TW202133309A - Loading device of wafer carrier and loading method thereof including a carrier, a main calibration mechanism, a wafer calibration mechanism and a feeding mechanism - Google Patents

Loading device of wafer carrier and loading method thereof including a carrier, a main calibration mechanism, a wafer calibration mechanism and a feeding mechanism Download PDF

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TW202133309A
TW202133309A TW109105378A TW109105378A TW202133309A TW 202133309 A TW202133309 A TW 202133309A TW 109105378 A TW109105378 A TW 109105378A TW 109105378 A TW109105378 A TW 109105378A TW 202133309 A TW202133309 A TW 202133309A
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wafer
tray
carrier
image capturing
positioning member
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TW109105378A
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TWI752416B (en
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宋茂炎
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總督科技股份有限公司
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A loading device for a wafer carrier and a loading method thereof are provided, in which a carrier, a main calibration mechanism, a wafer calibration mechanism and a feeding mechanism are respectively provided within the movable range of first and second robot arms. The first robot arm is equipped with an image capturing assembly and a wafer positioning member loading and unloading mechanism, and the second robot arm is equipped with a wafer pick-and-place mechanism. The first robot arm drives the image capturing assembly to move to the main calibration mechanism to calibrate its imaging range, and then drives the wafer positioning member loading and unloading mechanism to move to the main calibration mechanism to calibrate its working position, so as to correctly align the image capturing assembly with one of wafer trays of the carrier, and then remove the wafer positioning member on the wafer tray by the wafer positioning part loading and unloading mechanism. The second robot arm drives the wafer pick-and-place mechanism to move to the main calibration mechanism to correct its working position, and the wafer is taken out by the feeding mechanism and placed in the wafer calibration mechanism. The wafer notch is adjusted to a correct angle, and then the wafer is moved to the wafer tray. The image capturing assembly is used to confirm whether the wafer is intact, then combine the wafer positioning member on the wafer tray, and press it on the periphery of the wafer to complete positioning.

Description

晶圓載盤之置載裝置及其置載方法Placement device and placement method of wafer carrier plate

本發明是有關晶圓載盤之置載裝置及其置載方法,尤指一種可降低人力成本,並確保晶圓置於晶圓盤上之方向及精準度的置載裝置及方法。The present invention relates to a placing device and a placing method of a wafer carrier, and in particular to a placing device and method that can reduce labor costs and ensure the direction and accuracy of wafer placement on the wafer tray.

一般的積體電路(integrated circuit, IC)的製造過程主要可分為:矽晶圓製造、積體電路製作以及積體電路封裝等三大部分;當矽晶棒切割成晶圓後,還需要經過黃光、長晶、蝕刻、機械研磨等多道手續繁雜的流程,方能完成積體電路的製作,而在上述的製造過程中,晶圓在進行測試、清洗、蒸鍍、乾燥或浸泡有機溶劑等流程時,為能有效固定晶圓以便於加工,皆需將各晶圓先分別固定於一晶圓盤上,由各該晶圓盤分別承載各晶圓進行上述各流程的加工作業。The general integrated circuit (IC) manufacturing process can be divided into three parts: silicon wafer manufacturing, integrated circuit manufacturing, and integrated circuit packaging; when the silicon ingot is cut into wafers, it needs After yellow light, crystal growth, etching, mechanical polishing and other complicated procedures, the production of the integrated circuit can be completed. In the above manufacturing process, the wafer is tested, cleaned, evaporated, dried or soaked. For organic solvents and other processes, in order to effectively fix the wafers for processing, each wafer needs to be fixed on a wafer tray first, and each wafer tray carries each wafer to perform the processing operations of the above processes .

習知的晶圓盤基本結構,乃為一面積略大於晶圓外徑之盤體,於該盤體上方設有一可分離之環形框體,定義出一容置晶圓的位置,且於該盤體的周緣設有複數扣合機構,利用該等扣合機構可夾固該環形框體,以壓制於該晶圓周緣形成定位。The basic structure of the conventional wafer disk is a disk body with an area slightly larger than the outer diameter of the wafer. A separable ring frame is provided above the disk body to define a position for accommodating the wafer. A plurality of buckling mechanisms are arranged on the periphery of the disc body, and the annular frame body can be clamped by the buckling mechanisms to be pressed on the periphery of the wafer to form a positioning.

在實際應用時,為能同時處理較大量之晶圓,大多會將複數晶圓盤設置於一大面積的載盤上,利用該載盤可容置多個晶圓盤並同時移至各不同的加工程序,以有效增加晶圓加工處理的效率。In practical applications, in order to process a larger amount of wafers at the same time, most of the wafer trays are placed on a large-area carrier tray, which can accommodate multiple wafer trays and move them to different types at the same time. Processing procedures to effectively increase the efficiency of wafer processing.

隨著自動化加工的逐漸普及,利用機械臂執行將各晶圓置放於該載盤中各晶圓盤上並加以固定的動作,不但可節省大量人力,並可降低生產成本、增進加工效率,已為必然的趨勢,而由於一般晶圓加工對於精密度要求極高,因此於晶圓邊緣設有一平削的缺口,可確保其放置的準確性,如此一來,亦形成對於晶圓放置方向的限制;故而,如何能在利用機械臂放置各晶圓的作業需求下,克服晶圓放置方向及精準度等要求及限制,乃為各相關業者所亟待努力的課題。With the gradual popularity of automated processing, the use of robotic arms to place and fix each wafer on each wafer tray in the carrier not only saves a lot of manpower, but also reduces production costs and improves processing efficiency. It is an inevitable trend, and because the general wafer processing requires extremely high precision, a flat cut notch is provided on the edge of the wafer to ensure the accuracy of its placement. In this way, it also forms the direction of the wafer placement. Therefore, how to overcome the requirements and limitations of wafer placement direction and accuracy under the operational requirements of using robotic arms to place each wafer is an urgent task for all related industries.

有鑑於習見將晶圓置於載盤上晶圓盤中的加工裝置及方法有上述缺點,發明人乃針對該些缺點研究改進之道,終於有本發明產生。In view of the above-mentioned shortcomings of conventional processing devices and methods for placing wafers in a wafer tray on a carrier tray, the inventors have studied and improved ways to address these shortcomings, and finally the present invention has been produced.

本發明之主要目的在於提供一種晶圓載盤之置載裝置及其置載方法,主要係於一第一機械臂上設有一影像攫取組件及一晶圓定位件裝卸機構,於一第二機械臂上設有一晶圓取放機構,且於該第一、二機械臂活動範圍內分別建置一載盤、一主校正機構、一晶圓校正機構及一供料機構,先利用該第一機械臂驅動該影像攫取組件至該主校正機構上,校正其取像範圍之準確度,再由第一機械臂驅動該晶圓定位件裝卸機構至該主校正機構上,校正其作業位置,並記憶該晶圓定位件裝卸機構與該影像攫取組件取像範圍之間的相對位置座標,再將該影像攫取組件移至該載盤上方,取得該載盤上其中一晶圓盤的影像,並正確對應,然後該第一機械臂參考該相對位置座標,驅動該晶圓定位件裝卸機構對準該晶圓盤,將該晶圓盤周緣預先固定之晶圓定位件取出,另由該第二機械臂驅動該晶圓取放機構至該主校正機構上,校正該晶圓取放機構的作業位置,再由該晶圓取放機構至該供料機構中取出待加工之晶圓,放置於該晶圓校正機構上,以取得該晶圓之編碼,並將該晶圓之缺口調整至正確的角度,再由該晶圓取放機構將該晶圓移置於該晶圓盤上,最後,該第一機械臂驅動該影像攫取組件至該載盤上,確認該晶圓盤上之晶圓是否完整,再驅動該晶圓定位件裝卸機構將該晶圓定位件結合於該晶圓盤上,且該晶圓定位件可壓合於該晶圓周緣形成定位,藉以完成一將各晶圓正確且快速地移置至晶圓載盤上的自動化加工作業。The main purpose of the present invention is to provide a wafer carrier tray placement device and placement method, which are mainly provided with an image grabbing assembly and a wafer positioning member loading and unloading mechanism on a first robotic arm, and a second robotic arm There is a wafer pick-and-place mechanism, and a carrier plate, a main calibration mechanism, a wafer calibration mechanism and a feeding mechanism are respectively built within the movable range of the first and second robot arms. The first mechanism is used first. The arm drives the image capture assembly to the main calibration mechanism to calibrate the accuracy of the imaging range, and then the first mechanical arm drives the wafer positioning member loading and unloading mechanism to the main calibration mechanism to calibrate its operating position and store it in memory The relative position coordinates between the wafer positioning member loading and unloading mechanism and the image capturing range of the image grabbing assembly, and then moving the image grabbing assembly to the top of the carrier to obtain an image of one of the wafer trays on the carrier, and correct it Correspondingly, the first mechanical arm then refers to the relative position coordinates, drives the wafer positioning member loading and unloading mechanism to align the wafer tray, and takes out the wafer positioning member pre-fixed on the periphery of the wafer tray, and then the second mechanical arm The arm drives the wafer pick-and-place mechanism to the main calibration mechanism to calibrate the working position of the wafer pick-and-place mechanism, and then from the wafer pick-and-place mechanism to the feeding mechanism, take out the wafer to be processed and place it on the The wafer calibration mechanism is used to obtain the code of the wafer, and adjust the notch of the wafer to the correct angle, and then the wafer is moved on the wafer tray by the wafer pick-and-place mechanism, and finally, The first robotic arm drives the image grabbing assembly to the carrier tray, confirms whether the wafer on the wafer tray is complete, and then drives the wafer positioning member loading and unloading mechanism to combine the wafer positioning member on the wafer tray And the wafer positioning member can be pressed on the periphery of the wafer to form a positioning, so as to complete an automated processing operation of accurately and quickly displacing each wafer onto the wafer carrier.

