TW202221073A - Method for manufacturing multilayer film, and multilayer film - Google Patents

Method for manufacturing multilayer film, and multilayer film Download PDF

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TW202221073A
TW202221073A TW110131834A TW110131834A TW202221073A TW 202221073 A TW202221073 A TW 202221073A TW 110131834 A TW110131834 A TW 110131834A TW 110131834 A TW110131834 A TW 110131834A TW 202221073 A TW202221073 A TW 202221073A
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polymer
film
polymer layer
laminated film
liquid composition
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結城創太
笠井渉
山邊敦美
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日商Agc股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/0427Coating with only one layer of a composition containing a polymer binder
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/28Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • B32B27/281Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polyimides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F214/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
    • C08F214/18Monomers containing fluorine
    • C08F214/26Tetrafluoroethene
    • C08F214/262Tetrafluoroethene with fluorinated vinyl ethers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C08L27/18Homopolymers or copolymers or tetrafluoroethene
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/65Additives macromolecular
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00Coating on the layer surface
    • B32B2255/10Coating on the layer surface on synthetic resin layer or on natural or synthetic rubber layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00Coating on the layer surface
    • B32B2255/26Polymeric coating
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2379/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
    • C08J2379/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08J2379/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
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  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Laminated Bodies (AREA)

Abstract

To provide: a multilayer film that has excellent adhesion and includes a polymer layer for which the ratio of the thickness of an end relative to the thickness of the center is adjusted to a prescribed range; and a method for manufacturing the same. A multilayer film according to the present invention comprises: a polymer film having a surface that has been treated to enhance the surface tension of the polymer film; and a polymer layer which is formed on the surface of the polymer film and contains a tetrafluoroethylene polymer. The ratio of the thickness of an end of the polymer layer relative to the thickness of the center of the polymer layer is 1.1 or lower. The method for manufacturing the multilayer film is characterized by: coating a surface of a polymer film, that has been treated to enhance surface tension, with a liquid composition containing tetrafluoroethylene polymer powder and a liquid dispersion medium having a surface tension of at least 30 mN/m, the content of the powder being at least 10% by mass; and then heating the coating, to obtain a multilayer film on which a polymer layer is formed on the surface of the polymer film.

Description

積層膜之製造方法及積層膜Manufacturing method of laminated film and laminated film

本發明係關於一種獲得積層膜的積層膜之製造方法,上述積層膜係於實施了提高表面張力之處理之聚合物膜之表面具備聚合物層,上述聚合物層係使用含有具有特定表面張力之液狀分散介質之液狀組合物形成,且端部之厚度之增大得到降低;又,本發明係關於一種積層膜,其具備端部之厚度相對於中央部之厚度之比被調整至特定範圍的聚合物層。The present invention relates to a method for producing a laminated film, wherein the laminated film is provided with a polymer layer on the surface of a polymer film subjected to a treatment to increase the surface tension, and the above-mentioned polymer layer is obtained by using a compound having a specific surface tension. The liquid composition of the liquid dispersion medium is formed, and the increase in the thickness of the end portion is reduced; and the present invention relates to a laminated film having a ratio of the thickness of the end portion to the thickness of the central portion adjusted to a specific value range of polymer layers.

對於傳輸高頻信號所使用之印刷基板,要求具有優異之傳輸特性。作為傳輸特性較高之印刷基板之絕緣層材料,相對介電常數及介電損耗因數較低之四氟乙烯系聚合物受到關注。作為形成包含此種聚合物之絕緣層之材料,已知有包含四氟乙烯系聚合物之粉末及液狀分散介質之液狀組合物。 於專利文獻1及2中記載有一種積層膜,其係將此種液狀組合物塗佈於聚醯亞胺膜之表面並進行加熱而形成,且於聚醯亞胺膜之兩面具備四氟乙烯系聚合物層。 先前技術文獻 專利文獻 For the printed circuit board used for transmitting high frequency signals, it is required to have excellent transmission characteristics. As an insulating layer material of a printed circuit board with high transmission properties, tetrafluoroethylene-based polymers with low relative permittivity and low dielectric dissipation factor have been attracting attention. As a material for forming an insulating layer containing such a polymer, a liquid composition containing a powder of a tetrafluoroethylene-based polymer and a liquid dispersion medium is known. Patent Documents 1 and 2 describe a laminate film formed by applying such a liquid composition to the surface of a polyimide film, heating it, and having tetrafluoroethylene on both sides of the polyimide film. Vinyl polymer layer. prior art literature Patent Literature

專利文獻1:日本專利特開平9-157418號公報 專利文獻2:日本專利特開2005-35300號公報 Patent Document 1: Japanese Patent Laid-Open No. 9-157418 Patent Document 2: Japanese Patent Laid-Open No. 2005-35300

[發明所欲解決之問題][Problems to be Solved by Invention]

另一方面,由於四氟乙烯系聚合物為非黏著性,故而此種積層膜中之聚醯亞胺膜與四氟乙烯系聚合物層之密接性一般較低。因此,本發明人等嘗試藉由聚醯亞胺膜之表面處理來提昇積層膜之密接性。然而,於該情形時,本發明人等新發現了積層膜之厚度容易產生不均之問題,尤其是積層膜之端部容易產生隆起之問題。因此,本發明人等亦新發現了如下問題:若將此種積層膜之長條體捲取成輥狀,則積層膜產生皺褶或伸長,導致作為印刷基板材料等使用時之良率變差。On the other hand, since the tetrafluoroethylene-based polymer is non-adhesive, the adhesion between the polyimide film and the tetrafluoroethylene-based polymer layer in such a laminate film is generally low. Therefore, the present inventors attempted to improve the adhesiveness of the laminated film by surface treatment of the polyimide film. However, in this case, the inventors of the present invention newly discovered a problem that the thickness of the laminated film tends to be uneven, and in particular, that the edge of the laminated film is prone to bulge. Therefore, the inventors of the present invention have also newly discovered the following problem: when the elongated body of such a laminated film is wound into a roll shape, the laminated film will be wrinkled or stretched, resulting in a decrease in yield when used as a printed circuit board material or the like. Difference.

本發明人等進行銳意研究,結果發現:包含表面張力為特定範圍之液狀分散介質之液狀組合物的分散穩定性亦優異,於實施了提高表面張力之處理之聚合物膜之表面更均勻地潤濕擴散,可形成厚度不均較小且密接強度較高之積層膜。 本發明係基於此種發現而完成之發明,其目的在於提供一種具有聚合物層之積層膜及其製造方法,上述聚合物層之密接性優異,且端部之厚度相對於中央部之厚度之比被調整至特定範圍。 [解決問題之技術手段] As a result of intensive research conducted by the present inventors, it was found that a liquid composition comprising a liquid dispersion medium having a surface tension in a specific range also has excellent dispersion stability and is more uniform on the surface of a polymer film subjected to a treatment to increase the surface tension. It can form a laminated film with less uneven thickness and high adhesion strength. The present invention has been accomplished based on such findings, and an object of the present invention is to provide a laminated film having a polymer layer having excellent adhesiveness and a difference between the thickness of the end portion and the thickness of the central portion, and a method for producing the same. The ratio is adjusted to a specific range. [Technical means to solve problems]

本發明具有下述態樣。 <1>一種積層膜之製造方法,其係於實施了提高表面張力之處理之聚合物膜之表面塗佈液狀組合物,進行加熱,獲得於上述聚合物膜之表面形成有聚合物層之積層膜,上述液狀組合物含有四氟乙烯系聚合物之粉末及表面張力為30 mN/m以上之液狀分散介質,且上述粉末之含量為10質量%以上。 <2>如<1>之製造方法,其中上述處理係選自由電暈處理及電漿處理所組成之群中之至少一種親水化處理。 <3>如<1>或<2>之製造方法,其中實施了上述處理之上述聚合物膜之表面之表面張力大於上述液狀分散介質之表面張力。 <4>如<1>至<3>中任一項之製造方法,其中上述聚合物膜之表面之算術平均粗糙度Ra為0.01~5 μm。 <5>如<1>至<4>中任一項之製造方法,其中於實施了上述處理之上述聚合物膜之表面存在極性官能基。 <6>如<1>至<5>中任一項之製造方法,其中上述粉末之平均粒徑為0.1~10 μm。 <7>如<1>至<6>中任一項之製造方法,其中上述四氟乙烯系聚合物係熔融溫度為260~320℃之四氟乙烯系聚合物。 <8>如<1>至<7>中任一項之製造方法,其中上述四氟乙烯系聚合物係包含基於全氟(烷基乙烯基醚)之單元,且相對於所有單元包含1.5~5.0莫耳%之基於全氟(烷基乙烯基醚)之單元的四氟乙烯系聚合物。 <9>如<1>至<8>中任一項之製造方法,其中上述液狀組合物含有芳香族聚合物。 <10>如<1>至<9>中任一項之製造方法,其中上述聚合物膜含有芳香族聚醯亞胺。 <11>如<1>至<10>中任一項之製造方法,其中上述聚合物膜之平均厚度為10 μm以上,且上述聚合物層之平均厚度為10 μm以上。 <12>一種積層膜,其具備:聚合物膜,其具有實施了提高表面張力之處理之表面;及聚合物層,其形成於上述表面並含有四氟乙烯系聚合物,且上述聚合物層之端部之厚度相對於中央部之厚度之比為1.1以下。 <13>如<12>之積層膜,其中將上述積層膜於50℃、48小時之條件下預乾燥後,於23℃之純水中浸漬24小時,測定於上述純水中浸漬前後之上述積層膜之質量時,基於下式所求出之吸水率為0.1%以下。 吸水率(%)=(純水浸漬後質量-預乾燥後質量)/預乾燥後質量×100 <14>如<12>或<13>之積層膜,其中上述聚合物膜之平均厚度為10 μm以上,且上述聚合物層之平均厚度為10 μm以上。 <15>如<12>至<14>中任一項之積層膜,其中於上述聚合物膜之兩面具備上述聚合物層。 [發明之效果] The present invention has the following aspects. <1> A method for producing a laminated film, comprising coating a liquid composition on the surface of a polymer film subjected to a treatment for increasing surface tension, and heating to obtain a polymer film having a polymer layer formed on the surface of the polymer film. In the laminated film, the liquid composition contains a powder of a tetrafluoroethylene-based polymer and a liquid dispersion medium having a surface tension of 30 mN/m or more, and the content of the powder is 10 mass % or more. <2> The production method according to <1>, wherein the treatment is at least one type of hydrophilization treatment selected from the group consisting of corona treatment and plasma treatment. <3> The production method according to <1> or <2>, wherein the surface tension of the surface of the polymer film subjected to the above treatment is greater than the surface tension of the liquid dispersion medium. <4> The production method according to any one of <1> to <3>, wherein the arithmetic mean roughness Ra of the surface of the polymer film is 0.01 to 5 μm. <5> The production method according to any one of <1> to <4>, wherein a polar functional group is present on the surface of the polymer film subjected to the above treatment. <6> The production method according to any one of <1> to <5>, wherein the average particle diameter of the powder is 0.1 to 10 μm. <7> The production method according to any one of <1> to <6>, wherein the tetrafluoroethylene-based polymer is a tetrafluoroethylene-based polymer having a melting temperature of 260 to 320°C. <8> The production method according to any one of <1> to <7>, wherein the tetrafluoroethylene-based polymer contains units based on perfluoro(alkyl vinyl ether), and contains 1.5 to 1.5 to 5.0 mol% of tetrafluoroethylene-based polymer based on perfluoro(alkyl vinyl ether) units. <9> The production method according to any one of <1> to <8>, wherein the liquid composition contains an aromatic polymer. <10> The production method according to any one of <1> to <9>, wherein the polymer film contains an aromatic polyimide. <11> The production method according to any one of <1> to <10>, wherein the average thickness of the polymer film is 10 μm or more, and the average thickness of the polymer layer is 10 μm or more. <12> A laminated film comprising: a polymer film having a surface treated to increase surface tension; and a polymer layer formed on the surface and containing a tetrafluoroethylene-based polymer, and the polymer layer The ratio of the thickness of the end portion to the thickness of the central portion is 1.1 or less. <13> The laminated film according to <12>, wherein the above-mentioned laminated film is pre-dried at 50° C. for 48 hours, and then immersed in pure water at 23° C. for 24 hours, and the above-mentioned values before and after immersion in the above-mentioned pure water are measured. In the case of the mass of the laminated film, the water absorption rate calculated based on the following formula is 0.1% or less. Water absorption rate (%) = (mass after pure water immersion - mass after pre-drying) / mass after pre-drying × 100 <14> The laminated film according to <12> or <13>, wherein the average thickness of the polymer film is 10 μm or more, and the average thickness of the polymer layer is 10 μm or more. <15> The laminate film according to any one of <12> to <14>, wherein the polymer film is provided on both surfaces of the polymer film. [Effect of invention]

根據本發明,提供一種具備聚合物層之積層膜,上述聚合物層之密接性優異,且端部之厚度相對於中央部之厚度之比經調整為特定範圍。ADVANTAGE OF THE INVENTION According to this invention, the laminated film provided with the polymer layer is excellent in adhesiveness, and the ratio of the thickness of an edge part with respect to the thickness of a center part is adjusted to a specific range.

以下用語具有以下含義。 「平均粒徑(D50)」係藉由雷射繞射散射法求出之對象物(粉末或無機填料)之體積基準累積50%粒徑。即,平均粒徑(D50)係藉由雷射繞射散射法測定對象物之粒度分佈,將對象物之粒子之集合體之總體積設為100%而求出累積曲線,於該累積曲線上累積體積成為50%之點之粒徑。 「D90」係以相同之方式測得之對象物之體積基準累積90%粒徑。 「熔融溫度(熔點)」係藉由示差掃描熱量測定(DSC)法測得之聚合物之熔解峰之最大值所對應的溫度。 「玻璃轉移點(Tg)」係藉由動態黏彈性測定(DMA)法分析聚合物並進行測定所得之值。 「比表面積」係藉由氣體吸附(定容法)BET多點法,使用NOVA4200e(Quantachrome Instruments公司製造)測定粉末時所求出之值。 「黏度」係使用B型黏度計,於25℃下於轉速為30 rpm之條件下,測定液狀組合物所求出之值。將測定反覆進行3次,設為3次測定值之平均值。 「觸變比」係對於液狀組合物,於轉速為30 rpm之條件下進行測定而求出黏度η 1,於轉速為60 rpm之條件下進行測定而求出黏度η 2,將黏度η 1除以黏度η 2算出之值(η 12)。 「降伏強度」意指當應變變大時,應變與應力之關係不成正比,開始產生即便去除應力亦殘留應變之現象的應力,且係以根據ASTM D882測定膜之拉伸彈性模數時之「5%應變時應力」之值來規定。 「難塑性變形性」意指使支持層發生塑性變形時應力增加之特性、或塑性變形時所需之應力較大之特性,且係以根據ASTM D882測定膜之拉伸彈性模數時之「15%應變時應力」之值來規定。 「拉伸彈性模數」係使用廣域黏彈性測定裝置,於測定頻率10 Hz下測定膜時之值。 「平均厚度」係藉由接觸式厚度計DG-525H(小野測器公司製造),使用測定頭AA-026(ϕ10 mm,SR7),測定10處膜之厚度所得之測定值的平均值。 「金屬箔(金屬基板)之表面之十點平均粗糙度(Rzjis)」係JIS B 0601:2013(ISO 4287:1997,Amd.1:2009)之附件JA中規定之值。 「算術平均粗糙度Ra」係根據JIS B 0601:2013(ISO 4287:1997,Amd.1:2009)測得之膜之表面之值。 聚合物中之「單元」可為由單體直接形成之原子團,亦可為藉由特定方法對所獲得之聚合物進行處理,從而一部分結構得到轉化後而成之原子團。將聚合物中所包含之基於單體A之單元亦簡稱為「單體A單元」。 The following terms have the following meanings. "Average particle size (D50)" is the volume-based cumulative 50% particle size of the object (powder or inorganic filler) determined by the laser diffraction scattering method. That is, the average particle diameter (D50) is obtained by measuring the particle size distribution of the object by the laser diffraction scattering method, and taking the total volume of the aggregate of the particles of the object as 100% to obtain a cumulative curve, and on the cumulative curve The particle size at the point where the cumulative volume becomes 50%. "D90" is the volume-based cumulative 90% particle size of the object measured in the same manner. The "melting temperature (melting point)" is the temperature corresponding to the maximum value of the melting peak of the polymer measured by differential scanning calorimetry (DSC). "Glass transition point (Tg)" is a value obtained by analyzing and measuring the polymer by dynamic viscoelasticity measurement (DMA). The "specific surface area" is a value obtained when the powder is measured by the gas adsorption (constant volume method) BET multipoint method using NOVA4200e (manufactured by Quantachrome Instruments). "Viscosity" is a value obtained by measuring the liquid composition at 25°C under the condition of a rotational speed of 30 rpm using a Brookfield viscometer. The measurement was repeated three times, and the average value of the three measurements was taken. The "thixotropy ratio" means that the viscosity η 1 is obtained by measuring the liquid composition at a rotational speed of 30 rpm, and the viscosity η 2 is obtained by measuring at a rotational speed of 60 rpm. The value calculated by dividing by the viscosity η 212 ). "Yield strength" means that when the strain becomes large, the relationship between the strain and the stress is not proportional to the stress that begins to generate the phenomenon that the strain remains even after the stress is removed, and is defined as "the tensile modulus of elasticity of the film measured according to ASTM D882" Stress at 5% strain" is specified. "Refractory plastic deformation" means the property of increasing the stress when the support layer is plastically deformed, or the property of requiring a large stress when plastically deforming, and is defined as "15" when the tensile modulus of elasticity of the film is measured according to ASTM D882. % strain stress". The "tensile elastic modulus" is a value when the film is measured at a measurement frequency of 10 Hz using a wide-area viscoelasticity measuring device. "Average thickness" is the average value of the measured values obtained by measuring the thickness of the film at 10 locations with a contact thickness gauge DG-525H (manufactured by Ono Shoki Co., Ltd.) using a measuring head AA-026 (ϕ10 mm, SR7). "The ten-point average roughness (Rzjis) of the surface of metal foil (metal substrate)" is the value specified in Annex JA of JIS B 0601:2013 (ISO 4287:1997, Amd.1:2009). "Arithmetic mean roughness Ra" is the value of the surface of the film measured according to JIS B 0601:2013 (ISO 4287:1997, Amd.1:2009). The "unit" in the polymer may be an atomic group directly formed from a monomer, or an atomic group obtained by processing the obtained polymer by a specific method, so that a part of the structure is converted. The unit based on the monomer A contained in the polymer is also simply referred to as "monomer A unit".

