TW202142604A - Optical film and flexible display device with excellent visibility in a wide-angle direction and sufficient mechanical properties even in a low temperature environment - Google Patents

Optical film and flexible display device with excellent visibility in a wide-angle direction and sufficient mechanical properties even in a low temperature environment Download PDF

Info

Publication number
TW202142604A
TW202142604A TW110109109A TW110109109A TW202142604A TW 202142604 A TW202142604 A TW 202142604A TW 110109109 A TW110109109 A TW 110109109A TW 110109109 A TW110109109 A TW 110109109A TW 202142604 A TW202142604 A TW 202142604A
Authority
TW
Taiwan
Prior art keywords
optical film
formula
film
group
resin
Prior art date
Application number
TW110109109A
Other languages
Chinese (zh)
Inventor
大松一喜
福井仁之
唐澤真義
Original Assignee
日商住友化學股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商住友化學股份有限公司 filed Critical 日商住友化學股份有限公司
Publication of TW202142604A publication Critical patent/TW202142604A/en

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/14Polyamide-imides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/042Coating with two or more layers, where at least one layer of a composition contains a polymer binder
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/046Forming abrasion-resistant coatings; Forming surface-hardening coatings
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D179/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
    • C09D179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C09D179/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • G09F9/301Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements flexible foldable or roll-able electronic displays, e.g. thin LCD, OLED
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2367/00Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
    • C08J2367/02Polyesters derived from dicarboxylic acids and dihydroxy compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2377/00Characterised by the use of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2379/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
    • C08J2379/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08J2379/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2479/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2461/00 - C08J2477/00
    • C08J2479/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08J2479/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Optics & Photonics (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Human Computer Interaction (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Polarising Elements (AREA)
  • Electroluminescent Light Sources (AREA)
  • Laminated Bodies (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

Provided are an optical film with excellent visibility in a wide-angle direction and sufficient mechanical properties even in a low temperature environment and a flexible display device equipped with the optical film. The optical film of this invention contains at least one resin selected from a group consisting of polyimide resin and polyamide resin, having a full light-transmissive rate of 85% or more, a haze of 0.5% or less, and a tensile modulus of elasticity of 5.1 GPa or more; when the direction parallel to the machine travel direction in the film plane during manufacturing is defined as the MD direction, and the direction perpendicular to the machine travel direction is defined as the TD direction, for at least any surface of the optical film, the first reflection image clarity value CMD obtained in accordance with JIS K 7374 when the slit width of the optical comb is 0.125 mm and in the direction inclined 60 degrees from the vertical direction to the MD direction with respect to the film plane and the second reflection image clarity value CTD inclined 60 degrees from the vertical direction to the TD direction satisfy the following: formula (1) 45% ≤ CMD ≤ 100%; formula (2) 30% ≤ CTD ≤ 100%; and formula (3) 35% ≤ (CMD + CTD)/2 ≤ 100%, and the breaking strain [epsilon]1 of the optical film at -40 DEG C and the breaking strain [epsilon]2 at 25 DEG C satisfy the formula (4): 0.70 ≤ [epsilon]1/[epsilon]2 ≤ 1.20.

Description

光學膜及可撓式顯示裝置Optical film and flexible display device

本發明係關於一種含有選自由聚醯亞胺系樹脂及聚醯胺系樹脂所組成之群中之至少一種樹脂之光學膜、及具備該光學膜之可撓式顯示裝置。The present invention relates to an optical film containing at least one resin selected from the group consisting of polyimide resins and polyamide resins, and a flexible display device provided with the optical film.

先前,使用玻璃作為太陽電池或圖像顯示裝置等顯示構件之材料。然而,針對近年來之小型化、薄型化、輕量化及可撓化之要求,玻璃並非具有充分之材質者,因此正在研究各種膜作為玻璃之代替材料。作為此種膜,例如有聚醯亞胺膜(例如專利文獻1及2)。 [先前技術文獻] [專利文獻]Previously, glass was used as a material for display components such as solar cells or image display devices. However, in response to recent requirements for miniaturization, thinning, weight reduction, and flexibility, glass does not have sufficient materials. Therefore, various films are being studied as alternative materials for glass. As such a film, for example, there is a polyimide film (for example, Patent Documents 1 and 2). [Prior Technical Literature] [Patent Literature]

[專利文獻1]日本專利特開2009-215412號公報 [專利文獻2]日本專利特開2020-3781號公報[Patent Document 1] Japanese Patent Laid-Open No. 2009-215412 [Patent Document 2] Japanese Patent Laid-Open No. 2020-3781

[發明所欲解決之問題][The problem to be solved by the invention]

於將聚醯亞胺系樹脂膜應用於可撓式顯示裝置之前面板等透明構件之情形時,存在以圖像顯示面彎曲之狀態顯示影像之情形,故而較之非彎曲性之圖像顯示面,要求廣角方向優異之視認性。然而,根據本發明者之研究,先前之聚醯亞胺系樹脂膜存在無法充分滿足廣角方向之視認性之情形。又,尤其於低溫環境下使用本發明之光學膜時,存在無法獲得光學膜之充分之力學特性之情形。When a polyimide resin film is applied to a transparent member such as a front panel of a flexible display device, the image may be displayed in a state where the image display surface is curved. Therefore, it is compared with a non-flexible image display surface. , Requires excellent visibility in the wide-angle direction. However, according to the research of the present inventors, the prior polyimide-based resin film may not sufficiently satisfy the visibility in the wide-angle direction. In addition, especially when the optical film of the present invention is used in a low temperature environment, there are cases where sufficient mechanical properties of the optical film cannot be obtained.

又,本發明者研究發現:例如專利文獻1及2中記載之光學膜存在無法充分滿足廣角方向之視認性之情形。In addition, the inventors of the present invention have discovered that, for example, the optical films described in Patent Documents 1 and 2 may not sufficiently satisfy the visibility in the wide-angle direction.

因此,本發明之目的在於提供一種廣角方向之視認性優異,並且即使於低溫環境下亦具有充分之力學特性之光學膜,及具備該光學膜之可撓式顯示裝置。 [解決問題之技術手段]Therefore, the object of the present invention is to provide an optical film having excellent visibility in a wide-angle direction and sufficient mechanical properties even in a low temperature environment, and a flexible display device provided with the optical film. [Technical means to solve the problem]

本發明者等人為解決上述課題而進行潛心研究,結果發現藉由如下之光學膜,可解決上述課題,從而完成本發明,上述光學膜係含有選自由聚醯亞胺系樹脂及聚醯胺系樹脂所組成之群中之至少一種樹脂者,並且全光線透過率為85%以上,霧度為0.5%以下,25℃下之拉伸彈性模數為5.1 GPa以上,光學膜之-40℃下之破斷應變ε1 與25℃下之破斷應變ε2 滿足特定關係。即,本發明中包含以下態樣。The inventors of the present invention have made painstaking research to solve the above-mentioned problems. As a result, they have found that the above-mentioned problems can be solved by the following optical film. The above-mentioned optical film contains a polyimide resin and a polyamide resin At least one resin in the group of resins, with a total light transmittance of 85% or more, a haze of 0.5% or less, a tensile modulus of 5.1 GPa or more at 25°C, and an optical film's -40°C The breaking strain ε 1 and the breaking strain ε 2 at 25°C satisfy a specific relationship. That is, the following aspects are included in the present invention.

[1]一種光學膜,其係含有選自由聚醯亞胺系樹脂及聚醯胺系樹脂所組成之群中之至少一種樹脂者,並且全光線透過率為85%以上,霧度為0.5%以下,拉伸彈性模數為5.1 GPa以上, 於上述光學膜面內將與製造時之機械流動方向平行之方向設為MD方向,將與該機械流動方向垂直之方向設為TD方向時,於上述光學膜之至少任一面,依據JIS K 7374於光梳之狹縫寬度為0.125 mm之情形時所獲得的自相對於上述光學膜之平面垂直之方向朝向上述MD方向傾斜60°之方向之第1反射圖像清晰度值CMD 與自上述垂直方向朝向上述TD方向傾斜60°之方向之第2反射圖像清晰度值CTD 滿足 數式(1): 45%≦CMD ≦100%・・・(1)、 數式(2): 30%≦CTD ≦100%・・・(2)、及 數式(3): 35%≦(CMD +CTD )/2≦100%・・・(3), 上述光學膜之-40℃下之破斷應變ε1 與25℃下之破斷應變ε2 滿足數式(4): 0.70≦ε12 ≦1.20・・・(4)。 [2]如上述[1]之光學膜,其中依據JIS K 5600-5-1之耐彎曲性試驗前後之上述霧度之差ΔHaze未達0.3%。 [3]如上述[1]或[2]之光學膜,其中依據JIS K 5600-5-1之耐彎曲性試驗前後之上述第1反射圖像清晰度值之差ΔCMD 及上述第2反射圖像清晰度值之差ΔCTD 未達15。 [4]如上述[1]至[3]中任一項之光學膜,其厚度為10~150 μm。 [5]如上述[1]至[4]中任一項之光學膜,其中光學膜中之填料之含量相對於光學膜之總質量為0~5質量%。 [6]如上述[1]至[5]中任一項之光學膜,其中於至少一面具有硬塗層。 [7]如上述[6]之光學膜,其中上述硬塗層之厚度為3~30 μm。 [8]一種可撓式顯示裝置,其具備如上述[1]至[7]中任一項之光學膜。 [9]如上述[8]之可撓式顯示裝置,其進而具備偏光板。 [10]如上述[8]或[9]之可撓式顯示裝置,其進而具備觸控感測器。 [發明之效果][1] An optical film containing at least one resin selected from the group consisting of polyimide resins and polyimide resins, and has a total light transmittance of 85% or more and a haze of 0.5% Hereinafter, when the tensile modulus of elasticity is 5.1 GPa or more, the direction parallel to the mechanical flow direction during manufacture is set as the MD direction in the above optical film plane, and the direction perpendicular to the mechanical flow direction is set as the TD direction. At least any surface of the above optical film is obtained in accordance with JIS K 7374 when the slit width of the optical comb is 0.125 mm from a direction perpendicular to the plane of the optical film to a direction inclined 60° in the MD direction. 1 The reflected image sharpness value C MD and the second reflected image sharpness value C TD in a direction inclined 60° from the above vertical direction to the above TD direction satisfy the equation (1): 45%≦C MD ≦100%・・・(1), formula (2): 30%≦C TD ≦100%・・・(2), and formula (3): 35%≦(C MD +C TD )/2≦100%・・· (3), at the break of the optical film of -40 ℃ strain ε 1 and broken off at the breaking strain ε 2 25 ℃ satisfy equation (4): 0.70 ≦ ε 1 / ε 2 ≦ 1.20 · · · (4 ). [2] The optical film of [1] above, wherein the difference ΔHaze between the haze before and after the bending resistance test according to JIS K 5600-5-1 is less than 0.3%. [3] The optical film of [1] or [2] above, wherein the difference ΔC MD between the first reflection image sharpness value before and after the bending resistance test according to JIS K 5600-5-1 and the second reflection The difference in image sharpness value ΔC TD is less than 15. [4] The optical film of any one of [1] to [3] above, which has a thickness of 10 to 150 μm. [5] The optical film according to any one of [1] to [4] above, wherein the content of the filler in the optical film is 0 to 5% by mass relative to the total mass of the optical film. [6] The optical film according to any one of [1] to [5] above, which has a hard coat layer on at least one side. [7] The optical film of the above [6], wherein the thickness of the hard coat layer is 3-30 μm. [8] A flexible display device including the optical film of any one of [1] to [7] above. [9] The flexible display device of [8] above, which further includes a polarizing plate. [10] The flexible display device of [8] or [9] above, which is further provided with a touch sensor. [Effects of the invention]

根據本發明,可提供一種廣角方向之視認性優異,並且即使於低溫環境下亦具有充分之力學特性之光學膜,及具備該光學膜之可撓式顯示裝置。According to the present invention, it is possible to provide an optical film having excellent visibility in a wide-angle direction and sufficient mechanical properties even in a low temperature environment, and a flexible display device provided with the optical film.

以下,詳細說明本發明之實施方式。再者,本發明之範圍並不限定於此處說明之實施方式,可於不脫離本發明之主旨之範圍內進行各種變更。又,於針對特定參數記載複數個上限值及下限值之情形時,可將該等上限值及下限值中之任意上限值與下限值組合而作為較佳之數值範圍。Hereinafter, embodiments of the present invention will be described in detail. Furthermore, the scope of the present invention is not limited to the embodiments described here, and various changes can be made without departing from the spirit of the present invention. In addition, when a plurality of upper limit values and lower limit values are described for a specific parameter, any upper limit value and lower limit value of the upper limit value and lower limit value can be combined as a preferable numerical range.

<光學膜> 本發明之光學膜含有選自由聚醯亞胺系樹脂及聚醯胺系樹脂所組成之群中之至少一種樹脂,全光線透過率為85%以上,霧度為0.5%以下,25℃下之拉伸彈性模數為5.1 GPa以上, 於上述光學膜面內將與製造時之機械流動方向平行之方向設為MD方向,將與該機械流動方向垂直之方向設為TD方向時,於上述光學膜之至少任一個面,依據JIS K 7374於光梳之狹縫寬度為0.125 mm之情形時所獲得的自相對於上述光學膜之平面垂直之方向朝向上述MD方向傾斜60°之方向之第1反射圖像清晰度值CMD 與自上述垂直方向朝向上述TD方向傾斜60°之方向之第2反射圖像清晰度值CTD 滿足 數式(1): 45%≦CMD ≦100%・・・(1)、 數式(2): 30%≦CTD ≦100%・・・(2)、及 數式(3): 35%≦(CMD +CTD )/2≦100%・・・(3), 上述光學膜之-40℃下之破斷應變ε1 與25℃下之破斷應變ε2 滿足數式(4): 0.70≦ε12 ≦1.20・・・(4)。<Optical film> The optical film of the present invention contains at least one resin selected from the group consisting of polyimide resins and polyamide resins, and has a total light transmittance of 85% or more and a haze of 0.5% or less, When the tensile modulus of elasticity at 25°C is 5.1 GPa or more, the direction parallel to the mechanical flow direction during manufacture is set as the MD direction in the above-mentioned optical film plane, and the direction perpendicular to the mechanical flow direction is set as the TD direction , On at least any one surface of the above-mentioned optical film, obtained in accordance with JIS K 7374 when the slit width of the optical comb is 0.125 mm from a direction perpendicular to the plane of the above-mentioned optical film to the above-mentioned MD direction inclined by 60° The first reflected image sharpness value C MD in the direction and the second reflected image sharpness value C TD in a direction inclined 60° from the vertical direction to the TD direction satisfy the formula (1): 45%≦C MD ≦ 100%・・・(1), formula (2): 30%≦C TD ≦100%・・・(2), and formula (3): 35%≦(C MD +C TD )/2≦100 ·% (3), at the break of the optical film of -40 ℃ strain ε 1 and broken off at the breaking strain ε 2 25 ℃ satisfy equation (4): 0.70 ≦ ε 1 / ε 2 ≦ 1.20 · ·・(4).

MD方向係於光學膜面內與製造時之機械流動方向平行之方向,例如表示於以溶液澆鑄法製造之情形時與搬送光學膜之方向平行之方向。TD方向係與上述機械流動方向垂直之方向,例如表示與搬送方向垂直之方向。光學膜面內之MD方向及TD方向於其方向不明確之情形時係藉由以下方法決定。關於MD與TD,進行光學膜之至少20點以上之不同方向之截面剖切。更詳細而言,假定以光學膜之任意1點為中點之圓,自該光學膜切出其半圓,進而以切斷該半圓後之扇形之中心角成為大致均等之方式,將光學膜以直線狀切斷,進行20個以上之截面剖切。藉由雷射拉曼測定所獲得之複數個截面之厚度之中心,將1,620 cm-1 附近之波峰強度最大者設為MD方向。The MD direction is a direction parallel to the direction of mechanical flow during manufacture in the optical film plane, for example, indicates a direction parallel to the direction of transporting the optical film when manufactured by a solution casting method. The TD direction is a direction perpendicular to the above-mentioned mechanical flow direction, for example, it means a direction perpendicular to the conveying direction. The MD direction and TD direction in the optical film plane are determined by the following method when their directions are not clear. Regarding MD and TD, at least 20 points of cross-section of the optical film in different directions are cut. In more detail, suppose a circle with any one point of the optical film as the midpoint, cut out a semicircle from the optical film, and then cut the semicircle with the central angle of the fan shape being approximately equal, the optical film is Cut in a straight line and cut more than 20 cross-sections. The center of the thickness of a plurality of cross-sections obtained by laser Raman measurement, and the highest peak intensity near 1,620 cm -1 is set as the MD direction.

第1反射圖像清晰度值CMD 係依據日本工業標準(JIS) K 7374而獲得的自相對於光學膜之平面垂直之方向朝向MD方向傾斜60°之方向之反射圖像清晰度值。參考圖1,更具體說明第1反射圖像清晰度值CMD 。圖1係表示第1反射圖像清晰度值之測定中之光軸之圖。沿以光學膜1之面上之任意點(第1照射位置11)為支點自相對於光學膜1垂直之軸(垂直軸3)朝向MD方向傾斜角度60°之軸(第1光軸14),對光學膜1照射第1照射光10(白色光:圖1中以實線標示)。繼而,使第1鏡面反射光12(圖1中以虛線標示)透過垂直於以第1照射位置11為支點自垂直軸3朝向MD方向傾斜-60°之第1方向地延伸之第1光梳16。繼而,以於第1方向上延伸之第1受光器19接收透過第1光梳16之第1透過光18(圖1中以單點鏈線標示)。第1光梳16具有使第1鏡面反射光12透過之開口部與遮斷第1鏡面反射光12之遮光部。第1光梳16之狹縫寬度(開口部之寬度)為0.125 mm。 於相對於第1光梳16之平面平行且第1光梳16中之狹縫所排列之方向(箭頭A之方向)上,使第1光梳16移動特定之單位寬度並接收第1透過光18,重複該操作而獲得受光波形。自所獲得之受光波形獲得相對光量之最大值M及最小值m。自所獲得之M及m,基於數式(5)算出第1反射圖像清晰度值CMD

Figure 02_image001
。 反射圖像清晰度值(第1反射圖像清晰度值及下述第2反射圖像清晰度值)可使用圖像清晰度測定器而測定。The first reflected image sharpness value C MD is a reflected image sharpness value obtained in accordance with Japanese Industrial Standards (JIS) K 7374 from a direction perpendicular to the plane of the optical film to a direction inclined 60° to the MD direction. With reference to Fig. 1, the first reflected image sharpness value C MD will be described in more detail. Fig. 1 is a diagram showing the optical axis in the measurement of the first reflected image sharpness value. Along an arbitrary point on the surface of the optical film 1 (first irradiation position 11) as a fulcrum, from an axis perpendicular to the optical film 1 (vertical axis 3) to an axis with an angle of 60° in the MD direction (first optical axis 14) , Irradiate the optical film 1 with the first irradiation light 10 (white light: indicated by a solid line in FIG. 1). Then, the first specular reflection light 12 (indicated by the dotted line in FIG. 1) is transmitted through the first optical comb extending perpendicularly to the first direction with the first irradiation position 11 as a fulcrum and inclined from the vertical axis 3 to the MD direction by -60° 16. Then, the first light receiver 19 extending in the first direction receives the first transmitted light 18 (indicated by a single-dot chain line in FIG. 1) that has passed through the first optical comb 16. The first optical comb 16 has an opening portion through which the first specular reflection light 12 passes, and a light shielding portion that blocks the first specular reflection light 12. The slit width (width of the opening) of the first optical comb 16 is 0.125 mm. In the direction parallel to the plane of the first optical comb 16 and in which the slits in the first optical comb 16 are arranged (the direction of arrow A), the first optical comb 16 is moved by a specific unit width and receives the first transmitted light 18. Repeat the operation to obtain the received light waveform. Obtain the maximum value M and the minimum value m of the relative light intensity from the received light waveform. From the obtained M and m, calculate the first reflection image sharpness value C MD based on the equation (5)
Figure 02_image001
. The reflected image sharpness value (the first reflected image sharpness value and the second reflected image sharpness value described below) can be measured using an image sharpness measuring device.

若第1反射圖像清晰度值CMD 滿足數式(1),則光學膜於MD方向之廣角方向之視認性優異。第1反射圖像清晰度值CMD 於數式(1)中為45%以上,就進一步提高光學膜於MD方向之廣角方向之視認性之觀點而言,較佳為47%以上,更佳為48%以上,進而較佳為50%以上,進而更佳為55%以上,尤佳為60%以上,通常為100%以下。If the first reflected image sharpness value C MD satisfies the formula (1), the visibility of the optical film in the wide-angle direction of the MD direction is excellent. The first reflected image clarity value C MD is 45% or more in the formula (1). From the viewpoint of further improving the visibility of the optical film in the wide-angle direction in the MD direction, it is preferably 47% or more, more preferably It is 48% or more, more preferably 50% or more, still more preferably 55% or more, particularly preferably 60% or more, and usually 100% or less.

第2反射圖像清晰度值CTD 係依據JIS K 7374而獲得的自相對於光學膜之平面垂直之方向朝向TD方向傾斜60°之方向之反射圖像清晰度值。參考圖2,更具體說明第2反射圖像清晰度值CTD 。圖2係表示第2反射圖像清晰度值之測定中之光軸之圖。沿以光學膜1之面上之任意點(第2照射位置21)為支點自相對於光學膜1垂直之軸(垂直軸3)朝向TD方向傾斜角度60°之軸(第2光軸24),對光學膜1照射第2照射光20(白色光:圖2中以實線標示)。繼而,使第2鏡面反射光22(圖2中以虛線標示)透過垂直於以第2照射位置21為支點自垂直軸3朝向TD方向傾斜-60°之第2方向地延伸之第2光梳26。繼而,以於第2方向上延伸之受光器29接收透過第2光梳26之第2透過光28(圖2中以單點鏈線標示)。第2光梳26具有使第2鏡面反射光22透過之開口部與遮斷第2鏡面反射光22之遮光部。第2光梳26之狹縫寬度(開口部之寬度)為0.125 mm。 於相對於第2光梳26之平面平行且第2光梳26中之狹縫所排列之方向(箭頭B之方向)上,使第2光梳26移動特定之單位寬度並接收第2透過光28,重複該操作而獲得受光波形。自所獲得之受光波形獲得相對光量之最大值M及最小值m。自所獲得之M及m,基於數式(5)算出第2反射圖像清晰度值CTDThe second reflection image definition value C TD is a reflection image definition value obtained in accordance with JIS K 7374 from a direction perpendicular to the plane of the optical film to a direction inclined 60° toward the TD direction. With reference to Fig. 2, the second reflection image sharpness value C TD will be described in more detail. Fig. 2 is a diagram showing the optical axis in the measurement of the sharpness value of the second reflected image. Along an arbitrary point on the surface of the optical film 1 (second irradiation position 21) as a fulcrum, from the axis perpendicular to the optical film 1 (vertical axis 3) to an axis with an angle of 60° in the TD direction (second optical axis 24) , Irradiate the optical film 1 with the second irradiation light 20 (white light: indicated by a solid line in FIG. 2). Then, the second specular reflection light 22 (marked by a dotted line in FIG. 2) is transmitted through a second optical comb extending perpendicular to the second direction from the vertical axis 3 toward the TD direction by -60° with the second irradiation position 21 as a fulcrum. 26. Then, the light receiver 29 extending in the second direction receives the second transmitted light 28 (indicated by a single-dot chain line in FIG. 2) that has passed through the second optical comb 26. The second optical comb 26 has an opening through which the second specular reflection light 22 passes, and a light shielding part which blocks the second specular reflection light 22. The slit width (width of the opening) of the second optical comb 26 is 0.125 mm. In the direction in which the slits in the second optical comb 26 are arranged parallel to the plane of the second optical comb 26 (the direction of arrow B), the second optical comb 26 is moved by a specific unit width and receives the second transmitted light 28. Repeat the operation to obtain the received light waveform. Obtain the maximum value M and the minimum value m of the relative light intensity from the received light waveform. From the obtained M and m, the second reflection image sharpness value C TD is calculated based on the equation (5).

若第2反射圖像清晰度值CTD 滿足數式(2),則光學膜於TD方向之廣角方向之視認性優異。第2反射圖像清晰度值CTD 於數式(2)中為30%以上,就進一步提高光學膜於TD方向之廣角方向之視認性之觀點而言,較佳為35%以上,更佳為38%以上,進而較佳為40%以上,進而更佳為45%以上,尤佳為50%以上,尤其更佳為55%以上,通常為100%以下。If the second reflection image sharpness value C TD satisfies the formula (2), the optical film has excellent visibility in the wide-angle direction of the TD direction. The second reflection image sharpness value C TD in the formula (2) is 30% or more. From the viewpoint of further improving the visibility of the optical film in the wide-angle direction in the TD direction, it is preferably 35% or more, more preferably It is 38% or more, more preferably 40% or more, still more preferably 45% or more, particularly preferably 50% or more, especially more preferably 55% or more, and usually 100% or less.

若第1反射圖像清晰度值CMD 及第2反射圖像清晰度值CTD 之平均值{(CMD +CTD )/2}滿足數式(3),則光學膜於MD方向及TD方向之廣角方向之視認性之差異較小。(CMD +CTD )/2為35%以上,就進一步減小光學膜於MD方向及TD方向之廣角方向之視認性之差異之觀點而言,較佳為38%以上,更佳為40%以上,進而較佳為44%以上,進而更佳為45%以上,尤佳為50%以上,尤其更佳為55%以上,通常為100%以下。If the average value of the first reflection image definition value C MD and the second reflection image definition value C TD {(C MD +C TD )/2} satisfies the formula (3), then the optical film is in the MD direction and TD The difference in visibility between the direction and the wide-angle direction is small. (C MD + C TD )/2 is 35% or more. From the viewpoint of further reducing the difference in the visibility of the optical film in the wide-angle direction between the MD direction and the TD direction, it is preferably 38% or more, more preferably 40% Above, it is more preferably 44% or more, still more preferably 45% or more, particularly preferably 50% or more, particularly more preferably 55% or more, and usually 100% or less.

反射圖像清晰度值(更具體而言,第1反射圖像清晰度值CMD 及第2反射圖像清晰度值CTD )可藉由提高光學膜表面之平滑性,抑制光學膜表面之散射等而調整。進而,光學膜表面之平滑性例如可藉由光學膜之組成(更具體而言,填料之種類、粒徑及含量等)及光學膜之製造條件(更具體而言,乾燥溫度、乾燥時間、乾燥系統中之氣流、塗膜之厚度、乾燥步驟中之搬送速度及清漆中之溶劑量等)而調整。於光學膜進而含有硬塗層之情形時,可藉由提高硬塗層表面之平滑性,抑制硬塗層表面之散射等而調整。硬塗層之平滑性除上述光學膜之平滑性之調整方法外,例如亦可藉由溶劑之種類、成分比、固形物成分濃度之調整及調平劑之添加等而調整。The reflection image definition value (more specifically, the first reflection image definition value C MD and the second reflection image definition value C TD ) can improve the smoothness of the optical film surface and suppress the Adjust for scattering, etc. Furthermore, the smoothness of the optical film surface can be determined by, for example, the composition of the optical film (more specifically, the type, particle size and content of the filler, etc.) and the manufacturing conditions of the optical film (more specifically, drying temperature, drying time, The airflow in the drying system, the thickness of the coating film, the conveying speed in the drying step, and the amount of solvent in the varnish, etc.) are adjusted. When the optical film further contains a hard coat layer, it can be adjusted by improving the smoothness of the hard coat layer surface and suppressing the scattering of the hard coat layer surface. In addition to the smoothness adjustment method of the optical film described above, the smoothness of the hard coat layer can also be adjusted by, for example, the type of solvent, the component ratio, the adjustment of the solid content concentration, and the addition of a leveling agent.

又,對本發明之光學膜而言,只要於該光學膜之至少任一面滿足數式(1)~數式(3)即可,更佳為於該光學膜之雙面滿足數式(1)~數式(3)。若於雙面滿足數式(1)~數式(3),則例如將光學膜之任一面用於電子裝置之圖像顯示面時,對廣角方向之視認性均優異。In addition, for the optical film of the present invention, it is sufficient that at least one of the surfaces of the optical film satisfies the formula (1) to the formula (3), and it is more preferable that the optical film satisfies the formula (1) on both sides of the optical film. ~ Numerical formula (3). If the equations (1) to (3) are satisfied on both sides, for example, when either side of the optical film is used for the image display surface of an electronic device, the visibility in the wide-angle direction is excellent.

尤其,於將本發明之光學膜應用於可撓式裝置之前面板之情形時,就進一步提高廣角方向之視認性之觀點而言,依據JIS K 5600-5-1之耐彎曲性試驗前後之第1反射圖像清晰度值之差之絕對值ΔCMD 及第2反射圖像清晰度值之差之絕對值ΔCTD 分別較佳為未達15。若耐彎曲性試驗前後之該反射圖像清晰度值之差未達15,則即使以尤其是可撓式裝置之圖像顯示面彎曲之狀態使用及/或以彎曲狀態使用後,亦具有廣角方向之優異之視認性。ΔCMD 較佳為未達15,更佳為14以下,進而較佳為13以下。ΔCTD 較佳為未達15,更佳為14以下,進而較佳為13以下。In particular, when the optical film of the present invention is applied to the front panel of a flexible device, from the viewpoint of further improving the visibility in the wide-angle direction, the first before and after the bending resistance test according to JIS K 5600-5-1 The absolute value ΔC MD of the difference between the sharpness value of 1 reflection image and the absolute value ΔC TD of the difference between the sharpness value of the second reflection image are preferably less than 15 respectively. If the difference in the clarity value of the reflected image before and after the bending resistance test is less than 15, even if the image display surface of the flexible device is used in a curved state and/or after being used in a curved state, it will have a wide angle Excellent visibility of direction. ΔC MD is preferably less than 15, more preferably 14 or less, and still more preferably 13 or less. ΔC TD is preferably less than 15, more preferably 14 or less, and still more preferably 13 or less.

進而,關於本發明之光學膜,全光線透過率為85%以上,霧度為0.5%以下,25℃下之拉伸彈性模數為5.1 GPa以上。於全光線透過率未達85%或霧度未達0.5%之情形時,光學膜之初始之光學特性較低,故而無法達成光學膜之充分之視認性。又,於拉伸彈性模數未達5.1 GPa之情形時,無法充分提高光學膜之耐彎曲性。又,本發明之光學膜之-40℃下之破斷應變ε1 與25℃下之破斷應變ε2 滿足數式(4): 0.70≦ε12 ≦1.20・・・(4)。 於ε12 未達0.70之情形時,低溫下之破斷應變過低,故而無法獲得低溫環境下之拉伸彈性模數等光學膜之充分之力學特性。Furthermore, regarding the optical film of the present invention, the total light transmittance is 85% or more, the haze is 0.5% or less, and the tensile modulus of elasticity at 25° C. is 5.1 GPa or more. When the total light transmittance is less than 85% or the haze is less than 0.5%, the initial optical properties of the optical film are low, so the full visibility of the optical film cannot be achieved. In addition, when the tensile modulus of elasticity is less than 5.1 GPa, the bending resistance of the optical film cannot be sufficiently improved. And, at the break -40 ℃ optical film of the present invention and the breaking off of strain ε 1 of 25 deg.] C at a strain ε 2 off a number satisfying the formula (4): 0.70 ≦ ε 1 / ε 2 ≦ 1.20 · · · (4) . When ε 12 is less than 0.70, the breaking strain at low temperature is too low, so sufficient mechanical properties of the optical film such as tensile elastic modulus under low temperature environment cannot be obtained.

本發明之光學膜之全光線透過率為85%以上,就易於進一步提高廣角方向之視認性之觀點而言,較佳為87%以上,更佳為88%以上,進而較佳為89%以上,通常為100%以下。光學膜之全光線透過率可依據JIS K 7361-1:1997使用霧度計而測定,例如可藉由實施例中記載之方法而測定。本發明之光學膜顯示較高之全光線透過率,故而例如與使用透過率較低之膜之情形相比較,可抑制為獲得一定明度所需之顯示元件等之發光強度。故而,可削減消耗電力。例如,於將本發明之光學膜組入圖像顯示裝置之情形時,存在即使減少背光源之光量亦可獲得明亮之顯示之傾向,可對能量節約有所貢獻。全光線透過率之上限通常為100%以下。再者,全光線透過率可為下述光學膜之厚度之範圍之全光線透過率。The total light transmittance of the optical film of the present invention is 85% or more. From the viewpoint of further improving the visibility in the wide-angle direction, it is preferably 87% or more, more preferably 88% or more, and still more preferably 89% or more , Usually less than 100%. The total light transmittance of the optical film can be measured using a haze meter in accordance with JIS K 7361-1:1997, for example, it can be measured by the method described in the examples. The optical film of the present invention exhibits a higher total light transmittance. Therefore, compared with the case of using a film with a lower transmittance, for example, the luminous intensity of the display element required to obtain a certain brightness can be suppressed. Therefore, power consumption can be reduced. For example, when the optical film of the present invention is incorporated into an image display device, there is a tendency to obtain a bright display even if the amount of light of the backlight is reduced, which can contribute to energy saving. The upper limit of total light transmittance is usually below 100%. Furthermore, the total light transmittance may be the total light transmittance in the range of the thickness of the following optical film.

本發明之光學膜之霧度為0.5%以下,就易於進一步提高廣角方向之視認性之觀點而言,較佳為0.4%以下,更佳為0.3%以下。光學膜之霧度可依據JIS K 7136:2000而測定。霧度可依據JIS K 7136:2000使用霧度計而測定,例如可藉由實施例中記載之方法而測定。又,本發明之光學膜之依據JIS K 5600-5-1之耐彎曲性試驗前後之上述霧度之差之絕對值ΔHaze較佳為0.3%以下,更佳為0.2%以下。The haze of the optical film of the present invention is 0.5% or less, and from the viewpoint that it is easy to further improve the visibility in the wide-angle direction, it is preferably 0.4% or less, more preferably 0.3% or less. The haze of the optical film can be measured in accordance with JIS K 7136:2000. The haze can be measured using a haze meter in accordance with JIS K 7136:2000, for example, it can be measured by the method described in the examples. In addition, the absolute value ΔHaze of the difference of the above-mentioned haze before and after the bending resistance test according to JIS K 5600-5-1 of the optical film of the present invention is preferably 0.3% or less, more preferably 0.2% or less.

本發明之光學膜之25℃下之拉伸彈性模數為5.1 GPa以上。於拉伸彈性模數低於上述下限值之情形時,無法充分提高光學膜之耐彎曲性。作為25℃下之拉伸彈性模數,就易於提高光學膜之耐彎曲性,且光學膜不易產生凹陷等缺陷之觀點而言,較佳為5.2 GPa以上,更佳為5.3 GPa以上。又,作為該拉伸彈性模數,就易於提高光學膜之可撓性之觀點而言,較佳為10 GPa以下,更佳為9 GPa以下,進而較佳為8 GPa以下。該彈性模數可使用拉伸試驗機(夾頭間距離50 mm,拉伸速度10 mm/分鐘)而測定,例如可藉由實施例中記載之方法而測定。若拉伸彈性模數為上述範圍內,則光學膜不易產生凹陷缺陷。光學膜之拉伸彈性模數可依據JIS K 7127,使用拉伸試驗機而測定,例如可藉由實施例中記載之方法而測定。拉伸彈性模數例如可藉由提高製造光學膜時之延伸倍率、使用下述具有較佳結構之樹脂等而調整為上述範圍。The tensile modulus of elasticity at 25°C of the optical film of the present invention is 5.1 GPa or more. When the tensile modulus of elasticity is lower than the above lower limit, the bending resistance of the optical film cannot be sufficiently improved. As the tensile modulus of elasticity at 25° C., from the viewpoint that the bending resistance of the optical film is easily improved, and the optical film is not prone to defects such as dents, it is preferably 5.2 GPa or more, more preferably 5.3 GPa or more. In addition, the tensile modulus of elasticity is preferably 10 GPa or less, more preferably 9 GPa or less, and even more preferably 8 GPa or less from the viewpoint of easily improving the flexibility of the optical film. The elastic modulus can be measured using a tensile testing machine (the distance between the chucks is 50 mm, the tensile speed is 10 mm/min), for example, it can be measured by the method described in the examples. If the tensile modulus of elasticity is within the above range, the optical film is less prone to dent defects. The tensile elastic modulus of the optical film can be measured using a tensile tester in accordance with JIS K 7127, for example, it can be measured by the method described in the examples. The tensile modulus of elasticity can be adjusted to the above range by, for example, increasing the stretching ratio when manufacturing the optical film, using the following resin having a preferable structure, or the like.

於本發明之光學膜中,-40℃下之破斷應變ε1 與25℃下之破斷應變ε2 滿足數式(4): 0.70≦ε12 ≦1.20・・・(4)。 數式(4)中之ε12 為0.70以上,就易於提高低溫環境下之光學膜之力學特性之觀點而言,較佳為0.73以上,更佳為0.75以上。又,作為數式(4)中之ε12 ,考慮到塑膠膜於溫度下降時通常難以延伸,而藉由添加填料,即使於低溫下亦可延伸,故而通常為1.20以下,較佳為1.15以下,更佳為1.10以下,進而較佳為1.05以下。再者,破斷應變ε1 及ε2 分別可於-40℃或25℃下藉由ASTM D638-14而測定之應力-應變曲線中,自光學膜產生破斷時之應變之大小求出。破斷應變例如可使用拉伸試驗機,依據ASTM D638-14第A2.6段而測定。作為測定方法,例如可藉由實施例中記載之方法而測定。作為將ε12 調整為上述範圍之方法,例如可例舉使用下述較佳之樹脂之方法等。The optical film of the present invention, the break-off at -40 ℃ the strain ε 1 and broken off at the 25 deg.] C strain ε 2 satisfies equation (4): 0.70 ≦ ε 1 / ε 2 ≦ 1.20 · · · (4) . The ε 12 in the formula (4) is 0.70 or more. From the viewpoint of improving the mechanical properties of the optical film in a low temperature environment, it is preferably 0.73 or more, more preferably 0.75 or more. In addition, as the ε 12 in the formula (4), considering that the plastic film is usually difficult to stretch when the temperature drops, and by adding fillers, it can be stretched even at low temperatures, so it is usually less than 1.20, preferably It is 1.15 or less, more preferably 1.10 or less, and still more preferably 1.05 or less. Furthermore, the breaking strains ε 1 and ε 2 can be obtained from the magnitude of the strain when the optical film breaks in the stress-strain curve measured by ASTM D638-14 at -40°C or 25°C, respectively. The breaking strain can be measured in accordance with ASTM D638-14 paragraph A2.6 using, for example, a tensile testing machine. As a measurement method, it can measure by the method described in an Example, for example. As a method of adjusting ε 12 to the above-mentioned range, for example, a method of using the following preferable resins, etc. can be exemplified.

作為本發明之光學膜之-40℃下之破斷應變ε1 ,就易於提高膜之低溫下之力學特性及耐彎曲性之觀點而言,較佳為5.0以上,更佳為6.0以上,進而較佳為7.0以上,就膜之硬度之觀點而言,較佳為50以下,更佳為45以下。 As the breaking strain ε 1 at -40°C of the optical film of the present invention, it is preferably 5.0 or more, more preferably 6.0 or more from the viewpoint of easily improving the mechanical properties and bending resistance of the film at low temperatures, and further It is preferably 7.0 or more, and from the viewpoint of the hardness of the film, it is preferably 50 or less, and more preferably 45 or less.

作為本發明之光學膜之25℃下之破斷應變ε2 ,就膜之彎曲性之觀點而言,較佳為5.0以上,更佳為6.0以上,進而較佳為7.0以上,就膜之硬度之觀點而言,較佳為50以下,更佳為45以下。 As the breaking strain ε 2 at 25°C of the optical film of the present invention, from the viewpoint of the flexibility of the film, it is preferably 5.0 or more, more preferably 6.0 or more, and still more preferably 7.0 or more, in terms of film hardness From a standpoint, it is preferably 50 or less, and more preferably 45 or less.

作為本發明之光學膜之黃度之指標的YI值就易於進一步提高視認性之觀點而言,較佳為4.0以下,更佳為3.0以下,進而較佳為2.5以下,進而更佳為2.0以下,尤佳為1.9以下,尤其更佳為1.8以下,尤其進而較佳為1.7以下,進一步較佳為1.6以下,較佳為-5以上,更佳為-2以上。再者,YI值可使用紫外可見近紅外分光光度計,進行對300~800 nm之光之透過率測定,求出三刺激值(X、Y、Z),基於YI=100×(1.2769X-1.0592Z)/Y之式而算出。The YI value, which is an indicator of the yellowness of the optical film of the present invention, is preferably 4.0 or less, more preferably 3.0 or less, still more preferably 2.5 or less, and even more preferably 2.0 or less from the viewpoint that it is easy to further improve visibility. , Is particularly preferably 1.9 or less, particularly more preferably 1.8 or less, particularly still more preferably 1.7 or less, still more preferably 1.6 or less, preferably -5 or more, and more preferably -2 or more. Furthermore, the YI value can be measured with a UV-visible-near-infrared spectrophotometer to measure the transmittance of light from 300 to 800 nm to obtain the tristimulus value (X, Y, Z), based on YI=100×(1.2769X- 1.0592Z)/Y.

本發明之光學膜之彎折次數就提高耐折性之觀點而言,較佳為20,000次以上,更佳為100,000次以上,進而較佳為200,000次以上,進而更佳為350,000次以上,尤佳為400,000次以上,尤其更佳為500,000次以上,尤其進而較佳為600,000次以上,進一步較佳為700,000次以上。若彎折次數為上述下限以上,則即使將光學膜彎折,亦不易產生裂痕(crack)或破裂等。又,彎折次數之上限通常為50,000,000次以下。光學膜之彎折次數可藉由依據ASTM標準D2176-16之MIT耐折疲勞試驗而測定。MIT耐折疲勞試驗例如係實施例中記載之試驗。又,本發明之光學膜較佳為於上述條件下之MIT耐折疲勞試驗後之光學膜中亦具有較高之廣角視認性,更佳為例如上述條件下之MIT耐折疲勞試驗前後之圖像清晰度值之差及/或霧度之差為上述耐彎曲性試驗前後之上述圖像清晰度值之差及/或霧度之差之範圍內。The number of bending times of the optical film of the present invention is preferably 20,000 times or more, more preferably 100,000 times or more, still more preferably 200,000 times or more, and still more preferably 350,000 times or more from the viewpoint of improving the folding resistance. It is preferably 400,000 times or more, particularly more preferably 500,000 times or more, especially more preferably 600,000 times or more, and still more preferably 700,000 times or more. If the number of times of bending is greater than or equal to the above lower limit, even if the optical film is bent, cracks, breakage, etc. are less likely to occur. In addition, the upper limit of the number of bending times is usually 50,000,000 times or less. The bending times of the optical film can be measured by the MIT bending fatigue test according to ASTM standard D2176-16. The MIT flexural fatigue test is, for example, the test described in the examples. In addition, the optical film of the present invention preferably has high wide-angle visibility in the optical film after the MIT flexural fatigue test under the above conditions, and more preferably, for example, the image before and after the MIT flex fatigue test under the above conditions The difference in image sharpness value and/or the difference in haze is within the range of the difference in image sharpness value and/or the difference in haze before and after the bending resistance test.

本發明之光學膜之厚度可根據用途而適宜調整,較佳為10 μm以上,更佳為20 μm以上,進而較佳為25 μm以上,進而更佳為30 μm以上,較佳為200 μm以下,更佳為150 μm以下,進而較佳為100 μm以下,進而更佳為85 μm以下。若光學膜之厚度為上述範圍內,則易於進一步提高光學膜之拉伸彈性模數,易於將ε12 調整為上述範圍。再者,光學膜之厚度可使用測微計而測定,例如可藉由實施例中記載之方法而測定。The thickness of the optical film of the present invention can be appropriately adjusted according to the application, and is preferably 10 μm or more, more preferably 20 μm or more, still more preferably 25 μm or more, still more preferably 30 μm or more, and preferably 200 μm or less , More preferably 150 μm or less, still more preferably 100 μm or less, and still more preferably 85 μm or less. If the thickness of the optical film is within the above range, it is easy to further increase the tensile modulus of the optical film, and it is easy to adjust ε 12 to the above range. Furthermore, the thickness of the optical film can be measured using a micrometer, for example, it can be measured by the method described in the Example.

<聚醯亞胺系樹脂及聚醯胺系樹脂> 本發明之光學膜含有選自由聚醯亞胺系樹脂及聚醯胺系樹脂所組成之群中之至少一種樹脂。於本說明書中,所謂聚醯亞胺系樹脂係指選自由聚醯亞胺樹脂、聚醯胺醯亞胺樹脂、聚醯亞胺前驅物樹脂、及聚醯胺醯亞胺前驅物樹脂所組成之群中之至少一種樹脂。聚醯亞胺樹脂係含有包含醯亞胺基之重複結構單元之樹脂,聚醯胺醯亞胺樹脂係含有包含醯亞胺基及醯胺基之兩者之重複結構單元之樹脂。聚醯亞胺前驅物樹脂及聚醯胺醯亞胺前驅物樹脂分別係藉由醯亞胺化而提供聚醯亞胺樹脂及聚醯胺醯亞胺樹脂之醯亞胺化前之前驅物,係亦稱為聚醯胺酸之樹脂。又,於本說明書中,聚醯胺系樹脂係含有包含醯胺基之重複結構單元之樹脂。本發明之光學膜可含有一種聚醯亞胺系樹脂或聚醯胺系樹脂,亦可組合含有兩種以上之聚醯亞胺系樹脂及/或聚醯胺系樹脂。就易於提高光學膜之拉伸彈性模數及耐彎曲性,易於提高廣角方向之視認性,易於將ε12 調整為上述範圍之觀點而言,本發明之光學膜較佳為含有聚醯亞胺系樹脂,該聚醯亞胺系樹脂較佳為聚醯亞胺樹脂或聚醯胺醯亞胺樹脂,更佳為聚醯胺醯亞胺樹脂。<Polyimide resin and polyimide resin> The optical film of the present invention contains at least one resin selected from the group consisting of polyimide resin and polyimide resin. In this specification, the so-called polyimide resin refers to a polyimide resin, a polyimide imide resin, a polyimide precursor resin, and a polyimide imide precursor resin. At least one resin in the group. The polyimide resin is a resin containing a repeating structural unit containing an amide group, and the polyimide resin is a resin containing a repeating structural unit containing both an amide group and an amide group. The polyimide precursor resin and the polyimide imide precursor resin provide the polyimide resin and the polyimide imide resin as the precursor of the polyimide resin through imidization, respectively, It is also called polyamide resin. In addition, in this specification, the polyamide-based resin is a resin containing a repeating structural unit containing an amide group. The optical film of the present invention may contain one polyimide resin or polyimide resin, or a combination of two or more polyimide resins and/or polyimide resins. From the viewpoints that it is easy to improve the tensile elastic modulus and bending resistance of the optical film, the visibility in the wide-angle direction is easy to improve, and the ε 12 is easy to adjust to the above-mentioned range, the optical film of the present invention preferably contains poly The polyimide resin is preferably a polyimide resin or a polyimide resin, and the polyimide resin is more preferably a polyimide resin.

於本發明之較佳一實施方式中,就易於提高光學膜之拉伸彈性模數及耐彎曲性,易於提高廣角方向之視認性,易於將ε12 調整為上述範圍之觀點而言,較佳為聚醯亞胺系樹脂及聚醯胺系樹脂為芳香族系之樹脂。於本說明書中,所謂芳香族系之樹脂係指聚醯亞胺系樹脂及聚醯胺系樹脂中所含之結構單元主要為芳香族系之結構單元之樹脂。In a preferred embodiment of the present invention, it is easy to improve the tensile elastic modulus and bending resistance of the optical film, easy to improve the visibility in the wide-angle direction, and it is easy to adjust ε 12 to the above-mentioned range. Preferably, the polyimide resin and the polyimide resin are aromatic resins. In this specification, the so-called aromatic resin refers to polyimide resins and resins in which the structural units contained in polyimide resins are mainly aromatic structural units.

於上述較佳一實施方式中,就易於提高光學膜之拉伸彈性模數及耐彎曲性,易於提高廣角方向之視認性,易於將ε12 調整為上述範圍之觀點而言,源自芳香族系單體之結構單元相對於聚醯亞胺系樹脂及聚醯胺系樹脂中所含之全部結構單元之比率較佳為60莫耳%以上,更佳為70莫耳%以上,進而較佳為80莫耳%以上,進而更佳為85莫耳%以上。此處,所謂源自芳香族系單體之結構單元係指源自於至少一部分中含有芳香族系之結構(例如芳香環)之單體,於至少一部分中含有芳香族系之結構(例如芳香環)之結構單元。作為芳香族系單體,例如可例舉:芳香族四羧酸化合物、芳香族二胺、芳香族二羧酸等。In the above-mentioned preferred embodiment, from the viewpoints that the tensile elastic modulus and bending resistance of the optical film are easily improved, the visibility in the wide-angle direction is easily improved, and ε 12 is easily adjusted to the above-mentioned range, the source The ratio of the structural unit from the aromatic monomer to all the structural units contained in the polyimide-based resin and the polyamide-based resin is preferably 60 mol% or more, more preferably 70 mol% or more, More preferably, it is 80 mol% or more, and still more preferably 85 mol% or more. Here, the so-called structural unit derived from an aromatic monomer refers to a monomer derived from a structure containing an aromatic system (for example, an aromatic ring) in at least a part, and a structure containing an aromatic system in at least a part (for example, an aromatic The structural unit of the ring). As an aromatic monomer, an aromatic tetracarboxylic acid compound, an aromatic diamine, an aromatic dicarboxylic acid, etc. are mentioned, for example.

