TW202238625A - RI manufacturing device and target storage device capable of improving cooling efficiency and nuclear reaction efficiency - Google Patents

RI manufacturing device and target storage device capable of improving cooling efficiency and nuclear reaction efficiency Download PDF

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TW202238625A
TW202238625A TW111111289A TW111111289A TW202238625A TW 202238625 A TW202238625 A TW 202238625A TW 111111289 A TW111111289 A TW 111111289A TW 111111289 A TW111111289 A TW 111111289A TW 202238625 A TW202238625 A TW 202238625A
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上田正
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日商住友重機械工業股份有限公司
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Abstract

To provide a target storage device capable of improving cooling efficiency and an RI manufacturing device capable of improving nuclear reaction efficiency. The RI manufacturing device (1) is provided with cooling flow paths (46, 48), wherein the cooling flow paths (46, 48) allow cooling medium to flow through heat transfer wall parts (41, 42) arranged around the irradiation axis (RL) relative to the storage part (3), and cools the storage part (3) from the outer peripheral side of the heat transfer wall parts (41, 42). At this time, by allowing the cooling medium to flow through the cooling flow paths (46, 48) and passing through the heat transfer wall parts (41, 42) provided around the irradiation axis (RL), it is possible to use the irradiation axis as a reference to cool down the target of the storage part (3) from the outer side of the aforementioned storage part. In this way, the target can be cooled from different directions through the internal spaces (31A, 31B) and the cooling flow paths (46, 48).

Description

RI製造裝置及靶收納裝置RI manufacturing device and target storage device

本發明有關一種靶收納裝置。 本申請主張基於2021年3月29日申請的日本專利申請第2021-055409號的優先權。該日本申請的全部內容藉由參閱援用於本說明書中。 The invention relates to a target storage device. This application claims priority based on Japanese Patent Application No. 2021-055409 filed on March 29, 2021. The entire content of this Japanese application is incorporated in this specification by reference.

使用了正電子發射斷層攝影法(PET:Positron Emission Tomography)之PET檢查的檢查用藥劑中所使用之放射性同位素,是使用設置於靠近醫院內的檢查室的場所之迴旋加速器等放射線源來製造。具體而言,將來自放射線源的粒子束(例如,質子束、氘核束等粒子束)引導至靶收納裝置,藉由與收納在靶收納裝置中之靶(例如,靶水( 18O水))進行核反應製造放射性同位素。又,藉由將所製造之放射性同位素導入既定的化合物(例如,氟代脫氧葡萄糖(FDG:Fluoro-Deoxy-Glucose))、或者替換其一部分進行合成來製造檢查用藥劑。 The radioactive isotope used in the test drug for PET examination using Positron Emission Tomography (PET: Positron Emission Tomography) is manufactured using a radiation source such as a cyclotron installed in a place close to an examination room in a hospital. Specifically, the particle beams (such as proton beams, deuteron beams, etc.) )) carry out nuclear reactions to produce radioactive isotopes. Also, inspection agents are produced by introducing the produced radioisotope into a predetermined compound (for example, fluorodeoxyglucose (FDG: Fluoro-Deoxy-Glucose)) or substituting a part thereof for synthesis.

作為用以製造這樣的放射性同位素之RI製造裝置,已知有一種裝置,其具備:收納部,收納液體靶;及流路,從粒子束的照射軸的一側對該收納部進行冷卻(例如,參閱專利文獻1)。 [先前技術文獻] As an RI production apparatus for producing such a radioisotope, there is known an apparatus including: a storage unit for housing a liquid target; and a flow path for cooling the storage unit from one side of the irradiation axis of the particle beam (e.g. , refer to Patent Document 1). [Prior Art Literature]

[專利文獻1]日本特開2013-246131號公報[Patent Document 1] Japanese Unexamined Patent Publication No. 2013-246131

[發明所欲解決之問題][Problem to be solved by the invention]

在此,藉由照射粒子束而使靶成為高溫。對此,藉由提高冷卻靶的冷卻效率,能夠提高核反應的效率。因此,要求一種能夠提高冷卻效率之靶收納裝置及能夠提高核反應的效率之RI製造裝置。Here, the target is made high temperature by irradiating the particle beam. In contrast, by improving the cooling efficiency of the cooling target, the efficiency of the nuclear reaction can be improved. Therefore, a target storage device capable of improving cooling efficiency and an RI manufacturing device capable of improving efficiency of nuclear reactions are required.

本發明係鑑於上述而完成的,其目的是為了提供一種能夠提高冷卻效率之靶收納裝置及能夠提高核反應的效率之RI製造裝置。 [解決問題之技術手段] The present invention has been made in view of the above, and an object of the present invention is to provide a target storage device capable of improving cooling efficiency and an RI manufacturing device capable of improving nuclear reaction efficiency. [Technical means to solve the problem]

為了實現上述目的,本發明的一形態之RI製造裝置,係藉由被照射粒子束之靶的核反應來製造放射性同位素,其係具備:收納部,在粒子束的照射位置收納靶;第1流路,能夠讓冷卻介質流通,而從粒子束的照射軸的一側對收納部進行冷卻;及第2流路,能夠讓冷卻介質流通,而透過相對於收納部圍繞照射軸設置之壁部的至少一部分,以照射軸為基準從比收納部更外側對收納部進行冷卻。In order to achieve the above object, an RI manufacturing apparatus according to an aspect of the present invention manufactures radioactive isotopes through a nuclear reaction of a target irradiated with a particle beam, and includes: a storage unit for storing the target at the irradiation position of the particle beam; The second flow path is capable of allowing the cooling medium to flow through and cool the storage part from one side of the irradiation axis of the particle beam; At least a part of the storage part is cooled from the outside of the storage part based on the irradiation axis.

RI製造裝置具備第1流路,該第1流路能夠讓冷卻介質流通,而從粒子束的照射軸的一側對收納部進行冷卻。藉此,藉由使冷卻介質流過第1流路,能夠從照射軸的一側對收納部的靶進行冷卻。進而,RI製造裝置具備第2流路,該第2流路能夠讓冷卻介質流通,而透過相對於收納部圍繞照射軸設置之壁部的至少一部分,以照射軸為基準從比收納部更外側對收納部進行冷卻。此時,藉由使冷卻介質流過第2流路,透過圍繞照射軸設置的壁部,以照射軸為基準從內側向外側,從收納部進行排熱,藉此能夠對收納部的靶進行冷卻。如此,藉由第1流路及第2流路,能夠從不同方向對靶進行冷卻。因此,能夠提高靶的冷卻效率,藉此能夠提高靶的核反應的效率。The RI production apparatus includes a first flow channel through which a cooling medium can flow to cool the storage unit from the side of the irradiation axis of the particle beam. Thereby, by making the cooling medium flow through the first flow path, it is possible to cool the target in the storage unit from one side of the irradiation axis. Furthermore, the RI manufacturing apparatus is provided with a second flow path which allows the cooling medium to flow through at least a part of the wall portion provided around the irradiation axis with respect to the storage portion, from outside the storage portion with the irradiation axis as a reference. The storage part is cooled. At this time, by making the cooling medium flow through the second flow path, pass through the wall portion provided around the irradiation axis, and discharge heat from the storage part from the inside to the outside with the irradiation axis as a reference, the target in the storage part can be cooled. cool down. In this way, the target can be cooled from different directions by the first flow path and the second flow path. Therefore, the cooling efficiency of the target can be improved, whereby the efficiency of the nuclear reaction of the target can be improved.

