TW202100774A - Metal shield including a shield plate body made of a metal material and an etching structure formed on one or two sides of the shield plate body - Google Patents
Metal shield including a shield plate body made of a metal material and an etching structure formed on one or two sides of the shield plate body Download PDFInfo
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本發明係關於一種金屬遮罩,尤指一種應用於鍍膜製程中,提供局部遮蔽功能,用以在玻璃基板或軟性基板之表面形成圖案化鍍膜之金屬遮罩。The present invention relates to a metal mask, especially a metal mask used in the coating process to provide a partial masking function for forming a patterned coating on the surface of a glass substrate or a flexible substrate.
目前有機發光二極體(Organic Light-Emitting Diode,OLED)式顯示器之製造過程中,如圖6所示,為於其玻璃基板或軟性基板等之基板表面以物理氣相沉積(physical vapor deposition,PVD)或化學氣相沉積(chemical vapor deposition,CVD)等手段,結合具有多個圖案化鍍膜孔41的金屬遮罩40進行鍍膜製程時,能防止陰影效應(shadow effect)的產生,金屬遮罩40必須接觸基板50(如玻璃基材或軟性基板等)的狀態下進行鍍膜製程。In the current manufacturing process of Organic Light-Emitting Diode (OLED) type displays, as shown in FIG. 6, physical vapor deposition (physical vapor deposition) is used on the surface of the substrate such as a glass substrate or a flexible substrate. PVD) or chemical vapor deposition (chemical vapor deposition, CVD) and other means, when combined with a
前述鍍膜製程中,由於金屬遮罩40與基板50(玻璃基板或軟性基板等)的表面光滑,在真空環境中,金屬遮罩40與基板50(玻璃基板或軟性基板等)之間易產生黏片現象。為了改善前述鍍膜製程中易產生黏片之問題,如圖7所示,一般相關製造業者目前大多採取對金屬遮罩60施以半蝕刻,使金屬遮罩60的一側相對於圖案化鍍膜孔61的外圍區域分別形成半蝕刻槽62。In the aforementioned coating process, since the surfaces of the
惟半蝕刻製程的工序對精密蝕刻製程控制而言,其難度偏高,造成金屬遮罩的產品不良率偏高,製造成本相對升高。而且,當金屬遮罩承受不平衡的拉伸張力時,會產生不均衡的應變,導致金屬遮罩之局部部位發生變形或翹曲等情事,影響鍍膜品質。However, the process of the half-etching process is relatively difficult for the control of the precision etching process, resulting in a high product defect rate of the metal mask and a relatively high manufacturing cost. Moreover, when the metal mask is subjected to unbalanced tensile tension, unbalanced strains will be generated, causing deformation or warping of local parts of the metal mask, which affects the quality of the coating.
此外,前述鍍膜製程中,當鍍膜步驟結束、洩真空時,金屬遮罩與玻璃基板或軟性基板之接觸區域在脫離過程中,容易因局部低真空的黏片現象,造成金屬遮罩與玻璃基板或軟性基板等相異材料的兩物件間的摩擦而易產生刮傷、擦傷等外觀不良問題。In addition, in the aforementioned coating process, when the coating step is finished and the vacuum is vented, the contact area between the metal mask and the glass substrate or flexible substrate is detached during the separation process. It is easy to cause the metal mask and the glass substrate due to local low vacuum adhesion. Or the friction between two objects of dissimilar materials, such as a flexible substrate, is prone to scratches, scratches and other appearance defects.
本發明之目的在於提供一種金屬遮罩,解決現有金屬遮罩為了改善黏片問題而經過半蝕刻後,其構造難以達到較佳機械強度等問題。The purpose of the present invention is to provide a metal mask, which solves the problem that the structure of the existing metal mask is difficult to achieve better mechanical strength after half-etching in order to improve the problem of the adhesive sheet.
