TW202135260A - Combination of furnace surface block and furnace surface base of double vacuum module for crystal welding machine - Google Patents

Combination of furnace surface block and furnace surface base of double vacuum module for crystal welding machine Download PDF

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TW202135260A
TW202135260A TW109115759A TW109115759A TW202135260A TW 202135260 A TW202135260 A TW 202135260A TW 109115759 A TW109115759 A TW 109115759A TW 109115759 A TW109115759 A TW 109115759A TW 202135260 A TW202135260 A TW 202135260A
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furnace
block
longitudinal
perforation
substrate
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TW109115759A
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TWI766276B (en
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黃家豪
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金欣實業有限公司
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Abstract

This creation is a combination of a furnace block and a furnace base of a dual vacuum module for a crystal welding machine, including: a furnace block with a receiving surface for receiving a substrate on the crystal welding machine, and The hearth block includes: a plurality of first perforation groups whose openings are located in a middle area of the receiving surface of the hearth block; and two second perforation groups whose openings are located in two peripheral areas of the receiving surface of the hearth block. The first perforated groups and the two second perforated groups are not connected and connected; and a plurality of first longitudinal channels are used to communicate with the first perforated groups respectively; and the two second longitudinal channels are used to communicate with each other. The two second perforation groups of the two, the first longitudinal channels and the two second longitudinal channels are not connected and conducted; the two lateral channels are connected and conducted with the two second longitudinal channels, and the There is a height difference between the two lateral passages and the two second longitudinal passages; wherein both ends of the first longitudinal passage, the second longitudinal passage, and the transverse passage are closed ends; and a furnace surface base for receiving and fix the hearth block.

Description

用於銲晶機的雙真空模組的爐面塊及爐面底座之組合 Combination of furnace surface block and furnace surface base of dual vacuum module used for soldering crystal machine

本創作係關於一種利用真空吸附之固定基板裝置;更詳而言之,特別係指一種用於銲晶機的雙真空模組的爐面塊及爐面底座之組合。 This creation is about a fixed substrate device using vacuum adsorption; more specifically, it specifically refers to a combination of a furnace top block and a furnace top base of a dual vacuum module used in a crystal soldering machine.

在半導體封裝結構中,其最下方通常係一基板單元(Substrate)。在製程中,通常是在一基板(Substrate Panel)上進行疊設晶片、打線及灌膠等作業後,再切割該基板以形成複數個半導體封裝結構。因此,該製程之第一要務係將該基板平整穩定地固定於一機台上。此外,在製程中常需要利用一傳送裝置搬動該基板,因而也需要將該基板平整穩定地固定於該傳送裝置上。傳統上,利用真空吸附之方法及裝置係為最常見之固定基板之方式。 In the semiconductor package structure, the bottom is usually a substrate unit (Substrate). In the manufacturing process, usually, after stacking wafers, wire bonding, and potting on a substrate (Substrate Panel), the substrate is cut to form a plurality of semiconductor packaging structures. Therefore, the first priority of the manufacturing process is to smoothly and stably fix the substrate on a machine table. In addition, it is often necessary to use a conveying device to move the substrate during the manufacturing process, and therefore, it is also necessary to smoothly and stably fix the substrate on the conveying device. Traditionally, the method and device using vacuum adsorption is the most common way to fix the substrate.

通常對半導體製造用基板或印刷電路板(PCB)進行附持、固定的擋板類之固定方法,包括螺絲、磁鐵、真空吸附和磁鐵並用之固定方法。 Fixing methods such as baffles that usually attach and fix substrates or printed circuit boards (PCBs) used in semiconductor manufacturing include screws, magnets, vacuum suction and magnets.

使用螺絲進行固定的方法,是對用以附持半導體製造用基板或印刷電路板(PCB)的塊狀體進行固定時最常使用的方法,通過利用螺絲在所述塊狀體前後、左右的2個或2個以上位置連接固定,防止真空塊本體 發生移動。 The method of fixing with screws is the most commonly used method for fixing blocks used to attach semiconductor manufacturing substrates or printed circuit boards (PCBs). 2 or more positions are connected and fixed to prevent the vacuum block body Move occurs.

使用磁鐵的方法,是指通過在塊狀體的下側面裝配磁鐵,使其半導體基板或印刷電路板(PCB)附著在固定支撐台中的方法。此時,可以通過調整磁鐵磁性強度的方式對其附著力進行調節。 The method of using a magnet refers to a method in which a semiconductor substrate or a printed circuit board (PCB) is attached to a fixed support table by assembling a magnet on the lower side of a block. At this time, the adhesion of the magnet can be adjusted by adjusting the magnetic strength of the magnet.

在使用真空吸附方式時,在真空塊的支撐體上側面配備真空板,並使真空板板面和真空塊下側面之間形成真空,從而達到附持效果。且近年來動態隨機存取記憶體設計朝向薄型化,容易產生翹曲情況,因此在真空吸附方式時,需要較大的吸附能力,才容易吸附。 When using the vacuum adsorption method, the upper side of the support of the vacuum block is equipped with a vacuum plate, and a vacuum is formed between the surface of the vacuum plate and the lower side of the vacuum block, so as to achieve the attachment effect. In addition, in recent years, the design of dynamic random access memory is becoming thinner, which is prone to warping. Therefore, in the vacuum suction method, a large suction capacity is required to be easy to suction.

