TW202310133A - Transfer preparation method of frame unit capable of confirming whether the unit for transferring a frame unit in a processing device is adjusted in a manner to match the size of an annular frame - Google Patents

Transfer preparation method of frame unit capable of confirming whether the unit for transferring a frame unit in a processing device is adjusted in a manner to match the size of an annular frame Download PDF

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TW202310133A
TW202310133A TW111130662A TW111130662A TW202310133A TW 202310133 A TW202310133 A TW 202310133A TW 111130662 A TW111130662 A TW 111130662A TW 111130662 A TW111130662 A TW 111130662A TW 202310133 A TW202310133 A TW 202310133A
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frame
unit
size
suction
ring frame
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TW111130662A
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Chinese (zh)
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庄司啓一
米谷雅紀
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日商迪思科股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67745Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67253Process monitoring, e.g. flow or thickness monitoring
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742Mechanical parts of transfer devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Dicing (AREA)

Abstract

Capable of confirming whether the unit for transferring a frame unit in a processing device is adjusted in a manner to match the size of an annular frame. To register in advance the size of the annular frame of the frame unit in which the substrate is held in the opening of the annular frame through a sheet, and adjust the spacing between a pair of guide units carrying the annular frame in a manner of matching the registered size. A suction unit (83) of a conveying arm (8) is positioned at a position in contact with the upper surface (42) of the guide units and carries out suction. When the measured value of the pressure gauge at this time is greater than the threshold value, it is determined that the position of the suction unit (83) of the conveying arm (8) is consistent with the size of the annular frame.

Description

框架單元的搬送準備方法Transport preparation method of frame unit

本發明係關於一種框架單元的搬送準備方法,其在搬送透過薄片將基板保持於環狀框架的開口而成之框架單元前,確認環狀框架的尺寸。The present invention relates to a transport preparation method of a frame unit, which confirms the size of the ring frame before transporting the frame unit formed by holding the substrate in the opening of the ring frame through a sheet.

透過薄片並藉由環狀框架支撐基板而成之構成的框架單元的環狀框架有多種尺寸。而且,在處理框架單元之各種裝置中,為了對應多種尺寸的環狀框架,裝置內的搬送臂所具備之吸附墊、在保持台的周圍支撐框架之框架支撐單元等,變得能因應環狀框架的尺寸而調整位置(例如,參照專利文獻1、專利文獻2)。 [習知技術文獻] [專利文獻] The ring frame of the frame unit formed by passing through the sheet and supporting the substrate by the ring frame has various sizes. Moreover, in various devices for processing frame units, in order to correspond to various sizes of ring frames, the suction pads provided in the transfer arms in the devices, the frame support units that support the frames around the holding table, etc., have become able to respond to ring frames. The position is adjusted according to the size of the frame (for example, refer to Patent Document 1 and Patent Document 2). [Prior art literature] [Patent Document]

[專利文獻1]日本特開2019-220634公報。 [專利文獻2]日本特許第5956112號。 [Patent Document 1] Japanese Unexamined Patent Application Publication No. 2019-220634. [Patent Document 2] Japanese Patent No. 5956112.

[發明所欲解決的課題] 搬送臂的吸附墊、設置於保持台的周圍之框架支撐單元若發生位置調整的作業疏失,則此等會在未配合環狀框架的尺寸之狀態下搬送框架單元,而有產生錯誤之虞。 [Problems to be Solved by the Invention] If the suction pad of the transfer arm and the frame support unit installed around the holding table are inadvertently adjusted in position, the frame unit may be transferred in a state that does not match the size of the ring frame, and errors may occur.

另一方面,為了確認環狀框架的尺寸與框架支撐單元等各單元的尺寸是否配合,亦能設置感測器或攝影機,但會增加成本。On the other hand, in order to confirm whether the size of the ring frame matches the size of each unit such as the frame support unit, a sensor or a camera can also be provided, but the cost will increase.

本發明係鑑於此種問題而完成,其課題在於不招致成本的增加,而可確認在處理裝置內搬送或保持框架單元之各單元是否被調整成配合環狀框架的尺寸。The present invention was made in view of such a problem, and an object of the present invention is to confirm whether each unit that transports or holds a frame unit in a processing device is adjusted to match the size of the ring frame without incurring an increase in cost.

[解決課題的技術手段] 本發明係一種框架單元的搬送準備方法,其在處理裝置中確認吸附部是否配合環狀框架的尺寸進行調整,該處理裝置具備:一對導引部,其支撐透過薄片將基板保持於該環狀框架的開口而成之框架單元的兩端;保持台,其包含支撐該環狀框架之框架支撐單元;處理單元,其處理保持於該保持台之該框架單元;搬送臂,其具有因應該環狀框架的尺寸而能移動地設置且吸附該環狀框架之該吸附部,並將該框架單元從該導引部搬送至該保持台;壓力計,其設置於使該吸附部與吸引源連通之吸引路徑;驅動部,其配合該環狀框架的尺寸而調整該導引部的間隔;以及控制部,並且,該框架單元的搬送準備方法具備:尺寸登錄步驟,其將該環狀框架的尺寸登錄於該控制部;導引部調整步驟,其將該導引部的間隔調整成在該尺寸登錄步驟所登錄之尺寸;第一吸引步驟,其在實施該導引部調整步驟後,將該吸附部定位於與該導引部的上表面接觸之位置並進行吸引;以及第一判定步驟,其在該壓力計的測量值大於閾值之情形,判定該搬送臂的吸附部的位置與該環狀框架的尺寸一致。 在上述框架單元的搬送準備方法中,較佳為在該框架支撐單元係因應該環狀框架的尺寸而能移動地設置於該保持台的外側之情形中,該框架單元的搬送準備方法具備:第二吸引步驟,其將在該第一判定步驟中被判定為與該環狀框架的尺寸一致之該吸附部定位於與該框架支撐單元接觸之位置並進行吸引;以及第二判定步驟,其在該壓力計的測量值大於閾值之情形,判定該框架支撐單元的位置與該環狀框架的尺寸一致。 [Technical means to solve the problem] The present invention relates to a transport preparation method of a frame unit. It is confirmed in a processing device whether the suction part is adjusted to match the size of the ring frame. The two ends of the frame unit formed by the opening of the circular frame; the holding table, which includes the frame support unit supporting the ring frame; the processing unit, which handles the frame unit held on the holding table; the transfer arm, which has corresponding The size of the ring frame can be movably arranged and adsorbed by the suction part of the ring frame, and the frame unit is transported from the guide part to the holding table; the pressure gauge is arranged so that the suction part and the suction source a connected suction path; a drive unit that adjusts the interval of the guide unit in accordance with the size of the ring frame; The size of the guide part is registered in the control part; the guide part adjustment step, which adjusts the interval of the guide part to the size registered in the size registration step; the first suction step, after implementing the guide part adjustment step, positioning the suction portion at a position in contact with the upper surface of the guide portion and performing suction; and a first judging step of judging whether the position of the suction portion of the transfer arm is consistent with The ring frame is uniform in size. In the above frame unit transfer preparation method, preferably in the case where the frame support unit is movably provided outside the holding table according to the size of the ring frame, the frame unit transfer preparation method includes: a second attracting step of positioning and attracting the suction part judged to be consistent with the size of the ring frame in the first judging step at a position in contact with the frame supporting unit; and a second judging step of When the measured value of the pressure gauge is greater than the threshold, it is determined that the position of the frame support unit is consistent with the size of the ring frame.

