 BAPS-M 20 Curehard MED DICY7 Silane coupling agent KBM-402 0.5 0.5 0.5 0.5 0.5 KBE-402 0.5 0.5 0.5 0.5 0.5 Photopolymerization initiator Irg379 10 8 8 8 8 Dispersant BYK-9076 DISPERBYK-145 Flowlen GW-1500 EfkaPX4701 Infrared light shielding agent Phthalocyanine Vanadium Complex HA-1 1 1 copper phthalocyanine complex FDN-006 Phthalocyanine metal complexes FDN-008 carbon black 1 SF Black BJ2296 carbon black 2 MA600 carbon black 3 PD-605 carbon black 4 #10 0.5 0.5 carbon black 5 #20 0.5 carbon black 6 #85 carbon black 7 MA220 carbon black 8 MCF88 carbon black 9 #850 evaluate 1) Formability of barrier ribs with a width of 300 μm and a height of 1 mm A A A A A 2) Formability of barrier ribs with a width of 200 μm and a height of 1 mm A A A A A 3) Formability of barrier ribs with a width of 100 μm and a height of 1 mm A A B B B Adhesion between the object component and the barrier wall 〇〇 Infrared light shielding property of the barrier wall Inkjet Discharge A A C C C

[表5]    實施例21 實施例22 實施例23 實施例24 實施例25 調配成分(重量份) (A)光硬化性化合物 六官能(甲基)丙烯酸酯化合物 DPHA 10 10 10 10 10 三官能(甲基)丙烯酸酯化合物 TMPTA                二官能(甲基)丙烯酸酯化合物1 APG-700                二官能(甲基)丙烯酸酯化合物2 IRR214K 10 10 10 10 10 二官能(甲基)丙烯酸酯化合物3 HDDA                (C)光硬化性化合物 單官能(甲基)丙烯酸酯化合物 2EHA 10 10 10 10 10 (B)熱硬化性化合物 (B1)光及熱硬化性化合物 4HBAGE 40 40 40 40 40 二官能環氧化合物 850CRP                熱硬化劑 APB-N 20 20 20 20 20 BAPS-M                Curehard MED                DICY7                矽烷偶合劑 KBM-402 0.5 0.5 0.5 0.5 0.5 KBE-402 0.5 0.5 0.5 0.5 0.5 光聚合起始劑 Irg379 8 8 8 8 8 分散劑 BYK-9076             0.5 DISPERBYK-145                Flowlen GW-1500                EfkaPX4701                紅外光遮蔽劑 酞菁釩錯合物 HA-1                酞菁銅錯合物 FDN-006                酞菁金屬錯合物 FDN-008                碳黑1 SF Black BJ2296                碳黑2 MA600                碳黑3 PD-605                碳黑4 #10             0.5 碳黑5 #20                碳黑6 #85 0.5             碳黑7 MA220    0.5          碳黑8 MCF88       0.5       碳黑9 #850          0.5    評價 1)寬度300 μm及高度1 mm之阻隔壁之形成性 A A A A A 2)寬度200 μm及高度1 mm之阻隔壁之形成性 A A A A A 3)寬度100 μm及高度1 mm之阻隔壁之形成性 B B B B B 接著對象構件與阻隔壁之接著性 阻隔壁之紅外光遮蔽性 噴墨噴出性 C C D D A [table 5] Example 21 Example 22 Example 23 Example 24 Example 25 Deployment ingredients (weight parts) (A) Photocurable compound Hexafunctional (meth)acrylate compound DPHA 10 10 10 10 10 Trifunctional (meth)acrylate compound TMPTA Difunctional (meth)acrylate compound 1 APG-700 Difunctional (meth)acrylate compound 2 IRR214K 10 10 10 10 10 Difunctional (meth)acrylate compound 3 HDDA (C) Photocurable compound Monofunctional (meth)acrylate compounds 2EHA 10 10 10 10 10 (B) Thermosetting compound (B1) Light and thermosetting compounds 4HBAGE 40 40 40 40 40 Difunctional epoxy compound 850CRP heat hardener APB-N 20 20 20 20 20 BAPS-M Curehard MED DICY7 Silane coupling agent KBM-402 0.5 0.5 0.5 0.5 0.5 KBE-402 0.5 0.5 0.5 0.5 0.5 Photopolymerization initiator Irg379 8 8 8 8 8 Dispersant BYK-9076 0.5 DISPERBYK-145 Flowlen GW-1500 EfkaPX4701 Infrared light shielding agent Phthalocyanine Vanadium Complex HA-1 copper phthalocyanine complex FDN-006 Phthalocyanine metal complexes FDN-008 carbon black 1 SF Black BJ2296 carbon black 2 MA600 carbon black 3 PD-605 carbon black 4 #10 0.5 carbon black 5 #20 carbon black 6 #85 0.5 carbon black 7 MA220 0.5 carbon black 8 MCF88 0.5 carbon black 9 #850 0.5 evaluate 1) Formability of barrier ribs with a width of 300 μm and a height of 1 mm A A A A A 2) Formability of barrier ribs with a width of 200 μm and a height of 1 mm A A A A A 3) Formability of barrier ribs with a width of 100 μm and a height of 1 mm B B B B B Adhesion between the object component and the barrier wall Infrared light shielding property of the barrier wall Inkjet Discharge C C D. D. A

