TW202225733A - Optical lens assembly, imaging apparatus and electronic device - Google Patents

Optical lens assembly, imaging apparatus and electronic device Download PDF

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TW202225733A
TW202225733A TW110121227A TW110121227A TW202225733A TW 202225733 A TW202225733 A TW 202225733A TW 110121227 A TW110121227 A TW 110121227A TW 110121227 A TW110121227 A TW 110121227A TW 202225733 A TW202225733 A TW 202225733A
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optical lens
reflection coating
following conditions
reflection
coating
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TW110121227A
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Chinese (zh)
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TWI790637B (en
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蔡溫祐
張建邦
紀奇瑋
洪偉峰
鄧鈞鴻
朱國強
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大立光電股份有限公司
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Priority to US17/553,939 priority Critical patent/US20220196881A1/en
Priority to CN202123209291.XU priority patent/CN217506245U/en
Priority to CN202210072356.0A priority patent/CN114660769A/en
Priority to CN202111562727.5A priority patent/CN114660767A/en
Priority to EP21216705.0A priority patent/EP4075171A1/en
Priority to BR102021026221-4A priority patent/BR102021026221A2/en
Priority to US17/577,051 priority patent/US20220196882A1/en
Publication of TW202225733A publication Critical patent/TW202225733A/en
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Publication of TWI790637B publication Critical patent/TWI790637B/en

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Abstract

According to the present disclosure, an optical lens assembly includes, from an object side to an image side, at least four optical lenses. At least one optical lens of the at least four optical lenses includes an anti-reflective coating. The optical lens having the anti-reflective coating is made of a plastic material. The anti-reflective coating is disposed on an object-side surface or an image-side surface of the optical lens. The anti-reflective coating includes at least one coating layer. The coating layer at the outermost of the anti-reflective coating is made of ceramics. The anti-reflective coating includes a plurality of holes. The sizes of the holes adjacent to the outermost of the anti-reflective coating are larger than the sizes of the holes adjacent to the innermost of the anti-reflective coating. Therefore, the best anti-reflective effect of the optical lens assembly with multiple optical lenses can be obtained, and the imaging quality of the optical lens assembly can be significantly enhanced.

Description

光學鏡頭、取像裝置及電子裝置Optical lens, imaging device and electronic device

本揭示內容是有關於一種光學鏡頭及取像裝置,且特別是有關於一種可抗反射的光學鏡頭及取像裝置。The present disclosure relates to an optical lens and an imaging device, and more particularly, to an anti-reflection optical lens and an imaging device.

習知鍍膜技術(PVD與一般CVD)僅能在平面上製作出可用的抗反射鍍膜。在高階行動裝置中,對高品質鏡頭的要求大幅提升,高階光學鏡頭的鏡片數量相應顯著增加,由於光學系統的設計難度加劇與鏡片數量提升,在大離軸視場像差須強化修正的原因下,導致靠近成像面的光學鏡片面型變化幅度大增,成為習知鍍膜技術無法克服的瓶頸。因此,在高階多鏡片光學系統與面型變化劇烈的光學鏡片上研發高均勻度的鍍膜技術已是趨勢所需。Conventional coating techniques (PVD and general CVD) can only produce usable anti-reflection coatings on flat surfaces. In high-end mobile devices, the requirements for high-quality lenses have been greatly increased, and the number of lenses in high-end optical lenses has increased significantly. Due to the intensified design difficulty of the optical system and the increase in the number of lenses, the aberrations in large off-axis fields of view need to be strengthened and corrected. This leads to a large change in the surface shape of the optical lens close to the imaging surface, which becomes a bottleneck that cannot be overcome by the conventional coating technology. Therefore, it is a trend to develop high-uniformity coating technology on high-level multi-lens optical systems and optical lenses with sharp surface changes.

本揭示內容係研發多光學鏡片的光學鏡頭,其應用原子層沉積法鍍膜(ALD,Atomic Layer Deposit)技術,以特定多重抗反射鍍膜因子進行設計,而獲得優異的鍍膜配置。藉由抗反射鍍膜表面的次波長微結構之特性,使具有多光學鏡片的高品質光學鏡頭能夠獲得最佳抗反射效果,以解決劇烈面型變化的光學鏡片所造成的大角度強光嚴重反射問題,使彎曲變化的光學鏡片在全視場內,能夠達到均勻的抗反射鍍膜(AR Coating)製作效果。藉此,將光學鏡片組合應用在多光學鏡片的光學鏡頭時,有助於顯著提升高階光學鏡頭的成像品質。The present disclosure is to develop an optical lens of a multi-optical lens, which applies the atomic layer deposition (ALD, Atomic Layer Deposit) technology and is designed with specific multiple anti-reflection coating factors to obtain an excellent coating configuration. With the characteristics of the sub-wavelength microstructure on the surface of the anti-reflection coating, the high-quality optical lens with multi-optical lens can obtain the best anti-reflection effect, so as to solve the serious reflection of large-angle strong light caused by the optical lens with severe surface changes. The problem is that the optical lens with the bending change can achieve a uniform anti-reflection coating (AR Coating) production effect in the full field of view. Thereby, when the optical lens combination is applied to the optical lens of the multi-optical lens, the imaging quality of the high-end optical lens can be significantly improved.

依據本揭示內容提供的一種光學鏡頭,其由物側至像側包含至少四光學鏡片。所述至少四光學鏡片中至少一光學鏡片包含一抗反射鍍膜,包含抗反射鍍膜的光學鏡片由一塑膠材料所製成,抗反射鍍膜位於光學鏡片的物側表面或像側表面,抗反射鍍膜包含至少一膜層,位於抗反射鍍膜最外側的膜層之材質為陶瓷,抗反射鍍膜包含複數個孔洞,且鄰近抗反射鍍膜最外側的孔洞之尺寸大於鄰近抗反射鍍膜最內側的孔洞之尺寸。位於光學鏡片中心處的抗反射鍍膜的總厚度為Tc,位於光學鏡片周邊處的抗反射鍍膜的總厚度為Tp,光學鏡頭的抗反射鍍膜配置主因子為FAR,其滿足下列條件:|Tc-Tp|/Tc ≤ 5.00%;以及-1.5 ≤ FAR。An optical lens provided according to the present disclosure includes at least four optical lenses from the object side to the image side. At least one of the at least four optical lenses includes an anti-reflection coating, the optical lens including the anti-reflection coating is made of a plastic material, the anti-reflection coating is located on the object side surface or the image side surface of the optical lens, and the anti-reflection coating It includes at least one film layer, the material of the film layer located on the outermost side of the anti-reflection coating is ceramic, the anti-reflection coating contains a plurality of holes, and the size of the outermost hole adjacent to the anti-reflective coating is larger than the size of the innermost hole adjacent to the anti-reflective coating . The total thickness of the anti-reflection coating at the center of the optical lens is Tc, and the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp. The main factor of the anti-reflection coating configuration of the optical lens is FAR, which satisfies the following conditions: |Tc- Tp|/Tc ≤ 5.00%; and -1.5 ≤ FAR.

依據本揭示內容提供的一種取像裝置,其包含一光學鏡頭、一繞射元件以及一電子感光元件。光學鏡頭由物側至像側包含至少四光學鏡片,所述至少四光學鏡片中至少一光學鏡片包含一抗反射鍍膜,包含抗反射鍍膜的光學鏡片由一塑膠材料所製成,抗反射鍍膜位於光學鏡片的物側表面或像側表面,抗反射鍍膜包含至少一膜層,位於抗反射鍍膜最外側的膜層之材質為陶瓷,抗反射鍍膜包含複數個孔洞,且鄰近抗反射鍍膜最外側的孔洞之尺寸大於鄰近抗反射鍍膜最內側的孔洞之尺寸。位於光學鏡片中心處的抗反射鍍膜的總厚度為Tc,位於光學鏡片周邊處的抗反射鍍膜的總厚度為Tp,光學鏡頭的抗反射鍍膜配置主因子為FAR,其滿足下列條件:|Tc-Tp|/Tc ≤ 5.00%;以及-1.5 ≤ FAR。繞射元件的至少一表面包含一抗反射鍍膜,繞射元件的抗反射鍍膜之材質為氧化鋁,電子感光元件設置於光學鏡頭的一成像面。An imaging device provided according to the present disclosure includes an optical lens, a diffractive element and an electronic photosensitive element. The optical lens includes at least four optical lenses from the object side to the image side, at least one optical lens in the at least four optical lenses includes an anti-reflection coating, the optical lens including the anti-reflection coating is made of a plastic material, and the anti-reflection coating is located in the The object side surface or the image side surface of the optical lens, the anti-reflection coating includes at least one film layer, the material of the film layer located on the outermost side of the anti-reflection coating is ceramic, the anti-reflection coating contains a plurality of holes, and the outermost layer of the anti-reflection coating is adjacent to the anti-reflection coating. The size of the hole is larger than the size of the innermost hole adjacent to the anti-reflection coating. The total thickness of the anti-reflection coating at the center of the optical lens is Tc, and the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp. The main factor of the anti-reflection coating configuration of the optical lens is FAR, which satisfies the following conditions: |Tc- Tp|/Tc ≤ 5.00%; and -1.5 ≤ FAR. At least one surface of the diffractive element includes an anti-reflection coating, the material of the anti-reflection coating of the diffractive element is aluminum oxide, and the electronic photosensitive element is arranged on an imaging surface of the optical lens.

依據本揭示內容提供的一種取像裝置,其包含一光學鏡頭、一曲面元件以及一電子感光元件。光學鏡頭由物側至像側包含至少四光學鏡片,所述至少四光學鏡片中至少一光學鏡片包含一抗反射鍍膜,包含抗反射鍍膜的光學鏡片由一塑膠材料所製成,抗反射鍍膜位於光學鏡片的物側表面或像側表面,抗反射鍍膜包含至少一膜層,位於抗反射鍍膜最外側的膜層之材質為陶瓷,抗反射鍍膜包含複數個孔洞,且鄰近抗反射鍍膜最外側的孔洞之尺寸大於鄰近抗反射鍍膜最內側的孔洞之尺寸。位於光學鏡片中心處的抗反射鍍膜的總厚度為Tc,位於光學鏡片周邊處的抗反射鍍膜的總厚度為Tp,光學鏡頭的抗反射鍍膜配置主因子為FAR,其滿足下列條件:|Tc-Tp|/Tc ≤ 5.00%;以及-1.5 ≤ FAR。曲面元件的至少一表面包含一相位次波長結構,電子感光元件設置於光學鏡頭的一成像面。An imaging device provided according to the present disclosure includes an optical lens, a curved element and an electronic photosensitive element. The optical lens includes at least four optical lenses from the object side to the image side, at least one optical lens in the at least four optical lenses includes an anti-reflection coating, the optical lens including the anti-reflection coating is made of a plastic material, and the anti-reflection coating is located in the The object side surface or the image side surface of the optical lens, the anti-reflection coating includes at least one film layer, the material of the film layer located on the outermost side of the anti-reflection coating is ceramic, the anti-reflection coating contains a plurality of holes, and the outermost layer of the anti-reflection coating is adjacent to the anti-reflection coating. The size of the hole is larger than the size of the innermost hole adjacent to the anti-reflection coating. The total thickness of the anti-reflection coating at the center of the optical lens is Tc, and the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp. The main factor of the anti-reflection coating configuration of the optical lens is FAR, which satisfies the following conditions: |Tc- Tp|/Tc ≤ 5.00%; and -1.5 ≤ FAR. At least one surface of the curved element includes a phase subwavelength structure, and the electronic photosensitive element is arranged on an imaging surface of the optical lens.

依據本揭示內容提供的一種電子裝置,其為一行動裝置,且電子裝置包含如前段所述的取像裝置。An electronic device is provided according to the present disclosure, which is a mobile device, and the electronic device includes the imaging device described in the preceding paragraph.

當|Tc-Tp|/Tc滿足上述條件時,可以使彎曲變化的光學鏡片達到均勻的抗反射鍍膜製作效果。When |Tc-Tp|/Tc satisfies the above conditions, the optical lens with changing bending can achieve a uniform anti-reflection coating production effect.

當FAR滿足上述條件時,可以獲得優異的鍍膜配置。When the FAR satisfies the above conditions, an excellent coating configuration can be obtained.

依據本揭示內容提供的一種光學鏡頭,其由物側至像側包含至少一光學鏡片以及至少一抗反射元件。所述至少一抗反射元件的至少一表面包含一抗反射鍍膜,包含抗反射鍍膜的抗反射元件由一玻璃材料所製成,抗反射鍍膜包含至少二膜層,最靠近抗反射元件的一基材的其中一膜層為一第一膜層,且第一膜層的折射率小於基材的折射率。位於抗反射鍍膜最外側的膜層的主要材質為氧化鋁,抗反射鍍膜包含複數個孔洞,鄰近抗反射鍍膜最外側的孔洞之尺寸大於鄰近抗反射鍍膜最內側的孔洞之尺寸,且最外側的膜層具有漸變的折射率。抗反射鍍膜的總膜厚為tTk,其滿足下列條件:200 nm < tTk ≤ 400 nm。An optical lens provided according to the present disclosure includes at least one optical lens and at least one anti-reflection element from the object side to the image side. At least one surface of the at least one anti-reflection element includes an anti-reflection coating, the anti-reflection element including the anti-reflection coating is made of a glass material, and the anti-reflection coating includes at least two layers, and a base closest to the anti-reflection element One of the film layers of the material is a first film layer, and the refractive index of the first film layer is smaller than the refractive index of the base material. The main material of the outermost layer of the anti-reflection coating is aluminum oxide. The anti-reflection coating contains a plurality of holes. The size of the outermost hole adjacent to the anti-reflection coating is larger than that of the innermost hole adjacent to the anti-reflection coating, and the outermost hole is larger than the outermost hole of the anti-reflection coating. The film layer has a graded index of refraction. The total film thickness of the anti-reflection coating is tTk, which satisfies the following conditions: 200 nm < tTk ≤ 400 nm.

當tTk滿足上述條件時,可以有效維持最佳的低反射效果。When tTk satisfies the above conditions, the optimal low reflection effect can be effectively maintained.

本揭示內容提供一種光學鏡頭,其由物側至像側包含至少四光學鏡片。所述至少四光學鏡片中至少一光學鏡片包含一抗反射鍍膜,包含抗反射鍍膜的光學鏡片由一塑膠材料所製成,抗反射鍍膜位於光學鏡片的物側表面或像側表面,抗反射鍍膜包含至少一膜層,位於抗反射鍍膜最外側的膜層之材質為陶瓷,抗反射鍍膜包含複數個孔洞,且鄰近抗反射鍍膜最外側的孔洞之尺寸大於鄰近抗反射鍍膜最內側的孔洞之尺寸。位於光學鏡片中心處的抗反射鍍膜的總厚度為Tc,位於光學鏡片周邊處的抗反射鍍膜的總厚度為Tp,光學鏡頭的抗反射鍍膜配置主因子為FAR,其滿足下列條件:|Tc-Tp|/Tc ≤ 5.00%;以及-1.5 ≤ FAR。The present disclosure provides an optical lens including at least four optical lenses from the object side to the image side. At least one of the at least four optical lenses includes an anti-reflection coating, the optical lens including the anti-reflection coating is made of a plastic material, the anti-reflection coating is located on the object side surface or the image side surface of the optical lens, and the anti-reflection coating It includes at least one film layer, the material of the film layer located on the outermost side of the anti-reflection coating is ceramic, the anti-reflection coating contains a plurality of holes, and the size of the outermost hole adjacent to the anti-reflective coating is larger than the size of the innermost hole adjacent to the anti-reflective coating . The total thickness of the anti-reflection coating at the center of the optical lens is Tc, and the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp. The main factor of the anti-reflection coating configuration of the optical lens is FAR, which satisfies the following conditions: |Tc- Tp|/Tc ≤ 5.00%; and -1.5 ≤ FAR.

本揭示內容係研發多光學鏡片的光學鏡頭,其應用原子層沉積法鍍膜技術,以特定多重抗反射鍍膜因子進行設計,而獲得優異的鍍膜配置。藉由抗反射鍍膜表面的次波長結構之特性,使具有多光學鏡片的高品質光學鏡頭能夠獲得最佳抗反射效果,以解決劇烈面型變化的光學鏡片所造成的大角度強光嚴重反射問題,使彎曲變化的光學鏡片在全視場內,能夠達到均勻的抗反射鍍膜製作效果。藉此,將光學鏡片組合應用在多光學鏡片的光學鏡頭時,有助於顯著提升高階光學鏡頭的成像品質。The present disclosure is to develop an optical lens of a multi-optical lens, which applies atomic layer deposition coating technology and is designed with specific multiple anti-reflection coating factors to obtain an excellent coating configuration. With the characteristics of the sub-wavelength structure on the surface of the anti-reflection coating, the high-quality optical lens with multi-optical lens can obtain the best anti-reflection effect, so as to solve the serious reflection problem of large-angle strong light caused by the optical lens with dramatic surface changes. , so that the optical lens with bending change can achieve a uniform anti-reflection coating production effect in the full field of view. Thereby, when the optical lens combination is applied to the optical lens of the multi-optical lens, the imaging quality of the high-end optical lens can be significantly improved.

位於光學鏡片中心處的抗反射鍍膜的總厚度為Tc,位於光學鏡片周邊處的抗反射鍍膜的總厚度為Tp,其可以滿足下列條件:|Tc-Tp|/Tc ≤ 10.00%;|Tc-Tp|/Tc ≤ 3.00%;|Tc-Tp|/Tc ≤ 1.50%;或0% < |Tc-Tp|/Tc ≤ 0.50%。The total thickness of the anti-reflection coating at the center of the optical lens is Tc, and the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp, which can satisfy the following conditions: |Tc-Tp|/Tc ≤ 10.00%; |Tc- Tp|/Tc ≤ 3.00%; |Tc-Tp|/Tc ≤ 1.50%; or 0% < |Tc-Tp|/Tc ≤ 0.50%.

光學鏡頭的抗反射鍍膜配置第一因子為Far1,光學鏡頭的抗反射鍍膜配置第二因子為Far2,光學鏡頭的抗反射鍍膜配置第三因子為Far3,光學鏡頭的抗反射鍍膜配置主因子為FAR,FAR = LOG(Far1×Far2×Far3),其可以滿足下列條件:-1.0 ≤ FAR;-0.75 ≤ FAR;-0.50 ≤ FAR;-0.30 ≤ FAR ≤ 1;或0.1 ≤ FAR ≤ 10。The first factor of the anti-reflection coating configuration of the optical lens is Far1, the second factor of the anti-reflection coating configuration of the optical lens is Far2, the third factor of the anti-reflection coating configuration of the optical lens is Far3, and the main factor of the anti-reflection coating configuration of the optical lens is FAR , FAR = LOG(Far1×Far2×Far3), which can satisfy the following conditions: -1.0 ≤ FAR; -0.75 ≤ FAR; -0.50 ≤ FAR; -0.30 ≤ FAR ≤ 1; or 0.1 ≤ FAR ≤ 10.

本揭示內容係研發多光學鏡片的光學鏡頭,其可應用原子層沉積法鍍膜技術,以特定多重抗反射鍍膜因子進行設計,而獲得優異的鍍膜配置。藉由抗反射鍍膜表面的次波長結構之特性,使具有多光學鏡片的高品質光學鏡頭能夠獲得最佳抗反射效果,以解決劇烈面型變化的光學鏡片所造成的大角度強光嚴重反射問題,使彎曲變化的光學鏡片在全視場內,能夠達到均勻的抗反射鍍膜製作效果。藉此,將光學鏡片組合應用在多光學鏡片的光學鏡頭時,有助於顯著提升高階光學鏡頭的成像品質。The present disclosure is to develop an optical lens of a multi-optical lens, which can be designed with specific multiple anti-reflection coating factors by applying atomic layer deposition coating technology to obtain an excellent coating configuration. With the characteristics of the sub-wavelength structure on the surface of the anti-reflection coating, the high-quality optical lens with multi-optical lens can obtain the best anti-reflection effect, so as to solve the serious reflection problem of large-angle strong light caused by the optical lens with dramatic surface changes. , so that the optical lens with bending change can achieve a uniform anti-reflection coating production effect in the full field of view. Thereby, when the optical lens combination is applied to the optical lens of the multi-optical lens, the imaging quality of the high-end optical lens can be significantly improved.

光學鏡片可為一基材,基材於光軸上的厚度為CTs,光學鏡片表面上與光軸交點間水平位移的最大值為SAGmax,光學鏡頭的抗反射鍍膜配置第一因子為Far1,Far1 = |SAGmax|/CTs,其可以滿足下列條件:0.500 ≤ Far1,藉由控制光學鏡頭中的光學鏡片厚度與離軸水平位移的變化關係因子,有效獲得光學鏡頭中的最佳鍍膜配置。再者,可以滿足下列條件:1.000 ≤ Far1;1.500 ≤ Far1;1.700 ≤ Far1;或2.000 ≤ Far1。The optical lens can be a substrate, the thickness of the substrate on the optical axis is CTs, the maximum horizontal displacement between the surface of the optical lens and the intersection of the optical axis is SAGmax, and the first factor of the anti-reflection coating configuration of the optical lens is Far1, Far1 = |SAGmax|/CTs, which can satisfy the following conditions: 0.500 ≤ Far1, by controlling the change relationship factor between the thickness of the optical lens and the off-axis horizontal displacement in the optical lens, the optimal coating configuration in the optical lens can be effectively obtained. Furthermore, the following conditions may be satisfied: 1.000 ≤ Far1; 1.500 ≤ Far1; 1.700 ≤ Far1; or 2.000 ≤ Far1.

光學鏡片表面於光學有效徑範圍內的切線斜率的平均值為SPavg,光學鏡片表面於光學有效徑範圍內的切線斜率的最小值為SPmin,光學鏡頭的抗反射鍍膜配置第二因子為Far2,Far2 = 1/(|SPavg|×|SPmin|),其可以滿足下列條件:0.100 ≤ Far2,藉由控制光學鏡頭中的光學鏡片離軸表面變化因子,有效獲得光學鏡頭中的最佳鍍膜配置,並提升抗反射鍍膜的應用價值。再者,可以滿足下列條件:0.200 ≤ Far2;0.300 ≤ Far2;0.400 ≤ Far2;或0.500 ≤ Far2。The average value of the tangent slope of the optical lens surface within the optical effective diameter range is SPavg, the minimum value of the tangent slope of the optical lens surface within the optical effective diameter range is SPmin, and the second factor of the anti-reflection coating configuration of the optical lens is Far2, Far2 = 1/(|SPavg|×|SPmin|), which can satisfy the following conditions: 0.100 ≤ Far2, by controlling the off-axis surface variation factor of the optical lens in the optical lens, the optimal coating configuration in the optical lens can be effectively obtained, and Improve the application value of anti-reflection coatings. Furthermore, the following conditions may be satisfied: 0.200 ≤ Far2; 0.300 ≤ Far2; 0.400 ≤ Far2; or 0.500 ≤ Far2.

基材的折射率為Ns,光學鏡頭的抗反射鍍膜配置第三因子為Far3,Far3 = (1/(Ns-1)) 2,其可以滿足下列條件:2.5 ≤ Far3,藉由控制光學鏡片折射率與空氣折射率差值因子,使抗反射鍍膜被配置在光學鏡頭中最適當的光學鏡片表面,使光線能由空氣端以漸變折射率的變化方式,通過抗反射鍍膜的膜層後,入射到光學鏡片內,以發揮最佳增透效果而達到所需的抗反射效果。再者,可以滿足下列條件:2.9 ≤ Far3;3.0 ≤ Far3;3.1 ≤ Far3;3.3 ≤ Far3;或3.5 ≤ Far3。 The refractive index of the substrate is Ns, the third factor of the anti-reflection coating configuration of the optical lens is Far3, Far3 = (1/(Ns-1)) 2 , which can satisfy the following conditions: 2.5 ≤ Far3, by controlling the refraction of the optical lens The difference factor between the rate and the air refractive index makes the anti-reflection coating be arranged on the most appropriate optical lens surface in the optical lens, so that the light can pass through the anti-reflection coating layer from the air end in a way of changing the gradient index of refraction. Into the optical lens, in order to play the best anti-reflection effect to achieve the desired anti-reflection effect. Furthermore, the following conditions may be met: 2.9 ≤ Far3; 3.0 ≤ Far3; 3.1 ≤ Far3; 3.3 ≤ Far3; or 3.5 ≤ Far3.

基材的折射率為Ns,其可以滿足下列條件:Ns ≤ 1.7682,藉由在較接近空氣折射率的低折射率材質上應用鍍膜技術,有效加強抗反射鍍膜的抗反射效果,並強化降低反射率的效果。再者,可以滿足下列條件:Ns ≤ 1.700;或Ns ≤ 1.600。The refractive index of the substrate is Ns, which can meet the following conditions: Ns ≤ 1.7682. By applying coating technology on a low refractive index material that is closer to the refractive index of air, the anti-reflection effect of the anti-reflection coating is effectively enhanced, and the reflection is reduced. rate effect. Furthermore, the following conditions may be satisfied: Ns ≤ 1.700; or Ns ≤ 1.600.

位於抗反射鍍膜最外側的膜層之材質可以為氧化鋁(Al 2O 3),藉由光學鏡片材料與接觸光學鏡片的抗反射鍍膜膜層材料的合適配置,以獲得較佳鍍膜附著性與光學鏡片表面的保護性,避免抗反射鍍膜的吸附力不足而脫落,並避免鍍膜製作過程導致的光學鏡片表面缺陷,有助於提升光學鏡片於環境耐候性測試的通過率。 The material of the outermost layer of the anti-reflection coating can be aluminum oxide (Al 2 O 3 ). Through the appropriate configuration of the optical lens material and the anti-reflection coating material of the contact optical lens, better coating adhesion and The protection of the optical lens surface prevents the anti-reflection coating from falling off due to insufficient adsorption, and avoids the surface defects of the optical lens caused by the coating production process, which helps to improve the pass rate of the optical lens in the environmental weather resistance test.

抗反射鍍膜可以包含至少三膜層,且所述膜層的材質可以不同,藉由具備抗刮耐磨的保護膜層或保護光學鏡片的保護膜層,可以避免抗反射鍍膜破損與化學侵蝕。The anti-reflection coating can include at least three layers, and the materials of the layers can be different. By having a scratch-resistant and wear-resistant protective layer or a protective layer to protect the optical lens, damage to the anti-reflection coating and chemical corrosion can be avoided.

光學鏡片中心處的反射率谷點在一範圍(±25 nm)間具有相對較低反射率之波長為Wtc,光學鏡片周邊處的反射率谷點在一範圍(±25 nm)間具有相對較低反射率之波長為Wtp,其可以滿足下列條件:0 nm ≤ |Wtc-Wtp| ≤ 25 nm,藉由控制於反射率谷點處的特定波長範圍內的反射率偏移量,可以維持光學鏡片有效徑內的一致抗反射效果。再者,可以滿足下列條件:0 nm < |Wtc-Wtp| ≤ 15 nm;或1 nm ≤ |Wtc-Wtp| ≤ 10 nm。The reflectivity valley point at the center of the optical lens has a relatively low reflectivity wavelength in a range (±25 nm), and the reflectivity valley point at the periphery of the optical lens has a relatively low reflectivity within a range (±25 nm). The wavelength of low reflectivity is Wtp, which can satisfy the following conditions: 0 nm ≤ |Wtc-Wtp| ≤ 25 nm, by controlling the reflectivity offset within a specific wavelength range at the reflectivity valley point, the optical Consistent anti-reflection effect within the effective diameter of the lens. Furthermore, the following conditions may be satisfied: 0 nm < |Wtc-Wtp| ≤ 15 nm; or 1 nm ≤ |Wtc-Wtp| ≤ 10 nm.

光學鏡片中心處的反射率谷點在一範圍(±25 nm)間的相對較低反射率為Rtc,其可以滿足下列條件:0% < Rtc ≤ 0.300%,藉由降低光學鏡片中心處的反射率谷點的反射率,有助於提升抗反射鍍膜於特定波長範圍內的最佳抗反射效果。再者,可以滿足下列條件:Rtc ≤ 0.200%;或Rtc ≤ 0.100%。The reflectivity valley at the center of the optical lens has a relatively low reflectivity Rtc within a range (±25 nm), which can satisfy the following conditions: 0% < Rtc ≤ 0.300%, by reducing the reflection at the center of the optical lens The reflectivity at the valley point helps to improve the best anti-reflection effect of the anti-reflection coating in a specific wavelength range. Furthermore, the following conditions may be satisfied: Rtc ≤ 0.200%; or Rtc ≤ 0.100%.

光學鏡片周邊處的反射率谷點在一範圍(±25 nm)間的相對較低反射率為Rtp,其可以滿足下列條件:0% < Rtp ≤ 0.300%,藉由降低光學鏡片周邊處的反射率谷點的反射率,有助於提升抗反射鍍膜於特定波長範圍內的最佳抗反射效果。再者,可以滿足下列條件:Rtp ≤ 0.200%;或Rtp ≤ 0.100%。The reflectivity valley at the periphery of the optical lens has a relatively low reflectivity Rtp in a range (±25 nm), which can satisfy the following conditions: 0% < Rtp ≤ 0.300%, by reducing the reflection at the periphery of the optical lens The reflectivity at the valley point helps to improve the best anti-reflection effect of the anti-reflection coating in a specific wavelength range. Furthermore, the following conditions may be satisfied: Rtp ≤ 0.200%; or Rtp ≤ 0.100%.