[發明功效] 在本發明中,因以因應環狀框架的尺寸所調整之導引部為基準,確認搬送臂的吸附部的位置,故可不使用追加零件等而確認搬送臂的吸附部的位置是否正確。因此,可防止在由搬送臂所進行之框架單元的搬送時產生錯誤。 並且,因以在第一判定步驟中被判定為與環狀框架的尺寸一致之吸附部為基準,確認框架支撐單元的位置,故可不使用追加零件等而確認框架支撐單元是否適合環狀框架的尺寸。 [Efficacy of the invention] In the present invention, since the position of the suction part of the transfer arm is confirmed based on the guide part adjusted according to the size of the ring frame, it is possible to confirm whether the position of the suction part of the transfer arm is correct without using additional parts or the like. Therefore, it is possible to prevent errors in transporting the frame unit by the transport arm. In addition, since the position of the frame support unit is confirmed based on the suction portion determined to match the size of the ring frame in the first determination step, it is possible to confirm whether the frame support unit fits the ring frame without using additional parts or the like. size.

1 切割裝置的構成 圖1所示之切割裝置1為切割各種基板11之裝置,被加工物亦即基板11被黏貼於薄片12,薄片12係以塞住環狀框架13的開口之方式被黏貼,整體被構成為框架單元10。圖2所示之一例之基板11為藉由分割預定線110所劃分並在正面形成有多個元件111之半導體晶圓。環狀框架13的內周被形成為圓形且外周四邊具備直線部130。環狀框架13係因應基板11的直徑而準備有多種尺寸。例如,在基板11為半導體晶圓之情形,基板11的尺寸例如有六吋與八吋,環狀框架13亦配合於此而準備尺寸不同的兩個種類。尺寸不同的環狀框架13係相面對的兩個平行的直線部130之間的距離14不同。 1 The composition of the cutting device The cutting device 1 shown in FIG. 1 is a device for cutting various substrates 11. The processed object, that is, the substrate 11, is pasted on the sheet 12. The sheet 12 is pasted in such a way as to block the opening of the ring frame 13, and the whole is constituted as Frame unit 10. An example of the substrate 11 shown in FIG. 2 is a semiconductor wafer divided by dividing lines 110 and having a plurality of elements 111 formed on the front surface. The inner circumference of the ring frame 13 is formed in a circular shape, and the outer circumference is provided with a linear portion 130 . The ring frame 13 is prepared in various sizes according to the diameter of the substrate 11 . For example, when the substrate 11 is a semiconductor wafer, the size of the substrate 11 is, for example, 6 inches and 8 inches, and the ring frame 13 is also matched with this to prepare two types with different sizes. The distances 14 between the two facing parallel straight portions 130 of the annular frames 13 with different sizes are different.

切割裝置1具備:卡匣載置區域2,其載置容納多個框架單元10之卡匣21;推拉機構3,其進行框架單元10對於卡匣21之搬出搬入;定位機構4,其將框架單元10定位於固定的位置;保持台5,其保持框架單元10;兩個切割單元6,其等切割保持於保持台5之基板11;清洗機構7,其清洗切割後的基板11;以及搬送臂8,其在定位機構4與清洗機構7之間搬送框架單元10。The cutting device 1 is equipped with: a cassette loading area 2, which is loaded with a cassette 21 for accommodating a plurality of frame units 10; a push-pull mechanism 3, which carries out the frame unit 10 into and out of the cassette 21; a positioning mechanism 4, which places the frame The unit 10 is positioned at a fixed position; the holding table 5 holds the frame unit 10; two cutting units 6 cut and hold the substrate 11 held on the holding table 5; the cleaning mechanism 7 cleans the cut substrate 11; and conveys The arm 8 transports the frame unit 10 between the positioning mechanism 4 and the cleaning mechanism 7 .

卡匣載置區域2能升降。卡匣2在內部具備多層的槽,各槽分別容納有框架單元10。The cassette loading area 2 can be raised and lowered. The cassette 2 has multiple layers of grooves inside, and each groove accommodates the frame unit 10 .

推拉機構3具備:夾持部31,其夾持環狀框架13;臂32,其支撐夾持部31;升降驅動部33,其使夾持部31及臂32在Z軸方向升降;以及移動部34,其使升降驅動部33沿著於Y軸方向延伸之導軌35而在Y軸方向移動。The push-pull mechanism 3 is provided with: a clamping part 31, which clamps the annular frame 13; an arm 32, which supports the clamping part 31; an elevating driving part 33, which lifts the clamping part 31 and the arm 32 in the Z-axis direction; The part 34 moves the lifting driving part 33 in the Y-axis direction along the guide rail 35 extending in the Y-axis direction.

