TW202043941A - Device for adjusting cable pulling stiffness and lithography machine including a cable tensioning unit, a cable bracket, a vibration detection sensor and a controller - Google Patents
Device for adjusting cable pulling stiffness and lithography machine including a cable tensioning unit, a cable bracket, a vibration detection sensor and a controller Download PDFInfo
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- TW202043941A TW202043941A TW109115769A TW109115769A TW202043941A TW 202043941 A TW202043941 A TW 202043941A TW 109115769 A TW109115769 A TW 109115769A TW 109115769 A TW109115769 A TW 109115769A TW 202043941 A TW202043941 A TW 202043941A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Abstract
Description
本發明涉及光刻機技術領域,例如涉及一種線纜牽拉剛度的調節裝置及光刻機。 The present invention relates to the technical field of photoetching machines, for example to a device for adjusting the pulling stiffness of cables and a photoetching machine.
光刻機又名光罩對準曝光機、曝光系統或光刻系統,是半導體產業的關鍵設備。 Lithography machine, also known as mask alignment exposure machine, exposure system or lithography system, is a key equipment in the semiconductor industry.
圖1是相關技術中光刻機的側視結構示意圖。如圖1所示,光刻機包括內部框架110和外部框架120,內部框架110用於搭載曝光物鏡與關鍵核心測量系統,主要有介面功能、承載功能、減振功能和隔振功能,通過三組主動減振器130安裝於外部框架120上,其中,主動減振器130能夠將外部框架120的運動衝擊、地基振動等擾動激勵與內部框架110隔離開來,使內部世界中曝光系統及高精度測量系統獲得優良的動態穩定性能。
FIG. 1 is a schematic diagram of a side view structure of a lithography machine in the related art. As shown in Figure 1, the lithography machine includes an
圖2是相關技術中光刻機的俯視結構示意圖。如圖2所示,為避免相互影響,內部框架110和外部框架120之間具有一間隙。用於實現內部世界中各部件與外部設備通訊的線纜140會經過該間隙所在區域,該區域內的線纜140採用分別位於內部框架110和外部框架120上的
兩個線纜支架150支撐。光刻機的正常工作過程中,內部框架110的位移會發生變化,導致上述兩個線纜支架150之間的距離發生變化,若設置兩個線纜支架150之間的線纜140長度等於該兩個線纜支架150之間的距離,易引起線纜140的彈塑性變形,因此,為避免上述問題的發生,相關技術中設置兩個線纜支架150之間的線纜140長度大於該兩個線纜支架150之間的距離,如圖3所示。但隨著光刻機整機性能的需求越來越高,線纜140數量增多,兩個線纜支架150之間線纜140自身重量導致的牽拉力隨之增大,使得線纜140的牽拉剛度變大,此外,相鄰線纜140之間的摩擦力進一步增大線纜140的牽拉剛度,導致線纜140通過自身形變緩衝外部振動的能力降低,外部振動易通過線纜140傳輸至內部世界,影響內部世界的穩定性。
Fig. 2 is a schematic top view of the structure of the photoetching machine in the related art. As shown in FIG. 2, to avoid mutual influence, there is a gap between the
本發明提供一種線纜牽拉剛度的調節裝置及光刻機,以降低線纜的牽拉剛度,提升運動台側部件的穩定性。 The invention provides a device for adjusting the pulling stiffness of a cable and a photoetching machine, so as to reduce the pulling stiffness of the cable and improve the stability of the side parts of the moving table.
