TW202246423A - Conductive paste and multilayer substrate using same - Google Patents

Conductive paste and multilayer substrate using same Download PDF

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TW202246423A
TW202246423A TW111104771A TW111104771A TW202246423A TW 202246423 A TW202246423 A TW 202246423A TW 111104771 A TW111104771 A TW 111104771A TW 111104771 A TW111104771 A TW 111104771A TW 202246423 A TW202246423 A TW 202246423A
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metal
mass
melting point
parts
conductive paste
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中園元
津田剛志
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日商拓自達電線股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/11Printed elements for providing electric connections to or between printed circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits

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  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Conductive Materials (AREA)

Abstract

The present invention provides: a conductive paste which has excellent thermal conductivity, electrical conductivity, fillability of a hole that is formed in a substrate, and long-term reliability; and a multilayer substrate which uses this conductive paste. This conductive paste contains, per 100 parts by mass of a liquid epoxy resin (A): 2,300 to 5,000 parts by mass of a metal filler (B) which contains two or more metal powders including at least one metal powder (B1) that comprises a high-melting-point metal which contains silver and/or copper, while having a melting point of 800 DEG C or more, and at least one metal powder (B2) that comprises a low-melting-point metal which is composed of an alloy of two or more metals selected from the group consisting of tin, lead, bismuth and indium, while having a melting point of 180 DEG C or less; 10 to 40 parts by mass of a curing agent (C) which contains a hydroxyl group-containing aromatic compound; and 60 to 230 parts by mass of a flux (D).

Description

導電性糊及使用其之多層基板Conductive paste and multilayer substrate using same

發明領域 本發明是有關於一種熱傳導性、導電性、對形成於基板上的孔之填充性及長期可靠性優異的導電性糊及使用其之多層基板。 field of invention The present invention relates to a conductive paste excellent in thermal conductivity, electrical conductivity, filling property for holes formed on a substrate, and long-term reliability, and a multilayer substrate using the same.

背景技術 就使用在基板的孔填充等的導電性糊而言,專利文獻1中記載有一種導電性糊,係於熱硬化性樹脂中摻合有導電性填料、助熔劑、硬化劑者,藉由在一定條件下對其加熱,則樹脂會硬化,同時金屬粉會熔化而金屬化。 Background technique As for the conductive paste used for filling the holes of the substrate, etc., Patent Document 1 describes a conductive paste which is mixed with a conductive filler, a flux, and a hardener in a thermosetting resin. When it is heated under certain conditions, the resin will harden, and the metal powder will melt and become metallized.

然而,專利文獻1中記載的導電性糊,由於金屬粉之含量少,因此會有導電性糊之熱傳導性不足的問題。另一方面,若為了改善熱傳導性而增加金屬粉之含量,導電性糊之黏度便會提高,而有對基板的孔之填充性差的問題。However, since the conductive paste described in Patent Document 1 has a small content of metal powder, there is a problem that the thermal conductivity of the conductive paste is insufficient. On the other hand, if the content of the metal powder is increased in order to improve thermal conductivity, the viscosity of the conductive paste will increase, and there is a problem that the filling of the holes of the substrate is poor.

專利文獻2中記載有一種具熱傳導性之導電性糊,然而,其用於多層基板的孔填充時,長期可靠性仍有改善的空間。Patent Document 2 discloses a thermally conductive conductive paste. However, when it is used for hole filling of multilayer substrates, there is still room for improvement in long-term reliability.

先前技術文獻 專利文獻 專利文獻1:日本特開2008-108629號公報 專利文獻2:日本特開2019-165155號公報 prior art literature patent documents Patent Document 1: Japanese Patent Laid-Open No. 2008-108629 Patent Document 2: Japanese Patent Laid-Open No. 2019-165155

發明概要 發明欲解決之課題 本發明是有鑑於上述而成,目的在於提供一種熱傳導性、導電性、對形成於基板上的孔之填充性及長期可靠性優異的導電性糊及使用其之多層基板。 Summary of the invention The problem to be solved by the invention The present invention is made in view of the above, and an object of the present invention is to provide a conductive paste excellent in thermal conductivity, electrical conductivity, filling property for holes formed on a substrate, and long-term reliability, and a multilayer substrate using the same.

用以解決課題之手段 本發明之導電性糊,含有:相對於100質量份之(A)液狀環氧樹脂;2300~5000質量份之(B)金屬填料,其含有2種以上金屬粉,所述2種以上金屬粉包含金屬粉(B1)之至少1種及金屬粉(B2)之至少1種,上述金屬粉(B1)具有熔點800℃以上之高熔點金屬,該高熔點金屬包含銀及/或銅,上述金屬粉(B2)具有熔點180℃以下之低熔點金屬,該低熔點金屬係由選自於由錫、鉛、鉍及銦所構成群組中之2種以上的合金構成;10~40質量份之(C)硬化劑,其含有含羥基之芳香族化合物;及60~230質量份之(D)助熔劑。 means to solve problems The conductive paste of the present invention contains: relative to 100 parts by mass of (A) liquid epoxy resin; The powder includes at least one type of metal powder (B1) and at least one type of metal powder (B2), the above-mentioned metal powder (B1) has a high melting point metal with a melting point of 800°C or higher, the high melting point metal contains silver and/or copper, and the above-mentioned The metal powder (B2) has a low-melting-point metal having a melting point of 180°C or lower, and the low-melting-point metal is composed of two or more alloys selected from the group consisting of tin, lead, bismuth, and indium; 10 to 40 parts by mass (C) curing agent, which contains a hydroxyl-containing aromatic compound; and 60-230 parts by mass of (D) fluxing agent.