定位機構4具備於Y軸方向延伸之一對導引部41。各導引部41係由載置面42與壁部43所構成之剖面為L字狀的構件,所述載置面42係與XY平面平行的面且載置環狀框架13,所述壁部43係從載置面42的X軸方向端部立設,並且,一導引部41的壁部43與另一導引部41的壁部43係在X軸方向面對。定位機構4具備以在X軸方向接近或分開之方式驅動一對導引部41之驅動部44,且能根據記憶於記憶部之環狀框架的尺寸,配合環狀框架13的尺寸而調整兩個導引部41的間隔。The positioning mechanism 4 is provided with a pair of guide parts 41 extending in the Y-axis direction. Each guide portion 41 is a member having an L-shaped cross-section formed by a mounting surface 42 and a wall portion 43. The mounting surface 42 is a plane parallel to the XY plane on which the annular frame 13 is placed. The portion 43 stands upright from the end portion of the mounting surface 42 in the X-axis direction, and the wall portion 43 of one guide portion 41 and the wall portion 43 of the other guide portion 41 face each other in the X-axis direction. The positioning mechanism 4 is equipped with a driving part 44 that drives a pair of guide parts 41 to approach or separate in the X-axis direction, and can adjust the size of the ring frame 13 according to the size of the ring frame memorized in the memory part. The interval of each guide part 41.

如圖3所示,保持台5具備:吸引部51,其透過薄片12吸引保持基板11;框體52,其支撐吸取部51;四個框架支撐單元53,其被固定於框體52的外周部;以及旋轉驅動部57,其以Z軸方向的旋轉軸為中心使此等旋轉。吸引部51的上表面亦即保持面510與框體52的上表面520被形成為同一平面。 各框架支撐單元53能沿著從框體52往外側延伸之一對軸部530滑動,並能因應環狀框架13的尺寸而移動。各框架支撐單元53係由下述構件所構成:支撐板54,其從下方支撐環狀框架13;推壓部55,其能相對於支撐板54以水平方向的軸為中心進行旋轉,且將載置於支撐板54之環狀框架13從上方推壓,而在與支撐板54之間夾持環狀框架13;以及驅動部56,其旋轉驅動推壓部55。 As shown in FIG. 3 , the holding table 5 is provided with: a suction part 51, which sucks and holds the substrate 11 through the sheet 12; a frame body 52, which supports the suction part 51; and four frame support units 53, which are fixed to the outer periphery of the frame body 52. section; and a rotation drive section 57 that rotates these around the rotation axis in the Z-axis direction. The holding surface 510 which is the upper surface of the suction part 51 and the upper surface 520 of the housing 52 are formed to be flush with each other. Each frame supporting unit 53 can slide along a pair of shafts 530 extending outward from the frame body 52 , and can move according to the size of the ring frame 13 . Each frame support unit 53 is constituted by the following members: a support plate 54, which supports the ring frame 13 from below; The annular frame 13 mounted on the support plate 54 is pressed from above, and the annular frame 13 is sandwiched between the support plate 54 ; and the driving unit 56 rotates and drives the pressing unit 55 .

圖1所示之切割單元6為對基板11實施切割處理之處理單元,兩個切割單元6具備以Y軸方向的軸為中心進行旋轉之切割刀片61。兩個切割單元6能在Y軸方向及Z軸方向移動。The dicing unit 6 shown in FIG. 1 is a processing unit for dicing a substrate 11, and the two dicing units 6 include a dicing blade 61 that rotates around an axis in the Y-axis direction. The two cutting units 6 can move in the Y-axis direction and the Z-axis direction.

清洗機構7具備:旋轉台71,其能旋轉及升降,且保持基板10的切割後的工件單元10並能高速旋轉;以及未圖示之噴嘴,其保持於旋轉台71,並對旋轉之基板11噴出清洗液。The cleaning mechanism 7 is equipped with: a rotary table 71, which can rotate and lift, and holds the cut workpiece unit 10 of the substrate 10 and can rotate at a high speed; 11Spray out the cleaning fluid.

如圖4所示,搬送臂8具備:第一臂81,其於X軸方向延伸;一對第二臂82,其等在相對於第一臂81在水平方向交叉之Y軸方向延伸;以及吸附部83,其在各第二臂82的下表面側分別安裝兩個。吸附部83係透過吸引路徑85而與負壓產生單元84連通。並且,在吸引路徑85連接有壓力計86。 在第二臂82的下表面側配設未圖示之柱塞,在第一臂81的上表面具備多個會與柱塞的前端部嵌合之凹狀的被嵌合部810。亦即,能使第二臂82在第一臂81的延伸方向亦即箭頭820的方向滑動,並能使柱塞的前端嵌合於被嵌合部810而固定,並且,藉由手動變更第二臂82的位置,而能配合環狀框架13的尺寸而調整吸附部83的位置。 如圖1所示,第一臂81能升降地被升降驅動部87支撐。升降驅動部87能沿著於Y軸方向延伸之導軌88而在Y軸方向移動。 As shown in FIG. 4 , the transfer arm 8 is provided with: a first arm 81 extending in the X-axis direction; a pair of second arms 82 extending in the Y-axis direction intersecting with the first arm 81 in the horizontal direction; and Two adsorption parts 83 are attached to the lower surfaces of the second arms 82 . The suction part 83 communicates with the negative pressure generating unit 84 through the suction path 85 . Furthermore, a pressure gauge 86 is connected to the suction path 85 . A plunger (not shown) is disposed on the lower surface side of the second arm 82 , and a plurality of concave fitted portions 810 that are fitted to the tip end of the plunger are provided on the upper surface of the first arm 81 . That is, the second arm 82 can be slid in the direction of the arrow 820 which is the extension direction of the first arm 81, and the front end of the plunger can be fitted into the fitted portion 810 to be fixed, and the second arm 82 can be manually changed. The position of the two arms 82 can match the size of the ring frame 13 to adjust the position of the adsorption part 83 . As shown in FIG. 1 , the first arm 81 is supported by a lift drive unit 87 so as to be able to move up and down. The lift driving part 87 can move in the Y-axis direction along the guide rail 88 extending in the Y-axis direction.

切割裝置1具備:卡匣載置區域2、推拉機構3、定位機構4、保持台5、切割單元6、清洗機構7、搬送臂8及控制各單元之控制部9。The cutting device 1 includes: a cassette loading area 2, a push-pull mechanism 3, a positioning mechanism 4, a holding table 5, a cutting unit 6, a cleaning mechanism 7, a transfer arm 8, and a control unit 9 for controlling each unit.