一種線纜牽拉剛度的調節裝置,包括: A device for adjusting the pulling stiffness of a cable includes:
線纜張緊單元、線纜支架、振動檢測感測器以及控制器; Cable tensioning unit, cable support, vibration detection sensor and controller;
其中,所述控制器與所述線纜張緊單元以及所述振動檢測感測器連接; Wherein, the controller is connected with the cable tensioning unit and the vibration detection sensor;
所述線纜張緊單元位於固定台的支撐面上,所述線纜支架位於運動台的支撐面上,所述固定台和所述運動台之間的距離設置為預設距離; The cable tensioning unit is located on the supporting surface of the fixed platform, the cable bracket is located on the supporting surface of the exercise platform, and the distance between the fixed platform and the exercise platform is set to a preset distance;
所述線纜張緊單元和所述線纜支架共同支撐多條線纜,多條所述線纜與所述線纜支架固定連接; The cable tensioning unit and the cable bracket jointly support a plurality of cables, and the plurality of cables are fixedly connected to the cable bracket;
所述振動檢測感測器安裝於所述運動台的支撐面上,所述振動檢測感測器用於檢測所述運動台的振動加速度,並將所述振動加速度傳輸給所述控制器;所述控制器用於根據接收到的所述振動加速度和預設振動加速度的比較結果,控制所述線纜張緊單元調節所述線纜張緊單元和所述線纜支架之間的多條所述線纜的長度。 The vibration detection sensor is installed on the supporting surface of the motion table, and the vibration detection sensor is used to detect the vibration acceleration of the motion table and transmit the vibration acceleration to the controller; The controller is configured to control the cable tensioning unit to adjust the plurality of wires between the cable tensioning unit and the cable support according to the received comparison result of the vibration acceleration and the preset vibration acceleration. The length of the cable.
一種光刻機,包括上述的線纜牽拉剛度調節裝置。 A photoetching machine includes the above-mentioned cable pulling stiffness adjusting device.
本發明實施例提供的線纜牽拉剛度的調節裝置包括:線纜張緊單元、線纜支架、振動檢測感測器以及控制器,其中,控制器與線纜張緊單元以及振動檢測感測器連接,線纜張緊單元位於固定台的支撐面上,線纜支架位於運動台的支撐面上,固定台和運動台相距預設距離設置,線纜張緊單元和線纜支架共同支撐多條線纜,多條線纜與線纜支架固定連接,振動檢測感測器安裝於運動台的支撐面上,使得控制器能夠根據運動台的振動情況控制線纜張緊單元調節線纜張緊單元和線纜支架之間的多條線纜的長度,進而減小多條線纜自身重量導致的牽拉力,使得多條線纜的牽拉剛度變小,此外,張緊後的多條線纜中相鄰線纜之間不接觸,消除了相鄰線纜之間的摩擦力,進一步減小了多條線纜的牽拉剛度,降低了 固定台側的振動通過多條線纜傳遞至運動台側的機率,提升了運動台側整體結構的穩定性。 The device for adjusting the pulling stiffness of a cable provided by the embodiment of the present invention includes: a cable tensioning unit, a cable support, a vibration detection sensor, and a controller, wherein the controller and the cable tensioning unit and the vibration detection sensor The cable tensioning unit is located on the supporting surface of the fixed platform, and the cable bracket is located on the supporting surface of the sports platform. The fixed platform and the sports platform are set at a preset distance. The cable tensioning unit and the cable support support more Multiple cables are fixedly connected to the cable bracket, and the vibration detection sensor is installed on the supporting surface of the motion table, so that the controller can control the cable tension unit to adjust the cable tension according to the vibration of the motion table The length of the multiple cables between the unit and the cable bracket reduces the pulling force caused by the weight of the multiple cables, which makes the pulling stiffness of the multiple cables smaller. In addition, the tensioned multiple cables There is no contact between adjacent cables in the cables, which eliminates the friction between adjacent cables, further reduces the pulling stiffness of multiple cables, and reduces The probability that the vibration on the side of the fixed table is transmitted to the side of the sports table through multiple cables improves the stability of the overall structure of the side of the sports table.
