TW202111450A - Exposure device and article manufacturing method - Google Patents

Abstract

The present invention provides an exposure device that exposes a substrate while moving an original plate and the substrate in a scanning direction. The exposure device is characterized by comprising an illumination optical system for illuminating a surface to be illuminated of the original plate with light from a light source, and in that the illumination optical system includes a first light blocking part disposed at a position separated toward the light source from a conjugate plane of the surface to be illuminated, a second light blocking part disposed at a position separated toward the surface to be illuminated from the conjugate plane, and a masking part that is disposed between the first light blocking part and the second light blocking part and demarcates the illumination range of the surface to be illuminated, the sum of a first distance between the conjugate plane and the first light blocking part in a direction along the optical axis of the illumination optical system and a second distance between the conjugate plane and the second light blocking part in the direction along the optical axis is 5-20 mm inclusive, and the first light blocking part and the second light blocking part are disposed such that the first distance and the second distance are different.

Description

Exposure device and article manufacturing method

The present invention relates to an exposure device and a method of manufacturing an article.

In the conventional exposure device, the original plate (grating or mask) is illuminated by the illumination optical system, and the pattern of the original plate is projected on the substrate (wafer) through the projection optical system. In exposure equipment, as semiconductor equipment is miniaturized, it is required to achieve high resolution. In order to achieve high resolution, it is effective to shorten the wavelength of exposure light, increase the number of apertures (NA) of the projection optical system (higher NA), and deformed illumination (ring illumination, dipole illumination, quadrupole illumination, etc.).

On the other hand, along with the multi-layered equipment structure in recent years, the exposure apparatus is also required to improve the overlay accuracy. The exposure device of Patent Document 1 has: a light shielding portion arranged at a position defocused from the conjugate surface of the illuminated surface of the exposure device toward the light source side, and a light shielding portion arranged from the conjugate surface of the illuminated surface toward the illuminated surface The light-shielding part of the defocused position on the surface side. The exposure device of Patent Document 1 is effective for improving the overlay accuracy. [Prior Technical Literature] [Patent Literature]

[Patent Document 1] JP 2010-73835 A

[The problem to be solved by the invention]

However, in the exposure device of Patent Document 1, the illuminance generated by the light shielding portion is reduced, and the asymmetry of the integrated effective light source (XY asymmetry) occurs. If large asymmetry occurs in the integrated effective light source, for example, when lines and space patterns of the same line width are copied on the substrate in the vertical and horizontal directions, the vertical and horizontal patterns There will be a difference in line width between the types.

The present invention provides an exposure device, which is beneficial to suppress the decrease in illuminance in the illuminated surface and the asymmetry in the integrated effective light source. [Technical means to solve the problem]

In order to achieve the above-mentioned object, an exposure apparatus of one aspect of the present invention is an exposure apparatus that exposes the substrate while moving the original plate and the substrate in the scanning direction, and has an illumination that illuminates the illuminated surface of the original plate by light from a light source. The optical system, the illumination optical system, includes: a first light shielding portion arranged at a position away from the conjugate surface of the illuminated surface toward the light source side, and a first light shielding portion arranged from the conjugate surface toward the illuminated surface The second light-shielding part at a position far away from the side, and the light-shielding part arranged between the first light-shielding part and the second light-shielding part to delimit the illumination range of the illuminated surface are along the optical axis of the illumination optical system The sum of the first distance between the conjugate surface and the first light shielding portion in the direction of, and the second distance between the conjugate surface and the second light shielding portion in the direction along the optical axis, It is 5 mm or more and 20 mm or less, and the said 1st light-shielding part and the said 2nd light-shielding part are arrange|positioned so that the said 1st distance and the said 2nd distance may become different. [Effects of the invention]

According to the present invention, it is possible to provide an exposure device, for example, which is advantageous in suppressing the decrease in the illuminance in the illuminated surface and the asymmetry in the integrated effective light source.

Other features and advantages of the present invention can be more clearly understood by referring to the following description of the attached drawings. In addition, in the attached drawings, the same or the same structure is given the same reference number.

Hereinafter, the embodiments will be described in detail with reference to the attached drawings. In addition, the following embodiments are not intended to limit the scope of patent applications. Although plural features are described in the embodiment, all of these plural features are not necessarily essential to the invention, and the plural features may be combined arbitrarily. Furthermore, in the attached drawings, the same reference number is attached to the same or the same structure, and repeated description is omitted.