2 切割時的動作 在圖1所示之切割裝置1中,將在多層容納有多個框架單元10之卡匣21載置於卡匣載置區域2。首先,使卡匣載置區域2升降,而使容納有具有欲切割之基板11之框架單元10之槽的高度位置配合推拉機構3的夾持部31的高度位置。然後,先使兩個導引部41的壁部43之間的間隔稍微大於環狀框架13的尺寸,在此狀態下,使推拉機構3往-Y方向移動,並藉由夾持部31而夾持環狀框架13,其後,使推拉機構3往+Y方向移動,且在導引部41的載置面42上載置框架單元10,並藉由導引部41而支撐框架單元10的X軸方向的兩端。其後,解除由夾持部31所進行之環狀框架13的夾持,使推拉機構3往+Y方向撤離。 2 Actions during cutting In the cutting device 1 shown in FIG. 1 , a cassette 21 accommodating a plurality of frame units 10 in multiple layers is placed on the cassette mounting area 2 . Firstly, the cassette loading area 2 is raised and lowered so that the height position of the slot containing the frame unit 10 with the substrate 11 to be cut matches the height position of the clamping portion 31 of the push-pull mechanism 3 . Then, first make the distance between the wall parts 43 of the two guide parts 41 slightly larger than the size of the ring frame 13. Clamp the ring-shaped frame 13, and then move the push-pull mechanism 3 in the +Y direction, place the frame unit 10 on the mounting surface 42 of the guide part 41, and support the X position of the frame unit 10 by the guide part 41. both ends of the axis. Thereafter, the clamping of the annular frame 13 by the clamping portion 31 is released, and the push-pull mechanism 3 is withdrawn in the +Y direction.

接著,驅動部44使一對導引部41往互相接近的方向移動,且藉由壁部43而推壓環狀框架13的兩端,藉此將框架單元10定位於固定的位置。然後,使搬送臂8往-Y方向移動並位於框架單元10的上方,在此狀態下,使搬送臂8下降,使吸附部83接觸環狀框架13的上表面,且使吸附部83與負壓產生單元84連通,藉此吸附環狀框架13。然後,在驅動部44使一對導引部41往互相分開之方向移動後,升降驅動部87使搬送臂8上升,藉此使框架單元10上升。Next, the driving part 44 moves the pair of guide parts 41 toward each other, and pushes the two ends of the ring frame 13 through the wall part 43, thereby positioning the frame unit 10 at a fixed position. Then, the transport arm 8 is moved in the -Y direction and positioned above the frame unit 10. In this state, the transport arm 8 is lowered so that the suction part 83 contacts the upper surface of the ring frame 13, and the suction part 83 and the negative The pressure generating unit 84 communicates, whereby the annular frame 13 is adsorbed. Then, after the driving unit 44 moves the pair of guide units 41 in a direction away from each other, the lifting driving unit 87 raises the transport arm 8 to thereby raise the frame unit 10 .

藉由使保持台5往+X方向移動,而先使保持台5位於藉由搬送臂8所保持之框架單元10的下方。然後,在已使導引部41分開之狀態下,升降驅動部87使搬送臂8下降,並將藉由吸附部83所保持之框架單元10載置於保持台5。亦即,將基板11載置於保持面510,並將環狀框架13載置於框架支撐單元53的支撐板54。然後,使吸引力作用於保持台5的吸引部51,且藉由框架支撐單元53的推壓部55而在與支撐板54之間保持環狀框架13。然後,解除由搬送臂8的吸附部83所進行之吸附,升降驅動部87使搬送臂8上升並撤離。By moving the holding table 5 in the +X direction, the holding table 5 is first positioned below the frame unit 10 held by the transfer arm 8 . Then, in the state where the guide part 41 is separated, the lifting drive part 87 lowers the conveyance arm 8 and mounts the frame unit 10 held by the suction part 83 on the holding table 5 . That is, the substrate 11 is placed on the holding surface 510 , and the ring frame 13 is placed on the support plate 54 of the frame support unit 53 . Then, a suction force is applied to the suction portion 51 of the holding table 5 , and the ring-shaped frame 13 is held between the support plate 54 by the pressing portion 55 of the frame support unit 53 . Then, the suction by the suction unit 83 of the transport arm 8 is released, and the lift drive unit 87 lifts the transport arm 8 and withdraws it.

接著,保持台5往-X方向移動並接近切割單元6。然後,在檢測出應切割的分割預定線110後,保持台5往-X方向移動且旋轉之切割刀片61切入所檢測出之分割預定線110,而切割該分割預定線110。然後,藉由一邊使切割刀片61於Y軸方向移動一邊重複同樣的切割,而切割相同方向的所有的分割預定線110。再者,若在使保持台5旋轉90度後進行同樣的切割,則所有的分割預定線110被縱橫地切割,而被分割成一個個具元件111的晶片。Next, the holding table 5 moves in the −X direction and approaches the cutting unit 6 . Then, after the planned dividing line 110 to be cut is detected, the holding table 5 moves in the −X direction and the rotating cutting blade 61 cuts into the detected planned dividing line 110 to cut the planned dividing line 110 . Then, by repeating the same cutting while moving the cutting blade 61 in the Y-axis direction, all the planned dividing lines 110 in the same direction are cut. Furthermore, when the same dicing is performed after the holding table 5 is rotated by 90 degrees, all the planned dividing lines 110 are cut vertically and horizontally, and are divided into individual wafers having elements 111 .

在切割結束後,保持台5返回至原來的位置(導引部41的下方)。然後,在已使導引部41分開之狀態下,升降驅動部87使搬送臂8下降,使吸附部83接觸環狀框架13的上表面,使吸附部83與負壓產生單元84連通,而吸附環狀框架13。然後,升降驅動部87使搬送臂8上升,在使框架單元10提升至比導引部41更上方且使導引部41稍微接近後,使搬送臂8下降,將框架單元10載置於導引部41的載置面42。然後,在解除吸附部83的吸附並使搬送臂8上升後,使導引部41接近並藉由壁部43而從兩側推壓框架單元10,藉此定位框架單元10。After the cutting is completed, the holding table 5 returns to its original position (below the guide portion 41 ). Then, in the state where the guide part 41 has been separated, the lifting drive part 87 lowers the conveying arm 8, makes the suction part 83 contact the upper surface of the ring frame 13, and makes the suction part 83 communicate with the negative pressure generating unit 84, and Suction ring frame 13. Then, the lifting drive unit 87 raises the conveying arm 8, lifts the frame unit 10 above the guide portion 41 and brings the guide portion 41 slightly close to it, then lowers the conveying arm 8 to place the frame unit 10 on the guide. The mounting surface 42 of the lead portion 41 . Then, after the suction of the suction part 83 is released and the transfer arm 8 is raised, the guide part 41 is approached and the frame unit 10 is pushed from both sides by the wall part 43 to position the frame unit 10 .

