TW202302763A - Thermally conductive resin composition, thermally conductive resin sheet, multilayer heat dissipation sheet, heat-dissipating circuit board, and power semiconductor device - Google Patents

Thermally conductive resin composition, thermally conductive resin sheet, multilayer heat dissipation sheet, heat-dissipating circuit board, and power semiconductor device Download PDF

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TW202302763A
TW202302763A TW111111372A TW111111372A TW202302763A TW 202302763 A TW202302763 A TW 202302763A TW 111111372 A TW111111372 A TW 111111372A TW 111111372 A TW111111372 A TW 111111372A TW 202302763 A TW202302763 A TW 202302763A
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thermally conductive
boron nitride
conductive resin
aggregated particles
resin sheet
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蛯谷俊昭
渡邉展
鈴木秀次
松井純
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日商三菱化學股份有限公司
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    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
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    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
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Abstract

The present invention provides a thermally conductive resin sheet which has good withstand voltage performance and good thermal conductivity coefficient, while exhibiting excellent reflow resistance after moisture absorption. A thermally conductive resin composition according to one embodiment of the present invention contains a thermoplastic resin and boron nitride agglomerated particles; and if A1 is the intraparticle pore volume of the boron nitride agglomerated particles and B1 is the interparticle volume, both determined by means of a mercury intrusion method, B1/(A1 + B1) is 0.60 or more. A thermally conductive resin sheet is obtained from this composition. A thermally conductive resin sheet according to another embodiment of the present invention is formed from a resin composition that contains a thermoplastic resin and boron nitride agglomerated particles; with respect to the pore size distribution curve as determined by measurement of the residual ash, which is obtained by heating the thermally conductive resin sheet at 700 DEG C for 5 hours, by means of a mercury intrusion method, if a peak that has the maximum value at a pore diameter of less than 5 [mu]m is taken as the first peak, and a peak that has the maximum value at a pore diameter of not less than 5 [mu]m is taken as the second peak, the second peak top height is 1.0 mL/g or more and the second peak top diameter is 15 [mu]m or more.

Description

導熱性樹脂組合物、導熱性樹脂片、積層散熱片、散熱性電路基板及功率半導體裝置Thermally conductive resin composition, thermally conductive resin sheet, laminated heat sink, heat-radiating circuit board, and power semiconductor device

本發明係關於一種導熱性樹脂組合物、導熱性樹脂片、於該導熱性樹脂片表面具備積層散熱用金屬層而成之構成之積層散熱片、進而於該導熱性樹脂片表面具備形成導電電路而成之構成之散熱性電路基板。The present invention relates to a thermally conductive resin composition, a thermally conductive resin sheet, a laminated heat sink formed by laminating a metal layer for heat dissipation on the surface of the thermally conductive resin sheet, and a conductive circuit formed on the surface of the thermally conductive resin sheet. The heat-dissipating circuit substrate formed by it.

近年來,鐵路、汽車、工業用、普通家電用等各領域中使用之功率半導體裝置為了實現更小型化、低成本化、高效率化等,正逐漸由先前之Si功率半導體向使用SiC、AlN、GaN等之功率半導體過渡。 一般而言,功率半導體裝置作為將複數個半導體裝置配設於共通之散熱座上並進行封裝而成之功率半導體模組來利用。 In recent years, power semiconductor devices used in various fields such as railways, automobiles, industrial applications, and general household appliances are gradually changing from the previous Si power semiconductors to SiC and AlN in order to achieve smaller size, lower cost, and higher efficiency. , GaN and other power semiconductor transitions. In general, a power semiconductor device is used as a power semiconductor module in which a plurality of semiconductor devices are arranged on a common heat sink and packaged.

面對此種功率半導體裝置之實用化,指出各種課題。其中之一為來自裝置之發熱問題。藉由使功率半導體裝置於高溫下作動,能夠實現高輸出、高密度化。另一方面,有伴隨裝置之開關所產生之發熱等導致功率半導體裝置之可靠性降低之擔憂。Facing the practical application of such power semiconductor devices, various problems have been pointed out. One of them is the heating problem from the device. By operating the power semiconductor device at high temperature, high output and high density can be realized. On the other hand, there is a concern that the reliability of the power semiconductor device may be lowered due to heat generated by switching of the device or the like.

近年來,尤其於電氣、電子領域中,伴隨集成電路之高密度化所產生之發熱成為大問題,如何散熱成為緊迫之課題。作為解決該課題之一方法,使用氧化鋁基板或氮化鋁基板等導熱性較高之陶瓷基板作為供安裝功率半導體裝置之散熱基板。然而,陶瓷基板存在受到衝擊時易破裂、難以薄膜化且難以小型化等問題。In recent years, especially in the electrical and electronic fields, the heat generated along with the high density of integrated circuits has become a major problem, and how to dissipate heat has become an urgent issue. As one method to solve this problem, a ceramic substrate with high thermal conductivity such as an alumina substrate or an aluminum nitride substrate is used as a heat dissipation substrate for mounting a power semiconductor device. However, ceramic substrates have problems such as being easy to crack when receiving an impact, and difficult to thin and miniaturize.

因此,作為上述陶瓷基板之替代製品,研究了含有樹脂及無機填料之導熱性樹脂片。 其中,作為無機填料,就導熱性等觀點而言,六方晶系氮化硼受到關注。 然而,由於六方晶系氮化硼粒子為板狀,因此於面方向(ab軸方向)上導熱性較高,但於厚度方向(c軸方向)上導熱性較低。於將該六方晶系氮化硼調配至樹脂中而成形為片材之情形時,六方晶系氮化硼易配向於樹脂組合物之流動方向,即片材之面方向,因此所獲得之導熱性樹脂片之面方向之導熱率較高,但厚度方向之導熱率變低。 Therefore, as a substitute product of the above-mentioned ceramic substrate, a thermally conductive resin sheet containing a resin and an inorganic filler has been studied. Among them, hexagonal boron nitride has attracted attention as an inorganic filler from the viewpoint of thermal conductivity and the like. However, since the hexagonal boron nitride particles are plate-shaped, the thermal conductivity in the plane direction (ab-axis direction) is high, but the thermal conductivity in the thickness direction (c-axis direction) is low. When the hexagonal boron nitride is blended into a resin and formed into a sheet, the hexagonal boron nitride is easily aligned in the flow direction of the resin composition, that is, the plane direction of the sheet, so the obtained thermal conductivity The thermal conductivity in the surface direction of the permanent resin sheet is high, but the thermal conductivity in the thickness direction becomes low.

為了對導熱性樹脂片之導熱率之各向異性進行改良,業界研究了如下方法:藉由使用使氮化硼粒子凝集而成之氮化硼凝集粒子而減少粒子之配向。 例如,專利文獻1及2中提出有球狀凝集體,其係利用黏合劑使氮化硼粒子結合後,進行噴霧乾燥而成。 又,專利文獻3中提出有六方晶系氮化硼粒子,其係使六方晶系氮化硼之一次粒子彼此以松果狀集合而成。 進而,專利文獻4中提出有一種造粒粉,其包含藉由使鱗片狀氮化硼凝集而形成之球狀二次粒子,且該二次粒子之芯部中之一次粒子之密度低於外殼部中之一次粒子之密度。 並且,專利文獻5中提出有氮化硼凝集粒子,其係使六方晶系氮化硼之一次粒子凝集而成者,且該氮化硼凝集粒子中之一次粒子彼此具有紙牌屋(card house)構造。 先前技術文獻 專利文獻 In order to improve the anisotropy of the thermal conductivity of the thermally conductive resin sheet, the industry has studied a method of reducing the alignment of the particles by using aggregated boron nitride particles obtained by aggregating boron nitride particles. For example, Patent Documents 1 and 2 propose spherical agglomerates, which are obtained by spray-drying boron nitride particles bound by a binder. Also, Patent Document 3 proposes hexagonal boron nitride particles in which primary particles of hexagonal boron nitride are assembled in a pinecone shape. Furthermore, Patent Document 4 proposes a granulated powder comprising spherical secondary particles formed by aggregating flaky boron nitride, and the density of the primary particles in the core of the secondary particles is lower than that of the shell The density of primary particles in the section. In addition, Patent Document 5 proposes boron nitride aggregated particles in which primary particles of hexagonal boron nitride are aggregated, and the primary particles of the boron nitride aggregated particles have a house of cards. structure. prior art literature patent documents

專利文獻1:日本專利特開2006-257392號公報 專利文獻2:日本專利特表2008-510878號公報 專利文獻3:日本專利特開平09-202663號公報 專利文獻4:日本專利特開2016-044098號公報 專利文獻5:日本專利特開2015-006985號公報 Patent Document 1: Japanese Patent Laid-Open No. 2006-257392 Patent Document 2: Japanese Patent Application Publication No. 2008-510878 Patent Document 3: Japanese Patent Application Laid-Open No. 09-202663 Patent Document 4: Japanese Patent Laid-Open No. 2016-044098 Patent Document 5: Japanese Patent Laid-Open No. 2015-006985

[發明所欲解決之問題][Problem to be solved by the invention]

先前之導熱性樹脂片存在耐電壓性能及導熱率不足之情況。Conventional thermally conductive resin sheets have insufficient withstand voltage performance and thermal conductivity.

又,要求作為功率半導體裝置用途之導熱性樹脂片具有對回焊步驟之耐性。 回焊步驟為組裝功率半導體模組之步驟之一。於該回焊步驟中,藉由將構件急速升溫而使焊料熔融來將金屬構件彼此接合。近年來,隨著功率半導體裝置之高輸出、高密度化,作動溫度不斷上升,從而亦要求上述回焊步驟中使用之焊料具耐熱性,普遍使用需要290℃之回焊溫度之高溫焊料。因此,於回焊步驟中,反覆進行升溫至該高溫焊料開始流動之290℃附近後再進行冷卻之步驟。 此外,存在如下情況:若於進行回焊步驟之前構件吸濕,則會大幅度促進回焊步驟中之構件劣化,從而導致耐電壓性能大幅度降低。 Moreover, the heat conductive resin sheet used as a power semiconductor device is required to have resistance to the reflow process. The reflow step is one of the steps in assembling the power semiconductor module. In this reflow step, the metal members are joined to each other by rapidly raising the temperature of the members to melt the solder. In recent years, with the high output and high density of power semiconductor devices, the operating temperature has continued to rise, thus requiring the solder used in the above reflow step to have heat resistance, and high temperature solder that requires a reflow temperature of 290°C is commonly used. Therefore, in the reflow step, the step of cooling after heating up to around 290° C. where the high-temperature solder starts to flow is repeated. In addition, there are cases where moisture absorption of the member before the reflow step greatly accelerates the deterioration of the member in the reflow step, resulting in a significant drop in withstand voltage performance.

因此,本發明之課題在於提供一種耐電壓性能及導熱率良好,且耐吸濕回焊性優異之導熱性樹脂片。 再者,於本說明書中,「耐吸濕回焊性」係指將導熱性樹脂片製成與金屬板之積層體,於高溫高濕條件(例如85℃、85%RH之環境中3天)下保管後實施回焊試驗(例如290℃),進行該吸濕回焊試驗後,亦具有較高之耐電壓性,且不會發生與金屬板之界面剝離及由導熱性樹脂片之發泡引起之變形。 [解決問題之技術手段] Therefore, an object of the present invention is to provide a thermally conductive resin sheet having good voltage resistance performance and thermal conductivity, and excellent moisture absorption and reflow resistance. Furthermore, in this specification, "resistance to moisture absorption and reflow" refers to a laminate made of a thermally conductive resin sheet and a metal plate, which is subjected to high-temperature and high-humidity conditions (such as 85°C, 85%RH for 3 days) Carry out a reflow test (for example, 290°C) after being stored under low temperature. After the moisture absorption reflow test, it also has a high withstand voltage, and there will be no interface peeling with the metal plate and foaming from the thermally conductive resin sheet. caused deformation. [Technical means to solve the problem]

本發明之一形態之導熱性樹脂組合物係包含熱塑性樹脂及氮化硼凝集粒子之樹脂組合物,於將藉由壓汞法所測得之上述氮化硼凝集粒子之粒子內孔隙容積設為A 1,將粒子間隙容積設為B 1時,B 1/(A 1+B 1)為0.60以上。 又,本發明之另一形態之導熱性樹脂片係含有包含熱塑性樹脂及氮化硼凝集粒子之樹脂組合物者,於藉由壓汞法對將上述導熱性樹脂片於700℃下加熱5小時之時之殘留灰分進行測定所獲得之孔徑分佈曲線中,將於孔徑未達5 μm之範圍具有極大值之峰設為第1峰,將於孔徑為5 μm以上之範圍具有極大值之峰設為第2峰時,第2峰頂高度為1.0 mL/g以上,第2峰頂直徑為15 μm以上。 [發明之效果] A thermally conductive resin composition according to an aspect of the present invention is a resin composition comprising a thermoplastic resin and aggregated boron nitride particles, where the volume of pores in the particles of the aggregated boron nitride particles measured by mercury porosimetry is set to When A 1 and the particle interstitial volume are defined as B 1 , B 1 /(A 1 +B 1 ) is 0.60 or more. In addition, the thermally conductive resin sheet according to another aspect of the present invention contains a resin composition containing a thermoplastic resin and boron nitride aggregated particles, and the thermally conductive resin sheet is heated at 700° C. for 5 hours by mercury porosimetry. In the pore size distribution curve obtained by measuring the residual ash content at the time, the peak with the maximum value in the range of pore diameters less than 5 μm is set as the first peak, and the peak with the maximum value in the range of pore diameters above 5 μm is set as the first peak. When it is the second peak, the height of the second peak top is 1.0 mL/g or more, and the diameter of the second peak top is 15 μm or more. [Effect of Invention]

由本發明之一形態之導熱性樹脂組合物所獲得之導熱性樹脂片之耐電壓性能及導熱率良好,且耐吸濕回焊性優異。 又,本發明之另一形態之導熱性樹脂片之耐電壓性能及導熱率亦良好,且耐吸濕回焊性亦優異。 The thermally conductive resin sheet obtained from the thermally conductive resin composition according to one aspect of the present invention has good withstand voltage performance and thermal conductivity, and is excellent in moisture absorption and reflow resistance. In addition, the thermally conductive resin sheet according to another aspect of the present invention has good withstand voltage performance and thermal conductivity, and is also excellent in moisture absorption reflow resistance.

以下,對本發明之實施方式之一例進行詳細說明。但是,本發明並不限定於以下之實施方式,可於其主旨之範圍內施加各種變化而實施。Hereinafter, an example of the embodiment of the present invention will be described in detail. However, this invention is not limited to the following embodiment, Various changes can be added and implemented within the range of the summary.

<第1實施方式> 1.樹脂組合物 本發明之第1實施方式之導熱性樹脂片包含導熱性樹脂組合物,該導熱性樹脂組合物係包含熱塑性樹脂及氮化硼凝集粒子之樹脂組合物,於將藉由壓汞法所測得之上述氮化硼凝集粒子之粒子內孔隙容積設為A 1,將粒子間隙容積設為B 1時,B 1/(A 1+B 1)為0.60以上。 以下,對各成分進行詳細說明。 <First Embodiment> 1. Resin Composition A thermally conductive resin sheet according to a first embodiment of the present invention includes a thermally conductive resin composition comprising a thermoplastic resin and boron nitride aggregated particles. , when the intraparticle pore volume of the above-mentioned boron nitride aggregated particles measured by mercury intrusion porosimetry is A 1 , and the particle interstitial volume is B 1 , B 1 /(A 1 +B 1 ) is 0.60 or more . Each component will be described in detail below.

(1)熱塑性樹脂 本實施方式之導熱性樹脂組合物中使用之上述熱塑性樹脂較佳為於散熱性電路基板之回焊條件,例如290℃、5分鐘之條件下,亦不易產生由彈性模數之下降引起之樹脂之流動、塑性變形、熱恢復性應變之恢復。為滿足此點,較佳為上述熱塑性樹脂之玻璃轉移溫度(Tg)為300℃以上,或熔點(Tm)為300℃以上。 (1) Thermoplastic resin The above-mentioned thermoplastic resin used in the thermally conductive resin composition of this embodiment is preferably under the reflow conditions of the heat-dissipating circuit board, for example, under the conditions of 290°C and 5 minutes, and it is not easy to produce the resin caused by the decrease of the elastic modulus. The recovery of flow, plastic deformation, and thermal recovery strain. In order to satisfy this point, it is preferable that the glass transition temperature (Tg) of the said thermoplastic resin is 300 degreeC or more, or a melting point (Tm) is 300 degreeC or more.

於上述熱塑性樹脂為包含2種以上之熱塑性樹脂之組合,且包含其等彼此相容之樹脂之樹脂組合物之情形時,該樹脂組合物之玻璃轉移溫度(Tg)較佳為300℃以上,或者該樹脂組合物之熔點(Tm)較佳為300℃以上。 另一方面,上述熱塑性樹脂為包含2種以上之熱塑性樹脂之組合,且包含其等彼此不相容之樹脂之樹脂組合物之情形時,作為該樹脂組合物之主成分之熱塑性樹脂之玻璃轉移溫度(Tg)較佳為300℃以上,或者作為該樹脂組合物之主成分之熱塑性樹脂之熔點(Tm)較佳為300℃以上。 此處,所謂「主成分」意指樹脂組合物之中含有質量比率最高之樹脂,係指占該樹脂組合物之50質量%以上,其中60質量%以上,其中70質量%以上,其中80質量%以上,其中90質量%以上,其中95質量%以上(包含100質量%)之樹脂。 When the above-mentioned thermoplastic resin is a resin composition comprising a combination of two or more thermoplastic resins and resins compatible with each other, the glass transition temperature (Tg) of the resin composition is preferably 300°C or higher, Alternatively, the melting point (Tm) of the resin composition is preferably above 300°C. On the other hand, when the above-mentioned thermoplastic resin is a combination of two or more thermoplastic resins and a resin composition containing resins that are incompatible with each other, the glass transition of the thermoplastic resin that is the main component of the resin composition The temperature (Tg) is preferably 300°C or higher, or the melting point (Tm) of the thermoplastic resin which is the main component of the resin composition is preferably 300°C or higher. Here, the so-called "main component" refers to the resin with the highest mass ratio in the resin composition, which means more than 50% by mass of the resin composition, of which 60% by mass or more, of which 70% by mass or more, of which 80% by mass % or more, of which more than 90% by mass, of which more than 95% by mass (including 100% by mass) of resin.

就上述觀點而言,作為上述熱塑性樹脂,較佳為含有玻璃轉移溫度(Tg)為300℃以上之非晶質熱塑性樹脂及/或熔點(Tm)為300℃以上之晶質熱塑性樹脂。 其中,較佳為玻璃轉移溫度(Tg)為300℃以上之非晶質熱塑性樹脂及/或熔點(Tm)為300℃以上之晶質熱塑性樹脂為上述熱塑性樹脂之主成分,即,占上述熱塑性樹脂整體之50質量%以上。其中進而較佳為占60質量%以上,其中進而較佳為占70質量%以上,其中進而較佳為占80質量%以上,其中進而較佳為占90質量%以上(包含100質量%)。 In view of the above, the thermoplastic resin preferably contains an amorphous thermoplastic resin with a glass transition temperature (Tg) of 300°C or higher and/or a crystalline thermoplastic resin with a melting point (Tm) of 300°C or higher. Among them, it is preferable that an amorphous thermoplastic resin with a glass transition temperature (Tg) of 300°C or higher and/or a crystalline thermoplastic resin with a melting point (Tm) of 300°C or higher are the main components of the above-mentioned thermoplastic resin, that is, account for the above-mentioned thermoplastic resin. More than 50% by mass of the resin as a whole. Among them, it is more preferably at least 60% by mass, even more preferably at least 70% by mass, even more preferably at least 80% by mass, and even more preferably at least 90% by mass (including 100% by mass).

再者,於本發明中,所謂「非晶質熱塑性樹脂」係指不具有熔點之熱塑性樹脂。另一方面,所謂「晶質熱塑性樹脂」係指具有熔點之熱塑性樹脂。Furthermore, in the present invention, the term "amorphous thermoplastic resin" refers to a thermoplastic resin that does not have a melting point. On the other hand, "crystalline thermoplastic resin" refers to a thermoplastic resin having a melting point.

關於能夠作為市售原料而獲取之耐熱性之非晶質熱塑性樹脂,可例舉:聚碳酸酯樹脂(Tg:152℃)、改性聚苯醚樹脂(Tg:211℃)、聚碸樹脂(Tg:190℃)、聚苯碸樹脂(Tg:220℃)、聚醚碸樹脂(Tg:225℃)、聚醚醯亞胺樹脂(Tg:217℃)等。 然而,該等市售之耐熱性非晶質熱塑性樹脂之玻璃轉移溫度均距離300℃以上相去甚遠。 又,市售有玻璃轉移溫度為300℃以上之熱塑性聚醯亞胺樹脂。然而,由於上述熱塑性聚醯亞胺樹脂之可成型溫度非常高,該可成型溫度下之熔融黏度非常高,故而難以大量填充氮化硼凝集粒子。進而,由於分子結構中包含醯亞胺基,故而吸濕性較高,就該等方面而言,用作本實施方式之熱塑性樹脂之主成分欠佳。 Examples of heat-resistant amorphous thermoplastic resins available as commercially available materials include polycarbonate resin (Tg: 152°C), modified polyphenylene ether resin (Tg: 211°C), polycarbonate resin ( Tg: 190°C), polyphenylene resin (Tg: 220°C), polyether resin (Tg: 225°C), polyetherimide resin (Tg: 217°C), etc. However, the glass transition temperatures of these commercially available heat-resistant amorphous thermoplastic resins are far from 300°C or higher. Also, thermoplastic polyimide resins having a glass transition temperature of 300° C. or higher are commercially available. However, since the moldable temperature of the thermoplastic polyimide resin is very high, and the melt viscosity at the moldable temperature is very high, it is difficult to fill a large amount of boron nitride aggregated particles. Furthermore, since imide groups are included in the molecular structure, hygroscopicity is high, and it is unfavorable to be used as the main component of the thermoplastic resin of this embodiment from these points.

根據以上內容,本實施方式之導熱性樹脂組合物中使用之上述熱塑性樹脂較佳為將具有300℃以上之熔點之晶質熱塑性樹脂作為主成分之樹脂。藉由將具有300℃以上之熔點之晶質熱塑性樹脂作為主成分,可獲得作為功率半導體裝置之基板足夠之耐熱耐久性。又,即便填充大量之氮化硼凝集粒子,成形性亦良好,可充分地減少由凝集粒子之形狀或內部空隙引起之片材內部之孔隙、或由樹脂成分或凝集粒子之吸濕引起之片材內部之孔隙,故而絕緣性變得良好。又,具有300℃以上之熔點之晶質熱塑性樹脂不易產生由回焊條件下之彈性模數之下降引起之樹脂之流動、塑性變形、熱恢復性應變之恢復,故而耐吸濕回焊性亦變得良好。From the above, the thermoplastic resin used in the thermally conductive resin composition of the present embodiment is preferably a resin mainly composed of a crystalline thermoplastic resin having a melting point of 300° C. or higher. By using a crystalline thermoplastic resin having a melting point of 300° C. or higher as a main component, sufficient heat resistance durability can be obtained as a substrate of a power semiconductor device. Also, even if a large amount of aggregated boron nitride particles are filled, formability is good, and voids inside the sheet caused by the shape of the aggregated particles or internal voids, or sheets caused by moisture absorption of the resin component or aggregated particles can be sufficiently reduced Pores inside the material, so the insulation becomes good. In addition, crystalline thermoplastic resins with a melting point above 300°C are less prone to flow, plastic deformation, and recovery of thermal recovery strain caused by the decrease in elastic modulus under reflow conditions, so the resistance to moisture absorption and reflow also changes. well.

再者,熱塑性樹脂之熔點可藉由JIS K-7121「塑膠之轉移溫度測定方法-熔解溫度之求解方法」中規定之方法進行測定。具體而言,熱塑性樹脂之熔點係藉由如下方式求出:使用示差掃描熱量計(DSC:例如珀金埃爾默公司製造之「DSC-7」等),將試樣10 mg作為樣本,以加熱速度10℃/分鐘將該熱塑性樹脂組合物自-40℃升溫至380℃,於380℃下保持1分鐘後,以冷卻速度10℃/分鐘降溫至-40℃,於同一溫度下保持1分鐘後,讀取再次以10℃/分鐘升溫時之熔解峰之頂點之溫度(Tpm)作為熔點(Tm)。 作為本實施方式中之晶質熱塑性樹脂,可使用至少能夠明確地確認起因於結晶熔解之吸熱峰、且其峰內之主要峰之頂點之溫度為300℃以上者。 再者,於利用示差掃描熱量計(DSC)對添加有氮化硼凝集粒子之樹脂組合物進行測定之情形時,除了如因添加氮化硼凝集粒子而導致促進基質樹脂之加熱成形時之劣化之情形以外,熔點亦不會產生較大差異。 In addition, the melting point of a thermoplastic resin can be measured by the method stipulated in JIS K-7121 "Measurement method of transition temperature of plastics - Calculation method of melting temperature". Specifically, the melting point of a thermoplastic resin is obtained by using a differential scanning calorimeter (DSC: for example, "DSC-7" manufactured by PerkinElmer, etc.), taking 10 mg of a sample as a sample, and measuring The thermoplastic resin composition was heated from -40°C to 380°C at a heating rate of 10°C/min, kept at 380°C for 1 minute, then cooled to -40°C at a cooling rate of 10°C/min, and kept at the same temperature for 1 minute Thereafter, the temperature (Tpm) at the top of the melting peak when the temperature was raised again at 10° C./min was read as the melting point (Tm). As the crystalline thermoplastic resin in this embodiment, at least an endothermic peak due to crystal melting can be clearly confirmed, and the temperature of the apex of the main peak within the peak is 300° C. or higher. Furthermore, in the case of measuring the resin composition with boron nitride aggregated particles added using a differential scanning calorimeter (DSC), in addition to the degradation of the thermoforming of the matrix resin due to the addition of boron nitride aggregated particles In addition to the case, the melting point will not produce a big difference.

就290℃之耐吸濕回焊性之觀點而言,上述晶質熱塑性樹脂之熔點更佳為310℃以上,其中進而較佳為320℃以上,其中進而更佳為30℃以上。另一方面,熔點之上限並無特別限定。其中,就成型加工性、生產性之觀點而言,更佳為380℃以下,其中進而較佳為370℃以下,其中進而更佳為360℃以下。From the viewpoint of moisture absorption reflow resistance at 290°C, the melting point of the crystalline thermoplastic resin is more preferably 310°C or higher, more preferably 320°C or higher, and still more preferably 30°C or higher. On the other hand, the upper limit of the melting point is not particularly limited. Among them, from the viewpoint of moldability and productivity, it is more preferably 380°C or lower, especially preferably 370°C or lower, and even more preferably 360°C or lower.

藉由使上述熱塑性樹脂之熔點為300℃以上,即便於回焊條件之290℃下樹脂原料之彈性模數亦不易變低。因此,可抑制於回焊步驟中產生樹脂之流動變形,樹脂層之彈性應變亦難以復原,因此可抑制導熱性樹脂片之表面外觀劣化、或導熱性樹脂片之厚度變得不均勻,可獲得具有足夠強度之導熱性樹脂片。 又,由於在290℃下樹脂原料之彈性模數不易變低,因此即便於在濕熱環境下樹脂組合物吸濕,樹脂組合物中存在水分之情形時,於回焊步驟或安裝至模組之步驟中,樹脂組合物內之水分亦不易膨脹,導熱性樹脂片不易產生發泡,故而耐電壓性能及導熱率變得良好。 By setting the melting point of the thermoplastic resin above 300° C., the modulus of elasticity of the resin material is less likely to decrease even at 290° C. under the reflow condition. Therefore, the flow deformation of the resin in the reflow step can be suppressed, and the elastic strain of the resin layer is also difficult to recover, so that the deterioration of the surface appearance of the thermally conductive resin sheet or the uneven thickness of the thermally conductive resin sheet can be suppressed, and it is possible to obtain Thermally conductive resin sheet with sufficient strength. In addition, since the modulus of elasticity of the resin material is not likely to decrease at 290°C, even if the resin composition absorbs moisture in a hot and humid environment and there is moisture in the resin composition, it will not In the step, the moisture in the resin composition is not easy to expand, and the thermally conductive resin sheet is not easy to generate foaming, so the withstand voltage performance and thermal conductivity become good.

再者,認為回焊步驟中之導熱性樹脂片內之發泡與耐電壓性能及導熱率例如有如下關聯。 若由於回焊步驟或安裝至模組之步驟而使樹脂組合物內之水分膨脹,則存在於導熱性樹脂片內部、散熱用金屬層與導熱性樹脂片之界面附近、或者導電電路圖案與導熱性樹脂片之界面附近產生發泡之情況。 例如,於導熱性樹脂片內部產生發泡之情形時,有耐電壓性能明顯降低之虞。 於在導熱性樹脂片之一表面積層有散熱用金屬材料之情形時,若於該散熱用金屬材料與導熱性樹脂片之界面附近產生發泡,則有該散熱用金屬材料剝離、導熱率明顯降低之虞。 又,於在導熱性樹脂片之另一表面形成有導電電路圖案之情形時,若於該導電電路圖案與導熱性樹脂片之界面附近產生發泡,則有該導電電路圖案剝離或脫落、或者電路中產生異常、或者導熱性樹脂片之導熱率明顯降低之虞。 Furthermore, it is considered that the foaming in the thermally conductive resin sheet in the reflow process is related to the withstand voltage performance and thermal conductivity, for example, as follows. If the moisture in the resin composition expands due to the reflow process or the process of mounting to the module, it will exist inside the thermally conductive resin sheet, near the interface between the metal layer for heat dissipation and the thermally conductive resin sheet, or between the conductive circuit pattern and the thermally conductive The case where foaming occurs near the interface of the permanent resin sheet. For example, when foaming occurs inside the thermally conductive resin sheet, there is a possibility that the withstand voltage performance may be significantly lowered. When there is a metal material for heat dissipation layered on the surface of the thermally conductive resin sheet, if foaming occurs near the interface between the metal material for heat dissipation and the thermally conductive resin sheet, the metal material for heat dissipation will be peeled off and the thermal conductivity will be significant. risk of reduction. Also, when a conductive circuit pattern is formed on the other surface of the thermally conductive resin sheet, if foaming occurs near the interface between the conductive circuit pattern and the thermally conductive resin sheet, the conductive circuit pattern may peel or fall off, or There is a possibility that an abnormality occurs in the circuit, or the thermal conductivity of the thermally conductive resin sheet decreases significantly.

