TW202214443A - Retardation film and method for manufacturing same - Google Patents

Retardation film and method for manufacturing same Download PDF

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TW202214443A
TW202214443A TW110126406A TW110126406A TW202214443A TW 202214443 A TW202214443 A TW 202214443A TW 110126406 A TW110126406 A TW 110126406A TW 110126406 A TW110126406 A TW 110126406A TW 202214443 A TW202214443 A TW 202214443A
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retardation film
retardation
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resin
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中西貞裕
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日商日東電工股份有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363Birefringent elements, e.g. for optical compensation
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/8791Arrangements for improving contrast, e.g. preventing reflection of ambient light

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Abstract

Provided are: a retardation film that has little change in phase difference in heated environments, humidified environments, and after contact with solvents, and that also has excellent solvent resistance; and a method for manufacturing the retardation film. The retardation film according to an embodiment of the present invention comprises a first cured layer, a retardation layer, and a second cured layer, in that order. The retardation layer is formed from a stretched resin film, and the stretched resin film includes a resin containing at least one binding group chosen from carbonate bonds and ester bonds. In the first cured layer and the second cured layer, a cross-linking agent that has a carbon-carbon double bond and the resin included in the stretched resin film are cross-linked via the carbon-carbon double bond.

Description

相位差膜及其製造方法Phase difference film and method for producing the same

本發明係關於一種相位差膜及其製造方法。The present invention relates to a retardation film and a manufacturing method thereof.

近年來,隨著薄型顯示器之普及,業界提出一種搭載了有機EL(Electroluminescence,電致發光)面板之顯示器。但有機EL面板具有反射性較高之金屬層,容易產生外界光反射及/或背景映入等問題。對此,已知藉由在視認側使用具有λ/4板之圓偏光板來防止該等問題。用於上述圓偏光板之相位差膜於加熱環境下及/或加濕環境下存在產生相位差變化之問題。進而,該相位差膜存在與溶劑接觸時亦產生相位差變化之問題。 先前技術文獻 專利文獻 In recent years, with the popularity of thin displays, the industry has proposed a display equipped with an organic EL (Electroluminescence, electroluminescence) panel. However, the organic EL panel has a metal layer with high reflectivity, which is prone to problems such as external light reflection and/or background reflection. In this regard, it is known to prevent such problems by using a circular polarizer with a λ/4 plate on the viewing side. The retardation film used for the above-mentioned circularly polarizing plate has a problem that the retardation changes in a heating environment and/or a humidified environment. Furthermore, this retardation film has a problem that the retardation changes even when it comes into contact with a solvent. prior art literature Patent Literature

專利文獻1:日本專利特開2006-171235號公報Patent Document 1: Japanese Patent Laid-Open No. 2006-171235

[發明所欲解決之問題][Problems to be Solved by Invention]

本發明係為了解決上述先前之問題而完成者,其主要目的在於提供一種相位差膜及其簡單製造方法,該相位差膜即便於加熱環境下及加濕環境下相位差變化亦較小,進而即便與溶劑接觸時相位差變化亦較小。 [解決問題之技術手段] The present invention is accomplished in order to solve the above-mentioned previous problems, and its main purpose is to provide a retardation film and a simple manufacturing method thereof, the retardation film has a small change in retardation even in a heating environment and a humidified environment, and furthermore The phase difference change is small even when it comes into contact with a solvent. [Technical means to solve problems]

本發明之實施方式之相位差膜依序具備第1硬化層、相位差層及第2硬化層,該相位差層由延伸樹脂膜形成,該延伸樹脂膜包含具有選自碳酸酯鍵及酯鍵中之至少一種鍵結基之樹脂,於該第1硬化層及該第2硬化層中,具有碳-碳雙鍵之交聯劑與該樹脂經由該碳-碳雙鍵交聯。 於一實施方式中,上述樹脂包含下式所表示之結構單元。 [化1]

Figure 02_image001
於一實施方式中,上述樹脂包含下式所表示之結構單元。 [化2]
Figure 02_image003
於一實施方式中,上述相位差膜滿足Re(450)<Re(550)<Re(650)之關係。 於一實施方式中,上述相位差膜滿足0.7<Re(450)/Re(550)<1.0之關係。 於一實施方式中,上述相位差膜之Re(550)為100 nm~180 nm或220 nm~330 nm。 於提供圓偏光板之態樣中,該圓偏光板具備上述相位差膜及偏光元件。 根據本發明之另一態樣,提供一種圖像顯示裝置。該圖像顯示裝置具備上述相位差膜。於另一實施方式中,該圖像顯示裝置具備上述圓偏光板。 根據本發明之另一態樣,提供一種上述相位差膜之製造方法。該製造方法包括使用自由基產生劑使上述樹脂與上述交聯劑經由上述交聯劑之上述碳-碳雙鍵交聯之步驟。 於一實施方式中,上述自由基產生劑為奪氫型光自由基產生劑。 於一實施方式中,上述自由基產生劑為奪氫型熱自由基產生劑。 [發明之效果] A retardation film according to an embodiment of the present invention includes a first cured layer, a retardation layer, and a second cured layer in this order, and the retardation layer is formed of a stretched resin film including a carbonic acid ester bond and an ester bond selected from the group consisting of In the resin of at least one bonding group, in the first hardened layer and the second hardened layer, a crosslinking agent having a carbon-carbon double bond and the resin are crosslinked through the carbon-carbon double bond. In one embodiment, the above-mentioned resin includes a structural unit represented by the following formula. [hua 1]
Figure 02_image001
In one embodiment, the above-mentioned resin includes a structural unit represented by the following formula. [hua 2]
Figure 02_image003
In one embodiment, the retardation film satisfies the relationship of Re(450)<Re(550)<Re(650). In one embodiment, the retardation film satisfies the relationship of 0.7<Re(450)/Re(550)<1.0. In one embodiment, Re(550) of the retardation film is 100 nm to 180 nm or 220 nm to 330 nm. In an aspect in which a circularly polarizing plate is provided, the circularly polarizing plate includes the above retardation film and a polarizing element. According to another aspect of the present invention, an image display device is provided. This image display device includes the above retardation film. In another embodiment, the image display device includes the aforementioned circular polarizer. According to another aspect of the present invention, a method for manufacturing the above retardation film is provided. The production method includes the step of crosslinking the above-mentioned resin and the above-mentioned cross-linking agent via the above-mentioned carbon-carbon double bond of the above-mentioned cross-linking agent using a radical generator. In one embodiment, the radical generator is a hydrogen abstraction type photoradical generator. In one embodiment, the radical generator is a hydrogen abstraction type thermal radical generator. [Effect of invention]

本發明之實施方式之相位差膜依序具備第1硬化層、相位差層及第2硬化層。相位差層由延伸樹脂膜形成,延伸樹脂膜包含具有選自碳酸酯鍵及酯鍵中之至少一種鍵結基之樹脂。進而,於第1硬化層及第2硬化層中,具有碳-碳雙鍵之交聯劑與延伸樹脂膜所包含之樹脂經由碳-碳雙鍵交聯。於本發明之實施方式之相位差膜中,藉由相位差層與第1硬化層及第2硬化層以如上方式交聯,可獲得即便於加熱環境下及加濕環境下相位差變化亦較小,進而即便與溶劑接觸時相位差變化亦較小的相位差膜。The retardation film which concerns on embodiment of this invention has a 1st hardened layer, a retardation layer, and a 2nd hardened layer in this order. The retardation layer is formed of a stretched resin film containing a resin having at least one bonding group selected from a carbonate bond and an ester bond. Furthermore, in the 1st hardened layer and the 2nd hardened layer, the crosslinking agent which has a carbon-carbon double bond and the resin contained in the stretched resin film are cross-linked via the carbon-carbon double bond. In the retardation film according to the embodiment of the present invention, the retardation layer, the first hardened layer and the second hardened layer are cross-linked as described above, so that even in a heating environment and a humidified environment, the phase difference change is relatively high. A retardation film that is small and has a small retardation change even when it comes into contact with a solvent.

以下,對本發明之代表實施方式進行說明,但本發明並不受該等實施方式限定。Hereinafter, representative embodiments of the present invention will be described, but the present invention is not limited to these embodiments.

(用語及符號之定義) 本說明書中之用語及符號之定義如下。 (1)折射率(nx、ny、nz) 「nx」係面內之折射率最大之方向(即遲相軸方向)之折射率,「ny」係面內與遲相軸正交之方向(即進相軸方向)之折射率,「nz」係厚度方向之折射率。 (2)面內相位差(Re) 「Re(λ)」係23℃下以波長λ nm之光測得之面內相位差。例如,「Re(550)」係23℃下以波長550 nm之光測得之面內相位差。當將層(膜)之厚度設為d(nm)時,藉由式:Re(λ)=(nx-ny)×d求出Re(λ)。 (3)角度 於本說明書中,當提及角度時,該角度包括相對於基準方向呈順時針方向及逆時針方向兩種情況。因此,例如「45°」意指±45°。 (Definition of Terms and Symbols) Definitions of terms and symbols in this specification are as follows. (1) Refractive index (nx, ny, nz) "nx" is the refractive index in the direction of the largest refractive index in the plane (ie, the direction of the slow axis), "ny" is the refractive index in the direction orthogonal to the slow axis in the plane (ie the direction of the advance axis), "nz" " is the refractive index in the thickness direction. (2) In-plane phase difference (Re) "Re(λ)" is the in-plane retardation measured with light of wavelength λ nm at 23°C. For example, "Re(550)" is the in-plane retardation measured with light having a wavelength of 550 nm at 23°C. When the thickness of the layer (film) is d (nm), Re(λ) is obtained by the formula: Re(λ)=(nx−ny)×d. (3) Angle In this specification, when referring to an angle, the angle includes both a clockwise direction and a counterclockwise direction with respect to the reference direction. Thus, for example, "45°" means ±45°.

A.相位差膜之整體構成 圖1係本發明之一實施方式之相位差膜之概略剖視圖。圖示例之相位差膜100依序具有第1硬化層10、相位差層20及第2硬化層30。相位差層由延伸樹脂膜形成,該延伸樹脂膜包含具有選自碳酸酯鍵及酯鍵中之至少一種鍵結基之樹脂。於第1硬化層及第2硬化層中,具有碳-碳雙鍵之交聯劑與延伸樹脂膜所包含之樹脂經由碳-碳雙鍵交聯。結果,可於相位差層兩側之表面附近形成第1硬化層及第2硬化層。更詳細而言,推測於相位差膜中,相位差層之厚度方向中央部包含未交聯或交聯程度較小之上述樹脂,表面附近之上述樹脂交聯,結果形成第1硬化層及第2硬化層。即,第1硬化層及第2硬化層由相位差層所包含之樹脂形成。相位差膜藉由具有此種結構,而具有加熱環境下、加濕環境下及接觸溶劑後之相位差變化較小,進而耐溶劑亦優異之優點。再者,圖1為模式圖,為便於說明,明確示出第1硬化層、延伸樹脂膜及第2硬化層之界面。然而,推測實際上並不存在明確之界面,第1硬化層、延伸樹脂膜及第2硬化層可能會具有漸層構造。 A. Overall composition of retardation film FIG. 1 is a schematic cross-sectional view of a retardation film according to an embodiment of the present invention. The retardation film 100 of the illustrated example has the first cured layer 10 , the retardation layer 20 , and the second cured layer 30 in this order. The retardation layer is formed of a stretched resin film containing a resin having at least one bonding group selected from a carbonate bond and an ester bond. In the first hardened layer and the second hardened layer, the crosslinking agent having a carbon-carbon double bond and the resin contained in the stretched resin film are crosslinked through the carbon-carbon double bond. As a result, the first hardened layer and the second hardened layer can be formed in the vicinity of the surfaces on both sides of the retardation layer. More specifically, in the retardation film, it is presumed that the central part in the thickness direction of the retardation layer contains the above-mentioned resin which is not cross-linked or has a small degree of cross-linking, and the above-mentioned resin in the vicinity of the surface is cross-linked, and as a result, the first cured layer and the second cured layer are formed. 2 hardened layers. That is, the first cured layer and the second cured layer are formed of the resin contained in the retardation layer. By having such a structure, the retardation film has the advantages that the change of the retardation in a heating environment, a humidified environment, and after contact with a solvent is small, and furthermore, it is excellent in solvent resistance. In addition, FIG. 1 is a schematic diagram, and for convenience of description, the interface of a 1st hardened layer, a stretched resin film, and a 2nd hardened layer is clearly shown. However, it is presumed that a clear interface does not actually exist, and the first cured layer, the stretched resin film, and the second cured layer may have a gradient structure.

相位差膜之凝膠分率較佳為90%以上,更佳為95%以上,進而較佳為97%~99%。推測實現此種凝膠分率是為了藉由第1硬化層及第2硬化層而實質上防止溶劑滲入相位差層。如上所述,推測相位差層之厚度方向中央部由未交聯或交聯程度較小之上述樹脂構成,但因第1硬化層及第2硬化層,不會反映在凝膠分率中。再者,凝膠分率可將由相位差膜製成之試樣浸漬於特定溶劑(例如甲苯)中,根據浸漬前後之試樣之重量算出。The gel fraction of the retardation film is preferably 90% or more, more preferably 95% or more, and still more preferably 97% to 99%. It is presumed that such a gel fraction is achieved in order to substantially prevent the penetration of the solvent into the retardation layer by the first hardened layer and the second hardened layer. As described above, the thickness direction central portion of the retardation layer is presumed to be composed of the above-mentioned resin which is not cross-linked or has a small degree of cross-linking, but is not reflected in the gel fraction due to the first hardened layer and the second hardened layer. Furthermore, the gel fraction can be calculated from the weight of the sample before and after the immersion by immersing the sample made of the retardation film in a specific solvent (eg, toluene).

