TW202304598A - Gas supply system and control method thereof capable of supplying gas from two opposite sides of processing chamber to achieve uniform coating and developing - Google Patents
Gas supply system and control method thereof capable of supplying gas from two opposite sides of processing chamber to achieve uniform coating and developing Download PDFInfo
- Publication number
- TW202304598A TW202304598A TW110129383A TW110129383A TW202304598A TW 202304598 A TW202304598 A TW 202304598A TW 110129383 A TW110129383 A TW 110129383A TW 110129383 A TW110129383 A TW 110129383A TW 202304598 A TW202304598 A TW 202304598A
- Authority
- TW
- Taiwan
- Prior art keywords
- air supply
- cavity
- gas
- air
- guide
- Prior art date
Links
Images
Abstract
Description
本發明涉及半導體加工領域,尤其涉及一種送風系統及其控制方法。The invention relates to the field of semiconductor processing, in particular to an air supply system and a control method thereof.
塗佈顯影製程是晶片生產流程中必不可少的一種製程過程,是精確進行後續製程步驟的必要條件。其中塗佈顯影製程最重要的製程指標有四個:膜厚、膜厚均勻性、線寬和線寬均勻性。除此以外,還有配套的顆粒控制、金屬離子控制,以及相應的缺陷控制等等,這些都會影響後續製程的良率,進而影響整個產品的良率,因此對整個腔體的風流控制帶來的極高的要求。The coating and development process is an indispensable process in the wafer production process, and it is a necessary condition for accurate follow-up process steps. Among them, there are four most important process indicators in the coating and developing process: film thickness, film thickness uniformity, line width and line width uniformity. In addition, there are supporting particle control, metal ion control, and corresponding defect control, etc., which will affect the yield rate of the subsequent process, and then affect the yield rate of the entire product. extremely high requirements.
塗佈與顯影單元是塗佈顯影(Track)機台的一大核心單元,直接影響成膜的厚度和厚度均勻性。通常前道Track為了節省空間和成本,塗佈單元會放置2~3個塗佈製程腔,便於膠臂共用,節省膠泵。在塗佈和顯影的製程腔體裡,一般都要用到恒溫、恒濕,恒風速的送風系統。在進行塗佈過程中,機械手將晶圓送到塗佈和顯影的腔體的承載臺上,均勻風流通過晶圓上方的出風面持續流出,承載台吸附晶圓在電機的帶動下按一定速率進行旋轉,配合晶圓上面的勻流風速,達到均勻塗佈與顯影的目的。The coating and developing unit is a core unit of the coating and developing (Track) machine, which directly affects the thickness and thickness uniformity of the film. Usually, in order to save space and cost in the front track, the coating unit will place 2~3 coating process chambers, which is convenient for the sharing of glue arms and saves glue pumps. In the coating and developing process chamber, an air supply system with constant temperature, constant humidity and constant wind speed is generally used. During the coating process, the manipulator sends the wafer to the carrier table of the coating and developing chamber, and the uniform air flow continues to flow out through the air outlet surface above the wafer. The carrier table absorbs the wafer and presses it under the drive of the motor. Rotate at a certain speed, and cooperate with the uniform wind speed on the wafer to achieve the purpose of uniform coating and development.
現有技術常用的塗佈顯影設備送風裝置通常對塗佈顯影製程腔進行單側送風,由於需要送風的目的地區域較大,單側送風難以保證腔體內部各個不同位置的所受的風流速度一致。The air supply device for coating and developing equipment commonly used in the prior art usually supplies air from one side to the coating and developing process chamber. Since the destination area that needs to be supplied with air is relatively large, it is difficult to ensure that the air velocity received by different positions inside the cavity is consistent with the single-side air supply. .
因此,有必要開發一種新型送風系統及控制方法,以避免現有技術中存在的上述問題。Therefore, it is necessary to develop a novel air supply system and control method to avoid the above-mentioned problems in the prior art.
本發明的第一目的在於提供一種送風系統,實現從同一製程腔體相對的兩側實現送風。The first object of the present invention is to provide an air supply system that realizes air supply from opposite sides of the same process chamber.
為實現上述目的,本發明提供的所述送風系統包括送風元件、連接密封元件和風盒元件,所述送風組件包括相對設置的兩個送風腔體以及相對設置於每個所述送風腔體側壁的送風開口,使氣體沿所述送風腔體的延伸方向運動,並通過所述送風開口輸出;所述連接密封元件包括相對設置於所述兩個送風腔體,且均兩端開口的兩個外導流腔體,所述風盒元件包括兩端開口的勻氣腔體,每個所述外導流腔體的一端通過所述送風開口固定連接一個所述送風腔體,另一端固定連接所述勻氣腔體的一端,所述外導流腔體內兩端開口的空腔結構傾斜於所述送風腔體的延伸方向,使進入所述外導流腔體的氣體轉向流動並從所述勻氣腔體的兩端沿相對的方向進入所述勻氣腔體;所述勻氣腔體內設置有內導流組件,所述內導流組件傾斜於所述勻氣腔體的延伸方向設置,使自所述勻氣腔體兩端進入的氣體經所述內導流組件作用後轉向流動。In order to achieve the above purpose, the air supply system provided by the present invention includes an air supply element, a connecting sealing element and an air box element, and the air supply assembly includes two oppositely arranged air supply chambers and a side wall oppositely arranged on each of the air supply chambers. The air supply opening enables the gas to move along the extension direction of the air supply cavity and output through the air supply opening; the connecting sealing element includes two outer tubes that are arranged opposite to the two air supply cavities and are open at both ends. The air guide cavity, the air box element includes an air uniform cavity with openings at both ends, one end of each outer guide cavity is fixedly connected to one of the air supply chambers through the air supply opening, and the other end is fixedly connected to the air supply cavity. One end of the uniform air cavity, the cavity structure of the openings at both ends of the outer flow guide cavity is inclined to the extension direction of the air supply cavity, so that the gas entering the outer flow guide cavity turns to flow and flows from the The two ends of the uniform gas chamber enter the uniform gas chamber along opposite directions; the internal flow guide assembly is arranged in the uniform gas chamber, and the internal flow guide component is arranged obliquely to the extending direction of the uniform gas chamber , so that the gas entering from both ends of the uniform gas chamber is turned to flow after being acted on by the inner flow guide component.
