TW202310133A - Transfer preparation method of frame unit capable of confirming whether the unit for transferring a frame unit in a processing device is adjusted in a manner to match the size of an annular frame - Google Patents
Transfer preparation method of frame unit capable of confirming whether the unit for transferring a frame unit in a processing device is adjusted in a manner to match the size of an annular frame Download PDFInfo
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- TW202310133A TW202310133A TW111130662A TW111130662A TW202310133A TW 202310133 A TW202310133 A TW 202310133A TW 111130662 A TW111130662 A TW 111130662A TW 111130662 A TW111130662 A TW 111130662A TW 202310133 A TW202310133 A TW 202310133A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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Abstract
Description
本發明係關於一種框架單元的搬送準備方法,其在搬送透過薄片將基板保持於環狀框架的開口而成之框架單元前,確認環狀框架的尺寸。The present invention relates to a transport preparation method of a frame unit, which confirms the size of the ring frame before transporting the frame unit formed by holding the substrate in the opening of the ring frame through a sheet.
透過薄片並藉由環狀框架支撐基板而成之構成的框架單元的環狀框架有多種尺寸。而且,在處理框架單元之各種裝置中,為了對應多種尺寸的環狀框架,裝置內的搬送臂所具備之吸附墊、在保持台的周圍支撐框架之框架支撐單元等,變得能因應環狀框架的尺寸而調整位置(例如,參照專利文獻1、專利文獻2)。 [習知技術文獻] [專利文獻] The ring frame of the frame unit formed by passing through the sheet and supporting the substrate by the ring frame has various sizes. Moreover, in various devices for processing frame units, in order to correspond to various sizes of ring frames, the suction pads provided in the transfer arms in the devices, the frame support units that support the frames around the holding table, etc., have become able to respond to ring frames. The position is adjusted according to the size of the frame (for example, refer to Patent Document 1 and Patent Document 2). [Prior art literature] [Patent Document]
[專利文獻1]日本特開2019-220634公報。 [專利文獻2]日本特許第5956112號。 [Patent Document 1] Japanese Unexamined Patent Application Publication No. 2019-220634. [Patent Document 2] Japanese Patent No. 5956112.
[發明所欲解決的課題] 搬送臂的吸附墊、設置於保持台的周圍之框架支撐單元若發生位置調整的作業疏失,則此等會在未配合環狀框架的尺寸之狀態下搬送框架單元,而有產生錯誤之虞。 [Problems to be Solved by the Invention] If the suction pad of the transfer arm and the frame support unit installed around the holding table are inadvertently adjusted in position, the frame unit may be transferred in a state that does not match the size of the ring frame, and errors may occur.
另一方面,為了確認環狀框架的尺寸與框架支撐單元等各單元的尺寸是否配合,亦能設置感測器或攝影機,但會增加成本。On the other hand, in order to confirm whether the size of the ring frame matches the size of each unit such as the frame support unit, a sensor or a camera can also be provided, but the cost will increase.
本發明係鑑於此種問題而完成,其課題在於不招致成本的增加,而可確認在處理裝置內搬送或保持框架單元之各單元是否被調整成配合環狀框架的尺寸。The present invention was made in view of such a problem, and an object of the present invention is to confirm whether each unit that transports or holds a frame unit in a processing device is adjusted to match the size of the ring frame without incurring an increase in cost.