光學鏡片中心處的反射率峰點在一範圍(±25 nm)間具有相對較高反射率之波長為Wcc,光學鏡片周邊處的反射率峰點在一範圍(±25 nm)間具有相對較高反射率之波長為Wcp,其可以滿足下列條件:0 nm ≤ |Wcc-Wcp| ≤ 20 nm,藉由控制於反射率峰點處的特定波長範圍內的反射率偏移量,可以維持光學鏡片有效徑內的一致抗反射效果。再者,可以滿足下列條件:0 nm ≤ | Wcc-Wcp | ≤ 25 nm;0 nm < | Wcc-Wcp | ≤ 15 nm;或1 nm ≤ | Wcc-Wcp | ≤ 10 nm。The reflectance peak point at the center of the optical lens has a relatively high reflectivity wavelength in a range (±25 nm), and the reflectance peak point at the periphery of the optical lens has a relatively high reflectivity within a range (±25 nm). The wavelength of high reflectivity is Wcp, which can satisfy the following conditions: 0 nm ≤ |Wcc-Wcp| ≤ 20 nm, by controlling the reflectivity offset within a specific wavelength range at the reflectivity peak point, the optical Consistent anti-reflection effect within the effective diameter of the lens. Furthermore, the following conditions may be satisfied: 0 nm ≤ | Wcc-Wcp | ≤ 25 nm; 0 nm < | Wcc-Wcp | ≤ 15 nm; or 1 nm ≤ | Wcc-Wcp | ≤ 10 nm.

光學鏡片中心處的反射率峰點在一範圍(±25 nm)間的相對較高反射率為Rcc,其可以滿足下列條件:0.200% ≤ Rcc ≤ 0.700%,藉由降低光學鏡片中心處的反射率峰點的反射率,有助於提升抗反射鍍膜於特定波長範圍內的最佳抗反射效果。再者,可以滿足下列條件:0.300% ≤ Rcc ≤ 0.600%;或0.400% ≤ Rcc ≤ 0.500%。The reflectance peak point at the center of the optical lens has a relatively high reflectance Rcc within a range (±25 nm), which can satisfy the following conditions: 0.200% ≤ Rcc ≤ 0.700%, by reducing the reflection at the center of the optical lens The reflectivity at the peak point helps to improve the best anti-reflection effect of the anti-reflection coating in a specific wavelength range. Furthermore, the following conditions may be satisfied: 0.300% ≤ Rcc ≤ 0.600%; or 0.400% ≤ Rcc ≤ 0.500%.

光學鏡片周邊處的反射率峰點在一範圍(±25 nm)間的相對較高反射率為Rcp,其可以滿足下列條件:0.200% ≤ Rcp ≤ 0.700%,藉由降低光學鏡片周邊處的反射率峰點的反射率,有助於提升抗反射鍍膜於特定波長範圍內的最佳抗反射效果。再者,可以滿足下列條件:0.300% ≤ Rcp ≤ 0.600%;或0.400% ≤ Rcp ≤ 0.500%。The reflectance peak point at the periphery of the optic has a relatively high reflectivity Rcp in a range (±25 nm), which can satisfy the following conditions: 0.200% ≤ Rcp ≤ 0.700%, by reducing the reflection at the periphery of the optic The reflectivity at the peak point helps to improve the best anti-reflection effect of the anti-reflection coating in a specific wavelength range. Furthermore, the following conditions may be satisfied: 0.300% ≤ Rcp ≤ 0.600%; or 0.400% ≤ Rcp ≤ 0.500%.

包含抗反射鍍膜的光學鏡片的至少一表面可以包含至少一反曲點,藉由光學鏡片表面的反曲點設計,有助於發揮原子層沉積法鍍膜的成本效益,能夠在面型變化劇烈的光學鏡片表面達成均勻的鍍膜效果,避免反射率因抗反射鍍膜的膜厚差異偏移,而導致光學鏡片周邊反射光過強的缺陷。At least one surface of an optical lens containing an anti-reflection coating may contain at least one inflection point. The design of the inflection point on the surface of the optical lens helps to exert the cost-effectiveness of atomic layer deposition coating, which can be used in situations where the surface shape changes drastically. The surface of the optical lens achieves a uniform coating effect, avoiding the defect that the reflectivity is shifted due to the difference in the film thickness of the anti-reflection coating, which leads to the defect that the reflected light around the optical lens is too strong.

抗反射鍍膜的總層數為tLs,其可以滿足下列條件:1 ≤ tLs ≤ 8,藉由控制抗反射鍍膜的膜層數量,有效提升製作效率與節省成本。The total number of layers of the anti-reflection coating is tLs, which can meet the following conditions: 1 ≤ tLs ≤ 8. By controlling the number of layers of the anti-reflection coating, the production efficiency and cost are effectively improved.

抗反射鍍膜的總膜厚為tTk,其可以滿足下列條件:200 nm < tTk ≤ 400 nm,藉由控制抗反射鍍膜的總厚度,有效維持最佳的低反射效果。再者,可以滿足下列條件:150 nm ≤ tTk ≤ 800 nm;200 nm ≤ tTk ≤ 600 nm;230 nm ≤ tTk ≤ 500 nm;或240 nm ≤ tTk ≤ 400 nm。The total film thickness of the anti-reflection coating is tTk, which can meet the following conditions: 200 nm < tTk ≤ 400 nm, by controlling the total thickness of the anti-reflection coating, the best low reflection effect can be effectively maintained. Furthermore, the following conditions may be satisfied: 150 nm ≤ tTk ≤ 800 nm; 200 nm ≤ tTk ≤ 600 nm; 230 nm ≤ tTk ≤ 500 nm; or 240 nm ≤ tTk ≤ 400 nm.

光學鏡頭的全視角為FOV,其可以滿足下列條件:60度 ≤ FOV ≤ 220度;或70度 ≤ FOV ≤ 100度,藉此可視需求將抗反射鍍膜應用在不同場景需求的光學鏡頭上,以達所需的抗反射效果。The full viewing angle of the optical lens is FOV, which can meet the following conditions: 60 degrees ≤ FOV ≤ 220 degrees; or 70 degrees ≤ FOV ≤ 100 degrees, so that the anti-reflection coating can be applied to the optical lens according to the needs of different scenarios, so as to meet the requirements of different scenarios. achieve the desired anti-reflection effect.

位於光學鏡片中心處的抗反射鍍膜的總厚度為Tc,其可以滿足下列條件:150 nm ≤ Tc ≤ 800 nm;200 nm ≤ Tc ≤ 600 nm;230 nm ≤ Tc ≤ 500 nm;或240 nm ≤ Tc ≤ 400 nm。The total thickness of the anti-reflection coating at the center of the optical lens is Tc, which can satisfy the following conditions: 150 nm ≤ Tc ≤ 800 nm; 200 nm ≤ Tc ≤ 600 nm; 230 nm ≤ Tc ≤ 500 nm; or 240 nm ≤ Tc ≤ 400 nm.

位於光學鏡片周邊處的抗反射鍍膜的總厚度為Tp,其可以滿足下列條件:150 nm ≤ Tp ≤ 800 nm;200 nm ≤ Tp ≤ 600 nm;230 nm ≤ Tp ≤ 500 nm;或240 nm ≤ Tp ≤ 400 nm。The total thickness of the anti-reflection coating at the periphery of the optical lens is Tp, which can satisfy the following conditions: 150 nm ≤ Tp ≤ 800 nm; 200 nm ≤ Tp ≤ 600 nm; 230 nm ≤ Tp ≤ 500 nm; or 240 nm ≤ Tp ≤ 400 nm.

本揭示內容另提供一種光學鏡頭,其由物側至像側包含至少一光學鏡片以及至少一抗反射元件。所述至少一抗反射元件的至少一表面包含一抗反射鍍膜,包含抗反射鍍膜的抗反射元件由一玻璃材料所製成,抗反射鍍膜包含至少二膜層,最靠近抗反射元件的一基材的其中一膜層為一第一膜層,且第一膜層的折射率小於基材的折射率。位於抗反射鍍膜最外側的膜層的主要材質為氧化鋁,抗反射鍍膜包含複數個孔洞,鄰近抗反射鍍膜最外側的孔洞之尺寸大於鄰近抗反射鍍膜最內側的孔洞之尺寸,且最外側的膜層具有漸變的折射率。抗反射鍍膜的總膜厚為tTk,其滿足下列條件:200 nm < tTk ≤ 400 nm。The present disclosure further provides an optical lens including at least one optical lens and at least one anti-reflection element from the object side to the image side. At least one surface of the at least one anti-reflection element includes an anti-reflection coating, the anti-reflection element including the anti-reflection coating is made of a glass material, and the anti-reflection coating includes at least two layers, and a base closest to the anti-reflection element One of the film layers of the material is a first film layer, and the refractive index of the first film layer is smaller than the refractive index of the base material. The main material of the outermost layer of the anti-reflection coating is aluminum oxide. The anti-reflection coating contains a plurality of holes. The size of the outermost hole adjacent to the anti-reflection coating is larger than that of the innermost hole adjacent to the anti-reflection coating, and the outermost hole is larger than the outermost hole of the anti-reflection coating. The film layer has a graded index of refraction. The total film thickness of the anti-reflection coating is tTk, which satisfies the following conditions: 200 nm < tTk ≤ 400 nm.

本揭示內容係研發光學鏡頭,其可應用鍍膜技術並以特定抗反射鍍膜因子進行設計。藉由抗反射鍍膜表面的次波長結構之特性,使具有抗反射元件的光學鏡頭能夠獲得最佳抗反射效果,解決大角度強光嚴重反射問題,並能夠達到均勻的抗反射鍍膜製作效果。The present disclosure is to develop optical lenses that can apply coating techniques and be designed with specific anti-reflection coating factors. With the characteristics of the sub-wavelength structure on the surface of the anti-reflection coating, the optical lens with anti-reflection elements can obtain the best anti-reflection effect, solve the problem of serious reflection of large-angle strong light, and achieve a uniform anti-reflection coating production effect.

基材可為一平板元件,基材於光軸上的厚度為CTs,其可以滿足下列條件:0.15 mm < CTs ≤ 0.60 mm,藉由控制適當基材特性以提升成品良率。再者,可以滿足下列條件:0.15 mm ≤ CTs ≤ 2.00 mm;CTs ≤ 1.50 mm;CTs ≤ 1.00 mm;CTs ≤ 0.60 mm;CTs ≤ 0.45 mm;或CTs ≤ 0.35 mm。The substrate can be a flat element, and the thickness of the substrate on the optical axis is CTs, which can satisfy the following conditions: 0.15 mm < CTs ≤ 0.60 mm, and the yield of finished products can be improved by controlling appropriate substrate properties. Furthermore, the following conditions may be met: 0.15 mm ≤ CTs ≤ 2.00 mm; CTs ≤ 1.50 mm; CTs ≤ 1.00 mm; CTs ≤ 0.60 mm; CTs ≤ 0.45 mm; or CTs ≤ 0.35 mm.

光學鏡頭的抗反射鍍膜配置第三因子為Far3,其可以滿足下列條件:1.0 ≤ Far3 ≤ 5.0,藉由控制基材折射率與空氣折射率差值因子,使光線能由空氣端以漸變折射率的變化方式,以發揮最佳增透效果而達到所需的抗反射效果。再者,可以滿足下列條件:1.4 ≤ Far3 ≤ 4.0;或1.6 ≤ Far3 ≤ 3.6。The third factor of the anti-reflection coating configuration of the optical lens is Far3, which can meet the following conditions: 1.0 ≤ Far3 ≤ 5.0, by controlling the difference factor between the refractive index of the substrate and the refractive index of the air, the light can pass from the air end to a graded refractive index to achieve the desired anti-reflection effect with the best anti-reflection effect. Furthermore, the following conditions may be satisfied: 1.4 ≤ Far3 ≤ 4.0; or 1.6 ≤ Far3 ≤ 3.6.

基材於波長400 nm - 630 nm的平均反射率為R4063,其可以滿足下列條件:0% ≤ R4063 ≤ 1.3%,藉由控制反射率表現以達到所需的抗反射效果。再者,可以滿足下列條件:R4063 ≤ 1.0%;R4063 ≤ 0.7%;或R4063 ≤ 0.5%。The average reflectance of the substrate at wavelengths of 400 nm - 630 nm is R4063, which can meet the following conditions: 0% ≤ R4063 ≤ 1.3%, and the desired anti-reflection effect can be achieved by controlling the reflectance performance. Furthermore, the following conditions may be met: R4063 ≤ 1.0%; R4063 ≤ 0.7%; or R4063 ≤ 0.5%.

基材於波長670 nm - 1000 nm的平均反射率為R67100,其可以滿足下列條件:0% ≤ R67100 ≤ 3.0%,藉由控制反射率表現以達到所需的抗反射效果。再者,可以滿足下列條件:R67100 ≤ 2.5%;R67100 ≤ 2.0%;或R67100 ≤ 1.5%。The average reflectance of the substrate at wavelengths of 670 nm - 1000 nm is R67100, which can meet the following conditions: 0% ≤ R67100 ≤ 3.0%, and the desired anti-reflection effect can be achieved by controlling the reflectance performance. Furthermore, the following conditions may be satisfied: R67100 ≤ 2.5%; R67100 ≤ 2.0%; or R67100 ≤ 1.5%.

基材於波長400 nm - 600 nm的平均穿透率為T4060,其可以滿足下列條件:95% ≤ T4060 ≤ 100%,藉由控制穿透率表現以達到所需的光線透射效果。再者,可以滿足下列條件:97% ≤ T4060;或99% ≤ T4060。The average transmittance of the substrate at a wavelength of 400 nm - 600 nm is T4060, which can meet the following conditions: 95% ≤ T4060 ≤ 100%, and the desired light transmission effect can be achieved by controlling the transmittance performance. Furthermore, the following conditions may be met: 97% ≤ T4060; or 99% ≤ T4060.

抗反射鍍膜可以具有一第二膜層,第二膜層的折射率可以大於第一膜層的折射率,第二膜層的折射率可以大於基材的折射率,且最外側的膜層的折射率等效小於第一膜層與基材的折射率,藉此可有效提升抗反射效果。The anti-reflection coating may have a second film layer, the refractive index of the second film layer may be greater than the refractive index of the first film layer, the refractive index of the second film layer may be greater than the refractive index of the substrate, and the outermost film layer has a refractive index. The refractive index is equivalently smaller than the refractive index of the first film layer and the substrate, thereby effectively enhancing the anti-reflection effect.

基材可以為一微透鏡,藉此有助於改善瓣狀雜光。The substrate can be a microlens, thereby helping to improve petal-shaped stray light.

基材的折射率為Ns,其可以滿足下列條件:1.40 ≤ Ns ≤ 2.00;1.45 ≤ Ns ≤ 1.90;1.50 ≤ Ns ≤ 1.80;或1.50 ≤ Ns ≤ 1.75。The refractive index of the substrate is Ns, which may satisfy the following conditions: 1.40 ≤ Ns ≤ 2.00; 1.45 ≤ Ns ≤ 1.90; 1.50 ≤ Ns ≤ 1.80; or 1.50 ≤ Ns ≤ 1.75.

基材於400 nm至1000 nm的波長區間內具有最小反射率的波長為WRmin,其可以滿足下列條件:550 nm ≤ WRmin ≤ 600 nm;560 nm ≤ WRmin ≤ 595 nm;或570 nm ≤ WRmin。The wavelength at which the substrate has minimum reflectivity in the wavelength range from 400 nm to 1000 nm is WRmin, which can satisfy the following conditions: 550 nm ≤ WRmin ≤ 600 nm; 560 nm ≤ WRmin ≤ 595 nm; or 570 nm ≤ WRmin.

基材於波長400 nm - 600 nm的平均反射率為R4060,其可以滿足下列條件:0% ≤ R4060 ≤ 1.3%;R4060 ≤ 1.0%;R4060 ≤ 0.7%;或R4060 ≤ 0.5%。The average reflectance of the substrate at wavelengths 400 nm - 600 nm is R4060, which can satisfy the following conditions: 0% ≤ R4060 ≤ 1.3%; R4060 ≤ 1.0%; R4060 ≤ 0.7%; or R4060 ≤ 0.5%.

基材於波長400 nm - 650 nm的平均反射率為R4065,其可以滿足下列條件:0% ≤ R4065 ≤ 1.3%;R4065 ≤ 1.0%;R4065 ≤ 0.7%;或R4065 ≤ 0.5%。The average reflectance of the substrate at wavelengths 400 nm - 650 nm is R4065, which can satisfy the following conditions: 0% ≤ R4065 ≤ 1.3%; R4065 ≤ 1.0%; R4065 ≤ 0.7%; or R4065 ≤ 0.5%.

基材於波長400 nm - 1000 nm的平均反射率為R40100,其可以滿足下列條件:0% ≤ R40100 ≤ 2.5%;R40100 ≤ 2.0%;R40100 ≤ 1.5%;或R40100 ≤ 1.0%。The average reflectance of the substrate at wavelengths of 400 nm - 1000 nm is R40100, which can satisfy the following conditions: 0% ≤ R40100 ≤ 2.5%; R40100 ≤ 2.0%; R40100 ≤ 1.5%; or R40100 ≤ 1.0%.

基材於波長500 nm - 600 nm的平均反射率為R5060,其可以滿足下列條件:0% ≤ R5060 ≤ 1.3%;R5060 ≤ 1.0%;R5060 ≤ 0.7%;或R5060 ≤ 0.5%。The average reflectance of the substrate at wavelengths 500 nm - 600 nm is R5060, which can satisfy the following conditions: 0% ≤ R5060 ≤ 1.3%; R5060 ≤ 1.0%; R5060 ≤ 0.7%; or R5060 ≤ 0.5%.

基材於波長600 nm - 700 nm的平均反射率為R6070,其可以滿足下列條件:0% ≤ R6070 ≤ 2.5%;R6070 ≤ 2.0%;R6070 ≤ 1.5%;或R6070 ≤ 1.0%。The average reflectance of the substrate at wavelengths 600 nm - 700 nm is R6070, which can satisfy the following conditions: 0% ≤ R6070 ≤ 2.5%; R6070 ≤ 2.0%; R6070 ≤ 1.5%; or R6070 ≤ 1.0%.

基材於波長700 nm - 1000 nm的平均反射率為R70100,其可以滿足下列條件:0% ≤ R70100 ≤ 3.0%;R70100 ≤ 2.5%;R70100 ≤ 2.0%;或R70100 ≤ 1.5%。The average reflectance of the substrate at wavelengths 700 nm - 1000 nm is R70100, which can satisfy the following conditions: 0% ≤ R70100 ≤ 3.0%; R70100 ≤ 2.5%; R70100 ≤ 2.0%; or R70100 ≤ 1.5%.

基材於波長800 nm - 1000 nm的平均反射率為R80100,其可以滿足下列條件:0% ≤ R80100 ≤ 3.0%;R80100 ≤ 2.5%;R80100 ≤ 2.0%;或R80100 ≤ 1.5%。The average reflectance of the substrate at wavelengths 800 nm - 1000 nm is R80100, which can satisfy the following conditions: 0% ≤ R80100 ≤ 3.0%; R80100 ≤ 2.5%; R80100 ≤ 2.0%; or R80100 ≤ 1.5%.

基材於波長900 nm - 1000 nm的平均反射率為R90100,其可以滿足下列條件:0% ≤ R90100 ≤ 3.0%;R90100 ≤ 2.5%;R90100 ≤ 2.0%;或R90100 ≤ 1.5%。The average reflectance of the substrate at wavelengths 900 nm - 1000 nm is R90100, which can satisfy the following conditions: 0% ≤ R90100 ≤ 3.0%; R90100 ≤ 2.5%; R90100 ≤ 2.0%; or R90100 ≤ 1.5%.

基材於波長500 nm的反射率為R50,其可以滿足下列條件:0% ≤ R50 ≤ 1.3%;R50 ≤ 1.0%;R50 ≤ 0.7%;或R50 ≤ 0.5%。The reflectance of the substrate at a wavelength of 500 nm is R50, which can satisfy the following conditions: 0% ≤ R50 ≤ 1.3%; R50 ≤ 1.0%; R50 ≤ 0.7%; or R50 ≤ 0.5%.

基材於波長600 nm的反射率為R60,其可以滿足下列條件:0% ≤ R60 ≤ 1.3%;R60 ≤ 1.0%;R60 ≤ 0.7%;或R60 ≤ 0.5%。The reflectance of the substrate at a wavelength of 600 nm is R60, which can satisfy the following conditions: 0% ≤ R60 ≤ 1.3%; R60 ≤ 1.0%; R60 ≤ 0.7%; or R60 ≤ 0.5%.

基材於波長650 nm的反射率為R65,其可以滿足下列條件:0% ≤ R65 ≤ 1.3%;R65 ≤ 1.0%;R65 ≤ 0.7%;或R65 ≤ 0.5%。The reflectance of the substrate at a wavelength of 650 nm is R65, which can satisfy the following conditions: 0% ≤ R65 ≤ 1.3%; R65 ≤ 1.0%; R65 ≤ 0.7%; or R65 ≤ 0.5%.

基材於波長700 nm的反射率為R70,其可以滿足下列條件:0% ≤ R70 ≤ 2.5%;R70 ≤ 2.0%;R70 ≤ 1.5%;或R70 ≤ 1.0%。The reflectance of the substrate at a wavelength of 700 nm is R70, which can satisfy the following conditions: 0% ≤ R70 ≤ 2.5%; R70 ≤ 2.0%; R70 ≤ 1.5%; or R70 ≤ 1.0%.

基材於波長800 nm的反射率為R80,其可以滿足下列條件:0% ≤ R80 ≤ 3.0%;R80 ≤ 2.5%;R80 ≤ 2.0%;或R80 ≤ 1.5%。The reflectance of the substrate at a wavelength of 800 nm is R80, which can satisfy the following conditions: 0% ≤ R80 ≤ 3.0%; R80 ≤ 2.5%; R80 ≤ 2.0%; or R80 ≤ 1.5%.

基材於波長900 nm的反射率為R90,其可以滿足下列條件:0% ≤ R90 ≤ 3.0%;R90 ≤ 2.5%;R90 ≤ 2.0%;或R90 ≤ 1.5%。The reflectance of the substrate at a wavelength of 900 nm is R90, which can satisfy the following conditions: 0% ≤ R90 ≤ 3.0%; R90 ≤ 2.5%; R90 ≤ 2.0%; or R90 ≤ 1.5%.

基材於波長1000 nm的反射率為R100,其可以滿足下列條件:0% ≤ R100 ≤ 3.0%;R100 ≤ 2.5%;R100 ≤ 2.0%;或R100 ≤ 1.5%。The reflectivity of the substrate at a wavelength of 1000 nm is R100, which can satisfy the following conditions: 0% ≤ R100 ≤ 3.0%; R100 ≤ 2.5%; R100 ≤ 2.0%; or R100 ≤ 1.5%.

基材於400 nm至1000 nm的波長區間內具有最大穿透率的波長為Tmax,其可以滿足下列條件:98% < Tmax ≤ 100%;或99% ≤ Tmax。The wavelength at which the substrate has the maximum transmittance in the wavelength range of 400 nm to 1000 nm is Tmax, which can satisfy the following conditions: 98% < Tmax ≤ 100%; or 99% ≤ Tmax.

基材於波長500 nm - 600 nm的平均穿透率為T5060,其可以滿足下列條件:98% < T5060 ≤ 100%;或99% ≤ T5060。The average transmittance of the substrate at wavelengths of 500 nm - 600 nm is T5060, which can meet the following conditions: 98% < T5060 ≤ 100%; or 99% ≤ T5060.

基材於波長400 nm的穿透率為T40,其可以滿足下列條件:85% ≤ T40 ≤ 100%;90% ≤ T40;或92% ≤ T40。The transmittance of the substrate at a wavelength of 400 nm is T40, which can satisfy the following conditions: 85% ≤ T40 ≤ 100%; 90% ≤ T40; or 92% ≤ T40.

基材於波長500 nm的穿透率為T50,其可以滿足下列條件:98% < T50 ≤ 100%。The transmittance of the substrate at a wavelength of 500 nm is T50, which can satisfy the following conditions: 98% < T50 ≤ 100%.

基材於波長600 nm的穿透率為T60,其可以滿足下列條件:98% < T60 ≤ 100%。The transmittance of the substrate at a wavelength of 600 nm is T60, which can satisfy the following conditions: 98% < T60 ≤ 100%.

基材於波長700 nm的穿透率為T70,其可以滿足下列條件:T70 ≤ 0.2%;或T70 ≤ 0.15%。The transmittance of the substrate at a wavelength of 700 nm is T70, which can satisfy the following conditions: T70 ≤ 0.2%; or T70 ≤ 0.15%.

本揭示內容所提供的優異品質光學鏡頭,必須藉由抗反射鍍膜因子等參數進行綜合評估後作出最佳設計,在特定塑膠光學鏡片的表面製作抗反射鍍膜,使抗反射鍍膜具有優異均勻性、高環境耐候性、最佳抗反射效果與良好成像品質。For the excellent quality optical lens provided by the present disclosure, an optimal design must be made after comprehensive evaluation of parameters such as the anti-reflection coating factor, and an anti-reflection coating is formed on the surface of a specific plastic optical lens, so that the anti-reflection coating has excellent uniformity, High environmental weather resistance, best anti-reflection effect and good image quality.

光學鏡片最佳為兩面皆具有抗反射鍍膜,但亦可僅在適當的一表面製作抗反射鍍膜。藉由在光學鏡片面型變化劇烈的表面應用本揭示內容之技術,使原子層沉積法鍍膜所製作的抗反射鍍膜具備最佳化價值,在成本與品質間取得平衡,而在具有最適當折射率的光學鏡片上製作抗反射鍍膜,可達到最佳的抗反射效果。The optical lens preferably has anti-reflection coatings on both sides, but it is also possible to have anti-reflection coatings on only one suitable surface. By applying the technology of the present disclosure to the surface of the optical lens with drastic changes in surface shape, the anti-reflection coating produced by the atomic layer deposition method can have the optimal value, strike a balance between cost and quality, and have the most appropriate refractive index. Anti-reflection coating is made on the high-efficiency optical lens to achieve the best anti-reflection effect.

本揭示內容的反射率以單光學鏡片或基材進行量測,反射率皆以0度入射角的數據作為比較基準。The reflectance of the present disclosure is measured with a single optical lens or a substrate, and the reflectance is all based on the data at an incident angle of 0 degrees as a comparison benchmark.

表面造孔製程能有效改善光學鏡片表面的孔洞分布,使光學鏡片表面的孔洞間隙增加、呈現海綿孔洞狀結構或改變孔隙的密度變化等。造孔效果亦可隨抗反射鍍膜的深度增加而改變,如抗反射鍍膜接觸空氣的外側具有較大的孔隙結構,而內側具有相對較小的孔隙結構,明顯可見外側分布的孔洞/缺口相對大於內側孔洞,亦可說明為同一平面下外側的不規則支狀結構分布密度較稀疏,同一平面下內側的不規則支狀結構分布密度較緊密,所述孔隙是由不規則奈米纖維結構(Nanofiber)間的空間組成,具有讓空氣留存或連通在孔隙間的效果,可使最外側膜層具有漸變(Gradient)折射率。所述抗反射鍍膜的外側與內側意指於斷面圖與示意圖中,其外側為接觸空氣的一側,內側為較靠近光學鏡片或基材的一側。表面造孔製程可使用電漿進行蝕刻、化學反應蝕刻、以時間控制結晶顆粒大小或使用高溫溶液處理,如浸潤在溫度50度以上的醇類或水中達成。The surface hole-making process can effectively improve the distribution of holes on the surface of the optical lens, increase the gap between the holes on the surface of the optical lens, present a sponge-like structure, or change the density of the pores. The pore-forming effect can also change with the depth of the anti-reflection coating. For example, the outer side of the anti-reflection coating in contact with the air has a larger pore structure, while the inner side has a relatively small pore structure. It is obvious that the holes/notches distributed on the outer side are relatively larger than The inner pores can also be explained as the distribution density of the irregular branched structures on the outside under the same plane is sparse, and the distribution density of the irregular branched structures on the inner side under the same plane is denser. The pores are composed of irregular nanofiber structures (Nanofiber). ), which has the effect of allowing air to be retained or connected between the pores, so that the outermost film layer has a gradient refractive index. The outer side and inner side of the anti-reflection coating means that in the cross-sectional view and the schematic diagram, the outer side is the side contacting the air, and the inner side is the side closer to the optical lens or the substrate. The surface hole-making process can be performed by plasma etching, chemical reaction etching, time-controlled crystal particle size, or high-temperature solution treatment, such as immersion in alcohol or water with a temperature above 50 degrees.

本揭示內容的抗反射鍍膜最外側的膜層材質可為金屬氧化物、金屬氮化物、金屬氟化物、非金屬氧化物、非金屬氮化物、非金屬氟化物或陶瓷(Ceramic)等,其中陶瓷的主要成分為氧化物、氮化物、硼化物和碳化物,如氧化鋁等。抗反射鍍膜最外側的膜層以SiO 2、Nb 2O 5、Pa 2O 5、MgF 2為材料時,可採用物理蒸鍍(PVD)製作、氬(Ar)離子進行乾式蝕刻或磷酸溶液進行濕式蝕刻,同樣可製作出型態不同的奈米纖維結構,奈米纖維結構的形態可為柱狀、條狀、錐狀、塔狀、瓣狀或無規則狀等,奈米纖維結構的厚度約為100 nm - 300 nm,奈米纖維的直徑約為10 nm - 100 nm。 The material of the outermost layer of the anti-reflection coating of the present disclosure may be metal oxide, metal nitride, metal fluoride, non-metal oxide, non-metal nitride, non-metal fluoride, or ceramic, etc., wherein ceramic, etc. The main components are oxides, nitrides, borides and carbides, such as alumina. When the outermost layer of the anti-reflection coating is made of SiO 2 , Nb 2 O 5 , Pa 2 O 5 , and MgF 2 , it can be fabricated by physical vapor deposition (PVD), dry etching with argon (Ar) ions, or phosphoric acid solution. Wet etching can also produce different types of nanofiber structures. The thickness is about 100 nm - 300 nm, and the diameter of the nanofibers is about 10 nm - 100 nm.

