TW202133314A - Mechanical arm calibration device of wafer transfer mechanism and calibration method thereof including an image capturing component, a wafer positioning member loading and unloading mechanism, and a wafer pick-and-place mechanism - Google Patents

Abstract

A mechanical arm calibration device of a wafer transfer mechanism and a calibration method thereof are disclosed. An image capturing component and a wafer positioning member loading and unloading mechanism are arranged on a movable end of a first mechanical arm. The image capturing component has an upper image pickup element, and the wafer positioning member loading and unloading mechanism has a positioning scale. A wafer pick-and-place mechanism is arranged on a movable end of a second mechanical arm, and an indicator scale is provided on the wafer pick-and-place mechanism. A main calibration mechanism has a lower image pickup element, and a transparent sheet with a standard scale is provided above the lower image pickup element. The upper and lower image pickup elements respectively capture images of the standard scale in order to calibrate the image capturing component and establish the reference point coordinates of the first mechanical arm. The lower image pickup element sees through the position image of the positioning scale; therefore, the wafer positioning member loading and unloading mechanism can be calibrated, and the relative coordinates between the image capturing component and the wafer positioning member loading and unloading mechanism can be calculated. The lower image pickup element sees through the position image of the indicator scale; therefore, the wafer pick-and-place mechanism can be calibrated, and the reference point coordinates of the second mechanical arm can be established.

Description

Mechanical arm calibration device of wafer transfer mechanism and calibration method thereof

The present invention relates to a robot arm calibration device for a wafer transfer mechanism and a calibration method thereof, in particular to a method that can calibrate different robot arms to establish a common reference point coordinate, and at the same time obtain the relative coordinates of different mechanisms on a single robot arm, so that each A calibration device and method for the robot arm to maintain accurate movement accuracy.

The general integrated circuit (IC) manufacturing process can be divided into three parts: silicon wafer manufacturing, integrated circuit manufacturing, and integrated circuit packaging; when the silicon ingot is cut into wafers, it needs After yellow light, crystal growth, etching, mechanical polishing and other complicated procedures, the production of the integrated circuit can be completed. In the above manufacturing process, the wafer is tested, cleaned, evaporated, dried or soaked. For organic solvents and other processes, in order to effectively fix the wafers for processing, each wafer needs to be fixed on a wafer tray first, and each wafer tray carries each wafer to perform the processing operations of the above processes .

The basic structure of the conventional wafer disk is a disk body with an area slightly larger than the outer diameter of the wafer. A separable ring frame is provided above the disk body to define a position for accommodating the wafer. A plurality of buckling mechanisms are arranged on the periphery of the disc body, and the annular frame body can be clamped by the buckling mechanisms to be pressed on the periphery of the wafer to form a positioning.

In practical applications, in order to process a larger amount of wafers at the same time, most of the wafer trays are placed on a large-area carrier tray, which can accommodate multiple wafer trays and move them to different types at the same time. Processing procedures to effectively increase the efficiency of wafer processing.

With the gradual popularity of automated processing, it is inevitable to use robotic arms to perform pick-and-place actions between each wafer and each wafer tray in the carrier, which not only saves a lot of manpower, but also reduces production costs and improves processing efficiency. However, since the general wafer itself is extremely fragile and requires extremely high processing precision, not only does it require a single robot arm to pick and place wafers, it also has extremely high requirements for the accuracy of the operation. When picking and placing the same wafers separately, they must have the same accuracy; therefore, how to effectively calibrate each robot arm so that it not only maintains proper accuracy when a single robot arm performs different processing actions, but also allows different robot arms to use a common reference In order to ensure the accuracy of handling wafers by robot arms under the operation requirements of placing wafers by robot arms, it is an urgent task for all related industries to form an excellent relative activity correlation.

In view of the above-mentioned limitation requirements for the conventional way of picking and placing wafers in each wafer tray on the carrier tray, the inventors studied and improved ways to address these shortcomings, and finally the present invention came into being.

The main purpose of the present invention is to provide a robotic arm calibration device for a wafer transfer mechanism and a calibration method thereof, which are mainly provided with an image grabbing assembly and a wafer positioning member loading and unloading mechanism on a movable end of a first robotic arm. The assembly has an upper image capturing element, the wafer positioning member loading and unloading mechanism has a positioning scale, a main correction mechanism is arranged in the movable range of the first mechanical arm, the main correction mechanism has a lower image capturing element, and the lower image capturing element A transparent sheet with a standard scale is provided on the upper side; the first mechanical arm is used to drive the image capture assembly so that the upper and lower image capture elements capture images of the standard scale respectively. The image capture assembly can be calibrated and the first The reference point coordinates of the robotic arm; and the first robotic arm drives the wafer positioning member loading and unloading mechanism, and the lower image capturing element sees through the position image of the positioning scale, so that the wafer positioning member loading and unloading mechanism can be corrected and the wafer positioning member loading and unloading mechanism can be calculated. The relative coordinates between the image grabbing assembly and the wafer positioning member loading and unloading mechanism; therefore, in actual applications, the image grabbing assembly can be used to easily locate the correct position on the area to be operated, and then directly use the relative coordinate setting to make The wafer positioning member loading and unloading mechanism is directly moved to the correct position to facilitate subsequent processing operations, which not only simplifies the operating procedures, but also maintains the accuracy of operations between different mechanisms on a single robotic arm.