10:光刻機 10: Lithography machine
110:內部框架 110: internal frame
120:外部框架 120: external frame
130:主動減振器 130: Active shock absorber
140:線纜 140: Cable
150:線纜支架 150: cable bracket
200:調節裝置 200: adjusting device
210:線纜張緊單元 210: cable tensioning unit
211:滑動線纜支架 211: Sliding cable bracket
212:L型支架 212: L-shaped bracket
213:彈簧 213: Spring
220:線纜支架 220: cable bracket
230:振動檢測感測器 230: Vibration detection sensor
240:線纜 240: cable
250:運動載台 250: motion stage
251:基桿 251: Base Rod
252:調節桿 252: Adjusting lever
260:位移感測器 260: Displacement sensor
270:拉力檢測感測器 270: Tension detection sensor
300:固定台 300: fixed table
400:運動台 400: sports table
2111:第一子部 2111: The first subsection
【圖1】是相關技術中光刻機的側視結構示意圖。 [Figure 1] is a schematic diagram of a side view of a lithography machine in the related art.
【圖2】是相關技術中光刻機的俯視結構示意圖。 [Fig. 2] is a schematic diagram of the top view structure of the photoetching machine in the related art.
【圖3】是相關技術中光刻機的局部結構示意圖。 [Figure 3] is a schematic diagram of a partial structure of a lithography machine in the related art.
【圖4】是本發明實施例提供的一種設備的局部結構示意圖。 [Figure 4] is a schematic diagram of a partial structure of a device provided by an embodiment of the present invention.
【圖5】本發明另一實施例提供的一種設備的局部結構示意圖。 [Figure 5] A schematic diagram of a partial structure of a device provided by another embodiment of the present invention.
【圖6】是本發明實施例提供的一種光刻機的結構示意圖。 [Fig. 6] is a schematic diagram of the structure of a lithography machine provided by an embodiment of the present invention.
下面結合圖式和實施例對本發明作進一步的詳細說明。應當提到的是,一些示例性實施例被描述成作為流程圖描繪的處理或方法。雖然流程圖將各項操作(或步驟)描述成順序的處理,但是其中的許多操作可以被並行地、並發地或者同時實施。此外,各項操作的順序可以被重新安排。當其操作完成時所述處理可以被終止,但是還可以具有未包括在圖式中的附加步驟。所述處理可以對應於方法、函數、規程、子常式、副程式等等。 The present invention will be further described in detail below in conjunction with the drawings and embodiments. It should be mentioned that some exemplary embodiments are described as processes or methods depicted as flowcharts. Although the flowchart describes various operations (or steps) as sequential processing, many of the operations can be implemented in parallel, concurrently, or simultaneously. In addition, the order of various operations can be rearranged. The process can be terminated when its operation is completed, but it can also have additional steps not included in the schema. The processing can correspond to methods, functions, procedures, subroutines, subroutines, and so on.
圖4是本發明實施例提供的一種設備的局部結構示意圖。該設備採用本發明實施例提供的線纜牽拉剛度的調節裝置對線纜牽拉力進
行調節。如圖4所示,線纜牽拉剛度的調節裝置200包括線纜張緊單元210、線纜支架220、振動檢測感測器230以及控制器(圖中未示出),其中,控制器與線纜張緊單元210以及振動檢測感測器230連接。線纜張緊單元210位於固定台300的支撐面上,線纜支架220位於運動台400的支撐面上,固定台300和運動台400之間的距離設置為預設距離。線纜張緊單元210和線纜支架220共同支撐多條線纜240,多條線纜240與線纜支架220固定連接。振動檢測感測器230安裝於運動台400的支撐面上,振動檢測感測器230用於檢測運動台400的振動加速度,並將振動加速度傳輸給控制器,控制器用於根據接收到的振動加速度和預設振動加速度的比較結果,控制線纜張緊單元210調節線纜張緊單元210和線纜支架220之間的各線纜240的長度。
Fig. 4 is a schematic diagram of a partial structure of a device provided by an embodiment of the present invention. The device adopts the cable pulling stiffness adjustment device provided by the embodiment of the present invention to adjust the cable pulling force.