為了達成前述目的,本發明提出的金屬遮罩係包括: 一金屬材料的遮罩板體,其界定有一接觸區域,以及位於接觸區域外圍的周邊區域,該接觸區域中設有複數個鍍膜圖案孔以及位於相鄰鍍膜圖案孔之間的遮蔽部;以及 一蝕刻構造,其形成於該遮罩板體的一側,且該遮罩板體於所述蝕刻構造沿著該遮罩板體的板厚方向的另一側邊具有一板體基部,所述蝕刻構造包括至少一圖案化蝕刻槽以及位於所述圖案化蝕刻槽中的至少一圖案化肋部,所述圖案化蝕刻槽的蝕刻深度小於或等於該板體基部的厚度,所述圖案化肋部連接所述板體基部。In order to achieve the foregoing objective, the metal mask proposed by the present invention includes: A mask plate body made of metal material, which defines a contact area and a peripheral area located at the periphery of the contact area, the contact area is provided with a plurality of plated pattern holes and a shielding portion located between adjacent plated pattern holes; and An etching structure is formed on one side of the mask plate, and the mask plate has a plate base on the other side of the etching structure along the thickness direction of the mask plate, so The etching structure includes at least one patterned etching groove and at least one patterned rib located in the patterned etching groove, the etching depth of the patterned etching groove is less than or equal to the thickness of the base of the plate, and the patterning The rib is connected to the base of the board.
為了達成前述目的,本發明提出的另一金屬遮罩係包括: 一金屬材料的遮罩板體,其界定有一接觸區域,以及位於接觸區域外圍的周邊區域,該接觸區域中設有複數個鍍膜圖案孔以及位於相鄰鍍膜圖案孔之間的遮蔽部;以及 二蝕刻構造,其形成於該遮罩板體的相對兩側,該遮罩板體於兩所述蝕刻構造之間具有一板體基部,所述蝕刻構造包括至少一圖案化蝕刻槽以及位於所述圖案化蝕刻槽中的至少一圖案化肋部,兩所述蝕刻構造的圖案化蝕刻槽的蝕刻深度總合小於或等於該板體基部的厚度,所述圖案化肋部連接所述板體基部。In order to achieve the foregoing objective, another metal mask proposed by the present invention includes: A mask plate body made of metal material, which defines a contact area and a peripheral area located at the periphery of the contact area, the contact area is provided with a plurality of plated pattern holes and a shielding portion located between adjacent plated pattern holes; and Two etching structures are formed on opposite sides of the mask plate body. The mask plate body has a plate body base between the two etching structures. The etching structure includes at least one patterned etching groove and a At least one patterned rib in the patterned etching groove, the total etching depth of the patterned etching grooves of the two etching structures is less than or equal to the thickness of the base of the board, and the patterned rib is connected to the board Base.
為了達成前述目的,本發明提出的另一金屬遮罩係包括: 一金屬材料的遮罩板體,其界定有一接觸區域,以及位於接觸區域外圍的周邊區域,該接觸區域中設有複數個鍍膜圖案孔以及位於相鄰鍍膜圖案孔之間的遮蔽部;以及 二蝕刻構造,其形成於該遮罩板體的相對兩側,該遮罩板體於兩所述蝕刻構造之間具有一板體基部,所述蝕刻構造各具有一圖案化蝕刻槽,兩所述蝕刻構造的圖案化蝕刻槽的蝕刻深度總合小於或等於該板體基部的厚度。In order to achieve the foregoing objective, another metal mask proposed by the present invention includes: A mask plate body made of metal material, which defines a contact area and a peripheral area located at the periphery of the contact area, the contact area is provided with a plurality of plated pattern holes and a shielding portion located between adjacent plated pattern holes; and Two etching structures are formed on opposite sides of the mask plate body. The mask plate body has a plate body base between the two etching structures. Each of the etching structures has a patterned etching groove. The total etching depth of the patterned etching grooves of the etching structure is less than or equal to the thickness of the base of the board.
藉由前述金屬遮罩之構造發明,其中利用遮罩板體一側或兩側皆形成圖案化蝕刻槽,使金屬遮罩維持改善鍍膜製程黏片之功效外,本發明金屬遮罩還藉由遮罩板體單一側或兩側的蝕刻構造的圖案化蝕刻槽中形成圖案化肋部,或是利用遮罩板體兩側的蝕刻構造,使板體基部位於遮罩板體的板厚中的中間位置等,使金屬遮罩不改變遮罩板體厚度的條件下,利用其有效地提升其機械強度。Through the aforementioned structural invention of the metal mask, the patterned etching grooves are formed on one or both sides of the mask plate to maintain the effect of the metal mask to improve the adhesive sheet of the coating process. The metal mask of the present invention also Patterned ribs are formed in the patterned etching grooves of the etching structure on a single side or both sides of the mask plate, or the etching structure on both sides of the mask plate is used to make the base of the plate in the thickness of the mask plate The middle position of the metal shield can effectively improve its mechanical strength without changing the thickness of the shield plate.