[表6]    實施例26 實施例27 實施例28 實施例29 實施例30 調配成分(重量份) (A)光硬化性化合物 六官能(甲基)丙烯酸酯化合物 DPHA 10 10 10 10 10 三官能(甲基)丙烯酸酯化合物 TMPTA                二官能(甲基)丙烯酸酯化合物1 APG-700                二官能(甲基)丙烯酸酯化合物2 IRR214K 10 10 10 10 10 二官能(甲基)丙烯酸酯化合物3 HDDA                (C)光硬化性化合物 單官能(甲基)丙烯酸酯化合物 2EHA 10 10 10 10 10 (B)熱硬化性化合物 (B1)光及熱硬化性化合物 4HBAGE 40 40 40 40 40 二官能環氧化合物 850CRP                熱硬化劑 APB-N    20 20 20    BAPS-M 20             Curehard MED             20 DICY7                矽烷偶合劑 KBM-402 0.5 0.5 0.5 0.5 0.5 KBE-402 0.5 0.5 0.5 0.5 0.5 光聚合起始劑 Irg379 8 8 8 8 8 分散劑 BYK-9076 0.5             DISPERBYK-145    0.5          Flowlen GW-1500       0.5       EfkaPX4701          0.5    紅外光遮蔽劑 酞菁釩錯合物 HA-1                酞菁銅錯合物 FDN-006                酞菁金屬錯合物 FDN-008                碳黑1 SF Black BJ2296                碳黑2 MA600                碳黑3 PD-605                碳黑4 #10 0.5 0.5 0.5 0.5 0.5 碳黑5 #20                碳黑6 #85                碳黑7 MA220                碳黑8 MCF88                碳黑9 #850                評價 1)寬度300 μm及高度1 mm之阻隔壁之形成性 A A A A A 2)寬度200 μm及高度1 mm之阻隔壁之形成性 A A A A A 3)寬度100 μm及高度1 mm之阻隔壁之形成性 B B B B B 接著對象構件與阻隔壁之接著性 阻隔壁之紅外光遮蔽性 噴墨噴出性 A A B B D [Table 6] Example 26 Example 27 Example 28 Example 29 Example 30 Deployment ingredients (weight parts) (A) Photocurable compound Hexafunctional (meth)acrylate compound DPHA 10 10 10 10 10 Trifunctional (meth)acrylate compound TMPTA Difunctional (meth)acrylate compound 1 APG-700 Difunctional (meth)acrylate compound 2 IRR214K 10 10 10 10 10 Difunctional (meth)acrylate compound 3 HDDA (C) Photocurable compound Monofunctional (meth)acrylate compounds 2EHA 10 10 10 10 10 (B) Thermosetting compound (B1) Light and thermosetting compounds 4HBAGE 40 40 40 40 40 Difunctional epoxy compound 850CRP heat hardener APB-N 20 20 20 BAPS-M 20 Curehard MED 20 DICY7 Silane coupling agent KBM-402 0.5 0.5 0.5 0.5 0.5 KBE-402 0.5 0.5 0.5 0.5 0.5 Photopolymerization initiator Irg379 8 8 8 8 8 Dispersant BYK-9076 0.5 DISPERBYK-145 0.5 Flowlen GW-1500 0.5 EfkaPX4701 0.5 Infrared light shielding agent Phthalocyanine Vanadium Complex HA-1 copper phthalocyanine complex FDN-006 Phthalocyanine metal complexes FDN-008 carbon black 1 SF Black BJ2296 carbon black 2 MA600 carbon black 3 PD-605 carbon black 4 #10 0.5 0.5 0.5 0.5 0.5 carbon black 5 #20 carbon black 6 #85 carbon black 7 MA220 carbon black 8 MCF88 carbon black 9 #850 evaluate 1) Formability of barrier ribs with a width of 300 μm and a height of 1 mm A A A A A 2) Formability of barrier ribs with a width of 200 μm and a height of 1 mm A A A A A 3) Formability of barrier ribs with a width of 100 μm and a height of 1 mm B B B B B Adhesion between the object component and the barrier wall Infrared light shielding property of the barrier wall Inkjet Discharge A A B B D.