如此進行而將框架單元10定位後,升降驅動部87再次使搬送臂8下降,使吸附部83接觸環狀框架13的上表面,使吸附部83與負壓產生單元84連通,而吸附環狀框架13。然後,在已使導引部41分開後,使搬送臂8上升。After the frame unit 10 is positioned in this way, the lifting drive part 87 lowers the conveying arm 8 again, makes the adsorption part 83 contact the upper surface of the annular frame 13, makes the adsorption part 83 communicate with the negative pressure generating unit 84, and adsorbs the annular frame. frame13. Then, after separating the guide part 41, the conveyance arm 8 is raised.

接著,使搬送臂8往+Y方向移動,在使框架單元10位於清洗機構7的旋轉台71的上方後,使搬送臂8下降,將框架單元10載置於旋轉台71。然後,在旋轉台71中吸引保持框架單元10,解除吸附部83的吸附,使搬送臂8上升。接著,一邊使旋轉台71高速旋轉,一邊對基板11噴出清洗液,藉此清洗基板11的表面。清洗結束後,對基板10噴出高壓氣體而去除清洗液,停止旋轉台71的旋轉,使搬送臂8下降,使吸附部83接觸環狀框架13,使吸附部83與負壓產生單元84連通後,使搬送臂8上升。Next, the transport arm 8 is moved in the +Y direction to position the frame unit 10 above the turntable 71 of the cleaning mechanism 7 , and then the transport arm 8 is lowered to place the frame unit 10 on the turntable 71 . Then, the frame unit 10 is sucked and held on the turntable 71 , the suction of the suction unit 83 is released, and the transfer arm 8 is raised. Next, while rotating the turntable 71 at a high speed, the cleaning liquid is sprayed onto the substrate 11 to clean the surface of the substrate 11 . After the cleaning is completed, spray high-pressure gas to the substrate 10 to remove the cleaning liquid, stop the rotation of the turntable 71, lower the transfer arm 8, make the adsorption part 83 contact the ring frame 13, and connect the adsorption part 83 and the negative pressure generating unit 84. , so that the transfer arm 8 rises.

接著,使搬送臂8往-Y方向移動且位於導引部41的上方。然後,使搬送臂8下降而將框架單元10載置於導引部41的載置面42。然後,在使導引部41接近並定位框架單元10後,藉由推拉機構3的夾持部31而夾持環狀框架13,使推拉機構3往-Y方向移動,而將框架單元10容納於卡匣21的原來的槽。Next, the transfer arm 8 is moved in the −Y direction and positioned above the guide portion 41 . Then, the transport arm 8 is lowered to place the frame unit 10 on the placement surface 42 of the guide part 41 . Then, after the guide part 41 is approached to position the frame unit 10, the ring frame 13 is clamped by the clamping part 31 of the push-pull mechanism 3, and the push-pull mechanism 3 is moved in the -Y direction to accommodate the frame unit 10. in the original slot of the cassette 21.

藉由對容納於卡匣21之所有的框架單元10進行上述動作,而將所有的構成框架單元10之基板11進行切割。By performing the above operation on all the frame units 10 accommodated in the cassette 21, all the substrates 11 constituting the frame units 10 are cut.

3 搬送準備方法 基板11有各種尺寸,因應於此,環狀框架13的尺寸亦不同。因此,如上述般進行而切割基板11時,需要一邊對應環狀框架13的尺寸的差異,一邊在切割裝置1內順暢地搬送框架單元10。於是,在切割裝置1中進行實際的切割前,如以下般進行,而確認搬送臂8的吸附部83是否配合環狀框架13的尺寸被調整。 3 Transfer preparation method The substrate 11 has various sizes, and accordingly, the size of the ring frame 13 is also different. Therefore, when cutting the substrate 11 as described above, it is necessary to smoothly transport the frame unit 10 within the cutting device 1 while coping with the difference in size of the ring frame 13 . Then, before actual cutting in the cutting device 1 , it is confirmed as follows whether or not the suction portion 83 of the transport arm 8 is adjusted in accordance with the size of the ring frame 13 .

1 尺寸登錄步驟 將包含欲切割之基板11之用來支撐的環狀框架13的尺寸登錄於控制部9所具備之記憶部。此登錄係使用切割裝置1所具備之輸入手段例如未圖示之觸控面板而被輸入。例如,若輸入基板11為六吋或八吋,則可將因應於此之環狀框架13的尺寸記憶於記憶部。並且,因也有在可支撐八吋之八吋規格的環狀框架13支撐六吋的基板11等環狀框架13的尺寸與基板11的尺寸不一致之情形,故亦可將環狀框架13的尺寸與基板11的尺寸分別輸入並登錄於記憶部。環狀框架13的尺寸例如藉由圖2所示之環狀框架13的直線部130之間的距離14所示。此外,也可將環狀框架13的內徑、可支撐之最大直徑的基板11的尺寸作為環狀框架13的尺寸。 1 Size registration steps The size of the supporting ring frame 13 including the substrate 11 to be cut is registered in the memory unit included in the control unit 9 . This registration is input using an input means included in the cutting device 1, for example, a touch panel not shown. For example, if the input substrate 11 is six inches or eight inches, the corresponding size of the ring frame 13 can be stored in the memory part. And, because also have the situation that the size of ring frame 13 and the size of base plate 11 such as supporting the base plate 11 of six inches in the ring frame 13 that can support eight inches of eight inches of specifications are inconsistent, so also can make the size of ring frame 13 It is input separately from the size of the substrate 11 and registered in the memory. The size of the ring frame 13 is represented by the distance 14 between the straight portions 130 of the ring frame 13 shown in FIG. 2 , for example. In addition, the inner diameter of the ring frame 13 and the size of the substrate 11 with the largest diameter that can be supported may be used as the size of the ring frame 13 .

