TW202239719A - Member applied to part in contact with molten glass and manufacturing method of member - Google Patents
Member applied to part in contact with molten glass and manufacturing method of member Download PDFInfo
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- 239000006060 molten glass Substances 0.000 title claims abstract description 58
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 49
- 239000011449 brick Substances 0.000 claims abstract description 187
- 239000011521 glass Substances 0.000 claims abstract description 144
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 78
- 229910052751 metal Inorganic materials 0.000 claims abstract description 54
- 239000002184 metal Substances 0.000 claims abstract description 54
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 39
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 31
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 27
- 230000035515 penetration Effects 0.000 claims abstract description 17
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 10
- 239000002994 raw material Substances 0.000 claims description 17
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 13
- 239000011451 fired brick Substances 0.000 claims description 10
- 238000002844 melting Methods 0.000 claims description 7
- 230000008018 melting Effects 0.000 claims description 7
- 229910001260 Pt alloy Inorganic materials 0.000 claims description 4
- 238000005816 glass manufacturing process Methods 0.000 claims 1
- 238000005507 spraying Methods 0.000 claims 1
- 239000000523 sample Substances 0.000 description 22
- 238000000034 method Methods 0.000 description 21
- 239000000203 mixture Substances 0.000 description 21
- 238000012360 testing method Methods 0.000 description 21
- 239000011148 porous material Substances 0.000 description 20
- 238000011156 evaluation Methods 0.000 description 17
- 230000035939 shock Effects 0.000 description 16
- 239000001257 hydrogen Substances 0.000 description 10
- 229910052739 hydrogen Inorganic materials 0.000 description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 238000012545 processing Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 238000000354 decomposition reaction Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000000470 constituent Substances 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 230000006378 damage Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 238000005352 clarification Methods 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 238000013507 mapping Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 230000005856 abnormality Effects 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 239000012466 permeate Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910000629 Rh alloy Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005429 filling process Methods 0.000 description 1
- 238000010285 flame spraying Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000003353 gold alloy Substances 0.000 description 1
- JUWSSMXCCAMYGX-UHFFFAOYSA-N gold platinum Chemical compound [Pt].[Au] JUWSSMXCCAMYGX-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- PXXKQOPKNFECSZ-UHFFFAOYSA-N platinum rhodium Chemical compound [Rh].[Pt] PXXKQOPKNFECSZ-UHFFFAOYSA-N 0.000 description 1
- HWLDNSXPUQTBOD-UHFFFAOYSA-N platinum-iridium alloy Chemical class [Ir].[Pt] HWLDNSXPUQTBOD-UHFFFAOYSA-N 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/42—Details of construction of furnace walls, e.g. to prevent corrosion; Use of materials for furnace walls
- C03B5/43—Use of materials for furnace walls, e.g. fire-bricks
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/10—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminium oxide
- C04B35/101—Refractories from grain sized mixtures
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
- C04B41/88—Metals
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D1/00—Casings; Linings; Walls; Roofs
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D1/00—Casings; Linings; Walls; Roofs
- F27D1/0003—Linings or walls
- F27D1/0006—Linings or walls formed from bricks or layers with a particular composition or specific characteristics
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Structural Engineering (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Glass Compositions (AREA)
- Compositions Of Oxide Ceramics (AREA)
Abstract
Description
本發明係關於一種於玻璃製造設備中適用於與熔融玻璃接觸之部分之構件、及其製造方法。The present invention relates to a member suitable for a part in contact with molten glass in glass manufacturing equipment, and a manufacturing method thereof.
製造玻璃製品之玻璃製造設備具備熔解爐、澄清爐、及成形裝置等複數個裝置。於此種裝置中,與高溫熔融玻璃接觸之構件通常使用耐火磚。Glass manufacturing equipment for manufacturing glass products includes multiple devices such as melting furnaces, clarification furnaces, and forming devices. In such devices, refractory bricks are usually used for components in contact with high-temperature molten glass.
然而,耐火磚對熔融玻璃之耐久性不可謂充分。因此,於長時間使用耐火磚之情形時,可能會經常發生以下問題,即,耐火磚被侵蝕,或耐火磚之成分溶出至熔融玻璃中而導致玻璃製品之品質降低。However, refractory bricks do not have sufficient durability against molten glass. Therefore, when refractory bricks are used for a long time, there may often be problems that the refractory bricks are corroded, or components of the refractory bricks are dissolved into molten glass, resulting in lower quality of glass products.
為了應對此種問題,而提出了將對熔融玻璃具有良好之耐久性之鉑用於與熔融玻璃接觸之構件(例如專利文獻1、2)。
先前技術文獻
專利文獻
In order to deal with such a problem, it is proposed to use platinum which has favorable durability with respect to molten glass for the member which contacts molten glass (for example,
專利文獻1:日本專利特開2012-121740號公報 專利文獻2:國際公開第WO2012/070508號 Patent Document 1: Japanese Patent Laid-Open No. 2012-121740 Patent Document 2: International Publication No. WO2012/070508
[發明所欲解決之問題][Problem to be solved by the invention]
已知若熔融玻璃與鉑接觸,則會於熔融玻璃內產生氣泡。It is known that bubbles are generated in molten glass when molten glass contacts platinum.
推測其原因在於,當高溫熔融玻璃中所含之水分與鉑接觸時,會分解成氫與氧。即,所生成之氫透過鉑,經由耐火磚之氣孔而釋出至體系外。然而,氧難以透過鉑,而直接停留在熔融玻璃中,結果產生氣泡。The reason for this is presumed to be that when the moisture contained in the high-temperature molten glass comes into contact with platinum, it decomposes into hydrogen and oxygen. That is, the generated hydrogen passes through the platinum and is released out of the system through the pores of the refractory brick. However, it is difficult for oxygen to permeate platinum, and it stays in molten glass as it is, resulting in generation of air bubbles.
若此種氣泡殘留在熔融玻璃中,則存在所製造之玻璃製品之品質降低之問題。If such air bubbles remain in molten glass, there exists a problem that the quality of the glassware manufactured will fall.
再者,為了應對該問題,而考慮使用電熔鑄磚作為耐火磚。其原因在於,一般而言,電熔鑄磚之孔隙率較小為數%以下,因此推測於將經鉑被覆之電熔鑄磚用於與熔融玻璃接觸之部分時,氫不易透過。然而,電熔鑄磚具有不耐熱衝擊之性質,不適合用於反覆進行加熱/冷卻之裝置。In addition, in order to cope with this problem, it is considered to use an electro-fused cast brick as a refractory brick. The reason for this is that, in general, the porosity of electro-fused cast bricks is as small as a few percent or less, and therefore it is presumed that when electro-fused cast bricks coated with platinum are used for parts in contact with molten glass, hydrogen does not easily permeate. However, electrocast bricks are not resistant to thermal shock and are not suitable for repeated heating/cooling devices.