Fig. 1 is a schematic cross-sectional view showing the structure of an exposure apparatus 100 according to an aspect of the present invention. The exposure device 100 is a step-and-scan exposure device (scanner) that exposes the substrate 27 while moving the original plate 25 and the substrate 27 in the scanning direction (scanning exposure), and transcribes the pattern of the original plate 25 on the substrate. The exposure apparatus 100 has an illumination optical system 110 that illuminates the original plate 25 (grating or mask) by light from the light source 1, and projects the pattern of the original plate 25 on the substrate 27 (wafer, glass plate, etc.) Projection optics 26.

Light source 1, including: a mercury bulb with a wavelength of about 365nm, a KrF excimer laser with a wavelength of about 248nm, an ArF excimer laser with a wavelength of about 193nm, etc., emits a light beam for illuminating the original plate 25 (exposure Light).

The illumination optical system 110 includes a routing optical system 2, an emission angle preservation optical element 5, a diffractive optical element 6, a condenser lens 7, a light shielding member 8, a lens unit 10, and a zoom lens unit 11. In addition, the illumination optical system 110 includes: an optical integrator 12, a diaphragm 13, and a condenser lens 14, and a first light shielding portion 18, and a second light shielding portion 20, and a shielding unit 19, a condenser lens 21, and a collimator Lens 23.

The routing optical system 2 is provided between the light source 1 and the emission angle preservation optical element 5, and guides the light beam from the light source 1 to the emission angle preservation optical element 5. The emission angle preservation optical element 5 is provided on the light source side of the diffractive optical element 6 and guides the light beam from the light source 1 to the diffractive optical element 6 while maintaining the divergence angle fixedly. The emission angle preservation optical element 5 is an optical integrator including a fly-eye lens, a microlens array, a fiber bundle, and the like. The output angle preservation optical element 5 is used to reduce the influence of the light intensity distribution (pattern distribution) formed by the diffractive optical element 6 on the output variation of the light source 1.

The diffractive optical element 6 is arranged on a surface having a Fourier transform relationship with the pupil surface of the illumination optical system 110. The diffractive optical element 6 converts the light intensity distribution of the light beam from the light source 1 by diffraction, and the surface conjugated to the pupil surface of the projection optical system 26 is the pupil surface of the illumination optical system 110 and the illumination optical system The pupil plane of 110 is conjugated to form a desired light intensity distribution. The diffractive optical element 6 may also be a computer generated hologram (CGH: Computer Generated Hologram) designed by a computer to obtain a desired diffraction pattern on the surface of the diffraction pattern. In this embodiment, the shape of the light source formed on the pupil surface of the projection optical system 26 is referred to as an effective light source shape. In addition, "effective light source" means the light intensity distribution or the light angle distribution on the illuminated surface and the conjugate surface of the illuminated surface. The diffractive optical element 6 is provided between the output angle preservation optical element 5 and the condenser lens 7.

In the illumination optical system 110, a complex diffractive optical element 6 may be provided. For example, each of the plurality of diffractive optical elements 6 is one of the plurality of slits respectively mounted (mounted) on the corresponding turntable (not shown). The plural diffractive optical elements 6 are each formed with a different effective light source shape. These effective light source shapes include small circular shapes (smaller circular shapes), large circular shapes (larger circular shapes), ring shapes, dipole shapes, quadrupole shapes, and others. shape. The method of illuminating the illuminated surface by an effective light source shape of a ring shape, a dipole shape or a quadrupole shape is called anamorphic illumination.

The light beam from the angle-preserving optical element 5 is diffracted by the diffractive optical element 6 and guided to the condenser 7. The condensing lens 7 is arranged between the diffractive optical element 6 and the diffractive element 10, and collects the light beam diffracted by the diffractive optical element 6, and forms a diffraction pattern (light intensity distribution) on the Fourier transform surface 9 ).

The Fourier transform surface 9 is located between the optical integrator 12 and the diffractive optical element 6 and has an optical Fourier transform relationship with the diffractive optical element 6. By exchanging the diffractive optical element 6 arranged in the optical path of the illumination optical system 110, the shape of the diffraction pattern formed on the Fourier transform surface 9 can be changed.