2 導引部調整步驟 接著,以配合在尺寸登錄步驟中登錄於控制部9之環狀框架13的尺寸之方式,控制部9調整定位機構4的導引部41的間隔。亦即,驅動部44驅動導引部41,使圖5所示之構成導引部41之兩個壁部43之間的間隔45配合環狀框架13的尺寸亦即圖2所示之距離14。兩個壁部43之間的間隔先稍微(數mm左右)大於環狀框架13的距離14。 2. Guidance adjustment steps Next, the control unit 9 adjusts the interval between the guide portions 41 of the positioning mechanism 4 so as to match the size of the annular frame 13 registered in the control unit 9 in the size registration step. That is, the driving part 44 drives the guide part 41 so that the distance 45 between the two wall parts 43 forming the guide part 41 shown in FIG. . The distance between the two wall parts 43 is slightly (about several millimeters) larger than the distance 14 of the ring frame 13 .

3 第一吸引步驟 在實施導引部調整步驟後,沿著圖1所示之導軌88使升降驅動部87及搬送臂8在Y軸方向移動,並將吸附部83定位於導引部41的上方。然後,升降驅動部87使搬送臂8下降,將吸附部83定位於與導引部41的載置面42接觸之位置。然後,使吸附部83與負壓產生單元84連通,而使吸引力作用於吸附部83。 3 The first attraction step After implementing the guide part adjustment step, move the lifting drive part 87 and the transfer arm 8 in the Y-axis direction along the guide rail 88 shown in FIG. 1 , and position the suction part 83 above the guide part 41 . Then, the lift drive unit 87 lowers the transfer arm 8 to position the suction unit 83 at a position in contact with the placement surface 42 of the guide unit 41 . Then, the suction portion 83 is communicated with the negative pressure generating unit 84 , and suction is applied to the suction portion 83 .

4 第一判定步驟 接著,控制部9讀取圖4所示之壓力計86的測量值,在該負壓的測量值的絕對值大於預定的閾值之情形,如圖5所示,認為吸附部83與載置面42密接,因此判定吸附部83的位置與環狀框架13的尺寸一致。此外,在圖示的例子中,吸附部83有四個,因此以僅在所有的吸附部83與載置面42密接時負壓的測量值的絕對值大於閾值之方式,使控制部9的記憶部記憶預定的閾值。 另一方面,在壓力計86的負壓的測量值的絕對值小於預定的閾值之情形,認為吸附部83未與載置面42密接,判定吸附部83的位置未對應環狀框架13的尺寸。例如圖6所示,吸附部83位於比導引部41更內側且未與載置面42接觸之情形,判定吸附部83位於與尺寸小於應對應的環狀框架13的尺寸者對應之位置,並進行在未圖示之顯示部顯示錯誤訊息等動作。 4 The first judgment step Next, the control unit 9 reads the measured value of the pressure gauge 86 shown in FIG. 4, and when the absolute value of the measured value of the negative pressure is greater than a predetermined threshold value, as shown in FIG. 42 in close contact, it is determined that the position of the suction portion 83 matches the size of the ring frame 13 . In addition, in the illustrated example, since there are four adsorption parts 83, the absolute value of the measured value of the negative pressure is greater than the threshold value only when all the adsorption parts 83 are in close contact with the mounting surface 42. The memory unit memorizes a predetermined threshold value. On the other hand, when the absolute value of the negative pressure measured by the pressure gauge 86 is smaller than the predetermined threshold value, it is considered that the adsorption portion 83 is not in close contact with the mounting surface 42, and it is determined that the position of the adsorption portion 83 does not correspond to the size of the ring frame 13. . For example, as shown in FIG. 6 , when the adsorption portion 83 is located inside the guide portion 41 and is not in contact with the mounting surface 42, it is determined that the adsorption portion 83 is located at a position corresponding to a size smaller than the size of the corresponding ring frame 13, It also performs operations such as displaying an error message on a display unit not shown in the figure.

此外,在圖4所示之搬送臂8的例子中,雖對於四個吸附部83連接一個負壓產生單元84,且在與所有的吸附部83共通之吸引路徑85連接一個壓力計,但也可為在與各吸附部83對應之吸引路徑個別地連接壓力計之構成。此情形,個別地讀取負壓的測量值,並在所有的壓力計中之個別的負壓的測量值的絕對值大於預定的閾值之情形,判定吸附部83的位置適合環狀框架13的尺寸。In addition, in the example of the transfer arm 8 shown in FIG. A pressure gauge may be individually connected to the suction path corresponding to each suction part 83 . In this case, the measured value of the negative pressure is read individually, and when the absolute value of the measured value of the individual negative pressure among all the pressure gauges is greater than a predetermined threshold value, it is determined that the position of the adsorption part 83 is suitable for the position of the ring frame 13. size.

如此,在切割基板11前,以因應環狀框架13的尺寸而藉由控制部9所調整之導引部41為基準,事先確認吸附部83是否適合環狀框架13的尺寸,藉此可不使用追加零件等而防止在由搬送臂8所進行之框架單元10的搬送時產生錯誤。In this way, before cutting the substrate 11, it is confirmed in advance whether the suction part 83 is suitable for the size of the ring frame 13 based on the guide part 41 adjusted by the control part 9 in response to the size of the ring frame 13, thereby eliminating the need to use Adding parts and the like prevents errors from occurring during the conveyance of the frame unit 10 by the conveyance arm 8 .

5 第二吸引步驟 接著,解除吸附部83與負壓產生單元84的連通,並解除吸附部83的吸引力,使一對導引部41分開,並使搬送臂8下降,如圖7所示,將在第一判定步驟中被判定為與框架單元10的尺寸一致之吸附部83定位於與構成保持台5之框架支撐單元53的支撐板54或推壓部55接觸之位置。然後,使吸附部83與負壓產生單元84連通,而使吸引力作用於吸附部83。此外,在圖7中,省略圖3所示之推壓部55的圖示。 5 Second Attraction Step Then, release the communication between the suction part 83 and the negative pressure generating unit 84, and release the suction force of the suction part 83, separate the pair of guide parts 41, and lower the transfer arm 8. As shown in Figure 7, the first The suction portion 83 determined to match the size of the frame unit 10 in the determination step is positioned in contact with the support plate 54 or the pressing portion 55 of the frame support unit 53 constituting the holding table 5 . Then, the suction portion 83 is communicated with the negative pressure generating unit 84 , and suction is applied to the suction portion 83 . In addition, in FIG. 7, illustration of the pressing part 55 shown in FIG. 3 is abbreviate|omitted.