上述金屬填料(B)中具有高熔點金屬的金屬粉(B1)與具有低熔點金屬的金屬粉(B2)之含有比例((B1)/(B2))可設為0.3~1.0。The content ratio ((B1)/(B2)) of the metal powder (B1) having a high melting point metal and the metal powder (B2) having a low melting point metal in the metal filler (B) may be 0.3 to 1.0.

上述含羥基之芳香族化合物可設為選自於由苯酚系硬化劑及萘酚系硬化劑所構成群組中之至少1種。The above-mentioned hydroxyl-containing aromatic compound may be at least one selected from the group consisting of phenol-based curing agents and naphthol-based curing agents.

本發明之多層基板係複數層的導電層與絕緣層交替積層而成,該多層基板形成有貫通至少一層上述絕緣層的孔,且於上述孔中填充有上述導電性糊之硬化物,透過該硬化物,位於上述孔兩端的上述導電層彼此相互導通。The multi-layer substrate of the present invention is formed by alternately laminating a plurality of layers of conductive layers and insulating layers. The multi-layer substrate is formed with a hole penetrating at least one of the above-mentioned insulating layers, and the hardened product of the above-mentioned conductive paste is filled in the above-mentioned hole. In the cured product, the above-mentioned conductive layers located at both ends of the above-mentioned hole are connected to each other.

發明效果 依據本發明之導電性糊,可獲得優異之熱傳導性、導電性、對形成於基板上的孔之填充性及長期可靠性。 Invention effect According to the conductive paste of the present invention, excellent thermal conductivity, electrical conductivity, filling properties of holes formed on a substrate, and long-term reliability can be obtained.

用以實施發明之形態 如上述,本發明之導電性糊,含有:相對於100質量份之(A)液狀環氧樹脂;2300~5000質量份之(B)金屬填料,其含有2種以上金屬粉,所述2種以上金屬粉包含金屬粉(B1)之至少1種及金屬粉(B2)之至少1種,上述金屬粉(B1)具有熔點800℃以上之高熔點金屬,該高熔點金屬包含銀及/或銅,上述金屬粉(B2)具有熔點180℃以下之低熔點金屬,該低熔點金屬係由選自於由錫、鉛、鉍及銦所構成群組中之2種以上的合金構成;10~40質量份之(C)硬化劑,其含有含羥基之芳香族化合物;及60~230質量份之(D)助熔劑。 form for carrying out the invention As mentioned above, the conductive paste of the present invention contains: relative to 100 parts by mass of (A) liquid epoxy resin; The above metal powders include at least one type of metal powder (B1) and at least one type of metal powder (B2), the metal powder (B1) has a high melting point metal with a melting point of 800°C or higher, and the high melting point metal contains silver and/or Copper, the above-mentioned metal powder (B2) has a low melting point metal with a melting point of 180°C or lower, and the low melting point metal is composed of two or more alloys selected from the group consisting of tin, lead, bismuth and indium; 10~ 40 parts by mass of (C) hardener containing a hydroxyl-containing aromatic compound; and 60-230 parts by mass of (D) flux.

該導電性糊之用途並非有特殊限制,惟適合使用作為填充孔的組成物,且該孔是形成於複數層的導電層與絕緣層交替積層而成的多層基板上。於多層基板上所形成的孔為貫通至少一層絕緣層的孔即可,亦可為貫通複數層的導電層與絕緣層的孔。當多層基板中使用本發明之導電性糊時,係將本發明之導電性糊填充於孔中,透過導電性糊硬化而得的硬化物,位於孔兩端的導電層會彼此相互導通。The use of the conductive paste is not particularly limited, but it is suitable for use as a composition for filling holes, and the holes are formed on a multi-layer substrate in which multiple layers of conductive layers and insulating layers are alternately laminated. The hole formed on the multilayer substrate may be a hole penetrating through at least one insulating layer, or may be a hole penetrating multiple conductive layers and insulating layers. When the conductive paste of the present invention is used in a multi-layer substrate, the conductive paste of the present invention is filled in the holes, and the conductive layers at both ends of the holes are connected to each other through the cured product obtained by hardening the conductive paste.

液狀環氧樹脂只要是分子內含有環氧基者且於常溫(25℃)下為液體,即無特殊限制,具體例可列舉:雙酚A型環氧樹脂、雙酚F型環氧樹脂、環氧丙基胺系環氧樹脂、環氧丙基醚系環氧樹脂等。Liquid epoxy resins are not particularly limited as long as they contain epoxy groups in the molecule and are liquid at room temperature (25°C). Specific examples include: bisphenol A epoxy resin, bisphenol F epoxy resin , Glycidylamine-based epoxy resin, glycidyl ether-based epoxy resin, etc.

液狀環氧樹脂之環氧當量並無特殊限制,宜為100~500g/eq,較佳為200~400g/eq。當環氧當量在上述範圍內時,可輕易製得對形成於基板上的孔之填充性優異的導電性糊。The epoxy equivalent of the liquid epoxy resin is not particularly limited, preferably 100-500 g/eq, more preferably 200-400 g/eq. When the epoxy equivalent is within the above range, a conductive paste excellent in filling properties of holes formed on a substrate can be easily produced.

金屬填料(B)含有:具有熔點為800℃以上之高熔點金屬的金屬粉(B1);及具有熔點為180℃以下之低熔點金屬的金屬粉(B2);且利用加熱,金屬粉(B2)會熔化而引發金屬化。The metal filler (B) contains: metal powder (B1) having a high melting point metal with a melting point of 800°C or higher; and metal powder (B2) having a low melting point metal with a melting point of 180°C or lower; and by heating, the metal powder (B2) ) will melt and cause metallization.

