TW202212876A - Optical layered body - Google Patents

Optical layered body Download PDF

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TW202212876A
TW202212876A TW110122773A TW110122773A TW202212876A TW 202212876 A TW202212876 A TW 202212876A TW 110122773 A TW110122773 A TW 110122773A TW 110122773 A TW110122773 A TW 110122773A TW 202212876 A TW202212876 A TW 202212876A
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Taiwan
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low
refractive index
light guide
guide plate
refractive
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TW110122773A
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Chinese (zh)
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森島諒太
吉川貴博
服部大輔
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日商日東電工股份有限公司
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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21SNON-PORTABLE LIGHTING DEVICES; SYSTEMS THEREOF; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLE EXTERIORS
    • F21S2/00Systems of lighting devices, not provided for in main groups F21S4/00 - F21S10/00 or F21S19/00, e.g. of modular construction
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Planar Illumination Modules (AREA)
  • Laminated Bodies (AREA)
  • Light Guides In General And Applications Therefor (AREA)

Abstract

Provided is an optical layered body which has high brightness, is suppressed in brightness unevenness, and has excellent strength as an integrated product, and in which light leakage under a high-humidity environment is suppressed. The optical layered body according to an embodiment of the present invention is provided with: a light guide plate; an adhesive layer disposed in the light guide plate in a dot pattern in a plan view; a low-refractive index reinforcing portion that includes a low-refractive index part and that is disposed in both end portions of the light guide plate along the light-guiding direction; and an optical member layered on the light guide plate with the adhesive layer and the low-refractive index reinforcing portion interposed therebetween. The adhesive layer has formed therein a pattern such that the density of dots increases from a light-entering side of the light guide plate along the light-guiding direction thereof. In an area which is between the light guide plate and the optical member and in which the adhesive layer and the low-refractive index reinforcing portion are not disposed, a low-refractive index layer is disposed so as to be in contact with an adhesive layer-side surface of the light guide plate and/or an adhesive layer-side surface of the optical member. The low-refractive index part and the low-refractive index layer each have a refractive index of 1.30 or less.

Description

光學積層體Optical laminate

本發明係關於光學積層體。The present invention relates to an optical laminate.

背景技術Background technique

在使用導光板取出光之光學裝置(例如圖像顯示裝置、照明裝置)中,已知有如下技術:在積層導光板與周邊光學構件(例如反射板、擴散板、稜鏡片、光取出薄膜)時,經由低折射率層或經圖案化(即具有空氣部)之接著層進行積層。根據如此技術,揭示有與僅利用黏著劑進行積層之情形相比,藉由利用低折射率層或接著層之空氣部,光之利用效率較高。然而,根據如此技術,存在有如下問題:關於導光板與周邊光學構件之積層體的一體物,其強度不足。For optical devices (such as image display devices, lighting devices) that use a light guide plate to extract light, the following techniques are known. At the time, the lamination is performed through a low refractive index layer or a patterned (ie, having an air portion) adhesive layer. According to such a technique, it has been revealed that the use efficiency of light is higher by using the low-refractive index layer or the air portion of the adhesive layer, compared to the case of lamination using only an adhesive. However, according to such a technique, there is a problem that the strength of the integrated product of the laminated body of the light guide plate and the peripheral optical members is insufficient.

本申請人開發出一種可解決上述問題的光學積層體(專利文獻1)。該光學積層體具有導光板與經由接著層積層於該導光板之光學構件,該接著層以俯視點圖案形成,且該點密度具有從該導光板之入光側起沿著導光方向變大的梯度,在該導光板之沿著導光方向之兩端部設置有低折射率補強部。藉由設置上述具有特定的點圖案的接著劑層與低折射率補強部,可實現亮度較高、亮度不均得以抑制且作為一體物的強度優異的光學積層體。 先行技術文獻 專利文獻 The present applicant has developed an optical layered body that can solve the above-mentioned problems (Patent Document 1). The optical laminate has a light guide plate and an optical member laminated on the light guide plate via a bonding layer, the bonding layer is formed in a plan view dot pattern, and the dot density increases along the light guiding direction from the light incident side of the light guide plate A low-refractive-index reinforcing part is arranged at both ends of the light guide plate along the light guide direction. By providing the adhesive layer and the low-refractive-index reinforcing portion having the above-described specific dot pattern, an optical laminate having high brightness, suppressed brightness unevenness, and excellent strength as a single body can be realized. prior art literature Patent Literature

專利文獻1:國際公開第2020/116045號Patent Document 1: International Publication No. 2020/116045

發明概要 發明欲解決之課題 Summary of Invention The problem to be solved by the invention

然而,專利文獻1之光學積層體有於高溼環境下發生漏光之情形。However, the optical laminate of Patent Document 1 may leak light in a high-humidity environment.

本發明係為解決上述先前課題而完成者,其主要目的在於提供一種亮度較高、亮度不均得以抑制、作為一體物的強度優異且可抑制高溼環境下的漏光的光學積層體。 用以解決課題之手段 The present invention has been accomplished in order to solve the above-mentioned conventional problems, and its main object is to provide an optical laminate having high luminance, suppressed luminance unevenness, excellent strength as a single body, and suppressed light leakage in a high-humidity environment. means of solving problems

本發明之實施形態之光學積層體具有:導光板;以俯視點圖案配置於該導光板之接著層;配置於該導光板之沿著導光方向之兩端部的包含低折射率部的低折射率補強部;及經由該接著層及該低折射率補強部積層於該導光板之光學構件。該接著層形成點密度從該導光板之入光側起沿著導光方向變大的圖案。於該導光板與該光學構件之間的未配置有該接著層及該低折射率補強部的區域中,以與該導光板之接著層側之面及該光學構件之接著層側之面中之至少一面接觸之方式配置有低折射率層。該低折射率部及該低折射率層之折射率為1.30以下。 於一實施形態中,上述低折射率層以與上述導光板之接著層側之面及上述光學構件之接著層側之面兩面接觸之方式配置。於一實施形態中,上述低折射率層係填滿上述導光板與上述光學構件之間的未配置有上述接著層及上述低折射率補強部的整個區域。 於一實施形態中,上述低折射率部及上述低折射率層之折射率為1.25以下。 於一實施形態中,上述低折射率部及上述低折射率層係藉由微細孔粒子彼此化學鍵結而形成的空隙層。 於一實施形態中,上述低折射率補強部具有基材、形成於該基材之低折射率部及作為最外層設置於兩面的黏著劑層。 於一實施形態中,上述低折射率補強部之合計寬度為上述導光板之寬度的10%以下。 於一實施形態中,上述低折射率補強部之總透光率為85%以上。 於一實施形態中,上述光學積層體係於上述導光板之與入光側為相反側的端部,進一步設置有低折射率補強部。 發明效果 An optical laminate according to an embodiment of the present invention includes: a light guide plate; an adhesive layer disposed on the light guide plate in a plan view point pattern; A refractive index reinforcement part; and an optical member laminated on the light guide plate through the adhesive layer and the low refractive index reinforcement part. The adhesive layer forms a pattern in which the dot density increases along the light guide direction from the light incident side of the light guide plate. In the region between the light guide plate and the optical member where the adhesive layer and the low-refractive-index reinforcing portion are not arranged, with the surface on the side of the adhesive layer of the light guide plate and the surface on the side of the adhesive layer of the optical member A low-refractive index layer is disposed in contact with at least one surface. The refractive index of the low-refractive index portion and the low-refractive index layer is 1.30 or less. In one Embodiment, the said low-refractive-index layer is arrange|positioned so that both surfaces may contact the surface of the adhesive layer side of the said light guide plate, and the surface of the said optical member. In one embodiment, the low-refractive-index layer fills the entire region between the light guide plate and the optical member in which the adhesive layer and the low-refractive-index reinforcing portion are not disposed. In one Embodiment, the refractive index of the said low-refractive-index part and the said low-refractive-index layer is 1.25 or less. In one embodiment, the low-refractive index portion and the low-refractive index layer are void layers formed by chemically bonding microporous particles to each other. In one embodiment, the said low-refractive-index reinforcing part has a base material, the low-refractive-index part formed in this base material, and the adhesive layer provided on both surfaces as outermost layers. In one Embodiment, the total width of the said low-refractive-index reinforcement part is 10% or less of the width of the said light guide plate. In an embodiment, the total light transmittance of the said low-refractive-index reinforcing part is 85% or more. In one embodiment, the optical layered system is further provided with a low-refractive index reinforcing portion at the end portion of the light guide plate on the opposite side to the light incident side. Invention effect

根據本發明,藉由於具有導光板與光學構件、且具有沿著該導光板之導光方向具有點密度之梯度的俯視點圖案之接著層的光學積層體中,於該導光板之沿著導光方向之兩端部設置包含低折射率部之低折射率補強部,以及於該導光板與該光學構件之間的未配置有該接著層及該低折射率補強部的區域中,以與該導光板之接著層側之面及該光學構件之接著層側之面中之至少一面接觸之方式設置低折射率層,進而將低折射率部及低折射率層之折射率設為1.30以下,而可實現亮度較高、亮度不均得以抑制、作為一體物的強度優異且可抑制高溼環境下之漏光的光學積層體。According to the present invention, in an optical laminate having a light guide plate and an optical member, and having a top-view dot pattern having a gradient of dot density along the light guide direction of the light guide plate, the adhesive layer is formed along the light guide plate along the light guide plate. Both ends of the light direction are provided with low-refractive index reinforcing parts including low-refractive index parts, and in the region between the light guide plate and the optical member where the adhesive layer and the low-refractive index reinforcing part are not arranged, so as to be consistent with the low-refractive index reinforcing part. The low-refractive index layer is provided so that at least one of the surface on the adhesive layer side of the light guide plate and the surface on the adhesive layer side of the optical member are in contact with each other, and the refractive index of the low-refractive index portion and the low-refractive index layer is set to 1.30 or less , it is possible to realize an optical laminate having high brightness, suppressed brightness unevenness, excellent strength as a single body, and suppressed light leakage in a high-humidity environment.

用以實施發明之形態Form for carrying out the invention

以下,就本發明之實施形態進行說明,但本發明並不限定於此等實施形態。Hereinafter, embodiments of the present invention will be described, but the present invention is not limited to these embodiments.