可以構成為,第2流路能夠對收納部中的可收納液體靶之部分進行冷卻。此時,第2流路對藉由照射粒子束而成為高溫之液體靶進行冷卻,藉此能夠抑制液體靶的蒸發。因此,能夠提高液體靶的核反應的效率。The second flow path may be configured to be capable of cooling a portion of the storage section that can accommodate the liquid target. At this time, the second flow path cools the liquid target that has become high in temperature due to the irradiation of the particle beam, whereby evaporation of the liquid target can be suppressed. Therefore, the efficiency of the nuclear reaction of the liquid target can be improved.

可以構成為,第2流路能夠對收納部中的可收納氣體靶之部分進行冷卻。此時,第2流路對氣體靶進行冷卻,藉此能夠使其液化。因此,能夠藉由增加液體靶的量來提高核反應的效率。The second flow path may be configured to be capable of cooling a portion of the storage section that can accommodate the gas target. At this time, the gas target can be liquefied by cooling the second flow path. Therefore, the efficiency of the nuclear reaction can be improved by increasing the amount of the liquid target.

可以構成為,收納部具有:第1收納部分,能夠收納液體靶;及第2收納部分,與第1收納部分連通而能夠收納氣體靶,第2流路能夠隔著第2收納部分從照射軸之與第1流路相反的一側對收納部進行冷卻。此時,第1收納部分的液體靶被照射粒子束而蒸發,成為氣體靶貯存於第2收納部分。對此,第1流路和第2流路能夠相對於照射軸從兩側對氣體靶進行冷卻。藉此,藉由對氣體靶進行冷卻而使其液化,能夠成為液體靶返回到第1收納部分。因此,能夠藉由增加液體靶的量來提高核反應的效率。It can be configured that the storage unit has: a first storage portion capable of storing a liquid target; and a second storage portion communicating with the first storage portion and capable of storing a gas target, and the second flow path can be separated from the irradiation axis via the second storage portion. The side opposite to the first flow path cools the housing portion. At this time, the liquid target in the first storage part is irradiated with the particle beam, evaporates, and is stored in the second storage part as a gas target. In contrast, the first flow path and the second flow path can cool the gas target from both sides with respect to the irradiation axis. Thereby, by cooling and liquefying a gas target, it can return to a 1st storage part as a liquid target. Therefore, the efficiency of the nuclear reaction can be improved by increasing the amount of the liquid target.

可以構成為,在第2流路設置阻礙冷卻介質的流動之構件。此時,構件藉由阻礙冷卻介質在第2流路中的流動而使層流變成紊流,從而能夠提高冷卻效率。It may be configured such that a member that hinders the flow of the cooling medium is provided in the second flow path. At this time, the member blocks the flow of the cooling medium in the second flow path to change the laminar flow into a turbulent flow, thereby improving the cooling efficiency.

本發明的一形態之靶收納裝置,係收納能夠藉由照射粒子束而利用核反應製造放射性同位素之靶,其係具備:收納部,收納靶;第1流路,能夠讓冷卻介質流通,在對靶照射粒子束之情形下,從該粒子束的照射軸的一側對收納部進行冷卻;及第2流路,能夠讓冷卻介質流通,而透過相對於收納部圍繞照射軸設置之壁部的至少一部分,從該壁部的外周側對收納部進行冷卻。A target storage device according to an aspect of the present invention stores a target capable of producing a radioisotope through a nuclear reaction by irradiating a particle beam, and includes: a storage unit for storing the target; When the target is irradiated with a particle beam, the storage part is cooled from one side of the irradiation axis of the particle beam; At least a part of the storage portion is cooled from the outer peripheral side of the wall portion.

靶收納裝置具備第1流路,該第1流路能夠讓冷卻介質流通,而從粒子束的照射軸的一側對收納部進行冷卻。藉此,藉由使冷卻介質流過第1流路,能夠從照射軸的一側對收納部的靶進行冷卻。進而,靶收納裝置具備第2流路,該第2流路能夠讓冷卻介質流通,而透過相對於收納部圍繞照射軸設置之壁部的至少一部分,以照射軸為基準從比收納部更外側對收納部進行冷卻。此時,藉由使冷卻介質流過第2流路,能夠透過圍繞照射軸設置的壁部,從外周側對收納部的靶進行冷卻。如此,藉由第1流路及第2流路,能夠從不同方向對靶進行冷卻。因此,能夠提高靶的冷卻效率。 [發明之效果] The target storage device includes a first flow channel through which a cooling medium can flow to cool the storage unit from the side of the irradiation axis of the particle beam. Thereby, by making the cooling medium flow through the first flow path, it is possible to cool the target in the storage unit from one side of the irradiation axis. Furthermore, the target storage device is provided with a second flow path, which allows the cooling medium to flow through at least a part of the wall portion provided around the irradiation axis with respect to the storage portion, from outside the storage portion with the irradiation axis as a reference. The storage part is cooled. At this time, by passing the cooling medium through the second flow path, the target in the storage unit can be cooled from the outer peripheral side through the wall portion provided around the irradiation axis. In this way, the target can be cooled from different directions by the first flow path and the second flow path. Therefore, the cooling efficiency of the target can be improved. [Effect of Invention]

依本發明,可提供一種能夠提高冷卻效率之靶收納裝置及能夠提高核反應的效率之RI製造裝置。According to the present invention, it is possible to provide a target storage device capable of improving cooling efficiency and an RI manufacturing device capable of improving nuclear reaction efficiency.

以下,參閱圖式,對用以實施本發明的形態詳細地進行說明。另外,在圖式說明中,對相同的要素標註相同的元件符號,並省略重複說明。Hereinafter, referring to drawings, the form for carrying out this invention is demonstrated in detail. In addition, in the description of the drawings, the same reference numerals are attached to the same elements, and overlapping descriptions are omitted.

圖1係RI製造裝置1的剖面圖。RI製造裝置1具備作為本發明的RI製造裝置之實施形態的靶收納裝置10。RI製造裝置1為製造放射性同位素(RI)者。RI製造裝置1例如能夠作為PET用迴旋加速器來使用,由RI製造裝置1製造之RI例如用於製造作為放射性同位素標記化合物(RI化合物)的放射性藥劑(包括放射性醫藥品)。作為醫院等的PET檢查(正電子發射斷層攝影檢查)中所使用之放射性同位素標記化合物,有 18F-FLT(氟胸甘)、 18F-FMISO(氟米索硝唑)、 11C-雷氯必利(Raclopride)等。 FIG. 1 is a cross-sectional view of an RI manufacturing apparatus 1 . The RI manufacturing apparatus 1 is equipped with the target storage apparatus 10 which is an embodiment of the RI manufacturing apparatus of this invention. The RI production device 1 is for producing radioisotopes (RI). The RI manufacturing apparatus 1 can be used, for example, as a cyclotron for PET, and the RI manufactured by the RI manufacturing apparatus 1 is used to manufacture radiopharmaceuticals (including radiopharmaceuticals) which are radioisotope-labeled compounds (RI compounds), for example. Examples of radioactive isotope-labeled compounds used in PET examinations (positron emission tomography examinations) in hospitals and the like include 18 F-FLT (fluorothymidine), 18 F-FMISO (flumisonidazole), and 11 C-thyroxine. Clopride (Raclopride) and the like.