金屬填料(B)之含量只要相對於液狀環氧樹脂100質量份為2300~5000質量份,即無特殊限制,宜為2500~4500質量份,較佳為3100~4000質量份。當金屬填料(B)之含量在上述範圍內時,可輕易獲得優異之熱傳導性、導電性及長期可靠性。The content of the metal filler (B) is not particularly limited as long as it is 2300-5000 parts by mass relative to 100 parts by mass of the liquid epoxy resin, preferably 2500-4500 parts by mass, more preferably 3100-4000 parts by mass. When the content of the metal filler (B) is within the above range, excellent thermal conductivity, electrical conductivity and long-term reliability can be easily obtained.

金屬粉(B1)之含量並無特殊限制,宜相對於液狀環氧樹脂100質量份為300~3000質量份,較佳為500~2500質量份。當金屬粉(B1)之含量在上述範圍內時,可輕易獲得優異之熱傳導性、導電性及長期可靠性。The content of the metal powder (B1) is not particularly limited, and it is preferably 300-3000 parts by mass, more preferably 500-2500 parts by mass, relative to 100 parts by mass of the liquid epoxy resin. When the content of the metal powder (B1) is within the above range, excellent thermal conductivity, electrical conductivity and long-term reliability can be easily obtained.

金屬粉(B2)之含量並無特殊限制,宜相對於液狀環氧樹脂100質量份為1000~4000質量份,較佳為1000~2500質量份。當金屬粉(B2)之含量在上述範圍內時,可輕易獲得優異之熱傳導性、導電性及長期可靠性。The content of the metal powder (B2) is not particularly limited, but it is preferably 1000-4000 parts by mass, more preferably 1000-2500 parts by mass, relative to 100 parts by mass of the liquid epoxy resin. When the content of the metal powder (B2) is within the above range, excellent thermal conductivity, electrical conductivity and long-term reliability can be easily obtained.

金屬填料(B)中金屬粉(B1)與金屬粉(B2)之含有比例((B1)/(B2))並無特殊限制,宜為0.3~1.0,較佳為0.4~0.8。當金屬粉(B1)與金屬粉(B2)之含有比例在上述範圍內時,可輕易獲得優異之熱傳導性、導電性及長期可靠性。The ratio ((B1)/(B2)) of the metal powder (B1) to the metal powder (B2) in the metal filler (B) is not particularly limited, preferably 0.3-1.0, more preferably 0.4-0.8. When the content ratio of the metal powder (B1) to the metal powder (B2) is within the above range, excellent thermal conductivity, electrical conductivity and long-term reliability can be easily obtained.

金屬粉(B1)或金屬粉(B2)之金屬存在形態並無限制,可舉例如:將某種金屬粉與由其他種類金屬構成的金屬粉混合之形態、以其他種類金屬被覆某種金屬粉之形態、抑或將前述兩者予以混合之形態。Metal powder (B1) or metal powder (B2) is not limited to the form of the metal, for example: a form of mixing a certain metal powder with a metal powder composed of other types of metals, or coating a certain metal powder with another type of metal form, or a form in which the above two are mixed.

高熔點金屬除了由單一金屬構成者外,亦可使用2種以上金屬之合金。高熔點金屬之較佳例可列舉:銀(熔點:961℃)、銅(熔點:1083℃)、銀包銅粉中之1種或2種以上。The refractory metal may be composed of a single metal or an alloy of two or more metals. Preferable examples of high melting point metals include one or more of silver (melting point: 961°C), copper (melting point: 1083°C), and silver-coated copper powder.

低熔點金屬可使用2種以上金屬之合金。低熔點金屬之較佳例可舉如:將錫(熔點:231℃)、鉛(熔點:327℃)、鉍(熔點:271℃)及銦(熔點:156℃)中之2種以上作成合金而成為熔點180℃以下者。上述低熔點金屬宜包含錫,其中又以錫(Sn)與鉍(Bi)之合金為佳,其合金比率尤宜為Sn:Bi=80:20~42:58。Alloys of two or more metals can be used as low melting point metals. Preferable examples of low-melting-point metals include alloying two or more of tin (melting point: 231°C), lead (melting point: 327°C), bismuth (melting point: 271°C) and indium (melting point: 156°C) And it becomes one with a melting point of 180°C or lower. The above-mentioned low melting point metal preferably contains tin, and an alloy of tin (Sn) and bismuth (Bi) is preferred, and the alloy ratio is particularly preferably Sn:Bi=80:20˜42:58.

金屬粉之形狀並無特殊限制,可列舉:小片狀(鱗片狀)、樹枝狀、球狀、纖維狀、無定形(多面體)等,從可製得電阻值更低、熱傳導性更加提升之組成物之觀點來看,又以球狀為佳。The shape of the metal powder is not particularly limited, and examples include: small flakes (scales), dendrites, spheres, fibers, amorphous (polyhedron), etc., from which the resistance value is lower and the thermal conductivity is improved. From the point of view of the composition, spherical shape is preferable.

金屬填料(B)之平均粒徑並無特殊限制,宜為0.5~20μm,較佳為1~10μm。當金屬填料(B)之平均粒徑在上述範圍內時,可輕易獲得優異之熱傳導性及長期可靠性。The average particle size of the metal filler (B) is not particularly limited, preferably 0.5-20 μm, more preferably 1-10 μm. When the average particle diameter of the metal filler (B) is within the above range, excellent thermal conductivity and long-term reliability can be easily obtained.