本發明的所述送風系統的有益效果在於:所述送風元件包括相對設置的兩個送風腔體以及相對設置於每個所述送風腔體側壁的送風開口,所述連接密封元件包括相對設置於所述兩個送風腔體,且均兩端開口的兩個外導流腔體,所述風盒元件包括兩端開口的勻氣腔體,每個所述外導流腔體的一端通過所述送風開口固定連接一個所述送風腔體,另一端固定連接所述勻氣腔體的一端,所述勻氣腔體內設置有內導流組件,所述內導流組件傾斜於所述勻氣腔體的延伸方向設置,使自所述勻氣腔體兩端進入的氣體經所述內導流組件作用後轉向流動,實現從同一製程腔體相對的兩側實現送風。The beneficial effect of the air supply system of the present invention is that: the air supply element includes two air supply chambers oppositely arranged and an air supply opening oppositely arranged on the side wall of each of the air supply chambers, and the connecting sealing element includes two oppositely arranged air supply openings. The two air-supply cavities, and two outer guide cavities with openings at both ends, the air box element includes an air-distribution cavity with openings at both ends, and one end of each of the outer guide cavities passes through the The air supply opening is fixedly connected to one of the air supply chambers, and the other end is fixedly connected to one end of the air uniformity chamber. An inner flow guide assembly is arranged in the air uniformity chamber, and the inner flow guide assembly is inclined to the air uniformity chamber. The extension direction of the chamber is set so that the gas entering from both ends of the uniform gas chamber is turned to flow after being acted on by the inner guide component, so that air can be supplied from opposite sides of the same process chamber.
優選的,所述送風元件還包括微調裝置,所述微調裝置的數目至少為1,以與至少一個所述送風開口相對設置,從而對進入所述送風開口的氣體流速進行調節。Preferably, the air supply element further includes a trimming device, the number of which is at least 1, so as to be arranged opposite to at least one of the air supply openings, so as to adjust the flow rate of gas entering the air supply opening.
進一步優選的,所述微調裝置包括送風導流件、流速調節件和流速監測部;所述送風導流件跨所述送風開口設置於所述送風腔體內,使所述送風導流件與每個所述送風腔體的側壁圍成的結構具有底部開口,以與所述外導流腔體相通;所述流速監測部連接所述流速調節件,以獲取進入所述送風開口的氣體流速資訊;所述流速調節件設置於所述送風導流件並靠近所述底部開口,以便於根據所述進入所述送風開口的氣體流速資訊調節進入所述送風開口的氣體流速。Further preferably, the fine-tuning device includes an air supply deflector, a flow rate adjusting component, and a flow rate monitoring part; the air supply deflector is arranged in the air supply cavity across the air supply opening, so that the air supply deflector and each The structure surrounded by the side walls of the air supply cavity has a bottom opening to communicate with the outer guide cavity; the flow rate monitoring part is connected to the flow rate regulator to obtain the gas flow rate information entering the air supply opening. The flow rate regulator is arranged on the air supply guide and close to the bottom opening, so as to adjust the gas flow rate entering the air supply opening according to the gas flow rate information entering the air supply opening.
更進一步優選的,所述流速調節件包括相互活動連接的轉動軸和擋板,以通過操作所述轉動軸調節所述擋板的位置來實現對進入所述送風開口的氣體流速控制。Still further preferably, the flow rate regulator includes a rotating shaft and a baffle that are movably connected to each other, so as to control the flow rate of the gas entering the air supply opening by adjusting the position of the baffle by operating the rotating shaft.
進一步優選的,所述送風組件還包括設置於所述送風腔體側壁,並與所述流速調節件相對的使用中視窗。其有益效果在於:便於安裝和控制所述流速調節件。Further preferably, the air supply assembly further includes an in-use viewing window disposed on the side wall of the air supply cavity and opposite to the flow rate regulator. The beneficial effect is that it is convenient to install and control the flow rate adjusting member.
優選的,所述外導流腔體內的空腔結構沿所述送風腔體的延伸方向形成的各個截面面積沿所述勻氣腔體的延伸方向連續減小。Preferably, the cross-sectional areas of the cavity structures formed in the outer flow guide cavity along the extension direction of the air supply cavity decrease continuously along the extension direction of the air uniformity cavity.
進一步優選的,所述外導流腔體包括沿所述送風腔體的延伸方向相對設置的外導流頂板和外導流底板,所述外導流頂板的底面和所述外導流底板的頂面圍成所述空腔結構,所述外導流頂板的底面垂直於所述送風腔體的延伸方向,所述外導流底板的頂面傾斜於所述送風腔體的延伸方向。Further preferably, the outer flow guide cavity includes an outer flow guide top plate and an outer flow guide bottom plate oppositely arranged along the extension direction of the air supply cavity, the bottom surface of the outer flow guide top plate and the outer flow guide bottom plate The top surface encloses the cavity structure, the bottom surface of the outer flow guide top plate is perpendicular to the extension direction of the air supply cavity, and the top surface of the outer flow guide bottom plate is inclined to the extension direction of the air supply cavity.
更進一步優選的,所述外導流底板的頂面由至少兩個傾斜面沿朝向所述勻氣腔體的方向順次相接形成,所述至少兩個傾斜面朝向所述送風腔體的延伸方向延伸並與所述送風腔體的延伸方向形成的至少兩個傾斜角順次增加。Still further preferably, the top surface of the outer deflector bottom plate is formed by sequentially connecting at least two inclined surfaces toward the direction of the uniform air cavity, and the at least two inclined surfaces extend toward the extension of the air supply cavity. The direction extends and at least two inclination angles formed with the extending direction of the air supply cavity increase sequentially.