[解決課題的技術手段] 本發明係一種框架單元的搬送準備方法,其在處理裝置中確認吸附部是否配合環狀框架的尺寸進行調整,該處理裝置具備:一對導引部,其支撐透過薄片將基板保持於該環狀框架的開口而成之框架單元的兩端;保持台,其包含支撐該環狀框架之框架支撐單元;處理單元,其處理保持於該保持台之該框架單元;搬送臂,其具有因應該環狀框架的尺寸而能移動地設置且吸附該環狀框架之該吸附部,並將該框架單元從該導引部搬送至該保持台;壓力計,其設置於使該吸附部與吸引源連通之吸引路徑;驅動部,其配合該環狀框架的尺寸而調整該導引部的間隔;以及控制部,並且,該框架單元的搬送準備方法具備:尺寸登錄步驟,其將該環狀框架的尺寸登錄於該控制部;導引部調整步驟,其將該導引部的間隔調整成在該尺寸登錄步驟所登錄之尺寸;第一吸引步驟,其在實施該導引部調整步驟後,將該吸附部定位於與該導引部的上表面接觸之位置並進行吸引;以及第一判定步驟,其在該壓力計的測量值大於閾值之情形,判定該搬送臂的吸附部的位置與該環狀框架的尺寸一致。 在上述框架單元的搬送準備方法中,較佳為在該框架支撐單元係因應該環狀框架的尺寸而能移動地設置於該保持台的外側之情形中,該框架單元的搬送準備方法具備:第二吸引步驟,其將在該第一判定步驟中被判定為與該環狀框架的尺寸一致之該吸附部定位於與該框架支撐單元接觸之位置並進行吸引;以及第二判定步驟,其在該壓力計的測量值大於閾值之情形,判定該框架支撐單元的位置與該環狀框架的尺寸一致。 [Technical means to solve the problem] The present invention relates to a transport preparation method of a frame unit. It is confirmed in a processing device whether the suction part is adjusted to match the size of the ring frame. The two ends of the frame unit formed by the opening of the circular frame; the holding table, which includes the frame support unit supporting the ring frame; the processing unit, which handles the frame unit held on the holding table; the transfer arm, which has corresponding The size of the ring frame can be movably arranged and adsorbed by the suction part of the ring frame, and the frame unit is transported from the guide part to the holding table; the pressure gauge is arranged so that the suction part and the suction source a connected suction path; a drive unit that adjusts the interval of the guide unit in accordance with the size of the ring frame; The size of the guide part is registered in the control part; the guide part adjustment step, which adjusts the interval of the guide part to the size registered in the size registration step; the first suction step, after implementing the guide part adjustment step, positioning the suction portion at a position in contact with the upper surface of the guide portion and performing suction; and a first judging step of judging whether the position of the suction portion of the transfer arm is consistent with The ring frame is uniform in size. In the above frame unit transfer preparation method, preferably in the case where the frame support unit is movably provided outside the holding table according to the size of the ring frame, the frame unit transfer preparation method includes: a second attracting step of positioning and attracting the suction part judged to be consistent with the size of the ring frame in the first judging step at a position in contact with the frame supporting unit; and a second judging step of When the measured value of the pressure gauge is greater than the threshold, it is determined that the position of the frame support unit is consistent with the size of the ring frame.
[發明功效] 在本發明中,因以因應環狀框架的尺寸所調整之導引部為基準,確認搬送臂的吸附部的位置,故可不使用追加零件等而確認搬送臂的吸附部的位置是否正確。因此,可防止在由搬送臂所進行之框架單元的搬送時產生錯誤。 並且,因以在第一判定步驟中被判定為與環狀框架的尺寸一致之吸附部為基準,確認框架支撐單元的位置,故可不使用追加零件等而確認框架支撐單元是否適合環狀框架的尺寸。 [Efficacy of the invention] In the present invention, since the position of the suction part of the transfer arm is confirmed based on the guide part adjusted according to the size of the ring frame, it is possible to confirm whether the position of the suction part of the transfer arm is correct without using additional parts or the like. Therefore, it is possible to prevent errors in transporting the frame unit by the transport arm. In addition, since the position of the frame support unit is confirmed based on the suction portion determined to match the size of the ring frame in the first determination step, it is possible to confirm whether the frame support unit fits the ring frame without using additional parts or the like. size.
