TW202114964A - Ceramic structure - Google Patents

Ceramic structure Download PDF

Info

Publication number
TW202114964A
TW202114964A TW109132372A TW109132372A TW202114964A TW 202114964 A TW202114964 A TW 202114964A TW 109132372 A TW109132372 A TW 109132372A TW 109132372 A TW109132372 A TW 109132372A TW 202114964 A TW202114964 A TW 202114964A
Authority
TW
Taiwan
Prior art keywords
ceramic structure
region
pores
ratio
less
Prior art date
Application number
TW109132372A
Other languages
Chinese (zh)
Other versions
TWI757877B (en
Inventor
徳留修
森��一
小松原健司
Original Assignee
日商京瓷股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商京瓷股份有限公司 filed Critical 日商京瓷股份有限公司
Publication of TW202114964A publication Critical patent/TW202114964A/en
Application granted granted Critical
Publication of TWI757877B publication Critical patent/TWI757877B/en

Links

Images

Landscapes

  • Compositions Of Oxide Ceramics (AREA)

Abstract

A ceramic structure of the present disclosure contains aluminum oxide as a main component. When the diffraction intensities of the (113) and (116) planes of aluminum oxide obtained by the X-ray diffraction method are set as I (113) and I (116), respectively, and I (113)/I (116) is set as the ratio of diffraction intensities, the ratio Ri, which is the ratio of the diffraction intensities in an internal region deeper than 0.7 mm in the depth direction from the surface, is larger than 1, and the ratio Rs, which is the ratio of the diffraction intensities in a surface layer region of 0.7 mm or less in the depth direction from the surface, is smaller than 1.

Description

陶瓷構造體 Ceramic structure

本揭示係有關一種研削、研磨等加工效率良好的陶瓷構造體。 The present disclosure relates to a ceramic structure with good processing efficiency such as grinding and polishing.

對一般的氧化鋁質燒結體以X射線繞射測定其表層部或內部時,依據ICDD(The International Centre for Diffraction Data,國際繞射數據中心)卡,顯示最大之尖峰強度的面為(104)面或(113)面。再者,依據日本特開2007-254276號公報,已記載以加壓成型法等所製造之氧化鋁質燒結體一般係明顯地出現對(110)面、(104)面、(113)面或(116)面之結晶配向性。 When measuring the surface or inside of a general alumina sintered body by X-ray diffraction, according to the ICDD (The International Centre for Diffraction Data) card, the surface showing the maximum peak intensity is (104) Noodles or (113) noodles. Furthermore, according to Japanese Patent Application Laid-Open No. 2007-254276, it has been described that the alumina sintered body manufactured by the press molding method or the like generally clearly appears opposite to the (110), (104), (113) or (116) The crystal orientation of the plane.

由於習知之氧化鋁質燒結體明顯地顯現結晶配向性,故耐磨耗性高。由如此之氧化鋁質燒結體所構成的陶瓷構造體若為長度方向之長度為2m以上的長條狀,或直徑為1m以上之大型者,則有研削、研磨等加工效率降低之問題。 Since the conventional alumina sintered body clearly exhibits crystal orientation, it has high wear resistance. If a ceramic structure composed of such an alumina sintered body is a long strip with a length of 2 m or more in the longitudinal direction, or a large one with a diameter of 1 m or more, there is a problem that the efficiency of processing such as grinding and polishing is reduced.

本揭示係提供一種陶瓷構造體即使為長條狀或大型者,研削、研磨等加工效率亦良好的陶瓷構造體。 The present disclosure provides a ceramic structure that has good processing efficiency such as grinding and polishing even if the ceramic structure is elongated or large.

本揭示之陶瓷構造體係含有氧化鋁作為主成分,且將使用X射線繞射法所得到之氧化鋁的(113)面及(116)面之繞射強度分別設為I(113)及I(116),並以I(113)/I(116)作為繞射強度之比時,從表面朝深度方向為超過0.7mm之內部區域中的前述繞射強度比亦即比Ri係大於1,從表面朝深度方向為0.7mm以下之表層區域中的前述繞射強度比亦即比Rs係小於1。 The ceramic structure system of the present disclosure contains alumina as the main component, and the diffraction intensities of the (113) plane and (116) plane of the alumina obtained by the X-ray diffraction method are respectively set as I(113) and I( 116), and taking I(113)/I(116) as the ratio of the diffraction intensity, the aforementioned diffraction intensity ratio in the inner region exceeding 0.7mm from the surface to the depth direction, that is, the ratio of the Ri system is greater than 1, from The aforementioned diffraction intensity ratio in the surface layer region whose surface is 0.7 mm or less in the depth direction, that is, the ratio Rs is less than 1.

依據本揭示,可提供一種研削、研磨等加工效率良好的陶瓷構造體。 According to the present disclosure, it is possible to provide a ceramic structure with good processing efficiency such as grinding and polishing.

1,2:表面 1,2: surface

3,4:表層區域 3,4: surface area

5:內部區域 5: Internal area

6,7:氣孔 6, 7: Stoma

10,20:陶瓷構造體 10, 20: Ceramic structure

圖1係表示有關本揭示之一實施型態的陶瓷構造體之立體圖。 Fig. 1 is a perspective view of a ceramic structure related to an embodiment of the present disclosure.

圖2係表示有關本揭示之另一實施型態的陶瓷構造體之立體圖。 Fig. 2 is a perspective view of a ceramic structure according to another embodiment of the present disclosure.

圖3係圖1所示之陶瓷構造體的剖面,圖3(a)係表層區域中之剖面的觀察圖像之一例,圖3(b)係接近表層區域側的內部區域之剖面的觀察圖像之一例,圖3(c)係遠離表層區域側的內部區域之剖面的觀察圖像之一例。 Fig. 3 is a cross-section of the ceramic structure shown in Fig. 1, Fig. 3(a) is an example of an observation image of a cross-section in the surface area, and Fig. 3(b) is an observation view of a cross-section of the inner area near the surface area As an example, FIG. 3(c) is an example of an observation image of a cross-section of the inner region on the side away from the surface region.

以下,參照圖式,詳細說明有關本揭示之陶瓷構造體。圖1係表示有關本揭示之一實施型態的陶瓷構造體之立體圖。圖2係表示有關本揭示之另一實施型態的陶瓷構造體之立體圖。 Hereinafter, referring to the drawings, the ceramic structure of the present disclosure will be described in detail. Fig. 1 is a perspective view of a ceramic structure related to an embodiment of the present disclosure. Fig. 2 is a perspective view of a ceramic structure according to another embodiment of the present disclosure.

