TW202236399A - Cutting device capable of suppressing slight static electricity generated by vacuum leakage - Google Patents
Cutting device capable of suppressing slight static electricity generated by vacuum leakage Download PDFInfo
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- TW202236399A TW202236399A TW111106027A TW111106027A TW202236399A TW 202236399 A TW202236399 A TW 202236399A TW 111106027 A TW111106027 A TW 111106027A TW 111106027 A TW111106027 A TW 111106027A TW 202236399 A TW202236399 A TW 202236399A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/06—Grinders for cutting-off
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/06—Grinders for cutting-off
- B24B27/0683—Accessories therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/005—Feeding or manipulating devices specially adapted to grinding machines
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
- B24B41/068—Table-like supports for panels, sheets or the like
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/10—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
- B28D5/0094—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being of the vacuum type
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
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- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Dicing (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
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- Control And Other Processes For Unpacking Of Materials (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Abstract
Description
本發明是有關於一種切削裝置。The present invention relates to a cutting device.
為了分割樹脂封裝基板或玻璃基板、陶瓷基板等各種電子零件而使用有利用切削刀片之切削裝置(切割機)。在半導體晶圓的分割等中,大多會以黏著膠帶將晶圓固定於環狀框架,而構成即使在分割成一個個的晶片後也易於搬送之框架單元。然而,單價相對較低之樹脂封裝基板,為了減少黏著膠帶或框架的成本,大多會使用直接將基板固定於工作夾台來分割之不使用黏著膠帶的所謂的治具切割機(參照例如專利文獻1)。A cutting device (dicing machine) using a cutting blade is used to divide various electronic components such as resin package substrates, glass substrates, and ceramic substrates. In the division of semiconductor wafers, etc., the wafers are often fixed to the ring frame with an adhesive tape to form a frame unit that is easy to transport even after the wafers are divided into individual wafers. However, for relatively low unit price resin packaging substrates, in order to reduce the cost of adhesive tapes or frames, most of them use so-called jig cutters that directly fix the substrates to the work clamping platform and divide them without using adhesive tapes (see, for example, patent documents 1).
專利文獻1所示之治具切割機,因為直接將被加工物固定於工作夾台,所以會因被加工物與工作夾台保持面之間的些微的間隙而產生真空漏氣(vacuum leak)。
先前技術文獻
專利文獻
The jig cutting machine shown in
專利文獻1:日本特許第6173173號公報Patent Document 1: Japanese Patent No. 6173173
發明欲解決之課題The problem to be solved by the invention
伴隨於比以往更先進之器件的精密化、高密度化,器件的靜電破壞對策已變得嚴格,且開始要求連因真空漏氣所產生之些微的靜電都抑制。With the precision and high density of more advanced devices than before, the countermeasures against electrostatic damage of devices have become stricter, and it is beginning to be required to suppress even the slightest static electricity generated by vacuum leaks.
本發明之目的在於提供一種可以連因真空漏氣而產生之些微的靜電都抑制之切削裝置。 用以解決課題之手段 The object of the present invention is to provide a cutting device capable of suppressing even slight static electricity caused by vacuum leaks. means to solve problems
為了解決上述之課題並達成目的,本發明的切削裝置具備:切削單元,將切削刀片裝設於主軸來切削被加工物;工作夾台,被該切削刀片的退刀溝將保持面區劃成複數個區域,吸引保持被加工物之吸引孔在該保持面的該區域開口;及移動單元,使該切削單元與該工作夾台相對地移動,前述切削裝置的特徵在於更具備靜電抑制部,前述靜電抑制部會抑制由該工作夾台的該保持面與該被加工物之間的間隙之真空漏氣所產生之靜電。In order to solve the above-mentioned problems and achieve the purpose, the cutting device of the present invention includes: a cutting unit that mounts a cutting blade on a spindle to cut a workpiece; A region, the suction hole for attracting and holding the workpiece is opened in the region of the holding surface; and a moving unit that moves the cutting unit and the work chuck relatively, the aforementioned cutting device is characterized in that it is further equipped with an electrostatic suppression unit, and the aforementioned The static electricity suppression part suppresses the static electricity generated by the vacuum leak in the gap between the holding surface of the work clamp and the workpiece.
在前述切削裝置中,亦可為:該工作夾台是在金屬製的本體部鋪設作為該保持面之樹脂層而構成,且該靜電抑制部是水供給部,前述水供給部以所供給之水來對該本體部與該樹脂層進行電性地連結。In the aforementioned cutting device, the work chuck may be formed by laying a resin layer as the holding surface on the metal main body, and the static electricity suppressing part may be a water supply part, and the water supply part may be supplied with Water is used to electrically connect the main body and the resin layer.
