TW202132016A - Optical sensor window cleaner - Google Patents

Optical sensor window cleaner Download PDF

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TW202132016A
TW202132016A TW109136220A TW109136220A TW202132016A TW 202132016 A TW202132016 A TW 202132016A TW 109136220 A TW109136220 A TW 109136220A TW 109136220 A TW109136220 A TW 109136220A TW 202132016 A TW202132016 A TW 202132016A
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nozzle
passage
optical window
liquid
fluid
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TW109136220A
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TWI760895B (en
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崔西 加斯特
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美商恩特葛瑞斯股份有限公司
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01Arrangements or apparatus for facilitating the optical investigation
    • G01N21/15Preventing contamination of the components of the optical system or obstruction of the light path
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02Cleaning by the force of jets, e.g. blowing-out cavities
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N21/4133Refractometers, e.g. differential
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/85Investigating moving fluids or granular solids
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01Arrangements or apparatus for facilitating the optical investigation
    • G01N21/15Preventing contamination of the components of the optical system or obstruction of the light path
    • G01N2021/151Gas blown
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01Arrangements or apparatus for facilitating the optical investigation
    • G01N21/15Preventing contamination of the components of the optical system or obstruction of the light path
    • G01N2021/155Monitoring cleanness of window, lens, or other parts
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N21/4133Refractometers, e.g. differential
    • G01N2021/4153Measuring the deflection of light in refractometers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Optics & Photonics (AREA)
  • Optical Measuring Cells (AREA)
  • Nozzles (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

A sensor assembly includes a passageway for a process fluid, an optical window, an optical sensor, and a nozzle. The optical sensor configured to detect an optical property of the process fluid. The optical window includes an inner surface. The nozzle configured discharge an atomized fluid in a discharge direction that intersects the inner surface of the optical window. A sensor system includes a sensor assembly and conduits for supplying a gas and a liquid to a nozzle of the sensor assembly. A method of cleaning an optical window in a sensor assembly includes forming an atomized fluid and discharging the atomized fluid in a discharge direction that intersects the optical window.

Description

光學感測器窗清潔器Optical sensor window cleaner

本發明係關於用於量測流體性質之感測器。更具體言之,本發明係關於量測流動流體之光學性質之光學感測器。The present invention relates to a sensor for measuring fluid properties. More specifically, the present invention relates to an optical sensor for measuring the optical properties of a flowing fluid.

光學感測器可用於判定流動流體之一或多個性質。光學感測器可通過窗向流體傳輸光。光可在窗與流體之間的邊界處折射。光學感測器可藉由偵測由流體折射之光之量、角度或者量及角度來判定流體之折射率。流體之折射率可用於判定流體之其他性質。例如,可使用流體之折射率來判定流體之濃度或純度。製程流體可包括液體或包括液體及固體之混合物。The optical sensor can be used to determine one or more properties of the flowing fluid. The optical sensor can transmit light to the fluid through the window. Light can be refracted at the boundary between the window and the fluid. The optical sensor can determine the refractive index of the fluid by detecting the amount, angle, or amount and angle of light refracted by the fluid. The refractive index of the fluid can be used to determine other properties of the fluid. For example, the refractive index of the fluid can be used to determine the concentration or purity of the fluid. The process fluid may include liquid or a mixture of liquid and solid.

感測器系統包括感測器總成及向感測器總成供應製程流體之導管。感測器總成包括用於製程流體之通路、光學窗及光學感測器。光學窗形成通路之側壁。製程流體流經通路並接觸光學窗。感測器經組態以通過光學窗傳輸光並偵測製程流體之光學性質。The sensor system includes a sensor assembly and a conduit for supplying process fluid to the sensor assembly. The sensor assembly includes a channel for the process fluid, an optical window, and an optical sensor. The optical window forms the side wall of the passage. The process fluid flows through the channel and contacts the optical window. The sensor is configured to transmit light through the optical window and detect the optical properties of the process fluid.

揭示用於清潔光學窗之感測器系統、感測器總成及方法之實施例。在一實施例中,感測器系統包括感測器總成。製程流體被供應至感測器總成。在一些實施例中,感測器總成包括光學窗及用於偵測製程流體之光學性質之光學感測器。Embodiments of a sensor system, a sensor assembly, and a method for cleaning optical windows are disclosed. In an embodiment, the sensor system includes a sensor assembly. The process fluid is supplied to the sensor assembly. In some embodiments, the sensor assembly includes an optical window and an optical sensor for detecting the optical properties of the process fluid.

在一實施例中,感測器系統包括感測器總成及用於向感測器總成供應製程流體、液體及氣體之流體迴路(例如,導管、管路、管道、其組合等)。感測器總成包括用於製程流體之通路、光學窗及噴嘴。光學窗形成通路之側壁且製程流體接觸光學窗。流體迴路以流體方式連接至噴嘴以供應液體。流體迴路亦以流體方式連接至噴嘴以供應氣體。該噴嘴經組態以在衝擊光學窗之內表面之方向上排出包括液體及氣體之霧化流體。霧化流體衝擊並去除可散射光之材料。In one embodiment, the sensor system includes a sensor assembly and a fluid circuit (for example, pipes, pipes, pipes, combinations thereof, etc.) for supplying process fluids, liquids, and gases to the sensor assembly. The sensor assembly includes channels for process fluids, optical windows and nozzles. The optical window forms the sidewall of the via and the process fluid contacts the optical window. The fluid circuit is fluidly connected to the nozzle to supply liquid. The fluid circuit is also fluidly connected to the nozzle to supply gas. The nozzle is configured to discharge atomized fluid including liquid and gas in the direction of impacting the inner surface of the optical window. The atomized fluid impacts and removes materials that can scatter light.

在一實施例中,感測器總成包括用於製程流體之通路、光學窗及噴嘴。光學窗形成通路之側壁,且製程流體經組態以接觸光學窗。該噴嘴經組態以在衝擊光學窗之內表面之方向上形成及排出包括液體及氣體之霧化流體。In one embodiment, the sensor assembly includes a channel for process fluid, an optical window, and a nozzle. The optical window forms the sidewall of the passage, and the process fluid is configured to contact the optical window. The nozzle is configured to form and discharge atomized fluid including liquid and gas in the direction of impacting the inner surface of the optical window.

在一實施例中,清潔感測器總成中之光學窗之方法包括霧化液體及氣體。感測器總成包括用於製程流體之通路、光學窗及用於製程流體之光學感測器。霧化流體在衝擊光學窗之方向上排出至通路中。In one embodiment, the method of cleaning the optical window in the sensor assembly includes atomizing liquid and gas. The sensor assembly includes a channel for the process fluid, an optical window, and an optical sensor for the process fluid. The atomized fluid is discharged into the passage in the direction of impacting the optical window.

如在本說明書及所附申請專利範圍中所使用,單數形式「一」、「一個」及「該」包括複數個所指示物,除非內容另外清楚地指示。如在本說明書及所附申請專利範圍中所使用,術語「或」通常以其包括「及/或」之意義來使用,除非內容另外清楚地指示。As used in this specification and the scope of the appended application, the singular forms "a", "an" and "the" include plural referents, unless the content clearly indicates otherwise. As used in this specification and the scope of the appended application, the term "or" is usually used in its meaning including "and/or", unless the content clearly indicates otherwise.

術語「約」通常係指被認為等同於所敍述之值之數值範圍(例如具有相同的功能或結果)。在許多情況下,術語「約」可包括捨位至最接近的有效數字之數字。The term "about" usually refers to a range of values that is considered equivalent to the stated value (for example, having the same function or result). In many cases, the term "about" can include numbers rounded to the nearest significant figure.

使用端點表示之數值範圍包括落入該範圍內之所有數值(例如1至5包括1、1.5、2、2.75、3、3.80、4及5)。Numerical ranges expressed using endpoints include all values falling within the range (for example, 1 to 5 includes 1, 1.5, 2, 2.75, 3, 3.80, 4, and 5).

