TW202236399A - Cutting device capable of suppressing slight static electricity generated by vacuum leakage - Google Patents

Cutting device capable of suppressing slight static electricity generated by vacuum leakage Download PDF

Info

Publication number
TW202236399A
TW202236399A TW111106027A TW111106027A TW202236399A TW 202236399 A TW202236399 A TW 202236399A TW 111106027 A TW111106027 A TW 111106027A TW 111106027 A TW111106027 A TW 111106027A TW 202236399 A TW202236399 A TW 202236399A
Authority
TW
Taiwan
Prior art keywords
workpiece
cutting
unit
cutting device
work
Prior art date
Application number
TW111106027A
Other languages
Chinese (zh)
Inventor
楠欣浩
石井茂
Original Assignee
日商迪思科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商迪思科股份有限公司 filed Critical 日商迪思科股份有限公司
Publication of TW202236399A publication Critical patent/TW202236399A/en

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/06Grinders for cutting-off
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/06Grinders for cutting-off
    • B24B27/0683Accessories therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/005Feeding or manipulating devices specially adapted to grinding machines
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/06Work supports, e.g. adjustable steadies
    • B24B41/068Table-like supports for panels, sheets or the like
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/10Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0082Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
    • B28D5/0094Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being of the vacuum type
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/02Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
    • B28D5/022Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Dicing (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Confectionery (AREA)
  • Control And Other Processes For Unpacking Of Materials (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)

Abstract

The object of the present invention is to provide a cutting device capable of suppressing slight static electricity generated by vacuum leakage. A cutting device 1 includes a cutting unit 20 configured to cut a workpiece by mounting a cutting blade 21 on a spindle 23; a chuck table 10 in which a holding surface 11 is partitioned into a plurality of regions by a clearance groove of the cutting blade 21 and a suction hole that sucks and holds the workpiece is opened in a region of the holding surface 11; and a moving unit 40 that moves the cutting unit 20 relative to the chuck table 10. The cutting device further includes a static electricity suppression unit 50 that suppresses static electricity generated from vacuum leakage in a gap between the holding surface 11 of the chuck table 10 and the workpiece.

Description

切削裝置cutting device

本發明是有關於一種切削裝置。The present invention relates to a cutting device.

為了分割樹脂封裝基板或玻璃基板、陶瓷基板等各種電子零件而使用有利用切削刀片之切削裝置(切割機)。在半導體晶圓的分割等中,大多會以黏著膠帶將晶圓固定於環狀框架,而構成即使在分割成一個個的晶片後也易於搬送之框架單元。然而,單價相對較低之樹脂封裝基板,為了減少黏著膠帶或框架的成本,大多會使用直接將基板固定於工作夾台來分割之不使用黏著膠帶的所謂的治具切割機(參照例如專利文獻1)。A cutting device (dicing machine) using a cutting blade is used to divide various electronic components such as resin package substrates, glass substrates, and ceramic substrates. In the division of semiconductor wafers, etc., the wafers are often fixed to the ring frame with an adhesive tape to form a frame unit that is easy to transport even after the wafers are divided into individual wafers. However, for relatively low unit price resin packaging substrates, in order to reduce the cost of adhesive tapes or frames, most of them use so-called jig cutters that directly fix the substrates to the work clamping platform and divide them without using adhesive tapes (see, for example, patent documents 1).

專利文獻1所示之治具切割機,因為直接將被加工物固定於工作夾台,所以會因被加工物與工作夾台保持面之間的些微的間隙而產生真空漏氣(vacuum leak)。 先前技術文獻 專利文獻 The jig cutting machine shown in Patent Document 1 directly fixes the workpiece to the work clamp, so there will be a vacuum leak due to the slight gap between the workpiece and the holding surface of the work clamp. . prior art literature patent documents

專利文獻1:日本特許第6173173號公報Patent Document 1: Japanese Patent No. 6173173

發明欲解決之課題The problem to be solved by the invention

伴隨於比以往更先進之器件的精密化、高密度化,器件的靜電破壞對策已變得嚴格,且開始要求連因真空漏氣所產生之些微的靜電都抑制。With the precision and high density of more advanced devices than before, the countermeasures against electrostatic damage of devices have become stricter, and it is beginning to be required to suppress even the slightest static electricity generated by vacuum leaks.

本發明之目的在於提供一種可以連因真空漏氣而產生之些微的靜電都抑制之切削裝置。 用以解決課題之手段 The object of the present invention is to provide a cutting device capable of suppressing even slight static electricity caused by vacuum leaks. means to solve problems

為了解決上述之課題並達成目的,本發明的切削裝置具備:切削單元,將切削刀片裝設於主軸來切削被加工物;工作夾台,被該切削刀片的退刀溝將保持面區劃成複數個區域,吸引保持被加工物之吸引孔在該保持面的該區域開口;及移動單元,使該切削單元與該工作夾台相對地移動,前述切削裝置的特徵在於更具備靜電抑制部,前述靜電抑制部會抑制由該工作夾台的該保持面與該被加工物之間的間隙之真空漏氣所產生之靜電。In order to solve the above-mentioned problems and achieve the purpose, the cutting device of the present invention includes: a cutting unit that mounts a cutting blade on a spindle to cut a workpiece; A region, the suction hole for attracting and holding the workpiece is opened in the region of the holding surface; and a moving unit that moves the cutting unit and the work chuck relatively, the aforementioned cutting device is characterized in that it is further equipped with an electrostatic suppression unit, and the aforementioned The static electricity suppression part suppresses the static electricity generated by the vacuum leak in the gap between the holding surface of the work clamp and the workpiece.

在前述切削裝置中,亦可為:該工作夾台是在金屬製的本體部鋪設作為該保持面之樹脂層而構成,且該靜電抑制部是水供給部,前述水供給部以所供給之水來對該本體部與該樹脂層進行電性地連結。In the aforementioned cutting device, the work chuck may be formed by laying a resin layer as the holding surface on the metal main body, and the static electricity suppressing part may be a water supply part, and the water supply part may be supplied with Water is used to electrically connect the main body and the resin layer.

在前述切削裝置中,亦可為:該工作夾台是在金屬製的本體部鋪設作為該保持面之樹脂層而構成,且該靜電抑制部是具有導電性之該樹脂層。In the aforementioned cutting device, the work holder may be formed by laying a resin layer as the holding surface on a metal main body, and the static electricity suppressing portion may be the conductive resin layer.

在前述切削裝置中,亦可為:將該樹脂層以具備導電性之接著劑固定在金屬製的該本體部。In the aforementioned cutting device, the resin layer may be fixed to the metal main body with an adhesive having conductivity.

在前述切削裝置中,亦可為:該工作夾台具備第1工作夾台與第2工作夾台,搬送單元會在以其中一個該工作夾台所吸引保持之被加工物處於加工中時,對另一個該工作夾台搬出加工後的被加工物並搬入加工前的被加工物,且該被加工物會在加工前以已受到吸引保持之狀態來待機。 發明效果 In the above-mentioned cutting device, it may also be that: the work holder includes a first work holder and a second work holder, and the transfer unit will, when the workpiece attracted and held by one of the work holders is being processed, The other work chuck unloads the processed workpiece and loads the processed workpiece before processing, and the processed workpiece waits in a state of being attracted and held before processing. Invention effect

本發明可以發揮以下效果:可以連真空漏氣而產生之些微的靜電都抑制。The present invention can exert the following effects: even slight static electricity generated by vacuum air leakage can be suppressed.

用以實施發明之形態form for carrying out the invention

針對用於實施本發明之形態(實施形態),一面參照圖式一面詳細地說明。本發明並非因以下的實施形態所記載之內容而受到限定之發明。又,在以下所記載之構成要素中,包含所屬技術領域中具有通常知識者可以容易地設想得到的構成要素、實質上相同的構成要素。此外,以下所記載之構成是可合宜組合的。又,在不脫離本發明之要旨的範圍內,可進行構成之各種省略、置換或變更。The form (embodiment) for carrying out this invention is demonstrated in detail, referring drawings. The present invention is not limited by the contents described in the following embodiments. In addition, the constituent elements described below include constituent elements that can be easily assumed by those skilled in the art and substantially the same constituent elements. In addition, the constitution described below can be combined suitably. In addition, various omissions, substitutions, or changes in the configuration can be made without departing from the gist of the present invention.

