TW202114957A - Manufacturing method of heat-strengthened glass substrate and solar cell module without dazzle such as glare caused by sunlight reflection and with an excellent appearance - Google Patents

Manufacturing method of heat-strengthened glass substrate and solar cell module without dazzle such as glare caused by sunlight reflection and with an excellent appearance Download PDF

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TW202114957A
TW202114957A TW108135774A TW108135774A TW202114957A TW 202114957 A TW202114957 A TW 202114957A TW 108135774 A TW108135774 A TW 108135774A TW 108135774 A TW108135774 A TW 108135774A TW 202114957 A TW202114957 A TW 202114957A
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中田年信
田飼伸匡
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日商鐘化股份有限公司
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract

An object of this invention is to provide an anti-glare crystal solar cell module without dazzle such as glare caused by sunlight reflection and with an excellent appearance. The object is solved by virtue of a manufacturing method of a heat-strengthened glass substrate. The manufacturing method of the heat-strengthened glass substrate includes: firstly, blasting the surface of a glass substrate, which is not heat-strengthened, by using an abrading agent higher than F46 and lower than F220; secondly, blasting the above-mentioned glass substrate obtained in the first step by using an abrading agent higher than #240 and lower than #2000 to form a glass substrate with a irregular surface, wherein the arithmetic average roughness on the surface of the glass substrate is higher than 0.5 [mu]m and lower than 5 [mu]m, the maximum height roughness on the surface of the glass substrate is higher than 10 [mu]m and lower than 50 [mu]m, and the area of cracks existing on the surface of the glass substrate does not reach 1%; and thirdly, heat-strengthening the above-mentioned glass substrate with the irregular surface.

Description

熱強化玻璃基板之製造方法及太陽電池模組Manufacturing method of thermally strengthened glass substrate and solar cell module

本發明係關於一種太陽電池模組及使用於其之熱強化玻璃基板之製造方法。The invention relates to a solar cell module and a method for manufacturing a thermally strengthened glass substrate used in the solar cell module.

於受光面側具備覆蓋玻璃之太陽電池模組通常設置於一般住宅或工廠之屋頂上或壁面,或者設置於閒置土地等之地面上。於設置於屋頂上或壁面之情形時,存在如下情形:太陽電池模組之表面發揮鏡之作用反射太陽光,因此會因「眩目」或「眩光」等受到近鄰之居民或行人指責。又,於設置於地面上時之設置場所靠近飛機場之情形時,存在眩目或眩光妨礙飛機之安全運行之情形。因此,業者期望開發防眩性較高之太陽電池模組,於專利文獻1中,揭示有具備防眩性與防污性之太陽電池模組。Solar cell modules with cover glass on the light-receiving surface are usually installed on the roof or wall of a general house or factory, or on the ground such as idle land. When installed on the roof or on the wall, there are situations where the surface of the solar cell module acts as a mirror to reflect sunlight, so it will be criticized by nearby residents or pedestrians due to "dazzle" or "dazzle". In addition, when the installation site is close to the airport when it is installed on the ground, glare or glare may hinder the safe operation of the aircraft. Therefore, the industry expects to develop a solar cell module with high anti-glare properties. Patent Document 1 discloses a solar cell module with anti-glare properties and anti-fouling properties.

關於對玻璃之表面賦予凹凸之技術,揭示於專利文獻2或專利文獻3,又,關於強化玻璃之表面之凹凸,於專利文獻4中有揭示。 [先前技術文獻] [專利文獻]The technique of imparting unevenness to the surface of glass is disclosed in Patent Document 2 or Patent Document 3, and the unevenness on the surface of strengthened glass is disclosed in Patent Document 4. [Prior Technical Literature] [Patent Literature]

[專利文獻1]WO2014/203820號公報 [專利文獻2]日本專利特開2010-70445號公報 [專利文獻3]日本專利特開2016-29474號公報 [專利文獻4]日本專利特開平11-79769號公報[Patent Document 1] WO2014/203820 Publication [Patent Document 2] Japanese Patent Laid-Open No. 2010-70445 [Patent Document 3] Japanese Patent Laid-Open No. 2016-29474 [Patent Document 4] Japanese Patent Laid-Open No. 11-79769

[發明所欲解決之問題][The problem to be solved by the invention]

以下,記載先前技術所具有之問題。The following describes the problems of the prior art.

於專利文獻1中,作為於利用噴砂加工於玻璃基板形成表面凹凸時,將殘留於玻璃表面之龜裂去除之方法,揭示有於第一噴砂加工後利用粒徑較第一噴砂加工所使用之研磨劑小之研磨劑,實施第二噴砂加工。然而,於專利文獻1中,關於第二噴砂加工後之玻璃基板之表面性狀,缺乏詳細之記載,難以實施。In Patent Document 1, as a method for removing cracks remaining on the glass surface when sandblasting is used to form surface irregularities on the glass substrate, it is disclosed that after the first sandblasting, the particle size is smaller than that used in the first sandblasting. For abrasives with small abrasives, perform the second sandblasting process. However, in Patent Document 1, there is a lack of detailed descriptions on the surface properties of the glass substrate after the second sandblasting process, and it is difficult to implement it.

於專利文獻2或3中,利用氫氟酸等進行蝕刻之方法雖然對降低噴砂加工中產生之龜裂之量有效,但是由於使用作為劇毒物之氫氟酸,廢液處理等製造步驟之負荷較大,對人及環境均存在問題,又,因此存在成本變高之問題。In Patent Document 2 or 3, although the method of etching using hydrofluoric acid etc. is effective in reducing the amount of cracks generated during sandblasting, it uses hydrofluoric acid, which is a highly toxic substance, and wastes liquid treatment and other manufacturing steps. Larger, there are problems for both people and the environment, and, therefore, there is a problem of higher costs.

於專利文獻4中,僅僅揭示了玻璃端面之研磨面之表面凹凸之最大值為3 μm以下。In Patent Document 4, it is only disclosed that the maximum surface unevenness of the polished surface of the glass end surface is 3 μm or less.

本發明之目的係解決如以上之問題,提供一種於玻璃表面形成微細之凹凸,且降低玻璃表面之龜裂之量,防眩性能、可靠性及機械強度優異之強化玻璃之製造方法,以及使用其之防眩型太陽電池模組。 [解決問題之技術手段]The purpose of the present invention is to solve the above-mentioned problems, provide a method for manufacturing strengthened glass that forms fine unevenness on the glass surface, reduces the amount of cracks on the glass surface, and has excellent anti-glare performance, reliability and mechanical strength, and use Its anti-glare solar cell module. [Technical means to solve the problem]

本發明之第一方面係一種熱強化玻璃基板之製造方法,其包含:第一步驟,其係對未進行熱強化處理之玻璃基板之表面利用F46以上F220以下之JIS R6001-1:2017之粒度之研磨劑進行噴擊加工;第二步驟,其係藉由對經過上述第一步驟之玻璃基板利用#240以上#2000以下之JIS R6001-2:2017之粒度之研磨劑進行噴擊加工,形成使該玻璃基板之表面之算術平均粗糙度為0.5 μm以上5 μm以下、使該玻璃基板之表面之最大高度粗糙度為10 μm以上50 μm以下、使存在於該玻璃基板之表面之龜裂之面積未達1%,而形成有表面凹凸的玻璃基板;及第三步驟,其係對形成有上述表面凹凸之玻璃基板進行熱強化處理。根據該構成,可製作玻璃基板上防眩性能優異、無正反射像之映入之玻璃基板,並且藉由降低玻璃表面之龜裂之量,於熱強化後之玻璃表面與水分接觸時,可降低該水分之pH值,可抑制例如由保管時之冷凝導致產生外觀變化。又,同時可減少因玻璃表面之龜裂而散射之入射光之量,抑制輸出特性之降低。The first aspect of the present invention is a method for manufacturing a heat-strengthened glass substrate, which includes: the first step of using the grain size of JIS R6001-1: 2017 above F46 and F220 on the surface of the glass substrate that has not been thermally strengthened The abrasive is sprayed; the second step is to spray the glass substrate after the first step with #240 above #2000 with JIS R6001-2: 2017 grit abrasives to form Make the arithmetic average roughness of the surface of the glass substrate be 0.5 μm or more and 5 μm or less, make the maximum height roughness of the surface of the glass substrate be 10 μm or more and 50 μm or less, and cause cracks existing on the surface of the glass substrate The area is less than 1%, and the glass substrate with surface irregularities is formed; and the third step is to heat-strengthen the glass substrate with the above-mentioned surface irregularities. According to this structure, it is possible to produce a glass substrate with excellent anti-glare performance on the glass substrate and no reflection of the regular reflection image, and by reducing the amount of cracks on the glass surface, when the glass surface after heat strengthening is in contact with moisture, it can be Lowering the pH value of the water can suppress changes in appearance due to, for example, condensation during storage. In addition, at the same time, the amount of incident light scattered due to cracks on the glass surface can be reduced, and the decrease in output characteristics can be suppressed.

又,本發明係上述熱強化玻璃基板之製造方法,其中上述第一步驟中所使用之研磨劑係JIS R6001-1:2017之粒度為F46以上F220以下,上述第二步驟中所使用之研磨劑係JIS R6001-1:2017之粒度為#240以上#2000以下。根據該構成,可製作玻璃基板上防眩性能優異,無正反射像之映入之玻璃基板。In addition, the present invention is a method for manufacturing the above-mentioned thermally strengthened glass substrate, wherein the abrasive used in the first step is JIS R6001-1: 2017 with a particle size of F46 or more and F220 or less, and the abrasive used in the second step According to JIS R6001-1: 2017, the particle size is #240 or more and #2000 or less. According to this structure, it is possible to produce a glass substrate having excellent anti-glare performance on the glass substrate and no reflection of a regular reflection image.

本發明之第二方面係一種熱強化玻璃基板之製造方法,其包含:第一步驟,其係對未進行熱強化處理之玻璃基板之表面利用F46以上F220以下之JIS R6001-1:2017之粒度之研磨劑、或#240以上#400以下之JIS R6001-2:2017之粒度之研磨劑進行噴擊加工;第二步驟,其係藉由對經過上述第一步驟之玻璃基板利用#600以上#2000以下之JIS R6001-2:2017之粒度之研磨劑進行噴擊加工,形成使該玻璃基板之表面之算術平均粗糙度為0.5 μm以上5 μm以下、使該玻璃基板之表面之最大高度粗糙度為10 μm以上50 μm以下、使存在於該玻璃基板之表面之龜裂之面積未達1%,而形成有表面凹凸的玻璃基板;及第三步驟,其對形成有上述表面凹凸之玻璃基板進行熱強化處理。根據該構成,可製作玻璃基板上防眩性能優異,無正反射像之映入之玻璃基板,並且藉由降低玻璃表面之龜裂之量,於熱強化後之玻璃表面與水分接觸時,可降低該水分之pH值,可抑制例如由保管時之冷凝導致產生外觀變化。又,同時可減少因玻璃表面之龜裂而散射之入射光之量,抑制輸出特性之降低。The second aspect of the present invention is a method for manufacturing a heat-strengthened glass substrate, which includes: the first step of using the grain size of JIS R6001-1: 2017 above F46 and F220 on the surface of the glass substrate that has not been thermally strengthened JIS R6001-2: 2017 grit abrasives, or #240 above#400 or less abrasives with a particle size of JIS R6001-2: 2017; the second step is to use #600 above# on the glass substrate that has passed through the first step. Abrasives with JIS R6001-2: 2017 particle size below 2000 are sprayed to form the arithmetic average roughness of the surface of the glass substrate to be 0.5 μm or more and 5 μm or less, and the maximum height roughness of the surface of the glass substrate A glass substrate with surface irregularities is formed in a glass substrate with surface irregularities that are 10 μm or more and 50 μm or less, and the area of the cracks existing on the surface of the glass substrate is less than 1%; and the third step is for the glass substrate with the surface irregularities formed Carry out heat strengthening treatment. According to this structure, it is possible to produce a glass substrate with excellent anti-glare performance on the glass substrate and no reflection of the regular reflection image. By reducing the amount of cracks on the glass surface, the glass surface after heat strengthening is in contact with moisture. Lowering the pH value of the water can suppress changes in appearance due to, for example, condensation during storage. In addition, at the same time, the amount of incident light scattered due to cracks on the glass surface can be reduced, and the decrease in output characteristics can be suppressed.