本發明之製造方法(以下,亦記為「本法」)係於實施了提高表面張力之處理之聚合物膜之表面塗佈液狀組合物,進行加熱,獲得於聚合物膜之表面形成有聚合物層之積層膜的方法,上述液狀組合物含有四氟乙烯系聚合物(以下,亦記為「F聚合物」)之粉末及表面張力為30 mN/m以上之液狀分散介質,且F聚合物之粉末(以下,亦記為「F粉末」)之含量為10質量%以上。 因此,所獲得之積層膜係具有聚合物膜及聚合物層之積層體,上述聚合物膜具有實施了提高表面張力之處理之表面,上述聚合物層形成於上述表面並含有F聚合物。於此種積層膜中,聚合物層之端部之厚度相對於中央部之厚度之比處於特定範圍(較佳為1.1以下)。即,聚合物層之厚度之不均變小。其原因雖不一定明確,但認為如下。 In the production method of the present invention (hereinafter, also referred to as "this method"), a liquid composition is applied to the surface of a polymer film subjected to a treatment for increasing the surface tension, followed by heating to obtain a polymer film with a A method for a laminated film of a polymer layer, wherein the liquid composition contains a powder of a tetrafluoroethylene-based polymer (hereinafter, also referred to as "F polymer") and a liquid dispersion medium having a surface tension of 30 mN/m or more, In addition, the content of the powder of the F polymer (hereinafter, also referred to as "F powder") is 10% by mass or more. Therefore, the obtained laminate film has a laminate of a polymer film and a polymer layer, the polymer film has a surface treated to increase the surface tension, and the polymer layer is formed on the surface and contains the F polymer. In such a laminated film, the ratio of the thickness of the edge part of a polymer layer with respect to the thickness of the center part exists in a specific range (preferably 1.1 or less). That is, the unevenness of the thickness of the polymer layer is reduced. The reason for this is not necessarily clear, but is considered as follows.

於本法中,為了提昇聚合物膜與聚合物層之密接性,而於塗佈液狀組合物之前,對聚合物膜之表面實施提高其表面張力之處理。但是,若於實施了此種處理之聚合物膜之表面塗佈包含F粉末之液狀組合物,則於自中央部向端部流動而潤濕擴散時,有時會產生該流動於端部附近停止之現象(釘紮現象),而導致塗膜隆起。若於該狀態下加熱塗膜(液狀組合物),則端部之形狀得以維持,所獲得之聚合物層之端部之厚度大於中央部之厚度。 因此,於本法中,使用含有表面張力為30 mN/m以上之液狀分散介質之液狀組合物。藉此,認為液狀組合物對聚合物膜表面之潤濕性提高,而均勻地潤濕擴散至聚合物膜之端部,從而所獲得之聚合物層之厚度之不均變小。 In this method, in order to improve the adhesiveness between the polymer film and the polymer layer, before coating the liquid composition, the surface of the polymer film is treated to increase the surface tension. However, when a liquid composition containing F powder is applied to the surface of the polymer film subjected to such a treatment, when the liquid composition flows from the central portion to the end portion and wets and spreads, the flow may occur at the end portion. A phenomenon that stops nearby (pinning phenomenon), causing the coating film to bulge. When the coating film (liquid composition) is heated in this state, the shape of the end portion is maintained, and the thickness of the end portion of the obtained polymer layer is larger than the thickness of the central portion. Therefore, in this method, a liquid composition containing a liquid dispersion medium having a surface tension of 30 mN/m or more is used. From this, it is considered that the wettability of the liquid composition to the surface of the polymer film is improved, and the uniform wetting spreads to the end of the polymer film, thereby reducing the unevenness of the thickness of the obtained polymer layer.

本法中之F聚合物係包含基於四氟乙烯(TFE)之單元(TFE單元)之聚合物。 F聚合物較佳為熱熔融性,其熔融溫度較佳為260~320℃,更佳為285~320℃。若使用此種F聚合物,則容易形成緻密且密接性優異之聚合物層,容易獲得耐熱性優異之積層膜。 F聚合物之玻璃轉移點(Tg)較佳為75~125℃,更佳為80~100℃。 F聚合物之熔融黏度於380℃下較佳為1×10 2~1×10 6Pa・s,更佳為1×10 3~1×10 6Pa・s。 The F polymers in this process are polymers comprising tetrafluoroethylene (TFE) based units (TFE units). The F polymer is preferably thermally fusible, and its melting temperature is preferably 260 to 320°C, more preferably 285 to 320°C. When such an F polymer is used, it becomes easy to form the polymer layer which is dense and excellent in adhesiveness, and it becomes easy to obtain the laminated film which is excellent in heat resistance. The glass transition point (Tg) of the F polymer is preferably 75 to 125°C, more preferably 80 to 100°C. The melt viscosity of the F polymer at 380° C. is preferably 1×10 2 to 1×10 6 Pa·s, more preferably 1×10 3 to 1×10 6 Pa·s.

F聚合物之表面張力較佳為16~26 mN/m,更佳為16~20 mN/m。再者,F聚合物之表面張力可於由F聚合物製作之平板上載置JIS K 6768所規定之潤濕張力試驗用混合液(和光純藥公司製造)之液滴而進行測定。 F聚合物之氟含量較佳為70質量%以上,更佳為72~76質量%。 表面張力較低且氟含量較高之F聚合物雖然電物性等物性優異,但另一方面,於液狀組合物中之分散穩定性明顯較低,而本法中之液狀組合物藉由使用上述液狀分散介質,此種F聚合物之分散穩定性會改善。 The surface tension of the F polymer is preferably 16-26 mN/m, more preferably 16-20 mN/m. In addition, the surface tension of the F polymer can be measured by placing a droplet of the mixed solution (manufactured by Wako Pure Chemical Industries, Ltd.) for a wetting tension test specified in JIS K 6768 on a flat plate made of the F polymer. The fluorine content of the F polymer is preferably 70% by mass or more, more preferably 72 to 76% by mass. Although the F polymer with low surface tension and high fluorine content is excellent in electrical properties and other physical properties, on the other hand, the dispersion stability in the liquid composition is obviously low, and the liquid composition in this method is obtained by Using the above-mentioned liquid dispersion medium, the dispersion stability of the F polymer is improved.

作為F聚合物,可例舉:聚四氟乙烯(PTFE)、包含TFE單元及基於乙烯之單元之聚合物、包含TFE單元及基於丙烯之單元之聚合物、包含TFE單元及基於全氟(烷基乙烯基醚)(PAVE)之單元(PAVE單元)之聚合物(PFA)、包含TFE單元及基於六氟丙烯之單元之聚合物(FEP)、包含TFE單元及基於氟烷基乙烯之單元之聚合物、包含TFE單元及基於三氟氯乙烯之單元之聚合物,較佳為PFA或FEP,更佳為PFA。上述聚合物可進而包含基於其他共聚單體之單元。 作為PAVE,較佳為CF 2=CFOCF 3、CF 2=CFOCF 2CF 3或CF 2=CFOCF 2CF 2CF 3(以下,亦記為「PPVE」),更佳為PPVE。 As the F polymer, polytetrafluoroethylene (PTFE), a polymer containing a TFE unit and an ethylene-based unit, a polymer containing a TFE unit and a propylene-based unit, a TFE unit and a perfluoro(alkane-based) polymer may be exemplified. Polyvinyl ether) (PAVE) units (PAVE units) polymers (PFA), polymers comprising TFE units and hexafluoropropylene-based units (FEP), TFE units and fluoroalkylethylene-based units The polymer, the polymer comprising TFE units and chlorotrifluoroethylene-based units, is preferably PFA or FEP, more preferably PFA. The abovementioned polymers may further comprise units based on other comonomers. As PAVE, CF 2 =CFOCF 3 , CF 2 =CFOCF 2 CF 3 , or CF 2 =CFOCF 2 CF 2 CF 3 (hereinafter, also referred to as "PPVE") is preferable, and PPVE is more preferable.

F聚合物較佳為具有極性官能基。於該情形時,容易使聚合物層之電特性、表面平滑性等物性優異。 極性官能基可包含於F聚合物所含有之單元中,亦可包含於F聚合物主鏈之末端基中。作為後者之F聚合物,可例舉:作為源自聚合起始劑、鏈轉移劑等之末端基具有極性官能基之聚合物;或者藉由電漿處理或電離輻射處理所製備之具有極性官能基之聚合物。 The F polymer preferably has polar functional groups. In this case, it is easy to make the polymer layer excellent in physical properties such as electrical properties and surface smoothness. The polar functional group may be included in the unit contained in the F polymer, or may be included in the terminal group of the F polymer main chain. Examples of the latter F polymer include polymers having polar functional groups as terminal groups derived from polymerization initiators, chain transfer agents, etc.; or polymers having polar functional groups prepared by plasma treatment or ionizing radiation treatment. base polymer.

作為極性官能基,較佳為含羥基之基、含羰基之基及含膦醯基之基,更佳為含羥基之基及含羰基之基,進而較佳為含羰基之基。 作為含羥基之基,較佳為含醇性羥基之基,更佳為-CF 2CH 2OH、-C(CF 3) 2OH及1,2-二醇基(-CH(OH)CH 2OH)。 作為含羰基之基,較佳為羧基、烷氧基羰基、醯胺基、異氰酸基、胺基甲酸酯基(-OC(O)NH 2)、酸酐殘基(-C(O)OC(O)-)、醯亞胺殘基(-C(O)NHC(O)-等)及碳酸酯基(-OC(O)O-),更佳為酸酐殘基。 The polar functional group is preferably a hydroxyl group-containing group, a carbonyl group-containing group, and a phosphonium group-containing group, more preferably a hydroxyl group-containing group and a carbonyl group-containing group, and still more preferably a carbonyl group-containing group. The hydroxyl group-containing group is preferably an alcoholic hydroxyl group-containing group, more preferably -CF 2 CH 2 OH, -C(CF 3 ) 2 OH and 1,2-diol group (-CH(OH)CH 2 OH). The carbonyl group-containing group is preferably a carboxyl group, an alkoxycarbonyl group, an amide group, an isocyanate group, a urethane group (-OC(O)NH 2 ), an acid anhydride residue (-C(O) OC(O)-), imide residues (-C(O)NHC(O)- etc.) and carbonate groups (-OC(O)O-), more preferably acid anhydride residues.

於F聚合物具有極性官能基之情形時,關於F聚合物中之極性官能基之數量,相對於主鏈之碳數每1×10 6個,較佳為10~5000個,更佳為100~3000個。再者,F聚合物中之極性官能基之數量可藉由聚合物之組成或國際公開第2020/145133號所記載之方法進行定量。 When the F polymer has polar functional groups, the number of polar functional groups in the F polymer is preferably 10 to 5000, more preferably 100 per 1×10 6 carbon number of the main chain ~3000. Furthermore, the number of polar functional groups in the F polymer can be quantified by the composition of the polymer or the method described in International Publication No. 2020/145133.

作為F聚合物,較佳為包含PAVE單元且相對於所有單元包含1.5~5.0莫耳%之PAVE單元之四氟乙烯系聚合物,更佳為包含PAVE單元且具有極性官能基之聚合物(1);或包含PAVE單元,且相對於所有單體單元包含2.0~5.0莫耳%之PAVE單元,並且不具有極性官能基之聚合物(2)。該等聚合物於聚合物層中形成微球晶,因此所獲得之聚合物層之物性容易提昇。The F polymer is preferably a tetrafluoroethylene-based polymer containing PAVE units and containing 1.5 to 5.0 mol% of PAVE units with respect to all units, more preferably a polymer containing PAVE units and having a polar functional group (1 ); or a polymer (2) comprising PAVE units and 2.0 to 5.0 mol % of PAVE units relative to all monomer units and having no polar functional groups. These polymers form microspheres in the polymer layer, so the physical properties of the obtained polymer layer are easily improved.

聚合物(1)較佳為相對於所有單元,含有90~98莫耳%之TFE單元、1.5~9.97莫耳%之PAVE單元及0.01~3莫耳%之基於具有極性官能基之單體之單元。 又,作為具有極性官能基之單體,較佳為伊康酸酐、檸康酸酐及5-降𦯉烯-2,3-二羧酸酐(以下,亦記為「NAH」)。 作為聚合物(1)之具體例,可例舉國際公開第2018/16644號所記載之聚合物。 The polymer (1) preferably contains 90 to 98 mol % of TFE units, 1.5 to 9.97 mol % of PAVE units, and 0.01 to 3 mol % based on monomers having polar functional groups with respect to all units. unit. Moreover, as a monomer which has a polar functional group, itaconic acid anhydride, citraconic acid anhydride, and 5-norene-2,3-dicarboxylic acid anhydride (hereinafter, also referred to as "NAH") are preferable. As a specific example of the polymer (1), the polymer described in International Publication No. 2018/16644 can be mentioned.

聚合物(2)較佳為僅由TFE單元及PAVE單元構成,且相對於所有單元,含有95.0~98.0莫耳%之TFE單元、2.0~5.0莫耳%之PAVE單元。 聚合物(2)中之PAVE單元之含量相對於所有單元,較佳為2.1莫耳%以上,更佳為2.2莫耳%以上。 再者,所謂聚合物(2)不具有極性官能基,意指相對於構成聚合物主鏈之碳原子數每1×10 6個,聚合物所具有之極性官能基之數量未達500個。上述極性官能基之數量較佳為100個以下,更佳為未達50個。上述極性官能基之數量之下限通常為0個。 The polymer (2) is preferably composed of only TFE units and PAVE units, and contains 95.0 to 98.0 mol % of TFE units and 2.0 to 5.0 mol % of PAVE units with respect to all the units. The content of the PAVE units in the polymer (2) is preferably 2.1 mol % or more, more preferably 2.2 mol % or more, based on all the units. Furthermore, that the polymer (2) does not have polar functional groups means that the number of polar functional groups contained in the polymer is less than 500 per 1×10 6 carbon atoms constituting the main chain of the polymer. The number of the above-mentioned polar functional groups is preferably 100 or less, more preferably less than 50. The lower limit of the number of the above-mentioned polar functional groups is usually zero.