RI製造裝置1為所謂的自屏蔽體型粒子加速器系統,並且具備使帶電粒子加速的加速器(迴旋加速器)2和用以包圍該加速器2以屏蔽放射線之放射線屏蔽件(壁體)亦即自屏蔽體6。在由自屏蔽體6包圍而形成之內部空間S中,除了加速器2以外,還配置有用以製造RI之靶收納裝置10、用以使加速器2的內部成為真空的真空泵4等。進而,在內部空間中配置有加速器2的運轉所需之附屬品、靶收納裝置10的冷卻用之附屬機器等。The RI manufacturing apparatus 1 is a so-called self-shield type particle accelerator system, and includes an accelerator (cyclotron) 2 for accelerating charged particles and a radiation shield (wall) for shielding the accelerator 2 to shield radiation, that is, a self-shield. 6. In the internal space S surrounded by the self-shielding body 6, in addition to the accelerator 2, a target storage device 10 for manufacturing RI, a vacuum pump 4 for vacuuming the interior of the accelerator 2, and the like are disposed. Furthermore, accessories necessary for the operation of the accelerator 2, accessories for cooling the target storage device 10, and the like are arranged in the internal space.

加速器2為所謂的立式迴旋加速器,並且具有一對磁極、真空箱以及包圍該等一對磁極及真空箱之環狀軛。一對磁極的一部分在真空箱內以上表面彼此隔開既定間隔的方式相對置。在該等一對磁極的間隙內,氫離子等帶電粒子被多次加速。真空泵4為用以保持加速器2內的真空環境者,例如固定於加速器2的側部。加速器2在圖中朝箭頭B所示之照射方向射出帶電粒子粒子束。The accelerator 2 is a so-called vertical cyclotron, and has a pair of magnetic poles, a vacuum box, and an annular yoke surrounding the pair of magnetic poles and the vacuum box. A part of the pair of magnetic poles faces each other in the vacuum box with the upper surfaces separated by a predetermined interval. In the gap between the pair of magnetic poles, charged particles such as hydrogen ions are accelerated multiple times. The vacuum pump 4 is used to maintain the vacuum environment in the accelerator 2 , and is fixed on the side of the accelerator 2 , for example. The accelerator 2 emits a beam of charged particles in the irradiation direction indicated by arrow B in the figure.

靶收納裝置10為接收從加速器2照射之帶電粒子粒子束而製造RI者,在內部形成有收納原料(例如靶水; 18O水)之收納部。如圖1及圖2所示,靶收納裝置10通常固定於加速器2的側部。本實施形態的RI製造裝置1具備隔著加速器2配置於兩側之2個靶收納裝置10。例如,配置於圖示左側之靶收納裝置10配置於上層側,配置於圖示右側之靶收納裝置10配置於下層側(參閱圖2)。靶收納裝置10被設置於加速器2之靶屏蔽件7覆蓋。自屏蔽體6由複數個零件構成並且形成為覆蓋加速器2及靶收納裝置10。 The target storage device 10 receives the charged particle beam irradiated from the accelerator 2 to manufacture RI, and has a storage section for storing raw materials (for example, target water; 18 O water) inside. As shown in FIGS. 1 and 2 , the target storage device 10 is usually fixed to the side of the accelerator 2 . The RI manufacturing apparatus 1 of the present embodiment includes two target storage devices 10 disposed on both sides of the accelerator 2 . For example, the target storage device 10 arranged on the left side of the drawing is arranged on the upper side, and the target storage device 10 arranged on the right side of the drawing is arranged on the lower side (see FIG. 2 ). The target storage device 10 is covered by the target shield 7 provided in the accelerator 2 . The self-shielding body 6 is composed of a plurality of parts and is formed to cover the accelerator 2 and the target storage device 10 .

接著,參閱圖3及圖4,對本發明的RI製造裝置1所具備之上述靶收納裝置10進一步詳細地進行說明。圖3係本實施形態之靶收納裝置10的剖面圖。圖3係在照射軸RL的位置將靶收納裝置10切斷之剖面圖。圖4係將靶收納裝置10的一部分切斷之剖面立體圖。主要參閱圖3,適當參閱圖4。Next, referring to FIG. 3 and FIG. 4 , the above-mentioned target storage device 10 included in the RI manufacturing apparatus 1 of the present invention will be described in more detail. Fig. 3 is a cross-sectional view of the target storage device 10 of this embodiment. FIG. 3 is a cross-sectional view of the target storage device 10 cut at the position of the irradiation axis RL. FIG. 4 is a cutaway perspective view of a part of the target storage device 10 . Refer primarily to FIG. 3 , and to FIG. 4 as appropriate.

如圖3所示,本實施形態之靶收納裝置10具備箔2、收納部3及冷卻機構4A、4B。放射性同位素製造裝置具備上述靶收納裝置10和未圖示的加速器。作為加速器例如採用迴旋加速器等,該加速器生成帶電粒子束(以下,稱為“粒子束”。),所生成之粒子束B沿著照射軸RL照射到靶收納裝置10。作為照射到靶收納裝置10之粒子束B,例如,可舉出質子束、氘核束等粒子束。靶收納裝置10透過配置於其與加速器之間之歧管(未圖示)安裝於導出加速器的粒子束B之導出口。另外,在以下說明中,有時將照射軸RL所延伸之方向稱為靶收納裝置10的縱深方向D1。又,有時將在縱深方向D1上照射粒子束B的一側(粒子束的行進方向的上游側)稱為靶收納裝置10的前側,將與其相反的一側稱為靶收納裝置10的後側。又,有時將與靶收納裝置10的縱深方向D1及上下方向正交之方向稱為寬度方向D2。As shown in FIG. 3 , the target storage device 10 of the present embodiment includes the foil 2 , the storage unit 3 , and cooling mechanisms 4A, 4B. The radioisotope manufacturing apparatus includes the aforementioned target storage device 10 and an accelerator not shown. As an accelerator, for example, a cyclotron or the like is used, which generates a charged particle beam (hereinafter referred to as “particle beam”), and the generated particle beam B is irradiated to the target storage device 10 along the irradiation axis RL. As the particle beam B irradiated to the target storage device 10 , for example, particle beams such as proton beams and deuteron beams can be mentioned. The target storage device 10 is attached to the outlet of the particle beam B leading out of the accelerator through a manifold (not shown) arranged between it and the accelerator. In addition, in the following description, the direction in which the irradiation axis RL extends may be referred to as the depth direction D1 of the target storage device 10 . In addition, the side on which the particle beam B is irradiated in the depth direction D1 (the upstream side in the traveling direction of the particle beam) may be referred to as the front side of the target storage device 10, and the opposite side may be referred to as the rear side of the target storage device 10. side. Moreover, the direction orthogonal to the depth direction D1 of the target storage apparatus 10, and the up-down direction may be called width direction D2.

又,在對位置關係進行說明時,有時使用以照射軸RL為基準的“外側”“內側”之用語。以照射軸RL為基準的外側為在與照射軸RL正交之方向上與照射軸RL的距離遠的一側。有時將以照射軸RL為基準的外側簡稱為“外周側”。以照射軸RL為基準的內側為在與照射軸RL正交之方向上與照射軸RL的距離近的一側。有時將以照射軸RL為基準的內側簡稱為“內周側”。In addition, when describing the positional relationship, the terms "outside" and "inside" based on the irradiation axis RL may be used. The outer side with respect to the irradiation axis RL is the side farther away from the irradiation axis RL in the direction perpendicular to the irradiation axis RL. The outer side with respect to the irradiation axis RL may be simply referred to as "outer peripheral side". The inner side with respect to the irradiation axis RL is the side closer to the irradiation axis RL in the direction perpendicular to the irradiation axis RL. The inner side with respect to the irradiation axis RL may be simply referred to as "inner peripheral side".