作為耐熱性之晶質熱塑性樹脂,具體而言,可例舉:聚對苯二甲酸丁二酯樹脂(PBT,熔點:224℃)、聚醯胺6(尼龍6,熔點:225℃)、聚醯胺66(尼龍66,熔點:265℃)、液晶聚合物(LCP,熔點:320℃~344℃)、聚醚酮系樹脂(熔點:303℃~400℃)、聚四氟烯樹脂(PTFE,熔點:327℃)、四氟乙烯-全氟烷氧基乙烯共聚物樹脂(PFA,熔點:302℃~310℃)、四氟乙烯-六氟丙烯共聚樹脂(FEP,熔點:250℃~290℃)等。Specific examples of heat-resistant crystalline thermoplastic resins include polybutylene terephthalate resin (PBT, melting point: 224°C), polyamide 6 (nylon 6, melting point: 225°C), polyamide 6 (nylon 6, melting point: 225°C), Amide 66 (nylon 66, melting point: 265°C), liquid crystal polymer (LCP, melting point: 320°C to 344°C), polyetherketone resin (melting point: 303°C to 400°C), polytetrafluoroene resin (PTFE , melting point: 327℃), tetrafluoroethylene-perfluoroalkoxyethylene copolymer resin (PFA, melting point: 302℃~310℃), tetrafluoroethylene-hexafluoropropylene copolymer resin (FEP, melting point: 250℃~290 ℃), etc.

作為本實施方式中使用之晶質熱塑性樹脂,就具有300℃以上之熔點之方面而言,較佳為液晶聚合物、聚醚酮系樹脂、PTFE、PFA。 該等具有300℃以上之熔點之晶質熱塑性樹脂之中,就成形性等觀點而言,特佳為液晶聚合物及/或聚醚酮系樹脂。進而,其中,就與以銅板為代表之散熱用金屬層之接著性之觀點而言,較佳為聚醚酮系樹脂。 As the crystalline thermoplastic resin used in the present embodiment, liquid crystal polymers, polyether ketone resins, PTFE, and PFA are preferable in terms of having a melting point of 300° C. or higher. Among these crystalline thermoplastic resins having a melting point of 300° C. or higher, liquid crystal polymers and/or polyetherketone resins are particularly preferred from the viewpoint of moldability and the like. Furthermore, among these, polyether ketone resin is preferable from the viewpoint of the adhesiveness with the metal layer for heat dissipation represented by a copper plate.

本實施方式中可使用之聚醚酮系樹脂係具有下述式(1)(式中之m、n為1或2)所表示之重複單元之熱塑性樹脂之統稱。The polyether ketone resins usable in this embodiment are collectively referred to as thermoplastic resins having repeating units represented by the following formula (1) (in which m and n are 1 or 2).

[化1]

Figure 02_image001
[chemical 1]
Figure 02_image001

作為聚醚酮系樹脂,可例示:聚醚酮(PEK;m=1、n=1,熔點373℃)、聚醚醚酮(PEEK;m=2、n=1,熔點343℃)、聚醚酮酮(PEKK;m=1、n=2,熔點303℃~400℃)、聚醚醚酮酮(PEEKK;m=2、n=2,熔點358℃)、聚醚酮醚酮酮(PEKEKK;包含m=1、n=1之結構單元與m=1、n=2之結構單元兩者之共聚物,熔點387℃)等。均可作為市售原料而獲取。Examples of polyetherketone-based resins include polyetherketone (PEK; m=1, n=1, melting point 373°C), polyetheretherketone (PEEK; m=2, n=1, melting point 343°C), polyetheretherketone (PEEK; m=2, n=1, melting point 343°C), Ether ketone ketone (PEKK; m=1, n=2, melting point 303°C-400°C), polyetheretherketone ketone (PEEKK; m=2, n=2, melting point 358°C), polyetheretherketone ketone ( PEKEKK; a copolymer comprising structural units of m=1, n=1 and structural units of m=1, n=2, melting point 387° C.) and the like. All can be obtained as commercially available raw materials.

聚醚酮系樹脂之中,綜合考慮熔點足夠高、且成型加工溫度相對較低而可縮短成型週期之方面、已證實連續耐熱溫度為200℃以上且可無障礙地用於耐熱用途之方面、關於與成型加工性有關之熔融黏度已準備有各種等級之方面、聚醚酮系樹脂之中構造之化學穩定性最高、耐熱水性或耐化學品性亦優異之方面、利用用途廣泛而價格公開等方面,可尤佳地使用聚醚醚酮(PEEK)。Among the polyether ketone resins, comprehensively considering that the melting point is sufficiently high, and the molding processing temperature is relatively low so that the molding cycle can be shortened, the continuous heat-resistant temperature has been confirmed to be above 200°C, and it can be used for heat-resistant applications without hindrance, There are various grades of melt viscosity related to molding processability, the chemical stability of the structure is the highest among polyether ketone resins, the hot water resistance and chemical resistance are also excellent, and the price is disclosed for a wide range of applications, etc. Aspects, polyetheretherketone (PEEK) can be used particularly preferably.

於使用聚醚醚酮(PEEK)作為本實施方式之晶質熱塑性樹脂之情形時,亦可與其他熱塑性樹脂摻合。 其他熱塑性樹脂之種類並無特別限定。其中,作為其他熱塑性樹脂,較佳為具有對僅將聚醚醚酮用於本實施方式之用途之情形時所欠缺之性能加以補充之效果的相溶系之樹脂。 In the case of using polyetheretherketone (PEEK) as the crystalline thermoplastic resin of this embodiment, it may be blended with other thermoplastic resins. The types of other thermoplastic resins are not particularly limited. Among them, other thermoplastic resins are preferably compatible resins that have the effect of supplementing the performance that is lacking when only polyether ether ketone is used for the application of the present embodiment.

作為該相溶系之樹脂,更佳為聚醚醯亞胺(PEI)。 若將PEEK與PEI加以組合,則不僅可調整PEEK之結晶性(結晶熔解熱量),且可於調整PEEK之結晶化速度之同時,提高樹脂組合物處於非晶狀態之情形時之玻璃轉移溫度(PEEK之Tg為143℃,相對於此,PEI之Tg為217℃)。 再者,由於PEI為非晶性樹脂,故而即便將PEEK與PEI加以組合,亦不會使樹脂之熔點本身發生變化。 並且,於本發明中,藉由使用具有醯亞胺基且為非晶性之PEI,可使對銅板等散熱用金屬材料之接著性變得良好。 The compatible resin is more preferably polyetherimide (PEI). If PEEK and PEI are combined, not only the crystallinity of PEEK (crystal melting heat) can be adjusted, but also the glass transition temperature ( The Tg of PEEK is 143°C, whereas the Tg of PEI is 217°C). Furthermore, since PEI is an amorphous resin, even if PEEK and PEI are combined, the melting point of the resin itself will not change. Furthermore, in the present invention, by using the non-crystalline PEI having an imide group, the adhesion to metal materials for heat dissipation such as copper plates can be improved.

將樹脂組合物之總量設為100質量%,PEI之添加量較佳為50質量%以下。藉由將PEI之添加量設為50質量%以下,可藉由PEEK之結晶性而維持吸濕回焊試驗中之耐熱性,並且使對散熱用金屬材料之接著性變得良好。Assuming that the total amount of the resin composition is 100% by mass, the amount of PEI added is preferably 50% by mass or less. By setting the amount of PEI added to 50% by mass or less, the crystallinity of PEEK maintains the heat resistance in the moisture absorption reflow test, and the adhesion to the metal material for heat dissipation becomes good.

PEEK可使用各種市售品。例如作為Solvay公司製造之「KetaSpire(註冊商標)」、Daicel-Evonik公司製造之「VESTAKEEP(註冊商標)」、Victrex公司製造之「Victrex PEEK」等,可自各公司獲取各種熔融黏度者。 該等PEEK原料可使用單一等級者,亦可將熔融黏度等不同之多種等級者摻合使用。 Various commercially available products can be used for PEEK. For example, "KetaSpire (registered trademark)" manufactured by Solvay, "VESTAKEEP (registered trademark)" manufactured by Daicel-Evonik, "Victrex PEEK" manufactured by Victrex, etc. are available from various companies with various melt viscosities. These PEEK raw materials can be used in a single grade, or blended with different grades such as melt viscosity.

本實施方式中之晶質熱塑性樹脂之熔融黏度並無特別限定。其中,由於相對大量地調配氮化硼凝集粒子,因此為了使加熱成形加工變得容易,上述晶質熱塑性樹脂之熔融黏度較佳為0.60 kPa・s以下,更佳為0.30 kPa・s以下。藉由使熔融黏度處於上述範圍內,無需將成形機之溫度設定得過高即可抑制原料之劣化。另一方面,熔融黏度之下限並無特別限定。其中,較佳為0.01 kPa・s以上。 再者,熔融黏度係依據ASTM D3835,於剪切速率1000 s -1、溫度400℃之條件下所測得之值。 The melt viscosity of the crystalline thermoplastic resin in this embodiment is not particularly limited. Among them, since a relatively large amount of boron nitride aggregated particles is blended, the melt viscosity of the above-mentioned crystalline thermoplastic resin is preferably 0.60 kPa·s or less, more preferably 0.30 kPa·s or less, in order to facilitate thermoforming. By setting the melt viscosity within the above range, the deterioration of the raw material can be suppressed without setting the temperature of the molding machine too high. On the other hand, the lower limit of the melt viscosity is not particularly limited. Among them, 0.01 kPa·s or more is preferable. Furthermore, the melt viscosity is a value measured under the conditions of a shear rate of 1000 s −1 and a temperature of 400° C. according to ASTM D3835.

就加熱環境下之長期耐久性之觀點而言,晶質熱塑性樹脂之質量平均分子量(Mw)較佳為48000以上,其中進而較佳為49000以上,其中進而更佳為50000以上。另一方面,就成型加工性之觀點而言,較佳為120000以下,其中進而較佳為110000以下,其中進而更佳為100000以下。From the viewpoint of long-term durability in a heated environment, the mass average molecular weight (Mw) of the crystalline thermoplastic resin is preferably at least 48,000, more preferably at least 49,000, and even more preferably at least 50,000. On the other hand, from the viewpoint of moldability, it is preferably 120,000 or less, more preferably 110,000 or less, and even more preferably 100,000 or less.

就成型加工性、或與所添加之氮化硼凝集粒子之間不易形成空隙之方面而言,晶質熱塑性樹脂之MFR(Melt mass-flow rate,熔體流動速率)較佳為8 g/10分鐘以上,其中進而較佳為9 g/10分鐘以上,其中進而更佳為10 g/10分鐘以上。另一方面,就加熱環境下之長期耐久性之觀點而言,較佳為180 g/10分鐘以下,其中進而較佳為170 g/10分鐘以下,其中進而更佳為160 g/10分鐘以下。 再者,MFR係依據JIS K7210:2014於380℃・5 kgf下所測得之值。 In terms of molding processability or the difficulty of forming voids with the added boron nitride aggregated particles, the MFR (Melt mass-flow rate) of the crystalline thermoplastic resin is preferably 8 g/10 minutes or more, more preferably 9 g/10 minutes or more, and even more preferably 10 g/10 minutes or more. On the other hand, from the viewpoint of long-term durability in a heated environment, it is preferably not more than 180 g/10 minutes, more preferably not more than 170 g/10 minutes, and even more preferably not more than 160 g/10 minutes . In addition, MFR is a value measured at 380°C and 5 kgf in accordance with JIS K7210:2014.

(2)氮化硼凝集粒子 本實施方式之氮化硼凝集粒子於將藉由壓汞法所測得之上述氮化硼凝集粒子之粒子內孔隙容積設為A 1,將粒子間隙容積設為B 1時,B 1/(A 1+B 1)較佳為0.60以上。 再者,於本發明中,氮化硼凝集粒子之粒子內孔隙容積及粒子間隙容積係分別依據JIS R1655:2003,並藉由實施例中記載之方法而求出。 具體而言,首先,準備200 mg氮化硼凝集粒子,藉由壓汞法測定水銀壓入退出曲線。繼而,如圖1所例示般,製作將孔徑作為橫軸,將對數微分孔隙容積作為縱軸之孔徑分佈曲線。通常於未達5 μm,較佳為0.1 μm以上且未達5 μm之範圍內觀察到來自粒子內孔之峰a,通常於5 μm以上,較佳為5 μm以上100 μm以下之範圍內觀察到來自粒子間孔之峰b。讀取於該等峰a與峰b之間對數微分孔隙容積相對於孔徑取極小值之直徑(分割直徑,圖1中之X)。孔徑大於該分割直徑之區域(圖1中之虛線箭頭)處之水銀壓入退出曲線之積分值成為粒子間隙容積。 又,整個測定區域中之水銀壓入退出曲線之積分值成為總孔隙容積,該總孔隙容積減去上述粒子間隙容積所得到之值為粒子內孔隙容積。 (2) Boron nitride aggregated particles In the boron nitride aggregated particles of the present embodiment, the pore volume in the particles of the above-mentioned boron nitride aggregated particles measured by mercury porosimetry is A 1 , and the particle interstitial volume is In the case of B 1 , B 1 /(A 1 +B 1 ) is preferably 0.60 or more. In addition, in the present invention, the intraparticle pore volume and the interparticle interstitial volume of boron nitride aggregated particles were obtained by the methods described in the examples in accordance with JIS R1655:2003, respectively. Specifically, first, 200 mg of boron nitride aggregated particles were prepared, and mercury intrusion and exit curves were measured by mercury intrusion porosimetry. Next, as illustrated in FIG. 1 , a pore size distribution curve with the pore diameter as the horizontal axis and the logarithmic differential pore volume as the vertical axis was created. Usually, the peak a from the inner pores of the particles is observed within the range of less than 5 μm, preferably more than 0.1 μm and less than 5 μm, and is usually observed at the range of more than 5 μm, preferably more than 5 μm and less than 100 μm. Peak b of interparticle pores. Read the diameter at which the logarithmic differential pore volume takes the minimum value with respect to the pore diameter (cut diameter, X in FIG. 1 ) between these peaks a and b. The integral value of the mercury intrusion and exit curve at the region where the pore diameter is larger than the split diameter (dashed arrow in Fig. 1) becomes the particle interstitial volume. In addition, the integrated value of the mercury intrusion and exit curve in the entire measurement area becomes the total pore volume, and the value obtained by subtracting the above-mentioned particle interstitial volume from the total pore volume is the intraparticle pore volume.

於圖2中,粒子內孔隙容積為除存在於凝集粒子之內部之孔α中之未壓入水銀之閉合孔等以外者。該粒子內孔隙容積為由構成凝集粒子之氮化硼一次粒子之緻密性、平均縱橫比、粒子厚度等而確定之數值,與氮化硼凝集粒子之機械物性或凝集粒子內部之導熱性等有關。 若適度縮小粒子內孔隙容積,則凝集粒子中不存在過多之熱阻變大之空隙,故而有可有效率地提高凝集粒子內部之導熱之傾向。進而,可提高凝集粒子之強度,例如於藉由加壓成形而製作片材之情形時,亦不會出現凝集粒子本身被壓碎或過度變形之情況,凝集粒子之各向同性得以維持,因此可有效地抑制導熱性樹脂片之厚度方向之導熱率下降。 另一方面,若適度增大粒子內孔隙容積,則可充分地確保樹脂浸透於凝集粒子之內部孔中,從而可抑制於導熱性樹脂片中產生孔隙,故而有耐電壓性能變得良好之傾向。 In Fig. 2, the pore volume in the particles is excluding the closed pores which are not filled with mercury and the like which exist in the pores α inside the aggregated particles. The pore volume in the particles is a value determined by the density, average aspect ratio, and particle thickness of the boron nitride primary particles that constitute the aggregated particles, and is related to the mechanical properties of the boron nitride aggregated particles or the thermal conductivity inside the aggregated particles, etc. . If the pore volume in the particles is appropriately reduced, there will not be too many voids in the aggregated particles that increase the thermal resistance, so there is a tendency to effectively improve the heat conduction inside the aggregated particles. Furthermore, the strength of the aggregated particles can be improved. For example, when a sheet is produced by press molding, the aggregated particles themselves will not be crushed or excessively deformed, and the isotropy of the aggregated particles can be maintained. Therefore, The decrease in thermal conductivity in the thickness direction of the thermally conductive resin sheet can be effectively suppressed. On the other hand, if the pore volume in the particles is appropriately increased, it is possible to sufficiently ensure that the resin penetrates into the internal pores of the aggregated particles, thereby suppressing the generation of pores in the thermally conductive resin sheet, so there is a tendency for the withstand voltage performance to become better. .

就以上觀點而言,粒子內孔隙容積A 1較佳為0.30 mL/g以上,更佳為0.35 mL/g以上,進而較佳為0.40 mL/g以上,進而更佳為0.42 mL/g以上。又,粒子內孔隙容積A 1較佳為0.80 mL/g以下,更佳為0.70 mL/g以下,進而較佳為0.60 mL/g以下,進而更佳為0.55 mL/g以下,尤佳為0.50 mL/g以下。 From the above point of view, the particle internal pore volume A 1 is preferably at least 0.30 mL/g, more preferably at least 0.35 mL/g, still more preferably at least 0.40 mL/g, still more preferably at least 0.42 mL/g. In addition, the particle internal pore volume A1 is preferably 0.80 mL/g or less, more preferably 0.70 mL/g or less, further preferably 0.60 mL/g or less, still more preferably 0.55 mL/g or less, especially preferably 0.50 mL/g or less. Below mL/g.

於圖3中,粒子間隙容積係存在於凝集粒子之間之孔β,一般表示起因於凝集粒子之形狀或粒徑及其分佈之堆積程度。然而,關於氮化硼凝集粒子,除上述外,亦指綜合考慮到凝集粒子表面之一次粒子之配向狀態(一次粒子面配向於凝集粒子之放射方向亦或是配向於凝集粒子之圓周面方向等)、或表面一次粒子之緻密性、平均縱橫比或粒子厚度等而得到之數值,進而,亦與構成凝集粒子整體之一次粒子之緻密性、平均縱橫比或粒子厚度等有關。其原因在於,於如一次粒子之尺寸過大且缺乏緻密性之情形等,因凝集粒子本身強度不足,而導致於進行與樹脂摻和之前之各種操作時,粒子被破壞,或者表面一次粒子脫落,於藉由壓汞法進行測定時,會出現因該等破碎而產生之粒子之碎片、或單離之一次粒子填補到凝集粒子間之間隙之情況。In Fig. 3, the particle interstitial volume refers to the pores β existing between aggregated particles, and generally indicates the degree of accumulation caused by the shape, particle size, and distribution of aggregated particles. However, regarding boron nitride aggregated particles, in addition to the above, it also refers to the alignment state of the primary particles on the surface of the aggregated particles (primary particles are aligned in the radial direction of the aggregated particles or aligned in the direction of the circumferential surface of the aggregated particles, etc.) ), or the density, average aspect ratio, or particle thickness of primary particles on the surface, and furthermore, it is also related to the density, average aspect ratio, or particle thickness of primary particles constituting the aggregated particles as a whole. The reason is that, in the case where the size of the primary particles is too large and lacks compactness, etc., the strength of the aggregated particles themselves is insufficient, so that the particles are destroyed or the surface primary particles fall off during various operations before being blended with the resin. In measurement by mercury porosimetry, fragments of particles generated by such crushing or isolated primary particles may fill the gaps between aggregated particles.

此處,使用圖4~圖7更詳細地說明粒子間隙容積。 例如,如圖4及圖5所示,於具有凝集粒子之最外表面附近之一次粒子之厚度方向(c軸方向)與凝集粒子之放射方向一致之構造之情形時,有粒子間隙容積變小之傾向。此種凝集粒子具有如下優點:於藉由濕式塗佈法製作導熱性樹脂片時之塗佈性良好,容易獲得孔隙殘留較少之片材;但另一方面存在如下情況:由於最外表面附近之一次粒子以覆蓋凝集粒子之方式存在,而使得凝集粒子表面與樹脂之界面、或複數個凝集粒子之接觸界面處之熱阻增大。 又,於複數個凝集粒子以相接觸之方式填充於導熱性樹脂片內之情形時,圖4及圖5所示之凝集粒子彼此於各自之凝集粒子之表面部分經由一次粒子之厚度方向(c軸方向)實現導熱。由於一次粒子之厚度方向之導熱率較低,因此導熱性樹脂片之厚度方向之導熱率有限。 又,例如於如構成凝集粒子之一次粒子過大且缺乏緻密性之情形時,粒子間隙容積亦會變小。由於此種凝集粒子之強度不足,因此例如於藉由加壓成形製作片材之情形時,有凝集粒子被破壞,或表面一次粒子脫落之虞。由於該單離之一次粒子為平板狀或鱗片狀,因此存在粒子之厚度方向(c軸方向)配向於片材之面方向,導致導熱性樹脂片之厚度方向之導熱率下降之情況。 Here, the particle interstitial volume will be described in more detail using FIGS. 4 to 7 . For example, as shown in Fig. 4 and Fig. 5, when there is a structure in which the thickness direction (c-axis direction) of the primary particles near the outermost surface of the aggregated particles coincides with the radiation direction of the aggregated particles, the interstitial volume of the particles becomes smaller. tendency. Such aggregated particles have the following advantages: when the thermally conductive resin sheet is produced by the wet coating method, the coatability is good, and it is easy to obtain a sheet with less remaining pores; The nearby primary particles exist in such a way as to cover the aggregated particles, so that the thermal resistance at the interface between the surface of the aggregated particles and the resin, or at the contact interface of a plurality of aggregated particles increases. Also, when a plurality of aggregated particles are filled in the thermally conductive resin sheet in contact with each other, the aggregated particles shown in FIG. 4 and FIG. 5 pass through the thickness direction of the primary particle (c axial direction) to achieve heat conduction. Since the thermal conductivity in the thickness direction of the primary particles is low, the thermal conductivity in the thickness direction of the thermally conductive resin sheet is limited. Also, for example, when the primary particles constituting the aggregated particles are too large and lack compactness, the volume of the particle interstitial will also become small. Since the strength of such aggregated particles is insufficient, for example, when a sheet is produced by press molding, the aggregated particles may be broken or surface primary particles may fall off. Since the isolated primary particles are flat or scaly, the thickness direction (c-axis direction) of the particles may be aligned with the surface direction of the sheet, resulting in a decrease in thermal conductivity in the thickness direction of the thermally conductive resin sheet.

另一方面,例如,如圖6及圖7所示,於具有凝集粒子之最外表面附近之一次粒子之面方向(ab軸方向)與凝集粒子之放射方向一致之構造,且該等經配向之表面一次粒子緻密地存在之情形時,有粒子間隙容積變大之傾向。 與最外表面附近之一次粒子以覆蓋凝集粒子之方式存在之凝集粒子相比,於將此種凝集粒子以複數個凝集粒子於導熱性樹脂片內相接觸之方式填充之情形時,粒子彼此之接觸面積增大。因此,粒子間之熱阻降低,故而導熱性樹脂片之厚度方向之導熱率變高。又,若粒子間隙容積較大,則於假設粒子內孔隙容積、平均粒徑及粒徑分佈相同之情形時,藉由片材成形等加壓步驟,複數個凝集粒子之接觸面如圖9所示發生變形,多面體彼此接觸而使接觸面積增加,形成面接觸之類之狀態,因此粒子間之熱阻進一步減小。 又,例如於如構成凝集粒子之一次粒子適度小且緻密之情形時,粒子間隙容積亦會變大。由於此種凝集粒子之強度良好,因此防止於成形時等凝集粒子被破壞或表面一次粒子脫落。藉此,可抑制一次粒子單離,故而可使導熱性樹脂片之厚度方向之導熱率變得良好。 On the other hand, for example, as shown in FIG. 6 and FIG. 7 , in the vicinity of the outermost surface of aggregated particles, there is a structure in which the plane direction (ab-axis direction) of primary particles coincides with the radiation direction of aggregated particles, and the aligned When primary particles exist densely on the surface, the volume of interparticle spaces tends to increase. Compared with the aggregated particles in which the primary particles near the outermost surface cover the aggregated particles, when such aggregated particles are filled in such a manner that a plurality of aggregated particles are in contact with each other in the thermally conductive resin sheet, the distance between the particles The contact area increases. Therefore, since the thermal resistance between particles falls, the thermal conductivity of the thickness direction of a thermally conductive resin sheet becomes high. Also, if the particle interstitial volume is large, assuming that the particle internal pore volume, average particle size, and particle size distribution are the same, the contact surface of a plurality of aggregated particles is shown in Figure 9 through sheet forming and other pressurization steps. It shows that deformation occurs, and the polyhedrons contact each other to increase the contact area, forming a state of surface contact, so the thermal resistance between the particles is further reduced. Also, for example, when the primary particles constituting the aggregated particles are moderately small and dense, the interparticle interstitial volume also becomes large. Since such aggregated particles have good strength, it is possible to prevent the aggregated particles from being broken or the surface primary particles fall off during molding. Thereby, since primary particle isolation|separation can be suppressed, the thermal conductivity of the thickness direction of a thermally conductive resin sheet can be made favorable.

就以上觀點而言,粒子間隙容積B 1較佳為0.50 mL/g以上,更佳為0.55 mL/g以上,進而較佳為0.60 mL/g以上,進而更佳為0.65 mL/g以上。進而,較佳為0.70 mL/g以上,更佳為0.75 mL/g以上,進而較佳為0.80 mL/g以上,進而更佳為0.85 mL/g以上。又,粒子間隙容積B 1較佳為1.0 mL/g以下,更佳為0.95 mL/g以下,進而較佳為0.90 mL/g以下。 From the above viewpoints, the particle interstitial volume B 1 is preferably at least 0.50 mL/g, more preferably at least 0.55 mL/g, still more preferably at least 0.60 mL/g, still more preferably at least 0.65 mL/g. Furthermore, it is preferably at least 0.70 mL/g, more preferably at least 0.75 mL/g, still more preferably at least 0.80 mL/g, still more preferably at least 0.85 mL/g. Also, the particle interstitial volume B 1 is preferably 1.0 mL/g or less, more preferably 0.95 mL/g or less, still more preferably 0.90 mL/g or less.

本實施方式中之B 1/(A 1+B 1)表示粒子間隙容積相對於總孔隙容積之比率。B 1/(A 1+B 1)較佳為0.60以上,更佳為0.62以上,進而較佳為0.64以上,進而更佳為0.66以上。又,B 1/(A 1+B 1)較佳為未達1.00,更佳為0.90以下,進而較佳為0.80以下,進而更佳為0.75以下,尤佳為0.70以下。 如上所述,由粒子內孔隙容積或粒子間隙容積表示之凝集粒子之強度、一次粒子之配向狀態等會影響耐電壓性能或導熱率。本發明人等發現粒子內孔隙容積與粒子間隙容積之平衡會對其等產生影響。 更具體而言,藉由使B 1/(A 1+B 1)處於上述範圍內,作為凝集粒子具有足夠之強度,因此可防止於成形時等凝集粒子崩解,並且由於凝集粒子表面之一次粒子呈放射狀配向,因此可充分地形成凝集粒子間之導熱路徑。此外,若B 1/(A 1+B 1)處於上述範圍內,則具有可謂「內剛外柔」之構造,即,於凝集粒子內部緻密且維持具備各向同性之導熱率之構造之狀態下,凝集粒子表面之一次粒子呈放射狀配向之區域於成形時等適度變形,因此相鄰接之凝集粒子彼此之接觸面積增加,可進一步提高導熱性樹脂片之厚度方向之導熱率。 又,若B 1/(A 1+B 1)處於上述範圍內,則凝集粒子內部緻密,並且樹脂充分地浸透於粒子內,故而可抑制於成形時產生孔隙,亦可進一步提昇耐電壓性能。 B 1 /(A 1 +B 1 ) in this embodiment represents the ratio of the particle interstitial volume to the total pore volume. B 1 /(A 1 +B 1 ) is preferably at least 0.60, more preferably at least 0.62, still more preferably at least 0.64, still more preferably at least 0.66. Also, B 1 /(A 1 +B 1 ) is preferably less than 1.00, more preferably at most 0.90, further preferably at most 0.80, still more preferably at most 0.75, and most preferably at most 0.70. As described above, the strength of aggregated particles, the alignment state of primary particles, etc. represented by the pore volume in the particles or the interstitial volume between particles affect the withstand voltage performance or thermal conductivity. The inventors of the present invention have found that the balance of the volume of pores in particles and the volume of interstices between particles affects them. More specifically, by setting B 1 /(A 1 + B 1 ) within the above range, the aggregated particles have sufficient strength, so that the aggregated particles can be prevented from disintegrating during molding, and since the primary particles on the surface of the aggregated particles It is radially aligned, so it can fully form the heat conduction path between the aggregated particles. In addition, if B 1 /(A 1 +B 1 ) is within the above range, it has a structure that can be called "hard on the inside and soft on the outside", that is, in the state where the inside of the aggregated particles is dense and maintains a structure with isotropic thermal conductivity The region where the primary particles on the surface of the aggregated particles are radially aligned is moderately deformed during molding, so the contact area between adjacent aggregated particles increases, and the thermal conductivity in the thickness direction of the thermally conductive resin sheet can be further improved. Also, if B 1 /(A 1 +B 1 ) is within the above range, the inside of the aggregated particles will be dense, and the resin will sufficiently permeate the particles, so the generation of voids during molding can be suppressed, and the withstand voltage performance can be further improved.

作為上述B 1/(A 1+B 1)為0.60以上之氮化硼凝集粒子,例如可例舉具有紙牌屋構造之凝集粒子。又,可於藉由公知之方法獲得氮化硼凝集粒子後,實施物理之表面粗糙化處理或化學之表面粗糙化處理而將B 1/(A 1+B 1)調整為0.60以上。 由於各公司市售之氮化硼凝集粒子使用於造粒時結晶化相對進行之氮化硼一次粒子,因此,優先產生穩定之一次粒子之面(ab面)彼此之堆疊,因而凝集粒子之最外表面附近之一次粒子之厚度方向與凝集粒子之放射方向一致之「甘藍構造(cabbage structure)」者較多。由於「甘藍構造」之凝集粒子之最外表面附近之一次粒子以覆蓋凝集粒子之方式存在,故而B 1/(A 1+B 1)難以達到0.60以上。因此,於使用「甘藍構造」之凝集粒子之情形時,較佳為實施上述表面粗糙化處理而進行調整。 Examples of the boron nitride aggregated particles having a B 1 /(A 1 +B 1 ) of 0.60 or more include aggregated particles having a house of cards structure. In addition, B 1 /(A 1 +B 1 ) can be adjusted to 0.60 or more by performing physical surface roughening treatment or chemical surface roughening treatment after boron nitride aggregated particles are obtained by a known method. Since boron nitride aggregated particles commercially available from various companies use boron nitride primary particles that crystallize relative to each other during granulation, stable stacking of primary particle faces (ab faces) is preferentially generated, and thus aggregated particles are the most There are many "cabbage structures" in which the thickness direction of primary particles near the outer surface coincides with the radiation direction of aggregated particles. Since the primary particles in the vicinity of the outermost surface of the aggregated particles of the "cabbage structure" exist so as to cover the aggregated particles, it is difficult for B 1 /(A 1 +B 1 ) to be 0.60 or more. Therefore, in the case of using the aggregated particles of the "cabbage structure", it is preferable to carry out the adjustment by performing the above-mentioned surface roughening treatment.