聚合物(2)可使用作為聚合物鏈之末端基不產生極性官能基之聚合起始劑或鏈轉移劑等來製造,亦可對具有極性官能基之聚合物(於聚合物鏈之末端基具有源自聚合起始劑之極性官能基之聚合物等)進行氟化處理而製造。 作為氟化處理之方法,可例舉使用氟氣體之方法(參照日本專利特開2019-194314號公報等)。 The polymer (2) can be produced by using a polymerization initiator or a chain transfer agent that does not generate polar functional groups as the end groups of the polymer chain, and can also be used for polymers with polar functional groups (at the end groups of the polymer chain). A polymer having a polar functional group derived from a polymerization initiator, etc.) is produced by fluorination treatment. As a method of the fluorination treatment, a method using a fluorine gas can be mentioned (refer to Japanese Patent Laid-Open No. 2019-194314, etc.).

本法中之F粉末係含有F聚合物之粉末,F聚合物之含量較佳為80質量%以上,更佳為100質量%。 F粉末亦可包含F聚合物以外之其他聚合物。作為其他聚合物,可例舉:芳香族聚酯、聚醯胺醯亞胺、聚醯亞胺、聚苯醚(Polypheylene ether)、聚伸苯醚(Polyphenylene Oxide)、順丁烯二醯亞胺。 The F powder in this method is a powder containing the F polymer, and the content of the F polymer is preferably 80% by mass or more, more preferably 100% by mass. The F powder may also contain other polymers than the F polymer. As another polymer, aromatic polyester, polyimide imide, polyimide, polypheylene ether, polyphenylene oxide, maleimide may, for example, be mentioned. .

F粉末亦可包含無機物。作為無機物,較佳為氧化物、氮化物、金屬單質、合金及碳,更佳為氧化矽(silica)、金屬氧化物(氧化鈹、氧化鈰、氧化鋁、鹼氧化鋁、氧化鎂、氧化鋅、氧化鈦等)、氮化硼及偏矽酸鎂(塊滑石),進而較佳為二氧化矽及氮化硼,尤佳為二氧化矽。於該情形時,液狀組合物中之F粉末之分散穩定性容易提昇。 包含無機物之F粉末較佳為以F聚合物作為核,於該核之表面具有無機物。此種F粉末係例如使F聚合物之粉末與無機物之粉末結合(碰撞、凝聚等)而獲得。 The F powder may also contain inorganic substances. The inorganic substances are preferably oxides, nitrides, simple metals, alloys and carbon, more preferably silicon oxides, metal oxides (beryllium oxide, cerium oxide, aluminum oxide, alkali aluminum oxide, magnesium oxide, zinc oxide) , titanium oxide, etc.), boron nitride and magnesium metasilicate (mass talc), more preferably silicon dioxide and boron nitride, especially silicon dioxide. In this case, the dispersion stability of the F powder in the liquid composition is easily improved. It is preferable that the F powder containing inorganic substances has the F polymer as a core, and the surface of the core has inorganic substances. Such an F powder is obtained, for example, by combining (collision, agglomeration, etc.) a powder of an F polymer with a powder of an inorganic substance.

F粉末之D50較佳為10 μm以下,更佳為8 μm以下,進而較佳為5 μm以下。F粉末之D50較佳為0.1 μm以上,更佳為0.3 μm以上,進而較佳為1 μm以上。 又,F粉末之D90較佳為未達100 μm,更佳為90 μm以下。 F粉末之比表面積較佳為1~8 m 2/g,更佳為1~5 m 2/g,進而較佳為1~3 m 2/g。 若F粉末之D50、D90及比表面積處於上述範圍內,則容易使液狀組合物中之F粉末之分散穩定性優異。又,所獲得之聚合物層變得緻密,因此耐水性容易提昇(低吸水率化)。 D50 of the F powder is preferably 10 μm or less, more preferably 8 μm or less, and still more preferably 5 μm or less. D50 of the F powder is preferably 0.1 μm or more, more preferably 0.3 μm or more, and still more preferably 1 μm or more. Moreover, as for D90 of F powder, it is preferable that it is less than 100 micrometers, and it is more preferable that it is 90 micrometers or less. The specific surface area of the F powder is preferably 1 to 8 m 2 /g, more preferably 1 to 5 m 2 /g, and still more preferably 1 to 3 m 2 /g. When the D50, D90 and specific surface area of the F powder are within the above-mentioned ranges, the dispersion stability of the F powder in the liquid composition can be easily made excellent. Moreover, since the obtained polymer layer becomes dense, water resistance is easy to improve (water absorption rate is reduced).

F粉末可使用1種,亦可使用2種以上。使用2種F粉末之情形時之F粉末較佳為熱熔融性F聚合物之粉末(包含TFE單元及PAVE單元且具有含羰基之基之熱熔融性F聚合物之粉末等)及非熱熔融性F聚合物之粉末(非熱熔融性PTFE之粉末等)。 又,前者之粉末在2種F粉末之總量中所占之比率較佳為50質量%以下,更佳為25質量%以下。又,上述比率較佳為0.1質量%以上,更佳為1質量%以上。 又,較佳為前者之粉末之D50為1~4 μm,且後者之粉末之D50為0.1~1 μm。 One type of F powder may be used, or two or more types may be used. In the case of using two types of F powders, the F powder is preferably a powder of a thermally fusible F polymer (a powder of a thermally fusible F polymer containing a TFE unit and a PAVE unit and having a carbonyl group-containing group, etc.) and a non-thermally fusible one. Powder of F polymer (non-thermofusible PTFE powder, etc.). In addition, the ratio of the former powder to the total amount of the two types of F powders is preferably 50% by mass or less, more preferably 25% by mass or less. Moreover, the said ratio becomes like this. Preferably it is 0.1 mass % or more, More preferably, it is 1 mass % or more. Moreover, it is preferable that the D50 of the former powder is 1-4 micrometers, and the D50 of the latter powder is 0.1-1 micrometer.

本法中之液狀分散介質之表面張力為30 mN/m以上,較佳為35 mN/m以上,更佳為40 mN/m以上。表面張力較佳為75 mN/m以下,更佳為55 mN/m以下。若使用具有此種表面張力之液狀分散介質,則容易獲得F粉末之分散穩定性優異,於實施了上述處理之聚合物膜之表面會均勻地潤濕擴散的液狀組合物。 作為液狀分散介質之具體例,可例舉:N-甲基-2-吡咯啶酮(NMP:41)、環己酮(CHN:35.2)、二甲基亞碸(DMSO:43.5)、二乙二醇(DEG:45.2)、溴苯(35.75)、水(72.8)。再者,括號內之數值係各液狀分散介質之表面張力(單位:mN/m)。 液狀分散介質可單獨使用1種,亦可併用2種以上。 The surface tension of the liquid dispersion medium in this method is 30 mN/m or more, preferably 35 mN/m or more, more preferably 40 mN/m or more. The surface tension is preferably 75 mN/m or less, more preferably 55 mN/m or less. When a liquid dispersion medium having such a surface tension is used, it is easy to obtain a liquid composition which is excellent in dispersion stability of the F powder and uniformly wets and spreads on the surface of the polymer film subjected to the above treatment. Specific examples of the liquid dispersion medium include N-methyl-2-pyrrolidone (NMP: 41), cyclohexanone (CHN: 35.2), dimethylsulfoxide (DMSO: 43.5), Ethylene glycol (DEG: 45.2), bromobenzene (35.75), water (72.8). In addition, the numerical value in parentheses is the surface tension (unit: mN/m) of each liquid dispersion medium. The liquid dispersion medium may be used alone or in combination of two or more.

液狀組合物中之F粉末之含量為10質量%以上,較佳為15質量%以上,更佳為20質量%以上。F粉末之含量較佳為60質量%以下,更佳為40質量%以下。根據本發明,即便使用F粉末之含量較高之液狀組合物,亦可形成厚度不均較小之聚合物層,因此可容易地形成任意厚度之聚合物層、尤其是較厚之聚合物層。 液狀組合物中之液狀分散介質之含量較佳為40質量%以上,更佳為50質量%以上。液狀分散介質之含量較佳為80質量%以下。 Content of the F powder in a liquid composition is 10 mass % or more, Preferably it is 15 mass % or more, More preferably, it is 20 mass % or more. The content of the F powder is preferably 60% by mass or less, more preferably 40% by mass or less. According to the present invention, even if a liquid composition with a relatively high content of F powder is used, a polymer layer with less uneven thickness can be formed, so that a polymer layer of any thickness, especially a thicker polymer can be easily formed Floor. The content of the liquid dispersion medium in the liquid composition is preferably 40% by mass or more, more preferably 50% by mass or more. The content of the liquid dispersion medium is preferably 80% by mass or less.

本法中之液狀組合物較佳為含有芳香族聚合物(以下,記為「AR聚合物」)。於該情形時,可對所獲得之聚合物層賦予基於F聚合物之物性(電特性、接著性、低吸水性等)、及基於AR聚合物之物性(低線膨脹性、UV吸收性等)。AR聚合物可溶解於液狀分散介質中,亦可分散於液狀分散介質中。 AR聚合物之玻璃轉移點較佳為300~350℃,更佳為315~335℃。於該情形時,容易降低聚合物層(積層膜)之線膨脹係數,防止或抑制由加熱所引起之變形。 AR聚合物之5%重量損失溫度較佳為260℃以上,更佳為300℃以上,進而較佳為320℃以上。AR聚合物之5%重量損失溫度較佳為600℃以下。於上述範圍內,容易減少AR聚合物之分解氣體所引起之氣泡、或由伴隨AR聚合物本身之反應之副產物所產生之氣體所引起之氣泡,而有效地抑制積層膜中聚合物層與聚合物膜之界面粗糙。 The liquid composition in this method preferably contains an aromatic polymer (hereinafter, referred to as "AR polymer"). In this case, physical properties (electrical properties, adhesion, low water absorption, etc.) based on the F polymer, and physical properties (low linear expansion, UV absorption, etc.) based on the AR polymer can be imparted to the obtained polymer layer. ). The AR polymer can be dissolved or dispersed in a liquid dispersion medium. The glass transition point of the AR polymer is preferably 300-350°C, more preferably 315-335°C. In this case, the linear expansion coefficient of the polymer layer (laminated film) is easily lowered, and deformation caused by heating can be prevented or suppressed. The 5% weight loss temperature of the AR polymer is preferably 260°C or higher, more preferably 300°C or higher, and still more preferably 320°C or higher. The 5% weight loss temperature of the AR polymer is preferably 600°C or lower. Within the above range, it is easy to reduce the bubbles caused by the decomposition gas of the AR polymer, or the bubbles caused by the gas generated by the reaction of the AR polymer itself, and effectively suppress the polymer layer in the laminated film. The interface of the polymer film is rough.

AR聚合物較佳為熱塑性。此種AR聚合物藉由其塑性,而於聚合物層中之分散性進一步提昇,容易形成緻密且均勻之聚合物層。 AR聚合物較佳為選自由芳香族聚醯亞胺、芳香族順丁烯二醯亞胺、芳香族聚苯醚、芳香族苯乙烯彈性體、液晶聚酯所組成之群中之至少1種,更佳為芳香族聚醯亞胺。此處,熱塑性聚醯亞胺意指完成了醯亞胺化且不會進而發生醯亞胺化反應之聚醯亞胺。 若使用此種AR聚合物,則不僅容易提昇聚合物層對於聚合物膜之密接性,而且容易提昇膜物性(UV吸收性等)。 The AR polymer is preferably thermoplastic. Due to its plasticity, the AR polymer has further improved dispersibility in the polymer layer, and it is easy to form a dense and uniform polymer layer. The AR polymer is preferably at least one selected from the group consisting of aromatic polyimide, aromatic maleimide, aromatic polyphenylene ether, aromatic styrene elastomer, and liquid crystal polyester , more preferably aromatic polyimide. Here, the thermoplastic polyimide means a polyimide that has completed imidization and does not undergo further imidization reaction. If such an AR polymer is used, not only the adhesiveness of the polymer layer to the polymer film, but also the physical properties (UV absorption, etc.) of the film can be easily improved.

作為AR聚合物之具體例,可例舉:作為芳香族聚醯胺醯亞胺之「HPC」系列(日立化成公司製造)等、作為芳香族聚醯亞胺之「Neopulim」系列(三菱瓦斯化學公司製造)、「SPIXAREA」系列(SOMAR公司製造)、「Q-PILON」系列(PI技術研究所製造)、「WINGO」系列(Wingo Technology公司製造)、「TOHMIDE」系列(T&K TOKA公司製造)、「KPI-MX」系列(河村產業公司製造)及「UPIA-AT」系列(宇部興產公司製造)等。 再者,關於作為AR聚合物之芳香族聚醯亞胺,可使用下述聚合物膜中說明之芳香族聚醯亞胺。 Specific examples of AR polymers include "HPC" series (manufactured by Hitachi Chemical Co., Ltd.) as aromatic polyimide imide, and "Neopulim" series (Mitsubishi Gas Chemical) as aromatic polyimide. company), "SPIXAREA" series (manufactured by SOMAR), "Q-PILON" series (manufactured by PI Institute of Technology), "WINGO" series (manufactured by Wingo Technology), "TOHMIDE" series (manufactured by T&K TOKA), "KPI-MX" series (manufactured by Kawamura Sangyo Co., Ltd.) and "UPIA-AT" series (manufactured by Ube Industries, Ltd.). In addition, about the aromatic polyimide which is an AR polymer, the aromatic polyimide demonstrated in the following polymer film can be used.

作為本法中之F聚合物及AR聚合物之適宜態樣,可例舉F聚合物之熔融溫度為285~320℃且AR聚合物之玻璃轉移點為315~335℃之態樣。 於上述態樣中,於聚合物層中,不僅F聚合物與AR聚合物均勻地分散而容易提昇膜物性,而且於高溫環境下,F聚合物與AR聚合物高度地相互作用,而容易進一步提昇聚合物層之耐熱性。 As a suitable embodiment of the F polymer and the AR polymer in this method, the melting temperature of the F polymer is 285-320°C and the glass transition point of the AR polymer is 315-335°C. In the above aspect, in the polymer layer, not only the F polymer and the AR polymer are uniformly dispersed to easily improve the physical properties of the film, but also in a high temperature environment, the F polymer and the AR polymer highly interact, and it is easy to further improve the film properties. Improve the heat resistance of the polymer layer.

於本法中之液狀組合物中,AR聚合物之含量相對於F聚合物與AR聚合物之合計含量,較佳為10質量%以下,更佳為7.5質量%以下,進而較佳為5質量%以下。又,上述AR聚合物之含量較佳為0.1質量%以上。 若處在液狀組合物中之F聚合物及AR聚合物各者之含量滿足上述比率,且AR聚合物之含量相對於F聚合物之含量較低的狀態,則於所獲得之聚合物層中,容易形成AR聚合物高度地分散於F聚合物中之狀態。結果,於聚合物層中,容易高度地展現基於F聚合物之物性(電特性、低吸水性等)。 In the liquid composition in this method, the content of the AR polymer is preferably 10% by mass or less, more preferably 7.5% by mass or less, and still more preferably 5% by mass relative to the total content of the F polymer and the AR polymer. mass % or less. Moreover, it is preferable that content of the said AR polymer is 0.1 mass % or more. If the content of each of the F polymer and the AR polymer in the liquid composition satisfies the above ratio, and the content of the AR polymer is relatively low relative to the content of the F polymer, in the obtained polymer layer , it is easy to form a state in which the AR polymer is highly dispersed in the F polymer. As a result, in the polymer layer, the physical properties (electrical properties, low water absorption, etc.) based on the F polymer are likely to be highly exhibited.

基於提昇聚合物層之電特性及低線膨脹性之觀點而言,本法中之液狀組合物可進而包含無機填料。 作為無機填料,較佳為氮化物填料或無機氧化物填料,更佳為氮化硼填料、氧化鈹填料(鈹之氧化物之填料)、矽酸鹽填料(二氧化矽填料、矽灰石填料、滑石填料)、或金屬氧化物(氧化鈰、氧化鋁、氧化鎂、氧化鋅、氧化鈦等)填料,進而較佳為二氧化矽填料。無機填料較佳為藉由矽烷偶合劑進行了表面處理。 From the viewpoint of improving the electrical properties and low linear expansion of the polymer layer, the liquid composition in this method may further contain an inorganic filler. The inorganic fillers are preferably nitride fillers or inorganic oxide fillers, more preferably boron nitride fillers, beryllium oxide fillers (fillers of beryllium oxides), silicate fillers (silica fillers, wollastonite fillers) , talc filler), or metal oxide (cerium oxide, aluminum oxide, magnesium oxide, zinc oxide, titanium oxide, etc.) filler, and more preferably silica filler. The inorganic filler is preferably surface-treated with a silane coupling agent.