A.光學積層體之全體構造 圖1A係本發明之一實施形態之光學積層體的概略剖面圖;圖1B係本發明之另一實施形態之光學積層體的概略剖面圖;圖1C係本發明之又一實施形態之光學積層體的概略剖面圖;圖2係顯示圖1A之光學積層體去除光學構件之狀態的概略俯視圖。圖1A之光學積層體100具有:導光板10;以俯視點圖案配置於導光板10之接著層20;配置於導光板10之沿著導光方向之兩端部之低折射率補強部40;及經由接著層20及低折射率補強部40積層於導光板10之光學構件30。如圖2所示,接著層20形成點密度從導光板之入光側起沿著導光方向(從圖面左側向右的方向)變大的圖案。藉由設置具有如此的密度梯度的點圖案的接著層,可在光量較大的導光板的入光側端部利用空氣之全反射,因此可於導光板內實現非常良好的光傳播。其結果,可提高亮度且明顯地抑制亮度不均(靠近入光側之部分與遠離入光側之部分的明亮度差異)。另一方面,如此的接著層之接著強度不均(具體而言,入光側之接著強度較小、與入光側為相反側的接著強度較大),其結果作為光學積層體之一體物的強度不足。相對於此,藉由設置低折射率補強部,可實現作為光學積層體之一體物的充分強度。進而,本發明之實施形態使用的低折射率補強部具有以下優點:(1)因為補強部本身的折射率較低,故不會使光的利用效率降低(結果可維持高亮度且抑制亮度不均),可確保作為光學積層體之一體物的強度;(2)因為可形成細長形狀,故可將對於應用光學積層體之圖像顯示裝置的顯示區域的影響抑制在最小限度。 A. Overall structure of the optical laminate 1A is a schematic cross-sectional view of an optical laminate according to an embodiment of the present invention; FIG. 1B is a schematic cross-sectional view of an optical laminate according to another embodiment of the present invention; and FIG. 1C is an optical laminate according to another embodiment of the present invention. A schematic cross-sectional view of the body; FIG. 2 is a schematic plan view showing a state in which the optical layered body of FIG. 1A is removed from the optical member. The optical laminate 100 of FIG. 1A includes: a light guide plate 10; an adhesive layer 20 disposed on the light guide plate 10 in a top-view point pattern; low-refractive-index reinforcing portions 40 disposed at both ends of the light guide plate 10 along the light guide direction; And the optical member 30 laminated on the light guide plate 10 via the adhesive layer 20 and the low-refractive index reinforcing portion 40 . As shown in FIG. 2 , the adhesive layer 20 forms a pattern in which the dot density increases from the light incident side of the light guide plate along the light guide direction (direction to the right from the left side of the drawing). By providing an adhesive layer with a dot pattern with such a density gradient, total reflection of the air can be utilized at the light incident side end of the light guide plate with a large amount of light, so that very good light transmission can be achieved in the light guide plate. As a result, luminance can be improved and luminance unevenness (difference in luminance between a portion closer to the light incident side and a portion farther from the light incident side) can be significantly suppressed. On the other hand, the adhesive strength of such an adhesive layer is not uniform (specifically, the adhesive strength on the light-incident side is small, and the adhesive strength on the side opposite to the light-incidence side is large), and as a result, the optical layered product is a single object. of insufficient strength. On the other hand, by providing the low-refractive-index reinforcing portion, sufficient strength as a single object of the optical layered body can be realized. Furthermore, the low-refractive-index reinforcing portion used in the embodiment of the present invention has the following advantages: (1) Since the refractive index of the reinforcing portion itself is low, the utilization efficiency of light will not be lowered (as a result, high brightness can be maintained and low brightness can be suppressed. (2) Since the optical laminate can be formed into an elongated shape, the influence on the display area of the image display device to which the optical laminate can be applied can be minimized.

於本發明之實施形態中,於導光板10與光學構件30之間的未配置有接著層20及低折射率補強部40的區域(即光學積層體之空隙部),以與導光板10之接著層20側之面及光學構件30之接著層20側之面中之至少一面接觸之方式配置有低折射率層50。於一實施形態中,低折射率層50以與導光板10之接著層20側之面及光學構件30之接著層20側之面兩面接觸之方式配置。於圖1A所示之例中,低折射率層50係填滿導光板10與光學構件30之間的未配置有接著層20及低折射率補強部40的整個區域(即光學積層體之整個空隙部區域)。藉由設置如此的低折射率層,可抑制高溼環境下之漏光。更詳細情形如下所述。本申請人開發出一種光學積層體,其具有:導光板;以點密度從導光板之入光側起沿著導光方向變大的圖案配置於導光板的接著層;配置於導光板之沿著導光方向之兩端部的低折射率補強部;及經由接著層及低折射率補強部積層於導光板之光學構件。如此的光學積層體為亮度較高、亮度不均得以抑制且作為一體物的強度優異者。另一方面,本發明人等發現於如此的光學積層體中,於高溼環境下可能會發生漏光的新課題,且發現該漏光的原因為:於高溼環境下在導光板與光學構件之間的未配置有接著層及低折射率補強部的區域(空隙部)發生的凝結。進而,本發明人等就凝結與漏光的關係進行研究,結果發現:藉由於空隙部設置低折射率層,可維持本申請人之上述光學積層體之優異特性,且抑制發生凝結所導致的漏光,終完成本發明。即,如圖1A~圖1C所示,藉由於空隙部配置低折射率層,縱使發生凝結,亦可抑制從光學構件30之與接著層20側之面為相反側之面的漏光。進而,如圖1A所示,藉由於空隙部填滿低折射率層,空隙部實質上沒有,故可明顯地抑制凝結,其結果可明顯地抑制漏光。此外,藉由於空隙部配置低折射率層,可縮小與空隙部(空氣部、折射率1.00)之折射率之差。其結果,不會實質上降低光之利用效率,故可維持將亮度維持於高且抑制亮度不均的上述光學積層體之優異特性。而且,還可獲得以下優點。在按壓光學積層體時若存在空隙部,恐有導光板與光學構件接觸、因該接觸而發生漏光之情形。因為藉由於空隙部配置低折射率層,可避免該接觸,故亦可抑制因上述機制導致的漏光。In the embodiment of the present invention, the region between the light guide plate 10 and the optical member 30 where the adhesive layer 20 and the low-refractive index reinforcing portion 40 are not disposed (ie, the gap portion of the optical laminate), so as to be in contact with the light guide plate 10 . The low refractive index layer 50 is arranged so that at least one of the surface on the side of the adhesive layer 20 and the surface on the side of the adhesive layer 20 of the optical member 30 is in contact with each other. In one embodiment, the low refractive index layer 50 is arranged so as to be in contact with both surfaces of the light guide plate 10 on the adhesive layer 20 side and the surface on the adhesive layer 20 side of the optical member 30 . In the example shown in FIG. 1A , the low refractive index layer 50 fills the entire region between the light guide plate 10 and the optical member 30 where the adhesive layer 20 and the low refractive index reinforcing portion 40 are not arranged (ie, the entire optical layered body). void area). By providing such a low-refractive index layer, light leakage in a high-humidity environment can be suppressed. More details are as follows. The applicant has developed an optical laminate comprising: a light guide plate; an adhesive layer arranged on the light guide plate with a pattern in which the dot density increases from the light incident side of the light guide plate along the light guide direction; arranged on the edge of the light guide plate Low-refractive-index reinforcing parts facing both ends in the light-guiding direction; and an optical member laminated on a light-guiding plate through an adhesive layer and a low-refractive-index reinforcing part. Such an optical layered product has high brightness, suppressed brightness unevenness, and is excellent in strength as a single body. On the other hand, the present inventors discovered a new problem that light leakage may occur in such an optical laminate in a high-humidity environment, and found that the cause of the light leakage is that in a high-humidity environment, the gap between the light guide plate and the optical member is Coagulation occurs in the regions (voids) in between where the adhesive layer and the low-refractive-index reinforcing portion are not arranged. Furthermore, the present inventors have studied the relationship between condensation and light leakage, and as a result, they have found that by providing a low-refractive index layer in the void portion, the excellent characteristics of the above-mentioned optical laminate of the present applicant can be maintained, and light leakage due to condensation can be suppressed. , and finally complete the present invention. That is, as shown in FIGS. 1A to 1C , by arranging the low-refractive index layer in the void portion, even if condensation occurs, light leakage from the surface opposite to the adhesive layer 20 side of the optical member 30 can be suppressed. Furthermore, as shown in FIG. 1A , since the void portion is filled with the low refractive index layer, the void portion is substantially absent, so that condensation can be significantly suppressed, and as a result, light leakage can be significantly suppressed. In addition, by disposing the low refractive index layer in the void portion, the difference in refractive index with the void portion (air portion, refractive index 1.00) can be reduced. As a result, since the utilization efficiency of light is not substantially lowered, it is possible to maintain the excellent characteristics of the above-mentioned optical layered body that maintains high brightness and suppresses uneven brightness. Furthermore, the following advantages can also be obtained. When the optical layered body is pressed, if there is a void portion, the light guide plate may come into contact with the optical member, and light leakage may occur due to the contact. Since this contact can be avoided by arranging the low refractive index layer in the void portion, light leakage due to the above-mentioned mechanism can also be suppressed.

低折射率層50可以與導光板之接著層側之面及光學構件之接著層側之面兩面接觸之方式配置,可如圖1A所示填滿於空隙部,亦可如圖1B所示以僅與光學構件30之接著層20側之面接觸之方式配置,亦可如圖1C所示以僅與導光板10之接著層20側之面接觸之方式配置。任何構造均可抑制凝結及/或導光板與光學構件之接觸,其結果可抑制漏光。較佳為圖1A之構成。其原因為具有抑制凝結本身之效果(結果為抑制漏光效果)。The low-refractive index layer 50 can be arranged in contact with the surface on the adhesive layer side of the light guide plate and the surface on the adhesive layer side of the optical member, and can be filled in the gap as shown in FIG. The optical member 30 may be arranged so as to be in contact only with the surface on the adhesive layer 20 side of the optical member 30 , or may be arranged only in contact with the surface of the light guide plate 10 on the adhesive layer 20 side as shown in FIG. 1C . In any configuration, condensation and/or contact between the light guide plate and the optical member can be suppressed, and as a result, light leakage can be suppressed. The structure of FIG. 1A is preferred. The reason for this is that it has an effect of suppressing condensation itself (resulting in an effect of suppressing light leakage).

低折射率層50之厚度相對於空隙部或接著層20之厚度的比率,只要可抑制漏光,並無特別限定。The ratio of the thickness of the low refractive index layer 50 to the thickness of the void portion or the adhesive layer 20 is not particularly limited as long as light leakage can be suppressed.

以下,就光學積層體之構成要件具體地說明。Hereinafter, the constituent elements of the optical laminate will be specifically described.

B.導光板 導光板10通常可由樹脂(較佳為透明樹脂)之薄膜或板狀物、或玻璃構成。關於如此樹脂的代表例,可列舉:熱塑性樹脂、反應性樹脂(例如游離輻射硬化性樹脂)。關於熱塑性樹脂之具體例,可列舉:聚甲基丙烯酸甲酯(PMMA)、聚丙烯腈等(甲基)丙烯酸系樹脂、聚碳酸酯(PC)樹脂、PET等聚酯樹脂、三醋酸纖維素(TAC)等纖維素系樹脂、環狀聚烯烴系樹脂、苯乙烯系樹脂。關於游離輻射硬化性樹脂之具體例,可列舉:環氧丙烯酸酯系樹脂、胺基甲酸酯丙烯酸酯系樹脂。此等樹脂可單獨使用,亦可併用2種以上。 B. Light guide plate The light guide plate 10 is generally composed of a film or plate of resin (preferably transparent resin), or glass. Typical examples of such resins include thermoplastic resins and reactive resins (eg, ionizing radiation curable resins). Specific examples of thermoplastic resins include (meth)acrylic resins such as polymethyl methacrylate (PMMA) and polyacrylonitrile, polycarbonate (PC) resins, polyester resins such as PET, and cellulose triacetate. (TAC) and other cellulose-based resins, cyclic polyolefin-based resins, and styrene-based resins. Specific examples of ionizing radiation curable resins include epoxy acrylate resins and urethane acrylate resins. These resins may be used alone or in combination of two or more.

導光板之厚度例如可為100μm~100mm。導光板之厚度宜為50mm以下、較佳為30mm以下、更佳為10mm以下。The thickness of the light guide plate may be, for example, 100 μm˜100 mm. The thickness of the light guide plate is preferably 50 mm or less, preferably 30 mm or less, and more preferably 10 mm or less.

導光板之折射率宜為1.47以上、較佳為1.47~1.60、更佳為1.47~1.55。導光板之折射率與低折射率補強部之低折射率層之折射率之差宜為0.22以上、較佳為0.22~0.40、更佳為0.25~0.35。導光板之折射率可藉由適當地選擇導光板之構成材料而調整。The refractive index of the light guide plate is preferably 1.47 or more, preferably 1.47-1.60, more preferably 1.47-1.55. The difference between the refractive index of the light guide plate and the refractive index of the low refractive index layer of the low refractive index reinforcing portion is preferably 0.22 or more, preferably 0.22 to 0.40, more preferably 0.25 to 0.35. The refractive index of the light guide plate can be adjusted by appropriately selecting the constituent material of the light guide plate.

