TW202229111A - A gas-liquid mixing filling device and a gas-liquid mixing filling method - Google Patents
A gas-liquid mixing filling device and a gas-liquid mixing filling method Download PDFInfo
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本發明係有關於一種氣液混合充填裝置及方法。The present invention relates to a gas-liquid mixing filling device and method.
按,液體具有可將氣體溶解於其中之特性,藉此可製造出碳酸飲料或是其它溶有大量氣體之混合液體,而由於液體在溫度越低時氣體溶解率越高,因此一般在將混合液體充填至容器時會採取低溫充填,然而如此會因為將產線保持低溫而大量耗電。如以常溫充填之方式進行充填,充填槽內之混合液體會釋放出大量氣體,而使得充填槽需要大幅加高高度及寬度,以容納混合液體所釋出之氣體及確保混合液體之充填量,如此會導致充填槽之結構過高過大,而影響充填槽之製造成本過大及廠房場地受限,存在亟待改善之缺弊。According to the press, the liquid has the property of dissolving gas in it, thereby making carbonated beverages or other mixed liquids with a large amount of gas dissolved. Low-temperature filling is used when filling liquids into containers, but this consumes a lot of power by keeping the line cold. If filling is carried out at room temperature, the mixed liquid in the filling tank will release a large amount of gas, so that the filling tank needs to be greatly increased in height and width to accommodate the gas released by the mixed liquid and ensure the filling volume of the mixed liquid. As a result, the structure of the filling tank is too high and too large, which affects the manufacturing cost of the filling tank and the limited plant space, and there are disadvantages that need to be improved urgently.
因此,有必要提供一種新穎且具有進步性之氣液混合充填裝置及方法,以解決上述之問題。Therefore, it is necessary to provide a novel and progressive gas-liquid mixing filling device and method to solve the above problems.
本發明之主要目的在於提供一種氣液混合充填裝置,可在無須將充填本體加高加大的情況下,即可提供高充填量,以確保充填混合液體之效率。The main purpose of the present invention is to provide a gas-liquid mixing filling device, which can provide a high filling volume without increasing the height of the filling body, so as to ensure the efficiency of filling the mixed liquid.
為達成上述目的,本發明提供一種氣液混合充填裝置,包一槽室、一充填本體、一第一管路及一第二管路。該槽室定義位於相對上方之一第一氣室及位於相對下方之一第一混液空間。該充填本體包括一容室及複數注入口,該容室定義位於相對上方之一第二氣室及位於相對下方之一第二混液空間,該複數注入口連通該第二混液空間,該槽室之頂面高於該容室之底面。該第一管路連通於該槽室之第一氣室及該容室之第二氣室。該第二管路連通於該槽室之第一混液空間及該容室之第二混液空間。In order to achieve the above object, the present invention provides a gas-liquid mixing filling device, which includes a tank chamber, a filling body, a first pipeline and a second pipeline. The tank chamber defines a first air chamber relatively above and a first liquid mixing space relatively below. The filling body includes a chamber and a plurality of injection ports, the chamber defines a second air chamber located relatively above and a second mixed liquid space located relatively below, the plurality of injection ports communicate with the second liquid mixture space, and the tank chamber The top surface is higher than the bottom surface of the chamber. The first pipeline is communicated with the first air chamber of the tank chamber and the second air chamber of the container chamber. The second pipeline is communicated with the first liquid mixing space of the tank chamber and the second liquid mixing space of the container chamber.
為達成上述目的,本發明另提供一種氣氣液混合充填方法,包括以下步驟:備一混合槽,將一氣液混合物注入該混合槽;備一槽室,藉由一第三管路將該氣液混合物自該混合槽導入該槽室,使該槽室定義出位於相對上方之一第一氣室及位於相對下方之一第一混液空間;備一充填本體,該充填本體設有一容室及複數注入口,該容室定義位於相對上方之一第二氣室及位於相對下方之一第二混液空間,該槽室之頂面高於該容室之底面,並將一第一管路連通於該槽室之第一氣室及該容室之第二氣室,以及將一第二管路連通於該槽室之第一混液空間及該容室之第二混液空間;使該複數注入口連通該第二混液空間,該等注入口即可將位於該第二混液空間內之液體注入複數容器內。In order to achieve the above object, the present invention further provides a gas-gas-liquid mixed filling method, comprising the following steps: preparing a mixing tank, injecting a gas-liquid mixture into the mixing tank; preparing a tank chamber, and using a third pipeline to fill the gas The liquid mixture is introduced into the tank chamber from the mixing tank, so that the tank chamber defines a first air chamber located relatively above and a first mixed liquid space located relatively below; a filling body is prepared, and the filling body is provided with a chamber and A plurality of injection ports, the chamber defines a second air chamber located relatively above and a second liquid mixing space located relatively below, the top surface of the tank chamber is higher than the bottom surface of the chamber, and a first pipeline is communicated In the first air chamber of the tank chamber and the second air chamber of the chamber, and a second pipeline is connected to the first mixed liquid space of the tank chamber and the second mixed liquid space of the chamber; The inlet is communicated with the second liquid mixing space, and the injection ports can inject the liquid in the second liquid mixing space into the plurality of containers.
以下僅以實施例說明本發明可能之實施態樣,然並非用以限制本發明所欲保護之範疇,合先敘明。The following examples only illustrate possible implementations of the present invention, but are not intended to limit the scope of protection of the present invention, and are described together first.