Row adjustment. As shown in FIG. 4, the
需要說明的是,本實施例僅以圖4所示線纜張緊單元210的結構為例進行說明,而非對線纜張緊單元210的結構的限定,凡是能夠實現線纜張緊功能的結構均在本實施例的保護範圍內。
It should be noted that this embodiment only uses the structure of the
還需要說明的是,固定台300為位置固定不變的支撐台,運動台400為位置可變的支撐台,示例性的,對於光刻機,外部框架可以為固定台300,內部框架可以為運動台400。
It should also be noted that the fixed table 300 is a support table with a fixed position, and the motion table 400 is a support table with a variable position. For example, for a lithography machine, the outer frame may be the fixed table 300, and the inner frame may be
本實施例中線纜牽拉剛度的調節裝置200的工作過程具體如下:控制器在運動台400的位移發生變化後,控制線纜張緊單元210進行線纜240的張緊操作,減小線纜張緊單元210和線纜支架220之間線纜240的長度,同時控制振動檢測感測器230開始工作;振動檢測感測器230檢測運動台400的運動加速度,並將檢測結果發送給控制器;控制器
存儲有預設運動加速度,接收到上述檢測結果後,控制器比較該檢測結果和預設運動加速度,確定兩者相等後,控制線纜張緊單元210停止張緊操作,保持線纜張緊單元210和線纜支架220之間多條線纜240的長度不變,之後,控制器檢測到接收到的檢測結果大於預設運動加速度,控制線纜張緊單元210放鬆多條線纜240,以使線纜張緊單元210和線纜支架220之間多條線纜240的長度增大;並在檢測到接收到的檢測結果小於預設運動加速度後,控制線纜張緊單元210張緊多條線纜240,以使線纜張緊單元210和線纜支架220之間多條線纜240的長度減小。線纜牽拉剛度的調節裝置200在工作過程中實現的是線纜240長度的即時調節,能夠根據運動台400的實際振動情況對應調節線纜張緊單元210和線纜支架220之間的線纜240長度,在不會導致線纜240發生彈塑性變形的前提下,減小了多條線纜240的牽拉剛度。
The working process of the
本實施例提供的線纜牽拉剛度的調節裝置200包括:線纜張緊單元210、線纜支架220、振動檢測感測器230以及控制器,其中,控制器與線纜張緊單元210以及振動檢測感測器230連接,線纜張緊單元210位於固定台300的支撐面上,線纜支架220位於運動台400的支撐面上,固定台300和運動台400之間的距離設置為預設距離,線纜張緊單元210和線纜支架220共同支撐多條線纜240,多條線纜240與線纜支架220固定連接,振動檢測感測器230安裝於運動台400的支撐面上,使得控制器能夠根據運動台400的振動情況控制線纜張緊單元210調節線纜張緊單元210和線纜支架220之間的多條線纜240的長度,進而減小多條線纜240因自身重量導致的牽拉力,使得多條線纜240的牽拉剛度變小;此
外,張緊後的多條線纜240中相鄰線纜240之間不接觸,消除了相鄰線纜240之間的摩擦力,進一步減小了多條線纜240的牽拉剛度,降低了固定台300一側的振動通過多條線纜240傳遞至運動台400側的機率,提升了運動台400側整體結構的穩定性。
The
繼續參見圖4,線纜張緊單元210包括L型支架212、滑動線纜支架211,以及彈簧213,L型支架212包括相互垂直的第一分支和第二分支,第一分支垂直於固定台300的支撐面,滑動線纜支架211和第二分支滑動連接,彈簧213的兩端分別固定於第一分支和滑動線纜支架211上。
4, the
需要說明的是,滑動線纜支架211和第二分支能夠通過多種方式實現滑動連接,示例性的,如圖4所示,滑動線纜支架211包括設置於其靠近第二分支一側的滑動輪結構,滑動輪結構中的滑動輪能夠在第二分支上滑動。或者,第二分支可以包括第一滑軌,第一滑軌沿第二分支的延伸方向延伸,滑動線纜支架211包括與第一滑軌適配的第一滑動輪結構。後一種設置方式中的第一滑軌能夠對第一滑動輪結構的滑動方向起到限定作用,避免第一滑動輪結構滑動至第二分支外。
It should be noted that the sliding
還需要說明的是,滑動線纜支架211受控制器控制,在第二分支上滑動指定位移,以帶動固定於滑動線纜支架211上端部的多條線纜240向靠近或遠離運動台400的方向移動,進而調節滑動線纜支架211與線纜支架220之間多條線纜240的長度。值得說明的是,此處滑動線纜支架211與線纜支架220之間多條線纜240的長度指的是,滑動線纜支架211靠近運動台400的邊緣的一側至線纜支架220之間多條線纜240的長