抗反射鍍膜的高折射率材料於波長587.6 nm的折射率為Nh,抗反射鍍膜的低折射率材料於波長587.6 nm的折射率為Nl。其中,抗反射鍍膜的高折射率材料的折射率可以大於2.0,抗反射鍍膜的低折射率材料的折射率可以小於1.8,舉例而言,抗反射鍍膜材料(於波長587.6 nm的折射率)可為:MgF 2(1.3777)、SiO 2(1.4585)、Al 2O 3(1.7682)、HfO 2(1.8935)、ZnO(1.9269)、Sc 2O 3(1.9872)、AlN(2.0294)、Si 3N 4(2.0381)、Ta 2O 5(2.1306)、ZrO 2(2.1588)、ZnS(2.2719)、Nb 2O 5(2.3403)、TiO 2(2.6142)或TiN(3.1307)。 The high refractive index material of the anti-reflection coating has a refractive index of Nh at a wavelength of 587.6 nm, and the low refractive index material of the anti-reflection coating has a refractive index of Nl at a wavelength of 587.6 nm. The refractive index of the high-refractive-index material of the anti-reflection coating can be greater than 2.0, and the refractive index of the low-refractive-index material of the anti-reflection coating can be less than 1.8. For example, the anti-reflection coating material (refractive index at a wavelength of 587.6 nm) can be are: MgF 2 (1.3777), SiO 2 (1.4585), Al 2 O 3 (1.7682), HfO 2 (1.8935), ZnO (1.9269), Sc 2 O 3 (1.9872), AlN (2.0294), Si 3 N 4 (2.0381), Ta 2 O 5 (2.1306), ZrO 2 (2.1588), ZnS (2.2719), Nb 2 O 5 (2.3403), TiO 2 (2.6142) or TiN (3.1307).

靠近塑膠光學鏡片表面的第一層鍍膜材料可為TiO 2、AlN、Al 2O 3、氫氧化鋁(Al(OH) 3)或含鋁混合物,可以強化抗反射鍍膜與光學鏡片間的附著性,避免抗反射鍍膜脫落,達到保護光學鏡片表面之效果,有效強化光學鏡片的環境耐候性。 The first layer coating material close to the surface of the plastic optical lens can be TiO 2 , AlN, Al 2 O 3 , aluminum hydroxide (Al(OH) 3 ) or a mixture containing aluminum, which can strengthen the adhesion between the anti-reflection coating and the optical lens , to prevent the anti-reflection coating from falling off, to achieve the effect of protecting the surface of the optical lens, and effectively strengthen the environmental weather resistance of the optical lens.

抗反射鍍膜為相長干涉作用原理,在塑膠光學鏡片表面可製鍍單層或多層薄膜,可使用物理氣相沉積法(PVD),如蒸發沉積法或濺射沉積法等,或使用化學氣相沉積法(CVD),如超高真空化學氣相沉積法、微波電漿輔助化學氣相沉積法、電漿增強化學氣相沉積法或原子層沉積法等。The anti-reflection coating is based on the principle of constructive interference. Single-layer or multi-layer films can be coated on the surface of plastic optical lenses. Physical vapor deposition (PVD), such as evaporation deposition or sputtering deposition, can be used, or chemical gas can be used. Phase deposition (CVD), such as ultra-high vacuum chemical vapor deposition, microwave plasma-assisted chemical vapor deposition, plasma enhanced chemical vapor deposition or atomic layer deposition, etc.

本揭示內容的全視場為中心視場(0 Field)至最大像高視場(1.0 Field)的範圍,全視場範圍涵蓋光學鏡片表面的光學有效區域。The full field of view of the present disclosure is the range from the central field of view (0 Field) to the maximum image height field of view (1.0 Field), and the full field of view covers the optically effective area of the surface of the optical lens.

光學鏡片表面的切線斜率是在光軸為水平方向的狀態下進行計算,切線斜率在近光軸處為無限大(Infinity、INF、∞)。The tangent slope of the optical lens surface is calculated when the optical axis is in the horizontal direction, and the tangent slope is infinite at the near optical axis (Infinity, INF, ∞).

光學鏡頭另可以包含一繞射元件(Fresnel Lens)、一平板元件如紅外光濾除元件(IR-Cut Filter)、藍玻璃(Blue Glass)、短波長吸收元件、長波長吸收元件或保護玻璃(Cover Glass)等、一設置在感測元件表面或成像面的微透鏡(Micro Lens)、或一導光元件如反射鏡、稜鏡(Prism)、複眼系統(Fly-Eye Integrator)等濾除元件。抗反射元件的至少一表面可以具有抗反射鍍膜,抗反射鍍膜於不同膜層的主要材質可以為氧化鋁、矽氧化物或鈦氧化物等。The optical lens can also include a diffraction element (Fresnel Lens), a flat element such as an IR-Cut Filter, a blue glass, a short-wavelength absorbing element, a long-wavelength absorbing element or a protective glass ( Cover Glass), etc., a Micro Lens (Micro Lens) arranged on the surface of the sensing element or the imaging surface, or a filter element such as a light guide element such as a mirror, Prism, Fly-Eye Integrator, etc. . At least one surface of the anti-reflection element may be provided with an anti-reflection coating, and the main material of the anti-reflection coating on the different layers may be aluminum oxide, silicon oxide, or titanium oxide.

光學鏡頭另可以包含一平面元件或一曲面元件,平面元件或曲面元件設置在光學鏡片群內或光學鏡片群外,平面元件或曲面元件的表面可以具有相位次波長結構(Meta Lens),相位次波長結構可以包含金屬氧化物(如TiO 2、Al 2O 3)、金屬氮化物(如AlN)、矽氧化物(如SiO 2)或矽氮化物(如SiN)所組成的膜層。光學鏡頭中的光學鏡片表面可配置石墨烯膜層,以達到等同相位次波長結構的效果。 The optical lens may further include a plane element or a curved element, the plane element or the curved element is arranged in the optical lens group or outside the optical lens group, and the surface of the plane element or the curved element may have a phase subwavelength structure (Meta Lens), the phase subwavelength The wavelength structure can include a film layer composed of metal oxides (such as TiO 2 , Al 2 O 3 ), metal nitrides (such as AlN), silicon oxides (such as SiO 2 ) or silicon nitrides (such as SiN). The surface of the optical lens in the optical lens can be configured with a graphene film layer to achieve the effect of an equivalent phase sub-wavelength structure.

塑膠光學鏡片因厚度與高溫導致面型變化誤差過大,當抗反射鍍膜的膜層數越多,則溫度影響面型精度的狀況越明顯。藉由鏡片補正技術,能有效解決塑膠光學鏡片表面鍍膜時的溫度效應問題,有助於維持光學鏡片的鍍膜完整性與塑膠光學鏡片的高精度,為達成高品質成像鏡頭的關鍵技術。Due to the thickness and high temperature of the plastic optical lens, the surface shape change error is too large. When the number of layers of the anti-reflection coating is more, the temperature will affect the surface shape accuracy more obviously. The lens correction technology can effectively solve the problem of temperature effect when the surface of plastic optical lens is coated, which helps to maintain the coating integrity of the optical lens and the high precision of the plastic optical lens, which is the key technology to achieve high-quality imaging lens.

鏡片補正技術可應用模流(Moldflow)分析方法、曲線擬合函數方法或波前誤差方法等,但不以此為限。其中模流分析方法是藉由模流分析找出光學鏡片表面於Z軸收縮的立體輪廓節點,轉成非球面曲線後再與原始曲線比較差異,同時考慮光學鏡片的材料收縮率與面型變形趨勢,計算得到補正值。其中曲線擬合函數方法是藉由量測光學鏡片表面的輪廓誤差,以函數進行曲線擬合後並配合最佳化演算法,將擬合曲線逼近量測點而得到補正值。函數可以是指數(Exponential)或多項式(Polynomial)等,演算法可以是高斯牛頓法(Gauss Newton)、單形演算法(Simplex Algorithm)或最大陡降法(Steepest Descent Method)等。其中波前誤差方法是藉由干涉儀量測光學鏡頭的波前誤差(成像誤差)數據,以原始設計值波前誤差綜合分析製造組裝所產生的波前誤差,再經光學軟體優化得到補正值。The lens correction technology can be applied to the moldflow (Moldflow) analysis method, the curve fitting function method or the wavefront error method, etc., but not limited to this. The mold flow analysis method is to find out the three-dimensional contour nodes of the optical lens surface shrinking in the Z axis through mold flow analysis, convert it into an aspheric curve, and then compare the difference with the original curve, and consider the material shrinkage rate and surface deformation of the optical lens. The trend is calculated to obtain a correction value. The curve fitting function method is to measure the contour error of the optical lens surface, perform curve fitting with a function, and cooperate with the optimization algorithm to approximate the fitting curve to the measurement point to obtain the correction value. The function can be Exponential or Polynomial, and the algorithm can be Gauss Newton, Simplex Algorithm, or Steepest Descent Method. The wavefront error method is to measure the wavefront error (imaging error) data of the optical lens by an interferometer, comprehensively analyze the wavefront error generated by the manufacturing and assembly with the original design value of the wavefront error, and then optimize the optical software to obtain the correction value .

本揭示內容之另一態樣之一實施方式提供一種取像裝置,其包含如前述之光學鏡頭、一繞射元件及一電子感光元件,繞射元件的至少一表面包含一抗反射鍍膜,繞射元件的抗反射鍍膜之材質為氧化鋁,且電子感光元件設置於光學鏡頭的一成像面。藉由在繞射元件上製作氧化鋁材質的抗反射鍍膜,可解決繞射元件於面型轉折處的高反射問題。Another aspect of the present disclosure provides an image pickup device, which includes the aforementioned optical lens, a diffractive element, and an electron photosensitive element, at least one surface of the diffractive element includes an anti-reflection coating, and The material of the anti-reflection coating of the radiation element is aluminum oxide, and the electronic photosensitive element is arranged on an imaging surface of the optical lens. By making an anti-reflection coating of alumina material on the diffractive element, the problem of high reflection of the diffractive element at the turning point of the surface can be solved.

本揭示內容之另一態樣之另一實施方式提供一種取像裝置,其包含如前述之光學鏡頭、一曲面元件及一電子感光元件,曲面元件的至少一表面包含一相位次波長結構,且電子感光元件設置於光學鏡頭的一成像面。藉由設置具有相位次波長結構的曲面元件,可以大幅減少光學鏡片數量,有效縮短光學鏡頭的總長度,進而達到優異的光學鏡頭微型化效果。Another embodiment of another aspect of the present disclosure provides an imaging device, which includes the aforementioned optical lens, a curved element, and an electronic photosensitive element, at least one surface of the curved element includes a phase subwavelength structure, and The electronic photosensitive element is arranged on an imaging surface of the optical lens. By arranging the curved element with the phase subwavelength structure, the number of optical lenses can be greatly reduced, the total length of the optical lens can be effectively shortened, and the excellent miniaturization effect of the optical lens can be achieved.

本揭示內容之又一態樣提供一種電子裝置,其為一行動裝置且包含前述的光學鏡頭。Another aspect of the present disclosure provides an electronic device, which is a mobile device and includes the aforementioned optical lens.

根據上述說明,以下提出具體實施例予以詳細說明。Based on the above description, specific embodiments are provided below for detailed description.

<第一實施例><First Embodiment>

第一實施例的光學鏡頭包含四光學鏡片,由物側至像側分別為光學鏡片L1、光學鏡片L2、光學鏡片L3及光學鏡片L4。所述四光學鏡片中至少一光學鏡片包含一抗反射鍍膜,包含抗反射鍍膜的光學鏡片由一塑膠材料所製成,抗反射鍍膜位於光學鏡片的物側表面或像側表面,抗反射鍍膜包含至少一膜層,位於抗反射鍍膜最外側的膜層之材質為陶瓷,抗反射鍍膜包含複數個孔洞,且鄰近抗反射鍍膜最外側的孔洞之尺寸大於鄰近抗反射鍍膜最內側的孔洞之尺寸。其中,位於光學鏡片中心處的抗反射鍍膜的總厚度為Tc,位於光學鏡片周邊處的抗反射鍍膜的總厚度為Tp,光學鏡頭的抗反射鍍膜配置主因子為FAR,其滿足下列條件:|Tc-Tp|/Tc ≤ 5.00%;以及-1.5 ≤ FAR。The optical lens of the first embodiment includes four optical lenses, which are respectively an optical lens L1 , an optical lens L2 , an optical lens L3 and an optical lens L4 from the object side to the image side. At least one of the four optical lenses includes an anti-reflection coating, the optical lens including the anti-reflection coating is made of a plastic material, the anti-reflection coating is located on the object side surface or the image side surface of the optical lens, and the anti-reflection coating includes At least one film layer, the material of the film layer located on the outermost side of the anti-reflection coating is ceramic, the anti-reflection coating contains a plurality of holes, and the size of the outermost hole adjacent to the anti-reflection coating is larger than the size of the innermost hole adjacent to the anti-reflective coating. Among them, the total thickness of the anti-reflection coating at the center of the optical lens is Tc, the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp, and the main factor for the configuration of the anti-reflection coating of the optical lens is FAR, which satisfies the following conditions:| Tc-Tp|/Tc ≤ 5.00%; and -1.5 ≤ FAR.

光學鏡片L1材料的折射率為Ns,其滿足下列條件:Ns = 1.54。光學鏡片L1的抗反射鍍膜配置第三因子為Far3,其滿足下列條件:Far3 = 3.38。The refractive index of the optical lens L1 material is Ns, which satisfies the following conditions: Ns = 1.54. The third factor of the anti-reflection coating configuration of the optical lens L1 is Far3, which satisfies the following conditions: Far3 = 3.38.

光學鏡片L1的物側表面為R1,光學鏡片L1的物側表面R1的抗反射鍍膜配置主因子為FAR,其滿足下列條件:FAR = -0.610,光學鏡片L1的物側表面R1的抗反射鍍膜配置第一因子為Far1,其滿足下列條件:Far1 = 0.465,光學鏡片L1的物側表面R1的抗反射鍍膜配置第二因子為Far2,其滿足下列條件:Far2 = 0.156。The object-side surface of the optical lens L1 is R1, and the main factor of the anti-reflection coating configuration on the object-side surface R1 of the optical lens L1 is FAR, which satisfies the following conditions: FAR = -0.610, the anti-reflection coating on the object-side surface R1 of the optical lens L1 The configuration of the first factor is Far1, which satisfies the following conditions: Far1 = 0.465, and the second factor of the anti-reflection coating configuration of the object-side surface R1 of the optical lens L1 is Far2, which satisfies the following conditions: Far2 = 0.156.

光學鏡片L1的像側表面為R2,光學鏡片L1的像側表面R2的抗反射鍍膜配置主因子為FAR,其滿足下列條件:FAR = -2.931,光學鏡片L1的像側表面R2的抗反射鍍膜配置第一因子為Far1,其滿足下列條件:Far1 = 0.057,光學鏡片L1的像側表面R2的抗反射鍍膜配置第二因子為Far2,其滿足下列條件:Far2 = 0.006。The image-side surface of the optical lens L1 is R2, and the main factor of the anti-reflection coating configuration on the image-side surface R2 of the optical lens L1 is FAR, which satisfies the following conditions: FAR = -2.931, the anti-reflection coating on the image-side surface R2 of the optical lens L1 The configuration of the first factor is Far1, which satisfies the following conditions: Far1 = 0.057, and the second factor of the anti-reflection coating configuration of the image-side surface R2 of the optical lens L1 is Far2, which satisfies the following conditions: Far2 = 0.006.

光學鏡片L2材料的折射率為Ns,其滿足下列條件:Ns = 1.63。光學鏡片L2的抗反射鍍膜配置第三因子為Far3,其滿足下列條件:Far3 = 2.50。The refractive index of the optical lens L2 material is Ns, which satisfies the following conditions: Ns = 1.63. The third factor of the anti-reflection coating configuration of the optical lens L2 is Far3, which satisfies the following conditions: Far3 = 2.50.

光學鏡片L2的物側表面為R1,光學鏡片L2的物側表面R1的抗反射鍍膜配置主因子為FAR,其滿足下列條件:FAR = -4.577,光學鏡片L2的物側表面R1的抗反射鍍膜配置第一因子為Far1,其滿足下列條件:Far1 = 0.013,光學鏡片L2的物側表面R1的抗反射鍍膜配置第二因子為Far2,其滿足下列條件:Far2 = 0.001。The object-side surface of the optical lens L2 is R1, the main factor of the anti-reflection coating configuration on the object-side surface R1 of the optical lens L2 is FAR, which satisfies the following conditions: FAR = -4.577, the anti-reflection coating on the object-side surface R1 of the optical lens L2 The configuration of the first factor is Far1, which satisfies the following conditions: Far1 = 0.013, and the second factor of the anti-reflection coating configuration of the object-side surface R1 of the optical lens L2 is Far2, which satisfies the following conditions: Far2 = 0.001.

光學鏡片L2的像側表面為R2,光學鏡片L2的像側表面R2的抗反射鍍膜配置主因子為FAR,其滿足下列條件:FAR = -1.052,光學鏡片L2的像側表面R2的抗反射鍍膜配置第一因子為Far1,其滿足下列條件:Far1 = 0.413,光學鏡片L2的像側表面R2的抗反射鍍膜配置第二因子為Far2,其滿足下列條件:Far2 = 0.086。The image-side surface of the optical lens L2 is R2, and the main factor of the anti-reflection coating configuration on the image-side surface R2 of the optical lens L2 is FAR, which satisfies the following conditions: FAR = -1.052, the anti-reflection coating on the image-side surface R2 of the optical lens L2 The configuration of the first factor is Far1, which satisfies the following conditions: Far1 = 0.413, and the second factor of the anti-reflection coating configuration of the image-side surface R2 of the optical lens L2 is Far2, which satisfies the following conditions: Far2 = 0.086.

光學鏡片L3材料的折射率為Ns,其滿足下列條件:Ns = 1.54。光學鏡片L3的抗反射鍍膜配置第三因子為Far3,其滿足下列條件:Far3 = 3.38。The refractive index of the optical lens L3 material is Ns, which satisfies the following conditions: Ns = 1.54. The third factor of the anti-reflection coating configuration of the optical lens L3 is Far3, which satisfies the following conditions: Far3 = 3.38.

光學鏡片L3的物側表面為R1,光學鏡片L3的物側表面R1的抗反射鍍膜配置主因子為FAR,其滿足下列條件:FAR = -0.097,光學鏡片L3的物側表面R1的抗反射鍍膜配置第一因子為Far1,其滿足下列條件:Far1 = 0.547,光學鏡片L3的物側表面R1的抗反射鍍膜配置第二因子為Far2,其滿足下列條件:Far2 = 0.433。The object-side surface of the optical lens L3 is R1, and the main factor of the anti-reflection coating configuration on the object-side surface R1 of the optical lens L3 is FAR, which satisfies the following conditions: FAR = -0.097, the anti-reflection coating on the object-side surface R1 of the optical lens L3 The first factor is configured to be Far1, which satisfies the following conditions: Far1 = 0.547, and the second factor of the anti-reflection coating configuration of the object-side surface R1 of the optical lens L3 is Far2, which meets the following conditions: Far2 = 0.433.

光學鏡片L3的像側表面為R2,光學鏡片L3的像側表面R2的抗反射鍍膜配置主因子為FAR,其滿足下列條件:FAR = 0.447,光學鏡片L3的像側表面R2的抗反射鍍膜配置第一因子為Far1,其滿足下列條件:Far1 = 1.076,光學鏡片L3的像側表面R2的抗反射鍍膜配置第二因子為Far2,其滿足下列條件:Far2 = 0.770。The image-side surface of the optical lens L3 is R2, and the main factor of the anti-reflection coating configuration on the image-side surface R2 of the optical lens L3 is FAR, which meets the following conditions: FAR = 0.447, and the anti-reflection coating configuration on the image-side surface R2 of the optical lens L3 The first factor is Far1, which satisfies the following conditions: Far1 = 1.076, and the second factor is Far2 for the configuration of the anti-reflection coating on the image-side surface R2 of the optical lens L3, which satisfies the following conditions: Far2 = 0.770.

光學鏡片L4材料的折射率為Ns,其滿足下列條件:Ns = 1.53。光學鏡片L4的抗反射鍍膜配置第三因子為Far3,其滿足下列條件:Far3 = 3.56。The refractive index of the optical lens L4 material is Ns, which satisfies the following conditions: Ns = 1.53. The third factor of the anti-reflection coating configuration of the optical lens L4 is Far3, which satisfies the following conditions: Far3 = 3.56.

光學鏡片L4的物側表面為R1,光學鏡片L4的物側表面R1的抗反射鍍膜配置主因子為FAR,其滿足下列條件:FAR = -0.460,光學鏡片L4的物側表面R1的抗反射鍍膜配置第一因子為Far1,其滿足下列條件:Far1 = 0.986,光學鏡片L4的物側表面R1的抗反射鍍膜配置第二因子為Far2,其滿足下列條件:Far2 = 0.099。The object-side surface of the optical lens L4 is R1, and the main factor of the anti-reflection coating configuration on the object-side surface R1 of the optical lens L4 is FAR, which satisfies the following conditions: FAR = -0.460, the anti-reflection coating on the object-side surface R1 of the optical lens L4 The configuration of the first factor is Far1, which satisfies the following conditions: Far1 = 0.986, and the second factor of the anti-reflection coating configuration of the object-side surface R1 of the optical lens L4 is Far2, which satisfies the following conditions: Far2 = 0.099.

光學鏡片L4的像側表面為R2,光學鏡片L4的像側表面R2的抗反射鍍膜配置主因子為FAR,其滿足下列條件:FAR = 0.363,光學鏡片L4的像側表面R2的抗反射鍍膜配置第一因子為Far1,其滿足下列條件:Far1 = 1.125,光學鏡片L4的像側表面R2的抗反射鍍膜配置第二因子為Far2,其滿足下列條件:Far2 = 0.575。The image-side surface of the optical lens L4 is R2, and the main factor of the anti-reflection coating configuration of the image-side surface R2 of the optical lens L4 is FAR, which meets the following conditions: FAR = 0.363, the anti-reflection coating configuration of the image-side surface R2 of the optical lens L4 The first factor is Far1, which satisfies the following conditions: Far1 = 1.125, and the second factor is Far2 for the anti-reflection coating configuration of the image-side surface R2 of the optical lens L4, which satisfies the following conditions: Far2 = 0.575.

請一併參照第1圖,第1圖為第一實施例的光學鏡頭的反射率與波長的關係圖。此外,第一實施例的光學鏡頭所包含的各光學鏡片的詳細參數大小已列於下表一。 表一、第一實施例的光學鏡頭 FOV (度) 66.97   L1 L2 L3 L4 CTs 0.61 0.30 0.80 0.40 Ns (於波長 587.6 nm) 1.54 1.63 1.54 1.53 Far3= (1/(Ns-1)) 2 3.38 2.50 3.38 3.56 R1 |SAGmax| 0.28 0.00 0.44 0.39 Far1= |SAGmax|/CTs 0.465 0.013 0.547 0.986 |SPmin| 1.95 15.87 1.02 2.15 |SPavg| 3.28 76.92 2.27 4.72 Far2= 1/(|SPavg|×|SPmin|) 0.156 0.001 0.433 0.099 FAR= LOG(Far1×Far2×Far3) -0.610 -4.577 -0.097 -0.460 R2 |SAGmax| 0.03 0.12 0.86 0.45 Far1= |SAGmax|/CTs 0.057 0.413 1.076 1.125 |SPmin| 7.35 1.98 0.86 0.56 |SPavg| 22.22 5.88 1.50 3.12 Far2= 1/(|SPavg|×|SPmin|) 0.006 0.086 0.770 0.575 FAR= LOG(Far1×Far2×Far3) -2.931 -1.052 0.447 0.363 Please also refer to FIG. 1. FIG. 1 is a graph showing the relationship between the reflectivity and the wavelength of the optical lens according to the first embodiment. In addition, the detailed parameters of each optical lens included in the optical lens of the first embodiment are listed in Table 1 below. Table 1. Optical lens of the first embodiment FOV (degrees) 66.97 L1 L2 L3 L4 CTs 0.61 0.30 0.80 0.40 Ns (at wavelength 587.6 nm) 1.54 1.63 1.54 1.53 Far3= (1/(Ns-1)) 2 3.38 2.50 3.38 3.56 R1 |SAGmax| 0.28 0.00 0.44 0.39 Far1= |SAGmax|/CTs 0.465 0.013 0.547 0.986 |SPmin| 1.95 15.87 1.02 2.15 |SPavg| 3.28 76.92 2.27 4.72 Far2= 1/(|SPavg|×|SPmin|) 0.156 0.001 0.433 0.099 FAR= LOG(Far1×Far2×Far3) -0.610 -4.577 -0.097 -0.460 R2 |SAGmax| 0.03 0.12 0.86 0.45 Far1= |SAGmax|/CTs 0.057 0.413 1.076 1.125 |SPmin| 7.35 1.98 0.86 0.56 |SPavg| 22.22 5.88 1.50 3.12 Far2= 1/(|SPavg|×|SPmin|) 0.006 0.086 0.770 0.575 FAR= LOG(Far1×Far2×Far3) -2.931 -1.052 0.447 0.363

其中,各基材於光軸上的厚度為CTs,各光學鏡片表面上與光軸交點間水平位移的最大值為SAGmax,各光學鏡片表面於光學有效徑範圍內的切線斜率的平均值為SPavg,各光學鏡片表面於光學有效徑範圍內的切線斜率的最小值為SPmin。Wherein, the thickness of each substrate on the optical axis is CTs, the maximum value of the horizontal displacement between the intersection of each optical lens surface and the optical axis is SAGmax, and the average value of the tangent slope of each optical lens surface within the optical effective diameter range is SPavg , the minimum value of the tangent slope of each optical lens surface within the optical effective diameter range is SPmin.

<第二實施例><Second Embodiment>

第二實施例的光學鏡頭包含五光學鏡片,由物側至像側分別為光學鏡片L1、光學鏡片L2、光學鏡片L3、光學鏡片L4及光學鏡片L5。所述五光學鏡片中至少一光學鏡片包含一抗反射鍍膜,包含抗反射鍍膜的光學鏡片由一塑膠材料所製成,抗反射鍍膜位於光學鏡片的物側表面或像側表面,抗反射鍍膜包含至少一膜層,位於抗反射鍍膜最外側的膜層之材質為陶瓷,抗反射鍍膜包含複數個孔洞,且鄰近抗反射鍍膜最外側的孔洞之尺寸大於鄰近抗反射鍍膜最內側的孔洞之尺寸。其中,位於光學鏡片中心處的抗反射鍍膜的總厚度為Tc,位於光學鏡片周邊處的抗反射鍍膜的總厚度為Tp,光學鏡頭的抗反射鍍膜配置主因子為FAR,其滿足下列條件:|Tc-Tp|/Tc ≤ 5.00%;以及-1.5 ≤ FAR。The optical lens of the second embodiment includes five optical lenses, which are respectively an optical lens L1 , an optical lens L2 , an optical lens L3 , an optical lens L4 and an optical lens L5 from the object side to the image side. At least one optical lens in the five optical lenses includes an anti-reflection coating, the optical lens including the anti-reflection coating is made of a plastic material, the anti-reflection coating is located on the object side surface or the image side surface of the optical lens, and the anti-reflection coating includes At least one film layer, the material of the film layer located on the outermost side of the anti-reflection coating is ceramic, the anti-reflection coating contains a plurality of holes, and the size of the outermost hole adjacent to the anti-reflection coating is larger than the size of the innermost hole adjacent to the anti-reflective coating. Among them, the total thickness of the anti-reflection coating at the center of the optical lens is Tc, the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp, and the main factor for the configuration of the anti-reflection coating of the optical lens is FAR, which satisfies the following conditions:| Tc-Tp|/Tc ≤ 5.00%; and -1.5 ≤ FAR.

請一併參照第2圖,第2圖為第二實施例的光學鏡頭的反射率與波長的關係圖。此外,第二實施例的光學鏡頭所包含的各光學鏡片的詳細參數大小已列於下表二,其參數定義皆與第一實施例相同,於此不再贅述。 表二、第二實施例的光學鏡頭 FOV (度) 72.37   L1 L2 L3 L4 L5 CTs 0.50 0.24 0.39 0.38 1.23 Ns (於波長 587.6 nm) 1.54 1.64 1.54 1.64 1.54 Far3= (1/(Ns-1)) 2 3.38 2.44 3.38 2.44 3.38 R1 |SAGmax| 0.31 0.07 0.11 0.50 0.09 Far1= |SAGmax|/CTs 0.621 0.297 0.273 1.323 0.069 |SPmin| 1.47 10.00 1.96 1.79 5.56 |SPavg| 3.02 13.33 9.43 2.67 12.82 Far2= 1/(|SPavg|×|SPmin|) 0.225 0.008 0.054 0.210 0.014 FAR= LOG(Far1×Far2×Far3) -0.326 -2.265 -1.303 -0.168 -2.482 R2 |SAGmax| 0.02 0.26 0.28 0.53 0.17 Far1= |SAGmax|/CTs 0.044 1.090 0.724 1.395 0.142 |SPmin| 8.33 1.37 1.82 1.75 2.50 |SPavg| 33.33 3.64 4.10 2.93 6.17 Far2= 1/(|SPavg|×|SPmin|) 0.004 0.201 0.134 0.194 0.065 FAR= LOG(Far1×Far2×Far3) -3.268 -0.272 -0.484 -0.179 -1.507 Please also refer to FIG. 2. FIG. 2 is a graph showing the relationship between the reflectivity and the wavelength of the optical lens according to the second embodiment. In addition, the detailed parameters of the optical lenses included in the optical lens of the second embodiment are listed in Table 2 below, and the definitions of the parameters are the same as those of the first embodiment, and will not be repeated here. Table 2. Optical lens of the second embodiment FOV (degrees) 72.37 L1 L2 L3 L4 L5 CTs 0.50 0.24 0.39 0.38 1.23 Ns (at wavelength 587.6 nm) 1.54 1.64 1.54 1.64 1.54 Far3= (1/(Ns-1)) 2 3.38 2.44 3.38 2.44 3.38 R1 |SAGmax| 0.31 0.07 0.11 0.50 0.09 Far1= |SAGmax|/CTs 0.621 0.297 0.273 1.323 0.069 |SPmin| 1.47 10.00 1.96 1.79 5.56 |SPavg| 3.02 13.33 9.43 2.67 12.82 Far2= 1/(|SPavg|×|SPmin|) 0.225 0.008 0.054 0.210 0.014 FAR= LOG(Far1×Far2×Far3) -0.326 -2.265 -1.303 -0.168 -2.482 R2 |SAGmax| 0.02 0.26 0.28 0.53 0.17 Far1= |SAGmax|/CTs 0.044 1.090 0.724 1.395 0.142 |SPmin| 8.33 1.37 1.82 1.75 2.50 |SPavg| 33.33 3.64 4.10 2.93 6.17 Far2= 1/(|SPavg|×|SPmin|) 0.004 0.201 0.134 0.194 0.065 FAR= LOG(Far1×Far2×Far3) -3.268 -0.272 -0.484 -0.179 -1.507

<第三實施例><Third Embodiment>

第三實施例的光學鏡頭包含五光學鏡片,由物側至像側分別為光學鏡片L1、光學鏡片L2、光學鏡片L3、光學鏡片L4及光學鏡片L5。所述五光學鏡片中至少一光學鏡片包含一抗反射鍍膜,包含抗反射鍍膜的光學鏡片由一塑膠材料所製成,抗反射鍍膜位於光學鏡片的物側表面或像側表面,抗反射鍍膜包含至少一膜層,位於抗反射鍍膜最外側的膜層之材質為陶瓷,抗反射鍍膜包含複數個孔洞,且鄰近抗反射鍍膜最外側的孔洞之尺寸大於鄰近抗反射鍍膜最內側的孔洞之尺寸。其中,位於光學鏡片中心處的抗反射鍍膜的總厚度為Tc,位於光學鏡片周邊處的抗反射鍍膜的總厚度為Tp,光學鏡頭的抗反射鍍膜配置主因子為FAR,其滿足下列條件:|Tc-Tp|/Tc ≤ 5.00%;以及-1.5 ≤ FAR。The optical lens of the third embodiment includes five optical lenses, which are respectively an optical lens L1 , an optical lens L2 , an optical lens L3 , an optical lens L4 and an optical lens L5 from the object side to the image side. At least one optical lens in the five optical lenses includes an anti-reflection coating, the optical lens including the anti-reflection coating is made of a plastic material, the anti-reflection coating is located on the object side surface or the image side surface of the optical lens, and the anti-reflection coating includes At least one film layer, the material of the film layer located on the outermost side of the anti-reflection coating is ceramic, the anti-reflection coating contains a plurality of holes, and the size of the outermost hole adjacent to the anti-reflection coating is larger than the size of the innermost hole adjacent to the anti-reflective coating. Among them, the total thickness of the anti-reflection coating at the center of the optical lens is Tc, the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp, and the main factor for the configuration of the anti-reflection coating of the optical lens is FAR, which satisfies the following conditions:| Tc-Tp|/Tc ≤ 5.00%; and -1.5 ≤ FAR.