於一實施方式中,上述交聯可為相位差層所包含之樹脂中之源自異山梨糖醇系二羥基化合物之結構單元彼此的交聯。進而,於一實施方式中,上述交聯可為於第1硬化層及第2硬化層中,經由交聯劑與上述樹脂中之源自異山梨糖醇系二羥基化合物之結構單元之碳-碳鍵的交聯。例如,將該源自異山梨糖醇系二羥基化合物之結構單元彼此經由交聯劑之碳-碳雙鍵交聯所得之反應物之結構示於以下。進而,將用於該交聯反應之交聯劑之結構示於以下。 [化3]

Figure 02_image005
[化4]
Figure 02_image007
In one embodiment, the above-mentioned crosslinking may be crosslinking of structural units derived from an isosorbide-based dihydroxy compound in the resin contained in the retardation layer. Furthermore, in one Embodiment, the said crosslinking can be in the 1st hardened layer and the 2nd hardened layer, through the carbon- Cross-linking of carbon bonds. For example, the structure of the reactant obtained by crosslinking the structural units derived from the isosorbide-based dihydroxy compound via the carbon-carbon double bond of the crosslinking agent is shown below. Furthermore, the structure of the crosslinking agent used for this crosslinking reaction is shown below. [hua 3]
Figure 02_image005
[hua 4]
Figure 02_image007

此種交聯結構可藉由在製作延伸樹脂膜後進行交聯處理(藉由後交聯)而形成。於一實施方式中,經由包含交聯劑及自由基產生劑之反應性組合物,將聚對苯二甲酸乙二酯(PET)膜輥式層壓於延伸樹脂膜之兩面。對所獲得之積層體進行交聯反應,進而剝離PET膜,藉此於延伸樹脂膜(相位差層)之表面形成第1硬化層及第2硬化層,獲得本發明之實施方式之相位差膜。於另一實施方式中,於延伸樹脂膜之表面塗佈包含交聯劑及自由基產生劑(及視需要包含之稀釋溶劑)之反應性組合物,視需要實施加熱處理後,於氮氣氛圍下(藉由熱或UV(ultraviolet,紫外線)照射)進行交聯反應,藉此可獲得硬化層。藉由對延伸樹脂膜之兩面實施該操作,而於延伸樹脂膜(相位差層)之表面形成第1硬化層及第2硬化層,獲得本發明之實施方式之相位差膜。形成此種交聯結構時,形成延伸樹脂膜之樹脂無需包含交聯性基。於使用包含交聯性基之樹脂製造延伸樹脂膜之情形時,可能會產生該樹脂於製造步驟(例如混練、擠出、延伸)中發生凝膠化等問題。根據本發明之實施方式,可在不產生此種問題之情況下製造具有第1硬化層及第2硬化層之相位差膜。進而,根據本發明之實施方式之後交聯,可不改變通常之相位差膜及製造該相位差膜之步驟而供於製造本發明之實施方式之相位差膜。本發明在該方面具有優異之效果。Such a cross-linked structure can be formed by performing a cross-linking treatment (by post-cross-linking) after producing the stretched resin film. In one embodiment, a polyethylene terephthalate (PET) film is roll-laminated on both sides of the stretched resin film through a reactive composition comprising a crosslinking agent and a free radical generator. The obtained laminate was subjected to a crosslinking reaction, and then the PET film was peeled off to form a first cured layer and a second cured layer on the surface of the stretched resin film (retardation layer) to obtain a retardation film according to an embodiment of the present invention. . In another embodiment, the surface of the stretched resin film is coated with a reactive composition comprising a cross-linking agent and a free radical generator (and optionally a diluting solvent), and after heat treatment as required, under a nitrogen atmosphere A hardened layer can be obtained by performing a crosslinking reaction (by heat or UV (ultraviolet) irradiation). By performing this operation on both sides of the stretched resin film, the first cured layer and the second cured layer are formed on the surface of the stretched resin film (retardation layer), thereby obtaining the retardation film according to the embodiment of the present invention. When forming such a crosslinked structure, the resin forming the stretched resin film does not need to contain a crosslinkable group. When a resin containing a crosslinkable group is used to manufacture a stretched resin film, problems such as gelation of the resin during manufacturing steps (eg, kneading, extrusion, and stretching) may arise. According to embodiment of this invention, the retardation film which has a 1st hardened layer and a 2nd hardened layer can be manufactured, without causing such a problem. Furthermore, after crosslinking according to the embodiment of the present invention, it can be used for the production of the retardation film of the embodiment of the present invention without changing the normal retardation film and the steps of producing the retardation film. The present invention has an excellent effect in this respect.

相位差膜(實質上為相位差層)較佳為滿足Re(450)<Re(550)<Re(650)之關係。進而,相位差膜較佳為滿足0.7<Re(450)/Re(550)<1.0之關係。即,相位差膜顯現出相位差值根據測定光之波長而變大之反波長色散特性。藉由相位差膜具有此種特性,可實現非常優異之抗反射特性。The retardation film (substantially the retardation layer) preferably satisfies the relationship of Re(450)<Re(550)<Re(650). Furthermore, the retardation film preferably satisfies the relationship of 0.7<Re(450)/Re(550)<1.0. That is, the retardation film exhibits inverse wavelength dispersion characteristics in which the retardation value increases according to the wavelength of the measurement light. With the retardation film having such characteristics, very excellent anti-reflection characteristics can be realized.

相位差膜(實質上為相位差層)之Re(550)較佳為100 nm~180 nm或220 nm~330 nm,更佳為120 nm~180 nm或240 nm~310 nm。The Re(550) of the retardation film (substantially the retardation layer) is preferably 100 nm to 180 nm or 220 nm to 330 nm, more preferably 120 nm to 180 nm or 240 nm to 310 nm.

相位差膜之厚度可根據所需Re(550)採用任意適當之厚度。相位差膜之厚度較佳為20 μm~100 μm,更佳為30 μm~60 μm。該厚度表示相位差層與第1硬化層及第2硬化層之總厚度。The thickness of the retardation film can be any appropriate thickness according to the required Re(550). The thickness of the retardation film is preferably 20 μm to 100 μm, more preferably 30 μm to 60 μm. This thickness represents the total thickness of the retardation layer, the first hardened layer, and the second hardened layer.

相位差膜(實質上為相位差層)之內部霧度較佳為3%以下,更佳為2%以下,進而較佳為1%以下。內部霧度之下限可實質上為0%。若內部霧度處於此種範圍內,則可實現相位差膜之優異之透明性。The internal haze of the retardation film (substantially a retardation layer) is preferably 3% or less, more preferably 2% or less, and still more preferably 1% or less. The lower limit of internal haze may be substantially 0%. If the internal haze is within such a range, the excellent transparency of the retardation film can be realized.

相位差膜(實質上為相位差層)之光彈性係數較佳為1×10 -12(m 2/N)~40×10 -12(m 2/N),更佳為1×10 -12(m 2/N)~30×10 -12(m 2/N),進而較佳為1×10 -12(m 2/N)~20×10 -12(m 2/N)。 The photoelastic coefficient of the retardation film (substantially the retardation layer) is preferably 1×10 -12 (m 2 /N)~40×10 -12 (m 2 /N), more preferably 1×10 -12 (m 2 /N) to 30×10 -12 (m 2 /N), more preferably 1×10 -12 (m 2 /N) to 20×10 -12 (m 2 /N).

A-1.相位差層 相位差層可由延伸樹脂膜形成。該延伸樹脂膜可藉由將樹脂膜延伸而獲得。該樹脂膜包含具有碳酸酯鍵及酯鍵中之至少一種鍵結基之樹脂。作為該樹脂,例如可例舉:聚碳酸酯系樹脂、聚酯碳酸酯系樹脂、聚酯系樹脂、聚芳酯系樹脂、丙烯酸系樹脂。該等樹脂可單獨使用,亦可組合(例如摻合、共聚)使用。其中,適宜使用聚碳酸酯系樹脂或聚酯碳酸酯系樹脂(以下有時簡稱為聚碳酸酯系樹脂)。 A-1. Retardation layer The retardation layer may be formed of a stretched resin film. The stretched resin film can be obtained by stretching the resin film. The resin film includes a resin having at least one bonding group among carbonate bonds and ester bonds. As this resin, polycarbonate-type resin, polyester carbonate-type resin, polyester-type resin, polyarylate-type resin, and acrylic resin are mentioned, for example. These resins may be used alone or in combination (eg, blending, copolymerization). Among them, polycarbonate-based resins or polyester carbonate-based resins (hereinafter sometimes simply referred to as polycarbonate-based resins) are suitably used.

作為上述聚碳酸酯系樹脂,可使用任意適當之聚碳酸酯系樹脂,只要可獲得本發明之效果即可。例如,聚碳酸酯系樹脂較佳為包含:源自茀系二羥基化合物之結構單元、源自異山梨糖醇系二羥基化合物之結構單元、以及源自選自由脂環式二醇、脂環式二甲醇、二乙二醇、三乙二醇或聚乙二醇及伸烷基二醇或螺二醇所組成之群中之至少一種二羥基化合物之結構單元。聚碳酸酯系樹脂更佳為包含:源自茀系二羥基化合物之結構單元、源自異山梨糖醇系二羥基化合物之結構單元、以及源自脂環式二甲醇之結構單元及/或源自二乙二醇、三乙二醇或聚乙二醇之結構單元;進而較佳為包含:源自茀系二羥基化合物之結構單元、源自異山梨糖醇系二羥基化合物之結構單元、及源自二乙二醇、三乙二醇或聚乙二醇之結構單元。聚碳酸酯系樹脂亦可視需要包含其他源自二羥基化合物之結構單元。再者,適宜用於本發明之聚碳酸酯系樹脂之詳細情況例如記載於日本專利特開2014-10291號公報、日本專利特開2014-26266號公報、日本專利特開2015-212816號公報、日本專利特開2015-212817號公報、日本專利特開2015-212818號公報中,該記載係作為參考而引用至本說明書中。As the above-mentioned polycarbonate-based resin, any appropriate polycarbonate-based resin can be used as long as the effects of the present invention can be obtained. For example, the polycarbonate-based resin preferably contains a structural unit derived from a perylene-based dihydroxy compound, a structural unit derived from an isosorbide-based dihydroxy compound, and a structural unit derived from the group consisting of alicyclic diol, alicyclic Structural unit of at least one dihydroxy compound in the group consisting of dimethanol, diethylene glycol, triethylene glycol or polyethylene glycol and alkylene glycol or spiro glycol. The polycarbonate-based resin preferably contains: a structural unit derived from a perylene-based dihydroxy compound, a structural unit derived from an isosorbide-based dihydroxy compound, and a structural unit and/or source derived from alicyclic dimethanol A structural unit derived from diethylene glycol, triethylene glycol or polyethylene glycol; further preferably, it comprises: a structural unit derived from a perylene-based dihydroxy compound, a structural unit derived from an isosorbide-based dihydroxy compound, and structural units derived from diethylene glycol, triethylene glycol or polyethylene glycol. The polycarbonate-based resin may also contain other structural units derived from dihydroxy compounds as required. Further, details of the polycarbonate resin suitable for use in the present invention are described in, for example, Japanese Patent Laid-Open No. 2014-10291, Japanese Patent Laid-Open No. 2014-26266, Japanese Patent Laid-Open No. 2015-212816, In Japanese Patent Laid-Open No. 2015-212817 and Japanese Patent Laid-Open No. 2015-212818, the descriptions are incorporated herein by reference.

作為上述源自茀系二羥基化合物之結構單元,可例舉下式所表示之結構單元。有時將該結構單元稱為低聚茀結構單元。As the structural unit derived from the above-mentioned perylene-based dihydroxy compound, the structural unit represented by the following formula may, for example, be mentioned. This building block is sometimes referred to as an oligomeric fluoride building block.

[化5]

Figure 02_image009
[hua 5]
Figure 02_image009

[化6]

Figure 02_image011
[hua 6]
Figure 02_image011

上述通式(1)及上述通式(2)中,R 1~R 3分別獨立地為直接鍵、可具有取代基之碳數1~4之伸烷基,R 4~R 9分別獨立地為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之碳數1~10之醯氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基或氰基。其中,R 4~R 9中相鄰之至少2個基可彼此鍵結而形成環。又,上述通式(1)中所包含之2個R 4、R 5、R 6、R 7、R 8及R 9彼此可相同,亦可不同。同樣地,上述通式(2)中所包含之2個R 4、R 5、R 6、R 7、R 8及R 9彼此可相同,亦可不同。 In the above general formula (1) and the above general formula (2), R 1 to R 3 are each independently a direct bond, an optionally substituted alkylene group having 1 to 4 carbon atoms, and R 4 to R 9 are each independently It is a hydrogen atom, an optionally substituted alkyl group having 1 to 10 carbon atoms, an optionally substituted aryl group having 4 to 10 carbon atoms, an optionally substituted aryl group having 1 to 10 carbon atoms, and an optionally substituted group alkoxy group with 1 to 10 carbon atoms, aryloxy group with 1 to 10 carbon atoms which may have substituents, aryloxy groups with 1 to 10 carbon atoms which may have substituents, amine groups which may have substituents, A vinyl group having 1 to 10 carbon atoms, an ethynyl group having 1 to 10 carbon atoms that may have a substituent, a sulfur atom having a substituent, a silicon atom having a substituent, a halogen atom, a nitro group or a cyano group. Among them, at least two adjacent groups of R 4 to R 9 may be bonded to each other to form a ring. Moreover, the two R 4 , R 5 , R 6 , R 7 , R 8 and R 9 contained in the general formula (1) may be the same or different from each other. Similarly, the two R 4 , R 5 , R 6 , R 7 , R 8 and R 9 included in the general formula (2) may be the same or different from each other.

於R 1及R 2中,作為「可具有取代基之碳數1~4之伸烷基」,例如可採用以下伸烷基:亞甲基、伸乙基、正伸丙基、正伸丁基等直鏈狀伸烷基;甲基亞甲基、二甲基亞甲基、乙基亞甲基、丙基亞甲基、(1-甲基乙基)亞甲基、1-甲基伸乙基、2-甲基伸乙基、1-乙基伸乙基、2-乙基伸乙基、1-甲基伸丙基、2-甲基伸丙基、1,1-二甲基伸乙基、2,2-二甲基伸丙基、3-甲基伸丙基等具有支鏈之伸烷基。此處,R 1及R 2中之支鏈之位置係用以茀環側之碳成為1位之方式賦予之編號來表示。 In R 1 and R 2 , as "the alkylene group having 1 to 4 carbon atoms which may have a substituent", for example, the following alkylene groups can be used: methylene group, ethylidene group, n-propylidene group, n-butylene group, etc. Linear alkylene; methylmethylene, dimethylmethylene, ethylmethylene, propylmethylene, (1-methylethyl)methylene, 1-methylethylidene base, 2-methylethylidene, 1-ethylidene, 2-ethylethylidene, 1-methylpropylidene, 2-methylpropylidene, 1,1-dimethylethylidene , 2,2-dimethyl propylidene, 3-methylpropylidene and other branched alkyl groups. Here, the positions of the branches in R 1 and R 2 are indicated by the numbers assigned so that the carbon on the side of the perylene ring becomes the 1-position.

R 1及R 2之選擇尤其對反波長色散性之顯現產生重要影響。上述樹脂係於茀環相對於主鏈方向(延伸方向)垂直地配向之狀態下,顯現出最強之反波長色散性。為了使茀環之配向狀態接近上述狀態,顯現出強反波長色散性,較佳為採用伸烷基之主鏈上之碳數為2~3之R 1及R 2。於碳數為1之情形時,有時會意外地不呈現反波長色散性。認為其原因在於,因作為低聚茀結構單元之連結基之碳酸酯基及/或酯基之立體阻礙,導致茀環之配向被固定於相對於主鏈方向並非垂直之方向等。另一方面,於碳數過多之情形時,因茀環之配向之固定變弱,而有反波長色散性變弱之虞。又,樹脂之耐熱性亦降低。 The selection of R 1 and R 2 has an important influence on the development of inverse wavelength dispersion in particular. The above-mentioned resin exhibits the strongest inverse wavelength dispersion in a state in which the perylene rings are aligned perpendicularly to the main chain direction (extending direction). In order to make the alignment state of the perylene ring close to the above state and to exhibit strong inverse wavelength dispersion, it is preferable to use R 1 and R 2 having 2 to 3 carbon atoms on the main chain of the alkylene group. When the number of carbon atoms is 1, inverse wavelength dispersion may not be exhibited unexpectedly. The reason for this is considered to be that the alignment of the perylene ring is fixed in a direction not perpendicular to the main chain direction due to the steric hindrance of the carbonate group and/or the ester group as the linking group of the oligomerized perylene structural unit. On the other hand, when the number of carbon atoms is too large, since the fixation of the orientation of the pyrene ring becomes weak, there is a possibility that the inverse wavelength dispersion property becomes weak. Moreover, the heat resistance of resin also falls.