本實施方式之氮化硼凝集粒子之形狀較佳為球狀。 所謂「球狀」係指通常縱橫比(長徑與短徑之比)為1以上2以下,較佳為1以上1.75以下,更佳為1以上1.5以下,進而較佳為1以上1.4以下。 該縱橫比可藉由如下方式求出:於利用掃描式電子顯微鏡(SEM)對導熱性樹脂片之剖面進行拍攝所獲得之圖像中任意選擇200個以上之粒子,求出各自之長徑與短徑之比而算出平均值。 The shape of the boron nitride aggregated particles in this embodiment is preferably spherical. The term "spherical" means that the aspect ratio (the ratio of the major axis to the minor axis) is usually 1 to 2, preferably 1 to 1.75, more preferably 1 to 1.5, and more preferably 1 to 1.4. The aspect ratio can be obtained by arbitrarily selecting 200 or more particles from an image obtained by photographing a cross section of a thermally conductive resin sheet with a scanning electron microscope (SEM), and obtaining the respective major diameter and The average value was calculated from the ratio of the short diameter.

又,可將使用粒子圖像解析裝置(Malvern Instruments Ltd公司製造,Morpholog G3S)所測得之「圓形度」用作「球狀」之指標。相同測定係對粒子之投影平面圖像(二維圖像)進行觀察,可藉增加測定數並平均化而對「球狀」度進行評估。 上述圓形度以1作為上限,較佳為0.90以上,更佳為0.92以上,進而較佳為0.94以上,進而更佳為0.96以上。 In addition, "circularity" measured using a particle image analyzer (manufactured by Malvern Instruments Ltd., Morpholog G3S) can be used as an index of "sphericality". The same measurement is to observe the projected plane image (two-dimensional image) of the particles, and the degree of "sphericity" can be evaluated by increasing the number of measurements and averaging. The above-mentioned circularity has an upper limit of 1, and is preferably at least 0.90, more preferably at least 0.92, further preferably at least 0.94, and still more preferably at least 0.96.

就提昇導熱率之觀點而言,氮化硼凝集粒子之凝集構造較佳為紙牌屋構造。 再者,氮化硼凝集粒子之凝集構造可藉由掃描式電子顯微鏡(SEM)進行確認。 From the viewpoint of enhancing thermal conductivity, the aggregated structure of boron nitride aggregated particles is preferably a house of cards structure. Furthermore, the aggregated structure of boron nitride aggregated particles can be confirmed by a scanning electron microscope (SEM).

所謂紙牌屋構造係指板狀粒子不配向而進行複雜地積層而成者,於「陶瓷・43・No.2」(2008年,日本陶瓷協會發行)中有記載。更具體而言,係指形成凝集粒子之一次粒子之平面部與該凝集粒子內存在之其他一次粒子之端面部牢固地結合或接合,且鱗片狀或平板狀之一次粒子各自面向隨機方向而存在於凝集粒子內之構造。將紙牌屋構造之模式圖示於圖8。 該紙牌屋構造之凝集粒子由於具有上述構造以及作為凝集粒子具備相對較高之球形度等,因此破壞強度非常高,即便於導熱性樹脂片成形時進行之加壓步驟中亦不會被壓壞。因此,可使通常沿導熱性樹脂片之長度方向配向之一次粒子存在於無規律之方向上。因此,若使用紙牌屋構造之凝集粒子,則可進一步提高一次粒子之ab面配向於導熱性樹脂片之厚度方向之比率,故而可於該片材之厚度方向有效地進行導熱,可進一步提高厚度方向之導熱率。 The so-called house of cards structure refers to the complex layering of plate-shaped particles without alignment, which is described in "Ceramics 43 No. 2" (published by the Japan Ceramics Association in 2008). More specifically, it means that the flat part of the primary particle that forms the aggregated particle is firmly bonded or bonded to the end face of the other primary particle present in the aggregated particle, and that the scale-like or flat-shaped primary particles each face random directions. Structure in aggregated particles. A schematic diagram of the structure of the house of cards is shown in FIG. 8 . The aggregated particles of the house of cards structure have the above-mentioned structure and relatively high sphericity as the aggregated particles, so the fracture strength is very high, and they will not be crushed even in the pressurization step performed when the thermally conductive resin sheet is formed. . Therefore, primary particles generally aligned in the longitudinal direction of the thermally conductive resin sheet can be made to exist in random directions. Therefore, if aggregated particles with a house of cards structure are used, the ratio of the ab planes of the primary particles to be aligned in the thickness direction of the thermally conductive resin sheet can be further increased, so that heat can be effectively conducted in the thickness direction of the sheet, and the thickness can be further increased. direction of thermal conductivity.

再者,具有紙牌屋構造之氮化硼凝集粒子例如可藉由國際公開第2015/119198號中記載之方法製造。本實施方式中之氮化硼凝集粒子較佳為不進行球磨等向表面施加力之處理。Furthermore, boron nitride aggregated particles having a house of cards structure can be produced, for example, by the method described in International Publication No. 2015/119198. The aggregated boron nitride particles in this embodiment are preferably not subjected to treatment such as ball milling to apply force to the surface.

於使用具有紙牌屋構造之氮化硼凝集粒子之情形時,可利用表面處理劑對該粒子實施表面處理。 作為表面處理劑之一例,可採用矽烷偶合處理劑等公知之表面處理劑。一般而言,多數情況下,氮化硼凝集粒子與熱塑性樹脂之間不會表現出直接之親和性或密接性,此於使用具有紙牌屋構造之氮化硼凝集粒子之情形時亦同樣如此。認為藉由利用化學處理來提高氮化硼凝集粒子與基質樹脂之界面之密接性,可進一步降低界面處之導熱性衰減。 When boron nitride aggregated particles having a house of cards structure are used, the particles may be surface treated with a surface treatment agent. As an example of the surface treatment agent, well-known surface treatment agents, such as a silane coupling treatment agent, can be used. In general, boron nitride aggregated particles do not exhibit direct affinity or adhesion with thermoplastic resins in many cases, and this is also the case when boron nitride aggregated particles having a house of cards structure are used. It is considered that by using chemical treatment to improve the adhesiveness of the interface between the boron nitride aggregated particles and the matrix resin, the decrease in thermal conductivity at the interface can be further reduced.

與直接使用一次粒子之情形相比,本實施方式之氮化硼凝集粒子可增大粒徑。 藉由增大氮化硼凝集粒子之粒徑,可減少被導熱率較低之熱塑性樹脂隔開之氮化硼凝集粒子間之傳熱路徑,因此可減輕於厚度方向之傳熱路徑中熱阻增大之情況。 The boron nitride aggregated particles of this embodiment can increase the particle size compared to the case where primary particles are used as they are. By increasing the particle size of the boron nitride aggregated particles, the heat transfer path between the boron nitride aggregated particles separated by the thermoplastic resin with low thermal conductivity can be reduced, so the thermal resistance in the heat transfer path in the thickness direction can be reduced case of increase.

就上述觀點而言,氮化硼凝集粒子之體積基準之最大粒徑Dmax(以下亦稱為「最大粒徑」)之下限較佳為20 μm以上,更佳為30 μm以上,進而較佳為50 μm以上。另一方面,上述最大粒徑Dmax之上限較佳為300 μm以下,更佳為200 μm以下,進而較佳為100 μm以下,進而更佳為90 μm以下。From the above point of view, the lower limit of the volume-based maximum particle diameter Dmax (hereinafter also referred to as "maximum particle diameter") of boron nitride aggregated particles is preferably 20 μm or more, more preferably 30 μm or more, and still more preferably More than 50 μm. On the other hand, the upper limit of the maximum particle diameter Dmax is preferably 300 μm or less, more preferably 200 μm or less, further preferably 100 μm or less, and even more preferably 90 μm or less.

又,氮化硼凝集粒子之體積基準之平均粒徑D50之下限較佳為10 μm以上,更佳為20 μm以上,進而較佳為30 μm以上。另一方面,上述平均粒徑D50之上限較佳為200 μm以下,更佳為100 μm以下,進而較佳為80 μm以下,進而更佳為60 μm以下。Also, the lower limit of the volume-based average particle diameter D50 of boron nitride aggregated particles is preferably at least 10 μm, more preferably at least 20 μm, and still more preferably at least 30 μm. On the other hand, the upper limit of the average particle diameter D50 is preferably 200 μm or less, more preferably 100 μm or less, further preferably 80 μm or less, and even more preferably 60 μm or less.

藉由使氮化硼凝集粒子之最大粒徑為上述上限以下,而於使基質樹脂中含有氮化硼凝集粒子之情形時,基質樹脂與氮化硼凝集粒子之界面縮小,結果熱阻變小,可實現高導熱化,且可形成無表面粗糙等之優質之膜。藉由使最大粒徑為上述下限以上,可獲得功率半導體裝置所要求之作為氮化硼凝集粒子之充分之導熱性提昇效果。By setting the maximum particle size of boron nitride aggregated particles below the upper limit, when the matrix resin contains boron nitride aggregated particles, the interface between the matrix resin and the boron nitride aggregated particles becomes smaller, resulting in a smaller thermal resistance. , can achieve high thermal conductivity, and can form a high-quality film without surface roughness. By setting the maximum particle diameter to be equal to or greater than the above-mentioned lower limit, a sufficient effect of improving thermal conductivity as boron nitride aggregated particles required for a power semiconductor device can be obtained.

又,認為於氮化硼凝集粒子之大小相對於導熱性樹脂片之厚度為1/10以下之情形時,基質樹脂與氮化硼凝集粒子之界面之熱阻對於導熱性樹脂片之厚度上之影響變得明顯。尤其於面向功率半導體裝置之情形時,應用厚度為100 μm~300 μm之導熱性樹脂片之情況居多,因此就導熱性之觀點而言,亦較佳為氮化硼凝集粒子之體積基準之最大粒徑Dmax大於上述下限。 又,藉由使氮化硼凝集粒子之最大粒徑Dmax為上述下限以上,不僅會抑制因氮化硼凝集粒子與基質樹脂之界面引起之熱阻增大,且粒子間所需之導熱路徑數減少,於導熱性樹脂片之厚度方向上,自一面至另一面之連接機率增大。 進而,藉由使氮化硼凝集粒子之最大粒徑Dmax為上述下限以上,與使用同質量之Dmax小於上述下限之粒子之情形相比,基質樹脂與氮化硼凝集粒子之界面面積變小,因此於導熱性樹脂片中可減少產生易出現於基質樹脂與氮化硼凝集粒子之界面之孔隙之情況,易獲得優異之耐電壓特性。 另一方面,藉由使氮化硼凝集粒子之體積基準之最大粒徑Dmax為上述上限以下,會抑制氮化硼凝集粒子向導熱性樹脂片之表面突出,可獲得無表面粗糙之良好之表面形狀,因此於製作與銅基板貼合之片材時,具有充分之密接性,可獲得優異之耐電壓特性。 Also, it is considered that when the size of boron nitride aggregated particles is 1/10 or less relative to the thickness of the thermally conductive resin sheet, the thermal resistance of the interface between the matrix resin and boron nitride aggregated particles is greater than the thickness of the thermally conductive resin sheet. The impact becomes apparent. Especially in the case of power semiconductor devices, thermally conductive resin sheets with a thickness of 100 μm to 300 μm are often used. Therefore, from the perspective of thermal conductivity, it is also preferable to use the largest volume basis of boron nitride aggregated particles The particle diameter Dmax is larger than the above-mentioned lower limit. Also, by making the maximum particle diameter Dmax of the boron nitride aggregated particles not less than the above-mentioned lower limit, not only the increase in thermal resistance due to the interface between the boron nitride aggregated particles and the matrix resin can be suppressed, but also the number of heat conduction paths required between the particles can be suppressed. As the thickness decreases, the connection probability from one side to the other side increases in the thickness direction of the thermally conductive resin sheet. Furthermore, by setting the maximum particle diameter Dmax of boron nitride aggregated particles to be equal to or greater than the above-mentioned lower limit, the interface area between the matrix resin and boron nitride aggregated particles becomes smaller than when using the same mass of particles whose Dmax is smaller than the above-mentioned lower limit. Therefore, in the thermally conductive resin sheet, it is possible to reduce the occurrence of voids that tend to appear at the interface between the matrix resin and the boron nitride aggregated particles, and it is easy to obtain excellent withstand voltage characteristics. On the other hand, by making the volume-based maximum particle diameter Dmax of the aggregated boron nitride particles not more than the above upper limit, the aggregated boron nitride particles are suppressed from protruding from the surface of the thermally conductive resin sheet, and a good surface without surface roughness can be obtained. Therefore, when making a sheet bonded to a copper substrate, it has sufficient adhesion and can obtain excellent withstand voltage characteristics.

氮化硼凝集粒子之大小(Dmax)相對於導熱性樹脂片之厚度的比率(Dmax/厚度)較佳為0.3以上1.0以下,其中進而較佳為0.35以上或0.95以下,其中進而更佳為0.4以上或0.9以下。The ratio of the size (Dmax) of boron nitride aggregated particles to the thickness of the thermally conductive resin sheet (Dmax/thickness) is preferably from 0.3 to 1.0, more preferably from 0.35 to 0.95, and even more preferably from 0.4 above or below 0.9.

再者,氮化硼凝集粒子之最大粒徑Dmax及平均粒徑D50例如可藉由以下方法測定。 針對使氮化硼凝集粒子分散於溶劑而成之試樣,具體而言,對於使氮化硼凝集粒子分散於含有作為分散穩定劑之六偏磷酸鈉之純水介質中而成之試樣,利用雷射繞射/散射式粒度分佈測定裝置LA-920(堀場製作所公司製造)測定粒度分佈,根據所獲得之粒度分佈,可求出氮化硼凝集粒子之最大粒徑Dmax及平均粒徑D50。 又,亦可利用Morpholog G3S(Malvern公司製造)等乾式之粒度分佈測定裝置求出最大粒徑及平均粒徑。 關於已添加至熱塑性樹脂中之氮化硼凝集粒子之最大粒徑Dmax及平均粒徑D50,亦可藉由於溶劑(包含加熱溶劑)中溶解去除熱塑性樹脂,或使之膨潤而降低與氮化硼凝集粒子之附著強度後以物理方式去除,進而將樹脂成分於大氣下加熱使之灰化而去除,而利用與上述相同之方法測定。 In addition, the maximum particle diameter Dmax and the average particle diameter D50 of boron nitride aggregated particle can be measured by the following method, for example. For samples obtained by dispersing boron nitride aggregated particles in a solvent, specifically, for samples obtained by dispersing boron nitride aggregated particles in a pure water medium containing sodium hexametaphosphate as a dispersion stabilizer, The particle size distribution is measured using a laser diffraction/scattering particle size distribution measuring device LA-920 (manufactured by Horiba Manufacturing Co., Ltd.), and the maximum particle size Dmax and average particle size D50 of boron nitride aggregated particles can be obtained from the obtained particle size distribution. . In addition, the maximum particle diameter and the average particle diameter can also be obtained using a dry-type particle size distribution measuring device such as Morpholog G3S (manufactured by Malvern). Regarding the maximum particle diameter Dmax and the average particle diameter D50 of boron nitride aggregated particles added to thermoplastic resins, the thermoplastic resin can also be removed by dissolving in a solvent (including a heating solvent) or swelled to reduce the interaction with boron nitride. The adhesion strength of the aggregated particles is removed physically, and then the resin component is heated in the atmosphere to be ashed and removed, and measured by the same method as above.

(3)各成分之含量 本實施方式之樹脂組合物100質量%中之熱塑性樹脂之含量之下限較佳為15質量%以上,更佳為20質量%以上。另一方面,熱塑性樹脂之含量之上限較佳為40質量%以下,更佳為35質量%以下。 又,本實施方式之樹脂組合物100質量%中之氮化硼凝集粒子之含量之下限較佳為60質量%以上,更佳為65質量%以上。另一方面,氮化硼凝集粒子之含量之上限較佳為85質量%以下,更佳為80質量%以下。 藉由使氮化硼凝集粒子之含量為上述下限值以上,會良好地表現出氮化硼凝集粒子所帶來之導熱性提昇效果或控制線膨脹係數之效果。另一方面,藉由使氮化硼凝集粒子之含量為上述上限值以下,樹脂組合物之成形性、或與異種材料之界面接著性變得良好。 (3) Content of each ingredient The lower limit of the content of the thermoplastic resin in 100% by mass of the resin composition of the present embodiment is preferably at least 15% by mass, more preferably at least 20% by mass. On the other hand, the upper limit of the thermoplastic resin content is preferably at most 40% by mass, more preferably at most 35% by mass. In addition, the lower limit of the content of boron nitride aggregated particles in 100% by mass of the resin composition of the present embodiment is preferably at least 60% by mass, more preferably at least 65% by mass. On the other hand, the upper limit of the content of boron nitride aggregated particles is preferably at most 85% by mass, more preferably at most 80% by mass. When the content of the aggregated boron nitride particles is equal to or greater than the above lower limit, the effect of improving the thermal conductivity or the effect of controlling the linear expansion coefficient by the aggregated boron nitride particles can be favorably exhibited. On the other hand, by making content of boron nitride aggregated particle below the said upper limit, the moldability of a resin composition, or the interface adhesiveness with a different material becomes favorable.

一般而言,導熱性樹脂組合物之調配比率之規定大多基於基質樹脂與氮化硼凝集粒子之各自之體積分率(故而為導熱性樹脂片剖面中之面積比率)而規定。關於導熱性樹脂片之厚度方向之導熱率,並非僅取決於體積分率,亦與上述較佳之粒子尺寸、粒子之配向狀態、粒子之形狀等各種因素有關,因此,於本發明中,就實際調配中之方便性而言,採用質量分率。 尤其於使用紙牌屋構造之氮化硼凝集粒子之情形時,該粒子之內部構造呈紙牌屋構造,於該粒子表面以如所謂毛栗子狀或稱為金平糖狀之突起狀態形成多個沿放射方向配向之平板狀之氮化硼一次粒子,且相鄰接之紙牌屋構造粒子之該突起彼此物理接觸,藉此於厚度方向上形成熱阻較小之傳熱路徑。因此,利用通常之掃描式電子顯微鏡(SEM)進行觀察時,存在並不容易判定基質樹脂與導熱性填料之各自之體積分率之情況。進而,若逐漸增加具有本發明之特徵之紙牌屋構造之氮化硼凝集粒子之添加量,則於樹脂組合物之加熱加壓成形時施加之壓力之作用下,該粒子彼此並非作為球狀粒子相互接觸之點接觸,而是粒子彼此接觸之部分發生變形,觀察到接觸部呈直線狀即面狀地接觸之狀態。於成為此種接觸狀態之情形時,藉由添加紙牌屋構造之氮化硼,可有效率地形成導熱路徑。然而,於此種情形時,亦不容易藉由SEM觀察來判定基質樹脂與氮化硼凝集粒子之各自之體積分率。 In general, the formulation ratio of the thermally conductive resin composition is often specified based on the respective volume fractions of the matrix resin and boron nitride aggregated particles (therefore, the area ratio in the cross section of the thermally conductive resin sheet). The thermal conductivity in the thickness direction of the thermally conductive resin sheet is not only dependent on the volume fraction, but also related to various factors such as the above-mentioned preferred particle size, the alignment state of the particles, and the shape of the particles. Therefore, in the present invention, the actual In terms of convenience in preparation, the mass fraction is used. Especially in the case of using boron nitride agglomerated particles with a house of cards structure, the internal structure of the particles is a house of cards structure, and a plurality of protrusions along the radial direction are formed on the surface of the particles in the state of so-called chestnut-shaped or gold flat sugar-shaped protrusions. Aligned flat boron nitride primary particles and the protrusions of adjacent house of card particles are in physical contact with each other, thereby forming a heat transfer path with small thermal resistance in the thickness direction. Therefore, it may not be easy to determine the respective volume fractions of the matrix resin and the thermally conductive filler when observing with a normal scanning electron microscope (SEM). Furthermore, if the addition amount of the aggregated boron nitride particles having the house of cards structure characteristic of the present invention is gradually increased, the particles do not form spherical particles with each other under the action of the pressure applied when the resin composition is heated and pressurized. The point contact of mutual contact means that the part where the particles contact each other deforms, and the contact part is observed to be in a state of linear or planar contact. In such a contact state, by adding boron nitride having a house-of-cards structure, a thermal conduction path can be efficiently formed. However, in this case, it is not easy to determine the respective volume fractions of the matrix resin and boron nitride aggregated particles by SEM observation.

本實施方式之樹脂組合物亦可含有除熱塑性樹脂及氮化硼凝集粒子以外之其他成分。但是,就提昇導熱性之觀點而言,較佳為不含其他成分。 作為其他成分,可例舉:磷系、酚系以外之各種抗氧化劑、苯酚丙烯酸酯系以外之製程穩定劑、熱穩定劑、受阻胺系自由基捕獲劑(HAAS)、衝擊改良劑、加工助劑、金屬鈍化劑、銅毒抑制劑、抗靜電劑、阻燃劑、矽烷偶合劑等提昇氮化硼凝集粒子與熱塑性樹脂之界面之親和性的添加劑、同樣可期待矽烷偶合劑等之提高樹脂片與金屬板狀材之密接強度之效果的添加劑、增量劑等。使用該等添加劑之情形時之添加量通常只要為基於該等之目的而使用之量之範圍即可。 The resin composition of this embodiment may contain other components than the thermoplastic resin and boron nitride aggregated particles. However, from the viewpoint of improving thermal conductivity, it is preferable not to contain other components. Examples of other components include phosphorus-based and various antioxidants other than phenol-based, process stabilizers other than phenol acrylate-based, heat stabilizers, hindered amine-based radical scavengers (HAAS), impact modifiers, and processing aids. additives, metal deactivators, copper poisoning inhibitors, antistatic agents, flame retardants, silane coupling agents, etc. to improve the affinity of the interface between boron nitride aggregated particles and thermoplastic resins, and can also be expected to improve the resin Additives, extenders, etc. for the effect of the bonding strength between the sheet and the metal plate. When using these additives, the addition amount should just be the range of the amount used based on these purposes normally.

2.導熱性樹脂片 本實施方式之導熱性樹脂片具有如下特徵:包含上述樹脂組合物,耐吸濕回焊性優異,於製作與金屬板之積層體時不易發生由熱膨脹及熱收縮引起之界面剝離。 2. Thermally conductive resin sheet The thermally conductive resin sheet according to this embodiment has the following features: it contains the above-mentioned resin composition, has excellent moisture absorption reflow resistance, and is less prone to interfacial peeling due to thermal expansion and thermal contraction when producing a laminate with a metal plate.

上述導熱性樹脂片之25℃下之厚度方向之導熱率較佳為16 W/m・K以上,更佳為18 W/m・K以上,進而較佳為19 W/m・K以上,進而更佳為20 W/m・K以上。藉由使厚度方向之導熱率為上述下限值以上,亦可較佳地用於在高溫下作動之功率半導體裝置等。 該導熱率可藉由熱塑性樹脂之種類及熔融黏度等物性值、氮化硼凝集粒子之B 1/(A 1+B 1)之值、構造及含量、熱塑性樹脂與氮化硼凝集粒子之混合方法、下述加熱混練步驟中之條件等來調整。 The thermal conductivity of the thermally conductive resin sheet in the thickness direction at 25°C is preferably at least 16 W/m·K, more preferably at least 18 W/m·K, still more preferably at least 19 W/m·K, and furthermore More preferably at least 20 W/m・K. By making the thermal conductivity in the thickness direction more than the above-mentioned lower limit value, it can be preferably used also for power semiconductor devices and the like that operate at high temperatures. The thermal conductivity can be determined by the type of thermoplastic resin and physical properties such as melt viscosity, the value, structure and content of B 1 /(A 1 + B 1 ) of boron nitride aggregated particles, and the mixing method of thermoplastic resin and boron nitride aggregated particles , the conditions in the following heating and kneading steps, etc. are adjusted.

再者,導熱率可藉由以下方法來測定。 首先,藉由雷射閃光法對測定溫度25℃下之樹脂片厚度方向之熱擴散率a(mm 2/秒)進行測定。由於不存在樹脂系材料中之熱擴散率、導熱率之JIS規格,因此依據JIS R1611:2010(藉由閃光法測定精密陶瓷之熱擴散率、比熱容、導熱率之方法)進行測定。 再者,於JIS R1611:2010中,有「試樣之厚度為0.5 mm以上5 mm以下」之規定,因此將樹脂片之厚度調整為0.5 mm以上進行測定。於樹脂片之厚度未達0.5 mm之情形時,可將複數片重疊,將整體厚度調整為0.5 mm以上進行測定。 繼而,依據JIS K6268,藉由阿基米得法求出樹脂片之密度ρ(g/m 3)。 進而,依據JIS K7123,使用DSC測定裝置測定25℃下之比熱容c(J/(g・K))。 根據該等之各測定值,作為「H=a×ρ×c」而求出25℃下之片厚度方向之導熱率。 In addition, thermal conductivity can be measured by the following method. First, thermal diffusivity a (mm 2 /sec) in the thickness direction of the resin sheet at a measurement temperature of 25° C. was measured by a laser flash method. Since there is no JIS standard for thermal diffusivity and thermal conductivity in resin-based materials, it is measured according to JIS R1611:2010 (method for measuring thermal diffusivity, specific heat capacity, and thermal conductivity of precision ceramics by flash method). In addition, in JIS R1611:2010, there is a regulation that "the thickness of the sample is not less than 0.5 mm and not more than 5 mm", so the thickness of the resin sheet is adjusted to be not less than 0.5 mm for measurement. When the thickness of the resin sheet is less than 0.5 mm, multiple sheets can be stacked, and the overall thickness can be adjusted to be more than 0.5 mm for measurement. Then, the density ρ (g/m 3 ) of the resin sheet was obtained by the Archimedes method in accordance with JIS K6268. Furthermore, according to JIS K7123, the specific heat capacity c (J/(g·K)) at 25 degreeC was measured using the DSC measuring apparatus. From these respective measured values, the thermal conductivity in the sheet thickness direction at 25° C. was determined as “H=a×ρ×c”.

導熱性樹脂片之厚度之下限值較佳為50 μm以上,更佳為60 μm以上,進而較佳為70 μm以上。另一方面,厚度之上限值較佳為300 μm以下,更佳為200 μm以下,進而較佳為160 μm以下。 藉由將導熱性樹脂片之厚度設為50 μm以上,可確保充分之耐電壓特性。另一方面,藉由設為300 μm以下,尤其於將導熱性樹脂片用於功率半導體裝置等之情形時,能夠實現小型化或薄型化,又,與使用陶瓷材料之絕緣性導熱性層相比,可獲得薄膜化所帶來之減小厚度方向之熱阻之效果。 The lower limit of the thickness of the thermally conductive resin sheet is preferably at least 50 μm, more preferably at least 60 μm, and still more preferably at least 70 μm. On the other hand, the upper limit of the thickness is preferably at most 300 μm, more preferably at most 200 μm, and still more preferably at most 160 μm. Sufficient withstand voltage characteristics can be secured by setting the thickness of the thermally conductive resin sheet to 50 μm or more. On the other hand, by setting the thickness to 300 μm or less, miniaturization or thinning can be achieved especially when the thermally conductive resin sheet is used in a power semiconductor device or the like, and it is comparable to an insulating thermally conductive layer using a ceramic material. Ratio, the effect of reducing the thermal resistance in the thickness direction brought about by thinning can be obtained.

為了減小導熱率之各向異性,亦提高厚度方向之導熱率,本實施方式之導熱性樹脂片較佳為降低氮化硼凝集粒子之一次粒子之配向性。 關於一次粒子之配向性,於利用X射線繞射法對導熱性樹脂片進行測定時,可藉由求出將(002)面之繞射峰強度設為I(002)、將(100)面之繞射峰強度設為I(100)之情形時之比「I(002)/I(100)」進行評估。 上述比「I(002)/I(100)」較佳為20以下,更佳為17以下,進而較佳為15以下。於上述比超過20之情形時,於熔融混練步驟中氮化硼凝集粒子崩解,或者於加壓成形步驟中氮化硼凝集粒子被過度壓碎,與導熱性樹脂片之面方向平行或所成角度較小之一次粒子變多。於此情形時,即便增加氮化硼凝集粒子之含量,亦難以提高厚度方向之導熱率。 再者,上述比「I(002)/I(100)」之下限並無特別限定。例如於使用具有各向同性較高故而氮化硼一次粒子於特定方向之配向極少之紙牌屋構造之氮化硼凝集粒子之情形時,僅該粒子時之比「I(002)/I(100)」為4.5~6.6左右,因此,若排除有意進行配向操作之情形,則認為4.5為下限值。 In order to reduce the anisotropy of thermal conductivity and increase the thermal conductivity in the thickness direction, the thermally conductive resin sheet of this embodiment preferably reduces the alignment of the primary particles of boron nitride aggregated particles. Regarding the orientation of the primary particles, when measuring the thermally conductive resin sheet by the X-ray diffraction method, the diffraction peak intensity of the (002) plane can be determined as I(002), and the (100) plane When the intensity of the diffraction peak is set to I(100), the ratio "I(002)/I(100)" is evaluated. The above ratio "I(002)/I(100)" is preferably 20 or less, more preferably 17 or less, still more preferably 15 or less. When the above ratio exceeds 20, the boron nitride aggregated particles are disintegrated in the melting and kneading step, or the boron nitride aggregated particles are excessively crushed in the press molding step, and the boron nitride aggregated particles are parallel to or placed in the direction of the surface of the thermally conductive resin sheet. The smaller the angle, the more primary particles. In this case, even if the content of boron nitride aggregated particles is increased, it is difficult to increase the thermal conductivity in the thickness direction. In addition, the lower limit of the said ratio "I(002)/I(100)" is not specifically limited. For example, in the case of using boron nitride agglomerated particles with a house-of-card structure that has a relatively high isotropy so that boron nitride primary particles are rarely aligned in a specific direction, the ratio "I(002)/I(100 )" is about 4.5 to 6.6, therefore, if the intentional alignment operation is excluded, 4.5 is considered to be the lower limit.