為達成上述目的及功效,本發明所採行的技術手段包括:一種晶圓載盤之置載裝置,至少包括:一第一機械臂,係連結並受一控制模組驅動,於該第一機械臂之活動端上至少設有一影像攫取組件;一第二機械臂,係連結並受該控制模組驅動,於該第二機械臂之活動端上設有一晶圓取放機構;一載盤,係設置於該第一、二機械臂之活動範圍內,且係連結並受該控制模組驅動,該載盤上設有至少一承置晶圓的晶圓盤;一主校正機構,係設置於該第一、二機械臂之活動範圍內,且係連結並受該控制模組驅動,以供分別校正該影像攫取組件及晶圓取放機構的位置;一晶圓校正機構,係設置於該第二機械臂之活動範圍內,且係連結並受該控制模組驅動,以供讀取置入之晶圓的編碼及調整該晶圓之缺口;一供料機構,係設置於該第二機械臂之活動範圍內,以供收容複數待加工之晶圓。In order to achieve the above objectives and effects, the technical means adopted by the present invention include: a wafer carrier tray placement device, at least including: a first mechanical arm connected and driven by a control module, in the first mechanical The movable end of the arm is provided with at least one image grabbing component; a second robotic arm is connected and driven by the control module, and the movable end of the second robotic arm is provided with a wafer pick-and-place mechanism; a carrier plate, It is set in the movable range of the first and second robot arms, and is connected and driven by the control module. The carrier is provided with at least one wafer tray for holding wafers; a main calibration mechanism is provided Within the range of movement of the first and second robot arms, and are connected and driven by the control module to calibrate the positions of the image grabbing assembly and the wafer pick-and-place mechanism respectively; a wafer calibration mechanism is set in The second robot arm is within the range of motion, and is connected and driven by the control module for reading the code of the inserted wafer and adjusting the gap of the wafer; a feeding mechanism is arranged on the first 2. Within the movable range of the robotic arm, for storing multiple wafers to be processed.

依上述結構,其中各晶圓分別經由一可鎖掣之晶圓定位件固定於該晶圓盤上,且該第一機械臂之活動端上另設有一可裝卸該晶圓定位件之晶圓定位件裝卸機構。According to the above structure, each wafer is fixed on the wafer tray via a lockable wafer positioning member, and the movable end of the first robot arm is additionally provided with a wafer capable of loading and unloading the wafer positioning member Positioning member loading and unloading mechanism.

依上述結構,其中該影像攫取組件具有一可產生照明光線之上取像元件,該主校正機構具有一下取像元件,於該下取像元件上方設有一透明片,於該透明片上設有一作為定位基準之標準刻度;該晶圓定位件裝卸機構具有一定位面,於該定位面上設有一定位刻度;該晶圓取放機構具有可吸取晶圓之晶圓吸盤,於該晶圓吸盤上設有一指示刻度。According to the above structure, the image capturing component has an upper image capturing element that can generate illuminating light, the main correction mechanism has a lower image capturing element, a transparent sheet is arranged above the lower image capturing element, and a function is provided on the transparent sheet The standard scale of the positioning reference; the wafer positioning member loading and unloading mechanism has a positioning surface, and a positioning scale is provided on the positioning surface; the wafer pick-and-place mechanism has a wafer chuck that can suck wafers on the wafer chuck There is an indicating scale.

依上述結構,其中該晶圓定位件裝卸機構於該定位面外旁側設有複數雷射光源。According to the above structure, the wafer positioning member loading and unloading mechanism is provided with a plurality of laser light sources on the outer side of the positioning surface.

依上述結構,其中該主校正機構於該下取像元件旁側設有一測距雷射光源。According to the above structure, the main correction mechanism is provided with a range-finding laser light source beside the lower image-taking element.

依上述結構,其中該供料機構係為一內部具有收容空間之置料匣,該置料匣係設置於一升降機構上,該升降機構係連結並受該控制模組驅動,以調整該置料匣的高度。According to the above structure, the feeding mechanism is a cassette with a accommodating space inside, the cassette is arranged on a lifting mechanism, the lifting mechanism is connected and driven by the control module to adjust the setting The height of the magazine.

依上述結構,其中該載盤係設置於一滑移機構上,該滑移機構具有一滑移座,該滑移座係可沿複數平行延伸之滑移導軌移動,於該滑移座上設有一承置該載盤之樞轉座。According to the above structure, the disc carrier is arranged on a sliding mechanism, the sliding mechanism has a sliding seat, and the sliding seat can move along a plurality of sliding guide rails extending in parallel, and the sliding seat is arranged on the sliding seat. There is a pivot seat for holding the tray.

依上述結構,其中該載盤上方設有一外罩,該外罩上設有一凹缺口,可使該載盤上之局部晶圓盤對外裸露。According to the above structure, an outer cover is provided above the carrier, and a recess is provided on the outer cover, so that a part of the wafer disk on the carrier can be exposed to the outside.

依上述結構,其中該晶圓校正機構具有一可供放置晶圓之承置座,該承置座之中央係為貫通,於該承置座上方設有一取像單元,於該承置座之貫通部位下方設有一具真空吸孔之吸頭,該吸頭係可受一轉置機構驅動而升降及樞轉。According to the above structure, the wafer calibration mechanism has a supporting base for placing wafers, the center of the supporting base is through, and an image capturing unit is arranged above the supporting base. A suction head with a vacuum suction hole is arranged under the through part, and the suction head can be driven by a transposition mechanism to lift and pivot.

本發明所採行的技術手段另包括:一種應用前述晶圓載盤之置載裝置的置載方法,至少包括:一「影像攫取組件校正取像範圍」步驟,係由該第一機械臂驅動該影像攫取組件移至該主校正機構上,以校正該影像攫取組件取像範圍至正確位置;一「晶圓定位件裝卸機構校正作業位置」步驟,係由該第一機械臂驅動該晶圓定位件裝卸機構之定位面移至該主校正機構上,以調整校正該晶圓定位件裝卸機構的作業位置,且該控制模組可比對記憶該晶圓定位件裝卸機構作業位置與該影像攫取組件取得影像範圍之間的相對位置座標;一「影像攫取組件正確對應於晶圓盤」步驟,係由該第一機械臂驅動該影像攫取組件移至該載盤上方,並修正位置以準確對應於該載盤上其中之一晶圓盤;一「晶圓定位件裝卸機構由晶圓盤上取下晶圓定位件」步驟,係由該控制模組參考該相對位置座標,經該第一機械臂驅動該晶圓定位件裝卸機構以該定位面對準該晶圓盤,並將該晶圓盤周緣預先設置之晶圓定位件取出;一「晶圓取放機構校正作業位置」步驟,係由該第二機械臂驅動該晶圓取放機構移至該主校正機構上,以校正該晶圓取放機構的作業位置;一「晶圓取放機構將晶圓放置於晶圓校正機構上」步驟,係由該第二機械臂驅動該晶圓取放機構移至該供料機構中取出待加工之晶圓,並將該晶圓放置於該晶圓校正機構之承置座上;一「晶圓校正機構讀取晶圓之編碼,並將晶圓之缺口轉至正確角度」步驟,係由該晶圓校正機構之取像單元取得該晶圓之編碼及缺口位置,再由該轉置機構驅動該吸頭吸附該晶圓上升,並轉動該晶圓,以將該晶圓之缺口調整至正確的角度;然後該轉置機構驅動該吸頭吸附該晶圓下降,以將該晶圓置於該承置座上;一「晶圓取放機構將晶圓移送至晶圓盤上」步驟,係由該第二機械臂驅動該晶圓取放機構將該晶圓由該承置座上取出,並放置於該載盤之該晶圓盤上;一「影像攫取組件取得晶圓之影像」步驟,係由該第一機械臂驅動該影像攫取組件移至該載盤上,並取得先前放置的晶圓之影像,以確認該晶圓是否完整;一「晶圓定位件裝卸機構將晶圓定位件裝設於晶圓盤上,以固定晶圓」步驟,係由該第一機械臂驅動該晶圓定位件裝卸機構將該晶圓定位件結合於該晶圓盤上,藉由該晶圓定位件壓合於該晶圓周緣形成定位。The technical means adopted by the present invention further includes: a placement method using the placement device of the aforementioned wafer carrier, at least including: a step of "correcting the imaging range of the image capture component", which is driven by the first mechanical arm The image grabbing assembly is moved to the main calibration mechanism to calibrate the imaging range of the image grabbing assembly to the correct position; a "wafer positioning assembly handling mechanism calibration operation position" step is to drive the wafer positioning by the first robot arm The positioning surface of the piece loading and unloading mechanism is moved to the main correction mechanism to adjust and calibrate the operating position of the wafer positioning piece loading and unloading mechanism, and the control module can compare and memorize the operating position of the wafer positioning piece loading and unloading mechanism with the image grabbing assembly Obtain the relative positional coordinates between the image ranges; a step of "the image grabbing assembly correctly corresponds to the wafer tray" is that the first robot arm drives the image grabbing assembly to move to the top of the carrier, and corrects the position to accurately correspond to One of the wafer trays on the carrier tray; a step of "wafer positioning element loading and unloading mechanism removes the wafer positioning element from the wafer tray", the control module refers to the relative position coordinates, and passes through the first mechanical The arm drives the wafer positioner loading and unloading mechanism to align the wafer tray with the positioning surface, and take out the wafer positioner preset on the periphery of the wafer tray; a "wafer pick-and-place mechanism calibration operation position" step is The wafer pick-and-place mechanism is driven by the second mechanical arm to move to the main correction mechanism to correct the working position of the wafer pick-and-place mechanism; a "wafer pick-and-place mechanism places the wafer on the wafer correction mechanism The step is to drive the wafer pick-and-place mechanism to the feeding mechanism to take out the wafer to be processed by the second robot arm, and place the wafer on the support seat of the wafer calibration mechanism; The "wafer calibration mechanism reads the code of the wafer and turns the wafer notch to the correct angle" step is to obtain the code and notch position of the wafer by the imaging unit of the wafer calibration mechanism, and then turn it The placement mechanism drives the suction head to suck up the wafer and rotates the wafer to adjust the wafer gap to the correct angle; then the placement mechanism drives the suction head to suck the wafer down to move the wafer down. The circle is placed on the supporting seat; a "wafer pick-and-place mechanism transfers the wafer to the wafer tray" step, the second robotic arm drives the wafer pick-and-place mechanism to transfer the wafer from the support Take it out of the holder and place it on the wafer tray of the carrier; a step of "the image grabbing assembly obtains the image of the wafer" is driven by the first robotic arm to move the image grabbing assembly to the carrier, and Obtain the image of the previously placed wafer to confirm whether the wafer is intact; a "wafer locator loading and unloading mechanism installs the wafer locator on the wafer tray to fix the wafer" step is performed by the first The mechanical arm drives the wafer positioning member loading and unloading mechanism to combine the wafer positioning member on the wafer tray, and the wafer positioning member is pressed against the periphery of the wafer to form a positioning.