度,並非滑動線纜支架211與線纜支架220之間多條線纜240的長度。
It should also be noted that the sliding
可選的,線纜張緊單元210還可以為其他結構,例如線纜張緊單元210可以包括螺紋旋轉輪,控制器能夠控制螺紋旋轉輪旋轉,以通過將多條線纜240環繞至螺紋旋轉輪上或從螺紋旋轉輪上釋放多條線纜240來調節線纜張緊單元210與線纜支架220之間多條線纜240的長度。
Optionally, the
繼續參見圖4,線纜牽拉剛度的調節裝置200還包括與控制器連接的拉力檢測感測器270,拉力檢測感測器270設置於滑動線纜支架211上。
Continuing to refer to FIG. 4, the
需要說明的是,多條線纜240與滑動線纜支架211連接,因此多條線纜240對滑動線纜支架211的牽拉力與滑動線纜支架211對多條線纜240的牽拉力相等,由於多條線纜240的牽拉力不易測量,本實施例採用拉力檢測感測器270檢測滑動線纜支架211對多條線纜240的牽拉力,以近似獲得多條線纜240的牽拉力。
It should be noted that the
還需要說明的是,本實施例中的線纜牽拉剛度的調節裝置200能夠應用於不同設備中,更換設備後,線纜牽拉剛度的調節裝置200需要重新進行多條線纜240的張緊操作。在滑動線纜支架211上安裝拉力檢測感測器270後,更換設備前,控制器可記錄振動測量感測器230的檢測結果與預設加速度相等時,拉力檢測感測器270的第一數值,更換設備後,控制器確定設備開始工作後,可以直接控制線纜張緊單元210張緊多條線纜240,直至拉力檢測感測器270的測試值等於上述第一數值,然後再基於振動檢測感測器230的檢測結果對線纜張緊單元210和線纜支架220之間多條線纜240的長度進行進一步調節,從而減少了更換設備後的
探尋調節時間,增強了設備對不同設備的適應能力。
It should also be noted that the cable pulling
示例性的,如圖4所示,滑動線纜支架211包括固定連接多條線纜240的第一子部2111,拉力檢測感測器270可以設置於第一子部2111的中心位置。
Exemplarily, as shown in FIG. 4, the sliding
需要說明的是,多條線纜240沿滑動線纜支架211的延伸方向依次連接於滑動線纜支架211的第一子部2111上,每條線纜240對滑動線纜支架211的牽拉點為兩者連接點,第一子部2111的中心位置為第一子部2111受到多條線纜240整體牽拉力的中心受力點,因此,此處較佳的設置拉力檢測感測器270設置於第一子部2111的中心位置。
It should be noted that a plurality of
繼續參見圖4,線纜牽拉剛度的調節裝置200還可以包括與控制器連接並放置於所述固定台300的支撐面上的運動載台250,運動載台250包括延伸方向相互垂直的基桿251和調節桿252,調節桿252的一端固定於基桿251上,基桿251為多自由度運動部件且放置於固定台300的支撐面上,第一分支與調節桿252滑動連接。
Continuing to refer to FIG. 4, the
需要說明的是,第一分支能夠通過多種方式與調節桿252滑動連接,示例性的,調節桿252可以包括第二滑軌,第二滑軌沿調節桿252的延伸方向延伸,第一分支包括與第二滑軌適配的第二滑動輪結構。在本實施例的其他實施方式中,第一分支還可以通過其他方式實現與調節桿252的滑動連接,本實施例對此不作具體限定。
It should be noted that the first branch can be slidably connected with the adjusting
還需要說明的是,線纜張緊單元210能夠沿調節桿252做上下運動,基桿251能夠帶動調節桿252以及線纜張緊單元210做多自由度運動,進而使得多條線纜240連接於線纜張緊單元210上的一端的位置
能夠隨基桿251的運動發生改變,從更多角度對多條線纜240的牽拉力進行調節。
It should also be noted that the
此外,運動載台250的設置實現了線纜張緊單元210位置上較大幅度的調節,使得線纜張緊單元210無需大幅度調節線纜240的長度,而僅用於進行微調即可,由於通過運動載台250運動抵消運動台400振動的速度遠大於通過線纜張緊單元210調節線纜240長度以抵消運動台400振動的速度,因此,運動載台250的設置加速了運動台400穩定的速度。
In addition, the setting of the
參見圖4,線纜牽拉剛度的調節裝置200還包括與控制器連接的位移感測器260,位移感測器260設置於固定台300靠近運動台400的一側表面上,用於檢測運動台400相對於固定台300的位移。
4, the