如上述通式(1)及通式(2)所示,R 1及R 2中伸烷基之一端與茀環鍵結,另一端與連結基所包含之氧原子或羰基碳中之任一者鍵結。就熱穩定性、耐熱性及反波長色散性之觀點而言,較佳為伸烷基之另一端與羰基碳鍵結。 As shown in the above general formula (1) and general formula (2), one end of the alkylene group in R 1 and R 2 is bonded to the perylene ring, and the other end is bonded to the oxygen atom or carbonyl carbon contained in the linking group. the key. From the viewpoint of thermal stability, heat resistance, and reverse wavelength dispersion, it is preferable that the other end of the alkylene group is bonded to the carbonyl carbon.

又,就容易製造之觀點而言,較佳為R 1及R 2採用相同之伸烷基。 Moreover, it is preferable to use the same alkylene group for R 1 and R 2 from the viewpoint of easy production.

R 3中,作為「可具有取代基之碳數1~4之伸烷基」,例如可採用以下伸烷基:亞甲基、伸乙基、正伸丙基、正伸丁基等直鏈狀伸烷基;甲基亞甲基、二甲基亞甲基、乙基亞甲基、丙基亞甲基、(1-甲基乙基)亞甲基、1-甲基伸乙基、2-甲基伸乙基、1-乙基伸乙基、2-乙基伸乙基、1-甲基伸丙基、2-甲基伸丙基、1,1-二甲基伸乙基、2,2-二甲基伸丙基、3-甲基伸丙基等具有支鏈之伸烷基。 In R 3 , as the "optionally substituted alkylene group having 1 to 4 carbon atoms", for example, the following alkylene groups can be used: straight chain extensions such as methylene group, ethylidene group, n-propylidene group, n-butylene group, etc. Alkyl; methylmethylene, dimethylmethylene, ethylmethylene, propylmethylene, (1-methylethyl)methylene, 1-methylethylidene, 2- Methylidene, 1-ethylidene, 2-ethylidene, 1-methylpropylidene, 2-methylpropylidene, 1,1-dimethylethylidene, 2,2 - Dimethyl propylidene, 3-methylpropylidene and other branched alkylene groups.

R 3較佳為伸烷基之主鏈上之碳數為1~2,尤佳為碳數為1。於採用主鏈上之碳數過多之R 3之情形時,與R 1及R 2同樣地,茀環之固定化變弱,有導致反波長色散性降低,光彈性係數增加,耐熱性降低等之虞。另一方面,雖然主鏈上之碳數較少時光學特性及/或耐熱性良好,但是當兩個茀環之9位藉由直接鍵相連時熱穩定性變差。 R 3 preferably has 1 to 2 carbon atoms in the main chain of the alkylene group, and particularly preferably has 1 carbon number. When R 3 having too many carbon atoms in the main chain is used, as with R 1 and R 2 , the immobilization of the perylene ring becomes weak, resulting in a decrease in inverse wavelength dispersion, an increase in the photoelastic coefficient, and a decrease in heat resistance, etc. Danger. On the other hand, although the optical properties and/or heat resistance are good when the number of carbon atoms in the main chain is small, the thermal stability is deteriorated when the 9-position of the two perylene rings is connected by a direct bond.

於R 1~R 3中,作為伸烷基可具有之取代基,可採用以下例示之取代基,亦可採用該等以外之取代基:選自氟原子、氯原子、溴原子及碘原子之鹵素原子;甲氧基、乙氧基等碳數1~10之烷氧基;乙醯基、苯甲醯基等碳數1~10之醯基;乙醯胺基、苯甲醯胺基等碳數1~10之醯胺基;硝基;氰基;可經上述鹵素原子、上述烷氧基、上述醯基、上述醯胺基、上述硝基、上述氰基等取代1~3個氫原子之苯基、萘基等碳數6~10之芳基。 In R 1 to R 3 , as the substituent that the alkylene group may have, the substituents exemplified below may be used, and the substituents other than these may be used: a group selected from a fluorine atom, a chlorine atom, a bromine atom and an iodine atom. Halogen atom; alkoxy groups with 1 to 10 carbon atoms such as methoxy and ethoxy; acyl groups with 1 to 10 carbon atoms such as acetyl and benzyl groups; acetamido, benzylamino, etc. C 1-10 amido group; nitro group; cyano group; 1-3 hydrogens may be substituted by the above-mentioned halogen atom, the above-mentioned alkoxy group, the above-mentioned amido group, the above-mentioned amido group, the above-mentioned nitro group, the above-mentioned cyano group, etc. An aryl group having 6 to 10 carbon atoms such as a phenyl group and a naphthyl group.

上述取代基之數量並無特別限定,較佳為1~3個。於具有2個以上取代基之情形時,取代基之種類可相同亦可不同。於取代基之數量過多之情形時,有聚合時妨礙反應或發生熱分解之虞。又,就工業上可經濟地製造之觀點而言,較佳為R 1~R 3未經取代。 The number of the above-mentioned substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kind of the substituents may be the same or different. When the number of the substituents is too large, the reaction may be inhibited or thermal decomposition may occur during polymerization. Moreover, it is preferable that R 1 to R 3 are not substituted from the viewpoint of industrially economical production.

R 4~R 9中,作為「可具有取代基之碳數1~10之烷基」,例如可採用以下烷基:甲基、乙基、正丙基、正丁基、正戊基、正己基、正癸基等直鏈狀烷基;異丙基、2-甲基丙基、2,2-二甲基丙基、2-乙基己基等具有支鏈之烷基;環丙基、環戊基、環己基、環辛基等環狀烷基。 Among R 4 to R 9 , as the "optionally substituted alkyl group having 1 to 10 carbon atoms", for example, the following alkyl groups can be used: methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-hexyl Alkyl, n-decyl and other straight-chain alkyl groups; isopropyl, 2-methylpropyl, 2,2-dimethylpropyl, 2-ethylhexyl and other branched alkyl groups; cyclopropyl, Cyclic alkyl groups such as cyclopentyl, cyclohexyl, and cyclooctyl.

上述烷基之碳數較佳為4以下,更佳為2以下。若上述烷基之碳數處於該範圍內,則呈現不易產生茀環彼此之立體阻礙,獲得源自茀環之所需光學特性之趨勢。The number of carbon atoms in the alkyl group is preferably 4 or less, more preferably 2 or less. If the carbon number of the above-mentioned alkyl group is within this range, the steric hindrance between the perylene rings is unlikely to occur, and the desired optical properties derived from the perylene rings tend to be obtained.

作為上述烷基可具有之取代基,可採用以下例示之取代基,亦可採用該等以外之取代基:選自氟原子、氯原子、溴原子及碘原子之鹵素原子;甲氧基、乙氧基等碳數1~10之烷氧基;乙醯基、苯甲醯基等碳數1~10之醯基;乙醯胺基、苯甲醯胺基等碳數1~10之醯胺基;硝基;氰基;可經上述鹵素原子、上述烷氧基、上述醯基、上述醯胺基、上述硝基、上述氰基等取代1~3個氫原子之苯基、萘基等碳數6~10之芳基。As the substituent which the above-mentioned alkyl group may have, the following exemplified substituents may be used, and substituents other than these may be used: a halogen atom selected from a fluorine atom, a chlorine atom, a bromine atom and an iodine atom; a methoxy group, an ethyl group Alkoxy with 1 to 10 carbons such as oxy; acyl with 1 to 10 carbons such as acetyl and benzyl; nitro group; cyano group; phenyl group, naphthyl group, etc., which can be substituted with 1 to 3 hydrogen atoms by the above-mentioned halogen atom, the above-mentioned alkoxy group, the above-mentioned amide group, the above-mentioned amide group, the above-mentioned nitro group, the above-mentioned cyano group, etc. Aryl having 6 to 10 carbon atoms.

上述取代基之數量並無特別限定,較佳為1~3個。於具有2個以上取代基之情形時,取代基之種類可相同亦可不同。於此種取代基之數量過多之情形時,有聚合時妨礙反應或發生熱分解之虞。又,就工業上可經濟地製造之觀點而言,R 4~R 9較佳為未經取代。 The number of the above-mentioned substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kind of the substituents may be the same or different. When the number of such substituents is too large, the reaction may be inhibited or thermal decomposition may occur during polymerization. Moreover, it is preferable that R 4 to R 9 are unsubstituted from the viewpoint of industrially economical production.

作為上述烷基之具體例,可例舉:三氟甲基、苄基、4-甲氧基苄基、甲氧基甲基等。As a specific example of the said alkyl group, a trifluoromethyl group, a benzyl group, a 4-methoxybenzyl group, a methoxymethyl group, etc. are mentioned.

又,於R 4~R 9中,作為「可具有取代基之碳數4~10之芳基」,例如可採用以下芳基:苯基、1-萘基、2-萘基等芳基;2-吡啶基、2-噻吩基、2-呋喃基等雜芳基。 In addition, in R 4 to R 9 , as the "aryl group having 4 to 10 carbon atoms which may have a substituent", for example, the following aryl groups can be used: aryl groups such as phenyl, 1-naphthyl, and 2-naphthyl; 2-pyridyl, 2-thienyl, 2-furyl and other heteroaryl groups.

上述芳基之碳數較佳為8以下,更佳為7以下。若上述芳基之碳數處於該範圍內,則呈現不易產生茀環彼此之立體阻礙,獲得源自茀環之所需光學特性之趨勢。The number of carbon atoms in the aryl group is preferably 8 or less, more preferably 7 or less. If the carbon number of the above-mentioned aryl group is within this range, the steric hindrance between the perylene rings is unlikely to occur, and the desired optical properties derived from the perylene rings tend to be obtained.

於R 4~R 9中,作為上述芳基可具有之取代基,可採用以下例示之取代基,亦可採用該等以外之取代基:選自氟原子、氯原子、溴原子及碘原子之鹵素原子;甲基、乙基、異丙基等碳數1~10之烷基;甲氧基、乙氧基等碳數1~10之烷氧基;乙醯基、苯甲醯基等碳數1~10之醯基;乙醯胺基、苯甲醯胺基等碳數1~10之醯胺基;硝基;氰基。上述取代基之數量並無特別限定,較佳為1~3個。於具有2個以上取代基之情形時,取代基之種類可相同亦可不同。又,就工業上可經濟地製造之觀點而言,較佳為R 4~R 9未經取代。 In R 4 to R 9 , as the substituent which the above-mentioned aryl group may have, the following exemplified substituents may be used, and substituents other than these may be used: a group selected from a fluorine atom, a chlorine atom, a bromine atom and an iodine atom. Halogen atom; C1-10 alkyl groups such as methyl, ethyl and isopropyl; alkoxy groups such as methoxy, ethoxy and other C1-10 carbons; acetyl, benzyl and other carbons Acetyl group of 1 to 10; acylamino group of 1 to 10 carbon atoms such as acetamido group and benzylamino group; nitro group; cyano group. The number of the above-mentioned substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kind of the substituents may be the same or different. Moreover, it is preferable that R 4 to R 9 are not substituted from the viewpoint of industrially economical production.

作為上述芳基之具體例,可例舉:2-甲基苯基、4-甲基苯基、3,5-二甲基苯基、4-苯甲醯基苯基、4-甲氧基苯基、4-硝基苯基、4-氰基苯基、3-三氟甲基苯基、3,4-二甲氧基苯基、3,4-亞甲基二氧基苯基、2,3,4,5,6-五氟苯基、4-甲基呋喃基等。Specific examples of the above-mentioned aryl group include 2-methylphenyl, 4-methylphenyl, 3,5-dimethylphenyl, 4-benzylphenyl, and 4-methoxy Phenyl, 4-nitrophenyl, 4-cyanophenyl, 3-trifluoromethylphenyl, 3,4-dimethoxyphenyl, 3,4-methylenedioxyphenyl, 2,3,4,5,6-pentafluorophenyl, 4-methylfuranyl, etc.

又,於R 4~R 9中,作為「可具有取代基之碳數1~10之醯基」,例如可採用以下醯基:甲醯基、乙醯基、丙醯基、2-甲基丙醯基、2,2-二甲基丙醯基、2-乙基己醯基等脂肪族醯基;苯甲醯基、1-萘基羰基、2-萘基羰基、2-呋喃基羰基等芳香族醯基。 In addition, among R 4 to R 9 , as "the aryl group having 1 to 10 carbon atoms which may have a substituent", for example, the following aryl groups can be used: methionyl, acetyl, propionyl, and 2-methyl aliphatic aryl groups such as propionyl, 2,2-dimethylpropionyl, 2-ethylhexyl; benzyl, 1-naphthylcarbonyl, 2-naphthylcarbonyl, 2-furylcarbonyl and other aromatic acyl groups.

上述醯基之碳數較佳為4以下,更佳為2以下。若上述醯基之碳數處於該範圍內,則呈現不易產生茀環彼此之立體阻礙,獲得源自茀環之所需光學特性之趨勢。The number of carbon atoms in the acyl group is preferably 4 or less, more preferably 2 or less. If the carbon number of the above-mentioned acyl group is within this range, the steric hindrance of the perylene rings is less likely to occur, and the desired optical properties derived from the perylene rings tend to be obtained.

作為上述醯基可具有之取代基,可採用以下例示之取代基,亦可採用該等以外之取代基:選自氟原子、氯原子、溴原子及碘原子之鹵素原子;甲基、乙基、異丙基等碳數1~10之烷基;甲氧基、乙氧基等碳數1~10之烷氧基;乙醯胺基、苯甲醯胺基等碳數1~10之醯胺基;硝基;氰基;可經上述鹵素原子、上述烷氧基、乙醯基、苯甲醯基等碳數1~10之醯基、上述醯胺基、上述硝基、上述氰基等取代1~3個氫原子之苯基、萘基等碳數6~10之芳基。As the substituent which the above-mentioned acyl group may have, the following exemplified substituents may be used, and substituents other than these may be used: a halogen atom selected from a fluorine atom, a chlorine atom, a bromine atom and an iodine atom; a methyl group, an ethyl group , Isopropyl and other alkyl groups with carbon number 1 to 10; methoxy, ethoxy and other alkoxy groups with carbon number 1 to 10; Amine group; nitro group; cyano group; acyl group having 1 to 10 carbon atoms such as the above halogen atom, the above alkoxy group, acetyl group, benzyl group, the above amide group, the above nitro group, the above cyano group Aryl having 6 to 10 carbon atoms such as phenyl, naphthyl and other substituted 1 to 3 hydrogen atoms.

上述取代基之數量並無特別限定,較佳為1~3個。於具有2個以上取代基之情形時,取代基之種類可相同亦可不同。又,就工業上可經濟地製造之觀點而言,較佳為R 4~R 9未經取代。 The number of the above-mentioned substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kind of the substituents may be the same or different. Moreover, it is preferable that R 4 to R 9 are not substituted from the viewpoint of industrially economical production.

作為上述醯基之具體例,可例舉:氯乙醯基、三氟乙醯基、甲氧基乙醯基、苯氧基乙醯基、4-甲氧基苯甲醯基、4-硝基苯甲醯基、4-氰基苯甲醯基、4-三氟甲基苯甲醯基等。As a specific example of the said acyl group, a chloroacetyl group, a trifluoroacetyl group, a methoxyacetyl group, a phenoxyacetyl group, a 4-methoxybenzyl group, and a 4-nitro group may be mentioned. benzyl, 4-cyanobenzyl, 4-trifluoromethylbenzyl and the like.