C.接著層 如上所述,接著層20以俯視點圖案形成,且點密度具有從導光板之入光側起沿著導光方向變大的梯度。若為如此構造,可在光量較大的導光板的入光側端部利用空氣之全反射,因此可於導光板內實現非常良好的光傳播。其結果,可提高亮度且明顯地抑制亮度不均(靠近入光側之部分與遠離入光側之部分的明亮度差異)。如圖2所示,點密度之梯度可沿著導光方向連續地變化,亦可沿著導光方向在每個特定區域階段地變化。例如,從入光側之端到導光板之長度方向之10%為止的區域的點密度(平均)宜為0%~50%,從與入光側相反側之端到導光板之長度方向之10%為止的區域的點密度(平均)宜為50%~100%。 C. Then layer As described above, the adhesive layer 20 is formed in a plan view dot pattern, and the dot density has a gradient that increases along the light guide direction from the light incident side of the light guide plate. With such a structure, the total reflection of the air can be utilized at the light incident side end of the light guide plate with a large amount of light, so that very good light propagation can be realized in the light guide plate. As a result, luminance can be improved and luminance unevenness (difference in luminance between a portion closer to the light incident side and a portion farther from the light incident side) can be significantly suppressed. As shown in FIG. 2 , the gradient of the dot density can be continuously changed along the light guiding direction, or it can also be changed stepwise in each specific area along the light guiding direction. For example, the point density (average) of the area from the end of the light incident side to 10% of the length direction of the light guide plate should be 0%~50%, from the end on the opposite side of the light incident side to the length direction of the light guide plate The point density (average) of the area up to 10% should be 50% to 100%.

接著層可由接著劑構成,亦可由黏著劑構成。較佳為接著層由接著劑構成。其原因為容易形成圖案。藉由使用接著劑,可利用噴墨、印刷等進行圖案形成。關於接著劑可使用任意合適的接著劑。較佳為活性能量線(例如紫外線、可見光)硬化型接著劑。關於活性能量線硬化型接著劑之具體例,可列舉:丙烯酸系接著劑、環氧系接著劑、乙烯基系接著劑、硫醇系接著劑、胺基甲酸酯系接著劑、聚矽氧系接著劑。亦可將活性能量線硬化型接著劑與熱硬化型接著劑組合使用。關於黏著劑,可舉例高彈性模數之黏著劑。The next layer may be composed of an adhesive or an adhesive. Preferably, the adhesive layer is composed of an adhesive. The reason for this is that it is easy to form a pattern. By using an adhesive, pattern formation can be performed by inkjet, printing, or the like. As the adhesive, any suitable adhesive can be used. An active energy ray (eg, ultraviolet, visible light) hardening adhesive is preferred. Specific examples of active energy ray-curable adhesives include acrylic adhesives, epoxy adhesives, vinyl adhesives, thiol adhesives, urethane adhesives, and polysiloxanes. Adhesive. An active energy ray-curable adhesive can also be used in combination with a thermosetting adhesive. As for the adhesive, an adhesive having a high elastic modulus can be exemplified.

接著層之厚度,例如可為50μm以上、60μm以上、70μm以上、80μm以上、90μm以上或100μm以上,且為1000μm以下、900μm以下、800μm以下、700μm以下、600μm以下或500μm以下。The thickness of the next layer may be, for example, 50 μm or more, 60 μm or more, 70 μm or more, 80 μm or more, 90 μm or more, or 100 μm or more, and 1000 μm or less, 900 μm or less, 800 μm or less, 700 μm or less, 600 μm or less, or 500 μm or less.

D.光學構件 關於光學構件30,可舉例能夠與導光板積層之任意合適的光學構件。關於光學構件之具體例,可列舉:反射板、擴散板、稜鏡片、偏光板、相位差薄膜、導電性薄膜、基板、圖像顯示單元或圖像顯示面板。 D. Optical Components Regarding the optical member 30, any appropriate optical member that can be laminated with a light guide plate can be exemplified. Specific examples of the optical member include a reflection plate, a diffuser plate, a polar plate, a polarizing plate, a retardation film, a conductive film, a substrate, an image display unit, or an image display panel.

E.低折射率補強部 E-1.低折射率補強部之配置及整體構造 如上所述,低折射率補強部40設置於導光板之沿著導光方向之兩端部。關於低折射率補強部40之俯視形狀,可採用任意合適的形狀。具體而言,如圖2所示,低折射率補強部可沿著導光板之導光方向連續地形成,亦可斷續地形成。連續地形成低折射率補強部時,低折射率補強部例如可為圖2所示之細長矩形狀、可為錐狀、亦可為梯形狀。低折射率補強部為錐狀時,低折射率補強部可為朝向入光側變細的形狀、亦可為朝向與入光側相反之側變細的形狀。斷續地形成低折射率補強部時,低折射率補強部例如可為矩形狀、可為點狀、亦可為其他任意形狀(例如三角形、正方形、多邊形、半圓形)。低折射率補強部之長度(即沿著導光方向之長度)分別相對於導光板之導光方向之全長,宜為50%以上、較佳為60%以上、更佳為70%以上、再更佳為80%以上。低折射率補強部之長度上限相對於導光板之導光方向之全長為100%。即,低折射率補強部可跨導光板之導光方向全體設置。若長度為如此範圍,可實現充分的補強效果(即,作為光學積層體之一體物的強度)。再者,斷續地形成低折射率補強部時,低折射率補強部之長度為各個長度的合計。又,低折射率補強部之長度分別可相同、亦可不同。低折射率補強部之寬度(即,沿著與導光方向垂直之方向的長度)分別相對於導光板之寬度宜為5%以下。低折射率補強部之寬度合計相對於導光板之寬度宜為10%以下、較佳為9%以下。另一方面,低折射率補強部之寬度合計,例如可為1%以上。若寬度為如此範圍,可不對應用光學積層體之圖像顯示裝置之顯示區域造成不良影響地,確保作為光學積層體之一體物的強度。低折射率補強部之總透光率宜為85%以上、較佳為90%以上。若總透光率為如此範圍,可不對應用光學積層體之圖像顯示裝置之顯示區域造成不良影響地,確保作為光學積層體之一體物的強度。 E. Low refractive index reinforcement E-1. Arrangement and overall structure of the low-refractive-index reinforcing part As described above, the low-refractive-index reinforcing parts 40 are disposed on both ends of the light guide plate along the light guide direction. Any appropriate shape can be adopted for the plan view shape of the low-refractive-index reinforcing portion 40 . Specifically, as shown in FIG. 2 , the low-refractive-index reinforcing portion may be continuously formed along the light guide direction of the light guide plate, or may be formed intermittently. When the low-refractive-index reinforcing portion is continuously formed, the low-refractive-index reinforcing portion may be, for example, an elongated rectangular shape as shown in FIG. 2, a tapered shape, or a trapezoidal shape. When the low-refractive-index reinforcing portion is tapered, the low-refractive-index reinforcing portion may be tapered toward the light incident side, or may be tapered toward the side opposite to the light incident side. When the low-refractive-index reinforcing portion is intermittently formed, the low-refractive-index reinforcing portion may be, for example, a rectangular shape, a dot shape, or any other shape (eg, triangle, square, polygon, semicircle). The length of the low-refractive-index reinforcing portion (that is, the length along the light-guiding direction) is preferably 50% or more, preferably 60% or more, more preferably 70% or more, relative to the total length of the light-guiding plate in the light-guiding direction. More preferably, it is 80% or more. The upper limit of the length of the low-refractive index reinforcement portion is 100% relative to the total length of the light guide plate in the light guide direction. That is, the low-refractive-index reinforcing portion can be provided across the entire light guide direction of the light guide plate. When the length is within such a range, a sufficient reinforcing effect (that is, the strength as a single object of the optical layered body) can be achieved. In addition, when the low-refractive-index reinforcing portion is formed intermittently, the length of the low-refractive-index reinforcing portion is the sum of the respective lengths. In addition, the lengths of the low-refractive-index reinforcing portions may be the same or different, respectively. The width of the low-refractive-index reinforcing portion (ie, the length along the direction perpendicular to the light-guiding direction) is preferably 5% or less relative to the width of the light-guiding plate, respectively. The total width of the low-refractive index reinforcing portion is preferably 10% or less, preferably 9% or less, with respect to the width of the light guide plate. On the other hand, the total width of the low-refractive-index reinforcing portion may be, for example, 1% or more. If the width is within such a range, it is possible to secure the strength of an object as an optical laminate without adversely affecting the display area of the image display device to which the optical laminate is applied. The total light transmittance of the low-refractive-index reinforcing portion is preferably 85% or more, preferably 90% or more. If the total light transmittance is in such a range, the intensity of the optical laminate can be ensured without adversely affecting the display area of the image display device to which the optical laminate is applied.

低折射率補強部可設置於導光板之沿著導光方向之兩端,亦可設置於距離兩端一定距離的內側。較佳為低折射率補強部設置於導光板之沿著導光方向之兩端或其附近。若為如此構造,可將對顯示區域之影響最小化。The low-refractive-index reinforcing parts can be arranged on both ends of the light guide plate along the light-guiding direction, and can also be arranged on the inner side with a certain distance from the two ends. Preferably, the low-refractive index reinforcing portion is disposed at or near both ends of the light guide plate along the light guide direction. If so constructed, the influence on the display area can be minimized.

連續地形成低折射率補強部時,低折射率補強部可設置於導光板之導光方向之中心部、亦可設置於偏置位置(例如入光側、與入光側相反之側)。斷續地形成低折射率補強部時,各自的配置密度可跨導光方向全體為均勻、亦可沿著導光方向變化。When forming the low-refractive-index reinforcing part continuously, the low-refractive-index reinforcing part can be arranged at the center of the light guide plate in the light-guiding direction, or at an offset position (eg, the light-incident side, the side opposite to the light-incidence side). When the low-refractive-index reinforcing portions are intermittently formed, the respective arrangement densities may be uniform across the entire light-guiding direction, or may vary along the light-guiding direction.

低折射率補強部如上所述只要設置於導光板之沿著導光方向之兩端部即可。因此,低折射率補強部亦可設置於上述位置以外的任意合適的位置。於一實施形態中,低折射率補強部亦可進一步設置於導光板之與入光側為相反側的端部。若為如此構造,可獲得進一步的補強效果。As described above, the low-refractive-index reinforcing portion may be provided on both ends of the light guide plate along the light guide direction. Therefore, the low-refractive-index reinforcing portion may be provided at any suitable position other than the above-mentioned positions. In one embodiment, the low-refractive-index reinforcing portion may be further provided at the end portion of the light guide plate on the opposite side to the light incident side. With such a structure, a further reinforcing effect can be obtained.

圖3係顯示低折射率補強部之一例的概略剖面圖。低折射率補強部40具有基材41、形成於基材41之低折射率部42及作為最外層設置於兩面的黏著劑層43、44。即,低折射率補強部以雙面膠之形式構成,藉由雙面之黏著劑層貼合導光板與光學構件。再者,由圖式可明白,低折射率部42實質上為低折射率層,但於本說明書中為了易於與低折射率層50區別,而稱為低折射率部。FIG. 3 is a schematic cross-sectional view showing an example of a low-refractive-index reinforcing portion. The low-refractive-index reinforcing portion 40 includes a base material 41, a low-refractive index portion 42 formed on the base material 41, and adhesive layers 43 and 44 provided on both surfaces as outermost layers. That is, the low-refractive index reinforcing portion is constituted in the form of a double-sided tape, and the light guide plate and the optical member are bonded together by the adhesive layer on both sides. In addition, as can be understood from the drawings, the low refractive index portion 42 is substantially a low refractive index layer, but is referred to as a low refractive index portion in this specification in order to be easily distinguished from the low refractive index layer 50 .

E-2.基材 基材41通常可由樹脂(較佳為透明樹脂)之薄膜或板狀物構成。關於如此的樹脂的代表例,可列舉:熱塑性樹脂、反應性樹脂(例如游離輻射硬化性樹脂)。關於熱塑性樹脂之具體例,可列舉:聚甲基丙烯酸甲酯(PMMA)、聚丙烯腈等(甲基)丙烯酸系樹脂、聚碳酸酯(PC)樹脂、PET等聚酯樹脂、三醋酸纖維素(TAC)等纖維素系樹脂、環狀聚烯烴系樹脂、苯乙烯系樹脂。關於游離輻射硬化性樹脂之具體例,可列舉:環氧丙烯酸酯系樹脂、胺基甲酸酯丙烯酸酯系樹脂。此等樹脂可單獨使用,亦可併用2種以上。 E-2. Substrate The base material 41 is usually composed of a film or plate of resin (preferably transparent resin). Typical examples of such resins include thermoplastic resins and reactive resins (eg, ionizing radiation curable resins). Specific examples of thermoplastic resins include (meth)acrylic resins such as polymethyl methacrylate (PMMA) and polyacrylonitrile, polycarbonate (PC) resins, polyester resins such as PET, and cellulose triacetate. (TAC) and other cellulose-based resins, cyclic polyolefin-based resins, and styrene-based resins. Specific examples of ionizing radiation curable resins include epoxy acrylate resins and urethane acrylate resins. These resins may be used alone or in combination of two or more.