在前述切削裝置中,亦可為:該工作夾台是在金屬製的本體部鋪設作為該保持面之樹脂層而構成,且該靜電抑制部是具有導電性之該樹脂層。In the aforementioned cutting device, the work holder may be formed by laying a resin layer as the holding surface on a metal main body, and the static electricity suppressing portion may be the conductive resin layer.
在前述切削裝置中,亦可為:將該樹脂層以具備導電性之接著劑固定在金屬製的該本體部。In the aforementioned cutting device, the resin layer may be fixed to the metal main body with an adhesive having conductivity.
在前述切削裝置中,亦可為:該工作夾台具備第1工作夾台與第2工作夾台,搬送單元會在以其中一個該工作夾台所吸引保持之被加工物處於加工中時,對另一個該工作夾台搬出加工後的被加工物並搬入加工前的被加工物,且該被加工物會在加工前以已受到吸引保持之狀態來待機。 發明效果 In the above-mentioned cutting device, it may also be that: the work holder includes a first work holder and a second work holder, and the transfer unit will, when the workpiece attracted and held by one of the work holders is being processed, The other work chuck unloads the processed workpiece and loads the processed workpiece before processing, and the processed workpiece waits in a state of being attracted and held before processing. Invention effect
本發明可以發揮以下效果:可以連真空漏氣而產生之些微的靜電都抑制。The present invention can exert the following effects: even slight static electricity generated by vacuum air leakage can be suppressed.
用以實施發明之形態form for carrying out the invention
針對用於實施本發明之形態(實施形態),一面參照圖式一面詳細地說明。本發明並非因以下的實施形態所記載之內容而受到限定之發明。又,在以下所記載之構成要素中,包含所屬技術領域中具有通常知識者可以容易地設想得到的構成要素、實質上相同的構成要素。此外,以下所記載之構成是可合宜組合的。又,在不脫離本發明之要旨的範圍內,可進行構成之各種省略、置換或變更。The form (embodiment) for carrying out this invention is demonstrated in detail, referring drawings. The present invention is not limited by the contents described in the following embodiments. In addition, the constituent elements described below include constituent elements that can be easily assumed by those skilled in the art and substantially the same constituent elements. In addition, the constitution described below can be combined suitably. In addition, various omissions, substitutions, or changes in the configuration can be made without departing from the gist of the present invention.
[實施形態1]
依據圖式來說明本發明的實施形態1之切削裝置。圖1是顯示實施形態1之切削裝置的構成例的立體圖。圖2是顯示圖1所示之切削裝置的加工對象的被加工物之一例的立體圖。圖3是從背面側觀看圖2所示之被加工物的立體圖。圖4是圖1所示之切削裝置的工作夾台的立體圖。圖5是圖4所示之工作夾台的主要部分的剖面圖。
[Embodiment 1]
A cutting device according to