於本發明之較佳一實施方式中,聚醯亞胺系樹脂較佳為具有式(1)所表示之結構單元之聚醯亞胺樹脂: [化1]

Figure 02_image003
[式(1)中,Y表示4價之有機基,X表示2價之有機基,*表示鍵結鍵] 或具有式(1)所表示之結構單元及式(2)所表示之結構單元之聚醯胺醯亞胺樹脂: [化2]
Figure 02_image005
[式(2)中,Z及X相互獨立地表示2價之有機基,*表示鍵結鍵]。 又,聚醯胺系樹脂較佳為具有式(2)所表示之結構單元之聚醯胺樹脂。以下對式(1)及式(2)進行說明,針對式(1)之說明係關於聚醯亞胺樹脂及聚醯胺醯亞胺樹脂之兩者,針對式(2)之說明係關於聚醯胺樹脂及聚醯胺醯亞胺樹脂之兩者。In a preferred embodiment of the present invention, the polyimide resin is preferably a polyimide resin having a structural unit represented by formula (1): [化1]
Figure 02_image003
[In formula (1), Y represents a tetravalent organic group, X represents a divalent organic group, * represents a bonding bond] or has a structural unit represented by formula (1) and a structural unit represented by formula (2) The polyamide imide resin: [化2]
Figure 02_image005
[In formula (2), Z and X independently represent a divalent organic group, and * represents a bonding bond]. In addition, the polyamide resin is preferably a polyamide resin having a structural unit represented by formula (2). The formula (1) and formula (2) are described below. The description of formula (1) is about both polyimide resin and polyimide resin, and the description of formula (2) is about polyimide resin. Both of amide resin and polyamide resin.

式(1)所表示之結構單元係四羧酸化合物與二胺化合物反應所形成之結構單元,式(2)所表示之結構單元係二羧酸化合物與二胺化合物反應所形成之結構單元。The structural unit represented by formula (1) is a structural unit formed by the reaction between a tetracarboxylic acid compound and a diamine compound, and the structural unit represented by formula (2) is a structural unit formed by the reaction between a dicarboxylic acid compound and a diamine compound.

於式(1)中,Y表示4價之有機基,較佳為表示碳數4~40之4價之有機基,更佳為表示具有環狀結構之碳數4~40之4價之有機基。作為環狀結構,可例舉:脂環、芳香環、雜環結構,就易於提高光學膜之拉伸彈性模數及耐彎曲性,易於提高廣角方向之視認性,易於將ε12 調整為上述範圍之觀點而言,較佳可例舉芳香環。上述有機基為有機基中之氫原子可被取代為烴基或經氟取代之烴基之有機基,於該情形時,烴基及經氟取代之烴基之碳數較佳為1~8。於本發明之一實施方式中,聚醯亞胺系樹脂可含有複數種Y,複數種Y相互可相同亦可不同。作為Y,可例示:以下之式(20)、式(21)、式(22)、式(23)、式(24)、式(25)、式(26)、式(27)、式(28)及式(29)所表示之基;該式(20)~式(29)所表示之基中之氫原子被取代為甲基、氟基、氯基或三氟甲基之基;以及4價之碳數6以下之鏈式烴基。In formula (1), Y represents a tetravalent organic group, preferably a tetravalent organic group with 4 to 40 carbons, and more preferably a tetravalent organic group with 4 to 40 carbons having a cyclic structure base. Examples of cyclic structures include: alicyclic, aromatic, and heterocyclic structures. It is easy to improve the tensile elastic modulus and bending resistance of the optical film, and it is easy to improve the visibility in the wide-angle direction, and it is easy to change ε 12 From the viewpoint of adjusting to the aforementioned range, an aromatic ring may preferably be mentioned. The above-mentioned organic group is an organic group in which the hydrogen atom in the organic group can be substituted with a hydrocarbon group or a fluorine-substituted hydrocarbon group. In this case, the carbon number of the hydrocarbon group and the fluorine-substituted hydrocarbon group is preferably 1-8. In one embodiment of the present invention, the polyimide-based resin may contain plural kinds of Y, and the plural kinds of Y may be the same or different from each other. As Y, the following formula (20), formula (21), formula (22), formula (23), formula (24), formula (25), formula (26), formula (27), formula ( 28) and the group represented by the formula (29); the hydrogen atom in the group represented by the formula (20) ~ formula (29) is substituted with a methyl group, a fluoro group, a chloro group or a trifluoromethyl group; and A tetravalent chain hydrocarbon group with a carbon number of 6 or less.

[化3]

Figure 02_image007
[化3]
Figure 02_image007

式(20)~式(29)中,*表示鍵結鍵,W1 表示單鍵、-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-Ar-、-SO2 -、-CO-、-O-Ar-O-、-Ar-O-Ar-、-Ar-CH2 -Ar-、-Ar-C(CH3 )2 -Ar-或-Ar-SO2 -Ar-。Ar表示氫原子可被取代為氟原子之碳數6~20之伸芳基,作為具體例,可例舉伸苯基。於存在複數個Ar之情形時,Ar相互可相同亦可不同。式(20)~(29)中之環上之氫原子可被取代為碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基。作為碳數1~6之烷基、碳數1~6之烷氧基及碳數6~12之芳基,分別可例舉下述式(3)中例示者。In formulas (20) to (29), * represents a bonding bond, W 1 represents a single bond, -O-, -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-, -C (CH 3 ) 2 -, -C(CF 3 ) 2 -, -Ar-, -SO 2 -, -CO-, -O-Ar-O-, -Ar-O-Ar-, -Ar-CH 2 -Ar-, -Ar-C(CH 3 ) 2 -Ar- or -Ar-SO 2 -Ar-. Ar represents an arylene group having 6 to 20 carbon atoms in which a hydrogen atom may be substituted with a fluorine atom, and as a specific example, a phenylene group may be mentioned. When there are a plurality of Ars, the Ars may be the same or different from each other. The hydrogen atoms on the rings in formulas (20) to (29) may be substituted with alkyl groups having 1 to 6 carbons, alkoxy groups having 1 to 6 carbons, or aryl groups having 6 to 12 carbons. As a C1-C6 alkyl group, a C1-C6 alkoxy group, and a C6-C12 aryl group, the thing exemplified in the following formula (3) can be mentioned, respectively.

式(20)~式(29)所表示之基中,就易於提高光學膜之拉伸彈性模數及耐彎曲性,易於提高廣角方向之視認性,易於將ε12 調整為上述範圍之觀點而言,較佳為式(26)、式(28)或式(29)所表示之基,更佳為式(26)所表示之基。又,作為W1 ,就易於提高光學膜之拉伸彈性模數及耐彎曲性,易於減低光學膜之YI值,易於將ε12 調整為上述範圍之觀點而言,相互獨立地較佳為單鍵、-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -或-C(CF3 )2 -,更佳為單鍵、-O-、-CH2 -、-CH(CH3 )-、-C(CH3 )2 -或-C(CF3 )2 -,進而較佳為單鍵、-C(CH3 )2 -或-C(CF3 )2 -,尤佳為單鍵或-C(CF3 )2 -。In the formula (20) ~ formula (29), it is easy to improve the tensile elastic modulus and bending resistance of the optical film, it is easy to improve the visibility in the wide-angle direction, and it is easy to adjust ε 12 to the above range From a viewpoint, the group represented by formula (26), formula (28) or formula (29) is preferable, and the group represented by formula (26) is more preferable. In addition, as W 1 , it is easier to improve the tensile modulus of elasticity and bending resistance of the optical film, to reduce the YI value of the optical film, and to adjust ε 12 to the above-mentioned range. It is preferably a single bond, -O-, -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-, -C(CH 3 ) 2 -or -C(CF 3 ) 2 -, more preferably Is a single bond, -O-, -CH 2 -, -CH(CH 3 )-, -C(CH 3 ) 2 -or -C(CF 3 ) 2 -, more preferably a single bond, -C(CH 3 ) 2 -or -C(CF 3 ) 2 -, particularly preferably a single bond or -C(CF 3 ) 2 -.

於本發明之較佳一實施方式中,聚醯亞胺系樹脂中之Y之較佳為50莫耳%以上,更佳為60莫耳%以上,進而較佳為70莫耳%以上係由式(26)所表示。若聚醯亞胺系樹脂中之上述範圍內之Y由式(26),較佳為W1 為單鍵、-C(CH3 )2 -或-C(CF3 )2 -之式(26),更佳為W1 為單鍵或-C(CF3 )2 -之式(26)所表示,則易於提高光學膜之拉伸彈性模數及耐彎曲性,並且易於減低光學膜之YI值,易於將ε12 調整為上述範圍。聚醯亞胺系樹脂中之Y由式(26)所表示之結構單元之比率例如可使用1 H-NMR而測定,或亦可自原料之饋入比而算出。In a preferred embodiment of the present invention, Y in the polyimide resin is preferably 50 mol% or more, more preferably 60 mol% or more, and still more preferably 70 mol% or more. Formula (26) expressed. If Y in the above range in the polyimide resin is represented by formula (26), preferably W 1 is a single bond, -C(CH 3 ) 2 -or -C(CF 3 ) 2- ), more preferably, W 1 is a single bond or -C(CF 3 ) 2 -represented by the formula (26), it is easy to increase the tensile elastic modulus and bending resistance of the optical film, and it is easy to reduce the YI of the optical film Value, it is easy to adjust ε 12 to the above range. The ratio of the structural unit represented by the formula (26) of Y in the polyimide-based resin can be measured, for example, using 1 H-NMR, or can also be calculated from the feed ratio of the raw materials.

於本發明之較佳一實施方式中,式(1)所表示之結構單元含有式(4)所表示之基作為Y: [化4]

Figure 02_image009
[式(4)中,R2 ~R7 相互獨立地表示氫原子、碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基,R2 ~R7 中所含之氫原子可相互獨立地被取代為鹵素原子,V表示單鍵、-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -、-S-、-CO-或-N(R8 )-,R8 表示氫原子或可經鹵素原子取代之碳數1~12之1價之烴基,*表示鍵結鍵]。 即,較佳為複數個式(1)所表示之結構單元中之Y中,至少一部分Y係式(4)所表示之基。若為此種態樣,則易於提高光學膜之拉伸彈性模數及耐彎曲性,易於減低光學膜之YI值,易於將ε12 調整為上述範圍。再者,式(1)所表示之結構單元可含有一種或複數種式(4)所表示之基作為Y。In a preferred embodiment of the present invention, the structural unit represented by formula (1) contains the group represented by formula (4) as Y: [化4]
Figure 02_image009
[In formula (4), R 2 to R 7 independently represent a hydrogen atom, an alkyl group with 1 to 6 carbons, an alkoxy group with 1 to 6 carbons, or an aryl group with 6 to 12 carbons, R 2 to The hydrogen atoms contained in R 7 can be independently substituted with halogen atoms, and V represents a single bond, -O-, -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-, -C (CH 3 ) 2 -, -C(CF 3 ) 2 -, -SO 2 -, -S-, -CO- or -N(R 8 )-, R 8 represents a hydrogen atom or a carbon that can be substituted by a halogen atom A monovalent hydrocarbon group from 1 to 12, * represents a bonding bond]. That is, it is preferable that among Y in the structural unit represented by the formula (1), at least a part of Y is the group represented by the formula (4). In this aspect, it is easy to improve the tensile elastic modulus and bending resistance of the optical film, it is easy to reduce the YI value of the optical film, and it is easy to adjust ε 12 to the above range. Furthermore, the structural unit represented by the formula (1) may contain one or more of the groups represented by the formula (4) as Y.

於式(4)中,R2 、R3 、R4 、R5 、R6 及R7 相互獨立地表示氫原子、碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基。作為碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基,分別可例舉作為式(3)中之R3a 之碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基而於上述例示者。關於式(3)中之R3a ,可例舉上述例示者。R2 ~R7 相互獨立,較佳為表示氫原子或碳數1~6之烷基,更佳為表示氫原子或碳數1~3之烷基,此處,R2 ~R7 中所含之氫原子可相互獨立地被取代為鹵素原子。作為鹵素原子,可例舉:氟原子、氯原子、溴原子、碘原子。V表示單鍵、-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -、-S-、-CO-或-N(R8 )-,R8 表示氫原子或可經鹵素原子取代之碳數1~12之1價之烴基。作為可經鹵素原子取代之碳數1~12之1價之烴基,可例舉關於下述式(3)中之W中之R9 而於上述例示者。該等之中,就易於提高光學膜之拉伸彈性模數、光學特性、表面硬度及耐彎曲性,易於將ε12 調整為上述範圍之觀點而言,V較佳為單鍵、-O-、-CH2 -、-CH(CH3 )-、-C(CH3 )2 -或-C(CF3 )2 -,更佳為單鍵、-C(CH3 )2 -或-C(CF3 )2 -,進而較佳為單鍵或-C(CF3 )2 -。In formula (4), R 2 , R 3 , R 4 , R 5 , R 6 and R 7 independently represent a hydrogen atom, an alkyl group with 1 to 6 carbons, an alkoxy group with 1 to 6 carbons, or An aryl group with 6 to 12 carbons. Examples of alkyl groups having 1 to 6 carbons, alkoxy groups having 1 to 6 carbons, or aryl groups having 6 to 12 carbons include the alkane having 1 to 6 carbons as R 3a in the formula (3). The group, the alkoxy group having 1 to 6 carbons, or the aryl group having 6 to 12 carbons are those exemplified above. Regarding R 3a in formula (3), those exemplified above can be cited. R 2 to R 7 are independent of each other, and preferably represent a hydrogen atom or an alkyl group having 1 to 6 carbons, more preferably represent a hydrogen atom or an alkyl group having 1 to 3 carbons, where R 2 to R 7 are The contained hydrogen atoms can be substituted with halogen atoms independently of each other. The halogen atom may, for example, be a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom. V represents a single bond, -O-, -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-, -C(CH 3 ) 2 -, -C(CF 3 ) 2 -, -SO 2 -, -S-, -CO- or -N(R 8 )-, R 8 represents a hydrogen atom or a monovalent hydrocarbon group of 1 to 12 carbons which can be substituted by a halogen atom. Examples of the monovalent hydrocarbon group having 1 to 12 carbon atoms which may be substituted with a halogen atom include those exemplified above regarding R 9 in W in the following formula (3). Among them, from the viewpoint that it is easy to improve the tensile elastic modulus, optical properties, surface hardness, and bending resistance of the optical film, and it is easy to adjust ε 12 to the above range, V is preferably a single bond, -O-, -CH 2 -, -CH(CH 3 )-, -C(CH 3 ) 2 -or -C(CF 3 ) 2 -, more preferably a single bond, -C(CH 3 ) 2 -or -C(CF 3 ) 2 -, more preferably a single bond or -C(CF 3 ) 2 -.

於本發明之較佳一實施方式中,複數個式(1)中之Y之至少一部分係由式(5)及/或式(9)所表示: [化5]

Figure 02_image011
[式(5)中,R18 ~R25 相互獨立地表示氫原子、碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基,R18 ~R25 中所含之氫原子可相互獨立地被取代為鹵素原子,*表示鍵結鍵] [化6]
Figure 02_image013
[式(9)中,R35 ~R40 相互獨立地表示氫原子、碳數1~6之烷基或碳數6~12之芳基,R35 ~R40 中所含之氫原子可相互獨立地被取代為鹵素原子,*表示鍵結鍵]。 若複數個式(1)中之Y之至少一部分由式(5)所表示及/或由式(9)所表示,則易於提高光學膜之拉伸彈性模數及光學特性。In a preferred embodiment of the present invention, at least a part of Y in a plurality of formulas (1) is represented by formulas (5) and/or formulas (9): [化5]
Figure 02_image011
[In formula (5), R 18 to R 25 independently represent a hydrogen atom, an alkyl group with 1 to 6 carbons, an alkoxy group with 1 to 6 carbons, or an aryl group with 6 to 12 carbons, R 18 to The hydrogen atoms contained in R 25 can be substituted with halogen atoms independently of each other, and * represents a bonding bond] [化6]
Figure 02_image013
[In formula (9), R 35 to R 40 independently represent a hydrogen atom, an alkyl group with 1 to 6 carbons or an aryl group with 6 to 12 carbons, and the hydrogen atoms contained in R 35 to R 40 may mutually It is independently substituted with a halogen atom, and * represents a bonding bond]. If at least a part of Y in a plurality of formulas (1) is represented by formula (5) and/or is represented by formula (9), it is easy to improve the tensile elastic modulus and optical properties of the optical film.

於式(5)中,R18 、R19 、R20 、R21 、R22 、R23 、R24 及R25 相互獨立地表示氫原子、碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基。作為碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基,分別可例舉作為式(3)中之R3a 之碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基而於上述例示者。R18 ~R25 相互獨立,較佳為表示氫原子或碳數1~6之烷基,更佳為表示氫原子或碳數1~3之烷基,此處,R18 ~R25 中所含之氫原子可相互獨立地被取代為鹵素原子。作為該鹵素原子,可例舉:氟原子、氯原子、溴原子及碘原子。R18 ~R25 相互獨立,就易於提高光學膜之拉伸彈性模數及耐彎曲性之觀點、以及易於提高透明性並且易於維持該透明性之觀點而言,進而較佳為氫原子、甲基、氟基、氯基或三氟甲基,進而更佳為R18 、R19 、R20 、R23 、R24 及R25 為氫原子,R21 及R22 為氫原子、甲基、氟基、氯基或三氟甲基,尤佳為R21 及R22 為甲基或三氟甲基。In the formula (5), R 18 , R 19 , R 20 , R 21 , R 22 , R 23 , R 24 and R 25 independently represent a hydrogen atom, an alkyl group having 1 to 6 carbons, and a carbon number of 1 to Alkoxy group of 6 or aryl group of 6-12 carbons. Examples of alkyl groups having 1 to 6 carbons, alkoxy groups having 1 to 6 carbons, or aryl groups having 6 to 12 carbons include the alkane having 1 to 6 carbons as R 3a in the formula (3). The group, the alkoxy group having 1 to 6 carbons, or the aryl group having 6 to 12 carbons are those exemplified above. R 18 ~ R 25 each independently, preferably a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, the more preferably represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, the where, R 18 ~ R 25 as The contained hydrogen atoms can be substituted with halogen atoms independently of each other. As this halogen atom, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom are mentioned. R 18 to R 25 are independent of each other. From the viewpoints that the tensile modulus of elasticity and the bending resistance of the optical film are easily improved, and the transparency is easily improved and the transparency is easily maintained, hydrogen atoms and A R 18 , R 19 , R 20 , R 23 , R 24 and R 25 are hydrogen atoms, and R 21 and R 22 are hydrogen atoms, methyl groups, A fluoro group, a chloro group or a trifluoromethyl group, and R 21 and R 22 are particularly preferably a methyl group or a trifluoromethyl group.

於式(9)中,就易於提高光學膜之拉伸彈性模數及耐彎曲性之觀點、以及易於提高透明性並且易於維持該透明性之觀點而言,R35 ~R40 較佳為氫原子或碳數1~6之烷基,更佳為氫原子或碳數1~3之烷基,進而較佳為氫原子。此處,R35 ~R40 中所含之氫原子可相互獨立地被取代為鹵素原子,作為該鹵素原子,例如可例舉:氟原子、氯原子、溴原子、碘原子。作為R35 ~R40 中之碳數1~6之烷基及碳數6~12之芳基,分別可例舉上述例示者。 In formula (9), R 35 to R 40 are preferably hydrogen from the viewpoint of easy improvement of the tensile modulus of elasticity and bending resistance of the optical film, and the viewpoint of easy improvement of transparency and easy maintenance of the transparency. Atom or an alkyl group having 1 to 6 carbon atoms, more preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and still more preferably a hydrogen atom. Here, the hydrogen atoms contained in R 35 to R 40 may be independently substituted with halogen atoms. Examples of the halogen atom include fluorine atom, chlorine atom, bromine atom, and iodine atom. As the alkyl group having 1 to 6 carbons and the aryl group having 6 to 12 carbons in R 35 to R 40, the above-exemplified ones may be mentioned, respectively.

於本發明之較佳一實施方式中,式(5)係由式(5')所表示,式(9)係由式(9')所表示: [化7]

Figure 02_image015
即,複數個Y之至少一部分係由式(5')及/或式(9')所表示。於該情形時,易於提高光學膜之拉伸彈性模數及耐彎曲性。進而,於式(5)由式(5')所表示之情形時,藉由含有氟元素之骨架,聚醯亞胺系樹脂之對溶劑之溶解性提高,從而易於提高含有該樹脂之清漆之保管穩定性,並且易於減低該清漆之黏度,易於提高光學膜之加工性。其結果,易於製造滿足數式(1)~數式(3)之本發明之光學膜。又,藉由含有氟元素之骨架,易於提高光學膜之光學特性。In a preferred embodiment of the present invention, formula (5) is represented by formula (5'), and formula (9) is represented by formula (9'): [化7]
Figure 02_image015
That is, at least a part of the plural Y is represented by the formula (5') and/or the formula (9'). In this case, it is easy to improve the tensile modulus and bending resistance of the optical film. Furthermore, in the case where the formula (5) is represented by the formula (5'), the solubility of the polyimide resin to the solvent is improved by the skeleton containing the fluorine element, thereby easily improving the performance of the varnish containing the resin Storage stability, and easy to reduce the viscosity of the varnish, easy to improve the processability of the optical film. As a result, it is easy to manufacture the optical film of the present invention that satisfies the mathematical formulas (1) to (3). In addition, the fluorine-containing skeleton makes it easy to improve the optical properties of the optical film.

於本發明之較佳一實施方式中,聚醯亞胺系樹脂中之Y之較佳為50莫耳%以上,更佳為60莫耳%以上,進而較佳為70莫耳%以上係由式(5),尤其式(5')所表示。若聚醯亞胺系樹脂中之上述範圍內之Y由式(5),尤其式(5')所表示,則藉由含有氟元素之骨架,聚醯亞胺系樹脂之對溶劑之溶解性提高,易於減低含有該樹脂之清漆之黏度,易於提高光學膜之加工性。其結果,易於製造滿足數式(1)~數式(3)之本發明之光學膜。又,藉由含有氟元素之骨架,易於提高光學膜之光學特性。再者,較佳為上述聚醯亞胺系樹脂中之Y之100莫耳%以下係由式(5),尤其式(5')所表示。聚醯亞胺系樹脂中之Y可為式(5),尤其式(5')。聚醯亞胺系樹脂中之Y之式(5)所表示之結構單元之比率例如可使用1 H-NMR而測定,或亦可自原料之饋入比而算出。In a preferred embodiment of the present invention, Y in the polyimide resin is preferably 50 mol% or more, more preferably 60 mol% or more, and still more preferably 70 mol% or more. The formula (5), especially the formula (5'). If Y in the above-mentioned range in the polyimide resin is represented by formula (5), especially formula (5'), the solubility of the polyimide resin to solvents by the skeleton containing the fluorine element It is easy to reduce the viscosity of the varnish containing the resin, and it is easy to improve the processability of the optical film. As a result, it is easy to manufacture the optical film of the present invention that satisfies the mathematical formulas (1) to (3). In addition, the fluorine-containing skeleton makes it easy to improve the optical properties of the optical film. Furthermore, it is preferable that 100 mol% or less of Y in the polyimide resin is represented by formula (5), especially formula (5'). Y in the polyimide resin may be formula (5), especially formula (5'). The ratio of the structural unit represented by the formula (5) of Y in the polyimide-based resin can be measured, for example, using 1 H-NMR, or can also be calculated from the feed ratio of the raw materials.

於式(2)中,Z為2價之有機基,較佳為可經碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基(該等基中之氫原子可被取代為鹵素原子(較佳為氟原子))取代之碳數4~40之2價之有機基,更佳為可經碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基(該等基中之氫原子可被取代為鹵素原子(較佳為氟原子))取代之具有環狀結構之碳數4~40之2價之有機基。再者,作為碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基之例,可同樣地適用關於下述式(3)中之R3a 及R3b 之例示。作為環狀結構,可例舉:脂環、芳香環、雜環結構。作為Z之有機基,可例示式(20)、式(21)、式(22)、式(23)、式(24)、式(25)、式(26)、式(27)、式(28)及式(29)所表示之基之鍵結鍵中,不鄰接之兩個被取代為氫原子之基及碳數6以下之2價鏈式烴基: [化8]

Figure 02_image017
[式(20)~式(29)中,W1 表示單鍵、-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-Ar-、-SO2 -、-CO-、-O-Ar-O-、-Ar-O-Ar-、-Ar-CH2 -Ar-、-Ar-C(CH3 )2 -Ar-或-Ar-SO2 -Ar-,此處,Ar相互獨立地表示氫原子可被取代為氟原子之碳數6~20之伸芳基(例如伸苯基),*表示鍵結鍵], 作為Z之雜環結構,可例示具有噻吩環骨架之基。就易於減低光學膜之YI值之觀點、易於提高全光線透過率之觀點及易於減低霧度之觀點而言,作為Z,較佳為式(20)~式(29)所表示之基及具有噻吩環骨架之基,更佳為式(26)、式(28)及式(29)所表示之基。又,就易於提高光學膜之拉伸彈性模數之觀點、及易於將ε12 調整為上述範圍之觀點而言,Z較佳為經碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基(該等基中之氫原子可被取代為鹵素原子(較佳為氟原子))取代之式(26)、式(28)及式(29)所表示之基,更佳為經碳數1~6之烷基或碳數1~6之烷氧基(該等基中之氫原子可被取代為鹵素原子(較佳為氟原子))取代之式(26)、式(28)及式(29)所表示之基。In formula (2), Z is a divalent organic group, preferably an alkyl group with 1 to 6 carbons, an alkoxy group with 1 to 6 carbons, or an aryl group with 6 to 12 carbons (such The hydrogen atom in the group may be substituted with a halogen atom (preferably a fluorine atom)). A divalent organic group with 4 to 40 carbons, more preferably an alkyl group with 1 to 6 carbons, and 1 ~6 alkoxy group or aryl group with 6 to 12 carbons (the hydrogen atoms in these groups can be substituted with halogen atoms (preferably fluorine atoms)) substituted with cyclic structure of 4 to 40 carbons Divalent organic base. Furthermore, as an example of an alkyl group having 1 to 6 carbons, an alkoxy group having 1 to 6 carbons, or an aryl group having 6 to 12 carbons, the same applies to the following formula (3) for R 3a and An example of R 3b. The cyclic structure may, for example, be an alicyclic ring, an aromatic ring, or a heterocyclic structure. As the organic group of Z, the formula (20), the formula (21), the formula (22), the formula (23), the formula (24), the formula (25), the formula (26), the formula (27), the formula ( 28) and among the bonding bonds of the groups represented by formula (29), two non-adjacent groups are substituted with hydrogen atoms and a divalent chain hydrocarbon group with 6 or less carbon atoms: [化 8]
Figure 02_image017
[In formulas (20) to (29), W 1 represents a single bond, -O-, -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-, -C(CH 3 ) 2 -, -C(CF 3 ) 2 -, -Ar-, -SO 2 -, -CO-, -O-Ar-O-, -Ar-O-Ar-, -Ar-CH 2 -Ar-,- Ar-C(CH 3 ) 2 -Ar- or -Ar-SO 2 -Ar-, where Ar represents independently of each other an aryl group with 6 to 20 carbon atoms (for example, Phenyl), * represents a bonding bond], as the heterocyclic structure of Z, a group having a thiophene ring skeleton can be exemplified. From the viewpoint of ease of reducing the YI value of the optical film, the viewpoint of ease of increasing the total light transmittance, and the viewpoint of ease of reducing the haze, as Z, it is preferable to have a base represented by formulas (20) to (29) and have The group of the thiophene ring skeleton is more preferably the group represented by the formula (26), the formula (28) and the formula (29). In addition, from the viewpoints that it is easy to increase the tensile elastic modulus of the optical film and that it is easy to adjust ε 12 to the above-mentioned range, Z is preferably an alkyl group having 1 to 6 carbon atoms, and a carbon number of 1 ~6 alkoxy or 6-12 aryl groups (the hydrogen atoms in these groups can be substituted with halogen atoms (preferably fluorine atoms)) substituted by formulas (26), (28) and formulas The group represented by (29) is more preferably an alkyl group having 1 to 6 carbons or an alkoxy group having 1 to 6 carbons (the hydrogen atoms in these groups may be substituted with halogen atoms (preferably fluorine atoms) )) Substituted groups represented by formula (26), formula (28) and formula (29).

作為Z之有機基,更佳為式(20')、式(21')、式(22')、式(23')、式(24')、式(25')、式(26')、式(27')、式(28')及式(29')所表示之2價之有機基: [化9]

Figure 02_image019
[式(20')~式(29')中,W1 及*係如式(20)~式(29)中所定義]。 再者,式(20)~式(29)及式(20')~式(29')中之環上之氫原子可被取代為碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基(該等基中之氫原子可被取代為鹵素原子(較佳為氟原子))。就提高光學膜之拉伸彈性模數,易於將ε12 調整為上述範圍,尤其易於提高低溫下之力學特性之觀點而言,Z較佳為經碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基(該等基中之氫原子可被取代為鹵素原子(較佳為氟原子))取代之式(26')、式(28')及式(29')所表示之基,更佳為經碳數1~6之烷基或碳數1~6之烷氧基(該等基中之氫原子可被取代為鹵素原子(較佳為氟原子))取代之式(26')、式(28')及式(29')所表示之基,進而更佳為經碳數1~6之烷基或碳數1~6之烷氧基(該等基中之氫原子可被取代為鹵素原子(較佳為氟原子))取代之式(28')所表示之基。As the organic group of Z, it is more preferably formula (20'), formula (21'), formula (22'), formula (23'), formula (24'), formula (25'), formula (26') , Formula (27'), formula (28') and formula (29') expressed by the divalent organic group: [化9]
Figure 02_image019
[In formulas (20') to (29'), W 1 and * are as defined in formulas (20) to (29)]. Furthermore, the hydrogen atoms on the rings in formulas (20) to (29) and (20') to (29') can be substituted with alkyl groups with 1 to 6 carbons, and those with 1 to 6 carbons. An alkoxy group or an aryl group having 6 to 12 carbons (the hydrogen atom in these groups may be substituted with a halogen atom (preferably a fluorine atom)). From the viewpoint of increasing the tensile modulus of the optical film, easily adjusting ε 12 to the above range, and particularly easy to improve the mechanical properties at low temperature, Z is preferably an alkyl group having 1 to 6 carbon atoms, An alkoxy group having 1 to 6 carbons or an aryl group having 6 to 12 carbons (the hydrogen atoms in these groups may be substituted with halogen atoms (preferably fluorine atoms)) substituted by formula (26'), formula ( 28') and the group represented by formula (29'), more preferably an alkyl group having 1 to 6 carbons or an alkoxy group having 1 to 6 carbons (the hydrogen atoms in these groups may be substituted with halogen atoms (Preferably a fluorine atom)) The substituted group represented by the formula (26'), the formula (28') and the formula (29'), more preferably an alkyl group having 1 to 6 carbons or a carbon number of 1 to The group represented by the formula (28') substituted by the alkoxy group of 6 (the hydrogen atom in these groups may be substituted with a halogen atom (preferably a fluorine atom)).

於聚醯胺系樹脂或聚醯胺醯亞胺樹脂具有式(2)中之Z由上述式(20')~式(29')之任一者所表示之結構單元之情形時,其中於具有式(2)中之Z由下述式(3')所表示之結構單元之情形時,就易於提高清漆之成膜性,易於提高光學膜之均勻性之觀點而言,較佳為聚醯胺系樹脂或聚醯胺醯亞胺樹脂除該結構單元外,進而具有下式(d1)所表示之源自羧酸之結構單元: [化10]

Figure 02_image021
[式(d1)中,R41 相互獨立為關於下述式(3)中之R3a 所定義之基或氫原子,R42 表示R41 或-C(=O)-*,*表示鍵結鍵]。 作為結構單元(d1),具體可例舉:R41 及R42 均為氫原子之結構單元(源自二羧酸化合物之結構單元)、R41 均為氫原子且R42 表示-C(=O)-*之結構單元(源自三羧酸化合物之結構單元)等。When the polyamide resin or polyamide imide resin has a structural unit in the formula (2) where Z is represented by any of the above formulas (20') to (29'), where In the case where Z in the formula (2) is represented by the following formula (3'), from the viewpoint that the film-forming properties of the varnish and the uniformity of the optical film are easily improved, the poly In addition to the structural unit, the amide resin or polyimide resin has a carboxylic acid-derived structural unit represented by the following formula (d1): [化10]
Figure 02_image021
[In formula (d1), R 41 is independently of each other a group or a hydrogen atom defined by R 3a in the following formula (3) , R 42 represents R 41 or -C(=O)-*, * represents bonding key]. As the structural unit (d1), specific examples include: structural units in which R 41 and R 42 are both hydrogen atoms (structural units derived from dicarboxylic acid compounds), R 41 are both hydrogen atoms, and R 42 represents -C(= O)-* structural units (structural units derived from tricarboxylic acid compounds), etc.

聚醯胺系樹脂或聚醯胺醯亞胺樹脂可含有複數種Z作為式(2)中之Z,複數種Z相互可相同亦可不同。尤其就易於提高本發明之光學膜之拉伸彈性模數,且易於提高光學特性之觀點而言,式(2)中之Z較佳為至少具有式(3): [化11]

Figure 02_image023
[式(3)中,R3a 及R3b 相互獨立地表示碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基,R3a 及R3b 中所含之氫原子可相互獨立地被取代為鹵素原子,W相互獨立地表示單鍵、-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -、-S-、-CO-或-N(R9 )-,R9 表示氫原子、可經鹵素原子取代之碳數1~12之1價之烴基,s為0~4之整數,t為0~4之整數,u為0~4之整數,*表示鍵結鍵], 更佳為式(3')所表示之結構單元: [化12]
Figure 02_image025
[式(3')中,R3a 、R3b 、s、t、u、W及*係如式(3)中所定義]。 再者,於本說明書中,聚醯胺系樹脂或聚醯胺醯亞胺樹脂具有式(2)中之Z由式(3)所表示之結構單元與聚醯胺系樹脂或聚醯胺醯亞胺系樹脂具有式(3)所表示之結構作為式(2)中之Z係具有相同含義,係指聚醯胺系樹脂或聚醯胺醯亞胺樹脂中可含有之複數個式(2)所表示之結構單元中,至少一部分之結構單元中之Z係由式(3)所表示。該記載亦適用於其他相同之記載。The polyamide resin or polyamide resin may contain a plurality of types of Z as Z in the formula (2), and the plurality of types of Z may be the same or different from each other. Especially in terms of the ease of improving the tensile modulus of elasticity of the optical film of the present invention and the ease of improving the optical properties, Z in formula (2) preferably has at least formula (3): [化11]
Figure 02_image023
[In formula (3), R 3a and R 3b independently represent an alkyl group with 1 to 6 carbons, an alkoxy group with 1 to 6 carbons, or an aryl group with 6 to 12 carbons. In R 3a and R 3b The hydrogen atoms contained can be independently substituted with halogen atoms, and W independently represents a single bond, -O-, -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-, -C (CH 3 ) 2 -, -C(CF 3 ) 2 -, -SO 2 -, -S-, -CO- or -N(R 9 )-, R 9 represents a hydrogen atom, a carbon that can be substituted by a halogen atom A monovalent hydrocarbon group of 1 to 12, s is an integer of 0 to 4, t is an integer of 0 to 4, u is an integer of 0 to 4, * represents a bonding bond], more preferably represented by formula (3') The structural unit of expression: [化12]
Figure 02_image025
[In formula (3'), R 3a , R 3b , s, t, u, W and * are as defined in formula (3)]. Furthermore, in this specification, polyamide-based resin or polyamide-imide resin has a structural unit represented by formula (3) as Z in formula (2) and polyamide-based resin or polyamide-imide resin The imine resin has the structure represented by the formula (3) as the Z in the formula (2) has the same meaning. Among the structural units represented by ), Z in at least a part of the structural units is represented by formula (3). This record also applies to other similar records.

式(3)及式(3')中,W相互獨立地表示單鍵、-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -、-S-、-CO-或-N(R9 )-,就光學膜之耐彎曲性之觀點而言,較佳為表示-O-或-S-,更佳為表示-O-。 R3a 及R3b 相互獨立地表示碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基。作為碳數1~6之烷基,例如可例舉:甲基、乙基、正丙基、異丙基、正丁基、第二丁基、第三丁基、正戊基、2-甲基-丁基、3-甲基丁基、2-乙基-丙基、正己基等。作為碳數1~6之烷氧基,例如可例舉:甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、第三丁氧基、戊氧基、己氧基、環己氧基等。作為碳數6~12之芳基,例如可例舉:苯基、甲苯基、二甲苯基、萘基、聯苯基等。就光學膜之拉伸彈性模數、表面硬度及柔軟性之觀點而言,R3a 及R3b 相互獨立,較佳為表示碳數1~6之烷基或碳數1~6之烷氧基,更佳為表示碳數1~3之烷基或碳數1~3之烷氧基。此處,R3a 及R3b 中所含之氫原子可相互獨立地被取代為鹵素原子。 R9 表示氫原子、可經鹵素原子取代之碳數1~12之1價之烴基。作為碳數1~12之1價之烴基,例如可例舉:甲基、乙基、正丙基、異丙基、正丁基、第二丁基、第三丁基、正戊基、2-甲基-丁基、3-甲基-丁基、2-乙基-丙基、正己基、正庚基、正辛基、第三辛基、正壬基、正癸基等,該等可經鹵素原子取代。作為上述鹵素原子,可例舉:氟原子、氯原子、溴原子、碘原子等。In formula (3) and formula (3'), W independently represents a single bond, -O-, -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-, -C(CH 3 ) 2 -, -C(CF 3 ) 2 -, -SO 2 -, -S-, -CO- or -N(R 9 )-, from the viewpoint of the bending resistance of the optical film, it is preferable to indicate -O- or -S-, more preferably -O-. R 3a and R 3b independently represent an alkyl group having 1 to 6 carbons, an alkoxy group having 1 to 6 carbons, or an aryl group having 6 to 12 carbons. Examples of the alkyl group having 1 to 6 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, second butyl, tertiary butyl, n-pentyl, 2-methyl Base-butyl, 3-methylbutyl, 2-ethyl-propyl, n-hexyl, etc. Examples of alkoxy groups having 1 to 6 carbon atoms include methoxy, ethoxy, propoxy, isopropoxy, butoxy, isobutoxy, tertiary butoxy, and pentoxy. Group, hexyloxy, cyclohexyloxy, etc. As a C6-C12 aryl group, a phenyl group, a tolyl group, a xylyl group, a naphthyl group, a biphenyl group etc. are mentioned, for example. From the viewpoint of the tensile elastic modulus, surface hardness and flexibility of the optical film, R 3a and R 3b are independent of each other, and preferably represent an alkyl group with 1 to 6 carbons or an alkoxy group with 1 to 6 carbons , More preferably represents an alkyl group having 1 to 3 carbons or an alkoxy group having 1 to 3 carbons. Here, the hydrogen atoms contained in R 3a and R 3b may be substituted with halogen atoms independently of each other. R 9 represents a hydrogen atom, a monovalent hydrocarbon group of 1 to 12 carbons which may be substituted with a halogen atom. Examples of monovalent hydrocarbon groups having 1 to 12 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, second butyl, tertiary butyl, n-pentyl, and 2 -Methyl-butyl, 3-methyl-butyl, 2-ethyl-propyl, n-hexyl, n-heptyl, n-octyl, tertiary octyl, n-nonyl, n-decyl, etc., etc. Can be substituted by halogen atoms. As said halogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc. are mentioned.

式(3)及式(3')中,t及u相互獨立為0~4之整數,較佳為0~2之整數,更佳為1或2。In formula (3) and formula (3′), t and u are independently an integer of 0-4, preferably an integer of 0-2, and more preferably 1 or 2.

式(3)中及式(3')中,s為0~4之範圍之整數,若s為該範圍內,則易於提高光學膜之拉伸彈性模數及耐彎曲性。式(3)及式(3')中,s就易於進一步提高光學膜之拉伸彈性模數及耐彎曲性之觀點而言,較佳為0~3之範圍之整數,更佳為0~2之範圍之整數,進而較佳為0或1,進而更佳為0。聚醯胺醯亞胺樹脂或聚醯胺系樹脂可於Z中含有一種或兩種以上之式(3)或式(3')所表示之結構單元。In formula (3) and formula (3'), s is an integer in the range of 0-4, and if s is within this range, the tensile modulus and bending resistance of the optical film are easily improved. In formulas (3) and (3'), s is preferably an integer in the range of 0 to 3, more preferably 0 to from the viewpoint of further improving the tensile modulus of elasticity and bending resistance of the optical film. The integer in the range of 2 is more preferably 0 or 1, and even more preferably 0. The polyamide imide resin or polyamide resin may contain one or two or more structural units represented by formula (3) or formula (3') in Z.

於本發明之較佳一實施方式中,就提高光學膜之拉伸彈性模數、彈性模數及耐彎曲性,減低YI值之觀點而言,Z較佳為由s為0且u較佳為1~3,更佳為1或2之式(3)或式(3')所表示。進而,又,除具有s為0之式(3)或式(3')所表示之Z之式(2)所表示之結構單元外,進而具有上述式(d1)所表示之結構單元之情形時亦較佳。In a preferred embodiment of the present invention, from the viewpoint of improving the tensile modulus, modulus of elasticity, and bending resistance of the optical film, and reducing the YI value, Z is preferably from 0 to u It is 1 to 3, and is more preferably represented by formula (3) or formula (3') of 1 or 2. Furthermore, in addition to the structural unit represented by the formula (2) represented by the formula (3) or the formula (3') where s is 0, it further has the structural unit represented by the above formula (d1) Time is also better.

於聚醯胺醯亞胺樹脂或聚醯胺系樹脂具有式(3)或式(3')所表示之結構單元之情形時,其比率於將聚醯胺醯亞胺樹脂或聚醯胺系樹脂之式(1)所表示之結構單元及式(2)所表示之結構單元之合計設為100莫耳%時,較佳為20莫耳%以上,更佳為30莫耳%以上,進而較佳為40莫耳%以上,進而更佳為50莫耳%以上,尤佳為60莫耳%以上,較佳為90莫耳%以下,更佳為85莫耳%以下,進而較佳為80莫耳%以下。若式(3)或式(3')所表示之結構單元之比率為上述下限以上,則易於提高光學膜之拉伸彈性模數及耐彎曲性。若式(3)或式(3')所表示之結構單元之比率為上述上限以下,則抑制源自式(3)之醯胺鍵間之氫鍵所導致之含樹脂之清漆之黏度上升,易於提高膜之加工性。再者,式(1)、式(2)、式(3)或式(3')所表示之結構單元之比率例如可使用1 H-NMR而測定,或亦可自原料之饋入比而算出。When the polyamide resin or polyamide resin has the structural unit represented by formula (3) or formula (3'), the ratio is higher than that of polyamide resin or polyamide resin When the total of the structural unit represented by formula (1) and the structural unit represented by formula (2) of the resin is 100 mol%, it is preferably 20 mol% or more, more preferably 30 mol% or more, and then Preferably it is 40 mol% or more, further more preferably 50 mol% or more, particularly preferably 60 mol% or more, preferably 90 mol% or less, more preferably 85 mol% or less, and still more preferably Below 80 mol%. If the ratio of the structural unit represented by the formula (3) or the formula (3') is more than the above lower limit, it is easy to improve the tensile modulus of elasticity and the bending resistance of the optical film. If the ratio of the structural units represented by the formula (3) or the formula (3') is below the above upper limit, the increase in the viscosity of the resin-containing varnish caused by the hydrogen bond between the amido bonds derived from the formula (3) will be suppressed, It is easy to improve the processability of the film. Furthermore, the ratio of structural units represented by formula (1), formula (2), formula (3), or formula (3') can be determined, for example, using 1 H-NMR, or can also be determined from the feed ratio of raw materials Figure out.

於本發明之較佳一實施方式中,聚醯胺醯亞胺樹脂或聚醯胺系樹脂中之Z之較佳為30莫耳%以上,更佳為40莫耳%以上,進而較佳為45莫耳%以上,進而更佳為50莫耳%以上係s為0~4之式(3)或式(3')所表示之結構單元。若Z之上述之下限以上係s為0~4之式(3)或式(3')所表示之結構單元,則易於提高光學膜之拉伸彈性模數及耐彎曲性。又,聚醯胺醯亞胺樹脂或聚醯胺系樹脂中之Z之100莫耳%以下係s為0~4之式(3)或式(3')所表示之結構單元即可。再者,樹脂中之s為0~4之式(3)或式(3')所表示之結構單元之比率例如可使用1 H-NMR而測定,或亦可自原料之饋入比而算出。In a preferred embodiment of the present invention, Z in the polyamideimide resin or polyamide resin is preferably 30 mol% or more, more preferably 40 mol% or more, and still more preferably 45 mol% or more, and more preferably 50 mol% or more is a structural unit represented by formula (3) or formula (3') in which s is 0-4. If the above lower limit of Z is a structural unit represented by formula (3) or formula (3') in which s is 0-4, the tensile modulus and bending resistance of the optical film are easily improved. Moreover, 100 mol% or less of Z in the polyamide resin or polyamide resin may be a structural unit represented by formula (3) or formula (3') in which s is 0 to 4. Furthermore, the ratio of structural units represented by formula (3) or formula (3') in which s in the resin is 0-4 can be measured, for example, using 1 H-NMR, or can also be calculated from the feed ratio of the raw materials .

於式(1)及式(2)中,X相互獨立地表示2價有機基,較佳為表示碳數4~40之2價有機基,更佳為表示具有環狀結構之碳數4~40之2價有機基。作為環狀結構,可例舉:脂環、芳香環、雜環結構。對上述有機基而言,有機基中之氫原子可被取代為烴基或經氟取代之烴基,於該情形時,烴基及經氟取代之烴基之碳數較佳為1~8。於本發明之一實施方式中,本發明之聚醯胺系樹脂及聚醯亞胺樹脂可含有複數種X,複數種X相互可相同亦可不同。作為X,可例示:式(10)、式(11)、式(12)、式(13)、式(14)、式(15)、式(16)、式(17)及式(18)所表示之基;該式(10)~式(18)所表示之基中之氫原子被取代為甲基、氟基、氯基或三氟甲基之基;以及碳數6以下之鏈式烴基。In formula (1) and formula (2), X independently represents a divalent organic group, preferably a divalent organic group having 4 to 40 carbon atoms, and more preferably a divalent organic group having a cyclic structure having 4 to 40 carbon atoms. 40 divalent organic base. The cyclic structure may, for example, be an alicyclic ring, an aromatic ring, or a heterocyclic structure. For the above-mentioned organic groups, the hydrogen atoms in the organic groups may be substituted with hydrocarbon groups or fluorine-substituted hydrocarbon groups. In this case, the carbon numbers of the hydrocarbon groups and fluorine-substituted hydrocarbon groups are preferably 1-8. In one embodiment of the present invention, the polyamide resin and polyimide resin of the present invention may contain a plurality of types of X, and the plurality of types of X may be the same or different from each other. Examples of X include: formula (10), formula (11), formula (12), formula (13), formula (14), formula (15), formula (16), formula (17), and formula (18) The group represented by the formula (10) ~ formula (18) in which the hydrogen atom in the group represented by the formula (10) ~ formula (18) is substituted with a methyl group, a fluoro group, a chloro group or a trifluoromethyl group; and a chain formula with a carbon number of 6 or less Hydrocarbyl.

[化13]

Figure 02_image027
[化13]
Figure 02_image027

式(10)~式(18)中,*表示鍵結鍵, V1 、V2 及V3 相互獨立地表示單鍵、-O-、-S-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -、-CO-或-N(Q)-。此處,Q表示可經鹵素原子取代之碳數1~12之1價烴基。作為碳數1~12之1價烴基,可例舉關於R9 而於上述記載之基。 一個例為:V1 及V3 為單鍵、-O-或-S-,且V2 為-CH2 -、-C(CH3 )2 -、-C(CF3 )2 -或-SO2 -。V1 與V2 之對各環之鍵結位置及V2 與V3 之對各環之鍵結位置相互獨立,對各環較佳為間位或對位,更佳為對位。In formulas (10) to (18), * represents a bonding bond, and V 1 , V 2 and V 3 independently represent a single bond, -O-, -S-, -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-, -C(CH 3 ) 2 -, -C(CF 3 ) 2 -, -SO 2 -, -CO- or -N(Q)-. Here, Q represents a monovalent hydrocarbon group having 1 to 12 carbons which may be substituted with a halogen atom. 1 to 12 carbon atoms as the monovalent hydrocarbon group include the groups described above in respect of R 9. An example is: V 1 and V 3 are single bonds, -O- or -S-, and V 2 is -CH 2 -, -C(CH 3 ) 2 -, -C(CF 3 ) 2 -or -SO 2 -. The bonding position of V 1 and V 2 to each ring and the bonding position of V 2 and V 3 to each ring are independent of each other, and each ring is preferably meta or para, more preferably para.

