TW202312844A - Heat dissipation system and electronic device - Google Patents

Heat dissipation system and electronic device Download PDF

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TW202312844A
TW202312844A TW110133852A TW110133852A TW202312844A TW 202312844 A TW202312844 A TW 202312844A TW 110133852 A TW110133852 A TW 110133852A TW 110133852 A TW110133852 A TW 110133852A TW 202312844 A TW202312844 A TW 202312844A
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heat source
drop hole
drop
accommodating space
hole
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TW110133852A
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TWI806155B (en
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童凱煬
陳虹汝
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英業達股份有限公司
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Abstract

A heat dissipation system including casing, first tubing, second tubing and condenser. Casing includes base and partition. Base includes accommodation space, inlet and outlet. Partition divides accommodation space into first and second accommodation space. First accommodation space is located above second accommodation space along gravitational direction. Inlet and outlet are respectively connected to first and second accommodation space. Partition includes first and second drop holes. First and second accommodation spaces are connected via first and second drop holes. First and second heat source is located in second accommodation space and spaced apart from each other. Working fluid drops to first heat source via first drop hole and to second heat source via second drop hole. Aperture ratio of first drop hole on first region of partition is different from that of second drop hole on second region of partition.

Description

散熱系統以及電子裝置Cooling system and electronic device

本發明係關於一種散熱系統以及電子裝置,特別係關於一種包含開孔率不同的多個滴孔之散熱系統以及包含此散熱系統的電子裝置。The present invention relates to a heat dissipation system and an electronic device, in particular to a heat dissipation system comprising a plurality of drip holes with different opening ratios and an electronic device comprising the heat dissipation system.

在一般的浸沒式冷卻系統中,熱源會浸泡於輸送到伺服器中的介電液中,且介電液會有效地吸收熱源產生的熱量而從液態蒸發成氣態。並且,為了防止沿平行於重力方向的排列方向平行疊放的伺服器阻礙介電液蒸發時產生的氣泡之移動,伺服器在這種浸沒式冷卻系統中通常是沿垂直於重力方向的排列方向設置。In a general immersion cooling system, the heat source will be immersed in the dielectric fluid delivered to the server, and the dielectric fluid will effectively absorb the heat generated by the heat source and evaporate from a liquid state to a gas state. And, in order to prevent the servos stacked in parallel in the direction parallel to the direction of gravity from hindering the movement of the air bubbles generated when the dielectric fluid evaporates, the servos are usually arranged in the direction perpendicular to the direction of gravity in this immersion cooling system set up.

然,雖然熱源的體積相對整個伺服器的體積來說為小的,但介電液需要充滿整個伺服器才能淹沒熱源。因此,這種浸沒式冷卻系統會需要使用很多的介電液而有成本較高的問題。此外,一般的機櫃皆是用於沿平行於重力方向的排列方向安裝伺服器。因此,這種浸沒式冷卻系統中沿垂直於重力方向的排列方向設置之伺服器無法安裝於既有的機櫃中,而使得維修人員在進行維修時需要工具的輔助才能移動這種垂直排列的伺服器。However, although the volume of the heat source is small relative to the volume of the entire server, the dielectric fluid needs to fill the entire server to submerge the heat source. Therefore, such an immersion cooling system needs to use a large amount of dielectric fluid and has a problem of high cost. In addition, general cabinets are used to install servers along an arrangement direction parallel to the direction of gravity. Therefore, the servers arranged in the direction perpendicular to the direction of gravity in this immersion cooling system cannot be installed in the existing cabinet, so that the maintenance personnel need the assistance of tools to move the vertically arranged servos when performing maintenance. device.

本發明在於提供一種散熱系統以及電子裝置,以降低工作流體的使用量並使殼體能安裝於既有的機櫃中。The present invention provides a heat dissipation system and an electronic device to reduce the usage of working fluid and enable the shell to be installed in the existing cabinet.