[表7]    實施例31 實施例32 實施例33 實施例34 實施例35 調配成分(重量份) (A)光硬化性化合物 六官能(甲基)丙烯酸酯化合物 DPHA 10 10 10       三官能(甲基)丙烯酸酯化合物 TMPTA                二官能(甲基)丙烯酸酯化合物1 APG-700                二官能(甲基)丙烯酸酯化合物2 IRR214K 10 10 10 40    二官能(甲基)丙烯酸酯化合物3 HDDA             20 (C)光硬化性化合物 單官能(甲基)丙烯酸酯化合物 2EHA 10 10 10 30 10 (B)熱硬化性化合物 (B1)光及熱硬化性化合物 4HBAGE 40 40 40    40 二官能環氧化合物 850CRP          10    熱硬化劑 APB-N          9 20 BAPS-M                Curehard MED 20             DICY7    20 20       矽烷偶合劑 KBM-402 0.5 0.5 0.5 0.5 0.5 KBE-402 0.5 0.5 0.5 0.5 0.5 光聚合起始劑 Irg379 8 8 8 9 9 分散劑 BYK-9076 0.5    0.5       DISPERBYK-145                Flowlen GW-1500                EfkaPX4701                紅外光遮蔽劑 酞菁釩錯合物 HA-1          1 1 酞菁銅錯合物 FDN-006                酞菁金屬錯合物 FDN-008                碳黑1 SF Black BJ2296                碳黑2 MA600                碳黑3 PD-605                碳黑4 #10 0.5 0.5 0.5       碳黑5 #20                碳黑6 #85                碳黑7 MA220                碳黑8 MCF88                碳黑9 #850                評價 1)寬度300 μm及高度1 mm之阻隔壁之形成性 A A A A A 2)寬度200 μm及高度1 mm之阻隔壁之形成性 A B A B A 3)寬度100 μm及高度1 mm之阻隔壁之形成性 B B B B B 接著對象構件與阻隔壁之接著性 〇〇 阻隔壁之紅外光遮蔽性 噴墨噴出性 B E C A A [Table 7] Example 31 Example 32 Example 33 Example 34 Example 35 Deployment ingredients (weight parts) (A) Photocurable compound Hexafunctional (meth)acrylate compound DPHA 10 10 10 Trifunctional (meth)acrylate compound TMPTA Difunctional (meth)acrylate compound 1 APG-700 Difunctional (meth)acrylate compound 2 IRR214K 10 10 10 40 Difunctional (meth)acrylate compound 3 HDDA 20 (C) Photocurable compound Monofunctional (meth)acrylate compounds 2EHA 10 10 10 30 10 (B) Thermosetting compound (B1) Light and thermosetting compounds 4HBAGE 40 40 40 40 Difunctional epoxy compound 850CRP 10 heat hardener APB-N 9 20 BAPS-M Curehard MED 20 DICY7 20 20 Silane coupling agent KBM-402 0.5 0.5 0.5 0.5 0.5 KBE-402 0.5 0.5 0.5 0.5 0.5 Photopolymerization initiator Irg379 8 8 8 9 9 Dispersant BYK-9076 0.5 0.5 DISPERBYK-145 Flowlen GW-1500 EfkaPX4701 Infrared light shielding agent Phthalocyanine Vanadium Complex HA-1 1 1 copper phthalocyanine complex FDN-006 Phthalocyanine metal complexes FDN-008 carbon black 1 SF Black BJ2296 carbon black 2 MA600 carbon black 3 PD-605 carbon black 4 #10 0.5 0.5 0.5 carbon black 5 #20 carbon black 6 #85 carbon black 7 MA220 carbon black 8 MCF88 carbon black 9 #850 evaluate 1) Formability of barrier ribs with a width of 300 μm and a height of 1 mm A A A A A 2) Formability of barrier ribs with a width of 200 μm and a height of 1 mm A B A B A 3) Formability of barrier ribs with a width of 100 μm and a height of 1 mm B B B B B Adhesion between the object component and the barrier wall 〇〇 Infrared shielding property of the barrier wall Inkjet Discharge B E. C A A