又,本發明係上述熱強化玻璃基板之製造方法,其中上述第一步驟中所使用之研磨劑係JIS R6001-1:2017之粒度為F46以上F220以下、或JIS R6001-2:2017之粒度為#240以上#400以下,上述第二步驟中所使用之研磨劑係JIS R6001-1:2017之粒度為#600以上#2000以下。根據該構成,可製作玻璃基板上防眩性能優異,無正反射像之映入之玻璃基板。In addition, the present invention is a method for manufacturing the above heat strengthened glass substrate, wherein the abrasive used in the first step is JIS R6001-1: 2017 with a particle size of F46 or more and F220 or less, or JIS R6001-2: 2017 has a particle size of #240 above#400 or less, the abrasive used in the second step above is JIS R6001-1:2017 with a particle size of #600 above#2000 or below. According to this structure, it is possible to produce a glass substrate having excellent anti-glare performance on the glass substrate and no reflection of a regular reflection image.

又,本發明係上述熱強化玻璃基板之製造方法,其中上述熱強化處理之步驟之熱強化處理條件為如與熱強化處理後之玻璃基板之表面接觸之水分之pH值較與熱強化處理前之玻璃基板之表面接觸之水分之pH值減少的條件。根據該構成,可抑制由保管時之冷凝導致產生玻璃基板表面之外觀變化。In addition, the present invention is a method for manufacturing the above-mentioned heat-strengthened glass substrate, wherein the heat-strengthening treatment conditions of the step of the heat-strengthening treatment are as follows: Under the condition that the pH value of the water in contact with the surface of the glass substrate decreases. According to this configuration, it is possible to suppress the appearance change of the glass substrate surface due to condensation during storage.

又,本發明係一種太陽電池模組,其包含藉由上述製造方法製造而成之強化玻璃作為受光面側之覆蓋玻璃。根據該構成,可藉由防眩性能及熱強化抑制由保管時之冷凝導致產生外觀變化。 [發明之效果]In addition, the present invention is a solar cell module including the tempered glass manufactured by the above-mentioned manufacturing method as the cover glass on the light-receiving surface side. According to this structure, the appearance change caused by condensation during storage can be suppressed by anti-glare performance and thermal strengthening. [Effects of Invention]

根據本發明之方法,可提供一種藉由噴擊加工於玻璃基板形成微細之表面凹凸之強化玻璃,且可提供一種防眩性能、可靠性及機械強度優異之太陽電池模組。According to the method of the present invention, it is possible to provide a tempered glass with fine surface irregularities formed on the glass substrate by spray processing, and to provide a solar cell module with excellent anti-glare performance, reliability and mechanical strength.

用於太陽光發電且於受光面側具備覆蓋玻璃之太陽電池模組有多種,作為其中之一之矽系太陽電池模組可大致分為結晶系、薄膜系之2種,為如下之構成。結晶系之太陽電池模組(以下,稱為結晶太陽電池模組)係將包含10~15 cm見方左右之結晶半導體之板之太陽電池單元於與模組之大小相當之玻璃板(覆蓋玻璃)之上配置幾十片,進行配線,使用EVA(Ethylene Vinyl Acetate,乙烯-乙酸乙烯酯共聚物)或PVB(polyvinyl butyral,聚乙烯醇縮丁醛)等填充材、及背面保護膜進行密封保護而構成。又,薄膜系之太陽電池模組(以下,稱為薄膜太陽電池模組)係於模組之大小之玻璃板之上直接依次形成透明電極層、薄膜半導體層、及背面電極層,藉由雷射劃線等圖案化方法將各層分離,串聯連接,獲得所期望之電壓、電流。關於密封保護,使用與結晶太陽電池模組相同之填充劑及表面保護膜。如此構成之薄膜太陽電池模組相較結晶系之太陽電池模組,具有如下特徵:於用於發電之層較薄、構造材料僅1片即可、配線簡略且太陽電池單元於模組整體之面積中所占之面積之比率較大、色調固定等方面具有低成本化之潛力,且美觀優異之。而薄膜系太陽電池模組亦存在如於受光面側具備覆蓋玻璃之太陽電池模組。There are many types of solar cell modules that are used for solar power generation and are equipped with cover glass on the light-receiving surface. The silicon-based solar cell module as one of them can be roughly divided into two types: crystalline system and thin-film system, and has the following configuration. The crystalline solar cell module (hereinafter referred to as the crystalline solar cell module) is a solar cell unit containing a crystalline semiconductor plate of about 10-15 cm square on a glass plate (cover glass) equivalent to the size of the module Dozens of pieces are arranged on the top for wiring, using EVA (Ethylene Vinyl Acetate, ethylene-vinyl acetate copolymer) or PVB (polyvinyl butyral, polyvinyl butyral) and other fillers, and the backside protection film for sealing protection. constitute. In addition, a thin-film solar cell module (hereinafter referred to as thin-film solar cell module) is directly formed on a glass plate of the size of the module with a transparent electrode layer, a thin-film semiconductor layer, and a back electrode layer. Patterning methods such as shooting lines separate the layers and connect them in series to obtain the desired voltage and current. Regarding the sealing protection, the same filler and surface protection film as the crystalline solar cell module are used. Compared with the crystalline solar cell module, the thin-film solar cell module constructed in this way has the following characteristics: the layer used for power generation is thinner, the construction material is only one piece, the wiring is simple, and the solar cell unit is integrated into the module as a whole The ratio of the area occupied by the area is large, the color tone is fixed, etc. It has the potential to reduce costs, and it has excellent aesthetics. And thin-film solar cell modules also exist such as solar cell modules with cover glass on the light-receiving surface side.

針對與「眩目」或「眩光」相關之上述問題,實施如以下之對策。In response to the above-mentioned problems related to "dazzle" or "dazzle", the following countermeasures are implemented.

例如,於結晶太陽電池模組中,通常進行藉由使用型板玻璃作為覆蓋玻璃而於覆蓋玻璃表面產生光之漫反射或擴散來抑制眩目的防眩處理。所謂型板玻璃,係指對表面賦予凹凸花紋用於遮擋視線等之板玻璃,一般而言係使用刻有模板花紋之輥,利用滾壓法等製作。For example, in a crystalline solar cell module, an anti-glare treatment is usually performed to suppress glare by using a patterned glass as a cover glass to generate diffuse reflection or diffusion of light on the surface of the cover glass. The so-called slab glass refers to a plate glass that is provided with uneven patterns on the surface to block the line of sight, etc. Generally speaking, it is produced by a roller with a pattern pattern engraved on it, and the like.

然而,於結晶太陽電池模組之情形時,型板玻璃基板之表面凹凸係藉由自輥表面轉印形成,故而難以有效地形成微細且於玻璃基板整體均勻地分散之表面凹凸,防眩效果受限,現狀無法充分解決「眩目」或「眩光」問題。However, in the case of a crystalline solar cell module, the surface irregularities of the patterned glass substrate are formed by transfer from the surface of the roller, so it is difficult to effectively form fine and uniformly dispersed surface irregularities on the glass substrate. Anti-glare effect Limited, the status quo cannot adequately solve the "dazzle" or "dazzle" problem.

另一方面,於薄膜太陽電池模組中,提出有若干利用與結晶太陽電池模組相同之構造密封較小之面積之子模組,使用上述型板玻璃作為其覆蓋玻璃者。進而,亦提出有對完成之太陽電池模組之表面塗佈混入有珠粒之使光擴散之樹脂。On the other hand, in thin-film solar cell modules, several sub-modules that use the same structure as the crystalline solar cell module to seal a smaller area are proposed, and those that use the above-mentioned form glass as their cover glass. Furthermore, it has also been proposed to coat the surface of the completed solar cell module with a resin mixed with beads to diffuse light.

本發明之目的在於解決上述眩目等先前之問題,提供一種減少眩目之外觀與機械強度優異的防眩型之結晶太陽電池模組及作為其原材料之一之熱強化玻璃基板之製造方法。The purpose of the present invention is to solve the above-mentioned glare and other previous problems, and provide an anti-glare crystalline solar cell module with excellent appearance and mechanical strength that reduces glare, and a method for manufacturing a heat-strengthened glass substrate as one of its raw materials.

本發明係關於一種太陽電池模組及用於其之熱強化玻璃基板之製造方法。尤其關於一種於結晶太陽電池模組中用作受光面側之玻璃基板之經防眩處理之熱強化玻璃之製造方法。The present invention relates to a solar cell module and a method for manufacturing a thermally strengthened glass substrate used in the solar cell module. In particular, it relates to a method for manufacturing heat-strengthened glass with anti-glare treatment used as a glass substrate on the light-receiving side of a crystalline solar cell module.

本發明之第一方面係一種熱強化玻璃基板之製造方法,其包含:第一步驟,其係對未進行熱強化處理之玻璃基板之表面利用F46以上F220以下之JIS R6001-1:2017之粒度之研磨劑進行噴擊加工;第二步驟,其係藉由對經過上述第一步驟之玻璃基板利用#240以上#2000以下之JIS R6001-2:2017之粒度之研磨劑進行噴擊加工,形成使該玻璃基板之表面之算術平均粗糙度為0.5 μm以上5 μm以下、使該玻璃基板之表面之最大高度粗糙度為10 μm以上50 μm以下、使存在於該玻璃基板之表面之龜裂之面積未達1%,而形成有表面凹凸的玻璃基板;及第三步驟,其係對形成有上述表面凹凸之玻璃基板進行熱強化處理。The first aspect of the present invention is a method for manufacturing a heat-strengthened glass substrate, which includes: the first step of using the grain size of JIS R6001-1: 2017 above F46 and F220 on the surface of the glass substrate that has not been thermally strengthened The abrasive is sprayed; the second step is to spray the glass substrate after the first step with #240 above #2000 with JIS R6001-2: 2017 grit abrasives to form Make the arithmetic average roughness of the surface of the glass substrate be 0.5 μm or more and 5 μm or less, make the maximum height roughness of the surface of the glass substrate be 10 μm or more and 50 μm or less, and cause cracks existing on the surface of the glass substrate The area is less than 1%, and the glass substrate with surface irregularities is formed; and the third step is to heat-strengthen the glass substrate with the above-mentioned surface irregularities.

又,本發明係上述熱強化玻璃基板之製造方法,其中上述第一步驟中所使用之研磨劑係JIS R6001-1:2017之粒度為F46以上F100以下,上述第二步驟中所使用之研磨劑係JIS R6001-2:2017之粒度為#400以上#1000以下。In addition, the present invention is a method for manufacturing the above-mentioned thermally strengthened glass substrate, wherein the abrasive used in the first step is JIS R6001-1: 2017 with a particle size of F46 or more and F100 or less, and the abrasive used in the second step According to JIS R6001-2: 2017, the particle size is #400 or more and #1000 or less.

本發明之第二方面係一種熱強化玻璃基板之製造方法,其包含:第一步驟,其係對未進行熱強化處理之玻璃基板之表面利用F46以上F220以下之JIS R6001-1:2017之粒度之研磨劑、或#240以上#400以下之JIS R6001-2:2017之粒度之研磨劑進行噴擊加工;第二步驟,其係藉由對經過上述第一步驟之玻璃基板利用#600以上#2000以下之JIS R6001-2:2017之粒度之研磨劑進行噴擊加工,形成使該玻璃基板之表面之算術平均粗糙度為0.5 μm以上5 μm以下、使該玻璃基板之表面之最大高度粗糙度為10 μm以上50 μm以下、使存在於該玻璃基板之表面之龜裂之面積未達1%,而形成有表面凹凸的玻璃基板;及第三步驟,其係對形成有上述表面凹凸之玻璃基板進行熱強化處理。The second aspect of the present invention is a method for manufacturing a heat-strengthened glass substrate, which includes: the first step of using the grain size of JIS R6001-1: 2017 above F46 and F220 on the surface of the glass substrate that has not been thermally strengthened JIS R6001-2: 2017 grit abrasives, or #240 above#400 or less abrasives with a particle size of JIS R6001-2: 2017; the second step is to use #600 above# on the glass substrate that has passed through the first step. Abrasives with JIS R6001-2: 2017 particle size below 2000 are sprayed to form the arithmetic average roughness of the surface of the glass substrate to be 0.5 μm or more and 5 μm or less, and the maximum height roughness of the surface of the glass substrate The glass substrate is formed with surface irregularities when the area of the cracks existing on the surface of the glass substrate is less than 10 μm and 50 μm or less, and the area of the surface of the glass substrate is less than 1%; and the third step is to treat the glass with the above-mentioned surface irregularities The substrate is thermally strengthened.