請一併參照第3圖,第3圖為第三實施例的光學鏡頭的反射率與波長的關係圖。此外,第三實施例的光學鏡頭所包含的各光學鏡片的詳細參數大小已列於下表三,其參數定義皆與第一實施例相同,於此不再贅述。 表三、第三實施例的光學鏡頭 FOV (度) 74.74   L1 L2 L3 L4 L5 CTs 0.63 0.25 0.26 0.64 0.32 Ns (於波長 587.6 nm) 1.54 1.64 1.64 1.54 1.54 Far3= (1/(Ns-1)) 2 3.38 2.45 2.45 3.38 3.38 R1 |SAGmax| 0.34 0.01 0.10 0.15 0.62 Far1= |SAGmax|/CTs 0.535 0.058 0.370 0.228 1.911 |SPmin| 1.27 8.33 3.50 5.03 1.75 |SPavg| 2.67 43.48 9.09 9.26 3.32 Far2= 1/(|SPavg|×|SPmin|) 0.295 0.003 0.031 0.021 0.172 FAR= LOG(Far1×Far2×Far3) -0.273 -3.405 -1.545 -1.781 0.046 R2 |SAGmax| 0.01 0.18 0.09 0.49 0.41 Far1= |SAGmax|/CTs 0.010 0.730 0.327 0.765 1.272 |SPmin| 2.79 1.39 4.55 1.98 1.11 |SPavg| 29.41 4.61 11.90 3.17 3.45 Far2= 1/(|SPavg|×|SPmin|) 0.012 0.156 0.018 0.159 0.262 FAR= LOG(Far1×Far2×Far3) -3.373 -0.555 -1.830 -0.386 0.052 Please also refer to FIG. 3. FIG. 3 is a graph showing the relationship between the reflectivity and the wavelength of the optical lens according to the third embodiment. In addition, the detailed parameters of the optical lenses included in the optical lens of the third embodiment are listed in Table 3 below, and the definitions of the parameters are the same as those of the first embodiment, and will not be repeated here. Table 3. Optical lens of the third embodiment FOV (degrees) 74.74 L1 L2 L3 L4 L5 CTs 0.63 0.25 0.26 0.64 0.32 Ns (at wavelength 587.6 nm) 1.54 1.64 1.64 1.54 1.54 Far3= (1/(Ns-1)) 2 3.38 2.45 2.45 3.38 3.38 R1 |SAGmax| 0.34 0.01 0.10 0.15 0.62 Far1= |SAGmax|/CTs 0.535 0.058 0.370 0.228 1.911 |SPmin| 1.27 8.33 3.50 5.03 1.75 |SPavg| 2.67 43.48 9.09 9.26 3.32 Far2= 1/(|SPavg|×|SPmin|) 0.295 0.003 0.031 0.021 0.172 FAR= LOG(Far1×Far2×Far3) -0.273 -3.405 -1.545 -1.781 0.046 R2 |SAGmax| 0.01 0.18 0.09 0.49 0.41 Far1= |SAGmax|/CTs 0.010 0.730 0.327 0.765 1.272 |SPmin| 2.79 1.39 4.55 1.98 1.11 |SPavg| 29.41 4.61 11.90 3.17 3.45 Far2= 1/(|SPavg|×|SPmin|) 0.012 0.156 0.018 0.159 0.262 FAR= LOG(Far1×Far2×Far3) -3.373 -0.555 -1.830 -0.386 0.052

<第四實施例><Fourth Embodiment>

第四實施例的光學鏡頭包含六光學鏡片,由物側至像側分別為光學鏡片L1、光學鏡片L2、光學鏡片L3、光學鏡片L4、光學鏡片L5及光學鏡片L6。所述六光學鏡片中至少一光學鏡片包含一抗反射鍍膜,包含抗反射鍍膜的光學鏡片由一塑膠材料所製成,抗反射鍍膜位於光學鏡片的物側表面或像側表面,抗反射鍍膜包含至少一膜層,位於抗反射鍍膜最外側的膜層之材質為陶瓷,抗反射鍍膜包含複數個孔洞,且鄰近抗反射鍍膜最外側的孔洞之尺寸大於鄰近抗反射鍍膜最內側的孔洞之尺寸。其中,位於光學鏡片中心處的抗反射鍍膜的總厚度為Tc,位於光學鏡片周邊處的抗反射鍍膜的總厚度為Tp,光學鏡頭的抗反射鍍膜配置主因子為FAR,其滿足下列條件:|Tc-Tp|/Tc ≤ 5.00%;以及-1.5 ≤ FAR。The optical lens of the fourth embodiment includes six optical lenses, which are an optical lens L1 , an optical lens L2 , an optical lens L3 , an optical lens L4 , an optical lens L5 and an optical lens L6 respectively from the object side to the image side. At least one optical lens in the six optical lenses includes an anti-reflection coating, the optical lens including the anti-reflection coating is made of a plastic material, the anti-reflection coating is located on the object side surface or the image side surface of the optical lens, and the anti-reflection coating includes At least one film layer, the material of the film layer located on the outermost side of the anti-reflection coating is ceramic, the anti-reflection coating contains a plurality of holes, and the size of the outermost hole adjacent to the anti-reflection coating is larger than the size of the innermost hole adjacent to the anti-reflective coating. Among them, the total thickness of the anti-reflection coating at the center of the optical lens is Tc, the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp, and the main factor for the configuration of the anti-reflection coating of the optical lens is FAR, which satisfies the following conditions:| Tc-Tp|/Tc ≤ 5.00%; and -1.5 ≤ FAR.

第四實施例的光學鏡頭所包含的各光學鏡片的詳細參數大小已列於下表四,其參數定義皆與第一實施例相同,於此不再贅述。 表四、第四實施例的光學鏡頭 FOV (度) 83.97   L1 L2 L3 L4 L5 CTs 0.82 0.28 0.55 0.35 0.77 Ns (於波長 587.6 nm) 1.54 1.69 1.54 1.59 1.54 Far3= (1/(Ns-1)) 2 3.37 2.12 3.38 2.90 3.38 R1 |SAGmax| 0.58 0.06 0.11 0.29 0.44 Far1= |SAGmax|/CTs 0.711 0.208 0.201 0.830 0.581 |SPmin| 1.21 4.65 2.34 1.35 1.81 |SPavg| 2.53 19.23 11.24 5.15 5.71 Far2= 1/(|SPavg|×|SPmin|) 0.326 0.011 0.038 0.144 0.097 FAR= LOG(Far1×Far2×Far3) -0.107 -2.306 -1.587 -0.460 -0.722 R2 |SAGmax| 0.07 0.17 0.24 0.23 0.88 Far1= |SAGmax|/CTs 0.090 0.609 0.437 0.659 1.144 |SPmin| 11.90 1.67 1.86 3.03 2.21 |SPavg| 18.52 6.17 6.54 6.94 3.45 Far2= 1/(|SPavg|×|SPmin|) 0.005 0.097 0.082 0.048 0.131 FAR= LOG(Far1×Far2×Far3) -2.861 -0.900 -0.915 -1.042 -0.294   L6   CTs 0.59 Ns (於波長 587.6 nm) 1.53 Far3= (1/(Ns-1)) 2 3.51 R1 |SAGmax| 1.06 Far1= |SAGmax|/CTs 1.811 |SPmin| 1.42 |SPavg| 3.24 Far2= 1/(|SPavg|×|SPmin|) 0.217 FAR= LOG(Far1×Far2×Far3) 0.140 R2 |SAGmax| 0.88 Far1= |SAGmax|/CTs 1.501 |SPmin| 1.21 |SPavg| 3.36 Far2= 1/(|SPavg|×|SPmin|) 0.247 FAR= LOG(Far1×Far2×Far3) 0.114 The detailed parameters of the optical lenses included in the optical lens of the fourth embodiment are listed in Table 4 below, and the definitions of the parameters are the same as those of the first embodiment, and will not be repeated here. Table 4. Optical lens of the fourth embodiment FOV (degrees) 83.97 L1 L2 L3 L4 L5 CTs 0.82 0.28 0.55 0.35 0.77 Ns (at wavelength 587.6 nm) 1.54 1.69 1.54 1.59 1.54 Far3= (1/(Ns-1)) 2 3.37 2.12 3.38 2.90 3.38 R1 |SAGmax| 0.58 0.06 0.11 0.29 0.44 Far1= |SAGmax|/CTs 0.711 0.208 0.201 0.830 0.581 |SPmin| 1.21 4.65 2.34 1.35 1.81 |SPavg| 2.53 19.23 11.24 5.15 5.71 Far2= 1/(|SPavg|×|SPmin|) 0.326 0.011 0.038 0.144 0.097 FAR= LOG(Far1×Far2×Far3) -0.107 -2.306 -1.587 -0.460 -0.722 R2 |SAGmax| 0.07 0.17 0.24 0.23 0.88 Far1= |SAGmax|/CTs 0.090 0.609 0.437 0.659 1.144 |SPmin| 11.90 1.67 1.86 3.03 2.21 |SPavg| 18.52 6.17 6.54 6.94 3.45 Far2= 1/(|SPavg|×|SPmin|) 0.005 0.097 0.082 0.048 0.131 FAR= LOG(Far1×Far2×Far3) -2.861 -0.900 -0.915 -1.042 -0.294 L6 CTs 0.59 Ns (at wavelength 587.6 nm) 1.53 Far3= (1/(Ns-1)) 2 3.51 R1 |SAGmax| 1.06 Far1= |SAGmax|/CTs 1.811 |SPmin| 1.42 |SPavg| 3.24 Far2= 1/(|SPavg|×|SPmin|) 0.217 FAR= LOG(Far1×Far2×Far3) 0.140 R2 |SAGmax| 0.88 Far1= |SAGmax|/CTs 1.501 |SPmin| 1.21 |SPavg| 3.36 Far2= 1/(|SPavg|×|SPmin|) 0.247 FAR= LOG(Far1×Far2×Far3) 0.114

<第五實施例><Fifth Embodiment>

第五實施例的光學鏡頭包含六光學鏡片,由物側至像側分別為光學鏡片L1、光學鏡片L2、光學鏡片L3、光學鏡片L4、光學鏡片L5及光學鏡片L6。所述六光學鏡片中至少一光學鏡片包含一抗反射鍍膜,包含抗反射鍍膜的光學鏡片由一塑膠材料所製成,抗反射鍍膜位於光學鏡片的物側表面或像側表面,抗反射鍍膜包含至少一膜層,位於抗反射鍍膜最外側的膜層之材質為陶瓷,抗反射鍍膜包含複數個孔洞,且鄰近抗反射鍍膜最外側的孔洞之尺寸大於鄰近抗反射鍍膜最內側的孔洞之尺寸。其中,位於光學鏡片中心處的抗反射鍍膜的總厚度為Tc,位於光學鏡片周邊處的抗反射鍍膜的總厚度為Tp,光學鏡頭的抗反射鍍膜配置主因子為FAR,其滿足下列條件:|Tc-Tp|/Tc ≤ 5.00%;以及-1.5 ≤ FAR。The optical lens of the fifth embodiment includes six optical lenses, which are an optical lens L1 , an optical lens L2 , an optical lens L3 , an optical lens L4 , an optical lens L5 and an optical lens L6 from the object side to the image side. At least one optical lens in the six optical lenses includes an anti-reflection coating, the optical lens including the anti-reflection coating is made of a plastic material, the anti-reflection coating is located on the object side surface or the image side surface of the optical lens, and the anti-reflection coating includes At least one film layer, the material of the film layer located on the outermost side of the anti-reflection coating is ceramic, the anti-reflection coating contains a plurality of holes, and the size of the outermost hole adjacent to the anti-reflection coating is larger than the size of the innermost hole adjacent to the anti-reflective coating. Among them, the total thickness of the anti-reflection coating at the center of the optical lens is Tc, the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp, and the main factor for the configuration of the anti-reflection coating of the optical lens is FAR, which satisfies the following conditions:| Tc-Tp|/Tc ≤ 5.00%; and -1.5 ≤ FAR.

第五實施例的光學鏡頭所包含的各光學鏡片的詳細參數大小已列於下表五,其參數定義皆與第一實施例相同,於此不再贅述。 表五、第五實施例的光學鏡頭 FOV (度) 85.45   L1 L2 L3 L4 L5 CTs 0.82 0.28 0.55 0.35 0.77 Ns (於波長 587.6 nm) 1.54 1.69 1.54 1.59 1.54 Far3= (1/(Ns-1)) 2 3.37 2.12 3.38 2.90 3.38 R1 |SAGmax| 0.58 0.06 0.11 0.35 0.45 Far1= |SAGmax|/CTs 0.711 0.208 0.202 0.995 0.590 |SPmin| 1.21 4.65 2.34 1.33 1.81 |SPavg| 2.53 19.23 11.24 4.67 5.85 Far2= 1/(|SPavg|×|SPmin|) 0.326 0.011 0.038 0.161 0.094 FAR= LOG(Far1×Far2×Far3) -0.107 -2.306 -1.585 -0.334 -0.725 R2 |SAGmax| 0.07 0.17 0.24 0.31 0.90 Far1= |SAGmax|/CTs 0.090 0.596 0.439 0.900 1.172 |SPmin| 11.90 1.67 1.86 1.08 2.21 |SPavg| 18.52 6.17 6.58 5.85 3.48 Far2= 1/(|SPavg|×|SPmin|) 0.005 0.097 0.082 0.158 0.130 FAR= LOG(Far1×Far2×Far3) -2.861 -0.910 -0.915 -0.384 -0.288   L6   CTs 0.59 Ns (於波長 587.6 nm) 1.53 Far3= (1/(Ns-1)) 2 3.51 R1 |SAGmax| 1.06 Far1= |SAGmax|/CTs 1.811 |SPmin| 1.42 |SPavg| 3.25 Far2= 1/(|SPavg|×|SPmin|) 0.216 FAR= LOG(Far1×Far2×Far3) 0.138 R2 |SAGmax| 0.88 Far1= |SAGmax|/CTs 1.503 |SPmin| 1.21 |SPavg| 3.36 Far2= 1/(|SPavg|×|SPmin|) 0.247 FAR= LOG(Far1×Far2×Far3) 0.115 The detailed parameters of the optical lenses included in the optical lens of the fifth embodiment are listed in Table 5 below, and the definitions of the parameters are the same as those of the first embodiment, and will not be repeated here. Table 5. Optical lens of the fifth embodiment FOV (degrees) 85.45 L1 L2 L3 L4 L5 CTs 0.82 0.28 0.55 0.35 0.77 Ns (at wavelength 587.6 nm) 1.54 1.69 1.54 1.59 1.54 Far3= (1/(Ns-1)) 2 3.37 2.12 3.38 2.90 3.38 R1 |SAGmax| 0.58 0.06 0.11 0.35 0.45 Far1= |SAGmax|/CTs 0.711 0.208 0.202 0.995 0.590 |SPmin| 1.21 4.65 2.34 1.33 1.81 |SPavg| 2.53 19.23 11.24 4.67 5.85 Far2= 1/(|SPavg|×|SPmin|) 0.326 0.011 0.038 0.161 0.094 FAR= LOG(Far1×Far2×Far3) -0.107 -2.306 -1.585 -0.334 -0.725 R2 |SAGmax| 0.07 0.17 0.24 0.31 0.90 Far1= |SAGmax|/CTs 0.090 0.596 0.439 0.900 1.172 |SPmin| 11.90 1.67 1.86 1.08 2.21 |SPavg| 18.52 6.17 6.58 5.85 3.48 Far2= 1/(|SPavg|×|SPmin|) 0.005 0.097 0.082 0.158 0.130 FAR= LOG(Far1×Far2×Far3) -2.861 -0.910 -0.915 -0.384 -0.288 L6 CTs 0.59 Ns (at wavelength 587.6 nm) 1.53 Far3= (1/(Ns-1)) 2 3.51 R1 |SAGmax| 1.06 Far1= |SAGmax|/CTs 1.811 |SPmin| 1.42 |SPavg| 3.25 Far2= 1/(|SPavg|×|SPmin|) 0.216 FAR= LOG(Far1×Far2×Far3) 0.138 R2 |SAGmax| 0.88 Far1= |SAGmax|/CTs 1.503 |SPmin| 1.21 |SPavg| 3.36 Far2= 1/(|SPavg|×|SPmin|) 0.247 FAR= LOG(Far1×Far2×Far3) 0.115

<第六實施例><Sixth Embodiment>

第六實施例的光學鏡頭包含七光學鏡片,由物側至像側分別為光學鏡片L1、光學鏡片L2、光學鏡片L3、光學鏡片L4、光學鏡片L5、光學鏡片L6及光學鏡片L7。所述七光學鏡片中至少一光學鏡片包含一抗反射鍍膜,包含抗反射鍍膜的光學鏡片由一塑膠材料所製成,抗反射鍍膜位於光學鏡片的物側表面或像側表面,抗反射鍍膜包含至少一膜層,位於抗反射鍍膜最外側的膜層之材質為陶瓷,抗反射鍍膜包含複數個孔洞,且鄰近抗反射鍍膜最外側的孔洞之尺寸大於鄰近抗反射鍍膜最內側的孔洞之尺寸。其中,位於光學鏡片中心處的抗反射鍍膜的總厚度為Tc,位於光學鏡片周邊處的抗反射鍍膜的總厚度為Tp,光學鏡頭的抗反射鍍膜配置主因子為FAR,其滿足下列條件:|Tc-Tp|/Tc ≤ 5.00%;以及-1.5 ≤ FAR。The optical lens of the sixth embodiment includes seven optical lenses, from the object side to the image side, respectively, an optical lens L1, an optical lens L2, an optical lens L3, an optical lens L4, an optical lens L5, an optical lens L6 and an optical lens L7. At least one optical lens in the seven optical lenses includes an anti-reflection coating, the optical lens including the anti-reflection coating is made of a plastic material, the anti-reflection coating is located on the object side surface or the image side surface of the optical lens, and the anti-reflection coating includes At least one film layer, the material of the film layer located on the outermost side of the anti-reflection coating is ceramic, the anti-reflection coating contains a plurality of holes, and the size of the outermost hole adjacent to the anti-reflection coating is larger than the size of the innermost hole adjacent to the anti-reflective coating. Among them, the total thickness of the anti-reflection coating at the center of the optical lens is Tc, the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp, and the main factor for the configuration of the anti-reflection coating of the optical lens is FAR, which satisfies the following conditions:| Tc-Tp|/Tc ≤ 5.00%; and -1.5 ≤ FAR.

請一併參照第4圖,第4圖為第六實施例的光學鏡頭的反射率與波長的關係圖。此外,第六實施例的光學鏡頭所包含的各光學鏡片的詳細參數大小已列於下表六,其參數定義皆與第一實施例相同,於此不再贅述。 表六、第六實施例的光學鏡頭 FOV (度) 78.95   L1 L2 L3 L4 L5 CTs 0.90 0.36 0.58 0.41 1.16 Ns (於波長 587.6 nm) 1.54 1.66 1.54 1.66 1.54 Far3= (1/(Ns-1)) 2 3.38 2.30 3.38 2.30 3.38 R1 |SAGmax| 0.50 0.17 0.14 0.14 0.13 Far1= |SAGmax|/CTs 0.556 0.475 0.244 0.345 0.115 |SPmin| 2.08 3.91 1.78 2.92 9.17 |SPavg| 3.77 10.31 11.36 9.17 15.87 Far2= 1/(|SPavg|×|SPmin|) 0.127 0.025 0.049 0.037 0.007 FAR= LOG(Far1×Far2×Far3) -0.621 -1.567 -1.390 -1.528 -2.573 R2 |SAGmax| 0.05 0.27 0.37 0.08 0.70 Far1= |SAGmax|/CTs 0.058 0.755 0.635 0.187 0.607 |SPmin| 5.21 2.19 1.04 4.35 1.78 |SPavg| 35.71 5.92 4.65 15.38 3.50 Far2= 1/(|SPavg|×|SPmin|) 0.005 0.077 0.206 0.015 0.161 FAR= LOG(Far1×Far2×Far3) -2.975 -0.874 -0.353 -2.192 -0.481   L6 L7   CTs 0.51 0.54 Ns (於波長 587.6 nm) 1.54 1.54 Far3= (1/(Ns-1)) 2 3.38 3.38 R1 |SAGmax| 0.51 0.83 Far1= |SAGmax|/CTs 1.005 1.528 |SPmin| 0.79 1.79 |SPavg| 2.59 3.70 Far2= 1/(|SPavg|×|SPmin|) 0.488 0.151 FAR= LOG(Far1×Far2×Far3) 0.220 -0.107 R2 |SAGmax| 0.42 0.60 Far1= |SAGmax|/CTs 0.814 1.107 |SPmin| 0.81 1.47 |SPavg| 2.67 3.41 Far2= 1/(|SPavg|×|SPmin|) 0.463 0.199 FAR= LOG(Far1×Far2×Far3) 0.105 -0.128 Please also refer to FIG. 4. FIG. 4 is a graph showing the relationship between the reflectivity and the wavelength of the optical lens according to the sixth embodiment. In addition, the detailed parameters of the optical lenses included in the optical lens of the sixth embodiment are listed in Table 6 below, and the definitions of the parameters are the same as those of the first embodiment, and will not be repeated here. Table 6. Optical lens of the sixth embodiment FOV (degrees) 78.95 L1 L2 L3 L4 L5 CTs 0.90 0.36 0.58 0.41 1.16 Ns (at wavelength 587.6 nm) 1.54 1.66 1.54 1.66 1.54 Far3= (1/(Ns-1)) 2 3.38 2.30 3.38 2.30 3.38 R1 |SAGmax| 0.50 0.17 0.14 0.14 0.13 Far1= |SAGmax|/CTs 0.556 0.475 0.244 0.345 0.115 |SPmin| 2.08 3.91 1.78 2.92 9.17 |SPavg| 3.77 10.31 11.36 9.17 15.87 Far2= 1/(|SPavg|×|SPmin|) 0.127 0.025 0.049 0.037 0.007 FAR= LOG(Far1×Far2×Far3) -0.621 -1.567 -1.390 -1.528 -2.573 R2 |SAGmax| 0.05 0.27 0.37 0.08 0.70 Far1= |SAGmax|/CTs 0.058 0.755 0.635 0.187 0.607 |SPmin| 5.21 2.19 1.04 4.35 1.78 |SPavg| 35.71 5.92 4.65 15.38 3.50 Far2= 1/(|SPavg|×|SPmin|) 0.005 0.077 0.206 0.015 0.161 FAR= LOG(Far1×Far2×Far3) -2.975 -0.874 -0.353 -2.192 -0.481 L6 L7 CTs 0.51 0.54 Ns (at wavelength 587.6 nm) 1.54 1.54 Far3= (1/(Ns-1)) 2 3.38 3.38 R1 |SAGmax| 0.51 0.83 Far1= |SAGmax|/CTs 1.005 1.528 |SPmin| 0.79 1.79 |SPavg| 2.59 3.70 Far2= 1/(|SPavg|×|SPmin|) 0.488 0.151 FAR= LOG(Far1×Far2×Far3) 0.220 -0.107 R2 |SAGmax| 0.42 0.60 Far1= |SAGmax|/CTs 0.814 1.107 |SPmin| 0.81 1.47 |SPavg| 2.67 3.41 Far2= 1/(|SPavg|×|SPmin|) 0.463 0.199 FAR= LOG(Far1×Far2×Far3) 0.105 -0.128

<第七實施例><Seventh Embodiment>

第七實施例的光學鏡頭包含七光學鏡片,由物側至像側分別為光學鏡片L1、光學鏡片L2、光學鏡片L3、光學鏡片L4、光學鏡片L5、光學鏡片L6及光學鏡片L7。所述七光學鏡片中至少一光學鏡片包含一抗反射鍍膜,包含抗反射鍍膜的光學鏡片由一塑膠材料所製成,抗反射鍍膜位於光學鏡片的物側表面或像側表面,抗反射鍍膜包含至少一膜層,位於抗反射鍍膜最外側的膜層之材質為陶瓷,抗反射鍍膜包含複數個孔洞,且鄰近抗反射鍍膜最外側的孔洞之尺寸大於鄰近抗反射鍍膜最內側的孔洞之尺寸。其中,位於光學鏡片中心處的抗反射鍍膜的總厚度為Tc,位於光學鏡片周邊處的抗反射鍍膜的總厚度為Tp,光學鏡頭的抗反射鍍膜配置主因子為FAR,其滿足下列條件:|Tc-Tp|/Tc ≤ 5.00%;以及-1.5 ≤ FAR。The optical lens of the seventh embodiment includes seven optical lenses, which are optical lens L1 , optical lens L2 , optical lens L3 , optical lens L4 , optical lens L5 , optical lens L6 and optical lens L7 from the object side to the image side. At least one optical lens in the seven optical lenses includes an anti-reflection coating, the optical lens including the anti-reflection coating is made of a plastic material, the anti-reflection coating is located on the object side surface or the image side surface of the optical lens, and the anti-reflection coating includes At least one film layer, the material of the film layer located on the outermost side of the anti-reflection coating is ceramic, the anti-reflection coating contains a plurality of holes, and the size of the outermost hole adjacent to the anti-reflection coating is larger than the size of the innermost hole adjacent to the anti-reflective coating. Among them, the total thickness of the anti-reflection coating at the center of the optical lens is Tc, the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp, and the main factor for the configuration of the anti-reflection coating of the optical lens is FAR, which satisfies the following conditions:| Tc-Tp|/Tc ≤ 5.00%; and -1.5 ≤ FAR.