[表8]    實施例36 實施例37 實施例38 實施例39 實施例40 調配成分(重量份) (A)光硬化性化合物 六官能(甲基)丙烯酸酯化合物 DPHA       10 10 5 三官能(甲基)丙烯酸酯化合物 TMPTA    10          二官能(甲基)丙烯酸酯化合物1 APG-700                二官能(甲基)丙烯酸酯化合物2 IRR214K 20 30 30 10 15 二官能(甲基)丙烯酸酯化合物3 HDDA                (C)光硬化性化合物 單官能(甲基)丙烯酸酯化合物 2EHA 10 30 30 10 10 (B)熱硬化性化合物 (B1)光及熱硬化性化合物 4HBAGE 40       40 40 二官能環氧化合物 850CRP    10 10       熱硬化劑 APB-N 20 9 9 20 20 BAPS-M                Curehard MED                DICY7                矽烷偶合劑 KBM-402 0.5 0.5 0.5 0.5 0.5 KBE-402 0.5 0.5 0.5 0.5 0.5 光聚合起始劑 Irg379 8 9 8 8 8 分散劑 BYK-9076                DISPERBYK-145                Flowlen GW-1500                EfkaPX4701                紅外光遮蔽劑 酞菁釩錯合物 HA-1 1 1 1    1 酞菁銅錯合物 FDN-006                酞菁金屬錯合物 FDN-008                碳黑1 SF Black BJ2296                碳黑2 MA600                碳黑3 PD-605                碳黑4 #10          1    碳黑5 #20                碳黑6 #85                碳黑7 MA220                碳黑8 MCF88                碳黑9 #850                評價 1)寬度300 μm及高度1 mm之阻隔壁之形成性 A A A A A 2)寬度200 μm及高度1 mm之阻隔壁之形成性 A A A B A 3)寬度100 μm及高度1 mm之阻隔壁之形成性 B B A B B 接著對象構件與阻隔壁之接著性 〇〇 阻隔壁之紅外光遮蔽性 〇〇 噴墨噴出性 A A A C A [Table 8] Example 36 Example 37 Example 38 Example 39 Example 40 Deployment ingredients (weight parts) (A) Photocurable compound Hexafunctional (meth)acrylate compound DPHA 10 10 5 Trifunctional (meth)acrylate compound TMPTA 10 Difunctional (meth)acrylate compound 1 APG-700 Difunctional (meth)acrylate compound 2 IRR214K 20 30 30 10 15 Difunctional (meth)acrylate compound 3 HDDA (C) Photocurable compound Monofunctional (meth)acrylate compounds 2EHA 10 30 30 10 10 (B) Thermosetting compound (B1) Light and thermosetting compounds 4HBAGE 40 40 40 Difunctional epoxy compound 850CRP 10 10 heat hardener APB-N 20 9 9 20 20 BAPS-M Curehard MED DICY7 Silane coupling agent KBM-402 0.5 0.5 0.5 0.5 0.5 KBE-402 0.5 0.5 0.5 0.5 0.5 Photopolymerization initiator Irg379 8 9 8 8 8 Dispersant BYK-9076 DISPERBYK-145 Flowlen GW-1500 EfkaPX4701 Infrared light shielding agent Phthalocyanine Vanadium Complex HA-1 1 1 1 1 copper phthalocyanine complex FDN-006 Phthalocyanine metal complexes FDN-008 carbon black 1 SF Black BJ2296 carbon black 2 MA600 carbon black 3 PD-605 carbon black 4 #10 1 carbon black 5 #20 carbon black 6 #85 carbon black 7 MA220 carbon black 8 MCF88 carbon black 9 #850 evaluate 1) Formability of barrier ribs with a width of 300 μm and a height of 1 mm A A A A A 2) Formability of barrier ribs with a width of 200 μm and a height of 1 mm A A A B A 3) Formability of barrier ribs with a width of 100 μm and a height of 1 mm B B A B B Adhesion between the object component and the barrier wall 〇〇 Infrared light shielding property of the barrier wall 〇〇 Inkjet Discharge A A A C A