需要說明的是,當運動台400相對於固定台300發生較大位移時,運動載台250較大幅度的位移能夠抵消或部分抵消上述位移導致的運動台400振動的增大部分。具體的,位移感測器260檢測到運動台400相對固定台300發生位移的至少一個分量大於對應預設值時,位移感測器260將檢測到的運動台400相對固定台300的位移傳輸給控制器,控制器按照預設方式將接收到的位移分解獲得至少兩個分量,並根據上述至少兩個分量控制運動載台250以及L型支架212做對應的位置調節,之後根據振動檢測感測器230的檢測結果與預設加速度的比值,即時調節線纜張緊單元210與線纜支架220之間多條線纜240的長度,以減小該段多條線纜240的牽拉剛度。示例性的,定義運動台400和固定台300的排列方向為第一方向,可將上述位移分解至第一方向上、調節桿252的延伸方向
上,以及垂直於上述兩個方向形成的平面的第二方向上。
It should be noted that when the moving
線纜牽拉剛度的調節裝置200還可以包括主動減振器(圖中未示出)和振動檢測器(圖中未示出),主動減振器與運動台400連接,振動檢測器與主動減振器以及控制器連接,振動檢測器用於檢測主動減振器的工作狀態,並將主動減振器的工作狀態傳輸給控制器,控制器用於根據接收到的工作狀態控制線纜張緊單元210的工作狀態。
The
控制器同時控制運動載台250、振動檢測感測器230、拉力檢測感測器270以及位移感測器260的工作狀態。
The controller simultaneously controls the working states of the
需要說明的是,主動減振器可用於減小運動台400側部件的振動,運動台400開始工作後主動減振器既開始工作,因此,可將主動減振器的工作狀態作為控制器工作狀態轉換的控制訊號。具體的,振動檢測器檢測到主動減振器開始工作後,將主動減振器開始工作的資訊傳輸給控制器,控制器控制與其連接的各個部件開始工作,振動檢測器檢測到主動減振器停止工作後,將主動減振器停止工作的資訊傳輸給控制器,控制器控制與其連接的各個部件停止工作,可以理解的是,此時線纜張緊單元210中的滑動線纜支架211不受外力作用,位於滑動線纜支架211與L型支架212第一分支之間的彈簧213處於自然狀態,線纜張緊單元210與線纜支架220之間的線纜240處於鬆弛狀態,如圖5所示。
It should be noted that the active shock absorber can be used to reduce the vibration of the components on the side of the sports table 400. The active shock absorber starts to work after the sports table 400 starts to work. Therefore, the working state of the active shock absorber can be used as a controller. Control signal for state transition. Specifically, after the vibration detector detects that the active shock absorber is working, it transmits the information that the active shock absorber has started to work to the controller, and the controller controls the components connected to it to start working, and the vibration detector detects the active shock absorber. After it stops working, the information that the active shock absorber stops working is transmitted to the controller, and the controller controls the various components connected to it to stop working. It can be understood that the sliding
本實施例的其他實施方式中,還可以採用其他狀態或訊號作為控制器工作狀態轉換的控制訊號,本實施例對此不作具體限定,設計人員可根據實際需要進行合理設置。 In other implementations of this embodiment, other states or signals may also be used as the control signal for the controller's working state transition. This embodiment does not specifically limit this, and the designer can make reasonable settings according to actual needs.