以下實施方式應參考圖式來閱讀,其中不同圖式中之類似元件用相同的附圖標記表示。實施方式及圖式(其未必按比例)描述說明性實施例,且不意欲限制本發明之範疇。所描述之說明性實施例僅被認為係例示性的。任何說明性實施例之所選定特徵可結合至額外實施例中,除非清楚地相反說明。The following embodiments should be read with reference to the drawings, in which similar elements in different drawings are denoted by the same reference numerals. The embodiments and drawings (which are not necessarily to scale) describe illustrative examples and are not intended to limit the scope of the present invention. The illustrative embodiments described are to be regarded as illustrative only. Selected features of any illustrative embodiment can be combined into additional embodiments, unless clearly stated to the contrary.

光學感測器可用於偵測流體之一或多個光學性質。流體可被引導沿著光學窗之一側流動,而光學感測器沿著窗之另一側定位。光學感測器可經組態以通過光學窗傳輸光並偵測流體如何影響光。例如,光學感測器可經組態以偵測光在光學窗與流動流體之間的過渡區處如何折射。例如,光學感測器可經組態以偵測由流動流體反射之光量。製程流體之光學性質可用於判定製程流體之一或多個其他性質,例如製程流體之濃度或純度。The optical sensor can be used to detect one or more optical properties of the fluid. The fluid can be directed to flow along one side of the optical window, while the optical sensor is positioned along the other side of the window. The optical sensor can be configured to transmit light through the optical window and detect how the fluid affects the light. For example, the optical sensor can be configured to detect how light is refracted at the transition area between the optical window and the flowing fluid. For example, the optical sensor can be configured to detect the amount of light reflected by the flowing fluid. The optical properties of the process fluid can be used to determine one or more other properties of the process fluid, such as the concentration or purity of the process fluid.

流體之成分可被吸引至光學窗並沈積在光學窗上,從而在光學窗上形成材料層。該成分向光學窗之吸引及沈積可由例如該成分與光學窗之材料之間的分子間力引起(例如,成分之ζ電位可驅動它們朝向光學窗,並且一旦彼此接近,吸引由凡得瓦爾力驅動)。當流體包括更容易黏附至光學窗上之固體顆粒時,此問題可能更明顯地發生。此外,已經發現,隨著時間之推移,沈積變得更難以去除。因此,顆粒在光學窗上停留之時間愈長,顆粒沈積得愈強烈,愈難以除去。The components of the fluid can be attracted to the optical window and deposited on the optical window, thereby forming a material layer on the optical window. The attraction and deposition of the component to the optical window can be caused by, for example, the intermolecular force between the component and the material of the optical window (for example, the zeta potential of the component can drive them toward the optical window, and once they are close to each other, the attraction is caused by Van der Waals force drive). This problem may occur more obviously when the fluid includes solid particles that are more likely to adhere to the optical window. In addition, it has been found that over time, deposits become more difficult to remove. Therefore, the longer the particles stay on the optical window, the more intense the particle deposition and the more difficult it is to remove.

一般技術者將認識到,光學窗上之部分材料層可能不利地影響光之傳播並產生錯誤的量測。在依賴於高精度量測之感測器中,例如在半導體製造中,此誤差在半導體製造製程中可能具有顯著的不利影響。Those skilled in the art will recognize that part of the material layer on the optical window may adversely affect the propagation of light and produce erroneous measurements. In sensors that rely on high-precision measurement, such as in semiconductor manufacturing, this error may have a significant adverse effect in the semiconductor manufacturing process.

本文中所揭示之實施例係關於感測器總成、感測器系統及清潔感測器總成中之光學窗之方法。如本文中所使用,清潔光學窗可包括例如自該光學窗去除沈積之成分以至少部分地曝露該光學窗之表面。感測器系統可包括感測器總成。本文中所描述之實施例能夠在光學窗處排出霧化流體以去除沈積在光學窗上之任何材料之大部分至全部。對液體進行霧化以排出霧化流體可加速霧化流體之液體部分並在表面上導致之空化(例如,在衝擊光學窗之後,霧化流體之液體部分之液滴內爆)。不受理論之約束,據信霧化流體之液體部分之液滴對光學窗之衝擊可引發衝擊波,從而自光學窗除去沈積物或材料。The embodiments disclosed herein are related to a sensor assembly, a sensor system, and a method of cleaning the optical window in the sensor assembly. As used herein, cleaning an optical window may include, for example, removing deposited components from the optical window to at least partially expose the surface of the optical window. The sensor system may include a sensor assembly. The embodiments described herein can discharge atomized fluid at the optical window to remove most to all of any material deposited on the optical window. Atomizing the liquid to discharge the atomized fluid can accelerate the liquid portion of the atomized fluid and cause cavitation on the surface (for example, after impacting the optical window, the droplets of the liquid portion of the atomized fluid implode). Without being bound by theory, it is believed that the impact of droplets of the liquid portion of the atomized fluid on the optical window can trigger a shock wave, thereby removing deposits or materials from the optical window.

圖1係感測器系統1之實施例的示意圖。感測器系統1包括經組態以偵測製程流體F1 之一或多個光學性質之感測器總成10。在一個實施例中,感測器總成10偵測製程流體F1 之折射率。FIG. 1 is a schematic diagram of an embodiment of the sensor system 1. 1 by the sensor system comprises a sensor configured to one or more optical properties of a detector assembly 10 the process fluid F. In one embodiment, the sensor assembly 10 detects the refractive index of the process fluid F 1.

感測器總成10包括通路12、光學窗32、光學感測器38及噴嘴50。通路12包括入口20及出口22。通路12穿過感測器總成12自入口20延伸至出口22。製程流體F1 藉由流經通路12而流經感測器總成10。製程流體F1 通過入口20流入,流經通路12,然後通過出口22流出而流經感測器總成10。The sensor assembly 10 includes a passage 12, an optical window 32, an optical sensor 38 and a nozzle 50. The passage 12 includes an inlet 20 and an outlet 22. The passage 12 extends through the sensor assembly 12 from the inlet 20 to the outlet 22. The process fluid F 1 flows through the sensor assembly 10 by flowing through the passage 12. The process fluid F 1 flows in through the inlet 20, flows through the passage 12, and then flows out through the outlet 22 to flow through the sensor assembly 10.

第一導管60將製程流體F1 供應至通路12之入口20。第一導管60將製程流體源62以流體方式連接至入口20。製程流體F1 自製程流體源62藉由第一導管60流至通路12。在一實施例中,製程流體源62可係容納製程流體F1 之罐。在一實施例中,製程流體源62可係容納製程流體F1 之成分之複數個罐,且製程流體源62混合此等成分以形成製程流體F1 ,然後由第一導管60供應該製程流體。第一導管60包括流量閥64。流量閥64控制由第一導管60供應至通路12及感測器總成10之製程流體F1 之流率f 1 。在一實施例中,流量閥64由控制器90控制。控制器90經組態以調節流量閥64以控制流向及通過感測器總成10之製程流體F1 之流率f 1The first conduit 60 supplies the process fluid F 1 to the inlet 20 of the passage 12. The first conduit 60 fluidly connects the process fluid source 62 to the inlet 20. The process fluid F 1 flows from the source 62 of the process fluid to the passage 12 through the first conduit 60. In one embodiment, the process fluid source 62 may be a tank containing the process fluid F 1. In one embodiment, the process fluid source 62 may be based receiving process fluid F plurality of tank components of the one, and the process fluid source 62 mix these ingredients to form a process fluid F 1, then a first conduit 60 supplies the process fluid . The first conduit 60 includes a flow valve 64. The flow valve 64 controls the flow rate f 1 of the process fluid F 1 supplied from the first conduit 60 to the passage 12 and the sensor assembly 10. In one embodiment, the flow valve 64 is controlled by the controller 90. The controller 90 is configured to adjust the flow valve 64 to control the flow rate f 1 of the process fluid F 1 flowing to and through the sensor assembly 10.

在一實施例中,製程流體F1 用於在半導體製造中拋光半導體晶圓。製程流體F1 含有液體及磨粒。在一實施例中,磨粒包括二氧化鈰、膠態二氧化矽、熱解法二氧化矽及氟化鑭中之一或多者。在一實施例中,製程流體F1 含有至少0.1 wt.%之磨粒。在一實施例中,製程流體F1 含有約0.1 wt.%至約30 wt.%之磨粒。在一實施例中,用於製程流體F1 之液體可包括水或水基溶液。In one embodiment, the process fluid F 1 for polishing a semiconductor wafer in semiconductor manufacturing. The process fluid F 1 contains liquid and abrasive particles. In one embodiment, the abrasive particles include one or more of ceria, colloidal silica, fumed silica, and lanthanum fluoride. In one embodiment, the process fluid F 1 contains at least 0.1 wt.% abrasive particles. In one embodiment, the process fluid F 1 contains about 0.1 wt.% to about 30 wt.% of abrasive particles. In one embodiment, the process for the liquid fluid F can comprise water or a water-based solution.