圖1所示之陶瓷構造體10為長條狀,例如,長度為2m至4m,寬度為200mm至300mm,高度為20mm至80mm。圖2所示之陶瓷構造體20為大型的圓板狀,例如,直徑為2m至4m,高度為20mm至80mm。陶瓷構造體10、20的任一者皆相對密度為95%以上之緻密質體,且具備從表面1、2朝深度方向為0.7mm以下的表層區域3、4、及從表面朝深度方向為超過0.7mm的內部區域5。 The ceramic structure 10 shown in FIG. 1 has a long strip shape, for example, a length of 2 m to 4 m, a width of 200 mm to 300 mm, and a height of 20 mm to 80 mm. The ceramic structure 20 shown in FIG. 2 has a large circular plate shape, for example, a diameter of 2 m to 4 m, and a height of 20 mm to 80 mm. Each of the ceramic structures 10, 20 is a dense body with a relative density of 95% or more, and has surface areas 3, 4 that are 0.7 mm or less from the surface 1 and 2 toward the depth direction, and the surface area toward the depth direction is Inner area over 0.7mm5.

相對密度係表示為相對於被鑑定之主成分的陶瓷構造體10、20之理論密度,依據JIS R 1634-1998而求得之陶瓷構造體10、20的表觀密度的百分率(比率)。 The relative density is expressed as a percentage (ratio) of the apparent density of the ceramic structures 10, 20 obtained in accordance with JIS R 1634-1998 with respect to the theoretical density of the ceramic structures 10, 20 of the identified main component.

本揭示之陶瓷構造體係以氧化鋁作為主成分,且將使用X射線繞射法所得到之氧化鋁的(113)面及(116)面之繞射強度分別設為I(113)及I(116),並以I(113)/I(116)作為繞射強度之比時,在內部區域之上述繞射強度比亦即比Ri係大於1,在表層區域之上述繞射強度比亦即比Rs係小於1。換言之,將在內部區域之氧化鋁的(113)面及(116)面之繞射強度分別作為Ii(113)及Ii(116)時,比Ri係以Ii(113)/Ii(116)表示。將在表層區域之氧化鋁的(113)面及(116)面之繞射強度分別設為Is(113)及Is(116)時,比Rs係以Is(113)/Is(116)表示。 The ceramic structure system of the present disclosure uses alumina as the main component, and the diffraction intensities of the (113) plane and (116) plane of the alumina obtained by the X-ray diffraction method are respectively set as I(113) and I( 116), and when I(113)/I(116) is used as the ratio of the diffraction intensity, the above-mentioned diffraction intensity ratio in the inner region, that is, the ratio of Ri is greater than 1, and the above-mentioned diffraction intensity ratio in the surface region is that It is less than 1 than the Rs line. In other words, when the diffraction intensities of the (113) plane and (116) plane of the alumina in the inner region are respectively referred to as Ii(113) and Ii(116), the ratio Ri is expressed as Ii(113)/Ii(116) . When the diffraction intensities of the (113) plane and the (116) plane of the alumina in the surface region are set to Is(113) and Is(116), respectively, the ratio Rs is expressed as Is(113)/Is(116).

若繞射強度之比Ri與比Rs設為如此之關係,結晶配向性會從內部區域朝向表層區域變化。因此,相較於內部區域及表層區域皆明顯顯現結晶配向性之情形,有在表層區域之破壞靱性變低,且加工效率變高之傾向。 If the ratio Ri and the ratio Rs of the diffraction intensity are set in such a relationship, the crystal orientation changes from the inner region to the surface region. Therefore, compared with the case where the crystal orientation is clearly displayed in the inner region and the surface region, the damage in the surface region tends to be lower and the processing efficiency to be higher.

比Ri與比Rs之差可為0.4以下。若比Ri與比Rs之差為如此之範圍,在內部區域產生之變形會減少。其結果,在高溫(例如1000℃至1300℃)之機械強度相對於在常溫之機械強度的降低會減少。 The difference between the ratio Ri and the ratio Rs may be 0.4 or less. If the difference between the ratio Ri and the ratio Rs is within such a range, the deformation generated in the inner region will be reduced. As a result, the mechanical strength at high temperature (for example, 1000°C to 1300°C) will decrease in comparison with the mechanical strength at room temperature.

所謂在陶瓷構造體中之主成分係意指構成陶瓷構造體之成分100質量%之中,佔有80質量%以上之成分。關於構成陶瓷構造體之各成分,只要根據由使用CuKα射線之X射線繞射裝置所得到之測定結果進行鑑定後,使用ICP(Inductively Coupled Plasma)發光分光分析裝置或螢光X射線分析裝置(XRF)求出元素之含量,再換算成經鑑定之成分的含量即可。 The so-called main component in the ceramic structure means a component that occupies more than 80% by mass among 100% by mass of the components constituting the ceramic structure. As long as the components constituting the ceramic structure are identified based on the measurement results obtained by the X-ray diffraction device using CuKα rays, use an ICP (Inductively Coupled Plasma) emission spectrometer or a fluorescent X-ray analyzer (XRF). ) Find the content of the element and convert it to the content of the identified component.

氧化鋁之(113)面及(116)面之各別的繞射強度係只要藉由使用CuKα射線之X射線繞射裝置而求得即可。例如,表層區域係使用熱處理過之表面,內部區域係使用以研削裝置切割之剖面即可。例如,表層區域之表面的算術平均粗糙度Ra為0.4μm以上0.6μm以下,內部區域之剖面的算術平均粗糙度Ra為0.2μm以上0.4μm以下,只要依據JIS B 0601:1994而測定即可。更具體而言,只要使用小坂研究所股份有限公司製的表面粗糙度測定機(SURFCORDER、SE500),並將觸針之半徑設為5μm、觸針之輸送速度設為0.5mm/s、測定長度設為4.0mm、截取值λc設為0.8mm即可。 The respective diffraction intensities of the (113) plane and the (116) plane of alumina can be obtained by an X-ray diffraction device using CuKα rays. For example, the surface area is a heat-treated surface, and the internal area is a section cut with a grinding device. For example, the arithmetic average roughness Ra of the surface of the surface region is 0.4 μm or more and 0.6 μm or less, and the arithmetic average roughness Ra of the cross section of the internal region is 0.2 μm or more and 0.4 μm or less, as long as it is measured in accordance with JIS B 0601:1994. More specifically, just use a surface roughness measuring machine (SURFCORDER, SE500) manufactured by Kosaka Research Institute Co., Ltd., set the radius of the stylus to 5μm, the conveying speed of the stylus to 0.5mm/s, and measure the length Just set it to 4.0mm and the cutoff value λc to 0.8mm.

圖3係圖1所示之陶瓷構造體的剖面,圖3(a)係在表層區域之剖面的觀察圖像之一例。圖3(b)係接近表層區域側的內部區域中之剖面的觀察圖像之一例。圖3(c)係遠離表層區域側的內部區域中之剖面的觀察圖像之一例。 Fig. 3 is a cross-section of the ceramic structure shown in Fig. 1, and Fig. 3(a) is an example of an observation image of the cross-section in the surface region. Fig. 3(b) is an example of an observation image of a cross-section in the inner region on the side close to the surface region. Fig. 3(c) is an example of an observation image of a cross section in the inner region on the side away from the surface region.

