TW202209356A - Anisotropic conductive film - Google Patents

Anisotropic conductive film Download PDF

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Publication number
TW202209356A
TW202209356A TW110140383A TW110140383A TW202209356A TW 202209356 A TW202209356 A TW 202209356A TW 110140383 A TW110140383 A TW 110140383A TW 110140383 A TW110140383 A TW 110140383A TW 202209356 A TW202209356 A TW 202209356A
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Taiwan
Prior art keywords
conductive particles
anisotropic conductive
conductive film
conductive
anisotropic
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TW110140383A
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Chinese (zh)
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TWI823170B (en
Inventor
尾怜司
阿久津恭志
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日商迪睿合股份有限公司
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Priority claimed from JP2017085744A external-priority patent/JP7274811B2/en
Application filed by 日商迪睿合股份有限公司 filed Critical 日商迪睿合股份有限公司
Publication of TW202209356A publication Critical patent/TW202209356A/en
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Publication of TWI823170B publication Critical patent/TWI823170B/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
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Abstract

To provide an anisotropic conductive film capable of corresponding to a bump of a narrow pitch and reducing number density of conductive particles. Disclosed is an anisotropic conductive film 1A in which conductive particles 2 are arranged in an insulating resin binder 3. A repeating unit 5 of conductive particles composed of rows 2p, 2q, 2r of conductive particles 2 lined up in a row at intervals and formed by juxtaposing different numbers of conductive particles is repeatedly arranged over the entire surface of the anisotropic conductive film.

Description

異向性導電膜Anisotropic Conductive Film

本發明係關於一種異向性導電膜。The present invention relates to an anisotropic conductive film.

使導電粒子分散於絕緣性樹脂黏合劑中而成之異向性導電膜於將IC晶片等電子零件安裝於配線基板等時被廣泛使用。於異向性導電膜中,強烈要求藉由伴隨電子零件之高密度安裝的凸塊之窄間距化,而提高凸塊中之導電粒子的捕捉性,且避免相鄰之凸塊間之短路。Anisotropic conductive films in which conductive particles are dispersed in an insulating resin binder are widely used for mounting electronic components such as IC chips on wiring boards and the like. In anisotropic conductive films, it is strongly required to improve the trapping properties of conductive particles in the bumps and to avoid short circuits between adjacent bumps by narrowing the pitch of bumps accompanying high-density mounting of electronic components.

針對此種要求,提出有將異向性導電膜中的導電粒子之配置設為晶格狀之排列,且使其排列軸相對於異向性導電膜之長邊方向傾斜,並且於該情形時,使導電粒子間之距離以特定之比例隔開(專利文獻1、專利文獻2)。又,亦提出有藉由將導電粒子連結,而形成導電粒子局部較密之區域,從而應對窄間距化(專利文獻3)。In response to such a requirement, it has been proposed to arrange the conductive particles in the anisotropic conductive film in a lattice-like arrangement, and to make the arrangement axis inclined with respect to the longitudinal direction of the anisotropic conductive film, and in this case , the distance between the conductive particles is separated by a specific ratio (Patent Document 1, Patent Document 2). In addition, it is proposed to form a region where the conductive particles are locally dense by connecting the conductive particles, thereby coping with the narrowing of the pitch (Patent Document 3).

專利文獻1:日本專利4887700號公報 專利文獻2:日本專利特開平9-320345號公報 專利文獻3:日本專利特表2002-519473號公報Patent Document 1: Japanese Patent No. 4887700 Patent Document 2: Japanese Patent Laid-Open No. 9-320345 Patent Document 3: Japanese Patent Publication No. 2002-519473

[發明所欲解決之課題][The problem to be solved by the invention]

如專利文獻1、2記載,於將導電粒子配置為簡單之晶格狀之情形時,藉由排列軸之傾斜角或導電粒子間之距離應對凸塊之佈局。因此,若凸塊成為窄間距,則必須縮小導電粒子間之距離,而變得難以避免短路。又,導電粒子之個數密度增加,導致異向性導電膜之製造成本亦增加。As described in Patent Documents 1 and 2, when the conductive particles are arranged in a simple lattice shape, the bump layout is handled by the inclination angle of the arrangement axis or the distance between the conductive particles. Therefore, when the bumps have a narrow pitch, it is necessary to reduce the distance between the conductive particles, and it becomes difficult to avoid short circuits. In addition, the number density of the conductive particles increases, resulting in an increase in the manufacturing cost of the anisotropic conductive film.

另一方面,於不縮小導電粒子間之距離之情形時,有無法藉由端子捕捉足夠個數之導電粒子之虞。On the other hand, when the distance between the conductive particles is not reduced, there is a possibility that a sufficient number of conductive particles cannot be captured by the terminals.

又,於藉由將導電粒子連結而形成導電粒子局部較密之區域之手法中,於連結之複數個導電粒子同時進入凸塊間空間時短路之風險變高,故而欠佳。In addition, in the method of forming a region where conductive particles are locally dense by connecting conductive particles, the risk of short circuit increases when a plurality of connected conductive particles enter the space between bumps at the same time, which is not preferable.

因此,本發明之課題在於提供一種能夠應對窄間距之凸塊,且與以往之異向性導電膜相比能夠降低導電粒子之個數密度的異向性導電膜。 [解決課題之技術手段]Therefore, the subject of this invention is to provide the anisotropic conductive film which can cope with the bump of a narrow pitch, and can reduce the number density of electroconductive particle compared with the conventional anisotropic conductive film. [Technical means to solve the problem]

本發明者發現,若將導電粒子互相隔開間隔並且形成特定排列之導電粒子的單元重複配置於異向性導電膜之整個面,則可於膜整個面形成導電粒子之疏密區域,因此於疏密區域之密區域中可連接窄間距之凸塊,且於該密區域中導電粒子亦互相隔開,因此短路之風險降低,進而,藉由疏區域之存在,可降低膜整體的導電粒子之個數密度,從而想到本發明。The inventors of the present invention found that if the conductive particles are spaced apart from each other and the units forming the conductive particles in a specific arrangement are repeatedly arranged on the entire surface of the anisotropic conductive film, the dense and dense regions of the conductive particles can be formed on the entire surface of the film. Bumps with narrow pitches can be connected in the dense area of the dense area, and the conductive particles are also separated from each other in the dense area, so the risk of short circuit is reduced, and further, the existence of the sparse area can reduce the conductive particles of the whole film the number density, and thus the present invention was conceived.

即,本發明提供一種異向性導電膜,其於絕緣性樹脂黏合劑中配置有導電粒子,且 其重複配置有導電粒子之重複單元,該導電粒子之重複單元係導電粒子隔開間隔排列為一列而成之導電粒子列且為導電粒子數不同者並列而成。 [發明之效果]That is, the present invention provides an anisotropic conductive film in which conductive particles are arranged in an insulating resin binder, and The repeating units of the conductive particles are arranged repeatedly, and the repeating units of the conductive particles are conductive particle rows formed by the conductive particles being spaced apart and arranged in a row, and those with different numbers of conductive particles are juxtaposed. [Effect of invention]

根據本發明之異向性導電膜,並非將各導電粒子設為簡單之晶格狀之排列,而是重複配置有特定之粒子配置之導電粒子的重複單元,故而可於膜形成導電粒子之疏密區域,因此可抑制異向性導電膜整體中導電粒子之個數密度之增加。因此,可抑制伴隨導電粒子之個數密度增加導致製造成本之增加。又,通常若導電粒子之個數密度增加,則於異向性導電連接時按壓夾具所需之推力亦增加,但根據本發明之異向性導電膜,藉由抑制導電粒子之個數密度之增加,而亦抑制於異向性導電連接時按壓夾具所需之推力之增加,因此可防止電子零件因異向性導電連接而變形。又,藉由按壓夾具無需過大之推力,按壓夾具之推力穩定,因此經異向性導電連接之電子零件之導通特性等品質穩定。According to the anisotropic conductive film of the present invention, the conductive particles are not arranged in a simple lattice-like arrangement, but a repeating unit of the conductive particles with a specific particle arrangement is repeatedly arranged, so that the conductive particles can be formed in the film. Since the dense area is formed, an increase in the number density of the conductive particles in the entire anisotropic conductive film can be suppressed. Therefore, it is possible to suppress an increase in the manufacturing cost due to an increase in the number density of the conductive particles. In addition, generally, when the number density of conductive particles increases, the thrust required to press the jig during anisotropic conductive connection also increases. However, according to the anisotropic conductive film of the present invention, the number density of conductive particles is suppressed from increasing. increase, and also suppress the increase of the thrust required to press the clamp during the anisotropic conductive connection, thereby preventing the electronic parts from being deformed due to the anisotropic conductive connection. In addition, since the pressing force does not need to be excessively large, the pressing force of the pressing force is stable, so that the quality such as the conduction characteristics of the electronic components connected by the anisotropic conduction is stable.

另一方面,根據本發明之異向性導電膜,由於沿縱橫方向重複形成成為導電粒子較密之區域的重複單元,因此可連接窄間距之凸塊。進而,於重複單元內,導電粒子互相隔開,因此即使於重複單元橫跨端子間空間之情形時,亦可避免短路之產生。On the other hand, according to the anisotropic conductive film of the present invention, since repeating units forming regions with dense conductive particles are repeatedly formed in the vertical and horizontal directions, bumps with narrow pitches can be connected. Furthermore, in the repeating unit, the conductive particles are separated from each other, so even when the repeating unit spans the space between the terminals, the occurrence of short circuit can be avoided.

以下,一邊參照圖式一邊對本發明之異向性導電膜進行詳細說明。再者,各圖中,相同之符號表示相同或同等之構成要素。Hereinafter, the anisotropic conductive film of the present invention will be described in detail with reference to the drawings. In addition, in each figure, the same code|symbol represents the same or equivalent component.

<異向性導電膜之整體構成> 圖1A係表示本發明之一實施例之異向性導電膜1A的導電粒子之配置的俯視圖,圖1B係其剖面圖。 該異向性導電膜1A具有如下結構:將導電粒子2以單層配置於絕緣性樹脂黏合劑3之表面或其附近,並於其上積層有絕緣性接著層4。<Overall structure of anisotropic conductive film> 1A is a plan view showing an arrangement of conductive particles in an anisotropic conductive film 1A according to an embodiment of the present invention, and FIG. 1B is a cross-sectional view thereof. The anisotropic conductive film 1A has a structure in which the conductive particles 2 are arranged in a single layer on the surface of the insulating resin adhesive 3 or its vicinity, and the insulating adhesive layer 4 is laminated thereon.

再者,作為本發明之異向性導電膜,亦可設為省略絕緣性接著層4,而將導電粒子2埋入至絕緣性樹脂黏合劑3之構成。Furthermore, as the anisotropic conductive film of the present invention, the insulating adhesive layer 4 may be omitted, and the conductive particles 2 may be embedded in the insulating resin adhesive 3 .

<導電粒子> 作為導電粒子2,可適當選擇公知之異向性導電膜中使用者而使用。例如可列舉:鎳、銅、銀、金、鈀等金屬粒子;以鎳等金屬被覆聚醯胺、聚苯胍

Figure 110140383-A0304-12-0000-4
(polybenzoguanamine)等樹脂粒子之表面而成之金屬被覆樹脂粒子等。配置之導電粒子的大小較佳為1~30 μm,更佳為1 μm以上且10 μm以下,進而較佳為2 μm以上且6 μm以下。<Electroconductive particle> As the conductive particle 2, a user of a well-known anisotropic conductive film can be appropriately selected and used. For example, metal particles such as nickel, copper, silver, gold, palladium, etc.;
Figure 110140383-A0304-12-0000-4
Metal-coated resin particles formed on the surface of resin particles such as polybenzoguanamine. The size of the arranged conductive particles is preferably 1 to 30 μm, more preferably 1 μm or more and 10 μm or less, and still more preferably 2 μm or more and 6 μm or less.

導電粒子2之平均粒徑可藉由圖像型或雷射式粒度分佈計進行測量。亦可俯視觀察異向性導電膜,而測量粒徑並求出。於該情形時,較佳為測量200個以上,更佳為測量500個以上,進而更佳為測量1000個以上。The average particle size of the conductive particles 2 can be measured by an image-type or laser-type particle size distribution meter. The anisotropic conductive film can also be viewed from above, and the particle size can be measured and determined. In this case, it is preferable to measure 200 or more pieces, more preferably to measure 500 pieces or more, and still more preferably to measure 1000 pieces or more.

導電粒子2之表面較佳藉由絕緣塗佈或絕緣粒子處理等而被覆。此種被覆容易自導電粒子2之表面剝離,且不會阻礙異向性連接。又,亦可於導電粒子2之整個表面或一部分設置有突起。突起之高度為導電粒徑之20%以內,較佳為10%以內。The surfaces of the conductive particles 2 are preferably covered by insulating coating or insulating particle treatment. Such a coating is easily peeled off from the surface of the conductive particle 2 and does not hinder the anisotropic connection. In addition, protrusions may be provided on the entire surface or a part of the conductive particles 2 . The height of the protrusions is within 20% of the conductive particle size, preferably within 10%.

<導電粒子之配置> (重複單元) 異向性導電膜1A之俯視下的導電粒子2之配置係將並列設置有導電粒子列2p、2q、2r及單獨之導電粒子2s的重複單元5於異向性導電膜1A之整個面沿縱橫方向(X方向、Y方向)重複,且依序連結形成重複單元5之外形的導電粒子之中心而形成之多角形成為三角形。再者,本發明之異向性導電膜可視需要具有未配置導電粒子之區域。<Arrangement of Conductive Particles> (repeating unit) The arrangement of the conductive particles 2 in the plan view of the anisotropic conductive film 1A is to arrange the repeating units 5 in which the conductive particle rows 2p, 2q, 2r and the individual conductive particles 2s are arranged in parallel on the entire surface of the anisotropic conductive film 1A. The directions (X direction, Y direction) are repeated, and the polygons formed by sequentially connecting the centers of the conductive particles forming the outer shape of the repeating unit 5 form a triangle. Furthermore, the anisotropic conductive film of this invention may have the area|region where electroconductive particle is not arrange|positioned as needed.

各導電粒子列2p、2q、2r於俯視下分別為導電粒子2隔開間隔而呈直線狀排列為一列。又,構成導電粒子列2p、2q、2r之導電粒子數逐漸不同,導電粒子列2p、2q、2r平行地並列。如上所述,藉由重複使粒子數逐漸不同之導電粒子列2p、2q、2r並列而成之粒子配置,導電粒子之個數密度局部形成疏密,因此於將異向性導電膜貼附於電子零件之情形時,即使存在微小之錯位,於構成凸塊列之任一凸塊中亦容易捕捉穩定個數之導電粒子。其於連續進行異向性導電連接之情形時更有效。即,於簡單之晶格排列者中異向性導電膜於電子零件上之貼附微小地錯開之情形時,尤其是於凸塊端部捕捉粒子數容易因錯位之有無或程度而變動。為了抑制該變動,考慮使晶格排列之角度相對於膜之長邊方向傾斜(專利文獻1等)。然而,若凸塊寬度或凸塊間距離變得更窄,則使晶格排列傾斜之效果有限。對此,於本發明中,藉由使凸塊長之範圍中產生導電粒子之個數密度的疏密,而使凸塊長之範圍之任一部位捕捉導電粒子。換言之,於一個凸塊中同時產生捕捉導電粒子之位置與不捕捉之位置。藉此,只要於任一凸塊排列中凸塊之形狀(面積)均相同,則藉由適當設定重複單元之重複間隔,由凸塊捕捉之導電粒子之個數變得穩定。因此,即使異向性導電膜之貼附產生微小之錯位,又,生產線上連續製造連接體時之各連接體之凸塊排列中的導電粒子之捕捉狀態亦變得容易穩定。又,藉由一個凸塊同時產生捕捉導電粒子之位置與不捕捉之位置,而可期待異向性導電連接後之檢查勞力之減少及品質管理之提高。例如,藉由一個凸塊同時產生捕捉導電粒子之位置與不捕捉之位置,於異向性導電連接後之壓痕檢查時,連續獲得之連接體之對比變得容易。又,可於連續製造之連接體彼此間對於異向性導電連接步驟中將異向性導電膜暫貼於電子零件時之錯位之有無進行比較,因此可期待連接裝置之改善事項變得容易判定。Each of the conductive particle rows 2p, 2q, and 2r is arranged in a row in a straight line with the conductive particles 2 being spaced apart from each other in a plan view. In addition, the number of conductive particles constituting the conductive particle arrays 2p, 2q, and 2r gradually changes, and the conductive particle arrays 2p, 2q, and 2r are arranged in parallel. As described above, by repeating the particle arrangement in which the conductive particle rows 2p, 2q, and 2r of gradually different particle numbers are arranged in parallel, the number density of the conductive particles is locally dense and dense. Therefore, when the anisotropic conductive film is attached to the In the case of electronic components, even if there is a slight dislocation, a stable number of conductive particles can be easily captured in any bump constituting the bump row. It is more effective in the case where anisotropic conductive connections are made continuously. That is, in the case of a simple lattice arrangement where the attachment of the anisotropic conductive film to the electronic component is slightly misaligned, the number of trapped particles, especially at the end of the bump, is likely to fluctuate due to the presence or degree of misalignment. In order to suppress this variation, it is considered to incline the angle of the lattice arrangement with respect to the longitudinal direction of the film (Patent Document 1, etc.). However, if the bump width or the inter-bump distance becomes narrower, the effect of tilting the lattice arrangement is limited. On the other hand, in the present invention, the number density of the conductive particles is generated in the range of the bump length so as to capture the conductive particles at any part of the range of the bump length. In other words, a location for capturing conductive particles and a location for not capturing conductive particles are simultaneously generated in one bump. Therefore, as long as the shape (area) of the bumps is the same in any bump arrangement, the number of conductive particles captured by the bumps becomes stable by appropriately setting the repeating interval of the repeating unit. Therefore, even when the anisotropic conductive film is adhered with a slight dislocation, the trapped state of the conductive particles in the bump array of each connecting body is easily stabilized when the connecting body is continuously produced on the production line. In addition, by simultaneously generating a position where conductive particles are captured and a position where they are not captured by one bump, reduction of inspection labor after anisotropic conductive connection and improvement of quality control can be expected. For example, by simultaneously generating a location for capturing conductive particles and a location for not capturing conductive particles by one bump, the comparison of continuously obtained connectors becomes easy during indentation inspection after anisotropic conductive connection. In addition, it is possible to compare the presence or absence of dislocation when the anisotropic conductive film is temporarily attached to the electronic component in the anisotropic conductive connection step between the continuously manufactured connectors, so that it is expected that the improvement of the connection device will be easily determined. .