因此,綜上所述,根據不同的印刷電路板(PCB),即不同的印刷電路板(PCB)大小和內部晶片佈局,還必須更換使用不同的所述真空塊,才能夠順利進行生產,並且配合動態隨機存取記憶體設計朝向薄型化,容易產生翹曲情況,因此在真空吸附方式時,需要在爐面塊上設計較大的吸附能力。 Therefore, in summary, according to different printed circuit boards (PCB), that is, different printed circuit board (PCB) sizes and internal chip layouts, it is necessary to replace and use different vacuum blocks for smooth production. With the design of dynamic random access memory towards thinner, it is prone to warping. Therefore, in the vacuum adsorption method, it is necessary to design a larger adsorption capacity on the furnace block.

本創作之主要目的在於,提供一種用於銲晶機的雙真空模組的爐面塊及爐面底座之組合,在當動態隨機存取記憶體設計朝向薄型化,容易產生翹曲情況,因此在真空吸附方式時,可以在爐面塊上設計較大的吸附能力,且應用於在銲晶機時,可以減少每次工件需要的吸附次數因而提升產能,節省工作時間,因而提高銲晶機的工作效率。 The main purpose of this creation is to provide a combination of the furnace surface block and furnace surface base of the dual vacuum module for the crystal soldering machine. When the dynamic random access memory is designed to become thinner, it is prone to warping. In the vacuum adsorption mode, a larger adsorption capacity can be designed on the furnace block, and when it is applied to the crystal soldering machine, it can reduce the number of adsorption times required for each workpiece, thereby increasing the production capacity and saving working time, thereby increasing the crystal soldering machine Work efficiency.

為達上揭目的,本創作係提供一種用於銲晶機的雙真空模組的爐面塊及爐面底座之組合,包括:一爐面塊,具有一承接面,用以承接該銲晶機上的一基板,且該爐面塊包括:複數個第一穿孔組,其開口位於該爐面塊之承接面的一中間區域;及兩個第二穿孔組,其開口位於爐面塊之承接面的兩個外圍區域,該些第一穿孔組及該兩個第二穿孔組係不連接 導通;以及複數個第一縱向通道,用以分別連通該些第一穿孔組;兩個第二縱向通道,用以分別連通該兩個的該些第二穿孔組,該些第一縱向通道及該兩個第二縱向通道係不連接導通;兩個橫向通道,其與該兩個第二縱向通道係連接導通,且該兩個橫向通道與該兩個第二縱向通道之間具有一高低差;其中上述第一縱向通道、第二縱向通道及橫向通道之兩端皆為封閉端;以及一爐面底座,用以承接並固定該爐面塊,並分別具有一第一管道及一第二管道用以分別導通該些第一縱向通道及該兩個第二縱向通道,並分別連接該銲晶機之第一真空模組及第二真空模組,以分別獨立產生真空吸附該基板之第一區域及兩個第二區域。 In order to achieve the purpose of the above, this creation is to provide a combination of the furnace top block and the furnace top base for the dual vacuum module of the crystal soldering machine, including: a furnace surface block with a receiving surface for receiving the solder crystal A base plate on the machine, and the furnace block includes: a plurality of first perforation groups, the openings of which are located in a middle area of the receiving surface of the furnace block; and two second perforation groups, the openings of which are located on the furnace surface block The two peripheral areas of the bearing surface, the first perforation groups and the two second perforation groups are not connected And a plurality of first longitudinal channels to respectively communicate with the first perforation groups; two second longitudinal channels to respectively communicate with the two second perforation groups, the first longitudinal channels and The two second longitudinal channels are not connected and conductive; two lateral channels are connected and conductive with the two second longitudinal channels, and there is a height difference between the two lateral channels and the two second longitudinal channels ; Wherein both ends of the first longitudinal channel, the second longitudinal channel and the transverse channel are closed ends; and a furnace surface base for receiving and fixing the furnace surface block, and respectively has a first pipe and a second The pipes are used to respectively conduct the first longitudinal channels and the two second longitudinal channels, and respectively connect the first vacuum module and the second vacuum module of the soldering machine, so as to independently generate vacuum to adsorb the first vacuum of the substrate. One area and two second areas.

本創作之用於銲晶機的雙真空模組的爐面塊及爐面底座之組合,其中,該第一穿孔組及該第二穿孔組係陣列排列成一矩陣。 The combination of the furnace top block and the furnace top base of the dual vacuum module used in the crystal soldering machine of this invention, wherein the first perforation group and the second perforation group are arranged in an array in a matrix.

本創作之用於銲晶機的雙真空模組的爐面塊及爐面底座之組合,其中,該基板之第一區域係相對於該爐面塊之中間區域,以將該基板之第一區域吸附於該爐面塊之中間區域,該基板之兩個第二區域係相對於該爐面塊之兩個外圍區域,以將該基板之兩個第二區域吸附於該爐面塊之兩個外圍區域。 The combination of the furnace top block and the furnace top base of the dual vacuum module used in the crystal soldering machine in this creation, wherein the first area of the substrate is relative to the middle area of the furnace top block, so that the first area of the substrate is The area is adsorbed to the middle area of the furnace block, and the two second areas of the substrate are opposite to the two peripheral areas of the furnace block to adsorb the two second areas of the substrate to the two furnace blocks. A peripheral area.

本創作之用於銲晶機的雙真空模組的爐面塊及爐面底座之組合,其中,該第二穿孔組具有至少一排穿孔連接該第二縱向通道,該些穿孔為圓孔狀或方孔狀。 The combination of the furnace surface block and furnace surface base of the dual vacuum module used in the crystal soldering machine of the present invention, wherein the second perforation group has at least one row of perforations connected to the second longitudinal channel, and the perforations are round holes. Or square hole shape.