本發明一實施例所揭露之散熱系統用以供一工作流體循環並用以冷卻一第一熱源以及一第二熱源。散熱系統包含一殼體、一第一管路、一第二管路以及一冷凝器。殼體包含一基座以及一隔板。基座包含一容置空間、一流入口以及一流出口。隔板固定於基座並位於容置空間中而將容置空間分隔成一第一容置空間以及一第二容置空間。第一容置空間在一重力方向上位於第二容置空間的上側。流入口連通於第一容置空間。流出口連通於第二容置空間。隔板包含一第一區域、一第二區域、至少一第一滴孔以及至少一第二滴孔。第一區域以及第二區域彼此相間隔。至少一第一滴孔位於第一區域。至少一第二滴孔位於第二區域。第一容置空間以及第二容置空間透過至少一第一滴孔以及至少一第二滴孔彼此相連通。第一熱源以及第二熱源用以位於第二容置空間中且彼此相間隔。工作流體用以透過至少一第一滴孔滴至第一熱源並用以透過至少一第二滴孔滴至第二熱源。第一管路的一端連通於流入口。第二管路的一端連通於流出口。第一管路透過冷凝器連通於第二管路。至少一第一滴孔於第一區域的開孔率相異於至少一第二滴孔於第二區域的開孔率。The heat dissipation system disclosed in an embodiment of the present invention is used for circulating a working fluid and cooling a first heat source and a second heat source. The cooling system includes a shell, a first pipeline, a second pipeline and a condenser. The casing includes a base and a partition. The base includes an accommodating space, an inlet and an outlet. The partition plate is fixed on the base and located in the accommodation space to divide the accommodation space into a first accommodation space and a second accommodation space. The first accommodating space is located on the upper side of the second accommodating space in a gravity direction. The inflow port communicates with the first accommodating space. The outflow port communicates with the second accommodating space. The separator includes a first region, a second region, at least one first drop hole and at least one second drop hole. The first area and the second area are spaced apart from each other. At least one first drip hole is located in the first area. At least one second drip hole is located in the second area. The first accommodating space and the second accommodating space communicate with each other through at least one first drop hole and at least one second drop hole. The first heat source and the second heat source are located in the second accommodating space and are spaced apart from each other. The working fluid is used to drop to the first heat source through at least one first drop hole and to drop to the second heat source through at least one second drop hole. One end of the first pipeline communicates with the inflow port. One end of the second pipeline communicates with the outflow port. The first pipeline communicates with the second pipeline through the condenser. The opening ratio of the at least one first drop hole in the first region is different from the opening ratio of the at least one second drop hole in the second region.

本發明另一實施例所揭露之一種電子裝置用以供一工作流體循環並包含一殼體、一第一管路、一第二管路、一冷凝器、一第一熱源以及一第二熱源。殼體包含一基座以及一隔板。基座包含一容置空間、一流入口以及一流出口。隔板固定於基座並位於容置空間中而將容置空間分隔成一第一容置空間以及一第二容置空間。第一容置空間在一重力方向上位於第二容置空間的上側。流入口連通於第一容置空間。流出口連通於第二容置空間。隔板包含一第一區域、一第二區域、至少一第一滴孔以及至少一第二滴孔。第一區域以及第二區域彼此相間隔。至少一第一滴孔位於第一區域。至少一第二滴孔位於第二區域。第一容置空間以及第二容置空間透過至少一第一滴孔以及至少一第二滴孔彼此相連通。第一管路的一端連通於流入口。第二管路的一端連通於流出口。第一管路透過冷凝器連通於第二管路。第一熱源位於基座的第二容置空間中。工作流體透過第一滴孔滴至第一熱源。第二熱源位於基座的第二容置空間中並與第一熱源相間隔。工作流體用以透過至少一第二滴孔滴至第二熱源。至少一第一滴孔於第一區域的開孔率相異於至少一第二滴孔於第二區域的開孔率。An electronic device disclosed in another embodiment of the present invention is used to circulate a working fluid and includes a casing, a first pipeline, a second pipeline, a condenser, a first heat source and a second heat source . The casing includes a base and a partition. The base includes an accommodating space, an inlet and an outlet. The partition plate is fixed on the base and located in the accommodation space to divide the accommodation space into a first accommodation space and a second accommodation space. The first accommodating space is located on the upper side of the second accommodating space in a gravity direction. The inflow port communicates with the first accommodating space. The outflow port communicates with the second accommodating space. The separator includes a first region, a second region, at least one first drop hole and at least one second drop hole. The first area and the second area are spaced apart from each other. At least one first drip hole is located in the first area. At least one second drip hole is located in the second area. The first accommodating space and the second accommodating space communicate with each other through at least one first drop hole and at least one second drop hole. One end of the first pipeline communicates with the inflow port. One end of the second pipeline communicates with the outflow port. The first pipeline communicates with the second pipeline through the condenser. The first heat source is located in the second accommodating space of the base. The working fluid drops to the first heat source through the first drip hole. The second heat source is located in the second accommodating space of the base and is spaced from the first heat source. The working fluid is used to drop to the second heat source through at least one second drop hole. The opening ratio of the at least one first drop hole in the first region is different from the opening ratio of the at least one second drop hole in the second region.

根據上述實施例所揭露之散熱系統以及電子裝置,由於第一滴孔於第一區域的開孔率相異於第二滴孔於第二區域的開孔率,因此得以根據熱源的發熱量或其他性質來決定工作流體滴至熱源的量。如此一來,便能降低工作流體的用量同時仍有效地冷卻每一個熱源。According to the heat dissipation system and the electronic device disclosed in the above embodiments, since the opening ratio of the first drop hole in the first region is different from the opening ratio of the second drop hole in the second region, it can be based on the calorific value of the heat source or Other properties determine the amount of working fluid that drops to the heat source. In this way, the amount of working fluid can be reduced while still efficiently cooling each heat source.