實施形態1之圖1所示之切削裝置1是對圖2以及圖3所示之被加工物200進行切削加工之加工裝置。在實施形態1中,如圖2及圖3所示,切削裝置1之加工對象的被加工物200形成為平面形狀為矩形之平板狀。被加工物200具備藉由金屬所構成之基板201,且在基板201的正面202將複數條分割預定線203形成為格子狀。The
被加工物200具備被複數條分割預定線203所區劃出的複數個區域,且在這些區域的各自的基板201的背面204側配置有未圖示之晶片。晶片已被積層於基板201的背面204之塑模樹脂205所被覆。在實施形態1中,被加工物200是晶片被塑模樹脂205埋設之所謂的樹脂封裝基板。The
如前述地構成之被加工物200是藉由圖1所示之切削裝置1而沿著分割預定線203被切削加工,且被分割成一個個的封裝器件晶片206。再者,在實施形態1中,雖然被加工物200是樹脂封裝基板,但在本發明中,並非限定於樹脂封裝基板,亦可為玻璃基板或陶瓷基板等。The
圖1所示之切削裝置1是將被加工物200保持於工作夾台10來沿著複數條分割預定線203進行切削加工之加工裝置。在實施形態1中,切削裝置1是以下之加工裝置(所謂的治具切割機):將未貼附有切割膠帶之被加工物200直接保持在工作夾台10,並將被加工物200以所謂的全切割(full cut)來分割成封裝器件晶片206。The
如圖1所示,切削裝置1具備工作夾台10、切削單元20、拍攝單元30以及控制單元100,前述工作夾台10是以保持面11吸引保持被加工物200,前述切削單元20是一邊對已吸引保持在工作夾台10之被加工物200供給切削水一邊以切削刀片21切削分割預定線203,而將被加工物200分割成複數個封裝器件晶片206。如圖1所示,切削裝置1是具備有2個切削單元20,即雙主軸的切割機(dicer),也就是所謂的對向式雙主軸(Facing dual type)之切削裝置。As shown in FIG. 1 , the
又,如圖1所示,切削裝置1具備第1工作夾台10-1與第2工作夾台10-2來作為工作夾台10。再者,以下,本說明書在區別這些時,會記載為第1工作夾台10-1與第2工作夾台10-2,在不區別時則僅記載為工作夾台10。第1工作夾台10-1之構成、與第2工作夾台10-2之構成是相等的。Moreover, as shown in FIG. 1 , the
又,切削裝置1具備使切削單元20與工作夾台10相對地移動之移動單元40。移動單元40具備:X軸移動單元41,為將工作夾台10朝和水平方向平行之X軸方向加工進給之加工進給單元;Y軸移動單元42,為使切削單元20朝和水平方向平行且和X軸方向正交之分度進給方向即Y軸方向移動之分度進給單元;Z軸移動單元43,使切削單元20朝平行於和X軸方向與Y軸方向分別正交之鉛直方向的切入進給方向即Z軸方向移動;及旋轉移動單元44,使工作夾台10繞著和Z軸方向平行之軸心旋轉。亦即,移動單元40是使工作夾台10與切削單元20在X軸方向、Y軸方向以及Z軸方向上相對地移動之單元。In addition, the
X軸移動單元41是藉由使工作夾台10與旋轉移動單元44一起在加工進給方向即X軸方向上移動,而使工作夾台10相對於切削單元20在X軸方向上移動之單元。X軸移動單元41讓工作夾台10沿著X軸方向在加工區域與搬入搬出區域之間移動,前述加工區域是切削單元20對已保持在工作夾台10之被加工物200進行切削加工之區域,前述搬入搬出區域是將被加工物200對工作夾台10搬入搬出之區域。在實施形態1中,X軸移動單元41和工作夾台10以1對1方式對應而設置有2個。X軸移動單元41會涵蓋加工區域與搬入搬出區域讓對應之工作夾台10在X軸方向上移動。The
Y軸移動單元42是藉由使切削單元20相對於工作夾台10在分度進給方向即Y軸方向上移動,而使工作夾台10相對於切削單元20在Y軸方向上相對地移動之單元。Z軸移動單元43是藉由使切削單元20在切入進給方向即Z軸方向上移動,而使工作夾台10相對於切削單元20在Z軸方向上相對地移動之單元。The Y-
旋轉移動單元44是藉由X軸移動單元41而在X軸方向上移動,且使工作夾台10繞著和Z軸方向平行的軸心旋轉之單元。在實施形態1中,旋轉移動單元44和工作夾台10以1對1方式對應而設置有2個。旋轉移動單元44是使對應之工作夾台10以繞著和Z軸方向平行的軸心的方式旋轉之單元。The
X軸移動單元41、Y軸移動單元42以及Z軸移動單元43均具備習知的滾珠螺桿、習知的馬達及習知的導軌,前述滾珠螺桿是繞著軸心旋轉自如地設置,前述馬達使滾珠螺桿繞著軸心旋轉,前述導軌將工作夾台10或切削單元20支撐成在X軸方向、Y軸方向或Z軸方向上移動自如。The
如圖4所示,工作夾台10具備形成為矩形狀,且保持被加工物200之保持面11。如圖4所示,工作夾台10具備:本體部12,藉由具有導電性之金屬所構成且設置於旋轉移動單元44;及板狀的樹脂層13,由橡膠等具有彈性之非導電性的樹脂所構成,且設置於本體部12的表面上。As shown in FIG. 4 , the work chuck 10 is formed in a rectangular shape and has a