[實施形態1] 依據圖式來說明本發明的實施形態1之切削裝置。圖1是顯示實施形態1之切削裝置的構成例的立體圖。圖2是顯示圖1所示之切削裝置的加工對象的被加工物之一例的立體圖。圖3是從背面側觀看圖2所示之被加工物的立體圖。圖4是圖1所示之切削裝置的工作夾台的立體圖。圖5是圖4所示之工作夾台的主要部分的剖面圖。 [Embodiment 1] A cutting device according to Embodiment 1 of the present invention will be described with reference to the drawings. Fig. 1 is a perspective view showing a configuration example of a cutting device according to the first embodiment. Fig. 2 is a perspective view showing an example of a workpiece to be processed by the cutting device shown in Fig. 1 . Fig. 3 is a perspective view of the workpiece shown in Fig. 2 viewed from the back side. Fig. 4 is a perspective view of the work clamp of the cutting device shown in Fig. 1 . Fig. 5 is a cross-sectional view of main parts of the work chuck shown in Fig. 4 .

實施形態1之圖1所示之切削裝置1是對圖2以及圖3所示之被加工物200進行切削加工之加工裝置。在實施形態1中,如圖2及圖3所示,切削裝置1之加工對象的被加工物200形成為平面形狀為矩形之平板狀。被加工物200具備藉由金屬所構成之基板201,且在基板201的正面202將複數條分割預定線203形成為格子狀。The cutting device 1 shown in FIG. 1 of Embodiment 1 is a processing device for cutting the workpiece 200 shown in FIGS. 2 and 3 . In Embodiment 1, as shown in FIGS. 2 and 3 , the workpiece 200 to be processed by the cutting device 1 is formed in the shape of a flat plate with a rectangular planar shape. The workpiece 200 has a substrate 201 made of metal, and a plurality of dividing lines 203 are formed in a grid on the front surface 202 of the substrate 201 .

被加工物200具備被複數條分割預定線203所區劃出的複數個區域,且在這些區域的各自的基板201的背面204側配置有未圖示之晶片。晶片已被積層於基板201的背面204之塑模樹脂205所被覆。在實施形態1中,被加工物200是晶片被塑模樹脂205埋設之所謂的樹脂封裝基板。The workpiece 200 has a plurality of regions defined by a plurality of dividing lines 203 , and a wafer (not shown) is placed on the rear surface 204 side of the substrate 201 in each of these regions. The wafer is covered with molding resin 205 laminated on the back surface 204 of the substrate 201 . In Embodiment 1, the workpiece 200 is a so-called resin package substrate in which a chip is embedded with a molding resin 205 .

如前述地構成之被加工物200是藉由圖1所示之切削裝置1而沿著分割預定線203被切削加工,且被分割成一個個的封裝器件晶片206。再者,在實施形態1中,雖然被加工物200是樹脂封裝基板,但在本發明中,並非限定於樹脂封裝基板,亦可為玻璃基板或陶瓷基板等。The workpiece 200 configured as described above is cut along the planned dividing line 203 by the cutting device 1 shown in FIG. 1 , and is divided into individual packaged device wafers 206 . Furthermore, in Embodiment 1, although the workpiece 200 is a resin-encapsulated substrate, in the present invention, it is not limited to a resin-encapsulated substrate, and may be a glass substrate, a ceramic substrate, or the like.

圖1所示之切削裝置1是將被加工物200保持於工作夾台10來沿著複數條分割預定線203進行切削加工之加工裝置。在實施形態1中,切削裝置1是以下之加工裝置(所謂的治具切割機):將未貼附有切割膠帶之被加工物200直接保持在工作夾台10,並將被加工物200以所謂的全切割(full cut)來分割成封裝器件晶片206。The cutting device 1 shown in FIG. 1 is a processing device that holds a workpiece 200 on a chuck 10 and performs cutting along a plurality of dividing lines 203 . In Embodiment 1, the cutting device 1 is a processing device (so-called jig cutting machine) that directly holds the workpiece 200 to which the dicing tape is not attached on the work chuck 10, and holds the workpiece 200 with A so-called full cut is used to singulate into packaged device wafers 206 .

如圖1所示,切削裝置1具備工作夾台10、切削單元20、拍攝單元30以及控制單元100,前述工作夾台10是以保持面11吸引保持被加工物200,前述切削單元20是一邊對已吸引保持在工作夾台10之被加工物200供給切削水一邊以切削刀片21切削分割預定線203,而將被加工物200分割成複數個封裝器件晶片206。如圖1所示,切削裝置1是具備有2個切削單元20,即雙主軸的切割機(dicer),也就是所謂的對向式雙主軸(Facing dual type)之切削裝置。As shown in FIG. 1 , the cutting device 1 includes a work holder 10, a cutting unit 20, an imaging unit 30, and a control unit 100. The work holder 10 sucks and holds a workpiece 200 on a holding surface 11. While supplying cutting water to the workpiece 200 sucked and held by the work chuck 10 , the cutting blade 21 cuts the dividing line 203 , and the workpiece 200 is divided into a plurality of packaged device wafers 206 . As shown in FIG. 1 , the cutting device 1 is equipped with two cutting units 20 , that is, a dicer with two spindles, which is a so-called facing dual type cutting device.

又,如圖1所示,切削裝置1具備第1工作夾台10-1與第2工作夾台10-2來作為工作夾台10。再者,以下,本說明書在區別這些時,會記載為第1工作夾台10-1與第2工作夾台10-2,在不區別時則僅記載為工作夾台10。第1工作夾台10-1之構成、與第2工作夾台10-2之構成是相等的。Moreover, as shown in FIG. 1 , the cutting device 1 includes a first work holder 10 - 1 and a second work holder 10 - 2 as the work holder 10 . In the following, when these are distinguished in this specification, they will be described as the first work chuck 10 - 1 and the second work chuck 10 - 2 , and only the work chuck 10 will be described when they are not distinguished. The configuration of the first chuck 10-1 is equal to the configuration of the second chuck 10-2.

又,切削裝置1具備使切削單元20與工作夾台10相對地移動之移動單元40。移動單元40具備:X軸移動單元41,為將工作夾台10朝和水平方向平行之X軸方向加工進給之加工進給單元;Y軸移動單元42,為使切削單元20朝和水平方向平行且和X軸方向正交之分度進給方向即Y軸方向移動之分度進給單元;Z軸移動單元43,使切削單元20朝平行於和X軸方向與Y軸方向分別正交之鉛直方向的切入進給方向即Z軸方向移動;及旋轉移動單元44,使工作夾台10繞著和Z軸方向平行之軸心旋轉。亦即,移動單元40是使工作夾台10與切削單元20在X軸方向、Y軸方向以及Z軸方向上相對地移動之單元。In addition, the cutting device 1 includes a moving unit 40 for relatively moving the cutting unit 20 and the chuck table 10 . The moving unit 40 has: an X-axis moving unit 41, which is a processing feed unit for processing the work clamp table 10 towards the X-axis direction parallel to the horizontal direction; a Y-axis moving unit 42, which is used to make the cutting unit 20 towards the horizontal direction. The indexing feed direction that is parallel to and orthogonal to the X-axis direction is the indexing feed unit that moves in the Y-axis direction; the Z-axis moving unit 43 makes the cutting unit 20 parallel to the X-axis direction and perpendicular to the Y-axis direction The cutting feed direction in the vertical direction is the Z-axis direction; and the rotating moving unit 44 makes the work clamping table 10 rotate around the axis parallel to the Z-axis direction. That is, the moving unit 40 is a unit that relatively moves the chuck table 10 and the cutting unit 20 in the X-axis direction, the Y-axis direction, and the Z-axis direction.