當自入口20至出口22流經通路12時,製程流體F1 沿著光學窗32流動。光學感測器38沿著光學窗32定位。光學感測器38將光通過光學窗32向通路12傳輸。光學感測器38亦偵測由製程流體F1 折射之光。光學感測器38經組態以藉由偵測由製程流體F1 折射之光來偵測製程流體F1 之折射率。When flowing through the channel 12 from the inlet 20 to the outlet 22, the process fluid F 1 flows along the optical window 32. The optical sensor 38 is positioned along the optical window 32. The optical sensor 38 transmits light to the passage 12 through the optical window 32. The optical sensor 38 is also detected by the light refraction of a process fluid F. The optical sensor 38 is configured to detect the refractive index of the process fluid F 1 by detecting the light refracted by the process fluid F 1 .

噴嘴50可清潔光學窗32。噴嘴50形成霧化流體52並向光學窗32排出霧化流體52。霧化流體52衝擊光學窗32並經組態以去除沈積在光學窗32上之材料。在一個實施例中,噴嘴50可被稱為空氣噴射或空氣輔助霧化器。下文更詳細地論述噴嘴50之操作。霧化流體52含有液體F2 及氣體F3 。第二導管70將液體F2 供應至噴嘴50且第三導管80將氣體F3 供應至噴嘴50。噴嘴50經組態以組合液體F2 及氣體F3 以形成霧化流體52。The nozzle 50 can clean the optical window 32. The nozzle 50 forms an atomized fluid 52 and discharges the atomized fluid 52 to the optical window 32. The atomized fluid 52 impacts the optical window 32 and is configured to remove the material deposited on the optical window 32. In one embodiment, the nozzle 50 may be referred to as an air jet or air-assisted atomizer. The operation of the nozzle 50 is discussed in more detail below. The atomizing fluid 52 contains liquid F 2 and gas F 3 . The second duct 70 supplies the liquid F 2 to the nozzle 50 and the third duct 80 supplies the gas F 3 to the nozzle 50. The nozzle 50 is configured to combine the liquid F 2 and the gas F 3 to form an atomized fluid 52.

第二導管70以流體方式連接至噴嘴50並將液體F2 供應至噴嘴50。在一實施例中,液體F2 包括水、氫氧化銨及液體低污染物半導體製造清潔產品(例如,PlanarClean AG-Ce1000K、ESC 784清潔溶液等)中之一或多者。在一實施例中,水係去離子(「DI」)水。在一實施例中,第二導管70將液體源72以流體方式連接至噴嘴50。在一實施例中,液體源72包括過濾器及/或容納液體F2 之一或多個罐。在一實施例中,液體源72係產生DI水之過濾器。The second pipe 70 is fluidly connected to the nozzle 50 and supplies the liquid F 2 to the nozzle 50. In one embodiment, the liquid F 2 includes one or more of water, ammonium hydroxide, and liquid low-pollutant semiconductor manufacturing cleaning products (for example, PlanarClean AG-Ce1000K, ESC 784 cleaning solution, etc.). In one embodiment, water is deionized ("DI") water. In one embodiment, the second conduit 70 fluidly connects the liquid source 72 to the nozzle 50. In an embodiment, the liquid source 72 includes a filter and/or one or more tanks containing the liquid F 2. In one embodiment, the liquid source 72 is a filter that produces DI water.

第二導管70包括流量閥74及流量感測器76。流量閥74控制供應至噴嘴50之液體F2 之流率f 2 。流量感測器76偵測通過第二導管70並供應至噴嘴50之液體F2 之流率f 2 。在一實施例中,控制器90控制流量閥74。控制器90可將供應至噴嘴50之液體F2 之流率f 2 控制在如下文所論述的之特定量或特定範圍內。控制器90可利用流量感測器76來偵測供應至噴嘴50之液體F2 之流率f 2The second conduit 70 includes a flow valve 74 and a flow sensor 76. The flow valve 74 controls the flow rate f 2 of the liquid F 2 supplied to the nozzle 50. The flow sensor 76 detects the flow rate f 2 of the liquid F 2 that passes through the second conduit 70 and is supplied to the nozzle 50. In one embodiment, the controller 90 controls the flow valve 74. The controller 90 can control the flow rate f 2 of the liquid F 2 supplied to the nozzle 50 within a specific amount or a specific range as discussed below. The controller 90 can use the flow sensor 76 to detect the flow rate f 2 of the liquid F 2 supplied to the nozzle 50.

第三導管80以流體方式連接至噴嘴50並將加壓氣體F3 供應至噴嘴50。在一實施例中,氣體F3 包括一或多種惰性氣體及清潔乾燥空氣(CDA)。在一實施例中,氣體F3 係惰性氣體,其可包括但不限於氮氣、氦氣、氖氣、氬氣、氪氣、氙氣等中之一或多者。在一實施例中,氣體F3 係氮氣。在一實施例中,第一導管80將氣體源82以流體方式連接至噴嘴50。在一實施例中,氣體源82包括過濾器及容納氣體F3 之一或多個罐中之一者或兩者。在一實施例中,氣體源82係自空氣中產生淨化氮氣及/或氬氣之過濾器。The third conduit 80 is fluidly connected to the nozzle 50 and supplies pressurized gas F 3 to the nozzle 50. In one embodiment, a gas comprising F 3 or more inert gases and clean dry air (CDA). In an embodiment, the gas F 3 is an inert gas, which may include, but is not limited to, one or more of nitrogen, helium, neon, argon, krypton, xenon, and the like. In one embodiment, the nitrogen-based gas F 3. In one embodiment, the first conduit 80 fluidly connects the gas source 82 to the nozzle 50. In one embodiment, the gas source 82 comprises a filter and a gas receiving one or more of F 3, one or both of the tanks. In one embodiment, the gas source 82 is a filter that generates purified nitrogen and/or argon from the air.

導管80包括流量閥84及流量感測器86。流量閥84控制供應至噴嘴50之氣體F3 之流率f 3 。流量感測器86偵測通過導管80供應至噴嘴50之氣體F3 之流率f 3 。在一實施例中,控制器90控制流量閥84。控制器90可將供應至噴嘴50之氣體F3 之流率f 3 控制在如下文所論述之特定量或特定範圍內。控制器90可利用流量感測器86來偵測供應至噴嘴50之氣體F3 之流率f 3The conduit 80 includes a flow valve 84 and a flow sensor 86. The flow valve 84 controls the flow rate f 3 of the gas F 3 supplied to the nozzle 50. The flow sensor 86 detects the flow rate f 3 of the gas F 3 supplied to the nozzle 50 through the conduit 80. In one embodiment, the controller 90 controls the flow valve 84. The controller 90 can control the flow rate f 3 of the gas F 3 supplied to the nozzle 50 within a specific amount or a specific range as discussed below. The controller 90 can use the flow sensor 86 to detect the flow rate f 3 of the gas F 3 supplied to the nozzle 50.

圖2係感測器總成10之實施例的截面圖。感測器總成10包括具有入口20及出口22之通路12、光學窗32、光學感測器38、噴嘴50、用於液體F2 之第二導管70及用於氣體F3 之第三導管80。FIG. 2 is a cross-sectional view of an embodiment of the sensor assembly 10. The sensor assembly 10 includes a passage 12 with an inlet 20 and an outlet 22, an optical window 32, an optical sensor 38, a nozzle 50, a second conduit 70 for liquid F 2 and a third conduit for gas F 3 80.

製程流體F1 藉由流經通路12而流經感測器總成10。通路12自入口20延伸至出口22。製程流體F1 經組態以通過入口20流入並通過出口22流出。光學窗32及噴嘴50各自沿著通路12定位。The process fluid F 1 flows through the sensor assembly 10 by flowing through the passage 12. The passage 12 extends from the inlet 20 to the outlet 22. The process fluid F 1 is configured to flow in through the inlet 20 and flow out through the outlet 22. The optical window 32 and the nozzle 50 are each positioned along the passage 12.