[表9]    比較例1 比較例2 調配成分(重量份) (A)光硬化性化合物 六官能(甲基)丙烯酸酯化合物 DPHA       三官能(甲基)丙烯酸酯化合物 TMPTA       二官能(甲基)丙烯酸酯化合物1 APG-700       二官能(甲基)丙烯酸酯化合物2 IRR214K       二官能(甲基)丙烯酸酯化合物3 HDDA 30    (C)光硬化性化合物 單官能(甲基)丙烯酸酯化合物 2EHA 30 60 (B)熱硬化性化合物 (B1)光及熱硬化性化合物 4HBAGE       二官能環氧化合物 850CRP 20 20 熱硬化劑 APB-N 9 9 BAPS-M       Curehard MED       DICY7       矽烷偶合劑 KBM-402 0.5 0.5 KBE-402 0.5 0.5 光聚合起始劑 Irg379 10 10 分散劑 BYK-9076       DISPERBYK-145       Flowlen GW-1500       EfkaPX4701       紅外光遮蔽劑 酞菁釩錯合物 HA-1       酞菁銅錯合物 FDN-006       酞菁金屬錯合物 FDN-008       碳黑1 SF Black BJ2296       碳黑2 MA600       碳黑3 PD-605       碳黑4 #10    1 碳黑5 #20       碳黑6 #85       碳黑7 MA220       碳黑8 MCF88       碳黑9 #850       評價 1)寬度300 μm及高度1 mm之阻隔壁之形成性 A B 2)寬度200 μm及高度1 mm之阻隔壁之形成性 B B 3)寬度100 μm及高度1 mm之阻隔壁之形成性 B B 接著對象構件與阻隔壁之接著性 阻隔壁之紅外光遮蔽性 × 噴墨噴出性 A A [Table 9] Comparative example 1 Comparative example 2 Deployment ingredients (weight parts) (A) Photocurable compound Hexafunctional (meth)acrylate compound DPHA Trifunctional (meth)acrylate compound TMPTA Difunctional (meth)acrylate compound 1 APG-700 Difunctional (meth)acrylate compound 2 IRR214K Difunctional (meth)acrylate compound 3 HDDA 30 (C) Photocurable compound Monofunctional (meth)acrylate compounds 2EHA 30 60 (B) Thermosetting compound (B1) Light and thermosetting compounds 4HBAGE Difunctional epoxy compound 850CRP 20 20 heat hardener APB-N 9 9 BAPS-M Curehard MED DICY7 Silane coupling agent KBM-402 0.5 0.5 KBE-402 0.5 0.5 Photopolymerization initiator Irg379 10 10 Dispersant BYK-9076 DISPERBYK-145 Flowlen GW-1500 EfkaPX4701 Infrared light shielding agent Phthalocyanine Vanadium Complex HA-1 copper phthalocyanine complex FDN-006 Phthalocyanine metal complexes FDN-008 carbon black 1 SF Black BJ2296 carbon black 2 MA600 carbon black 3 PD-605 carbon black 4 #10 1 carbon black 5 #20 carbon black 6 #85 carbon black 7 MA220 carbon black 8 MCF88 carbon black 9 #850 evaluate 1) Formability of barrier ribs with a width of 300 μm and a height of 1 mm A B 2) Formability of barrier ribs with a width of 200 μm and a height of 1 mm B B 3) Formability of barrier ribs with a width of 100 μm and a height of 1 mm B B Adhesion between the object component and the barrier wall Infrared light shielding property of the barrier wall x Inkjet Discharge A A

1:第1構件 1a:第1表面 2:第2構件 2a:第1表面 3:阻隔壁 3A:硬化性組合物層 3B:B階段化物層 4:發光構件 10:發光裝置 51:噴出部 52:光照射部 1: 1st member 1a: Surface 1 2: 2nd member 2a: Surface 1 3: barrier wall 3A: Hardening composition layer 3B: B-stage compound layer 4: Luminous components 10: Lighting device 51: ejection part 52: Light irradiation department

圖1(a)係模式地表示使用本發明之第1實施方式之噴墨用及阻隔壁形成用硬化性組合物所獲得之發光裝置的俯視圖,圖1(b)係模式地表示該發光裝置之剖面圖。 圖2(a)~(c)係用以對圖1所示之發光裝置之製造方法之各步驟進行說明之剖面圖。 圖3(d)~(f)係用以對圖1所示之發光裝置之製造方法之各步驟進行說明之剖面圖。 Fig. 1(a) is a plan view schematically showing a light emitting device obtained by using the curable composition for inkjet and barrier rib formation according to the first embodiment of the present invention, and Fig. 1(b) schematically shows the light emitting device The cross-sectional view. 2( a ) to ( c ) are cross-sectional views for explaining each step of the manufacturing method of the light-emitting device shown in FIG. 1 . 3( d ) to ( f ) are sectional views for explaining each step of the manufacturing method of the light-emitting device shown in FIG. 1 .