本創作之用於銲晶機的雙真空模組的爐面塊及爐面底座之組合,其中,該第二穿孔組具有兩排穿孔連接該第二縱向通道,該兩排穿孔彼此對齊或彼此交錯。 The combination of the furnace top block and the furnace top base of the dual vacuum module used in the crystal soldering machine of the present invention, wherein the second perforation group has two rows of perforations connected to the second longitudinal channel, and the two rows of perforations are aligned or mutually aligned. staggered.

本創作係提供一種用於銲晶機的雙真空模組的爐面塊及爐面底座之組合,包括:一爐面塊,具有一承接面,用以承接該銲晶機上的一基板,且該爐面塊包括:複數個第一穿孔組,其開口位於該爐面塊之承 接面的一中間區域;兩個第二穿孔組,其開口位於爐面塊之承接面的兩個第一外圍區域,該些第一穿孔組及該兩個第二穿孔組係不連接導通;兩個第三穿孔組,其開口位於爐面塊之承接面的中間區域的兩個第二外圍區域,其中該兩個第一外圍區域及該兩個第二外圍區域環繞該中間區域;以及複數個第一縱向通道,用以分別連通該些第一穿孔組;兩個第二縱向通道,用以分別連通該兩個的該些第二穿孔組,該些第一縱向通道及該兩個第二縱向通道係不連接導通;兩個橫向通道,用以分別連通該兩個的該些第三穿孔組,其中該兩個橫向通道與該兩個第二縱向通道係連接導通,且該兩個橫向通道與該兩個第二縱向通道位於同一水平高度;其中上述第一縱向通道、第二縱向通道及橫向通道之兩端皆為封閉端;以及一爐面底座,用以承接並固定該爐面塊,並分別具有一第一管道及一第二管道用以分別導通該些第一縱向通道、該兩個第二縱向通道,並分別連接該銲晶機之第一真空模組及第二真空模組,以分別獨立產生真空吸附該基板之第一區域及兩個第二區域。 This creation is to provide a combination of a furnace top block and a furnace top base of a dual vacuum module for a crystal soldering machine, including: a furnace top block with a receiving surface for receiving a substrate on the crystal soldering machine, And the furnace surface block includes: a plurality of first perforation groups, the openings of which are located in the support of the furnace surface block A middle area of the junction; two second perforation groups, the openings of which are located in the two first peripheral areas of the receiving surface of the furnace block, the first perforation groups and the two second perforation groups are not connected and conductive; Two third perforation groups, the openings of which are located in two second peripheral areas of the middle area of the receiving surface of the furnace block, wherein the two first peripheral areas and the two second peripheral areas surround the middle area; and First longitudinal passages are used to connect the first perforation groups respectively; two second longitudinal passages are used to connect the two second perforation groups, the first longitudinal passages and the two second perforation groups respectively The two longitudinal channels are not connected and connected; two lateral channels are used to connect the two third perforation groups respectively, wherein the two lateral channels and the two second longitudinal channels are connected and connected, and the two The horizontal passage and the two second longitudinal passages are at the same level; the two ends of the first longitudinal passage, the second longitudinal passage and the transverse passage are all closed ends; and a furnace surface base for receiving and fixing the furnace The noodle block has a first pipe and a second pipe respectively for conducting the first longitudinal passages and the two second longitudinal passages respectively, and respectively connecting the first vacuum module and the second vacuum module of the soldering machine The vacuum module separately generates vacuum to adsorb the first area and two second areas of the substrate.

本創作之用於銲晶機的雙真空模組的爐面塊及爐面底座之組合,其中,該第一穿孔組、該第二穿孔組及該第三穿孔組係陣列排列成一矩陣。 The combination of the furnace top block and the furnace top base of the dual vacuum module used in the crystal soldering machine in this invention, wherein the first perforation group, the second perforation group and the third perforation group are arranged in an array in a matrix.

本創作之用於銲晶機的雙真空模組的爐面塊及爐面底座之組合,其中,該基板之第一區域係相對於該爐面塊之中間區域,以將該基板之第一區域吸附於該爐面塊之中間區域,該基板之兩個第二區域係相對於該爐面塊之兩個第一及第二外圍區域,以將該基板之兩個第二區域吸附於該爐面塊之兩個第一及第二外圍區域。 The combination of the furnace top block and the furnace top base of the dual vacuum module used in the crystal soldering machine in this creation, wherein the first area of the substrate is relative to the middle area of the furnace top block, so that the first area of the substrate is The area is adsorbed to the middle area of the furnace block, and the two second areas of the substrate are opposite to the two first and second peripheral areas of the furnace block to adsorb the two second areas of the substrate to the furnace block. Two first and second peripheral areas of the furnace block.

本創作之用於銲晶機的雙真空模組的爐面塊及爐面底座之組合,其中,該第二穿孔組具有至少一排穿孔連接該第二縱向通道。 The combination of the furnace surface block and the furnace surface base of the dual vacuum module used in the crystal soldering machine of the present invention, wherein the second perforation group has at least one row of perforations connected to the second longitudinal channel.

本創作之用於銲晶機的雙真空模組的爐面塊及爐面底座之 組合,其中,該第二穿孔組具有兩排穿孔連接該第二縱向通道。 The furnace surface block and furnace surface base of the dual vacuum module used in the crystal soldering machine in this creation Combination, wherein the second perforation group has two rows of perforations connected to the second longitudinal channel.