本體部12以及樹脂層13的平面形狀是形成為比被加工物200的平面形狀更大之矩形狀。本體部12的表面以及樹脂層13的表面是沿著水平方向呈平坦地形成。又,樹脂層13的表面是保持被加工物200之保持面11。亦即,工作夾台10的保持面11是以樹脂層13所構成。又,如圖5所示,樹脂層13是被接著劑14固定在本體部12的表面。像這樣,工作夾台10是在金屬製的本體部12鋪設作為保持面11之樹脂層13而構成。The planar shapes of the
工作夾台10是被切削加工時供切削刀片21侵入之退刀溝15將保持面11區劃成複數個區域,且在保持面11之被退刀溝15所區劃出之區域中各自開口有用於吸引被加工物200以及封裝器件晶片206之吸引孔16。退刀溝15是設置在對應於分割預定線203之位置(和已保持在保持面11之被加工物200的分割預定線203重疊之位置)且以從保持面11凹陷的方式形成。在實施形態1中,退刀溝15貫通樹脂層13,並將樹脂層13按每個區域等來分割。The work clamping table 10 is the
吸引孔16是設置在和封裝器件晶片206對應之位置(亦即,和已保持在保持面11之被加工物200的封裝器件晶片206重疊之位置),且在保持面11的各區域開口。在實施形態1中,吸引孔16和封裝器件晶片206以1對1方式對應。吸引孔16是透過圖1所示之吸引路17以及開關閥18而連接於吸引源19。The
工作夾台10是藉由以吸引源19對吸引孔16進行吸引,而將被加工物200以及封裝器件晶片206吸引保持在保持面11。再者,工作夾台10在將被加工物200以及封裝器件晶片206吸引保持於保持面11時,會有來自吸引源19的負壓從保持面11與被加工物200以及封裝器件晶片206之間的間隙洩漏之情形(亦即,稱為真空漏氣)。工作夾台10會有以下情形:因為真空漏氣,而在保持面11與被加工物200以及封裝器件晶片206之間產生靜電,並使其等帶電。The chuck 10 sucks and holds the
又,各工作夾台10-1、10-2是藉由X軸移動單元41而和旋轉移動單元44一起在X軸方向上移動,且藉由旋轉移動單元44而繞著和Z軸方向平行的軸心旋轉。在實施形態1中,各工作夾台10-1、10-2在對應之旋轉移動單元44上設置有一個。In addition, each work clamping table 10-1, 10-2 moves in the X-axis direction together with the
切削單元20是對以工作夾台10所保持之被加工物200進行切削加工之處理單元。切削單元20各自藉由Y軸移動單元42而相對於工作夾台10在Y軸方向上相對地且移動自如地設置,且藉由Z軸移動單元43而在Z軸方向上相對地且移動自如地設置。The cutting
如圖1所示,切削單元20是透過Y軸移動單元42以及Z軸移動單元43等而設置在從裝置本體2豎立設置之門型的支撐框架3。切削單元20是藉由Y軸移動單元42以及Z軸移動單元43,而變得可將切削刀片21定位到工作夾台10的保持面11的任意的位置。As shown in FIG. 1 , the cutting
切削單元20是分別將切削刀片21裝設於主軸23,而對被加工物200進行切削加工之單元。如圖1所示,切削單元20具有對被工作夾台10所保持之被加工物200進行切削加工之切削刀片21、藉由Y軸移動單元42以及Z軸移動單元43而在Y軸方向以及Z軸方向上移動自如地設置之主軸殼體22、以繞著軸心且可旋轉的方式設置在主軸殼體22且被未圖示之馬達所旋轉並且於前端部裝設切削刀片21之主軸23、及對切削刀片21供給切削水之切削水供給噴嘴。The cutting
在實施形態1中,切削刀片21分別是具備圓環狀的圓形基台、與配設在圓形基台的外周緣並對被加工物200進行切削加工之圓環狀的切刃之所謂的輪轂型刀片(hub blade)。切刃是由鑽石或CBN(立方氮化硼,Cubic Boron Nitride)等之磨粒、與金屬或樹脂等之固定磨粒之黏結材(結合材)所形成,且形成為厚度固定之環狀。再者,在本發明中,切削刀片21亦可為僅以切刃所構成之所謂的墊圈型刀片(washer blade)。In
拍攝單元30已配置成和切削單元20一體地移動。拍攝單元30具備有對已保持在工作夾台10之切削前的被加工物200的應分割的區域進行攝影之拍攝元件。拍攝元件可為例如CCD(電荷耦合器件,Charge-Coupled Device)拍攝元件或CMOS(互補式金屬氧化物半導體,Complementary MOS)拍攝元件。拍攝單元30是對已保持在工作夾台10之被加工物200進行攝影,而得到用於完成校準等之圖像,並將所得到的圖像輸出至控制單元100,其中前述校準是進行被加工物200與切削刀片21之對位。The photographing
又,切削裝置1具備未圖示之X軸方向位置檢測單元、未圖示之Y軸方向位置檢測單元與Z軸方向位置檢測單元,前述X軸方向位置檢測單元是用於檢測工作夾台10的X軸方向之位置,前述Y軸方向位置檢測單元是用於檢測切削單元20的Y軸方向之位置,前述Z軸方向位置檢測單元是用於檢測切削單元20的Z軸方向之位置。X軸方向位置檢測單元以及Y軸方向位置檢測單元可以藉由和X軸方向或Y軸方向平行之線性標度尺、與讀取頭來構成。Z軸方向位置檢測單元是利用馬達的脈衝來檢測切削單元20的Z軸方向之位置。X軸方向位置檢測單元、Y軸方向位置檢測單元以及Z軸方向位置檢測單元會將工作夾台10的X軸方向、切削單元20的Y軸方向或Z軸方向之位置輸出至控制單元100。再者,在實施形態1中,切削裝置1的工作夾台10以及切削單元20的X軸方向、Y軸方向以及Z軸方向之位置是以將經事先決定之未圖示的原點位置作為基準之位置來決定。In addition, the