Another object of the present invention is to provide a robotic arm calibration device for a wafer transfer mechanism and a calibration method thereof, which is additionally provided with a wafer pick-and-place mechanism on the movable end of a second robotic arm, and the wafer pick-and-place mechanism is With indicating scale, the second robotic arm is used to drive the wafer pick-and-place mechanism, so that the lower imaging element sees through the position image of the instruction scale, the wafer pick-and-place mechanism can be calibrated, and the second robotic arm is established The reference point coordinates, and the reference point coordinates of the second robot arm are the same as the reference point coordinates of the first robot arm, so that an accurate mutual relationship is established between the first and second robot arms.

In order to achieve the above objectives and effects, the technical means adopted by the present invention include: a robotic arm calibration device of a wafer transfer mechanism, which has: a first robotic arm connected and driven by a control module, and The movable end of the robotic arm is provided with an image grabbing assembly and a wafer positioning member loading and unloading mechanism. The image grabbing assembly has an upper image capturing element. The wafer positioning member loading and unloading mechanism has a positioning surface on which a positioning surface is provided. Positioning scale; a second robotic arm, connected and driven by the control module, a wafer pick-and-place mechanism is provided on the movable end of the second robotic arm, and an indicator scale is provided on the wafer pick-and-place mechanism; A main calibration mechanism is set within the movable range of the first and second robot arms, and is connected and driven by the control module to calibrate the positions of the image grabbing assembly and the wafer pick-and-place mechanism respectively. The correction mechanism has a lower image capturing element, a transparent sheet is arranged above the lower image capturing element, and a standard scale serving as a positioning reference is provided on the transparent sheet.

According to the above structure, the main correction mechanism is provided with a range-finding laser light source beside the lower image-taking element.

According to the above structure, the plurality of laser light sources are respectively arranged at at least three points outside the positioning surface.

According to the above structure, the positioning scale is selected from a hole or a scale.

According to the above structure, the wafer pick-and-place mechanism is a wafer chuck capable of sucking wafers.

The technical means adopted in the present invention further includes: a method for calibrating a robotic arm using the aforementioned wafer transfer mechanism, at least having: a step of "comparing the position difference between the lower image capturing element and the upper image capturing element to obtain a standard scale", which is The image capture component is driven by the first mechanical arm to move above the main correction mechanism, and the lower image capturing element directly obtains the position image of the standard scale on the transparent film to form a lower standard position image, and the upper image capturing element obtains The position image of the standard scale on the transparent film forms an upper standard position image; the control module compares the difference between the lower standard position image and the upper standard position image; a "establish the reference point coordinates of the first robotic arm "Step, the first mechanical arm drives the image capture assembly to move to an image capture correction position, so that the lower standard position image overlaps the upper standard position image, thereby correcting the image capture range of the image capture assembly, and The control module memorizes the coordinates of the image capture correction position of the image capture component to establish the reference point coordinates of the first robotic arm; a step of "comparing the image capture element to obtain the position difference between the positioning scale position and the standard scale" , The first mechanical arm drives the wafer positioning member loading and unloading mechanism to move above the main correction mechanism, and the lower image capturing element penetrates the transparent sheet to see through the position image of the positioning scale on the positioning surface to form a positioning The position image is compared by the control module to the difference between the standard position image and the positioning position image; a step of "establishing the correct operating position of the wafer positioner handling mechanism" is to drive the wafer by the first robot arm The positioning member loading and unloading mechanism moves to a loading and unloading calibration position, so that the lower standard position image overlaps the positioning position image, so as to calibrate the working position of the wafer positioning member loading and unloading mechanism, and the wafer positioning member loading and unloading is memorized by the control module The coordinates of the mounting and dismounting calibration position of the mechanism are calculated and memorized, and the relative coordinates between the capturing and dismounting calibration position and the mounting and dismounting calibration position are calculated and memorized; a step of "comparing the capturing element to obtain the position difference between the indicated scale position and the standard scale" is performed by The second mechanical arm drives the wafer pick-and-place mechanism to move above the main correction mechanism, and the lower image pick-up element penetrates the transparent sheet to see through the position image of the indicator scale on the wafer pick-and-place mechanism to form an indicator position Then, the control module compares the difference between the standard position image and the indicated position image; a step of "establishing the reference point coordinates of the second robot arm" is that the second robot arm drives the wafer to fetch The placement mechanism is moved to a pick-and-place calibration position, so that the lower standard position image overlaps the indicated position image, so as to calibrate the working position of the wafer pick-and-place mechanism, and the control module memorizes the wafer pick-and-place mechanism's pick-and-place mechanism Set the coordinates of the correction position to establish the reference point coordinates of the second robot arm, and make the first and second robot arms have the same reference point coordinates.