靶收納裝置10例如具有圓柱狀的外形。靶收納裝置10具備:靶容器12,主要用以形成收納部3;冷卻機構形成構件13,主要用以形成冷卻機構4A;以及內環14及外環15,主要用以形成冷卻機構4B。前表面凸緣11、靶容器12及冷卻機構形成構件13由金屬製塊體構成。又,前表面凸緣11、靶容器12及冷卻機構形成構件13在縱深方向D1上從前側朝向後側依次重疊。The target storage device 10 has, for example, a cylindrical outer shape. The target storage device 10 includes a target container 12 mainly for forming the storage unit 3 , a cooling mechanism forming member 13 mainly for forming the cooling mechanism 4A, and an inner ring 14 and an outer ring 15 mainly for forming the cooling mechanism 4B. The front flange 11, the target container 12, and the cooling mechanism forming member 13 are constituted by a metal block. Moreover, the front surface flange 11, the target container 12, and the cooling mechanism forming member 13 are overlapped sequentially from the front side toward the rear side in the depth direction D1.

箔2為在前側分隔收納部3之構件。箔2設置於靶容器12。箔2允許粒子束B通過,另一方面,阻擋液體靶101、He氣體等流體的通過。因此,粒子束B照射到箔2之後,通過該箔2而照射到液體靶101。例如,將He氣體噴吹到箔2的前表面,用作箔2的冷卻用氣體。箔2例如為由Ti等金屬或合金形成之薄箔,其厚度成為10μm~50μm左右。箔2設置成至少覆蓋收納部3的整個區域。The foil 2 is a member that partitions the storage portion 3 on the front side. The foil 2 is placed on the target container 12 . The foil 2 allows the particle beam B to pass, but blocks the liquid target 101 , He gas, and other fluids from passing through. Therefore, after the particle beam B is irradiated to the foil 2 , it is irradiated to the liquid target 101 through the foil 2 . For example, He gas is blown onto the front surface of the foil 2 and used as a cooling gas for the foil 2 . The foil 2 is, for example, a thin foil formed of a metal such as Ti or an alloy, and has a thickness of about 10 μm to 50 μm. The foil 2 is arranged to cover at least the entire area of the receptacle 3 .

收納部3為收納液體靶101的部分。收納部3由被形成於靶容器12之凹部22、形成於靶容器12並與凹部22連通之空腔部25及箔2包圍之空間構成。靶容器12例如能夠由Nb形成。在收納部3內封入 18O(靶水)作為液體靶101。凹部22從靶容器12的前表面中例如用於固定箔2之固定面12a向縱深方向D1上的後側凹陷。凹部22具有底面22a和從該底面22a的外周緣向縱深方向D1上的前側延伸之周面22b。從縱深方向D1觀察時,收納部3呈圓形(參閱圖4)。空腔部25為從凹部22的上端向斜上方延伸之空間。空腔部25傾斜成隨著朝向縱深方向D1上的後側而向上延伸。空腔部25與凹部22的上端連通。從縱深方向D1觀察時,空腔部25具有扇形形狀(參閱圖5)。 The storage unit 3 is a part for housing the liquid target 101 . The housing portion 3 is constituted by a space surrounded by a recess 22 formed in the target container 12 , a cavity portion 25 formed in the target container 12 and communicating with the recess 22 , and the foil 2 . The target container 12 can be formed of Nb, for example. 18 O (target water) was sealed in the storage part 3 as the liquid target 101 . The recessed part 22 is recessed from the front surface of the target container 12, for example, the fixing surface 12a for fixing the foil 2 toward the rear side in the depth direction D1. The concave portion 22 has a bottom surface 22a and a peripheral surface 22b extending from the outer peripheral edge of the bottom surface 22a toward the front side in the depth direction D1. The accommodating part 3 is circular when viewed from the depth direction D1 (see FIG. 4 ). The cavity portion 25 is a space extending obliquely upward from the upper end of the concave portion 22 . The cavity portion 25 is inclined to extend upward toward the rear side in the depth direction D1. The cavity portion 25 communicates with the upper end of the recessed portion 22 . The cavity portion 25 has a sector shape when viewed from the depth direction D1 (see FIG. 5 ).

在靶容器12形成有用以向收納部3內導入惰性氣體(例如He氣體)之氣體導入孔(未圖示)。在靶容器12形成有流通孔26(參閱圖4),該流通孔26在收納部3內填充液體靶101時被利用,並且在排出收納部3內的液體靶101時被利用。A gas introduction hole (not shown) for introducing an inert gas (for example, He gas) into the storage portion 3 is formed in the target container 12 . The target container 12 is formed with a circulation hole 26 (see FIG. 4 ), which is used when the liquid target 101 is filled in the storage unit 3 and is used when the liquid target 101 in the storage unit 3 is discharged.

收納部3具有第1收納部分E1,收納液體靶101;及第2收納部分E2,位於第1收納部分E1的上方並且接收沸騰的液體靶101蒸發而成之氣體靶。第2收納部分E2呈連續地形成於第1收納部分E1的上側。在此,由凹部22形成之空間相當於第1收納部分E1,由空腔部25形成之空間相當於第2收納部分E2。The storage unit 3 has a first storage part E1 for storing the liquid target 101 ; and a second storage part E2 for receiving the gas target evaporated from the boiling liquid target 101 and located above the first storage part E1 . The second storage portion E2 is continuously formed above the first storage portion E1. Here, the space formed by the recessed part 22 corresponds to the 1st storage part E1, and the space formed by the cavity part 25 corresponds to the 2nd storage part E2.

冷卻機構4A在與對液體靶101照射之粒子束B的照射方向相反的一側(亦即,後面側)利用冷卻介質對收納部3進行冷卻。冷卻機構4A具備對第1收納部分E1進行冷卻之第1冷卻部30A及對第2收納部分E2進行冷卻之第2冷卻部30B。第1冷卻部30A具備配置於第1內部空間31A(第1流路)之噴嘴部32A。又,第2冷卻部30B具備配置於第2內部空間31B(第1流路)之噴嘴部32B。The cooling mechanism 4A cools the housing part 3 with a cooling medium on the side opposite to the irradiation direction of the particle beam B irradiated on the liquid target 101 (that is, the rear side). 4 A of cooling mechanisms are equipped with the 1st cooling part 30A which cools the 1st storage part E1, and the 2nd cooling part 30B which cools the 2nd storage part E2. 30 A of 1st cooling parts are provided with the nozzle part 32A arrange|positioned in 31 A of 1st internal spaces (1st flow path). Moreover, the 2nd cooling part 30B is provided with the nozzle part 32B arrange|positioned in the 2nd internal space 31B (1st flow path).