式(10)~式(18)所表示之基中,就易於提高光學膜之拉伸彈性模數及耐彎曲性之觀點而言,較佳為式(13)、式(14)、式(15)、式(16)及式(17)所表示之基,更佳為式(14)、式(15)及式(16)所表示之基。又,作為V1 、V2 及V3 ,就易於提高光學膜之拉伸彈性模數及柔軟性之觀點而言,相互獨立地較佳為單鍵、-O-或-S-,更佳為單鍵或-O-。Among the bases represented by formulas (10) to (18), from the viewpoint of easily improving the tensile modulus of elasticity and bending resistance of the optical film, formulas (13), (14), and ( 15) The base represented by formula (16) and formula (17) is more preferably the base represented by formula (14), formula (15) and formula (16). In addition, as V 1 , V 2 and V 3 , from the viewpoint of easily improving the tensile elastic modulus and flexibility of the optical film, a single bond, -O- or -S- is preferable independently of each other, and more preferably It is a single bond or -O-.

於本發明之較佳一實施方式中,聚醯胺系樹脂及/或聚醯亞胺系樹脂含有式(5)所表示之2價之有機基作為式(1)中之X或式(2)中之X: [化14]

Figure 02_image029
[式(5)中,Ar2 相互獨立地表示可具有取代基之2價之芳香族基,V表示單鍵、-O-、二苯基亞甲基、伸茀基、碳數1~12之2價之烴基、-SO2 -、-S-、-CO-、-PO-、-PO2 -、-N(Ra )-或-Si(Rb )2 -,此處,該烴基可含有脂環式結構,該烴基中所含之氫原子可相互獨立地被取代為鹵素原子,Ra 及Rb 相互獨立地表示氫原子或可經鹵素原子取代之碳數1~12之1價之烴基,m表示0~3之整數,*表示鍵結鍵]。 於結構單元(1)及結構單元(2)含有式(5)所表示之2價之有機基作為X之情形時,結構單元(1)及結構單元(2)可含有式(5)所表示之一種或兩種以上之2價之有機基作為X。結構單元(1)及結構單元(2)可除式(5)所表示之2價之有機基外,亦含有不屬於式(5)所表示之2價之有機基之其他2價之有機基作為X。In a preferred embodiment of the present invention, the polyamide resin and/or polyimide resin contains the divalent organic group represented by formula (5) as X in formula (1) or formula (2) ) Of X: [Transformation 14]
Figure 02_image029
[In formula (5), Ar 2 independently represents a divalent aromatic group that may have a substituent, and V represents a single bond, -O-, diphenylmethylene, ethylene group, and carbon number 1-12 The divalent hydrocarbon group, -SO 2 -, -S- , -CO-, -PO-, -PO 2 -, -N(R a )- or -Si(R b ) 2 -, where the hydrocarbon group May contain an alicyclic structure, the hydrogen atoms contained in the hydrocarbon group may be independently substituted with halogen atoms, R a and R b independently represent a hydrogen atom or 1 of carbon number 1-12 that may be substituted by a halogen atom A valence hydrocarbon group, m represents an integer from 0 to 3, and * represents a bonding bond]. When the structural unit (1) and the structural unit (2) contain the divalent organic group represented by the formula (5) as X, the structural unit (1) and the structural unit (2) may contain the formula (5) One or more than two divalent organic groups are used as X. The structural unit (1) and the structural unit (2) may not only contain the divalent organic group represented by the formula (5), but also contain other divalent organic groups that do not belong to the divalent organic group represented by the formula (5) As X.

式(5)中之Ar2 表示可具有取代基之2價之芳香族基。2價之芳香族基係單環式芳香族環、縮合多環式芳香族環或集合環式芳香族環之2個氫原子被取代為鍵結鍵之基。2價之芳香族基可含有僅由碳原子形成環(單環、縮合多環或集合環)之芳香族環,亦可含有包含碳原子以外之原子而形成環之雜芳香族環。作為碳原子以外之原子,例如可例舉:氮原子、硫原子及氧原子。形成芳香族環之碳原子及碳原子以外之原子之總數並無特別限定,較佳為5~18,更佳為5~14,進而較佳為5~12。於式(5)中之m為1以上之情形時,存在複數個之Ar2 相互可相同亦可不同。 Ar 2 in the formula (5) represents a divalent aromatic group which may have a substituent. The divalent aromatic group is a monocyclic aromatic ring, a condensed polycyclic aromatic ring, or a condensed polycyclic aromatic ring, and two hydrogen atoms are substituted into a bonding group. The divalent aromatic group may contain an aromatic ring (monocyclic, condensed polycyclic or collective ring) formed only by carbon atoms, and may also contain a heteroaromatic ring including atoms other than carbon atoms to form a ring. Examples of atoms other than carbon atoms include a nitrogen atom, a sulfur atom, and an oxygen atom. The total number of carbon atoms and atoms other than carbon atoms forming the aromatic ring is not particularly limited, but is preferably 5-18, more preferably 5-14, and still more preferably 5-12. When m in formula (5) is 1 or more, there are a plurality of Ar 2 which may be the same or different from each other.

作為單環式芳香族環,例如可例舉:苯、呋喃、吡咯、噻吩、吡啶、咪唑、吡唑、㗁唑、噻唑、咪唑啉等。Examples of the monocyclic aromatic ring include benzene, furan, pyrrole, thiophene, pyridine, imidazole, pyrazole, azole, thiazole, imidazoline, and the like.

作為縮合多環式芳香族環,例如可例舉:萘、蒽、菲、吲哚、苯并噻唑、苯并咪唑、苯并㗁唑等。Examples of the condensed polycyclic aromatic ring include naphthalene, anthracene, phenanthrene, indole, benzothiazole, benzimidazole, and benzoxazole.

作為集合環式芳香族環,可例舉2個以上之單環式芳香族環及/或縮合多環式芳香族環以單鍵連結而成之結構,作為其例,可例舉作為單環式芳香族環或縮合多環式芳香族環之例而於上述記載之環之2個以上以單鍵連結而成之基,例如聯苯、聯三苯、聯四苯、聯萘、1-苯基萘、2-苯基萘、聯吡啶等。As an assembling aromatic ring, there can be mentioned a structure in which two or more monocyclic aromatic rings and/or condensed polycyclic aromatic rings are connected by a single bond. As an example, it can be exemplified as a single ring An example of a condensed polycyclic aromatic ring or a condensed polycyclic aromatic ring. Two or more of the rings described above are connected by a single bond, such as biphenyl, terphenyl, bitetraphenyl, binaphthyl, 1- Phenylnaphthalene, 2-phenylnaphthalene, bipyridine, etc.

就易於提高光學膜之拉伸彈性模數之觀點而言,可具有取代基之2價之芳香族基較佳為可具有取代基之芳香族烴環之2個氫原子被取代為鍵結鍵之基,更佳為可具有取代基之苯、聯苯、聯三苯或聯四苯之2個氫原子被取代為鍵結鍵之基,進而較佳為可具有取代基之苯或聯苯之2個氫原子被取代為鍵結鍵之基。From the viewpoint of easy improvement of the tensile elastic modulus of the optical film, the divalent aromatic group which may have a substituent is preferably an aromatic hydrocarbon ring which may have a substituent. Two hydrogen atoms of the aromatic hydrocarbon ring are substituted as a bonding bond The group is more preferably substituted benzene, biphenyl, terphenyl or bitetraphenyl. Two hydrogen atoms are substituted as bonding groups, and more preferably substituted benzene or biphenyl The two hydrogen atoms are replaced by the bonding bond group.

作為Ar2 中之取代基,可例舉:鹵基、碳數1~12之烷基、碳數1~6之烷氧基或碳數6~12之芳基或該等中所含之氫原子被取代為鹵素原子之基。Examples of substituents in Ar 2 include halogen groups, alkyl groups having 1 to 12 carbons, alkoxy groups having 1 to 6 carbons, or aryl groups having 6 to 12 carbons, or hydrogen contained in these groups. Atoms are substituted with halogen atoms.

碳數1~12之烷基可為碳數1~12之直鏈狀或支鏈狀之烷基,較佳為碳數1~6之直鏈狀或支鏈狀之烷基。作為此種基,例如可例舉:甲基、乙基、正丙基、異丙基、正丁基、第二丁基、第三丁基、正戊基、2-甲基-丁基、3-甲基丁基、2-乙基-丙基、正己基、正庚基、正辛基、第三辛基、正壬基及正癸基等。The C1-C12 alkyl group may be a C1-C12 linear or branched alkyl group, preferably a C1-C6 linear or branched alkyl group. As such a group, for example, methyl, ethyl, n-propyl, isopropyl, n-butyl, second butyl, tertiary butyl, n-pentyl, 2-methyl-butyl, 3-methylbutyl, 2-ethyl-propyl, n-hexyl, n-heptyl, n-octyl, tertiary octyl, n-nonyl and n-decyl, etc.

作為碳數1~6之烷氧基,例如例舉:甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、第三丁氧基、戊氧基、己氧基、環己氧基等。Examples of alkoxy groups having 1 to 6 carbon atoms include: methoxy, ethoxy, propoxy, isopropoxy, butoxy, isobutoxy, tertiary butoxy, and pentoxy , Hexyloxy, cyclohexyloxy, etc.

作為碳數6~12之芳基,例如可例舉:苯基、甲苯基、二甲苯基、萘基、聯苯基等。As a C6-C12 aryl group, a phenyl group, a tolyl group, a xylyl group, a naphthyl group, a biphenyl group etc. are mentioned, for example.

作為鹵素原子,可例舉:氟原子、氯原子、溴原子、碘原子等。As a halogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc. are mentioned.

作為Ar2 中之取代基,較佳為鹵基或氫原子可被取代為鹵素原子之碳數1~12之烷基,更佳為甲基、氟基、氯基或三氟甲基。The substituent in Ar 2 is preferably a halogen group or an alkyl group having 1 to 12 carbon atoms in which a hydrogen atom can be substituted with a halogen atom, and more preferably a methyl group, a fluoro group, a chloro group or a trifluoromethyl group.

式(5)中之V表示單鍵、-O-、二苯基亞甲基、伸茀基、碳數1~12之2價之烴基、-SO2 -、-S-、-CO-、-PO-、-PO2 -、-N(Ra )-或-Si(Rb )2 -。此處,該烴基可含有脂環式結構,該烴基中所含之氫原子可相互獨立地被取代為鹵素原子,Ra 及Rb 相互獨立地表示氫原子或可經鹵素原子取代之碳數1~12之1價之烴基。作為碳數1~12之1價之烴基,例如例舉:甲基、乙基、正丙基、異丙基、正丁基、第二丁基、第三丁基、正戊基、2-甲基-丁基、3-甲基丁基、2-乙基-丙基、正己基、正庚基、正辛基、第三辛基、正壬基、正癸基、環戊基、環己基等,該等可經鹵素原子取代。作為上述鹵素原子,可例舉:氟原子、氯原子、溴原子、碘原子等。作為式(5)中之V,就易於提高光學膜之拉伸彈性模數及耐彎曲性觀點而言,較佳為單鍵或碳數1~12之2價之烴基及該等烴基中所含之氫原子之至少一部分被取代為鹵素原子之基,更佳為單鍵、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -或-C(CF3 )2 -,進而較佳為單鍵、-C(CH3 )2 -或-C(CF3 )2 -,進而更佳為單鍵或-C(CF3 )2 -。The V in the formula (5) represents a single bond, -O-, diphenylmethylene, phenylene, a divalent hydrocarbon group with 1 to 12 carbons, -SO 2 -, -S-, -CO-, -PO-, -PO 2 -, -N(R a )- or -Si(R b ) 2 -. Here, the hydrocarbon group may contain an alicyclic structure, the hydrogen atoms contained in the hydrocarbon group may be independently substituted with halogen atoms, and R a and R b independently represent a hydrogen atom or the number of carbon atoms that can be substituted by a halogen atom A monovalent hydrocarbon group of 1-12. Examples of monovalent hydrocarbon groups having 1 to 12 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, second butyl, tertiary butyl, n-pentyl, 2- Methyl-butyl, 3-methylbutyl, 2-ethyl-propyl, n-hexyl, n-heptyl, n-octyl, tertiary octyl, n-nonyl, n-decyl, cyclopentyl, cyclo Hexyl, etc., which may be substituted by halogen atoms. As said halogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc. are mentioned. As V in formula (5), from the viewpoint of easy improvement of the tensile modulus of elasticity and bending resistance of the optical film, it is preferably a single bond or a divalent hydrocarbon group with 1 to 12 carbons and the content of these hydrocarbon groups At least part of the hydrogen atoms contained is substituted with halogen atoms, more preferably single bonds, -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-, -C(CH 3 ) 2- Or -C(CF 3 ) 2 -, more preferably a single bond, -C(CH 3 ) 2 -or -C(CF 3 ) 2 -, still more preferably a single bond or -C(CF 3 ) 2- .

式(5)中之m表示0~3之整數,就易於提高光學膜之拉伸彈性模數之觀點而言,較佳為0~2,更佳為0或1,進而較佳為1。In the formula (5), m represents an integer of 0 to 3, and from the viewpoint that it is easy to increase the tensile elastic modulus of the optical film, it is preferably 0 to 2, more preferably 0 or 1, and even more preferably 1.

於本發明之光學膜中所含之聚醯胺系樹脂及/或聚醯亞胺系樹脂中可含有之結構單元(1)及/或結構單元(2)含有式(5)所表示之2價之有機基作為X的本發明之較佳一態樣中,就易於提高光學膜之拉伸彈性模數之觀點而言,將結構單元(1)及結構單元(2)之合計設為100莫耳%時,式(1)中之X為式(5)所表示之2價之有機基之結構單元及式(2)中之X為式(5)所表示之2價之有機基之結構單元之合計比率較佳為70~100莫耳%,更佳為80~100莫耳%,進而較佳為90~100莫耳%,亦可為:於結構單元(1)及結構單元(2)之全部結構單元中,X為式(5)所表示之2價之有機基。The structural unit (1) and/or the structural unit (2) that can be contained in the polyamide resin and/or polyimide resin contained in the optical film of the present invention contains 2 represented by formula (5) In a preferred aspect of the present invention in which the valence organic group is X, the total of the structural unit (1) and the structural unit (2) is set to 100 from the viewpoint of easily improving the tensile elastic modulus of the optical film Mole%, X in the formula (1) is the structural unit of the divalent organic group represented by the formula (5) and X in the formula (2) is the divalent organic group represented by the formula (5) The total ratio of the structural units is preferably 70-100 mol%, more preferably 80-100 mol%, and still more preferably 90-100 mol%. It may also be: in the structural unit (1) and the structural unit ( In all the structural units of 2), X is a divalent organic group represented by formula (5).

於本發明之較佳一實施方式中,就易於提高光學膜之拉伸彈性模數之觀點而言,式(1)所表示之結構單元及/或式(2)所表示之結構單元含有式(5a)所表示之2價之有機基作為X: [化15]

Figure 02_image031
[式(5a)中,R2 表示碳數1~12之氟烷基,p及q相互獨立地表示1~4之整數,其中,於p及/或q表示2~4之整數之情形時,存在複數個之R2 相互可相同亦可不同,*表示鍵結鍵]。 再者,式(5a)所表示之2價之有機基係包含於式(5)所表示之2價之有機基中之基,具體而言,係相當於式(5)中之V表示單鍵,Ar2 表示經碳數1~12之氟烷基(R2 )取代之苯環,m表示0~3之整數之2價之有機基的基。於結構單元(1)及結構單元(2)含有式(5a)所表示之2價之有機基作為X之情形時,結構單元(1)及結構單元(2)可含有式(5a)所表示之一種或兩種以上之2價之有機基作為X。結構單元(1)及/或結構單元(2)可除式(5a)所表示之2價之有機基外,亦含有不屬於式(5a)所表示之2價之有機基之其他2價之有機基作為X。In a preferred embodiment of the present invention, from the viewpoint of easily increasing the tensile elastic modulus of the optical film, the structural unit represented by formula (1) and/or the structural unit represented by formula (2) contains the formula (5a) The divalent organic group represented as X: [化 15]
Figure 02_image031
[In formula (5a), R 2 represents a fluoroalkyl group having 1 to 12 carbon atoms, and p and q independently represent an integer of 1 to 4, where p and/or q represent an integer of 2 to 4 , There are a plurality of R 2 which may be the same or different from each other, and * indicates a bonding bond]. Furthermore, the divalent organic group represented by the formula (5a) is a group included in the divalent organic group represented by the formula (5), specifically, it is equivalent to the V in the formula (5) representing the unit A bond, Ar 2 represents a benzene ring substituted with a fluoroalkyl group (R 2 ) having 1 to 12 carbon atoms, and m represents an integer of 0 to 3 as a divalent organic group. When the structural unit (1) and the structural unit (2) contain the divalent organic group represented by the formula (5a) as X, the structural unit (1) and the structural unit (2) may contain the formula (5a) One or more than two divalent organic groups are used as X. The structural unit (1) and/or the structural unit (2) may not only contain the divalent organic group represented by the formula (5a), but also contain other divalent organic groups that do not belong to the divalent organic group represented by the formula (5a) The organic group is used as X.

式(5a)中之R2 表示碳數1~12之氟烷基。碳數1~12之氟烷基係碳數1~12之直鏈狀或支鏈狀之烷基之至少1個氫原子被取代為氟原子之基。作為碳數1~12之直鏈狀或支鏈狀之氟烷基,例如可例舉:甲基、乙基、正丙基、異丙基、正丁基、第二丁基、第三丁基、正戊基、2-甲基-丁基、3-甲基丁基、2-乙基-丙基、正己基、正庚基、正辛基、第三辛基、正壬基及正癸基等中之至少1個氫原子被取代為氟原子之基。作為碳數1~12之氟烷基,具體而言,例如可例舉:氟甲基、二氟甲基、三氟甲基、氟乙基、二氟乙基、三氟乙基、五氟乙基、七氟丙基、九氟丁基等。氟烷基之碳數較佳為1~6,更佳為1~4,進而較佳為1或2。 R 2 in the formula (5a) represents a fluoroalkyl group having 1 to 12 carbon atoms. The fluoroalkyl group having 1 to 12 carbon atoms is a group in which at least one hydrogen atom of a linear or branched chain alkyl group having 1 to 12 carbon atoms is substituted with a fluorine atom. Examples of linear or branched fluoroalkyl groups having 1 to 12 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, and tertiary butyl. Base, n-pentyl, 2-methyl-butyl, 3-methylbutyl, 2-ethyl-propyl, n-hexyl, n-heptyl, n-octyl, tertiary octyl, n-nonyl and n- At least one hydrogen atom in the decyl group is substituted with a fluorine atom. Specific examples of the fluoroalkyl group having 1 to 12 carbon atoms include: fluoromethyl, difluoromethyl, trifluoromethyl, fluoroethyl, difluoroethyl, trifluoroethyl, pentafluoro Ethyl, heptafluoropropyl, nonafluorobutyl, etc. The carbon number of the fluoroalkyl group is preferably 1-6, more preferably 1-4, and still more preferably 1 or 2.

p及q相互獨立地表示1~4之整數。作為p,就易於提高光學膜之拉伸彈性模數之觀點而言,較佳為1或2之整數,更佳為2。作為q,就易於提高光學膜之拉伸彈性模數之觀點而言,較佳為1或2之整數,更佳為1。此處,於p及/或q表示2~4之整數之情形時,存在複數個之R2 相互可相同亦可不同,存在複數個之R2 較佳為相互相同。p and q represent an integer of 1 to 4 independently of each other. As p, it is preferably an integer of 1 or 2, and more preferably 2 from the viewpoint that it is easy to increase the tensile elastic modulus of the optical film. As q, the integer of 1 or 2 is preferable, and it is more preferable that it is an integer of 1 or 2 from a viewpoint that it is easy to increase the tensile elastic modulus of an optical film. Here, when p and/or q represent an integer of 2 to 4, the presence of a plurality of R 2 may be the same or different from each other, and the presence of a plurality of R 2 is preferably the same as each other.

關於式(5a)中之2個鍵結鍵,相互之位置並無特別限定,可為鄰位、間位、對位之任一者,就易於提高光學膜之拉伸彈性模數之觀點而言,該鍵結鍵較佳為相互位於對位之位置。Regarding the two bonding bonds in the formula (5a), the mutual position is not particularly limited, and it can be any of ortho, meta, and para. It is easy to increase the tensile elastic modulus of the optical film. In other words, the bonding keys are preferably located in opposite positions.

作為式(5a)所表示之2價之芳香族基之較佳例,可例舉:式(5a)中之R2 表示碳數1~12之全氟烷基,p為2,q為1或2及/或2個鍵結鍵相互位於對位的芳香族基。As a preferable example of the divalent aromatic group represented by the formula (5a), R 2 in the formula (5a) represents a perfluoroalkyl group having 1 to 12 carbon atoms, p is 2, and q is 1. Or 2 and/or 2 aromatic groups in which the bonding bonds are in the para position with each other.

於本發明之光學膜中所含之樹脂中可含有之結構單元(1)及/或結構單元(2)含有式(5a)所表示之2價之有機基作為X的本發明之較佳一實施方式中,就易於提高光學膜之拉伸彈性模數之觀點而言,將聚醯胺醯亞胺系樹脂中所含之結構單元(1)及結構單元(2)之合計設為100莫耳%時,式(1)中之X為式(5a)所表示之2價之有機基之結構單元及式(2)中之X為式(5a)所表示之2價之有機基之結構單元之合計比率較佳為70~100莫耳%,更佳為80~100莫耳%,進而較佳為90~100莫耳%,亦可為:於結構單元(1)及結構單元(2)之全部結構單元中,X為式(5a)所表示之2價之有機基。The structural unit (1) and/or the structural unit (2) that can be contained in the resin contained in the optical film of the present invention contains a divalent organic group represented by formula (5a) as X, a preferred one of the present invention In the embodiment, from the viewpoint of easily improving the tensile elastic modulus of the optical film, the total of the structural unit (1) and the structural unit (2) contained in the polyimide-based resin is set to 100 mol When ear%, X in formula (1) is the structural unit of the divalent organic group represented by formula (5a) and X in formula (2) is the structure of the divalent organic group represented by formula (5a) The total ratio of the units is preferably 70-100 mol%, more preferably 80-100 mol%, and still more preferably 90-100 mol%, and may also be: in the structural unit (1) and the structural unit (2) In all the structural units of ), X is a divalent organic group represented by formula (5a).

於本發明之較佳一實施方式中,聚醯胺系樹脂及聚醯亞胺系樹脂含有式(4)所表示之結構作為式(1)中之X或式(2)中之X: [化16]

Figure 02_image033
[式(4)中,R10 ~R17 相互獨立地表示氫原子、碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基,R10 ~R17 中所含之氫原子可相互獨立地被取代為鹵素原子,*表示鍵結鍵]。 若式(1)及式(2)所表示之複數個結構單元中之X之至少一部分為式(4)所表示之結構,則易於提高光學膜之拉伸彈性模數及透明性。In a preferred embodiment of the present invention, the polyamide resin and polyimide resin contain the structure represented by formula (4) as X in formula (1) or X in formula (2): [化16]
Figure 02_image033
[In formula (4), R 10 to R 17 independently represent a hydrogen atom, an alkyl group with 1 to 6 carbons, an alkoxy group with 1 to 6 carbons, or an aryl group with 6 to 12 carbons, R 10 to The hydrogen atoms contained in R 17 can be substituted with halogen atoms independently of each other, and * represents a bonding bond]. If at least a part of X in the plurality of structural units represented by formula (1) and formula (2) is the structure represented by formula (4), it is easy to improve the tensile modulus and transparency of the optical film.

於式(4)中,R10 、R11 、R12 、R13 、R14 、R15 、R16 及R17 相互獨立地表示氫原子、碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基。作為碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基,可例舉作為式(3)中之碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基而例示之基。R10 ~R17 相互獨立,較佳為表示氫原子或碳數1~6之烷基,更佳為表示氫原子或碳數1~3之烷基,此處,R10 ~R17 中所含之氫原子可相互獨立地被取代為鹵素原子。作為鹵素原子,例如可例舉:氟原子、氯原子、溴原子、碘原子。R10 ~R17 相互獨立,就光學膜之拉伸彈性模數、透明性及耐彎曲性之觀點而言,進而較佳為氫原子、甲基、氟基、氯基或三氟甲基,進而更佳為R10 、R12 、R13 、R14 、R15 及R16 為氫原子,R11 及R17 為氫原子、甲基、氟基、氯基或三氟甲基,尤佳為R11 及R17 為甲基或三氟甲基。In the formula (4), R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 and R 17 independently represent a hydrogen atom, an alkyl group having 1 to 6 carbons, and a carbon number of 1 to Alkoxy group of 6 or aryl group of 6-12 carbons. Examples of alkyl groups having 1 to 6 carbons, alkoxy groups having 1 to 6 carbons, or aryl groups having 6 to 12 carbons include the alkyl groups having 1 to 6 carbons in formula (3), An exemplified group is an alkoxy group having 1 to 6 or an aryl group having 6 to 12 carbon atoms. R 10 to R 17 are independent of each other and preferably represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and more preferably represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms. Here, R 10 to R 17 are The contained hydrogen atoms can be substituted with halogen atoms independently of each other. As a halogen atom, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom are mentioned, for example. R 10 to R 17 are independent of each other, and from the viewpoints of the tensile modulus of elasticity, transparency, and bending resistance of the optical film, hydrogen atoms, methyl groups, fluorine groups, chloro groups or trifluoromethyl groups are more preferred, More preferably, R 10 , R 12 , R 13 , R 14 , R 15 and R 16 are hydrogen atoms, and R 11 and R 17 are hydrogen atoms, methyl, fluoro, chloro, or trifluoromethyl, and most preferably Where R 11 and R 17 are methyl or trifluoromethyl.

於本發明之較佳一實施方式中,式(4)所表示之結構單元為式(4')所表示之結構單元: [化17]

Figure 02_image035
, 即,式(1)及式(2)所表示之複數個結構單元中之X之至少一部分為式(4')所表示之結構單元。於該情形時,藉由含有氟元素之骨架,聚醯亞胺系樹脂或聚醯胺系樹脂之對溶劑之溶解性提高,易於提高含有該樹脂之清漆之保管穩定性,並且易於減低該清漆之黏度,易於提高光學膜之加工性。其結果,易於製造滿足數式(1)~數式(3)之本發明之光學膜。又,藉由含有氟元素之骨架,易於提高光學膜之光學特性。In a preferred embodiment of the present invention, the structural unit represented by formula (4) is the structural unit represented by formula (4'): [化17]
Figure 02_image035
, That is, at least a part of X in the plural structural units represented by formula (1) and formula (2) is a structural unit represented by formula (4'). In this case, by containing the fluorine element skeleton, the solubility of the polyimide resin or polyimide resin to the solvent is improved, it is easy to improve the storage stability of the varnish containing the resin, and it is easy to reduce the varnish The viscosity is easy to improve the processability of the optical film. As a result, it is easy to manufacture the optical film of the present invention that satisfies the mathematical formulas (1) to (3). In addition, the fluorine-containing skeleton makes it easy to improve the optical properties of the optical film.

於本發明之較佳一實施方式中,上述聚醯亞胺系樹脂或聚醯胺系樹脂中可含有之X之較佳為30莫耳%以上,更佳為50莫耳%以上,進而較佳為70莫耳%以上係由式(4),尤其式(4')所表示。於聚醯亞胺系樹脂或聚醯胺系樹脂中之上述範圍內之X由式(4),尤其式(4')所表示之情形時,對所獲得之光學膜而言,藉由含有氟元素之骨架,樹脂之對溶劑之溶解性提高,易於提高含有該樹脂之清漆之保管穩定性,並且易於減低該清漆之黏度,易於製造滿足數式(1)~數式(3)之本發明之光學膜。又,藉由含有氟元素之骨架,亦易於提高光學膜之光學特性。再者,較佳為上述聚醯亞胺系樹脂或聚醯胺系樹脂中之X之100莫耳%以下係由式(4),尤其式(4')所表示。上述樹脂中之X可為式(4),尤其式(4')。上述樹脂中之X之式(4)所表示之結構單元之比率例如可使用1 H-NMR而測定,或亦可自原料之饋入比而算出。In a preferred embodiment of the present invention, the X that can be contained in the polyimide resin or polyimide resin is preferably 30 mol% or more, more preferably 50 mol% or more, and more Preferably, 70 mol% or more is represented by formula (4), especially formula (4'). When X in the above-mentioned range in the polyimide resin or polyimide resin is represented by formula (4), especially formula (4'), for the obtained optical film, by containing The skeleton of the fluorine element and the solubility of the resin in the solvent are improved, it is easy to improve the storage stability of the varnish containing the resin, and it is easy to reduce the viscosity of the varnish, and it is easy to manufacture to satisfy the formula (1) to the formula (3). Invented optical film. In addition, it is easy to improve the optical properties of the optical film by the skeleton containing the fluorine element. Furthermore, it is preferable that 100 mol% or less of X in the polyimide resin or polyimide resin is represented by formula (4), especially formula (4'). X in the above resin may be formula (4), especially formula (4'). The ratio of the structural unit represented by the formula (4) of X in the above resin can be measured, for example, using 1 H-NMR, or can also be calculated from the feed ratio of the raw materials.

聚醯亞胺系樹脂可為含有式(30)所表示之結構單元及/或式(31)所表示之結構單元者,且可為除式(1)及視情況之式(2)所表示之結構單元外,亦含有式(30)所表示之結構單元及/或式(31)所表示之結構單元者。 [化18]

Figure 02_image037
The polyimide-based resin may contain the structural unit represented by formula (30) and/or the structural unit represented by formula (31), and may be represented by formula (1) and optionally formula (2) In addition to the structural unit, it also contains the structural unit represented by formula (30) and/or the structural unit represented by formula (31). [化18]
Figure 02_image037

式於式(30)中,Y1 為4價之有機基,較佳為有機基中之氫原子可被取代為烴基或經氟取代之烴基之有機基。作為Y1 ,可例示:式(20)、式(21)、式(22)、式(23)、式(24)、式(25)、式(26)、式(27)、式(28)及式(29)所表示之基;該式(20)~式(29)所表示之基中之氫原子被取代為甲基、氟基、氯基或三氟甲基之基;以及4價之碳數6以下之鏈式烴基。於本發明之一實施方式中,聚醯亞胺系樹脂可含有複數種Y1 ,複數種Y1 相互可相同亦可不同。In the formula (30), Y 1 is a tetravalent organic group, preferably an organic group in which the hydrogen atom in the organic group can be substituted with a hydrocarbon group or a fluorine-substituted hydrocarbon group. As Y 1 , there can be exemplified: formula (20), formula (21), formula (22), formula (23), formula (24), formula (25), formula (26), formula (27), formula (28) ) And the group represented by the formula (29); the hydrogen atom in the group represented by the formula (20) ~ formula (29) is substituted with a methyl group, a fluoro group, a chloro group or a trifluoromethyl group; and 4 A chain hydrocarbon group with a valence of less than 6 carbon atoms. In one embodiment of the present invention, the polyimide-based resin may contain multiple types of Y 1 , and the multiple types of Y 1 may be the same or different from each other.

於式(31)中,Y2 為3價之有機基,較佳為有機基中之氫原子可被取代為烴基或經氟取代之烴基之有機基。作為Y2 ,可例示:上述式(20)、式(21)、式(22)、式(23)、式(24)、式(25)、式(26)、式(27)、式(28)及式(29)所表示之基之鍵結鍵之任一個被取代為氫原子之基;及3價之碳數6以下之鏈式烴基。於本發明之一實施方式中,聚醯亞胺系樹脂可含有複數種Y2 ,複數種Y2 相互可相同亦可不同。In formula (31), Y 2 is a trivalent organic group, preferably an organic group in which the hydrogen atom in the organic group can be substituted with a hydrocarbon group or a fluorine-substituted hydrocarbon group. As Y 2 , the above formula (20), formula (21), formula (22), formula (23), formula (24), formula (25), formula (26), formula (27), formula ( 28) A group in which any one of the bonding bonds of the group represented by the formula (29) is substituted with a hydrogen atom; and a trivalent chain hydrocarbon group with 6 or less carbon atoms. In one embodiment of the present invention, the polyimide-based resin may contain a plurality of types of Y 2 , and the plurality of types of Y 2 may be the same or different from each other.

於式(30)及式(31)中,X1 及X2 相互獨立為2價之有機基,較佳為有機基中之氫原子可被取代為烴基或經氟取代之烴基之有機基。作為X1 及X2 ,可例示:上述式(10)、式(11)、式(12)、式(13)、式(14)、式(15)、式(16)、式(17)及式(18)所表示之基;該式(10)~式(18)所表示之基中之氫原子被取代為甲基、氟基、氯基或三氟甲基之基;以及碳數6以下之鏈式烴基。In formula (30) and formula (31), X 1 and X 2 are independently a divalent organic group, preferably an organic group in which a hydrogen atom in the organic group can be substituted with a hydrocarbon group or a fluorine-substituted hydrocarbon group. Examples of X 1 and X 2 include the above-mentioned formula (10), formula (11), formula (12), formula (13), formula (14), formula (15), formula (16), and formula (17) And the group represented by the formula (18); the hydrogen atom in the group represented by the formula (10) to the formula (18) is substituted with a methyl group, a fluoro group, a chloro group or a trifluoromethyl group; and the number of carbons Chain hydrocarbon group of 6 or less.

於本發明之一實施方式中,聚醯亞胺系樹脂包含式(1)及/或式(2)所表示之結構單元、以及視情況之式(30)及/或式(31)所表示之結構單元。又,就易於提高光學膜之拉伸彈性模數、光學特性及耐彎曲性之觀點而言,於上述聚醯亞胺系樹脂中,式(1)及式(2)所表示之結構單元之比率以式(1)及式(2)、以及視情形之式(30)及式(31)所表示之全部結構單元為基準,較佳為80莫耳%以上,更佳為90莫耳%以上,進而較佳為95莫耳%以上。再者,於聚醯亞胺系樹脂中,式(1)及式(2)所表示之結構單元之比率相對於式(1)及式(2)、以及視情況之式(30)及/或式(31)所表示之全部結構單元之合計,通常為100%以下。再者,上述比率例如可使用1 H-NMR而測定,或亦可自原料之饋入比而算出。In one embodiment of the present invention, the polyimide-based resin includes structural units represented by formula (1) and/or formula (2), and optionally represented by formula (30) and/or formula (31) The structural unit. In addition, from the viewpoint of easily improving the tensile modulus, optical properties, and bending resistance of the optical film, in the above-mentioned polyimide-based resin, among the structural units represented by formulas (1) and (2) The ratio is based on all the structural units represented by formula (1) and formula (2), and as the case may be, formula (30) and formula (31), preferably 80 mol% or more, more preferably 90 mol% Above, more preferably 95 mol% or more. Furthermore, in the polyimide-based resin, the ratio of the structural units represented by formula (1) and formula (2) to formula (1) and formula (2), as well as formula (30) and/or as appropriate Or the total of all structural units represented by formula (31) is usually 100% or less. In addition, the above-mentioned ratio can be measured using 1 H-NMR, for example, or it can also be calculated from the feed ratio of raw materials.

於本發明之一實施方式中,光學膜中之聚醯亞胺系樹脂及/或聚醯胺系樹脂之含量相對於光學膜100質量份,較佳為10質量份以上,更佳為30質量份以上,進而較佳為50質量份以上,較佳為99.5質量份以下,更佳為95質量份以下。若聚醯亞胺系樹脂及/或聚醯胺系樹脂之含量為上述範圍內,則易於提高光學膜之拉伸彈性模數、光學特性及耐彎曲性。In one embodiment of the present invention, the content of the polyimide resin and/or polyimide resin in the optical film relative to 100 parts by mass of the optical film, preferably 10 parts by mass or more, more preferably 30 parts by mass Parts by mass or more, more preferably 50 parts by mass or more, preferably 99.5 parts by mass or less, more preferably 95 parts by mass or less. If the content of the polyimide-based resin and/or the polyimide-based resin is within the above range, it is easy to improve the tensile modulus, optical properties, and bending resistance of the optical film.

作為聚醯亞胺系樹脂及聚醯胺系樹脂之重量平均分子量(Mw),就易於提高光學膜之拉伸彈性模數及耐彎曲性之觀點、及易於將ε12 調整為上述範圍之觀點而言,以標準聚苯乙烯換算計,較佳為100,000以上,更佳為130,000以上,進而較佳為150,000以上,進而更佳為170,000以上,尤佳為200,000以上,尤其更佳為230,000以上,尤其進而較佳為250,000以上,進一步較佳為260,000以上。又,作為聚醯亞胺系樹脂及聚醯胺系樹脂之重量平均分子量,就易於提高該樹脂之對溶劑之溶解性,並且易於提高光學膜之延伸性及加工性之觀點而言,較佳為800,000以下,更佳為700,000以下,進而較佳為600,000以下,進而更佳為500,000以下,尤佳為400,000以下,尤其更佳為350,000以下,尤其進而較佳為300,000以下。重量平均分子量例如可進行GPC測定,藉由標準聚苯乙烯換算而求得,例如可藉由實施例中記載之方法而算出。於聚醯亞胺系樹脂及聚醯胺系樹脂之重量平均分子量(Mw)為上述上限以下之情形時,易於提高含有該樹脂之清漆之固形物成分,且易於降低清漆之黏度,其結果,易於製造滿足數式(1)~數式(3)之本發明之光學膜。又,易於維持耐彎曲性試驗後之廣角方向之視認性。As the weight average molecular weight (Mw) of polyimide resin and polyimide resin, it is easy to improve the tensile modulus of elasticity and bending resistance of the optical film, and it is easy to adjust ε 12 to the above From the viewpoint of the range, in terms of standard polystyrene, it is preferably 100,000 or more, more preferably 130,000 or more, still more preferably 150,000 or more, still more preferably 170,000 or more, particularly preferably 200,000 or more, especially more preferably 230,000 or more, especially more preferably 250,000 or more, still more preferably 260,000 or more. In addition, as the weight average molecular weight of the polyimide resin and the polyimide resin, it is preferable from the viewpoints that the solubility of the resin to the solvent is easily improved, and the elongation and processability of the optical film are easily improved. It is 800,000 or less, more preferably 700,000 or less, still more preferably 600,000 or less, still more preferably 500,000 or less, particularly preferably 400,000 or less, especially more preferably 350,000 or less, and especially even more preferably 300,000 or less. The weight average molecular weight can be measured, for example, by GPC, and can be obtained by standard polystyrene conversion, and can be calculated, for example, by the method described in the examples. When the weight average molecular weight (Mw) of the polyimide resin and the polyimide resin is below the above upper limit, it is easy to increase the solid content of the varnish containing the resin, and it is easy to reduce the viscosity of the varnish, as a result, It is easy to manufacture the optical film of the present invention that satisfies the formula (1) to (3). In addition, it is easy to maintain the visibility in the wide-angle direction after the bending resistance test.

於聚醯胺醯亞胺樹脂中,式(2)所表示之結構單元之含量相對於式(1)所表示之結構單元1莫耳,較佳為0.1莫耳以上,更佳為0.5莫耳以上,進而較佳為1.0莫耳以上,進而更佳為1.5莫耳以上,較佳為6.0莫耳以下,更佳為5.0莫耳以下,進而較佳為4.5莫耳以下。若式(2)所表示之結構單元之含量為上述下限以上,則易於提高光學膜之拉伸彈性模數。又,若式(2)所表示之結構單元之含量為上述上限以下,則抑制式(2)中之醯胺鍵間之氫鍵所導致之增黏,易於降低製造光學膜時之清漆之黏度,故而易於製造滿足數式(1)~數式(3)之本發明之光學膜。In the polyamide imide resin, the content of the structural unit represented by formula (2) is relative to 1 mol of the structural unit represented by formula (1), preferably 0.1 mol or more, more preferably 0.5 mol Above, it is more preferably 1.0 mol or more, still more preferably 1.5 mol or more, preferably 6.0 mol or less, more preferably 5.0 mol or less, and still more preferably 4.5 mol or less. If the content of the structural unit represented by the formula (2) is more than the above lower limit, it is easy to increase the tensile modulus of the optical film. Moreover, if the content of the structural unit represented by the formula (2) is below the above upper limit, the viscosity increase caused by the hydrogen bond between the amide bonds in the formula (2) will be suppressed, and the viscosity of the varnish during the manufacture of the optical film will be easily reduced. , Therefore, it is easy to manufacture the optical film of the present invention that satisfies the equations (1) to (3).

於本發明之較佳一實施方式中,光學膜中所含之聚醯亞胺系樹脂及/或聚醯胺系樹脂可含有例如可藉由上述含氟取代基等而導入之氟原子等鹵素原子。於聚醯亞胺系樹脂及/或聚醯胺系樹脂含有鹵素原子之情形時,易於提高光學膜之拉伸彈性模數,且易於減低YI值。若光學膜之拉伸彈性模數較高,則易於抑制損傷及皺褶等之產生,並且易於提高低溫環境下之力學特性。又,若光學膜之YI值較低,則易於提高該膜之透明性及視認性。鹵素原子較佳為氟原子。作為用以使聚醯亞胺系樹脂中含有氟原子之較佳含氟取代基,例如可例舉氟基及三氟甲基。In a preferred embodiment of the present invention, the polyimide-based resin and/or polyimide-based resin contained in the optical film may contain, for example, halogens such as fluorine atoms that can be introduced by the above-mentioned fluorine-containing substituents. atom. When the polyimide-based resin and/or the polyimide-based resin contains halogen atoms, it is easy to increase the tensile modulus of the optical film, and it is easy to reduce the YI value. If the tensile elastic modulus of the optical film is high, it is easy to suppress the occurrence of damage and wrinkles, and it is easy to improve the mechanical properties in a low temperature environment. Moreover, if the YI value of the optical film is low, it is easy to improve the transparency and visibility of the film. The halogen atom is preferably a fluorine atom. As a preferable fluorine-containing substituent for making the polyimide resin contain a fluorine atom, a fluorine group and a trifluoromethyl group can be mentioned, for example.

聚醯亞胺系樹脂及聚醯胺系樹脂中之鹵素原子之含量分別以聚醯亞胺系樹脂及聚醯胺系樹脂之質量為基準,較佳為1~40質量%,更佳為5~40質量%,進而較佳為5~30質量%。若鹵素原子之含量為上述下限以上,則易於進一步提高光學膜之拉伸彈性模數,且易於進一步減低YI值。若鹵素原子之含量為上述上限以下,則易於合成。The content of the halogen atoms in the polyimide resin and the polyimide resin is based on the mass of the polyimide resin and the polyimide resin, and is preferably 1-40% by mass, more preferably 5 -40% by mass, more preferably 5-30% by mass. If the content of halogen atoms is more than the above lower limit, it is easy to further increase the tensile modulus of the optical film, and it is easy to further reduce the YI value. If the content of the halogen atom is less than the above upper limit, it is easy to synthesize.

聚醯亞胺系樹脂及聚醯胺醯亞胺樹脂之醯亞胺化率較佳為90%以上,更佳為93%以上,進而較佳為96%以上。就易於提高光學膜之光學特性之觀點而言,醯亞胺化率較佳為上述下限以上。又,醯亞胺化率之上限為100%以下。醯亞胺化率係表示聚醯亞胺系樹脂中之醯亞胺鍵之莫耳量相對於聚醯亞胺系樹脂中之源自四羧酸化合物之結構單元之莫耳量之2倍之值的比率。再者,於聚醯亞胺系樹脂含有三羧酸化合物之情形時,係表示聚醯亞胺系樹脂中之醯亞胺鍵之莫耳量相對於聚醯亞胺系樹脂中之源自四羧酸化合物之結構單元之莫耳量之2倍之值與源自三羧酸化合物之結構單元之莫耳量之合計的比率。又,醯亞胺化率可藉由IR(Infrared Spectroscopy,紅外光譜)法、NMR(nuclear magnetic resonance,核磁共振)法等而求得。The polyimide resin and the polyimide resin have an imidization rate of preferably 90% or more, more preferably 93% or more, and still more preferably 96% or more. From the viewpoint of easy improvement of the optical properties of the optical film, the imidization rate is preferably at least the above lower limit. In addition, the upper limit of the imidization rate is 100% or less. The rate of imidization means that the molar amount of the amide bond in the polyimine resin is twice the molar amount of the structural unit derived from the tetracarboxylic acid compound in the polyimine resin. Value ratio. Furthermore, when the polyimide-based resin contains a tricarboxylic acid compound, it means that the molar amount of the imine bond in the polyimide-based resin is relative to that of the polyimide-based resin. The ratio of the value of twice the molar amount of the structural unit of the carboxylic acid compound to the total molar amount of the structural unit derived from the tricarboxylic acid compound. In addition, the imidization rate can be obtained by IR (Infrared Spectroscopy) method, NMR (nuclear magnetic resonance, nuclear magnetic resonance) method, or the like.

於本發明中,光學膜可含有聚醯胺系樹脂。本實施方式之聚醯胺系樹脂係以式(2)所表示之重複結構單元為主之聚合物。聚醯胺系樹脂中之式(2)中之Z之較佳例及具體例與聚醯亞胺系樹脂中之Z之較佳例及具體例相同。上述聚醯胺系樹脂可含有Z不同之兩種以上之式(2)所表示之重複結構單元。In the present invention, the optical film may contain a polyamide resin. The polyamide resin of this embodiment is a polymer mainly composed of the repeating structural unit represented by formula (2). The preferable examples and specific examples of Z in the formula (2) in the polyimide-based resin are the same as the preferable examples and specific examples of Z in the polyimide-based resin. The polyamide-based resin may contain two or more repeating structural units represented by formula (2) with different Z.

(樹脂之製造方法) 本發明之光學膜中所含之聚醯亞胺系樹脂及聚醯胺系樹脂之製造方法並無特別限定。聚醯亞胺樹脂及聚醯亞胺前驅物樹脂例如可將四羧酸化合物及二胺化合物作為主原料而製造,聚醯胺醯亞胺樹脂及聚醯胺醯亞胺前驅物樹脂例如可將四羧酸化合物、二羧酸化合物及二胺化合物作為主原料而製造,聚醯胺樹脂例如可將二胺化合物及二羧酸化合物作為主原料而製造。(Manufacturing method of resin) The manufacturing method of the polyimide resin and polyimide resin contained in the optical film of this invention is not specifically limited. Polyimide resins and polyimide precursor resins can be produced, for example, using tetracarboxylic acid compounds and diamine compounds as main raw materials. Polyimide resins and polyimide precursor resins can be, for example, A tetracarboxylic acid compound, a dicarboxylic acid compound, and a diamine compound are produced as main raw materials, and the polyamide resin can be produced using, for example, a diamine compound and a dicarboxylic acid compound as main raw materials.

式(1)及式(30)所表示之結構單元通常係自二胺化合物與四羧酸化合物衍生。式(2)所表示之結構單元通常係自二胺化合物與二羧酸化合物衍生。式(31)所表示之結構單元通常係自二胺化合物與三羧酸化合物衍生。The structural units represented by formula (1) and formula (30) are usually derived from diamine compounds and tetracarboxylic acid compounds. The structural unit represented by the formula (2) is usually derived from a diamine compound and a dicarboxylic acid compound. The structural unit represented by the formula (31) is usually derived from a diamine compound and a tricarboxylic acid compound.

作為樹脂之製造中所使用之二胺化合物,例如可例舉:脂肪族二胺、芳香族二胺及該等之混合物。再者,於本實施方式中所謂「芳香族二胺」係指胺基直接鍵結於芳香環之二胺,可於其結構之一部分中含有脂肪族基或其他取代基。該芳香環可為單環,亦可為縮合環,可例示苯環、萘環、蒽環及茀環等,但並不限定於該等。該等之中,較佳可例示苯環。又所謂「脂肪族二胺」係指胺基直接鍵結於脂肪族基之二胺,可於其結構之一部分中含有芳香環或其他取代基。As the diamine compound used in the production of the resin, for example, aliphatic diamine, aromatic diamine, and mixtures thereof can be mentioned. Furthermore, in the present embodiment, the term "aromatic diamine" refers to a diamine in which an amine group is directly bonded to an aromatic ring, and may contain an aliphatic group or other substituents in a part of its structure. The aromatic ring may be a monocyclic ring or a condensed ring. A benzene ring, a naphthalene ring, an anthracene ring, a sulphur ring, etc. may be exemplified, but it is not limited to these. Among these, a benzene ring is preferably exemplified. The so-called "aliphatic diamine" refers to a diamine in which an amine group is directly bonded to an aliphatic group, which may contain an aromatic ring or other substituents in a part of its structure.