又,於R 4~R 9中,作為「可具有取代基之碳數1~10之烷氧基或芳氧基」,例如可採用以下烷氧基及芳氧基:甲氧基、乙氧基、異丙氧基、第三丁氧基、三氟甲氧基、苯氧基等烷氧基。 In addition, in R 4 to R 9 , as "the optionally substituted alkoxy group or aryloxy group having 1 to 10 carbon atoms", for example, the following alkoxy groups and aryloxy groups can be used: methoxy, ethoxy alkoxy group, isopropoxy group, tert-butoxy group, trifluoromethoxy group, phenoxy group and the like.

上述烷氧基及上述芳氧基之碳數較佳為4以下,更佳為2以下。若上述烷氧基及上述芳氧基之碳數處於該範圍內,則呈現不易產生茀環彼此之立體阻礙,獲得源自茀環之所需光學特性之趨勢。The number of carbon atoms in the alkoxy group and the aryloxy group is preferably 4 or less, more preferably 2 or less. If the carbon numbers of the above-mentioned alkoxy group and the above-mentioned aryloxy group are within this range, steric hindrance between the perylene rings is unlikely to occur, and the desired optical properties derived from the perylene rings tend to be obtained.

作為上述烷氧基及上述芳氧基可具有之取代基,可採用以下例示之取代基,亦可採用該等以外之取代基:選自氟原子、氯原子、溴原子及碘原子之鹵素原子;甲基、乙基、異丙基等碳數1~10之烷基;甲氧基、乙氧基等碳數1~10之烷氧基;乙醯胺基、苯甲醯胺基等碳數1~10之醯胺基;硝基;氰基;可經上述鹵素原子、上述烷氧基、乙醯基、苯甲醯基等碳數1~10之醯基、上述醯胺基、上述硝基、上述氰基等取代1~3個氫原子之苯基、萘基等碳數6~10之芳基。As the substituent which the above-mentioned alkoxy group and the above-mentioned aryloxy group may have, the following exemplified substituents may be used, and substituents other than these may be used: a halogen atom selected from a fluorine atom, a chlorine atom, a bromine atom and an iodine atom ; Methyl, ethyl, isopropyl and other alkyl groups with carbon number 1 to 10; methoxy, ethoxy and other alkoxy groups with carbon number 1 to 10; acetamide, benzamide and other carbons The amide group of 1 to 10; nitro group; An aryl group having 6 to 10 carbon atoms such as a phenyl group in which 1 to 3 hydrogen atoms are substituted by a nitro group, the above-mentioned cyano group, and a naphthyl group.

上述取代基之數量並無特別限定,較佳為1~3個。於具有2個以上取代基之情形時,取代基之種類可相同亦可不同。又,就工業上可經濟地製造之觀點而言,較佳為R 4~R 9未經取代。 The number of the above-mentioned substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kind of the substituents may be the same or different. Moreover, it is preferable that R 4 to R 9 are not substituted from the viewpoint of industrially economical production.

作為上述烷氧基及上述芳氧基之具體例,可例舉:氯甲基、溴甲基、2-溴乙基、三氟甲基、甲氧基甲基、甲氧基乙氧基甲基、3-氯苯氧基、3-溴苯氧基、4-氯苯氧基、3-氯苯氧基、4-氯苯氧基、3-溴苯氧基、4-溴苯氧基、4-甲氧基苯氧基等。Specific examples of the above-mentioned alkoxy group and the above-mentioned aryloxy group include chloromethyl, bromomethyl, 2-bromoethyl, trifluoromethyl, methoxymethyl, and methoxyethoxymethyl. base, 3-chlorophenoxy, 3-bromophenoxy, 4-chlorophenoxy, 3-chlorophenoxy, 4-chlorophenoxy, 3-bromophenoxy, 4-bromophenoxy , 4-methoxyphenoxy, etc.

又,於R 4~R 9中,作為「可具有取代基之碳數1~10之醯氧基」,例如可採用以下醯氧基:甲醯氧基、乙醯氧基、丙醯氧基、丁醯氧基、丙烯醯氧基、甲基丙烯醯氧基等脂肪族醯氧基;苯甲醯氧基等芳香族醯氧基。 In addition, among R 4 to R 9 , as "the aryloxy group having 1 to 10 carbon atoms which may have a substituent", for example, the following aryloxy groups can be used: methoxyl group, acetyloxyl group, propionyloxyl group , aliphatic aryloxy groups such as butyryloxy, acryloxy, methacryloyloxy; aromatic aryloxy such as benzyloxy.

上述醯氧基之碳數較佳為4以下,更佳為2以下。若上述醯氧基之碳數處於該範圍內,則呈現不易產生茀環彼此之立體阻礙,獲得源自茀環之所需光學特性之趨勢。The number of carbon atoms in the above-mentioned oxyalkyl group is preferably 4 or less, more preferably 2 or less. If the carbon number of the above-mentioned aryloxy group is within this range, the steric hindrance between the perylene rings is unlikely to occur, and the desired optical properties derived from the perylene rings tend to be obtained.

作為上述醯氧基可具有之取代基,可採用以下例示之取代基,亦可採用該等以外之取代基:選自氟原子、氯原子、溴原子及碘原子之鹵素原子;甲基、乙基、異丙基等碳數1~10之烷基;甲氧基、乙氧基等碳數1~10之烷氧基;乙醯胺基、苯甲醯胺基等碳數1~10之醯胺基;硝基;氰基;可經上述鹵素原子、上述烷氧基、乙醯基、苯甲醯基等碳數1~10之醯基、上述醯胺基、上述硝基、上述氰基等取代1~3個氫原子之苯基、萘基等碳數6~10之芳基。As the substituent which the above-mentioned alkoxyl group may have, the following exemplified substituents may be used, and substituents other than these may be used: a halogen atom selected from a fluorine atom, a chlorine atom, a bromine atom and an iodine atom; a methyl group, a ethyl group Alkyl groups with 1 to 10 carbon atoms such as methoxy and isopropyl; alkoxy groups with 1 to 10 carbon atoms such as methoxy and ethoxy; amide group; nitro group; cyano group; amide group with 1 to 10 carbon atoms such as the above halogen atom, the above alkoxy group, acetyl group, benzyl group, the above amide group, the above nitro group, the above cyano group phenyl, naphthyl and other aryl groups having 6 to 10 carbon atoms in which 1 to 3 hydrogen atoms are substituted.

上述取代基之數量並無特別限定,較佳為1~3個。於具有2個以上取代基之情形時,取代基之種類可相同亦可不同。又,就工業上可經濟地製造之觀點而言,較佳為R 4~R 9未經取代。 The number of the above-mentioned substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kind of the substituents may be the same or different. Moreover, it is preferable that R 4 to R 9 are not substituted from the viewpoint of industrially economical production.

作為上述醯氧基之具體例,可例舉:氯乙醯氧基、三氟乙醯氧基、甲氧基乙醯氧基、苯氧基乙醯氧基、4-甲氧基苯甲醯氧基、4-硝基苯甲醯氧基、4-氰基苯甲醯氧基、4-三氟甲基苯甲醯氧基等。Specific examples of the above acyloxy group include chloroacetoxyl, trifluoroacetoxyl, methoxyacetoxyl, phenoxyacetyloxy, and 4-methoxybenzyloxy oxy, 4-nitrobenzyloxy, 4-cyanobenzyloxy, 4-trifluoromethylbenzyloxy and the like.

又,於R 4~R 9中,作為「可具有取代基之胺基」之具體結構,例如可採用以下胺基,亦可採用該等以外之胺基:胺基;N-甲基胺基、N,N-二甲基胺基、N-乙基胺基、N,N-二乙基胺基、N,N-甲基乙基胺基、N-丙基胺基、N,N-二丙基胺基、N-異丙基胺基、N,N-二異丙基胺基等脂肪族胺基;N-苯基胺基、N,N-二苯基胺基等芳香族胺基;甲醯胺基、乙醯胺基、癸醯胺基、苯甲醯胺基、氯乙醯胺基等醯胺基;苄氧基羰基胺基、第三丁氧基羰基胺基等烷氧基羰基胺基。 In addition, in R 4 to R 9 , as a specific structure of the "amino group which may have a substituent", for example, the following amino groups can be used, and other amino groups can also be used: amino group; N-methylamino group , N,N-dimethylamino, N-ethylamino, N,N-diethylamino, N,N-methylethylamino, N-propylamino, N,N- Dipropylamine, N-isopropylamine, N,N-diisopropylamine and other aliphatic amines; N-phenylamine, N,N-diphenylamine and other aromatic amines Carboxylamino, acetamide, decylamino, benzylamino, chloroacetamide and other amides; benzyloxycarbonylamino, tert-butoxycarbonylamino and other alkanes Oxycarbonylamino.

作為上述胺基,較佳為採用不具有酸度較高之質子,分子量較小,呈現可提高茀比率之趨勢的N,N-二甲基胺基、N-乙基胺基或N,N-二乙基胺基,更佳為採用N,N-二甲基胺基。As the above-mentioned amino group, it is preferable to use N,N-dimethylamino, N-ethylamino or N,N-dimethylamino, N-ethylamino or N,N- A diethylamine group, more preferably an N,N-dimethylamine group, is used.

又,於R 4~R 9中,作為「可具有取代基之碳數1~10之乙烯基或乙炔基」,例如可採用以下乙烯基及乙炔基,亦可採用該等以外之乙烯基等:乙烯基、2-甲基乙烯基、2,2-二甲基乙烯基、2-苯基乙烯基、2-乙醯基乙烯基、乙炔基、甲基乙炔基、第三丁基乙炔基、苯基乙炔基、乙醯基乙炔基、三甲基矽烷基乙炔基。 In addition, in R 4 to R 9 , as "the vinyl group or ethynyl group having 1 to 10 carbon atoms which may have a substituent", for example, the following vinyl group and ethynyl group can be used, and a vinyl group other than these can also be used. : Vinyl, 2-methylvinyl, 2,2-dimethylvinyl, 2-phenylvinyl, 2-acetylvinyl, ethynyl, methylethynyl, tert-butylethynyl , Phenylethynyl, Acetylethynyl, Trimethylsilylethynyl.

上述乙烯基及上述乙炔基之碳數較佳為4以下。若上述乙烯基及上述乙炔基之碳數處於該範圍內,則呈現不易產生茀環彼此之立體阻礙,獲得源自茀環之所需光學特性之趨勢。又,藉由茀環之共軛系變長,容易獲得更強之反波長色散性。The number of carbon atoms in the vinyl group and the ethynyl group is preferably 4 or less. When the carbon numbers of the vinyl group and the ethynyl group are within this range, steric hindrance between the perylene rings is unlikely to occur, and the desired optical properties derived from the perylene rings tend to be obtained. In addition, it is easy to obtain stronger inverse wavelength dispersion properties by increasing the length of the conjugated system of the pyrene ring.

又,於R 4~R 9中,作為「具有取代基之硫原子」,例如可採用以下含硫基,亦可採用該等以外之含硫基:磺基;甲基磺醯基、乙基磺醯基、丙基磺醯基、異丙基磺醯基等烷基磺醯基;苯基磺醯基、對甲苯基磺醯基等芳基磺醯基;甲基亞磺醯基、乙基亞磺醯基、丙基亞磺醯基、異丙基亞磺醯基等烷基亞磺醯基;苯基亞磺醯基、對甲苯基亞磺醯基等芳基亞磺醯基;甲硫基、乙硫基等烷硫基;苯硫基、對甲苯硫基等芳硫基;甲氧基磺醯基、乙氧基磺醯基等烷氧基磺醯基;苯氧基磺醯基等芳氧基磺醯基;胺基磺醯基;N-甲基胺基磺醯基、N-乙基胺基磺醯基、N-第三丁基胺基磺醯基、N,N-二甲基胺基磺醯基、N,N-二乙基胺基磺醯基等烷基磺醯基;N-苯基胺基磺醯基、N,N-二苯基胺基磺醯基等芳基胺基磺醯基。再者,磺基可與鋰、鈉、鉀、鎂、銨等形成鹽。 In addition, in R 4 to R 9 , as the "sulfur atom having a substituent", for example, the following sulfur-containing groups can be used, and other sulfur-containing groups can also be used: sulfo group; methylsulfonyl group, ethyl group Sulfonyl, propylsulfonyl, isopropylsulfonyl and other alkylsulfonyl; phenylsulfonyl, p-tolylsulfonyl and other arylsulfonyl; methylsulfinyl, ethylsulfonyl Alkylsulfinyl such as sulfosulfinyl, propylsulfinyl, isopropylsulfinyl; arylsulfinyl such as phenylsulfinyl, p-tolysulfinyl; Methylthio, ethylthio and other alkylthio groups; phenylthio, p-toluenethio and other arylthio groups; methoxysulfonyl, ethoxysulfonyl and other alkoxysulfonyl groups; phenoxysulfonyl Aryloxysulfonyl group such as acyl group; aminosulfonyl group; N-methylaminosulfonyl group, N-ethylaminosulfonyl group, N-tert-butylaminosulfonyl group, N, N-dimethylaminosulfonyl, N,N-diethylaminosulfonyl and other alkylsulfonyl; N-phenylaminosulfonyl, N,N-diphenylaminosulfonyl Arylaminosulfonyl such as acyl group. Furthermore, the sulfo group may form salts with lithium, sodium, potassium, magnesium, ammonium, and the like.

上述含硫基中,較佳為採用不具有酸度較高之質子,分子量較小且可提高茀比率的甲基亞磺醯基、乙基亞磺醯基或苯基亞磺醯基,更佳為採用甲基亞磺醯基。Among the above-mentioned sulfur-containing groups, it is preferred to use methylsulfinyl, ethylsulfinyl or phenylsulfinyl, which do not have protons with higher acidity, have a smaller molecular weight and can increase the ratio of sulfinyl, more preferably For the use of methylsulfinyl.

又,於R 4~R 9中,作為「具有取代基之矽原子」,例如可採用以下矽烷基:三甲基矽烷基、三乙基矽烷基等三烷基矽烷基;三甲氧基矽烷基、三乙氧基矽烷基等三烷氧基矽烷基。其等中,較佳為可穩定地處理之三烷基矽烷基。 In addition, in R 4 to R 9 , as the "silicon atom having a substituent", for example, the following silyl groups can be used: trimethylsilyl groups such as trimethylsilyl groups, triethylsilyl groups, etc.; trimethoxysilyl groups , Triethoxysilyl and other trialkoxysilyl groups. Among them, a trialkylsilyl group which can be handled stably is preferable.

又,於R 4~R 9中,作為「鹵素原子」,可採用氟原子、氯原子、溴原子、碘原子。其等中,較佳為採用相對容易導入且具有吸電子性因而呈提高茀9位之反應性之趨勢的氟原子、氯原子或溴原子,更佳為採用氯原子或溴原子。 In addition, among R 4 to R 9 , as the "halogen atom", a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom can be used. Among them, it is preferable to use a fluorine atom, a chlorine atom or a bromine atom which is relatively easy to introduce and has electron-withdrawing properties and thus tends to increase the reactivity of the 9-position, more preferably a chlorine atom or a bromine atom.