1:第1構件 1: 1st component

1a:第1表面 1a: Surface 1

2:第2構件 2: 2nd member

2a:第1表面 2a: Surface 1

3:阻隔壁 3: barrier wall

4:發光構件 4: Luminous components

10:發光裝置 10: Lighting device

Claims (17)

一種噴墨用及阻隔壁形成用硬化性組合物,其包含:合計具有2個以上(甲基)丙烯醯基及乙烯基且不具有環狀醚基之光硬化性化合物、 具有環狀醚基之熱硬化性化合物、 光聚合起始劑、 熱硬化劑、以及 紅外光遮蔽劑。 A curable composition for inkjet and barrier rib formation, comprising: a photocurable compound having a total of two or more (meth)acryl groups and vinyl groups and not having a cyclic ether group, Thermosetting compounds with cyclic ether groups, photopolymerization initiator, heat hardener, and Infrared light shielding agent. 如請求項1之噴墨用及阻隔壁形成用硬化性組合物,其中上述紅外光遮蔽劑包含碳黑、具有酞菁骨架之金屬錯合物或具有萘酞菁骨架之金屬錯合物。The curable composition for inkjet and barrier rib formation according to claim 1, wherein the infrared light shielding agent includes carbon black, a metal complex having a phthalocyanine skeleton, or a metal complex having a naphthalocyanine skeleton. 如請求項2之噴墨用及阻隔壁形成用硬化性組合物,其中上述具有酞菁骨架之金屬錯合物中之金屬錯合物為釩錯合物或銅錯合物,且 上述具有萘酞菁骨架之金屬錯合物中之金屬錯合物為釩錯合物或銅錯合物。 The curable composition for inkjet and barrier rib formation according to claim 2, wherein the metal complex in the metal complexes having a phthalocyanine skeleton is a vanadium complex or a copper complex, and The metal complexes in the above-mentioned metal complexes having a naphthalocyanine skeleton are vanadium complexes or copper complexes. 如請求項2或3之噴墨用及阻隔壁形成用硬化性組合物,其中上述碳黑之平均一次粒徑為20 nm以上100 nm以下。The curable composition for inkjet and barrier rib formation according to claim 2 or 3, wherein the average primary particle diameter of the carbon black is not less than 20 nm and not more than 100 nm. 如請求項1至3中任一項之噴墨用及阻隔壁形成用硬化性組合物,其中上述熱硬化性化合物包含具有2個以上環狀醚基之熱硬化性化合物。The curable composition for inkjet and barrier rib formation according to any one of claims 1 to 3, wherein the thermosetting compound includes a thermosetting compound having two or more cyclic ether groups. 如請求項1至3中任一項之噴墨用及阻隔壁形成用硬化性組合物,其中上述光硬化性化合物包含具有二環戊二烯骨架之光硬化性化合物。The curable composition for inkjet and barrier rib formation according to any one of claims 1 to 3, wherein the photocurable compound includes a photocurable compound having a dicyclopentadiene skeleton. 如請求項1至3中任一項之噴墨用及阻隔壁形成用硬化性組合物,其中上述熱硬化性化合物包含具有(甲基)丙烯醯基之光及熱硬化性化合物。The curable composition for inkjet and barrier rib formation according to any one of claims 1 to 3, wherein the thermosetting compound includes a light and thermosetting compound having a (meth)acryl group. 如請求項1至3中任一項之噴墨用及阻隔壁形成用硬化性組合物,其中上述光硬化性化合物包含合計具有3個以上(甲基)丙烯醯基及乙烯基之光硬化性化合物。The curable composition for inkjet and barrier rib formation according to any one of claims 1 to 3, wherein the photocurable compound contains a photocurable compound having a total of 3 or more (meth)acryl groups and vinyl groups. compound. 如請求項1至3中任一項之噴墨用及阻隔壁形成用硬化性組合物,其中上述光硬化性化合物之含量為10重量%以上75重量%以下。The curable composition for inkjet and barrier rib formation according to any one of claims 1 to 3, wherein the content of the photocurable compound is 10% by weight or more and 75% by weight or less. 如請求項1至3中任一項之噴墨用及阻隔壁形成用硬化性組合物,其中上述熱硬化劑包含芳香族胺化合物。The curable composition for inkjet and barrier rib formation according to any one of claims 1 to 3, wherein the thermosetting agent contains an aromatic amine compound. 