光學窗32形成通路12之側壁14。光學窗32包括內表面34及外表面36。外表面36與內表面34相對。在一實施例中,光學窗32之內表面34形成通路12之側壁14。當流經通路12時,製程流體F1 接觸光學窗32之內表面34。光學窗32之內表面34由抗劃傷材料製成。在一實施例中,光學窗32之內表面34由金剛石或藍寶石製成。在一實施例中,光學窗32之內表面34由硼矽酸鹽玻璃製成。The optical window 32 forms the side wall 14 of the passage 12. The optical window 32 includes an inner surface 34 and an outer surface 36. The outer surface 36 is opposite to the inner surface 34. In one embodiment, the inner surface 34 of the optical window 32 forms the side wall 14 of the passage 12. When flowing through the passage 12, the process fluid F 1 contacts the inner surface 34 of the optical window 32. The inner surface 34 of the optical window 32 is made of scratch-resistant material. In one embodiment, the inner surface 34 of the optical window 32 is made of diamond or sapphire. In one embodiment, the inner surface 34 of the optical window 32 is made of borosilicate glass.

光學感測器38連接至光學窗32。在一實施例中,光學感測器38附著在光學窗32之外表面36上。光學感測器38經組態以通過光學窗32傳輸光,並在光學窗32中偵測向光學感測器38傳輸之光。例如,光學感測器38可在方向D1 上向通路32傳輸光。光學感測器38經組態以偵測在內表面34處被製程流體F1 折射之光。然後可使用偵測到之光折射來判定製程流體F1 之折射率。The optical sensor 38 is connected to the optical window 32. In one embodiment, the optical sensor 38 is attached to the outer surface 36 of the optical window 32. The optical sensor 38 is configured to transmit light through the optical window 32 and detect the light transmitted to the optical sensor 38 in the optical window 32. For example, optical sensor 38 to the passage 32 may transmit light in a direction D 1. The optical sensor 38 is configured to detect the light refracted by the process fluid F 1 at the inner surface 34. The detected light refraction can then be used to determine the refractive index of the process fluid F 1.

導管70、導管80將液體F2 及氣體F3 供應至噴嘴50。噴嘴50將液體F2 及氣體F3 之霧化流體52排出至通路12中。霧化流體52通過通路12之第二側壁16中之開口18排出。在一實施例中,第二側壁16與第一側壁14相對。在一實施例中,第二側壁16由噴嘴50形成。在一實施例中,霧化流體52、液體F2 及氣體F3 不通過通路12之入口20流入。霧化流體52在光學窗32之內表面34處排出。噴嘴50在衝擊光學窗32之內表面34之方向上排出霧化流體52。在一實施例中,霧化流體52之方向可被稱為排出方向D2 。在一實施例中,排出方向D2 與光學窗32之內表面34相交。在一實施例中,排出方向D2 垂直於光學窗32之內表面34。The pipe 70 and the pipe 80 supply the liquid F 2 and the gas F 3 to the nozzle 50. The nozzle 50 discharges the atomized fluid 52 of the liquid F 2 and the gas F 3 into the passage 12. The atomized fluid 52 is discharged through the opening 18 in the second side wall 16 of the passage 12. In one embodiment, the second side wall 16 is opposite to the first side wall 14. In an embodiment, the second side wall 16 is formed by the nozzle 50. In one embodiment, the atomizing fluid 52, the liquid F 2 and the gas F 3 do not flow in through the inlet 20 of the passage 12. The atomized fluid 52 is discharged at the inner surface 34 of the optical window 32. The nozzle 50 discharges the atomized fluid 52 in a direction impacting the inner surface 34 of the optical window 32. In an embodiment, the direction of the atomized fluid 52 may be referred to as the discharge direction D 2 . In one embodiment, the discharge direction D 2 intersects the inner surface 34 of the optical window 32. In one embodiment, the discharge direction D 2 is perpendicular to the inner surface 34 of the optical window 32.

類似地如上文所論述,當製程流體F1 沿著光學窗32之內表面34流動並收縮時,材料在光學窗32之內表面34上堆積。在一實施例中,製程流體F1 中之固體磨粒顆粒黏附並堆積在光學窗32之內表面34上。Similarly as discussed above, when the process fluid F 1 flows and shrinks along the inner surface 34 of the optical window 32, the material accumulates on the inner surface 34 of the optical window 32. In one embodiment , the solid abrasive particles in the process fluid F 1 adhere and accumulate on the inner surface 34 of the optical window 32.

噴嘴50經組態以在光學窗32處高速排出霧化流體52。下文將更詳細地論述噴嘴50之組態及操作。霧化流體52中之液體F2 液滴高速衝擊光學窗32之內表面34。在一實施例中,每一高速衝擊產生自衝擊點沿著內表面34向外傳播之液體衝擊波。液體衝擊波施加剪切力,該剪切力除去在內表面上堆積之材料。在一實施例中,液滴在光學窗32上之高速衝擊在衝擊點處引起空化。空化亦用於去除黏附在光學窗32之內表面34上之任何材料。在一實施例中,霧化流體52可去除黏附在光學窗32之內表面34上之大部分至幾乎全部材料。在一實施例中,為液體F2 選擇之液體可建立有利的ζ電位(例如,排斥對吸引),該ζ電位可例如防止碎屑及顆粒重新附著至光學窗32之內表面34上。The nozzle 50 is configured to discharge the atomized fluid 52 at the optical window 32 at a high speed. The configuration and operation of the nozzle 50 will be discussed in more detail below. The liquid F 2 droplets in the atomized fluid 52 impact the inner surface 34 of the optical window 32 at a high speed. In one embodiment, each high-speed impact generates a liquid shock wave that propagates outward along the inner surface 34 from the impact point. The liquid shock wave exerts a shearing force, which removes the accumulated material on the inner surface. In one embodiment, the high-speed impact of the droplet on the optical window 32 causes cavitation at the point of impact. Cavitation is also used to remove any material adhering to the inner surface 34 of the optical window 32. In one embodiment, the atomized fluid 52 can remove most to almost all materials adhered to the inner surface 34 of the optical window 32. In one embodiment, the liquid selected for the liquid F 2 can establish a favorable zeta potential (eg, repulsion versus attraction), which can prevent debris and particles from reattaching to the inner surface 34 of the optical window 32, for example.

在一實施例中,排出方向可不同於垂直於內表面34。在一實施例中,噴嘴50可經組態以在排出方向D4 上排出霧化流體52,該排出方向D4 在方向D3 之45度之內,該方向D3 垂直於光學窗32之內表面34。例如,噴嘴50可經組態以排出霧化流體52,使得排出方向D4 與垂直於內表面34之方向D3 之間的角度α小於45度。應瞭解,一般技術者在瞭解本發明內容之情況下將理解,可選擇排出方向D4 以實現期望的清潔效果。In an embodiment, the discharge direction may be different from perpendicular to the inner surface 34. In one embodiment, the nozzle 50 may be configured to D 4 in the discharge direction 52 on the atomizing fluid is discharged, the discharge direction D 4 D 3 within 45 degrees of a direction, perpendicular to the direction D 3 of the optical window 32内surface34. For example, the nozzle 50 may be configured to discharge the atomized fluid 52 such that the angle α between the discharge direction D 4 and the direction D 3 perpendicular to the inner surface 34 is less than 45 degrees. It should be understood that those skilled in the art will understand that with knowledge of the content of the present invention, the discharge direction D 4 may be selected to achieve the desired cleaning effect.

在圖2中,噴嘴50及通路12係分開的部件,且噴嘴50與螺紋24連接。然而,應瞭解,在一實施例中之噴嘴50可以不同的方式連接,例如但不限於夾緊、焊接、機械加工在一起、其適當組合等。在一實施例中,通路12及噴嘴50可係單一連續組件。In FIG. 2, the nozzle 50 and the passage 12 are separate components, and the nozzle 50 is connected to the thread 24. However, it should be understood that the nozzle 50 in an embodiment can be connected in different ways, such as but not limited to clamping, welding, machining together, appropriate combinations thereof, and the like. In one embodiment, the passage 12 and the nozzle 50 may be a single continuous component.