請一併參照第5圖,第5圖為第七實施例的光學鏡頭的反射率與波長的關係圖。此外,第七實施例的光學鏡頭所包含的各光學鏡片的詳細參數大小已列於下表七,其參數定義皆與第一實施例相同,於此不再贅述。 表七、第七實施例的光學鏡頭 FOV (度) 84.91   L1 L2 L3 L4 L5 CTs 0.71 0.23 0.66 0.30 0.57 Ns (於波長 587.6 nm) 1.54 1.67 1.54 1.64 1.57 Far3= (1/(Ns-1)) 2 3.37 2.23 3.38 2.45 3.12 R1 |SAGmax| 0.53 0.16 0.13 0.48 0.41 Far1= |SAGmax|/CTs 0.745 0.692 0.198 1.593 0.733 |SPmin| 1.29 3.69 1.77 1.56 1.74 |SPavg| 2.81 7.81 10.42 3.89 5.65 Far2= 1/(|SPavg|×|SPmin|) 0.276 0.035 0.054 0.164 0.102 FAR= LOG(Far1×Far2×Far3) -0.160 -1.271 -1.440 -0.193 -0.632 R2 |SAGmax| 0.09 0.26 0.46 0.34 0.61 Far1= |SAGmax|/CTs 0.128 1.114 0.687 1.130 1.080 |SPmin| 9.52 1.62 0.79 2.16 2.10 |SPavg| 15.87 4.42 3.68 6.06 4.42 Far2= 1/(|SPavg|×|SPmin|) 0.007 0.140 0.346 0.076 0.108 FAR= LOG(Far1×Far2×Far3) -2.546 -0.459 -0.095 -0.674 -0.441   L6 L7   CTs 0.60 0.53 Ns (於波長 587.6 nm) 1.54 1.53 Far3= (1/(Ns-1)) 2 3.37 3.50 R1 |SAGmax| 0.33 0.32 Far1= |SAGmax|/CTs 0.555 0.599 |SPmin| 2.17 3.55 |SPavg| 4.33 9.80 Far2= 1/(|SPavg|×|SPmin|) 0.106 0.029 FAR= LOG(Far1×Far2×Far3) -0.702 -1.219 R2 |SAGmax| 0.33 0.29 Far1= |SAGmax|/CTs 0.547 0.542 |SPmin| 1.30 3.51 |SPavg| 4.12 6.29 Far2= 1/(|SPavg|×|SPmin|) 0.187 0.045 FAR= LOG(Far1×Far2×Far3) -0.464 -1.066 Please also refer to FIG. 5. FIG. 5 is a graph showing the relationship between the reflectivity and the wavelength of the optical lens according to the seventh embodiment. In addition, the detailed parameters of the optical lenses included in the optical lens of the seventh embodiment are listed in Table 7 below, and the definitions of the parameters are the same as those of the first embodiment, and will not be repeated here. Table 7. Optical lens of the seventh embodiment FOV (degrees) 84.91 L1 L2 L3 L4 L5 CTs 0.71 0.23 0.66 0.30 0.57 Ns (at wavelength 587.6 nm) 1.54 1.67 1.54 1.64 1.57 Far3= (1/(Ns-1)) 2 3.37 2.23 3.38 2.45 3.12 R1 |SAGmax| 0.53 0.16 0.13 0.48 0.41 Far1= |SAGmax|/CTs 0.745 0.692 0.198 1.593 0.733 |SPmin| 1.29 3.69 1.77 1.56 1.74 |SPavg| 2.81 7.81 10.42 3.89 5.65 Far2= 1/(|SPavg|×|SPmin|) 0.276 0.035 0.054 0.164 0.102 FAR= LOG(Far1×Far2×Far3) -0.160 -1.271 -1.440 -0.193 -0.632 R2 |SAGmax| 0.09 0.26 0.46 0.34 0.61 Far1= |SAGmax|/CTs 0.128 1.114 0.687 1.130 1.080 |SPmin| 9.52 1.62 0.79 2.16 2.10 |SPavg| 15.87 4.42 3.68 6.06 4.42 Far2= 1/(|SPavg|×|SPmin|) 0.007 0.140 0.346 0.076 0.108 FAR= LOG(Far1×Far2×Far3) -2.546 -0.459 -0.095 -0.674 -0.441 L6 L7 CTs 0.60 0.53 Ns (at wavelength 587.6 nm) 1.54 1.53 Far3= (1/(Ns-1)) 2 3.37 3.50 R1 |SAGmax| 0.33 0.32 Far1= |SAGmax|/CTs 0.555 0.599 |SPmin| 2.17 3.55 |SPavg| 4.33 9.80 Far2= 1/(|SPavg|×|SPmin|) 0.106 0.029 FAR= LOG(Far1×Far2×Far3) -0.702 -1.219 R2 |SAGmax| 0.33 0.29 Far1= |SAGmax|/CTs 0.547 0.542 |SPmin| 1.30 3.51 |SPavg| 4.12 6.29 Far2= 1/(|SPavg|×|SPmin|) 0.187 0.045 FAR= LOG(Far1×Far2×Far3) -0.464 -1.066

<第八實施例><Eighth Embodiment>

第八實施例的光學鏡頭包含七光學鏡片,由物側至像側分別為光學鏡片L1、光學鏡片L2、光學鏡片L3、光學鏡片L4、光學鏡片L5、光學鏡片L6及光學鏡片L7。所述七光學鏡片中至少一光學鏡片包含一抗反射鍍膜,包含抗反射鍍膜的光學鏡片由一塑膠材料所製成,抗反射鍍膜位於光學鏡片的物側表面或像側表面,抗反射鍍膜包含至少一膜層,位於抗反射鍍膜最外側的膜層之材質為陶瓷,抗反射鍍膜包含複數個孔洞,且鄰近抗反射鍍膜最外側的孔洞之尺寸大於鄰近抗反射鍍膜最內側的孔洞之尺寸。其中,位於光學鏡片中心處的抗反射鍍膜的總厚度為Tc,位於光學鏡片周邊處的抗反射鍍膜的總厚度為Tp,光學鏡頭的抗反射鍍膜配置主因子為FAR,其滿足下列條件:|Tc-Tp|/Tc ≤ 5.00%;以及-1.5 ≤ FAR。The optical lens of the eighth embodiment includes seven optical lenses, from the object side to the image side, respectively, an optical lens L1, an optical lens L2, an optical lens L3, an optical lens L4, an optical lens L5, an optical lens L6 and an optical lens L7. At least one optical lens in the seven optical lenses includes an anti-reflection coating, the optical lens including the anti-reflection coating is made of a plastic material, the anti-reflection coating is located on the object side surface or the image side surface of the optical lens, and the anti-reflection coating includes At least one film layer, the material of the film layer located on the outermost side of the anti-reflection coating is ceramic, the anti-reflection coating contains a plurality of holes, and the size of the outermost hole adjacent to the anti-reflection coating is larger than the size of the innermost hole adjacent to the anti-reflective coating. Among them, the total thickness of the anti-reflection coating at the center of the optical lens is Tc, the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp, and the main factor for the configuration of the anti-reflection coating of the optical lens is FAR, which satisfies the following conditions:| Tc-Tp|/Tc ≤ 5.00%; and -1.5 ≤ FAR.

第八實施例的光學鏡頭所包含的各光學鏡片的詳細參數大小已列於下表八,其參數定義皆與第一實施例相同,於此不再贅述。 表八、第八實施例的光學鏡頭 FOV (度) 84.98   L1 L2 L3 L4 L5 CTs 0.83 0.25 0.28 0.60 0.38 Ns (於波長 587.6 nm) 1.54 1.69 1.67 1.54 1.57 Far3= (1/(Ns-1)) 2 3.37 2.12 2.23 3.38 3.12 R1 |SAGmax| 0.64 0.17 0.10 0.05 0.59 Far1= |SAGmax|/CTs 0.777 0.698 0.370 0.091 1.544 |SPmin| 1.15 2.16 2.49 3.52 0.75 |SPavg| 2.43 7.75 11.11 18.87 3.41 Far2= 1/(|SPavg|×|SPmin|) 0.357 0.060 0.036 0.015 0.390 FAR= LOG(Far1×Far2×Far3) -0.030 -1.054 -1.525 -2.333 0.274 R2 |SAGmax| 0.09 0.25 0.08 0.35 0.45 Far1= |SAGmax|/CTs 0.113 1.007 0.274 0.587 1.190 |SPmin| 9.35 1.44 4.50 1.82 2.08 |SPavg| 16.13 4.72 14.08 5.13 5.65 Far2= 1/(|SPavg|×|SPmin|) 0.007 0.147 0.016 0.107 0.085 FAR= LOG(Far1×Far2×Far3) -2.600 -0.502 -2.015 -0.674 -0.501   L6 L7   CTs 0.54 0.50 Ns (於波長 587.6 nm) 1.54 1.53 Far3= (1/(Ns-1)) 2 3.38 3.50 R1 |SAGmax| 0.51 1.10 Far1= |SAGmax|/CTs 0.949 2.205 |SPmin| 1.20 1.43 |SPavg| 3.34 3.45 Far2= 1/(|SPavg|×|SPmin|) 0.250 0.203 FAR= LOG(Far1×Far2×Far3) -0.096 0.195 R2 |SAGmax| 0.70 1.14 Far1= |SAGmax|/CTs 1.309 2.280 |SPmin| 1.45 1.33 |SPavg| 3.38 3.05 Far2= 1/(|SPavg|×|SPmin|) 0.205 0.246 FAR= LOG(Far1×Far2×Far3) -0.043 0.293 The detailed parameters of the optical lenses included in the optical lens of the eighth embodiment are listed in Table 8 below, and the definitions of the parameters are the same as those of the first embodiment, and will not be repeated here. Table 8. Optical lens of the eighth embodiment FOV (degrees) 84.98 L1 L2 L3 L4 L5 CTs 0.83 0.25 0.28 0.60 0.38 Ns (at wavelength 587.6 nm) 1.54 1.69 1.67 1.54 1.57 Far3= (1/(Ns-1)) 2 3.37 2.12 2.23 3.38 3.12 R1 |SAGmax| 0.64 0.17 0.10 0.05 0.59 Far1= |SAGmax|/CTs 0.777 0.698 0.370 0.091 1.544 |SPmin| 1.15 2.16 2.49 3.52 0.75 |SPavg| 2.43 7.75 11.11 18.87 3.41 Far2= 1/(|SPavg|×|SPmin|) 0.357 0.060 0.036 0.015 0.390 FAR= LOG(Far1×Far2×Far3) -0.030 -1.054 -1.525 -2.333 0.274 R2 |SAGmax| 0.09 0.25 0.08 0.35 0.45 Far1= |SAGmax|/CTs 0.113 1.007 0.274 0.587 1.190 |SPmin| 9.35 1.44 4.50 1.82 2.08 |SPavg| 16.13 4.72 14.08 5.13 5.65 Far2= 1/(|SPavg|×|SPmin|) 0.007 0.147 0.016 0.107 0.085 FAR= LOG(Far1×Far2×Far3) -2.600 -0.502 -2.015 -0.674 -0.501 L6 L7 CTs 0.54 0.50 Ns (at wavelength 587.6 nm) 1.54 1.53 Far3= (1/(Ns-1)) 2 3.38 3.50 R1 |SAGmax| 0.51 1.10 Far1= |SAGmax|/CTs 0.949 2.205 |SPmin| 1.20 1.43 |SPavg| 3.34 3.45 Far2= 1/(|SPavg|×|SPmin|) 0.250 0.203 FAR= LOG(Far1×Far2×Far3) -0.096 0.195 R2 |SAGmax| 0.70 1.14 Far1= |SAGmax|/CTs 1.309 2.280 |SPmin| 1.45 1.33 |SPavg| 3.38 3.05 Far2= 1/(|SPavg|×|SPmin|) 0.205 0.246 FAR= LOG(Far1×Far2×Far3) -0.043 0.293

<第九實施例><Ninth Embodiment>

第九實施例的光學鏡頭包含七光學鏡片,由物側至像側分別為光學鏡片L1、光學鏡片L2、光學鏡片L3、光學鏡片L4、光學鏡片L5、光學鏡片L6及光學鏡片L7。所述七光學鏡片中至少一光學鏡片包含一抗反射鍍膜,包含抗反射鍍膜的光學鏡片由一塑膠材料所製成,抗反射鍍膜位於光學鏡片的物側表面或像側表面,抗反射鍍膜包含至少一膜層,位於抗反射鍍膜最外側的膜層之材質為陶瓷,抗反射鍍膜包含複數個孔洞,且鄰近抗反射鍍膜最外側的孔洞之尺寸大於鄰近抗反射鍍膜最內側的孔洞之尺寸。其中,位於光學鏡片中心處的抗反射鍍膜的總厚度為Tc,位於光學鏡片周邊處的抗反射鍍膜的總厚度為Tp,光學鏡頭的抗反射鍍膜配置主因子為FAR,其滿足下列條件:|Tc-Tp|/Tc ≤ 5.00%;以及-1.5 ≤ FAR。The optical lens of the ninth embodiment includes seven optical lenses, from the object side to the image side, respectively, optical lens L1, optical lens L2, optical lens L3, optical lens L4, optical lens L5, optical lens L6 and optical lens L7. At least one optical lens in the seven optical lenses includes an anti-reflection coating, the optical lens including the anti-reflection coating is made of a plastic material, the anti-reflection coating is located on the object side surface or the image side surface of the optical lens, and the anti-reflection coating includes At least one film layer, the material of the film layer located on the outermost side of the anti-reflection coating is ceramic, the anti-reflection coating contains a plurality of holes, and the size of the outermost hole adjacent to the anti-reflection coating is larger than the size of the innermost hole adjacent to the anti-reflective coating. Among them, the total thickness of the anti-reflection coating at the center of the optical lens is Tc, the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp, and the main factor for the configuration of the anti-reflection coating of the optical lens is FAR, which satisfies the following conditions:| Tc-Tp|/Tc ≤ 5.00%; and -1.5 ≤ FAR.

第九實施例的光學鏡頭所包含的各光學鏡片的詳細參數大小已列於下表九,其參數定義皆與第一實施例相同,於此不再贅述。 表九、第九實施例的光學鏡頭 FOV (度) 85.05   L1 L2 L3 L4 L5 CTs 0.85 0.29 0.29 0.49 0.36 Ns (於波長 587.6 nm) 1.54 1.69 1.69 1.54 1.59 Far3= (1/(Ns-1)) 2 3.37 2.12 2.12 3.38 2.90 R1 |SAGmax| 0.61 0.16 0.17 0.13 0.61 Far1= |SAGmax|/CTs 0.719 0.561 0.594 0.273 1.700 |SPmin| 1.33 2.78 1.95 3.88 0.73 |SPavg| 2.73 9.01 7.35 11.49 3.39 Far2= 1/(|SPavg|×|SPmin|) 0.276 0.040 0.070 0.022 0.402 FAR= LOG(Far1×Far2×Far3) -0.176 -1.322 -1.056 -1.685 0.297 R2 |SAGmax| 0.09 0.24 0.19 0.34 0.53 Far1= |SAGmax|/CTs 0.102 0.850 0.656 0.701 1.473 |SPmin| 10.64 1.46 2.21 2.54 1.71 |SPavg| 18.52 5.13 7.30 5.35 4.69 Far2= 1/(|SPavg|×|SPmin|) 0.005 0.133 0.062 0.073 0.124 FAR= LOG(Far1×Far2×Far3) -2.759 -0.618 -1.064 -0.759 -0.274   L6 L7   CTs 0.51 0.54 Ns (於波長 587.6 nm) 1.54 1.53 Far3= (1/(Ns-1)) 2 3.38 3.50 R1 |SAGmax| 0.84 1.40 Far1= |SAGmax|/CTs 1.642 2.581 |SPmin| 0.79 1.45 |SPavg| 2.36 3.16 Far2= 1/(|SPavg|×|SPmin|) 0.539 0.218 FAR= LOG(Far1×Far2×Far3) 0.476 0.294 R2 |SAGmax| 1.07 1.47 Far1= |SAGmax|/CTs 2.078 2.704 |SPmin| 0.67 1.11 |SPavg| 2.50 2.75 Far2= 1/(|SPavg|×|SPmin|) 0.598 0.328 FAR= LOG(Far1×Far2×Far3) 0.623 0.492 The detailed parameters of the optical lenses included in the optical lens of the ninth embodiment are listed in Table 9 below, and the definitions of the parameters are the same as those of the first embodiment, and will not be repeated here. Table 9. Optical lens of the ninth embodiment FOV (degrees) 85.05 L1 L2 L3 L4 L5 CTs 0.85 0.29 0.29 0.49 0.36 Ns (at wavelength 587.6 nm) 1.54 1.69 1.69 1.54 1.59 Far3= (1/(Ns-1)) 2 3.37 2.12 2.12 3.38 2.90 R1 |SAGmax| 0.61 0.16 0.17 0.13 0.61 Far1= |SAGmax|/CTs 0.719 0.561 0.594 0.273 1.700 |SPmin| 1.33 2.78 1.95 3.88 0.73 |SPavg| 2.73 9.01 7.35 11.49 3.39 Far2= 1/(|SPavg|×|SPmin|) 0.276 0.040 0.070 0.022 0.402 FAR= LOG(Far1×Far2×Far3) -0.176 -1.322 -1.056 -1.685 0.297 R2 |SAGmax| 0.09 0.24 0.19 0.34 0.53 Far1= |SAGmax|/CTs 0.102 0.850 0.656 0.701 1.473 |SPmin| 10.64 1.46 2.21 2.54 1.71 |SPavg| 18.52 5.13 7.30 5.35 4.69 Far2= 1/(|SPavg|×|SPmin|) 0.005 0.133 0.062 0.073 0.124 FAR= LOG(Far1×Far2×Far3) -2.759 -0.618 -1.064 -0.759 -0.274 L6 L7 CTs 0.51 0.54 Ns (at wavelength 587.6 nm) 1.54 1.53 Far3= (1/(Ns-1)) 2 3.38 3.50 R1 |SAGmax| 0.84 1.40 Far1= |SAGmax|/CTs 1.642 2.581 |SPmin| 0.79 1.45 |SPavg| 2.36 3.16 Far2= 1/(|SPavg|×|SPmin|) 0.539 0.218 FAR= LOG(Far1×Far2×Far3) 0.476 0.294 R2 |SAGmax| 1.07 1.47 Far1= |SAGmax|/CTs 2.078 2.704 |SPmin| 0.67 1.11 |SPavg| 2.50 2.75 Far2= 1/(|SPavg|×|SPmin|) 0.598 0.328 FAR= LOG(Far1×Far2×Far3) 0.623 0.492

<第十實施例><Tenth Embodiment>

第十實施例的光學鏡頭包含八光學鏡片,由物側至像側分別為光學鏡片L1、光學鏡片L2、光學鏡片L3、光學鏡片L4、光學鏡片L5、光學鏡片L6、光學鏡片L7及光學鏡片L8。所述八光學鏡片中至少一光學鏡片包含一抗反射鍍膜,包含抗反射鍍膜的光學鏡片由一塑膠材料所製成,抗反射鍍膜位於光學鏡片的物側表面或像側表面,抗反射鍍膜包含至少一膜層,位於抗反射鍍膜最外側的膜層之材質為陶瓷,抗反射鍍膜包含複數個孔洞,且鄰近抗反射鍍膜最外側的孔洞之尺寸大於鄰近抗反射鍍膜最內側的孔洞之尺寸。其中,位於光學鏡片中心處的抗反射鍍膜的總厚度為Tc,位於光學鏡片周邊處的抗反射鍍膜的總厚度為Tp,光學鏡頭的抗反射鍍膜配置主因子為FAR,其滿足下列條件:|Tc-Tp|/Tc ≤ 5.00%;以及-1.5 ≤ FAR。The optical lens of the tenth embodiment includes eight optical lenses, which are respectively optical lens L1, optical lens L2, optical lens L3, optical lens L4, optical lens L5, optical lens L6, optical lens L7 and optical lens from the object side to the image side. L8. At least one of the eight optical lenses includes an anti-reflection coating, the optical lens including the anti-reflection coating is made of a plastic material, the anti-reflection coating is located on the object side surface or the image side surface of the optical lens, and the anti-reflection coating includes At least one film layer, the material of the film layer located on the outermost side of the anti-reflection coating is ceramic, the anti-reflection coating contains a plurality of holes, and the size of the outermost hole adjacent to the anti-reflection coating is larger than the size of the innermost hole adjacent to the anti-reflective coating. Among them, the total thickness of the anti-reflection coating at the center of the optical lens is Tc, the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp, and the main factor for the configuration of the anti-reflection coating of the optical lens is FAR, which satisfies the following conditions:| Tc-Tp|/Tc ≤ 5.00%; and -1.5 ≤ FAR.

第十實施例的光學鏡頭所包含的各光學鏡片的詳細參數大小已列於下表十,其參數定義皆與第一實施例相同,於此不再贅述。 表十、第十實施例的光學鏡頭 FOV (度) 84.69   L1 L2 L3 L4 L5 CTs 0.95 0.30 0.34 0.55 0.51 Ns (於波長 587.6 nm) 1.54 1.69 1.69 1.54 1.54 Far3= (1/(Ns-1)) 2 3.37 2.12 2.12 3.38 3.38 R1 |SAGmax| 0.71 0.21 0.10 0.07 0.31 Far1= |SAGmax|/CTs 0.747 0.692 0.304 0.125 0.612 |SPmin| 1.32 2.40 8.00 5.75 3.00 |SPavg| 2.74 8.00 15.38 20.00 8.06 Far2= 1/(|SPavg|×|SPmin|) 0.276 0.052 0.008 0.009 0.041 FAR= LOG(Far1×Far2×Far3) -0.159 -1.116 -2.280 -2.436 -1.069 R2 |SAGmax| 0.14 0.31 0.13 0.24 0.41 Far1= |SAGmax|/CTs 0.144 1.036 0.385 0.432 0.812 |SPmin| 8.62 1.56 3.27 2.66 2.43 |SPavg| 13.51 4.81 11.63 8.85 6.94 Far2= 1/(|SPavg|×|SPmin|) 0.009 0.134 0.026 0.042 0.059 FAR= LOG(Far1×Far2×Far3) -2.380 -0.532 -1.667 -1.207 -0.788   L6 L7 L8   CTs 0.43 0.71 0.63 Ns (於波長 587.6 nm) 1.57 1.54 1.53 Far3= (1/(Ns-1)) 2 3.12 3.38 3.51 R1 |SAGmax| 0.82 0.69 1.35 Far1= |SAGmax|/CTs 1.917 0.971 2.149 |SPmin| 0.71 1.38 1.93 |SPavg| 2.77 3.19 3.94 Far2= 1/(|SPavg|×|SPmin|) 0.508 0.228 0.132 FAR= LOG(Far1×Far2×Far3) 0.482 -0.127 -0.003 R2 |SAGmax| 0.71 0.92 1.31 Far1= |SAGmax|/CTs 1.647 1.294 2.085 |SPmin| 1.27 1.27 1.79 |SPavg| 3.46 3.56 3.75 Far2= 1/(|SPavg|×|SPmin|) 0.228 0.221 0.149 FAR= LOG(Far1×Far2×Far3) 0.069 -0.014 0.038 The detailed parameters of the optical lenses included in the optical lens of the tenth embodiment are listed in Table 10 below, and the definitions of the parameters are the same as those of the first embodiment, and will not be repeated here. Table 10. Optical lens of the tenth embodiment FOV (degrees) 84.69 L1 L2 L3 L4 L5 CTs 0.95 0.30 0.34 0.55 0.51 Ns (at wavelength 587.6 nm) 1.54 1.69 1.69 1.54 1.54 Far3= (1/(Ns-1)) 2 3.37 2.12 2.12 3.38 3.38 R1 |SAGmax| 0.71 0.21 0.10 0.07 0.31 Far1= |SAGmax|/CTs 0.747 0.692 0.304 0.125 0.612 |SPmin| 1.32 2.40 8.00 5.75 3.00 |SPavg| 2.74 8.00 15.38 20.00 8.06 Far2= 1/(|SPavg|×|SPmin|) 0.276 0.052 0.008 0.009 0.041 FAR= LOG(Far1×Far2×Far3) -0.159 -1.116 -2.280 -2.436 -1.069 R2 |SAGmax| 0.14 0.31 0.13 0.24 0.41 Far1= |SAGmax|/CTs 0.144 1.036 0.385 0.432 0.812 |SPmin| 8.62 1.56 3.27 2.66 2.43 |SPavg| 13.51 4.81 11.63 8.85 6.94 Far2= 1/(|SPavg|×|SPmin|) 0.009 0.134 0.026 0.042 0.059 FAR= LOG(Far1×Far2×Far3) -2.380 -0.532 -1.667 -1.207 -0.788 L6 L7 L8 CTs 0.43 0.71 0.63 Ns (at wavelength 587.6 nm) 1.57 1.54 1.53 Far3= (1/(Ns-1)) 2 3.12 3.38 3.51 R1 |SAGmax| 0.82 0.69 1.35 Far1= |SAGmax|/CTs 1.917 0.971 2.149 |SPmin| 0.71 1.38 1.93 |SPavg| 2.77 3.19 3.94 Far2= 1/(|SPavg|×|SPmin|) 0.508 0.228 0.132 FAR= LOG(Far1×Far2×Far3) 0.482 -0.127 -0.003 R2 |SAGmax| 0.71 0.92 1.31 Far1= |SAGmax|/CTs 1.647 1.294 2.085 |SPmin| 1.27 1.27 1.79 |SPavg| 3.46 3.56 3.75 Far2= 1/(|SPavg|×|SPmin|) 0.228 0.221 0.149 FAR= LOG(Far1×Far2×Far3) 0.069 -0.014 0.038

<第十一實施例><Eleventh Embodiment>

第十一實施例的光學鏡頭包含八光學鏡片,由物側至像側分別為光學鏡片L1、光學鏡片L2、光學鏡片L3、光學鏡片L4、光學鏡片L5、光學鏡片L6、光學鏡片L7及光學鏡片L8。所述八光學鏡片中至少一光學鏡片包含一抗反射鍍膜,包含抗反射鍍膜的光學鏡片由一塑膠材料所製成,抗反射鍍膜位於光學鏡片的物側表面或像側表面,抗反射鍍膜包含至少一膜層,位於抗反射鍍膜最外側的膜層之材質為陶瓷,抗反射鍍膜包含複數個孔洞,且鄰近抗反射鍍膜最外側的孔洞之尺寸大於鄰近抗反射鍍膜最內側的孔洞之尺寸。其中,位於光學鏡片中心處的抗反射鍍膜的總厚度為Tc,位於光學鏡片周邊處的抗反射鍍膜的總厚度為Tp,光學鏡頭的抗反射鍍膜配置主因子為FAR,其滿足下列條件:|Tc-Tp|/Tc ≤ 5.00%;以及-1.5 ≤ FAR。The optical lens of the eleventh embodiment includes eight optical lenses, from the object side to the image side, respectively, an optical lens L1, an optical lens L2, an optical lens L3, an optical lens L4, an optical lens L5, an optical lens L6, an optical lens L7 and an optical lens. Lens L8. At least one of the eight optical lenses includes an anti-reflection coating, the optical lens including the anti-reflection coating is made of a plastic material, the anti-reflection coating is located on the object side surface or the image side surface of the optical lens, and the anti-reflection coating includes At least one film layer, the material of the film layer located on the outermost side of the anti-reflection coating is ceramic, the anti-reflection coating contains a plurality of holes, and the size of the outermost hole adjacent to the anti-reflection coating is larger than the size of the innermost hole adjacent to the anti-reflective coating. Among them, the total thickness of the anti-reflection coating at the center of the optical lens is Tc, the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp, and the main factor for the configuration of the anti-reflection coating of the optical lens is FAR, which satisfies the following conditions:| Tc-Tp|/Tc ≤ 5.00%; and -1.5 ≤ FAR.

第十一實施例的光學鏡頭所包含的各光學鏡片的詳細參數大小已列於下表十一,其參數定義皆與第一實施例相同,於此不再贅述。 表十一、第十一實施例的光學鏡頭 FOV (度) 85.11   L1 L2 L3 L4 L5 CTs 1.15 0.33 0.34 0.61 0.39 Ns (於波長 587.6 nm) 1.54 1.69 1.69 1.54 1.67 Far3= (1/(Ns-1)) 2 3.37 2.12 2.12 3.38 2.23 R1 |SAGmax| 0.97 0.24 0.09 0.14 0.36 Far1= |SAGmax|/CTs 0.840 0.741 0.271 0.230 0.906 |SPmin| 1.01 2.06 6.02 4.29 2.34 |SPavg| 2.24 8.20 19.23 12.82 6.17 Far2= 1/(|SPavg|×|SPmin|) 0.445 0.059 0.009 0.018 0.069 FAR= LOG(Far1×Far2×Far3) 0.100 -1.030 -2.304 -1.850 -0.853 R2 |SAGmax| 0.20 0.34 0.09 0.40 0.33 Far1= |SAGmax|/CTs 0.172 1.037 0.277 0.655 0.843 |SPmin| 5.29 1.54 3.77 1.29 2.61 |SPavg| 10.31 5.26 17.86 5.15 7.30 Far2= 1/(|SPavg|×|SPmin|) 0.018 0.124 0.015 0.150 0.052 FAR= LOG(Far1×Far2×Far3) -1.975 -0.565 -2.058 -0.478 -1.005   L6 L7 L8   CTs 0.43 0.69 0.86 Ns (於波長 587.6 nm) 1.59 1.57 1.53 Far3= (1/(Ns-1)) 2 2.90 3.12 3.50 R1 |SAGmax| 0.85 1.32 1.87 Far1= |SAGmax|/CTs 2.002 1.910 2.164 |SPmin| 0.65 0.92 1.50 |SPavg| 2.92 2.60 3.10 Far2= 1/(|SPavg|×|SPmin|) 0.530 0.417 0.216 FAR= LOG(Far1×Far2×Far3) 0.488 0.395 0.214 R2 |SAGmax| 0.87 1.47 2.03 Far1= |SAGmax|/CTs 2.034 2.124 2.351 |SPmin| 1.32 1.32 1.17 |SPavg| 3.60 2.82 3.00 Far2= 1/(|SPavg|×|SPmin|) 0.210 0.267 0.284 FAR= LOG(Far1×Far2×Far3) 0.093 0.248 0.369 The detailed parameters of the optical lenses included in the optical lens of the eleventh embodiment are listed in Table 11 below, and the definitions of the parameters are the same as those of the first embodiment, and will not be repeated here. Table 11. Optical lens of the eleventh embodiment FOV (degrees) 85.11 L1 L2 L3 L4 L5 CTs 1.15 0.33 0.34 0.61 0.39 Ns (at wavelength 587.6 nm) 1.54 1.69 1.69 1.54 1.67 Far3= (1/(Ns-1)) 2 3.37 2.12 2.12 3.38 2.23 R1 |SAGmax| 0.97 0.24 0.09 0.14 0.36 Far1= |SAGmax|/CTs 0.840 0.741 0.271 0.230 0.906 |SPmin| 1.01 2.06 6.02 4.29 2.34 |SPavg| 2.24 8.20 19.23 12.82 6.17 Far2= 1/(|SPavg|×|SPmin|) 0.445 0.059 0.009 0.018 0.069 FAR= LOG(Far1×Far2×Far3) 0.100 -1.030 -2.304 -1.850 -0.853 R2 |SAGmax| 0.20 0.34 0.09 0.40 0.33 Far1= |SAGmax|/CTs 0.172 1.037 0.277 0.655 0.843 |SPmin| 5.29 1.54 3.77 1.29 2.61 |SPavg| 10.31 5.26 17.86 5.15 7.30 Far2= 1/(|SPavg|×|SPmin|) 0.018 0.124 0.015 0.150 0.052 FAR= LOG(Far1×Far2×Far3) -1.975 -0.565 -2.058 -0.478 -1.005 L6 L7 L8 CTs 0.43 0.69 0.86 Ns (at wavelength 587.6 nm) 1.59 1.57 1.53 Far3= (1/(Ns-1)) 2 2.90 3.12 3.50 R1 |SAGmax| 0.85 1.32 1.87 Far1= |SAGmax|/CTs 2.002 1.910 2.164 |SPmin| 0.65 0.92 1.50 |SPavg| 2.92 2.60 3.10 Far2= 1/(|SPavg|×|SPmin|) 0.530 0.417 0.216 FAR= LOG(Far1×Far2×Far3) 0.488 0.395 0.214 R2 |SAGmax| 0.87 1.47 2.03 Far1= |SAGmax|/CTs 2.034 2.124 2.351 |SPmin| 1.32 1.32 1.17 |SPavg| 3.60 2.82 3.00 Far2= 1/(|SPavg|×|SPmin|) 0.210 0.267 0.284 FAR= LOG(Far1×Far2×Far3) 0.093 0.248 0.369

<第十二實施例><Twelfth Embodiment>

第十二實施例的光學鏡頭包含九光學鏡片,由物側至像側分別為光學鏡片L1、光學鏡片L2、光學鏡片L3、光學鏡片L4、光學鏡片L5、光學鏡片L6、光學鏡片L7、光學鏡片L8及光學鏡片L9。所述九光學鏡片中至少一光學鏡片包含一抗反射鍍膜,包含抗反射鍍膜的光學鏡片由一塑膠材料所製成,抗反射鍍膜位於光學鏡片的物側表面或像側表面,抗反射鍍膜包含至少一膜層,位於抗反射鍍膜最外側的膜層之材質為陶瓷,抗反射鍍膜包含複數個孔洞,且鄰近抗反射鍍膜最外側的孔洞之尺寸大於鄰近抗反射鍍膜最內側的孔洞之尺寸。其中,位於光學鏡片中心處的抗反射鍍膜的總厚度為Tc,位於光學鏡片周邊處的抗反射鍍膜的總厚度為Tp,光學鏡頭的抗反射鍍膜配置主因子為FAR,其滿足下列條件:|Tc-Tp|/Tc ≤ 5.00%;以及-1.5 ≤ FAR。The optical lens of the twelfth embodiment includes nine optical lenses, from the object side to the image side, respectively, optical lens L1, optical lens L2, optical lens L3, optical lens L4, optical lens L5, optical lens L6, optical lens L7, optical lens Lens L8 and optical lens L9. At least one of the nine optical lenses includes an anti-reflection coating, the optical lens including the anti-reflection coating is made of a plastic material, the anti-reflection coating is located on the object side surface or the image side surface of the optical lens, and the anti-reflection coating includes At least one film layer, the material of the film layer located on the outermost side of the anti-reflection coating is ceramic, the anti-reflection coating contains a plurality of holes, and the size of the outermost hole adjacent to the anti-reflection coating is larger than the size of the innermost hole adjacent to the anti-reflective coating. Among them, the total thickness of the anti-reflection coating at the center of the optical lens is Tc, the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp, and the main factor for the configuration of the anti-reflection coating of the optical lens is FAR, which satisfies the following conditions:| Tc-Tp|/Tc ≤ 5.00%; and -1.5 ≤ FAR.