又,切削裝置1更具備靜電抑制部50,前述靜電抑制部50會抑制由樹脂層13即保持面11、與被加工物200以及封裝器件晶片206之間的間隙之真空漏氣所產生之靜電。在實施形態1中,靜電抑制部50是水供給部51,前述水供給部51以所供給之水52對本體部12與樹脂層13進行電性地連結。再者,實施形態1之切削裝置1的靜電抑制部50即水供給部51所供給之水52,宜為電阻率值比純水更低之水。In addition, the
在實施形態1中,水供給部51是和工作夾台10以1對1方式對應設置,而將水52供給至對應之工作夾台10的保持面11之構成。在實施形態1中,水供給部51可從未圖示之水供給源被供給水52。水供給部51是沿著Y軸方向而延伸之配管,並固定於裝置本體2。水供給部51讓吐出所供給之水52的吐出口相向於保持面11,且在長度方向上隔著間隔而配置。水供給部51可在下方供被X軸移動單元41所移動之工作夾台10通過。水供給部51是從吐出口吐出水52,並使藉由X軸移動單元41而在X軸方向上移動之工作夾台10在下方通過,藉此朝保持面11供給水52,並藉由所供給之水52而將本體部12與樹脂層13電連接,來將由真空漏氣所產生之靜電放電到本體部12。In
又,切削裝置1具備搬送單元60(顯示於圖7),前述搬送單元60會將切削加工前的被加工物200搬入到工作夾台10的保持面11上,並且將切削加工後的保持面11上的封裝器件晶片206從保持面11上搬出。In addition, the
控制單元100是分別控制切削裝置1的上述之各單元,而使切削裝置1實施對被加工物200之加工動作的單元。再者,控制單元100是具有運算處理裝置、記憶裝置與輸入輸出介面裝置之電腦,前述運算處理裝置具有CPU(中央處理單元,central processing unit)之類的微處理器,前述記憶裝置具有ROM(唯讀記憶體,read only memory)或RAM(隨機存取記憶體,random access memory)之類的記憶體。控制單元100的運算處理裝置是依照已記憶於記憶裝置之電腦程式來讓運算處理裝置實施運算處理,並將用於控制切削裝置1的控制訊號透過輸入輸出介面裝置輸出至切削裝置1的上述之構成要素。The
又,控制單元100已連接於顯示單元與輸入單元,前述顯示單元是藉由顯示加工動作之狀態或圖像等的液晶顯示裝置等所構成,前述輸入單元可在操作人員登錄加工條件等之時使用。輸入單元可藉由設置於顯示單元之觸控面板、與鍵盤等之外部輸入裝置當中至少一種來構成。In addition, the
其次,說明前述之構成的切削裝置1的加工動作。圖6是示意地顯示對已吸引保持在圖1所示之切削裝置的第1工作夾台之被加工物進行切削加工之狀態的正面圖。圖7是示意地顯示將被加工物搬入圖6所示之切削裝置的第2工作夾台之狀態的正面圖。圖8是示意地顯示對已吸引保持在圖1所示之切削裝置的第1工作夾台之被加工物進行切削加工之狀態的側面圖。圖9是示意地顯示圖8所示之切削裝置的吸引保持有被加工物之第2工作夾台的側面圖。Next, the machining operation of the
前述之構成的切削裝置1是操作人員可操作輸入單元等,來對控制單元100設定加工條件。切削裝置1在控制單元100受理來自操作人員等之加工動作的開始指示後,即開始加工動作。In the
當開始加工動作時,切削裝置1是控制單元100會控制搬送單元60而將被加工物200的塑模樹脂205載置在搬入搬出區域之第1工作夾台10-1的保持面11。在加工動作中,切削裝置1會開啟開關閥18,來將被加工物200的塑模樹脂205吸引保持在第1工作夾台10-1的保持面11,且將主軸23繞著軸心旋轉,並將切削水供給到切削刀片21。切削裝置1是控制單元100會控制移動單元40來將第1工作夾台10-1從搬入搬出區域朝向加工區域移動到拍攝單元30的下方,並藉由拍攝單元30對已吸引保持在第1工作夾台10-1之被加工物200進行拍攝,來執行校準。When starting the machining operation, the
在加工動作中,切削裝置1是控制單元100會依據加工條件來控制移動單元40等,而如圖6所示,一邊使2個切削單元20雙方的切削刀片21與已吸引保持在第1工作夾台10-1之被加工物200沿著分割預定線203相對地移動,一邊使切削刀片21朝被加工物200的分割預定線203切入到侵入退刀溝15為止,來對已吸引保持在第1工作夾台10-1之被加工物200進行切削加工。In the processing operation, the