依上述方法,其中該主校正機構中建置一下取像元件,於該下取像元件上方設一透明片,透明片上設一標準刻度作為定位基準;於該影像攫取組件中建置一上取像元件,若該上取像元件之取像範圍中的標準刻度位置與該下取像元件之取像範圍中的標準刻度位置之間產生位置偏差,則該控制模組經由該第一機械臂驅動該影像攫取組件調整位置,使該上、下取像元件之取像範圍中的標準刻度位置重疊,即能將該影像攫取組件之取像範圍被校正至正確位置。According to the above method, a lower image capturing element is built in the main calibration mechanism, a transparent sheet is set above the lower image capturing element, and a standard scale is set on the transparent sheet as a positioning reference; an upper capturing element is built in the image capturing assembly If there is a position deviation between the standard scale position in the imaging range of the upper imaging element and the standard scale position in the imaging range of the lower imaging element, the control module passes through the first mechanical arm Drive the image capture component to adjust the position so that the standard scale positions in the imaging range of the upper and lower image capture components overlap, that is, the imaging range of the image capture component can be corrected to the correct position.

依上述方法,其中該主校正機構中建置一下取像元件,於該下取像元件上方設一透明片,於該透明片上設一標準刻度作為定位基準;於該晶圓取放機構上設有一指示刻度;若該下取像元件之取像範圍中的標準刻度位置與該晶圓取放機構上之指示刻度產生位置偏差,則該控制模組經由該第二機械臂驅動該晶圓取放機構調整位置,使該指示刻度與該標準刻度重疊,即能將該晶圓取放機構之作業位置被校正至正確位置。According to the above method, a lower image capturing element is built in the main calibration mechanism, a transparent sheet is set above the lower image capturing element, and a standard scale is set on the transparent sheet as a positioning reference; the wafer pick-and-place mechanism is provided There is an indicating scale; if the standard scale position in the imaging range of the lower imaging element is deviated from the indicating scale on the wafer pick-and-place mechanism, the control module drives the wafer pick-up via the second mechanical arm The position of the placement mechanism is adjusted so that the indicating scale overlaps the standard scale, that is, the working position of the wafer picking and placement mechanism can be corrected to the correct position.

依上述方法,其中該主校正機構中建置一下取像元件,於該下取像元件上方設一透明片,透明片上設有一標準刻度作為定位基準;於該晶圓定位件裝卸機構之該定位面上設有一定位刻度;若該下取像元件之取像範圍中的標準刻度位置與該定位面上之定位刻度之間產生位置偏差,則該控制模組經由該第一機械臂驅動該晶圓定位件裝卸機構調整位置,使該定位刻度與該標準刻度重疊,即能將該晶圓定位件裝卸機構之作業位置被校正至正確位置。According to the above method, a lower image capturing element is built in the main calibration mechanism, a transparent sheet is provided above the lower image capturing element, and a standard scale is provided on the transparent sheet as a positioning reference; the positioning of the wafer positioning member loading and unloading mechanism A positioning scale is provided on the surface; if a position deviation occurs between the standard scale position in the imaging range of the lower imaging element and the positioning scale on the positioning surface, the control module drives the crystal through the first mechanical arm The position of the mounting and unloading mechanism of the circular positioning piece is adjusted so that the positioning scale overlaps the standard scale, that is, the working position of the loading and unloading mechanism of the wafer positioning piece can be corrected to the correct position.

依上述方法,其中該主校正機構中建置一測距雷射光源,該測距雷射光源能產生雷射光束,以量測該影像攫取組件、晶圓定位件裝卸機構、晶圓取放機構分別與該下取像元件之間的距離,以經由該控制模組調整該下取像元件之鏡頭焦距。According to the above method, a range-finding laser light source is built in the main calibration mechanism, and the range-finding laser light source can generate a laser beam to measure the image grabbing assembly, wafer positioning member loading and unloading mechanism, and wafer pick-and-place The distance between the mechanism and the lower image capturing element is used to adjust the lens focal length of the lower image capturing element through the control module.

依上述方法,其中該晶圓定位件裝卸機構周側建置有至少三雷射光源,在該「晶圓定位件裝卸機構由晶圓盤上取下晶圓定位件」步驟中,利用該控制模組經由該第一機械臂驅動該晶圓定位件裝卸機構調整位置,使各雷射光源所產生相同長度之雷射光束,可共同投射於該晶圓盤上,藉以使以該晶圓定位件裝卸機構正確對應於該晶圓盤。According to the above method, at least three laser light sources are built on the periphery of the wafer positioner handling mechanism. In the step of "wafer positioner handling mechanism removing the wafer positioner from the wafer tray", the control The module drives the wafer positioning member loading and unloading mechanism to adjust the position through the first mechanical arm, so that the laser beams of the same length generated by the laser light sources can be projected on the wafer tray together, so that the wafer can be positioned The piece loading and unloading mechanism correctly corresponds to the wafer tray.

依上述方法,其中該晶圓校正機構中至少建置一承置座、一取像單元及一轉置機構,該承置座係供承置該晶圓,該取像單元取得該晶圓之編碼及缺口位置,該轉置機構係能帶動該晶圓轉動,以調整該晶圓之缺口至正確的角度。According to the above method, the wafer calibration mechanism is provided with at least a supporting seat, an imaging unit and a transposition mechanism, the supporting seat is for supporting the wafer, and the imaging unit obtains the wafer Encoding and notch position, the transposition mechanism can drive the wafer to rotate to adjust the wafer notch to the correct angle.

為使本發明的上述目的、功效及特徵可獲致更具體的瞭解,茲依下列附圖說明如下:In order to obtain a more detailed understanding of the above-mentioned objects, effects and features of the present invention, the following descriptions are given with reference to the following drawings:

請參第1、2圖所示,可知本發明之主要結構包括:第一機械臂1、第二機械臂2、載盤3、主校正機構4、晶圓校正機構5及供料機構6等部份;其中該第一機械臂1係連結並受一控制模組(可為一具運算功能之電腦,未繪出)驅動,該第一機械臂1之活動端上設有一影像攫取組件11及一晶圓定位件裝卸機構12。Please refer to Figures 1 and 2, it can be seen that the main structure of the present invention includes: the first robot arm 1, the second robot arm 2, the carrier 3, the main calibration mechanism 4, the wafer calibration mechanism 5 and the feeding mechanism 6, etc. Part; the first robotic arm 1 is connected and driven by a control module (which can be a computer with computing functions, not shown), and the movable end of the first robotic arm 1 is provided with an image grabbing component 11 And a wafer positioning member loading and unloading mechanism 12.

在一個可行的實施例中,該影像攫取組件11具有一可產生照明光線之上取像元件111(可為一CCD攝影機);該晶圓定位件裝卸機構12上設有一定位面121,該定位面121(中央)設有一定位刻度122(可為一孔洞),於該定位面121外周側至少設有二相對之夾持件123,該晶圓定位件裝卸機構12周側設有複數均勻分佈之雷射光源124,該複數雷射光源124係分別設置於該定位面121外旁側至少三點。In a feasible embodiment, the image capture component 11 has an image capture element 111 (which can be a CCD camera) on which the illuminating light can be generated; the wafer positioning member handling mechanism 12 is provided with a positioning surface 121, the positioning The surface 121 (center) is provided with a positioning scale 122 (may be a hole), at least two opposite clamping members 123 are provided on the outer peripheral side of the positioning surface 121, and the wafer positioning member handling mechanism 12 is provided with a plurality of evenly distributed peripheral sides The laser light source 124, the plurality of laser light sources 124 are respectively arranged on at least three points outside the positioning surface 121.

該第二機械臂2係連結並受該控制模組驅動,該第二機械臂2之活動端上設有一可吸附晶圓60之晶圓取放機構21(可為一晶圓吸盤);在一個可行的實施例中,該晶圓取放機構21(晶圓吸盤)上設有一指示刻度211。The second robotic arm 2 is connected to and driven by the control module. The movable end of the second robotic arm 2 is provided with a wafer pick-and-place mechanism 21 (which can be a wafer chuck) capable of adsorbing wafers 60; In a feasible embodiment, an indicator scale 211 is provided on the wafer pick-and-place mechanism 21 (wafer chuck).

該載盤3係設置於該第一、二機械臂1、2之活動範圍內,且係連結並受該控制模組驅動,於該載盤3上不同位置設有複數晶圓盤31,於各晶圓盤31上分別設有可鎖掣之晶圓定位件311(可為一壓環)。The carrier 3 is arranged in the movable range of the first and second robot arms 1, 2 and is connected and driven by the control module. A plurality of wafer trays 31 are arranged at different positions on the carrier 3. Each wafer tray 31 is respectively provided with a lockable wafer positioning member 311 (may be a pressing ring).