本創作之用於銲晶機的雙真空模組吸附爐面塊及爐面底座,在當動態隨機存取記憶體設計朝向薄型化,容易產生翹曲情況,因此在真空吸附方式時,可以在爐面塊上設計較大的吸附能力,且應用於在銲晶機時,可以減少每次工件需要的吸附次數因而提升產能,節省工作時間,因而提高銲晶機的工作效率。 The dual vacuum module used in the crystal soldering machine in this creation to absorb the furnace surface block and furnace surface base, when the dynamic random access memory design is towards thinner, it is prone to warping, so in the vacuum adsorption mode, it can be The furnace surface block is designed with a larger adsorption capacity, and when it is applied to the crystal welding machine, it can reduce the number of adsorption times required for each workpiece, thereby increasing the production capacity and saving working time, thus improving the working efficiency of the crystal welding machine.

為期許本創作之目的、功效、特徵及結構能夠有更為詳盡之了解,茲舉較佳實施例並配合圖式說明如後。 In order to have a more detailed understanding of the purpose, effects, features, and structure of this creation, a preferred embodiment and accompanying drawings are described as follows.

10:爐面塊 10: Stove noodle block

20:爐面塊 20: Stove noodle block

30:爐面底座 30: Stove base

32:第一管道 32: The first pipeline

34:第二管道 34: The second pipeline

100:第一穿孔組 100: The first perforation group

200:第二穿孔組 200: The second perforation group

300:第三穿孔組 300: The third perforation group

110:第一縱向通道 110: The first longitudinal channel

210:第二縱向通道 210: second longitudinal channel

310:橫向通道 310: Lateral channel

410:橫向通道 410: Lateral Channel

120:基板 120: substrate

150:第一區域 150: The first area

180:中間區域 180: middle area

182:溝槽 182: Groove

250:第二區域 250: second area

260:外圍區域 260: Peripheral area

262:溝槽 262: groove

270:第一外圍區域 270: The first peripheral area

280:第二外圍區域 280: The second peripheral area

第1圖:本創作實施例之一用於銲晶機的雙真空模組的爐面塊示意圖; Figure 1: A schematic diagram of a furnace surface block of a dual vacuum module used in a crystal soldering machine in one of the creative embodiments;

第1a圖:本創作實施例之另一用於銲晶機的雙真空模組的爐面塊示意圖; Figure 1a: Another schematic diagram of the furnace surface block of the dual vacuum module used in the crystal soldering machine according to the creative embodiment;

第1b圖:本創作實施例之又一用於銲晶機的雙真空模組的爐面塊示意圖; Figure 1b: Another schematic diagram of the furnace surface block of the dual vacuum module used in the crystal soldering machine according to the creative embodiment;

第2圖:本創作實施例之二用於銲晶機的雙真空模組的爐面塊示意圖; Figure 2: A schematic diagram of the furnace surface block of the dual vacuum module used in the crystal soldering machine in the second embodiment of this creation;

第3圖:本創作實施例之一用於銲晶機的雙真空模組的爐面底座示意圖; Figure 3: A schematic diagram of the furnace surface base of the dual vacuum module used in the crystal soldering machine in one of the creative embodiments;

第4圖:本創作實施例之一用於銲晶機的雙真空模組的爐面塊及爐面底座的組合示意圖。 Figure 4: A schematic diagram of the combination of the furnace surface block and the furnace surface base of the dual vacuum module used in the crystal soldering machine in one of the creative embodiments.

圖1為本創作實施例之一用於銲晶機的雙真空模組的爐面塊示意圖、圖2為本創作實施例之二用於銲晶機的雙真空模組的爐面塊示意圖、圖3為本創作實施例之一用於銲晶機的雙真空模組的爐面底座示意圖及圖4為本創作實施例之一用於銲晶機的雙真空模組的爐面塊及爐面底座的組合示意圖。請參閱第1圖、第3圖及第4圖,一種用於銲晶機的雙真空模組的爐面塊10及爐面底座30之組合,包括:一爐面塊10,具有一 承接面,用以承接該銲晶機(圖未示)上的一基板120,且該爐面塊10包括:複數個第一穿孔組100,其開口位於該爐面塊10之承接面的一中間區域180;及兩個第二穿孔組200,其開口位於爐面塊10之承接面的兩個外圍區域260,該些第一穿孔組100及該兩個第二穿孔組200係不連接導通;以及複數個第一縱向通道110,用以分別連通該些第一穿孔組100;兩個第二縱向通道210,用以分別連通該兩個的該些第二穿孔組200,該些第一縱向通道110及該兩個第二縱向通道210係不連接導通;兩個橫向通道310,其與該兩個第二縱向通道210係連接導通,且該兩個橫向通道310與該兩個第二縱向通道210之間具有一高低差;其中上述第一縱向通道110、第二縱向通道210及橫向通道310之兩端皆為封閉端;以及一爐面底座30,用以承接並固定(舉例:可用螺絲固定)該爐面塊10,並分別具有一第一管道32及一第二管道34用以分別導通該些第一縱向通道110及該兩個第二縱向通道210,並分別連接該銲晶機之第一真空模組及第二真空模組,以分別獨立產生真空吸附該基板120之第一區域150及兩個第二區域250。 Figure 1 is a schematic diagram of a furnace surface block of a dual vacuum module used for a crystal soldering machine in one of the creative embodiments, and Figure 2 is a schematic diagram of a furnace surface block of a dual vacuum module used for a crystal soldering machine in the second creative embodiment. Figure 3 is a schematic diagram of the furnace surface base of the dual vacuum module used in the crystal soldering machine in one of the creative embodiments and Figure 4 is the furnace surface block and the furnace of the dual vacuum module used in the crystal soldering machine in one of the creative embodiments Schematic diagram of the combination of the surface base. Please refer to Figure 1, Figure 3 and Figure 4, a combination of a furnace top block 10 and a furnace top base 30 of a dual vacuum module used in a crystal soldering machine, including: a furnace top block 10 having a The receiving surface is used to receive a substrate 120 on the crystal soldering machine (not shown), and the furnace top block 10 includes: a plurality of first perforation groups 100 whose openings are located on one of the receiving surfaces of the furnace top block 10 The middle area 180; and two second perforation groups 200, the openings of which are located in the two peripheral areas 260 of the receiving surface of the furnace block 10, the first perforation groups 100 and the two second perforation groups 200 are not connected and connected And a plurality of first longitudinal passages 110 to respectively communicate with the first perforation groups 100; two second longitudinal passages 210 to respectively communicate with the two second perforation groups 200, the first The longitudinal channel 110 and the two second longitudinal channels 210 are not connected and conducted; the two lateral channels 310 are connected and conducted with the two second longitudinal channels 210, and the two lateral channels 310 are connected to the two second longitudinal channels. There is a height difference between the longitudinal channels 210; wherein the two ends of the first longitudinal channel 110, the second longitudinal channel 210, and the transverse channel 310 are closed ends; and a furnace surface base 30 for receiving and fixing (for example: (It can be fixed with screws) The furnace top block 10 has a first pipe 32 and a second pipe 34 for respectively conducting the first longitudinal channels 110 and the two second longitudinal channels 210, and respectively connecting the welding The first vacuum module and the second vacuum module of the crystal machine can separately generate the first area 150 and two second areas 250 of the substrate 120 by vacuum adsorption.