本發明金屬遮罩於其遮罩板體單一側或兩側的圖案化蝕刻槽中具有圖案化肋部時,圖案化蝕刻槽中的複數槽溝單元可連接一體,使所述蝕刻構造之圖案化蝕刻槽的圖案為連續圖形,有助於金屬遮罩於洩真空時,快速解除真空吸力,減少金屬遮罩與基板間相異材料的摩擦而刮傷的情事。當複數所述槽溝單元未全部連接,則可使蝕刻構造之圖案化蝕刻槽的圖案為不連續圖形,複數圖案化肋部連接形成連續圖形,且連接該遮罩板體的周邊區域,如此,使該遮罩板體的周邊區域所受的張力能夠經由板體基部以及構成連續圖形之圖案化肋部傳達至該接觸區域之每一鍍膜圖案孔孔緣,而能產生均衡的應變效果。When the metal mask of the present invention has patterned ribs in the patterned etching grooves on a single side or both sides of the mask plate body, a plurality of groove units in the patterned etching groove can be connected as a whole to make the pattern of the etching structure The pattern of the chemical etching groove is a continuous pattern, which helps the metal mask to quickly release the vacuum suction when the vacuum is vented, and reduces the friction and scratches of the dissimilar materials between the metal mask and the substrate. When the plurality of groove units are not all connected, the pattern of the patterned etching groove of the etching structure can be made into a discontinuous pattern, and the plurality of patterned ribs are connected to form a continuous pattern, and are connected to the peripheral area of the mask board, so , The tension on the peripheral area of the mask plate can be transmitted to the edge of each plated pattern hole in the contact area through the base of the plate and the patterned ribs forming a continuous pattern, and a balanced strain effect can be produced.
本發明金屬遮罩於其遮罩板體兩側的圖案化蝕刻槽中皆具有單一圖案化蝕刻槽之構造時,則有助於金屬遮罩於洩真空時,快速解除真空吸力,減少金屬遮罩與基板間相異材料的摩擦而刮傷的情事。When the metal mask of the present invention has a structure of a single patterned etching groove in the patterned etching grooves on both sides of the mask plate, it is helpful for the metal mask to quickly release the vacuum suction when the vacuum is vented, and reduce the metal mask. The case of the cover and the substrate being scratched by the friction of different materials.
依據前述發明內容揭露之技術手段,本發明金屬遮罩至少可以下列多種具體可行的較佳實施例予以實現。如圖1至圖4所示,由該些圖式揭示的較佳實施例中可以見及,該金屬遮罩包括由金屬材料加工成形的一遮罩板體10A、10B、10C以及形成於該遮罩板體10A、10B、10C中的一或二蝕刻構造20A、20B、20C。According to the technical means disclosed in the foregoing content of the invention, the metal mask of the present invention can be implemented in at least the following various specific and feasible preferred embodiments. As shown in FIGS. 1 to 4, as can be seen in the preferred embodiments disclosed by these drawings, the metal mask includes a