作為上述源自異山梨糖醇系二羥基化合物之結構單元,可例舉下式所表示之結構單元。 [化7]

Figure 02_image013
As a structural unit derived from the said isosorbide type dihydroxy compound, the structural unit represented by the following formula is mentioned. [hua 7]
Figure 02_image013

作為可導入上述通式(3)所表示之結構單元之二羥基化合物,可例舉處於立體異構物關係之異山梨糖醇(ISB)、去水甘露糖醇、異艾杜糖醇。該等可單獨使用1種,亦可將2種以上組合使用。其等中,就獲取及聚合反應性之觀點而言,最佳為使用ISB。As a dihydroxy compound into which the structural unit represented by the said general formula (3) can be introduce|transduced, isosorbide (ISB), anhydromannitol, and isoiditol in a stereoisomer relationship can be mentioned. These may be used individually by 1 type, and may be used in combination of 2 or more types. Among them, from the viewpoint of acquisition and polymerization reactivity, it is most preferable to use ISB.

上述通式(3)所表示之結構單元於上述樹脂中較佳為包含5質量%以上70質量%以下,進而較佳為包含10質量%以上65質量%以下,尤佳為包含20質量%以上60質量%以下。若上述通式(3)所表示之結構單元之含量過少,則有耐熱性不充分之虞。另一方面,若上述通式(3)所表示之結構單元之含量過多,則耐熱性過高,機械特性及/或熔融加工性變差。The structural unit represented by the general formula (3) is preferably contained in the resin in an amount of 5 mass % or more and 70 mass % or less, more preferably 10 mass % or more and 65 mass % or less, particularly preferably 20 mass % or more. 60 mass % or less. When there is too little content of the structural unit represented by the said general formula (3), there exists a possibility that heat resistance may become inadequate. On the other hand, when the content of the structural unit represented by the above-mentioned general formula (3) is too large, the heat resistance will be too high, and the mechanical properties and/or melt processability will be deteriorated.

作為源自二乙二醇、三乙二醇或聚乙二醇之結構單元,可例舉不含芳香族成分之下述通式(4)~(8)所表示之結構單元。As a structural unit derived from diethylene glycol, triethylene glycol, or polyethylene glycol, the structural unit represented by following general formula (4)-(8) which does not contain an aromatic component is mentioned.

[化8]

Figure 02_image015
[hua 8]
Figure 02_image015

上述通式(4)中,R 10表示可具有取代基之碳數2~20之伸烷基。 In the above general formula (4), R 10 represents an optionally substituted alkylene group having 2 to 20 carbon atoms.

作為可導入上述通式(4)之結構單元之二羥基化合物,例如可採用以下二羥基化合物:乙二醇、1,3-丙二醇、1,2-丙二醇、1,4-丁二醇、1,3-丁二醇、1,2-丁二醇、1,5-庚二醇、1,6-己二醇、1,9-壬二醇、1,10-癸二醇、1,12-十二烷二醇等直鏈脂肪族烴之二羥基化合物;新戊二醇、己二醇等支鏈脂肪族烴之二羥基化合物。As the dihydroxy compound into which the structural unit of the general formula (4) can be introduced, for example, the following dihydroxy compounds can be used: ethylene glycol, 1,3-propanediol, 1,2-propanediol, 1,4-butanediol, 1 ,3-butanediol, 1,2-butanediol, 1,5-heptanediol, 1,6-hexanediol, 1,9-nonanediol, 1,10-decanediol, 1,12 - Dihydroxy compounds of linear aliphatic hydrocarbons such as dodecanediol; dihydroxy compounds of branched aliphatic hydrocarbons such as neopentyl glycol and hexanediol.

[化9]

Figure 02_image017
[Chemical 9]
Figure 02_image017

上述通式(5)中,R 11表示可具有取代基之碳數4~20之伸環烷基。 In the above general formula (5), R 11 represents an optionally substituted cycloextended alkyl group having 4 to 20 carbon atoms.

作為可導入上述通式(5)之結構單元之二羥基化合物,例如可採用以下二羥基化合物:1,2-環己二醇、1,4-環己二醇、1,3-金剛烷二醇、氫化雙酚A、2,2,4,4-四甲基-1,3-環丁二醇等所例示的作為脂環式烴之二級醇及三級醇之二羥基化合物。As the dihydroxy compound into which the structural unit of the general formula (5) can be introduced, for example, the following dihydroxy compounds can be used: 1,2-cyclohexanediol, 1,4-cyclohexanediol, 1,3-adamantanediol Dihydroxy compounds of secondary alcohols and tertiary alcohols as alicyclic hydrocarbons exemplified by alcohols, hydrogenated bisphenol A, 2,2,4,4-tetramethyl-1,3-cyclobutanediol and the like.

[化10]

Figure 02_image019
[Chemical 10]
Figure 02_image019

上述通式(6)中,R 12表示可具有取代基之碳數4~20之伸環烷基。 In the above general formula (6), R 12 represents an optionally substituted cycloextended alkyl group having 4 to 20 carbon atoms.

作為可導入上述通式(6)之結構單元之二羥基化合物,例如可採用以下二羥基化合物:1,2-環己烷二甲醇、1,3-環己烷二甲醇、1,4-環己烷二甲醇、三環癸烷二甲醇、五環十五烷二甲醇、2,6-十氫萘二甲醇、1,5-十氫萘二甲醇、2,3-十氫萘二甲醇、2,3-降𦯉烷二甲醇、2,5-降𦯉烷二甲醇、1,3-金剛烷二甲醇、檸檬烯等衍生自萜烯化合物之二羥基化合物等所例示的作為脂環式烴之一級醇之二羥基化合物。As the dihydroxy compound into which the structural unit of the general formula (6) can be introduced, for example, the following dihydroxy compounds can be used: 1,2-cyclohexanedimethanol, 1,3-cyclohexanedimethanol, 1,4-cyclohexanedimethanol Hexane dimethanol, tricyclodecane dimethanol, pentacyclopentadecan dimethanol, 2,6-decahydronaphthalene dimethanol, 1,5-decahydronaphthalene dimethanol, 2,3-decahydronaphthalene dimethanol, Among the alicyclic hydrocarbons exemplified as dihydroxy compounds derived from terpene compounds, such as 2,3-noranadimethanol, 2,5-noranadimethanol, 1,3-adamantanedimethanol, limonene, etc. Dihydroxy compounds of primary alcohols.

[化11]

Figure 02_image021
[Chemical 11]
Figure 02_image021

上述通式(7)中,R 13表示可具有取代基之碳數2~10之伸烷基,p為1~40之整數。2個以上之R 13彼此可相同,亦可不同。 In the above general formula (7), R 13 represents an optionally substituted alkylene group having 2 to 10 carbon atoms, and p is an integer of 1 to 40. Two or more R 13 may be the same or different from each other.

作為可導入上述通式(7)之結構單元之二羥基化合物,例如可採用以下二羥基化合物:二乙二醇、三乙二醇、四乙二醇、聚乙二醇、聚丙二醇等氧伸烷基二醇類。As the dihydroxy compound into which the structural unit of the general formula (7) can be introduced, for example, the following dihydroxy compounds can be used: diethylene glycol, triethylene glycol, tetraethylene glycol, polyethylene glycol, polypropylene glycol, etc. Alkyl glycols.

[化12]

Figure 02_image023
[Chemical 12]
Figure 02_image023

上述通式(8)中,R 14表示可具有取代基之碳數2~20之具有縮醛環之基。 In the above general formula (8), R 14 represents a group having an acetal ring having 2 to 20 carbon atoms which may have a substituent.

作為可導入上述通式(8)之結構單元之二羥基化合物,例如可採用下述結構式(14)所表示之螺二醇或下述結構式(15)所表示之二㗁烷二醇等。As the dihydroxy compound into which the structural unit of the general formula (8) can be introduced, for example, spirodiols represented by the following structural formula (14) or diethylene glycol represented by the following structural formula (15) can be used. .

[化13]

Figure 02_image025
[Chemical 13]
Figure 02_image025

[化14]

Figure 02_image027
[Chemical 14]
Figure 02_image027

聚碳酸酯樹脂之詳細情況例如記載於日本專利特開2015-212816號公報、日本專利特開2010-134232號公報及日本專利特開2020-064298號公報中。該專利文獻之記載係作為參考而引用至本說明書中。Details of the polycarbonate resin are described in, for example, Japanese Patent Laid-Open No. 2015-212816, Japanese Patent Laid-Open No. 2010-134232, and Japanese Patent Laid-Open No. 2020-064298. The description of this patent document is incorporated in this specification as a reference.

A-2.第1硬化層及第2硬化層 如上所述,第1硬化層及第2硬化層可藉由相位差層所包含之樹脂與交聯劑交聯而形成。因此,第1硬化層及第2硬化層實質上可由經由交聯劑交聯之上述樹脂構成。本發明之實施方式之相位差膜藉由於相位差層之兩面具有第1硬化層及第2硬化層,具有加熱環境下、加濕環境下及接觸溶劑後之相位差變化較小,進而耐溶劑性亦優異之優點。 A-2. The first hardened layer and the second hardened layer As described above, the first cured layer and the second cured layer can be formed by crosslinking the resin and the crosslinking agent contained in the retardation layer. Therefore, the 1st hardened layer and the 2nd hardened layer can be comprised substantially from the said resin crosslinked by a crosslinking agent. Since the retardation film according to the embodiment of the present invention has the first hardened layer and the second hardened layer on both sides of the retardation layer, the retardation changes in a heating environment, in a humidified environment and after contact with a solvent are small, and furthermore, it is resistant to solvents. Sex is also excellent.

作為該交聯劑,例如可例舉:三丙二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、1,9-壬二醇二(甲基)丙烯酸酯、1,10-癸二醇二(甲基)丙烯酸酯、2-乙基-2-丁基丙二醇二(甲基)丙烯酸酯、雙酚A二(甲基)丙烯酸酯、雙酚A環氧乙烷加成物二(甲基)丙烯酸酯、雙酚A環氧丙烷加成物二(甲基)丙烯酸酯、雙酚A二縮水甘油醚二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、三環癸烷二甲醇二(甲基)丙烯酸酯、二㗁烷二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、二丙二醇二(甲基)丙烯酸酯、三丙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、EO改性二甘油四(甲基)丙烯酸酯等(甲基)丙烯酸與多元醇之酯化物;9,9-雙[4-(2-(甲基)丙烯醯氧基乙氧基)苯基]茀。該等可單獨使用一種,或以2種以上之混合物使用。其等中,尤佳為三環癸烷二甲醇二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯。該交聯劑可根據對進行交聯處理之延伸樹脂膜之膨潤性適當選擇。As this crosslinking agent, tripropylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, 9-nonanediol di(meth)acrylate, 1,10-decanediol di(meth)acrylate, 2-ethyl-2-butylpropanediol di(meth)acrylate, bisphenol A di(meth)acrylate (Meth)acrylate, Bisphenol A ethylene oxide adduct di(meth)acrylate, Bisphenol A propylene oxide adduct di(meth)acrylate, Bisphenol A diglycidyl ether di (Meth)acrylate, Neopentyl glycol di(meth)acrylate, Tricyclodecane dimethanol di(meth)acrylate, Diethylene glycol di(meth)acrylate, Polyethylene glycol Di(meth)acrylate, dipropylene glycol di(meth)acrylate, tripropylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, trimethylolpropane tri(meth)acrylate , Pentaerythritol tri(meth)acrylate, Pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, EO modified diglycerol tetra(meth)acrylate Ester of (meth)acrylic acid and polyhydric alcohols such as esters; 9,9-bis[4-(2-(meth)acrylooxyethoxy)phenyl]phenyl]. These can be used individually by 1 type, or can be used as a mixture of 2 or more types. Among them, tricyclodecane dimethanol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, and 1,6-hexanediol di(meth)acrylate are particularly preferred. The cross-linking agent can be appropriately selected according to the swellability of the stretched resin film subjected to the cross-linking treatment.

第1硬化層及第2硬化層之厚度較佳為0.2 μm~10.0 μm,進而較佳為0.5 μm~5.0 μm。藉由第1硬化層及第2硬化層之厚度處於此種範圍內,可獲得所需凝膠分率,結果,可獲得加熱環境下、加濕環境下及接觸溶劑後之相位差變化較小,進而耐溶劑性亦優異之相位差膜。The thicknesses of the first hardened layer and the second hardened layer are preferably 0.2 μm to 10.0 μm, and more preferably 0.5 μm to 5.0 μm. When the thicknesses of the first hardened layer and the second hardened layer are within this range, a desired gel fraction can be obtained, and as a result, a small change in phase difference can be obtained in a heating environment, in a humidified environment, and after contact with a solvent. , and a retardation film with excellent solvent resistance.

B.相位差膜之製造方法 B-1.樹脂膜之製造方法 作為上述樹脂膜之形成方法,可採用任意適當之方法。例如可例舉:熔融擠出法(例如T型模頭成形法)、流延塗佈法(例如流延法)、壓延成形法、熱壓法、共擠出法、共熔融法、多層擠出法、吹脹成形法等。較佳為使用T型模頭成形法、流延法及吹脹成形法。 B. Manufacturing method of retardation film B-1. Manufacturing method of resin film As a method for forming the above-mentioned resin film, any appropriate method can be adopted. For example, a melt extrusion method (such as a T-die forming method), a casting coating method (such as a casting method), a calender forming method, a hot pressing method, a co-extrusion method, a co-melting method, a multi-layer extrusion method can be mentioned. Extrusion method, inflation molding method, etc. Preferably, a T-die molding method, a casting method, and an inflation molding method are used.

樹脂膜(即未延伸膜)之厚度可根據所需光學特性、下述延伸條件等而設定為任意適當之值。較佳為50 μm~300 μm,更佳為80 μm~250 μm。The thickness of the resin film (ie, the unstretched film) can be set to any appropriate value according to required optical properties, stretching conditions described below, and the like. It is preferably 50 μm to 300 μm, more preferably 80 μm to 250 μm.

B-2.延伸樹脂膜之製造方法 上述延伸可採用任意適當之延伸方向、延伸條件(例如延伸溫度、延伸倍率、延伸方向),只要可獲得上述延伸樹脂膜即可。具體而言,自由端延伸、固定端延伸-自由端收縮、固定端收縮等各種延伸方法可單獨使用,亦可同時或逐次使用。關於延伸方向,可於水平方向、垂直方向、厚度方向、對角方向等各種方向及/或維度上進行。延伸溫度較佳為樹脂膜之玻璃轉移溫度(Tg)±20℃之範圍。 B-2. Manufacturing method of stretched resin film Any appropriate stretching direction and stretching conditions (such as stretching temperature, stretching ratio, stretching direction) can be adopted for the above-mentioned stretching, as long as the above-mentioned stretching resin film can be obtained. Specifically, various extension methods such as free-end extension, fixed-end extension-free-end shrinkage, and fixed-end shrinkage can be used individually, or simultaneously or sequentially. Regarding the extending direction, it can be carried out in various directions and/or dimensions such as the horizontal direction, the vertical direction, the thickness direction, and the diagonal direction. The extension temperature is preferably in the range of the glass transition temperature (Tg) of the resin film ±20°C.

藉由適當選擇上述延伸方法、延伸條件,最終可獲得具有所需光學特性(例如面內相位差)之相位差膜。By appropriately selecting the above-mentioned stretching method and stretching conditions, a retardation film having desired optical properties (eg, in-plane retardation) can be finally obtained.