請參閱第1圖,該第一穿孔組100及該第二穿孔組200係陣列排列成一矩陣。 Please refer to FIG. 1, the first perforation group 100 and the second perforation group 200 are arranged in an array in a matrix.

請參閱第1圖及第4圖,該基板120之第一區域150係相對於該爐面塊10之中間區域180,以將該基板120之第一區域150吸附於該爐面塊之中間區域180,該基板120之兩個第二區域250係相對於該爐面塊10之兩個外圍區域260,以將該基板120之兩個第二區域250吸附於該爐面塊10之兩個外圍區域260。 Please refer to Figures 1 and 4, the first area 150 of the substrate 120 is opposite to the middle area 180 of the furnace top block 10 to adsorb the first area 150 of the substrate 120 to the middle area of the furnace top block 180. The two second regions 250 of the substrate 120 are opposite to the two peripheral regions 260 of the furnace top block 10 so as to adsorb the two second regions 250 of the substrate 120 to the two peripheral regions of the furnace top block 10 Area 260.

請參閱第1圖,該第二穿孔組200具有至少一排穿孔連接該第二縱向通道210。例如,該第二穿孔組200具有兩排穿孔連接該第二縱向通道210,該兩排穿孔彼此對齊,以增加該爐面塊對該基板之兩個第二區域的吸附力面積。該些穿孔可為圓孔狀或方孔狀。 Please refer to FIG. 1, the second perforation group 200 has at least one row of perforations connected to the second longitudinal channel 210. For example, the second perforation group 200 has two rows of perforations connected to the second longitudinal channel 210, and the two rows of perforations are aligned with each other to increase the adsorption area of the furnace top block to the two second regions of the substrate. The perforations may be round holes or square holes.

請參閱第1a圖,該第二穿孔組200具有兩排穿孔連接該第二縱向通道210,該兩排穿孔彼此交錯,以增加該爐面塊對該基板之兩個第二區域的吸附力均勻性。該些穿孔可為圓孔狀或方孔狀。 Please refer to Figure 1a, the second perforation group 200 has two rows of perforations connected to the second longitudinal channel 210, and the two rows of perforations are staggered to increase the uniform adsorption force of the furnace block to the two second regions of the substrate. sex. The perforations may be round holes or square holes.

再者,請參閱第1b圖,該爐面塊10之中間區域180及兩個外圍區域260可設有多條環形溝槽182、262,該多條環形溝槽182、262之位置分別與該第一穿孔組100及該第二穿孔組200之位置重疊,以增加該爐面塊對該基板的吸附力面積及均勻性。該多條環形溝槽182、262之深度可介於0.1~2mm。 Furthermore, referring to Figure 1b, the middle area 180 and the two peripheral areas 260 of the furnace top block 10 can be provided with a plurality of annular grooves 182, 262, and the positions of the plurality of annular grooves 182, 262 are respectively The positions of the first perforation group 100 and the second perforation group 200 overlap to increase the area and uniformity of the adsorption force of the furnace block to the substrate. The depth of the plurality of annular grooves 182 and 262 may be between 0.1 and 2 mm.