The light shielding member 8 is movable in a direction perpendicular to the optical axis 1b of the illumination optical system 110 and is arranged on the upstream side (light source side) of the Fourier transform surface 9. The light shielding member 8 is arranged at a position slightly distant (defocused) from the position of the Fourier transform surface 9.

The lens unit 10 and the zoom lens unit 11 are provided between the Fourier transform surface 9 and the optical integrator 12 and function as a zoom optical system that expands the light intensity distribution formed on the Fourier transform surface 9. The lens unit 10 adjusts the toroidal ratio of the light intensity distribution formed on the Fourier transform surface 9 and guides it to the zoom lens unit 11. In addition, the zoom lens unit 11 is provided between the lens unit 10 and the optical integrator 12. The zoom lens unit 11 includes, for example, a plurality of zoom lenses, and the light intensity distribution formed on the Fourier transform surface 9 is adjusted to a value of σ based on the ratio of the NA of the illumination optical system 110 and the NA of the projection optical system 26 And lead to the optical integrator 12.

The optical integrator 12 is provided between the zoom lens unit 11 and the condenser lens 14. The optical integrator 12 is a fly-eye lens (fly-eye lens) that includes a light intensity distribution adjusted corresponding to the ring rate, aperture angle, and σ value, forms a plurality of secondary light sources, and guides it to the condenser 14. However, the optical integrator 12 may replace the fly-eye lens (fly-eye lens) and include other optical elements such as an optical rigid tube, a diffractive optical element, and a microlens array. The optical integrator 12 uniformly illuminates the original plate 25 arranged on the illuminated surface 24 by the light beam passing through the diffractive optical element 6. A light ring 13 is provided between the optical integrator 12 and the condenser lens 14.

The condenser lens 14 is provided between the optical integrator 12 and the original plate 25. As a result, it is possible to converge a large number of light beams guided from the optical integrator 12 to illuminate the original plate 25 in a superposed manner. When light is incident on the optical integrator 12 and collected by the condenser lens 14, the focal plane of the condenser lens 14, which is the conjugate surface 19, is illuminated by an almost rectangular shape.

In the rear stage of the condenser lens 14, a half mirror 15 is arranged. A part of the exposure light reflected by the half mirror 15 is incident on the light quantity measuring optical system 16. In the rear stage of the light quantity measuring optical system 16, a sensor 17 for measuring the light quantity is arranged. Based on the amount of light measured by the sensor 17, the amount of exposure during exposure is appropriately controlled.

Between the first light-shielding portion 18 and the second light-shielding portion 20, specifically, on the surface that is conjugate to the illuminated surface 24, that is, the conjugate surface 19a or in the vicinity of the conjugate surface 19a, there are arranged X blades and The shielding unit (shielding portion) 19 of the Y blade is illuminated by a light intensity distribution of almost rectangular shape. In addition, the vicinity of the conjugate surface 19a means that the X blade and the Y blade of the shielding unit 19 are separated from the conjugate surface 19a by a necessary distance so as not to interfere with each other. For example, from the conjugate surface 19a toward the optical axis It means that the direction is away from about 0.2mm. The shielding unit 19 is arranged to delimit the illumination range of the original plate 25 (illuminated surface 24), and is scanned in synchronization with the original plate stage 29 and the substrate stage 28. The original plate stage 29 is a stage that moves the original plate 25 while holding, and the substrate stage 28 is a stage that moves the substrate 27 while holding it.

Two light-shielding parts are provided at a position away (defocused) from the shielding unit 19 (the conjugate surface 19a of the illuminated surface 24). In this embodiment, a first light-shielding part 18 and a second light-shielding part 20 are provided. . The first light shielding portion 18 is arranged at a position away from the conjugate surface 19a of the illuminated surface 24 toward the light source side. The second light shielding portion 20 is arranged at a position away from the conjugate surface 19a of the illuminated surface 24 toward the illuminated surface.

The light reflected by the mirror 22 having a predetermined inclination with respect to the light beam from the condenser lens 21 passes through the collimator lens 23 to illuminate the original plate 25.

The projection optical system 26 projects the pattern of the original plate 25 on the substrate 27. The resolution of the pattern of the original plate 25 depends on the shape of the effective light source. Therefore, by forming an appropriate effective light source distribution in the illumination optical system 110, the resolution of the pattern of the original plate 25 can be improved.