如此,於玻璃製造設備中,若欲將鉑應用於與高溫熔融玻璃接觸之構件,則可能產生較多問題。In this way, in glass manufacturing equipment, if platinum is to be applied to components in contact with high-temperature molten glass, many problems may arise.
本發明係鑒於此種背景而完成者,本發明之目的在於提供一種適用於與熔融玻璃接觸之部分之構件,該構件耐熱衝擊,且能夠顯著地抑制氣泡之產生。又,本發明之目的在於提供一種此種構件之製造方法。 [解決問題之技術手段] The present invention was made in view of such a background, and an object of the present invention is to provide a member suitable for a portion in contact with molten glass, which is resistant to thermal shock and can remarkably suppress generation of air bubbles. Furthermore, the object of the present invention is to provide a method for manufacturing such a member. [Technical means to solve the problem]
本發明提供一種構件,其於玻璃製造設備中適用於與熔融玻璃接觸之部分,且具有: 耐火磚,其具有第1表面及第2表面,且孔隙率處於10%~30%之範圍內; 玻璃成分,其填充於上述耐火磚之上述第1表面側;及 金屬膜,其設置於上述耐火磚之上述第1表面或上述第2表面,且包含鉑; 上述耐火磚之氧化鋁與氧化矽之合計量為50質量%以上, 上述玻璃成分自上述第1表面起之最大滲入深度為2000 μm以上。 The present invention provides a member suitable for use in a portion of a glass manufacturing apparatus that is in contact with molten glass, and having: Refractory bricks having a first surface and a second surface, and having a porosity in the range of 10% to 30%; A glass component filled on the first surface side of the refractory brick; and A metal film provided on the first surface or the second surface of the refractory brick, and containing platinum; The total amount of alumina and silica in the above refractory bricks is 50% by mass or more, The maximum penetration depth of the above-mentioned glass component from the above-mentioned first surface is 2000 μm or more.
又,本發明提供一種製造方法,其係於玻璃製造設備中適用於與熔融玻璃接觸之部分之構件的製造方法,且包括: (1)於具有第1表面及第2表面,氧化鋁與氧化矽之合計量為50質量%以上,且孔隙率處於10%~30%之範圍內之耐火磚之上述第1表面,設置玻璃原料之步驟; (2)使上述玻璃原料熔融而形成熔融玻璃,使上述熔融玻璃自上述耐火磚之上述第1表面浸漬,且上述熔融玻璃以自上述第1表面起之最大滲入深度成為2000 μm以上之方式浸漬之步驟; (3)於上述熔融玻璃固化後,去除殘存於上述第1表面上之上述玻璃原料之步驟;及 (4)於上述耐火磚之上述第1表面或上述第2表面設置包含鉑之金屬膜之步驟。 [發明之效果] Furthermore, the present invention provides a manufacturing method, which is a method of manufacturing a member suitable for a part in contact with molten glass in glass manufacturing equipment, and includes: (1) On the above-mentioned first surface of the refractory brick having the first surface and the second surface, the total amount of alumina and silicon oxide is 50% by mass or more, and the porosity is in the range of 10% to 30%, glass is provided raw material steps; (2) Melting the above-mentioned glass raw material to form molten glass, impregnating the above-mentioned molten glass from the above-mentioned first surface of the above-mentioned refractory brick, and impregnating the above-mentioned molten glass so that the maximum penetration depth from the above-mentioned first surface becomes 2000 μm or more the steps of (3) A step of removing the above-mentioned glass raw material remaining on the above-mentioned first surface after the above-mentioned molten glass is solidified; and (4) A step of providing a metal film containing platinum on the first surface or the second surface of the refractory brick. [Effect of Invention]
本發明可提供一種適用於與熔融玻璃接觸之部分之構件,該構件耐熱衝擊,且能夠顯著地抑制氣泡之產生。又,本發明可提供一種此種構件之製造方法。The present invention can provide a member suitable for a portion in contact with molten glass, which is resistant to thermal shock and can remarkably suppress generation of air bubbles. In addition, the present invention can provide a method for manufacturing such a component.
以下,對本發明之一實施方式進行說明。One embodiment of the present invention will be described below.
本發明之一實施方式提供一種構件,其於玻璃製造設備中適用於與熔融玻璃接觸之部分,且具有: 耐火磚,其具有第1表面及第2表面,且孔隙率處於10%~30%之範圍內; 玻璃成分,其填充於上述耐火磚之上述第1表面側;及 金屬膜,其設置於上述耐火磚之上述第1表面或上述第2表面,且包含鉑; 上述耐火磚之氧化鋁與氧化矽之合計量為50質量%以上, 上述玻璃成分之自上述第1表面起之最大滲入深度為2000 μm以上。 One embodiment of the present invention provides a member suitable for a part in contact with molten glass in glass manufacturing equipment, and has: Refractory bricks having a first surface and a second surface, and having a porosity in the range of 10% to 30%; A glass component filled on the first surface side of the refractory brick; and A metal film provided on the first surface or the second surface of the refractory brick, and containing platinum; The total amount of alumina and silica in the above refractory bricks is 50% by mass or more, The maximum penetration depth of the above-mentioned glass component from the above-mentioned first surface is 2000 μm or more.
於如上所述在耐火磚之上設置鉑而構成構件之情形時,存在以下問題,即,因鉑與熔融玻璃之接觸而導致水之分解及氫之散逸,因此於熔融玻璃中產生氣泡。When constituting a member by placing platinum on refractory bricks as described above, there is a problem that water is decomposed and hydrogen is dissipated due to contact between platinum and molten glass, so that air bubbles are generated in the molten glass.
又,於為了應對該氣泡問題,而使用孔隙率較小之電熔鑄磚作為耐火磚之情形時,存在以下問題,即,當反覆進行裝置之加熱/冷卻時,電熔鑄磚可能因熱衝擊而受損。Also, in order to deal with the air bubble problem, when using an electro-fused cast brick with a small porosity as a refractory brick, there is a problem that, when the heating/cooling of the device is repeated, the electro-fused cast brick may be damaged due to thermal shock. damaged.
相對於此,於本發明之一實施方式中,構件具有孔隙率處於10%~30%之範圍內之耐火磚、及設置於該耐火磚之第1表面或第2表面且包含鉑之金屬膜。On the other hand, in one embodiment of the present invention, the member has a refractory brick having a porosity in the range of 10% to 30%, and a metal film containing platinum provided on the first or second surface of the refractory brick. .