重複單元5中之導電粒子2之配置係構成該重複單元5之導電粒子2的一部分佔據無間隙地排列正六角形之情形時之各正六角形的頂點之一部分的配置。或為無間隙地排列正三角形之情形時之正三角形的頂點與構成重複單元5之導電粒子重疊之配置。進而換言之,自導電粒子存在於六方晶格排列之各晶格點之配置規則地除去特定晶格點的導電粒子之剩餘之配置成為重複單元5。如上所述,若於六方晶格排列之晶格點配置導電粒子2,則重複單元5之粒子配置容易識別,設計變得容易。再者,如下文所述,重複單元中之導電粒子之配置並不限於基於六方晶格者,亦可基於正方晶格,亦可基於沿縱橫方向排列八角形以上之正多角形且使鄰接之正多角形之邊彼此重合之配置。The arrangement of the conductive particles 2 in the repeating unit 5 is an arrangement in which a part of the conductive particles 2 constituting the repeating unit 5 occupies a part of the vertices of the regular hexagons when the regular hexagons are arranged without gaps. Alternatively, when the equilateral triangles are arranged without gaps, the vertices of the equilateral triangles overlap with the conductive particles constituting the repeating unit 5 . In other words, the repeating unit 5 is the repeating unit 5 from the arrangement of the conductive particles present in each lattice point of the hexagonal lattice arrangement where the conductive particles are regularly removed from the specific lattice point. As described above, when the conductive particles 2 are arranged at the lattice points of the hexagonal lattice arrangement, the particle arrangement of the repeating unit 5 can be easily recognized and the design can be facilitated. Furthermore, as described below, the arrangement of the conductive particles in the repeating unit is not limited to those based on hexagonal lattices, but can also be based on square lattices, and can also be based on regular polygons with more than octagons arranged in the vertical and horizontal directions and adjacent to each other. An arrangement in which the sides of a regular polygon overlap each other.

(重複單元之重複態樣) 更詳細而言,圖1A所示之異向性導電膜1A中之重複單元5之重複於X方向上,重複單元5將重複單元5內之粒子間隔隔開而重複。又,於Y方向上,將使重複單元5沿Y方向之對稱軸反轉而成之重複單元5B與重複單元5隔開間隔而交替重複。於該情形時,較佳將依序連結形成重複單元之外形的導電粒子之中心而形成之多角形沿異向性導電膜之短邊方向投影時之異向性導電膜之長邊方向之邊中的位置和與該重複單元鄰接之重複單元之同樣之位置局部重疊。其原因在於:通常由於電子零件之端子之寬度方向成為異向性導電膜之長邊方向,因此若以上述方式使形成重複單元之外形的多角形重疊,則由電子零件之端子捕捉導電粒子之機率提高。又,亦可交換異向性導電膜之長邊方向與短邊方向。其原因在於根據端子佈局而亦會產生交換為宜之情形。(repeated form of repeating unit) In more detail, the repeating unit 5 in the anisotropic conductive film 1A shown in FIG. 1A is repeated in the X direction, and the repeating unit 5 repeats the particles in the repeating unit 5 at intervals. In addition, in the Y direction, the repeating unit 5B obtained by inverting the symmetry axis of the repeating unit 5 along the Y direction and the repeating unit 5 are alternately repeated at intervals. In this case, it is preferable to sequentially connect the centers of the conductive particles forming the outer shape of the repeating unit to form a polygon along the side of the long-side direction of the anisotropic conductive film when projected along the short-side direction of the anisotropic conductive film. The position in the repeat unit partially overlaps with the same position of the repeat unit adjacent to the repeat unit. The reason for this is that the width direction of the terminals of electronic components is usually the longitudinal direction of the anisotropic conductive film. Therefore, if the polygons forming the outer shape of the repeating unit are overlapped in the above-mentioned manner, the terminals of the electronic components capture the conductive particles. Chances are increased. Moreover, the long-side direction and the short-side direction of the anisotropic conductive film may be interchanged. The reason for this is that, depending on the terminal layout, there is also a situation where the exchange is appropriate.

再者,於考慮導電粒子2之重複單元之情形時,亦可將合併重複單元5與使其反轉而成之重複單元5B而成之單元視為導電粒子之重複單位,但於本發明中,重複單元較佳為複數個導電粒子列並列而成之單元且為沿縱橫方向重複之最小單位。Furthermore, when considering the situation of the repeating unit of the conductive particle 2, the unit formed by combining the repeating unit 5 and the repeating unit 5B obtained by inverting it can also be regarded as the repeating unit of the conductive particle, but in the present invention , the repeating unit is preferably a unit formed by juxtaposing a plurality of conductive particle rows and is the smallest unit repeating in the vertical and horizontal directions.

(重複單元之大小) 重複單元5之異向性導電膜之大小或重複單元間之距離較佳藉由利用該異向性導電膜1A連接之電子零件的凸塊寬度或凸塊間空間之大小而決定。(size of repeating unit) The size of the anisotropic conductive film of the repeating unit 5 or the distance between the repeating units is preferably determined by the bump width or the space between the bumps of the electronic components connected by the anisotropic conductive film 1A.

例如,於連接對象為非微間距之情形時,重複單元5之異向性導電膜長邊方向之大小較佳為小於凸塊寬度或凸塊間空間之任一較窄者之長度。即使設為此種大小,藉由將重複單元5重複配置,亦可使凸塊捕捉連接所需最低限度之導電粒子數,又,可減少不參與連接之導電粒子數,因此可謀求異向性導電膜之成本削減。又,藉由使形成重複單元5之外形的多角形之邊與異向性導電膜1A之短邊方向斜交,而可獲得與長尺寸之異向性導電膜之切下位置無關而穩定之連接性能。For example, when the connection object is non-fine pitch, the size of the lengthwise direction of the anisotropic conductive film of the repeating unit 5 is preferably smaller than the bump width or the length of the space between bumps, whichever is narrower. Even with this size, by arranging the repeating units 5 repeatedly, the bumps can capture the minimum number of conductive particles required for connection, and the number of conductive particles that do not participate in the connection can be reduced, so that anisotropy can be achieved Cost reduction of conductive film. In addition, by making the sides of the polygon forming the outer shape of the repeating unit 5 obliquely cross the short-side direction of the anisotropic conductive film 1A, it is possible to obtain a stable operation regardless of the cutting position of the long-sized anisotropic conductive film. connection performance.

連接對象為非微間距之情形時之異向性導電膜長邊方向上的鄰接之重複單元5、5B之距離較佳較藉由該異向性導電膜連接之電子零件之凸塊間空間更短。When the connection object is non-fine pitch, the distance between the adjacent repeating units 5 and 5B in the longitudinal direction of the anisotropic conductive film is preferably greater than the space between the bumps of the electronic parts connected by the anisotropic conductive film. short.

另一方面,於連接對象為微間距之情形時,較佳將異向性導電膜長邊方向之重複單元5、5B之大小設為橫跨凸塊間空間之大小。On the other hand, when the connection object is a fine pitch, it is preferable to set the size of the repeating units 5 and 5B in the longitudinal direction of the anisotropic conductive film to the size across the space between bumps.

再者,關於微間距與非微間距之邊界,作為一例,可將凸塊寬度未達30 μm設為微間距,將30 μm以上設為非微間距。In addition, regarding the boundary between a fine pitch and a non-fine pitch, as an example, a bump width of less than 30 μm can be made a fine pitch, and 30 μm or more can be made a non-fine pitch.

於以上述方式根據連接對象決定重複單元5之大小時,構成重複單元5之導電粒子數較佳設為5個以上,更佳為10個以上,進而較佳為20個以上。其原因在於:由於通常較佳於藉由異向性導電連接而連接之相對向之端子間捕捉3個以上、尤其是10個以上之導電粒子,因此於重複單元被夾持於相對向之端子間時,可根據一個重複單元之壓痕確認捕捉到此種數量之導電粒子。When the size of the repeating unit 5 is determined according to the connection object as described above, the number of conductive particles constituting the repeating unit 5 is preferably 5 or more, more preferably 10 or more, and still more preferably 20 or more. The reason for this is that it is generally preferable to trap 3 or more, especially 10 or more conductive particles between the opposite terminals connected by anisotropic conductive connection, so that the repeating unit is clamped to the opposite terminal. Over time, it can be confirmed that this amount of conductive particles is captured according to the indentation of one repeating unit.

(重複單元之具體變化態樣) 於本發明中,重複單元5中之導電粒子2之配置,或重複單元5之縱橫之重複間距可根據作為異向性導電連接之連接對象的端子之形狀或端子之間距而適當變更。因此,與將導電粒子2設為簡單的晶格狀之排列之情形相比,異向性導電膜整體可以較少之導電粒子數達成較高之捕捉性。(The specific variation of the repeating unit) In the present invention, the arrangement of the conductive particles 2 in the repeating unit 5 or the repeating pitch of the repeating unit 5 in the vertical and horizontal directions can be appropriately changed according to the shape of the terminal to be connected to the anisotropic conductive connection or the distance between the terminals. Therefore, compared with the case where the conductive particles 2 are arranged in a simple lattice shape, the entire anisotropic conductive film can achieve high capture performance with a small number of conductive particles.

例如,除了圖1A所示之重複態樣以外,亦可如圖2所示之異向性導電膜1B般,將重複單元5以交錯排列狀重複。於交錯排列中,電子零件之異向性導電連接時的樹脂流動對導電粒子之影響於位於交錯排列之中央部之凸塊及位於外側之凸塊不同,位於交錯排列之中央部之凸塊與位於外側之凸塊中短路風險亦不同,因此可適當變更重複單元5之形狀而調整樹脂流動之流向。For example, in addition to the repeating state shown in FIG. 1A , the repeating units 5 may be repeated in a staggered arrangement like the anisotropic conductive film 1B shown in FIG. 2 . In the staggered arrangement, the effect of the resin flow on the conductive particles during the anisotropic conductive connection of electronic parts is different between the bumps located in the center of the staggered arrangement and the bumps located on the outside, the bumps located in the center of the staggered arrangement and The risk of short circuit in the bumps located on the outside is also different, so the shape of the repeating unit 5 can be appropriately changed to adjust the flow direction of the resin.

重複單元5中之導電粒子2之配置亦可根據作為異向性導電連接之連接對象的端子之形狀或端子之間距而適當變更。例如,可如圖3所示之異向性導電膜1C般,逐漸增加及減少一個重複單元5內構成導電粒子列2p之導電粒子數,亦可隨著重複單元5之重複而重複配置單獨之導電粒子2s。進而,於一個重複單元內並列之3列導電粒子列中,可使構成中央之導電粒子列的導電粒子數多於或少於構成兩側之導電粒子列的導電粒子數。例如,如圖4所示之異向性導電膜1D般,於各重複單元5中並列有沿異向性導電膜之長邊方向排列4個導電粒子2之導電粒子列2p、排列2個導電粒子2之導電粒子列2q、排列3個導電粒子2之導電粒子列2r及1個導電粒子2s。若增減於一個重複單元內並列之導電粒子列中的導電粒子之個數,則該重複單元之外形成為複雜之多角形狀,而變得容易應對放射狀之凸塊排列(所謂扇出凸塊)之連接。以構成該重複單元的導電粒子列之導電粒子數表示一個重複單元中之導電粒子之配置,例如,於將圖4所示之重複單元表示為[4-2-3-1]時,作為該重複單元之變化例,可列舉[4-1-4-1]、[4-3-1-2]、[3-2-2-1]、[4-1-2-3]、[4-2-1-3]等。亦可將該等組合而重複配置。例如可列舉[4-2-3-1-2-1-4-3]。The arrangement of the conductive particles 2 in the repeating unit 5 can also be appropriately changed according to the shape of the terminal to be connected to the anisotropic conductive connection or the distance between the terminals. For example, like the anisotropic conductive film 1C shown in FIG. 3 , the number of conductive particles constituting the conductive particle row 2p in one repeating unit 5 can be gradually increased and decreased, or the number of separate conductive particles can be repeatedly arranged as the repeating unit 5 repeats. Conductive particles 2s. Furthermore, in the three parallel rows of conductive particle rows in one repeating unit, the number of conductive particles constituting the conductive particle row in the center can be more or less than the number of conductive particles constituting the conductive particle rows on both sides. For example, like the anisotropic conductive film 1D shown in FIG. 4 , in each repeating unit 5 , a conductive particle row 2p in which four conductive particles 2 are arranged in the longitudinal direction of the anisotropic conductive film are arranged in parallel, and two conductive particles are arranged in parallel. The conductive particle row 2q of the particle 2, the conductive particle row 2r of three conductive particles 2, and one conductive particle 2s are arranged. If the number of conductive particles in a row of conductive particles arranged in a repeating unit is increased or decreased, the repeating unit becomes a complex polygonal shape, and it becomes easier to deal with a radial bump arrangement (so-called fan-out bumps). ) connection. The arrangement of the conductive particles in a repeating unit is represented by the number of conductive particles in the conductive particle row constituting the repeating unit. For example, when the repeating unit shown in FIG. 4 is represented as [4-2-3-1], the Variations of repeating units include [4-1-4-1], [4-3-1-2], [3-2-2-1], [4-1-2-3], [4] -2-1-3] etc. These combinations can also be repeatedly configured. For example, [4-2-3-1-2-1-4-3] is mentioned.

又,一個導電粒子列內之導電粒子間距離於一個重複單元內並列之導電粒子列彼此間可相同亦可不同。例如,可如圖5所示之異向性導電膜1E般,將重複單元5之外形設為菱形,並於其中央部配置導電粒子2。於該重複單元中,由5個導電粒子構成之導電粒子列2m、由2個導電粒子構成之導電粒子列2n、由3個導電粒子構成之導電粒子列2o、由2個導電粒子構成之導電粒子列2p及由5個導電粒子構成之導電粒子列2q並列,導電粒子列2m、2q中之導電粒子間距離、導電粒子列2n、2p中之導電粒子間距離及導電粒子列2o中之導電粒子間距離互不相同。於將其設為上述之記法之[4-3-2-1]之情形時,亦可為除去3之中心之導電粒子而成之排列。其原因在於可進一步降低短路產生風險。In addition, the distance between the conductive particles in one conductive particle row may be the same or different from each other in the parallel conductive particle rows in one repeating unit. For example, like the anisotropic conductive film 1E shown in FIG. 5 , the outer shape of the repeating unit 5 may be a rhombus, and the conductive particles 2 may be arranged in the center portion thereof. In this repeating unit, the conductive particle array 2m composed of 5 conductive particles, the conductive particle array 2n composed of 2 conductive particles, the conductive particle array 2o composed of 3 conductive particles, and the conductive particle array composed of 2 conductive particles. The particle array 2p and the conductive particle array 2q composed of 5 conductive particles are juxtaposed, the distance between the conductive particles in the conductive particle arrays 2m and 2q, the distance between the conductive particles in the conductive particle arrays 2n and 2p, and the conductive particles in the conductive particle array 2o. The distances between particles are different from each other. In the case of [4-3-2-1] of the above-mentioned notation, it may be an arrangement in which the conductive particles in the center of 3 are removed. The reason for this is that the risk of short-circuit generation can be further reduced.

於上述異向性導電膜1A、1B、1C、1D、1E中,重複單元5、5B內之導電粒子2之配置係存在於六方晶格之晶格點,但只要導電粒子列2p並列,則亦可如圖6所示之異向性導電膜1F般設為基於正方晶格之排列。In the above-mentioned anisotropic conductive films 1A, 1B, 1C, 1D, and 1E, the arrangement of the conductive particles 2 in the repeating units 5 and 5B exists at the lattice points of the hexagonal lattice, but as long as the conductive particle rows 2p are juxtaposed, the The anisotropic conductive film 1F shown in FIG. 6 may also be arranged based on a square lattice.

圖7所示之異向性導電膜1G係將由2列導電粒子列2p、2q構成之重複單元5及使該重複單元5之導電粒子的排列軸旋轉60°而成之重複單元5B分別重複配置於膜整個面而成者。如上所述,亦可併用某重複單元與使其旋轉特定角度而成之重複單元。In the anisotropic conductive film 1G shown in FIG. 7, a repeating unit 5 composed of two rows of conductive particle rows 2p and 2q and a repeating unit 5B formed by rotating the arrangement axis of the conductive particles of the repeating unit 5 by 60° are arranged repeatedly, respectively. Formed on the entire surface of the membrane. As described above, a certain repeating unit and a repeating unit obtained by rotating it at a specific angle may be used in combination.