With reference to FIG. 2, the details of the first light shielding portion 18, the shielding unit 19, and the second light shielding portion 20 will be described. In Figure 2, the y direction is the display scanning direction. The shielding unit 19 includes scanning shielding blades 19d and 19e that move during scanning exposure.

As shown in FIG. 2, the first light shielding portion 18 includes a first light shielding member 18a and a second light shielding member 18b. The end 18aA of the first light-shielding member 18a on the second light-shielding member side and the end 18bA of the second light-shielding member 18b on the first light-shielding member side are located in the light effective area. The intensity of the light on the illuminating surface 24. For example, an actuator (not shown) is connected to the first light shielding member 18a. With this actuator, the first light shielding member 18a is moved in the scanning direction (y direction), and it can be changed to be limited by the end 18aA of the first light shielding member 18a and the end 18bA of the second light shielding member 18b. The width of the opening. In this way, the first light shielding portion 18 constitutes a variable slit. In addition, in the present embodiment, the first light shielding unit 18 is provided with a first moving unit FMU that moves the first light shielding member 18 a and the second light shielding member 18 b along the direction of the optical axis 1 b of the illumination optical system 110.

As shown in FIG. 2, the second light shielding portion 20 includes a third light shielding member 20a and a fourth light shielding member 20b. The end 20aA of the third light-shielding member 20a on the side of the fourth light-shielding member and the end 20bA of the third light-shielding member of the fourth light-shielding member 20b are located in the light effective area. The intensity of the light on the illuminating surface 24. An actuator (not shown) is connected to the third light shielding member 20a. By moving the third light-shielding member 20a in the scanning direction (y direction) by such an actuator, it is possible to change the end 20aA of the third light-shielding member 20a and the end 20bA of the fourth light-shielding member 20b. The defined opening width. In this way, the second light shielding portion 20 constitutes a variable slit. In addition, in this embodiment, the second light shielding unit 20 is provided with a second moving unit SMU that moves the third light shielding member 20 a and the fourth light shielding member 20 b in a direction along the optical axis 1 b of the illumination optical system 110.

As shown in Figure 2, in a plane that includes the optical axis 1b and is parallel to the scanning direction, the first distance between the conjugate surface 19a in the direction along the optical axis 1b and the end 18aA of the first shading member 18a Is set to d1. In a plane that includes the optical axis 1b and is parallel to the scanning direction, the second distance between the conjugate surface 19a in the direction along the optical axis 1b and the end 20aA of the third light shielding member 20a is set to d2. In this case, the first distance d1 and the second distance d2 are different values. The distance between the conjugate surface 19a and the end 18bA of the second light shielding member 18b is equal to the first distance d1, and the distance between the conjugate surface 19a and the end 20bA of the fourth light shielding member 20b is equal to the second The distance d2 is equal. In this way, the first light shielding portion 18 and the second light shielding portion 20 are arranged so that the first distance d1 and the second distance d2 are different.

As shown in FIG. 2, in a plane that includes the optical axis 1b and is parallel to the scanning direction, the midpoint of the end 18aA of the first light shielding member 18a and the end 18bA of the second light shielding member 18b is set to 18c. Similarly, the midpoint of the end 20aA of the third light shielding member 20a and the end 20bA of the fourth light shielding member 20b is set to 20c. The distance from the midpoint 18c to the end 18aA of the first shading member 18a and the end 18bA of the second shading member 18b is set to S1, from the midpoint 20c to the end 20aA of the third shading member 20a and the fourth shading member 20b The distance up to the end 20bA of the S2 is set to S2. In this case, the distance S1 and the distance S2 are different values. In addition, the straight line connecting the midpoint 18c and the midpoint 20c is parallel to the optical axis 1b.

Referring to Figure 3a and Figure 3b, the integrated effective light source will be described. In Figure 3 a and Figure 3 b, the y direction is the display scanning direction. Fig. 3a shows the illumination area 24e of the illuminated surface 24, and Fig. 3b shows the illumination area 19b of the conjugate surface 19a (shielding unit 19) in a conjugate relationship with the illuminated surface 24.

