TW202309625A - Resin film for polarizing plates, method for producing said resin film, polarizing plate, and display device - Google Patents

Resin film for polarizing plates, method for producing said resin film, polarizing plate, and display device Download PDF

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TW202309625A
TW202309625A TW111122809A TW111122809A TW202309625A TW 202309625 A TW202309625 A TW 202309625A TW 111122809 A TW111122809 A TW 111122809A TW 111122809 A TW111122809 A TW 111122809A TW 202309625 A TW202309625 A TW 202309625A
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resin film
film
resin
polarizing plates
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TWI847155B (en
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西村浩
藤枝奈奈恵
大久保康
田坂公志
南條崇
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日商柯尼卡美能達股份有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/12Light sources with substantially two-dimensional radiating surfaces
    • H05B33/14Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material, or by the simultaneous addition of the electroluminescent material in or onto the light source

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  • Polarising Elements (AREA)

Abstract

The present invention addresses the problem of providing: a resin film for polarizing plates that, when used in a polarizing plate in a display device, suppresses contrast deterioration and reductions in adhesive strength caused by the heat generated by semiconductor substrates; and a polarizing plate and display device comprising this resin film for polarizing plates. The resin film for polarizing plates according to the present invention is a resin film for polarizing plates that is used in polarizing plates comprising at least an iodine-containing polarizer layer, wherein the resin film for polarizing plates characteristically comprises at least a thermoplastic resin and an iodine migration inhibitor and has a film thickness of at least 1 [mu]m but less than 15 [mu]m.

Description

偏光板用樹脂薄膜、其製造方法、偏光板及顯示裝置Resin film for polarizing plate, method for producing same, polarizing plate, and display device

本發明關於偏光板用樹脂薄膜、其製造方法、偏光板及顯示裝置。更詳細而言,關於當用於顯示裝置中的偏光板時,能抑制半導體基板之發熱所致的接著力降低及對比變差之偏光板用樹脂薄膜、其製造方法,進而具備該偏光板用樹脂薄膜之偏光板及顯示裝置。The present invention relates to a resin film for polarizing plates, a manufacturing method thereof, a polarizing plate, and a display device. More specifically, it relates to a resin film for a polarizing plate capable of suppressing a reduction in adhesive force and a deterioration in contrast due to heat generation of a semiconductor substrate when used for a polarizing plate in a display device, a method for producing the same, and further includes the polarizing plate. Resin film polarizer and display device.

近年來,預計第5代行動通訊系統(5G)之導入及普及,對應於5G的通訊機器之開發係進展。於5G中,與前一代的4G比較下,由於通訊速度大幅地高速化,對於5G對應的通訊機器,要求高速大容量的資訊處理,擔心伴隨其的機器之發熱所致的耐久性降低。In recent years, the introduction and popularization of the 5th generation mobile communication system (5G) is expected, and the development of communication equipment corresponding to 5G is progressing. In 5G, compared with the previous generation of 4G, the communication speed has been greatly increased. For 5G-compatible communication equipment, high-speed and large-capacity information processing is required, and there is a concern that the durability of the accompanying equipment will decrease due to heat generation.

關於使用對於聚乙烯醇(PVA)薄膜以碘(以下,亦稱為「碘」)染色而成之偏光子層的顯示裝置,已知隨著高精細化所致的顏色之切換次數或畫素數之增加,半導體基板係發熱,發生因顯示器之色調變差所造成的對比降低。Regarding a display device using a polarizer layer dyed with iodine (hereinafter, also referred to as "iodine") on a polyvinyl alcohol (PVA) film, it is known that the number of times of color switching or pixels due to high-definition As the number increases, the semiconductor substrate heats up, and the contrast decreases due to the deterioration of the color tone of the display.

作為對比降低的主要原因,考慮在PVA碘染色偏光子層(以下亦僅稱「偏光子層」)中配向的碘係移動,而偏光子層的偏光性能降低。又,通常偏光子層係透過接著劑層在兩側貼合保護層。因此,認為移動的碘會進入保護層內,使保護層與偏光子層之接著力降低,更促進對比之降低。As the main reason for the decrease in contrast, it is considered that the iodine system aligned in the PVA iodine-dyed polarizer layer (hereinafter also simply referred to as “polarizer layer”) moves, and the polarizing performance of the polarizer layer decreases. In addition, usually the polarizer layer is bonded with protective layers on both sides through the adhesive layer. Therefore, it is considered that the mobile iodine will enter into the protective layer, reducing the adhesive force between the protective layer and the polarizer layer, and further promoting the reduction of contrast.

專利文獻1中揭示即使為薄膜,也透明性高,作為可抑制高溫高濕下的偏光性能變差之偏光板保護膜,包含碘攝入減低劑及酸性分的纖維素醯化物薄膜之技術。然而,於5G對應的通訊機器之高溫環境下,多碘(I 3 -或I 5 -)的運動變更活躍,變容易移動,因此已知於保護膜與接著劑層之界面,多碘與薄膜中的酸性分之反應物析出,對比降低。 Patent Document 1 discloses a technology of a cellulose acyl compound film containing an iodine uptake reducing agent and an acidic component as a polarizer protective film that has high transparency even in a film and can suppress deterioration of polarizing performance under high temperature and high humidity. However, in the high-temperature environment of communication equipment corresponding to 5G, the movement of polyiodine (I 3 - or I 5 - ) becomes more active and easy to move, so it is known that polyiodine and thin film The acidic part of the reactant precipitates out, and the contrast decreases.

專利文獻2中揭作為不發生熱應變所致的漏光之光學補償薄片,抑制環境條件所致的光學特性之變動,使發生的溫度分布均勻化之光學補償薄片之技術。又,該光學補償薄片所含有的纖維素乙酸酯薄膜,係藉由進一步含有高熱傳導性粒子,而可使熱傳導率成為1W/(m・K)以上,顯示熱傳導率愈高,愈得到更優異的效果。 然而,於該技術中,在5G對應的通訊機器之更高溫環境下,無法抑制對比降低,有改善之餘地。 [先前技術文獻] [專利文獻] Patent Document 2 discloses the technology of an optical compensation sheet that does not cause light leakage due to thermal strain, suppresses changes in optical characteristics caused by environmental conditions, and makes the resulting temperature distribution uniform. In addition, the cellulose acetate film contained in this optical compensation sheet can make the thermal conductivity more than 1W/(m・K) by further containing high thermal conductivity particles, showing that the higher the thermal conductivity, the better the thermal conductivity. Excellent effect. However, in this technology, the reduction in contrast cannot be suppressed under the higher temperature environment of communication equipment compatible with 5G, and there is room for improvement. [Prior Art Literature] [Patent Document]

[專利文獻1]日本特開2014-80571號公報 [專利文獻2]日本特許第4285919號公報 [Patent Document 1] Japanese Unexamined Patent Publication No. 2014-80571 [Patent Document 2] Japanese Patent No. 4285919

[發明所欲解決的課題][Problems to be Solved by the Invention]

本發明係鑒於上述問題・狀況而完成者,其解決課題在於提供:當用於顯示裝置中的偏光板時,能抑制半導體基板之發熱所致的接著力降低及對比變差之偏光板用樹脂薄膜、其製造方法,進而使用具備該偏光板用樹脂薄膜之偏光板及顯示裝置。 [解決課題的手段] The present invention was made in view of the above-mentioned problems and situations, and the problem to be solved is to provide a resin for polarizing plates that can suppress the decrease in adhesive force and contrast deterioration caused by heat generation of semiconductor substrates when used in polarizing plates in display devices. A film, a method for producing the same, and a polarizing plate and a display device using the polarizing plate resin film. [means to solve the problem]

本發明者係於至少用於具備含有碘的偏光子層之偏光板的偏光板用樹脂薄膜中,為了解決上述課題,檢討上述問題的原因等,結果發現:藉由至少含有碘移動抑制劑,將膜厚設為特定範圍內,抑制多碘之移動,而可抑制半導體基板之發熱所致的接著力降低及對比變差,達成本發明。 亦即,本發明之上述課題係藉由以下之手段而解決。 In order to solve the above-mentioned problem, the inventors of the present invention examined the cause of the above-mentioned problem in a resin film for a polarizing plate used for a polarizing plate having at least a polarizer layer containing iodine, and found that by including at least an iodine migration inhibitor, Setting the film thickness within a specific range suppresses the movement of polyiodine, thereby suppressing the decrease in adhesive force and the deterioration of contrast caused by heat generation of the semiconductor substrate, thereby achieving the present invention. That is, the above-mentioned problems of the present invention are solved by the following means.

1.一種偏光板用樹脂薄膜,其係至少用於具備含有碘的偏光子層之偏光板的偏光板用樹脂薄膜,其特徵為:至少含有熱塑性樹脂及碘移動抑制劑,膜厚為1μm以上且未達15μm。1. A resin film for a polarizing plate, which is at least used for a polarizing plate with a polarizer layer containing iodine, characterized in that it contains at least a thermoplastic resin and an iodine migration inhibitor, and the film thickness is more than 1 μm And less than 15μm.

2.如第1項記載之偏光板用樹脂薄膜,其中前述碘移動抑制劑為金屬氧化物粒子,前述偏光板用樹脂薄膜之熱傳導度為0.2~0.6W/m・K之範圍內。2. The resin film for polarizing plates according to item 1, wherein the iodine transfer inhibitor is metal oxide particles, and the thermal conductivity of the resin film for polarizing plates is in the range of 0.2~0.6W/m・K.

3.如第2項記載之偏光板用樹脂薄膜,其中前述金屬氧化物粒子的平均一次粒徑與平均二次粒徑之比之值滿足下述式(1); 式(1):20<平均二次粒徑/平均一次粒徑<2000。 3. The resin film for polarizing plates as described in Item 2, wherein the ratio of the average primary particle size to the average secondary particle size of the aforementioned metal oxide particles satisfies the following formula (1); Formula (1): 20<average secondary particle size/average primary particle size<2000.

4.如第1項記載之偏光板用樹脂薄膜,其中前述碘移動抑制劑為非有機酸,且前述非有機酸的漢森(Hansen)溶解度參數(HSP值)的δP(極性力)為5~9MPa 0.5之範圍內。 4. The resin film for polarizing plates according to item 1, wherein the iodine transfer inhibitor is a non-organic acid, and the δP (polar force) of the Hansen solubility parameter (HSP value) of the non-organic acid is 5 ~9MPa 0.5 range.

5.如第4項記載之偏光板用樹脂薄膜,其中前述非有機酸的前述HSP值的δD(分散力)與δP(極性力)之比之值滿足下述式(2); 式(2):2<δD(分散力)/δP(極性力)<4。 5. The resin film for polarizing plates as described in item 4, wherein the value of the ratio of δD (dispersion force) to δP (polar force) of the aforementioned HSP value of the aforementioned non-organic acid satisfies the following formula (2); Formula (2): 2<δD (dispersion force)/δP (polar force)<4.

6.如第4項或第5項記載之偏光板用樹脂薄膜,其中前述碘移動抑制劑進一步含有硫酸離子,且相對於偏光板用樹脂薄膜的固體成分總質量,前述硫酸離子之含量為1~100質量ppm之範圍內。6. The resin film for polarizing plates as described in item 4 or item 5, wherein the aforementioned iodine transfer inhibitor further contains sulfate ions, and the content of the aforementioned sulfate ions is 1 with respect to the total mass of solid components of the resin film for polarizing plates Within the range of ~100 mass ppm.

7.如第1項~第6項中任一項記載之偏光板用樹脂薄膜,其中前述熱塑性樹脂為環烯烴樹脂。7. The resin film for polarizing plates according to any one of items 1 to 6, wherein the thermoplastic resin is a cycloolefin resin.

8.一種偏光板用樹脂薄膜之製造方法,其係製造如第1項~第7項中任一項記載之偏光版用樹脂薄膜的偏光板用樹脂薄膜之製造方法,其特徵為具有:將具有脫模層的樹脂薄膜當作支撐體,在前述脫模層上塗佈含有熱塑性樹脂及碘移動抑制劑的溶液之步驟。8. A method for manufacturing a resin film for a polarizing plate, which is a method for manufacturing a resin film for a polarizing plate as described in any one of items 1 to 7, characterized in that it has: A step of coating a resin film with a release layer as a support and coating a solution containing a thermoplastic resin and an iodine movement inhibitor on the release layer.

9.一種偏光板,其係在樹脂薄膜上具有接著劑層及偏光子層之偏光板,其特徵為:作為前述樹脂薄膜,具備如第1項~第7項中任一項記載之偏光板用樹脂薄膜。9. A polarizing plate, which is a polarizing plate having an adhesive layer and a polarizer layer on a resin film, characterized in that: as the aforementioned resin film, a polarizing plate as described in any one of items 1 to 7 is provided Use resin film.

10.如第9項記載之偏光板,其中前述偏光子層之厚度為4~15μm之範圍內。10. The polarizing plate as described in item 9, wherein the thickness of the aforementioned polarizer layer is within the range of 4 to 15 μm.

11.一種顯示裝置,其係具備偏光板之顯示裝置,其特徵為:作為前述偏光板,具備如第9項或第10項記載之偏光板。 [發明的效果] 11. A display device comprising a polarizing plate, characterized in that: the polarizing plate described in item 9 or 10 is provided as the polarizing plate. [Effect of the invention]

藉由本發明之上述手段,可提供當用於顯示裝置中的偏光板時,能抑制半導體基板之發熱所致的接著力降低及對比變差之偏光板用樹脂薄膜,進而具備該偏光板用樹脂薄膜之偏光板及顯示裝置。By means of the above means of the present invention, it is possible to provide a resin film for a polarizing plate that can suppress a decrease in adhesive force and a deterioration in contrast due to heat generation of a semiconductor substrate when used in a polarizing plate in a display device, and further comprises the resin film for a polarizing plate. Film polarizers and display devices.

關於本發明的效果之展現機構或作用機構,雖然不明確,但推測如以下。Although it is not clear about the display mechanism or operation mechanism of the effect of this invention, it guesses as follows.

以碘染色聚乙烯醇(PVA)薄膜而成的偏光子層(以下亦稱為「PVA碘染色偏光子層」或僅稱「偏光子層」),詳細而言,使PVA薄膜被碘染色後,將薄膜延伸,使碘配向而得到偏光功能。又,通常偏光子層係透過接著劑層將保護層(本發明中亦稱為「偏光板用樹脂薄膜」)貼合於兩側。A polarizer layer made of iodine-dyed polyvinyl alcohol (PVA) film (hereinafter also referred to as "PVA iodine-dyed polarizer layer" or simply "polarizer layer"). Specifically, after the PVA film is dyed with iodine , the film is stretched to align the iodine to obtain the polarizing function. In addition, usually, the polarizer layer is bonded to both sides of the protective layer (also referred to as "resin film for polarizing plate" in the present invention) through the adhesive layer.

於更減薄偏光子層時,亦即更減薄PVA薄膜時,由於在延伸時容易斷裂,故無法施加充分的張力來延伸,配向性容易降低。此外,為了使偏光功能與以往同等,亦即為了含有與以往同等量的多碘(I 3 -、I 5 -),必須增加每單位體積的多碘之含量。 When the polarizer layer is thinner, that is, when the PVA film is thinner, since it is easy to break during stretching, sufficient tension cannot be applied for stretching, and the alignment is likely to decrease. In addition, in order to achieve the same polarizing function as before, that is, to contain polyiodine (I 3 , I 5 ) in the same amount as conventionally, it is necessary to increase the content of polyiodine per unit volume.

然而,薄膜能吸附配向的多碘量係有限,若欲超過限度量而使多碘吸附配向,則一部分的多碘不吸附,成為容易脫離(容易移動)狀態。因此,配向性降低,偏光子層的偏光功能會降低。又,容易移動的多碘係從PVA薄膜向保護層中移動,有使保護層的性能降低之可能性。However, the amount of polyiodine that can be adsorbed and aligned by the thin film is limited. If the amount of polyiodine adsorbed and aligned exceeds the limit, a part of polyiodine will not be adsorbed and will be in a state that is easily detached (easy to move). Therefore, the alignment property is lowered, and the polarizing function of the polarizer layer is lowered. In addition, the easily mobile polyiodine migrates from the PVA film into the protective layer, possibly deteriorating the performance of the protective layer.

特別地,於5G對應的通訊機器中,與以往的機器比較下,半導體基板的發熱量多,為更高溫環境下,因此多碘容易因熱能而更活躍地移動。因此,較佳為即使於更高溫環境下,也可將多碘保持在PVA薄膜中。In particular, in communication equipment compatible with 5G, compared with conventional equipment, the semiconductor substrate generates more heat and is in a higher temperature environment, so more iodine tends to move more actively due to heat energy. Therefore, it is preferable to keep polyiodine in the PVA film even in a higher temperature environment.

作為抑制碘的移動之手段,有使偏光子層內的熱散熱,削減多碘吸收的熱能之手段,及與活躍移動的多碘產生電荷排斥(charge repulsion),阻止向保護層中的移動之手段。As a means of suppressing the movement of iodine, there are means of dissipating heat in the polarizer layer to reduce the heat energy absorbed by polyiodine, and generating charge repulsion with actively moving polyiodine to prevent movement into the protective layer. means.

於本發明中,藉由在保護層中含有以上述手段能抑制碘的移動之碘移動抑制劑,可將多碘保持在PVA薄膜中。In the present invention, by containing an iodine movement inhibitor capable of suppressing the movement of iodine in the protective layer by the above-mentioned means, it is possible to keep much iodine in the PVA film.

尚且,以往的碘移動抑制技術係藉由與多碘發生化學反應,生成反應物,而減輕多碘對於保護層之影響。此反應物係容易析出於保護層與接著劑層之界面或接著劑層與偏光子層之界面,導致接著力降低。Moreover, the conventional iodine movement suppression technology is to reduce the impact of excess iodine on the protective layer by chemically reacting with excess iodine to generate reactants. This reactant is easy to precipitate out of the interface between the protective layer and the adhesive layer or the interface between the adhesive layer and the polarizer layer, resulting in reduced adhesive force.

然而,本發明之碘移動抑制劑,由於可將多碘保持在PVA薄膜中,故可抑制偏光薄膜的偏光功能降低,再者由於不生成與多碘的反應物,故可抑制偏光子層與保護層的接著力降低。因此,將本發明之偏光板用樹脂薄膜作為保護層使用於顯示裝置中的偏光板時,可抑制半導體基板之發熱所致的接著力降低及對比變差。However, the iodine movement inhibitor of the present invention can suppress the reduction of the polarizing function of the polarizing film due to the ability to keep more iodine in the PVA film; The adhesion of the protective layer is reduced. Therefore, when the resin film for polarizing plates of the present invention is used as a protective layer for a polarizing plate in a display device, it is possible to suppress a decrease in adhesive force and a decrease in contrast due to heat generation of a semiconductor substrate.

[實施發明的形態][Mode of Carrying Out the Invention]

本發明之偏光板用樹脂薄膜係至少用於具備含有碘的偏光子層之偏光板的偏光板用樹脂薄膜,其特徵為:至少含有熱塑性樹脂及碘移動抑制劑,膜厚為1μm以上且未達15μm。 該特徵係共通或對應於下述實施形態的技術特徵。 The resin film for a polarizing plate of the present invention is a resin film for a polarizing plate used at least for a polarizing plate having a polarizer layer containing iodine, and is characterized in that it contains at least a thermoplastic resin and an iodine migration inhibitor, and has a film thickness of 1 μm or more and no up to 15 μm. This feature is common or corresponds to the technical feature of the following embodiments.

作為本發明之實施形態,從放出偏光子層內的熱之觀點來看,前述碘移動抑制劑較佳為金屬氧化物粒子,前述偏光板用樹脂薄膜之熱傳導度較佳為0.2~0.6W/m・K之範圍內。As an embodiment of the present invention, from the viewpoint of releasing heat in the polarizer layer, the aforementioned iodine transfer inhibitor is preferably metal oxide particles, and the thermal conductivity of the aforementioned resin film for polarizing plates is preferably 0.2 to 0.6 W/ Within the range of m・K.

又,從金屬氧化物粒子促進散熱之觀點來看,前述金屬氧化物粒子的平均一次粒徑與平均二次粒徑之比之值較佳為滿足下述式(1)。 式(1):20<平均二次粒徑/平均一次粒徑<2000 Also, from the viewpoint of promoting heat dissipation by the metal oxide particles, the value of the ratio of the average primary particle size to the average secondary particle size of the metal oxide particles preferably satisfies the following formula (1). Formula (1): 20<average secondary particle size/average primary particle size<2000

從排斥具有電荷的多碘之觀點來看,前述碘移動抑制劑較佳為非有機酸,且前述非有機酸的漢森溶解度參數(HSP值)的δP(極性力)較佳為5~9MPa 0.5之範圍內。 From the viewpoint of repelling polyiodine with charge, the aforementioned iodine transfer inhibitor is preferably a non-organic acid, and the δP (polar force) of the Hansen solubility parameter (HSP value) of the aforementioned non-organic acid is preferably 5 to 9 MPa within the range of 0.5 .

又,從促進非有機酸所致的電荷排斥之觀點,前述非有機酸的前述HSP值的δD(分散力)與δP(極性力)之比之值較佳為滿足下述式(2)。 式(2):2<δD(分散力)/δP(極性力)<4 Also, from the viewpoint of promoting charge repulsion by the non-organic acid, the ratio of δD (dispersion force) to δP (polar force) of the HSP value of the non-organic acid preferably satisfies the following formula (2). Formula (2): 2<δD (dispersion force)/δP (polar force)<4

再者,從非有機酸的極性安定之觀點來看,較佳前述碘移動抑制劑進一步含有硫酸離子,且相對於偏光板用樹脂薄膜的固體成分總質量,前述硫酸離子之含量為1~100質量ppm之範圍內較佳。Furthermore, from the viewpoint of stable polarity of the non-organic acid, it is preferable that the aforementioned iodine transfer inhibitor further contains sulfate ions, and the content of the aforementioned sulfate ions is 1 to 100% with respect to the total mass of the solid content of the resin film for polarizing plates. Preferably within the range of mass ppm.

從偏光板的耐水性提升之觀點來看,前述熱塑性樹脂較佳為環烯烴樹脂。From the viewpoint of improving the water resistance of the polarizing plate, the thermoplastic resin is preferably a cycloolefin resin.

本發明之偏光板用樹脂薄膜之製造方法之特徵為具有:將具有脫模層的樹脂薄膜當作支撐體,在前述脫模層上塗佈含有熱塑性樹脂及碘移動抑制劑的溶液之步驟。The method for producing a resin film for polarizing plates according to the present invention is characterized by comprising: using a resin film having a release layer as a support, and coating a solution containing a thermoplastic resin and an iodine migration inhibitor on the release layer.

本發明之偏光板用樹脂薄膜宜被本發明之偏光板所具備,再者宜被本發明之顯示裝置所具備。 又,從得到更薄型的偏光板及顯示裝置之觀點來看,前述偏光子層之厚度較佳為4~15μm之範圍內。 The resin film for a polarizing plate of the present invention is preferably included in the polarizing plate of the present invention, and further preferably included in the display device of the present invention. Also, from the viewpoint of obtaining a thinner polarizing plate and a display device, the thickness of the aforementioned polarizing sublayer is preferably in the range of 4 to 15 μm.

以下,說明本發明與其構成要素及用於實施本發明的形態・態樣。尚且,本案中,「~」係以包含其前後所記載的數值作為下限值及上限值之意思使用。惟,於數值之前有「超過」或「未達」之情況,不包括數值作為下限值及上限值。例如,所謂「1~未達15μm」,詳細而言就是指「1μm以上、未達15μm」。Hereinafter, the present invention, its components, and forms and aspects for carrying out the present invention will be described. Also, in this case, "~" is used to mean including the values described before and after it as the lower limit value and the upper limit value. However, if there is a case of "exceeding" or "not reaching" before the numerical value, the numerical value is not included as the lower limit value and the upper limit value. For example, "1 to less than 15 μm" means "more than 1 μm and less than 15 μm" in detail.

≪1 本發明之偏光板用樹脂薄膜≫ 本發明之偏光板用樹脂薄膜係至少用於具備含有碘的偏光子層之偏光板的偏光板用樹脂薄膜,其特徵為:至少含有熱塑性樹脂及碘移動抑制劑,膜厚為1μm以上且未達15μm。 ≪1 The resin film for polarizing plates of the present invention≫ The resin film for a polarizing plate of the present invention is a resin film for a polarizing plate used at least for a polarizing plate having a polarizer layer containing iodine, and is characterized in that it contains at least a thermoplastic resin and an iodine migration inhibitor, and has a film thickness of 1 μm or more and no up to 15 μm.

本發明之偏光板用樹脂薄膜可透過接著劑層,貼合於偏光子層,保護偏光子層。可以該偏光板用樹脂薄膜保護偏光子層之兩側,也可其中一側使用其他習知的保護層。The resin film for polarizing plates of the present invention can pass through the adhesive layer and be bonded to the polarizer layer to protect the polarizer layer. The polarizer can use a resin film to protect both sides of the polarizer layer, or use other known protective layers on one side.

本發明之偏光板用樹脂薄膜當厚度未達1μm時,得不到作為保護層的充分強度。又,15μm以上時,無法將偏光板薄膜化,搭載於通訊機器的電池之容量變不充分。When the thickness of the resin film for polarizing plates of this invention is less than 1 micrometer, sufficient strength as a protective layer cannot be acquired. Moreover, when it is 15 micrometers or more, a polarizing plate cannot be thinned, and the capacity of the battery mounted in a communication apparatus becomes insufficient.

[1.1 熱塑性樹脂] 本發明中,所謂熱塑性樹脂,就是指纖維素醯化物樹脂以外的熱塑性樹脂。所用的樹脂只要是纖維素醯化物樹脂以外,則沒有特別的限定,作為例子,可舉出環烯烴樹脂(COP)、聚碳酸酯樹脂、(甲基)丙烯酸樹脂、苯乙烯-(甲基)丙烯酸酯共聚物、富馬酸二酯系樹脂、聚芳酯系樹脂等。 [1.1 Thermoplastic resin] In the present invention, the term "thermoplastic resin" means a thermoplastic resin other than cellulose acylate resin. The resin used is not particularly limited as long as it is cellulose acylate resin, and examples include cycloolefin resin (COP), polycarbonate resin, (meth)acrylic resin, styrene-(methyl) Acrylate copolymer, fumaric acid diester resin, polyarylate resin, etc.

從偏光板的耐水性提升之觀點來看,本發明之熱塑性樹脂係含水率較佳為3.0%以下。藉由將保管環境設為23℃、55%RH,可將含水率調整至上述範圍內。含水率可藉由以下方法進行測定。From the viewpoint of improving the water resistance of the polarizing plate, the moisture content of the thermoplastic resin of the present invention is preferably 3.0% or less. By setting the storage environment at 23°C and 55%RH, the moisture content can be adjusted within the above range. Moisture content can be measured by the following method.

準備熱塑性樹脂約1g,測定其絕對乾燥時的質量(WB)。將此試料浸漬於25℃(常溫)的蒸餾水中1小時後,測定含水率成為平衡狀態的試料之質量(WA),藉由下述式算出含水率。 平衡含水率(質量%)={(WA-WB)/WA}×100 About 1 g of the thermoplastic resin was prepared, and its absolute dry mass (WB) was measured. After immersing this sample in distilled water at 25°C (normal temperature) for 1 hour, measure the mass (WA) of the sample in which the water content is in an equilibrium state, and calculate the water content by the following formula. Equilibrium moisture content (mass%)={(WA-WB)/WA}×100

<環烯烴系樹脂> 本發明中,環烯烴系樹脂較佳為環烯烴單體的聚合物、或環烯烴單體與其以外的共聚合性單體之共聚物。 <Cycloolefin resin> In the present invention, the cycloolefin-based resin is preferably a polymer of a cycloolefin monomer, or a copolymer of a cycloolefin monomer and other copolymerizable monomers.

作為環烯烴單體,較佳為具有降莰烯骨架的環烯烴單體,更佳為具有下述通式(A-1)或(A-2)所示的結構之環烯烴單體。The cycloolefin monomer is preferably a cycloolefin monomer having a norbornene skeleton, more preferably a cycloolefin monomer having a structure represented by the following general formula (A-1) or (A-2).

Figure 02_image001
Figure 02_image001

通式(A-1)中,R 1~R 4各自獨立地表示氫原子、碳原子數1~30的烴基或極性基;p為0~2之整數。惟,R 1~R 4之全部不同時地表示氫原子,R 1與R 2不同時地表示氫原子,R 3與R 4不同時地表示氫原子。 In the general formula (A-1), R 1 to R 4 each independently represent a hydrogen atom, a hydrocarbon group with 1 to 30 carbon atoms, or a polar group; p is an integer of 0 to 2. However, all of R 1 to R 4 do not simultaneously represent a hydrogen atom, R 1 and R 2 do not simultaneously represent a hydrogen atom, and R 3 and R 4 do not simultaneously represent a hydrogen atom.

通式(A-1)中,作為R 1~R 4所示的碳原子數1~30的烴基,例如較佳為碳原子數1~10的烴基,更佳為碳原子數1~5的烴基。碳原子數1~30的烴基例如可進一步具有含有鹵素原子、氧原子、氮原子、硫原子或矽原子的連結基。於如此的連結基之例中,包含羰基、亞胺基、醚鍵、矽烷基醚鍵、硫醚鍵等之2價極性基。於碳原子數1~30的烴基之例中,包含甲基、乙基、丙基及丁基等。 In the general formula (A-1), the hydrocarbon group having 1 to 30 carbon atoms represented by R 1 to R 4 is, for example, preferably a hydrocarbon group having 1 to 10 carbon atoms, more preferably a hydrocarbon group having 1 to 5 carbon atoms Hydrocarbyl. The hydrocarbon group having 1 to 30 carbon atoms may further have, for example, a linking group containing a halogen atom, an oxygen atom, a nitrogen atom, a sulfur atom or a silicon atom. Examples of such linking groups include divalent polar groups such as carbonyl groups, imino groups, ether bonds, silyl ether bonds, and thioether bonds. Examples of hydrocarbon groups having 1 to 30 carbon atoms include methyl, ethyl, propyl, and butyl groups.

通式(A-1)中,於R 1~R 4所示的極性基之例中,包含羧基、羥基、烷氧基、烷氧基羰基、芳氧基羰基、胺基、醯胺基及氰基。其中,較佳為羧基、羥基、烷氧基羰基及芳氧基羰基,從確保溶液製膜時的溶解性之觀點來看,較佳為烷氧基羰基及芳氧基羰基。 In the general formula (A-1), examples of the polar groups represented by R 1 to R 4 include carboxyl, hydroxyl, alkoxy, alkoxycarbonyl, aryloxycarbonyl, amine, amide and cyano. Among them, carboxyl group, hydroxyl group, alkoxycarbonyl group and aryloxycarbonyl group are preferable, and alkoxycarbonyl group and aryloxycarbonyl group are preferable from the viewpoint of ensuring solubility during film formation from a solution.

通式(A-1)中的p,從提高偏光板用樹脂薄膜的耐熱性之觀點來看,較佳為1或2。此係因為若p為1或2,則所得之聚合物變大體積,容易使玻璃轉移溫度上升。又,對於濕度可若干地響應,亦具有容易控制作為積層體的捲曲平衡之優點。p in the general formula (A-1) is preferably 1 or 2 from the viewpoint of improving the heat resistance of the resin film for polarizing plates. This is because when p is 1 or 2, the resulting polymer becomes bulky and the glass transition temperature tends to rise. In addition, it can respond to humidity to some extent, and there is an advantage that it is easy to control the curl balance as a laminate.

Figure 02_image003
Figure 02_image003

通式(A-2)中,R 5表示氫原子、碳數1~5的烴基或具有碳數1~5的烷基之烷基矽烷基;R 6表示羧基、羥基、烷氧基羰基、芳氧基羰基、胺基、醯胺基、氰基或鹵素原子(氟原子、氯原子、溴原子或碘原子);p表示0~2之整數。 In the general formula (A-2), R 5 represents a hydrogen atom, a hydrocarbon group with 1 to 5 carbons, or an alkylsilyl group with an alkyl group with 1 to 5 carbons; R 6 represents a carboxyl group, a hydroxyl group, an alkoxycarbonyl group, Aryloxycarbonyl group, amino group, amido group, cyano group or halogen atom (fluorine atom, chlorine atom, bromine atom or iodine atom); p represents an integer of 0~2.

通式(A-2)中的R 5較佳表示碳數1~5的烴基,更佳表示碳數1~3的烴基。 R in the general formula (A-2) preferably represents a hydrocarbon group with 1 to 5 carbons, more preferably a hydrocarbon group with 1 to 3 carbons.

通式(A-2)中的R 6較佳表示羧基、羥基、烷氧基羰基及芳氧基羰基,從確保溶液製膜時的溶解性之觀點來看,更佳為烷氧基羰基及芳氧基羰基。 R in the general formula (A-2) preferably represents a carboxyl group, a hydroxyl group, an alkoxycarbonyl group and an aryloxycarbonyl group, and is more preferably an alkoxycarbonyl group and Aryloxycarbonyl.

通式(A-2)中的p,從提高偏光板用樹脂薄膜的耐熱性之觀點來看,較佳表示1或2。此係因為若p表示1或2,則所得之聚合物變大體積,容易使玻璃轉移溫度上升。p in the general formula (A-2) preferably represents 1 or 2 from the viewpoint of improving the heat resistance of the resin film for polarizing plates. This is because when p represents 1 or 2, the resulting polymer becomes bulky and tends to raise the glass transition temperature.

具有通式(A-2)所示的結構之環烯烴單體,從提高在有機溶劑中的溶解性之點來看較佳。有機化合物一般藉由打亂對稱性而結晶性降低,在有機溶劑中的溶解性提升。通式(A-2)中的R 5及R 6係對於分子的對稱軸,僅被取代於單側的環構成碳原子,因此分子的對稱性低,亦即具有通式(A-2)所示的結構之環烯烴單體係溶解性高,適合於藉由溶液流延法製造偏光板用樹脂薄膜之情況。 A cycloolefin monomer having a structure represented by the general formula (A-2) is preferable from the viewpoint of improving solubility in organic solvents. Organic compounds generally reduce their crystallinity by disrupting their symmetry and increase their solubility in organic solvents. R 5 and R 6 in the general formula (A-2) are for the symmetry axis of the molecule, and are only substituted on one side of the ring to constitute a carbon atom, so the symmetry of the molecule is low, that is, it has the general formula (A-2) The cycloolefin monomer system with the structure shown has high solubility, and is suitable for producing a resin film for polarizing plates by solution casting.

環烯烴單體的聚合物中,具有通式(A-2)所示的結構之環烯烴單體之含有比例,係相對於構成環烯烴系樹脂的全部環烯烴單體之合計,較佳為70莫耳%以上,更佳為80莫耳%以上,再更佳為100莫耳%。若含有一定以上的具有通式(A-2)所示的結構之環烯烴單體,則樹脂的配向性升高,因此相位差(遲滯)值容易上升。In the polymer of the cycloolefin monomer, the content ratio of the cycloolefin monomer having the structure represented by the general formula (A-2) is preferably relative to the total of all the cycloolefin monomers constituting the cycloolefin resin. More than 70 mole%, more preferably more than 80 mole%, and more preferably 100 mole%. When the cycloolefin monomer having a structure represented by the general formula (A-2) is contained at a certain level or more, the alignment of the resin will increase, and thus the phase difference (retardation) value will easily increase.

以下,於例示化合物1~14中顯示具有通式(A-1)所示的結構之環烯烴單體的具體例,於例示化合物15~34中顯示具有通式(A-2)所示的結構之環烯烴單體的具體例。Below, specific examples of cycloolefin monomers having a structure represented by general formula (A-1) are shown in exemplified compounds 1 to 14, and cyclic olefin monomers having a structure represented by general formula (A-2) are shown in exemplified compounds 15 to 34. A specific example of the cycloolefin monomer of the structure.

Figure 02_image005
Figure 02_image005

於與環烯烴單體能共聚合的共聚合性單體之例中,包含與環烯烴單體能開環共聚合的共聚合性單體及與環烯烴單體能加成共聚合的共聚合性單體等。Examples of copolymerizable monomers capable of copolymerizing with cycloolefin monomers include copolymerizable monomers capable of ring-opening copolymerization with cycloolefin monomers and copolymerizable monomers capable of addition copolymerization with cycloolefin monomers. single sex etc.