第1內部空間31A及第2內部空間31B為用以使冷卻介質在內部流動之空間。第1內部空間31A及第2內部空間31B,係藉由在靶容器12的後側的凹部30安裝冷卻機構形成構件13而由靶容器12與冷卻機構形成構件13之間的空間構成。第1內部空間31A相對於收納部3的第1收納部分E1形成於縱深方向D1上的後側。第2內部空間31B相對於收納部3的第2收納部分E2形成於縱深方向D1上的後側。亦即,第2內部空間31B設置於第1內部空間31A的上側。在內部空間31A與第1收納部分E1之間設置有傳熱壁部34A。在內部空間31B與第2收納部分E2之間設置有傳熱壁部34B。又,第1內部空間31A和第2內部空間31B由分隔壁36彼此分隔。The first internal space 31A and the second internal space 31B are spaces for a cooling medium to flow inside. The first internal space 31A and the second internal space 31B are constituted by the space between the target container 12 and the cooling mechanism forming member 13 by attaching the cooling mechanism forming member 13 to the concave portion 30 on the rear side of the target container 12 . The first internal space 31A is formed on the rear side in the depth direction D1 with respect to the first storage portion E1 of the storage unit 3 . The second internal space 31B is formed on the rear side in the depth direction D1 with respect to the second storage portion E2 of the storage unit 3 . That is, the second internal space 31B is provided above the first internal space 31A. The heat transfer wall part 34A is provided between the internal space 31A and the 1st accommodation part E1. The heat transfer wall part 34B is provided between the internal space 31B and the 2nd storage part E2. Also, the first internal space 31A and the second internal space 31B are partitioned from each other by a partition wall 36 .

第1噴嘴部32A為對其與第1收納部分E1之間的傳熱壁部34A噴射冷卻介質之構件。第1噴嘴部32A對於傳熱壁部34垂直地噴射冷卻介質。第1噴嘴部32A與傳熱壁部34分開。第2噴嘴部32B為對其與第2收納部分E2之間的傳熱壁部34B噴射冷卻介質之構件。第2噴嘴部32B相對於傳熱壁部34B垂直地噴射冷卻介質。第2噴嘴部32B與傳熱壁部34B分開。1st nozzle part 32A is a member which sprays a cooling medium to 34 A of heat transfer wall parts between it and 1st storage part E1. The first nozzle portion 32A sprays the cooling medium vertically to the heat transfer wall portion 34 . The first nozzle portion 32A is separated from the heat transfer wall portion 34 . The 2nd nozzle part 32B is a member which sprays a cooling medium to the heat transfer wall part 34B between it and the 2nd storage part E2. The second nozzle portion 32B sprays the cooling medium vertically with respect to the heat transfer wall portion 34B. The second nozzle portion 32B is separated from the heat transfer wall portion 34B.

接著,對冷卻機構4B進行說明。首先,在靶容器12中,以圍繞照射軸RL包圍收納部3之方式安裝內環14。因此,在靶容器12中,以能夠從外周側安裝內環14之方式形成圓環狀凹部40(尤其,參閱圖4)。另外,內環14具有被分割成半圓狀構件14A、14B之分半結構,從外周側安裝於凹部40(參閱圖5)。內環14呈剖面為大致四角形之圓環狀。但是,在與空腔部25相對應之部位,內環14的內徑局部減小(參閱圖5),在內周側形成傾斜面14b(參閱圖4)。在靶容器12形成有與內環14在後側相對置之座面40a。外環15安裝於座面40a,以從外周側支承安裝於凹部40的內環14。Next, the cooling mechanism 4B will be described. First, the inner ring 14 is attached to the target container 12 so as to surround the housing portion 3 around the irradiation axis RL. Therefore, in the target container 12, the annular recessed part 40 is formed so that the inner ring 14 can be attached from the outer peripheral side (refer especially to FIG. 4). In addition, the inner ring 14 has a half structure divided into semicircular members 14A and 14B, and is attached to the recess 40 from the outer peripheral side (see FIG. 5 ). The inner ring 14 is in the shape of a ring having a substantially square cross section. However, at a portion corresponding to the cavity portion 25, the inner diameter of the inner ring 14 is partially reduced (see FIG. 5), and an inclined surface 14b is formed on the inner peripheral side (see FIG. 4). The target container 12 is formed with a seating surface 40 a facing the inner ring 14 on the rear side. The outer ring 15 is attached to the seat surface 40a so as to support the inner ring 14 attached to the concave portion 40 from the outer peripheral side.

靶容器12在收納部3的凹部22的位置具有與內環14的內周面14a相對置之壁部。該壁部構成為第1收納部分E1的圍繞照射軸RL所形成之傳熱壁部41。傳熱壁部41形成為圓筒狀的薄壁部。又,靶容器12在空腔部25的位置具有與內環14的傾斜面14b相對置之壁部。該壁部構成為第2收納部分E2的圍繞照射軸RL所形成之傳熱壁部42。傳熱壁部41在相對於傳熱壁部34B在外周側相對置之位置形成為薄壁部。從縱深方向觀察時傳熱壁部42形成為扇狀,傳熱壁部41形成於除了傳熱壁部42以外的部分的整周(參閱圖5)。另外,在傳熱壁部41與傳熱壁部42之間形成從座面40a朝向傳熱壁部42立起之段差壁部44(參閱圖5)。The target container 12 has a wall portion facing the inner peripheral surface 14 a of the inner ring 14 at the position of the recessed portion 22 of the housing portion 3 . This wall part is comprised as the heat transfer wall part 41 formed around the irradiation axis RL of the 1st storage part E1. The heat transfer wall portion 41 is formed as a cylindrical thin portion. Moreover, the target container 12 has a wall portion facing the inclined surface 14 b of the inner ring 14 at the position of the cavity portion 25 . This wall part is comprised as the heat transfer wall part 42 formed around the irradiation axis RL of the 2nd storage part E2. The heat transfer wall portion 41 is formed as a thin portion at a position facing the heat transfer wall portion 34B on the outer peripheral side. The heat transfer wall portion 42 is formed in a fan shape when viewed from the depth direction, and the heat transfer wall portion 41 is formed over the entire circumference except for the heat transfer wall portion 42 (see FIG. 5 ). Moreover, the step wall part 44 which stands up toward the heat transfer wall part 42 from the seat surface 40a is formed between the heat transfer wall part 41 and the heat transfer wall part 42 (refer FIG. 5).

在第1收納部分E1周圍的傳熱壁部41與內環14的內周面14a之間形成用以使冷卻介質流動之冷卻流路46(第2流路)。收納部3的第1收納部分E1以照射軸RL為基準設置於比傳熱壁部41更內側。又,冷卻流路46以照射軸RL為基準設置於比傳熱壁部41更外側。因此,冷卻流路46能夠讓冷卻介質流通,而透過相對於收納部3圍繞照射軸RL設置之傳熱壁部41,以照射軸RL為基準從比收納部3的第1收納部分E1更外側對收納部3的第1收納部分E1進行冷卻。冷卻流路46能夠讓冷卻介質流通,而透過相對於收納部3圍繞照射軸RL設置之傳熱壁部41,從該傳熱壁部41的外周側對收納部3的第1收納部分E1進行冷卻。冷卻流路46能夠對收納部3中的可收納液體靶101的第1收納部分E1進行冷卻。依據這樣的結構,冷卻流路46能夠讓冷卻介質流通,而透過傳熱壁部41,以照射軸RL為基準從內側向外側,從收納部3的第1收納部分E1進行排熱。A cooling flow path 46 (second flow path) for flowing a cooling medium is formed between the heat transfer wall portion 41 around the first housing portion E1 and the inner peripheral surface 14a of the inner ring 14 . The first storage part E1 of the storage part 3 is provided inside the heat transfer wall part 41 on the basis of the irradiation axis RL. Furthermore, the cooling flow path 46 is provided outside the heat transfer wall portion 41 with respect to the irradiation axis RL. Therefore, the cooling flow path 46 can allow the cooling medium to flow through the heat transfer wall portion 41 provided around the irradiation axis RL relative to the storage unit 3, and from the outer side of the first storage portion E1 of the storage unit 3 with the radiation axis RL as a reference. The first storage portion E1 of the storage unit 3 is cooled. The cooling flow path 46 allows the cooling medium to flow through the heat transfer wall part 41 provided around the irradiation axis RL relative to the storage part 3, and conducts heat transfer to the first storage part E1 of the storage part 3 from the outer peripheral side of the heat transfer wall part 41. cool down. The cooling flow path 46 can cool the first storage portion E1 in the storage unit 3 in which the liquid target 101 can be stored. With such a configuration, the cooling flow path 46 allows the cooling medium to flow through the heat transfer wall portion 41 to discharge heat from the first storage portion E1 of the storage portion 3 from the inside to the outside with respect to the irradiation axis RL.