When performing exposure, the illuminated area 24e is scanned. At this time, the incident angle distribution of illumination at a certain point on the exposure surface is the sum of incident angle distributions of illumination at each point on a straight line 24f parallel to the scanning direction (y direction) in the illumination area 24e. This is called integration Effective light source. Since the straight line 19c is a collection of points conjugated to each point of the straight line 24e on the conjugate surface 19a, the integrated effective light source is the sum of the incident light beams that will be illuminated by the illumination surface 24 by passing through the points of the straight line 19c. The angle distribution is equivalent.

The functions of the first light shielding portion 18 and the second light shielding portion 20 will be described with reference to FIG. 4 a, FIG. 4 b, and FIG. 4 c. In Figure 4a, Figure 4b, and Figure 4c, the y direction is the display scanning direction. Fig. 4a is an enlarged view of the vicinity of the optical integrator 12, the condenser lens 14, the first light shielding portion 18, and the second light shielding portion 20. In Fig. 4a, light rays emitted from the optical integrator 12, passing through the condenser lens 14, and passing through the points A, B, and C of the conjugate surface 19a are shown. Here, the points A, B, and C are points on the straight line 19 shown in b in Fig. 3. Fig. 4b is a diagram showing the effective light sources 24a, 24b, and 24c in each of the points A', B', and C'of the illuminated surface 24. Each of the points A', B', and C'has a conjugate relationship with the points A, B, and C of the conjugate surface 19a of the illuminated surface 24. Fig. 4c is a diagram showing the integrated effective light source 24d in which all the light rays passing through the straight line including the points A', B', and C'of the illuminated surface 24 are accumulated.

Furthermore, in this embodiment, in order to facilitate the understanding of the invention, the effective light source is described as an example of the circular shape of conventional lighting. However, it can be formed into a ring shape and a multiplicity based on the combination of the ridge unit 10 and the diffractive optical element 6. Extreme shape. The present invention is not limited to the shape of the effective light source formed by the diffractive optical element 6 and the ridge unit 10 and the like.

Referring to Figure 4a, the light ray 12a that is emitted from the optical integrator 12 parallel to the optical axis 1b, passes through the condenser lens 14, and faces the point A of the conjugate surface 19a, does not pass through the first light-shielding part 18 and the second light-shielding part 20 while being shaded. Therefore, the effective light source 24a at the point A'of the illuminated surface 24 becomes an almost circular shape as shown in Fig. 4b, and is almost symmetrical in the scanning direction.

On the other hand, the light beam 12b that is emitted from the optical integrator 12 obliquely toward the first light-shielding member side than the optical axis 1b, passes through the condenser lens 14 and faces the point B of the conjugate surface 19a, part of the light beam 12b is transmitted by the first light-shielding member 18a And the third light shielding member 20a are shielded from light. Therefore, the effective light source 24b at the point B'of the illuminated surface 24 is a shape in which both ends of the scanning direction are missing for the circle, and the distribution in the x direction (the direction perpendicular to the y direction) and the distribution in the y direction There is asymmetry between (XY asymmetry).

And from the optical integrator 12 to the second light shielding member side than the optical axis 1b obliquely emitted, passing through the condenser lens 14 and toward the point C of the conjugate surface 19a, part of the light beam 12c through the second light shielding member 18b and fourth The light shielding member 20b is shielded from light. Therefore, the effective light source 24c at the point C'of the illuminated surface 24 is a shape in which both ends of the scanning direction are missing for the circle, and the distribution in the x direction (the direction perpendicular to the y direction) and the distribution in the y direction There is asymmetry between (XY asymmetry).

In this way, considering the integrated effective light source 24d in which all the light beams passing through the straight line including the points A, B, and C are integrated, the integrated effective light source 24d has XY asymmetry as shown in Fig. 4c.

With reference to Fig. 5a and Fig. 5b, the structure for reducing the XY asymmetry of the integrated effective light source 24d will be described. Fig. 5a is a diagram showing the illumination distribution 24ee (illumination area 24e) of the illuminated surface 24 which is formed by the light beam illuminating the conjugate surface 19a at the maximum angle θ0. The distribution of the conjugate surface 19a is formed by the condenser lens 21 and the collimator lens 23, and the image is formed on the illuminated surface 24 by the imaging magnification β.