於能開環共聚合的共聚合性單體之例中,包含環丁烯、環戊烯、環庚烯、環辛烯及二環戊二烯等之環烯烴。Cycloalkenes such as cyclobutene, cyclopentene, cycloheptene, cyclooctene, and dicyclopentadiene are included in examples of the copolymerizable monomer capable of ring-opening copolymerization.

於能加成共聚合的共聚合性單體之例中,包含含有不飽和雙鍵的化合物、乙烯系環狀烴單體及(甲基)丙烯酸酯等。於含有不飽和雙鍵的化合物之例中,包含為碳原子數2~12(較佳為2~8)的烯烴系化合物,於其例中,包含乙烯、丙烯及丁烯等。於乙烯系環狀烴單體之例中,包含4-乙烯基環戊烯及2-甲基-4-異丙烯基環戊烯等之乙烯基環戊烯系單體。於(甲基)丙烯酸酯之例中,包含(甲基)丙烯酸甲酯、(甲基)丙烯酸2-乙基己酯及(甲基)丙烯酸環己酯等之碳原子數1~20的(甲基)丙烯酸烷酯。Examples of the addition-copolymerizable copolymerizable monomer include unsaturated double bond-containing compounds, vinyl-based cyclic hydrocarbon monomers, (meth)acrylates, and the like. Examples of compounds containing unsaturated double bonds include olefin-based compounds having 2 to 12 carbon atoms (preferably 2 to 8), and examples thereof include ethylene, propylene, and butene. Vinylcyclopentene-based monomers such as 4-vinylcyclopentene and 2-methyl-4-isopropenylcyclopentene are included in examples of vinyl-based cyclic hydrocarbon monomers. Among the examples of (meth)acrylates, those with 1 to 20 carbon atoms including methyl (meth)acrylate, 2-ethylhexyl (meth)acrylate and cyclohexyl (meth)acrylate, etc. Alkyl methacrylate.

環烯烴單體與共聚合性單體之共聚物中的環烯烴單體之含有比例,係相對於構成共聚物的全部單體之合計,較佳為20~80莫耳%之範圍內,更佳為30~70莫耳%之範圍內。The content ratio of the cycloolefin monomer in the copolymer of the cycloolefin monomer and the copolymerizable monomer is preferably in the range of 20 to 80 mole % relative to the total of all monomers constituting the copolymer, and more preferably Preferably in the range of 30~70 mole%.

環烯烴系樹脂係如前述,將具有降莰烯骨架的環烯烴單體,較佳為具有通式(A-1)或(A-2)所示的結構之環烯烴單體進行聚合或共聚合而得之聚合物,於其例中,包含以下者。The cycloolefin-based resin is as mentioned above, and the cycloolefin monomer having a norbornene skeleton, preferably a cycloolefin monomer having a structure represented by general formula (A-1) or (A-2), is polymerized or copolymerized. Examples of polymers obtained by polymerization include the following.

1)環烯烴單體的開環聚合物 2)環烯烴單體與和其能開環共聚合的共聚合性單體之開環共聚物 3)上述1)或2)的開環(共)聚合物之氫化物 4)藉由夫里得-夸夫特(Friedel-Crafts)反應將上述1)或2)的開環(共)聚合物環化後,進行氫化之(共)聚合物 5)環烯烴單體與含有不飽和雙鍵的化合物之飽和共聚物 6)環烯烴單體之與乙烯系環狀烴單體的加成共聚物及其氫化物 7)環烯烴單體與(甲基)丙烯酸酯之交替共聚物 上述1)~7)之聚合物皆可藉由眾所周知之方法,例如日本特開2008-107534號公報或日本特開2005-227606號公報中記載之方法而獲得。例如上述2)的開環共聚合所用的觸媒或溶劑,例如可使用日本特開2008-107534號公報之段落0019~0024中記載者。上述3)及6)之氫化所用的觸媒,例如可使用日本特開2008-107534號公報之段落0025~0028中記載者。上述4)之夫里得-夸夫特反應所用的酸性化合物,例如可使用日本特開2008-107534號公報之段落0029中記載者。上述5)~7)之加成聚合所用的觸媒,例如可使用日本特開2005-227606號公報之段落0058~0063中記載者。上述7)之交替共聚合反應,例如可用日本特開2005-227606號公報之段落0071及0072中記載之方法進行。 1) Ring-opening polymer of cycloolefin monomer 2) Ring-opening copolymer of cycloolefin monomer and its copolymerizable monomer capable of ring-opening copolymerization 3) The hydrogenated product of the ring-opening (co)polymer of the above 1) or 2) 4) A (co)polymer obtained by cyclizing the ring-opening (co)polymer of the above 1) or 2) by the Friedel-Crafts reaction and then hydrogenating it 5) Saturated copolymers of cycloolefin monomers and compounds containing unsaturated double bonds 6) Addition copolymers of cyclic olefin monomers and vinyl cyclic hydrocarbon monomers and their hydrogenated products 7) Alternating copolymer of cycloolefin monomer and (meth)acrylate The above-mentioned polymers of 1) to 7) can be obtained by well-known methods, such as the methods described in JP-A-2008-107534 or JP-A-2005-227606. For example, catalysts or solvents used in the ring-opening copolymerization of the above-mentioned 2), for example, those described in paragraphs 0019 to 0024 of JP-A-2008-107534 can be used. As the catalysts used for the hydrogenation of the above 3) and 6), for example, those described in paragraphs 0025 to 0028 of JP-A-2008-107534 can be used. As the acidic compound used in the Friedel-Kuft reaction of the above 4), for example, those described in paragraph 0029 of JP-A-2008-107534 can be used. As the catalyst used for the addition polymerization of the above 5) to 7), for example, those described in paragraphs 0058 to 0063 of JP-A-2005-227606 can be used. The alternating copolymerization reaction of the above 7) can be carried out, for example, by the method described in paragraphs 0071 and 0072 of JP-A-2005-227606.

其中較佳為上述1)~3)及5)之聚合物,更佳為上述3)及5)之聚合物。亦即,環烯烴系樹脂係在可提高所得之環烯烴系樹脂的玻璃轉移溫度,且提高透光率之點上,較佳為包含下述通式(B-1)所示的結構單元與下述通式(B-2)所示的結構單元之至少一者,更佳為僅包含通式(B-2)所示的結構單元,或包含通式(B-1)所示的結構單元與通式(B-2)所示的結構單元之兩者。通式(B-1)所示的結構單元為源自前述通式(A-1)所示的環烯烴單體之結構單元,通式(B-2)所示的結構單元為源自前述通式(A-2)所示的環烯烴單體之結構單元。Among them, the polymers of the above-mentioned 1) to 3) and 5) are preferred, and the polymers of the above-mentioned 3) and 5) are more preferred. That is, the cycloolefin-based resin is preferably composed of a structural unit represented by the following general formula (B-1) and At least one of the structural units represented by the following general formula (B-2), more preferably contains only the structural unit represented by the general formula (B-2), or contains the structure represented by the general formula (B-1) Both of the unit and the structural unit represented by the general formula (B-2). The structural unit represented by the general formula (B-1) is a structural unit derived from the cycloolefin monomer represented by the aforementioned general formula (A-1), and the structural unit represented by the general formula (B-2) is derived from the aforementioned A structural unit of a cycloolefin monomer represented by general formula (A-2).

Figure 02_image007
Figure 02_image007

通式(B-1)中,X表示-CH=CH-或-CH 2CH 2-;R 1~R 4及p各自與通式(A-1)的R 1~R 4及p同義。 In general formula (B-1), X represents -CH=CH- or -CH 2 CH 2 -; R 1 to R 4 and p are each synonymous with R 1 to R 4 and p in general formula (A-1).

Figure 02_image009
Figure 02_image009

通式(B-2)中,X表示-CH=CH-或-CH 2CH 2-;R 5~R 6及p各自與通式(A-2)的R 5~R 6及p同義。 In general formula (B-2), X represents -CH=CH- or -CH 2 CH 2 -; R 5 to R 6 and p are each synonymous with R 5 to R 6 and p in general formula (A-2).

本發明所用之環烯烴系樹脂可為市售品。於環烯烴系樹脂的市售品之例中,包含JSR(股)製的阿通(註冊商標)G(例如,G7810等)、阿通F、阿通R(例如,R4500、R4900及R5000等)及阿通RX(例如,RX4500等)。The cycloolefin-based resin used in the present invention may be a commercially available product. Examples of commercially available cycloolefin-based resins include Atong (registered trademark) G (eg, G7810, etc.), Atong F, and Atong R (eg, R4500, R4900, R5000, etc.) manufactured by JSR Co., Ltd. ) and Atong RX (for example, RX4500, etc.).

環烯烴系樹脂之固有黏度[η]inh係在30℃之測定中,較佳為0.2~5cm 3/g之範圍內,更佳為0.3~3cm 3/g之範圍內,尤佳為0.4~1.5cm 3/g之範圍內。 The intrinsic viscosity [η]inh of cycloolefin resin is measured at 30°C, preferably in the range of 0.2~5cm 3 /g, more preferably in the range of 0.3~3cm 3 /g, especially preferably in the range of 0.4~ Within the range of 1.5cm 3 /g.

環烯烴系樹脂之數量平均分子量(Mn)較佳為8000~100000之範圍內,更佳為10000~80000之範圍內,尤佳為12000~50000之範圍內。環烯烴系樹脂之重量平均分子量(Mw)較佳為20000~300000之範圍內,更佳為30000~250000之範圍內,尤佳為40000~200000之範圍內。環烯烴系樹脂之數量平均分子量或重量平均分子量可藉由凝膠滲透層析術(GPC),以聚苯乙烯換算進行測定。The number average molecular weight (Mn) of the cycloolefin resin is preferably in the range of 8,000 to 100,000, more preferably in the range of 10,000 to 80,000, and most preferably in the range of 12,000 to 50,000. The weight average molecular weight (Mw) of the cycloolefin resin is preferably within the range of 20,000 to 300,000, more preferably within the range of 30,000 to 250,000, and most preferably within the range of 40,000 to 200,000. The number average molecular weight or weight average molecular weight of a cycloolefin resin can be measured in terms of polystyrene by gel permeation chromatography (GPC).

<凝膠滲透層析術> 溶劑:二氯甲烷 管柱:Shodex K806、K805、K803G(昭和電工(股)製,連接3支而使用) 管柱溫度:25℃ 試料濃度:0.1質量% 檢測器:RI Model 504(GL科學公司製) 泵:L6000(日立製作所(股)製) 流量:1.0mL/min 校正曲線:使用標準聚苯乙烯STK standard 聚苯乙烯(東曹(股)製)Mw=500~2800000之範圍內的13個樣品之校正曲線。13個樣品較佳為大致等間隔使用。 <Gel Permeation Chromatography> Solvent: dichloromethane String: Shodex K806, K805, K803G (manufactured by Showa Denko Co., Ltd., used for connecting 3 strings) Column temperature: 25°C Sample concentration: 0.1% by mass Detector: RI Model 504 (manufactured by GL Science Co., Ltd.) Pump: L6000 (manufactured by Hitachi, Ltd.) Flow: 1.0mL/min Calibration curve: Calibration curve of 13 samples using standard polystyrene STK standard polystyrene (manufactured by Tosoh Co., Ltd.) Mw=500~2,800,000. The 13 samples are preferably used approximately equally spaced.

藉由固有黏度[η]inh、數量平均分子量及重量平均分子量在上述範圍內,環烯烴系樹脂的耐熱性、耐水性、耐化學性、機械特性及作為偏光板用樹脂薄膜的成形加工性變良好。When the intrinsic viscosity [η]inh, the number average molecular weight and the weight average molecular weight are within the above ranges, the heat resistance, water resistance, chemical resistance, mechanical properties and molding processability of the resin film for polarizing plates of the cycloolefin-based resin are changed. good.

環烯烴系樹脂之玻璃轉移溫度(Tg)通常為110℃以上,較佳為110~350℃之範圍內,更佳為120~250℃之範圍內,尤佳為120~220℃之範圍內。若Tg為110℃以上,則容易抑制高溫條件下的變形。另一方面,若Tg為350℃以下,則成形加工變容易,成形加工時的熱所致的樹脂之劣化亦容易被抑制。The glass transition temperature (Tg) of the cycloolefin resin is usually above 110°C, preferably in the range of 110-350°C, more preferably in the range of 120-250°C, and most preferably in the range of 120-220°C. When Tg is 110 degreeC or more, it becomes easy to suppress deformation|transformation under high temperature conditions. On the other hand, when Tg is 350 degrees C or less, molding processing becomes easy, and the deterioration of resin by heat at the time of molding processing is also suppressed easily.

環烯烴系樹脂之含量,相對於偏光板用樹脂薄膜之總質量,較佳為70質量%以上,更佳為80質量%以上。The content of the cycloolefin-based resin is preferably at least 70% by mass, more preferably at least 80% by mass, based on the total mass of the resin film for polarizing plates.

<聚碳酸酯系樹脂> 本發明中,作為聚碳酸酯系樹脂,並無特別的限定,但從化學性質及物性之點來看,較佳為芳香族聚碳酸酯樹脂,特佳為雙酚A系聚碳酸酯樹脂。其中,更佳為使用在雙酚A中導入有苯環、環己烷環及脂肪族烴基等之雙酚A衍生物。再者,特佳為使用對於雙酚A的中央之碳,非對稱地導入有上述官能基之衍生物,而得之單位分子內的各向異性經減少之結構的聚碳酸酯系樹脂。作為如此的聚碳酸酯系樹脂,例如特佳為使用將雙酚A的中央之碳的2個甲基取代成苯環者,將雙酚A的各自之苯環的一個氫以甲基或苯基等,對於中央碳取代成非對稱者,而得之聚碳酸酯樹脂。 <Polycarbonate resin> In the present invention, the polycarbonate-based resin is not particularly limited, but from the viewpoint of chemical properties and physical properties, an aromatic polycarbonate resin is preferred, and a bisphenol A-based polycarbonate resin is particularly preferred. Among them, it is more preferable to use a bisphenol A derivative in which a benzene ring, a cyclohexane ring, an aliphatic hydrocarbon group, and the like are introduced into bisphenol A. Furthermore, it is particularly preferable to use a polycarbonate-based resin having a structure in which the anisotropy per unit molecule is reduced by introducing a derivative of the above-mentioned functional group asymmetrically to the central carbon of bisphenol A. As such a polycarbonate resin, for example, it is particularly preferable to use one in which two methyl groups at the central carbon of bisphenol A are replaced with benzene rings, and one hydrogen of each benzene ring of bisphenol A is replaced with a methyl group or a benzene ring. Groups, etc., the central carbon is substituted into asymmetric ones, and the polycarbonate resin is obtained.

具體而言,從4,4’-二羥基二苯基烷或此等之鹵素取代物起,藉由光氣法或酯交換法而得者,例如可舉出4,4’-二羥基二苯基甲烷、4,4’-二羥基二苯基乙烷、4,4’-二羥基二苯基丁烷等。又此外,例如亦可舉出日本特開2006-215465號公報、日本特開2006-91836號公報、日本特開2005-121813號公報、日本特開2003-167121號公報、日本特開2009-126128號公報、日本特開2012-31369號公報、日本特開2012-67300號公報、國際公開第00/26705號等中記載之聚碳酸酯系樹脂。Specifically, those obtained from 4,4'-dihydroxydiphenylalkane or its halogen substitutes by phosgene method or transesterification method, for example, 4,4'-dihydroxydiphenyl Phenylmethane, 4,4'-dihydroxydiphenylethane, 4,4'-dihydroxydiphenylbutane, etc. In addition, for example, JP-A 2006-215465, JP-A 2006-91836, JP-A 2005-121813, JP-A 2003-167121, JP-A 2009-126128 Polycarbonate-based resins described in Japanese Patent Publication No. 2012-31369, Japanese Patent Application Laid-Open No. 2012-67300, International Publication No. 00/26705, and the like.

聚碳酸酯系樹脂亦可與聚苯乙烯系樹脂、甲基丙烯酸甲酯系樹脂及纖維素乙酸酯系樹脂等之透明性樹脂混合而使用。又,亦可在使用纖維素乙酸酯系樹脂所形成的樹脂薄膜的至少一面上,積層含有聚碳酸酯系樹脂的樹脂層。Polycarbonate-based resins can also be mixed with transparent resins such as polystyrene-based resins, methyl methacrylate-based resins, and cellulose acetate-based resins. In addition, a resin layer containing a polycarbonate-based resin may be laminated on at least one surface of a resin film formed using a cellulose acetate-based resin.

聚碳酸酯系樹脂較佳係玻璃轉移溫度(Tg)為110℃以上,且含水率(在23℃水中,24小時之條件下所測定之值)為0.3%以下者。又,更佳係Tg為120℃以上且含水率為0.2%以下者。The polycarbonate resin preferably has a glass transition temperature (Tg) of 110°C or higher and a moisture content (measured in water at 23°C for 24 hours) of 0.3% or less. Also, more preferably, it has a Tg of 120°C or higher and a moisture content of 0.2% or lower.

<(甲基)丙烯酸系樹脂> 本發明中,(甲基)丙烯酸系樹脂較佳為至少包含源自甲基丙烯酸甲酯的結構單元(U1)與源自苯基馬來醯亞胺的結構單元(U2)。包含源自苯基馬來醯亞胺的結構單元(U2)之(甲基)丙烯酸系樹脂,係減少偏光板用樹脂薄膜的光彈性係數,亦具有即使吸濕膨脹也不易發生不均之有利點。 <(Meth)acrylic resin> In the present invention, the (meth)acrylic resin preferably includes at least a structural unit (U1) derived from methyl methacrylate and a structural unit (U2) derived from phenylmaleimide. The (meth)acrylic resin containing the structural unit (U2) derived from phenylmaleimide reduces the photoelastic coefficient of the resin film for polarizing plates and is also advantageous in that it is less likely to cause unevenness even when it absorbs moisture. point.

(甲基)丙烯酸系樹脂可進一步包含上述以外的其他結構單元。於如此的其他結構單元之例中,包含丙烯酸金剛烷酯等之(甲基)丙烯酸烷酯;丙烯酸2-乙基己酯等之(甲基)丙烯酸環烷酯等。其中,從減低因包含源自苯基馬來醯亞胺的結構單元(U2)所造成的脆性變差之觀點等來看,較佳為進一步包含源自丙烯酸烷酯的結構單元(U3)。The (meth)acrylic resin may further contain other structural units other than the above. Examples of such other structural units include alkyl (meth)acrylates such as adamantyl acrylate, cycloalkyl (meth)acrylates such as 2-ethylhexyl acrylate, and the like. Among them, it is preferable to further include a structural unit (U3) derived from an alkyl acrylate from the viewpoint of reducing the deterioration in brittleness due to the inclusion of the structural unit (U2) derived from phenylmaleimide.

亦即,(甲基)丙烯酸系樹脂更佳為包含源自甲基丙烯酸甲酯的結構單元(U1)、源自苯基馬來醯亞胺的結構單元(U2)與源自丙烯酸烷酯的結構單元(U3)。That is, the (meth)acrylic resin preferably comprises a structural unit (U1) derived from methyl methacrylate, a structural unit (U2) derived from phenylmaleimide, and a structural unit derived from alkyl acrylate. Structural unit (U3).

源自甲基丙烯酸甲酯的結構單元(U1)之含量,相對於構成(甲基)丙烯酸系樹脂的全部結構單元,較佳為50~95質量%之範圍內,更佳為70~90質量%之範圍內。The content of the structural unit (U1) derived from methyl methacrylate is preferably in the range of 50 to 95% by mass, more preferably 70 to 90% by mass, based on all the structural units constituting the (meth)acrylic resin % range.

源自苯基馬來醯亞胺的結構單元(U2)由於具有比較剛直的結構,故可提高偏光板用樹脂薄膜的機械強度。又,源自苯基馬來醯亞胺的結構單元(U2)具有比較大體積的結構,由於在樹脂基質中具有橡膠粒子能移動的微空隙。故可使橡膠粒子偏向存在於偏光板用樹脂薄膜之表層部。Since the structural unit (U2) derived from phenylmaleimide has a relatively rigid structure, it can improve the mechanical strength of the resin film for polarizing plates. Also, the structural unit (U2) derived from phenylmaleimide has a relatively bulky structure due to the presence of microvoids in the resin matrix through which rubber particles can move. Therefore, the rubber particles can be biased in the surface layer of the resin film for polarizing plates.

源自苯基馬來醯亞胺的結構單元(U2)之含量,相對於構成(甲基)丙烯酸系樹脂的全部結構單元,較佳為1~25質量%之範圍內。藉由源自苯基馬來醯亞胺的結構單元(U2)之含量為1質量%以上,偏光板用樹脂薄膜之高濕度環境下的保存性優異。藉由25質量%以下,偏光板用樹脂薄膜之脆性不易被過度地損害。源自苯基馬來醯亞胺的結構單元(U2)之含量,基於上述觀點,更佳為7~15質量%之範圍內。The content of the structural unit (U2) derived from phenylmaleimide is preferably in the range of 1 to 25 mass % with respect to all the structural units constituting the (meth)acrylic resin. When the content of the structural unit (U2) derived from phenylmaleimide is 1% by mass or more, the resin film for polarizing plates has excellent storage properties in a high-humidity environment. By 25 mass % or less, the brittleness of the resin film for polarizing plates is hard to be impaired excessively. The content of the structural unit (U2) derived from phenylmaleimide is more preferably within the range of 7 to 15% by mass from the above viewpoint.

源自丙烯酸烷酯的結構單元(U3),由於能將適度的柔軟性賦予至樹脂,故例如可改善包含源自苯基馬來醯亞胺的結構單元(U2)所致的脆性。Since the alkyl acrylate-derived structural unit (U3) can impart moderate flexibility to the resin, for example, brittleness due to the inclusion of the phenylmaleimide-derived structural unit (U2) can be improved.

丙烯酸烷酯宜烷基部分的碳原子數為1~7,較佳為1~5的丙烯酸烷酯。於丙烯酸烷酯之例中,包含丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙酯、丙烯酸丁酯、丙烯酸2-羥基乙酯、丙烯酸己酯、丙烯酸2-乙基己酯等。The alkyl acrylate preferably has an alkyl moiety with 1-7 carbon atoms, preferably an alkyl acrylate with 1-5 carbon atoms. Examples of alkyl acrylate include methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, 2-hydroxyethyl acrylate, hexyl acrylate, 2-ethylhexyl acrylate, and the like.

源自丙烯酸烷酯的結構單元(U3)之含量,相對於構成(甲基)丙烯酸系樹脂的全部結構單元,較佳為1~25質量%之範圍內。藉由源自丙烯酸烷酯的結構單元(U3)之含量為1質量%以上,能將適度的柔軟性賦予至(甲基)丙烯酸樹脂,偏光板用樹脂薄膜不太脆,不易斷裂。又,藉由25質量%以下,偏光板用樹脂薄膜的Tg不太低,偏光板用樹脂薄膜之高濕度環境下的保存性優異。源自丙烯酸烷酯的結構單元(U3)之含量,基於上述觀點,更佳為5~15質量%之範圍內。The content of the structural unit (U3) derived from an alkyl acrylate is preferably within the range of 1 to 25 mass % with respect to all the structural units constituting the (meth)acrylic resin. When the content of the structural unit (U3) derived from the alkyl acrylate is 1% by mass or more, moderate flexibility can be imparted to the (meth)acrylic resin, and the resin film for polarizing plates is not too brittle and difficult to break. Moreover, when it is 25 mass % or less, Tg of the resin film for polarizing plates is not too low, and the preservability in the high-humidity environment of the resin film for polarizing plates is excellent. The content of the structural unit (U3) derived from an alkyl acrylate is more preferably within the range of 5 to 15% by mass from the above viewpoint.

相對於源自苯基馬來醯亞胺的結構單元(U2)與源自丙烯酸烷酯的結構單元(U3)之合計量,源自苯基馬來醯亞胺的結構單元(U2)之比率較佳為20~70質量%之範圍內。藉由該比率為20質量%以上,容易提高偏光板用樹脂薄膜的拉伸彈性模數G2,藉由70質量%以下,偏光板用樹脂薄膜不太脆。Ratio of phenylmaleimide-derived structural unit (U2) to the total amount of phenylmaleimide-derived structural unit (U2) and alkyl acrylate-derived structural unit (U3) Preferably it is within the range of 20 to 70% by mass. When this ratio is 20 mass % or more, it becomes easy to raise the tensile elastic modulus G2 of the resin film for polarizing plates, and when it is 70 mass % or less, the resin film for polarizing plates is not too brittle.

(甲基)丙烯酸系樹脂的玻璃轉移溫度(Tg)較佳為100℃以上,更佳為120~150℃之範圍內。藉由(甲基)丙烯酸系樹脂的Tg為上述範圍內,容易提高偏光板用樹脂薄膜的耐熱性。為了調整(甲基)丙烯酸系樹脂的Tg,例如較佳為調整源自苯基馬來醯亞胺的結構單元(U2)或源自丙烯酸烷酯的結構單元(U3)之含量。The glass transition temperature (Tg) of (meth)acrylic resin becomes like this. Preferably it is 100 degreeC or more, More preferably, it exists in the range of 120-150 degreeC. When Tg of a (meth)acryl-type resin exists in the said range, it becomes easy to improve the heat resistance of the resin film for polarizing plates. In order to adjust the Tg of the (meth)acrylic resin, for example, it is preferable to adjust the content of the structural unit (U2) derived from a phenylmaleimide or the structural unit (U3) derived from an alkyl acrylate.

(甲基)丙烯酸系樹脂之重量平均分子量(Mw)係沒有特別的限制,可按照目的而調整。(甲基)丙烯酸系樹脂之重量平均分子量,例如於促進樹脂分子彼此的纏結而提高偏光板用樹脂薄膜的韌性,不易斷裂之觀點中,或於適度增大濕度膨脹係數(亦稱為「CHE比」),容易調整至對於黏著較佳的程度之捲曲量之觀點中,較佳為10萬以上,更佳為100萬以上。藉由(甲基)丙烯酸系樹脂之重量平均分子量為100萬以上,可提高所得之偏光板用樹脂薄膜的韌性。藉此,將該偏光板用樹脂薄膜搬運至積層薄膜時,可抑制因搬運張力而偏光板用樹脂薄膜斷裂,可提高搬運安定性。(甲基)丙烯酸系樹脂之重量平均分子量,基於同樣之觀點,更佳為150萬~300萬之範圍內。重量平均分子量之測定方法係如前述。The weight average molecular weight (Mw) of the (meth)acrylic resin is not particularly limited, and can be adjusted according to the purpose. The weight-average molecular weight of the (meth)acrylic resin, for example, promotes the entanglement of resin molecules to improve the toughness of the resin film for polarizing plates, and is not easy to break, or in the view of moderately increasing the coefficient of humidity expansion (also known as "" CHE ratio"), from the viewpoint of easily adjusting the amount of curl to a better degree of adhesion, is preferably 100,000 or more, more preferably 1 million or more. When the weight average molecular weight of the (meth)acrylic resin is 1 million or more, the toughness of the obtained resin film for polarizing plates can be improved. Thereby, when this resin film for polarizing plates is conveyed to a laminated film, it can suppress that the resin film for polarizing plates breaks by conveying tension, and can improve conveyance stability. From the same viewpoint, the weight average molecular weight of the (meth)acrylic resin is more preferably in the range of 1.5 million to 3 million. The method for measuring the weight average molecular weight is as described above.

<苯乙烯-(甲基)丙烯酸酯共聚物> 本發明中,藉由使用苯乙烯-(甲基)丙烯酸酯共聚物(以下亦稱為苯乙烯-丙烯酸樹脂),得到透明性優異的偏光板用樹脂薄膜。又,由於可藉由苯乙烯部分之共聚合比率來調整濕度膨脹係數,故藉由變更該等之比率,可控制本發明之偏光板的捲曲。 <Styrene-(meth)acrylate copolymer> In this invention, the resin film for polarizing plates excellent in transparency is obtained by using a styrene-(meth)acrylate copolymer (it is also called a styrene-acrylic resin hereafter). Moreover, since the humidity expansion coefficient can be adjusted by the copolymerization ratio of a styrene part, curling of the polarizing plate of this invention can be controlled by changing these ratios.

苯乙烯-丙烯酸樹脂係至少使苯乙烯單體與(甲基)丙烯酸酯單體進行加成聚合而形成。苯乙烯單體係除了以CH 2=CH-C 6H 5之結構式所示的苯乙烯之外,還包含在苯乙烯結構中具有眾所周知的側鏈或官能基之苯乙烯衍生物。 The styrene-acrylic resin is formed by addition-polymerizing at least a styrene monomer and a (meth)acrylate monomer. In addition to styrene represented by the structural formula of CH 2 ═CH—C 6 H 5 , the styrene monomer system also includes styrene derivatives having well-known side chains or functional groups in the styrene structure.

又,(甲基)丙烯酸酯單體係除了CH(R 1)=CHCOOR 2(R 1表示氫原子或甲基,R 2表示碳數為1~24的烷基)所示的丙烯酸酯或甲基丙烯酸酯之外,還包含在該等之酯的結構中具有眾所周知的側鏈或官能基之丙烯酸酯衍生物或甲基丙烯酸酯衍生物。 In addition, the (meth)acrylate monomer system except CH(R 1 )=CHCOOR 2 (R 1 represents a hydrogen atom or a methyl group, and R 2 represents an alkyl group with 1 to 24 carbons) or methacrylate In addition to acrylates, acrylate derivatives or methacrylate derivatives having well-known side chains or functional groups in the structure of these esters are also included.

作為苯乙烯單體之例,可舉出苯乙烯、o-甲基苯乙烯、m-甲基苯乙烯、p-甲基苯乙烯、α-甲基苯乙烯、p-苯基苯乙烯、p-乙基苯乙烯、2,4-二甲基苯乙烯、p-第三丁基苯乙烯、p-n-己基苯乙烯、p-n-辛基苯乙烯、p-n-壬基苯乙烯、p-n-癸基苯乙烯及p-n-十二基苯乙烯。Examples of styrene monomers include styrene, o-methylstyrene, m-methylstyrene, p-methylstyrene, α-methylstyrene, p-phenylstyrene, p -Ethylstyrene, 2,4-dimethylstyrene, p-tert-butylstyrene, p-n-hexylstyrene, p-n-octylstyrene, p-n-nonylstyrene, p-n-decylbenzene Ethylene and p-n-dodecylstyrene.

作為(甲基)丙烯酸酯單體之例,可舉出丙烯酸甲酯、丙烯酸乙酯、丙烯酸異丙酯、丙烯酸正丁酯、丙烯酸第三丁酯、丙烯酸異丁酯、丙烯酸正辛酯、丙烯酸2-乙基己酯(2EHA)、丙烯酸十八酯、丙烯酸月桂酯及丙烯酸苯酯等之丙烯酸酯單體;甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸正丁酯、甲基丙烯酸異丙酯、甲基丙烯酸異丁酯、甲基丙烯酸第三丁酯、甲基丙烯酸正辛酯、甲基丙烯酸2-乙基己酯、甲基丙烯酸十八酯、甲基丙烯酸月桂酯、甲基丙烯酸苯酯、甲基丙烯酸二乙基胺基乙酯、甲基丙烯酸二甲基胺基乙酯等之甲基丙烯酸酯。Examples of (meth)acrylate monomers include methyl acrylate, ethyl acrylate, isopropyl acrylate, n-butyl acrylate, tert-butyl acrylate, isobutyl acrylate, n-octyl acrylate, acrylic acid Acrylate monomers such as 2-ethylhexyl (2EHA), octadecyl acrylate, lauryl acrylate and phenyl acrylate; methyl methacrylate, ethyl methacrylate, n-butyl methacrylate, methyl Isopropyl acrylate, isobutyl methacrylate, tert-butyl methacrylate, n-octyl methacrylate, 2-ethylhexyl methacrylate, octadecyl methacrylate, lauryl methacrylate, Methacrylates such as phenyl methacrylate, diethylaminoethyl methacrylate, and dimethylaminoethyl methacrylate.

尚且,本說明書中,所謂「(甲基)丙烯酸酯單體」,就是「丙烯酸酯單體」與「甲基丙烯酸酯單體」之總稱,意指彼等之一者或兩者。例如,「(甲基)丙烯酸甲酯」意指「丙烯酸甲酯」及「甲基丙烯酸甲酯」之一者或兩者。Furthermore, in this specification, the so-called "(meth)acrylate monomer" is a general term for "acrylate monomer" and "methacrylate monomer", and means one or both of them. For example, "methyl (meth)acrylate" means either or both of "methyl acrylate" and "methyl methacrylate".

上述(甲基)丙烯酸酯單體可單獨使用一種,也可組合二種以上使用。例如,可為以下的任一者:使用苯乙烯單體與二種以上的丙烯酸酯單體來形成共聚物,使用苯乙烯單體與二種以上的甲基丙烯酸酯單體來形成共聚物,及併用苯乙烯單體與丙烯酸酯單體和甲基丙烯酸酯單體來形成共聚物。The above (meth)acrylate monomers may be used alone or in combination of two or more. For example, any of the following may be used: a copolymer is formed by using a styrene monomer and two or more kinds of acrylate monomers, a copolymer is formed by using a styrene monomer and two or more kinds of methacrylate monomers, And styrene monomers are used in combination with acrylate monomers and methacrylate monomers to form copolymers.

上述苯乙烯-丙烯酸樹脂之重量平均分子量(Mw),從容易控制可塑性之觀點來看,較佳為5000~150000之範圍內,更佳為30000~120000之範圍內。The weight average molecular weight (Mw) of the styrene-acrylic resin is preferably within a range of 5,000 to 150,000, more preferably within a range of 30,000 to 120,000, from the viewpoint of easy control of plasticity.

本發明所用的苯乙烯-丙烯酸樹脂可為市售品,可舉出DENKA股份有限公司製的MS樹脂「TX320XL」作為一例。The styrene-acrylic resin used in the present invention may be a commercial item, and MS resin "TX320XL" manufactured by Denka Co., Ltd. is mentioned as an example.

<富馬酸二酯系樹脂> 本發明中,富馬酸二酯系樹脂係包含富馬酸二異丙酯殘基單元及具有碳數1或2的烷基之富馬酸二酯殘基單元的富馬酸二酯系樹脂。 <Fumaric acid diester resin> In the present invention, the fumaric acid diester resin is a fumaric acid diester resin comprising a fumaric acid diester residue unit and a fumaric acid diester residue unit having an alkyl group having 1 or 2 carbon atoms. .

此處,具有碳數1或2的烷基之富馬酸二酯殘基單元中的碳數1或2的烷基係各自獨立,例如可舉出甲基、乙基等。又,此等亦可被氟、氯等之鹵基、醚基、酯基或胺基所取代。作為具有碳數1或2的烷基之富馬酸二酯殘基單元,例如可舉出富馬酸二甲酯殘基單元、富馬酸二乙酯殘基單元。又,此等可包含一種或二種以上。Here, the alkyl groups having 1 or 2 carbon atoms in the fumaric acid diester residue unit having an alkyl group having 1 or 2 carbon atoms are each independently, and examples thereof include methyl groups, ethyl groups, and the like. In addition, these may be substituted with halogen groups such as fluorine and chlorine, ether groups, ester groups, or amino groups. Examples of the fumaric acid diester residue unit having an alkyl group having 1 or 2 carbon atoms include a fumarate dimethyl residue unit and a fumarate diethyl residue unit. Moreover, these may contain 1 type or 2 or more types.

作為具體的富馬酸二酯系樹脂,例如可舉出富馬酸二異丙酯/富馬酸二甲酯共聚物樹脂、富馬酸二異丙酯/富馬酸二乙酯共聚物樹脂等。Specific examples of fumaric acid diester resins include diisopropyl fumarate/dimethyl fumarate copolymer resin, diisopropyl fumarate/diethyl fumarate copolymer resin wait.