1 切割裝置的構成
圖1所示之切割裝置1為切割各種基板11之裝置,被加工物亦即基板11被黏貼於薄片12,薄片12係以塞住環狀框架13的開口之方式被黏貼,整體被構成為框架單元10。圖2所示之一例之基板11為藉由分割預定線110所劃分並在正面形成有多個元件111之半導體晶圓。環狀框架13的內周被形成為圓形且外周四邊具備直線部130。環狀框架13係因應基板11的直徑而準備有多種尺寸。例如,在基板11為半導體晶圓之情形,基板11的尺寸例如有六吋與八吋,環狀框架13亦配合於此而準備尺寸不同的兩個種類。尺寸不同的環狀框架13係相面對的兩個平行的直線部130之間的距離14不同。
1 The composition of the cutting device
The cutting device 1 shown in FIG. 1 is a device for cutting
切割裝置1具備:卡匣載置區域2,其載置容納多個框架單元10之卡匣21;推拉機構3,其進行框架單元10對於卡匣21之搬出搬入;定位機構4,其將框架單元10定位於固定的位置;保持台5,其保持框架單元10;兩個切割單元6,其等切割保持於保持台5之基板11;清洗機構7,其清洗切割後的基板11;以及搬送臂8,其在定位機構4與清洗機構7之間搬送框架單元10。The cutting device 1 is equipped with: a
卡匣載置區域2能升降。卡匣2在內部具備多層的槽,各槽分別容納有框架單元10。The
推拉機構3具備:夾持部31,其夾持環狀框架13;臂32,其支撐夾持部31;升降驅動部33,其使夾持部31及臂32在Z軸方向升降;以及移動部34,其使升降驅動部33沿著於Y軸方向延伸之導軌35而在Y軸方向移動。The push-pull mechanism 3 is provided with: a
定位機構4具備於Y軸方向延伸之一對導引部41。各導引部41係由載置面42與壁部43所構成之剖面為L字狀的構件,所述載置面42係與XY平面平行的面且載置環狀框架13,所述壁部43係從載置面42的X軸方向端部立設,並且,一導引部41的壁部43與另一導引部41的壁部43係在X軸方向面對。定位機構4具備以在X軸方向接近或分開之方式驅動一對導引部41之驅動部44,且能根據記憶於記憶部之環狀框架的尺寸,配合環狀框架13的尺寸而調整兩個導引部41的間隔。The
如圖3所示,保持台5具備:吸引部51,其透過薄片12吸引保持基板11;框體52,其支撐吸取部51;四個框架支撐單元53,其被固定於框體52的外周部;以及旋轉驅動部57,其以Z軸方向的旋轉軸為中心使此等旋轉。吸引部51的上表面亦即保持面510與框體52的上表面520被形成為同一平面。
各框架支撐單元53能沿著從框體52往外側延伸之一對軸部530滑動,並能因應環狀框架13的尺寸而移動。各框架支撐單元53係由下述構件所構成:支撐板54,其從下方支撐環狀框架13;推壓部55,其能相對於支撐板54以水平方向的軸為中心進行旋轉,且將載置於支撐板54之環狀框架13從上方推壓,而在與支撐板54之間夾持環狀框架13;以及驅動部56,其旋轉驅動推壓部55。
As shown in FIG. 3 , the holding table 5 is provided with: a
圖1所示之切割單元6為對基板11實施切割處理之處理單元,兩個切割單元6具備以Y軸方向的軸為中心進行旋轉之切割刀片61。兩個切割單元6能在Y軸方向及Z軸方向移動。The
清洗機構7具備:旋轉台71,其能旋轉及升降,且保持基板10的切割後的工件單元10並能高速旋轉;以及未圖示之噴嘴,其保持於旋轉台71,並對旋轉之基板11噴出清洗液。The cleaning mechanism 7 is equipped with: a rotary table 71, which can rotate and lift, and holds the
如圖4所示,搬送臂8具備:第一臂81,其於X軸方向延伸;一對第二臂82,其等在相對於第一臂81在水平方向交叉之Y軸方向延伸;以及吸附部83,其在各第二臂82的下表面側分別安裝兩個。吸附部83係透過吸引路徑85而與負壓產生單元84連通。並且,在吸引路徑85連接有壓力計86。
在第二臂82的下表面側配設未圖示之柱塞,在第一臂81的上表面具備多個會與柱塞的前端部嵌合之凹狀的被嵌合部810。亦即,能使第二臂82在第一臂81的延伸方向亦即箭頭820的方向滑動,並能使柱塞的前端嵌合於被嵌合部810而固定,並且,藉由手動變更第二臂82的位置,而能配合環狀框架13的尺寸而調整吸附部83的位置。
如圖1所示,第一臂81能升降地被升降驅動部87支撐。升降驅動部87能沿著於Y軸方向延伸之導軌88而在Y軸方向移動。
As shown in FIG. 4 , the
切割裝置1具備:卡匣載置區域2、推拉機構3、定位機構4、保持台5、切割單元6、清洗機構7、搬送臂8及控制各單元之控制部9。The cutting device 1 includes: a
2 切割時的動作