如圖3(a)所示,在表層區域3係分散地配置有氣孔6。如圖3(b)、(c)所示,在內部區域5係分散地配置有氣孔7。將表層區域3中之氣孔6的面積占有率設為A(%),將內部區域5中之氣孔7的面積占有率設為B(%)時,在圖3(a)所示之例中,面積占有率A為3.12%。接近表層區域3側的內部區域5中之氣孔7的面積占有率B(%)(以下,有將該面積占有率B(%)記載為面積占有率B1(%)之情形)為3.46%。遠離表層區域3側的內部區域5中之氣孔7的面積占有 率B(%)(以下,有將該面積占有率B(%)記載為面積占有率B2(%)之情形)為4.16%。 As shown in FIG. 3(a), pores 6 are dispersedly arranged in the surface region 3 system. As shown in FIGS. 3(b) and (c), the pores 7 are dispersedly arranged in the internal region 5. When the area occupancy rate of the pores 6 in the surface region 3 is set to A (%), and the area occupancy rate of the pores 7 in the inner region 5 is set to B (%), in the example shown in FIG. 3(a) , The area occupancy rate A is 3.12%. The area occupancy rate B (%) of the pores 7 in the inner region 5 near the surface region 3 side (hereinafter, the area occupancy rate B (%) may be described as the area occupancy rate B 1 (%)) is 3.46% . The area occupancy rate B (%) of the pores 7 in the inner region 5 on the side away from the surface region 3 (hereinafter, the area occupancy rate B (%) may be described as the area occupancy rate B 2 (%)) is 4.16% .

在本揭示之陶瓷構造體的剖面之觀察圖像中,比率B/A可為1.5以下。若比率B/A為該範圍,在內部區域5中使強度、剛性等機械特性降低之空隙部分變少。因此,機械特性低之部分變少,具有高的機械特性。尤其,比率B/A以1.4以下為佳。 In the observation image of the cross-section of the ceramic structure of the present disclosure, the ratio B/A may be 1.5 or less. When the ratio B/A is in this range, the internal region 5 reduces the number of voids in which mechanical properties such as strength and rigidity are reduced. Therefore, the parts with low mechanical properties are reduced, and the mechanical properties are high. In particular, the ratio B/A is preferably 1.4 or less.

圖3所示之例中,比率B1/A為1.1,比率B2/A為1.3。陶瓷構造體之剖面係從陶瓷構造體之表層區域朝向內部區域進行研磨所得到之研磨面。圖3(a)係從表面1朝深度方向為0.7mm之位置的研磨面,圖3(b)係從表面1朝深度方向為7.5mm之位置的研磨面,圖3(c)係從表面1朝深度方向為15mm之位置的研磨面。 In the example shown in Fig. 3, the ratio B 1 /A is 1.1, and the ratio B 2 /A is 1.3. The cross section of the ceramic structure is a polished surface obtained by polishing from the surface area of the ceramic structure to the inner area. Figure 3(a) is the polishing surface from the surface 1 to the depth direction of 0.7mm, Figure 3(b) is the polishing surface from the surface 1 to the depth direction of 7.5mm, and Figure 3(c) is from the surface 1 The polished surface at a position of 15 mm in the depth direction.

此等研磨面係使用平均粒徑D50為4μm以上之鑽石研磨粒而以鑄鐵製平盤進行研磨之後,使用平均粒徑D50為2μm以上之鑽石研磨粒以錫平盤分別朝深度方向研磨至0.7mm、7.5mm及15mm為止而得到。此等研磨面的算術平均粗糙度Ra例如為5nm以下。算術平均粗糙度Ra係只要使用3D光學面輪廓儀「NEW VIEW」(註冊商標Zygo Corporation)測定即可。 These polishing surfaces use diamond abrasive grains with an average particle size D 50 of 4 μm or more to grind with a cast iron flat disc, and then use diamond abrasive grains with an average particle size D 50 of 2 μm or more to grind in the depth direction with a tin flat disc. It can be obtained up to 0.7mm, 7.5mm and 15mm. The arithmetic average roughness Ra of these polished surfaces is, for example, 5 nm or less. The arithmetic average roughness Ra system can be measured using a 3D optical surface profiler "NEW VIEW" (registered trademark Zygo Corporation).

陶瓷構造體10、20之表層區域3、4及內部區域5之任一者中,將氣孔6(7)之重心間距離的平均值減去氣孔6(7)之圓等效徑的平均值而得之值可為5μm以上10μm以下。 In any of the surface area 3, 4 and the inner area 5 of the ceramic structure 10, 20, the average value of the distance between the centers of gravity of the pores 6(7) minus the average value of the circle equivalent diameter of the pores 6(7) The value obtained can be 5 μm or more and 10 μm or less.

若將氣孔6(7)之重心間距離的平均值減去氣孔6(7)之圓等效徑的平均值而得之值為5μm以上,則空隙部分不會密集而分散地配置。因此,可發揮更高之機械特性。另一方面,若將氣孔6(7)之重心間距離的平均值減去氣孔 6(7)之圓等效徑的平均值而得之值為10μm以下,則從表面1、2朝深度方向進行研削、研磨等加工時,可獲得良好的加工性。再者,相鄰之氣孔間的間隔變窄,故可抑制微龜裂之延伸。藉由相鄰之氣孔間的間隔變窄,而去除帶電之效果亦變高。 If the average value of the distance between the centers of gravity of the pores 6(7) is subtracted from the average value of the circle-equivalent diameter of the pores 6(7) to obtain a value of 5 μm or more, the voids are not arranged densely and dispersedly. Therefore, higher mechanical properties can be exerted. On the other hand, if the average value of the distance between the centers of gravity of stomata 6(7) is subtracted from the stomata The value of the average value of the circle equivalent diameter of 6(7) is 10 μm or less, and when the surfaces 1 and 2 are processed in the depth direction, such as grinding and polishing, good workability can be obtained. Furthermore, the interval between adjacent pores is narrowed, so the extension of microcracks can be suppressed. As the interval between adjacent pores becomes narrower, the effect of removing electrification becomes higher.