優選的,所述內導流組件包括相對設置於所述勻氣腔體內的兩個內導流孔板,以將所述勻氣腔體內分隔為中間內腔體,以及位於所述中間腔體兩側的兩個內導流腔體,所述兩個內導流腔體分別固定連接相對的兩個所述外導流腔體的另一端以實現內部相通,使得所述氣體經相對的兩個所述外導流腔體進入所述兩個內導流腔體後,再經所述兩個內導流孔板進入所述中間內腔體。Preferably, the inner flow guide assembly includes two inner guide orifice plates arranged oppositely in the uniform gas cavity, so as to divide the uniform gas cavity into an intermediate inner cavity, and the inner cavity located in the intermediate cavity Two inner diversion cavities on both sides, the two inner diversion cavities are respectively fixedly connected to the other ends of the two opposite outer diversion cavities to achieve internal communication, so that the gas passes through the two opposite ends After one of the outer diversion cavities enters the two inner diversion cavities, it enters the middle inner cavity through the two inner diversion orifice plates.
進一步優選的,所述兩個內導流孔板傾斜於所述勻氣腔體的設置方向設置。Further preferably, the two inner orifice plates are arranged obliquely to the arrangement direction of the gas uniform chamber.
更進一步優選的,所述勻氣腔體的內空腔結構由相對的勻氣頂板和勻氣底板圍成,所述兩個內導流孔板的任意一個的一端固定連接所述勻氣底板,另一端與所述勻氣頂板固定連接,使所述勻氣頂板、所述勻氣底板和所述兩個內導流孔板圍成所述中間內腔體。More preferably, the inner cavity structure of the uniform gas chamber is surrounded by a relative gas uniform top plate and a gas uniform bottom plate, and one end of any one of the two inner guide orifice plates is fixedly connected to the gas uniform bottom plate , and the other end is fixedly connected with the gas uniform top plate, so that the gas uniform top plate, the gas uniform bottom plate and the two inner diversion orifice plates enclose the middle inner cavity.
進一步優選的,所述兩個內導流腔體和所述中間內腔體相對所述勻氣腔體的中心軸線對稱設置。Further preferably, the two inner flow guide cavities and the middle inner cavity are arranged symmetrically with respect to the central axis of the gas uniform cavity.
進一步優選的,所述兩個內導流腔體的任意一個沿所述送風腔體的延伸方向形成的各個截面面積沿各自的延伸方向連續減小,所述兩個內導流腔體的任意一個的延伸方向由每個所述內導流腔體的一端沿所述勻氣腔體的延伸方向指向另一端。Further preferably, each cross-sectional area formed by any one of the two inner guide cavities along the extension direction of the air supply cavity decreases continuously along the respective extension directions, and any of the two inner guide cavities One extension direction is from one end of each inner flow guide cavity to the other end along the extension direction of the gas uniform cavity.
進一步優選的,所述內導流孔板上開設有數個通孔。Further preferably, several through holes are opened on the inner orifice plate.
優選的,述連接密封元件包括2N個所述外導流腔體,所述風盒組件包括N個所述勻氣腔體,每個所述勻氣腔體的兩端分別固定連接一個所述外導流腔體,N為大於1的正整數。其有益效果在於:整體系統可以根據實際需求,增加或減小目標送風區域的數量。Preferably, the connecting sealing element includes 2N outer flow guiding cavities, the air box assembly includes N aeration cavities, and each of the two ends of the aeration cavities is fixedly connected to one of the aeration chambers. The outer guide cavity, N is a positive integer greater than 1. The beneficial effect is that the overall system can increase or decrease the number of target air supply areas according to actual needs.
優選的,所述N個所述勻氣腔體相互平行設置。Preferably, the N aeration chambers are arranged parallel to each other.
優選的,所述兩個送風腔體均垂直於所述勻氣腔體。Preferably, the two air supply chambers are perpendicular to the air uniformity chamber.
本發明的第二目的在於提供一種送風系統的控制方法,實現從同一製程腔體相對的兩側實現送風。The second object of the present invention is to provide a method for controlling the air supply system, which realizes the air supply from opposite sides of the same process chamber.
為實現上述目的,本發明提供的所述送風系統的控制方法,通過氣源向所述兩個送風腔體內供氣,使氣體經相對的所述送風開口進入相對的所述兩個外導流腔體後,從所述勻氣腔體的兩端進入所述勻氣腔體內,並經所述內導流組件的作用後轉向流動。In order to achieve the above purpose, the control method of the air supply system provided by the present invention is to supply air to the two air supply chambers through the air source, so that the gas enters the two opposite outer guides through the opposite air supply openings. After the cavity, it enters the gas uniform cavity from both ends of the gas uniform cavity, and turns to flow after the action of the inner flow guide component.
進一步優選的,通過所述流速監測部獲取進入所述送風開口的氣體流速資訊;根據所述進入所述送風開口的氣體流速資訊操作所述流速調節件,以調節進入所述送風開口的氣體流速。Further preferably, the gas flow rate information entering the air supply opening is obtained through the flow rate monitoring part; the flow rate regulator is operated according to the gas flow rate information entering the air supply opening to adjust the gas flow rate entering the air supply opening .
為使本發明實施例的目的、技術方案和優點更加清楚,下面將對本發明實施例中的技術方案進行清楚、完整地描述,顯然,所描述的實施例是本發明一部分實施例,而不是全部的實施例。基於本發明中的實施例,本領域普通技術人員在沒有作出創造性勞動前提下所獲得的所有其他實施例,都屬於本發明保護的範圍。除非另外定義,此處使用的技術術語或者科學術語應當為本發明所屬領域內具有一般技能的人士所理解的通常意義。本文中使用的「包括」等類似的詞語意指出現該詞前面的元件或者物件涵蓋出現在該詞後面列舉的元件或者物件及其等同,而不排除其他元件或者物件。In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are part of the embodiments of the present invention, not all of them. the embodiment. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention. Unless otherwise defined, the technical terms or scientific terms used herein shall have the usual meanings understood by those skilled in the art to which the present invention belongs. The words "comprising" and the like used herein mean that the elements or items appearing before the word include the elements or items listed after the word and their equivalents, without excluding other elements or items.
為解決現有技術存在的問題,本發明實施例提供了一種送風系統。In order to solve the problems existing in the prior art, an embodiment of the present invention provides an air supply system.
圖1為本發明實施例的一種送風系統的結構示意圖。圖2為圖1所示的送風元件、連接密封元件和一個風盒元件的裝配結構示意圖。圖3圖1所示的單側送風元件的結構示意圖。Fig. 1 is a schematic structural diagram of an air supply system according to an embodiment of the present invention. Fig. 2 is a schematic diagram of the assembly structure of the air supply element, the connecting sealing element and an air box element shown in Fig. 1 . Fig. 3 is a schematic structural diagram of the single-side air supply element shown in Fig. 1 .