又,在加工動作中,切削裝置1的控制單元100會進行:在已吸引保持在第1工作夾台10-1之被加工物200的切削加工中,將連接於第2工作夾台10-2之開關閥18關閉,並如圖6所示,一邊控制移動單元40使第2工作夾台10-2於靜電抑制部50即水供給部51的下方移動,一邊從水供給部51朝第2工作夾台10-2的保持面11供給水52。如圖7所示,所供給之水52可藉由表面張力等來覆蓋第2工作夾台10-2的保持面11,而將樹脂層13與本體部12電連接。In addition, in the processing operation, the
在加工動作中,切削裝置1的控制單元100在已吸引保持在第1工作夾台10-1之被加工物200的切削加工中時,如圖7所示,於控制移動單元40來將第2工作夾台10-2定位到搬入搬出區域後,會控制搬送單元60來將被加工物200的塑模樹脂205載置在搬入搬出區域的第2工作夾台10-2的保持面11。在加工動作中,切削裝置1會開啟開關閥18,來將被加工物200的塑模樹脂205吸引保持於第2工作夾台10-2的保持面11。此時,樹脂層13與本體部12可藉由水52而電連接,因為真空漏氣而在第2工作夾台10-2的保持面11產生之靜電會被放電到本體部12而受到抑制。During the processing operation, when the
在加工動作中,切削裝置1的控制單元100在如圖8所示,已吸引保持在第1工作夾台10-1之被加工物200的切削加工中,會如圖9所示,將吸引保持有被加工物200之第2工作夾台10-2定位在搬入搬出區域來待機。如此進行,搬送單元60會在以第1工作夾台10-1所吸引保持之被加工物200的切削加工中時,將被加工物200搬入第2工作夾台10-2,並讓已保持於第2工作夾台10-2之被加工物200在搬入搬出區域中於切削加工前以已進行吸引保持之狀態來待機。During the machining operation, the
切削裝置1是依照加工條件來切削已吸引保持在第1工作夾台10-1之被加工物200的分割預定線203,而將被加工物200分割成一個個的封裝器件晶片206。若對已吸引保持在第1工作夾台10-1之被加工物200的全部的分割預定線203進行切削加工來分割成封裝器件晶片206後,切削裝置1會將第1工作夾台10-1從加工區域朝向搬入搬出區域移動。又,切削裝置1會將第2工作夾台10-2從搬入搬出區域朝向加工區域來將第2工作夾台10-2移動至拍攝單元30的下方,並藉由拍攝單元30對已吸引保持在第2工作夾台10-2之被加工物200進行拍攝,來執行校準,且使2個切削單元20雙方的切削刀片21朝被加工物200的分割預定線203切入到讓切削刀片21侵入退刀溝15為止,來對已吸引保持在第2工作夾台10-2之被加工物200進行切削加工。The
在加工動作中,切削裝置1會在已吸引保持在第2工作夾台10-2之被加工物200的切削加工中,控制搬送單元60而從已定位在搬入搬出區域之第1工作夾台10-1的保持面11將切削加工後的被加工物200亦即封裝器件晶片206搬出。在加工動作中,切削裝置1會在已吸引保持在第2工作夾台10-2之被加工物200的切削加工中,控制移動單元40而一邊使第1工作夾台10-1在靜電抑制部50即水供給部51的下方移動,一邊從水供給部51朝第1工作夾台10-1的保持面11供給水52,且在控制移動單元40而將第1工作夾台10-1定位到搬入搬出區域後,會控制搬送單元60來將切削加工前的被加工物200搬入第1工作夾台10-1,並在已吸引保持在第2工作夾台10-2之被加工物200的切削加工中,將吸引保持有切削加工前的被加工物200之第1工作夾台10-1定位在搬入搬出區域來待機。During the machining operation, the
如此進行,搬送單元60會在以第2工作夾台10-2所吸引保持之被加工物200的切削加工中,將已吸引保持在第1工作夾台10-1之切削加工後的被加工物200亦即封裝器件晶片206搬出,並將切削加工前的被加工物200搬入,藉此讓已保持在第1工作夾台10-1之被加工物200在搬入搬出區域中於切削加工前以已進行吸引保持之狀態來待機。像這樣,搬送單元60會在以工作夾台10-1、10-2當中的一者所吸引保持之被加工物200處於切削加工中時,將已吸引保持在另一者之切削加工後的被加工物200搬出並將切削加工前的被加工物200搬入,而讓被加工物200於切削加工前以已被吸引保持於另一者之狀態來待機。像這樣,切削裝置1會對已吸引保持在第1工作夾台10-1之被加工物200、與已吸引保持在第2工作夾台10-2之被加工物200交互地進行切削加工,來將被加工物200分割成一個個的封裝器件晶片206。In this way, the
以上所說明之實施形態1之切削裝置1具備抑制因真空漏氣而產生之靜電的靜電抑制部50。靜電抑制部50是對樹脂層13與金屬製之本體部12進行電性地連結之類的供給水52之水供給部51。其結果,切削裝置1可以藉由靜電抑制部50即水供給部51,而發揮以下效果:可以連因真空漏氣而產生於工作夾台10的保持面11之些微的靜電都抑制,且可以減少被加工物200的靜電破壞。The
[實施形態2]
依據圖式來說明本發明的實施形態2之切削裝置。圖10是實施形態2之切削裝置的工作夾台之主要部分的剖面圖。再者,在圖10中,對和實施形態1相同的部分,會附加相同符號而省略說明。
[Embodiment 2]
A cutting device according to