富馬酸二酯系樹脂,只要不超過本發明之範圍,則亦可含有其他的單體殘基單元,作為其他的單體殘基單元,例如可舉出由苯乙烯殘基單元、α-甲基苯乙烯殘基單元等之苯乙烯類殘基單元;(甲基)丙烯酸殘基單元;(甲基)丙烯酸甲酯殘基單元、(甲基)丙烯酸乙酯殘基單元、(甲基)丙烯酸丁酯殘基單元等之(甲基)丙烯酸酯殘基單元;乙酸乙烯酯殘基單元、丙酸乙烯酯殘基單元等之乙烯酯類殘基單元;丙烯腈殘基單元;甲基丙烯腈殘基單元;甲基乙烯基醚殘基單元、乙基乙烯基醚殘基單元、丁基乙烯基醚殘基單元等之乙烯基醚類殘基單元;N-甲基馬來醯亞胺殘基單元、N-環己基馬來醯亞胺殘基單元、N-苯基馬來醯亞胺殘基單元等之N-取代馬來醯亞胺類殘基單元;乙烯殘基單元、丙烯殘基單元等之烯烴類殘基單元;富馬酸二正丁酯殘基單元、富馬酸雙(2-乙基己基)酯殘基單元等之前述富馬酸二酯殘基單元以外的富馬酸二酯類殘基;及桂皮酸及桂皮酸酯單元所選出的1種或2種以上。Fumaric acid diester resins may also contain other monomer residue units as long as they do not exceed the scope of the present invention. As other monomer residue units, for example, styrene residue units, α- Styrenic residue units such as methylstyrene residue units; (meth)acrylic acid residue units; methyl (meth)acrylate residue units, ethyl (meth)acrylate residue units, (meth)acrylate residue units, (meth)acrylate residue units such as butyl acrylate residue units; vinyl ester residue units such as vinyl acetate residue units and vinyl propionate residue units; acrylonitrile residue units; Acrylonitrile residue unit; vinyl ether residue unit such as methyl vinyl ether residue unit, ethyl vinyl ether residue unit, butyl vinyl ether residue unit, etc.; N-methylmaleinyl N-substituted maleimide residue units such as amine residue unit, N-cyclohexylmaleimide residue unit, N-phenylmaleimide residue unit, etc.; ethylene residue unit, Olefin residue units such as propylene residue units; di-n-butyl fumarate residue units, bis(2-ethylhexyl) fumarate residue units, etc. other than the aforementioned fumaric acid diester residue units Fumaric acid diester residues; and 1 or more selected cinnamic acid and cinnamic acid ester units.

本發明所用之富馬酸二酯系樹脂的摻合比例,較佳為富馬酸二異丙酯殘基單元50~99莫耳%及具有碳數1或2的烷基之富馬酸二酯殘基單元1~50莫耳%。從成為相位差薄膜時的相位差特性或強度之觀點來看,特佳為由富馬酸二異丙酯殘基單元60~95莫耳%及具有碳數1或2的烷基之富馬酸二酯殘基單元5~40莫耳%所構成之富馬酸二酯系樹脂。The blending ratio of the fumaric acid diester resin used in the present invention is preferably 50-99 mol% of diisopropyl fumarate residue units and fumaric acid diisopropyl fumarate having an alkyl group with 1 or 2 carbon atoms. Ester residue unit 1~50 mol%. From the point of view of retardation characteristics or strength when it becomes a retardation film, it is particularly preferable to be a fumarate having 60 to 95 mol% of diisopropyl fumarate residue units and an alkyl group with 1 or 2 carbons. Fumaric acid diester resin composed of 5~40 mol% of acid diester residue units.

本發明所用之富馬酸二酯系樹脂係藉由前述凝膠滲透層析術所測定的洗提曲線而得之標準聚苯乙烯換算的數量平均分子量較佳為50000~250000之範圍內。The fumaric acid diester resin used in the present invention is preferably in the range of 50,000 to 250,000 in standard polystyrene conversion number average molecular weight obtained from the elution curve measured by the aforementioned gel permeation chromatography.

(富馬酸二酯系樹脂之合成例) 於具備攪拌機、冷卻管、氮導入管及溫度計的1L之高壓釜中,加入羥丙基甲基纖維素(信越化學公司製,商品名Metolose 60SH-50)2g、蒸餾水600g、富馬酸二異丙酯330g、富馬酸二乙酯70g及作為聚合起始劑的第三丁基過氧特戊酸酯3g,進行氮氣冒泡1小時後,藉由以400rpm邊攪拌邊在50℃下保持24小時而進行自由基懸浮聚合。冷卻到室溫,過濾分離包含所生成的聚合物粒子之懸浮液,藉由以蒸餾水及甲醇洗淨而得到富馬酸二酯系樹脂(產率:75%)。 (Synthesis example of fumaric acid diester resin) In a 1L autoclave equipped with a stirrer, a cooling pipe, a nitrogen introduction pipe, and a thermometer, 2 g of hydroxypropyl methylcellulose (manufactured by Shin-Etsu Chemical Co., Ltd., trade name Metolose 60SH-50), 600 g of distilled water, and diisofumaric acid were added. 330 g of propyl ester, 70 g of diethyl fumarate, and 3 g of tertiary butylperoxypivalate as a polymerization initiator were bubbled with nitrogen for 1 hour, and kept at 50° C. while stirring at 400 rpm. Free radical suspension polymerization was carried out for 24 hours. After cooling to room temperature, the suspension containing the generated polymer particles was separated by filtration, and washed with distilled water and methanol to obtain a fumaric acid diester resin (yield: 75%).

所得之富馬酸二酯系樹脂的數量平均分子量為120000。又,藉由1H-NMR測定,確認樹脂組成為富馬酸二異丙酯殘基單元/富馬酸二乙酯殘基單元=84/16(莫耳%)。The number average molecular weight of the obtained fumaric acid diester resin was 120,000. Also, by 1H-NMR measurement, it was confirmed that the resin composition was diisopropyl fumarate residue unit/diethyl fumarate residue unit=84/16 (mol %).

<聚芳酯系樹脂> 本發明中,藉由使用聚芳酯系樹脂,得到韌性優異的薄膜。該聚芳酯系樹脂至少包含源自芳香族二醇的構成單元與源自芳香族二羧酸的構成單元。 <Polyarylate resin> In the present invention, a film excellent in toughness can be obtained by using a polyarylate-based resin. This polyarylate resin contains at least a structural unit derived from an aromatic diol and a structural unit derived from an aromatic dicarboxylic acid.

本發明所用的聚芳酯系樹脂可為市售品,可舉出UNITIKA股份有限公司製的PAR樹脂「U-100」、重量平均分子量(Mw)100000作為一例。The polyarylate-based resin used in the present invention may be a commercially available product, and PAR resin "U-100" manufactured by UNITIKA Co., Ltd., with a weight average molecular weight (Mw) of 100,000, is mentioned as an example.

[1.2 碘移動抑制劑] 本發明中,所謂「碘移動抑制劑」,就指具有物理地抑制碘的移動之功能的化學材料,包含散熱性材料及電荷排斥性材料。 所謂散熱性材料,就是指為了抑制多碘吸收熱能而活躍地移動者,容易將偏光子層內之熱進行散熱之材料。 又,所謂電荷排斥性材料,就是指對於具有電荷的多碘,藉由發生電荷排斥,而防礙碘的移動之材料。 [1.2 Iodine movement inhibitors] In the present invention, the so-called "iodine movement inhibitor" refers to a chemical material having the function of physically inhibiting the movement of iodine, including heat-dissipating materials and charge-repelling materials. The so-called heat-dissipating material refers to a material that actively moves in order to suppress the absorption of heat energy by polyiodine, and is easy to dissipate the heat in the polarizer layer. In addition, the so-called charge-repelling material refers to a material that prevents the movement of iodine by generating charge repulsion with respect to polyiodine having a charge.

[1.2.1 散熱性材料] 作為散熱性材料,只要是具有比較高的熱傳導性,可使本發明之偏光板用樹脂薄膜的熱傳導性提升之材料,則沒有特別的限制。作為例子,可舉出聚甲基丙烯酸甲酯(PMMA)、聚碳酸酯、玻璃、矽橡膠、鑽石、鑽石狀碳(DLC)、氮化鋁、氮化矽、氮化硼、氮化鎂、碳化矽、氧化鋁、氧化矽、氧化鋅、氧化鎂等。於此等之中,從熱傳導性之觀點來看,較佳為金屬氧化物粒子。又,從不損害偏光板用樹脂薄膜的透明性之觀點來看,較佳為使用透明的粒子。 [1.2.1 Heat dissipation material] The heat dissipation material is not particularly limited as long as it has relatively high thermal conductivity and can improve the thermal conductivity of the resin film for polarizing plates of the present invention. Examples include polymethyl methacrylate (PMMA), polycarbonate, glass, silicone rubber, diamond, diamond-like carbon (DLC), aluminum nitride, silicon nitride, boron nitride, magnesium nitride, Silicon carbide, aluminum oxide, silicon oxide, zinc oxide, magnesium oxide, etc. Among these, metal oxide particles are preferable from the viewpoint of thermal conductivity. Moreover, it is preferable to use transparent particle|grains from a viewpoint which does not impair the transparency of the resin film for polarizing plates.

含有上述散熱性材料作為碘移動抑制劑的偏光板用樹脂薄膜之熱傳導度,較佳為0.2~0.6W/m・K之範圍內。藉由上述範圍內,於具備具有本發明之偏光板用樹脂薄膜的偏光板之顯示裝置中,即使隨著使用而偏光子層發熱,或因半導體基板的發熱而熱傳達至偏光子層,也由於該偏光板用樹脂薄膜的熱傳導性比較高,亦即該偏光板用樹脂薄膜具有散熱性,故熱不易傳達至多碘,可抑制熱所致之多碘的移動。再者,藉由熱傳導度為0.2W/m・K以上,偏光板用樹脂薄膜具有充分的散熱性,藉由0.6W/m・K以下,不易發生因與其他構件的溫度差所造成的顯示裝置之不良狀況。The thermal conductivity of the resin film for polarizing plates containing the above heat-dissipating material as an iodine transfer inhibitor is preferably in the range of 0.2 to 0.6 W/m・K. Within the above range, in a display device provided with a polarizing plate having the polarizing plate resin film of the present invention, even if the polarizer layer generates heat during use, or heat is transmitted to the polarizer layer due to heat generated by the semiconductor substrate, Since the thermal conductivity of the resin film for polarizing plates is relatively high, that is, the resin film for polarizing plates has heat dissipation, heat is not easily transmitted to polyiodine, and the movement of polyiodine due to heat can be suppressed. Furthermore, when the thermal conductivity is 0.2W/m・K or more, the resin film for polarizing plates has sufficient heat dissipation, and when it is less than 0.6W/m・K, it is difficult to cause display problems caused by temperature differences with other components. Defective condition of the device.

本發明之樹脂薄膜之熱傳導度可如以下地測定。 將樹脂薄膜夾於TO-3型加熱箱(heater case)與銅板之間,壓縮薄膜之厚度的10%。接著,對於銅製加熱箱施加電力5W,保持4分鐘,測定銅製加熱箱與銅板之溫度差。熱導電率可藉由下述式算出。 熱傳導度{W/m・K}={電力(W)×厚度(m)}/{溫度差(K)×測定面積(m 2)} The thermal conductivity of the resin film of the present invention can be measured as follows. The resin film was sandwiched between a TO-3 type heater case and a copper plate, and the thickness of the film was compressed by 10%. Next, 5W of electric power was applied to the copper heating box and kept for 4 minutes, and the temperature difference between the copper heating box and the copper plate was measured. Thermal conductivity can be calculated by the following formula. Thermal conductivity {W/m・K}={power (W)×thickness (m)}/{temperature difference (K)×measurement area (m 2 )}

[1.2.1.1 金屬氧化物粒子] 本發明中,從容易將偏光板用樹脂薄膜之熱傳導度調整至上述合適的範圍之觀點來看,散熱性材料較佳為金屬氧化物粒子。作為金屬氧化物粒子,例如可舉出氧化鋁、氧化矽、氧化鋅、氧化鎂、氧化鈦等。此等可被矽烷偶合劑等所表面處理。 [1.2.1.1 Metal oxide particles] In the present invention, the heat dissipation material is preferably metal oxide particles from the viewpoint of easily adjusting the thermal conductivity of the resin film for polarizing plates to the above-mentioned suitable range. Examples of metal oxide particles include aluminum oxide, silicon oxide, zinc oxide, magnesium oxide, titanium oxide, and the like. These can be surface treated with silane coupling agents, etc.

作為本發明所用的金屬氧化物粒子,可使用市售品,作為氧化鋁的市售品,例如可舉出商品名「AS-50」(昭和電工公司製)、商品名「AL-13KT」(平均粒徑96μm)(昭和電工公司製)等。又,作為氧化鋅的市售品,可舉出商品名「SnO-310」(住友大阪水泥公司製),商品名「SnO-350」(住友大阪水泥公司製),商品名「SnO-410」(住友大阪水泥公司製)等。As the metal oxide particles used in the present invention, commercially available products can be used, and examples of commercially available alumina products include trade name "AS-50" (manufactured by Showa Denko Co., Ltd.), trade name "AL-13KT" ( Average particle diameter: 96 μm) (manufactured by Showa Denko Co., Ltd.) and the like. Moreover, as a commercial item of zinc oxide, a brand name "SnO-310" (made by Sumitomo Osaka Cement Co., Ltd.), a brand name "SnO-350" (manufactured by Sumitomo Osaka Cement Co., Ltd.), and a brand name "SnO-410" are mentioned. (manufactured by Sumitomo Osaka Cement Co., Ltd.), etc.

本發明中,「一次粒子」之用語係作為結晶體及結晶體共用特定的面構成強凝聚體者(稱為「凝集體」)之總稱使用。再者,將該一次粒子凝聚形成的粒子凝聚體(稱為「黏聚物」)稱為「二次粒子」。In the present invention, the term "primary particle" is used as a general term for crystals and crystals that share a specific surface to form a strong aggregate (called "aggregate"). Furthermore, the particle aggregate (referred to as "agglomerate") formed by the aggregation of the primary particles is called "secondary particle".

本發明中,平均一次粒徑(上述一次粒子的粒徑)及平均二次粒徑(上述二次粒子的粒徑)係如以下定義。In the present invention, the average primary particle diameter (particle diameter of the above-mentioned primary particles) and the average secondary particle diameter (particle diameter of the above-mentioned secondary particles) are defined as follows.

於藉由超薄切片法所調製的試料中,以穿透型電子顯微鏡(例如,日立製H-7100FA型)觀察一次粒子(或二次粒子),將假定與其投影面積相等的圓時之直徑(所謂圓等效直徑)當作一次粒徑(或二次粒徑)。然後,將如此所得之1000個的一次粒子(或二次粒子)之粒徑進行平均,將其平均值當作平均一次粒徑(或平均二次粒徑)。In the sample prepared by the ultrathin section method, observe the primary particle (or secondary particle) with a transmission electron microscope (for example, H-7100FA manufactured by Hitachi), and assume the diameter of a circle equal to its projected area (The so-called circle equivalent diameter) is regarded as the primary particle diameter (or secondary particle diameter). Then, the particle diameters of 1000 primary particles (or secondary particles) obtained in this way were averaged, and the average value was regarded as the average primary particle diameter (or average secondary particle diameter).

金屬氧化物粒子的平均一次粒徑較佳為50~100nm之範圍內,更佳為80nm左右。又,平均二次粒徑較佳為1000nm以上,更佳為1200nm以上。再者,粒子之形狀可為球狀,也可為針狀。The average primary particle size of the metal oxide particles is preferably in the range of 50-100 nm, more preferably about 80 nm. Also, the average secondary particle diameter is preferably at least 1000 nm, more preferably at least 1200 nm. Furthermore, the shape of the particles may be spherical or needle-like.

金屬氧化物粒子的平均一次粒徑與平均二次粒徑之比之值較佳為滿足下述式。 20<平均二次粒徑/平均一次粒徑<2000 The value of the ratio of the average primary particle size to the average secondary particle size of the metal oxide particles preferably satisfies the following formula. 20<average secondary particle size/average primary particle size<2000

本發明之金屬氧化物粒子係藉由吸收偏光子層的熱能,將該熱能傳送到鄰接的粒子,而實現散熱功能。於本發明之偏光板用樹脂薄膜中,金屬氧化物粒子彼此之間由於被熱傳導性比較低的熱塑性樹脂所隔開,故難以傳送熱能。因此,藉由金屬氧化物粒子適度地形成凝聚體,粒子彼此接觸,而更能傳送熱能,散熱功能提升。The metal oxide particles of the present invention realize the heat dissipation function by absorbing the heat energy of the polarizer layer and transferring the heat energy to adjacent particles. In the resin film for polarizing plates of the present invention, the metal oxide particles are separated by the thermoplastic resin with relatively low thermal conductivity, so it is difficult to transmit heat energy. Therefore, due to the moderate formation of aggregates of the metal oxide particles, the particles are in contact with each other, so that heat energy can be transmitted more, and the heat dissipation function is improved.

藉由金屬氧化物粒子的平均一次粒徑與平均二次粒徑之比之值超過20,得到充分的散熱功能。比值愈大愈佳,但藉由未達2000,顯示裝置內的各構件之溫度差不太大,可防止顯示裝置的劣化及不良狀況。金屬氧化物粒子的平均一次粒徑與平均二次粒徑之比之值,可藉由將金屬氧化物粒子分散而控制。When the ratio of the average primary particle size to the average secondary particle size of the metal oxide particles exceeds 20, a sufficient heat dissipation function is obtained. The larger the ratio, the better, but if it is less than 2000, the temperature difference between the various components in the display device will not be too large, and the deterioration and failure of the display device can be prevented. The value of the ratio of the average primary particle diameter to the average secondary particle diameter of the metal oxide particles can be controlled by dispersing the metal oxide particles.

相對於熱塑性樹脂之總質量,散熱性材料之含量較佳為5~50質量%之範圍內。藉由5質量%以上,得到充分的熱傳導性,藉由50質量%以下,在生產性之方面得到充分的強度。Relative to the total mass of the thermoplastic resin, the content of the heat dissipation material is preferably in the range of 5-50% by mass. With 5% by mass or more, sufficient thermal conductivity is obtained, and with 50% by mass or less, sufficient strength is obtained in terms of productivity.

[1.2.2 電荷排斥性材料] 作為電荷排斥性材料,只要是對於具有電荷的多碘,藉由發生電荷排斥,而防礙碘的移動之材料,則沒有特別的限制。從與多碘(I 3 -或I 5 -)發生電荷排斥之觀點來看,作為如此的電荷排斥性材料,較佳為具有負電荷的化合物或具有負極性的化合物。 [1.2.2 Charge-repelling material] The charge-repelling material is not particularly limited as long as it prevents the movement of iodine by generating charge repulsion with respect to polyiodine having a charge. From the viewpoint of charge repulsion with polyiodine (I 3 - or I 5 - ), such a charge repelling material is preferably a compound having a negative charge or a compound having a negative polarity.

[1.2.2.1 非有機酸] 本發明中,從不易因與多碘的中和而析出反應物之觀點來看,電荷排斥性材料較佳為非有機酸。本發明中,所謂非有機酸,就是指不具有羧酸基、磺酸基等供質子基之碳數為5以上的有機化合物。從即使電荷偏向存在時也反應性低而安定之觀點來看,碳數為15以上的有機化合物更佳。作為具有極性的非有機酸,並沒有特別的限制,可舉出陰離子性界面活性劑、陰離子性配位子、三苯基甲烷衍生物、巴比妥酸系化合物等。 [1.2.2.1 Non-organic acids] In the present invention, the charge-repelling material is preferably a non-organic acid from the viewpoint that the reaction product is less likely to be precipitated by neutralization with polyiodine. In the present invention, the so-called non-organic acid refers to an organic compound having 5 or more carbon atoms that does not have a proton-donating group such as a carboxylic acid group or a sulfonic acid group. From the viewpoint of low reactivity and stability even in the presence of charge bias, an organic compound having 15 or more carbon atoms is more preferable. The polar non-organic acid is not particularly limited, and examples thereof include anionic surfactants, anionic ligands, triphenylmethane derivatives, barbituric acid-based compounds, and the like.

非有機酸之分子量較佳為200~1000之範圍內,更佳為250~800之範圍內,尤佳為280~600之範圍內。藉由分子量為200以上,可抑制偏光板用樹脂薄膜製膜時之非有機酸因揮散所致的消失。又,藉由1000以下,薄膜所含有的熱塑性樹脂與非有機酸之相溶性良好,得到低霧度的薄膜。The molecular weight of the non-organic acid is preferably within the range of 200-1000, more preferably within the range of 250-800, and especially preferably within the range of 280-600. When the molecular weight is 200 or more, it is possible to suppress the disappearance of the non-organic acid due to volatilization during film formation of the resin film for polarizing plates. Moreover, when it is 1000 or less, the compatibility of the thermoplastic resin contained in a film and a non-organic acid becomes favorable, and the film with low haze is obtained.

非有機酸係漢森溶解度參數(HSP值)的δP(極性力)較佳為5~9MPa 0.5之範圍內。藉由δP為5MPa 0.5以上,非有機酸係與多碘充分地進行電荷排斥。藉由δP為9MPa 0.5以下,具有與樹脂的親和性,抑制滲出。又,藉由設為適度的排斥力,可保持偏光子層中的多碘之配向性。漢森溶解度參數係詳細如後述。 The δP (polar force) of the Hansen solubility parameter (HSP value) of the non-organic acid is preferably within the range of 5~9MPa 0.5 . When δP is 5 MPa 0.5 or more, the charge repulsion between the non-organic acid system and polyiodine is sufficient. When δP is 9MPa 0.5 or less, it has affinity with resin and suppresses bleeding. Also, by setting an appropriate repulsion force, the alignment of polyiodine in the polarizer layer can be maintained. The details of the Hansen solubility parameter system will be described later.

<陰離子性界面活性劑> 作為陰離子性界面活性劑,並沒有特別的限制,但較佳為具有長鏈烷基的界面活性劑,更佳為具有碳數6~20的烷基之界面活性劑。 <Anionic Surfactants> The anionic surfactant is not particularly limited, but is preferably a surfactant having a long-chain alkyl group, more preferably a surfactant having an alkyl group having 6 to 20 carbon atoms.

作為例子,於硫酸酯鹽型中,可舉出月桂基硫酸鈉、己基硫酸鈉、庚基硫酸鈉、辛基硫酸鈉、壬基硫酸鈉、癸基硫酸鈉、十二基硫酸鈉、十四基硫酸鈉、十六基硫酸鈉、十八基硫酸鈉、二十基硫酸鈉,或此等之鉀鹽、鈣鹽、銨鹽等之烷基硫酸酯鹽、聚氧乙烯己基醚硫酸鈉、聚氧乙烯庚基醚硫酸鈉、聚氧乙烯辛基醚硫酸鈉、聚氧乙烯壬基醚硫酸鈉、聚氧乙烯癸基醚硫酸鈉、聚氧乙烯十二基醚硫酸鈉、聚氧乙烯十四基醚硫酸鈉、聚氧乙烯十六基醚硫酸鈉、聚氧乙烯十八基醚硫酸鈉、聚氧乙烯二十基醚硫酸鈉,或此等之鉀鹽、銨鹽等之聚氧乙烯烷基醚硫酸鹽、聚氧乙烯己基苯基醚硫酸鈉、聚氧乙烯庚基苯基醚硫酸鈉、聚氧乙烯辛基苯基醚硫酸鈉、聚氧乙烯壬基苯基醚硫酸鈉、聚氧乙烯癸基苯基醚硫酸鈉、聚氧乙烯十二基苯基醚硫酸鈉、聚氧乙烯十四基苯基醚硫酸鈉、聚氧乙烯十六基苯基醚硫酸鈉、聚氧乙烯十八基苯基醚硫酸鈉、聚氧乙烯二十基苯基醚硫酸鈉,或此等之鉀鹽、銨鹽等之聚氧乙烯烷基苯基醚硫酸鹽、己酸乙醇醯胺硫酸鈉、辛酸乙醇醯胺硫酸鈉、癸酸乙醇醯胺硫酸鈉、月桂酸乙醇醯胺硫酸鈉、棕櫚酸乙醇醯胺硫酸鈉、硬脂酸乙醇醯胺硫酸鈉、油酸乙醇醯胺硫酸鈉或此等之鉀鹽,再者代替等乙醇醯胺,丙醇醯胺、丁醇醯胺等之高級脂肪酸烷醇醯胺硫酸酯鹽、硫酸化油、高級醇乙氧基硫酸鹽、單甘油硫酸鹽(monoglysulfate)等。As examples, in the sulfate ester salt type, sodium lauryl sulfate, sodium hexyl sulfate, sodium heptyl sulfate, sodium octyl sulfate, sodium nonyl sulfate, sodium decyl sulfate, sodium lauryl sulfate, sodium tetradecyl sulfate, Sodium hexadecyl sulfate, sodium cetyl sulfate, sodium octadecyl sulfate, sodium eicosyl sulfate, or alkyl sulfate ester salts of potassium salts, calcium salts, ammonium salts, sodium polyoxyethylene hexyl ether sulfate, Sodium polyoxyethylene heptyl ether sulfate, sodium polyoxyethylene octyl ether sulfate, sodium polyoxyethylene nonyl ether sulfate, sodium polyoxyethylene decyl ether sulfate, sodium polyoxyethylene lauryl ether sulfate, polyoxyethylene tenyl ether sulfate Sodium tetrayl ether sulfate, sodium polyoxyethylene hexadecyl ether sulfate, sodium polyoxyethylene stearyl ether sulfate, sodium polyoxyethylene eicosyl ether sulfate, or polyoxyethylene of these potassium salts, ammonium salts, etc. Alkyl ether sulfate, sodium polyoxyethylene hexylphenyl ether sulfate, sodium polyoxyethylene heptylphenyl ether sulfate, sodium polyoxyethylene octylphenyl ether sulfate, sodium polyoxyethylene nonylphenyl ether sulfate, polyoxyethylene Sodium Oxyethylene Decyl Phenyl Ether Sulfate, Sodium Polyoxyethylene Lauryl Phenyl Ether Sulfate, Sodium Polyoxyethylene Tetradecyl Phenyl Ether Sulfate, Sodium Polyoxyethylene Hexadecyl Phenyl Ether Sulfate, Polyoxyethylene Decyl Phenyl Ether Sodium octalphenyl ether sulfate, sodium polyoxyethylene eicosylphenyl ether sulfate, or polyoxyethylene alkylphenyl ether sulfate, sodium caproate ethanolamide sulfate, potassium salt, ammonium salt, etc. Sodium ethanolamide caprylate sulfate, sodium ethanolamide caprate sulfate, sodium ethanolamide sulfate laurate, sodium ethanolamide sulfate palmitate, sodium ethanolamide sulfate stearate, sodium ethanolamide oleate sulfate or others Potassium salts, and other higher fatty acid alkanolamide sulfates, sulfated oils, higher alcohol ethoxysulfates, monoglycerol sulfates ( monoglysulfate) and so on.

又,除了上述硫酸酯鹽型以外,還可舉出油酸鈉或蓖麻油鉀皂等之脂肪酸皂、N-醯基胺基酸及其鹽、聚氧乙烯烷基酯羧酸鹽、醯基化胜肽等之羧酸鹽型、己基磺酸鈉、庚基磺酸鈉、辛基磺酸鈉、壬基磺酸鈉、癸基磺酸鈉、十二基磺酸鈉、十四基磺酸鈉、十六基磺酸鈉、十八基磺酸鈉、碳數6~18的脂肪族烷基磺酸鈉之混合物、烷基苯磺酸鹽、烷基萘磺酸鹽、萘磺酸的鹽福馬林聚縮合物、三聚氰胺磺酸的鹽福馬林縮合物、二烷基磺基琥珀酸酯鹽、烯基琥珀酸鹽、磺基琥珀酸烷基二鹽、聚氧乙烯烷基磺基琥珀酸二鹽、烷基磺基乙酸鹽、α-烯烴磺酸鹽、N-醯基甲基牛磺鹽、二甲基-5-磺基間苯二甲酸鈉鹽等之磺酸鹽型、聚氧乙烯烷基醚磷酸鹽、聚氧乙烯烷基苯基醚磷酸鹽、烷基磷酸鹽等之磷酸酯鹽型等。In addition, in addition to the above-mentioned sulfate ester salt type, fatty acid soaps such as sodium oleate and castor oil potassium soap, N-acyl amino acids and their salts, polyoxyethylene alkyl carboxylates, acyl Carboxylate salt type of chemical peptides, sodium hexylsulfonate, sodium heptylsulfonate, sodium octylsulfonate, sodium nonylsulfonate, sodium decylsulfonate, sodium dodecylsulfonate, tetradecylsulfonate Sodium cetyl sulfonate, sodium cetyl sulfonate, sodium octadecyl sulfonate, a mixture of sodium aliphatic alkyl sulfonates with 6 to 18 carbon atoms, alkyl benzene sulfonate, alkyl naphthalene sulfonate, naphthalene sulfonic acid Salt formalin polycondensate, salt formalin condensate of melamine sulfonic acid, dialkyl sulfosuccinate salt, alkenyl succinate, sulfosuccinic acid alkyl di-salt, polyoxyethylene alkyl sulfo Succinic acid disalt, alkyl sulfoacetate, α-olefin sulfonate, N-acylmethyl taurate, dimethyl-5-sulfoisophthalic acid sodium salt, etc. Oxyethylene alkyl ether phosphate, polyoxyethylene alkyl phenyl ether phosphate, phosphate ester salt type of alkyl phosphate, etc.

作為陰離子性界面活性劑,可使用市售品,例如可舉出竹本油脂股份有限公司製的Elecut(註冊商標)S-412-2、花王股份有限公司製的Electrostripper(註冊商標)F等。As an anionic surfactant, a commercial item can be used, For example, Elecut (registered trademark) S-412-2 by Takemoto Oil Co., Ltd., Electrostripper (registered trademark) F by Kao Corporation, etc. are mentioned.

<陰離子性配位子> 本發明中的陰離子性配位子係指與2價的過渡金屬離子(例如可舉出鈷(II)、鎳(II)、銅(II)、鐵(II)、鋅(II)等)能形成錯合物的陰離子性配位子。 <Anionic ligand> The anionic ligand in the present invention refers to a divalent transition metal ion (for example, cobalt (II), nickel (II), copper (II), iron (II), zinc (II), etc.) Anionic ligands that form complexes.

作為陰離子性配位子,可較宜使用下述通式(L1)~(L3)所示的化合物。惟,於任一的化合物中,皆碳數為5以上。As anionic ligands, compounds represented by the following general formulas (L1) to (L3) can be preferably used. However, in any compound, the carbon number is 5 or more.

Figure 02_image011
Figure 02_image011

式中,R 1、R 2、R 3及R 4各自獨立地表示氫原子、烷基、環烷基或芳基,X 1表示-NR 5R 6、OR 7、SR 8(R 5、R 6、R 7及R 8各自表示氫原子、烷基、環烷基或芳基)。n表示0或1。又,R 1與R 3可直接鍵結而形成雙鍵,R 1、R 2、R 3、R 4、X 1之內的二個可形成環。 In the formula, R 1 , R 2 , R 3 and R 4 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group, and X 1 represents -NR 5 R 6 , OR 7 , SR 8 (R 5 , R 6 , R 7 and R 8 each represent a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group). n represents 0 or 1. In addition, R 1 and R 3 may be directly bonded to form a double bond, and two of R 1 , R 2 , R 3 , R 4 , and X 1 may form a ring.

作為R 1~R 4所示的烷基,可舉出甲基、乙基、i-丙基、t-丁基、十二基、1-己基壬基等,作為環烷基,可舉出環丙基、環己基、雙環[2.2.1]庚基、金剛烷基等,作為芳基,可舉出苯基、o-甲苯基、o-大茴香基、1-萘基、9-蒽基等。 Examples of the alkyl group represented by R 1 to R 4 include methyl, ethyl, i-propyl, t-butyl, dodecyl, 1-hexylnonyl, etc., and examples of the cycloalkyl group include Cyclopropyl, cyclohexyl, bicyclo[2.2.1]heptyl, adamantyl, etc. Examples of the aryl group include phenyl, o-tolyl, o-anisyl, 1-naphthyl, and 9-anthracene Base etc.

此等烷基、環烷基、芳基可具有取代基。作為該取代基,可舉出直鏈或分支的烷基(甲基、乙基、i-丙基、t-丁基、十二基、1-己基壬基等)、環烷基(環丙基、環己基、雙環[2.2.1]庚基、金剛烷基等)、烯基(2-丙烯、油基等)、芳基(苯基、o-甲苯基、o-茴香基、1-萘基、9-蒽基等)、雜環基(2-四氫呋喃基、2-噻吩基、4-咪唑基、2-吡啶基等)、鹵素原子(氟、氯、溴等)、氰基、硝基、烷基羰基(乙醯基、三甲基乙醯基等)、芳基羰基(苯甲醯基、五氟苯甲醯基、3,5-二第三丁基-4-羥基苯甲醯基等)、氧基羰基(甲氧基羰基、環己氧基羰基、十二碳氧羰基等的烷氧基羰基、苯氧基羰基、2,4-二第三戊基苯氧基羰基、1-萘氧基羰基等之芳氧基羰基)、雜環氧基羰基(2-吡啶氧基羰基、1-苯基吡唑基-5-氧基羰基等)、胺甲醯基(二甲基胺甲醯基、4-(2,4-二第三戊基苯氧基)丁基胺基羰基等的烷基胺甲醯基、苯基胺甲醯基、1-萘基胺甲醯基等之芳基胺甲醯基)、烷氧基(甲氧基、2-乙氧基乙氧基等)、芳氧基(苯氧基、2,4-二第三戊基苯氧基、4-(4-羥基苯基磺醯基)苯氧基等)、雜環氧基(4-吡啶氧基、2-六氫哌喃氧基等)、羰氧基(乙醯氧基、三氟乙醯氧基、三甲基乙醯氧基等的烷基羰氧基、苯甲醯氧基、五氟苯甲醯氧基等之芳氧基等)、胺基甲酸酯基(N,N-二甲基胺基甲酸酯等的烷基胺基甲酸酯基、N-苯基胺基甲酸酯、N-(p-氰基苯基)胺基甲酸酯等之芳基胺基甲酸酯基)、磺醯氧基(甲烷磺醯氧基、三氟甲烷磺醯氧基、十二烷磺醯氧基等的烷基磺醯氧基、苯磺醯氧基、p-甲苯磺醯氧基等之芳基磺醯氧基)、胺基(二甲基胺基、環己基胺基、十二基胺基等的烷基胺基、苯胺基、p-第三辛基苯胺基等之芳基胺基)、磺醯基胺基(甲烷磺醯基胺基、七氟丙烷磺醯基胺基、十六基磺醯基胺基等的烷基磺醯基胺基、p-甲苯磺醯基胺基、五氟苯磺醯基胺基的芳基磺醯基胺基)、胺磺醯基胺基(N,N-二甲基胺磺醯基胺基等的烷基胺磺醯基胺基、N-苯基胺磺醯基胺基等之芳基胺磺醯基胺基)、醯基胺基(乙醯基胺基、肉豆蔻醯基胺基等的烷基羰基胺基、苯甲醯基胺基等芳基羰基胺基)、脲基(N,N-二甲基胺基脲基等的烷基脲基、N-苯基脲基、N-(p-氰基苯基)脲基等之芳基脲基)、磺醯基(甲烷磺醯基、三氟甲烷磺醯基等的烷基磺醯基、p-甲苯磺醯基等之芳基磺醯基)、胺磺醯基(二甲基胺磺醯基、4-(2,4-二第三戊基苯氧基)丁基胺基磺醯基等的烷基胺磺醯基、苯基胺磺醯基等之芳基胺磺醯基)、烷硫基(甲硫基、t-辛硫基等)、芳硫基(苯硫基等)、雜環硫基(1-苯基四唑-5-硫基、5-甲硫基-1,3,4-㗁二唑-2-硫基等)等。These alkyl groups, cycloalkyl groups, and aryl groups may have a substituent. Examples of such substituents include linear or branched alkyl groups (methyl, ethyl, i-propyl, t-butyl, dodecyl, 1-hexylnonyl, etc.), cycloalkyl groups (cyclopropyl base, cyclohexyl, bicyclo[2.2.1]heptyl, adamantyl, etc.), alkenyl (2-propene, oleyl, etc.), aryl (phenyl, o-tolyl, o-anisyl, 1- Naphthyl, 9-anthryl, etc.), heterocyclic group (2-tetrahydrofuryl, 2-thienyl, 4-imidazolyl, 2-pyridyl, etc.), halogen atom (fluorine, chlorine, bromine, etc.), cyano, Nitro, alkylcarbonyl (acetyl, trimethylacetyl, etc.), arylcarbonyl (benzoyl, pentafluorobenzoyl, 3,5-di-tert-butyl-4-hydroxybenzene Formyl, etc.), oxycarbonyl (alkoxycarbonyl such as methoxycarbonyl, cyclohexyloxycarbonyl, dodecyloxycarbonyl, phenoxycarbonyl, 2,4-di-tert-pentylphenoxy Carbonyl, aryloxycarbonyl such as 1-naphthyloxycarbonyl), heterooxycarbonyl (2-pyridyloxycarbonyl, 1-phenylpyrazolyl-5-oxycarbonyl, etc.), carbamoyl ( Alkylaminoformyl such as dimethylaminoformyl, 4-(2,4-di-tert-pentylphenoxy)butylaminocarbonyl, phenylaminoformyl, 1-naphthylamine Arylamino formyl, such as formyl), alkoxy (methoxy, 2-ethoxyethoxy, etc.), aryloxy (phenoxy, 2,4-di-tert-pentylbenzene Oxy, 4-(4-hydroxyphenylsulfonyl)phenoxy, etc.), Heteroepoxy (4-pyridyloxy, 2-hexahydropyranyloxy, etc.), Carbonyloxy (acetyloxy Alkylcarbonyloxy groups such as trifluoroacetyloxy and trimethylacetyloxy groups, aryloxy groups such as benzoyloxy groups and pentafluorobenzoyloxy groups, etc.), carbamates Alkyl carbamate groups such as N,N-dimethyl carbamate, N-phenyl carbamate, N-(p-cyanophenyl) carbamate aryl carbamate group), sulfonyloxy (methanesulfonyloxy, trifluoromethanesulfonyloxy, dodecylsulfonyloxy and other alkylsulfonyloxy, benzenesulfonyloxy) Oxygen group, arylsulfonyloxy group such as p-toluenesulfonyloxy group), amino group (alkylamino group such as dimethylamino group, cyclohexylamine group, dodecylamine group, aniline group, p -Arylamino group such as tertiary octylanilino group), sulfonylamino group (alkylsulfonylamino group such as methanesulfonylamino group, heptafluoropropanesulfonylamino group, hexadecylsulfonylamino group, etc. Amine, p-toluenesulfonylamine, arylsulfonylamine of pentafluorobenzenesulfonylamine), sulfamoylamine (N,N-dimethylsulfamoylamine Alkylaminosulfonylamino groups such as N-phenylaminosulfonylamino groups, arylaminosulfonylamino groups such as N-phenylaminosulfonylamino groups), acylamino groups (acetylamino groups, myristylamino groups, etc.) Alkylcarbonylamine groups such as benzoylamine groups, arylcarbonylamino groups such as benzoylamino groups), ureido groups (alkylureido groups such as N,N-dimethylaminoureido groups, N-phenylureido groups, N-(p-cyanophenyl) ureido (aryl ureido, etc.), sulfonyl (methanesulfonyl, trifluoromethanesulfonyl, etc., alkylsulfonyl, p-toluenesulfonyl, etc. arylsulfonyl), sulfamoyl (dimethylsulfamoyl, 4-(2,4-di-tert-pentylphenoxy) butylaminosulfonyl, etc. Acyl group, arylsulfamoyl group such as phenylsulfamoyl group), alkylthio group (methylthio group, t-octylthio group, etc.), arylthio group (phenylthio group, etc.), heterocyclic thio group ( 1-phenyltetrazol-5-thio, 5-methylthio-1,3,4-oxadiazol-2-thio, etc.), etc.