第十二實施例的光學鏡頭所包含的各光學鏡片的詳細參數大小已列於下表十二,其參數定義皆與第一實施例相同,於此不再贅述。 表十二、第十二實施例的光學鏡頭 FOV (度) 86.76   L1 L2 L3 L4 L5 CTs 1.14 0.31 0.32 0.50 0.36 Ns (於波長 587.6 nm) 1.54 1.69 1.69 1.54 1.66 Far3= (1/(Ns-1)) 2 3.37 2.12 2.12 3.38 2.30 R1 |SAGmax| 0.96 0.24 0.11 0.12 0.28 Far1= |SAGmax|/CTs 0.837 0.780 0.336 0.247 0.788 |SPmin| 1.06 1.72 5.52 5.29 2.98 |SPavg| 2.26 7.69 15.38 13.70 7.04 Far2= 1/(|SPavg|×|SPmin|) 0.417 0.076 0.012 0.014 0.048 FAR= LOG(Far1×Far2×Far3) 0.070 -0.902 -2.076 -1.938 -1.064 R2 |SAGmax| 0.18 0.33 0.13 0.35 0.32 Far1= |SAGmax|/CTs 0.160 1.075 0.415 0.702 0.897 |SPmin| 6.02 1.32 2.17 1.09 2.82 |SPavg| 11.36 5.00 10.75 5.88 7.04 Far2= 1/(|SPavg|×|SPmin|) 0.015 0.152 0.043 0.156 0.050 FAR= LOG(Far1×Far2×Far3) -2.103 -0.460 -1.422 -0.431 -0.985   L6 L7 L8 L9   CTs 0.43 0.52 0.64 0.71 Ns (於波長 587.6 nm) 1.64 1.59 1.54 1.53 Far3= (1/(Ns-1)) 2 2.45 2.90 3.38 3.50 R1 |SAGmax| 0.94 1.56 1.02 1.51 Far1= |SAGmax|/CTs 2.170 2.992 1.594 2.120 |SPmin| 0.43 0.88 2.00 2.19 |SPavg| 2.53 2.29 4.50 3.97 Far2= 1/(|SPavg|×|SPmin|) 0.914 0.498 0.111 0.115 FAR= LOG(Far1×Far2×Far3) 0.687 0.635 -0.223 -0.068 R2 |SAGmax| 0.91 1.75 1.23 1.63 Far1= |SAGmax|/CTs 2.088 3.350 1.924 2.291 |SPmin| 1.23 0.71 1.72 1.72 |SPavg| 3.34 2.20 4.18 3.75 Far2= 1/(|SPavg|×|SPmin|) 0.242 0.638 0.139 0.156 FAR= LOG(Far1×Far2×Far3) 0.094 0.793 -0.044 0.097 The detailed parameters of the optical lenses included in the optical lens of the twelfth embodiment are listed in Table 12 below, and the definitions of the parameters are the same as those of the first embodiment, and will not be repeated here. Table 12. Optical lenses of the twelfth embodiment FOV (degrees) 86.76 L1 L2 L3 L4 L5 CTs 1.14 0.31 0.32 0.50 0.36 Ns (at wavelength 587.6 nm) 1.54 1.69 1.69 1.54 1.66 Far3= (1/(Ns-1)) 2 3.37 2.12 2.12 3.38 2.30 R1 |SAGmax| 0.96 0.24 0.11 0.12 0.28 Far1= |SAGmax|/CTs 0.837 0.780 0.336 0.247 0.788 |SPmin| 1.06 1.72 5.52 5.29 2.98 |SPavg| 2.26 7.69 15.38 13.70 7.04 Far2= 1/(|SPavg|×|SPmin|) 0.417 0.076 0.012 0.014 0.048 FAR= LOG(Far1×Far2×Far3) 0.070 -0.902 -2.076 -1.938 -1.064 R2 |SAGmax| 0.18 0.33 0.13 0.35 0.32 Far1= |SAGmax|/CTs 0.160 1.075 0.415 0.702 0.897 |SPmin| 6.02 1.32 2.17 1.09 2.82 |SPavg| 11.36 5.00 10.75 5.88 7.04 Far2= 1/(|SPavg|×|SPmin|) 0.015 0.152 0.043 0.156 0.050 FAR= LOG(Far1×Far2×Far3) -2.103 -0.460 -1.422 -0.431 -0.985 L6 L7 L8 L9 CTs 0.43 0.52 0.64 0.71 Ns (at wavelength 587.6 nm) 1.64 1.59 1.54 1.53 Far3= (1/(Ns-1)) 2 2.45 2.90 3.38 3.50 R1 |SAGmax| 0.94 1.56 1.02 1.51 Far1= |SAGmax|/CTs 2.170 2.992 1.594 2.120 |SPmin| 0.43 0.88 2.00 2.19 |SPavg| 2.53 2.29 4.50 3.97 Far2= 1/(|SPavg|×|SPmin|) 0.914 0.498 0.111 0.115 FAR= LOG(Far1×Far2×Far3) 0.687 0.635 -0.223 -0.068 R2 |SAGmax| 0.91 1.75 1.23 1.63 Far1= |SAGmax|/CTs 2.088 3.350 1.924 2.291 |SPmin| 1.23 0.71 1.72 1.72 |SPavg| 3.34 2.20 4.18 3.75 Far2= 1/(|SPavg|×|SPmin|) 0.242 0.638 0.139 0.156 FAR= LOG(Far1×Far2×Far3) 0.094 0.793 -0.044 0.097

<波長與反射率量測結果><Measurement results of wavelength and reflectance>

下表十三是第一比較例及第一實施例之反射率量測結果。 表十三、第一比較例及第一實施例之反射率量測結果   第一比較例 第一實施例 光學鏡片數量 7 4 包含抗反射鍍膜之光學鏡片 L6 L4 包含抗反射鍍膜之光學鏡片表面 像側表面 物側表面及 像側表面 中心 周邊 中心 周邊 谷點 T1 Wtc Wtp Wtc Wtp 波長 (nm) 421 - 418 430 |Wtc-Wtp| |Wtc-Wtp| - 12 反射率 (%) Rtc Rtp Rtc Rtp 0.1693 - 0.2992 0.2457 T2 Wtc Wtp Wtc Wtp 波長 (nm) 518 - 508 515 |Wtc-Wtp| |Wtc-Wtp| - 7 反射率 (%) Rtc Rtp Rtc Rtp 0.2943 - 0.0201 0.0385 T3 Wtc Wtp Wtc Wtp 波長 (nm) 650 508 665 686 |Wtc-Wtp| |Wtc-Wtp| 142 21 反射率 (%) Rtc Rtp Rtc Rtp 0.1263 0.0843 0.0996 0.1651 峰點 C1 Wcc Wcp Wcc Wcp 波長 (nm) 462 - 449 457 |Wcc-Wcp| |Wcc-Wcp| - 8 反射率 (%) Rcc Rcp Rcc Rcp 0.4700 - 0.6566 0.4906 C2 Wcc Wcp Wcc Wcp 波長 (nm) 557 - 586 602 |Wcc-Wcp| |Wcc-Wcp| - 16 反射率 (%) Rcc Rcp Rcc Rcp 0.3309 - 0.3734 0.5244 Table 13 below is the reflectivity measurement results of the first comparative example and the first embodiment. Table 13. Reflectance measurement results of the first comparative example and the first example The first comparative example first embodiment Number of optical lenses 7 4 Optical Lenses with Anti-Reflection Coatings L6 L4 Optical lens surface with anti-reflection coating like side surface Object side surface and image side surface center surrounding center surrounding Valley Point T1 Wtc Wtp Wtc Wtp Wavelength (nm) 421 - 418 430 |Wtc-Wtp| |Wtc-Wtp| - 12 Reflectivity(%) Rtc Rtp Rtc Rtp 0.1693 - 0.2992 0.2457 T2 Wtc Wtp Wtc Wtp Wavelength (nm) 518 - 508 515 |Wtc-Wtp| |Wtc-Wtp| - 7 Reflectivity(%) Rtc Rtp Rtc Rtp 0.2943 - 0.0201 0.0385 T3 Wtc Wtp Wtc Wtp Wavelength (nm) 650 508 665 686 |Wtc-Wtp| |Wtc-Wtp| 142 twenty one Reflectivity(%) Rtc Rtp Rtc Rtp 0.1263 0.0843 0.0996 0.1651 peak point C1 wcc wcp wcc wcp Wavelength (nm) 462 - 449 457 |Wcc-Wcp| |Wcc-Wcp| - 8 Reflectivity(%) Rcc Rcp Rcc Rcp 0.4700 - 0.6566 0.4906 C2 wcc wcp wcc wcp Wavelength (nm) 557 - 586 602 |Wcc-Wcp| |Wcc-Wcp| - 16 Reflectivity(%) Rcc Rcp Rcc Rcp 0.3309 - 0.3734 0.5244

下表十四是第二實施例及第三實施例之反射率量測結果。 表十四、第二實施例及第三實施例之反射率量測結果   第二實施例 第三實施例 光學鏡片數量 5 5 包含抗反射鍍膜之光學鏡片 L1 L4 包含抗反射鍍膜之光學鏡片表面 物側表面及 像側表面 物側表面及 像側表面 中心 周邊 中心 周邊 谷點 T1 Wtc Wtp Wtc Wtp 波長 (nm) 421 424 424 433 |Wtc-Wtp| |Wtc-Wtp| 3 9 反射率 (%) Rtc Rtp Rtc Rtp 0.2476 0.2290 0.1846 0.1720 T2 Wtc Wtp Wtc Wtp 波長 (nm) 502 508 506 508 |Wtc-Wtp| |Wtc-Wtp| 6 2 反射率 (%) Rtc Rtp Rtc Rtp 0.0174 0.0201 0.0138 0.0241 T3 Wtc Wtp Wtc Wtp 波長 (nm) 658 667 645 652 |Wtc-Wtp| |Wtc-Wtp| 9 7 反射率 (%) Rtc Rtp Rtc Rtp 0.1193 0.1372 0.1616 0.2166 峰點 C1 Wcc Wcp Wcc Wcp 波長 (nm) 449 453 449 458 |Wcc-Wcp| |Wcc-Wcp| 4 9 反射率 (%) Rcc Rcp Rcc Rcp 0.4738 0.4434 0.2909 0.2669 C2 Wcc Wcp Wcc Wcp 波長 (nm) 581 582 581 587 |Wcc-Wcp| |Wcc-Wcp| 1 6 反射率 (%) Rcc Rcp Rcc Rcp 0.3815 0.4242 0.2728 0.3223 Table 14 below shows the measurement results of reflectivity of the second embodiment and the third embodiment. Table 14. Reflectance measurement results of the second embodiment and the third embodiment Second Embodiment Third Embodiment Number of optical lenses 5 5 Optical Lenses with Anti-Reflection Coatings L1 L4 Optical lens surface with anti-reflection coating Object side surface and image side surface Object side surface and image side surface center surrounding center surrounding Valley Point T1 Wtc Wtp Wtc Wtp Wavelength (nm) 421 424 424 433 |Wtc-Wtp| |Wtc-Wtp| 3 9 Reflectivity(%) Rtc Rtp Rtc Rtp 0.2476 0.2290 0.1846 0.1720 T2 Wtc Wtp Wtc Wtp Wavelength (nm) 502 508 506 508 |Wtc-Wtp| |Wtc-Wtp| 6 2 Reflectivity(%) Rtc Rtp Rtc Rtp 0.0174 0.0201 0.0138 0.0241 T3 Wtc Wtp Wtc Wtp Wavelength (nm) 658 667 645 652 |Wtc-Wtp| |Wtc-Wtp| 9 7 Reflectivity(%) Rtc Rtp Rtc Rtp 0.1193 0.1372 0.1616 0.2166 peak point C1 wcc wcp wcc wcp Wavelength (nm) 449 453 449 458 |Wcc-Wcp| |Wcc-Wcp| 4 9 Reflectivity(%) Rcc Rcp Rcc Rcp 0.4738 0.4434 0.2909 0.2669 C2 wcc wcp wcc wcp Wavelength (nm) 581 582 581 587 |Wcc-Wcp| |Wcc-Wcp| 1 6 Reflectivity(%) Rcc Rcp Rcc Rcp 0.3815 0.4242 0.2728 0.3223

下表十五是第六實施例及第七實施例之反射率量測結果。 表十五、第六實施例及第七實施例之反射率量測結果   第六實施例 第七實施例 光學鏡片數量 7 7 包含抗反射鍍膜之光學鏡片 L6 L7 包含抗反射鍍膜之光學鏡片表面 像側表面 物側表面及 像側表面 中心 周邊 中心 周邊 谷點 T1 Wtc Wtp Wtc Wtp 波長 (nm) 421 420 613 604 |Wtc-Wtp| |Wtc-Wtp| 1 9 反射率 (%) Rtc Rtp Rtc Rtp 0.0232 0.0345 0.1770 0.1735 T2 Wtc Wtp Wtc Wtp 波長 (nm) 508 504 - - |Wtc-Wtp| |Wtc-Wtp| 4 - 反射率 (%) Rtc Rtp Rtc Rtp 0.0602 0.0630 - - T3 Wtc Wtp Wtc Wtp 波長 (nm) 647 650 - - |Wtc-Wtp| |Wtc-Wtp| 3 - 反射率 (%) Rtc Rtp Rtc Rtp 0.0441 0.0573 - - 峰點 C1 Wcc Wcp Wcc Wcp 波長 (nm) 450 454 - - |Wcc-Wcp| |Wcc-Wcp| 4 - 反射率 (%) Rcc Rcp Rcc Rcp 0.3803 0.3615 - - C2 Wcc Wcp Wcc Wcp 波長 (nm) 573 573 - - |Wcc-Wcp| |Wcc-Wcp| 0 - 反射率 (%) Rcc Rcp Rcc Rcp 0.2479 0.2816 - - Table 15 below is the reflectivity measurement results of the sixth embodiment and the seventh embodiment. Table 15. Reflectance measurement results of the sixth embodiment and the seventh embodiment Sixth Embodiment Seventh Embodiment Number of optical lenses 7 7 Optical Lenses with Anti-Reflection Coatings L6 L7 Optical lens surface with anti-reflection coating like side surface Object side surface and image side surface center surrounding center surrounding Valley Point T1 Wtc Wtp Wtc Wtp Wavelength (nm) 421 420 613 604 |Wtc-Wtp| |Wtc-Wtp| 1 9 Reflectivity(%) Rtc Rtp Rtc Rtp 0.0232 0.0345 0.1770 0.1735 T2 Wtc Wtp Wtc Wtp Wavelength (nm) 508 504 - - |Wtc-Wtp| |Wtc-Wtp| 4 - Reflectivity(%) Rtc Rtp Rtc Rtp 0.0602 0.0630 - - T3 Wtc Wtp Wtc Wtp Wavelength (nm) 647 650 - - |Wtc-Wtp| |Wtc-Wtp| 3 - Reflectivity(%) Rtc Rtp Rtc Rtp 0.0441 0.0573 - - peak point C1 wcc wcp wcc wcp Wavelength (nm) 450 454 - - |Wcc-Wcp| |Wcc-Wcp| 4 - Reflectivity(%) Rcc Rcp Rcc Rcp 0.3803 0.3615 - - C2 wcc wcp wcc wcp Wavelength (nm) 573 573 - - |Wcc-Wcp| |Wcc-Wcp| 0 - Reflectivity(%) Rcc Rcp Rcc Rcp 0.2479 0.2816 - -

請一併參照第1圖至第6圖,第6圖為第一比較例的光學鏡頭的反射率與波長的關係圖。本揭示內容的光學鏡頭在波長400 nm – 700 nm範圍間具有一定數量的反射率波谷與反射率波峰,反射率的谷點(Trough)順序定義是以光學鏡片中心處為準,由短波長到長波長依序為T1、T2、T3…等,依此方式遞增,反射率的峰點(Crest)順序定義是以光學鏡片中心處為準,由短波長到長波長依序為C1、C2…等,依此方式遞增。Please refer to FIG. 1 to FIG. 6 together. FIG. 6 is a graph showing the relationship between the reflectance and the wavelength of the optical lens of the first comparative example. The optical lens of the present disclosure has a certain number of reflectivity troughs and reflectivity peaks in the wavelength range of 400 nm - 700 nm. The order of reflectivity trough points (Trough) is defined as the center of the optical lens, from short wavelength to The long wavelengths are sequentially T1, T2, T3, etc., and increase in this way. The order of the reflectivity peaks (Crest) is defined by the center of the optical lens. From short wavelengths to long wavelengths, C1, C2... and so on, increasing in this way.

在上述基礎下,可以比較光學鏡片中心處與周邊處(近最大有效徑處)的反射率差異。在第6圖中可以得知,第一比較例的中心處與周邊處的反射率差異過大,不具備明顯且等量的反射率波峰及反射率波谷,因此無法比較,顯示第一比較例的鍍膜技術不足與膜厚控制不佳。On the basis of the above, the reflectance difference between the center and the periphery (near the maximum effective diameter) of the optical lens can be compared. As can be seen in Figure 6, the reflectivity difference between the center and the periphery of the first comparative example is too large, and there are no obvious and equal reflectivity peaks and reflectivity valleys, so they cannot be compared. Insufficient coating technology and poor film thickness control.

本發明所述反射率為光學元件表面的量測數據,穿透率為整體光學鏡頭組合後的量測數據。In the present invention, the reflectivity is the measurement data of the surface of the optical element, and the transmittance is the measurement data after the combination of the overall optical lens.

<抗反射鍍膜配置與影像品質量測結果><Anti-reflection coating configuration and image quality test results>

下表十六、表十七及表十八分別是第一比較例、第二實施例與第七實施例的抗反射鍍膜配置方式。 表十六、第一比較例的抗反射鍍膜配置方式 物理氣相沉積 (PVD) 膜層順序 材質 折射率 物理厚度(nm) 基材 塑膠 1.55 - 1 TiO 2 2.35 14 2 SiO 2 1.46 33 3 TiO 2 2.35 56 4 SiO 2 1.46 9 5 TiO 2 2.35 42 6 SiO 2 1.46 92 總膜厚 (tTK) 246 表十七、第二實施例的抗反射鍍膜配置方式 原子層沉積法 (ALD) 膜層順序 材質 折射率 物理厚度(nm) 基材 塑膠 1.53 - 1 TiO 2 2.51 14 2 SiO 2 1.46 29 3 TiO 2 2.51 67 4 SiO 2 1.46 6 5 TiO 2 2.51 31 6 SiO 2 1.46 90 總膜厚 (tTK) 238 表十八、第七實施例的抗反射鍍膜配置方式 原子層沉積法 (ALD) 膜層順序 材質 折射率 物理厚度(nm) 基材 塑膠 1.49 - 1 Al 2O 3 1.21 246 總膜厚 (tTK) 246 Table 16, Table 17, and Table 18 below show the configurations of the anti-reflection coatings of the first comparative example, the second example, and the seventh example, respectively. Table 16. The configuration of the anti-reflection coating of the first comparative example Physical Vapor Deposition (PVD) Layer order material refractive index Physical Thickness (nm) substrate plastic 1.55 - 1 TiO 2 2.35 14 2 SiO2 1.46 33 3 TiO 2 2.35 56 4 SiO2 1.46 9 5 TiO 2 2.35 42 6 SiO2 1.46 92 Total Film Thickness (tTK) 246 Table 17. The configuration of the anti-reflection coating in the second embodiment Atomic Layer Deposition (ALD) Layer order material refractive index Physical Thickness (nm) substrate plastic 1.53 - 1 TiO 2 2.51 14 2 SiO2 1.46 29 3 TiO 2 2.51 67 4 SiO2 1.46 6 5 TiO 2 2.51 31 6 SiO2 1.46 90 Total Film Thickness (tTK) 238 Table 18, the configuration of the anti-reflection coating in the seventh embodiment Atomic Layer Deposition (ALD) Layer order material refractive index Physical Thickness (nm) substrate plastic 1.49 - 1 Al 2 O 3 1.21 246 Total Film Thickness (tTK) 246

抗反射鍍膜配置方式(Coating Design)僅以第二實施例與第七實施例作為示範,相同鍍膜設計或經適當變化的鍍膜設計亦可應用在其他實施例的光學鏡片上,可以視需求改變抗反射鍍膜的膜層數量、光學鏡片之材質、抗反射鍍膜的高折射率材料及低折射率材料,且可以在評估最佳的配置因子後,應用在不同光學鏡頭與最適合的光學鏡片中。最外側的Al 2O 3膜層由外(空氣)至內(基材)的折射率自較低折射率漸變(Gradient)至較高折射率,所述漸變折射率膜層效果約等效於一折射率約為1.21的膜層。 The anti-reflection coating configuration (Coating Design) is only exemplified by the second embodiment and the seventh embodiment. The same coating design or appropriately changed coating design can also be applied to the optical lenses of other embodiments, and the anti-reflection coating design can be changed as required. The number of layers of the reflective coating, the material of the optical lens, the high-refractive index material and the low-refractive index material of the anti-reflection coating, and can be applied to different optical lenses and the most suitable optical lenses after evaluating the best configuration factor. The refractive index of the outermost Al 2 O 3 film layer is graded from a lower refractive index to a higher refractive index from the outer (air) to the inner (substrate), and the effect of the graded refractive index layer is approximately equivalent to A film with a refractive index of about 1.21.

本發明所述折射率的測定波長(Reference Wavelength)為510 nm或587.6 nm。The measurement wavelength (Reference Wavelength) of the refractive index in the present invention is 510 nm or 587.6 nm.

除上表十七及上表十八所提及之抗反射鍍膜配置方式之外,本揭示內容的抗反射鍍膜亦可以具有下列配置方式:In addition to the configurations of the anti-reflection coatings mentioned in Table 17 and Table 18 above, the anti-reflection coatings of the present disclosure may also have the following configurations:

(1)抗反射鍍膜是由原子層沉積法鍍膜技術所製成,抗反射鍍膜可以包含六膜層,由抗反射鍍膜最內側之膜層至最外側之膜層的材質分別為TiO 2、SiO 2、TiO 2、SiO 2、TiO 2及Al 2O 3,且包含抗反射鍍膜的光學鏡片由一塑膠材料所製成。 (1) The anti-reflection coating is made by atomic layer deposition coating technology. The anti-reflection coating can contain six layers. The materials from the innermost layer to the outermost layer of the anti-reflection coating are TiO 2 , SiO 2. TiO2 , SiO2 , TiO2 and Al2O3 , and the optical lens including anti - reflection coating is made of a plastic material.

(2)抗反射鍍膜是由原子層沉積法鍍膜技術所製成,抗反射鍍膜可以包含八膜層,由抗反射鍍膜最內側之膜層至最外側之膜層的材質分別為Al 2O 3、TiO 2、SiO 2、TiO 2、SiO 2、TiO 2、SiO 2及Al 2O 3,且包含抗反射鍍膜的光學鏡片由一塑膠材料所製成。 (2) The anti-reflection coating is made by atomic layer deposition coating technology. The anti-reflection coating can include eight layers. The materials from the innermost layer to the outermost layer of the anti-reflection coating are Al 2 O 3 respectively. , TiO 2 , SiO 2 , TiO 2 , SiO 2 , TiO 2 , SiO 2 and Al 2 O 3 , and the optical lens including anti-reflection coating is made of a plastic material.

(3)抗反射鍍膜是由原子層沉積法鍍膜技術所製成,抗反射鍍膜可以包含七膜層,由抗反射鍍膜最內側之膜層至最外側之膜層的材質分別為Al 2O 3、TiO 2、SiO 2、TiO 2、SiO 2、TiO 2及SiO 2,且包含抗反射鍍膜的光學鏡片由一塑膠材料所製成。 (3) The anti-reflection coating is made by atomic layer deposition coating technology. The anti-reflection coating can include seven layers, and the materials from the innermost layer to the outermost layer of the anti-reflection coating are Al 2 O 3 respectively. , TiO 2 , SiO 2 , TiO 2 , SiO 2 , TiO 2 and SiO 2 , and the optical lens including anti-reflection coating is made of a plastic material.

(4)抗反射鍍膜是由原子層沉積法鍍膜技術所製成,抗反射鍍膜可以包含二膜層,由抗反射鍍膜最內側之膜層至最外側之膜層的材質分別為Al 2O 3及MgF 2,且包含抗反射鍍膜的光學鏡片由一塑膠材料所製成。 (4) The anti-reflection coating is made by atomic layer deposition coating technology. The anti-reflection coating can include two layers. The materials from the innermost layer to the outermost layer of the anti-reflection coating are Al 2 O 3 respectively. and MgF 2 , and the optical lens including anti-reflection coating is made of a plastic material.

(5)抗反射鍍膜是由原子層沉積法鍍膜技術所製成,抗反射鍍膜可以包含二膜層,由抗反射鍍膜最內側之膜層至最外側之膜層的材質分別為Al 2O 3及SiO 2,且包含抗反射鍍膜的光學鏡片由一塑膠材料所製成。 (5) The anti-reflection coating is made by atomic layer deposition coating technology. The anti-reflection coating can include two layers. The materials from the innermost layer to the outermost layer of the anti-reflection coating are Al 2 O 3 respectively. and SiO 2 , and the optical lens including anti-reflection coating is made of a plastic material.

(6)抗反射鍍膜是由原子層沉積法鍍膜技術所製成,抗反射鍍膜可以包含三膜層,由抗反射鍍膜最內側之膜層至最外側之膜層的材質分別為Al 2O 3、SiO 2及MgF 2,且包含抗反射鍍膜的光學鏡片由一塑膠材料所製成。 (6) The anti-reflection coating is made by atomic layer deposition coating technology. The anti-reflection coating can include three layers. The materials from the innermost layer to the outermost layer of the anti-reflection coating are Al 2 O 3 respectively. , SiO 2 and MgF 2 , and the optical lens including anti-reflection coating is made of a plastic material.

(7)抗反射鍍膜是由原子層沉積法鍍膜技術所製成,抗反射鍍膜可以包含一膜層,膜層的材質為AlN,且包含抗反射鍍膜的光學鏡片由一塑膠材料所製成。(7) The anti-reflection coating is made by atomic layer deposition coating technology. The anti-reflection coating can include a layer, the material of the layer is AlN, and the optical lens including the anti-reflection coating is made of a plastic material.

下表十九是第一比較例、第二實施例與第七實施例之抗反射鍍膜於光學鏡片中心處及周邊處之厚度比較。 表十九、抗反射鍍膜之厚度 第一比較例 第二實施例 第七實施例 中心處 厚度 (Tc, nm) 周邊處 厚度 (Tp, nm) 中心處 厚度 (Tc, nm) 周邊處 厚度 (Tp, nm) 中心處 厚度 (Tc, nm) 周邊處 厚度 (Tp, nm) 246.65 208.02 245.23 244.31 246.60 243.00 |Tc-Tp|/Tc 18.57% 0.38% 1.48% 參考波長 (nm) 510.00 510.00 入射角 (度) 0 0 Table 19 below is a comparison of the thicknesses of the anti-reflection coatings at the center and the periphery of the optical lens of the first comparative example, the second example and the seventh example. Table 19. Thickness of anti-reflection coating The first comparative example Second Embodiment Seventh Embodiment Thickness at the center (Tc, nm) Thickness at the periphery (Tp, nm) Thickness at the center (Tc, nm) Thickness at the periphery (Tp, nm) Thickness at the center (Tc, nm) Thickness at the periphery (Tp, nm) 246.65 208.02 245.23 244.31 246.60 243.00 |Tc-Tp|/Tc 18.57% 0.38% 1.48% Reference wavelength (nm) 510.00 510.00 Incidence angle (degrees) 0 0

請參照第7A圖及第7B圖,第7A圖為第一比較例的光學鏡頭於55度入射強光下的鏡頭影像品質測試圖,第7B圖為第二實施例的光學鏡頭於55度入射強光下的鏡頭影像品質測試圖,其中,第二實施例的抗反射鍍膜係採用原子層沉積法鍍膜技術所製成。由第7A圖及第7B圖可以看出,雖然第一比較例與第二實施例均出現斜條狀耀光,但與第一比較例相較之下,第二實施例的耀光強度明顯較低,說明第二實施例的光學鏡頭確實能獲得較佳的成像品質。Please refer to Figures 7A and 7B, Figure 7A is a test chart of the image quality of the optical lens of the first comparative example under the incident strong light of 55 degrees, and Figure 7B is the optical lens of the second embodiment at 55 degrees of incidence The test chart of the lens image quality under strong light, wherein the anti-reflection coating of the second embodiment is made by the atomic layer deposition coating technology. It can be seen from Figures 7A and 7B that although the first comparative example and the second embodiment both have oblique stripe flares, compared with the first comparative example, the flare intensity of the second embodiment is obvious. lower, indicating that the optical lens of the second embodiment can indeed obtain better imaging quality.