本發明實施例中,所述送風系統包括送風元件、連接密封元件和風盒元件,所述送風組件包括相對設置的兩個送風腔體以及相對設置於每個所述送風腔體側壁的送風開口,使氣體沿所述送風腔體的延伸方向運動,並通過所述送風開口輸出。In the embodiment of the present invention, the air supply system includes an air supply element, a connecting sealing element and an air box element, and the air supply assembly includes two opposite air supply chambers and an air supply opening oppositely arranged on the side wall of each of the air supply chambers, The gas is moved along the extending direction of the air supply cavity and output through the air supply opening.
具體的,參照圖1,圖1所示的送風系統包括送風元件1、連接密封元件2和風盒元件3。具體的,參照圖2和圖3,所述送風組件1包括相對設置的左送風組件11和右送風組件(圖中未標示),左送風組件11包括送風腔體111以及設置於送風腔體111側壁的數個送風開口112,氣源供氣後沿所述送風腔體的延伸方向,即圖2所示的A方向,通過所述送風腔體111分別向數個所述送風開口112輸出氣流。其中,所述右送風元件與所述左送風元件11結構相同,每個所述送風開口112也具有相同的結構。Specifically, referring to FIG. 1 , the air supply system shown in FIG. 1 includes an
圖4為圖1所示的單個連接密封元件的結構示意圖。圖5為圖1所示的單個勻氣腔體、單個外導流腔體以及單個送風腔體的裝配結構示意圖。Fig. 4 is a schematic structural diagram of a single connection sealing element shown in Fig. 1 . Fig. 5 is a schematic diagram of the assembly structure of the single gas uniform chamber, the single outer guide chamber and the single air supply chamber shown in Fig. 1 .
本發明實施例中,所述連接密封元件包括相對設置於所述兩個送風腔體,且均兩端開口的兩個外導流腔體,所述風盒元件包括兩端開口的勻氣腔體,每個所述外導流腔體的一端通過所述送風開口固定連接一個所述送風腔體,另一端固定連接所述勻氣腔體的一端,所述外導流腔體內兩端開口的空腔結構傾斜於所述送風腔體的延伸方向,使進入所述外導流腔體的氣體轉向流動並從所述勻氣腔體的兩端沿相對的方向進入所述勻氣腔體。In the embodiment of the present invention, the connecting sealing element includes two outer guide cavities that are arranged opposite to the two air supply cavities and are both open at both ends, and the air box element includes an air uniform cavity that is open at both ends one end of each of the outer flow guide cavities is fixedly connected to one of the air supply cavities through the air supply opening, and the other end is fixedly connected to one end of the uniform gas cavity, and the two ends of the outer flow guide cavity are open The cavity structure is inclined to the extension direction of the air supply cavity, so that the gas entering the outer guide cavity turns to flow and enters the gas uniform cavity from both ends of the uniform gas cavity in opposite directions .
具體的,參照圖1、圖4和圖5,所述連接密封元件2包括外導流腔體21、外導流頂板211、外導流底板212和連接固定件22,所述外導流腔體21兩端均有開口(圖中未標示),所述風盒組件3包括勻氣腔體31,所述勻氣腔體31兩端均有開口(圖中未標示),相對設置的兩個所述外導流腔體21的一端通過連接固定件22分別與所述勻氣腔體31的兩端分別固定,兩個所述外導流腔體21的另一端與一組相對設置的所述送風組件1的所述送風開口112相固定。所述外導流頂板211和所述外導流底板212圍成所述外導流腔體21內的空腔結構(圖中未標示),所述外導流腔體21內的空腔結構(圖中未標示)與送風腔體111的延伸方向存在一定傾斜角度,使進入所述外導流腔體21的氣體轉向流動並從所述勻氣腔體31的兩端延相對方向進入所述勻氣腔體31。Specifically, referring to Fig. 1, Fig. 4 and Fig. 5, the
一些實施例中,兩個所述外導流腔體21和兩個所述送風腔體111相對所述勻氣腔體31的對稱軸37以軸對稱的方式佈置於所述勻氣腔體31的兩側,並給所述相對設置的兩個所述送風腔體111以相同的條件供氣,此時兩端進入勻氣腔體31的氣流速度大小相等、方向相反。In some embodiments, the two
圖6為圖5所示的勻氣腔體的工作狀態示意圖。圖7為圖6所示的勻氣腔體的部分內部結構示意圖。Fig. 6 is a schematic diagram of the working state of the gas uniform chamber shown in Fig. 5 . FIG. 7 is a schematic diagram of a part of the internal structure of the gas uniform chamber shown in FIG. 6 .
本發明實施例中,所述勻氣腔體內設置有內導流組件,所述內導流組件傾斜於所述勻氣腔體的延伸方向設置,使自所述勻氣腔體兩端進入的氣體經所述內導流組件作用後轉向流動。In the embodiment of the present invention, the inner flow guide assembly is arranged in the uniform gas cavity, and the inner flow guide component is arranged obliquely to the extension direction of the uniform gas cavity, so that the air entering from both ends of the uniform gas cavity The gas turns to flow after being acted on by the inner guide component.
具體的,參照圖6和圖7,所述勻氣腔體31內設置有左內導流孔板321和右內導流孔板322作為內導流元件32,所述左內導流孔板321與所述右內導流孔板322以相同的傾斜程度傾斜於所述勻氣腔體的延伸方向,即圖7所示的C或E方向,使得自所述勻氣腔體31左右兩側進入的氣流經內所述左內導流孔板321與所述右內導流孔板322的調整後,氣流方向由水平方向轉變為垂直向下方向。其中,E方向為C方向的反方向。Specifically, referring to Fig. 6 and Fig. 7, a left
本發明實施例中,所述送風元件還包括微調裝置,所述微調裝置的數目至少為1,以與至少一個所述送風開口相對設置,從而對進入所述送風開口的氣體流速進行調節。In an embodiment of the present invention, the air supply element further includes a fine-tuning device, the number of which is at least 1, and is arranged opposite to at least one of the air supply openings, so as to adjust the flow rate of gas entering the air supply opening.