在一個可行的實施例中,該載盤3係設置於一滑移機構33上,該滑移機構33具有一滑移座331,該滑移座331係設置於複數平行延伸之滑移導軌332上,於該滑移座331上設有一承置該載盤3之樞轉座333;而於該載盤3上方固定設有一外罩32,該外罩32上設有一凹缺口321,可使該載盤3上之局部晶圓盤31對外裸露,利用該控制模組操作該滑移機構33,可使該滑移座331帶動該樞轉座333於該滑移導軌332二端之間滑移,並可經由該樞轉座333驅動該載盤3樞轉。In a possible embodiment, the tray 3 is disposed on a sliding mechanism 33, and the sliding mechanism 33 has a sliding seat 331, and the sliding seat 331 is arranged on a plurality of sliding guide rails 332 extending in parallel. On the sliding seat 331 is provided with a pivot seat 333 for supporting the tray 3; and a cover 32 is fixed above the tray 3, and a recessed notch 321 is provided on the cover 32 to allow the load The partial wafer disk 31 on the disk 3 is exposed to the outside, and the sliding mechanism 33 is operated by the control module, so that the sliding seat 331 can drive the pivot seat 333 to slide between the two ends of the sliding guide 332. The tray 3 can be driven to pivot via the pivot seat 333.

該主校正機構4係設置於該第一、二機械臂1、2之活動範圍內,且係連結並受該控制模組驅動,以供分別校正該影像攫取組件11、晶圓定位件裝卸機構12及晶圓取放機構21,使其分別保持於正確的位置。The main calibration mechanism 4 is set in the movable range of the first and second robot arms 1, 2 and is connected and driven by the control module to calibrate the image grabbing assembly 11 and the wafer positioning member loading and unloading mechanism respectively 12 and the wafer pick-and-place mechanism 21 to keep them in the correct positions respectively.

在一個可行的實施例中,該主校正機構4具有一可產生照明光線之下取像元件42以及至少一具測距功能之測距雷射光源41;該下取像元件42係可為一CCD攝影機,於該下取像元件42上方設有一透明片43,於該透明片43中央設有一標準刻度431。In a feasible embodiment, the main correction mechanism 4 has a lower image capturing element 42 that can generate illuminating light and at least one range-finding laser light source 41 with a range-finding function; the lower image capturing element 42 may be a In the CCD camera, a transparent sheet 43 is arranged above the lower image capturing element 42, and a standard scale 431 is arranged in the center of the transparent sheet 43.

該晶圓校正機構5係設置於該第二機械臂2之活動範圍內,且係連結並受該控制模組驅動;在本實施例中,該晶圓校正機構5具有一可供承置該晶圓60之承置座51,承置座51中央設有一貫通孔,於該承置座51上方設有一取像單元52,於該貫通孔下方設有一具真空吸孔之吸頭53,以供吸附該晶圓60,該吸頭53係可受一轉置機構54驅動而執行升降及樞轉等動作。The wafer correction mechanism 5 is arranged in the movable range of the second robot arm 2 and is connected and driven by the control module; in this embodiment, the wafer correction mechanism 5 has a The holding seat 51 of the wafer 60 has a through hole in the center of the holding seat 51, an image capturing unit 52 is arranged above the holding seat 51, and a suction head 53 with a vacuum suction hole is arranged below the through hole to For sucking the wafer 60, the sucking head 53 can be driven by a transposition mechanism 54 to perform lifting and pivoting movements.

該供料機構6(可為一供料匣)係設置於該第二機械臂2之活動範圍內,其內部可供收容複數片狀待加工之晶圓60。The feeding mechanism 6 (which may be a feeding cassette) is arranged in the movable range of the second robot arm 2 and can accommodate a plurality of wafers 60 to be processed in the inside thereof.

在實際應用時,於該供料機構6下方可依需要設置一升降機構61,該升降機構61係可驅動該供料機構6升高或降低位置。In practical applications, a lifting mechanism 61 can be provided below the feeding mechanism 6 as needed, and the lifting mechanism 61 can drive the feeding mechanism 6 to raise or lower the position.

請參第3圖所示,可知本發明之置載方法包括:「影像攫取組件校正取像範圍」S11、「晶圓定位件裝卸機構校正作業位置」S12、「影像攫取組件正確對應於晶圓盤」S13、「晶圓定位件裝卸機構由晶圓盤上取下晶圓定位件」S14、「晶圓取放機構校正作業位置」S15、「晶圓取放機構將晶圓放置於晶圓校正機構上」S16、「晶圓校正機構讀取晶圓之編碼,並將晶圓之缺口轉至正確角度」S17、「晶圓取放機構將晶圓移送至晶圓盤上」S18、「影像攫取組件取得晶圓之影像」S19、「晶圓定位件裝卸機構將晶圓定位件裝設於晶圓盤上,以固定晶圓」S20等步驟;以下即參照第4至17圖,並配合第1、2圖之結構分別說明上述各步驟:Please refer to Figure 3, it can be seen that the placement method of the present invention includes: "Image grabbing assembly correction image capture range" S11, "Wafer positioning member loading and unloading mechanism correction operation position" S12, "Image grabbing assembly correctly corresponds to the wafer "Tank" S13, "Wafer locator loading and unloading mechanism to remove the wafer locator from the wafer tray" S14, "Wafer pick-and-place mechanism calibration operation position" S15, "Wafer pick-and-place mechanism to place the wafer on the wafer "On the calibration mechanism" S16, "The wafer calibration mechanism reads the code of the wafer and turns the wafer notch to the correct angle" S17, "The wafer pick-and-place mechanism transfers the wafer to the wafer tray" S18, " The image grabbing component obtains the image of the wafer" S19, "The wafer positioner is mounted on the wafer tray by the wafer positioner loading and unloading mechanism to fix the wafer" S20 and other steps; refer to Figures 4 to 17 below, and In conjunction with the structure of Figures 1 and 2, explain the above steps respectively:

首先,該「影像攫取組件校正取像範圍」S11步驟,係由該第一機械臂1驅動該影像攫取組件11移至該主校正機構4上(如第4圖所示),以調整校正該影像攫取組件11取得影像範圍至正確位置。First, in the step S11 of "correcting the image capturing range of the image capture assembly", the first mechanical arm 1 drives the image capture assembly 11 to move to the main correction mechanism 4 (as shown in Fig. 4) to adjust and correct the The image grabbing component 11 obtains the image range to the correct position.

在本實施例中,當該第一機械臂1驅動該影像攫取組件11靠近該主校正機構4上方時,該下取像元件42直接取得該透明片43上標準刻度431的位置,且該主校正機構4係利用測距雷射光源41所產生之雷射光束411投射至該影像攫取組件11上,藉以測量該影像攫取組件11的距離,以調整該下取像元件42之鏡頭焦距;而該影像攫取組件11係經由該上取像元件111取得該透明片43上之標準刻度431的位置,由該控制模組比對該下取像元件42取得該標準刻度431的位置與該影像攫取組件11取得該標準刻度431的位置之間差異,經由該第一機械臂1調整該影像攫取組件11的位置,使該下取像元件42取得之標準刻度431位置與該上取像元件111取得之標準刻度431影像相疊合,再由該控制模組記憶該影像攫取組件11之正確取像範圍的座標,藉以達到校正該影像攫取組件11取像範圍之目的。In this embodiment, when the first mechanical arm 1 drives the image capture assembly 11 to approach the main correction mechanism 4, the lower image capture element 42 directly obtains the position of the standard scale 431 on the transparent sheet 43, and the main The correction mechanism 4 utilizes the laser beam 411 generated by the distance measuring laser light source 41 to project onto the image capture component 11, so as to measure the distance of the image capture component 11 to adjust the lens focal length of the lower image capture component 42; and The image capturing component 11 obtains the position of the standard scale 431 on the transparent sheet 43 through the upper image capturing element 111, and the control module compares the position of the standard scale 431 obtained by the lower image capturing element 42 with the image capturing element. The component 11 obtains the difference between the position of the standard scale 431, and adjusts the position of the image grabbing component 11 through the first robot arm 1, so that the position of the standard scale 431 obtained by the lower image capturing element 42 and the upper image capturing element 111 obtain The images of the standard scale 431 are superimposed, and then the control module memorizes the coordinates of the correct image capturing range of the image capture unit 11, so as to achieve the purpose of correcting the image capture range of the image capture unit 11.

該「晶圓定位件裝卸機構校正作業位置」S12步驟,係由該第一機械臂1驅動該晶圓定位件裝卸機構12之定位面121移至該主校正機構4上(如第5圖所示),以調整校正該晶圓定位件裝卸機構12的作業位置,且該控制模組可比對記憶該晶圓定位件裝卸機構12作業位置與該影像攫取組件11取得影像範圍之間的相對位置座標。In the step S12 of "wafer positioning member handling mechanism calibration operation position", the first robot arm 1 drives the positioning surface 121 of the wafer positioning member handling mechanism 12 to move to the main calibration mechanism 4 (as shown in Figure 5). Show) to adjust and calibrate the working position of the wafer positioning member handling mechanism 12, and the control module can compare and memorize the relative position between the working position of the wafer positioning member handling mechanism 12 and the image range obtained by the image grabbing assembly 11 coordinate.

在本實施例中,當該第一機械臂1驅動該晶圓定位件裝卸機構12靠近該主校正機構4上方時,該主校正機構4係利用測距雷射光源41所產生之雷射光投射至該定位面121上,藉以測量該晶圓定位件裝卸機構12的距離,以調整該下取像元件42之鏡頭焦距;而該下取像元件42則可觀視該透明片43上標準刻度431與該定位面121上該定位刻度122(或孔洞)之間的位置差異,並由該控制模組經由該第一機械臂1驅動該晶圓定位件裝卸機構12調整位置,使該定位面121上該定位刻度122(或孔洞)與該標準刻度431位置重疊,即可使該晶圓定位件裝卸機構12的作業位置可被校正至正確位置。In this embodiment, when the first mechanical arm 1 drives the wafer positioning member loading and unloading mechanism 12 to approach the main correction mechanism 4, the main correction mechanism 4 uses the laser light generated by the distance measuring laser light source 41 to project To the positioning surface 121 to measure the distance of the wafer positioning member mounting and dismounting mechanism 12 to adjust the lens focal length of the lower image capturing element 42; and the lower image capturing element 42 can observe the standard scale 431 on the transparent sheet 43 And the position difference between the positioning scale 122 (or hole) on the positioning surface 121, and the control module drives the wafer positioning member loading and unloading mechanism 12 through the first robot arm 1 to adjust the position, so that the positioning surface 121 The upper positioning scale 122 (or hole) overlaps the standard scale 431 position, so that the working position of the wafer positioning member handling mechanism 12 can be corrected to the correct position.