實施形態2之切削裝置1除了靜電抑制部50的構成不同以外,與實施形態1是相同的。實施形態2之切削裝置1之工作夾台10的圖10所示之樹脂層13-2是將碳粒等之導電性的物質混入橡膠等之具有彈性的樹脂,而具有導電性。又,實施形態2之切削裝置1之工作夾台10的圖10所示之接著劑14-2是將碳粒等之導電性的物質混入樹脂,而具有導電性。因此,樹脂層13-2會透過接著劑14-2而電連接於本體部12。The
如此進行,在實施形態2中,靜電抑制部50是具有導電性之樹脂層13,且工作夾台10以具備導電性之接著劑14-2將具有導電性之樹脂層13-2固定在金屬製之本體部12。In this way, in
實施形態2之切削裝置1具備抑制因真空漏氣而產生之靜電的靜電抑制部50。靜電抑制部50是工作夾台10之具有導電性的樹脂層13。其結果,切削裝置1可以藉由靜電抑制部50即樹脂層13,而發揮以下效果:可以連因真空漏氣而產生於工作夾台10的保持面11之些微的靜電都抑制,且可以減少被加工物200的靜電破壞。The
再者,本發明並不受限於上述實施形態。亦即,在不脫離本發明之要點的範圍內,可以進行各種變形來實施。In addition, this invention is not limited to the said embodiment. That is, various modifications and implementations are possible without departing from the gist of the present invention.
1:切削裝置 2:裝置本體 3:支撐框架 10:工作夾台 10-1:第1工作夾台 10-2:第2工作夾台 11:保持面 12:本體部 13:樹脂層 13-2:樹脂層(靜電抑制部) 14,14-2:接著劑 15:退刀溝 16:吸引孔 17:吸引路 18:開關閥 19:吸引源 20:切削單元 21:切削刀片 22:主軸殼體 23:主軸 30:拍攝單元 40:移動單元 41:X軸移動單元 42:Y軸移動單元 43:Z軸移動單元 44:旋轉移動單元 50:靜電抑制部 51:水供給部 52:水 60:搬送單元 100:控制單元 200:被加工物 201:基板 202:正面 203:分割預定線 204:背面 205:塑模樹脂 206:封裝器件晶片 X,Y,Z:方向 1: Cutting device 2: Device body 3: Support frame 10: Work clamp table 10-1: The first work clamp 10-2: The second work clamp 11: keep the surface 12: Main body 13: resin layer 13-2: Resin layer (static suppression part) 14,14-2: Adhesive 15: Retraction groove 16: Attraction hole 17: Attraction Road 18: switch valve 19: Source of Attraction 20: Cutting unit 21: Cutting blade 22: Spindle housing 23: Spindle 30: Shooting unit 40: mobile unit 41: X-axis moving unit 42: Y-axis mobile unit 43: Z-axis mobile unit 44:Rotate mobile unit 50: Static suppression department 51: Water supply department 52: water 60: Transfer unit 100: control unit 200: processed object 201: Substrate 202: front 203: Divide scheduled line 204: back 205: molding resin 206: Package device wafer X, Y, Z: direction
圖1是顯示實施形態1之切削裝置的構成例的立體圖。
圖2是顯示圖1所示之切削裝置的加工對象的被加工物之一例的立體圖。
圖3是從背面側觀看圖2所示之被加工物的立體圖。
圖4是圖1所示之切削裝置的工作夾台的立體圖。
圖5是圖4所示之工作夾台的主要部分的剖面圖。
圖6是示意地顯示對已吸引保持在圖1所示之切削裝置的第1工作夾台之被加工物進行切削加工之狀態的正面圖。
圖7是示意地顯示將被加工物搬入圖6所示之切削裝置的第2工作夾台之狀態的正面圖。
圖8是示意地顯示對已吸引保持在圖1所示之切削裝置的第1工作夾台之被加工物進行切削加工之狀態的側面圖。
圖9是示意地顯示圖8所示之切削裝置的吸引保持有被加工物之第2工作夾台的側面圖。
圖10是實施形態2之切削裝置的工作夾台之主要部分的剖面圖。
Fig. 1 is a perspective view showing a configuration example of a cutting device according to the first embodiment.