在圖1所示之切割裝置1中,將在多層容納有多個框架單元10之卡匣21載置於卡匣載置區域2。首先,使卡匣載置區域2升降,而使容納有具有欲切割之基板11之框架單元10之槽的高度位置配合推拉機構3的夾持部31的高度位置。然後,先使兩個導引部41的壁部43之間的間隔稍微大於環狀框架13的尺寸,在此狀態下,使推拉機構3往-Y方向移動,並藉由夾持部31而夾持環狀框架13,其後,使推拉機構3往+Y方向移動,且在導引部41的載置面42上載置框架單元10,並藉由導引部41而支撐框架單元10的X軸方向的兩端。其後,解除由夾持部31所進行之環狀框架13的夾持,使推拉機構3往+Y方向撤離。
2 Actions during cutting
In the cutting device 1 shown in FIG. 1 , a
接著,驅動部44使一對導引部41往互相接近的方向移動,且藉由壁部43而推壓環狀框架13的兩端,藉此將框架單元10定位於固定的位置。然後,使搬送臂8往-Y方向移動並位於框架單元10的上方,在此狀態下,使搬送臂8下降,使吸附部83接觸環狀框架13的上表面,且使吸附部83與負壓產生單元84連通,藉此吸附環狀框架13。然後,在驅動部44使一對導引部41往互相分開之方向移動後,升降驅動部87使搬送臂8上升,藉此使框架單元10上升。Next, the driving
藉由使保持台5往+X方向移動,而先使保持台5位於藉由搬送臂8所保持之框架單元10的下方。然後,在已使導引部41分開之狀態下,升降驅動部87使搬送臂8下降,並將藉由吸附部83所保持之框架單元10載置於保持台5。亦即,將基板11載置於保持面510,並將環狀框架13載置於框架支撐單元53的支撐板54。然後,使吸引力作用於保持台5的吸引部51,且藉由框架支撐單元53的推壓部55而在與支撐板54之間保持環狀框架13。然後,解除由搬送臂8的吸附部83所進行之吸附,升降驅動部87使搬送臂8上升並撤離。By moving the holding table 5 in the +X direction, the holding table 5 is first positioned below the
接著,保持台5往-X方向移動並接近切割單元6。然後,在檢測出應切割的分割預定線110後,保持台5往-X方向移動且旋轉之切割刀片61切入所檢測出之分割預定線110,而切割該分割預定線110。然後,藉由一邊使切割刀片61於Y軸方向移動一邊重複同樣的切割,而切割相同方向的所有的分割預定線110。再者,若在使保持台5旋轉90度後進行同樣的切割,則所有的分割預定線110被縱橫地切割,而被分割成一個個具元件111的晶片。Next, the holding table 5 moves in the −X direction and approaches the
在切割結束後,保持台5返回至原來的位置(導引部41的下方)。然後,在已使導引部41分開之狀態下,升降驅動部87使搬送臂8下降,使吸附部83接觸環狀框架13的上表面,使吸附部83與負壓產生單元84連通,而吸附環狀框架13。然後,升降驅動部87使搬送臂8上升,在使框架單元10提升至比導引部41更上方且使導引部41稍微接近後,使搬送臂8下降,將框架單元10載置於導引部41的載置面42。然後,在解除吸附部83的吸附並使搬送臂8上升後,使導引部41接近並藉由壁部43而從兩側推壓框架單元10,藉此定位框架單元10。After the cutting is completed, the holding table 5 returns to its original position (below the guide portion 41 ). Then, in the state where the
如此進行而將框架單元10定位後,升降驅動部87再次使搬送臂8下降,使吸附部83接觸環狀框架13的上表面,使吸附部83與負壓產生單元84連通,而吸附環狀框架13。然後,在已使導引部41分開後,使搬送臂8上升。After the
接著,使搬送臂8往+Y方向移動,在使框架單元10位於清洗機構7的旋轉台71的上方後,使搬送臂8下降,將框架單元10載置於旋轉台71。然後,在旋轉台71中吸引保持框架單元10,解除吸附部83的吸附,使搬送臂8上升。接著,一邊使旋轉台71高速旋轉,一邊對基板11噴出清洗液,藉此清洗基板11的表面。清洗結束後,對基板10噴出高壓氣體而去除清洗液,停止旋轉台71的旋轉,使搬送臂8下降,使吸附部83接觸環狀框架13,使吸附部83與負壓產生單元84連通後,使搬送臂8上升。Next, the
接著,使搬送臂8往-Y方向移動且位於導引部41的上方。然後,使搬送臂8下降而將框架單元10載置於導引部41的載置面42。然後,在使導引部41接近並定位框架單元10後,藉由推拉機構3的夾持部31而夾持環狀框架13,使推拉機構3往-Y方向移動,而將框架單元10容納於卡匣21的原來的槽。Next, the