圖3係噴嘴50及導管70、導管80之放大視圖。如上文所描述,導管70、導管80分別向噴嘴50供應液體F2 及氣體F3 。在一實施例中,噴嘴50包括用於由液體F2 及氣體F3 形成霧化流體52之腔室59。FIG. 3 is an enlarged view of the nozzle 50, the duct 70, and the duct 80. FIG. As described above, the pipe 70 and the pipe 80 respectively supply the liquid F 2 and the gas F 3 to the nozzle 50. In one embodiment, the nozzle 50 includes a chamber 59 for forming an atomized fluid 52 from the liquid F 2 and the gas F 3.

噴嘴50包括內通道54及用於液體F2 之第一入口58A。第二導管70連接至第一入口58A並將液體F2 供應至噴嘴50之第一入口58A。第一入口58A以流體方式連接至內通道54。液體F2 經由第一入口58A自第二導管70流至內通道54。液體F2 流經內通道54並進入腔室59。The nozzle 50 includes an inner channel 54 and a first inlet 58A for the liquid F 2. The second conduit 70 is connected to the first inlet 58A and supplies the liquid F 2 to the first inlet 58A of the nozzle 50. The first inlet 58A is fluidly connected to the inner passage 54. The liquid F 2 flows from the second duct 70 to the inner passage 54 via the first inlet 58A. The liquid F 2 flows through the inner channel 54 and enters the chamber 59.

噴嘴50包括外通道56及用於氣體F3 之第二入口58B。第二導管80連接至第二入口58B並將氣體F3 供應至噴嘴50之第二入口58B。第二入口58B以流體方式連接至外通道56。氣體F3 經由第二入口58B自導管80流至外通道56。氣體F3 流經外通道56並進入腔室59。It includes an outer nozzle 50 and the passage 56 for the gas inlet 58B F 3 of a second. The second duct 80 is connected to the second inlet 58B and supplies the gas F 3 to the second inlet 58B of the nozzle 50. The second inlet 58B is fluidly connected to the outer passage 56. The gas F 3 flows from the duct 80 to the outer passage 56 via the second inlet 58B. The gas F 3 flows through the outer passage 56 and enters the chamber 59.

外通道56環繞內通道54。內通道54具有位於腔室59處之端部55。端部55與第一入口58A相對。在一實施例中,外通道56與內通道54之端55處之第一通道56同心。液體F2 自內通道54流入腔室59,而氣體F3 自外通道56流入腔室59。The outer channel 56 surrounds the inner channel 54. The inner passage 54 has an end 55 located at the cavity 59. The end 55 is opposite to the first inlet 58A. In one embodiment, the outer channel 56 is concentric with the first channel 56 at the end 55 of the inner channel 54. The liquid F 2 flows into the chamber 59 from the inner channel 54, and the gas F 3 flows into the chamber 59 from the outer channel 56.

氣體F3 流出外通道56並與腔室59中之液體F2 混合。在混合至液體F2 中時,氣體F3 將液體F2 分散成液滴並加速液體F2 液滴。在一實施例中,流出外通道56之氣體F3 具有比流出內通道54之液體F2 更大的速度。霧化流體52然後自腔室59在排出方向D2 上通過噴嘴50之開口18導出。在一實施例中,排出方向D2 係霧化流體52在開口18處之平均速度之方向。The gas F 3 flows out of the outer channel 56 and mixes with the liquid F 2 in the chamber 59. When mixed into the liquid F 2, F 3 gas dispersion liquid into droplets F 2 and F 2 accelerate liquid droplets. In one embodiment, the gas F 3 flowing out of the outer channel 56 has a greater velocity than the liquid F 2 flowing out of the inner channel 54. The atomized fluid 52 is then discharged from the chamber 59 through the opening 18 of the nozzle 50 in the discharge direction D 2. In one embodiment, the discharge direction D 2 is the direction of the average velocity of the atomized fluid 52 at the opening 18.

在一實施例中,供應至噴嘴50之所有液體F2 及氣體F3 被排出。霧化流體52清潔光學窗32。藉由控制供應至噴嘴50之液體F2 及氣體F3 之流率f 2 、流率f 3 來操作噴嘴50。在一實施例中,如上文所論述,流量閥74、流量閥84 (圖1中展示)控制流向噴嘴50之液體F2 及氣體F3 之流率f 2 、流率f 3 。在一實施例中,流量閥74、流量閥84關閉以停止噴嘴50對光學窗32之清潔。在一實施例中,藉由打開閥74、閥84兩者開始清潔光學窗32。在一實施例中,控制器90經組態以僅在用於製程流體F1 之閥64關閉時才開始清潔。In one embodiment, all the liquid F 2 and gas F 3 supplied to the nozzle 50 are discharged. The atomized fluid 52 cleans the optical window 32. The nozzle 50 is operated by controlling the flow rate f 2 and the flow rate f 3 of the liquid F 2 and the gas F 3 supplied to the nozzle 50. In one embodiment, as discussed above, the flow valve 74 and the flow valve 84 (shown in FIG. 1) control the flow rate f 2 and the flow rate f 3 of the liquid F 2 and the gas F 3 flowing to the nozzle 50. In one embodiment, the flow valve 74 and the flow valve 84 are closed to stop the cleaning of the optical window 32 by the nozzle 50. In one embodiment, the optical window 32 is cleaned by opening both the valve 74 and the valve 84. In one embodiment, the controller 90 is configured to only start cleaning when the valve 64 for the process fluid F 1 is closed.

當需要清潔光學窗32時,打開流量閥74、流量閥84,使得液體F2 及氣體F3 到達噴嘴50。噴嘴50然後在光學窗32之內表面34處排出霧化流體52,該霧化流體清潔光學窗32之內表面34。在一實施例中,霧化流體52含有按體積計20%或約20%或小於20%之液體F2 。在一實施例中,霧化流體52含有按體積計為0.65%或約0.65%或小於0.65%之液體F2 。在一實施例中,霧化流體52含有按體積計為0.02%或約0.02%或大於0.02%之液體F2 。在一實施例中,霧化流體52含有按體積計為0.15%或約0.15%或大於0.15%之液體F2 。在一實施例中,霧化流體52含有按體積計為約0.02%至20%之液體F2When the optical window 32 needs to be cleaned, the flow valve 74 and the flow valve 84 are opened so that the liquid F 2 and the gas F 3 reach the nozzle 50. The nozzle 50 then discharges the atomized fluid 52 at the inner surface 34 of the optical window 32, which cleans the inner surface 34 of the optical window 32. In one embodiment, the atomized fluid 52 contains 20% or about 20% or less than 20% of liquid F 2 by volume. In one embodiment, the atomized fluid 52 contains 0.65% or about 0.65% or less than 0.65% of liquid F 2 by volume. In one embodiment, the atomized fluid 52 contains 0.02% or about 0.02% or more than 0.02% of liquid F 2 by volume. In one embodiment, the atomized fluid 52 contains 0.15% or about 0.15% or more than 0.15% of liquid F 2 by volume. In one embodiment, the atomized fluid 52 contains about 0.02% to 20% liquid F 2 by volume.

在一實施例中,當清潔光學窗32時,第二導管70將約0.5公升至2公升每分鐘(LPM)之液體F2 供應至噴嘴50。在一實施例中,當清潔光學窗32時,第三導管80將大約每分鐘10標準公升至300標準公升(SLPM)之氣體F3 供應至噴嘴50。在一實施例中,液體F2 之流率f 2 對氣體F3 之流率f 3 的比率(f 2 :f 3 )係約0.05:300至約2:10。在一實施例中,控制器90可經組態以調節流量閥74、流量閥84,使得液體F2 及氣體F3 之上述流率f 2 、流率f 3 被供應至噴嘴50。在一實施例中,控制器90可經組態以在製程流體F1 通過通路12流入時關閉流量閥74、流量閥84。In one embodiment, when the optical window 32 is cleaned, the second duct 70 supplies about 0.5 liters to 2 liters per minute (LPM) of liquid F 2 to the nozzle 50. In one embodiment, when the optical window 32 is cleaned, the third duct 80 supplies approximately 10 standard liters to 300 standard liters per minute (SLPM) of gas F 3 to the nozzle 50. In one embodiment, the liquid fraction f ilk 2 F 2 F 3 ilk gas rate ratio f 3 (f 2: f 3) based from about 0.05: 300 to about 2:10. In one embodiment, the controller 90 may be configured to regulate the flow valve 74, flow valve 84, so that the flow rate of liquid F 2 and F 3 of F 2 gas, the flow rate f 3 is supplied to the nozzle 50. In an embodiment, the controller 90 may be configured to close the flow valve 74 and the flow valve 84 when the process fluid F 1 flows in through the passage 12.