作為脂肪族二胺,例如可例舉:六亞甲基二胺等非環式脂肪族二胺、以及1,3-雙(胺基甲基)環己烷、1,4-雙(胺基甲基)環己烷、降𦯉烷二胺及4,4'-二胺基二環己基甲烷等環式脂肪族二胺等。該等可單獨使用或組合使用兩種以上。As aliphatic diamines, for example, acyclic aliphatic diamines such as hexamethylene diamine, 1,3-bis(aminomethyl)cyclohexane, and 1,4-bis(amino) Cycloaliphatic diamines such as methyl)cyclohexane, noralkanediamine and 4,4'-diaminodicyclohexylmethane, etc. These can be used alone or in combination of two or more.

作為芳香族二胺,例如可例舉:對苯二胺、間苯二胺、2,4-甲苯二胺、間苯二甲胺、對苯二甲胺、1,5-二胺基萘、2,6-二胺基萘等具有1個芳香環之芳香族二胺、4,4'-二胺基二苯基甲烷、4,4'-二胺基二苯基丙烷、4,4'-二胺基二苯醚、3,4'-二胺基二苯醚、3,3'-二胺基二苯醚、4,4'-二胺基二苯基碸、3,4'-二胺基二苯基碸、3,3'-二胺基二苯基碸、1,4-雙(4-胺基苯氧基)苯、1,3-雙(4-胺基苯氧基)苯、雙[4-(4-胺基苯氧基)苯基]碸、雙[4-(3-胺基苯氧基)苯基]碸、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、2,2-雙[4-(3-胺基苯氧基)苯基]丙烷、2,2'-二甲基聯苯胺、2,2'-雙(三氟甲基)-4,4'-二胺基聯苯(有時記為TFMB)、4,4'-雙(4-胺基苯氧基)聯苯、9,9-雙(4-胺基苯基)茀、9,9-雙(4-胺基-3-甲基苯基)茀、9,9-雙(4-胺基-3-氯苯基)茀、9,9-雙(4-胺基-3-氟苯基)茀等具有2個以上芳香環之芳香族二胺。該等可單獨使用或組合使用兩種以上。As the aromatic diamine, for example, p-phenylenediamine, m-phenylenediamine, 2,4-toluenediamine, m-xylylenediamine, p-xylylenediamine, 1,5-diaminonaphthalene, 2,6-diaminonaphthalene and other aromatic diamines with one aromatic ring, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylpropane, 4,4' -Diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 3,3'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether, 3,4'- Diaminodiphenyl sulfide, 3,3'-diaminodiphenyl sulfide, 1,4-bis(4-aminophenoxy)benzene, 1,3-bis(4-aminophenoxy) ) Benzene, bis[4-(4-aminophenoxy)phenyl] ash, bis[4-(3-aminophenoxy)phenyl] ash, 2,2-bis[4-(4- Aminophenoxy)phenyl]propane, 2,2-bis[4-(3-aminophenoxy)phenyl]propane, 2,2'-dimethylbenzidine, 2,2'-bis (Trifluoromethyl)-4,4'-diaminobiphenyl (sometimes referred to as TFMB), 4,4'-bis(4-aminophenoxy)biphenyl, 9,9-bis(4 -Aminophenyl) pyrene, 9,9-bis(4-amino-3-methylphenyl) pyrene, 9,9-bis(4-amino-3-chlorophenyl) pyrene, 9,9 -Aromatic diamines with two or more aromatic rings such as bis(4-amino-3-fluorophenyl) pyridium. These can be used alone or in combination of two or more.

芳香族二胺較佳為4,4'-二胺基二苯基甲烷、4,4'-二胺基二苯基丙烷、4,4'-二胺基二苯醚、3,3'-二胺基二苯醚、4,4'-二胺基二苯基碸、3,3'-二胺基二苯基碸、1,4-雙(4-胺基苯氧基)苯、雙[4-(4-胺基苯氧基)苯基]碸、雙[4-(3-胺基苯氧基)苯基]碸、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、2,2-雙[4-(3-胺基苯氧基)苯基]丙烷、2,2'-二甲基聯苯胺、2,2'-雙(三氟甲基)-4,4'-二胺基聯苯(TFMB)、4,4'-雙(4-胺基苯氧基)聯苯,更佳為4,4'-二胺基二苯基甲烷、4,4'-二胺基二苯基丙烷、4,4'-二胺基二苯醚、4,4'-二胺基二苯基碸、1,4-雙(4-胺基苯氧基)苯、雙[4-(4-胺基苯氧基)苯基]碸、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、2,2'-二甲基聯苯胺、2,2'-雙(三氟甲基)-4,4'-二胺基聯苯(TFMB)、4,4'-雙(4-胺基苯氧基)聯苯。該等可單獨使用或組合使用兩種以上。The aromatic diamine is preferably 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenyl ether, 3,3'- Diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfide, 3,3'-diaminodiphenyl sulfide, 1,4-bis(4-aminophenoxy)benzene, double [4-(4-Aminophenoxy)phenyl] ash, bis[4-(3-aminophenoxy)phenyl] ash, 2,2-bis[4-(4-aminophenoxy) Yl)phenyl]propane, 2,2-bis[4-(3-aminophenoxy)phenyl]propane, 2,2'-dimethylbenzidine, 2,2'-bis(trifluoromethane) )-4,4'-diaminobiphenyl (TFMB), 4,4'-bis(4-aminophenoxy)biphenyl, more preferably 4,4'-diaminodiphenylmethane , 4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenyl ether, 4,4'-diaminodiphenylene, 1,4-bis(4-aminobenzene Oxy)benzene, bis[4-(4-aminophenoxy)phenyl] chrysene, 2,2-bis[4-(4-aminophenoxy)phenyl]propane, 2,2'- Dimethylbenzidine, 2,2'-bis(trifluoromethyl)-4,4'-diaminobiphenyl (TFMB), 4,4'-bis(4-aminophenoxy)biphenyl . These can be used alone or in combination of two or more.

上述二胺化合物之中,就易於提高光學膜之拉伸彈性模數、透明性、柔軟性、耐彎曲性,易於減低YI值之觀點而言,較佳為使用選自由具有聯苯結構之芳香族二胺所組成之群中之一種以上。更佳為使用選自由2,2'-二甲基聯苯胺、2,2'-雙(三氟甲基)聯苯胺、4,4'-雙(4-胺基苯氧基)聯苯及4,4'-二胺基二苯醚所組成之群中之一種以上,進而更佳為使用2,2'-雙(三氟甲基)-4,4'-二胺基聯苯(TFMB)。Among the above-mentioned diamine compounds, it is preferable to use aromatic compounds selected from the group consisting of biphenyl structure in terms of easily improving the tensile elastic modulus, transparency, flexibility, and bending resistance of the optical film, and easily reducing the YI value. One or more of the group consisting of diamines. More preferably, use selected from 2,2'-dimethylbenzidine, 2,2'-bis(trifluoromethyl)benzidine, 4,4'-bis(4-aminophenoxy)biphenyl and 4,4'-diaminodiphenyl ether is composed of more than one kind, and more preferably 2,2'-bis(trifluoromethyl)-4,4'-diaminodiphenyl (TFMB ).

作為樹脂之製造中所使用之四羧酸化合物,可例舉:芳香族四羧酸二酐等芳香族四羧酸化合物;及脂肪族四羧酸二酐等脂肪族四羧酸化合物等。四羧酸化合物可單獨使用,亦可組合使用兩種以上。四羧酸化合物除二酐外,亦可為醯氯化合物等四羧酸化合物類似物。Examples of the tetracarboxylic acid compound used in the production of the resin include aromatic tetracarboxylic acid compounds such as aromatic tetracarboxylic dianhydride; and aliphatic tetracarboxylic acid compounds such as aliphatic tetracarboxylic dianhydride. The tetracarboxylic acid compound may be used alone or in combination of two or more kinds. In addition to the dianhydride, the tetracarboxylic acid compound may also be a tetracarboxylic acid compound analogue such as a chlorine compound.

作為芳香族四羧酸二酐之具體例,可例舉:非縮合多環式之芳香族四羧酸二酐、單環式之芳香族四羧酸二酐及縮合多環式之芳香族四羧酸二酐。作為非縮合多環式之芳香族四羧酸二酐,例如可例舉:4,4'-氧二鄰苯二甲酸二酐、3,3',4,4'-二苯甲酮四羧酸二酐、2,2',3,3'-二苯甲酮四羧酸二酐、3,3',4,4'-聯苯四羧酸二酐(有時記為BPDA)、2,2',3,3'-聯苯四羧酸二酐、3,3',4,4'-二苯基碸四羧酸二酐、2,2-雙(3,4-二羧基苯基)丙烷二酐、2,2-雙(2,3-二羧基苯基)丙烷二酐、2,2-雙(3,4-二羧基苯氧基苯基)丙烷二酐、4,4'-(六氟亞異丙基)二鄰苯二甲酸二酐(有時記為6FDA)、1,2-雙(2,3-二羧基苯基)乙烷二酐、1,1-雙(2,3-二羧基苯基)乙烷二酐、1,2-雙(3,4-二羧基苯基)乙烷二酐、1,1-雙(3,4-二羧基苯基)乙烷二酐、雙(3,4-二羧基苯基)甲烷二酐、雙(2,3-二羧基苯基)甲烷二酐、4,4'-(對伸苯基二氧基)二鄰苯二甲酸二酐、4,4'-(間伸苯基二氧基)二鄰苯二甲酸二酐。又,作為單環式之芳香族四羧酸二酐,例如可例舉:1,2,4,5-苯四羧酸二酐,作為縮合多環式之芳香族四羧酸二酐,例如可例舉:2,3,6,7-萘四羧酸二酐。Specific examples of aromatic tetracarboxylic dianhydrides include: non-condensed polycyclic aromatic tetracarboxylic dianhydrides, monocyclic aromatic tetracarboxylic dianhydrides, and condensed polycyclic aromatic tetracarboxylic dianhydrides. Carboxylic dianhydride. Examples of non-condensed polycyclic aromatic tetracarboxylic dianhydrides include 4,4'-oxydiphthalic dianhydride, 3,3',4,4'-benzophenone tetracarboxylic acid Acid dianhydride, 2,2',3,3'-benzophenonetetracarboxylic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride (sometimes referred to as BPDA), 2 ,2',3,3'-biphenyltetracarboxylic dianhydride, 3,3',4,4'-diphenyl tetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxybenzene Base) propane dianhydride, 2,2-bis(2,3-dicarboxyphenyl)propane dianhydride, 2,2-bis(3,4-dicarboxyphenoxyphenyl)propane dianhydride, 4,4 '-(Hexafluoroisopropylidene) diphthalic dianhydride (sometimes referred to as 6FDA), 1,2-bis(2,3-dicarboxyphenyl)ethane dianhydride, 1,1-bis (2,3-Dicarboxyphenyl)ethane dianhydride, 1,2-bis(3,4-dicarboxyphenyl)ethane dianhydride, 1,1-bis(3,4-dicarboxyphenyl) Ethane dianhydride, bis(3,4-dicarboxyphenyl)methane dianhydride, bis(2,3-dicarboxyphenyl)methane dianhydride, 4,4'-(p-phenylenedioxy) two Phthalic dianhydride, 4,4'-(m-phenylenedioxy) diphthalic dianhydride. In addition, as a monocyclic aromatic tetracarboxylic dianhydride, for example, 1,2,4,5-benzenetetracarboxylic dianhydride can be exemplified, and as a condensed polycyclic aromatic tetracarboxylic dianhydride, for example For example: 2,3,6,7-naphthalenetetracarboxylic dianhydride.

該等之中,較佳可例舉:4,4'-氧二鄰苯二甲酸二酐、3,3',4,4'-二苯甲酮四羧酸二酐、2,2',3,3'-二苯甲酮四羧酸二酐、3,3',4,4'-聯苯四羧酸二酐、2,2',3,3'-聯苯四羧酸二酐、3,3',4,4'-二苯基碸四羧酸二酐、2,2-雙(3,4-二羧基苯基)丙烷二酐、2,2-雙(2,3-二羧基苯基)丙烷二酐、2,2-雙(3,4-二羧基苯氧基苯基)丙烷二酐、4,4'-(六氟亞異丙基)二鄰苯二甲酸二酐(6FDA)、1,2-雙(2,3-二羧基苯基)乙烷二酐、1,1-雙(2,3-二羧基苯基)乙烷二酐、1,2-雙(3,4-二羧基苯基)乙烷二酐、1,1-雙(3,4-二羧基苯基)乙烷二酐、雙(3,4-二羧基苯基)甲烷二酐、雙(2,3-二羧基苯基)甲烷二酐、4,4'-(對伸苯基二氧基)二鄰苯二甲酸二酐及4,4'-(間伸苯基二氧基)二鄰苯二甲酸二酐,更佳可例舉:4,4'-氧二鄰苯二甲酸二酐、3,3',4,4'-聯苯四羧酸二酐、2,2',3,3'-聯苯四羧酸二酐、4,4'-(六氟亞異丙基)二鄰苯二甲酸二酐(6FDA)、雙(3,4-二羧基苯基)甲烷二酐及4,4'-(對伸苯基二氧基)二鄰苯二甲酸二酐。該等可單獨使用或組合使用兩種以上。Among these, preferred examples include: 4,4'-oxydiphthalic dianhydride, 3,3',4,4'-benzophenonetetracarboxylic dianhydride, 2,2', 3,3'-benzophenonetetracarboxylic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 2,2',3,3'-biphenyltetracarboxylic dianhydride , 3,3',4,4'-diphenyl tetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxyphenyl)propane dianhydride, 2,2-bis(2,3- Dicarboxyphenyl)propane dianhydride, 2,2-bis(3,4-dicarboxyphenoxyphenyl)propane dianhydride, 4,4'-(hexafluoroisopropylidene)diphthalic acid Anhydride (6FDA), 1,2-bis(2,3-dicarboxyphenyl)ethane dianhydride, 1,1-bis(2,3-dicarboxyphenyl)ethane dianhydride, 1,2-bis (3,4-Dicarboxyphenyl)ethane dianhydride, 1,1-bis(3,4-dicarboxyphenyl)ethane dianhydride, bis(3,4-dicarboxyphenyl)methane dianhydride, Bis(2,3-dicarboxyphenyl)methane dianhydride, 4,4'-(p-phenylenedioxy) diphthalic dianhydride and 4,4'-(m-phenylenedioxy) ) Diphthalic dianhydride, more preferably: 4,4'-oxydiphthalic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 2,2 ',3,3'-Biphenyltetracarboxylic dianhydride, 4,4'-(hexafluoroisopropylidene)diphthalic dianhydride (6FDA), bis(3,4-dicarboxyphenyl) Methane dianhydride and 4,4'-(p-phenylenedioxy) diphthalic dianhydride. These can be used alone or in combination of two or more.

作為脂肪族四羧酸二酐,可例舉:環式或非環式之脂肪族四羧酸二酐。所謂環式脂肪族四羧酸二酐係指具有脂環式烴結構之四羧酸二酐,作為其具體例,可例舉:1,2,4,5-環己烷四羧酸二酐、1,2,3,4-環丁烷四羧酸二酐、1,2,3,4-環戊烷四羧酸二酐等環烷烴四羧酸二酐、雙環[2.2.2]辛-7-烯-2,3,5,6-四羧酸二酐、二環己基-3,3',4,4'-四羧酸二酐及該等之位置異構物。該等可單獨使用或組合使用兩種以上。作為非環式脂肪族四羧酸二酐之具體例,可例舉:1,2,3,4-丁烷四羧酸二酐及1,2,3,4-戊烷四羧酸二酐等,該等可單獨使用或組合使用兩種以上。又,可組合使用環式脂肪族四羧酸二酐及非環式脂肪族四羧酸二酐。The aliphatic tetracarboxylic dianhydride may, for example, be a cyclic or acyclic aliphatic tetracarboxylic dianhydride. The so-called cyclic aliphatic tetracarboxylic dianhydride refers to tetracarboxylic dianhydride having an alicyclic hydrocarbon structure, as a specific example thereof, 1,2,4,5-cyclohexane tetracarboxylic dianhydride , 1,2,3,4-cyclobutanetetracarboxylic dianhydride, 1,2,3,4-cyclopentanetetracarboxylic dianhydride and other cycloalkane tetracarboxylic dianhydrides, bicyclo[2.2.2]octane -7-ene-2,3,5,6-tetracarboxylic dianhydride, dicyclohexyl-3,3',4,4'-tetracarboxylic dianhydride and their positional isomers. These can be used alone or in combination of two or more. Specific examples of acyclic aliphatic tetracarboxylic dianhydride include 1,2,3,4-butane tetracarboxylic dianhydride and 1,2,3,4-pentane tetracarboxylic dianhydride Etc., these can be used alone or in combination of two or more. Moreover, cycloaliphatic tetracarboxylic dianhydride and acyclic aliphatic tetracarboxylic dianhydride can be used in combination.

上述四羧酸二酐之中,就易於提高光學膜之拉伸彈性模數、表面硬度、透明性、柔軟性及耐彎曲性,易於減低YI值之觀點而言,較佳為4,4'-氧二鄰苯二甲酸二酐、3,3',4,4'-二苯甲酮四羧酸二酐、3,3',4,4'-聯苯四羧酸二酐、2,2',3,3'-聯苯四羧酸二酐、3,3',4,4'-二苯基碸四羧酸二酐、2,2-雙(3,4-二羧基苯基)丙烷二酐、4,4'-(六氟亞異丙基)二鄰苯二甲酸二酐以及該等之混合物,更佳為3,3',4,4'-聯苯四羧酸二酐及4,4'-(六氟亞異丙基)二鄰苯二甲酸二酐以及該等之混合物,進而較佳為4,4'-(六氟亞異丙基)二鄰苯二甲酸二酐(6FDA)及3,3',4,4'-聯苯四羧酸二酐(BPDA)。Among the above-mentioned tetracarboxylic dianhydrides, 4,4' is preferable in terms of easy improvement of the tensile elastic modulus, surface hardness, transparency, flexibility, and bending resistance of the optical film, and easy reduction of the YI value. -Oxydiphthalic dianhydride, 3,3',4,4'-benzophenonetetracarboxylic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 2, 2',3,3'-biphenyltetracarboxylic dianhydride, 3,3',4,4'-diphenyl tetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxyphenyl) ) Propane dianhydride, 4,4'-(hexafluoroisopropylidene) diphthalic dianhydride and mixtures thereof, more preferably 3,3',4,4'-biphenyltetracarboxylic acid Anhydride and 4,4'-(hexafluoroisopropylidene) diphthalic dianhydride and mixtures thereof, and more preferably 4,4'-(hexafluoroisopropylidene) diphthalic acid The dianhydride (6FDA) and 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA).

作為樹脂之合成中所使用之二羧酸化合物,可例舉:芳香族二羧酸、脂肪族二羧酸及該等之類似之醯氯化合物、酸酐等,可併用兩種以上。作為具體例,可例舉:對苯二甲酸;間苯二甲酸;2-甲氧基對苯二甲酸;2-甲基對苯二甲酸;2,5-雙(三氟甲基)對苯二甲酸;間苯二甲酸;2,5-二甲基對苯二甲酸;2,5-二甲氧基對苯二甲酸;萘二羧酸;4,4'-聯苯二羧酸;3,3'-聯苯二羧酸;2,2'-雙(三氟甲基)-4,4'-聯苯二羧酸;碳數8以下之鏈式烴之二羧酸化合物及2個苯甲酸以單鍵、-CH2 -、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -或伸苯基連結而成之化合物、以及該等之醯氯化合物。該等二羧酸化合物之中,就易於提高光學膜之拉伸彈性模數及耐彎曲性之觀點而言,較佳為4,4'-氧基雙苯甲酸、對苯二甲酸、間苯二甲酸、2-甲氧基對苯二甲酸、2-甲基對苯二甲酸、2,5-二甲基對苯二甲酸、2,5-二甲氧基對苯二甲酸、2,5-雙(三氟甲基)對苯二甲酸、2,2'-雙(三氟甲基)-4,4'-聯苯二羧酸及該等之醯氯,更佳為2-甲氧基對苯二甲酸、2-甲基對苯二甲酸、2,5-二甲基對苯二甲醯氯(DMTPC)、2,5-二甲氧基對苯二甲醯氯(MOTPC)、2,5-雙(三氟甲基)對苯二甲醯氯(6FTPC)、對苯二甲醯氯(TPC)、間苯二甲醯氯,進而較佳為2-甲氧基對苯二甲酸、2-甲基對苯二甲酸、對苯二甲醯氯(TPC)、2,5-二甲基對苯二甲醯氯(DMTPC)、2,5-二甲氧基對苯二甲醯氯(MOTPC),進而更佳為2-甲氧基對苯二甲酸、2-甲基對苯二甲酸、2,5-二甲基對苯二甲醯氯(DMTPC)及2,5-二甲氧基對苯二甲醯氯(MOTPC)。The dicarboxylic acid compound used in the synthesis of the resin may, for example, be aromatic dicarboxylic acid, aliphatic dicarboxylic acid, and similar chlorinated compounds, acid anhydrides, etc., and two or more of them may be used in combination. Specific examples include: terephthalic acid; isophthalic acid; 2-methoxyterephthalic acid; 2-methylterephthalic acid; 2,5-bis(trifluoromethyl)p-benzene Dicarboxylic acid; isophthalic acid; 2,5-dimethylterephthalic acid; 2,5-dimethoxyterephthalic acid; naphthalene dicarboxylic acid; 4,4'-biphenyl dicarboxylic acid; 3 ,3'-biphenyldicarboxylic acid; 2,2'-bis(trifluoromethyl)-4,4'-biphenyldicarboxylic acid; dicarboxylic acid compound of chain hydrocarbon with carbon number less than 8 and 2 Compounds in which benzoic acid is linked by single bonds, -CH 2 -, -C(CH 3 ) 2 -, -C(CF 3 ) 2 -, -SO 2 -or phenylene, and these chlorinated compounds . Among these dicarboxylic acid compounds, 4,4'-oxybisbenzoic acid, terephthalic acid, and isophthalic acid are preferred from the viewpoint of easily improving the tensile elastic modulus and bending resistance of the optical film. Dicarboxylic acid, 2-methoxyterephthalic acid, 2-methylterephthalic acid, 2,5-dimethylterephthalic acid, 2,5-dimethoxyterephthalic acid, 2,5 -Bis(trifluoromethyl)terephthalic acid, 2,2'-bis(trifluoromethyl)-4,4'-biphenyldicarboxylic acid and these chlorinated acids, more preferably 2-methoxy Terephthalic acid, 2-methylterephthalic acid, 2,5-dimethylterephthalate chloride (DMTPC), 2,5-dimethoxyterephthalate chloride (MOTPC), 2,5-Bis (trifluoromethyl) terephthalic acid chloride (6FTPC), terephthalic acid chloride (TPC), meta-phthalic acid chloride, more preferably 2-methoxyterephthalic acid Formic acid, 2-methyl terephthalic acid, terephthalic acid chloride (TPC), 2,5-dimethyl terephthalic acid chloride (DMTPC), 2,5-dimethoxy terephthalic acid Methyl chloride (MOTPC), more preferably 2-methoxyterephthalic acid, 2-methylterephthalic acid, 2,5-dimethylterephthalate chloride (DMTPC) and 2,5- Dimethoxy terephthalic acid chloride (MOTPC).

再者,上述聚醯亞胺系樹脂可為於不損害光學膜之各種物性之範圍內,除上述樹脂合成中所使用之四羧酸化合物外,亦進而使其他四羧酸及三羧酸以及該等之酸酐及衍生物反應而成者。Furthermore, the above-mentioned polyimide-based resin may be within the range of not damaging various physical properties of the optical film. In addition to the tetracarboxylic acid compound used in the synthesis of the above-mentioned resin, other tetracarboxylic acid, tricarboxylic acid, and These acid anhydrides and derivatives are formed by the reaction.

作為其他四羧酸,可例舉上述四羧酸化合物之酸酐之水加成物。Examples of other tetracarboxylic acids include water adducts of acid anhydrides of the above-mentioned tetracarboxylic acid compounds.

作為三羧酸化合物,可例舉:芳香族三羧酸、脂肪族三羧酸及該等之類似之醯氯化合物、酸酐等,可組合使用兩種以上。作為具體例,可例舉:1,2,4-苯三羧酸之酸酐;1,3,5-苯三羧酸之醯氯化合物;2,3,6-萘三羧酸-2,3-酐;鄰苯二甲酸酐與苯甲酸以單鍵、-O-、-CH2 -、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -或伸苯基連結而成之化合物。The tricarboxylic acid compound may, for example, be aromatic tricarboxylic acid, aliphatic tricarboxylic acid, and similar chlorinated compounds, acid anhydrides, etc., and two or more of them may be used in combination. As a specific example, anhydrides of 1,2,4-benzenetricarboxylic acid; chlorine compounds of 1,3,5-benzenetricarboxylic acid; 2,3,6-naphthalenetricarboxylic acid-2,3 -Anhydride; phthalic anhydride and benzoic acid with single bond, -O-, -CH 2 -, -C(CH 3 ) 2 -, -C(CF 3 ) 2 -, -SO 2 -or phenylene Compound formed by linking.

於樹脂之製造中,二胺化合物、四羧酸化合物及/或二羧酸化合物之使用量可根據所期望之樹脂之各結構單元之比率而適宜選擇。In the production of the resin, the usage amount of the diamine compound, the tetracarboxylic acid compound, and/or the dicarboxylic acid compound can be appropriately selected according to the desired ratio of each structural unit of the resin.

於樹脂之製造中,二胺化合物、四羧酸化合物及二羧酸化合物之反應溫度並無特別限定,例如為5~350℃,較佳為20~200℃,更佳為25~100℃。反應時間亦無特別限定,例如為30分鐘~10小時左右。視需要,可於惰性環境或減壓之條件下進行反應。於較佳態樣中,反應係於常壓及/或惰性氣體環境下,一邊攪拌一邊進行。又,反應較佳為於對反應為惰性之溶劑中進行。作為溶劑,只要對反應無影響,則並無特別限定,例如可例舉:水、甲醇、乙醇、乙二醇、異丙醇、丙二醇、乙二醇甲醚、乙二醇丁醚、1-甲氧基-2-丙醇、2-丁氧基乙醇、丙二醇單甲醚等醇系溶劑;乙酸乙酯、乙酸丁酯、乙二醇甲醚乙酸酯、γ-丁內酯、γ-戊內酯、丙二醇甲醚乙酸酯、乳酸乙酯等酯系溶劑;丙酮、甲基乙基酮、環戊酮、環己酮、2-庚酮、甲基異丁基酮等酮系溶劑;戊烷、己烷、庚烷等脂肪族烴溶劑;乙基環己烷等脂環式烴溶劑;甲苯、二甲苯等芳香族烴溶劑;乙腈等腈系溶劑;四氫呋喃及二甲氧基乙烷等醚系溶劑;氯仿及氯苯等含氯之溶劑;N,N-二甲基乙醯胺、N,N-二甲基甲醯胺等醯胺系溶劑;二甲基碸、二甲基亞碸、環丁碸等含硫系溶劑;碳酸乙二酯、碳酸丙二酯等碳酸酯系溶劑;及該等之組合等。該等之中,就溶解性之觀點而言,較佳可使用醯胺系溶劑。In the production of the resin, the reaction temperature of the diamine compound, the tetracarboxylic acid compound, and the dicarboxylic acid compound is not particularly limited, and is, for example, 5 to 350°C, preferably 20 to 200°C, and more preferably 25 to 100°C. The reaction time is also not particularly limited, and is, for example, about 30 minutes to 10 hours. If necessary, the reaction can be carried out in an inert environment or under reduced pressure. In a preferred aspect, the reaction is carried out while stirring under normal pressure and/or an inert gas environment. In addition, the reaction is preferably carried out in a solvent that is inert to the reaction. The solvent is not particularly limited as long as it does not affect the reaction. For example, water, methanol, ethanol, ethylene glycol, isopropanol, propylene glycol, ethylene glycol methyl ether, ethylene glycol butyl ether, 1- Alcoholic solvents such as methoxy-2-propanol, 2-butoxyethanol, and propylene glycol monomethyl ether; ethyl acetate, butyl acetate, ethylene glycol methyl ether acetate, γ-butyrolactone, γ- Ester solvents such as valerolactone, propylene glycol methyl ether acetate, ethyl lactate, etc.; ketone solvents such as acetone, methyl ethyl ketone, cyclopentanone, cyclohexanone, 2-heptanone, methyl isobutyl ketone, etc. ; Aliphatic hydrocarbon solvents such as pentane, hexane and heptane; alicyclic hydrocarbon solvents such as ethylcyclohexane; aromatic hydrocarbon solvents such as toluene and xylene; nitrile solvents such as acetonitrile; tetrahydrofuran and dimethoxyethane Ether solvents such as alkane; chlorine-containing solvents such as chloroform and chlorobenzene; amine-based solvents such as N,N-dimethylacetamide and N,N-dimethylformamide; dimethyl sulfide, dimethyl Sulfur-containing solvents such as trisulfide and cyclobutane; carbonate-based solvents such as ethylene carbonate and propylene carbonate; and combinations of these. Among these, from the viewpoint of solubility, it is preferable to use an amide-based solvent.

於聚醯亞胺系樹脂之製造中之醯亞胺化步驟中,可於醯亞胺化觸媒之存在下進行醯亞胺化。作為醯亞胺化觸媒,例如可例舉:三丙胺、二丁基丙基胺、乙基二丁基胺等脂肪族胺;N-乙基哌啶、N-丙基哌啶、N-丁基吡咯啶、N-丁基哌啶及N-丙基六氫氮呯等脂環式胺(單環式);氮雜雙環[2.2.1]庚烷、氮雜雙環[3.2.1]辛烷、氮雜雙環[2.2.2]辛烷及氮雜雙環[3.2.2]壬烷等脂環式胺(多環式);以及吡啶、2-甲基吡啶(2-picoline)、3-甲基吡啶(3-picoline)、4-甲基吡啶(4-picoline)、2-乙基吡啶、3-乙基吡啶、4-乙基吡啶、2,4-二甲基吡啶、2,4,6-三甲基吡啶、3,4-環戊烯并吡啶、5,6,7,8-四氫異喹啉及異喹啉等芳香族胺。又,就易於促進醯亞胺化反應之觀點而言,較佳為與醯亞胺化觸媒一同使用酸酐。酸酐可例舉於醯亞胺化反應中所使用之慣用之酸酐等,作為其具體例,可例舉:乙酸酐、丙酸酐、丁酸酐等脂肪族酸酐、鄰苯二甲酸等芳香族酸酐等。In the imidization step in the production of the polyimide resin, the imidization can be carried out in the presence of an imidization catalyst. As the imidization catalyst, for example, aliphatic amines such as tripropylamine, dibutylpropylamine, and ethyldibutylamine; N-ethylpiperidine, N-propylpiperidine, N- Alicyclic amines such as butylpyrrolidine, N-butylpiperidine and N-propylhexahydroazepine (monocyclic); azabicyclo[2.2.1]heptane, azabicyclo[3.2.1] Alicyclic amines (polycyclic) such as octane, azabicyclo[2.2.2]octane and azabicyclo[3.2.2]nonane; and pyridine, 2-picoline, 3 -Picoline (3-picoline), 4-picoline (4-picoline), 2-ethylpyridine, 3-ethylpyridine, 4-ethylpyridine, 2,4-lutidine, 2, Aromatic amines such as 4,6-trimethylpyridine, 3,4-cyclopentenopyridine, 5,6,7,8-tetrahydroisoquinoline and isoquinoline. Furthermore, from the viewpoint of facilitating the promotion of the imidization reaction, it is preferable to use an acid anhydride together with the imidization catalyst. The acid anhydride may be exemplified by the commonly used acid anhydrides used in the imidization reaction, and specific examples thereof may include aliphatic anhydrides such as acetic anhydride, propionic anhydride, and butyric anhydride, aromatic anhydrides such as phthalic acid, etc. .

聚醯亞胺系樹脂及聚醯胺系樹脂可藉由慣用之方法,例如過濾、濃縮、萃取、晶析、再結晶、管柱層析等分離方法或將組合該等之分離方法而分離精製從而單離,於較佳態樣中,於含有透明聚醯胺醯亞胺樹脂之反應液中添加大量之甲醇等醇,使樹脂析出,進行濃縮、過濾、乾燥等,藉此可進行單離。Polyimide resins and polyimide resins can be separated and refined by conventional methods such as filtration, concentration, extraction, crystallization, recrystallization, column chromatography and other separation methods, or a combination of these separation methods Therefore, in a preferred aspect, a large amount of methanol and other alcohols are added to the reaction liquid containing the transparent polyimide resin to precipitate the resin, and the resin can be concentrated, filtered, dried, etc., so that the separation can be performed .

<添加劑> 本發明之光學膜可進而含有添加劑。作為此種添加劑,例如可例舉:填料、紫外線吸收劑、增白劑、抗氧化劑、pH值調整劑及調平劑。<Additives> The optical film of the present invention may further contain additives. Examples of such additives include fillers, ultraviolet absorbers, brighteners, antioxidants, pH adjusters, and levelers.

(填料) 本發明之光學膜可含有至少一種填料。作為填料,例如可例舉:有機粒子、無機粒子等,較佳可例舉無機粒子。作為無機粒子,可例舉:氧化矽、氧化鋯、氧化鋁、氧化鈦、氧化鋅、氧化鍺、氧化銦、氧化錫、銦錫氧化物、氧化銻、氧化鈰等金屬氧化物粒子、氟化鎂、氟化鈉等金屬氟化物粒子等,該等之中,就提高光學膜之彈性模數及/或撕裂強度,易於提高耐衝擊性之觀點而言,較佳可例舉氧化矽粒子、氧化鋯粒子、氧化鋁粒子,更佳可例舉氧化矽粒子。該等填料可單獨使用或組合使用兩種以上。(filler) The optical film of the present invention may contain at least one filler. As the filler, for example, organic particles, inorganic particles, etc. may be mentioned, preferably, inorganic particles may be mentioned. Examples of inorganic particles include metal oxide particles such as silicon oxide, zirconium oxide, aluminum oxide, titanium oxide, zinc oxide, germanium oxide, indium oxide, tin oxide, indium tin oxide, antimony oxide, and cerium oxide, and fluoride Metal fluoride particles such as magnesium and sodium fluoride. Among them, silicon oxide particles are preferable in terms of improving the elastic modulus and/or tearing strength of the optical film and improving the impact resistance. , Zirconia particles, alumina particles, more preferably silica particles. These fillers can be used alone or in combination of two or more.

填料,較佳為氧化矽粒子之平均一次粒徑為1 nm以上,更佳為5 nm以上,進而較佳為10 nm以上,進而更佳為15 nm以上,尤佳為20 nm以上,較佳為100 nm以下,更佳為90 nm以下,進而較佳為80 nm以下,進而更佳為70 nm以下,尤佳為60 nm以下,尤其更佳為50 nm以下,尤其進而較佳為40 nm以下。若氧化矽粒子之平均一次粒徑為上述範圍內,則抑制氧化矽粒子之凝集,易於提高所得光學膜之光學特性。填料之平均一次粒徑可藉由BET(Brunauer-Emmett-Teller,布厄特)法而測定。再者,可藉由穿透式電子顯微鏡或掃描式電子顯微鏡之圖像解析而測定平均一次粒徑。The filler preferably has an average primary particle size of silicon oxide particles of 1 nm or more, more preferably 5 nm or more, still more preferably 10 nm or more, still more preferably 15 nm or more, particularly preferably 20 nm or more, more preferably 100 nm or less, more preferably 90 nm or less, still more preferably 80 nm or less, still more preferably 70 nm or less, particularly preferably 60 nm or less, especially more preferably 50 nm or less, and particularly preferably 40 nm the following. If the average primary particle size of the silica particles is within the above range, the agglomeration of the silica particles is suppressed, and the optical properties of the obtained optical film can be easily improved. The average primary particle size of the filler can be measured by the BET (Brunauer-Emmett-Teller, Buert) method. Furthermore, the average primary particle size can be measured by image analysis of a transmission electron microscope or a scanning electron microscope.

本發明之光學膜中之填料,例如無機粒子,其中氧化矽粒子之含量相對於光學膜之總質量,較佳為5質量%以下,更佳為4質量%以下,進而較佳為3質量%以下,進而更佳為2質量%以下,尤佳為1質量%以下,尤其更佳為未達1質量%,尤其進而較佳為0.5質量%以下。再者,本發明之光學膜中之填料之含量之下限為0質量%以上。若填料之含量為上述上限以下,則易於提高所獲得之光學膜之彈性模數,並且易於提高光學膜之光學特性。此處,光學膜之拉伸彈性模數存在藉由提高氧化矽粒子等填料之含量而變高之傾向,但於氧化矽粒子等填料之含量過多之情形時,有時所獲得之光學膜難以滿足上述數式(1)~數式(3)。故而,於本發明之光學膜中,於氧化矽粒子之含量為上述上限以下之情形時,就提高光學膜之拉伸彈性模數,並且獲得較高之廣角方向之視認性之觀點而言較佳。再者,於本說明書中,所謂光學膜中之例如氧化矽粒子之含量相對於光學膜之總質量為上述上限以下,係指氧化矽粒子之含量為0質量%,即不含氧化矽粒子,或即使含有亦為上述上限以下之量。For the filler in the optical film of the present invention, such as inorganic particles, the content of silica particles relative to the total mass of the optical film is preferably 5% by mass or less, more preferably 4% by mass or less, and still more preferably 3% by mass Hereinafter, it is more preferably 2% by mass or less, particularly preferably 1% by mass or less, particularly more preferably less than 1% by mass, and even more preferably 0.5% by mass or less. Furthermore, the lower limit of the filler content in the optical film of the present invention is 0% by mass or more. If the content of the filler is below the above upper limit, it is easy to increase the elastic modulus of the obtained optical film, and it is easy to improve the optical properties of the optical film. Here, the tensile elastic modulus of the optical film tends to increase by increasing the content of fillers such as silica particles. However, when the content of fillers such as silica particles is excessive, the optical film may be difficult to obtain. It satisfies the above formula (1) to (3). Therefore, in the optical film of the present invention, when the content of silica particles is below the above upper limit, it is better to increase the tensile modulus of the optical film and obtain higher visibility in the wide-angle direction. good. Furthermore, in this specification, the so-called that the content of silicon oxide particles in the optical film relative to the total mass of the optical film is below the above upper limit means that the content of silicon oxide particles is 0% by mass, that is, it does not contain silicon oxide particles. Or even if it is contained, the amount is less than the above upper limit.

(紫外線吸收劑) 發明之光學膜可進而含有紫外線吸收劑。紫外線吸收劑可自於樹脂材料之領域中通常用作紫外線吸收劑者中適宜選擇。紫外線吸收劑可含有吸收400 nm以下之波長之光的化合物。作為紫外線吸收劑,例如可例舉:三𠯤系紫外線吸收劑、二苯甲酮系紫外線吸收劑、苯并三唑系紫外線吸收劑、苯甲酸酯系紫外線吸收劑、及氰基丙烯酸酯系紫外線吸收劑、水楊酸酯系紫外線吸收劑等。該等可單獨使用或併用兩種以上。藉由使光學膜含有紫外線吸收劑,樹脂之劣化得以抑制,故而於將本發明之光學膜應用於顯示裝置等之情形時,可提高視認性。於本說明書中,所謂「系化合物」係指附帶該「系化合物」之化合物之衍生物。例如所謂「二苯甲酮系化合物」係指具有作為母體骨架之二苯甲酮與鍵結於二苯甲酮之取代基之化合物。作為較佳之市售之紫外線吸收劑,例如可例舉:Sumika Chemtex(股)製造之Sumisorb(註冊商標)340、ADEKA(股)製造之Adekastab(註冊商標)LA-31及BASF Japan(股)製造之TINUVIN(註冊商標)1577等。(Ultraviolet absorber) The optical film of the invention may further contain an ultraviolet absorber. The ultraviolet absorber can be suitably selected from those generally used as ultraviolet absorbers in the field of resin materials. The ultraviolet absorber may contain a compound that absorbs light with a wavelength below 400 nm. As the ultraviolet absorber, for example, a tri-type ultraviolet absorber, a benzophenone-type ultraviolet absorber, a benzotriazole-type ultraviolet absorber, a benzoate-type ultraviolet absorber, and a cyanoacrylate-type UV absorbers, salicylate-based UV absorbers, etc. These can be used alone or in combination of two or more. By containing the ultraviolet absorber in the optical film, the deterioration of the resin can be suppressed. Therefore, when the optical film of the present invention is applied to a display device or the like, the visibility can be improved. In this specification, the "system compound" refers to a derivative of the compound with the "system compound" attached. For example, the so-called "benzophenone-based compound" refers to a compound having benzophenone as a parent skeleton and a substituent bonded to benzophenone. As a preferred commercially available UV absorber, for example, Sumisorb (registered trademark) 340 manufactured by Sumika Chemtex (stock), Adekastab (registered trademark) LA-31 manufactured by ADEKA (stock), and BASF Japan (stock) manufactured The TINUVIN (registered trademark) 1577 and so on.

於本發明之光學膜含有紫外線吸收劑之情形時,紫外線吸收劑之含量相對於光學膜中所含之聚醯胺醯亞胺系樹脂之質量100質量份,較佳為0.01~10質量份,更佳為1~8質量份,進而較佳為2~7質量份。若紫外線吸收劑之含量為上述下限以上,則易於提高紫外線吸收性。若紫外線吸收劑之含量為上述上限以下,則可抑制因基材製造時之熱所導致之紫外線吸收劑之分解,易於提高光學特性,例如易於減低霧度。When the optical film of the present invention contains an ultraviolet absorber, the content of the ultraviolet absorber is preferably 0.01-10 parts by mass relative to 100 parts by mass of the polyamide-imide-based resin contained in the optical film, More preferably, it is 1-8 mass parts, More preferably, it is 2-7 mass parts. If the content of the ultraviolet absorber is more than the above lower limit, it is easy to improve the ultraviolet absorbability. If the content of the ultraviolet absorber is less than the above upper limit, the decomposition of the ultraviolet absorber due to heat during the production of the base material can be suppressed, and the optical properties can be easily improved, for example, the haze can be easily reduced.

本發明之光學膜之用途並無特別限定,可用於各種用途。本發明之光學膜可為單層,亦可為積層體,可直接使用本發明之光學膜,亦可作為進而與其他膜之積層體而使用。本發明之光學膜具有優異之廣角方向之視認性,故而作為圖像顯示裝置等中之光學膜而有用。再者,於光學膜為積層體之情形時,將積層於光學膜之單面或雙面之全部層包含於內稱為光學膜。The use of the optical film of the present invention is not particularly limited, and it can be used for various purposes. The optical film of the present invention may be a single layer or a laminate. The optical film of the present invention may be used as it is, or it may be used as a laminate with other films. The optical film of the present invention has excellent visibility in the wide-angle direction, so it is useful as an optical film in image display devices and the like. Furthermore, when the optical film is a laminate, all the layers laminated on one or both sides of the optical film are included in the optical film.

本發明之光學膜之用途並無特別限定,可用於各種用途。本發明之光學膜之廣角方向之視認性優異,故而作為圖像顯示裝置等中之光學膜而有用。尤其本發明之光學膜作為圖像顯示裝置之前面板,尤其可撓式顯示器之前面板(視窗膜)而有用。可撓式顯示器例如具有可撓式功能層、及重疊於可撓式功能層且作為前面板而發揮功能之上述光學膜。即,可撓式顯示器之前面板配置於可撓式功能層上之視認側。該前面板具有保護可撓式功能層之功能。The use of the optical film of the present invention is not particularly limited, and it can be used for various purposes. The optical film of the present invention has excellent visibility in the wide-angle direction, so it is useful as an optical film in image display devices and the like. In particular, the optical film of the present invention is useful as a front panel of an image display device, especially a front panel (window film) of a flexible display. The flexible display has, for example, a flexible functional layer and the above-mentioned optical film which is superimposed on the flexible functional layer and functions as a front panel. That is, the front panel of the flexible display is arranged on the visible side of the flexible functional layer. The front panel has the function of protecting the flexible functional layer.

<光學膜之製造方法> 本發明之光學膜並無特別限定,例如可藉由包含以下步驟之方法而製造: (a)製備含有上述樹脂及任意含有上述填料之液體(以下,有時記為清漆)的步驟(清漆製備步驟)、 (b)將清漆塗佈於基材而形成塗膜的步驟(塗佈步驟)、及 (c)使塗佈之液體(塗膜)乾燥,從而形成光學膜的步驟(光學膜形成步驟)。<Manufacturing method of optical film> The optical film of the present invention is not particularly limited. For example, it can be manufactured by a method including the following steps: (a) A step of preparing a liquid containing the above-mentioned resin and optionally containing the above-mentioned filler (hereinafter, sometimes referred to as a varnish) (varnish preparation step), (b) The step of applying the varnish to the substrate to form a coating film (coating step), and (c) The step of drying the applied liquid (coating film) to form an optical film (optical film forming step).

於清漆製備步驟中,將上述樹脂溶解於溶劑,視需要添加上述填料及其他添加劑並進行攪拌混合,藉此製備清漆。In the varnish preparation step, the above-mentioned resin is dissolved in a solvent, and the above-mentioned fillers and other additives are added as needed and stirred and mixed, thereby preparing a varnish.

清漆之製備中所使用之溶劑只要可溶解上述樹脂,則並無特別限定。作為該溶劑,例如可例舉:N,N-二甲基乙醯胺(以下,有時簡記為DMAc)、N,N-二甲基甲醯胺(以下,有時簡記為DMF)等醯胺系溶劑;γ-丁內酯(以下,有時簡記為GBL)、γ-戊內酯等內酯系溶劑;二甲基碸、二甲基亞碸、環丁碸等含硫系溶劑;碳酸乙二酯、碳酸丙二酯等碳酸酯系溶劑;及該等之組合。該等之中,就易於製造滿足數式(1)~數式(3)之光學膜之觀點而言,清漆中所使用之溶劑較佳為醯胺系溶劑或內酯系溶劑。該等溶劑可單獨使用或組合使用兩種以上。又,可於清漆中含有水、醇系溶劑、酮系溶劑、非環狀酯系溶劑、醚系溶劑等。清漆之固形物成分濃度較佳為1~25質量%,更佳為5~20質量%。The solvent used in the preparation of the varnish is not particularly limited as long as it can dissolve the above-mentioned resin. As the solvent, for example, N,N-dimethylacetamide (hereinafter, sometimes abbreviated as DMAc), N,N-dimethylformamide (hereinafter, sometimes abbreviated as DMF), etc. Amine-based solvents; lactone-based solvents such as γ-butyrolactone (hereinafter, sometimes abbreviated as GBL) and γ-valerolactone; sulfur-containing solvents such as dimethyl sulfide, dimethyl sulfide, and cyclobutane; Carbonate-based solvents such as ethylene carbonate and propylene carbonate; and combinations thereof. Among them, the solvent used in the varnish is preferably an amide-based solvent or a lactone-based solvent from the viewpoint of easy production of an optical film that satisfies the mathematical formulas (1) to (3). These solvents can be used alone or in combination of two or more. In addition, water, alcohol-based solvents, ketone-based solvents, acyclic ester-based solvents, ether-based solvents, etc. may be contained in the varnish. The solid content concentration of the varnish is preferably 1 to 25% by mass, more preferably 5 to 20% by mass.

於塗佈步驟中,可藉由公知之塗佈方法,於基材上塗佈清漆而形成塗膜。作為公知之塗佈方法,例如可例舉:線棒塗佈法、反向塗佈、凹版塗佈等輥塗法、模嘴塗佈法、缺角輪塗佈法、模唇塗佈法、網版塗佈法、噴注式塗佈法、流涎成形法等。In the coating step, a varnish can be coated on the substrate by a well-known coating method to form a coating film. As well-known coating methods, for example, roll coating methods such as wire bar coating, reverse coating, and gravure coating, die nozzle coating method, chipped wheel coating method, die lip coating method, Screen coating method, spray coating method, casting method, etc.