於本實施方式之導熱性樹脂片中,關於在700℃下加熱5小時之時之殘留灰分中所包含之氮化硼凝集粒子,於將藉由壓汞法所測得之粒子內孔隙容積設為A 2,將粒子間隙容積設為B 2時,A 2/A 1較佳為0.70以上,B 2/B 1較佳為0.85以下。 A 2/A 1為0.70以上表示於片材成形前後,凝集粒子之內部之一次粒子之狀態不會發生較大變化,故而凝集粒子之強度相對較高。因此,A 2/A 1為0.70以上係指,原本之形成氮化硼凝集粒子之內部之導熱性路徑之構造於片材成形後亦會被充分地維持。又,亦可謂,雖然會產生由成形時之加壓引起之變形,但因凝集粒子之破碎而產生單離之一次粒子之情況較少。若該單離之一次粒子之產生較少,則會帶來減小之厚度方向之熱阻之效果。單離之一次粒子之所以會妨礙厚度方向之有效之導熱,原因在於,由於一次粒子為平板狀或鱗片狀之粒子,因此於成型之片材中,粒子之厚度方向(c軸方向)配向於片材之面方向。 另一方面,B 2/B 1為0.85以下表示於片材成形前後,凝集粒子之表面發生相對較大之變形。如圖9所示,出現該變形之原因在於,複數個凝集粒子之接觸面之多面體以彼此接觸之方式而使接觸面積增加,形成諸如面接觸之狀態。 因此,藉由於A 2/A 1及B 2/B 1兩者滿足上述數值範圍之狀態下使氮化硼凝集粒子存在於片材內,可獲得較高之導熱率。 In the thermally conductive resin sheet of the present embodiment, regarding boron nitride aggregated particles contained in the residual ash when heated at 700°C for 5 hours, the pore volume in the particles measured by the mercury porosimetry was set as A 2 is A 2 , and when the particle interstitial volume is B 2 , A 2 /A 1 is preferably at least 0.70, and B 2 /B 1 is preferably at most 0.85. A 2 /A 1 of 0.70 or higher indicates that the state of the primary particles inside the aggregated particles does not change significantly before and after sheet forming, so the strength of the aggregated particles is relatively high. Therefore, A 2 /A 1 being 0.70 or more means that the original structure of the internal thermal conductivity path forming boron nitride aggregated particles is sufficiently maintained even after the sheet is formed. It can also be said that, although deformation due to pressurization during molding occurs, isolated primary particles are rarely generated due to crushing of aggregated particles. If the generation of isolated primary particles is less, it will bring about the effect of reducing the thermal resistance in the thickness direction. The reason why isolated primary particles hinder effective heat conduction in the thickness direction is that since the primary particles are flat or scaly particles, in the formed sheet, the thickness direction (c-axis direction) of the particles is aligned to The face direction of the sheet. On the other hand, B 2 /B 1 being 0.85 or less indicates that relatively large deformation occurs on the surface of aggregated particles before and after sheet forming. As shown in FIG. 9 , the deformation occurs because polyhedrons on the contact surfaces of a plurality of aggregated particles contact each other to increase the contact area and form a state such as surface contact. Therefore, a high thermal conductivity can be obtained by making boron nitride aggregated particles exist in the sheet in a state where both A 2 /A 1 and B 2 /B 1 satisfy the above numerical range.

就上述觀點而言,A 2/A 1較佳為0.70以上,更佳為0.72以上,進而較佳為0.75以上,進而更佳為0.80以上。又,A 2/A 1較佳為1.0以下,更佳為0.90以下,進而較佳為0.88以下。 另一方面,B 2/B 1較佳為0.85以下,更佳為0.80以下,進而較佳為0.75以下,進而更佳為0.70以下。進而,較佳為0.65以下,更佳為0.60以下,進而較佳為0.50以下。又,B 2/B 1較佳為0.40以上,更佳為0.45以上。 From the above viewpoint, A 2 /A 1 is preferably at least 0.70, more preferably at least 0.72, still more preferably at least 0.75, still more preferably at least 0.80. Also, A 2 /A 1 is preferably at most 1.0, more preferably at most 0.90, still more preferably at most 0.88. On the other hand, B 2 /B 1 is preferably at most 0.85, more preferably at most 0.80, still more preferably at most 0.75, still more preferably at most 0.70. Furthermore, it is preferably 0.65 or less, more preferably 0.60 or less, and still more preferably 0.50 or less. Also, B 2 /B 1 is preferably at least 0.40, more preferably at least 0.45.

殘留灰分中所包含之氮化硼凝集粒子之粒子內孔隙容積A 2較佳為0.20 mL/g以上,更佳為0.25 mL/g以上,進而較佳為0.30 mL/g以上,進而更佳為0.32 mL/g以上,尤佳為0.34 mL/g以上。又,粒子內孔隙容積A 2較佳為0.60 mL/g以下,更佳為0.50 mL/g以下,進而較佳為0.45 mL/g以下,進而更佳為0.40 mL/g以下。 The in-particle pore volume A2 of the boron nitride aggregated particles contained in the residual ash is preferably at least 0.20 mL/g, more preferably at least 0.25 mL/g, still more preferably at least 0.30 mL/g, and still more preferably at least 0.30 mL/g. More than 0.32 mL/g, preferably more than 0.34 mL/g. In addition, the particle internal pore volume A 2 is preferably 0.60 mL/g or less, more preferably 0.50 mL/g or less, still more preferably 0.45 mL/g or less, still more preferably 0.40 mL/g or less.

殘留灰分中所包含之氮化硼凝集粒子之粒子間隙容積B 2較佳為0.35 mL/g以上,更佳為0.40 mL/g以上,進而較佳為0.45 mL/g以上,進而更佳為0.50 mL/g以上。又,粒子間隙容積B 2較佳為0.80 mL/g以下,更佳為0.70 mL/g以下,進而較佳為0.65 mL/g以下。 The particle interstitial volume B2 of boron nitride aggregated particles contained in the residual ash is preferably at least 0.35 mL/g, more preferably at least 0.40 mL/g, still more preferably at least 0.45 mL/g, still more preferably at least 0.50 mL/g or more. Also, the particle interstitial volume B 2 is preferably 0.80 mL/g or less, more preferably 0.70 mL/g or less, still more preferably 0.65 mL/g or less.

又,殘留灰分中所包含之氮化硼凝集粒子之圓形度較佳為0.85以上,更佳為0.90以上,進而較佳為0.92以上,進而更佳為0.94以上。Also, the circularity of boron nitride aggregated particles contained in the residual ash is preferably at least 0.85, more preferably at least 0.90, still more preferably at least 0.92, and still more preferably at least 0.94.

3.導熱性樹脂片之製造方法 以下,對本實施方式之導熱性樹脂片之製造方法之一例進行說明。 作為本實施方式之導熱性樹脂片之製造方法之一例,例如可例舉包含混合步驟及加壓成形步驟之方法。 3. Manufacturing method of thermally conductive resin sheet Hereinafter, an example of the manufacturing method of the thermally conductive resin sheet of this embodiment is demonstrated. As an example of the manufacturing method of the heat conductive resin sheet of this embodiment, the method including a mixing process and a press molding process is mentioned, for example.

作為先前之製造方法,有如下方法:將使基質樹脂與氮化硼凝集粒子分散於溶劑中而成之漿料塗佈於基材,而獲得導熱性樹脂膜(濕式塗佈法)。然而,於塗佈至基板時包含氣泡,或於溶劑之乾燥不充分之情形時產生由塗佈膜中之殘留溶劑引起之發泡,因而存在耐電壓性能下降之情況。尤其是,於使用將氮化硼凝集粒子之粒子內孔隙容積設為A 1,將粒子間隙容積設為B 1時,B 1/(A 1+B 1)為0.60以上之氮化硼凝集粒子之情形時,凝集粒子表面之一次粒子變為放射狀,因此凝集粒子表面之凹凸變多,漿料易於變得黏稠,於與樹脂混練時或塗佈至基板時更容易產生氣泡,因此樹脂膜中易殘留有氣泡,易發生該耐電壓性能下降之情況。 又,於上述濕式塗佈法中,若增加氮化硼凝集粒子之添加量以提昇導熱性,則存在於塗佈時產生條紋,生產性變差之情況。尤其是,於使用上述B 1/(A 1+B 1)為0.60以上之氮化硼凝集粒子之情形時,易產生該條紋。 As a conventional production method, there is a method in which a slurry obtained by dispersing matrix resin and boron nitride aggregated particles in a solvent is applied to a substrate to obtain a thermally conductive resin film (wet coating method). However, bubbles are included when applied to the substrate, or foaming due to residual solvent in the coating film occurs when the solvent is not sufficiently dried, and the withstand voltage performance may be lowered. In particular, when using aggregated boron nitride particles whose pore volume in particles is A1 and particle interstitial volume is B1 , B1 /( A1 + B1 ) is 0.60 or more. In some cases, the primary particles on the surface of the aggregated particles become radial, so the surface of the aggregated particles becomes more concave-convex, the slurry tends to become viscous, and bubbles are more likely to be generated when kneading with the resin or when it is applied to the substrate. Bubbles are likely to remain, and the withstand voltage performance is likely to decrease. In addition, in the above-mentioned wet coating method, if the addition amount of boron nitride aggregated particles is increased to improve thermal conductivity, streaks may be generated during coating, and productivity may be deteriorated. In particular, when using boron nitride aggregated particles in which the above-mentioned B 1 /(A 1 +B 1 ) is 0.60 or more, the streaks are likely to occur.

於本實施方式之製造方法中,藉由於熱塑性樹脂表現出流動性之溫度下加壓而成形為片材,熱塑性樹脂被壓入至氮化硼凝集粒子中之空隙中,因此片材內不易包含氣泡。並且,於本實施方式中,可不使用溶劑而獲得片材,因此亦不會產生由殘留溶劑引起之發泡。因此,根據本實施方式之製造方法,可使導熱性樹脂片之耐電壓性能變得良好。 又,本實施方式之製造方法由於不經過塗佈步驟,因此即便使用上述B 1/(A 1+B 1)為0.60以上之氮化硼凝集粒子,亦不會產生由塗佈引起之問題,如產生條紋等,生產性良好。 In the production method of this embodiment, the sheet is formed by applying pressure at a temperature at which the thermoplastic resin exhibits fluidity, and the thermoplastic resin is pressed into the voids in the boron nitride aggregated particles, so that it is difficult to contain boron nitride in the sheet. bubble. Moreover, in this embodiment, since a sheet can be obtained without using a solvent, foaming by a residual solvent does not generate|occur|produce. Therefore, according to the manufacturing method of this embodiment, the withstand voltage performance of a thermally conductive resin sheet can be made favorable. In addition, since the production method of this embodiment does not go through the coating step, even if the above-mentioned boron nitride aggregated particles whose B 1 /(A 1 + B 1 ) is 0.60 or more are used, there will be no problems caused by coating, such as Streaks and the like were generated, and the productivity was good.

亦如專利文獻4及5之實施例中所記載般,由於先前之主流為使用熱硬化性樹脂作為基質樹脂,因此較多使用濕式塗佈法作為導熱性樹脂片之製造方法。認為,於該濕式塗佈法中,若凝集粒子表面之凹凸較多,則多數情況下會產生如上所述之不良情況,因此較佳為凝集粒子表面之凹凸儘可能少(即,上述B 1/(A 1+B 1)之比小於0.60)之凝集粒子。 另一方面,就導熱性觀點而言,較佳為凝集粒子表面之一次粒子呈放射狀,此種粒子之B 1/(A 1+B 1)之比大於0.60之情況較多。 如此,於使用先前之製造方法之情形時,耐電壓性能及生產性之提昇及導熱性之提昇與氮化硼凝集粒子之粒子內孔隙容積A 1及粒子間隙容積B 1之關係為取捨之關係,即於B 1/(A 1+B 1)中為取捨之關係。 根據本實施方式之製造方法,可於不考慮濕式塗佈法中之不良情況之情況下使用B 1/(A 1+B 1)之比為0.60以上之凝集粒子,因此可使耐電壓性能及生產性變得良好,並提昇導熱性。 Also as described in the examples of Patent Documents 4 and 5, since the previous mainstream is to use thermosetting resin as the matrix resin, wet coating method is often used as the manufacturing method of the thermally conductive resin sheet. It is considered that in this wet coating method, if there are many irregularities on the surface of the aggregated particles, the above-mentioned disadvantages will occur in many cases, so it is preferable to have as few irregularities on the surface of the aggregated particles as possible (that is, the above-mentioned B Aggregated particles in which the ratio of 1 /(A 1 +B 1 ) is less than 0.60). On the other hand, from the viewpoint of thermal conductivity, it is preferable that the primary particles on the surface of aggregated particles are radial, and the ratio of B 1 /(A 1 +B 1 ) of such particles is often greater than 0.60. In this way, in the case of using the previous manufacturing method, the relationship between the improvement of withstand voltage performance and productivity and the improvement of thermal conductivity and the volume A1 of the pores in the particle and the volume B1 between the particles of boron nitride aggregated particles is a trade-off relationship. , which is a trade-off relationship in B 1 /(A 1 +B 1 ). According to the production method of this embodiment, aggregated particles having a ratio of B 1 /(A 1 +B 1 ) of 0.60 or more can be used without considering the disadvantages of the wet coating method, so that the withstand voltage performance and Productivity becomes good, and thermal conductivity improves.

(1)混合步驟 於混合步驟中,將包含熱塑性樹脂之粉體與氮化硼凝集粒子於常溫下加以攪拌混合,關於上述氮化硼凝集粒子,於將氮化硼凝集粒子之粒子內孔隙容積設為A 1,將粒子間隙容積設為B 1時,B 1/(A 1+B 1)為0.60以上。 作為先前之製造方法,有將基質樹脂與氮化硼凝集粒子進行加熱熔融混練之方法。然而,存在因該熔融混練而使得氮化硼凝集粒子被剪切破壞之情況。尤其是,由於在使用B 1/(A 1+B 1)之比為0.60以上之氮化硼凝集粒子之情形時表面之凹凸較多,因此易產生剪切破壞。 因此,於本實施方式中,藉由於不進行加熱熔融混練之情況下,將包含熱塑性樹脂之粉體與B 1/(A 1+B 1)之比為0.60以上之氮化硼凝集粒子於常溫下加以攪拌混合,不易產生凝集粒子之剪切破壞,可提昇所獲得之片材之導熱性。 (1) Mixing step In the mixing step, the powder containing thermoplastic resin and boron nitride aggregated particles are stirred and mixed at room temperature. Regarding the above-mentioned boron nitride aggregated particles, the pore volume in the particles of the boron nitride aggregated particles When A 1 is used and the particle interstitial volume is B 1 , B 1 /(A 1 +B 1 ) is 0.60 or more. As a conventional production method, there is a method of heating, melting and kneading matrix resin and boron nitride aggregated particles. However, boron nitride aggregated particles may be sheared and broken by this melt-kneading. In particular, when boron nitride aggregated particles having a ratio of B 1 /(A 1 +B 1 ) of 0.60 or more are used, there are many unevennesses on the surface, so shear fracture is likely to occur. Therefore, in the present embodiment, without heating, melting and kneading, boron nitride aggregated particles having a ratio of B 1 /(A 1 + B 1 ) of 0.60 or more between the powder containing the thermoplastic resin are heated at room temperature Stirring and mixing are not easy to cause shear damage of aggregated particles, and can improve the thermal conductivity of the obtained sheet.

(2)加壓成形步驟 於加壓成形步驟中,對上述混合步驟中所獲得之混合物進行加熱及加壓而使其成形為片狀。 (2) Press forming step In the pressure forming step, the mixture obtained in the above mixing step is heated and pressurized to form a sheet.

作為加壓成形方法,可使用各種公知之熱塑性樹脂成型用之加壓裝置。 就防止加熱加壓中之樹脂劣化之觀點而言,特佳為使用可減少加熱中加壓機內之氧量之真空加壓裝置、或具備氮氣置換裝置之加壓裝置。 As the press molding method, various known press devices for thermoplastic resin molding can be used. From the viewpoint of preventing resin deterioration during heating and pressing, it is particularly preferable to use a vacuum pressurizing device that can reduce the amount of oxygen in the pressurizing machine during heating, or a pressurizing device equipped with a nitrogen replacement device.

於加壓成形步驟中,基於將上述熔融混練物製成厚度均勻之片體之目的,以及藉由使所添加之氮化硼凝集粒子彼此接合,進而使接合部之粒子表面變形而形成熱流路徑之目的、消除片材內之孔隙或空隙之目的等,較佳為設定加壓壓力。 就該觀點而言,加壓成形步驟中之壓力以施加於試樣之實際壓力計,通常為8 MPa以上,較佳為9 MPa以上,更佳為10 MPa以上。又,較佳為50 MPa以下,更佳為40 MPa以下,進而較佳為30 MPa以下。 藉由將該加壓時之壓力設為上述上限值以下,可防止氮化硼凝集粒子破碎,可製成具備較高之導熱性之導熱性樹脂片。又,藉由將加壓壓力設為上述下限值以上,氮化硼凝集粒子間之接觸變得良好,易形成導熱路徑,可獲得具有較高之導熱性之片材,並且可減少樹脂片中之空隙,因此,可製成即便於吸濕回焊試驗後亦具備較高之絕緣破壞電壓之導熱性樹脂片。 In the pressure forming step, based on the purpose of forming the above-mentioned molten kneaded product into a sheet with uniform thickness, and by bonding the added boron nitride aggregated particles to each other, the surface of the particles at the joint is deformed to form a heat flow path For the purpose of removing pores or voids in the sheet, etc., it is preferable to set the pressing pressure. From this point of view, the pressure in the pressure forming step is usually 8 MPa or higher, preferably 9 MPa or higher, more preferably 10 MPa or higher, based on the actual pressure applied to the sample. Moreover, it is preferably at most 50 MPa, more preferably at most 40 MPa, and still more preferably at most 30 MPa. By setting the pressure at the time of this pressurization to be equal to or less than the above-mentioned upper limit, it is possible to prevent boron nitride aggregated particles from being crushed, and it is possible to obtain a thermally conductive resin sheet having high thermal conductivity. In addition, by setting the pressing pressure to be more than the above lower limit, the contact between the boron nitride aggregated particles becomes good, the heat conduction path is easily formed, and a sheet with high thermal conductivity can be obtained, and the number of resin flakes can be reduced. Therefore, it can be made into a thermally conductive resin sheet with a high dielectric breakdown voltage even after the moisture absorption reflow test.

加壓成形步驟中之加壓裝置之設定溫度較佳為熱塑性樹脂表現出流動性之溫度,例如為作為主成分之熱塑性樹脂之熔點+30℃以上。例如於使用聚醚酮系樹脂作為主成分之情形時,較佳為將加壓裝置之設定溫度設為370℃~440℃,其中更佳設為380℃以上或420℃以下。 藉由於該範圍之溫度下實施加壓成形,可對所獲得之導熱性樹脂片賦予良好之厚度均勻性、及由所添加之氮化硼凝集粒子間之良好之接觸而產生之較高之導熱性。若成形溫度為370℃以上,則樹脂黏度低至足以進行賦形加工之程度,可對所成形之導熱性樹脂片賦予充分之厚度均勻性。另一方面,若加壓機之設定溫度為440℃以下,則可抑制樹脂本身之劣化、或成形之導熱性樹脂片之物性下降。 The set temperature of the pressurizing device in the press molding step is preferably the temperature at which the thermoplastic resin exhibits fluidity, for example, the melting point of the thermoplastic resin as the main component + 30° C. or higher. For example, when polyetherketone resin is used as the main component, the set temperature of the pressurizing device is preferably 370°C to 440°C, more preferably 380°C or higher or 420°C or lower. By performing press molding at a temperature within this range, good thickness uniformity can be imparted to the obtained thermally conductive resin sheet, and high thermal conductivity can be generated by good contact between the added boron nitride aggregated particles sex. If the molding temperature is 370°C or higher, the viscosity of the resin is low enough to perform molding processing, and sufficient thickness uniformity can be imparted to the thermally conductive resin sheet formed. On the other hand, if the set temperature of the press machine is 440° C. or lower, deterioration of the resin itself or deterioration of the physical properties of the molded thermally conductive resin sheet can be suppressed.

加壓時間通常為30秒以上,較佳為1分鐘以上,更佳為3分鐘以上,進而較佳為5分鐘以上。又,較佳為1小時以下,更佳為30分鐘以下,進而較佳為15分鐘以下。 藉由為上述上限值以下,而存在可抑制導熱性樹脂片之製造步驟時間,與使用耐熱性之熱硬化性樹脂之導熱性樹脂片相比可縮短週期時間,可抑制生產成本之傾向。又,藉由為上述下限值以上,可充分地獲得導熱性樹脂片之厚度均勻性,可充分地去除內部之空隙或孔隙,可防止導熱性能或耐電壓特性之不均勻。 The pressing time is usually at least 30 seconds, preferably at least 1 minute, more preferably at least 3 minutes, and still more preferably at least 5 minutes. Moreover, it is preferably 1 hour or less, more preferably 30 minutes or less, and still more preferably 15 minutes or less. By being below the above upper limit, the manufacturing process time of the thermally conductive resin sheet can be suppressed, and the cycle time can be shortened compared with a thermally conductive resin sheet using a heat-resistant thermosetting resin, thereby tending to suppress production costs. Moreover, by being more than the said lower limit, the thickness uniformity of a thermally conductive resin sheet can fully be obtained, internal voids or voids can be fully removed, and the nonuniformity of thermal conductivity and withstand voltage characteristic can be prevented.

4.積層散熱片 本實施方式之積層散熱片係於本實施方式之導熱性樹脂片之一表面積層包含散熱性材料之散熱用金屬層而成者。 該散熱性材料只要為包含導熱性良好之材質者則無特別限定。其中,為了提高積層構成時之導熱性,較佳為使用散熱用金屬材料,其中更佳為使用平板狀之金屬材料。 金屬材料之材質並無特別限定。其中,就導熱性良好且價格相對較低之方面而言,較佳為銅板、鋁板、鋁合金板等。 4. Laminated heat sink The laminated heat sink of this embodiment is formed by layering a metal layer for heat dissipation including a heat dissipation material on one surface of the thermally conductive resin sheet of this embodiment. The heat dissipation material is not particularly limited as long as it includes a material with good thermal conductivity. Among them, in order to improve the thermal conductivity when forming a laminate, it is preferable to use a metal material for heat dissipation, and it is more preferable to use a flat metal material. The material of the metal material is not particularly limited. Among them, a copper plate, an aluminum plate, an aluminum alloy plate, etc. are preferable in terms of good thermal conductivity and relatively low price.

於使用平板狀之金屬材料作為積層散熱片中之散熱用金屬材料之情形時,為了確保充分之散熱性,該金屬材料之厚度較佳為0.03~6 mm,其中更佳為0.1 mm以上或5 mm以下。In the case of using a flat metal material as the metal material for heat dissipation in a laminated heat sink, in order to ensure sufficient heat dissipation, the thickness of the metal material is preferably 0.03 to 6 mm, more preferably 0.1 mm or more or 5 mm. mm or less.

關於與散熱用金屬材料之接著,可對金屬材料之與導熱性樹脂片積層之側之表面實施利用軟蝕刻、風化鍍覆處理、氧化還原處理等進行之表面粗糙化處理、用以確保接著耐久性之各種金屬、金屬合金之鍍覆處理、包含胺基系、巰基系等之矽烷偶合處理之有機系表面處理、或利用有機-無機複合材料之表面處理等表面處理。藉由進行該等表面處理,可使初期接著力、接著力之耐久性、抑制於進行吸濕回焊試驗後界面剝離之效果變得更良好。Regarding the bonding with the metal material for heat dissipation, the surface of the metal material on the side where the thermally conductive resin sheet is laminated can be roughened by soft etching, weathering plating treatment, oxidation-reduction treatment, etc. to ensure the durability of the bonding Plating treatment of various metals and metal alloys, organic surface treatment including amine-based, mercapto-based silane coupling treatment, or surface treatment using organic-inorganic composite materials. By performing these surface treatments, the initial adhesive force, the durability of the adhesive force, and the effect of suppressing interfacial peeling after the moisture absorption reflow test can be improved.

另一方面,散熱用金屬材料之與導熱性樹脂片積層之側為相反側之面可並非單純之平板,為了確保與作為氣體或液體之冷卻介質之接觸面積,可實施增大表面積之加工等。 作為該用以增大表面積之加工之例,可例舉:藉由噴擊加工等使表面變得粗糙而增大表面積;藉由切削加工或加壓加工於散熱用金屬材料直接形成V型、矩形等之溝槽或各種形狀之凹凸之方法;對包含平板狀之金屬材料之散熱用金屬層,進而藉由澆鑄加工、擴散接合、或螺栓緊固、焊接、釺接等來接合已賦予用以增大表面積之加工之另一金屬材;或嵌埋金屬製銷等。進而,亦考慮於具有用以使冷卻介質通過之空腔之散熱用金屬層上直接加壓積層導熱性樹脂片。然而,由於導熱性樹脂片與散熱性金屬板之加壓壓力相對較高,故而於該等情形時,較佳為對於將平板狀之金屬材與導熱性樹脂片積層一體化所得者,於後續步驟中藉由焊接、釺接、螺栓接合等而與實施切槽加工之金屬板或具有供冷媒流通之空腔之金屬層進行一體化。 On the other hand, the side of the metal material for heat dissipation that is opposite to the side where the thermally conductive resin sheet is laminated does not need to be a simple flat plate. In order to ensure the contact area with the cooling medium that is gas or liquid, processing to increase the surface area, etc., can be performed. . Examples of the processing for increasing the surface area include: roughening the surface by blasting to increase the surface area; directly forming a V-shape on the metal material for heat dissipation by cutting or pressurizing, The method of grooves such as rectangles or various shapes of concavities and convexities; the metal layer for heat dissipation that includes a flat metal material is further bonded by casting, diffusion bonding, or bolt fastening, welding, welding, etc. Another metal material processed to increase the surface area; or embedding metal pins, etc. Furthermore, it is also conceivable to directly press-laminate a thermally conductive resin sheet on a metal layer for heat dissipation having a cavity through which a cooling medium passes. However, since the pressurization pressure of the heat-conducting resin sheet and the heat-dissipating metal plate is relatively high, in such cases, it is preferable to laminate and integrate the plate-shaped metal material and the heat-conducting resin sheet in a subsequent step. In the step, it is integrated with the metal plate that undergoes grooving processing or the metal layer that has a cavity for the circulation of the refrigerant by welding, welding, bolting, and the like.

關於積層散熱片中之散熱用金屬材料與導熱性樹脂片之積層一體化,可較佳地採用作為分批製程之加壓成形。該情形下之加壓設備或加壓條件等與上述用以獲得導熱性樹脂片之加壓成形條件之範圍相同。For the lamination and integration of the metal material for heat dissipation and the thermally conductive resin sheet in the laminated heat sink, pressure molding as a batch process can be preferably adopted. In this case, the range of the pressurization equipment, pressurization conditions, etc. is the same as the above-mentioned press molding conditions for obtaining a thermally conductive resin sheet.

5.散熱性電路基板 本實施方式之散熱性電路基板係具有上述積層散熱片者。即,該散熱性電路基板具有如下構成:於本實施方式之導熱性樹脂片之一表面積層上述散熱用金屬層,於上述導熱性樹脂片之與散熱用金屬材料相反之另一表面,藉由例如蝕刻處理等形成電路基板。 5. Heat dissipation circuit board The heat-dissipating circuit board of this embodiment has the above-mentioned laminated heat-dissipating sheet. That is, the heat-dissipating circuit board has a structure in which the metal layer for heat dissipation is laminated on one surface of the heat-conductive resin sheet of the present embodiment, and the heat-dissipating resin sheet is formed on the other surface opposite to the metal material for heat dissipation by For example, an etching process or the like forms a circuit board.

作為該散熱性電路基板之構成,更佳為使「散熱用金屬材料/導熱性樹脂片/導電電路」一體化而成者。作為電路蝕刻前之狀態,例如可例舉如下者:於「散熱用金屬材料/導熱性樹脂片/導電電路形成用金屬材料」之一體化構成中,導電電路形成用金屬材料為平板狀,形成於導熱性樹脂片之單面側整個表面或形成於一部分面積。As the composition of the heat-dissipating circuit board, it is more preferable to integrate "metal material for heat dissipation/thermally conductive resin sheet/conductive circuit". As the state before circuit etching, for example, the following can be cited: In the integrated structure of "metal material for heat dissipation/thermally conductive resin sheet/metal material for conductive circuit formation", the metal material for conductive circuit formation is flat and formed Formed on the entire surface or a part of one side of the thermally conductive resin sheet.

導電電路形成用金屬材料之材料並無特別限定。其中,一般而言,就良好之導電性或蝕刻性、成本方面等觀點而言,較佳為由厚度0.05 mm以上1.2 mm以下之銅薄板形成。The material of the metal material for forming a conductive circuit is not particularly limited. Among them, in general, it is preferable to form a copper thin plate with a thickness of 0.05 mm or more and 1.2 mm or less from the viewpoint of good electrical conductivity, etching property, and cost.

散熱性電路基板之絕緣破壞電壓較佳為40 kV/mm以上,更佳為50 kV/mm以上,進而較佳為60 kV/mm以上,進而更佳為80 kV/mm以上。藉由使絕緣破壞電壓為40 kV/mm以上,例如厚度100 μm之導熱性樹脂片亦可獲得4 kV以上之絕緣破壞電壓,若絕緣破壞電壓為80 kV/mm以上,則厚度為50 μm時亦可獲得4 kV以上之絕緣破壞電壓,因此可使用於熱阻方面有利之較薄之導熱性樹脂層之同時具有充分之耐電壓性能,而可抑制於施加高電壓時發生絕緣破壞之情況。The dielectric breakdown voltage of the heat-dissipating circuit board is preferably at least 40 kV/mm, more preferably at least 50 kV/mm, still more preferably at least 60 kV/mm, still more preferably at least 80 kV/mm. By making the dielectric breakdown voltage 40 kV/mm or higher, for example, a thermally conductive resin sheet with a thickness of 100 μm can also obtain a dielectric breakdown voltage of 4 kV or higher. If the dielectric breakdown voltage is 80 kV/mm or higher, the thickness is 50 μm A dielectric breakdown voltage of 4 kV or higher can also be obtained, so it is possible to use a thinner thermally conductive resin layer that is advantageous in terms of thermal resistance while having sufficient withstand voltage performance, and it is possible to suppress the occurrence of dielectric breakdown when a high voltage is applied.

6.功率半導體裝置 本實施方式之導熱性樹脂片或本實施方式之積層散熱片可較佳地用作功率半導體裝置用散熱片,可實現可靠性較高之功率半導體模組。 該功率半導體裝置係使用上述導熱性樹脂片或上述積層散熱片之功率半導體裝置,將上述導熱性樹脂片或上述積層散熱片作為散熱性電路基板安裝於功率半導體器件裝置中。 該功率半導體器件裝置藉由基於較高之導熱性之散熱效果,能夠於較高之可靠性之基礎上實現高輸出、高密度化。 於功率半導體器件裝置中,可適當採用除導熱性樹脂片或積層散熱片以外之鋁配線、密封材、封裝材、散熱座、散熱膏、焊料之類之先前公知之構件。 6. Power semiconductor devices The thermally conductive resin sheet of this embodiment or the laminated heat sink of this embodiment can be preferably used as a heat sink for a power semiconductor device, and a highly reliable power semiconductor module can be realized. The power semiconductor device is a power semiconductor device using the above-mentioned thermally conductive resin sheet or the above-mentioned laminated heat sink, and the above-mentioned thermally conductive resin sheet or the above-mentioned laminated heat sink is mounted on the power semiconductor device as a heat-dissipating circuit board. The power semiconductor device device can achieve high output and high density on the basis of high reliability through the heat dissipation effect based on high thermal conductivity. In power semiconductor device devices, conventionally known components such as aluminum wiring, sealing materials, packaging materials, heat sinks, heat radiation paste, and solder other than thermally conductive resin sheets or laminated heat sinks can be appropriately used.

<第2實施方式> 1.樹脂組合物 本發明之第2實施方式之導熱性樹脂片含有包含熱塑性樹脂及氮化硼凝集粒子之樹脂組合物。 <Second Embodiment> 1. Resin composition A thermally conductive resin sheet according to a second embodiment of the present invention contains a resin composition containing a thermoplastic resin and boron nitride aggregated particles.

(1)熱塑性樹脂 本實施方式之熱塑性樹脂與上述第1實施方式中說明之熱塑性樹脂相同,本實施方式中較佳之熱塑性樹脂之物性及樹脂之種類亦與上述第1實施方式相同。 (1) Thermoplastic resin The thermoplastic resin of this embodiment is the same as the thermoplastic resin described in the above-mentioned first embodiment, and the physical properties and resin types of preferable thermoplastic resins in this embodiment are also the same as those of the above-mentioned first embodiment.