於將此種構件應用於與熔融玻璃接觸之部分之情形時,藉由金屬膜之存在,可顯著地抑制耐火磚因熔融玻璃而受到侵蝕,或者成分溶出之問題。When such a member is applied to a part in contact with molten glass, the existence of the metal film can significantly suppress the corrosion of the refractory brick due to the molten glass or the dissolution of components.
再者,本發明之一實施方式之構件具有金屬膜。因此,當構件與高溫熔融玻璃接觸時,可能會發生如上所述之水之分解反應。Furthermore, a member according to one embodiment of the present invention has a metal film. Therefore, when the member is in contact with high-temperature molten glass, the decomposition reaction of water as described above may occur.
然而,於本發明之一實施方式中,在耐火磚之第1表面側之氣孔中填充有玻璃成分。尤其於本發明之一實施方式中,玻璃成分自耐火磚之第1表面起滲入至最大2000 μm以上之深度。However, in one Embodiment of this invention, the glass component is filled in the air hole of the 1st surface side of a refractory brick. In particular, in one embodiment of the present invention, the glass component penetrates to a maximum depth of 2000 μm or more from the first surface of the refractory brick.
於該情形時,可將玻璃成分用作氫擴散之障壁。即,即便於金屬膜與熔融玻璃之間發生水之分解反應,亦可藉由耐火磚中之玻璃成分而顯著地抑制所生成之氫透過耐火磚被釋出至體系外。認為結果可抑制水之分解反應,從而可顯著地抑制氧氣氣泡之產生。In this case, the glass component can be used as a barrier to hydrogen diffusion. That is, even if the decomposition reaction of water occurs between the metal film and the molten glass, the generated hydrogen can be significantly suppressed from being released out of the system through the refractory brick by the glass component in the refractory brick. It is considered that as a result, the decomposition reaction of water can be suppressed, thereby significantly suppressing the generation of oxygen bubbles.
進而,關於本發明之一實施方式之構件,耐火磚包含孔隙率處於10%~30%之範圍內,且氧化矽與氧化鋁之合計量為50質量%以上之材料。Furthermore, about the member which concerns on one Embodiment of this invention, the refractory brick contains the material whose porosity exists in the range of 10%-30%, and the total amount of silica and alumina is 50 mass % or more.
此種耐火磚與普通電熔鑄磚不同,具有耐熱衝擊之性質。因此,本發明之一實施方式中,即便於對構件反覆進行加熱/冷卻之情形時,亦可顯著地抑制耐火磚劣化或破損。This kind of refractory brick is different from ordinary electric fused cast bricks, and has the property of heat shock resistance. Therefore, in one embodiment of this invention, even when heating/cooling is repeated to a member, deterioration of a refractory brick or damage can be suppressed remarkably.
根據以上效果,本發明之一實施方式可提供一種耐熱衝擊,且能夠顯著地抑制氣泡之產生之構件。Based on the above effects, one embodiment of the present invention can provide a thermal shock resistant member capable of remarkably suppressing generation of air bubbles.
再者,於如專利文獻1所述在耐火磚之表面設置鉑板而構成構件之情形時,可能會產生以下問題,即,對構件進行加熱時、或進行降溫時,鉑板因耐火磚與鉑之熱膨脹差而發生變形。一旦鉑板發生此種變形,則可能導致鉑板因變形而受損,從而難以保護耐火磚免於熔融玻璃之傷害。Furthermore, when a platinum plate is provided on the surface of the refractory brick to form a component as described in
然而,本發明之一實施方式之構件中,以「金屬膜」之形式提供鉑。於該情形時,即便構件被加熱或冷卻而導致耐火磚發生變形,金屬膜亦能夠追隨耐火磚之變形。因此,本發明之一實施方式之構件可長期藉由金屬膜來保護耐火磚。However, in the member of one embodiment of the present invention, platinum is provided as a "metal film". In this case, even if the member is heated or cooled to deform the refractory brick, the metal film can follow the deformation of the refractory brick. Therefore, the member of one embodiment of the present invention can protect the refractory brick with the metal film for a long time.
(本發明之一實施方式之玻璃製造設備用構件) 其次,參照圖式來更詳細地說明本發明之一實施方式之玻璃製造設備用構件之構成。 (Member for glass manufacturing equipment according to one embodiment of the present invention) Next, the structure of the member for glass manufacturing facilities which concerns on one Embodiment of this invention is demonstrated in more detail, referring drawings.
於圖1模式性地示出本發明之一實施方式之玻璃製造設備用構件(以下,稱為「第1構件」)之剖面。FIG. 1 schematically shows a cross section of a member for glass manufacturing equipment (hereinafter, referred to as "first member") according to one embodiment of the present invention.
如圖1所示,第1構件100具有耐火磚110、玻璃成分120、及金屬膜130。As shown in FIG. 1 , the
耐火磚110具有相互對向之第1表面112及第2表面114。耐火磚110具有如氧化矽與氧化鋁之合計量成為50質量%以上之組成。The
玻璃成分120設置於耐火磚110之第1表面112側。更具體而言,玻璃成分120以填充耐火磚110之第1表面112及其附近所存在之氣孔之至少一部分之方式設置。The
金屬膜130設置於耐火磚110之第1表面112。金屬膜130包含鉑,具有保護耐火磚110免於熔融玻璃之傷害之作用。The
再者,於圖1所示之例中,在耐火磚110之第1表面112形成有複數個凹部140,金屬膜130亦填充於該等凹部140內。Furthermore, in the example shown in FIG. 1 , a plurality of
藉由設置此種凹部140,可提高金屬膜130與耐火磚110之第1表面112之間之密接性。By providing such a
但是,其僅為一例,凹部140不必一定設置。However, this is only an example, and the
此處,第1構件100具有耐火磚110,該耐火磚110具有處於10%~30%之範圍內之孔隙率。此種耐火磚110與孔隙率較低之電熔鑄磚不同,具有相對良好之熱衝擊性。因此,第1構件100亦可適當地用於被反覆進行加熱/冷卻之裝置。Here, the
又,第1構件100具有填充至耐火磚110之氣孔內之玻璃成分120。玻璃成分120自耐火磚110之第1表面112起到達最大2000 μm以上之深度。Moreover, the
再者,以下,將自耐火磚110之第1表面112起之玻璃成分120在深度方向上之最大距離稱為「最大深度D
max」。於第1構件100中,最大深度D
max≧2000 μm。
In addition, below, the maximum distance of the
此種玻璃成分120作為氫透過之障壁發揮功能。因此,第1構件100雖然具有包含鉑之金屬膜130、及孔隙率處於10%~30%之範圍內之耐火磚110,但可顯著地抑制在熔融玻璃與金屬膜130之接觸時因水之分解反應而產生之氫透過耐火磚110而釋出至體系外。Such a
認為結果可顯著地抑制熔融玻璃中之水之分解反應,從而可顯著地抑制於熔融玻璃中以氣泡形式產生氧氣。It is considered that as a result, the decomposition reaction of water in the molten glass can be remarkably suppressed, so that the generation of oxygen gas in the form of bubbles in the molten glass can be remarkably suppressed.