X軸移動單元41是藉由使工作夾台10與旋轉移動單元44一起在加工進給方向即X軸方向上移動,而使工作夾台10相對於切削單元20在X軸方向上移動之單元。X軸移動單元41讓工作夾台10沿著X軸方向在加工區域與搬入搬出區域之間移動,前述加工區域是切削單元20對已保持在工作夾台10之被加工物200進行切削加工之區域,前述搬入搬出區域是將被加工物200對工作夾台10搬入搬出之區域。在實施形態1中,X軸移動單元41和工作夾台10以1對1方式對應而設置有2個。X軸移動單元41會涵蓋加工區域與搬入搬出區域讓對應之工作夾台10在X軸方向上移動。The X-axis moving unit 41 is a unit that moves the work holder 10 in the X-axis direction relative to the cutting unit 20 by moving the work holder 10 in the processing feed direction, that is, the X-axis direction together with the rotation movement unit 44 . The X-axis moving unit 41 moves the work holder 10 along the X-axis between the processing area and the loading and unloading area. The aforementioned processing area is where the cutting unit 20 cuts the workpiece 200 held on the work holder 10 The area, the aforementioned loading and unloading area is an area for loading and unloading the workpiece 200 to and from the work chuck 10 . In Embodiment 1, two X-axis moving units 41 are provided in a one-to-one correspondence with the work chuck 10 . The X-axis moving unit 41 covers the processing area and the loading and unloading area to move the corresponding work holder 10 in the X-axis direction.

Y軸移動單元42是藉由使切削單元20相對於工作夾台10在分度進給方向即Y軸方向上移動,而使工作夾台10相對於切削單元20在Y軸方向上相對地移動之單元。Z軸移動單元43是藉由使切削單元20在切入進給方向即Z軸方向上移動,而使工作夾台10相對於切削單元20在Z軸方向上相對地移動之單元。The Y-axis moving unit 42 moves the cutting unit 20 relatively in the Y-axis direction relative to the cutting unit 20 by moving the cutting unit 20 in the index feed direction, that is, the Y-axis direction. unit. The Z-axis moving unit 43 is a unit that moves the chuck table 10 relative to the cutting unit 20 in the Z-axis direction by moving the cutting unit 20 in the Z-axis direction that is the cutting feed direction.

旋轉移動單元44是藉由X軸移動單元41而在X軸方向上移動,且使工作夾台10繞著和Z軸方向平行的軸心旋轉之單元。在實施形態1中,旋轉移動單元44和工作夾台10以1對1方式對應而設置有2個。旋轉移動單元44是使對應之工作夾台10以繞著和Z軸方向平行的軸心的方式旋轉之單元。The rotation movement unit 44 is a unit that moves in the X-axis direction by the X-axis movement unit 41 and rotates the work chuck 10 around an axis parallel to the Z-axis direction. In Embodiment 1, two rotational movement units 44 are provided in a one-to-one correspondence with the work chuck 10 . The rotational movement unit 44 is a unit that rotates the corresponding chuck table 10 around an axis parallel to the Z-axis direction.

X軸移動單元41、Y軸移動單元42以及Z軸移動單元43均具備習知的滾珠螺桿、習知的馬達及習知的導軌,前述滾珠螺桿是繞著軸心旋轉自如地設置,前述馬達使滾珠螺桿繞著軸心旋轉,前述導軌將工作夾台10或切削單元20支撐成在X軸方向、Y軸方向或Z軸方向上移動自如。The X-axis moving unit 41, the Y-axis moving unit 42, and the Z-axis moving unit 43 all have a known ball screw, a known motor, and a known guide rail. The ball screw is rotated around the axis, and the guide rail supports the chuck table 10 or the cutting unit 20 so as to be movable in the X-axis direction, the Y-axis direction, or the Z-axis direction.

如圖4所示,工作夾台10具備形成為矩形狀,且保持被加工物200之保持面11。如圖4所示,工作夾台10具備:本體部12,藉由具有導電性之金屬所構成且設置於旋轉移動單元44;及板狀的樹脂層13,由橡膠等具有彈性之非導電性的樹脂所構成,且設置於本體部12的表面上。As shown in FIG. 4 , the work chuck 10 is formed in a rectangular shape and has a holding surface 11 that holds a workpiece 200 . As shown in FIG. 4 , the work clamp table 10 includes: a main body 12 made of conductive metal and provided on a rotating movement unit 44; and a plate-shaped resin layer 13 made of elastic non-conductive material such as rubber. It is made of resin and is provided on the surface of the main body part 12 .

本體部12以及樹脂層13的平面形狀是形成為比被加工物200的平面形狀更大之矩形狀。本體部12的表面以及樹脂層13的表面是沿著水平方向呈平坦地形成。又,樹脂層13的表面是保持被加工物200之保持面11。亦即,工作夾台10的保持面11是以樹脂層13所構成。又,如圖5所示,樹脂層13是被接著劑14固定在本體部12的表面。像這樣,工作夾台10是在金屬製的本體部12鋪設作為保持面11之樹脂層13而構成。The planar shapes of the main body portion 12 and the resin layer 13 are formed in a rectangular shape larger than the planar shape of the workpiece 200 . The surface of the main body portion 12 and the surface of the resin layer 13 are formed flat along the horizontal direction. In addition, the surface of the resin layer 13 is the holding surface 11 for holding the workpiece 200 . That is, the holding surface 11 of the chuck table 10 is constituted by the resin layer 13 . Furthermore, as shown in FIG. 5 , the resin layer 13 is fixed to the surface of the main body portion 12 by the adhesive 14 . In this way, the work chuck 10 is formed by laying the resin layer 13 as the holding surface 11 on the metal main body 12 .

工作夾台10是被切削加工時供切削刀片21侵入之退刀溝15將保持面11區劃成複數個區域,且在保持面11之被退刀溝15所區劃出之區域中各自開口有用於吸引被加工物200以及封裝器件晶片206之吸引孔16。退刀溝15是設置在對應於分割預定線203之位置(和已保持在保持面11之被加工物200的分割預定線203重疊之位置)且以從保持面11凹陷的方式形成。在實施形態1中,退刀溝15貫通樹脂層13,並將樹脂層13按每個區域等來分割。The work clamping table 10 is the relief groove 15 for the cutting blade 21 to invade when it is cut and divides the holding surface 11 into a plurality of areas, and each opening in the area of the holding surface 11 divided by the relief groove 15 is used for The suction holes 16 for sucking the workpiece 200 and the packaged device wafer 206 . The relief groove 15 is provided at a position corresponding to the planned dividing line 203 (a position overlapping with the planned dividing line 203 of the workpiece 200 held on the holding surface 11 ) and is recessed from the holding surface 11 . In Embodiment 1, the relief groove 15 penetrates through the resin layer 13 and divides the resin layer 13 for each region.

吸引孔16是設置在和封裝器件晶片206對應之位置(亦即,和已保持在保持面11之被加工物200的封裝器件晶片206重疊之位置),且在保持面11的各區域開口。在實施形態1中,吸引孔16和封裝器件晶片206以1對1方式對應。吸引孔16是透過圖1所示之吸引路17以及開關閥18而連接於吸引源19。The suction hole 16 is provided at a position corresponding to the packaged device wafer 206 (that is, a position overlapping with the packaged device wafer 206 of the workpiece 200 held on the holding surface 11 ), and opens in each area of the holding surface 11 . In Embodiment 1, the suction hole 16 and the packaged device wafer 206 correspond to each other in a one-to-one manner. The suction hole 16 is connected to a suction source 19 through a suction path 17 and an on/off valve 18 shown in FIG. 1 .

工作夾台10是藉由以吸引源19對吸引孔16進行吸引,而將被加工物200以及封裝器件晶片206吸引保持在保持面11。再者,工作夾台10在將被加工物200以及封裝器件晶片206吸引保持於保持面11時,會有來自吸引源19的負壓從保持面11與被加工物200以及封裝器件晶片206之間的間隙洩漏之情形(亦即,稱為真空漏氣)。工作夾台10會有以下情形:因為真空漏氣,而在保持面11與被加工物200以及封裝器件晶片206之間產生靜電,並使其等帶電。The chuck 10 sucks and holds the workpiece 200 and the packaged device wafer 206 on the holding surface 11 by sucking the suction hole 16 with the suction source 19 . Moreover, when the work clamp 10 sucks and holds the workpiece 200 and the packaged device wafer 206 on the holding surface 11, there will be a negative pressure from the suction source 19 from the holding surface 11 and the workpiece 200 and the packaged device wafer 206. The gap between the leaks (that is, known as vacuum leaks). In the chuck 10 , static electricity is generated between the holding surface 11 , the workpiece 200 , and the packaged device wafer 206 due to a vacuum leak, and the static electricity is charged.