氣孔6(7)之圓等效徑係可依下列之方法求得。首先,使用數位顯微鏡以200倍之倍率觀察上述剖面。然後,例如,只要以CCD照相機拍攝面積為0.11mm2(橫方向之長度為380.71μm、縱方向之長度為285.53μm)之範圍,而求出觀察圖像內之各氣孔6(7)的圓等效徑即可。又,作為顯示圖像之明暗的指標之閾值係只要設定成使圓等效徑0.27μm以下成為測定之對象外即可。以上述之方法求出之氣孔6(7)的圓等效徑例如為1μm以上3μm以下。 The circle equivalent diameter of pore 6(7) can be obtained by the following method. First, use a digital microscope to observe the above section at a magnification of 200 times. Then, for example, as long as the shooting area of the CCD camera is 0.11 mm 2 (the length in the horizontal direction is 380.71 μm, the length in the vertical direction is 285.53 μm), the circle of each pore 6 (7) in the observation image is obtained. The equivalent diameter is sufficient. In addition, the threshold value, which is an indicator of the brightness and darkness of the displayed image, may be set so that the circle equivalent diameter of 0.27 μm or less is not the object of measurement. The circle-equivalent diameter of the pore 6 (7) obtained by the above-mentioned method is, for example, 1 μm or more and 3 μm or less.

氣孔6(7)之重心間距離係可依下列之方法求得。只要以為求得氣孔6(7)之圓等效徑,而拍攝得到之觀察圖像作為對象,使用圖像分析軟體「A像君(ver2.52)」(註冊商標、旭化成Enginerring股份有限公司製,又,以下記載為圖像分析軟體「A像君」時,表示旭化成Enginerring股份有限公司製之圖像分析軟體。)而以所謂分散度量測之重心間距離法的方法求取氣孔6(7)之重心間距離即可。 The distance between the centers of gravity of stomata 6(7) can be obtained by the following method. As long as the circle equivalent diameter of the stomata 6(7) is obtained, and the observation image obtained by shooting is used as the object, use the image analysis software "A Xiangjun (ver2.52)" (registered trademark, manufactured by Asahi Kasei Enginerring Co., Ltd.) , And, when the following description is the image analysis software "A Xiangjun", it means the image analysis software manufactured by Asahi Kasei Enginerring Co., Ltd.) And the method of the distance between the centers of gravity of the so-called dispersion measurement method is used to obtain the stomata 6 ( 7) The distance between the centers of gravity is sufficient.

該方法之設定條件係例如只要將作為顯示圖像亮暗的指標之閾值設為165至176,使亮度設為暗,使小圖形去除面積設為0.057μm2,並使雜訊去除過濾器設為有即可。上述測定時,閾值係設為165至176,但只要依照觀察圖像之明亮度調整閾值即可,使亮度設為暗,並使二進制化之方法設為手動,使小圖形去除面積設為0.057μm2及雜訊去除過濾器設為有之後,只要以觀察圖像 顯現之標記物為與氣孔之形狀一致的方式調整閾值即可。以上述之方法求得之氣孔6(7)的重心間距離係例如為7μm以上14μm以下。 The setting conditions of this method are, for example, as long as the threshold value as an indicator of the brightness and darkness of the displayed image is set to 165 to 176, the brightness is set to dark, the small pattern removal area is set to 0.057μm 2 , and the noise removal filter is set Just as there is. In the above measurement, the threshold is set to 165 to 176, but it is enough to adjust the threshold according to the brightness of the observed image, set the brightness to dark, and set the binarization method to manual, and set the small pattern removal area to 0.057 After setting the μm 2 and noise removal filter to Yes, just adjust the threshold in such a way that the markers appearing in the observation image are consistent with the shape of the pores. The distance between the centers of gravity of the pores 6 (7) obtained by the above method is, for example, 7 μm or more and 14 μm or less.

陶瓷構造體10、20之表層區域3、4及內部區域5之任一者中,在觀察圖像中之氣孔6(7)的圓等效徑之最大值可為10μm以下。若氣孔6(7)之圓等效徑的最大值為10μm以下,即使從表面1、2朝深度方向進行研磨,容易局部地磨耗之部分亦會減少。其結果,可抑制偏磨耗。 In any of the surface area 3, 4 and the inner area 5 of the ceramic structures 10, 20, the maximum value of the circle equivalent diameter of the pore 6 (7) in the observation image may be 10 μm or less. If the maximum value of the circle-equivalent diameter of the pores 6 (7) is 10 μm or less, even if the surfaces 1 and 2 are polished in the depth direction, the parts that are likely to be locally worn will be reduced. As a result, partial wear can be suppressed.

陶瓷構造體10、20之表層區域3、4及內部區域5之任一者中,使觀察圖像中之圓等效徑為5μm以上的氣孔個數設為a(個),將觀察圖像中之圓等效徑未達5μm的氣孔個數設為b(個)時,比率b/a可為50以上。若比率b/a為該範圍,原本在生成過程產生之由氣孔聚集形成之大型的氣孔會幾乎消失,而分散地配置有小氣孔。因此,被放置於重複昇溫及降溫之環境中,即使產生微龜裂,其發伸亦可被氣孔6(7)抑制。 In any of the surface area 3, 4 and the inner area 5 of the ceramic structures 10 and 20, the number of pores with a circle equivalent diameter of 5 μm or more in the observation image is set to a (number), and the observation image When the number of pores with a circle-equivalent diameter of less than 5 μm is set to b (number), the ratio b/a can be 50 or more. If the ratio b/a is in this range, the large pores formed by the accumulation of pores that were originally generated during the generation process will almost disappear, and small pores will be dispersedly arranged. Therefore, when placed in an environment where the temperature is raised and lowered repeatedly, even if microcracks are generated, the elongation can be suppressed by the pores 6(7).

比率b/a可為80以上,尤其,比率b/a以100以上為佳。氣孔6(7)之個數係只要使用數位顯微鏡以上述觀察圖像作為對象而求得即可。 The ratio b/a may be 80 or more, and in particular, the ratio b/a is preferably 100 or more. The number system of the pores 6(7) may be obtained by using a digital microscope with the above-mentioned observation image as an object.

陶瓷構造體10、20之表層區域3、4及內部區域5之任一者中,觀察圖像中之氣孔6(7)的圓等效徑之峰度Ku可為0.5以上5以下。若氣孔6(7)之圓等效徑的峰度Ku為該範圍,則氣孔6(7)之圓等效徑的分布變狹窄,而且,異常大的圓等效徑之氣孔6(7)變少。因此,即使從表面1(2)朝深度方向進行研磨,亦可抑制偏磨耗。尤其,峰度Ku以2以上4以下為佳。在圖3所示之例中,氣孔6(7)之圓等效徑的峰度Ku,在(a)為2.7,在(b)為3.8,在(c)為2.4。 In any of the surface regions 3, 4 and the inner region 5 of the ceramic structures 10 and 20, the kurtosis Ku of the circle-equivalent diameter of the pore 6 (7) in the observation image may be 0.5 or more and 5 or less. If the kurtosis Ku of the circle-equivalent diameter of the stomata 6(7) is in this range, the distribution of the circle-equivalent diameter of the stomata 6(7) becomes narrower, and the abnormally large circle-equivalent diameter stomata 6(7) Fewer. Therefore, even if the surface 1 (2) is polished in the depth direction, uneven wear can be suppressed. In particular, the kurtosis Ku is preferably 2 or more and 4 or less. In the example shown in Fig. 3, the kurtosis Ku of the circle-equivalent diameter of the pore 6(7) is 2.7 in (a), 3.8 in (b), and 2.4 in (c).