圖6是本發明實施例提供的一種光刻機的結構示意圖。如
圖6所示,光刻機10包括本發明任意實施例提供的線纜牽拉剛度調節裝置200。
Fig. 6 is a schematic structural diagram of a lithography machine provided by an embodiment of the present invention. Such as
As shown in FIG. 6, the
此時,固定台300為光刻機的外部框架,運動台400為光刻機的內部框架。 At this time, the fixed table 300 is the external frame of the lithography machine, and the motion table 400 is the internal frame of the lithography machine.
本發明任意實施例提供的線纜牽拉剛度調節裝置200可應用設備不限於光刻機10,還可以為其他設備,本實施例對此不做具體限定。
The applicable equipment of the cable pulling
本發明要求在2019年5月20日提交中國專利局、申請號為201910419128.4的中國專利申請的優先權,以上申請的全部內容通過引用結合在本申請中。 The present invention claims the priority of a Chinese patent application filed with the Chinese Patent Office with an application number of 201910419128.4 on May 20, 2019, and the entire content of the above application is incorporated into this application by reference.
200:調節裝置 200: adjusting device
210:線纜張緊單元 210: cable tensioning unit
211:滑動線纜支架 211: Sliding cable bracket
212:L型支架 212: L-shaped bracket
213:彈簧 213: Spring
220:線纜支架 220: cable bracket
230:振動檢測感測器 230: Vibration detection sensor
240:線纜 240: cable
250:運動載台 250: motion stage
251:基桿 251: Base Rod
252:調節桿 252: Adjusting lever
260:位移感測器 260: Displacement sensor
270:拉力檢測感測器 270: Tension detection sensor
300:固定台 300: fixed table
400:運動台 400: sports table
2111:第一子部 2111: The first subsection
Claims (10)
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CN201910419128.4A CN111965943B (en) | 2019-05-20 | 2019-05-20 | Adjusting device and photoetching machine of cable tractive rigidity |
CN201910419128.4 | 2019-05-20 |
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US20220066331A1 (en) * | 2020-08-31 | 2022-03-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lithography system and method thereof |
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JPH1182609A (en) * | 1997-08-29 | 1999-03-26 | Nikon Corp | Vibration eliminating device and exposure device |
US6937911B2 (en) * | 2002-03-18 | 2005-08-30 | Nikon Corporation | Compensating for cable drag forces in high precision stages |
US7538273B2 (en) * | 2006-08-08 | 2009-05-26 | Asml Netherlands B.V. | Cable connection to decrease the passing on of vibrations from a first object to a second object |
CN103439867B (en) * | 2013-08-30 | 2015-09-30 | 清华大学 | A kind of cable stage for photo-etching machine work-piece platform |
NL2014645A (en) * | 2014-04-16 | 2015-11-02 | Asml Netherlands Bv | Lithographic apparatus, method for positioning an object in a lithographic apparatus and device manufacturing method. |
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US20220066331A1 (en) * | 2020-08-31 | 2022-03-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lithography system and method thereof |
US11520243B2 (en) * | 2020-08-31 | 2022-12-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lithography system and method thereof |
US11782350B2 (en) | 2020-08-31 | 2023-10-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lithography system and method thereof |
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