該「影像攫取組件正確對應於晶圓盤」S13步驟,係由該第一機械臂1驅動該影像攫取組件11移至該載盤3上方(如第6圖所示),以確認該晶圓盤31的位置並檢視該晶圓盤31上的狀況(是否有殘留之晶圓60碎屑或破片)。In the step S13 of "the image grabbing assembly correctly corresponds to the wafer tray", the first robot arm 1 drives the image grabbing assembly 11 to move to the top of the carrier tray 3 (as shown in Figure 6) to confirm the wafer The position of the disk 31 and check the condition on the wafer disk 31 (whether there are remaining chips or fragments of the wafer 60).

該「晶圓定位件裝卸機構由晶圓盤上取下晶圓定位件」S14步驟,係由該控制模組參考該相對位置座標,經該第一機械臂1驅動該晶圓定位件裝卸機構12接近該晶圓盤31,利用該控制模組經由該第一機械臂1驅動該晶圓定位件裝卸機構12調整位置,使該複數(至少三個)雷射光源124所產生相同長度之雷射光束,可共同投射於該晶圓盤31上,藉以使該定位面121對準(平行於)該晶圓盤31(如第7圖所示),再將該晶圓盤31周緣預先設置之晶圓定位件311解除鎖掣之後,利用該夾持件123取出該晶圓定位件311,並維持夾持狀態(如第8、9圖所示)。In step S14 of the "wafer positioning member loading and unloading mechanism removes the wafer positioning member from the wafer tray", the control module refers to the relative position coordinates, and drives the wafer positioning member loading and unloading mechanism via the first robot arm 1 12 approach the wafer tray 31, and use the control module to drive the wafer positioning member loading and unloading mechanism 12 to adjust the position via the first robot arm 1, so that the plurality of (at least three) laser light sources 124 generate mines of the same length The beams can be projected on the wafer disk 31 together, so that the positioning surface 121 is aligned (parallel to) the wafer disk 31 (as shown in Figure 7), and the periphery of the wafer disk 31 is preset After the wafer positioning member 311 is unlocked, the clamping member 123 is used to take out the wafer positioning member 311 and maintain the clamping state (as shown in Figures 8 and 9).

該「晶圓取放機構校正作業位置」S15步驟,係由該第二機械臂2驅動該晶圓取放機構21移至該主校正機構4上(如第10圖所示,為便於檢視該主校正機構4,並未繪出該晶圓校正機構5),以校正該晶圓取放機構21的位置。In the step S15 of "wafer pick-and-place mechanism calibration operation position", the second robot arm 2 drives the wafer pick-and-place mechanism 21 to move to the main calibration mechanism 4 (as shown in Figure 10, in order to facilitate the inspection of the The main calibration mechanism 4 does not show the wafer calibration mechanism 5) to calibrate the position of the wafer pick-and-place mechanism 21.

在本實施例中,當該第二機械臂2驅動該晶圓取放機構21靠近該主校正機構4上方時,該主校正機構4係利用測距雷射光源41所產生之雷射光投射至該晶圓取放機構21上,藉以測量該晶圓取放機構21的距離,以調整該下取像元件42之鏡頭焦距;而該下取像元件42則可觀視該透明片43上標準刻度431與該晶圓取放機構21上該指示刻度211之間的位置差異,並由該控制模組經由該第二機械臂2驅動該晶圓取放機構21調整位置,使該晶圓取放機構21上之該指示刻度211與該標準刻度431得以重疊,使該晶圓取放機構21的作業位置可被校正至正確位置。In this embodiment, when the second mechanical arm 2 drives the wafer pick-and-place mechanism 21 to approach the main correction mechanism 4, the main correction mechanism 4 uses the laser light generated by the distance measuring laser light source 41 to project to The wafer pick-and-place mechanism 21 is used to measure the distance of the wafer pick-and-place mechanism 21 to adjust the lens focal length of the lower image capturing element 42; and the lower image capturing element 42 can observe the standard scale on the transparent sheet 43 The position difference between 431 and the indicating scale 211 on the wafer pick-and-place mechanism 21, and the control module drives the wafer pick-and-place mechanism 21 to adjust the position via the second robot arm 2 to make the wafer pick-and-place The indicator scale 211 and the standard scale 431 on the mechanism 21 are overlapped, so that the working position of the wafer pick-and-place mechanism 21 can be calibrated to the correct position.

該「晶圓取放機構將晶圓放置於晶圓校正機構上」S16步驟,係由該第二機械臂2驅動該晶圓取放機構21移至該供料機構6中取出待加工之晶圓60(如第11圖所示),並將該晶圓60放置於該晶圓校正機構5之承置座51上(如第12圖所示)。In step S16 of the "wafer pick-and-place mechanism placing the wafer on the wafer calibration mechanism", the second robotic arm 2 drives the wafer pick-and-place mechanism 21 to move to the feeding mechanism 6 to take out the wafer to be processed. Circle 60 (as shown in Fig. 11), and place the wafer 60 on the supporting seat 51 of the wafer calibration mechanism 5 (as shown in Fig. 12).

該「晶圓校正機構讀取晶圓之編碼,並將晶圓之缺口轉至正確角度」S17步驟,係由該晶圓校正機構5之取像單元52先取得該晶圓60之編碼及缺口位置(如第13圖所示),再由該控制模組依據該欲置入晶圓盤31之缺口位置計算該晶圓60所需調整的角度,由該轉置機構54驅動該吸頭53吸附該晶圓60上升(脫離該承置座51),並轉動該晶圓60,以將該晶圓60之缺口調整至正確的角度;然後該轉置機構54帶動該吸頭53吸附該晶圓60下降,以將該晶圓60回置於該承置座51上。The "wafer calibration mechanism reads the code of the wafer and turns the notch of the wafer to the correct angle" in step S17. The imaging unit 52 of the wafer calibration mechanism 5 first obtains the code and notch of the wafer 60 Position (as shown in Fig. 13), the control module calculates the angle to be adjusted for the wafer 60 according to the notch position of the wafer tray 31 to be inserted, and the transposition mechanism 54 drives the suction head 53 The wafer 60 is sucked up (away from the holder 51), and the wafer 60 is rotated to adjust the notch of the wafer 60 to the correct angle; then the transposition mechanism 54 drives the suction head 53 to suck the wafer The circle 60 descends to place the wafer 60 back on the supporting seat 51.

該「晶圓取放機構將晶圓移送至晶圓盤上」S18步驟,係由該第二機械臂2驅動該晶圓取放機構21將該具有正確缺口角度之晶圓60由該晶圓校正機構5之承置座51上取出,並放置於該載盤3之該晶圓盤31上(如第14圖所示)。The "wafer pick-and-place mechanism transfers the wafer to the wafer tray" in step S18. The second robot arm 2 drives the wafer pick-and-place mechanism 21 to transfer the wafer 60 with the correct notch angle from the wafer. The calibration mechanism 5 is removed from the supporting seat 51 and placed on the wafer tray 31 of the carrier tray 3 (as shown in FIG. 14).

該「影像攫取組件取得晶圓之影像」S19,係由該第一機械臂1驅動該影像攫取組件11移至該載盤3上(如第15圖所示),並取得前一步驟所放置的晶圓60之影像,以確認該晶圓60是否完整且是否被放置於正確位置。The "image grabbing assembly obtains the image of the wafer" S19 is driven by the first robotic arm 1 to move the image grabbing assembly 11 to the carrier 3 (as shown in Figure 15), and obtain the placement in the previous step Image of the wafer 60 to confirm whether the wafer 60 is complete and placed in the correct position.

該「晶圓定位件裝卸機構將晶圓定位件裝設於晶圓盤上,以固定晶圓」S20步驟,係由該第一機械臂1驅動該晶圓定位件裝卸機構12將該夾持件123所夾持之該晶圓定位件311結合於該晶圓盤31上(如第16圖所示),藉由該晶圓定位件311壓合於該晶圓60周緣形成定位(如第17圖所示)。The "wafer positioner loading and unloading mechanism installs the wafer positioner on the wafer tray to fix the wafer" in step S20. The first robot arm 1 drives the wafer positioner loading and unloading mechanism 12 to clamp the wafer. The wafer positioning member 311 clamped by the member 123 is coupled to the wafer tray 31 (as shown in FIG. 16), and the wafer positioning member 311 is pressed against the periphery of the wafer 60 to form a positioning (such as Shown in Figure 17).

然後,該樞轉座333驅動該載盤3轉動,使該已承載晶圓60之該晶圓盤31轉至該外罩32下方,且另一未放置晶圓60之晶圓盤31移至該外罩32的凹缺口321下方形成裸露,以便於依序重覆上述S13、S14、S16、S17、S18、S19、S20等步驟,將不同晶圓60分別固定於各晶圓盤31上;最後,當該載盤3之各晶圓盤31皆已承載晶圓60之後,該滑移機構33之滑移座331沿該滑移導軌332向外滑動,以便於將該載盤3移至下一工序。Then, the pivot seat 333 drives the tray 3 to rotate, so that the wafer tray 31 that has loaded the wafer 60 is turned under the cover 32, and the other wafer tray 31 without the wafer 60 is moved to the The undercut 321 of the outer cover 32 is exposed, so that the above steps S13, S14, S16, S17, S18, S19, S20 can be repeated in order to fix the different wafers 60 on the wafer trays 31; finally, After each wafer tray 31 of the carrier 3 has loaded the wafer 60, the sliding seat 331 of the sliding mechanism 33 slides outward along the sliding guide 332, so as to move the carrier 3 to the next Process.