作為重複單元之形狀,可將依序連結形成其外形之導電粒子形成之多角形設為正多角形。由此導電粒子之配置之識別變得容易,故而較佳。於該情形時,形成重複單元之各導電粒子亦可不存在於六方晶格或正方晶格之晶格點。例如,可如圖8所示之異向性導電膜1H般將重複單元5之外形形成為正八角形。於該情形時,形成重複單元之外形的導電粒子係如同圖中虛線所示般配置於使縱橫排列正八角形而鄰接之正八角形彼此之邊重合之晶格的該正八角形之頂點。亦可以同樣之方式將導電粒子配置於正12角形,或其以上之正多角形體之頂點。再者,亦可藉由將導電粒子配置於六方晶格或正方晶格之晶格點而形成外形成為八角形以上之大致正多角形之重複單元。例如,圖9所示之異向性導電膜1I之重複單元5係由配置於正方晶格之晶格點上之導電粒子2形成,而成為異向性導電膜之長邊方向及短邊方向均對稱之八角形。藉此,可容易地識別導電粒子之配置。As the shape of the repeating unit, a polygon formed by sequentially connecting conductive particles to form the outer shape can be a regular polygon. Thereby, the identification of the arrangement|positioning of a conductive particle becomes easy, and it is preferable. In this case, each conductive particle forming the repeating unit may not exist in the lattice points of the hexagonal lattice or the square lattice. For example, the outer shape of the repeating unit 5 can be formed into a regular octagon like the anisotropic conductive film 1H shown in FIG. 8 . In this case, the conductive particles forming the outer shape of the repeating unit are arranged at the vertices of the regular octagon of the lattice in which the sides of the adjacent regular octagons are aligned vertically and horizontally, as shown by the dotted line in the figure. In the same way, the conductive particles can also be arranged at the vertices of a regular 12-sided polygon or a regular polygon above it. Furthermore, by arranging conductive particles at lattice points of a hexagonal lattice or a square lattice, a repeating unit having an outer shape of an octagonal or more substantially regular polygon may be formed. For example, the repeating unit 5 of the anisotropic conductive film 1I shown in FIG. 9 is formed by the conductive particles 2 arranged on the lattice points of the square lattice, and becomes the longitudinal direction and the short side direction of the anisotropic conductive film Symmetrical octagon. Thereby, the arrangement|positioning of an electroconductive particle can be recognized easily.

又,重複單元中並列之導電粒子列彼此可未必平行,亦可以放射狀排列。例如,可如圖10所示之異向性導電膜1J般,沿縱橫方向重複配置具有以放射狀排列之導電粒子列2m、2n、2o、2p、2q之重複單元5。於該情形時,導電粒子2亦可不存在於六方晶格或正方晶格之晶格點。In addition, the rows of conductive particles arranged in the repeating unit may not necessarily be parallel to each other, but may also be arranged radially. For example, like the anisotropic conductive film 1J shown in FIG. 10 , repeating units 5 having conductive particle rows 2m, 2n, 2o, 2p, and 2q arranged radially can be repeatedly arranged in the vertical and horizontal directions. In this case, the conductive particles 2 may not exist in the lattice points of the hexagonal lattice or the square lattice.

(重複單元之邊之朝向) 上述異向性導電膜中,例如於圖1A所示之異向性導電膜1A中,依序連結形成重複單元5之外形的導電粒子之中心形成之三角形5x之各邊與異向性導電膜1A之長邊方向或短邊方向斜交。藉此,導電粒子2a之異向性導電膜之長邊方向的外切線L1貫穿導電粒子2b,該導電粒子2b於異向性導電膜之長邊方向與該導電粒子2a鄰接。又,導電粒子2a之異向性導電膜之短邊方向的外切線L2貫穿導電粒子2c,該導電粒子2c於異向性導電膜之短邊方向與該導電粒子2a鄰接。由於通常於異向性導電連接時,異向性導電膜之長邊方向成為凸塊之短邊方向,因此若重複單元5之多角形5x之邊與異向性導電膜1A之長邊方向或短邊方向斜交,則可防止複數個導電粒子沿凸塊之緣而排列成直線狀,藉此可避免排列成直線狀之複數個導電粒子一齊脫離端子而變得無助於導通之現象,故而可提高導電粒子2之捕捉性。(the direction of the edge of the repeating unit) In the above-mentioned anisotropic conductive film, for example, in the anisotropic conductive film 1A shown in FIG. 1A , each side of the triangle 5x formed by the center of the conductive particles forming the outer shape of the repeating unit 5 is sequentially connected to the anisotropic conductive film. The long-side direction or short-side direction of 1A is oblique. Thereby, the circumscribed line L1 of the longitudinal direction of the anisotropic conductive film of the conductive particle 2a penetrates the conductive particle 2b, and the conductive particle 2b is adjacent to the conductive particle 2a in the longitudinal direction of the anisotropic conductive film. Moreover, the outer tangent L2 of the short-side direction of the anisotropic conductive film of the conductive particle 2a penetrates the conductive particle 2c, and the conductive particle 2c is adjacent to the conductive particle 2a in the short-side direction of the anisotropic conductive film. Since the long-side direction of the anisotropic conductive film is usually the short-side direction of the bump during anisotropic conductive connection, if the side of the polygon 5x of the repeating unit 5 and the long-side direction of the anisotropic conductive film 1A or The diagonal direction of the short side can prevent a plurality of conductive particles from being arranged in a straight line along the edge of the bump, thereby avoiding the phenomenon that a plurality of conductive particles arranged in a straight line are separated from the terminal at the same time and become unhelpful for conduction. Therefore, the capture property of the conductive particle 2 can be improved.

再者,於異向性導電連接時異向性導電膜之長邊方向成為凸塊之短邊方向之情形時,由形成重複單元5之外形的導電粒子形成之多角形5x,可未必其全部邊與異向性導電膜之長邊方向或短邊方向斜交,就導電粒子之捕捉性之方面而言,較佳為2邊以上、更佳為3邊以上與異向性導電膜之長邊方向或短邊方向斜交為佳。Furthermore, when the long-side direction of the anisotropic conductive film becomes the short-side direction of the bump during the anisotropic conductive connection, the polygon 5x formed by the conductive particles forming the outer shape of the repeating unit 5 may not necessarily be all of the polygons 5x. The sides obliquely intersect with the long-side direction or short-side direction of the anisotropic conductive film, and in terms of the capture property of the conductive particles, preferably two or more sides, more preferably three or more sides and the length of the anisotropic conductive film It is preferable to cross the side direction or the short side direction obliquely.

另一方面,於凸塊之排列圖案為放射狀之情形時(所謂扇出凸塊),較佳形成重複單元之多角形具有異向性導電膜之長邊方向或短邊方向之邊。即,為了實現應連接之凸塊彼此即使設置有凸塊之基材熱膨脹亦不會錯位,而存在使凸塊之排列圖案成為放射狀之情形(例如,日本專利特開2007-19550號公報、2015-232660號公報等),於該情形時,各凸塊之長邊方向與異向性導電膜之長邊方向形成之角度逐漸變化。因此,即使不使重複單元5之多角形之邊與異向性導電膜之長邊方向或短邊方向斜交,重複單元5、5B之多角形之邊亦與呈放射狀排列之各凸塊之長邊方向之邊緣斜交。因此,可避免於異向性導電連接時附於凸塊之緣的多數導電粒子不被該凸塊捕捉,導致導電粒子之捕捉性降低之現象。另一方面,凸塊之放射狀之排列圖案通常形成為左右對稱。因此,就藉由異向性導電連接後之壓痕使連接狀態之良好與否之確認變得容易之方面而言,較佳形成重複單元5之外形的多角形具有異向性導電膜之長邊方向或短邊方向之邊。因此,例如於將重複單元設為與圖1A所示之異向性導電膜1A同樣之三角形之情形時,較佳如圖11所示之異向性導電膜1K般,以形成重複單元5之外形的三角形之1邊5a與異向性導電膜之長邊方向或短邊方向平行之方式配置。又,亦可如圖8所示之異向性導電膜1H之重複單元5般,使其具有與異向性導電膜之長邊方向平行之邊5a及與短邊方向平行之邊5b。On the other hand, when the arrangement pattern of the bumps is radial (so-called fan-out bumps), it is preferable that the polygon in which the repeating unit is formed has a side in the long-side direction or the short-side direction of the anisotropic conductive film. That is, in order to realize that the bumps to be connected will not be displaced even if the substrate on which the bumps are provided is thermally expanded, there is a case where the arrangement pattern of the bumps is made radial (for example, Japanese Patent Laid-Open No. 2007-19550, 2015-232660, etc.), in this case, the angle formed by the longitudinal direction of each bump and the longitudinal direction of the anisotropic conductive film gradually changes. Therefore, even if the sides of the polygon of the repeating unit 5 and the long-side direction or the short-side direction of the anisotropic conductive film are not obliquely crossed, the sides of the polygons of the repeating units 5 and 5B are also radially arranged with the bumps. The edges in the long-side direction are crossed obliquely. Therefore, during the anisotropic conductive connection, most of the conductive particles attached to the edges of the bumps are not captured by the bumps, and the phenomenon that the captureability of the conductive particles is reduced can be avoided. On the other hand, the radial arrangement pattern of the bumps is usually formed to be bilaterally symmetrical. Therefore, it is preferable that the polygonal shape forming the outer shape of the repeating unit 5 has the length of the anisotropic conductive film in terms of making it easy to confirm whether the connection state is good or not by the indentation after the anisotropic conductive connection. The edge in the side direction or the short side direction. Therefore, for example, when the repeating unit is formed into the same triangular shape as the anisotropic conductive film 1A shown in FIG. One side 5a of the triangular shape of the outer shape is arranged so as to be parallel to the longitudinal direction or the short side direction of the anisotropic conductive film. Moreover, like the repeating unit 5 of the anisotropic conductive film 1H shown in FIG. 8, it is also possible to have a side 5a parallel to the longitudinal direction of the anisotropic conductive film and a side 5b parallel to the short side direction.

再者,作為本發明中之導電粒子之配置,並不限定於圖示之重複單元之排列。例如,亦可為使圖示之排列傾斜而成者。於該情形時,亦包括使其傾斜90°而成者、即交換膜之長邊方向與短邊方向而成之態樣。又,亦可為變更重複單元5之間隔或重複單元內之導電粒子之間隔而成者。Furthermore, the arrangement of the conductive particles in the present invention is not limited to the arrangement of the repeating units shown in the figure. For example, the arrangement of the illustration may be inclined. In this case, the aspect formed by inclining at 90°, that is, the long-side direction and the short-side direction of the exchange membrane is also included. Moreover, the space|interval of the repeating unit 5 or the space|interval of the electroconductive particle in a repeating unit may be changed.

<導電粒子之最接近粒子間距離> 導電粒子之最接近粒子間距離於重複單元5內鄰接之導電粒子間及重複單元5間鄰接之導電粒子間,均較佳為平均導電粒徑之0.5倍以上。重複單元5間之距離較佳長於重複單元5內鄰接之導電粒子間距離。若該距離過短,則變得容易因導電粒子之相互接觸而引起短路。鄰接之導電粒子的距離之上限根據凸塊形狀或凸塊間距而決定。例如,於凸塊寬度為200 μm、凸塊間空間為200 μm之情形時,於使導電粒子於凸塊寬度或凸塊間空間之任一者中存在最少1個時,導電粒子間距離設為未達400 μm。就使導電粒子之捕捉性變得確實之方面而言,較佳設為未達200 μm。<Distance between closest particles of conductive particles> The distance between the nearest particles of the conductive particles is preferably 0.5 times or more of the average conductive particle size between adjacent conductive particles in the repeating units 5 and between adjacent conductive particles between the repeating units 5 . The distance between the repeating units 5 is preferably longer than the distance between adjacent conductive particles in the repeating unit 5 . When the distance is too short, short-circuiting is likely to occur due to mutual contact of conductive particles. The upper limit of the distance between adjacent conductive particles is determined according to the shape of the bumps or the pitch of the bumps. For example, when the bump width is 200 μm and the inter-bump space is 200 μm, when there is at least one conductive particle in either the bump width or the inter-bump space, the distance between the conductive particles is set to is less than 400 μm. It is preferable to set it as less than 200 micrometers from the point which makes the capture|acquisition property of electroconductive particle reliable.

<導電粒子之個數密度> 導電粒子之個數密度就抑制異向性導電膜之製造成本之方面,及避免於異向性導電連接時使用之按壓夾具必需之推力過大之方面而言,於導電粒子之平均粒徑未達10 μm之情形時,較佳為50000個/mm2 以下,更佳為35000個/mm2 以下,進而較佳為30000個/mm2 以下。另一方面,若導電粒子之個數密度過少,則有因端子未充分捕捉導電粒子導致導通不良之虞,故而較佳為300個/mm2 以上,更佳為500個/mm2 以上,進而較佳為800個/mm2 以上。<Number Density of Conductive Particles> The number density of conductive particles is in terms of suppressing the manufacturing cost of the anisotropic conductive film and avoiding excessive thrust necessary for the pressing jig used in the anisotropic conductive connection. When the average particle diameter of the conductive particles is less than 10 μm, it is preferably 50,000 pieces/mm 2 or less, more preferably 35,000 pieces/mm 2 or less, and still more preferably 30,000 pieces/mm 2 or less. On the other hand, if the number density of the conductive particles is too small, there is a possibility of poor conduction due to insufficient capture of the conductive particles in the terminals. Therefore, it is preferably 300 particles/mm 2 or more, more preferably 500 particles/mm 2 or more, and further It is preferably 800 pieces/mm 2 or more.

又,於導電粒子之平均粒徑為10 μm以上之情形時,較佳為15個/mm2 以上,更佳為50個/mm2 以上,進而更佳為160個/mm2 以上。其原因在於,若導電粒徑變大,則導電粒子之佔有面積率亦提高。就同樣之理由而言,較佳為1800個/mm2 以下,更佳為1100個/mm2 以下,進而較佳為800個/mm2 以下。再者,導電粒子之個數密度亦可局部(作為一例,200 μm×200 μm)性地偏離上述個數密度。When the average particle diameter of the conductive particles is 10 μm or more, it is preferably 15 particles/mm 2 or more, more preferably 50 particles/mm 2 or more, and still more preferably 160 particles/mm 2 or more. The reason for this is that when the conductive particle size becomes larger, the area occupied by the conductive particles also increases. For the same reason, it is preferably 1800 pieces/mm 2 or less, more preferably 1100 pieces/mm 2 or less, and still more preferably 800 pieces/mm 2 or less. Furthermore, the number density of the conductive particles may be partially (for example, 200 μm×200 μm) deviated from the above-mentioned number density.

<絕緣性樹脂黏合劑> 作為絕緣性樹脂黏合劑3,可適當選擇公知之異向性導電膜中用作絕緣性樹脂黏合劑之熱聚合性組成物、光聚合性組成物、光熱併用聚合性組成物等而使用。其中,作為熱聚合性組成物,可列舉含有丙烯酸酯化合物與熱自由基聚合起始劑之熱自由基聚合性樹脂組成物、含有環氧化合物與熱陽離子聚合起始劑之熱陽離子聚合性樹脂組成物、含有環氧化合物與熱陰離子聚合起始劑之熱陰離子聚合性樹脂組成物等,作為光聚合性組成物,可列舉含有丙烯酸酯化合物與光自由基聚合起始劑之光自由基聚合性樹脂組成物等。只要不特別產生問題,則亦可併用多種聚合性組成物。作為併用例,可列舉熱陽離子聚合性組成物與熱自由基聚合性組成物之併用等。<Insulating resin adhesive> As the insulating resin adhesive 3, a thermally polymerizable composition, a photopolymerizable composition, a photothermal combined polymerizable composition, etc., which are used as insulating resin adhesives among known anisotropic conductive films, can be appropriately selected and used. Among them, the thermally polymerizable composition includes a thermally polymerizable resin composition containing an acrylate compound and a thermal radical polymerization initiator, and a thermally cationic polymerizable resin containing an epoxy compound and a thermal cationic polymerization initiator. Compositions, thermal anionic polymerizable resin compositions containing epoxy compounds and thermal anionic polymerization initiators, etc. Examples of photopolymerizable compositions include photo-radical polymerization containing acrylate compounds and photo-radical polymerization initiators resin composition, etc. As long as there is no particular problem, a plurality of polymerizable compositions may be used in combination. As an example of combined use, the combined use of a thermal cationically polymerizable composition and a thermally radically polymerizable composition, etc. are mentioned.

此處,作為光聚合起始劑,亦可含有對波長不同之光進行反應之多種起始劑。藉此,可區分使用異向性導電膜之製造時構成絕緣性樹脂層的樹脂之光硬化與異向性連接時用以將電子零件彼此接著的樹脂之光硬化中使用之波長。Here, as a photopolymerization initiator, a plurality of initiators that react with light having different wavelengths may be contained. Thereby, the wavelength used for the photocuring of the resin constituting the insulating resin layer during the production of the anisotropic conductive film and the photocuring of the resin for bonding the electronic parts to each other during the anisotropic connection can be distinguished.

於使用光聚合性組成物形成絕緣性樹脂黏合劑3之情形時,藉由異向性導電膜之製造時之光硬化,可使絕緣性樹脂黏合劑3所含的光聚合性化合物之全部或一部分光硬化。藉由該光硬化,可保持或固定絕緣性樹脂黏合劑3中的導電粒子2之配置,而期待短路之抑制與捕捉之提高。又,藉由調整該光硬化之條件,可調整異向性導電膜之製造步驟中之絕緣性樹脂層的黏度。When the insulating resin adhesive 3 is formed using a photopolymerizable composition, all or all of the photopolymerizable compounds contained in the insulating resin adhesive 3 can be cured by light curing during the production of the anisotropic conductive film. Partially photohardened. By this photocuring, the arrangement of the conductive particles 2 in the insulating resin adhesive 3 can be maintained or fixed, and the suppression of short circuits and the improvement of trapping are expected. Moreover, the viscosity of the insulating resin layer in the manufacturing process of anisotropic conductive film can be adjusted by adjusting the conditions of this photohardening.