Figure 02_image013
Figure 02_image013

式中,R 9表示氫原子、烷基、環烷基、芳基、烷氧基、芳氧基、硫醚基或胺基,X 2及X 3各自表示-NR 10-、-O-、-S-或-CR 11(R 12)-(R 10、R 11及R 12各自表示氫原子、烷基、環烷基、芳基、烷氧基、芳氧基或胺基),B表示氧原子或硫原子。又,R 9與X 2、R 9與X 3或X 2與X 3可形成環。 In the formula, R 9 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an alkoxy group, an aryloxy group, a thioether group or an amine group, and X 2 and X 3 represent -NR 10 -, -O-, -S- or -CR 11 (R 12 )-(R 10 , R 11 and R 12 each represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an alkoxy group, an aryloxy group or an amino group), and B represents Oxygen or sulfur atom. Also, R 9 and X 2 , R 9 and X 3 , or X 2 and X 3 may form a ring.

R 9~R 12所示的烷基、環烷基、芳基、烷氧基、芳氧基及胺基係與上述R 1~R 4中的能取代之基同義。作為R 9所示的硫醚基,可舉出烷硫基(甲硫基、t-辛硫基等)、芳硫基(苯硫基等)、雜環硫基(1-苯基四唑-5-硫基、5-甲基-1,3,4-㗁二唑-2-硫基等)等。 The alkyl, cycloalkyl, aryl, alkoxy, aryloxy and amino groups represented by R 9 to R 12 are synonymous with the substitutable groups in R 1 to R 4 above. Examples of the thioether group represented by R9 include alkylthio (methylthio, t-octylthio, etc.), arylthio (phenylthio, etc.), heterocyclic thio (1-phenyltetrazolium, etc.) -5-thio, 5-methyl-1,3,4-oxadiazol-2-thio, etc.) etc.

作為R 9與X 2、R 9與X 3、或X 2與X 3可形成的環,可舉出5~7員的碳環、5~6員的雜環等。 Examples of the ring that may be formed by R 9 and X 2 , R 9 and X 3 , or X 2 and X 3 include carbocycles with 5 to 7 members, heterocycles with 5 to 6 members, and the like.

Figure 02_image015
Figure 02_image015

式中,R 13、R 14及R 15各自獨立地表示氫原子、烷基、環烷基、芳基、雜環基、烷氧基或胺基,X 4表示-NR 16-、-O-或-S-。R 16表示氫原子、烷基、環烷基、芳基、烷氧基或胺基。惟,X 4為氧時,R 13與R 14形成芳香環,且R 15不是甲基。 In the formula, R 13 , R 14 and R 15 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, a heterocyclic group, an alkoxy group or an amine group, and X 4 represents -NR 16 -, -O- or -S-. R 16 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an alkoxy group or an amino group. However, when X 4 is oxygen, R 13 and R 14 form an aromatic ring, and R 15 is not a methyl group.

R 13~R 16所示的烷基、環烷基及芳基係與上述R 1~R 4同義。X 4為氧時,作為R 13與R 14所形成的芳香環,可舉出苯、萘、吡啶、呋喃、吲哚、噻唑環等。 The alkyl group, cycloalkyl group and aryl group represented by R 13 to R 16 are the same as the above R 1 to R 4 . When X4 is oxygen, examples of the aromatic ring formed by R13 and R14 include benzene, naphthalene, pyridine, furan, indole, and thiazole ring.

以下關於通式(L1)~(L3)所示的化合物,舉出具體例來詳細地說明,但本發明完全不受以下的具體例所限定。The compounds represented by the general formulas (L1) to (L3) will be described in detail below by giving specific examples, but the present invention is not limited at all by the following specific examples.

Figure 02_image017
Figure 02_image017

Figure 02_image019
Figure 02_image019

Figure 02_image021
Figure 02_image021

Figure 02_image023
Figure 02_image023

Figure 02_image025
Figure 02_image025

Figure 02_image027
Figure 02_image027

Figure 02_image029
Figure 02_image029

Figure 02_image031
Figure 02_image031

Figure 02_image033
Figure 02_image033

該等化合物可依據螯化學(5)錯合物化學實驗法[I](南江堂編)等中記載之方法進行合成。以下,顯示代表的合成例。These compounds can be synthesized according to the methods described in Chelate Chemistry (5) Experimental Method of Complex Chemistry [I] (Edited by Nan Jiangtang) and the like. Hereinafter, typical synthesis examples are shown.

(L3-14之合成) 將乙酸鎳17.8g溶解於水100ml中,滴下在乙腈45ml中溶解有水楊酸十二酯15.0g之溶液。於冰冷下攪拌5小時,過濾取得所析出的固體。藉由NMR光譜、IR光譜決定結構。 (Synthesis of L3-14) 17.8 g of nickel acetate was dissolved in 100 ml of water, and a solution in which 15.0 g of lauryl salicylate was dissolved in 45 ml of acetonitrile was dropped. After stirring for 5 hours under ice cooling, the precipitated solid was obtained by filtration. The structure was determined by NMR spectrum, IR spectrum.

<三苯基甲烷衍生物> 作為三苯基甲烷衍生物,可較宜使用下述通式(C)所示的化合物。 <Triphenylmethane Derivatives> As the triphenylmethane derivative, a compound represented by the following general formula (C) can be preferably used.

Figure 02_image035
Figure 02_image035

(式中,X表示胺基、醯基胺基、烷氧基羰基胺基、芳氧基羰基胺基、磺醯基胺基、羥基、巰基、胺甲醯基、芳基胺基羰基或羧基,此等可具有取代基。 R 11~R 15、R 21~R 25、R 31~R 35各自獨立地表示氫原子或取代基。R 11與R 21、R 15與R 35、或R 25與R 31可藉由單鍵或2價連結基而鍵結)。 (wherein, X represents an amino group, an acylamino group, an alkoxycarbonylamino group, an aryloxycarbonylamine group, a sulfonylamine group, a hydroxyl group, a mercapto group, a carboxyl group, an arylaminocarbonyl group or a carboxyl group , These may have substituents. R 11 ~ R 15 , R 21 ~ R 25 , R 31 ~ R 35 each independently represent a hydrogen atom or a substituent. R 11 and R 21 , R 15 and R 35 , or R 25 and R31 may be bonded via a single bond or a divalent linking group).

X較佳為胺基或羥基,更佳為羥基。X is preferably an amino group or a hydroxyl group, more preferably a hydroxyl group.

R 11~R 15、R 21~R 25、R 31~R 35各自獨立地表示氫原子或取代基,作為取代基,可採用以下的取代基T。 R 11 to R 15 , R 21 to R 25 , and R 31 to R 35 each independently represent a hydrogen atom or a substituent, and the following substituent T can be used as the substituent.

作為取代基T,例如可舉出烷基(較佳為碳數1~20,更佳為碳數1~12,尤佳為碳數1~8,例如可舉出甲基、乙基、i-丙基、t-丁基、n-辛基、n-癸基、n-十六基、環丙基、環戊基、環己基等)、烯基(較佳為碳數2~20,更佳為碳數2~12,尤佳為碳數2~8,例如可舉出乙烯基、烯丙基、2-丁烯基、3-戊烯基等)、炔基(較佳為碳數2~20,更佳為碳數2~12,尤佳為碳數2~8,例如可舉出炔丙基、3-戊炔基等)、芳基(較佳為碳數6~30,更佳為碳數6~20,尤佳為碳數6~12,例如可舉出苯基、p-甲基苯基、萘基等)、取代或未取代的胺基(較佳為碳數0~20,更佳為碳數0~10,尤佳為碳數0~6,例如可舉出胺基、甲基胺基、二甲基胺基、二乙基胺基、二苄基胺基等)、烷氧基(較佳為碳數1~20,更佳為碳數1~12,尤佳為碳數1~8,例如可舉出甲氧基、乙氧基、丁氧基等)、芳氧基(較佳為碳數6~20,更佳為碳數6~16,尤佳為碳數6~12,例如可舉出苯氧基、2-萘氧基等)、醯基(較佳為碳數1~20,更佳為碳數1~16,尤佳為碳數1~12,例如可舉出乙醯基、苯甲醯基、甲醯基、三甲基乙醯基等)、烷氧基羰基(較佳為碳數2~20,更佳為碳數2~16,尤佳為碳數2~12,例如可舉出甲氧基羰基、乙氧基羰基等)、芳氧基羰基(較佳為碳數7~20,更佳為碳數7~16,尤佳為碳數7~10,例如可舉出苯氧基羰基等)、醯氧基(較佳為碳數2~20,更佳為碳數2~16,尤佳為碳數2~10,例如可舉出乙醯氧基、苯甲醯氧基等)、醯基胺基(較佳為碳數2~20,更佳為碳數2~16,尤佳為碳數2~10,例如可舉出乙醯基胺基、苯甲醯基胺基等)、烷氧基羰基胺基(較佳為碳數2~20,更佳為碳數2~16,尤佳為碳數2~12,例如可舉出甲氧基羰基胺基等)。As the substituent T, for example, an alkyl group (preferably having 1 to 20 carbon atoms, more preferably 1 to 12 carbon atoms, especially preferably 1 to 8 carbon atoms, such as methyl, ethyl, i -Propyl, t-butyl, n-octyl, n-decyl, n-hexadecyl, cyclopropyl, cyclopentyl, cyclohexyl, etc.), alkenyl (preferably carbon number 2~20, More preferably, it has 2 to 12 carbons, especially preferably 2 to 8 carbons, such as vinyl, allyl, 2-butenyl, 3-pentenyl, etc.), alkynyl (preferably carbon The number is 2-20, more preferably 2-12 carbons, especially preferably 2-8 carbons, for example, propargyl, 3-pentynyl, etc.), aryl (preferably 6-30 carbons) , more preferably carbon number 6~20, especially preferably carbon number 6~12, such as phenyl, p-methylphenyl, naphthyl, etc.), substituted or unsubstituted amino groups (preferably carbon The number is 0-20, more preferably the carbon number is 0-10, especially the carbon number is 0-6, for example, amine group, methylamine group, dimethylamine group, diethylamine group, dibenzyl group amino group, etc.), alkoxy group (preferably having 1 to 20 carbons, more preferably 1 to 12 carbons, especially preferably 1 to 8 carbons, for example, methoxy, ethoxy, butoxy group, etc.), aryloxy group (preferably 6-20 carbons, more preferably 6-16 carbons, especially preferably 6-12 carbons, examples include phenoxy, 2-naphthyloxy, etc.) , acyl group (preferably having 1 to 20 carbons, more preferably 1 to 16 carbons, especially preferably 1 to 12 carbons, for example, acetyl, benzoyl, formyl, trimethyl acetylacetyl, etc.), alkoxycarbonyl (preferably 2 to 20 carbons, more preferably 2 to 16 carbons, especially preferably 2 to 12 carbons, for example, methoxycarbonyl, ethoxy ylcarbonyl, etc.), aryloxycarbonyl (preferably 7 to 20 carbons, more preferably 7 to 16 carbons, especially preferably 7 to 10 carbons, examples include phenoxycarbonyl, etc.), acyloxy Group (preferably having 2 to 20 carbons, more preferably 2 to 16 carbons, especially preferably 2 to 10 carbons, for example, acetyloxy, benzoyloxy, etc.), acylamino (preferably 2 to 20 carbons, more preferably 2 to 16 carbons, especially preferably 2 to 10 carbons, examples include acetylamino, benzoylamino, etc.), alkoxy Carbonylamino group (preferably having 2 to 20 carbons, more preferably 2 to 16 carbons, especially preferably 2 to 12 carbons, examples include methoxycarbonylamino, etc.).

再者,可舉出芳氧基羰基胺基(較佳為碳數7~20,更佳為碳數7~16,尤佳為碳數7~12,例如可舉出苯氧基羰基胺基等)、磺醯基胺基(較佳為碳數1~20,更佳為碳數1~16,尤佳為碳數1~12,例如可舉出甲烷磺醯基胺基、苯磺醯基胺基等)、胺磺醯基(較佳為碳數0~20,更佳為碳數0~16,尤佳為碳數0~12,例如可舉出胺磺醯基、甲基胺磺醯基、二甲基胺磺醯基、苯基胺磺醯基等)、胺甲醯基(較佳為碳數1~20,更佳為碳數1~16,尤佳為碳數1~12,例如可舉出胺甲醯基、甲基胺甲醯基、二乙基胺甲醯基、苯基胺甲醯基等)、烷硫基(較佳為碳數1~20,更佳為碳數1~16,尤佳為碳數1~12,例如可舉出甲硫基、乙硫基等)、芳硫基(較佳為碳數6~20,更佳為碳數6~16,尤佳為碳數6~12,例如可舉出苯硫基等)、磺醯基(較佳為碳數1~20,更佳為碳數1~16,尤佳為碳數1~12,例如可舉出甲磺醯基、甲苯磺醯基等)、亞磺醯基(較佳為碳數1~20,更佳為碳數1~16,尤佳為碳數1~12,例如可舉出甲烷亞磺醯基、苯亞磺醯基等)、脲基(較佳為碳數1~20,更佳為碳數1~16,尤佳為碳數1~12,例如可舉出脲基、甲基脲基、苯基脲基等)、磷酸醯胺基(較佳為碳數1~20,更佳為碳數1~16,尤佳為碳數1~12,例如可舉出二乙基磷酸醯胺、苯基磷酸醯胺等)、羥基、巰基、鹵素原子(例如,氟原子、氯原子、溴原子、碘原子)、氰基、磺酸基、羧基、硝基、羥胺酸基、亞磺酸基、肼基、亞胺基、雜環基(較佳為碳數1~30,更佳為1~12,作為雜原子,例如可舉出氮原子、氧原子、硫原子,具體而言,例如咪唑基、吡啶基、喹啉基、呋喃基、哌啶基、嗎啉基、苯并㗁唑基、苯并咪唑基、苯并噻唑基等)、矽烷基(較佳為碳數3~40,更佳為碳數3~30,尤佳為碳數3~24,例如可舉出三甲基矽烷基、三苯基矽烷基等)等。其中,更佳為烷基、芳基、取代或無取代的胺基、烷氧基、芳氧基,尤佳為烷基、芳基、烷氧基。 此等取代基可進一步被取代基T所取代。又,取代基為二個以上時,可相同或相異。另外,於可能的情況中可互相連結而形成環。 Furthermore, an aryloxycarbonylamine group (preferably 7 to 20 carbons, more preferably 7 to 16 carbons, especially preferably 7 to 12 carbons, for example, phenoxycarbonylamine etc.), sulfonylamino group (preferably having 1 to 20 carbons, more preferably 1 to 16 carbons, especially preferably 1 to 12 carbons, examples include methanesulfonylamino, benzenesulfonyl Amino group, etc.), sulfamoyl group (preferably 0-20 carbons, more preferably 0-16 carbons, especially preferably 0-12 carbons, examples include sulfamoyl, methylamine Sulfonyl, dimethylsulfamoyl, phenylsulfamoyl, etc.), carbamoyl (preferably having 1 to 20 carbons, more preferably 1 to 16 carbons, especially preferably 1 to 2 carbons ~12, for example, carbamoyl, methylcarbamoyl, diethylcarbamoyl, phenylcarbamoyl, etc.), alkylthio (preferably 1 to 20 carbons, more Preferably it has 1 to 16 carbons, especially preferably 1 to 12 carbons, such as methylthio, ethylthio, etc.), arylthio (preferably 6 to 20 carbons, more preferably 6 carbons) ~16, preferably 6~12 carbons, such as phenylthio, etc.), sulfonyl (preferably 1~20 carbons, more preferably 1~16 carbons, especially 1 carbons ~12, for example, methylsulfonyl, toluenesulfonyl, etc.), sulfinyl (preferably 1~20 carbons, more preferably 1~16 carbons, especially preferably 1~12 carbons , such as methanesulfinyl, phenylsulfinyl, etc.), ureido (preferably 1 to 20 carbons, more preferably 1 to 16 carbons, especially preferably 1 to 12 carbons, for example Examples include ureido, methylureido, phenylureido, etc.), amide phosphate (preferably 1 to 20 carbons, more preferably 1 to 16 carbons, especially preferably 1 to 12 carbons, For example, diethylphosphonamide, phenylphosphonamide, etc.), hydroxyl group, mercapto group, halogen atom (for example, fluorine atom, chlorine atom, bromine atom, iodine atom), cyano group, sulfonic acid group, carboxyl group, A nitro group, a hydroxylamine group, a sulfinic acid group, a hydrazine group, an imino group, a heterocyclic group (preferably having 1 to 30 carbon atoms, more preferably 1 to 12 carbon atoms, examples of heteroatoms include nitrogen atoms, Oxygen atom, sulfur atom, specifically, such as imidazolyl, pyridyl, quinolinyl, furyl, piperidyl, morpholinyl, benzozozolyl, benzimidazolyl, benzothiazolyl, etc.), Silyl group (preferably 3-40 carbons, more preferably 3-30 carbons, especially preferably 3-24 carbons, examples include trimethylsilyl, triphenylsilyl, etc.) and the like. Among them, an alkyl group, an aryl group, a substituted or unsubstituted amino group, an alkoxy group, and an aryloxy group are more preferable, and an alkyl group, an aryl group, and an alkoxy group are particularly preferable. These substituents may be further substituted by substituent T. Moreover, when there are two or more substituents, they may be the same or different. In addition, they may be connected to each other to form a ring where possible.

通式(C)所示的化合物可商業上取得,也可藉由眾所周知的方法進行合成。The compound represented by general formula (C) can be obtained commercially, and can also be synthesized by a well-known method.

以下關於通式(C)所示的化合物,舉出具體例來詳細地說明,惟本發明完全不受以下的具體例所限定。The compound represented by the general formula (C) will be described in detail below with specific examples, but the present invention is not limited at all by the following specific examples.

Figure 02_image037
Figure 02_image037

Figure 02_image039
Figure 02_image039

<巴比妥酸系化合物> 作為巴比妥酸或其衍生物,可較宜使用下述通式(1)所示的化合物。 <Barbituric acid compounds> As barbituric acid or a derivative thereof, a compound represented by the following general formula (1) can be preferably used.

Figure 02_image041
(式中,R 1、R 3及R 5各自獨立地表示氫原子、碳數1~20的烷基、碳數3~20的環烷基、碳數2~20的烯基或碳數6~20的芳香族基)。
Figure 02_image041
(In the formula, R 1 , R 3 and R 5 each independently represent a hydrogen atom, an alkyl group with 1 to 20 carbons, a cycloalkyl group with 3 to 20 carbons, an alkenyl group with 2 to 20 carbons, or an alkenyl group with 6 carbons ~20 aromatic groups).

碳數1~20的烷基較佳是碳數為1~10的烷基,更佳是碳數為1~5的烷基,尤佳是碳數1~3的烷基,特佳是甲基或乙基。 碳數3~20的環烷基較佳是碳數為3~10的環烷基,更佳是碳數4~8的環烷基。作為環烷基之具體例,例如可舉出環丙基、環戊基、環己基等,特佳為環己基。 The alkyl group with 1 to 20 carbons is preferably an alkyl group with 1 to 10 carbons, more preferably an alkyl group with 1 to 5 carbons, especially preferably an alkyl group with 1 to 3 carbons, especially methyl base or ethyl. The cycloalkyl group having 3 to 20 carbons is preferably a cycloalkyl group having 3 to 10 carbons, more preferably a cycloalkyl group having 4 to 8 carbons. As a specific example of a cycloalkyl group, a cyclopropyl group, a cyclopentyl group, a cyclohexyl group etc. are mentioned, for example, Cyclohexyl group is especially preferable.

碳數2~20的烯基較佳是碳數為2~10的烯基,更佳是碳數2~5的烯基。 碳數6~20的芳香族基可為芳香族烴基,也可為芳香族雜環基,但較佳為芳香族烴基。作為該芳香族烴基,較佳為苯基、萘基,更佳為苯基。 The alkenyl having 2 to 20 carbons is preferably an alkenyl having 2 to 10 carbons, more preferably an alkenyl having 2 to 5 carbons. The aromatic group having 6 to 20 carbon atoms may be an aromatic hydrocarbon group or an aromatic heterocyclic group, but is preferably an aromatic hydrocarbon group. The aromatic hydrocarbon group is preferably a phenyl group or a naphthyl group, more preferably a phenyl group.

R 1、R 3及R 5可具有取代基。作為取代基,並無特別的限制,例如可舉出烷基(較佳為碳數1~10,例如甲基、乙基、異丙基、t-丁基、戊基、庚基、1-乙基戊基、苄基、2-乙氧基乙基、1-羧基甲基等)、烯基(較佳為碳數2~20,例如乙烯基、烯丙基、油基等)、炔基(較佳為碳數2~20,例如乙炔基、丁二炔基、苯基乙炔基等)、環烷基(較佳為碳數3~20,例如環丙基、環戊基、環己基、4-甲基環己基等)、芳基(較佳為碳數6~26,例如苯基、1-萘基、4-甲氧基苯基、2-氯苯基、3-甲基苯基等)、雜環基(較佳為碳數0~20的雜環基,構成環的雜原子較佳為氧原子、氮原子、硫原子,5或6員環且可以苯環或雜環進行縮環,該環可為飽和環、不飽和環、芳香環,例如2-吡啶基、4-吡啶基、2-咪唑基、2-苯并咪唑基、2-噻唑基、2-㗁唑基等)、烷氧基(較佳為碳數1~20,例如甲氧基、乙氧基、異丙氧基、苄氧基等)、芳氧基(較佳為碳數6~26,例如苯氧基、1-萘氧基、3-甲基苯氧基、4-甲氧基苯氧基等)、烷硫基(較佳為碳數1~20,例如甲硫基、乙硫基、異丙硫基、苄硫基等)、芳硫基(較佳為碳數6~26,例如苯硫基、1-萘硫基、3-甲基苯硫基、4-甲氧基苯硫基等)、醯基(包含烷基羰基、烯基羰基、芳基羰基、雜環羰基,碳數較佳為20以下,例如乙醯基、三甲基乙醯基、丙烯醯基、甲基丙烯醯基、苯甲醯基、菸鹼醯基等)、芳醯基烷基、烷氧基羰基(較佳為碳數2~20,例如乙氧基羰基、2-乙基己氧基羰基等)、芳氧基羰基(較佳為碳數7~20,例如苯氧基羰基、萘氧基羰基等)、胺基(包含胺基、烷基胺基、芳基胺基、雜環胺基,較佳為碳數0~20,例如胺基、N,N-二甲基胺基、N,N-二乙基胺基、N-乙基胺基、苯胺基、1-吡咯啶基、哌啶基、嗎啉基等)、磺醯胺基(較佳為碳數0~20,例如N,N-二甲基磺醯胺基、N-苯基磺醯胺基等)、胺磺醯基(較佳為碳數0~20,例如N,N-二甲基胺磺醯基、N-苯基胺磺醯基等)、醯氧基(較佳為碳數1~20,例如乙醯氧基、苯甲醯氧基等)、胺甲醯基(較佳為碳數1~20,例如N,N-二甲基胺甲醯基、N-苯基胺甲醯基等)、醯基胺基(較佳為碳數1~20,例如乙醯基胺基、丙烯醯基胺基、苯甲醯基胺基、菸鹼醯胺基等)、氰基、羥基、巰基或鹵素原子(例如氟原子、氯原子、溴原子、碘原子等)。R 1、R 3及R 5可具有的上述取代基可進一步具有上述取代基。 於R 1、R 3及R 5之各基可具有的上述取代基之中,較佳為烷基、芳基、烷氧基、醯基。 R 1 , R 3 and R 5 may have substituents. As a substituent, there is no special limitation, for example, an alkyl group (preferably having 1 to 10 carbon atoms, such as methyl, ethyl, isopropyl, t-butyl, pentyl, heptyl, 1- Ethylpentyl, benzyl, 2-ethoxyethyl, 1-carboxymethyl, etc.), alkenyl (preferably carbon number 2~20, such as vinyl, allyl, oleyl, etc.), alkyne (preferably 2-20 carbons, such as ethynyl, butadiynyl, phenylethynyl, etc.), cycloalkyl (preferably 3-20 carbons, such as cyclopropyl, cyclopentyl, cyclo Hexyl, 4-methylcyclohexyl, etc.), aryl (preferably carbon number 6~26, such as phenyl, 1-naphthyl, 4-methoxyphenyl, 2-chlorophenyl, 3-methyl phenyl, etc.), heterocyclic group (preferably a heterocyclic group with 0 to 20 carbon atoms, the heteroatom constituting the ring is preferably an oxygen atom, a nitrogen atom, a sulfur atom, a 5- or 6-membered ring and can be a benzene ring or a heterocyclic Ring condensation, the ring can be saturated ring, unsaturated ring, aromatic ring, such as 2-pyridyl, 4-pyridyl, 2-imidazolyl, 2-benzimidazolyl, 2-thiazolyl, 2-㗁Azolyl, etc.), alkoxy (preferably 1 to 20 carbons, such as methoxy, ethoxy, isopropoxy, benzyloxy, etc.), aryloxy (preferably 6 to 26 carbons , such as phenoxy, 1-naphthyloxy, 3-methylphenoxy, 4-methoxyphenoxy, etc.), alkylthio (preferably carbon number 1~20, such as methylthio, ethyl Thio, isopropylthio, benzylthio, etc.), arylthio (preferably carbon number 6~26, such as phenylthio, 1-naphthylthio, 3-methylphenylthio, 4-methoxy phenylthio, etc.), acyl (including alkylcarbonyl, alkenylcarbonyl, arylcarbonyl, heterocyclic carbonyl, carbon number is preferably less than 20, such as acetyl, trimethylacetyl, acryl , methacryl, benzoyl, nicotinyl, etc.), arylalkyl, alkoxycarbonyl (preferably carbon number 2~20, such as ethoxycarbonyl, 2-ethylhexyl Oxycarbonyl, etc.), aryloxycarbonyl (preferably 7 to 20 carbons, such as phenoxycarbonyl, naphthyloxycarbonyl, etc.), amino (including amino, alkylamino, arylamino, Heterocyclic amino group, preferably with carbon number 0~20, such as amino group, N,N-dimethylamino group, N,N-diethylamino group, N-ethylamino group, aniline group, 1- pyrrolidinyl, piperidinyl, morpholinyl, etc.), sulfonamide (preferably carbon number 0~20, such as N,N-dimethylsulfonamide, N-phenylsulfonamide, etc. ), sulfamoyl group (preferably carbon number 0~20, such as N,N-dimethylsulfamoyl group, N-phenylsulfamoyl group, etc.), acyloxy group (preferably carbon number 1 ~20, such as acetyloxy, benzoyloxy, etc.), aminoformyl (preferably carbon number 1~20, such as N,N-dimethylaminoformyl, N-phenylaminoformyl Acyl amino group, etc.), acyl amino group (preferably carbon number 1~20, such as acetyl amino group, acryl amino group, benzoyl amino group, nicotinyl amino group, etc.), cyano group, A hydroxyl group, a mercapto group or a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc.). The aforementioned substituents that R 1 , R 3 and R 5 may have may further have the aforementioned substituents. Among the above-mentioned substituents that each group of R 1 , R 3 and R 5 may have, an alkyl group, an aryl group, an alkoxy group, and an acyl group are preferable.

<漢森溶解度參數(HSP值)> 本發明之非有機酸係漢森溶解度參數(HSP值)的δP(極性力)較佳為5~9MPa 0.5之範圍內。藉由δP為5MPa 0.5以上,非有機酸與多碘充分地進行電荷排斥。藉由δP為9MPa 0.5以下,具有與樹脂的親和性,抑制滲出。又,藉由適度的排斥力,可保持偏光子層中的多碘之配向性。 <Hansen Solubility Parameter (HSP Value)> The δP (polar force) of the Hansen solubility parameter (HSP value) of the non-organic acid system of the present invention is preferably in the range of 5-9 MPa 0.5 . When δP is 5 MPa 0.5 or more, non-organic acid and polyiodine sufficiently perform charge repulsion. When δP is 9MPa 0.5 or less, it has affinity with resin and suppresses bleeding. Also, the alignment of polyiodine in the polarizer layer can be maintained by moderate repulsive force.

再者,非有機酸之HSP值的δD(分散力)與δP(極性力)之比之值較佳為滿足下述式。 2<δD(分散力)/δP(極性力)<4 藉由上述範圍內,非有機酸具有適度的極性,且進行分散,因此可更有效地抑制多碘的移動。 Furthermore, the value of the ratio of δD (dispersion force) to δP (polar force) of the HSP value of the non-organic acid preferably satisfies the following formula. 2<δD (dispersion force)/δP (polar force)<4 Within the above range, the non-organic acid has moderate polarity and is dispersed, so the movement of polyiodine can be more effectively suppressed.

再者,以下說明SP值與HSP值。 作為評估物質的物性尤其溶劑的溶解行為之指標,以往使用希爾德布蘭德(Hildebrand)的SP值(溶解度參數;δ)。該「SP值」為以物質的凝聚能量密度之平方根所表示的物質固有之物性值。 又,該SP值係被漢森分割成分散力項(δD)、極性項(δP)、氫鍵項(δH)之3成分,作為考慮物質的極性之參數,使用所提案的漢森溶解度參數(HSP值),如下述式表示。 SP值=(δD 2+δP 2+δH 2) 0.5 In addition, the SP value and the HSP value will be described below. Hildebrand's SP value (solubility parameter; δ) has conventionally been used as an index for evaluating the physical properties of a substance, especially the dissolution behavior of a solvent. The "SP value" is a physical property value inherent to a substance expressed by the square root of the condensation energy density of the substance. In addition, this SP value is divided into three components of dispersive force term (δD), polar term (δP), and hydrogen bond term (δH) by Hansen, and the proposed Hansen solubility parameter is used as a parameter considering the polarity of the substance (HSP value) is represented by the following formula. SP value=(δD 2 +δP 2 +δH 2 ) 0.5

漢森溶解度參數(HSP值)係基於「分子間的相互作用類似的2個物質容易互相溶解」之考量,由以下3個參數所構成,此等3個參數可視為三次元空間(亦稱為「漢森空間」)中的座標。2個物質的該座標間之距離愈近,互相的親和性愈高,被認為容易溶解。 δD:分子間之分散力所致的能量 δP:分子間之偶極交互作用所致的能量 δH:分子間之氫鍵所致的能量 The Hansen solubility parameter (HSP value) is based on the consideration that "two substances with similar intermolecular interactions are easily soluble in each other", and consists of the following three parameters. These three parameters can be regarded as three-dimensional space (also known as "Hansen space") coordinates. The closer the distance between the coordinates of the two substances is, the higher the mutual affinity is, and they are considered to be easily soluble. δD: energy caused by the dispersion force between molecules δP: Energy due to dipole interactions between molecules δH: energy due to intermolecular hydrogen bonds

再者,算出漢森溶解度參數中的δD、δP及δH之方法係沒有特別的限制,可將化學結構輸入軟體而算出,也可實驗地算出,但較佳為將化學結構輸入軟體而算出。Furthermore, the method of calculating δD, δP, and δH in the Hansen solubility parameters is not particularly limited, and the calculation can be performed by inputting the chemical structure into the software, or can be calculated experimentally, but it is preferably calculated by inputting the chemical structure into the software.

HSP值可使用市售的軟體之HSPiP 5th Edition 5.0.10.1中的登錄值或推算值。此軟體可從https://www.hansen-solubility.com/等之網站取得。又,基於該軟體的HSP之推算方法,例如係根據C. M. Hansen等人的文獻「Hansen Solubility Parameters:A User’s Handbook, Second Edition」(CRC Press, 2007)。As the HSP value, registered values or estimated values in HSPiP 5th Edition 5.0.10.1 of commercially available software can be used. This software can be obtained from websites such as https://www.hansen-solbility.com/. Also, the calculation method of the HSP based on this software is, for example, based on the document "Hansen Solubility Parameters: A User's Handbook, Second Edition" by C. M. Hansen et al. (CRC Press, 2007).

本發明之碘移動抑制劑較佳為進一步含有硫酸離子,且相對於偏光板用樹脂薄膜的固體成分總質量,硫酸離子之含量為1~100質量ppm之範圍內。藉由在上述範圍內含有硫酸離子,於偏光板用樹脂薄膜中,非有機酸的極性安定,與多碘充分地進行電荷排斥。It is preferable that the iodine migration inhibitor of the present invention further contains sulfate ions, and the content of the sulfate ions is within the range of 1 to 100 mass ppm relative to the total solid mass of the resin film for polarizing plates. By containing sulfate ions within the above range, the polarity of the non-organic acid is stabilized in the resin film for polarizing plates, and sufficient charge repulsion with polyiodine is performed.