又,本發明係上述熱強化玻璃基板之製造方法,其中上述第一步驟中所使用之研磨劑係JIS R6001-1:2017之粒度為F46以上F100以下、或JIS R6001-2:2017之粒度為#240以上#1000以下,上述第二步驟中所使用之研磨劑係JIS R6001-2:2017之粒度為#600以上#2000以下。In addition, the present invention is a method for manufacturing the above-mentioned thermally strengthened glass substrate, wherein the abrasive used in the first step is JIS R6001-1: 2017 with a particle size of F46 or more and F100 or less, or JIS R6001-2: 2017 has a particle size of #240 above#1000 or less, the abrasive used in the second step above is JIS R6001-2: 2017 with a particle size of #600 above#2000 or below.

再者,有時會以#代替表示於JIS R6001-1:2017之粒度之標準中應以F表示之粒度,例如存在將F80表述為#80售賣研磨粒之情形,故而需要留意。本發明之JIS R6001-1:2017之粒度為F46以上F100以下亦指以#代替表述之JIS R6001-1:2017之粒度為#46以上#100以下。In addition, sometimes # is used to replace the particle size indicated by F in the JIS R6001-1:2017 particle size standard. For example, F80 may be expressed as #80 for the sale of abrasive grains, so you need to pay attention. According to the present invention, the particle size of JIS R6001-1: 2017 is F46 or more and F100 or less, which also means that the particle size of JIS R6001-1: 2017 expressed by # is #46 or more and #100 or less.

又,本發明係上述熱強化玻璃基板之製造方法,其中上述熱強化處理之步驟之熱強化處理條件為如與熱強化處理後之玻璃基板之表面接觸之水分之pH值較與熱強化處理前之玻璃基板之表面接觸之水分之pH值減少的條件。In addition, the present invention is a method for manufacturing the above-mentioned heat-strengthened glass substrate, wherein the heat-strengthening treatment conditions of the step of the heat-strengthening treatment are as follows: Under the condition that the pH value of the water in contact with the surface of the glass substrate decreases.

又,本發明係一種太陽電池模組,其包含藉由上述製造方法製造而成之強化玻璃作為受光面側之覆蓋玻璃。In addition, the present invention is a solar cell module including the tempered glass manufactured by the above-mentioned manufacturing method as the cover glass on the light-receiving surface side.

又,本發明係一種熱強化玻璃基板之製造方法,其包含:第一步驟,其係對未進行熱強化處理之玻璃基板之表面利用F46以上F220以下之JIS R6001-1:2017之粒度之研磨劑、或#240以上#400以下之JIS R6001-2:2017之粒度之研磨劑進行噴擊加工; 第二步驟,其係藉由對經過上述第一步驟之玻璃基板利用#600以上#2000以下之JIS R6001-2:2017之粒度之研磨劑進行噴擊加工,形成使該玻璃基板之表面之算術平均粗糙度為0.5 μm以上5 μm以下、使該玻璃基板之表面之最大高度粗糙度為10 μm以上50 μm以下、使存在於該玻璃基板之表面之龜裂之面積未達1%,而形成有表面凹凸;及 第三步驟,其係對形成有上述表面凹凸之玻璃基板進行熱強化處理。In addition, the present invention is a method for manufacturing a heat-strengthened glass substrate, which includes: a first step, which is to grind the surface of the glass substrate without heat-strengthening treatment using the grain size of JIS R6001-1: 2017 above F46 and F220 JIS R6001-2: 2017 abrasives with particle size of #240 above#400 or less for spray processing; The second step is to process the glass substrate after the first step above with #600 above #2000 and below JIS R6001-2: 2017 grit abrasives to form arithmetic on the surface of the glass substrate The average roughness is 0.5 μm or more and 5 μm or less, the maximum height roughness of the surface of the glass substrate is 10 μm or more and 50 μm or less, and the area of the cracks existing on the surface of the glass substrate is less than 1%. Have surface irregularities; and The third step is to heat strengthen the glass substrate on which the above-mentioned surface irregularities are formed.

又,本發明係上述熱強化玻璃基板之製造方法,其中 上述第一步驟之噴擊加工為利用噴丸法之噴擊加工,所使用之研磨劑係JIS R6001-1:2017之粒度為F46以上F100以下, 上述第二步驟中所使用之研磨劑係JIS R6001-2:2017之粒度為#400以上#1000以下。In addition, the present invention is a method of manufacturing the above-mentioned thermally strengthened glass substrate, wherein The blasting process in the first step above is blasting using shot blasting. The abrasive used is JIS R6001-1:2017 with a particle size of F46 or more and F100 or less. The abrasive used in the above second step is JIS R6001-2: 2017 with a particle size of #400 or more and #1000 or less.

上述熱強化玻璃基板之製造方法中, 上述第一步驟之噴擊加工為利用空氣噴擊法之噴擊加工,所使用之研磨劑係JIS R6001-1:2017之粒度為F100以上F220以下、或JIS R6001-2:2017之粒度為#240以上#400以下, 上述第二步驟中所使用之研磨劑係JIS R6001-2:2017之粒度為#600以上#1000以下。In the above-mentioned method of manufacturing a thermally strengthened glass substrate, The blasting process in the first step above is blasting by air blasting. The abrasive used is JIS R6001-1: 2017 with a particle size of F100 or more and F220 or less, or JIS R6001-2: 2017 with a particle size of # Above 240# Below 400, The abrasive used in the above second step is JIS R6001-2: 2017 with a particle size of #600 or more and #1000 or less.

又,本發明係上述熱強化玻璃基板之製造方法,其中 上述熱強化處理之步驟之熱強化處理條件為如與熱強化處理後之玻璃基板之表面接觸之水分之pH值較與熱強化處理前之玻璃基板之表面接觸之水分之pH值減少的條件。In addition, the present invention is a method of manufacturing the above-mentioned thermally strengthened glass substrate, wherein The heat-strengthening treatment conditions of the above-mentioned heat-strengthening treatment step are the conditions that the pH value of the water contacting the surface of the glass substrate after the heat-strengthening treatment is lower than the pH value of the water contacting the surface of the glass substrate before the heat-strengthening treatment.

又,本發明係一種太陽電池模組,其包含藉由上述製造方法製造而成之強化玻璃作為受光面側之覆蓋玻璃。In addition, the present invention is a solar cell module including the tempered glass manufactured by the above-mentioned manufacturing method as the cover glass on the light-receiving surface side.

以下,就作為本發明之實施形態之具有微細之表面凹凸之熱強化玻璃基板之製造方法與使用該玻璃基板太陽電池模組之一態樣,對結晶系太陽電池模組進行說明。再者,只要於受光面側使用該玻璃基板,則當然亦可應用於鈣鈦礦型太陽電池或化合物型半導體太陽電池、及矽薄膜太陽電池等其他方式之太陽電池模組。Hereinafter, as an embodiment of the present invention, a method for manufacturing a thermally strengthened glass substrate with fine surface irregularities and one aspect of a solar cell module using the glass substrate will be described for a crystalline solar cell module. Furthermore, as long as the glass substrate is used on the light-receiving surface side, it can of course also be applied to other solar cell modules such as perovskite-type solar cells, compound-type semiconductor solar cells, and silicon thin-film solar cells.

[玻璃基板] 作為本發明之玻璃基板,可使用各種組成之玻璃。例如,作為代表性的玻璃,可列舉鈉鈣玻璃、硼矽酸玻璃等。[Glass base board] As the glass substrate of the present invention, glass of various compositions can be used. For example, as representative glass, soda lime glass, borosilicate glass, etc. can be cited.

本發明中可使用之玻璃之組成並不特別限定,作為一例,SiO2 為50~80重量%,Al2 O3 為0.1~10重量%,Na2 O+K2 O為1~30重量%,CaO為1~30重量%,MgO為0.1~10重量%,B2 O3 為0~20重量%。又,作為其他成分,亦可含有BaO、ZrO2 、Fe2 O3 。但是,於用作結晶太陽電池模組之受光面側之覆蓋玻璃之情形時,玻璃組成中之氧化鐵量較少者可提高近紅外區域之透過率,故而Fe2 O3 換算較佳為0.04重量%以下,進而較佳為0.02重量%以下。The composition of the glass that can be used in the present invention is not particularly limited. As an example, SiO 2 is 50 to 80% by weight, Al 2 O 3 is 0.1 to 10% by weight, Na 2 O+K 2 O is 1 to 30% by weight, and CaO It is 1 to 30% by weight, MgO is 0.1 to 10% by weight, and B 2 O 3 is 0 to 20% by weight. In addition, BaO, ZrO 2 , and Fe 2 O 3 may be contained as other components. However, when used as a cover glass on the light-receiving surface side of a crystalline solar cell module, the glass composition with less iron oxide can increase the transmittance in the near-infrared region, so the Fe 2 O 3 conversion is preferably 0.04 % By weight or less, more preferably 0.02% by weight or less.

作為玻璃之製造方法,並不特別限定,可藉由將玻璃原料以1500~1600℃加熱之後,成型加工為板狀而製造。The glass manufacturing method is not particularly limited, and it can be manufactured by heating the glass raw material at 1500 to 1600°C and then molding it into a plate shape.

玻璃之成型方法可使用各種方法,例如可列舉浮式法、滾壓法等。若使用滾壓法則可於玻璃基板表面形成壓紋狀之凹凸。Various methods can be used for the glass forming method, and examples thereof include a float method and a rolling method. If the rolling method is used, embossed unevenness can be formed on the surface of the glass substrate.

此種壓紋狀之凹凸於積層之結晶太陽電池模組等之受光面側之覆蓋玻璃中用於密封材側時,可增加與密封材之密接面積,故而可提高該太陽電池模組之可靠性。又,由於存在壓紋狀之凹凸,自受光面側入射之太陽光之行進方向於與密封材之界面相對於單元面向傾斜方向折射,藉此有可提高太陽電池模組之發電效率之可能性。When such embossed concavities and convexities are used in the cover glass on the light-receiving surface side of laminated crystalline solar cell modules, etc., when used on the side of the sealing material, the area of contact with the sealing material can be increased, so the reliability of the solar cell module can be improved. Sex. In addition, due to the embossed unevenness, the traveling direction of the sunlight incident from the light-receiving surface side is refracted at the interface with the sealing material in an oblique direction with respect to the cell surface, thereby increasing the power generation efficiency of the solar cell module. .

[微細之表面凹凸之形成] 可使用使氧化鋁粉體、二氧化矽粉體、碳化矽粉體等研磨材以高速與玻璃基板之表面碰撞之方法,於本發明之玻璃基板形成微細之表面凹凸。[Formation of fine surface irregularities] A method of causing abrasive materials such as alumina powder, silicon dioxide powder, and silicon carbide powder to collide with the surface of the glass substrate at high speed can be used to form fine surface irregularities on the glass substrate of the present invention.

具體而言,可列舉使用以壓縮機產生之壓縮空氣吹送至表面之噴砂法、自旋轉體利用離心力將研磨材投射至玻璃表面而產生微細之表面凹凸之噴丸法。又,亦可使用濕噴砂。Specifically, a sandblasting method using compressed air generated by a compressor to be blown to the surface, and a shot blasting method using a centrifugal force to project an abrasive material onto the glass surface by a spinning body to generate fine surface irregularities. In addition, wet sandblasting can also be used.

此處所使用之研磨材之JIS R6001-1:2017之粒度為F46以上F220以下,進而較佳為F46以上F100以下。The JIS R6001-1:2017 particle size of the abrasive used here is F46 or more and F220 or less, and more preferably F46 or more and F100 or less.

噴丸法中所使用之研磨材之JIS R6001-1:2017之粒度為F46以上F220以下,進而較佳為F46以上F100以下。 噴砂法中所使用之研磨材之JIS R6001-1:2017之粒度為F46以上F220以下,或JIS R6001-2:2017之粒度為#240以上#400以下,進而較佳為F100以上F220,及#240以上#400以下。進而較佳為#240以上#400以下。The JIS R6001-1:2017 particle size of the abrasive used in the shot blasting method is F46 or more and F220 or less, and more preferably F46 or more and F100 or less. The abrasive used in the sandblasting method has a particle size of JIS R6001-1: 2017 above F46 and below F220, or JIS R6001-2: 2017 with a particle size above #240 above #400 below, and more preferably F100 above F220, and # Above 240# Below 400. More preferably, it is #240 or more and #400 or less.