所謂峰度Ku係顯示分布之尖峰與尾部離常態分布有多少差異之指標(統計量)。為峰度Ku>0之時,會成為具有尖銳的尖峰與長粗的尾部的分 布。為峰度Ku=0之時,會成為常態分布。為峰度Ku<0之時,分布會成為具有帶圓狀之尖峰與短細的尾部之分布。氣孔6(7)之圓等效徑的峰度Ku係只要使用在Excel(註冊商標,Microsoft Corporation)所具備之函數Kurt求取即可。 The so-called kurtosis Ku is an index (statistic) that shows how much the peak and tail of the distribution differ from the normal distribution. When the kurtosis Ku>0, it will become a component with sharp peaks and long and thick tails. cloth. When kurtosis Ku=0, it will become a normal distribution. When kurtosis Ku<0, the distribution will become a distribution with rounded peaks and short tails. The kurtosis Ku of the circle-equivalent diameter of the pore 6(7) can be obtained by using the function Kurt provided in Excel (registered trademark, Microsoft Corporation).

陶瓷構造體10、20之表層區域3、4及內部區域5之任一者中,氣孔之圓等效徑的偏度Sk可為0.5以上2以下。若氣孔6(7)之圓等效徑的偏度Sk為該範圍,則氣孔6(7)之圓等效徑的平均值小,而且異常大的圓等效徑之氣孔6(7)變少。因此,即使從表面1(2)朝深度方向進行研磨,亦可抑制偏磨耗。尤其,偏度Sk以1以上1.8以下為佳。在圖3所示之例中,氣孔6(7)之圓等效徑的偏度Sk,在(a)為1.2,在(b)為1.4,在(c)為1.1。 In any of the surface regions 3 and 4 and the internal region 5 of the ceramic structures 10 and 20, the skewness Sk of the circle equivalent diameter of the pores may be 0.5 or more and 2 or less. If the skewness Sk of the circle equivalent diameter of the pore 6(7) is in this range, the average value of the circle equivalent diameter of the pore 6(7) is small, and the abnormally large circle equivalent diameter of the pore 6(7) changes less. Therefore, even if the surface 1 (2) is polished in the depth direction, uneven wear can be suppressed. In particular, the skewness Sk is preferably 1 or more and 1.8 or less. In the example shown in Fig. 3, the skewness Sk of the circle equivalent diameter of the pore 6(7) is 1.2 in (a), 1.4 in (b), and 1.1 in (c).

所謂偏度Sk係分布離常態分布有多少偏斜,亦即顯示分布之左右對稱性的指標(統計量)。當偏度Sk>0時,分布之長尾部會朝向右側。當偏度Sk=0時,分布會成為左右對稱。當偏度Sk<0時,分布之尾部會朝向左側。氣孔6(7)之圓等效徑的偏度Sk係只要使用在Excel(註冊商標、Microsoft Corporation)所具備之函數SKEW而求得即可。 The so-called skewness Sk is how much the distribution is skewed from the normal distribution, that is, an index (statistic) that shows the left and right symmetry of the distribution. When the skewness Sk>0, the long tail of the distribution will face to the right. When the skewness Sk=0, the distribution will become symmetrical. When the skewness Sk<0, the tail of the distribution will be toward the left. The skewness Sk of the circle equivalent diameter of the pore 6(7) can be obtained by using the function SKEW provided in Excel (registered trademark, Microsoft Corporation).

陶瓷構造體10、20之表層區域3、4及內部區域5之至少任一者中,在觀察圖像中之結晶粒子的粒徑之平均值可為1μm以上4μm以下。若結晶粒子之粒徑的平均值為1μm以上,可抑制將氧化鋁(Al2O3)粉末等作為主成分的原料進行細微粉碎所致之製作成本。若結晶粒子之粒徑的平均值為4μm以下,可提高破壞靭性及剛性等機械特性。尤其,陶瓷構造體10、20之表層區域3、4及內部區域5之任一者,在觀察圖像中之結晶粒子的粒徑之平均值以1μm以上4μm以下為佳。 In at least any one of the surface region 3, 4 and the inner region 5 of the ceramic structures 10 and 20, the average value of the particle size of the crystal particles in the observation image may be 1 μm or more and 4 μm or less. If the average particle diameter of the crystal particles is 1 μm or more, the production cost caused by finely pulverizing raw materials such as alumina (Al 2 O 3) powder as the main component can be suppressed. If the average particle size of the crystal particles is 4 μm or less, mechanical properties such as fracture toughness and rigidity can be improved. In particular, in any one of the surface layer regions 3, 4 and the inner region 5 of the ceramic structures 10 and 20, the average value of the particle size of the crystal particles in the observation image is preferably 1 μm or more and 4 μm or less.

陶瓷構造體10、20之表層區域3、4及內部區域5之至少任一者中,在觀察圖像中之結晶粒子的粒徑之峰度Ku2可為0以上。若結晶粒子之粒徑的峰度Ku2為該範圍,可抑制結晶粒子之粒徑的變異。因此,氣孔之凝集會減少,可減少從氣孔之輪廓或內部產生的脫粒。尤其,陶瓷構造體10、20之表層區域3、4及內部區域5之任一者,在觀察圖像中之結晶粒子的粒徑之峰度Ku2以5以上為佳。 In at least any of the surface regions 3, 4 and the inner region 5 of the ceramic structures 10 and 20, the kurtosis Ku2 of the particle size of the crystal particles in the observation image may be 0 or more. If the kurtosis K u2 of the particle diameter of the crystal particles is in this range, the variation of the particle diameter of the crystal particles can be suppressed. Therefore, the agglomeration of the pores is reduced, and the threshing generated from the outline or the inside of the pores can be reduced. In particular, for any of the surface regions 3 and 4 and the inner region 5 of the ceramic structures 10 and 20, the kurtosis Ku2 of the particle size of the crystal particles in the observation image is preferably 5 or more.

陶瓷構造體10、20之表層區域3、4及內部區域5之至少任一者中,在觀察圖像中之結晶粒子的粒徑之偏度Sk2可為0以上。若結晶粒子之粒徑的偏度Sk2為該範圍,結晶粒子之粒徑的分布會朝粒徑小的方向進行移動。因此,氣孔之凝集會減少,而可更減少從氣孔之輪廓或內部產生之脫粒。尤其,陶瓷構造體10、20之表層區域3、4及內部區域5之任一者中,在觀察圖像中之結晶粒子的粒徑之偏度Sk2以1.5以上為佳。 In at least any of the surface regions 3 and 4 and the inner region 5 of the ceramic structures 10 and 20, the skewness Sk2 of the particle size of the crystal particles in the observation image may be 0 or more. If the skewness Sk2 of the particle size of the crystal particles is within this range, the distribution of the particle size of the crystal particles will move toward the smaller particle size. Therefore, the agglomeration of the pores will be reduced, and the threshing generated from the outline or the inside of the pores can be further reduced. In particular, in any one of the surface regions 3 and 4 and the internal region 5 of the ceramic structures 10 and 20, the skewness Sk2 of the particle size of the crystal particles in the observation image is preferably 1.5 or more.