The maximum incident angle of the light beam illuminating the conjugate surface 19a is set to θ0. The light rays passing through the end 18aA of the first light-shielding member 18a at an angle θ0 and the light rays passing through the end 20aA of the third light-shielding member 20a at an angle -θ0 cross each other at a point 19aa of the conjugate surface 19a, Determine the first distance S1 and the second distance S2. Also, as described above, the first distance S1 is the distance from the midpoint 18c to the end 18aA of the first light shielding member 18a, and the second distance S2 is the distance from the midpoint 20c to the end 20aA of the third light shielding member 20a. . The point where the straight line connecting the end 18aA of the first light shielding member 18a and the end 20aA of the third light shielding member 20a intersects the conjugate surface 19a is set to 19bb, and the distance between the points 19bb and 19cc is set to S. The points of the illuminated surface 24 corresponding to the points 19aa, 19bb, and 19cc of the conjugate surface 19a are set to 24g, 24h, and 24i.

In the illuminated surface 24, the light beam illuminating the area inside the point 24g is not shielded by the first light shielding member 18a and the third light shielding member 20a, so its intensity is constant. In addition, on the illuminated surface 24, the light illuminating the area outside the point 24h is shielded by the first light shielding member 18a and the third light shielding member 20a, and therefore its intensity becomes zero. The other end of the illumination distribution 24ee is shielded from light by the second light shielding member 18b and the fourth light shielding member 20b, and has the same shape. Therefore, the illumination distribution 24ee becomes a shape close to a trapezoid. The lower bottom and upper bottom of this trapezoid are each set to w0 and w100.

The effective light source for illuminating the point between the point 24i and the point 24g of the illuminated surface 24 is the same as the above-mentioned effective light source at the point A', and is almost circular. The effective light source that illuminates the point between the point 24g and the point 24h on the illuminated surface 24 is the same as the effective light source at the above-mentioned point B', and has a large XY asymmetry. In addition, since the points between the points 24g and 24h of the illuminated surface 24 are shielded from light by both the first light shielding portion 18 and the second light shielding portion 20, a decrease in illuminance occurs. Therefore, by increasing the ratio of w100 to w0 and reducing the distance between points 24g and 24h, it is possible to suppress the decrease in illuminance and the occurrence of XY asymmetry of the integrated effective light source 24d.

The bottom w0 of the illumination distribution 24ee is expressed as w0=2βS. On the other hand, the upper base w100 of the illumination distribution 24ee is expressed as w100=2β(S1-d1×tanθ0)=2β(S2-d2×tanθ0). Therefore, the ratio w100/w0 of the upper base w100 to the lower base w0 is expressed as w100/w0=(S1-d1×tanθ0)/S=(S2-d2×tanθ0)/S.

The points 19aa and 19bb of the conjugate surface 19a are represented by points where a straight line passing through the end 18aA of the first light shielding member 18a intersects the conjugate surface 19a. Therefore, in the case of d1<d1, w100/w0 is that the smaller d1 is, the closer it is to 1, and it becomes 1 when d1=0. And, in the case of d1>d2, w100/w0 is that the smaller d2 is, the closer it is to 1, and it becomes 1 when d2=0.

As described above, between the first light shielding portion 18 and the second light shielding portion 20, the scanning shielding blades 19d and 19e are arranged. Since the scanning shielding blades 19d and 19e move during scanning exposure, a certain amount of space is necessary. Therefore, the distance between the first light shielding portion 18 and the second light shielding portion 20 in the direction along the optical axis 1b cannot be smaller than the predetermined value D. The predetermined value D is expressed as D=d1+d2 using the first distance d1 between the first light shielding portion 18 and the conjugate surface 19a and the second distance d2 between the second light shielding portion 20 and the conjugate surface 19a. Generally, the prescribed value D is 5 mm or more and 20 mm or less.

Figure 5b shows that when the first distance d1 and the second distance d2 are equal, the illumination distribution 24ee formed by the light beam illuminating the conjugate surface 19a at the maximum angle θ0 illuminates the illuminated surface 24 Figure. Because of the condition of D=d1+d2, the first distance d1 shown in Fig. 5b is larger than the first distance d1 shown in Fig. 5a. Therefore, w100/w0, as shown in Figure 5b, becomes smaller.