請參閱第2圖、第3圖及第4圖,一種用於銲晶機的雙真空模組的爐面塊20及爐面底座30之組合,包括:一爐面塊20,具有一承接面,用以承接該銲晶機(圖未示)上的一基板120,且該爐面塊20包括:複數個第一穿孔組100,其開口位於該爐面塊20之承接面的一中間區域180;兩個第二穿孔組200,其開口位於爐面塊20之承接面的兩個第一外圍區域270,該些第一穿孔組100及該兩個第二穿孔組200係不連接導通;兩個第三穿孔組300,其開口位於爐面塊20之承接面的中間區域180的兩個第二外圍區域280,其中該兩個第一外圍區域270及該兩個第二外圍區域280環繞該中間區域180;以及複數個第一縱向通道110,用以分別連通該些第一穿孔組100;兩個第二縱向通道210,用以分別連通該兩個的該些第二穿孔組200,該些第一縱向通道110及該兩個第二縱向通道210係不連接導通;兩個橫向通道410,用以分別連通該兩個的該些第三穿孔組300,其中該兩個橫向通道410與該兩個第二縱向通道210係連接導通,且該兩個橫向通道410與該兩個第二縱向通道210位於同一水平高度;其中上述第一縱向通道110、第二縱向通道210及橫向通道410之兩端皆為封閉端;以及一爐面底座30,用以承接並固定(舉例:可用螺絲固定)該爐面塊20,並分別具有一第一管道32及一第二管道34用以分別導通該些第一縱向通道110、該兩 個第二縱向通道210,並分別連接該銲晶機之第一真空模組及第二真空模組,以分別獨立產生真空吸附該基板120之第一區域150及兩個第二區域250。 Please refer to Figures 2, 3 and 4, a combination of a furnace top block 20 and a furnace top base 30 of a dual vacuum module used in a crystal soldering machine, including: a furnace top block 20 with a receiving surface , For receiving a substrate 120 on the crystal soldering machine (not shown), and the furnace block 20 includes: a plurality of first perforation groups 100, the opening of which is located in a middle area of the receiving surface of the furnace block 20 180; Two second perforation groups 200, the openings of which are located in the two first peripheral regions 270 of the receiving surface of the furnace block 20, the first perforation groups 100 and the two second perforation groups 200 are not connected and conductive; Two third perforation groups 300, the openings of which are located in two second peripheral areas 280 of the middle area 180 of the receiving surface of the furnace block 20, wherein the two first peripheral areas 270 and the two second peripheral areas 280 surround The intermediate area 180; and a plurality of first longitudinal channels 110 to respectively communicate with the first perforation groups 100; two second longitudinal channels 210 to respectively communicate with the two second perforation groups 200, The first longitudinal passages 110 and the two second longitudinal passages 210 are not connected and connected; two transverse passages 410 are used to respectively communicate with the two third perforation groups 300, wherein the two transverse passages 410 The two second longitudinal channels 210 are connected and conducted, and the two transverse channels 410 and the two second longitudinal channels 210 are located at the same level; wherein the above-mentioned first longitudinal channel 110, second longitudinal channel 210 and transverse channel Both ends of the 410 are closed ends; and a furnace top base 30 for receiving and fixing (for example: can be fixed with screws) the furnace top block 20, and has a first pipe 32 and a second pipe 34 respectively for Respectively conduct the first longitudinal channels 110, the two A second longitudinal channel 210 is respectively connected to the first vacuum module and the second vacuum module of the soldering machine to independently generate a vacuum to adsorb the first area 150 and two second areas 250 of the substrate 120 respectively.

請參閱第2圖,該第一穿孔組100、該第二穿孔組200及該第三穿孔組300係陣列排列成一矩陣。 Please refer to FIG. 2, the first perforation group 100, the second perforation group 200, and the third perforation group 300 are arranged in an array in a matrix.

請參閱第2圖,該基板120之第一區域150係相對於該爐面塊20之中間區域180,以將該基板120之第一區域150吸附於該爐面塊之中間區域180,該基板120之兩個第二區域250係相對於該爐面塊20之兩個第一及第二外圍區域270、280,以將該基板120之兩個第二區域250吸附於該爐面塊20之兩個第一及第二外圍區域270、280。 Please refer to Figure 2, the first area 150 of the substrate 120 is opposite to the middle area 180 of the furnace block 20, so that the first area 150 of the substrate 120 is adsorbed to the middle area 180 of the furnace block. The two second areas 250 of 120 are opposite to the two first and second peripheral areas 270, 280 of the furnace block 20, so that the two second areas 250 of the substrate 120 are adsorbed on the furnace block 20. Two first and second peripheral areas 270, 280.

請參閱第2圖,該第二穿孔組200具有一排穿孔連接該第二縱向通道210。 Please refer to FIG. 2, the second perforation group 200 has a row of perforations connected to the second longitudinal channel 210.

請參閱第2圖,該第二穿孔組200具有兩排穿孔連接該第二縱向通道210。 Please refer to FIG. 2, the second perforation group 200 has two rows of perforations connected to the second longitudinal channel 210.

綜上所述,本創作用於銲晶機的雙真空模組吸附爐面塊及爐面底座,在當動態隨機存取記憶體設計朝向薄型化,容易產生翹曲情況,因此在真空吸附方式時,可以在爐面塊上設計較大的吸附能力,且應用於在銲晶機時,可以減少每次工件需要的吸附次數因而提升產能,節省工作時間,因而提高銲晶機的工作效率。 To sum up, the dual vacuum module used in the crystal soldering machine to absorb the furnace surface block and furnace surface base in this creation, when the dynamic random access memory is designed to become thinner, it is prone to warping, so in the vacuum adsorption method At the same time, a larger adsorption capacity can be designed on the furnace surface block, and when it is applied to the crystal welding machine, it can reduce the number of adsorption times required for each workpiece, thereby increasing the production capacity and saving working time, thus improving the working efficiency of the crystal welding machine.

故,本創作在同類產品中具有極佳之進步性以及實用性,同時查遍國內外關於此類之技術資料文獻後,確實未發現有相同或近似之構造或技術存在於本案申請之前,因此本案應已符合『可專利性』、『合於產業利用性』以及『進步性』的專利要件,爰依法提出申請之。 Therefore, this creation has excellent advancement and practicality among similar products. At the same time, after checking domestic and foreign technical materials and documents about this kind, it is true that no identical or similar structure or technology exists before the application of this case. Therefore, This case should have met the patent requirements of "patentability", "applicability for industrial use" and "progressiveness", and an application was filed in accordance with the law.