結晶粒子之粒徑係可如以下之方式求得。首先,對從陶瓷構造體10、20之表面1、2朝深度方向離例如0.6mm及5mm之各內面,使用平均粒徑D50為3μm之鑽石研磨粒以銅盤進行研磨。其後,使用平均粒徑D50為0.5μm之鑽石研磨粒以錫盤進行研磨。對藉由此等研磨所得到之研磨面,使溫度設為1480℃而進行熱處理至可辨識結晶粒子與粒界層為止而獲得作為觀察面之剖面。熱處理之時間例如為30分鐘。 The particle size of the crystal particles can be obtained as follows. First, the inner surfaces of the ceramic structures 10, 20 that are separated from the surfaces 1 and 2 in the depth direction, for example, 0.6 mm and 5 mm in the depth direction, are polished with a copper disk using diamond abrasive grains with an average particle diameter D 50 of 3 μm. Thereafter, diamond abrasive grains with an average particle diameter D 50 of 0.5 μm were used for polishing with a tin plate. The polished surface obtained by such polishing is heat-treated at a temperature of 1480°C until the crystal particles and the grain boundary layer can be recognized to obtain a cross section as an observation surface. The heat treatment time is, for example, 30 minutes.

而且,將經熱處理之面使用光學顯微鏡而使倍率設為400倍進行拍攝。然後,拍攝得到之圖像之中,以面積為4.8747×102μm2之範圍作為量測範圍,使用圖像分析軟體(例如三谷商事股份有限公司製、Win ROOF)進行分析,藉此,可獲得各個結晶粒子之粒徑。 In addition, the heat-treated surface was photographed using an optical microscope at a magnification of 400 times. Then, among the captured images, the area of 4.8747×10 2 μm 2 is used as the measurement range, and image analysis software (for example, manufactured by Mitani Corporation, Win ROOF) is used for analysis. Obtain the particle size of each crystal particle.

相當於結晶粒子之粒徑的圓等效徑之閾值係只要設定為1μm即可。結晶粒子之粒徑之平均值、峰度Ku2及偏度Sk2係只要使用在Excel(註冊商標、Microsoft Corporation)所具備之函數來求得即可。 The threshold value of the circle equivalent diameter corresponding to the particle diameter of the crystal particles may be set to 1 μm. The average value, kurtosis K u2 and skewness S k2 of the crystal particle diameter can be obtained by using functions provided in Excel (registered trademark, Microsoft Corporation).

其次,說明有關本揭示之陶瓷構造體之製造方法之一例。首先,準備平均粒徑為0.4至0.8μm之氧化鋁(Al2O3)粉末、作為Mg源之氫氧化鎂(Mg(OH)2)粉末、作為Si源之氧化矽(SiO2)粉末、作為Sr源之碳酸鍶(SrCO3)粉末。 Next, an example of the method of manufacturing the ceramic structure of the present disclosure will be explained. First, prepare aluminum oxide (Al 2 O 3 ) powder with an average particle size of 0.4 to 0.8 μm, magnesium hydroxide (Mg(OH) 2 ) powder as a source of Mg, silicon oxide (SiO 2 ) powder as a source of Si, Strontium carbonate (SrCO 3 ) powder as a source of Sr.

相對於氧化鋁(Al2O3)粉末100質量份,氫氧化鎂(Mg(OH)2)粉末係設為0.03質量份以上0.06質量份以下,氧化矽(SiO2)粉末係設為0.02質量份以上0.04質量份以下、碳酸鍶(SrCO3)粉末係設為0.03質量份以上0.05質量份以下。而且,將氧化鋁(Al2O3)粉末、氫氧化鎂(Mg(OH)2)粉末、氧化矽(SiO2)粉末及碳酸鍶(SrCO3)粉末以及分散劑、消泡劑、增黏安定劑及黏結劑加入混合裝置中而混合/粉碎而形成漿液之後,使用真空泵浦進行脫泡。 Relative to 100 parts by mass of alumina (Al 2 O 3 ) powder, magnesium hydroxide (Mg(OH) 2 ) powder is set to 0.03 parts by mass or more and 0.06 parts by mass or less, and silica (SiO 2 ) powder is set to 0.02 parts by mass The strontium carbonate (SrCO 3 ) powder is set to 0.03 parts by mass or more and 0.05 parts by mass or less. In addition, aluminum oxide (Al 2 O 3 ) powder, magnesium hydroxide (Mg(OH) 2 ) powder, silicon oxide (SiO 2 ) powder, and strontium carbonate (SrCO 3 ) powder, as well as dispersant, defoamer, and viscosity increase After the stabilizer and the binder are added to the mixing device and mixed/pulverized to form a slurry, a vacuum pump is used for defoaming.

為了獲得從觀察圖像中將氣孔的重心間距離之平均值減去氣孔之圓等效徑的平均值而得之值為5μm以上10μm以下的陶瓷構造體,相對於氧化鋁(Al2O3)粉末100質量份,只要添加消泡劑0.05質量份以上0.09質量份以下即可。為了獲得在觀察圖像中之氣孔的圓等效徑之最大值為10μm以下之陶瓷構造體,為抑制容易因粉碎產生之增黏,相對於氧化鋁(Al2O3)粉末100質量份,只要添加螯合劑0.03質量份0.07質量份即可。 In order to obtain a ceramic structure with a value of 5 μm or more and 10 μm or less by subtracting the average value of the distance between the centers of gravity of the pores from the average value of the pore circle equivalent diameter from the observation image, compared with alumina (Al 2 O 3 ) 100 parts by mass of the powder, as long as 0.05 parts by mass or more and 0.09 parts by mass or less of the defoamer are added. In order to obtain a ceramic structure in which the maximum value of the circle-equivalent diameter of the pores in the observation image is 10 μm or less, in order to suppress the increase in viscosity easily caused by pulverization, relative to 100 parts by mass of alumina (Al 2 O 3) powder, It is sufficient to add 0.03 parts by mass and 0.07 parts by mass of the chelating agent.