於一實施方式中,延伸樹脂膜係藉由對樹脂膜進行單軸延伸或固定端單軸延伸而製作。作為單軸延伸之具體例,可例舉一面使樹脂膜於長條方向上移動,一面於長邊方向(即縱向)上延伸之方法。延伸倍率較佳為10%~500%。In one embodiment, the stretched resin film is produced by uniaxial stretching or fixed end uniaxial stretching of the resin film. As a specific example of uniaxial stretching, the method of extending in the longitudinal direction (that is, longitudinal direction) while moving the resin film in the longitudinal direction can be mentioned. The stretching ratio is preferably 10% to 500%.

於另一實施方式中,延伸樹脂膜係藉由將長條狀樹脂膜在相對於長邊方向呈角度θ之方向上連續地斜向延伸而製作。藉由採用斜向延伸,可獲得相對於膜之長邊方向具有角度θ之配向角之長條狀延伸樹脂膜,例如,與偏光元件積層時可實現輥對輥,從而可簡化製造步驟。In another embodiment, the stretched resin film is produced by continuously extending the elongated resin film obliquely in a direction at an angle θ with respect to the longitudinal direction. By adopting the oblique stretching, an elongated stretched resin film having an alignment angle of angle θ with respect to the longitudinal direction of the film can be obtained. For example, when laminating with a polarizer, roll-to-roll can be achieved, thereby simplifying the manufacturing process.

作為用於斜向延伸之延伸機,例如可例舉能夠對橫向及/或縱向施加左右速度不同之進給力或拉伸力或牽引力的拉幅式延伸機。拉幅式延伸機有橫向單軸延伸機、同時雙軸延伸機等,可使用任意適當之延伸機,只要能夠將長條狀樹脂膜連續地斜向延伸即可。As a stretching machine for oblique stretching, for example, a tenter-type stretching machine capable of applying a feed force, a stretching force, or a pulling force having different left and right speeds to the transverse direction and/or the longitudinal direction is exemplified. The tenter-type stretching machine includes a transverse uniaxial stretching machine, a simultaneous biaxial stretching machine, and the like, and any appropriate stretching machine can be used as long as the elongated resin film can be continuously stretched obliquely.

作為斜向延伸之方法,例如可例舉:日本專利特開昭50-83482號公報、日本專利特開平2-113920號公報、日本專利特開平3-182701號公報、日本專利特開2000-9912號公報、日本專利特開2002-86554號公報、日本專利特開2002-22944號公報中記載之方法。As a method of extending obliquely, for example, Japanese Patent Laid-Open No. 50-83482, Japanese Patent Laid-Open No. 2-113920, Japanese Patent Laid-Open No. 3-182701, and Japanese Patent Laid-Open No. 2000-9912 can be mentioned. No. , Japanese Patent Laid-Open No. 2002-86554, and Japanese Patent Laid-Open No. 2002-22944.

延伸樹脂膜之厚度較佳為10 μm~90 μm,更佳為20 μm~50 μm。The thickness of the stretched resin film is preferably 10 μm to 90 μm, more preferably 20 μm to 50 μm.

作為延伸樹脂膜,可直接使用市售之膜,亦可根據目的對市售之膜進行二次加工(例如延伸處理、表面處理)後使用。作為市售之膜之具體例,可例舉帝人公司製造之商品名「PURE-ACE RM」。As the stretched resin film, a commercially available film may be used as it is, or a commercially available film may be subjected to secondary processing (eg, stretching treatment, surface treatment) according to the purpose and used. As a specific example of a commercially available film, the trade name "PURE-ACE RM" by Teijin Corporation is mentioned.

於一實施方式中,對上述延伸樹脂膜實施緩和處理。藉此,可緩和因延伸產生之應力。作為緩和處理條件,可採用任意適當之條件。例如,使延伸樹脂膜沿延伸方向以特定緩和溫度及特定緩和率(即收縮率)收縮。緩和溫度較佳為60℃~150℃。緩和率較佳為3%~6%。In one embodiment, relaxation treatment is performed on the stretched resin film. Thereby, the stress which arises by extension can be relieve|moderated. Any appropriate conditions can be adopted as relaxation treatment conditions. For example, the stretched resin film is shrunk at a specific relaxation temperature and a specific relaxation rate (ie, shrinkage rate) in the extending direction. The relaxation temperature is preferably 60°C to 150°C. The relaxation rate is preferably 3% to 6%.

B-3.後交聯(第1硬化層及第2硬化層之形成) 於一實施方式中,經由包含交聯劑及自由基產生劑之反應性組合物,將聚對苯二甲酸乙二酯(PET)膜輥式層壓於上述延伸樹脂膜之兩面。藉由對所獲得之積層體進行交聯反應,可形成第1硬化層及第2硬化層。於另一實施方式中,於延伸樹脂膜之表面塗佈包含交聯劑及自由基產生劑(視需要包含之稀釋溶劑)之反應性組合物,視需要實施加熱處理後,於氮氣氛圍下(藉由熱或UV照射)進行交聯反應,藉此可獲得硬化層。藉由對延伸樹脂膜之兩面實施該操作,可於延伸樹脂膜(相位差層)之表面形成第1硬化層及第2硬化層。形成此種第1硬化層及第2硬化層時,形成延伸樹脂膜之樹脂無需包含交聯性基。於使用包含交聯性基之樹脂製造延伸樹脂膜之情形時,可能會產生該樹脂於製造步驟(例如混練、擠出、延伸)中發生凝膠化等問題。根據本發明之實施方式,可在不產生上述問題之情況下製造具有第1硬化層及第2硬化層之相位差膜。進而,根據本發明之實施方式之後交聯,可不改變通常之相位差膜及製造該相位差膜之步驟而供於製造本發明之實施方式之相位差膜。本發明在該方面具有優異之效果。 B-3. Post-crosslinking (formation of the first hardened layer and the second hardened layer) In one embodiment, a polyethylene terephthalate (PET) film is roll-laminated on both sides of the above stretched resin film through a reactive composition comprising a crosslinking agent and a free radical generator. A first hardened layer and a second hardened layer can be formed by subjecting the obtained laminate to a crosslinking reaction. In another embodiment, the surface of the stretched resin film is coated with a reactive composition comprising a cross-linking agent and a free-radical generator (a diluting solvent included as needed), and after heat treatment as needed, under a nitrogen atmosphere ( The crosslinking reaction is carried out by heat or UV irradiation), whereby a hardened layer can be obtained. By performing this operation on both sides of the stretched resin film, the first cured layer and the second cured layer can be formed on the surface of the stretched resin film (retardation layer). When forming such a 1st hardened layer and a 2nd hardened layer, the resin which forms a stretched resin film does not need to contain a crosslinkable group. When a resin containing a crosslinkable group is used to manufacture a stretched resin film, problems such as gelation of the resin during manufacturing steps (eg, kneading, extrusion, and stretching) may arise. According to embodiment of this invention, the retardation film which has a 1st hardened layer and a 2nd hardened layer can be manufactured, without generating the said problem. Furthermore, after crosslinking according to the embodiment of the present invention, it can be used for the production of the retardation film of the embodiment of the present invention without changing the normal retardation film and the steps of producing the retardation film. The present invention has an excellent effect in this respect.

如上述另一實施方式所示,於在延伸樹脂膜之表面塗佈反應性組合物之情形時,為了促進交聯劑滲入延伸樹脂膜,可進行加熱處理。該加熱處理之加熱溫度較佳為低於延伸樹脂膜之樹脂之玻璃轉移溫度的溫度。其原因在於,若在高於玻璃轉移溫度之溫度下進行加熱處理,則延伸樹脂膜之相位差會減少。於使用對延伸樹脂膜之滲透性較高之交聯劑之情形時,無需該加熱處理。又,於反應性組合物中包含揮發溶劑之情形時,該加熱處理可與乾燥步驟結合進行。As shown in another embodiment described above, when the reactive composition is applied to the surface of the stretched resin film, in order to promote the penetration of the crosslinking agent into the stretched resin film, a heat treatment may be performed. The heating temperature of the heat treatment is preferably a temperature lower than the glass transition temperature of the resin of the stretched resin film. This is because the retardation of the stretched resin film decreases when the heat treatment is performed at a temperature higher than the glass transition temperature. In the case of using a cross-linking agent having high permeability to the stretched resin film, this heat treatment is not required. Also, in the case where a volatile solvent is contained in the reactive composition, the heat treatment may be performed in combination with the drying step.

作為上述自由基產生劑,代表性地可例舉熱自由基產生劑及光自由基產生劑,皆可使用。又,自由基產生劑有裂解型自由基產生劑及奪氫型自由基產生劑,較佳為使用奪氫型自由基產生劑之類的奪氫能力較高者。即,於本發明之實施方式中,適宜使用奪氫型熱自由基產生劑或奪氫型光自由基產生劑。認為藉由奪氫型自由基產生劑成為自由基,該自由基奪去相位差膜所包含之樹脂中之氫,使該樹脂之化學結構產生自由基,以此為起點使單體進行聚合(即加成)反應。其原因在於,於本發明之實施方式中,使用多官能單體作為上述交聯劑,故其反應點成為交聯點。As said radical generator, a thermal radical generator and a photoradical generator are mentioned typically, and both can be used. Further, the radical generator includes a cleavage-type radical generator and a hydrogen abstraction type radical generator, and it is preferable to use a hydrogen abstraction type radical generator such as a hydrogen abstraction type radical generator which has a higher hydrogen abstraction ability. That is, in the embodiment of the present invention, a hydrogen abstraction type thermal radical generator or a hydrogen abstraction type photoradical generator is suitably used. It is considered that the hydrogen abstraction type radical generator becomes a radical, and the radical deprives the hydrogen in the resin contained in the retardation film to generate a radical in the chemical structure of the resin, and the monomer is polymerized from this as a starting point ( addition) reaction. The reason for this is that in the embodiment of the present invention, since a polyfunctional monomer is used as the above-mentioned crosslinking agent, the reaction point thereof becomes a crosslinking point.

作為上述奪氫型熱自由基產生劑,可例舉有機過氧化物,例如:PERBUTYL D、PERBUTYL C、PERCUMYL D、PERHEXYL D、PERBUTYL E、PERBUTYL I、PERHEXYL I、PERBUTYL Z、PERHEXYL Z、PERBUTYL A、PERBUTYL 355、PERBUTYL L、PERBUTYL O、PERHEXYL O、PEROCTA O、PERBUTYL PV、PERHEXYL PV、PERBUTYL ND、PERHEXYL ND、PEROCTA ND、PERHEXA V、PERHEXA 22、PERHEXA 3M、PERHEXA C、PERHEXA HC、PERTETRA A、PERHEXA MC、NYPER BW、PEROYL 355、PEROYL L。作為上述奪氫型光自由基產生劑,可例舉日本專利特開2012-52000號公報中記載者。進而,亦可例舉3,3',4,4'-四(第三丁基過氧羰基)二苯甲酮(BTTB)、PERDUAL TA、PERDUAL TX。Examples of the above-mentioned hydrogen abstraction type thermal radical generator include organic peroxides, for example: PERBUTYL D, PERBUTYL C, PERCUMYL D, PERHEXYL D, PERBUTYL E, PERBUTYL I, PERHEXYL I, PERBUTYL Z, PERHEXYL Z, PERBUTYL A , PERBUTYL 355, PERBUTYL L, PERBUTYL O, PERHEXYL O, PEROCTA O, PERBUTYL PV, PERHEXYL PV, PERBUTYL ND, PERHEXYL ND, PEROCTA ND, PERHEXA V, PERHEXA 22, PERHEXA 3M, PERHEXA C, PERHEXA HC, PERTETRA A, PERHEXA MC, NYPER BW, PEROYL 355, PEROYL L. As the above-mentioned hydrogen abstraction type photoradical generator, those described in Japanese Patent Laid-Open No. 2012-52000 may, for example, be mentioned. Furthermore, 3,3',4,4'-tetrakis (tert-butylperoxycarbonyl) benzophenone (BTTB), PERDUAL TA, and PERDUAL TX can also be mentioned.

以上獲得之相位差膜可於高溫甲醇分解處理後,供於基質輔助雷射脫附游離飛行時間質譜儀(MALDI-TOFMS,BRUKER DALTONICS公司製造)測定。可根據是否獲得源自交聯反應之重複圖案來評估是否進行了上述後交聯反應。The retardation film obtained above can be subjected to a matrix-assisted laser desorption free time-of-flight mass spectrometer (MALDI-TOFMS, manufactured by BRUKER DALTONICS) after high-temperature methanolysis treatment. Whether or not the above-mentioned post-crosslinking reaction has been performed can be evaluated based on whether or not a repeating pattern derived from the crosslinking reaction is obtained.

C.圓偏光板 本發明之實施方式之圓偏光板具有上述A項及B項中記載之相位差膜、及偏光元件。於偏光元件之至少一側可配置保護層。相位差膜之相位差層之遲相軸與偏光元件之吸收軸所形成的角度較佳為35°~55°,更佳為40°~50°,尤佳為43°~47°,最佳為約45°。 C. Circular polarizer The circularly polarizing plate which concerns on embodiment of this invention has the retardation film described in the said item A and B, and a polarizing element. A protective layer can be disposed on at least one side of the polarizing element. The angle formed by the retardation axis of the retardation layer of the retardation film and the absorption axis of the polarizing element is preferably 35° to 55°, more preferably 40° to 50°, particularly preferably 43° to 47°, the best is about 45°.

作為偏光元件,可採用任意適當之偏光元件。例如,形成偏光元件之樹脂膜可為單層樹脂膜,亦可為兩層以上之積層體。As the polarizing element, any appropriate polarizing element can be used. For example, the resin film forming the polarizing element may be a single-layer resin film, or may be a laminate of two or more layers.

作為由單層樹脂膜構成之偏光元件之具體例,可例舉:對聚乙烯醇(PVA)系膜、部分縮甲醛化PVA系膜、乙烯-乙酸乙烯酯共聚物系部分皂化膜等親水性高分子膜實施了利用碘或二色性染料等二色性物質之染色處理及延伸處理者;PVA之脫水處理物或聚氯乙烯之脫氯化氫處理物等多烯系配向膜等。自光學特性優異之方面考慮,較佳為使用將PVA系膜利用碘染色並進行單軸延伸所獲得之偏光元件。Specific examples of the polarizer composed of a single-layer resin film include hydrophilicity to polyvinyl alcohol (PVA)-based films, partially formalized PVA-based films, and ethylene-vinyl acetate copolymer-based partially saponified films. The polymer film has been dyed and stretched with dichroic substances such as iodine or dichroic dyes; polyene-based alignment films such as PVA dehydration products or polyvinyl chloride dehydrochlorination products, etc. From the viewpoint of being excellent in optical properties, it is preferable to use a polarizing element obtained by uniaxially stretching a PVA-based film by dyeing it with iodine.

上述利用碘所進行之染色例如藉由將PVA系膜浸漬於碘水溶液中而進行。上述單軸延伸之延伸倍率較佳為3倍~7倍。延伸可於染色處理後進行,亦可一面染色一面進行。又,亦可先延伸再染色。視需要對PVA系膜實施膨潤處理、交聯處理、洗淨處理、乾燥處理等。例如,藉由在染色之前將PVA系膜浸漬於水中進行水洗,不僅可將PVA系膜表面之污垢及/或抗黏連劑洗淨,而且可使PVA系膜膨潤,防止染色不均等。The above-mentioned dyeing with iodine is performed, for example, by immersing the PVA-based film in an aqueous iodine solution. The stretching ratio of the above-mentioned uniaxial stretching is preferably 3 times to 7 times. The stretching can be carried out after the dyeing treatment, or can be carried out while dyeing. In addition, it is also possible to extend and then dye. The PVA-based film is subjected to swelling treatment, crosslinking treatment, washing treatment, drying treatment, and the like as necessary. For example, by immersing the PVA film in water and washing it before dyeing, not only the dirt and/or anti-blocking agent on the surface of the PVA film can be removed, but also the PVA film can be swelled and uneven dyeing can be prevented.