金屬粉(B1)之平均粒徑並無特殊限制,宜為0.5~10μm,較佳為1~5μm。當金屬粉(B1)之平均粒徑在上述範圍內時,金屬粉彼此的接觸會變多,而可輕易獲得優異之熱傳導性。The average particle size of the metal powder (B1) is not particularly limited, preferably 0.5-10 μm, more preferably 1-5 μm. When the average particle diameter of the metal powder (B1) is within the above-mentioned range, the contact between the metal powders increases, and excellent thermal conductivity can be easily obtained.

金屬粉(B2)之平均粒徑並無特殊限制,宜為1~20μm,較佳為5~10μm。當金屬粉(B2)之平均粒徑在上述範圍內時,可輕易獲得優異之填充性及長期可靠性。The average particle size of the metal powder (B2) is not particularly limited, preferably 1-20 μm, more preferably 5-10 μm. When the average particle diameter of the metal powder (B2) is within the above range, excellent filling properties and long-term reliability can be easily obtained.

另,本說明書中,所謂平均粒徑,意指:利用雷射繞射散射法所求得粒度分布中在積算值50%的粒徑(一次粒徑)。In addition, in this specification, the average particle diameter means the particle diameter (primary particle diameter) which is 50% of the integrated value in the particle size distribution obtained by the laser diffraction scattering method.

金屬填料(B)之振實密度並無特殊限制,宜為3.0~7.0g/cm 3。當振實密度在上述範圍內時,可輕易獲得優異之熱傳導性及導電性。 The tap density of the metal filler (B) is not particularly limited, and is preferably 3.0-7.0 g/cm 3 . When the tap density is within the above range, excellent thermal conductivity and electrical conductivity can be easily obtained.

金屬粉(B1)之振實密度並無特殊限制,宜為5.0~7.0g/cm 3。當振實密度在上述範圍內時,可輕易獲得優異之熱傳導性及導電性。 The tap density of the metal powder (B1) is not particularly limited, and is preferably 5.0~7.0 g/cm 3 . When the tap density is within the above range, excellent thermal conductivity and electrical conductivity can be easily obtained.

金屬粉(B2)之振實密度並無特殊限制,宜為3.0~5.0g/cm 3。當振實密度在上述範圍內時,可輕易獲得優異之熱傳導性及導電性。 The tap density of the metal powder (B2) is not particularly limited, and is preferably 3.0-5.0 g/cm 3 . When the tap density is within the above range, excellent thermal conductivity and electrical conductivity can be easily obtained.

硬化劑(C)只要是含有含羥基之芳香族化合物者,即無特殊限制,含羥基之芳香族化合物宜為苯酚系化合物或萘酚系化合物。即,此種硬化劑可舉如苯酚系硬化劑、萘酚系硬化劑,在未違反本發明目的之範圍內,亦可含有未歸類於上述兩者的硬化劑。The hardener (C) is not particularly limited as long as it contains a hydroxyl-containing aromatic compound, and the hydroxyl-containing aromatic compound is preferably a phenol-based compound or a naphthol-based compound. That is, examples of such hardeners include phenol-based hardeners and naphthol-based hardeners, and hardeners that are not classified into the above-mentioned two may be included within the range that does not violate the object of the present invention.

所謂苯酚系硬化劑,係苯酚酚醛清漆及其衍生物中可作為硬化劑使用者,所謂萘酚系硬化劑,係萘酚及其衍生物中可作為硬化劑使用者。The so-called phenol-based hardener is used as a hardener for phenol novolac and its derivatives, and the so-called naphthol-based hardener is used for naphthol and its derivatives.

硬化劑(C)之含量宜相對於液狀環氧樹脂100質量份為10~40質量份,較佳為15~30質量份。當硬化劑(C)之含量為10質量份以上時,可輕易獲得導電性糊其充分的硬化,當硬化劑(C)之含量為40質量份以下時,適用期不易縮短,可輕易獲得優異之導電性及熱傳導性、長期可靠性。The content of the curing agent (C) is preferably 10 to 40 parts by mass, preferably 15 to 30 parts by mass, relative to 100 parts by mass of the liquid epoxy resin. When the content of the hardener (C) is 10 parts by mass or more, sufficient hardening of the conductive paste can be easily obtained. When the content of the hardener (C) is 40 parts by mass or less, the pot life is not easily shortened, and excellent Electrical conductivity and thermal conductivity, long-term reliability.

助熔劑(D)是用以促進金屬粉之金屬化者,可舉下述為例:氯化鋅、乳酸、檸檬酸、油酸、硬脂酸、麩胺酸、苯甲酸、草酸、麩胺酸鹽酸鹽、苯胺鹽酸鹽、溴化鯨蠟吡啶、脲、羥乙基月桂胺、聚乙二醇月桂胺、油基丙二胺、三乙醇胺、丙三醇、肼、松香、8-乙基十八碳二酸等。該等之中,從獲得優異之填充性、長期可靠性之觀點來看,又以8-乙基十八碳二酸為佳。Flux (D) is used to promote the metallization of metal powder, the following examples can be cited: zinc chloride, lactic acid, citric acid, oleic acid, stearic acid, glutamic acid, benzoic acid, oxalic acid, glutamine Hydrochloride, aniline hydrochloride, cetylpyridine bromide, urea, hydroxyethyl laurylamine, macrogol laurylamine, oleyl propylenediamine, triethanolamine, glycerol, hydrazine, rosin, 8- Ethyl octadecanedioic acid, etc. Among them, 8-ethyloctadecanedioic acid is preferable from the viewpoint of obtaining excellent filling properties and long-term reliability.