基材之厚度例如為10μm~100μm、較佳為10μm~50μm。The thickness of the base material is, for example, 10 μm to 100 μm, preferably 10 μm to 50 μm.

基材之折射率宜為1.47以上、較佳為1.47~1.60、更佳為1.47~1.55。若為如此範圍,可不對從導光板取出之光造成不良影響地引導到圖像顯示單元。The refractive index of the base material is preferably 1.47 or more, preferably 1.47-1.60, more preferably 1.47-1.55. Within such a range, the light extracted from the light guide plate can be guided to the image display unit without adversely affecting it.

E-3.低折射率部 低折射率部通常於內部具有空隙。低折射率部之空隙率通常為50體積%以上、較佳為70體積%以上、較佳為80體積%以上。另一方面,空隙率例如為90體積%以下、較佳為85體積%以下。藉由空隙率為上述範圍內,可將低折射率部之折射率設為適當的範圍。空隙率係從利用橢圓偏光計測得之折射率之值,由Lorentz‐Lorenz’s formula(勞洛公式)算出空隙率的值。 E-3. Low refractive index part The low-refractive index portion usually has a void inside. The porosity of the low refractive index portion is usually 50% by volume or more, preferably 70% by volume or more, and preferably 80% by volume or more. On the other hand, the void ratio is, for example, 90% by volume or less, or preferably 85% by volume or less. The refractive index of the low-refractive index portion can be set to an appropriate range by setting the porosity within the above-mentioned range. The porosity is the value of the porosity calculated from the value of the refractive index measured with an ellipsometry by Lorentz-Lorenz's formula.

低折射率部之折射率宜為1.25以下、較佳為1.20以下、更佳為1.15以下。折射率之下限可為例如1.01。若為如此範圍,可在經由低折射率補強部獲得的導光板與光學構件之積層構造中,實現非常優異的光利用效率。除非另有說明,折射率係指於波長550nm下測得的折射率。折射率係藉由以下實施例之「(I)低折射率層及低折射率補強部之低折射率部之折射率」所記載之方法進行測定的值。The refractive index of the low refractive index portion is preferably 1.25 or less, preferably 1.20 or less, and more preferably 1.15 or less. The lower limit of the refractive index may be, for example, 1.01. Within such a range, very excellent light utilization efficiency can be realized in the laminated structure of the light guide plate and the optical member obtained through the low-refractive-index reinforcing portion. Unless otherwise stated, the refractive index refers to the refractive index measured at a wavelength of 550 nm. The refractive index is a value measured by the method described in "(I) Refractive Index of Low Refractive Index Layer and Low Refractive Index Reinforcing Portion of Low Refractive Index Reinforcing Portion" in Examples below.

低折射率部只要具有上述期望的空隙率及折射率,可採用任意合適的構造。低折射率部較佳可利用塗佈或印刷等形成。關於構成低折射率部之材料,例如可採用國際公開第2004/113966號、日本特開2013-254183號公報及日本特開2012-189802號公報中記載的材料。具體而言,例如可列舉:氧化矽系化合物;水解性矽烷類及/或倍半矽氧烷、以及其部分水解物及脫水縮合物;有機聚合物;含有矽烷醇基之矽化合物;藉由使矽酸鹽與酸或離子交換樹脂接觸而獲得之活性氧化矽;聚合性單體(例如(甲基)丙烯酸系單體及苯乙烯系單體);硬化性樹脂(例如(甲基)丙烯酸系樹脂、含氟樹脂及胺基甲酸酯樹脂);及此等之組合。低折射率部可藉由將如此材料之溶液或分散液進行塗佈或印刷等而形成。As long as the low-refractive index portion has the desired porosity and refractive index as described above, any appropriate structure may be employed. The low-refractive index portion can be preferably formed by coating, printing, or the like. As a material constituting the low refractive index portion, for example, materials described in International Publication No. WO 2004/113966, JP 2013-254183 A, and JP 2012-189802 A can be used. Specifically, for example, silicon oxide-based compounds; hydrolyzable silanes and/or silsesquioxanes, and partial hydrolyzates and dehydration condensates thereof; organic polymers; silanol group-containing silicon compounds; Active silica obtained by contacting silicate with acid or ion exchange resin; polymerizable monomers (such as (meth)acrylic monomers and styrene monomers); curable resins (such as (meth)acrylic acid) resins, fluororesins, and urethane resins); and combinations of these. The low-refractive index portion can be formed by applying or printing a solution or dispersion of such a material.

低折射率部中之空隙(孔)之尺寸係指空隙(孔)之長軸直徑及短軸直徑中的長軸直徑。空隙(孔)之尺寸例如為2nm~500nm。空隙(孔)之尺寸例如為2nm以上、較佳為5nm以上、更佳為10nm以上、再更佳為20nm以上。另一方面,空隙(孔)之尺寸例如為500nm以下、較佳為200nm以下、更佳為100nm以下。空隙(孔)之尺寸範圍例如為2nm~500nm、較佳為5nm~500nm、更佳為10nm~200nm、再更佳為20nm~100nm。空隙(孔)之尺寸可根據目的及用途等調整為期望尺寸。空隙(孔)之尺寸可藉由BET試驗法進行定量化。The size of the void (hole) in the low-refractive index portion refers to the long-axis diameter among the long-axis diameter and the short-axis diameter of the void (hole). The size of the void (pore) is, for example, 2 nm to 500 nm. The size of the void (pore) is, for example, 2 nm or more, preferably 5 nm or more, more preferably 10 nm or more, and still more preferably 20 nm or more. On the other hand, the size of the void (pore) is, for example, 500 nm or less, preferably 200 nm or less, and more preferably 100 nm or less. The size range of the voids (pores) is, for example, 2 nm to 500 nm, preferably 5 nm to 500 nm, more preferably 10 nm to 200 nm, and still more preferably 20 nm to 100 nm. The size of the void (hole) can be adjusted to a desired size according to the purpose, application, and the like. The size of the voids (pores) can be quantified by the BET test method.

空隙(孔)之尺寸可藉由BET試驗法進行定量化。具體而言,於比表面積測定裝置(Micromeritics公司製:ASAP2020)之毛細管中,投入樣品(形成有空隙層)0.1g後,於室溫下進行24小時、減壓乾燥,使空隙結構內之氣體脫氣。然後,藉由使氮氣吸附於上述樣品,而描繪出吸附等溫線,求出細孔分布。藉此,可評價出空隙尺寸。The size of the voids (pores) can be quantified by the BET test method. Specifically, 0.1 g of a sample (with a void layer formed) was put into a capillary of a specific surface area measuring device (manufactured by Micromeritics: ASAP2020), and then dried under reduced pressure at room temperature for 24 hours to remove the gas in the void structure. Degassed. Then, by making nitrogen gas adsorb|suck to the said sample, the adsorption isotherm was drawn, and the pore distribution was calculated|required. Thereby, the void size can be evaluated.

低折射率部之霧度例如小於5%、較佳為小於3%。另一方面,霧度例如為0.1%以上、較佳為0.2%以上。霧度範圍例如為0.1%以上且小於5%、較佳為0.2%以上且小於3%。霧度例如可藉由以下方法測定。再者,霧度為低折射率部之透明性之指標。 將空隙層(低折射率部)切割為50mm×50mm之尺寸,設置於霧度計(村上色彩技術研究所公司製:HM-150)測定霧度。由下式算出霧度值。 霧度(%)=[擴散透過率(%)/全光線透過率(%)]×100(%) The haze of the low refractive index portion is, for example, less than 5%, preferably less than 3%. On the other hand, the haze is, for example, 0.1% or more, preferably 0.2% or more. The haze range is, for example, 0.1% or more and less than 5%, preferably 0.2% or more and less than 3%. The haze can be measured, for example, by the following method. In addition, haze is an index|index of the transparency of a low refractive index part. The void layer (low refractive index portion) was cut into a size of 50 mm×50 mm, and the haze was measured by setting it in a haze meter (manufactured by Murakami Color Institute: HM-150). The haze value was calculated from the following formula. Haze(%)=[Diffuse transmittance(%)/Total light transmittance(%)]×100(%)

關於在上述內部具有空隙之低折射率部,可例舉:於至少一部分具有多孔質層及/或空氣層之低折射率部。多孔質層通常包含氣凝膠及/或粒子(例如中空微粒子及/或多孔質粒子)。低折射率部較佳可為奈米多孔層(具體而言,90%以上之微細孔之直徑為10 -1nm~10 3nm之範圍內之多孔質層)。 The low-refractive-index part which has a void in the said inside is mentioned the low-refractive-index part which has a porous layer and/or an air layer in at least a part. The porous layer usually contains aerogels and/or particles (eg, hollow fine particles and/or porous particles). The low-refractive index portion is preferably a nanoporous layer (specifically, a porous layer in which more than 90% of the micropores have a diameter in the range of 10 −1 nm to 10 3 nm).

關於上述粒子,可採用任意適當的粒子。粒子通常由氧化矽系化合物構成。關於粒子形狀,例如可列舉:球狀、板狀、針狀、串狀及一串葡萄狀。關於串狀粒子,例如可列舉:具有球狀、板狀或針狀形狀之複數個粒子連接成數珠狀之粒子、短纖維狀之粒子(例如日本特開2001-188104號公報中記載之短纖維狀粒子)、及此等之組合。串狀粒子可為直鏈狀、亦可為分枝狀。關於一串葡萄狀之粒子,例如可列舉:複數個球狀、板狀及針狀粒子凝聚而成為一串葡萄狀。粒子形狀例如可以穿透式電子顯微鏡進行觀察而確認。Regarding the above-mentioned particles, any appropriate particles can be adopted. The particles are usually composed of a silicon oxide-based compound. The particle shape includes, for example, a spherical shape, a plate shape, a needle shape, a cluster shape, and a bunch of grapes. The string-shaped particles include, for example, particles in which a plurality of particles having spherical, plate-like or needle-like shapes are connected to form beads, and particles in the form of short fibers (for example, the short fibers described in Japanese Patent Laid-Open No. 2001-188104) particles), and combinations of these. String-shaped particles may be linear or branched. As a bunch of grape-shaped particles, for example, a plurality of spherical, plate-shaped, and needle-shaped particles are aggregated to form a bunch of grapes. The particle shape can be confirmed, for example, by observation with a transmission electron microscope.

低折射率部之厚度宜為0.2μm~5μm、較佳為0.3μm~3μm。若低折射率部之厚度於如此範圍,破損防止效果很明顯。進而,可輕易地實現上述期望的厚度比。The thickness of the low refractive index portion is preferably 0.2 μm to 5 μm, preferably 0.3 μm to 3 μm. When the thickness of the low-refractive index portion is within such a range, the effect of preventing breakage is significant. Furthermore, the above-mentioned desired thickness ratio can be easily achieved.

以下,就低折射率部之具體構造的一例進行說明。本實施形態之低折射率部由形成微細的空隙結構的一種或複數種構成單位構成,該構成單位彼此經由觸媒作用化學鍵結。關於構成單位之形狀,例如可列舉:粒子狀、纖維狀、棒狀、平板狀。構成單位可僅具有一種形狀,亦可組合具有二種以上形狀。於以下,主要就低折射率部為上述微細孔粒子彼此化學鍵結的多孔體的空隙層時進行說明。Hereinafter, an example of a specific structure of the low refractive index portion will be described. The low-refractive index portion of the present embodiment is composed of one or a plurality of constituent units forming a fine void structure, and the constituent units are chemically bonded to each other via a catalytic action. As for the shape of a structural unit, a particle shape, a fiber shape, a rod shape, and a flat shape are mentioned, for example. The constituent unit may have only one shape, or may have two or more shapes in combination. Hereinafter, the case where the low-refractive-index portion is the void layer of the porous body in which the microporous particles are chemically bonded to each other will be mainly described.