根據以上效果,第1構件100可獲得良好之耐熱衝擊性,並且可顯著地抑制與熔融玻璃接觸時之氣泡之產生。According to the above effects, the
進而,於第1構件100中,鉑以金屬膜130之形態加以使用。於該情形時,即便第1構件100被快速加熱或快速冷卻而導致耐火磚110發生變形,金屬膜130亦能夠追隨耐火磚110之變形。Furthermore, platinum is used in the form of the
又,耐火磚110包含氧化矽及/或氧化鋁系材料。例如與如包含鋯之耐火磚相比,此種耐火磚110與鉑之熱膨脹之差較小,因此可顯著地抑制使用中之金屬膜130之剝離可能性。Moreover, the
(本發明之一實施方式之構件之各構成要素) 其次,對具有如上所述之特徵之本發明之一實施方式之構件之各構成要素進行說明。 (Constituent elements of members of one embodiment of the present invention) Next, each constituent element of a member of one embodiment of the present invention having the above-mentioned features will be described.
再者,於以下記載中,為了明確說明,而將上述第1構件100作為本發明之一實施方式之構件之例來說明各構成要素。因此,於表達各構成要素時,使用圖1所示之參照符號。In addition, in the following description, for the sake of clarity, each constituent element will be described by taking the above-mentioned
(耐火磚110)
耐火磚110只要具有如上所述之特徵,其種類便無特別限定。耐火磚110例如可為燒結磚。一般而言,與電熔鑄磚相比,燒結磚具有加工性較高,耐熱衝擊之特徵。
(refractory brick 110)
The kind of
耐火磚110可包含氧化鋁系、氧化矽系、或氧化鋁-氧化矽系陶瓷。The
於耐火磚110為氧化鋁系之情形時,耐火磚110中包含至少50質量%以上之氧化鋁。氧化鋁之量例如為60質量%以上,亦可為70質量%以上。氧化鋁之量亦可為100質量%。When the
於耐火磚110為氧化矽系之情形時,耐火磚110中包含至少50質量%以上之氧化矽。氧化矽之量例如為60質量%以上,亦可為70質量%以上。氧化矽之量亦可為100質量%。When the
又,於耐火磚110為氧化鋁-氧化矽系之情形時,耐火磚110中之氧化鋁與氧化矽之總和為至少50質量%以上。氧化鋁與氧化矽之總和例如為60質量%以上,亦可為70質量%以上。或者,耐火磚110之氧化鋁與氧化矽之總和亦可為100質量%。於該情形時,氧化矽之量可為10質量%~40質量%之範圍。Moreover, when the
耐火磚110之孔隙率處於10%~30%之範圍內,較佳為20%以下。The porosity of the
(玻璃成分120)
填充至耐火磚110之氣孔內之玻璃成分120之組成並無特別限定。
(glass component 120)
The composition of the
但是,玻璃成分120較佳為鹼性成分之量得到抑制之玻璃。例如於玻璃成分120中,鋰、鈉、及鉀之合計量較佳為以氧化物換算為5質量%以下。However, the
於抑制了鹼性成分之量之情形時,可顯著地抑制耐火磚與玻璃成分120之間之反應。When the amount of the alkaline component is suppressed, the reaction between the refractory brick and the
又,玻璃成分120較佳為具有如下性質,即,在第1構件100之使用中位置不會發生較大移動。例如,玻璃成分120可於1400℃下具有10
2~10
4Poise之黏度。
In addition, the
玻璃成分120之最大滲入深度D
max為至少2000 μm。藉由將最大滲入深度D
max設為2000 μm以上,可顯著地抑制耐火磚110內之氫之透過。
The maximum penetration depth D max of the
再者,耐火磚110內之氣孔中,存在能夠與第1表面112及/或第2表面114進行氣體連通之開氣孔、及與表面112、114均不連通之閉氣孔。其中,閉氣孔原本就不參與氫之移動。因此,以玻璃成分120進行填充之氣孔僅為開氣孔便足以。Furthermore, among the pores in the
又,關於開氣孔,亦無需以玻璃成分120填充第1表面112至最大滲入深度D
max為止之區域內之所有開氣孔。
Also, regarding the open pores, it is not necessary to fill all the open pores in the region from the
根據本案發明人等之經驗,認為雖然亦取決於玻璃成分120之組成,但於最大滲入深度D
max為5000 μm之情形時,自表面至深度5000 μm為止之區域內之開氣孔中約30%以上之開氣孔被密封,且實質上不存在自第1表面連通至第2表面之開氣孔。
According to the experience of the inventors of this application, it is considered that although it also depends on the composition of the
最大滲入深度D max較佳為3000 μm以上,更佳為5000 μm以上,進而較佳為8000 μm以上。 The maximum penetration depth D max is preferably at least 3000 μm, more preferably at least 5000 μm, and still more preferably at least 8000 μm.
(金屬膜130)
金屬膜130只要包含50質量%以上之鉑,其組成便無限定。例如金屬膜130可包含鉑,亦可包含鉑合金。鉑合金可為鉑-金合金、鉑-銠合金、或鉑-銥合金等。
(metal film 130)
The composition of the
金屬膜130可為熔射膜。The
金屬膜130之厚度並無特別限定。金屬膜130例如可具有100 μm~700 μm之範圍之厚度。The thickness of the
再者,第1構件100具有如圖1所示之凹部140,於該凹部140中存在金屬膜130之成分之情形時,金屬膜130之厚度以直至凹部140之底部為止之尺寸表示。Furthermore, the
凹部140之形態並無特別限定,凹部140例如可為沿單向延伸之槽、或大致圓形之孔等。此種凹部140可藉由雷射加工而形成。The shape of the
凹部140之深度例如可處於100 μm~500 μm之範圍內。又,凹部140之深寬比可處於0.5~2.0之範圍內。此處,凹部140之深寬比以相對於凹部140之最小寬度(於孔之情形時為直徑)而言之凹部140之深度表示。The depth of the
但是,如上所述,凹部140可省略。However, as described above, the
(第1構件100)
第1構件100於玻璃製造設備中適用於會與熔融玻璃接觸之部位。
(first member 100)
The
此種部位例如可為熔解爐、澄清爐、熔融玻璃之供給配管、及/或成形裝置之一部分等。Such a location may be, for example, a melting furnace, a fining furnace, a supply pipe for molten glass, and/or a part of a forming device.