以下在實施方式中詳細敘述本發明之實施例之詳細特徵以及優點,其內容足以使任何本領域中具通常知識者了解本發明之實施例之技術內容並據以實施,且根據本說明書所揭露之內容、申請專利範圍及圖式,任何本領域中具通常知識者可輕易地理解本發明相關之目的及優點。以下之實施例係進一步詳細說明本發明之觀點,但非以任何觀點限制本發明之範疇。The detailed features and advantages of the embodiments of the present invention are described in detail below in the implementation modes, the content is enough for anyone with ordinary knowledge in the field to understand the technical content of the embodiments of the present invention and implement them accordingly, and according to the disclosure of this specification Anyone with ordinary knowledge in the art can easily understand the related objectives and advantages of the present invention. The following examples are to further describe the concept of the present invention in detail, but not to limit the scope of the present invention in any way.

請參閱圖1及圖2。圖1為根據本發明第一實施例的電子裝置之側面示意圖。圖2為圖1中的電子裝置之殼體的側剖示意圖。Please refer to Figure 1 and Figure 2. FIG. 1 is a schematic side view of an electronic device according to a first embodiment of the present invention. FIG. 2 is a schematic side sectional view of the casing of the electronic device in FIG. 1 .

電子裝置10用以供一工作流體F循環,且工作流體F例如為介電液。於本實施例中,電子裝置10包含一機櫃50、一殼體100、一第一管路200、一第二管路300、一第三管路340、一冷凝器400、一儲液箱450、一幫浦460、一電路板480、一第一熱源500、一第二熱源600以及一第三熱源700。需注意的是,殼體100、第一管路200、第二管路300、第三管路340、冷凝器400、儲液箱450以及幫浦460亦可作為一散熱系統。The electronic device 10 is used for circulating a working fluid F, and the working fluid F is, for example, a dielectric fluid. In this embodiment, the electronic device 10 includes a cabinet 50, a casing 100, a first pipeline 200, a second pipeline 300, a third pipeline 340, a condenser 400, and a liquid storage tank 450 , a pump 460 , a circuit board 480 , a first heat source 500 , a second heat source 600 and a third heat source 700 . It should be noted that the housing 100 , the first pipeline 200 , the second pipeline 300 , the third pipeline 340 , the condenser 400 , the liquid storage tank 450 and the pump 460 can also serve as a cooling system.

殼體100設置於機櫃50並包含一基座101以及一隔板102。並且,殼體100例如為伺服器機殼。於本實施例中,基座101包含一底板103、一側板104、一容置空間105、一流入口106、一流出口107以及一溢流孔108。側板104立於底板103。隔板102固定於側板104並位於容置空間105中而將容置空間105分隔成一第一容置空間1051以及一第二容置空間1052。第一容置空間1051在一重力方向G上位於第二容置空間1052的上側。並且,第二容置空間1052是由底板103、側板104以及隔板102所共同形成。流入口106連通於第一容置空間1051。流出口107位於側板104並連通於第二容置空間1052。於本實施例中,溢流孔108位於側板104,且溢流孔108較流出口107還靠近底板103。於本實施例中,溢流孔108相對底板103的最小高度H1等於工作流體F於第二容置空間1052中相對底板103的一預設液位H2。也就是說,當工作流體F的液位超過預設液位H2時,工作流體F會從溢流孔108溢出。如此一來,便能透過溢流孔108控制累積工作流體F累積在底板103的量,進而防止工作流體F之浪費。The casing 100 is disposed on the cabinet 50 and includes a base 101 and a partition 102 . Moreover, the casing 100 is, for example, a server casing. In this embodiment, the base 101 includes a bottom plate 103 , a side plate 104 , an accommodating space 105 , an inlet 106 , an outlet 107 and an overflow hole 108 . The side panels 104 stand on the bottom panel 103 . The partition plate 102 is fixed on the side plate 104 and located in the accommodating space 105 to divide the accommodating space 105 into a first accommodating space 1051 and a second accommodating space 1052 . The first accommodating space 1051 is located on the upper side of the second accommodating space 1052 in a direction G of gravity. Moreover, the second accommodating space 1052 is jointly formed by the bottom plate 103 , the side plate 104 and the partition plate 102 . The inlet 106 communicates with the first accommodating space 1051 . The outlet 107 is located on the side plate 104 and communicates with the second accommodating space 1052 . In this embodiment, the overflow hole 108 is located on the side plate 104 , and the overflow hole 108 is closer to the bottom plate 103 than the outlet 107 . In this embodiment, the minimum height H1 of the overflow hole 108 relative to the bottom plate 103 is equal to a predetermined liquid level H2 of the working fluid F in the second accommodating space 1052 relative to the bottom plate 103 . That is to say, when the liquid level of the working fluid F exceeds the preset liquid level H2, the working fluid F will overflow from the overflow hole 108 . In this way, the amount of accumulated working fluid F accumulated on the bottom plate 103 can be controlled through the overflow hole 108 , thereby preventing waste of the working fluid F.