圖4係清潔感測器總成中之光學窗之方法100之實施例的方塊圖。例如,方法100可用於清潔圖1至圖3中之感測器總成10中之光學窗32。在一實施例中,光學窗32可係感測器系統(例如,感測器系統1)之一部分。該方法開始於110。FIG. 4 is a block diagram of an embodiment of a method 100 for cleaning an optical window in a sensor assembly. For example, the method 100 can be used to clean the optical window 32 in the sensor assembly 10 in FIGS. 1 to 3. In an embodiment, the optical window 32 may be a part of a sensor system (for example, the sensor system 1). The method starts at 110.

在110,將製程流體流(例如製程流體F1 )供應至感測器總成(例如感測器總成10)之通路(例如通路12)。感測器總成包括通路、光學窗(例如光學窗32)及光學感測器(例如光學感測器38)。光學感測器經組態以通過光學窗向通路傳輸光以偵測流體之光學性質。製程流體在流經通路時接觸光學窗。然後,方法100進行至120。At 110, a process fluid stream (e.g., process fluid F 1 ) is supplied to a passage (e.g., passage 12) of a sensor assembly (e.g., sensor assembly 10). The sensor assembly includes a passage, an optical window (for example, the optical window 32), and an optical sensor (for example, the optical sensor 38). The optical sensor is configured to transmit light to the channel through the optical window to detect the optical properties of the fluid. The process fluid contacts the optical window as it flows through the via. Then, the method 100 proceeds to 120.

在120,停止至通路之製程流體流。在一實施例中,流量閥(例如流量閥64)控制製程流體流。在一實施例中,停止製程流體流(120)可包括關閉流量閥。然後,方法100進行至130。At 120, the process fluid flow to the channel is stopped. In one embodiment, a flow valve (e.g., flow valve 64) controls the process fluid flow. In one embodiment, stopping the process fluid flow (120) may include closing a flow valve. Then, the method 100 proceeds to 130.

在130,形成含有氣體(例如氣體F3 )及液體(例如液體F2 )之霧化流體(例如霧化流體52)。在一實施例中,形成霧化流體(130)包括將液體流供應至噴嘴(132) (例如,噴嘴50)。在一實施例中,液體藉由導管(例如,導管70)供應至噴嘴。導管可將液體供應至噴嘴之入口(例如,第一入口58A)。在一實施例中,形成霧化流體(130)包括將氣體流供應至噴嘴134。在一實施例中,氣體藉由第二導管(例如,導管80)供應至噴嘴。導管可將氣體供應至第二入口(例如,第二入口58B)。At 130, an atomized fluid (eg, atomized fluid 52) containing gas (eg, gas F 3 ) and liquid (eg, liquid F 2) is formed. In one embodiment, forming the atomized fluid (130) includes supplying a liquid stream to a nozzle (132) (e.g., nozzle 50). In one embodiment, the liquid is supplied to the nozzle through a conduit (for example, conduit 70). The conduit may supply liquid to the inlet of the nozzle (for example, the first inlet 58A). In one embodiment, forming the atomized fluid (130) includes supplying a gas stream to the nozzle 134. In one embodiment, the gas is supplied to the nozzle through a second conduit (for example, conduit 80). The conduit may supply gas to the second inlet (for example, the second inlet 58B).

在一實施例中,形成霧化流體130亦包括在噴嘴中組合液體流及氣體流(136)。組合液體流及氣體流以形成霧化流體。在一實施例中,噴嘴包括腔室(例如腔室59)。液體流及流動氣體流各自流入腔室並在腔室中組合。然後,方法100自130進行至140。In one embodiment, forming the atomized fluid 130 also includes combining the liquid flow and the gas flow in the nozzle (136). The liquid stream and the gas stream are combined to form an atomized fluid. In one embodiment, the nozzle includes a chamber (e.g., chamber 59). The liquid flow and the flowing gas flow each flow into the chamber and are combined in the chamber. Then, the method 100 proceeds from 130 to 140.

在140,藉由噴嘴將霧化流體排出至通路中。霧化流體在與光學窗32之內表面34相交之排出方向(例如,排出方向D2 )上排出。霧化流體中之液滴經組態以高速衝擊內表面34。黏附在光學窗32之內表面34上之材料藉由液滴之高速衝擊而被去除。At 140, the atomized fluid is discharged into the passage through the nozzle. The atomized fluid is discharged in the discharge direction (for example, the discharge direction D 2 ) intersecting with the inner surface 34 of the optical window 32. The droplets in the atomized fluid are configured to impact the inner surface 34 at a high speed. The material adhering to the inner surface 34 of the optical window 32 is removed by the high-speed impact of the droplets.

在一實施例中,方法100可基於如圖1所展示或如上文所描述之感測器系統1,或如圖1至圖3所展示或如上文所描述之感測器總成1而修改。例如,方法100可包括用閥停止液體之供應。態樣: In an embodiment, the method 100 may be modified based on the sensor system 1 as shown in FIG. 1 or as described above, or the sensor assembly 1 as shown in FIGS. 1 to 3 or as described above . For example, the method 100 may include stopping the supply of liquid with a valve. Appearance:

態樣1至7中任一項可與態樣8至19中任一項組合,態樣8至15中任一項可與態樣16至19中任一項組合。Any one of aspects 1 to 7 can be combined with any one of aspects 8-19, and any one of aspects 8-15 can be combined with any one of aspects 16-19.

態樣1.一種感測器總成,其包含:用於製程流體流經感測器總成之通路;光學窗,其包括形成通路之側壁之第一部分之內表面;光學感測器,其經組態以通過光學窗向通路傳輸光以偵測製程流體之光學性質;及噴嘴,其用於在衝擊光學窗之內表面之方向上將霧化流體形式之液體及氣體排出至通路中。Aspect 1. A sensor assembly comprising: a passage for a process fluid to flow through the sensor assembly; an optical window including an inner surface of a first part of a side wall forming the passage; an optical sensor, which It is configured to transmit light to the channel through the optical window to detect the optical properties of the process fluid; and a nozzle, which is used to discharge liquid and gas in the form of atomized fluid into the channel in the direction of impacting the inner surface of the optical window.

態樣2.如態樣1之感測器總成,其中霧化流體通過通路之側壁之第二部分中之開口排出至通路中。Aspect 2. The sensor assembly of aspect 1, wherein the atomized fluid is discharged into the channel through the opening in the second part of the side wall of the channel.

態樣3.如態樣2之感測器總成,其中該側壁之第一部分及該側壁之第二部分配置在通路中之相對側上。Aspect 3. The sensor assembly of aspect 2, wherein the first part of the side wall and the second part of the side wall are arranged on opposite sides in the passage.

態樣4.如態樣1至3中任一項之感測器總成,其中排出方向與垂直於光學窗之內表面之方向之間的角度小於45度。Aspect 4. The sensor assembly of any one of aspects 1 to 3, wherein the angle between the discharge direction and the direction perpendicular to the inner surface of the optical window is less than 45 degrees.

態樣5.如態樣1至4中任一項之感測器總成,其中噴嘴包括用於氣體之外通道及用於液體之內通道,外通道環繞內通道,噴嘴藉由將氣體與液體組合而形成霧化流體。Aspect 5. The sensor assembly of any one of aspects 1 to 4, wherein the nozzle includes an outer channel for gas and an inner channel for liquid, the outer channel surrounds the inner channel, and the nozzle combines the gas with The liquids combine to form an atomized fluid.

態樣6.如態樣1至5中任一項之感測器總成,其中霧化流體含有按體積計為約0.05至20%之液體。Aspect 6. The sensor assembly of any one of aspects 1 to 5, wherein the atomized fluid contains about 0.05 to 20% liquid by volume.

態樣7.如態樣1至6中任一項之感測器總成,其中液體係去離子水且氣體係惰性氣體。Aspect 7. The sensor assembly of any one of aspects 1 to 6, wherein the liquid system is deionized water and the gas system is an inert gas.