According to the above method, before performing the step of "comparing the position difference between the lower image capturing element and the upper image capturing element to obtain the standard scale", a step of "adjusting the lens focal length of the upper image capturing element corresponding to the standard scale" is performed in advance, by The main correction mechanism uses the laser beam generated by the distance measuring laser light source to project to the standard scale position of the image capture component, and can measure the distance between the main correction mechanism and the standard scale, and adjust the lens focal length of the upper image capturing element , In order to facilitate the upper image capturing element to clearly obtain the position image of the standard scale on the transparent film.

According to the above method, before performing the step of "comparing the lower image capturing element to obtain the position difference between the positioning scale and the standard scale", a step of "adjusting the lens focal length of the lower image capturing element corresponding to the positioning scale" is performed in advance. The main calibration mechanism uses the laser beam generated by the distance measuring laser light source to project onto the positioning scale of the positioning surface, so as to measure the distance between the main calibration mechanism and the wafer positioning member loading and unloading mechanism, and adjust the lower image capturing element The focal length of the lens facilitates the lower image capturing element to clearly obtain the position image of the positioning scale of the wafer positioning member loading and unloading mechanism.

According to the above method, before performing the step of "comparing the lower image capturing element to obtain the position difference between the indicated scale position and the standard scale", a step of "adjusting the lens focal length of the lower image capturing element corresponding to the indicated scale" is performed in advance, and the The main calibration mechanism uses the laser beam generated by the distance measuring laser light source to project onto the indicator scale structure of the wafer pick-and-place machine, so as to measure the distance between the main calibration mechanism and the indicator scale to adjust the lower imaging element The focal length of the lens facilitates the lower image capturing element to clearly obtain the position image of the indicator scale of the wafer pick-and-place machine.

In order to obtain a more detailed understanding of the above-mentioned objects, effects and features of the present invention, the following descriptions are given with reference to the following drawings:

Please refer to Figure 1, it can be seen that the main structure of the present invention includes: the first robot arm 1, the image grabbing assembly 2, the wafer positioning member loading and unloading mechanism 3, the second robot arm 4, the wafer picking and placing mechanism 5 and the main calibration Mechanism 6 and other parts; wherein the first mechanical arm 1 is connected and driven by a control module (which can be a computer with arithmetic functions, not shown) for multi-axis pivoting activities.

The image grabbing assembly 2 and the wafer positioning member loading and unloading mechanism 3 are respectively assembled on the movable end of the first robotic arm 1. The image grabbing assembly 2 is provided with an image capturing element 21 (which can be a CCD Camera), the wafer positioning member loading and unloading mechanism 3 is provided with a positioning surface 31, the positioning surface 31 (center) is provided with a positioning scale 32 (may be a hole or a scale), and at least two positioning scales are provided on the outer peripheral side of the positioning surface 31 A relatively movable clamping member 33, the wafer positioning member loading and unloading mechanism 3 (positioning surface 31) is provided with a plurality of uniformly distributed laser light sources 34 on the peripheral side, and the plurality of laser light sources 34 are respectively arranged outside the positioning surface 31 At least three points aside.

The second mechanical arm 4 is connected and driven by the control module for multi-axis activities.

The wafer pick-and-place mechanism 5 is assembled on the movable end of the second robotic arm 4, and an indicator scale 51 is provided on the wafer pick-and-place mechanism 5; in a feasible embodiment, the wafer pick-and-place The mechanism 5 is a wafer chuck with vacuum suction.

The main correction mechanism 6 is arranged in the common range of movement of the first and second mechanical arms 1, 4, and is connected and driven by the control module. The main correction mechanism 6 is provided with an imaging element under the illumination light source 62 (can be a CCD camera), and at least one distance-measuring laser light source 61 with the function of measuring distance; a transparent sheet 63 is arranged above the lower image capturing element 62, and a standard scale 631 is arranged in the center of the transparent sheet 63 .