Fig. 2 is a perspective view showing an example of a workpiece to be processed by the cutting device shown in Fig. 1 .
Fig. 3 is a perspective view of the workpiece shown in Fig. 2 viewed from the back side.
Fig. 4 is a perspective view of the work clamp of the cutting device shown in Fig. 1 .
Fig. 5 is a cross-sectional view of main parts of the work chuck shown in Fig. 4 .
Fig. 6 is a front view schematically showing a state in which a workpiece being sucked and held by the first chuck of the cutting device shown in Fig. 1 is being cut.
Fig. 7 is a front view schematically showing a state in which a workpiece is carried into a second chuck of the cutting device shown in Fig. 6 .
Fig. 8 is a side view schematically showing a state in which a workpiece held by suction and held by a first chuck of the cutting device shown in Fig. 1 is being cut.
Fig. 9 is a side view schematically showing a second chuck of the cutting device shown in Fig. 8 that suctions and holds a workpiece.
Fig. 10 is a cross-sectional view of main parts of a chuck of a cutting device according to
1:切削裝置 1: Cutting device
2:裝置本體 2: Device body
3:支撐框架 3: Support frame
10:工作夾台 10: Work clamp table
10-1:第1工作夾台 10-1: The first work clamp
10-2:第2工作夾台 10-2: The second work clamp
11:保持面 11: keep the surface
17:吸引路 17: Attraction Road
18:開關閥 18: switch valve
19:吸引源 19: Source of Attraction
20:切削單元 20: Cutting unit
21:切削刀片 21: Cutting blade
22:主軸殼體 22: Spindle housing
23:主軸 23: Spindle
30:拍攝單元 30: Shooting unit
40:移動單元 40: mobile unit
41:X軸移動單元 41: X-axis moving unit
42:Y軸移動單元 42: Y-axis mobile unit
43:Z軸移動單元 43: Z-axis mobile unit
44:旋轉移動單元 44:Rotate mobile unit
50:靜電抑制部 50: Static suppression department
51:水供給部 51: Water supply department
52:水 52: water
100:控制單元 100: control unit
X,Y,Z:方向 X, Y, Z: direction
Claims (5)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2021-034219 | 2021-03-04 | ||
JP2021034219A JP2022134805A (en) | 2021-03-04 | 2021-03-04 | Cutting device |
Publications (1)
Publication Number | Publication Date |
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TW202236399A true TW202236399A (en) | 2022-09-16 |
Family
ID=83067272
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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TW111106027A TW202236399A (en) | 2021-03-04 | 2022-02-18 | Cutting device capable of suppressing slight static electricity generated by vacuum leakage |
Country Status (4)
Country | Link |
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JP (1) | JP2022134805A (en) |
KR (1) | KR20220125172A (en) |
CN (1) | CN115008321A (en) |
TW (1) | TW202236399A (en) |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP6173173B2 (en) | 2013-11-11 | 2017-08-02 | 株式会社ディスコ | Cutting equipment |
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2021
- 2021-03-04 JP JP2021034219A patent/JP2022134805A/en active Pending
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2022
- 2022-02-18 TW TW111106027A patent/TW202236399A/en unknown
- 2022-02-28 KR KR1020220026067A patent/KR20220125172A/en unknown
- 2022-03-01 CN CN202210195979.7A patent/CN115008321A/en active Pending
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JP2022134805A (en) | 2022-09-15 |
KR20220125172A (en) | 2022-09-14 |
CN115008321A (en) | 2022-09-06 |
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