尤其是,於玻璃製造設備中,在較澄清爐更靠近下游之側,大多數情況下不會實施自熔融玻璃中去除氣泡之處理。因此,第1構件100較佳為適用於配置在較澄清爐更靠近下游之裝置、例如成形裝置等。In particular, in glass manufacturing facilities, the process of removing air bubbles from molten glass is not often performed on the downstream side of the clarification furnace. Therefore, the
(本發明之另一實施方式之玻璃製造設備用構件) 其次,參照圖2對本發明之另一實施方式之玻璃製造設備用構件之構成進行說明。 (Member for glass manufacturing equipment according to another embodiment of the present invention) Next, the configuration of a member for glass manufacturing equipment according to another embodiment of the present invention will be described with reference to FIG. 2 .
圖2中模式性地示出本發明之另一實施方式之玻璃製造設備用構件(以下,稱為「第2構件」)之剖面。FIG. 2 schematically shows a cross section of a member for glass manufacturing equipment (hereinafter referred to as "second member") according to another embodiment of the present invention.
如圖2所示,第2構件200具有耐火磚210、玻璃成分220、及金屬膜230。As shown in FIG. 2 , the
第2構件200中,耐火磚210及玻璃成分220分別具有與第1構件100中之耐火磚110及玻璃成分120相同之構成。但是,第2構件200中,金屬膜230之配置態樣與第1構件100不同。In the
即,第2構件200中,金屬膜230未配置於耐火磚210之第1表面212側,而配置於第2表面214側。又,複數個凹部240形成於耐火磚210之第2表面214。但是,如上所述,凹部240不必一定設置。That is, in the
第2構件200係以金屬膜230側與熔融玻璃接觸之方式使用。The
從業者明白第2構件200亦可獲得與上述第1構件100相同之效果。Practitioners understand that the
即,第2構件200亦可獲得良好之耐熱衝擊性,並且可顯著地抑制與熔融玻璃接觸時之氣泡之產生。That is, the
(本發明之一實施方式之玻璃製造設備用構件之製造方法) 其次,參照圖3~圖7對本發明之一實施方式之玻璃製造設備用構件之製造方法之一例進行說明。 (Method for manufacturing glass manufacturing equipment member according to one embodiment of the present invention) Next, an example of the manufacturing method of the member for glass manufacturing facilities which concerns on one Embodiment of this invention is demonstrated with reference to FIGS. 3-7.
圖3中概略性地示出本發明之一實施方式之玻璃製造設備用構件之製造方法(以下,稱為「第1方法」)之流程。如圖3所示,第1方法包括: 於具有第1表面及第2表面,氧化鋁與氧化矽之合計量為50質量%以上,且孔隙率處於10%~30%之範圍內之耐火磚之第1表面,設置玻璃原料之步驟(步驟S110); 使玻璃原料熔融而形成熔融玻璃,使熔融玻璃自耐火磚之第1表面浸漬之步驟(步驟S120); 於熔融玻璃固化後,去除殘存於第1表面上之玻璃原料之步驟(步驟S130);及 於耐火磚之第1表面設置包含鉑之金屬膜之步驟(步驟S140)。 FIG. 3 schematically shows the flow of a manufacturing method (hereinafter, referred to as "first method") of a member for glass manufacturing equipment according to an embodiment of the present invention. As shown in Figure 3, the first method includes: The step of arranging glass raw materials on the first surface of the refractory brick having the first surface and the second surface, the total amount of alumina and silicon oxide being 50% by mass or more, and the porosity being in the range of 10% to 30% ( Step S110); A step of melting glass raw materials to form molten glass, and impregnating the molten glass from the first surface of the refractory brick (step S120); After the molten glass is solidified, the step of removing the remaining glass raw material on the first surface (step S130); and The step of providing a metal film containing platinum on the first surface of the refractory brick (step S140).
以下,亦參照圖4~圖7對各步驟進行說明。Hereinafter, each step will be described also with reference to FIGS. 4 to 7 .
再者,此處,為了明確說明,而將圖1所示之第1構件100假定為要製造之構件。因此,於表達構件之各構成要素時,使用圖1中所示之參照符號。In addition, here, for the sake of clarity, it is assumed that the
(步驟S110)
首先,準備耐火磚110。
(step S110)
First,
如上所述,耐火磚110包含氧化矽與氧化鋁之合計量為50質量%以上,且孔隙率處於10%~30%之範圍內之材料。耐火磚110可包含氧化矽系、氧化鋁系、或氧化矽-氧化鋁系陶瓷。As mentioned above, the
耐火磚110可為燒結磚。The
耐火磚110具有初始第1表面116及初始第2表面118。The
繼而,於耐火磚110之初始第1表面116設置玻璃原料。Next, glass raw material is provided on the initial
圖4中模式性地示出在耐火磚110之初始第1表面116設置有玻璃原料122之狀態。FIG. 4 schematically shows the state in which the glass
玻璃原料122包含玻璃料、黏合劑、及溶劑(例如水)。玻璃原料122例如可以漿料狀態提供。The glass
(步驟S120)
繼而,對玻璃原料122進行熔融處理。熔融處理之溫度及時間係基於玻璃原料122中所含之玻璃料之組成而適當地決定。
(step S120)
Next, the glass
當藉由熔融處理而將玻璃原料122加熱至高溫時,溶劑會氣化,同時玻璃料熔融。黏合劑與溶劑一起發生氣化,或與玻璃料一起熔融。已熔融之玻璃料自耐火磚110之初始第1表面116滲入至內部。藉此,使玻璃成分120浸漬於耐火磚110之初始第1表面116及其附近所存在之氣孔內。When the
圖5中模式性地示出玻璃成分120浸漬於耐火磚110之氣孔內之狀態。FIG. 5 schematically shows the state in which the
再者,由玻璃原料122所形成之玻璃成分120未必全部浸漬於耐火磚110之氣孔內。即,如圖5所示,玻璃成分120之一部分作為玻璃層124而殘存於耐火磚110之初始第1表面116。Furthermore, the
然後,使玻璃成分120固化。Then, the
(步驟S130)
繼而,去除殘存於耐火磚110之初始第1表面116之玻璃層124。
(step S130)
Then, the
玻璃層124可藉由耐火磚110之機械研磨法而自初始第1表面116去除。此時,耐火磚110之初始第1表面116亦可被研磨,形成研磨面。該研磨面可成為耐火磚110之新生面(第1表面112)。The
藉此,可獲得如圖6所示之第1表面112(或初始第1表面116)附近之氣孔之至少一部分被玻璃成分120填充所得之耐火磚110。Thereby, a
自第1表面112起之玻璃成分120之最大滲入深度D
max為2000 μm以上。
The maximum penetration depth D max of the
(步驟S140)
繼而,於耐火磚110之第1表面112設置金屬膜130。但是,亦可於該處理之前,在第1表面112形成凹部140。
(step S140)
Next, a
圖7中模式性地示出在耐火磚110之第1表面112形成有凹部140之狀態。FIG. 7 schematically shows the state where the recessed
凹部140可為沿固定方向延伸之複數個槽、或複數個圓形孔等。該等凹部140可於俯視下具有規則性二維排列,或者亦可無規地配置。The
凹部140之最小寬度例如可處於100 μm~200 μm之範圍內。又,以相對於凹部之最小寬度而言之凹部之深度來表示的深寬比可處於0.5~2.0之範圍內。The minimum width of the
凹部140例如可藉由雷射加工而形成。The
再者,凹部140之形成無規定。Furthermore, the formation of the
繼而,於耐火磚110之第1表面112設置金屬膜130。如上所述,金屬膜130包含鉑。Next, a
金屬膜130之設置方法並無特別限定。金屬膜130例如可藉由熔射法而成膜。The method of disposing the
金屬膜130之厚度例如處於100 μm~500 μm之範圍內。The thickness of the
藉由以上步驟,可製造如上述圖1所示之第1構件100。再者,於第1方法中不存在對耐火磚110之初始第2表面118進行研磨之步驟時,初始第2表面118成為耐火磚110之第2表面114。Through the above steps, the
以上,以第1方法為例對本發明之一實施方式之構件之製造方法進行了說明。然而,從業者明白本發明之一實施方式之構件亦可藉由其他方法來製造。As mentioned above, the manufacturing method of the member which concerns on one Embodiment of this invention was demonstrated taking the 1st method as an example. However, practitioners understand that the components of an embodiment of the present invention can also be manufactured by other methods.