Please refer to Figure 3, it can be seen that the calibration method of the present invention includes: "adjust the lens focal length of the upper image capturing element 21 corresponding to the standard scale 631" S11, "comparing the lower image capturing element 62 and the upper image capturing element 21 to obtain the standard The position difference of the scale 631" S12, "Establish the reference point coordinates of the first robot arm 1" S13, "Adjust the lens focal length of the lower image capturing element 62 to the positioning scale 32" S14, "Compare the lower image capturing element 62 to obtain positioning The position difference between the position of the scale 32 and the standard scale 631" S15, "Establish the correct working position of the wafer positioner handling mechanism 3" S16, "Adjust the lens focal length of the lower imaging element 62 corresponding to the indicator scale 51" S17, "Compare The image capturing element 62 obtains the position difference between the indicating scale 51 and the standard scale 631" S18, "Establishing the reference point coordinates of the second robotic arm 4" S19, etc. The following steps are described in conjunction with Figures 4 to 17 respectively. And a practical application example:

For ease of description, in the application examples shown in Figures 4 to 17, a carrier 7 is additionally provided within the movable range of the first and second robot arms 1, 4 in the above structure, and the carrier 7 is Set on a sliding mechanism 73, the sliding mechanism 73 has a sliding seat 731, the sliding seat 731 is arranged on a plurality of sliding guide rails 732 extending in parallel, on the sliding seat 731 is provided with a bearing The pivot seat 733 of the carrier plate 7; and an outer cover 72 is fixed above the carrier plate 7, and the outer cover 72 is provided with a notch 721 so that the partial wafer plate 71 on the carrier plate 7 can be exposed to the outside. The control module operates the sliding mechanism 73 to enable the sliding seat 731 to drive the pivot seat 733 to slide between the two ends of the sliding guide rail 732, and to drive the tray 7 via the pivot seat 733 Pivoting; and within the movable range of the first robotic arm 1 are separately provided with a wafer calibration mechanism 8 and a material placement mechanism 9, the wafer calibration mechanism 8 is connected and driven by the control module; in this embodiment In an example, the wafer calibration mechanism 8 has a holding seat 81 for holding the wafer 90, a through hole is provided in the center of the holding seat 81, and an image capturing unit 82 is provided above the holding seat 81. A suction head 83 with a vacuum suction hole is provided under the through hole for sucking the wafer 90. The suction head 83 can be driven by a transposition mechanism 84 to perform movements such as lifting and pivoting, and the loading mechanism The inside of 9 can accommodate a plurality of wafers 90 to be processed, and the loading mechanism 9 is arranged on a lifting mechanism 91, and the lifting mechanism 91 can be used to drive the loading mechanism 9 to raise or lower the position; but In actual applications, it can also cooperate with other components to perform different operations and achieve different effects, and it is not limited to the content disclosed in the drawings.

First, in the step S11 of "adjusting the lens focal length of the upper image capturing element 21 corresponding to the standard scale 631", the first robotic arm 1 drives the image capturing assembly 2 to move to the top of the main correction mechanism 6 (as shown in Figure 4). Show); the main correction mechanism 6 uses the laser beam 611 generated by the distance measuring laser light source 61 to project to the image grabbing assembly 2 on the preset position, can measure the main correction mechanism 6 and the image grabbing assembly 2 (on The distance of the image capturing element 21) is adjusted, and the lens focal length of the upper image capturing element 21 corresponding to the standard scale 631 is adjusted to facilitate the upper image capturing element 21 to clearly obtain the position image of the standard scale 631 on the transparent sheet 63.

The step S12 of "comparing the lower image capturing element 62 and the upper image capturing element 21 to obtain the position difference of the standard scale 631" is that the lower image capturing element 62 directly obtains the position image of the standard scale 631 on the transparent sheet 63 upward. A lower standard position image is formed, and the upper image capturing element 21 clearly obtains the position image of the standard scale 631 on the transparent sheet 63 downward to form an upper standard position image; the control module compares the lower standard position image with The difference between the images on the standard position.

In the step of "establishing the reference point coordinates of the first robotic arm 1" S13, the first robotic arm 1 drives the image capture assembly 2 to move to an image capturing correction position, so that the lower standard position image and the upper standard position image Overlapping, so as to calibrate the imaging range of the image grabbing assembly 2, and the control module memorizes the coordinates of the imaging correction position (correct imaging range) of the image grabbing assembly 2 to form the first mechanical arm 1 The coordinates of the datum point (origin).