無機填料之D50較佳為20 μm以下,更佳為10 μm以下。D50較佳為0.01 μm以上,更佳為0.1 μm以上。 無機填料之形狀可為粒狀、針狀(纖維狀)、板狀之任一種。作為無機填料之具體形狀,可例舉:球狀、鱗片狀、層狀、葉片狀、杏仁狀、柱狀、雞冠狀、等軸狀、葉狀、雲母狀、塊狀、平板狀、楔狀、玫瑰花狀、網狀、角柱狀。 The D50 of the inorganic filler is preferably 20 μm or less, more preferably 10 μm or less. D50 is preferably 0.01 μm or more, more preferably 0.1 μm or more. The shape of the inorganic filler can be any of granular, needle-like (fibrous), and plate-like. Specific shapes of inorganic fillers include spherical, scaly, lamellar, leaf-shaped, almond-shaped, columnar, cockscomb, equiaxed, leaf-shaped, mica-shaped, massive, flat, wedge-shaped Shape, rosette, reticulate, angular column.

作為無機填料之適宜具體例,可例舉:二氧化矽填料(Admatechs公司製造之「Admafine(註冊商標)」系列等)、藉由二癸酸丙二醇酯等酯進行了表面處理之氧化鋅填料(堺化學工業股份有限公司製造之「FINEX(註冊商標)」系列等)、球狀熔融二氧化矽填料(DENKA公司製造之「SFP(註冊商標)」系列等)、藉由多元醇及無機物進行了被覆處理之氧化鈦填料(石原產業公司製造之「Tipaque(註冊商標)」系列等)、藉由烷基矽烷進行了表面處理之金紅石型氧化鈦填料(Tayca公司製造之「JMT(註冊商標)」系列等)、中空狀二氧化矽填料(太平洋水泥公司製造之「E-SPHERES」系列、日鐵礦業公司製造之「SiliNax」系列、Emerson & Cuming公司製造之「Ecco sphere」系列等)、滑石填料(日本滑石公司製造之「SG」系列等)、塊滑石填料(日本滑石公司製造之「BST」系列等)、氮化硼填料(昭和電工公司製造之「UHP」系列、DENKA公司製造之「DENKA BORON NITRIDE」系列(「GP」、「HGP」等級)等)。Suitable specific examples of inorganic fillers include silica fillers ("Admafine (registered trademark)" series manufactured by Admatechs, etc.), zinc oxide fillers ( "FINEX (registered trademark)" series manufactured by Sakai Chemical Industry Co., Ltd., etc.), spherical fused silica filler ("SFP (registered trademark)" series manufactured by DENKA Corporation, etc.), polyols and inorganic substances. Coated titanium oxide filler (“Tipaque (registered trademark)” series manufactured by Ishihara Sangyo Co., Ltd., etc.), surface-treated rutile-type titanium oxide filler (“JMT (registered trademark)” manufactured by Tayca Corporation) ” series, etc.), hollow silica fillers (“E-SPHERES” series manufactured by Pacific Cement Corporation, “SiliNax” series manufactured by Nippon Steel Mining Corporation, “Ecco sphere” series manufactured by Emerson & Cuming Corporation, etc.), Talc fillers (“SG” series manufactured by Nippon Talc Co., Ltd., etc.), block talc fillers (“BST” series manufactured by Nippon Talc Co., Ltd., etc.), boron nitride fillers (“UHP” series manufactured by Showa Denko Co., Ltd., and DENKA Co., Ltd. "DENKA BORON NITRIDE" series ("GP", "HGP" grades), etc.).

基於提昇分散性及操作性之觀點而言,本法中之液狀組合物可進而包含界面活性劑。 界面活性劑較佳為非離子性。 界面活性劑之親水部位較佳為具有氧伸烷基或醇性羥基。 界面活性劑之疏水部位較佳為具有乙炔基、聚矽氧烷基、全氟烷基或全氟烯基。換言之,界面活性劑較佳為乙炔系界面活性劑、聚矽氧系界面活性劑或氟系界面活性劑,更佳為聚矽氧系界面活性劑。 界面活性劑亦可為二醇系界面活性劑。 界面活性劑可使用1種,亦可使用2種以上。於使用2種界面活性劑之情形時,較佳為使用聚矽氧系界面活性劑及二醇系界面活性劑。 From the viewpoint of improving dispersibility and workability, the liquid composition in this method may further contain a surfactant. The surfactant is preferably nonionic. The hydrophilic part of the surfactant preferably has an oxyalkylene group or an alcoholic hydroxyl group. The hydrophobic portion of the surfactant preferably has an acetylene group, a polysiloxane group, a perfluoroalkyl group or a perfluoroalkenyl group. In other words, the surfactant is preferably an acetylene-based surfactant, a polysiloxane-based surfactant or a fluorine-based surfactant, more preferably a polysiloxane-based surfactant. The surfactant may also be a glycol-based surfactant. One type of surfactant may be used, or two or more types may be used. In the case of using two kinds of surfactants, it is preferable to use a polysiloxane-based surfactant and a glycol-based surfactant.

又,於本法中之液狀組合物中,除上述成分以外,亦可包含矽烷偶合劑、脫水劑、消泡劑、塑化劑、耐候劑、抗氧化劑、熱穩定劑、潤滑劑、抗靜電劑、增白劑、著色劑、導電劑、離型劑、表面處理劑、阻燃劑、有機填料等添加劑。Furthermore, the liquid composition in this method may contain, in addition to the above-mentioned components, a silane coupling agent, a dehydrating agent, an antifoaming agent, a plasticizer, a weathering agent, an antioxidant, a heat stabilizer, a lubricant, an antifoaming agent, a Additives such as electrostatic agents, brighteners, colorants, conductive agents, release agents, surface treatment agents, flame retardants, organic fillers, etc.

液狀組合物之黏度較佳為100 mPa・s以上,更佳為250 mPa・s以上。液狀組合物之黏度較佳為100000 mPa・s以下,更佳為10000 mPa・s以下,尤佳為3000 mPa・s。 液狀組合物之觸變比較佳為1.0~2.0。 具有此種黏度及觸變比之液狀組合物容易於聚合物膜之表面更均勻地潤濕擴散。 The viscosity of the liquid composition is preferably 100 mPa·s or more, more preferably 250 mPa·s or more. The viscosity of the liquid composition is preferably 100,000 mPa·s or less, more preferably 10,000 mPa·s or less, and still more preferably 3,000 mPa·s. The thixotropy ratio of the liquid composition is preferably 1.0 to 2.0. The liquid composition with such viscosity and thixotropic ratio is easy to wet and spread on the surface of the polymer film more uniformly.

於本法中,作為對聚合物膜之表面實施之處理,較佳為親水化處理。根據親水化處理,可相對簡單地提高聚合物膜之表面之表面張力。 作為親水化處理,較佳為電暈處理、電漿處理、輝光處理、UV臭氧處理等物理活化處理,更佳為選自由電暈處理及電漿處理所組成之群中之至少一種處理。根據該等處理,可相對容易且確實地進行親水化處理。 In this method, as the treatment performed on the surface of the polymer film, a hydrophilization treatment is preferable. According to the hydrophilization treatment, the surface tension of the surface of the polymer film can be increased relatively simply. The hydrophilic treatment is preferably a physical activation treatment such as corona treatment, plasma treatment, glow treatment, UV ozone treatment, and more preferably at least one treatment selected from the group consisting of corona treatment and plasma treatment. According to these treatments, the hydrophilization treatment can be performed relatively easily and surely.

基於可有效率地導入極性官能基之觀點而言,電暈處理較佳為於可燃性氣體(乙酸乙烯酯等)之存在下進行。 作為電漿處理中之電漿照射裝置,可例舉:高頻感應方式、電容耦合型電極方式、電暈放電電極-電漿噴流方式、平行板型、遙距電漿型、大氣壓電漿型、ICP(Inductive Coupling Plasma,感應耦合電漿)型高密度電漿型等。 電漿處理所使用之氣體較佳為稀有氣體、氫氣或氮氣。作為此種氣體之具體例,可例舉:氬氣;氫氣與氮氣之混合氣體;氫氣、氮氣及氬氣之混合氣體。 From the viewpoint of efficiently introducing polar functional groups, the corona treatment is preferably performed in the presence of a flammable gas (vinyl acetate, etc.). As a plasma irradiation device in plasma treatment, a high frequency induction system, a capacitive coupling electrode system, a corona discharge electrode-plasma jet system, a parallel plate type, a remote plasma type, and an atmospheric pressure plasma type can be exemplified. , ICP (Inductive Coupling Plasma, Inductively Coupled Plasma) type high-density plasma type, etc. The gas used in the plasma treatment is preferably a rare gas, hydrogen or nitrogen. Specific examples of such a gas include: argon; a mixed gas of hydrogen and nitrogen; and a mixed gas of hydrogen, nitrogen, and argon.

較佳為於實施了上述處理之聚合物膜之表面存在極性官能基。若極性官能基存在於聚合物膜之表面,則其表面之表面張力(潤濕性)及接著性增大。因此,所獲得之聚合物層之厚度之均勻性提昇,並且聚合物膜與聚合物層之接著強度進一步提高。又,亦可期待降低聚合物膜之線膨脹係數之效果。 聚合物膜之表面所存在之極性官能基較佳為含羥基之基或含羰基之基。 進而,聚合物膜可供於退火處理而調整其殘留應力。退火處理中之條件較佳為如下:溫度為120~180℃,壓力為0.005~0.015 MPa,時間為30~120分鐘。 Preferably, polar functional groups are present on the surface of the polymer film subjected to the above treatment. If polar functional groups exist on the surface of the polymer film, the surface tension (wettability) and adhesion of the surface will increase. Therefore, the uniformity of the thickness of the obtained polymer layer is improved, and the adhesion strength between the polymer film and the polymer layer is further improved. In addition, the effect of reducing the linear expansion coefficient of the polymer film can also be expected. The polar functional group present on the surface of the polymer film is preferably a hydroxyl group-containing group or a carbonyl group-containing group. Furthermore, the polymer film can be annealed to adjust its residual stress. The conditions in the annealing treatment are preferably as follows: the temperature is 120-180° C., the pressure is 0.005-0.015 MPa, and the time is 30-120 minutes.

實施了上述處理之聚合物膜之表面之表面張力較佳為大於液狀分散介質之表面張力。於該情形時,液狀組合物容易於聚合物膜之表面更順利且均勻地潤濕擴散。 具體而言,實施了處理之聚合物膜之表面之表面張力與液狀分散介質之表面張力的差較佳為10 mN/m以上,更佳為20 mN/m以上。表面張力之差較佳為50 mN/m以下,更佳為40 mN/m以下。 又,聚合物膜之表面之算術平均粗糙度Ra較佳為0.01~5 μm,更佳為0.03~1 μm。於該情形時,成為產生釘紮現象之起點之階差較少,因此液狀組合物容易於聚合物膜之表面更均勻地潤濕擴散。 It is preferable that the surface tension of the surface of the polymer film subjected to the above treatment is larger than the surface tension of the liquid dispersion medium. In this case, the liquid composition tends to wet and spread more smoothly and uniformly on the surface of the polymer film. Specifically, the difference between the surface tension of the treated polymer film and the surface tension of the liquid dispersion medium is preferably 10 mN/m or more, more preferably 20 mN/m or more. The difference in surface tension is preferably 50 mN/m or less, more preferably 40 mN/m or less. In addition, the arithmetic mean roughness Ra of the surface of the polymer film is preferably 0.01 to 5 μm, more preferably 0.03 to 1 μm. In this case, since the level difference which becomes the starting point of the pinning phenomenon is small, the liquid composition is more likely to wet and spread on the surface of the polymer film more uniformly.

於液狀組合物(聚合物層)包含AR聚合物之情形時,聚合物膜中所包含之基礎聚合物之玻璃轉移點、與液狀組合物(聚合物層)中所包含之AR聚合物之玻璃轉移點之差的絕對值較佳為20℃以下,更佳為10℃以下。再者,玻璃轉移點之差之絕對值亦可為0℃。於該情形時,基礎聚合物之玻璃轉移點與AR聚合物之玻璃轉移點接近,因此積層膜整體更不易產生由加熱所引起之變形。 聚合物膜中所包含之基礎聚合物之玻璃轉移點之具體值較佳為230~340℃,更佳為250~320℃。於該情形時,聚合物膜之由加熱所引起之變形之變得足夠低。 When the liquid composition (polymer layer) contains the AR polymer, the glass transition point of the base polymer contained in the polymer film and the AR polymer contained in the liquid composition (polymer layer) The absolute value of the difference between the glass transition points is preferably 20°C or lower, more preferably 10°C or lower. In addition, the absolute value of the difference of the glass transition point may be 0 degreeC. In this case, the glass transition point of the base polymer is close to the glass transition point of the AR polymer, so that the entire laminated film is less likely to be deformed by heating. The specific value of the glass transition point of the base polymer contained in the polymer film is preferably 230 to 340°C, more preferably 250 to 320°C. In this case, the deformation of the polymer film caused by heating becomes sufficiently low.

若玻璃轉移點之差之絕對值及基礎聚合物之玻璃轉移點之具體值滿足上述範圍,則可防止或抑制所獲得之積層膜之表面產生皺褶。 聚合物膜中所包含之基礎聚合物較佳為芳香族聚醯亞胺。若使用芳香族聚醯亞胺,則聚合物膜之由加熱所引起之變形之程度容易變得更低。 聚合物膜中之基礎聚合物之含量較佳為80質量%以上,更佳為90質量%以上。上述含量亦可為100質量%。 If the absolute value of the difference between the glass transition points and the specific value of the glass transition point of the base polymer satisfy the above ranges, the generation of wrinkles on the surface of the obtained laminated film can be prevented or suppressed. The base polymer contained in the polymer film is preferably an aromatic polyimide. If an aromatic polyimide is used, the degree of deformation of the polymer film by heating tends to be lower. The content of the base polymer in the polymer film is preferably 80% by mass or more, more preferably 90% by mass or more. The said content may be 100 mass %.

作為基礎聚合物,可例舉:聚醯亞胺、聚醯胺、聚醚醯胺、聚苯硫醚、聚烯丙基醚酮、聚醯胺醯亞胺、液晶性聚酯、四氟乙烯系聚合物,較佳為芳香族聚醯亞胺。Examples of the base polymer include polyimide, polyamide, polyetherimide, polyphenylene sulfide, polyallyl ether ketone, polyamideimide, liquid crystalline polyester, and tetrafluoroethylene. is a polymer, preferably an aromatic polyimide.

作為基礎聚合物之芳香族聚醯亞胺之醯亞胺基密度較佳為0.20~0.35。若醯亞胺基密度為上述上限值以下,則聚合物膜之吸水率變得更低,容易抑制積層膜之介電特性之變化。若醯亞胺基密度為上述下限值以上,則不僅醯亞胺基作為極性基發揮作用,使得聚合物膜與聚合物層之密接力進一步提昇,而且容易顯著地降低吸水率。 又,若上述醯亞胺基密度處於此種範圍內,則積層膜中更不易產生皺褶。此種皺褶於聚合物膜中之芳香族聚醯亞胺之玻璃轉移點較高之情形時不易產生。 The imide group density of the aromatic polyimide as the base polymer is preferably 0.20 to 0.35. When the imide group density is below the above-mentioned upper limit value, the water absorption rate of the polymer film becomes lower, and it becomes easy to suppress the change in the dielectric properties of the laminated film. When the imide group density is equal to or higher than the above lower limit value, not only the imide group functions as a polar group to further improve the adhesion between the polymer film and the polymer layer, but also the water absorption rate tends to be significantly reduced. Moreover, when the said imide group density exists in such a range, it becomes difficult to generate|occur|produce a wrinkle in a laminated film. Such wrinkles are less likely to occur when the glass transition point of the aromatic polyimide in the polymer film is high.

再者,醯亞胺基密度係於將聚醯亞胺前驅物醯亞胺化而成之聚醯亞胺中,將醯亞胺基部分之每單位之分子量(140.1)除以聚醯亞胺之每單位之分子量所得的值。例如,將包含1莫耳之均苯四甲酸二酐(分子量:218.1)及1莫耳之3,4'-二胺基二苯醚(分子量:200.2)這2種成分之聚醯亞胺前驅物醯亞胺化而成之聚醯亞胺(每單位之分子量:382.2)的醯亞胺基密度係將140.1除以382.2所得之值即0.37。Furthermore, the density of imide groups is determined by dividing the molecular weight (140.1) per unit of the imide moiety by the polyimide in the polyimide obtained by imidizing the polyimide precursor. The value obtained per unit of molecular weight. For example, a polyimide precursor containing 1 mole of pyromellitic dianhydride (molecular weight: 218.1) and 1 mole of 3,4'-diaminodiphenyl ether (molecular weight: 200.2) The imide group density of the polyimide (molecular weight per unit: 382.2) obtained by imidization is 0.37, which is the value obtained by dividing 140.1 by 382.2.