助熔劑(D)之含量只要相對於液狀環氧樹脂100質量份為60~230質量份,即無特殊限制,宜為80~200質量份,較佳為100~180質量份。當助熔劑(D)之含量為60質量份以上時,可輕易獲得金屬粉之金屬化,並且可輕易獲得優異之長期可靠性及對形成於基板上的孔之填充性,當助熔劑(D)之含量為230質量份以下時,可輕易獲得優異之導電性及熱傳導性。The content of the flux (D) is not particularly limited as long as it is 60-230 parts by mass relative to 100 parts by mass of the liquid epoxy resin, preferably 80-200 parts by mass, more preferably 100-180 parts by mass. When the content of the flux (D) is 60 parts by mass or more, metallization of the metal powder can be easily obtained, and excellent long-term reliability and filling properties of holes formed on the substrate can be easily obtained. When the flux (D) ) in an amount of 230 parts by mass or less, excellent electrical conductivity and thermal conductivity can be easily obtained.

本發明之導電性糊中,在無損發明目的之範圍內,可加入消泡劑、增稠劑、黏著劑、填充劑、阻燃劑、著色劑等公知添加劑。Known additives such as defoamers, thickeners, adhesives, fillers, flame retardants, and colorants can be added to the conductive paste of the present invention within the range that does not impair the purpose of the invention.

為能利用點膠(dispense)工法或大氣壓印刷工法、真空印刷工法等將導電性糊填充於已形成於多層基板上的孔中,本發明之導電性糊宜為低黏度。In order to fill the conductive paste into the holes formed on the multi-layer substrate by dispensing method, atmospheric pressure printing method, vacuum printing method, etc., the conductive paste of the present invention is preferably low viscosity.

在此,所謂點膠工法,意指從注射器形狀之噴嘴前端擠出導電性糊進行塗佈的方法。又,所謂大氣壓印刷工法,意指以下方法:就孔版印刷來說,是利用在印版上鋪有化學纖維網布(screen)之物,於該網布上以光學方式作成版膜而堵塞所需圖文以外的網眼,作成印版,並於大氣壓下透過該版膜的孔塗上印墨,藉此對設置於印版下的被印刷物之印刷面進行印刷;所謂真空印刷工法,意指以下方法:就孔版印刷來說,是利用在印版上鋪有化學纖維網布之物,於該網布上以光學方式作成版膜而堵塞所需圖文以外的網眼,作成印版,並於真空下透過該版膜的孔塗上印墨,藉此對設置於印版下的被印刷物之印刷面進行印刷。Here, the dispensing method refers to a method in which conductive paste is extruded from the tip of a syringe-shaped nozzle and applied. Also, the so-called atmospheric pressure printing method refers to the following method: in the case of stencil printing, a chemical fiber screen is used to cover the printing plate, and a screen is optically formed on the screen to block the It needs to make a printing plate with meshes other than graphics and text, and apply printing ink through the holes of the plate film under atmospheric pressure, so as to print the printing surface of the printed object set under the printing plate; the so-called vacuum printing method means Refers to the following method: in terms of stencil printing, it is to use a chemical fiber mesh cloth on the printing plate, and optically make a plate film on the mesh cloth to block the meshes other than the required graphics to make a printing plate , and apply printing ink through the holes of the plate film under vacuum, thereby printing the printing surface of the object to be printed under the printing plate.

本發明之導電性糊之黏度宜依照用途或用於塗佈的機器適當調整,雖無特殊限制,但以一般標準而言,於導電性糊之溫度為25℃之情形下,宜為1200~2500dPa.s。黏度測定方法可遵行JIS K7117-1,利用單一圓筒形旋轉黏度計(所謂B型或BH型黏度計)使用轉子No.7於10rpm下進行測定。The viscosity of the conductive paste of the present invention should be properly adjusted according to the application or the machine used for coating. Although there is no special limitation, as a general standard, when the temperature of the conductive paste is 25°C, it should be 1200~ 2500dPa. s. The viscosity measurement method can comply with JIS K7117-1, using a single cylindrical rotational viscometer (so-called B-type or BH-type viscometer) to measure at 10 rpm using rotor No. 7.

從防止空隙(void)產生之觀點來看,本發明之導電性糊中不含溶劑為佳。From the viewpoint of preventing voids, it is preferable that the conductive paste of the present invention does not contain a solvent.

實施例 以下,根據實施例詳細說明本發明之內容,惟本發明並非受限如下。又,下述中「份」或「%」,只要未特別事先聲明,即以質量為基準。 Example Hereinafter, the content of the present invention will be described in detail according to the examples, but the present invention is not limited as follows. In addition, "parts" or "%" in the following are based on mass unless otherwise stated in advance.

[實施例1~7、比較例1~8] 以表1及表2中記載的比例(質量份)來混合各成分,調製出導電性糊。所用各成分之詳情如下。 [Examples 1-7, Comparative Examples 1-8] Each component was mixed in the ratio (parts by mass) described in Table 1 and Table 2, and an electroconductive paste was prepared. The details of each ingredient used are as follows.