但是,於不符合該JIS標準之研磨材時,於使用該JIS標準之第3表-粗粒之標準粒度分佈之「第3段之試驗用篩:必須殘留於標稱網眼及篩上之最小質量分率」中所記載之標稱網眼之所有試驗用篩實施粒度分佈試驗的情形時,將殘留於標稱網眼及篩上之質量分率最大之標稱網眼之值設為該研磨材之粒度。However, when the abrasive material does not conform to the JIS standard, the test sieve in paragraph 3 of the table 3 of the JIS standard-the standard particle size distribution of coarse particles must be left on the nominal mesh and the sieve. When the particle size distribution test is performed on all test sieves of the nominal mesh described in the "Minimum Mass Fraction", the value of the nominal mesh with the largest mass fraction remaining on the nominal mesh and the sieve shall be set as The particle size of the abrasive.

圖1係本發明之製造方法中之第一步驟(第一噴擊加工)後之玻璃基板之模式性剖視圖。FIG. 1 is a schematic cross-sectional view of the glass substrate after the first step (first blasting process) in the manufacturing method of the present invention.

於以上述方法所形成之玻璃基板1之微細之表面凹凸2a~2d有可能殘留龜裂3a~3j,於熱強化處理時導致產生玻璃基板之破裂。或者,有使熱處理後之玻璃基板之機械強度明顯降低之可能性。The fine surface irregularities 2a-2d of the glass substrate 1 formed by the above-mentioned method may remain cracks 3a-3j, which may cause the glass substrate to crack during the heat strengthening treatment. Or, there is a possibility that the mechanical strength of the heat-treated glass substrate may be significantly reduced.

[殘留於玻璃基板之微細之表面凹凸之龜裂之去除] 此處,使用粒徑較用於形成玻璃基板1之微細之表面凹凸2a~2d之研磨材充分小之研磨劑,同樣地使用噴砂法或噴丸法等對玻璃基板表面1進行第二步驟(第二噴擊加工),藉此可於保持不使微細之表面凹凸2a~2d之形狀大幅度變化下,將殘留於該微細之表面凹凸2a~2d之龜裂去除。於使用噴砂法之方法中,為了去除殘留於玻璃基板之微細之表面凹凸之龜裂,相對於玻璃基板表面以小角度碰撞研磨材者較為有效,較佳為根據與研磨力之平衡設定為20°左右之角度。此處可使用之研磨材之粒度為#240以上#2000以下,進而較佳為#400以上#1000以下。進而較佳為#600以上#1000以下。[Removal of fine surface irregularities and cracks remaining on the glass substrate] Here, an abrasive having a particle size sufficiently smaller than the abrasive material used to form the fine surface irregularities 2a to 2d of the glass substrate 1 is used, and the second step is similarly performed on the glass substrate surface 1 using sandblasting or shot blasting. The second blasting process), by which the cracks remaining on the fine surface irregularities 2a-2d can be removed without greatly changing the shape of the fine surface irregularities 2a-2d. In the method using sandblasting, in order to remove the fine surface irregularities and cracks remaining on the glass substrate, it is more effective to collide with the abrasive material at a small angle relative to the surface of the glass substrate. It is better to set it to 20 based on the balance with the abrasive force. °The angle from left to right. The abrasive particles that can be used here have a particle size of #240 or more and #2000 or less, and more preferably #400 or more and #1000 or less. More preferably, it is #600 or more and #1000 or less.

該研磨材之粒度由JIS R6001-2:2017「研削磨石用研磨時之粒度-第2部:微粉」之該JIS之表5-精密研磨用微粉之標準粒度分佈(電阻試驗方法)規定。The particle size of the abrasive is specified by the JIS R6001-2: 2017 "Grinding Particle Size for Grinding Stones-Part 2: Micropowder" of the JIS Table 5-Standard Particle Size Distribution of Micropowder for Precision Grinding (Resistance Test Method).

但是,於不符合該JIS之標準即該JIS之表5-精密研磨用微粉之標準粒度分佈(電阻試驗方法)之研磨材之情形時,該研磨材之粒度可為該JIS標準中規定之電阻試驗方法中之累積高度50%點之粒子徑dS50所表示之值。However, in the case of abrasive materials that do not comply with the JIS standard, that is, Table 5 of the JIS, the standard particle size distribution (resistance test method) of fine powder for precision grinding, the particle size of the abrasive may be the resistance specified in the JIS standard The value represented by the particle diameter dS50 at the 50% point of the cumulative height in the test method.

圖2係本發明之製造方法中之第二步驟(第二噴擊加工)後之玻璃基板之模式性剖視圖。玻璃基板4之微細之表面凹凸5a~5d表示如下情況:以上述第一步驟(第一噴擊加工)形成之微細之表面凹凸2a~2d與要藉由第二步驟(第二噴擊加工)研磨者對應,藉由該第二步驟(第二噴擊加工),使殘留於上述步驟(第一噴擊加工)中形成之微細之表面凹凸(圖1之)2a~2d之龜裂3a~3j消失或使其大小減少。龜裂6a、6b表示該龜裂3a、3h之大小減少之情況。2 is a schematic cross-sectional view of the glass substrate after the second step (second blasting processing) in the manufacturing method of the present invention. The fine surface concavities and convexities 5a to 5d of the glass substrate 4 represent the following: the fine surface concavities and convexities 2a to 2d formed in the above-mentioned first step (first blasting process) and the second step (second blasting process) For the polisher, by the second step (second blasting processing), the fine surface irregularities (Figure 1) 2a to 2d remaining in the above step (first blasting processing) 2a-2d cracks 3a~ 3j disappears or reduces its size. The cracks 6a and 6b indicate that the size of the cracks 3a and 3h has decreased.

作為判斷是否可將殘留於玻璃基板之微細之表面凹凸之龜裂去除至所期望之比率之方法,可列舉測定利用光學顯微鏡觀察到之龜裂之面積之比率的方法。具體而言,於焦點位置例如以倍率100倍,於視野1000 μm×1000 μm以上之放大圖像中,根據來自於龜裂、因照射光之散射反射而觀察為白色之龜裂之區域之面積與相對於視野圖像區域之面積之比,可求出龜裂之面積之比率。又,藉由圖像處理設置明暗之閾值來求出龜裂之面積之比率的方法亦可作為簡便之方法利用。As a method of judging whether the fine surface irregularities and cracks remaining on the glass substrate can be removed to a desired ratio, a method of measuring the ratio of the area of the cracks observed with an optical microscope can be cited. Specifically, at the focal position, for example, at a magnification of 100 times, in an enlarged image with a field of view of 1000 μm×1000 μm or more, based on the area of the area where the crack is observed as a white crack due to the scattering and reflection of the irradiated light The ratio of the area relative to the image area of the field of view can be calculated as the ratio of the area of the crack. In addition, the method of determining the ratio of the area of the cracks by setting the threshold of light and dark by image processing can also be used as a simple method.

於上述方法中,可使微細之表面凹凸形成於玻璃基板之表面,使太陽光於玻璃表面漫反射,降低相對於太陽光之入射角正反射之光之強度,進而,使太陽之像之映入消失。作為相對於太陽光之入射角之正反射之光之強度之指標,可使用光澤度。光澤度係利用依據JIS Z8741-1997中所記載之鏡面光澤度測定方法之方法來測定,於入射角60度、測定角60度時,較佳為至少10以下,進而較佳為5以下。In the above method, the fine surface irregularities can be formed on the surface of the glass substrate, so that the sunlight is diffusely reflected on the glass surface, and the intensity of the regular reflection light relative to the incident angle of the sunlight is reduced, and the image of the sun can be reflected. Into disappear. As an indicator of the intensity of regular reflection light relative to the incident angle of sunlight, glossiness can be used. The gloss is measured by a method based on the specular gloss measurement method described in JIS Z8741-1997, and when the incident angle is 60 degrees and the measurement angle is 60 degrees, it is preferably at least 10 or less, and more preferably 5 or less.

映入之測定係相對於玻璃基板以法線角度60度目視觀察於黑窗簾中點亮之鹵素燈,判別是否可確認鹵素燈之燈絲。The measurement of reflection is to visually observe the halogen lamp lit in the black curtain at a normal angle of 60 degrees relative to the glass substrate to determine whether the filament of the halogen lamp can be confirmed.

為了有效地體現該等效果,玻璃基板之表面凹凸之形狀係表面之算術平均粗糙度為0.5 μm以上5 μm以下,表面之最大高度粗糙度為10 μm以上50 μm以下。較佳為算術平均粗糙度為0.5 μm~3 μm,最大高度粗糙度為10 μm以上~40 μm以下。In order to effectively embody these effects, the surface roughness of the glass substrate should have an arithmetic average roughness of 0.5 μm or more and 5 μm or less, and the maximum height roughness of the surface should be 10 μm or more and 50 μm or less. Preferably, the arithmetic average roughness is 0.5 μm to 3 μm, and the maximum height roughness is 10 μm or more and 40 μm or less.

上述算術平均粗糙度及最大高度粗糙度係根據JIS B0601,藉由利用接觸式表面粗糙度計測定而獲得。此處使用之截止值λc設為0.08 mm。亦可同樣地使用雷射顯微鏡等光學測定設備,測定上述算術平均粗糙度及最大高度粗糙度。又,於線粗糙度測定中,於測定值相對於樣品表面中之測定部位及測定方向之誤差較大之情形時,較佳為使用雷射顯微鏡等光學測定設備應用ISO 25178,測定面粗糙度。同樣地測定中之截止值設為0.08 mm。於該情形時,將所得之面粗糙度之參數即算術平均高度及最大高度之值分別用作線粗糙度之參數即算術平均粗糙度及最大高度粗糙度之值。The above-mentioned arithmetic average roughness and maximum height roughness are obtained by measuring with a contact surface roughness meter in accordance with JIS B0601. The cutoff value λc used here is set to 0.08 mm. It is also possible to measure the above-mentioned arithmetic average roughness and maximum height roughness by using optical measuring equipment such as a laser microscope in the same way. In addition, in line roughness measurement, when the measurement value has a large error with respect to the measurement location and measurement direction on the sample surface, it is preferable to use an optical measurement device such as a laser microscope to apply ISO 25178 to measure the surface roughness . Similarly, the cut-off value in the measurement is set to 0.08 mm. In this case, the obtained surface roughness parameters, namely the arithmetic mean height and maximum height, are used as the line roughness parameters, namely the arithmetic mean roughness and maximum height roughness values, respectively.

[熱強化處理] 熱強化處理係將玻璃基板加熱至其軟化溫度附近之後,對玻璃表面吹送空氣使之急冷而製作。[Heat Strengthening Treatment] The thermal strengthening process is produced by heating the glass substrate to the vicinity of its softening temperature, and then blowing air on the glass surface to quench it.

圖3係本發明之製造方法中之熱強化處理後之玻璃基板之模式性剖視圖。基板7之微細之表面凹凸8a~8d與上述第二步驟(第二噴擊加工)中所形成之微細之表面凹凸5a~5d經熱強化處理而成者對應。Fig. 3 is a schematic cross-sectional view of the glass substrate after thermal strengthening in the manufacturing method of the present invention. The fine surface concavities and convexities 8a-8d of the substrate 7 correspond to the fine surface concavities and convexities 5a-5d formed in the second step (the second blasting process) that have been thermally strengthened.

於具有微細之表面凹凸之玻璃基板中,有與玻璃基板表面之接觸水分之pH值增加之傾向。其原因可說明為玻璃基板之組成中之Na離子與水分之氫離子發生交換。又,若處於玻璃基板表面之水分之pH值超過9,則有其本身將玻璃基板溶解之情形,玻璃表面之外觀大幅度受損。因此,處於玻璃基板表面之水分之pH值較理想為未達9,較佳為8~7,進而較佳為7。In a glass substrate with fine surface irregularities, there is a tendency for the pH value of the contact moisture on the surface of the glass substrate to increase. The reason can be explained as the exchange of Na ions and water hydrogen ions in the composition of the glass substrate. In addition, if the pH value of the water on the surface of the glass substrate exceeds 9, it may dissolve the glass substrate by itself, and the appearance of the glass surface is greatly impaired. Therefore, the pH value of the water on the surface of the glass substrate is preferably less than 9, preferably 8-7, and more preferably 7.