作為芳香族聚醯亞胺,可例舉如下聚醯亞胺,其係使二胺與羧酸二酐反應而合成聚醯胺酸,藉由熱醯亞胺化法或化學醯亞胺化法將該聚醯胺酸醯亞胺化而獲得。 作為用以合成聚醯胺酸之溶劑,可例舉:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基-2-吡咯啶酮。 The aromatic polyimide may, for example, be a polyimide, which is obtained by reacting a diamine with a carboxylic dianhydride to synthesize a polyimide, followed by a thermal imidization method or a chemical imidization method. It is obtained by imidization of this polyamic acid. As a solvent for synthesizing polyamide acid, N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidone may, for example, be mentioned.

作為二胺,可例舉:4,4'-二胺基二苯基丙烷、4,4'-二胺基二苯基甲烷、4,4'-二胺基二苯醚、3,3'-二胺基二苯醚、3,4'-二胺基二苯醚、4,4'-二胺基二苯基二乙基矽烷、4,4'-二胺基二苯基矽烷、1,4-二胺基苯(對苯二胺)、4,4'-雙(4-胺基苯氧基)聯苯、4,4'-雙(3-胺基苯氧基)聯苯、1,3-雙(3-胺基苯氧基)苯、1,3-雙(4-胺基苯氧基)苯、1,4-雙(4-胺基苯氧基)苯、1,3-雙(3-胺基苯氧基)苯、3,3'-二胺基二苯甲酮、4,4'-二胺基二苯甲酮、2,2'-二甲基-4,4'-二胺基聯苯、2,2-雙{4-(4-胺基苯氧基)苯基}丙烷、3,3'-二羥基-4,4'-二胺基-1,1'-聯苯、2,4-二胺基甲苯。該等二胺成分可單獨使用1種,亦可併用2種以上。As the diamine, 4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenyl ether, 3,3' -Diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyldiethylsilane, 4,4'-diaminodiphenylsilane, 1 ,4-Diaminobenzene (p-phenylenediamine), 4,4'-bis(4-aminophenoxy)biphenyl, 4,4'-bis(3-aminophenoxy)biphenyl, 1,3-bis(3-aminophenoxy)benzene, 1,3-bis(4-aminophenoxy)benzene, 1,4-bis(4-aminophenoxy)benzene, 1, 3-bis(3-aminophenoxy)benzene, 3,3'-diaminobenzophenone, 4,4'-diaminobenzophenone, 2,2'-dimethyl-4 ,4'-diaminobiphenyl, 2,2-bis{4-(4-aminophenoxy)phenyl}propane, 3,3'-dihydroxy-4,4'-diamino-1 , 1'-biphenyl, 2,4-diaminotoluene. These diamine components may be used individually by 1 type, and may use 2 or more types together.

作為羧酸二酐,可例舉:均苯四甲酸二酐、3,3'4,4'-聯苯四羧酸二酐、2,2',3,3'-聯苯四羧酸二酐、2,3,3',4'-聯苯四羧酸二酐、3,3',4,4'-二苯醚四羧酸二酐、2,2-雙(3,4-二羧基苯基)丙烷二酐、2,2-雙(2,3-二羧基苯基)丙烷二酐、1,1-雙(2,3-二羧基苯基)乙烷二酐、1,1-雙(3,4-二羧基苯基)乙烷二酐、雙(2,3-二羧基苯基)甲烷二酐、雙(3,4-二羧基苯基)甲烷二酐、3,3',4,4'-二苯甲酮四羧酸二酐、2,3,2',3'-二苯甲酮四羧酸二酐、2,3,3',4'-二苯甲酮四羧酸二酐、1,3-雙(3,4-二羧基苯基)-1,1,3,3-四甲基二環己烷二酐、2,2-雙(3,4-二羧基苯基)六氟丙烷二酐、2,2-雙[4-(3,4-二羧基苯氧基)苯基]六氟丙烷二酐、2,2-雙[4-(3,4-二羧基苯氧基)苯基]丙烷二酐。該等二羧酸成分可單獨使用1種,亦可併用2種以上。As carboxylic dianhydride, pyromellitic dianhydride, 3,3'4,4'-biphenyltetracarboxylic dianhydride, 2,2',3,3'-biphenyltetracarboxylic dianhydride may, for example, be mentioned. Anhydride, 2,3,3',4'-biphenyltetracarboxylic dianhydride, 3,3',4,4'-diphenyl ether tetracarboxylic dianhydride, 2,2-bis(3,4-bis Carboxyphenyl) propane dianhydride, 2,2-bis(2,3-dicarboxyphenyl)propane dianhydride, 1,1-bis(2,3-dicarboxyphenyl)ethane dianhydride, 1,1 -Bis(3,4-dicarboxyphenyl)ethane dianhydride, bis(2,3-dicarboxyphenyl)methane dianhydride, bis(3,4-dicarboxyphenyl)methane dianhydride, 3,3 ',4,4'-benzophenone tetracarboxylic dianhydride, 2,3,2',3'-benzophenone tetracarboxylic dianhydride, 2,3,3',4'-diphenylmethane Ketotetracarboxylic dianhydride, 1,3-bis(3,4-dicarboxyphenyl)-1,1,3,3-tetramethylbicyclohexane dianhydride, 2,2-bis(3,4 -Dicarboxyphenyl) hexafluoropropane dianhydride, 2,2-bis[4-(3,4-dicarboxyphenoxy)phenyl]hexafluoropropane dianhydride, 2,2-bis[4-(3 , 4-Dicarboxyphenoxy) phenyl] propane dianhydride. These dicarboxylic acid components may be used individually by 1 type, and may use 2 or more types together.

又,二胺及羧酸二酐所含有之源自醚鍵之氧原子之總莫耳數相對於二胺與羧酸二酐之合計莫耳數較佳為35~70%,更佳為45~65%。於該情形時,芳香族聚醯亞胺之聚合物主鏈之柔軟性提高,芳香族環之堆疊性提昇,聚合物膜與聚合物層之接著性進一步提昇。又,於該情形時,積層膜之UV加工性亦更加良好。 於此種聚合物膜中亦可添加無機填料,以提高降伏強度、難塑性變形性、導熱性、環剛度等特性。作為此種無機填料,可例舉:氧化矽、氧化鈦、氧化鋁、氮化矽、氮化硼、磷酸氫鈣、磷酸鈣。 Furthermore, the total molar number of oxygen atoms derived from ether bonds contained in the diamine and the carboxylic dianhydride is preferably 35 to 70%, more preferably 45, relative to the total molar number of the diamine and the carboxylic dianhydride. ~65%. In this case, the flexibility of the polymer main chain of the aromatic polyimide is improved, the stackability of the aromatic rings is improved, and the adhesion between the polymer film and the polymer layer is further improved. Moreover, in this case, the UV processability of the laminated film is also more favorable. Inorganic fillers can also be added to this polymer film to improve the properties of yield strength, difficult plastic deformation, thermal conductivity, ring stiffness and the like. Examples of such inorganic fillers include silicon oxide, titanium oxide, aluminum oxide, silicon nitride, boron nitride, calcium hydrogen phosphate, and calcium phosphate.

聚合物膜較佳為具有較高之降伏強度。具體而言,聚合物膜之5%應變時應力較佳為180 MPa以上,更佳為210 MPa以上。上述5%應變時應力較佳為500 MPa以下。 進而,聚合物膜較佳為難塑性變形性。具體而言,聚合物膜之15%應變時應力較佳為225 MPa以上,更佳為245 MPa以上。上述15%應變時應力較佳為580 MPa以下。 若聚合物膜具有較高之降伏強度、尤其是難塑性變形性,則容易充分降低積層膜之線膨脹係數之絕對值,可更確實地防止翹曲之產生。 The polymer film preferably has a higher yield strength. Specifically, the stress at 5% strain of the polymer film is preferably 180 MPa or more, more preferably 210 MPa or more. The stress at the above-mentioned 5% strain is preferably 500 MPa or less. Furthermore, the polymer film is preferably difficult to plastically deform. Specifically, the stress at 15% strain of the polymer film is preferably 225 MPa or more, more preferably 245 MPa or more. The stress at the above-mentioned 15% strain is preferably 580 MPa or less. If the polymer film has high yield strength, especially low plastic deformability, it is easy to sufficiently reduce the absolute value of the linear expansion coefficient of the laminated film, and the occurrence of warpage can be more reliably prevented.

聚合物膜於320℃下之拉伸彈性模數較佳為0.2 GPa以上,更佳為0.4 GPa以上。其拉伸彈性模數較佳為10 GPa以下,更佳為5 GPa以下。 關於該情形時之積層膜,即便於對其進行加工時進行加熱及冷卻,操作性亦優異。即,若聚合物膜之拉伸彈性模數為上述下限值以上,則於加工時進行加熱及冷卻時,聚合物層之收縮會因聚合物膜之彈性而得以有效緩和,積層膜不易產生皺褶,所獲得之積層膜之物性(表面平滑性等)容易提昇。此種趨勢係於聚合物層中之F聚合物之含量或聚合物層之厚度較大之情形時變得顯著。又,若聚合物膜之拉伸彈性模數為上述上限值以下,則積層膜之柔軟性容易進一步提高。 The tensile modulus of elasticity of the polymer film at 320° C. is preferably 0.2 GPa or more, more preferably 0.4 GPa or more. The tensile modulus of elasticity is preferably 10 GPa or less, more preferably 5 GPa or less. The laminated film in this case is excellent in workability even if it is heated and cooled during processing. That is, if the tensile modulus of elasticity of the polymer film is equal to or higher than the above lower limit value, the shrinkage of the polymer layer will be effectively alleviated by the elasticity of the polymer film during heating and cooling during processing, and the laminated film will not be easily generated. Wrinkles easily improve the physical properties (surface smoothness, etc.) of the obtained laminated film. This tendency becomes significant when the content of F polymer in the polymer layer or the thickness of the polymer layer is larger. Moreover, when the tensile modulus of elasticity of the polymer film is equal to or less than the above-mentioned upper limit value, the flexibility of the laminated film is likely to be further improved.

聚合物膜較佳為與聚合物層直接接觸。即,較佳為於聚合物膜之表面直接形成(積層)聚合物層,而不實施利用矽烷偶合劑、接著劑等進行之表面處理。於該情形時,於所獲得之積層膜中,膜物性不易降低。再者,藉由上述構成,即便聚合物膜與聚合物層直接接觸,於聚合物膜與聚合物層之間亦展現較高之接著性。The polymer film is preferably in direct contact with the polymer layer. That is, it is preferable to form (laminate) the polymer layer directly on the surface of the polymer film, without performing surface treatment with a silane coupling agent, an adhesive, or the like. In this case, in the obtained laminated film, film physical properties are less likely to decrease. Furthermore, with the above configuration, even if the polymer film and the polymer layer are in direct contact, high adhesion is exhibited between the polymer film and the polymer layer.

關於將液狀組合物塗佈於聚合物膜之方法,只要為於聚合物膜之表面形成包含液狀組合物之穩定液狀覆膜的方法即可,可例舉:噴霧法、輥式塗佈法、旋轉塗佈法、凹版塗佈法、微凹版塗佈法、凹版膠版印刷法、刮塗法、接觸塗佈法、棒式塗佈法、模嘴塗佈法、噴注麥勒棒法、狹縫式模嘴塗佈法。The method of applying the liquid composition to the polymer film may be any method as long as a stable liquid coating film containing the liquid composition is formed on the surface of the polymer film, and examples include spray method, roll coating Cloth method, spin coating method, gravure coating method, micro gravure coating method, gravure offset printing method, blade coating method, contact coating method, rod coating method, die nozzle coating method, injection Mylar rod method, slit die nozzle coating method.

於對形成有液狀覆膜之聚合物膜進行加熱時,較佳為保持在低溫範圍之溫度而去除液狀分散介質,即進行乾燥。藉此,可獲得乾燥覆膜。低溫範圍之溫度較佳為80℃以上且未達180℃。低溫範圍之溫度意指乾燥中之氛圍之溫度。 低溫範圍之溫度下之保持可以1個階段實施,亦可於不同之溫度下以2個階段以上實施。 保持在低溫範圍之溫度時之氛圍可為常壓下、減壓下之任一狀態。又,上述氛圍可為氧氣等氧化性氣體氛圍、氫氣等還原性氣體氛圍、稀有氣體、氮氣等惰性氣體氛圍之任一種。 When heating the polymer film on which the liquid coating film is formed, it is preferable to keep the temperature in the low temperature range, and to remove the liquid dispersion medium, that is, to perform drying. Thereby, a dry coating can be obtained. The temperature in the low temperature range is preferably 80°C or higher and less than 180°C. The temperature in the low temperature range means the temperature of the atmosphere in drying. The holding at the temperature in the low temperature range may be carried out in one stage, or may be carried out in two or more stages at different temperatures. The atmosphere when the temperature is kept in the low temperature range can be either under normal pressure or under reduced pressure. In addition, the atmosphere may be any of an oxidizing gas atmosphere such as oxygen, a reducing gas atmosphere such as hydrogen, a rare gas, and an inert gas atmosphere such as nitrogen.

於本法中,較佳為進而於超過低溫範圍內之保持溫度之溫度範圍(以下,亦記為「焙燒範圍」)內對乾燥覆膜進行加熱,焙燒F粉末(F聚合物)而於聚合物膜之表面形成聚合物層。焙燒範圍之溫度意指焙燒中之氛圍之溫度。 認為F粉末之粒子緊密堆積,F粉末(F聚合物)融合而形成聚合物層。再者,於液狀組合物含有熱熔融性AR聚合物之情形時,形成包含F聚合物與AR聚合物之混合物之聚合物層,於液狀組合物含有熱固性AR聚合物之情形時,形成包含F聚合物與AR聚合物之硬化物之聚合物層。 In this method, it is preferable to further heat the dry film in a temperature range exceeding the holding temperature in the low temperature range (hereinafter, also referred to as "calcination range"), and calcine the F powder (F polymer) to polymerize. A polymer layer is formed on the surface of the film. The temperature in the firing range means the temperature of the atmosphere during firing. It is considered that the particles of the F powder are tightly packed, and the F powder (F polymer) is fused to form a polymer layer. Furthermore, when the liquid composition contains a thermosetting AR polymer, a polymer layer comprising a mixture of the F polymer and the AR polymer is formed, and when the liquid composition contains a thermosetting AR polymer, a polymer layer is formed. A polymer layer comprising a hardened product of F polymer and AR polymer.

焙燒中之氛圍可為常壓下、減壓下之任一狀態。又,上述氛圍可為氧氣等氧化性氣體氛圍、氫氣等還原性氣體氛圍、稀有氣體、氮氣等惰性氣體氛圍之任一種。 焙燒中之氛圍較佳為包含惰性氣體且氧氣濃度較低之氣體氛圍,更佳為包含氮氣且氧氣濃度(以體積為基準)未達500 ppm之氣體氛圍。氧氣濃度(以體積為基準)通常為1 ppm以上。於該範圍內,容易抑制聚合物成分之氧化分解,並且提昇聚合物層之接著性。 焙燒範圍之溫度較佳為F聚合物之熔融溫度以上,更佳為300~380℃。 保持在焙燒範圍之溫度之時間較佳為30秒~5分鐘,尤佳為1~2分鐘。 The atmosphere during the calcination may be in any state under normal pressure or under reduced pressure. In addition, the atmosphere may be any of an oxidizing gas atmosphere such as oxygen, a reducing gas atmosphere such as hydrogen, a rare gas, and an inert gas atmosphere such as nitrogen. The atmosphere during the calcination is preferably a gas atmosphere containing an inert gas and a low oxygen concentration, more preferably a gas atmosphere containing nitrogen and an oxygen concentration (based on volume) of less than 500 ppm. Oxygen concentration (on a volume basis) is usually above 1 ppm. Within this range, the oxidative decomposition of the polymer component is easily suppressed, and the adhesiveness of the polymer layer is improved. The temperature in the calcination range is preferably higher than the melting temperature of the F polymer, more preferably 300 to 380°C. The time for maintaining the temperature in the firing range is preferably 30 seconds to 5 minutes, more preferably 1 to 2 minutes.