為了獲得比率b/a為50以上之陶瓷構造體,只要進行脫泡30分鐘以上即可。為了獲得氣孔之圓等效徑的峰度Ku為0.5以上5以下之陶瓷構造體,只要在上述範圍添加螯合劑,並使混合/粉碎時間為10小時以上即可。為了 獲得氣孔之圓等效徑的偏度Sk為0.5以上2以下之陶瓷構造體,只要在上述範圍添加螯合劑,並使混合柵碎時間為15小時以上即可。 In order to obtain a ceramic structure with a ratio b/a of 50 or more, it is only necessary to perform degassing for 30 minutes or more. In order to obtain a ceramic structure having a kurtosis Ku of the circle-equivalent diameter of the pores of 0.5 or more and 5 or less, it is only necessary to add a chelating agent within the above-mentioned range and to make the mixing/grinding time be 10 hours or more. in order to To obtain a ceramic structure with a skewness Sk of the equivalent circle diameter of the pores of 0.5 or more and 2 or less, it is only necessary to add a chelating agent within the above range and make the mixing grid crushing time 15 hours or more.

為了獲得在表層區域及內部區域之至少任一者的觀察圖像中之結晶粒子的粒徑之平均值為1μm以上4μm以下之陶瓷構造體,只要將經混合/粉碎之粉末的平均粒徑D50例如以成為0.3μm以上0.7μm以下之方式設定即可。 In order to obtain a ceramic structure in which the average particle diameter of the crystal particles in the observation image of at least any one of the surface region and the internal region is 1 μm or more and 4 μm or less, the average particle diameter D of the mixed/pulverized powder 50 may be set so as to be 0.3 μm or more and 0.7 μm or less, for example.

為了獲得在表層區域及內部區域之至少任一者的觀察圖像中之結晶粒子的粒徑之峰度Ku2為0以上之陶瓷構造體,只要延長粉碎之時間至粉末的粒徑之峰度成為0以上為止即可。同樣地,為了獲得表層區域及內部區域之至少任一者的觀察圖像中之結晶粒子的粒徑之偏度Sk2為0以上之陶瓷構造體,只要延長粉碎之時間至粉末的粒徑之偏度成為0以上為止即可。 In order to obtain a ceramic structure in which the kurtosis K u2 of the particle size of the crystal particles in the observation image of at least any one of the surface region and the inner region is 0 or more, it is only necessary to extend the grinding time to the kurtosis of the particle size of the powder What is necessary is just to become 0 or more. Likewise, in order to obtain the surface region and the interior region of slanting at least one of an observation image of the particle diameter of the crystal particles of S k2 of 0 or more ceramic structure, as long as the prolonged pulverized to a powder of particle diameter The skewness should just become 0 or more.

將以如此之方法所得到之漿液從成形體之高度方向注入於由導熱性高的金屬等所構成的成形模具之後,以此狀態在50℃以上100℃以下之溫度使其固化而為固化體。接著,將固化體脫模之後,以控制溫濕度之狀態使其乾燥而為乾燥體。為了獲得比Ri與比Rs之差為0.4以上之陶瓷構造體,只要使漿液之注入速度設為1×103cm3/分鐘以上3×103cm3/分鐘以下即可。 The slurry obtained by such a method is injected from the height direction of the molded body into a mold made of a metal with high thermal conductivity, and then cured at a temperature of 50°C or more and 100°C in this state to form a cured body . Next, after the cured body is demolded, it is dried in a state of controlled temperature and humidity to become a dried body. In order to obtain a ceramic structure having a difference between the ratio Ri and the ratio Rs of 0.4 or more, the injection rate of the slurry should be set to 1×10 3 cm 3 /min or more and 3×10 3 cm 3 /min or less.

繼而,將乾燥體在400℃以上550℃以下脫脂之後,使燒成溫度為1550℃以上1650℃以下,並保持5小時以上10小時以下。如此方式,可獲得比率B/A為1.5以下之本揭示的陶瓷構造體。 Then, after degreasing the dried body at 400°C or higher and 550°C or lower, the firing temperature is set to 1550°C or higher and 1650°C or lower, and maintained for 5 hours or more and 10 hours or less. In this way, the ceramic structure of the present disclosure having a ratio B/A of 1.5 or less can be obtained.

藉由上述之製造方法所得到之陶瓷構造體係即使為長條狀或大型者,機械特性亦幾乎不降低。因此,可使用作為要求高的機械特性之用途,例如半導體製造裝置用構件、液晶製造裝置用構件。 Even if the ceramic structure system obtained by the above-mentioned manufacturing method is long or large, the mechanical properties are hardly degraded. Therefore, it can be used as an application requiring high mechanical properties, such as a member for a semiconductor manufacturing device and a member for a liquid crystal manufacturing device.

1,2:表面 1,2: surface

3,4:表層區域 3,4: surface area

5:內部區域 5: Internal area

10:陶瓷構造體 10: Ceramic structure

Claims (11)