藉由對具有微細之表面凹凸之玻璃基板進行熱強化處理,可降低與玻璃基板表面接觸之水分之pH值。藉此,可抑制於保管該玻璃基板時或保管使用該玻璃基板之太陽電池模組時之冷凝導致該玻璃基板表面產生外觀變化。又,殘留於具有微細之表面凹凸之玻璃基板之龜裂之比率較小,則與熱強化後之玻璃基板表面接觸之水分之pH值會變得更小,較為有利。作為殘留於具有微細之表面凹凸之玻璃基板之龜裂之比率,較理想為至少未達10%,較佳為未達5%。進而較佳為未達1%。By thermally strengthening the glass substrate with fine surface irregularities, the pH value of the moisture in contact with the surface of the glass substrate can be reduced. Thereby, it is possible to prevent condensation on the surface of the glass substrate from causing changes in the appearance of the glass substrate when the glass substrate is stored or when the solar cell module using the glass substrate is stored. In addition, if the ratio of the cracks remaining on the glass substrate with fine surface irregularities is smaller, the pH value of the moisture in contact with the surface of the glass substrate after heat strengthening becomes smaller, which is more advantageous. The ratio of the cracks remaining on the glass substrate with fine surface irregularities is preferably at least less than 10%, and more preferably less than 5%. More preferably, it is less than 1%.

作為使水分與玻璃基板表面接觸,測定該玻璃表面之水分之pH值與其外觀之試驗方法之一,可列舉於具有上述微細之表面凹凸之玻璃基板與15 cm×15 cm尺寸之聚乙烯製緩衝材(製品名Air Cap等)之間,將2 ml之蒸餾水保持12小時,進行該水分之pH值測定與外觀確認之濕潤試驗。As one of the test methods to measure the pH value and appearance of the water on the surface of the glass substrate by contacting moisture with the surface of the glass substrate, it can be exemplified in the glass substrate with the above-mentioned fine surface irregularities and a 15 cm×15 cm size polyethylene buffer Keep 2 ml of distilled water for 12 hours between materials (product name Air Cap, etc.), and perform a wetness test for pH measurement and appearance confirmation of the water.

熱強化處理時之玻璃基板之溫度越高,又,其保持時間越長,越容易體現上述熱強化處理之效果。The higher the temperature of the glass substrate during thermal strengthening, and the longer its holding time, the easier it is to realize the effect of the above thermal strengthening treatment.

[太陽電池模組之基本性構成及製作方法] 圖4係本發明之一實施形態之防眩型結晶太陽電池模組之模式性剖視圖。[Basic composition and manufacturing method of solar cell module] Fig. 4 is a schematic cross-sectional view of an anti-glare type crystalline solar cell module according to an embodiment of the present invention.

於結晶太陽電池單元14a~14d之受光面側,配置有本發明之具有微細之表面凹凸之經熱強化之玻璃基板11,於背面側配置有保護材16。於具有微細之表面凹凸之經熱強化之玻璃基板11與背面側保護材16之間設置有密封材12、15,藉由密封材將結晶太陽電池單元14a~14d密封。具有微細之表面凹凸之經熱強化之玻璃基板11係於受光面側之表面設置有該微細之表面凹凸。On the light-receiving surface side of the crystalline solar battery cells 14a-14d, the heat-strengthened glass substrate 11 with fine surface irregularities of the present invention is arranged, and the protective material 16 is arranged on the back side. Sealing materials 12 and 15 are provided between the heat-strengthened glass substrate 11 having fine surface irregularities and the back side protection material 16, and the crystalline solar battery cells 14a-14d are sealed by the sealing material. The heat-strengthened glass substrate 11 having fine surface irregularities is provided with the fine surface irregularities on the light-receiving surface side.

於防眩型結晶太陽電池模組10之製作中,經由導電性構件13a~13e電性連接有結晶太陽電池單元14a~14d。In the production of the anti-glare type crystalline solar cell module 10, the crystalline solar cell units 14a-14d are electrically connected via the conductive members 13a-13e.

將如此連接之結晶太陽電池單元14a~14d經由密封材12、15夾持於受光面側之具有微細之表面凹凸之經熱強化之玻璃基板11及背面側保護材16,形成防眩型結晶太陽電池模組。此時,如圖4所示,較佳為於與具有微細之表面凹凸之熱強化之玻璃基板11之受光面側相反的面上,依次積層密封材12、結晶太陽電池單元14a~14d、密封材15及背面側保護材16形成為積層體。然後,較佳為藉由以特定條件加熱上述積層體,使密封材12、15硬化。而且,藉由安裝鋁框架(未圖示)等,可製成防眩型結晶太陽電池模組10。加熱積層體時之條件較佳為溫度140℃~160℃,時間3分鐘~18分鐘,壓力90 kPa~120 kPa。The crystalline solar battery cells 14a-14d connected in this way are sandwiched between the light-receiving surface side heat-strengthened glass substrate 11 with fine surface irregularities and the back side protective material 16 through the sealing materials 12, 15 to form an anti-glare crystalline solar Battery module. At this time, as shown in FIG. 4, it is preferable to sequentially laminate the sealing material 12, the crystalline solar battery cells 14a-14d, and the sealing material on the surface opposite to the light-receiving surface side of the heat-strengthened glass substrate 11 with fine surface irregularities. The material 15 and the back side protection material 16 are formed as a laminate. Then, it is preferable to harden the sealing materials 12 and 15 by heating the laminate under specific conditions. Furthermore, by installing an aluminum frame (not shown), etc., an anti-glare type crystalline solar cell module 10 can be made. The conditions for heating the laminate are preferably a temperature of 140°C to 160°C, a time of 3 minutes to 18 minutes, and a pressure of 90 kPa to 120 kPa.

較佳為背面側保護材16配置於結晶太陽電池單元14a~14d各者之背面側,保護防眩型結晶太陽電池模組10之背面。作為背面側保護材16,可使用聚對苯二甲酸乙二酯(PET)等樹脂膜、具有以樹脂膜夾入鋁箔而成之構造之積層膜、玻璃基板等。It is preferable that the back side protection material 16 is arranged on the back side of each of the crystalline solar battery cells 14a to 14d to protect the back side of the anti-glare type crystalline solar battery module 10. As the back side protective material 16, a resin film such as polyethylene terephthalate (PET), a laminated film having a structure in which aluminum foil is sandwiched by a resin film, a glass substrate, etc. can be used.

密封材12、15於具有微細之表面凹凸之熱強化之玻璃基板11與背面側保護材16之間將結晶太陽電池單元14a~14d密封。作為密封材,可使用乙烯-乙酸乙烯酯共聚樹脂(EVA)、乙烯-丙烯酸乙酯共聚樹脂(EEA)、聚乙烯醇縮丁醛樹脂(PVB)、矽酮、胺基甲酸酯、丙烯酸、環氧等透光性之樹脂。The sealing materials 12 and 15 seal the crystalline solar battery cells 14a-14d between the heat-strengthened glass substrate 11 having fine surface irregularities and the backside protection material 16. As the sealing material, ethylene-vinyl acetate copolymer resin (EVA), ethylene-ethyl acrylate copolymer resin (EEA), polyvinyl butyral resin (PVB), silicone, urethane, acrylic, Translucent resin such as epoxy.

作為密封材12、15,亦可使用烯烴系密封材。烯烴系密封材由於與包含EVA等之密封材相比水蒸氣透過率較低,故而可抑制水向模組內滲入。因此,可防止絕緣性構件等劣化,可提高模組之可靠性。As the sealing materials 12 and 15, olefin-based sealing materials may also be used. Since the olefin-based sealing material has a lower water vapor transmission rate than a sealing material containing EVA, etc., it can suppress the penetration of water into the module. Therefore, deterioration of insulating members and the like can be prevented, and the reliability of the module can be improved.

作為烯烴系密封材之材料,可使用非交聯烯烴及交聯烯烴之任一者。非交聯烯烴與交聯烯烴相比更柔軟。因此,於使太陽電池模組彎曲為曲面形狀使用之情形時,可靈活運用烯烴系密封材之材料。例如,於在模組化後使太陽電池模組彎曲之情形時,可較佳地使用非交聯烯烴,另一方面,於在彎曲之狀態下製作模組之情形時,可較佳地使用交聯烯烴。As the material of the olefin-based sealing material, any of non-crosslinked olefins and crosslinked olefins can be used. Non-crosslinked olefins are softer than crosslinked olefins. Therefore, when the solar cell module is bent into a curved shape for use, the material of the olefin-based sealing material can be flexibly used. For example, when the solar cell module is bent after modularization, non-crosslinked olefins can be preferably used. On the other hand, when the module is manufactured in a bent state, it can be preferably used. Cross-linked olefins.

如以上所述可製作防眩型結晶太陽電池模組10,但太陽電池模組之基本性構成及製作方法並不限定於上述。The anti-glare crystalline solar cell module 10 can be manufactured as described above, but the basic structure and manufacturing method of the solar cell module are not limited to the above.

[太陽電池模組之構成] 於本發明中,作為結晶太陽電池模組,只要為光電轉換部具備結晶矽基板者,則可使用任意之結晶矽系太陽電池模組。[Composition of solar cell module] In the present invention, as the crystalline solar cell module, any crystalline silicon-based solar cell module can be used as long as the photoelectric conversion portion has a crystalline silicon substrate.

於結晶矽系太陽電池模組之一形態中,藉由於一導電型(p型或n型)之結晶矽基板之受光面側,使磷原子等導電性雜質擴散,形成相反導電型(n型或p型)之矽層,而形成包含半導體接面之光電轉換部。於此種擴散型之結晶矽太陽電池中未形成透明電極層,故而於包含半導體接面之光電轉換部上形成集電極。In one form of the crystalline silicon solar cell module, the light-receiving surface side of a crystalline silicon substrate of one conductivity type (p-type or n-type) diffuses conductive impurities such as phosphorous atoms to form an opposite conductivity type (n-type). Or p-type) silicon layer to form a photoelectric conversion part including a semiconductor junction. In this diffusion type crystalline silicon solar cell, a transparent electrode layer is not formed, so a collector electrode is formed on the photoelectric conversion part including the semiconductor junction.

再者,於所謂異質接面結晶矽系太陽電池模組之一形態中,藉由於一導電型(n型或p型)之結晶矽基板之受光面側,利用CVD(Chemical Vapor Deposition,化學氣相沈積)法等形成相反導電型(p型或n型)之矽層,於受光面側形成半導體接面。又,進而於上述一導電型(n型或p型)之結晶矽基板之受光面側,利用CVD法等形成相同導電型(n型或p型)之矽層之太陽電池模組亦可列舉為一例。於此種異質接面型之結晶矽太陽電池中,亦形成集電極。Furthermore, in one form of the so-called heterojunction crystalline silicon solar cell module, due to the light-receiving side of a conductive (n-type or p-type) crystalline silicon substrate, CVD (Chemical Vapor Deposition, chemical vapor deposition) is used. Phase deposition) method to form a silicon layer of opposite conductivity type (p-type or n-type) to form a semiconductor junction on the light-receiving surface side. Furthermore, solar cell modules in which a silicon layer of the same conductivity type (n-type or p-type) is formed by CVD method or the like on the light-receiving surface side of the above-mentioned conductivity type (n-type or p-type) crystalline silicon substrate can also be cited As an example. In this heterogeneous junction type crystalline silicon solar cell, a collector is also formed.

(集電極) 集電極亦可包含複數個指狀電極、及將藉由指狀電極收集之電流集中之匯流排電極。一般而言,匯流排電極以與指狀電極大致正交之方式形成。(collector) The collector may also include a plurality of finger electrodes and a bus electrode that concentrates the current collected by the finger electrodes. In general, the bus bar electrode is formed substantially orthogonal to the finger electrode.

指狀電極間之距離、指狀電極之寬度及匯流排電極之寬度等可根據形成於光電轉換部之受光面側之透明電極層之電阻適當選擇。The distance between the finger electrodes, the width of the finger electrodes and the width of the bus bar electrodes can be appropriately selected according to the resistance of the transparent electrode layer formed on the light-receiving surface side of the photoelectric conversion part.

作為集電極之形成材料,可使用含有黏合劑樹脂等之膏等。為了使藉由網版印刷法形成之集電極之導電性充分提高,較理想為藉由熱處理使集電極硬化。因此,作為包含於膏中之黏合劑樹脂,較佳為使用可於乾燥溫度下硬化之材料,可應用環氧系樹脂、酚系樹脂、丙烯酸系樹脂等。As the forming material of the collector, a paste containing a binder resin or the like can be used. In order to sufficiently improve the conductivity of the collector formed by the screen printing method, it is preferable to harden the collector by heat treatment. Therefore, as the binder resin contained in the paste, it is preferable to use a material that can be cured at a drying temperature, and epoxy resin, phenol resin, acrylic resin, etc. can be used.