態樣8.一種感測器系統,其包含:用於製程流體之感測器總成,該感測器總成包括:用於製程流體流經感測器總成之通路;具有形成通路之側壁之內表面之光學窗;經組態以通過光學窗向通路傳輸光以偵測製程流體之光學性質之光學感測器,用於形成含有液體及氣體之霧化流體之噴嘴,該噴嘴經組態以在衝擊光學窗之內表面之方向上將霧化流體排出至通路中;以流體方式連接至噴嘴以將液體供應至噴嘴之第一導管;及以流體方式連接至噴嘴以將氣體供應至噴嘴之第二導管。Aspect 8. A sensor system, comprising: a sensor assembly for a process fluid, the sensor assembly including: a passage for the process fluid to flow through the sensor assembly; An optical window on the inner surface of the side wall; an optical sensor configured to transmit light to the passage through the optical window to detect the optical properties of the process fluid, used to form a nozzle containing liquid and gas atomized fluid, the nozzle passes Configured to discharge the atomized fluid into the passage in the direction of impacting the inner surface of the optical window; fluidly connect to the nozzle to supply liquid to the first conduit of the nozzle; and fluidly connect to the nozzle to supply gas The second conduit to the nozzle.

態樣9.如態樣8之感測器系統,其中製程流體接觸光學窗之內表面。Aspect 9. The sensor system of aspect 8, wherein the process fluid contacts the inner surface of the optical window.

態樣10.如態樣8或9中之一項之感測器系統,其中霧化流體通過通路之側壁中之開口排出至通路中。Aspect 10. The sensor system of one of aspects 8 or 9, wherein the atomized fluid is discharged into the channel through an opening in the side wall of the channel.

態樣11.如態樣10之感測器系統,其中通路之側壁中之開口及光學窗配置在通路之相對側上。Aspect 11. The sensor system of aspect 10, wherein the opening in the side wall of the passage and the optical window are arranged on the opposite side of the passage.

態樣12.如態樣8至11中任一項之感測器系統,其中噴嘴包括外通道及內通道,該外通道環繞該內通道,第一導管將該液體供應至噴嘴之該內通道且第二導管將氣體供應至噴嘴之外通道。Aspect 12. The sensor system of any one of aspects 8 to 11, wherein the nozzle includes an outer channel and an inner channel, the outer channel surrounds the inner channel, and the first conduit supplies the liquid to the inner channel of the nozzle And the second conduit supplies gas to the channel outside the nozzle.

態樣13.如態樣8至12中任一項之感測器系統,其中第一導管將液體之流率供應至噴嘴且第二導管將氣體之流率供應至噴嘴,使得霧化流體含有按體積計為約0.02%至20%之液體。Aspect 13. The sensor system of any one of aspects 8 to 12, wherein the first conduit supplies the flow rate of the liquid to the nozzle and the second conduit supplies the flow rate of the gas to the nozzle, so that the atomized fluid contains It is about 0.02% to 20% liquid by volume.

態樣14.如態樣8至13中任一項之感測器系統,其中第一導管將液體之流率供應至噴嘴且第二導管將氣體之流率供應至噴嘴,液體之流率對氣體之體積的比率係自0.05:300至2:10。Aspect 14. The sensor system of any one of aspects 8 to 13, wherein the first conduit supplies the flow rate of the liquid to the nozzle and the second conduit supplies the flow rate of the gas to the nozzle, and the flow rate of the liquid is The ratio of the volume of the gas is from 0.05:300 to 2:10.

態樣15.如態樣8至14中任一項之感測器系統,其進一步包含:第一流量閥,其控制液體通過第一導管流向噴嘴之流量;第二流量閥,其控制氣體通過第二導管流向噴嘴之流量;及控制器,其經組態以在製程流體流入通路時關閉第一流量閥及第二流量閥。Aspect 15. The sensor system of any one of aspects 8 to 14, further comprising: a first flow valve, which controls the flow of liquid to the nozzle through the first conduit; and a second flow valve, which controls the flow of gas through The flow rate of the second conduit to the nozzle; and a controller configured to close the first flow valve and the second flow valve when the process fluid flows into the passage.

態樣16.一種清潔感測器總成中之光學窗之方法,感測器總成包括通路及光學感測器,該光學感測器經由光學窗向通路傳輸光以偵測流經通路之製程流體之光學性質,該方法包含:形成含有氣體及液體之霧化流體;及在衝擊光學窗之內表面之方向上將霧化流體排出至通路中。Aspect 16. A method of cleaning an optical window in a sensor assembly, the sensor assembly includes a channel and an optical sensor, the optical sensor transmits light to the channel through the optical window to detect the flow through the channel For the optical properties of the process fluid, the method includes: forming an atomized fluid containing gas and liquid; and discharging the atomized fluid into the passage in the direction of impacting the inner surface of the optical window.

態樣17.如態樣16之方法,其中形成霧化流體包括:將液體流供應至噴嘴,將氣體流供應至噴嘴,在噴嘴中混合液體流及氣體流。Aspect 17. The method of aspect 16, wherein forming the atomized fluid includes: supplying a liquid stream to the nozzle, supplying a gas stream to the nozzle, and mixing the liquid stream and the gas stream in the nozzle.

態樣18.如態樣16或17中之一項之方法,其中在衝擊光學窗之內表面之方向上將霧化流體排出至通路中包括在該方向上引導霧化流體通過通路之側壁中之開口。Aspect 18. The method of one of aspects 16 or 17, wherein expelling the atomized fluid into the passage in a direction impacting the inner surface of the optical window includes guiding the atomized fluid through the side wall of the passage in the direction The opening.

態樣19.如態樣16至18中任一項之方法,其進一步包含:將製程流體流供應至通路;及在將霧化流體排出至通路中之前停止將製程流體流入通路中。Aspect 19. The method of any one of aspects 16 to 18, further comprising: supplying the process fluid stream to the channel; and stopping the flow of the process fluid into the channel before discharging the atomized fluid into the channel.

已經如此描述了本發明之幾個說明性實施例,熟習此項技術者將容易理解,在所附申請專利範圍之範疇內可製造及使用其他實施例。在前面的描述中已經闡述了本文件所涵蓋之揭示內容之許多優點。然而,應理解,本發明在許多方面僅僅係說明性的。可在細節上,特別係在組件之形狀、尺寸及配置方面進行改變,而不超出本發明之範疇。當然,本發明之範疇由所附申請專利範圍表達之語言限定。Having described several illustrative embodiments of the present invention in this way, those skilled in the art will easily understand that other embodiments can be manufactured and used within the scope of the attached patent application. In the foregoing description, many advantages of the disclosure covered by this document have been explained. However, it should be understood that the present invention is merely illustrative in many respects. The details can be changed, especially the shape, size and configuration of the components, without going beyond the scope of the present invention. Of course, the scope of the present invention is limited by the language expressed in the scope of the attached patent application.

1:感測器系統 10:感測器總成 12:通路 14:第一側壁 16:第二側壁 18:開口 20:入口 22:出口 24:螺紋 32:光學窗 34:內表面 36:外表面 38:光學感測器 50:噴嘴 52:霧化流體 54:內通道 55:端部 56:外通道 58A:第一入口 58B:第二入口 59:腔室 60:第一導管 62:製程流體源 64:流量閥 70:第二導管 72:液體源 74:流量閥 76:流量感測器 80:第三導管 82:氣體源 84:流量閥 86:流量感測器 90:控制器 100:方法 110:步驟 120:步驟 130:步驟 132:步驟 134:步驟 136:步驟 140:步驟 D1 :方向 D2 :排出方向 D3 :方向 D4 :排出方向 F1 :製程流體 F2 :液體 F3 :氣體 ƒ2 :流率 ƒ3 :流率 α:角度1: Sensor system 10: Sensor assembly 12: Passage 14: First side wall 16: Second side wall 18: Opening 20: Inlet 22: Outlet 24: Thread 32: Optical window 34: Inner surface 36: Outer surface 38: optical sensor 50: nozzle 52: atomizing fluid 54: inner channel 55: end 56: outer channel 58A: first inlet 58B: second inlet 59: chamber 60: first conduit 62: process fluid source 64: Flow valve 70: Second conduit 72: Liquid source 74: Flow valve 76: Flow sensor 80: Third conduit 82: Gas source 84: Flow valve 86: Flow sensor 90: Controller 100: Method 110 : Step 120: Step 130: Step 132: Step 134: Step 136: Step 140: Step D 1 : Direction D 2 : Discharge Direction D 3 : Direction D 4 : Discharge Direction F 1 : Process Fluid F 2 : Liquid F 3 : Gas ƒ 2 : Flow rate ƒ 3 : Flow rate α: Angle

藉由以下圖式將更好地理解感測器系統、感測器總成及清潔感測器總成中之光學窗之方法之所描述及其他特徵、態樣及優點:The description and other features, aspects and advantages of the sensor system, the sensor assembly, and the method of cleaning the optical window in the sensor assembly will be better understood with the following diagrams:

圖1係感測器系統之實施例的示意圖。Figure 1 is a schematic diagram of an embodiment of the sensor system.