作為相對於偏光板用樹脂薄膜的固體成分總質量而言硫酸離子之含量的測定方法,使用毛細管電泳裝置,與包含硫酸離子的各離子之標準品進行比較,對照泳動時間(在HPLC所言的保持時間)而進行定量。As a method for measuring the content of sulfate ions relative to the total mass of the solid content of the resin film for polarizing plates, a capillary electrophoresis device is used to compare with the standards of each ion containing sulfate ions and compare the swimming time (in HPLC terms) retention time) for quantification.

[1.3 其他添加劑] 本發明之偏光板用樹脂薄膜視需要可進一步包含上述以外的其他成分。於其他成分之例中,包含抗氧化劑、橡膠粒子及後述的消光劑(微粒子)、可塑劑、紫外線吸收劑等。其中,抗氧化劑係從有助於該薄膜之隨著時間經過的保存性提升之觀點,橡膠粒子係從將韌性(柔靭性)賦予至該薄膜之觀點來看,較佳為含有。 [1.3 Other additives] The resin film for polarizing plates of this invention may further contain other components other than the above as needed. Examples of other components include antioxidants, rubber particles, matting agents (fine particles) to be described later, plasticizers, ultraviolet absorbers, and the like. Among them, the antioxidant is preferably contained from the viewpoint of contributing to the improvement of the storage stability of the film over time, and the rubber particles are preferably contained from the viewpoint of imparting toughness (flexibility) to the film.

<抗氧化劑> 作為抗氧化劑,可使用眾所周知者。特別地,可較宜使用內酯系、硫系、酚系、雙鍵系、受阻胺系、磷系的各化合物。 <Antioxidant> As the antioxidant, well-known ones can be used. In particular, lactone-based, sulfur-based, phenol-based, double bond-based, hindered amine-based, and phosphorus-based compounds can be preferably used.

作為上述內酯系化合物,例如可舉出由BASF日本股份有限公司所市售的「Irgafos XP40、Irgafos XP60(商品名)」等。As said lactone compound, "Irgafos XP40, Irgafos XP60 (trade name)" marketed by BASF Japan Co., Ltd. etc. are mentioned, for example.

作為上述硫系化合物,例如可舉出由住友化學股份有限公司所市售的「Sumilizer(註冊商標)TPL-R」及「Sumilizer(註冊商標)TP-D」。As said sulfur compound, "Sumilizer (registered trademark) TPL-R" and "Sumilizer (registered trademark) TP-D" marketed by Sumitomo Chemical Co., Ltd. are mentioned, for example.

作為上述酚系化合物,例如較佳為具有2,6-二烷基酚的結構者,例如可舉出由BASF日本股份有限公司所市售的「Irganox(註冊商標)1076」、「Irganox(註冊商標)1010」、由股份有限公司ADEKA所市售的「ADK STAB(註冊商標)AO-50」等。As the above-mentioned phenolic compound, for example, those having a structure of 2,6-dialkylphenol are preferable, for example, "Irganox (registered trademark) 1076" commercially available from BASF Japan Co., Ltd., "Irganox (registered trademark) 1076" and "Irganox (registered trademark) Trademark) 1010", "ADK STAB (registered trademark) AO-50" marketed by ADEKA Co., Ltd., etc.

上述雙鍵系化合物可舉出由住友化學股份有限公司所市售的「Sumilizer(註冊商標)GM」及「Sumilizer(註冊商標)GS」等。相對於上述熱塑性樹脂之總質量,該雙鍵系化合物之含量為0.05~20質量%,較佳為0.1~1質量%之範圍內。Examples of the above-mentioned double bond compound include “Sumilizer (registered trademark) GM” and “Sumilizer (registered trademark) GS” commercially available from Sumitomo Chemical Co., Ltd., and the like. Relative to the total mass of the thermoplastic resin, the content of the double bond compound is 0.05-20% by mass, preferably 0.1-1% by mass.

作為上述受阻胺系化合物,例如可舉出由BASF日本股份有限公司所市售的「Tinuvin(註冊商標)144」及「Tinuvin(註冊商標)770」、由股份有限公司ADEKA所市售的「ADK STAB(註冊商標)LA-52」。Examples of the hindered amine compound include "Tinuvin (registered trademark) 144" and "Tinuvin (registered trademark) 770" commercially available from BASF Japan Co., Ltd., "ADK STAB (registered trademark) LA-52".

作為上述磷系化合物,例如可舉出由住友化學股份有限公司所市售的「Sumilizer(註冊商標)GP」、由股份有限公司ADEKA所市售的「ADK STAB(註冊商標)PEP-24G」、「ADK STAB(註冊商標)PEP-36」及「ADK STAB(註冊商標)3010」、由BASF日本股份有限公司所市售的「IRGAFOS P-EPQ」、由堺化學工業股份有限公司所市售的「GSY-P101」。Examples of the above-mentioned phosphorus compounds include "Sumilizer (registered trademark) GP" marketed by Sumitomo Chemical Co., Ltd., "ADK STAB (registered trademark) PEP-24G" marketed by ADEKA Co., Ltd., "ADK STAB (registered trademark) PEP-36" and "ADK STAB (registered trademark) 3010", "IRGAFOS P-EPQ" commercially available from BASF Japan Co., Ltd., commercially available from Sakai Chemical Industry Co., Ltd. "GSY-P101".

再者,作為酸補捉劑,亦可含有如美國特許第4,137,201號說明書中記載之具有環氧基的化合物。Furthermore, as an acid scavenger, a compound having an epoxy group as described in US Pat. No. 4,137,201 may also be contained.

上述雙鍵系化合物以外的該等抗氧化劑等之含量,相對於熱塑性樹脂之總質量,較佳為0.0001~0.01質量%之範圍內,更佳為0.002~0.01質量%之範圍內。The content of the antioxidants other than the above-mentioned double bond compound is preferably in the range of 0.0001 to 0.01% by mass, more preferably in the range of 0.002 to 0.01% by mass, based on the total mass of the thermoplastic resin.

此等抗氧化劑可單獨一種使用,也可組合二種以上使用。例如,較佳為併用內酯系、磷系、酚系及雙鍵系化合物。These antioxidants may be used alone or in combination of two or more. For example, it is preferable to use a lactone type, a phosphorus type, a phenol type, and a double bond type compound together.

<橡膠粒子> 橡膠粒子係包含橡膠狀聚合物之粒子。橡膠狀聚合物係玻璃轉移溫度為20℃以下的軟質交聯聚合物。於如此的交聯聚合物之例中,包含丁二烯系交聯聚合物、(甲基)丙烯酸系交聯聚合物及有機矽氧烷系交聯聚合物。其中,於與(甲基)丙烯酸系樹脂的折射率差小,不易損害偏光板用樹脂薄膜的透明性之觀點中,較佳為(甲基)丙烯酸系交聯聚合物,更佳為丙烯酸系交聯聚合物(丙烯酸系橡膠狀聚合物)。 <Rubber Particles> The rubber particles are particles comprising a rubber-like polymer. The rubber-like polymer is a soft cross-linked polymer with a glass transition temperature of 20°C or lower. Examples of such cross-linked polymers include butadiene-based cross-linked polymers, (meth)acrylic-based cross-linked polymers, and organosiloxane-based cross-linked polymers. Among them, a (meth)acrylic cross-linked polymer is preferable, and an acrylic crosslinked polymer is more preferable from the standpoint that the difference in refractive index with the (meth)acrylic resin is small and the transparency of the resin film for polarizing plates is less likely to be impaired. Cross-linked polymer (acrylic rubber-like polymer).

亦即,橡膠粒子較佳為包含丙烯酸系橡膠狀聚合物(a)之粒子。That is, the rubber particles are preferably particles containing the acrylic rubber-like polymer (a).

關於丙烯酸系橡膠狀聚合物(a): 丙烯酸系橡膠狀聚合物(a)係包含源自丙烯酸酯的結構單元作為主成分的交聯聚合物。作為主成分包含者係指源自丙烯酸酯的結構單元之含量成為後述之範圍內。丙烯酸系橡膠狀聚合物(a)較佳為包含源自丙烯酸酯的結構單元、源自與其能共聚合的其他單體之結構單元與源自在1分子中具有2個以上自由基聚合性基(非共軛反應性雙鍵)的多官能性單體之結構單元的交聯聚合物。 Regarding the acrylic rubber-like polymer (a): The acrylic rubber-like polymer (a) is a cross-linked polymer containing an acrylate-derived structural unit as a main component. What is contained as a main component means that content of the structural unit derived from an acrylate falls within the range mentioned later. The acrylic rubber-like polymer (a) preferably contains a structural unit derived from an acrylate, a structural unit derived from another monomer copolymerizable therewith, and a polymer having two or more radically polymerizable groups in one molecule. (Non-conjugated reactive double bond) cross-linked polymer of structural units of polyfunctional monomers.

丙烯酸酯較佳為丙烯酸甲酯、丙烯酸乙酯、丙烯酸正丙酯、丙烯酸正丁酯、丙烯酸第二丁酯、丙烯酸異丁酯、丙烯酸苄酯、丙烯酸環己酯、丙烯酸2-乙基己酯、丙烯酸正辛酯等之烷基的碳數1~12之丙烯酸烷酯。丙烯酸酯可單獨一種使用,也可組合二種以上使用。Acrylate is preferably methyl acrylate, ethyl acrylate, n-propyl acrylate, n-butyl acrylate, second butyl acrylate, isobutyl acrylate, benzyl acrylate, cyclohexyl acrylate, 2-ethylhexyl acrylate , Alkyl acrylate with 1 to 12 carbon atoms in the alkyl group such as n-octyl acrylate. Acrylates may be used alone or in combination of two or more.

相對於構成丙烯酸系橡膠狀聚合物(a1)的全部結構單元,源自丙烯酸酯的結構單元之含量較佳為40~80質量%之範圍內,更佳為50~80質量%之範圍內。藉由丙烯酸酯之含量為上述範圍內,容易將充分的韌性賦予至該薄膜。The content of the structural unit derived from acrylate is preferably in the range of 40 to 80% by mass, more preferably in the range of 50 to 80% by mass, based on all the structural units constituting the acrylic rubber-like polymer (a1). When the content of the acrylate is within the above range, it is easy to impart sufficient toughness to the film.

能共聚合的其他單體係在與丙烯酸酯能共聚合的單體之中,為多官能性單體以外者。亦即,能共聚合的單體不具有二個以上自由基聚合性基。於能共聚合的單體之例中,包含甲基丙烯酸甲酯等之甲基丙烯酸酯;苯乙烯、甲基苯乙烯等之苯乙烯類;(甲基)丙烯腈類;(甲基)丙烯醯胺類;(甲基)丙烯酸。其中,能共聚合的其他單體較佳包含苯乙烯類。能共聚合的其他單體可單獨一種使用,也可組合二種以上使用。Other monomers that can be copolymerized are those other than polyfunctional monomers among the monomers that can be copolymerized with acrylate. That is, the copolymerizable monomer does not have two or more radically polymerizable groups. Examples of copolymerizable monomers include methacrylates such as methyl methacrylate; styrenes such as styrene and methylstyrene; (meth)acrylonitriles; (meth)acrylic Amides; (meth)acrylic acid. Among them, other copolymerizable monomers preferably include styrenes. Other copolymerizable monomers may be used alone or in combination of two or more.

相對於構成丙烯酸系橡膠狀聚合物(a)的全部結構單元,源自能共聚合的其他單體之結構單元之含量較佳為5~55質量%之範圍內,更佳為10~45質量%之範圍內。The content of the structural units derived from other copolymerizable monomers is preferably in the range of 5 to 55% by mass, more preferably 10 to 45% by mass, relative to all the structural units constituting the acrylic rubber-like polymer (a). % range.

於多官能性單體之例中,包含(甲基)丙烯酸烯丙酯、三聚氰酸三烯丙酯、異三聚氰酸三烯丙酯、鄰苯二甲酸二烯丙酯、蘋果酸二烯丙酯、己二酸二乙烯酯、二乙烯基苯、乙二醇二(甲基)丙烯酸酯、二乙二醇(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、四羥甲基甲烷四(甲基)丙烯酸酯、二丙二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯。Examples of polyfunctional monomers include allyl (meth)acrylate, triallyl cyanurate, triallyl isocyanurate, diallyl phthalate, malic acid Diallyl ester, divinyl adipate, divinylbenzene, ethylene glycol di(meth)acrylate, diethylene glycol (meth)acrylate, triethylene glycol di(meth)acrylate , Trimethylolpropane Tri(meth)acrylate, Tetramethylolmethane Tetra(meth)acrylate, Dipropylene Glycol Di(meth)acrylate, Polyethylene Glycol Di(meth)acrylate.

相對於構成丙烯酸系橡膠狀聚合物(a)的全部結構單元,源自多官能性單體的結構單元之含量較佳為0.05~10質量%之範圍內,更佳為0.1~5質量%之範圍內。藉由多官能性單體之含量為0.05質量%以上,容易提高所得之丙烯酸系橡膠狀聚合物(a)的交聯度,不易損害所得之該薄膜的硬度、剛性。又,藉由10質量%以下,不易損害該薄膜的韌性。The content of the structural unit derived from the polyfunctional monomer is preferably in the range of 0.05 to 10% by mass, more preferably 0.1 to 5% by mass, relative to all the structural units constituting the acrylic rubber-like polymer (a). within range. When the content of the polyfunctional monomer is 0.05% by mass or more, the degree of crosslinking of the obtained acrylic rubber-like polymer (a) is easily increased, and the hardness and rigidity of the obtained film are less likely to be impaired. Moreover, the toughness of this thin film is hard to be impaired by being 10 mass % or less.

構成丙烯酸系橡膠狀聚合物(a)的單體組成,例如可藉由熱分解GC-MS檢測出的波峰面積比進行測定。The monomer composition constituting the acrylic rubber-like polymer (a) can be measured, for example, by the peak area ratio detected by thermal decomposition GC-MS.

橡膠狀聚合物的玻璃轉移溫度(Tg)較佳為0℃以下,更佳為-10℃以下。若橡膠狀聚合物的玻璃轉移溫度(Tg)為0℃以下,則可將適度的韌性賦予至該薄膜。橡膠狀聚合物的玻璃轉移溫度(Tg)係以與前述同樣之方法進行測定。The glass transition temperature (Tg) of the rubbery polymer is preferably at most 0°C, more preferably at most -10°C. When the glass transition temperature (Tg) of a rubbery polymer is 0 degreeC or less, moderate toughness can be imparted to this film. The glass transition temperature (Tg) of the rubbery polymer was measured in the same manner as above.

橡膠狀聚合物的玻璃轉移溫度(Tg)係可藉由橡膠狀聚合物的組成來調整。例如,為了降低丙烯酸系橡膠狀聚合物(a)的玻璃轉移溫度(Tg),較佳為增多丙烯酸系橡膠狀聚合物(a)中的烷基之碳原子數為4以上的丙烯酸酯/能共聚合的其他單體之質量比(例如3以上,較佳為4~10)。The glass transition temperature (Tg) of the rubbery polymer can be adjusted by the composition of the rubbery polymer. For example, in order to lower the glass transition temperature (Tg) of the acrylic rubber-like polymer (a), it is preferable to increase the number of carbon atoms of the alkyl group in the acrylic rubber-like polymer (a) to 4 or more. The mass ratio of other copolymerized monomers (for example, 3 or more, preferably 4 to 10).

包含丙烯酸系橡膠狀聚合物(a)之粒子,可為由丙烯酸系橡膠狀聚合物(a)所成的粒子,或可為具有由玻璃轉移溫度為20℃以上的硬質交聯聚合物(c)所成的硬質層與配置在其周圍的由丙烯酸系橡膠狀聚合物(a)所成的軟質層之粒子(亦將此等稱為「彈性體」);也可為由在丙烯酸系橡膠狀聚合物(a)之存在下,將甲基丙烯酸酯等之單體的混合物至少1段以上聚合而得的丙烯酸系接枝共聚物所成之粒子。由丙烯酸系接枝共聚物所成之粒子可為具有包含丙烯酸系橡膠狀聚合物(a)的芯部與覆蓋它的殼部之芯殼型粒子。The particles comprising the acrylic rubber-like polymer (a) may be particles made of the acrylic rubber-like polymer (a), or may be a hard cross-linked polymer (c) having a glass transition temperature of 20°C or higher. ) and the particles of the soft layer made of acrylic rubber-like polymer (a) arranged around it (also referred to as "elastomer"); Particles of an acrylic graft copolymer obtained by polymerizing a mixture of monomers such as methacrylate in at least one stage in the presence of the polymer (a). The particles made of the acrylic graft copolymer may be core-shell particles having a core comprising the acrylic rubber-like polymer (a) and a shell covering it.

關於包含丙烯酸系橡膠狀聚合物之芯殼型橡膠粒子: (芯部) 芯部包含丙烯酸系橡膠狀聚合物(a),視需要可進一步包含硬質的交聯聚合物(c)。亦即,芯部可具有由丙烯酸系橡膠狀聚合物所成的軟質層與配置在其內側的由硬質交聯聚合物(c)所成的硬質層。 Regarding core-shell rubber particles comprising acrylic rubber-like polymers: (core) The core part contains an acrylic rubber-like polymer (a), and may further contain a hard crosslinked polymer (c) if necessary. That is, the core may have a soft layer made of an acrylic rubber-like polymer and a hard layer made of a hard cross-linked polymer (c) arranged inside it.

交聯聚合物(c)可為以甲基丙烯酸酯作為主成分的交聯聚合物。亦即,交聯聚合物(c)較佳為包含源自甲基丙烯酸烷酯的結構單元、源自與其能共聚合的其他單體的結構單元與源自多官能性單體的結構單元之交聯聚合物。The crosslinked polymer (c) may be a crosslinked polymer mainly composed of methacrylate. That is, the crosslinked polymer (c) preferably contains at least one of a structural unit derived from an alkyl methacrylate, a structural unit derived from another monomer copolymerizable therewith, and a structural unit derived from a polyfunctional monomer. cross-linked polymer.

甲基丙烯酸烷酯可為上述甲基丙烯酸烷酯,能共聚合的其他單體可為上述苯乙烯類或丙烯酸酯等,多官能性單體可舉出與作為上述多官能性單體列舉者同樣者。The alkyl methacrylate may be the above-mentioned alkyl methacrylate, and other copolymerizable monomers may be the above-mentioned styrenes or acrylates, and the polyfunctional monomers may be those listed as the above-mentioned polyfunctional monomers. the same.

相對於構成交聯聚合物(c)的全部結構單元,源自甲基丙烯酸烷酯的結構單元之含量較佳為40~100質量%之範圍內。相對於構成其他交聯聚合物(c)的全部結構單元,源自能共聚合的其他單體的結構單元之含量較佳為60~0質量%之範圍內。相對於構成其他交聯聚合物的全部結構單元,源自多官能性單體的結構單元之含量較佳為0.01~10質量%之範圍內。The content of the structural unit derived from an alkyl methacrylate is preferably within a range of 40 to 100% by mass relative to all structural units constituting the crosslinked polymer (c). The content of the structural units derived from other copolymerizable monomers is preferably in the range of 60 to 0% by mass relative to all the structural units constituting the other crosslinked polymer (c). The content of the structural unit derived from the polyfunctional monomer is preferably in the range of 0.01 to 10% by mass relative to all the structural units constituting other crosslinked polymers.

(殼部) 殼部包含接枝鍵結至丙烯酸系橡膠狀聚合物(a)的含有源自甲基丙烯酸酯的結構單元作為主成分之甲基丙烯酸系聚合物(b)(其他聚合物)。作為主成分含有者係指源自甲基丙烯酸酯的結構單元之含量成為後述之範圍內。 (shell) The shell portion contains a methacrylic polymer (b) (other polymer) containing a structural unit derived from methacrylate as a main component graft-bonded to the acrylic rubber-like polymer (a). What is contained as a main component means that content of the structural unit derived from a methacrylate falls within the range mentioned later.

構成甲基丙烯酸系聚合物(b)的甲基丙烯酸酯,較佳為甲基丙烯酸甲酯等之烷基的碳數為1~12之甲基丙烯酸烷酯。甲基丙烯酸酯可單獨一種使用,也可組合二種以上使用。The methacrylate constituting the methacrylic polymer (b) is preferably an alkyl methacrylate having 1 to 12 carbon atoms in the alkyl group such as methyl methacrylate. Methacrylates may be used alone or in combination of two or more.

相對於構成甲基丙烯酸系聚合物(b)的全部結構單元,甲基丙烯酸酯之含量較佳為50質量%以上。藉由甲基丙烯酸酯之含量為50質量%以上,容易得到與含有源自甲基丙烯酸甲酯的結構單元作為主成分的甲基丙烯酸系樹脂之相溶性。基於上述觀點,相對於構成甲基丙烯酸系聚合物(b)的全部結構單元,甲基丙烯酸酯之含量更佳為70質量%以上。The content of methacrylate is preferably 50% by mass or more with respect to all the structural units constituting the methacrylic polymer (b). When content of methacrylate is 50 mass % or more, compatibility with the methacrylic resin containing the structural unit derived from methyl methacrylate as a main component becomes easy to acquire. From the above viewpoint, the content of methacrylate is more preferably 70 mass % or more with respect to all the structural units constituting the methacrylic polymer (b).

甲基丙烯酸系聚合物(b)可進一步包含源自與甲基丙烯酸酯能共聚合的其他單體的結構單元。於能共聚合的其他單體之例中,包含丙烯酸甲酯、丙烯酸乙酯、丙烯酸正丁酯等之丙烯酸酯;(甲基)丙烯酸苄酯、(甲基)丙烯酸二環戊酯、(甲基)丙烯酸苯氧基乙酯等之具有脂環、雜環或芳香環的(甲基)丙烯酸系單體(含有環的(甲基)丙烯酸系單體)。The methacrylic polymer (b) may further contain a structural unit derived from another monomer copolymerizable with methacrylate. Examples of other copolymerizable monomers include acrylates such as methyl acrylate, ethyl acrylate, and n-butyl acrylate; benzyl (meth)acrylate, dicyclopentyl (meth)acrylate, (meth)acrylate (meth)acrylic monomers having alicyclic rings, heterocyclic rings or aromatic rings (ring-containing (meth)acrylic monomers) such as phenoxyethyl acrylate.

相對於構成甲基丙烯酸系聚合物(b)的全部結構單元,源自能共聚合的單體的結構單元之含量較佳為50質量%以下,更佳為30質量%以下。The content of the structural unit derived from the copolymerizable monomer is preferably at most 50% by mass, more preferably at most 30% by mass, relative to all the structural units constituting the methacrylic polymer (b).

於本實施形態中,由於偏光板用樹脂薄膜不被延伸,故橡膠粒子之形狀可為接近真球狀之形狀。亦即,觀察該薄膜的剖面或表面時,橡膠粒子之縱橫比較佳為1~2左右。In this embodiment, since the resin film for polarizing plates is not stretched, the shape of the rubber particles may be close to a true spherical shape. That is, when observing the cross section or surface of the film, the aspect ratio of the rubber particles is preferably about 1 to 2.

橡膠粒子的平均粒徑較佳為100~400nm之範圍內。藉由橡膠粒子的平均粒徑為100nm以上,容易將充分的韌性或應力緩和性賦予至該薄膜,藉由400nm以下,不易損害該薄膜的透明性。基於上述觀點,橡膠粒子的平均粒徑更佳為150~300nm之範圍內。The average particle diameter of the rubber particles is preferably in the range of 100-400 nm. When the average particle size of the rubber particles is 100 nm or more, it is easy to impart sufficient toughness or stress relaxation to the film, and when it is 400 nm or less, the transparency of the film is less likely to be impaired. Based on the above viewpoint, the average particle diameter of the rubber particles is more preferably in the range of 150 to 300 nm.

橡膠粒子的平均粒徑係可藉由以下之方法算出。The average particle diameter of rubber particles can be calculated by the following method.

橡膠粒子的平均粒徑係可作為偏光板用樹脂薄膜的表面或切片之藉由SEM攝影或TEM攝影所得之粒子100個的圓等效直徑之平均值測定。圓等效直徑可藉由將攝影所得之粒子的投影面積換算成具有相同面積的圓之直徑而求得。此時,將藉由倍率5000倍之SEM觀察及/或TEM觀察所觀察的橡膠粒子使用於平均粒徑之算出。The average particle diameter of the rubber particles can be measured as the average value of the circle-equivalent diameters of 100 particles obtained by SEM photography or TEM photography on the surface or slice of the resin film for polarizing plates. The circle-equivalent diameter can be obtained by converting the projected area of the particles obtained by photography into the diameter of a circle having the same area. At this time, rubber particles observed by SEM observation and/or TEM observation at a magnification of 5000 times were used for calculation of the average particle diameter.

橡膠粒子之含量係沒有特別的限定,但相對於該薄膜之總質量,較佳為5~40質量%之範圍內,更佳為7~30質量%之範圍內。The content of the rubber particles is not particularly limited, but is preferably within a range of 5 to 40% by mass, more preferably within a range of 7 to 30% by mass, relative to the total mass of the film.

[1.4 物性] <相位差Ro及Rt> 本發明之偏光板用樹脂薄膜係不僅作為保護層之功能,而且亦可賦予作為相位差薄膜等之光學薄膜的功能。 [1.4 Physical properties] <Phase difference Ro and Rt> The resin film for polarizing plates of the present invention not only functions as a protective layer but also functions as an optical film such as a retardation film.

該薄膜例如於作為IPS模式用的相位差薄膜使用之觀點中,測定波長590nm、23℃・55%RH之環境下所測定的面內方向之相位差Ro較佳為0~10nm之範圍內,更佳為0~5nm之範圍內。該薄膜之厚度方向的相位差Rt較佳為-40~40nm之範圍內,更佳為-25~25nm之範圍內。For example, from the point of view of using this film as a retardation film for IPS mode, the retardation Ro in the in-plane direction measured in an environment with a measurement wavelength of 590nm and 23°C・55%RH is preferably in the range of 0 to 10nm. More preferably within the range of 0~5nm. The retardation Rt in the thickness direction of the thin film is preferably in the range of -40~40nm, more preferably in the range of -25~25nm.

Ro及Rt各自以下述式定義。Each of Ro and Rt is defined by the following formula.

式(a):Ro=(n x-n y)×d 式(b):Rt=((n x+n y)/2-n z)×d (式中, n x表示偏光板用樹脂薄膜的面內慢軸方向(折射率成為最大的方向)之折射率, n y表示與偏光板用樹脂薄膜的面內慢軸正交的方向之折射率, n z表示偏光板用樹脂薄膜的厚度方向之折射率, d表示偏光板用樹脂薄膜之膜厚(nm))。 該薄膜之面內慢軸係可藉由自動雙折射率計Axo Scan(Axo Scan Mueller Matrix Polarimeter:AXOMETRICS公司製)進行確認。 Formula (a): Ro=(n x -n y )×d Formula (b): Rt=((n x +n y )/2-n z )×d (where n x represents the resin for polarizing plate The refractive index in the direction of the in-plane slow axis of the film (the direction in which the refractive index becomes the largest), ny represents the refractive index in the direction perpendicular to the in-plane slow axis of the resin film for polarizing plates, nz represents the refractive index of the resin film for polarizing plates The refractive index in the thickness direction, d represents the film thickness (nm) of the resin film for polarizing plates). The in-plane slow axis system of the thin film can be confirmed with an automatic birefringence meter Axo Scan (Axo Scan Mueller Matrix Polarimeter: manufactured by AXOMETRICS).

Ro及Rt係可藉由以下之方法進行測定。Ro and Rt can be measured by the following methods.

1)將該薄膜在23℃・55%RH之環境下調濕24小時。以阿貝折射計測定該薄膜之平均折射率,使用市售的測微計來測定膜厚d。1) Condition the film for 24 hours in an environment of 23°C・55%RH. The average refractive index of the thin film was measured with an Abbe refractometer, and the film thickness d was measured using a commercially available micrometer.

2)使用自動雙折射率計Axo Scan(Axo Scan Mueller Matrix Polarimeter:AXOMETRICS公司製),在23℃・55%RH之環境下分別測定調濕後的該薄膜在測定波長590nm的遲滯Ro及Rt。2) Using an automatic birefringence meter Axo Scan (Axo Scan Mueller Matrix Polarimeter: manufactured by AXOMETRICS Co., Ltd.), the retardation Ro and Rt at the measurement wavelength of 590 nm of the film after humidity adjustment were respectively measured in an environment of 23° C. and 55% RH.

該薄膜的相位差Ro及Rt係可藉由例如熱塑性樹脂的種類或延伸條件、乾燥條件而調整。例如,藉由提高乾燥溫度,可降低Rt。The retardation Ro and Rt of the film can be adjusted by, for example, the type of thermoplastic resin, stretching conditions, and drying conditions. For example, by increasing the drying temperature, Rt can be lowered.

≪2 本發明之偏光板用樹脂薄膜之製造方法≫ 本發明之偏光板用樹脂薄膜的形態係沒有特別的限制,但例如較佳為帶狀。亦即,本發明之偏光板用樹脂薄膜較佳為在與其寬度方向正交的方向中被捲取成捲筒狀,而成為捲筒體。 ≪2 Manufacturing method of resin film for polarizing plate of the present invention≫ The form of the resin film for polarizing plates of the present invention is not particularly limited, but is preferably in the form of a belt, for example. That is, it is preferable that the resin film for polarizing plates of this invention is wound up into the roll shape in the direction orthogonal to the width direction, and it becomes a roll body.

[製造方法] 本發明之偏光板用樹脂薄膜之製造方法具有:1)得到偏光板用樹脂薄膜用溶液之步驟,2)將所得之偏光板用樹脂薄膜用溶液賦予至支撐體的表面之步驟,及3)從經賦予的偏光板用樹脂薄膜用溶液中去除溶劑,形成偏光板用樹脂薄膜之步驟。 [Manufacturing method] The method for producing a resin film for a polarizing plate of the present invention comprises: 1) a step of obtaining a solution for a resin film for a polarizing plate, 2) a step of applying the obtained solution for a resin film for a polarizing plate to the surface of a support, and 3) A step of removing the solvent from the applied solution for a resin film for a polarizing plate to form a resin film for a polarizing plate.

1)得到偏光板用樹脂薄膜用溶液之步驟 調製包含熱塑性樹脂、碘移動抑制劑及溶劑的偏光板用樹脂薄膜用溶液(亦稱為「薄膜用溶液」或「塗液」)。薄膜用溶液適宜地可包含硫酸離子。 1) Step of obtaining a solution for a resin film for a polarizing plate A solution for a resin film for a polarizing plate (also referred to as a "solution for a film" or a "coating solution") containing a thermoplastic resin, an iodine transfer inhibitor, and a solvent is prepared. The solution for the thin film may suitably contain sulfate ions.

薄膜用溶液係添加粉體或液體(金屬氧化物粒子之情況為分散液)的碘移動抑制劑、溶劑,視情況進一步添加硫酸,進行攪拌,然後添加樹脂,進行攪拌而調製。The film solution is prepared by adding a powder or liquid (in the case of metal oxide particles, a dispersion liquid) iodine transfer inhibitor, a solvent, further adding sulfuric acid as the case may be, stirring, and then adding a resin and stirring.

使用金屬氧化物粒子作為碘移動抑制劑時,使金屬氧化物粒子以粒子狀分散於下述薄膜用溶液所用的溶劑中而得到分散液。金屬氧化物粒子之分散可利用機械能量進行,如此的分散機係沒有特別的限定,如上述列舉,作為例子,可舉出低速剪切式分散機、高速剪切式分散機、摩擦式分散機、高壓噴射式分散機、超音波均質機等之超音波分散機或高壓衝擊式分散機濕式微粒化器等。When using metal oxide particles as the iodine transfer inhibitor, the metal oxide particles are dispersed in the form of particles in a solvent used for a thin film solution described below to obtain a dispersion. The dispersion of metal oxide particles can be carried out using mechanical energy. Such a disperser system is not particularly limited. As mentioned above, as examples, low-speed shear dispersers, high-speed shear dispersers, and friction dispersers can be mentioned. , High-pressure jet disperser, ultrasonic homogenizer, etc. Ultrasonic disperser or high-pressure impact disperser wet micronizer, etc.

偏光板用樹脂薄膜用溶液所用的溶劑,只要能使樹脂良好地分散或溶解即可,並無特別的限制。例如,作為本發明所用的有機溶劑,可舉出醇類(甲醇、乙醇或二醇、三醇、四氟丙醇等)、二醇類、賽珞蘇類、酮類(丙酮、甲基乙基酮等)、羧酸類(甲酸、乙酸等)、碳酸酯類(碳酸伸乙酯、碳酸伸丙酯等)、酯類(乙酸乙酯、乙酸丙酯等)、醚類(異丙基醚、THF等)、醯胺類(二甲基亞碸等)、烴類(庚烷等)、腈類(乙腈等)、芳香族類(環己基苯、甲苯、二甲苯、氯苯等)、鹵化烷基類(二氯甲烷(亦稱為「亞甲基氯」)等)、胺類(1,4-二氮雜雙環[2.2.2]辛烷、二氮雜雙環十一烯等)、內酯系等。The solvent used for the solution for the resin film for polarizing plates is not particularly limited as long as it can disperse or dissolve the resin well. For example, as the organic solvent used in the present invention, alcohols (methanol, ethanol or glycols, triols, tetrafluoropropanol, etc.), glycols, celloxal, ketones (acetone, methyl ethyl alcohol, etc.) ketone, etc.), carboxylic acids (formic acid, acetic acid, etc.), carbonates (ethylene carbonate, propylene carbonate, etc.), esters (ethyl acetate, propyl acetate, etc.), ethers (isopropyl ether , THF, etc.), amides (dimethyl sulfide, etc.), hydrocarbons (heptane, etc.), nitriles (acetonitrile, etc.), aromatics (cyclohexylbenzene, toluene, xylene, chlorobenzene, etc.), Alkyl halides (dichloromethane (also known as "methylene chloride"), etc.), amines (1,4-diazabicyclo[2.2.2]octane, diazabicycloundecene, etc.) , Lactone series, etc.

其中,作為薄膜用溶液的溶劑,沸點為大氣壓下100℃以下者較宜,且較佳為氯系溶劑。具體而言,更佳為二氯甲烷(亦稱為「亞甲基氯」)。由於溶劑為二氯甲烷,其溶解性高而操作容易,且揮發性高而乾燥速度快,容易調整塗佈膜的膜質。Among them, as the solvent for the thin film solution, those having a boiling point of 100° C. or lower under atmospheric pressure are preferable, and chlorine-based solvents are preferable. Specifically, dichloromethane (also known as "methylene chloride") is more preferred. Since the solvent is dichloromethane, it has high solubility and is easy to handle, and has high volatility and fast drying speed, so it is easy to adjust the film quality of the coating film.

又,於薄膜用溶液之溶劑中,可添加親水性的溶劑。作為親水性的溶劑,例如可舉出酮類、醇類等,較佳為醇類。更佳為異丙醇、乙醇、甲醇等,最佳為甲醇。相對於薄膜用溶液的溶劑之總質量,添加量較佳為1~20質量%之範圍內,更佳為3~10質量%之範圍內。In addition, a hydrophilic solvent may be added to the solvent of the thin film solution. As a hydrophilic solvent, a ketone, alcohol, etc. are mentioned, for example, Alcohol is preferable. More preferably, it is isopropanol, ethanol, methanol, etc., most preferably, it is methanol. The added amount is preferably in the range of 1 to 20% by mass, more preferably in the range of 3 to 10% by mass, based on the total mass of the solvent of the thin film solution.

薄膜用溶液中的樹脂之濃度,從容易將黏度調整至後述範圍內之觀點來看,相對於薄膜用溶液之總質量,例如較佳為1.0~20質量%之範圍內。又,從減少塗膜的乾燥時之收縮量之觀點來看,薄膜用溶液中的樹脂之濃度較佳為適度地高,更佳為超過5質量%且20質量%以下之範圍內,尤佳為超過5質量%且15質量%以下之範圍內。The concentration of the resin in the film solution is preferably within a range of, for example, 1.0 to 20% by mass relative to the total mass of the film solution from the viewpoint of easy adjustment of the viscosity to the range described later. Also, from the viewpoint of reducing the amount of shrinkage of the coating film during drying, the concentration of the resin in the film solution is preferably moderately high, more preferably in the range of more than 5% by mass and not more than 20% by mass, and particularly preferably It is within the range of more than 5% by mass and not more than 15% by mass.