唯,以上所述者,僅係本創作之較佳實施例而已,舉凡應用本創作說明書及申請專利範圍所為之其它等效結構變化者,理應包含在本 創作之申請專利範圍內。 However, the above are only the preferred embodiments of this creation. Any other equivalent structural changes made in this creation specification and the scope of the patent application should be included in this creation. The creation is within the scope of patent application.

10:爐面塊 10: Stove noodle block

100:第一穿孔組 100: The first perforation group

200:第二穿孔組 200: The second perforation group

110:第一縱向通道 110: The first longitudinal channel

210:第二縱向通道 210: second longitudinal channel

310:橫向通道 310: Lateral channel

180:中間區域 180: middle area

260:外圍區域 260: Peripheral area

Claims (10)

一種用於銲晶機的雙真空模組的爐面塊及爐面底座之組合,包括: A combination of the furnace top block and the furnace top base of the dual vacuum module used for the crystal soldering machine, including: 一爐面塊,具有一承接面,用以承接該銲晶機上的一基板,且該爐面塊包括: A furnace noodle block has a receiving surface for receiving a substrate on the crystal soldering machine, and the furnace noodle block includes: 複數個第一穿孔組,其開口位於該爐面塊之承接面的一中間區域;及 A plurality of first perforation groups, the openings of which are located in a middle area of the receiving surface of the furnace block; and 兩個第二穿孔組,其開口位於爐面塊之承接面的兩個外圍區域,該些第一穿孔組及該兩個第二穿孔組係不連接導通;以及 Two second perforation groups, the openings of which are located in two peripheral areas of the receiving surface of the furnace block, the first perforation groups and the two second perforation groups are not connected and conductive; and 複數個第一縱向通道,用以分別連通該些第一穿孔組; A plurality of first longitudinal passages for respectively communicating with the first perforation groups; 兩個第二縱向通道,用以分別連通該兩個的該些第二穿孔組,該些第一縱向通道及該兩個第二縱向通道係不連接導通; Two second longitudinal passages for connecting the two second perforation groups respectively, the first longitudinal passages and the two second longitudinal passages are not connected and conducted; 兩個橫向通道,其與該兩個第二縱向通道係連接導通,且該兩個橫向通道與該兩個第二縱向通道之間具有一高低差; Two transverse channels, which are connected to the two second longitudinal channels, and there is a height difference between the two transverse channels and the two second longitudinal channels; 其中上述第一縱向通道、第二縱向通道及橫向通道之兩端皆為封閉端;以及 Wherein both ends of the first longitudinal channel, the second longitudinal channel and the transverse channel are closed ends; and 一爐面底座,用以承接並固定該爐面塊,並分別具有一第一管道及 A furnace surface base for receiving and fixing the furnace surface block, and respectively has a first pipe and 一第二管道用以分別導通該些第一縱向通道及該兩個第二縱向通道,並分別連接該銲晶機之第一真空模組及第二真空模組,以分別獨立產生真空吸附該基板之第一區域及兩個第二區域。 A second pipe is used to respectively conduct the first longitudinal passages and the two second longitudinal passages, and respectively connect the first vacuum module and the second vacuum module of the soldering machine, so as to independently generate vacuum to absorb the The first area and two second areas of the substrate. 如申請專利範圍第1項所述之用於銲晶機的雙真空模組的爐面塊及爐面底座之組合,其中,該第一穿孔組及該第二穿孔組係陣列排列成一矩陣;以及,該爐面塊之中間區域及兩個外圍區域設有多條環形溝槽,該多條環形溝槽之位置分別與該第一穿孔組及該第二穿孔組之位置重疊。 The combination of the furnace top block and the furnace top base of the dual vacuum module used for the crystal soldering machine as described in the first item of the patent application, wherein the first perforation group and the second perforation group are arranged in an array in a matrix; And, the middle area and the two peripheral areas of the furnace block are provided with a plurality of annular grooves, and the positions of the plurality of annular grooves respectively overlap with the positions of the first perforation group and the second perforation group. 如申請專利範圍第1項所述之用於銲晶機的雙真空模組的爐面塊及爐面 底座之組合,其中,該基板之第一區域係相對於該爐面塊之中間區域,以將該基板之第一區域吸附於該爐面塊之中間區域,該基板之兩個第二區域係相對於該爐面塊之兩個外圍區域,以將該基板之兩個第二區域吸附於該爐面塊之兩個外圍區域。 The furnace surface block and furnace surface of the dual vacuum module used for the crystal soldering machine as described in item 1 of the scope of patent application The combination of the base, wherein the first area of the substrate is relative to the middle area of the furnace top block to adsorb the first area of the substrate to the middle area of the furnace top block, and the two second areas of the substrate are Relative to the two peripheral areas of the furnace block, the two second areas of the substrate are adsorbed on the two peripheral areas of the furnace block. 如申請專利範圍第1項所述之用於銲晶機的雙真空模組的爐面塊及爐面底座之組合,其中,該第二穿孔組具有至少一排穿孔連接該第二縱向通道,該些穿孔為圓孔狀或方孔狀。 The combination of the furnace surface block and the furnace surface base of the dual vacuum module for the crystal soldering machine as described in the first item of the patent application, wherein the second perforation group has at least one row of perforations connected to the second longitudinal channel, These perforations are round holes or square holes. 如申請專利範圍第1項所述之用於銲晶機的雙真空模組的爐面塊及爐面底座之組合,其中,該第二穿孔組具有兩排穿孔連接該第二縱向通道,該兩排穿孔彼此對齊或彼此交錯。 