.液狀環氧樹脂:三菱化學(股)製「jER871」,環氧當量=390g/eq .高熔點金屬粉1:同和電子(DOWA ELECTRONICS)(股)製,銀包銅粉(平均粒徑3μm) .高熔點金屬粉2:同和電子(DOWA ELECTRONICS)(股)製,銀粉(平均粒徑3μm) .高熔點金屬粉3:福田金屬箔粉工業(股)製,銅粉(平均粒徑3μm) .低熔點金屬粉:Sn-Bi合金金屬粉(Sn:Bi=42:58,熔點138℃,平均粒徑6μm) .苯酚系硬化劑:荒川化學工業(股)製,「TAMANOL758」 .助熔劑:岡村製油(股)製,8-乙基十八碳二酸 . Liquid epoxy resin: "jER871" manufactured by Mitsubishi Chemical Co., Ltd., epoxy equivalent=390g/eq . High melting point metal powder 1: Dowa Electronics (DOWA ELECTRONICS) Co., Ltd., silver-coated copper powder (average particle size 3 μm) . High melting point metal powder 2: Dowa Electronics (DOWA ELECTRONICS) Co., Ltd. product, silver powder (average particle diameter 3 μm) . High melting point metal powder 3: Copper powder (average particle diameter 3 μm) manufactured by Fukuda Metal Foil Powder Co., Ltd. . Low melting point metal powder: Sn-Bi alloy metal powder (Sn:Bi=42:58, melting point 138°C, average particle size 6μm) . Phenol-based curing agent: "TAMANOL758" manufactured by Arakawa Chemical Industry Co., Ltd. . Flux: manufactured by Okamura Oil Co., Ltd., 8-ethyloctadecanedioic acid

針對所製得之導電性糊,評價比電阻、熱傳導率、填充性及長期可靠性1~4。表1、2中顯示其評價結果。評價方法如下。For the prepared conductive paste, evaluate the specific resistance, thermal conductivity, fillability and long-term reliability 1~4. Tables 1 and 2 show the evaluation results. The evaluation method is as follows.

<比電阻(×10 -5Ω.cm)> 使用金屬印版,將導電性糊以行式印刷(line printing)(長度60mm、寬度1mm、厚度約100μm)印刷於玻璃環氧基板上,於180℃下加熱60分鐘,藉此使其正式硬化,製作出形成有導電性圖案的評價用基板。接著,使用測試器,測定導電性圖案兩端間的電阻值,並利用下述式(1),從截面積(S,cm 2)與長度(L,cm)計算出比電阻。另,對3片玻璃環氧基板施以各5條的行式印刷,形成合計15條導電性圖案,並求出其等比電阻之平均值。當比電阻在5.0×10 -5Ω.cm以下時,評價為導電性優異。 比電阻=(S/L)×R‥‥(1) <Resistance (×10 -5 Ω.cm)> Using a metal printing plate, the conductive paste was printed on a glass epoxy substrate by line printing (length 60mm, width 1mm, thickness about 100μm), and the It was heated at 180° C. for 60 minutes to fully harden it, and a substrate for evaluation on which a conductive pattern was formed was produced. Next, using a tester, the resistance value between both ends of the conductive pattern was measured, and the specific resistance was calculated from the cross-sectional area (S, cm 2 ) and the length (L, cm) using the following formula (1). Also, 5 lines of line printing were applied to each of the 3 glass epoxy substrates to form a total of 15 conductive patterns, and the average value of the equiresistive resistance was obtained. When the specific resistance is 5.0×10 -5 Ω. When it is less than cm, it is evaluated that the conductivity is excellent. Specific resistance=(S/L)×R‥‥(1)

<熱傳導率> 使用Thermowave Analyzer TA-33(伯特利(BETHEL)製),評價導電性糊之熱傳導率。具體而言,準備特夫綸(TEFLON,註冊商標)片(100mm×100mm×3mm),以聚醯亞胺膠帶遮蔽成於該特夫綸片中央形成寬度50mm、長度50mm之開口部,並且行式印刷各實施例及各比較例之導電性糊。然後,於180℃下加熱60分鐘,藉此使導電性糊硬化,將聚醯亞胺膠帶剝離,形成塗膜(寬度50mm、長度50mm、厚度約100μm)。將所製得之塗膜自特夫綸(註冊商標)片剝下,作為硬化物試樣。使用Thermowave Analyzer,測定熱擴散率α(m 2/S),並利用下述式(2),從硬化物試樣之密度ρ(kg/m 3)與比熱Cp(J/Kg.K)計算出熱傳導率K(W/m.K)。當熱傳導率在30W/mK以上時,評價為熱傳導性優異。 熱傳導率K=熱擴散率α×密度ρ×比熱Cp…(2) <Thermal conductivity> The thermal conductivity of the conductive paste was evaluated using Thermowave Analyzer TA-33 (manufactured by Bethel). Specifically, prepare a Teflon (TEFLON, registered trademark) sheet (100mm×100mm×3mm), cover it with polyimide tape to form an opening with a width of 50mm and a length of 50mm in the center of the Teflon sheet, and perform The conductive pastes of each embodiment and each comparative example were printed in the same way. Then, the conductive paste was cured by heating at 180° C. for 60 minutes, and the polyimide tape was peeled off to form a coating film (50 mm in width, 50 mm in length, and about 100 μm in thickness). The obtained coating film was peeled off from the Teflon (registered trademark) sheet, and it was set as the sample of hardened|cured material. Use Thermowave Analyzer to measure the thermal diffusivity α (m 2 /S), and use the following formula (2) to calculate from the density ρ (kg/m 3 ) and specific heat Cp (J/Kg.K) of the hardened sample The thermal conductivity K (W/m.K). When the thermal conductivity is 30 W/mK or more, it is evaluated that the thermal conductivity is excellent. Thermal conductivity K=thermal diffusivity α×density ρ×specific heat Cp...(2)