於在聚合物膜之兩面形成聚合物層之情形時,較佳為對聚合物膜之一表面賦予液狀組合物,進行加熱而去除液狀分散介質,對聚合物膜之另一表面賦予液狀組合物,進行加熱而去除液狀分散介質,進而進行加熱而焙燒F聚合物,形成各自之聚合物層,而獲得積層膜。 於聚合物膜之兩面具有聚合物層之積層膜可以如下方式獲得,即,對聚合物膜之兩個表面賦予液狀組合物,進行加熱而去除液狀分散介質,進而進行加熱而焙燒F聚合物,從而同時形成兩個表面之聚合物層。 When the polymer layers are formed on both sides of the polymer film, it is preferable to apply the liquid composition to one surface of the polymer film, remove the liquid dispersion medium by heating, and apply the liquid composition to the other surface of the polymer film. The composition is heated to remove the liquid dispersion medium, and the F polymer is further heated to calcine the F polymer to form the respective polymer layers, thereby obtaining a laminated film. A laminated film having a polymer layer on both surfaces of a polymer film can be obtained by applying a liquid composition to both surfaces of the polymer film, heating to remove the liquid dispersion medium, and heating to bake F-polymerization material, thereby simultaneously forming polymer layers on both surfaces.

於聚合物膜之兩面具有聚合物層之積層膜較佳為將聚合物膜浸漬於液狀組合物中而對聚合物膜之兩個表面賦予液狀組合物後,通過焙燒爐進行加熱而獲得。具體而言,更佳為將聚合物膜浸漬於液狀組合物中之後,將聚合物膜一面自液狀組合物提拉一面通過焙燒爐進行加熱而獲得。 提拉聚合物膜並通過焙燒爐之方向較佳為鉛直向上。於該情形時,容易形成平滑之聚合物層。於將聚合物膜鉛直向上提拉後,可一面鉛直向下拉一面進一步加熱,亦可不進行加熱而鉛直向下拉,從而拉取聚合物膜。 又,賦予至聚合物膜之液狀組合物之量可使附著有液狀組合物之聚合物膜通過一對輥間來調整。 此種積層膜可使用具有浸漬塗佈機及焙燒爐之裝置適宜製造。作為焙燒爐,可例舉立式焙燒爐。又,作為此種裝置,可例舉田端機械工業公司製造之玻璃布塗佈裝置。 The laminated film having the polymer layer on both surfaces of the polymer film is preferably obtained by immersing the polymer film in the liquid composition to give the liquid composition to both surfaces of the polymer film, and then heating it in a calciner. . Specifically, after immersing the polymer film in the liquid composition, it is more preferably obtained by heating the polymer film in a baking furnace while being pulled from the liquid composition. The direction in which the polymer film is pulled and passed through the calciner is preferably vertically upward. In this case, a smooth polymer layer is easily formed. After the polymer film is pulled up vertically, it can be further heated while being pulled down vertically, or it can be pulled down vertically without heating, thereby pulling the polymer film. In addition, the amount of the liquid composition to be applied to the polymer film can be adjusted by passing the polymer film to which the liquid composition adhered between a pair of rolls. Such a laminated film can be suitably produced using an apparatus having a dip coater and a baking furnace. As the roasting furnace, a vertical roasting furnace may, for example, be mentioned. Moreover, as such an apparatus, the glass cloth coating apparatus manufactured by Tatabata Machinery Co., Ltd. can be mentioned.

聚合物膜之平均厚度較佳為10 μm以上,更佳為15 μm以上。聚合物膜之平均厚度較佳為500 μm以下,更佳為100 μm以下。 聚合物層之平均厚度較佳為10 μm以上,更佳為15 μm以上。聚合物層之平均厚度較佳為500 μm以下,更佳為100 μm以下。若使用本法中之液狀組合物,則可形成相對較厚且厚度之不均較小之聚合物層。 又,積層膜之平均厚度較佳為30 μm以上,更佳為40 μm以上。積層膜之平均厚度較佳為1000 μm以下,更佳為200 μm以下。 The average thickness of the polymer film is preferably 10 μm or more, more preferably 15 μm or more. The average thickness of the polymer film is preferably 500 μm or less, more preferably 100 μm or less. The average thickness of the polymer layer is preferably 10 μm or more, more preferably 15 μm or more. The average thickness of the polymer layer is preferably 500 μm or less, more preferably 100 μm or less. If the liquid composition in this method is used, a relatively thick polymer layer with less uneven thickness can be formed. Moreover, the average thickness of the laminated film is preferably 30 μm or more, more preferably 40 μm or more. The average thickness of the laminated film is preferably 1000 μm or less, more preferably 200 μm or less.

本發明之積層膜(以下,亦記為「本積層膜」)具備:聚合物膜,其具有實施了提高表面張力之處理之表面;及聚合物層,其形成於該表面並含有F聚合物。而且,於此種本積層膜中,聚合物層之端部之厚度相對於中央部之厚度之比為1.1以下,較佳為1.07以下,更佳為1.04以下。滿足此種厚度關係之聚合物層可謂其厚度不均較小。 本積層膜較佳為長條。於該情形時,較佳為本積層膜之寬度方向(短邊方向:CD方向(cross direction,橫向))之中央部處之厚度與寬度方向之端部處之厚度的比滿足上述關係。於該情形時,於將長條之本積層膜捲成輥狀而保管時,若聚合物層之厚度滿足上述關係,則於寬度方向之端部不易產生皺褶。 The laminated film of the present invention (hereinafter, also referred to as "this laminated film") includes: a polymer film having a surface treated to increase surface tension; and a polymer layer formed on the surface and containing the F polymer . Furthermore, in such a present laminated film, the ratio of the thickness of the edge portion of the polymer layer to the thickness of the central portion is 1.1 or less, preferably 1.07 or less, and more preferably 1.04 or less. A polymer layer satisfying such a thickness relationship can be said to have a small thickness variation. The laminated film is preferably a long strip. In this case, it is preferable that the ratio of the thickness at the center of the laminated film in the width direction (short-side direction: CD direction (cross direction)) to the thickness at the ends in the width direction satisfies the above relationship. In this case, if the thickness of the polymer layer satisfies the above-mentioned relationship when the long present laminated film is wound into a roll shape and stored, wrinkles are less likely to occur at the ends in the width direction.

再者,長條之本積層膜之長邊方向(MD方向(Machine direction,機械方向))之長度較佳為1~1000 m,短邊方向(CD方向)之長度較佳為100~10000 mm。 又,關於本積層膜中之F聚合物及AR聚合物之定義及範圍,包括適宜態樣在內,均與本法中之其等相同。又,關於本積層膜中之構成及物性之範圍,包括適宜態樣在內,均與本法中之其等相同。 本積層膜可僅於聚合物膜之單面具備聚合物層,亦可於聚合物膜之兩面具備聚合物層,較佳為後者。於後者之情形時,容易防止本積層膜產生翹曲。 Furthermore, the length of the long-side direction (MD direction (Machine direction, machine direction)) of the elongated laminated film is preferably 1-1000 m, and the length of the short-side direction (CD direction) is preferably 100-10000 mm . In addition, the definition and scope of the F polymer and AR polymer in this laminated film, including suitable aspects, are the same as those in this Act. In addition, the range of the composition and physical properties in this laminated film, including suitable aspects, are the same as those in this Act. The laminated film may have a polymer layer only on one side of the polymer film, or may have a polymer layer on both sides of the polymer film, and the latter is preferred. In the latter case, it is easy to prevent warpage of the laminated film.

於本積層膜於聚合物膜之兩面具備聚合物層之情形時,2個聚合物層之合計平均厚度相對於聚合物膜之平均厚度之比較佳為1以上。上述比較佳為3以下。於該情形時,容易均衡良好地展現聚合物膜中之基礎聚合物之物性(高降伏強度、難塑性變形性等)、及聚合物層中之F聚合物物性(低介電常數、低介電損耗因數等電特性、低吸水性等)。又,即便於上述比較大且聚合物層較厚之本積層膜中,亦容易抑制翹曲或剝離。尤其是若聚合物膜之拉伸彈性模數為上述下限值以上,則該趨勢容易變得顯著。When the present laminated film has polymer layers on both sides of the polymer film, the ratio of the total average thickness of the two polymer layers to the average thickness of the polymer film is preferably 1 or more. The above-mentioned comparison is preferably 3 or less. In this case, the physical properties of the base polymer in the polymer film (high yield strength, difficult plastic deformation, etc.) and the physical properties of the F polymer in the polymer layer (low dielectric constant, low dielectric constant, etc.) Electrical properties such as electrical dissipation factor, low water absorption, etc.). Moreover, even in the present laminated film which is relatively large and the polymer layer is thick, it is easy to suppress warpage and peeling. In particular, when the tensile modulus of elasticity of the polymer film is equal to or higher than the above lower limit value, this tendency tends to become remarkable.

又,2個聚合物層之厚度較佳為相等。於該情形時,2個聚合物層之線膨脹係數更接近,因此本積層膜更不易產生翹曲。 本積層膜之介電常數較佳為2.0~3.0。於該情形時,可將本積層膜適宜用於要求低介電常數之印刷基板材料等。 本積層膜之介電損耗因數較佳為0.0001~0.0020。 Also, the thicknesses of the two polymer layers are preferably equal. In this case, the linear expansion coefficients of the two polymer layers are closer, so the laminated film is less likely to warp. The dielectric constant of the laminated film is preferably 2.0 to 3.0. In this case, the present laminated film can be suitably used for a printed circuit board material or the like requiring a low dielectric constant. The dielectric loss factor of the laminated film is preferably 0.0001 to 0.0020.

本積層膜之線膨脹係數之絕對值較佳為30 ppm/℃以下,更佳為20 ppm/℃以下,進而較佳為10 ppm/℃以下。於該情形時,不論配置本積層膜之氛圍之溫度等如何,均可有效地防止本積層膜產生翹曲。本積層膜之線膨脹係數之絕對值之下限為0 ppm/℃。 本積層膜中之聚合物層與聚合物膜之剝離強度較佳為10 N/cm以上,更佳為15 N/cm以上,進而較佳為20 N/cm以上。本積層膜之剝離強度之上限為100 N/cm。 The absolute value of the linear expansion coefficient of the laminated film is preferably 30 ppm/°C or less, more preferably 20 ppm/°C or less, and still more preferably 10 ppm/°C or less. In this case, irrespective of the temperature of the atmosphere in which the laminated film is arranged, etc., the occurrence of warpage of the laminated film can be effectively prevented. The lower limit of the absolute value of the linear expansion coefficient of the laminated film is 0 ppm/°C. The peel strength between the polymer layer and the polymer film in the laminated film is preferably 10 N/cm or more, more preferably 15 N/cm or more, and still more preferably 20 N/cm or more. The upper limit of the peel strength of the laminated film is 100 N/cm.

又,本積層膜發揮較低之吸水性(較高之水阻隔性)。認為其要因在於,聚合物層與聚合物膜相互獨立地存在,而並非為相容而成之一體化物,因此F聚合物之低吸水性補充基礎聚合物之高吸水性。 具體而言,將本積層膜於50℃下預乾燥48小時後,於23℃之純水中浸漬24小時,測定於純水中浸漬前後之本積層膜之質量後,基於式: 吸水率(%)=(純水浸漬後質量-預乾燥後質量)/預乾燥後質量×100 求出之吸水率較佳為0.1%以下,更佳為0.07%以下,進而較佳為0.05%以下。本積層膜之吸水率之下限為0%。 具有此種較低之吸水率之本積層膜不易因吸水而變形,因此適宜用於印刷基板材料等。 In addition, this laminated film exhibits low water absorption (high water barrier properties). The reason for this is considered to be that the polymer layer and the polymer film exist independently of each other, rather than being a compatible integrated body, so the low water absorption of the F polymer complements the high water absorption of the base polymer. Specifically, the laminated film was pre-dried at 50°C for 48 hours, then immersed in pure water at 23°C for 24 hours, and the mass of the laminated film before and after the immersion in pure water was measured, based on the formula: Water absorption rate (%) = (mass after pure water immersion - mass after pre-drying) / mass after pre-drying × 100 The obtained water absorption is preferably 0.1% or less, more preferably 0.07% or less, and still more preferably 0.05% or less. The lower limit of the water absorption of this laminated film is 0%. The laminated film having such a low water absorption rate is not easily deformed by water absorption, so it is suitable for use as a printed circuit board material and the like.

再者,聚合物層中含有AR聚合物之本積層膜之紫外線(UV)吸收性較高,適合藉由UV-YAG(ultraviolet-yttrium aluminum garnet,紫外線釔鋁石榴石)雷射等雷射所進行之加工。認為其要因在於,在聚合物層中,AR聚合物高度地分散,形成某種基質,並且均勻地分佈,因此AR聚合物所具有之芳香族環展現出良好之UV吸收性。 此種聚合物層藉由雷射加工,可簡便地形成具有良好形狀之通孔,因此具有該聚合物層之本積層膜尤其適宜用作印刷基板材料。 Furthermore, the multilayer film containing AR polymer in the polymer layer has high ultraviolet (UV) absorption, and is suitable for use by lasers such as UV-YAG (ultraviolet-yttrium aluminum garnet, ultraviolet yttrium aluminum garnet) laser. processing. The reason for this is considered to be that, in the polymer layer, the AR polymer is highly dispersed, forms a certain matrix, and is uniformly distributed, so that the aromatic ring possessed by the AR polymer exhibits good UV absorption. Such a polymer layer can be easily formed into a through hole having a good shape by laser processing, so the laminate film having the polymer layer is particularly suitable for use as a printed circuit board material.

聚合物膜為芳香族聚醯亞胺膜之本積層膜可用作離型膜或承載膜。本積層膜由於聚合物層與聚合物膜之接著性優異,不易發生層間剝離,故而可作為承載膜反覆使用。又,聚合物層由於耐熱性優異,故而即便反覆使用,離型性亦不易變差。The polymer film is an aromatic polyimide film. This laminate film can be used as a release film or a carrier film. Since the present laminate film has excellent adhesion between the polymer layer and the polymer film, and interlayer peeling is unlikely to occur, it can be used repeatedly as a carrier film. Moreover, since the polymer layer is excellent in heat resistance, even if it is used repeatedly, the mold release property is not liable to deteriorate.

具體而言,於此種本積層膜之聚合物層之表面塗佈包含樹脂或無機填料之分散液或者清漆,進行乾燥而形成塗膜,繼而,自塗膜剝離本積層膜,便可獲得獨立之塗膜。例如,於本積層膜之聚合物層之表面形成有上述塗膜後,將具有此種塗膜之本積層膜之塗膜側與其他基材貼合,剝離本積層膜,便可獲得其他基材與塗膜之積層體。 於在本積層膜之聚合物層之表面形成塗膜時,例如可於乾燥時,於F聚合物之熔點以下之溫度下進行加熱。本積層膜由於耐熱性優異,故而即便反覆進行加熱處理亦不易變形。 Specifically, a dispersion liquid or a varnish containing a resin or an inorganic filler is applied to the surface of the polymer layer of the present laminated film, dried to form a coating film, and then the present laminated film is peeled off from the coating film to obtain an independent the coating. For example, after the above-mentioned coating film is formed on the surface of the polymer layer of the present laminated film, the coating film side of the present laminated film having such a coating film is bonded to another substrate, and the present laminated film is peeled off to obtain other substrates. A laminate of material and coating film. When forming a coating film on the surface of the polymer layer of the present laminate film, for example, during drying, heating may be performed at a temperature below the melting point of the F polymer. Since this laminated film is excellent in heat resistance, it is hard to deform|transform even if it heat-processes repeatedly.

具體而言,本積層膜可用作陶瓷坯片形成用承載膜、二次電池形成用承載膜、固體高分子電解質膜形成用承載膜、固體高分子電解質膜之觸媒形成用承載膜。 於將本積層膜用作承載膜之情形時,基於獲得厚度均勻之上述塗膜之觀點而言,本積層膜之端部之厚度相對於中央部之厚度之比較佳為1.1以下,更佳為1.07以下,進而較佳為1.04以下。厚度之比為1以上。 Specifically, the laminated film can be used as a carrier film for forming a ceramic green sheet, a carrier film for forming a secondary battery, a carrier film for forming a solid polymer electrolyte membrane, and a carrier film for forming a catalyst for a solid polymer electrolyte membrane. In the case of using the laminated film as a carrier film, from the viewpoint of obtaining the above-mentioned coating film with a uniform thickness, the ratio of the thickness of the end portion of the laminated film to the thickness of the central portion is preferably 1.1 or less, more preferably 1.07 or less, more preferably 1.04 or less. The thickness ratio is 1 or more.