藉由調整樹脂之濃度,到形成塗膜為止的時間變短,可控制乾燥時間及薄膜的表面狀態。又,藉由適宜地使用混合溶劑,可提高樹脂之濃度。By adjusting the concentration of the resin, the time until the coating film is formed is shortened, and the drying time and the surface state of the film can be controlled. Also, by using a mixed solvent appropriately, the concentration of the resin can be increased.

薄膜用溶液之黏度只要是能形成所欲膜厚之偏光板用樹脂薄膜之程度即可,並無特別的限制,但例如較佳為5~5000mPa・s之範圍內。藉由薄膜用溶液之黏度為5mPa・s以上,容易形成適度膜厚的薄膜,藉由5000mPa・s以下,可抑制因溶液之黏度上升而發生膜厚不均者。薄膜用溶液之黏度,基於上述觀點,更佳為100~1000mPa・s之範圍內。薄膜用溶液之黏度可在25℃下以E型黏度計進行測定。The viscosity of the film solution is not particularly limited as long as it can form a polarizing plate resin film with a desired film thickness, but it is preferably in the range of 5 to 5000 mPa·s, for example. When the viscosity of the film solution is above 5mPa・s, it is easy to form a film with a moderate film thickness, and when it is below 5000mPa・s, it is possible to suppress the occurrence of uneven film thickness due to the increase in the viscosity of the solution. The viscosity of the film solution is more preferably in the range of 100 to 1000 mPa・s from the above point of view. The viscosity of the film solution can be measured with an E-type viscometer at 25°C.

2)賦予偏光板用樹脂薄膜用溶液之步驟 接著,將所得之薄膜用溶液賦予至支撐體之表面。具體而言,將所得之薄膜用溶液塗佈於支撐體之表面。 2) Step of providing solution for resin film for polarizing plate Next, the obtained solution for a thin film is applied to the surface of the support. Specifically, the solution for the obtained thin film is coated on the surface of the support.

<支撐體> 支撐體係在偏光板用樹脂薄膜形成時進行支撐者,通常使用樹脂薄膜。支撐體之厚度較佳為50μm以下。支撐體之厚度必須一邊為薄膜,一邊某程度的強度(硬挺性剛性)作為支撐體,故較佳為15~45μm之範圍內,更佳為20~40μm之範圍內。 <Support> The support system supports when forming a polarizing plate with a resin film, and usually uses a resin film. The thickness of the support is preferably 50 μm or less. The thickness of the support body must be a thin film and a certain degree of strength (rigidity) as the support body, so it is preferably within the range of 15-45 μm, more preferably within the range of 20-40 μm.

作為支撐體的樹脂薄膜所用之樹脂,可舉出纖維素酯系樹脂、環烯烴系樹脂、聚丙烯系樹脂、丙烯酸系樹脂、聚酯系樹脂、聚芳酯系樹脂及苯乙烯系樹脂或其複合樹脂,但其中作為高濕度環境下的保存性優異的樹脂,較佳為使用聚酯系樹脂。As the resin used for the resin film of the support, cellulose ester resins, cycloolefin resins, polypropylene resins, acrylic resins, polyester resins, polyarylate resins, and styrene resins or their Among the composite resins, polyester-based resins are preferably used as resins excellent in storage stability in a high-humidity environment.

於樹脂薄膜之例中,包含聚酯系樹脂(例如聚對苯二甲酸乙二酯(PET)、聚對苯二甲酸丙二酯(PTT)、聚對苯二甲酸丁二酯(PBT)、聚萘二甲酸乙二酯(PEN)、聚萘二甲酸丁二酯(PBN)等)等。其中,從處理容易性之觀點來看,較佳為包含聚對苯二甲酸乙二酯(PET)或聚萘二甲酸乙二酯(PEN)之聚酯系樹脂薄膜。Examples of resin films include polyester resins (such as polyethylene terephthalate (PET), polytrimethylene terephthalate (PTT), polybutylene terephthalate (PBT), polyethylene naphthalate (PEN), polybutylene naphthalate (PBN), etc.), etc. Among these, polyester-based resin films made of polyethylene terephthalate (PET) or polyethylene naphthalate (PEN) are preferred from the viewpoint of ease of handling.

樹脂薄膜可被熱處理(熱鬆弛),也可被延伸處理。The resin film may be heat-treated (heat-relaxed) or stretched.

熱處理係為了使樹脂薄膜的殘留應力(例如伴隨延伸的殘留應力等)減低而進行。溫度係沒有特別的限制,但將構成樹脂薄膜的樹脂之玻璃轉移溫度當作Tg時,可在(Tg+60)~(Tg+180)℃進行。The heat treatment is performed in order to reduce the residual stress of the resin film (for example, the residual stress accompanying stretching, etc.). The temperature system is not particularly limited, but when the glass transition temperature of the resin constituting the resin film is taken as Tg, it can be carried out at (Tg+60)~(Tg+180)°C.

延伸處理係為了使樹脂薄膜的殘留應力增加而進行,延伸處理例如較佳為在樹脂薄膜的2軸方向進行。延伸處理可在任意之條件下進行,例如可以延伸倍率120~900%左右之範圍內進行。樹脂薄膜是否被延伸,例如可藉由是否有面內慢軸(在折射率成為最大的方向中延伸之軸)而確認。延伸處理可在積層功能層之前進行,也可在積層之後進行,但較佳為在積層之前進行延伸。The stretching treatment is performed to increase the residual stress of the resin film, and the stretching treatment is preferably performed, for example, in biaxial directions of the resin film. The stretching treatment can be carried out under arbitrary conditions, for example, it can be carried out within the range of about 120 to 900% of the stretching ratio. Whether or not the resin film is stretched can be confirmed, for example, by whether or not there is an in-plane slow axis (the axis extending in the direction in which the refractive index becomes the maximum). Stretching treatment may be performed before lamination of functional layers or after lamination, but it is preferable to perform stretching before lamination.

聚酯系樹脂薄膜(簡單地亦稱為聚酯薄膜)可使用市售品,例如可適宜使用聚對苯二甲酸乙二酯薄膜TN100(東洋紡公司製)、MELINEX(註冊商標)ST504(帝人杜邦薄膜公司製)等。A commercially available polyester film (simply referred to as polyester film) can be used, for example, polyethylene terephthalate film TN100 (manufactured by Toyobo Co., Ltd.), MELINEX (registered trademark) ST504 (Teijin DuPont Film Co., Ltd.), etc.

支撐體可在樹脂薄膜之表面上進一步具有脫模層。藉由具有脫模層,在製作本發明之偏光板用樹脂薄膜時,容易剝離支撐體。The support may further have a release layer on the surface of the resin film. When the resin film for polarizing plates of this invention is produced by having a release layer, a support body can be peeled off easily.

脫模層可包含眾所周知的剝離劑,並無特別的限制。於脫模層所含有的剝離劑之例中,包含聚矽氧系剝離劑及非聚矽氧系剝離劑。The release layer may contain a well-known release agent and is not particularly limited. Examples of the release agent contained in the release layer include silicone-based release agents and non-silicone-based release agents.

於聚矽氧系剝離劑之例中,包含眾所周知的聚矽氧系樹脂。作為非聚矽氧系剝離劑之例,可舉出對於聚乙烯醇或乙烯-乙烯醇共聚物等使長鏈烷基異氰酸酯反應而成之長鏈烷基懸掛型聚合物、烯烴系樹脂(例如共聚合聚乙烯、環狀聚烯烴、聚甲基戊烯)、聚芳酯樹脂(例如芳香族二羧酸成分與二元酚成分之聚縮合物)、氟樹脂(例如聚四氟乙烯(PTFE)、聚偏二氟乙烯(PVDF)、聚氟乙烯(PVF)、PFA(四氟乙烯與全氟烷氧基乙烯之共聚物)、FEP(四氟乙烯與六氟丙烯之共聚物)、ETFE(四氟乙烯與乙烯之共聚物))等。Examples of silicone-based release agents include well-known silicone-based resins. Examples of non-silicone-based release agents include long-chain alkyl pendant polymers obtained by reacting long-chain alkyl isocyanates with polyvinyl alcohol or ethylene-vinyl alcohol copolymers, and olefin-based resins (such as Copolymerized polyethylene, cyclic polyolefin, polymethylpentene), polyarylate resin (such as polycondensate of aromatic dicarboxylic acid component and dihydric phenol component), fluororesin (such as polytetrafluoroethylene (PTFE ), polyvinylidene fluoride (PVDF), polyvinyl fluoride (PVF), PFA (copolymer of tetrafluoroethylene and perfluoroalkoxyethylene), FEP (copolymer of tetrafluoroethylene and hexafluoropropylene), ETFE (copolymer of tetrafluoroethylene and ethylene)), etc.

脫模層之厚度只要是能展現所欲的剝離性之程度即可,並無特別的限制,但例如較佳為0.1~1.0μm之範圍內。The thickness of the release layer is not particularly limited as long as the desired peelability can be exhibited, but is preferably within a range of 0.1 to 1.0 μm, for example.

支撐體亦可含有可塑劑作為添加劑。作為可塑劑,並無特別的限定,但例如可舉出多元醇酯系可塑劑、鄰苯二甲酸酯系可塑劑、檸檬酸系可塑劑、脂肪酸酯系可塑劑、磷酸酯系可塑劑、多元羧酸酯系可塑劑及聚酯系可塑劑等。The support may also contain plasticizers as additives. The plasticizer is not particularly limited, but examples include polyol ester-based plasticizers, phthalate-based plasticizers, citric acid-based plasticizers, fatty acid ester-based plasticizers, and phosphate ester-based plasticizers. , polycarboxylate-based plasticizers, polyester-based plasticizers, etc.

又,支撐體亦可含有紫外線吸收劑。作為所用的紫外線吸收劑,例如可舉出苯并三唑系、2-羥基二苯甲酮系或水楊酸苯酯系等。具體而言,可舉出2-(5-甲基-2-羥基苯基)苯并三唑、2-[2-羥基-3,5-雙(α,α-二甲基苄基)苯基]-2H-苯并三唑、2-(3,5-二第三丁基-2-羥基苯基)苯并三唑等之三唑類、2-羥基-4-甲氧基二苯甲酮、2-羥基-4-辛氧基二苯甲酮、2,2’-二羥基-4-甲氧基二苯甲酮等之二苯甲酮類等。Moreover, a support body may contain an ultraviolet absorber. Examples of the ultraviolet absorber to be used include benzotriazole-based, 2-hydroxybenzophenone-based, and phenyl salicylate-based agents. Specifically, 2-(5-methyl-2-hydroxyphenyl)benzotriazole, 2-[2-hydroxy-3,5-bis(α,α-dimethylbenzyl)benzene Base]-2H-benzotriazole, 2-(3,5-di-tert-butyl-2-hydroxyphenyl)benzotriazole and other triazoles, 2-hydroxy-4-methoxydiphenyl Benzophenones such as ketone, 2-hydroxy-4-octyloxybenzophenone, and 2,2'-dihydroxy-4-methoxybenzophenone, etc.

再者,本發明所用的支撐體,為了提高搬運性,較佳為含有微粒子。Furthermore, the support used in the present invention preferably contains fine particles in order to improve transportability.

作為微粒子,於無機化合物之例中,可舉出二氧化矽、二氧化鈦、氧化鋁、氧化鋯、碳酸鈣、碳酸鈣、滑石、黏土、燒成高嶺土、燒成矽酸鈣、水合矽酸鈣、矽酸鋁、矽酸鎂及磷酸鈣。Examples of fine particles include silica, titania, alumina, zirconia, calcium carbonate, calcium carbonate, talc, clay, fired kaolin, fired calcium silicate, hydrated calcium silicate, Aluminum silicate, magnesium silicate and calcium phosphate.

又,作為微粒子,亦可較佳地使用有機化合物的微粒子。作為有機化合物之例,可舉出聚四氟乙烯、纖維素乙酸酯、聚苯乙烯、聚甲基丙烯酸甲酯、聚甲基丙烯酸丙酯、聚丙烯酸甲酯、聚碳酸伸乙酯、丙烯酸苯乙烯系樹脂、聚矽氧系樹脂、聚碳酸酯樹脂、苯并胍胺系樹脂、三聚氰胺系樹脂、聚烯烴系粉末、聚酯系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂,或者聚氟乙烯系樹脂、澱粉等之有機高分子化合物的粉碎分級物或以懸浮聚合法所合成的高分子化合物等。In addition, fine particles of an organic compound can also be preferably used as the fine particles. Examples of organic compounds include polytetrafluoroethylene, cellulose acetate, polystyrene, polymethyl methacrylate, polypropyl methacrylate, polymethyl acrylate, polyethylene carbonate, acrylic Styrene resin, silicone resin, polycarbonate resin, benzoguanamine resin, melamine resin, polyolefin powder, polyester resin, polyamide resin, polyimide resin, Or pulverized and fractionated organic polymer compounds such as polyvinyl fluoride resin and starch, or polymer compounds synthesized by suspension polymerization.

從濁度變低之觀點來看,微粒子較佳為包含矽者,特佳為二氧化矽。作為二氧化矽的微粒子,可使用市售品,例如可舉出Aerosil(註冊商標)R972、R972V、R974、R812、200、200V、300、R202、OX50、TT600(以上日本AEROSIL(股)製)等。From the viewpoint of lowering the turbidity, the fine particles are preferably those containing silicon, particularly preferably silicon dioxide. As fine particles of silica, commercially available products can be used, for example, Aerosil (registered trademark) R972, R972V, R974, R812, 200, 200V, 300, R202, OX50, TT600 (manufactured by Nippon Aerosil Co., Ltd.) wait.

作為本發明所用的支撐體之製造方法,可使用通常的吹脹法、T字模法、壓延法、切削法、流延法、乳化法、熱壓法等之製造法,但從抑制著色、抑制異物缺點、抑制口模線等光學缺點等之觀點來看,製膜方法較佳為溶液流延法與熔融流延法。再者,若為溶液流延法,則加工步驟的溫度比較低,因此可使用各種的添加劑進一步賦予功能。As the manufacturing method of the support used in the present invention, the usual inflation method, T-die method, calendering method, cutting method, casting method, emulsification method, hot pressing method, etc. can be used, but from the suppression of coloring, the suppression of From the viewpoint of foreign matter defects, optical defects such as suppression of die line, etc., the film production method is preferably solution casting method and melt casting method. In addition, in the case of the solution casting method, the temperature of the processing step is relatively low, so various additives can be used to provide further functions.

藉由溶液流延法進行製膜時,支撐體之製造方法較佳為包含:使熱塑性樹脂及上述微粒子等之添加劑溶解、分散於溶劑中而調製塗液之步驟(溶解步驟;塗液調製步驟),將塗液流延在無限地移動之無端金屬支撐體上之步驟(流延步驟),使經流延的塗液成為料片(web)進行乾燥之步驟(溶劑蒸發步驟),從金屬支撐體剝離之步驟(剝離步驟),乾燥、延伸、寬度保持之步驟(延伸・寬度保持・乾燥步驟),將經加工的薄膜捲取成捲筒狀之步驟(捲取步驟)。When forming a film by a solution casting method, the production method of the support preferably includes a step of dissolving and dispersing additives such as thermoplastic resin and the above-mentioned fine particles in a solvent to prepare a coating solution (dissolving step; coating solution preparation step) ), the step of casting the coating solution on the infinitely moving endless metal support (casting step), the step of making the cast coating solution become a web (web) and drying (solvent evaporation step), from the metal The step of peeling the support (peeling step), the step of drying, stretching, and maintaining the width (stretching, width maintaining, and drying step), and the step of winding the processed film into a roll (winding step).

較佳為使用如以上所製造的支撐體,藉由下述方法形成本發明之偏光板用樹脂薄膜。It is preferable to form the resin film for polarizing plates of this invention by the following method using the support manufactured as mentioned above.

偏光板用樹脂薄膜用溶液之塗佈方法係沒有特別的限制,例如可為後輥塗佈法、凹板塗佈法、旋轉塗佈法、線棒塗佈法、輥塗法等之眾所周知的方法。尤其從能形成薄且均勻的膜厚之塗膜之觀點來看,較佳為背塗法。The coating method of the solution for the resin film for polarizing plates is not particularly limited, and for example, well-known methods such as post-roll coating, gravure coating, spin coating, wire bar coating, and roll coating can be used. method. In particular, the back coating method is preferable from the viewpoint of being able to form a thin and uniform coating film.

3)形成偏光板用樹脂薄膜之步驟 接著,從經賦予至支撐體的偏光板用樹脂薄膜用溶液中去除溶劑,形成偏光板用樹脂薄膜。 3) Step of forming resin film for polarizing plate Next, the solvent is removed from the solution for the resin film for polarizing plates provided to the support body, and the resin film for polarizing plates is formed.

具體而言,使經賦予至支撐體的薄膜用溶液進行乾燥。乾燥例如可藉由送風或加熱進行。其中,於容易抑制薄膜的捲曲等之觀點中,較佳為藉由送風進行乾燥,再者從控制下述膜厚偏差之觀點來看,較佳為造成乾燥初期與乾燥後半中的風速差。具體而言,有初期的風速高時膜厚偏差變大,初期的風速低時變小之傾向。Specifically, the solution for thin film applied to the support is dried. Drying can be performed by blowing air or heating, for example. Among them, from the viewpoint of easily suppressing curling of the film, it is preferable to dry by blowing air, and from the viewpoint of controlling variation in film thickness described below, it is preferable to cause a difference in wind speed between the initial stage of drying and the second half of drying. Specifically, the variation in film thickness tends to increase when the initial wind speed is high, and to decrease when the initial wind speed is low.

因此,藉由調整乾燥條件(例如乾燥溫度、乾燥風量、乾燥時間等),而控制偏光板用樹脂薄膜的疏密,可將薄膜之厚度調整至滿足下述式之範圍內。Therefore, by adjusting the drying conditions (such as drying temperature, drying air volume, drying time, etc.) to control the density of the resin film for polarizing plates, the thickness of the film can be adjusted to the range satisfying the following formula.

5<|寬度方向之任意選擇的3點之膜厚的平均值(B)-平均膜厚值(A)|/平均膜厚值(A)×100<20(%) 此處,平均膜厚值(A)為從薄膜中任意抽出的10點之膜厚值的平均值。 5<|Average (B)-average film thickness (A)|/average film thickness (A)×100<20(%) Here, the average film thickness value (A) is the average value of film thickness values at 10 points arbitrarily extracted from the film.

藉由上述式所示的值超過5%,表面適度地具有凹凸,與上層之密著性提升,藉由未達20%,表面的凹凸不過大,不影響上層的塗佈性及平滑性。When the value shown in the above formula exceeds 5%, the surface has moderate unevenness, and the adhesion with the upper layer is improved. When it is less than 20%, the unevenness of the surface is not too large, and the coatability and smoothness of the upper layer are not affected.

膜厚之測定可使用市售的膜厚測定裝置,作為膜厚測定系統,例如可舉出F20-UV(FILMETRICS公司製)。A commercially available film thickness measuring device can be used for the measurement of the film thickness, and as a film thickness measuring system, F20-UV (manufactured by FILMETRICS, Inc.) is mentioned, for example.

又,偏光板用樹脂薄膜之厚度的偏差ρ較佳為調整至0.5±0.2μm之範圍內。又,從與上層的密著性提升之觀點來看,膜質調整至變疏的方向者較宜。具體而言,較佳為提高乾燥速度,較佳為0.0015~0.05kg/hr・m 2之範圍內,更佳為0.002~0.05kg/hr・m 2之範圍內。 In addition, it is preferable that the deviation ρ of the thickness of the resin film for polarizing plates be adjusted within the range of 0.5±0.2 μm. Also, from the viewpoint of improving the adhesion to the upper layer, it is preferable to adjust the film quality to a thinning direction. Specifically, it is preferable to increase the drying speed, preferably in the range of 0.0015~0.05kg/hr・m 2 , more preferably in the range of 0.002~0.05kg/hr・m 2 .

乾燥速度係以每單位時間及單位面積所蒸發的溶劑之質量表示。乾燥速度通常可藉由乾燥溫度進行調整。乾燥溫度雖然亦取決於所使用的溶劑種類,但例如較佳為50~200℃(相對於所使用的溶劑之沸點Tb而言(Tb-50)~(Tb+50)℃之範圍內)。溫度控制係可以多階段進行。於進行某程度乾燥後,在更高溫進行乾燥者,可控制乾燥速度及膜質。The drying speed is expressed by the mass of solvent evaporated per unit time and unit area. Drying speed can usually be adjusted by drying temperature. Although the drying temperature also depends on the type of solvent used, for example, it is preferably 50~200°C (in the range of (Tb-50)~(Tb+50)°C relative to the boiling point Tb of the solvent used). The temperature control system can be carried out in multiple stages. After a certain degree of drying, drying at a higher temperature can control the drying speed and film quality.

本發明之偏光板用樹脂薄膜係如前述,較佳為帶狀。因此,本實施形態之積層薄膜之製造方法較佳為進一步包含(4)將帶狀積層薄膜捲取成捲筒狀,成為捲筒體之步驟。The resin film for polarizing plates of the present invention is as described above, preferably in the form of a belt. Therefore, it is preferable that the manufacturing method of the laminated film of this embodiment further includes (4) the step of winding the tape-shaped laminated film into a roll to form a roll body.

4)捲取偏光板用樹脂薄膜,得到捲筒體之步驟 將所得之帶狀偏光板用樹脂薄膜在正交於其寬度方向的方向中捲取成捲筒狀,成為捲筒體。 4) The step of winding up the resin film for polarizing plates to obtain a roll body The obtained resin film for a strip-shaped polarizing plate was wound up into a roll in a direction perpendicular to its width direction to form a roll body.

帶狀偏光板用樹脂薄膜之長度係沒有特別的限制,但例如可為100~10000m之範圍內。又,帶狀偏光板用樹脂薄膜之寬度較佳為1m以上,更佳為1.1~4m之範圍內。於提高薄膜的均勻性之觀點中,更佳為1.3~2.5m之範圍內。The length of the resin film for band-shaped polarizing plates is not particularly limited, but may be, for example, within a range of 100 to 10000 m. Moreover, the width of the resin film for band-shaped polarizing plates is preferably at least 1 m, more preferably within a range of 1.1 to 4 m. From the viewpoint of improving the uniformity of the film, it is more preferably in the range of 1.3 to 2.5 m.

[製造裝置] 本發明之偏光板用樹脂薄膜之製造方法,例如可藉由圖1所示的製造裝置進行。 [manufacturing device] The manufacturing method of the resin film for polarizing plates of this invention can be performed by the manufacturing apparatus shown in FIG. 1, for example.

圖1係實施本發明的偏光板用樹脂薄膜之製造方法用的製造裝置B200之模型圖,製造裝置B200具有供給部B210、塗佈部B220、乾燥部B230、冷卻部B240與捲取部B250。Ba~Bd表示搬運支撐體B110之搬運輥。1 is a model diagram of a manufacturing device B200 for implementing the manufacturing method of a resin film for polarizing plates of the present invention. The manufacturing device B200 has a supply part B210, a coating part B220, a drying part B230, a cooling part B240 and a winding part B250. Ba~Bd represent the conveyance roller which conveys the support body B110.

供給部B210具有將捲繞在捲芯上的帶狀支撐體B110之捲筒體B201送出之送出裝置(未圖示)。The supply part B210 has the sending-out device (not shown) which sends out the roll body B201 of the tape-shaped support body B110 wound on the winding core.

塗佈部B220為塗佈裝置,具有保持支撐體B110的支撐輥B221、在被支撐輥B221所保持的支撐體B110上塗佈偏光板用樹脂薄膜用溶液之塗佈頭B222與在塗佈頭B222之上游側所設置的減壓室B223。The coating unit B220 is a coating device, and has a support roll B221 holding the support body B110, a coating head B222 for coating a solution for a resin film for a polarizing plate on the support body B110 held by the support roll B221, and a coating head B222. The decompression chamber B223 installed on the upstream side of B222.

從塗佈頭B222所吐出的偏光板用樹脂薄膜用溶液之流量係可藉由未圖示的泵進行調整。從塗佈頭B222所吐出的偏光板用樹脂薄膜用溶液之流量,係在經預先調整的塗佈頭B222之條件下連續塗佈時,設定成能穩定地形成指定厚度的塗佈層之量。The flow rate of the solution for the resin film for polarizing plates discharged from the coating head B222 can be adjusted with the pump which is not shown in figure. The flow rate of the solution for the polarizing plate resin film discharged from the coating head B222 is the amount that can stably form a coating layer with a specified thickness when continuously coating under the conditions of the previously adjusted coating head B222 .

減壓室B223係用於在塗佈時穩定化在來自塗佈頭B222的偏光板用樹脂薄膜用溶液與支撐體B110之間所形成的珠粒(塗佈液之滯留)之機構,可調整減壓度。減壓室B223係連接至減壓鼓風機(未圖示),而可將內部減壓。減壓室B223係成為無漏空氣之狀態,且與支撐輥之間隙亦被狹窄地調整,可形成穩定之塗佈液的珠粒。The decompression chamber B223 is a mechanism for stabilizing the beads formed between the solution for the resin film for polarizing plates from the coating head B222 and the support B110 (retention of the coating solution) during coating, and can be adjusted. decompression degree. The decompression chamber B223 is connected to a decompression blower (not shown), and can depressurize the inside. The decompression chamber B223 is in a state of no air leakage, and the gap between the back-up roll and the back-up roll is also adjusted narrowly, and stable beads of the coating liquid can be formed.

乾燥部B230係使在支撐體B110之表面上所塗佈的塗膜進行乾燥之乾燥裝置,具有乾燥室B231、乾燥用氣體的導入口B232與排出口B233。乾燥風之溫度及風量係可按照塗膜的種類及支撐體B110的種類而適宜決定。藉由設定乾燥部B230的乾燥風之溫度、風量、乾燥時間等之條件,可調整乾燥後的塗膜之殘留溶劑量。乾燥後的塗膜之殘留溶劑量係可藉由比較乾燥後的塗膜之單位質量與將該塗膜充分乾燥後之單位質量而測定。The drying part B230 is a drying device for drying the coating film applied on the surface of the support body B110, and has a drying chamber B231, an inlet B232 for a drying gas, and an outlet B233. The temperature and air volume of the drying air can be appropriately determined according to the type of the coating film and the type of the support B110. By setting the drying air temperature, air volume, drying time and other conditions of the drying section B230, the amount of residual solvent in the dried coating film can be adjusted. The residual solvent amount of the dried coating film can be measured by comparing the unit mass of the dried coating film with the unit mass of the fully dried coating film.

(殘留溶劑量) 本發明之偏光板用樹脂薄膜係在塗佈薄膜用溶液而獲得後,源自該溶液的溶劑會殘留。殘留溶劑量可藉由使用的溶劑、溶液濃度、薄膜的乾燥時風速、乾燥溫度、時間、乾燥室之條件(外部氣體或內部氣體循環)、塗佈時的後輥之加熱溫度等而控制。 (residual solvent amount) After the resin film for polarizing plates of this invention is obtained by coating the solution for films, the solvent derived from the said solution remains. The amount of residual solvent can be controlled by the solvent used, solution concentration, film drying wind speed, drying temperature, time, drying room conditions (external air or internal air circulation), heating temperature of the back roller during coating, etc.

如前述,藉由提高乾燥速度而膜變疏,可控制表面狀態。As mentioned above, the surface state can be controlled by increasing the drying rate to make the film thinner.

從薄膜的捲曲平衡之觀點來看,偏光板用樹脂薄膜的殘留溶劑量S1較佳為超過10ppm且未達1000ppm之範圍內。From the viewpoint of the curl balance of the film, the residual solvent amount S1 of the resin film for polarizing plates is preferably within a range of more than 10 ppm and less than 1000 ppm.

再者,從提高的薄膜捲曲平衡之觀點來看,偏光板用樹脂薄膜的殘留溶劑量較佳為超過100ppm且未達800ppm之範圍內,尤佳為500ppm以上且未達700ppm之範圍內。又,藉由選擇在支撐體亦溶劑殘存的溶劑・塗佈程序,而支撐體與偏光板用樹脂薄膜之密著性提升。支撐體的殘留溶劑量較佳為10~100ppm之範圍內。Furthermore, from the standpoint of improved film curl balance, the residual solvent content of the resin film for polarizing plates is preferably in the range of more than 100 ppm and less than 800 ppm, more preferably in the range of more than 500 ppm and less than 700 ppm. In addition, by selecting a solvent and coating procedure in which the solvent remains on the support, the adhesion between the support and the resin film for polarizing plates is improved. The residual solvent content of the support is preferably in the range of 10-100 ppm.

支撐體及偏光板用樹脂薄膜的殘留溶劑量可藉由頂空氣相層析法進行測定。於頂空氣相層析法中,將樣品封入容器內,進行加熱,於容器中充滿揮發成分之狀態下,快速地將容器中的氣體注入氣相層析儀,進行質量分析而鑑定化合物,同時將揮發成分定量。於頂空法中,藉由氣相層析儀,可觀測揮發成分的全波峰,同時藉由使用利用電磁相互作用之分析法,亦可以高精度一併進行揮發性物質或單體等之定量。The amount of residual solvents in the support body and the resin film for polarizing plates can be measured by headspace gas chromatography. In headspace gas chromatography, the sample is sealed in a container, heated, and the container is filled with volatile components, and the gas in the container is quickly injected into the gas chromatograph for mass analysis to identify the compound. Volatile components were quantified. In the headspace method, the full peaks of volatile components can be observed by gas chromatography, and at the same time, the quantitative analysis of volatile substances or monomers can also be performed with high precision by using an analysis method that utilizes electromagnetic interaction. .

冷卻部B240係將具有經乾燥部B230乾燥而得的塗膜之支撐體B110的溫度進行冷卻,調整至恰當的溫度。冷卻部B240具有冷卻室B241、冷卻風入口B242與冷卻風出口B243。冷卻風之溫度及風量係可按照塗膜的種類及支撐體B110的種類而適宜決定。又,於不設置冷卻部B240亦能成為恰當的冷卻溫度之時,也可沒有冷卻部B240。The cooling part B240 cools the temperature of the support body B110 having the coating film dried by the drying part B230, and adjusts it to an appropriate temperature. The cooling unit B240 has a cooling chamber B241, a cooling air inlet B242, and a cooling air outlet B243. The temperature and air volume of the cooling air can be appropriately determined according to the type of the coating film and the type of the support body B110. In addition, when the appropriate cooling temperature can be achieved without the cooling unit B240, the cooling unit B240 may not be provided.

捲取部B250係用於將形成有偏光板用樹脂薄膜的支撐體B110進行捲取,得到捲筒體B251之捲取裝置(未圖示)。The winding part B250 is a winding device (not shown) for winding the support body B110 formed with the resin film for polarizing plates to obtain the roll body B251.

≪3 偏光板≫ 本發明之偏光板係在樹脂薄膜上具有接著劑層及偏光子層之偏光板,作為樹脂薄膜,特徵為具備本發明之偏光板用樹脂薄膜。該樹脂薄膜係與前述保護層同義,但亦較佳為具有相位差薄膜的功能。偏光子層之兩側可被本發明之偏光板用樹脂薄膜所保護,也可其中一側使用其他習知的保護層。再者,形成偏光板用樹脂薄膜時所用的支撐體係可剝離,或也可不剝離。 ≪3 Polarizer≫ The polarizing plate of the present invention is a polarizing plate having an adhesive layer and a polarizer layer on a resin film, and the resin film is characterized by comprising the resin film for polarizing plates of the present invention. The resin film is synonymous with the aforementioned protective layer, but preferably also has the function of a retardation film. Both sides of the polarizer layer can be protected by the polarizer resin film of the present invention, or one side can be protected by other known protective layers. In addition, the support system used when forming the resin film for polarizing plates may peel off, or may not peel off.

圖2中關於本發明之偏光板的較佳層構成,顯示其一例,但不受該例所限定。In FIG. 2, although one example is shown about the preferable layer structure of the polarizing plate of this invention, it is not limited to this example.

圖2為本發明之偏光板之基本的層構成之剖面圖。 本發明之偏光板10之基本構成為將本發明之偏光板用樹脂薄膜1,透過接著劑層2貼合於偏光子層3之構成。於偏光子3之與本發明之偏光板用樹脂薄膜1側之面相反側的面上,視需要可透過接著劑層2貼合保護層4。保護層係沒有特別的限定,但可使用本發明之偏光板用樹脂薄膜,也可使用後述之相位差薄膜。 Fig. 2 is a cross-sectional view of the basic layer configuration of the polarizing plate of the present invention. The basic structure of the polarizing plate 10 of the present invention is that the polarizing plate resin film 1 of the present invention is bonded to the polarizer layer 3 through the adhesive layer 2 . On the surface of the polarizer 3 opposite to the surface of the polarizing plate resin film 1 of the present invention, a protective layer 4 can be pasted through the adhesive layer 2 if necessary. The protective layer system is not particularly limited, but the resin film for polarizing plates of the present invention can be used, and the retardation film described later can also be used.

本發明之偏光板係藉由具備本發明之偏光板用樹脂薄膜,而抑制偏光子層所含有之碘的移動。因此,抑制因半導體基板之發熱所造成的偏光子層與偏光板用樹脂薄膜之接著力降低,於具備本發明之偏光板的顯示裝置中,抑制對比變差。The polarizing plate of the present invention suppresses movement of iodine contained in the polarizing sublayer by including the resin film for polarizing plates of the present invention. Therefore, the deterioration of the adhesion between the polarizer layer and the resin film for polarizing plates due to heat generation of the semiconductor substrate is suppressed, and contrast deterioration is suppressed in a display device including the polarizing plate of the present invention.

[3.1 偏光子層] 本發明之偏光子層較佳為使用聚乙烯醇(PVA)薄膜被碘染色而成的PVA碘染色偏光子層。藉由使用該偏光子層,可期待本發明之效果。再者,所謂「偏光子」,就是指僅通過一定方向的偏振波面之光的元件。以下,關於本發明之偏光子層的較佳構成,顯示其一例,但不受該例所限定。 [3.1 Polarizer layer] The polarizer layer of the present invention is preferably a PVA iodine-dyed polarizer layer obtained by using a polyvinyl alcohol (PVA) film dyed with iodine. By using this polarizer layer, the effect of this invention can be expected. Furthermore, the so-called "polarizer" refers to an element that only passes light of a polarized wavefront in a certain direction. Hereinafter, although an example is shown about the preferable structure of the polarizer layer of this invention, it is not limited to this example.

又,本發明之偏光子層之厚度較佳為4~15μm之範圍內。藉由上述範圍內,可將偏光板薄膜化。Also, the thickness of the polarizer layer of the present invention is preferably in the range of 4-15 μm. Within the above range, the polarizing plate can be thinned.

[3.1.1 PVA碘染色偏光子層] 用於PVA碘染色偏光子層的PVA薄膜之延伸前的厚度,從薄膜保持的安定性及延伸的均質性之觀點來看,較佳為5μm~300μm,特佳為10~200μm。又,如日本特開2002-236212號中記載,可使用在水中進行4倍~6倍的延伸時發生的應力成為如10N以下之薄的PVA薄膜。 [3.1.1 PVA iodine dyed polarizer layer] The thickness of the PVA film used for the PVA iodine-dyed polarizer layer before stretching is preferably 5 μm to 300 μm, particularly preferably 10 to 200 μm, from the viewpoint of stability of the film and uniformity of stretching. Also, as described in JP-A-2002-236212, a PVA film having a stress of 10 N or less can be used when stretching 4 to 6 times in water.

PVA薄膜之延伸後的厚度較佳為3~30μm之範圍內,更佳為3~20μm之範圍內,尤佳為3~15μm之範圍內。藉由上述範圍內,可減小因環境濕度所致的液晶面板之翹曲或畸變,可改良顯示不均。The stretched thickness of the PVA film is preferably within the range of 3-30 μm, more preferably within the range of 3-20 μm, and especially preferably within the range of 3-15 μm. Within the above range, the warpage or distortion of the liquid crystal panel caused by the ambient humidity can be reduced, and the display unevenness can be improved.