隔板102包含一第一區域1021、一第二區域1022、多個第一滴孔1023以及多個第二滴孔1024。第一區域1021以及第二區域1022彼此相間隔。此外,第一區域1021的總面積例如等於第二區域1022的總面積。第一滴孔1023位於第一區域1021。第二滴孔1024位於第二區域1022。第一容置空間1051以及第二容置空間1052透過第一滴孔1023以及第二滴孔1024彼此相連通。第一滴孔1023於第一區域1021的開孔率相異於第二滴孔1024於第二區域1022的開孔率。具體來說,於本實施例中,各個第一滴孔1023的尺寸等於各個第二滴孔1024的尺寸,且第一滴孔1023的數量大於於第二滴孔1024的數量。因此,於本實施例中,第一滴孔1023於第一區域1021的開孔率大於第二滴孔1024於第二區域1022的開孔率。需注意的是,第一滴孔1023於第一區域1021的開孔率是指第一滴孔1023的總開口面積對第一區域1021的總面積之比值。The separator 102 includes a first region 1021 , a second region 1022 , a plurality of first drop holes 1023 and a plurality of second drop holes 1024 . The first area 1021 and the second area 1022 are spaced apart from each other. In addition, the total area of the first region 1021 is equal to the total area of the second region 1022 , for example. The first drip hole 1023 is located in the first region 1021 . The second drip hole 1024 is located in the second area 1022 . The first accommodating space 1051 and the second accommodating space 1052 communicate with each other through the first drop hole 1023 and the second drop hole 1024 . The opening ratio of the first drop hole 1023 in the first region 1021 is different from the opening ratio of the second drop hole 1024 in the second region 1022 . Specifically, in this embodiment, the size of each first drop hole 1023 is equal to the size of each second drop hole 1024 , and the number of first drop holes 1023 is greater than the number of second drop holes 1024 . Therefore, in this embodiment, the opening ratio of the first drop hole 1023 in the first region 1021 is greater than the opening ratio of the second drop hole 1024 in the second region 1022 . It should be noted that the opening ratio of the first drop holes 1023 in the first region 1021 refers to the ratio of the total opening area of the first drop holes 1023 to the total area of the first region 1021 .

需注意的是,於其他實施例中,第一滴孔於第一區域的開孔率亦可小於第二滴孔於第二區域的開孔率。此外,於其他實施例中,第一滴孔的數量亦可等於第二滴孔的數量,且各個第一滴孔的尺寸亦可大於各個第二滴孔的尺寸而使得第一滴孔於第一區域的開孔率大於第二滴孔於第二區域的開孔率。It should be noted that, in other embodiments, the opening ratio of the first drop hole in the first region may also be smaller than the opening ratio of the second drop hole in the second region. In addition, in other embodiments, the number of the first drop hole can also be equal to the number of the second drop hole, and the size of each first drop hole can also be greater than the size of each second drop hole so that the first drop hole is at the same level as the second drop hole. The opening ratio of the first region is greater than the opening ratio of the second drop hole in the second region.

於本實施例中,第一管路200包含一第一連接管201以及一第二連接管202。第一連接管201的相對兩端分別連通於冷凝器400以及儲液箱450。第二連接管202的相對兩端分別連通於幫浦460以及基座101的流入口106。第二管路300的相對兩端分別連通於基座101的流出口107以及冷凝器400。第三管路340的相對兩端分別連通於儲液箱450以及基座101的溢流孔108。此外,於本實施例中,冷凝器400設置於機櫃50,且冷凝器400於重力方向G上位於基座101的上側。此外,於本實施例中,冷凝器400是設置於殼體100的基座101之外部。也就是說,冷凝器400以及殼體100的基座101是以彼此獨立的方式設置於機櫃50中。儲液箱450及幫浦460設置於機櫃50,且儲液箱450連通於幫浦460。In this embodiment, the first pipeline 200 includes a first connecting pipe 201 and a second connecting pipe 202 . The opposite ends of the first connecting pipe 201 communicate with the condenser 400 and the liquid storage tank 450 respectively. The two opposite ends of the second connecting pipe 202 communicate with the pump 460 and the inlet 106 of the base 101 respectively. The two opposite ends of the second pipeline 300 communicate with the outlet 107 of the base 101 and the condenser 400 respectively. Two opposite ends of the third pipeline 340 communicate with the liquid storage tank 450 and the overflow hole 108 of the base 101 respectively. In addition, in this embodiment, the condenser 400 is disposed on the cabinet 50 , and the condenser 400 is located on the upper side of the base 101 in the direction G of gravity. In addition, in this embodiment, the condenser 400 is disposed outside the base 101 of the casing 100 . That is to say, the condenser 400 and the base 101 of the casing 100 are disposed in the cabinet 50 independently of each other. The liquid storage tank 450 and the pump 460 are disposed in the cabinet 50 , and the liquid storage tank 450 is connected to the pump 460 .