在第2收納部分E2周圍的傳熱壁部42與內環14的傾斜面14b之間形成用以使冷卻介質流動之冷卻流路48(第2流路)。收納部3的第2收納部分E2以照射軸RL為基準設置於比傳熱壁部42更內側的。又,冷卻流路48以照射軸RL為基準設置於比傳熱壁部42更外側。因此,冷卻流路48能夠讓冷卻介質流通,而透過相對於收納部3圍繞照射軸RL設置之傳熱壁部42,以照射軸RL為基準從比收納部3的第2收納部分E2更外側對收納部3的第2收納部分E2進行冷卻。冷卻流路48能夠讓冷卻介質流通,而透過相對於收納部3圍繞照射軸RL設置之傳熱壁部42,從該傳熱壁部42的外周側對收納部3的第2收納部分E2進行冷卻。冷卻流路48能夠對收納部3中的可收納氣體靶102之第2收納部分E2進行冷卻。冷卻流路48能夠隔著第2收納部分E2從照射軸RL之與內部空間31B相反的一側對收納部3的第2收納部分E2進行冷卻。依據這樣的結構,冷卻流路48能夠讓冷卻介質流通,而透過傳熱壁部42,以照射軸RL為基準從內側向外側,從收納部3的第2收納部分E2進行排熱。另外,第2內部空間31B能夠讓冷卻介質流通,而透過相對於收納部3圍繞照射軸RL設置之傳熱壁部34B,以照射軸RL為基準從比收納部3的第2收納部分E2更內側對收納部3的第2收納部分E2進行冷卻。第2內部空間31B能夠讓冷卻介質流通,而透過傳熱壁部34B,以照射軸RL為基準從外側向內側,從收納部3的第2收納部分E2進行排熱。A cooling flow path 48 (second flow path) for flowing a cooling medium is formed between the heat transfer wall portion 42 around the second housing portion E2 and the inclined surface 14b of the inner ring 14 . The second storage portion E2 of the storage unit 3 is provided on the inner side of the heat transfer wall portion 42 on the basis of the irradiation axis RL. Moreover, the cooling flow path 48 is provided outside the heat transfer wall portion 42 with respect to the irradiation axis RL. Therefore, the cooling flow path 48 can allow the cooling medium to flow through the heat transfer wall portion 42 provided around the irradiation axis RL with respect to the accommodation portion 3, and from the outer side of the second storage portion E2 of the storage portion 3 with the irradiation axis RL as a reference. The second storage portion E2 of the storage unit 3 is cooled. The cooling flow path 48 allows the cooling medium to flow through the heat transfer wall part 42 provided around the irradiation axis RL relative to the storage part 3, and conducts heat transfer to the second storage part E2 of the storage part 3 from the outer peripheral side of the heat transfer wall part 42. cool down. The cooling flow path 48 can cool the second storage portion E2 in the storage unit 3 where the gas target 102 can be stored. The cooling flow path 48 can cool the second storage part E2 of the storage part 3 from the side opposite to the internal space 31B of the irradiation axis RL via the second storage part E2 . According to such a structure, the cooling flow path 48 allows the cooling medium to flow through the heat transfer wall portion 42 to discharge heat from the second storage portion E2 of the storage portion 3 from the inside to the outside on the basis of the radiation axis RL. In addition, the second internal space 31B can allow the cooling medium to circulate, and pass through the heat transfer wall portion 34B provided around the irradiation axis RL with respect to the housing portion 3, and from the second storage portion E2 of the housing portion 3 on the basis of the radiation axis RL The inside cools the second storage portion E2 of the storage unit 3 . The second internal space 31B allows the cooling medium to flow, and through the heat transfer wall portion 34B, heat is released from the second storage portion E2 of the storage unit 3 from the outside to the inside based on the irradiation axis RL.

另外,在座面40a與內環14之間形成與冷卻流路46連通之流路47。該流路47與冷卻介質的供給管51及排出管52連通。因此,流路47是對於冷卻流路46、48進行冷卻介質的供給及回收。In addition, a flow path 47 communicating with the cooling flow path 46 is formed between the seat surface 40 a and the inner ring 14 . The flow path 47 communicates with a cooling medium supply pipe 51 and a discharge pipe 52 . Therefore, the flow path 47 supplies and recovers the cooling medium to the cooling flow paths 46 and 48 .

接著,參閱圖3及圖5,對相對於冷卻流路46、48的冷卻介質的流動進行說明。另外,供給管51及排出管52設置於座面40a中的下端附近的區域。又,在供給管51與排出管52之間設置阻擋冷卻介質的流動之分隔壁54。首先,從供給管51供給之冷卻介質流過流路47(F1)而供給到冷卻流路46。藉此,一部分冷卻介質流過冷卻流路46(F2)。在段差壁部44中,冷卻介質以越過該段差壁部44之方式流動(F3)而供給到冷卻流路48。藉此,冷卻介質流過冷卻流路48(F4)。在下一個段差壁部44中,冷卻介質以在該段差壁部44流下之方式流動(F5)而供給到冷卻流路46及流路47。藉此,冷卻介質流過冷卻流路46(F6),並流過冷卻流路47(F7)。Next, the flow of the cooling medium to the cooling channels 46 and 48 will be described with reference to FIGS. 3 and 5 . In addition, the supply pipe 51 and the discharge pipe 52 are provided in a region near the lower end of the seat surface 40a. Furthermore, a partition wall 54 that blocks the flow of the cooling medium is provided between the supply pipe 51 and the discharge pipe 52 . First, the cooling medium supplied from the supply pipe 51 flows through the flow path 47 ( F1 ) and is supplied to the cooling flow path 46 . Thereby, a part of the cooling medium flows through the cooling flow path 46 (F2). In the stepped wall portion 44 , the cooling medium flows ( F3 ) over the stepped wall portion 44 and is supplied to the cooling flow path 48 . Thereby, the cooling medium flows through the cooling flow path 48 (F4). In the next step wall portion 44 , the cooling medium flows down the step wall portion 44 ( F5 ), and is supplied to the cooling flow path 46 and the flow path 47 . Thereby, the cooling medium flows through the cooling flow path 46 (F6), and then flows through the cooling flow path 47 (F7).

接著,對本實施形態之RI製造裝置1及靶收納裝置10的作用效果進行說明。Next, the operation effect of the RI production apparatus 1 and the target storage apparatus 10 of this embodiment are demonstrated.