絕緣性樹脂黏合劑3中之光聚合性化合物之摻合量較佳為30質量%以下,更佳為10質量%以下,更佳為未達2質量%。其原因在於,若光聚合性化合物過多,則異向性導電連接時之壓入施加之推力會增加。The blending amount of the photopolymerizable compound in the insulating resin adhesive 3 is preferably 30% by mass or less, more preferably 10% by mass or less, and more preferably less than 2% by mass. The reason for this is that when there are too many photopolymerizable compounds, the thrust applied by pressing at the time of anisotropic conductive connection increases.

另一方面,熱聚合性組成物含有熱聚合性化合物與熱聚合起始劑,作為該熱聚合性化合物,可使用亦作為光聚合性化合物發揮功能者。又,於熱聚合性組成物中亦可除熱聚合性化合物以外另行含有光聚合性化合物,並且含有光聚合性起始劑。較佳除了熱聚合性化合物以外另行含有光聚合性化合物與光聚合起始劑。例如,使用熱陽離子系聚合起始劑作為熱聚合起始劑,使用環氧樹脂作為熱聚合性化合物,使用光自由基起始劑作為光聚合起始劑,使用丙烯酸酯化合物作為光聚合性化合物。亦可於絕緣性樹脂黏合劑3中含有該等聚合性組成物之硬化物。On the other hand, the thermally polymerizable composition contains a thermally polymerizable compound and a thermally polymerizable initiator, and as the thermally polymerizable compound, one that also functions as a photopolymerizable compound can be used. Moreover, in addition to a thermally polymerizable compound, a photopolymerizable compound may be contained separately in a thermopolymerizable composition, and a photopolymerizable initiator may be contained. It is preferable to contain a photopolymerizable compound and a photopolymerization initiator separately in addition to a thermopolymerizable compound. For example, a thermal cationic polymerization initiator is used as the thermal polymerization initiator, an epoxy resin is used as the thermal polymerizable compound, a photoradical initiator is used as the photopolymerization initiator, and an acrylate compound is used as the photopolymerizable compound . Cured products of these polymerizable compositions may also be contained in the insulating resin adhesive 3 .

作為用作熱或光聚合性化合物之丙烯酸酯化合物,可使用以往公知之熱聚合型(甲基)丙烯酸酯單體。例如,可使用單官能(甲基)丙烯酸酯系單體、二官能以上之多官能(甲基)丙烯酸酯系單體。As the acrylate compound used as the thermally or photopolymerizable compound, a conventionally known thermally polymerizable (meth)acrylate monomer can be used. For example, a monofunctional (meth)acrylate-based monomer, or a polyfunctional (meth)acrylate-based monomer having a difunctional or higher level can be used.

又,用作聚合性化合物之環氧化合物係形成三維網狀結構,且賦予良好之耐熱性、接著性者,較佳併用固體環氧樹脂與液狀環氧樹脂。此處,所謂固體環氧樹脂意指於常溫為固體之環氧樹脂。又,所謂液狀環氧樹脂意指於常溫為液狀之環氧樹脂。又,所謂常溫意指JIS Z 8703規定之5~35℃之溫度範圍。於本發明中可併用2種以上之環氧化合物。又,除了環氧化合物以外,亦可併用氧環丁烷(oxetane)化合物。Moreover, the epoxy compound used as a polymerizable compound forms a three-dimensional network structure, and provides favorable heat resistance and adhesiveness, and it is preferable to use a solid epoxy resin and a liquid epoxy resin together. Here, the so-called solid epoxy resin means an epoxy resin which is solid at normal temperature. In addition, the liquid epoxy resin means the epoxy resin which is liquid at normal temperature. In addition, the normal temperature means the temperature range of 5-35 degreeC prescribed|regulated by JIS Z 8703. In the present invention, two or more epoxy compounds may be used in combination. Moreover, you may use together an oxetane compound other than an epoxy compound.

作為固體環氧樹脂,只要與液狀環氧樹脂相容,於常溫為固體,則無特別限定,可列舉:雙酚A型環氧樹脂、雙酚F型環氧樹脂、多官能型環氧樹脂、二環戊二烯型環氧樹脂、酚醛清漆苯酚型環氧樹脂、聯苯型環氧樹脂、萘型環氧樹脂等,可自該等中單獨使用1種,或可組合2種以上而使用。該等中,較佳使用雙酚A型環氧樹脂。The solid epoxy resin is not particularly limited as long as it is compatible with the liquid epoxy resin and is solid at room temperature, and examples thereof include bisphenol A type epoxy resin, bisphenol F type epoxy resin, and polyfunctional epoxy resin. Resins, dicyclopentadiene-type epoxy resins, novolac-phenol-type epoxy resins, biphenyl-type epoxy resins, naphthalene-type epoxy resins, etc. may be used singly or in combination of two or more and use. Among these, bisphenol A type epoxy resins are preferably used.

作為液狀環氧樹脂,只要於常溫為液狀,則無特別限定,可列舉:雙酚A型環氧樹脂、雙酚F型環氧樹脂、酚醛清漆苯酚型環氧樹脂、萘型環氧樹脂等,可自該等中單獨使用1種,或可組合2種以上而使用。尤其是就膜之黏性、柔軟性等觀點而言,較佳使用雙酚A型環氧樹脂。The liquid epoxy resin is not particularly limited as long as it is liquid at room temperature, and examples thereof include bisphenol A type epoxy resin, bisphenol F type epoxy resin, novolak phenol type epoxy resin, and naphthalene type epoxy resin. Resin etc. may be used individually by 1 type from these, or may be used in combination of 2 or more types. In particular, it is preferable to use a bisphenol A type epoxy resin from the viewpoints of the viscosity and flexibility of the film.

熱聚合起始劑中,作為熱自由基聚合起始劑,例如可列舉有機過氧化物、偶氮系化合物等。尤其可較佳地使用不會產生成為氣泡之原因之氮氣的有機過氧化物。Among the thermal polymerization initiators, the thermal radical polymerization initiators include, for example, organic peroxides, azo-based compounds, and the like. In particular, organic peroxides which do not generate nitrogen gas which causes bubbles can be preferably used.

熱自由基聚合起始劑之使用量若過少,則變得硬化不良,若過多,則製品壽命(Life)降低,因此相對於(甲基)丙烯酸酯化合物100質量份,較佳為2~60質量份,更佳為5~40質量份。If the usage-amount of the thermal radical polymerization initiator is too small, the curing will be poor, and if it is too large, the product life (Life) will be reduced, so it is preferably 2 to 60 parts by mass relative to 100 parts by mass of the (meth)acrylate compound. parts by mass, more preferably 5 to 40 parts by mass.

作為熱陽離子聚合起始劑,可採用作為環氧化合物之熱陽離子聚合起始劑而公知者,例如可使用藉由熱而產生酸之錪鹽、鋶鹽、鏻鹽、二茂鐵類等,尤其可較佳地使用對溫度表現出良好之潛伏性的芳香族鋶鹽。As the thermal cationic polymerization initiator, those known as thermal cationic polymerization initiators for epoxy compounds can be used. In particular, aromatic perylene salts exhibiting good latency to temperature can be preferably used.

熱陽離子聚合起始劑之使用量過少亦有變得硬化不良之傾向,過多亦有製品壽命降低之傾向,因此相對於環氧化合物100質量份,較佳為2~60質量份,更佳為5~40質量份。If the usage amount of the thermal cationic polymerization initiator is too small, the curing tends to be poor, and if it is too large, the product life tends to be shortened. Therefore, it is preferably 2 to 60 parts by mass, more preferably 100 parts by mass of the epoxy compound. 5 to 40 parts by mass.

作為熱陰離子聚合起始劑,可使用通常使用之公知者。例如可列舉:有機酸二醯肼、二氰二胺、胺化合物、聚醯胺胺化合物、氰酸酯化合物、酚樹脂、酸酐、羧酸、三級胺化合物、咪唑、路易斯酸、布忍斯特酸鹽、聚硫醇系硬化劑、脲樹脂、三聚氰胺樹脂、異氰酸酯化合物、封端異氰酸酯化合物等,可自該等中單獨使用1種,或可組合2種以上而使用。該等中,較佳使用以咪唑改質體作為核,並且以聚胺酯被覆其表面而成之微膠囊型潛伏性硬化劑。As the thermal anionic polymerization initiator, publicly known ones that are generally used can be used. For example, organic acid dihydrazine, dicyandiamide, amine compounds, polyamide amine compounds, cyanate ester compounds, phenol resins, acid anhydrides, carboxylic acids, tertiary amine compounds, imidazoles, Lewis acids, Brünster Acid salts, polythiol-based hardeners, urea resins, melamine resins, isocyanate compounds, blocked isocyanate compounds, and the like may be used alone or in combination of two or more. Among these, a microcapsule-type latent hardener having an imidazole modified body as a core and coating the surface thereof with polyurethane is preferably used.

較佳於熱聚合性組成物中含有膜形成樹脂。膜形成樹脂相當於例如平均分子量為10000以上之高分子量樹脂,就膜形成性之觀點而言,較佳為10000~80000左右之平均分子量。作為膜形成樹脂,可列舉:苯氧基樹脂、聚酯樹脂、聚胺酯樹脂、聚酯胺酯樹脂、丙烯酸樹脂、聚醯亞胺樹脂、丁醛樹脂等各種樹脂,該等可單獨使用,亦可組合2種以上而使用。該等中,就膜形成狀態、連接可靠性等觀點而言,較佳適宜地使用苯氧基樹脂。The film-forming resin is preferably contained in the thermally polymerizable composition. The film-forming resin corresponds to, for example, a high-molecular-weight resin having an average molecular weight of 10,000 or more, and preferably has an average molecular weight of about 10,000 to 80,000 from the viewpoint of film-forming properties. The film-forming resins include various resins such as phenoxy resins, polyester resins, polyurethane resins, polyesterurethane resins, acrylic resins, polyimide resins, butyral resins, and these may be used alone or may be used. Use in combination of two or more. Among these, from the viewpoints of film formation state, connection reliability, and the like, a phenoxy resin is preferably used.

為了調整熔融黏度,亦可於熱聚合性組成物中含有絕緣性填料。其可列舉二氧化矽粉或氧化鋁粉等。絕緣性填料之大小較佳為粒徑20~1000 nm,又,摻合量較佳相對於環氧化合物等熱聚合性化合物(光聚合性化合物)100質量份而設為5~50質量份。In order to adjust the melt viscosity, an insulating filler may be contained in the thermopolymerizable composition. It can be exemplified by silica powder, alumina powder, and the like. The size of the insulating filler is preferably 20 to 1000 nm in particle diameter, and the blending amount is preferably 5 to 50 parts by mass relative to 100 parts by mass of a thermopolymerizable compound (photopolymerizable compound) such as an epoxy compound.

進而,亦可含有與上述絕緣性填料不同之填充劑、軟化劑、促進劑、抗老化劑、著色劑(顏料、染料)、有機溶劑、離子捕捉劑(ion catcher agent)等。Furthermore, a filler, a softener, an accelerator, an antiaging agent, a colorant (pigment, dye), an organic solvent, an ion catcher agent, etc., which are different from the above-mentioned insulating fillers may be contained.

又,亦可視需要摻合應力緩和劑、矽烷偶合劑、無機填料等。作為應力緩和劑,可列舉:氫化苯乙烯-丁二烯嵌段共聚物、氫化苯乙烯-異戊二烯嵌段共聚物等。又,作為矽烷偶合劑,可列舉:環氧系、甲基丙烯醯氧基系、胺基系、乙烯基系、巰基/硫醚系、醯脲(ureide)系等。又,作為無機填料,可列舉:二氧化矽、滑石、氧化鈦、碳酸鈣、氧化鎂等。Moreover, a stress relaxation agent, a silane coupling agent, an inorganic filler, etc. may also be mix|blended as needed. As a stress relaxation agent, a hydrogenated styrene-butadiene block copolymer, a hydrogenated styrene-isoprene block copolymer, etc. are mentioned. Moreover, as a silane coupling agent, an epoxy type, a methacryloyloxy type, an amino type, a vinyl type, a mercapto/thioether type|system|group, a ureide type|system|group, etc. are mentioned. Moreover, as an inorganic filler, silica, talc, titanium oxide, calcium carbonate, magnesium oxide, etc. are mentioned.

絕緣性樹脂黏合劑3可藉由利用塗佈法將含有上述樹脂之塗層組成物成膜並加以乾燥,或進而進行硬化,或者預先利用公知之手法進行膜化而形成。絕緣性樹脂黏合劑3亦可藉由視需要將樹脂層進行積層而獲得。又,絕緣性樹脂黏合劑3較佳形成於經剝離處理之聚對酞酸乙二酯膜等剝離膜上。The insulating resin adhesive 3 can be formed by forming a coating composition containing the above-mentioned resin into a film by a coating method, drying it, further curing it, or forming a film by a known method in advance. The insulating resin adhesive 3 can also be obtained by laminating resin layers as necessary. In addition, the insulating resin adhesive 3 is preferably formed on a release film such as a polyethylene terephthalate film subjected to release treatment.

(絕緣性樹脂黏合劑之黏度) 絕緣性樹脂黏合劑3之最低熔融黏度可根據異向性導電膜之製造方法等而適當決定。例如,於作為異向性導電膜之製造方法而進行以特定之配置將導電粒子保持於絕緣性樹脂黏合劑之表面,並將該導電粒子壓入至絕緣性樹脂黏合劑中之方法時,就使絕緣性樹脂黏合劑實現膜成形之方面而言,較佳為將樹脂之最低熔融黏度設為1100 Pa・s以上。又,如下文所述,就如圖12或圖13所示般於壓入至絕緣性樹脂黏合劑3中之導電粒子2的露出部分之周圍形成凹部3b,或如圖14所示般於壓入至絕緣性樹脂黏合劑3中之導電粒子2的正上方形成凹部3c之方面而言,最低熔融黏度較佳為1500 Pa・s以上,更佳為2000 Pa・s以上,進而較佳為3000~15000 Pa・s,尤佳為3000~10000 Pa・s。關於該最低熔融黏度,作為一例,可使用旋轉式流變儀(TA instrument公司製造),於升溫速度為10℃/分鐘、測量壓力為5 g之條件下保持恆定,使用直徑8 mm之測量板而求出。又,於在較佳為40~80℃、更佳為50~60℃進行將導電粒子2壓入至絕緣性樹脂黏合劑3中之步驟之情形時,就與上述同樣地形成凹部3b或3c之方面而言,於60℃之黏度之下限較佳為3000 Pa・s以上,更佳為4000 Pa・s以上,進而較佳為4500 Pa・s以上,上限較佳為20000 Pa・s以下,更佳為15000 Pa・s以下,進而較佳為10000 Pa・s以下。(Viscosity of insulating resin adhesive) The minimum melt viscosity of the insulating resin adhesive 3 can be appropriately determined according to the manufacturing method of the anisotropic conductive film and the like. For example, when conducting a method of holding conductive particles on the surface of an insulating resin adhesive in a specific arrangement as a method for producing an anisotropic conductive film, and pressing the conductive particles into the insulating resin adhesive, the In the aspect of forming the insulating resin adhesive into a film, it is preferable to set the minimum melt viscosity of the resin to 1100 Pa·s or more. Further, as will be described later, as shown in FIG. 12 or FIG. 13 , concave portions 3 b are formed around the exposed portions of the conductive particles 2 pressed into the insulating resin adhesive 3 , or as shown in FIG. 14 , The minimum melt viscosity is preferably 1500 Pa·s or more, more preferably 2000 Pa·s or more, and still more preferably 3000 Pa·s or more, in terms of forming the concave portion 3c directly above the conductive particles 2 incorporated into the insulating resin binder 3 ~15000 Pa·s, preferably 3000~10000 Pa·s. As an example of this minimum melt viscosity, a rotational rheometer (manufactured by TA Instruments) can be used, the temperature increase rate is 10°C/min, the measurement pressure is kept constant at 5 g, and a measurement plate with a diameter of 8 mm is used. and ask for. Furthermore, when the step of press-fitting the conductive particles 2 into the insulating resin adhesive 3 is performed at preferably 40 to 80° C., more preferably 50 to 60° C., the concave portion 3 b or 3 c is formed in the same manner as described above. On the other hand, the lower limit of the viscosity at 60°C is preferably 3000 Pa·s or more, more preferably 4000 Pa·s or more, further preferably 4500 Pa·s or more, and the upper limit is preferably 20000 Pa·s or less, More preferably, it is 15000 Pa·s or less, and still more preferably 10000 Pa·s or less.

藉由如上述般將構成絕緣性樹脂黏合劑3之樹脂的黏度設為高黏度,於使用異向性導電膜時,於在相對向之電子零件等連接對象物之間夾持著導電粒子2進行加熱加壓之情形時,可防止異向性導電膜內之導電粒子2因熔融之絕緣性樹脂黏合劑3之流動而隨之流走。By setting the viscosity of the resin constituting the insulating resin adhesive 3 to a high viscosity as described above, when an anisotropic conductive film is used, the conductive particles 2 are sandwiched between the connection objects such as opposing electronic components. In the case of heating and pressing, the conductive particles 2 in the anisotropic conductive film can be prevented from flowing away due to the flow of the molten insulating resin binder 3 .