請參考圖1至2,其顯示本發明之一較佳實施例,本發明之氣液混合充填裝置包括一槽室2、一充填本體3、一第一管路42及一第二管路43。Please refer to FIGS. 1 to 2 , which show a preferred embodiment of the present invention. The gas-liquid mixing filling device of the present invention includes a
該槽室2定義位於相對上方之一第一氣室21及位於相對下方之一第一混液空間22,當該氣液混合物流動至該槽室2時,該氣液混合物中之部分氣體即會溶出至該第一氣室21。The
該充填本體3包括一容室31及複數注入口32,該容室31定義位於相對上方之一第二氣室311及位於相對下方之一第二混液空間312,該複數注入口32連通該第二混液空間312,該槽室2之頂面高於該容室31之底面,以使該槽室2之內部與該容室31之內部至少部分於相同水平高度。於本實施例中該氣液混合物為常溫狀態之碳酸液體。The filling
該第一管路42連通於該槽室2之第一氣室21及該容室31之第二氣室311。The
該第二管路43連通於該槽室2之第一混液空間22及該容室31之第二混液空間312。The
於本實施例中另包括一混合槽1、該混合槽1供容設一氣液混合物,一第三管路41連通於該混合槽1與該槽室2之間,於本實施例中該氣液混合物為碳酸飲料,於其他實施例中亦可為其它具有氣液混合之物體。In this embodiment, a
藉此,位於該第一混液空間22內之液體可藉由該第一管路42流入至該第二混液空間312,該等注入口32即可分別將該第二混液空間312內之液體注入複數容器,以進行充填作業,且由於該第一管路42係連通於該第一氣室21與該第二氣室311,該槽室2之內部與該容室31之內部為同樣壓力,該第一混液空間22內之液體可經由該第一管路42順利地流入至該第二混液空間312,因此該容室31之整體高度及橫向面積無需過大,可節省製造該充填本體之材料成本,且可進行快速大量地充填作業。Therefore, the liquid in the first mixed
其中,該第三管路41設有一控制閥44,以控制該混合槽1與該槽室2之連通,以控制該混合槽1內之該氣液混合物的總量。The
較佳地,該第一管路42連通於該槽室2之頂部及該容室31之頂部,以確保僅有氣體可順利地通過該第一管路42,以平衡該槽室2及該容室31內之壓力。Preferably, the
同樣較佳地,該第二管路43連通於該槽室2之底部及該容室31之底部,以確保僅有液體可順利地通過該第二管路43。Also preferably, the
另外,該槽室2之高度定義一第一高度H1,該容室31之高度定義一第二高度H2,該第一高度H1小於該第二高度H2,且該槽室2之容積小於該容室31之容積,可使該槽室2之製造成本較低。In addition, the height of the
本發明另提供一種氣氣液混合充填方法,包括以下步驟:備一混合槽1,將一氣液混合物注入該混合槽1;備一槽室2,藉由一第三管路41將該氣液混合物自該混合槽1導入該槽室2,使該槽室2定義出位於相對上方之一第一氣室21及位於相對下方之一第一混液空間22;備一充填本體3,該充填本體3設有一容室31及複數注入口32,該容室31定義位於相對上方之一第二氣室311及位於相對下方之一第二混液空間312,該槽室2之頂面高於該容室31之底面,並將一第一管路42連通於該槽室2之第一氣室21及該容室31之第二氣室311,以及將一第二管路43連通於該槽室2之第一混液空間22及該容室31之第二混液空間312;使該複數注入口32連通該第二混液空間312,該等注入口32即可將位於該第二混液空間312內之液體注入複數容器內,以進行充填作業。The present invention further provides a gas-gas-liquid mixing filling method, comprising the following steps: preparing a
綜上,本發明之氣液混合充填裝置及方法,由於該第一管路係連通於該第一氣室與該第二氣室,該槽室之內部與該容室之內部為同樣壓力,該第一混液空間內之液體可經由該第一管路順利地流入至該第二混液空間,因此該容室之整體高度及橫向面積無需過大,可節省製造該充填本體之材料成本,且可進行快速大量地充填作業。To sum up, in the gas-liquid mixing filling device and method of the present invention, since the first pipeline system is connected to the first air chamber and the second air chamber, the interior of the tank chamber and the interior of the chamber are at the same pressure, The liquid in the first liquid mixing space can smoothly flow into the second liquid mixing space through the first pipeline, so the overall height and lateral area of the chamber need not be too large, which can save the material cost of manufacturing the filling body, and can Perform fast and large filling operations.
1:混合槽 2:槽室 21:第一氣室 22:第一混液空間 3:充填本體 31:容室 311:第二氣室 312:第二混液空間 32:注入口 41:第三管路 42:第一管路 43:第二管路 44:控制閥 H1:第一高度 H2:第二高度 1: mixing tank 2: tank chamber 21: The first air chamber 22: The first mixing space 3: Fill the body 31: Room 311: Second air chamber 312: The second mixing space 32: Injection port 41: The third pipeline 42: The first pipeline 43: Second pipeline 44: Control valve H1: first height H2: second height
圖1及2為本發明一較佳實施例之示意圖。1 and 2 are schematic diagrams of a preferred embodiment of the present invention.
1:混合槽 1: mixing tank
2:槽室 2: tank chamber
21:第一氣室 21: The first air chamber
22:第一混液空間 22: The first mixing space
3:充填本體 3: Fill the body
31:容室 31: Room
311:第二氣室 311: Second air chamber
312:第二混液空間 312: The second mixing space
32:注入口 32: Injection port
41:第三管路 41: The third pipeline
42:第一管路 42: The first pipeline
43:第二管路 43: Second pipeline
44:控制閥 44: Control valve
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