綜合以上所述,本發明晶圓載盤之置載裝置及其置載方法確可達成降低人力成本、確保晶圓放置於晶圓盤上之方向性及精準度之功效,實為一具新穎性及進步性之發明,爰依法提出申請發明專利;惟上述說明之內容,僅為本發明之較佳實施例說明,舉凡依本發明之技術手段與範疇所延伸之變化、修飾、改變或等效置換者,亦皆應落入本發明之專利申請範圍內。In summary, the wafer carrier tray placement device and placement method of the present invention can indeed reduce labor costs and ensure the directionality and accuracy of wafer placement on the wafer tray, which is indeed a novelty. For advanced inventions, I filed an application for invention patents in accordance with the law; however, the content of the above description is only a description of the preferred embodiments of the present invention, and all changes, modifications, changes or equivalents extended by the technical means and scope of the present invention Any replacement should also fall within the scope of the patent application of the present invention.

1:第一機械臂1: The first robotic arm

11:影像攫取組件11: Image grabbing component

111:上取像元件111: Upper imaging element

12:晶圓定位件裝卸機構12: Wafer positioning part loading and unloading mechanism

121:定位面121: positioning surface

122:定位刻度122: positioning scale

123:夾持件123: Clamping parts

124:雷射光源124: Laser light source

2:第二機械臂2: The second robotic arm

21:晶圓取放機構21: Wafer pick-and-place mechanism

211:指示刻度211: Indicating scale

3:載盤3: Carrying disk

31:晶圓盤31: Wafer tray

311:晶圓定位件311: Wafer locator

32:外罩32: outer cover

321:凹缺口321: Notch

33:滑移機構33: Sliding mechanism

331:滑移座331: sliding seat

332:滑移導軌332: Sliding rail

333:樞轉座333: pivot seat

4:主校正機構4: Main calibration mechanism

41:測距雷射光源41: Ranging laser light source

411:雷射光束411: Laser beam

42:下取像元件42: Lower imaging element

43:透明片43: transparent sheet

431:標準刻度431: standard scale

5:晶圓校正機構5: Wafer calibration mechanism

51:承置座51: Socket

52:取像單元52: Acquisition unit

53:吸頭53: suction head

54:轉置機構54: Transpose organization

6:供料機構6: Feeding mechanism

60:晶圓60: Wafer

61:升降機構61: Lifting mechanism

S11:影像攫取組件校正取像範圍S11: Correction of image capture range by image capture component

S12:晶圓定位件裝卸機構校正作業位置S12: Wafer positioning part loading and unloading mechanism corrects the working position

S13:影像攫取組件正確對應於晶圓盤S13: The image capture component correctly corresponds to the wafer tray

S14:晶圓定位件裝卸機構由晶圓盤上取下晶圓定位件S14: Wafer locator loading and unloading mechanism to remove the wafer locator from the wafer tray

S15:晶圓取放機構校正作業位置S15: Wafer pick-and-place mechanism to correct the working position

S16:晶圓取放機構將晶圓放置於晶圓校正機構上S16: Wafer pick-and-place mechanism places the wafer on the wafer calibration mechanism

S17:晶圓校正機構讀取晶圓之編碼,並將晶圓之缺口轉至正確角度S17: Wafer calibration mechanism reads the code of the wafer and turns the notch of the wafer to the correct angle

S18:晶圓取放機構將晶圓移送至晶圓盤上S18: The wafer pick-and-place mechanism transfers the wafers to the wafer tray

S19:影像攫取組件取得晶圓之影像S19: Image grabbing component to obtain wafer image

S20:晶圓定位件裝卸機構將晶圓定位件裝設於晶圓盤上,以固定晶圓S20: The wafer positioning member loading and unloading mechanism installs the wafer positioning member on the wafer tray to fix the wafer

第1圖係本發明將載盤局部分解之完整立體結構圖。Figure 1 is a complete three-dimensional structure diagram of the present invention with a partial decomposition of the carrier plate.

第2圖係本發明之主校正機構的局部放大示意圖。Figure 2 is a partial enlarged schematic diagram of the main correction mechanism of the present invention.

第3圖係本發明之置載方法流程圖。Figure 3 is a flowchart of the placement method of the present invention.

第4圖係本發明之影像攫取組件於主校正機構上方校正位置的狀態示意圖。Figure 4 is a schematic diagram of the state of the image capture assembly of the present invention being calibrated above the main calibration mechanism.

第5圖係本發明之晶圓定位件裝卸機構於主校正機構上方校正位置的狀態示意圖。Fig. 5 is a schematic diagram of the state of the wafer positioning member loading and unloading mechanism of the present invention in the correction position above the main correction mechanism.

第6圖係本發明之影像攫取組件於載盤上方正確對應於晶圓盤的狀態示意圖。Figure 6 is a schematic diagram of the state where the image grabbing assembly of the present invention is correctly corresponding to the wafer tray above the carrier tray.

第7圖係本發明之晶圓定位件裝卸機構移至晶圓盤上抓取晶圓定位件的狀態示意圖。FIG. 7 is a schematic diagram of the state where the wafer positioning member loading and unloading mechanism of the present invention is moved to the wafer tray to grab the wafer positioning member.

第8圖係本發明之晶圓定位件裝卸機構取下晶圓定位件的狀態示意圖。Fig. 8 is a schematic diagram of the state of removing the wafer positioning member by the wafer positioning member loading and unloading mechanism of the present invention.

第9圖係第8圖之A部位的局部放大示意圖。Figure 9 is a partial enlarged schematic diagram of part A in Figure 8.

第10圖係本發明之晶圓取放機構於主校正機構上方校正位置的狀態示意圖。Fig. 10 is a schematic diagram of the state of the wafer pick-and-place mechanism of the present invention in the correction position above the main correction mechanism.

第11圖係本發明之晶圓取放機構由供料機構中取出晶圓的狀態示意圖。Figure 11 is a schematic diagram of the wafer pick-and-place mechanism of the present invention taking out the wafer from the feeding mechanism.

第12圖係本發明之晶圓取放機構將晶圓置於晶圓校正機構上的動作示意圖。FIG. 12 is a schematic diagram of the operation of the wafer pick-and-place mechanism of the present invention when the wafer is placed on the wafer calibration mechanism.

第13圖係本發明之晶圓校正機構校正晶圓的狀態示意圖。Figure 13 is a schematic diagram of the state of the wafer calibration mechanism of the present invention to calibrate the wafer.

第14圖係本發明之晶圓取放機構將晶圓移置於晶圓盤上的狀態示意圖。FIG. 14 is a schematic diagram of the state of the wafer pick-and-place mechanism of the present invention moving the wafer onto the wafer tray.

第15圖係本發明之影像攫取組件確認載盤上晶圓位置的狀態示意圖。Figure 15 is a schematic diagram of the state of the image grabbing assembly of the present invention confirming the position of the wafer on the carrier.

第16圖係本發明之晶圓定位件裝卸機構移至晶圓盤上裝設晶圓定位件的狀態示意圖。FIG. 16 is a schematic diagram of the state where the wafer positioning member loading and unloading mechanism of the present invention is moved to the wafer tray to install the wafer positioning member.

第17圖係本發明之晶圓定位件裝卸機構移回初始位置且晶圓定位件固定於晶圓盤上的狀態示意圖。FIG. 17 is a schematic diagram of the state where the wafer positioning member loading and unloading mechanism of the present invention is moved back to the initial position and the wafer positioning member is fixed on the wafer tray.

1:第一機械臂1: The first robotic arm

11:影像攫取組件11: Image grabbing component

111:上取像元件111: Upper imaging element

12:晶圓定位件裝卸機構12: Wafer positioning part loading and unloading mechanism

121:定位面121: positioning surface

122:定位刻度122: positioning scale

123:夾持件123: Clamping parts

124:雷射光源124: Laser light source

2:第二機械臂2: The second robotic arm

21:晶圓取放機構21: Wafer pick-and-place mechanism

211:指示刻度211: Indicating scale

3:載盤3: carrier

31:晶圓盤31: Wafer tray

311:晶圓定位件311: Wafer locator

32:外罩32: outer cover

321:凹缺口321: Notch

33:滑移機構33: Sliding mechanism

331:滑移座331: sliding seat

332:滑移導軌332: Sliding rail

333:樞轉座333: pivot seat

4:主校正機構4: Main calibration mechanism

41:測距雷射光源41: Ranging laser light source

411:雷射光束411: Laser beam

42:下取像元件42: Lower imaging element

43:透明片43: transparent sheet

431:標準刻度431: standard scale

5:晶圓校正機構5: Wafer calibration mechanism

51:承置座51: Socket

52:取像單元52: Acquisition unit

53:吸頭53: suction head

54:轉置機構54: Transpose organization

6:供料機構6: Feeding mechanism

60:晶圓60: Wafer

61:升降機構61: Lifting mechanism

Claims (21)