In the step S14 of "adjusting the lens focal length of the lower image capturing element 62 corresponding to the positioning scale 32", the first robot arm 1 drives the wafer positioning member loading and unloading mechanism 3 to move to the top of the main correction mechanism 6 (as shown in Figure 5). Shown); by the main correction mechanism 6 using the laser beam 611 generated by the ranging laser light source 61 is projected onto the positioning surface 31, so as to measure the distance between the main correction mechanism 6 and the positioning scale 32, and adjust the The lower image capturing element 62 corresponds to the lens focal length of the positioning scale 32.

In the step S15 of "comparing the lower image capturing element 62 to obtain the position difference between the positioning scale 32 and the standard scale 631", the lower image capturing element 62 can directly look upwards to obtain an image of the standard scale 631 position on the transparent sheet 63 ( That is, the lower standard position image); at the same time, the lower image capturing element 62 sees through the position image of the positioning scale 32 (hole or scale) on the positioning surface 31 upward (penetrating through the transparent sheet 63) to form a positioning position image. The control module compares the difference between the standard position image and the positioning position image.

In the step S16 of "establishing the correct operating position of the wafer positioning member handling mechanism 3", the first robot arm 1 drives the wafer positioning member handling mechanism 3 to move to a loading and unloading correction position, so that the lower standard position image is consistent with the positioning The position images overlap, so as to correct the working position of the wafer positioning member handling mechanism 3, and the control module memorizes the coordinates of the loading and unloading correction position (correct working position) of the wafer positioning member handling mechanism 3, and then calculates and memorizes the The relative coordinates between the correction position for image acquisition and the correction position for loading and unloading.

In the above steps, after the image grabbing assembly 2 is calibrated by the main calibration mechanism 6, a reference point (origin) coordinate as the starting standard of the first robotic arm 1 can be established, and the wafer positioning member loading and unloading mechanism 3 After calibration by the main calibration mechanism 6, a relative coordinate between the wafer positioning member loading and unloading mechanism 3 and the image grabbing assembly 2 can be generated; therefore, the wafer positioning member loading and unloading mechanism 3 and the image grabbing assembly 2 can be established accordingly. In the subsequent operations, the image grabbing assembly 2 with the image grabbing function can be used to locate the correct position on the area to be processed (such as wafer tray) in the subsequent operations, and then be loaded and unloaded by the wafer positioning member The mechanism 3 can directly use the relative coordinates to quickly move to the correct position to facilitate subsequent processing operations.

Please refer to Figures 6-9. In practical applications, after the wafer positioning member loading and unloading mechanism 3 and the image grabbing assembly 2 are calibrated by the main calibration mechanism 6, the first robotic arm 1 can drive the image grabbing assembly 2 Move to the top of the carrier 7 (as shown in Figure 6) to confirm the position of the wafer tray 71 and check the condition on the wafer tray 71 (whether there are remaining chips or fragments of the wafer 90), Then the control module refers to the relative position coordinates, and the first robot arm 1 drives the wafer positioning member loading and unloading mechanism 3 to approach the wafer tray 71, so that the multiple (at least three) laser light sources 34 produce the same The laser beams of a long length can be projected on the wafer tray 71 together, so that the positioning surface 31 is aligned (parallel to) the wafer tray 71 (as shown in Figure 7), and then the wafer tray 71 After the wafer positioning member 711 preset on the periphery is unlocked, the wafer positioning member 711 is taken out by the clamping member 33 and maintained in a clamping state (as shown in Figs. 8 and 9).

In the step S17 of "adjusting the lens focal length of the lower image capturing element 62 corresponding to the indicating scale 51", the second robotic arm 4 drives the wafer pick-and-place mechanism 5 to move to the top of the main correction mechanism 6 (as shown in Figure 10). Show); by the main correction mechanism 6 using the laser beam 611 generated by the distance measuring laser light source 61 is projected onto the indicator scale 51 of the wafer pick-and-place mechanism 5, so as to measure the main correction mechanism 6 and the indicator scale 51 To adjust the lens focal length of the lower image capturing element 62 corresponding to the indicator scale 51.

In the step S18 of "comparing the lower image capturing element 62 to obtain the position difference between the indicating scale 51 and the standard scale 631", the lower image capturing element 62 can directly observe and obtain the image of the standard scale 631 position on the transparent sheet 63 (ie The lower standard position image); at the same time, the lower image capturing element 62 (penetrating the transparent sheet 63) sees through the position image of the indicator scale 51 on the wafer pick-and-place mechanism 5 to form an indicator position image, which is then controlled by the control module The group compares the difference between the next standard position image and the indicated position image.