6 第二判定步驟 接著,控制部9讀取圖4所示之壓力計86的測量值,在該負壓的測量值的絕對值大於預定的閾值之情形,認為吸附部83與支撐板54或推壓部55密接,因此判定框架支撐單元53的位置與環狀框架13的尺寸一致。另一方面,在壓力計86的負壓的測量值的絕對值小於預定的閾值之情形,認為吸附部83未與支撐板54密接,判定為框架支撐單元53的位置未與環狀框架13的尺寸對應,並進行在未圖示之顯示部顯示錯誤訊息等動作。例如圖8所示,其為吸附部83的位置位於支撐板54的內側,且吸附部83未與支撐板54接觸之情形等。此外,在圖8中,省略圖3所示之推壓部55的圖示。 6 The second judgment step Next, the control unit 9 reads the measured value of the pressure gauge 86 shown in FIG. 4, and when the absolute value of the measured value of the negative pressure is greater than a predetermined threshold value, it is considered that the adsorption unit 83 is in close contact with the support plate 54 or the pressing unit 55. , so it is determined that the position of the frame support unit 53 is consistent with the size of the ring frame 13 . On the other hand, when the absolute value of the negative pressure measured by the pressure gauge 86 is smaller than the predetermined threshold value, it is considered that the adsorption portion 83 is not in close contact with the support plate 54, and it is determined that the position of the frame support unit 53 is not in contact with the position of the ring frame 13. It corresponds to the size, and performs operations such as displaying error messages on the display part not shown in the figure. For example, as shown in FIG. 8 , the position of the adsorption portion 83 is located inside the support plate 54 , and the adsorption portion 83 is not in contact with the support plate 54 . In addition, in FIG. 8 , illustration of the pressing portion 55 shown in FIG. 3 is omitted.

也有圖9所示之第二臂89為長型的搬送臂8之情形,此情形,即使吸附部83的位置與環狀框架13的尺寸對應,四個吸附部83中亦僅兩個與支撐板54接觸,剩下的兩個未與支撐板54接觸。此情形,在與各吸附部83對應之各吸引路徑個別地連接壓力計,例如圖9所示,一對第二臂89所面對之兩個吸附部83係與支撐板54接觸,若其吸引時的負壓的測量值的絕對值大於預定的值,則判斷為與框架單元10對應。此外,在圖9中,省略圖3所示之推壓部55的圖示。There is also a situation where the second arm 89 shown in FIG. 9 is a long conveying arm 8. In this case, even if the position of the adsorption portion 83 corresponds to the size of the ring frame 13, only two of the four adsorption portions 83 are compatible with the support. The plate 54 is in contact, and the remaining two are not in contact with the support plate 54 . In this case, each suction path corresponding to each suction portion 83 is individually connected to a pressure gauge. For example, as shown in FIG. If the absolute value of the measured value of the negative pressure during suction is greater than a predetermined value, it is determined that the frame unit 10 corresponds. In addition, in FIG. 9, illustration of the pressing part 55 shown in FIG. 3 is abbreviate|omitted.

如此,因以在第一判定步驟中被判定為與環狀框架13的尺寸一致之吸附部83為基準而確認保持台5的框架支撐單元53的位置,故可不使用追加零件等而確認框架支撐單元53是否適合環狀框架13的尺寸。因此,可防止在由搬送臂8所進行之框架單元10的搬送時產生錯誤。In this way, since the position of the frame support unit 53 of the holding table 5 is confirmed based on the suction portion 83 determined to match the size of the ring frame 13 in the first determination step, the frame support can be confirmed without using additional parts or the like. Whether the unit 53 fits the size of the ring frame 13 or not. Therefore, it is possible to prevent errors in the transfer of the frame unit 10 by the transfer arm 8 .

此外,在本實施方式中,雖以處理切割裝置1中之框架單元10之切割單元6作為處理單元的例子進行說明,但作為處理單元,也有雷射加工裝置中之雷射加工單元、研削裝置中之研削單元等,只要是藉由吸附部而吸附環狀框架並搬送框架單元之裝置,則不限定成為對象之裝置。In addition, in this embodiment, although the cutting unit 6 of the frame unit 10 in the processing and cutting device 1 is described as an example of the processing unit, as the processing unit, there are also laser processing units in the laser processing device, grinding devices, etc. Among them, the grinding unit and the like are not limited to devices as long as the ring-shaped frame is sucked by the suction unit and the frame unit is transported.

1:切割裝置 2:卡匣載置區域 21:卡匣 3:推拉機構 31:夾持部 32:臂 33:升降驅動部 34:移動部 35:導軌 4:定位機構 41:導引部 42:載置面 43:壁部 44:驅動部 5:保持台 51:吸引部 510:保持面 52:框體 520:上表面 53:框架支撐單元 530:軸部 54:支撐板 55:推壓部 56:驅動部 57:旋轉驅動部 6:切割單元 61:切割刀片 7:清洗機構 71:旋轉台 8:搬送臂 81:第一臂 810:被嵌合部 82:第二臂 83:吸附部 84:負壓產生單元 85:吸引路徑 86:壓力計 87:升降驅動部 88:導軌 89:第二臂 9:控制部 10:框架單元 11:基板 110:分割預定線 111:元件 12:薄片 13:環狀框架 130:直線部 14:距離 1: Cutting device 2: Cassette loading area 21: Cassette 3: Push-pull mechanism 31: clamping part 32: arm 33: Lifting drive unit 34: Mobile Department 35: guide rail 4: Positioning mechanism 41: Guide Department 42: Loading surface 43: wall 44: Drive Department 5: Holding table 51: Department of Attraction 510: keep surface 52: frame 520: upper surface 53:Frame support unit 530: Shaft 54: support plate 55: Pushing part 56: Drive Department 57:Rotary drive unit 6: Cutting unit 61: Cutting blade 7: Cleaning mechanism 71:Rotary table 8: Transfer arm 81: First Arm 810: Fitted part 82:Second Arm 83: Adsorption part 84: Negative pressure generating unit 85: Attraction path 86: Pressure gauge 87: Lifting drive unit 88: guide rail 89:Second Arm 9: Control Department 10:Frame unit 11: Substrate 110:Split scheduled line 111: Element 12: flakes 13: ring frame 130: straight line 14: Distance