本積層膜由於聚合物層之表面之接著性優異,故而可與其他基材容易且牢固地接合。作為其他基材,可例舉:金屬箔、金屬導體。例如,於本積層膜之兩面貼合金屬箔,便可獲得金屬箔積層體。然後,對金屬箔進行加工,可將金屬箔積層體容易地加工成印刷基板。 作為構成金屬箔之金屬,可例舉:銅、銅合金、不鏽鋼、鎳、鎳合金(亦包含42合金)、鋁、鋁合金、鈦、鈦合金。 作為金屬箔,較佳為銅箔,更佳為正面及背面無區別之壓延銅箔或正面及背面有區別之電解銅箔,進而較佳為壓延銅箔。壓延銅箔由於表面粗糙度較小,故而即便於將金屬箔積層體加工成印刷基板之情形時,亦可降低傳輸損耗。又,壓延銅箔較佳為浸漬於烴系有機溶劑中,在去除壓延油後再進行使用。 Since this laminate film has excellent adhesiveness on the surface of the polymer layer, it can be easily and firmly bonded to other substrates. As another base material, a metal foil and a metal conductor are mentioned. For example, a metal foil laminate can be obtained by bonding metal foil to both surfaces of the laminate film. Then, by processing the metal foil, the metal foil laminate can be easily processed into a printed circuit board. As a metal which comprises a metal foil, copper, a copper alloy, stainless steel, nickel, a nickel alloy (Alloy 42 is also included), aluminum, an aluminum alloy, titanium, and a titanium alloy are mentioned. The metal foil is preferably a copper foil, more preferably a rolled copper foil with no distinction between the front and the back, or an electrolytic copper foil with a distinction between the front and the back, and more preferably a rolled copper foil. Since the surface roughness of the rolled copper foil is small, the transmission loss can be reduced even when the metal foil laminate is processed into a printed circuit board. Moreover, it is preferable that the rolled copper foil is immersed in a hydrocarbon-based organic solvent, and is used after removing the rolling oil.

金屬箔之表面之十點平均粗糙度較佳為0.01~4 μm。於該情形時,與聚合物層之接著性變得良好,容易獲得傳輸特性優異之印刷基板。 金屬箔之表面亦可進行粗化處理。作為粗化處理之方法,可例舉:形成粗化處理層之方法、乾式蝕刻法、濕式蝕刻法。 金屬箔之厚度只要為於金屬箔積層體之用途中可發揮充分功能之厚度即可。金屬箔之厚度較佳為未達20 μm,更佳為2~15 μm。 又,金屬箔之一部分表面或整個表面可藉由矽烷偶合劑進行處理。 The ten-point average roughness of the surface of the metal foil is preferably 0.01 to 4 μm. In this case, the adhesiveness with the polymer layer becomes favorable, and it becomes easy to obtain the printed circuit board which is excellent in the transmission characteristic. The surface of the metal foil can also be roughened. As a roughening process method, the method of forming a roughening process layer, a dry etching method, and a wet etching method are mentioned. The thickness of the metal foil may be a thickness sufficient to function in the application of the metal foil laminate. The thickness of the metal foil is preferably less than 20 μm, more preferably 2 to 15 μm. Also, a part of the surface or the entire surface of the metal foil may be treated with a silane coupling agent.

於金屬箔積層體中,作為在聚合物層之表面積層金屬箔之方法,可例舉將本積層膜與金屬箔進行熱壓之方法。 熱壓中之加壓溫度較佳為310~400℃。 基於抑制氣泡混入,抑制由氧化所引起之劣化之觀點而言,熱壓較佳為於20 kPa以下之真空度下進行。 又,於熱壓時,較佳為達到上述真空度後進行升溫。若於達到上述真空度之前進行升溫,則有聚合物層於軟化狀態即具有一定程度之流動性、密接性之狀態下被壓接,而導致產生氣泡之情形。 基於抑制金屬箔破損,並且使聚合物層與金屬箔牢固地密接之觀點而言,熱壓中之壓力較佳為0.2~10 MPa。 尤其是,若聚合物膜之拉伸彈性模數為上述下限值以上,則容易抑制因熱壓中之加熱冷卻而產生皺褶。 In the metal foil laminate, as a method of layering the metal foil on the surface area of the polymer layer, a method of hot-pressing the laminate film and the metal foil can be exemplified. The pressing temperature in the hot pressing is preferably 310 to 400°C. From the viewpoint of suppressing the incorporation of air bubbles and suppressing deterioration due to oxidation, the hot pressing is preferably performed at a degree of vacuum of 20 kPa or less. In addition, in the case of hot pressing, it is preferable to raise the temperature after reaching the above-mentioned degree of vacuum. If the temperature is raised before reaching the above-mentioned degree of vacuum, the polymer layer may be press-bonded in a softened state, that is, in a state having a certain degree of fluidity and adhesion, resulting in the generation of air bubbles. The pressure in the hot pressing is preferably 0.2 to 10 MPa from the viewpoint of suppressing breakage of the metal foil and making the polymer layer and the metal foil tightly adhered. In particular, when the tensile modulus of elasticity of the polymer film is equal to or more than the above lower limit value, it is easy to suppress the occurrence of wrinkles due to heating and cooling during hot pressing.

金屬箔積層體可作為軟性銅箔積層板或剛性銅箔積層板用於製造印刷基板。 印刷基板例如可使用如下方法製造:藉由蝕刻等將金屬箔積層體中之金屬箔加工成特定圖案之導體電路(圖案電路)之方法;或藉由電鍍法(半加成法(SAP法)、改良型半加成法(MSAP法)等)將本發明之金屬箔積層體加工成圖案電路之方法。 於製造印刷基板時,可於形成圖案電路後,於圖案電路上形成層間絕緣膜,於層間絕緣膜上進而形成導體電路,亦可於圖案電路上積層阻焊劑,還可於圖案電路上積層覆蓋膜。層間絕緣膜、阻焊劑及覆蓋膜可分別由上述液狀組合物形成。 Metal foil laminates can be used as flexible copper foil laminates or rigid copper foil laminates to manufacture printed circuit boards. The printed circuit board can be produced, for example, by a method of processing the metal foil in the metal foil laminate into a conductor circuit (pattern circuit) of a specific pattern by etching or the like; or by a plating method (semi-additive method (SAP method) , improved semi-additive method (MSAP method, etc.) to process the metal foil laminate of the present invention into a pattern circuit. When manufacturing a printed circuit board, after forming a pattern circuit, an interlayer insulating film can be formed on the pattern circuit, and a conductor circuit can be formed on the interlayer insulating film, and a solder resist can also be laminated on the pattern circuit, and can also be laminated on the pattern circuit. membrane. The interlayer insulating film, the solder resist, and the cover film can be formed from the above-mentioned liquid compositions, respectively.

於金屬箔積層體中,金屬箔與本積層膜之剝離強度較佳為10 N/cm以上,更佳為15 N/cm以上,進而較佳為20 N/cm以上。金屬箔與本積層膜之剝離強度之上限通常為100 N/cm。根據本積層膜,熱壓接時變形得以抑制,因此以較高之密接性與金屬箔接合,容易獲得剝離強度較高之金屬箔積層體。In the metal foil laminate, the peel strength between the metal foil and the laminate film is preferably 10 N/cm or more, more preferably 15 N/cm or more, and still more preferably 20 N/cm or more. The upper limit of the peel strength of the metal foil and the laminated film is usually 100 N/cm. According to this laminated film, deformation during thermocompression bonding is suppressed, so that it is bonded to the metal foil with high adhesiveness, and it is easy to obtain a metal foil laminate with high peel strength.

以上,對本發明之積層膜之製造方法及積層膜進行了說明,但本發明並不限定於上述實施方式之構成。 例如,本發明之積層膜可於上述實施方式之構成中追加其他任意構成,亦可與發揮相同功能之任意構成進行置換。 又,本發明之積層膜之製造方法可於上述實施方式之構成中追加其他任意步驟,亦可與發揮相同功能之任意步驟進行置換。 [實施例] As mentioned above, although the manufacturing method and the laminated film of the laminated|multilayer film of this invention were demonstrated, this invention is not limited to the structure of the said embodiment. For example, other arbitrary structures may be added to the structure of the above-mentioned embodiment, and the laminated film of the present invention may be replaced with an arbitrary structure that exhibits the same function. Moreover, in the manufacturing method of the laminated|multilayer film of this invention, other arbitrary steps may be added to the structure of the above-mentioned embodiment, and the arbitrary steps which exhibit the same function may be replaced. [Example]

以下,例舉實施例,具體地說明本發明,但本發明並不限定於其等。 1.各成分之準備 [F聚合物] F聚合物1:包含98.0莫耳%之TFE單元、0.1莫耳%之NAH單元及1.9莫耳%之PPVE單元,且相對於主鏈碳數每1×10 6個具有1000個含羰基之基的PFA系聚合物(熔融溫度:300℃) F聚合物2:包含97.5莫耳%之TFE單元及2.5莫耳%之PPVE單元,且相對於主鏈碳數每1×10 6個具有25個含羰基之基的PFA系聚合物(熔融溫度:305℃) [粉末] 粉末1:D50為1.9 μm,包含F聚合物1之粉末 粉末2:D50為2.0 μm,包含F聚合物2之粉末 Hereinafter, although an Example is given and this invention is demonstrated concretely, this invention is not limited to these. 1. Preparation of each component [F polymer] F polymer 1: contains 98.0 mol % of TFE units, 0.1 mol % of NAH units and 1.9 mol % of PPVE units, and each 1 ×10 6 PFA-based polymer having 1,000 carbonyl-containing groups (melting temperature: 300° C.) F polymer 2: contains 97.5 mol % of TFE units and 2.5 mol % of PPVE units, and relative to the main chain PFA-based polymer having 25 carbonyl-containing groups per 1×10 6 carbon number (melting temperature: 305° C.) [Powder] Powder 1: D50 is 1.9 μm, Powder 2 containing F polymer 1: D50 is 2.0 μm, powder containing F polymer 2

[液狀分散介質] 液狀分散介質1:N-甲基-2-吡咯啶酮(NMP:表面張力41 mN/m) 液狀分散介質2:甲苯(Tol:表面張力27 mN/m) [界面活性劑] 界面活性劑1:CH 2=C(CH 3)C(O)OCH 2CH 2(CF 2) 6F與CH 2=C(CH 3)C(O)(OCH 2CH 2) 23OH之共聚物,氟含量為35質量%之非離子性聚合物 [AR聚合物之清漆] 清漆1:包含作為芳香族聚醯亞胺之AR聚合物1(玻璃轉移點:315℃)之NMP溶液(固形物成分:10質量%) [聚合物膜] 聚醯亞胺膜1:厚度為50 μm,玻璃轉移點為315℃,醯亞胺基密度為0.25,320℃下之拉伸彈性模數為0.3 GPa之芳香族聚醯亞胺膜 [Liquid Dispersion Medium] Liquid Dispersion Medium 1: N-methyl-2-pyrrolidone (NMP: Surface Tension: 41 mN/m) Liquid Dispersion Medium 2: Toluene (Tol: Surface Tension: 27 mN/m) [ Surfactant] Surfactant 1: CH 2 =C(CH 3 )C(O)OCH 2 CH 2 (CF 2 ) 6 F and CH 2 =C(CH 3 )C(O)(OCH 2 CH 2 ) Copolymer of 23 OH, nonionic polymer with a fluorine content of 35% by mass [varnish of AR polymer] Varnish 1: containing AR polymer 1 (glass transition point: 315°C) as aromatic polyimide NMP solution (solid content: 10% by mass) [Polymer film] Polyimide film 1: thickness of 50 μm, glass transition point of 315°C, imide group density of 0.25, tensile elasticity at 320°C Aromatic polyimide film with modulus 0.3 GPa

2.液狀組合物之製備 (液狀組合物1) 將67質量份之液狀分散介質1、3質量份之界面活性劑1及30質量份之粉末1投入坩堝後,於坩堝內投入氧化鋯球。其後,以150 rpm將坩堝滾動1小時,使粉末1分散,獲得液狀組合物1。 (液狀組合物2) 將87質量份之液狀分散介質1、3質量份之界面活性劑1及10質量份之粉末1投入坩堝後,於坩堝內投入氧化鋯球。其後,以150 rpm將坩堝滾動1小時,使粉末1分散,獲得液狀組合物2。 2. Preparation of liquid composition (liquid composition 1) After 67 parts by mass of the liquid dispersion medium 1, 3 parts by mass of the surfactant 1, and 30 parts by mass of the powder 1 were put into the crucible, zirconia balls were put into the crucible. Then, the crucible was rolled at 150 rpm for 1 hour to disperse the powder 1, and the liquid composition 1 was obtained. (Liquid composition 2) After 87 parts by mass of the liquid dispersion medium 1, 3 parts by mass of the surfactant 1, and 10 parts by mass of the powder 1 were put into the crucible, zirconia balls were put into the crucible. Then, the crucible was rolled at 150 rpm for 1 hour to disperse the powder 1, and the liquid composition 2 was obtained.

(液狀組合物3) 除將粉末1變更為粉末2以外,以與液狀組合物1相同之方式製備液狀組合物3。 (液狀組合物4) 除將液狀分散介質1變更為液狀分散介質2以外,以與液狀組合物3相同之方式製備液狀組合物4。 (液狀組合物5) 將70質量份之液狀分散介質1及30質量份之粉末2投入坩堝後,於坩堝內投入氧化鋯球。其後,以150 rpm將坩堝滾動1小時,使粉末2分散,獲得液狀組合物5。 (液狀組合物6) 將57質量份之液狀分散介質1、10質量份之清漆1、3質量份之界面活性劑1及30質量份之粉末1投入坩堝後,於坩堝內投入氧化鋯球。其後,以150 rpm將坩堝滾動1小時,使粉末1分散,獲得液狀組合物6。 (Liquid Composition 3) Liquid Composition 3 was prepared in the same manner as Liquid Composition 1 except that Powder 1 was changed to Powder 2. (Liquid Composition 4) Liquid composition 4 was prepared in the same manner as liquid composition 3 except that liquid dispersion medium 1 was changed to liquid dispersion medium 2 . (Liquid Composition 5) After 70 parts by mass of the liquid dispersion medium 1 and 30 parts by mass of the powder 2 were put into the crucible, zirconia balls were put into the crucible. Then, the crucible was rolled at 150 rpm for 1 hour to disperse the powder 2, and a liquid composition 5 was obtained. (Liquid composition 6) After 57 parts by mass of the liquid dispersion medium 1, 10 parts by mass of the varnish 1, 3 parts by mass of the surfactant 1, and 30 parts by mass of the powder 1 were put into the crucible, zirconia balls were put into the crucible. Then, the crucible was rolled at 150 rpm for 1 hour to disperse the powder 1, and a liquid composition 6 was obtained.

3.積層膜之製造 (例1) 首先,對聚醯亞胺膜1之兩面(表面張力:35 mN/m,表面之算術平均粗糙度:0.05 μm)實施電暈處理,於表面導入極性官能基。再者,電暈處理後之聚醯亞胺膜1之表面之表面張力為78 mN/m。 其次,於聚醯亞胺膜1之一面藉由小徑反向凹版法塗佈液狀組合物1,使之歷時3分鐘通過通風乾燥爐(爐溫:150℃),去除NMP而形成乾燥覆膜。 進而,於聚醯亞胺膜1之另一面,亦以相同之方式塗佈液狀組合物1,進行乾燥,而形成乾燥覆膜。 繼而,使兩面形成有乾燥覆膜之聚醯亞胺膜1歷時20分鐘通過遠紅外線爐(爐溫:320℃),熔融焙燒粉末1。藉此,於聚醯亞胺膜1之兩面形成包含F聚合物1之聚合物層(厚度:25 μm),獲得依序直接形成有上述聚合物層、上述聚醯亞胺膜1、上述聚合物層之長條之積層膜1。 3. Manufacture of laminated film (example 1) First, corona treatment was performed on both surfaces of the polyimide film 1 (surface tension: 35 mN/m, arithmetic mean roughness of the surface: 0.05 μm), and polar functional groups were introduced into the surfaces. Furthermore, the surface tension of the surface of the polyimide film 1 after the corona treatment was 78 mN/m. Next, the liquid composition 1 was coated on one surface of the polyimide film 1 by a small-diameter reverse gravure method, and passed through a ventilation drying oven (furnace temperature: 150° C.) for 3 minutes to remove NMP to form a dry coating. membrane. Furthermore, the other surface of the polyimide film 1 was also coated with the liquid composition 1 in the same manner, and dried to form a dry film. Next, the polyimide film 1 having the dry coating formed on both sides was passed through a far-infrared furnace (furnace temperature: 320° C.) for 20 minutes to melt and bake the powder 1 . Thereby, a polymer layer (thickness: 25 μm) containing the F polymer 1 was formed on both sides of the polyimide film 1, and the polymer layer, the polyimide film 1, and the polymer layer were directly formed in this order. The long layered film 1 of the object layer.