該遮罩板體10A、10B、10C相對的兩側分別為一第一側101以及一第二側102,如圖1及圖2所示,當所述蝕刻構造20A為一個時,該蝕刻構造20A係形成於該遮罩板體10A的單一側,亦即該蝕刻構造20A形成於該遮罩板體10A的第一側101與第二側102兩者中之任一,該遮罩板體10A相對於該蝕刻構造之另一側則為一板體基部13A;如圖3及圖4所示,當所述蝕刻構造20B、20C為二個時,兩所述蝕刻構造20B、20C係形成於該遮罩板體10B、10C的相對兩側,亦即兩所述蝕刻構造20B、20C分別形成於該遮罩板體10B、10C的第一側101與第二側102,該遮罩板體10B、10C於兩所述蝕刻構造20B、20C之間具有一板體基部13B、13C。The two opposite sides of the
如圖1至圖4所示,該遮罩板體10A、10B、10C皆界定有一接觸區域11,以及位於接觸區域11外圍的周邊區域12,該接觸區域11係用以與待鍍膜之基板(如玻璃基板或軟性基板等)之接觸部位,該周邊區域12則係提供被固定的部位,該接觸區域11中設有複數個鍍膜圖案孔111以及位於相鄰鍍膜圖案孔111之間的遮蔽部112,每一所述鍍膜圖案孔111皆係貫通該遮罩板體10A、10B、10C的穿孔。As shown in FIGS. 1 to 4, the
如圖1至圖4所示,所述蝕刻構造20A、20B、20C係以蝕刻手段至少形成於該接觸區域11的遮蔽部112中,所述蝕刻構造20A、20B、20C還可依金屬遮罩之產品需求,進一步形成於該周邊區域12,其中,所述蝕刻構造20A、20B、20C未貫穿該接觸區域11的遮蔽部112,所述蝕刻構造20A、20B、20C位於該遮蔽部112範圍內的面積大於或等於該接觸區域11(即包括多個鍍膜圖案孔111的面積與遮蔽部112面積之總合)之總面積的20%,且小於或等於該接觸區域11之總面積的85%為佳。As shown in FIGS. 1 to 4, the
如圖1至圖3所示,所述蝕刻構造20A、20B、20C包括至少一個圖案化蝕刻槽21A、21B,或者,所述蝕刻構造20A、20B還可進一步包括至少一個圖案化肋部22A、22B。當所述蝕刻構造20A、20B包括有圖案化蝕刻槽21A、21B與圖案化肋部22A、22B時,所述圖案化蝕刻槽21A、21B的槽寬W1大於或等於所述圖案化肋部22A、22B的肋寬W2為佳。As shown in FIGS. 1 to 3, the
如圖1及圖2所示之金屬遮罩第一較佳實施例,該蝕刻構造20A係形成於該遮罩板體10A的單一側,該遮罩板體10A相對於該蝕刻構造20A的另一側為板體基部13A,亦即當該蝕刻構造20A形成於該遮罩板體10A的第一側101,該遮罩板體10A之第二側102具有板體基部13A;反之,當該蝕刻構造20A形成於該遮罩板體10A的第二側102,該遮罩板體10A之第一側101則具有板體基部13A。該蝕刻構造20A的蝕刻深度H小於或等於遮罩板體10A、10B、10C之板厚D的二分之一為佳,亦即該板體基部13的厚度大於或等於該蝕刻構造20A、20B、20C的蝕刻深度H。In the first preferred embodiment of the metal mask shown in FIGS. 1 and 2, the
如圖1及圖2所示之金屬遮罩第一較佳實施例,該蝕刻構造20A包括複數圖案化蝕刻槽21A以及複數圖案化肋部22A,所述圖案化蝕刻槽21A的槽寬W1大於或等於所述圖案化肋部22A的肋寬W2,所述圖案化蝕刻槽21A的蝕刻深度H小於或等於該板體基部13A的厚度。藉由該遮罩板體10A的一側的所述蝕刻構造20A中具有連接板體基部13A的圖案化肋部22A,而能有效提升其機械強度。In the first preferred embodiment of the metal mask shown in FIGS. 1 and 2, the
所述蝕刻構造20A之圖案化蝕刻槽21A包括複數槽溝單元211A,複數所述槽溝單元211A可連接一體,使所述蝕刻構造20A之圖案化蝕刻槽21A的圖案為連續圖形,有助於金屬遮罩於洩真空時,快速解除真空吸力。或者,複數所述槽溝單元211A也可未全部連接,使所述蝕刻構造20A之圖案化蝕刻槽21A的圖案為不連續圖形,複數圖案化肋部則連接形成連續圖形,且能連接該遮罩板體10A的周邊區域12,如此,使該遮罩板體10A的周邊區域12所受的張力能夠經由板體基部以及構造連續圖形之圖案化肋部傳達至該接觸區域11之每一鍍膜圖案孔111的孔緣,而能產生均衡的應變效果。The patterned
如圖3所示之金屬遮罩第二較佳實施例,該遮罩板體10B的第一側101與第二側102各具有一所述蝕刻構造20B,該遮罩板體10B於兩所述蝕刻構造20B之間為板體基部13B,兩所述蝕刻構造20B可為對稱或不對稱之構造,於本較佳實施例揭示兩所述蝕刻構造20B為對稱之構造。兩所述蝕刻構造20B的蝕刻深度H的總和小於或等於遮罩板體10B之板厚D的二分之一為佳,即該板體基部13B的厚度大於或等於兩所述蝕刻構造20B的蝕刻深度H總合。As shown in the second preferred embodiment of the metal mask shown in FIG. 3, the
如圖3所示的金屬遮罩第二較佳實施例中,每一所述蝕刻構造20B皆包括複數圖案化蝕刻槽21B以及複數圖案化肋部22B,所述圖案化蝕刻槽21B的槽寬W1大於或等於所述圖案化肋部22B的肋寬W2,兩所述蝕刻構造20B的圖案化蝕刻槽21B的蝕刻深度H1、H2的總合小於或等於該板體基部13的厚度。藉由該遮罩板體10B的第一側101與第二側102的所述蝕刻構造20B中各具有連接板體基部13B的圖案化肋部22B,而能有效提升其機械強度。In the second preferred embodiment of the metal mask shown in FIG. 3, each of the