(絕緣性樹脂黏合劑之厚度) 絕緣性樹脂黏合劑3的厚度La較佳為1 μm以上且60 μm以下,更佳為1 μm以上且30 μm以下,進而較佳為2 μm以上且15 μm以下。又,絕緣性樹脂黏合劑3的厚度La就與導電粒子2的平均粒徑D之關係而言,較佳為該等之比(La/D)為0.6~10。若絕緣性樹脂黏合劑3的厚度La過大,則於異向性導電連接時導電粒子變得容易錯位,端子中之導電粒子之捕捉性降低。若La/D超過10,則該傾向顯著。因此,La/D更佳為8以下,進而更佳為6以下。反之,若絕緣性樹脂黏合劑3的厚度La過小而La/D未達0.6,則難以藉由絕緣性樹脂黏合劑3將導電粒子維持為特定之粒子分散狀態或特定之排列。尤其是於連接之端子為高密度COG之情形時,絕緣性樹脂黏合劑3的層厚La與導電粒子2的粒徑D之比(La/D)較佳為0.8~2。(Thickness of insulating resin adhesive) The thickness La of the insulating resin adhesive 3 is preferably 1 μm or more and 60 μm or less, more preferably 1 μm or more and 30 μm or less, and still more preferably 2 μm or more and 15 μm or less. Moreover, as for the relationship between the thickness La of the insulating resin binder 3 and the average particle diameter D of the electroconductive particle 2, it is preferable that the ratio (La/D) is 0.6-10. When the thickness La of the insulating resin adhesive 3 is too large, the conductive particles tend to be displaced during anisotropic conductive connection, and the ability to capture the conductive particles in the terminal decreases. This tendency is remarkable when La/D exceeds 10. Therefore, La/D is more preferably 8 or less, and still more preferably 6 or less. Conversely, if the thickness La of the insulating resin adhesive 3 is too small and La/D is less than 0.6, it is difficult to maintain the conductive particles in a specific particle dispersion state or a specific arrangement by the insulating resin adhesive 3 . In particular, when the terminals to be connected are high-density COG, the ratio (La/D) of the layer thickness La of the insulating resin adhesive 3 to the particle diameter D of the conductive particles 2 is preferably 0.8 to 2.

(絕緣性樹脂黏合劑中之導電粒子之埋入態樣) 關於絕緣性樹脂黏合劑3中之導電粒子2之埋入狀態,並無特別限制,於藉由在相對向之零件之間挾持異向性導電膜並進行加熱加壓而進行異向性導電連接之情形時,較佳如圖12、圖13所示般,使導電粒子2自絕緣性樹脂黏合劑3露出一部分,相對於鄰接之導電粒子2間之中央部的絕緣性樹脂黏合劑之表面3a的切平面3p而於導電粒子2之露出部分之周圍形成凹部3b,或如圖14所示般,於壓入至絕緣性樹脂黏合劑3內之導電粒子2之正上方的絕緣性樹脂黏合劑部分,相對於與上述同樣之切平面3p而形成凹部3c,使導電粒子2之正上方的絕緣性樹脂黏合劑3之表面存在起伏。針對在相對向之電子零件之電極間挾持導電粒子2進行加熱加壓時產生之導電粒子2之扁平化,藉由存在如圖12、圖13所示之凹部3b,與不存在凹部3b之情形相比,導電粒子2受到之來自絕緣性樹脂黏合劑3的阻力有所減少。因此,變得容易於相對向之電極間挾持導電粒子2,導通性能亦提高。又,構成絕緣性樹脂黏合劑3之樹脂中,藉由在導電粒子2之正上方的樹脂之表面形成凹部3c(圖14),與不存在凹部3c之情形相比加熱加壓時之壓力變得容易集中於導電粒子2,而變得容易於電極中挾持導電粒子2,導通性能提高。(Embedding of conductive particles in insulating resin adhesive) The embedded state of the conductive particles 2 in the insulating resin adhesive 3 is not particularly limited, and anisotropic conductive connection is performed by sandwiching an anisotropic conductive film between opposing parts and applying heat and pressure In this case, as shown in FIGS. 12 and 13 , it is preferable to expose a part of the conductive particles 2 from the insulating resin adhesive 3 to the surface 3 a of the insulating resin adhesive in the central portion between the adjacent conductive particles 2 . A recess 3b is formed around the exposed portion of the conductive particle 2, or as shown in FIG. 14, the insulating resin adhesive directly above the conductive particle 2 pressed into the insulating resin adhesive 3 In part, the concave portion 3c is formed with respect to the same tangent plane 3p as described above, and the surface of the insulating resin binder 3 directly above the conductive particle 2 has undulations. For the flattening of the conductive particles 2 that occurs when the conductive particles 2 are held between the electrodes of the opposing electronic components and heated and pressurized, the presence of the concave portion 3b as shown in FIGS. 12 and 13 and the absence of the concave portion 3b In contrast, the conductive particles 2 receive less resistance from the insulating resin binder 3 . Therefore, it becomes easy to hold the conductive particle 2 between the opposing electrodes, and the conduction performance is also improved. In addition, in the resin constituting the insulating resin binder 3, by forming the concave portions 3c on the surface of the resin directly above the conductive particles 2 (FIG. 14), the pressure during heating and pressurization changes compared with the case where the concave portions 3c do not exist. It is easy to concentrate on the conductive particles 2, and it becomes easy to hold the conductive particles 2 in the electrode, and the conduction performance is improved.

就容易獲得上述之凹部3b、3c之效果之方面而言,導電粒子2的露出部分周圍之凹部3b(圖12、圖13)的最大深度Le與導電粒子2的平均粒徑D之比(Le/D)較佳為未達50%,更佳為未達30%,進而較佳為20~25%,導電粒子2的露出部分周圍之凹部3b(圖12、圖13)的最大徑Ld與導電粒子2的平均粒徑D之比(Ld/D)較佳為100%以上,更佳為100~150%,導電粒子2之正上方的樹脂之凹部3c(圖14)的最大深度Lf與導電粒子2的平均粒徑D之比(Lf/D)較佳為大於0,且較佳為未達10%,更佳為未達5%。In terms of easily obtaining the effects of the concave portions 3b and 3c described above, the ratio of the maximum depth Le of the concave portion 3b (FIG. 12 and FIG. 13) around the exposed portion of the conductive particle 2 to the average particle diameter D of the conductive particle 2 (Le /D) is preferably less than 50%, more preferably less than 30%, and more preferably 20-25%. The maximum diameter Ld of the concave portion 3b (Fig. 12, Fig. 13) around the exposed portion of the conductive particle 2 is equal to The ratio (Ld/D) of the average particle diameter D of the conductive particles 2 is preferably 100% or more, more preferably 100 to 150%, and the maximum depth Lf of the concave portion 3c ( FIG. 14 ) of the resin directly above the conductive particles 2 is equal to The ratio (Lf/D) of the average particle diameter D of the conductive particles 2 is preferably greater than 0, and preferably less than 10%, more preferably less than 5%.

再者,導電粒子2的露出部分之徑Lc可設為導電粒子2的平均粒徑D以下,較佳為平均粒徑D之10~90%。可設為於導電粒子2的頂部2t之1點處露出,亦可設為導電粒子2完全埋設於絕緣性樹脂黏合劑3內,而徑Lc成為零。Furthermore, the diameter Lc of the exposed portion of the conductive particles 2 can be set to be equal to or less than the average particle diameter D of the conductive particles 2 , preferably 10 to 90% of the average particle diameter D. The conductive particle 2 may be exposed at one point of the top 2t of the conductive particle 2, or the conductive particle 2 may be completely embedded in the insulating resin binder 3, and the diameter Lc may be zero.

(絕緣性樹脂黏合劑之厚度方向之導電粒子之位置) 就容易獲得上述凹部3b之效果之方面而言,鄰接之導電粒子2間之中央部處絕緣性樹脂黏合劑之表面3a的切平面3p距導電粒子2之最深部之距離(以下稱為埋入量)Lb與導電粒子2的平均粒徑D之比(Lb/D)(以下稱為埋入率)較佳為60%以上且105%以下。(Position of conductive particles in thickness direction of insulating resin adhesive) In terms of easily obtaining the effect of the concave portion 3b described above, the distance between the tangent plane 3p of the surface 3a of the insulating resin binder in the central portion between the adjacent conductive particles 2 and the deepest portion of the conductive particle 2 (hereinafter referred to as embedding) The ratio (Lb/D) (hereinafter referred to as the entrapment ratio) of Lb to the average particle diameter D of the conductive particles 2 (hereinafter referred to as the entrapment ratio) is preferably 60% or more and 105% or less.

<絕緣性接著層> 於本發明之異向性導電膜中,亦可於配置有導電粒子2的絕緣性樹脂黏合劑3上積層黏度或黏著性與構成絕緣性樹脂黏合劑3之樹脂不同的絕緣性接著層4。<Insulating Adhesive Layer> In the anisotropic conductive film of the present invention, an insulating adhesive layer 4 having a viscosity or adhesiveness different from that of the resin constituting the insulating resin adhesive 3 may be laminated on the insulating resin adhesive 3 in which the conductive particles 2 are arranged.

於在絕緣性樹脂黏合劑3上形成上述之凹部3b之情形時,可如圖15所示之異向性導電膜1d般,絕緣性接著層4積層於絕緣性樹脂黏合劑3之形成有凹部3b之面,亦可如圖16所示之異向性導電膜1e般,積層於與形成有凹部3b之面為相反側之面。於絕緣性樹脂黏合劑3形成有凹部3c之情形時亦相同。藉由積層絕緣性接著層4,於使用異向性導電膜將電子零件進行異向性導電連接時,可填充由電子零件之電極或凸塊形成之空間,而提高接著性。In the case where the above-mentioned concave portion 3b is formed on the insulating resin adhesive 3, the insulating adhesive layer 4 can be laminated on the insulating resin adhesive 3 where the concave portion is formed like the anisotropic conductive film 1d shown in FIG. 15 . On the surface 3b, like the anisotropic conductive film 1e shown in FIG. 16, it may be laminated on the surface opposite to the surface on which the recessed portion 3b is formed. The same applies to the case where the insulating resin adhesive 3 is formed with the concave portion 3c. By laminating the insulating adhesive layer 4, when the electronic components are anisotropically conductively connected using the anisotropic conductive film, the spaces formed by the electrodes or bumps of the electronic components can be filled to improve the adhesiveness.

又,於將絕緣性接著層4積層於絕緣性樹脂黏合劑3之情形時,不論絕緣性接著層4是否位於凹部3b、3c之形成面上,均較佳為絕緣性接著層4位於IC晶片等第1電子零件側(換言之,絕緣性樹脂黏合劑3位於基板等第2電子零件側)。藉此,可避免導電粒子之不經意之移動,而可提高捕捉性。再者,通常將IC晶片等第1電子零件設為按壓夾具側,將基板等第2電子零件設為載台側,將異向性導電膜與第2電子零件暫時壓接後,將第1電子零件與第2電子零件正式壓接,但根據第2電子零件之熱壓接區域之尺寸等,而將異向性導電膜暫貼於第1電子零件後,將第1電子零件與第2電子零件正式壓接。In addition, when the insulating adhesive layer 4 is laminated on the insulating resin adhesive 3, it is preferable that the insulating adhesive layer 4 is located on the IC chip regardless of whether the insulating adhesive layer 4 is located on the surface where the recesses 3b and 3c are formed. On the side of the first electronic component (in other words, the insulating resin adhesive 3 is on the side of the second electronic component such as the substrate). Thereby, the inadvertent movement of the conductive particles can be avoided, and the catchability can be improved. In addition, generally, the first electronic component such as an IC chip is placed on the pressing jig side, the second electronic component such as a substrate is placed on the stage side, and the anisotropic conductive film and the second electronic component are temporarily pressure-bonded, and then the first electronic component is placed on the stage. The electronic component and the second electronic component are formally crimped, but the anisotropic conductive film is temporarily attached to the first electronic component according to the size of the thermocompression bonding area of the second electronic component, and then the first electronic component and the second electronic component are temporarily bonded. Electronic parts are officially crimped.

作為絕緣性接著層4,可適當選擇公知之異向性導電膜中用作絕緣性接著層者而使用。絕緣性接著層4亦可設為使用與上述絕緣性樹脂黏合劑3同樣之樹脂並進一步將黏度調整為較低者。絕緣性接著層4與絕緣性樹脂黏合劑3之最低熔融黏度越存在差異,則越容易以絕緣性接著層4填充由電子零件的電極或凸塊形成之空間,而可期待提高電子零件彼此之接著性之效果。又,越存在該差異,則異向性導電連接時構成絕緣性樹脂黏合劑3的樹脂之移動量相對變得越小,因此端子之導電粒子的捕捉性越容易提高。實用上而言,絕緣性接著層4與絕緣性樹脂黏合劑3之最低熔融黏度比較佳為2以上,更佳為5以上,進而較佳為8以上。另一方面,若該比過大,則於將長尺寸的異向性導電膜製成捲裝體之情形時,有產生樹脂之溢出或黏連(blocking)之虞,因此實用上較佳為15以下。更具體而言,絕緣性接著層4之較佳之最低熔融黏度滿足上述之比,且為3000 Pa・s以下,更佳為2000 Pa・s以下,尤佳為100~2000 Pa・s。As the insulating adhesive layer 4, one used as an insulating adhesive layer among known anisotropic conductive films can be appropriately selected and used. The insulating adhesive layer 4 may be the one that uses the same resin as the insulating resin adhesive 3 described above and further adjusts the viscosity to be lower. The greater the difference in the minimum melt viscosity between the insulating adhesive layer 4 and the insulating resin adhesive 3, the easier it is to fill the space formed by the electrodes or bumps of the electronic components with the insulating adhesive layer 4, and it can be expected to improve the mutual relationship between the electronic components. The effect of continuity. In addition, the more this difference exists, the smaller the amount of movement of the resin constituting the insulating resin adhesive 3 during the anisotropic conductive connection is relatively small, and the easier it is to improve the trapping properties of the conductive particles of the terminal. Practically speaking, the minimum melt viscosity of the insulating adhesive layer 4 and the insulating resin adhesive 3 is preferably 2 or more, more preferably 5 or more, and still more preferably 8 or more. On the other hand, if the ratio is too large, when the long anisotropic conductive film is made into a package, there is a risk of resin overflow or blocking, so 15 is practically preferable. the following. More specifically, the preferred minimum melt viscosity of the insulating adhesive layer 4 satisfies the above ratio, and is 3000 Pa·s or less, more preferably 2000 Pa·s or less, and still more preferably 100 to 2000 Pa·s.

作為絕緣性接著層4之形成方法,可藉由利用塗佈法將含有與形成絕緣性樹脂黏合劑3之樹脂同樣之樹脂的塗層組成物成膜並加以乾燥,或進而進行硬化,或者預先利用公知之手法進行膜化而形成。As a method of forming the insulating adhesive layer 4, a coating composition containing the same resin as the resin forming the insulating resin adhesive 3 can be formed into a film by a coating method, dried, or further cured, or a It forms into a film by a well-known method.

絕緣性接著層4之厚度較佳為1 μm以上且30 μm以下,更佳為2 μm以上且15 μm以下。The thickness of the insulating adhesive layer 4 is preferably 1 μm or more and 30 μm or less, and more preferably 2 μm or more and 15 μm or less.

又,合併絕緣性樹脂黏合劑3與絕緣性接著層4而成之異向性導電膜整體的最低熔融黏度亦取決於絕緣性樹脂黏合劑3與絕緣性接著層4的厚度之比率,實用上可設為8000 Pa・s以下,為了容易填充至凸塊間,可為200~7000 Pa・s,較佳為200~4000 Pa・s。In addition, the minimum melt viscosity of the entire anisotropic conductive film formed by combining the insulating resin adhesive 3 and the insulating adhesive layer 4 also depends on the ratio of the thicknesses of the insulating resin adhesive 3 and the insulating adhesive layer 4, and practically It can be set to 8000 Pa·s or less, and in order to easily fill between bumps, it can be 200 to 7000 Pa·s, preferably 200 to 4000 Pa·s.

亦可視需要於絕緣性樹脂黏合劑3或絕緣性接著層4中添加二氧化矽微粒子、氧化鋁、氫氧化鋁等絕緣性填料。絕緣性填料之摻合量較佳相對於構成該等層之樹脂100質量份而設為3質量份以上且40質量份以下。藉此,於異向性導電連接時即使異向性導電膜熔融,亦可抑制熔融之樹脂導致導電粒子不必要地移動。Insulating fillers such as silica fine particles, alumina, and aluminum hydroxide may also be added to the insulating resin adhesive 3 or the insulating adhesive layer 4 as required. The blending amount of the insulating filler is preferably 3 parts by mass or more and 40 parts by mass or less with respect to 100 parts by mass of the resin constituting the layers. Thereby, even if the anisotropic conductive film is melted at the time of anisotropic conductive connection, it is possible to suppress unnecessary movement of the conductive particles due to the melted resin.

<異向性導電膜之製造方法> 作為異向性導電膜之製造方法,例如,製造用以將導電粒子配置為特定之排列的轉印模具,於轉印模具之凹部填充導電粒子,使形成於剝離膜上之絕緣性樹脂黏合劑3覆於其上並施加壓力,而將導電粒子2壓入至絕緣性樹脂黏合劑3中,藉此使導電粒子2轉接著於絕緣性樹脂黏合劑3。或進而將絕緣性接著層4積層於該導電粒子2上。如此可獲得異向性導電膜1A。<Manufacturing method of anisotropic conductive film> As a method of producing an anisotropic conductive film, for example, a transfer mold for arranging conductive particles in a specific arrangement is produced, conductive particles are filled in the concave portion of the transfer mold, and an insulating resin adhesive formed on the release film is formed. The conductive particles 2 are pressed into the insulating resin adhesive 3 by covering the conductive particles 2 on the insulating resin adhesive 3 , so that the conductive particles 2 are transferred to the insulating resin adhesive 3 . Alternatively, the insulating adhesive layer 4 may be further laminated on the conductive particles 2 . In this way, the anisotropic conductive film 1A can be obtained.