(2)氮化硼凝集粒子 本實施方式之氮化硼凝集粒子與上述第1實施方式中說明之氮化硼凝集粒子相同,本實施方式中較佳之氮化硼凝集粒子之物性及構造亦與上述第1實施方式相同。 再者,於本實施方式中,樹脂組合物中之氮化硼凝集粒子中之圓形度以1為上限,較佳為超過0.945,更佳為0.95以上,進而較佳為0.96以上。 (2) Boron nitride agglomerated particles The boron nitride aggregated particles of this embodiment are the same as the boron nitride aggregated particles described in the above-mentioned first embodiment, and the physical properties and structure of preferable boron nitride aggregated particles in this embodiment are also the same as those of the above-mentioned first embodiment. Furthermore, in this embodiment, the circularity of boron nitride aggregated particles in the resin composition has 1 as the upper limit, and is preferably more than 0.945, more preferably 0.95 or more, and still more preferably 0.96 or more.

(3)各成分之含量 本實施方式之樹脂組合物中之熱塑性樹脂及氮化硼凝集粒子之含量與上述第1實施方式相同。 又,本實施方式之樹脂組合物亦可含有除熱塑性樹脂及氮化硼凝集粒子以外之其他成分。但是,就提昇導熱性之觀點而言,較佳為不含其他成分。該其他成分為上述第1實施方式中例示者。 (3) Content of each ingredient The content of the thermoplastic resin and boron nitride aggregated particles in the resin composition of this embodiment is the same as that of the above-mentioned first embodiment. Moreover, the resin composition of this embodiment may contain other components other than a thermoplastic resin and boron nitride aggregated particle. However, from the viewpoint of improving thermal conductivity, it is preferable not to contain other components. The other components are those exemplified in the above-mentioned first embodiment.

2.導熱性樹脂片 本實施方式之導熱性樹脂片具有如下特徵:包含上述樹脂組合物,於厚度方向具有較高之導熱性,耐吸濕回焊性優異,於製作與金屬板之積層體時不易發生由熱膨脹及熱收縮引起之界面剝離。 2. Thermally conductive resin sheet The thermally conductive resin sheet of this embodiment has the following features: it contains the above-mentioned resin composition, has high thermal conductivity in the thickness direction, is excellent in resistance to moisture absorption and reflow, and is less prone to thermal expansion and Interfacial peeling caused by shrinkage.

將含有包含氮化硼凝集粒子之樹脂組合物之導熱性樹脂片於700℃下加熱5小時而去除樹脂成分,關於其灰分,於藉由壓汞法測定水銀壓入退出曲線之後,製作將孔徑作為橫軸,將對數微分孔隙容積作為縱軸之孔徑分佈曲線,於通常未達5 μm,較佳為0.1 μm以上且未達5 μm之範圍、及通常5 μm以上,較佳為5 μm以上100 μm以下之範圍觀察到峰。於本發明中,將於未達5 μm,較佳為0.1 μm以上且未達5 μm之範圍具有極大值之峰設為第1峰,將於5 μm以上,較佳為5 μm以上100 μm以下之範圍具有極大值之峰設為第2峰。於未達5 μm之範圍包含起因於氮化硼凝集粒子之粒子內孔之峰a,於5 μm以上之範圍包含起因於氮化硼凝集粒子之粒子間隙之峰b。A thermally conductive resin sheet containing a resin composition containing boron nitride aggregated particles was heated at 700°C for 5 hours to remove the resin component. Regarding the ash content, after measuring the mercury intrusion and exit curve by mercury intrusion porosimetry, the pore diameter was prepared. As the horizontal axis, the pore size distribution curve with the logarithmic differential pore volume as the vertical axis is usually less than 5 μm, preferably 0.1 μm or more and less than 5 μm, and usually 5 μm or more, preferably 5 μm or more A peak is observed in the range below 100 μm. In the present invention, the peak having a maximum value in the range of less than 5 μm, preferably 0.1 μm or more and less than 5 μm is set as the first peak, and the peak is 5 μm or more, preferably 5 μm or more and 100 μm The peak having the maximum value in the range below was set as the second peak. The range below 5 μm includes the peak a caused by the inner pores of the boron nitride aggregated particles, and the range above 5 μm includes the peak b caused by the interparticle gap of the boron nitride aggregated particles.

於本發明中,分別將第1峰及第2峰之極大值稱為第1峰頂高度、第2峰頂高度。又,將第1峰及第2峰分別表示極大值時之孔徑分別稱為第1峰頂直徑、第2峰頂直徑。In the present invention, the maximum values of the first peak and the second peak are respectively referred to as the first peak top height and the second peak top height. Also, the pore diameters at which the first peak and the second peak show maximum values are referred to as the first peak top diameter and the second peak top diameter, respectively.

再者,作為於5 μm以上之範圍具有複數個峰之情形,認為,有如下情形:於殘留灰分中,將具備2種粒徑分佈者作為氮化硼凝集粒子加以混合使用之情形;除氮化硼凝集粒子以外亦包含除氮化硼以外之填料之情形;或出現由氮化硼凝集粒子於成形製程中崩解而產生之碎片或自凝集粒子脫離之一次粒子引起之峰之情形。於該等情形下,認為,第2峰頂高度小於本實施方式之情況較多,難以獲得較高之導熱率。In addition, as the case where there are multiple peaks in the range of 5 μm or more, it is considered that there are the following cases: in the residual ash, those with two particle size distributions are mixed and used as boron nitride aggregated particles; Boron aggregated particles also contain fillers other than boron nitride; or peaks caused by fragments generated by the disintegration of boron nitride aggregated particles during the forming process or primary particles detached from the aggregated particles. In these cases, it is considered that the height of the second peak top is often smaller than that of the present embodiment, and it is considered that it is difficult to obtain high thermal conductivity.

為了提昇導熱性樹脂片之導熱性,較佳為:使用具有凝集粒子之最外表面附近之一次粒子與凝集粒子之放射方向一致之構造之凝集粒子,薄片化後於凝集粒子彼此相互面接觸之狀態下表面附近變形,進而凝集粒子本身之崩解或伴隨該崩解產生之一次粒子之脫落較少,凝集粒子彼此之接觸面積變大。就該觀點而言,較佳為第2峰頂直徑較大。In order to improve the thermal conductivity of the thermally conductive resin sheet, it is preferable to use aggregated particles having a structure in which the primary particles near the outermost surface of the aggregated particles are aligned with the radiation direction of the aggregated particles, and the aggregated particles are in surface contact with each other after sheeting. In this state, the vicinity of the surface is deformed, and the disintegration of the aggregated particles themselves or the shedding of the primary particles accompanying the disintegration is less, and the contact area between the aggregated particles becomes larger. From this point of view, it is preferable that the diameter of the second peak top is larger.

第2峰頂直徑較佳為15 μm以上,更佳為16 μm以上,進而較佳為17 μm以上。另一方面,就使凝集粒子彼此處於諸如面接觸之狀態而增加接觸面積,從而減小凝集粒子相互間之熱阻之觀點而言,第2峰頂直徑較佳為30 μm以下,更佳為25 μm以下。 若第2峰頂直徑較大,則於複數個凝集粒子間僅存在樹脂之部分,故而若局部觀察則熱阻較大之部分以相對較大之容積存在,一般而言,就賦予散熱片高導熱率之方面而言,留下不佳之印象。 然而,於將氮化硼凝集粒子用作導熱性填料之情形時,尤其是對於構成凝集粒子之一次粒子彼此牢固地結合而形成之紙牌屋型氮化硼凝集粒子,即便於片材成形後亦維持凝集粒子內部之一次粒子彼此之牢固之結合這一點較為重要。為了維持凝集粒子內部之一次粒子間之有效之熱傳遞,較佳為避免於片材中凝集粒子過度變形或被壓碎。存在自過度變形或被壓碎之凝集粒子產生單獨之一次粒子脫離之情況或數個一次粒子於結合之狀態下脫離之情況。於產生該等粒子之情形時,有第2峰頂高度變小,或第2峰頂直徑變小,或第2峰變為較寬之形狀之傾向。 The second peak top diameter is preferably at least 15 μm, more preferably at least 16 μm, and still more preferably at least 17 μm. On the other hand, from the viewpoint of increasing the contact area by bringing the aggregated particles into surface contact with each other, thereby reducing the thermal resistance between the aggregated particles, the second peak diameter is preferably 30 μm or less, more preferably 30 μm or less. Below 25 μm. If the diameter of the second peak is large, only the part of the resin exists between a plurality of aggregated particles. Therefore, if viewed locally, the part with a large thermal resistance exists in a relatively large volume. Generally speaking, the heat sink has a high In terms of thermal conductivity, it leaves a bad impression. However, when aggregated boron nitride particles are used as a thermally conductive filler, particularly house-of-card-type aggregated boron nitride particles in which the primary particles constituting the aggregated particles are firmly bonded to each other, the aggregated boron nitride particles are not stable even after the sheet is formed. It is important to maintain the firm combination of the primary particles inside the aggregated particles. In order to maintain effective heat transfer between the primary particles inside the aggregated particles, it is preferable to avoid excessive deformation or crushing of the aggregated particles in the sheet. There is a case where a single primary particle detaches from excessively deformed or crushed aggregated particles, or a case where a plurality of primary particles detach in a bonded state. When such particles are generated, the height of the second peak top becomes smaller, or the diameter of the second peak top becomes smaller, or the second peak tends to become a wider shape.

第2峰頂高度較佳為1.0 mL/g以上,更佳為1.2 mL/g以上,進而較佳為1.5 mL/g以上。第2峰頂高度之上限並無特別限定,由於圓形度較高且粒徑分佈相對狹窄之氮化硼凝集粒子原料之第2峰頂高度為3.5左右,因此較佳為3.2 mL/g以下,更佳為3.0 mL/g以下,進而較佳為2.7 mL/g以下,進而更佳為2.5 mL/g以下。 第2峰頂高度係表示片材中之凝集粒子彼此之面接觸狀態之均勻性的指標。 如上所述,於片材中,凝集粒子較佳為因其表面附近變形而使得凝集粒子彼此變為面接觸狀態,但其變形程度視每個凝集粒子而有較大差異,於如一部分變為接近點接觸之狀態之情形時,無法獲得片材整體之高導熱性。於此種情形下,第2峰頂高度變小。 關於第2峰頂高度為上述下限值以上,表示片材中之凝集粒子伴隨著相對均勻之變形而變為相對均勻之面接觸狀態,粒子間隙容積變得相對均勻。 The second peak top height is preferably at least 1.0 mL/g, more preferably at least 1.2 mL/g, still more preferably at least 1.5 mL/g. The upper limit of the second peak height is not particularly limited. Since the second peak height of boron nitride aggregated particle raw materials with high circularity and relatively narrow particle size distribution is about 3.5, it is preferably 3.2 mL/g or less. , more preferably 3.0 mL/g or less, further preferably 2.7 mL/g or less, still more preferably 2.5 mL/g or less. The second peak height is an index showing the uniformity of the surface contact state of the aggregated particles in the sheet. As described above, in the sheet, the aggregated particles are preferably deformed near the surface so that the aggregated particles are brought into surface contact with each other. When it is close to the state of point contact, high thermal conductivity of the entire sheet cannot be obtained. In this case, the height of the second peak becomes smaller. The fact that the second peak top height is equal to or greater than the above-mentioned lower limit means that the aggregated particles in the sheet are in a relatively uniform surface-to-face contact state accompanied by relatively uniform deformation, and the particle interstitial volume becomes relatively uniform.

又,本實施方式之導熱性樹脂片較佳為第1峰頂直徑較小,即具有粒子間隙較小,凝集粒子緻密之構造。 認為,於第1峰頂直徑較小之情形時,作為原料之氮化硼凝集粒子本身之粒子間隙較小,結果,於片材成形後,來自原料之粒子間隙亦維持較小。認為,粒子間隙較小之氮化硼凝集粒子具有一次粒子彼此形成緻密之結合體,易獲得凝集粒子內部之高導熱性之構造。第1峰頂直徑較小反映出如上所述之凝集粒子即便經過片材加工時之加壓等亦不會過度變形或被壓壞,且不會出現一次粒子脫落等情況,認為,若第1峰頂直徑較小,則導熱率易於變得良好。 再者,亦認為,由於片材成形時之加壓等而使凝集粒子過度變形或崩解,結果,第1峰頂直徑變小,於此情形時,上述第2峰頂高度及第2峰頂直徑處於上述範圍外。 就以上觀點而言,第1峰頂直徑較佳為0.4 μm以下,更佳為0.38 μm以下。另一方面,就充分地確保樹脂浸透於凝集粒子之內部孔內,抑制導熱性樹脂片中產生孔隙而提昇耐電壓性能之觀點而言,第1峰頂直徑較佳為0.1 μm以上,更佳為0.15 μm以上,進而較佳為0.2 μm以上。 In addition, the thermally conductive resin sheet according to the present embodiment preferably has a smaller first peak diameter, that is, has a structure in which interparticle gaps are smaller and aggregated particles are dense. It is considered that when the diameter of the first peak top is small, the particle gaps of boron nitride agglomerated particles as a raw material itself are small, and as a result, the particle gaps from the raw material also remain small after sheet forming. It is believed that boron nitride aggregated particles with small particle gaps have a structure in which the primary particles form a dense combination, and it is easy to obtain high thermal conductivity inside the aggregated particles. The smaller diameter of the first peak reflects that the above-mentioned aggregated particles will not be excessively deformed or crushed even if they are subjected to pressure during sheet processing, and the primary particle will not fall off. It is considered that if the first The smaller the peak top diameter, the better the thermal conductivity is likely to be. Furthermore, it is also considered that the aggregated particles are excessively deformed or disintegrated due to pressurization during sheet forming, and as a result, the diameter of the first peak top becomes smaller. In this case, the height of the second peak top and the height of the second peak The top diameter is outside the above range. From the above point of view, the first peak top diameter is preferably 0.4 μm or less, more preferably 0.38 μm or less. On the other hand, from the viewpoint of sufficiently ensuring that the resin penetrates into the internal pores of the aggregated particles, suppressing the generation of voids in the thermally conductive resin sheet and improving the withstand voltage performance, the first peak top diameter is preferably 0.1 μm or more, more preferably It is 0.15 μm or more, and more preferably 0.2 μm or more.

又,第1峰頂高度較佳為0.25 mL/g以上,更佳為0.3 mL/g以上,進而較佳為0.4 mL/g以上。第1峰頂高度之上限並無特別限定,較佳為0.7 mL/g以下,更佳為0.65 mL/g以下,進而較佳為0.6 mL/g以下。 若第1峰頂高度為上述上限值以下,則凝集粒子內部之孔隙容積不會變得過大,適度存在能夠於凝集粒子內部有效率地進行導熱之一次粒子。 另一方面,關於第1峰頂高度為上述下限值以上,表示用作原料之凝集粒子本身之內部空隙適度存在。認為,若為此種凝集粒子,則於片材中,凝集粒子彼此之表面附近適度變形,易發生面接觸。 又,作為第1峰頂高度低於上述下限值之情形,認為有觀察到第1峰為較寬形狀之峰之情形。於此情形時,認為構成用作原料之凝集粒子之一次粒子之立體構造中之各位置之差異明顯,或者因片材成形時之加壓等而導致變形、破壞亦波及至凝集粒子內部。 Also, the first peak top height is preferably at least 0.25 mL/g, more preferably at least 0.3 mL/g, and still more preferably at least 0.4 mL/g. The upper limit of the first peak height is not particularly limited, but is preferably 0.7 mL/g or less, more preferably 0.65 mL/g or less, further preferably 0.6 mL/g or less. If the first peak top height is not more than the above-mentioned upper limit, the pore volume inside the aggregated particles does not become too large, and primary particles capable of efficiently conducting heat inside the aggregated particles are moderately present. On the other hand, the fact that the first peak top height is equal to or greater than the above-mentioned lower limit indicates that the internal voids of the aggregated particles themselves used as raw materials are moderately present. Such aggregated particles are considered to cause moderate deformation near the surfaces of the aggregated particles in the sheet, and surface contact is likely to occur. In addition, as the case where the height of the first peak top is lower than the above-mentioned lower limit value, it is considered that the first peak may be observed as a broad peak. In this case, it is considered that the three-dimensional structure of the primary particles constituting the aggregated particles used as a raw material is significantly different, or that deformation and destruction due to pressure during sheet forming also spread to the inside of the aggregated particles.

如上所述,由第1峰頂高度、第1峰頂直徑、第2峰頂高度及第2峰頂直徑表示凝集粒子之強度、薄片化後之一次粒子之配向狀態等。 本發明人等發現,該等要素中,第2峰頂高度及第2峰頂直徑影響耐電壓性能及導熱率。 第2峰頂高度及第2峰頂直徑處於上述範圍內係表示使用具有足夠強度之凝集粒子,若為此種導熱性樹脂片,則藉由使用於成形時等凝集粒子之崩解較少,且凝集粒子表面之一次粒子呈放射狀配向之紙牌屋型氮化硼凝集粒子作為原料,可充分地形成凝集粒子間之導熱路徑。 又,本發明人等亦發現,該等要素中,第1峰頂直徑及第2峰頂直徑影響耐電壓性能及導熱率。 若第1峰頂直徑及第2峰頂直徑處於上述範圍內,則具有可謂「內剛外柔」之構造,即,於凝集粒子內部緻密且維持具備各向同性之導熱率之構造之狀態下,凝集粒子表面之一次粒子呈放射狀配向之區域於成形時等適度變形,因此相鄰接之凝集粒子彼此之接觸面積增加,可進一步提高導熱性樹脂片之厚度方向之導熱率。 As described above, the strength of aggregated particles, the alignment state of primary particles after flaking, and the like are indicated by the first peak top height, first peak top diameter, second peak top height, and second peak top diameter. The inventors of the present invention found that, among these factors, the second peak height and the second peak diameter affect the withstand voltage performance and thermal conductivity. The height of the second peak and the diameter of the second peak within the above range indicate that aggregated particles with sufficient strength are used, and if such a thermally conductive resin sheet is used, the aggregated particles are less disintegrated during molding, etc. And the house-of-cards-shaped boron nitride aggregated particles whose primary particles on the surface of the aggregated particles are radially aligned are used as the raw material, which can fully form the heat conduction path between the aggregated particles. Furthermore, the inventors of the present invention also found that, among these factors, the first peak top diameter and the second peak top diameter affect the withstand voltage performance and thermal conductivity. If the diameter of the first peak top and the second peak top diameter are within the above range, it has a structure that can be called "hard inside and soft outside", that is, in the state where the interior of the aggregated particles is dense and maintains a structure with isotropic thermal conductivity The region where the primary particles on the surface of the aggregated particles are radially aligned is moderately deformed during molding, so the contact area between adjacent aggregated particles increases, and the thermal conductivity in the thickness direction of the thermally conductive resin sheet can be further improved.

作為第1峰頂高度、第1峰頂直徑、第2峰頂高度及第2峰頂直徑處於上述範圍內之氮化硼凝集粒子,例如可例舉具有紙牌屋構造之凝集粒子。又,於藉由公知之方法獲得氮化硼凝集粒子後,可實施物理之表面粗糙化處理或化學之表面粗糙化處理來進行調整。 通常,市售之氮化硼凝集粒子使用於造粒時結晶化相對進行之氮化硼一次粒子,因此,優先產生穩定之一次粒子之面(ab面)彼此之堆疊,因而凝集粒子之最外表面附近之一次粒子之厚度方向與凝集粒子之放射方向一致之「甘藍構造」者較多。由於「甘藍構造」之凝集粒子之最外表面附近之一次粒子以覆蓋凝集粒子之方式存在,又,凝集粒子之強度本身亦較低者較多,因此於片材之加熱灰分之測定中,第2峰頂高度及第2峰頂直徑易變小。因此,於使用「甘藍構造」之凝集粒子之情形時,可實施上述表面粗糙化處理來進行調整。 Examples of aggregated particles of boron nitride having a first peak height, a first peak diameter, a second peak height, and a second peak diameter within the above ranges include aggregated particles having a house of cards structure. In addition, after boron nitride aggregated particles are obtained by a known method, physical surface roughening treatment or chemical surface roughening treatment can be performed for adjustment. Usually, commercially available boron nitride aggregated particles use boron nitride primary particles that are relatively crystallized during granulation. Therefore, stable primary particle faces (ab faces) are preferentially stacked, and the outermost portion of the aggregated particles There are many "cabbage structures" in which the thickness direction of primary particles near the surface is consistent with the radiation direction of aggregated particles. Since the primary particles near the outermost surface of the aggregated particles of the "cabbage structure" exist in the form of covering the aggregated particles, and the strength of the aggregated particles itself is relatively low, so in the measurement of the heated ash content of the sheet, the second The height of the 2 peak and the diameter of the second peak tend to become smaller. Therefore, in the case of using the aggregated particles of the "cabbage structure", the above-mentioned surface roughening treatment can be performed for adjustment.

本實施方式之導熱性樹脂片之25℃下之厚度方向之導熱率較佳為18 W/m・K以上,更佳為19 W/m・K以上,進而較佳為20 W/m・K以上。藉由使厚度方向之導熱率為上述下限值以上,亦可較佳地用於在高溫下作動之功率半導體裝置等。 該導熱率可藉由熱塑性樹脂之種類及熔融黏度等物性值、導熱性樹脂片中之第1峰頂高度、第1峰頂直徑、第2峰頂高度及第2峰頂直徑之值、氮化硼凝集粒子之構造及含量、熱塑性樹脂與氮化硼凝集粒子之混合方法、下述加熱混練步驟中之條件等進行調整。 The thermal conductivity of the thermally conductive resin sheet of the present embodiment in the thickness direction at 25°C is preferably at least 18 W/m·K, more preferably at least 19 W/m·K, still more preferably at least 20 W/m·K above. By making the thermal conductivity in the thickness direction more than the above-mentioned lower limit value, it can be preferably used also for power semiconductor devices and the like that operate at high temperatures. The thermal conductivity can be determined by the type of thermoplastic resin and physical property values such as melt viscosity, the value of the first peak height, the first peak diameter, the second peak height and the second peak diameter in the thermally conductive resin sheet, nitrogen The structure and content of the boron nitride aggregated particles, the mixing method of the thermoplastic resin and the boron nitride aggregated particles, and the conditions in the following heating and kneading step were adjusted.

又,就抑制凝集粒子之過度變形,使片材之導熱率變得良好之觀點而言,本實施方式之殘留灰分中所包含之氮化硼凝集粒子之圓形度較佳為超過0.945,更佳為0.95以上。又,若凝集粒子彼此面接觸,則片材之導熱率變得良好,因此圓形度較佳為0.99以下,更佳為0.98以下,進而較佳為0.97以下。Also, from the viewpoint of suppressing excessive deformation of the aggregated particles and improving the thermal conductivity of the sheet, the circularity of the boron nitride aggregated particles contained in the residual ash in this embodiment is preferably greater than 0.945, and more preferably Preferably, it is more than 0.95. In addition, when the aggregated particles are in surface contact with each other, the thermal conductivity of the sheet becomes good, so the circularity is preferably at most 0.99, more preferably at most 0.98, and still more preferably at most 0.97.

3.導熱性樹脂片之製造方法 作為本實施方式之導熱性樹脂片之製造方法之一例,例如可例舉包括混合步驟及加壓成形步驟之方法。 3. Manufacturing method of thermally conductive resin sheet As an example of the manufacturing method of the heat conductive resin sheet of this embodiment, the method including a mixing process and a press molding process is mentioned, for example.

作為諸如針對片材之加熱灰分所測得之第2峰頂直徑變大之氮化硼凝集粒子,可選擇凝集粒子表面之一次粒子呈放射狀,且凝集粒子表面之凹凸較多者。 若於先前之製造方法(濕式塗佈法)中使用此種氮化硼凝集粒子,則藉由片材之加壓成形時等之按壓,可獲得能夠減小凝集粒子彼此接觸時之界面熱阻之效果,但漿料易變得黏稠,於與樹脂混練時或塗佈至基板時更容易產生氣泡,因此樹脂膜中易殘留有氣泡,易發生耐電壓性能下降之情況。又,若使用此種氮化硼凝集粒子,則存在於塗佈時易產生條紋,生產性變差之情況。 As the boron nitride aggregated particles whose second peak diameter becomes large as measured by the heated ash content of the sheet, those with radial primary particles on the surface of the aggregated particles and with many irregularities on the surface of the aggregated particles can be selected. If such boron nitride aggregated particles are used in the conventional production method (wet coating method), it is possible to reduce the interfacial heat when the aggregated particles come into contact with each other by pressing the sheet under pressure. However, the slurry tends to become viscous, and air bubbles are more likely to be generated when it is mixed with resin or applied to the substrate. Therefore, air bubbles are likely to remain in the resin film, and the withstand voltage performance is prone to decrease. Also, when such boron nitride aggregated particles are used, streaks are likely to be generated during coating, and productivity may be deteriorated.

於本實施方式之製造方法中,藉由於熱塑性樹脂表現出流動性之溫度下加壓而成形為片材,熱塑性樹脂被壓入至氮化硼凝集粒子中之空隙中,因此片材內不易包含氣泡。並且,於本實施方式中,可不使用溶劑而獲得片材,因此亦不會產生由殘留溶劑引起之發泡。因此,根據本實施方式之製造方法,可使導熱性樹脂片之耐電壓性能變得良好。 又,本實施方式之製造方法由於不經過塗佈步驟,因此即便使用諸如針對片材之加熱灰分所測得之第2峰頂直徑變大之氮化硼凝集粒子作為原料,亦不會產生由塗佈引起之問題,如產生條紋等,生產性良好。 In the production method of this embodiment, the sheet is formed by applying pressure at a temperature at which the thermoplastic resin exhibits fluidity, and the thermoplastic resin is pressed into the voids in the boron nitride aggregated particles, so that it is difficult to contain boron nitride in the sheet. bubble. Moreover, in this embodiment, since a sheet can be obtained without using a solvent, foaming by a residual solvent does not generate|occur|produce. Therefore, according to the manufacturing method of this embodiment, the withstand voltage performance of a thermally conductive resin sheet can be made favorable. In addition, since the production method of the present embodiment does not go through the coating step, even if boron nitride aggregated particles whose second peak diameter as measured by the heating ash of the sheet is used as a raw material, there is no occurrence of Problems caused by coating, such as streaks, etc., are good in productivity.

如上所述,由於先前之主流為使用熱硬化性樹脂作為基質樹脂,因此較多使用濕式塗佈法作為導熱性樹脂片之製造方法。認為,於該濕式塗佈法中,若凝集粒子表面之凹凸較多,則多數情況下會產生如上所述之不良情況,因此較佳為凝集粒子表面之凹凸儘可能少(即,如針對片材之加熱灰分所測得之第2峰頂直徑變小)之凝集粒子。 另一方面,就導熱性觀點而言,較佳為凝集粒子表面之一次粒子呈放射狀,此種粒子之B 1/(A 1+B 1)之比大於0.60之情況較多。 如此,於使用先前之製造方法之情形時,耐電壓性能及生產性之提昇與導熱性之提昇於第2峰頂直徑方面為取捨關係。 根據本實施方式之製造方法,可於不考慮濕式塗佈法中之不良情況之情況下使用諸如針對片材之加熱灰分所測得之第2峰頂直徑變大之凝集粒子,因此可使耐電壓性能及生產性變得良好,並提昇導熱性。 As mentioned above, since the previous mainstream is to use thermosetting resin as the matrix resin, wet coating method is often used as the manufacturing method of the thermally conductive resin sheet. It is considered that in this wet coating method, if there are many irregularities on the surface of the aggregated particles, the above-mentioned disadvantages will occur in many cases. Agglomerated particles where the diameter of the second peak top measured by the heated ash of the sheet becomes smaller). On the other hand, from the viewpoint of thermal conductivity, it is preferable that the primary particles on the surface of aggregated particles are radial, and the ratio of B 1 /(A 1 +B 1 ) of such particles is often greater than 0.60. Thus, in the case of using the conventional manufacturing method, there is a trade-off relationship between the improvement of withstand voltage performance and productivity and the improvement of thermal conductivity in terms of the second peak top diameter. According to the production method of the present embodiment, aggregated particles such as those whose second peak diameter becomes large as measured by the heating ash content of the sheet can be used without considering the disadvantages in the wet coating method, so it is possible to use The withstand voltage performance and productivity are improved, and the thermal conductivity is improved.

(1)混合步驟 於混合步驟中,將包含熱塑性樹脂之粉體與氮化硼凝集粒子於常溫下加以攪拌混合。 作為先前之製造方法,有將基質樹脂與氮化硼凝集粒子進行加熱熔融混練之方法。然而,於使用諸如針對片材之加熱灰分所測得之第2峰頂直徑變大之氮化硼凝集粒子之情形時,表面之凹凸較多,因此易產生剪切破壞。 因此,於本實施方式中,藉由於不進行加熱熔融混練之情況下,將包含熱塑性樹脂之粉體、及諸如針對片材之加熱灰分所測得之第2峰頂直徑變大之氮化硼凝集粒子於常溫下加以攪拌混合,不易產生凝集粒子之剪切破壞,可提昇所獲得之片材之導熱性。 (1) Mixing step In the mixing step, the powder containing thermoplastic resin and boron nitride aggregated particles are stirred and mixed at normal temperature. As a conventional production method, there is a method of heating, melting and kneading matrix resin and boron nitride aggregated particles. However, when boron nitride agglomerated particles having a large second peak diameter as measured by the heated ash content of the sheet are used, the surface has many irregularities, so shear fracture is likely to occur. Therefore, in the present embodiment, without heating, melting and kneading, a powder containing a thermoplastic resin and boron nitride having a larger second peak diameter as measured by the heating ash content of the sheet The agglomerated particles are stirred and mixed at room temperature, so that the shear damage of the agglomerated particles is not easy to occur, and the thermal conductivity of the obtained sheet can be improved.

(2)加壓成形步驟 於加壓成形步驟中,對上述混合步驟中所獲得之混合物進行加熱及加壓而使其成形為片狀。 本實施方式中較佳之加壓成形方法與上述第1實施方式相同。 (2) Press forming step In the pressure forming step, the mixture obtained in the above mixing step is heated and pressurized to form a sheet. A preferred press molding method in this embodiment is the same as that in the above-mentioned first embodiment.

4.積層散熱片、散熱性電路基板及功率半導體裝置 與上述第1實施方式相同,本實施方式之導熱性樹脂片適宜用作積層散熱片、散熱性電路基板及功率半導體裝置。 4. Laminated heat sinks, heat-dissipating circuit substrates, and power semiconductor devices Similar to the above-mentioned first embodiment, the thermally conductive resin sheet of this embodiment is suitably used as a laminated heat sink, a heat-dissipating circuit board, and a power semiconductor device.