如此的空隙層可於空隙層形成步驟中例如藉由使微細孔粒子彼此化學鍵結而形成。再者,於本發明之實施形態中,「粒子」(例如上述微細孔粒子)之形狀並無特別限定,例如可為球狀、亦可為其他形狀。又,於本發明之實施形態中,上述微細孔粒子例如亦可為溶膠凝膠數珠狀粒子、奈米粒子(中空奈米氧化矽・奈米氣球粒子)、奈米纖維等。微細孔粒子通常包含無機物。關於無機物之具體例,可列舉:矽(Si)、鎂(Mg)、鋁(Al)、鈦(Ti)、鋅(Zn)、鋯(Zr)。此等可單獨使用,亦可併用2種以上。於一實施形態中,上述微細孔粒子例如為矽化合物之微細孔粒子,上述多孔體例如為聚矽氧多孔體(亦包含含有氧化矽及/或倍半矽氧烷作為構成單元的多孔體)。上述矽化合物之微細孔粒子例如包含凝膠狀氧化矽化合物之粉碎體。又,關於至少一部分具有多孔質層及/或空氣層的低折射率部的其他形態,例如有如下空隙層:由奈米纖維等纖維狀物質構成且該纖維狀物質交織而形成有空隙,構成層。如此空隙層的製造方法並無特別限定,例如與上述微細孔粒子彼此化學鍵結的多孔體的空隙層的情形相同。關於又一形態,可列舉:使用中空奈米粒子或奈米黏土之空隙層、使用中空奈米氣球或氟化鎂而形成之空隙層。空隙層可為由單一構成物質構成之空隙層、亦可為由複數個構成物質構成的空隙層。空隙層可由單一的上述形態構成、亦可包含複數個上述形態而構成。Such a void layer can be formed, for example, by chemically bonding fine porous particles to each other in the void layer forming step. Furthermore, in the embodiment of the present invention, the shape of "particles" (for example, the above-mentioned microporous particles) is not particularly limited, and may be spherical or other shapes, for example. Furthermore, in the embodiment of the present invention, the microporous particles may be, for example, sol-gel beads, nanoparticles (hollow nano-silica or nano-balloon particles), nanofibers, and the like. Microporous particles usually contain inorganic substances. Specific examples of inorganic substances include silicon (Si), magnesium (Mg), aluminum (Al), titanium (Ti), zinc (Zn), and zirconium (Zr). These may be used alone or in combination of two or more. In one embodiment, the microporous particles are, for example, microporous particles of silicon compounds, and the porous body is, for example, a polysiloxane porous body (which also includes a porous body containing silicon oxide and/or silsesquioxane as a constituent unit). . The microporous particles of the silicon compound include, for example, a pulverized body of a gel-like silicon oxide compound. In addition, as for other forms of the low-refractive index portion having at least a part of a porous layer and/or an air layer, there is, for example, a void layer composed of a fibrous substance such as nanofibers, and the fibrous substance is intertwined to form voids, thereby constituting a layer . The method for producing the void layer is not particularly limited, and for example, it is the same as the void layer of the porous body in which the microporous particles are chemically bonded to each other. As another form, the void layer formed using hollow nanoparticles or nanoclay, and the void layer formed using hollow nanoballoons or magnesium fluoride can be mentioned. The void layer may be a void layer composed of a single constituent substance or a void layer composed of a plurality of constituent substances. The void layer may be constituted by a single above-mentioned form, or may be formed by including a plurality of the above-mentioned forms.

於本實施形態中,多孔體之多孔質結構可為例如孔結構連續的連泡結構體。所謂的連泡結構體,例如指於上述聚矽氧多孔體中孔結構三維地連結而成,亦可說是孔結構之內部空隙連續的狀態。藉由多孔質體具有連泡結構,可提高空隙率。其中,在使用中空氧化矽等單泡粒子(分別具有孔結構的粒子)時,無法形成連泡結構。另一方面,例如使用氧化矽溶膠粒子(形成溶膠之凝膠狀矽化合物的粉碎物)時,由於該粒子具有三維樹狀結構,故該樹狀粒子於塗佈膜(包含凝膠狀矽化合物之粉碎物的溶膠的塗佈膜)中沉降及堆積,藉此可容易地形成連泡結構。低折射率部更佳為具有連泡結構包含複數個細孔分布的共連續結構。共連續結構例如指包含存在有奈米尺寸的微細空隙的結構與該奈米空隙集合而成的連泡結構的階層結構。形成共連續結構時,例如可以微細的空隙賦予膜強度且以粗大的連泡空隙賦予高空隙率,可兼具膜強度與高空隙率。如此的共連續結構宜於粉碎為氧化矽溶膠粒子之前的階段的凝膠(凝膠狀矽化合物)中,藉由控制生成的空隙結構的細孔分布而形成。又,例如將凝膠狀矽化合物粉碎時,可藉由將粉碎後的氧化矽溶膠粒子的粒度分布控制在期望尺寸,而形成共連續結構。In this embodiment, the porous structure of the porous body may be, for example, a continuous cell structure in which the pore structure is continuous. The so-called continuous-cell structure, for example, refers to a three-dimensionally connected pore structure in the above-mentioned polysiloxane porous body, and can also be said to be a state in which the internal voids of the pore structure are continuous. The porosity can be increased by the porous body having a continuous cell structure. Among them, when single-cell particles (particles each having a pore structure) such as hollow silicon oxide are used, a continuous-cell structure cannot be formed. On the other hand, when using, for example, silica sol particles (a pulverized product of a gel-like silicon compound that forms a sol), since the particles have a three-dimensional tree-like structure, the tree-like particles are not present in the coating film (containing the gel-like silicon compound). The pulverized sol coating film) settles and accumulates, whereby a continuous bubble structure can be easily formed. The low-refractive index portion more preferably has a co-continuous structure in which a continuous cell structure includes a distribution of a plurality of pores. The co-continuous structure refers to, for example, a hierarchical structure including a structure in which nano-sized fine voids are present and an interconnected cell structure in which the nano-voids are aggregated. When forming a co-continuous structure, for example, fine voids can provide film strength and coarse intercellular voids can provide high porosity, and both film strength and high porosity can be achieved. Such a co-continuous structure is preferably formed by controlling the pore distribution of the generated void structure in a gel (gel-like silicon compound) at a stage before pulverization into silica sol particles. Furthermore, for example, when the gelatinous silicon compound is pulverized, a co-continuous structure can be formed by controlling the particle size distribution of the pulverized silica sol particles to a desired size.

低折射率部例如如上所述包含凝膠狀化合物之粉碎物,該粉碎物彼此化學鍵結。低折射率部中之粉碎物彼此之化學鍵結(化學鍵)之形態並無特別限制,例如可列舉:交聯鍵、共價鍵、氫鍵。The low-refractive index portion includes, for example, pulverized products of a gel-like compound as described above, and the pulverized products are chemically bonded to each other. The form of the chemical bond (chemical bond) between the pulverized objects in the low-refractive index portion is not particularly limited, and examples thereof include a cross-link bond, a covalent bond, and a hydrogen bond.

低折射率部中之上述粉碎物之體積平均粒徑例如為0.10μm以上、較佳為0.20μm以上、更佳為0.40μm以上。另一方面,體積平均粒徑例如為2.00μm以下、較佳為1.50μm以下、更佳為1.00μm以下。體積平均粒徑之範圍例如為0.10μm~2.00μm、較佳為0.20μm~1.50μm、更佳為0.40μm~1.00μm。粒度分布例如可藉由動態光散射法、雷射繞射法等粒度分布評估裝置、及掃描式電子顯微鏡(SEM)、穿透式電子顯微鏡(TEM)等電子顯微鏡等測定。再者,體積平均粒徑為粉碎物之粒度偏差之指標。The volume average particle diameter of the above-mentioned pulverized material in the low refractive index portion is, for example, 0.10 μm or more, preferably 0.20 μm or more, and more preferably 0.40 μm or more. On the other hand, the volume average particle diameter is, for example, 2.00 μm or less, preferably 1.50 μm or less, and more preferably 1.00 μm or less. The range of the volume average particle diameter is, for example, 0.10 μm to 2.00 μm, preferably 0.20 μm to 1.50 μm, and more preferably 0.40 μm to 1.00 μm. The particle size distribution can be measured by, for example, a particle size distribution evaluation apparatus such as dynamic light scattering and laser diffraction, and an electron microscope such as a scanning electron microscope (SEM) and a transmission electron microscope (TEM). Furthermore, the volume average particle size is an index of the particle size deviation of the pulverized material.

凝膠狀化合物之種類並無特別限制。關於凝膠狀化合物,可例舉凝膠狀矽化合物。The kind of the gel-like compound is not particularly limited. The gel-like compound may, for example, be a gel-like silicon compound.

又,於低折射率部(空隙層)中,較佳為例如所包含之矽原子為矽氧烷結合。關於具體例,空隙層中所包含之全部矽原子中的未鍵結的矽原子(即殘留矽烷醇)之比率例如小於50%、較佳為30%以下、更佳為15%以下。Moreover, in the low-refractive-index portion (void layer), it is preferable that, for example, the silicon atom contained is a siloxane bond. As a specific example, the ratio of unbonded silicon atoms (ie, residual silanols) in all silicon atoms contained in the void layer is, for example, less than 50%, preferably 30% or less, and more preferably 15% or less.

以下,就如此的低折射率部之形成方法之一例進行說明。Hereinafter, an example of the formation method of such a low refractive index part is demonstrated.

該方法通常包含於樹脂薄膜上形成作為低折射率部(空隙層)之前驅物的空隙結構的前驅物形成步驟、及於前驅物形成步驟後於該前驅物內部引起交聯反應之交聯反應步驟。該方法進一步包含製作包含微細孔粒子之含有液(以下有時稱為「微細孔粒子含有液」或僅稱為「含有液」)之含有液製作步驟、及使該含有液乾燥之乾燥步驟,於前驅物形成步驟中使乾燥體中之微細孔粒子彼此化學鍵結而形成前驅物。含有液並無特別限定,例如為包含微細孔粒子之懸浮液。又,以下主要就微細孔粒子為凝膠狀化合物之粉碎物,空隙層為包含凝膠狀化合物之粉碎物的多孔體(較佳為聚矽氧多孔體)之情形進行說明。然而,即使微細孔粒子為凝膠狀化合物之粉碎物以外時,低折射率部亦同樣地形成。This method generally includes a precursor forming step of forming a void structure as a precursor of a low refractive index portion (void layer) on a resin film, and a crosslinking reaction causing a crosslinking reaction inside the precursor after the precursor forming step. step. The method further includes a step of preparing a liquid containing fine pore particles (hereinafter sometimes referred to as a "liquid containing fine pores" or simply "containing liquid"), and a drying step of drying the liquid, In the precursor forming step, the microporous particles in the dried body are chemically bonded to each other to form the precursor. The containing liquid is not particularly limited, and is, for example, a suspension containing fine pore particles. In addition, the following mainly describes the case where the microporous particles are a pulverized product of a gel-like compound, and the void layer is a porous body (preferably a polysiloxane porous body) containing a pulverized product of the gel-like compound. However, even when the microporous particles are other than the pulverized product of the gel-like compound, the low refractive index portion is formed in the same manner.

根據上述方法,例如可形成具有非常低的折射率的低折射率部(空隙層)。其理由例如推測如下。然而,該推測並不用來限定低折射率部之形成方法。According to the above-described method, for example, a low refractive index portion (void layer) having a very low refractive index can be formed. The reason for this is presumed, for example, as follows. However, this estimation is not intended to limit the formation method of the low refractive index portion.