又,於轉印模具之凹部填充導電粒子後,使絕緣性樹脂黏合劑覆於其上,使導電粒子自轉印模具轉印至絕緣性樹脂黏合劑之表面,將絕緣性樹脂黏合劑上之導電粒子壓入至絕緣性樹脂黏合劑內,藉此亦可製造異向性導電膜。藉由該壓入時之按壓力、溫度等可調整導電粒子之埋入量(Lb)。又,藉由壓入時之絕緣性樹脂黏合劑之黏度、壓入速度、溫度等可調整凹部3b、3c之形狀及深度。例如,將導電粒子壓入時的絕緣性樹脂黏合劑之黏度設為下限較佳為3000 Pa・s以上,更佳為4000 Pa・s以上,進而較佳為4500 Pa・s以上,上限設為較佳為20000 Pa・s以下,更佳為15000 Pa・s以下,進而較佳為10000 Pa・s以下。又,可於較佳為40~80℃、更佳為50~60℃獲得此種黏度。更具體而言,於製造絕緣性樹脂黏合劑之表面具有圖12所示之凹部3b的異向性導電膜1a之情形時,可將導電粒子壓入時之絕緣性樹脂黏合劑的黏度設為8000 Pa・s(50~60℃),於製造具有圖14所示之凹部3c之異向性導電膜1c之情形時,可將導電粒子壓入時之絕緣性樹脂黏合劑的黏度設為4500 Pa・s(50~60℃)。In addition, after the concave part of the transfer mold is filled with conductive particles, the insulating resin adhesive is coated thereon, so that the conductive particles are transferred from the transfer mold to the surface of the insulating resin adhesive, and the conductive particles on the insulating resin adhesive are transferred. The particles are pressed into the insulating resin binder, whereby an anisotropic conductive film can also be produced. The embedded amount (Lb) of the conductive particles can be adjusted by the pressing force and temperature during the pressing. In addition, the shape and depth of the concave portions 3b and 3c can be adjusted by the viscosity of the insulating resin adhesive during the press-fitting, the press-fitting speed, and the temperature. For example, the lower limit of the viscosity of the insulating resin binder when the conductive particles are pressed is preferably 3000 Pa·s or more, more preferably 4000 Pa·s or more, and still more preferably 4500 Pa·s or more, and the upper limit is set to It is preferably 20,000 Pa·s or less, more preferably 15,000 Pa·s or less, and still more preferably 10,000 Pa·s or less. Moreover, such a viscosity can be obtained preferably at 40-80 degreeC, More preferably at 50-60 degreeC. More specifically, in the case of producing the anisotropic conductive film 1a having the concave portion 3b shown in FIG. 12 on the surface of the insulating resin adhesive, the viscosity of the insulating resin adhesive when the conductive particles are pressed can be set to 8000 Pa·s (50-60°C), in the case of manufacturing the anisotropic conductive film 1c having the concave portion 3c shown in Fig. 14, the viscosity of the insulating resin adhesive when the conductive particles are pressed into the resin can be set to 4500 Pa·s (50~60℃).

再者,作為轉印模具,除了於凹部填充導電粒子者以外,亦可使用對凸部之頂面賦予微黏著劑並使導電粒子附著於該頂面而成者。Furthermore, as the transfer mold, in addition to filling the concave portion with conductive particles, a micro-adhesive is applied to the top surface of the convex portion and the conductive particle is attached to the top surface.

該等轉印模具可使用或應用機械加工、光微影法、印刷法等公知之技術而製造。These transfer molds can be produced by using or applying known techniques such as machining, photolithography, and printing.

又,作為將導電粒子配置為特定之排列之方法,亦可使用利用雙軸延伸膜之方法等代替利用轉印模具之方法。In addition, as a method of arranging the conductive particles in a specific arrangement, a method using a biaxially stretched film or the like may be used instead of a method using a transfer mold.

<捲裝體> 異向性導電膜為了連續供於電子零件之連接,較佳製成捲繞於捲盤而成之膜捲裝體。膜捲裝體之長度為5 m以上即可,較佳為10 m以上。並不特別存在上限,就出貨物之操作性之方面而言,較佳為5000 m以下,更佳為1000 m以下,進而較佳為500 m以下。<Package body> In order to continuously supply the anisotropic conductive film to the connection of electronic parts, it is preferable to form a film roll body wound on a reel. The length of the film roll body may be 5 m or more, preferably 10 m or more. There is no upper limit in particular, but from the viewpoint of the operability of unloading the cargo, it is preferably 5,000 m or less, more preferably 1,000 m or less, and still more preferably 500 m or less.

膜捲裝體可為藉由連接帶將短於全長之異向性導電膜連結而成者。連結部位可存在多處,可規則地存在,亦可隨機地存在。連接帶之厚度只要不阻礙性能,則並無特別限制,但由於若過厚,則會影響到樹脂之溢出或黏連,因此較佳為10~40 μm。又,膜之寬度並無特別限制,作為一例,為0.5~5 mm。The film package may be formed by connecting an anisotropic conductive film shorter than the entire length with a connection tape. The connection site may exist in a plurality of places, and may exist regularly or randomly. The thickness of the connection tape is not particularly limited as long as it does not hinder the performance, but if it is too thick, it will affect the overflow or adhesion of the resin, so it is preferably 10 to 40 μm. In addition, the width of the film is not particularly limited, but is 0.5 to 5 mm as an example.

根據膜捲裝體,可實現連續之異向性導電連接,有助於降低連接體之成本。According to the film roll, continuous anisotropic conductive connection can be realized, which helps to reduce the cost of the connection body.

<連接結構體> 本發明之異向性導電膜於藉由熱或光將FPC、IC晶片、IC模組等第1電子零件與FPC、剛性基板、陶瓷基板、玻璃基板、塑膠基板等第2電子零件進行異向性導電連接時可較佳地應用。又,亦可將IC晶片或IC模組進行堆疊而將第1電子零件彼此進行異向性導電連接。由此獲得之連接結構體及其製造方法亦為本發明之一部分。<Connection structure> The anisotropic conductive film of the present invention is used to anisotropy the first electronic parts such as FPCs, IC chips, and IC modules, and the second electronic parts such as FPCs, rigid substrates, ceramic substrates, glass substrates, and plastic substrates by heat or light. It can be preferably used in the case of conductive connection. Moreover, IC chips or IC modules may be stacked to perform anisotropic conductive connection between the first electronic components. The thus obtained connecting structure and its manufacturing method are also part of the present invention.

作為使用異向性導電膜之電子零件之連接方法,就提高連接可靠性之方面而言,較佳例如將於異向性導電膜之膜厚方向上導電粒子靠近存在之側的界面暫貼於載置於載台之配線基板等第2電子零件,對暫貼之異向性導電膜搭載IC晶片等第1電子零件,並使用按壓夾具自第1電子零件側進行熱壓接。亦可利用光硬化進行同樣之電子零件之連接。As a method of connecting electronic components using anisotropic conductive film, it is preferable to temporarily stick the interface on the side where conductive particles are present in the thickness direction of the anisotropic conductive film, for example, on the side of improving connection reliability. A second electronic component such as a wiring board placed on a stage, a first electronic component such as an IC chip is mounted on the temporarily attached anisotropic conductive film, and thermocompression bonding is performed from the first electronic component side using a pressing jig. The same electronic components can also be connected by photohardening.

再者,於因配線基板等第2電子零件之連接區域之尺寸等導致難以將異向性導電膜暫貼於配線基板等第2電子零件之情形時,將異向性導電膜暫貼於載置於載台之IC晶片之第1電子零件,然後將第1電子零件與第2電子零件進行熱壓接。 實施例Furthermore, when it is difficult to temporarily attach the anisotropic conductive film to the second electronic parts such as the wiring board due to the size of the connection region of the second electronic component such as the wiring board, temporarily attach the anisotropic conductive film to the carrier. The first electronic component of the IC chip placed on the stage is then thermocompression bonded to the first electronic component and the second electronic component. Example

實驗例1~實驗例8 (異向性導電膜之製作) 關於用於COG連接之異向性導電膜,以如下方式研究絕緣性樹脂黏合劑之樹脂組成與導電粒子之配置對膜形成性能與導通特性造成之影響。Experimental Example 1 to Experimental Example 8 (Fabrication of anisotropic conductive film) Regarding the anisotropic conductive film for COG connection, the influence of the resin composition of the insulating resin adhesive and the arrangement of the conductive particles on the film forming performance and conduction characteristics was investigated as follows.

首先,以表1所示之組成分別製備形成絕緣性樹脂黏合劑及絕緣性接著層之樹脂組成物。於該情形時,藉由絕緣性樹脂組成物之製備條件調整樹脂組成物之最低熔融黏度。藉由棒式塗佈機將形成絕緣性樹脂黏合劑之樹脂組成物塗佈於膜厚50 μm之PET膜上,於80℃之烘箱中乾燥5分鐘,而於PET膜上形成表2所示之厚度La的絕緣性樹脂黏合劑層。以同樣之方式將絕緣性接著層以表2所示之厚度形成於PET膜上。First, the resin compositions for forming the insulating resin adhesive and the insulating adhesive layer were prepared with the compositions shown in Table 1, respectively. In this case, the minimum melt viscosity of the resin composition is adjusted by the preparation conditions of the insulating resin composition. The resin composition for forming the insulating resin adhesive was coated on a PET film with a film thickness of 50 μm by a bar coater, and dried in an oven at 80°C for 5 minutes to form the resin composition shown in Table 2 on the PET film. An insulating resin adhesive layer with a thickness of La. In the same manner, the insulating adhesive layer was formed on the PET film with the thickness shown in Table 2.

[表1] (質量份)    COG用組成表 組成 A B C D 絕緣性樹脂黏合劑 苯氧基樹脂(YP-50,新日鐵住友化學股份有限公司) 50 45 40 37 二氧化矽填料(Aerosil R805,日本艾羅西爾股份有限公司) 20 10 10 8 液狀環氧樹脂(jER828,三菱化學股份有限公司) 25 40 45 50 矽烷偶合劑(KBM-403,信越化學工業股份有限公司) 2 2 2 2 熱陽離子聚合起始劑(SI-60L,三新化學工業股份有限公司) 3 3 3 3 絕緣性 接著層 苯氧基樹脂(YP-50,新日鐵住友化學股份有限公司) 40 二氧化矽填料(Aerosil R805,日本艾羅西爾股份有限公司) 5 液狀環氧樹脂(jER828,三菱化學股份有限公司) 50 矽烷偶合劑(KBM-403,信越化學工業股份有限公司) 2 熱陽離子聚合起始劑(SI-60L,三新化學工業股份有限公司) 3 [Table 1] (parts by mass) Composition table for COG composition A B C D insulating resin adhesive Phenoxy resin (YP-50, Nippon Steel Sumitomo Chemical Co., Ltd.) 50 45 40 37 Silica filler (Aerosil R805, Japan Aerosil Co., Ltd.) 20 10 10 8 Liquid epoxy resin (jER828, Mitsubishi Chemical Corporation) 25 40 45 50 Silane coupling agent (KBM-403, Shin-Etsu Chemical Co., Ltd.) 2 2 2 2 Thermal cationic polymerization initiator (SI-60L, Sanxin Chemical Industry Co., Ltd.) 3 3 3 3 insulating adhesive layer Phenoxy resin (YP-50, Nippon Steel Sumitomo Chemical Co., Ltd.) 40 Silica filler (Aerosil R805, Japan Aerosil Co., Ltd.) 5 Liquid epoxy resin (jER828, Mitsubishi Chemical Corporation) 50 Silane coupling agent (KBM-403, Shin-Etsu Chemical Co., Ltd.) 2 Thermal cationic polymerization initiator (SI-60L, Sanxin Chemical Industry Co., Ltd.) 3

繼而,以導電粒子之俯視下之配置成為表2所示之配置,其重複單元中之最接近導電粒子的中心間距離成為6 μm之方式製作模具。將公知的透明性樹脂之顆粒以經熔融之狀態流入至該模具中,冷卻使其凝固,藉此形成凹部為表2所示之配置的樹脂模。此處,於實驗例8中將導電粒子之配置設為六方晶格排列(個數密度32000個/mm2 ),使其晶格軸之一相對於異向性導電膜之長邊方向傾斜15°。Next, a mold was prepared so that the arrangement of the conductive particles in plan view was the arrangement shown in Table 2, and the distance between the centers of the nearest conductive particles in the repeating units was 6 μm. The pellets of a known transparent resin were poured into the mold in a melted state, cooled and solidified, thereby forming a resin mold in which the concave portion was arranged as shown in Table 2. Here, in Experimental Example 8, the conductive particles were arranged in a hexagonal lattice arrangement (number density of 32,000 particles/mm 2 ), and one of the lattice axes was inclined by 15% with respect to the longitudinal direction of the anisotropic conductive film. °.

作為導電粒子而準備金屬被覆樹脂粒子(積水化學工業股份有限公司,AUL703,平均粒徑3 μm),將該導電粒子填充至樹脂模之凹部中,使上述絕緣性樹脂黏合劑覆於其上,於60℃、0.5 MPa進行按壓,藉此使其貼合。然後,將絕緣性樹脂黏合劑自模剝離,對絕緣性樹脂黏合劑上之導電粒子進行加壓(按壓條件:60~70℃、0.5 Mpa),藉此將其壓入至絕緣性樹脂黏合劑中,而製作將導電粒子以表2所示之狀態埋入至絕緣性樹脂黏合劑中之膜。於該情形時,導電粒子之埋入狀態係根據壓入條件加以控制。其結果,於實驗例4中,壓入導電粒子後膜形狀未得到維持,除此以外之實驗例中,可製作埋入有導電粒子之膜。於利用金屬顯微鏡之觀察中,如表2所示般於埋入之導電粒子的露出部分之周圍或埋入之導電粒子的正上方觀察到凹部。再者,於除實驗例4以外之各實驗例中觀察到導電粒子的露出部分周圍之凹部,及導電粒子正上方之凹部之兩者,於表4中按各實驗例示出最明確地觀察到凹部者之測量值。Metal-coated resin particles (Sekisui Chemical Industry Co., Ltd., AUL703, average particle size 3 μm) were prepared as conductive particles, the conductive particles were filled in the concave portion of the resin mold, and the insulating resin adhesive was coated thereon. By pressing at 60° C. and 0.5 MPa, they were bonded together. Then, the insulating resin adhesive is peeled off from the mold, and the conductive particles on the insulating resin adhesive are pressed (pressing conditions: 60 to 70°C, 0.5 Mpa) to press them into the insulating resin adhesive. , and a film in which the conductive particles were embedded in the insulating resin adhesive in the state shown in Table 2 was produced. In this case, the embedded state of the conductive particles is controlled according to the pressing conditions. As a result, in Experimental Example 4, the film shape was not maintained after the conductive particles were pressed, and in the other experimental examples, a film in which conductive particles were embedded could be produced. In the observation with a metal microscope, as shown in Table 2, a concave portion was observed around the exposed portion of the embedded conductive particle or directly above the embedded conductive particle. Furthermore, in each of the experimental examples other than Experimental Example 4, both the concave portion around the exposed portion of the conductive particle and the concave portion directly above the conductive particle were observed, and Table 4 shows the most clearly observed by each experimental example. The measured value of the concave part.

藉由將絕緣性接著層積層於埋入有導電粒子之膜的壓入導電粒子之側,而製作樹脂層為2層型之異向性導電膜。但是於實驗例4中,壓入導電粒子後膜形狀未得到維持,因此未進行以下之評價。An anisotropic conductive film whose resin layer is a two-layer type is produced by laminating an insulating adhesive on the side of the conductive particle-embedded film on the side where the conductive particles are pressed. However, in Experimental Example 4, since the shape of the film was not maintained after the conductive particles were pressed, the following evaluation was not performed.

(評價) 對於各實驗例之異向性導電膜,以如下方式測量(a)初始導通電阻與(b)導通可靠性。將結果示於表2。(Evaluation) For the anisotropic conductive films of each experimental example, (a) initial on-resistance and (b) on-reliability were measured as follows. The results are shown in Table 2.

(a)初始導通電阻 將各實驗例之異向性導電膜挾持於載台上之玻璃基板與按壓工具側之導通特性評價用IC之間,藉由按壓工具進行加熱加壓(180℃、5秒)而獲得各評價用連接物。於該情形時,將利用按壓工具而獲得之推力變為低(40 MPa)、中(60 MPa)、高(80 MPa)之3個階段,而獲得3種評價用連接物。(a) Initial on-resistance The anisotropic conductive film of each experimental example was sandwiched between the glass substrate on the stage and the IC for conducting property evaluation on the pressing tool side, and each evaluation was obtained by heating and pressing (180° C., 5 seconds) with the pressing tool. Use a linker. In this case, the thrust obtained by the pressing tool was changed into three stages of low (40 MPa), medium (60 MPa), and high (80 MPa), and three types of connectors for evaluation were obtained.