<語句之說明> 於本發明中,於以「X~Y」(X、Y為任意之數字)表述之情形時,只要無特別說明,則意為「X以上Y以下」,並且亦包含「較佳為大於X」或「較佳為小於Y」之意。 又,於以「X以上」(X為任意之數字)或「Y以下」(Y為任意之數字)表述之情形時,亦包含「較佳為大於X」或「較佳為未達Y」之主要含義。 於本發明中,所謂「片材」,包含片、膜、帶之概念。 [實施例] <Description of sentences> In the present invention, when expressed as "X~Y" (X, Y are arbitrary numbers), unless otherwise specified, it means "more than X but less than Y" and also includes "preferably greater than X". ” or “preferably less than Y”. In addition, when expressed as "more than X" (X is any number) or "below Y" (Y is any number), it also includes "preferably greater than X" or "preferably less than Y". main meaning. In the present invention, the term "sheet" includes concepts of sheet, film, and tape. [Example]

以下,藉由實施例更詳細地說明本發明。但是,本發明只要不超出其主旨,則不限定於以下實施例。Hereinafter, the present invention will be described in more detail by means of examples. However, the present invention is not limited to the following examples unless the gist is exceeded.

<實施例1~3及比較例1~4> 實施例1~3及比較例1~4中之導熱性樹脂片之使用材料、製作方法、及測定條件、評估方法如下所述。 <Examples 1-3 and Comparative Examples 1-4> Materials used, production methods, measurement conditions, and evaluation methods of the thermally conductive resin sheets in Examples 1-3 and Comparative Examples 1-4 are as follows.

[使用材料] (熱塑性樹脂) 熱塑性樹脂1:使用聚醚醚酮「KetaSpire KT-880FP」(Solvay公司製造,熔點:343℃,熔融黏度:0.15 kPa・s(400℃),平均粒徑(D50):30.0~45.0 μm,MFR:86 g/10分鐘,質量平均分子量(Mw):58000)。 [use material] (thermoplastic resin) Thermoplastic resin 1: Polyetheretherketone "KetaSpire KT-880FP" (manufactured by Solvay Co., Ltd., melting point: 343°C, melt viscosity: 0.15 kPa・s (400°C), average particle size (D50): 30.0 to 45.0 μm, MFR : 86 g/10 minutes, mass average molecular weight (Mw): 58000).

(熱硬化性樹脂) 熱硬化性樹脂1:環氧系樹脂組合物(雙酚F型環氧樹脂(三菱化學公司製造,聚苯乙烯換算之質量平均分子量:60000)8.74質量份、氫化雙酚A型液狀環氧樹脂(三菱化學公司製造)10.93質量份、對胺基苯酚型液狀環氧樹脂(三菱化學公司製造)2.62質量份、酚樹脂系硬化劑「MEH-8000H」(明和化成公司製造)5.73質量份、作為硬化觸媒之1-氰乙基-2-十一烷基咪唑「C11Z-CN」(四國化成公司製造,分子量275)0.48質量份)。 (thermosetting resin) Thermosetting resin 1: Epoxy resin composition (bisphenol F type epoxy resin (manufactured by Mitsubishi Chemical Corporation, mass average molecular weight in terms of polystyrene: 60000) 8.74 parts by mass, hydrogenated bisphenol A type liquid epoxy 10.93 parts by mass of resin (manufactured by Mitsubishi Chemical Corporation), 2.62 parts by mass of p-aminophenol-type liquid epoxy resin (manufactured by Mitsubishi Chemical Corporation), 5.73 parts by mass of phenolic resin-based hardener "MEH-8000H" (manufactured by Meiwa Kasei Co., Ltd.) , 0.48 parts by mass of 1-cyanoethyl-2-undecylimidazole "C11Z-CN" (manufactured by Shikoku Chemicals, molecular weight: 275) as a curing catalyst.

氮化硼凝集粒子(導熱性填料) 作為氮化硼凝集粒子而使用之導熱性填料如下所述。 導熱性填料1:具有紙牌屋構造之氮化硼凝集粒子(B 1/(A 1+B 1)=0.664、平均粒徑(D50):35 μm、最大粒徑Dmax:90 μm) 導熱性填料2:具有紙牌屋構造之氮化硼凝集粒子(B 1/(A 1+B 1)=0.662、平均粒徑(D50):35 μm、最大粒徑Dmax:90 μm) 導熱性填料3:具有紙牌屋構造之氮化硼凝集粒子(B 1/(A 1+B 1)=0.648、平均粒徑(D50):35 μm、最大粒徑Dmax:90 μm) 導熱性填料4:具有紙牌屋構造之氮化硼凝集粒子(B 1/(A 1+B 1)=0.516、平均粒徑(D50):34 μm、最大粒徑Dmax:90 μm) 導熱性填料5:具有紙牌屋構造之氮化硼凝集粒子(B 1/(A 1+B 1)=0.556、平均粒徑(D50):40 μm、最大粒徑Dmax:90 μm) 導熱性填料6:具有甘藍構造(凝集粒子之最外表面附近之一次粒子之厚度方向與凝集粒子之放射方向一致)之氮化硼凝集粒子(「PTX25」(Momentive公司製造,B 1/(A 1+B 1)=0.441,平均粒徑(D50)25 μm,比表面積7 m 2/g) Aggregated boron nitride particles (thermally conductive filler) Thermally conductive fillers used as aggregated boron nitride particles are as follows. Thermally conductive filler 1: Boron nitride agglomerated particles having a house of cards structure (B 1 /(A 1 + B 1 )=0.664, average particle diameter (D50): 35 μm, maximum particle diameter Dmax: 90 μm) Thermally conductive filler 2 : Boron nitride agglomerated particles having a house of cards structure (B 1 /(A 1 + B 1 )=0.662, average particle size (D50): 35 μm, maximum particle size Dmax: 90 μm) Thermally conductive filler 3: Has a house of cards Structured boron nitride aggregated particles (B 1 /(A 1 + B 1 )=0.648, average particle size (D50): 35 μm, maximum particle size Dmax: 90 μm) Thermally conductive filler 4: Nitriding with house of cards structure Boron aggregated particles (B 1 /(A 1 +B 1 )=0.516, average particle diameter (D50): 34 μm, maximum particle diameter Dmax: 90 μm) Thermally conductive filler 5: Boron nitride aggregated particles having a house of cards structure ( B 1 /(A 1 +B 1 )=0.556, average particle diameter (D50): 40 μm, maximum particle diameter Dmax: 90 μm) Thermally conductive filler 6: Has cabbage structure (among primary particles near the outermost surface of aggregated particles Boron nitride aggregated particles (“PTX25” (manufactured by Momentive, B 1 /(A 1 +B 1 )=0.441, average particle diameter (D50) 25 μm, specific surface area 7 m 2 /g)

導熱性填料1及2係藉由以下記載之方法製作。 再者,關於導熱性填料1及2,將以下說明之(原料)、(漿料之製備)、(造粒)至(熱分解)作為同一批次實施,僅將(氮化硼凝集粒子之製作)之項之2000℃下之爐內處理作為另一批次逐次實施。 Thermally conductive fillers 1 and 2 were produced by the method described below. Furthermore, regarding the thermally conductive fillers 1 and 2, the (raw material), (preparation of slurry), (granulation) to (thermal decomposition) described below were carried out as the same batch, and only (the boron nitride aggregated particle The furnace treatment at 2000°C in the item of production) is carried out successively as another batch.

(原料) 使用藉由粉末X射線繞射測定(Cu-Kα)所獲得之(002)面峰之半值寬為2θ=0.67°,氧濃度為6.0質量%之六方晶系氮化硼(以下,記載為「原料h-BN粉末」):10000 g、黏合劑(多木化學(股)製造之「Takiceram M160L」,固形物成分濃度21質量%):11496 g、及界面活性劑(花王(股)製造之界面活性劑「硫酸月桂酯銨」:固形物成分濃度14質量%):250 g作為原料。 (raw material) Hexagonal boron nitride (hereinafter referred to as " Raw material "h-BN powder"): 10000 g, binder ("Takiceram M160L" manufactured by Taki Chemical Co., Ltd., solid content concentration: 21% by mass): 11496 g, and surfactant (manufactured by Kao Co., Ltd. Surfactant "ammonium lauryl sulfate": solid content concentration: 14% by mass): 250 g as a raw material.

(漿料之製備) 計量上述量之原料h-BN粉末置於樹脂製之瓶內,繼而添加上述量之黏合劑。進而添加上述量之界面活性劑後,添加氧化鋯性陶瓷球,於罐磨機旋轉台上攪拌1小時而獲得BN漿料。該漿料之黏度為810 mPa・s。 (Preparation of slurry) Measure the above-mentioned amount of raw material h-BN powder into a resin bottle, and then add the above-mentioned amount of binder. Furthermore, after adding the above-mentioned amount of surfactant, zirconia ceramic balls were added, and stirred for 1 hour on the rotary table of a pot mill to obtain a BN slurry. The viscosity of the slurry is 810 mPa·s.

(造粒) 使用噴霧乾燥器(大河原化工機股份有限公司製造之FOC-20),於盤轉速20000~23000 rpm、乾燥溫度80℃之條件下將上述BN漿料進行噴霧乾燥,而獲得球狀之BN造粒粒子。 (granulation) Using a spray dryer (FOC-20 manufactured by Daheyuan Chemical Machinery Co., Ltd.), the above-mentioned BN slurry was spray-dried under the conditions of a disc rotation speed of 20000-23000 rpm and a drying temperature of 80 ° C to obtain spherical BN granules particle.

(熱分解) 於大氣氛圍下,將上述BN造粒粒子於700℃下加熱處理5小時而獲得前驅物粒子。 (Thermal decomposition) Under the air atmosphere, the above-mentioned BN granulated particles were heat-treated at 700° C. for 5 hours to obtain precursor particles.

(氮化硼凝集粒子之製作) 將上述前驅物粒子以圓盤狀填充至圓形之石墨製之附有蓋之坩堝中,於室溫下藉由常壓之氮氣流通而置換爐內,一面使氮氣流通一面以83℃/小時升溫至2000℃,達到2000℃後,於該狀態下一面使氮氣流通一面保持5小時,其後,冷卻至室溫。自坩堝取出被煅燒物,自被煅燒物去除與石墨接觸之部位,使用乳缽及杵手工壓碎,繼而,使用輥磨機進行處理而獲得具有紙牌屋構造之球狀之氮化硼凝集粒子。 使用網眼90 μm之篩對所獲得之氮化硼凝集粒子進行篩分,僅將通過篩之粒子用作導熱性填料。 再者,對於導熱性填料1及2,於進行了上述2000℃下之爐內處理後,亦分別實施手工壓碎及輥磨機處理,但將2000℃爐內處理以後之處理作為另一批次而逐次實施並不會對壓汞法之測定結果造成影響。 (Production of Boron Nitride Aggregated Particles) Fill the above-mentioned precursor particles in a disk shape into a circular graphite crucible with a cover, and replace the furnace with nitrogen gas at room temperature at room temperature, and raise the temperature at 83°C/hour while nitrogen gas is flowing. After reaching 2000° C. and reaching 2000° C., it was maintained in this state for 5 hours while flowing nitrogen gas, and then cooled to room temperature. Take out the calcined product from the crucible, remove the part of the calcined product that is in contact with graphite, crush it manually with a mortar and pestle, and then process it with a roller mill to obtain spherical boron nitride agglomerated particles with a house of cards structure . The boron nitride aggregated particles obtained were sieved using a sieve with a mesh size of 90 μm, and only the particles that passed through the sieve were used as thermally conductive fillers. Furthermore, for thermally conductive fillers 1 and 2, after the above-mentioned furnace treatment at 2000°C, manual crushing and roller mill treatment were also carried out respectively, but the treatment after the furnace treatment at 2000°C was regarded as another batch Repeated implementation will not affect the determination results of mercury porosimetry.

關於導熱性填料3,使用將氧濃度為5質量%之六方晶系氮化硼與氧濃度為7.5質量%之六方晶系氮化硼各5000 g加以混合而成者作為原料,除此以外,以與導與熱性填料1相同之方法製作。 導熱性填料4使用球狀之凝集粒子,該球狀之凝集粒子具有如下構造:藉由使用直徑10 mm之尼龍球之珠磨機對導熱性填料2進行30分鐘之乾式處理,藉此凝集粒子表面之一次粒子彎曲而以覆蓋凝集粒子之方式彎折。如圖5所示,根據該凝集粒子單體之SEM觀察圖像,判斷出凝集粒子本身並無崩解、破損,內部之紙牌屋構造亦得到維持。 又,關於導熱性填料5,除使用氧濃度為7.5質量%之六方晶系氮化硼10000 g作為原料以外,亦使用具有如下構造之球狀之凝集粒子:以與導熱性填料1相同之方法製作後,藉由使用直徑10 mm之尼龍球之珠磨機進行30分鐘之乾式處理,藉此凝集粒子表面之一次粒子彎曲而以覆蓋凝集粒子之方式彎折。根據該凝集粒子單體之SEM觀察圖像,對於填料5,亦判斷出凝集粒子本身並無崩解、破損,內部之紙牌屋構造亦得到維持。 Regarding the thermally conductive filler 3, a mixture of 5000 g each of hexagonal boron nitride having an oxygen concentration of 5% by mass and 5000 g of hexagonal boron nitride having an oxygen concentration of 7.5% by mass was used as a raw material. Manufactured in the same way as thermal conductive filler 1. The thermally conductive filler 4 uses spherical aggregated particles having a structure in which the thermally conductive filler 2 is dry-processed for 30 minutes by a bead mill using nylon balls having a diameter of 10 mm, thereby aggregating the particles The primary particles on the surface are bent so as to cover the aggregated particles. As shown in FIG. 5 , according to the SEM observation image of the aggregated particles alone, it was judged that the aggregated particles themselves were not disintegrated or damaged, and the internal house of cards structure was also maintained. Also, for the thermally conductive filler 5, in addition to using 10,000 g of hexagonal boron nitride with an oxygen concentration of 7.5% by mass as a raw material, spherical aggregated particles having the following structure were also used: by the same method as the thermally conductive filler 1 After production, dry processing was performed for 30 minutes by using a bead mill with nylon balls with a diameter of 10 mm, whereby the primary particles on the surface of the aggregated particles were bent so as to cover the aggregated particles. According to the SEM observation image of the aggregated particles alone, the filler 5 also judged that the aggregated particles themselves were not disintegrated or damaged, and the internal house of cards structure was also maintained.

[實施例1~3及比較例1~3之導熱性樹脂片之製作] 將基質樹脂之粉體與導熱性填料之粉體於常溫加以混合,使用高溫真空加壓裝置(北川精機公司製造),於加壓溫度395℃、加壓面壓10 MPa下對所獲得之粉體混合物加壓10分鐘,而獲得15 cm見方且厚度為150 μm之導熱性樹脂片及15 cm見方且厚度為500 μm之導熱性樹脂片。此時,藉由調整粉體之量來調整片材之厚度。但是,僅於實施例2中,於加壓溫度395℃、加壓面壓20 MPa下進行10分鐘之加壓。 然後,將厚度150 μm之導熱性樹脂片作為下述吸濕回焊試驗之樣本,將厚度500 μm之導熱性樹脂片作為下述導熱率之測定用樣本。 [Preparation of thermally conductive resin sheets of Examples 1-3 and Comparative Examples 1-3] Mix the powder of the matrix resin and the powder of the thermally conductive filler at room temperature, and use a high-temperature vacuum pressurization device (manufactured by Kitagawa Seiki Co., Ltd.) to pressurize the obtained powder at a pressurization temperature of 395°C and a pressurization surface pressure of 10 MPa. The bulk mixture was pressurized for 10 minutes to obtain a 15 cm square and 150 μm thick thermally conductive resin sheet and a 15 cm square and 500 μm thick thermally conductive resin sheet. At this time, the thickness of the sheet is adjusted by adjusting the amount of powder. However, only in Example 2, pressurization was performed for 10 minutes at a pressurization temperature of 395° C. and a pressurization surface pressure of 20 MPa. Then, the thermally conductive resin sheet with a thickness of 150 μm was used as a sample for the following moisture absorption reflow test, and the thermally conductive resin sheet with a thickness of 500 μm was used as a sample for measuring the thermal conductivity described below.

此處,上述所謂10分鐘,意指將真空加壓機之內部預熱至150℃,向其中投入作為壓入構成物之上述粉體混合物,一面使真空泵作動,一面對熔融混練物施加數MPa之較輕壓力,將加壓機內部溫度設定為395℃,經過40分鐘之升溫後,將加壓面壓設定為10 MPa,其後進行10分鐘之加壓。經過10分鐘後,將加壓機內部溫度再次設為150℃,於內部溫度近乎於150℃時解除真空,取出導熱性樹脂片。Here, the above-mentioned 10 minutes means preheating the inside of the vacuum press to 150°C, putting the above-mentioned powder mixture as a press-in composition into it, and applying several times to the molten kneaded product while operating the vacuum pump. For the lighter pressure of MPa, set the internal temperature of the press to 395°C. After heating up for 40 minutes, set the press surface pressure to 10 MPa, and then carry out pressurization for 10 minutes. After 10 minutes, the internal temperature of the press was set to 150° C. again, and the vacuum was released when the internal temperature was close to 150° C., and the thermally conductive resin sheet was taken out.

上述所謂壓入構成物係指批次中之一次加壓所需之構成物,該構成物係於下部鍍覆板上載置厚度6 mm、外邊之縱橫各20 cm,且於內部開設有縱橫各15 cm×15 cm之開口的邊框狀間隔件,於間隔件內散佈用以獲得厚度150 μm之加壓片或厚度500 μm之加壓片所需之質量之粉末狀之混合物,進而於15 cm×15 cm之上述開口部嵌入厚度5.85 mm(採取試樣厚度150 μm之情形)或厚度5.50 mm(採取試樣厚度500 μm之情形),且縱橫各14.6 cm×14.6 cm之蓋板,載置上部鍍覆板。The above-mentioned so-called press-in composition refers to the composition required for one pressurization in the batch. The composition is placed on the lower plated plate with a thickness of 6 mm, and the outer sides are 20 cm in length and width. A frame-shaped spacer with an opening of 15 cm×15 cm, in which a powdered mixture of the quality required to obtain a compressed tablet with a thickness of 150 μm or a compressed tablet with a thickness of 500 μm is spread, and then spread in the spacer at 15 cm The above-mentioned opening of ×15 cm is embedded in a cover plate with a thickness of 5.85 mm (in the case of a sample thickness of 150 μm) or a thickness of 5.50 mm (in the case of a sample thickness of 500 μm), and a cover plate of 14.6 cm in length and width x 14.6 cm, and placed Upper plated plate.

[比較例4之導熱性樹脂片之製作] 以環氧系樹脂組合物與導熱性填料之總量成為100質量%之方式添加導熱性填料,進而以上述環氧系樹脂組合物與導熱性填料之合計之固形物成分濃度成為62.8質量%之方式添加甲基乙基酮與環己酮之混合溶液(混合比(體積比)1:1)37.2質量%進行混合,而獲得塗佈漿料(片材用塗佈液)。於將該等混合時,於手動攪拌後,使用自轉公轉攪拌機「脫泡練太郎AR-250」攪拌2分鐘。 藉由刮刀法將上述獲得之塗佈漿料塗佈於厚度38 μm之聚對苯二甲酸乙二酯膜(以下亦稱為「PET膜」)上,於60℃下進行120分鐘之加熱乾燥後,於加壓溫度42℃、加壓面壓15 MPa下進行10分鐘之加壓,而獲得未硬化之環氧樹脂片狀成形體。該環氧樹脂片狀成形體用作吸濕回焊試驗之樣本。 [Manufacturing of the thermally conductive resin sheet of Comparative Example 4] The thermally conductive filler is added so that the total amount of the epoxy resin composition and the thermally conductive filler becomes 100% by mass, and the total solid content concentration of the epoxy resin composition and the thermally conductive filler becomes 62.8% by mass. Method A mixed solution of methyl ethyl ketone and cyclohexanone (mixing ratio (volume ratio) 1:1) was added and mixed at 37.2% by mass to obtain a coating slurry (coating liquid for sheet). When mixing these, after stirring by hand, stir for 2 minutes using a self-rotating and revolving mixer "Defoaming Rentaro AR-250". The coating slurry obtained above was coated on a polyethylene terephthalate film (hereinafter also referred to as "PET film") with a thickness of 38 μm by the doctor blade method, and heat-dried at 60°C for 120 minutes Thereafter, pressurization was performed at a pressurization temperature of 42° C. and a pressurization surface pressure of 15 MPa for 10 minutes to obtain an uncured epoxy resin sheet-like molded body. This epoxy resin sheet-like molded body was used as a sample for a moisture absorption reflow test.

又,藉由以下方法製作下述之導熱率之測定中使用之厚度500 μm之導熱性樹脂片。將上述未硬化之環氧樹脂片狀成形體切成10 cm×10 cm,將積層4片該成形體而成者作為壓入構成物,使用與於實施例1~3及比較例1~3中獲得厚度500 μm之片材之情形相同之間隔件及蓋板,於加壓溫度175℃、加壓面壓10 MPa下進行1小時之加壓,而獲得厚度500 μm之導熱性樹脂片。再者,積層之未硬化環氧樹脂片狀成形體之多餘厚度吸收於片材尺寸10 cm×10 cm與間隔件尺寸15 cm×15 cm之間之空容積部分。Also, a thermally conductive resin sheet having a thickness of 500 μm used in the measurement of the thermal conductivity described below was produced by the following method. Cut the above-mentioned unhardened epoxy resin sheet-shaped molded body into 10 cm×10 cm, and laminate 4 pieces of the molded body as a press-in structure, which is used in Examples 1-3 and Comparative Examples 1-3 The spacer and the cover plate were pressed at a pressing temperature of 175°C and a pressing surface pressure of 10 MPa for 1 hour in the same manner as in the case of obtaining a sheet with a thickness of 500 μm to obtain a thermally conductive resin sheet with a thickness of 500 μm. Furthermore, the excess thickness of the laminated uncured epoxy resin sheet molded body is absorbed in the void volume between the sheet size 10 cm x 10 cm and the spacer size 15 cm x 15 cm.

<測定條件、評估方法> 藉由以下方法對導熱性填料1~6、實施例1~3及比較例1~4之導熱性樹脂片進行測定及評估。 <Measurement conditions, evaluation methods> The thermally conductive resin sheets of thermally conductive fillers 1-6, Examples 1-3, and Comparative Examples 1-4 were measured and evaluated by the following methods.

[凝集粒子之物性(原料粉)] (Dmax及D50) 氮化硼凝集粒子之最大粒徑Dmax及平均粒徑D50係藉由以下方法進行測定。 對於藉由超音波使氮化硼凝集粒子20 mg分散於含有六偏磷酸鈉之純水介質10 mL中而成之試樣,利用雷射繞射/散射式粒度分佈測定裝置LA-920(堀場製作所公司製造)測定粒度分佈,根據所獲得之粒度分佈,求出氮化硼凝集粒子之最大粒徑Dmax及平均粒徑D50。 [Physical properties of aggregated particles (raw material powder)] (Dmax and D50) The maximum particle diameter Dmax and the average particle diameter D50 of boron nitride aggregated particles were measured by the following methods. For a sample obtained by dispersing 20 mg of boron nitride aggregated particles in 10 mL of pure water medium containing sodium hexametaphosphate by ultrasonic waves, laser diffraction/scattering particle size distribution analyzer LA-920 (Horiba Manufacturing Co., Ltd.) to measure the particle size distribution, and obtain the maximum particle size Dmax and average particle size D50 of boron nitride aggregated particles based on the obtained particle size distribution.

(粒子內孔隙容積A 1、粒子間隙容積B 1及B 1/(A 1+B 1)) 氮化硼凝集粒子之粒子內孔隙容積A 1(mL/g)及粒子間隙容積B 1(mL/g)係分別根據JIS R1655:2003「藉由壓汞法進行之精密陶瓷之成形體氣孔徑分佈試驗方法」進行測定。 具體而言,使用Micromeritics公司製造之AutoPore IV作為水銀測孔儀,將試樣200 mg填充至測定用池內,於減壓下(50 μmHg以下)下進行10分鐘之減壓處理後,求出總孔隙容積,又,測定水銀壓入退出曲線。製作將孔徑作為橫軸,將對數微分孔隙容積作為縱軸之孔徑分佈曲線,假設孔為圓筒,讀取於表示粒子內孔之峰a與表示粒子間孔之峰b之間對數微分孔隙容積相對於孔徑取極小值之直徑(分割直徑)。根據孔徑大於該分割直徑之區域中之水銀壓入退出曲線之積分值求出粒子間隙容積B 1(mL/g)。 又,自總孔隙容積減去上述粒子間隙容積B 1,求出粒子內孔隙容積A 1(mL/g)。根據該測定結果,求出「B 1/(A 1+B 1)」。 再者,於將試樣填充至水銀測孔儀之槽中時,尤其是不進行輕敲等操作,但測定本身係壓入比重較大之水銀,因此會獲得不依存於試樣之初期之充填狀況而僅依存於氮化硼凝集粒子之性狀之測定結果。 亦存在由於上述之水銀壓入而受到破壞之氮化硼凝集粒子,但此種粒子不滿足本發明之條件。 (Intra-particle pore volume A 1 , particle interstitial volume B 1 and B 1 /(A 1 + B 1 )) Intra-particle pore volume A 1 (mL/g) and particle interstitial volume B 1 (mL/g) of boron nitride aggregated particles g) were measured according to JIS R1655: 2003 "Test method for pore size distribution of molded articles of precision ceramics by mercury porosimetry". Specifically, using the AutoPore IV manufactured by Micromeritics as a mercury porosimeter, 200 mg of the sample was filled into the measurement cell, and after 10 minutes of decompression treatment under reduced pressure (50 μmHg or less), the The total pore volume, again, is determined by the mercury intrusion and exit curve. Create a pore size distribution curve with the pore diameter as the horizontal axis and the logarithmic differential pore volume as the vertical axis. Assuming the pore is a cylinder, read the logarithmic differential pore volume relative to the pore diameter between the peak a representing the inner pores of the particles and the peak b representing the pores between particles. Minimum diameter (division diameter). The particle interstitial volume B 1 (mL/g) was calculated from the integral value of the mercury intrusion and exit curve in the region where the pore diameter was larger than the cut diameter. Also, the above-mentioned particle interstitial volume B 1 was subtracted from the total pore volume to obtain the intra-particle pore volume A 1 (mL/g). From the measurement results, "B 1 /(A 1 +B 1 )" was calculated. In addition, when filling the sample into the groove of the mercury porosimeter, in particular, operations such as tapping are not performed, but the measurement itself is to press mercury with a relatively high specific gravity, so it will be independent of the initial stage of the sample. The filling condition depends only on the measurement results of the properties of boron nitride aggregated particles. There are boron nitride agglomerated particles destroyed by the above-mentioned mercury intrusion, but such particles do not satisfy the requirements of the present invention.

(圓形度) 使用粒子圖像解析裝置(Malvern公司製造,Morpholog G3S)測定導熱性填料2~5之圓形度。再者,對於上述任一氮化硼凝集粒子,考慮到存在如下粒子:未形成凝集體而保持一次粒子狀態之氮化硼粒子、或者雖然一度形成凝集粒子,但於後續處理中自凝集粒子脫落而成為氮化硼一次粒子之粒子等,因此於實施利用1 Bar之氣流分散進行之分級後,實施圖像解析來測定圓形度。利用Morpholog進行之圓形度之測定係測定並算出粒子周長、具有與粒子面積相等之面積之圓之周長,將前者作為分母,將後者作為分子而求出。測定10000個,將其平均值作為圓形度。 再者,由於未進行填料1中之測定,因此於表1中記為「-」。 (circularity) The circularity of thermally conductive fillers 2 to 5 was measured using a particle image analyzer (manufactured by Malvern, Morpholog G3S). Furthermore, for any of the above boron nitride aggregated particles, it is conceivable that the following particles exist: boron nitride particles that remain in the state of primary particles without forming aggregates, or aggregated particles that are once formed but fall off from the aggregated particles in subsequent processing. Since particles such as boron nitride primary particles are classified by 1 Bar air flow dispersion, the circularity is measured by performing image analysis. The measurement of the circularity by Morpholog is to measure and calculate the perimeter of the particle and the perimeter of a circle having an area equal to the area of the particle, using the former as the denominator and the latter as the numerator. 10000 pieces were measured, and the average value thereof was regarded as the circularity. In addition, since the measurement in Filler 1 was not carried out, it was described as "-" in Table 1.

[凝集粒子之物性(片材灰分)] (粒子內孔隙容積A 2、粒子間隙容積B 2、A 2/A 1及B 2/B 1) 將導熱性樹脂片加熱至700℃時之殘留灰分中所包含之氮化硼凝集粒子之藉由壓汞法所測得的粒子內孔隙容積A 2(mL/g)及粒子間隙容積B 2(mL/g)分別以如下方式進行測定。 首先,將下述為了進行吸濕回焊試驗而製作之厚度150 μm之導熱性樹脂層與銅板進行積層而形成包含「散熱用金屬板狀材(銅板、厚度2 mm)/導熱性樹脂片(厚度0.15 mm)/導電電路形成用銅板(厚度0.5 mm)」之積層散熱片,藉由蝕刻處理將銅板自該積層散熱片全部去除,僅單離出樹脂片作為試樣。採取該試樣400 mg(樹脂片面積約為3.6 cm×3.6 cm左右),於加熱爐中,在大氣下以700℃加熱5小時,分解去除樹脂部分,而製成加熱灰分。 分別稱量加熱前之片材及加熱後之灰分,確認到,灰分之質量與調配之氮化硼凝集粒子之質量之計算值大致相同。 繼而,使用Micromeritics公司製造之AutoPore IV作為水銀測孔儀,將試樣200 mg填充至測定用池內,與上述A 1、B 1之測定同樣地製作孔徑分佈曲線,求出片材灰分中之氮化硼凝集粒子之粒子間隙容積B 2(ml/g)、粒子內孔隙容積A 2(ml/g)。 根據實施例1~3及比較例1~4中分別使用之填料之粒子內孔隙容積A 1、粒子間隙容積B 1、導熱性樹脂片之灰分中之粒子內孔隙容積A 2、粒子間隙容積B 2,求出殘存率A 2/A 1及B 2/B 1[Physical properties of aggregated particles (sheet ash content)] (particle inner pore volume A 2 , particle interstitial volume B 2 , A 2 /A 1 and B 2 /B 1 ) Residual ash content when a thermally conductive resin sheet is heated to 700°C Intraparticle pore volume A 2 (mL/g) and particle interstitial volume B 2 (mL/g) measured by mercury porosimetry of the boron nitride agglomerated particles included in , were measured in the following manner. First, the following thermally conductive resin layer with a thickness of 150 μm prepared for the moisture absorption reflow test was laminated with a copper plate to form a composition consisting of "metal plate for heat dissipation (copper plate, thickness 2 mm) / thermally conductive resin sheet ( Thickness: 0.15 mm)/copper plate for conductive circuit formation (thickness: 0.5 mm)”, the copper plate was completely removed from the laminated heat sink by etching, and only the resin sheet was isolated as a sample. Take 400 mg of the sample (the area of the resin sheet is about 3.6 cm×3.6 cm), and heat it in a heating furnace at 700°C for 5 hours under the atmosphere to decompose and remove the resin part, and make heating ash. Weighed the ash content of the sheet before heating and after heating, respectively, and confirmed that the mass of the ash content was approximately the same as the calculated value of the mass of the prepared boron nitride aggregated particles. Then, using the AutoPore IV manufactured by Micromeritics as a mercury porosimeter, 200 mg of the sample was filled into the measurement cell, and the pore size distribution curve was prepared in the same way as the measurement of A1 and B1 above, and the ash content of the sheet was calculated. Particle interstitial volume B 2 (ml/g) and interparticle pore volume A 2 (ml/g) of boron nitride aggregated particles. Intra-particle pore volume A 1 , inter-particle interstitial volume B 1 , intra-particle pore volume A 2 and inter-particle interstitial volume B in the ashes of the thermally conductive resin sheet of the fillers used in Examples 1-3 and Comparative Examples 1-4 respectively 2. Obtain the survival rate A 2 /A 1 and B 2 /B 1 .