集電極可藉由噴墨法、網版印刷法、導線接著法、噴霧法、真空蒸鍍法、濺鍍法、鍍覆法等公知之方法形成。例如,可使用與圖案形狀對應之遮罩,藉由真空蒸鍍法或濺鍍法形成集電極。其中,由於能夠實現細線化,故而較佳為藉由鍍覆法形成集電極。The collector electrode can be formed by a known method such as an inkjet method, a screen printing method, a wire bonding method, a spray method, a vacuum evaporation method, a sputtering method, and a plating method. For example, a mask corresponding to the pattern shape can be used to form the collector electrode by a vacuum evaporation method or a sputtering method. Among them, since the wire can be thinned, it is preferable to form the collector electrode by a plating method.

(背面電極) 於背面側之透明電極層上形成背面電極。與受光面側之集電極同樣地於背面側之透明電極層之表面設置背面電極(作為輔助電極之金屬電極),藉此可提高電流之取出效率。(Back electrode) A back electrode is formed on the transparent electrode layer on the back side. In the same way as the collector electrode on the light-receiving surface side, a back electrode (a metal electrode serving as an auxiliary electrode) is provided on the surface of the transparent electrode layer on the back side to improve current extraction efficiency.

作為背面電極,較理想為使用近紅外至紅外區域之光之反射率較高且導電性或化學穩定性較高之材料。作為滿足此種特性之材料,可列舉銀或鋁等。背面電極之製膜方法並不特別限定,可應用濺鍍法或真空蒸鍍法等物理氣相沈積法、網版印刷等印刷法、鍍覆法等。As the back electrode, it is more desirable to use a material with high reflectivity of light in the near infrared to infrared region and high electrical conductivity or chemical stability. As a material satisfying such characteristics, silver or aluminum can be cited. The film forming method of the back electrode is not particularly limited, and a physical vapor deposition method such as a sputtering method or a vacuum vapor deposition method, a printing method such as screen printing, a plating method, etc. can be applied.

背面電極用作與受光面為相反側之集電極,故而亦可以覆蓋光電轉換部之整個面之方式形成。又,亦可與受光面側之集電極同樣地將背面電極形成為圖案狀。The back electrode is used as a collector electrode on the opposite side to the light-receiving surface, so it can also be formed to cover the entire surface of the photoelectric conversion part. In addition, the back electrode may be formed in a pattern like the collector electrode on the light-receiving surface side.

以上,本發明之太陽電池模組只要為包含受光面側之覆蓋玻璃者則可為任意太陽電池模組,以上構成本發明之太陽電池模組之太陽電池單元為包含結晶矽基板者或鈣鈦礦型、化合物型等,並不特別限定。 [實施例]Above, the solar cell module of the present invention can be any solar cell module as long as it includes the cover glass on the light-receiving surface side. The solar cell units constituting the solar cell module of the present invention above are those containing a crystalline silicon substrate or perovskite The mineral type, compound type, etc. are not particularly limited. [Example]

(實施例1) 準備大小為300 mm×333 mm×厚3.2 mm,且包含SiO2 為71~73重量%,Al2 O3 為0.6~1.5重量%,Na2 O+K2 O為13.5~15重量%,CaO為8~10重量%,MgO為3~4.5重量%,SO3 未達0.5重量%,Fe2 O3 未達0.015重量%之組成,於受光面之相反側具有壓紋之型板玻璃基板(非強化)。(Example 1) The preparation size is 300 mm×333 mm×thickness 3.2 mm, and contains 71 to 73% by weight of SiO 2 , 0.6 to 1.5% by weight of Al 2 O 3 , and 13.5 to 15 % by weight of Na 2 O+K 2 O %, CaO is 8-10% by weight, MgO is 3-4.5% by weight, SO 3 is less than 0.5% by weight, and Fe 2 O 3 is less than 0.015% by weight. The template is embossed on the opposite side of the light-receiving surface Glass substrate (non-reinforced).

對該玻璃基板之受光面側,使用白色熔融氧化鋁製之具有符合JIS R6001-1:2017「研削磨石用時之粒度-第1部:粗粒」之粒度分佈、且與該JIS之第3表-粗粒之標準粒度分佈之粒度F80對應的研磨材(中心粒徑180 μm~150 μm)實施第一步驟之噴擊加工,於該玻璃基板之表面(表面)側形成微細之表面凹凸。表1表示所獲得之玻璃基板之微細之凹凸之算術平均粗糙度、最大高度粗糙度、龜裂之面積之比率、光澤度、及映入之狀態。The light-receiving surface side of the glass substrate is made of white fused alumina and has a particle size distribution that conforms to JIS R6001-1: 2017 "Grinding for Grinding Stones-Part 1: Coarse Grains", and is consistent with the JIS No. Table 3-The abrasive material corresponding to the standard particle size distribution of coarse-grained F80 (center particle size 180 μm~150 μm) is subjected to the first step of blasting processing to form fine surface unevenness on the surface (surface) side of the glass substrate . Table 1 shows the arithmetic average roughness, the maximum height roughness, the ratio of the area of the cracks, the glossiness, and the state of reflection of the fine concavities and convexities of the obtained glass substrate.

對上述形成有微細之表面凹凸之玻璃基板,使用白色熔融氧化鋁製之具有符合JIS R6001-2:2017「研削磨石用研磨時之粒度-第2部:微粉」之粒度分佈、且與該JIS之表5-精密研磨用微粉之標準粒度分佈(電阻試驗方法)之粒度#800對應之研磨材(中心粒徑14 μm)實施第二噴擊加工,將殘留於該玻璃基板之微細之表面凹凸之龜裂去除。根據表1得知,雖然算術平均粗糙度、及最大高度粗糙度大小稍微變小,但是玻璃基板表面之光澤度之值自6.5減少至4.4,進而映入消失,並且將該微細之表面凹凸之龜裂之面積之比率降低至0.2%。For the above-mentioned glass substrate with fine surface irregularities, a white fused alumina made of white fused alumina with a particle size distribution that complies with JIS R6001-2: 2017 "Grinding Grinding Stones for Grinding-Part 2: Micropowder" is used. JIS Table 5-Standard particle size distribution of fine powder for precision polishing (resistance test method) The particle size #800 corresponding to the abrasive material (center particle size 14 μm) is subjected to the second blasting process, and the residue is left on the fine surface of the glass substrate Removal of bumps and cracks. According to Table 1, although the arithmetic average roughness and the maximum height roughness are slightly smaller, the gloss value of the glass substrate surface is reduced from 6.5 to 4.4, and then the reflection disappears, and the fine surface unevenness The ratio of cracked area is reduced to 0.2%.

由於所獲得之玻璃基板之微細之表面凹凸之算術平均粗糙度及最大高度粗糙度之測定於測定方向上誤差大,故而根據ISO 25178設為面粗糙度之測定值。使用KEYENCE製VK9700雷射顯微鏡,自94 μm×71 μm之區域之雷射像求出算術平均高度及最大高度,分別設為算術平均粗糙度及最大高度粗糙度之值。截止值設為0.08 mm。Since the measurement of the arithmetic average roughness and maximum height roughness of the obtained glass substrate has a large error in the measurement direction, it is set as the measurement value of the surface roughness according to ISO 25178. Using the VK9700 laser microscope manufactured by KEYENCE, calculate the arithmetic average height and the maximum height from the laser image in the area of 94 μm×71 μm, and set them as the values of the arithmetic average roughness and the maximum height roughness respectively. The cut-off value is set to 0.08 mm.

所獲得之殘留於玻璃基板之微細之表面凹凸的龜裂之面積之比率係使用KEYENCE製VK9700雷射顯微鏡,對1414 μm×1061 μm大小之放大至約100倍之光學像進行圖像處理,求出來自殘留於玻璃基板之微細之表面凹凸之龜裂、因照射光之散射反射而以白色被觀察到之龜裂之區域之比率。The ratio of the area of the obtained fine surface irregularities and cracks remaining on the glass substrate is obtained by using a VK9700 laser microscope manufactured by KEYENCE to perform image processing on an optical image of 1414 μm×1061 μm magnified to approximately 100 times. The ratio of the cracks from the fine surface irregularities remaining on the glass substrate and the area where the cracks are observed in white due to the scattering and reflection of the irradiated light.

光澤度之測定係使用日本電色製手持型光澤度計PG-II,以入射角60度、測定角60度實施測定。The measurement of gloss was performed using a hand-held gloss meter PG-II manufactured by Nippon Denshoku Co., Ltd. at an incident angle of 60 degrees and a measurement angle of 60 degrees.

熱強化處理係於將上述玻璃基板加熱至大致650℃之後,對玻璃表面吹送空氣使其急冷而實施。The heat strengthening treatment is implemented after heating the above-mentioned glass substrate to approximately 650°C, and then blowing air to the glass surface to quench it.

如表1所示,於熱強化處理前後,具有上述微細之表面凹凸之玻璃基板之算術平均粗糙度、最大粗糙度、及龜裂之面積之比率未觀察到變化。然而,可知濕潤試驗後之pH值自9~8減少至7,並且濕潤試驗後之具有該微細之表面凹凸之玻璃基板表面之外觀改善。 (實施例2-1) 準備與實施例1相同之型板玻璃基板(非強化)。As shown in Table 1, before and after the heat strengthening treatment, no changes were observed in the arithmetic average roughness, the maximum roughness, and the ratio of the cracked area of the glass substrate with the above-mentioned fine surface irregularities. However, it can be seen that the pH value after the wet test decreased from 9 to 8 to 7, and the appearance of the glass substrate surface with the fine surface irregularities after the wet test improved. (Example 2-1) The same stencil glass substrate (non-strengthened) as in Example 1 was prepared.

對該玻璃基板之受光面側,使用白色熔融氧化鋁製之具有符合JIS R6001-2:2017「研削磨石用研磨時之粒度-第2部:微粉」之粒度分佈、且與該JIS之表5-精密研磨用微粉之標準粒度分佈(電阻試驗方法)之粒度#400對應之研磨材(中心粒徑30 μm)實施第一空氣噴擊加工,於該玻璃基板之表面(表面)側形成微細之表面凹凸。表2表示所獲得之玻璃基板之微細之凹凸之算術平均粗糙度、最大高度粗糙度、龜裂之面積之比率、光澤度、及映入之狀態。The light-receiving surface side of the glass substrate is made of white fused alumina and has a particle size distribution that conforms to JIS R6001-2: 2017 "Grinding Grinding Stones for Grinding-Part 2: Micropowder", and is consistent with the JIS table 5-Standard particle size distribution of fine powder for precision grinding (resistance test method) The particle size #400 corresponding to the abrasive material (center particle size 30 μm) is subjected to the first air jet processing to form fine particles on the surface (surface) side of the glass substrate The surface is uneven. Table 2 shows the arithmetic average roughness, maximum height roughness, ratio of cracked area, glossiness, and reflection state of the fine concavity and convexity of the obtained glass substrate.

對上述形成有微細之表面凹凸之玻璃基板,使用白色熔融氧化鋁製之具有符合JIS R6001-2:2017「研削磨石用研磨時之粒度-第2部:微粉」之粒度分佈、且與該JIS之表5-精密研磨用微粉之標準粒度分佈(電阻試驗方法)之粒度#800對應之研磨材(中心粒徑14 μm)實施第二空氣噴擊加工,將殘留於該玻璃基板之微細之表面凹凸之龜裂去除。根據表1得知,雖然算術平均粗糙度、及最大高度粗糙度大小稍微變小,但玻璃基板表面之光澤度之值自4.5減少至1.7,進而映入消失,並且將該微細之表面凹凸之龜裂之面積之比率降低至0.2%。For the above-mentioned glass substrate with fine surface irregularities, a white fused alumina made of white fused alumina with a particle size distribution that complies with JIS R6001-2: 2017 "Grinding Grinding Stones for Grinding-Part 2: Micropowder" is used. Table 5 of JIS standard particle size distribution (resistance test method) of fine grinding powder (resistance test method), particle size #800 corresponding to the abrasive material (center particle size 14 μm) is subjected to the second air jet processing, and the fine particles remaining on the glass substrate Removal of uneven surface cracks. According to Table 1, although the arithmetic average roughness and the maximum height roughness are slightly smaller, the gloss value of the glass substrate surface is reduced from 4.5 to 1.7, and then the reflection disappears, and the fine surface unevenness The ratio of cracked area is reduced to 0.2%.