例如,於在上述步驟S140中將金屬膜130形成於耐火磚110之初始第2表面118之情形時,可製造如圖2所示之第2構件200。亦可除此以外進行各種變更。
[實施例]
For example, in the case where the
其次,對本發明之實施例進行說明。再者,於以下記載中,例1~例5為實施例,例11~例12為比較例。Next, examples of the present invention will be described. In addition, in the following description, examples 1-5 are examples, and examples 11-12 are comparative examples.
(例1) 藉由上述第1方法而製作評價用構件。 (example 1) The member for evaluation was produced by the above-mentioned first method.
耐火磚之尺寸設為縱50 mm、橫50 mm、厚度15 mm。將縱50 mm×橫50 mm之一個表面稱為第1表面。The size of the refractory brick is set to 50 mm in length, 50 mm in width and 15 mm in thickness. A surface of 50 mm in length and 50 mm in width is called the first surface.
使用以下之表1所示之組成之耐火磚A作為耐火磚。The refractory brick A of the composition shown in the following Table 1 was used as a refractory brick.
[表1]
繼而,使用以下方法將玻璃成分填充至耐火磚中。Next, the glass component was filled in the refractory brick by the following method.
首先,於耐火磚之第1表面塗佈玻璃漿料。玻璃漿料包含水、黏合劑及玻璃料。將玻璃料中所含之玻璃稱為玻璃A。又,將玻璃A之組成及軟化點示於以下表2。First, glass paste is coated on the first surface of the refractory brick. The glass paste includes water, binder and glass frit. The glass contained in the glass frit is called glass A. Moreover, the composition and softening point of glass A are shown in Table 2 below.
[表2]
然後,藉由機械研磨將殘留於耐火磚之第1表面上之玻璃層加以去除。Then, the glass layer remaining on the first surface of the refractory brick is removed by mechanical grinding.
繼而,於耐火磚之第1表面,藉由雷射加工法以交錯排列形成大量圓形孔。孔之直徑設為約300 μm,深度設為約300 μm。因此,孔之深寬比為約1.0。Then, on the first surface of the refractory brick, a large number of circular holes are formed in a staggered arrangement by laser processing. The diameter of the hole was set at about 300 μm, and the depth was set at about 300 μm. Therefore, the aspect ratio of the pores is about 1.0.
繼而,藉由火焰熔射法,於耐火磚之第1表面成膜出鉑膜。鉑膜之厚度設為約300 μm。Then, a platinum film is formed on the first surface of the refractory brick by flame spraying method. The thickness of the platinum film was set at about 300 μm.
藉此獲得評價用構件(以下,稱為「樣品1」)。In this way, a member for evaluation (hereinafter referred to as "
(例2) 藉由與例1相同之方法而製造評價用構件。但是,於該例2中,使用玻璃B作為玻璃料中所含之玻璃。將玻璃B之組成及軟化點示於上述表2。 (Example 2) A member for evaluation was produced by the same method as in Example 1. However, in this Example 2, glass B was used as the glass contained in the glass frit. The composition and softening point of glass B are shown in Table 2 above.
以下,將所製作之評價用構件稱為「樣品2」。Hereinafter, the produced member for evaluation is referred to as "sample 2".
(例3) 藉由與例1相同之方法而製造評價用構件。但是,於該例3中,使用玻璃C作為玻璃料中所含之玻璃。將玻璃C之組成及軟化點示於上述表2。 (Example 3) A member for evaluation was produced by the same method as in Example 1. However, in this Example 3, glass C was used as the glass contained in the glass frit. The composition and softening point of Glass C are shown in Table 2 above.
以下,將所製作之評價用構件稱為「樣品3」。Hereinafter, the produced member for evaluation is referred to as "sample 3".
(例4) 藉由與例1相同之方法而製造評價用樣品。但是,於該例4中,使用作為燒結磚之一種之耐火磚B作為耐火磚。將耐火磚B之組成及孔隙率示於上述表1。又,於該例4中,使用玻璃C作為玻璃料中所含之玻璃。 (Example 4) Samples for evaluation were produced by the same method as in Example 1. However, in this example 4, the refractory brick B which is 1 type of fired brick was used as a refractory brick. The composition and porosity of the refractory brick B are shown in Table 1 above. In addition, in this Example 4, glass C was used as the glass contained in the glass frit.
以下,將所製作之評價用構件稱為「樣品4」。Hereinafter, the produced member for evaluation is referred to as "sample 4".
(例5) 藉由與例1相同之方法而製造評價用樣品。但是,於該例5中,使用玻璃D作為玻璃料中所含之玻璃。將玻璃D之組成及軟化點示於上述表2。 (Example 5) Samples for evaluation were produced by the same method as in Example 1. However, in this Example 5, glass D was used as the glass contained in the glass frit. The composition and softening point of glass D are shown in Table 2 above.