再者,請一併參照第8A圖及第8B圖,第8A圖為第七實施例的包含抗反射鍍膜的光學鏡片中心處的斷面圖,第8B圖為第七實施例的包含抗反射鍍膜的光學鏡片周邊處的斷面圖。由第8A圖及第8B圖明顯可見抗反射鍍膜的外側孔洞相對大於內側孔洞,可以說明在同一平面中,抗反射鍍膜外側的不規則支狀奈米纖維結構分布較稀疏,而內側的不規則支狀奈米纖維結構分布較緊密。Furthermore, please refer to Figure 8A and Figure 8B together, Figure 8A is a cross-sectional view at the center of an optical lens comprising an anti-reflection coating of the seventh embodiment, and Figure 8B is a seventh embodiment that includes an anti-reflection coating. Sectional view of the perimeter of a coated optical lens. It can be seen from Figure 8A and Figure 8B that the outer holes of the anti-reflection coating are relatively larger than the inner holes, which means that in the same plane, the irregular branched nanofiber structure on the outside of the anti-reflection coating is sparsely distributed, while the inner irregularities The branched nanofiber structure is densely distributed.

<第十三實施例><Thirteenth embodiment>

第十三實施例的光學鏡頭的抗反射元件可包含至少一濾除元件或一保護玻璃,分別為濾除元件F1、濾除元件F2、濾除元件F3、濾除元件F4、濾除元件F5、濾除元件F6或保護玻璃G1。第十三實施例的光學鏡頭可選擇包含的各濾除元件及保護玻璃的詳細參數大小已列於下表二十,其參數定義皆與第一實施例相同,於此不再贅述。 表二十、第十三實施例的光學鏡頭   F1 F2 F3 F4 F5 CTs 0.55 0.30 0.20 0.55 0.30 Ns (於波長 587.6 nm) 1.53 1.53 1.62 1.69 1.77 Far3= (1/(Ns-1)) 2 3.501 3.570 2.601 2.100 1.687   F6 G1   CTs 0.20 0.55 Ns (於波長 587.6 nm) 1.82 1.92 Far3= (1/(Ns-1)) 2 1.487 1.181 The anti-reflection element of the optical lens of the thirteenth embodiment may include at least one filter element or a protective glass, which are respectively a filter element F1, a filter element F2, a filter element F3, a filter element F4, and a filter element F5 , filter element F6 or protective glass G1. The detailed parameters of each filter element and protective glass optionally included in the optical lens of the thirteenth embodiment are listed in Table 20 below, and the parameter definitions are the same as those of the first embodiment, and will not be repeated here. Table 20. Optical lens of the thirteenth embodiment F1 F2 F3 F4 F5 CTs 0.55 0.30 0.20 0.55 0.30 Ns (at wavelength 587.6 nm) 1.53 1.53 1.62 1.69 1.77 Far3= (1/(Ns-1)) 2 3.501 3.570 2.601 2.100 1.687 F6 G1 CTs 0.20 0.55 Ns (at wavelength 587.6 nm) 1.82 1.92 Far3= (1/(Ns-1)) 2 1.487 1.181

下表二十一及表二十二分別是第十三實施例的兩種抗反射鍍膜配置方式。 表二十一、第十三實施例的一抗反射鍍膜配置方式 膜層順序 材質 折射率 物理厚度(nm) 基材 玻璃/塑膠 1.53 – 1.92 - 1 SiO 2 1.46 (N1) 21 2 TiO 2 2.35 (N2) 9 3 SiO 2 1.46 (N3) 48 4 TiO 2 2.35 (N4) 4 5 SiO 2 1.46 (N5) 65 6 Al 2O 3 1.21 (N6) 120 總膜厚 (tTK) 267 表二十二、第十三實施例的另一抗反射鍍膜配置方式 膜層順序 材質 折射率 物理厚度(nm) 基材 玻璃/塑膠 1.53 – 1.92 - 1 SiO 2 1.46 (N1) 100 2 Al 2O 3 1.21 (N2) 115 總膜厚 (tTK) 215 Table 21 and Table 22 below respectively show the two anti-reflection coating configurations of the thirteenth embodiment. Table 21. An anti-reflection coating configuration of the thirteenth embodiment Layer order material refractive index Physical Thickness (nm) substrate glass/plastic 1.53 – 1.92 - 1 SiO2 1.46 (N1) twenty one 2 TiO 2 2.35 (N2) 9 3 SiO2 1.46 (N3) 48 4 TiO 2 2.35 (N4) 4 5 SiO2 1.46 (N5) 65 6 Al 2 O 3 1.21 (N6) 120 Total Film Thickness (tTK) 267 Table 22. Another anti-reflection coating configuration of the thirteenth embodiment Layer order material refractive index Physical Thickness (nm) substrate glass/plastic 1.53 – 1.92 - 1 SiO2 1.46 (N1) 100 2 Al 2 O 3 1.21 (N2) 115 Total Film Thickness (tTK) 215

本揭示內容的抗反射鍍膜中,最靠近基材的膜層為第一膜層,依序為第二膜層、第三膜層…等,且第二膜層與第一膜層接觸,依此類推。第一膜層的折射率為N1、第二膜層的折射率為N2…,依此類推。In the anti-reflection coating of the present disclosure, the film layer closest to the substrate is the first film layer, followed by the second film layer, the third film layer, etc., and the second film layer is in contact with the first film layer, according to And so on. The refractive index of the first film layer is N1, the refractive index of the second film layer is N2... and so on.

第十三實施例的一抗反射鍍膜配置方式中,基材為玻璃或塑膠,基材的折射率為1.53 - 1.92,基材的厚度為0.20 mm、0.30 mm或0.55 mm,第一膜層為SiO 2,第一膜層的折射率為1.46,第一膜層的厚度為21 nm,第二膜層為TiO 2,第二膜層的折射率為2.35,第二膜層的厚度為9 nm,第三膜層為SiO 2,第三膜層的折射率為1.46,第三膜層的厚度為48 nm,第四膜層為TiO 2,第四膜層的折射率為2.35,第四膜層的厚度為4 nm,第五膜層為SiO 2,第五膜層的折射率為1.46,第五膜層的厚度為65 nm,第六膜層為Al 2O 3,第六膜層為漸變折射率且等效折射率約為1.21,第六膜層的厚度為120 nm。其中第六膜層的等效折射率小於第一膜層、第二膜層、第三膜層、第四膜層、第五膜層與基材,第五膜層的折射率小於第四膜層的折射率,第四膜層的折射率大於第三膜層的折射率,第三膜層的折射率小於第二膜層的折射率,第二膜層的折射率大於第一膜層的折射率,第一膜層的折射率小於基材的折射率。 In the configuration method of an anti-reflection coating in the thirteenth embodiment, the substrate is glass or plastic, the refractive index of the substrate is 1.53 - 1.92, the thickness of the substrate is 0.20 mm, 0.30 mm or 0.55 mm, and the first film layer is SiO 2 , the refractive index of the first layer is 1.46, the thickness of the first layer is 21 nm, the second layer is TiO 2 , the refractive index of the second layer is 2.35, and the thickness of the second layer is 9 nm , the third film layer is SiO 2 , the refractive index of the third film layer is 1.46, the thickness of the third film layer is 48 nm, the fourth film layer is TiO 2 , the refractive index of the fourth film layer is 2.35, and the fourth film layer is The thickness of the layer is 4 nm, the fifth layer is SiO 2 , the refractive index of the fifth layer is 1.46, the thickness of the fifth layer is 65 nm, the sixth layer is Al 2 O 3 , and the sixth layer is The graded refractive index and the equivalent refractive index are about 1.21, and the thickness of the sixth film layer is 120 nm. The equivalent refractive index of the sixth film layer is smaller than that of the first film layer, the second film layer, the third film layer, the fourth film layer, the fifth film layer and the substrate, and the refractive index of the fifth film layer is smaller than that of the fourth film layer The refractive index of the layer, the refractive index of the fourth layer is greater than the refractive index of the third layer, the refractive index of the third layer is less than the refractive index of the second layer, and the refractive index of the second layer is greater than that of the first layer. The refractive index, the refractive index of the first film layer is less than the refractive index of the substrate.

第十三實施例的另一抗反射鍍膜配置方式中,基材為玻璃或塑膠,基材的折射率為1.53 - 1.92,基材的厚度為0.20 mm、0.30 mm或0.55 mm,第一膜層為SiO 2,第一膜層的折射率為1.46,第一膜層的厚度為100 nm,第二膜層為為Al 2O 3,第二膜層為漸變折射率且等效折射率約為1.21,第二膜層的厚度為115 nm。其中第二膜層的等效折射率小於第一膜層與基材,第一膜層的折射率小於基材的折射率。 In another anti-reflection coating configuration method of the thirteenth embodiment, the substrate is glass or plastic, the refractive index of the substrate is 1.53 - 1.92, the thickness of the substrate is 0.20 mm, 0.30 mm or 0.55 mm, and the first film layer It is SiO 2 , the refractive index of the first film layer is 1.46, the thickness of the first film layer is 100 nm, the second film layer is Al 2 O 3 , the second film layer is graded refractive index and the equivalent refractive index is about 1.21, the thickness of the second film layer is 115 nm. The equivalent refractive index of the second film layer is smaller than that of the first film layer and the base material, and the refractive index of the first film layer is smaller than that of the base material.

請參照第9A圖及第9B圖,第9A圖為第一比較例的光學鏡頭於大角度(19度)入射強光下的鏡頭影像品質測試圖,第9B圖為第十三實施例的光學鏡頭於大角度(19度)入射強光下的鏡頭影像品質測試圖。由第9A圖及第9B圖可以看出,第一比較例在影像角落處出現明顯雜光,而第十三實施例於影像角落處則無明顯雜光,說明第十三實施例的光學鏡頭確實在大角度強光的情況下,有效改善角落雜光之問題。Please refer to Figures 9A and 9B. Figure 9A is a test chart of the image quality of the optical lens of the first comparative example under a large angle (19 degrees) incident strong light, and Figure 9B is the optical lens of the thirteenth embodiment. The test chart of the lens image quality under the strong light incident of the lens at a large angle (19 degrees). It can be seen from Figures 9A and 9B that the first comparative example has obvious stray light at the corners of the image, while the thirteenth embodiment has no obvious stray light at the corners of the image, illustrating the optical lens of the thirteenth embodiment. Indeed, in the case of large-angle strong light, it can effectively improve the problem of corner stray light.

再者,請參照第10A圖及第10B圖,第10A圖為第一比較例之微透鏡的鏡頭影像品質測試圖,第10B圖為第十三實施例之微透鏡的鏡頭影像品質測試圖。由第10A圖及第10B圖可以看出,第一比較例出現明顯瓣狀雜光,而第十三實施例則無,說明第十三實施例的光學鏡頭能明顯改善瓣狀雜光之問題。Furthermore, please refer to FIG. 10A and FIG. 10B , FIG. 10A is a test chart of the lens image quality of the microlens of the first comparative example, and FIG. 10B is a test chart of the lens image quality of the microlens of the thirteenth embodiment. It can be seen from Figures 10A and 10B that the first comparative example has obvious petal-shaped stray light, but the thirteenth embodiment does not, indicating that the optical lens of the thirteenth embodiment can significantly improve the problem of petal-shaped stray light. .

<反射率及穿透率量測結果><Measurement results of reflectance and transmittance>

下表二十三及表二十四是第二比較例、第十四實施例及第十五實施例之反射率量測結果。 表二十三、第二比較例、第十四實施例 及第十五實施例之反射率量測結果   第二比較例 第十四實施例 第十五實施例 組合 抗反射元件 抗反射元件 抗反射元件 抗反射元件之第一表面 紅外線 濾除鍍膜 紅外線 濾除鍍膜 紅外線 濾除鍍膜及 本發明的 抗反射鍍膜 抗反射元件之第二表面 習知的 抗反射鍍膜 本發明的 抗反射鍍膜 本發明的 抗反射鍍膜 WRmin (nm) 510 580 585 反射率 (%) R4060 1.4 0.2 0.1 R4063 1.4 0.2 0.1 R4065 1.4 0.2 0.1 R40100 2.4 0.8 0.7 R5060 1.3 0.2 0.1 R6070 1.9 0.5 0.4 R67100 3.1 1.3 1.2 R70100 3.2 1.3 1.3 R80100 3.4 1.5 1.4 R90100 3.5 1.6 1.5 R50 1.3 0.2 0.1 R60 1.4 0.1 0.0 R65 1.7 0.5 0.5 R70 2.5 0.9 0.8 R80 3.0 1.2 1.1 R90 3.4 1.5 1.4 R100 3.7 1.8 1.7 表二十四、第二比較例、第十四實施例 及第十五實施例之抗反射元件的反射率量測結果 波長 (nm) 第二比較例 第十四實施例 第十五實施例 400 2.0 0.0 0.0 405 1.7 0.3 0.2 410 1.8 0.2 0.1 415 1.8 0.2 0.0 420 1.7 0.3 0.2 425 1.7 0.2 0.1 430 1.5 0.1 0.0 435 1.4 0.1 0.0 440 1.5 0.3 0.1 445 1.6 0.2 0.1 450 1.4 0.1 0.0 455 1.5 0.4 0.2 460 1.3 0.2 0.1 465 1.3 0.2 0.1 470 1.3 0.2 0.0 475 1.3 0.2 0.0 480 1.4 0.2 0.0 485 1.3 0.2 0.1 490 1.3 0.2 0.1 495 1.3 0.2 0.1 500 1.3 0.2 0.1 505 1.3 0.2 0.1 510 1.3 0.2 0.1 515 1.3 0.2 0.1 520 1.3 0.2 0.1 525 1.3 0.2 0.1 530 1.3 0.2 0.1 535 1.3 0.1 0.1 540 1.3 0.2 0.1 545 1.3 0.2 0.1 550 1.3 0.1 0.0 555 1.3 0.2 0.1 560 1.3 0.2 0.0 565 1.3 0.1 0.1 570 1.4 0.1 0.1 575 1.4 0.1 0.1 580 1.4 0.1 0.1 585 1.4 0.1 0.0 590 1.4 0.1 0.0 595 1.4 0.2 0.1 600 1.4 0.1 0.0 605 1.4 0.1 0.0 610 1.4 0.1 0.0 615 1.4 0.1 0.0 620 1.5 0.1 0.0 625 1.5 0.1 0.0 630 1.5 0.1 0.0 635 1.5 0.1 0.0 640 1.5 0.2 0.1 645 1.6 0.3 0.2 650 1.7 0.5 0.5 655 2.0 0.7 0.7 660 2.2 0.8 0.8 665 2.3 0.8 0.8 670 2.3 0.8 0.8 675 2.4 0.9 0.8 680 2.4 0.9 0.8 685 2.4 0.9 0.8 690 2.5 0.9 0.8 695 2.5 0.9 0.8 700 2.5 0.9 0.8 705 2.6 0.9 0.9 710 2.6 0.9 0.9 715 2.6 1.0 0.9 720 2.7 1.0 0.9 725 2.7 1.0 1.0 730 2.7 1.0 0.9 735 2.8 1.0 1.0 740 2.8 1.1 1.0 745 2.8 1.1 1.0 750 2.8 1.1 1.0 755 2.9 1.1 1.0 760 2.9 1.1 1.1 765 2.9 1.1 1.1 770 2.9 1.1 1.1 775 2.9 1.1 1.1 780 3.0 1.2 1.1 785 3.0 1.2 1.1 790 3.0 1.2 1.1 795 3.0 1.2 1.1 800 3.0 1.2 1.1 805 3.1 1.2 1.1 810 3.1 1.2 1.2 815 3.1 1.2 1.2 820 3.1 1.3 1.2 825 3.1 1.3 1.2 830 3.2 1.3 1.2 835 3.2 1.3 1.2 840 3.2 1.3 1.2 845 3.3 1.4 1.3 850 3.2 1.3 1.3 855 3.2 1.3 1.3 860 3.3 1.4 1.3 865 3.3 1.4 1.3 870 3.3 1.4 1.3 875 3.3 1.4 1.3 880 3.4 1.4 1.4 885 3.4 1.5 1.4 890 3.3 1.4 1.4 895 3.4 1.5 1.4 900 3.4 1.5 1.4 905 3.4 1.5 1.4 910 3.5 1.5 1.4 915 3.4 1.5 1.5 920 3.5 1.6 1.5 925 3.5 1.6 1.5 930 3.5 1.6 1.5 935 3.5 1.6 1.5 940 3.5 1.6 1.5 945 3.6 1.6 1.5 950 3.5 1.6 1.5 955 3.5 1.7 1.6 960 3.6 1.7 1.5 965 3.6 1.7 1.6 970 3.6 1.6 1.6 975 3.7 1.7 1.5 980 3.6 1.7 1.6 985 3.6 1.7 1.6 990 3.7 1.7 1.7 995 3.6 1.7 1.7 1000 3.7 1.8 1.7 Table 23 and Table 24 below are the reflectance measurement results of the second comparative example, the fourteenth embodiment and the fifteenth embodiment. Table 23. Reflectance measurement results of the second comparative example, the fourteenth example and the fifteenth example Second Comparative Example Fourteenth Embodiment fifteenth embodiment combination Anti-reflection element Anti-reflection element Anti-reflection element The first surface of the anti-reflection element Infrared filter coating Infrared filter coating Infrared filter coating and anti-reflection coating of the present invention The second surface of the anti-reflection element conventional anti-reflection coatings The anti-reflection coating of the present invention The anti-reflection coating of the present invention WRmin (nm) 510 580 585 Reflectivity(%) R4060 1.4 0.2 0.1 R4063 1.4 0.2 0.1 R4065 1.4 0.2 0.1 R40100 2.4 0.8 0.7 R5060 1.3 0.2 0.1 R6070 1.9 0.5 0.4 R67100 3.1 1.3 1.2 R70100 3.2 1.3 1.3 R80100 3.4 1.5 1.4 R90100 3.5 1.6 1.5 R50 1.3 0.2 0.1 R60 1.4 0.1 0.0 R65 1.7 0.5 0.5 R70 2.5 0.9 0.8 R80 3.0 1.2 1.1 R90 3.4 1.5 1.4 R100 3.7 1.8 1.7 Table 24. Measurement results of reflectivity of the anti-reflection elements of the second comparative example, the fourteenth example and the fifteenth example Wavelength (nm) Second Comparative Example Fourteenth Embodiment fifteenth embodiment 400 2.0 0.0 0.0 405 1.7 0.3 0.2 410 1.8 0.2 0.1 415 1.8 0.2 0.0 420 1.7 0.3 0.2 425 1.7 0.2 0.1 430 1.5 0.1 0.0 435 1.4 0.1 0.0 440 1.5 0.3 0.1 445 1.6 0.2 0.1 450 1.4 0.1 0.0 455 1.5 0.4 0.2 460 1.3 0.2 0.1 465 1.3 0.2 0.1 470 1.3 0.2 0.0 475 1.3 0.2 0.0 480 1.4 0.2 0.0 485 1.3 0.2 0.1 490 1.3 0.2 0.1 495 1.3 0.2 0.1 500 1.3 0.2 0.1 505 1.3 0.2 0.1 510 1.3 0.2 0.1 515 1.3 0.2 0.1 520 1.3 0.2 0.1 525 1.3 0.2 0.1 530 1.3 0.2 0.1 535 1.3 0.1 0.1 540 1.3 0.2 0.1 545 1.3 0.2 0.1 550 1.3 0.1 0.0 555 1.3 0.2 0.1 560 1.3 0.2 0.0 565 1.3 0.1 0.1 570 1.4 0.1 0.1 575 1.4 0.1 0.1 580 1.4 0.1 0.1 585 1.4 0.1 0.0 590 1.4 0.1 0.0 595 1.4 0.2 0.1 600 1.4 0.1 0.0 605 1.4 0.1 0.0 610 1.4 0.1 0.0 615 1.4 0.1 0.0 620 1.5 0.1 0.0 625 1.5 0.1 0.0 630 1.5 0.1 0.0 635 1.5 0.1 0.0 640 1.5 0.2 0.1 645 1.6 0.3 0.2 650 1.7 0.5 0.5 655 2.0 0.7 0.7 660 2.2 0.8 0.8 665 2.3 0.8 0.8 670 2.3 0.8 0.8 675 2.4 0.9 0.8 680 2.4 0.9 0.8 685 2.4 0.9 0.8 690 2.5 0.9 0.8 695 2.5 0.9 0.8 700 2.5 0.9 0.8 705 2.6 0.9 0.9 710 2.6 0.9 0.9 715 2.6 1.0 0.9 720 2.7 1.0 0.9 725 2.7 1.0 1.0 730 2.7 1.0 0.9 735 2.8 1.0 1.0 740 2.8 1.1 1.0 745 2.8 1.1 1.0 750 2.8 1.1 1.0 755 2.9 1.1 1.0 760 2.9 1.1 1.1 765 2.9 1.1 1.1 770 2.9 1.1 1.1 775 2.9 1.1 1.1 780 3.0 1.2 1.1 785 3.0 1.2 1.1 790 3.0 1.2 1.1 795 3.0 1.2 1.1 800 3.0 1.2 1.1 805 3.1 1.2 1.1 810 3.1 1.2 1.2 815 3.1 1.2 1.2 820 3.1 1.3 1.2 825 3.1 1.3 1.2 830 3.2 1.3 1.2 835 3.2 1.3 1.2 840 3.2 1.3 1.2 845 3.3 1.4 1.3 850 3.2 1.3 1.3 855 3.2 1.3 1.3 860 3.3 1.4 1.3 865 3.3 1.4 1.3 870 3.3 1.4 1.3 875 3.3 1.4 1.3 880 3.4 1.4 1.4 885 3.4 1.5 1.4 890 3.3 1.4 1.4 895 3.4 1.5 1.4 900 3.4 1.5 1.4 905 3.4 1.5 1.4 910 3.5 1.5 1.4 915 3.4 1.5 1.5 920 3.5 1.6 1.5 925 3.5 1.6 1.5 930 3.5 1.6 1.5 935 3.5 1.6 1.5 940 3.5 1.6 1.5 945 3.6 1.6 1.5 950 3.5 1.6 1.5 955 3.5 1.7 1.6 960 3.6 1.7 1.5 965 3.6 1.7 1.6 970 3.6 1.6 1.6 975 3.7 1.7 1.5 980 3.6 1.7 1.6 985 3.6 1.7 1.6 990 3.7 1.7 1.7 995 3.6 1.7 1.7 1000 3.7 1.8 1.7

請一併參照第11圖至第13圖,第11圖為第二比較例的抗反射元件的反射率與波長的關係圖,第12圖為第十四實施例的抗反射元件的反射率與波長的關係圖,第13圖為第十五實施例的抗反射元件的反射率與波長的關係圖。由第11圖至第13圖可以得知,第十四實施例及第十五實施例的反射率均明顯小於第二比較例的反射率,說明第十四實施例及第十五實施例透過採用不同的鍍膜方式,能夠獲得優異的抗反射效果。Please refer to Fig. 11 to Fig. 13 together. Fig. 11 is a graph showing the relationship between the reflectivity and wavelength of the anti-reflection element of the second comparative example, and Fig. 12 is the reflectivity and wavelength of the anti-reflection element of the fourteenth embodiment. The relationship diagram of wavelength, Fig. 13 is the relationship diagram of reflectance and wavelength of the anti-reflection element of the fifteenth embodiment. From FIGS. 11 to 13, it can be known that the reflectivity of the fourteenth embodiment and the fifteenth embodiment is significantly lower than that of the second comparative example, indicating that the fourteenth embodiment and the fifteenth embodiment transmit through Different coating methods can be used to obtain excellent anti-reflection effect.

下表二十五及表二十六是第二比較例及第十四實施例之穿透率量測結果。 表二十五、第二比較例及第十四實施例之穿透率量測結果   第二比較例 第十四實施例 組合 抗反射元件 抗反射元件 抗反射元件之第一表面 紅外線濾除鍍膜 紅外線濾除鍍膜 抗反射元件之第二表面 習知的抗反射鍍膜 本發明的抗反射鍍膜 穿透率 (%) Tmax 98 100 T4060 95 99 T5060 98 100 T70100 0.16 0.15 T40 38 94 T50 98 99 T60 98 99 T70 0.43 0.14 表二十六、第二比較例及第十四實施例之抗反射元件的穿透率量測結果 波長 (nm) 第二比較例 第十四實施例 400 38.0 93.8 405 73.0 96.2 410 91.1 97.5 415 94.7 98.2 420 96.2 98.7 425 96.8 98.7 430 97.2 98.3 435 97.0 97.6 440 97.1 97.9 445 97.7 98.7 450 97.8 99.4 455 98.0 99.5 460 98.2 99.5 465 98.0 99.4 470 98.2 99.3 475 98.3 99.3 480 98.2 99.2 485 98.3 99.5 490 97.9 99.4 495 97.7 99.4 500 97.9 99.4 505 97.7 99.3 510 97.1 99.5 515 97.0 99.7 520 97.2 99.7 525 97.5 99.8 530 97.7 99.9 535 97.9 99.9 540 97.7 100.0 545 97.7 100.0 550 97.9 100.0 555 98.3 100.0 560 98.2 100.0 565 97.3 99.7 570 96.8 99.4 575 97.5 99.4 580 98.0 99.6 585 98.2 99.8 590 98.0 99.7 595 97.9 99.4 600 98.0 99.4 605 98.2 99.1 610 98.0 99.0 615 98.0 98.5 620 97.7 97.5 625 96.9 96.6 630 96.5 96.8 635 96.4 97.3 640 96.1 94.6 645 93.2 79.1 650 79.1 49.3 655 47.2 19.9 660 18.9 6.6 665 7.0 3.0 670 3.5 1.8 675 2.2 1.3 680 1.5 0.9 685 1.1 0.5 690 0.8 0.3 695 0.6 0.2 700 0.4 0.1 705 0.4 0.1 710 0.3 0.1 715 0.2 0.1 720 0.2 0.1 725 0.1 0.1 730 0.1 0.1 735 0.2 0.1 740 0.2 0.1 745 0.2 0.1 750 0.2 0.1 755 0.1 0.1 760 0.1 0.1 765 0.1 0.1 770 0.1 0.1 775 0.1 0.1 780 0.1 0.1 785 0.1 0.1 790 0.1 0.1 795 0.1 0.1 800 0.1 0.1 805 0.1 0.1 810 0.1 0.1 815 0.1 0.1 820 0.1 0.1 825 0.1 0.1 830 0.2 0.1 835 0.1 0.2 840 0.2 0.3 845 0.2 0.3 850 0.4 0.3 855 0.3 0.2 860 0.2 0.1 865 0.1 0.2 870 0.4 0.1 875 0.0 0.2 880 0.3 0.3 885 0.3 0.1 890 0.1 0.2 895 0.3 0.4 900 0.1 0.3 905 0.2 0.3 910 0.3 0.2 915 0.2 0.2 920 0.1 0.2 925 0.0 0.2 930 0.3 0.1 935 0.1 0.1 940 0.1 0.1 945 0.1 0.1 950 -0.1 0.1 955 0.1 0.2 960 0.1 0.2 965 0.2 0.3 970 0.1 0.4 975 0.1 0.4 980 0.1 0.3 985 0.2 0.1 990 0.0 0.3 995 0.1 0.2 1000 0.0 0.1 Table 25 and Table 26 below are the transmittance measurement results of the second comparative example and the fourteenth example. Table 25. The transmittance measurement results of the second comparative example and the fourteenth example Second Comparative Example Fourteenth Embodiment combination Anti-reflection element Anti-reflection element The first surface of the anti-reflection element Infrared filter coating Infrared filter coating The second surface of the anti-reflection element conventional anti-reflection coatings The anti-reflection coating of the present invention Penetration rate (%) Tmax 98 100 T4060 95 99 T5060 98 100 T70100 0.16 0.15 T40 38 94 T50 98 99 T60 98 99 T70 0.43 0.14 Table 26. Transmittance measurement results of the anti-reflection elements of the second comparative example and the fourteenth example Wavelength (nm) Second Comparative Example Fourteenth Embodiment 400 38.0 93.8 405 73.0 96.2 410 91.1 97.5 415 94.7 98.2 420 96.2 98.7 425 96.8 98.7 430 97.2 98.3 435 97.0 97.6 440 97.1 97.9 445 97.7 98.7 450 97.8 99.4 455 98.0 99.5 460 98.2 99.5 465 98.0 99.4 470 98.2 99.3 475 98.3 99.3 480 98.2 99.2 485 98.3 99.5 490 97.9 99.4 495 97.7 99.4 500 97.9 99.4 505 97.7 99.3 510 97.1 99.5 515 97.0 99.7 520 97.2 99.7 525 97.5 99.8 530 97.7 99.9 535 97.9 99.9 540 97.7 100.0 545 97.7 100.0 550 97.9 100.0 555 98.3 100.0 560 98.2 100.0 565 97.3 99.7 570 96.8 99.4 575 97.5 99.4 580 98.0 99.6 585 98.2 99.8 590 98.0 99.7 595 97.9 99.4 600 98.0 99.4 605 98.2 99.1 610 98.0 99.0 615 98.0 98.5 620 97.7 97.5 625 96.9 96.6 630 96.5 96.8 635 96.4 97.3 640 96.1 94.6 645 93.2 79.1 650 79.1 49.3 655 47.2 19.9 660 18.9 6.6 665 7.0 3.0 670 3.5 1.8 675 2.2 1.3 680 1.5 0.9 685 1.1 0.5 690 0.8 0.3 695 0.6 0.2 700 0.4 0.1 705 0.4 0.1 710 0.3 0.1 715 0.2 0.1 720 0.2 0.1 725 0.1 0.1 730 0.1 0.1 735 0.2 0.1 740 0.2 0.1 745 0.2 0.1 750 0.2 0.1 755 0.1 0.1 760 0.1 0.1 765 0.1 0.1 770 0.1 0.1 775 0.1 0.1 780 0.1 0.1 785 0.1 0.1 790 0.1 0.1 795 0.1 0.1 800 0.1 0.1 805 0.1 0.1 810 0.1 0.1 815 0.1 0.1 820 0.1 0.1 825 0.1 0.1 830 0.2 0.1 835 0.1 0.2 840 0.2 0.3 845 0.2 0.3 850 0.4 0.3 855 0.3 0.2 860 0.2 0.1 865 0.1 0.2 870 0.4 0.1 875 0.0 0.2 880 0.3 0.3 885 0.3 0.1 890 0.1 0.2 895 0.3 0.4 900 0.1 0.3 905 0.2 0.3 910 0.3 0.2 915 0.2 0.2 920 0.1 0.2 925 0.0 0.2 930 0.3 0.1 935 0.1 0.1 940 0.1 0.1 945 0.1 0.1 950 -0.1 0.1 955 0.1 0.2 960 0.1 0.2 965 0.2 0.3 970 0.1 0.4 975 0.1 0.4 980 0.1 0.3 985 0.2 0.1 990 0.0 0.3 995 0.1 0.2 1000 0.0 0.1

請一併參照第14圖及第15圖,第14圖為第二比較例的抗反射元件的穿透率與波長的關係圖,第15圖為第十四實施例的抗反射元件的穿透率與波長的關係圖。由第14圖及第15圖可以得知,第十四實施例及第二比較例在不同波長下的穿透率相似,說明第十四實施例在短波長處能保有良好穿透率,且在長波長處亦能具有良好濾除效果。Please refer to Fig. 14 and Fig. 15 together. Fig. 14 is a graph showing the relationship between the transmittance and wavelength of the anti-reflection element of the second comparative example, and Fig. 15 is the transmittance of the anti-reflection element of the fourteenth embodiment. A plot of rate versus wavelength. It can be seen from FIG. 14 and FIG. 15 that the transmittances of the fourteenth embodiment and the second comparative example at different wavelengths are similar, which means that the fourteenth embodiment can maintain good transmittance at short wavelengths, and It can also have good filtering effect at long wavelengths.