此處,關於導通特性評價用IC與玻璃基板,該等之端子圖案相對應,尺寸如下所述。又,於連結評價用IC與玻璃基板時,將異向性導電膜之長邊方向與凸塊之短邊方向對齊。Here, regarding the IC for conducting characteristic evaluation and the glass substrate, the terminal patterns of these correspond to each other, and the dimensions are as follows. Moreover, when connecting the IC for evaluation and a glass substrate, the long-side direction of an anisotropic conductive film and the short-side direction of a bump were aligned.

導通特性評價用IC 外形:1.8×20.0 mm 厚度:0.5 mm 凸塊規格:尺寸30×85 μm、凸塊間距離50 μm、凸塊高度15 μmIC for evaluation of conduction characteristics Outline: 1.8×20.0 mm Thickness: 0.5 mm Bump specifications: size 30×85 μm, distance between bumps 50 μm, bump height 15 μm

玻璃基板(ITO配線) 玻璃材質:康寧公司製造之1737F 外形:30×50 mm 厚度:0.5 mm 電極:ITO配線Glass substrate (ITO wiring) Glass material: 1737F made by Corning Shape: 30×50mm Thickness: 0.5 mm Electrode: ITO wiring

測量獲得之評價用連接物之初始導通電阻,按照以下之3個階段之評價基準進行評價。 初始導通電阻之評價基準(實用上,只要未達2 Ω,則無問題) A:未達0.4 Ω B:0.4 Ω以上且未達0.8 Ω C:0.8 Ω以上The initial on-resistance of the obtained connector for evaluation was measured and evaluated according to the following three-stage evaluation criteria. Evaluation criteria for initial on-resistance (practically, as long as it is less than 2 Ω, there is no problem) A: Less than 0.4 Ω B: 0.4 Ω or more and less than 0.8 Ω C: 0.8 Ω or more

(b)導通可靠性 進行將(a)中製作之評價用連接物於溫度85℃、濕度85%RH之恆溫槽中放置500小時之可靠性試驗,與初始導通電阻同樣地測量之後的導通電阻,按照以下之3個階段之評價基準進行評價。(b) Turn-on reliability Carry out a reliability test in which the connector for evaluation prepared in (a) is placed in a constant temperature bath with a temperature of 85°C and a humidity of 85%RH for 500 hours, and the on-resistance after measuring in the same manner as the initial on-resistance, according to the following three The evaluation criteria of the stage are evaluated.

導通可靠性之評價基準(實用上,只要未達5 Ω,則無問題) A:未達1.2 Ω B:1.2 Ω以上且未達2 Ω C:2 Ω以上Evaluation criteria for on-reliability (practically, as long as it is less than 5 Ω, there is no problem) A: Less than 1.2 Ω B: 1.2 Ω or more and less than 2 Ω C: 2 Ω or more

[表2]    實驗例1 實驗例2 實驗例3 實驗例4 實驗例5 實驗例6 實驗例7 實驗例8 樹脂之組成 A B C D A A A A 導電粒子壓入後之膜形狀 OK OK OK NG OK OK OK OK 導電粒子粒徑:D(μm) 3 3 3 3 3 3 3 3 導電粒子之配置 圖1A 圖1A 圖1A 圖1A 圖5 圖7 圖4 六方晶格 最接近導電粒子之中心間距離(μm) 6 6 6 6 6 6 6 6 厚度 (μm) 絕緣性樹脂黏合劑層(La) 4 4 4 4 4 4 4 4 絕緣性接著層 14 14 14 14 14 14 14 14 La/D 1.3 1.3 1.3 1.3 1.3 1.3 1.3 1.3 最低熔融黏度 (Pa·s) 絕緣性樹脂黏合劑層 8000 2000 1500 800 8000 8000 8000 8000 絕緣性接著層 800 800 800 800 800 800 800 800 合計熔融黏度 1200 900 900 800 1200 1200 1200 1200 60℃黏度 (Pa·s) 絕緣性樹脂黏合劑層 12000 3000 2000 1100 12000 12000 12000 12000 導電粒子之埋入狀態                         埋入率(100×Lb/D)% >80 >95 >95 - >80 >80 >80 >80 露出徑Lc(μm) <2.8 <2.5 <2.5 - <2.8 <2.8 <2.8 <2.8 凹部之有無 - 凹部之最大深度Le (相對於導電粒子粒徑D之比例) <50% <50% <50% - <50% <50% <50% <50% 凹部之最大徑Ld (相對於導電粒子粒徑D之比例) <1.3 <1.3 <1.3 - <1.3 <1.3 <1.3 <1.3 COG評價                         推力:低 40 MPa 初始導通電阻 A A A - A A A B 導通可靠性 A A A - A A A B 推力:中 60 MPa 初始導通電阻 A A A - A A A B 導通可靠性 A A A - A A A B 推力:高 80 MPa 初始導通電阻 A A A - A A A A 導通可靠性 A A A - A A A A [Table 2] Experimental example 1 Experimental example 2 Experimental example 3 Experimental example 4 Experimental example 5 Experimental example 6 Experimental example 7 Experimental example 8 The composition of resin A B C D A A A A The shape of the film after the conductive particles are pressed OK OK OK NG OK OK OK OK Conductive particle size: D (μm) 3 3 3 3 3 3 3 3 Configuration of Conductive Particles Figure 1A Figure 1A Figure 1A Figure 1A Figure 5 Figure 7 Figure 4 Hexagonal lattice The distance between the centers of the nearest conductive particles (μm) 6 6 6 6 6 6 6 6 Thickness (μm) Insulating resin adhesive layer (La) 4 4 4 4 4 4 4 4 insulating adhesive layer 14 14 14 14 14 14 14 14 La/D 1.3 1.3 1.3 1.3 1.3 1.3 1.3 1.3 Minimum melt viscosity (Pa s) Insulating resin adhesive layer 8000 2000 1500 800 8000 8000 8000 8000 insulating adhesive layer 800 800 800 800 800 800 800 800 Total melt viscosity 1200 900 900 800 1200 1200 1200 1200 Viscosity at 60℃(Pa·s) Insulating resin adhesive layer 12000 3000 2000 1100 12000 12000 12000 12000 Buried state of conductive particles Buried rate (100×Lb/D)% >80 >95 >95 - >80 >80 >80 >80 Exposure diameter Lc (μm) <2.8 <2.5 <2.5 - <2.8 <2.8 <2.8 <2.8 The presence or absence of recesses Have Have Have - Have Have Have Have The maximum depth Le of the concave part (the ratio to the particle size D of the conductive particles) <50% <50% <50% - <50% <50% <50% <50% The maximum diameter Ld of the concave part (the ratio to the particle diameter D of the conductive particle) <1.3 <1.3 <1.3 - <1.3 <1.3 <1.3 <1.3 COG evaluation Thrust: low 40 MPa Initial on-resistance A A A - A A A B turn-on reliability A A A - A A A B Thrust: Medium 60 MPa Initial on-resistance A A A - A A A B turn-on reliability A A A - A A A B Thrust: High 80 MPa Initial on-resistance A A A - A A A A turn-on reliability A A A - A A A A

根據表2可知,於絕緣性樹脂黏合劑之最低熔融黏度為800 Pa・s之實驗例4中難以形成於導電粒子附近之絕緣性樹脂黏合劑中具有凹部之膜。另一方面,可知於絕緣性樹脂黏合劑之最低熔融黏度為1500 Pa・s以上之實驗例中,藉由調整導電粒子之埋入時之條件而可於絕緣性樹脂黏合劑之導電粒子附近形成凸部,且如此獲得之異向性導電膜於用於COG時導通特性良好。又,可知與六方晶格排列之實驗例8相比,於導電粒子之個數密度較低的實驗例1~7中,可於更低之壓力下進行異向性導電連接。As can be seen from Table 2, in Experimental Example 4 in which the minimum melt viscosity of the insulating resin adhesive was 800 Pa·s, it was difficult to form a film having a concave portion in the insulating resin adhesive near the conductive particles. On the other hand, in the experimental example in which the minimum melt viscosity of the insulating resin adhesive was 1500 Pa·s or more, it was found that by adjusting the conditions at the time of embedding the conductive particles, it was possible to form near the conductive particles of the insulating resin adhesive. convex portion, and the thus obtained anisotropic conductive film has good conduction characteristics when used for COG. In addition, it was found that in Experimental Examples 1 to 7 in which the number density of conductive particles was low, anisotropic conductive connection could be performed at a lower pressure than in Experimental Example 8 in which the hexagonal lattice was arranged.

(c)短路率 使用實驗例1~3與5~8之異向性導電膜,使用以下之短路率之評價用IC,於180℃、60 MPa、5秒之連接條件下獲得評價用連接物,測量獲得之評價用連接物之短路數,以測量之短路數相對於評價用IC之端子數之比例之形式求出短路率。(c) Short circuit rate Using the anisotropic conductive films of Experimental Examples 1 to 3 and 5 to 8, using the following IC for evaluation of short-circuit rate, under the connection conditions of 180°C, 60 MPa, and 5 seconds, a connector for evaluation was obtained, and the obtained evaluation was measured. The short-circuit rate was calculated as the ratio of the number of short-circuits measured to the number of terminals of the evaluation IC using the number of short-circuits of the connector.

短路率之評價用IC(7.5 μm空間之梳齒TEG(test element group,測試元件組): 外形:15×13 mm 厚度:0.5 mm 凸塊規格:尺寸25×140 μm、凸塊間距離7.5 μm、凸塊高度15 μmIC for short-circuit rate evaluation (comb-teeth TEG (test element group, test element group) in 7.5 μm space): Outline: 15×13 mm Thickness: 0.5 mm Bump specifications: size 25×140 μm, distance between bumps 7.5 μm, bump height 15 μm

短路只要未達50 ppm,則於實用上較佳,實驗例1~3與5~8之異向性導電膜全部未達50 ppm。As long as the short circuit is less than 50 ppm, it is practically preferable, and all the anisotropic conductive films of Experimental Examples 1 to 3 and 5 to 8 are less than 50 ppm.

再者,對於除實驗例4以外之各實驗例,測量由每個凸塊捕捉之導電粒子,結果均捕捉到10個以上之導電粒子。Furthermore, in each of the experimental examples other than the experimental example 4, the conductive particles captured by each bump were measured, and as a result, 10 or more conductive particles were captured.

實驗例9~16 (異向性導電膜之製作) 關於用於FOG連接之異向性導電膜,以如下方式研究絕緣性樹脂黏合劑之樹脂組成與導電粒子之配置對膜形成性能與導通特性造成之影響。Experimental Examples 9 to 16 (Fabrication of anisotropic conductive film) Regarding the anisotropic conductive film used for FOG connection, the influence of the resin composition of the insulating resin adhesive and the arrangement of the conductive particles on the film forming performance and conduction characteristics was investigated as follows.

即,以表3所示之組成製備形成絕緣性樹脂黏合劑與絕緣性接著層之樹脂組成物,使用該等,以與實驗例1同樣之方式製作異向性導電膜。將該情形時之導電粒子之配置與最接近粒子之中心間距離示於表4。於實驗例16中將導電粒子之配置設為六方晶格排列(個數密度15000個/mm2 ),使其晶格軸之一相對於異向性導電膜之長邊方向傾斜15°。That is, resin compositions for forming an insulating resin adhesive and an insulating adhesive layer were prepared with the compositions shown in Table 3, and using these, an anisotropic conductive film was produced in the same manner as in Experimental Example 1. The arrangement of the conductive particles in this case and the distance between the centers of the closest particles are shown in Table 4. In Experimental Example 16, the conductive particles were arranged in a hexagonal lattice arrangement (number density of 15,000 particles/mm 2 ), and one of the lattice axes was inclined by 15° with respect to the longitudinal direction of the anisotropic conductive film.

於該異向性導電膜之製作步驟中,將導電粒子壓入至絕緣性樹脂黏合劑中後,於實驗例12中膜形狀未得到維持,於除此以外之實驗例中膜形狀得以維持。因此,對於除實驗例12以外之實驗例之異向性導電膜,利用金屬顯微鏡觀察導電粒子之埋入狀態並進行測量,進而進行以下之評價。將各實驗例中之導電粒子之埋入狀態示於表4。表4所示之埋入狀態與表2同樣,為針對各實驗例最明確地觀察到絕緣性樹脂黏合劑之凹部者之測量值。In the production step of the anisotropic conductive film, after the conductive particles were pressed into the insulating resin adhesive, the film shape was not maintained in Experimental Example 12, and the film shape was maintained in other experimental examples. Therefore, with respect to the anisotropic conductive films of the experimental examples other than the experimental example 12, the embedded state of the conductive particles was observed and measured with a metal microscope, and the following evaluations were further performed. Table 4 shows the embedded state of the conductive particles in each experimental example. The embedded state shown in Table 4 is the same as that in Table 2, and is the measured value in which the concave portion of the insulating resin adhesive was most clearly observed for each experimental example.

(評價) 對於各實驗例之異向性導電膜,以如下方式測量(a)初始導通電阻與(b)導通可靠性。將結果示於表4。(Evaluation) For the anisotropic conductive films of each experimental example, (a) initial on-resistance and (b) on-reliability were measured as follows. The results are shown in Table 4.

(a)初始導通電阻 將各實驗例中獲得之異向性導電膜按照2 mm×40 mm裁斷,挾持於導通特性之評價用FPC與玻璃基板之間,以工具寬度2 mm進行加熱加壓(180℃、5秒),而獲得各評價用連接物。於該情形時,將利用按壓工具而獲得之推力變為低(3 MPa)、中(4.5 MPa)、高(6 MPa)之3個階段,而獲得3種評價用連接物。與實驗例1同樣地測量獲得之評價用連接物之導通電阻,按照以下之基準以3個階段評價該測量值。(a) Initial on-resistance The anisotropic conductive film obtained in each experimental example was cut to 2 mm × 40 mm, sandwiched between the FPC for evaluation of conduction characteristics and the glass substrate, and heated and pressurized with a tool width of 2 mm (180°C, 5 seconds) , and obtained the linker for each evaluation. In this case, the thrust obtained by the pressing tool was changed into three stages of low (3 MPa), medium (4.5 MPa), and high (6 MPa), and three types of connectors for evaluation were obtained. The on-resistance of the obtained connector for evaluation was measured in the same manner as in Experimental Example 1, and the measured value was evaluated in three stages according to the following criteria.

評價用FPC: 端子間距:20 μm 端子寬度/端子間空間:8.5 μm/11.5 μm 聚醯亞胺膜厚(PI)/銅箔厚(Cu)=38/8、鍍錫(Sn plating)FPC for evaluation: Terminal pitch: 20 μm Terminal width/space between terminals: 8.5 μm/11.5 μm Polyimide film thickness (PI) / copper foil thickness (Cu) = 38/8, tin plating (Sn plating)

無鹼玻璃基板: 電極:ITO配線 厚度:0.7 mmAlkali-free glass substrate: Electrode: ITO wiring Thickness: 0.7 mm

初始導通電阻之評價基準 A:未達1.6 Ω B:1.6 Ω以上且未達2.0 Ω C:2.0 Ω以上Evaluation criteria for initial on-resistance A: Less than 1.6 Ω B: 1.6 Ω or more and less than 2.0 Ω C: 2.0 Ω or more

(b)導通可靠性 將(a)中製作之評價用連接物於溫度85℃、濕度85%RH之恆溫槽中放置500小時,與初始導通電阻同樣地測量之後的導通電阻,按照以下之基準以3個階段評價該測量值。(b) Turn-on reliability The connector for evaluation prepared in (a) was placed in a constant temperature bath with a temperature of 85°C and a humidity of 85% RH for 500 hours, and the subsequent on-resistance was measured in the same manner as the initial on-resistance. The following criteria were used to evaluate the on-resistance in three stages. Measurements.

導通可靠性之評價基準 A:未達3.0 Ω B:3.0 Ω以上且未達4 Ω C:4.0 Ω以上Evaluation Criteria for On-Reliability A: Less than 3.0 Ω B: 3.0 Ω or more and less than 4 Ω C: 4.0 Ω or more

根據表4可知,於絕緣性樹脂黏合劑之最低熔融黏度為800 Pa・s之實驗例12中,難以形成具有凹部之膜。另一方面,可知於絕緣性樹脂層之最低熔融黏度為1500 Pa・s以上之實驗例中,藉由調整導電粒子之埋入時之條件,可於絕緣性樹脂黏合劑之導電粒子附近形成凹部,且如此獲得之異向性導電膜於用於FOG時導通特性良好。From Table 4, in Experimental Example 12 in which the minimum melt viscosity of the insulating resin adhesive was 800 Pa·s, it was difficult to form a film having a concave portion. On the other hand, in the experimental example in which the minimum melt viscosity of the insulating resin layer was 1500 Pa·s or more, it was found that recesses could be formed in the vicinity of the conductive particles of the insulating resin binder by adjusting the conditions for burying the conductive particles. , and the thus obtained anisotropic conductive film has good conduction characteristics when used for FOG.

(c)短路率 對已測量初始導通電阻之評價用連接物之短路數進行測量,根據測量獲得之短路數與評價用連接物之間隙數求出短路發生率。只要短路發生率未達100 ppm,則於實用上無問題。實驗例9~11與13~16之短路發生率均未達100 ppm。(c) Short circuit rate The number of short circuits in the evaluation connector for which the initial on-resistance was measured was measured, and the short-circuit occurrence rate was calculated from the number of short circuits obtained by the measurement and the number of gaps in the evaluation connector. As long as the short-circuit occurrence rate is less than 100 ppm, there is no practical problem. The short-circuit occurrence rates of Experimental Examples 9 to 11 and 13 to 16 were all less than 100 ppm.