於光學膜形成步驟中,將塗膜乾燥(稱為第1乾燥),自基材剝離後,將乾燥塗膜進一步乾燥(稱為第2乾燥或後烘烤處理),藉此形成光學膜。第1乾燥視需要可於惰性環境或減壓之條件下實施。第1乾燥較佳為例如於負壓之拉幅爐內等負壓條件下,於較低之溫度下進行一段時間。若於負壓之條件下進行第一乾燥,則製作之光學膜之反射圖像清晰度值易於滿足數式(1)~數式(3),並且易於提高光學膜之全光線透過率,易於降低霧度及YI,但其理由並不明確。認為其原因在於:防止於第一乾燥之條件下自光學膜揮發去除之溶劑滯留於光學膜表面,其結果,光學膜之表面變得均勻。此外,藉由於較低之溫度下進行一段時間之第1乾燥,光學膜之表面亦易於變得均勻,製作之光學膜之反射圖像清晰度值易於滿足數式(1)~數式(3)。又,乾燥時之樹脂之氧化劣化得以抑制,故而易於提高光學膜之全光線透過率,易於降低霧度及YI。In the optical film forming step, the coating film is dried (referred to as the first drying), and after peeling from the substrate, the dried coating film is further dried (referred to as the second drying or post-baking treatment), thereby forming an optical film. The first drying can be carried out in an inert environment or under reduced pressure as needed. The first drying is preferably performed at a lower temperature for a period of time under negative pressure conditions such as in a negative pressure tenter furnace. If the first drying is performed under negative pressure, the clarity value of the reflected image of the produced optical film can easily satisfy the equations (1) to (3), and it is easy to increase the total light transmittance of the optical film. The haze and YI are reduced, but the reason is not clear. It is considered that the reason is that the solvent volatilized and removed from the optical film under the first drying condition is prevented from staying on the surface of the optical film, and as a result, the surface of the optical film becomes uniform. In addition, due to the first drying at a relatively low temperature for a period of time, the surface of the optical film is also easy to become uniform, and the clarity value of the reflected image of the produced optical film can easily satisfy the equations (1) to (3). ). In addition, the oxidative degradation of the resin during drying is suppressed, so it is easy to increase the total light transmittance of the optical film, and it is easy to reduce the haze and YI.

此處,於工業生產本發明之光學膜之情形時,與實驗室級別之製造環境相比較,實際之製造環境對提高廣角方向之視認性而言不利之情形較多,其結果,存在難以提高光學膜之廣角方向之視認性之情形。如上所述,第1乾燥較佳為於負壓條件下,於較低溫度下進行一段時間,但於實驗室級別中,進行第1乾燥時,可於密閉之乾燥器內進行乾燥,故而比較不易產生因外在因素引起之光學膜表面之粗糙。相對於此,於工業生產光學膜之情形時,例如必須於第1乾燥中加熱大面積,故而亦存在於加熱時使用送風裝置之情形。其結果,光學膜之表面狀態易於變得粗糙,難以提高光學膜之廣角方向之視認性。Here, in the case of industrial production of the optical film of the present invention, compared with the manufacturing environment of the laboratory level, the actual manufacturing environment is often unfavorable for improving the visibility in the wide-angle direction. As a result, it is difficult to improve the visibility. The visibility of the wide-angle direction of the optical film. As mentioned above, the first drying is preferably performed under negative pressure and at a lower temperature for a period of time. However, in the laboratory level, when the first drying is performed, it can be dried in a closed dryer, so it is more It is not easy to produce roughness of the optical film surface caused by external factors. On the other hand, in the case of industrial production of optical films, for example, a large area must be heated in the first drying, so there is also a case where a blower is used during heating. As a result, the surface condition of the optical film tends to become rough, and it is difficult to improve the visibility of the optical film in the wide-angle direction.

於藉由加熱進行乾燥之情形時,尤其於工業生產光學膜時若考慮如上述之外在因素,則第1乾燥之溫度較佳為60~150℃,更佳為60~130℃,進而較佳為70~120℃。第1乾燥之時間較佳為5~60分鐘,更佳為10~40分鐘。尤其於工業生產光學膜時若考慮如上述之外在因素,則第1乾燥較佳為例如於2階段以上,較佳為3階段以上之乾燥溫度條件下實施。作為多階段之條件,於各個階段中,可以相同或不同之溫度條件及/或乾燥時間實施,例如可以3~10階段,較佳為3~8階段進行乾燥。若於3階段以上之多階段條件下實施第1乾燥,則製作之光學膜之反射圖像清晰度值易於滿足數式(1)~數式(3),廣角方向之視認性提高。於3階段以上之多階段條件下之態樣中,較佳為第1乾燥之溫度分佈包含升溫及降溫。即,光學膜形成步驟中之第1乾燥條件較佳為溫度分佈包含升溫及降溫之3階段以上之加熱溫度條件。作為此種溫度分佈,若以4階段之情形為例,則第1乾燥之溫度依序為70~90℃(第1溫度),90~120℃(第2溫度),80~120℃(第3溫度)及80~100℃(第4溫度)。於該例中,第1乾燥之溫度自第1溫度升溫至第2溫度,繼而自第2溫度降溫至第3溫度,進而自第3溫度降溫至第4溫度。此處,第1乾燥之時間於各階段中例如為5~15分鐘。較佳為以乾燥塗膜之溶劑殘存量相對於乾燥塗膜之質量成為較佳為5~15質量%,更佳為6~12質量%之方式實施第1乾燥。若溶劑殘存量為上述範圍,則乾燥塗膜之自基材之剝離性變得良好,製作之光學膜之反射圖像清晰度值易於滿足數式(1)~數式(3)。In the case of drying by heating, especially in the industrial production of optical films, if the above-mentioned external factors are considered, the temperature of the first drying is preferably 60-150°C, more preferably 60-130°C, and more Preferably, it is 70 to 120°C. The first drying time is preferably 5 to 60 minutes, more preferably 10 to 40 minutes. In particular, if external factors such as the above are considered during the industrial production of optical films, the first drying is preferably carried out under a drying temperature condition of, for example, two or more stages, and preferably three or more stages. As a multi-stage condition, in each stage, the same or different temperature conditions and/or drying time can be implemented. For example, the drying can be carried out in 3-10 stages, preferably 3-8 stages. If the first drying is performed under a multi-stage condition of three or more stages, the clarity value of the reflected image of the produced optical film can easily satisfy the equations (1) to (3), and the visibility in the wide-angle direction is improved. In the case of a multi-stage condition of more than 3 stages, it is preferable that the temperature distribution of the first drying includes heating and cooling. That is, the first drying condition in the optical film forming step is preferably a heating temperature condition in which the temperature distribution includes three stages or more of temperature increase and temperature decrease. As such a temperature distribution, if a four-stage case is taken as an example, the temperature of the first drying is 70 to 90°C (first temperature), 90 to 120°C (second temperature), and 80 to 120°C (second temperature). 3 temperature) and 80 to 100°C (the fourth temperature). In this example, the temperature of the first drying is increased from the first temperature to the second temperature, then the temperature is decreased from the second temperature to the third temperature, and then the temperature is decreased from the third temperature to the fourth temperature. Here, the time for the first drying is, for example, 5 to 15 minutes in each stage. It is preferable to perform the first drying so that the residual amount of the solvent of the dried coating film is preferably 5 to 15% by mass, and more preferably 6 to 12% by mass relative to the mass of the dried coating film. If the residual amount of solvent is in the above range, the peelability of the dried coating film from the substrate becomes good, and the clarity value of the reflected image of the produced optical film easily satisfies the equations (1) to (3).

第2乾燥之溫度較佳為150~300℃,更佳為180~250℃,進而較佳為180~230℃。第2乾燥之時間較佳為10~60分鐘,更佳為30~50分鐘。The temperature of the second drying is preferably 150 to 300°C, more preferably 180 to 250°C, and still more preferably 180 to 230°C. The second drying time is preferably 10 to 60 minutes, more preferably 30 to 50 minutes.

第2乾燥可以單片式進行,但於工業生產之情形時,就製造效率之觀點而言,較佳為以卷對卷方式進行。於單片式中,較佳為以於面內方向均勻伸長之狀態進行乾燥。 於卷對卷方式中,就所獲得之光學膜易於滿足數式(1)~數式(3)之範圍之觀點而言,較佳為以使乾燥塗膜於搬送方向伸長之狀態進行乾燥,搬送速度較佳為0.1~5 m/分鐘,更佳為0.2~3 m/分鐘,進而較佳為0.7~2.5 m/分鐘。第2乾燥可於1階段或多階段之條件下實施。多階段之條件較佳為於各個階段中,以選自相同或不同之溫度條件、乾燥時間及熱風之風速之至少一種實施,例如可以3~10階段,較佳為3~8階段進行乾燥,就光學膜易於滿足數式(1)~數式(3)之範圍之觀點而言,較佳為於多階段之條件下實施。又,於各階段中,作為熱風之風速,就製作之光學膜之反射圖像清晰度值易於滿足數式(1)~數式(3)之觀點而言,較佳為5~20 m/分鐘,更佳為10~15 m/分鐘,進而較佳為11~14 m/分鐘。The second drying can be performed in a single piece, but in the case of industrial production, from the viewpoint of manufacturing efficiency, it is preferably performed in a roll-to-roll method. In the one-piece type, it is preferable to dry in a state uniformly elongated in the in-plane direction. In the roll-to-roll method, from the viewpoint that the obtained optical film easily satisfies the range of formula (1) to formula (3), it is preferable to dry the dried coating film in a state in which it is stretched in the conveying direction. The conveying speed is preferably 0.1 to 5 m/min, more preferably 0.2 to 3 m/min, and still more preferably 0.7 to 2.5 m/min. The second drying can be carried out under one-stage or multi-stage conditions. The multi-stage conditions are preferably implemented in each stage with at least one selected from the same or different temperature conditions, drying time and hot air speed. For example, the drying can be carried out in 3-10 stages, preferably 3-8 stages. From the viewpoint that the optical film easily satisfies the range of the mathematical formula (1) to the mathematical formula (3), it is preferably implemented under a multi-stage condition. In addition, in each stage, as the wind speed of the hot air, from the viewpoint that the clarity value of the reflected image of the produced optical film easily satisfies the equations (1) to (3), it is preferably 5-20 m/ Minute, more preferably 10-15 m/min, still more preferably 11-14 m/min.

於本發明之光學膜具備硬塗層之情形時,硬塗層例如可以如下方式形成:於光學膜之至少一面塗佈硬化性組合物而形成塗膜,對該塗膜照射高能量線,從而使塗膜硬化。When the optical film of the present invention is provided with a hard coat layer, the hard coat layer can be formed, for example, by applying a curable composition to at least one side of the optical film to form a coating film, and irradiating the coating film with high energy rays, thereby Harden the coating film.

作為基材之例,若為金屬系,則可例舉:SUS(Steel Use Stainless,不鏽鋼)板,若為樹脂系,則可例舉:PET(polyethylene terephthalate,聚對苯二甲酸乙二酯)膜、PEN(polyethylene naphthalate,聚萘二甲酸乙二酯)膜、其他聚醯亞胺系樹脂或聚醯胺系樹脂膜、環烯烴系聚合物(COP)膜、丙烯酸系膜等或具有硬塗層之該等樹脂膜、玻璃基板等。其中,就平滑性、耐熱性優異之觀點及光學膜之反射圖像清晰度值易於滿足數式(1)~數式(3)之觀點而言,較佳為PET膜、COP膜、具有硬塗層之樹脂膜、SUS板、玻璃板等,進而就與光學膜之密接性及成本之觀點而言,更佳為SUS板、具有硬塗層之樹脂膜,進而較佳為SUS板、具有硬塗層之PET膜。As an example of a base material, if it is a metal system, it can be exemplified: SUS (Steel Use Stainless, stainless steel) plate, if it is a resin system, it can be, for example: PET (polyethylene terephthalate, polyethylene terephthalate) Film, PEN (polyethylene naphthalate, polyethylene naphthalate) film, other polyimide resin or polyamide resin film, cycloolefin polymer (COP) film, acrylic film, etc., or have a hard coating Layers of such resin films, glass substrates, etc. Among them, from the viewpoint of excellent smoothness and heat resistance, and the viewpoint that the optical film's reflected image clarity value easily satisfies the equations (1) to (3), PET films, COP films, and hard films are preferred. Coated resin film, SUS plate, glass plate, etc., from the viewpoint of adhesion to the optical film and cost, more preferably SUS plate, resin film with hard coat, more preferably SUS plate, Hard-coated PET film.

就易於製造滿足上述數式(1)~數式(3)之光學膜之觀點而言,較佳為藉由包含以下步驟之製造方法進行上述光學膜形成步驟中之塗膜之乾燥:將塗膜乾燥至特定之溶劑量後,剝離基材,獲得原料膜的步驟;及將該原料膜於內部劃分為複數個空間之拉幅爐內加熱的加熱步驟。進而,較佳為於拉幅爐中,於至少一個空間內藉由熱風處理方式進行加熱步驟,且於至少一個空間內藉由輻射線處理方式進行加熱步驟。再者,所謂拉幅爐係指將膜寬度方向之兩端固定進行加熱之爐。再者,包含拉幅爐之用以加熱原料膜之加熱裝置於本說明書中亦稱為烘箱。又,拉幅爐內部之壓力較佳為以拉幅爐內相對於拉幅爐外之壓力成為負壓之方式進行調整。From the viewpoint of ease of manufacturing an optical film satisfying the above-mentioned formulas (1) to (3), it is preferable to dry the coating film in the above-mentioned optical film forming step by a manufacturing method including the following steps: After the film is dried to a specific solvent amount, the step of peeling off the base material to obtain a raw film; and a heating step of heating the raw film in a tenter furnace in which the inside is divided into a plurality of spaces. Furthermore, it is preferable that in a tenter furnace, the heating step is performed by hot air treatment in at least one space, and the heating step is performed by radiation treatment in at least one space. Furthermore, the so-called tenter furnace refers to a furnace in which both ends in the width direction of the film are fixed and heated. Furthermore, the heating device for heating the raw film including the tenter oven is also referred to as an oven in this specification. In addition, the pressure inside the tenter furnace is preferably adjusted so that the pressure inside the tenter furnace becomes negative pressure relative to the pressure outside the tenter furnace.

一邊參考圖一邊說明本實施方式之光學膜之製造方法。圖3係模式地表示本發明之一實施方式之光學膜之製造方法之較佳實施方式之步驟截面圖。圖3中,至少含有聚醯亞胺系樹脂及/或聚醯胺系樹脂之原料膜44被搬入拉幅爐100,於拉幅爐100內之加熱區域加熱,其後自拉幅爐100搬出。於本說明書中,若為經過加熱步驟前,則雖然溶劑量等存在經時變化,但只要處於加熱步驟中或於烘箱中被搬送,此膜即被稱為原料膜,將經過加熱步驟而自烘箱搬出之膜稱為光學膜。The method of manufacturing the optical film of this embodiment will be described with reference to the drawings. FIG. 3 is a schematic cross-sectional view showing the steps of a preferred embodiment of a method of manufacturing an optical film according to an embodiment of the present invention. In FIG. 3, the raw film 44 containing at least polyimide resin and/or polyimide resin is carried into the tenter furnace 100, heated in the heating zone in the tenter furnace 100, and then removed from the tenter furnace 100 . In this specification, if it is before the heating step, the amount of solvent will change over time, but as long as it is in the heating step or transported in the oven, the film is called the raw film, and will pass through the heating step. The film removed from the oven is called an optical film.

原料膜44可自捲取有原料膜之捲筒捲出,搬入拉幅爐100,亦可自其最近之步驟連續搬入拉幅爐。圖4係模式地表示本發明之光學膜之製造方法中之加熱步驟之較佳之實施方式之步驟截面圖。如圖4所示,原料膜44較佳為以與膜之搬送方向(MD方向,亦稱為長度方向)垂直之方向(TD方向,亦稱為寬度方向)之膜之兩端被固定之狀態於拉幅爐內搬送。固定例如可藉由固持裝置43而進行。The raw film 44 can be rolled out from the reel on which the raw film is wound, and carried into the tenter furnace 100, or can be continuously carried into the tenter furnace from the latest step. 4 is a schematic cross-sectional view showing a preferred embodiment of the heating step in the method of manufacturing the optical film of the present invention. As shown in FIG. 4, the raw film 44 is preferably in a state where both ends of the film in the direction (TD direction, also called the width direction) perpendicular to the transport direction of the film (MD direction, also called the length direction) are fixed. Transported in the stenter furnace. The fixing can be performed by the holding device 43, for example.

兩端之固定可使用針板、夾具及膜夾頭等通常於膜之製造裝置中所使用之固持裝置進行。固定之兩端可藉由所使用之固持裝置而適宜調整,較佳為以離膜端部50 cm以內之距離固定。如圖4所示,原料膜可一邊以複數個固持裝置43固定其兩端一邊搬送。關於設置於膜之一端之複數個固持裝置43,較佳為其鄰接之固持裝置間之距離為可抑制由於膜之晃動或加熱所導致之尺寸變化引起之破裂等缺陷之距離。鄰接之固持裝置間之距離較佳為1~50 mm,更佳為3~25 mm,進而較佳為5~10 mm。又,固持裝置較佳為以如下方式設置:於與膜搬送軸正交之直線對齊膜之一端之任意之固持裝置之固持部中央時,該直線與膜之另一端之交點同距離該交點最近之固持裝置之固持部中央之距離較佳為3 mm以下,更佳為2 mm以下,進而較佳為1 mm以下。藉此,可減小對抗之膜兩端部各自所受應力之差,故而可提高所獲得之光學膜之均質性。又,藉由於此種條件下使用固持裝置一邊固定膜一邊進行乾燥,膜之乾燥時之晃動得以抑制,易於製造滿足上述數式(1)~數式(3)之本發明之光學膜。The fixing of the two ends can be carried out by holding devices such as needle plates, clamps, and film chucks that are usually used in film manufacturing equipment. Both ends of the fixation can be adjusted appropriately by the holding device used, preferably at a distance of less than 50 cm from the end of the membrane. As shown in FIG. 4, the raw material film can be conveyed while fixing its both ends with a plurality of holding devices 43. Regarding the plurality of holding devices 43 arranged at one end of the film, it is preferable that the distance between adjacent holding devices be a distance that can suppress defects such as cracks due to sway of the film or dimensional changes caused by heating. The distance between adjacent holding devices is preferably 1-50 mm, more preferably 3-25 mm, and still more preferably 5-10 mm. In addition, the holding device is preferably arranged in the following manner: when the straight line orthogonal to the film conveying axis is aligned with the center of the holding portion of any holding device at one end of the film, the intersection of the straight line and the other end of the film is the same distance from the intersection point closest The distance between the center of the holding part of the holding device is preferably 3 mm or less, more preferably 2 mm or less, and still more preferably 1 mm or less. Thereby, the difference between the stresses on the opposite ends of the film can be reduced, so the homogeneity of the obtained optical film can be improved. In addition, since the film is dried while fixing the film using the holding device under such conditions, the shaking of the film during drying is suppressed, and the optical film of the present invention satisfying the above-mentioned formulas (1) to (3) can be easily manufactured.

作為以固持裝置固定膜之兩端之操作之例,可列舉如下方法:於搬入拉幅爐前或搬入拉幅爐後適時以於膜之寬度方向對向設置之複數個膜夾頭固定膜之寬度方向之兩端。藉由該等操作,膜之晃動等得以抑制,可獲得厚度不均或損傷等缺陷得以充分抑制之光學膜。又,易於製造滿足上述數式(1)~數式(3)之本發明之光學膜。膜兩端之固定於進行加熱步驟後適時解除即可,可於拉幅爐內進行,亦可於自拉幅爐搬出後進行。As an example of the operation of fixing the two ends of the film with the holding device, the following method can be cited: before or after being moved into the tenter furnace, the film is fixed by a plurality of film chucks arranged in opposite directions in the width direction of the film. Both ends in the width direction. By these operations, the shaking of the film can be suppressed, and an optical film can be obtained with defects such as thickness unevenness or damage sufficiently suppressed. In addition, it is easy to manufacture the optical film of the present invention that satisfies the above-mentioned formulas (1) to (3). The fixing of both ends of the film can be released in time after the heating step. It can be carried out in the tenter furnace or after being removed from the tenter furnace.

加熱步驟中所使用之拉幅爐之膜搬送方向之全長通常為10~100 m,較佳為15~80 m,更佳為15~60 m。關於拉幅爐,其內部可為1個空間,亦可劃分為複數個空間,於本發明之實施方式中,採用進行加熱步驟之拉幅爐內部劃分為複數個空間者。上述空間可為能夠控制溫度條件或風速條件等之空間,可不具有間隔板等物理性邊界。於拉幅爐之內部劃分為複數個空間之情形時,可與膜之搬送方向垂直或平行地劃分為複數個空間。空間數通常為2~20個,較佳為3~18個,更佳為4~15個,進而較佳為5~10個。與拉幅爐之內部構造無關,可以是拉幅爐整體成為加熱區域,亦可以是內部之一部分成為加熱區域。參考圖3,可以是區域40、41及42之3個全部成為加熱區域,亦可以是該等中之1個,例如區域42成為加熱區域。The total length of the film conveying direction of the tenter furnace used in the heating step is usually 10-100 m, preferably 15-80 m, more preferably 15-60 m. Regarding the tenter furnace, the inside may be one space or divided into a plurality of spaces. In the embodiment of the present invention, the inside of the tenter furnace that performs the heating step is divided into a plurality of spaces. The above-mentioned space may be a space capable of controlling temperature conditions, wind speed conditions, etc., and may not have physical boundaries such as partition plates. When the inside of the tenter furnace is divided into a plurality of spaces, it can be divided into a plurality of spaces perpendicular or parallel to the transport direction of the film. The number of spaces is usually 2-20, preferably 3-18, more preferably 4-15, and still more preferably 5-10. Regardless of the internal structure of the tenter furnace, the entire tenter furnace can be a heating area, or a part of the interior can be a heating area. Referring to FIG. 3, all three of the areas 40, 41, and 42 may be heating areas, or one of them, for example, the area 42 may be a heating area.

拉幅爐亦可使用複數個。該情形時之拉幅爐之個數並無特別限定,例如可為2~12個。各拉幅爐之內部可為上述構造。複數個拉幅爐可以膜不與外部大氣接觸而搬送之方式連續設置。於使用複數個拉幅爐之情形時,可以是全部拉幅爐成為加熱區域,亦可以是一部分拉幅爐成為加熱區域。又,除拉幅爐外,亦可併用烘箱作為其他機器。於本說明書中,所謂烘箱係指可加熱膜之機器,包含加熱爐及乾燥爐。加熱爐可為熱風處理或輻射線處理之任一者,亦可為併用該等之加熱爐。於併用烘箱之情形時,烘箱之內部構造、使用數及進行加熱之條件於可獲得本發明之光學膜之範圍內適宜調整即可,較佳為與本說明書中記載之拉幅爐相同。Multiple stenter furnaces can also be used. The number of tenter furnaces in this case is not particularly limited, and may be, for example, 2-12. The inside of each tenter furnace may have the above-mentioned structure. A plurality of tenter furnaces can be continuously installed in such a way that the film is transported without contact with the outside atmosphere. In the case of using a plurality of tenter furnaces, all the tenter furnaces may be the heating area, or a part of the tenter furnaces may be the heating area. In addition to the tenter furnace, an oven can also be used as other equipment. In this specification, the so-called oven refers to a machine that can heat the film, including a heating furnace and a drying furnace. The heating furnace may be any one of hot air treatment or radiation treatment, or a heating furnace that uses these in combination. When an oven is used in combination, the internal structure of the oven, the number of uses, and the heating conditions may be appropriately adjusted within the range in which the optical film of the present invention can be obtained, and it is preferably the same as the tenter oven described in this specification.

關於拉幅爐內部之空氣之循環與排氣,於拉幅爐之內部劃分為複數個空間之情形時,較佳為於各空間進行,於存在複數個拉幅爐之情形時,較佳為於各拉幅爐進行。就易於製造滿足上述數式(1)~數式(3)之本發明之光學膜之觀點而言,拉幅爐內部之壓力較佳為以拉幅爐內相對於拉幅爐外之壓力成為負壓之方式進行調整。拉幅爐內部之溫度較佳為可對每個拉幅爐進行調整,於拉幅爐之內部劃分為複數個空間之情形時,較佳為可於各空間內獨立地調整溫度。各個空間之溫度設定可相同亦可不同。其中,各個拉幅爐或空間之溫度較佳為滿足下述溫度範圍。Regarding the circulation and exhaust of the air inside the tenter furnace, when the inside of the tenter furnace is divided into a plurality of spaces, it is preferably performed in each space, and when there are multiple tenter furnaces, it is preferably Performed in each stenter furnace. From the viewpoint of ease of manufacturing the optical film of the present invention that satisfies the above formulas (1) to (3), the pressure inside the tenter furnace is preferably the pressure inside the tenter furnace relative to the pressure outside the tenter furnace Adjust the way of negative pressure. The temperature inside the tenter furnace is preferably adjustable for each tenter furnace, and when the inside of the tenter furnace is divided into a plurality of spaces, it is preferable to independently adjust the temperature in each space. The temperature setting of each space can be the same or different. Among them, the temperature of each tenter furnace or space preferably satisfies the following temperature range.

進行加熱步驟之拉幅爐100於至少1個空間內以熱風處理方式進行加熱步驟,且於至少1個空間內以輻射線處理方式進行加熱步驟。加熱步驟較佳為進行該步驟之全部空間係以熱風處理方式進行。輻射線處理方式之加熱步驟可於與熱風處理方式分開之其他空間內進行,但較佳為與熱風處理方式併用而進行加熱步驟。The tenter furnace 100 performing the heating step performs the heating step by hot air treatment in at least one space, and performs the heating step by radiation treatment in at least one space. The heating step is preferably performed by hot air treatment in all the space where the step is performed. The heating step of the radiation treatment method can be performed in another space separate from the hot air treatment method, but it is preferable to perform the heating step in combination with the hot air treatment method.

熱風處理方式之加熱步驟可藉由將吹出熱風之噴嘴設置於拉幅爐內而進行。輻射線處理方式之加熱步驟可藉由將IR加熱器等設置於拉幅爐內,使膜受到輻射而進行。The heating step of the hot air treatment method can be performed by installing a nozzle for blowing hot air in the tenter furnace. The heating step of the radiation treatment method can be performed by installing an IR heater or the like in a tenter furnace to expose the film to radiation.

作為本發明之實施方式之一例,關於使用有噴嘴之熱風處理方式、及使用有IR加熱器之輻射線處理方式,以下自使用有噴嘴之熱風處理方式依序說明。As an example of the embodiment of the present invention, regarding the hot air treatment method using nozzles and the radiation treatment method using IR heaters, the following describes the hot air treatment method using nozzles in order.

參考圖3,進行加熱步驟之拉幅爐100於其內部之上表面100a設置有複數個上側噴嘴46,於其內部之下表面100b設置有複數個下側噴嘴47。上側噴嘴46與下側噴嘴47以上下方向對向之方式設置。噴嘴例如可如圖3之區域42般設置4對噴嘴(共8個),亦可如圖3之區域41般設置10對噴嘴(共20個),可根據烘箱之構造而適宜設置。作為鄰接之噴嘴之間隔,就將拉幅爐之構造簡單化並均勻加熱原料膜之觀點、及易於製造滿足數式(1)~數式(3)之光學膜之觀點而言,較佳為0.1~1 m,更佳為0.1~0.5 m,進而較佳為0.1~0.3 m。3, the tenter furnace 100 performing the heating step is provided with a plurality of upper nozzles 46 on its inner upper surface 100a, and a plurality of lower nozzles 47 on its inner lower surface 100b. The upper nozzle 46 and the lower nozzle 47 are provided so as to face each other in the up-down direction. For example, the nozzles can be provided with 4 pairs of nozzles (total of 8) as in the area 42 of FIG. 3, or 10 pairs of nozzles (total of 20) as in the area of FIG. 3, and can be set appropriately according to the structure of the oven. As the interval between adjacent nozzles, from the viewpoint of simplifying the structure of the tenter furnace and heating the raw film uniformly, and the viewpoint of easy manufacturing of optical films satisfying the equations (1) to (3), it is preferably 0.1 to 1 m, more preferably 0.1 to 0.5 m, still more preferably 0.1 to 0.3 m.

於拉幅爐之內部劃分為複數個區間之情形時,設置於各空間之熱風吹出用之噴嘴之個數通常可為5~30個。就易於製造滿足上述式之本發明之光學膜之觀點而言,噴嘴之個數較佳為8~20個。若噴嘴個數為上述範圍,則存在浮動之膜之曲率不易變得過大之傾向,又存在膜於噴嘴間易於起浮,即易於浮動之傾向。When the inside of the tenter furnace is divided into a plurality of sections, the number of nozzles for blowing hot air installed in each space can usually be 5-30. From the viewpoint of easy production of the optical film of the present invention that satisfies the above formula, the number of nozzles is preferably 8-20. If the number of nozzles is in the above range, there is a tendency that the curvature of the floating film does not become too large, and there is a tendency for the film to float between the nozzles, that is, easy to float.

設置於拉幅爐100之上表面100a之上側噴嘴46於下部具有吹出口,可向下方向(箭頭B方向)吹出熱風。另一方面,分別設置於拉幅爐100之下表面之下側噴嘴47於上部具有吹出口,可向上方向(箭頭C方向)吹出熱風。再者,上側噴嘴46及下側噴嘴47以可將原料膜於寬度方向均勻加熱之方式,於與圖3之紙面垂直之方向具有特定尺寸之深度,但圖3中未示出。此處,亦考慮將噴嘴之朝向設定為相對於膜面為橫向,但於該情形時,難以製造25℃下之拉伸彈性模數為上述下限值以上且滿足數式(1)~數式(3)之光學膜,其理由並不明確。The nozzle 46 provided on the upper side of the upper surface 100a of the tenter furnace 100 has a blowing port at the lower part, and can blow hot air in the downward direction (arrow B direction). On the other hand, the nozzles 47 respectively provided on the lower surface of the lower surface of the tenter furnace 100 have blowing outlets on the upper part, and can blow hot air in the upward direction (the arrow C direction). Furthermore, the upper nozzle 46 and the lower nozzle 47 have a depth of a specific size in a direction perpendicular to the paper surface of FIG. 3 in a manner that can uniformly heat the raw film in the width direction, but they are not shown in FIG. 3. Here, it is also considered that the orientation of the nozzle is set in the transverse direction with respect to the film surface. However, in this case, it is difficult to produce a tensile modulus of elasticity at 25° C. above the above lower limit and satisfying equations (1) to The reason for the optical film of formula (3) is not clear.

於本實施方式之光學膜之製造方法中,自設置於加熱區域之全部上側噴嘴46及全部下側噴嘴47之吹出口之熱風之吹出風速較佳為2~25 m/秒。關於吹出風速,就易於製造滿足上述式之本發明之光學膜,又,易於提高光學膜之光學均勻性之觀點而言,更佳為2~23 m/秒,進而較佳為8~20 m/秒。又,針對於沿原料膜之寬度方向之噴嘴之長度每1 m,自每一個噴嘴46或47之吹出口之吹出風量就相同之觀點而言,較佳為0.1~3 m3 /秒,更佳為0.1~2.5 m3 /秒,進而較佳為0.2~2 m3 /秒。In the manufacturing method of the optical film of this embodiment, the blowing speed of hot air from the blowing outlets of all the upper nozzles 46 and all the lower nozzles 47 provided in the heating area is preferably 2-25 m/sec. Regarding the blowing wind speed, in terms of the ease of manufacturing the optical film of the present invention that satisfies the above formula, and the ease of improving the optical uniformity of the optical film, it is more preferably 2 to 23 m/sec, and more preferably 8 to 20 m /second. In addition, for every 1 m of the length of the nozzles along the width direction of the raw material film, the air volume blown from each nozzle 46 or 47 is preferably 0.1-3 m 3 /sec from the same point of view, and more It is preferably 0.1 to 2.5 m 3 /sec, and more preferably 0.2 to 2 m 3 /sec.

若於上述條件下進行加熱步驟,則易於製造滿足上述數式之本發明之光學膜,並且得以均勻加熱,故而膜中殘留之溶劑量之不均變小,易於獲得膜整面具有更均勻之彈性模數之光學膜。因此,膜整面不易產生彎曲性之不均,可抑制由於膜面之彎曲性之不同引起之破損之產生。If the heating step is carried out under the above conditions, it is easy to manufacture the optical film of the present invention that satisfies the above formula and is uniformly heated. Therefore, the unevenness of the amount of solvent remaining in the film becomes smaller, and it is easy to obtain a more uniform film over the entire surface. Optical film with elastic modulus. Therefore, the unevenness of the film surface is not easy to produce, and the occurrence of breakage caused by the difference of the film surface can be suppressed.

於拉幅爐內,原料膜44自室溫被加熱至原料膜中所含之溶劑蒸發之溫度,但以原料膜之寬度方向之長度幾乎不變之方式被固持裝置43保持,故而存在易於因熱膨脹而下垂之傾向。若吹出風速及吹出風量為上述範圍,則可將原料膜44充分加熱,且可抑制原料膜44之下垂或晃動。In the tenter furnace, the raw film 44 is heated from room temperature to the temperature at which the solvent contained in the raw film evaporates, but it is held by the holding device 43 in such a way that the length of the raw film in the width direction is almost constant, so it is prone to thermal expansion And the tendency to droop. If the blowing air speed and the blowing air volume are within the above-mentioned ranges, the raw material film 44 can be sufficiently heated, and the raw material film 44 can be suppressed from sagging or shaking.

熱風之吹出風速可於噴嘴46、47之熱風吹出口處,使用市售之熱式風速計而測定。又,自吹出口之吹出風量可藉由吹出風速與吹出口之面積之乘積而求得。再者,熱風之吹出風速就測定精度之觀點而言,較佳為於各噴嘴之吹出口進行10個點左右之測定,取其平均值。The blowing speed of the hot air can be measured at the hot air outlet of the nozzles 46 and 47 using a commercially available thermal anemometer. In addition, the amount of air blown from the blow-out port can be obtained by the product of the blow-out wind speed and the area of the blow-out port. In addition, from the viewpoint of measurement accuracy, the blowing speed of hot air is preferably measured at about 10 points at the blowing port of each nozzle, and the average value thereof is taken.

熱風之吹出風速及吹出風量可根據所製造之光學膜之物性(光學特性、機械物性等)而適宜調整,較佳為於任一形態中均為上述範圍內。藉此,易於製造滿足上述數式(1)~數式(3)之本發明之光學膜,易於提高該光學膜之廣角方向之視認性。加熱區域更佳為於全部加熱區域中,吹出風速為25 m/秒以下且吹出風量為2 m3 /秒以下。The blowing speed and the blowing air volume of the hot air can be appropriately adjusted according to the physical properties (optical properties, mechanical properties, etc.) of the optical film to be manufactured, and it is preferably within the above-mentioned range in any form. Thereby, it is easy to manufacture the optical film of the present invention satisfying the above-mentioned formulas (1) to (3), and it is easy to improve the visibility of the optical film in the wide-angle direction. The heating area is more preferably in all heating areas, the blowing wind speed is 25 m/sec or less, and the blowing air volume is 2 m 3 /sec or less.

於本實施方式中,於未於拉幅爐100內導入原料膜44之狀態下,應保持原料膜44之位置之熱風之風速較佳為5 m/秒以下,更佳為至少加熱區域為此種風速。藉由使用此種熱風加熱原料膜44,易於製造滿足上述數式(1)~數式(3)之本發明之光學膜,易於提高該光學膜之廣角方向之視認性。In this embodiment, when the raw film 44 is not introduced into the tenter furnace 100, the wind speed of the hot air that should maintain the position of the raw film 44 is preferably 5 m/sec or less, and more preferably at least the heating area is this Kind of wind speed. By using such hot air to heat the raw material film 44, it is easy to manufacture the optical film of the present invention that satisfies the above-mentioned formulas (1) to (3), and it is easy to improve the visibility of the optical film in the wide-angle direction.

於加熱區域中,各個噴嘴46、47之吹出口之熱風之吹出風速之寬度方向(與圖3之紙面垂直之方向)之最大值與最小值之差較佳為4 m/秒以下。藉由使用如此般於寬度方向之風速不均較少之熱風,易於製造滿足上述數式(1)~數式(3)之本發明之光學膜,易於提高該光學膜之廣角方向之視認性。In the heating zone, the difference between the maximum value and the minimum value of the width direction (the direction perpendicular to the paper surface of FIG. 3) of the hot air blowing outlet of each nozzle 46 and 47 is preferably 4 m/sec or less. By using such hot air with less uneven wind speed in the width direction, it is easy to manufacture the optical film of the present invention that satisfies the above equations (1) to (3), and it is easy to improve the visibility of the optical film in the wide-angle direction .

於本實施方式中,關於吹送至膜之熱風之風速,較佳為剛搬入烘箱後之風速大於烘箱內之其他搬送路徑之風速。所謂剛搬入烘箱後(以下稱為「搬送路徑1」),於烘箱之內部未分隔成複數個之情形時,係指自烘箱搬入口起至未達烘箱長度(自烘箱之搬入口至搬出口之長度)之1/10之距離。關於搬送路徑1,於烘箱之內部劃分為複數個空間之情形時,係指膜最初通過之空間。於使用複數個烘箱之情形時,根據最初使用之烘箱之內部構造,可與上述記載相同,亦可設定為最初通過之烘箱大於第2個以後之烘箱內之風速。In this embodiment, regarding the wind speed of the hot air blown to the film, it is preferable that the wind speed immediately after being transferred into the oven is greater than the wind speed of other conveying paths in the oven. The so-called just after being moved into the oven (hereinafter referred to as "transport path 1"), when the inside of the oven is not divided into multiple pieces, it means from the oven entrance to the oven length (from the entrance of the oven to the exit of the oven) The length) is 1/10 of the distance. Regarding the conveying path 1, when the inside of the oven is divided into a plurality of spaces, it refers to the space through which the film first passes. When using multiple ovens, according to the internal structure of the oven initially used, it can be the same as the above description, or it can be set to be greater than the wind speed in the second and subsequent ovens.

所謂其他搬送路徑,於烘箱之內部未分隔成複數個之情形時,係指自烘箱搬入口之烘箱長度之1/10以後之搬送路徑部。於烘箱之內部劃分為複數個空間之情形時,係指膜通過之第2個以後之任意空間。於使用複數個烘箱之情形時,根據最初使用之烘箱之內部構造,可與上述記載相同,亦可設定為第2個以後之烘箱中任意之烘箱內之風速小於最初通過之烘箱之風速。The so-called other conveying path refers to the conveying path part after 1/10 of the length of the oven from the oven inlet when the inside of the oven is not divided into multiple ones. When the inside of the oven is divided into a plurality of spaces, it refers to any space after the second through which the film passes. When using multiple ovens, according to the internal structure of the oven initially used, it can be the same as the above description, or it can be set so that the wind speed in any of the second and subsequent ovens is lower than the wind speed of the oven that passes through at first.

搬送路徑1之風速與烘箱內之其他搬送路徑之風速差較佳為0.1~15 m/秒之範圍。上述風速差更佳為0.2 m/秒以上,又,更佳為12 m/秒以下,進而較佳為8 m/秒以下,進而更佳為5 m/秒以下,尤佳為3 m/秒以下。若以風速差成為上述範圍之方式使剛搬入烘箱後之風速大於烘箱內之其他搬送路徑之風速,則存在可更高效率地去除膜中之溶劑之傾向。若風速差過大,則有時產生由於風速差引起之膜之晃動,有時難以製造滿足上述數式(1)~數式(3)之本發明之光學膜。又,可能成為所獲得之光學膜之表面形狀之缺陷或相位差等光學特性不均之原因。The difference between the wind speed of the conveying path 1 and the wind speed of other conveying paths in the oven is preferably in the range of 0.1-15 m/sec. The above-mentioned difference in wind speed is more preferably 0.2 m/sec or more, still more preferably 12 m/sec or less, still more preferably 8 m/sec or less, still more preferably 5 m/sec or less, particularly preferably 3 m/sec the following. If the wind speed immediately after being transferred into the oven is greater than the wind speed of other conveying paths in the oven in such a way that the wind speed difference falls within the above range, there is a tendency that the solvent in the film can be removed more efficiently. If the wind speed difference is too large, the film may shake due to the wind speed difference, and it may sometimes be difficult to manufacture the optical film of the present invention that satisfies the above equations (1) to (3). In addition, it may be a cause of unevenness in optical properties such as defects in the surface shape of the obtained optical film or retardation.

搬送路徑1之風速與烘箱內之其他搬送路徑之風速之差可作為熱風自設置於搬送路徑1之噴嘴之吹出風速與熱風自設置於其他搬送路徑之噴嘴之吹出風速之差而求得。於吹送至膜之熱風之風速與熱風自噴嘴之吹出風速存在2 m/秒以上之差之情形時,可作為搬送路徑1及其他搬送路徑之各自之膜附近之熱風之風速差而求得。The difference between the wind speed of the conveying path 1 and the wind speed of other conveying paths in the oven can be obtained as the difference between the blowing speed of the hot air from the nozzles installed in the conveying path 1 and the blowing wind speed of the hot air from the nozzles of other conveying paths. When there is a difference of 2 m/sec or more between the speed of the hot air blown to the film and the speed of the hot air blowing from the nozzle, it can be obtained as the difference in the wind speed of the hot air near the respective film of the conveying path 1 and the other conveying paths.

其他搬送路徑較佳為位於搬送路徑1之下一個位置之搬送路徑(以下稱為「搬送路徑2」)。於烘箱之內部未分隔成複數個之情形時,搬送路徑2係指位於自烘箱搬入口之烘箱長度之2/10之搬送路徑部。於烘箱之內部劃分為複數個空間之情形時,搬送路徑2係指膜通過之第2個空間。於使用複數個烘箱之情形時,根據最初使用之烘箱之內部構造,可與上述記載相同,亦可設定為第2個烘箱之風速小於最初通過之烘箱。The other conveying path is preferably a conveying path located at a position below the conveying path 1 (hereinafter referred to as "conveying path 2"). In the case where the inside of the oven is not divided into plural pieces, the conveying path 2 refers to the conveying path part located at 2/10 of the oven length from the oven import entrance. When the inside of the oven is divided into multiple spaces, the conveying path 2 refers to the second space through which the film passes. When using multiple ovens, according to the internal structure of the oven initially used, it can be the same as the above description, or it can be set so that the wind speed of the second oven is lower than that of the oven initially passed.

於搬送路徑1與搬送路徑2之風速差如上述般設定之情形時,搬送路徑2以後之搬送路徑之風速只要為上述熱風之吹出風速之範圍內即可。搬送路徑2以後之搬送路徑之風速較佳為與搬送路徑1或搬送路徑2之各自之風速存在0.1~12 m/秒之風速差,更佳為0.2~8 m/秒之風速差。若為此種範圍之風速差,則存在如下傾向:可抑制由於風速差引起之膜之晃動,易於製造滿足上述數式(1)~數式(3)之本發明之光學膜,又,易於將所獲得之光學膜之重量減少率調整為所期望之範圍。When the wind speed difference between the conveying path 1 and the conveying path 2 is set as described above, the wind speed of the conveying path after the conveying path 2 only needs to be within the range of the blowing wind speed of the hot air. The wind speed of the conveying path after conveying path 2 preferably has a wind speed difference of 0.1-12 m/sec from the respective wind speeds of conveying path 1 or conveying path 2, and more preferably a wind speed difference of 0.2-8 m/sec. If the difference in wind speed is in this range, there is a tendency to suppress the shaking of the film due to the difference in wind speed, and it is easy to manufacture the optical film of the present invention that satisfies the above equations (1) to (3). The weight reduction rate of the obtained optical film is adjusted to the desired range.

關於上述風速差,於烘箱之內部未劃分為複數個空間之情形時,可藉由調整設置噴嘴之位置、噴嘴之熱風之吹出速度及風量、烘箱內之氣流之流動等而調整。於烘箱之內部劃分為複數個空間之情形時,可藉由於最初之空間與其以後之空間中,調整設置噴嘴之位置、噴嘴之熱風之吹出速度及風量、烘箱內之氣流之流動等而調整。於使用複數個烘箱之情形時,根據最初之烘箱之構造,可以與上述記載相同之方式進行,亦可以最初之烘箱與第2個以後之烘箱之風速不同之方式,設定設置噴嘴之位置、噴嘴之熱風之吹出速度及風量、烘箱內之氣流等。Regarding the above-mentioned difference in wind speed, when the inside of the oven is not divided into multiple spaces, it can be adjusted by adjusting the position of the nozzle, the blowing speed and air volume of the hot air from the nozzle, and the flow of the air flow in the oven. When the inside of the oven is divided into multiple spaces, it can be adjusted by adjusting the position of the nozzles, the blowing speed and air volume of the nozzles, the flow of airflow in the oven, etc. in the initial space and the subsequent spaces. In the case of using multiple ovens, according to the structure of the initial oven, it can be carried out in the same way as the above description, or the wind speed of the initial oven and the second and subsequent ovens can be different. Set the nozzle position and nozzle The blowing speed and air volume of the hot air, the air flow in the oven, etc.

於拉幅爐100中之加熱區域中,相互對向之上側噴嘴46與下側噴嘴47之間隔L(最短距離)較佳為150 mm以上,更佳為150~600 mm,進而較佳為150~400 mm。藉由以此種間隔L配置上側噴嘴與下側噴嘴,可進一步確實地抑制各步驟中之膜之晃動,易於製造滿足上述數式(1)~數式(3)之本發明之光學膜。In the heating zone of the tenter furnace 100, the distance L (shortest distance) between the upper nozzle 46 and the lower nozzle 47 facing each other is preferably 150 mm or more, more preferably 150 to 600 mm, and still more preferably 150 ~400 mm. By arranging the upper nozzle and the lower nozzle at such an interval L, the shaking of the film in each step can be further reliably suppressed, and it is easy to manufacture the optical film of the present invention that satisfies the above equations (1) to (3).

又,設置於加熱區域之各個噴嘴46、47之吹出口之熱風之寬度方向(與圖3之紙面垂直之方向)之最高溫度與最低溫度之差(ΔT)較佳為全部為2℃以下,更佳為全部為1℃以下。藉由使用如此之寬度方向之溫度差充分小之熱風加熱膜,易於製造滿足上述數式(1)~數式(3)之本發明之光學膜。再者,熱風之溫度較佳為150~400℃,更佳為150~300℃,進而較佳為150~250℃。In addition, the difference (ΔT) between the highest temperature and the lowest temperature (ΔT) in the width direction (the direction perpendicular to the paper surface of FIG. 3) of the hot air outlet of each nozzle 46 and 47 installed in the heating area is preferably all below 2°C, More preferably, all are 1°C or less. By using such a hot-air heating film with a sufficiently small temperature difference in the width direction, it is easy to manufacture the optical film of the present invention that satisfies the above-mentioned formulas (1) to (3). Furthermore, the temperature of the hot air is preferably 150 to 400°C, more preferably 150 to 300°C, and still more preferably 150 to 250°C.

作為於光學膜之製造方法中可使用之噴嘴,可使用通常於膜之製造裝置中使用之噴嘴,作為其例,可例舉:具有於原料膜之寬度方向上延伸之狹縫狀之吹出口之噴嘴,即噴射噴嘴(jet nozzle)(亦稱為狹縫噴嘴);及具有於原料膜之搬送方向及原料膜之寬度方向分別配置有複數個開口之吹出口之噴嘴,即沖孔噴嘴(punching nozzle)(亦稱為多孔噴嘴)。As the nozzle that can be used in the manufacturing method of the optical film, the nozzle usually used in the film manufacturing device can be used. As an example, it can be exemplified: a blowing port having a slit shape extending in the width direction of the raw film The nozzle is a jet nozzle (also called a slit nozzle); and a nozzle with a plurality of openings arranged in the conveying direction of the raw film and the width direction of the raw film, namely, the punching nozzle ( punching nozzle) (also known as multi-hole nozzle).

噴嘴成為如下構造:設置於拉幅爐100內之上表面100a,朝下向膜吹出熱風,及設置於拉幅爐100內之下表面100b,朝上向膜吹出熱風。The nozzle has a structure that is installed on the upper surface 100a of the tenter oven 100 to blow hot air downward to the film, and installed on the lower surface 100b of the tenter furnace 100 to blow hot air upward to the film.

噴射噴嘴具有於膜之寬度方向上延伸之狹縫作為熱風之吹出口。狹縫之狹縫寬度較佳為5 mm以上,更佳為5~20 mm。藉由使狹縫寬度為5 mm以上,可進一步提高所獲得之光學膜之光學均勻性。再者,每一個噴射噴嘴之吹出口之面積可藉由噴射噴嘴之噴嘴之寬度方向之長度與狹縫寬度之乘積而求得。上述每一個噴嘴之吹出口之面積與吹出風速之乘積成為每一個噴嘴之熱風之吹出風量。藉由將該熱風之吹出風量除以沿膜之寬度方向之狹縫之長度,可求得沿膜之寬度方向之噴嘴之長度每1 m之熱風之吹出風量。The spray nozzle has a slit extending in the width direction of the film as a blowing port for hot air. The slit width of the slit is preferably 5 mm or more, more preferably 5-20 mm. By making the slit width 5 mm or more, the optical uniformity of the obtained optical film can be further improved. Furthermore, the area of the blowing port of each spray nozzle can be obtained by the product of the length of the nozzle in the width direction of the spray nozzle and the width of the slit. The product of the area of the blowing outlet of each nozzle and the blowing wind speed becomes the blowing air volume of the hot air from each nozzle. By dividing the blowing volume of the hot air by the length of the slit along the width of the film, the blowing volume of the hot air per 1 m of the length of the nozzle along the width of the film can be obtained.