電路板480位於基座101的第二容置空間1052中。第一熱源500、第二熱源600及第三熱源700設置於電路板480並位於第二容置空間1052中。並且,第一熱源500、第二熱源600及第三熱源700彼此相間隔。工作流體F透過第一滴孔1023滴至第一熱源500。工作流體F透過第二滴孔1024滴至第二熱源600。於本實施例中,第一熱源500的發熱量大於第二熱源600的發熱量,且第一滴孔1023的開孔率大於第二滴孔1024的開孔率。此外,第三熱源700的發熱量小於第一熱源500的發熱量及第二熱源600的發熱量,且第三熱源700相對底板103的最大高度H3小於工作流體F於第二容置空間1052中相對底板103的預設液位H2而使第三熱源700能整個浸泡於工作流體F中。因此,隔板102上並沒有為第三熱源700進行開孔而僅透過累積在第二容置空間1052中的工作流體F來冷卻第三熱源700。也就是說,於本發明中,工作流體F滴至第一熱源500、第二熱源600及第三熱源700的量是根據第一熱源500、第二熱源600及第三熱源700的發熱量以及高度所決定。於其他實施例中,當第一熱源的發熱量等於第二熱源的發熱量但第一熱源的高度小於第二熱源的高度時,第二滴孔的開孔率亦可大於第一滴孔的開孔率而使滴至第二熱源的工作流體多於滴至第一熱源的工作流體。The circuit board 480 is located in the second accommodating space 1052 of the base 101 . The first heat source 500 , the second heat source 600 and the third heat source 700 are disposed on the circuit board 480 and located in the second accommodating space 1052 . Moreover, the first heat source 500 , the second heat source 600 and the third heat source 700 are spaced apart from each other. The working fluid F drops to the first heat source 500 through the first drop hole 1023 . The working fluid F drops to the second heat source 600 through the second drop hole 1024 . In this embodiment, the calorific value of the first heat source 500 is greater than that of the second heat source 600 , and the opening ratio of the first drip hole 1023 is greater than that of the second drip hole 1024 . In addition, the calorific value of the third heat source 700 is smaller than the calorific value of the first heat source 500 and the second heat source 600, and the maximum height H3 of the third heat source 700 relative to the bottom plate 103 is smaller than that of the working fluid F in the second accommodating space 1052 Relative to the preset liquid level H2 of the bottom plate 103 , the third heat source 700 can be fully immersed in the working fluid F. Therefore, the partition 102 does not have holes for the third heat source 700 and only passes through the working fluid F accumulated in the second accommodating space 1052 to cool the third heat source 700 . That is to say, in the present invention, the amount of working fluid F dropped to the first heat source 500, the second heat source 600 and the third heat source 700 is based on the calorific value of the first heat source 500, the second heat source 600 and the third heat source 700 and determined by height. In other embodiments, when the calorific value of the first heat source is equal to the calorific value of the second heat source but the height of the first heat source is smaller than the height of the second heat source, the opening ratio of the second drop hole can also be greater than that of the first drop hole The opening ratio is such that the working fluid dripping onto the second heat source is more than the working fluid dripping onto the first heat source.

工作流體F會透過幫浦460的協助從儲液箱450流動到第二連接管202,並由流入口106進入第一容置空間1051。進入第一容置空間1051的工作流體F會分別透過第一滴孔1023以及第二滴孔1024沿重力方向G滴至第一熱源500及第二熱源600。累積於第二容置空間1052中的工作流體F會淹沒第三熱源700。當工作流體F吸收第一熱源500、第二熱源600及第三熱源700所產生的熱量而蒸發成氣體時,氣態的工作流體F會沿流出方向D從流出口107流出第二容置空間1052。流出第二容置空間1052的氣態工作流體F會透過第二管路300流動到冷凝器400中冷凝成液態,接著在透過第一連接管201流回儲液箱450。The working fluid F flows from the liquid storage tank 450 to the second connecting pipe 202 with the help of the pump 460 , and enters the first accommodating space 1051 through the inlet 106 . The working fluid F entering the first accommodating space 1051 drops to the first heat source 500 and the second heat source 600 along the gravity direction G through the first drop hole 1023 and the second drop hole 1024 respectively. The working fluid F accumulated in the second accommodating space 1052 will submerge the third heat source 700 . When the working fluid F absorbs the heat generated by the first heat source 500 , the second heat source 600 and the third heat source 700 and evaporates into a gas, the gaseous working fluid F will flow out of the second accommodating space 1052 from the outlet 107 along the outflow direction D . The gaseous working fluid F flowing out of the second accommodating space 1052 will flow into the condenser 400 through the second pipeline 300 to be condensed into a liquid state, and then flow back to the liquid storage tank 450 through the first connecting pipe 201 .

請參閱圖3,圖3為根據本發明第二實施例的電子裝置之側面示意圖。於本實施例中,電子裝置10a的殼體100a、第二連接管202a、第二管路300a、第三管路340a、電路板480a、第一熱源500a、第二熱源600a以及第三熱源700a的數量皆為兩個。二殼體100a沿重力方向G平行地設置於機櫃50a,而使得二電路板480a上之第一熱源500a、第二熱源600a以及第三熱源700a分別於彼此獨立的兩個空間中進行冷卻。如此一來,作為伺服器機殼的二殼體100a便能設置於既有的機櫃50a而不會有難以維修殼體100a中的電子元件之問題。並且,工作流體也能利用獨立的空間有效地冷卻第一熱源500a、第二熱源600a以及第三熱源700a。本實施例的其他細節應可透過參照以上參閱圖1至圖3所進行的說明而被理解,故不再贅述。Please refer to FIG. 3 . FIG. 3 is a schematic side view of an electronic device according to a second embodiment of the present invention. In this embodiment, the housing 100a of the electronic device 10a, the second connecting pipe 202a, the second pipeline 300a, the third pipeline 340a, the circuit board 480a, the first heat source 500a, the second heat source 600a and the third heat source 700a The number of is two. The two casings 100a are arranged parallel to the cabinet 50a along the gravity direction G, so that the first heat source 500a, the second heat source 600a and the third heat source 700a on the second circuit board 480a are cooled in two independent spaces. In this way, the second housing 100a serving as the server housing can be installed in the existing cabinet 50a without the problem of difficult maintenance of the electronic components in the housing 100a. In addition, the working fluid can effectively cool the first heat source 500a, the second heat source 600a, and the third heat source 700a by using independent spaces. Other details of this embodiment should be understood by referring to the above descriptions with reference to FIG. 1 to FIG. 3 , so details are not repeated here.