(峰頂高度及峰頂直徑) 根據上述所獲得之片材灰分中之孔徑分佈曲線,求出第1峰頂高度、第1峰頂直徑、第2峰頂高度及第2峰頂直徑。 (peak height and peak diameter) From the pore size distribution curve in the ash content of the sheet obtained above, the first peak top height, first peak top diameter, second peak top height, and second peak top diameter were obtained.

(圓形度) 關於實施例2~3及比較例1~3,使用粒子圖像解析裝置(Malvern公司製造,Morpholog G3S)測定導熱性樹脂片之灰分之圓形度。再者,對於任一片材灰分,考慮到存在如下粒子:未形成凝集體而保持一次粒子狀態之氮化硼粒子、或者雖然一度形成凝集粒子,但於後續處理或用於片材成形之加壓步驟中自凝集粒子脫落而成為氮化硼一次粒子之粒子等,因此於實施利用1 Bar之氣流分散進行之分級後,實施圖像解析來測定圓形度。利用Morpholog進行之圓形度之測定係測定並算出粒子周長、具有與粒子面積相等之面積之圓之周長,將前者作為分母,將後者作為分子而求出。測定10000個,將其平均值作為圓形度。 再者,由於未進行實施例1之導熱性樹脂片中之測定,因此於表1中記為「-」。由於比較例3之導熱性樹脂片之凝集粒子崩解,故而無法測定圓形度。 (circularity) About Examples 2-3 and Comparative Examples 1-3, the circularity of the ash content of a thermally conductive resin sheet was measured using the particle|grain image analysis apparatus (Malvern company make, Morpholog G3S). Furthermore, for any sheet ash, it is considered that there are the following particles: boron nitride particles that do not form aggregates but remain in the state of primary particles, or although aggregated particles are once formed, but are added to the subsequent processing or sheet forming In the pressing step, particles falling from the aggregated particles to become boron nitride primary particles, etc., were classified by 1 Bar air flow dispersion, and then image analysis was performed to measure the circularity. The measurement of the circularity by Morpholog is to measure and calculate the perimeter of the particle and the perimeter of a circle having an area equal to the area of the particle, using the former as the denominator and the latter as the numerator. 10000 pieces were measured, and the average value thereof was regarded as the circularity. In addition, since the measurement in the thermally conductive resin sheet of Example 1 was not performed, it was described as "-" in Table 1. Since the aggregated particles of the thermally conductive resin sheet of Comparative Example 3 were disintegrated, the circularity could not be measured.

[25℃下之導熱率] 使用自實施例1~3及比較例1~4中所獲得之厚度500 μm之導熱性樹脂片(樣本)切出之大小為10 mm見方之測定用試樣,將雷射光吸收用噴霧(Fine Chemical Japan公司製造之「Black Guard Spray FC-153」)薄薄地塗佈至測定用試樣之兩面,使其乾燥後,藉由使用氙燈閃光法導熱分析儀(NETZSCH公司製造之「LFA447・NanoFlash300」)之雷射閃光法測定,對測定溫度25℃下之樹脂片厚度方向之熱擴散率a(mm 2/秒)進行測定。針對自同一片材切出之5點實施測定,求出其算術平均值。 [Thermal conductivity at 25°C] Using a measurement sample with a size of 10 mm square cut out from the thermally conductive resin sheet (sample) with a thickness of 500 μm obtained in Examples 1 to 3 and Comparative Examples 1 to 4, Spray for laser light absorption ("Black Guard Spray FC-153" manufactured by Fine Chemical Japan Co., Ltd.) was thinly applied to both sides of the measurement sample, and after drying, the thermal conductivity analyzer (NETZSCH "LFA447・NanoFlash300" manufactured by the company is measured by the laser flash method, and the thermal diffusivity a (mm 2 /sec) in the thickness direction of the resin sheet is measured at a measurement temperature of 25°C. The measurement was performed at 5 points cut out from the same sheet, and the arithmetic mean thereof was obtained.

繼而,依據JIS K6268,藉由阿基米德法,使用比重測定機(A&D公司製造)求出樹脂片之密度ρ(g/m 3)。又,依據JIS K7123,使用DSC測定裝置(ThermoPlusEvo DSC8230,RIGAKU公司製造)測定25℃下之比熱容c(J/(g・K))。 根據該等之各測定值,作為「H=a×ρ×c」而求出25℃下之片材厚度方向之導熱率。 Then, according to JIS K6268, the density ρ (g/m 3 ) of the resin sheet was determined by the Archimedes method using a specific gravity measuring machine (manufactured by A&D Corporation). In addition, the specific heat capacity c (J/(g·K)) at 25° C. was measured using a DSC measuring device (ThermoPlusEvo DSC8230, manufactured by RIGAKU Co., Ltd.) in accordance with JIS K7123. Based on these respective measured values, the thermal conductivity in the thickness direction of the sheet at 25° C. was determined as “H=a×ρ×c”.

再者,關於上述熱擴散率a(mm 2/秒),由於不存在有關樹脂系材料之熱擴散率、導熱率之JIS規格,故而參考JIS R1611-2010(藉由閃光法測定精密陶瓷之熱擴散率、比熱容、導熱率之方法),同一規格中,有「試樣之厚度為0.5 mm以上5 mm以下」之規定,因此將僅供於導熱率測定之試樣之厚度調整為0.5 mm而進行測定。 Furthermore, regarding the above-mentioned thermal diffusivity a (mm 2 /sec), since there is no JIS standard on the thermal diffusivity and thermal conductivity of resin-based materials, refer to JIS R1611-2010 (Measurement of thermal conductivity of fine ceramics by the flash method) diffusivity, specific heat capacity, and thermal conductivity method), in the same specification, there is a requirement that "the thickness of the sample should be 0.5 mm to 5 mm", so the thickness of the sample used only for thermal conductivity measurement is adjusted to 0.5 mm. To measure.

[吸濕回焊試驗前之絕緣破壞電壓(BDV)] (散熱用電路基板之製作) 將實施例1~3、及比較例1~4中製作之厚度150 μm之導熱性樹脂片切割成40 mm×80 mm之尺寸,將其作為電路基板用導熱性樹脂片。 另一方面,對於1片上述電路基板用導熱性樹脂片,準備成為散熱用金屬板狀材之尺寸40 mm×80 mm且厚度2000 μm之銅板、及成為導電電路形成用銅板之尺寸40 mm×80 mm且厚度500 μm之銅板各1片。 藉由預先利用#100之砂紙分別對厚度2000 μm之銅板及厚度500 μm之銅板之單面進行研磨而對表面進行粗化處理,以每片厚度不同之銅板各自之粗化處理面與上述電路基板用導熱性樹脂片對向之方式夾住上述電路基板用導熱性樹脂片,於加壓溫度390℃、加壓面壓13 MPa下進行10分鐘之加壓,而獲得包含「散熱用金屬板狀材(銅板)/導熱性樹脂片/導電電路形成用銅板」之積層散熱片。 [Dielectric breakdown voltage (BDV) before moisture absorption reflow test] (Production of circuit boards for heat dissipation) The thermally conductive resin sheet with a thickness of 150 μm produced in Examples 1 to 3 and Comparative Examples 1 to 4 was cut into a size of 40 mm×80 mm, and this was used as a thermally conductive resin sheet for circuit boards. On the other hand, for one thermally conductive resin sheet for a circuit board, a copper plate with a size of 40 mm x 80 mm and a thickness of 2000 μm as a metal plate for heat dissipation and a copper plate with a size of 40 mm x 80 mm for forming a conductive circuit were prepared. 1 copper plate of 80 mm and 500 μm thick. Roughen the surface by grinding one side of a copper plate with a thickness of 2000 μm and a copper plate with a thickness of 500 μm with #100 sandpaper in advance. The above-mentioned thermally conductive resin sheet for circuit boards was clamped in such a way that the thermally conductive resin sheets for substrates faced each other, and pressurized for 10 minutes at a pressurization temperature of 390°C and a pressure surface pressure of 13 MPa to obtain the Form material (copper plate) / thermally conductive resin sheet / copper plate for conductive circuit formation” laminated heat sink.

另一方面,關於作為包含熱硬化性樹脂之導熱性樹脂片之比較例4,用上述經粗化處理之散熱用金屬板狀材(銅板)及導電電路形成用銅板夾住未硬化或僅略微進行了硬化反應之厚度150 μm之環氧樹脂片狀成形體,於加壓溫度175℃、加壓面壓10 MPa下進行30分鐘之真空加壓,完成熱硬化性樹脂之硬化反應,而獲得包含「散熱用金屬板狀材(銅板)/導熱性樹脂片/導電電路形成用銅板」之積層散熱片。On the other hand, regarding Comparative Example 4, which is a thermally conductive resin sheet containing a thermosetting resin, the unhardened or only slightly The hardened epoxy resin sheet molded body with a thickness of 150 μm was vacuum pressed at a press temperature of 175°C and a pressure surface pressure of 10 MPa for 30 minutes to complete the hardening reaction of the thermosetting resin. Laminated heat sink including "metal plate for heat dissipation (copper plate) / thermally conductive resin sheet / copper plate for conductive circuit formation".

進而,對各個積層散熱片之上述導電電路形成用銅板實施蝕刻處理而形成圖案,藉此獲得散熱性電路基板。圖案係使40 mm×80 mm之導熱性樹脂片上殘存兩處

Figure 02_image003
25 mm之圓狀圖案之導電電路用銅板。 Furthermore, the said copper plate for conductive circuit formation of each laminated heat sink was etched and patterned, and the heat dissipation circuit board was obtained. The pattern is to leave two places on the 40mm×80mm thermally conductive resin sheet
Figure 02_image003
25mm copper plate for conductive circuit with circular pattern.

(絕緣破壞電壓(BDV)之測定) 將藉由上述方法使用實施例1~3及比較例1~4中所獲得之導熱性樹脂片製作之散熱性電路基板浸漬於Fluorinert FC-40(3M公司製造)中,使用超高電壓耐壓試驗器7470(計測技術研究所公司製造),於藉由蝕刻對上述散熱性電路基板進行圖案化所得之

Figure 02_image003
25 mm之銅板上載置
Figure 02_image003
25 mm之電極,施加0.5 kV電壓,每隔60秒增加0.5 kV,逐步升壓來實施測定直至達到絕緣破壞。測定係於頻率60 Hz、升壓速度1000 V/sec下實施。 (Measurement of Dielectric Breakdown Voltage (BDV)) The heat-dissipating circuit boards produced by using the thermally conductive resin sheets obtained in Examples 1-3 and Comparative Examples 1-4 by the above-mentioned method were immersed in Fluorinert FC-40 (3M Company Manufacturing), using ultra-high voltage withstand voltage tester 7470 (manufactured by Measurement Technology Research Institute Co., Ltd.), patterning the above-mentioned heat-dissipating circuit board by etching
Figure 02_image003
Mounted on 25 mm copper board
Figure 02_image003
Apply a voltage of 0.5 kV to a 25 mm electrode, increase the voltage by 0.5 kV every 60 seconds, and gradually increase the voltage to carry out the measurement until the insulation breakdown is reached. The measurement was carried out at a frequency of 60 Hz and a boost rate of 1000 V/sec.

於絕緣破壞電壓以每單位厚度(厚度1 mm之情形時之換算值)計為60 kV/ mm以上之情形時,記為「〇(優)」,於為40 kV/ mm以上且未達60 kV/ mm之情形時,記為「△(欠佳)」,於未達40 kV/ mm之情形時,記為「×(劣)」。將該等測定結果示於表1中。 吸濕回焊試驗前之絕緣破壞電壓(BDV)之評估可作為耐電壓性能之評估。 When the dielectric breakdown voltage is 60 kV/mm or more per unit thickness (conversion value when the thickness is 1 mm), it is recorded as "〇 (excellent)", and it is 40 kV/mm or more and less than 60 In the case of kV/mm, it is recorded as "△ (poor)", and in the case of less than 40 kV/mm, it is recorded as "× (poor)". These measurement results are shown in Table 1. The evaluation of the dielectric breakdown voltage (BDV) before the moisture absorption reflow test can be used as the evaluation of the withstand voltage performance.

[吸濕回焊試驗後之絕緣破壞電壓(BDV)] (絕緣破壞電壓(BDV)之測定) 使用恆溫恆濕機SH-221(愛斯佩克公司製造),將使用實施例1~3及比較例1~4中所獲得之導熱性樹脂片並藉由與上述[吸濕回焊試驗前之絕緣破壞電壓(BDV)]相同之方法製作之散熱性電路基板於85℃、85%RH之環境中保管3天後,於30分鐘以內,在氮氣氛圍下自室溫歷時12分鐘升溫至290℃,在290℃下保持10分鐘後,冷卻至室溫(吸濕回焊試驗)。其後,將散熱性電路基板浸漬於Fluorinert FC-40(3M公司製造)中,使用超高電壓耐壓試驗器7470(計測技術研究所公司製造),於藉由蝕刻對上述散熱性電路基板進行圖案化所得之

Figure 02_image003
25 mm之銅板上載置
Figure 02_image003
25 mm之電極,施加0.5 kV電壓,每隔60秒增加0.5 kV,逐步升壓來實施測定直至達到絕緣破壞。測定係於頻率60 Hz、升壓速度1000 V/sec下實施。 [Dielectric breakdown voltage (BDV) after moisture absorption reflow test] (Measurement of dielectric breakdown voltage (BDV)) Using a constant temperature and humidity machine SH-221 (manufactured by ESPEC), the samples 1 to 3 and The heat-conducting resin sheet obtained in Comparative Examples 1-4 and the heat-dissipating circuit board prepared by the same method as the above [dielectric breakdown voltage (BDV) before the moisture absorption reflow test] were placed at 85°C and 85%RH. After being stored in the environment for 3 days, within 30 minutes, the temperature was raised from room temperature to 290°C in a nitrogen atmosphere for 12 minutes, kept at 290°C for 10 minutes, and then cooled to room temperature (moisture absorption reflow test). Thereafter, the heat-dissipating circuit board was dipped in Fluorinert FC-40 (manufactured by 3M Co., Ltd.), and the above-mentioned heat-dissipating circuit board was etched using an ultra-high voltage withstand voltage tester 7470 (manufactured by Measurement Technology Research Institute Co., Ltd.). patterned
Figure 02_image003
Mounted on 25 mm copper board
Figure 02_image003
Apply a voltage of 0.5 kV to a 25 mm electrode, increase the voltage by 0.5 kV every 60 seconds, and gradually increase the voltage to carry out the measurement until the insulation breakdown is reached. The measurement was carried out at a frequency of 60 Hz and a boost rate of 1000 V/sec.

於絕緣破壞電壓以每單位厚度(厚度1 mm之情形時之換算值)計為60 kV/ mm以上之情形時,記為「〇(優)」,於為40 kV/ mm以上且未達60 kV/ mm之情形時,記為「△(欠佳)」,於未達40 kV/ mm之情形時,記為「×(劣)」。將該等測定結果示於表1中。 吸濕回焊試驗後之絕緣破壞電壓(BDV)之評估可作為耐吸濕回焊性之評估。 When the dielectric breakdown voltage is 60 kV/mm or more per unit thickness (conversion value when the thickness is 1 mm), it is recorded as "〇 (excellent)", and it is 40 kV/mm or more and less than 60 In the case of kV/mm, it is recorded as "△ (poor)", and in the case of less than 40 kV/mm, it is recorded as "× (poor)". These measurement results are shown in Table 1. The evaluation of the dielectric breakdown voltage (BDV) after the moisture absorption reflow test can be used as the evaluation of the resistance to moisture absorption reflow.

[吸濕回焊試驗後之試樣狀態之觀察] 與上述同樣地對實施例1~3及比較例1~4中製作之散熱性電路基板進行吸濕回焊試驗後,利用超音波攝影裝置FinSAT(FS300III)(Hitachi Power Solutions製造),觀察上述藉由蝕刻進行圖案化所得之

Figure 02_image003
25 mm之銅電極與導熱性樹脂片之界面。測定時使用頻率50 MHz之探針,設為增益30 dB、間距0.2 mm,將試樣置於水中實施。將未觀察到界面產生剝離或鼓起、孔隙之情況者記為「○(優)」,將觀察到界面產生剝離或鼓起、孔隙之情況者記為「×(劣)」。將該評估結果亦示於表1。 吸濕回焊試驗後界面剝離之評估可作為將導熱性樹脂片與金屬板積層進行回焊步驟時,是否易發生由熱膨脹及熱收縮引起之界面剝離及由導熱性樹脂片之發泡所導致之變形之評估。 [Observation of the state of the sample after the moisture absorption reflow test] In the same manner as above, the heat dissipation circuit boards produced in Examples 1 to 3 and Comparative Examples 1 to 4 were subjected to the moisture absorption reflow test, and the ultrasonic imaging device was used. FinSAT (FS300III) (manufactured by Hitachi Power Solutions), observing the above-mentioned patterning by etching
Figure 02_image003
The interface between the 25 mm copper electrode and the thermally conductive resin sheet. During the measurement, a probe with a frequency of 50 MHz was used, with a gain of 30 dB and a spacing of 0.2 mm, and the sample was placed in water for implementation. The case where no peeling, bulging, or voids were observed at the interface was marked as "○ (excellent)", and the case where peeling, bulging, or voids were observed at the interface was marked as "X (poor)". The evaluation results are also shown in Table 1. The evaluation of interfacial peeling after the moisture absorption reflow test can be used as the reflow step of laminating the thermally conductive resin sheet and the metal plate, whether it is prone to interface peeling caused by thermal expansion and shrinkage and caused by foaming of the thermally conductive resin sheet The evaluation of the deformation.

[表1]    實施例1 實施例2 實施例3 比較例1 比較例2 比較例3 比較例4 樹脂 熱塑性樹脂1(PEEK) [wt%] 28.5 28.5 28.5 28.5 28.5 28.5 - 熱硬化性樹脂1(環氧系) [wt%] - - - - - - 28.5 氮化硼凝集粒子 填料1 [wt%] 71.5 - - - - - 71.5 填料2 [wt%] - 71.5 - - - - - 填料3 [wt%] - - 71.5 - - - - 填料4 [wt%] - - - 71.5 - - - 填料5 [wt%] - - - - 71.5 - - 填料6 [wt%] - - - - - 71.5 - 凝集粒子之物性(原料粉) 體積平均粒徑(D50) [μm] 35 35 35 34 40 25 35 凝集粒子之形態    紙牌屋 紙牌屋 紙牌屋 紙牌屋 紙牌屋 甘藍 紙牌屋 粒子內孔隙容積A 1 [mL/g] 0.446 0.448 0.379 0.410 0.515 1.28 0.446 粒子間隙容積B 1 [mL/g] 0.882 0.877 0.699 0.437 0.645 1.01 0.882 總孔隙容積A 1+B 1 [mL/g] 1.328 1.325 1.078 0.847 1.160 2.290 1.328 粒子間隙容積/總孔隙容積B 1/(A 1+B 1) - 0.664 0.662 0.648 0.516 0.556 0.441 0.664 圓形度 - - 0.966 0.965 0.939 0.961 - - 凝集粒子之物性(片材灰分) 粒子內孔隙容積A 2 [mL/g] 0.348 0.386 0.314 0.383 0.368 0.407 0.425 粒子內孔隙容積殘存率A 2/A 1 - 0.780 0.862 0.828 0.934 0.715 0.318 0.953 粒子間隙容積B 2 [mL/g] 0.568 0.406 0.556 0.427 0.570 0.437 0.850 粒子間隙容積殘存率B 2/B 1 - 0.644 0.463 0.795 0.978 0.884 0.433 0.964 第1峰頂直徑 [μm] 0.31 0.37 0.31 0.45 0.54 0.45 - 第1峰頂高度 [mL/g] 0.55 0.57 0.47 0.45 0.76 0.56 - 第2峰頂直徑 [μm] 20.0 17.6 16.6 7.2 14.4 7.2 - 第2峰頂高度 [mL/g] 1.71 1.61 1.95 0.84 1.74 0.49 - 圓形度 - - 0.954 0.961 0.934 0.945 粒子破壞 - 導熱率(25℃) [W/m・K] 20.7 21.3 18.8 14.4 15.7 9.1 16.8 絕緣破壞電壓 吸濕回焊試驗前    × 吸濕回焊試驗後    × 界面觀察(吸濕回焊試驗後)    × [Table 1] Example 1 Example 2 Example 3 Comparative example 1 Comparative example 2 Comparative example 3 Comparative example 4 resin Thermoplastic resin 1 (PEEK) [wt%] 28.5 28.5 28.5 28.5 28.5 28.5 - Thermosetting resin 1 (epoxy system) [wt%] - - - - - - 28.5 Boron Nitride Agglomerated Particles filler 1 [wt%] 71.5 - - - - - 71.5 filler 2 [wt%] - 71.5 - - - - - filler 3 [wt%] - - 71.5 - - - - filler 4 [wt%] - - - 71.5 - - - filler 5 [wt%] - - - - 71.5 - - Filler 6 [wt%] - - - - - 71.5 - Physical properties of aggregated particles (raw material powder) Volume average particle size (D50) [μm] 35 35 35 34 40 25 35 The form of aggregated particles house of cards house of cards house of cards house of cards house of cards kale house of cards Particle internal pore volume A 1 [mL/g] 0.446 0.448 0.379 0.410 0.515 1.28 0.446 Particle interstitial volume B 1 [mL/g] 0.882 0.877 0.699 0.437 0.645 1.01 0.882 Total pore volume A 1 + B 1 [mL/g] 1.328 1.325 1.078 0.847 1.160 2.290 1.328 Particle interstitial volume/total pore volume B 1 /(A 1 +B 1 ) - 0.664 0.662 0.648 0.516 0.556 0.441 0.664 Circularity - - 0.966 0.965 0.939 0.961 - - Physical properties of aggregated particles (ash content of sheet) Particle internal pore volume A 2 [mL/g] 0.348 0.386 0.314 0.383 0.368 0.407 0.425 Particle internal pore volume residual ratio A 2 /A 1 - 0.780 0.862 0.828 0.934 0.715 0.318 0.953 Particle interstitial volume B 2 [mL/g] 0.568 0.406 0.556 0.427 0.570 0.437 0.850 Particle interstitial volume residual ratio B 2 /B 1 - 0.644 0.463 0.795 0.978 0.884 0.433 0.964 1st peak diameter [μm] 0.31 0.37 0.31 0.45 0.54 0.45 - 1st Peak Height [mL/g] 0.55 0.57 0.47 0.45 0.76 0.56 - 2nd peak diameter [μm] 20.0 17.6 16.6 7.2 14.4 7.2 - 2nd Peak Height [mL/g] 1.71 1.61 1.95 0.84 1.74 0.49 - Circularity - - 0.954 0.961 0.934 0.945 particle destruction - Thermal conductivity (25℃) [W/m・K] 20.7 21.3 18.8 14.4 15.7 9.1 16.8 Dielectric breakdown voltage Before moisture absorption reflow test x After moisture absorption reflow test x Interface observation (after moisture absorption reflow test) x

若將實施例1~3與比較例1~3進行比較,則可知,藉由使用B 1/(A 1+B 1)為0.60以上之氮化硼凝集粒子,可獲得導熱率明顯較高之散熱片。又,可知,藉由使片材灰分中之第2峰頂高度及第2峰頂直徑處於本發明之範圍內,亦可獲得導熱率明顯較高之散熱片。 又,於實施例1~3中,根據片材成形前後之A 2/A 1為0.70以上,B 2/B 1為0.85以下,以及片材灰分中之第1峰、第2峰及圓形度,認為,於該等中使用之氮化硼凝集粒子中,藉由於片材成形後亦維持凝集粒子本身之內部構造,凝集粒子內部之高導熱性得到維持,並且藉由使相鄰接之粒子彼此之接觸部分之表面適度變形,亦會將粒子相互間之熱阻抑制得較低。根據圖9所示之實施例2之導熱性樹脂片之灰分中包含的氮化硼凝集粒子之SEM照片,亦可確認,凝集粒子之內部構造得到維持之同時,相鄰接之粒子彼此之接觸部分之表面適度變形。 又,關於吸濕回焊試驗前後之絕緣破壞電壓之值,若將實施例1~3與比較例4進行比較,則可知,藉由使用具有300℃以上之熔點之熱塑性樹脂作為基質樹脂,耐電壓性能及耐吸濕回焊性變得良好。 進而,於實施例1~3中,可知,藉由使製造方法包括將包含熱塑性樹脂之粉體與氮化硼凝集粒子加以混合之混合步驟、及對上述混合物進行加壓而使其成形為片材之加壓成形步驟,不會損害具備高導熱性之氮化硼凝集粒子原本之特性,且,亦會抑制孔隙殘留於成型時之片材內,因而可兼顧耐電壓性能及導熱率。 於比較例4中,使用環氧系樹脂及實施例1之氮化硼凝集粒子,藉由先前之濕式塗佈法成形為片材。推定出氮化硼凝集粒子之粒子間隙容積於用於濕式塗佈法時過大,認為,由於在塗佈製膜時產生條紋,片材內亦包含大量氣泡,因此耐電壓性能下降。受該片材內之氣泡之影響,與調配有相同量之同一氮化硼凝集粒子之實施例1相比,導熱率亦較差。 Comparing Examples 1 to 3 with Comparative Examples 1 to 3, it can be seen that by using boron nitride aggregated particles with B 1 /(A 1 + B 1 ) of 0.60 or more, heat dissipation with significantly higher thermal conductivity can be obtained. piece. In addition, it can be seen that by making the second peak height and the second peak diameter in the ash of the sheet fall within the range of the present invention, it is also possible to obtain a heat sink having significantly higher thermal conductivity. Also, in Examples 1 to 3, A 2 /A 1 before and after sheet forming is 0.70 or more, B 2 /B 1 is 0.85 or less, and the first peak, second peak, and round shape in the ash content of the sheet It is considered that, in the boron nitride aggregated particles used in these, by maintaining the internal structure of the aggregated particles themselves even after sheet molding, the high thermal conductivity inside the aggregated particles is maintained, and by making the adjacent The moderate deformation of the surface of the contact part of the particles will also suppress the thermal resistance between the particles to be low. From the SEM photograph of boron nitride aggregated particles contained in the ashes of the thermally conductive resin sheet of Example 2 shown in FIG. 9, it can also be confirmed that the internal structure of the aggregated particles is maintained and the contact between adjacent particles is confirmed. Part of the surface is moderately deformed. In addition, regarding the value of the dielectric breakdown voltage before and after the moisture absorption reflow test, if Examples 1 to 3 are compared with Comparative Example 4, it can be seen that by using a thermoplastic resin having a melting point of 300° C. or higher as the matrix resin, the resistance Voltage performance and moisture absorption reflow resistance become good. Furthermore, in Examples 1 to 3, it can be seen that by making the production method include a mixing step of mixing powder containing a thermoplastic resin and boron nitride aggregated particles, and pressurizing the mixture, it can be molded into a sheet The pressure forming step of the material will not damage the original characteristics of the boron nitride agglomerated particles with high thermal conductivity, and it will also suppress the pores remaining in the sheet during forming, so that the withstand voltage performance and thermal conductivity can be balanced. In Comparative Example 4, an epoxy resin and boron nitride aggregated particles of Example 1 were used to form a sheet by the conventional wet coating method. It is presumed that the particle interstitial volume of boron nitride aggregated particles is too large when used in the wet coating method. It is considered that the withstand voltage performance is reduced due to the occurrence of streaks during coating and film formation and the large number of bubbles contained in the sheet. Affected by air bubbles in the sheet, the thermal conductivity was also poorer than that of Example 1 in which the same amount of the same boron nitride aggregated particles was prepared.