The combination of the furnace surface block and the furnace surface base of the dual vacuum module used for the crystal soldering machine as described in the first item of the patent application, wherein the second perforation group has two rows of perforations connected to the second longitudinal channel, the The two rows of perforations are aligned with each other or staggered with each other. 一種用於銲晶機的雙真空模組的爐面塊及爐面底座之組合,包括: A combination of the furnace top block and the furnace top base of the dual vacuum module used for the crystal soldering machine, including: 一爐面塊,具有一承接面,用以承接該銲晶機上的一基板,且該爐面塊包括: A furnace noodle block has a receiving surface for receiving a substrate on the crystal soldering machine, and the furnace noodle block includes: 複數個第一穿孔組,其開口位於該爐面塊之承接面的一中間區域; A plurality of first perforation groups, the openings of which are located in a middle area of the receiving surface of the furnace block; 兩個第二穿孔組,其開口位於爐面塊之承接面的兩個第一外圍區域,該些第一穿孔組及該兩個第二穿孔組係不連接導通; Two second perforation groups, the openings of which are located in the two first peripheral areas of the receiving surface of the furnace block, the first perforation groups and the two second perforation groups are not connected and conductive; 兩個第三穿孔組,其開口位於爐面塊之承接面的中間區域的兩個第二外圍區域,其中該兩個第一外圍區域及該兩個第二外圍區域環繞該中間區域;以及 Two third perforation groups, the openings of which are located in two second peripheral regions of the middle region of the receiving surface of the furnace block, wherein the two first peripheral regions and the two second peripheral regions surround the middle region; and 複數個第一縱向通道,用以分別連通該些第一穿孔組; A plurality of first longitudinal channels for respectively communicating with the first perforation groups; 兩個第二縱向通道,用以分別連通該兩個的該些第二穿孔組,該些第一縱向通道及該兩個第二縱向通道係不連接導通; Two second longitudinal channels for connecting the two second perforation groups respectively, the first longitudinal channels and the two second longitudinal channels are not connected and conducted; 兩個橫向通道,用以分別連通該兩個的該些第三穿孔組,其中該兩個橫向通道與該兩個第二縱向通道係連接導通,且該兩個橫向通道與該兩個第二縱向通道位於同一水平高度; Two transverse passages are used to connect the two third perforation groups respectively, wherein the two transverse passages are connected and communicated with the two second longitudinal passages, and the two transverse passages are connected to the two second longitudinal passages. The longitudinal channels are located at the same level; 其中上述第一縱向通道、第二縱向通道及橫向通道之兩端皆為封閉端;以及 Wherein both ends of the first longitudinal channel, the second longitudinal channel and the transverse channel are closed ends; and 一爐面底座,用以承接並固定該爐面塊,並分別具有一第一管道及一第二管道用以分別導通該些第一縱向通道、該兩個第二縱向通道,並分別連接該銲晶機之第一真空模組及第二真空模組,以分別獨立產生真空吸附該基板之第一區域及兩個第二區域。 A stove top base for receiving and fixing the stove top block, and each having a first pipe and a second pipe for respectively conducting the first longitudinal channels and the two second longitudinal channels, and respectively connecting the The first vacuum module and the second vacuum module of the wafer soldering machine independently generate vacuum to adsorb the first area and two second areas of the substrate. 如申請專利範圍第6項所述之用於銲晶機的雙真空模組的爐面塊及爐面底座之組合,其中,該第一穿孔組、該第二穿孔組及該第三穿孔組係陣列排列成一矩陣。 The combination of the furnace top block and the furnace top base for the dual vacuum module of the crystal soldering machine as described in item 6 of the scope of patent application, wherein the first perforation group, the second perforation group and the third perforation group The arrays are arranged in a matrix. 如申請專利範圍第6項所述之用於銲晶機的雙真空模組的爐面塊及爐面底座之組合,其中,該基板之第一區域係相對於該爐面塊之中間區域,以將該基板之第一區域吸附於該爐面塊之中間區域,該基板之兩個第二區域係相對於該爐面塊之兩個第一及第二外圍區域,以將該基板之兩個第二區域吸附於該爐面塊之兩個第一及第二外圍區域。 The combination of the furnace top block and the furnace top base for the dual vacuum module of the crystal soldering machine as described in item 6 of the scope of patent application, wherein the first area of the substrate is relative to the middle area of the furnace top block, In order to adsorb the first area of the substrate to the middle area of the furnace block, the two second areas of the substrate are opposite to the two first and second peripheral areas of the furnace block, so that the two of the substrate A second area is adsorbed on the two first and second peripheral areas of the furnace block. 如申請專利範圍第6項所述之用於銲晶機的雙真空模組的爐面塊及爐面底座之組合,其中,該第二穿孔組具有至少一排穿孔連接該第二縱向通道。 The combination of the furnace top block and the furnace top base for the dual vacuum module of the crystal soldering machine as described in item 6 of the scope of patent application, wherein the second perforation group has at least one row of perforations connected to the second longitudinal channel. 如申請專利範圍第6項所述之用於銲晶機的雙真空模組的爐面塊及爐面底座之組合,該第二穿孔組具有兩排穿孔連接該第二縱向通道。 For the combination of the furnace top block and the furnace top base of the dual vacuum module used in the crystal soldering machine described in item 6 of the scope of patent application, the second perforation group has two rows of perforations connected to the second longitudinal channel.
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