上述粉碎物由於為將凝膠狀矽化合物粉碎者,故粉碎前之凝膠狀矽化合物之三維結構為分散成三維基本結構的狀態。進而,於上述方法中,藉由將凝膠狀矽化合物之破碎物塗佈於樹脂薄膜上,而形成基於三維基本結構的多孔性結構的前驅物。即,根據上述方法,可形成與凝膠狀矽化合物之三維結構不同的利用塗佈粉碎物的新的多孔結構(三維基本結構)。因此,於最後獲得的空隙層中,可實現與例如空氣層相同程度地起作用的低折射率。進而,於上述方法中,由於粉碎物彼此化學鍵結,故將三維基本結構固定。因此,最後獲得的空隙層儘管為具有空隙之結構,亦可維持充分的強度與可撓性。Since the above-mentioned pulverized product is obtained by pulverizing the gel-like silicon compound, the three-dimensional structure of the gel-like silicon compound before pulverization is in a state of being dispersed into a three-dimensional basic structure. Furthermore, in the above-mentioned method, a precursor of a porous structure based on a three-dimensional basic structure is formed by coating a fragment of a gelatinous silicon compound on a resin film. That is, according to the above-mentioned method, a new porous structure (three-dimensional basic structure) using the coated pulverized material, which is different from the three-dimensional structure of the gel-like silicon compound, can be formed. Therefore, in the void layer finally obtained, a low refractive index that functions to the same extent as, for example, an air layer can be achieved. Furthermore, in the above-mentioned method, since the pulverized materials are chemically bonded to each other, the three-dimensional basic structure is fixed. Therefore, the voided layer finally obtained can maintain sufficient strength and flexibility despite having a voided structure.

低折射率部之具體構造及詳細形成方法例如記載於國際公開第2019/151073號。該公報之記載係作為參考引用於本說明書中。The specific structure and detailed formation method of the low-refractive index portion are described in, for example, International Publication No. WO 2019/151073. The description of this gazette is incorporated in this specification as a reference.

E-4.黏著劑層 關於構成黏著劑層之黏著劑,可使用任意合適的黏著劑。關於黏著劑,通常可列舉:丙烯酸系黏著劑(丙烯酸系黏著劑組成物)。因為丙烯酸系黏著劑組成物為業界所周知,故省略詳細的說明。黏著劑層之厚度例如為3μm~200μm。黏著劑層43及44之構成材料及厚度分別可相同、亦可不同。再者,在與低折射率部鄰接配置有黏著劑層時,該黏著劑層通常具有於一般狀態下構成黏著劑層之黏著劑不會浸透到低折射率部之空隙的程度的硬度。如此的黏著劑層之儲存模數例如可為1.3×10 5(Pa)~1.0×10 7(Pa)。 E-4. Adhesive layer As the adhesive constituting the adhesive layer, any suitable adhesive can be used. As an adhesive, an acrylic adhesive (acrylic adhesive composition) is usually mentioned. Since the acrylic adhesive composition is well known in the industry, the detailed description is omitted. The thickness of the adhesive layer is, for example, 3 μm to 200 μm. The constituent materials and thicknesses of the adhesive layers 43 and 44 may be the same or different, respectively. Furthermore, when an adhesive layer is disposed adjacent to the low-refractive index portion, the adhesive layer generally has such a hardness that the adhesive constituting the adhesive layer does not penetrate into the voids of the low-refractive index portion in a normal state. The storage modulus of such an adhesive layer may be, for example, 1.3×10 5 (Pa) to 1.0×10 7 (Pa).

F.低折射率層 低折射率層50之詳細構造,基本上如同在低折射率補強部之低折射率部相關的E-3項所說明般。以下,僅就低折射率層之特徵性構造進行說明。 F. Low Refractive Index Layer The detailed structure of the low-refractive index layer 50 is basically as described in the item E-3 related to the low-refractive-index portion of the low-refractive-index reinforcing portion. Hereinafter, only the characteristic structure of the low refractive index layer will be described.

如圖1A所示,低折射率層填滿空隙部時,低折射率層之厚度與接著層之厚度相同,例如可為50μm以上、60μm以上、70μm以上、80μm以上、90μm以上或100μm以上、且為1000μm以下、900μm以下、800μm以下、700μm以下、600μm以下或500μm以下。又,圖1B或1C之構造時,低折射率層之厚度只要可抑制漏光,則並無特別限定,但其下限宜為0.6μm以上、0.75μm以上、0.80μm以上,其上限宜為3μm以下、2μm以下。As shown in FIG. 1A , when the low-refractive index layer fills the voids, the thickness of the low-refractive index layer is the same as the thickness of the adhesive layer, for example, 50 μm or more, 60 μm or more, 70 μm or more, 80 μm or more, 90 μm or more, or 100 μm or more, and 1000 μm or less, 900 μm or less, 800 μm or less, 700 μm or less, 600 μm or less, or 500 μm or less. 1B or 1C, the thickness of the low refractive index layer is not particularly limited as long as light leakage can be suppressed, but the lower limit is preferably 0.6 μm or more, 0.75 μm or more, and 0.80 μm or more, and the upper limit is preferably 3 μm or less. , 2μm or less.

低折射率層中之空隙(孔)之尺寸宜為400nm以下、較佳為300nm以下、更佳為200nm以下、再更佳為100nm以下。若低折射率層中之空隙(孔)之尺寸於如此範圍,因為可良好地抑制水分滲透,故可良好地抑制凝結。其結果,可良好地抑制漏光。空隙(孔)之尺寸越小越好,其下限例如可為2nm。 實施例 The size of the voids (holes) in the low refractive index layer is preferably 400 nm or less, preferably 300 nm or less, more preferably 200 nm or less, and even more preferably 100 nm or less. If the size of the voids (holes) in the low-refractive index layer is within such a range, the permeation of water can be well suppressed, and thus the coagulation can be well suppressed. As a result, light leakage can be suppressed favorably. The smaller the size of the voids (pores), the better, and the lower limit may be, for example, 2 nm. Example

以下,舉實施例具體地說明本發明,但本發明並不限定於此等實施例。再者,各特性之測定方法如下所述。Hereinafter, the present invention will be specifically described with reference to Examples, but the present invention is not limited to these Examples. In addition, the measurement method of each characteristic is as follows.

(I)低折射率層及低折射率補強部之低折射率部之折射率 於丙烯酸薄膜形成低折射率層後,切割成50mm×50mm之尺寸,將其經由黏著層貼合於玻璃板(厚度:3mm)之表面。將上述玻璃板之背面中央部(直徑20mm左右)以黑色標記塗滿,形成於該玻璃板之背面不會反射的樣品。於橢圓偏光計(J.A.Woollam Japan公司製:VASE)設置上述樣品,於500nm之波長、入射角50~80度之條件下測定折射率。 (II)亮度不均 就於實施例及比較例獲得之光學積層體,從光學積層體之導光板端部入射LED之光,藉由目視觀察亮度不均。按以下基準進行評價。 ○:積層體全面的亮度(明亮度)為均勻 ╳:確認到漏光、亮度不均勻及/或明亮的區域較少 (III)強度 檢查於處理實施例及比較例獲得之光學積層體時,導光板與稜鏡薄膜有無剝離。按以下基準進行評價。 ○:未發生剝離,可無問題地作為一體物處理 ╳:發生了剝離 (IV)漏光 將於實施例及比較例獲得之光學積層體放入被控制在20℃及98%RH之恆溫恆溼槽中1小時,進行加溼處理。對於加溼處理後之光學積層體從導光板之入光側端部入射LED光,利用目視檢查有無漏光。按以下基準進行評價。 ○:確認沒有漏光、亮度為均勻 ╳:確認有漏光、亮度不均勻 (I) Refractive index of the low-refractive index portion of the low-refractive index layer and the low-refractive index reinforcing portion After the low-refractive index layer is formed on the acrylic film, it is cut into a size of 50 mm×50 mm, and it is attached to the surface of the glass plate (thickness: 3 mm) through the adhesive layer. The center part of the back surface (about 20 mm in diameter) of the glass plate was filled with black marks to form a sample that does not reflect on the back surface of the glass plate. The above-mentioned sample was set in an ellipsometer (manufactured by J.A. Woollam Japan: VASE), and the refractive index was measured under the conditions of a wavelength of 500 nm and an incident angle of 50 to 80 degrees. (II) Uneven brightness With respect to the optical laminates obtained in Examples and Comparative Examples, the light from the LED was incident from the end of the light guide plate of the optical laminate, and unevenness in luminance was observed visually. Evaluation was performed according to the following criteria. ○: The overall brightness (brightness) of the laminate is uniform ╳: Light leakage, uneven brightness, and/or fewer bright areas are confirmed (III) Strength When the optical laminates obtained in Examples and Comparative Examples were processed, it was checked whether or not the light guide plate and the thin film were peeled off. Evaluation was performed according to the following criteria. ○: No peeling occurred, and can be handled as a single body without any problem ╳: Peeling occurred (IV) Light leakage The optical laminates obtained in Examples and Comparative Examples were placed in a constant temperature and humidity tank controlled at 20° C. and 98% RH for 1 hour to perform humidification treatment. The optical layered body after the humidification treatment was incident on the LED light from the light incident side end of the light guide plate, and the presence or absence of light leakage was visually inspected. Evaluation was performed according to the following criteria. ○: Confirm that there is no light leakage and the brightness is uniform ╳: Confirm that there is light leakage and uneven brightness

[製造例1]製備低折射率層形成用塗佈液 (1)矽化合物之凝膠化 於2.2g之二甲基亞碸(DMSO)中溶解0.95g的作為矽化合物的前驅物之甲基三甲氧基矽烷(MTMS),製備混合液A。於該混合液A中添加0.01mol/L之草酸水溶液0.5g,於室溫下進行攪拌30分鐘,藉此使MTMS水解,生成包含三(羥基)甲基矽烷之混合液B。 於5.5g之DMSO中添加28重量%之氨水0.38g及純水0.2g後,進而添加上述混合液B,於室溫下攪拌15分鐘,藉此進行三(羥基)甲基矽烷之凝膠化,得到包含凝膠狀矽化合物的混合液C。 (2)熟成處理 將如上所述製備的包含凝膠狀矽化合物的混合液C直接於40℃下進行培養20小時,進行熟成處理。 (3)粉碎處理 接著,將如上所述進行熟成處理後的凝膠狀矽化合物使用抹刀粉碎成數mm~數cm尺寸的顆粒狀。然後,於混合液C中添加異丙醇(IPA)40g,輕微攪拌後,於室溫下靜置6小時,使凝膠中之溶劑及觸媒傾析。藉由進行三次相同的傾析處理,進行溶劑置換,獲得混合液D。接著,將混合液D中之凝膠狀矽化合物進行粉碎處理(高壓無媒介粉碎)。粉碎處理(高壓無媒介粉碎)係使用均質機(SMT公司製、商品名「UH-50」),於5cc螺口瓶中秤量混合液D中之凝膠狀化合物1.85g及IPA 1.15g後,於50W、20kHz之條件下進行2分鐘的粉碎。 藉由該粉碎處理,將上述混合液D中之凝膠狀矽化合物粉碎,藉此該混合液D’成為粉碎物之溶膠液。經利用動態光散射式NANOTRAC粒度分析計(日機裝公司製、UPA-EX150型)確認混合液D’中所包含之粉碎物之表示粒度偏差的體積平均粒徑,結果為0.50~0.70。進而,對該溶膠液(混合液D’)0.75g,以如下比例添加光鹼生成劑(和光純藥工業股份有限公司:商品名WPBG266)之1.5重量%濃度MEK(甲基乙基酮)溶液0.062g、雙(三甲氧基矽烷基)乙烷之5%濃度MEK溶液0.036g,獲得低折射率層形成用塗佈液A。 [Production Example 1] Preparation of a coating liquid for forming a low refractive index layer (1) Gelation of silicon compounds Mixed solution A was prepared by dissolving 0.95 g of methyltrimethoxysilane (MTMS), which is a precursor of a silicon compound, in 2.2 g of dimethyl sulfoxide (DMSO). 0.5 g of a 0.01 mol/L oxalic acid aqueous solution was added to the mixed solution A, and the mixture was stirred at room temperature for 30 minutes to hydrolyze MTMS to generate a mixed solution B containing tris(hydroxy)methylsilane. After adding 0.38 g of 28% by weight ammonia water and 0.2 g of pure water to 5.5 g of DMSO, the above-mentioned mixed solution B was further added, and the mixture was stirred at room temperature for 15 minutes to perform gelation of tris(hydroxy)methylsilane. , to obtain a mixed solution C containing a gelatinous silicon compound. (2) Aging treatment The mixed solution C containing the gelatinous silicon compound prepared as described above was cultured at 40° C. for 20 hours as it was, and then matured. (3) crushing treatment Next, the gelatinous silicon compound subjected to the aging treatment as described above is pulverized into particles of several mm to several cm in size using a spatula. Then, 40 g of isopropanol (IPA) was added to the mixed solution C, and after slight stirring, it was left to stand at room temperature for 6 hours, and the solvent and catalyst in the gel were decanted. By performing the same decantation treatment three times, solvent replacement was performed, and a mixed solution D was obtained. Next, the gelatinous silicon compound in the mixed solution D is subjected to pulverization treatment (high-pressure non-medium pulverization). The pulverization treatment (high-pressure non-medium pulverization) was performed by using a homogenizer (manufactured by SMT Corporation, trade name "UH-50") to weigh 1.85 g of the gel-like compound and 1.15 g of IPA in the mixed solution D in a 5cc screw-top bottle. Grinding was performed for 2 minutes under the conditions of 50W and 20kHz. By the pulverization process, the gelatinous silicon compound in the mixed solution D is pulverized, whereby the mixed solution D' becomes a sol solution of the pulverized product. The volume average particle diameter, which represents the particle size deviation, of the pulverized material contained in the mixed solution D' was confirmed by a dynamic light scattering type NANOTRAC particle size analyzer (manufactured by Nikkiso Co., Ltd., UPA-EX150), and was 0.50 to 0.70. Further, to 0.75 g of the sol solution (mixed solution D'), a 1.5 wt% concentration MEK (methyl ethyl ketone) solution of a photobase generator (Wako Pure Chemical Industries, Ltd.: trade name WPBG266) was added in the following proportions 0.062 g and 0.036 g of a 5% concentration MEK solution of bis(trimethoxysilyl)ethane to obtain a coating solution A for forming a low refractive index layer.