根據上述實施例所揭露之散熱系統以及電子裝置,由於第一滴孔於第一區域的開孔率相異於第二滴孔於第二區域的開孔率,因此得以根據熱源的發熱量或其他性質來決定工作流體滴至熱源的量。如此一來,便能降低工作流體的用量同時仍有效地冷卻每一個熱源。According to the heat dissipation system and the electronic device disclosed in the above embodiments, since the opening ratio of the first drop hole in the first region is different from the opening ratio of the second drop hole in the second region, it can be based on the calorific value of the heat source or Other properties determine the amount of working fluid that drops to the heat source. In this way, the amount of working fluid can be reduced while still efficiently cooling each heat source.

在本發明的一實施例中,本發明之散熱系統係可應用於伺服器,該伺服器係可用於人工智慧(英語:Artificial Intelligence,簡稱AI)運算、邊緣運算(Edge Computing),亦可當作5G伺服器、雲端伺服器或車聯網伺服器使用。In one embodiment of the present invention, the heat dissipation system of the present invention can be applied to servers, which can be used for artificial intelligence (English: Artificial Intelligence, AI for short) computing, edge computing (Edge Computing), and can also be used as It can be used as a 5G server, cloud server or Internet of Vehicles server.

雖然本發明以前述之諸項實施例揭露如上,然其並非用以限定本發明,任何熟習相像技藝者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,因此本發明之專利保護範圍須視本說明書所附之申請專利範圍所界定者為準。Although the present invention is disclosed above with the foregoing embodiments, it is not intended to limit the present invention. Any person familiar with similar skills may make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, this The scope of patent protection for inventions shall be defined in the scope of patent application attached to this specification.

10,10a:電子裝置 50,50a:機櫃 100,100a:殼體 101:基座 102:隔板 1021:第一區域 1022:第二區域 1023:第一滴孔 1024:第二滴孔 103:底板 104:側板 105:容置空間 1051:第一容置空間 1052:第二容置空間 106:流入口 107:流出口 108:溢流孔 200:第一管路 201:第一連接管 202,202a:第二連接管 300,300a:第二管路 340,340a:第三管路 400:冷凝器 450:儲液箱 460:幫浦 480,480a:電路板 500,500a:第一熱源 600,600a:第二熱源 700,700a:第三熱源 F:工作流體 G:重力方向 H1:最小高度 H2:預設液位 H3:最大高度 D:流出方向 10,10a: Electronic devices 50,50a: cabinet 100,100a: Shell 101: base 102: Partition 1021: the first area 1022: second area 1023: The first drip hole 1024: Second drip hole 103: Bottom plate 104: side panel 105:Accommodating space 1051: The first storage space 1052: The second storage space 106: Inflow port 107: outflow port 108: overflow hole 200: the first pipeline 201: the first connecting pipe 202,202a: the second connecting pipe 300,300a: the second pipeline 340,340a: the third pipeline 400: condenser 450: Liquid storage tank 460: pump 480, 480a: circuit board 500,500a: first heat source 600,600a: second heat source 700,700a: third heat source F: working fluid G: Gravity direction H1: minimum height H2: preset liquid level H3: maximum height D: outflow direction

圖1為根據本發明第一實施例的電子裝置之側面示意圖。 圖2為圖1中的電子裝置之殼體的側剖示意圖。 圖3為根據本發明第二實施例的電子裝置之側面示意圖。 FIG. 1 is a schematic side view of an electronic device according to a first embodiment of the present invention. FIG. 2 is a schematic side sectional view of the casing of the electronic device in FIG. 1 . FIG. 3 is a schematic side view of an electronic device according to a second embodiment of the present invention.