In the step S19 of "establishing the reference point coordinates of the second robot arm 4", the second robot arm 4 drives the wafer pick-and-place mechanism 5 to move to a pick-and-place correction position, so that the lower standard position image and the indicated position The images overlap to correct the working position of the wafer pick-and-place mechanism 5, and the control module memorizes the coordinates of the pick-and-place correction position (correct work position) of the wafer pick-and-place mechanism 5 to form the second robot arm 4 The coordinates of the datum point (origin).

In the above steps, after the wafer pick-and-place mechanism 5 is calibrated by the main calibration mechanism 6, a reference point (origin) coordinate as the starting standard of the second robotic arm 4 can be established, and the second robotic arm 4 It has the same reference point coordinates as the first mechanical arm 1 so as to form an accurate relationship with each other.

Please refer to Figures 11-17. In actual application, when the wafer pick-and-place mechanism 5 is calibrated by the main calibration mechanism 6, the second robotic arm 4 can drive the wafer pick-and-place mechanism 5 to move to the Take out the wafer 90 to be processed from the loading mechanism 9 (as shown in Figure 11), and place the wafer 90 on the supporting seat 81 of the wafer calibration mechanism 8 (as shown in Figure 12), The image capturing unit 82 of the wafer calibration mechanism 8 first obtains the code and notch position of the wafer 90 (as shown in Figure 13), and then the control module according to the notch position of the wafer tray 71 to be placed Calculate the angle of the wafer 90 to be adjusted, the transfer mechanism 84 drives the suction head 83 to suck the wafer 90 up (away from the holder 81), and rotate the wafer 90 to make the wafer 90 The notch is adjusted to the correct angle; then the transposition mechanism 84 drives the suction head 83 to suck the wafer 90 down, so that the wafer 90 is placed back on the supporting seat 81.

Then the second mechanical arm 4 drives the wafer pick-and-place mechanism 5 to take out the wafer 90 with the correct notch angle from the holder 81 of the wafer correction mechanism 8 and place it on the carrier plate 7 On the wafer tray 71 (as shown in Figure 14).

Then, the first robot arm 1 drives the image grabbing assembly 2 to move to the carrier plate 7 (as shown in Fig. 15), and obtains the image of the wafer 90 placed in the previous step to confirm the wafer 90 Whether it is complete and placed in the correct position, the wafer positioning member loading and unloading mechanism 3 is driven by the first robot arm 1 to combine the wafer positioning member 711 clamped by the clamping member 33 with the wafer tray 71 (As shown in Figure 16), the wafer positioning member 711 is pressed against the periphery of the wafer 90 to form a positioning (as shown in Figure 17).

Then, the pivot seat 733 drives the tray 7 to rotate, so that the wafer tray 71 that has loaded the wafer 90 is turned under the cover 72, and the other wafer tray 71 without the wafer 90 is moved to the The cover 72 is exposed under the notch 721, so that the wafer placement and other actions described above can be repeated in order to fix the different wafers 90 on the wafer trays 71; finally, when the wafer trays of the carrier 7 After all the wafers 90 have been loaded in 71, the sliding seat 731 of the sliding mechanism 73 slides outward along the sliding guide 732, so that the tray 7 can be moved to the next process.

Based on the above, the robot arm calibration device and the calibration method of the wafer transfer mechanism of the present invention can indeed calibrate different robot arms to establish a common reference point coordinate, and establish the effect of establishing the relative coordinates of different mechanisms on a single robot arm. For a novel and progressive invention, Yan applied for an invention patent in accordance with the law; however, the content of the above description is only a description of the preferred embodiments of the present invention, and all changes and modifications based on the technical means and scope of the present invention Any changes or equivalent replacements shall also fall within the scope of the patent application of the present invention.

1: The first robotic arm

2: Image grabbing component

21: Upper imaging element

3: Wafer positioning part loading and unloading mechanism

31: Positioning surface

32: positioning scale

33: Clamping parts

34: Laser light source

4: The second robotic arm

5: Wafer pick-and-place mechanism

51: indicating scale

6: Main calibration mechanism

61: Ranging laser light source

611: Laser beam

62: Bottom image capturing element

63: transparent sheet

631: standard scale

7: loading plate

71: Wafer tray

711: Wafer locator

72: outer cover

721: Notch

73: Sliding Mechanism

731: sliding seat

732: Sliding Guide

733: pivot seat

8: Wafer calibration mechanism

81: Socket

82: Acquisition unit

83: suction head

84: Transpose organization

9: Feeding mechanism

90: Wafer

91: Lifting mechanism

S11: Adjust the lens focal length of the upper imaging element corresponding to the standard scale

S12: Compare the position difference between the lower image capturing element and the upper image capturing element to obtain the standard scale

S13: Establish the reference point coordinates of the first robotic arm

S14: Adjust the lens focal length of the lower imaging element corresponding to the positioning scale

S15: Compare the position of the image capturing component to obtain the difference between the position of the positioning scale and the standard scale

S16: Establish the correct working position of the wafer positioning unit loading and unloading mechanism

S17: Adjust the lens focal length of the lower imaging element corresponding to the indicator scale

S18: Compare the image capturing component to obtain the difference between the position of the indicator scale and the standard scale

S19: Establish the reference point coordinates of the second robotic arm

Figure 1 is a schematic diagram of the overall structure of the present invention.