作為使用積層體所獲得之偏光元件之具體例,可例舉使用以下積層體所獲得之偏光元件,上述積層體為樹脂基材與積層於該樹脂基材之PVA系樹脂層(PVA系樹脂膜)之積層體、或樹脂基材與塗佈形成於該樹脂基材之PVA系樹脂層之積層體。使用樹脂基材與塗佈形成於該樹脂基材之PVA系樹脂層之積層體所獲得的偏光元件例如可藉由以下方式製作:將PVA系樹脂溶液塗佈於樹脂基材,使其乾燥而於樹脂基材上形成PVA系樹脂層,獲得樹脂基材與PVA系樹脂層之積層體;將該積層體延伸並染色而將PVA系樹脂層製成偏光元件。於本實施方式中,延伸代表性地包括使積層體浸漬於硼酸水溶液中而延伸。進而,延伸視需要可進而包括於在硼酸水溶液中進行延伸之前,將積層體於高溫(例如95℃以上)下進行空中延伸。所獲得之樹脂基材/偏光元件之積層體可直接使用(即,可將樹脂基材作為偏光元件之保護層),亦可將樹脂基材自樹脂基材/偏光元件之積層體剝離,於該剝離面積層與目的對應之任意適當之保護層而使用。此種偏光元件之製造方法之詳細情況例如記載於日本專利特開2012-73580號公報中。該公報之全部記載係作為參考而引用至本說明書中。As a specific example of a polarizing element obtained by using a laminate, a polarizing element obtained by using a laminate comprising a resin base material and a PVA-based resin layer (PVA-based resin film) laminated on the resin base material can be exemplified. ), or a laminate of a resin substrate and a PVA-based resin layer coated on the resin substrate. A polarizing element obtained by using a laminate of a resin base material and a PVA-based resin layer formed on the resin base material can be produced, for example, by applying a PVA-based resin solution to a resin base material and drying it to obtain a polarizing element. A PVA-based resin layer is formed on a resin substrate to obtain a laminate of the resin substrate and the PVA-based resin layer; the laminate is extended and dyed to make the PVA-based resin layer into a polarizer. In the present embodiment, the stretching typically includes stretching the layered body by immersing it in a boric acid aqueous solution. Furthermore, the stretching may further include performing in-air stretching of the laminated body at a high temperature (eg, 95° C. or higher) before stretching in a boric acid aqueous solution, if necessary. The obtained laminate of resin substrate/polarizing element can be used as it is (that is, the resin substrate can be used as a protective layer of the polarizing element), or the resin substrate can be peeled off from the laminate of resin substrate/polarizing element, and the This peeling area layer is used with any appropriate protective layer according to the purpose. Details of the manufacturing method of such a polarizing element are described in, for example, Japanese Patent Laid-Open No. 2012-73580. The entire description of this gazette is incorporated herein by reference.

偏光元件之厚度例如為1 μm~80 μm。於一實施方式中,偏光元件之厚度較佳為1 μm~15 μm,更佳為3 μm~10 μm,進而較佳為3 μm~8 μm。若偏光元件之厚度處於此種範圍內,則可良好地抑制加熱時之捲曲,並且可獲得良好之加熱時之外觀耐久性。The thickness of the polarizing element is, for example, 1 μm to 80 μm. In one embodiment, the thickness of the polarizing element is preferably 1 μm˜15 μm, more preferably 3 μm˜10 μm, and more preferably 3 μm˜8 μm. When the thickness of the polarizing element is within such a range, curling during heating can be suppressed favorably, and favorable appearance durability during heating can be obtained.

D.圖像顯示裝置 上述A項及B項中記載之相位差膜及C項中記載之圓偏光板可用於圖像顯示裝置。因此,於本發明之實施方式中,亦包含使用此種光學積層體之圖像顯示裝置。作為圖像顯示裝置之代表例,可例舉液晶顯示裝置、有機EL顯示裝置。本發明之實施方式之圖像顯示裝置具備上述A項及B項中記載之相位差膜及C項中記載之圓偏光板。 [實施例] D. Image Display Device The retardation film described in the above-mentioned items A and B and the circularly polarizing plate described in the item C can be used for an image display device. Therefore, an image display device using such an optical laminate is also included in the embodiment of the present invention. Typical examples of the image display device include a liquid crystal display device and an organic EL display device. An image display device according to an embodiment of the present invention includes the retardation film described in the above-mentioned items A and B, and the circular polarizing plate described in the item C. [Example]

以下,藉由實施例對本發明具體地進行說明,但本發明並不受該等實施例限定。各特性之測定方法如下。再者,實施例及比較例中之「份」及「%」若無特別說明,則以重量為基準。Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited to these examples. The measurement method of each characteristic is as follows. In addition, "parts" and "%" in Examples and Comparative Examples are based on weight unless otherwise specified.

(1)厚度 使用針盤量規(PEACOCK公司製造,製品名「DG-205 type pds-2」)進行測定。 (2)相位差值 自實施例及比較例中所獲得之相位差膜切出50 mm×50 mm之樣品作為測定樣品,使用Axometrics公司製造之Axoscan進行測定。測定波長為450 nm、550 nm、650 nm,測定溫度為23℃。 (3)加熱相位差變化 藉由經由黏著劑層將實施例及比較例中所獲得之相位差膜貼合於玻璃而製作樣品,利用與上述相位差之測定同樣之方法測定相位差。將測定後之樣品放入105℃之烘箱中120小時後,取出樣品,再次測定相位差,求出Re(550)之變化率。 (4)加濕相位差變化 藉由經由黏著劑層將實施例及比較例中所獲得之相位差膜貼合於玻璃而製作樣品,利用與上述相位差之測定同樣之方法測定相位差。將測定後之樣品放入85℃、濕度85%之烘箱中120小時後,取出樣品,再次測定相位差,求出Re(550)之變化率(%)。 (5)接觸溶劑後之相位差變化 對於實施例及比較例中所獲得之相位差膜,利用與上述相位差之測定同樣之方法測定相位差。對測定後之樣品滴加甲苯或環戊酮,1分鐘後擦去該溶劑。再次測定擦去溶劑後溶劑接觸之部位之相位差,求出Re(550)之變化率(%)。 (6)耐溶劑性試驗 對實施例及比較例中所獲得之相位差膜滴加甲苯或環戊酮,1分鐘後擦去該溶劑。將擦去溶劑後溶劑接觸之部位未留下痕跡者評估為良,將留下痕跡者評估為不良。 (7)凝膠分率 採取約5 cm見方之實施例及比較例中所獲得之相位差膜,測定重量後,將其浸漬於50 g甲苯中1小時。浸漬後,取出殘存物,於150℃下進行10分鐘乾燥處理,再次測定重量,算出凝膠分率(%)。 (1) Thickness The measurement was performed using a dial gauge (manufactured by PEACOCK, product name "DG-205 type pds-2"). (2) Phase difference value A sample of 50 mm×50 mm was cut out from the retardation film obtained in the example and the comparative example as a measurement sample, and the measurement was carried out using Axoscan manufactured by Axometrics. The measurement wavelengths were 450 nm, 550 nm, and 650 nm, and the measurement temperature was 23°C. (3) Heating phase difference change A sample was produced by bonding the retardation film obtained in the Example and the comparative example to glass through the adhesive bond layer, and the retardation was measured by the method similar to the measurement of the said retardation. The sample after the measurement was placed in an oven at 105° C. for 120 hours, then the sample was taken out, the phase difference was measured again, and the rate of change of Re(550) was calculated. (4) Humidification phase difference change A sample was produced by bonding the retardation film obtained in the Example and the comparative example to glass through the adhesive bond layer, and the retardation was measured by the method similar to the measurement of the said retardation. The sample after the measurement was placed in an oven at 85°C and a humidity of 85% for 120 hours, then the sample was taken out, the phase difference was measured again, and the rate of change (%) of Re(550) was determined. (5) Phase difference change after contact with solvent With respect to the retardation films obtained in Examples and Comparative Examples, the retardation was measured by the same method as the measurement of the above-mentioned retardation. Toluene or cyclopentanone was added dropwise to the sample after the measurement, and the solvent was wiped off after 1 minute. After the solvent was wiped off, the phase difference of the portion in contact with the solvent was measured again, and the rate of change (%) of Re(550) was determined. (6) Solvent resistance test Toluene or cyclopentanone was added dropwise to the retardation films obtained in Examples and Comparative Examples, and the solvent was wiped off after 1 minute. After wiping off the solvent, no traces were left on the parts where the solvent was in contact, and those with traces were evaluated as poor. (7) Gel fraction The retardation films obtained in the Examples and Comparative Examples with a square of about 5 cm were collected, and after measuring the weight, they were immersed in 50 g of toluene for 1 hour. After the immersion, the residue was taken out, dried at 150° C. for 10 minutes, the weight was measured again, and the gel fraction (%) was calculated.

[實施例1] 1.聚碳酸酯樹脂之製備 使用包含2台具備攪拌葉及控制在100℃之回流冷卻器之立式反應器的分批聚合裝置進行聚合。加入雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷29.60質量份(0.046 mol)、ISB 29.21質量份(0.200 mol)、SPG 42.28質量份(0.139 mol)、DPC 63.77質量份(0.298 mol)及作為觸媒之乙酸鈣一水合物1.19×10 -2質量份(6.78×10 -5mol)。將反應器內進行減壓氮氣置換後,利用熱媒進行加溫,於內溫達到100℃時開始攪拌。升溫開始40分鐘後使內溫達到220℃,進行控制以保持該溫度,同時開始減壓,達到220℃後耗時90分鐘使壓力為13.3 kPa。將隨著聚合反應副產之苯酚蒸氣導入100℃之回流冷卻器中,使苯酚蒸氣中包含之若干單體成分返回反應器中,將未冷凝之苯酚蒸氣導入45℃之冷凝器中進行回收。向第1反應器中導入氮氣而暫時恢復至大氣壓後,將第1反應器內之經低聚物化之反應液轉移至第2反應器中。繼而,開始第2反應器內之升溫及減壓,耗時50分鐘使內溫為240℃,壓力為0.2 kPa。其後,進行聚合直至達到特定攪拌動力。於達到特定動力時向反應器中導入氮氣進行複壓,將所生成之聚酯碳酸酯擠出至水中,切割線料而獲得顆粒。 [Example 1] 1. Preparation of polycarbonate resin Polymerization was performed using a batch polymerization apparatus including two vertical reactors equipped with stirring blades and a reflux cooler controlled at 100°C. 29.60 parts by mass (0.046 mol) of bis[9-(2-phenoxycarbonylethyl)perpen-9-yl]methane, 29.21 parts by mass (0.200 mol) of ISB, 42.28 parts by mass (0.139 mol) of SPG, and 63.77 parts by mass of DPC were added parts by mass (0.298 mol) and 1.19×10 −2 mass parts (6.78×10 −5 mol) of calcium acetate monohydrate as a catalyst. After the inside of the reactor was replaced with nitrogen under reduced pressure, it was heated with a heat medium, and stirring was started when the internal temperature reached 100°C. 40 minutes after the start of the temperature increase, the internal temperature was brought to 220°C, and the pressure was reduced to 13.3 kPa in 90 minutes after reaching 220°C while controlling to maintain the temperature. The phenol vapor produced by the polymerization reaction was introduced into a reflux cooler at 100°C, and some monomer components contained in the phenol vapor were returned to the reactor, and the uncondensed phenol vapor was introduced into a condenser at 45°C for recovery. After nitrogen gas was introduced into the first reactor and the pressure was temporarily returned to atmospheric pressure, the oligomerized reaction liquid in the first reactor was transferred to the second reactor. Then, the temperature increase and pressure reduction in the second reactor were started, and the internal temperature was set to 240° C. and the pressure to 0.2 kPa over 50 minutes. After that, polymerization is carried out until a certain stirring power is reached. When a specific power is reached, nitrogen gas is introduced into the reactor for re-pressurization, the produced polyester carbonate is extruded into water, and the strands are cut to obtain pellets.

2.樹脂膜之製備 將所獲得之聚碳酸酯樹脂於80℃下真空乾燥5小時後,使用具備單軸擠出機(東芝機械公司製造,料缸設定溫度:250℃)、T型模頭(寬度200 mm,設定溫度:250℃)、冷卻輥(設定溫度:120~130℃)及捲取機之製膜裝置,製作厚度135 μm之樹脂膜。 2. Preparation of resin film After vacuum-drying the obtained polycarbonate resin at 80°C for 5 hours, a single-screw extruder (manufactured by Toshiba Machine Co., Ltd., cylinder setting temperature: 250°C) and a T-die (width 200 mm, set Temperature: 250°C), a cooling roll (set temperature: 120-130°C), and a film-forming device of a winder to produce a resin film with a thickness of 135 μm.

3.延伸樹脂膜之製作 將所獲得之長條狀樹脂膜於寬度方向上以延伸溫度134℃、延伸倍率2.8倍進行延伸,繼而,於延伸後之膜之寬度方向上實施緩和處理。將緩和處理之條件設為緩和溫度130℃、緩和率4.5%。繼而,藉由在125℃下進行2分鐘加熱處理,獲得厚度48 μm之延伸樹脂膜。所獲得之延伸樹脂膜之Re(550)為180 nm,Re(450)/Re(550)為0.85。 3. Fabrication of stretched resin film The obtained long resin film was stretched in the width direction at a stretching temperature of 134° C. and a stretching ratio of 2.8 times, and then, relaxation treatment was performed in the width direction of the stretched film. The conditions of the relaxation treatment were set to a relaxation temperature of 130° C. and a relaxation rate of 4.5%. Next, a stretched resin film with a thickness of 48 μm was obtained by performing heat treatment at 125° C. for 2 minutes. Re(550) of the obtained stretched resin film was 180 nm, and Re(450)/Re(550) was 0.85.

4.後交聯 將作為奪氫型熱自由基產生劑之過氧化2-乙基己酸1,1,3,3-四甲基丁酯(日油股份有限公司製造,製品名「PEROCTA O」)10質量份與作為交聯劑之三環癸烷二甲醇二丙烯酸酯(新中村化學工業公司製造,製品名「A-DCP」)100質量份加以混合,製備反應性組合物1。經由該反應性組合物1,將聚對苯二甲酸乙二酯(PET)膜(厚度50 μm)輥式層壓於上述3.中獲得之延伸樹脂膜之兩面,獲得具有「PET膜/反應性組合物1/延伸樹脂膜/反應性組合物1/PET膜」之構成之積層體。對該積層體於120℃下進行10分鐘熱處理而進行交聯處理。繼而,將該積層體之兩面之PET膜剝離,獲得相位差膜。所獲得之相位差膜之厚度為50 μm,Re(550)為144 nm,Re(450)/Re(550)為0.85,霧度為0.7%。將所獲得之相位差膜供於上述(3)~(7)之評估。將結果示於表1。 4. Post-crosslinking 10 parts by mass of 1,1,3,3-tetramethylbutyl peroxide 2-ethylhexanoate (manufactured by NOF Corporation, product name "PEROCTA O") as a hydrogen abstraction type thermal radical generator A reactive composition 1 was prepared by mixing with 100 parts by mass of tricyclodecane dimethanol diacrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., product name "A-DCP") as a crosslinking agent. Through the reactive composition 1, a polyethylene terephthalate (PET) film (thickness 50 μm) was roll-laminated on both sides of the stretched resin film obtained in the above 3., to obtain a film with “PET film/reaction”. A laminate of the composition of reactive composition 1/stretched resin film/reactive composition 1/PET film". This layered body was subjected to a heat treatment at 120° C. for 10 minutes to perform a crosslinking treatment. Next, the PET films on both surfaces of the laminate were peeled off to obtain a retardation film. The obtained retardation film had a thickness of 50 μm, a Re(550) of 144 nm, a Re(450)/Re(550) of 0.85, and a haze of 0.7%. The obtained retardation film was used for the evaluation of the above-mentioned (3) to (7). The results are shown in Table 1.