<第十五實施例><Fifteenth Embodiment>

請參照第16圖,第16圖為本揭示內容之一實施方式的一種取像裝置的示意圖。第十五實施例的取像裝置由物側至像側依序包含一曲面元件110、一光學鏡頭120以及一電子感光元件150,且電子感光元件150設置於光學鏡頭120的成像面140。Please refer to FIG. 16 , which is a schematic diagram of an imaging device according to an embodiment of the disclosure. The imaging device of the fifteenth embodiment includes a curved surface element 110 , an optical lens 120 and an electronic photosensitive element 150 in sequence from the object side to the image side, and the electronic photosensitive element 150 is disposed on the imaging surface 140 of the optical lens 120 .

請一併參照第17A圖至第17D圖,第17A圖、第17B圖、第17C圖及第17D圖分別為第16圖所示之取像裝置於17A處、17B處、17C處及17D處的局部放大示意圖。其中,曲面元件110之物側表面111包含一相位次波長結構,其細部結構如第17A圖所示,光學鏡頭120之物側表面121包含一石墨烯結構,其細部結構如第17B圖所示,光學鏡頭120之像側表面122包含一抗反射鍍膜,其細部結構如第17C圖所示。取像裝置更可以包含一相位次波長結構130,其細部結構如第17D圖所示。Please refer to Fig. 17A to Fig. 17D together. Fig. 17A, Fig. 17B, Fig. 17C and Fig. 17D are the image pickup devices shown in Fig. 16 at positions 17A, 17B, 17C and 17D respectively. A partial enlarged schematic diagram of . The object-side surface 111 of the curved element 110 includes a phase subwavelength structure, and its detailed structure is shown in FIG. 17A , and the object-side surface 121 of the optical lens 120 includes a graphene structure, and its detailed structure is shown in FIG. 17B , the image-side surface 122 of the optical lens 120 includes an anti-reflection coating, and its detailed structure is shown in FIG. 17C . The imaging device may further include a phase subwavelength structure 130 , the detailed structure of which is shown in FIG. 17D .

請參照第18圖,第18圖為取像裝置中的一繞射元件160的示意圖。取像裝置更可以包含繞射元件160,繞射元件160的至少一表面可以包含一抗反射鍍膜,繞射元件160的抗反射鍍膜之材質可以為氧化鋁。在本實施例中,繞射元件160之物側表面161包含抗反射鍍膜,其細部結構如第17C圖所示。Please refer to FIG. 18 , which is a schematic diagram of a diffractive element 160 in the imaging device. The imaging device may further include a diffractive element 160, at least one surface of the diffractive element 160 may include an anti-reflection coating, and the material of the anti-reflection coating of the diffractive element 160 may be aluminum oxide. In this embodiment, the object-side surface 161 of the diffractive element 160 includes an anti-reflection coating, and its detailed structure is shown in FIG. 17C .

藉此,本揭示內容的多光學鏡片之光學鏡頭中,是在面型變化幅度明顯的特定光學鏡片上,以高階鍍膜技術製備抗反射鍍膜,且光學鏡片中心處與周邊處的抗反射鍍膜厚度具有高度一致性,進而達到全視場範圍內均勻一致的抗反射效果,使反射率波形的變化偏移幅度控制在微小範圍內,有助於維持抗反射效率的一致性,並達到多光學鏡片之光學鏡頭的高規格要求與高影像品質。本揭示內容著重在控制光學鏡頭中的鍍膜配置技術,不僅發揮高階鍍膜技術的應用價值,並獲得抗反射鍍膜的最佳製作效果,使大幅度面型變化的光學鏡片,在全視場有效徑範圍內皆獲得一致的抗反射效果,進而減少大角度強光的反射問題,提升整體光學鏡頭的影像品質。Thereby, in the optical lens of the multi-optical lens of the present disclosure, an anti-reflection coating is prepared on a specific optical lens whose surface shape changes significantly, and the anti-reflection coating is prepared by a high-level coating technology, and the thickness of the anti-reflection coating at the center and the periphery of the optical lens is It has a high degree of consistency, so as to achieve a uniform anti-reflection effect in the entire field of view, so that the change and offset of the reflectivity waveform can be controlled within a small range, which helps to maintain the consistency of anti-reflection efficiency and achieve multi-optical lenses. The high specification requirements and high image quality of the optical lens. This disclosure focuses on controlling the coating configuration technology in the optical lens, which not only exerts the application value of the high-level coating technology, but also obtains the best production effect of the anti-reflection coating, so that the optical lens with a large surface change can be used in the full field of view. A consistent anti-reflection effect is obtained within the range, thereby reducing the reflection problem of large-angle strong light and improving the image quality of the overall optical lens.

雖然本揭示內容已以實施例揭露如上,然其並非用以限定本揭示內容,任何熟習此技藝者,在不脫離本揭示內容之精神和範圍內,當可作各種之更動與潤飾,因此本揭示內容之保護範圍當視後附之申請專利範圍所界定者為準。Although the present disclosure has been disclosed above with examples, it is not intended to limit the present disclosure. Anyone skilled in the art can make various changes and modifications without departing from the spirit and scope of the present disclosure. The scope of protection of the disclosed contents shall be determined by the scope of the appended patent application.

110:曲面元件 111,121,161:物側表面 120:光學鏡頭 122:像側表面 130:相位次波長結構 140:成像面 150:電子感光元件 160:繞射元件 T1,T2,T3:谷點 C1,C2:峰點 110: Surface Components 111, 121, 161: Object side surface 120: Optical lens 122: like side surface 130: Phase Subwavelength Structure 140: Imaging plane 150: Electronic photosensitive element 160: Diffractive element T1, T2, T3: Valley point C1,C2: peak point

為讓本揭示內容之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之說明如下: 第1圖為第一實施例的一光學鏡頭的反射率與波長的關係圖; 第2圖為第二實施例的一光學鏡頭的反射率與波長的關係圖; 第3圖為第三實施例的一光學鏡頭的反射率與波長的關係圖; 第4圖為第六實施例的一光學鏡頭的反射率與波長的關係圖; 第5圖為第七實施例的一光學鏡頭的反射率與波長的關係圖; 第6圖為第一比較例的一光學鏡頭的反射率與波長的關係圖; 第7A圖為第一比較例的光學鏡頭於55度入射強光下的鏡頭影像品質測試圖; 第7B圖為第二實施例的光學鏡頭於55度入射強光下的鏡頭影像品質測試圖; 第8A圖為第七實施例的包含抗反射鍍膜的光學鏡片中心處的斷面圖; 第8B圖為第七實施例的包含抗反射鍍膜的光學鏡片周邊處的斷面圖; 第9A圖為第一比較例的光學鏡頭於大角度入射強光下的鏡頭影像品質測試圖; 第9B圖為第十三實施例的光學鏡頭於大角度入射強光下的鏡頭影像品質測試圖; 第10A圖為第一比較例之微透鏡的鏡頭影像品質測試圖; 第10B圖為第十三實施例之微透鏡的鏡頭影像品質測試圖; 第11圖為第二比較例的抗反射元件的反射率與波長的關係圖; 第12圖為第十四實施例的抗反射元件的反射率與波長的關係圖; 第13圖為第十五實施例的抗反射元件的反射率與波長的關係圖; 第14圖為第二比較例的抗反射元件的穿透率與波長的關係圖; 第15圖為第十四實施例的抗反射元件的穿透率與波長的關係圖; 第16圖為本揭示內容之一實施方式的一種取像裝置的示意圖; 第17A圖為第16圖所示之取像裝置於17A處的局部放大示意圖; 第17B圖為第16圖所示之取像裝置於17B處的局部放大示意圖; 第17C圖為第16圖所示之取像裝置及第18圖所示之繞射元件於17C處的局部放大示意圖; 第17D圖為第16圖所示之取像裝置於17D處的局部放大示意圖;以及 第18圖為取像裝置中的一繞射元件的示意圖。 In order to make the above and other objects, features, advantages and embodiments of the present disclosure more clearly understood, the accompanying drawings are described as follows: Fig. 1 is a graph showing the relationship between reflectivity and wavelength of an optical lens according to the first embodiment; Fig. 2 is a graph showing the relationship between reflectivity and wavelength of an optical lens of the second embodiment; FIG. 3 is a graph showing the relationship between reflectivity and wavelength of an optical lens according to the third embodiment; FIG. 4 is a graph showing the relationship between reflectivity and wavelength of an optical lens according to the sixth embodiment; FIG. 5 is a graph showing the relationship between reflectivity and wavelength of an optical lens according to the seventh embodiment; FIG. 6 is a graph showing the relationship between reflectivity and wavelength of an optical lens of the first comparative example; Figure 7A is a test chart of the image quality of the optical lens of the first comparative example under the incident strong light of 55 degrees; FIG. 7B is a test chart of the image quality of the optical lens of the second embodiment under the incident strong light of 55 degrees; FIG. 8A is a cross-sectional view at the center of the optical lens including the anti-reflection coating according to the seventh embodiment; FIG. 8B is a cross-sectional view at the periphery of the optical lens including the anti-reflection coating according to the seventh embodiment; Figure 9A is a test chart of the image quality of the optical lens of the first comparative example under a large-angle incident strong light; Fig. 9B is a test chart of the image quality of the optical lens of the thirteenth embodiment under a large-angle incident strong light; Figure 10A is a test chart of the lens image quality of the microlens of the first comparative example; FIG. 10B is a test chart of the lens image quality of the microlens according to the thirteenth embodiment; Fig. 11 is a graph showing the relationship between the reflectivity and the wavelength of the anti-reflection element of the second comparative example; Fig. 12 is a graph showing the relationship between reflectivity and wavelength of the anti-reflection element of the fourteenth embodiment; Fig. 13 is a graph showing the relationship between the reflectivity and the wavelength of the anti-reflection element of the fifteenth embodiment; FIG. 14 is a graph showing the relationship between the transmittance and the wavelength of the anti-reflection element of the second comparative example; Fig. 15 is a graph showing the relationship between the transmittance and the wavelength of the anti-reflection element of the fourteenth embodiment; FIG. 16 is a schematic diagram of an imaging device according to an embodiment of the disclosure; Fig. 17A is a partially enlarged schematic view of the imaging device shown in Fig. 16 at 17A; Fig. 17B is a partially enlarged schematic view of the imaging device shown in Fig. 16 at 17B; Fig. 17C is a partial enlarged schematic view of the imaging device shown in Fig. 16 and the diffraction element shown in Fig. 18 at 17C; Fig. 17D is a partially enlarged schematic view of the imaging device shown in Fig. 16 at 17D; and FIG. 18 is a schematic diagram of a diffractive element in the imaging device.

Claims (28)

一種光學鏡頭,其由物側至像側包含: 至少四光學鏡片; 其中,至少一該光學鏡片包含一抗反射鍍膜,包含該抗反射鍍膜的該光學鏡片由一塑膠材料所製成,該抗反射鍍膜位於該光學鏡片的物側表面或像側表面,該抗反射鍍膜包含至少一膜層,位於該抗反射鍍膜最外側的該膜層之材質為陶瓷,該抗反射鍍膜包含複數個孔洞,且鄰近該抗反射鍍膜最外側的該些孔洞之尺寸大於鄰近該抗反射鍍膜最內側的該些孔洞之尺寸; 其中,位於該光學鏡片中心處的該抗反射鍍膜的總厚度為Tc,位於該光學鏡片周邊處的該抗反射鍍膜的總厚度為Tp,該光學鏡頭的抗反射鍍膜配置主因子為FAR,其滿足下列條件: |Tc-Tp|/Tc ≤ 5.00%;以及 -1.5 ≤ FAR。 An optical lens comprising from the object side to the image side: at least four optical lenses; Wherein, at least one of the optical lens includes an anti-reflection coating, the optical lens including the anti-reflection coating is made of a plastic material, the anti-reflection coating is located on the object side surface or the image side surface of the optical lens, the anti-reflection coating The coating film includes at least one film layer, the material of the film layer located on the outermost side of the anti-reflection coating film is ceramic, the anti-reflection coating film includes a plurality of holes, and the size of the holes adjacent to the outermost side of the anti-reflective coating film is larger than that adjacent to the anti-reflection coating film. the size of the holes on the innermost side of the reflective coating; Wherein, the total thickness of the anti-reflection coating at the center of the optical lens is Tc, the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp, and the main factor of the anti-reflection coating configuration of the optical lens is FAR, which The following conditions are met: |Tc-Tp|/Tc ≤ 5.00%; and -1.5 ≤ FAR. 如請求項1所述之光學鏡頭,其中該光學鏡頭的抗反射鍍膜配置第一因子為Far1,其滿足下列條件: 0.500 ≤ Far1。 The optical lens of claim 1, wherein the first factor of the anti-reflection coating configuration of the optical lens is Far1, which satisfies the following conditions: 0.500 ≤ Far1. 如請求項2所述之光學鏡頭,其中該光學鏡頭的抗反射鍍膜配置第二因子為Far2,其滿足下列條件: 0.100 ≤ Far2。 The optical lens of claim 2, wherein the second factor of the anti-reflection coating configuration of the optical lens is Far2, which satisfies the following conditions: 0.100 ≤ Far2. 如請求項3所述之光學鏡頭,其中該光學鏡頭的抗反射鍍膜配置第三因子為Far3,其滿足下列條件: 2.5 ≤ Far3。 The optical lens of claim 3, wherein the third factor of the anti-reflection coating configuration of the optical lens is Far3, which satisfies the following conditions: 2.5 ≤ Far3. 如請求項1所述之光學鏡頭,其中該光學鏡片為一基材,該基材的折射率為Ns,其滿足下列條件: Ns ≤ 1.7682。 The optical lens according to claim 1, wherein the optical lens is a substrate, and the refractive index of the substrate is Ns, which satisfies the following conditions: Ns ≤ 1.7682. 如請求項5所述之光學鏡頭,其中位於該抗反射鍍膜最外側的該膜層之材質為氧化鋁(Al 2O 3)。 The optical lens according to claim 5, wherein the material of the film layer on the outermost side of the anti-reflection coating is aluminum oxide (Al 2 O 3 ). 如請求項6所述之光學鏡頭,其中該抗反射鍍膜包含至少三膜層,且該至少三膜層的材質不同。The optical lens of claim 6, wherein the anti-reflection coating comprises at least three layers, and the materials of the at least three layers are different. 如請求項1所述之光學鏡頭,其中該光學鏡片中心處的反射率谷點在一範圍間具有相對較低反射率之波長為Wtc,該光學鏡片周邊處的反射率谷點在一範圍間具有相對較低反射率之波長為Wtp,其滿足下列條件: 0 nm ≤ |Wtc-Wtp| ≤ 25 nm。 The optical lens of claim 1, wherein the reflectance valley point at the center of the optical lens has a relatively low reflectance wavelength in a range of Wtc, and the reflectance valley point at the periphery of the optical lens is within a range The wavelength with relatively low reflectivity is Wtp, which satisfies the following conditions: 0 nm ≤ |Wtc-Wtp| ≤ 25 nm. 如請求項8所述之光學鏡頭,其中該光學鏡片中心處的反射率谷點在一範圍間的相對較低反射率為Rtc,其滿足下列條件: 0% < Rtc ≤ 0.300%。 The optical lens of claim 8, wherein the reflectivity valley point at the center of the optical lens has a relatively low reflectivity Rtc within a range, which satisfies the following conditions: 0% < Rtc ≤ 0.300%. 如請求項9所述之光學鏡頭,其中該光學鏡片周邊處的反射率谷點在一範圍間的相對較低反射率為Rtp,其滿足下列條件: 0% < Rtp ≤ 0.300%。 The optical lens as claimed in claim 9, wherein the reflectivity valley point at the periphery of the optical lens has a relatively low reflectivity Rtp within a range, which satisfies the following conditions: 0% < Rtp ≤ 0.300%. 如請求項1所述之光學鏡頭,其中該光學鏡片中心處的反射率峰點在一範圍間具有相對較高反射率之波長為Wcc,該光學鏡片周邊處的反射率峰點在一範圍間具有相對較高反射率之波長為Wcp,其滿足下列條件: 0 nm ≤ |Wcc-Wcp| ≤ 20 nm。 The optical lens of claim 1, wherein the reflectance peak point at the center of the optical lens has a relatively high reflectance wavelength in a range of Wcc, and the reflectance peak point at the periphery of the optical lens is within a range The wavelength with relatively high reflectivity is Wcp, which satisfies the following conditions: 0 nm ≤ |Wcc-Wcp| ≤ 20 nm. 如請求項11所述之光學鏡頭,其中該光學鏡片中心處的反射率峰點在一範圍間的相對較高反射率為Rcc,其滿足下列條件: 0.200% ≤ Rcc ≤ 0.700%。 The optical lens of claim 11, wherein the reflectance peak point at the center of the optical lens has a relatively high reflectance Rcc within a range, which satisfies the following conditions: 0.200% ≤ Rcc ≤ 0.700%. 如請求項12所述之光學鏡頭,其中該光學鏡片周邊處的反射率峰點在一範圍間的相對較高反射率為Rcp,其滿足下列條件: 0.200% ≤ Rcp ≤ 0.700%。 The optical lens according to claim 12, wherein the reflectance peak point at the periphery of the optical lens has a relatively high reflectance Rcp within a range, which satisfies the following conditions: 0.200% ≤ Rcp ≤ 0.700%. 如請求項1所述之光學鏡頭,其中包含該抗反射鍍膜的該光學鏡片的至少一表面包含至少一反曲點。The optical lens of claim 1, wherein at least one surface of the optical lens comprising the anti-reflection coating comprises at least one inflection point. 如請求項1所述之光學鏡頭,其中該抗反射鍍膜的總層數為tLs,其滿足下列條件: 1 ≤ tLs ≤ 8。 The optical lens of claim 1, wherein the total number of layers of the anti-reflection coating is tLs, which satisfies the following conditions: 1 ≤ tLs ≤ 8. 如請求項1所述之光學鏡頭,其中該抗反射鍍膜的總膜厚為tTk,其滿足下列條件: 200 nm < tTk ≤ 400 nm。 The optical lens of claim 1, wherein the total film thickness of the anti-reflection coating is tTk, which satisfies the following conditions: 200 nm < tTk ≤ 400 nm. 一種取像裝置,包含: 一光學鏡頭,其由物側至像側包含: 至少四光學鏡片; 其中,至少一該光學鏡片包含一抗反射鍍膜,包含該抗反射鍍膜的該光學鏡片由一塑膠材料所製成,該抗反射鍍膜位於該光學鏡片的物側表面或像側表面,該抗反射鍍膜包含至少一膜層,位於該抗反射鍍膜最外側的該膜層之材質為陶瓷,該抗反射鍍膜包含複數個孔洞,且鄰近該抗反射鍍膜最外側的該些孔洞之尺寸大於鄰近該抗反射鍍膜最內側的該些孔洞之尺寸; 其中,位於該光學鏡片中心處的該抗反射鍍膜的總厚度為Tc,位於該光學鏡片周邊處的該抗反射鍍膜的總厚度為Tp,該光學鏡頭的抗反射鍍膜配置主因子為FAR,其滿足下列條件: |Tc-Tp|/Tc ≤ 5.00%;以及 -1.5 ≤ FAR; 一繞射元件,其至少一表面包含一抗反射鍍膜,該繞射元件的該抗反射鍍膜之材質為氧化鋁;以及 一電子感光元件,其設置於該光學鏡頭的一成像面。 An imaging device, comprising: An optical lens, which includes from the object side to the image side: at least four optical lenses; Wherein, at least one of the optical lens includes an anti-reflection coating, the optical lens including the anti-reflection coating is made of a plastic material, the anti-reflection coating is located on the object side surface or the image side surface of the optical lens, the anti-reflection coating The coating film includes at least one film layer, the material of the film layer located on the outermost side of the anti-reflection coating film is ceramic, the anti-reflection coating film includes a plurality of holes, and the size of the holes adjacent to the outermost side of the anti-reflective coating film is larger than that adjacent to the anti-reflection coating film. the size of the holes on the innermost side of the reflective coating; Wherein, the total thickness of the anti-reflection coating at the center of the optical lens is Tc, the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp, and the main factor of the anti-reflection coating configuration of the optical lens is FAR, which The following conditions are met: |Tc-Tp|/Tc ≤ 5.00%; and -1.5 ≤ FAR; a diffractive element, at least one surface of which includes an anti-reflection coating, and the material of the anti-reflection coating of the diffractive element is aluminum oxide; and An electronic photosensitive element is arranged on an imaging surface of the optical lens. 一種取像裝置,包含: 一光學鏡頭,其由物側至像側包含: 至少四光學鏡片; 其中,至少一該光學鏡片包含一抗反射鍍膜,包含該抗反射鍍膜的該光學鏡片由一塑膠材料所製成,該抗反射鍍膜位於該光學鏡片的物側表面或像側表面,該抗反射鍍膜包含至少一膜層,位於該抗反射鍍膜最外側的該膜層之材質為陶瓷,該抗反射鍍膜包含複數個孔洞,且鄰近該抗反射鍍膜最外側的該些孔洞之尺寸大於鄰近該抗反射鍍膜最內側的該些孔洞之尺寸; 其中,位於該光學鏡片中心處的該抗反射鍍膜的總厚度為Tc,位於該光學鏡片周邊處的該抗反射鍍膜的總厚度為Tp,該光學鏡頭的抗反射鍍膜配置主因子為FAR,其滿足下列條件: |Tc-Tp|/Tc ≤ 5.00%;以及 -1.5 ≤ FAR; 一曲面元件,其至少一表面包含一相位次波長結構;以及 一電子感光元件,其設置於該光學鏡頭的一成像面。 An imaging device, comprising: An optical lens, which includes from the object side to the image side: at least four optical lenses; Wherein, at least one of the optical lens includes an anti-reflection coating, the optical lens including the anti-reflection coating is made of a plastic material, the anti-reflection coating is located on the object side surface or the image side surface of the optical lens, the anti-reflection coating The coating film includes at least one film layer, the material of the film layer located on the outermost side of the anti-reflection coating film is ceramic, the anti-reflection coating film includes a plurality of holes, and the size of the holes adjacent to the outermost side of the anti-reflective coating film is larger than that adjacent to the anti-reflection coating film. the size of the holes on the innermost side of the reflective coating; Wherein, the total thickness of the anti-reflection coating at the center of the optical lens is Tc, the total thickness of the anti-reflection coating at the periphery of the optical lens is Tp, and the main factor of the anti-reflection coating configuration of the optical lens is FAR, which The following conditions are met: |Tc-Tp|/Tc ≤ 5.00%; and -1.5 ≤ FAR; a curved element, at least one surface of which includes a phase subwavelength structure; and An electronic photosensitive element is arranged on an imaging surface of the optical lens. 一種電子裝置,係為一行動裝置,該電子裝置包含: 如請求項17所述的取像裝置。 An electronic device, which is a mobile device, includes: The imaging device of claim 17. 一種光學鏡頭,其由物側至像側包含: 至少一光學鏡片;以及 至少一抗反射元件; 其中,至少一該抗反射元件的至少一表面包含一抗反射鍍膜,包含該抗反射鍍膜的該抗反射元件由一玻璃材料所製成,該抗反射鍍膜包含至少二膜層,最靠近該抗反射元件的一基材的其中一該膜層為一第一膜層,且該第一膜層的折射率小於該基材的折射率; 其中,位於該抗反射鍍膜最外側的該膜層的主要材質為氧化鋁,該抗反射鍍膜包含複數個孔洞,鄰近該抗反射鍍膜最外側的該些孔洞之尺寸大於鄰近該抗反射鍍膜最內側的該些孔洞之尺寸,且最外側的該膜層具有漸變的折射率; 其中,該抗反射鍍膜的總膜厚為tTk,其滿足下列條件: 200 nm < tTk ≤ 400 nm。 An optical lens comprising from the object side to the image side: at least one optical lens; and at least one anti-reflection element; Wherein, at least one surface of at least one of the anti-reflection elements includes an anti-reflection coating, the anti-reflection element including the anti-reflection coating is made of a glass material, and the anti-reflection coating includes at least two layers, which are closest to the anti-reflection coating. One of the film layers of a base material of the reflective element is a first film layer, and the refractive index of the first film layer is smaller than the refractive index of the base material; Wherein, the main material of the film layer located on the outermost side of the anti-reflection coating is aluminum oxide, the anti-reflection coating includes a plurality of holes, and the size of the holes adjacent to the outermost side of the anti-reflection coating is larger than that adjacent to the innermost side of the anti-reflection coating the size of the holes, and the outermost layer has a graded index of refraction; Wherein, the total film thickness of the anti-reflection coating is tTk, which satisfies the following conditions: 200 nm < tTk ≤ 400 nm. 如請求項20所述之光學鏡頭,其中該基材為一平板元件。The optical lens of claim 20, wherein the substrate is a flat panel element. 如請求項21所述之光學鏡頭,其中該基材於光軸上的厚度為CTs,其滿足下列條件: 0.15 mm < CTs ≤ 0.60 mm。 The optical lens of claim 21, wherein the thickness of the substrate on the optical axis is CTs, which satisfies the following conditions: 0.15 mm < CTs ≤ 0.60 mm. 如請求項22所述之光學鏡頭,其中該光學鏡頭的抗反射鍍膜配置第三因子為Far3,其滿足下列條件: 1.0 ≤ Far3 ≤ 5.0。 The optical lens of claim 22, wherein the third factor of the anti-reflection coating configuration of the optical lens is Far3, which satisfies the following conditions: 1.0 ≤ Far3 ≤ 5.0. 如請求項23所述之光學鏡頭,其中該基材於波長400 nm - 630 nm的平均反射率為R4063,其滿足下列條件: 0% ≤ R4063 ≤ 1.3%。 The optical lens of claim 23, wherein the average reflectance of the substrate at wavelengths of 400 nm - 630 nm is R4063, which satisfies the following conditions: 0% ≤ R4063 ≤ 1.3%. 如請求項24所述之光學鏡頭,其中該基材於波長670 nm - 1000 nm的平均反射率為R67100,其滿足下列條件: 0% ≤ R67100 ≤ 3.0%。 The optical lens of claim 24, wherein the average reflectance of the substrate at wavelengths of 670 nm - 1000 nm is R67100, which satisfies the following conditions: 0% ≤ R67100 ≤ 3.0%. 如請求項25所述之光學鏡頭,其中該基材於波長400 nm - 600 nm的平均穿透率為T4060,其滿足下列條件: 95% ≤ T4060 ≤ 100%。 The optical lens of claim 25, wherein the average transmittance of the substrate at wavelengths of 400 nm - 600 nm is T4060, which satisfies the following conditions: 95% ≤ T4060 ≤ 100%. 如請求項26所述之光學鏡頭,其中該抗反射鍍膜具有一第二膜層,該第二膜層的折射率大於該第一膜層的折射率,該第二膜層的折射率大於該基材的折射率,且最外側的該膜層的折射率等效小於該第一膜層與該基材的折射率。The optical lens of claim 26, wherein the anti-reflection coating has a second film layer, the refractive index of the second film layer is greater than the refractive index of the first film layer, and the refractive index of the second film layer is greater than the refractive index of the second film layer The refractive index of the substrate, and the refractive index of the outermost film layer is equivalently smaller than the refractive index of the first film layer and the substrate. 如請求項20所述之光學鏡頭,其中該基材為一微透鏡。The optical lens of claim 20, wherein the substrate is a microlens.
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