RI製造裝置1具備內部空間31A、31B,該內部空間31A、31B能夠讓冷卻介質流通,而從粒子束B的照射軸RL的一側(後側)對收納部3進行冷卻。藉此,藉由使冷卻介質流過內部空間31A、31B,能夠從照射軸RL的一側對收納部3的靶進行冷卻。進而,RI製造裝置1具備冷卻流路46、48,該冷卻流路46、48能夠讓冷卻介質流通,而透過相對於收納部3圍繞照射軸RL設置之傳熱壁部41、42,以照射軸RL為基準從比收納部3更外側對收納部3進行冷卻。此時,藉由使冷卻介質流過冷卻流路46、48,透過圍繞照射軸RL設置的傳熱壁部41、42,以照射軸RL為基準從內側向外側,從收納部3進行排熱,藉此能夠對收納部3的靶進行冷卻。如此,藉由內部空間31A、31B及冷卻流路46、48,能夠從不同方向對靶進行冷卻。因此,能夠提高靶的冷卻效率,藉此能夠提高靶的核反應的效率。The RI manufacturing apparatus 1 includes internal spaces 31A, 31B through which a cooling medium can flow, and cools the storage unit 3 from the side (rear side) of the irradiation axis RL of the particle beam B. Thereby, the target of the storage part 3 can be cooled from the irradiation axis RL side by making a cooling medium flow into internal space 31A, 31B. Furthermore, the RI manufacturing apparatus 1 is equipped with cooling flow paths 46, 48 which allow the cooling medium to flow through the heat transfer wall portions 41, 42 provided around the irradiation axis RL with respect to the housing portion 3 to irradiate. The storage part 3 is cooled from the outside of the storage part 3 based on the axis RL. At this time, by making the cooling medium flow through the cooling channels 46, 48, passing through the heat transfer wall portions 41, 42 provided around the irradiation axis RL, the heat is released from the housing portion 3 from the inside to the outside with the irradiation axis RL as a reference. , thereby cooling the target in the storage unit 3 . In this way, the target can be cooled from different directions by the internal spaces 31A, 31B and the cooling channels 46 , 48 . Therefore, the cooling efficiency of the target can be improved, whereby the efficiency of the nuclear reaction of the target can be improved.

可以構成為,冷卻流路46能夠對收納部3中的可收納液體靶101的第1收納部分E1進行冷卻。此時,冷卻流路46對藉由照射粒子束B而成為高溫之液體靶101進行冷卻,藉此能夠抑制液體靶101的蒸發。因此,能夠提高液體靶101的核反應的效率。The cooling flow path 46 may be configured to be capable of cooling the first storage portion E1 in the storage unit 3 in which the liquid target 101 can be stored. At this time, the cooling channel 46 cools the liquid target 101 , which has become high in temperature due to the irradiation of the particle beam B, whereby evaporation of the liquid target 101 can be suppressed. Therefore, the efficiency of the nuclear reaction of the liquid target 101 can be improved.

可以構成為,冷卻流路48能夠對收納部3中的可收納氣體靶102之第2收納部分E2進行冷卻。此時,冷卻流路48對氣體靶102進行冷卻,藉此能夠使其液化。因此,能夠藉由增加液體靶101的量來提高核反應的效率。The cooling flow path 48 may be configured to be able to cool the second storage portion E2 in the storage unit 3 in which the gas target 102 can be stored. At this time, the cooling channel 48 can cool the gas target 102 to be liquefied. Therefore, the efficiency of the nuclear reaction can be improved by increasing the amount of the liquid target 101 .

可以構成為,收納部3具有:第1收納部分E1,能夠收納液體靶101;及第2收納部分E2,與第1收納部分E1連通而能夠收納氣體靶102,冷卻流路48能夠隔著第2收納部分E2從照射軸RL之與內部空間31B相反的一側對收納部3進行冷卻。此時,第1收納部分E1的液體靶101被照射粒子束B而蒸發,成為氣體靶102貯存於第2收納部分E2。對此,內部空間31B和冷卻流路48能夠相對於照射軸RL從兩側對氣體靶102進行冷卻。藉此,藉由對氣體靶102進行冷卻而使其液化,能夠成為液體靶101返回到第1收納部分E1。因此,能夠藉由增加液體靶101的量來提高核反應的效率。The storage unit 3 may be configured to include: a first storage portion E1 capable of storing the liquid target 101; and a second storage portion E2 communicating with the first storage portion E1 and capable of storing the gas target 102, and the cooling flow path 48 can accommodate the gas target 102 via the second storage portion E1. The housing part E2 cools the housing part 3 from the side opposite to the internal space 31B of the irradiation axis RL. At this time, the liquid target 101 in the first storage part E1 is irradiated with the particle beam B to be evaporated, and the gas target 102 is stored in the second storage part E2. In contrast, the internal space 31B and the cooling channel 48 can cool the gas target 102 from both sides with respect to the irradiation axis RL. Thereby, by cooling and liquefying the gas target 102, the liquid target 101 can be returned to the 1st storage part E1. Therefore, the efficiency of the nuclear reaction can be improved by increasing the amount of the liquid target 101 .

又,靶收納裝置10具備內部空間31A、31B,該內部空間31A、31B能夠讓冷卻介質流通,而從粒子束B的照射軸RL的一側(後側)對收納部3進行冷卻。藉此,藉由使冷卻介質流過內部空間31A、31B,能夠從照射軸RL的一側對收納部3的靶進行冷卻。進而,靶收納裝置10具備冷卻流路46、48,該冷卻流路46、48能夠讓冷卻介質流通,而透過相對於收納部3圍繞照射軸RL設置之傳熱壁部41、42,以照射軸RL為基準從比收納部3更外側對收納部3進行冷卻。此時,藉由使冷卻介質流過冷卻流路46、48,透過圍繞照射軸RL設置的傳熱壁部41、42,以照射軸RL為基準從內側向外側,從收納部3進行排熱,藉此能夠對收納部3的靶進行冷卻。如此,藉由內部空間31A、31B及冷卻流路46、48,能夠從不同方向對靶進行冷卻。因此,能夠提高靶的冷卻效率,藉此能夠提高靶的核反應的效率。因此,能夠提高靶的冷卻效率。Furthermore, the target storage device 10 includes internal spaces 31A and 31B through which a cooling medium can flow and cools the storage unit 3 from the irradiation axis RL side (rear side) of the particle beam B. Thereby, the target of the storage part 3 can be cooled from the irradiation axis RL side by making a cooling medium flow into internal space 31A, 31B. Furthermore, the target storage device 10 is equipped with cooling flow paths 46, 48, and the cooling flow paths 46, 48 allow a cooling medium to flow through the heat transfer wall portions 41, 42 provided around the irradiation axis RL relative to the storage portion 3 to irradiate The storage part 3 is cooled from the outside of the storage part 3 based on the axis RL. At this time, by making the cooling medium flow through the cooling channels 46, 48, passing through the heat transfer wall portions 41, 42 provided around the irradiation axis RL, the heat is released from the housing portion 3 from the inside to the outside with the irradiation axis RL as a reference. , thereby cooling the target in the storage unit 3 . In this way, the target can be cooled from different directions by the internal spaces 31A, 31B and the cooling channels 46 , 48 . Therefore, the cooling efficiency of the target can be improved, whereby the efficiency of the nuclear reaction of the target can be improved. Therefore, the cooling efficiency of the target can be improved.

本發明並不限定於上述實施形態。The present invention is not limited to the above-mentioned embodiments.