再者,對於除實驗例12以外之各實驗例,測量由每個凸塊捕捉之導電粒子,結果均捕捉到10個以上之導電粒子。Furthermore, in each of the experimental examples other than the experimental example 12, the conductive particles captured by each bump were measured, and as a result, 10 or more conductive particles were captured.

[表3] (質量份)    FOG用組成表 組成 E F G H 絕緣性樹脂黏合劑 苯氧基樹脂(YP-50,新日鐵住友化學股份有限公司) 55 45 25 5 苯氧基樹脂(FX-316ATM55,新日鐵住金化學股份有限公司)       20 40 2官能丙烯酸酯(A-DCP,新中村化學工業股份有限公司) 20 20 20 20 2官能丙烯酸胺酯低聚物(UN-9200A,根上工業股份有限公司) 25 35 35 35 矽烷偶合劑(A-187,Momentive Performance Materials股份有限公司) 1 1 1 1 磷酸甲基丙烯酸酯(KAYAMER PM-2,日本化藥股份有限公司) 1 1 1 1 過氧化苯甲醯(Nyper BW,日本油脂股份有限公司) 5 5 5 5 絕緣性 接著層 苯氧基樹脂(FX-316ATM55,新日鐵住金化學股份有限公司) 50 2官能丙烯酸酯(A-DCP,新中村化學工業股份有限公司) 20 2官能丙烯酸胺酯低聚物(UN-9200A,根上工業股份有限公司) 30 矽烷偶合劑(A-187,Momentive Performance Materials股份有限公司) 1 磷酸甲基丙烯酸酯(KAYAMER PM-2,日本化藥股份有限公司) 1 過氧化苯甲醯(Nyper BW,日本油脂股份有限公司) 5 [table 3] (parts by mass) Composition table for FOG composition E F G H insulating resin adhesive Phenoxy resin (YP-50, Nippon Steel Sumitomo Chemical Co., Ltd.) 55 45 25 5 Phenoxy resin (FX-316ATM55, Nippon Steel & Sumitomo Metal Chemical Co., Ltd.) 20 40 2-functional acrylate (A-DCP, Shin-Nakamura Chemical Industry Co., Ltd.) 20 20 20 20 2-functional urethane acrylate oligomer (UN-9200A, Genshang Industrial Co., Ltd.) 25 35 35 35 Silane coupling agent (A-187, Momentive Performance Materials Co., Ltd.) 1 1 1 1 Phosphate methacrylate (KAYAMER PM-2, Nippon Kayaku Co., Ltd.) 1 1 1 1 Benzoyl peroxide (Nyper BW, Nippon Oil Co., Ltd.) 5 5 5 5 insulating adhesive layer Phenoxy resin (FX-316ATM55, Nippon Steel & Sumitomo Metal Chemical Co., Ltd.) 50 2-functional acrylate (A-DCP, Shin-Nakamura Chemical Industry Co., Ltd.) 20 2-functional urethane acrylate oligomer (UN-9200A, Genshang Industrial Co., Ltd.) 30 Silane coupling agent (A-187, Momentive Performance Materials Co., Ltd.) 1 Phosphate methacrylate (KAYAMER PM-2, Nippon Kayaku Co., Ltd.) 1 Benzoyl peroxide (Nyper BW, Nippon Oil Co., Ltd.) 5

[表4] FOG評價 實驗例9 實驗例10 實驗例11 實驗例12 實驗例13 實驗例14 實驗例15 實驗例16 樹脂之組成 E F G H E E E E 導電粒子壓入後之膜形狀 OK OK OK NG OK OK OK OK 導電粒子粒徑:D(μm) 3 3 3 3 3 3 3 3 導電粒子之配置 圖5 圖5 圖5 圖5 圖3 圖7 圖4 六方晶格 最接近導電粒子之中心間距離(μm) 9 9 9 9 9 9 9 9 厚度 (μm) 絕緣性樹脂黏合劑層(La) 4 4 4 4 4 4 4 4 絕緣性接著層 14 14 14 14 14 14 14 14 La/D 1.3 1.3 1.3 1.3 1.3 1.3 1.3 1.3 最低熔融黏度 (Pa·s) 絕緣性樹脂黏合劑層 8000 2000 1500 800 8000 8000 8000 8000 絕緣性接著層 800 800 800 800 800 800 800 800 合計熔融黏度 1200 900 900 800 1200 1200 1200 1200 60℃黏度 (Pa·s) 絕緣性樹脂黏合劑層 12000 3000 2000 1100 12000 12000 12000 12000 導電粒子之埋入狀態                         埋入率(100×Lb/D)% >80 >95 >95 - >80 >80 >80 >80 露出徑Lc(μm) <2.8 <2.5 <2.5 - <2.8 <2.8 <2.8 <2.8 凹部之有無 - 凹部之最大深度Le (相對於導電粒子粒徑D之比例) <50% <50% <50% - <50% <50% <50% <50% 凹部之最大徑Ld (相對於導電粒子粒徑D之比例) <1.3 <1.3 <1.3 - <1.3 <1.3 <1.3 <1.3 FOG評價                         推力:低 3 MPa 初始導通電阻 A A A - A A A B 導通可靠性 A A A - A A A B 推力:中 4.5 MPa 初始導通電阻 A A A - A A A B 導通可靠性 A A A - A A A B 推力:高 6 MPa 初始導通電阻 A A A - A A A A 導通可靠性 A A A - A A A A [Table 4] FOG evaluation Experimental example 9 Experimental Example 10 Experimental Example 11 Experimental example 12 Experimental Example 13 Experimental Example 14 Experimental example 15 Experimental Example 16 The composition of resin E F G H E E E E The shape of the film after the conductive particles are pressed OK OK OK NG OK OK OK OK Conductive particle size: D (μm) 3 3 3 3 3 3 3 3 Configuration of Conductive Particles Figure 5 Figure 5 Figure 5 Figure 5 image 3 Figure 7 Figure 4 Hexagonal lattice The distance between the centers of the nearest conductive particles (μm) 9 9 9 9 9 9 9 9 Thickness (μm) Insulating resin adhesive layer (La) 4 4 4 4 4 4 4 4 insulating adhesive layer 14 14 14 14 14 14 14 14 La/D 1.3 1.3 1.3 1.3 1.3 1.3 1.3 1.3 Minimum melt viscosity (Pa s) Insulating resin adhesive layer 8000 2000 1500 800 8000 8000 8000 8000 insulating adhesive layer 800 800 800 800 800 800 800 800 Total melt viscosity 1200 900 900 800 1200 1200 1200 1200 Viscosity at 60℃(Pa·s) Insulating resin adhesive layer 12000 3000 2000 1100 12000 12000 12000 12000 Buried state of conductive particles Buried rate (100×Lb/D)% >80 >95 >95 - >80 >80 >80 >80 Exposure diameter Lc (μm) <2.8 <2.5 <2.5 - <2.8 <2.8 <2.8 <2.8 The presence or absence of recesses Have Have Have - Have Have Have Have The maximum depth Le of the concave part (the ratio to the particle size D of the conductive particles) <50% <50% <50% - <50% <50% <50% <50% The maximum diameter Ld of the concave part (the ratio to the particle diameter D of the conductive particle) <1.3 <1.3 <1.3 - <1.3 <1.3 <1.3 <1.3 FOG evaluation Thrust: 3 MPa lower Initial on-resistance A A A - A A A B turn-on reliability A A A - A A A B Thrust: Medium 4.5 MPa Initial on-resistance A A A - A A A B turn-on reliability A A A - A A A B Thrust: High 6 MPa Initial on-resistance A A A - A A A A turn-on reliability A A A - A A A A

1A、1B、1C、1D、1E、1F、1G、1H、1I、1a、1b、1c、1d、1e:異向性導電膜 2、2a、2b、2c、2s:導電粒子 2m、2n、2o、2p、2q、2r:導電粒子列 2t:導電粒子之頂部 3:絕緣性樹脂黏合劑 3a:絕緣性樹脂黏合劑之表面 3b、3c:凹部 3P:切平面 4:絕緣性接著層 5、5B:重複單元 5a:與異向性導電膜之長邊方向平行之邊 5b:與異向性導電膜之短邊方向平行之邊 5x:依序連結形成重複單元之外形的導電粒子之中心而形成之多角形 D:平均粒徑 L1、L2:外切線 La:絕緣性樹脂黏合劑之厚度 Lb:導電粒子之埋入量 Lc:導電粒子之露出部分之徑 Ld:凹部之最大徑 Le、Lf:最大深度1A, 1B, 1C, 1D, 1E, 1F, 1G, 1H, 1I, 1a, 1b, 1c, 1d, 1e: Anisotropic conductive film 2, 2a, 2b, 2c, 2s: Conductive particles 2m, 2n, 2o, 2p, 2q, 2r: Conductive particle array 2t: top of conductive particles 3: Insulating resin adhesive 3a: Surface of insulating resin adhesive 3b, 3c: Recess 3P: Tangent plane 4: Insulating adhesive layer 5, 5B: repeating unit 5a: Side parallel to the longitudinal direction of the anisotropic conductive film 5b: The side parallel to the short side direction of the anisotropic conductive film 5x: A polygon formed by sequentially connecting the centers of the conductive particles that form the outer shape of the repeating unit D: Average particle size L1, L2: Outer tangent La: Thickness of insulating resin adhesive Lb: embedded amount of conductive particles Lc: diameter of exposed portion of conductive particles Ld: Maximum diameter of the recess Le, Lf: maximum depth

[圖1A]係表示實施例之異向性導電膜1A的導電粒子之配置的俯視圖。 [圖1B]係實施例之異向性導電膜1A之剖面圖。 [圖2]係實施例之異向性導電膜1B之俯視圖。 [圖3]係實施例之異向性導電膜1C之俯視圖。 [圖4]係實施例之異向性導電膜1D之俯視圖。 [圖5]係實施例之異向性導電膜1E之俯視圖。 [圖6]係實施例之異向性導電膜1F之俯視圖。 [圖7]係實施例之異向性導電膜1G之俯視圖。 [圖8]係實施例之異向性導電膜1H之俯視圖。 [圖9]係實施例之異向性導電膜1I之俯視圖。 [圖10]係實施例之異向性導電膜1J之俯視圖。 [圖11]係實施例之異向性導電膜1K之俯視圖。 [圖12]係實施例之異向性導電膜1a之剖面圖。 [圖13]係實施例之異向性導電膜1b之剖面圖。 [圖14]係實施例之異向性導電膜1c之剖面圖。 [圖15]係實施例之異向性導電膜1d之剖面圖。 [圖16]係實施例之異向性導電膜1e之剖面圖。1A is a plan view showing the arrangement of conductive particles in the anisotropic conductive film 1A of the example. 1B is a cross-sectional view of the anisotropic conductive film 1A of the example. 2] It is a top view of the anisotropic conductive film 1B of an Example. 3] It is a top view of the anisotropic conductive film 1C of an Example. 4] It is a top view of the anisotropic conductive film 1D of an Example. 5] It is a top view of the anisotropic conductive film 1E of an Example. 6] It is a top view of the anisotropic conductive film 1F of an Example. 7] It is a top view of the anisotropic conductive film 1G of an Example. 8] It is a top view of the anisotropic conductive film 1H of an Example. 9] It is a top view of the anisotropic conductive film 1I of an Example. 10 is a plan view of the anisotropic conductive film 1J of the example. 11 is a plan view of the anisotropic conductive film 1K of the example. 12 is a cross-sectional view of the anisotropic conductive film 1a of the example. 13 is a cross-sectional view of the anisotropic conductive film 1b of the embodiment. 14 is a cross-sectional view of the anisotropic conductive film 1c of the example. 15 is a cross-sectional view of the anisotropic conductive film 1d of the example. FIG. 16 is a cross-sectional view of the anisotropic conductive film 1e of the example.

Claims (14)

一種異向性導電膜之製造方法,其係於絕緣性樹脂黏合劑中配置有導電粒子之異向性導電膜之製造方法,且其包括: 於該絕緣性樹脂黏合劑上重複配置導電粒子之重複單元,該導電粒子之重複單元係導電粒子隔開間隔排列為一列而成之導電粒子列且為導電粒子數不同者並列而成。A method of manufacturing an anisotropic conductive film, comprising: Repeating units of conductive particles are repeatedly arranged on the insulating resin adhesive. The repeating units of the conductive particles are conductive particle rows in which conductive particles are spaced apart and arranged in a row, and those with different numbers of conductive particles are juxtaposed. 如請求項1之異向性導電膜之製造方法,其中,重複單元配置於異向性導電膜之整個面。The method for producing an anisotropic conductive film according to claim 1, wherein the repeating unit is arranged on the entire surface of the anisotropic conductive film. 如請求項1之異向性導電膜之製造方法,其中,構成重複單元中並列之導電粒子列的導電粒子數逐漸不同。The method for producing an anisotropic conductive film according to claim 1, wherein the number of conductive particles constituting the row of conductive particles arranged in the repeating unit gradually varies. 如請求項1之異向性導電膜之製造方法,其中,於重複單元中並列之3列導電粒子列中,構成中央之導電粒子列的導電粒子數多於或少於構成兩側之導電粒子列的導電粒子數。The method for producing an anisotropic conductive film as claimed in claim 1, wherein among the 3 rows of conductive particle rows juxtaposed in the repeating unit, the number of conductive particles constituting the central conductive particle row is more or less than the number of conductive particles constituting both sides The number of conductive particles in the column. 如請求項1之異向性導電膜之製造方法,其中,依序連結形成重複單元之外形的導電粒子之中心而形成之多角形的各邊與異向性導電膜之長邊方向或短邊方向斜交。The method for producing an anisotropic conductive film according to claim 1, wherein the sides of the polygon formed by sequentially connecting the centers of the conductive particles forming the outer shape of the repeating unit and the longitudinal direction or the short side of the anisotropic conductive film Oblique direction. 如請求項1之異向性導電膜之製造方法,其中,依序連結形成重複單元之外形的導電粒子之中心而形成之多角形具有與異向性導電膜之長邊方向或短邊方向平行之邊。The method for producing an anisotropic conductive film according to claim 1, wherein the polygons formed by sequentially connecting the centers of the conductive particles forming the outer shape of the repeating unit have a length parallel to the long-side direction or the short-side direction of the anisotropic conductive film edge. 如請求項1之異向性導電膜之製造方法,其中,於重複單元中導電粒子列彼此平行。The method for producing an anisotropic conductive film according to claim 1, wherein the conductive particle rows in the repeating unit are parallel to each other. 如請求項1之異向性導電膜之製造方法,其與重複單元一併重複配置有單獨之導電粒子。The method for producing an anisotropic conductive film according to claim 1, wherein separate conductive particles are repeatedly arranged together with the repeating unit. 如請求項1之異向性導電膜之製造方法,其中,於重複單元內,鄰接之導電粒子彼此之最接近距離為導電粒子的平均粒徑之0.5倍以上。The method for producing an anisotropic conductive film according to claim 1, wherein in the repeating unit, the closest distance between adjacent conductive particles is 0.5 times or more the average particle diameter of the conductive particles. 如請求項1之異向性導電膜之製造方法,其中,構成重複單元之導電粒子係自導電粒子存在於六方晶格或正方晶格之各晶格點之配置規則地除去特定之晶格點之導電粒子而成之配置。The method for producing an anisotropic conductive film according to claim 1, wherein the conductive particles constituting the repeating unit are formed by regularly removing specific lattice points from the arrangement of the conductive particles existing in each lattice point of the hexagonal lattice or the square lattice The configuration of the conductive particles. 一種異向性導電膜之設計方法,其係於絕緣性樹脂黏合劑中配置有導電粒子之異向性導電膜之設計方法,且其包括: 於該絕緣性樹脂黏合劑上重複配置導電粒子之重複單元,該導電粒子之重複單元係導電粒子隔開間隔排列為一列而成之導電粒子列且為導電粒子數不同者並列而成。A design method of an anisotropic conductive film, which is a design method of an anisotropic conductive film in which conductive particles are arranged in an insulating resin adhesive, and includes: Repeating units of conductive particles are repeatedly arranged on the insulating resin adhesive. The repeating units of the conductive particles are conductive particle rows in which conductive particles are spaced apart and arranged in a row, and those with different numbers of conductive particles are juxtaposed. 一種異向性導電膜,其於絕緣性樹脂黏合劑中配置有導電粒子,且 其重複配置有導電粒子之重複單元,該導電粒子之重複單元係導電粒子隔開間隔排列為一列而成之導電粒子列,依序連結形成重複單元之外形的導電粒子之中心而形成多角形,被重複配置之重複單元之間存在未配置導電粒子之區域。An anisotropic conductive film comprising conductive particles arranged in an insulating resin adhesive, and The repeating units of the conductive particles are arranged repeatedly, and the repeating units of the conductive particles are conductive particle rows formed by the conductive particles arranged in a row at intervals, and the centers of the conductive particles forming the outer shape of the repeating units are sequentially connected to form a polygon. There is a region where no conductive particles are arranged between the repeating units arranged repeatedly. 一種連接結構體,其藉由請求項12之異向性導電膜將第1電子零件與第2電子零件進行異向性導電連接。A connection structure in which a first electronic component and a second electronic component are anisotropically conductively connected by the anisotropic conductive film of claim 12. 一種連接結構體之製造方法,其藉由經由異向性導電膜將第1電子零件與第2電子零件進行壓接而製造第1電子零件與第2電子零件之連接結構體,且其使用請求項12之異向性導電膜作為異向性導電膜。A method of manufacturing a connection structure, which manufactures a connection structure of a first electronic component and a second electronic component by crimping a first electronic component and a second electronic component through an anisotropic conductive film, and its use is required The anisotropic conductive film of item 12 serves as an anisotropic conductive film.
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