[製造例2]製備低折射率層形成用塗佈液 與製造例1相同方法製備溶膠液(混合液D’)。對該溶膠液(混合液D’)0.75g,以如下比例添加光鹼生成劑(和光純藥工業股份有限公司:商品名WPBG266)之1.5重量%濃度MEK(甲基乙基酮)溶液0.300g、雙(三甲氧基矽烷基)乙烷之5%濃度MEK溶液0.090g,獲得低折射率層形成用塗佈液B。 [Production Example 2] Preparation of a coating liquid for forming a low refractive index layer A sol solution (mixed solution D') was prepared in the same manner as in Production Example 1. To 0.75 g of the sol solution (mixed solution D'), 0.300 g of a 1.5 wt% concentration MEK (methyl ethyl ketone) solution of a photobase generator (Wako Pure Chemical Industries, Ltd.: trade name WPBG266) was added in the following proportions , 0.090 g of a 5% concentration MEK solution of bis(trimethoxysilyl)ethane to obtain a coating solution B for forming a low refractive index layer.

[製造例3]製備黏著劑 於具備攪拌葉片、溫度計、氮氣導入管、冷卻器之四口燒瓶中,放入丙烯酸丁酯90.7份、N-丙烯醯基嗎啉6份、丙烯酸3份、2-丙烯酸羥丁酯0.3份、作為聚合引發劑之2,2’-偶氮雙異丁腈0.1重量份與乙酸乙酯100g,一面緩慢地攪拌一面導入氮氣進行氮氣置換後,將燒瓶內之液溫保持於55℃附近,進行8小時聚合反應,製備丙烯酸系聚合物溶液。對於獲得之丙烯酸系聚合物溶液之固體成分100份,添加異氰酸酯交聯劑(日本聚胺酯工業公司製之CORONATE L,三羥甲基丙烷之甲苯二異氰酸酯之加成體)0.2份、過氧化苯甲醯(日本油脂公司製之NYPER BMT)0.3份、γ-縮水甘油氧基丙基甲氧基矽烷(信越化學工業公司製:KBM-403)0.2份,製備丙烯酸系黏著劑溶液。接著,將上述丙烯酸系黏著劑溶液以乾燥後之黏著劑層厚度成為特定厚度之方式塗佈於實施有聚矽氧處理之聚對苯二甲酸乙二酯(PET)薄膜(三菱化學聚酯薄膜公司製、厚度:38μm)之單面,於150℃進行乾燥3分鐘,形成黏著劑層。 [Production Example 3] Preparation of adhesive Put 90.7 parts of butyl acrylate, 6 parts of N-acryloylmorpholine, 3 parts of acrylic acid, 0.3 parts of 2-hydroxybutyl acrylate, 0.1 part by weight of 2,2'-azobisisobutyronitrile as a polymerization initiator and 100 g of ethyl acetate were introduced into nitrogen gas while stirring slowly and replaced with nitrogen gas. A polymerization reaction was carried out for 8 hours to prepare an acrylic polymer solution. To 100 parts of solid content of the obtained acrylic polymer solution, 0.2 part of an isocyanate crosslinking agent (CORONATE L manufactured by Nippon Polyurethane Industry Co., Ltd., an adduct of toluene diisocyanate of trimethylolpropane), and benzyl peroxide were added. Acrylic adhesive solution was prepared by 0.3 part of glutinous acid (NYPER BMT manufactured by NOF Corporation) and 0.2 part of γ-glycidoxypropylmethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd.: KBM-403). Next, the above-mentioned acrylic adhesive solution was coated on a polysiloxane-treated polyethylene terephthalate (PET) film (Mitsubishi Chemical polyester film) in such a manner that the thickness of the adhesive layer after drying became a specific thickness One side of the company's product, thickness: 38 μm) was dried at 150° C. for 3 minutes to form an adhesive layer.

[製造例4]製作雙面附黏著劑層之積層體(低折射率補強部) 將製造例1所製備之低折射率層形成用塗佈液A塗佈於厚度30μm之基材(丙烯酸薄膜)。塗佈層之溼厚度(乾燥前的厚度)為約27μm。將該塗佈層於溫度100℃處理1分鐘進行乾燥,於基材上形成低折射率部(厚度0.9μm)。獲得之低折射率部之折射率為1.18。接著,於基材/低折射率部之積層體之兩面配置於製造例3形成的黏著劑層(低折射率部側之黏著劑層之厚度10μm、基材側之黏著劑層之厚度75μm),製作雙面附黏著劑層之積層體。 [Production Example 4] Production of a laminate of double-sided adhesive layers (low-refractive-index reinforcing portion) The coating liquid A for forming a low refractive index layer prepared in Production Example 1 was applied to a base material (acrylic film) having a thickness of 30 μm. The wet thickness (thickness before drying) of the coating layer was about 27 μm. The coating layer was treated at a temperature of 100° C. for 1 minute and dried to form a low refractive index portion (thickness: 0.9 μm) on the base material. The refractive index of the obtained low refractive index portion was 1.18. Next, the adhesive layers formed in Production Example 3 were placed on both sides of the laminate of the substrate/low refractive index portion (the thickness of the adhesive layer on the low refractive index portion side was 10 μm, and the thickness of the adhesive layer on the substrate side was 75 μm). , to make a laminate with double-sided adhesive layers.

[實施例1] 將於製造例1製備之低折射率層形成用塗佈液A塗佈於導光板(丙烯酸板、厚度400μm、導光方向之全長85mm、寬度60mm、折射率1.49)上,並使之乾燥,形成低折射率層(折射率1.18、厚度1μm)。接著,以鐵製棒(前端為100μm以下)切削低折射率層,形成點圖案。進而,以刮刀去除低折射率層之沿著導光方向之兩端部,於該去除部分貼合於製造例4製作的雙面附黏著劑層之積層體,形成低折射率補強部。再者,於上述形成有點圖案之部分,以噴墨印刷環氧接著劑(東亞合成公司製、製品名「LCR0632」),形成如圖2所示圖案之接著層。經由低折射率補強部及接著層,於導光板上貼合稜鏡薄膜,製作光學積層體。於獲得之光學積層體中,低折射率補強部之厚度與接著層之厚度為相同(115.9μm)。又,獲得之光學積層體相當於圖1C之構造。將獲得之光學積層體進行上述(II)~(IV)之評價。將結果顯示於表1。 [Example 1] The coating solution A for forming a low refractive index layer prepared in Production Example 1 was coated on a light guide plate (acrylic plate, thickness 400 μm, full length in the light guide direction 85 mm, width 60 mm, refractive index 1.49), and then dried, A low refractive index layer (refractive index 1.18, thickness 1 μm) was formed. Next, the low-refractive-index layer was cut out with an iron rod (tip of 100 μm or less) to form a dot pattern. Further, both ends of the low-refractive index layer along the light-guiding direction were removed with a doctor blade, and the laminated body of the double-sided adhesive layer produced in Production Example 4 was pasted on the removed portion to form a low-refractive index reinforcing portion. Furthermore, an epoxy adhesive (manufactured by Toagosei Co., Ltd., product name "LCR0632") was inkjet printed on the portion where the dot pattern was formed to form an adhesive layer with a pattern as shown in FIG. 2 . Through the low-refractive-index reinforcing part and the adhesive layer, a phosphine film was bonded to the light guide plate to produce an optical laminate. In the obtained optical layered product, the thickness of the low-refractive-index reinforcing portion and the thickness of the adhesive layer were the same (115.9 μm). In addition, the obtained optical laminated body corresponds to the structure of FIG. 1C. The obtained optical layered body was subjected to the evaluations of the above (II) to (IV). The results are shown in Table 1.

[實施例2] 除了取代低折射率層形成用塗佈液A,使用製造例2所製備之低折射率層形成用塗佈液B形成低折射率層(折射率1.25、厚度1μm)以外,與實施例1相同方法製作光學積層體。將獲得之光學積層體進行與實施例1相同之評價。將結果顯示於表1。 [Example 2] The same procedure as in Example 1 was carried out, except that the coating liquid B for forming a low refractive index layer prepared in Production Example 2 was used instead of the coating liquid A for forming a low refractive index layer to form a low refractive index layer (refractive index 1.25, thickness 1 μm). Methods An optical laminate was produced. The obtained optical layered body was subjected to the same evaluation as in Example 1. The results are shown in Table 1.

[實施例3] 於與實施例1相同之導光板之沿著導光方向之兩端部,貼合製造例4製作的雙面附黏著劑層之積層體,形成低折射率補強部。進而,於導光板上塗佈低折射率層形成用塗佈液A,並使之乾燥,形成與低折射率補強部相同厚度(115.9μm)之低折射率層。之後,將環氧接著劑(東亞合成公司製、製品名「LCR0632」)以噴墨印刷成與實施例1相同的點圖案,形成接著層。使印刷的接著劑浸透至低折射率層,填埋低折射率層之空隙部後,於其上貼合稜鏡薄膜,獲得光學積層體。獲得之光學積層體相當於圖1A之構造。將獲得之光學積層體進行與實施例1相同之評價。將結果顯示於表1。 [Example 3] The laminated body of the double-sided adhesive layer produced in Production Example 4 was pasted on both ends of the same light guide plate as in Example 1 along the light guide direction to form a low-refractive index reinforcing portion. Furthermore, the coating liquid A for low-refractive-index layer formation was apply|coated to a light guide plate, and it was made to dry, and the low-refractive-index layer of the same thickness (115.9 micrometers) as a low-refractive-index reinforcement part was formed. Then, an epoxy adhesive (manufactured by Toagosei Co., Ltd., product name "LCR0632") was inkjet-printed in the same dot pattern as in Example 1 to form an adhesive layer. The printed adhesive was permeated into the low-refractive index layer, and the voids of the low-refractive index layer were filled, and then a fluorine thin film was pasted thereon to obtain an optical laminate. The obtained optical laminate corresponds to the structure of FIG. 1A . The obtained optical layered body was subjected to the same evaluation as in Example 1. The results are shown in Table 1.