又,各工作夾台10-1、10-2是藉由X軸移動單元41而和旋轉移動單元44一起在X軸方向上移動,且藉由旋轉移動單元44而繞著和Z軸方向平行的軸心旋轉。在實施形態1中,各工作夾台10-1、10-2在對應之旋轉移動單元44上設置有一個。In addition, each work clamping table 10-1, 10-2 moves in the X-axis direction together with the rotation movement unit 44 by the X-axis movement unit 41, and rotates around and parallel to the Z-axis direction by the rotation movement unit 44. axis of rotation. In Embodiment 1, one work clamp table 10 - 1 , 10 - 2 is provided on the corresponding rotary movement unit 44 .

切削單元20是對以工作夾台10所保持之被加工物200進行切削加工之處理單元。切削單元20各自藉由Y軸移動單元42而相對於工作夾台10在Y軸方向上相對地且移動自如地設置,且藉由Z軸移動單元43而在Z軸方向上相對地且移動自如地設置。The cutting unit 20 is a processing unit for cutting the workpiece 200 held by the work chuck 10 . Each of the cutting units 20 is provided relatively and freely movable in the Y-axis direction with respect to the work chuck 10 by the Y-axis moving unit 42 , and is relatively and freely movable in the Z-axis direction by the Z-axis moving unit 43 . ground setting.

如圖1所示,切削單元20是透過Y軸移動單元42以及Z軸移動單元43等而設置在從裝置本體2豎立設置之門型的支撐框架3。切削單元20是藉由Y軸移動單元42以及Z軸移動單元43,而變得可將切削刀片21定位到工作夾台10的保持面11的任意的位置。As shown in FIG. 1 , the cutting unit 20 is installed on the door-shaped support frame 3 erected from the device body 2 through the Y-axis moving unit 42 and the Z-axis moving unit 43 . In the cutting unit 20 , the Y-axis moving unit 42 and the Z-axis moving unit 43 enable the cutting insert 21 to be positioned at an arbitrary position on the holding surface 11 of the chuck table 10 .

切削單元20是分別將切削刀片21裝設於主軸23,而對被加工物200進行切削加工之單元。如圖1所示,切削單元20具有對被工作夾台10所保持之被加工物200進行切削加工之切削刀片21、藉由Y軸移動單元42以及Z軸移動單元43而在Y軸方向以及Z軸方向上移動自如地設置之主軸殼體22、以繞著軸心且可旋轉的方式設置在主軸殼體22且被未圖示之馬達所旋轉並且於前端部裝設切削刀片21之主軸23、及對切削刀片21供給切削水之切削水供給噴嘴。The cutting unit 20 is a unit for cutting the workpiece 200 by installing the cutting blades 21 on the main shaft 23 . As shown in FIG. 1 , the cutting unit 20 has a cutting blade 21 for cutting the workpiece 200 held by the work holder 10, and moves in the Y-axis direction and the Z-axis direction by the Y-axis moving unit 42 and the Z-axis moving unit 43 The main shaft housing 22 is freely movable in the Z-axis direction, and the main shaft is provided on the main shaft housing 22 in a rotatable manner around the axis and is rotated by a motor not shown in the figure, and the cutting blade 21 is installed on the front end of the main shaft. 23. A cutting water supply nozzle for supplying cutting water to the cutting blade 21.

在實施形態1中,切削刀片21分別是具備圓環狀的圓形基台、與配設在圓形基台的外周緣並對被加工物200進行切削加工之圓環狀的切刃之所謂的輪轂型刀片(hub blade)。切刃是由鑽石或CBN(立方氮化硼,Cubic Boron Nitride)等之磨粒、與金屬或樹脂等之固定磨粒之黏結材(結合材)所形成,且形成為厚度固定之環狀。再者,在本發明中,切削刀片21亦可為僅以切刃所構成之所謂的墊圈型刀片(washer blade)。In Embodiment 1, the cutting insert 21 is a combination of an annular circular base and an annular cutting edge arranged on the outer peripheral edge of the circular base to cut the workpiece 200. The hub blade (hub blade). The cutting edge is made of diamond or CBN (cubic boron nitride, Cubic Boron Nitride) abrasive grains, and a bonding material (bonding material) with fixed abrasive grains such as metal or resin, and is formed into a ring shape with a constant thickness. Furthermore, in the present invention, the cutting blade 21 may also be a so-called washer blade constituted only by a cutting edge.

拍攝單元30已配置成和切削單元20一體地移動。拍攝單元30具備有對已保持在工作夾台10之切削前的被加工物200的應分割的區域進行攝影之拍攝元件。拍攝元件可為例如CCD(電荷耦合器件,Charge-Coupled Device)拍攝元件或CMOS(互補式金屬氧化物半導體,Complementary MOS)拍攝元件。拍攝單元30是對已保持在工作夾台10之被加工物200進行攝影,而得到用於完成校準等之圖像,並將所得到的圖像輸出至控制單元100,其中前述校準是進行被加工物200與切削刀片21之對位。The photographing unit 30 has been configured to move integrally with the cutting unit 20 . The imaging unit 30 includes an imaging element for imaging a region to be divided of the workpiece 200 held on the chuck 10 before cutting. The imaging element may be, for example, a CCD (Charge-Coupled Device, Charge-Coupled Device) imaging element or a CMOS (Complementary Metal Oxide Semiconductor, Complementary MOS) imaging element. The photographing unit 30 photographs the workpiece 200 held on the work clamp 10 to obtain images for calibration etc., and outputs the obtained images to the control unit 100, wherein the aforementioned calibration is performed Alignment between workpiece 200 and cutting insert 21 .

又,切削裝置1具備未圖示之X軸方向位置檢測單元、未圖示之Y軸方向位置檢測單元與Z軸方向位置檢測單元,前述X軸方向位置檢測單元是用於檢測工作夾台10的X軸方向之位置,前述Y軸方向位置檢測單元是用於檢測切削單元20的Y軸方向之位置,前述Z軸方向位置檢測單元是用於檢測切削單元20的Z軸方向之位置。X軸方向位置檢測單元以及Y軸方向位置檢測單元可以藉由和X軸方向或Y軸方向平行之線性標度尺、與讀取頭來構成。Z軸方向位置檢測單元是利用馬達的脈衝來檢測切削單元20的Z軸方向之位置。X軸方向位置檢測單元、Y軸方向位置檢測單元以及Z軸方向位置檢測單元會將工作夾台10的X軸方向、切削單元20的Y軸方向或Z軸方向之位置輸出至控制單元100。再者,在實施形態1中,切削裝置1的工作夾台10以及切削單元20的X軸方向、Y軸方向以及Z軸方向之位置是以將經事先決定之未圖示的原點位置作為基準之位置來決定。In addition, the cutting device 1 is provided with an unillustrated X-axis direction position detection unit, an unillustrated Y-axis direction position detection unit, and a Z-axis direction position detection unit. The X-axis direction position detection unit is used to detect the work chuck 10 The position in the X-axis direction of the above-mentioned Y-axis direction position detection unit is used to detect the position of the Y-axis direction of the cutting unit 20, and the aforementioned Z-axis direction position detection unit is used to detect the position of the Z-axis direction of the cutting unit 20. The position detection unit in the X-axis direction and the position detection unit in the Y-axis direction may be constituted by a linear scale parallel to the X-axis direction or the Y-axis direction, and a reading head. The position detection unit in the Z-axis direction detects the position of the cutting unit 20 in the Z-axis direction by using the pulse of the motor. The X-axis direction position detection unit, the Y-axis direction position detection unit and the Z-axis direction position detection unit will output the positions of the work clamp 10 in the X-axis direction, the cutting unit 20 in the Y-axis direction or the Z-axis direction to the control unit 100 . Furthermore, in Embodiment 1, the positions of the chuck table 10 and the cutting unit 20 of the cutting device 1 in the X-axis direction, the Y-axis direction, and the Z-axis direction are based on a previously determined origin position (not shown). The location of the benchmark is determined.