<用於評價長期可靠性的試樣> 使用CO 2雷射,於厚度約100μm之預浸體(Panasonic(股)製,「R-1551」)上形成φ100μm之169孔連結圖案,並利用印刷法於孔內填充導電性糊後,使用真空壓製機,於以下壓力條件及溫度條件下進行壓製,藉此製作出試樣。實施例1~7及比較例2、4~8之導電性糊皆可填充至形成於預浸體的孔內而不會從孔內滲出,因此評價為具有優異之填充性,表1、2中顯示為「○」;比較例1、3則於硬化時產生未填充部分及/或裂痕,因此評價為無法獲得充分之填充性,表2中顯示為「×」。 <Samples for evaluation of long-term reliability> Using a CO 2 laser, a 169-hole connection pattern with a diameter of 100 μm was formed on a prepreg with a thickness of about 100 μm (manufactured by Panasonic Co., Ltd., “R-1551”), and printed After filling the conductive paste in the hole, use a vacuum press to press under the following pressure and temperature conditions to make a sample. The conductive pastes of Examples 1 to 7 and Comparative Examples 2 and 4 to 8 can be filled into the holes formed in the prepreg without seeping out of the holes, so they are evaluated as having excellent filling properties, Table 1, 2 In Table 2, "○" is shown in the middle; in Comparative Examples 1 and 3, unfilled parts and/or cracks occurred during curing, so it was evaluated that sufficient filling properties could not be obtained, and Table 2 is shown as "×".

壓力:花費17分鐘從0kg/cm 2升壓至表面壓力10.2kg/cm 2,並且於該狀態下保持10分鐘。接著,花費24分鐘升壓至表面壓力30.6kg/cm 2,並且於該狀態下保持46分鐘後,花費23分鐘減壓至0kg/cm 2Pressure: It took 17 minutes to increase the pressure from 0 kg/cm 2 to a surface pressure of 10.2 kg/cm 2 , and maintain this state for 10 minutes. Next, the pressure was raised to a surface pressure of 30.6 kg/cm 2 over 24 minutes, maintained in this state for 46 minutes, and then depressurized to 0 kg/cm 2 over 23 minutes.

溫度:花費17分鐘從30℃升溫至130℃,並且於該狀態下保持10分鐘。接著,花費24分鐘升溫至180℃,並且於該狀態下保持46分鐘後,花費23分鐘冷卻至30℃。Temperature: It took 17 minutes to raise the temperature from 30° C. to 130° C., and keep it in this state for 10 minutes. Next, after heating up to 180 degreeC over 24 minutes and holding|maintaining in this state for 46 minutes, it cooled to 30 degreeC over 23 minutes.

<長期可靠性1(熱循環(HC)試驗前後的電阻值變化率)> 熱循環試驗是針對上述中所製得之各試樣,進行於-65℃下30分鐘、於125℃下30分鐘的熱循環計1000循環。電阻值之測定是在熱循環試驗前後,測定上述連結圖案兩端間的電阻值,令該電阻值除以各孔數,求出每一孔的電阻值,並且算出平均值。 <Long-term reliability 1 (resistance value change rate before and after thermal cycle (HC) test)> In the thermal cycle test, 1000 cycles of thermal cycler were performed at -65° C. for 30 minutes and at 125° C. for 30 minutes for each sample prepared above. The measurement of the resistance value is to measure the resistance value between the two ends of the connection pattern before and after the heat cycle test, divide the resistance value by the number of each hole, obtain the resistance value of each hole, and calculate the average value.

熱循環試驗前後的電阻值變化率是令試驗前所測得之電阻值為a、令試驗後所測得之電阻值為b,並利用下式求出電阻值變化率。若電阻值變化率在±10%以內,則評價為可靠性優異。 電阻值變化率(%)=(b-a)×100/a The resistance value change rate before and after the thermal cycle test is the resistance value measured before the test as a, and the resistance value measured after the test as b, and the resistance value change rate is calculated by the following formula. When the rate of change in resistance value was within ±10%, it was evaluated that the reliability was excellent. Resistance value change rate (%)=(b-a)×100/a

<長期可靠性2(回流試驗前後的電阻值變化率)> 回流試驗是針對上述中所製得之各試樣,進行5次於260℃下10秒鐘之條件的回流步驟。回流試驗前後的電阻值變化率係以與熱循環試驗相同之方式來測得。 <Long-term reliability 2 (resistance value change rate before and after reflow test)> In the reflow test, each sample prepared above was subjected to a reflow step at 260° C. for 10 seconds five times. The rate of change in resistance value before and after the reflow test was measured in the same manner as the thermal cycle test.

<長期可靠性3(耐熱試驗前後的電阻值變化率)> 耐熱性試驗是將上述中所製得之各試樣於環境溫度100℃下靜置1000小時。耐熱試驗前後的電阻值變化率係以與熱循環試驗相同之方式來測得。 <Long-term reliability 3 (resistance value change rate before and after heat resistance test)> In the heat resistance test, each sample prepared above was left to stand at an ambient temperature of 100° C. for 1000 hours. The rate of change in resistance value before and after the heat resistance test was measured in the same manner as the heat cycle test.

<長期可靠性4(耐濕試驗前後的電阻值變化率)> 耐濕性試驗是將上述中所製得之各試樣分別於環境溫度85℃、濕度85%下靜置1000小時。耐濕試驗前後的電阻值變化率係以與熱循環試驗相同之方式來測得。 <Long-term reliability 4 (change rate of resistance value before and after humidity test)> For the humidity resistance test, each sample prepared above was left to stand for 1000 hours at an ambient temperature of 85°C and a humidity of 85%. The rate of change in resistance value before and after the humidity resistance test was measured in the same manner as in the thermal cycle test.