一些具體的實施例中,所述微調裝置的數目可以為1,以與一個所述送風開口112相對設置,從而對進入所述送風開口112的氣體流速進行調節。In some specific embodiments, the number of the fine-tuning device can be 1, so as to be arranged opposite to one of the
一些具體的實施例中,所述微調裝置的數目可以為2,以與兩個所述送風開口112相對設置,從而對進入所述送風開口112的氣體流速進行調節。In some specific embodiments, the number of the fine-tuning devices may be 2, so as to be arranged opposite to the two
本發明實施例中,所述內導流組件包括相對設置於所述勻氣腔體內的兩個內導流孔板,以將所述勻氣腔體內分隔為中間內腔體,以及位於所述中間腔體兩側的兩個內導流腔體,所述兩個內導流腔體分別固定連接相對的兩個所述外導流腔體的另一端以實現內部相通,使得所述氣體經相對的兩個所述外導流腔體進入所述兩個內導流腔體後,再經所述兩個內導流孔板進入所述中間內腔體。In the embodiment of the present invention, the inner flow guide assembly includes two inner guide orifice plates arranged oppositely in the uniform gas chamber, so as to divide the uniform gas chamber into an intermediate inner cavity, and Two inner diversion cavities on both sides of the middle cavity, the two inner diversion cavities are respectively fixedly connected to the other ends of the two opposite outer diversion cavities to achieve internal communication, so that the gas passes through After the two opposite outer guide cavities enter the two inner guide cavities, they enter the middle inner cavity through the two inner guide orifices.
具體的,參照圖7,左內導流孔板321和右內導流孔板322設置於所述勻氣腔體31內,將所述勻氣腔體31分隔為中間內腔體33和左內導流腔體341、右導流內腔體342,所述左內導流腔體341與所述右內導流腔體342分別與相對設置的所述外導流腔體21內部相通,使得所述氣體經相對設置的所述外導流腔體21進入所述左內導流腔體341和右內導流腔體342內,再經所述左內導流孔板321和右內導流孔板322導流後進入所述中間內腔體33。Specifically, referring to FIG. 7, the left
本發明實施例中,所述兩個內導流孔板傾斜於所述勻氣腔體的設置方向設置。In the embodiment of the present invention, the two inner guide orifice plates are arranged obliquely to the installation direction of the gas uniform chamber.
具體的,參照圖7,所述左內導流孔板321和所述右內導流孔板322的設置方向與所述勻氣腔體31的設置方向之間存在夾角γ。Specifically, referring to FIG. 7 , there is an angle γ between the arrangement direction of the left inner
一些具體的實施例中,所述所述左內導流孔板321和所述右內導流孔板322的設置方向與所述勻氣腔體31的設置方向之間的角度γ的範圍大於等於135°小於180°。In some specific embodiments, the range of the angle γ between the arrangement direction of the left inner
一些具體的實施例中,γ的範圍大於90度小於180度。In some specific embodiments, the range of γ is greater than 90 degrees and less than 180 degrees.
本發明實施例中,所述勻氣腔體的內空腔結構由相對的勻氣頂板和勻氣底板圍成,所述兩個內導流孔板的任意一個的一端固定連接所述勻氣底板,另一端與所述勻氣頂板固定連接,使所述勻氣頂板、所述勻氣底板和所述兩個內導流孔板圍成所述中間內腔體。In the embodiment of the present invention, the inner cavity structure of the uniform gas chamber is surrounded by the relative gas uniform top plate and the gas uniform bottom plate, and one end of any one of the two inner guide orifice plates is fixedly connected to the gas uniform The other end of the bottom plate is fixedly connected with the gas uniform top plate, so that the gas uniform top plate, the gas uniform bottom plate and the two inner diversion orifice plates enclose the middle inner cavity.
具體的,參照圖7,所述勻氣腔體31由相對設置的所述勻氣頂板35和所述勻氣底板36圍成,所述左內導流孔板321和所述右內導流孔板322的任意一端分別於所述勻氣底板36的左端和右端相固定,另一端與所述勻氣頂板35相固定,所述勻氣頂板35、所述勻氣底板36、所述左內導流孔板321和所述右內導流孔板322圍成所述中間內腔體33。Specifically, referring to FIG. 7 , the
本發明實施例中,所述兩個內導流腔體和所述中間內腔體相對所述勻氣腔體的中心軸線對稱設置。In the embodiment of the present invention, the two inner flow guiding cavities and the middle inner cavity are arranged symmetrically with respect to the central axis of the gas uniform cavity.
具體的,參照圖7,左內導流腔體341和右內導流腔體342以所述勻氣腔體31中心軸線37為對稱軸鏡像分佈,其內部空間大小相等,其形狀、位置對稱。Specifically, referring to FIG. 7 , the left
本發明實施例中,所述兩個內導流腔體的任意一個沿所述送風腔體的延伸方向形成的各個截面面積沿各自的延伸方向連續減小,所述兩個內導流腔體的任意一個的延伸方向由每個所述內導流腔體的一端沿所述勻氣腔體的延伸方向指向另一端。In the embodiment of the present invention, each cross-sectional area formed by any one of the two inner guide cavities along the extension direction of the air supply cavity decreases continuously along the respective extension directions, and the two inner guide cavities The extending direction of any one of them is from one end of each inner flow guide cavity to the other end along the extending direction of the gas uniform cavity.
具體的,參照圖7,所述左內導流腔體341和所述右內導流腔體342沿送風腔體111的延伸方向,即垂直方向所形成的各個截面面積沿沿各自的延伸方向,即圖中所示C和E方向連續減小。Specifically, referring to FIG. 7 , the cross-sectional areas formed by the left
一些具體的實施例中,所述左內導流孔板321和所述右內導流孔板322均為平板。In some specific embodiments, the left
一些具體的實施例中,所述左內導流孔板321和所述右內導流孔板322均為弧形板。In some specific embodiments, the left
圖8為圖1所示的送風元件局部結構透視圖。圖9為圖1所示的送風元件內部結構示意圖。Fig. 8 is a perspective view of the partial structure of the air blowing element shown in Fig. 1 . Fig. 9 is a schematic diagram of the internal structure of the air supply element shown in Fig. 1 .