Figure 2 is a partial enlarged schematic diagram of the main correction mechanism of the present invention.

Figure 3 is a flow chart of the calibration method of the present invention.

Figure 4 is a schematic diagram of the state of the image capture assembly of the present invention above the main correction mechanism.

Figure 5 is a schematic diagram of the state of the wafer positioning member loading and unloading mechanism above the main calibration mechanism of the present invention.

Figure 6 is a schematic diagram of the state where the image grabbing assembly of the present invention is correctly corresponding to the wafer tray above the carrier tray.

Figure 7 is a schematic diagram of the state where the wafer positioning member loading and unloading mechanism of the present invention is moved to the wafer tray.

Fig. 8 is a schematic diagram of the state of removing the wafer positioning member by the wafer positioning member loading and unloading mechanism of the present invention.

Figure 9 is a partial enlarged schematic diagram of part A in Figure 8.

Figure 10 is a schematic diagram of the state of the wafer pick-and-place mechanism of the present invention above the main calibration mechanism.

Figure 11 is a schematic diagram of the wafer pick-and-place mechanism of the present invention taking out the wafer from the loading mechanism.

FIG. 12 is a schematic diagram of the operation of the wafer pick-and-place mechanism of the present invention when the wafer is placed on the wafer calibration mechanism.

Figure 13 is a schematic diagram of the state of the wafer calibration mechanism of the present invention to calibrate the wafer.

FIG. 14 is a schematic diagram of the operation of the wafer pick-and-place mechanism of the present invention to move the wafer onto the wafer tray.

Figure 15 is a schematic diagram of the state of the image grabbing assembly of the present invention confirming the position of the wafer on the carrier.

FIG. 16 is a schematic diagram of the state where the wafer positioning member loading and unloading mechanism of the present invention is moved to the wafer tray to install the wafer positioning member.

FIG. 17 is a schematic diagram of the state where the wafer positioning member of the present invention is fixed on the wafer tray and the wafer positioning member loading and unloading mechanism is moved back to the initial position.

1: The first robotic arm

2: Image grabbing component

21: Upper imaging element

3: Wafer positioning part loading and unloading mechanism

31: Positioning surface

32: positioning scale

33: Clamping parts

34: Laser light source

4: The second robotic arm

5: Wafer pick-and-place mechanism

51: indicating scale

6: Main calibration mechanism

61: Ranging laser light source

611: Laser beam

62: Bottom image capturing element

63: transparent sheet

631: standard scale

Claims (9)