藉由對容納於卡匣21之所有的框架單元10進行上述動作,而將所有的構成框架單元10之基板11進行切割。By performing the above operation on all the
3 搬送準備方法
基板11有各種尺寸,因應於此,環狀框架13的尺寸亦不同。因此,如上述般進行而切割基板11時,需要一邊對應環狀框架13的尺寸的差異,一邊在切割裝置1內順暢地搬送框架單元10。於是,在切割裝置1中進行實際的切割前,如以下般進行,而確認搬送臂8的吸附部83是否配合環狀框架13的尺寸被調整。
3 Transfer preparation method
The
1 尺寸登錄步驟
將包含欲切割之基板11之用來支撐的環狀框架13的尺寸登錄於控制部9所具備之記憶部。此登錄係使用切割裝置1所具備之輸入手段例如未圖示之觸控面板而被輸入。例如,若輸入基板11為六吋或八吋,則可將因應於此之環狀框架13的尺寸記憶於記憶部。並且,因也有在可支撐八吋之八吋規格的環狀框架13支撐六吋的基板11等環狀框架13的尺寸與基板11的尺寸不一致之情形,故亦可將環狀框架13的尺寸與基板11的尺寸分別輸入並登錄於記憶部。環狀框架13的尺寸例如藉由圖2所示之環狀框架13的直線部130之間的距離14所示。此外,也可將環狀框架13的內徑、可支撐之最大直徑的基板11的尺寸作為環狀框架13的尺寸。
1 Size registration steps
The size of the supporting
2 導引部調整步驟
接著,以配合在尺寸登錄步驟中登錄於控制部9之環狀框架13的尺寸之方式,控制部9調整定位機構4的導引部41的間隔。亦即,驅動部44驅動導引部41,使圖5所示之構成導引部41之兩個壁部43之間的間隔45配合環狀框架13的尺寸亦即圖2所示之距離14。兩個壁部43之間的間隔先稍微(數mm左右)大於環狀框架13的距離14。
2. Guidance adjustment steps
Next, the
3 第一吸引步驟
在實施導引部調整步驟後,沿著圖1所示之導軌88使升降驅動部87及搬送臂8在Y軸方向移動,並將吸附部83定位於導引部41的上方。然後,升降驅動部87使搬送臂8下降,將吸附部83定位於與導引部41的載置面42接觸之位置。然後,使吸附部83與負壓產生單元84連通,而使吸引力作用於吸附部83。
3 The first attraction step
After implementing the guide part adjustment step, move the lifting
4 第一判定步驟
接著,控制部9讀取圖4所示之壓力計86的測量值,在該負壓的測量值的絕對值大於預定的閾值之情形,如圖5所示,認為吸附部83與載置面42密接,因此判定吸附部83的位置與環狀框架13的尺寸一致。此外,在圖示的例子中,吸附部83有四個,因此以僅在所有的吸附部83與載置面42密接時負壓的測量值的絕對值大於閾值之方式,使控制部9的記憶部記憶預定的閾值。
另一方面,在壓力計86的負壓的測量值的絕對值小於預定的閾值之情形,認為吸附部83未與載置面42密接,判定吸附部83的位置未對應環狀框架13的尺寸。例如圖6所示,吸附部83位於比導引部41更內側且未與載置面42接觸之情形,判定吸附部83位於與尺寸小於應對應的環狀框架13的尺寸者對應之位置,並進行在未圖示之顯示部顯示錯誤訊息等動作。
4 The first judgment step
Next, the
此外,在圖4所示之搬送臂8的例子中,雖對於四個吸附部83連接一個負壓產生單元84,且在與所有的吸附部83共通之吸引路徑85連接一個壓力計,但也可為在與各吸附部83對應之吸引路徑個別地連接壓力計之構成。此情形,個別地讀取負壓的測量值,並在所有的壓力計中之個別的負壓的測量值的絕對值大於預定的閾值之情形,判定吸附部83的位置適合環狀框架13的尺寸。In addition, in the example of the
如此,在切割基板11前,以因應環狀框架13的尺寸而藉由控制部9所調整之導引部41為基準,事先確認吸附部83是否適合環狀框架13的尺寸,藉此可不使用追加零件等而防止在由搬送臂8所進行之框架單元10的搬送時產生錯誤。In this way, before cutting the
5 第二吸引步驟
接著,解除吸附部83與負壓產生單元84的連通,並解除吸附部83的吸引力,使一對導引部41分開,並使搬送臂8下降,如圖7所示,將在第一判定步驟中被判定為與框架單元10的尺寸一致之吸附部83定位於與構成保持台5之框架支撐單元53的支撐板54或推壓部55接觸之位置。然後,使吸附部83與負壓產生單元84連通,而使吸引力作用於吸附部83。此外,在圖7中,省略圖3所示之推壓部55的圖示。
5 Second Attraction Step
Then, release the communication between the
6 第二判定步驟