沖孔噴嘴可為與其長度方向垂直之截面具有長方形之形狀者,或朝向與原料膜44對向之面呈逐漸展開狀之梯形形狀。沖孔噴嘴於與膜對向之面即下側之面具有複數個開口(例如圓形之開口)。沖孔噴嘴之熱風之吹出口包含設置於吹出面之複數個開口。複數個開口為熱風之吹出口,熱風自開口以特定風速吹出。開口於膜之長度方向上配置複數個,並且於寬度方向上亦配置複數個。開口例如可以鋸齒狀配置。The punching nozzle may have a rectangular shape in a cross-section perpendicular to its longitudinal direction, or a trapezoidal shape that gradually expands toward the surface opposite to the raw film 44. The punching nozzle has a plurality of openings (for example, circular openings) on the surface opposite to the film, that is, the surface on the lower side. The hot air blowing outlet of the punching nozzle includes a plurality of openings arranged on the blowing surface. The plurality of openings are outlets for hot air, and the hot air is blown out from the openings at a specific wind speed. A plurality of openings are arranged in the length direction of the film, and a plurality of openings are also arranged in the width direction. The openings may be arranged in a zigzag pattern, for example.

每一個沖孔噴嘴之吹出口之面積可藉由設置於一個沖孔噴嘴之全部開口之面積之和而求得。上述每一個噴嘴之吹出口之面積與吹出風速之乘積成為每一個噴嘴之熱風之吹出風量。藉由將該熱風之吹出風量除以沿膜之寬度方向之狹縫之長度,可求得沿膜之寬度方向之噴嘴之長度每1 m之熱風之吹出風量。The area of the blowing outlet of each punching nozzle can be obtained by the sum of the area of all openings provided in a punching nozzle. The product of the area of the blowing outlet of each nozzle and the blowing wind speed becomes the blowing air volume of the hot air from each nozzle. By dividing the blowing volume of the hot air by the length of the slit along the width of the film, the blowing volume of the hot air per 1 m of the length of the nozzle along the width of the film can be obtained.

於使用沖孔噴嘴之情形時,噴嘴之吹出口之熱風之寬度方向之最大吹出風速與最小吹出風速之差可作為自設置於同一噴嘴上之複數個開口吹出之熱風之最大吹出速度與最小吹出速度之差而求得。噴嘴之吹出口之熱風之寬度方向之最高溫度與最低溫度之差亦可同樣地求得。When using a punching nozzle, the difference between the maximum blowing speed and the minimum blowing wind speed in the width direction of the hot air outlet of the nozzle can be used as the maximum blowing speed and the minimum blowing speed of the hot air blowing from multiple openings on the same nozzle Calculated by the difference in speed. The difference between the maximum temperature and the minimum temperature in the width direction of the hot air at the nozzle outlet can also be obtained in the same way.

若設置於拉幅爐100內之噴嘴全部為沖孔噴嘴,則可增大拉幅爐100整體之熱風吹出口之總面積。故而,可降低吹至膜之熱風之風壓,可進一步減小膜之晃動。藉此,易於製造滿足上述數式(1)~數式(3)之本發明之光學膜。於拉幅爐內或加熱區域,原料膜44自室溫被加熱至原料膜中所含之溶劑蒸發之溫度,但以原料膜44之寬度方向之長度幾乎不變之方式被固持裝置43保持,故而存在易於因熱膨脹而下垂之傾向。藉由於加熱區域使用沖孔噴嘴,可進一步抑制原料膜44之下垂或晃動,易於製造滿足上述數式(1)~數式(3)之本發明之光學膜。If all the nozzles provided in the tenter furnace 100 are punched nozzles, the total area of the hot air outlet of the entire tenter furnace 100 can be increased. Therefore, the wind pressure of the hot air blowing on the film can be reduced, and the shaking of the film can be further reduced. Thereby, it is easy to manufacture the optical film of the present invention that satisfies the above-mentioned formulas (1) to (3). In the tenter furnace or heating zone, the raw film 44 is heated from room temperature to the temperature at which the solvent contained in the raw film evaporates, but is held by the holding device 43 in such a way that the length of the raw film 44 in the width direction is almost constant. There is a tendency to sag easily due to thermal expansion. By using punching nozzles in the heating zone, sagging or shaking of the raw film 44 can be further suppressed, and it is easy to manufacture the optical film of the present invention that satisfies the above-mentioned formulas (1) to (3).

設置於沖孔噴嘴之面上之開口之各自之尺寸及個數可以下述方式適宜調整:各開口之熱風之吹出風速成為2~25 m/秒,且自各個噴嘴之吹出風量於沿膜之寬度方向之噴嘴之長度每1 m中成為0.1~3 m3 /秒之範圍內。The size and number of the openings provided on the surface of the punching nozzle can be appropriately adjusted in the following way: the blowing speed of the hot air from each opening becomes 2-25 m/sec, and the amount of air blowing from each nozzle is at the edge of the film. The length of the nozzle in the width direction is in the range of 0.1 to 3 m 3 /sec per 1 m.

就使自沖孔噴嘴之各開口吹出之吹出風速更均勻之觀點而言,開口之形狀較佳為圓形。於該情形時,開口之直徑較佳為2~10 mm,更佳為3~8 mm。From the viewpoint of making the blowing speed from each opening of the punching nozzle more uniform, the shape of the opening is preferably circular. In this case, the diameter of the opening is preferably 2-10 mm, more preferably 3-8 mm.

於使用沖孔噴嘴之情形時,每一個噴嘴之面之膜搬送方向之長度較佳為50~300 mm。進而與鄰接之沖孔噴嘴之間隔較佳為0.3 m以下。又,沖孔噴嘴之開口之面積之總和(吹出口之面積)相對於沖孔噴嘴之膜寬度方向之長度的比(沖孔噴嘴之開口之面積之總和(m2 )/沖孔噴嘴之膜寬度方向之長度(m))較佳為0.008 m以上。When using punching nozzles, the length of the film conveying direction on the surface of each nozzle is preferably 50-300 mm. Furthermore, the distance between the adjacent punching nozzles is preferably 0.3 m or less. In addition, the ratio of the total area of the openings of the punching nozzle (the area of the blowing outlet) to the length of the film width direction of the punching nozzle (the total area of the openings of the punching nozzle (m 2 )/the film of the punching nozzle The length (m) in the width direction is preferably 0.008 m or more.

藉由使用此種沖孔噴嘴,可增大熱風之吹出口之面積。藉此,可充分降低熱風之風速且以充分之風量吹出熱風,可更均勻地加熱膜。其結果,易於製造滿足上述數式(1)~數式(3)之本發明之光學膜。By using this punching nozzle, the area of the hot air outlet can be enlarged. Thereby, the wind speed of the hot air can be sufficiently reduced and the hot air can be blown out with a sufficient air volume, so that the film can be heated more uniformly. As a result, it is easy to manufacture the optical film of the present invention that satisfies the above-mentioned formulas (1) to (3).

進行加熱步驟之拉幅爐100與噴嘴同樣地,於其內部之上表面100a或其內部之下表面100b設置IR加熱器,可以於上下方向上對向之方式設置。又,IR加熱器可設置複數個。作為IR加熱器,使用通常於膜之製造裝置中使用之IR加熱器即可。The tenter furnace 100 that performs the heating step is the same as the nozzle, and an IR heater is provided on the upper inner surface 100a or the lower inner surface 100b of the inner upper surface 100a, and the IR heater can be arranged in a manner facing up and down. In addition, multiple IR heaters can be installed. As the IR heater, an IR heater usually used in film manufacturing equipment may be used.

作為照射至膜之輻射,較佳為其波長為3~7 μm之熱線。又,於輻射線處理方式中,若進行加熱步驟之空間之溫度為上述溫度範圍內,則可對原料膜照射比空間之溫度高30℃以上之溫度之輻射。The radiation irradiated to the film is preferably a heat ray with a wavelength of 3-7 μm. Moreover, in the radiation treatment method, if the temperature of the space where the heating step is performed is within the above-mentioned temperature range, the raw film can be irradiated with radiation at a temperature higher than the temperature of the space by more than 30°C.

於本發明之實施方式中,於進行加熱步驟之拉幅爐100中,較佳為併用上述噴嘴(熱風處理方式)與IR加熱器(輻射線處理方式)。於該情形時,於鄰接之噴嘴間或噴嘴與拉幅爐之內部壁(亦包含分隔空間之壁)間設置IR加熱器即可。In the embodiment of the present invention, in the tenter furnace 100 that performs the heating step, it is preferable to use the above-mentioned nozzle (hot air treatment method) and IR heater (radiation treatment method) in combination. In this case, it is sufficient to install an IR heater between the adjacent nozzles or between the nozzles and the inner wall of the tenter furnace (including the wall of the partition space).

於該情形時,只要進行加熱步驟之空間之溫度為上述溫度範圍內即可,於輻射線處理方式中,可對膜照射比空間之溫度高之溫度之輻射。輻射之溫度例如可為比空間之溫度高30℃以上之溫度,亦可為高150℃以上之溫度。此處,所謂輻射之溫度例如係指如IR加熱器之設定溫度般由產生放射熱之機器設定之溫度。輻射之溫度與照射至膜之輻射之溫度之差較佳為5℃以下,更佳為3℃以下,進而較佳為1℃以下。In this case, as long as the temperature of the space where the heating step is performed is within the above temperature range, in the radiation treatment method, the film can be irradiated with radiation at a temperature higher than the temperature of the space. The temperature of the radiation can be, for example, a temperature higher than the temperature of the space by 30°C or more, or a temperature higher than 150°C. Here, the so-called radiant temperature refers to, for example, the temperature set by a device that generates radiant heat like the set temperature of an IR heater. The difference between the temperature of the radiation and the temperature of the radiation irradiated to the film is preferably 5°C or less, more preferably 3°C or less, and still more preferably 1°C or less.

於拉幅爐100中,若併用噴嘴(熱風處理方式)與IR加熱器(輻射線處理方式),則即使對原料膜照射溫度高於加熱區域或拉幅爐內之溫度(環境溫度)之輻射,亦可於抑制加熱區域或拉幅爐內之溫度變得過高之同時進行加熱步驟。In the stenter furnace 100, if the nozzle (hot air treatment method) and IR heater (radiation treatment method) are used in combination, even if the raw film is irradiated with radiation whose temperature is higher than the temperature in the heating zone or the stenter furnace (ambient temperature) It is also possible to perform the heating step while preventing the temperature in the heating zone or the tenter furnace from becoming too high.

關於併用熱風處理方式與輻射線處理方式之加熱步驟,於拉幅爐內之進行加熱步驟之複數個空間中,較佳為自原料膜最初通過之空間至位於拉幅爐全長之中間附近之空間之間進行。藉此,不僅可縮短加熱步驟所需之時間,亦可製造面內相位差之均勻性更優異之光學膜。Regarding the heating step using the hot air treatment method and the radiation treatment method in combination, the plurality of spaces in the stenter furnace where the heating step is performed are preferably from the space through which the raw material film first passes to the space near the middle of the full length of the stenter furnace Between. Thereby, not only the time required for the heating step can be shortened, but also an optical film with more excellent in-plane phase difference uniformity can be manufactured.

加熱步驟較佳為於150~350℃之範圍內進行。若於本發明之實施方式中加熱步驟為該溫度範圍,則存在易於以原料膜成為下述重量減少率M之方式進行調整之傾向。該溫度範圍更佳為170℃以上,進而較佳為180℃以上,更佳為300℃以下,進而較佳為250℃以下,尤佳為230℃以下。若加熱步驟之溫度為上述範圍,則易於將所獲得之光學膜之YI值調整為上述較佳之範圍內。又,進行加熱步驟之空間之溫度更佳為170℃以上,進而較佳為180℃以上。關於進行加熱步驟之拉幅爐內之溫度,只要加熱區域為上述範圍即可。於存在複數個拉幅爐之情形及拉幅爐內劃分為複數個空間之情形時,可適宜調整,較佳為全部拉幅爐或空間為上述範圍內。The heating step is preferably performed in the range of 150 to 350°C. If the heating step is within this temperature range in the embodiment of the present invention, it tends to be easily adjusted so that the raw material film becomes the following weight reduction rate M. The temperature range is more preferably 170°C or higher, still more preferably 180°C or higher, more preferably 300°C or lower, still more preferably 250°C or lower, and particularly preferably 230°C or lower. If the temperature of the heating step is in the above-mentioned range, it is easy to adjust the YI value of the obtained optical film into the above-mentioned preferable range. In addition, the temperature of the space where the heating step is performed is more preferably 170°C or higher, and still more preferably 180°C or higher. Regarding the temperature in the tenter furnace where the heating step is performed, the heating area only needs to be in the above-mentioned range. When there are a plurality of tenter furnaces and a situation where the inside of the tenter furnace is divided into a plurality of spaces, it can be adjusted appropriately, and it is preferable that all the tenter furnaces or the spaces are within the above-mentioned range.

拉幅爐100內之原料膜44之移動速度通常可於0.1~50 m/分鐘之範圍內適宜調整。上述移動速度之上限較佳為20 m/分鐘,更佳為15 m/分鐘。上述移動速度之下限較佳為0.2 m/分鐘,更佳為0.5 m/分鐘,進而較佳為0.7 m/分鐘,尤佳為0.8 m/分鐘。若移動速度較快,則為了確保所期望之乾燥時間,存在拉幅爐長度變長,設備變大之傾向。於本發明之實施方式中,若拉幅爐100內之原料膜44之移動速度為上述範圍,則存在易於以原料膜成為下述重量減少率M之方式進行調整之傾向。又,易於製造滿足數式(1)~數式(3)之光學膜。The moving speed of the raw film 44 in the tenter furnace 100 can usually be adjusted appropriately within the range of 0.1-50 m/min. The upper limit of the aforementioned moving speed is preferably 20 m/min, more preferably 15 m/min. The lower limit of the above-mentioned moving speed is preferably 0.2 m/min, more preferably 0.5 m/min, still more preferably 0.7 m/min, and particularly preferably 0.8 m/min. If the moving speed is fast, in order to ensure the desired drying time, there is a tendency that the length of the tenter furnace becomes longer and the equipment becomes larger. In the embodiment of the present invention, if the moving speed of the raw material film 44 in the tenter furnace 100 is within the above-mentioned range, there is a tendency that adjustment is easy so that the raw material film becomes the following weight reduction rate M. In addition, it is easy to manufacture an optical film that satisfies the mathematical formulas (1) to (3).

加熱步驟之處理時間通常為60秒~2小時,較佳為10分鐘~1小時。處理時間可考慮上述拉幅爐之溫度、移動速度、熱風之風速及風量等條件而適宜調整。The treatment time of the heating step is usually 60 seconds to 2 hours, preferably 10 minutes to 1 hour. The processing time can be appropriately adjusted in consideration of the temperature, moving speed, hot air speed and air volume of the above-mentioned tenter furnace.

於本發明之一實施方式中,光學膜之製造方法可進行於加熱步驟中改變膜之寬度之操作或保持膜之寬度而搬送之操作。作為改變膜之寬度之操作之例,可例舉:使膜於寬度方向上延伸之操作。延伸倍率較佳為0.7~1.5倍,更佳為0.8~1.4倍,進而較佳為0.8~1.3倍。作為保持膜之寬度而搬送之操作之例,可例舉:以膜之寬度方向之長度幾乎不變之方式進行保持之操作。作為經過該等操作獲得之光學膜,可成為相對於原料膜之寬度方向之長度為0.7~1.5倍左右之長度,可為自原料膜之寬度方向之長度延伸、保持等倍或收縮之長度。延伸倍率係作為延伸後之膜之寬度(排除固持部分)相對於排除固持部分之膜之寬度之比而求得。 再者,圖4中,於使膜之寬度方向延伸之操作中,以實線表示延伸倍率超過1倍之情形,以虛線表示延伸倍率保持等倍或未達1倍之情形。In one embodiment of the present invention, the manufacturing method of the optical film can be carried out during the heating step to change the width of the film or to maintain the width of the film while conveying. As an example of the operation of changing the width of the film, an operation of extending the film in the width direction can be mentioned. The stretching ratio is preferably 0.7 to 1.5 times, more preferably 0.8 to 1.4 times, and still more preferably 0.8 to 1.3 times. As an example of the operation of maintaining the width of the film and conveying, for example, the operation of holding such that the length of the film in the width direction is almost constant. As an optical film obtained through these operations, it can be about 0.7 to 1.5 times the length of the raw film in the width direction, and can be extended, kept equal, or contracted from the length of the raw film in the width direction. The stretching ratio is calculated as the ratio of the width of the stretched film (excluding the holding part) to the width of the film excluding the holding part. Furthermore, in FIG. 4, in the operation of stretching the film in the width direction, the solid line indicates the case where the stretching ratio exceeds 1 time, and the dotted line indicates the case where the stretching ratio remains equal or less than 1 time.

經過加熱步驟之光學膜自拉幅爐搬出後,可連續供給至下一個步驟,亦可捲取為捲筒狀而供給至下一個步驟。於將光學膜捲取為捲筒之情形時,可積層表面保護膜及其他光學膜等其他膜而捲取。作為積層於光學膜之表面保護膜,可使用與下述積層於原料膜之表面保護膜相同者。積層於光學膜之表面保護膜之厚度通常為10~100 μm,較佳為10~80 μm。After the optical film after the heating step is carried out from the tenter furnace, it can be continuously supplied to the next step, or it can be wound into a roll and supplied to the next step. When the optical film is rolled into a roll, other films such as a surface protective film and other optical films can be laminated and rolled up. As the surface protection film laminated on the optical film, the same thing as the surface protection film laminated on the raw material film mentioned below can be used. The thickness of the surface protection film laminated on the optical film is usually 10-100 μm, preferably 10-80 μm.

<原料膜> 供給至上述加熱步驟之原料膜至少含有聚醯亞胺系樹脂及/或聚醯胺系樹脂。原料膜較佳為含有與下述原料膜之形成中所使用之清漆中所含之成分相同之成分,但由於可發生成分之結構變化或溶劑之一部分蒸發,故而亦可不同。原料膜為自支撐膜即可,亦可為凝膠膜。<Raw film> The raw material film supplied to the heating step contains at least a polyimide-based resin and/or a polyimide-based resin. The raw material film preferably contains the same components as those contained in the varnish used in the formation of the raw material film described below, but it may be different due to structural changes of the components or partial evaporation of the solvent. The raw material film may be a self-supporting film, or a gel film.

原料膜就易於製造滿足數式(1)~數式(3)之光學膜之觀點而言,較佳為無論是否含有無機材料,均以藉由熱重量-示差熱測定(以下有時稱為「TG-DTA測定」)求得之自120℃至250℃之重量減少率M成為較佳為1~40%左右,更佳為3~20%,進而較佳為5~15%,尤佳為5~12%之方式,自上述清漆去除溶劑之一部分。原料膜之重量減少率M可使用市售之TG-DTA之測定裝置,藉由以下方法而測定。作為TG-DTA之測定裝置,可使用Hitachi High-Tech Science公司製造之TG/DTA6300。From the viewpoint of the ease of manufacturing an optical film satisfying the mathematical formulas (1) to (3), the raw material film is preferably measured by thermogravimetric-differential calorimetry (hereinafter sometimes referred to as "TG-DTA measurement") The weight reduction rate M from 120°C to 250°C obtained is preferably about 1-40%, more preferably 3-20%, and still more preferably 5-15%, especially It is a method of 5-12% to remove part of the solvent from the above varnish. The weight reduction rate M of the raw film can be measured by the following method using a commercially available TG-DTA measuring device. As a TG-DTA measuring device, TG/DTA6300 manufactured by Hitachi High-Tech Science can be used.

首先,自原料膜取得約20 mg之試樣,一邊於下述條件下進行加熱一邊測定試樣之重量變化:以10℃/分鐘之升溫速度自室溫升溫至120℃,於120℃下保持5分鐘後,以10℃/分鐘之升溫速度升溫至400℃。其次,自TG-DTA測定之結果,藉由下述式算出自120℃至250℃之重量減少率M(%)即可。於下述式中,W0 表示於120℃下保持5分鐘後之試樣之重量,W1 表示250℃下之試樣之重量。 M(%)=100-(W1 /W0 )×100First, take a sample of about 20 mg from the raw material film, and measure the weight change of the sample while heating it under the following conditions: the temperature is increased from room temperature to 120°C at a temperature increase rate of 10°C/min, and the temperature is maintained at 120°C for 5 Minutes later, the temperature was increased to 400°C at a temperature increase rate of 10°C/min. Next, from the result of the TG-DTA measurement, the weight reduction rate M (%) from 120°C to 250°C can be calculated by the following formula. In the following formula, W 0 represents the weight of the sample after being kept at 120°C for 5 minutes, and W 1 represents the weight of the sample at 250°C. M(%)=100-(W 1 /W 0 )×100

若原料膜之重量減少率M一定程度地大,則將原料膜作為與基材或表面保護膜之積層體而捲取時,存在積層體之彎曲等變形得以抑制,積層體之捲取性提高之傾向。又,易於製造滿足數式(1)~數式(3)之光學膜。If the weight reduction rate M of the raw film is large to some extent, when the raw film is wound as a laminate with a substrate or a surface protective film, the deformation of the laminate is suppressed, and the coilability of the laminate is improved The tendency. In addition, it is easy to manufacture an optical film that satisfies the mathematical formulas (1) to (3).

若原料膜之重量減少率M一定程度地小,則將原料膜作為與基材或表面保護膜之積層體而捲取時,存在原料膜難以貼附於基材或表面保護膜之傾向。故而,可於維持原料膜之均勻之透明性之同時,將積層體容易地自捲筒捲出。If the weight reduction rate M of the raw film is small to some extent, when the raw film is wound up as a laminate with the substrate or the surface protection film, the raw film tends to be difficult to adhere to the substrate or the surface protection film. Therefore, the laminate can be easily rolled out of the reel while maintaining the uniform transparency of the raw film.

原料膜可藉由將上述塗膜乾燥,自基材剝離而形成。塗膜之乾燥通常可於50~350℃之溫度下進行。視需要,可於惰性環境或減壓之條件下進行塗膜之乾燥。將如上述般獲得之原料膜供給至上述加熱步驟,可製造本發明之光學膜。原料膜可連續搬送供給至加熱步驟,亦可暫時捲取後供給。The raw material film can be formed by drying the above-mentioned coating film and peeling it from the base material. The drying of the coating film can usually be carried out at a temperature of 50 to 350°C. If necessary, the coating film can be dried in an inert environment or under reduced pressure. The raw material film obtained as described above is supplied to the above heating step to produce the optical film of the present invention. The raw film can be continuously transported and supplied to the heating step, or it can be temporarily wound and supplied.

<功能層> 可於本發明之光學膜之至少一面積層1個以上之功能層。作為功能層,例如可例舉:紫外線吸收層、硬塗層、底塗層、阻氣層、黏著層、色相調整層、折射率調整層等。功能層可單獨或組合使用兩種以上。<Functional layer> More than one functional layer can be layered on at least one area of the optical film of the present invention. As the functional layer, for example, an ultraviolet absorbing layer, a hard coat layer, an undercoat layer, a gas barrier layer, an adhesion layer, a hue adjustment layer, a refractive index adjustment layer, etc. may be mentioned. The functional layer can be used alone or in combination of two or more.

(紫外線吸收層) 紫外線吸收層係具有紫外線吸收之功能之層,例如包含選自紫外線硬化型之透明樹脂、電子束硬化型之透明樹脂及熱硬化型之透明樹脂中之主材、及分散於該主材之紫外線吸收劑。(Ultraviolet absorption layer) The ultraviolet absorbing layer is a layer that has the function of absorbing ultraviolet rays, such as a main material selected from the group consisting of ultraviolet curable transparent resin, electron beam curable transparent resin, and thermosetting transparent resin, and ultraviolet rays dispersed in the main material Absorbent.

(硬塗層) 硬塗層例如係可使含有可藉由活性能量線照射或熱能賦予而形成交聯結構之反應性材料之硬塗層形成用組合物(以下亦稱為「硬塗組合物」)硬化而形成之層,較佳為可藉由活性能量線照射而形成之層。活性能量線係定義為可將產生活性種之化合物分解而使之產生活性種之能量線,可例舉:可見光、紫外線、紅外線、X射線、α射線、β射線、γ射線及電子束等,較佳可例舉紫外線。上述硬塗組合物含有自由基聚合性化合物及陽離子聚合性化合物之至少一種聚合物。硬塗層之厚度並無特別限定,就易於防止彎曲時之硬塗層或硬塗層與光學膜之界面之破裂之觀點而言,較佳為2~50 μm,更佳為2~40 μm,進而較佳為3~20 μm,進而更佳為3~15 μm。若上述硬塗層之厚度為上述範圍,則存在可確保充分之耐擦傷性,且耐彎曲性不易下降,不易發生因硬化收縮而產生捲曲之問題之傾向。(Hard coating) The hard coat layer can be formed by curing, for example, a composition for forming a hard coat layer (hereinafter also referred to as a "hard coat composition") containing a reactive material that can form a cross-linked structure by active energy ray irradiation or application of heat energy. The layer is preferably a layer that can be formed by irradiation with active energy rays. Active energy rays are defined as energy rays that can decompose compounds that produce active species to produce active species. Examples include visible light, ultraviolet rays, infrared rays, X-rays, α-rays, β-rays, γ-rays, and electron beams. Preferably, ultraviolet rays can be exemplified. The above-mentioned hard coating composition contains at least one polymer of a radical polymerizable compound and a cation polymerizable compound. The thickness of the hard coat layer is not particularly limited. From the viewpoint of easy prevention of cracking of the hard coat layer or the interface between the hard coat layer and the optical film during bending, it is preferably 2-50 μm, more preferably 2-40 μm , More preferably 3-20 μm, still more preferably 3-15 μm. If the thickness of the hard coat layer is in the above range, sufficient scratch resistance can be ensured, and the bending resistance is unlikely to decrease, and there is a tendency that curling due to hardening shrinkage is unlikely to occur.

於硬塗層形成步驟中,對塗膜照射高能量線(例如活性能量線),使塗膜硬化從而形成硬塗層。照射強度根據硬化性組合物之組成而適宜決定,並無特別限定,較佳為對聚合起始劑之活化有效之波長區域之照射。照射強度較佳為0.1~6,000 mW/cm2 ,更佳為10~1,000 mW/cm2 ,進而較佳為20~500 mW/cm2 。若照射強度為上述範圍內,則可確保適當之反應時間,可抑制自光源輻射之熱及硬化反應時之發熱所導致之樹脂之黃變或劣化。照射時間根據硬化性組合物之組成適宜選擇即可,並無特別限制,以由上述照射強度與照射時間之乘積所表示之累計光量較佳成為10~10,000 mJ/cm2 ,更佳成為50~1,000 mJ/cm2 ,進而較佳成為80~500 mJ/cm2 之方式設定。若累計光量為上述範圍內,則自聚合起始劑產生充分量之活性種,從而可使硬化反應更確實地進行,又照射時間不會過長,可維持良好之生產性。又,藉由經過該範圍內之照射步驟,可進一步提高硬塗層之硬度,故而有用。就提高硬塗層之平滑性,進一步提高光學膜之廣角方向之視認性之觀點而言,可例舉:溶劑之種類、成分比、固形物成分濃度之最佳化及調平劑之添加等。In the hard coat layer forming step, the coating film is irradiated with high energy rays (for example, active energy rays) to harden the coating film to form a hard coat layer. The irradiation intensity is appropriately determined according to the composition of the curable composition and is not particularly limited, but it is preferably irradiation in a wavelength region effective for activation of the polymerization initiator. The irradiation intensity is preferably 0.1 to 6,000 mW/cm 2 , more preferably 10 to 1,000 mW/cm 2 , and still more preferably 20 to 500 mW/cm 2 . If the irradiation intensity is within the above range, an appropriate reaction time can be ensured, and the yellowing or deterioration of the resin caused by the heat radiated from the light source and the heat generated during the curing reaction can be suppressed. The irradiation time may be appropriately selected according to the composition of the curable composition, and is not particularly limited. The cumulative light amount represented by the product of the above-mentioned irradiation intensity and irradiation time is preferably 10 to 10,000 mJ/cm 2 , more preferably 50 to 1,000 mJ/cm 2 , and more preferably 80 to 500 mJ/cm 2 . If the cumulative amount of light is within the above range, a sufficient amount of active species will be generated from the polymerization initiator, so that the curing reaction can proceed more reliably, and the irradiation time will not be too long, and good productivity can be maintained. In addition, by going through the irradiation step within this range, the hardness of the hard coat layer can be further increased, which is useful. From the viewpoint of improving the smoothness of the hard coat layer and further improving the visibility of the optical film in the wide-angle direction, examples include: the type of solvent, the ratio of components, the optimization of the solid content concentration, and the addition of leveling agents, etc. .

上述自由基聚合性化合物係具有自由基聚合性基之化合物。作為上述自由基聚合性化合物所具有之自由基聚合性基,只要為可產生自由基聚合反應之官能基即可,可例舉含有碳-碳不飽和雙鍵之基等,具體可例舉:乙烯基、(甲基)丙烯醯基等。再者,於上述自由基聚合性化合物具有2個以上之自由基聚合性基之情形時,該等自由基聚合性基相互可相同,亦可不同。作為上述自由基聚合性化合物於1分子中所具有之自由基聚合性基之個數,就提高硬塗層之硬度之方面而言,較佳為2以上。作為上述自由基聚合性化合物,就反應性較高之方面而言,較佳可例舉具有(甲基)丙烯醯基之化合物,具體可例舉:於1分子中具有2~6個(甲基)丙烯醯基之被稱為多官能丙烯酸酯單體之化合物或被稱為環氧(甲基)丙烯酸酯、聚胺基甲酸酯(甲基)丙烯酸酯、聚酯(甲基)丙烯酸酯之於分子內具有數個(甲基)丙烯醯基之分子量為數百至數千之低聚物,較佳可例舉選自環氧(甲基)丙烯酸酯、聚胺基甲酸酯(甲基)丙烯酸酯及聚酯(甲基)丙烯酸酯中之一種以上。The above-mentioned radically polymerizable compound is a compound having a radically polymerizable group. As the radical polymerizable group possessed by the above-mentioned radical polymerizable compound, any functional group capable of generating a radical polymerization reaction may be sufficient, and a group containing a carbon-carbon unsaturated double bond can be exemplified. Specific examples include: Vinyl, (meth)acrylic acid, etc. In addition, when the above-mentioned radically polymerizable compound has two or more radically polymerizable groups, these radically polymerizable groups may be the same as or different from each other. As the number of radical polymerizable groups which the said radically polymerizable compound has in 1 molecule, it is preferable that it is 2 or more from the point which improves the hardness of a hard-coat layer. As the above-mentioned radically polymerizable compound, in terms of high reactivity, a compound having a (meth)acryloyl group is preferably exemplified, and specific examples include: having 2 to 6 (formaldehyde) in one molecule Acrylic acid-based compounds called polyfunctional acrylate monomers or epoxy (meth)acrylate, polyurethane (meth)acrylate, polyester (meth)acrylic acid The ester is an oligomer with several (meth)acrylic acid groups in the molecule and a molecular weight of several hundred to several thousand, preferably selected from epoxy (meth)acrylate and polyurethane One or more of (meth)acrylate and polyester (meth)acrylate.

上述陽離子聚合性化合物係具有環氧基、氧雜環丁基、乙烯醚基等陽離子聚合性基之化合物。作為上述陽離子聚合性化合物於1分子中所具有之陽離子聚合性基之個數,就提高硬塗層之硬度之方面而言,較佳為2以上,更佳為3以上。 又,作為上述陽離子聚合性化合物,其中,較佳為具有環氧基及氧雜環丁基之至少一種作為陽離子聚合性基之化合物。環氧基、氧雜環丁基等環狀醚基就伴隨聚合反應之收縮較小之方面而言較佳。又,環狀醚基中具有環氧基之化合物具有易於獲取多種結構之化合物,不會對所獲得之硬塗層之耐久性產生不良影響,與自由基聚合性化合物之相溶性亦易於控制的優點。又,環狀醚基中,氧雜環丁基與環氧基相比較,具有聚合度易於變高,加快所獲得之硬塗層之自陽離子聚合性化合物獲得之網狀結構形成速度,於與自由基聚合性化合物混合存在之區域亦不會於膜中殘存未反應之單體,形成獨立之網狀結構等優點。 作為具有環氧基之陽離子聚合性化合物,例如可例舉:具有脂環族環之多元醇之聚縮水甘油醚、或藉由將含環己烯環、環戊烯環之化合物以過氧化氫、過酸等適當之氧化劑進行環氧化而獲得之脂環族環氧樹脂;脂肪族多元醇或其環氧烷加成物之聚縮水甘油醚、脂肪族長鏈多元酸之聚縮水甘油酯、(甲基)丙烯酸縮水甘油酯之均聚物、共聚物等脂肪族環氧樹脂;藉由雙酚A、雙酚F或氫化雙酚A等雙酚類、或該等之環氧烷加成物、己內酯加成物等衍生物與表氯醇之反應而製造之縮水甘油醚、及酚醛清漆環氧樹脂等,即自雙酚類衍生之縮水甘油醚型環氧樹脂等。The above-mentioned cationically polymerizable compound is a compound having a cationically polymerizable group such as an epoxy group, an oxetanyl group, and a vinyl ether group. The number of cationically polymerizable groups contained in one molecule of the above-mentioned cationically polymerizable compound is preferably 2 or more, more preferably 3 or more in terms of increasing the hardness of the hard coat layer. In addition, as the above-mentioned cationically polymerizable compound, a compound having at least one of an epoxy group and an oxetanyl group as a cationically polymerizable group is preferable. Cyclic ether groups such as epoxy groups and oxetanyl groups are preferable in terms of less shrinkage accompanying the polymerization reaction. In addition, the compound having an epoxy group in the cyclic ether group has a compound that is easy to obtain a variety of structures, does not adversely affect the durability of the obtained hard coat, and the compatibility with the radical polymerizable compound is also easy to control advantage. In addition, in the cyclic ether group, the oxetanyl group has a higher degree of polymerization than the epoxy group, which speeds up the formation speed of the network structure obtained from the cationically polymerizable compound of the hard coat layer. The region where the radical polymerizable compound is mixed will not leave unreacted monomers in the film, forming an independent network structure and other advantages. As a cationic polymerizable compound having an epoxy group, for example, polyglycidyl ether of a polyhydric alcohol having an alicyclic ring, or by using a compound containing a cyclohexene ring and a cyclopentene ring with hydrogen peroxide , Peracid and other appropriate oxidizing agent to obtain cycloaliphatic epoxy resin; ( Aliphatic epoxy resins such as homopolymers and copolymers of glycidyl methacrylate; by bisphenols such as bisphenol A, bisphenol F or hydrogenated bisphenol A, or their alkylene oxide adducts , Glycidyl ether produced by the reaction of derivatives such as caprolactone adducts and epichlorohydrin, and novolac epoxy resins, that is, glycidyl ether type epoxy resins derived from bisphenols.

上述硬塗組合物可進而含有聚合起始劑。作為聚合起始劑,可例舉:自由基聚合起始劑、陽離子聚合起始劑、自由基及陽離子聚合起始劑等,適宜選擇使用。該等聚合起始劑係藉由活性能量線照射及加熱之至少一種而分解,產生自由基或陽離子,從而進行自由基聚合與陽離子聚合者。 自由基聚合起始劑只要可藉由活性能量線照射及加熱之至少任一者而釋出使自由基聚合開始之物質即可。例如,作為熱自由基聚合起始劑,可例舉:過氧化氫、過苯甲酸等有機過氧化物、偶氮雙丁腈等偶氮化合物等。 作為活性能量線自由基聚合起始劑,有:藉由分子之分解而生成自由基之Type1型自由基聚合起始劑、及與三級胺共存並藉由奪氫型反應而生成自由基之Type2型自由基聚合起始劑,該等可單獨使用或併用。 陽離子聚合起始劑只要可藉由活性能量線照射及加熱之至少任一者而釋出使陽離子聚合開始之物質即可。作為陽離子聚合起始劑,可使用芳香族錪鹽、芳香族鋶鹽、環戊二烯基鐵(II)錯合物等。該等根據結構之不同,藉由活性能量線照射或加熱之任一者可開始陽離子聚合,或藉由活性能量線照射或加熱之兩者均可開始陽離子聚合。The above-mentioned hard coat composition may further contain a polymerization initiator. The polymerization initiator may, for example, be a radical polymerization initiator, a cationic polymerization initiator, a radical and cationic polymerization initiator, etc., which are appropriately selected and used. These polymerization initiators are decomposed by at least one of active energy ray irradiation and heating to generate free radicals or cations, thereby performing radical polymerization and cationic polymerization. The radical polymerization initiator may release a substance that initiates radical polymerization by at least any one of active energy ray irradiation and heating. For example, as a thermal radical polymerization initiator, organic peroxides, such as hydrogen peroxide and perbenzoic acid, azo compounds, such as azobisbutyronitrile, etc. are mentioned. As active energy ray radical polymerization initiators, there are Type1 radical polymerization initiators that generate free radicals by the decomposition of molecules, and those that coexist with tertiary amines and generate free radicals by hydrogen abstraction type reactions. Type 2 radical polymerization initiator, which can be used alone or in combination. The cationic polymerization initiator may release a substance that initiates cationic polymerization by at least one of active energy ray irradiation and heating. As the cationic polymerization initiator, an aromatic iodonium salt, an aromatic sulfonium salt, a cyclopentadienyl iron (II) complex, and the like can be used. Depending on the structure, the cationic polymerization can be started by either irradiation with active energy rays or heating, or both can start cationic polymerization by irradiation with active energy rays or heating.

上述聚合起始劑相對於上述硬塗組合物整體100質量%,較佳可含有0.1~10質量%。若上述聚合起始劑之含量為上述範圍,則存在如下傾向:可充分進行硬化,最終獲得之塗膜之機械物性或密接力可成為良好之範圍,又,不易產生因硬化收縮所導致之接著力不良或破裂現象及捲曲現。The polymerization initiator may preferably contain 0.1 to 10% by mass relative to 100% by mass of the entire hard coating composition. If the content of the polymerization initiator is in the above range, there is a tendency that curing can be carried out sufficiently, and the mechanical properties or adhesive force of the finally obtained coating film can be in a good range, and adhesion caused by curing shrinkage is unlikely to occur. Poor force or cracking and curling.

上述硬塗組合物可進而含有選自由溶劑及添加劑所組成之群中之一個以上。 上述溶劑只要為可溶解或分散上述聚合性化合物及聚合起始劑,且為作為本技術領域之硬塗組合物之溶劑而已知之溶劑,則可於不損害本發明之效果之範圍內使用。 上述添加劑可進而含有無機粒子、調平劑、穩定劑、界面活性劑、抗靜電劑、潤滑劑、防污劑等。The above-mentioned hard coating composition may further contain one or more selected from the group consisting of solvents and additives. As long as the above-mentioned solvent can dissolve or disperse the above-mentioned polymerizable compound and polymerization initiator, and is a solvent known as a solvent for hard coat compositions in this technical field, it can be used within a range that does not impair the effects of the present invention. The above-mentioned additives may further contain inorganic particles, leveling agents, stabilizers, surfactants, antistatic agents, lubricants, antifouling agents, and the like.

(黏著層) 黏著層係具有黏著性之功能之層,具有使光學膜接著於其他構件之功能。作為黏著層之形成材料,可使用通常已知者。例如可使用熱硬化性樹脂組合物或光硬化性樹脂組合物。於該情形時,可藉由於事後供給能量而將樹脂組合物高分子化,從而使之硬化。(Adhesive layer) The adhesive layer is a layer with the function of adhesion, and has the function of adhering the optical film to other components. As the forming material of the adhesive layer, generally known ones can be used. For example, a thermosetting resin composition or a photocuring resin composition can be used. In this case, the resin composition can be cured by polymerizing the resin composition by supplying energy afterwards.

黏著層可為稱為感壓型接著劑(Pressure Sensitive Adhesive,PSA)之藉由按壓而貼合於對象物之層。感壓型接著劑可為作為「於常溫下具有黏著性,以較輕之壓力接著於被接著材之物質」(JIS K 6800)之黏著劑,亦可為作為「特定成分容納於保護覆膜(微膠囊)中,直至藉由適當之方法(壓力、熱等)將覆膜破壞為止均可保持穩定性之接著劑」(JIS K 6800)之膠囊型接著劑。The adhesive layer may be a layer called a Pressure Sensitive Adhesive (PSA) that adheres to an object by pressing. Pressure-sensitive adhesives can be used as "substances that are adhesive at room temperature and adhere to the material to be bonded with a lighter pressure" (JIS K 6800), or can be used as "a specific component contained in the protective film" (Microcapsules), an adhesive that can maintain stability until the film is broken by an appropriate method (pressure, heat, etc.)" (JIS K 6800) capsule type adhesive.

(色相調整層) 色相調整層係具有色相調整之功能之層,係可將含有光學膜之積層體調整為目標色相之層。色相調整層例如係含有樹脂及著色劑之層。作為該著色劑,例如可例舉:氧化鈦、氧化鋅、紅丹、氧鈦系煅燒顏料、群青、鋁酸鈷及碳黑等無機顏料;偶氮系化合物、喹吖啶酮系化合物、蒽醌系化合物、苝系化合物、異吲哚啉酮系化合物、酞菁系化合物、喹酞酮系化合物、士林(threne)系化合物及吡咯并吡咯二酮系化合物等有機顏料;硫酸鋇及碳酸鈣等體質顏料;以及鹼性染料、酸性染料及媒染染料等染料。(Hue adjustment layer) The hue adjustment layer is a layer with the function of hue adjustment, and is a layer that can adjust the layered body containing the optical film to the target hue. The hue adjusting layer is, for example, a layer containing resin and coloring agent. As the coloring agent, for example, inorganic pigments such as titanium oxide, zinc oxide, red lead, titanyl calcined pigments, ultramarine blue, cobalt aluminate, and carbon black; azo compounds, quinacridone compounds, anthracene Organic pigments such as quinone compounds, perylene compounds, isoindolinone compounds, phthalocyanine compounds, quinophthalone compounds, threne compounds, and diketopyrrolopyrrole compounds; barium sulfate and carbonic acid Extender pigments such as calcium; and dyes such as basic dyes, acid dyes and mordant dyes.

(折射率調整層) 折射率調整層係具有折射率調整之功能之層,例如係具有與光學膜不同之折射率,可對光學積層體賦予特定折射率之層。折射率調整層例如可為含有適宜選擇之樹脂、及視情況進而含有顏料之樹脂層,亦可為金屬之薄膜。作為調整折射率之顏料,例如可例舉:氧化矽、氧化鋁、氧化銻、氧化錫、氧化鈦、氧化鋯及氧化鉭。該顏料之平均一次粒徑可為0.1 μm以下。藉由使顏料之平均一次粒徑為0.1 μm以下,可防止透過折射率調整層之光之漫反射,從而防止透明度之下降。作為折射率調整層中所使用之金屬,例如可例舉:氧化鈦、氧化鉭、氧化鋯、氧化鋅、氧化錫、氧化矽、氧化銦、氮氧化鈦、氮化鈦、氮氧化矽、氮化矽等金屬氧化物或金屬氮化物。(Refractive index adjustment layer) The refractive index adjustment layer is a layer having a refractive index adjustment function, for example, a layer that has a refractive index different from that of an optical film and can give a specific refractive index to the optical laminate. The refractive index adjustment layer may be, for example, a resin layer containing appropriately selected resin and pigments as appropriate, or a metal thin film. As the pigment for adjusting the refractive index, for example, silicon oxide, aluminum oxide, antimony oxide, tin oxide, titanium oxide, zirconium oxide, and tantalum oxide may be mentioned. The average primary particle size of the pigment may be 0.1 μm or less. By making the average primary particle size of the pigment to be 0.1 μm or less, the diffuse reflection of the light passing through the refractive index adjustment layer can be prevented, thereby preventing the decrease in transparency. As the metal used in the refractive index adjustment layer, for example, titanium oxide, tantalum oxide, zirconium oxide, zinc oxide, tin oxide, silicon oxide, indium oxide, titanium oxynitride, titanium nitride, silicon oxynitride, nitrogen Metal oxides or metal nitrides such as silicide.

(保護膜) 於本發明之一實施態樣中,光學膜可於至少一面(單面或雙面)具有保護膜。例如於光學膜之單面具有功能層之情形時,保護膜可積層於光學膜側之表面或功能層側之表面,亦可積層於光學膜側與功能層側之兩者。於光學膜之雙面具有功能層之情形時,保護膜可積層於其中一個功能層側之表面,亦可積層於兩個功能層側之表面。保護膜係用以暫時保護光學膜或功能層之表面之膜,只要為可保護光學膜或功能層之表面之可剝離之膜,則並無特別限定。作為保護膜,例如可例舉:聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯等聚酯系樹脂膜;聚乙烯、聚丙烯膜等聚烯烴系樹脂膜、丙烯酸系樹脂膜等,較佳為選自由聚烯烴系樹脂膜、聚對苯二甲酸乙二酯系樹脂膜及丙烯酸系樹脂膜所組成之群。於光學膜具有2個保護膜之情形時,各保護膜可相互,亦可不同。(Protective film) In an embodiment of the present invention, the optical film may have a protective film on at least one side (single-sided or double-sided). For example, when the optical film has a functional layer on one side, the protective film may be laminated on the surface on the optical film side or on the functional layer side, or on both the optical film side and the functional layer side. When the optical film has functional layers on both sides, the protective film can be laminated on the surface of one of the functional layers, or on the surface of the two functional layers. The protective film is a film used to temporarily protect the surface of the optical film or the functional layer, and it is not particularly limited as long as it is a peelable film that can protect the surface of the optical film or the functional layer. Examples of protective films include polyester resin films such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate; polyolefins such as polyethylene and polypropylene films. The resin film, acrylic resin film, etc. are preferably selected from the group consisting of polyolefin resin film, polyethylene terephthalate resin film, and acrylic resin film. When the optical film has two protective films, the protective films may be mutually or different.

保護膜之厚度並無特別限定,通常為10~120 μm,較佳為15~110 μm,更佳為20~100 μm。於光學膜具有2個保護膜之情形時,各保護膜之厚度可相同,亦可不同。The thickness of the protective film is not particularly limited, and is usually 10 to 120 μm, preferably 15 to 110 μm, and more preferably 20 to 100 μm. When the optical film has two protective films, the thickness of each protective film may be the same or different.

本發明之光學膜可為單層,亦可為積層體,例如可直接使用如上述之方式製造之光學膜,亦可作為進而與其他膜之積層體而使用。The optical film of the present invention may be a single layer or a laminate. For example, the optical film manufactured as described above may be used as it is, or it may be used as a laminate with other films.

於本發明之較佳一實施形態中,本發明之光學膜作為圖像顯示裝置之前面板,尤其作為可撓式顯示裝置之前面板(以下亦稱為視窗膜),尤其作為可捲式顯示器或可摺疊式顯示器之前面板而非常有用。可撓式顯示裝置例如具有可撓式功能層、及重疊於可撓式功能層且作為前面板而發揮功能之光學膜。即,可撓式顯示裝置之前面板係配置於可撓式功能層上之視認側。該前面板具有保護可撓式功能層之功能。In a preferred embodiment of the present invention, the optical film of the present invention is used as a front panel of an image display device, especially as a front panel of a flexible display device (hereinafter also referred to as window film), especially as a rollable display or a flexible display device. The front panel of the foldable display is very useful. The flexible display device has, for example, a flexible functional layer and an optical film superimposed on the flexible functional layer and functioning as a front panel. That is, the front panel of the flexible display device is arranged on the visible side of the flexible functional layer. The front panel has the function of protecting the flexible functional layer.

作為圖像顯示裝置,可例舉:電視、智慧型手機、行動電話、汽車導航、平板PC(personal computer,個人電腦)、攜帶型遊戲機、電子紙、指示器(indicator)、公告板、錶、及智慧型手錶等可穿戴裝置等。作為可撓式顯示裝置,可例舉具有可撓特性之所有圖像顯示裝置。Examples of image display devices include televisions, smart phones, mobile phones, car navigation, tablet PCs (personal computers), portable game consoles, electronic paper, indicators, bulletin boards, watches , And wearable devices such as smart watches. As the flexible display device, all image display devices having flexible characteristics can be cited.