如表2所示,於熱強化處理前後,具有上述微細之表面凹凸之玻璃基板之算術平均粗糙度、最大粗糙度、及龜裂之面積之比率未觀察到變化。然而,可知濕潤試驗後之pH值自8減少至7,並且濕潤試驗後之具有該微細之表面凹凸之玻璃基板表面之外觀改善。 (實施例2-2) 準備與實施例1相同之型板玻璃基板(非強化)。As shown in Table 2, before and after the heat strengthening treatment, no changes were observed in the arithmetic average roughness, the maximum roughness, and the ratio of the cracked area of the glass substrate with the above-mentioned fine surface irregularities. However, it can be seen that the pH value after the wet test decreased from 8 to 7, and the appearance of the glass substrate surface with the fine surface irregularities after the wet test improved. (Example 2-2) The same stencil glass substrate (non-strengthened) as in Example 1 was prepared.

對該玻璃基板之受光面側,使用白色熔融氧化鋁製之具有符合JIS R6001-2:2017「研削磨石用研磨時之粒度-第2部:微粉」之粒度分佈、且與該JIS之表5-精密研磨用微粉之標準粒度分佈(電阻試驗方法)之粒度#320對應之研磨材(中心粒徑40 μm)實施第一空氣噴擊加工,於該玻璃基板之表面(表面)側形成微細之表面凹凸。表2表示所獲得之玻璃基板之微細之凹凸之算術平均粗糙度、最大高度粗糙度、龜裂之面積之比率、光澤度、及映入之狀態。The light-receiving surface side of the glass substrate is made of white fused alumina and has a particle size distribution that conforms to JIS R6001-2: 2017 "Grinding Grinding Stones for Grinding-Part 2: Micropowder", and is consistent with the JIS table 5-Standard particle size distribution of fine powder for precision grinding (resistance test method) The particle size #320 corresponding to the abrasive material (central particle size 40 μm) is subjected to the first air jet processing to form fine particles on the surface (surface) side of the glass substrate The surface is uneven. Table 2 shows the arithmetic average roughness, maximum height roughness, ratio of cracked area, glossiness, and reflection state of the fine concavity and convexity of the obtained glass substrate.

對上述形成有微細之表面凹凸之玻璃基板,使用白色熔融氧化鋁製之具有符合JIS R6001-2:2017「研削磨石用研磨時之粒度-第2部:微粉」之粒度分佈、且與該JIS之表5-精密研磨用微粉之標準粒度分佈(電阻試驗方法)之粒度#800對應之研磨材(中心粒徑14 μm)實施第二空氣噴擊加工,將殘留於該玻璃基板之微細之表面凹凸之龜裂去除。根據表1得知,雖然算術平均粗糙度、及最大高度粗糙度大小稍微變小,但玻璃基板表面之光澤度之值自4.5減少至1.6,進而映入消失,並且將該微細之表面凹凸之龜裂之面積之比率降低至0.2%。For the above-mentioned glass substrate with fine surface irregularities, a white fused alumina made of white fused alumina with a particle size distribution that complies with JIS R6001-2: 2017 "Grinding Grinding Stones for Grinding-Part 2: Micropowder" is used. Table 5 of JIS standard particle size distribution (resistance test method) of fine grinding powder (resistance test method), particle size #800 corresponding to the abrasive material (center particle size 14 μm) is subjected to the second air jet processing, and the fine particles remaining on the glass substrate Removal of uneven surface cracks. According to Table 1, although the arithmetic average roughness and the maximum height roughness are slightly smaller, the gloss value of the glass substrate surface is reduced from 4.5 to 1.6, and then the reflection disappears, and the fine surface unevenness The ratio of cracked area is reduced to 0.2%.

如表2所示,於熱強化處理前後,具有上述微細之表面凹凸之玻璃基板之算術平均粗糙度、最大粗糙度、及龜裂之面積之比率未觀察到變化。然而,可知濕潤試驗後之pH值自8減少至7,並且濕潤試驗後之具有該微細之表面凹凸之玻璃基板表面之外觀改善。As shown in Table 2, before and after the heat strengthening treatment, no changes were observed in the arithmetic average roughness, the maximum roughness, and the ratio of the cracked area of the glass substrate with the above-mentioned fine surface irregularities. However, it can be seen that the pH value after the wet test decreased from 8 to 7, and the appearance of the glass substrate surface with the fine surface irregularities after the wet test improved.

[表1]    實施例1 比較例1 比較例2 第1步驟之研磨材之粒徑 F80 F80 F80 第2步驟之研磨材之粒徑 #800 - #800 特性值 第一步驟後 第二步驟後 熱處理步驟後 第一步驟後 熱處理步驟後 第一步驟後 第二步驟後 熱處理步驟後 算術平均粗糙度(μm) 1.6 0.97 0.97 1.6 1.6 1.6 1.1 1.1 最大高度粗糙度(μm) 19.1 12.5 12.5 19.1 19.1 19.1 12.8 12.8 光澤度 6.5 4.4 4.4 6.5 6.5 6.5 5.2 5.2 映入 龜裂之面積之比率(%) 13.5 0.2 0.2 13.5 13.5 13.5 1.3 1.3 濕潤試驗後之pH值    9~8 7    8    9 7 濕潤試驗後之玻璃表面之外觀    有變化 大致無變化    於緣部有外觀變化    有變化 大致無變化 透過率之保持率 (根據400 nm-1200 nm之平均值計算者)       98.3%             97.0% [Table 1] Example 1 Comparative example 1 Comparative example 2 The particle size of the abrasive in the first step F80 F80 F80 The particle size of the abrasive in the second step #800 - #800 Characteristic value After the first step After the second step After the heat treatment step After the first step After the heat treatment step After the first step After the second step After the heat treatment step Arithmetic average roughness (μm) 1.6 0.97 0.97 1.6 1.6 1.6 1.1 1.1 Maximum height roughness (μm) 19.1 12.5 12.5 19.1 19.1 19.1 12.8 12.8 Gloss 6.5 4.4 4.4 6.5 6.5 6.5 5.2 5.2 Reflected in Have no no Have Have Have no no Ratio of cracked area (%) 13.5 0.2 0.2 13.5 13.5 13.5 1.3 1.3 PH after wetting test 9~8 7 8 9 7 Appearance of glass surface after wetting test no change Roughly unchanged There is a change in appearance at the edge no change Roughly unchanged Transmittance retention rate (calculated based on the average value of 400 nm-1200 nm) 98.3% 97.0%

[表2]    實施例2-1 實施例2-2 第1步驟之研磨材之粒徑 #400 #320 第2步驟之研磨材之粒徑 #800 #800 特性值 第一步驟後 第二步驟後 熱處理步驟後 第一步驟後 第二步驟後 熱處理步驟後 算術平均粗糙度(μm) 1.2 0.94 0.94 1.3 1.2 1.2 最大高度粗糙度(μm) 13.2 11.5 11.5 14.5 12.8 12.8 光澤度 4.5 1.7 1.7 4.2 1.6 1.6 映入 龜裂之面積之比率(%) 5.2 0.2 0.2 7.2 0.2 0.2 濕潤試驗後之pH值    8 7    8 7 濕潤試驗後之玻璃表面之外觀    有變化 大致無變化    有變化 大致無變化 透過率之保持率 (根據400 nm-1200 nm之平均值計算者)       98.6%       98.5% [Table 2] Example 2-1 Example 2-2 The particle size of the abrasive in the first step #400 #320 The particle size of the abrasive in the second step #800 #800 Characteristic value After the first step After the second step After the heat treatment step After the first step After the second step After the heat treatment step Arithmetic average roughness (μm) 1.2 0.94 0.94 1.3 1.2 1.2 Maximum height roughness (μm) 13.2 11.5 11.5 14.5 12.8 12.8 Gloss 4.5 1.7 1.7 4.2 1.6 1.6 Reflected in no no no no no no Ratio of cracked area (%) 5.2 0.2 0.2 7.2 0.2 0.2 PH after wetting test 8 7 8 7 Appearance of glass surface after wetting test no change Roughly unchanged no change Roughly unchanged Transmittance retention rate (calculated based on the average value of 400 nm-1200 nm) 98.6% 98.5%

(比較例1) 於實施例1中,於未實施第二噴擊加工之情形時,成為殘留於玻璃基板之微細之表面凹凸之龜裂之比率變大至13.5%,於熱強化後之濕潤試驗中pH值亦增大至8,濕潤試驗後之外觀變化亦較大之結果。圖5表示熱強化處理後之具有該微細之表面凹凸之玻璃基板表面之濕潤試驗後的外觀比較。圖5之左側為實施例1之玻璃基板,圖5之右側為比較例1之玻璃基板。(Comparative example 1) In Example 1, when the second blasting process was not performed, the ratio of the cracks remaining on the surface of the glass substrate increased to 13.5%, and the pH value was also the same in the wet test after heat strengthening. Increased to 8, the appearance change after the wet test is also a larger result. Fig. 5 shows the comparison of the appearance after the wet test of the surface of the glass substrate having the fine surface irregularities after the heat strengthening treatment. The left side of FIG. 5 is the glass substrate of Example 1, and the right side of FIG. 5 is the glass substrate of Comparative Example 1.

(比較例2) 於與實施例1同樣利用第一噴擊加工對玻璃基板進行加工之後,利用第二噴擊加工將殘留於具有微細之表面凹凸之玻璃基板之龜裂去除。龜裂之面積之比率為1.3%,與實施例1相比,濕潤試驗後之外觀變化為同等水準。然而,因龜裂之面積之比率較大,為1.3%,透過率相對於未加工之玻璃基板之保持率(根據400 nm-1200 nm之透過率之平均值計算者)受其影響自實施例1之98.3%降低至97.0%。(Comparative example 2) After the glass substrate was processed by the first blasting process in the same manner as in Example 1, the second blasting process was used to remove the cracks remaining on the glass substrate with fine surface irregularities. The ratio of the area of the cracks was 1.3%. Compared with Example 1, the appearance change after the wetness test was at the same level. However, because the ratio of the area of the crack is relatively large, 1.3%, the transmittance relative to the retention rate of the unprocessed glass substrate (calculated based on the average transmittance of 400 nm-1200 nm) is affected by it. 98.3% of 1 was reduced to 97.0%.

(實施例3) 對於實施例1中所獲得之經熱強化之具有微細之表面凹凸之玻璃基板,將具有該微細之表面凹凸之玻璃面側配置於受光面側,製作結晶太陽電池模組。(Example 3) For the heat-strengthened glass substrate with fine surface concavities and convexities obtained in Example 1, the glass surface side with the fine surface concavities and convexities was arranged on the light-receiving surface side to produce a crystalline solar cell module.

結晶太陽電池模組之背面側之保護材使用包含氟樹脂膜、阻氣性PET樹脂膜、及帶底塗劑之PET樹脂膜的合計厚度82 μm之貼合膜。於具有該微細之表面凹凸之經熱強化之玻璃基板與6英吋見方尺寸之1片結晶太陽電池單元之間,配置厚度0.5 mm之快速固化型之EVA(乙烯-乙酸乙烯酯共聚樹脂),於該結晶太陽電池單元與該保護材之間,同樣地配置厚度0.5 mm之快速固化型之EVA,使用真空貼合機進行密封,並且使EVA熱硬化。The protective material on the back side of the crystalline solar cell module uses a laminated film with a total thickness of 82 μm including a fluororesin film, a gas barrier PET resin film, and a PET resin film with a primer. Between the heat-strengthened glass substrate with the fine surface unevenness and a crystalline solar cell unit of 6 inches square size, a fast-curing EVA (ethylene-vinyl acetate copolymer resin) with a thickness of 0.5 mm is arranged, Between the crystalline solar cell unit and the protective material, a quick-curing EVA with a thickness of 0.5 mm is similarly arranged, sealed with a vacuum laminator, and the EVA is thermally cured.

此處,真空貼合機之條件為玻璃基板溫度140℃,真空時間3分鐘,加壓時間5分鐘,加壓壓力90 kPa。Here, the conditions of the vacuum laminator are the glass substrate temperature of 140°C, the vacuum time of 3 minutes, the press time of 5 minutes, and the press pressure of 90 kPa.