100:殼體 100: Shell

101:基座 101: base

102:隔板 102: Partition

1021:第一區域 1021: the first area

1022:第二區域 1022: second area

1023:第一滴孔 1023: The first drip hole

1024:第二滴孔 1024: Second drip hole

103:底板 103: Bottom plate

104:側板 104: side panel

105:容置空間 105:Accommodating space

1051:第一容置空間 1051: The first storage space

1052:第二容置空間 1052: The second storage space

106:流入口 106: Inflow port

107:流出口 107: outflow port

108:溢流孔 108: overflow hole

202:第二連接管 202: the second connecting pipe

300:第二管路 300: the second pipeline

340:第三管路 340: The third pipeline

480:電路板 480: circuit board

500:第一熱源 500: first heat source

600:第二熱源 600: second heat source

700:第三熱源 700: The third heat source

F:工作流體 F: working fluid

G:重力方向 G: Gravity direction

H1:最小高度 H1: minimum height

H2:預設液位 H2: preset liquid level

H3:最大高度 H3: maximum height

D:流出方向 D: outflow direction

Claims (10)

一種散熱系統,用以供一工作流體循環並用以冷卻一第一熱源以及一第二熱源,該散熱系統包含:一殼體,包含一基座以及一隔板,該基座包含一容置空間、一流入口以及一流出口,該隔板固定於該基座並位於該容置空間中而將該容置空間分隔成一第一容置空間以及一第二容置空間,該第一容置空間在一重力方向上位於該第二容置空間的上側,該流入口連通於該第一容置空間,該流出口連通於該第二容置空間,該隔板包含一第一區域、一第二區域、至少一第一滴孔以及至少一第二滴孔,該第一區域以及該第二區域彼此相間隔,至少一第一滴孔位於該第一區域,該至少一第二滴孔位於該第二區域,該第一容置空間以及該第二容置空間透過該至少一第一滴孔以及該至少一第二滴孔彼此相連通,該第一熱源以及該第二熱源用以位於該第二容置空間中且彼此相間隔,該工作流體用以透過該至少一第一滴孔滴至該第一熱源並用以透過該至少一第二滴孔滴至該第二熱源;一第一管路,該第一管路的一端連通於該流入口;一第二管路,該第二管路的一端連通於該流出口;以及一冷凝器,該第一管路透過該冷凝器連通於該第二管路;其中,該至少一第一滴孔於該第一區域的開孔率相異於該至少一第二滴孔於該第二區域的開孔率。A heat dissipation system for circulating a working fluid and cooling a first heat source and a second heat source. The heat dissipation system includes: a casing including a base and a partition, and the base includes an accommodating space , an inlet and an outlet, the partition plate is fixed on the base and located in the accommodation space to divide the accommodation space into a first accommodation space and a second accommodation space, the first accommodation space is in Located on the upper side of the second accommodating space in the direction of gravity, the inflow port communicates with the first accommodating space, the outflow port communicates with the second accommodating space, the partition includes a first area, a second region, at least one first drop hole and at least one second drop hole, the first region and the second region are spaced apart from each other, at least one first drop hole is located in the first region, and the at least one second drop hole is located in the In the second area, the first accommodating space and the second accommodating space communicate with each other through the at least one first drop hole and the at least one second drop hole, and the first heat source and the second heat source are used to locate the In the second accommodating space and spaced apart from each other, the working fluid is used to drop to the first heat source through the at least one first drop hole and to drop to the second heat source through the at least one second drop hole; a first first drop hole a pipeline, one end of the first pipeline communicates with the inlet; a second pipeline, one end of the second pipeline communicates with the outlet; and a condenser, the first pipeline communicates through the condenser In the second pipeline; wherein, the opening ratio of the at least one first drop hole in the first region is different from the opening ratio of the at least one second drop hole in the second region. 如請求項1所述之散熱系統,其中該至少一第一滴孔的數量為多個,該至少一第二滴孔的數量為多個,各該第一滴孔的尺寸等於各該第二滴孔的尺寸,該些第一滴孔的數量相異於該些第二滴孔的數量。The cooling system as described in claim 1, wherein the number of the at least one first drop hole is multiple, the number of the at least one second drop hole is multiple, and the size of each first drop hole is equal to the size of each second drop hole. The size of the drop holes, the number of the first drop holes is different from the number of the second drop holes. 如請求項1所述之散熱系統,其中該至少一第一滴孔的數量為多個,該至少一第二滴孔的數量為多個,該些第一滴孔的數量等於該些第二滴孔的數量,各該第一滴孔的尺寸相異於各該第二滴孔的尺寸。The cooling system as described in claim 1, wherein the number of the at least one first drop hole is multiple, the number of the at least one second drop hole is multiple, and the number of the first drop holes is equal to the number of the second drop holes The number of drop holes, the size of each first drop hole is different from the size of each second drop hole. 如請求項1所述之散熱系統,其中該基座更包含一底板以及一側板,該側板立於該底板,該底板、該側板以及該隔板共同形成該第二容置空間,該流出口位於該側板。The heat dissipation system as described in claim 1, wherein the base further includes a bottom plate and a side plate, the side plate stands on the bottom plate, the bottom plate, the side plate and the partition jointly form the second accommodating space, the outflow port located on the side panel. 如請求項4所述之散熱系統,其中該基座更包含一溢流孔,該溢流孔位於該側板,該溢流孔較該流出口還靠近該底板。The heat dissipation system according to claim 4, wherein the base further includes an overflow hole, the overflow hole is located on the side plate, and the overflow hole is closer to the bottom plate than the outlet. 