所述蝕刻構造20B之圖案化蝕刻槽21B包括複數槽溝單元211B,複數所述槽溝單元211B可連接一體,使所述蝕刻構造20B之圖案化蝕刻槽21B的圖案為連續圖形,有助於金屬遮罩於洩真空時,快速解除真空吸力。或者,複數所述槽溝單元211B也可未全部連接,使所述蝕刻構造20B之圖案化蝕刻槽21B的圖案為不連續圖形,複數圖案化肋部22B則連接形成連續圖形,且能連接該遮罩板體10B的周邊區域12,如此,使該遮罩板體10B的周邊區域12所受的張力能夠經由板體基部13以及構成連續圖形之圖案化肋部22B傳達至該接觸區域11之每一鍍膜圖案孔111的孔緣,而能產生均衡的應變效果。The patterned
如圖4所示之金屬遮罩第三較佳實施例,該遮罩板體10C的第一側101與第二側102各具有一所述蝕刻構造20C,該遮罩板體10C於兩所述蝕刻構造20C之間為板體基部13C,兩所述蝕刻構造20C可為對稱或不對稱之構造,於本較佳實施例揭示兩所述蝕刻構造20C為對稱之構造。兩所述蝕刻構造20C的蝕刻深度H的總和小於或等於遮罩板體10C之板厚D的二分之一,即該板體基部13C的厚度大於或等於兩所述蝕刻構造20C的蝕刻深度H總合。As shown in the third preferred embodiment of the metal mask shown in FIG. 4, the
每一所述蝕刻構造20C皆具有一圖案化蝕刻槽21C,藉由單一圖案化蝕刻槽21C之構造,有助於金屬遮罩於洩真空時,快速解除真空吸力。另利用兩所述蝕刻構造20C之構造,且板體基部13C位於兩所述蝕刻構造20C之間,如此,藉由兩側圖案化蝕刻槽21C的蝕刻深度縮短,減少製程難度,且使該遮罩板體10C的周邊區域12所受的張力能夠經由板體基部13C直接傳達至該接觸區域11之每一鍍膜圖案孔111的孔緣,而能產生均衡的應變效果。Each of the
本發明金屬遮罩能應用於有機發光二極體(OLED)式顯示器之製造過程中,結合物理氣相沉積(PVD)或化學氣相沉積(CVD)等手段於其玻璃基板或軟性基板等基板的表面鍍膜製程,其中,該金屬遮罩以其周邊區域由固定機構加以固定,如圖5所示,且使該遮罩板體10B的接觸區域11接觸待鍍膜之基板30(如玻璃基板或軟性基板等)之預定鍍膜表面,之後,利用物理氣相沉積(PVD)或化學氣相沉積(CVD)手段產生解離之鍍膜材料中的一部分通過金屬遮罩中之鍍膜圖案孔111,而沉積於基板30表面特定位置形成鍍膜。The metal mask of the present invention can be used in the manufacturing process of organic light emitting diode (OLED) type displays, combining physical vapor deposition (PVD) or chemical vapor deposition (CVD) and other means on its glass substrate or flexible substrate. The surface coating process in which the metal mask is fixed by a fixing mechanism with its peripheral area, as shown in FIG. 5, and the
由前述說明中可知,本發明藉由前述金屬遮罩之構造發明,其利用遮罩板體一側或兩側皆形成圖案化蝕刻槽,使金屬遮罩維持改善鍍膜製程黏片之功效外,本發明金屬遮罩還藉由遮罩板體單一側或兩側的蝕刻構造的圖案化蝕刻槽中形成圖案化肋部,或是利用遮罩板體兩側的蝕刻構造,使板體基部位於遮罩板體的板厚中的中間位置等,使金屬遮罩不改變遮罩板體厚度的條件下,有效地提升其機械強度。As can be seen from the foregoing description, the present invention is based on the aforementioned structure of the metal mask, which uses patterned etching grooves to be formed on one or both sides of the mask plate, so that the metal mask maintains the effect of improving the adhesive sheet in the coating process. The metal mask of the present invention also forms patterned ribs in the patterned etching grooves of the etching structure on a single side or both sides of the mask, or uses the etching structures on both sides of the mask to make the base of the board located The middle position of the thickness of the shield plate, etc., enables the metal shield to effectively improve its mechanical strength without changing the thickness of the shield plate.