作為PVA薄膜,較佳為將聚乙酸乙烯酯皂化後的聚合物材料,例如亦可含有如不飽和羧酸、不飽和磺酸、烯烴類、乙烯醚類之能與乙酸乙烯酯基共聚合的成分而無妨。又,亦可使用含有乙醯乙醯基、磺酸基、羧基、氧化烯基等之改質PVA。As the PVA film, it is preferably a polymer material after saponification of polyvinyl acetate, for example, it may also contain polyvinyl acetate copolymers such as unsaturated carboxylic acids, unsaturated sulfonic acids, olefins, and vinyl ethers. No matter the ingredients. Moreover, modified PVA containing an acetoacetyl group, a sulfonic acid group, a carboxyl group, an oxyalkylene group, etc. can also be used.

此外,可較佳地使用日本特許第3021494號公報中記載的1,2-二醇鍵結量為1.5莫耳%以下的PVA薄膜、日本特開2001-316492號公報中記載的5μm以上的光學異物係每100cm 2為500個以下的PVA薄膜、日本特開2002-030163號中記載的薄膜之TD方向的熱水切斷溫度不均為1.5℃以下的PVA薄膜、從混合有1~100質量%的甘油等之3~6價多元醇之溶液或日本特開平06-289225號公報中記載之混合有15質量%以上的可塑劑之溶液來製膜的PVA薄膜等。 In addition, a PVA film having a 1,2-diol bonding amount of 1.5 mol% or less described in Japanese Patent No. 3021494, and an optical film having a thickness of 5 μm or more described in Japanese Patent Laid-Open No. 2001-316492 can be preferably used. The PVA film whose foreign matter is 500 or less per 100 cm 2 , the PVA film whose hot water cut-off temperature variation in the TD direction of the film described in Japanese Patent Application Laid-Open No. A solution of 3-6 valent polyhydric alcohols such as glycerin or a PVA film made of a solution mixed with more than 15% by mass of a plasticizer described in Japanese Patent Application Laid-Open No. 06-289225.

被染色的碘較佳為I 3 -或I 5 -等之高階的碘離子(多碘)。高階的碘離子可如「偏光板之應用」永田良編、CMC出版或工業材料、第28卷、第7號、p.39~p.45中記載,於碘化鉀水溶液中溶解有碘之液及/或硼酸水溶液中浸漬PVA薄膜,以吸附・配向於PVA薄膜之狀態生成。 The iodine to be dyed is preferably a high-order iodide ion such as I 3 - or I 5 - (polyiodide). High-order iodide ions can be as recorded in "Application of Polarizing Plates" Nagata Ryo, CMC Publishing or Industrial Materials, Vol. / Or immerse the PVA film in the boric acid aqueous solution to form in the state of adsorption and alignment on the PVA film.

相對於偏光子層的總質量,碘之含量較佳為1.8~5.0質量%之範圍內,更佳為2.0~4.0質量%之範圍內。藉由上述範圍內,得到所欲的穿透率之偏光板,可得到正面方向的對比高之液晶顯示裝置。Relative to the total mass of the polarizer layer, the content of iodine is preferably within the range of 1.8-5.0% by mass, more preferably within the range of 2.0-4.0% by mass. By obtaining a polarizing plate with a desired transmittance within the above range, a liquid crystal display device with high contrast in the front direction can be obtained.

偏光子層較佳為含有硼酸作為交聯劑。藉由硼酸進行交聯,由碘與PVA所形成的錯合物之安定性提升,可抑制高溫高濕條件下的偏光性能變差。The polarizer layer preferably contains boric acid as a crosslinking agent. By cross-linking with boric acid, the stability of the complex formed by iodine and PVA is improved, which can inhibit the deterioration of the polarizing performance under high temperature and high humidity conditions.

硼酸之含量係以硼換算,相對於偏光子層之總質量,較佳為0.5~3.0質量%之範圍內,更佳為1.0~2.8質量%之範圍內,尤佳為1.5~2.6質量%之範圍內。The content of boric acid is calculated as boron, and relative to the total mass of the polarizer layer, it is preferably within the range of 0.5-3.0% by mass, more preferably within the range of 1.0-2.8% by mass, and most preferably within the range of 1.5-2.6% by mass. within range.

偏光子層係二色比DR較佳為160以上,更佳為160~220之範圍內,尤佳為170~210之範圍內,特佳為175~185之範圍內。藉由上述範圍內,得到具備本發明之偏光板的正面對比高之液晶面板及液晶顯示裝置。如此的液晶面板及液晶顯示裝置例如適合電視用途。尚且,二色比DR係由下述式求得。 二色比DR=log(0.919/k2)/log(0.919/k1) 此處,k1為偏光子層的穿透軸方向之穿透率,k2為偏光子層的吸收軸方向之穿透率,常數0.919為界面反射率。 The dichroic ratio DR of the polarizer layer is preferably above 160, more preferably within the range of 160-220, especially preferably within the range of 170-210, and particularly preferably within the range of 175-185. Within the above range, a liquid crystal panel and a liquid crystal display device having a high front contrast and having a polarizing plate of the present invention are obtained. Such a liquid crystal panel and a liquid crystal display device are suitable for television use, for example. In addition, the dichromatic ratio DR is calculated|required by the following formula. Two-color ratio DR=log(0.919/k2)/log(0.919/k1) Here, k1 is the transmittance in the direction of the transmission axis of the polarizer layer, k2 is the transmittance in the direction of the absorption axis of the polarizer layer, and the constant 0.919 is the interface reflectance.

偏光子層係穿透率(單質穿透率)Ts較佳為42%以上,更佳為42.0~44.0%之範圍內,尤佳為42.5~43.0%之範圍內。藉由上述範圍內,得到具備本發明之偏光板的亮度高之液晶面板或液晶顯示裝置。如此的液晶面板及液晶顯示裝置例如適合電視用途。尚且,偏光板之穿透率可由以下式求得。 穿透率(%)={(k1+k2)/2}×100 此處,k1為偏光子層的穿透軸方向之穿透率,k2為偏光子層的吸收軸方向之穿透率。 The transmittance (single substance transmittance) Ts of the polarizer layer is preferably at least 42%, more preferably in the range of 42.0-44.0%, and most preferably in the range of 42.5-43.0%. Within the above range, a high-brightness liquid crystal panel or liquid crystal display device including the polarizing plate of the present invention can be obtained. Such a liquid crystal panel and a liquid crystal display device are suitable for television use, for example. Also, the transmittance of the polarizing plate can be obtained from the following formula. Penetration rate (%)={(k1+k2)/2}×100 Here, k1 is the transmittance in the direction of the transmission axis of the polarizer layer, and k2 is the transmittance in the direction of the absorption axis of the polarizer layer.

偏光子層的穿透軸方向之線膨脹係數係沒有特別的限制,較佳為4.0×10 -5~5.0×10 -5/℃之範圍內。 The linear expansion coefficient of the polarizer layer in the direction of the transmission axis is not particularly limited, and is preferably in the range of 4.0×10 -5 ~5.0×10 -5 /°C.

[製造方法] 本發明所用的PVA碘染色偏光子層之製造方法係沒有特別的限制,但例如較佳為將上述PVA薄膜化後,導入碘而製作。PVA薄膜可參照日本特開2007-86748號公報的段落0213~0237、日本特許第3342516號公報、日本特開平09-328593號公報、日本特開2001-302817號公報、日本特開2002-144401號公報等中記載之方法來製造。 [Manufacturing method] The manufacturing method of the PVA iodine-dyed polarizer layer used in the present invention is not particularly limited, but for example, it is preferably manufactured by introducing iodine into the PVA after thinning the above-mentioned PVA. The PVA film can refer to paragraphs 0213~0237 of Japanese Patent Application Publication No. 2007-86748, Japanese Patent Application Publication No. 3342516, Japanese Patent Application Publication No. 09-328593, Japanese Patent Application Publication No. 2001-302817, and Japanese Patent Application Publication No. 2002-144401. Manufactured by the method described in the gazette, etc.

作為PVA碘染色偏光子層之製造方法,例如較佳為依序進行PVA溶液的調製步驟、流延步驟、膨潤步驟、染色步驟、硬膜步驟、延伸步驟、乾燥步驟之方法。又,於上述行程中或後,亦可設置線上面狀檢查步驟。As a method for producing the PVA iodine-dyed polarizing layer, for example, a method of sequentially performing a preparation step of a PVA solution, a casting step, a swelling step, a dyeing step, a dura mater step, an extending step, and a drying step is preferable. In addition, during or after the above-mentioned journey, a step of checking the shape on the line can also be provided.

(PVA溶液之調製) 於PVA溶液之調製步驟中,較佳為調製在水或有機溶劑中溶解有PVA之原液。原液中的PVA之濃度較佳為5~20質量%之範圍內。例如,較佳為將PVA的濕餅置入溶解槽中,視需要添加可塑劑、水,邊從槽底吹入水蒸氣邊攪拌之方法。內部樹脂溫度較佳為加溫至50~150℃之範圍內,亦可將系內加壓。 (Preparation of PVA solution) In the step of preparing the PVA solution, it is preferable to prepare a stock solution in which PVA is dissolved in water or an organic solvent. The concentration of PVA in the stock solution is preferably in the range of 5-20% by mass. For example, it is preferable to put the wet cake of PVA into the dissolving tank, add plasticizer and water if necessary, and stir while blowing water vapor from the bottom of the tank. The internal resin temperature is preferably heated to a range of 50~150°C, and the system can also be pressurized.

(流延) 流延步驟較佳為使用將上述調製的PVA溶液原液進行流延而成膜之方法。作為流延之方法,並無特別的限制,但較佳為將經加熱的PVA溶液原液供給至雙軸擠壓機,藉由齒輪泵從排出手段(較佳為模頭,更佳為T型縫模)流延到支撐體上而進行製膜。又,從模頭排出的PVA溶液之溫度係沒有特別的限制。 作為上述支撐體,較佳為澆鑄滾筒,滾筒之直徑、寬度、旋轉速度及表面溫度係沒有特別的限制。 然後,較佳為使所得之輥的背面與表面交替地通過乾燥輥,同時進行乾燥。 (casting) The casting step is preferably a method of casting the PVA solution prepared above to form a film. As the method of casting, there is no special limitation, but it is preferred to supply the heated PVA solution stock solution to the twin-screw extruder, and discharge it from the discharge means (preferably a die head, more preferably T-shaped) by a gear pump. slot die) onto a support to form a film. Also, the temperature of the PVA solution discharged from the die is not particularly limited. As the above-mentioned support body, a casting drum is preferred, and the diameter, width, rotation speed and surface temperature of the drum are not particularly limited. Then, drying is preferably carried out while passing the back surface and the surface of the obtained roll alternately through drying rolls.

(膨潤) 膨潤步驟較佳為僅以水進行,但如日本特開平10-153709號公報中記載,為了光學性能的安定化及避免生產線的PVA薄膜的皺紋發生,亦可藉由硼酸水溶液使PVA薄膜膨潤,管理PVA薄膜的膨潤度。 又,膨潤步驟的溫度及時間可任意地規定,但較佳為10~60℃之範圍內及5~2000秒之範圍內。 尚且,於膨潤步驟時亦可稍微地進行延伸,例如較佳為延伸至1.3倍左右。 (swelling) The swelling step is preferably carried out only with water, but as described in Japanese Patent Application Laid-Open No. 10-153709, in order to stabilize the optical properties and avoid wrinkles of the PVA film in the production line, the PVA film can also be swollen by boric acid aqueous solution, Manage swelling of PVA film. Also, the temperature and time of the swelling step can be specified arbitrarily, but are preferably within the range of 10-60°C and within the range of 5-2000 seconds. Furthermore, it is also possible to slightly extend during the swelling step, for example, it is preferable to extend to about 1.3 times.

(染色) 染色步驟可使用日本特開2002-86554號公報中記載之方法。又,作為染色方法,不僅是浸漬,而且可為碘之塗佈或噴霧等任意的手段。另外,如日本特開2001-296427號公報中記載,將碘之濃度、染色浴溫度及浴中之延伸倍率設定在適當值,邊攪拌浴中的浴液邊染色,可得到具備該偏光子層的高透光率及高偏光率之偏光板。 (dyeing) For the dyeing step, the method described in JP 2002-86554 A can be used. In addition, as a dyeing method, not only immersion, but also arbitrary means such as application or spraying of iodine may be used. In addition, as described in Japanese Patent Application Laid-Open No. 2001-296427, the concentration of iodine, the temperature of the dyeing bath, and the stretching ratio in the bath are set at appropriate values, and the bath liquid in the bath is dyed while stirring, so that the polarizer layer can be obtained. Polarizing plate with high light transmittance and high polarizing rate.

使用高階的碘離子時,為了得到高對比的偏光板,染色步驟較佳為使用在碘化鉀水溶液中溶解有碘之液。此時的碘-碘化鉀水溶液之碘與碘化鉀之質量比,可使用日本特開2007-086748號公報中記載之形態。 又,如日本特許第3145747號公報中記載,亦可於染色液中添加硼酸、硼砂等之硼系化合物。 When high-order iodide ions are used, in order to obtain a high-contrast polarizing plate, the dyeing step preferably uses a solution in which iodine is dissolved in an aqueous potassium iodide solution. In this case, the mass ratio of iodine to potassium iodide in the iodine-potassium iodide aqueous solution can use the form described in JP-A-2007-086748. Also, as described in Japanese Patent No. 3145747, boron compounds such as boric acid and borax may be added to the dyeing solution.

(硬膜) 硬膜步驟較佳為在交聯劑溶液中浸漬或塗佈溶液,使其含有交聯劑。又,如日本特開平11-52130號公報中記載,亦可將硬膜步驟分成數次。 (dural) In the hard coat step, it is preferable to immerse or coat the solution in a crosslinking agent solution so as to contain the crosslinking agent. Also, as described in JP-A-11-52130, the dura mater step may be divided into several times.

作為交聯劑,可使用美國再發行特許第232897號說明書中記載者,又如日本特許第3357109號說明書中記載,為了提高尺寸安定性,亦可使用多價醛,但較宜使用硼酸類。使用硼酸作為用於硬膜步驟的交聯劑時,可於硼酸-碘化鉀水溶液中添加金屬離子。作為金屬離子,較佳為氯化鋅,如日本特開2000-35512號公報中記載,代替氯化鋅,亦可使用碘化鋅等之鹵化鋅、硫酸鋅、乙酸鋅等之鋅鹽。As the crosslinking agent, those described in US Reissued Patent No. 232897 can be used, and as described in Japanese Patent No. 3357109, in order to improve dimensional stability, polyvalent aldehydes can also be used, but boric acids are preferably used. When boric acid is used as the cross-linking agent for the hard coating step, metal ions can be added to the boric acid-potassium iodide aqueous solution. As the metal ion, zinc chloride is preferable, and as described in JP-A-2000-35512, instead of zinc chloride, zinc halides such as zinc iodide, zinc sulfate, zinc acetate and other zinc salts can also be used.

又,亦可製作加有氯化鋅的硼酸-碘化鉀水溶液,浸漬PVA薄膜而進行硬膜化,可使用日本特開2007-086748號公報中記載之方法。In addition, it is also possible to prepare a boric acid-potassium iodide aqueous solution containing zinc chloride, and dip a PVA film to form a hard film, and the method described in JP 2007-086748 A can be used.

尚且,此處作為提高高溫環境下的耐久性之方法,可進行眾所周知的酸性溶液之浸漬處理。作為酸性溶液之處理,可舉出日本特開2001-83329號公報、日本特開平6-254958號公報、國際公開WO2006/095815號公報等中記載之方法。In addition, here, as a method of improving durability in a high-temperature environment, a well-known dipping treatment in an acidic solution may be performed. Examples of the treatment of the acidic solution include methods described in JP-A-2001-83329, JP-A-6-254958, and International Publication WO2006/095815.

(延伸) 延伸步驟可較宜使用如美國特許2,454,515號說明書等中記載的縱單軸延伸方式或如日本特開2002-86554號公報中記載的拉幅方式。較佳的延伸倍率為2~12倍之範圍內,更佳為3~10倍之範圍內。 (extend) For the stretching step, the longitudinal uniaxial stretching method described in US Patent No. 2,454,515 or the tenter method described in Japanese Patent Application Laid-Open No. 2002-86554 can be preferably used. The preferred extension ratio is in the range of 2-12 times, more preferably in the range of 3-10 times.

又,以延伸倍率、原材厚度與偏光子層的厚度之關係為日本特開2002-040256號公報中記載之(保護膜貼合後的偏光子膜厚/原材膜厚)×(總延伸倍率)>0.17,離開最終浴時的偏光子層之寬度與保護膜貼合時的偏光子層之寬度之關係為日本特開2002-040247號公報中記載的0.80≦(保護膜貼合時的偏光子層之寬度/離開最終浴時的偏光子之寬度)≦0.95,亦可較佳地進行。尚且,此處所謂的保護膜係與本發明中的保護層同義。In addition, the relationship between the elongation ratio, the thickness of the original material and the thickness of the polarizer layer is as described in Japanese Patent Application Laid-Open No. 2002-040256 (the thickness of the polarizer film after the protective film is pasted/the thickness of the original material) × (total elongation magnification) > 0.17, the relationship between the width of the polarizer layer when leaving the final bath and the width of the polarizer layer when the protective film is pasted is 0.80≦(when the protective film is pasted The width of the polarizer layer/the width of the polarizer when leaving the final bath)≦0.95 can also be carried out better. Also, the so-called protective film here is synonymous with the protective layer in the present invention.

(乾燥) 乾燥步驟可使用日本特開2002-86554號公報中記載之眾所周知的方法,但較佳的溫度為30~100℃之範圍內,較佳的乾燥時間為30秒~60分鐘之範圍內。又,較佳為如日本特許第3148513號公報中記載,進行如水中褪色溫度為50℃以上之熱處理,或如日本特開平07-325215號公報或日本特開平07-325218號公報中記載,在經溫濕度管理的環境下熟化。 (dry) For the drying step, a well-known method described in JP-A-2002-86554 can be used, but the preferred temperature is within the range of 30 to 100° C., and the preferred drying time is within the range of 30 seconds to 60 minutes. Also, it is preferable to carry out a heat treatment such as a temperature of 50° C. or higher for discoloration in water as described in Japanese Patent No. 3148513, or as described in Japanese Patent Application Publication No. 07-325215 or Japanese Patent Application Publication No. 07-325218. Aged in a temperature and humidity controlled environment.

藉由上述步驟,較佳為以偏光子層之厚度成為4~15μm之範圍內的方式進行製造。尚且,厚度可用眾所周知之方法進行控制,例如可將上述流延步驟中的模縫寬度或延伸條件設定在適當值而控制。Through the above-mentioned steps, it is preferable to manufacture so that the thickness of the polarizer layer may be in the range of 4 to 15 μm. Furthermore, the thickness can be controlled by a well-known method, for example, by setting the slit width or stretching conditions in the above-mentioned casting step to appropriate values.

[3.2 接著劑層] 本發明之偏光板係在上述所得之偏光子層的兩側,透過接著劑層貼合保護層而得。偏光子層的兩側可被本發明之偏光板用樹脂薄膜所保護,也可其中一側使用其他習知的保護層。 [3.2 Adhesive layer] The polarizing plate of the present invention is obtained by laminating protective layers on both sides of the obtained polarizer layer through an adhesive layer. Both sides of the polarizer layer can be protected by the polarizer resin film of the present invention, and one side can also be protected by other known protective layers.

本發明之接著劑層係藉由接著劑形成。作為接著劑,例如可舉出異氰酸酯系接著劑、聚乙烯醇系接著劑、明膠系接著劑、乙烯系乳膠系、水系聚酯等。此等接著劑通常作為由水溶液所成的接著劑(水系接著劑)使用,水溶液中的接著劑之固體成分濃度較佳為0.5~60質量%之範圍內。於此等之中,較佳為聚乙烯醇系接著劑,更佳為含有乙醯乙醯基的聚乙烯醇系接著劑。The adhesive layer of the present invention is formed by an adhesive. As an adhesive agent, an isocyanate type adhesive agent, a polyvinyl alcohol type adhesive agent, a gelatin type adhesive agent, vinyl latex type, water-type polyester etc. are mentioned, for example. These adhesives are usually used as adhesives (water-based adhesives) formed from aqueous solutions, and the solid content concentration of the adhesives in the aqueous solution is preferably in the range of 0.5 to 60% by mass. Among them, a polyvinyl alcohol-based adhesive is preferable, and an acetoacetyl group-containing polyvinyl alcohol-based adhesive is more preferable.

水系接著劑可含有交聯劑。作為交聯劑,通常使用在1分子中具有至少2個與構成接著劑的聚合物等之成分有反應性的官能基之化合物,例如,可舉出烷二胺類;異氰酸酯類;環氧類;醛類;羥甲基脲、羥甲基三聚氰胺等之胺基-甲醛等。接著劑中的交聯劑之含量,相對於構成接著劑的聚合物等之成分,較佳為10~60質量%之範圍內。The water-based adhesive may contain a crosslinking agent. As a crosslinking agent, a compound having at least two functional groups reactive with components such as a polymer constituting the adhesive in one molecule is usually used, for example, alkyl diamines; isocyanates; epoxy ; Aldehydes; methylol urea, methylol melamine and other amino-formaldehyde. The content of the crosslinking agent in the adhesive is preferably within a range of 10 to 60% by mass relative to the components such as the polymer constituting the adhesive.

作為接著劑,除了上述之外,還可舉出紫外線硬化型接著劑、電子線硬化型接著劑等之活性能量線硬化型接著劑。作為前述活性能量線硬化型接著劑,例如可舉出(甲基)丙烯酸酯系接著劑。作為前述(甲基)丙烯酸酯系接著劑中的硬化性成分,例如可舉出具有(甲基)丙烯醯基的化合物、具有乙烯基的化合物。作為具有(甲基)丙烯醯基的化合物,例如可舉出碳數為1~20的(甲基)丙烯酸鏈狀烷酯、(甲基)丙烯酸脂環式烷酯、(甲基)丙烯酸多環式烷酯等之(甲基)丙烯酸烷酯;含有羥基的(甲基)丙烯酸酯;(甲基)丙烯酸環氧丙酯等之含有環氧基的(甲基)丙烯酸酯等。(甲基)丙烯酸酯系接著劑可包含羥乙基(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺、N-甲氧基甲基(甲基)丙烯醯胺、N-乙氧基甲基(甲基)丙烯醯胺、(甲基)丙烯醯胺、(甲基)丙烯醯基嗎啉等之含氮單體。(甲基)丙烯酸酯系接著劑可包含三丙二醇二丙烯酸酯、1,9-壬二醇二丙烯酸酯、三環癸烷二甲醇二丙烯酸酯、環狀三羥甲基丙烷縮甲醛丙烯酸酯、二㗁烷二醇二丙烯酸酯、EO改質二甘油四丙烯酸酯等之多官能單體作為交聯成分。又,作為陽離子聚合硬化型接著劑,亦可使用具有環氧基或氧雜環丁烷基的化合物。具有環氧基的化合物,只要是在分子內具有至少2個環氧基者,則沒有特別的限定,可使用一般已知的各種硬化性環氧化合物。Examples of the adhesive include active energy ray-curable adhesives such as ultraviolet-curable adhesives and electron beam-curable adhesives, in addition to the above. As said active energy ray hardening type adhesive agent, a (meth)acrylate type adhesive agent is mentioned, for example. As a curable component in the said (meth)acrylate adhesive agent, the compound which has a (meth)acryl group, the compound which has a vinyl group is mentioned, for example. Examples of compounds having a (meth)acryl group include chain alkyl (meth)acrylates having 1 to 20 carbon atoms, alicyclic alkyl (meth)acrylates, poly(meth)acrylates, etc. Alkyl (meth)acrylates such as cyclic alkyl esters; hydroxyl-containing (meth)acrylates; epoxy-group-containing (meth)acrylates such as glycidyl (meth)acrylate, etc. (Meth) acrylate-based adhesives can include hydroxyethyl (meth) acrylamide, N-methylol (meth) acrylamide, N-methoxymethyl (meth) acrylamide, Nitrogen-containing monomers such as N-ethoxymethyl(meth)acrylamide, (meth)acrylamide, (meth)acrylylmorpholine, etc. (Meth)acrylate adhesives can include tripropylene glycol diacrylate, 1,9-nonanediol diacrylate, tricyclodecane dimethanol diacrylate, cyclic trimethylolpropane formal acrylate, Dioxanediol diacrylate, EO modified diglycerol tetraacrylate and other multifunctional monomers are used as crosslinking components. Moreover, the compound which has an epoxy group or an oxetanyl group can also be used as a cationic polymerization hardening type adhesive agent. The compound having an epoxy group is not particularly limited as long as it has at least two epoxy groups in the molecule, and various generally known curable epoxy compounds can be used.

上述接著劑係視需要可包含適宜的添加劑。作為添加劑,例如可舉出矽烷偶合劑、鈦偶合劑等之偶合劑、環氧乙烷等之接著促進劑、紫外線吸收劑、防劣化劑、染料、加工助劑、離子捕捉劑、抗氧化劑、增黏劑、填充劑、可塑劑、調平劑、發泡抑制劑、抗靜電劑、耐熱安定劑、耐水解安定劑等。The above-mentioned adhesive system may contain appropriate additives as necessary. Examples of additives include coupling agents such as silane coupling agents and titanium coupling agents, adhesion promoters such as ethylene oxide, ultraviolet absorbers, anti-deterioration agents, dyes, processing aids, ion scavengers, antioxidants, Tackifier, filler, plasticizer, leveling agent, foam inhibitor, antistatic agent, heat-resistant stabilizer, hydrolysis-resistant stabilizer, etc.

接著劑之塗佈係可在保護層側或偏光子層側之任一者進行,也可在兩者進行。於貼合後,施予乾燥步驟,形成由塗佈乾燥層所成之接著劑層。於接著劑乾燥步驟之後,視需要可照射紫外線或電子線。The application of the adhesive agent may be performed on either the protective layer side or the polarizer layer side, or both. After bonding, a drying step is applied to form an adhesive layer formed by coating a dry layer. After the adhesive drying step, ultraviolet rays or electron rays may be irradiated if necessary.

保護層與偏光子層之貼合方式,較佳為以偏光子層的穿透軸與保護層的慢軸成為實質上平行之方式貼合。 此處,所謂實質上平行,就是指於保護層的主折射率n x之方向與偏光子層的穿透軸之方向中,其偏移為5°以內。偏移較佳為1°以內,更佳為0.5°以內。只要偏移為1°以內,則偏光板正交尼科耳下的偏光性能不易降低,不易發生漏光。 The bonding method of the protective layer and the polarizer layer is preferably such that the transmission axis of the polarizer layer is substantially parallel to the slow axis of the protective layer. Here, the term “substantially parallel” means that the deviation between the direction of the main refractive index n x of the protective layer and the direction of the transmission axis of the polarizer layer is within 5°. The offset is preferably within 1°, more preferably within 0.5°. As long as the deviation is within 1°, the polarizing performance of the polarizing plate under crossed Nicols is unlikely to decrease, and light leakage is unlikely to occur.

本發明之接著劑層之厚度係沒有特別的限制,但於使用水系接著劑等之情況中,較佳為30~5000nm之範圍內,更佳為100~1000nm之範圍內。使用紫外線硬化型接著劑、電子線硬化型接著劑等時,較佳為0.1~100μm之範圍內,更佳為0.5~10μm之範圍內。The thickness of the adhesive layer of the present invention is not particularly limited, but in the case of using a water-based adhesive or the like, it is preferably in the range of 30 to 5000 nm, more preferably in the range of 100 to 1000 nm. When using ultraviolet curable adhesives, electron beam curable adhesives, etc., it is preferably in the range of 0.1 to 100 μm, more preferably in the range of 0.5 to 10 μm.

[3.3 保護層] 作為圖2所示的保護層4,除了可適宜使用本發明之偏光板用樹脂薄膜之外,還可使用習知的保護層,可使用纖維素醯化物薄膜、聚酯薄膜(例如聚對苯二甲酸乙二酯薄膜等)、環烯烴系樹脂薄膜、丙烯酸系樹脂薄膜等。 [3.3 Protection layer] As the protective layer 4 shown in Figure 2, in addition to the resin film for polarizing plates of the present invention can be used suitably, a known protective layer can be used, such as cellulose acylate film, polyester film (such as polyparaphenylene Diformic acid ethylene glycol film, etc.), cycloolefin resin film, acrylic resin film, etc.

作為纖維素醯化物薄膜之市售品,例如可舉出Konica Minolta Advanced Layer股份有限公司製的Konica Minolta TAC KC8UX、KC5UX、KC4UX、KC8UCR3、KC4SR、KC4BR、KC4CR、KC4DR、KC4FR、KC4KR、KC8UY、KC6UY、KC4UY、KC4UE、KC8UE、KC8UY-HA、KC2UA、KC4UA、KC6UA、KC2UAH、KC4UAH、KC6UAH等。Examples of commercially available cellulose acylate films include Konica Minolta TAC KC8UX, KC5UX, KC4UX, KC8UCR3, KC4SR, KC4BR, KC4CR, KC4DR, KC4FR, KC4KR, KC8UY, and KC6UY manufactured by Konica Minolta Advanced Layer Co., Ltd. , KC4UY, KC4UE, KC8UE, KC8UY-HA, KC2UA, KC4UA, KC6UA, KC2UAH, KC4UAH, KC6UAH, etc.

保護層之厚度係沒有特別的限定,但較佳為1~100μm之範圍內,更佳為3~40μm之範圍內,尤佳為5~20μm之範圍內。The thickness of the protective layer is not particularly limited, but is preferably within the range of 1-100 μm, more preferably within the range of 3-40 μm, and most preferably within the range of 5-20 μm.

≪4 顯示裝置≫ 本發明之顯示裝置係藉由具備本發明之偏光板,而抑制對比變差。 ≪4 Display device≫ The display device of the present invention suppresses contrast deterioration by including the polarizing plate of the present invention.

本發明之顯示裝置例如係藉由透過接著劑層或黏著劑層,將本發明之偏光板貼合於顯示裝置之表面而獲得。所謂顯示裝置,就是具有顯示機構的裝置,包含發光元件或發光裝置作為發光源。The display device of the present invention is obtained, for example, by attaching the polarizing plate of the present invention to the surface of the display device through an adhesive layer or an adhesive layer. The so-called display device refers to a device with a display mechanism, including a light emitting element or a light emitting device as a light source.

作為顯示裝置,可舉出液晶顯示裝置、有機電致發光(EL)顯示裝置、無機電致發光(EL)顯示裝置、觸控面板顯示裝置、電子發射顯示裝置(電場發射顯示裝置(FED等)、表面電場發射顯示裝置(SED))、電子紙(使用電子油墨或電泳動元件之顯示裝置)、電漿顯示裝置、投射型顯示裝置(具有閘光閥(GLV)顯示裝置、數位微鏡裝置(DMD)之顯示裝置等)及壓電陶瓷顯示器等。Examples of display devices include liquid crystal display devices, organic electroluminescence (EL) display devices, inorganic electroluminescence (EL) display devices, touch panel display devices, electron emission display devices (field emission display devices (FED, etc.) , surface electric field emission display device (SED)), electronic paper (display device using electronic ink or electrophoretic moving element), plasma display device, projection display device (display device with gate light valve (GLV), digital micromirror device (DMD) display devices, etc.) and piezoelectric ceramic displays, etc.

上述液晶顯示裝置包含穿透型液晶顯示裝置、半穿透型液晶顯示裝置、反射型液晶顯示裝置、直視型液晶顯示裝置及投射型液晶顯示裝置等之任一者。此等顯示裝置可為顯示2次元影像的顯示裝置,也可為顯示3次元影像的立體顯示裝置。特別地,作為本發明之顯示裝置,較佳為有機EL顯示裝置及觸控面板顯示裝置,特佳為有機EL顯示裝置。 [實施例] The above-mentioned liquid crystal display device includes any one of a transmissive liquid crystal display device, a semi-transmissive liquid crystal display device, a reflective liquid crystal display device, a direct-view liquid crystal display device, and a projection type liquid crystal display device. These display devices may be display devices that display 2D images, or may be stereoscopic display devices that display 3D images. In particular, as the display device of the present invention, an organic EL display device and a touch panel display device are preferable, and an organic EL display device is particularly preferable. [Example]

以下,舉出實施例來具體地說明本發明,惟本發明不受此等所限定。再者,實施例中使用「份」或「%」之表示,只要沒有特別預先指明,則各別表示「質量份」或「質量%」。Hereinafter, although an Example is given and this invention is demonstrated concretely, this invention is not limited to these. In addition, the expression of "part" or "%" is used in an Example, and unless otherwise specified, it represents "part by mass" or "% by mass", respectively.

實施例1 [1]偏光板用樹脂薄膜之製作 Example 1 [1] Manufacture of resin film for polarizing plate

<偏光板用樹脂薄膜1之製作> (支撐體) 作為支撐體,使用聚對苯二甲酸乙二酯薄膜(PET薄膜):(東洋紡公司製TN100,含有非聚矽氧系剝離劑的脫模層,膜厚38μm)。 <Preparation of resin film 1 for polarizing plate> (support body) As a support, a polyethylene terephthalate film (PET film): (TN100 manufactured by Toyobo Co., Ltd., release layer containing a non-silicone release agent, film thickness 38 μm) was used.

(偏光板用樹脂薄膜1用溶液之調製) 混合下述成分,得到偏光板用樹脂薄膜1用溶液。 二氯甲烷(沸點41℃)                     860質量份 甲醇(沸點65℃)                           40質量份 COP(ARTON(註冊商標)G7810:JSR(股)製,Mw:14萬,具有羧酸基的環烯烴系樹脂) 100質量份 金屬氧化物粒子:Al 2O 3(SA43A:日本輕金屬股份有限公司製)                                          20質量份 抗氧化劑(Irganox(註冊商標)1076:BASF公司製:分子量531) 添加以偏光板用樹脂薄膜中成為0.002質量%之添加量 尚且,金屬氧化物係投入至二氯甲烷與甲醇的混合溶劑(50:50)中,實施3次的曼頓高林(Manton Gaulin)均質機之分散處理。然後,於投入有二氯甲烷的溶解釜投入並攪拌,進一步將樹脂投入並攪拌,得到偏光板用樹脂薄膜1用溶液。 (Preparation of solution for resin film 1 for polarizing plates) The following components were mixed to obtain a solution for resin film 1 for polarizing plates. Dichloromethane (boiling point: 41°C) 860 parts by mass Methanol (boiling point: 65°C) 40 parts by mass 100 parts by mass of metal oxide particles: Al 2 O 3 (SA43A: manufactured by Nippon Light Metal Co., Ltd.) 20 parts by mass of antioxidant (Irganox (registered trademark) 1076: manufactured by BASF Corporation: molecular weight 531) added to the resin film for polarizing plates When the addition amount was 0.002% by mass, the metal oxide was put into a mixed solvent (50:50) of methylene chloride and methanol, and the dispersion treatment with a Manton Gaulin homogenizer was performed three times. Then, it was charged into a dissolution tank into which dichloromethane was charged and stirred, and the resin was further charged and stirred to obtain a solution for a resin film 1 for a polarizing plate.

(偏光板用樹脂薄膜1之製作) 於上述支撐體之脫模層上,藉由背塗法,使用模頭塗佈偏光板用樹脂薄膜1用溶液後,進行下述之乾燥步驟而形成厚度6μm的偏光板用樹脂薄膜,得到偏光板用樹脂薄膜1。 第1步驟:40℃下1分鐘 第2步驟:70℃下1分鐘 第3步驟:100℃下1分鐘 第4步驟:130℃下2分鐘 (Production of resin film 1 for polarizing plate) On the release layer of the above-mentioned support body, the solution for resin film 1 for polarizing plates was coated with a die head by the back coating method, and then the following drying process was performed to form a resin film for polarizing plates with a thickness of 6 μm to obtain polarized light. Resin film 1 for board. Step 1: 1 minute at 40°C Step 2: 1 minute at 70°C Step 3: 1 minute at 100°C Step 4: 2 minutes at 130°C

所製作的偏光板用樹脂薄膜之厚度係使用F20-UV(FILMETRICS公司製)作為膜厚測定系統,進行計測。The thickness of the prepared resin film for polarizing plates was measured using F20-UV (manufactured by FILMETRICS) as a film thickness measuring system.