圖1係表示處理裝置的一例之切割裝置的例子之立體圖。 圖2係表示框架單元的例子之立體圖。 圖3係表示保持台的例子之立體圖。 圖4係表示搬送機構的例子之立體圖。 圖5係表示搬送機構的吸附部與定位機構的導引部接觸之狀態之俯視圖。 圖6係表示搬送機構的吸附部未與定位機構的導引部接觸之狀態之俯視圖。 圖7係表示搬送機構的吸附部與保持台的框架支撐單元接觸之狀態之俯視圖。 圖8係表示搬送機構的吸附部未與保持台的框架支撐單元接觸之狀態之俯視圖。 圖9係表示搬送機構的吸附部的一部分與保持台的框架支撐單元接觸之狀態之俯視圖。 Fig. 1 is a perspective view showing an example of a cutting device as an example of a processing device. Fig. 2 is a perspective view showing an example of a frame unit. Fig. 3 is a perspective view showing an example of a holding table. Fig. 4 is a perspective view showing an example of a transport mechanism. Fig. 5 is a plan view showing a state where the suction portion of the transport mechanism is in contact with the guide portion of the positioning mechanism. 6 is a plan view showing a state where the suction portion of the transport mechanism is not in contact with the guide portion of the positioning mechanism. Fig. 7 is a plan view showing a state where the suction portion of the transport mechanism is in contact with the frame support unit of the holding table. Fig. 8 is a plan view showing a state where the suction portion of the transport mechanism is not in contact with the frame support unit of the holding table. 9 is a plan view showing a state where a part of the suction portion of the transport mechanism is in contact with the frame support unit of the holding table.

4:定位機構 4: Positioning mechanism

8:搬送臂 8: Transfer arm

42:載置面 42: Loading surface

43:壁部 43: wall

44:驅動部 44: Drive Department

45:間隔 45:Interval

81:第一臂 81: First Arm

82:第二臂 82:Second Arm

83:吸附部 83: Adsorption part

810:被嵌合部 810: Fitted part

Claims (2)

一種框架單元的搬送準備方法,其在處理裝置中確認吸附部是否配合環狀框架的尺寸進行調整,其特徵在於, 該處理裝置具備: 導引部,其支撐透過薄片將基板保持於該環狀框架的開口而成之框架單元的兩端; 保持台,其包含支撐該環狀框架之框架支撐單元; 處理單元,其處理保持於該保持台之該框架單元; 搬送臂,其具有因應該環狀框架的尺寸而能移動地設置且吸附該環狀框架之該吸附部,並將該框架單元從該導引部搬送至該保持台; 壓力計,其設置於使該吸附部與吸取源連通之吸引路徑; 驅動部,其配合該環狀框架的尺寸而調整該導引部的間隔;以及 控制部; 該框架單元的搬送準備方法具備: 尺寸登錄步驟,其將該環狀框架的尺寸登錄於該控制部; 導引部調整步驟,其將該導引部的間隔調整成在該尺寸登錄步驟所登錄之尺寸; 第一吸引步驟,其在實施該導引部調整步驟後,將該吸附部定位於與該導引部的上表面接觸之位置並進行吸引;以及 第一判定步驟,其在該壓力計的測量值大於閾值之情形,判定該搬送臂的吸附部的位置與該環狀框架的尺寸一致。 A transport preparation method for a frame unit, which checks whether the suction unit is adjusted in accordance with the size of the ring frame in a processing device, characterized in that, The processing unit has: a guide part supporting both ends of a frame unit formed by holding the substrate at the opening of the ring frame through the thin sheet; A holding table comprising a frame support unit supporting the ring frame; a handling unit that handles the frame unit held on the holding table; a transfer arm, which has the adsorption portion that is movably provided according to the size of the ring frame and adsorbs the ring frame, and transfers the frame unit from the guide portion to the holding table; a pressure gauge installed on a suction path that communicates the suction portion with the suction source; a driving part, which adjusts the interval of the guide part according to the size of the ring frame; and control department; The transfer preparation method of the frame unit has: a size registration step of registering the size of the annular frame in the control unit; a guide part adjustment step of adjusting the interval of the guide part to the size registered in the size registration step; a first suction step of positioning the suction part at a position in contact with the upper surface of the guide part and performing suction after implementing the guide part adjustment step; and The first determination step is to determine that the position of the suction portion of the transfer arm is consistent with the size of the ring frame when the measured value of the pressure gauge is greater than a threshold value. 如請求項1之框架單元的搬送準備方法,其中, 該框架支撐單元係因應該環狀框架的尺寸而能移動地設置於該保持台的外側, 該框架單元的搬送準備方法具備: 第二吸引步驟,其將在該第一判定步驟中被判定為與該環狀框架的尺寸一致之該吸附部定位於與該框架支撐單元接觸之位置並進行吸引;以及 第二判定步驟,其在該壓力計的測量值大於閾值之情形,判定該框架支撐單元的位置與該環狀框架的尺寸一致。 The transport preparation method of the frame unit as claimed in item 1, wherein, The frame support unit is movably arranged on the outside of the holding table due to the size of the ring frame, The transfer preparation method of the frame unit has: a second attracting step of positioning and attracting the absorbing portion determined to be consistent with the size of the ring frame in the first determining step at a position in contact with the frame supporting unit; and The second determination step is to determine that the position of the frame support unit is consistent with the size of the ring frame when the measured value of the pressure gauge is greater than a threshold.
TW111130662A 2021-08-18 2022-08-15 Transfer preparation method of frame unit capable of confirming whether the unit for transferring a frame unit in a processing device is adjusted in a manner to match the size of an annular frame TW202310133A (en)

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JP2021133283A JP2023027920A (en) 2021-08-18 2021-08-18 Preparation method for transportation of frame unit

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