圖2係根據本發明之實施例的圖1中之感測器總成的截面圖。FIG. 2 is a cross-sectional view of the sensor assembly in FIG. 1 according to an embodiment of the present invention.

圖3係根據本發明之實施例的圖2中之噴嘴的放大截面圖。Fig. 3 is an enlarged cross-sectional view of the nozzle in Fig. 2 according to an embodiment of the present invention.

圖4係清潔感測器總成中之光學窗之方法之實施例的方塊圖。FIG. 4 is a block diagram of an embodiment of a method of cleaning the optical window in the sensor assembly.

雖然本發明可具有各種修改及替換形式,但其細節已經藉由圖式中之實例展示且將被詳細描述。然而,應理解,其意圖並不在於將本發明之態樣限定於所描述之特定說明性實施例。相反,其意圖係涵蓋落入本發明之精神及範疇內之所有修改、等同物及替換。Although the present invention can have various modifications and alternative forms, its details have been shown by examples in the drawings and will be described in detail. However, it should be understood that the intention is not to limit the aspects of the invention to the specific illustrative embodiments described. On the contrary, the intention is to cover all modifications, equivalents, and replacements falling within the spirit and scope of the present invention.

10:感測器總成 10: Sensor assembly

12:通路 12: Access

14:第一側壁 14: The first side wall

16:第二側壁 16: second side wall

18:開口 18: opening

20:入口 20: entrance

22:出口 22: Exit

24:螺紋 24: Thread

32:光學窗 32: Optical window

34:內表面 34: inner surface

36:外表面 36: Outer surface

38:光學感測器 38: optical sensor

50:噴嘴 50: nozzle

52:霧化流體 52: Atomized fluid

70:第二導管 70: second catheter

80:第三導管 80: third duct

D1:方向 D 1 : direction

D2:排出方向 D 2 : Discharge direction

D3:方向 D 3 : direction

D4:排出方向 D 4 : Discharge direction

F1:製程流體 F 1 : Process fluid

F2:液體 F 2 : Liquid

F3:氣體 F 3 : Gas

α:角度 α: Angle

Claims (10)

一種感測器總成,其包含: 一通路,該通路用於一製程流體流經該感測器總成; 一光學窗,該光學窗包括形成該通路之一側壁之一第一部分之一內表面; 一光學感測器,該光學感測器經組態以通過該光學窗向該通路傳輸光以偵測該製程流體之一光學性質;及 一噴嘴,該噴嘴用於在衝擊該光學窗之該內表面之一方向上將一霧化流體形式之一液體及一氣體排出至該通路中。A sensor assembly, which includes: A passage for a process fluid to flow through the sensor assembly; An optical window including an inner surface forming a first part of a side wall of the passage; An optical sensor configured to transmit light to the passage through the optical window to detect an optical property of the process fluid; and A nozzle for discharging a liquid and a gas in the form of an atomized fluid into the passage in a direction that impacts the inner surface of the optical window. 如請求項1之感測器總成,其中該霧化流體通過該通路之該側壁之一第二部分中之一開口排出至該通路中。The sensor assembly of claim 1, wherein the atomized fluid is discharged into the passage through an opening in a second part of the side wall of the passage. 如請求項1之感測器總成,其中該排出方向與垂直於該光學窗之該內表面之一方向之間的一角度小於45度。The sensor assembly of claim 1, wherein an angle between the ejection direction and a direction perpendicular to the inner surface of the optical window is less than 45 degrees. 如請求項1之感測器總成,其中該噴嘴包括用於該氣體之一外通道及用於該液體之一內通道,該外通道環繞該內通道,該噴嘴藉由將該氣體與該液體組合而形成該霧化流體。The sensor assembly of claim 1, wherein the nozzle includes an outer channel for the gas and an inner channel for the liquid, the outer channel surrounds the inner channel, and the nozzle uses the gas and the The liquids combine to form the atomized fluid. 一種感測器系統,其包含: 用於一製程流體之一感測器總成,該感測器總成包括: 一通路,該通路用於該製程流體流經該感測器總成; 一光學窗,該光學窗具有形成該通路之一側壁之一內表面; 一光學感測器,該光學感測器經組態以通過該光學窗向該通路傳輸光以偵測該製程流體之一光學性質,及 一噴嘴,該噴嘴用於形成含有一液體及一氣體之一霧化流體,該噴嘴經組態以在衝擊該光學窗之該內表面之一方向上將該霧化流體排出至該通路中; 一第一導管,該第一導管以流體方式連接至該噴嘴以將該液體供應至該噴嘴;及 一第二導管,該第二導管以流體方式連接至該噴嘴以將該氣體供應至該噴嘴。A sensor system, which includes: A sensor assembly for a process fluid, the sensor assembly includes: A passage for the process fluid to flow through the sensor assembly; An optical window having an inner surface forming a side wall of the passage; An optical sensor configured to transmit light to the passage through the optical window to detect an optical property of the process fluid, and A nozzle for forming an atomized fluid containing a liquid and a gas, and the nozzle is configured to discharge the atomized fluid into the passage in a direction that impacts the inner surface of the optical window; A first pipe fluidly connected to the nozzle to supply the liquid to the nozzle; and A second conduit is fluidly connected to the nozzle to supply the gas to the nozzle. 如請求項5之感測器系統,其中該製程流體接觸該光學窗之該內表面。The sensor system of claim 5, wherein the process fluid contacts the inner surface of the optical window. 如請求項5之感測器系統,其中該霧化流體通過該通路之該側壁中之一開口排出至該通路中。The sensor system of claim 5, wherein the atomized fluid is discharged into the passage through an opening in the side wall of the passage. 如請求項5之感測器系統,其中該噴嘴包括一外通道及一內通道,該外通道環繞該內通道,該第一導管將該液體供應至該噴嘴之該內通道且該第二導管將該氣體供應至該噴嘴之該外通道。The sensor system of claim 5, wherein the nozzle includes an outer channel and an inner channel, the outer channel surrounds the inner channel, the first conduit supplies the liquid to the inner channel of the nozzle, and the second conduit The gas is supplied to the outer passage of the nozzle. 如請求項5之感測器系統,其進一步包含: 一第一流量閥,該第一流量閥控制該液體通過該第一導管流向該噴嘴之流量; 一第二流量閥,該第二流量閥控制該氣體通過該第二導管流向該噴嘴之流量;及 控制器,該控制器經組態以在該製程流體流入該通路時關閉該第一流量閥及該第二流量閥。Such as the sensor system of claim 5, which further includes: A first flow valve that controls the flow of the liquid to the nozzle through the first conduit; A second flow valve that controls the flow of the gas to the nozzle through the second conduit; and A controller configured to close the first flow valve and the second flow valve when the process fluid flows into the passage. 一種清潔一感測器總成中之一光學窗之方法,該方法包含: 使一製程流體流經一感測器總成之一通路,該感測器總成包括一光學感測器,該光學感測器經由該光學窗向一通路傳輸光以偵測流經該通路之一製程流體之一光學性質; 形成含有一氣體及一液體之一霧化流體;及 在衝擊該光學窗之一內表面之一方向上將該霧化流體排出至該通路中。A method of cleaning an optical window in a sensor assembly, the method comprising: A process fluid flows through a passage of a sensor assembly. The sensor assembly includes an optical sensor that transmits light to a passage through the optical window to detect the flow through the passage One of the optical properties of the process fluid; Forming an atomized fluid containing a gas and a liquid; and The atomized fluid is discharged into the passage in a direction that impacts an inner surface of the optical window.
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