又,薄膜之熱傳導度係夾於TO-3型加熱箱與銅板之間,壓縮薄膜之厚度的10%。接著,對於銅製加熱箱施加電力5W,保持4分鐘,測定銅製加熱箱與銅板之溫度差。熱傳導度係藉由下述式算出。 熱傳導度{W/m・K}={電力(W)×厚度(m)}/{溫度差(K)×測定面積(m 2)} Also, the thermal conductivity of the film is sandwiched between the TO-3 type heating box and the copper plate, compressing 10% of the thickness of the film. Next, 5W of electric power was applied to the copper heating box and kept for 4 minutes, and the temperature difference between the copper heating box and the copper plate was measured. The thermal conductivity was calculated by the following formula. Thermal conductivity {W/m・K}={power (W)×thickness (m)}/{temperature difference (K)×measurement area (m 2 )}

金屬氧化物粒子之平均二次粒徑/平均一次粒徑所示的平均一次粒徑與平均二次粒徑之比之值(粒徑比),係使用以下方法所求出的平均粒徑進行算出。 於藉由超薄切片法所調製的試料中,以穿透型電子顯微鏡(日立製H-7100FA型)觀察一次粒子(或二次粒子),將假定與其投影面積相等的圓時之直徑(所謂圓等效直徑)當作一次粒徑(或二次粒徑)。然後,將如此所得之1000個的一次粒子(或二次粒子)之粒徑進行平均,將其平均值當作平均一次粒徑(或平均二次粒徑)。 The value of the ratio of the average primary particle diameter to the average secondary particle diameter (particle diameter ratio) shown by the average secondary particle diameter/average primary particle diameter of metal oxide particles is calculated using the average particle diameter obtained by the following method figured out. In the sample prepared by the ultrathin section method, observe the primary particle (or secondary particle) with a transmission electron microscope (H-7100FA manufactured by Hitachi), and assume the diameter of a circle equal to the projected area (the so-called circle equivalent diameter) as the primary particle size (or secondary particle size). Then, the particle diameters of 1000 primary particles (or secondary particles) obtained in this way were averaged, and the average value was regarded as the average primary particle diameter (or average secondary particle diameter).

<偏光板用樹脂薄膜2、12及13之製作> 除了將金屬氧化物粒子分別變更為表I中記載的ZnO(FINEX(註冊商標)50:堺化學工業股份有限公司製)、CuO(FCO500:古川化學品股份有限公司製)及TiO 2(STR(註冊商標)100N:堺化學工業股份有限公司製)以外,與偏光板用樹脂薄膜1之製作同樣地,製作偏光板用樹脂薄膜2、12及13。 <Preparation of resin films 2, 12, and 13 for polarizing plates> Except that the metal oxide particles were changed to ZnO (FINEX (registered trademark) 50: manufactured by Sakai Chemical Industry Co., Ltd.), CuO (FCO500: Except for Furukawa Chemical Co., Ltd.) and TiO 2 (STR (registered trademark) 100N: Sakai Chemical Industry Co., Ltd.), the resin films 2 and 12 for polarizing plates were produced in the same manner as the resin film 1 for polarizing plates. and 13.

<偏光板用樹脂薄膜3之製作> 除了將偏光板用樹脂薄膜用溶液變更為以下以外,與偏光板用樹脂薄膜1之製作同樣地,製作偏光板用樹脂薄膜3。 <Preparation of resin film 3 for polarizing plate> Except having changed the solution for the resin film for polarizing plates into the following, it carried out similarly to preparation of the resin film 1 for polarizing plates, and produced the resin film 3 for polarizing plates.

(橡膠粒子R1之調製) 使用經以下方法所調製的橡膠粒子R1。 於附有攪拌機的8L聚合裝置中,加入以下之物質。 去離子水                              180質量份 聚氧乙烯月桂基醚磷酸            0.002質量份 硼酸                                    0.473質量份 碳酸鈉                                 0.047質量份 氫氧化鈉                              0.008質量份 (modulation of rubber particles R1) Rubber particles R1 prepared by the following method were used. In the 8L polymerization device with agitator, add the following substances. Deionized water 180 parts by mass Polyoxyethylene lauryl ether phosphoric acid 0.002 parts by mass Boric acid 0.473 parts by mass Sodium carbonate 0.047 parts by mass Sodium hydroxide 0.008 parts by mass

以氮氣充分置換聚合機內之後,使內溫成為80℃,將過硫酸鉀0.021質量份作為2%水溶液投入。接著,於由甲基丙烯酸甲酯84.6質量%、丙烯酸丁酯5.9質量%、苯乙烯7.9質量%、甲基丙烯酸烯丙酯0.5質量%、正辛基硫醇1.1質量%所成之單體混合物(c′)21質量份中,添加0.07質量份的聚氧乙烯月桂基醚磷酸,將所得之混合液費63分鐘連續地添加至上述溶液。再者,藉由繼續60分鐘聚合反應,得到最內硬質聚合物(c)。After fully substituting the inside of the polymerizer with nitrogen, the internal temperature was set to 80° C., and 0.021 parts by mass of potassium persulfate was added as a 2% aqueous solution. Next, in a monomer mixture composed of 84.6% by mass of methyl methacrylate, 5.9% by mass of butyl acrylate, 7.9% by mass of styrene, 0.5% by mass of allyl methacrylate, and 1.1% by mass of n-octyl mercaptan (c') 0.07 mass part of polyoxyethylene lauryl ether phosphoric acid was added to 21 mass parts, and the obtained liquid mixture was continuously added to the said solution over 63 minutes. Furthermore, by continuing the polymerization reaction for 60 minutes, the innermost hard polymer (c) was obtained.

然後,將氫氧化鈉0.021質量份作為2質量%水溶液,將過硫酸鉀0.062質量份作為2質量%水溶液,分別添加。接著,於由丙烯酸丁酯80.0質量%、苯乙烯18.5質量%、甲基丙烯酸烯丙酯1.5質量%所成之單體混合物(a′)39質量份中,添加聚氧乙烯月桂基醚磷酸0.25質量份,將所得之混合液費117分鐘連續地添加。添加結束後,以2質量%水溶液添加過硫酸鉀0.012質量份,繼續120分鐘聚合反應,得到軟質層(由丙烯酸系橡膠狀聚合物(a)所成之層)。Then, 0.021 parts by mass of sodium hydroxide was added as a 2% by mass aqueous solution, and 0.062 parts by mass of potassium persulfate was added as a 2% by mass aqueous solution. Next, 0.25% polyoxyethylene lauryl ether phosphoric acid was added to 39 parts by mass of a monomer mixture (a') consisting of 80.0% by mass of butyl acrylate, 18.5% by mass of styrene, and 1.5% by mass of allyl methacrylate. The obtained mixed solution was added continuously for 117 minutes in parts by mass. After completion of the addition, 0.012 parts by mass of potassium persulfate was added as a 2% by mass aqueous solution, and the polymerization reaction was continued for 120 minutes to obtain a soft layer (a layer made of an acrylic rubber-like polymer (a)).

然後,以2質量%水溶液添加過硫酸鉀0.04質量份,費78分鐘連續地添加由甲基丙烯酸甲酯97.5質量%、丙烯酸丁酯2.5質量%所成之單體混合物(b′)26.1質量份。再者,繼續30分鐘聚合反應,得到聚合物(b)。Then, 0.04 parts by mass of potassium persulfate was added as a 2% by mass aqueous solution, and 26.1 parts by mass of a monomer mixture (b') consisting of 97.5% by mass of methyl methacrylate and 2.5% by mass of butyl acrylate was continuously added over 78 minutes. . Furthermore, the polymerization reaction was continued for 30 minutes to obtain a polymer (b).

將所得之聚合物投入到3質量%硫酸鈉溫水溶液中,使其鹽析・凝固。接著,重複脫水・洗淨後,使其乾燥,得到三層結構的丙烯酸系接枝共聚物粒子(橡膠粒子R1)。所得之橡膠粒子R1的平均粒徑為200nm。The obtained polymer was put into a warm aqueous solution of 3% by mass sodium sulfate, and salted out and coagulated. Next, after repeated dehydration and washing, it was dried to obtain acrylic graft copolymer particles (rubber particles R1) with a three-layer structure. The average particle diameter of the obtained rubber particles R1 was 200 nm.

橡膠粒子之平均粒徑係用以下方法進行測定。 以仄他電位(zeta potential)・粒徑測定系統(大塚電子股份有限公司製ELSZ-2000ZS),測定所得之分散液中的橡膠粒子之分散粒徑。 The average particle diameter of the rubber particles was measured by the following method. The dispersed particle diameter of the rubber particles in the obtained dispersion liquid was measured with a zeta potential and particle diameter measuring system (ELSZ-2000ZS manufactured by Otsuka Electronics Co., Ltd.).

(偏光板用樹脂薄膜3用溶液之調製) 混合下述成分,得到偏光板用樹脂薄膜用溶液5。 二氯甲烷(沸點41℃)                     800質量份 丙烯酸:MMA/PMI/MADA共聚物(60/20/20質量比),Mw:150萬,Tg:137℃(尚且,簡稱表示以下。MMA:甲基丙烯酸甲酯,PMI:苯基馬來醯亞胺及MADA:丙烯酸金剛烷酯)                                    80質量份 橡膠粒子R1                                20質量份 金屬氧化物粒子:Al 2O 3(SA43A:日本輕金屬股份有限公司製)                                          20質量份 分散劑(聚氧乙烯月桂基醚磷酸鈉:分子量332) 添加以偏光板用樹脂薄膜中成為0.006質量%之添加量 (Preparation of solution for resin film 3 for polarizing plates) The following components were mixed to obtain solution 5 for resin films for polarizing plates. Dichloromethane (boiling point 41° C.) 800 parts by mass Acrylic acid: MMA/PMI/MADA copolymer (60/20/20 mass ratio), Mw: 1.5 million, Tg: 137° C. (Also, abbreviated as follows. MMA: methyl Methyl acrylate, PMI: phenylmaleimide and MADA: adamantyl acrylate) 80 parts by mass of rubber particles R1 20 parts by mass of metal oxide particles: Al 2 O 3 (SA43A: manufactured by Nippon Light Metal Co., Ltd.) 20 Parts by mass of dispersant (sodium polyoxyethylene lauryl ether phosphate: molecular weight 332) is added in an amount of 0.006% by mass to the resin film for polarizing plates

<偏光板用樹脂薄膜4~6及11之製作> 除了將偏光板用樹脂薄膜之厚度變更為表I中記載之厚度以外,與偏光板用樹脂薄膜1之製作同樣地,製作偏光板用樹脂薄膜4~6及11。 <Production of resin films 4~6 and 11 for polarizing plates> Except for changing the thickness of the resin film for polarizing plates to the thickness described in Table 1, the resin films for polarizing plates 4 to 6 and 11 were produced in the same manner as the production of resin film 1 for polarizing plates.

<偏光板用樹脂薄膜7~10之製作> 除了變更曼頓高林均質機的處理次數,變更金屬氧化物粒子的粒徑比以外,與偏光板用樹脂薄膜1之製作同樣地,製作偏光板用樹脂薄膜7~10。 <Production of resin films for polarizing plates 7~10> Resin films 7 to 10 for polarizing plates were produced in the same manner as the production of resin film 1 for polarizing plates, except for changing the number of times of processing by the Menton Collin homogenizer and changing the particle size ratio of the metal oxide particles.

<偏光板用樹脂薄膜14~16之製作> 除了代替金屬氧化物粒子,使用5質量份的下述所示的化合物1及0.005質量份的硫酸以外,與偏光板用樹脂薄膜1之製作同樣地,製作偏光板用樹脂薄膜14。又,將偏光板用樹脂薄膜之厚度變更為表II中記載之厚度,製作偏光板用樹脂薄膜15及16。 <Production of resin films 14~16 for polarizing plates> The resin film 14 for a polarizing plate was produced in the same manner as the production of the resin film 1 for a polarizing plate except that 5 parts by mass of Compound 1 shown below and 0.005 parts by mass of sulfuric acid were used instead of the metal oxide particles. Moreover, the thickness of the resin film for polarizing plates was changed to the thickness described in Table II, and the resin films 15 and 16 for polarizing plates were produced.

<偏光板用樹脂薄膜17~20之製作> 除了以硫酸離子之含量成為表II記載之含量的方式,變更硫酸的添加量以外,與偏光板用樹脂薄膜14之製作同樣地,製作偏光板用樹脂薄膜18~20。尚且,關於偏光板用樹脂薄膜17,不添加硫酸。 <Manufacture of resin films for polarizing plates 17~20> Resin films 18 to 20 for polarizing plates were produced in the same manner as the production of resin film 14 for polarizing plates, except that the content of sulfuric acid ions was changed to the content described in Table II. In addition, sulfuric acid was not added to the resin film 17 for polarizing plates.

<偏光板用樹脂薄膜21之製作> 除了將化合物1之添加量及硫酸離子之含量變更為如表II中記載者以外,與偏光板用樹脂薄膜14之製作同樣地,製作偏光板用樹脂薄膜21。 <Production of resin film 21 for polarizing plate> The resin film 21 for a polarizing plate was produced in the same manner as the production of the resin film 14 for a polarizing plate except that the addition amount of the compound 1 and the content of the sulfate ion were changed to those described in Table II.

<偏光板用樹脂薄膜22之製作> 除了代替金屬氧化物粒子,使用5質量份的下述所示的化合物1以外,與偏光板用樹脂薄膜3之製作同樣地,製作偏光板用樹脂薄膜22。 <Production of resin film 22 for polarizing plate> The resin film 22 for a polarizing plate was produced in the same manner as the production of the resin film 3 for a polarizing plate except that 5 parts by mass of Compound 1 shown below was used instead of the metal oxide particles.

<偏光板用樹脂薄膜23~32及34~36之製作> 除了將化合物1變更為下述所示的化合物以外,與偏光板用樹脂薄膜14之製作同樣地,製作偏光板用樹脂薄膜23~32及34~36。 <Production of resin films 23~32 and 34~36 for polarizing plates> Resin films 23 to 32 and 34 to 36 for polarizing plates were produced in the same manner as the production of resin film 14 for polarizing plates except that compound 1 was changed to the compounds shown below.

<偏光板用樹脂薄膜33之製作> 除了將化合物1變更為下述所示的化合物7,進一步將偏光板用樹脂薄膜之厚度變更為20μm以外,與偏光板用樹脂薄膜14之製作同樣地,製作偏光板用樹脂薄膜33。 <Production of resin film 33 for polarizing plate> A polarizing plate resin film 33 was fabricated in the same manner as the polarizing plate resin film 14 except that compound 1 was changed to the following compound 7 and the thickness of the polarizing plate resin film was changed to 20 μm.

以下顯示所使用的有機化合物(市售品及以眾所周知的方法合成的本公司合成品)之結構式。 關於市售品,使用東京化成工業股份有限公司製的(18-冠6-醚)作為化合物6,使用富士軟片和光純藥股份有限公司製的乙酸作為化合物10。 關於本公司合成,例如參考日本特許第5919227號公報之段落0083中記載的方法進行。 The structural formulas of the organic compounds used (commercially available products and our company's synthetic products synthesized by well-known methods) are shown below. As the compound 6, (18-crown 6-ether) manufactured by Tokyo Chemical Industry Co., Ltd. was used as the commercially available product, and acetic acid manufactured by Fujifilm Wako Pure Chemical Industries, Ltd. was used as the compound 10. Synthesis by our company is carried out with reference to, for example, the method described in paragraph 0083 of Japanese Patent No. 5919227.

Figure 02_image043
Figure 02_image043

Figure 02_image045
Figure 02_image045

化合物1~9及13~14係作為碘移動抑制劑發揮功能。又,化合物10係不滿足本發明之非有機酸的定義,不作為碘移動抑制劑發揮功能。化合物11及12係HSP值的δP(極性力)為5~9MPa 0.5之範圍外,不作為碘移動抑制劑發揮功能。 Compounds 1-9 and 13-14 function as iodine mobilization inhibitors. Also, Compound 10 does not satisfy the definition of the non-organic acid of the present invention, and does not function as an iodine transfer inhibitor. Compounds 11 and 12 were outside the range of 5 to 9 MPa 0.5 in δP (polar force) of the HSP value, and did not function as iodine migration inhibitors.

表II中記載的各化合物之HSP值(δP及δD)為HSPiP 5th edition的計算值。The HSP value (δP and δD) of each compound described in Table II is the calculated value of HSPiP 5th edition.

又,相對於偏光板用樹脂薄膜的固體成分總質量,硫酸離子之含量係藉由毛細管電泳裝置進行測定。 又,毛細管電泳之條件係如以下。 毛細管電泳裝置:CAPI-3100(大塚電子公司製) 毛細管:內面未修飾的熔融矽石毛細管(GL Sciences公司製,內徑50μm、長度62.5cm、有效長50cm) 試料注入:落差法(2.5cmx30秒) 施加電壓:25kV 檢測波長:200nm 泳動液:50mM 硼酸緩衝液(pH10.5) In addition, the content of sulfate ions relative to the total solid mass of the resin film for polarizing plates was measured with a capillary electrophoresis device. In addition, the conditions of capillary electrophoresis are as follows. Capillary electrophoresis device: CAPI-3100 (manufactured by Otsuka Electronics Co., Ltd.) Capillary: Fused silica capillary with unmodified inner surface (manufactured by GL Sciences, inner diameter 50 μm, length 62.5 cm, effective length 50 cm) Sample injection: drop method (2.5cmx30 seconds) Applied voltage: 25kV Detection wavelength: 200nm Swimming solution: 50mM boric acid buffer (pH10.5)

[2]偏光子層之製作 <偏光子層(3μm)之製作> 以35℃的水使厚度20μm的聚乙烯醇系薄膜膨潤。將所得之薄膜浸漬於由碘0.075g、碘化鉀5g及水100g所構成的水溶液中60秒,進一步浸漬於由碘化鉀3g、硼酸7.5g及水100g所構成的45℃的水溶液中。將所得之薄膜在延伸溫度55℃、延伸倍率5倍之條件下進行單軸延伸。水洗該單軸延伸薄膜後,使其乾燥,形成厚度3μm的偏光子層。 [2] Production of polarizer layer <Fabrication of polarizer layer (3μm)> A polyvinyl alcohol-based film with a thickness of 20 μm was swelled with water at 35° C. The obtained film was immersed in an aqueous solution consisting of 0.075 g of iodine, 5 g of potassium iodide, and 100 g of water for 60 seconds, and further immersed in a 45° C. aqueous solution of 3 g of potassium iodide, 7.5 g of boric acid, and 100 g of water. The obtained film was uniaxially stretched at a stretching temperature of 55° C. and a stretching ratio of 5 times. After the uniaxially stretched film was washed with water, it was dried to form a polarizer layer with a thickness of 3 μm.

<偏光子層(7μm)之製作> 以35℃的水使厚度40μm的聚乙烯醇系薄膜膨潤。將所得之薄膜浸漬於由碘0.075g、碘化鉀5g及水100g所構成的水溶液中60秒,進一步浸漬於由碘化鉀3g、硼酸7.5g及水100g所構成的45℃的水溶液中。將所得之薄膜在延伸溫度55℃、延伸倍率5倍之條件下進行單軸延伸。水洗該單軸延伸薄膜後,使其乾燥,形成厚度7μm的偏光子層。 <Fabrication of polarizer layer (7μm)> A polyvinyl alcohol-based film with a thickness of 40 μm was swelled with water at 35° C. The obtained film was immersed in an aqueous solution consisting of 0.075 g of iodine, 5 g of potassium iodide, and 100 g of water for 60 seconds, and further immersed in a 45° C. aqueous solution of 3 g of potassium iodide, 7.5 g of boric acid, and 100 g of water. The obtained film was uniaxially stretched at a stretching temperature of 55° C. and a stretching ratio of 5 times. After the uniaxially stretched film was washed with water, it was dried to form a polarizer layer with a thickness of 7 μm.

<偏光子層(13μm)之製作> 以35℃的水使厚度60μm的聚乙烯醇系薄膜膨潤。將所得之薄膜浸漬於由碘0.075g、碘化鉀5g及水100g所構成的水溶液中60秒,進一步浸漬於由碘化鉀3g、硼酸7.5g及水100g所構成的45℃的水溶液中。將所得之薄膜在延伸溫度55℃、延伸倍率5倍之條件下進行單軸延伸。水洗該單軸延伸薄膜後,使其乾燥,形成厚度13μm的偏光子層。 <Fabrication of polarizer layer (13μm)> A polyvinyl alcohol-based film with a thickness of 60 μm was swelled with water at 35° C. The obtained film was immersed in an aqueous solution consisting of 0.075 g of iodine, 5 g of potassium iodide, and 100 g of water for 60 seconds, and further immersed in a 45° C. aqueous solution of 3 g of potassium iodide, 7.5 g of boric acid, and 100 g of water. The obtained film was uniaxially stretched at a stretching temperature of 55° C. and a stretching ratio of 5 times. After the uniaxially stretched film was washed with water, it was dried to form a polarizer layer with a thickness of 13 μm.

<偏光子層(20μm)之製作> 以35℃的水使厚度100μm的聚乙烯醇系薄膜膨潤。將所得之薄膜浸漬於由碘0.075g、碘化鉀5g及水100g所構成的水溶液中60秒,進一步浸漬於由碘化鉀3g、硼酸7.5g及水100g所構成的45℃的水溶液中。將所得之薄膜在延伸溫度55℃、延伸倍率5倍之條件下進行單軸延伸。水洗該單軸延伸薄膜後,使其乾燥,形成厚度20μm的偏光子層。 <Fabrication of polarizer layer (20μm)> A polyvinyl alcohol-based film with a thickness of 100 μm was swelled with water at 35° C. The obtained film was immersed in an aqueous solution consisting of 0.075 g of iodine, 5 g of potassium iodide, and 100 g of water for 60 seconds, and further immersed in a 45° C. aqueous solution of 3 g of potassium iodide, 7.5 g of boric acid, and 100 g of water. The obtained film was uniaxially stretched at a stretching temperature of 55° C. and a stretching ratio of 5 times. After the uniaxially stretched film was washed with water, it was dried to form a polarizer layer with a thickness of 20 μm.

[3]偏光板之製作 於偏光板用樹脂薄膜1~36上,分別透過下述的水溶性接著劑液,貼合偏光子層(7μm)及保護層,製作偏光板1~29。關於偏光板用樹脂薄膜1,製作分別貼合有厚度7、3、13及20μm的偏光子層之偏光板1-1、1-2、1-3及1-4。同樣地,關於偏光板用樹脂薄膜14,製作分別貼合有厚度7、3及20μm的偏光子層之偏光板14-1、14-2及14-3。 [3] Production of polarizing plate On the resin films 1-36 for polarizing plates, the following water-soluble adhesive solutions were passed through, respectively, and the polarizer layer (7 μm) and the protective layer were bonded to produce polarizing plates 1-29. Regarding the resin film 1 for polarizing plates, polarizing plates 1-1, 1-2, 1-3, and 1-4 each having polarizing sublayers with a thickness of 7, 3, 13, and 20 μm bonded thereto were produced. Similarly, with respect to the resin film 14 for polarizing plates, polarizing plates 14-1, 14-2, and 14-3 in which polarizing sub-layers having a thickness of 7, 3, and 20 μm were bonded were produced, respectively.

(水溶性接著劑液之調製) 混合下述的各成分後,進行脫泡,調製水溶性接著劑液。 純水                                    100質量份 股份有限公司日本觸媒製「Epocros WS-300」 7.5質量份 MENADIONA公司製「CROSSLINKER CL-427」 0.1質量份 (Preparation of water-soluble adhesive solution) After mixing the following components, defoaming was performed to prepare a water-soluble adhesive solution. Pure water 100 parts by mass "Epocros WS-300" manufactured by Nippon Shokubai Co., Ltd. 7.5 parts by mass "CROSSLINKER CL-427" made by MENADIONA 0.1 parts by mass

尚且,偏光板製作係對於偏光板用樹脂薄膜的接著側表面,以電暈輸出強度2.0kW、線速度18m/分鐘施予電暈放電處理,在電暈放電處理面上,以棒塗機塗佈上述所調製的水溶性接著劑液,使乾燥後之厚度成為約3μm後,在50℃、60℃、70℃下依序各乾燥60秒,接著進行貼合。同樣地,在偏光子層之未貼合偏光板用樹脂薄膜之面上,貼合KC2CT-W(Konica-Minolta公司製),剝離偏光板用樹脂薄膜的支撐體,得到偏光板1~36。Moreover, the production of polarizing plates is to apply corona discharge treatment to the adhesive side surface of the resin film for polarizing plates with a corona output intensity of 2.0kW and a line speed of 18m/min, and to coat the corona discharge treated surface with a bar coater. The water-soluble adhesive solution prepared above was dried to a thickness of about 3 μm after drying, and then dried at 50° C., 60° C., and 70° C. for 60 seconds in order, and then bonded. Similarly, KC2CT-W (manufactured by Konica-Minolta Co., Ltd.) was bonded to the surface of the polarizer layer on which the polarizing plate resin film was not bonded, and the support of the polarizing plate resin film was peeled off to obtain polarizing plates 1 to 36.

≪評價≫ 將所得之偏光板組入於顯示裝置,在80℃・55%RH的環境下,連續點亮背光1星期後,卸下一部分偏光板,進行以下的接著力評價。又,對於其餘的偏光板部位,進行以下之對比評價。 ≪Evaluation≫ The obtained polarizing plate was incorporated into a display device, and the backlight was continuously turned on for 1 week in an environment of 80°C・55%RH. After that, a part of the polarizing plate was removed, and the following adhesion evaluation was performed. Moreover, the following comparative evaluation was performed about the remaining polarizing plate parts.

(1)正面對比評價 使用Konica Minolta Sensing公司製的裝置「CS-2000」,照射波長550nm的光,從各自液晶顯示裝置的顯示畫面之法線方向,分別測定液晶顯示裝置的白顯示狀態及黑顯示狀態之亮度。然後,將所得之值應用於下述式,算出正面對比(CR)。 正面對比(CR)=(白顯示狀態的亮度)-(黑顯示狀態的亮度) (1) Positive comparative evaluation Using the device "CS-2000" manufactured by Konica Minolta Sensing Co., Ltd., light with a wavelength of 550 nm was irradiated, and the brightness of the white display state and the black display state of the liquid crystal display device were measured from the normal direction of the display screen of each liquid crystal display device. Then, the obtained value was applied to the following formula, and the front contrast (CR) was computed. Front contrast (CR)=(brightness of white display state)-(brightness of black display state)

根據以下基準,評價連續點亮1星期後的正面對比之值。點亮處理後亦用下述基準評價正面CR是否同樣地展現,將△以上當作良好。 ◎:900≦CR 〇:850≦CR<900 △:800≦CR<850 ×:800>CR The value of the frontal comparison after continuous lighting for 1 week was evaluated based on the following criteria. Also after the lighting treatment, whether or not the front CR was similarly expressed was evaluated by the following criteria, and △ or more was regarded as good. ◎: 900≦CR 〇: 850≦CR<900 △: 800≦CR<850 ×: 800>CR

(2)接著力評價 對於所得之樣品,在偏光板用樹脂薄膜與偏光子層之界面,於180°之方向中,進行以剝離速度300mm/分鐘來剝離之剝離試驗。使用(股)島津製作所製的「Autograph AGS-50NX」,測定此時的剝離強度(接著力)[N/25mm]。接著力之值係製作3個樣品(N數=3),採用3個值的平均值。尚且,偏光板用樹脂薄膜與偏光子層之間的剝離,雖然在偏光板用樹脂薄膜與接著劑層之界面或者偏光子層與接著劑層之界面的任一者發生,但於本評價中,目視觀察剝離狀態,採用在偏光板用樹脂薄膜與接著劑層之界面發生剝離時的剝離強度。 根據以下基準,評價接著力之值。點亮處理後亦用下述基準評價接著力是否同樣地展現,將△以上當作良好。 ◎:薄膜材料會破損,接著力無法測定 〇:接著力超過2.0N/25mm △:接著力為1.0~2.0N/25mm之範圍內 ×:接著力未達1.0N/25mm (2) Adhesion evaluation The obtained sample was subjected to a peeling test at a peeling speed of 300 mm/min in a direction of 180° at the interface between the resin film for a polarizing plate and the polarizer layer. The peel strength (adhesive force) [N/25mm] at this time was measured using "Autograph AGS-50NX" manufactured by Shimadzu Corporation. Then the value of the force is to make 3 samples (N number = 3), and the average value of the 3 values is used. Also, although the peeling between the resin film for polarizing plates and the polarizer layer occurs at either the interface between the resin film for polarizing plates and the adhesive layer or the interface between the polarizer layer and the adhesive layer, in this evaluation , the peeling state was visually observed, and the peeling strength when peeling occurred at the interface between the resin film for polarizing plates and the adhesive layer was adopted. The value of adhesive force was evaluated according to the following criteria. After the lighting treatment, it was evaluated whether or not the adhesive force was similarly exhibited by the following criteria, and △ or more was regarded as good. ◎: The film material will be damaged, and the adhesive force cannot be measured 〇: Adhesion force exceeds 2.0N/25mm △: Adhesive force within the range of 1.0~2.0N/25mm ×: Adhesion force is less than 1.0N/25mm

下述表I及表II中顯示評價結果。The evaluation results are shown in Table I and Table II below.

Figure 02_image047
Figure 02_image047

Figure 02_image049
Figure 02_image049

由上述結果可知,具備本發明之偏光板用樹脂薄膜的偏光板係抑制半導體基板之發熱所致的接著力降低及對比變差。 [產業上的利用可能性] From the above results, it can be seen that the polarizing plate provided with the resin film for polarizing plates of the present invention suppresses the decrease in adhesive force and the deterioration in contrast due to heat generation of the semiconductor substrate. [industrial availability]

藉由將本發明之偏光板用樹脂薄膜使用於顯示裝置中的偏光板,可抑制半導體基板之發熱所致的接著力降低及對比變差,因此可抑制對應於第5代行動通訊系統(5G)的通訊機器之因發熱所致的耐久性降低。By using the resin film for polarizing plates of the present invention as a polarizing plate in a display device, it is possible to suppress the decrease in adhesive force and the deterioration of contrast due to heat generation of the semiconductor substrate, so that it is possible to suppress the effects of the 5th generation mobile communication system (5G). ) The durability of communication equipment due to heat is reduced.

B110:支撐體 B200:製造裝置 B210:供給部 B220:塗佈部 B230:乾燥部 B240:冷卻部 B250:捲取部 1:偏光板用樹脂薄膜 2:接著劑層 3:偏光子層 4:保護層 10:偏光板 B110: Support body B200: Manufacturing Devices B210: Supply Department B220: Coating Department B230: Drying section B240: Cooling section B250: Coiler 1: Resin film for polarizing plate 2: Adhesive layer 3: polarizer layer 4: Protective layer 10: polarizer

[圖1]係用於實施本發明之偏光板用樹脂薄膜之製造方法的製造裝置B200之模型圖。 [圖2]係本發明之偏光板的基本層構成之剖面圖。 [FIG. 1] It is a model diagram of the manufacturing apparatus B200 for implementing the manufacturing method of the resin film for polarizing plates of this invention. [ Fig. 2 ] is a cross-sectional view of the basic layer structure of the polarizing plate of the present invention.

1:偏光板用樹脂薄膜 1: Resin film for polarizing plate

2:接著劑層 2: Adhesive layer

3:偏光子層 3: polarizer layer

4:保護層 4: Protective layer

10:偏光板 10: polarizer

Claims (11)

一種偏光板用樹脂薄膜,其係至少用於具備含有碘的偏光子層之偏光板的偏光板用樹脂薄膜,其特徵為: 至少含有熱塑性樹脂及碘移動抑制劑, 膜厚為1μm以上且未達15μm。 A resin film for a polarizing plate, which is at least used for a polarizing plate with a polarizing sub-layer containing iodine, characterized in that: Contains at least a thermoplastic resin and an iodine migration inhibitor, The film thickness is 1 μm or more and less than 15 μm. 如請求項1之偏光板用樹脂薄膜,其中 前述碘移動抑制劑為金屬氧化物粒子, 前述偏光板用樹脂薄膜之熱傳導度為0.2~0.6W/m・K之範圍內。 Such as the resin film for polarizing plates of claim 1, wherein The aforementioned iodine movement inhibitor is a metal oxide particle, The thermal conductivity of the aforementioned resin film for polarizing plates is within the range of 0.2 to 0.6 W/m・K. 如請求項2之偏光板用樹脂薄膜,其中前述金屬氧化物粒子的平均一次粒徑與平均二次粒徑之比之值滿足下述式(1); 式(1):20<平均二次粒徑/平均一次粒徑<2000。 The resin film for polarizing plates as claimed in claim 2, wherein the ratio of the average primary particle size to the average secondary particle size of the aforementioned metal oxide particles satisfies the following formula (1); Formula (1): 20<average secondary particle size/average primary particle size<2000. 如請求項1之偏光板用樹脂薄膜,其中 前述碘移動抑制劑為非有機酸,且 前述非有機酸的漢森(Hansen)溶解度參數(HSP值)的δP(極性力)為5~9MPa 0.5之範圍內。 Such as the resin film for polarizing plates of claim 1, wherein the aforementioned iodine transfer inhibitor is a non-organic acid, and the δP (polar force) of the Hansen (Hansen) solubility parameter (HSP value) of the aforementioned non-organic acid is 5 ~ 9MPa 0.5 within the range. 如請求項4之偏光板用樹脂薄膜,其中 前述非有機酸的前述HSP值的δD(分散力)與δP(極性力)之比之值滿足下述式(2); 式(2):2<δD(分散力)/δP(極性力)<4。 Such as the resin film for polarizing plates of claim 4, wherein The value of the ratio of δD (dispersion force) and δP (polar force) of the aforementioned HSP value of the aforementioned non-organic acid satisfies the following formula (2); Formula (2): 2<δD (dispersion force)/δP (polar force)<4. 如請求項4或5之偏光板用樹脂薄膜,其中 前述碘移動抑制劑進一步含有硫酸離子,且 相對於偏光板用樹脂薄膜的固體成分總質量,前述硫酸離子之含量為1~100質量ppm之範圍內。 The resin film for polarizing plates as claimed in item 4 or 5, wherein The aforementioned iodine movement inhibitor further contains sulfate ions, and Content of the said sulfate ion exists in the range of 1-100 mass ppm with respect to the solid content gross mass of the resin film for polarizing plates. 如請求項1至6中任一項之偏光板用樹脂薄膜,其中前述熱塑性樹脂為環烯烴樹脂。The resin film for polarizing plates according to any one of claims 1 to 6, wherein the thermoplastic resin is a cycloolefin resin. 一種偏光板用樹脂薄膜之製造方法,其係製造如請求項1至7中任一項之偏光板用樹脂薄膜的偏光板用樹脂薄膜之製造方法,其特徵為具有: 將具有脫模層的樹脂薄膜當作支撐體,在前述脫模層上塗佈含有熱塑性樹脂及碘移動抑制劑的溶液之步驟。 A method for manufacturing a resin film for a polarizing plate, which is a method for manufacturing a resin film for a polarizing plate according to any one of claims 1 to 7, characterized in that it has: A step of coating a solution containing a thermoplastic resin and an iodine migration inhibitor on the release layer using a resin film having a release layer as a support. 一種偏光板,其係在樹脂薄膜上具有接著劑層及偏光子層之偏光板,其特徵為: 作為前述樹脂薄膜,具備如請求項1至7中任一項之偏光板用樹脂薄膜。 A polarizing plate, which is a polarizing plate with an adhesive layer and a polarizer layer on a resin film, characterized by: As said resin film, the resin film for polarizing plates in any one of Claims 1-7 is provided. 如請求項9之偏光板,其中前述偏光子層之厚度為4~15μm之範圍內。The polarizing plate according to claim 9, wherein the thickness of the aforementioned polarizing sub-layer is within the range of 4 to 15 μm. 一種顯示裝置,其係具備偏光板之顯示裝置,其特徵為: 作為前述偏光板,具備如請求項9或10之偏光板。 A display device, which is a display device equipped with a polarizing plate, is characterized in that: As the polarizing plate, the polarizing plate according to claim 9 or 10 is provided.
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