接著,控制部9讀取圖4所示之壓力計86的測量值,在該負壓的測量值的絕對值大於預定的閾值之情形,認為吸附部83與支撐板54或推壓部55密接,因此判定框架支撐單元53的位置與環狀框架13的尺寸一致。另一方面,在壓力計86的負壓的測量值的絕對值小於預定的閾值之情形,認為吸附部83未與支撐板54密接,判定為框架支撐單元53的位置未與環狀框架13的尺寸對應,並進行在未圖示之顯示部顯示錯誤訊息等動作。例如圖8所示,其為吸附部83的位置位於支撐板54的內側,且吸附部83未與支撐板54接觸之情形等。此外,在圖8中,省略圖3所示之推壓部55的圖示。
6 The second judgment step
Next, the
也有圖9所示之第二臂89為長型的搬送臂8之情形,此情形,即使吸附部83的位置與環狀框架13的尺寸對應,四個吸附部83中亦僅兩個與支撐板54接觸,剩下的兩個未與支撐板54接觸。此情形,在與各吸附部83對應之各吸引路徑個別地連接壓力計,例如圖9所示,一對第二臂89所面對之兩個吸附部83係與支撐板54接觸,若其吸引時的負壓的測量值的絕對值大於預定的值,則判斷為與框架單元10對應。此外,在圖9中,省略圖3所示之推壓部55的圖示。There is also a situation where the
如此,因以在第一判定步驟中被判定為與環狀框架13的尺寸一致之吸附部83為基準而確認保持台5的框架支撐單元53的位置,故可不使用追加零件等而確認框架支撐單元53是否適合環狀框架13的尺寸。因此,可防止在由搬送臂8所進行之框架單元10的搬送時產生錯誤。In this way, since the position of the
此外,在本實施方式中,雖以處理切割裝置1中之框架單元10之切割單元6作為處理單元的例子進行說明,但作為處理單元,也有雷射加工裝置中之雷射加工單元、研削裝置中之研削單元等,只要是藉由吸附部而吸附環狀框架並搬送框架單元之裝置,則不限定成為對象之裝置。In addition, in this embodiment, although the
1:切割裝置 2:卡匣載置區域 21:卡匣 3:推拉機構 31:夾持部 32:臂 33:升降驅動部 34:移動部 35:導軌 4:定位機構 41:導引部 42:載置面 43:壁部 44:驅動部 5:保持台 51:吸引部 510:保持面 52:框體 520:上表面 53:框架支撐單元 530:軸部 54:支撐板 55:推壓部 56:驅動部 57:旋轉驅動部 6:切割單元 61:切割刀片 7:清洗機構 71:旋轉台 8:搬送臂 81:第一臂 810:被嵌合部 82:第二臂 83:吸附部 84:負壓產生單元 85:吸引路徑 86:壓力計 87:升降驅動部 88:導軌 89:第二臂 9:控制部 10:框架單元 11:基板 110:分割預定線 111:元件 12:薄片 13:環狀框架 130:直線部 14:距離 1: Cutting device 2: Cassette loading area 21: Cassette 3: Push-pull mechanism 31: clamping part 32: arm 33: Lifting drive unit 34: Mobile Department 35: guide rail 4: Positioning mechanism 41: Guide Department 42: Loading surface 43: wall 44: Drive Department 5: Holding table 51: Department of Attraction 510: keep surface 52: frame 520: upper surface 53:Frame support unit 530: Shaft 54: support plate 55: Pushing part 56: Drive Department 57:Rotary drive unit 6: Cutting unit 61: Cutting blade 7: Cleaning mechanism 71:Rotary table 8: Transfer arm 81: First Arm 810: Fitted part 82:Second Arm 83: Adsorption part 84: Negative pressure generating unit 85: Attraction path 86: Pressure gauge 87: Lifting drive unit 88: guide rail 89:Second Arm 9: Control Department 10:Frame unit 11: Substrate 110:Split scheduled line 111: Element 12: flakes 13: ring frame 130: straight line 14: Distance