又,切削裝置1更具備靜電抑制部50,前述靜電抑制部50會抑制由樹脂層13即保持面11、與被加工物200以及封裝器件晶片206之間的間隙之真空漏氣所產生之靜電。在實施形態1中,靜電抑制部50是水供給部51,前述水供給部51以所供給之水52對本體部12與樹脂層13進行電性地連結。再者,實施形態1之切削裝置1的靜電抑制部50即水供給部51所供給之水52,宜為電阻率值比純水更低之水。In addition, the cutting device 1 further includes a static electricity suppression unit 50 that suppresses static electricity generated by a vacuum leak in the gap between the resin layer 13, that is, the holding surface 11, the workpiece 200, and the packaged device wafer 206. . In Embodiment 1, the static electricity suppression unit 50 is the water supply unit 51 , and the water supply unit 51 electrically connects the main body 12 and the resin layer 13 with the supplied water 52 . Furthermore, the water 52 supplied by the static electricity suppressing unit 50 of the cutting device 1 according to Embodiment 1, that is, the water supply unit 51, is preferably water having a resistivity value lower than that of pure water.

在實施形態1中,水供給部51是和工作夾台10以1對1方式對應設置,而將水52供給至對應之工作夾台10的保持面11之構成。在實施形態1中,水供給部51可從未圖示之水供給源被供給水52。水供給部51是沿著Y軸方向而延伸之配管,並固定於裝置本體2。水供給部51讓吐出所供給之水52的吐出口相向於保持面11,且在長度方向上隔著間隔而配置。水供給部51可在下方供被X軸移動單元41所移動之工作夾台10通過。水供給部51是從吐出口吐出水52,並使藉由X軸移動單元41而在X軸方向上移動之工作夾台10在下方通過,藉此朝保持面11供給水52,並藉由所供給之水52而將本體部12與樹脂層13電連接,來將由真空漏氣所產生之靜電放電到本體部12。In Embodiment 1, the water supply unit 51 is provided in a one-to-one correspondence with the work chuck 10 , and supplies water 52 to the holding surface 11 of the corresponding work chuck 10 . In Embodiment 1, the water supply unit 51 can be supplied with water 52 from a water supply source not shown. The water supply unit 51 is a pipe extending along the Y-axis direction, and is fixed to the device main body 2 . The water supply part 51 is arranged so that the discharge port which discharges the supplied water 52 faces the holding surface 11, and is arrange|positioned at intervals in the longitudinal direction. The water supply part 51 can pass the work chuck 10 moved by the X-axis moving unit 41 below. The water supply unit 51 spouts water 52 from the discharge port, and passes the chuck table 10 moved in the X-axis direction by the X-axis moving unit 41 below, thereby supplying the water 52 to the holding surface 11, and by The supplied water 52 electrically connects the main body 12 and the resin layer 13 to discharge static electricity generated by the vacuum leak to the main body 12 .

又,切削裝置1具備搬送單元60(顯示於圖7),前述搬送單元60會將切削加工前的被加工物200搬入到工作夾台10的保持面11上,並且將切削加工後的保持面11上的封裝器件晶片206從保持面11上搬出。In addition, the cutting device 1 is provided with a transfer unit 60 (shown in FIG. 7 ). The transfer unit 60 carries the workpiece 200 before cutting onto the holding surface 11 of the work holder 10, and transfers the holding surface after cutting. The packaged device wafer 206 on the holding surface 11 is carried out from the holding surface 11 .

控制單元100是分別控制切削裝置1的上述之各單元,而使切削裝置1實施對被加工物200之加工動作的單元。再者,控制單元100是具有運算處理裝置、記憶裝置與輸入輸出介面裝置之電腦,前述運算處理裝置具有CPU(中央處理單元,central processing unit)之類的微處理器,前述記憶裝置具有ROM(唯讀記憶體,read only memory)或RAM(隨機存取記憶體,random access memory)之類的記憶體。控制單元100的運算處理裝置是依照已記憶於記憶裝置之電腦程式來讓運算處理裝置實施運算處理,並將用於控制切削裝置1的控制訊號透過輸入輸出介面裝置輸出至切削裝置1的上述之構成要素。The control unit 100 is a unit that individually controls each of the above-mentioned units of the cutting device 1 so that the cutting device 1 performs a machining operation on the workpiece 200 . Furthermore, the control unit 100 is a computer having a computing processing device, a memory device and an input/output interface device, the aforementioned computing processing device has a microprocessor such as a CPU (central processing unit, central processing unit), and the aforementioned memory device has a ROM ( Memory such as read only memory (read only memory) or RAM (random access memory, random access memory). The arithmetic processing device of the control unit 100 is to allow the arithmetic processing device to perform arithmetic processing according to the computer program stored in the memory device, and output the control signal for controlling the cutting device 1 to the above-mentioned cutting device 1 through the input-output interface device. constituent elements.

又,控制單元100已連接於顯示單元與輸入單元,前述顯示單元是藉由顯示加工動作之狀態或圖像等的液晶顯示裝置等所構成,前述輸入單元可在操作人員登錄加工條件等之時使用。輸入單元可藉由設置於顯示單元之觸控面板、與鍵盤等之外部輸入裝置當中至少一種來構成。In addition, the control unit 100 is connected to a display unit and an input unit. The display unit is composed of a liquid crystal display device that displays the status of processing operations or images. The input unit can be used when the operator registers processing conditions, etc. use. The input unit may be constituted by at least one of a touch panel provided on the display unit, and an external input device such as a keyboard.

其次,說明前述之構成的切削裝置1的加工動作。圖6是示意地顯示對已吸引保持在圖1所示之切削裝置的第1工作夾台之被加工物進行切削加工之狀態的正面圖。圖7是示意地顯示將被加工物搬入圖6所示之切削裝置的第2工作夾台之狀態的正面圖。圖8是示意地顯示對已吸引保持在圖1所示之切削裝置的第1工作夾台之被加工物進行切削加工之狀態的側面圖。圖9是示意地顯示圖8所示之切削裝置的吸引保持有被加工物之第2工作夾台的側面圖。Next, the machining operation of the cutting device 1 having the aforementioned configuration will be described. Fig. 6 is a front view schematically showing a state in which a workpiece being sucked and held by the first chuck of the cutting device shown in Fig. 1 is being cut. Fig. 7 is a front view schematically showing a state in which a workpiece is carried into a second chuck of the cutting device shown in Fig. 6 . Fig. 8 is a side view schematically showing a state in which a workpiece held by suction and held by a first chuck of the cutting device shown in Fig. 1 is being cut. Fig. 9 is a side view schematically showing a second chuck of the cutting device shown in Fig. 8 that suctions and holds a workpiece.

前述之構成的切削裝置1是操作人員可操作輸入單元等,來對控制單元100設定加工條件。切削裝置1在控制單元100受理來自操作人員等之加工動作的開始指示後,即開始加工動作。In the cutting device 1 configured as described above, an operator can operate an input unit and the like to set machining conditions to the control unit 100 . The cutting device 1 starts the machining operation after the control unit 100 receives an instruction to start the machining operation from an operator or the like.

當開始加工動作時,切削裝置1是控制單元100會控制搬送單元60而將被加工物200的塑模樹脂205載置在搬入搬出區域之第1工作夾台10-1的保持面11。在加工動作中,切削裝置1會開啟開關閥18,來將被加工物200的塑模樹脂205吸引保持在第1工作夾台10-1的保持面11,且將主軸23繞著軸心旋轉,並將切削水供給到切削刀片21。切削裝置1是控制單元100會控制移動單元40來將第1工作夾台10-1從搬入搬出區域朝向加工區域移動到拍攝單元30的下方,並藉由拍攝單元30對已吸引保持在第1工作夾台10-1之被加工物200進行拍攝,來執行校準。When starting the machining operation, the control unit 100 of the cutting device 1 controls the transfer unit 60 to place the molded resin 205 of the workpiece 200 on the holding surface 11 of the first chuck 10-1 in the loading and unloading area. During the machining operation, the cutting device 1 opens the on-off valve 18 to attract and hold the molded resin 205 of the workpiece 200 on the holding surface 11 of the first chuck 10-1, and rotate the spindle 23 around the axis , and supply cutting water to the cutting blade 21. In the cutting device 1, the control unit 100 will control the moving unit 40 to move the first work clamping table 10-1 from the loading and unloading area toward the processing area to the bottom of the imaging unit 30, and the imaging unit 30 will hold the first clamping table 10-1 on the suction unit. The workpiece 200 of the work clamp 10-1 is photographed to perform calibration.