[表1]

Figure 02_image001
[Table 1]
Figure 02_image001

[表2]

Figure 02_image003
[Table 2]
Figure 02_image003

由表1所示結果可知,實施例1~7皆為導電性、熱傳導性、填充性及長期可靠性優異。From the results shown in Table 1, it can be seen that Examples 1 to 7 are all excellent in electrical conductivity, thermal conductivity, fillability and long-term reliability.

由表2所示結果看來,比較例1為金屬填料(B)含量大於上限值之例子,其長期可靠性1~4差。From the results shown in Table 2, Comparative Example 1 is an example in which the content of the metal filler (B) is greater than the upper limit, and its long-term reliability 1-4 is poor.

比較例2為金屬填料(B)含量小於下限值之例子,其長期可靠性1、2差。Comparative Example 2 is an example in which the content of metal filler (B) is less than the lower limit, and its long-term reliability 1 and 2 are poor.

比較例3為金屬填料(B)含量大於上限值之例子,其導電性、熱傳導性、填充性及長期可靠性1、2差。Comparative Example 3 is an example in which the content of the metal filler (B) is greater than the upper limit, and its electrical conductivity, thermal conductivity, fillability and long-term reliability 1 and 2 are poor.

比較例4為金屬填料(B)含量小於下限值之例子,其導電性、熱傳導性及長期可靠性2差。Comparative Example 4 is an example in which the content of the metal filler (B) is less than the lower limit, and its electrical conductivity, thermal conductivity and long-term reliability 2 are poor.

比較例5為硬化劑(C)含量小於下限值之例子,其熱傳導性及長期可靠性1~4差。另,長期可靠性1無法測定電阻值,若對孔內進行截面觀察,便可確認原因是產生了裂痕。Comparative Example 5 is an example in which the content of the curing agent (C) is less than the lower limit, and its thermal conductivity and long-term reliability 1-4 are poor. In addition, long-term reliability 1 was unable to measure the resistance value, and it was confirmed that the cause was cracks by observing the cross-section in the hole.

比較例6為硬化劑(C)含量大於上限值之例子,其導電性及熱傳導性差。Comparative Example 6 is an example in which the content of the curing agent (C) is greater than the upper limit, and its electrical conductivity and thermal conductivity are poor.

比較例7為助熔劑(D)含量小於下限值之例子,其長期可靠性1~4差。另,長期可靠性1無法測定電阻值,若對孔內進行截面觀察,便可確認原因是產生了裂痕。Comparative Example 7 is an example in which the flux (D) content is less than the lower limit, and its long-term reliability 1-4 is poor. In addition, long-term reliability 1 was unable to measure the resistance value, and it was confirmed that the cause was cracks by observing the cross-section in the hole.

比較例8為助熔劑(D)含量大於上限值之例子,其導電性及熱傳導性差。Comparative Example 8 is an example in which the flux (D) content is greater than the upper limit, and its electrical conductivity and thermal conductivity are poor.

(無)(none)

Claims (4)

一種導電性糊,含有: 相對於100質量份之(A)液狀環氧樹脂; 2300~5000質量份之(B)金屬填料,其含有2種以上金屬粉,所述2種以上金屬粉包含金屬粉(B1)之至少1種及金屬粉(B2)之至少1種,前述金屬粉(B1)具有熔點800℃以上之高熔點金屬,該高熔點金屬包含銀及/或銅,前述金屬粉(B2)具有熔點180℃以下之低熔點金屬,該低熔點金屬係由選自於由錫、鉛、鉍及銦所構成群組中之2種以上的合金構成; 10~40質量份之(C)硬化劑,其含有含羥基之芳香族化合物;及 60~230質量份之(D)助熔劑。 A conductive paste comprising: Relative to 100 parts by mass of (A) liquid epoxy resin; 2300~5000 parts by mass of (B) metal filler, which contains two or more kinds of metal powders, and the two or more kinds of metal powders include at least one kind of metal powder (B1) and at least one kind of metal powder (B2). The powder (B1) has a high melting point metal with a melting point of 800°C or higher, the high melting point metal includes silver and/or copper, the aforementioned metal powder (B2) has a low melting point metal with a melting point of 180°C or lower, and the low melting point metal is selected from Composed of two or more alloys from the group consisting of tin, lead, bismuth and indium; 10-40 parts by mass of (C) a hardener containing a hydroxyl-containing aromatic compound; and 60-230 parts by mass of (D) flux. 如請求項1之導電性糊,其中前述金屬填料(B)中金屬粉(B1)與金屬粉(B2)之含有比例((B1)/(B2))為0.3~1.0。The conductive paste according to claim 1, wherein the content ratio ((B1)/(B2)) of the metal powder (B1) to the metal powder (B2) in the metal filler (B) is 0.3~1.0. 如請求項1或2之導電性糊,其中前述含羥基之芳香族化合物為選自於由苯酚系硬化劑及萘酚系硬化劑所構成群組中之至少1種。The conductive paste according to claim 1 or 2, wherein the hydroxyl-containing aromatic compound is at least one selected from the group consisting of phenol-based hardeners and naphthol-based hardeners. 一種多層基板,係複數層的導電層與絕緣層交替積層而成,該多層基板形成有貫通至少一層前述絕緣層的孔,且於前述孔中填充有如請求項1至3中任一項之導電性糊之硬化物,透過該硬化物,位於前述孔兩端的前述導電層彼此相互導通。A multi-layer substrate, which is formed by alternately laminating a plurality of layers of conductive layers and insulating layers, the multi-layer substrate is formed with holes penetrating at least one of the aforementioned insulating layers, and the aforementioned holes are filled with conductive materials according to any one of claims 1 to 3. The cured product of the adhesive paste, through which the aforementioned conductive layers located at both ends of the aforementioned hole are connected to each other.
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