[比較例1] 於與實施例1相同之導光板之沿著導光方向之兩端部,貼合製造例4製作的雙面附黏著劑層之積層體,形成低折射率補強部。進而,於導光板上,將環氧接著劑(東亞合成公司製、製品名「LCR0632」)以噴墨印刷成與實施例1相同的點圖案,形成接著層。經由低折射率補強部及接著層,於導光板上貼合稜鏡薄膜,使之一體化。接著,於導光板與稜鏡薄膜之間之空隙部,流入聚矽氧系OCR(旭化成wacker silicone股份有限公司製、製品名「LUMISIL 202UV」、折射率1.42),使之硬化,獲得光學積層體。將獲得之光學積層體進行與實施例1相同之評價。將結果顯示於表1。 [Comparative Example 1] The laminated body of the double-sided adhesive layer produced in Production Example 4 was pasted on both ends of the same light guide plate as in Example 1 along the light guide direction to form a low-refractive index reinforcing portion. Furthermore, on the light guide plate, an epoxy adhesive (manufactured by Togosei Corporation, product name "LCR0632") was inkjet-printed in the same dot pattern as in Example 1 to form an adhesive layer. Through the low-refractive-index reinforcing part and the adhesive layer, the fluorine film is pasted on the light guide plate to be integrated. Next, a polysiloxane-based OCR (manufactured by Asahi Kasei Wacker Silicone Co., Ltd., product name "LUMISIL 202UV", refractive index 1.42) was poured into the gap between the light guide plate and the film, and hardened to obtain an optical laminate. . The obtained optical layered body was subjected to the same evaluation as in Example 1. The results are shown in Table 1.

[比較例2] 除了未設置低折射率補強部以外,與實施例1相同方法製作光學積層體。將獲得之光學積層體進行與實施例1相同之評價。將結果顯示於表1。 [Comparative Example 2] An optical layered body was produced in the same manner as in Example 1, except that the low-refractive-index reinforcing portion was not provided. The obtained optical layered body was subjected to the same evaluation as in Example 1. The results are shown in Table 1.

[比較例3] 於與實施例1相同之導光板之沿著導光方向之兩端部,貼合製造例4製作的雙面附黏著劑層之積層體,形成低折射率補強部。進而,於導光板上,將環氧接著劑(東亞合成公司製、製品名「LCR0632」)以噴墨印刷成與實施例1相同的點圖案,形成接著層。經由低折射率補強部及接著層,於導光板上貼合稜鏡薄膜使之一體化,獲得光學積層體。即,除了未設置低折射率層以外,與實施例1相同方法製作光學積層體。將獲得之光學積層體進行與實施例1相同之評價。將結果顯示於表1。 [Comparative Example 3] The laminated body of the double-sided adhesive layer produced in Production Example 4 was pasted on both ends of the same light guide plate as in Example 1 along the light guide direction to form a low-refractive index reinforcing portion. Furthermore, on the light guide plate, an epoxy adhesive (manufactured by Togosei Corporation, product name "LCR0632") was inkjet-printed in the same dot pattern as in Example 1 to form an adhesive layer. Through the low-refractive-index reinforcing part and the adhesive layer, a phosphine film was bonded and integrated on the light guide plate to obtain an optical laminate. That is, the optical layered body was produced in the same manner as in Example 1 except that the low refractive index layer was not provided. The obtained optical layered body was subjected to the same evaluation as in Example 1. The results are shown in Table 1.

[比較例4] 於與實施例1相同之導光板上,將環氧接著劑(東亞合成公司製、製品名「LCR0632」)以噴墨印刷成與實施例1相同的點圖案,形成接著層。經由接著層於導光板上貼合稜鏡薄膜,使之一體化,獲得光學積層體。即,除了未設置低折射率補強部及低折射率層以外,與實施例1相同方法製作光學積層體。將獲得之光學積層體進行與實施例1相同之評價。將結果顯示於表1。 [Comparative Example 4] On the same light guide plate as in Example 1, an epoxy adhesive (manufactured by Toagosei Co., Ltd., product name "LCR0632") was inkjet-printed in the same dot pattern as in Example 1 to form an adhesive layer. An optical layered body was obtained by laminating the fluorine film on the light guide plate through the adhesive layer and integrating them. That is, except that the low-refractive-index reinforcing portion and the low-refractive-index layer were not provided, an optical layered body was produced in the same manner as in Example 1. The obtained optical layered body was subjected to the same evaluation as in Example 1. The results are shown in Table 1.

[表1]   低折射率層 補強部 亮度不均 強度 漏光 實施例1 實施例2 實施例3 比較例1 無(高折射率層) 比較例2 比較例3 比較例4 [Table 1] low refractive index layer Reinforcing Department uneven brightness strength light leakage Example 1 Have Have Example 2 Have Have Example 3 Have Have Comparative Example 1 None (high refractive index layer) Have Comparative Example 2 Have none Comparative Example 3 none Have Comparative Example 4 none none

由表1可知,根據本發明之實施例,可獲得亮度較高、亮度不均得以抑制、作為一體物的強度優異且可抑制漏光的光學積層體。以高折射材料填充導光板與光學構件之間的空隙部的比較例1,明亮區域較少且觀察到漏光。未設置補強部之比較例2,作為一體物的強度不足。未設置低折射率層之比較例3,觀察到漏光。未設置低折射率層及補強部之比較例4,作為一體物的強度不足且觀察到漏光。 產業上之可利用性 As can be seen from Table 1, according to the examples of the present invention, an optical laminate having high brightness, suppressed brightness unevenness, excellent strength as a single body, and suppressed light leakage can be obtained. In Comparative Example 1 in which the void portion between the light guide plate and the optical member was filled with a high-refractive material, there were few bright areas and light leakage was observed. In Comparative Example 2 in which the reinforcing portion was not provided, the strength as an integral body was insufficient. In Comparative Example 3 in which the low refractive index layer was not provided, light leakage was observed. In Comparative Example 4 in which the low-refractive index layer and the reinforcing portion were not provided, the strength as a single body was insufficient, and light leakage was observed. industrial availability

本發明之光學積層體可適合用在使用導光板取出光之光學裝置(例如圖像顯示裝置、照明裝置)。The optical laminate of the present invention can be suitably used for optical devices (eg, image display devices, lighting devices) that extract light using a light guide plate.

10:導光板 20:接著層 30:光學構件 40:低折射率補強部 41:基材 42:低折射率部 43:黏著劑層 44:黏著劑層 50:低折射率層 100:光學積層體 101:光學積層體 102:光學積層體 10: Light guide plate 20: Next layer 30: Optical components 40: Low refractive index reinforcement 41: Substrate 42: Low refractive index part 43: Adhesive layer 44: Adhesive layer 50: Low refractive index layer 100: Optical Laminate 101: Optical Laminate 102: Optical Laminate

圖1A係本發明之一實施形態之光學積層體的概略剖面圖。 圖1B係本發明之另一實施形態之光學積層體的概略剖面圖。 圖1C係本發明之又一實施形態之光學積層體的概略剖面圖。 圖2係顯示圖1A之光學積層體去除光學構件之狀態的概略俯視圖。 圖3係顯示本發明之實施形態之光學積層體所使用之低折射率補強部之一例的概略剖面圖。 1A is a schematic cross-sectional view of an optical laminate according to an embodiment of the present invention. 1B is a schematic cross-sectional view of an optical laminate according to another embodiment of the present invention. 1C is a schematic cross-sectional view of an optical laminate according to another embodiment of the present invention. FIG. 2 is a schematic plan view showing a state in which an optical member is removed from the optical laminate of FIG. 1A . 3 is a schematic cross-sectional view showing an example of a low-refractive-index reinforcing portion used in the optical laminate according to the embodiment of the present invention.

10:導光板 10: Light guide plate

20:接著層 20: Next layer

30:光學構件 30: Optical components

50:低折射率層 50: Low refractive index layer

100:光學積層體 100: Optical Laminate

Claims (9)

一種光學積層體,具有: 導光板; 以俯視點圖案配置於該導光板之接著層; 配置於該導光板之沿著導光方向之兩端部的包含低折射率部的低折射率補強部;及 經由該接著層及該低折射率補強部積層於該導光板之光學構件; 該接著層形成點密度從該導光板之入光側起沿著導光方向變大的圖案; 於該導光板與該光學構件之間的未配置有該接著層及該低折射率補強部的區域中,以與該導光板之接著層側之面及該光學構件之接著層側之面中之至少一面接觸之方式配置有低折射率層; 該低折射率部及該低折射率層之折射率為1.30以下。 An optical laminate having: light guide plate; Disposing on the adhesive layer of the light guide plate in a top view point pattern; a low-refractive-index reinforcing portion including a low-refractive-index portion disposed at both ends of the light guide plate along the light-guiding direction; and an optical component laminated on the light guide plate through the adhesive layer and the low-refractive-index reinforcing part; The adhesive layer forms a pattern in which the dot density increases along the light guide direction from the light incident side of the light guide plate; In the region between the light guide plate and the optical member where the adhesive layer and the low-refractive-index reinforcing portion are not arranged, with the surface on the side of the adhesive layer of the light guide plate and the surface on the side of the adhesive layer of the optical member A low-refractive-index layer is configured in a manner of contacting at least one side; The refractive index of the low-refractive index portion and the low-refractive index layer is 1.30 or less. 如請求項1之光學積層體,其中上述低折射率層以與前述導光板之接著層側之面及前述光學構件之接著層側之面兩面接觸之方式配置。The optical laminate according to claim 1, wherein the low-refractive index layer is arranged in contact with both surfaces on the adhesive layer side of the light guide plate and the surface on the adhesive layer side of the optical member. 如請求項2之光學積層體,其中前述低折射率層係填滿前述導光板與前述光學構件之間的未配置有前述接著層及前述低折射率補強部的整個區域。The optical laminate according to claim 2, wherein the low-refractive-index layer fills the entire region between the light guide plate and the optical member where the adhesive layer and the low-refractive-index reinforcing portion are not disposed. 如請求項1至3中任一項之光學積層體,其中前述低折射率部及前述低折射率層之折射率為1.25以下。The optical laminate according to any one of claims 1 to 3, wherein the low refractive index portion and the low refractive index layer have a refractive index of 1.25 or less. 如請求項1至4中任一項之光學積層體,其中前述低折射率部及前述低折射率層係藉由微細孔粒子彼此化學鍵結而形成的空隙層。The optical laminate according to any one of claims 1 to 4, wherein the low-refractive index portion and the low-refractive index layer are void layers formed by chemically bonding fine porous particles to each other. 如請求項1至5中任一項之光學積層體,其中前述低折射率補強部具有基材、形成於該基材之低折射率部及作為最外層設置於兩面的黏著劑層。The optical laminate according to any one of claims 1 to 5, wherein the low-refractive-index reinforcing portion has a base material, a low-refractive index portion formed on the base material, and adhesive layers provided on both surfaces as outermost layers. 如請求項1至6中任一項之光學積層體,其中前述低折射率補強部之合計寬度為前述導光板之寬度的10%以下。The optical laminate according to any one of claims 1 to 6, wherein the total width of the low-refractive index reinforcing portions is 10% or less of the width of the light guide plate. 如請求項1至7中任一項之光學積層體,其中前述低折射率補強部之總透光率為85%以上。The optical laminate according to any one of claims 1 to 7, wherein the total light transmittance of the low-refractive-index reinforcing portion is 85% or more. 如請求項1至8中任一項之光學積層體,其中於前述導光板之與入光側為相反側的端部,進一步設置有低折射率補強部。The optical laminate according to any one of claims 1 to 8, wherein a low-refractive-index reinforcing portion is further provided at the end portion of the light guide plate on the opposite side to the light incident side.
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