在加工動作中,切削裝置1是控制單元100會依據加工條件來控制移動單元40等,而如圖6所示,一邊使2個切削單元20雙方的切削刀片21與已吸引保持在第1工作夾台10-1之被加工物200沿著分割預定線203相對地移動,一邊使切削刀片21朝被加工物200的分割預定線203切入到侵入退刀溝15為止,來對已吸引保持在第1工作夾台10-1之被加工物200進行切削加工。In the processing operation, the cutting device 1 is that the control unit 100 controls the moving unit 40 etc. according to the processing conditions, and as shown in FIG. The workpiece 200 of the clamping table 10-1 moves relatively along the planned dividing line 203, and the cutting blade 21 cuts toward the planned dividing line 203 of the workpiece 200 until it enters the relief groove 15, so as to suck and hold the workpiece 200. The workpiece 200 of the first work holder 10-1 is cut.

又,在加工動作中,切削裝置1的控制單元100會進行:在已吸引保持在第1工作夾台10-1之被加工物200的切削加工中,將連接於第2工作夾台10-2之開關閥18關閉,並如圖6所示,一邊控制移動單元40使第2工作夾台10-2於靜電抑制部50即水供給部51的下方移動,一邊從水供給部51朝第2工作夾台10-2的保持面11供給水52。如圖7所示,所供給之水52可藉由表面張力等來覆蓋第2工作夾台10-2的保持面11,而將樹脂層13與本體部12電連接。In addition, in the processing operation, the control unit 100 of the cutting device 1 will perform: in the cutting process of the workpiece 200 that has been sucked and held on the first work holder 10-1, the workpiece 200 connected to the second work holder 10-1 will be connected to the second work holder 10-1. 2, the on-off valve 18 is closed, and as shown in Figure 6, while controlling the moving unit 40 to move the second work clamp table 10-2 in the electrostatic suppression part 50, that is, under the water supply part 51, it moves from the water supply part 51 to the first water supply part 51. 2 Water 52 is supplied to the holding surface 11 of the chuck table 10-2. As shown in FIG. 7 , the supplied water 52 can cover the holding surface 11 of the second chuck 10 - 2 by surface tension or the like, thereby electrically connecting the resin layer 13 and the main body 12 .

在加工動作中,切削裝置1的控制單元100在已吸引保持在第1工作夾台10-1之被加工物200的切削加工中時,如圖7所示,於控制移動單元40來將第2工作夾台10-2定位到搬入搬出區域後,會控制搬送單元60來將被加工物200的塑模樹脂205載置在搬入搬出區域的第2工作夾台10-2的保持面11。在加工動作中,切削裝置1會開啟開關閥18,來將被加工物200的塑模樹脂205吸引保持於第2工作夾台10-2的保持面11。此時,樹脂層13與本體部12可藉由水52而電連接,因為真空漏氣而在第2工作夾台10-2的保持面11產生之靜電會被放電到本體部12而受到抑制。During the processing operation, when the control unit 100 of the cutting device 1 is in the process of cutting the workpiece 200 that has been sucked and held on the first chuck 10-1, as shown in FIG. 2. After the work chuck 10-2 is positioned in the loading and unloading area, the transfer unit 60 is controlled to place the molded resin 205 of the workpiece 200 on the holding surface 11 of the second working chuck 10-2 in the loading and unloading area. During the machining operation, the cutting device 1 opens the on-off valve 18 to suck and hold the molding resin 205 of the workpiece 200 on the holding surface 11 of the second chuck 10-2. At this time, the resin layer 13 and the main body 12 can be electrically connected by the water 52, and the static electricity generated on the holding surface 11 of the second work clamp 10-2 due to a vacuum leak will be discharged to the main body 12 and suppressed. .

在加工動作中,切削裝置1的控制單元100在如圖8所示,已吸引保持在第1工作夾台10-1之被加工物200的切削加工中,會如圖9所示,將吸引保持有被加工物200之第2工作夾台10-2定位在搬入搬出區域來待機。如此進行,搬送單元60會在以第1工作夾台10-1所吸引保持之被加工物200的切削加工中時,將被加工物200搬入第2工作夾台10-2,並讓已保持於第2工作夾台10-2之被加工物200在搬入搬出區域中於切削加工前以已進行吸引保持之狀態來待機。During the machining operation, the control unit 100 of the cutting device 1 will suck and hold the workpiece 200 held on the first work holder 10-1 as shown in FIG. 8 , as shown in FIG. The second chuck table 10-2 holding the workpiece 200 is positioned in the loading and unloading area and stands by. In this way, the transfer unit 60 will carry the workpiece 200 into the second work holder 10-2 when the workpiece 200 attracted and held by the first work holder 10-1 is being cut, and let the workpiece 200 held The workpiece 200 on the second chuck table 10-2 is in a state of being sucked and held before cutting in the loading and unloading area.

切削裝置1是依照加工條件來切削已吸引保持在第1工作夾台10-1之被加工物200的分割預定線203,而將被加工物200分割成一個個的封裝器件晶片206。若對已吸引保持在第1工作夾台10-1之被加工物200的全部的分割預定線203進行切削加工來分割成封裝器件晶片206後,切削裝置1會將第1工作夾台10-1從加工區域朝向搬入搬出區域移動。又,切削裝置1會將第2工作夾台10-2從搬入搬出區域朝向加工區域來將第2工作夾台10-2移動至拍攝單元30的下方,並藉由拍攝單元30對已吸引保持在第2工作夾台10-2之被加工物200進行拍攝,來執行校準,且使2個切削單元20雙方的切削刀片21朝被加工物200的分割預定線203切入到讓切削刀片21侵入退刀溝15為止,來對已吸引保持在第2工作夾台10-2之被加工物200進行切削加工。The cutting device 1 cuts the planned dividing line 203 of the workpiece 200 sucked and held on the first chuck 10 - 1 according to the processing conditions, and divides the workpiece 200 into individual packaged device wafers 206 . After cutting all the planned division lines 203 of the workpiece 200 sucked and held on the first work chuck 10-1 to divide it into packaged device wafers 206, the cutting device 1 will place the first work chuck 10-1 1 Move from the processing area to the loading and unloading area. In addition, the cutting device 1 moves the second chuck table 10-2 from the loading and unloading area toward the processing area to move the second chucking table 10-2 to the bottom of the imaging unit 30, and the imaging unit 30 sucks and holds the second chucking table 10-2. The workpiece 200 is photographed on the second chuck 10-2 to perform calibration, and the cutting blades 21 of both cutting units 20 are cut toward the planned dividing line 203 of the workpiece 200 until the cutting blades 21 enter To the relief groove 15, the workpiece 200 that has been sucked and held in the second work chuck 10-2 is cut.

在加工動作中,切削裝置1會在已吸引保持在第2工作夾台10-2之被加工物200的切削加工中,控制搬送單元60而從已定位在搬入搬出區域之第1工作夾台10-1的保持面11將切削加工後的被加工物200亦即封裝器件晶片206搬出。在加工動作中,切削裝置1會在已吸引保持在第2工作夾台10-2之被加工物200的切削加工中,控制移動單元40而一邊使第1工作夾台10-1在靜電抑制部50即水供給部51的下方移動,一邊從水供給部51朝第1工作夾台10-1的保持面11供給水52,且在控制移動單元40而將第1工作夾台10-1定位到搬入搬出區域後,會控制搬送單元60來將切削加工前的被加工物200搬入第1工作夾台10-1,並在已吸引保持在第2工作夾台10-2之被加工物200的切削加工中,將吸引保持有切削加工前的被加工物200之第1工作夾台10-1定位在搬入搬出區域來待機。During the machining operation, the cutting device 1 controls the transfer unit 60 to move the workpiece 200 sucked and held in the second work chuck 10-2 from the first work chuck positioned in the loading and unloading area during the cutting process. The holding surface 11 of 10-1 carries out the packaged device wafer 206 which is the processed object 200 after cutting. During the processing operation, the cutting device 1 controls the movement unit 40 while the first work holder 10-1 is statically suppressed during the cutting process of the workpiece 200 held by the second work holder 10-2. The water supply part 50, that is, the water supply part 51, moves under the water supply part 51 toward the holding surface 11 of the first work clamp table 11 while supplying water 52, and the first work clamp table 10-1 is moved by controlling the moving unit 40. After being positioned in the loading and unloading area, the conveying unit 60 is controlled to carry the workpiece 200 before cutting into the first work clamping table 10-1, and the workpiece held in the second working clamping table 10-2 is sucked During the cutting process at 200, the first chuck table 10-1 that sucks and holds the workpiece 200 before cutting is positioned in the loading and unloading area and stands by.