以下,將所製作之評價用構件稱為「樣品5」。Hereinafter, the produced member for evaluation is referred to as "sample 5".
(例11) 藉由與例1相同之方法而製造評價用樣品。但是,於該例11中,未將玻璃成分填充至耐火磚內。即,未塗佈玻璃漿料而對耐火磚之第1表面進行雷射加工後,將鉑膜熔射而製作評價用樣品。 (Example 11) Samples for evaluation were produced by the same method as in Example 1. However, in this Example 11, the glass component was not filled in the refractory brick. That is, after performing laser processing on the 1st surface of a refractory brick without applying glass paste, a platinum film was sprayed and the sample for evaluation was produced.
以下,將所製作之評價用構件稱為「樣品11」。Hereinafter, the produced member for evaluation is referred to as "sample 11".
(例12) 藉由與例1相同之方法而製造評價用樣品。但是,於該例12中,在玻璃成分之填充步驟中將玻璃漿料之塗佈量設為例1時之1/10。 (Example 12) Samples for evaluation were produced by the same method as in Example 1. However, in this Example 12, the coating amount of the glass paste was made into 1/10 of Example 1 in the filling process of a glass component.
以下,將所製作之評價用構件稱為「樣品12」。Hereinafter, the produced member for evaluation is referred to as "sample 12".
(玻璃成分之滲入深度之測定) 上述各例中,於藉由雷射來加工圓形孔之前,測定玻璃成分自耐火玻璃之第1表面起之滲入深度。 (Measurement of penetration depth of glass components) In each of the above examples, the penetration depth of the glass component from the first surface of the refractory glass was measured before the circular hole was processed by laser.
測定係於將各耐火磚沿與厚度方向平行之方向進行切割而獲得之剖面中,拍攝矽(Si)之EPMA(electron probe micro analyzer,電子探針微量分析儀)映射圖而實施。即,使用Si之映射圖,求出自耐火磚之第1表面至玻璃成分所在之最大深度為止之距離。將所獲得之距離作為玻璃成分之最大深度D max。 The measurement is carried out by taking an EPMA (electron probe micro analyzer) map of silicon (Si) in a section obtained by cutting each refractory brick in a direction parallel to the thickness direction. That is, using the map of Si, the distance from the first surface of the refractory brick to the maximum depth where the glass component is located was obtained. The obtained distance was taken as the maximum depth D max of the glass composition.
圖8中示出例3之雷射加工前之耐火磚之剖面中之Si之映射圖像的一例。又,圖9中示出例11之雷射加工前之耐火磚之剖面中之Si之映射圖像的一例。An example of the mapped image of Si in the cross section of the refractory brick before laser processing of Example 3 is shown in FIG. 8 . Moreover, an example of the mapping image of Si in the cross section of the refractory brick before the laser processing of Example 11 is shown in FIG.
自圖9可知,例3中之耐火磚在深度方向上未發現玻璃成分。相對於此,自圖8可知,例3中之耐火磚在自表面起直至至少2000 μm之深度為止填充有玻璃成分。It can be seen from Fig. 9 that no glass component was found in the depth direction of the refractory brick in Example 3. On the other hand, as can be seen from FIG. 8 , the refractory brick in Example 3 is filled with a glass component to a depth of at least 2000 μm from the surface.
於表3中彙總示出各樣品中之耐火磚之種類、所填充之玻璃種類、及玻璃成分之最大深度D max。 Table 3 summarizes the types of refractory bricks in each sample, the type of glass filled, and the maximum depth D max of the glass composition.
[表3]
(評價) (熔融玻璃接觸試驗) 使用各樣品實施熔融玻璃接觸試驗。 (Evaluation) (Molten Glass Contact Test) The molten glass contact test was implemented using each sample.
該試驗係如下實施。The test was carried out as follows.
首先,於樣品之鉑膜之表面設置圓板盤狀玻璃磚。使用玻璃B作為玻璃磚。Firstly, a disk-shaped glass block is placed on the surface of the platinum film of the sample. Use Glass B as the glass block.
繼而,於大氣中將樣品加熱至1400℃,使玻璃磚熔融。已熔融之玻璃與鉑膜之接觸面積為約150 mm 2。於將樣品溫度維持在1400℃之狀態下,觀察熔融玻璃內之狀態、尤其是有無產生氣泡。在1400℃下之保持時間為約120分鐘。 Next, the sample was heated to 1400° C. in the air to melt the glass brick. The contact area between the molten glass and the platinum film is about 150 mm 2 . With the sample temperature maintained at 1400°C, the state in the molten glass, especially the presence or absence of bubbles was observed. The hold time at 1400°C was about 120 minutes.
(熱循環試驗) 使用各樣品實施熱循環試驗。 (Thermal cycle test) A thermal cycle test was implemented using each sample.
熱循環試驗係將下述循環反覆進行3個循環而實施,即,將各樣品加熱至1400℃,於該溫度下保持10分鐘後進行空氣冷卻。試驗係於大氣中實施。The thermal cycle test was implemented by repeating three cycles of heating each sample to 1400° C., maintaining at this temperature for 10 minutes, and then air cooling. The test is carried out in the atmosphere.
試驗後,對樣品之狀態進行評價。尤其對耐火磚有無損傷、及鉑膜有無剝離等進行評價。After the test, evaluate the state of the sample. In particular, the presence or absence of damage to the refractory bricks and the presence or absence of peeling of the platinum film were evaluated.
(結果) 於以下表4中彙總示出各評價試驗之結果。 (result) The results of the respective evaluation tests are collectively shown in Table 4 below.
[表4]
如此確認到,藉由將玻璃成分之最大滲入深度D max設為2000 μm以上,而顯著地抑制氣泡之產生。 In this way, it was confirmed that the generation of air bubbles was remarkably suppressed by setting the maximum penetration depth D max of the glass component to be 2000 μm or more.
又,樣品11在熱循環試驗後,鉑膜發生了剝離。相對於此,樣品1~樣品4在熱循環試驗後,未發現鉑膜剝離。又,對於耐火磚,同樣地未發現特別異常。Also, in sample 11, the platinum film peeled off after the thermal cycle test. On the other hand, in
如此確認到,樣品2~樣品4具有良好之耐熱衝擊性。Thus, it was confirmed that samples 2 to 4 had favorable thermal shock resistance.
(追加試驗) 使用複數個耐火磚實施熱衝擊試驗。 (additional test) A thermal shock test is performed using a plurality of refractory bricks.
熱衝擊試驗係藉由以下方式而實施,即,將各耐火磚於大氣中加熱至1300℃後,投入至25℃之水中。The thermal shock test was implemented by heating each refractory brick to 1300°C in the air, and then putting it into water at 25°C.