再者,本發明亦可採用如下構成。 [1]一種導熱性樹脂組合物,其係包含熱塑性樹脂及氮化硼凝集粒子之樹脂組合物, 於將藉由壓汞法所測得之上述氮化硼凝集粒子之粒子內孔隙容積設為A 1,將粒子間隙容積設為B 1時,B 1/(A 1+B 1)為0.60以上。 [2]如上述[1]所記載之樹脂組合物,其中上述熱塑性樹脂之主成分為具有300℃以上之熔點之晶質熱塑性樹脂。 [3]如上述[2]所記載之樹脂組合物,其中上述具有300℃以上之熔點之晶質熱塑性樹脂為聚醚酮系樹脂。 [4]如上述[3]所記載之樹脂組合物,其中上述聚醚酮系樹脂為聚醚醚酮。 [5]如上述[1]至[4]中任一項所記載之樹脂組合物,其中上述氮化硼凝集粒子具有紙牌屋構造。 [6]如上述[1]至[5]中任一項所記載之樹脂組合物,其中上述氮化硼凝集粒子之體積基準之平均粒徑D50為10 μm以上200 μm以下。 [7]如上述[1]至[6]中任一項所記載之樹脂組合物,其中於上述樹脂組合物100質量%中,包含15質量%以上40質量%以下之上述熱塑性樹脂,且包含60質量%以上85質量%以下之上述氮化硼凝集粒子。 [8]一種導熱性樹脂片,其包含如上述[1]至[7]中任一項所記載之樹脂組合物。 [9]如上述[8]所記載之導熱性樹脂片,其中關於將上述導熱性樹脂片於700℃下加熱5小時之時之殘留灰分中所包含之氮化硼凝集粒子,於將藉由壓汞法所測得之粒子內孔隙容積設為A 2,將粒子間隙容積設為B 2時,A 2/A 1為0.70以上,B 2/B 1為0.85以下。 [10]如上述[8]或[9]所記載之導熱性樹脂片,其中將上述導熱性樹脂片於700℃下加熱5小時後之殘留灰分中所包含之氮化硼凝集粒子之圓形度為0.85以上。 [11]如上述[8]至[10]中任一項所記載之導熱性樹脂片,其厚度為50 μm以上300 μm以下。 [12]如上述[8]至[11]中任一項所記載之導熱性樹脂片,其於25℃下之厚度方向之導熱率為16 W/m・K以上。 [13]一種積層散熱片,其於如上述[8]至[12]中任一項所記載之導熱性樹脂片之一表面具備積層散熱用金屬層而成之構成。 [14]一種散熱性電路基板,其具有如上述[13]所記載之積層散熱片。 [15]如上述[14]所記載之散熱性電路基板,其於上述導熱性樹脂片之另一表面具備形成導電電路而成之構成。 [16]一種功率半導體裝置,其具有如上述[14]或[15]所記載之散熱性電路基板。 [17]一種導熱性樹脂片之製造方法,其包括: 混合步驟,其係獲得包含熱塑性樹脂之粉體與氮化硼凝集粒子之混合物;及 加壓成形步驟,其係對上述混合物進行加熱及加壓而使其成形為片材; 於將藉由壓汞法所測得之上述氮化硼凝集粒子原料之粒子內孔隙容積設為A 1,將粒子間隙容積設為B 1時,B 1/(A 1+B 1)為0.60以上。 [18]一種導熱性樹脂片,其係含有包含熱塑性樹脂及氮化硼凝集粒子之樹脂組合物者, 於藉由壓汞法對將上述導熱性樹脂片於700℃下加熱5小時之時之殘留灰分進行測定所獲得之孔徑分佈曲線中,將於孔徑未達5 μm之範圍具有極大值之峰設為第1峰,將於孔徑為5 μm以上之範圍具有極大值之峰設為第2峰時, 第2峰頂高度為1.0 mL/g以上,第2峰頂直徑為15 μm以上。 [19]如上述[18]所記載之導熱性樹脂片,其中上述熱塑性樹脂之主成分為具有300℃以上之熔點之晶質熱塑性樹脂。 [20]如上述[19]所記載之導熱性樹脂片,其中上述具有300℃以上之熔點之晶質熱塑性樹脂為聚醚酮系樹脂。 [21]如上述[20]所記載之導熱性樹脂片,其中上述聚醚酮系樹脂為聚醚醚酮。 [22]如上述[18]至[21]中任一項所記載之導熱性樹脂片,其中上述氮化硼凝集粒子具有紙牌屋構造。 [23]如上述[18]至[22]中任一項所記載之導熱性樹脂片,其中上述氮化硼凝集粒子之體積基準之平均粒徑D50為10 μm以上200 μm以下。 [24]如上述[18]至[23]中任一項所記載之導熱性樹脂片,其中於上述樹脂組合物100質量%中,包含15質量%以上40質量%以下之上述熱塑性樹脂,且包含60質量%以上85質量%以下之上述氮化硼凝集粒子。 [25]如上述[18]至[24]中任一項所記載之導熱性樹脂片,其中第1峰頂直徑為0.4 μm以下。 [26]如上述[18]至[25]中任一項所記載之導熱性樹脂片,其中第1峰頂高度為0.25 mL/g以上0.7 mL/g以下。 [27]如上述[18]至[26]中任一項所記載之導熱性樹脂片,其中將上述導熱性樹脂片於700℃下加熱5小時後之殘留灰分中所包含之氮化硼凝集粒子之圓形度超過0.945。 [28]如上述[18]至[27]中任一項所記載之導熱性樹脂片,其厚度為50 μm以上300 μm以下。 [29]如上述[18]至[28]中任一項所記載之導熱性樹脂片,其於25℃下之厚度方向之導熱率為18 W/m・K以上,。 [30]一種積層散熱片,其於如上述[18]至[29]中任一項所記載之導熱性樹脂片之一表面具備積層散熱用金屬層而成之構成。 [31]一種散熱性電路基板,其具有如上述[30]所記載之積層散熱片。 [32]如上述[31]所記載之散熱性電路基板,其於上述導熱性樹脂片之另一表面具備形成導電電路而成之構成。 [33]一種功率半導體裝置,其具有如上述[31]或[32]所記載之散熱性電路基板。 [34]一種導熱性樹脂片之製造方法,其包括: 混合步驟,其係獲得包含熱塑性樹脂之粉體與氮化硼凝集粒子之混合物;及 加壓成形步驟,其係對上述混合物進行加熱及加壓而使其成形為片材; 於藉由壓汞法對將上述片材於700℃下加熱5小時之時之殘留灰分進行測定所獲得之孔徑分佈曲線中,將於孔徑未達5 μm之範圍具有極大值之峰設為第1峰,將於孔徑為5 μm以上之範圍具有極大值之峰設為第2峰時, 第2峰頂高度為1.0 mL/g以上,第2峰頂直徑為15 μm以上。 [35]一種導熱性樹脂片,其係含有包含熱塑性樹脂及氮化硼凝集粒子之樹脂組合物者, 於藉由壓汞法對將上述導熱性樹脂片於700℃下加熱5小時之時之殘留灰分進行測定所獲得之孔徑分佈曲線中,將於孔徑未達5 μm之範圍具有極大值之峰設為第1峰,將於孔徑為5 μm以上之範圍具有極大值之峰設為第2峰時, 第1峰頂直徑為0.4 μm以下,第2峰頂直徑為15 μm以上。 [36]如上述[35]所記載之導熱性樹脂片,其中上述熱塑性樹脂之主成分為具有300℃以上之熔點之晶質熱塑性樹脂。 [37]如上述[36]所記載之導熱性樹脂片,其中上述具有300℃以上之熔點之晶質熱塑性樹脂為聚醚酮系樹脂。 [38]如上述[37]所記載之導熱性樹脂片,其中上述聚醚酮系樹脂為聚醚醚酮。 [39]如上述[35]至[38]中任一項所記載之導熱性樹脂片,其中上述氮化硼凝集粒子具有紙牌屋構造。 [40]如上述[35]至[39]中任一項所記載之導熱性樹脂片,其中上述氮化硼凝集粒子之體積基準之平均粒徑D50為10 μm以上200 μm以下。 [41]如上述[35]至[40]中任一項所記載之導熱性樹脂片,其中於上述樹脂組合物100質量%中,包含15質量%以上40質量%以下之上述熱塑性樹脂,且包含60質量%以上85質量%以下之上述氮化硼凝集粒子。 [42]如上述[35]至[41]中任一項所記載之導熱性樹脂片,其中第2峰頂高度為1.0 mL/g以上。 [43]如上述[35]至[42]中任一項所記載之導熱性樹脂片,其中第1峰頂高度為0.25 mL/g以上0.7 mL/g以下。 [44]如上述[35]至[43]中任一項所記載之導熱性樹脂片,其中將上述導熱性樹脂片於700℃下加熱5小時後之殘留灰分中所包含之氮化硼凝集粒子之圓形度超過0.945。 [45]如上述[35]至[44]中任一項所記載之導熱性樹脂片,其厚度為50 μm以上300 μm以下。 [46]如上述[35]至[45]中任一項所記載之導熱性樹脂片,其於25℃下之厚度方向之導熱率為18 W/m・K以上。 [47]一種積層散熱片,其於如上述[35]~[46]中任一項所記載之導熱性樹脂片之一表面具備積層散熱用金屬層而成之構成。 [48]一種散熱性電路基板,其具有如上述[47]所記載之積層散熱片。 [49]如上述[48]所記載之散熱性電路基板,其於上述導熱性樹脂片之另一表面具有形成導電電路而成之構成。 [50]一種功率半導體裝置,其具有如上述[48]或[49]所記載之散熱性電路基板。 [51]一種導熱性樹脂片之製造方法,其包括: 混合步驟,其係獲得包含熱塑性樹脂之粉體與氮化硼凝集粒子之混合物;及 加壓成形步驟,其係對上述混合物進行加熱及加壓而使其成形為片材; 於藉由壓汞法對將上述片材於700℃下加熱5小時之時之殘留灰分進行測定所獲得之孔徑分佈曲線中,將於孔徑未達5 μm之範圍具有極大值之峰設為第1峰,將於孔徑為5 μm以上之範圍具有極大值之峰設為第2峰時, 第1峰頂直徑為0.4 μm以下,第2峰頂直徑為15 μm以上。 Furthermore, the present invention may also adopt the following configurations. [1] A thermally conductive resin composition comprising a thermoplastic resin and aggregated boron nitride particles, wherein the volume of pores in the particles of the aggregated boron nitride particles measured by mercury intrusion porosimetry is set to When A 1 and the particle interstitial volume are defined as B 1 , B 1 /(A 1 +B 1 ) is 0.60 or more. [2] The resin composition according to the above [1], wherein the main component of the thermoplastic resin is a crystalline thermoplastic resin having a melting point of 300°C or higher. [3] The resin composition according to the above [2], wherein the crystalline thermoplastic resin having a melting point of 300° C. or higher is a polyetherketone resin. [4] The resin composition according to the above [3], wherein the polyetherketone-based resin is polyetheretherketone. [5] The resin composition according to any one of the above [1] to [4], wherein the boron nitride aggregated particles have a house of cards structure. [6] The resin composition according to any one of [1] to [5] above, wherein the boron nitride aggregated particles have a volume-based average particle diameter D50 of 10 μm or more and 200 μm or less. [7] The resin composition according to any one of the above-mentioned [1] to [6], wherein the above-mentioned thermoplastic resin is contained in an amount of 15% by mass to 40% by mass in 100% by mass of the above-mentioned resin composition, and contains 60% by mass or more and 85% by mass or less of the above boron nitride aggregated particles. [8] A thermally conductive resin sheet comprising the resin composition as described in any one of [1] to [7] above. [9] The thermally conductive resin sheet as described in [8] above, wherein the boron nitride aggregated particles contained in the residual ash when the thermally conductive resin sheet is heated at 700° C. for 5 hours are obtained by When the particle internal pore volume measured by mercury intrusion porosimetry is set as A 2 , and the particle interstitial volume is set as B 2 , A 2 /A 1 is above 0.70, and B 2 /B 1 is below 0.85. [10] The thermally conductive resin sheet as described in [8] or [9] above, wherein the boron nitride aggregated particles contained in the residual ash after heating the thermally conductive resin sheet at 700°C for 5 hours are circular The degree is 0.85 or more. [11] The thermally conductive resin sheet according to any one of [8] to [10] above, which has a thickness of not less than 50 μm and not more than 300 μm. [12] The thermally conductive resin sheet according to any one of [8] to [11] above, which has a thermal conductivity in the thickness direction at 25°C of 16 W/m·K or more. [13] A laminated heat sink having a structure in which a metal layer for heat dissipation is laminated on one surface of the thermally conductive resin sheet as described in any one of [8] to [12]. [14] A heat dissipating circuit board having the laminated heat sink as described in the above [13]. [15] The heat-dissipating circuit board as described in [14] above, which has a configuration in which a conductive circuit is formed on the other surface of the above-mentioned heat-conductive resin sheet. [16] A power semiconductor device comprising the heat-dissipating circuit board according to the above [14] or [15]. [17] A method for producing a thermally conductive resin sheet, comprising: a mixing step of obtaining a mixture of a thermoplastic resin powder and boron nitride aggregated particles; and a press molding step of heating the mixture and Forming it into a sheet by applying pressure; When the pore volume in the particle of the above-mentioned boron nitride aggregated particle raw material measured by mercury porosimetry is A 1 , and the particle interstitial volume is B 1 , B 1 /(A 1 +B 1 ) is 0.60 or more. [18] A thermally conductive resin sheet comprising a resin composition comprising a thermoplastic resin and boron nitride aggregated particles, when the thermally conductive resin sheet is heated at 700° C. for 5 hours by mercury porosimetry In the pore size distribution curve obtained by measuring the residual ash, the peak with the maximum value in the range of pore diameters less than 5 μm is set as the first peak, and the peak with the maximum value in the range of pore diameters above 5 μm is set as the second peak When peaking, the height of the second peak top is 1.0 mL/g or more, and the diameter of the second peak top is 15 μm or more. [19] The thermally conductive resin sheet according to the above [18], wherein the main component of the thermoplastic resin is a crystalline thermoplastic resin having a melting point of 300°C or higher. [20] The thermally conductive resin sheet as described in [19] above, wherein the crystalline thermoplastic resin having a melting point of 300° C. or higher is a polyetherketone resin. [21] The thermally conductive resin sheet according to the above [20], wherein the polyetherketone-based resin is polyetheretherketone. [22] The thermally conductive resin sheet according to any one of [18] to [21] above, wherein the boron nitride aggregated particles have a house of cards structure. [23] The thermally conductive resin sheet according to any one of [18] to [22] above, wherein the volume-based average particle diameter D50 of the boron nitride aggregated particles is not less than 10 μm and not more than 200 μm. [24] The thermally conductive resin sheet according to any one of [18] to [23], wherein the thermoplastic resin is contained in an amount of 15% by mass to 40% by mass in 100% by mass of the resin composition, and Contains not less than 60% by mass and not more than 85% by mass of the boron nitride aggregated particles described above. [25] The thermally conductive resin sheet according to any one of [18] to [24] above, wherein the first peak top diameter is 0.4 μm or less. [26] The thermally conductive resin sheet according to any one of [18] to [25] above, wherein the first peak top height is not less than 0.25 mL/g and not more than 0.7 mL/g. [27] The thermally conductive resin sheet according to any one of [18] to [26] above, wherein boron nitride contained in the residual ash after heating the thermally conductive resin sheet at 700° C. for 5 hours is aggregated The circularity of the particles exceeds 0.945. [28] The thermally conductive resin sheet according to any one of [18] to [27] above, which has a thickness of not less than 50 μm and not more than 300 μm. [29] The thermally conductive resin sheet according to any one of [18] to [28] above, which has a thermal conductivity in the thickness direction at 25°C of 18 W/m·K or more. [30] A laminated heat sink having a structure in which a metal layer for heat dissipation is laminated on one surface of the thermally conductive resin sheet as described in any one of [18] to [29]. [31] A heat dissipating circuit board having the laminated heat sink as described in the above [30]. [32] The heat-dissipating circuit board as described in [31] above, which has a configuration in which a conductive circuit is formed on the other surface of the heat-conductive resin sheet. [33] A power semiconductor device comprising the heat-dissipating circuit board as described in [31] or [32]. [34] A method for producing a thermally conductive resin sheet, comprising: a mixing step of obtaining a mixture of powder containing a thermoplastic resin and boron nitride aggregated particles; and a press molding step of heating the mixture and Form it into a sheet by applying pressure; in the pore size distribution curve obtained by measuring the residual ash when the above sheet was heated at 700°C for 5 hours by mercury intrusion porosimetry, the pore size will be less than 5 μm When the peak with the maximum value in the range is set as the first peak, and the peak with the maximum value in the range with a pore diameter of 5 μm or more is set as the second peak, the height of the second peak is more than 1.0 mL/g, and the second peak The diameter is more than 15 μm. [35] A thermally conductive resin sheet comprising a resin composition comprising a thermoplastic resin and boron nitride aggregated particles, when the thermally conductive resin sheet is heated at 700° C. for 5 hours by mercury porosimetry In the pore size distribution curve obtained by measuring the residual ash, the peak with the maximum value in the range of pore diameters less than 5 μm is set as the first peak, and the peak with the maximum value in the range of pore diameters above 5 μm is set as the second peak When peaking, the first peak top diameter is 0.4 μm or less, and the second peak top diameter is 15 μm or more. [36] The thermally conductive resin sheet as described in [35] above, wherein the main component of the thermoplastic resin is a crystalline thermoplastic resin having a melting point of 300°C or higher. [37] The thermally conductive resin sheet according to the above [36], wherein the crystalline thermoplastic resin having a melting point of 300° C. or higher is a polyetherketone resin. [38] The thermally conductive resin sheet according to the above [37], wherein the polyetherketone-based resin is polyetheretherketone. [39] The thermally conductive resin sheet according to any one of the above [35] to [38], wherein the boron nitride aggregated particles have a house of cards structure. [40] The thermally conductive resin sheet according to any one of [35] to [39] above, wherein the volume-based average particle diameter D50 of the boron nitride aggregated particles is not less than 10 μm and not more than 200 μm. [41] The thermally conductive resin sheet according to any one of [35] to [40] above, wherein the above-mentioned thermoplastic resin is contained in an amount of 15% by mass to 40% by mass in 100% by mass of the above-mentioned resin composition, and Contains not less than 60% by mass and not more than 85% by mass of the boron nitride aggregated particles described above. [42] The thermally conductive resin sheet according to any one of [35] to [41] above, wherein the second peak height is 1.0 mL/g or more. [43] The thermally conductive resin sheet according to any one of [35] to [42] above, wherein the first peak height is 0.25 mL/g to 0.7 mL/g. [44] The thermally conductive resin sheet according to any one of [35] to [43] above, wherein boron nitride contained in the residual ash after heating the thermally conductive resin sheet at 700° C. for 5 hours is aggregated The circularity of the particles exceeds 0.945. [45] The thermally conductive resin sheet according to any one of [35] to [44] above, which has a thickness of not less than 50 μm and not more than 300 μm. [46] The thermally conductive resin sheet according to any one of [35] to [45] above, which has a thermal conductivity in the thickness direction at 25°C of 18 W/m·K or more. [47] A laminated heat sink having a structure in which a metal layer for heat dissipation is laminated on one surface of the thermally conductive resin sheet described in any one of [35] to [46] above. [48] A heat dissipating circuit board having the laminated heat sink as described in the above [47]. [49] The heat-dissipating circuit board as described in [48] above, which has a configuration in which a conductive circuit is formed on the other surface of the heat-conductive resin sheet. [50] A power semiconductor device comprising the heat-dissipating circuit board as described in [48] or [49] above. [51] A method for producing a thermally conductive resin sheet, comprising: a mixing step of obtaining a mixture of powder containing a thermoplastic resin and boron nitride aggregated particles; and a press molding step of heating the mixture and Form it into a sheet by applying pressure; in the pore size distribution curve obtained by measuring the residual ash when the above sheet was heated at 700°C for 5 hours by mercury intrusion porosimetry, the pore size will be less than 5 μm When the peak with the maximum value in the range is set as the first peak, and the peak with the maximum value in the range with a pore diameter of 5 μm or more is set as the second peak, the diameter of the first peak top is 0.4 μm or less, and the diameter of the second peak top is 15 μm or more.

圖1係表示藉由壓汞法測定氮化硼凝集粒子之粒子內孔隙容積、粒子間隙容積、峰頂直徑及峰頂高度之原理之圖。 圖2係粒子內孔隙容積之概念圖。 圖3係粒子間隙容積之概念圖。 圖4係粒子間隙容積較小之氮化硼凝集粒子之一例之粒子剖視圖之概念圖。 圖5係粒子間隙容積較小之氮化硼凝集粒子之一例之粒子表面之SEM(Scanning Electron Microscope,掃描式電子顯微鏡)照片(圖式代用照片)。 圖6係粒子間隙容積較大之氮化硼凝集粒子之一例之粒子剖視圖之概念圖。 圖7係粒子間隙容積較大之氮化硼凝集粒子之一例之粒子表面之SEM照片(圖式代用照片)。 圖8係紙牌屋構造之模式圖。 圖9係表示將實施例2之導熱性樹脂片於700℃下加熱5小時之時之殘留灰分中所包含之氮化硼凝集粒子之SEM照片之一例。 Fig. 1 is a diagram showing the principle of measuring the intra-particle pore volume, particle interstitial volume, peak diameter and peak height of boron nitride aggregated particles by mercury intrusion porosimetry. Fig. 2 is a conceptual diagram of the pore volume in particles. Fig. 3 is a conceptual diagram of particle interstitial volume. Fig. 4 is a conceptual diagram of a particle cross-sectional view of an example of boron nitride agglomerated particles having a small particle interstitial volume. Fig. 5 is an SEM (Scanning Electron Microscope, scanning electron microscope) photo of the particle surface of an example of boron nitride aggregated particles with a small particle interstitial volume (picture instead of a drawing). Fig. 6 is a conceptual diagram of a particle cross-sectional view of an example of boron nitride agglomerated particles having a large particle interstitial volume. Fig. 7 is an SEM photo of the particle surface of an example of boron nitride agglomerated particles with a large particle interstitial volume (picture instead of a diagram). Figure 8 is a model diagram of the structure of the house of cards. FIG. 9 shows an example of a SEM photograph of boron nitride aggregated particles contained in residual ash when the thermally conductive resin sheet of Example 2 was heated at 700° C. for 5 hours.

Claims (29)

一種導熱性樹脂組合物,其係包含熱塑性樹脂及氮化硼凝集粒子之樹脂組合物, 於將藉由壓汞法所測得之上述氮化硼凝集粒子之粒子內孔隙容積設為A 1,將粒子間隙容積設為B 1時,B 1/(A 1+B 1)為0.60以上。 A thermally conductive resin composition, which is a resin composition comprising a thermoplastic resin and boron nitride aggregated particles, where the volume of pores in the particles of the above-mentioned boron nitride aggregated particles measured by mercury intrusion porosimetry is A 1 , When the particle interstitial volume is defined as B 1 , B 1 /(A 1 +B 1 ) is 0.60 or more. 如請求項1之樹脂組合物,其中上述熱塑性樹脂之主成分為具有300℃以上之熔點之晶質熱塑性樹脂。The resin composition according to claim 1, wherein the main component of the thermoplastic resin is a crystalline thermoplastic resin having a melting point of 300°C or higher. 如請求項2之樹脂組合物,其中上述具有300℃以上之熔點之晶質熱塑性樹脂為聚醚酮系樹脂。The resin composition according to claim 2, wherein the above-mentioned crystalline thermoplastic resin having a melting point above 300° C. is a polyetherketone resin. 如請求項3之樹脂組合物,其中上述聚醚酮系樹脂為聚醚醚酮。The resin composition according to claim 3, wherein the polyetherketone-based resin is polyetheretherketone. 如請求項1至4中任一項之樹脂組合物,其中上述氮化硼凝集粒子具有紙牌屋(card house)構造。The resin composition according to any one of claims 1 to 4, wherein the boron nitride aggregated particles have a card house structure. 如請求項1至5中任一項之樹脂組合物,其中上述氮化硼凝集粒子之體積基準之平均粒徑D50為10 μm以上200 μm以下。The resin composition according to any one of claims 1 to 5, wherein the volume-based average particle diameter D50 of the boron nitride aggregated particles is not less than 10 μm and not more than 200 μm. 如請求項1至6中任一項之樹脂組合物,其中於上述樹脂組合物100質量%中,包含15質量%以上40質量%以下之上述熱塑性樹脂,且包含60質量%以上85質量%以下之上述氮化硼凝集粒子。The resin composition according to any one of claims 1 to 6, wherein in 100% by mass of the above-mentioned resin composition, the above-mentioned thermoplastic resin is contained in an amount of 15% by mass to 40% by mass, and in an amount of 60% by mass to 85% by mass The above boron nitride aggregated particles. 一種導熱性樹脂片,其包含如請求項1至7中任一項之樹脂組合物。A thermally conductive resin sheet comprising the resin composition according to any one of claims 1 to 7. 如請求項8之導熱性樹脂片,其中關於將上述導熱性樹脂片於700℃下加熱5小時之時之殘留灰分中所包含之氮化硼凝集粒子,於將藉由壓汞法所測得之粒子內孔隙容積設為A 2,將粒子間隙容積設為B 2時,A 2/A 1為0.70以上,B 2/B 1為0.85以下。 The thermally conductive resin sheet according to claim 8, wherein the aggregated particles of boron nitride contained in the residual ash when the thermally conductive resin sheet is heated at 700° C. for 5 hours will be measured by mercury intrusion porosimetry When the pore volume in the particle is A 2 and the particle interstitial volume is B 2 , A 2 /A 1 is 0.70 or more, and B 2 /B 1 is 0.85 or less. 如請求項8或9之導熱性樹脂片,其中將上述導熱性樹脂片於700℃下加熱5小時後之殘留灰分中所包含之氮化硼凝集粒子之圓形度為0.85以上。The thermally conductive resin sheet according to claim 8 or 9, wherein the circularity of boron nitride aggregated particles contained in the residual ash after heating the thermally conductive resin sheet at 700° C. for 5 hours is 0.85 or more. 一種導熱性樹脂片,其係含有包含熱塑性樹脂及氮化硼凝集粒子之樹脂組合物者, 於藉由壓汞法對將上述導熱性樹脂片於700℃下加熱5小時之時之殘留灰分進行測定所獲得之孔徑分佈曲線中,將於孔徑未達5 μm之範圍具有極大值之峰設為第1峰,將於孔徑為5 μm以上之範圍具有極大值之峰設為第2峰時, 第2峰頂高度為1.0 mL/g以上,第2峰頂直徑為15 μm以上。 A thermally conductive resin sheet comprising a resin composition comprising a thermoplastic resin and boron nitride aggregated particles, In the pore size distribution curve obtained by measuring the residual ash content of the above-mentioned thermally conductive resin sheet heated at 700°C for 5 hours by mercury porosimetry, a peak with a maximum value in the range of pore size less than 5 μm was set. is the first peak, and when the peak with the maximum value in the range of pore diameter of 5 μm or more is set as the second peak, The height of the second peak top is 1.0 mL/g or more, and the diameter of the second peak top is 15 μm or more. 如請求項11之導熱性樹脂片,其中上述熱塑性樹脂之主成分為具有300℃以上之熔點之晶質熱塑性樹脂。The thermally conductive resin sheet according to claim 11, wherein the main component of the thermoplastic resin is a crystalline thermoplastic resin having a melting point of 300°C or higher. 如請求項12之導熱性樹脂片,其中上述具有300℃以上之熔點之晶質熱塑性樹脂為聚醚酮系樹脂。The thermally conductive resin sheet according to claim 12, wherein the crystalline thermoplastic resin having a melting point of 300° C. or higher is a polyetherketone resin. 如請求項13之導熱性樹脂片,其中上述聚醚酮系樹脂為聚醚醚酮。The thermally conductive resin sheet according to claim 13, wherein the polyetherketone-based resin is polyetheretherketone. 如請求項11至14中任一項之導熱性樹脂片,其中上述氮化硼凝集粒子具有紙牌屋構造。The thermally conductive resin sheet according to any one of claims 11 to 14, wherein the boron nitride aggregated particles have a house of cards structure. 如請求項11至15中任一項之導熱性樹脂片,其中上述氮化硼凝集粒子之體積基準之平均粒徑D50為10 μm以上200 μm以下。The thermally conductive resin sheet according to any one of claims 11 to 15, wherein the volume-based average particle diameter D50 of the boron nitride aggregated particles is not less than 10 μm and not more than 200 μm. 如請求項11至16中任一項之導熱性樹脂片,其中於上述樹脂組合物100質量%中,包含15質量%以上40質量%以下之上述熱塑性樹脂,且包含60質量%以上85質量%以下之上述氮化硼凝集粒子。The thermally conductive resin sheet according to any one of claims 11 to 16, wherein in 100% by mass of the above-mentioned resin composition, the above-mentioned thermoplastic resin is contained in an amount of 15% by mass to 40% by mass, and 60% by mass to 85% by mass The above-mentioned boron nitride aggregated particles are as follows. 如請求項11至17中任一項之導熱性樹脂片,其中第1峰頂直徑為0.4 μm以下。The thermally conductive resin sheet according to any one of claims 11 to 17, wherein the diameter of the first peak top is 0.4 μm or less. 如請求項11至18中任一項之導熱性樹脂片,其中第1峰頂高度為0.25 mL/g以上0.7 mL/g以下。The thermally conductive resin sheet according to any one of claims 11 to 18, wherein the first peak height is not less than 0.25 mL/g and not more than 0.7 mL/g. 如請求項11至19中任一項之導熱性樹脂片,其中將上述導熱性樹脂片於700℃下加熱5小時後之殘留灰分中所包含之氮化硼凝集粒子之圓形度超過0.945。The thermally conductive resin sheet according to any one of claims 11 to 19, wherein the circularity of boron nitride aggregated particles contained in the residual ash after heating the thermally conductive resin sheet at 700° C. for 5 hours exceeds 0.945. 如請求項8至20中任一項之導熱性樹脂片,其厚度為50 μm以上300 μm以下。The thermally conductive resin sheet according to any one of claims 8 to 20, which has a thickness of not less than 50 μm and not more than 300 μm. 如請求項8至21中任一項之導熱性樹脂片,其於25℃下之厚度方向之導熱率為16 W/m・K以上。The thermally conductive resin sheet according to any one of Claims 8 to 21, wherein the thermal conductivity in the thickness direction at 25°C is 16 W/m·K or more. 如請求項8至21中任一項之導熱性樹脂片,其於25℃下之厚度方向之導熱率為18 W/m・K以上。The thermally conductive resin sheet according to any one of Claims 8 to 21, wherein the thermal conductivity in the thickness direction at 25°C is 18 W/m·K or more. 一種積層散熱片,其於如請求項8至23中任一項之導熱性樹脂片之一表面具備積層散熱用金屬層而成之構成。A laminated heat sink, which has a structure in which a metal layer for heat dissipation is laminated on one surface of the thermally conductive resin sheet according to any one of claims 8 to 23. 一種散熱性電路基板,其具有如請求項24之積層散熱片。A heat-dissipating circuit substrate, which has a laminated heat sink as claimed in claim 24. 如請求項25之散熱性電路基板,其於上述導熱性樹脂片之另一表面具備形成導電電路而成之構成。According to claim 25, the heat-dissipating circuit board has a structure in which a conductive circuit is formed on the other surface of the above-mentioned thermally conductive resin sheet. 一種功率半導體裝置,其具有如請求項25或26之散熱性電路基板。A power semiconductor device having the heat dissipation circuit substrate as claimed in claim 25 or 26. 一種導熱性樹脂片之製造方法,其包括: 混合步驟,其係獲得包含熱塑性樹脂之粉體與氮化硼凝集粒子之混合物;及 加壓成形步驟,其係對上述混合物進行加熱及加壓而使其成形為片材; 於將藉由壓汞法所測得之上述氮化硼凝集粒子原料之粒子內孔隙容積設為A 1,將粒子間隙容積設為B 1時,B 1/(A 1+B 1)為0.60以上。 A method for producing a thermally conductive resin sheet, comprising: a mixing step of obtaining a mixture of a thermoplastic resin powder and boron nitride aggregated particles; and a pressure molding step of heating and pressurizing the mixture to form Forming it into a sheet; When the particle pore volume of the above-mentioned boron nitride aggregated particle raw material measured by mercury porosimetry is set as A 1 , and the particle interstitial volume is set as B 1 , B 1 /(A 1 + B 1 ) is 0.60 or more. 一種導熱性樹脂片之製造方法,其包括: 混合步驟,其係獲得包含熱塑性樹脂之粉體與氮化硼凝集粒子之混合物;及 加壓成形步驟,其係對上述混合物進行加熱及加壓而使其成形為片材; 於藉由壓汞法對將上述片材於700℃下加熱5小時之時之殘留灰分進行測定所獲得之孔徑分佈曲線中,將於孔徑未達5 μm之範圍具有極大值之峰設為第1峰,將於孔徑未達5 μm之範圍具有極大值之峰設為第2峰時, 第2峰頂高度為1.0 mL/g以上,第2峰頂直徑為15 μm以上。 A method of manufacturing a thermally conductive resin sheet, comprising: a mixing step of obtaining a mixture of a powder comprising a thermoplastic resin and boron nitride aggregated particles; and A pressure forming step, which is to heat and press the above-mentioned mixture to form it into a sheet; In the pore size distribution curve obtained by measuring the residual ash when the above-mentioned sheet was heated at 700°C for 5 hours by mercury intrusion porosimetry, the peak with the maximum value in the range of pore size less than 5 μm was set as the second 1 peak, when the peak with the maximum value in the range of pore diameter less than 5 μm is set as the 2nd peak, The height of the second peak top is 1.0 mL/g or more, and the diameter of the second peak top is 15 μm or more.
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