如此進行,搬送單元60會在以第2工作夾台10-2所吸引保持之被加工物200的切削加工中,將已吸引保持在第1工作夾台10-1之切削加工後的被加工物200亦即封裝器件晶片206搬出,並將切削加工前的被加工物200搬入,藉此讓已保持在第1工作夾台10-1之被加工物200在搬入搬出區域中於切削加工前以已進行吸引保持之狀態來待機。像這樣,搬送單元60會在以工作夾台10-1、10-2當中的一者所吸引保持之被加工物200處於切削加工中時,將已吸引保持在另一者之切削加工後的被加工物200搬出並將切削加工前的被加工物200搬入,而讓被加工物200於切削加工前以已被吸引保持於另一者之狀態來待機。像這樣,切削裝置1會對已吸引保持在第1工作夾台10-1之被加工物200、與已吸引保持在第2工作夾台10-2之被加工物200交互地進行切削加工,來將被加工物200分割成一個個的封裝器件晶片206。In this way, the transfer unit 60 transfers the workpiece 200 sucked and held by the second chuck 10-2 to the workpiece 200 sucked and held by the first chuck 10-1 after cutting. The object 200, that is, the packaged device wafer 206 is carried out, and the processed object 200 before cutting is carried in, so that the processed object 200 that has been held on the first work clamp table 10-1 is carried out in the loading and unloading area before cutting. Standby in the state of attracting and holding. In this way, when the workpiece 200 attracted and held by one of the work chucks 10-1 and 10-2 is being cut, the transfer unit 60 will attract and hold the workpiece 200 after cutting by the other. The workpiece 200 is carried out and the workpiece 200 before cutting is carried in, and the workpiece 200 is kept on standby in a state of being attracted and held by the other before cutting. In this way, the cutting device 1 alternately cuts the workpiece 200 sucked and held on the first chuck 10-1 and the workpiece 200 sucked and held on the second chuck 10-2. The workpiece 200 is divided into packaged device wafers 206 one by one.

以上所說明之實施形態1之切削裝置1具備抑制因真空漏氣而產生之靜電的靜電抑制部50。靜電抑制部50是對樹脂層13與金屬製之本體部12進行電性地連結之類的供給水52之水供給部51。其結果,切削裝置1可以藉由靜電抑制部50即水供給部51,而發揮以下效果:可以連因真空漏氣而產生於工作夾台10的保持面11之些微的靜電都抑制,且可以減少被加工物200的靜電破壞。The cutting device 1 according to Embodiment 1 described above includes a static electricity suppression unit 50 that suppresses static electricity generated due to vacuum leaks. The static electricity suppression unit 50 is a water supply unit 51 that supplies water 52 such that the resin layer 13 and the metal main body 12 are electrically connected. As a result, the cutting device 1 can exert the effect that even slight static electricity generated on the holding surface 11 of the work chuck 10 due to a vacuum leak can be suppressed by the static electricity suppressing part 50, that is, the water supply part 51, and the static electricity can be suppressed. Electrostatic damage to the workpiece 200 is reduced.

[實施形態2] 依據圖式來說明本發明的實施形態2之切削裝置。圖10是實施形態2之切削裝置的工作夾台之主要部分的剖面圖。再者,在圖10中,對和實施形態1相同的部分,會附加相同符號而省略說明。 [Embodiment 2] A cutting device according to Embodiment 2 of the present invention will be described with reference to the drawings. Fig. 10 is a cross-sectional view of main parts of a chuck of a cutting device according to Embodiment 2. In addition, in FIG. 10, the same part as Embodiment 1 is attached|subjected with the same code|symbol, and description is abbreviate|omitted.

實施形態2之切削裝置1除了靜電抑制部50的構成不同以外,與實施形態1是相同的。實施形態2之切削裝置1之工作夾台10的圖10所示之樹脂層13-2是將碳粒等之導電性的物質混入橡膠等之具有彈性的樹脂,而具有導電性。又,實施形態2之切削裝置1之工作夾台10的圖10所示之接著劑14-2是將碳粒等之導電性的物質混入樹脂,而具有導電性。因此,樹脂層13-2會透過接著劑14-2而電連接於本體部12。The cutting device 1 of the second embodiment is the same as that of the first embodiment except that the structure of the static electricity suppression unit 50 is different. The resin layer 13-2 shown in FIG. 10 of the chuck 10 of the cutting device 1 according to the second embodiment is conductive by mixing conductive substances such as carbon particles into elastic resin such as rubber. In addition, the adhesive 14-2 shown in FIG. 10 of the chuck 10 of the cutting device 1 according to the second embodiment has conductivity by mixing conductive substances such as carbon particles into the resin. Therefore, the resin layer 13-2 is electrically connected to the main body 12 through the adhesive 14-2.

如此進行,在實施形態2中,靜電抑制部50是具有導電性之樹脂層13,且工作夾台10以具備導電性之接著劑14-2將具有導電性之樹脂層13-2固定在金屬製之本體部12。In this way, in Embodiment 2, the static electricity suppressing part 50 is the resin layer 13 with conductivity, and the work clamp 10 uses the adhesive 14-2 with conductivity to fix the resin layer 13-2 with conductivity to the metal surface. The body portion 12 of the system.

實施形態2之切削裝置1具備抑制因真空漏氣而產生之靜電的靜電抑制部50。靜電抑制部50是工作夾台10之具有導電性的樹脂層13。其結果,切削裝置1可以藉由靜電抑制部50即樹脂層13,而發揮以下效果:可以連因真空漏氣而產生於工作夾台10的保持面11之些微的靜電都抑制,且可以減少被加工物200的靜電破壞。The cutting device 1 according to the second embodiment is provided with a static electricity suppression unit 50 for suppressing static electricity generated due to a vacuum leak. The static electricity suppression part 50 is the conductive resin layer 13 of the work clamp 10 . As a result, the cutting device 1 can use the static electricity suppressing part 50, that is, the resin layer 13, to exert the following effects: even the slight static electricity generated on the holding surface 11 of the work chuck 10 due to a vacuum leak can be suppressed, and the static electricity can be reduced. The object to be processed 200 is destroyed by static electricity.

再者,本發明並不受限於上述實施形態。亦即,在不脫離本發明之要點的範圍內,可以進行各種變形來實施。In addition, this invention is not limited to the said embodiment. That is, various modifications and implementations are possible without departing from the gist of the present invention.

1:切削裝置 2:裝置本體 3:支撐框架 10:工作夾台 10-1:第1工作夾台 10-2:第2工作夾台 11:保持面 12:本體部 13:樹脂層 13-2:樹脂層(靜電抑制部) 14,14-2:接著劑 15:退刀溝 16:吸引孔 17:吸引路 18:開關閥 19:吸引源 20:切削單元 21:切削刀片 22:主軸殼體 23:主軸 30:拍攝單元 40:移動單元 41:X軸移動單元 42:Y軸移動單元 43:Z軸移動單元 44:旋轉移動單元 50:靜電抑制部 51:水供給部 52:水 60:搬送單元 100:控制單元 200:被加工物 201:基板 202:正面 203:分割預定線 204:背面 205:塑模樹脂 206:封裝器件晶片 X,Y,Z:方向 1: Cutting device 2: Device body 3: Support frame 10: Work clamp table 10-1: The first work clamp 10-2: The second work clamp 11: keep the surface 12: Main body 13: resin layer 13-2: Resin layer (static suppression part) 14,14-2: Adhesive 15: Retraction groove 16: Attraction hole 17: Attraction Road 18: switch valve 19: Source of Attraction 20: Cutting unit 21: Cutting blade 22: Spindle housing 23: Spindle 30: Shooting unit 40: mobile unit 41: X-axis moving unit 42: Y-axis mobile unit 43: Z-axis mobile unit 44:Rotate mobile unit 50: Static suppression department 51: Water supply department 52: water 60: Transfer unit 100: control unit 200: processed object 201: Substrate 202: front 203: Divide scheduled line 204: back 205: molding resin 206: Package device wafer X, Y, Z: direction