一種晶圓載盤之置載裝置,至少包括: 一第一機械臂,係連結並受一控制模組驅動,於該第一機械臂之活動端上至少設有一影像攫取組件; 一第二機械臂,係連結並受該控制模組驅動,於該第二機械臂之活動端上設有一晶圓取放機構; 一載盤,係設置於該第一、二機械臂之活動範圍內,且係連結並受該控制模組驅動,該載盤上設有至少一承置晶圓的晶圓盤; 一主校正機構,係設置於該第一、二機械臂之活動範圍內,且係連結並受該控制模組驅動,以供分別校正該影像攫取組件及晶圓取放機構的位置; 一晶圓校正機構,係設置於該第二機械臂之活動範圍內,且係連結並受該控制模組驅動,以供讀取置入之晶圓的編碼及調整該晶圓之缺口; 一供料機構,係設置於該第二機械臂之活動範圍內,以供收容複數待加工之晶圓。A placement device for a wafer carrier disc, at least comprising: A first mechanical arm is connected and driven by a control module, and at least one image capture component is provided on the movable end of the first mechanical arm; A second robot arm is connected and driven by the control module, and a wafer pick-and-place mechanism is provided on the movable end of the second robot arm; A carrier plate is set within the movable range of the first and second robot arms and is connected and driven by the control module. The carrier plate is provided with at least one wafer tray for holding wafers; A main calibration mechanism is set in the movable range of the first and second robot arms, and is connected and driven by the control module to calibrate the positions of the image grabbing assembly and the wafer pick-and-place mechanism respectively; A wafer calibration mechanism is set in the movable range of the second robot arm, and is connected and driven by the control module for reading the code of the inserted wafer and adjusting the gap of the wafer; A feeding mechanism is arranged in the movable range of the second mechanical arm for storing a plurality of wafers to be processed. 如申請專利範圍第1項所述之晶圓載盤之置載裝置,其中各晶圓分別經由一可鎖掣之晶圓定位件固定於該晶圓盤上,且該第一機械臂之活動端上另設有一可裝卸該晶圓定位件之晶圓定位件裝卸機構。As described in the first item of the patent application, each wafer is fixed on the wafer tray via a lockable wafer positioning member, and the movable end of the first robot arm There is also a wafer positioning member loading and unloading mechanism capable of loading and unloading the wafer positioning member. 如申請專利範圍第2項所述之晶圓載盤之置載裝置,其中該影像攫取組件具有一可產生照明光線之上取像元件,該主校正機構具有一下取像元件,於該下取像元件上方設有一透明片,於該透明片上設有一作為定位基準之標準刻度;該晶圓定位件裝卸機構具有一定位面,於該定位面上設有一定位刻度;該晶圓取放機構具有可吸取晶圓之晶圓吸盤,於該晶圓吸盤上設有一指示刻度。As described in the second item of the scope of patent application, the wafer carrier tray placement device, wherein the image capture component has an upper image capturing element that can generate illuminating light, and the main correction mechanism has a lower image capturing element to capture images from the bottom A transparent sheet is provided above the component, and a standard scale is provided on the transparent sheet as a positioning reference; the wafer positioning member loading and unloading mechanism has a positioning surface, and a positioning scale is provided on the positioning surface; the wafer pick-and-place mechanism has a A wafer chuck for sucking wafers is provided with an indicator scale on the wafer chuck. 如申請專利範圍第3項所述之晶圓載盤之置載裝置,其中該晶圓定位件裝卸機構於該定位面外旁側設有複數雷射光源。For the wafer carrier tray placement device described in item 3 of the scope of patent application, the wafer positioning member loading and unloading mechanism is provided with a plurality of laser light sources outside the positioning surface. 如申請專利範圍第3項所述之晶圓載盤之置載裝置,其中該主校正機構於該下取像元件旁側設有一測距雷射光源。As described in item 3 of the patent application, the main correction mechanism is provided with a range-finding laser light source beside the lower imaging element. 如申請專利範圍第1或2或3或4或5項所述之晶圓載盤之置載裝置,其中該供料機構係為一內部具有收容空間之置料匣,該置料匣係設置於一升降機構上,該升降機構係連結並受該控制模組驅動,以調整該置料匣的高度。For example, the wafer carrier tray placement device described in item 1, 2, or 3, 4, or 5 of the scope of the patent application, wherein the feeding mechanism is a cassette with a accommodating space inside, and the cassette is set in On a lifting mechanism, the lifting mechanism is connected and driven by the control module to adjust the height of the magazine. 如申請專利範圍第1或2或3或4或5項所述之晶圓載盤之置載裝置,其中該載盤係設置於一滑移機構上,該滑移機構具有一滑移座,該滑移座係可沿複數平行延伸之滑移導軌移動,於該滑移座上設有一承置該載盤之樞轉座。For example, the wafer carrier disk placement device described in item 1 or 2 or 3 or 4 or 5 of the scope of patent application, wherein the carrier disk is arranged on a sliding mechanism, the sliding mechanism has a sliding seat, and The sliding seat is movable along a plurality of sliding guide rails extending in parallel, and a pivot seat for supporting the tray is provided on the sliding seat. 如申請專利範圍第6項所述之晶圓載盤之置載裝置,其中該載盤係設置於一滑移機構上,該滑移機構具有一滑移座,該滑移座係可沿複數平行延伸之滑移導軌移動,於該滑移座上設有一承置該載盤之樞轉座。For example, the wafer carrier disk placement device described in the scope of patent application, wherein the carrier disk is arranged on a sliding mechanism, the sliding mechanism has a sliding seat, and the sliding seat can be parallel along a plurality of The extended sliding guide rail moves, and the sliding seat is provided with a pivot seat for supporting the tray. 如申請專利範圍第7項所述之晶圓載盤之置載裝置,其中該載盤上方設有一外罩,該外罩上設有一凹缺口,可使該載盤上之局部晶圓盤對外裸露。For example, in the wafer carrier tray placement device described in item 7 of the scope of patent application, a cover is provided on the carrier tray, and the cover is provided with a notch so that a part of the wafer tray on the carrier tray can be exposed to the outside. 如申請專利範圍第8項所述之晶圓載盤之置載裝置,其中該載盤上方設有一外罩,該外罩上設有一凹缺口,可使該載盤上之局部晶圓盤對外裸露。For example, the wafer carrier tray placement device described in the scope of patent application, wherein a cover is provided on the carrier tray, and the cover is provided with a notch so that a part of the wafer tray on the carrier tray can be exposed to the outside. 如申請專利範圍第1或2或3或4或5項所述之晶圓載盤之置載裝置,其中該晶圓校正機構具有一可供放置晶圓之承置座,該承置座之中央係為貫通,於該承置座上方設有一取像單元,於該承置座之貫通部位下方設有一具真空吸孔之吸頭,該吸頭係可受一轉置機構驅動而升降及樞轉。For example, the wafer carrier tray placement device described in item 1 or 2 or 3 or 4 or 5 of the scope of patent application, wherein the wafer calibration mechanism has a holder for placing wafers, and the center of the holder It is a through-through, an image-taking unit is provided above the supporting base, and a suction head with a vacuum suction hole is provided under the through part of the supporting base. The suction head can be driven by a transposition mechanism to lift and pivot. change. 如申請專利範圍第6項所述之晶圓載盤之置載裝置,其中該晶圓校正機構具有一可供放置晶圓之承置座,該承置座之中央係為貫通,於該承置座上方設有一取像單元,於該承置座之貫通部位下方設有一具真空吸孔之吸頭,該吸頭係可受一轉置機構驅動而升降及樞轉。For example, the wafer carrier tray placement device described in item 6 of the scope of patent application, wherein the wafer calibration mechanism has a supporting seat for placing wafers, and the center of the supporting seat is penetrated and placed on the supporting seat. An image capturing unit is arranged above the seat, and a suction head with a vacuum suction hole is arranged below the through part of the supporting seat. The suction head can be driven by a transposition mechanism to lift and pivot. 如申請專利範圍第7項所述之晶圓載盤之置載裝置,其中該晶圓校正機構具有一可供放置晶圓之承置座,該承置座之中央係為貫通,於該承置座上方設有一取像單元,於該承置座之貫通部位下方設有一具真空吸孔之吸頭,該吸頭係可受一轉置機構驅動而升降及樞轉。For example, the wafer carrier tray placement device described in item 7 of the scope of patent application, wherein the wafer calibration mechanism has a holder for placing wafers. An image capturing unit is arranged above the base, and a suction head with a vacuum suction hole is arranged below the through part of the supporting base, and the suction head can be driven by a transposition mechanism to lift and pivot. 如申請專利範圍第8項所述之晶圓載盤之置載裝置,其中該晶圓校正機構具有一可供放置晶圓之承置座,該承置座之中央係為貫通,於該承置座上方設有一取像單元,於該承置座之貫通部位下方設有一具真空吸孔之吸頭,該吸頭係可受一轉置機構驅動而升降及樞轉。For example, the wafer carrier tray placement device described in item 8 of the scope of patent application, wherein the wafer calibration mechanism has a holder for placing wafers, and the center of the holder is penetrated, and the holder An image capturing unit is arranged above the base, and a suction head with a vacuum suction hole is arranged below the through part of the supporting base, and the suction head can be driven by a transposition mechanism to lift and pivot. 一種應用前述晶圓載盤之置載裝置的置載方法,至少包括: 一「影像攫取組件校正取像範圍」步驟,係由該第一機械臂驅動該影像攫取組件移至該主校正機構上,以校正該影像攫取組件取像範圍至正確位置; 一「晶圓定位件裝卸機構校正作業位置」步驟,係由該第一機械臂驅動該晶圓定位件裝卸機構之定位面移至該主校正機構上,以調整校正該晶圓定位件裝卸機構的作業位置,且該控制模組可比對記憶該晶圓定位件裝卸機構作業位置與該影像攫取組件取得影像範圍之間的相對位置座標; 一「影像攫取組件正確對應於晶圓盤」步驟,係由該第一機械臂驅動該影像攫取組件移至該載盤上方,並修正位置以準確對應於該載盤上其中之一晶圓盤; 一「晶圓定位件裝卸機構由晶圓盤上取下晶圓定位件」步驟,係由該控制模組參考該相對位置座標,經該第一機械臂驅動該晶圓定位件裝卸機構以該定位面對準該晶圓盤,並將該晶圓盤周緣預先設置之晶圓定位件取出; 一「晶圓取放機構校正作業位置」步驟,係由該第二機械臂驅動該晶圓取放機構移至該主校正機構上,以校正該晶圓取放機構的作業位置; 一「晶圓取放機構將晶圓放置於晶圓校正機構上」步驟,係由該第二機械臂驅動該晶圓取放機構移至該供料機構中取出待加工之晶圓,並將該晶圓放置於該晶圓校正機構之承置座上; 一「晶圓校正機構讀取晶圓之編碼,並將晶圓之缺口轉至正確角度」步驟,係由該晶圓校正機構之取像單元取得該晶圓之編碼及缺口位置,再由該轉置機構驅動該吸頭吸附該晶圓上升,並轉動該晶圓,以將該晶圓之缺口調整至正確的角度;然後該轉置機構驅動該吸頭吸附該晶圓下降,以將該晶圓置於該承置座上; 一「晶圓取放機構將晶圓移送至晶圓盤上」步驟,係由該第二機械臂驅動該晶圓取放機構將該晶圓由該承置座上取出,並放置於該載盤之該晶圓盤上; 一「影像攫取組件取得晶圓之影像」步驟,係由該第一機械臂驅動該影像攫取組件移至該載盤上,並取得先前放置的晶圓之影像,以確認該晶圓是否完整; 一「晶圓定位件裝卸機構將晶圓定位件裝設於晶圓盤上,以固定晶圓」步驟,係由該第一機械臂驅動該晶圓定位件裝卸機構將該晶圓定位件結合於該晶圓盤上,藉由該晶圓定位件壓合於該晶圓周緣形成定位。