本發明實施例中,所述微調裝置包括送風導流件、流速調節件和流速監測部;所述送風導流件跨所述送風開口設置於所述送風腔體內,使所述送風導流件與每個所述送風腔體的側壁圍成的結構具有底部開口,以與所述外導流腔體相通;所述流速監測部連接所述流速調節件,以獲取進入所述送風開口的氣體流速資訊;所述流速調節件設置於所述送風導流件並靠近所述底部開口,以便於根據所述進入所述送風開口的氣體流速資訊調節進入所述送風開口的氣體流速。In the embodiment of the present invention, the fine-tuning device includes an air supply deflector, a flow rate regulator, and a flow rate monitoring part; the air supply deflector is arranged in the air supply cavity across the air supply opening, so that the air supply deflector The structure surrounded by the side wall of each air supply cavity has a bottom opening to communicate with the outer guide cavity; the flow rate monitoring part is connected to the flow rate regulator to obtain the gas entering the air supply opening Flow rate information: the flow rate regulator is disposed on the air supply guide and close to the bottom opening, so as to adjust the gas flow rate entering the air supply opening according to the gas flow rate information entering the air supply opening.
具體的,參照圖5、圖8和圖9,微調裝置(圖中未標示)包括送風導流件15、流速調節件16和流速監測部(圖中未標示);所述送風導流件15跨所述送風開口112設置於所述送風腔體111內,使所述送風導流件15與所述送風腔體111的側壁圍成的結構具有底部開口,以與所述外導流腔體21(圖中未標示)相通;所述流速監測部(圖中未標示)連接所述流速調節件16,以獲取進入所述送風開口112的氣體流速資訊;所述流速調節件16設置於所述送風導流件15並靠近所述底部開口,以便於根據所述進入所述送風開口112的氣體流速資訊調節進入所述送風開口112的氣體流速。Specifically, referring to Fig. 5, Fig. 8 and Fig. 9, the fine-tuning device (not marked in the figure) includes an
本發明實施例中,所述流速調節件包括相互活動連接的轉動軸和擋板,以通過操作所述轉動軸調節所述擋板的位置來實現對進入所述送風開口的氣體流速控制。In the embodiment of the present invention, the flow rate regulator includes a rotating shaft and a baffle which are movably connected to each other, so as to control the flow rate of the gas entering the air supply opening by adjusting the position of the baffle by operating the rotating shaft.
具體的,參照圖5、圖8和圖9,所述流速調節件16包括相互活動連接的轉動閥19和擋板18,以通過操作所述轉動閥19調節所述擋板18的位置來實現對進入所述送風開口112的氣體流速控制;當所述擋板方向為垂直向下時,處於正常送風狀態;當所述轉動閥19順時針旋轉時,所述擋板18朝向所述送風開口112所在的所述送風腔體111的側壁運動,使所述送風導流件15與所述送風腔體111的側壁圍成結構的底部開口收縮以減小送風;當所述轉動閥19逆時針旋轉時,所述擋板18遠離所述送風開口112所在的所述送風腔體111的側壁運動,使所述送風導流件15與所述送風腔體111的側壁圍成結構的底部開口擴大以增加送風。Specifically, referring to Fig. 5, Fig. 8 and Fig. 9, the
本發明實施例中,所述送風組件還包括設置於所述送風腔體側壁,並與所述流速調節件相對的使用中視窗。In the embodiment of the present invention, the air supply assembly further includes an in-use viewing window disposed on the side wall of the air supply cavity and opposite to the flow rate adjusting member.
具體的,參照圖1和圖8,所述送風組件1還包括使用中視窗17,所述使用中視窗17位於送風腔體側壁上,並與所述流速調節件16位置相對,以利於通過所述使用中視窗17對所述流速調節件16進行調節。Specifically, referring to Fig. 1 and Fig. 8, the
圖10為本發明實施例的連接密封元件與送風元件的裝配結構示意圖。Fig. 10 is a schematic diagram of the assembly structure connecting the sealing element and the air supply element according to the embodiment of the present invention.
本發明實施例中,所述外導流腔體內的空腔結構沿所述送風腔體的延伸方向形成的各個截面面積沿所述勻氣腔體的延伸方向連續減小。In the embodiment of the present invention, the cross-sectional areas formed in the cavity structure in the outer guide cavity along the extension direction of the air supply cavity decrease continuously along the extension direction of the air uniformity cavity.
具體的,參照圖10,所述外導流腔體21的空腔結構(圖中未標示)沿所述送風腔體111的延伸方向,即圖10所示的A方向所形成的各個截面面積沿勻氣腔體的延伸方向,即水平方向連續減小。Specifically, referring to FIG. 10, the cavity structure (not shown in the figure) of the
一些具體實施例中,圍成所述外導流腔體21內的空腔結構的所述外導流頂板211和所述外導流底板212,其形狀為平面。In some specific embodiments, the shape of the outer flow guide
一些具體實施例中,所述外導流頂板211為平板,所述外導流底板212為弧形板或折線形板。In some specific embodiments, the outer flow guide
本發明實施例中,所述外導流腔體包括沿所述送風腔體的延伸方向相對設置的外導流頂板和外導流底板,所述外導流頂板的底面和所述外導流底板的頂面圍成所述空腔結構,所述外導流頂板的底面垂直於所述送風腔體的延伸方向,所述外導流底板的頂面傾斜於所述送風腔體的延伸方向。In the embodiment of the present invention, the outer flow guide cavity includes an outer flow guide top plate and an outer flow guide bottom plate oppositely arranged along the extending direction of the air supply cavity, and the bottom surface of the outer flow guide top plate and the outer flow guide The top surface of the bottom plate encloses the cavity structure, the bottom surface of the outer flow guide top plate is perpendicular to the extension direction of the air supply cavity, and the top surface of the outer flow guide bottom plate is inclined to the extension direction of the air supply cavity .