[可撓式顯示裝置] 本發明亦提供一種具備本發明之光學膜之可撓式顯示裝置。本發明之光學膜較佳為於可撓式顯示裝置中用作前面板,該前面板有時稱為視窗膜。可撓式顯示裝置包含可撓式顯示裝置用積層體、有機EL顯示面板,相對於有機EL顯示面板於視認側配置有可撓式顯示裝置用積層體,以可彎曲之方式構成。可撓式顯示裝置用積層體可含有本發明之光學膜(視窗膜)、圓偏光板、觸控感測器,該等之積層順序為任意順序,較佳為自視認側起以視窗膜、圓偏光板、觸控感測器或視窗膜、觸控感測器、圓偏光板之順序積層。若於觸控感測器之視認側存在圓偏光板,則不易視認觸控感測器之圖案,顯示圖像之視認性變得良好,故而較佳。各個構件可使用接著劑、黏著劑等而積層。又,可具備於視窗膜、圓偏光板、觸控感測器之任一層之至少一面形成之遮光圖案。[Flexible display device] The present invention also provides a flexible display device equipped with the optical film of the present invention. The optical film of the present invention is preferably used as a front panel in a flexible display device, and the front panel is sometimes called a window film. The flexible display device includes a laminate for a flexible display device and an organic EL display panel. The laminate for a flexible display device is arranged on the viewing side of the organic EL display panel and is configured to be flexible. The laminate for a flexible display device may contain the optical film (window film) of the present invention, a circular polarizer, and a touch sensor. The order of these layers is in any order, and it is preferable to use the window film, Circular polarizing plate, touch sensor or window film, touch sensor, circular polarizing plate are laminated in sequence. If there is a circular polarizer on the visible side of the touch sensor, it is difficult to see the pattern of the touch sensor, and the visibility of the displayed image becomes better, which is better. Each member can be laminated using adhesives, adhesives, etc. In addition, it may be provided with a light-shielding pattern formed on at least one surface of any layer of the window film, the circular polarizer, and the touch sensor.

[偏光板] 本發明之可撓式顯示裝置可進而具備偏光板,較佳為圓偏光板。圓偏光板係具有藉由於直線偏光板上積層λ/4相位差板而僅使右旋圓偏振光或左旋圓偏振光成分透過之功能的功能層。例如係為了以下目的而使用:將外界光轉換為右旋圓偏振光,將被有機EL面板反射而成為左旋圓偏振光之外界光遮斷,僅使有機EL之發光成分透過,藉此抑制反射光之影響從而易於觀看圖像。為了達成圓偏振光功能,直線偏光板之吸收軸與λ/4相位差板之遲相軸於理論上必須為45度,實用上為45±10度。直線偏光板與λ/4相位差板並非必須鄰接積層,吸收軸與遲相軸之關係只要滿足上述範圍即可。較佳為於所有波長中達成完全之圓偏振光,但於實用上並非必須如此,故而本發明之圓偏光板亦包含橢圓偏光板。如下情形亦較佳:於直線偏光板之視認側進而積層λ/4相位差膜,使出射光成為圓偏振光,藉此提高佩戴偏光太陽眼鏡之狀態下之視認性。[Polarizer] The flexible display device of the present invention may further include a polarizing plate, preferably a circular polarizing plate. The circular polarizing plate is a functional layer that has a function of transmitting only right-handed circularly polarized light or left-handed circularly polarized light components by laminating a λ/4 retardation plate on the linear polarizing plate. For example, it is used for the following purposes: converting external light into right-handed circularly polarized light, blocking the outer boundary light of the left-handed circularly polarized light reflected by the organic EL panel, and allowing only the light-emitting components of the organic EL to pass through, thereby suppressing reflection The effect of light makes it easy to view the image. In order to achieve the circularly polarized light function, the absorption axis of the linear polarizer and the retardation axis of the λ/4 retardation plate must be 45 degrees in theory, and 45±10 degrees in practice. The linear polarizing plate and the λ/4 retardation plate do not necessarily have to be laminated adjacent to each other, and the relationship between the absorption axis and the slow axis only needs to satisfy the above-mentioned range. It is preferable to achieve complete circularly polarized light in all wavelengths, but this is not necessary in practice. Therefore, the circular polarizing plate of the present invention also includes an elliptical polarizing plate. It is also preferable to laminate a λ/4 retardation film on the visibility side of the linear polarizer to make the emitted light circularly polarized light, thereby improving the visibility when wearing polarized sunglasses.

直線偏光板係具有使於透射軸方向振動之光通過,但將與其垂直之振動成分之偏光遮斷之功能的功能層。上述直線偏光板可為直線偏光元件單獨之構成或具備直線偏光元件及貼附於其至少一面之保護膜之構成。上述直線偏光板之厚度可為200 μm以下,較佳為0.5~100 μm。若直線偏光板之厚度為上述範圍,則存在柔軟性不易下降之傾向。The linear polarizer is a functional layer that has the function of passing light that vibrates in the direction of the transmission axis, but blocking the polarization of the vibrating component perpendicular to it. The above-mentioned linear polarizing plate may be a composition of a linear polarizing element alone or a composition having a linear polarizing element and a protective film attached to at least one surface thereof. The thickness of the linear polarizer may be 200 μm or less, preferably 0.5-100 μm. If the thickness of the linear polarizing plate is in the above range, the flexibility tends to be less likely to decrease.

上述直線偏光元件可為藉由將聚乙烯醇(以下亦稱為「PVA」)系膜進行染色、延伸而製造之膜型偏光元件。於藉由延伸而配向之PVA系膜中吸附碘等二色性色素,或於二色性色素吸附於PVA中之狀態下進行延伸,藉此使二色性色素配向,發揮偏光性能。於上述膜型偏光元件之製造中,可另外具有膨潤、藉由硼酸之交聯、藉由水溶液之洗淨、乾燥等步驟。延伸或染色步驟可以PVA系膜單獨進行,亦可於與如聚對苯二甲酸乙二酯之其他膜積層之狀態下進行。所使用之PVA系膜之厚度較佳為10~100 μm,延伸倍率較佳為2~10倍。The linear polarizing element may be a film-type polarizing element manufactured by dyeing and stretching a polyvinyl alcohol (hereinafter also referred to as "PVA") film. Dichroic pigments such as iodine are adsorbed on the PVA-based film aligned by stretching, or stretched while the dichroic pigments are adsorbed in the PVA, thereby aligning the dichroic pigments and exhibiting polarization performance. In the manufacture of the above-mentioned film-type polarizing element, there may be additional steps such as swelling, cross-linking with boric acid, washing with aqueous solution, and drying. The stretching or dyeing step can be carried out with a PVA-based film alone, or in the state of being laminated with other films such as polyethylene terephthalate. The thickness of the PVA-based film used is preferably 10-100 μm, and the stretching ratio is preferably 2-10 times.

進而作為上述偏光元件之其他一例,可例舉塗佈液晶偏光組合物而形成之液晶塗佈型偏光元件。上述液晶偏光組合物可含有液晶性化合物及二色性色素化合物。上述液晶性化合物只要具有顯示液晶狀態之性質即可,尤其若具有層列相等高次之配向狀態,則可發揮較高之偏光性能,故而較佳。又,液晶性化合物具有聚合性官能基之情形時亦較佳。 上述二色性色素係與上述液晶化合物一同配向並顯示二色性之色素,可具有聚合性官能基,又,二色性色素自身可具有液晶性。液晶偏光組合物中之任一化合物具有聚合性官能基。Furthermore, as another example of the above-mentioned polarizing element, a liquid crystal coating type polarizing element formed by applying a liquid crystal polarizing composition can be exemplified. The above-mentioned liquid crystal polarizing composition may contain a liquid crystal compound and a dichroic dye compound. The above-mentioned liquid crystalline compound only needs to have the property of displaying a liquid crystal state, especially if it has an alignment state of the order of the order of smectic alignment, it can exhibit higher polarization performance, so it is preferable. In addition, it is also preferable when the liquid crystal compound has a polymerizable functional group. The dichroic dye is a dye that is aligned with the liquid crystal compound and exhibits dichroism, and may have a polymerizable functional group, and the dichroic dye itself may have liquid crystallinity. Any compound in the liquid crystal polarizing composition has a polymerizable functional group.

上述液晶偏光組合物可進而含有起始劑、溶劑、分散劑、調平劑、穩定劑、界面活性劑、交聯劑、矽烷偶合劑等。The above-mentioned liquid crystal polarizing composition may further contain an initiator, a solvent, a dispersant, a leveling agent, a stabilizer, a surfactant, a crosslinking agent, a silane coupling agent, and the like.

上述液晶偏光層係藉由如下方式製造:於配向膜上塗佈液晶偏光組合物而形成液晶偏光層。液晶偏光層較之膜型偏光元件,可使厚度形成為較薄。上述液晶偏光層之厚度較佳為0.5~10 μm,更佳可為1~5 μm。The above-mentioned liquid crystal polarizing layer is manufactured by coating a liquid crystal polarizing composition on an alignment film to form a liquid crystal polarizing layer. The liquid crystal polarizing layer can be formed to be thinner than the film-type polarizing element. The thickness of the above-mentioned liquid crystal polarizing layer is preferably 0.5-10 μm, more preferably 1-5 μm.

上述配向膜例如可藉由如下方式製造:於基材上塗佈配向膜形成組合物,藉由摩擦、偏光照射等而賦予配向性。上述配向膜形成組合物除含有配向劑外,亦可含有溶劑、交聯劑、起始劑、分散劑、調平劑、矽烷偶合劑等。作為上述配向劑,例如可例舉:聚乙烯醇類、聚丙烯酸酯類、聚醯胺酸類、聚醯亞胺類。於應用光配向之情形時,較佳為使用含有肉桂酸酯基之配向劑。用作上述配向劑之高分子之重量平均分子量例如可為10,000~1,000,000左右。作為上述配向膜之厚度,就配向限制力之觀點而言,較佳為5~10,000 nm,更佳為10~500 nm。The above-mentioned alignment film can be manufactured, for example, by coating an alignment film forming composition on a substrate, and imparting alignment properties by rubbing, polarized light irradiation, or the like. In addition to the alignment agent, the aforementioned alignment film forming composition may also contain a solvent, a crosslinking agent, an initiator, a dispersant, a leveling agent, a silane coupling agent, and the like. Examples of the alignment agent include polyvinyl alcohols, polyacrylates, polyamides, and polyimines. In the case of applying optical alignment, it is preferable to use an alignment agent containing a cinnamate group. The weight average molecular weight of the polymer used as the above-mentioned alignment agent can be, for example, about 10,000 to 1,000,000. The thickness of the above-mentioned alignment film is preferably 5 to 10,000 nm, and more preferably 10 to 500 nm from the viewpoint of the alignment restriction force.

上述液晶偏光層可自基材剝離並轉印而積層,亦可直接積層上述基材。上述基材擔任作為保護膜或相位差板、視窗膜之透明基材之職責之情形時亦較佳。The liquid crystal polarizing layer may be peeled from the base material and transferred to be laminated, or the base material may be directly laminated. The above-mentioned base material is also preferred when it functions as a transparent base material for a protective film, a phase difference plate, or a window film.

作為上述保護膜,只要為透明之高分子膜即可,具體而言,作為所使用之高分子膜,可例舉:聚乙烯、聚丙烯、聚甲基戊烯、具有含有降𦯉烯或環烯烴之單體之單元之環烯烴系衍生物等聚烯烴類、二乙醯基纖維素、三乙醯基纖維素、丙醯基纖維素等(改性)纖維素類、甲基丙烯酸甲酯(共)聚合物等丙烯酸類、苯乙烯(共)聚合物等聚苯乙烯類、丙烯腈-丁二烯-苯乙烯共聚物類、丙烯腈-苯乙烯共聚物類、乙烯-乙酸乙烯酯共聚物類、聚氯乙烯類、聚偏二氯乙烯類、聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯、聚碳酸酯、聚芳酯等聚酯類、尼龍等聚醯胺類、聚醯亞胺類、聚醯胺醯亞胺類、聚醚醯亞胺類、聚醚碸類、聚碸類、聚乙烯醇類、聚乙烯醇縮醛類、聚胺基甲酸酯類、環氧樹脂類等之膜,就透明性及耐熱性優異之方面而言,較佳可例舉聚醯胺、聚醯胺醯亞胺、聚醯亞胺、聚酯、烯烴、丙烯酸或纖維素系之膜。該等高分子可分別單獨使用或混合兩種以上使用。該等膜可於未延伸之狀態下使用,或作為經單軸或雙軸延伸之膜而使用。較佳為纖維素系膜、烯烴系膜、丙烯酸系膜、聚酯系膜。可為將環氧樹脂等陽離子硬化組合物或丙烯酸酯等自由基硬化組合物塗佈並硬化而獲得之塗佈型之保護膜。視需要可含有塑化劑、紫外線吸收劑、紅外線吸收劑、如顏料或染料之著色劑、螢光增白劑、分散劑、熱穩定劑、光穩定劑、抗靜電劑、抗氧化劑、潤滑劑、溶劑等。上述保護膜之厚度較佳為200 μm以下,更佳為1~100 μm。若上述保護膜之厚度為上述範圍,則保護膜之柔軟性不易下降。As the above-mentioned protective film, it is sufficient as long as it is a transparent polymer film. Specifically, as the polymer film used, there may be mentioned: polyethylene, polypropylene, polymethylpentene, and a Cycloolefin derivatives such as olefin monomer units, polyolefins, diacetyl cellulose, triacetyl cellulose, propylene cellulose, etc. (modified) cellulose, methyl methacrylate Acrylics such as (co)polymers, polystyrenes such as styrene (co)polymers, acrylonitrile-butadiene-styrene copolymers, acrylonitrile-styrene copolymers, ethylene-vinyl acetate copolymers Materials, polyvinyl chloride, polyvinylidene chloride, polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polycarbonate, polyarylate, etc. Polyamides such as esters and nylons, polyimines, polyimines, polyetherimines, polyethers, polyvinyls, polyvinyl alcohols, and polyvinyl acetals Films such as polyamides, polyurethanes, epoxy resins, etc., in terms of excellent transparency and heat resistance, preferably, polyamide, polyimide, polyimide, Polyester, olefin, acrylic or cellulosic film. These polymers can be used alone or in combination of two or more. These films can be used in an unstretched state, or used as a uniaxially or biaxially stretched film. Preferred are cellulose-based films, olefin-based films, acrylic-based films, and polyester-based films. It can be a coating type protective film obtained by coating and curing a cationic curing composition such as epoxy resin or a radical curing composition such as acrylate. If necessary, it may contain plasticizers, ultraviolet absorbers, infrared absorbers, coloring agents such as pigments or dyes, fluorescent brighteners, dispersants, heat stabilizers, light stabilizers, antistatic agents, antioxidants, and lubricants , Solvents, etc. The thickness of the protective film is preferably 200 μm or less, more preferably 1-100 μm. If the thickness of the protective film is in the above range, the flexibility of the protective film will not easily decrease.

上述λ/4相位差板係對與入射光之行進方向正交之方向,即膜之面內方向提供λ/4相位差之膜。上述λ/4相位差板可為藉由將纖維素系膜、烯烴系膜、聚碳酸酯系膜等高分子膜延伸而製造之延伸型相位差板。上述λ/4相位差板視需要可含有相位差調整劑、塑化劑、紫外線吸收劑、紅外線吸收劑、如顏料或染料之著色劑、螢光增白劑、分散劑、熱穩定劑、光穩定劑、抗靜電劑、抗氧化劑、潤滑劑、溶劑等。上述延伸型相位差板之厚度較佳為200 μm以下,更佳為1~100 μm。若厚度為上述範圍,則存在膜之柔軟性不易下降之傾向。The above-mentioned λ/4 retardation plate is a film that provides a λ/4 retardation in the direction orthogonal to the traveling direction of the incident light, that is, the in-plane direction of the film. The above-mentioned λ/4 retardation plate may be a stretched retardation plate manufactured by stretching a polymer film such as a cellulose-based film, an olefin-based film, or a polycarbonate-based film. The above-mentioned λ/4 retardation plate may contain retardation adjusters, plasticizers, ultraviolet absorbers, infrared absorbers, coloring agents such as pigments or dyes, fluorescent brighteners, dispersants, heat stabilizers, light Stabilizers, antistatic agents, antioxidants, lubricants, solvents, etc. The thickness of the above-mentioned extended phase difference plate is preferably 200 μm or less, more preferably 1-100 μm. If the thickness is in the above range, there is a tendency that the flexibility of the film will not easily decrease.

進而作為上述λ/4相位差板之其他一例,可例舉塗佈液晶組合物而形成之液晶塗佈型相位差板。上述液晶組合物含有具有顯示向列型、膽固醇狀、層列型等液晶狀態之性質之液晶性化合物。液晶組合物中之包括液晶性化合物之任一化合物具有聚合性官能基。上述液晶組合物可進而含有起始劑、溶劑、分散劑、調平劑、穩定劑、界面活性劑、交聯劑、矽烷偶合劑等。上述液晶塗佈型相位差板可以與上述液晶偏光層中之記載相同之方式藉由如下方法製造:於配向膜上塗佈液晶組合物並硬化而形成液晶相位差層。液晶塗佈型相位差板較之延伸型相位差板,可使厚度形成為較薄。上述液晶偏光層之厚度較佳為0.5~10 μm,更佳為1~5 μm。上述液晶塗佈型相位差板可自基材剝離並轉印而積層,亦可直接積層上述基材。上述基材擔任作為保護膜或相位差板、視窗膜之透明基材之職責之情形時亦較佳。Furthermore, as another example of the above-mentioned λ/4 retardation plate, a liquid crystal coating type retardation plate formed by applying a liquid crystal composition can be exemplified. The above-mentioned liquid crystal composition contains a liquid crystal compound having the property of displaying liquid crystal states such as nematic, cholesteric, smectic, and the like. Any compound including a liquid crystal compound in the liquid crystal composition has a polymerizable functional group. The above-mentioned liquid crystal composition may further contain an initiator, a solvent, a dispersant, a leveling agent, a stabilizer, a surfactant, a crosslinking agent, a silane coupling agent, and the like. The liquid crystal coating type retardation plate can be manufactured by the following method in the same manner as described in the liquid crystal polarizing layer: a liquid crystal composition is coated on an alignment film and cured to form a liquid crystal retardation layer. The liquid crystal coating type retardation plate can be made thinner than the extension type retardation plate. The thickness of the above-mentioned liquid crystal polarizing layer is preferably 0.5-10 μm, more preferably 1-5 μm. The liquid crystal coating type retardation plate may be peeled from the base material and transferred to be laminated, or the base material may be directly laminated. The above-mentioned base material is also preferred when it functions as a transparent base material for a protective film, a phase difference plate, or a window film.

通常,波長越短顯示越大之雙折射,波長越長顯示越小之雙折射的材料較多。於該情形時,無法於整個可見光區域達成λ/4相位差,故而設計為對視感度較高之560 nm附近成為λ/4之面內相位差,即較佳為100~180 nm,更佳為130~150 nm之面內相位差之情形較多。使用有具有與通常相反之雙折射率波長分散特性之材料之逆分散λ/4相位差板於可使視認性變得良好之方面而言較佳。作為此種材料,於延伸型相位差板之情形時,使用日本專利特開2007-232873號公報等中記載者,於液晶塗佈型相位差板之情形時,使用日本專利特開2010-30979號公報中記載者之情形時亦較佳。Generally, the shorter the wavelength, the greater the birefringence, and the longer the wavelength, the smaller the birefringence. In this case, the λ/4 phase difference cannot be achieved in the entire visible light region, so it is designed to have a λ/4 in-plane phase difference near 560 nm where the visual sensitivity is higher, which is preferably 100-180 nm, more preferably There are many cases where the in-plane phase difference is between 130 and 150 nm. It is preferable to use a reverse dispersion λ/4 retardation plate using a material having a birefringence wavelength dispersion characteristic opposite to the usual one in terms of improving visibility. As such a material, in the case of the extension type retardation plate, the one described in Japanese Patent Laid-Open No. 2007-232873 etc. is used, and in the case of the liquid crystal coating type retardation plate, the Japanese Patent Laid-Open No. 2010-30979 is used. It is also better when the situation is recorded in the bulletin.

又,作為其他方法,亦已知藉由組合λ/2相位差板而獲得寬頻帶λ/4相位差板之技術(日本專利特開平10-90521號公報)。λ/2相位差板亦藉由與λ/4相位差板相同之材料及方法而製造。延伸型相位差板與液晶塗佈型相位差板之組合為任意,而於任一情形時均使用液晶塗佈型相位差板之情形時,於可使厚度變得較薄之方面而言較佳。In addition, as another method, a technique of obtaining a wide-band λ/4 retardation plate by combining a λ/2 retardation plate is also known (Japanese Patent Laid-Open No. 10-90521). The λ/2 retardation plate is also manufactured by the same materials and methods as the λ/4 retardation plate. The combination of the extension type retardation plate and the liquid crystal coating type retardation plate is arbitrary, and when the liquid crystal coating type retardation plate is used in either case, it is relatively thin in terms of making the thickness thinner. good.

已知為提高斜方向之視認性而於上述圓偏光板積層正C板之方法(日本專利特開2014-224837號公報)。正C板可為液晶塗佈型相位差板,亦可為延伸型相位差板。該相位差板之厚度方向之相位差較佳為-200~-20 nm,更佳為-140~-40 nm。A method of laminating a positive C plate on the above-mentioned circular polarizing plate in order to improve the visibility in the oblique direction is known (Japanese Patent Laid-Open No. 2014-224837). The positive C plate can be a liquid crystal coating type retardation plate or an extended type retardation plate. The retardation in the thickness direction of the retardation plate is preferably -200 to -20 nm, more preferably -140 to -40 nm.

[觸控感測器] 本發明之可撓式顯示裝置可進而具備觸控感測器。觸控感測器係用作輸入機構。作為觸控感測器,提出有電阻膜方式、表面聲波方式、紅外線方式、電磁感應方式、靜電電容方式等各種樣式,可為任一種方式,較佳為靜電電容方式。靜電電容方式觸控感測器係劃分為活性區域及位於上述活性區域之外廓部之非活性區域。活性區域係顯示面板中顯示畫面之區域即顯示部所對應之區域,係感知使用者之觸摸之區域,非活性區域係顯示裝置中未顯示畫面之區域即非顯示部所對應之區域。觸控感測器可包含:具有可撓特性之基板;上述基板之活性區域中形成之感知圖案;及形成於上述基板之非活性區域且用以經由上述感知圖案與焊墊部而與外部之驅動電路連接之各感測線。作為具有可撓特性之基板,可使用與上述高分子膜相同之材料。觸控感測器之基板中,其韌性(toughness)為2,000 MPa%以上者就觸控感測器之裂痕抑制之方面而言較佳。韌性更佳可為2,000~30,000 MPa%。此處,韌性係定義為利用高分子材料之拉伸試驗而獲得之應力(MPa)-應變(%)曲線(Stress-strain curve)中至破壞點為止之曲線之下部面積。[Touch Sensor] The flexible display device of the present invention may further include a touch sensor. The touch sensor is used as an input mechanism. As a touch sensor, various styles such as a resistive film method, a surface acoustic wave method, an infrared method, an electromagnetic induction method, and an electrostatic capacitance method have been proposed. Any method may be used, and an electrostatic capacitance method is preferred. The capacitive touch sensor is divided into an active area and an inactive area located outside the active area. The active area is the area corresponding to the display part of the display panel, which is the area corresponding to the user's touch, and the inactive area is the area corresponding to the non-display part of the display device where no picture is displayed. The touch sensor may include: a substrate with flexible characteristics; a sensing pattern formed in the active area of the substrate; and an inactive area formed on the substrate and used to communicate with the outside through the sensing pattern and the pad part. Each sensing line connected to the drive circuit. As a substrate with flexibility, the same material as the above-mentioned polymer film can be used. Among the substrates of the touch sensor, the toughness of 2,000 MPa% or more is better in terms of crack suppression of the touch sensor. The toughness can be 2,000~30,000 MPa% better. Here, the toughness system is defined as the area under the curve up to the failure point in the stress-strain curve obtained by the tensile test of the polymer material.

上述感知圖案可具備形成於第1方向之第1圖案及形成於第2方向之第2圖案。第1圖案與第2圖案配置於相互不同之方向。第1圖案及第2圖案形成於同一層,為感知觸摸地點,各個圖案必須電性連接。第1圖案係各單元圖案經由接頭而相互連接之形態,而第2圖案係成為各單元圖案相互分離為島嶼形態之構造,故而為將第2圖案電性連接,需要另外之橋接電極。作為用以電性連接第2圖案之電極,可應用眾所周知之透明電極素材。作為該透明電極素材,例如可例舉:銦錫氧化物(ITO)、銦鋅氧化物(IZO)、氧化鋅(ZnO)、銦鋅錫氧化物(IZTO)、銦鎵鋅氧化物(IGZO)、鎘錫氧化物(CTO)、PEDOT(poly(3,4-ethylenedioxythiophene),聚(3,4-伸乙二氧基噻吩))、奈米碳管(CNT)、石墨烯、金屬線等,該等可單獨或混合使用兩種以上。作為該透明電極素材,較佳可使用ITO。金屬線中所使用之金屬並無特別限定,例如可例舉:銀、金、鋁、銅、鐵、鎳、鈦、硒、鉻等。該等可單獨或混合使用兩種以上。The aforementioned sensing pattern may include a first pattern formed in the first direction and a second pattern formed in the second direction. The first pattern and the second pattern are arranged in mutually different directions. The first pattern and the second pattern are formed on the same layer. In order to sense the touch location, each pattern must be electrically connected. The first pattern is a form in which each unit pattern is connected to each other via a joint, and the second pattern is a structure where each unit pattern is separated into an island form. Therefore, in order to electrically connect the second pattern, another bridge electrode is required. As the electrode for electrically connecting the second pattern, a well-known transparent electrode material can be used. Examples of the transparent electrode material include indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), and indium gallium zinc oxide (IGZO) , Cadmium tin oxide (CTO), PEDOT (poly(3,4-ethylenedioxythiophene), poly(3,4-ethylenedioxythiophene)), carbon nanotube (CNT), graphene, metal wire, etc., These can be used alone or in combination of two or more. As the transparent electrode material, ITO can be preferably used. The metal used in the metal wire is not particularly limited, and examples thereof include silver, gold, aluminum, copper, iron, nickel, titanium, selenium, and chromium. These can be used alone or in combination of two or more.

橋接電極可於感知圖案上部經由絕緣層而形成於上述絕緣層上部,可於基板上形成橋接電極,於其上形成絕緣層及感知圖案。上述橋接電極可藉由與感知圖案相同之素材而形成,亦可藉由鉬、銀、鋁、銅、鈀、金、鉑、鋅、錫、鈦或該等中之兩種以上之合金等金屬而形成。第1圖案與第2圖案必須電性絕緣,故而於感知圖案與橋接電極之間形成絕緣層。絕緣層可僅形成於第1圖案之接頭與橋接電極之間,亦可形成為覆蓋感知圖案整體之層。於形成為覆蓋感知圖案整體之層之情形時,橋接電極可經由形成於絕緣層之接觸孔而連接第2圖案。The bridging electrode can be formed on the upper part of the insulating layer via the insulating layer on the upper part of the sensing pattern, and the bridging electrode can be formed on the substrate, and the insulating layer and the sensing pattern can be formed thereon. The above-mentioned bridge electrode can be formed by the same material as the sensing pattern, or by metal such as molybdenum, silver, aluminum, copper, palladium, gold, platinum, zinc, tin, titanium, or an alloy of two or more of these And formed. The first pattern and the second pattern must be electrically insulated, so an insulating layer is formed between the sensing pattern and the bridge electrode. The insulating layer may be formed only between the joints of the first pattern and the bridging electrodes, or may be formed as a layer covering the entire sensing pattern. When it is formed as a layer covering the entire sensing pattern, the bridge electrode may be connected to the second pattern via a contact hole formed in the insulating layer.

上述觸控感測器可進而於基板與電極之間含有光學調節層,作為用以適宜補償形成圖案之圖案區域與未形成圖案之非圖案區域間之透過率之差,具體而言因該等區域中之折射率之差而誘發之透光率之差的機構。上述光學調節層可含有無機絕緣物質或有機絕緣物質。光學調節層可將含有光硬化性有機黏合劑及溶劑之光硬化組合物塗佈於基板上而形成。上述光硬化組合物可進而含有無機粒子。藉由上述無機粒子,可使光學調節層之折射率上升。 上述光硬化性有機黏合劑例如可含有丙烯酸酯系單體、苯乙烯系單體、羧酸系單體等各單體之共聚物。上述光硬化性有機黏合劑例如可為含有含環氧基之重複單元、丙烯酸酯重複單元、羧酸重複單元等相互不同之各重複單元之共聚物。 作為上述無機粒子,例如可例舉:氧化鋯粒子、氧化鈦粒子、氧化鋁粒子等。上述光硬化組合物亦可進而含有光聚合起始劑、聚合性單體、硬化助劑等各添加劑。The above-mentioned touch sensor may further include an optical adjustment layer between the substrate and the electrode, as a suitable compensation for the difference in transmittance between the patterned patterned area and the unpatterned non-patterned area, specifically because of these The mechanism of the difference in light transmittance induced by the difference in refractive index in the area. The above-mentioned optical adjustment layer may contain an inorganic insulating material or an organic insulating material. The optical adjustment layer can be formed by coating a photo-curing composition containing a photo-curing organic binder and a solvent on a substrate. The above-mentioned photocurable composition may further contain inorganic particles. The above-mentioned inorganic particles can increase the refractive index of the optical adjustment layer. The photocurable organic adhesive may contain, for example, copolymers of monomers such as acrylate-based monomers, styrene-based monomers, and carboxylic acid-based monomers. The photocurable organic adhesive may be, for example, a copolymer containing repeating units that are different from each other, such as epoxy-containing repeating units, acrylate repeating units, and carboxylic acid repeating units. Examples of the above-mentioned inorganic particles include zirconia particles, titanium oxide particles, and alumina particles. The above-mentioned photocurable composition may further contain various additives such as a photopolymerization initiator, a polymerizable monomer, and a curing aid.

[接著層] 形成上述可撓式顯示裝置用積層體之視窗膜、偏光板、觸控感測器等各層以及構成各層之直線偏光板、λ/4相位差板等膜構件可藉由接著劑而接著。作為接著劑,可使用水系接著劑、有機溶劑系接著劑、無溶劑系接著劑、固體接著劑、溶劑揮散型接著劑、濕氣硬化型接著劑、加熱硬化型接著劑、厭氧硬化型接著劑、水系溶劑揮散型接著劑、活性能量線硬化型接著劑、硬化劑混合型接著劑、熱熔融型接著劑、感壓型接著劑、感壓型黏著劑、再濕型接著劑等通常所使用者。其中,常使用水系溶劑揮散型接著劑、活性能量線硬化型接著劑、黏著劑。接著層之厚度可根據所要求之接著力等而適宜調節,較佳為0.01~500 μm,更佳為0.1~300 μm。可於上述可撓式圖像顯示裝置用積層體中存在複數個接著層,各自之厚度及所使用之接著劑之種類可相同,亦可不同。[Next layer] The window film, polarizing plate, touch sensor and other layers forming the laminated body for the flexible display device, and the film members such as the linear polarizing plate and λ/4 phase difference plate constituting each layer can be bonded by an adhesive. As the adhesive, water-based adhesives, organic solvent-based adhesives, solvent-free adhesives, solid adhesives, solvent-volatile adhesives, moisture-curing adhesives, heat-curing adhesives, and anaerobic-curing adhesives can be used. Adhesives, water-based solvent volatile adhesives, active energy ray hardening adhesives, hardener mixed adhesives, hot melt adhesives, pressure sensitive adhesives, pressure sensitive adhesives, rewetting adhesives, etc. user. Among them, water-based solvent volatile adhesives, active energy ray hardening adhesives, and adhesives are often used. The thickness of the subsequent layer can be appropriately adjusted according to the required adhesive force, etc., preferably 0.01-500 μm, more preferably 0.1-300 μm. There may be a plurality of adhesive layers in the above-mentioned laminate for flexible image display devices, and the thickness of each and the type of adhesive used may be the same or different.

作為上述水系溶劑揮散型接著劑,可將聚乙烯醇系聚合物、澱粉等水溶性聚合物、乙烯-乙酸乙烯酯系乳液、苯乙烯-丁二烯系乳液等水分散狀態之聚合物用作主劑聚合物。除水、上述主劑聚合物外,亦可調配交聯劑、矽烷系化合物、離子性化合物、交聯觸媒、抗氧化劑、染料、顏料、無機填料、有機溶劑等。於藉由上述水系溶劑揮散型接著劑而接著之情形時,將上述水系溶劑揮散型接著劑注入被接著層間並貼合被接著層後,使之乾燥,藉此可賦予接著性。使用上述水系溶劑揮散型接著劑之情形時之接著層之厚度可為0.01~10μm,較佳可為0.1~1 μm。於複數層之形成中使用上述水系溶劑揮散型接著劑之情形時,各個層之厚度及上述接著劑之種類可相同,亦可不同。As the above-mentioned aqueous solvent volatile adhesive, water-dispersed polymers such as polyvinyl alcohol-based polymers, starches and other water-soluble polymers, ethylene-vinyl acetate-based emulsions, styrene-butadiene-based emulsions, and other water-dispersed polymers can be used as Main agent polymer. In addition to water and the above-mentioned main agent polymer, crosslinking agents, silane-based compounds, ionic compounds, crosslinking catalysts, antioxidants, dyes, pigments, inorganic fillers, organic solvents, etc. can also be formulated. In the case of bonding with the water-based solvent-volatile adhesive, the water-based solvent-volatile adhesive is injected between the layers to be bonded and the bonded layers are bonded, and then dried to impart adhesiveness. In the case of using the above-mentioned water-based solvent-volatile adhesive, the thickness of the adhesive layer may be 0.01-10 μm, preferably 0.1-1 μm. When the above-mentioned water-based solvent-volatile adhesive is used in the formation of multiple layers, the thickness of each layer and the type of the above-mentioned adhesive may be the same or different.

上述活性能量線硬化型接著劑可藉由含有照射活性能量線而形成接著劑層之反應性材料之活性能量線硬化組合物之硬化而形成。上述活性能量線硬化組合物可含有與關於硬塗組合物所記載之化合物相同之自由基聚合性化合物及陽離子聚合性化合物之至少一種聚合物。作為上述自由基聚合性化合物,可使用與關於硬塗組合物所記載之化合物相同種類者。作為接著層中所使用之自由基聚合性化合物,較佳為具有丙烯醯基之化合物。為降低作為接著劑組合物之黏度,該組合物含有單官能之化合物之情形時亦較佳。The active energy ray curable adhesive can be formed by curing an active energy ray curable composition containing a reactive material that forms an adhesive layer by irradiating active energy rays. The active energy ray hardening composition may contain at least one polymer of the same radically polymerizable compound and cationically polymerizable compound as the compound described in the hard coat composition. As the above-mentioned radically polymerizable compound, the same type as the compound described in the hard coat composition can be used. The radically polymerizable compound used in the adhesive layer is preferably a compound having an acryl group. In order to reduce the viscosity of the adhesive composition, it is also preferable when the composition contains a monofunctional compound.

作為上述陽離子聚合性化合物,可使用與關於硬塗組合物所記載之化合物相同種類者。作為活性能量線硬化組合物中所使用之陽離子聚合性化合物,更佳為環氧化合物。為降低接著劑組合物之黏度,該組合物含有單官能之化合物作為反應性稀釋劑之情形時亦較佳。As the above-mentioned cationically polymerizable compound, the same type as the compound described in the hard coat composition can be used. The cationic polymerizable compound used in the active energy ray curing composition is more preferably an epoxy compound. In order to reduce the viscosity of the adhesive composition, it is also preferable when the composition contains a monofunctional compound as a reactive diluent.

活性能量線組合物可進而含有聚合起始劑。作為聚合起始劑,可例舉:自由基聚合起始劑、陽離子聚合起始劑、自由基及陽離子聚合起始劑等,該等可適宜選擇使用。該等聚合起始劑係藉由活性能量線照射及加熱之至少一種而分解,產生自由基或陽離子,從而進行自由基聚合與陽離子聚合者。可使用硬塗組合物之記載中,可藉由活性能量線照射而使自由基聚合或陽離子聚合中之至少任一者開始之起始劑。The active energy ray composition may further contain a polymerization initiator. The polymerization initiator may, for example, be a radical polymerization initiator, a cationic polymerization initiator, a radical and cationic polymerization initiator, etc., and these can be appropriately selected and used. These polymerization initiators are decomposed by at least one of active energy ray irradiation and heating to generate free radicals or cations, thereby performing radical polymerization and cationic polymerization. In the description that the hard coat composition can be used, an initiator that can start at least any one of radical polymerization or cationic polymerization by active energy ray irradiation.

上述活性能量線硬化組合物可進而含有離子捕捉劑、抗氧化劑、鏈轉移劑、密接賦予劑、熱塑性樹脂、填充劑、流動黏度調整劑、塑化劑、消泡劑溶劑、添加劑、溶劑。於藉由上述活性能量線硬化型接著劑而接著2個被接著層之情形時,將上述活性能量線硬化組合物塗佈於被接著層之任一者或兩者後貼合,透過任一個被接著層或兩個被接著層照射活性能量線而使該組合物硬化,藉此可接著。使用上述活性能量線硬化型接著劑之情形時之接著層之厚度較佳為0.01~20 μm,更佳為0.1~10 μm。於複數層之形成中使用上述活性能量線硬化型接著劑之情形時,各個層之厚度及所使用之接著劑之種類可相同,亦可不同。The active energy ray hardening composition may further contain ion scavengers, antioxidants, chain transfer agents, adhesion imparting agents, thermoplastic resins, fillers, flow viscosity modifiers, plasticizers, defoamer solvents, additives, and solvents. When using the active energy ray curable adhesive to adhere two layers to be bonded, apply the active energy ray curable composition to either or both of the layers to be adhered, and then bond them through either The bonded layer or two bonded layers are irradiated with active energy rays to harden the composition, thereby enabling bonding. In the case of using the active energy ray-curable adhesive, the thickness of the adhesive layer is preferably 0.01-20 μm, more preferably 0.1-10 μm. When the above-mentioned active energy ray-curable adhesive is used in the formation of multiple layers, the thickness of each layer and the type of adhesive used may be the same or different.

作為上述黏著劑,根據主劑聚合物,分類為丙烯酸系黏著劑、胺基甲酸酯系黏著劑、橡膠系黏著劑、聚矽氧系黏著劑等,可使用該等之任一者。黏著劑中除主劑聚合物外,亦可調配交聯劑、矽烷系化合物、離子性化合物、交聯觸媒、抗氧化劑、黏著賦予劑、塑化劑、染料、顏料、無機填料等。使構成上述黏著劑之各成分溶解、分散於溶劑,獲得黏著劑組合物,將該黏著劑組合物塗佈於基材上後加以乾燥,藉此形成黏著層(接著層)。黏著層可直接形成,亦可將另外形成於基材者進行轉印。為覆蓋接著前之黏著面,使用離型膜之情形時亦較佳。使用上述黏著劑之情形時之接著層之厚度較佳為1~500 μm,更佳為2~300 μm。於複數層之形成中使用上述黏著劑之情形時,各個層之厚度及所使用之黏著劑之種類可相同,亦可不同。The above-mentioned adhesives are classified into acrylic adhesives, urethane-based adhesives, rubber-based adhesives, silicone-based adhesives, etc. according to the main agent polymer, and any of these can be used. In addition to the main agent polymer, the adhesive can also be blended with crosslinking agents, silane compounds, ionic compounds, crosslinking catalysts, antioxidants, adhesion imparting agents, plasticizers, dyes, pigments, inorganic fillers, etc. The components constituting the adhesive are dissolved and dispersed in a solvent to obtain an adhesive composition, and the adhesive composition is coated on a substrate and dried to form an adhesive layer (adhesive layer). The adhesive layer can be formed directly, or the one formed on the substrate can be transferred. In order to cover the adhesive surface before bonding, it is also better to use a release film. In the case of using the aforementioned adhesive, the thickness of the adhesive layer is preferably 1 to 500 μm, more preferably 2 to 300 μm. When the above-mentioned adhesive is used in the formation of multiple layers, the thickness of each layer and the type of adhesive used may be the same or different.

[遮光圖案] 上述遮光圖案可用作上述可撓式圖像顯示裝置之邊框或外殼之至少一部分。藉由遮光圖案而將配置於上述可撓式圖像顯示裝置之邊緣部之配線隱藏從而不易被視認,藉此圖像之視認性提高。上述遮光圖案可為單層或複數層之形態。遮光圖案之顏色並無特別限制,可具有黑色、白色、金屬色等多種顏色。遮光圖案可藉由用以顯現顏色之顏料及丙烯酸系樹脂、酯系樹脂、環氧系樹脂、聚胺基甲酸酯、聚矽氧等高分子而形成。該等可單獨使用,或亦可以兩種以上之混合物使用。上述遮光圖案可藉由印刷、微影術、噴墨等各種方法而形成。遮光圖案之厚度較佳為1~100 μm,更佳為2~50 μm。又,對遮光圖案之厚度方向賦予傾斜等形狀之情形時亦較佳。 [實施例][Shading Pattern] The light-shielding pattern can be used as at least a part of the frame or housing of the flexible image display device. The light-shielding pattern hides the wiring arranged at the edge of the flexible image display device so that it is not easily visible, thereby improving the visibility of the image. The above-mentioned light-shielding pattern may be in the form of a single layer or multiple layers. The color of the shading pattern is not particularly limited, and can have multiple colors such as black, white, and metallic. The light-shielding pattern can be formed by pigments used to develop colors, acrylic resins, ester resins, epoxy resins, polyurethanes, polysiloxanes, and other polymers. These can be used alone or in a mixture of two or more. The above-mentioned light-shielding pattern can be formed by various methods such as printing, lithography, and inkjet. The thickness of the light-shielding pattern is preferably 1-100 μm, more preferably 2-50 μm. In addition, it is also preferable to give a shape such as an inclination to the thickness direction of the light-shielding pattern. [Example]

以下,藉由實施例進一步詳細說明本發明。例中之「%」及「份」只要無特別記載,則表示質量%及質量份。首先說明評價方法。Hereinafter, the present invention will be described in further detail with examples. The "%" and "parts" in the examples indicate mass% and mass parts as long as there is no special record. First, the evaluation method will be explained.

<全光線透過率之測定> 光學膜之全光線透過率(Tt)係依據JIS K 7105:1981,藉由Suga Test Instruments(股)製造之全自動直讀霧度計HGM-2DP而測定。<Measurement of total light transmittance> The total light transmittance (Tt) of the optical film is measured in accordance with JIS K 7105:1981, by the automatic direct reading haze meter HGM-2DP manufactured by Suga Test Instruments (stock).

<霧度> 依據JIS K 7136:2000,將實施例及比較例中獲得之光學膜切割為30 mm×30 mm之大小,使用霧度計(Suga Test Instruments(股)製造,「HGM-2DP」)測定霧度(%)。<Haze> According to JIS K 7136:2000, the optical films obtained in the examples and comparative examples were cut into a size of 30 mm×30 mm, and the haze was measured using a haze meter (manufactured by Suga Test Instruments (stock), "HGM-2DP") (%).

<YI值> 依據JIS K 7373:2006,使用日本分光(股)製造之紫外可見近紅外分光光度計「V-670」測定光學膜之YI值。於無樣品之狀態下進行背景(background)測定後,將光學膜設置於樣品保持器,進行對300~800 nm之光之透過率測定,求出三刺激值(X、Y、Z),基於下述式算出YI值。 YI=100×(1.2769X-1.0592Z)/Y<YI value> According to JIS K 7373: 2006, the YI value of the optical film is measured using the UV-Visible-Near-Infrared Spectrophotometer "V-670" manufactured by JASCO Corporation. After measuring the background without the sample, set the optical film in the sample holder and measure the transmittance of light from 300 to 800 nm to obtain the tristimulus values (X, Y, Z), based on The YI value is calculated by the following formula. YI=100×(1.2769X-1.0592Z)/Y

<重量平均分子量之測定> 凝膠滲透層析法(GPC)測定 (1)預處理方法 向聚醯胺醯亞胺膜以濃度成為2 mg/mL之方式添加DMF溶離液(10 mmol/L溴化鋰溶液),一邊於80℃下攪拌30分鐘一邊加熱,冷卻後以0.45 μm膜濾器進行過濾,將由此獲得者作為測定溶液。 (2)測定條件 管柱:Tosoh(股)製造之TSKgel α-2500((7)7.8 mm直徑×300 mm)×1根、α-M((13)7.8 mm直徑×300 mm)×2根 溶離液:DMF(添加10 mmol/L之溴化鋰) 流量:1.0 mL/分鐘 檢測器:RI檢測器 管柱溫度:40℃ 注入量:100 μL 分子量標準:標準聚苯乙烯<Determination of weight average molecular weight> Gel Permeation Chromatography (GPC) determination (1) Pretreatment method Add DMF lysate (10 mmol/L lithium bromide solution) to the polyimide membrane to a concentration of 2 mg/mL, heat it while stirring at 80°C for 30 minutes, and filter with a 0.45 μm membrane filter after cooling , And use the obtained as the measurement solution. (2) Measurement conditions Column: TSKgel α-2500 ((7)7.8 mm diameter×300 mm)×1, α-M((13)7.8 mm diameter×300 mm)×2 pieces manufactured by Tosoh (shares) Eluent: DMF (add 10 mmol/L lithium bromide) Flow rate: 1.0 mL/min Detector: RI detector Column temperature: 40℃ Injection volume: 100 μL Molecular weight standard: standard polystyrene

<厚度之測定> 光學膜之厚度係使用ABS數位式量表(Mitutoyo(股)製造,「ID-C112BS」)而測定。<Measurement of thickness> The thickness of the optical film was measured using an ABS digital gauge (manufactured by Mitutoyo Co., Ltd., "ID-C112BS").

<拉伸彈性模數> 使用島津製作所(股)製造之「Autograph AG-IS」,測定實施例及比較例中獲得之光學膜之於溫度25℃、相對濕度50%下之彈性模數。更詳細而言,製作縱橫10 mm寬之膜,於夾頭間距離50 mm、拉伸速度10 mm/分鐘之條件下測定應力-應變曲線(S-S曲線),自其斜率算出彈性模數。<Tensile modulus of elasticity> Using "Autograph AG-IS" manufactured by Shimadzu Corporation (stock), the elastic modulus of the optical films obtained in the examples and comparative examples at a temperature of 25° C. and a relative humidity of 50% was measured. In more detail, a film with a width of 10 mm in width and length was produced, and the stress-strain curve (S-S curve) was measured under the conditions of a distance between the chucks of 50 mm and a stretching speed of 10 mm/min, and the elastic modulus was calculated from its slope.

<低溫拉伸試驗> 使用島津製作所(股)製造之「Autograph AG-IS」,測定實施例及比較例中獲得之光學膜之溫度-40℃下之彈性模數。更詳細而言,製作縱橫10 mm寬之膜,於夾頭間距離50 mm、拉伸速度10 mm/分鐘之條件下測定應力-應變曲線(S-S曲線),自其斜率算出彈性模數,算出破斷應變ε1<Low temperature tensile test> Using "Autograph AG-IS" manufactured by Shimadzu Corporation, the elastic modulus at the temperature of -40°C of the optical films obtained in the Examples and Comparative Examples was measured. In more detail, a film with a width of 10 mm in vertical and horizontal directions was produced, and the stress-strain curve (SS curve) was measured under the conditions of a distance between the chucks of 50 mm and a stretching speed of 10 mm/min, and the elastic modulus was calculated from the slope of the film. Breaking strain ε 1 .

<光學膜之反射圖像清晰度值之測定> 於實施例及比較例中獲得之光學膜具有保護膜之情形時,下述測定及評價係使用剝離保護膜之狀態之光學膜而實施。 依據JIS K 7374使用圖像清晰度測定器(Suga Test Instruments(股)製造之「ICM-1」),以如下方式藉由反射法測定光學膜之反射圖像清晰度值。 將光學膜設置於圖像清晰度測定器。針對該光學膜,於設置前以乙醇輕輕擦拭雙面,使之乾燥,於自表面去除異物之狀態下設置。繼而,調整光量及截面面積,將調整為平行光之白色光自相對於光學膜平面朝向MD方向傾斜60°之角度(入射角)照射至設置之光學膜。此處,實施例1、3及4之光學膜之照射面係光學膜製作時與基材接觸之面。實施例2之光學膜之照射面係光學膜製作時於與基材接觸之面被覆硬塗層之面。使來自光學膜之鏡面反射光透過調整截面面積並與鏡面反射光之光軸垂直地延伸之光梳,以受光器接收透過光梳之光。 於相對於光梳之平面平行且光梳中之狹縫所排列之方向上,使光梳(狹縫寬度:0.125 mm)移動特定之單位寬度並接收光梳之透過光,重複該操作。其結果,獲得受光波形。自所獲得之受光波形獲得相對光量之最大值M及最小值m。自所獲得之M及m,基於數式(5)算出第1反射圖像清晰度值CMD<Measurement of the reflection image clarity value of the optical film> When the optical film obtained in the Examples and Comparative Examples has a protective film, the following measurement and evaluation are performed using the optical film in a state where the protective film is peeled off. In accordance with JIS K 7374, using an image clarity measuring device ("ICM-1" manufactured by Suga Test Instruments Co., Ltd.), the reflective image clarity value of the optical film was measured by the reflection method in the following manner. The optical film is set on the image clarity measuring device. For the optical film, wipe both sides with ethanol lightly before installation to dry it, and install it with foreign matter removed from the surface. Then, the amount of light and the cross-sectional area are adjusted, and the white light adjusted to be parallel light is irradiated to the installed optical film from an angle (incident angle) inclined at 60° in the MD direction with respect to the optical film plane. Here, the irradiated surface of the optical film of Examples 1, 3, and 4 was the surface that was in contact with the substrate during the production of the optical film. The irradiated surface of the optical film of Example 2 was the surface where the hard coat layer was applied to the surface in contact with the substrate during the production of the optical film. The specular reflection light from the optical film is transmitted through an optical comb whose cross-sectional area is adjusted and extending perpendicular to the optical axis of the specular reflection light, and the light passing through the optical comb is received by a light receiver. In the direction parallel to the plane of the optical comb and where the slits in the optical comb are arranged, move the optical comb (slit width: 0.125 mm) by a specific unit width and receive the transmitted light of the optical comb, and repeat the operation. As a result, the received light waveform is obtained. Obtain the maximum value M and the minimum value m of the relative light intensity from the received light waveform. From the obtained M and m, the first reflection image sharpness value C MD is calculated based on the equation (5).