圖1係表示處理裝置的一例之切割裝置的例子之立體圖。 圖2係表示框架單元的例子之立體圖。 圖3係表示保持台的例子之立體圖。 圖4係表示搬送機構的例子之立體圖。 圖5係表示搬送機構的吸附部與定位機構的導引部接觸之狀態之俯視圖。 圖6係表示搬送機構的吸附部未與定位機構的導引部接觸之狀態之俯視圖。 圖7係表示搬送機構的吸附部與保持台的框架支撐單元接觸之狀態之俯視圖。 圖8係表示搬送機構的吸附部未與保持台的框架支撐單元接觸之狀態之俯視圖。 圖9係表示搬送機構的吸附部的一部分與保持台的框架支撐單元接觸之狀態之俯視圖。 Fig. 1 is a perspective view showing an example of a cutting device as an example of a processing device. Fig. 2 is a perspective view showing an example of a frame unit. Fig. 3 is a perspective view showing an example of a holding table. Fig. 4 is a perspective view showing an example of a transport mechanism. Fig. 5 is a plan view showing a state where the suction portion of the transport mechanism is in contact with the guide portion of the positioning mechanism. 6 is a plan view showing a state where the suction portion of the transport mechanism is not in contact with the guide portion of the positioning mechanism. Fig. 7 is a plan view showing a state where the suction portion of the transport mechanism is in contact with the frame support unit of the holding table. Fig. 8 is a plan view showing a state where the suction portion of the transport mechanism is not in contact with the frame support unit of the holding table. 9 is a plan view showing a state where a part of the suction portion of the transport mechanism is in contact with the frame support unit of the holding table.
4:定位機構 4: Positioning mechanism
8:搬送臂 8: Transfer arm
42:載置面 42: Loading surface
43:壁部 43: wall
44:驅動部 44: Drive Department
45:間隔 45:Interval
81:第一臂 81: First Arm
82:第二臂 82:Second Arm
83:吸附部 83: Adsorption part
810:被嵌合部 810: Fitted part
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JP2021-133283 | 2021-08-18 | ||
JP2021133283A JP2023027920A (en) | 2021-08-18 | 2021-08-18 | Preparation method for transportation of frame unit |
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TW202310133A true TW202310133A (en) | 2023-03-01 |
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KR (1) | KR20230026943A (en) |
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JP5956112B2 (en) | 2011-03-10 | 2016-07-20 | 株式会社ディスコ | Cutting equipment |
JP7193933B2 (en) | 2018-06-22 | 2022-12-21 | 株式会社ディスコ | Conveying method of workpiece |
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