具體的,參照圖10,所述外導流頂板211底面與送風腔體111的延伸方向,即A方向相垂直,所述外導流底板212頂面與送風腔體111的延伸方向,即A方向存在一定的傾斜角度。Specifically, referring to FIG. 10 , the bottom surface of the outer flow guide
本發明實施例中,所述外導流底板的頂面由至少兩個傾斜面沿朝向所述勻氣腔體的方向順次相接形成,所述至少兩個傾斜面朝向所述送風腔體的延伸方向延伸並與所述送風腔體的延伸方向形成的至少兩個傾斜角順次增加。In the embodiment of the present invention, the top surface of the outer deflector bottom plate is formed by sequentially connecting at least two inclined surfaces towards the direction of the air uniform cavity, and the at least two inclined surfaces are directed towards the side of the air supply cavity. The extension direction extends and at least two inclination angles formed with the extension direction of the air supply cavity increase sequentially.
具體的,參照圖10,所述外導流底板212的頂面包括朝向所述勻氣腔體31的方向順次相接的第一斜面2121和第二斜面2122,所述第一斜面2121與送風腔體111延伸方向的夾角α小於第二斜面2122與送風腔體111延伸方向的夾角β。Specifically, referring to FIG. 10 , the top surface of the outer
本發明實施例中,所述內導流孔板上開設有數個通孔。具體的,所述左內導流孔板321和所述右內導流孔板322開設的使氣流流過的數個通孔以矩形陣列或環形陣列的方式均勻分佈於各孔板表面。In the embodiment of the present invention, several through holes are opened on the inner guide orifice plate. Specifically, the through holes opened by the left
本發明實施例中,所述送風元件和所述連接密封元件相對所述風盒元件軸對稱設置。In the embodiment of the present invention, the air supply element and the connecting sealing element are arranged axisymmetrically with respect to the air box element.
具體的,兩個所述送風元件1和所述連接密封元件2相對所述風盒元件3軸對稱設置。Specifically, the two
本發明實施例中,所述連接密封元件包括2N個所述外導流腔體,所述風盒組件包括N個所述勻氣腔體,每個所述勻氣腔體的兩端分別固定連接一個所述外導流腔體,N為大於1的正整數。In the embodiment of the present invention, the connecting sealing element includes 2N outer guide cavities, the wind box assembly includes N gas uniform cavities, and the two ends of each gas uniform cavity are respectively fixed One of the outer guide chambers is connected, and N is a positive integer greater than 1.
一些具體的實施例中,參照圖1,所述數個連接密封元件2共包括12個所述外導流腔體21,所述風盒組件3包括6個所述勻氣腔體31,每個所述勻氣腔體31的兩端分別固定連接一個所述外導流腔體21。In some specific embodiments, referring to FIG. 1 , the several connecting
一些具體的實施例中,所述連接密封元件2包括2個所述外導流腔體21,所述風盒組件3包括1個所述勻氣腔體31,所述勻氣腔體31的兩端分別固定連接一個所述外導流腔體21。In some specific embodiments, the connecting
本發明實施例中,N個所述勻氣腔體相互平行設置。In the embodiment of the present invention, the N gas uniform chambers are arranged parallel to each other.
一些實施例中,N個所述勻氣腔體31佈置方向之間存在一定傾斜角度,In some embodiments, there is a certain inclination angle between the arrangement directions of the N
本發明實施例中,所述兩個送風腔體均垂直於所述勻氣腔體。In the embodiment of the present invention, the two air supply chambers are perpendicular to the air uniformity chamber.
一些實施例中,所述送風腔體111的延伸方向與勻氣腔體31延伸方向所形成的夾角大於0度並小於90°。In some embodiments, the angle formed by the extending direction of the
本發明實施例還提供了所述送風系統的控制方法。包括:The embodiment of the present invention also provides a control method of the air supply system. include:
通過氣源向所述兩個送風腔體內供氣,使氣體經相對的所述送風開口進入相對的所述兩個外導流腔體後,從所述勻氣腔體的兩端進入所述勻氣腔體內,並經所述內導流組件的作用後轉向流動。Air is supplied to the two air supply cavities through the air source, so that the gas enters the two opposite outer guide cavities through the opposite air supply openings, and then enters the two ends of the uniform air cavity. In the uniform gas cavity, and after the action of the inner guide component, it turns to flow.
具體的,通過氣源向所述兩個送風腔體112內供氣,使氣體經相對的所述送風開口112進入相對的所述兩個外導流腔體21後,從所述勻氣腔體31的兩端進入所述勻氣腔體31內,並經所述左內導流組件341和右內導流組件342的作用後轉向流動。Specifically, air is supplied to the two
本發明實施例中,通過所述流速監測部獲取進入所述送風開口的氣體流速資訊;根據所述進入所述送風開口的氣體流速資訊操作所述流速調節件,以調節進入所述送風開口的氣體流速。In the embodiment of the present invention, the flow rate monitoring part obtains the gas flow rate information entering the air supply opening; the flow rate regulator is operated according to the gas flow rate information entering the air supply opening to adjust the air flow rate entering the air supply opening. gas flow rate.
具體的,通過所述流速監測部(圖中未標示)獲取進入所述送風開口112的氣體流速資訊;根據所述進入所述送風開口112的氣體流速資訊操作所述流速調節件16,以調節進入所述送風開口112的氣體流速。Specifically, the gas flow rate information entering the
雖然在上文中詳細說明了本發明的實施方式,但是對於本領域的技術人員來說顯而易見的是,能夠對這些實施方式進行各種修改和變化。但是,應理解,這種修改和變化都屬於請求項書中所述的本發明的範圍和精神之內。而且,在此說明的本發明可有其它的實施方式,並且可通過多種方式實施或實現。Although the embodiments of the present invention have been described in detail above, it will be apparent to those skilled in the art that various modifications and changes can be made to the embodiments. However, it should be understood that such modifications and changes are within the scope and spirit of the invention described in the claims. Furthermore, the invention described herein is capable of other embodiments and of being practiced or carried out in various ways.