除將照射光之入射角變更為自相對於光學膜平面垂直之方向朝向TD方向傾斜60°之角度以外,以與第1反射圖像清晰度值相同之方式,分別算出第2反射圖像清晰度值CTDExcept that the incident angle of the irradiated light is changed to an angle that is inclined 60° from the direction perpendicular to the optical film plane to the TD direction, the second reflected image is calculated in the same way as the first reflected image sharpness value. Degree value C TD .

<醯亞胺化率> 醯亞胺化率係藉由1 H-NMR測定以如下方式求得。 (1)預處理方法 使含有聚醯亞胺系樹脂之光學膜溶解於氘代二甲基亞碸(DMSO-d6 ) 製為2質量%溶液,將該溶液作為測定試樣。 (2)測定條件 測定裝置:JEOL製造 400 MHz NMR裝置 JNM-ECZ400S/L1 標準物質:DMSO-d6 (2.5 ppm) 試樣溫度:室溫 累計次數:256次 弛豫時間:5秒 (3)醯亞胺化率解析方法 (聚醯亞胺樹脂之醯亞胺化率) 於以含有聚醯亞胺樹脂之測定試樣獲得之1 H-NMR光譜中,將觀測到之苯質子中源自於醯亞胺化前後未變化之結構之苯質子A之積分值設為IntA 。又,將觀測到之源自聚醯亞胺樹脂中殘存之醯胺酸結構之醯胺質子之積分值設為IntB 。基於下式自該等積分值求出聚醯亞胺樹脂之醯亞胺化率。 醯亞胺化率(%)=100×(1-IntB /IntA )<The imidization rate> The imidization rate is obtained by 1 H-NMR measurement as follows. (1) Pretreatment method The optical film containing the polyimide-based resin was dissolved in deuterated dimethyl sulfide (DMSO-d 6 ) to prepare a 2% by mass solution, and the solution was used as a measurement sample. (2) Measuring condition measuring device: 400 MHz NMR device JNM-ECZ400S/L1 manufactured by JEOL Standard material: DMSO-d 6 (2.5 ppm) Sample temperature: Room temperature Cumulative times: 256 times Relaxation time: 5 seconds (3) The analysis method of the imidization rate (the imidization rate of the polyimide resin) In the 1 H-NMR spectrum obtained with the measurement sample containing the polyimide resin, the observed benzene protons are derived from The integral value of the benzene proton A of the unchanged structure before and after the imidization is set as Int A. In addition, the integral value of the observed protons of amide derived from the amide acid structure remaining in the polyimide resin is set to Int B. The imidization rate of the polyimide resin is obtained from the integral values based on the following formula. The imidization rate (%)=100×(1-Int B /Int A )

(聚醯胺醯亞胺樹脂之醯亞胺化率) 於以含有聚醯胺醯亞胺樹脂之測定試樣獲得之1 H-NMR光譜中,將觀測到之苯質子中源自於醯亞胺化前後未變化之結構,且不受源自於聚醯胺醯亞胺樹脂中殘存之醯胺酸結構之結構影響之苯質子C之積分值設為IntC 。又,將觀測到之苯質子中源自於醯亞胺化前後未變化之結構,且受到源自於聚醯胺醯亞胺樹脂中殘存之醯胺酸結構之結構影響之苯質子D之積分值設為IntD 。基於下式自所獲得之IntC 及IntD 求出β值。 β=IntD /IntC 其次,對複數個聚醯胺醯亞胺樹脂求出上述式之β值及上述式之聚醯亞胺樹脂之醯亞胺化率,自該等結果獲得以下之相關式。 醯亞胺化率(%)=k×β+100 上述相關式中,k為常數。 將β代入相關式,獲得聚醯胺醯亞胺樹脂之醯亞胺化率(%)。(Imidation rate of polyamide imide resin) In the 1 H-NMR spectrum obtained with a measurement sample containing polyamide imide resin, the observed benzene protons are derived from The integral value of the benzene proton C, which has the unchanged structure before and after amination, and which is not affected by the structure derived from the residual amide acid structure in the polyamide imide resin, is set to Int C. In addition, the integral of the benzene proton D derived from the unchanged structure before and after the imidization of the observed benzene proton, and the structure of the benzene proton D derived from the residual acid structure in the polyimide resin The value is set to Int D. Calculate the β value from the obtained Int C and Int D based on the following formula. β=Int D /Int C Next, for a plurality of polyimide resins, the β value of the above formula and the imidization rate of the polyimide resin of the above formula are calculated, and the following correlations are obtained from these results Mode. The imidization rate (%)=k×β+100 In the above correlation formula, k is a constant. Substitute β into the correlation formula to obtain the imidization rate (%) of the polyimide resin.

<清漆之黏度> 依據JIS K 8803:2011,使用Brookfield公司製造之E型黏度計DV-II+Pro進行測定。測定溫度為25℃。<Viscosity of varnish> According to JIS K 8803:2011, the measurement was carried out using the E-type viscometer DV-II+Pro manufactured by Brookfield Company. The measurement temperature is 25°C.

<耐彎曲性試驗> 依據JIS K 5600-5-1對光學膜實施耐彎曲性試驗。耐彎曲性試驗係使用小型桌上彎曲試驗機(YUASA SYSTEM(股)製造)而實施。對耐彎曲試驗後之光學膜,以與上述測定方法相同之方法,分別測定反射圖像清晰度值及霧度。分別取耐彎曲試驗前後之反射圖像清晰度值及霧度之差之絕對值,分別算出反射圖像清晰度值之差(第1反射圖像清晰度值之差ΔCMD 、第2反射圖像清晰度值之差ΔCTD )及霧度之差(ΔHaze)。<Bending resistance test> According to JIS K 5600-5-1, a bending resistance test was performed on the optical film. The bending resistance test was carried out using a small desktop bending tester (manufactured by Yuasa System Co., Ltd.). For the optical film after the bending resistance test, the sharpness value and haze of the reflected image were measured by the same method as the above-mentioned measurement method. Take the absolute value of the difference between the sharpness value of the reflected image and the haze before and after the bending resistance test respectively, and calculate the difference of the sharpness value of the reflected image (the difference of the first reflected image sharpness value ΔC MD , the second reflection image The difference in image sharpness value ΔC TD ) and the difference in haze (ΔHaze).

<耐折性試驗(MIT)> 依據ASTM標準D2176-16,以如下方式求出實施例及比較例之光學膜之彎折次數。使用啞鈴切割機,將該光學膜切割為寬15 mm、長100 mm之短條狀,製作測定試樣。將測定試樣設置於MIT耐折疲勞試驗機(東洋精機製作所(股)製造「型號0530」)本體。詳細而言,將測定試樣之一端固定於荷重夾具,將另一端固定於彎折夾具,對測定試樣施加張力。於該狀態下,於試驗速度175 cpm、彎折角度135°、荷重0.75 kgf、彎折夾具之彎曲半徑R=3 mm之條件下,進行向正反方向之往復彎折運動直至測定試樣破斷。測定上述彎折次數。<Folding resistance test (MIT)> According to ASTM standard D2176-16, the number of times of bending of the optical films of the Examples and Comparative Examples was calculated as follows. Using a dumbbell cutter, cut the optical film into short strips with a width of 15 mm and a length of 100 mm to prepare a measurement sample. The measurement sample was set in the main body of the MIT flexural fatigue testing machine ("Model 0530" manufactured by Toyo Seiki Seisakusho Co., Ltd.). Specifically, one end of the measurement sample is fixed to a load jig, the other end is fixed to a bending jig, and tension is applied to the measurement sample. In this state, under the conditions of a test speed of 175 cpm, a bending angle of 135°, a load of 0.75 kgf, and a bending radius of the bending jig R=3 mm, perform a reciprocating bending movement in the forward and reverse directions until the test specimen is broken. Off. Measure the number of folds mentioned above.

<視認性> 將光學膜切割為10 cm見方。將同尺寸之附有黏著層之偏光板之MD方向與上述光學膜之MD方向對齊,於上述光學膜貼合附有黏著層之偏光板,製作評價用試樣。對1個實施例及比較例之光學膜分別製作2個評價用試樣。又,對耐彎曲性試驗後之實施例及比較例之光學膜,亦分別製作2個評價用試樣。 將2個評價用試樣中之一個評價用試樣以如下方式固定於台上:螢光燈位於評價用試樣平面之垂直方向,且上述螢光燈之長度方向相對於評價用試樣之MD方向成為水平。 觀察者自相對於評價用試樣平面之垂直方向傾斜30°之角度,以目視觀察映入評價用試樣表面之螢光燈像。 除將螢光燈之長度方向自水平變更為垂直以外,以相同之方式將另一個評價用試樣固定於台上,觀察螢光燈像。 基於下述評價基準,自觀察結果評價視認性。 (視認性之評價基準) ◎:幾乎未視認螢光燈像之變形。 ○:視認出些許螢光燈像之變形。 △:視認出螢光燈像之變形。 ×:明確地視認出螢光燈像之變形。<Visibility> Cut the optical film into 10 cm squares. Align the MD direction of the adhesive layer-attached polarizing plate of the same size with the MD direction of the above-mentioned optical film, and bond the adhesive layer-attached polarizing plate to the above-mentioned optical film to prepare an evaluation sample. Two evaluation samples were prepared for the optical films of 1 Example and Comparative Example, respectively. In addition, for the optical films of the Examples and Comparative Examples after the bending resistance test, two evaluation samples were also produced. One of the two evaluation samples is fixed on the table in the following manner: the fluorescent lamp is located in the vertical direction of the evaluation sample plane, and the length direction of the above-mentioned fluorescent lamp is relative to that of the evaluation sample. The MD direction becomes horizontal. The observer visually observes the fluorescent lamp image reflected on the surface of the evaluation sample at an angle of 30° from the vertical direction relative to the plane of the evaluation sample. Except that the length direction of the fluorescent lamp was changed from horizontal to vertical, another sample for evaluation was fixed on the table in the same manner, and the fluorescent lamp image was observed. Based on the following evaluation criteria, the visibility was evaluated from the observation results. (Evaluation criteria for visibility) ◎: The deformation of the fluorescent lamp image is hardly recognized. ○: Visually recognizes a slight distortion of the fluorescent lamp image. △: Distortion of the fluorescent lamp image is visually recognized. ×: The deformation of the fluorescent lamp image is clearly recognized.

<投影像視認性> 將光學膜切割為長300 mm、寬200 mm,作為評價用樣品。於暗室中,將LED光源(林時計工業(股)製造;LA-HDF15T)、上述評價用樣品及白色之電影觀賞用之屏幕(Theater House(股)製造;BTP600FHD-SH1000),以LED光源與該樣品之距離為2 m,該樣品與該屏幕之距離為0.3 m之方式,設置於一直線上。自光源對該樣品照射光,使圖像投影至屏幕,觀察其透過像。基於下述評價基準,自觀察結果評價投影像視認性。<Projected image visibility> The optical film was cut into a length of 300 mm and a width of 200 mm, which was used as a sample for evaluation. In a dark room, the LED light source (manufactured by Linshiji Industry Co., Ltd.; LA-HDF15T), the above-mentioned evaluation sample and a white screen for movie viewing (manufactured by Theater House Co., Ltd.; BTP600FHD-SH1000) were combined with the LED light source The distance between the sample is 2 m, and the distance between the sample and the screen is 0.3 m, and it is set on a straight line. The sample is irradiated with light from the light source, the image is projected onto the screen, and the transmitted image is observed. Based on the following evaluation criteria, the visibility of the projected image was evaluated from the observation results.

(投影像視認性之評價基準) ◎:幾乎未見投影像之濃淡。 ○:可視認出些許投影像之濃淡。 △:視認出投影像之濃淡。 ×:明確地視認出投影像之濃淡。(Evaluation criteria for visibility of projected images) ◎: The shade of the projected image is hardly seen. ○: The lightness of the projected image can be recognized slightly. △: The intensity of the projected image is visually recognized. ×: The intensity of the projected image is clearly recognized.

(製造例1:聚醯胺醯亞胺樹脂(1)之製備) 於氮氣環境下,於具備攪拌葉之可分離式燒瓶中,以TFMB之固形物成分成為5.42質量%之方式添加2,2'-雙(三氟甲基)聯苯胺(以下,有時簡稱為TFMB)及DMAc,一邊於室溫下攪拌一邊使TFMB溶解於DMAc中。其次,於燒瓶中以相對於TFMB成為30.46 mol%之方式添加4,4'-(六氟亞異丙基)二鄰苯二甲酸二酐(以下,有時簡稱為6FDA),於室溫下攪拌18小時。其後,冷卻至10℃後,以相對於TFMB成為31.98 mol%之方式添加2-甲氧基對苯二甲醯氯(以下,有時簡稱為OMTPC),攪拌10分鐘後,進而以相對於TFMB成為31.98 mol%之方式添加OMTPC,攪拌20分鐘。其後,添加與一開始添加之DMAc同量之DMAc,攪拌10分鐘後,以相對於TFMB成為7.11 mol%之方式添加OMTPC,攪拌2小時。繼而,於燒瓶中以分別相對於TFMB成為71.07 mol%之方式添加二異丙基乙胺與4-甲基吡啶,以相對於TFMB成為213.20 mol%之方式添加乙酸酐,攪拌30分鐘後,將內溫升溫至70℃,進而攪拌3小時,獲得反應液。 將所獲得之反應液冷卻至室溫,以絲狀投入大量甲醇中,取出析出之沈澱物,於甲醇中浸漬6小時後,以甲醇洗淨。其次,於60℃下進行沈澱物之減壓乾燥,獲得聚醯胺醯亞胺樹脂(1)。所獲得之聚醯胺醯亞胺樹脂(1)之重量平均分子量為260,000,醯亞胺化率為98.5%。(Production Example 1: Preparation of polyamide imine resin (1)) Under a nitrogen atmosphere, in a separable flask equipped with a stirring blade, add 2,2'-bis(trifluoromethyl)benzidine (hereinafter sometimes referred to as TFMB) and DMAc, while stirring at room temperature, dissolve TFMB in DMAc. Next, 4,4'-(hexafluoroisopropylidene)diphthalic dianhydride (hereinafter, sometimes referred to as 6FDA) is added to the flask so that it becomes 30.46 mol% relative to TFMB, at room temperature Stir for 18 hours. Then, after cooling to 10°C, 2-methoxyterephthalic acid chloride (hereinafter, sometimes referred to as OMTPC) was added so as to become 31.98 mol% with respect to TFMB, and after stirring for 10 minutes, the ratio Add OMTPC so that TFMB becomes 31.98 mol%, and stir for 20 minutes. After that, the same amount of DMAc as the DMAc added at the beginning was added, and after stirring for 10 minutes, OMTPC was added so as to be 7.11 mol% with respect to TFMB, and the mixture was stirred for 2 hours. Then, diisopropylethylamine and 4-picoline were added to the flask so that they were 71.07 mol% relative to TFMB, and acetic anhydride was added so that they were 213.20 mol% relative to TFMB. After stirring for 30 minutes, The internal temperature was raised to 70°C, and further stirred for 3 hours to obtain a reaction liquid. The obtained reaction liquid was cooled to room temperature, and was thrown into a large amount of methanol in the form of filaments, and the deposited precipitate was taken out, immersed in methanol for 6 hours, and then washed with methanol. Next, the precipitate was dried under reduced pressure at 60°C to obtain a polyamide imide resin (1). The weight average molecular weight of the obtained polyimide resin (1) was 260,000, and the imidization rate was 98.5%.

(製造例2:聚醯胺醯亞胺樹脂(2)之製備) 於氮氣環境下,於具備攪拌葉之可分離式燒瓶中,以TFMB之固形物成分成為5.22質量%之方式添加TFMB及DMAc,一邊於室溫下攪拌一邊使TFMB溶解於DMAc中。其次,於燒瓶中以相對於TFMB成為41.24 mol%之方式添加6FDA,於室溫下攪拌16小時。其後,冷卻至10℃後,以相對於TFMB成為27.84 mol%之方式添加2,5-二甲基對苯二甲醯氯(以下,有時簡稱為DMTPC),攪拌10分鐘後,進而以相對於TFMB成為27.84 mol%之方式添加DMTPC,攪拌20分鐘。其後,添加與一開始添加之DMAc同量之DMAc,攪拌10分鐘後,以相對於TFMB成為6.19 mol%之方式添加DMTPC,攪拌2小時。繼而,於燒瓶中以分別相對於TFMB成為61.86 mol%之方式添加二異丙基乙胺與4-甲基吡啶,以相對於TFMB成為288.66 mol%之方式添加乙酸酐,攪拌30分鐘後,將內溫升溫至70℃,進而攪拌3小時,獲得反應液。 將所獲得之反應液冷卻至室溫,以絲狀投入大量甲醇中,取出析出之沈澱物,於甲醇中浸漬6小時後,以甲醇洗淨。其次,於60℃下進行沈澱物之減壓乾燥,獲得聚醯胺醯亞胺樹脂(2)。所獲得之聚醯胺醯亞胺樹脂(2)之重量平均分子量為280,000,醯亞胺化率為98.9%。(Production Example 2: Preparation of polyimide resin (2)) Under a nitrogen atmosphere, in a separable flask equipped with a stirring blade, add TFMB and DMAc so that the solid content of TFMB becomes 5.22% by mass, and dissolve TFMB in DMAc while stirring at room temperature. Next, 6FDA was added to the flask so that it became 41.24 mol% with respect to TFMB, and it stirred at room temperature for 16 hours. Then, after cooling to 10°C, 2,5-dimethylterephthalic acid chloride (hereinafter, sometimes referred to as DMTPC) was added so that it became 27.84 mol% with respect to TFMB, and after stirring for 10 minutes, DMTPC was added so that it became 27.84 mol% with respect to TFMB, and stirred for 20 minutes. After that, the same amount of DMAc as the DMAc that was added at the beginning was added, and after stirring for 10 minutes, DMTPC was added so as to be 6.19 mol% with respect to TFMB, and the mixture was stirred for 2 hours. Then, diisopropylethylamine and 4-picoline were added to the flask so that they would become 61.86 mol% relative to TFMB, and acetic anhydride was added so that they would become 288.66 mol% relative to TFMB. After stirring for 30 minutes, The internal temperature was raised to 70°C, and further stirred for 3 hours to obtain a reaction liquid. The obtained reaction liquid was cooled to room temperature, and was thrown into a large amount of methanol in the form of filaments, and the deposited precipitate was taken out, immersed in methanol for 6 hours, and then washed with methanol. Next, the precipitate was dried under reduced pressure at 60°C to obtain a polyamide imide resin (2). The weight average molecular weight of the obtained polyimide resin (2) was 280,000, and the imidization rate was 98.9%.

(製造例3:聚醯胺醯亞胺樹脂(3)之製備) 於氮氣環境下,於具備攪拌葉之可分離式燒瓶中,以TFMB之固形物成分成為6.08質量%之方式添加TFMB及DMAc,一邊於室溫下攪拌一邊使TFMB溶解於DMAc中。其次,於燒瓶中以相對於TFMB成為40.82 mol%之方式添加6FDA,於室溫下攪拌16小時。其後,冷卻至10℃後,以相對於TFMB成為27.55 mol%之方式添加OMTPC,攪拌10分鐘後,進而以相對於TFMB成為27.55 mol%之方式添加OMTPC,攪拌20分鐘。其後,添加與一開始添加之DMAc同量之DMAc,攪拌10分鐘後,以相對於TFMB成為6.12 mol%之方式添加OMTPC,攪拌2小時。繼而,於燒瓶中以分別相對於TFMB成為61.22 mol%之方式添加二異丙基乙胺與4-甲基吡啶,以相對於TFMB成為285.71 mol%之方式添加乙酸酐,攪拌30分鐘後,將內溫升溫至70℃,進而攪拌3小時,獲得反應液。 將所獲得之反應液冷卻至室溫,以絲狀投入大量甲醇中,取出析出之沈澱物,於甲醇中浸漬6小時後,以甲醇洗淨。其次,於60℃下進行沈澱物之減壓乾燥,獲得聚醯胺醯亞胺樹脂(3)。所獲得之聚醯胺醯亞胺樹脂(3)之重量平均分子量為300,000,醯亞胺化率為99.1%。(Production Example 3: Preparation of polyimide resin (3)) Under a nitrogen atmosphere, in a separable flask equipped with a stirring blade, add TFMB and DMAc so that the solid content of TFMB becomes 6.08% by mass, and dissolve TFMB in DMAc while stirring at room temperature. Next, 6FDA was added to the flask so that it might become 40.82 mol% with respect to TFMB, and it stirred at room temperature for 16 hours. Then, after cooling to 10°C, OMTPC was added so that it became 27.55 mol% with respect to TFMB, and after stirring for 10 minutes, OMTPC was further added so that it became 27.55 mol% with respect to TFMB, and stirring was carried out for 20 minutes. After that, the same amount of DMAc as the DMAc added at the beginning was added, and after stirring for 10 minutes, OMTPC was added so as to be 6.12 mol% with respect to TFMB, and the mixture was stirred for 2 hours. Then, diisopropylethylamine and 4-picoline were added to the flask so that they were 61.22 mol% relative to TFMB, and acetic anhydride was added so that they were 285.71 mol% relative to TFMB. After stirring for 30 minutes, The internal temperature was raised to 70°C, and further stirred for 3 hours to obtain a reaction liquid. The obtained reaction liquid was cooled to room temperature, and was thrown into a large amount of methanol in the form of filaments, and the deposited precipitate was taken out, immersed in methanol for 6 hours, and then washed with methanol. Next, the precipitate was dried under reduced pressure at 60°C to obtain polyimide resin (3). The weight average molecular weight of the obtained polyimide resin (3) was 300,000, and the imidization rate was 99.1%.

(製造例4:清漆之製備) 將上述聚醯胺醯亞胺樹脂以成為表1所示之固形物成分之方式添加至GBL,藉由於室溫下攪拌24小時而使之完全溶解,獲得清漆(1)~(3)。 [表1] 清漆 聚醯胺醯亞胺樹脂 黏度(cp) 固形物成分(質量%) 清漆1 (1) 37,000 9.5 清漆2 (2) 36,000 9.0 清漆3 (3) 38,000 8.0 (Production Example 4: Preparation of varnish) The above polyamide imine resin was added to GBL so as to become the solid components shown in Table 1, and it was completely dissolved by stirring at room temperature for 24 hours to obtain a varnish (1)~(3). [Table 1] Varnish Polyimide resin Viscosity (cp) Solid content (mass%) Varnish 1 (1) 37,000 9.5 Varnish 2 (2) 36,000 9.0 Varnish 3 (3) 38,000 8.0

(製造例5:硬塗層形成用組合物之製造) 混合35質量份之丙烯酸胺基甲酸酯(新中村化學工業(股)製造;UA-122P)、35質量份之丙烯酸胺基甲酸酯(新中村化學工業(股)製造;UA-232P)、25質量份之甲基乙基酮、4.5質量份之光起始劑(1-羥基環己基苯基酮)、0.5質量份之調平劑(BYK-Chemie公司製造;BYK-3570),製造硬塗層形成用組合物(1)。(Production Example 5: Production of composition for forming hard coat layer) Mix 35 parts by mass of acrylic urethane (manufactured by Shinnakamura Chemical Industry Co., Ltd.; UA-122P) and 35 parts by mass of acrylic urethane (manufactured by Shinnakamura Chemical Industry Co., Ltd.; UA-232P) , 25 parts by mass of methyl ethyl ketone, 4.5 parts by mass of photoinitiator (1-hydroxycyclohexyl phenyl ketone), 0.5 parts by mass of leveling agent (manufactured by BYK-Chemie; BYK-3570), manufactured Composition (1) for forming a hard coat layer.

<實施例1> (光學膜(1)之製造) 一邊參考圖6及圖7一邊說明光學膜(1)之製造。首先,如圖6所示,捲出厚度188 μm之聚對苯二甲酸乙二酯膜基材51(東洋紡(股)製造:COSMOSHINE(註冊商標)A4100,以下有時簡稱為PET膜基材51),一邊以線速度0.30 m/分鐘搬送,一邊將裝入槽522中之清漆(1)自噴嘴521以寬度500 mm,藉由流涎成形塗佈於該PET膜基材51上。其後,一邊以相同之線速度搬送,一邊於乾燥機53中於120℃下加熱20分鐘,於90℃下加熱20分鐘,使塗佈之清漆乾燥。繼而,自捲筒捲出保護膜54(SUN A.KAKEN(股)製造;NSA-33T),貼合於該乾燥塗膜之與PET膜基材51相接之面之相反側之面後,自該乾燥塗膜剝離PET膜基材51,捲取為PET膜基材捲筒55,並以長度100 m之積層體捲筒56之形式獲得剩餘之積層體。<Example 1> (Manufacturing of Optical Film (1)) The manufacture of the optical film (1) will be described with reference to FIGS. 6 and 7. First, as shown in FIG. 6, a polyethylene terephthalate film substrate 51 (manufactured by Toyobo Co., Ltd.: COMOSHINE (registered trademark) A4100) with a thickness of 188 μm is rolled out, sometimes referred to as PET film substrate 51. ), while conveying at a linear speed of 0.30 m/min, the varnish (1) loaded into the tank 522 is applied from the nozzle 521 to the PET film substrate 51 by casting with a width of 500 mm. After that, while being transported at the same linear speed, it was heated in the dryer 53 at 120°C for 20 minutes and at 90°C for 20 minutes to dry the applied varnish. Then, the protective film 54 (manufactured by SUN A.KAKEN Co., Ltd.; NSA-33T) was unrolled from the reel and attached to the surface of the dry coating film on the opposite side to the surface of the PET film substrate 51, The PET film base material 51 was peeled from the dried coating film, and wound into a PET film base material roll 55, and the remaining laminate was obtained in the form of a laminate roll 56 with a length of 100 m.

其次,如圖7所示,自所獲得之積層體捲筒56,以搬送速度0.5 m/秒捲出積層膜,自該積層膜剝離保護膜54,捲取為保護膜捲筒57,使剩餘之乾燥塗膜通過夾輥201及202後,於拉幅式乾燥機58中,於以下條件下乾燥。再者,拉幅式乾燥機58具備使用夾具將膜之兩端部固持之機構。又,內部自膜之入口側依序劃分為第1室~第6室。 夾具固持寬度(自膜之一端至對應之夾具固持部為止之距離):25 mm 乾燥機出口之夾具間距離相對於乾燥機入口之膜兩端之夾具間距離之比:1.0 拉幅式乾燥機58內溫度:200℃ 拉幅式乾燥機58內之各室之風速:第1室13.5 m/秒,第2室13 m/秒,第3~6室11 m/秒Next, as shown in Fig. 7, from the obtained laminate roll 56, the laminate film is rolled out at a conveying speed of 0.5 m/sec, the protective film 54 is peeled off from the laminate film, and is wound into a protective film roll 57 to make the remaining After passing through the nip rollers 201 and 202, the dried coating film is dried in a tenter dryer 58 under the following conditions. Furthermore, the tenter dryer 58 is equipped with a mechanism for holding both ends of the film using a clamp. In addition, the inside is divided into the first chamber to the sixth chamber in order from the entrance side of the membrane. Clamp holding width (the distance from one end of the film to the corresponding clamp holding part): 25 mm The ratio of the distance between the clamps at the outlet of the dryer to the distance between the clamps at both ends of the film at the inlet of the dryer: 1.0 Internal temperature of stenter dryer 58: 200℃ The wind speed of each chamber in the stenter dryer 58: 13.5 m/sec in the first chamber, 13 m/sec in the second chamber, 11 m/sec in the third to sixth chamber

自拉幅式乾燥機58移出後,將膜端部之夾具之固持解除。使所獲得之膜通過夾輥203及204後,將膜之夾具固持部分以狹縫裝置59切割成長條,繼而貼合PET保護膜60,捲取至ABS製造之6英吋之芯上,以捲筒膜之形式獲得厚度50 μm之光學膜61。所獲得之光學膜61中之溶劑殘存量為1.0質量%。After the stenter dryer 58 is removed, the holding of the clamp at the end of the film is released. After the obtained film is passed through the nip rollers 203 and 204, the clamp holding part of the film is cut into long strips with the slit device 59, and then the PET protective film 60 is attached and wound onto a 6-inch core made of ABS. An optical film 61 with a thickness of 50 μm was obtained in the form of a roll film. The residual amount of solvent in the obtained optical film 61 was 1.0% by mass.

<實施例2> (光學膜(2)之製造) 將製造例5中製作之硬塗層形成用組合物(1),以硬化後之第1硬塗層之厚度成為3 μm之方式塗佈於實施例1中獲得之光學膜61之製膜時與PET基材膜接觸之面,於80℃之烘箱中乾燥1分鐘。其後,使用高壓水銀燈以光量350 mJ/cm2 照射光,使塗膜硬化而形成第1硬塗層,製造含有硬塗層之光學膜(2)。<Example 2> (Production of optical film (2)) The hard-coat layer-forming composition (1) produced in Production Example 5 was applied so that the thickness of the first hard-coat layer after curing became 3 μm The surface of the optical film 61 obtained in Example 1 that was in contact with the PET base film during film formation was dried in an oven at 80°C for 1 minute. Thereafter, a high-pressure mercury lamp was used to irradiate light with a light amount of 350 mJ/cm 2 to harden the coating film to form a first hard coat layer, and an optical film (2) containing a hard coat layer was produced.

<實施例3> 除將清漆(1)變更為清漆(2),且變更為於120℃下加熱20分鐘,於95℃下加熱20分鐘以外,以與光學膜(1)之製造方法相同之方式,製造膜中之溶劑殘存量為1.0質量%之厚度49 μm之光學膜(3)。<Example 3> Except that varnish (1) is changed to varnish (2), and heated at 120°C for 20 minutes, and at 95°C for 20 minutes, the film is manufactured in the same manner as the method of manufacturing the optical film (1) The residual amount of solvent is 1.0% by mass for an optical film (3) with a thickness of 49 μm.

<實施例4> 除將清漆(1)變更為清漆(3),且將線速度自0.30 m/分鐘變更為0.25 m/分鐘以外,以與光學膜(1)之製造方法相同之方式,製造膜中之溶劑殘存量為1.0質量%之厚度51 μm之光學膜(4)。<Example 4> Except changing the varnish (1) to varnish (3) and changing the line speed from 0.30 m/min to 0.25 m/min, the solvent remains in the manufactured film in the same way as the manufacturing method of the optical film (1) The amount is 1.0% by mass of an optical film (4) with a thickness of 51 μm.

<比較例1> 準備厚度50 μm之聚醯亞胺膜(宇部興產(股)製造;UPILEX)作為光學膜(5)。<Comparative example 1> A polyimide film (manufactured by Ube Industries Co., Ltd.; UPILEX) with a thickness of 50 μm was prepared as an optical film (5).

組合物之配方及光學膜之組成總結於表2。再者,表2中,關於「HC有無」欄,將光學膜具備硬塗層之情形記為有,將不具備之情形記為無。The formula of the composition and the composition of the optical film are summarized in Table 2. In addition, in Table 2, in the "HC presence or absence" column, the case where the optical film has a hard coat layer is recorded as yes, and the case where it does not have a hard coat layer is recorded as no.

[表2]    清漆 膜厚T (μm) HC有無 實施例1 (1) 50 實施例2 (1) 53 實施例3 (2) 49 實施例4 (3) 51 比較例1 - 50 [Table 2] Varnish Film thickness T (μm) HC with or without Example 1 (1) 50 none Example 2 (1) 53 have Example 3 (2) 49 none Example 4 (3) 51 none Comparative example 1 - 50 none

關於實施例及比較例中獲得之膜,依據上述方法測定各物性值。所獲得之結果示於表3~表6。Regarding the films obtained in the Examples and Comparative Examples, each physical property value was measured according to the above-mentioned method. The results obtained are shown in Table 3 to Table 6.

[表3]    光學特性 圖像清晰度值(%) 耐折性試驗(MIT) Tt (%) 霧度 (%) YI CMD CTD (CMD +CTD )/2 彎折次數 (次) 實施例1 91.0 0.2 1.4 67.5 61.1 64.3 >400,000 實施例2 90.8 0.3 1.6 67.2 60.8 64.0 >400,000 實施例3 90.8 0.3 1.3 61.1 55.2 58.2 >400,000 實施例4 90.9 0.3 1.2 55.6 50.6 53.1 >400,000 比較例1 26.1 3.4 120 42.5 26.7 34.6 >800,000 [table 3] Optical properties Image clarity value (%) Folding Endurance Test (MIT) Tt (%) Haze (%) YI C MD C TD (C MD +C TD )/2 Bending times (times) Example 1 91.0 0.2 1.4 67.5 61.1 64.3 >400,000 Example 2 90.8 0.3 1.6 67.2 60.8 64.0 >400,000 Example 3 90.8 0.3 1.3 61.1 55.2 58.2 >400,000 Example 4 90.9 0.3 1.2 55.6 50.6 53.1 >400,000 Comparative example 1 26.1 3.4 120 42.5 26.7 34.6 >800,000

[表4]    拉伸彈性模數E (GPa) 室溫破斷應變 ε1 (%) -40℃破斷應變 ε2 (%) ε21 實施例1 5.5 11.5 9.9 0.86 實施例2 5.5 9.5 7.8 0.82 實施例3 6.0 10.4 8.4 0.81 實施例4 5.5 10.5 9.7 0.99 比較例1 9.6 28.5 20.5 0.72 [Table 4] Tensile modulus E (GPa) Room temperature breaking strain ε 1 (%) -40℃ breaking strain ε 2 (%) ε 21 Example 1 5.5 11.5 9.9 0.86 Example 2 5.5 9.5 7.8 0.82 Example 3 6.0 10.4 8.4 0.81 Example 4 5.5 10.5 9.7 0.99 Comparative example 1 9.6 28.5 20.5 0.72

[表5]    圖像清晰度值(%) 圖像清晰度值之差(%) 霧度 彎曲前 彎曲後 ΔCMD ΔCTD ΔHaze (%) CMD CTD CMD CTD 實施例1 67.5 61.1 62.5 55.3 5.0 5.8 0.2 實施例2 67.2 60.8 61.3 53.5 5.9 7.3 0.3 實施例3 55.6 50.6 44.3 38.1 11.3 12.5 0.2 實施例4 48.0 40.0 35.0 26.1 13.0 13.9 0.2 比較例1 42.5 26.7 27.2 11.3 15.3 15.4 0.5 [table 5] Image clarity value (%) Difference of image sharpness value (%) Haze Before bending After bending ΔC MD ΔC TD ΔHaze (%) C MD C TD C MD C TD Example 1 67.5 61.1 62.5 55.3 5.0 5.8 0.2 Example 2 67.2 60.8 61.3 53.5 5.9 7.3 0.3 Example 3 55.6 50.6 44.3 38.1 11.3 12.5 0.2 Example 4 48.0 40.0 35.0 26.1 13.0 13.9 0.2 Comparative example 1 42.5 26.7 27.2 11.3 15.3 15.4 0.5

[表6]    視認性 垂直方向 水平方向 實施例1 實施例2 實施例3 實施例4 比較例1 × × [Table 6] Visibility Vertical direction horizontal direction Example 1 Example 2 Example 3 Example 4 Comparative example 1 X X

[表7]    投影像視認性 實施例1 實施例2 實施例3 實施例4 比較例1 × [Table 7] Projected image visibility Example 1 Example 2 Example 3 Example 4 Comparative example 1 X

確認全光線透過率、霧度及拉伸彈性模數為特定範圍內且滿足數式(1)~數式(3)的實施例1~4之光學膜係廣角方向之視認性優異之膜。又,確認本發明之光學膜於本發明之較佳一態樣中,耐彎曲試驗前後之圖像清晰度值之差及霧度之差較小,即使反覆彎折操作後廣角方向之視認性亦優異。進而,確認實施例1~4之光學膜係不僅反射像之視認性優異,投影像之視認性亦優異者。又,確認本發明之光學膜於具有上述特徵之同時ε12 為0.70~1.20之範圍內,即使於低溫環境下力學特性亦優異。相對於此,全光線透過率及霧度不在特定範圍內且不滿足數式(1)~數式(3)的比較例1之光學膜並非廣角方向之視認性及投影像之視認性優異者。It was confirmed that the total light transmittance, haze, and tensile modulus of elasticity were within specific ranges and that the optical films of Examples 1 to 4 satisfying the equations (1) to (3) were films with excellent visibility in the wide-angle direction. In addition, it is confirmed that the optical film of the present invention is in a preferred aspect of the present invention, the difference in image sharpness value before and after the bending resistance test and the difference in haze are small, and the visibility in the wide-angle direction even after repeated bending operations Also excellent. Furthermore, it was confirmed that the optical film systems of Examples 1 to 4 are not only excellent in the visibility of the reflected image, but also excellent in the visibility of the projected image. In addition, it was confirmed that the optical film of the present invention has the above-mentioned characteristics while having ε 12 in the range of 0.70 to 1.20, and has excellent mechanical properties even in a low temperature environment. In contrast, the optical film of Comparative Example 1 in which the total light transmittance and haze are not within the specified range and does not satisfy the equations (1) to (3) is not the one that has excellent visibility in the wide-angle direction and the visibility of the projected image .

1:光學膜 3:垂直軸 10:第1照射光 11:第1照射位置 12:第1鏡面反射光 14:第1光軸 16:第1光梳 18:第1透過光 19:第1受光器 20:第2照射光 21:第2照射位置 22:第2鏡面反射光 24:第2光軸 26:第2光梳 28:第2透過光 29:第2受光器 40:區域 41:區域 42:區域 43:固持裝置 44:原料膜 45:樹脂膜 46:上側噴嘴(噴嘴) 47:下側噴嘴(噴嘴) 48:噴嘴 49:IR加熱器 51:PET膜基材 53:乾燥機 54:保護膜 55:PET膜基材捲筒 56:積層體捲筒 57:保護膜捲筒 58:拉幅式乾燥機 59:狹縫裝置 60:PET保護膜 61:光學膜 100:拉幅爐 100a:上表面 100b:下表面 101~109:導輥 201:夾輥 202:夾輥 201~204:夾輥 521:噴嘴 522:槽 A:膜之搬送方向1: Optical film 3: vertical axis 10: The first irradiation light 11: The first irradiation position 12: 1st mirror reflection light 14: 1st optical axis 16: 1st optical comb 18: The first transmitted light 19: The first light receiver 20: The second illuminating light 21: 2nd irradiation position 22: 2nd mirror reflection light 24: 2nd optical axis 26: 2nd light comb 28: The second transmitted light 29: The second light receiver 40: area 41: area 42: area 43: holding device 44: raw film 45: Resin film 46: Upper nozzle (nozzle) 47: Lower side nozzle (nozzle) 48: Nozzle 49: IR heater 51: PET film substrate 53: Dryer 54: Protective film 55: PET film substrate roll 56: Laminated body reel 57: Protective film roll 58: Tenter dryer 59: slit device 60: PET protective film 61: Optical film 100: Tenter furnace 100a: upper surface 100b: bottom surface 101~109: Guide roller 201: nip roller 202: nip roller 201~204: nip roller 521: Nozzle 522: slot A: The transport direction of the film

圖1係表示第1反射圖像清晰度值之測定中之光軸之圖。 圖2係表示第2反射圖像清晰度值之測定中之光軸之圖。 圖3係模式性地表示本發明之光學膜之製造方法之較佳實施方式之步驟截面圖。 圖4係模式性地表示本發明之光學膜之製造方法中之加熱步驟之較佳實施方式之步驟截面圖。 圖5係模式性地表示本發明之光學膜之製造方法中之拉幅爐內之較佳實施方式之步驟截面圖。 圖6係用以說明實施例中之光學膜之製造方法之概略圖。 圖7係用以說明實施例中之光學膜之製造方法之概略圖。Fig. 1 is a diagram showing the optical axis in the measurement of the first reflected image sharpness value. Fig. 2 is a diagram showing the optical axis in the measurement of the sharpness value of the second reflected image. FIG. 3 is a schematic cross-sectional view showing the steps of a preferred embodiment of the manufacturing method of the optical film of the present invention. 4 is a step cross-sectional view schematically showing a preferred embodiment of the heating step in the manufacturing method of the optical film of the present invention. FIG. 5 is a schematic cross-sectional view showing a preferred embodiment in the tenter furnace in the method of manufacturing the optical film of the present invention. Fig. 6 is a schematic diagram for explaining the manufacturing method of the optical film in the embodiment. FIG. 7 is a schematic diagram for explaining the manufacturing method of the optical film in the embodiment.

1:光學膜 1: Optical film

3:垂直軸 3: vertical axis

10:第1照射光 10: The first irradiation light

11:第1照射位置 11: The first irradiation position

12:第1鏡面反射光 12: 1st mirror reflection light

14:第1光軸 14: 1st optical axis

16:第1光梳 16: 1st optical comb

18:第1透過光 18: The first transmitted light

19:第1受光器 19: The first light receiver

A:膜之搬送方向 A: The transport direction of the film

Claims (10)

一種光學膜,其係含有選自由聚醯亞胺系樹脂及聚醯胺系樹脂所組成之群中之至少一種樹脂者,並且全光線透過率為85%以上,霧度為0.5%以下,拉伸彈性模數為5.1 GPa以上, 於上述光學膜面內將與製造時之機械流動方向平行之方向設為MD方向,將與該機械流動方向垂直之方向設為TD方向時,於上述光學膜之至少任一面,依據JIS K 7374於光梳之狹縫寬度為0.125 mm之情形時所獲得的自相對於上述光學膜之平面垂直之方向朝向上述MD方向傾斜60°之方向之第1反射圖像清晰度值CMD 與自上述垂直方向朝向上述TD方向傾斜60°之方向之第2反射圖像清晰度值CTD 滿足 數式(1): 45%≦CMD ≦100%・・・(1)、 數式(2): 30%≦CTD ≦100%・・・(2)、及 數式(3): 35%≦(CMD +CTD )/2≦100%・・・(3), 上述光學膜之-40℃下之破斷應變ε1 與25℃下之破斷應變ε2 滿足數式(4): 0.70≦ε12 ≦1.20・・・(4)。An optical film containing at least one resin selected from the group consisting of polyimide resins and polyamide resins, and has a total light transmittance of 85% or more, and a haze of 0.5% or less. When the modulus of elasticity is 5.1 GPa or more, the direction parallel to the mechanical flow direction during manufacture is set as the MD direction in the above-mentioned optical film surface, and the direction perpendicular to the mechanical flow direction is set as the TD direction. At least any one of the surfaces, according to JIS K 7374, when the slit width of the optical comb is 0.125 mm, the first reflection image is obtained from a direction perpendicular to the plane of the optical film to a direction inclined 60° to the MD direction. 60 ° oblique direction of the image clarity value C MD from said vertical direction toward the TD direction of the second reflected image clarity value C satisfies TD (1) equation: 45% ≦ C MD ≦ 100 % · · · ( 1), Mathematical formula (2): 30%≦C TD ≦100%...(2), and Mathematical formula (3): 35%≦(C MD +C TD )/2≦100%...(3 ), at the break of the optical film of -40 ℃ strain ε 1 and broken off at the breaking strain ε 2 25 ℃ satisfy equation (4): 0.70 ≦ ε 1 / ε 2 ≦ 1.20 · · · (4). 如請求項1之光學膜,其中依據JIS K 5600-5-1之耐彎曲性試驗前後之上述霧度之差ΔHaze未達0.3%。Such as the optical film of claim 1, wherein the difference ΔHaze between the above-mentioned haze before and after the bending resistance test according to JIS K 5600-5-1 is less than 0.3%. 如請求項1或2之光學膜,其中依據JIS K 5600-5-1之耐彎曲性試驗前後之上述第1反射圖像清晰度值之差ΔCMD 及上述第2反射圖像清晰度值之差ΔCTD 未達15。The optical film of claim 1 or 2, wherein the difference between the above-mentioned first reflection image definition value ΔC MD and the above-mentioned second reflection image definition value before and after the bending resistance test according to JIS K 5600-5-1 The difference ΔC TD did not reach 15. 如請求項1至3中任一項之光學膜,其厚度為10~150 μm。The optical film of any one of claims 1 to 3, which has a thickness of 10 to 150 μm. 如請求項1至4中任一項之光學膜,其中光學膜中之填料之含量相對於光學膜之總質量為0~5質量%。The optical film according to any one of claims 1 to 4, wherein the content of the filler in the optical film is 0 to 5% by mass relative to the total mass of the optical film. 如請求項1至5中任一項之光學膜,其於至少一面具有硬塗層。The optical film according to any one of claims 1 to 5, which has a hard coat layer on at least one side. 如請求項6之光學膜,其中上述硬塗層之厚度為3~30 μm。The optical film of claim 6, wherein the thickness of the hard coat layer is 3-30 μm. 一種可撓式顯示裝置,其具備如請求項1至7中任一項之光學膜。A flexible display device provided with the optical film as claimed in any one of claims 1 to 7. 如請求項8之可撓式顯示裝置,其進而具備偏光板。Such as the flexible display device of claim 8, which is further provided with a polarizing plate. 如請求項8或9之可撓式顯示裝置,其進而具備觸控感測器。For example, the flexible display device of claim 8 or 9 further includes a touch sensor.
TW110109109A 2020-03-18 2021-03-15 Optical film and flexible display device with excellent visibility in a wide-angle direction and sufficient mechanical properties even in a low temperature environment TW202142604A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-048404 2020-03-18
JP2020048404A JP2021148937A (en) 2020-03-18 2020-03-18 Optical film and flexible display device

Publications (1)

Publication Number Publication Date
TW202142604A true TW202142604A (en) 2021-11-16

Family

ID=77752850

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110109109A TW202142604A (en) 2020-03-18 2021-03-15 Optical film and flexible display device with excellent visibility in a wide-angle direction and sufficient mechanical properties even in a low temperature environment

Country Status (4)

Country Link
JP (1) JP2021148937A (en)
KR (1) KR20210117957A (en)
CN (1) CN113429612A (en)
TW (1) TW202142604A (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4957592B2 (en) 2008-03-10 2012-06-20 新日本理化株式会社 Polyimide resin composition and molded body thereof
WO2018135433A1 (en) * 2017-01-20 2018-07-26 住友化学株式会社 Optical film and production method for optical film
JP2020003781A (en) 2018-06-22 2020-01-09 住友化学株式会社 Resin film, and resin film manufacturing method
JP2020019938A (en) * 2018-07-19 2020-02-06 住友化学株式会社 Polyamide-imide resin
KR102093299B1 (en) * 2018-09-28 2020-06-01 스미또모 가가꾸 가부시키가이샤 Optical film

Also Published As

Publication number Publication date
CN113429612A (en) 2021-09-24
JP2021148937A (en) 2021-09-27
KR20210117957A (en) 2021-09-29

Similar Documents

Publication Publication Date Title
TW202122471A (en) Optical film and flexible display device containing a polyamide-based resin and having excellent bending resistance and a high elastic modulus
CN113429598B (en) Optical film and flexible display device
TW202106823A (en) Varnish, optical film, and method for manufacturing optical film
TW202022020A (en) Optical film having the image to be visually recognized with high sharpness without distortion
TW202140627A (en) Optical film and flexible display device providing an optical film having excellent visibility in a wide-angle direction and having sufficient mechanical properties even in a low temperature environment
TW202302718A (en) Optical laminate and flexible display device
TW202142604A (en) Optical film and flexible display device with excellent visibility in a wide-angle direction and sufficient mechanical properties even in a low temperature environment
JP7469088B2 (en) Optical film and flexible display device
CN113227210A (en) Optical film and flexible display device
JP2020109155A (en) Optical film, flexible display device and polyamide-imide resin
CN113429610B (en) Optical film and flexible display device
TW202142408A (en) Optical film and flexible display device that comprises at least one resin selected from a group consisting of a polyimide resin and a polyamide resin and has a total light transmittance of 85% or more and a haze of 0.5% or less, and an in-plane phase difference RO of 40-300 nm
KR20210117963A (en) Optical film and flexible display device
TW202248295A (en) Optical film
CN113227211A (en) Polyamide resin, optical film, and flexible display device
TW202302719A (en) Optical laminate and flexible display device
TW202035527A (en) Optical film, flexible display device and polyamide-imide resin
JP2021084941A (en) Optical film and flexible display device
KR20200083272A (en) Polyamideimide-based resin, polyamideimide-based resin varnish, optical film and flexible display device
TW202003651A (en) Optical film capable of suppressing a decrease in optical characteristics due to repeated collision of an object