使用I~III之三種耐火磚作為耐火磚。耐火磚之尺寸全部設為縱40 mm×橫40 mm×厚度100 mm。Three kinds of refractory bricks from I to III are used as refractory bricks. The dimensions of the refractory bricks are all set to 40 mm in length x 40 mm in width x 100 mm in thickness.
於以下表5中彙總示出所使用之耐火磚之組成。The compositions of the refractory bricks used are summarized in Table 5 below.
[表5]
將熱衝擊試驗後之各耐火磚之狀態彙總示於圖10。The state of each refractory brick after the thermal shock test is collectively shown in FIG. 10 .
自圖10可知,耐火磚III產生了較大之裂痕。又,關於耐火磚II,同樣在一部分發現了裂痕。It can be seen from Fig. 10 that the refractory brick III has produced relatively large cracks. Also, about the refractory brick II, similarly, cracks were found in a part.
相對於此,耐火磚I在試驗後未發現裂痕等異常。On the other hand, no abnormalities such as cracks were found in the
如此可知,與電鑄磚及非氧化鋁系燒結磚相比,氧化鋁系燒結磚具有良好之耐熱衝擊性。Thus, it can be seen that alumina-based fired bricks have better thermal shock resistance than electroformed bricks and non-alumina-based fired bricks.
本案主張基於2021年3月31日提出申請之日本專利申請案第2021-060625號之優先權,並將該日本申請案之所有內容以參照形式援引至本案中。This case claims priority based on Japanese Patent Application No. 2021-060625 filed on March 31, 2021, and all content of the Japanese application is incorporated into this case by reference.
100:本發明之一實施方式之構件(第1構件) 110:耐火磚 112:第1表面 114:第2表面 116:初始第1表面 118:初始第2表面 120:玻璃成分 122:玻璃原料 124:玻璃層 130:金屬膜 140:凹部 200:本發明之一實施方式之構件(第2構件) 210:耐火磚 212:第1表面 214:第2表面 220:玻璃成分 230:金屬膜 240:凹部 100: Member (first member) of one embodiment of the present invention 110: refractory brick 112: 1st surface 114: Second surface 116: Initial 1st surface 118: Initial 2nd surface 120: glass composition 122: glass raw material 124: glass layer 130: metal film 140: concave part 200: Member (second member) of one embodiment of the present invention 210: refractory brick 212: 1st surface 214: 2nd surface 220: glass composition 230: metal film 240: concave part
圖1係模式性地表示本發明之一實施方式之構件之構成的剖視圖。 圖2係模式性地表示本發明之另一實施方式之構件之構成的剖視圖。 圖3係概略性地表示本發明之一實施方式之玻璃製造設備用構件之製造方法之流程的圖。 圖4係模式性地表示本發明之一實施方式之玻璃製造設備用構件之製造方法中之一步驟的圖。 圖5係模式性地表示本發明之一實施方式之玻璃製造設備用構件之製造方法中之一步驟的圖。 圖6係模式性地表示本發明之一實施方式之玻璃製造設備用構件之製造方法中之一步驟的圖。 圖7係模式性地表示本發明之一實施方式之玻璃製造設備用構件之製造方法中之一步驟的圖。 圖8係表示例3之雷射加工前之耐火磚之剖面中之Si之映射結果之一例的圖。 圖9係表示例11之雷射加工前之耐火磚之剖面中之Si之映射結果之一例的圖。 圖10係彙總表示各種耐火磚之熱衝擊試驗後之狀態的照片。 Fig. 1 is a cross-sectional view schematically showing the structure of a member according to an embodiment of the present invention. Fig. 2 is a cross-sectional view schematically showing the structure of another embodiment of the present invention. Fig. 3 is a diagram schematically showing the flow of a method for manufacturing a member for glass manufacturing equipment according to an embodiment of the present invention. Fig. 4 is a diagram schematically showing one step in a method of manufacturing a member for glass manufacturing equipment according to an embodiment of the present invention. Fig. 5 is a diagram schematically showing one step in a method of manufacturing a member for glass manufacturing equipment according to an embodiment of the present invention. Fig. 6 is a diagram schematically showing one step in a method of manufacturing a member for glass manufacturing equipment according to an embodiment of the present invention. Fig. 7 is a diagram schematically showing one step in a method of manufacturing a member for glass manufacturing equipment according to an embodiment of the present invention. FIG. 8 is a diagram showing an example of the mapping result of Si in the cross section of the refractory brick before laser processing of Example 3. FIG. FIG. 9 is a diagram showing an example of Si mapping results in a cross section of a refractory brick before laser processing in Example 11. FIG. Fig. 10 is a photograph collectively showing the states of various refractory bricks after thermal shock tests.
100:本發明之一實施方式之構件(第1構件) 100: Member (first member) of one embodiment of the present invention
110:耐火磚 110: refractory brick
112:第1表面 112: 1st surface
114:第2表面 114: Second surface
120:玻璃成分 120: glass composition
130:金屬膜 130: metal film
140:凹部 140: concave part
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GB9722901D0 (en) * | 1997-10-30 | 1998-01-07 | Johnson Matthey Plc | Improvements in coatings |
JP2007153713A (en) * | 2005-12-08 | 2007-06-21 | Tanaka Kikinzoku Kogyo Kk | Glass manufacturing unit |
JP5928340B2 (en) | 2010-11-25 | 2016-06-01 | 旭硝子株式会社 | Ceramic member and manufacturing method thereof, molten glass manufacturing apparatus and manufacturing method, glass article manufacturing apparatus and glass article manufacturing method |
JP2012121740A (en) | 2010-12-06 | 2012-06-28 | Nippon Electric Glass Co Ltd | Glass production apparatus and glass production method using the same |
JP2013216521A (en) * | 2012-04-06 | 2013-10-24 | Nippon Electric Glass Co Ltd | Glass production apparatus and glass production method using the same |
-
2022
- 2022-02-17 CN CN202280023827.7A patent/CN117062784A/en active Pending
- 2022-02-17 WO PCT/JP2022/006407 patent/WO2022209393A1/en active Application Filing
- 2022-02-17 JP JP2023510632A patent/JPWO2022209393A1/ja active Pending
- 2022-02-17 KR KR1020237029257A patent/KR20230165752A/en unknown
- 2022-02-25 TW TW111107017A patent/TW202239719A/en unknown
Also Published As
Publication number | Publication date |
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WO2022209393A1 (en) | 2022-10-06 |
JPWO2022209393A1 (en) | 2022-10-06 |
KR20230165752A (en) | 2023-12-05 |
CN117062784A (en) | 2023-11-14 |
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