Hereinafter, specific numerical examples regarding the first light shielding portion 18 and the second light shielding portion 20 will be described. When D=8[mm], S=5[mm], θ0=0.4[rad], the relationship between w100/w0 and d1/d2 is as shown in Figure 6. In Figure 6, the vertical axis shows w100/w0, and the horizontal axis shows d1/d2. As shown in Figure 6, the relationship between w100/w0 and d1/d2 is expressed by the quadratic formula, and it becomes the smallest when d1=d2.

The integrated effective light source 24d has XY asymmetry. If the XY asymmetry is corrected, the illuminance will decrease. In order to reduce such a decrease in illuminance, if it is necessary to make the XY asymmetry 15% or less, w100/w0 0.7 or more is preferable. Referring to Fig. 6, in order to make w100/w0 0.7 or more, d2/d1>2 or d2/d1<1/2 is necessary.

Next, referring to Fig. 7, the conditions for the maximum and minimum values of d2/d1 will be described. Points C'and B'shown in Fig. 4b, which correspond to the inclined portion of the illumination distribution 24ee, have a shift in the center of gravity of the light (deflection of the center of gravity) in the scanning direction. The light center of gravity drifts, because it will affect the overlap accuracy, but the ratio of d1 and d2 can be used to control the light center of gravity drift.

Figure 7 is a conventional structure of conventional lighting. Specifically, only when the light center of gravity shift of the structure in which the light-shielding part is arranged on the upstream side of the conjugate surface of the illuminated surface is set to 1, it shows that this embodiment The center of gravity of the light drifts. In Figure 7, the vertical axis shows the shift of the light center of gravity, and the horizontal axis shows d1/d2. Referring to Fig. 7, the center of gravity of the light is shifted, and d2/d1 becomes the minimum value, specifically, it becomes zero. This means that it will not cause the light's center of gravity to drift. In order to improve the superimposition accuracy, the center of gravity of the light beams shifts, and it is preferable that only half of the conventional structure in which the light-shielding portion is arranged on the upstream side of the conjugate surface of the illuminated surface is less than half of that. Referring to Fig. 7, it can be seen that in order to shift the center of gravity of light to less than half of the conventional structure, 1/4<d2/d1<4 is necessary.

Therefore, in order to satisfy the conditions of the first distance d1 from the conjugate surface 19a to the first light shielding portion 18 and the second distance d2 from the conjugate surface 19a to the second light shielding portion 20, d1≠d2, preferably It becomes 1/4<d2/d1<1/2 or 2<d2/d1<4. In this way, among the first distance d1 and the second distance d2, the distance of one is greater than twice the distance of the other, and preferably smaller than four times.

In this embodiment, as described above, an actuator that moves the first light shielding member 18a in the scanning direction and the first light shielding portion 18 (the first light shielding member 18a and the second light shielding member 18b) are provided along the scanning direction. The first moving part FMU that moves in the direction of the optical axis 1b. Similarly, there are provided an actuator that moves the third light shielding member 20a in the scanning direction, and a device that moves the second light shielding portion 20 (the third light shielding member 20a and the fourth light shielding member 20b) in the direction along the optical axis 1b. The second mobile unit SMU. By having such a driving mechanism, the most suitable d1, d1, S1, and S2 can be set by the illumination mode, which can further reduce (suppress) the shift of the light center of gravity, the decrease in illuminance, and the XY asymmetry in the effective light source.

The method of manufacturing an article in the embodiment of the present invention is optimal for the manufacturing of articles such as flat-panel displays, liquid crystal display elements, semiconductor elements, and MEMS, for example. This manufacturing method includes a process of exposing a substrate coated with a photosensitive agent using the above-mentioned exposure device 100 and a process of developing the exposed photosensitive agent. In addition, the pattern of the developed photosensitive agent is used as a mask to perform an etching process and an ion implantation process on the substrate to form a circuit pattern on the substrate. These processes of exposure, development, and etching are repeated to form a circuit pattern composed of multiple layers on the substrate. In the subsequent process, the substrate on which the circuit pattern is formed is cut into blocks, and the process of assembling, bonding, and inspecting the wafer is performed. In addition, this manufacturing method includes other well-known processes (oxidation, plating, vapor deposition, doping, planarization, protective layer peeling, etc.). The method of manufacturing an article in the present embodiment can be advantageous for at least one of the performance, quality, productivity, and production cost of the article compared to the conventional one.