1:送風元件 11:左送風組件 111:送風腔體 112:送風開口 15:送風導流件 16:流速調節件 17:活動窗口 18:擋板 19:轉動閥 2:連接密封元件 21:外導流腔體 211:外導流頂板 212:外導流底板 2121:第一斜面 2122:第二斜面 22:連接固定件 3:風盒元件 31:勻氣腔體 32:內導流組件 321:左內導流孔板 322:右內導流孔板 33:中間內腔體 341:左內導流腔體 342:右內導流腔體 35:勻氣頂板 36:勻氣底板 37:中心軸線 1: air supply element 11:Left air supply assembly 111: air supply cavity 112: air supply opening 15: Air supply deflector 16: Flow rate regulator 17: Active window 18: Baffle 19: Rotary valve 2: Connect the sealing element 21: Outer guide cavity 211: Outer diversion top plate 212: Outer guide plate 2121: first bevel 2122: second slope 22: Connect the fixture 3: Wind box components 31: Uniform gas cavity 32: Inner diversion components 321:Left inner guide orifice 322: Right inner guide orifice plate 33: Middle inner cavity 341: Left internal diversion cavity 342: Right inner diversion cavity 35: Uniform gas top plate 36: Evening base plate 37: Central axis
圖1為本發明實施例的一種送風系統的結構示意圖; 圖2為圖1所示的送風元件、連接密封元件和一個風盒元件的裝配結構示意圖; 圖3圖1所示的單側送風元件的結構示意圖; 圖4為圖1所示的單個連接密封元件的結構示意圖; 圖5為圖1所示的單個勻氣腔體、單個外導流腔體以及單個送風腔體的裝配結構示意圖; 圖6為圖5所示的勻氣腔體的工作狀態示意圖; 圖7為圖6所示的勻氣腔體的部分內部結構示意圖; 圖8為圖1所示的送風元件局部結構透視圖; 圖9為圖1所示的送風元件內部結構示意圖; 圖10為本發明實施例的連接密封元件與送風元件的裝配結構示意圖。 Fig. 1 is a schematic structural view of an air supply system according to an embodiment of the present invention; Fig. 2 is a schematic diagram of the assembly structure of the air supply element shown in Fig. 1, the connecting sealing element and an air box element; Fig. 3 is a schematic structural diagram of the single-side air supply element shown in Fig. 1; Fig. 4 is a schematic structural view of a single connection sealing element shown in Fig. 1; Fig. 5 is a schematic diagram of the assembly structure of the single gas uniform cavity, the single external flow guide cavity and the single air supply cavity shown in Fig. 1; Fig. 6 is a schematic diagram of the working state of the gas uniform chamber shown in Fig. 5; Fig. 7 is a schematic diagram of part of the internal structure of the uniform gas chamber shown in Fig. 6; Fig. 8 is a perspective view of the partial structure of the air supply element shown in Fig. 1; Fig. 9 is a schematic diagram of the internal structure of the air supply element shown in Fig. 1; Fig. 10 is a schematic diagram of the assembly structure connecting the sealing element and the air supply element according to the embodiment of the present invention.
1:送風元件 1: air supply element
2:連接密封元件 2: Connect the sealing element
3:風盒元件 3: Wind box components
Claims (20)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110855195.8 | 2021-07-28 | ||
CN202110855195.8A CN115672670A (en) | 2021-07-28 | 2021-07-28 | Air supply system and control method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI789866B TWI789866B (en) | 2023-01-11 |
TW202304598A true TW202304598A (en) | 2023-02-01 |
Family
ID=85058408
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW110129383A TWI789866B (en) | 2021-07-28 | 2021-08-10 | Air supply system and its control method |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN115672670A (en) |
TW (1) | TWI789866B (en) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100714985B1 (en) * | 2002-07-19 | 2007-05-09 | 엔테그리스, 아이엔씨. | Liquid flow controller and precision dispense apparatus and system |
US20080108122A1 (en) * | 2006-09-01 | 2008-05-08 | State of Oregon acting by and through the State Board of Higher Education on behalf of Oregon | Microchemical nanofactories |
JP5789546B2 (en) * | 2011-04-26 | 2015-10-07 | 東京エレクトロン株式会社 | Coating processing apparatus, coating and developing processing system, coating processing method, and recording medium recording a program for executing the coating processing method |
US10262880B2 (en) * | 2013-02-19 | 2019-04-16 | Tokyo Electron Limited | Cover plate for wind mark control in spin coating process |
-
2021
- 2021-07-28 CN CN202110855195.8A patent/CN115672670A/en active Pending
- 2021-08-10 TW TW110129383A patent/TWI789866B/en active
Also Published As
Publication number | Publication date |
---|---|
CN115672670A (en) | 2023-02-03 |
TWI789866B (en) | 2023-01-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6380518B2 (en) | Heat treatment apparatus and substrate processing system | |
CN101439925B (en) | On-line film coating environment whole set adjusting device of float glass production line annealing kiln A0 zone | |
KR101204527B1 (en) | A molecule supply source for use in thin-film forming | |
CN112013674B (en) | Vertical furnace apparatus | |
US6736556B2 (en) | Substrate processing apparatus | |
TWI789866B (en) | Air supply system and its control method | |
CN115598928A (en) | Air exhaust system of glue homogenizing and developing unit and control method thereof | |
KR20190067096A (en) | Coating apparatus | |
TW202044461A (en) | Gas bath device and lithography machine capable of improving maintenance and adjustment efficiency | |
US6828246B2 (en) | Gas delivering device | |
TW202011498A (en) | Device of dynamically controlling gas circulation mode and wafer processing method and equipment dynamically adjusting pattern of plasma and state of free radical on wafer surfaces | |
TWI807382B (en) | Gas flow adjustment device and method, and plasma treatment device using the same | |
CN114738840A (en) | High-precision constant-temperature clean room | |
CN112206837A (en) | Test box | |
CN220550228U (en) | Gas flow regulating device suitable for chemical vapor deposition equipment | |
JP2012248579A (en) | Vacuum dryer, substrate drying method using the same and substrate manufactured using the substrate drying method | |
KR101985764B1 (en) | Air conditioner and apparatus for treating substrate the same | |
EP3778034A1 (en) | Gas blowout nozzle and furnace, and method for manufacturing processed film | |
CN213611425U (en) | Test box | |
KR101985754B1 (en) | Air conditioner and apparatus for treating substrate the same | |
CN111574027B (en) | TFT-LCD substrate glass kiln environment control device and control method | |
TWI838177B (en) | Air inlet assembly, process chamber and semiconductor process equipment | |
CN106449342B (en) | Electrode antifouling device and coating system | |
US20220384216A1 (en) | Exhausting device and exhausting method in substrate processing equipment | |
CN220041778U (en) | Flow guiding cavity and semiconductor device |