(例2) 除使用液狀組合物2代替液狀組合物1以外,以與例1相同之方式於聚醯亞胺膜1之兩面形成包含F聚合物1之聚合物層(厚度:25 μm),獲得依序直接形成有上述聚合物層、上述聚醯亞胺膜1、上述聚合物層之長條之積層膜2。 再者,於積層膜2中,為了形成厚度25 μm之聚合物層,必須將液狀組合物1之塗佈及熔融焙燒之操作反覆進行2次。 (例3) 除使用液狀組合物3代替液狀組合物1以外,以與例1相同之方式於聚醯亞胺膜1之兩面形成包含F聚合物2之聚合物層(厚度:25 μm),獲得依序直接形成有上述聚合物層、上述聚醯亞胺膜1、上述聚合物層之長條之積層膜3。 (Example 2) A polymer layer (thickness: 25 μm) containing the F polymer 1 was formed on both sides of the polyimide film 1 in the same manner as in Example 1 except that the liquid composition 2 was used instead of the liquid composition 1 to obtain a The above-mentioned polymer layer, the above-mentioned polyimide film 1, and the above-mentioned long-length laminated film 2 of the above-mentioned polymer layer are directly formed in this order. In addition, in the laminated film 2, in order to form a polymer layer with a thickness of 25 micrometers, it was necessary to repeat the operation of the application of the liquid composition 1 and the melt baking twice. (Example 3) A polymer layer (thickness: 25 μm) containing the F polymer 2 was formed on both sides of the polyimide film 1 in the same manner as in Example 1 except that the liquid composition 3 was used instead of the liquid composition 1 to obtain a The above-mentioned polymer layer, the above-mentioned polyimide film 1, and the above-mentioned long-length laminated film 3 of the above-mentioned polymer layer are directly formed in this order.

(例4) 除使用液狀組合物4代替液狀組合物1以外,以與例1相同之方式於聚醯亞胺膜1之兩面形成包含F聚合物2之聚合物層(厚度:25 μm),獲得依序直接形成有上述聚合物層、上述聚醯亞胺膜1、上述聚合物層之長條之積層膜4。 (例5) 除使用液狀組合物5代替液狀組合物1,且省略對聚醯亞胺膜1之表面進行之電暈處理以外,以與例1相同之方式於聚醯亞胺膜1之兩面形成包含F聚合物2之聚合物層(厚度:25 μm),獲得依序直接形成有上述聚合物層、上述聚醯亞胺膜1、上述聚合物層之長條之積層膜5。 (例6) 除使用液狀組合物6代替液狀組合物1以外,以與例1相同之方式於聚醯亞胺膜1之兩面形成包含F聚合物1及AR聚合物1之聚合物層(厚度:25 μm),獲得依序直接形成有上述聚合物層、上述聚醯亞胺膜1、上述聚合物層之長條之積層膜6。 (Example 4) A polymer layer (thickness: 25 μm) containing the F polymer 2 was formed on both sides of the polyimide film 1 in the same manner as in Example 1 except that the liquid composition 4 was used instead of the liquid composition 1 to obtain a The above-mentioned polymer layer, the above-mentioned polyimide film 1, and the above-mentioned long-length laminated film 4 of the above-mentioned polymer layer are directly formed in this order. (Example 5) Except that the liquid composition 5 was used instead of the liquid composition 1, and the corona treatment on the surface of the polyimide film 1 was omitted, the polyimide film 1 was formed on both sides of the polyimide film 1 in the same manner as in Example 1. A polymer layer (thickness: 25 μm) of the F polymer 2 was obtained, and a long layered film 5 in which the above-mentioned polymer layer, the above-mentioned polyimide film 1 and the above-mentioned polymer layer were directly formed in this order was obtained. (Example 6) A polymer layer (thickness: 25 cm) comprising F polymer 1 and AR polymer 1 was formed on both sides of the polyimide film 1 in the same manner as in Example 1, except that the liquid composition 6 was used instead of the liquid composition 1. μm) to obtain a long layered film 6 in which the above-mentioned polymer layer, the above-mentioned polyimide film 1, and the above-mentioned polymer layer are directly formed in this order.

4.評價 4-1.聚合物層之外觀 於各積層膜中,藉由目視觀察聚合物層之表面,並根據以下之基準進行評價。 [評價基準] ○:於聚合物層之表面未見不均,較平滑。 ×:於聚合物層之表面可見不均,不平滑。 4. Evaluation 4-1. Appearance of the polymer layer In each laminated film, the surface of the polymer layer was visually observed and evaluated according to the following criteria. [Evaluation Criteria] ○: No unevenness was seen on the surface of the polymer layer, and it was relatively smooth. ×: Unevenness and unevenness are seen on the surface of the polymer layer.

4-2.聚合物層之厚度之均勻性 於各積層膜中,測定1個聚合物層之短邊方向之中央部及端部之厚度,求出端部之厚度/中央部之厚度之比,並根據以下之基準進行評價。 [評價基準] ○:厚度之比為1.07以下。 △:厚度之比超過1.07且為1.1以下。 ×:厚度之比超過1.1。 4-2. Uniformity of thickness of polymer layer In each laminated film, the thickness of the center part and the edge part of the transversal direction of one polymer layer was measured, the ratio of the thickness of an edge part / the thickness of a center part was calculated|required, and it evaluated based on the following criteria. [Evaluation Criteria] ○: The thickness ratio is 1.07 or less. Δ: The thickness ratio exceeds 1.07 and is 1.1 or less. ×: The ratio of thickness exceeds 1.1.

4-3.吸水率 依據ASTM D570,將各積層膜於50℃下預乾燥48小時後,於23℃之純水中浸漬24小時。測定於純水中浸漬前後之積層膜之質量後,基於下式求出吸水率,根據以下之基準進行評價。 吸水率(%)=(純水浸漬後質量-預乾燥後質量)/預乾燥後質量×100 [評價基準] ◎:吸水率為0.05%以下。 ○:吸水率超過0.05%且為0.07%以下。 △:吸水率超過0.07%且為0.1%以下。 ×:吸水率超過0.1%。 4-3. Water absorption rate According to ASTM D570, each laminated film was pre-dried at 50°C for 48 hours, and then immersed in pure water at 23°C for 24 hours. After measuring the mass of the laminated film before and after immersion in pure water, the water absorption rate was calculated|required based on the following formula, and it evaluated based on the following criteria. Water absorption rate (%) = (mass after pure water immersion - mass after pre-drying) / mass after pre-drying × 100 [Evaluation Criteria] ⊚: Water absorption is 0.05% or less. ○: The water absorption rate exceeds 0.05% and is 0.07% or less. △: The water absorption rate exceeds 0.07% and is 0.1% or less. ×: The water absorption rate exceeds 0.1%.

4-4.剝離強度 自各積層膜切割出長度100 mm、寬度10 mm之矩形試驗片。其後,將聚醯亞胺膜1與聚合物層剝離至距離試驗片之長度方向之一端50 mm之位置。繼而,以距離試驗片之長度方向之一端50 mm之位置作為中央,使用拉伸試驗機(Orientec公司製造),以拉伸速度50 mm/分鐘進行90度剝離,將最大負載設為剝離強度(N/cm),並根據以下之評價基準進行評價。 [評價基準] ○:剝離強度為15 N/cm以上。 △:剝離強度為10 N/cm以上且未達15 N/cm。 ×:剝離強度未達10 N/cm。 4-4. Peel strength A rectangular test piece having a length of 100 mm and a width of 10 mm was cut out from each laminated film. Then, the polyimide film 1 and the polymer layer were peeled off to a position 50 mm from one end in the longitudinal direction of the test piece. Then, with a position 50 mm from one end in the longitudinal direction of the test piece as the center, a tensile tester (manufactured by Orientec) was used to perform 90-degree peeling at a tensile speed of 50 mm/min, and the maximum load was defined as the peel strength ( N/cm), and evaluated according to the following evaluation criteria. [Evaluation Criteria] ○: The peel strength is 15 N/cm or more. Δ: The peel strength is 10 N/cm or more and less than 15 N/cm. ×: The peel strength was less than 10 N/cm.

4-5.介電損耗因數 藉由SPDR(Split Post Dielectric Resonator,分離柱電介質諧振器)法測定各積層膜於10 GHz下之介電損耗因數,並根據以下之評價基準進行評價。 [評價基準] ◎:介電損耗因數為0.0015以下。 ○:介電損耗因數超過0.0015且為0.0020以下。 △:介電損耗因數超過0.0020且為0.0030以下。 ×:介電損耗因數超過0.0030。 將以上之結果示於以下之表1。 4-5. Dielectric loss factor The dielectric loss factor of each laminated film at 10 GHz was measured by the SPDR (Split Post Dielectric Resonator) method, and evaluated according to the following evaluation criteria. [Evaluation Criteria] ◎: The dielectric loss factor is 0.0015 or less. ○: The dielectric loss factor exceeds 0.0015 and is 0.0020 or less. Δ: The dielectric loss factor exceeds 0.0020 and is 0.0030 or less. ×: The dielectric loss factor exceeds 0.0030. The above results are shown in Table 1 below.

[表1] 積層膜No. 1 2 3 4 5 6 液狀組合物 F聚合物 1 1 2 2 2 1 液狀分散介質 NMP NMP NMP Tol NMP NMP 有無界面活性劑 有無AR聚合物 粉末之含量[質量%] 30 15 30 30 30 30 有無電暈處理 各層之厚度[μm] 25/50/25 25/50/25 25/50/25 25/50/25 25/50/25 25/50/25 外觀 × 厚度之均勻性 - × 吸水率 × × 剝離強度 × × 介電損耗因數 - - [產業上之可利用性] [Table 1] Laminated Film No. 1 2 3 4 5 6 liquid composition F polymer 1 1 2 2 2 1 liquid dispersion medium NMP NMP NMP Tol NMP NMP With or without surfactant Have Have Have Have none Have With or without AR polymer none none none none none Have Powder content [mass%] 30 15 30 30 30 30 With or without corona treatment Have Have Have Have none none Thickness of each layer [μm] 25/50/25 25/50/25 25/50/25 25/50/25 25/50/25 25/50/25 Exterior × uniformity of thickness - × water absorption × × peel strength × × Dielectric Dissipation Factor - - [Industrial Availability]

本發明之積層膜之剝離強度(密接性)優異,聚合物層之厚度之均勻性較高。因此,此種積層膜可加工成天線零件、印刷基板、飛機用零件、汽車用零件等來使用。The laminated film of the present invention is excellent in peel strength (adhesion), and the uniformity of the thickness of the polymer layer is high. Therefore, such a laminated film can be processed and used as antenna parts, printed circuit boards, aircraft parts, automobile parts, and the like.

Claims (15)

一種積層膜之製造方法,其係於實施了提高表面張力之處理之聚合物膜之表面塗佈液狀組合物,進行加熱,而獲得於上述聚合物膜之表面形成有聚合物層之積層膜,上述液狀組合物含有四氟乙烯系聚合物之粉末及表面張力為30 mN/m以上之液狀分散介質,且上述粉末之含量為10質量%以上。A method for producing a laminated film, comprising coating a liquid composition on the surface of a polymer film subjected to a treatment for increasing surface tension, and heating to obtain a laminated film in which a polymer layer is formed on the surface of the polymer film The liquid composition contains tetrafluoroethylene polymer powder and a liquid dispersion medium with a surface tension of 30 mN/m or more, and the content of the powder is 10 mass % or more. 如請求項1之製造方法,其中上述處理係選自由電暈處理及電漿處理所組成之群中之至少一種親水化處理。The manufacturing method of claim 1, wherein the above-mentioned treatment is at least one hydrophilization treatment selected from the group consisting of corona treatment and plasma treatment. 如請求項1或2之製造方法,其中實施了上述處理之上述聚合物膜之表面之表面張力大於上述液狀分散介質之表面張力。The production method of claim 1 or 2, wherein the surface tension of the surface of the polymer film subjected to the above treatment is greater than the surface tension of the liquid dispersion medium. 如請求項1至3中任一項之製造方法,其中上述聚合物膜之表面之算術平均粗糙度Ra為0.01~5 μm。The production method according to any one of claims 1 to 3, wherein the arithmetic mean roughness Ra of the surface of the polymer film is 0.01 to 5 μm. 如請求項1至4中任一項之製造方法,其中於實施了上述處理之上述聚合物膜之表面存在極性官能基。The production method according to any one of claims 1 to 4, wherein polar functional groups exist on the surface of the polymer film subjected to the above treatment. 如請求項1至5中任一項之製造方法,其中上述粉末之平均粒徑為0.1~10 μm。The production method according to any one of claims 1 to 5, wherein the average particle size of the powder is 0.1 to 10 μm. 如請求項1至6中任一項之製造方法,其中上述四氟乙烯系聚合物係熔融溫度為260~320℃之四氟乙烯系聚合物。The production method according to any one of claims 1 to 6, wherein the tetrafluoroethylene-based polymer is a tetrafluoroethylene-based polymer having a melting temperature of 260 to 320°C. 如請求項1至7中任一項之製造方法,其中上述四氟乙烯系聚合物係包含基於全氟(烷基乙烯基醚)之單元,且相對於所有單元包含1.5~5.0莫耳%之基於全氟(烷基乙烯基醚)之單元的四氟乙烯系聚合物。The production method according to any one of claims 1 to 7, wherein the tetrafluoroethylene-based polymer contains perfluoro(alkyl vinyl ether)-based units, and contains 1.5 to 5.0 mol % of all units. Tetrafluoroethylene-based polymers based on units of perfluoro(alkyl vinyl ether). 如請求項1至8中任一項之製造方法,其中上述液狀組合物含有芳香族聚合物。The production method according to any one of claims 1 to 8, wherein the liquid composition contains an aromatic polymer. 如請求項1至9中任一項之製造方法,其中上述聚合物膜含有芳香族聚醯亞胺。The production method according to any one of claims 1 to 9, wherein the polymer film contains an aromatic polyimide. 如請求項1至10中任一項之製造方法,其中上述聚合物膜之平均厚度為10 μm以上,且上述聚合物層之平均厚度為10 μm以上。The production method according to any one of claims 1 to 10, wherein the average thickness of the polymer film is 10 μm or more, and the average thickness of the polymer layer is 10 μm or more. 一種積層膜,其具備:聚合物膜,其具有實施了提高表面張力之處理之表面;及聚合物層,其形成於上述表面,含有四氟乙烯系聚合物,且上述聚合物層之端部之厚度相對於中央部之厚度之比為1.1以下。A laminated film comprising: a polymer film having a surface treated to increase surface tension; and a polymer layer formed on the surface, containing a tetrafluoroethylene-based polymer, and an end portion of the polymer layer The ratio of the thickness to the thickness of the central portion is 1.1 or less. 如請求項12之積層膜,其中將上述積層膜於50℃、48小時之條件下預乾燥後,於23℃之純水中浸漬24小時,測定於上述純水中浸漬前後之上述積層膜之質量時,基於下式求出之吸水率為0.1%以下; 吸水率(%)=(純水浸漬後質量-預乾燥後質量)/預乾燥後質量×100。 The laminated film of claim 12, wherein the laminated film is pre-dried at 50°C for 48 hours, and then immersed in pure water at 23°C for 24 hours, and the properties of the laminated film before and after immersion in pure water are measured In the case of mass, the water absorption rate calculated based on the following formula is 0.1% or less; Water absorption rate (%)=(mass after pure water immersion−mass after pre-drying)/mass after pre-drying×100. 如請求項12或13之積層膜,其中上述聚合物膜之平均厚度為10 μm以上,且上述聚合物層之平均厚度為10 μm以上。The laminated film of claim 12 or 13, wherein the average thickness of the polymer film is 10 μm or more, and the average thickness of the polymer layer is 10 μm or more. 如請求項12至14中任一項之積層膜,其中於上述聚合物膜之兩面具備上述聚合物層。The laminate film according to any one of claims 12 to 14, wherein the polymer layer is provided on both sides of the polymer film.
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