如請求項5所述之散熱系統,其中該溢流孔相對該底板的最小高度等於該工作流體於該第二容置空間中相對該底板的一預設液位。The heat dissipation system as claimed in claim 5, wherein the minimum height of the overflow hole relative to the bottom plate is equal to a preset liquid level of the working fluid in the second accommodating space relative to the bottom plate. 一種電子裝置,用以供一工作流體循環,該電子裝置包含:一殼體,包含一基座以及一隔板,該基座包含一容置空間、一流入口以及一流出口,該隔板固定於該基座並位於該容置空間中而將該容置空間分隔成一第一容置空間以及一第二容置空間,該第一容置空間在一重力方向上位於該第二容置空間的上側,該流入口連通於該第一容置空間,該流出口連通於該第二容置空間,該隔板包含一第一區域、一第二區域、至少一第一滴孔以及至少一第二滴孔,該第一區域以及該第二區域彼此相間隔,至少一第一滴孔位於該第一區域,該至少一第二滴孔位於該第二區域,該第一容置空間以及該第二容置空間透過該至少一第一滴孔以及該至少一第二滴孔彼此相連通;一第一管路,該第一管路的一端連通於該流入口;一第二管路,該第二管路的一端連通於該流出口;一冷凝器,該第一管路透過該冷凝器連通於該第二管路;一第一熱源,位於該基座的該第二容置空間中,該工作流體透過該第一滴孔滴至該第一熱源;以及一第二熱源,位於該基座的該第二容置空間中並與該第一熱源相間隔,該工作流體用以透過該至少一第二滴孔滴至該第二熱源;其中,該至少一第一滴孔於該第一區域的開孔率相異於該至少一第二滴孔於該第二區域的開孔率。An electronic device is used to circulate a working fluid. The electronic device includes: a casing, including a base and a partition, the base includes an accommodating space, an inlet and an outlet, and the partition is fixed on The base is located in the accommodating space and divides the accommodating space into a first accommodating space and a second accommodating space, the first accommodating space is located in a direction of gravity On the upper side, the inlet is connected to the first accommodating space, the outflow is connected to the second accommodating space, and the partition includes a first area, a second area, at least one first drop hole and at least one first drop hole. Two drop holes, the first area and the second area are spaced apart from each other, at least one first drop hole is located in the first area, the at least one second drop hole is located in the second area, the first accommodating space and the The second accommodating space communicates with each other through the at least one first drop hole and the at least one second drop hole; a first pipeline, one end of the first pipeline communicates with the inlet; a second pipeline, One end of the second pipeline communicates with the outlet; a condenser, through which the first pipeline communicates with the second pipeline; a first heat source, located in the second accommodating space of the base wherein, the working fluid drips to the first heat source through the first drip hole; and a second heat source is located in the second accommodation space of the base and is spaced from the first heat source, and the working fluid is used for drop to the second heat source through the at least one second drop hole; wherein, the opening ratio of the at least one first drop hole in the first region is different from the opening ratio of the at least one second drop hole in the second region porosity. 如請求項7所述之電子裝置,其中該至少一第一滴孔的開孔率大於該至少一第二滴孔的開孔率,且該第一熱源的發熱量大於該第二熱源的發熱量。The electronic device according to claim 7, wherein the opening ratio of the at least one first drop hole is greater than the opening ratio of the at least one second drop hole, and the heat generation of the first heat source is greater than the heat generation of the second heat source quantity. 如請求項7所述之電子裝置,其中該基座更包含一底板以及一側板,該側板立於該底板,該底板、該側板以及該隔板共同形成該第二容置空間,該至少一第一滴孔的開孔率大於該至少一第二滴孔的開孔率,且該第一熱源相對該底板的最大高度大於該第二熱源相對該底板的最大高度。The electronic device according to claim 7, wherein the base further includes a bottom plate and a side plate, the side plate stands on the bottom plate, the bottom plate, the side plate and the partition jointly form the second accommodating space, and the at least one The opening ratio of the first drop hole is greater than that of the at least one second drop hole, and the maximum height of the first heat source relative to the bottom plate is greater than the maximum height of the second heat source relative to the bottom plate. 如請求項7所述之電子裝置,更包含一第三熱源,該基座更包含一底板以及一側板,該側板立於該底板,該底板、該側板以及該隔板共同形成該第二容置空間,該第三熱源位於該第二容置空間中並與該第一熱源以及該第二熱源相間隔,該第三熱源相對該底板的最大高度小於該工作流體於該第二容置空間中相對該底板的一預設液位,滴至該第一熱源以及該第二熱源的該工作流體用以累積於該第二容置空間中而用以冷卻該第三熱源。The electronic device as described in claim 7 further includes a third heat source, the base further includes a bottom plate and a side plate, the side plate stands on the bottom plate, the bottom plate, the side plate and the partition jointly form the second container storage space, the third heat source is located in the second storage space and is spaced from the first heat source and the second heat source, and the maximum height of the third heat source relative to the bottom plate is smaller than that of the working fluid in the second storage space The working fluid dripped onto the first heat source and the second heat source is accumulated in the second accommodating space to cool the third heat source at a preset liquid level relative to the bottom plate.
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