例如,可以在冷卻流路46、48設置阻礙冷卻介質的流動之構件。此時,構件藉由阻礙冷卻介質在冷卻流路46、48中的流動而使層流變成紊流,從而能夠提高冷卻效率。例如,如圖6所示,在內環14的內周面14a及傳熱壁部41中的至少一者上設置阻礙冷卻介質的流動之構件60。此時,藉由構件60在冷卻流路46內形成狹縫。利用這樣的狹縫結構阻礙流動,藉此冷卻介質成為紊流。For example, a member that hinders the flow of the cooling medium may be provided in the cooling channels 46 and 48 . At this time, the member obstructs the flow of the cooling medium in the cooling channels 46 and 48 to change the laminar flow into a turbulent flow, thereby improving the cooling efficiency. For example, as shown in FIG. 6 , at least one of the inner peripheral surface 14 a of the inner ring 14 and the heat transfer wall portion 41 is provided with a member 60 that hinders the flow of the cooling medium. At this time, slits are formed in the cooling flow path 46 by the member 60 . The flow is hindered by such a slit structure, whereby the cooling medium becomes a turbulent flow.

本發明的RI製造裝置及靶收納裝置之具體結構並不限定於上述實施形態。The specific configurations of the RI production apparatus and the target storage apparatus of the present invention are not limited to the above-mentioned embodiments.

對於冷卻流路46、48,只要設置其中至少一者即可,可以省略另一者。As for the cooling channels 46 and 48, at least one of them may be provided, and the other may be omitted.

1:RI製造裝置 3:收納部 10:靶收納裝置 31A,31B:內部空間(第1流路) 41,42:傳熱壁部 46,48:冷卻流路(第2流路) 1: RI manufacturing device 3: storage department 10: Target storage device 31A, 31B: Internal space (1st channel) 41,42: heat transfer wall 46,48: Cooling flow path (2nd flow path)

[圖1]係本發明的實施形態之RI製造裝置之剖面圖。 [圖2]係RI製造裝置之俯視圖。 [圖3]係本實施形態之靶收納裝置之剖面圖。 [圖4]係靶收納裝置之立體圖。 [圖5]係說明靶收納裝置之冷卻介質的流動之圖。 [圖6]係冷卻流路的放大圖。 [ Fig. 1 ] is a cross-sectional view of an RI manufacturing apparatus according to an embodiment of the present invention. [FIG. 2] It is a top view of the RI manufacturing apparatus. [ Fig. 3 ] is a cross-sectional view of a target storage device according to this embodiment. [Fig. 4] It is a perspective view of the target storage device. [FIG. 5] It is a figure explaining the flow of the cooling medium of a target accommodation apparatus. [ Fig. 6 ] An enlarged view of a cooling flow path.

2:箔 2: Foil

3:收納部 3: storage department

4A:冷卻機構 4A: cooling mechanism

4B:冷卻機構 4B: cooling mechanism

10:靶收納裝置 10: Target storage device

12:靶容器 12: Target container

12a:固定面 12a: Fixed surface

13:冷卻機構形成構件 13: The cooling mechanism forms a component

14:內環 14: inner ring

14a:內周面 14a: inner peripheral surface

14b:傾斜面 14b: Inclined surface

15:外環 15: outer ring

22:凹部 22: Concave

22a:底面 22a: bottom surface

22b:周面 22b: Perimeter

25:空腔部 25: cavity part

30:凹部 30: Concave

30A:第1冷卻部 30A: 1st cooling unit

30B:第2冷卻部 30B: The second cooling section

31A,31B:內部空間 31A, 31B: inner space

32A:噴嘴部 32A: Nozzle part

32B:噴嘴部 32B: nozzle part

34A:傳熱壁部 34A: heat transfer wall

34B:傳熱壁部 34B: heat transfer wall

36:分隔壁 36: Partition wall

40:凹部 40: concave part

40a:座面 40a: seat surface

41,42:傳熱壁部 41,42: heat transfer wall

46,48:冷卻流路 46,48: cooling flow path

47:流路 47: flow path

51:供給管 51: supply pipe

52:排出管 52: discharge pipe

101:液體靶 101: Liquid target

102:氣體靶 102: Gas target

B:粒子束 B: particle beam

D1:縱深方向 D1: Depth direction

D2:寬度方向 D2: Width direction

E1:第1收納部分 E1: The first storage part

E2:第2收納部分 E2: The second storage part

RL:照射軸 RL: irradiation axis

Claims (6)

一種RI製造裝置,係藉由被照射粒子束之靶的核反應來製造放射性同位素,其係具備: 收納部,在前述粒子束的照射位置收納前述靶; 第1流路,能夠讓冷卻介質流通,而從前述粒子束的照射軸的一側對前述收納部進行冷卻;及 第2流路,能夠讓冷卻介質流通,而透過相對於前述收納部圍繞前述照射軸設置之壁部的至少一部分,以前述照射軸為基準從比前述收納部更外側對前述收納部進行冷卻。 An RI manufacturing apparatus for producing radioisotopes by nuclear reactions of targets irradiated with particle beams, which has: a storage unit for storing the target at the irradiation position of the particle beam; The first flow path is capable of circulating a cooling medium to cool the housing portion from one side of the irradiation axis of the particle beam; and The second flow path is capable of passing a cooling medium through at least a part of a wall portion provided around the irradiation axis relative to the storage portion, and cooling the storage portion from outside the storage portion with the radiation axis as a reference. 如請求項1所述之RI製造裝置,其中, 前述第2流路能夠對前述收納部中的可收納液體靶之部分進行冷卻。 The RI manufacturing device according to claim 1, wherein, The second flow path can cool a portion of the storage section that can accommodate a liquid target. 如請求項1或請求項2所述之RI製造裝置,其中, 前述第2流路能夠對前述收納部中的可收納氣體靶之部分進行冷卻。 The RI manufacturing device according to claim 1 or claim 2, wherein, The said 2nd flow path can cool the part in the said accommodation part which can accommodate a gas target. 如請求項1或請求項2所述之RI製造裝置,其中, 前述收納部係具有:第1收納部分,能夠收納液體靶;及第2收納部分,與前述第1收納部分連通而能夠收納氣體靶, 前述第2流路能夠隔著前述第2收納部分從前述照射軸之與前述第1流路相反的一側對前述收納部進行冷卻。 The RI manufacturing device according to claim 1 or claim 2, wherein, The storage unit has: a first storage part capable of storing a liquid target; and a second storage part communicating with the first storage part and capable of storing a gas target, The second flow path can cool the storage portion from a side of the irradiation axis opposite to the first flow path via the second storage portion. 如請求項1或請求項2所述之RI製造裝置,其中, 在前述第2流路設置阻礙冷卻介質的流動之構件。 The RI manufacturing device according to claim 1 or claim 2, wherein, A member obstructing the flow of the cooling medium is provided in the second flow path. 一種靶收納裝置,係收納能夠藉由照射粒子束而利用核反應製造放射性同位素之靶,其係具備: 收納部,收納前述靶; 第1流路,能夠讓冷卻介質流通,在對前述靶照射前述粒子束之情形下,從該粒子束的照射軸的一側對前述收納部進行冷卻;及 第2流路,能夠讓冷卻介質流通,而透過相對於前述收納部圍繞前述照射軸設置之壁部的至少一部分,以前述照射軸為基準從比前述收納部更外側對前述收納部進行冷卻。 A target storage device for storing targets capable of producing radioisotopes through nuclear reactions by irradiating particle beams, comprising: The storage part stores the aforementioned target; The first flow path is capable of circulating a cooling medium, and cools the housing portion from one side of the irradiation axis of the particle beam when the target is irradiated with the particle beam; and The second flow path is capable of passing a cooling medium through at least a part of a wall portion provided around the irradiation axis relative to the storage portion, and cooling the storage portion from outside the storage portion with the radiation axis as a reference.
TW111111289A 2021-03-29 2022-03-25 Radioactive isotope production equipment and target storage equipment TWI818484B (en)

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