The present invention is not limited to the above-mentioned embodiments, and various changes and modifications can be made without departing from the spirit and scope of the invention. Therefore, a request is added to announce the scope of the invention.

1: light source 1b: Optical axis 2: Optics for routing 5: Save the optical components at the injection angle 6: Diffractive optical element 7: Condenser 8: Shading member 9: Fourier transform surface 10: 稜鏡 unit 11: zoom lens unit 12: Optical integrator 12a: light 12b: light 12c: light 13: light circle 14: Condenser 15: Half mirror 16: Optical system for light quantity measurement 17: Sensor 18a: The first shading member 18aA: end 18b: The second shading member 18bA: end 18c: midpoint 19: Shading unit 19a: Conjugate surface 19aa, 19bb: point 19b: Domain 19c: straight line 19cc: point 19d: Scanning and concealing leaves 20: Shading part 20a: 3rd shading member 20aA: end 20b: 4th shading member 20bA: end 20c: midpoint 21: Condenser 22: Mirror 23: Collimating lens 24: illuminated surface 24a, 24b: effective light source 24c: effective light source 24d: effective light source 24e: domain 24ee: distribution 24f: straight line 24g: point 24h: point 24i: point 25: Original 26: Projection Optics 27: substrate 28: substrate stage 29: Original Stage 100: Exposure device 110: Department of Optics

The attached drawings are included in the specification, constitute a part of the specification, and are used to show the embodiments of the present invention and explain the principle of the present invention together with the description of the specification. [Figure 1] A schematic cross-sectional view showing the structure of an exposure apparatus of one aspect of the present invention. [Figure 2] A diagram for explaining the details of the first light shielding portion, the shielding unit, and the second light shielding portion. [Figure 3] A diagram for explaining the integrated effective light source. [Fig. 4] A diagram for explaining the functions of the first light-shielding part and the second light-shielding part. [Fig. 5] A diagram for explaining the structure for reducing the XY asymmetry of the integrated effective light source. [Figure 6] A diagram for explaining specific numerical examples of the first light shielding portion and the second light shielding portion. [Figure 7] A diagram for explaining specific numerical examples of the first light shielding portion and the second light shielding portion.

18a: The first shading member

18aA: end

18b: The second shading member

18c: midpoint

19a: Conjugate surface

19aa: point

19bb: point

19cc: point

20a: 3rd shading member

20aA: end

20b: 4th shading member

20c: midpoint

24: illuminated surface

24ee: distribution

24g: point

24h: point

24i: point

Claims (6)

An exposure device, It is an exposure device that exposes the aforementioned substrate while moving the original plate and substrate in the scanning direction. Its characteristics are: It has an illumination optical system that illuminates the illuminated surface of the original plate with light from the light source, The aforementioned illumination optics system includes: The first light shielding portion arranged at a position away from the conjugate surface of the illuminated surface toward the light source side, and The second light-shielding portion arranged at a position away from the conjugate surface toward the illuminated surface side, and A shielding portion arranged between the first light shielding portion and the second light shielding portion to delimit the illumination range of the illuminated surface, The first distance between the conjugate surface and the first light shielding portion in the direction along the optical axis of the illumination optical system, and the conjugate surface and the second light shielding portion in the direction along the optical axis The sum of the second distance between them is 5mm or more and 20mm or less, The first light shielding portion and the second light shielding portion are arranged so that the first distance and the second distance are different. Such as the exposure device of claim 1, wherein Among the first distance and the second distance, one of the distances is larger than twice the distance of the other and smaller than four times. Such as the exposure device of claim 1, which further has: A first moving part that moves the first light shielding part in a direction along the optical axis, and A second moving part that moves the second light shielding part in a direction along the optical axis. Such as the exposure device of claim 1, wherein The shielding portion is arranged on the conjugate surface or in the vicinity of the conjugate surface. Such as the exposure device of claim 1, wherein Each of the first light shielding portion and the second light shielding portion includes a variable slit. A method of manufacturing an article, which has: The process of exposing the substrate using the exposure device as in claim 1, and The process of developing the aforementioned substrate that has been exposed, and The process of manufacturing an article from the aforementioned substrate that has been developed.

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