如請求項10之噴墨用及阻隔壁形成用硬化性組合物,其中上述芳香族胺化合物包含1,3-雙(3-胺基苯氧基)苯或雙[4-(3-胺基苯氧基)苯基]碸。The curable composition for inkjet and barrier rib formation according to claim 10, wherein the aromatic amine compound contains 1,3-bis(3-aminophenoxy)benzene or bis[4-(3-amino phenoxy)phenyl]pyridine. 如請求項1至3中任一項之噴墨用及阻隔壁形成用硬化性組合物,其進而包含分散劑。The curable composition for inkjet and barrier rib formation according to any one of claims 1 to 3, further comprising a dispersant. 如請求項12之噴墨用及阻隔壁形成用硬化性組合物,其中上述分散劑之酸值為10 mgKOH/g以上100 mgKOH/g以下,且 上述分散劑之胺值為10 mgKOH/g以上100 mgKOH/g以下。 The curable composition for inkjet and barrier rib formation according to claim 12, wherein the acid value of the above-mentioned dispersant is not less than 10 mgKOH/g and not more than 100 mgKOH/g, and The amine value of the above-mentioned dispersant is not less than 10 mgKOH/g and not more than 100 mgKOH/g. 一種發光裝置,其具備第1構件、 配置於上述第1構件之第1表面上之發光構件、及 配置於上述第1構件之上述第1表面上之阻隔壁,且 上述阻隔壁為如請求項1至13中任一項之噴墨用及阻隔壁形成用硬化性組合物之硬化物。 A light emitting device comprising a first member, a light emitting member disposed on the first surface of the first member, and the barrier rib disposed on the first surface of the first member, and The barrier rib is a cured product of the curable composition for inkjet and barrier rib formation according to any one of claims 1 to 13. 如請求項14之發光裝置,其具備第2構件, 上述發光構件為可照射紅外光之發光構件, 上述阻隔壁以圍繞上述發光構件之方式配置於上述第1構件之上述第1表面上,且 上述阻隔壁將上述第1構件與上述第2構件接著。 The light-emitting device according to claim 14, which includes a second member, The above-mentioned light-emitting member is a light-emitting member capable of irradiating infrared light, The barrier wall is disposed on the first surface of the first member so as to surround the light-emitting member, and The barrier wall connects the first member and the second member together. 一種發光裝置之製造方法,其包括如下步驟:塗佈步驟,其係使用噴墨裝置,將如請求項1至13中任一項之噴墨用及阻隔壁形成用硬化性組合物塗佈於配置有發光構件之第1構件之第1表面上,形成硬化性組合物層;及 光硬化步驟,其係藉由光照射使上述硬化性組合物層進行硬化,形成B階段化物層。 A method of manufacturing a light-emitting device, which includes the following steps: a coating step, which is to use an inkjet device to apply the curable composition for inkjet and barrier wall formation according to any one of claims 1 to 13 on forming a curable composition layer on the first surface of the first member on which the light-emitting member is disposed; and The photocuring step is to harden the above-mentioned curable composition layer by light irradiation to form a B-staged compound layer. 如請求項16之發光裝置之製造方法,其包括如下步驟:配置步驟,其係於上述B階段化物層之與上述第1構件側相反之表面上配置第2構件;及 熱硬化步驟,其係藉由加熱而使上述B階段化物層熱硬化,且 於上述配置步驟中,於以圍繞上述發光構件之方式配置之上述B階段化物層之表面上配置上述第2構件。 The method of manufacturing a light-emitting device according to claim 16, which includes the following steps: an arranging step of arranging a second member on the surface of the B-stage compound layer opposite to the first member; and a thermal hardening step of thermally hardening the above-mentioned B-staged compound layer by heating, and In the arranging step, the second member is arranged on the surface of the B-stage compound layer arranged to surround the light emitting member.
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