一種陶瓷構造體,係含有氧化鋁作為主成分,且將使用X射線繞射法所得到之氧化鋁的(113)面及(116)面之繞射強度分別設為I(113)及I(116),並以I(113)/I(116)作為繞射強度之比時,從表面朝深度方向為超過0.7mm之內部區域中的前述繞射強度比亦即比Ri係大於1,從表面朝深度方向為0.7mm以下之表層區域中的前述繞射強度比亦即比Rs係小於1。 A ceramic structure containing alumina as the main component, and the diffraction intensities of the (113) plane and (116) plane of the alumina obtained by the X-ray diffraction method are set to I(113) and I( 116), and taking I(113)/I(116) as the ratio of the diffraction intensity, the aforementioned diffraction intensity ratio in the inner region exceeding 0.7mm from the surface to the depth direction, that is, the ratio of the Ri system is greater than 1, from The aforementioned diffraction intensity ratio in the surface layer region whose surface is 0.7 mm or less in the depth direction, that is, the ratio Rs is less than 1. 如請求項1所述之陶瓷構造體,其中,前述比Ri與前述比Rs之差為0.4以下。 The ceramic structure according to claim 1, wherein the difference between the ratio Ri and the ratio Rs is 0.4 or less. 如請求項1或2所述之陶瓷構造體,其中,在剖面之觀察圖像中,將前述表層區域中之氣孔的面積占有率設為A(%),將前述內部區域中之氣孔的面積占有率設為B(%)時,比率B/A為1.5以下。 The ceramic structure according to claim 1 or 2, wherein in the cross-sectional observation image, the area occupancy rate of the pores in the surface region is A (%), and the area of the pores in the inner region When the occupancy rate is set to B (%), the ratio B/A is 1.5 or less. 如請求項3所述之陶瓷構造體,其中,在前述表層區域及前述內部區域之任一者中,將前述觀察圖像中之前述氣孔的重心間距離之平均值減去前述氣孔之圓等效徑的平均值而得之值為5μm以上10μm以下。 The ceramic structure according to claim 3, wherein in any of the surface region and the inner region, the average value of the distance between the centers of gravity of the pores in the observation image is subtracted from the circle of the pores, etc. The value obtained by the average value of the effective diameter is 5 μm or more and 10 μm or less. 如請求項3或4所述之陶瓷構造體,其中,在前述表層區域及前述內部區域之任一者中,前述觀察圖像中之前述氣孔的圓等效徑之最大值為10μm以下。 The ceramic structure according to claim 3 or 4, wherein in any one of the surface layer region and the inner region, the maximum value of the circle equivalent diameter of the pores in the observation image is 10 μm or less. 如請求項3至5中任一項所述之陶瓷構造體,其中,在前述表層區域及前述內部區域之任一者中,將前述觀察圖像中之圓等效徑為5μm以上之前述氣孔的個數設為a(個),將前述觀察圖像中之圓等效徑未達5μm之前述氣孔的個數設為b(個)時,比率b/a為50以上。 The ceramic structure according to any one of claims 3 to 5, wherein, in any one of the surface region and the internal region, the pores having the equivalent diameter of a circle in the observation image are 5 μm or more When the number of pores is set to a (number), and the number of pores whose circle equivalent diameter in the observation image is less than 5 μm is set to b (number), the ratio b/a is 50 or more. 如請求項3至6中任一項所述之陶瓷構造體,其中,在前述表層區域及前述內部區域之任一者中,前述觀察圖像中之前述氣孔的圓等效徑之峰度Ku為0.5以上5以下。 The ceramic structure according to any one of claims 3 to 6, wherein, in any one of the surface layer region and the inner region, the kurtosis Ku of the circle equivalent diameter of the pores in the observation image It is 0.5 or more and 5 or less. 如請求項3至7中任一項所述之陶瓷構造體,其中,在前述表層區域及前述內部區域之任一者中,前述氣孔之圓等效徑的偏度Sk為0.5以上2以下。 The ceramic structure according to any one of claims 3 to 7, wherein in any one of the surface layer region and the inner region, the skewness Sk of the circle equivalent diameter of the pores is 0.5 or more and 2 or less. 如請求項3至8中任一項所述之陶瓷構造體,其中,前述表層區域及前述內部區域之至少任一者中,前述觀察圖像中之結晶粒子的粒徑之平均值為1μm以上4μm以下。 The ceramic structure according to any one of claims 3 to 8, wherein in at least any one of the surface region and the inner region, the average value of the particle diameter of the crystal particles in the observation image is 1 μm or more Below 4μm. 如請求項1至9中任一項所述之陶瓷構造體,其中,前述表層區域及前述內部區域之至少任一者中,前述觀察圖像中之結晶粒子的粒徑之峰度Ku2為0以上。 The ceramic structure according to any one of claims 1 to 9, wherein in at least any one of the surface region and the internal region, the kurtosis Ku2 of the particle diameter of the crystal particles in the observation image is 0 or more. 如請求項1至10中任一項所述之陶瓷構造體,其中,前述表層區域及前述內部區域之至少任一者中,前述觀察圖像中之結晶粒子的粒徑之偏度Sk2為0以上。 The ceramic structure according to any one of claims 1 to 10, wherein, in at least any one of the surface layer region and the inner region, the skewness Sk2 of the particle size of the crystal particles in the observation image is 0 or more.
TW109132372A 2019-09-30 2020-09-18 Ceramic structure TWI757877B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019-179678 2019-09-30
JP2019179678A JP2021054676A (en) 2019-09-30 2019-09-30 Ceramic structure

Publications (2)

Publication Number Publication Date
TW202114964A true TW202114964A (en) 2021-04-16
TWI757877B TWI757877B (en) 2022-03-11

Family

ID=75269753

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109132372A TWI757877B (en) 2019-09-30 2020-09-18 Ceramic structure

Country Status (2)

Country Link
JP (1) JP2021054676A (en)
TW (1) TWI757877B (en)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09263440A (en) * 1996-03-29 1997-10-07 Ngk Insulators Ltd Alumina sintered compact and its production
US8357262B2 (en) * 2005-08-31 2013-01-22 Kyocera Corporation Corrosion-resistant member, treatment apparatus and sample treatment method using the member, and method for manufacture of corrosion-resistant member
JP4854420B2 (en) * 2005-09-28 2012-01-18 京セラ株式会社 Alumina sintered body, processing apparatus member and processing apparatus using the same, sample processing method, and method for producing alumina sintered body
JP2007254276A (en) * 2006-02-27 2007-10-04 Kyocera Corp Alumina sintered compact, its manufacturing method, and liquid crystal manufacturing unit using them
JP5137358B2 (en) * 2006-08-29 2013-02-06 京セラ株式会社 Alumina sintered body, processing apparatus member and processing apparatus using the same, sample processing method, and method for producing alumina sintered body
JP5242529B2 (en) * 2009-09-29 2013-07-24 太平洋セメント株式会社 Method for producing free-cutting ceramics
CN107001148B (en) * 2014-11-28 2020-03-13 日本碍子株式会社 Alumina sintered body and base substrate for optical element

Also Published As

Publication number Publication date
TWI757877B (en) 2022-03-11
JP2021054676A (en) 2021-04-08

Similar Documents

Publication Publication Date Title
KR101155799B1 (en) Yttria sinter and member for plasma processor
TWI715004B (en) Component for plasma processing device, plasma processing device provided with the same, and manufacturing method of component for plasma processing device
JP7022817B2 (en) Ceramic structure
JP5510411B2 (en) Electrostatic chuck and method for manufacturing electrostatic chuck
KR20130030293A (en) Electrostatic chuck
KR100814321B1 (en) Oxide sintered body and preparation process thereof, sputtering target and transparent electroconductive films
JP2020173089A (en) Ceramic tray, and heat treatment method and heat treatment device using the same
TW202114964A (en) Ceramic structure
TWI706930B (en) Ceramic article
TWI757876B (en) Ceramic structure
US11014855B2 (en) Transparent AlN sintered body and method for producing the same
JP7431642B2 (en) Ceramic tray, heat treatment method using the same, and heat treatment equipment
WO2020044798A1 (en) Oxide sputtering target and production method for oxide sputtering target
US20220325399A1 (en) Component for plasma processing apparatus and plasma processing apparatus including component
WO2018131600A1 (en) Mounting member for heat treatment
JP2020173088A (en) Ceramic tray, and heat treatment method and heat treatment device using the same
TW202144309A (en) Wafer boat
KR20210129041A (en) Oxide sintered compact, sputtering target, and manufacturing method of sputtering target
KR102573502B1 (en) Frame member for electron beam drawing device and electron beam drawing device
TWI755648B (en) Sintered oxide body, sputtering target and method for producing oxide thin film
TWI760156B (en) Ceramic structure and member for liquid crystal penal manufacturing device or member for semiconductor manufacturing device
TWI388680B (en) Sputtering target having a controlled occupancy rate of pinholes and method for making such sputtering target
WO2019065726A1 (en) Substrate for mounting light-emitting element, circuit substrate for mounting light-emitting element comprising same, and light-emitting element module