10A、10B、10C:遮罩板體
101:第一側102:第二側
11:接觸區域111:鍍膜圖案孔
112:遮蔽部113:孔緣
12:周邊區域13A、13B、13C:板體基部
20A、20B、20C:蝕刻構造21A、21B、21C:圖案化蝕刻槽
211A、211B:槽溝單元22A、22B:圖案化肋部
D:遮罩板體之板厚H:蝕刻深度
W1:圖案化蝕刻槽的槽寬W2:圖案化肋部的肋寬
30:基板
40:金屬遮罩
50:基板
60:金屬遮罩61:圖案化鍍膜孔
62:半蝕刻槽
10A, 10B, 10C: Mask plate
101: first side 102: second side
11: Contact area 111: Coated pattern hole
112: Shading part 113: Hole edge
12:
圖1係本發明金屬遮罩第一較佳實施例的平面示意圖。 圖2係圖1所示金屬遮罩第一較佳實施例的局部平面示意圖。 圖3係本發明金屬遮罩第二較佳實施例的局部平面示意圖。 圖4係本發明金屬遮罩第三較佳實施例的局部平面示意圖。 圖5係圖4所示金屬遮罩第三較佳實施例接觸基板進行鍍膜作業的使用狀態參考圖。 圖6現有第一種金屬遮罩接觸基板進行鍍膜作業的平面示意圖。 圖7現有第二種金屬遮罩的平面示意圖。FIG. 1 is a schematic plan view of the first preferred embodiment of the metal shield of the present invention. FIG. 2 is a partial plan view of the first preferred embodiment of the metal shield shown in FIG. 1. FIG. 3 is a partial plan view of the second preferred embodiment of the metal shield of the present invention. 4 is a partial plan view of a third preferred embodiment of the metal shield of the present invention. FIG. 5 is a reference diagram of the use state of the third preferred embodiment of the metal mask shown in FIG. 4 in contact with the substrate for coating operations. FIG. 6 is a schematic plan view of the first existing metal mask contacting the substrate for film coating operation. Fig. 7 is a schematic plan view of a second type of metal mask.
10A:遮罩板體 10A: Mask plate
101:第一側 101: first side
102:第二側 102: second side
11:接觸區域 11: contact area
111:鍍膜圖案孔 111: Coated pattern hole
112:遮蔽部 112: Shading part
113:孔緣 113: Hole Edge
12:周邊區域 12: Surrounding area
13A:板體基部 13A: Board base
20A:蝕刻構造 20A: Etching structure
21A:圖案化蝕刻槽 21A: Patterned etching groove
211A:槽溝單元 211A: Slot unit
22A:圖案化肋部 22A: Patterned ribs
D:遮罩板體之板厚 D: The thickness of the mask board
H:蝕刻深度 H: etching depth
W1:圖案化蝕刻槽的槽寬 W1: groove width of patterned etching groove
W2:圖案化肋部的肋寬 W2: rib width of patterned rib
Claims (10)
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CN114107893A (en) * | 2021-08-26 | 2022-03-01 | 达运精密工业股份有限公司 | Method for forming metal mask and metal mask |
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CN114107893B (en) * | 2021-08-26 | 2023-10-24 | 达运精密工业股份有限公司 | Method for forming metal mask and metal mask |
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