又,於6英吋見方尺寸之結晶太陽電池單元之受光面側,形成有使Ag膏熱硬化而成之指狀電極與匯流排電極。背面側形成有將Ag膏形成為固定厚度而成之背面電極與島嶼狀之匯流排電極。分別於受光面側及背面側使用寬度2 mm之焊料浸漬銅箔而電性連接並密封,獲得結晶太陽電池模組,為了將上述銅箔連接於端子箱等,將其自該結晶太陽電池模組之端部向外部引出。In addition, on the light-receiving surface side of the 6-inch square crystalline solar cell unit, there are formed finger electrodes and bus bar electrodes formed by thermally hardening the Ag paste. On the back side, a back electrode formed by forming Ag paste into a constant thickness and an island-shaped bus bar electrode are formed. A copper foil with a width of 2 mm was used to impregnate a copper foil on the light-receiving side and the back side, respectively, and electrically connected and sealed to obtain a crystalline solar cell module. In order to connect the copper foil to a terminal box, etc., it was removed from the crystalline solar cell module. The end of the group is led to the outside.

所獲得之太陽電池模組之最大輸出為4.22 W,開路電壓為0.631 V,短路電流為9.18 A。The maximum output of the obtained solar cell module is 4.22 W, the open circuit voltage is 0.631 V, and the short circuit current is 9.18 A.

1:第一噴擊加工後之玻璃基板表面之模式圖 2a~2d:形成於第一噴擊加工後之玻璃基板表面之表面凹凸 3a~3j:殘留於第一噴擊加工後之玻璃基板表面之龜裂 4:第二噴擊加工後之玻璃基板表面之模式圖 5a~5d:形成於第二噴擊加工後之玻璃基板表面之表面凹凸 6a、6b:殘留於第二噴擊加工後之玻璃基板表面之龜裂 7:熱強化處理後之玻璃基板表面之模式圖 8a~8d:形成於熱強化處理後之玻璃基板表面之表面凹凸 9a~9b:殘留於熱強化處理後之玻璃基板表面之龜裂 10:防眩型結晶太陽電池模組 11:具有微細之表面凹凸之經熱強化之玻璃基板 12:密封材 13:導電性構件 13a~13e:導電性構件 14:結晶太陽電池單元 14a~14d:結晶太陽電池單元 15:密封材 16:背面側保護材1: The schematic diagram of the surface of the glass substrate after the first spray processing 2a~2d: Surface irregularities formed on the surface of the glass substrate after the first blasting process 3a~3j: Cracks remaining on the surface of the glass substrate after the first blasting process 4: The schematic diagram of the surface of the glass substrate after the second spray processing 5a~5d: Surface irregularities formed on the surface of the glass substrate after the second blasting process 6a, 6b: Cracks remaining on the surface of the glass substrate after the second blasting process 7: The schematic diagram of the surface of the glass substrate after heat strengthening treatment 8a~8d: Surface irregularities formed on the surface of the glass substrate after heat strengthening treatment 9a~9b: Cracks remaining on the surface of the glass substrate after heat strengthening 10: Anti-glare crystalline solar cell module 11: Heat-strengthened glass substrate with fine surface unevenness 12: Sealing material 13: Conductive member 13a~13e: conductive member 14: Crystalline solar cell unit 14a~14d: Crystalline solar cell unit 15: Sealing material 16: Back side protection material

圖1係本發明之製造方法中之第一步驟(第一噴擊加工)後之玻璃基板之模式性剖視圖。 圖2係本發明之製造方法中之第二步驟(第二噴擊加工)後之玻璃基板之模式性剖視圖。 圖3係本發明之製造方法中之熱強化處理後之玻璃基板之模式性剖視圖。 圖4係使用本發明之具有微細之表面凹凸之經熱強化之玻璃基板的防眩型結晶太陽電池模組之模式性剖視圖。 圖5係藉由濕潤試驗對本發明之具有微細之表面凹凸之經熱強化之玻璃基板進行評估之後之玻璃表面之外觀之比較。FIG. 1 is a schematic cross-sectional view of the glass substrate after the first step (first blasting process) in the manufacturing method of the present invention. 2 is a schematic cross-sectional view of the glass substrate after the second step (second blasting processing) in the manufacturing method of the present invention. Fig. 3 is a schematic cross-sectional view of the glass substrate after thermal strengthening in the manufacturing method of the present invention. 4 is a schematic cross-sectional view of an anti-glare type crystalline solar cell module using the heat-strengthened glass substrate with fine surface irregularities of the present invention. Fig. 5 is a comparison of the appearance of the glass surface after evaluating the heat-strengthened glass substrate with fine surface irregularities of the present invention by a wetness test.

7:熱強化處理後之玻璃基板表面之模式圖7: The schematic diagram of the surface of the glass substrate after heat strengthening treatment

8a~8d:形成於熱強化處理後之玻璃基板表面之表面凹凸8a~8d: Surface unevenness formed on the surface of the glass substrate after heat strengthening treatment

9a~9b:殘留於熱強化處理後之玻璃基板表面之龜裂9a~9b: Cracks remaining on the surface of the glass substrate after heat strengthening

Claims (9)

一種熱強化玻璃基板之製造方法,其包含: 第一步驟,其係對未進行熱強化處理之玻璃基板之表面利用F46以上F220以下之JIS R6001-1:2017之粒度之研磨劑進行噴擊加工; 第二步驟,其係藉由對經過上述第一步驟之玻璃基板利用#240以上#2000以下之JIS R6001-2:2017之粒度之研磨劑進行噴擊加工,形成使該玻璃基板之表面之算術平均粗糙度為0.5 μm以上5 μm以下、使該玻璃基板之表面之最大高度粗糙度為10 μm以上50 μm以下、使存在於該玻璃基板之表面之龜裂之面積未達1%,而形成有表面凹凸的玻璃基板;及 第三步驟,其係對形成有上述表面凹凸之玻璃基板進行熱強化處理。A method for manufacturing a thermally strengthened glass substrate, which comprises: The first step is to spray and process the surface of the glass substrate that has not been thermally strengthened with an abrasive with a particle size of JIS R6001-1: 2017 above F46 and below F220; The second step is to process the glass substrate after the first step above with #240 above #2000 and below JIS R6001-2: 2017 grit abrasives to form arithmetic on the surface of the glass substrate The average roughness is 0.5 μm or more and 5 μm or less, the maximum height roughness of the surface of the glass substrate is 10 μm or more and 50 μm or less, and the area of the cracks existing on the surface of the glass substrate is less than 1%. A glass substrate with uneven surface; and The third step is to heat strengthen the glass substrate on which the above-mentioned surface irregularities are formed. 如請求項1之熱強化玻璃基板之製造方法,其中 上述第一步驟中所使用之研磨劑係JIS R6001-1:2017之粒度為F46以上F100以下, 上述第二步驟中所使用之研磨劑係JIS R6001-2:2017之粒度為#400以上#1000以下。Such as the manufacturing method of the thermally strengthened glass substrate of claim 1, wherein The abrasive used in the first step mentioned above is JIS R6001-1:2017 with a particle size of F46 or more and F100 or less, The abrasive used in the above second step is JIS R6001-2: 2017 with a particle size of #400 or more and #1000 or less. 如請求項1或2之熱強化玻璃基板之製造方法,其中上述熱強化處理之步驟之熱強化處理條件為如與熱強化處理後之玻璃基板之表面接觸之水分之pH值較與熱強化處理前之玻璃基板之表面接觸之水分之pH值減少的條件。The method for manufacturing a heat-strengthened glass substrate of claim 1 or 2, wherein the heat-strengthening treatment condition of the heat-strengthening step is such that the pH value of the moisture in contact with the surface of the glass substrate after the heat-strengthening treatment is higher than that of the heat-strengthening treatment The condition that the pH value of the water contacted by the surface of the glass substrate is reduced. 一種太陽電池模組,其包含藉由如請求項1至3中任一項之製造方法製造而成之強化玻璃作為受光面側之覆蓋玻璃。A solar cell module comprising tempered glass manufactured by the manufacturing method of any one of claims 1 to 3 as cover glass on the light-receiving surface side. 一種熱強化玻璃基板之製造方法,其包含: 第一步驟,其係對未進行熱強化處理之玻璃基板之表面利用F46以上F220以下之JIS R6001-1:2017之粒度之研磨劑、或#240以上#400以下之JIS R6001-2:2017之粒度之研磨劑進行噴擊加工; 第二步驟,其係藉由對經過上述第一步驟之玻璃基板利用#600以上#2000以下之JIS R6001-2:2017之粒度之研磨劑進行噴擊加工,形成使該玻璃基板之表面之算術平均粗糙度為0.5 μm以上5 μm以下、使該玻璃基板之表面之最大高度粗糙度為10 μm以上50 μm以下、使存在於該玻璃基板之表面之龜裂之面積未達1%,而形成有表面凹凸的玻璃基板;及 第三步驟,其係對形成有上述表面凹凸之玻璃基板進行熱強化處理。A method for manufacturing a thermally strengthened glass substrate, which comprises: The first step is to use abrasives with a particle size of JIS R6001-1: 2017 above F46 and below F220, or JIS R6001-2: 2017 below #240 and #400 on the surface of the glass substrate that has not been thermally strengthened. Granular abrasives are processed by spraying; The second step is to process the glass substrate after the first step above with #600 above #2000 and below JIS R6001-2: 2017 grit abrasives to form arithmetic on the surface of the glass substrate The average roughness is 0.5 μm or more and 5 μm or less, the maximum height roughness of the surface of the glass substrate is 10 μm or more and 50 μm or less, and the area of the cracks existing on the surface of the glass substrate is less than 1%. A glass substrate with uneven surface; and The third step is to heat strengthen the glass substrate on which the above-mentioned surface irregularities are formed. 如請求項5之熱強化玻璃基板之製造方法,其中 上述第一步驟之噴擊加工為利用噴丸法之噴擊加工,所使用之研磨劑係JIS R6001-1:2017之粒度為F46以上F100以下, 上述第二步驟中所使用之研磨劑係JIS R6001-2:2017之粒度為#400以上#1000以下。Such as the manufacturing method of the thermally strengthened glass substrate of claim 5, wherein The blasting process in the first step above is blasting using shot blasting. The abrasive used is JIS R6001-1:2017 with a particle size of F46 or more and F100 or less. The abrasive used in the above second step is JIS R6001-2: 2017 with a particle size of #400 or more and #1000 or less. 如請求項5之熱強化玻璃基板之製造方法,其中 上述第一步驟之噴擊加工為利用空氣噴擊法之噴擊加工,所使用之研磨劑係JIS R6001-1:2017之粒度為F100以上F220以下、或JIS R6001-2:2017之粒度為#240以上#400以下, 上述第二步驟中所使用之研磨劑係JIS R6001-2:2017之粒度為#600以上#1000以下。Such as the manufacturing method of the thermally strengthened glass substrate of claim 5, wherein The blasting process in the first step above is blasting by air blasting. The abrasive used is JIS R6001-1: 2017 with a particle size of F100 or more and F220 or less, or JIS R6001-2: 2017 with a particle size of # Above 240# Below 400, The abrasive used in the above second step is JIS R6001-2: 2017 with a particle size of #600 or more and #1000 or less. 如請求項5至7中任一項之熱強化玻璃基板之製造方法,其中上述熱強化處理之步驟之熱強化處理條件為如與熱強化處理後之玻璃基板之表面接觸之水分之pH值較與熱強化處理前之玻璃基板之表面接觸之水分之pH值減少的條件。The method for manufacturing a heat-strengthened glass substrate according to any one of Claims 5 to 7, wherein the heat-strengthening treatment condition of the heat-strengthening step is such that the pH value of the moisture in contact with the surface of the glass substrate after the heat-strengthening treatment is relatively high. The conditions under which the pH value of the moisture in contact with the surface of the glass substrate before heat strengthening treatment is reduced. 一種太陽電池模組,其包含藉由如請求項5至8中任一項之製造方法製造而成之強化玻璃作為受光面側之覆蓋玻璃。A solar cell module comprising tempered glass manufactured by the manufacturing method according to any one of claims 5 to 8 as cover glass on the light-receiving surface side.
TW108135774A 2019-10-02 2019-10-02 Manufacturing method of heat-strengthened glass substrate and solar cell module without dazzle such as glare caused by sunlight reflection and with an excellent appearance TW202114957A (en)

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