5.後交聯之評估 對4.中獲得之相位差膜進行高溫甲醇分解處理,對分解得到之甲酯物進行MALDI-TOFMS測定,結果確認到除存在丙烯酸甲酯(PMA)單體外,還存在異山梨糖醇(ISB)+PMA加成物。ISB+PMA加成物係藉由以下方式認定:對異山梨糖醇加成丙烯酸甲酯而成之低聚物之Na加成物被檢測為m/z=146.0579(ISB)+86.0348(PMA)×n+22.99所表示之峰群。未鍵結於異山梨糖醇之PMA單體係藉由以下方式認定:丙烯酸甲酯之低聚物之Na加成物被檢測為m/z=0+86.0348(PMA)×n+22.99所表示之峰群。 [化15]

Figure 02_image029
(ISB+PMA加成物):推定鍵結位置 [化16]
Figure 02_image031
(單獨PMA) ISB+PMA加成物之存在意味著於聚酯碳酸酯樹脂中,多官能丙烯酸單體形成有碳-碳鍵。 5. Evaluation of post-crosslinking The retardation film obtained in 4. was subjected to high temperature methanol decomposition treatment, and the methyl ester obtained by decomposition was subjected to MALDI-TOFMS measurement. The results confirmed that in addition to the presence of methyl acrylate (PMA) monomer, There is also an isosorbide (ISB) + PMA adduct. The ISB+PMA adduct was identified by the following method: The Na adduct of an oligomer obtained by adding methyl acrylate to isosorbide was detected as m/z=146.0579(ISB)+86.0348(PMA)× The peak group represented by n+22.99. The PMA monomer system not bound to isosorbide was identified by the following method: The Na adduct of the oligomer of methyl acrylate was detected as represented by m/z=0+86.0348(PMA)×n+22.99 peak group. [Chemical 15]
Figure 02_image029
(ISB+PMA adduct): Presumed bond position [Chemical 16]
Figure 02_image031
(PMA alone) The presence of the ISB+PMA adduct means that in the polyester carbonate resin, the polyfunctional acrylic monomer forms a carbon-carbon bond.

[實施例2] 除適當調整延伸溫度、延伸倍率以外,藉由與實施例1同樣之方式獲得延伸樹脂膜。該延伸樹脂膜之厚度為48 μm,Re(550)為147 nm,Re(450)/Re(550)為0.85。 [Example 2] A stretched resin film was obtained in the same manner as in Example 1 except that the stretching temperature and the stretching ratio were appropriately adjusted. The thickness of the stretched resin film was 48 μm, Re(550) was 147 nm, and Re(450)/Re(550) was 0.85.

將作為奪氫型光自由基產生劑之2,4-二乙基9-氧硫𠮿

Figure 110126406-0000-3
(日本化藥公司製造,商品名「DETX-S」)1質量份、作為交聯劑之1,6-己二醇二丙烯酸酯(新中村化學工業公司製造,製品名「A-HD-N」)50重量份及三羥甲基丙烷三丙烯酸酯(新中村化學工業公司製造,製品名「A-TMPT」)50質量份加以混合,製備反應性組合物2。經由上述反應性組合物2,將聚對苯二甲酸乙二酯(PET)膜(厚度50 μm)輥式層壓於上述延伸樹脂膜之兩面,獲得具有「PET膜/反應性組合物2/延伸樹脂膜/反應性組合物2/PET膜」之構成之積層體。對該積層體進行UV照射(900 mJ/cm 2)而進行交聯處理。繼而,將該積層體之兩面之PET膜剝離,獲得相位差膜。所獲得之相位差膜之厚度為50 μm,Re(550)為144 nm,Re(450)/Re(550)為0.85,霧度為0.9%。將所獲得之相位差膜供於上述(3)~(7)之評估。將結果示於表1。 2,4-diethyl 9-oxothiocyanate will be used as hydrogen abstraction type photoradical generator
Figure 110126406-0000-3
(manufactured by Nippon Kayaku Co., Ltd., trade name "DETX-S") 1 part by mass, 1,6-hexanediol diacrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., trade name "A-HD-N") as a crosslinking agent ”) 50 parts by weight and 50 parts by weight of trimethylolpropane triacrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., product name “A-TMPT”) were mixed to prepare reactive composition 2. Through the above-mentioned reactive composition 2, a polyethylene terephthalate (PET) film (thickness 50 μm) was roll-laminated on both sides of the above-mentioned stretched resin film to obtain a film with “PET film/reactive composition 2/ Laminated product of the composition of stretched resin film/reactive composition 2/PET film". This layered product was subjected to UV irradiation (900 mJ/cm 2 ) to perform crosslinking treatment. Next, the PET films on both surfaces of the laminate were peeled off to obtain a retardation film. The obtained retardation film had a thickness of 50 μm, a Re(550) of 144 nm, a Re(450)/Re(550) of 0.85, and a haze of 0.9%. The obtained retardation film was used for the evaluation of the above-mentioned (3) to (7). The results are shown in Table 1.

[實施例3] 除適當調整延伸溫度、延伸倍率以外,藉由與實施例1同樣之方式獲得延伸樹脂膜。該延伸樹脂膜之厚度為48 μm,Re(550)為165 nm,Re(450)/Re(550)為0.85。 [Example 3] A stretched resin film was obtained in the same manner as in Example 1 except that the stretching temperature and the stretching ratio were appropriately adjusted. The thickness of the stretched resin film was 48 μm, Re(550) was 165 nm, and Re(450)/Re(550) was 0.85.

將作為奪氫型光自由基產生劑之3,3',4,4'-四(第三丁基過氧羰基)二苯甲酮(日油公司製造,製品名「BTTB-20G」(PGMEA溶液20重量%溶液))10重量份、作為交聯劑之1,6-己二醇二丙烯酸酯(新中村化學工業公司製造,製品名「A-HD-N」)50重量份及三羥甲基丙烷三丙烯酸酯(新中村化學工業公司製造,製品名「A-TMPT」)50質量份加以混合,製備反應性組合物3。將上述反應性組合物3棒式塗佈於上述延伸樹脂膜之單側表面,於50℃下進行10分鐘加熱處理後,於氮氣氛圍下進行UV照射(900 mJ/cm 2)而進行交聯處理。進而,同樣地,亦將該反應性組合物3棒式塗佈於另一表面,於50℃下進行10分鐘加熱處理後,於氮氣氛圍下進行UV照射(900 mJ/cm 2)而進行交聯處理,藉此獲得相位差膜。所獲得之相位差膜之厚度為55 μm,Re(550)為144 nm,Re(450)/Re(550)為0.85,霧度為0.7%。將所獲得之相位差膜供於上述(3)~(7)之評估。將結果示於表1。 3,3',4,4'-tetrakis(tert-butylperoxycarbonyl)benzophenone (manufactured by NOF Corporation, product name "BTTB-20G" (PGMEA) will be used as a hydrogen abstraction type photoradical generator. 20% by weight solution)) 10 parts by weight, 1,6-hexanediol diacrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., product name "A-HD-N") as a crosslinking agent 50 parts by weight and trihydroxy 50 parts by mass of methylpropane triacrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., product name "A-TMPT") was mixed to prepare reactive composition 3. The above-mentioned reactive composition 3 was bar-coated on one side surface of the above-mentioned stretched resin film, heat-treated at 50° C. for 10 minutes, and then cross-linked by UV irradiation (900 mJ/cm 2 ) in a nitrogen atmosphere deal with. Furthermore, in the same manner, the reactive composition was also bar-coated on the other surface, heat-treated at 50° C. for 10 minutes, and then subjected to UV irradiation (900 mJ/cm 2 ) in a nitrogen atmosphere for cross-exchange. A retardation film is obtained by joint processing. The obtained retardation film had a thickness of 55 μm, a Re(550) of 144 nm, a Re(450)/Re(550) of 0.85, and a haze of 0.7%. The obtained retardation film was used for the evaluation of the above-mentioned (3) to (7). The results are shown in Table 1.

[比較例1] 適當調整延伸溫度、延伸倍率,未如實施例1及2般進行使用反應性組合物之交聯處理,除此以外,藉由與實施例1同樣之方式獲得相位差膜。該相位差膜之厚度為48 μm,Re(550)為144 nm,Re(450)/Re(550)為0.85,霧度為0.3%。將所獲得之相位差膜供於上述(3)~(7)之評估。將結果示於表1。 [Comparative Example 1] A retardation film was obtained in the same manner as in Example 1, except that the stretching temperature and the stretching ratio were appropriately adjusted, and the crosslinking treatment using the reactive composition was not performed as in Examples 1 and 2. The retardation film had a thickness of 48 μm, a Re(550) of 144 nm, a Re(450)/Re(550) of 0.85, and a haze of 0.3%. The obtained retardation film was used for the evaluation of the above-mentioned (3) to (7). The results are shown in Table 1.

[表1]    相位差變化率(%) 接觸溶劑後之相位差變化(%) 耐溶劑性 凝膠分率(%) 加熱相位差變化率 加濕相位差變化率 接觸甲苯 接觸環戊酮 耐甲苯 耐環戊酮 實施例1 +2.1 -1.1 -0.1 0.0 98.5 實施例2 +2.5 -2.5 0.0 -0.3 98.7 實施例3 +1.8 -2.3 0.0 -0.3 98.9 比較例1 +3.0 -4.0 -18.9 -78.2 不良 不良 0 [Table 1] Phase difference change rate (%) Phase difference change after exposure to solvent (%) Solvent resistance Gel fraction (%) Heating phase difference change rate Humidification phase difference change rate exposure to toluene contact with cyclopentanone Toluene resistance cyclopentanone resistance Example 1 +2.1 -1.1 -0.1 0.0 good good 98.5 Example 2 +2.5 -2.5 0.0 -0.3 good good 98.7 Example 3 +1.8 -2.3 0.0 -0.3 good good 98.9 Comparative Example 1 +3.0 -4.0 -18.9 -78.2 bad bad 0

根據表1可知,根據本發明之實施例之相位差膜,加熱試驗後、加濕試驗後及接觸溶劑後之相位差變化較小,進而耐溶劑性亦優異。 [產業上之可利用性] As can be seen from Table 1, the retardation films according to the examples of the present invention have small changes in retardation after the heating test, after the humidification test, and after contact with the solvent, and are also excellent in solvent resistance. [Industrial Availability]

本發明之實施方式之相位差膜適宜用於圓偏光板、圖像顯示裝置。The retardation film of the embodiment of the present invention is suitable for use in a circularly polarizing plate and an image display device.

10:第1硬化層 20:相位差層 30:第2硬化層 100:相位差膜 10: The first hardened layer 20: retardation layer 30: Second hardened layer 100: retardation film

圖1係本發明之一實施方式之相位差膜之概略剖視圖。FIG. 1 is a schematic cross-sectional view of a retardation film according to an embodiment of the present invention.

10:第1硬化層 10: The first hardened layer

20:相位差層 20: retardation layer

30:第2硬化層 30: Second hardened layer

100:相位差膜 100: retardation film

Claims (12)

一種相位差膜,其依序具備第1硬化層、相位差層及第2硬化層, 該相位差層由延伸樹脂膜形成, 該延伸樹脂膜包含具有選自碳酸酯鍵及酯鍵中之至少一種鍵結基之樹脂, 於該第1硬化層及該第2硬化層中,具有碳-碳雙鍵之交聯劑與該樹脂經由該碳-碳雙鍵交聯。 A retardation film comprising a first hardened layer, a retardation layer and a second hardened layer in this order, The retardation layer is formed of a stretched resin film, The stretched resin film comprises a resin having at least one bonding group selected from carbonate bonds and ester bonds, In the first hardened layer and the second hardened layer, the crosslinking agent having a carbon-carbon double bond and the resin are crosslinked via the carbon-carbon double bond. 如請求項1之相位差膜,其中上述樹脂包含下式所表示之結構單元; [化1]
Figure 03_image033
The retardation film according to claim 1, wherein the above-mentioned resin comprises a structural unit represented by the following formula; [Chemical 1]
Figure 03_image033
.
如請求項1或2之相位差膜,其中上述樹脂包含下式所表示之結構單元; [化2]
Figure 03_image035
The retardation film according to claim 1 or 2, wherein the above-mentioned resin comprises a structural unit represented by the following formula; [Chemical 2]
Figure 03_image035
.
如請求項1至3中任一項之相位差膜,其滿足Re(450)<Re(550)<Re(650)之關係。The retardation film according to any one of claims 1 to 3, which satisfies the relationship of Re(450)<Re(550)<Re(650). 如請求項1至4中任一項之相位差膜,其滿足0.7<Re(450)/Re(550)<1.0之關係。The retardation film according to any one of claims 1 to 4, which satisfies the relationship of 0.7<Re(450)/Re(550)<1.0. 如請求項1至5中任一項之相位差膜,其中Re(550)為100 nm~180 nm或220 nm~330 nm。The retardation film according to any one of claims 1 to 5, wherein Re(550) is 100 nm to 180 nm or 220 nm to 330 nm. 一種圓偏光板,其具備如請求項1至6中任一項之相位差膜及偏光元件。A circularly polarizing plate comprising the retardation film and a polarizing element according to any one of claims 1 to 6. 一種圖像顯示裝置,其具備如請求項1至6中任一項之相位差膜。An image display device including the retardation film according to any one of claims 1 to 6. 一種圖像顯示裝置,其具備如請求項7之圓偏光板。An image display device including the circular polarizing plate as claimed in claim 7. 一種相位差膜之製造方法,其係如請求項1至6中任一項之相位差膜之製造方法,包括使用自由基產生劑使上述樹脂與上述交聯劑經由上述交聯劑之上述碳-碳雙鍵交聯之步驟。A method for producing a retardation film, which is the method for producing a retardation film according to any one of claims 1 to 6, comprising using a radical generator to pass the above-mentioned resin and the above-mentioned cross-linking agent through the above-mentioned carbon of the above-mentioned cross-linking agent - the step of cross-linking the carbon double bonds. 如請求項10之相位差膜之製造方法,其中上述自由基產生劑為奪氫型光自由基產生劑。The method for producing a retardation film according to claim 10, wherein the radical generator is a hydrogen abstraction type photoradical generator. 如請求項10之相位差膜之製造方法,其中上述自由基產生劑為奪氫型熱自由基產生劑。The method for producing a retardation film according to claim 10, wherein the radical generator is a hydrogen abstraction type thermal radical generator.
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