圖1是顯示實施形態1之切削裝置的構成例的立體圖。 圖2是顯示圖1所示之切削裝置的加工對象的被加工物之一例的立體圖。 圖3是從背面側觀看圖2所示之被加工物的立體圖。 圖4是圖1所示之切削裝置的工作夾台的立體圖。 圖5是圖4所示之工作夾台的主要部分的剖面圖。 圖6是示意地顯示對已吸引保持在圖1所示之切削裝置的第1工作夾台之被加工物進行切削加工之狀態的正面圖。 圖7是示意地顯示將被加工物搬入圖6所示之切削裝置的第2工作夾台之狀態的正面圖。 圖8是示意地顯示對已吸引保持在圖1所示之切削裝置的第1工作夾台之被加工物進行切削加工之狀態的側面圖。 圖9是示意地顯示圖8所示之切削裝置的吸引保持有被加工物之第2工作夾台的側面圖。 圖10是實施形態2之切削裝置的工作夾台之主要部分的剖面圖。 Fig. 1 is a perspective view showing a configuration example of a cutting device according to the first embodiment. Fig. 2 is a perspective view showing an example of a workpiece to be processed by the cutting device shown in Fig. 1 . Fig. 3 is a perspective view of the workpiece shown in Fig. 2 viewed from the back side. Fig. 4 is a perspective view of the work clamp of the cutting device shown in Fig. 1 . Fig. 5 is a cross-sectional view of main parts of the work chuck shown in Fig. 4 . Fig. 6 is a front view schematically showing a state in which a workpiece being sucked and held by the first chuck of the cutting device shown in Fig. 1 is being cut. Fig. 7 is a front view schematically showing a state in which a workpiece is carried into a second chuck of the cutting device shown in Fig. 6 . Fig. 8 is a side view schematically showing a state in which a workpiece held by suction and held by a first chuck of the cutting device shown in Fig. 1 is being cut. Fig. 9 is a side view schematically showing a second chuck of the cutting device shown in Fig. 8 that suctions and holds a workpiece. Fig. 10 is a cross-sectional view of main parts of a chuck of a cutting device according to Embodiment 2.

1:切削裝置 1: Cutting device

2:裝置本體 2: Device body

3:支撐框架 3: Support frame

10:工作夾台 10: Work clamp table

10-1:第1工作夾台 10-1: The first work clamp

10-2:第2工作夾台 10-2: The second work clamp

11:保持面 11: keep the surface

17:吸引路 17: Attraction Road

18:開關閥 18: switch valve

19:吸引源 19: Source of Attraction

20:切削單元 20: Cutting unit

21:切削刀片 21: Cutting blade

22:主軸殼體 22: Spindle housing

23:主軸 23: Spindle

30:拍攝單元 30: Shooting unit

40:移動單元 40: mobile unit

41:X軸移動單元 41: X-axis moving unit

42:Y軸移動單元 42: Y-axis mobile unit

43:Z軸移動單元 43: Z-axis mobile unit

44:旋轉移動單元 44:Rotate mobile unit

50:靜電抑制部 50: Static suppression department

51:水供給部 51: Water supply department

52:水 52: water

100:控制單元 100: control unit

X,Y,Z:方向 X, Y, Z: direction

Claims (5)

一種切削裝置,具備: 切削單元,將切削刀片裝設於主軸來切削被加工物; 工作夾台,被該切削刀片的退刀溝將保持面區劃成複數個區域,吸引保持被加工物之吸引孔在該保持面的該區域開口;及 移動單元,使該切削單元與該工作夾台相對地移動, 前述切削裝置更具備靜電抑制部,前述靜電抑制部會抑制由該工作夾台的該保持面與該被加工物之間的間隙之真空漏氣所產生之靜電。 A cutting device comprising: The cutting unit installs the cutting blade on the main shaft to cut the workpiece; In the work clamping table, the holding surface is divided into a plurality of areas by the relief groove of the cutting insert, and the suction hole for attracting and holding the workpiece is opened in the area of the holding surface; and moving the unit so that the cutting unit moves relative to the work clamp, The cutting device further includes a static electricity suppressing portion that suppresses static electricity generated by a vacuum leak in a gap between the holding surface of the work chuck and the workpiece. 如請求項1之切削裝置,其中該工作夾台是在金屬製的本體部鋪設作為該保持面之樹脂層而構成, 該靜電抑制部是水供給部,前述水供給部以所供給之水來對該本體部與該樹脂層進行電性地連結。 The cutting device according to claim 1, wherein the work clamp is formed by laying a resin layer as the holding surface on the metal body, The static electricity suppression part is a water supply part, and the water supply part electrically connects the main body part and the resin layer with the supplied water. 如請求項1之切削裝置,其中該工作夾台是在金屬製的本體部鋪設作為該保持面之樹脂層而構成, 該靜電抑制部是具有導電性之該樹脂層。 The cutting device according to claim 1, wherein the work clamp is formed by laying a resin layer as the holding surface on the metal body, The static electricity suppression part is the resin layer having conductivity. 如請求項3之切削裝置,其中該樹脂層是以具備導電性之接著劑固定在金屬製的該本體部。The cutting device according to claim 3, wherein the resin layer is fixed to the metal main body with a conductive adhesive. 如請求項1至4中任一項之切削裝置,其中該工作夾台具備第1工作夾台與第2工作夾台,搬送單元會在其中一個該工作夾台所吸引保持之被加工物處於加工中時,對另一個該工作夾台搬出加工後的被加工物並搬入加工前的被加工物,且該被加工物會在加工前以受到吸引保持之狀態來待機。The cutting device according to any one of claims 1 to 4, wherein the work holder has a first work holder and a second work holder, and the transfer unit is processing the workpiece attracted and held by one of the work holders During the middle, the processed workpiece is unloaded from the other work chuck and the unprocessed workpiece is loaded in, and the processed workpiece is held in a state of being sucked and held before processing.
TW111106027A 2021-03-04 2022-02-18 Cutting device capable of suppressing slight static electricity generated by vacuum leakage TW202236399A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-034219 2021-03-04
JP2021034219A JP2022134805A (en) 2021-03-04 2021-03-04 Cutting device

Publications (1)

Publication Number Publication Date
TW202236399A true TW202236399A (en) 2022-09-16

Family

ID=83067272

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111106027A TW202236399A (en) 2021-03-04 2022-02-18 Cutting device capable of suppressing slight static electricity generated by vacuum leakage

Country Status (4)

Country Link
JP (1) JP2022134805A (en)
KR (1) KR20220125172A (en)
CN (1) CN115008321A (en)
TW (1) TW202236399A (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6173173B2 (en) 2013-11-11 2017-08-02 株式会社ディスコ Cutting equipment

Also Published As

Publication number Publication date
JP2022134805A (en) 2022-09-15
KR20220125172A (en) 2022-09-14
CN115008321A (en) 2022-09-06

Similar Documents

Publication Publication Date Title
JP7165510B2 (en) Transfer jig and replacement method
JP2020203358A (en) Cutting apparatus and replacement method
JP7045841B2 (en) Cutting equipment
US10974364B2 (en) Cutting blade mounting mechanism
TWI823988B (en) polishing pad
TW202138120A (en) Cutting device can easily attach and detach a plurality of work chucks of different sizes to and from the base of the workbench
US20190084175A1 (en) Cutting blade mounting mechanism
CN110497270B (en) Cutting device
JP5340832B2 (en) Mounting flange end face correction method
JP6973931B2 (en) Cutting equipment
JP6847512B2 (en) Cutting equipment and cutting method
TW202236399A (en) Cutting device capable of suppressing slight static electricity generated by vacuum leakage
TW202145336A (en) Dressing member
TW202114819A (en) Processing device capable of suppressing breakage of a cutting blade at the time of replacement
JP7333749B2 (en) How to measure suction power
KR20240035707A (en) Installing method and cutting apparatus
JP7483369B2 (en) Cutting Equipment
JP2021122883A (en) Holding table
TW202116482A (en) Chuck table of cutting apparatus capable of reducing processing costs and shortening delivery time
TW202331921A (en) Support device for plate-like object capable of restraining the plate-like object from deviating from its position
JP2021145016A (en) Processing method for workpiece and chip carrying jig
JP2022175315A (en) Cutting method for workpiece and cutting device therefor
KR20210079185A (en) Holding table
JP2021183356A (en) Cutting blade
JP2021013968A (en) Processing device