A placement method using the placement device of the aforementioned wafer carrier disc includes at least: A step of "calibrating the image capturing range of the image grabbing assembly" in which the first mechanical arm drives the image grabbing assembly to the main calibration mechanism to correct the image capturing range of the image grabbing assembly to the correct position; A step of "calibrating the working position of the wafer positioner loading and unloading mechanism" is in which the first robot arm drives the positioning surface of the wafer positioner loading and unloading mechanism to move to the main calibration mechanism to adjust and calibrate the wafer positioner loading and unloading mechanism The control module can compare and memorize the relative position coordinates between the operating position of the wafer positioning member loading and unloading mechanism and the image range obtained by the image grabbing assembly; A step of "the image grabbing component correctly corresponds to the wafer tray" is that the first robot arm drives the image grabbing component to move above the carrier and corrects the position to accurately correspond to one of the wafer trays on the carrier ; A step of "wafer positioning member loading and unloading mechanism removes the wafer positioning member from the wafer tray", the control module refers to the relative position coordinates, and the first robot arm drives the wafer positioning member loading and unloading mechanism to Align the positioning surface with the wafer tray, and take out the wafer positioning parts preset on the periphery of the wafer tray; A step of "calibrating the operating position of the wafer pick-and-place mechanism" in which the second robotic arm drives the wafer pick-and-place mechanism to the main correction mechanism to calibrate the operating position of the wafer pick-and-place mechanism; A "wafer pick-and-place mechanism places the wafer on the wafer calibration mechanism" step is that the second robotic arm drives the wafer pick-and-place mechanism to the feeding mechanism to take out the wafer to be processed, and The wafer is placed on the supporting seat of the wafer calibration mechanism; A "wafer calibration mechanism reads the code of the wafer and turns the notch of the wafer to the correct angle" step is to obtain the code and notch position of the wafer by the imaging unit of the wafer calibration mechanism, and then use the The transposition mechanism drives the suction head to suck the wafer up, and rotates the wafer to adjust the wafer notch to the correct angle; then the transposition mechanism drives the suction head to suck the wafer down to move the wafer down. The wafer is placed on the supporting seat; A "wafer pick-and-place mechanism transfers the wafer to the wafer tray" step is that the second robot arm drives the wafer pick-and-place mechanism to take the wafer out of the holder and place it on the carrier. On the wafer disk of the disk; A step of "the image grabbing assembly obtains the image of the wafer", in which the first robotic arm drives the image grabbing assembly to move to the carrier and obtains the image of the previously placed wafer to confirm whether the wafer is complete; A "wafer positioner loading and unloading mechanism installs the wafer positioner on the wafer tray to fix the wafer" step, the first robot arm drives the wafer positioner loading and unloading mechanism to combine the wafer positioner On the wafer tray, the wafer positioning member is pressed against the periphery of the wafer to form a positioning. 如申請專利範圍第15項所述之置載方法,其中該主校正機構中建置一下取像元件,於該下取像元件上方設一透明片,透明片上設一標準刻度作為定位基準;於該影像攫取組件中建置一上取像元件,若該上取像元件之取像範圍中的標準刻度位置與該下取像元件之取像範圍中的標準刻度位置之間產生位置偏差,則該控制模組經由該第一機械臂驅動該影像攫取組件調整位置,使該上、下取像元件之取像範圍中的標準刻度位置重疊,即能將該影像攫取組件之取像範圍被校正至正確位置。For example, the placement method described in item 15 of the scope of patent application, wherein a lower image capturing element is built in the main correction mechanism, a transparent sheet is set above the lower image capturing element, and a standard scale is set on the transparent sheet as a positioning reference; An upper image capturing element is built in the image capturing component. If a position deviation occurs between the standard scale position in the image capturing range of the upper image capturing element and the standard scale position in the image capturing range of the lower image capturing element, then The control module drives the image capture assembly to adjust the position via the first mechanical arm, so that the standard scale positions in the image capture range of the upper and lower image capture elements overlap, that is, the image capture range of the image capture assembly can be corrected To the correct position. 如申請專利範圍第15項所述之置載方法,其中該主校正機構中建置一下取像元件,於該下取像元件上方設一透明片,於該透明片上設一標準刻度作為定位基準;於該晶圓取放機構上設有一指示刻度;若該下取像元件之取像範圍中的標準刻度位置與該晶圓取放機構上之指示刻度產生位置偏差,則該控制模組經由該第二機械臂驅動該晶圓取放機構調整位置,使該指示刻度與該標準刻度重疊,即能將該晶圓取放機構之作業位置被校正至正確位置。For example, the placement method described in item 15 of the scope of patent application, wherein a lower image capturing element is built in the main correction mechanism, a transparent sheet is set above the lower image capturing element, and a standard scale is set on the transparent sheet as a positioning reference There is an indicating scale on the wafer pick-and-place mechanism; if the standard scale position in the imaging range of the lower imaging element and the indicating scale on the wafer pick-and-place mechanism produce a positional deviation, the control module will pass The second mechanical arm drives the wafer pick-and-place mechanism to adjust the position so that the indicator scale overlaps the standard scale, that is, the working position of the wafer pick-and-place mechanism can be corrected to the correct position. 如申請專利範圍第15項所述之置載方法,其中該主校正機構中建置一下取像元件,於該下取像元件上方設一透明片,透明片上設有一標準刻度作為定位基準;於該晶圓定位件裝卸機構之該定位面上設有一定位刻度;若該下取像元件之取像範圍中的標準刻度位置與該定位面上之定位刻度之間產生位置偏差,則該控制模組經由該第一機械臂驅動該晶圓定位件裝卸機構調整位置,使該定位刻度與該標準刻度重疊,即能將該晶圓定位件裝卸機構之作業位置被校正至正確位置。For example, the placement method described in item 15 of the scope of patent application, wherein a lower image capturing element is built in the main correction mechanism, a transparent sheet is arranged above the lower image capturing element, and a standard scale is provided on the transparent sheet as a positioning reference; The positioning surface of the wafer positioning member loading and unloading mechanism is provided with a positioning scale; if there is a position deviation between the standard scale position in the imaging range of the lower imaging element and the positioning scale on the positioning surface, the control module The group drives the wafer positioning member loading and unloading mechanism to adjust the position via the first mechanical arm, so that the positioning scale overlaps the standard scale, that is, the working position of the wafer positioning member loading and unloading mechanism can be calibrated to the correct position. 如申請專利範圍第15項所述之置載方法,其中該主校正機構中建置一測距雷射光源,該測距雷射光源能產生雷射光束,以量測該影像攫取組件、晶圓定位件裝卸機構、晶圓取放機構分別與該下取像元件之間的距離,以經由該控制模組調整該下取像元件之鏡頭焦距。For example, the placement method described in item 15 of the scope of patent application, wherein a range-finding laser light source is built in the main correction mechanism, and the range-finding laser light source can generate a laser beam to measure the image capture component, crystal The distance between the circular positioning member mounting and dismounting mechanism and the wafer pick-and-place mechanism respectively and the lower image-taking element can be adjusted by the control module to adjust the lens focal length of the lower image-taking element. 如申請專利範圍第15項所述之置載方法,其中該晶圓定位件裝卸機構周側建置有至少三雷射光源,在該「晶圓定位件裝卸機構由晶圓盤上取下晶圓定位件」步驟中,利用該控制模組經由該第一機械臂驅動該晶圓定位件裝卸機構調整位置,使各雷射光源所產生相同長度之雷射光束,可共同投射於該晶圓盤上,藉以使以該晶圓定位件裝卸機構正確對應於該晶圓盤。For example, the placement method described in item 15 of the scope of patent application, wherein at least three laser light sources are built on the periphery of the wafer positioning member loading and unloading mechanism. In the step of "circular positioning member", the control module is used to drive the wafer positioning member loading and unloading mechanism to adjust the position through the first mechanical arm, so that the laser beams of the same length generated by each laser light source can be projected on the wafer together On the disk, so that the wafer positioning member loading and unloading mechanism correctly corresponds to the wafer disk. 如申請專利範圍第15項所述之置載方法,其中該晶圓校正機構中至少建置一承置座、一取像單元及一轉置機構,該承置座係供承置該晶圓,該取像單元取得該晶圓之編碼及缺口位置,該轉置機構係能帶動該晶圓轉動,以調整該晶圓之缺口至正確的角度。For example, the placing method described in item 15 of the scope of patent application, wherein the wafer calibration mechanism is provided with at least a supporting seat, an image capturing unit and a transposition mechanism, and the supporting seat is used to hold the wafer The image capturing unit obtains the code and notch position of the wafer, and the transposition mechanism can drive the wafer to rotate to adjust the notch of the wafer to the correct angle.
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