A mechanical arm calibration device of a wafer transfer mechanism, including: A first robotic arm is connected and driven by a control module. On the movable end of the first robotic arm, an image grabbing assembly and a wafer positioning member loading and unloading mechanism are provided. The image grabbing assembly has an upper image capturing device. , The wafer positioning member loading and unloading mechanism has a positioning surface, and a positioning scale is provided on the positioning surface; A second robotic arm is connected and driven by the control module. A wafer pick-and-place mechanism is provided on the movable end of the second robotic arm, and an indicator scale is provided on the wafer pick-and-place mechanism; A main calibration mechanism is set within the movable range of the first and second robot arms, and is connected and driven by the control module to calibrate the positions of the image grabbing assembly and the wafer pick-and-place mechanism respectively. The correction mechanism has a lower image capturing element, a transparent sheet is arranged above the lower image capturing element, and a standard scale serving as a positioning reference is provided on the transparent sheet. The robot arm calibration device of the wafer transfer mechanism described in the scope of the patent application, wherein the main calibration mechanism is provided with a distance measuring laser light source beside the lower image capturing element. As described in the second item of the scope of patent application, the robot arm calibration device of the wafer transfer mechanism, wherein the plurality of laser light sources are respectively arranged at least three points outside the positioning surface. For example, the robot arm calibration device of the wafer transfer mechanism described in item 1, 2 or 3 of the scope of patent application, wherein the positioning scale is selected from one of holes or scales. For example, the robotic arm calibration device of the wafer transfer mechanism described in item 1, 2 or 3 of the scope of patent application, wherein the wafer pick-and-place mechanism is a wafer chuck that can suck wafers. A method for calibrating a robotic arm using the wafer transfer mechanism described in item 2 of the aforementioned patent application scope includes at least: A step of "comparing the position difference between the lower image capturing element and the upper image capturing element to obtain a standard scale" is that the first robotic arm drives the image capture assembly to move to the top of the main correction mechanism, and the lower image capturing element directly obtains it The position image of the standard scale on the transparent film forms a lower standard position image, and the upper image capturing element obtains the position image of the standard scale on the transparent film to form an upper standard position image; the control module compares the lower standard The difference between the location image and the above standard location image; A step of "establishing the reference point coordinates of the first robotic arm" is that the first robotic arm drives the image capture assembly to move to an image capture correction position, so that the lower standard position image and the upper standard position image overlap, Thereby calibrating the imaging range of the image grabbing component, and the control module memorizes the coordinates of the imaging correction position of the image grabbing component to establish the reference point coordinates of the first robotic arm; A step of "comparing the lower imaging element to obtain the positional difference between the positioning scale and the standard scale" is that the first robot arm drives the wafer positioning member loading and unloading mechanism to move to the top of the main calibration mechanism, and the lower imaging element The position image of the positioning scale on the positioning surface is penetrated through the transparent sheet to form a positioning position image, and the control module compares the difference between the lower standard position image and the positioning position image; A step of "establishing the correct operating position of the wafer positioner loading and unloading mechanism" is that the first robot arm drives the wafer positioner loading and unloading mechanism to a loading and unloading correction position so that the lower standard position image overlaps the positioning position image, In order to calibrate the working position of the wafer positioning member loading and unloading mechanism, the control module will memorize the coordinates of the loading and unloading calibration position of the wafer positioning member loading and unloading mechanism, and then calculate and memorize the position between the imaging calibration position and the loading and unloading calibration position. Relative coordinates A step of "comparing the lower image capturing element to obtain the position difference between the indicated scale position and the standard scale" is that the second robotic arm drives the wafer pick-and-place mechanism to move above the main calibration mechanism, and the lower image capturing element penetrates The position image of the indicating scale on the wafer pick-and-place mechanism is seen through the transparent sheet to form an indicated position image, and then the control module compares the difference between the lower standard position image and the indicated position image; A step of "establishing the reference point coordinates of the second robotic arm" is that the second robotic arm drives the wafer pick-and-place mechanism to a pick-and-place calibration position so that the lower standard position image overlaps the indicated position image, thereby The operating position of the wafer pick-and-place mechanism is corrected, and the control module memorizes the coordinates of the pick-and-place correction position of the wafer pick-and-place mechanism to establish the reference point coordinates of the second robot arm, and make the first, The two robot arms have the same reference point coordinates. As described in item 6 of the scope of patent application, the robot arm calibration method of the wafer transfer mechanism, wherein before performing the step of "comparing the position difference between the lower image capturing element and the upper image capturing element to obtain the standard scale", a " Adjust the lens focal length of the upper image capturing element corresponding to the standard scale" step. The main correction mechanism uses the laser beam generated by the distance measuring laser light source to project to the standard scale position of the image capture assembly, and the main correction mechanism and the standard scale can be measured. Adjust the distance of the standard scale and adjust the focal length of the lens of the upper image capturing element, so that the upper image capturing element can clearly obtain the position image of the standard scale on the transparent film. For example, the method for calibrating the robot arm of the wafer transfer mechanism described in the scope of the patent application, wherein before performing the step of "comparing the image capturing element to obtain the positional difference between the positioning scale and the standard scale", an "adjustment" is performed in advance. The lower image capturing element corresponds to the lens focal length of the positioning scale" step, the main correction mechanism uses the laser beam generated by the distance measuring laser light source to project onto the positioning scale of the positioning surface, thereby measuring the main correction mechanism and the crystal The distance of the mounting and dismounting mechanism of the circular positioning member is adjusted, and the lens focal length of the lower image capturing element is adjusted to facilitate the lower image capturing member to clearly obtain the position image of the positioning scale of the wafer positioning member mounting and dismounting mechanism. As described in item 6 of the scope of patent application, the robot arm calibration method of the wafer transfer mechanism, wherein before performing the step of "comparing the imaging element to obtain the position difference between the indicated scale position and the standard scale", an "adjustment" is performed in advance. The lower image capturing element corresponds to the lens focal length of the indicating scale" step. The main calibration mechanism uses the laser beam generated by the ranging laser light source to project onto the indicating scale of the wafer pick-and-place machine to measure the main calibration The distance between the mechanism and the indicator scale is used to adjust the lens focal length of the lower image capturing element, so that the lower image capturing element can clearly obtain the position image of the indicator scale of the wafer pick-and-place machine.

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